TW201534836A - Polarization light irradiation apparatus - Google Patents

Abstract

To provide a polarization light irradiation apparatus capable of more improving illuminance unevenness. A polarization light irradiation apparatus 1 is configured to have a linear light source 4, a cylindrical main reflecting mirror 5 condensing light of the light source 4 and a wire grid polarizer 16 for linearly polarizing light to be irradiated and to irradiate polarized light to an irradiation target object W, where an auxiliary reflecting mirror 6 extending from the light source 4 to near the wire grid polarizer 16 is provided near a light-emitting end P of the light source 4.

Description

Polarized light irradiation device

The present invention relates to a polarized light illuminating device comprising a linear light source, a water-conducting tubular main mirror and a wire grid polarizer.

A polarized light illuminating device is known which accommodates a linear light source in a main guide of a water-conducting tubular shape, and polarizes light of the light source by a wire grid polarizer disposed on an exit side of the main mirror, and is irradiated to Irradiate the object. In the polarized light irradiation device, the illuminance in the longitudinal direction of the light source is rapidly decreased in the vicinity of the end portion of the light source with respect to the center of the light source, and the illuminance unevenness is large.

Therefore, there is an ultraviolet irradiation device (for example, refer to Patent Document 1) for supplementing the illuminance unevenness, and an auxiliary mirror that reflects light toward the outside in the longitudinal direction of the light source is provided outside the both end portions of the light source. Further, there is an ultraviolet visible light irradiation device in which the same auxiliary mirror is disposed below the frame surrounded by the main mirror (see, for example, Patent Document 2).

[Previous Technical Literature] [Patent Literature]

Patent Document 1: Japanese Patent Laid-Open Publication No. 2008-221170

Patent Document 2: Japanese Patent Laid-Open Publication No. 2012-138348

[Summary of the Invention]

However, simply applying the above-described prior configuration to the polarized light irradiation device does not sufficiently compensate for the illuminance unevenness.

The present invention has been made in view of the above circumstances, and an object thereof is to provide a polarized light irradiation apparatus which can further improve illuminance unevenness.

In order to achieve the above object, the present invention is a main mirror having a linear light source, a water guiding tubular that condenses light of the light source, and a wire grid polarizer for forming the irradiated light into a linearly polarized light. The polarized light irradiation device that irradiates the polarized light to the object to be irradiated is characterized in that an auxiliary mirror extending from the light source to the vicinity of the wire grid polarizer is provided in the vicinity of the light emitting end of the light source.

In the above configuration, the auxiliary mirror may be provided so as to be inclined in a range of 0 to 20 degrees with respect to the vertical direction of the object to be irradiated.

In the above configuration, the wavelength selection filter may be provided between the light source and the wire grid polarizer, and the auxiliary mirror may be divided between the light source and the wavelength selection filter, and the wavelength selection filter. The device is configured in a manner between the above-described wire grid polarizers.

In the above configuration, the auxiliary mirror may be divided into an upper auxiliary mirror and a lower auxiliary mirror, and the length of the light source is shorter than the length of the object to be irradiated in the longitudinal direction of the light source. In the case where the lower end of the lower auxiliary mirror is disposed at a position equal to or longer than the length of the object to be irradiated, and when the length of the light source is longer than the length of the object to be irradiated, the lower auxiliary reflection is caused The angle of the mirror is not the same as the above auxiliary mirror Configure it in the same way.

In the above configuration, the cooling air may be caused to flow to a space portion between the front end of the main mirror and the wavelength selection filter, and a space portion between the wavelength selection filter and the line grating polarizer.

In the above configuration, the auxiliary mirror may be configured to form a base end portion on the light source side so as to cover a cross section of the main mirror, or to provide the light source through the base end portion. The notch portion is formed by the front end portion of the wire grid polarizer side at least equal to or larger than the width of the cross-sectional opening of the main mirror.

In the above configuration, the auxiliary mirror may have an inclination angle of the auxiliary mirror centered on an intersection of the auxiliary mirror and the axis of the light source.

In the above configuration, the heat source cooling path of the light source and the main mirror may be independent of the polarizer cooling path between the wavelength selective filter and the polarizer unit. Further, the light source and the main mirror may be housed in the casing, and the wire grid polarizer may be disposed in a light exit opening of the casing, and the light source and the main mirror may be disposed inside the casing a partition wall partitioned by the frame, wherein the wavelength selective filter is disposed to block the opening in the opening of the partition wall, and the cooling air is supplied to the light source and the main mirror inside the opening of the partition wall The heat source cooling path and the polarizer cooling path of the polarizer unit that supplies the cooling air to the space between the wavelength selection filter and the wire grid polarizer are independent.

According to the invention, the light source is disposed near the light emitting end of the light source The auxiliary mirror is extended to the vicinity of the wire grid polarizer, thereby further improving illumination unevenness.

