TW201528936A - Plant cultivation apparatus - Google Patents

Plant cultivation apparatus Download PDF

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Publication number
TW201528936A
TW201528936A TW103133329A TW103133329A TW201528936A TW 201528936 A TW201528936 A TW 201528936A TW 103133329 A TW103133329 A TW 103133329A TW 103133329 A TW103133329 A TW 103133329A TW 201528936 A TW201528936 A TW 201528936A
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Taiwan
Prior art keywords
cultivation
cultivation bed
culture
heat insulating
bed
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TW103133329A
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Chinese (zh)
Inventor
Shigeharu Shimamura
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Mirai Co Ltd
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Publication of TW201528936A publication Critical patent/TW201528936A/en

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01GHORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G9/00Cultivation in receptacles, forcing-frames or greenhouses; Edging for beds, lawn or the like
    • A01G9/24Devices or systems for heating, ventilating, regulating temperature, illuminating, or watering, in greenhouses, forcing-frames, or the like
    • A01G9/249Lighting means
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01GHORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G31/00Soilless cultivation, e.g. hydroponics
    • A01G31/02Special apparatus therefor
    • A01G31/06Hydroponic culture on racks or in stacked containers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P60/00Technologies relating to agriculture, livestock or agroalimentary industries
    • Y02P60/20Reduction of greenhouse gas [GHG] emissions in agriculture, e.g. CO2
    • Y02P60/21Dinitrogen oxide [N2O], e.g. using aquaponics, hydroponics or efficiency measures

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  • Life Sciences & Earth Sciences (AREA)
  • Environmental Sciences (AREA)
  • Hydroponics (AREA)
  • Cultivation Of Plants (AREA)

Abstract

A plant cultivation apparatus is provided with a cultivation rack having a plurality of supporting frames arranged in multiple levels in the vertical direction, a cultivation bed body supported by each of the plurality of supporting frames, that forms a storage tank for storing a nutrient solution, a heat insulating layer applied to the outer side of the cultivation bed body, and a lighting part, supported by each of the plurality of supporting frames, for applying illumination in the direction of the cultivation bed on the lower level. Heat generated from the lighting is blocked by a heat insulating layer coating the cultivation bed body. The heat insulating layer is small size in comparison to a heat insulating material such as polystyrene foam or the like. For this reason, the impact of heat to the cultivation bed can be reduced and uniform cultivation conditions can be obtained, without increasing the size of the cultivation rack.

Description

植物栽培裝置 Plant cultivation device

本發明係關於一種藉由人工光栽培植物之技術。 The present invention relates to a technique for cultivating plants by artificial light.

已知有與在室內對植物照射照明光而進行栽培之植物工廠相關之技術。於專利文獻1中記載有與植物工廠相關之技術之一例。 A technique related to a plant factory that illuminates plants with illumination light indoors is known. Patent Document 1 describes an example of a technique related to a plant factory.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1] [Patent Document 1]

日本專利特開2012-39996號公報 Japanese Patent Laid-Open No. 2012-39996

於植物工廠中,為了培育植物而藉由人工之照明裝置供給所需之光。照明裝置產生光的同時亦產生熱。其產生之熱可能會對植物之生長帶來影響。例如,於因照明之發熱而於不同場所之間產生溫度差之情形時,植物之培育環境因場所不同而變得不均勻,故而欠佳。因此,期望抑制因照明產生之發熱對植物之生長帶來之不好之影響之技術。 In plant plants, the desired light is supplied by artificial lighting devices in order to grow the plants. The lighting device generates heat while also generating heat. The heat it produces may have an impact on the growth of plants. For example, in the case where a temperature difference occurs between different places due to the heat of illumination, the cultivation environment of the plant becomes uneven due to the place, and thus it is not preferable. Therefore, a technique for suppressing the adverse effects of heat generated by illumination on the growth of plants is desired.

於本發明之一實施形態中,植物栽培裝置包括:栽培用支架,其包括於鉛垂方向排列成多段之複數個支持框架;栽培床本體,其被支持於複數個支持框架之各者,且形成用以儲存培養液之貯存槽;隔熱層,其塗佈於栽培床本體之外側;及照明部,其被支持於複數個支 持框架之各者,且對下側之段之栽培床之方向進行照明。照明之發熱係藉由塗佈於栽培床本體之隔熱層遮擋。該隔熱層與發泡苯乙烯等隔熱材料相比尺寸較小。因此,不會增大栽培用支架之尺寸,便可降低熱對栽培床之影響,從而可使栽培條件均勻化。 In one embodiment of the present invention, the plant cultivation apparatus includes: a cultivation stent including a plurality of support frames arranged in a plurality of stages in a vertical direction; and a cultivation bed body supported by each of the plurality of support frames, and Forming a storage tank for storing the culture liquid; a heat insulation layer applied to the outer side of the cultivation bed body; and an illumination portion supported by the plurality of branches Hold each of the frames and illuminate the direction of the cultivation bed in the lower section. The heat generated by the illumination is blocked by the heat insulating layer applied to the body of the cultivation bed. The heat insulating layer is smaller in size than a heat insulating material such as foamed styrene. Therefore, the influence of heat on the cultivation bed can be reduced without increasing the size of the cultivation support, and the cultivation conditions can be made uniform.

根據本發明,提供一種抑制因照明產生之發熱對植物之生長帶來之不好之影響之技術。 According to the present invention, there is provided a technique for suppressing the influence of heat generated by illumination on the growth of plants.

