TW201530392A - Conductive film - Google Patents
Conductive film Download PDFInfo
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- TW201530392A TW201530392A TW103144473A TW103144473A TW201530392A TW 201530392 A TW201530392 A TW 201530392A TW 103144473 A TW103144473 A TW 103144473A TW 103144473 A TW103144473 A TW 103144473A TW 201530392 A TW201530392 A TW 201530392A
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
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- Quality & Reliability (AREA)
- Position Input By Displaying (AREA)
Abstract
Description
本發明涉及導電性膜,尤其是涉及例如適合用於觸控面板用電極的導電性膜。The present invention relates to a conductive film, and more particularly to a conductive film suitable for use in an electrode for a touch panel.
近來,作為顯示裝置中設置的導電性膜,在觸控面板中使用的導電性膜受到關注。觸控面板主要應用於PDA(個人數位助理)和便攜式電話等小尺寸裝置,但是認為在個人電腦用顯示器等應用帶來的大尺寸化也在發展中。Recently, as a conductive film provided in a display device, a conductive film used in a touch panel has been attracting attention. The touch panel is mainly applied to small-sized devices such as PDAs (personal digital assistants) and cellular phones, but it is considered that the large size of applications such as displays for personal computers is also developing.
在這樣的將來的趨勢中,現有的電極使用了ITO(氧化銦錫)(例如,參照專利文獻1和2),電阻較大,因此,隨著導電性膜的應用尺寸變大,電極間的電流的傳導速度變慢。其結果是,在應用尺寸較大的導電性膜中,存在回應速度(從接觸指尖到檢測出其位置為止的時間)變慢這樣的問題。In such a future trend, ITO (Indium Tin Oxide) is used for the conventional electrode (for example, refer to Patent Documents 1 and 2), and the electric resistance is large. Therefore, as the application size of the conductive film becomes larger, between the electrodes The conduction speed of the current becomes slower. As a result, in the conductive film having a large application size, there is a problem that the response speed (the time from the touch of the fingertip to the position where the position is detected) becomes slow.
因此考慮,透過排列多個由金屬製的細線(金屬細線)構成的格子來構成電極,由此降低表面電阻。作為形成金屬細線的方法,例如可舉出專利文獻3。此外,還提出了具有導電圖案的觸控面板用的導電性膜(參照專利文獻4),該導電圖案由通過組合多個小格子而成的多個大格子和在大格子之間電連接的中格子構成。該專利文獻4還記載有層疊有第1導電性膜和第2導電性膜的例子,其中,第1導電性膜具有沿一個方向排列的導電圖案(第1導電圖案),第2導電性膜具有沿另一個方向(與一個方向垂直的方向)排列的導電圖案(第2導電圖案)。Therefore, it is considered that the electrodes are formed by arranging a plurality of lattices made of thin metal wires (metal thin wires), thereby lowering the surface resistance. As a method of forming a metal thin wire, patent document 3 is mentioned, for example. Further, a conductive film for a touch panel having a conductive pattern (refer to Patent Document 4) having a plurality of large lattices formed by combining a plurality of small lattices and electrically connected between the large lattices has been proposed. The middle lattice is composed. Patent Document 4 also discloses an example in which a first conductive film and a second conductive film are laminated, wherein the first conductive film has a conductive pattern (first conductive pattern) arranged in one direction, and the second conductive film A conductive pattern (second conductive pattern) arranged in the other direction (a direction perpendicular to one direction).
專利文獻Patent literature
專利文獻1:日本特開2009-259003號公報Patent Document 1: Japanese Laid-Open Patent Publication No. 2009-259003
專利文獻2:日本特表2009-540375號公報Patent Document 2: Japanese Special Publication No. 2009-540375
專利文獻3:日本特開2004-221564號公報Patent Document 3: Japanese Patent Laid-Open Publication No. 2004-221564
專利文獻4:日本特開2012-163933號公報Patent Document 4: Japanese Laid-Open Patent Publication No. 2012-163933
在應用於靜電電容方式的觸控面板的情況下,通常為如專利文獻4所示那樣的層疊第1導電性膜和第2導電性膜的方式。在該情況下,第1導電圖案和第2導電圖案在多個部位隔著絕緣層相對。在各個電極相對的部位產生靜電電容,當手指與觸控面板接近或接觸時,靜電電容發生變化。根據該靜電電容的變化量,能夠檢測出手指與觸控面板接近或接觸的位置(以下記作觸摸位置)。In the case of being applied to a capacitive touch panel, the first conductive film and the second conductive film are laminated as shown in Patent Document 4. In this case, the first conductive pattern and the second conductive pattern face each other at a plurality of locations via an insulating layer. An electrostatic capacitance is generated at a portion opposite to each electrode, and the electrostatic capacitance changes when the finger approaches or contacts the touch panel. According to the amount of change in the electrostatic capacitance, a position at which the finger approaches or comes into contact with the touch panel (hereinafter referred to as a touch position) can be detected.
然而,在觸摸位置的檢測精度較低時,控制電路例如有可能誤識別為按壓了與真正的觸摸位置不同的觸摸位置。該情況成為與期望的動作指令不同的動作的原因。為了避免這樣的誤檢測,進行動作指令那樣的動作,要求提高觸摸位置的檢測精度。However, when the detection accuracy of the touch position is low, the control circuit may, for example, be erroneously recognized as pressing a touch position different from the true touch position. This is the reason why the operation is different from the desired operation command. In order to avoid such erroneous detection, an operation such as an operation command is performed, and it is required to improve the detection accuracy of the touch position.
本發明是為了解決上述問題而完成的,目的在於提供一種導電性膜,其能夠提高觸摸位置的檢測精度,因此,適合應用於可進行與動作指令對應的動作的觸控面板。The present invention has been made to solve the above problems, and an object of the invention is to provide a conductive film which can improve the detection accuracy of a touch position. Therefore, the present invention is suitably applied to a touch panel capable of performing an operation corresponding to an operation command.
[1]本發明的導電性膜具有絕緣體、2個以上的第1電極圖案、2個以上的第2電極圖案,第1電極圖案和第2電極圖案隔著絕緣體相對,其特徵在於,第1電極圖案以及第2電極圖案分別是透過組合由金屬細線形成的多個單元而構成的,第1電極圖案具有:主體圖案,其朝一個方向延伸;一方擴展圖案,其從主體圖案的一側朝相鄰的一方第1電極圖案擴展;以及另一方擴展圖案,其從主體圖案的另一側朝相鄰的另一方第1電極圖案擴展,在一方擴展圖案之間,插入有相鄰的一方第1電極圖案的另一方擴展圖案,在另一方擴展圖案之間,插入有相鄰的另一方第1電極圖案的一方擴展圖案,擴展圖案排列為嵌套狀。[1] The conductive film of the present invention has an insulator, two or more first electrode patterns, and two or more second electrode patterns, and the first electrode pattern and the second electrode pattern face each other via an insulator, and are characterized by Each of the electrode pattern and the second electrode pattern is formed by combining a plurality of cells formed of thin metal wires. The first electrode pattern has a body pattern extending in one direction, and one extended pattern from one side of the body pattern toward The adjacent one of the first electrode patterns is expanded; and the other of the expanded patterns is extended from the other side of the main body pattern toward the adjacent first first electrode pattern, and one adjacent one of the expanded patterns is inserted The other extension pattern of the one electrode pattern has one extension pattern of the adjacent other first electrode pattern interposed between the other extension patterns, and the expansion patterns are arranged in a nest shape.
[2]在本發明中,可以是,第2電極圖案具有帶狀圖案,與第1電極圖案的擴展圖案相對地配置。[2] In the present invention, the second electrode pattern may have a stripe pattern and be disposed to face the expanded pattern of the first electrode pattern.
[3]在本發明中,可以是,一方擴展圖案具有:第1擴展部,其朝相鄰的一方第1電極圖案擴展;以及1個以上的第1延伸部,其從第1擴展部沿著主體圖案延伸,另一方擴展圖案具有:第2擴展部,其朝相鄰的另一方第1電極圖案擴展;以及1個以上的第2延伸部,其從第2擴展部沿著主體圖案延伸。[3] In the present invention, the one extended pattern may include: a first expanded portion that extends toward the adjacent one of the first electrode patterns; and one or more first extended portions that are along the first expanded portion The main pattern extends, and the other expanded pattern has a second expanded portion that extends toward the adjacent first first electrode pattern, and one or more second extended portions that extend from the second expanded portion along the main pattern .
[4]在該情況下,還可以是,第1延伸部和第2延伸部分別與從相鄰的第1電極圖案的擴展部延伸的延伸部排列為嵌套狀。[4] In this case, the first extension portion and the second extension portion may be arranged in a nested shape with the extension portion extending from the extension portion of the adjacent first electrode pattern.
[5]還可以是,第1延伸部以及第2延伸部各自的最大寬度大於第1延伸部與和第1延伸部成為嵌套狀態的從相鄰的電極圖案的擴展部延伸的延伸部之間的間隔。[5] The maximum width of each of the first extension portion and the second extension portion may be larger than the extension portion of the extension portion extending from the adjacent electrode pattern in which the first extension portion and the first extension portion are nested. Interval between.
[6]在[3]中,可以是,在設k為實數的情況下,第1擴展部、第2擴展部、第1延伸部以及第2延伸部各自的最大寬度被設計為單元的平均直徑×1/2×k。[6] In [3], when k is a real number, the maximum width of each of the first expanded portion, the second expanded portion, the first extended portion, and the second extended portion may be designed as an average of the cells. Diameter × 1/2 × k.
[7]在該情況下,可以是,在設k為實數的情況下,第1延伸部與第2延伸部之間的間隔為單元的平均直徑×1/2×k。[7] In this case, when k is a real number, the interval between the first extending portion and the second extending portion may be an average diameter of the unit × 1/2 × k.
[8]還可以是,第1擴展部、第2擴展部、第1延伸部以及第2延伸部各自的最大寬度小於主體圖案的寬度。[8] The maximum width of each of the first expanded portion, the second expanded portion, the first extended portion, and the second extended portion may be smaller than the width of the main body pattern.
[9]在本發明中,可以是,1~5條第2電極圖案與擴展圖案相對。[9] In the present invention, one to five second electrode patterns may be opposed to the expanded pattern.
根據本發明的導電性膜,能夠得到如下導電性膜:其能夠提高觸摸位置的檢測精度,因此,適合應用於可進行與動作指令對應的動作的觸控面板。According to the conductive film of the present invention, it is possible to obtain a conductive film which can improve the detection accuracy of the touch position, and therefore is suitably applied to a touch panel which can perform an operation corresponding to an operation command.
以下,參照圖1~圖11,對將本發明的導電性膜例如應用於觸控面板的實施方式例進行說明。本發明不限於以下的實施方式。此外,在本說明書中,表示數值範圍的“~”,作為其前後所記載的數值包含下限值和上限值的含義來使用。Hereinafter, an embodiment in which the conductive film of the present invention is applied to, for example, a touch panel will be described with reference to FIGS. 1 to 11 . The invention is not limited to the following embodiments. In addition, in the present specification, "~" indicating a numerical range is used as a meaning in which the numerical values described before and after the lower limit and the upper limit are included.