1,100,200‧‧‧ polarized light irradiation device

3‧‧‧ frame

3A‧‧‧Light exit opening

4‧‧‧Light tube (light source)

5‧‧‧Main reflector (main mirror)

5A‧‧‧through hole

5B‧‧‧ front end

5C‧‧‧ top

6, 106‧‧‧Auxiliary reflector (auxiliary mirror)

7‧‧‧ Wavelength selection filter

8A‧‧‧ base

8B‧‧‧ front end

10‧‧‧Polarizer unit

12‧‧‧Unit polarizer unit

14‧‧‧Frame

16‧‧‧Wire grid polarizer

19‧‧‧ screws (fixed means)

20‧‧‧End board

20A‧‧‧ base end

20B‧‧‧ front end

21‧‧‧Gap section

21A‧‧‧ openings

30‧‧‧Cooling path

31‧‧‧ next door

31A‧‧‧ Opening

31B‧‧‧ventilation holes

32‧‧‧ partition wall

32A‧‧‧ openings

106A‧‧‧Upper auxiliary reflector (upper auxiliary mirror)

106B‧‧‧Lower auxiliary reflector (lower auxiliary mirror)

106A1‧‧‧Bottom

106B1‧‧‧Upper

120A‧‧‧ base end

120B‧‧‧ front end

130‧‧‧Heat source cooling path

140‧‧‧Polarizer cooling path

A‧‧‧ direction

B‧‧‧Orientation

C1‧‧‧ polarizing axis

D‧‧‧ area

K‧‧‧ section opening width

L‧‧‧ length

M‧‧‧light length

N‧‧‧ length

P‧‧‧Lighting end (electrode)

Q‧‧‧End

R‧‧‧ Space

S1, S2, S3‧‧‧ Space Department

W‧‧‧Workpiece (irradiation object)

W1‧‧‧ end

X‧‧‧Direct direction

θ‧‧‧Tilt angle

Δ1, δ2, δ3‧‧‧ gap

Fig. 1 is a front view showing, in a schematic manner, a polarized light irradiation device according to a first embodiment of the present invention.

Fig. 2 is a side view showing the polarized light irradiation device.

Fig. 3 is a view showing the configuration of a polarizer unit, wherein (A) is a plan view and (B) is a side cross-sectional view.

Figure 4 is a side cross-sectional view showing the polarized light irradiation device.

5(A) to (C) are schematic views showing the polarized light irradiation device in such a manner as to enlarge the end portion of the bulb.

Figure 6 is a graph showing the relationship between the angle of the auxiliary reflector and the total energy of the workpiece.

Fig. 7 is a graph showing the relationship between the angle of the auxiliary mirror and the illuminance, (A) is the entirety of the display, and (B) is the portion Y showing (A) in an enlarged manner.

Fig. 8 is a graph showing the relationship between the length of the auxiliary mirror and the illuminance.

Fig. 9 is a front view showing, in a schematic manner, a polarized light irradiation device according to a second embodiment of the present invention.

Fig. 10 is a side view showing the polarized light irradiation device.

Fig. 11 is a schematic view showing the polarized light irradiation device in such a manner that the end portion of the bulb is enlarged.

Figure 12 is a side cross-sectional view showing the polarized light irradiation device.

Figure 13 is a graph showing the relationship between the length of the auxiliary mirror and the illuminance.

Figure 14 is a diagram showing the enlargement of the end of the lamp tube and the first aspect of the present invention. 3 Schematic diagram of a polarized light irradiation device related to the embodiment.

Embodiments of the present invention will be described below with reference to the drawings.

<First embodiment>

Fig. 1 is a front view showing a polarized light irradiation device according to a first embodiment, and Fig. 2 is a side view showing a polarized light irradiation device. Fig. 3 is a view showing a configuration of a polarizer unit, Fig. 3(A) is a plan view, and Fig. 3(B) is a side cross-sectional view. Figure 4 is a side cross-sectional view showing the polarized light irradiation device.

As shown in FIGS. 1 and 2, the polarized light irradiation device 1 is a light alignment device that irradiates a polarized light onto a light alignment film of a plate-shaped or strip-shaped workpiece (irradiation target) W to perform optical alignment. The polarized light irradiation device 1 is provided in the casing 3 having the light exit opening 3A on the lower surface, and includes a bulb 4, a main reflector (main mirror) 5, and an auxiliary reflector (auxiliary mirror) 6, and The light exit opening portion 3A is provided with a polarizer unit 10. The main reflector 5 and the auxiliary reflector 6 constitute a mirror of the polarized light irradiation device 1.

The workpiece W is transferred in the linear motion direction X by a linear motion mechanism (not shown) and passes through the polarizing light irradiation device 1 directly under the polarizing light, and is exposed to the polarized light while passing therethrough to the optical alignment film. Being aligned. In the present embodiment, the workpiece W is formed in a rectangular shape in a plan view, and the short-side direction of the workpiece W is transferred so as to coincide with the direct-moving direction.

The frame 3 is disposed at a position above a predetermined distance from the workpiece W. The bulb 4 is a discharge lamp, and a straight tube type (rod-shaped) ultraviolet lamp tube extending at least equal to the length in the longitudinal direction of the workpiece W is used.

The main reflector 5 is elliptical in cross section and extends along the longitudinal direction of the bulb 4 The cylindrical concave surface (water-conducting tubular) mirror condenses the light of the bulb 4 and irradiates the light-emitting opening portion 3A toward the polarizer unit 10.