1‧‧‧植物栽培室 1‧‧‧Plant cultivation room

2‧‧‧栽培用支架 2‧‧‧Cultivation bracket

3‧‧‧地面 3‧‧‧ Ground

4‧‧‧柱 4‧‧‧ column

5‧‧‧支持框架 5‧‧‧Support framework

6‧‧‧栽培床 6‧‧‧Cultivated bed

6a‧‧‧栽培床 6a‧‧‧Cultivated bed

6b‧‧‧栽培床 6b‧‧‧Cultivated bed

7‧‧‧照明 7‧‧‧Lighting

8‧‧‧培養液箱 8‧‧‧Culture tank

9‧‧‧循環泵 9‧‧‧Circulating pump

10‧‧‧供液系統 10‧‧‧liquid supply system

11‧‧‧電磁閥 11‧‧‧ solenoid valve

12‧‧‧供水配管 12‧‧‧Water supply piping

13‧‧‧排水配管 13‧‧‧Drainage piping

14‧‧‧液位感測器 14‧‧‧ Liquid level sensor

15‧‧‧溫度調節部 15‧‧‧ Temperature Regulation Department

16‧‧‧空調機 16‧‧‧Air conditioner

17‧‧‧排水配管 17‧‧‧Drainage piping

18‧‧‧電磁閥 18‧‧‧ solenoid valve

19‧‧‧天花板 19‧‧‧ ceiling

20‧‧‧上部配管 20‧‧‧Upper piping

21‧‧‧栽培床本體 21‧‧‧Cultivated bed body

22‧‧‧隔熱塗料 22‧‧‧Insulation coating

22a‧‧‧隔熱塗料 22a‧‧‧Insulation coating

22b‧‧‧隔熱塗料 22b‧‧‧Insulation coating

22c‧‧‧隔熱塗料 22c‧‧‧Insulation coating

22d‧‧‧隔熱塗料 22d‧‧‧Insulation coating

22e‧‧‧隔熱塗料 22e‧‧‧Insulation coating

22f‧‧‧隔熱塗料 22f‧‧‧Insulation coating

23‧‧‧面板 23‧‧‧ panel

24‧‧‧培養液 24‧‧‧ culture solution

25‧‧‧植物 25‧‧‧ plants

26‧‧‧供水配管 26‧‧‧Water supply piping

27‧‧‧培養液導入口 27‧‧‧ Culture medium inlet

28‧‧‧排水配管 28‧‧‧Drainage piping

29‧‧‧培養液排出口 29‧‧‧ Culture liquid discharge

29a‧‧‧培養液排出口 29a‧‧‧ Culture liquid discharge

30‧‧‧供水配管 30‧‧‧Water supply piping

30-1‧‧‧水流 30-1‧‧‧Water flow

30-2‧‧‧水流 30-2‧‧‧Water flow

31‧‧‧孔 31‧‧‧ hole

32‧‧‧水流 32‧‧‧Water flow

33‧‧‧水流 33‧‧‧Water flow

35‧‧‧固定金屬件 35‧‧‧Fixed metal parts

36‧‧‧支持體 36‧‧‧Support

37‧‧‧隔熱塗料 37‧‧‧Insulation coating

38‧‧‧栽培床框 38‧‧‧Cultivated bed frame

39‧‧‧不透水性片材 39‧‧‧Watertight sheets

與本發明相關之上述及其他目的、優點、特徵根據隨附圖式及以下之若干實施形態之記載進而變得明確。於其隨附圖式中包含下述者。 The above and other objects, advantages and features of the present invention will become apparent from The following are included in the accompanying drawings.

圖1係表示植物栽培裝置之前視圖。 Figure 1 is a front view showing a plant cultivation apparatus.

圖2係栽培用支架之側視圖。 Figure 2 is a side view of the cultivation stent.

圖3係將栽培床之附近放大後之側視圖。 Fig. 3 is a side view showing the vicinity of the cultivation bed in an enlarged manner.

圖4係栽培床之俯視圖。 Figure 4 is a plan view of the cultivation bed.

圖5係栽培床之俯視圖。 Figure 5 is a plan view of a cultivation bed.

圖6係栽培床之前視圖。 Figure 6 is a front view of the cultivation bed.

圖7係栽培床之前視圖。 Figure 7 is a front view of the cultivation bed.

以下,參照圖式對本發明之實施形態進行說明。圖1表示本發明之一實施形態之植物栽培裝置。表示自圖1所示之座標系之x軸正方向觀察之植物栽培裝置之前視圖。於建造物之內部準備有植物栽培室1。通常不於植物栽培室1設置使光自外部入射之窗,而僅以人工光為光源對植物進行培育。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 shows a plant cultivation apparatus according to an embodiment of the present invention. A front view showing the plant cultivation apparatus viewed from the positive direction of the x-axis of the coordinate system shown in Fig. 1. A plant cultivation room 1 is prepared inside the building. Usually, the plant cultivation room 1 is provided with a window for allowing light to enter from the outside, and only the artificial light is used as a light source for cultivating the plants.

於植物栽培室1設置有植物栽培裝置。植物栽培裝置包括載置於地面3之栽培用支架2。栽培用支架2包括多個柱4與由該等柱支持之多個支持框架5。該等柱4或支持框架5係由難以於水或肥料鹽中腐蝕之 熱導率較高之材料(鋁、實施了金屬鍍敷之合成樹脂、不鏽鋼)之骨材形成。 A plant cultivation device is provided in the plant cultivation room 1. The plant cultivation apparatus includes a cultivation holder 2 placed on the ground 3. The cultivation stent 2 includes a plurality of columns 4 and a plurality of support frames 5 supported by the columns. The columns 4 or the support frame 5 are difficult to corrode in water or fertilizer salts. The material of the material with high thermal conductivity (aluminum, synthetic resin coated with metal plating, stainless steel) is formed.