如圖1所示,應用了本實施方式的導電性膜的觸控面板10具有感測器主體12和控制電路14(由IC電路等構成,參照圖2)。感測器主體12具有:層疊導電性膜18,其由第1導電性膜16A和第2導電性膜16B層疊而構成;以及包覆層20,其層疊在層疊導電性膜18上,例如由玻璃製成。層疊導電性膜18和包覆層20例如配置在液晶顯示器等顯示裝置22中的顯示面板24上。在從上面觀察時,第1導電性膜16A和第2導電性膜16B具有:與顯示面板24的顯示畫面24a對應的第1感測器區域26A和第2感測器區域26B;與顯示面板24的外周部分對應的第1端子配線區域28A和第2端子配線區域28B(所謂邊緣);以從第1感測器區域26A直到第1端子配線區域28A的方式形成的第1導電部30A;以及以從第2感測器區域26B直到第2端子配線區域28B的方式形成的第2導電部30B。As shown in FIG. 1, the touch panel 10 to which the conductive film of the present embodiment is applied has a sensor body 12 and a control circuit 14 (constructed by an IC circuit or the like, see FIG. 2). The sensor body 12 includes a laminated conductive film 18 which is formed by laminating a first conductive film 16A and a second conductive film 16B, and a cladding layer 20 laminated on the laminated conductive film 18, for example, Made of glass. The laminated conductive film 18 and the cladding layer 20 are disposed, for example, on the display panel 24 of the display device 22 such as a liquid crystal display. When viewed from above, the first conductive film 16A and the second conductive film 16B have the first sensor region 26A and the second sensor region 26B corresponding to the display screen 24a of the display panel 24; and the display panel a first terminal wiring region 28A and a second terminal wiring region 28B (so-called edge) corresponding to the outer peripheral portion of 24; a first conductive portion 30A formed so as to be from the first sensor region 26A to the first terminal wiring region 28A; The second conductive portion 30B is formed to extend from the second sensor region 26B to the second terminal wiring region 28B.
如圖2所示,第1導電性膜16A具有:第1透明基體32A;在該第1透明基體32A的表面上形成的上述第1導電部30A;以及以覆蓋第1導電部30A的方式形成的第1透明粘接劑層34A。第1透明基體32A可以由板狀、層狀等的絕緣體(電介質)構成。As shown in FIG. 2, the first conductive film 16A includes a first transparent substrate 32A, the first conductive portion 30A formed on the surface of the first transparent substrate 32A, and a first conductive portion 30A. The first transparent adhesive layer 34A. The first transparent substrate 32A may be formed of an insulator (dielectric) such as a plate or a layer.
如圖1和圖3A所示,在第1感測器區域26A中,形成有多個第1電極圖案36A,它們由金屬細線構成的透明導電層形成。第1電極圖案36A具有通過組合多個單元38(參照圖3A)而構成的網狀圖案40(參照圖3A),第1電極圖案36A沿第1方向(y方向)延伸,並沿與第1方向垂直的第2方向(x方向)排列。此處,“單元”是指由多個金屬細線二維地劃分出的形狀。As shown in FIGS. 1 and 3A, in the first sensor region 26A, a plurality of first electrode patterns 36A are formed, which are formed of a transparent conductive layer made of thin metal wires. The first electrode pattern 36A has a mesh pattern 40 (see FIG. 3A) configured by combining a plurality of cells 38 (see FIG. 3A), and the first electrode pattern 36A extends in the first direction (y direction) and is along the first The directions are arranged in the second direction (x direction) perpendicular to the direction. Here, the "unit" means a shape that is two-dimensionally divided by a plurality of thin metal wires.
如圖1所示,在如上述那樣構成的第1導電性膜16A中,第1電極圖案36A的各一個端部分別經由第1連線部42a與由金屬細線形成的第1端子配線部44a電連接。從各第1連線部42a匯出的第1端子配線部44a朝第1導電性膜16A的一個長邊的大致中央部進行引線,分別與對應的第1端子部46a電連接。此外,在第1端子配線區域28A中,形成有電極膜48,該電極膜48與第1接地端子部50a電連接。As shown in FIG. 1, in the first conductive film 16A configured as described above, each end portion of the first electrode pattern 36A passes through the first connection portion 42a and the first terminal wiring portion 44a formed of a thin metal wire. Electrical connection. The first terminal wiring portion 44a that is discharged from each of the first connection portions 42a is led to the substantially central portion of one long side of the first conductive film 16A, and is electrically connected to the corresponding first terminal portion 46a. Further, in the first terminal wiring region 28A, an electrode film 48 is formed, and the electrode film 48 is electrically connected to the first ground terminal portion 50a.
同樣,如圖2所示,第2導電性膜16B具有:第2透明基體32B;在該第2透明基體32B的表面上形成的上述第2導電部30B;以及以覆蓋第2導電部30B的方式形成的第2透明粘接劑層34B。第2透明基體32B可以由板狀、層狀等的絕緣體(電介質)構成。Similarly, as shown in FIG. 2, the second conductive film 16B includes a second transparent substrate 32B, the second conductive portion 30B formed on the surface of the second transparent substrate 32B, and the second conductive portion 30B. The second transparent adhesive layer 34B formed in this manner. The second transparent substrate 32B may be formed of an insulator (dielectric) such as a plate or a layer.
在第2感測器區域26B中,如圖1和圖3A所示,形成有多個第2電極圖案36B,它們由金屬細線構成的透明導電層形成。第2電極圖案36B具有通過組合多個單元38(參照圖3A)而構成的網狀圖案40(參照圖3A),第2電極圖案36B沿第2方向(x方向)延伸,並沿第1方向(y方向)排列。In the second sensor region 26B, as shown in FIGS. 1 and 3A, a plurality of second electrode patterns 36B are formed, which are formed of a transparent conductive layer made of thin metal wires. The second electrode pattern 36B has a mesh pattern 40 (see FIG. 3A) configured by combining a plurality of cells 38 (see FIG. 3A), and the second electrode pattern 36B extends in the second direction (x direction) and is along the first direction. (y direction) arranged.
如圖1所示,在如上述那樣構成的第2導電性膜16B中,各第2電極圖案36B的一個端部分別經由第2連線部42b與由金屬配線構成的第2端子配線部44b電連接。從各第2連線部42b匯出的第2端子配線部44b朝第2導電性膜16B的一個長邊的大致中央部進行引線,分別與對應的第2端子部46b電連接。此外,在第2端子配線部44b的外側,以從一個第2接地端子部50b朝另一個第2接地端子部50b而圍著第2感測器區域26B的方式,形成有以遮罩效應為目的接地線52。As shown in FIG. 1, in the second conductive film 16B configured as described above, one end portion of each of the second electrode patterns 36B passes through the second connection portion 42b and the second terminal wiring portion 44b made of metal wiring. Electrical connection. The second terminal wiring portion 44b that is discharged from each of the second connecting portions 42b is led to the substantially central portion of one long side of the second conductive film 16B, and is electrically connected to the corresponding second terminal portion 46b. Further, on the outer side of the second terminal wiring portion 44b, a mask effect is formed so as to surround the second sensor region 26B from one second ground terminal portion 50b toward the other second ground terminal portion 50b. Destination ground line 52.
而且,如圖3A和圖3B所示,第1電極圖案36A具有:主體圖案54,其沿第1方向(y方向)延伸;一方擴展圖案56A,其從該主體圖案54的一側朝相鄰的一方第1電極圖案36A擴展;以及另一方擴展圖案56B,其從主體圖案54的另一側朝相鄰的另一方第1電極圖案36A擴展。在不區分記述一方擴展圖案56A以及另一方擴展圖案56B的情況下,記作擴展圖案56。Further, as shown in FIGS. 3A and 3B, the first electrode pattern 36A has a main body pattern 54 extending in the first direction (y direction) and one extended pattern 56A from the side of the main body pattern 54 toward the adjacent side. One of the first electrode patterns 36A is expanded, and the other of the expanded patterns 56B is expanded from the other side of the main body pattern 54 toward the adjacent other first electrode pattern 36A. When the one extension pattern 56A and the other extension pattern 56B are not distinguished, the extension pattern 56 is referred to.
此外,成為如下方式:在一方擴展圖案56A之間,插入有相鄰的一方第1電極圖案36A的另一方擴展圖案56B,在另一方擴展圖案56B之間,插入有相鄰的另一方第1電極圖案36A的一方擴展圖案56A。即,擴展圖案56排列為嵌套狀。In addition, the other extension pattern 56B of the adjacent one of the first electrode patterns 36A is inserted between the one extension pattern 56A, and the other one is inserted between the other extension patterns 56B. One of the electrode patterns 36A expands the pattern 56A. That is, the expanded patterns 56 are arranged in a nested shape.
此處,參照圖3A~圖8B,對擴展圖案56排列為嵌套狀的方式的例子進行說明。Here, an example in which the expanded patterns 56 are arranged in a nested shape will be described with reference to FIGS. 3A to 8B.
首先,如圖3A和圖3B所示,在第1方式中,具有如下方式:一方擴展圖案56A和另一方擴展圖案56B從主體圖案54對稱地擴展,各方擴展圖案56以每隔1個的方式排列為嵌套狀。當然,雖然沒有圖示,例如也可以是如下方式:各方擴展圖案56以每隔多個例如2個的方式排列為嵌套狀。First, as shown in FIG. 3A and FIG. 3B, in the first aspect, the one extension pattern 56A and the other extension pattern 56B are symmetrically expanded from the main body pattern 54, and the respective extension patterns 56 are every other one. The way is arranged in a nested shape. Of course, although not shown, for example, the respective extension patterns 56 may be arranged in a nest shape every two or more, for example, two.
圖4A和圖4B所示,在第2方式中,具有如下方式:一方擴展圖案56A和另一方擴展圖案56B分別交替地從主體圖案54擴展,各方擴展圖案56以每隔一個的方式排列為嵌套狀。當然,如圖5A和圖5B所示,也可以是如下方式:各方擴展圖案56以每隔多個例如2個的方式排列為嵌套狀。As shown in FIG. 4A and FIG. 4B, in the second aspect, the one extension pattern 56A and the other extension pattern 56B are alternately expanded from the main body pattern 54, and the respective extension patterns 56 are arranged in every other manner. Nested. Of course, as shown in FIG. 5A and FIG. 5B, the respective extension patterns 56 may be arranged in a nest shape every two or more, for example, two.
第3方式具有如下方式。即,如圖6A和圖6B所示,一方擴展圖案56A具有:第1擴展部58A,其朝相鄰的一方第1電極圖案36A擴展;以及1方第1延伸部60A,其從該第1擴展部58A沿著主體圖案54延伸。同樣,第1電極圖案36A的另一方擴展圖案56B具有:第2擴展部58B,其朝相鄰的另一方第1電極圖案36A擴展;以及1個第2延伸部60B,其從該第2擴展部58B沿著主體圖案54延伸。The third aspect has the following aspects. In other words, as shown in FIG. 6A and FIG. 6B, the one extension pattern 56A includes a first extension portion 58A that expands toward the adjacent one of the first electrode patterns 36A, and one of the first extension portions 60A from which the first extension portion 60A The extension 58A extends along the body pattern 54. Similarly, the other extension pattern 56B of the first electrode pattern 36A has a second extension portion 58B that expands toward the adjacent other first electrode pattern 36A, and a second extension portion 60B that extends from the second extension portion The portion 58B extends along the body pattern 54.
在該情況下,具有如下方式:第1擴展部58A和第2擴展部58B分別交替地從主體圖案54擴展。而且,第1擴展部58A和第2擴展部58B排列為嵌套狀,此外,第1延伸部60A和第2延伸部60B排列為嵌套狀。在不區分記述第1擴展部58A和第2擴展部58B的情況下,記作擴展部58,在不區分記述第1延伸部60A和第2延伸部60B的情況下,記作延伸部60。In this case, the first expansion unit 58A and the second expansion unit 58B are alternately expanded from the main body pattern 54 as follows. Further, the first extension portion 58A and the second extension portion 58B are arranged in a nested shape, and the first extension portion 60A and the second extension portion 60B are arranged in a nested shape. When the first extension portion 58A and the second extension portion 58B are not described, the extension portion 58 is referred to as an extension portion 60 when the first extension portion 60A and the second extension portion 60B are not described.
