TW201545871A - A surface enhanced transparent substrate and method for manufacturing thereof - Google Patents

A surface enhanced transparent substrate and method for manufacturing thereof Download PDF

Info

Publication number
TW201545871A
TW201545871A TW104106518A TW104106518A TW201545871A TW 201545871 A TW201545871 A TW 201545871A TW 104106518 A TW104106518 A TW 104106518A TW 104106518 A TW104106518 A TW 104106518A TW 201545871 A TW201545871 A TW 201545871A
Authority
TW
Taiwan
Prior art keywords
transparent substrate
weight
group
parts
polymer
Prior art date
Application number
TW104106518A
Other languages
Chinese (zh)
Other versions
TWI656028B (en
Inventor
Hee-Jung Jung
Jae-Won Yoo
Seung-Sock Choi
Dong-Jin Nam
Ji-Sik Choi
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW201545871A publication Critical patent/TW201545871A/en
Application granted granted Critical
Publication of TWI656028B publication Critical patent/TWI656028B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/283Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysiloxanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/022Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the choice of material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07Flat, e.g. panels
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/412Transparent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/536Hardness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00Characterised by the use of unspecified polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2483/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2483/04Polysiloxanes

Abstract

The present invention relates to a transparent substrate having reinforced surfaces and a method for manufacturing same, and more specifically, to a transparent substrate having reinforced surfaces and a method for manufacturing same, which is capable of significantly improving surface hardness by treating the surfaces with a silsesquioxane complex polymer including, in a single polymer, a silsesquioxane ladder chain and a cage-type silsesquioxane which have a specific structure, and which has improved fingerprint resistance, scratch resistance, pollution resistance, heat resistance, light transmission, and haze characteristics.

Description

表面強化透明基板及其製造方法 Surface-reinforced transparent substrate and method of manufacturing same 發明領域 Field of invention

本發明係關於一種表面強化透明基板及其製造方法,且係關於一種如下表面強化透明基板及其製造方法:藉由使用矽倍半氧烷複合高分子對表面進行處理而顯著改善表面硬度,同時提高耐指紋性、耐劃痕性、耐污染性、耐熱性、透射率及霧度特性,該矽倍半氧烷複合高分子係於一個高分子內包含特定結構之線狀矽倍半氧烷鏈及籠形矽倍半氧烷者。 The present invention relates to a surface-enhanced transparent substrate and a method of manufacturing the same, and to a surface-enhanced transparent substrate and a method for producing the same: the surface hardness is significantly improved by treating the surface with a sesquisesquioxane composite polymer, and at the same time To improve fingerprint resistance, scratch resistance, stain resistance, heat resistance, transmittance, and haze characteristics, the sesquisesquioxane composite polymer contains linear sesquioxanes of a specific structure in one polymer. Chain and cage sesquioxanes.

發明背景 Background of the invention

透明基板被用於各種用途。尤其是在包括智慧型手機、平板個人電腦(tablet PC)、筆記型電腦、單體全備式個人電腦(AIO(All-In-One)PC)、液晶顯示器(LCD)、電視(TV)、廣告板、觸控面板等電子製品而於各種領域內被用作視窗保護基板或保護膜,或者於保護內部物品之保護板用途中使用有透明基板。 Transparent substrates are used for various purposes. Especially in smart phones, tablet PCs, notebooks, AIO (All-In-One) PCs, liquid crystal displays (LCDs), TVs (TVs), advertising An electronic product such as a board or a touch panel is used as a window protection substrate or a protective film in various fields, or a transparent substrate is used for a protective sheet application for protecting an internal article.

作為透明基板之一例,玻璃具有代表性,但由於 脆性(易碎之性質)較強,故而廣泛使用有塑膠材質之透明基板。 As an example of a transparent substrate, glass is representative, but due to The brittleness (fragile nature) is strong, so a transparent substrate made of plastic material is widely used.

作為塑膠材質之透明基板,使用有PC(聚碳酸酯)、PET(Polyethylene Terephthalate,聚對苯二甲酸乙二酯)、PE(Polyethylene,聚乙烯)或PMMA(Polymethyl methacrylate,聚甲基丙烯酸甲酯),但通常塑膠材質之透明基板存在表面硬度較低,耐久性降低,耐指紋性、耐劃痕性、耐污染性、耐熱性、透射率及霧度特性較低之問題。 As a transparent substrate made of plastic material, PC (polycarbonate), PET (Polyethylene Terephthalate, polyethylene terephthalate), PE (Polyethylene, polyethylene) or PMMA (Polymethyl methacrylate, polymethyl methacrylate) is used. However, generally, a transparent substrate made of a plastic material has a problem of low surface hardness, reduced durability, fingerprint resistance, scratch resistance, stain resistance, heat resistance, transmittance, and haze characteristics.

為了解決該問題,於大韓民國專利申請案第2009-7009932號中揭示有一種於聚碳酸酯上塗佈丙烯酸系樹脂而提高表面硬度之聚碳酸酯積層體,但經改善之表面硬度以鉛筆硬度計為4H以下,實際情況為依然不足。 In order to solve this problem, a polycarbonate laminate in which an acrylic resin is coated on a polycarbonate to increase the surface hardness is disclosed in Korean Patent Application No. 2009-7009932, but the surface hardness is improved by pencil hardness. Below 4H, the actual situation is still insufficient.

又,於智慧型手機之類之搭載有觸控功能之情形時,Protectm股份有限公司形成硬塗層-自體復原層-衝擊擴散層-自淨層-防指紋層-外部衝擊吸收層等各種層作為行動電話之保護膜而欲提高透明基板之表面特性,但存在步驟非常複雜,且生產性降低之問題。 In addition, when a smart phone or the like is equipped with a touch function, Protectm Co., Ltd. forms various layers such as a hard coat layer - an auto-recovery layer - an impact diffusion layer - a self-cleaning layer - an anti-fingerprint layer - an external impact absorption layer. As a protective film for a mobile phone, it is desired to improve the surface characteristics of a transparent substrate, but there are problems in that the steps are very complicated and the productivity is lowered.

發明概要 Summary of invention

為了解決如上述之問題,本發明之目的在於提供一種表面強化透明基板及其製造方法,該表面強化透明基板即便僅藉由形成於透明基板上之一個單一層,亦可顯著改善透明基板之表面硬度,同時提高耐指紋性、耐劃痕性、 耐污染性、耐熱性、透射率及霧度特性。 In order to solve the above problems, an object of the present invention is to provide a surface-enhanced transparent substrate and a method of manufacturing the same, which can significantly improve the surface of a transparent substrate even by a single layer formed on a transparent substrate. Hardness, while improving fingerprint resistance, scratch resistance, Pollution resistance, heat resistance, transmittance and haze characteristics.

又,本發明提供一種透明基板之表面強化方法,其特徵在於在透明基板上塗佈包含特定結構之矽倍半氧烷複合高分子之塗料組成物並硬化。 Moreover, the present invention provides a surface strengthening method for a transparent substrate, characterized in that a coating composition containing a specific structure of a sesquioxanes composite polymer is applied onto a transparent substrate and cured.

又,本發明之目的在於提供一種電子製品,其包含上述表面強化透明基板。 Still another object of the present invention is to provide an electronic article comprising the above surface-reinforced transparent substrate.

又,本發明之目的在於提供一種保護板,其包含上述表面強化透明基板。 Further, it is an object of the present invention to provide a protective sheet comprising the above surface-reinforced transparent substrate.

為了達成上述目的,本發明提供一種表面強化透明基板,其特徵在於在透明基板上積層有下述化學式1至9中任一者所示之矽倍半氧烷複合高分子之硬化物: In order to achieve the above object, the present invention provides a surface-strengthened transparent substrate characterized in that a cured product of a sesquisesquioxane composite polymer represented by any one of the following Chemical Formulas 1 to 9 is laminated on a transparent substrate:

[化學式9] [Chemical Formula 9]

於上述化學式1至9中,A為,B為,D為,E為,Y分別獨立為O、NR21或[(SiO3/2R)4+2nO],且至少一個為[(SiO3/2R)4+2nO],X分別獨立為R22或[(SiO3/2R)4+2nR],且至少一個為[(SiO3/2R)4+2nR],R、R1、R2、R3、R4、R5、R6、R7、R8、R9、R10、R11、R12、R13、R14、R15、R16、R17、R18、R19、R20、R21及R22分別獨立為氫;氘;鹵素;胺基;環氧基;環己基環氧基;(甲基)丙烯醯基;硫醇基;異氰酸酯基;腈基;硝基;苯基;經氘、鹵素、胺基、環氧基、(甲基)丙烯醯基、硫醇基、異氰酸酯基、腈基、硝基、苯基取代或未經取代之C1~C40之 烷基;C2~C40之烯基;C1~C40之烷氧基;C3~C40之環烷基;C3~C40之雜環烷基;C6~C40之芳基;C3~C40之雜芳基;C3~C40之芳烷基;C3~C40之芳氧基;或C3~C40之芳基硫醇基,較佳為包含經氘、鹵素、胺基、(甲基)丙烯醯基、硫醇基、異氰酸酯基、腈基、硝基、苯基、環己基環氧基取代或未經取代之C1~C40之烷基、C2~C40之烯基、胺基、環氧基、環己基環氧基、(甲基)丙烯醯基、硫醇基、苯基或異氰酸酯基,a及d分別獨立為1至100,000之整數,較佳為a為3至1000,d為1至500,進而較佳為a為5至300,d為2至100,b分別獨立為1至500之整數,e分別獨立為1或2,較佳為1,n分別獨立為1至20之整數,較佳為3至10。 In the above chemical formulas 1 to 9, A is , B is , D is , E is , Y is independently O, NR 21 or [(SiO 3/2 R) 4+2n O], and at least one is [(SiO 3/2 R) 4+2n O], and X is independently R 22 or [ (SiO 3/2 R) 4+2n R], and at least one is [(SiO 3/2 R) 4+2n R], R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 And R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 and R 22 are each independently Is hydrogen; hydrazine; halogen; amine; epoxy; cyclohexyl epoxy; (meth) propylene sulfhydryl; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Alkyl group, epoxy group, (meth) propylene sulfhydryl group, thiol group, isocyanate group, nitrile group, nitro group, phenyl substituted or unsubstituted C 1 -C 40 alkyl group; C 2 ~ C 40 Alkenyl; C 1 ~ C 40 alkoxy; C 3 ~ C 40 cycloalkyl; C 3 ~ C 40 heterocycloalkyl; C 6 ~ C 40 aryl; C 3 ~ C 40 miscellaneous Aryl; C 3 -C 40 aralkyl; C 3 -C 40 aryloxy; or C 3 -C 40 aryl thiol, preferably containing fluorene, halogen, amine, (A Acryl thiol, thiol, isocyanate, nitrile, nitro Phenyl, cyclohexyl epoxy groups of a substituted or unsubstituted C 1 ~ C 40 alkyl group, the C 2 ~ C 40 alkenyl group, the amine group, an epoxy group, cyclohexyl epoxy groups, (meth) acrylamide a mercapto group, a thiol group, a phenyl group or an isocyanate group, a and d are each independently an integer of from 1 to 100,000, preferably a is from 3 to 1,000, d is from 1 to 500, and even more preferably from 5 to 300. d is 2 to 100, and b is independently an integer of 1 to 500, and e is independently 1 or 2, preferably 1, and n is independently an integer of 1 to 20, preferably 3 to 10.

又,本發明提供一種透明基板之表面強化方法,其特徵在於在透明基板上塗佈包含上述化學式1至9中任一者所示之矽倍半氧烷複合高分子之塗料組成物並硬化。 Moreover, the present invention provides a surface strengthening method for a transparent substrate, which is characterized in that a coating composition containing the sesquisesquioxane composite polymer shown in any one of the above Chemical Formulas 1 to 9 is applied onto a transparent substrate and cured.

又,本發明提供一種電子製品,其特徵在於包含上述表面強化透明基板。 Further, the present invention provides an electronic article comprising the surface-reinforced transparent substrate.

又,本發明提供一種保護板,其包含上述表面強化透明基板。 Further, the present invention provides a protective sheet comprising the above surface-reinforced transparent substrate.

本發明之表面強化透明基板藉由包含特定結構之矽倍半氧烷複合高分子之硬化體作為塗層而顯著改善透明基板之表面硬度,同時提高耐指紋性、耐劃痕性、耐污 染性、耐熱性、透射率及霧度特性,可非常有用地用於電子製品之視窗保護基板、保護膜或保護板。 The surface-enhanced transparent substrate of the present invention significantly improves the surface hardness of the transparent substrate by improving the surface hardness of the transparent substrate by using a hardened body containing a specific structure of the sesquioxanes composite polymer as a coating layer, and at the same time improving fingerprint resistance, scratch resistance, and stain resistance. Dyeability, heat resistance, transmittance and haze characteristics can be very useful for window protection substrates, protective films or protective sheets for electronic products.

用以實施發明之形態 Form for implementing the invention

以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.

本發明之表面強化透明基板之特徵在於在透明基板上積層有下述化學式1至9中任一者所示之矽倍半氧烷複合高分子之硬化物: The surface-reinforced transparent substrate of the present invention is characterized in that a cured product of a sesquisesquioxane composite polymer represented by any one of the following Chemical Formulas 1 to 9 is laminated on a transparent substrate:

[化學式4] [Chemical Formula 4]

[化學式9] [Chemical Formula 9]

於上述化學式1至9中,A為,B為,D為,E為,Y分別獨立為O、NR21或[(SiO3/2R)4+2nO],且至少一個為[(SiO3/2R)4+2nO],X分別獨立為R22或[(SiO3/2R)4+2nR],且至少一個為[(SiO3/2R)4+2nR],R、R1、R2、R3、R4、R5、R6、R7、R8、R9、R10、R11、R12、R13、R14、R15、R16、R17、R18、R19、R20、R21及R22分別獨立為氫;氘;鹵素;胺基;環氧基;環己基環氧基;(甲基)丙烯醯基;硫醇基;異氰酸酯基;腈基;硝基;苯基;經氘、鹵素、胺基、環氧基、(甲基)丙烯醯基、硫醇基、異氰酸酯基、腈基、硝基、苯基取代或未經取代之C1~C40之 烷基;C2~C40之烯基;C1~C40之烷氧基;C3~C40之環烷基;C3~C40之雜環烷基;C6~C40之芳基;C3~C40之雜芳基;C3~C40之芳烷基;C3~C40之芳氧基;或C3~C40之芳基硫醇基,較佳為包含經氘、鹵素、胺基、(甲基)丙烯醯基、硫醇基、異氰酸酯基、腈基、硝基、苯基、環己基環氧基取代或未經取代之C1~C40之烷基、C2~C40之烯基、胺基、環氧基、環己基環氧基、(甲基)丙烯醯基、硫醇基、苯基或異氰酸酯基,a及d分別獨立為1至100,000之整數,較佳為a為3至1000,d為1至500,進而較佳為a為5至300,d為2至100,b分別獨立為1至500之整數,e分別獨立為1或2,較佳為1,n分別獨立為1至20之整數,較佳為3至10。 In the above chemical formulas 1 to 9, A is , B is , D is , E is , Y is independently O, NR 21 or [(SiO 3/2 R) 4+2n O], and at least one is [(SiO 3/2 R) 4+2n O], and X is independently R 22 or [ (SiO 3/2 R) 4+2n R], and at least one is [(SiO 3/2 R) 4+2n R], R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 And R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 and R 22 are each independently Is hydrogen; hydrazine; halogen; amine; epoxy; cyclohexyl epoxy; (meth) propylene sulfhydryl; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Alkyl group, epoxy group, (meth) propylene sulfhydryl group, thiol group, isocyanate group, nitrile group, nitro group, phenyl substituted or unsubstituted C 1 -C 40 alkyl group; C 2 ~ C 40 Alkenyl; C 1 ~ C 40 alkoxy; C 3 ~ C 40 cycloalkyl; C 3 ~ C 40 heterocycloalkyl; C 6 ~ C 40 aryl; C 3 ~ C 40 miscellaneous Aryl; C 3 -C 40 aralkyl; C 3 -C 40 aryloxy; or C 3 -C 40 aryl thiol, preferably containing fluorene, halogen, amine, (A Acryl thiol, thiol, isocyanate, nitrile, nitro Phenyl, cyclohexyl epoxy groups of a substituted or unsubstituted C 1 ~ C 40 alkyl group, the C 2 ~ C 40 alkenyl group, the amine group, an epoxy group, cyclohexyl epoxy groups, (meth) acrylamide a mercapto group, a thiol group, a phenyl group or an isocyanate group, a and d are each independently an integer of from 1 to 100,000, preferably a is from 3 to 1,000, d is from 1 to 500, and even more preferably from 5 to 300. d is 2 to 100, and b is independently an integer of 1 to 500, and e is independently 1 or 2, preferably 1, and n is independently an integer of 1 to 20, preferably 3 to 10.

關於本發明之表面強化透明基板,藉由將具有[A]a及[D]d重複單元、且選擇性地具有[B]b或[E]e重複單元之特定結構之矽倍半氧烷高分子用作透明基板之表面處理劑,而提供一種適於電子製品之視窗保護基板、保護膜,且適於用作內部物品保護用之保護板的透明基板。 Regarding the surface-enhanced transparent substrate of the present invention, a sesquisesquioxane having a specific structure having repeating units of [A]a and [D]d and optionally having repeating units of [B]b or [E]e The polymer is used as a surface treatment agent for a transparent substrate, and a transparent substrate which is suitable for a window protection substrate for an electronic product, a protective film, and is suitable for use as a protective sheet for protecting an internal article.

本發明之上述化學式1所示之矽倍半氧烷複合高分子可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物並縮合而製造下述化學式10;第2步驟,其於上述第1步驟之後,於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌, 以將[D]d(OR2)2結構導入至化學式10;及第3步驟,其於上述第2步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應。 The sesquisesquioxane composite polymer of the above Chemical Formula 1 of the present invention may be produced by the following steps: In the first step, after mixing a basic catalyst and an organic solvent in a reactor, an organodecane compound is added and condensed. The following chemical formula 10 is produced; in the second step, after the first step, an acidic catalyst is added to the reactor to adjust the reaction solution to be acidic, and then the organodecane compound is added and stirred to [D]d (OR 2 The structure 2 is introduced into the chemical formula 10; and the third step, after the second step, a basic catalyst is added to the reactor to convert the reaction liquid to basicity and a condensation reaction is carried out.

於上述式中,R1、R2、R16、D、a及d與化學式1至9中所定義之內容一致。 In the above formula, R 1 , R 2 , R 16 , D, a and d are identical to those defined in Chemical Formulas 1 to 9.

本發明之上述化學式2所示之矽倍半氧烷複合高分子可進行如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物並縮合而製造上述化學式10;第2步驟,其於上述第1步驟之後,於反應器中添加酸性觸媒而將反應液調節為酸性之後添加過量之有機矽烷化合物並攪拌,以將[D]d(OR3)2及[D]d(OR4)2結構如化學式2般導入至化學式10;第3步驟,其於上述第2步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;第4步驟,其於上述第3步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;及精製步驟,其藉由再結晶而去除經過第3步驟反應而單獨生成之作為副產物之籠形(cage)結構。 The sesquisesquioxane composite polymer represented by the above Chemical Formula 2 of the present invention can be produced by the following steps: In the first step, after mixing a basic catalyst and an organic solvent in a reactor, an organodecane compound is added and condensed. The above chemical formula 10 is produced; in the second step, after the first step, an acidic catalyst is added to the reactor to adjust the reaction solution to be acidic, and then an excess of the organic decane compound is added and stirred to [D]d (OR) 3 ) 2 and [D]d(OR 4 ) 2 are introduced into the chemical formula 10 as in the chemical formula 2; in the third step, after the second step, a basic catalyst is added to the reactor to convert the reaction liquid into Basically, performing a condensation reaction; in the fourth step, after the third step, adding a basic catalyst to the reactor to convert the reaction solution to basicity and performing a condensation reaction; and a refining step by recrystallization On the other hand, a cage structure which is separately produced as a by-product by the reaction of the third step is removed.

本發明之上述化學式3所示之矽倍半氧烷複合高分子 可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物並縮合而製造上述化學式10;第2步驟,其於上述第1步驟之後,於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌,以將[D]d(OR5)2結構導入至化學式10;第3步驟,其於上述第2步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;及第4步驟,其於上述第3步驟之後,於反應器中投入酸性觸媒而將反應液轉換為酸性環境,並且混合有機矽烷化合物並攪拌,以將[E]eX2結構導入至複合高分子之末端。 The sesquisesquioxane composite polymer of the above Chemical Formula 3 of the present invention may be produced by the following steps: a first step of adding an organic decane compound and condensing after mixing a basic catalyst and an organic solvent in a reactor The above chemical formula 10 is produced; in the second step, after the first step, an acidic catalyst is added to the reactor to adjust the reaction solution to be acidic, and then the organodecane compound is added and stirred to [D]d(OR 5 ) 2 is introduced into the chemical formula 10; a third step, after the second step, adding a basic catalyst to the reactor to convert the reaction liquid into a basicity and performing a condensation reaction; and a fourth step, which is the above After the third step, an acidic catalyst was introduced into the reactor to convert the reaction liquid into an acidic environment, and the organic decane compound was mixed and stirred to introduce the [E]eX 2 structure to the end of the composite polymer.