各支持框架5係作為支持栽培床6之架板或架框而發揮功能。栽培床6係由與支持框架5相同之材料形成。支持框架5於鉛垂方向(圖1之z軸方向)配置成多段。支持框架5進而於水平方向(圖1之y方向)並列配置有複數個。於各支持框架5之下側安裝有照明7。照明7對種植於其下段側之栽培床6之植物照射光。作為照明7,亦可使用螢光燈等,但較理想為使用選擇性地輸出植物之生長所需之波段之光之LED(light Emitting Diode,發光二極體)。 Each of the support frames 5 functions as a shelf or frame that supports the cultivation bed 6. The cultivation bed 6 is formed of the same material as the support frame 5. The support frame 5 is arranged in a plurality of stages in the vertical direction (the z-axis direction in Fig. 1). The support frame 5 is further arranged in parallel in the horizontal direction (the y direction of FIG. 1). Illumination 7 is mounted on the lower side of each support frame 5. The illumination 7 illuminates the plants of the cultivation bed 6 planted on the lower side thereof. As the illumination 7, a fluorescent lamp or the like may be used, but it is preferable to use an LED (Light Emitting Diode) that selectively outputs light of a wavelength band required for growth of a plant.

圖2係自y軸正方向觀察栽培用支架2之側視圖。圖3係描繪有於正在對植物25進行栽培之狀態下之一個栽培床6之附近之剖面圖。栽培床6具有將y軸方向設為長度方向之細長之平面形狀。栽培床6包括:栽培床本體21,其具有可儲存液體(培養液)之容器之形狀;及隔熱層,其係藉由對栽培床本體21塗佈隔熱塗料22而形成。 Fig. 2 is a side view of the cultivation holder 2 as seen from the positive direction of the y-axis. Fig. 3 is a cross-sectional view showing the vicinity of a cultivation bed 6 in a state in which the plant 25 is being cultivated. The cultivation bed 6 has an elongated planar shape in which the y-axis direction is a longitudinal direction. The cultivation bed 6 includes a cultivation bed main body 21 having a shape in which a liquid (culture liquid) container can be stored, and a heat insulation layer formed by applying a heat insulating coating 22 to the cultivation bed main body 21.

隔熱塗料22阻礙多餘之熱傳遞至栽培床6。尤其是,下側之照明7,即支持於某一段之支持框架5且用以對下段側之栽培床6進行照明之照明7產生之熱容易傳遞至支持於該支持框架5之栽培床6。藉由隔熱塗料22,可有效地對來自下側之照明7之熱進行隔熱。隔熱塗料22由於膜厚較小(數mm以下之等級(order)),故而與使用例如發泡苯乙烯等隔熱材料之情形相比,可防止栽培用支架2之尺寸變大。因此,隔熱塗料22適合用於具有重疊成多段之多個栽培床6之栽培用支架2。 The heat insulating coating 22 prevents excess heat from being transferred to the cultivation bed 6. In particular, the illumination 7 on the lower side, that is, the heat generated by the illumination 7 for supporting the support frame 5 of a certain section and for illuminating the cultivation bed 6 on the lower side is easily transmitted to the cultivation bed 6 supported by the support frame 5. The heat from the underside illumination 7 can be effectively insulated by the heat insulating coating 22. Since the heat-insulating paint 22 has a small film thickness (order of several mm or less), it is possible to prevent the size of the cultivation holder 2 from becoming larger than when a heat insulating material such as foamed styrene is used. Therefore, the heat insulating coating 22 is suitable for use in the cultivation holder 2 having a plurality of cultivation beds 6 which are stacked in a plurality of stages.

如圖3中作為隔熱塗料22a、22b、22c、22d所示般,隔熱塗料22係以覆蓋栽培床本體21之各表面之方式而被塗佈。於栽培床本體21之下表面塗佈有隔熱塗料22a。於栽培床本體22之底面,即儲存培養液之貯存部之底面塗佈有隔熱塗料22b。於栽培床本體22之外側之長度方向之側面,即於與x軸方向大致垂直之外側之側面塗佈有隔熱塗料 22c。於栽培床本體22之內側之長度方向之側面,即於與x軸方向大致垂直之內側之側面塗佈有隔熱塗料22d。進而,於栽培床6之長度方向之兩端部之外表面及內表面塗佈隔熱塗料22e、22f亦較佳。 As shown in FIG. 3, as shown in the heat insulating paints 22a, 22b, 22c, and 22d, the heat insulating coating 22 is applied so as to cover the respective surfaces of the cultivation bed main body 21. The lower surface of the cultivation bed body 21 is coated with a heat insulating coating 22a. The heat insulating coating material 22b is applied to the bottom surface of the cultivation bed main body 22, that is, the bottom surface of the storage portion for storing the culture liquid. The side surface in the longitudinal direction of the outer side of the cultivation bed main body 22, that is, the side surface which is substantially perpendicular to the x-axis direction, is coated with a heat-insulating paint 22c. The side surface in the longitudinal direction of the inner side of the cultivation bed main body 22, that is, the side surface on the inner side substantially perpendicular to the x-axis direction, is coated with the heat insulating coating material 22d. Further, it is also preferable to apply the heat insulating coatings 22e and 22f to the outer surface and the inner surface of both end portions in the longitudinal direction of the cultivation bed 6.

作為隔熱塗料22,較理想為使用於經塗佈並乾燥後之狀態下發揮高隔熱性之材料。作為此種塗料之一例,已知有陶瓷隔熱塗料。於陶瓷隔熱塗料中,於溶劑中混入有陶瓷之微粒子(例示:直徑10~100μm)之粉末。各個微粒子具有中空之內部空間,且該內部空間較理想為真空(減壓環境)。此種隔熱塗料於經塗佈並乾燥後之狀態下於塗膜中形成陶瓷之微粒子密集而成之層。該層之對來自外部之熱進行反射之反射性能與阻礙熱向膜厚方向傳導之隔熱性能較高。作為此種陶瓷隔熱塗料之一例,可列舉EXELA股份有限公司之商品名「PENTA GUARD」。 The heat insulating coating material 22 is preferably used as a material which exhibits high heat insulating properties in a state of being applied and dried. As an example of such a coating, a ceramic heat insulating coating is known. In the ceramic heat-insulating paint, a powder of ceramic fine particles (exemplified: 10 to 100 μm in diameter) is mixed in a solvent. Each of the microparticles has a hollow inner space, and the inner space is preferably a vacuum (reduced pressure environment). The heat insulating coating forms a layer in which fine particles of ceramics are densely formed in the coating film in a state of being coated and dried. This layer has a high reflection performance against reflection from external heat and a thermal insulation property that hinders conduction of heat to the film thickness direction. As an example of such a ceramic heat insulating coating, the trade name "PENTA GUARD" of EXELA Co., Ltd. is mentioned.