The light exit opening 3A is an opening formed in a rectangular shape in a plan view directly under the bulb 4, and is provided such that the longitudinal direction thereof coincides with the longitudinal direction (axial direction) of the bulb 4.

Inside the light emission opening portion 3A, a wavelength selection filter 7 that selects the wavelength of the transmitted light is provided, and the wavelength selection filter 7 causes the polarization light irradiation device 1 to illuminate the light of a desired wavelength.

Further, in the present embodiment, although the wavelength selection filter 7 is provided, the wavelength selection filter 7 may be omitted when the light of the desired wavelength can be emitted by the bulb 4 itself.

The light-emitting opening portion 3A is provided with a polarizer unit 10, and the light-emitting opening portion 3A is sealed by the polarizer unit 10. The polarizer unit 10 is disposed between the wavelength selective filter 7 and the workpiece W, and polarizes light that is irradiated onto the workpiece W. The light deflecting film is aligned by irradiating the polarized light to the light of the workpiece W.

As shown in FIG. 3, the polarizer unit 10 includes a plurality of unit polarizer units 12 and a frame 14 in which the unit polarizer units 12 are arranged in a line in a lateral direction. The frame 14 is a plate-like frame in which the unit polarizer units 12 are connected to each other. The unit polarizer unit 12 is provided with a wire grid polarizer (polarizer) 16 formed in a substantially rectangular plate shape.

In the present embodiment, each unit polarizer unit 12 supports the wire grid polarizer 16 such that the line direction A is parallel to the linear motion direction X, and the direction orthogonal to the line direction A and the wire grid polarizer The arrangement direction B of 16 is the same.

The wire grid polarizer 16 is a type of linear polarizer and is a grating formed on the surface of the substrate. As described above, since the bulb 4 is rod-shaped, light is incident on the wire grid polarizer 16 at various angles, and the wire grid polarizer 16 is linearly polarized even for light incident obliquely. Produce penetration.

The wire grid polarizer 16 is supported by the unit polarizer unit 12, and is rotated in the plane with its normal direction as a rotation axis, so that the direction of the polarization axis C1 can be finely adjusted. That is, the plurality of wire grid polarizers 16 are arranged to be spaced apart from each other so as to be finely adjusted in the direction of the polarization axis C1. All of the unit polarizer units 12 are finely adjusted so that the polarization axis C1 of the wire grid polarizer 16 is aligned with a predetermined irradiation reference direction, whereby the entire length in the long axis direction of the polarizer unit 10 can be obtained. The polarization axis C1 is a polarized ray that is formed to be uniform with high precision, so that high-quality light alignment can be performed. The wire grid polarizer 16 whose polarization axis C1 is adjusted is fixed to the frame 14 by fixing the upper end and the lower end of the unit polarizer unit 12 by screws (fixing means) 19, whereby the frame 14 is fixedly disposed.

Further, as shown in FIG. 4, the polarized light irradiation device 1 includes a cooling path 30 for cooling the bulb 4, the main reflector 5, the wavelength selection filter 7, and the polarizer unit 10. A blower (not shown) that transmits cooling air is connected to the cooling path 30.

A partition wall 31 that surrounds the side surfaces of the bulb 4 and the main reflector 5 is provided in the casing 3 so as to be spaced apart from the casing 3 by a gap δ1. The partition wall 31 has an opening 31A in which the bulb 4 and the main reflector 5 are exposed at the lower portion, and a vent hole 31B at the upper portion.

The cooling air is supplied to the gap δ1 between the partition 31 and the casing 3, and flows in the space between the front end 5B of the main reflector 5 and the wavelength selective filter 7. S1, then flows into the main reflector 5 and the space R located on the outer side of the main reflector 5 as the partition wall 31, and the optical components of the bulb 4, the main reflector 5, the wavelength selective filter 7, and the polarizer unit 10 Cool down. The cooling air which is cooled by the optical member and whose temperature is increased is discharged from the through hole 5A formed in the upper portion of the main reflector 5, and flows to the space R in the partition wall 31 on the outer side of the autonomous reflecting plate 5, and is discharged. To the outside of the partition 31. The polarized light irradiation device 1 may be configured such that the cooling air is circulated through the cooling path 30, and the cooling air that has cooled the optical member may be discharged to the outside.

In the polarized light irradiation device 1, the illuminance in the longitudinal direction of the bulb 4 is sharply lowered near the both ends Q of the bulb 4 with respect to the center of the bulb 4, and the illuminance is not large. It is used to compensate for uneven illumination, and has a method of providing an auxiliary mirror that reflects light toward the outside in the longitudinal direction of the lamp tube outside the both end portions of the bulb or below the frame. In the configuration in which the auxiliary mirror is disposed outside the both end portions of the bulb or below the frame, the illuminance unevenness cannot be sufficiently compensated.

Therefore, in the present embodiment, the auxiliary reflector 6 is provided in the vicinity of the light-emitting end (electrode) P of the bulb 4. Further, in the following description, the distance between the light-emitting ends P will be described as the light-emitting length M.