本發明之上述化學式4所示之矽倍半氧烷複合高分子可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物並調節縮合度而製造上述化學式10;第2步驟,其於上述第1步驟之後,於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌,以將[B]b結構及[D]d(OR7)2結構導入至化學式10;及第3步驟,其於上述第2步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應。 The sesquisesquioxane composite polymer of the above Chemical Formula 4 of the present invention may be produced by the following steps: a first step of adding an organic decane compound and adjusting the condensation after mixing the basic catalyst and the organic solvent in the reactor The above chemical formula 10 is produced in a second step. After the first step, an acidic catalyst is added to the reactor to adjust the reaction solution to be acidic, and then the organic decane compound is added and stirred to form the [B]b structure and The [D]d(OR 7 ) 2 structure is introduced into the chemical formula 10; and the third step, after the second step, a basic catalyst is added to the reactor to convert the reaction liquid to basicity and a condensation reaction is carried out.

本發明之上述化學式5所示之矽倍半氧烷複合高分子可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物並縮合而製造上述化學式10; 第2步驟,其於上述第1步驟之後,於反應器中添加酸性觸媒而將反應液調節為酸性之後添加過量之有機矽烷化合物並攪拌,以將[B]b結構及[D]d(OR8)2、[D]d(OR9)2結構導入至化學式10;第3步驟,其於上述第2步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;及第4步驟,其於第3步驟之後,通過再結晶及過濾過程而去除生成單獨籠狀物之結構。 The sesquisesquioxane composite polymer of the above Chemical Formula 5 of the present invention may be produced by the following steps: In the first step, after mixing a basic catalyst and an organic solvent in a reactor, an organodecane compound is added and condensed. The above chemical formula 10 is produced; the second step, after the first step, adding an acidic catalyst to the reactor to adjust the reaction solution to be acidic, and then adding an excess of the organic decane compound and stirring to form the [B]b structure and [D]d(OR 8 ) 2 , [D]d(OR 9 ) 2 is introduced into the chemical formula 10; in the third step, after the second step, a basic catalyst is added to the reactor to transfer the reaction solution. Conversion to alkaline and carrying out the condensation reaction; and step 4, after the third step, removing the structure forming the individual cage by recrystallization and filtration.

本發明之上述化學式6所示之矽倍半氧烷複合高分子可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物並縮合而製造上述化學式10;第2步驟,其於上述第1步驟之後,於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌,以將[B]b結構及[D]d(OR10)2結構導入至化學式10;第3步驟,其於上述第2步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;及第4步驟,其於上述第3步驟之後,於反應器中投入酸性觸媒而將反應液轉換為酸性環境,並且混合有機矽烷化合物並攪拌,以將[E]eX2結構導入至複合高分子之末端。 The sesquisesquioxane composite polymer represented by the above Chemical Formula 6 of the present invention may be produced by the following steps: In the first step, after mixing a basic catalyst and an organic solvent in a reactor, an organic decane compound is added and condensed. The above chemical formula 10 is produced; in the second step, after the first step, an acidic catalyst is added to the reactor to adjust the reaction solution to be acidic, and then the organic decane compound is added and stirred to form the [B]b structure and [D a structure of d(OR 10 ) 2 is introduced into Chemical Formula 10; a third step, after the second step, a basic catalyst is added to the reactor to convert the reaction solution to basicity and a condensation reaction is carried out; a step, after the third step, introducing an acid catalyst into the reactor to convert the reaction liquid into an acidic environment, and mixing the organic decane compound and stirring to introduce the [E]eX 2 structure to the end of the composite polymer .

較佳為於製造上述化學式1至6之方法中,本發明之第1步驟之反應液之pH值較佳為9至11.5,第2步驟之反應液之pH值較佳為2至4,第3步驟之反應液之pH值較佳為8至11.5,導入Ee之第4步驟之反應液之pH值較佳為1.5至4。於為上述範圍內之情形時,不僅所製造之矽倍半氧烷複合高 分子之產率較高,而且可提高所製造之矽倍半氧烷複合高分子之機械物性。 Preferably, in the method of the above Chemical Formulas 1 to 6, the pH of the reaction liquid of the first step of the present invention is preferably from 9 to 11.5, and the pH of the reaction liquid of the second step is preferably from 2 to 4, The pH of the reaction liquid of the third step is preferably from 8 to 11.5, and the pH of the reaction liquid of the fourth step of introducing Ee is preferably from 1.5 to 4. In the case of the above range, not only the produced sesquisestamer compound is high. The yield of the molecule is high, and the mechanical properties of the produced sesquisquioxane composite polymer can be improved.

本發明之上述化學式7所示之矽倍半氧烷複合高分子可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物而製造縮合度經調節之2種形態之上述化學式10;第2步驟,其於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌,以將[B]b結構及[D]d(OR12)2結構導入至上述第1步驟中所獲得之化學式10;第3步驟,其於上述個別之2步驟反應後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;及第4步驟,其將通過上述3步驟而獲得之2種以上之物質於鹼性條件下縮合而連結。 The sesquisesquioxane composite polymer represented by the above Chemical Formula 7 of the present invention may be produced by the following steps: a first step of mixing a basic catalyst and an organic solvent in a reactor, and then adding an organic decane compound to produce a condensation The above chemical formula 10 is adjusted in two forms; in the second step, after adding an acidic catalyst to the reactor to adjust the reaction solution to be acidic, the organic decane compound is added and stirred to form the [B]b structure and [D ]d(OR 12 ) 2 structure is introduced into the chemical formula 10 obtained in the above first step; in the third step, after the above-mentioned individual two-step reaction, a basic catalyst is added to the reactor to convert the reaction liquid into The condensation reaction is carried out by alkaline reaction, and the fourth step is carried out by condensing two or more kinds of substances obtained by the above three steps under basic conditions.

本發明之上述化學式8所示之矽倍半氧烷複合高分子可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物而製造縮合度經調節之2種形態之上述化學式10;第2步驟,其於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌,以將[B]b結構、[D]d(OR14)2結構導入至上述第1步驟中所獲得之化學式10;第3步驟,其於上述個別之2步驟反應後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;第4步驟,其將通過上述3步驟而獲得之2種以上之物質於鹼性條件下縮合而連結;第5步驟,其於上述4步驟 之後,於用以導入[D]d(OR13)2之反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌;及第6步驟,其於上述5步驟反應之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應。 The sesquisesquioxane composite polymer represented by the above Chemical Formula 8 of the present invention may be produced by the following steps: a first step of mixing a basic catalyst and an organic solvent in a reactor, and then adding an organic decane compound to produce a condensation The above chemical formula 10 is adjusted in two forms; the second step is to add an acidic catalyst to the reactor to adjust the reaction solution to be acidic, and then add the organodecane compound and stir to form the [B]b structure, [D ]d(OR 14 ) 2 is introduced into the chemical formula 10 obtained in the above first step; in the third step, after the above-mentioned individual two-step reaction, a basic catalyst is added to the reactor to convert the reaction liquid into Basically, the condensation reaction is carried out; in the fourth step, the two or more substances obtained by the above three steps are condensed and condensed under alkaline conditions; and the fifth step is carried out after the above four steps. An acid catalyst is added to the reactor of D]d(OR 13 ) 2 to adjust the reaction liquid to be acidic, and then the organic decane compound is added and stirred; and in the sixth step, after the above 5-step reaction, a base is added to the reactor. Sexual catalyst will react And converted to a basic embodiment of the condensation reaction.

本發明之上述化學式9所示之矽倍半氧烷複合高分子可包括如下步驟而製造:第1步驟,其於反應器中混合鹼性觸媒及有機溶劑之後,添加有機矽烷化合物而製造縮合度經調節之2種形態之上述化學式10;第2步驟,其於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌,以將[B]b結構導入至上述第1步驟中所獲得之化學式10;第3步驟,其於上述個別之2步驟反應後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;第4步驟,其將通過上述3步驟而獲得之2種以上之化合物於鹼性條件下縮合而連結;第5步驟,其於上述4步驟之後,於用以導入[D]d(OR5)2之反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌;第6步驟,其於上述5步驟反應之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應;及第7步驟,其於上述6步驟之後,於反應器中投入酸性觸媒而將反應液轉換為酸性環境,並且混合有機矽烷化合物並攪拌,以將[E]eX2結構導入至複合高分子之末端。 The sesquisesquioxane composite polymer of the above Chemical Formula 9 of the present invention may be produced by the following steps: a first step of mixing an alkali catalyst and an organic solvent in a reactor, and then adding an organic decane compound to produce a condensation The above chemical formula 10 of the two types of adjustment; the second step, wherein an acidic catalyst is added to the reactor to adjust the reaction solution to be acidic, and then the organic decane compound is added and stirred to introduce the [B]b structure into the above The chemical formula 10 obtained in the first step; the third step, after the above-mentioned individual two-step reaction, adding a basic catalyst to the reactor to convert the reaction liquid to basicity and performing a condensation reaction; The two or more compounds obtained by the above three steps are condensed and condensed under basic conditions; the fifth step, after the above four steps, in the reactor for introducing [D]d(OR 5 ) 2 Adding an acidic catalyst to adjust the reaction solution to be acidic, and then adding the organodecane compound and stirring; in the sixth step, after the above five-step reaction, adding a basic catalyst to the reactor to convert the reaction solution to alkaline real The condensation reaction; and the seventh step of, after said introducing an acidic catalyst in step 6 in the reactor and the reaction solution was converted to an acidic environment, and the mixing and stirring of organosilane compounds, to [E] 2 is introduced into the structure of eX The end of the composite polymer.

較佳為於製造上述化學式7至9之高分子之方法中,第1步驟之反應液之pH值較佳為9至11.5,第2步驟之反 應液之pH值較佳為2至4,第3步驟之反應液之pH值較佳為8至11.5,第4步驟之反應液之pH值較佳為9至11.5,第5步驟之反應液之pH值較佳為2至4,第6步驟之反應液之pH值較佳為8至11.5,導入Ee之第7步驟之反應液之pH值較佳為1.5至4。於為上述範圍內之情形時,不僅所製造之矽倍半氧烷複合高分子之產率較高,而且可提高所製造之矽倍半氧烷複合高分子之機械物性。 Preferably, in the method for producing the polymer of the above Chemical Formulas 7 to 9, the pH of the reaction liquid of the first step is preferably from 9 to 11.5, and the reverse of the second step. The pH of the solution is preferably 2 to 4, the pH of the reaction liquid of the third step is preferably 8 to 11.5, and the pH of the reaction liquid of the fourth step is preferably 9 to 11.5. The pH of the reaction liquid in the sixth step is preferably from 8 to 11.5, and the pH of the reaction liquid in the seventh step of introducing Ee is preferably from 1.5 to 4. When it is in the above range, not only the yield of the produced sesquisesquioxane composite polymer is high, but also the mechanical properties of the produced sesquisesquioxane composite polymer can be improved.

又,於需要之情形時,為了於各複合高分子中進而導入[B]b結構及[D]d(OR)2結構,可通過如下兩個步驟而於複合高分子內進而包含[B]b重複單元:於反應器中添加酸性觸媒而將反應液調節為酸性之後添加有機矽烷化合物並攪拌;以及於上述步驟之後,於反應器中添加鹼性觸媒而將反應液轉換為鹼性並實施縮合反應。 Further, in the case where it is necessary, in order to further introduce the [B]b structure and the [D]d(OR) 2 structure into each of the composite polymers, the composite polymer may be further included in the following two steps [B]. b repeating unit: adding an acidic catalyst to the reactor to adjust the reaction liquid to be acidic, adding an organodecane compound and stirring; and after the above steps, adding a basic catalyst to the reactor to convert the reaction liquid to alkaline And the condensation reaction is carried out.

又,於需要之情形時,為了於各複合高分子之末端導入[E]eX2結構,可包括如下步驟而於複合高分子之末端進而包含[E]e之重複單元:於反應器中投入酸性觸媒而將反應液轉換為酸性環境,並且混合有機矽烷化合物並攪拌。 Further, in the case where it is necessary, in order to introduce the [E]eX 2 structure at the end of each of the composite polymers, the following steps may be included to further comprise a repeating unit of [E]e at the end of the hybrid polymer: The reaction solution was switched to an acidic environment with an acidic catalyst, and the organic decane compound was mixed and stirred.

於上述矽倍半氧烷複合高分子之製造方法中,作為鹼性觸媒,較佳為使用2種以上之鹼性觸媒之混合觸媒,藉由利用酸性觸媒將其中和及酸化而引發再水解,並再次使用2種以上之鹼性觸媒之混合觸媒而於鹼性下進行縮合,可於一個反應器內連續地調節酸度及鹼度。 In the method for producing the above-mentioned sesquisquioxane composite polymer, it is preferred to use a mixed catalyst of two or more kinds of basic catalysts as an alkaline catalyst, and to neutralize and acidify them by using an acidic catalyst. The re-hydrolysis is initiated, and the mixed catalyst of two or more kinds of basic catalysts is used again to carry out condensation under alkaline conditions, and the acidity and alkalinity can be continuously adjusted in one reactor.

此時,上述鹼性觸媒可將選自由Li、Na、K、Ca 及Ba所組成之群中之金屬系鹼性觸媒及選自胺系鹼性觸媒中之2種以上之物質適當地組合而製造。較佳為上述胺系鹼性觸媒可為氫氧化四甲基銨(TMAH),金屬系鹼性觸媒可為氫氧化鉀(KOH)或碳酸氫鈉(NaHCO3)。於上述混合觸媒中,各成分之含量較佳為胺系鹼性觸媒與金屬系鹼性觸媒之比率可於10至90:10至90重量份之比率內任意調節。於為上述範圍內之情形時,具有如下優點:於水解時可使官能基與觸媒之反應性最小化,藉此,Si-OH或Si-烷氧基等有機官能基之缺陷明顯減少,從而可自由地調節縮合度。又,作為上述酸性觸媒,只要為本領域中通常所使用之酸性物質,則可無限制地使用,例如可使用HCl、H2SO4、HNO3、CH3COOH等普通酸性物質,又,亦可使用乳酸(lactic acid、酒石酸(tartaric acid)、順丁烯二酸(maleic acid)、檸檬酸(citric acid)等有機系酸性物質。 In this case, the basic catalyst may be a metal-based basic catalyst selected from the group consisting of Li, Na, K, Ca, and Ba, and two or more selected from the group consisting of amine-based basic catalysts. Made by combining. Preferably, the amine-based basic catalyst may be tetramethylammonium hydroxide (TMAH), and the metal-based basic catalyst may be potassium hydroxide (KOH) or sodium hydrogencarbonate (NaHCO 3 ). In the above mixed catalyst, the content of each component is preferably such that the ratio of the amine-based basic catalyst to the metal-based basic catalyst can be arbitrarily adjusted within a ratio of 10 to 90:10 to 90 parts by weight. In the case of the above range, there is an advantage that the reactivity of the functional group and the catalyst can be minimized upon hydrolysis, whereby the defects of the organic functional group such as Si-OH or Si-alkoxy group are remarkably reduced. Thereby, the degree of condensation can be freely adjusted. Further, the acidic catalyst can be used without limitation as long as it is an acidic substance generally used in the art, and for example, an ordinary acidic substance such as HCl, H 2 SO 4 , HNO 3 or CH 3 COOH can be used. Organic acid substances such as lactic acid, tartaric acid, maleic acid, and citric acid can also be used.

於本發明之矽倍半氧烷複合高分子之製造方法中,上述有機溶劑只要為本領域中通常所使用之有機溶劑,則可無限制地使用,例如不僅可使用甲醇、乙醇、異丙醇、丁醇、賽路蘇系等醇類,乳酸系,丙酮、甲基(異丁基)乙基酮等酮類,乙二醇等二醇類,四氫呋喃等呋喃系,二甲基甲醯胺、二甲基乙醯胺,N-甲基-2-吡咯啶酮等極性溶劑,亦可使用己烷、環己烷、環己酮、甲苯、二甲苯、甲酚、氯仿、二氯苯、二甲基苯、三甲基苯、吡啶、甲基萘、硝基甲烷、丙烯腈(acrylonitrile)、二氯甲烷、十八烷基胺、苯胺、二甲基亞碸、苄醇等各種溶劑。 In the method for producing a sesquisquioxane composite polymer of the present invention, the organic solvent may be used without limitation as long as it is an organic solvent generally used in the art. For example, not only methanol, ethanol or isopropanol can be used. Alcohols such as butanol and 赛路苏, lactic acid, ketones such as acetone and methyl (isobutyl) ethyl ketone, glycols such as ethylene glycol, furan such as tetrahydrofuran, and dimethylformamide a polar solvent such as dimethylacetamide or N-methyl-2-pyrrolidone, or hexane, cyclohexane, cyclohexanone, toluene, xylene, cresol, chloroform or dichlorobenzene. Various solvents such as dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acrylonitrile, dichloromethane, octadecylamine, aniline, dimethylhydrazine, and benzyl alcohol.

又,作為上述有機矽烷系化合物,可使用包含本發明之矽倍半氧烷複合高分子之化學式1至9中之R、R1、R2、R3、R4、R5、R6、R7、R8、R9、R10、R11、R12、R13、R14、R15、R16、R17、R18、R19、R20、R21、R22的有機矽烷,較佳為可使用包含具有增加矽倍半氧烷複合高分子之耐化學性而提高非膨潤性之效果之苯基或胺基的有機矽烷化合物,或者包含具有增加複合高分子之硬化密度而提高硬化層之機械強度及硬度之效果之環氧基或(甲基)丙烯醯基的有機矽烷化合物。 Further, as the above organic decane-based compound, R, R 1 , R 2 , R 3 , R 4 , R 5 and R 6 in Chemical Formulas 1 to 9 containing the sesquisesquioxane composite polymer of the present invention can be used. Organic decanes of R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 , R 22 It is preferable to use an organic decane compound containing a phenyl group or an amine group having an effect of increasing the chemical resistance of the sesquioxane complex polymer to improve the non-swelling property, or to increase the hardening density of the composite polymer. An epoxy group or a (meth) acrylonitrile-based organic decane compound which enhances the mechanical strength and hardness of the hardened layer.

作為上述有機矽烷系化合物之具體之例,可列舉:(3-縮水甘油氧基丙基)三甲氧基矽烷、(3-縮水甘油氧基丙基)三乙氧基矽烷、(3-縮水甘油氧基丙基)甲基二甲氧基矽烷、(3-縮水甘油氧基丙基)二甲基乙氧基矽烷、3-(甲基丙烯醯氧基)丙基三甲氧基矽烷、3,4-環氧丁基三甲氧基矽烷、3,4-環氧丁基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、胺基丙基三乙氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三第三丁氧基矽烷、乙烯基三異丁氧基矽烷、乙烯基三異丙氧基矽烷、乙烯基三苯氧基矽烷、苯基三乙氧基矽烷、苯基三甲氧基矽烷、胺基丙基三甲氧基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷、二甲基四甲氧基矽氧烷、二苯基四甲氧基矽氧烷等;亦可單獨使用該等中之1種,或者併用2種以上。為了最終所製造之組成物之物性,更佳為混合2種以上而使用。 Specific examples of the above organic decane-based compound include (3-glycidoxypropyl)trimethoxynonane, (3-glycidoxypropyl)triethoxydecane, and (3-glycidol). Oxypropyl)methyldimethoxydecane, (3-glycidoxypropyl)dimethylethoxydecane, 3-(methacryloxy)propyltrimethoxydecane, 3, 4-epoxybutyltrimethoxydecane, 3,4-epoxybutyltriethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 2-(3,4 - Epoxycyclohexyl)ethyltriethoxydecane, aminopropyltriethoxydecane, vinyltriethoxydecane, vinyltris-tert-butoxydecane, vinyltriisobutoxydecane , vinyl triisopropoxy decane, vinyl triphenoxy decane, phenyl triethoxy decane, phenyl trimethoxy decane, aminopropyl trimethoxy decane, N-phenyl-3-amine The propyl trimethoxy decane, the dimethyltetramethoxy decane, the diphenyltetramethoxy decane, etc. may be used alone or in combination of two or more. In order to obtain the physical properties of the composition to be finally produced, it is more preferable to use two or more kinds of the mixture.

於本發明中,上述化學式之重複單元[D]d中所導 入之[(SiO3/2R)4+2nO]結構中之n可替換為1至20之整數,較佳為3至10,進而較佳為平均n值為4至5,例如,上述n為4時,若表現經取代之結構,則如下述化學式11所示: In the present invention, n in the [(SiO 3/2 R) 4+2n O] structure introduced in the repeating unit [D]d of the above chemical formula may be replaced by an integer of 1 to 20, preferably 3 to 10 Further, it is preferable that the average n value is 4 to 5. For example, when the above n is 4, if the substituted structure is represented, it is as shown in the following Chemical Formula 11:

於上述之式中,R與上述中所定義之內容一致。 In the above formula, R is identical to the content defined in the above.