作為隔熱塗料22,較理想為使用於面內方向,即沿著栽培床6之底面之方向(xy面內之方向)具有相對較高之熱導率之材料。若使用此種材料,則可利用隔熱塗料22之熱傳導使栽培床6之長度方向之熱梯度均勻化,從而可使栽培床6內之植物25之生長條件均勻化。於陶瓷隔熱塗料之中具有如下塗料,即:於經塗佈並乾燥後之狀態下陶瓷之微粒子於面內方向排列而形成薄膜,且於面垂直方向形成包含陶瓷薄膜與不含有陶瓷微粒子之層之層狀。此種陶瓷隔熱塗料於面內方向熱傳導受陶瓷微粒子阻礙之程度較小,故而熱導率相對較高而適合作為隔熱塗料22使用。更佳為,隔熱塗料22為面內方向之熱導率大於栽培床本體21之材料。 As the heat insulating coating 22, it is preferable to use a material having a relatively high thermal conductivity in the in-plane direction, that is, in the direction along the bottom surface of the cultivation bed 6 (the direction in the xy plane). When such a material is used, the thermal gradient of the length of the cultivation bed 6 can be made uniform by the heat conduction of the heat insulating coating material 22, and the growth conditions of the plants 25 in the cultivation bed 6 can be made uniform. The ceramic heat-insulating paint has a coating material in which the fine particles of the ceramic are aligned in the in-plane direction to form a film, and the ceramic film is formed in a vertical direction and does not contain ceramic fine particles. Layered layer. Such a ceramic heat-insulating paint is less likely to be thermally blocked by the ceramic fine particles in the in-plane direction, and therefore has a relatively high thermal conductivity and is suitable for use as the heat insulating coating 22. More preferably, the thermal barrier coating 22 has a thermal conductivity in the in-plane direction that is greater than the material of the cultivation bed body 21.

作為將對植物25之成長有用之肥料鹽等混合後之水溶液之培養液24被供給至栽培床6之內部。於栽培床6之貯存部之上部設置有面板23。於面板23設置有用以藉由莖等部分支持植物25之孔。藉由將植物25種植於面板23之孔內,而將植物25支持於面板23。於該狀態下,植 物25之根浸入培養液24,且葉(於利用土壤進行栽培之情形時自地表面向上露出之部分)露出至面板23之上部。植物25自根吸收培養液24之水分與肥料鹽之養分,且藉由利用來自上段之照明7之光而成長。 The culture solution 24 of the aqueous solution in which the fertilizer salt or the like which is useful for growing the plant 25 is mixed is supplied to the inside of the cultivation bed 6. A panel 23 is provided on the upper portion of the storage portion of the cultivation bed 6. A hole is provided in the panel 23 to support the plant 25 by a portion such as a stem. The plant 25 is supported on the panel 23 by planting the plant 25 in the hole of the panel 23. In this state, plant The root of the substance 25 is immersed in the culture liquid 24, and the leaves (portions which are exposed upward from the ground surface when cultivated with the soil) are exposed to the upper portion of the panel 23. The plant 25 absorbs the nutrients of the water and the fertilizer salt of the culture solution 24 from the root, and grows by using the light from the illumination 7 of the upper stage.

圖4係栽培床6之俯視圖。表示除去圖3中之面板23與植物25後之狀態。於栽培床6之底面設置有培養液導入口27與培養液排出口29。設置有該等之位置係栽培床6之長度方向(y軸方向)之兩端附近。於圖4之例中,於栽培床6之y軸負方向之端部附近設置有培養液導入口27,且於y軸正方向之端部附近設置有培養液排出口29。於圖4中培養液導入口27與培養液排出口29分別描繪有2個,但該等之個數係根據設計而適當決定。培養液導入口27連接於供水配管26,培養液排出口29連接於排水配管28。 Figure 4 is a plan view of the cultivation bed 6. The state in which the panel 23 and the plant 25 in Fig. 3 are removed is shown. The culture liquid introduction port 27 and the culture solution discharge port 29 are provided on the bottom surface of the cultivation bed 6. These positions are provided in the vicinity of both ends in the longitudinal direction (y-axis direction) of the cultivation bed 6. In the example of FIG. 4, the culture liquid introduction port 27 is provided in the vicinity of the end portion of the cultivation bed 6 in the negative direction of the y-axis, and the culture solution discharge port 29 is provided in the vicinity of the end portion in the positive direction of the y-axis. In FIG. 4, two of the culture liquid introduction port 27 and the culture solution discharge port 29 are respectively depicted, but the number of these is appropriately determined depending on the design. The culture liquid introduction port 27 is connected to the water supply pipe 26, and the culture liquid discharge port 29 is connected to the drainage pipe 28.