Fig. 5 is a schematic view showing the polarized light irradiation device 1 in such a manner as to enlarge the end portion Q of the bulb 4.

The auxiliary reflecting plate 6 is disposed between the bulb 4 and the workpiece W, and reflects light leaking out of the workpiece W toward the workpiece W, thereby supplementing the illuminance generated by the irradiation of the bulb 4 and the main reflector 5. distributed.

In detail, in the case where the polarized light irradiation device 1 is irradiated only by the bulb 4 and the main reflector 5, as shown in FIGS. 1 and 5, in the case of the bulb 4 In the region D corresponding to the end portion Q, the illuminance is insufficient. In the polarized light irradiation device 1, the auxiliary reflector 6 is configured such that the illuminance of the region D is insufficient by the reflected light.

Specifically, the auxiliary reflection plate 6 is formed at opposite ends of the bulb 4 so as to face the pair of end plates 20, and the inner wall surface thereof is configured as a reflecting surface. The base end 8A of the auxiliary reflecting plate 6 is positioned near the light emitting end P of the bulb 4.

Specifically, in the case where the length M of the light emission is longer than the length N of the workpiece W, it is preferable that the position of the base end 8A is at the light-emitting end P and one end of the workpiece W in the longitudinal direction of the bulb 4. In the case where the base end 8A is disposed on the outer side of the light-emitting end P, it is preferable that the position of the base end 8A is within 30 mm from the self-illuminating end P. In the case where the length M of the light emission is shorter than the length N of the workpiece W, it is preferable that the position of the base end 8A is within 30 mm from the light-emitting end P, and the position of the front end 8B needs to be disposed outside the one end W1 of the workpiece W. In the present embodiment, the light emission length M is longer than the length N of the workpiece W, and the position of the base end 8A is disposed at the light-emitting end P.

The length L of the auxiliary reflecting plate 6 is set to be at least at least the front end 5B of the main reflecting plate 5. Fig. 5(A) shows a case where the front end 8B is disposed at the same position as the front end 5B of the main reflection plate 5, and Fig. 5(B) shows a case where the front end 8B is disposed in the vicinity of the polarizer unit 10.

The base end portion 20A of the end plate 20 is formed so as to cover the cross section of the main reflector 5 as shown in FIG. 2, and the base end portion 20A is formed with a notch portion 21 through which the bulb 4 is passed. The notch portion 21 is formed to open toward the top portion 5C of the main reflection plate 5, and the bulb 4 is inserted into the notch portion 21 from the opening portion 21A. The front end portion 20B of the end plate 20 is formed to have substantially the same size as the sectional opening width K of the main reflection plate 5.

Under the above configuration, the pair of end plates 20 direct the light toward the above region D. Reflection is performed to complement the illuminance of the region D by the reflected light.

Further, the inclination angle θ of the end plate 20 is adjusted so as to irradiate the reflected light to the region D where the illuminance should be complemented, thereby improving the uniformity.

The wavelength selective filter 7 of the present embodiment is configured by a transmission-through filter or a filter formed of a multilayer film. The wavelength selective filter 7 has a characteristic that the amount of transmitted light decreases as the incident angle is inclined. (angle characteristics). Then, according to the angular characteristic of the wavelength selection filter 7, the light beam that is transmitted through the wavelength selective filter 7 and irradiated onto the illumination surface is such that the more the light that penetrates in an oblique manner, the more on the illumination surface. The amount of light is reduced. Therefore, in the present embodiment, the auxiliary reflection plate 6 is inclined such that the end plate 20 is inclined from the base end 8A side to the front end 8B side as shown in Fig. 5(C), whereby the angle of the reflected light is approached. To the vertical direction of the workpiece (normal direction), reducing the amount of transmitted light. Specifically, the end plate 20 is inclined at an inclination angle θ with respect to the vertical direction of the workpiece W centering on the intersection with the axial direction (axis) of the bulb 4 (in the present embodiment, the light-emitting end P). .

Fig. 6 is a graph showing the relationship between the inclination angle θ of the auxiliary reflection plate 6 and the total energy of the workpiece. In Fig. 6, the length of the workpiece W is shown on the horizontal axis, and the increase ratio of the amount of light in the workpiece W in the case where the auxiliary reflector 6 is not provided is displayed on the vertical axis. In Fig. 6, the position of the width of 1600 mm indicates the position of the light-emitting end P (electrode) of the bulb 4. Further, in Fig. 6, the line E1 shows the result of the case where the inclination angle θ of the auxiliary reflection plate 6 is 0 degree, and the line E2 shows the result of the case where the inclination angle θ of the auxiliary reflection plate 6 is 5 degrees, and the line E3 shows the auxiliary. As a result of the case where the inclination angle θ of the reflecting plate 6 is 10 degrees, the line E4 shows the result of the case where the inclination angle θ of the auxiliary reflection plate 6 is 15 degrees, and the line E5 shows that the inclination angle θ of the auxiliary reflection plate 6 is 20 degrees. As a result of the situation, the line E6 shows the result of the case where the inclination angle θ of the auxiliary reflection plate 6 is 25 degrees.