於本發明中,上述化學式之重複單元[B]b或[E]e中所導入之[(SiO3/2R)4+2nR]結構中之n可替換為1至20之整數,較佳為3至10,進而較佳為平均n值為4至5,例如,若表現上述n為4時之經取代之結構,則如下述化學式12所示: In the present invention, n in the [(SiO 3/2 R) 4+2n R] structure introduced in the repeating unit [B]b or [E]e of the above chemical formula may be replaced by an integer of 1 to 20, Preferably, it is from 3 to 10, and further preferably, the average n value is from 4 to 5. For example, if the above-mentioned structure in which n is 4 is substituted, it is as shown in the following Chemical Formula 12:

於上述之式中,R與上述中所定義之內容一致。 In the above formula, R is identical to the content defined in the above.

作為具體之例,本發明所提出之矽倍半氧烷高分子可為下述表1至18中所記載之高分子。於下述表1至9中,ECHE意指(環氧環己基)乙基,GlyP意指縮水甘油醚氧基丙基,POMMA意指(甲基丙烯醯氧基)丙基,於記載有兩種以上之情形時,意指混合使用。n分別獨立為1至8。 As a specific example, the sesquisquioxane polymer proposed by the present invention may be a polymer described in the following Tables 1 to 18. In the following Tables 1 to 9, ECHE means (epoxycyclohexyl)ethyl, GlyP means glycidyloxypropyl, and POMMA means (methacryloxy)propyl. In the case of the above, it means mixed use. n is independently 1 to 8.

上述化學式1之矽倍半氧烷複合高分子可為下述表1或2中所記載之高分子。 The sesquisesquioxane composite polymer of the above Chemical Formula 1 may be a polymer described in the following Table 1 or 2.

作為具體之例,上述化學式2之矽倍半氧烷複合高分子可為下述表3及4中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 2 may be a polymer described in the following Tables 3 and 4.

作為具體之例,上述化學式3之矽倍半氧烷複合高分子可為下述表5及6中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 3 may be a polymer described in the following Tables 5 and 6.

作為具體之例,上述化學式4之矽倍半氧烷複合高分子可為下述表7及8中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 4 may be a polymer described in the following Tables 7 and 8.

作為具體之例,上述化學式5之矽倍半氧烷複合高分子可為下述表9及10中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 5 may be a polymer described in the following Tables 9 and 10.

作為具體之例,上述化學式6之矽倍半氧烷複合高分子可為下述表11及12中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 6 may be a polymer described in the following Tables 11 and 12.

作為具體之例,上述化學式7之矽倍半氧烷複合高分子可為下述表13及14中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 7 may be a polymer described in the following Tables 13 and 14.

作為具體之例,上述化學式8之矽倍半氧烷複合高分子可為下述表15及16中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 8 may be a polymer described in the following Tables 15 and 16.

作為具體之例,上述化學式9之矽倍半氧烷複合高分子可為下述表17及18中所記載之高分子。 As a specific example, the sesquisesquioxane composite polymer of the above Chemical Formula 9 may be a polymer described in the following Tables 17 and 18.

關於本發明之上述矽倍半氧烷複合高分子,為了確保優異之保存穩定性而獲得範圍較廣之應用性,縮合度可調節為1至99.9%以上。即,鍵結於末端及中央之Si之烷氧基之含量可相對於高分子整體之鍵結基調節為50%至0.01%。 The above-mentioned sesquisesquioxane composite polymer of the present invention can be adjusted to have a wide range of applicability in order to secure excellent storage stability, and the degree of condensation can be adjusted to 1 to 99.9% or more. That is, the content of the alkoxy group bonded to the terminal and the center of Si can be adjusted to 50% to 0.01% with respect to the bonding group of the entire polymer.

又,本發明所提出之矽倍半氧烷複合高分子之重量平均分子量可為1,000至1,000,000,較佳為可為5,000至100,000,進而較佳為可為7、000至50,000。於該情形時,可同時提高矽倍半氧烷之加工性及物理特性。 Further, the polysilsesquioxane composite polymer proposed by the present invention may have a weight average molecular weight of 1,000 to 1,000,000, preferably 5,000 to 100,000, and more preferably 7,000 to 50,000. In this case, the processability and physical properties of the sesquioxanes can be simultaneously improved.

於本發明中,關於在透明基板上積層化學式1至9中任一者所示之矽倍半氧烷複合高分子之硬化物的方法,可於將包含化學式1至9中任一者所示之矽倍半氧烷複合高分子之塗料組成物塗佈於透明基板上之後進行硬化而形成。亦可使用2種以上之複合高分子,較佳為宜使用化學式3至9中任一者所示之矽倍半氧烷複合高分子。於該情形時,藉由包含重複單元[B]b或[E]e,可進一步提高包括表面硬度在內之透明基板之物性。 In the present invention, a method of laminating a cured product of a sesquisesquioxane composite polymer represented by any one of Chemical Formulas 1 to 9 on a transparent substrate may be included in any one of Chemical Formulas 1 to 9 The coating composition of the sesquioxane hybrid polymer is applied to a transparent substrate and then cured. Two or more kinds of composite polymers may be used, and it is preferred to use a sesquisesquioxane composite polymer represented by any one of Chemical Formulas 3 to 9. In this case, the physical properties of the transparent substrate including the surface hardness can be further improved by including the repeating unit [B]b or [E]e.

於矽倍半氧烷複合高分子為液狀之情形時,上述塗料組成物可以無溶劑型單獨塗佈,於矽倍半氧烷複合高分子為固狀之情形時,上述塗料組成物可包含有機溶劑而構成。又,塗料組成物可進而包含起始劑或硬化劑。 When the sulfonium sesquioxane composite polymer is in a liquid state, the coating composition may be applied in a solvent-free manner alone, and when the sesquisesquioxane composite polymer is in a solid state, the coating composition may include It is composed of an organic solvent. Further, the coating composition may further comprise a starter or a hardener.

較佳為上述塗料組成物之特徵在於包含上述化學式1至9中任一者所示之矽倍半氧烷複合高分子、與上述複合高分子具有相溶性之本領域中通常所使用之有機溶劑 及起始劑,並且可選擇性且追加性地含有硬化劑、塑化劑、紫外線阻斷劑、其他功能性添加劑等添加劑而提高硬化性、耐熱特性、紫外線阻斷、塑化效果等。 It is preferable that the coating composition is characterized by comprising a sesquisesquioxane composite polymer represented by any one of the above Chemical Formulas 1 to 9 and an organic solvent generally used in the art which is compatible with the above composite polymer. Further, an initiator such as a curing agent, a plasticizer, an ultraviolet ray blocking agent, or another functional additive may be selectively and additionally added to improve curability, heat resistance, ultraviolet blocking, plasticizing effect, and the like.

於本發明之塗料組成物中,相對於塗料組成物100重量份,上述矽倍半氧烷複合高分子宜包含至少5重量份以上,較佳為包含5至90重量份之量,進而較佳為包含10至50重量份之量。於為上述範圍內之情形時,可進一步提高塗料組成物之硬化膜之機械物性。 In the coating composition of the present invention, the above-mentioned sesquisesquioxane composite polymer preferably contains at least 5 parts by weight or more, preferably 5 parts by weight to 90 parts by weight, more preferably 100 parts by weight of the coating composition. It is contained in an amount of 10 to 50 parts by weight. When it is in the above range, the mechanical properties of the cured film of the coating composition can be further improved.

作為上述有機溶劑,不僅可使用甲醇、乙醇、異丙醇、丁醇、賽路蘇系等醇類,乳酸系,丙酮、甲基(異丁基)乙基酮等酮類,乙二醇等二醇類,四氫呋喃等呋喃系,二甲基甲醯胺、二甲基乙醯胺,N-甲基-2-吡咯啶酮等極性溶劑,亦可使用己烷、環己烷、環己酮、甲苯、二甲苯、甲酚、氯仿、二氯苯、二甲基苯、三甲基苯、吡啶、甲基萘、硝基甲烷、丙烯腈(acrylonitrile)、二氯甲烷、十八烷基胺、苯胺、二甲基亞碸、苄醇等各種溶劑,但並不限定於此。上述有機溶劑之量為除開複合高分子、起始劑及選擇性地追加之添加劑後的餘量。 As the organic solvent, not only alcohols such as methanol, ethanol, isopropanol, butanol, and sarcosyl, but also lactic acid, ketones such as acetone and methyl (isobutyl) ethyl ketone, and ethylene glycol can be used. For the polar solvents such as glycols, tetrahydrofuran, etc., polar solvents such as dimethylformamide, dimethylacetamide, and N-methyl-2-pyrrolidone, hexane, cyclohexane, and cyclohexanone may also be used. , toluene, xylene, cresol, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acrylonitrile, dichloromethane, octadecylamine Various solvents such as aniline, dimethyl hydrazine, and benzyl alcohol are not limited thereto. The amount of the above organic solvent is the balance after removing the composite polymer, the initiator, and the optional additive.

又,於本發明之塗料組成物中,上述起始劑或硬化劑可根據矽倍半氧烷複合高分子中所含之有機官能基而適當地選擇使用。 Further, in the coating composition of the present invention, the above-mentioned initiator or curing agent can be appropriately selected and used depending on the organic functional group contained in the sesquisesquioxane composite polymer.

作為具體之例,於對上述有機官能基導入不飽和烴、硫醇系、環氧系、胺系、異氰酸酯系等可後硬化之有機系之情形時,可進行使用熱或光之各種硬化。此時,雖 然可於高分子本身內謀求熱或光所引起之變化,但較佳為可藉由稀釋於此種有機溶劑中而謀求硬化步驟。 As a specific example, when the organic functional group is introduced into an organic system which can be post-cured, such as an unsaturated hydrocarbon, a thiol type, an epoxy type, an amine type, or an isocyanate type, various hardening by heat or light can be used. At this time, though However, it is possible to obtain a change in heat or light in the polymer itself, but it is preferred to obtain a hardening step by diluting it in such an organic solvent.

又,於本發明中,為了複合高分子之硬化及後續反應,可使用各種起始劑,相對於組成物總重量100重量份,上述起始劑較佳為包含0.1-10重量份,於包含上述範圍內之含量時,可同時滿足硬化後之透射率及塗佈穩定性。 Further, in the present invention, various initiators may be used for the curing and subsequent reaction of the hybrid polymer, and the above-mentioned initiator is preferably contained in an amount of 0.1 to 10 parts by weight based on 100 parts by weight based on the total weight of the composition. When the content in the above range is satisfied, the transmittance after curing and the coating stability can be simultaneously satisfied.

又,於對上述有機官能基導入不飽和烴等之情形時,可使用自由基起始劑,作為上述自由基起始劑,可使用三氯苯乙酮(trichloro acetophenone)、二乙氧基苯乙酮(diethoxy acetophenone)、1-苯基-2-羥基-2-甲基丙烷-1-酮(1-phenyl-2-hydroxyl-2-methylpropane-1-one)、1-羥基環己基苯基酮、2-甲基-1-(4-甲基噻吩基)-2-啉基丙烷-1-酮(2-methyl-1-(4-methylthiophenyl)-2-morpholinopropane-1-one)、2,4,6-三甲基苯甲醯基二苯基氧化膦(trimethyl benzoyl diphenylphosphine oxide)、樟腦醌(camphorquinone)、2,2'-偶氮雙(2-甲基丁腈)、2,2'-偶氮雙(2-甲基丁酸)二甲酯、3,3-二甲基-4-甲氧基-二苯基酮、對甲氧基二苯基酮、2,2-二乙氧基苯乙酮、2,2-二甲氧基-1,2-二苯乙烷-1-酮等光自由基起始劑,第三丁基過氧順丁烯二酸、第三丁基過氧化氫、2,4-二氯苯甲醯基過氧化物、1,1-二(第三丁基過氧)-3,3,5-三甲基環己烷、N-4,4'-二(第三丁基過氧)戊酸丁酯等熱自由基起始劑,以及該等之各種混合物等。 Further, when introducing an unsaturated hydrocarbon or the like into the above organic functional group, a radical initiator may be used, and as the radical initiator, trichloroacetophenone or diethoxybenzene may be used. Diethoxy acetophenone, 1-phenyl-2-hydroxyl-2-methylpropane-1-one, 1-hydroxycyclohexylphenyl Ketone, 2-methyl-1-(4-methylthienyl)-2- Benzyl-1-propan-1-one Diphenylphosphine oxide), camphorquinone, 2,2'-azobis(2-methylbutyronitrile), 2,2'-azobis(2-methylbutyrate) dimethyl ester, 3,3 - dimethyl-4-methoxy-diphenyl ketone, p-methoxydiphenyl ketone, 2,2-diethoxyacetophenone, 2,2-dimethoxy-1,2- Photoradical initiators such as diphenylethane-1-one, tert-butylperoxy maleic acid, tert-butyl hydroperoxide, 2,4-dichlorobenzhydryl peroxide, Thermal freedom such as 1,1-di(t-butylperoxy)-3,3,5-trimethylcyclohexane, N-4,4'-di(t-butylperoxy)pentanoic acid butyl ester a base initiator, and various mixtures of the foregoing, and the like.

又,於上述有機官能基包含環氧基等之情形時,作為光聚合起始劑(陽離子),可使用三苯基鋶、二苯基-4-(苯 硫基)苯基鋶等鋶系,二苯基錪或雙(十二烷基苯基)錪等錪,苯基重氮鎓等重氮鎓,1-苄基-2-氰基吡啶鎓或1-(萘基甲基)-2-氰基吡啶鎓等銨,(4-甲基苯基)[4-(2-甲基丙基)苯基]-六氟磷酸錪,雙(4-第三丁基苯基)六氟磷酸錪,二苯基六氟磷酸錪,二苯基三氟甲磺酸錪,四氟硼酸三苯基鋶,六氟磷酸三對甲苯基鋶,三氟甲磺酸三對甲苯基鋶,以及(2,4-環戊二烯-1-基)[(1-甲基乙基)苯]-Fe等Fe陽離子及BF4 -、PF6 -、SbF6 -等[BQ4]-鎓鹽組合(此處,Q為經至少2個以上之氟或三氟甲基取代之苯基)。 Further, when the organic functional group contains an epoxy group or the like, a lanthanide such as triphenylsulfonium or diphenyl-4-(phenylthio)phenylhydrazine can be used as the photopolymerization initiator (cation). , diphenyl hydrazine or bis(dodecylphenyl) fluorene, etc., diazonium such as phenyldiazonium, 1-benzyl-2-cyanopyridinium or 1-(naphthylmethyl)- Ammonium such as 2-cyanopyridinium, (4-methylphenyl)[4-(2-methylpropyl)phenyl]-phosphonium hexafluorophosphate, bis(4-t-butylphenyl)hexafluorophosphate Barium phosphate, barium diphenyl hexafluorophosphate, barium diphenyl trifluoromethanesulfonate, triphenylsulfonium tetrafluoroborate, tri-p-tolylphosphonium hexafluorophosphate, tri-p-tolylsulfonium triflate, and (2,4-cyclopentadiene-1-yl) [(1-methylethyl) benzene] -Fe cation like Fe and BF 4 -, PF 6 -, SbF 6 - , etc. [BQ 4] - salt Combination (here, Q is a phenyl group substituted with at least 2 or more fluorine or trifluoromethyl groups).

又,作為藉由熱而發揮作用之陽離子起始劑,可無限制地使用三氟甲磺酸鹽、三氟化硼醚錯合物、三氟化硼等之類之陽離子系,或者質子酸觸媒,銨鹽、鏻鹽及鋶鹽等各種鎓鹽,以及甲基三苯基溴化鏻、乙基三苯基溴化鏻、苯基三苯基溴化鏻等,該等起始劑亦可以各種混合形態進行添加,並且亦可與上述所明示之各種自由基起始劑混用。 Further, as the cationic initiator which acts by heat, a cationic system such as a trifluoromethanesulfonate, a boron trifluoride ether complex or a boron trifluoride or a protonic acid can be used without limitation. Catalyst, various salts of ammonium salts, barium salts and barium salts, and methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, phenyltriphenylphosphonium bromide, etc. It may be added in various mixed forms, and may also be mixed with various radical initiators as described above.

又,根據上述有機官能基之種類,可使用胺硬化劑類之乙二胺、三伸乙基四胺、四伸乙基五胺、1,3-二胺基丙烷、二伸丙基三胺、3-(2-胺基乙基)胺基-丙基胺、N,N'-雙(3-胺基丙基)-乙二胺、4,9-二氧雜十二烷-1,12-二胺、4,7,10-三氧雜十三烷-1,13-二胺、己二胺、2-甲基五亞甲基二胺、1,3-雙胺甲基環己烷、雙(4-胺基環己基)甲烷、降烯二胺、1,2-二胺基環己烷等。 Further, depending on the kind of the above-mentioned organic functional group, an amine hardener such as ethylenediamine, tri-ethylidene tetraamine, tetraethylidene pentaamine, 1,3-diaminopropane, and di-propyltriamine can be used. , 3-(2-Aminoethyl)amino-propylamine, N,N'-bis(3-aminopropyl)-ethylenediamine, 4,9-dioxadecane-1, 12-Diamine, 4,7,10-trioxatridecane-1,13-diamine, hexamethylenediamine, 2-methylpentamethylenediamine, 1,3-diaminomethylcyclohexane Alkane, bis(4-aminocyclohexyl)methane, lower An enediamine, a 1,2-diaminocyclohexane or the like.

又,作為用以促進上述硬化作用之硬化促進劑, 亦可使用乙胍、苯并胍胺、2,4-二胺基-6-乙烯基-第二三等三系化合物,咪唑、2-甲基咪唑、2-乙基-4-甲基咪唑、2-苯咪唑、2-苯基-4-甲基咪唑、乙烯基咪唑、1-甲基咪唑等咪唑系化合物,1,5-二氮雜雙環[4.3.0]壬烯-5、1,8-二氮雜雙環[5.4.0]十一烯-7、三苯基膦、二苯基(對甲苯基)膦、三(烷基苯基)膦、三(烷氧基苯基)膦、乙基三苯基磷酸鏻、四丁基氫氧化鏻、四丁基乙酸鏻、四丁基二氟化氫鏻、四丁基鏻二氫三氟等。 Further, as a hardening accelerator for promoting the above hardening action, acetamidine may also be used. Benzoguanamine, 2,4-diamino-6-vinyl-second three Wait three a compound, imidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-benzimidazole, 2-phenyl-4-methylimidazole, vinylimidazole, 1-methylimidazole, etc. Compound, 1,5-diazabicyclo[4.3.0]nonene-5,1,8-diazabicyclo[5.4.0]undecene-7, triphenylphosphine, diphenyl (p-toluene) Phosphine, tris(alkylphenyl)phosphine, tris(alkoxyphenyl)phosphine, ethyltriphenylphosphonium phosphate, tetrabutylphosphonium hydroxide, tetrabutylphosphonium acetate, tetrabutylphosphonium hydrogen fluoride , tetrabutylphosphonium dihydrotrifluoride, and the like.

進而,亦可廣泛地使用鄰苯二甲酸酐、偏苯三甲酸酐、焦蜜石酸二酐、順丁烯二酸酐、四氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、甲基納迪克酸酐、氫化甲基納迪克酸酐、三烷基四氫鄰苯二甲酸酐、十二烯基丁二酸酐、2,4-二乙基戊二酸酐等酸酐硬化劑類。 Further, phthalic anhydride, trimellitic anhydride, pyromellitic dianhydride, maleic anhydride, tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, and A can also be widely used. Tetrahydrophthalic anhydride, methyl nadic anhydride, hydrogenated methyl nadic anhydride, trialkyltetrahydrophthalic anhydride, dodecenyl succinic anhydride, 2,4-diethylpentane An acid anhydride hardener such as an acid anhydride.

相對於組成物100重量份,上述硬化劑宜含有0.1-10重量份。 The above curing agent is preferably contained in an amount of 0.1 to 10 parts by weight based on 100 parts by weight of the composition.

於本發明中,又,為了改善通過硬化步驟或後續反應後之硬度、強度、耐久性、成形性等,可追加性地包含紫外線吸收劑、抗氧化劑、消泡劑、勻化劑、防水劑、阻燃劑、接著改善劑等添加劑。此種添加劑於其使用中並無特別限制,可於不損及基板之特性即柔軟性、透光性、耐熱性、硬度、強度等物性之範圍內適當地添加。相對於組成物100重量份,上述添加劑宜分別獨立地含有0.1-10重量份。 Further, in the present invention, in order to improve hardness, strength, durability, moldability, and the like after the hardening step or the subsequent reaction, an ultraviolet absorber, an antioxidant, an antifoaming agent, a leveling agent, and a water repellent may be additionally contained. Additives such as flame retardants and subsequent improvers. The additive is not particularly limited in its use, and can be appropriately added insofar as it does not impair the properties of the substrate, that is, the properties such as flexibility, light transmittance, heat resistance, hardness, and strength. The above additives are preferably contained independently in an amount of 0.1 to 10 parts by weight, based on 100 parts by weight of the composition.