培養液24以被控制為特定之值之流量流動於供水配管26中。該培養液24自培養液導入口27被供給至栽培床6之內部。以與其相同之流量將培養液24自培養液排出口29排出至排水配管28。其結果,培養液24形成固定之流量之水流30-1、30-2並於栽培床6之內部沿長度方向流動,從而新鮮之培養液24始終被供給至栽培床6。為使培養液24之流動順利,亦可以相對於培養液導入口27而培養液排出口29之側稍微下降之方式配置栽培床6。 The culture solution 24 flows into the water supply pipe 26 at a flow rate controlled to a specific value. This culture solution 24 is supplied from the culture solution introduction port 27 to the inside of the cultivation bed 6. The culture solution 24 is discharged from the culture solution discharge port 29 to the drainage pipe 28 at the same flow rate. As a result, the culture liquid 24 forms the fixed flow rate of the water streams 30-1, 30-2 and flows in the longitudinal direction inside the cultivation bed 6, so that the fresh culture liquid 24 is always supplied to the cultivation bed 6. In order to make the flow of the culture solution 24 smooth, the cultivation bed 6 may be disposed so as to slightly decrease the side of the culture liquid discharge port 27 with respect to the culture liquid introduction port 27.

包括以上之構成之植物栽培裝置如以下方式進行動作。於植物栽培室1之內部設置培養液箱8。於培養液箱8之中儲存培養液24。培養液箱8之內部之培養液24之液位係藉由液位感測器14監控。若培養液箱8之內部之液位低於特定之基準,則響應液位感測器14發送之表示液位之檢測信號而打開電磁閥11,自供液系統10向培養液箱8供給水或培養液24直至達到特定量之液位為止。基於該液位感測器14之檢測信號之電磁閥11之控制係藉由利用電腦而實現之控制裝置自動執行。於供給水之情形時,為了不使培養液24之肥料鹽等之濃度過於降 低,而另外向培養液箱8供給培養成分。 The plant cultivation apparatus including the above configuration operates as follows. A culture solution tank 8 is provided inside the plant cultivation room 1. The culture solution 24 is stored in the culture solution tank 8. The level of the culture solution 24 inside the culture tank 8 is monitored by the liquid level sensor 14. If the liquid level inside the culture tank 8 is lower than a specific reference, the solenoid valve 11 is opened in response to the detection signal indicating the liquid level sent by the liquid level sensor 14, and the water is supplied from the liquid supply system 10 to the culture tank 8 or The culture solution 24 is until a certain amount of liquid level is reached. The control of the solenoid valve 11 based on the detection signal of the liquid level sensor 14 is automatically performed by a control device realized by a computer. In the case of supplying water, in order not to lower the concentration of the fertilizer salt or the like of the culture solution 24 When it is low, the culture component is supplied to the culture tank 8.

於培養液箱8中進而設置溫度調節部15。溫度調節部15以藉由溫度感測器監控培養液箱8之內部之水溫並使該水溫處於固定範圍內之方式,藉由珀爾帖(Peltier)元件等溫度控制機構自動控制培養液24之溫度。 The temperature adjustment unit 15 is further provided in the culture solution tank 8. The temperature adjustment unit 15 automatically controls the culture solution by a temperature control mechanism such as a Peltier element by monitoring the temperature of the water inside the culture solution tank 8 by a temperature sensor and keeping the water temperature within a fixed range. 24 temperature.

培養液箱8之內部之培養液24係藉由循環泵9被供給至栽培用支架2之各栽培床6。具體而言,培養液24係藉由循環泵9而自培養液箱8泵送(pump up)至供水配管12。供水配管12之前端連接於各栽培床6之供水配管26(圖4),且培養液24自培養液導入口27被供給至栽培床6之內部。培養液24流經栽培床6之內部,並自培養液排出口29排出至排水配管28。經排出之培養液24通過排水配管13返回至培養液箱8。如以上般,於培養液箱8與各栽培床6之間形成培養液24之循環系統。於該循環系統中進而設置去除培養液24中之雜質之過濾器。 The culture liquid 24 in the inside of the culture tank 8 is supplied to each of the cultivation beds 6 of the cultivation holder 2 by the circulation pump 9. Specifically, the culture solution 24 is pumped up from the culture solution tank 8 to the water supply pipe 12 by the circulation pump 9. The front end of the water supply pipe 12 is connected to the water supply pipe 26 (FIG. 4) of each of the cultivation beds 6, and the culture liquid 24 is supplied from the culture liquid introduction port 27 to the inside of the cultivation bed 6. The culture solution 24 flows through the inside of the cultivation bed 6, and is discharged from the culture solution discharge port 29 to the drainage pipe 28. The discharged culture solution 24 is returned to the culture solution tank 8 through the drain pipe 13. As described above, a circulation system of the culture solution 24 is formed between the culture solution tank 8 and each of the cultivation beds 6. A filter for removing impurities in the culture solution 24 is further provided in the circulation system.

栽培用支架2之各照明7被點亮,且光照射至配置於各照明7之下側之段之栽培床6之植物25。各栽培床6之植物25藉由自其根吸收培養液24之水分及養分並於葉片接收照明7之光而成長。 Each of the illuminations 7 of the cultivation holder 2 is lighted, and the light is irradiated to the plant 25 of the cultivation bed 6 disposed in the lower side of each illumination 7. The plant 25 of each of the cultivation beds 6 grows by absorbing the moisture and nutrients of the culture solution 24 from its root and receiving the light of the illumination 7 on the blades.

如圖4所示,將培養液24自長度方向之一端(培養液導入口27)供給至栽培床6,並自另一端(培養液排出口29)排出培養液。安裝於相同支持框架5之下側之照明7之熱施加至該栽培床6。因此,假設於未實施任何熱對策之情形時,栽培床6內之水流會產生溫度差。即,相對於上流側之水流30-1,而下游側之水流30-2會被長時間施加照明7之熱,故而溫度變高。其結果,存在植物25於栽培床6之長度方向不均勻地成長之可能性。於植物工廠中,講求植物之品質固定之優勢,故而此種不均勻性欠佳。 As shown in Fig. 4, the culture solution 24 is supplied from one end in the longitudinal direction (culture solution introduction port 27) to the cultivation bed 6, and the culture solution is discharged from the other end (culture solution discharge port 29). The heat of the illumination 7 mounted on the lower side of the same support frame 5 is applied to the cultivation bed 6. Therefore, it is assumed that a water temperature in the cultivation bed 6 causes a temperature difference when no heat countermeasure is implemented. That is, with respect to the water flow 30-1 on the upstream side, the water flow 30-2 on the downstream side is heated by the illumination 7 for a long time, so that the temperature becomes high. As a result, there is a possibility that the plant 25 grows unevenly in the longitudinal direction of the cultivation bed 6. In plant factories, the advantages of plant quality are fixed, so this unevenness is not good.