As shown in FIG. 6, according to the angular characteristic of the wavelength selection filter 7, when the auxiliary reflection plate 6 has the inclination angle θ, the total amount of light is increased. In the present embodiment, the inclination angle θ is in the vicinity of 5 degrees, and the amount of light increases the most. Further, when the inclination angle θ is increased, the increase ratio of the amount of light is lowered, and the effect of providing the auxiliary reflector 6 tends to be lowered.

Fig. 7 is a graph showing the relationship between the inclination angle of the auxiliary mirror 6 and the illuminance. Fig. 7(A) shows the whole, and Fig. 7(B) shows the portion Y of Fig. 7(A) in an enlarged manner. In Fig. 7, the horizontal axis shows the distance from the center in the axial direction of the workpiece W, and the vertical axis shows the illuminance ratio in the case where the illuminance at the center of the light emission length M is set to 100%. Further, the light emission length M is 1600 mm, and the light-emitting end P (electrode) position of the bulb 4 corresponds to a position near 800 mm. Further, in Fig. 7, the line F1 shows the result of the case where only the auxiliary reflection plate is not provided and only the main reflection plate is provided, and the line F2 shows the result of the case where the inclination angle θ of the auxiliary reflection plate is 0 degree, and the line F3 shows the auxiliary. As a result of the case where the inclination angle θ of the reflecting plate is 5 degrees, the line F4 shows the result of the case where the inclination angle θ of the auxiliary reflection plate is 10 degrees, and the line F5 shows the case where the inclination angle θ of the auxiliary reflection plate is 15 degrees. As a result, the line F6 shows the result of the case where the inclination angle θ of the auxiliary reflection plate is 20 degrees.

As shown in FIG. 7, with respect to the illuminance ratio, the inclination angle θ of the auxiliary reflection plate 6 is 0 to 10 degrees at a position where only 80% of the main reflection plate 5 is used, and is improved to 95%. At 70% of the position of the main reflector 5, the inclination angle θ is 0 to 10 degrees, which is improved to 90% or more. When the inclination angle θ is 5 to 20 degrees at a position where only 60% of the main reflection plate 5 is used, it is improved to 80% or more.

Further, the illuminance ratio is also changed in accordance with the length L of the auxiliary reflection plate 6.

Fig. 8 is a graph showing the relationship between the length of the auxiliary reflecting plate 6 and the illuminance. In Fig. 8, the horizontal axis shows the distance from the center in the axial direction of the workpiece W, and the vertical axis shows the illuminance ratio in the case where the illuminance at the center of P is set to 100%. In addition, FIG. 8 shows the result of the case where the inclination angle θ of the auxiliary reflection plate 6 is set to 5 degrees. In Fig. 8, the line G1 shows the result of the case where only the auxiliary reflection plate 6 is not provided and only the main reflection plate 5 is provided, and the line G2 shows the result that the length of the auxiliary reflection plate 6 of the front end 5B of the autonomous reflection plate 5 is 0 mm. The line G3 shows the result of the case where the length of the auxiliary reflection plate 6 of the front end 5B of the autonomous reflection plate 5 is 60 mm, and the line G4 shows the result that the length of the auxiliary reflection plate 6 of the front end 5B of the autonomous reflection plate 5 is 120 mm. .

As shown in Fig. 8, when the auxiliary reflection plate 6 is brought close to the polarizer unit 10, the area of the substantial reflection surface can be increased, so that the illuminance ratio can be improved.

That is, in the polarized light irradiation device 1, it is preferable to set the inclination angle θ in the range of 0 to 20 degrees, and it is preferable to position the front end 8B of the auxiliary reflection plate 6 in the vicinity of the polarizer unit 10. In the present embodiment, the inclination angle θ is set to 5 degrees, and the length L of the auxiliary reflection plate 6 is set such that the length of the auxiliary reflection plate 6 at the front end 5B of the autonomous reflector 5 is 120 mm.

In the present embodiment, even if the auxiliary reflection plate 6 is extended from the bulb 4 to the vicinity of the polarizer unit 10, as shown in Fig. 4, since the auxiliary reflection plate 6 is not provided on both sides of the bulb 4, the main reflection is A space portion S1 is formed between the front end 5B of the board 5 and the polarizer unit 10. By flowing the cooling air to the space portion S1, the optical member can be effectively cooled as described above.

As described above, according to the present embodiment, it is configured to extend from the vicinity of the light-emitting end P of the bulb 4 to the vicinity of the polarizer unit 10 from the bulb 4. Auxiliary reflector 6. According to this configuration, the illuminance of the region D corresponding to the both end portions Q of the bulb 4 can be made small by the reflected light of the auxiliary reflecting plate 6, so that the uniformity of the workpiece W can be improved.

Further, according to the present embodiment, the auxiliary reflector 6 is configured to be inclined so as to be inclined in the range of 0 to 20 ° C with respect to the vertical direction of the workpiece W. In the case where the wavelength selective filter 7 is a filter that transmits the absorption filter or the multilayer film, the angle of the light beam that is irradiated onto the irradiation surface is limited depending on the angular characteristics of the wavelength selection filter 7. According to this configuration, the wavelength selective filter 7 is a transmission absorbing filter or a filter composed of a multilayer film, and the reduction in the amount of transmitted light can be reduced.