作為本發明中可使用之添加劑,可列舉:聚醚二甲基聚矽氧烷系(Polyether-modified polydimethylsiloxane,例如作為BYK公司製品之BYK-300、BYK-301、BYK-302、BYK-331、BYK-335、BYK-306、BYK-330、BYK-341、BYK-344、BYK-307、BYK-333、BYK-310等)、聚醚羥基聚二甲基矽氧烷系(Polyether modified hydroxyfunctional poly-dimethyl-siloxane,例如BYK公司之BYK-308、BYK-373等)、聚甲基烷基矽氧烷系(Methylalkylpolysiloxane,例如BYK-077、BYK-085等)、聚醚聚甲基烷基矽氧烷系(Polyether modified methylalkylpolysiloxane,例如BYK-320、BYK-325等)、聚酯聚甲基烷基矽氧烷系(Polyester modified poly-methyl-alkyl-siloxane,例如BYK-315等)、芳烷基聚甲基烷基矽氧烷系(Aralkyl modified methylalkyl polysiloxane,例如BYK-322、BYK-323等)、聚酯羥基聚二甲基矽氧烷系(Polyester modified hydroxy functional polydimethylsiloxane,例如BYK-370等)聚酯丙烯醯基聚二甲基矽氧烷系(Acrylic functional polyester modified polydimethylsiloxane,例如BYK-371、BYK-UV3570等)、聚醚-聚酯羥基聚二甲基矽氧烷系(Polyeher-polyester modified hydroxy functional polydimethylsiloxane,例如BYK-375等)、聚醚聚二甲基矽氧烷系(Polyether modified dimethylpolysiloxane,例如BYK-345、BYK-348、BYK-346、BYK-UV3510、BYK-332、BYK-337等)、非離子聚丙烯酸系(Non-ionic acrylic copolymer,例如BYK-380等)、離子性聚丙烯酸系(Ionic acrylic copolymer,例如BYK-381等)、聚丙烯酸酯系(Polyacrylate,例如BYK-353、BYK-356、BYK-354、BYK-355、BYK-359、BYK-361N、BYK-357、BYK-358N、BYK-352等)、聚甲基丙烯酸酯系(Polymethacrylate,例如BYK-390等)、聚醚丙烯醯基聚二甲基矽氧烷系(Polyether modified acryl functional polydimethylsiloxane,例如BYK-UV3500、BYK-UV3530等)、聚醚矽氧烷系(Polyether modified siloxane,例如BYK-347等)、醇烷氧基化物系(Alcohol alkoxylates,例如BYK-DYNWET800等)、丙烯酸酯系(Acrylate,例如BYK-392等)、矽聚丙烯酸羥酯系(Silicone modified polyacrylate(OH-functional),例如BYK-Silclean3700等)等。 Examples of the additive which can be used in the present invention include polyether-modified polydimethylsiloxane (for example, BYK-300, BYK-301, BYK-302, and BYK-331 which are BYK products). BYK-335, BYK-306, BYK-330, BYK-341, BYK-344, BYK-307, BYK-333, BYK-310, etc.), Polyether modified hydroxyfunctional poly -dimethyl-siloxane, such as BYK-308, BYK-373, BYK, etc., Methylalkylpolysiloxane (such as BYK-077, BYK-085, etc.), polyether polymethylalkyl hydrazine Polyether modified methylalkylpolysiloxane (such as BYK-320, BYK-325, etc.), polyester polymethyl-alkyl-siloxane (Polyester modified poly-methyl-alkyl-siloxane (such as BYK-315, etc.), aralkyl Polyalkyl modified methylalkyl polysiloxane (such as BYK-322, BYK-323, etc.), polyester modified hydroxy functional polydimethylsiloxane (such as BYK-370, etc.) Polyester propylene fluorenyl polydimethyl methoxide (Acrylic functi) Onal polyester modified polydimethylsiloxane (such as BYK-371, BYK-UV3570, etc.), polyether-polyester modified hydroxy functional polydimethylsiloxane (such as BYK-375, etc.), polyether poly Polyether modified dimethylpolysiloxane (such as BYK-345, BYK-348, BYK-346, BYK-UV3510, BYK-332, BYK-337, etc.), non-ionic acrylic copolymer (Non-ionic acrylic copolymer, For example, BYK-380, etc.), ionic polyacrylic acid (Ionic Acrylic copolymer (such as BYK-381, etc.), polyacrylate (Polyacrylate, such as BYK-353, BYK-356, BYK-354, BYK-355, BYK-359, BYK-361N, BYK-357, BYK-358N, BYK-352, etc., polymethacrylate (such as BYK-390, etc.), polyether modified acrylic functional polydimethylsiloxane (such as BYK-UV3500, BYK-UV3530) Etc.), polyether siloxane (such as BYK-347, etc.), alcohol alkoxylates (such as BYK-DYNWET800, etc.), acrylate (Acrylate, such as BYK-392, etc.) And succinyl polyacrylate (OH-functional), such as BYK-Silclean 3700, etc.

又,用於本發明之表面強化透明基板之透明基板可使用塑膠透明基板及玻璃,所謂透明基板,係於500nm波長之光源下透射率為至少80%以上之基板,作為具體之塑膠透明基板之例,可使用選自由COC(Cyclic olefin copolymer,環烯共聚物)、PAc(Polyacrylate,聚丙烯酸酯)、PC(Polycarbonate)、PE(Polyethylene)、PEEK(Polyetheretherketone,聚醚醚酮)、PEI(Polyetherimide,聚醚醯亞胺)、PEN(Polyethylenenaphthalate,聚萘二甲酸乙二酯)、PES(Polyethersulfone,聚醚碸)、PET(Polyethyleneterephtalate)、PI(Polyimide,聚醯亞胺)、PO(Polyolefin,聚烯烴)、PMMA(Polymethylmethacrylate)、PSF(Polysulfone,聚碸)、PVA(Polyvinylalcohol,聚乙烯醇)、 PVCi(Polyvinylcinnamate,聚肉桂酸乙烯酯)、TAC(Triacetylcellulose,三醋酸纖維素)、多晶矽(Poly Silicone)、聚胺基甲酸酯(Polyurethane)及環氧樹脂(Epoxy Resin)所組成之群中之原材料的基板。可利用上述原材料而由單層構成,或者由同一原材料之不同特性之2層以上構成,又,亦可為通過共擠壓而混合2種以上之塑膠而成之透明基板。 Moreover, the transparent substrate used for the surface-enhanced transparent substrate of the present invention can be a plastic transparent substrate and glass, and the transparent substrate is a substrate having a transmittance of at least 80% or more under a light source having a wavelength of 500 nm, as a specific plastic transparent substrate. For example, it may be selected from COC (Cyclic olefin copolymer), PAc (Polyacrylate), PC (Polycarbonate), PE (Polyethylene), PEEK (Polyetheretherketone), PEI (Polyetherimide). , polyether phthalimide), PEN (Polyethylenenaphthalate, polyethylene naphthalate), PES (Polyethersulfone, polyether oxime), PET (Polyethylene terephate), PI (Polyimide, polyimine), PO (Polyolefin, poly Olefin), PMMA (Polymethylmethacrylate), PSF (Polysulfone, polyfluorene), PVA (Polyvinylalcohol, polyvinyl alcohol), PVCi (Polyvinylcinnamate, polyvinyl cinnamate), TAC (Triacetyl cellulose, cellulose triacetate), polysilicone, polyurethane, and epoxy resin (Epoxy Resin) The substrate of the raw material. The above-mentioned raw materials may be composed of a single layer or two or more layers of different characteristics of the same material, or may be a transparent substrate obtained by mixing two or more kinds of plastics by co-extrusion.

於本發明中,關於將上述塗料組成物塗佈於透明基板上之方法,當然業者可於旋轉塗佈、棒式塗佈、狹縫塗佈、浸漬塗佈、自然塗佈、反向塗佈、輥式塗佈、旋轉塗佈、簾幕塗佈、噴塗、凹版塗佈等公知之方法中任意選擇使用,於硬化方法中,當然亦可根據複合高分子之官能基而適當地選擇使用光硬化或熱硬化。較佳為於熱硬化之情形時,硬化溫度為80至120℃。 In the present invention, the method of applying the above coating composition onto a transparent substrate can of course be applied by spin coating, bar coating, slit coating, dip coating, natural coating, reverse coating. A known method such as roll coating, spin coating, curtain coating, spray coating, or gravure coating is arbitrarily selected. In the curing method, it is of course possible to appropriately select the light according to the functional group of the composite polymer. Hardened or heat hardened. It is preferred that in the case of heat hardening, the hardening temperature is 80 to 120 °C.

於本發明中,上述塗料組成物之塗佈厚度可任意調節,較佳為0.01至500μm,進而較佳為宜為0.1至300μm之範圍,更較佳為宜為1至100μm之範圍。於為上述範圍內之情形時,不僅可穩定地確保7H以上之表面硬度,而且基板表面特性方面亦表現出優異之物性。尤其於以5μm以上之厚度積層有塗層之情形時,由於表面硬度可穩定地表現出9H,故而亦可用作玻璃之代替品。 In the present invention, the coating thickness of the above coating composition can be arbitrarily adjusted, preferably from 0.01 to 500 μm, more preferably from 0.1 to 300 μm, still more preferably from 1 to 100 μm. When it is in the above range, not only the surface hardness of 7H or more can be stably ensured, but also the physical properties of the substrate are excellent. In particular, when a coating layer is laminated in a thickness of 5 μm or more, since the surface hardness can stably exhibit 9H, it can also be used as a substitute for glass.

本發明此外提供一種包含上述表面強化透明基板之電子製品,較佳為上述電子製品為顯示器裝置,作為具體之例,可為智慧型手機、平板PC、筆記型電腦、 AIO(All-In-One)PC、LCD顯示器、TV、廣告板或觸控面板,並且可為要求基板之柔軟性之可撓性智慧型裝置(可戴式智慧型裝置)。 The present invention further provides an electronic product including the surface-enhanced transparent substrate. Preferably, the electronic product is a display device. As a specific example, the smart phone, the tablet PC, the notebook computer, AIO (All-In-One) PC, LCD display, TV, advertising board or touch panel, and can be a flexible and intelligent device (wearable smart device) that requires flexibility of the substrate.

上述電子製品中所包含之上述表面強化透明基板之形態並無特別限定,作為一例,可為視窗保護基板或保護膜之形態。本發明之電子製品僅藉由一個單一層便顯著改善透明基板之表面硬度,同時耐指紋性、耐劃痕性、耐污染性、耐熱性、透射率及霧度特性優異。 The form of the surface-enhanced transparent substrate included in the electronic product is not particularly limited, and may be in the form of a window protective substrate or a protective film as an example. The electronic product of the present invention remarkably improves the surface hardness of the transparent substrate by only a single layer, and is excellent in fingerprint resistance, scratch resistance, stain resistance, heat resistance, transmittance, and haze characteristics.

又,本發明提供一種包含上述表面強化透明基板之保護板,上述保護板透明而或可觀察到內部,可為保護內部之電子製品(顯示器裝置)之基板,作為一例,可為保護公共設施(火車站建築、機場、公共汽車終點站等)之顯示器設置物之顯示器裝置的透明保護板。 Moreover, the present invention provides a protective sheet comprising the surface-enhanced transparent substrate, wherein the protective sheet is transparent or can be observed inside, and can be a substrate for protecting an internal electronic product (display device), and as an example, can be used to protect public facilities ( A transparent protective plate for the display device of the display device of the railway station building, airport, bus terminal, etc.).

以下,為了理解本發明而提出較佳之實施例,但下述實施例僅係例示本發明者,本發明之範圍並不限定於下述實施例。於下述本發明之實施例中,ECHETMS意指2-(3,4-環氧環己基)乙基三甲氧基矽烷,GPTMS意指縮水甘油醚氧基丙基三甲氧基矽烷,MAPTMS意指(甲基丙烯醯氧基)丙基三甲氧基矽烷,PTMS意指苯基三甲氧基矽烷,MTMS意指甲基三甲氧基矽烷,ECHETMDS意指二(環氧環己基乙基)四甲氧基二矽氧烷,GPTMDS意指二(縮水甘油醚氧基丙基)四甲氧基二矽氧烷,MAPTMDS意指二(甲基丙烯醯氧基)丙基,PTMDS意指二(苯基)四甲氧基二矽氧烷,MTMDS意指二(甲基)四甲氧基二矽氧烷。 In the following, the preferred embodiments are set forth to understand the present invention, but the following examples are merely illustrative of the present invention, and the scope of the present invention is not limited to the following examples. In the following examples of the invention, ECHETMS means 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, GPTMS means glycidoxypropyltrimethoxydecane, and MAPTMS means (methacryloxy) propyltrimethoxydecane, PTMS means phenyltrimethoxydecane, MTMS means methyltrimethoxydecane, and ECHETMDS means bis(epoxycyclohexylethyl)tetramethoxy Dioxazane, GPTMDS means bis(glycidoxypropyl)tetramethoxydioxane, MAPTMDS means bis(methacryloxy)propyl, and PTMDS means bis(phenyl) Tetramethoxydioxane, MTMDS means di(methyl)tetramethoxydioxane.

[實施例] [Examples] 實施例1:包含共聚物1及9之塗料組成物之製造 Example 1 : Manufacture of a coating composition comprising copolymers 1 and 9

關於合成步驟,係如下述般階段性地進行連續水解及縮合。 Regarding the synthesis step, continuous hydrolysis and condensation were carried out stepwise as follows.

[實施例1-a]觸媒之製造 [Example 1-a] Manufacture of catalyst

為了調節鹼度,於25重量%之氫氧化四甲基銨(Tetramethylammonium hydroxide:TMAH)水溶液中混合10重量%之氫氧化鉀(Potassium hydroxide:KOH)水溶液而準備觸媒1a。 In order to adjust the alkalinity, a 10% by weight aqueous solution of potassium hydroxide (Potassium hydroxide: KOH) was mixed with a 25% by weight aqueous solution of tetramethylammonium hydroxide (TMAH) to prepare a catalyst 1a.

[實施例1-b]線狀矽倍半氧烷結構之合成 [Example 1-b] Synthesis of linear sesquioxalic acid structure

於配備冷卻管及攪拌機之經乾燥之燒瓶中滴加蒸餾水5重量份、四氫呋喃15重量份及上述實施例1-a中所製造之觸媒1重量份,於常溫下攪拌1小時後,滴加2-(3,4-環氧環己基)乙基三甲氧基矽烷20重量份,並再次滴加四氫呋喃15重量份,追加攪拌5小時。滴取攪拌中之混合溶液,藉由洗淨兩次而去除、過濾觸媒及雜質後,可通過IR(InfraRed,紅外線)分析而確認生成於末端基之SI-OH官能基(3200cm-1),測定分子量,結果可確認如化學式4之結構之線狀結構之矽倍半氧烷具有8,000之苯乙烯換算分子量。 5 parts by weight of distilled water, 15 parts by weight of tetrahydrofuran, and 1 part by weight of the catalyst prepared in the above Example 1-a were added dropwise to a dried flask equipped with a cooling tube and a stirrer, and the mixture was stirred at room temperature for 1 hour, and then added dropwise. 20 parts by weight of 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, and 15 parts by weight of tetrahydrofuran were further added dropwise thereto, and the mixture was further stirred for 5 hours. The mixed solution in the stirring was dripped, and after removing and filtering the catalyst and impurities by washing twice, the SI-OH functional group (3200 cm -1 ) formed at the terminal group was confirmed by IR (InfraRed) analysis. When the molecular weight was measured, it was confirmed that the linear heptasilane having a linear structure of the structure of Chemical Formula 4 had a molecular weight of 8,000 in terms of styrene.

[實施例1-c]連續性籠形(cage)結構之生成 [Example 1-c] Generation of continuous cage structure

於上述實施例1-b混合溶液中非常緩慢地滴加0.36重量%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,一次性滴 加二苯基四甲氧基二矽氧烷(Diphenyltetramethoxydisiloxane)5重量份而謀求穩定之水解,攪拌1小時後再次添加實施例1-a中所製造之觸媒7重量份而將混合溶液之pH值調節為鹼性狀態。此時,與線狀高分子分開而單獨形成烷氧基(alkoxy)開放之D結構之前驅物。滴取少量樣品,藉由H-NMR(Nuclear Magnetic Resonance,核磁共振)及IR進行分析而確認甲氧基(methoxy)之殘留率之後,殘留率為20%時,緩緩滴加0.36重量%之HCl水溶液10重量份而將pH值調節為酸性。其後,一次性滴加苯基三甲氧基矽烷(Phenyltrimethoxysilane)1重量份並攪拌15分鐘後,添加1-a中所製造之觸媒20重量份。混合攪拌4小時後進行確認,結果可確認於高分子內生成籠形(cage)形態之高分子。其後,使溫度變化至常溫,並藉由真空而去除混合溶液內之四氫呋喃,使得所有反應物轉化為水溶液混合物。混合攪拌4小時後,滴取一部分,通過29Si-NMR而進行分析,結果顯示出銳利形態之2個使用苯基(phenyl)而導入之結構之分析波峰,可確認製造出50%以上之如化學式1之A-D高分子而無另外單獨殘留之副產物。又,苯乙烯換算分子量經測定為11,000,平均n值為4.6。29Si-NMR(CDCl3To the mixed solution of the above Example 1-b, 5 parts by weight of a 0.36 wt% aqueous HCl solution was added dropwise very slowly, adjusted so that the pH was acidic, and stirred at a temperature of 4 ° C for 30 minutes. Thereafter, 5 parts by weight of diphenyltetramethoxydisiloxane was added dropwise to obtain stable hydrolysis, and after stirring for 1 hour, 7 parts by weight of the catalyst produced in Example 1-a was again added. The pH of the mixed solution was adjusted to an alkaline state. At this time, an alkoxy-open D structure precursor is separately formed separately from the linear polymer. A small amount of the sample was dropped, and the residual ratio of methoxy was confirmed by H-NMR (Nuclear Magnetic Resonance) and IR analysis. When the residual ratio was 20%, 0.36 wt% was gradually added dropwise. The pH was adjusted to be acidic by 10 parts by weight of an aqueous HCl solution. Thereafter, 1 part by weight of phenyltrimethoxysilane (Phenyltrimethoxysilane) was added dropwise thereto and stirred for 15 minutes, and then 20 parts by weight of a catalyst produced in 1-a was added. After mixing and stirring for 4 hours, it was confirmed that a polymer having a cage form was formed in the polymer. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to convert all the reactants into an aqueous mixture. After mixing and stirring for 4 hours, a part of the solution was dropped and analyzed by 29 Si-NMR. As a result, it was confirmed that two analytical peaks of a structure in which a phenyl group was introduced in a sharp form were used, and it was confirmed that 50% or more of the composition was produced. The AD polymer of Chemical Formula 1 has no other by-products remaining alone. Further, the molecular weight in terms of styrene was measured to be 11,000, and the average n value was 4.6. 29 Si-NMR (CDCl 3 ) δ

[實施例1-d]光硬化型樹脂組成物之製造 [Example 1-d] Production of Photocurable Resin Composition

將上述實施例1-c中所獲得之矽倍半氧烷複合高分子30g以30wt%溶於甲基異丁基酮中而製造100g塗料組成物。其後,於塗料組成物100重量份中分別添加3重量份之氯苯乙酮(chloro acetophenone)、1重量份之BYK-347及1 重量份之BYK-UV3500,攪拌10分鐘而製造光硬化型塗料組成物。 30 g of the sesquisesquioxane composite polymer obtained in the above Example 1-c was dissolved in methyl isobutyl ketone at 30% by weight to prepare 100 g of a coating composition. Thereafter, 3 parts by weight of chloro acetophenone, 1 part by weight of BYK-347 and 1 are added to 100 parts by weight of the coating composition, respectively. The photohardenable coating composition was produced by stirring in a portion of BYK-UV3500 for 10 minutes.

[實施例1-e]熱硬化性樹脂組成物之製造 [Example 1-e] Production of thermosetting resin composition

將上述實施例1-c中所獲得之矽倍半氧烷複合高分子50g以50重量%溶於甲基乙基酮中而製造100g塗料組成物。其後,於所準備之塗料組成物100重量份中添加1,3-二胺基丙烷3重量份以及BYK-357及BYK-348各1重量份,攪拌10分鐘而製造熱硬化性塗料組成物。 50 g of the sesquisesquioxane composite polymer obtained in the above Example 1-c was dissolved in methyl ethyl ketone at 50% by weight to prepare 100 g of a coating composition. Then, 3 parts by weight of 1,3-diaminopropane and 1 part by weight of each of BYK-357 and BYK-348 were added to 100 parts by weight of the prepared coating composition, and the mixture was stirred for 10 minutes to produce a thermosetting coating composition. .

[實施例1-f]由高分子本身構成之塗料組成物 [Example 1-f] A coating composition composed of a polymer itself

僅藉由實施例1-c而無其他組成地構成塗料組成物。 The coating composition was constituted by only Example 1-c without other composition.