於本實施形態中,於栽培床6之下表面塗佈有隔熱塗料22a,且於底面塗佈有隔熱塗料22b。藉由該等隔熱塗料22a、22b,可降低自栽 培床6之正下方之照明7接收之熱之影響。其結果,可降低栽培床6之長度方向之溫度差,從而可使植物25之生長均勻化。 In the present embodiment, the heat insulating coating material 22a is applied to the lower surface of the cultivation bed 6, and the heat insulating coating material 22b is applied to the bottom surface. By the heat insulating coatings 22a, 22b, the self-planting can be reduced The effect of the heat received by the illumination 7 directly below the bed 6. As a result, the temperature difference in the longitudinal direction of the cultivation bed 6 can be lowered, and the growth of the plant 25 can be made uniform.

於本實施形態中,進而於栽培床6之長度方向之側面之外表面與內表面塗佈有隔熱塗料22c、22d。於塗佈於該等面之情形時,尤其是較理想為採用面內方向(與栽培床6之塗佈有隔熱塗料22c、22d之側面平行之方向,於圖3、圖4之例中為yz面內之方向)之熱導率相對較高之隔熱塗料22c、22d。熱係藉由此種隔熱塗料22c、22d而沿水流方向移動,藉此可使栽培床6之長度方向之熱梯度更小,從而可使植物25之生長條件進而均勻化。 In the present embodiment, the heat insulating paints 22c and 22d are applied to the outer surface and the inner surface of the side surface in the longitudinal direction of the cultivation bed 6. In the case of coating on the same surface, it is particularly preferable to adopt the in-plane direction (the direction parallel to the side on which the heat insulating coatings 22c and 22d of the cultivation bed 6 are applied, in the examples of FIGS. 3 and 4). The heat insulating coatings 22c and 22d having relatively high thermal conductivity in the direction of the yz plane. The heat is moved in the water flow direction by the heat insulating coatings 22c and 22d, whereby the thermal gradient in the longitudinal direction of the cultivation bed 6 can be made smaller, and the growth conditions of the plants 25 can be further uniformized.

此種效果並不限定於可在如圖4所示般供給有培養液24之栽培床6中獲得。圖5表示栽培床6a之其他構成例。於該例中,於栽培床6a之內部配置有具有沿栽培床6a之長度方向延長之管狀之形狀且具有於延長方向排列之多個孔31之短笛管(Piccolo Tube)等供水配管30。於圖5之例中,供水配管30自y軸負方向被導入至栽培床6a之內部,其前端配置於栽培床6a之y軸正方向之端部之附近。供水配管30之根部連接於圖1之供水配管12。於此種情形時,於供水配管30之根部(y軸負方向)附近之栽培床6a之端部設置有培養液排出口29a。栽培床6a亦可以朝向培養液排出口29a之側(y軸負方向側)稍微下降之方式保持傾斜而配置。 This effect is not limited to that which can be obtained in the cultivation bed 6 to which the culture liquid 24 is supplied as shown in FIG. Fig. 5 shows another configuration example of the cultivation bed 6a. In this example, a water supply pipe 30 such as a Piccolo Tube having a tubular shape elongated in the longitudinal direction of the cultivation bed 6a and having a plurality of holes 31 arranged in the extension direction is disposed inside the cultivation bed 6a. In the example of Fig. 5, the water supply pipe 30 is introduced into the inside of the cultivation bed 6a from the negative y-axis direction, and the tip end thereof is disposed in the vicinity of the end portion of the cultivation bed 6a in the positive y-axis direction. The root of the water supply pipe 30 is connected to the water supply pipe 12 of Fig. 1 . In this case, the culture liquid discharge port 29a is provided at the end of the cultivation bed 6a near the root portion (negative direction of the y-axis) of the water supply pipe 30. The cultivation bed 6a may be disposed so as to be inclined so as to slightly descend toward the side of the culture solution discharge port 29a (the negative side in the y-axis direction).

於包括圖5之構成之栽培床6a之情形時,當藉由循環泵9而施加有壓力之培養液24被供給至供水配管30之內部時,培養液24自各孔31被供給至栽培床6a之內部,而大概形成栽培床6a之寬度方向(x軸方向)之水流32。該水流32於栽培床6a之寬度方向之兩端,成為朝向培養液排出口29a之長度方向之水流33,並自培養液排出口29a排出至排水配管13。藉由此種構成亦可使各栽培床6a之內部之培養液以固定之流量循環。 In the case of the cultivation bed 6a including the configuration of Fig. 5, when the culture liquid 24 to which the pressure is applied by the circulation pump 9 is supplied to the inside of the water supply pipe 30, the culture liquid 24 is supplied from the respective holes 31 to the cultivation bed 6a. Inside, the water flow 32 in the width direction (x-axis direction) of the cultivation bed 6a is formed. The water flow 32 is at both ends in the width direction of the cultivation bed 6a, and is a water flow 33 in the longitudinal direction of the culture liquid discharge port 29a, and is discharged from the culture liquid discharge port 29a to the drainage pipe 13. With this configuration, the culture liquid inside each of the cultivation beds 6a can be circulated at a fixed flow rate.