Further, according to the present embodiment, since the cooling air flows to the space portion S between the front end 5B of the main reflection plate 5 and the wavelength selection filter 7, the lamp tube 4, the main reflection plate 5, and the auxiliary can be effectively provided. The reflector 6, the wavelength selection filter 7, and the polarizer unit 10 are cooled.

Further, according to the present embodiment, the auxiliary reflector 6 is configured to form the base end portion 20A on the side of the bulb light 4 so as to cover the cross section of the main reflector 5, and to provide the bulb at the base end portion 20A. 4 penetrates the notch portion 21. With this configuration, for example, the area of the reflecting surface of the auxiliary reflecting plate 6 can be increased as compared with the case where the auxiliary reflecting plate 6 is disposed under the bulb 4, so that an increase in the amount of light that can be reflected to the workpiece W can be caused.

Further, it is configured such that the front end portion 20B on the side of the polarizer unit 10 is formed at least the size of the cross-sectional opening width K of the main reflector 5 or more. According to this configuration, more light toward the outside of the end portion Q of the bulb 4 can be reflected, so that an increase in the amount of light that can be reflected to the workpiece W can be caused.

<Second embodiment>

In the first embodiment, the wavelength selective filter 7 and the polarizer unit 10 are disposed close to each other. In the second embodiment, the wavelength selective filter 7 and the polarizer unit 10 are disposed apart from each other. In the second embodiment, the same portions as those of the polarized light irradiation device 1 are denoted by the same reference numerals and will not be described.

Fig. 9 is a front view showing a polarized light irradiation device according to a second embodiment of the present invention in a schematic manner, and Fig. 10 is a side view showing a polarized light irradiation device. Fig. 11 is a schematic view showing the polarized light irradiation device in such a manner as to enlarge the end portion of the bulb 4.

In the polarized light irradiation device 100, as shown in FIGS. 9 to 11, the wavelength selective filter 7 and the polarizer unit 10 are arranged to be largely separated in comparison.

Fig. 12 is a side sectional view showing the polarized light irradiation device 100.

Further, as shown in FIG. 12, the polarized light irradiation device 100 is provided with a heat source cooling path 130 for cooling the bulb 4, the main reflector 5, and the wavelength selective filter 7, and for cooling wavelength selective filtering, respectively. The polarizer cooling path 140 of the device 7 and the polarizer unit 10. Each of the heat source cooling path 130 and the polarizer cooling path 140 is connected to a blower (not shown) that blows the cooling air.

A partition wall 31 that surrounds the side surfaces of the bulb 4 and the main reflector 5 is provided in the casing 3. The partition wall 31 has an opening 31A for exposing the bulb 4 and the main reflector 5 to the lower portion, and a vent hole 31B at the upper portion. Further, between the frame body 3 and the partition wall 31, a partition wall 32 that partitions the partition wall 32 is provided, and the partition wall 31 and the partition wall 32 are separated by a gap δ2, and the frame body 3 and the partition wall 32 are separated by air. Clearance δ3 The way it is configured. The partition wall 32 has an opening 32A that exposes the wavelength selective filter 7 to the lower side.

In the heat source cooling path 130, the cooling air system is supplied to the gap δ2 between the partition wall 31 and the partition wall 32, and flows in the space portion S2 between the front end 5B of the main reflection plate 5 and the wavelength selective filter 7, and then flows in. The bulb R, the main reflector 5, and the wavelength selective filter 7 are cooled to the space R in the main reflector 31 and on the outer side of the main reflector 5 in the partition 31. The cooling air that cools the bulb 4, the main reflector 5, and the wavelength selective filter 7 and has a high temperature is formed from the through hole 5A formed in the upper portion of the main reflector 5, and is outside the autonomous reflector 5 The flow to the space R in the partition wall 31 is discharged to the outside of the partition wall 31.

In the polarizer cooling path 140, the cooling air is supplied to one side of the gap δ3 between the frame 3 and the partition wall 32, and flows into the space portion S3 between the wavelength selective filter 7 and the polarizer unit 10, The wavelength selection filter 7 and the polarizer unit 10 perform cooling. At this time, the cooling air that has flowed into the space portion S3 flows so as to be orthogonal to the longitudinal direction of the bulb 4. The cooling air that cools the polarizer unit 10 and has a high temperature is discharged from the other side of the gap δ3 between the casing 3 and the partition wall 32.

The polarized light irradiation device 100 may be configured such that the cooling air circulates in each of the heat source cooling path 130 and the polarizer cooling path 140, and the cooling air that has cooled the optical member may be discharged to the outside.