如圖7A和圖7B所示,第4方式具有與第3方式大致相同的結構,但在以下方面不同:多個第1延伸部60A從第1擴展部58A擴展,多個第2延伸部60B從第2擴展部58B擴展。As shown in FIG. 7A and FIG. 7B, the fourth aspect has substantially the same configuration as that of the third embodiment, but differs in that the plurality of first extending portions 60A are expanded from the first expanding portion 58A, and the plurality of second extending portions 60B are formed. The second extension unit 58B is expanded.
如圖8A和圖8B所示,第5方式具有與第2方式大致相同的結構,但在以下方面不同:一方擴展圖案56A以及另一方擴展圖案56B的各自的外形形狀為三角形狀。即,例如,不限於第1方式以及第2方式那樣的矩形形狀,也可以是三角形狀或其它多邊形狀。As shown in FIG. 8A and FIG. 8B, the fifth aspect has substantially the same configuration as that of the second embodiment, but differs in that the outer shape of each of the one extension pattern 56A and the other extension pattern 56B has a triangular shape. In other words, for example, it is not limited to the rectangular shape as in the first aspect and the second aspect, and may be a triangular shape or another polygonal shape.
如圖3B、圖4B、圖5B、圖6B、圖7B和圖8B的例子所示,擴展圖案56的寬度Wh是指將由劃分出擴展圖案56的假想電極線La形成的矩形形狀投影到以與主體圖案54的延伸方向(第1方向:y方向)垂直的方向(第2方向:x方向)為法線的假想面Ma而形成的線段的長度。第3方式或第4方式中,是指將由劃分出擴展圖案56的假想電極線La形成的矩形形狀和由劃分出延伸部60的假想電極線La形成的矩形形狀投影到假想面Ma而形成的線段的長度。此外,如圖6B所示,在一方擴展圖案56A和另一方擴展圖案56B的形狀不同的情況下,一方擴展圖案56A的寬度Wh和另一方擴展圖案56B的寬度Wh有時不同。As shown in the examples of FIGS. 3B, 4B, 5B, 6B, 7B, and 8B, the width Wh of the expanded pattern 56 means that a rectangular shape formed by the virtual electrode line La in which the expanded pattern 56 is divided is projected to The direction in which the direction in which the main body pattern 54 extends (the first direction: the y direction) (the second direction: the x direction) is the length of the line segment formed by the normal plane Ma of the normal line. In the third aspect or the fourth aspect, the rectangular shape formed by the virtual electrode line La in which the expanded pattern 56 is divided and the rectangular shape formed by the virtual electrode line La in which the extending portion 60 is divided are projected onto the virtual surface Ma. The length of the line segment. Further, as shown in FIG. 6B, when the shapes of the one extension pattern 56A and the other extension pattern 56B are different, the width Wh of one of the extension patterns 56A and the width Wh of the other extension pattern 56B may be different.
圖6B和圖7B所示,第1擴展部58A、第2擴展部58B、第1延伸部60A以及第2延伸部60B的各自的最大寬度Wa1、Wb1、Wa2以及Wb2小於主體圖案54的寬度Wd。6B and 7B, the maximum widths Wa1, Wb1, Wa2, and Wb2 of the first expanded portion 58A, the second expanded portion 58B, the first extended portion 60A, and the second extended portion 60B are smaller than the width Wd of the main body pattern 54. .
優選的是,寬度Wa1、Wa2、Wb1以及Wb2均設計為單元38的平均直徑D×1/2×k(k為實數)。如圖9所示,在觀察由通過構成1個單元38的金屬細線的中心的線(中心線)形成的形狀時,定義沿著主體圖案54的延伸方向(第1方向:y方向)的第1對角線的長度Dy和沿著與第1方向垂直的方向(第2方向:x方向)的第2對角線的長度Dx,提取擴展部或延伸部中的5個以上的單元38,求出平均Dx、平均Dy,將各方向的平均直徑定義為平均直徑D。進而,對擴展部或延伸部的寬度與各電極的寬度方向的平均直徑D(平均Dx或平均Dy)進行比較。具體而言,對寬度Wa1以及寬度Wa2與平均Dy進行比較,對寬度Wb1以及寬度Wb2與平均Dx進行比較。此時,優選的是,寬度Wa1、Wa2、Wb1以及Wb2均設計為單元38的平均直徑D×1/2×k(k為實數)。Preferably, the widths Wa1, Wa2, Wb1, and Wb2 are each designed to have an average diameter D × 1/2 × k (k is a real number) of the unit 38. As shown in FIG. 9 , when the shape formed by the line (center line) passing through the center of the metal thin wire constituting one unit 38 is observed, the direction along the extending direction of the main body pattern 54 (the first direction: the y direction) is defined. The length Dy of the diagonal line and the length Dx of the second diagonal line along the direction perpendicular to the first direction (the second direction: the x direction) are extracted from five or more units 38 in the extended portion or the extended portion, The average Dx and the average Dy were obtained, and the average diameter in each direction was defined as the average diameter D. Further, the width of the expanded portion or the extended portion is compared with the average diameter D (average Dx or average Dy) in the width direction of each electrode. Specifically, the width Wa1 and the width Wa2 are compared with the average Dy, and the width Wb1 and the width Wb2 are compared with the average Dx. At this time, it is preferable that the widths Wa1, Wa2, Wb1, and Wb2 are each designed to have an average diameter D × 1/2 × k (k is a real number) of the unit 38.
如果不按上述方式來設計寬度Wa1等,則構成第1擴展部58A、第2擴展部58B、第1延伸部60A以及第2延伸部60B的網狀結構的設計變得困難,有可能產生這些第1擴展部58A等電阻值因位置而變化的問題。尤其是,通過將寬度Wa1、Wa2、Wb1以及Wb2設計為均與例如設k=2或4的情況下的單元38的平均直徑D相等、或者設計為與單元38的平均直徑D的2倍相等,使得電阻值幾乎沒有變動,且能夠增加第1延伸部60A以及第2延伸部60B的條數,因此,能夠高精度進行觸摸位置的檢測。If the width Wa1 or the like is not designed as described above, the design of the mesh structure constituting the first expanded portion 58A, the second expanded portion 58B, the first extended portion 60A, and the second extended portion 60B becomes difficult, and these may occur. The problem that the resistance value of the first extension portion 58A changes due to the position. In particular, by designing the widths Wa1, Wa2, Wb1, and Wb2 to be equal to, for example, the average diameter D of the unit 38 in the case where k=2 or 4 is set, or to be equal to twice the average diameter D of the unit 38. Since the resistance value hardly changes and the number of the first extension portion 60A and the second extension portion 60B can be increased, the detection of the touch position can be performed with high precision.
另一方面,第2電極圖案36B優選由沿第2方向(x方向)延伸的帶狀圖案構成。此外,第2電極圖案36B優選與各擴展圖案56相對地配置。第2電極圖案36B的寬度We是指例如如圖3A所示,由劃分出第2電極圖案36B的假想電極線La形成的矩形形狀中的、沿著第1電極圖案36A的延伸方向(第1方向:y方向)的長度。第2電極圖案36B的寬度We可以小於第1電極圖案36A的擴展圖案56的寬度Wh,也可以大於寬度Wh。可以根據第1方向(y方向)的解析度而適當設定。例如,可舉出使1~5條第2電極圖案36B與擴展圖案56相對的方式。在圖6A~圖7B所示的第3方式以及第4方式中,可舉出使1~5條第2電極圖案36B與第1延伸部60A或第2延伸部60B相對的方式。On the other hand, the second electrode pattern 36B is preferably formed of a stripe pattern extending in the second direction (x direction). Further, it is preferable that the second electrode pattern 36B is disposed to face each of the expanded patterns 56. The width We of the second electrode pattern 36B is, for example, as shown in FIG. 3A, in the rectangular shape formed by the virtual electrode line La in which the second electrode pattern 36B is divided, along the extending direction of the first electrode pattern 36A (first Direction: length in the y direction). The width We of the second electrode pattern 36B may be smaller than the width Wh of the expanded pattern 56 of the first electrode pattern 36A, or may be larger than the width Wh. It can be set as appropriate according to the resolution of the first direction (y direction). For example, a form in which 1 to 5 second electrode patterns 36B are opposed to the expanded pattern 56 can be cited. In the third aspect and the fourth aspect shown in FIG. 6A to FIG. 7B, one or five second electrode patterns 36B are opposed to the first extending portion 60A or the second extending portion 60B.
進而,在使用該層疊導電性膜18作為觸控面板10的情況下,將包覆層20層疊在第2導電性膜16B上,並使第1端子配線部44a和第2端子配線部44b例如與控制掃描的控制電路14(參照圖2)連接,其中,第1端子配線部44a從第1導電性膜16A的多個第1電極圖案36A匯出,第2端子配線部44b從第2導電性膜16B的多個第2電極圖案36B匯出。Furthermore, when the laminated conductive film 18 is used as the touch panel 10, the cladding layer 20 is laminated on the second conductive film 16B, and the first terminal wiring portion 44a and the second terminal wiring portion 44b are, for example, The second terminal wiring portion 44a is connected from the plurality of first electrode patterns 36A of the first conductive film 16A, and the second terminal wiring portion 44b is connected from the second conductive line. The control circuit 14 (see FIG. 2) for controlling the scanning is connected. The plurality of second electrode patterns 36B of the film 16B are discharged.
作為觸摸位置的檢測方式,可以優選採用自容式或互容式。As a method of detecting the touch position, a self-capacitance or a mutual capacitance type can be preferably used.
如圖2所示,在自容式中,從控制電路14向第1端子配線部44a依次提供用於檢測觸摸位置的第1脈衝信號P1,從控制電路14向第2端子配線部44b依次提供用於檢測觸摸位置的第2脈衝信號P2。As shown in FIG. 2, in the self-contained mode, the first pulse signal P1 for detecting the touch position is sequentially supplied from the control circuit 14 to the first terminal wiring portion 44a, and is sequentially supplied from the control circuit 14 to the second terminal wiring portion 44b. A second pulse signal P2 for detecting a touch position.
通過使指尖與包覆層20的上表面接觸或接近,由此,與觸摸位置相對的第1電極圖案36A與GND(大地)之間的電容、以及第2電極圖案36B與GND之間的電容增大,因此,來自該第1電極圖案36A以及第2電極圖案36B的傳導信號的波形成為與來自其它第1電極圖案36A以及第2電極圖案36B的傳導信號的波形不同的波形。因此,在控制電路14中,根據來自該第1電極圖案36A以及第2電極圖案36B的傳導信號,對觸摸位置進行運算。By bringing the fingertip into contact with or close to the upper surface of the cladding layer 20, the capacitance between the first electrode pattern 36A and the GND (earth) and the second electrode pattern 36B and GND are opposite to the touch position. Since the capacitance is increased, the waveform of the conduction signal from the first electrode pattern 36A and the second electrode pattern 36B is a waveform different from the waveform of the conduction signal from the other first electrode pattern 36A and the second electrode pattern 36B. Therefore, in the control circuit 14, the touch position is calculated based on the conduction signals from the first electrode pattern 36A and the second electrode pattern 36B.