即便於圖5之構成之情形時,於未實施任何熱對策之情形時,亦會因來自下方之照明7之熱產生水流33之下游側之溫度變高之溫度梯度。因此,與圖4之情形同樣地,藉由塗佈隔熱塗料22a~22f,可降低來自照明7之熱之影響。進而,藉由隔熱塗料22a~22f之熱傳導,可使栽培床6a之長度方向之溫度均勻化。 That is, in the case where the configuration of Fig. 5 is facilitated, when any heat countermeasure is not performed, the temperature gradient on the downstream side of the water stream 33 is increased due to the heat from the illumination 7 below. Therefore, as in the case of Fig. 4, by applying the heat insulating coating materials 22a to 22f, the influence of heat from the illumination 7 can be reduced. Further, by the heat conduction of the heat insulating coating materials 22a to 22f, the temperature in the longitudinal direction of the cultivation bed 6a can be made uniform.

較理想為植物栽培裝置進而包括圖1所示之上部配管20。用以進行植物栽培室1之溫度及濕度調節之空調機16將冷氣等供給至植物栽培室1之天花板19附近之天花板空間。藉由設置上部配管20,可藉由空調機16之冷氣對培養液24進行冷卻。 Preferably, the plant cultivation apparatus further includes the upper pipe 20 shown in Fig. 1 . The air conditioner 16 for adjusting the temperature and humidity of the plant cultivation room 1 supplies cold air or the like to the ceiling space near the ceiling 19 of the plant cultivation room 1. By providing the upper pipe 20, the culture liquid 24 can be cooled by the cold air of the air conditioner 16.

如已經所說明般,培養液箱8之內部之培養液24係藉由循環泵9而被泵送至供水配管12,並於被供給至栽培床6之後自栽培床6被回收至排水配管13,而返回至培養液箱8。供水配管12進而連接於設置於栽培用支架2之最上段與天花板19之間之位置之上部配管20之一端。上部配管20之另一端連接於排水配管13。 As described above, the culture liquid 24 inside the culture solution tank 8 is pumped to the water supply pipe 12 by the circulation pump 9, and is supplied to the cultivation bed 6 and recovered from the cultivation bed 6 to the drainage pipe 13 And return to the culture tank 8. The water supply pipe 12 is further connected to one end of the upper pipe 20 provided at a position between the uppermost stage of the cultivation bracket 2 and the ceiling 19. The other end of the upper pipe 20 is connected to the drain pipe 13.

培養液24自供水配管12被供給至上部配管20。空調機16輸出之冷氣通常被供給至植物栽培室1之天花板空間之附近之情況較多。因此,冷氣以相對較大之流量被供給至天花板空間。流經上部配管20之培養液24藉由該冷氣而有效地冷卻並返回至培養液箱8。 The culture solution 24 is supplied from the water supply pipe 12 to the upper pipe 20. The cold air output from the air conditioner 16 is usually supplied to the vicinity of the ceiling space of the plant cultivation room 1 in many cases. Therefore, cold air is supplied to the ceiling space at a relatively large flow rate. The culture liquid 24 flowing through the upper pipe 20 is effectively cooled by the cold air and returned to the culture liquid tank 8.

於栽培床6中循環之培養液24之溫度因照明7之熱而上升。因此,培養液箱8之內部之培養液24之溫度具有上升之傾向。溫度調節部15對該培養液24進行冷卻並將溫度保持在固定範圍內。於此種植物栽培裝置中,藉由設置上部配管20,可抑制培養液24之溫度上升,且可抑制溫度調節部15之動作所需之電力。 The temperature of the culture solution 24 circulated in the cultivation bed 6 rises due to the heat of the illumination 7. Therefore, the temperature of the culture solution 24 inside the culture tank 8 tends to rise. The temperature adjusting unit 15 cools the culture solution 24 and maintains the temperature within a fixed range. In the plant cultivation apparatus, by providing the upper pipe 20, the temperature rise of the culture liquid 24 can be suppressed, and the electric power required for the operation of the temperature adjustment unit 15 can be suppressed.

進而,為了抑制培養液24之溫度上升,亦可使用空調機16之排水(drain)。於使空調機16製冷運轉時,空氣中之水蒸氣於會因冷媒之氣化等而冷卻之冷卻配管之表面冷凝,藉此產生液態之水。該水係作 為排水而被排出。排水由於為於冷卻配管之表面冷凝後之水,故而溫度較室溫更低。因此,可將排水作為冷卻水而使用。 Further, in order to suppress an increase in the temperature of the culture solution 24, a drain of the air conditioner 16 may be used. When the air conditioner (16) is cooled, the water vapor in the air is condensed on the surface of the cooling pipe which is cooled by vaporization of the refrigerant, thereby generating liquid water. The water system It is discharged for drainage. Since the drainage is water condensed on the surface of the cooling pipe, the temperature is lower than room temperature. Therefore, the drainage can be used as cooling water.

空調機16產生之排水被供給至排水配管17。排水配管17經由電磁閥18連接於培養液箱8。於此種構成中,電磁閥18係以如下方式被控制。 The drain generated by the air conditioner 16 is supplied to the drain pipe 17. The drain pipe 17 is connected to the culture tank 8 via a solenoid valve 18. In such a configuration, the solenoid valve 18 is controlled as follows.

培養液箱8之控制裝置通常將電磁閥18打開而將排供液至培養液箱8。藉由該排水,可降低培養液箱8之內部之培養液24之溫度。於根據液位感測器14之檢測信號判斷培養液箱8之液位為預先設定之上限值以上之情形時,或根據溫度感測器之檢測值判斷培養液箱8之內部之培養液24之溫度為預先設定之下限值以下之情形時,控制裝置關閉電磁閥18並停止供給排水。藉由此種動作,可抑制溫度調節部15為了進行冷卻而用以使珀爾帖元件等動作之電力。進而,可抑制供液系統10之供液量。 The control device of the culture tank 8 usually opens the solenoid valve 18 to supply the liquid to the culture tank 8. By this drainage, the temperature of the culture solution 24 inside the culture solution tank 8 can be lowered. When it is determined that the liquid level of the culture solution tank 8 is equal to or greater than the upper limit value set according to the detection signal of the liquid level sensor 14, or the culture liquid inside the culture liquid tank 8 is judged based on the detection value of the temperature sensor When the temperature of 24 is below the preset lower limit value, the control device closes the solenoid valve 18 and stops supplying water to the drain. By such an operation, the electric power for operating the Peltier element or the like by the temperature adjustment unit 15 for cooling can be suppressed. Further, the amount of liquid supplied from the liquid supply system 10 can be suppressed.