又,使用下述表19中所記載之單體製造矽倍半氧烷複合高分子,並製造塗料組成物。此時,製造方法係對等地使用上述實施例1-b、1-c、1-d、1-e及1-f中所使用之方法。 Further, a sesquisesquioxane composite polymer was produced using the monomers described in the following Table 19, and a coating composition was produced. At this time, the manufacturing method used the methods used in the above Examples 1-b, 1-c, 1-d, 1-e, and 1-f in a peer-to-peer manner.

實施例2:矽倍半氧烷D-A-D結構之複合高分子之合成 Example 2 : Synthesis of a composite polymer of a sesquioxane DAD structure

使用下述實施例,以製造D-A-D結構之複合高分子,並藉由與上述實施例1中所記載之方法對應之方法製造塗料組成物。觸媒及線狀結構之製造係同樣地使用實施例1-a及1-b之方法,其後藉由下述方法實施製造,以生成連續性D-A-D結構。 Using the following examples, a composite polymer of the D-A-D structure was produced, and a coating composition was produced by a method corresponding to the method described in the above Example 1. The manufacture of the catalyst and the linear structure was carried out in the same manner as in the methods of Examples 1-a and 1-b, and then produced by the following method to produce a continuous D-A-D structure.

[實施例2-a]過量之連續性籠形(cage)結構之生成 [Example 2-a] Generation of excess continuous cage structure

於上述實施例1-b混合溶液中非常緩慢地滴加0.36重量%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,一次性滴加為實施例1-b中所使用之二苯基四甲氧基二矽氧烷(Diphenyltetramethoxydisiloxane)之5倍的25重量份而謀求穩定之水解,攪拌1小時後再次添加實施例1-a中所製造之觸媒7重量份而將混合溶液之pH值調節為鹼性狀態。此時,與線狀高分子分開而單獨形成烷氧基(alkoxy)開放之D結構之前驅物。滴取少量樣品,藉由H-NMR及IR進行分析而確 認甲氧基(methoxy)之殘留率之後,殘留率為20%時,緩緩滴加0.36重量%之HCl水溶液10重量份而將pH值調節為酸性。其後,一次性滴加苯基三甲氧基矽烷(Phenyltrimethoxysilane)1重量份並攪拌15分鐘後,添加1-a中所製造之觸媒20重量份。混合攪拌4小時後進行確認,結果可確認於高分子內生成籠形(cage)形態之高分子。其後,使溫度變化至常溫,並藉由真空而去除混合溶液內之四氫呋喃,使得所有反應物轉化為水溶液混合物。混合攪拌4小時後,滴取一部分,通過29Si-NMR而進行分析,結果顯示出銳利形態之2個使用苯基(phenyl)而導入之結構之分析波峰,可確認製造出如化學式1之A-D高分子而無另外單獨殘留之副產物。又,苯乙烯換算分子量經測定為14,000,平均n值為4.6。又,藉由Si-NMR分析而確認到:不同於A-D結構,於A結構之末端出現之-68ppm附近之波峰消失,A結構之末端全部轉化為D結構而生成為D-A-D結構。29Si-NMR(CDCl3)δ-72.3(broad),-81.1(sharp),-80.8(sharp),-82.5(broad) To the mixed solution of the above Example 1-b, 5 parts by weight of a 0.36 wt% aqueous HCl solution was added dropwise very slowly, adjusted so that the pH was acidic, and stirred at a temperature of 4 ° C for 30 minutes. Thereafter, 25 parts by weight of 5 times the diphenyltetramethoxydisiloxane used in Example 1-b was added dropwise to obtain stable hydrolysis, and the mixture was stirred for 1 hour and then added again. The pH of the mixed solution was adjusted to an alkaline state by 7 parts by weight of the catalyst produced in Example 1-a. At this time, an alkoxy-open D structure precursor is separately formed separately from the linear polymer. A small amount of the sample was dropped, and the residual ratio of the methoxy group was confirmed by H-NMR and IR analysis. When the residual ratio was 20%, 10 parts by weight of a 0.36% by weight aqueous HCl solution was gradually added dropwise to adjust the pH. The value is adjusted to be acidic. Thereafter, 1 part by weight of phenyltrimethoxysilane (Phenyltrimethoxysilane) was added dropwise thereto and stirred for 15 minutes, and then 20 parts by weight of a catalyst produced in 1-a was added. After mixing and stirring for 4 hours, it was confirmed that a polymer having a cage form was formed in the polymer. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to convert all the reactants into an aqueous mixture. After mixing and stirring for 4 hours, a part of the mixture was dropped and analyzed by 29 Si-NMR. As a result, it was confirmed that two analytical peaks of a structure in which a phenyl group was introduced in a sharp form were used, and it was confirmed that AD of the chemical formula 1 was produced. The polymer does not have a separate by-product by-product. Further, the molecular weight in terms of styrene was measured to be 14,000, and the average n value was 4.6. Further, it was confirmed by Si-NMR analysis that, unlike the AD structure, the peak near -68 ppm which appeared at the end of the A structure disappeared, and all the ends of the A structure were converted into the D structure to form a DAD structure. 29 Si-NMR (CDCl 3 ) δ-72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)

又,使用下述表20中所記載之單體製造矽倍半氧烷複合高分子及塗料組成物。此時,製造方法係對等地使用上述實施例2中所使用之方法。 Further, a sesquisesquioxane composite polymer and a coating composition were produced using the monomers described in the following Table 20. At this time, the manufacturing method uses the method used in the above embodiment 2 in a peer-to-peer manner.

實施例3:矽倍半氧烷E-A-D結構之複合高分子之合成 Example 3 : Synthesis of a composite polymer of a sesquioxane EAD structure

使用下述實施例,以製造E-A-D結構之複合高分子,並藉由與上述實施例1中所記載之方法對應之方法製造塗料組成物。觸媒及線狀結構之製造係同樣地使用實施例1之方法,其後,藉由下述方法實施製造,以生成E-A-D結構。 Using the following examples, a composite polymer of the E-A-D structure was produced, and a coating composition was produced by a method corresponding to the method described in the above Example 1. The production of the catalyst and the linear structure was carried out in the same manner as in Example 1, and thereafter, the production was carried out by the following method to produce an E-A-D structure.

[實施例3-a]鏈末端E結構之生成 [Example 3-a] Generation of chain end E structure

於實施例1-c中所獲得之A-D混合物中不另行精製地滴加二氯甲烷20重量份,並滴加0.36重量%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,一次性滴加二甲基四甲氧基矽烷(dimethyltetramethoxysilane)1重量份。此時,於分子結構內尚未水解而存在之部分藉由已與溶劑分離之酸性水溶液 層而容易地轉化為水解物,並且藉由有機溶劑層而與所生成之另外之反應物縮合而於末端單元導入E。攪拌5小時後,停止反應之攪拌,並將反應器之溫度調節至常溫。 To the AD mixture obtained in Example 1-c, 20 parts by weight of dichloromethane was added dropwise without further purification, and 5 parts by weight of a 0.36% by weight aqueous HCl solution was added dropwise, and the pH was adjusted so as to be acidic. Stir at a temperature of 4 ° C for 30 minutes. Thereafter, 1 part by weight of dimethyltetramethoxysilane was added dropwise at a time. At this time, the portion which has not been hydrolyzed in the molecular structure exists by the acidic aqueous solution which has been separated from the solvent. The layer is easily converted into a hydrolyzate, and E is introduced into the terminal unit by condensation of the resulting reactant with an organic solvent layer. After stirring for 5 hours, the stirring of the reaction was stopped, and the temperature of the reactor was adjusted to normal temperature.

[實施例3-b]對末端E結構導入籠形(cage) [Example 3-b] Introduction of the end E structure into a cage

不另行精製地準備上述實施例3-a中所獲得之結果物之有機層之後,使用3官能單體將末端轉化為籠形(cage)結構。於進行反應中之實施例3-a混合溶液中一次性滴加甲基三甲氧基矽烷(Methyltrimethoxysilane)3重量份而謀求穩定之水解,攪拌24小時後,再次添加實施例1-a中所製造之觸媒3重量份而將混合溶液之pH值調節為鹼性狀態。此時,於E結構末端導入籠形(cage)形態之高分子,並於反應器內連續地進行反應而形成如化學式3之高分子。但由於係與其他副產物一同獲得,故而必須另行精製。其後,使溫度變化至常溫,藉由真空而去除混合溶液內之四氫呋喃而準備精製。 After preparing the organic layer of the result obtained in the above Example 3-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of methyl trimethoxysilane (Methyltrimethoxysilane) was added dropwise to the mixed solution of Example 3-a in the reaction to obtain stable hydrolysis, and after stirring for 24 hours, the product produced in Example 1-a was again added. The pH of the mixed solution was adjusted to an alkaline state by 3 parts by weight of the catalyst. At this time, a polymer in a cage form is introduced into the end of the E structure, and the reaction is continuously carried out in the reactor to form a polymer of Chemical Formula 3. However, since it is obtained together with other by-products, it must be separately refined. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to prepare for purification.

[實施例3-c]通過沈澱及再結晶的副產物之去除、結果物之獲得 [Example 3-c] Removal of by-products by precipitation and recrystallization, obtaining of the result

獲得上述實施例3-b中反應結束後之混合物後,使用蒸餾水進行洗淨,於蒸餾水層之pH值為中性時,藉由真空減壓而完全去除溶劑。其後,於甲醇中沈澱2次而去除未反應單體,並以30重量份溶於四氫呋喃與水溶液以9.5:0.5之重量比率混合而成之溶劑中,於-20℃之溫度下保存2天。其目的在於謀求未導入至高分子且因籠形(cage)結構而被封閉之物質之再結晶,使得精製容易進行。 The mixture after completion of the reaction in the above Example 3-b was obtained, and then washed with distilled water. When the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum decompression. Thereafter, it was precipitated twice in methanol to remove unreacted monomers, and stored in a solvent of 30 parts by weight of tetrahydrofuran and an aqueous solution in a weight ratio of 9.5:0.5, and stored at -20 ° C for 2 days. . The object of the invention is to recrystallize a substance which is not introduced into a polymer and which is blocked by a cage structure, so that purification can be easily carried out.

確認到:將結束再結晶過程而獲得之固體物質過濾後,通過真空減壓而一同獲得化學式3之高分子及各種副產物。又,於將GPC(Gel Permeation Chromatography,凝膠滲透層析)結果與NMR結果進行比較時,結果導出銳利(sharp)形態之籠形(Cage)形態而無因各步驟之高分子生長而單獨獲得之低分子,據此推斷,可確認無問題地獲得複合高分子。此時,分子量以苯乙烯換算值計為17,000,n之平均值為4.6,尤其是化學式3之結果如下。 It was confirmed that the solid matter obtained by the completion of the recrystallization process was filtered, and then the polymer of Chemical Formula 3 and various by-products were obtained together by vacuum reduction. Further, when the results of GPC (Gel Permeation Chromatography) were compared with the NMR results, the results were obtained in a sharp Cage form without being obtained by polymer growth in each step. From the viewpoint of the low molecular weight, it was confirmed that the composite polymer was obtained without problems. At this time, the molecular weight was 17,000 in terms of styrene, and the average value of n was 4.6. In particular, the results of Chemical Formula 3 were as follows.

29Si-NMR(CDCl3)δ-68.2,-71.8(sharp)。-72.3(broad),-81.1(sharp),-80.8(sharp),-82.5(broad) 29 Si-NMR (CDCl 3 ) δ - 68.2, -11.8 (sharp). -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)

又,使用下述表21中所記載之單體製造矽倍半氧烷複合高分子及塗料組成物。此時,製造方法係對等地使用上述實施例3中所使用之方法。 Further, a sesquisesquioxane composite polymer and a coating composition were produced using the monomers described in Table 21 below. At this time, the manufacturing method uses the method used in the above-described Embodiment 3 in a peer-to-peer manner.

實施例4:A-B-D結構之複合矽倍半氧烷高分子之合成 Example 4 : Synthesis of a composite sesquioxane polymer of ABD structure

關於合成步驟,係如下述般階段性地進行連續水解及縮合而製造E-A-D結構之複合高分子,並藉由與上述實施例1中所記載之方法對應之方法製造塗料組成物。 In the synthesis step, a composite polymer having an E-A-D structure was produced by successively hydrolyzing and condensing as follows, and a coating composition was produced by a method corresponding to the method described in the above Example 1.

[實施例4-a]用於水解及縮合反應之觸媒之製造 [Example 4-a] Manufacture of Catalyst for Hydrolysis and Condensation Reaction

為了調節鹼度,於25wt%之氫氧化四甲基銨(Tetramethylammonium hydroxide:TMAH)水溶液中混合10wt%之氫氧化鉀(Potassium hydroxide:KOH)水溶液而準備觸媒1a。 In order to adjust the alkalinity, a catalyst of 1% by weight of a potassium hydroxide (KOHSium hydroxide: KOH) aqueous solution was mixed with a 25 wt% aqueous solution of tetramethylammonium hydroxide (TMAH) to prepare a catalyst 1a.

[實施例4-b]線狀矽倍半氧烷結構之合成(A-B前驅物之合成) [Example 4-b] Synthesis of linear sesquioxanes structure (synthesis of A-B precursor)

於配備冷卻管及攪拌機之經乾燥之燒瓶中滴加蒸餾水5重量份、四氫呋喃40重量份及上述實施例4-a中所製造之觸媒0.5重量份,於常溫下攪拌1小時後,滴加2-(3,4-環氧環己基)乙基三甲氧基矽烷10重量份,並再次滴加四氫呋喃20重量份滴加,追加攪拌2小時。滴取攪拌中之混合溶液,藉由洗淨兩次而去除、過濾觸媒及雜質後,獲得線狀矽倍半氧烷,通過1H-NMR分析,殘留之烷氧基(alkoxy group)為0.1mmol/g以下。其係用於之後藉由連續反應而導入籠形(cage)之部分。關於線狀結構之形態分析,通過XRD(X-ray diffraction,X射線繞射)分析,確認到整體性結構為線狀結構體。測定分子量,結果可確認線狀結構之矽倍半氧烷具有6,000之苯乙烯換算分子量。 5 parts by weight of distilled water, 40 parts by weight of tetrahydrofuran, and 0.5 part by weight of the catalyst prepared in the above Example 4-a were added dropwise to a dried flask equipped with a cooling tube and a stirrer, and stirred at room temperature for 1 hour, followed by dropwise addition. 10 parts by weight of 2-(3,4-epoxycyclohexyl)ethyltrimethoxynonane, and 20 parts by weight of tetrahydrofuran was added dropwise thereto, and the mixture was further stirred for 2 hours. The mixed solution in the stirring was dripped, and the catalyst and the impurities were removed by washing twice to obtain a linear sesquisesquioxane. The residual alkoxy group was analyzed by 1 H-NMR. 0.1 mmol/g or less. It is used to introduce a portion of the cage after continuous reaction. Regarding the morphological analysis of the linear structure, it was confirmed by XRD (X-ray diffraction) analysis that the integral structure was a linear structure. When the molecular weight was measured, it was confirmed that the linear structure of the sesquisesquioxane had a molecular weight of 6,000 in terms of styrene.

1H-NMR(CDCl3)δ3.7,3.4,3.3(broad),3.1,2.8,2.6, 1.5(broad),0.6。 1 H-NMR (CDCl 3 ) δ 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6.

[實施例4-c]用於鏈內籠形(cage)結構之生成之pH值轉換反應(B、D結構之導入) [Example 4-c] pH conversion reaction for the formation of a cage structure in the chain (introduction of B and D structures)

於進行反應中之實施例4-b混合溶液中非常緩慢地滴加0.36wt%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,一次性滴加二苯基四甲氧基二矽氧烷(DiPhenyltetramethoxydisiloxane)5重量份,攪拌1小時後,再次添加實施例4-a中所製造之觸媒5重量份而將混合溶液之pH值調節為鹼性狀態。此時,可確認與線狀結構體分開而單獨生成籠形(cage)形態之結構體且被導入至高分子鏈,使溫度變化至常溫,並藉由真空而去除混合溶液內之四氫呋喃,使得所有反應物轉化為水溶液混合物。混合攪拌4小時後,滴取一部分,通過29Si-NMR及1H-NMR而進行分析,結果可確認存在於B結構內之烷氧基(alkoxy group)之量變化為0.025mmol/g,且以約5:5之比率導入有B及D之重複單元。又,苯乙烯換算分子量經測定為10,000。又,雖然導入有籠形(cage)結構,但於高分子之GPC形態下未見單獨籠形(cage)物質之分子量分佈,故而可確認籠形(cage)結構通過連續反應而良好地導入至高分子鏈。 To the mixed solution of Example 4-b in the reaction, 5 parts by weight of a 0.36 wt% aqueous HCl solution was added dropwise very slowly, adjusted so that the pH was acidic, and stirred at a temperature of 4 ° C for 30 minutes. Thereafter, 5 parts by weight of diPhenyltetramethoxydisiloxane was added dropwise thereto, and after stirring for 1 hour, 5 parts by weight of the catalyst prepared in Example 4-a was again added to mix the solution. The pH is adjusted to an alkaline state. In this case, it was confirmed that the structure of the cage form was separately formed from the linear structure and introduced into the polymer chain, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum, so that all The reactants are converted to an aqueous mixture. After the mixture was stirred for 4 hours, a part of the mixture was separated and analyzed by 29 Si-NMR and 1 H-NMR. As a result, it was confirmed that the amount of the alkoxy group present in the B structure was changed to 0.025 mmol/g. The repeating unit having B and D is introduced at a ratio of about 5:5. Further, the molecular weight in terms of styrene was measured to be 10,000. Further, although a cage structure was introduced, the molecular weight distribution of a separate cage material was not observed in the GPC form of the polymer, and it was confirmed that the cage structure was favorably introduced into the high state by continuous reaction. molecular chain.

1H-NMR(CDCl3)δ7.5,7.2,3.7,3.4,3.3(broad),3.1,2.8,2.6,1.5(broad),0.6。29Si-NMR(CDCl3)δ-72.5(broad),-81.1(sharp),-80.8(sharp),-79.9(sharp),-82.5(broad) 1 H-NMR (CDCl 3 ) δ 7.5, 7.2, 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6. 29 Si-NMR (CDCl 3 ) δ-72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -82.5 (broad)

[實施例4-d]於B結構內導入X(B、D結構之導入) [Example 4-d] Introduction of X into the B structure (introduction of B and D structures)

不另行精製地準備上述實施例4-c中所獲得之結果物之有機層之後,使用3官能單體將末端轉化為籠形(cage)結構。將實施例4-c中所獲得之物質100重量份溶於50重量份之四氫呋喃中之後,加入5重量份之蒸餾水而製造混合溶液。其後,於所製造之混合溶液中添加0.36wt%之HCl 10重量份並攪拌10分鐘之後,一次性滴加甲基三甲氧基矽烷(Methyltrimethoxysilane)3重量份而謀求穩定之水解。攪拌24小時後,再次添加實施例4-a中所製造之觸媒3重量份而將混合溶液之pH值調節為鹼性狀態。此時,於B結構之X部分導入籠形(cage)形態之高分子,並於反應器內連續地進行反應而形成如化學式4之高分子。但由於係與其他副產物一同獲得,故而必須另行精製。其後,使溫度變化至常溫,藉由真空而去除混合溶液內之四氫呋喃而準備精製。 After preparing the organic layer of the result obtained in the above Example 4-c without further purification, the terminal was converted into a cage structure using a trifunctional monomer. After 100 parts by weight of the material obtained in Example 4-c was dissolved in 50 parts by weight of tetrahydrofuran, 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% of HCl was added to the produced mixed solution and stirred for 10 minutes, and then 3 parts by weight of methyltrimethoxysilane (Methyltrimethoxysilane) was added dropwise to obtain stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 4-a was again added to adjust the pH of the mixed solution to an alkaline state. At this time, a polymer in a cage form is introduced into the X portion of the B structure, and the reaction is continuously carried out in the reactor to form a polymer of Chemical Formula 4. However, since it is obtained together with other by-products, it must be separately refined. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to prepare for purification.

[實施例4-e]通過沈澱及再結晶的副產物去除、結果物之獲得 [Example 4-e] Removal by by-product of precipitation and recrystallization, obtaining of the result

於上述實施例4-d中反應結束後之混合物中加入二氯甲烷200重量份,與蒸餾水一同進行區分洗淨,於蒸餾水層之pH值為中性時,藉由真空減壓而完全去除溶劑。其後,於甲醇中沈澱2次而去除未反應單體,並以30重量份溶於四氫呋喃與水溶液以9.5:0.5之重量比率混合而成之溶劑中,於-20℃之溫度下保存2天。其目的在於謀求未導入至高分子且因籠形(cage)結構而被封閉之物質之再結晶,使得精製容易進行。 200 parts by weight of dichloromethane was added to the mixture after the completion of the reaction in the above Example 4-d, and washed separately with distilled water. When the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum decompression. . Thereafter, it was precipitated twice in methanol to remove unreacted monomers, and stored in a solvent of 30 parts by weight of tetrahydrofuran and an aqueous solution in a weight ratio of 9.5:0.5, and stored at -20 ° C for 2 days. . The object of the invention is to recrystallize a substance which is not introduced into a polymer and which is blocked by a cage structure, so that purification can be easily carried out.