另一方面,如圖10所示,在互容式中,從控制電路14向第1電極圖案36A依次施加用於檢測觸摸位置的電壓信號S1,對第2電極圖案36B依次進行感測(傳導信號S2的檢測)。通過使指尖與包覆層20的上表面接觸或接近,由此,相對於與觸摸位置相對的第1電極圖案36A和第2電極圖案36B之間的寄生電容(初始的靜電電容)而並聯地增加了手指的雜散電容,因此,來自與觸摸位置對應的第2電極圖案36B的傳導信號S2的波形成為與來自其它第2電極圖案36B的傳導信號S2的波形不同的波形。因此,在控制電路14中,根據提供電壓信號S1的第1電極圖案36A的順序和被提供的來自第2電極圖案36B的傳導信號S2,對觸摸位置進行運算。On the other hand, as shown in FIG. 10, in the mutual capacitance type, the voltage signal S1 for detecting the touch position is sequentially applied from the control circuit 14 to the first electrode pattern 36A, and the second electrode pattern 36B is sequentially sensed (conducted). Detection of signal S2). By bringing the fingertip into contact with or close to the upper surface of the cladding layer 20, the parasitic capacitance (initial electrostatic capacitance) between the first electrode pattern 36A and the second electrode pattern 36B opposed to the touch position is connected in parallel. Since the stray capacitance of the finger is increased, the waveform of the conduction signal S2 from the second electrode pattern 36B corresponding to the touch position is a waveform different from the waveform of the conduction signal S2 from the other second electrode pattern 36B. Therefore, in the control circuit 14, the touch position is calculated based on the order of the first electrode pattern 36A that supplies the voltage signal S1 and the supplied conduction signal S2 from the second electrode pattern 36B.
通過採用這樣的自容式或互容式的觸摸位置的檢測方法,即使同時使兩個指尖與包覆層20的上表面接觸或接近,也能夠檢測出各觸摸位置。By adopting such a self-capacitive or mutual-capacitance touch position detecting method, even if the two fingertips are brought into contact with or close to the upper surface of the cladding layer 20 at the same time, each touch position can be detected.
此外,作為投影型靜電電容方式的檢測電路相關的現有技術文獻,有美國特許第4,582,955號說明書、美國特許第4,686、332號說明書、美國特許第4,733,222號說明書、美國特許第5,374,787號說明書、美國特許第5,543,588號說明書、美國特許第7,030,860號說明書、美國專利申請公開第2004/0155871號說明書等。In addition, as a prior art document related to a projection type electrostatic capacitance type detection circuit, there are a specification of U.S. Patent No. 4,582,955, a specification of U.S. Patent No. 4,686,332, and a specification of U.S. Patent No. 4,733,222. U.S. Patent No. 5,374,787, U.S. Patent No. 5,543,588, U.S. Patent No. 7,030,860, U.S. Patent Application Publication No. 2004/0155871, and the like.
在第1電極圖案36A中不存在擴展圖案56的情況下,在第1電極圖案36A的相鄰的兩個主體圖案54之間且相鄰的兩個第2電極圖案36B之間不存在用於捕捉靜電電容的變化的電極圖案。因此,在手指與這樣的部位接觸或接近的情況下,手指的位置檢測精度下降,在利用筆等觸摸範圍較小的物體接觸時,不能檢測出觸摸位置,有可能進行與操作者的意願不同的動作。When the extension pattern 56 is not present in the first electrode pattern 36A, there is no case between the adjacent two body patterns 54 of the first electrode pattern 36A and between the adjacent two second electrode patterns 36B. A pattern of electrodes that capture changes in electrostatic capacitance. Therefore, when the finger is in contact with or close to such a portion, the position detection accuracy of the finger is lowered, and when an object having a small touch range such as a pen is touched, the touch position cannot be detected, and there is a possibility that the intention of the operator is different. Actions.
與此相對,在本實施方式中,在第1電極圖案36A中,第2電極圖案36B與各擴展圖案56相對地排列,因此,即使在手指在第1電極圖案36A的相鄰的兩個主體圖案54之間且相鄰的兩個第2電極圖案36B之間接觸或接近的情況下,也能夠捕捉到靜電電容的變化,因此,即使在這樣的部位,也能夠檢測出觸摸位置。換言之,觸摸位置的檢測精度提高。其結果是,進行與操作者期望的動作指令對應的動作。On the other hand, in the first electrode pattern 36A, since the second electrode pattern 36B is arranged to face each of the expanded patterns 56, even if the finger is in the adjacent two bodies of the first electrode pattern 36A. When the patterns 54 are in contact with or close to each other between the adjacent two second electrode patterns 36B, the change in electrostatic capacitance can be captured. Therefore, even at such a portion, the touch position can be detected. In other words, the detection accuracy of the touch position is improved. As a result, an operation corresponding to an operation command desired by the operator is performed.
在本實施方式中,即使在手指在第1電極圖案36A的相鄰的兩個主體圖案54之間且相鄰的兩個第2電極圖案36B之間接觸或接近的情況下,也能夠捕捉到靜電電容的變化。尤其是,如第3方式或第4方式那樣,第1延伸部60A和第2延伸部60B排列為嵌套狀,因此,第1電極圖案36A之間的觸摸位置的檢測解析度提高,與第1方式或第2方式所示的圖案相比,觸摸位置的檢測精度提高。In the present embodiment, even when the finger is in contact with or close between the adjacent two main body patterns 54 of the first electrode pattern 36A and between the adjacent two second electrode patterns 36B, it is possible to capture The change in electrostatic capacitance. In particular, since the first extending portion 60A and the second extending portion 60B are arranged in a nested shape as in the third aspect or the fourth aspect, the detection resolution of the touch position between the first electrode patterns 36A is improved, and The detection accuracy of the touch position is improved as compared with the pattern shown in the first mode or the second mode.
此外,分別使多個單元38沿擴展方向排列而構成第1擴展部58A以及第2擴展部58B,分別使多個單元38沿主體圖案54的延伸方向排列而構成第1延伸部60A以及第2延伸部60B,因此,既能夠最大限度地提高第1電極圖案36A之間的觸摸位置的檢測解析度,又能夠確保第1擴展部58A、第2擴展部58B、第1延伸部60A以及第2延伸部60B的導電性。Further, the plurality of cells 38 are arranged in the extending direction to form the first expanded portion 58A and the second expanded portion 58B, and the plurality of cells 38 are arranged in the extending direction of the main body pattern 54 to constitute the first extending portion 60A and the second portion. Since the extending portion 60B can maximize the detection resolution of the touch position between the first electrode patterns 36A, the first expanded portion 58A, the second expanded portion 58B, the first extended portion 60A, and the second can be secured. The electrical conductivity of the extension 60B.
此外,通過使第1延伸部60A以及第2延伸部60B的各自的最大寬度Wb1以及Wb2大於第1延伸部60A與第2延伸部60B之間的間隔Wc(參照圖6A和圖7A),起到如下效果。即,成為如下方式:以填充在第1電極圖案36A的相鄰的兩個主體圖案54之間且相鄰的兩個第2電極圖案36B之間的方式,配置彼此排列為嵌套狀的梳齒狀的一方擴展圖案56A和另一方擴展圖案56B。因此,能夠消除不能檢測觸摸位置或難以檢測的部位,進一步提高觸摸位置的檢測精度。尤其是,通過將間隔Wc設為構成網狀的單元38的平均直徑D×1/2×k(k為實數),能夠使第1擴展部58A或第2擴展部58B等網狀結構的設計變得容易,抑制電阻值局部地變動。此外,通過將間隔Wc設計為與例如設k=1的情況下的單元38的平均直徑D的1/2相等,能夠使第1擴展部58A以及第2擴展部58B的網狀結構的設計變得容易,能夠進行電阻值幾乎沒有變動的設計,而且,能夠減小第1擴展部58A以及第2擴展部58B的排列間距,能夠高精度進行觸摸位置的檢測。此外,此處單元38的平均直徑D是任意提取5個以上構成第1電極圖案36A的單元38並計算其寬度方向(x方向)的長度的平均值(平均Dx)而得到的。In addition, the maximum widths Wb1 and Wb2 of the first extending portion 60A and the second extending portion 60B are larger than the interval Wc between the first extending portion 60A and the second extending portion 60B (see FIGS. 6A and 7A). To the following effect. In other words, the combs arranged in a nested shape are arranged so as to be filled between the adjacent two main body patterns 54 of the first electrode pattern 36A and between the adjacent two second electrode patterns 36B. One of the teeth is expanded by the pattern 56A and the other of the expanded pattern 56B. Therefore, it is possible to eliminate a portion where the touch position cannot be detected or which is difficult to detect, and to further improve the detection accuracy of the touch position. In particular, by setting the interval Wc to the average diameter D × 1/2 × k (k is a real number) of the cells 38 constituting the mesh, the design of the mesh structure such as the first expanded portion 58A or the second expanded portion 58B can be designed. It becomes easy to suppress the resistance value from locally varying. Further, by designing the interval Wc to be equal to 1/2 of the average diameter D of the unit 38 when k=1, for example, the design of the mesh structure of the first expanded portion 58A and the second expanded portion 58B can be changed. It is easy to carry out the design in which the resistance value hardly changes, and the arrangement pitch of the first expanded portion 58A and the second expanded portion 58B can be made small, and the touch position can be detected with high precision. In addition, the average diameter D of the unit 38 is obtained by arbitrarily extracting five or more elements 38 constituting the first electrode pattern 36A and calculating the average value (average Dx) of the length in the width direction (x direction).
各單元38由多邊形構成。作為多邊形,可舉出三角形、四邊形(正方形、長方形、平行四邊形、菱形等)、五邊形、六邊形、隨機多邊形等。此外,構成多邊形的邊的一部分也可以由曲線構成。單元38的一個邊的長度優選為100μm~300μm。在一個邊的長度過短時,存在開口率以及透射率下降、透明性也隨之變差這樣的問題。相反,在一個邊的長度過長時,雖然開口率以及透射率提高,但存在第1電極圖案36A以及第2電極圖案36B的電阻升高、觸摸位置的檢測精度變差這樣的問題。在單元38的一個邊的長度為上述範圍的情況下,能夠進一步使透明性保持良好,在安裝到顯示裝置22的顯示面板24上時,能夠無不適感地識別出顯示。Each unit 38 is composed of a polygon. Examples of the polygon include a triangle, a quadrangle (square, rectangle, parallelogram, diamond, etc.), a pentagon, a hexagon, a random polygon, and the like. Further, a part of the side constituting the polygon may be constituted by a curved line. The length of one side of the unit 38 is preferably from 100 μm to 300 μm. When the length of one side is too short, there is a problem that the aperture ratio and the transmittance are lowered, and the transparency is also deteriorated. On the other hand, when the length of one side is too long, the aperture ratio and the transmittance are improved, but the electric resistance of the first electrode pattern 36A and the second electrode pattern 36B is increased, and the detection accuracy of the touch position is deteriorated. When the length of one side of the unit 38 is in the above range, the transparency can be further improved, and when mounted on the display panel 24 of the display device 22, the display can be recognized without discomfort.
金屬細線的線寬優選為0.1μm以上且15μm以下,更優選為0.5μm以上且9μm以下,進一步優選為1μm以上且7μm以下。第1電極圖案36A以及第2電極圖案36B的表面電阻優選處於0.1~100歐姆/sq.的範圍。下限值為1歐姆/sq.以上、3歐姆/sq.以上、5歐姆/sq.以上,優選為10歐姆/sq.以上。上限值為70歐姆/sq.以下,優選為50歐姆/sq.以下。The line width of the fine metal wires is preferably 0.1 μm or more and 15 μm or less, more preferably 0.5 μm or more and 9 μm or less, and still more preferably 1 μm or more and 7 μm or less. The surface resistance of the first electrode pattern 36A and the second electrode pattern 36B is preferably in the range of 0.1 to 100 ohms/sq. The lower limit value is 1 ohm/sq. or more, 3 ohm/sq. or more, 5 ohm/sq. or more, and preferably 10 ohm/sq. or more. The upper limit is 70 ohm/sq. or less, preferably 50 ohm/sq. or less.