Fig. 13 is a graph showing the relationship between the length of the auxiliary reflecting plate 106 and the illuminance. In Fig. 13, the horizontal axis shows the distance from the center in the axial direction of the workpiece W, and the vertical axis shows the illuminance ratio in the case where the illuminance at the center of the light emission length M is set to 100%. Furthermore, FIG. 13 shows the inclination angle θ of the auxiliary reflection plate 106. The result is set to 5 degrees. In Fig. 13, the line H1 shows the result of the case where only the auxiliary reflection plate 106 is not provided and only the main reflection plate 5 is provided, and the line H2 shows the result that the auxiliary reflection plate 106 has the length of the wavelength selection filter 7, and the line H3 It is shown that the auxiliary reflecting plate 106 has a result of reaching the length of the polarizer unit 10.

As shown in FIG. 13, the illuminance ratio is 70% of the position of the main reflector 5, and if it reaches the length of the polarizer unit 10, it can reach 90% or more, and the length of the wavelength selection filter 7 is reached. In the case of up to 85%. That is, even in the case where the wavelength selective filter 7 and the polarizer unit 10 are disposed in a separated manner, the illuminance ratio changes depending on the length of the auxiliary reflection plate 106.

Therefore, the auxiliary reflector 106 of the present embodiment has the front end 8B positioned in the vicinity of the polarizer unit 10 as shown in FIG. More specifically, the auxiliary reflection plate 106 is divided into an upper auxiliary reflection plate 106A between the bulb 4 and the wavelength selection filter 7, and an auxiliary reflection plate 106B between the wavelength selection filter 7 and the polarizer unit 10 The way it is configured. A notch portion 21 is provided at the base end portion 120A of the upper auxiliary reflection plate 106A. The front end portion 120B of the upper auxiliary reflection plate 106A is formed to have substantially the same size as the sectional opening width K of the main reflection plate 5. The lower auxiliary reflection plate 106B is formed to have substantially the same width as the front end portion 120B.

Similarly to the auxiliary reflector 6, the upper auxiliary reflector 106A is preferably set to have an inclination angle θ of 0 to 20 degrees. In the present embodiment, the inclination angle θ is set to 5 degrees. The lower end 106A1 of the upper auxiliary reflection plate 106A is positioned in the vicinity of the wavelength selective filter 7.

The lower auxiliary reflection plate 106B does not need to have the same inclination angle θ as that of the upper auxiliary reflection plate 106A, and is disposed at an arbitrary angle including the vertical direction. In the present embodiment, since the luminous length M of the bulb 4 is shorter than the length of the workpiece W, Therefore, the lower auxiliary reflection plate 106B is inclined from the side of the bulb 4 to the side of the polarizer unit 10, and the lower end (front end 8B) of the lower auxiliary reflection plate 106B is disposed at a length N or more of the workpiece W. position. In the present embodiment, the inclination angle θ of the upper auxiliary reflection plate 106A is also set to 5 degrees. The upper end 106B1 of the lower auxiliary reflection plate 106B is positioned in the vicinity of the wavelength selective filter 7.

As described above, according to the present embodiment, the same effects as those of the first embodiment can be obtained.

Further, according to the present embodiment, the auxiliary reflection plate 106 is configured to be disposed between the bulb 4 and the wavelength selection filter 7 and between the wavelength selection filter 7 and the line grid polarizer 16 in a divided manner. According to this configuration, the area of the reflecting surface of the auxiliary reflecting plate 106 can be ensured as much as possible, and the amount of light that can be reflected to the workpiece W can be increased.

Further, according to the present embodiment, the auxiliary reflecting plate 106 is configured to be divided into the upper auxiliary reflecting plate 106A and the lower auxiliary reflecting plate 106B, and the length M of the light-emitting length M of the bulb 4 is longer than the length of the workpiece W in the longitudinal direction of the bulb 4. In the case of a short case, the front end 8B of the lower auxiliary reflection plate 106B is placed at a position above the workpiece W. According to this configuration, the area of the reflecting surface of the auxiliary reflecting plate 106 can be ensured as much as possible, and the amount of light that can be reflected to the workpiece W can be increased.

Further, according to the present embodiment, the cooling air flows to the space portion S2 between the front end 5B of the main reflection plate 5 and the wavelength selection filter 7, and the space between the wavelength selection filter 7 and the polarizer unit 10. Part S3. According to this configuration, the bulb 4, the main reflector 5, the wavelength selection filter 7, and the polarizer unit 10 are cooled, and even when the length M of the bulb 4 is shorter than the length of the workpiece W, In the aspect, the entire length of the workpiece W can be irradiated.

Further, in the present embodiment, the auxiliary reflecting plate 106 is divided. The upper auxiliary reflection plate 106A and the lower auxiliary reflection plate 106B are cut, and an insertion hole for inserting the wavelength selection filter 7 may be formed on one auxiliary reflection plate.

<Third embodiment>

In the first embodiment, the case where the light-emitting length M of the bulb 4 is shorter than the length of the workpiece W has been described. In the third embodiment, the length M of the bulb 4 is longer than the length of the workpiece W. The situation will be explained. In the third embodiment, the same portions as those of the polarized light irradiation device 100 are denoted by the same reference numerals and will not be described.

Fig. 14 is a schematic view showing a polarized light irradiation apparatus according to a third embodiment of the present invention in which an end portion of the bulb is enlarged.