確認到:將結束再結晶過程而獲得之固體物質過 濾後,通過真空減壓而獲得化學式4之高分子而無各種副產物。又,於將GPC結果與NMR結果進行比較時,結果導出銳利(Sharp)形態之籠形(cage)形態而無因各步驟之高分子生長而單獨獲得之低分子,據此推斷,可確認無問題地獲得複合高分子。此時,分子量以苯乙烯換算值計可獲得12,000之值,X之n之平均值為4.6,Y之n之平均值為4.6,尤其是化學式4之結果如下。 Confirmed that the solid matter obtained by the end of the recrystallization process has passed After filtration, the polymer of Chemical Formula 4 was obtained by vacuum decompression without various by-products. Further, when the GPC result is compared with the NMR result, the result is a cage form in which a sharp form is obtained without a low molecule obtained by polymer growth in each step, and it is inferred that no Problemly obtaining a composite polymer. At this time, the molecular weight was a value of 12,000 in terms of styrene, and the average value of n of n was 4.6, and the average value of n of 4.7 was 4.6, and the result of Chemical Formula 4 was as follows.

29Si-NMR(CDCl3)δ-72.5(broad),-81.1(sharp),-80.8(sharp),-79.9(sharp),-81.5(sharp),-82.5(broad) 29 Si-NMR (CDCl 3 ) δ-72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -81.5 (sharp), -82.5 (broad)

下述表22中所記載之單體製造矽倍半氧烷複合高分子及塗料組成物。此時,製造方法係對等地使用上述實施例4中所使用之方法。 The oxime sesquioxane composite polymer and the coating composition were produced from the monomers described in Table 22 below. At this time, the manufacturing method uses the method used in the above-described Embodiment 4 in a peer-to-peer manner.

實施例5:D-A-B-D結構之複合矽倍半氧烷高分子之合成 Example 5 : Synthesis of a composite sesquioxane polymer of DABD structure

使用下述方法,以製造D-A-B-D結構之複合高分子,並藉由與上述實施例1對等之方法而製造塗佈組合物。 The composite polymer of the D-A-B-D structure was produced by the following method, and the coating composition was produced by the method equivalent to the above Example 1.

[實施例5-a]用於D結構之過量生成之pH值轉換反應(B、D結構之導入) [Example 5-a] pH conversion reaction for excessive formation of D structure (introduction of B and D structures)

於進行反應中之實施例4-b混合溶液中非常緩慢地滴加0.36wt%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,以實施例4-b之5倍即25重量份準備二苯基四甲氧基二矽氧烷(DiPhenyltetramethoxydisiloxane)之量並一次性滴加,攪拌1小時後,再次添加實施例1-a中所製造之觸媒5重量份而將混合溶液之pH值調節為鹼性狀態。反應結束後,使溫度變化至常溫,並藉由真空而去除混合溶液內之四氫呋喃,使得所有反應物轉化為水溶液混合物。混合攪拌4小時後,滴取一部分,通過29Si-NMR及1H-NMR而進行分析,結果可確認存在於B結構內之烷氧基(alkoxy group)之量變化為0.012mmol/g,且以約1:9之比率導入有B及D之重複單元。又,苯乙烯換算分子量經測定為24,000。又,雖然導入有籠形(cage)結構,但於高分子之GPC形態下未見單獨籠形(cage) 物質之分子量分佈,故而可確認籠形(cage)結構通過連續反應而良好地導入至高分子鏈。 To the mixed solution of Example 4-b in the reaction, 5 parts by weight of a 0.36 wt% aqueous HCl solution was added dropwise very slowly, adjusted so that the pH was acidic, and stirred at a temperature of 4 ° C for 30 minutes. Thereafter, the amount of diPhenyltetramethoxydisiloxane was prepared in an amount of 5 times, that is, 25 parts by weight of Example 4-b, and added dropwise at a time. After stirring for 1 hour, Example 1 was again added. The pH of the mixed solution was adjusted to an alkaline state by 5 parts by weight of the catalyst produced in a. After the end of the reaction, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to convert all the reactants into an aqueous mixture. After mixing and stirring for 4 hours, a part of the mixture was dropped and analyzed by 29 Si-NMR and 1 H-NMR. As a result, it was confirmed that the amount of the alkoxy group present in the B structure was changed to 0.012 mmol/g. The repeating unit having B and D is introduced at a ratio of about 1:9. Further, the molecular weight in terms of styrene was measured to be 24,000. Further, although a cage structure was introduced, the molecular weight distribution of a separate cage material was not observed in the GPC form of the polymer, and it was confirmed that the cage structure was favorably introduced into the high state by continuous reaction. molecular chain.

1H-NMR(CDCl3)δ7.5,7.2,3.7,3.4,3.3(broad),3.1,2.8,2.6,1.5(broad),0.6。29Si-NMR(CDCl3)δ-72.5(broad),-81.1(sharp),-80.8(sharp),-79.9(sharp),-82.5(broad) 1 H-NMR (CDCl 3 ) δ 7.5, 7.2, 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6. 29 Si-NMR (CDCl 3 ) δ-72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -82.5 (broad)

[實施例5-b]於B結構內導入X(B、D結構之導入) [Example 5-b] Introduction of X into the B structure (introduction of B and D structures)

不另行精製地準備上述實施例5-a中所獲得之結果物之有機層之後,使用3官能單體將末端轉化為籠形(cage)結構。將實施例5-a中所獲得之物質100重量份溶於50重量份之四氫呋喃中之後,加入5重量份之蒸餾水而製造混合溶液。其後,於所製造之混合溶液中添加0.36wt%之HCl 10重量份並攪拌10分鐘後,一次性滴加甲基三甲氧基矽烷(Methyltrimethoxysilane)3重量份而謀求穩定之水解。攪拌24小時後,再次添加實施例4-a中所製造之觸媒3重量份而將混合溶液之pH值調節為鹼性狀態。此時,於B結構之X部分導入籠形(cage)形態之高分子,並於反應器內連續地進行反應而形成如化學式5之高分子。但由於係與其他副產物一同獲得,故而必須另行精製。其後,使溫度變化至常溫,藉由真空而去除混合溶液內之四氫呋喃而準備精製。 After preparing the organic layer of the result obtained in the above Example 5-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. After 100 parts by weight of the material obtained in Example 5-a was dissolved in 50 parts by weight of tetrahydrofuran, 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% of HCl was added to the produced mixed solution and stirred for 10 minutes, and then 3 parts by weight of methyltrimethoxysilane (Methyltrimethoxysilane) was added dropwise to obtain stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 4-a was again added to adjust the pH of the mixed solution to an alkaline state. At this time, a polymer in a cage form is introduced into the X portion of the B structure, and the reaction is continuously carried out in the reactor to form a polymer of Chemical Formula 5. However, since it is obtained together with other by-products, it must be separately refined. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to prepare for purification.

[實施例5-c]通過沈澱及再結晶的副產物去除、結果物之獲得 [Example 5-c] Removal by by-product of precipitation and recrystallization, obtaining of the result

於上述實施例5-b中反應結束後之混合物中加入二氯甲烷200重量份,與蒸餾水一同進行區分洗淨,於蒸餾水層之pH值為中性時,藉由真空減壓而完全去除溶劑。其 後,於甲醇中沈澱2次而去除未反應單體,並以30重量份溶於四氫呋喃與水溶液以9.5:0.5之重量比率混合而成之溶劑中,於-20℃之溫度下保存2天。其目的在於謀求未導入至高分子且因籠形(cage)結構而被封閉之物質之再結晶,使得精製容易進行。 200 parts by weight of dichloromethane was added to the mixture after the completion of the reaction in the above Example 5-b, and washed separately with distilled water. When the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum decompression. . its Thereafter, the unreacted monomers were removed by precipitation twice in methanol, and 30 parts by weight of a solvent in which tetrahydrofuran and an aqueous solution were mixed at a weight ratio of 9.5:0.5 were stored at -20 ° C for 2 days. The object of the invention is to recrystallize a substance which is not introduced into a polymer and which is blocked by a cage structure, so that purification can be easily carried out.

確認到:將結束再結晶過程而獲得之固體物質過濾後,通過真空減壓而獲得化學式5之高分子而無各種副產物。又,於將GPC結果與NMR結果進行比較時,結果導出銳利(Sharp)形態之籠形(cage)形態而無因各步驟之高分子生長而單獨獲得之低分子,據此推斷,可確認無問題地獲得複合高分子。此時,分子量以苯乙烯換算值計可獲得16,000之值,X之n之平均值為4.6,Y之n之平均值為4.6,尤其是化學式5之結果如下。 It was confirmed that the solid matter obtained by the completion of the recrystallization process was filtered, and then the polymer of Chemical Formula 5 was obtained by vacuum decompression without various by-products. Further, when the GPC result is compared with the NMR result, the result is a cage form in which a sharp form is obtained without a low molecule obtained by polymer growth in each step, and it is inferred that no Problemly obtaining a composite polymer. At this time, the molecular weight was a value of 16,000 in terms of styrene, and the average value of n of n was 4.6, and the average value of n of 4.7 was 4.6. In particular, the result of Chemical Formula 5 was as follows.

29Si-NMR(CDCl3)δ-72.5(broad),-81.1(sharp),-80.8(sharp),-79.9(sharp),-81.5(sharp),-82.5(broad) 29 Si-NMR (CDCl 3 ) δ-72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -81.5 (sharp), -82.5 (broad)

又,使用下述表23中所記載之單體製造矽倍半氧烷複合高分子及塗料組成物。此時,製造方法係對等地使用上述實施例5中所使用之方法。 Further, a sesquisesquioxane composite polymer and a coating composition were produced using the monomers described in Table 23 below. At this time, the manufacturing method uses the method used in the above-described Embodiment 5 in a peer-to-peer manner.

實施例6:矽倍半氧烷E-A-B-D結構之複合高分子之合成 Example 6 : Synthesis of a composite polymer of oxime sesquioxane EABD structure

使用下述方法,以製造E-A-B-D結構之複合高分子,並藉由與上述實施例1對等之方法而製造塗佈組合物。 The composite polymer of the E-A-B-D structure was produced by the following method, and the coating composition was produced by the method equivalent to the above Example 1.

[實施例6-a]鏈末端E結構之生成 [Example 6-a] Generation of chain end E structure

於實施例4-c中所獲得之混合物中不另行精製地滴加二氯甲烷20重量份,並滴加0.36重量%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,一次性滴加二甲基四甲氧基矽烷(dimethyltetramethoxysilane)1重量份。此時,於分子結構內尚未水解而存在之部分藉由已與溶劑分離之酸性水溶液層而容易地轉化為水解物,並且藉由有機溶劑層而與所生成之另外之反應物縮合而於末端單元導入E。攪拌5小時後, 停止反應之攪拌,並將反應器之溫度調節至常溫。 To the mixture obtained in Example 4-c, 20 parts by weight of dichloromethane was added dropwise without further purification, and 5 parts by weight of a 0.36% by weight aqueous HCl solution was added dropwise, and the pH was adjusted so as to be acidic. Stir at a temperature of 4 ° C for 30 minutes. Thereafter, 1 part by weight of dimethyltetramethoxysilane was added dropwise at a time. At this time, a portion which has not been hydrolyzed in the molecular structure is easily converted into a hydrolyzate by an acidic aqueous layer which has been separated from the solvent, and is condensed with the other reactant formed by the organic solvent layer at the end. The unit imports E. After stirring for 5 hours, The stirring of the reaction was stopped, and the temperature of the reactor was adjusted to normal temperature.

[實施例6-b]對B結構及末端E結構之X導入籠形(cage) [Example 6-b] Introduction of the B structure and the end E structure into the cage (cage)

不另行精製地準備上述實施例6-a中所獲得之結果物之有機層之後,使用3官能單體將末端轉化為籠形(cage)結構。於進行反應中之實施例6-a混合溶液中一次性滴加甲基三甲氧基矽烷(Methyltrimethoxysilane)3重量份而謀求穩定之水解,攪拌24小時後,再次添加實施例1-a中所製造之觸媒3重量份而將混合溶液之pH值調節為鹼性狀態。此時,於E結構末端導入籠形(cage)形態之高分子,並於反應器內連續地進行反應而形成如化學式6之高分子。但由於係與其他副產物一同獲得,故而必須另行精製。其後,使溫度變化至常溫,藉由真空而去除混合溶液內之四氫呋喃而準備精製。 After the organic layer of the result obtained in the above Example 6-a was prepared without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of methyl trimethoxysilane (Methyltrimethoxysilane) was added dropwise in the mixed solution of Example 6-a in the reaction to obtain stable hydrolysis, and after stirring for 24 hours, the product produced in Example 1-a was again added. The pH of the mixed solution was adjusted to an alkaline state by 3 parts by weight of the catalyst. At this time, a polymer in a cage form is introduced into the end of the E structure, and the reaction is continuously carried out in the reactor to form a polymer of Chemical Formula 6. However, since it is obtained together with other by-products, it must be separately refined. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to prepare for purification.

[實施例6-c]通過沈澱及再結晶的副產物去除、結果物之獲得 [Example 6-c] Removal by by-product of precipitation and recrystallization, obtaining of the result

獲得上述實施例6-b中反應結束後之混合物後,使用蒸餾水進行洗淨,於蒸餾水層之pH值為中性時,藉由真空減壓而完全去除溶劑。其後,於甲醇中沈澱2次而去除未反應單體,並以30重量份溶於四氫呋喃與水溶液以9.5:0.5之重量比率混合而成之溶劑中,於-20℃之溫度下保存2天。其目的在於謀求未導入至高分子且因籠形(cage)結構而被封閉之物質之再結晶,而簡單地進行精製。 After the mixture of the above-mentioned Example 6-b was completed, it was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum decompression. Thereafter, it was precipitated twice in methanol to remove unreacted monomers, and stored in a solvent of 30 parts by weight of tetrahydrofuran and an aqueous solution in a weight ratio of 9.5:0.5, and stored at -20 ° C for 2 days. . The object of the invention is to refine the material which is not introduced into a polymer and which is blocked by a cage structure, and is simply purified.

確認到:將結束再結晶過程而獲得之固體物質過濾後,通過真空減壓而一同獲得化學式6之高分子及各種副 產物。又,於將GPC結果與NMR結果進行比較時,結果導出銳利(Sharp)形態之籠形(cage)形態而無因各步驟之高分子生長而單獨獲得之低分子,據此推斷,可確認無問題地獲得複合高分子。此時,分子量以苯乙烯換算值計可獲得21,000之值,X之n之平均值為4.6,Y之n之平均值為4.6,尤其是化學式6之結果如下。 It was confirmed that the solid matter obtained by the completion of the recrystallization process was filtered, and the polymer of the chemical formula 6 and various vices were obtained together by vacuum decompression. product. Further, when the GPC result is compared with the NMR result, the result is a cage form in which a sharp form is obtained without a low molecule obtained by polymer growth in each step, and it is inferred that no Problemly obtaining a composite polymer. At this time, the molecular weight was 21,000 in terms of styrene, and the average value of n of n was 4.6, and the average value of n of 4.7 was 4.6, and the result of Chemical Formula 6 was as follows.

29Si-NMR(CDCl3)δ-68.2,-71.8(sharp),-72.3(broad),-81.1(sharp),-80.8(sharp),-82.5(broad) 29 Si-NMR (CDCl 3 ) δ-68.2, -71.8 (sharp), -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)

又,使用下述表24中所記載之單體製造矽倍半氧烷複合高分子。此時,製造方法係對等地使用上述實施例6中所使用之方法。 Further, a sesquisesquioxane composite polymer was produced using the monomers described in Table 24 below. At this time, the manufacturing method uses the method used in the above-described Embodiment 6 in a peer-to-peer manner.

實施例7:矽倍半氧烷A-B-A-D結構之複合高分子之合成 Example 7 : Synthesis of a composite polymer of hydrazine sesquioxane ABAD structure

關於合成步驟,係如下述般階段性地進行連續水解及縮合,並使用與上述實施例1同樣之方法製造塗料組成物。 With respect to the synthesis step, continuous hydrolysis and condensation were carried out in stages as follows, and a coating composition was produced in the same manner as in the above Example 1.

[實施例7-a]觸媒之製造 [Example 7-a] Manufacture of catalyst

為了調節鹼度,於25重量%之氫氧化四甲基銨(Tetramethylammonium hydroxide:TMAH)水溶液中混合10重量%之氫氧化鉀(Potassium hydroxide:KOH)水溶液而準備觸媒1a。 In order to adjust the alkalinity, a 10% by weight aqueous solution of potassium hydroxide (Potassium hydroxide: KOH) was mixed with a 25% by weight aqueous solution of tetramethylammonium hydroxide (TMAH) to prepare a catalyst 1a.

[實施例7-b]線狀矽倍半氧烷之合成(A前驅物) [Example 7-b] Synthesis of linear sesquioxanes (A precursor)

於配備冷卻管及攪拌機之經乾燥之燒瓶中滴加蒸餾水5重量份、四氫呋喃15重量份及上述實施例7-a中所製造之觸媒1重量份,於常溫下攪拌1小時後,滴加2-(3,4-環氧環己基)乙基三甲氧基矽烷20重量份,並再次滴加四氫呋喃15重量份,追加攪拌5小時。滴取攪拌中之混合溶液,藉由洗淨兩次而去除、過濾觸媒及雜質後,可通過IR分析而確認生成於末端基之SI-OH官能基(3200cm-1),測定分子量,結果可確認線狀結構之矽倍半氧烷具有6,000之苯乙烯換算分子量。 5 parts by weight of distilled water, 15 parts by weight of tetrahydrofuran, and 1 part by weight of the catalyst prepared in the above Example 7-a were added dropwise to a dried flask equipped with a cooling tube and a stirrer, and stirred at room temperature for 1 hour, followed by dropwise addition. 20 parts by weight of 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, and 15 parts by weight of tetrahydrofuran were further added dropwise thereto, and the mixture was further stirred for 5 hours. The mixed solution in the stirring was dropped, and after removing the catalyst and impurities by washing twice, the SI-OH functional group (3200 cm -1 ) formed at the terminal group was confirmed by IR analysis, and the molecular weight was measured. It was confirmed that the linear heptasilane has a styrene-converted molecular weight of 6,000.

[實施例7-c]線狀矽倍半氧烷結構之合成(A-B前驅物之合成) [Example 7-c] Synthesis of linear sesquisesquioxane structure (synthesis of A-B precursor)

於配備冷卻管及攪拌機之經乾燥之燒瓶中滴加蒸餾水5重量份、四氫呋喃40重量份及上述實施例7-a中所 製造之觸媒0.5重量份,於常溫下攪拌1小時後,滴加2-(3,4-環氧環己基)乙基三甲氧基矽烷10重量份,並再次滴加四氫呋喃20重量份,追加攪拌2小時。滴取攪拌中之混合溶液,藉由洗淨兩次而去除、過濾觸媒及雜質後,獲得線狀矽倍半氧烷,通過1H-NMR分析,殘留之烷氧基(alkoxy group)為0.1mmol/g以下。其係用於之後藉由連續反應而導入籠形(cage)之部分。關於線狀結構之形態分析,通過XRD分析,確認到整體性結構為線狀結構體。測定分子量,結果可確認線狀結構之矽倍半氧烷具有8,000之苯乙烯換算分子量。 5 parts by weight of distilled water, 40 parts by weight of tetrahydrofuran, and 0.5 part by weight of the catalyst prepared in the above Example 7-a were added dropwise to a dried flask equipped with a cooling tube and a stirrer, and the mixture was stirred at room temperature for 1 hour, and then added dropwise. 10 parts by weight of 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, and 20 parts by weight of tetrahydrofuran was further added dropwise thereto, and the mixture was further stirred for 2 hours. The mixed solution in the stirring was dripped, and the catalyst and the impurities were removed by washing twice to obtain a linear sesquisesquioxane. The residual alkoxy group was analyzed by 1 H-NMR. 0.1 mmol/g or less. It is used to introduce a portion of the cage after continuous reaction. Regarding the morphological analysis of the linear structure, it was confirmed by XRD analysis that the integral structure was a linear structure. When the molecular weight was measured, it was confirmed that the linear structure of the sesquisestamer has a molecular weight of 8,000 in terms of styrene.

[實施例7-d]線狀矽倍半氧烷結構之合成(A-B-A前驅物之合成) [Example 7-d] Synthesis of linear sesquioxanes structure (synthesis of A-B-A precursor)

於配備冷卻管及攪拌機之經乾燥之燒瓶中滴加蒸餾水5重量份、四氫呋喃5重量份及所製造之實施例7-a觸媒10重量份,於常溫下攪拌1小時後,分別滴加實施例7-b前驅物及7-c前驅物各20重量份,並再次滴加四氫呋喃10重量份,追加攪拌24小時。滴取攪拌中之混合溶液,藉由洗淨兩次而去除、過濾觸媒及雜質後,可通過IR分析而確認生成於末端基之SI-OH官能基(3200cm-1),測定分子量,結果可確認線狀結構之矽倍半氧烷具有15,000之苯乙烯換算分子量。 5 parts by weight of distilled water, 5 parts by weight of tetrahydrofuran, and 10 parts by weight of the catalyst of Example 7-a produced were added dropwise to a dried flask equipped with a cooling tube and a stirrer, and the mixture was stirred at room temperature for 1 hour, and then added dropwise. 20 parts by weight of each of the 7-b precursor and the 7-c precursor, and 10 parts by weight of tetrahydrofuran was further added dropwise thereto, and the mixture was further stirred for 24 hours. The mixed solution in the stirring was dropped, and after removing the catalyst and impurities by washing twice, the SI-OH functional group (3200 cm -1 ) formed at the terminal group was confirmed by IR analysis, and the molecular weight was measured. It was confirmed that the linear heptasilane has a molecular weight of styrene of 15,000.