接下來,對本實施方式的導電性膜的優選方式說明如下。Next, a preferred embodiment of the conductive film of the present embodiment will be described below.
構成上述第1端子配線部44a、第2端子配線部44b、第1端子部46a、第2端子部46b、電極膜48、第1接地端子部50a、第2接地端子部50b以及接地線52的金屬配線以及構成第1電極圖案36A以及第2電極圖案36B的金屬細線分別優選由單一的導電性材料構成。單一的導電性材料優選由銀、銅、鋁中的1種構成的金屬或由包含它們中的至少1種的合金構成。The first terminal wiring portion 44a, the second terminal wiring portion 44b, the first terminal portion 46a, the second terminal portion 46b, the electrode film 48, the first ground terminal portion 50a, the second ground terminal portion 50b, and the ground line 52 are formed. Each of the metal wiring and the metal thin wires constituting the first electrode pattern 36A and the second electrode pattern 36B is preferably made of a single conductive material. The single conductive material is preferably made of a metal composed of one of silver, copper, and aluminum, or an alloy containing at least one of them.
關於本實施方式的第1導電性膜16A以及第2導電性膜16B,從可見光透射率的角度來看,至少感測器區域26A、26B的開口率優選為85%以上,更優選為90%以上,最優選為95%以上。開口率是指除了金屬細線之外的透光性部分在整體中所占的比例,例如,線寬為6μm、細線間距為240μm的正方形的網格狀的開口率為95%。In the first conductive film 16A and the second conductive film 16B of the present embodiment, the aperture ratio of at least the sensor regions 26A and 26B is preferably 85% or more, and more preferably 90%, from the viewpoint of visible light transmittance. The above is most preferably 95% or more. The aperture ratio refers to a ratio of the light transmissive portion other than the fine metal wires in the whole, and for example, a square grid-like aperture ratio of a line width of 6 μm and a fine line pitch of 240 μm is 95%.
在上述層疊導電性膜18中,例如,如圖2所示那樣,在第1透明基體32A的表面形成第1導電部30A,在第2透明基體32B的表面形成第2導電部30B,此外,也可以如圖11所示那樣,在第2透明基體32B的一個面(例如下表面)形成第1導電部30A,在第2透明基體32B的另一個面(例如上表面)形成第2導電部30B。在該情況下,不存在第1透明基體32A,成為在第1導電部30A上層疊第2透明基體32B、在第2透明基體32B上層疊第2導電部30B的方式。在該情況下,優選的是,也以覆蓋第1導電部30A的方式形成第1透明粘接劑層34A,以覆蓋第2導電部30B的方式形成第2透明粘接劑層34B。此外,在第1導電性膜16A與第2導電性膜16B之間,可以存在其它層,如果第1電極圖案36A與第2電極圖案36B為絕緣狀態,也可以使它們相對地配置。In the laminated conductive film 18, for example, as shown in FIG. 2, the first conductive portion 30A is formed on the surface of the first transparent substrate 32A, and the second conductive portion 30B is formed on the surface of the second transparent substrate 32B. As shown in FIG. 11, the first conductive portion 30A may be formed on one surface (for example, the lower surface) of the second transparent substrate 32B, and the second conductive portion may be formed on the other surface (for example, the upper surface) of the second transparent substrate 32B. 30B. In this case, the first transparent substrate 32A is not present, and the second transparent substrate 32B is laminated on the first conductive portion 30A, and the second conductive portion 30B is laminated on the second transparent substrate 32B. In this case, it is preferable to form the first transparent adhesive layer 34A so as to cover the first conductive portion 30A, and to form the second transparent adhesive layer 34B so as to cover the second conductive portion 30B. Further, another layer may exist between the first conductive film 16A and the second conductive film 16B, and the first electrode pattern 36A and the second electrode pattern 36B may be disposed to face each other if they are insulated.
如圖1所示,優選的是,在第1導電性膜16A和第2導電性膜16B的例如各角部形成在對第1導電性膜16A和第2導電性膜16B進行粘合時使用的定位用的第1定位標記62a和第2定位標記62b。在粘合第1導電性膜16A和第2導電性膜16B來作為層疊導電性膜18的情況下,該第1定位標記62a和第2定位標記62b成為新的複合定位標記。該複合定位標記也可以作為在將該層疊導電性膜18設置到顯示面板24上時使用的定位用的定位標記來利用。As shown in FIG. 1, it is preferable to use, for example, each corner portion of the first conductive film 16A and the second conductive film 16B to bond the first conductive film 16A and the second conductive film 16B. The first positioning mark 62a and the second positioning mark 62b for positioning. When the first conductive film 16A and the second conductive film 16B are bonded to each other as the laminated conductive film 18, the first positioning mark 62a and the second positioning mark 62b become new composite positioning marks. The composite positioning mark can also be utilized as a positioning mark for positioning used when the laminated conductive film 18 is placed on the display panel 24.
在上述例子中,示出了將第1導電性膜16A和第2導電性膜16B應用於投影型靜電電容方式的觸控面板10的例子,此外,也可以將其應用於表面型靜電電容方式的觸控面板或電阻膜式的觸控面板。In the above example, the first conductive film 16A and the second conductive film 16B are applied to the projection type capacitive touch panel 10, and the surface can be applied to the surface type electrostatic capacitance method. Touch panel or resistive film touch panel.
此外,上述本實施方式的第1導電性膜16A和第2導電性膜16B除了作為顯示裝置22的觸控面板用的導電性膜來利用以外,還可作為顯示裝置22的電磁波遮罩膜或設置在顯示裝置22的顯示面板24上的光學膜來利用。作為顯示裝置22,可舉出液晶顯示器、等離子顯示器、有機EL、無機EL等。In addition, the first conductive film 16A and the second conductive film 16B of the present embodiment can be used as an electromagnetic wave mask film of the display device 22 in addition to the conductive film for the touch panel of the display device 22 or The optical film provided on the display panel 24 of the display device 22 is utilized. Examples of the display device 22 include a liquid crystal display, a plasma display, an organic EL, an inorganic EL, and the like.
接下來,代表性地對第1導電性膜16A的製造方法進行簡單說明。第2導電性膜16B也相同。Next, a method of manufacturing the first conductive film 16A will be briefly described. The second conductive film 16B is also the same.
作為製造第1導電性膜16A的方法,例如,可以在第1透明基體32A上使具有乳劑層的感光材料曝光,來實施顯像處理,由此,在曝光部和未曝光部分別形成金屬銀部和光透射性部,從而形成第1導電部30A,所述乳劑層包含感光性鹵化銀鹽。此外,可以進一步對金屬銀部實施物理顯像和/或鍍覆處理,由此,使金屬銀部保持導電性金屬。As a method of producing the first conductive film 16A, for example, a photosensitive material having an emulsion layer can be exposed on the first transparent substrate 32A to perform development processing, whereby metal silver is formed in the exposed portion and the unexposed portion, respectively. The first conductive portion 30A is formed by the portion and the light transmissive portion, and the emulsion layer contains a photosensitive silver halide salt. Further, the metal silver portion may be further subjected to physical development and/or plating treatment, whereby the metallic silver portion is maintained as a conductive metal.
或者,可以在第1透明基體32A上使用鍍覆預處理材料,形成感光性被鍍覆層,然後,在進行曝光、顯像處理後實施鍍覆處理,由此,在曝光部和未曝光部分別形成金屬部和光透射性部,從而形成第1導電部30A。此外,可以透過進一步對金屬部實施物理顯像和/或鍍覆處理,來使金屬部保持導電性金屬。Alternatively, a plating pretreatment material may be used on the first transparent substrate 32A to form a photosensitive plating layer, and then subjected to a plating treatment after exposure and development processing, whereby the exposed portion and the unexposed portion are formed. The metal portion and the light transmissive portion are formed separately to form the first conductive portion 30A. Further, the metal portion can be held by the conductive metal by performing physical development and/or plating treatment on the metal portion.
作為使用鍍覆預處理材料的方法的更優選的方式,可舉出如下兩種方式。此外,關於下述情況的更具體的內容,在日本特開2003-213437號公報、日本特開2006-64923號公報、日本特開2006-58797號公報,日本特開2006-135271號公報等中進行了公開。As a more preferable aspect of the method of using a plating pretreatment material, the following two methods are mentioned. In addition, in the case of the following, the Japanese Patent Laid-Open Publication No. Hei. No. 2006-213237, JP-A-2006-64923, JP-A-2006-58797, JP-A-2006-135271, etc. It was made public.
方式(a):在第1透明基體32A上,塗敷包含與鍍覆催化劑或其前驅體相互作用的官能團的被鍍覆層,然後,在進行曝光/顯像後,實施鍍覆處理,在被鍍覆材料上形成金屬部。(a): a plated layer containing a functional group that interacts with a plating catalyst or a precursor thereof is applied onto the first transparent substrate 32A, and then subjected to plating treatment after exposure/development A metal portion is formed on the material to be plated.
方式(b):在第1透明基體32A上,依次層疊包含聚合物和金屬氧化物的襯底層和包含與鍍覆催化劑或其前驅體相互作用的官能團的被鍍覆層,然後,在進行曝光/顯像後,實施鍍覆處理,在被鍍覆材料上形成金屬部。(b): On the first transparent substrate 32A, a substrate layer containing a polymer and a metal oxide and a plated layer containing a functional group that interacts with the plating catalyst or its precursor are sequentially laminated, and then exposed After development, plating treatment is performed to form a metal portion on the material to be plated.
作為其它方法,可以使在第1透明基體32A上形成的金屬箔上的光致抗蝕劑膜曝光,進行顯像處理,形成抗蝕劑圖案,對從抗蝕劑圖案露出的金屬箔進行蝕刻,由此形成第1導電部30A。Alternatively, the photoresist film on the metal foil formed on the first transparent substrate 32A may be exposed to a development process to form a resist pattern, and the metal foil exposed from the resist pattern may be etched. Thus, the first conductive portion 30A is formed.
或者,也可以在第1透明基體32A上印刷包含金屬微粒的膏(paste),對膏進行金屬鍍覆,由此形成網狀圖案。Alternatively, a paste containing metal fine particles may be printed on the first transparent substrate 32A, and the paste may be metal plated to form a mesh pattern.
或者,也可以利用絲網印刷版或凹版相片印刷版,在第1透明基體32A上印刷形成網狀圖案。Alternatively, a mesh pattern may be printed on the first transparent substrate 32A by using a screen printing plate or a gravure print plate.
或者,也可以通過噴墨,在第1透明基體32A上形成第1導電部30A。Alternatively, the first conductive portion 30A may be formed on the first transparent substrate 32A by inkjet.
接下來,在本實施方式的第1導電性膜16A中,以作為特別優選的方式的使用鹵化銀照片感光材料的方法為中心來記述。這對第2導電性膜16B也相同。Next, in the first conductive film 16A of the present embodiment, a method of using a silver halide photo-sensitive material as a particularly preferable embodiment will be described. The same applies to the second conductive film 16B.
本實施方式的第1導電性膜16A的製造方法根據感光材料和顯像處理的方式而包含如下3種方式。The method for producing the first conductive film 16A of the present embodiment includes the following three aspects depending on the method of the photosensitive material and the development process.
(1)使不含物理顯像核的感光性鹵化銀黑白感光材料進行化學顯像或熱顯像,在該感光材料上形成金屬銀部。(1) A photosensitive silver halide black-and-white photosensitive material containing no physical development nuclei is subjected to chemical development or thermal development, and a metallic silver portion is formed on the photosensitive material.