As shown in FIG. 14, the polarized light irradiation device 200 has a lower length M of the lamp 4 than the length of the workpiece W, so that the angle of the lower auxiliary reflection plate 106B is different from that of the upper auxiliary reflection plate 106A, and the lower auxiliary reflection is The plate 106B is disposed in the vertical direction of the workpiece W. Further, the upper end 106B1 of the lower auxiliary reflection plate 106B is disposed on the lower side of the lower end of the upper auxiliary reflection plate 106A 106A1.

In this manner, the auxiliary reflection plate 106 is configured to be divided into the upper auxiliary reflection plate 106A and the lower auxiliary reflection plate 106B, and the length of the light emission M of the lamp tube 4 is longer than the length of the workpiece W in the longitudinal direction of the bulb 4. In this case, the angle of the lower auxiliary reflection plate 106B is set to be different from that of the upper auxiliary reflection plate 106A. According to this configuration, the degree of freedom in arrangement of the lower auxiliary reflector 106B is improved.

For example, by tilting the upper auxiliary reflection plate 106A, the light reflected by the upper auxiliary reflection plate 106A can be connected to the wavelength selection filter 7 In the direction of the vertical direction, the reduction in the amount of transmitted light due to the angular characteristic of the wavelength selective filter 7 can be suppressed, and the lower auxiliary reflection plate 106B can be vertically arranged with respect to the workpiece W. The length of the polarized light irradiation device 200 is shortened.

However, the above-described embodiments are intended to be modified as appropriate, and may be appropriately modified without departing from the spirit and scope of the invention.

For example, in the above-described embodiment, the front end portion 20B of the auxiliary reflector 6 and the upper auxiliary reflector 106A is formed to have substantially the same size as the cross-sectional opening width K of the main reflector 5, but the front end portion is not limited thereto. 20B can also be formed at least the size of the cross-sectional opening width K of the main reflector 5 or more.

Further, in the above embodiment, the bulb 4 is used as the linear light source, but the linear light source is not limited thereto. Further, instead of the bulb 4, a linear light source in which light-emitting elements such as ultraviolet LEDs are arranged in a straight line may be used. Further, the light irradiated by the linear light source is not limited to ultraviolet rays.

1‧‧‧Polarizing light irradiation device

3‧‧‧ frame

3A‧‧‧Light exit opening

4‧‧‧Light tube (light source)

5‧‧‧Main reflector (main mirror)

6‧‧‧Auxiliary reflector (auxiliary mirror)

7‧‧‧ Wavelength selection filter

10‧‧‧Polarizer unit

16‧‧‧Wire grid polarizer

20‧‧‧End board

D‧‧‧ area

M‧‧‧light length

N‧‧‧ length

P‧‧‧Lighting end (electrode)

Q‧‧‧End

W1‧‧‧ end

Claims (8)

A polarized light irradiation device comprising a linear light source, a water-conducting main mirror for collecting light of the light source, and a wire grid polarizer for forming the irradiated light into a linearly polarized light, and polarizing the light The light is irradiated onto the object to be irradiated, and an auxiliary mirror extending from the light source to the vicinity of the wire grid polarizer is provided in the vicinity of the light-emitting end of the light source. The polarized light irradiation device according to the first aspect of the invention, wherein the auxiliary mirror is inclined in a range of 0 to 20 degrees with respect to a vertical direction of the object to be irradiated. The polarized light irradiation device according to claim 1 or 2, wherein a wavelength selection filter is provided between the light source and the wire grid polarizer, and the auxiliary mirror is divided and disposed in the light source and the wavelength selection. Between the filters, and between the wavelength selective filter and the wire grid polarizer. The polarized light illuminating device of claim 3, wherein the auxiliary mirror is divided into an upper auxiliary mirror and a lower auxiliary mirror, and the illumination of the light source is longer than the longitudinal direction of the light source. When the length of the object is short, the lower end of the lower auxiliary mirror is disposed at a position equal to or longer than the length of the object to be irradiated, and when the length of the light source is longer than the length of the object to be irradiated, The angle of the lower auxiliary mirror is configured to be different from the above-described upper auxiliary mirror. The polarized light irradiation device of claim 3, wherein the cooling air flows to a space between the front end of the main mirror and the wavelength selective filter, and the wavelength selection filter and the wire grid The space between the polarizers. The polarized light irradiation device according to any one of claims 1 to 5, wherein the auxiliary mirror is configured to form a base end portion on the light source side so as to cover a cross section of the main mirror, and The base end portion is provided with a notch portion through which the light source passes, and the front end portion of the wire grid polarizer side is formed to have a size equal to or larger than a cross-sectional opening width of the main mirror. The polarized light illuminating device according to any one of claims 2 to 6, wherein the auxiliary mirror is centered on an intersection of the auxiliary mirror and the axis of the light source, and the tilt angle of the auxiliary mirror is performed. Adjustment. The polarized light irradiation device according to any one of claims 3 to 7, wherein a heat source cooling path of the light source and the main mirror, and a polarizer between the wavelength selection filter and the polarizer unit The cooling path is independent.