1H-NMR(CDCl3)δ3.7,3.4,3.3(broad),3.1,2.8,2.6,1.5(broad),0.6。 1 H-NMR (CDCl 3 ) δ 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6.

[實施例7-e]連續性籠形(cage)結構之生成(D結構之導 入) [Example 7-e] Generation of continuous cage structure (guide of D structure) In)

於上述實施例7-d混合溶液中非常緩慢地滴加0.36重量%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,一次性滴加二苯基四甲氧基二矽氧烷(DiPhenyltetramethoxydisiloxane)5重量份而謀求穩定之水解,攪拌1小時後,再次添加實施例7-a中所製造之觸媒7重量份而將混合溶液之pH值調節為鹼性狀態。此時,與線狀高分子分開而單獨形成烷氧基(alkoxy)開放之D結構之前驅物。滴取少量樣品,藉由H-NMR及IR進行分析而確認甲氧基(methoxy)之殘留率之後,殘留率為10%時,緩緩滴加0.36重量%之HCl水溶液10重量份而將pH值調節為酸性。其後,一次性滴加苯基三甲氧基矽烷(Phenyltrimethoxysilane)1重量份並攪拌15分鐘後,添加1-a中所製造之觸媒20重量份。混合攪拌4小時後進行確認,結果可確認於高分子內生成籠形(cage)形態之高分子。其後,使溫度變化至常溫,並藉由真空而去除混合溶液內之四氫呋喃,使得所有反應物轉化為水溶液混合物。混合攪拌4小時後,滴取一部分,通過29Si-NMR而進行分析,結果顯示出銳利形態之2個使用苯基(phenyl)而導入之結構之分析波峰,可確認製造出如化學式7之高分子而無另外殘留之副產物。又,苯乙烯換算分子量經測定為18,000。 To the mixed solution of the above Example 7-d, 5 parts by weight of a 0.36 wt% aqueous HCl solution was added dropwise very slowly, adjusted so that the pH was acidic, and stirred at a temperature of 4 ° C for 30 minutes. Thereafter, 5 parts by weight of diPhenyltetramethoxydisiloxane was added dropwise in one portion to obtain stable hydrolysis, and after stirring for 1 hour, the catalyst 7 produced in Example 7-a was again added. The pH of the mixed solution was adjusted to an alkaline state. At this time, an alkoxy-open D structure precursor is separately formed separately from the linear polymer. A small amount of the sample was dropped, and the residual ratio of the methoxy group was confirmed by H-NMR and IR analysis. When the residual ratio was 10%, 10 parts by weight of a 0.36 wt% aqueous HCl solution was gradually added dropwise to adjust the pH. The value is adjusted to be acidic. Thereafter, 1 part by weight of phenyltrimethoxysilane (Phenyltrimethoxysilane) was added dropwise thereto and stirred for 15 minutes, and then 20 parts by weight of a catalyst produced in 1-a was added. After mixing and stirring for 4 hours, it was confirmed that a polymer having a cage form was formed in the polymer. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to convert all the reactants into an aqueous mixture. After stirring and stirring for 4 hours, a part of the mixture was dropped and analyzed by 29 Si-NMR. As a result, it was confirmed that the analysis peak of the structure in which two phenyl (phenyl) were introduced in a sharp form was observed, and it was confirmed that the production was as high as Chemical Formula 7. Molecules without additional by-products. Further, the molecular weight in terms of styrene was measured to be 18,000.

29Si-NMR(CDCl3)δ-68.2,-72.3(broad),-81.1(sharp),-80.8(sharp),-82.5(broad) 29 Si-NMR (CDCl 3 ) δ-68.2, -72.3 (broad), -81.1 (sharp), -80.8 (sharp), -82.5 (broad)

[實施例7-f]於B結構內導入X(A-B-A-D結構之完成) [Example 7-f] Introduction of X into the B structure (completed of the A-B-A-D structure)

不另行精製地準備上述實施例7-e中所獲得之結果物之有機層之後,使用3官能單體將末端轉化為籠形(cage)結構。將實施例7-e中所獲得之物質100重量份溶於50重量份之四氫呋喃中之後,加入5重量份之蒸餾水而製造混合溶液。其後,於所製造之混合溶液中添加0.36wt%之HCl 10重量份並攪拌10分鐘之後,一次性滴加甲基三甲氧基矽烷(Methyltrimethoxysilane)3重量份而謀求穩定之水解。攪拌24小時後,再次添加實施例7-a中所製造之觸媒3重量份而將混合溶液之pH值調節為鹼性狀態。此時,於B結構之X部分導入籠形(cage)形態之高分子,並於反應器內連續地進行反應而形成如化學式7之高分子。但由於係與其他副產物一同獲得,故而必須另行精製。其後,使溫度變化至常溫,藉由真空而去除混合溶液內之四氫呋喃而準備精製。 After preparing the organic layer of the result obtained in the above Example 7-e without further purification, the terminal was converted into a cage structure using a trifunctional monomer. After 100 parts by weight of the material obtained in Example 7-e was dissolved in 50 parts by weight of tetrahydrofuran, 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% of HCl was added to the produced mixed solution and stirred for 10 minutes, and then 3 parts by weight of methyltrimethoxysilane (Methyltrimethoxysilane) was added dropwise to obtain stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was again added to adjust the pH of the mixed solution to an alkaline state. At this time, a polymer in a cage form is introduced into the X portion of the B structure, and the reaction is continuously carried out in the reactor to form a polymer of Chemical Formula 7. However, since it is obtained together with other by-products, it must be separately refined. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to prepare for purification.

[實施例7-g]通過沈澱及再結晶的副產物去除、結果物之獲得 [Example 7-g] Removal by by-product of precipitation and recrystallization, obtaining of the result

於上述實施例7-f中反應結束後之混合物中加入二氯甲烷200重量份,與蒸餾水一同進行區分洗淨,於蒸餾水層之pH值為中性時,藉由真空減壓而完全去除溶劑。其後,於甲醇中沈澱2次而去除未反應單體,並以30重量份溶於四氫呋喃與水溶液以9.5:0.5之重量比率混合而成之溶劑中,於-20℃之溫度下保存2天。其目的在於謀求未導入至高分子且因籠形(cage)結構而被封閉之物質之再結晶,使得精製容易進行。 200 parts by weight of dichloromethane was added to the mixture after the completion of the reaction in the above Example 7-f, and washed separately with distilled water. When the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum decompression. . Thereafter, it was precipitated twice in methanol to remove unreacted monomers, and stored in a solvent of 30 parts by weight of tetrahydrofuran and an aqueous solution in a weight ratio of 9.5:0.5, and stored at -20 ° C for 2 days. . The object of the invention is to recrystallize a substance which is not introduced into a polymer and which is blocked by a cage structure, so that purification can be easily carried out.

確認到:將結束再結晶過程而獲得之固體物質過濾後,通過真空減壓而獲得化學式7之高分子而無各種副產物。又,於將GPC結果與NMR結果進行比較時,結果導出銳利(Sharp)形態之籠形(cage)形態而無因各步驟之高分子生長而單獨獲得之低分子,據此推斷,可確認無問題地獲得複合高分子。此時,分子量以苯乙烯換算值計為24,000之值,X之n之平均值為4.6,Y之n之平均值為4.6。 It was confirmed that the solid matter obtained by the completion of the recrystallization process was filtered, and then the polymer of Chemical Formula 7 was obtained by vacuum decompression without various by-products. Further, when the GPC result is compared with the NMR result, the result is a cage form in which a sharp form is obtained without a low molecule obtained by polymer growth in each step, and it is inferred that no Problemly obtaining a composite polymer. At this time, the molecular weight was 24,000 in terms of styrene, the average value of n of n was 4.6, and the average value of n of 4.7 was 4.6.

又,使用下述表25中所記載之單體製造矽倍半氧烷複合高分子。此時,製造方法係對等地使用上述實施例7中所使用之方法。 Further, a sesquisesquioxane composite polymer was produced using the monomers described in Table 25 below. At this time, the manufacturing method uses the method used in the above-described Embodiment 7 in a peer-to-peer manner.

實施例8:D-A-B-A-D結構之複合矽倍半氧烷高分子之合成 Example 8 : Synthesis of a composite sesquisilane polymer of DABAD structure

使用下述實施例,以製造D-A-B-D結構之複合高分子,並藉由與上述實施例1同樣之方法而製造塗料組成物。 Using the following examples, a composite polymer of the D-A-B-D structure was produced, and a coating composition was produced by the same method as in the above Example 1.

[實施例8-a]用於D結構之過量生成之pH值轉換反應 [Example 8-a] pH conversion reaction for excessive formation of D structure

於進行反應中之實施例7-d混合溶液中非常緩慢地滴加0.36wt%之HCl水溶液15重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,以實施例7-e之5倍即25重量份準備二苯基四甲氧基二矽氧烷(DiPhenyltetramethoxydisiloxane)之量並一次性滴加,攪拌1小時後,再次添加實施例7-a中所製造之觸媒20重量份而將混合溶液之pH值調節為鹼性狀態。反應結束後,使溫度變化至常溫,並藉由真空而去除混合溶液內之四氫呋喃,使得所有反應物轉化為水溶液混合物。混合攪拌4小時後,滴取一部分,通過29Si-NMR及1H-NMR而進行分析,結果可確認存在於B結構內之烷氧基(alkoxy group)之量變化為0.006mmol/g,且以約5:5之比率導入有B及D之重複單元。又,苯乙烯換算分子量經測定為32,000。又,雖然導入有籠形(cage)結構,但於高分子之GPC形態下未見單獨籠形(cage)物質之分子量分佈,故而可確認籠形(cage)結構通過連續反 應而良好地導入至高分子鏈。 To the mixed solution of Example 7-d in the reaction, 15 parts by weight of a 0.36 wt% aqueous HCl solution was added dropwise very slowly, adjusted so that the pH was acidic, and stirred at a temperature of 4 ° C for 30 minutes. Thereafter, the amount of diPhenyltetramethoxydisiloxane was prepared in an amount of 5 times that of Example 7-e, that is, 25 parts by weight, and added dropwise at a time. After stirring for 1 hour, Example 7 was again added. The pH of the mixed solution was adjusted to an alkaline state by 20 parts by weight of the catalyst produced in a. After the end of the reaction, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to convert all the reactants into an aqueous mixture. After the mixture was stirred for 4 hours, a part of the mixture was separated and analyzed by 29 Si-NMR and 1 H-NMR. As a result, it was confirmed that the amount of the alkoxy group present in the B structure was changed to 0.006 mmol/g. The repeating unit having B and D is introduced at a ratio of about 5:5. Further, the molecular weight in terms of styrene was measured to be 32,000. Further, although a cage structure was introduced, the molecular weight distribution of a separate cage material was not observed in the GPC form of the polymer, and it was confirmed that the cage structure was favorably introduced into the high state by continuous reaction. molecular chain.

1H-NMR(CDCl3)δ7.5,7.2,3.7,3.4,3.3(broad),3.1,2.8,2.6,1.5(broad),0.6。29Si-NMR(CDCl3)δ-72.5(broad),-81.1(sharp),-80.8(sharp),-79.9(sharp),-82.5(broad) 1 H-NMR (CDCl 3 ) δ 7.5, 7.2, 3.7, 3.4, 3.3 (broad), 3.1, 2.8, 2.6, 1.5 (broad), 0.6. 29 Si-NMR (CDCl 3 ) δ-72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -82.5 (broad)

[實施例8-b]於B結構內導入X [Example 8-b] Introducing X into the B structure

不另行精製地準備上述實施例8-a中所獲得之結果物之有機層之後,使用3官能單體將末端轉化為籠形(cage)結構。將實施例8-a中所獲得之物質100重量份溶於50重量份之四氫呋喃中之後,加入5重量份之蒸餾水而製造混合溶液。其後,於所製造之混合溶液中添加0.36wt%之HCl 10重量份並攪拌10分鐘後,一次性滴加甲基三甲氧基矽烷(Methyltrimethoxysilane)3重量份而謀求穩定之水解。攪拌24小時後,再次添加實施例7-a中所製造之觸媒3重量份而將混合溶液之pH值調節為鹼性狀態。此時,於B結構之X部分導入籠形(cage)形態之高分子,並於反應器內連續地進行反應而形成如化學式8之高分子。但由於係與其他副產物一同獲得,故而必須另行精製。其後,使溫度變化至常溫,藉由真空而去除混合溶液內之四氫呋喃而準備精製。 After preparing the organic layer of the result obtained in the above Example 8-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. After 100 parts by weight of the material obtained in Example 8-a was dissolved in 50 parts by weight of tetrahydrofuran, 5 parts by weight of distilled water was added to prepare a mixed solution. Thereafter, 10 parts by weight of 0.36 wt% of HCl was added to the produced mixed solution and stirred for 10 minutes, and then 3 parts by weight of methyltrimethoxysilane (Methyltrimethoxysilane) was added dropwise to obtain stable hydrolysis. After stirring for 24 hours, 3 parts by weight of the catalyst prepared in Example 7-a was again added to adjust the pH of the mixed solution to an alkaline state. At this time, a polymer in a cage form is introduced into the X portion of the B structure, and the reaction is continuously carried out in the reactor to form a polymer of Chemical Formula 8. However, since it is obtained together with other by-products, it must be separately refined. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to prepare for purification.

[實施例8-c]通過沈澱及再結晶的副產物去除、結果物之獲得 [Example 8-c] Removal by by-product of precipitation and recrystallization, obtaining of the result

於上述實施例8-b中反應結束後之混合物中加入二氯甲烷200重量份,與蒸餾水一同進行區分洗淨,於蒸餾水層之pH值為中性時,藉由真空減壓而完全去除溶劑。其後,於甲醇中沈澱2次而去除未反應單體,並以30重量份溶 於四氫呋喃與水溶液以9.5:0.5之重量比率混合而成之溶劑中,於-20℃之溫度下保存2天。其目的在於謀求未導入至高分子且因籠形(cage)結構而被封閉之物質之再結晶,使得精製容易進行。 200 parts by weight of dichloromethane was added to the mixture after the completion of the reaction in the above Example 8-b, and washed separately with distilled water. When the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum decompression. . Thereafter, it was precipitated twice in methanol to remove unreacted monomers and dissolved in 30 parts by weight. The mixture was mixed with tetrahydrofuran and an aqueous solution at a weight ratio of 9.5:0.5, and stored at a temperature of -20 ° C for 2 days. The object of the invention is to recrystallize a substance which is not introduced into a polymer and which is blocked by a cage structure, so that purification can be easily carried out.

確認到:將結束再結晶過程而獲得之固體物質過濾後,通過真空減壓而獲得化學式1之高分子而無各種副產物。又,於將GPC結果與NMR結果進行比較時,結果導出銳利(Sharp)形態之籠形(cage)形態而無因各步驟之高分子生長而單獨獲得之低分子,據此推斷,可確認無問題地獲得複合高分子。此時,分子量以苯乙烯換算值計可獲得36,000之值,X之n之平均值為4.6,Y之n之平均值為4.6,尤其是化學式8之結果如下。 It was confirmed that the solid matter obtained by the completion of the recrystallization process was filtered, and then the polymer of Chemical Formula 1 was obtained by vacuum decompression without various by-products. Further, when the GPC result is compared with the NMR result, the result is a cage form in which a sharp form is obtained without a low molecule obtained by polymer growth in each step, and it is inferred that no Problemly obtaining a composite polymer. At this time, the molecular weight was 36,000 in terms of styrene conversion value, the average value of n of n was 4.6, and the average value of n of 4.7 was 4.6, and the result of Chemical Formula 8 was as follows.

29Si-NMR(CDCl3)δ-72.5(broad),-81.1(sharp),-80.8(sharp),-79.9(sharp),-81.5(sharp),-82.5(broad) 29 Si-NMR (CDCl 3 ) δ-72.5 (broad), -81.1 (sharp), -80.8 (sharp), -79.9 (sharp), -81.5 (sharp), -82.5 (broad)

又,使用下述表26中所記載之單體製造矽倍半氧烷複合高分子及塗料組成物。此時,製造方法係對等地使用上述實施例8中所使用之方法。 Further, a sesquisesquioxane composite polymer and a coating composition were produced using the monomers described in Table 26 below. At this time, the manufacturing method uses the method used in the above-described Embodiment 8 in a peer-to-peer manner.

實施例9:矽倍半氧烷E-A-B-A-D結構之複合高分子之合成 Example 9 : Synthesis of a composite polymer of a sesquioxane EABAD structure

使用下述實施例,以製造E-A-B-A-D結構之複合高分子,並藉由與上述實施例1對等之方法而製造塗佈組合物。 The following examples were used to produce a composite polymer of the E-A-B-A-D structure, and a coating composition was produced by the method equivalent to the above Example 1.

[實施例9-a]鏈末端E結構之生成 [Example 9-a] Generation of chain end E structure

於實施例7-g中所獲得之混合物中不另行精製地滴加二氯甲烷20重量份,並滴加0.36重量%之HCl水溶液5重量份,以pH值具有酸性之方式進行調節,並於4℃之溫度下攪拌30分鐘。其後,一次性滴加二甲基四甲氧基矽烷(dimethyltetramethoxysilane)1重量份。此時,於分子結構內尚未水解而存在之部分藉由已與溶劑分離之酸性水溶液層而容易地轉化為水解物,並且藉由有機溶劑層而與所生成之另外之反應物縮合而於末端單元導入E。攪拌5小時後, 停止反應之攪拌,並將反應器之溫度調節至常溫。 To the mixture obtained in Example 7-g, 20 parts by weight of dichloromethane was added dropwise without further purification, and 5 parts by weight of a 0.36% by weight aqueous HCl solution was added dropwise, and the pH was adjusted so as to be acidic. Stir at a temperature of 4 ° C for 30 minutes. Thereafter, 1 part by weight of dimethyltetramethoxysilane was added dropwise at a time. At this time, a portion which has not been hydrolyzed in the molecular structure is easily converted into a hydrolyzate by an acidic aqueous layer which has been separated from the solvent, and is condensed with the other reactant formed by the organic solvent layer at the end. The unit imports E. After stirring for 5 hours, The stirring of the reaction was stopped, and the temperature of the reactor was adjusted to normal temperature.

[實施例9-b]對B結構及末端E結構之X導入籠形(cage) [Example 9-b] X-introduction of the B structure and the end E structure into a cage

不另行精製地準備上述實施例9-a中所獲得之結果物之有機層之後,使用3官能單體將末端轉化為籠形(cage)結構。於進行反應中之實施例9-a混合溶液中一次性滴加甲基三甲氧基矽烷(Methyltrimethoxysilane)3重量份而謀求穩定之水解,攪拌24小時後,再次添加實施例7-a中所製造之觸媒3重量份而將混合溶液之pH值調節為鹼性狀態。此時,於E結構末端導入籠形(cage)形態之高分子,並於反應器內連續地進行反應而形成如化學式9之高分子。但由於係與其他副產物一同獲得,故而必須另行精製。其後,使溫度變化至常溫,藉由真空而去除混合溶液內之四氫呋喃而準備精製。 After preparing the organic layer of the result obtained in the above Example 9-a without further purification, the terminal was converted into a cage structure using a trifunctional monomer. 3 parts by weight of methyltrimethoxysilane was added dropwise to the mixed solution of Example 9-a in the reaction to obtain stable hydrolysis, and after stirring for 24 hours, the product produced in Example 7-a was again added. The pH of the mixed solution was adjusted to an alkaline state by 3 parts by weight of the catalyst. At this time, a polymer in a cage form is introduced into the end of the E structure, and the reaction is continuously carried out in the reactor to form a polymer of Chemical Formula 9. However, since it is obtained together with other by-products, it must be separately refined. Thereafter, the temperature was changed to normal temperature, and the tetrahydrofuran in the mixed solution was removed by vacuum to prepare for purification.

[實施例9-c]通過沈澱及再結晶的副產物去除、結果物之獲得 [Example 9-c] Removal by by-product of precipitation and recrystallization, obtaining of the result

獲得上述實施例9-b中反應結束後之混合物後,使用蒸餾水進行洗淨,於蒸餾水層之pH值為中性時,藉由真空減壓而完全去除溶劑。其後,於甲醇中沈澱2次而去除未反應單體,並以30重量份溶於四氫呋喃與水溶液以9.5:0.5之重量比率混合而成之溶劑中,於-20℃之溫度下保存2天。其目的在於謀求未導入至高分子且因籠形(cage)結構而被封閉之物質之再結晶,使得精製容易進行。 After the mixture of the above-mentioned Example 9-b was completed, it was washed with distilled water, and when the pH of the distilled water layer was neutral, the solvent was completely removed by vacuum decompression. Thereafter, it was precipitated twice in methanol to remove unreacted monomers, and stored in a solvent of 30 parts by weight of tetrahydrofuran and an aqueous solution in a weight ratio of 9.5:0.5, and stored at -20 ° C for 2 days. . The object of the invention is to recrystallize a substance which is not introduced into a polymer and which is blocked by a cage structure, so that purification can be easily carried out.