(2)使鹵化銀乳劑層中包含物理顯像核的感光性鹵化銀黑白感光材料進行溶解物理顯像,在該感光材料上形成金屬銀部。(2) A photosensitive silver halide black-and-white photosensitive material containing a physical development nuclei in a silver halide emulsion layer is subjected to electrolytic physical development, and a metallic silver portion is formed on the photosensitive material.
(3)使不含物理顯像核的感光性鹵化銀黑白感光材料與具有含物理顯像核的非感光性層的受像片重合,進行擴散轉印顯像,在非感光性受像片上形成金屬銀部。(3) A photosensitive silver halide black-and-white photosensitive material containing no physical development nuclei is superposed on a photoreceptor having a non-photosensitive layer containing a physical development nuclei, and diffusion-transfer imaging is performed to form a metal on the non-photosensitive photoreceptor. Silver Department.
上述(1)的方式是一體型黑白顯像類型,在感光材料上形成光透射性導電性膜等透光性導電性膜。得到的顯像銀是化學顯像銀或熱顯像銀,在為高比表面的絲狀體這點上,在後續鍍覆或物理顯像過程中活性較高。The aspect of the above (1) is an integrated black-and-white development type, and a light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material. The resulting imaging silver is chemically imaged silver or thermally developed silver, which is highly active during subsequent plating or physical imaging at the point of filaments having a high specific surface.
在上述(2)的方式中,在曝光部,物理顯像核附近的鹵化銀微粒溶解而沉積在顯像核上,由此,在感光材料上形成光透射性導電性膜等透光性導電性膜。這也是一體型黑白顯像類型。顯像作用是物理顯像核上的析出,因而活性較高,顯像銀是比表面較小的球形。In the aspect of the above (2), in the exposed portion, the silver halide fine particles in the vicinity of the physical development nucleus are dissolved and deposited on the developing nucleus, whereby a light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material. Sex film. This is also an integrated black and white imaging type. The imaging effect is the precipitation on the physical imaging nucleus, so the activity is higher, and the imaging silver is a spherical shape smaller than the surface.
在上述(3)的方式中,在未曝光部,鹵化銀微粒溶解,擴散並沉積在受像片上的顯像核上,由此,在受像片上形成光透射性導電性膜等透光性導電性膜。這是所謂分離式,是使受像片從感光材料剝離來使用的方式。In the aspect of the above (3), the silver halide fine particles are dissolved in the unexposed portion, diffused and deposited on the image forming core on the image receiving sheet, whereby light-transmitting conductivity such as a light-transmitting conductive film is formed on the image receiving sheet. membrane. This is a so-called separation type, which is a method in which the image receiving sheet is peeled off from the photosensitive material.
在任意一個方式中,都可以選擇負片型顯像處理以及反轉顯像處理中的任意一種顯像(在擴散轉印方式的情況下,通過使用自動正片型感光材料作為感光材料,能夠進行負片型顯像處理)。In either of the modes, any one of the negative-type development processing and the reverse development processing can be selected (in the case of the diffusion transfer method, the negative film can be performed by using the automatic positive-type photosensitive material as the photosensitive material). Type imaging processing).
此處提及的化學顯像、熱顯像、溶解物理顯像、擴散轉印顯像是在本技術領域通常使用的用語的含義,在攝影化學的一般教科書例如菊地真一著《寫真化學》(共立出版社,1955年發行),C.E.K.Mees編《The Theory of Photographic Processes, 4th ed.》(Mcmillan公司,1977年發行)中有解說。本發明是液處理的發明,但作為其它顯像方式,也可以參考應用熱顯像方式的技術。例如,能夠應用日本特開2004-184693號、日本特開2004-334077號、日本特開2005-010752號的各公報、日本特願2004-244080號、日本特願2004-085655號的各說明書所述的技術。The chemical imaging, thermal imaging, dissolved physical imaging, and diffusion transfer imaging mentioned herein are the meanings of the terms commonly used in the art, and in the general textbooks of photographic chemistry, such as Kikuchi, "Photochemistry" ( Kyoritsu Press, issued in 1955), CEK Mees compiled "The Theory of Photographic Processes, 4th ed." (Mcmillan, issued in 1977) has a commentary. The present invention is an invention of liquid processing, but as another development method, a technique of applying a thermal development method can also be referred to. For example, each of the specifications of the Japanese Patent Publication No. 2004-184693, the Japanese Patent Application Publication No. 2004-334077, the Japanese Patent Application Laid-Open No. Hei. The technology described.
此處,對本實施方式的第1導電性膜16A的各層的結構,詳細說明如下。這對第2導電性膜16B也相同。Here, the structure of each layer of the first conductive film 16A of the present embodiment will be described in detail below. The same applies to the second conductive film 16B.
[第1透明基體32A][1st transparent substrate 32A]
作為第1透明基體32A、可舉出塑膠膜、塑膠板、玻璃板等。作為上述塑膠膜以及塑膠板的原料,例如可以使用聚乙烯對苯二甲酸酯(PET)、聚萘二甲酸乙二醇酯(PEN)等聚酯類、三乙醯纖維素(TAC)、聚碳酸酯、環狀烯烴(COP)等。作為第1透明基體32A,優選為融點為約290℃以下的塑膠膜或塑膠板,出於光透射性或加工性等觀點,更優選為PET。Examples of the first transparent substrate 32A include a plastic film, a plastic plate, and a glass plate. As a raw material of the plastic film and the plastic plate, for example, polyester such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), triethylene fluorene cellulose (TAC), or the like can be used. Polycarbonate, cyclic olefin (COP), and the like. As the first transparent substrate 32A, a plastic film or a plastic plate having a melting point of about 290 ° C or less is preferable, and PET is more preferable from the viewpoint of light transmittance, workability, and the like.
[銀鹽乳劑層][Silver Salt Emulsion Layer]
第1導電性膜16A的金屬細線中的銀鹽乳劑層除了銀鹽和結合劑以外,還含有溶劑或染料等添加劑。The silver salt emulsion layer in the metal thin wires of the first conductive film 16A contains an additive such as a solvent or a dye in addition to the silver salt and the binder.
作為在本實施方式中使用的銀鹽,可舉出鹵化銀等無機銀鹽和醋酸銀等有機銀鹽。在本實施方式中,優選使用作為光感測器的特性優異的鹵化銀。The silver salt used in the present embodiment may, for example, be an inorganic silver salt such as silver halide or an organic silver salt such as silver acetate. In the present embodiment, it is preferable to use silver halide which is excellent in characteristics as a photosensor.
關於銀鹽乳劑層的塗覆銀量(銀鹽的塗覆量),換算為銀的話,優選為1g/m2 ~30g/m2 ,更優選為1g/m2 ~25g/m2 ,進一步優選為5g/m2 ~20g/m2 。通過將該塗敷銀量設為上述範圍,在成為第1導電性膜16A的情況下,能夠得到期望的表面電阻。The amount of silver coated (the amount of coating of the silver salt) in the silver salt emulsion layer is preferably from 1 g/m 2 to 30 g/m 2 , more preferably from 1 g/m 2 to 25 g/m 2 , in terms of silver. It is preferably 5 g/m 2 to 20 g/m 2 . When the amount of applied silver is in the above range, when the first conductive film 16A is used, a desired surface resistance can be obtained.
作為在本實施方式中使用的結合劑,例如,可舉出明膠、聚乙烯醇(PVA)、聚乙烯吡咯烷酮(PVP)、澱粉等多糖類、纖維素及其衍生物、聚環氧乙烷、聚乙基胺、殼聚糖、聚丙啶、聚丙烯腈酸、聚藻膠酸、聚玻尿酸、羧基纖維素等。它們根據官能圖的離子性而具有中性、陰離子性、陽離子性的性質。Examples of the binder to be used in the present embodiment include gelatin, polyvinyl alcohol (PVA), polyvinylpyrrolidone (PVP), polysaccharides such as starch, cellulose and derivatives thereof, polyethylene oxide, and the like. Polyethylamine, chitosan, polypropane, polyacrylic acid, alginic acid, polyhyaluronic acid, carboxy cellulose, and the like. They have neutral, anionic, and cationic properties depending on the ionicity of the functional map.
關於在本實施方式的銀鹽乳劑層中含有的結合劑的含有量,沒有特別限定,可以在能夠發揮分散性和貼合性的範圍內適當決定。關於銀鹽乳劑層中的結合劑的含有量,優選使銀/結合劑體積比為1/4以上,更優選為1/2以上。銀/結合劑體積比優選為100/1以下,更優選為50/1以下。此外,更優選的是,使銀/結合劑體積比為1/1~4/1。最優選為1/1~3/1。通過將銀鹽乳劑層中的銀/結合劑體積比設為該範圍,使得即使在調整塗敷銀量的情況下,也能夠抑制電阻值的偏差,得到具有均勻的表面電阻的第1導電性膜16A。此外,關於銀/結合劑體積比,能夠通過將原料的鹵化銀量/結合劑量(重量比)轉換為銀量/結合劑量(重量比)、進而將銀量/結合劑量(重量比)轉換為銀量/結合劑量(體積比)來求出。The content of the binder contained in the silver salt emulsion layer of the present embodiment is not particularly limited, and can be appropriately determined within a range in which dispersibility and adhesion can be exhibited. The content of the binder in the silver salt emulsion layer is preferably such that the silver/bonding agent volume ratio is 1/4 or more, and more preferably 1/2 or more. The silver/binder volume ratio is preferably 100/1 or less, and more preferably 50/1 or less. Further, it is more preferable to make the silver/bonding agent volume ratio 1/1 to 4/1. Most preferably, it is 1/1 to 3/1. By setting the silver/bonding agent volume ratio in the silver salt emulsion layer to this range, even when the amount of coated silver is adjusted, variation in resistance value can be suppressed, and first conductivity having uniform surface resistance can be obtained. Film 16A. Further, regarding the silver/binder volume ratio, it is possible to convert the amount of silver halide/binding amount (weight ratio) of the raw material into a silver amount/binding amount (weight ratio), and further convert the amount of silver/binding amount (weight ratio) into The amount of silver/binding dose (volume ratio) was determined.
<溶劑><solvent>
關於在銀鹽乳劑層的形成中使用的溶劑,沒有特別限定,例如,可舉出水、有機溶劑(例如、甲醇等醇類、丙酮等酮類、甲醯胺等醯胺類、二甲基亞碸等亞碸類、醋酸乙酯等酯類、醚類等)、離子性液體和它們的混合溶劑。The solvent to be used for the formation of the silver salt emulsion layer is not particularly limited, and examples thereof include water and an organic solvent (for example, an alcohol such as methanol, a ketone such as acetone, a guanamine such as formamide, or a dimethyl group. Anthraquinones such as anthraquinones, esters such as ethyl acetate, ethers, etc.), ionic liquids, and mixed solvents thereof.
<其它添加劑><Other additives>
關於在本實施方式中使用的各種添加劑,沒有特別限制,可以優選使用公知的添加劑。The various additives used in the present embodiment are not particularly limited, and known additives can be preferably used.
[其它層結構][Other layer structure]
可以在銀鹽乳劑層上設置未圖示的保護層。此外,也可以在銀鹽乳劑層下方設置例如襯底塗層。A protective layer (not shown) may be provided on the silver salt emulsion layer. Further, for example, a substrate coating may be provided under the silver salt emulsion layer.
接下來,對第1導電性膜16A的製造方法的各工序進行說明。Next, each step of the method of manufacturing the first conductive film 16A will be described.
[曝光][exposure]
在本實施方式中,包含使用印刷方式來實施第1導電部30A的情況,但除了印刷方式以外,也利用曝光和顯像等來形成第1導電部30A。即,對設置在第1透明基體32A上的具有銀鹽含有層的感光材料或塗覆有光刻用光敏聚合物的感光材料進行曝光。曝光可以使用電磁波來進行。作為電磁波例如可舉出可見光、紫外線等光、X射線等放射線等。而且,在曝光中,也可以利用具有波長分佈的光源,也可以使用特定波長的光源。In the present embodiment, the first conductive portion 30A is formed by using a printing method. However, in addition to the printing method, the first conductive portion 30A is formed by exposure, development, or the like. That is, the photosensitive material having the silver salt-containing layer or the photosensitive material coated with the photopolymer for photolithography provided on the first transparent substrate 32A is exposed. Exposure can be performed using electromagnetic waves. Examples of the electromagnetic wave include light such as visible light and ultraviolet light, and radiation such as X-ray. Further, in the exposure, a light source having a wavelength distribution may be used, or a light source having a specific wavelength may be used.
[顯像處理][Dynamic processing]
在本實施方式中,在使乳劑層曝光後,進一步進行顯像處理。在顯像處理中,可以使用在銀鹽照片膠捲、印相紙、印刷製版用膠捲或光掩模用乳液掩模等中使用的通常的顯像處理的技術。在本發明的顯像處理中,可以包含去除未曝光部分的銀鹽、以穩定化為目的而進行的定影處理。本發明的定影處理可以使用在銀鹽照片膠捲或印相紙、印刷製版用膠捲、光掩模用乳液掩模等中使用的定影處理的技術。In the present embodiment, after the emulsion layer is exposed, the development process is further performed. In the development processing, a technique of usual development processing used in a silver salt photo film, a printing paper, a film for printing plate, or an emulsion mask for a photomask can be used. In the development process of the present invention, a silver salt which removes an unexposed portion may be contained, and a fixing process for the purpose of stabilization may be included. The fixing treatment of the present invention can be carried out by a fixing treatment used in a silver salt photo film or a printing paper, a film for printing plate, an emulsion mask for a photomask, or the like.
實施了顯像、定影處理後的感光材料優選被實施水洗處理或穩定化處理。The photosensitive material subjected to the development and fixing treatment is preferably subjected to a water washing treatment or a stabilization treatment.
顯像處理後的曝光部中包含的金屬部的質量相對於曝光前的曝光部中包含的金屬的質量優選為50質量%以上的含有率,更優選為80質量%以上。曝光部中包含的金屬質量相對於曝光前的曝光部中包含的金屬的質量如果為50質量%以上,則可以得到高導電性,因而是優選的。The mass of the metal portion included in the exposed portion after the development process is preferably 50% by mass or more, more preferably 80% by mass or more, based on the mass of the metal contained in the exposed portion before exposure. When the mass of the metal contained in the exposed portion is 50% by mass or more based on the mass of the metal contained in the exposed portion before the exposure, high conductivity can be obtained, which is preferable.
經過以上工序,得到第1導電性膜16A。可以對顯像處理後的第1導電性膜16A進一步進行軋光處理,通過軋光處理,能夠將各透明導電層的表面電阻調整為期望的表面電阻(0.1歐姆/sq.~100歐姆/sq.的範圍)。Through the above steps, the first conductive film 16A is obtained. The first conductive film 16A after the development process can be further subjected to calendering treatment, and the surface resistance of each transparent conductive layer can be adjusted to a desired surface resistance (0.1 ohm/sq. to 100 ohm/sq) by calendering. Scope).
[物理顯像以及鍍覆處理][Physical imaging and plating treatment]
在本實施方式中,為了提高由所述曝光以及顯像處理形成的金屬部的導電性,可以進行用於使所述金屬部保持導電性金屬微粒的物理顯像和/或鍍覆處理。在本發明中,可以僅通過物理顯像或鍍覆處理中的任意一種來使導電性金屬微粒保持金屬銀部,也可以組合物理顯像和鍍覆處理使金屬部保持導電性金屬微粒。此外,包含對金屬部實施物理顯像和/或鍍覆處理而成的部分在內,稱作“導電性金屬部”。In the present embodiment, in order to improve the conductivity of the metal portion formed by the exposure and the development processing, physical development and/or plating treatment for holding the metal portion with the conductive metal particles may be performed. In the present invention, the conductive metal fine particles may be held by the metal silver portion only by any one of physical development and plating treatment, or the metal portion may be held by the physical development and the plating treatment to hold the conductive metal particles. Further, the portion including the physical development and/or the plating treatment of the metal portion is referred to as a "conductive metal portion".
本實施方式的“物理顯像”是指,在金屬或金屬化合物的核上,利用還原劑使銀離子等金屬離子還原,析出金屬微粒。該物理現象被用於即時B&W膜、即時幻燈片或印刷版製造等,在本發明中,也可以使用該技術。此外,物理顯像可以與曝光後的顯像處理同時進行,也可以在顯像處理後另外進行。The "physical development" in the present embodiment means that metal ions such as silver ions are reduced by a reducing agent on a core of a metal or a metal compound to precipitate metal fine particles. This physical phenomenon is used for an instant B&W film, instant slide or printing plate manufacturing, etc., and this technique can also be used in the present invention. Further, the physical development may be performed simultaneously with the development processing after the exposure, or may be performed separately after the development processing.
在本實施方式中,鍍覆處理可以使用無電解鍍(化學還原鍍覆或置換鍍覆)、電解鍍、或無電解鍍和電解鍍這雙方。本實施方式的無電解鍍可以使用公知的無電解鍍技術,例如,可以使用在印刷配線板等中使用的無電解鍍技術,無電解鍍優選為無電解銅鍍。In the present embodiment, electroless plating (chemical reduction plating or displacement plating), electrolytic plating, or electroless plating and electrolytic plating may be used for the plating treatment. The electroless plating of the present embodiment can use a known electroless plating technique. For example, an electroless plating technique used for a printed wiring board or the like can be used, and electroless plating is preferably electroless copper plating.
[氧化處理][Oxidation treatment]
在本實施方式中,優選對顯像處理後的金屬部以及由物理顯像和/或鍍覆處理形成的導電性金屬部實施氧化處理。透過進行氧化處理,例如,在光透射性部略微沉積有金屬的情況下,能夠去除該金屬,使光透射性部的透射性為大致100%。In the present embodiment, it is preferable to perform an oxidation treatment on the metal portion after the development processing and the conductive metal portion formed by the physical development and/or the plating treatment. By performing the oxidation treatment, for example, when a metal is slightly deposited on the light-transmitting portion, the metal can be removed, and the transmittance of the light-transmitting portion is approximately 100%.
[第1透明基體32A等的厚度][Thickness of the first transparent substrate 32A or the like]
本實施方式的第1導電性膜16A中的第1透明基體32A的厚度優選為5~350μm,更優選為30μm~150μm。如果是5μm~350μm的範圍,則可得到期望的可見光的透射率且容易處理。The thickness of the first transparent substrate 32A in the first conductive film 16A of the present embodiment is preferably 5 to 350 μm, and more preferably 30 μm to 150 μm. If it is in the range of 5 μm to 350 μm, the desired transmittance of visible light can be obtained and it is easy to handle.
在第1透明基體32A上設置的金屬部的厚度可根據第1透明基體32A上塗敷的銀鹽含有層用塗料的塗敷厚度而適當決定。金屬部的厚度可以從0.01μm~200μm中選擇,但優選為30μm以下,更優選為20μm以下,進一步優選為0.01μm~9μm,最優選為0.05μm~5μm。此外,金屬部優選為圖案狀。金屬部可以是1層,也可以是2層以上的多層結構。在金屬部為圖案狀且2層以上的多層結構的情況下,能夠賦予不同的感色性,使得能夠對不同的波長感光。由此,如果改變曝光波長而進行曝光,則能夠在各層中形成不同的圖案。The thickness of the metal portion provided on the first transparent substrate 32A can be appropriately determined depending on the coating thickness of the coating material for the silver salt-containing layer applied on the first transparent substrate 32A. The thickness of the metal portion may be selected from 0.01 μm to 200 μm, but is preferably 30 μm or less, more preferably 20 μm or less, further preferably 0.01 μm to 9 μm, and most preferably 0.05 μm to 5 μm. Further, the metal portion is preferably in the form of a pattern. The metal portion may be one layer or a multilayer structure of two or more layers. In the case where the metal portion has a multi-layered structure of two or more layers, it is possible to impart different color sensitivities and to be sensitive to different wavelengths. Thus, if the exposure wavelength is changed and exposure is performed, different patterns can be formed in each layer.
關於導電性金屬部的厚度,作為觸控面板10的用途而言,越薄則顯示面板24的視野角越大,因而越薄越優選,而在提高可視性方面,也要求薄膜化。出於這樣的觀點,由保持在導電性金屬部的導電性金屬構成的層的厚度優選小於9μm,更優選為0.1μm以上且小於5μm,進一步優選為0.1μm以上且小於3μm。As the thickness of the conductive metal portion is used as the touch panel 10, the thinner the viewing angle of the display panel 24 is, the thinner the thickness is, and the thinner the film thickness is required. From such a viewpoint, the thickness of the layer composed of the conductive metal held in the conductive metal portion is preferably less than 9 μm, more preferably 0.1 μm or more and less than 5 μm, and still more preferably 0.1 μm or more and less than 3 μm.
在本實施方式中,能夠通過控制上述銀鹽含有層的塗敷厚度來形成期望厚度的金屬部,進而,自如地控制通過物理顯像和/或鍍覆處理而由導電性金屬微粒構成的層的厚度,因此,即使是具有小於5μm、優選小於3μm的厚度的導電性膜,也能夠容易地形成。In the present embodiment, the metal portion having a desired thickness can be formed by controlling the coating thickness of the silver salt-containing layer, and the layer composed of the conductive metal particles by physical development and/or plating treatment can be freely controlled. Therefore, even if it is a conductive film having a thickness of less than 5 μm, preferably less than 3 μm, it can be easily formed.
此外,在本實施方式的第1導電性膜16A的製造方法中,並非一定需要執行鍍覆等工序。這是因為,在本實施方式的第1導電性膜16A的製造方法中,透過調整銀鹽乳劑層的塗敷銀量、銀/結合劑體積比,也能夠得到期望的表面電阻。此外,可以根據需要進行軋光處理等。Further, in the method of manufacturing the first conductive film 16A of the present embodiment, it is not always necessary to perform a process such as plating. This is because, in the method for producing the first conductive film 16A of the present embodiment, the desired surface resistance can be obtained by adjusting the amount of coated silver and the silver/binder volume ratio of the silver salt emulsion layer. Further, calendering treatment or the like can be performed as needed.
[顯像處理後的硬膜處理][Diamembrane treatment after development processing]
在對銀鹽乳劑層進行了顯像處理之後,優選浸漬於硬膜劑,進行硬膜處理。作為硬膜劑,例如可舉出戊二醛、己二醛、2,3-二羥基-1、4-二惡烷等醛類以及硼酸等日本特開平2-141279號公報中公開的材料。After the silver salt emulsion layer has been subjected to development processing, it is preferably immersed in a hard coat agent and subjected to a hard coat treatment. Examples of the hardener include aldehydes such as glutaraldehyde, adipaldehyde, 2,3-dihydroxy-1,4-dioxane, and materials disclosed in JP-A-2-141279, such as boric acid.
在本實施方式的第1導電性膜16A上,也可以附加反射防止層或硬塗層等功能層。A functional layer such as an antireflection layer or a hard coat layer may be added to the first conductive film 16A of the present embodiment.
[軋光處理][calendering treatment]
可以對金屬部實施軋光處理,來進行平滑化。由此,金屬部的導電性顯著增大。軋光處理可以利用軋光輥來進行。優選的方式是,軋光輥由通常的一對輥構成。The metal portion can be calendered for smoothing. Thereby, the electrical conductivity of the metal portion is remarkably increased. The calendering treatment can be carried out using a calender roll. Preferably, the calender rolls are formed from a common pair of rolls.