確認到:將結束再結晶過程而獲得之固體物質過濾後,通過真空減壓而一同獲得化學式9之高分子及各種副 產物。又,於將GPC結果與NMR結果進行比較時,結果導出銳利(Sharp)形態之籠形(cage)形態而無因各步驟之高分子生長而單獨獲得之低分子,據此推斷,可確認無問題地獲得複合高分子。此時,分子量以苯乙烯換算值計可獲得28,000之值,X之n之平均值為4.6,Y之n之平均值為4.6。 It was confirmed that the solid matter obtained by the completion of the recrystallization process was filtered, and the polymer of the chemical formula 9 and various vices were obtained together by vacuum decompression. product. Further, when the GPC result is compared with the NMR result, the result is a cage form in which a sharp form is obtained without a low molecule obtained by polymer growth in each step, and it is inferred that no Problemly obtaining a composite polymer. At this time, the molecular weight was 28,000 in terms of styrene, and the average value of n of n was 4.6, and the average value of n of 4.7 was 4.6.

又,使用下述表27中所記載之單體製造矽倍半氧烷複合高分子。此時,製造方法係對等地使用上述實施例9中所使用之方法。 Further, a sesquisesquioxane composite polymer was produced using the monomers described in Table 27 below. At this time, the manufacturing method uses the method used in the above-described Embodiment 9 in a peer-to-peer manner.

[實驗] [experiment]

於PC、PET及PMMA透明基板上塗佈上述實施例1至9中所製造之塗料組成物並硬化,測定表面特性。 The coating compositions prepared in the above Examples 1 to 9 were applied to PC, PET, and PMMA transparent substrates and cured to measure surface characteristics.

-表面硬度測定:通常而言,鉛筆硬度法(JIS 5600-5-4)通常係以500g荷重進行評價,於較其苛刻之條件即1kgf荷重下於塗佈面以45度角度將鉛筆以每秒0.5mm之速度水平移動3mm而刮蹭塗佈膜,以所刮蹭之痕跡進行評價。若於5次實驗中有2次以上未確認到刮蹭痕跡,則選擇高等級硬度之鉛筆,若2次以上有刮蹭痕跡,則選定鉛筆,評價為較該鉛筆硬度低一等級之鉛筆硬度為該塗佈膜之鉛筆硬度,並示於下述表28。關於評價結果,於10μm以上之塗佈厚度下,無論基板種類如何,均確認到玻璃水準之9 H硬度。 - Surface hardness measurement: In general, the pencil hardness method (JIS 5600-5-4) is usually evaluated with a load of 500 g, and the pencil is placed at an angle of 45 degrees on the coated surface under a more severe condition, that is, a 1 kgf load. The speed of 0.5 mm was moved horizontally by 3 mm to scrape the coated film, and the scratch was evaluated. If the scratch marks are not confirmed twice or more in 5 experiments, the pencil of high hardness is selected. If there are scratch marks for 2 or more times, the pencil is selected, and the pencil hardness is one hardness lower than the hardness of the pencil. The pencil hardness of the coating film is shown in Table 28 below. Regarding the evaluation results, at a coating thickness of 10 μm or more, the glass level 9H hardness was confirmed regardless of the type of the substrate.

-可靠性評價:於85%、85℃之可靠性腔室中保存240小時,評價彎曲特性,將其結果示於下述表29。 - Reliability evaluation: The bending characteristics were evaluated by storing in a reliability chamber of 85% and 85 ° C for 240 hours, and the results are shown in Table 29 below.

彎曲評價基準為可靠性評價前±0.1mm以內、可靠性評價後±0.3mm以內。 The bending evaluation criteria were within ±0.1 mm before the reliability evaluation and within ±0.3 mm after the reliability evaluation.

評價結果為於PET、PC及PMMA所有基材中優異。 The evaluation results were excellent in all substrates of PET, PC and PMMA.

-劃痕測試(Scratch test)測定:利用鋼絲絨(Steel wool)#0000以1kgf評價400次。利用鋼絲絨(Steel wool)而進行之磨耗評價法(JIS K5600-5-9)係於1kg左右之重量之錘子之頂端捲繞#0000之鋼絲絨(Steel wool)並往返15次而摩擦試驗片,測定其霧度值,以較其苛刻之條件摩擦試驗片,即摩擦400次,並藉由霧度測定及顯微鏡而進行目測評價,針對實施例6之光硬化性塗料組成物之結果示於下述表30。雖未記載於表30中,但本發明之其他實施例之塗料組成物確認到:於塗佈厚度為5μm以上之塗佈下,對產生於表面之劃痕之耐性優異。 - Scratch test: using steel wool (Steel Wool) #0000 was evaluated 400 times at 1 kgf. The abrasion evaluation method (JIS K5600-5-9) by steel wool is used to wind the steel wool of #0000 at the tip of a hammer of about 1 kg and to rub the test piece 15 times. The haze value was measured, and the test piece was rubbed under a harsh condition, that is, rubbed 400 times, and visually evaluated by haze measurement and a microscope, and the result of the photocurable coating composition of Example 6 is shown. Table 30 below. Although it is not described in Table 30, the coating composition of another embodiment of the present invention has been found to have excellent resistance to scratches generated on the surface under application of a coating thickness of 5 μm or more.

-接著力評價(JIS K5600-5-6):利用刀片以1-5mm之間隔劃割塗佈膜,並於其上貼附透明膠帶,以於拉拽所貼附之膠帶時脫離之個數判斷接著性,此時,利用刀片製作100個網格,以100個中之脫離之個數施行接著性判斷,針對實施例6之光硬化性塗料組成物之結果示於下述表30。關於記載,100個中之未脫離之個數記載為“(未脫離之個數/100)”,作為示例,若100個未脫離,則記載為“(100/100)”。確認到接著性非常優異。雖未記載於表30中,但本發明之其他實施例之塗料組成物經過評價,結果確認到接著性非常優異。 - Subsequent force evaluation (JIS K5600-5-6): The coating film was cut at intervals of 1-5 mm by a blade, and a scotch tape was attached thereto to remove the number of tapes attached thereto. When the adhesion was determined, at this time, 100 grids were produced by a blade, and the adhesion was judged by the number of detachment of 100. The results of the photocurable coating composition of Example 6 are shown in Table 30 below. Regarding the description, the number of the 100 items that are not separated is described as "(the number of undivided/100)", and as an example, if 100 pieces are not separated, it is described as "(100/100)". It was confirmed that the adhesion was excellent. Although not shown in Table 30, the coating composition of another example of the present invention was evaluated, and as a result, it was confirmed that the adhesion was extremely excellent.

如上述表30所示,可確認本發明之表面強化透明基板不僅表現出非常優異之表面硬度及光學特性,同時其他物性方面亦優異。 As shown in the above Table 30, it was confirmed that the surface-reinforced transparent substrate of the present invention exhibits not only excellent surface hardness and optical characteristics but also other physical properties.

Claims (17)

一種表面強化透明基板,其特徵在於在透明基板上積層有下述化學式1至9中任一者所示之矽倍半氧烷複合高分子之硬化物: [化學式5] 於上述化學式1至9中, A為,B為,D為,E為,Y分別獨立為O、NR21或[(SiO3/2R)4+2nO],且至少一個為[(SiO3/2R)4+2nO],X分別獨立為R22或[(SiO3/2R)4+2nR],且至少一個為[(SiO3/2R)4+2nR],R、R1、R2、R3、R4、R5、R6、R7、R8、R9、R10、R11、R12、R13、R14、R15、R16、R17、R18、R19、R20、R21及R22分別獨立為氫;氘;鹵素;胺基;環氧基;環己基環氧基;(甲基)丙烯醯基;硫醇基;異氰酸酯基;腈基;硝基;苯基;經氘、鹵素、胺基、環氧基、(甲基)丙烯醯基、硫醇基、異氰酸酯基、腈基、硝基、苯基取代或未經取代之C1~C40之烷基;C2~C40之烯基;C1~C40之烷氧基;C3~C40之環烷基;C3~C40之雜環烷基;C6~C40之芳基;C3~C40之雜芳基;C3~C40之芳烷基;C3~C40之芳氧基;或C3~C40之芳基硫醇基,a及d分別獨立為1至100,000之整數, b分別獨立為1至500之整數,e分別獨立為1或2,n分別獨立為1至20之整數。 A surface-enhanced transparent substrate characterized in that a cured product of a sesquisesquioxane composite polymer represented by any one of the following Chemical Formulas 1 to 9 is laminated on a transparent substrate: [Chemical Formula 5] In the above Chemical Formulas 1 to 9, A is , B is , D is , E is , Y is independently O, NR 21 or [(SiO 3/2 R) 4+2n O], and at least one is [(SiO 3/2 R) 4+2n O], and X is independently R 22 or [ (SiO 3/2 R) 4+2n R], and at least one is [(SiO 3/2 R) 4+2n R], R, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 And R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , R 19 , R 20 , R 21 and R 22 are each independently Is hydrogen; hydrazine; halogen; amine; epoxy; cyclohexyl epoxy; (meth) propylene sulfhydryl; thiol group; isocyanate group; nitrile group; nitro group; phenyl group; Alkyl group, epoxy group, (meth) propylene sulfhydryl group, thiol group, isocyanate group, nitrile group, nitro group, phenyl substituted or unsubstituted C 1 -C 40 alkyl group; C 2 ~ C 40 Alkenyl; C 1 ~ C 40 alkoxy; C 3 ~ C 40 cycloalkyl; C 3 ~ C 40 heterocycloalkyl; C 6 ~ C 40 aryl; C 3 ~ C 40 miscellaneous Aryl; C 3 ~ C 40 aralkyl; C 3 ~ C 40 aryloxy; or C 3 ~ C 40 aryl thiol, a and d are each independently an integer from 1 to 100,000, b respectively Independently an integer from 1 to 500, e is independently 1 or 2, n respectively Li is an integer of 1-20. 如請求項1之表面強化透明基板,其中a為3至1000,b為1至500,d為1至500。 The surface-reinforced transparent substrate of claim 1, wherein a is from 3 to 1000, b is from 1 to 500, and d is from 1 to 500. 如請求項1之表面強化透明基板,其中d為2至100。 The surface-enhanced transparent substrate of claim 1 wherein d is from 2 to 100. 如請求項1之表面強化透明基板,其中n值之平均為4至5。 The surface-enhanced transparent substrate of claim 1 wherein the average of n values is 4 to 5. 如請求項1之表面強化透明基板,其中上述矽倍半氧烷複合高分子之重量平均分子量為1,000至1,000,000。 The surface-reinforced transparent substrate of claim 1, wherein the above-mentioned sesquisesquioxane composite polymer has a weight average molecular weight of 1,000 to 1,000,000. 如請求項1之表面強化透明基板,其中於500nm波長之光源下,上述透明基板之透射率為至少80%以上。 The surface-enhanced transparent substrate of claim 1, wherein the transmittance of the transparent substrate is at least 80% or more under a light source having a wavelength of 500 nm. 如請求項1之表面強化透明基板,其中上述基板為選自由COC(環烯烴共聚物,Cyclic olefin copolymer)、PAc(聚丙烯酸酯,Polyacrylate)、PC(聚碳酸酯,Polycarbonate)、PE(聚乙烯,Polyethylene)、PEEK(聚醚醚酮,Polyetheretherketone)、PEI(聚醚醯亞胺,Polyetherimide)、PEN(聚萘二甲酸乙二酯,Polyethylene naphthalate)、PES(聚醚碸,Polyethersulfone)、PET(聚對苯二甲酸乙二酯,Polyethylene terephtalate)、PI(聚醯亞胺,Polyimide)、PO(聚烯烴,Polyolefin)、PMMA(聚甲基丙烯酸甲酯,Polymethylmethacrylate)、PSF(聚碸,Polysulfone)、PVA(聚乙烯醇,Polyvinylalcohol)、PVCi(聚肉桂酸乙烯酯,Polyvinylcinnamate)、TAC(三醋酸纖維素, Triacetylcellulose)、多晶矽(Poly Silicone)、聚胺基甲酸酯(Polyurethane)及環氧樹脂(Epoxy Resin)所組成之群中之原材料的基板。 The surface-reinforced transparent substrate of claim 1, wherein the substrate is selected from the group consisting of COC (Cyclic olefin copolymer), PAc (Polyacrylate), PC (Polycarbonate, Polycarbonate), PE (Polyethylene) , Polyethylene), PEEK (polyetheretherketone, Polyetheretherketone), PEI (polyether phthalimide, Polyetherimide), PEN (polyethylene naphthalate), PES (polyether oxime, Polyethersulfone), PET ( Polyethylene terephtalate, PI (Polyimide), PO (Polyolefin, Polyolefin), PMMA (Polymethylmethacrylate), PSF (Polysulfone) , PVA (polyvinyl alcohol, Polyvinylalcohol), PVCi (polyvinyl cinnamate, Polyvinylcinnamate), TAC (cellulose triacetate, A substrate of a raw material in a group consisting of a triacetylcellulose, a polysilicone, a polyurethane, and an epoxy resin (Epoxy Resin). 如請求項7之表面強化透明基板,其中上述基板係共擠壓2種以上之塑膠原材料而形成。 The surface-reinforced transparent substrate according to claim 7, wherein the substrate is formed by co-extruding two or more kinds of plastic materials. 如請求項1之表面強化透明基板,其中上述硬化物之厚度為0.01至500μm。 The surface-reinforced transparent substrate of claim 1, wherein the cured product has a thickness of 0.01 to 500 μm. 一種透明基板之表面強化方法,其特徵在於將包含化學式1至9中任一者所示之矽倍半氧烷複合高分子之塗料組成物塗佈於透明基板上並硬化。 A surface strengthening method for a transparent substrate, characterized in that a coating composition comprising a sesquisesquioxane composite polymer represented by any one of Chemical Formulas 1 to 9 is applied onto a transparent substrate and cured. 如請求項10之透明基板之表面強化方法,其中上述塗料組成物為無溶劑型。 A surface strengthening method of a transparent substrate according to claim 10, wherein the coating composition is a solventless type. 如請求項10之透明基板之表面強化方法,其含有:依據請求項1之矽倍半氧烷複合高分子;起始劑;及有機溶劑。 The surface strengthening method of the transparent substrate of claim 10, comprising: the sesquisesquioxane composite polymer according to claim 1; an initiator; and an organic solvent. 如請求項12之透明基板之表面強化方法,其中相對於塗料組成物100重量份,上述矽倍半氧烷複合高分子為5至90重量份。 The surface strengthening method of the transparent substrate of claim 12, wherein the above-mentioned sesquisesquioxane composite polymer is 5 to 90 parts by weight with respect to 100 parts by weight of the coating composition. 一種電子製品,其包含如請求項1之表面強化透明基板。 An electronic article comprising the surface-reinforced transparent substrate of claim 1. 如請求項14之電子製品,其中上述電子製品為智慧型手機、平板個人電腦、筆記型電腦、單體全備式個人電腦(AIO(All-In-One)PC)、液晶顯示器、電視、廣告板或觸 控面板、要求基板之柔軟性之可撓性智慧型裝置。 The electronic product of claim 14, wherein the electronic product is a smart phone, a tablet personal computer, a notebook computer, an all-in-one PC (AIO), a liquid crystal display, a television, an advertisement board. Or touch Control panel, flexible and intelligent device that requires the flexibility of the substrate. 如請求項14之電子製品,其中上述表面強化透明基板被用作視窗保護基板或保護膜。 The electronic article of claim 14, wherein the surface-enhanced transparent substrate is used as a window protective substrate or a protective film. 一種保護板,其包含如請求項1之表面強化透明基板。 A protective sheet comprising the surface-reinforced transparent substrate of claim 1.
TW104106518A 2014-02-28 2015-03-02 Surface-reinforced transparent substrate and method of manufacturing same TWI656028B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
??10-2014-0024507 2014-02-28
KR20140024507 2014-02-28
??10-2015-0028601 2015-02-27
KR1020150028601A KR102367120B1 (en) 2014-02-28 2015-02-27 A surface enhanced transparent substrate and method for manufacturing thereof

Publications (2)

Publication Number Publication Date
TW201545871A true TW201545871A (en) 2015-12-16
TWI656028B TWI656028B (en) 2019-04-11

Family

ID=54243423

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104106518A TWI656028B (en) 2014-02-28 2015-03-02 Surface-reinforced transparent substrate and method of manufacturing same

Country Status (3)

Country Link
KR (1) KR102367120B1 (en)
CN (1) CN106062053B (en)
TW (1) TWI656028B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018124769A1 (en) * 2016-12-30 2018-07-05 주식회사 동진쎄미켐 Coating composition and film manufactured therefrom
JP2021503540A (en) * 2017-11-16 2021-02-12 ドンジン セミケム カンパニー リミテッドDongjin Semichem Co., Ltd. Silsesquioxane polymer and coating composition containing it
CN111205645A (en) * 2020-03-20 2020-05-29 无锡创彩光学材料有限公司 Polyimide film with high transparency and high surface hardness and preparation method thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000063142A (en) * 2000-02-17 2000-11-06 이응찬 Starting materials for manufacturing polyorganosilsesquioxanes, polyorganosilsesquioxanes and method for manufacturing polyorganosilsesquioxanes
JP2007204611A (en) * 2006-02-02 2007-08-16 Kri Inc Silsesquioxane-containing cellulose derivative resin composition
KR101345170B1 (en) * 2006-07-13 2013-12-26 신닛테츠 수미킨 가가쿠 가부시키가이샤 Film laminate and method of manufacturing the same
KR101911421B1 (en) * 2011-06-30 2018-10-25 삼성디스플레이 주식회사 Protective window and display device comprising protective window
KR101937140B1 (en) * 2011-08-03 2019-04-09 주식회사 동진쎄미켐 Photocurable organic-inorganic hybrid resin composition
US9249313B2 (en) * 2011-09-21 2016-02-02 The United States Of America As Represented By The Secretary Of The Air Force Synthesis of functional fluorinated polyhedral oligomeric silsesquioxane (F-POSS)
KR101974478B1 (en) * 2012-01-09 2019-08-26 삼성디스플레이 주식회사 Transparent laminate, window panel for display device and display device including the window panel
KR101411023B1 (en) * 2012-04-19 2014-06-23 제일모직주식회사 Window sheet and displaying apparatus comprising the same
WO2013147443A1 (en) * 2012-03-27 2013-10-03 주식회사 동진쎄미켐 Resin composition containing ladder-like silsesquioxane polymer for optical film
KR102004493B1 (en) * 2012-03-27 2019-07-26 주식회사 동진쎄미켐 Ladder-like silsesquioxane polymer and resin composition for optical film comprising the same

Also Published As

Publication number Publication date
CN106062053A (en) 2016-10-26
TWI656028B (en) 2019-04-11
CN106062053B (en) 2019-07-19
KR102367120B9 (en) 2023-05-11
KR102367120B1 (en) 2022-02-25
KR20150102745A (en) 2015-09-07

Similar Documents

Publication Publication Date Title
TWI657103B (en) Silsesquioxane composite polymer and method for manufacturing thereof
TWI676503B (en) A coating method for preventing warpage of substrate,a warpage preventing substrate and an article comprising the same
JP7111611B2 (en) Laminate and its manufacturing method
TWI668272B (en) A thermoplastic resin composion comprising silsesquioxane composite polymer
TW201542718A (en) Curable composition and shaped product
TWI701303B (en) Shaped body
TW201546125A (en) Silsesquioxane composite polymer and method for manufacturing thereof
CN107735253A (en) Injury recovery film
TW201540749A (en) Silsesquioxane composite polymer and method for manufacturing thereof
TWI656028B (en) Surface-reinforced transparent substrate and method of manufacturing same
TW201542719A (en) A coating method for plastic using silsesquioxane composite polymer
KR101549473B1 (en) Modified Organic-Inorganic Hybrid Copolymer, Process of Preparing the Copolymer, Coating Composition Having the Copolymer and Application Thereof
TW201602264A (en) A coating method for ceramics using silsesquioxane composite polymer
TW201546205A (en) A coating method for metal using silsesquioxane composite polymer
KR102363820B1 (en) Silsesquioxane composite polymer and method for manufacturing thereof
TW201707925A (en) Coating product and hard coating method having high hardness
TW201546206A (en) A coating method for wood and pulp using silsesquioxane composite polymer
KR102470020B1 (en) Substrate Using Silsesquioxane Polymer and Method for Manufacturing by the Same
TW201546207A (en) A coating method for fiber using silsesquioxane composite polymer
KR20170026073A (en) Coating Product and Method Manufacturing Thereof