作為在軋光處理中使用的輥,適當使用環氧、聚醯亞胺、聚醯胺、聚醯亞胺醯胺等塑膠輥或金屬輥。尤其是,在兩個面具有乳劑層的情況下,金屬輥優選彼此進行處理。在一個面具有乳劑層的情況下,出於防止褶皺這點,可以組合金屬輥和塑膠輥。線壓力的上限值為1960N/cm(200kgf/cm,換算為面壓則為699.4kgf/cm2 )以上,更優選為2940N/cm(300kgf/cm,換算為面壓則為935.8kgf/cm2 )以上。線壓力的上限值為6880N/cm(700kgf/cm)以下。As the roll used in the calendering treatment, a plastic roll or a metal roll such as epoxy, polyimide, polyamide or polyamidamine is suitably used. In particular, in the case where the two faces have an emulsion layer, the metal rolls are preferably treated with each other. In the case where one side has an emulsion layer, in order to prevent wrinkles, a metal roll and a plastic roll can be combined. The upper limit of the line pressure is 1960 N/cm (200 kgf/cm, which is 699.4 kgf/cm 2 in terms of surface pressure), more preferably 2940 N/cm (300 kgf/cm, and 935.8 kgf/cm in terms of surface pressure). 2 ) Above. The upper limit of the line pressure is 6880 N/cm (700 kgf/cm) or less.
以軋光輥為代表的平滑化處理的應用溫度優選為10℃(未調溫)~100℃,更優選的是,溫度根據金屬網狀圖案或金屬配線圖案的畫線密度、形狀或結合劑種類而不同,但大約處於10℃(未調溫)~50℃的範圍。The application temperature of the smoothing treatment typified by the calender rolls is preferably 10 ° C (unregulated temperature) to 100 ° C, and more preferably, the temperature according to the metal mesh pattern or the metal wiring pattern, the line density, the shape or the bonding agent It varies depending on the type, but is approximately in the range of 10 ° C (unregulated temperature) to 50 ° C.
此外,本發明可以適當組合在下述表1和表2中敘述的公開公報和國際公開手冊的技術來使用。省略了“日本特開”、“號公報”、“號手冊”等記述。Further, the present invention can be suitably used in combination with the techniques disclosed in Tables 1 and 2 below and the techniques of the International Publication Manual. Descriptions such as "Japanese special open", "No. bulletin", and "number manual" are omitted.
[表1] [Table 1]
[表2] [Table 2]
此外,本發明的導電性膜不限於上述實施方式,在不脫離本發明主旨的範圍內,當然可以採用各種結構。Further, the conductive film of the present invention is not limited to the above embodiment, and various configurations can of course be employed without departing from the gist of the invention.
以上所舉者僅係本發明之部份實施例,並非用以限制本發明,致依本發明之創意精神及特徵,稍加變化修飾而成者,亦應包括在本專利範圍之內。The above is only a part of the embodiments of the present invention, and is not intended to limit the present invention. It is intended to be included in the scope of the present invention.
綜上所述,本發明實施例確能達到所預期之使用功效,又其所揭露之具體技術手段,不僅未曾見諸於同類產品中,亦未曾公開於申請前,誠已完全符合專利法之規定與要求,爰依法提出發明專利之申請,懇請惠予審查,並賜准專利,則實感德便。In summary, the embodiments of the present invention can achieve the expected use efficiency, and the specific technical means disclosed therein have not been seen in similar products, nor have they been disclosed before the application, and have completely complied with the patent law. The regulations and requirements, the application for invention patents in accordance with the law, and the application for review, and the grant of patents, are truly sensible.
10‧‧‧觸控面板
12‧‧‧感測器主體10‧‧‧Touch panel
12‧‧‧ Sensor body
14‧‧‧控制電路
16A‧‧‧第1導電性膜14‧‧‧Control circuit
16A‧‧‧1st conductive film
16B‧‧‧第2導電性膜
18‧‧‧層疊導電性膜16B‧‧‧2nd conductive film
18‧‧‧Laminated conductive film
20‧‧‧包覆層
22‧‧‧顯示裝置20‧‧‧Cladding
22‧‧‧ display device
24‧‧‧顯示面板
24a‧‧‧顯示畫面24‧‧‧ display panel
24a‧‧‧Display
26A‧‧‧第1感測器區域
26B‧‧‧第2感測器區域26A‧‧‧1st sensor area
26B‧‧‧2nd sensor area
28A‧‧‧第1端子配線區域
28B‧‧‧第2端子配線區域28A‧‧‧1st terminal wiring area
28B‧‧‧2nd terminal wiring area
30A‧‧‧第1導電部
30B‧‧‧第2導電部30A‧‧‧1st Conductive Department
30B‧‧‧2nd Conductive Department
32A‧‧‧第1透明基體
32B‧‧‧第2透明基體32A‧‧‧1st transparent substrate
32B‧‧‧2nd transparent substrate
34A‧‧‧第1透明粘接劑層
34B‧‧‧第2透明粘接劑層34A‧‧‧1st transparent adhesive layer
34B‧‧‧2nd transparent adhesive layer
36A‧‧‧第1電極圖案
36B‧‧‧第2電極圖案36A‧‧‧1st electrode pattern
36B‧‧‧2nd electrode pattern
38‧‧‧單元
40‧‧‧網狀圖案38‧‧‧ unit
40‧‧‧ mesh pattern
42a‧‧‧第1連線部
42b‧‧‧第2連線部42a‧‧‧1st connection
42b‧‧‧2nd Connection
44a‧‧‧第1端子配線部
44b‧‧‧第2端子配線部44a‧‧‧1st terminal wiring part
44b‧‧‧2nd terminal wiring section
46a‧‧‧第1端子部
46b‧‧‧第2端子部46a‧‧‧1st terminal part
46b‧‧‧2nd terminal section
48‧‧‧電極膜
50a‧‧‧第1接地端子部48‧‧‧Electrode film
50a‧‧‧1st grounding terminal
50b‧‧‧第2接地端子部
52‧‧‧接地線50b‧‧‧2nd grounding terminal
52‧‧‧ Grounding wire
54‧‧‧主體圖案
56‧‧‧擴展圖案54‧‧‧ body pattern
56‧‧‧Extended pattern
56A‧‧‧一方擴展圖案
56B‧‧‧另一方擴展圖案56A‧‧‧One extended pattern
56B‧‧‧The other side extension pattern
58A‧‧‧第1擴展部
58B‧‧‧第2擴展部58A‧‧‧1st extension
58B‧‧‧2nd extension
60‧‧‧延伸部
60A‧‧‧第1延伸部60‧‧‧Extension
60A‧‧‧1st extension
60B‧‧‧第2延伸部
62a‧‧‧第1定位標記60B‧‧‧2nd extension
62a‧‧‧1st positioning mark
62b‧‧‧第2定位標記62b‧‧‧2nd positioning mark
圖1是示出將本實施方式的導電性膜應用於觸控面板的結構例的分解立體圖1 is an exploded perspective view showing a configuration example in which a conductive film of the present embodiment is applied to a touch panel.
圖2是示出層疊導電性膜的截面結構的一例和控制系統(自容式)的一例的說明圖2 is an explanatory view showing an example of a cross-sectional structure of a laminated conductive film and an example of a control system (self-capacitance type)
圖3A是示出從上方觀察第1方式的第1導電性膜和第2導電性膜的主要部分的俯視圖,圖3B是將第1方式的主體圖案、一方擴展圖案以及另一方擴展圖案放大而示出的俯視圖3A is a plan view showing a main portion of the first conductive film and the second conductive film of the first embodiment, and FIG. 3B is an enlarged view of the main body pattern, the one extended pattern, and the other expanded pattern of the first aspect. Top view shown
圖4A是示出從上方觀察第2方式的第1導電性膜和第2導電性膜的主要部分的俯視圖,圖4B是將第2方式的主體圖案、一方擴展圖案以及另一方擴展圖案放大而示出的俯視圖4A is a plan view showing a main portion of the first conductive film and the second conductive film of the second embodiment, and FIG. 4B is an enlarged view of the main body pattern, the one extended pattern, and the other expanded pattern of the second aspect. Top view shown
圖5A是示出從上方觀察第2方式的另一例子中的第1導電性膜和第2導電性膜的主要部分的俯視圖,圖5B是將第2方式的另一例子中的主體圖案、一方擴展圖案以及另一方擴展圖案放大而示出的俯視圖5A is a plan view showing a main portion of a first conductive film and a second conductive film in another example of the second aspect, and FIG. 5B is a main body pattern in another example of the second aspect, Top view of one extended pattern and the other extended pattern enlarged
圖6A是示出從上方觀察第3方式的第1導電性膜和第2導電性膜的主要部分的俯視圖,圖6B是將第3方式的主體圖案、一方擴展圖案以及另一方擴展圖案放大而示出的俯視圖6A is a plan view showing a main portion of the first conductive film and the second conductive film of the third embodiment, and FIG. 6B is an enlarged view of the main body pattern, the one extended pattern, and the other expanded pattern of the third aspect. Top view shown
圖7A是示出從上方觀察第4方式的第1導電性膜和第2導電性膜的主要部分的俯視圖,圖7B是將第4方式的主體圖案、一方擴展圖案以及另一方擴展圖案放大而示出的俯視圖7A is a plan view showing a main portion of the first conductive film and the second conductive film of the fourth embodiment, and FIG. 7B is an enlarged view of the main body pattern, the one extended pattern, and the other expanded pattern of the fourth aspect. Top view shown
圖8A是示出從上方觀察第5方式的第1導電性膜和第2導電性膜的主要部分的俯視圖,圖8B是將第5方式的主體圖案、一方擴展圖案以及另一方擴展圖案放大而示出的俯視圖8A is a plan view showing a main portion of a first conductive film and a second conductive film of a fifth embodiment as seen from above, and FIG. 8B is an enlarged view of the main body pattern, the one extended pattern, and the other expanded pattern of the fifth aspect. Top view shown
圖9是用於說明單元的平均直徑的圖Figure 9 is a diagram for explaining the average diameter of the unit
圖10是示出層疊導電性膜的截面結構的一例和控制系統(互容式)的一例的說明圖FIG. 10 is an explanatory diagram showing an example of a cross-sectional structure of a laminated conductive film and an example of a control system (mutual capacitance type).
圖11是示出層疊導電性膜的截面結構的另一例子的說明圖11 is an explanatory view showing another example of a cross-sectional structure of a laminated conductive film.
26A‧‧‧第1感測器區域 26A‧‧‧1st sensor area
36A‧‧‧第1電極圖案 36A‧‧‧1st electrode pattern
36B‧‧‧第2電極圖案 36B‧‧‧2nd electrode pattern
38‧‧‧單元 38‧‧‧ unit
40‧‧‧網狀圖案 40‧‧‧ mesh pattern
54‧‧‧主體圖案 54‧‧‧ body pattern
56A‧‧‧一方擴展圖案 56A‧‧‧One extended pattern
56B‧‧‧另一方擴展圖案 56B‧‧‧The other side extension pattern
Claims (10)
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JP2014007204A JP6118277B2 (en) | 2014-01-17 | 2014-01-17 | Conductive film |
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TW201530392A true TW201530392A (en) | 2015-08-01 |
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JP5670827B2 (en) * | 2011-05-13 | 2015-02-18 | 富士フイルム株式会社 | Conductive sheet and touch panel |
KR20130074489A (en) * | 2011-12-26 | 2013-07-04 | 삼성전기주식회사 | Sensing electrode patten |
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