作為栽培床6之構成,亦可採用與以上所說明者不同之構成。於以上之說明中,如圖6所示,將具有獨立之構造之水槽係作為栽培床6而使用。此種栽培床6係藉由安置於支持框架5並利用固定金屬件35等對支持框架5進行固定而使用。 As the constitution of the cultivation bed 6, a configuration different from that described above may be employed. In the above description, as shown in FIG. 6, a water tank system having an independent structure is used as the cultivation bed 6. Such a cultivation bed 6 is used by being placed on the support frame 5 and fixing the support frame 5 by a fixing metal member 35 or the like.

相對於此,於圖7之栽培床6b中,未使用具有與支持框架5獨立之構造之水槽。藉由於表面塗佈有隔熱塗料37之複數個支持體36形成構成栽培床6之底面之平面。該等複數個支持體36既可相互結合而作為一個構造構件,亦可作為分離成個別之零件而藉由栽培用支架2之支持框架5支持。 On the other hand, in the cultivation bed 6b of FIG. 7, the water tank which has the structure independent of the support frame 5 is not used. The plane constituting the bottom surface of the cultivation bed 6 is formed by a plurality of supports 36 having a surface coated with the heat insulating coating 37. The plurality of support bodies 36 may be combined as one structural member or may be supported as a separate component by the support frame 5 of the cultivation holder 2.

於支持體36之上表面固定有栽培床框38。栽培床框38形成自支持體36向上表面突出之側壁面,例如形成與圖4之栽培床6同樣地將y軸方向設為長度方向之矩形之平面形狀。利用合成樹脂等柔軟之片材狀之素材且不使液體通過之不透水性片材39覆蓋以此方式形成之支持 體36與栽培床框38之上方。藉由將培養液24自該不透水性片材39之上方供給至由栽培床框38所包圍之區域之內部,可形成栽培床6b。由於無需圖6中之栽培床本體21,故而可輕量化。於此種情形時,相當於圖4中之培養液導入口27與培養液排出口29之構成要素係藉由於不透水性片材39之y軸兩端附近開孔並以分別維持水密性之方式連接於供水配管26與排水配管28而形成。或者,亦可將供水配管26與排水配管28之前端部配置於栽培床6b之上側作為培養液導入口27與培養液排出口29,並自上側供給培養液。又,即便於圖6所示般之構成之栽培床6中,亦可使用與圖7所示之不透水性片材39相同之片材。於此情形時,由於作為栽培床本體21或隔熱塗料22不要求高度之遮水性,故而可擴大材料之選擇範圍。 A cultivation bed frame 38 is fixed to the upper surface of the support body 36. The cultivation bed frame 38 forms a side wall surface that protrudes from the support body 36 to the upper surface, and forms a rectangular planar shape in which the y-axis direction is the longitudinal direction, similarly to the cultivation bed 6 of Fig. 4 . Support formed in such a manner by using a soft sheet-like material such as synthetic resin and not covering the water-permeable sheet 39 through which the liquid passes The body 36 is above the cultivation bed frame 38. The cultivation bed 6b can be formed by supplying the culture solution 24 from above the water-impermeable sheet 39 to the inside of the region surrounded by the cultivation bed frame 38. Since the cultivation bed body 21 in Fig. 6 is not required, it can be lightweight. In this case, the constituent elements corresponding to the culture solution introduction port 27 and the culture solution discharge port 29 in Fig. 4 are opened by the vicinity of both ends of the y-axis of the water-impermeable sheet 39 to maintain watertightness, respectively. The method is formed by being connected to the water supply pipe 26 and the drain pipe 28. Alternatively, the water supply pipe 26 and the front end portion of the drain pipe 28 may be disposed above the cultivation bed 6b as the culture liquid introduction port 27 and the culture liquid discharge port 29, and the culture liquid may be supplied from the upper side. Further, even in the cultivation bed 6 having the configuration shown in Fig. 6, the same sheet as the water-impermeable sheet 39 shown in Fig. 7 can be used. In this case, since the height of the plant bed 21 or the heat insulating coating 22 is not required to be high, the range of material selection can be expanded.

以上,藉由若干實施形態對本發明進行了說明,該等諸實施形態僅係為了說明發明而列舉,並非用於限定申請專利範圍之內容而參照。以上說明之實施形態可於本發明之範圍內進行各種變更。例如,將以上實施形態於無矛盾之範圍內進行任意組合而成者包含於本發明之實施形態。 The present invention has been described above with reference to a certain number of embodiments, and these embodiments are merely illustrative of the invention and are not intended to limit the scope of the claims. The embodiments described above can be variously modified within the scope of the invention. For example, any combination of the above embodiments in a range without contradiction is included in the embodiment of the present invention.

1‧‧‧植物栽培室 1‧‧‧Plant cultivation room

2‧‧‧栽培用支架 2‧‧‧Cultivation bracket

3‧‧‧地面 3‧‧‧ Ground

4‧‧‧柱 4‧‧‧ column

5‧‧‧支持框架 5‧‧‧Support framework

6‧‧‧栽培床 6‧‧‧Cultivated bed

7‧‧‧照明 7‧‧‧Lighting

8‧‧‧培養液箱 8‧‧‧Culture tank

9‧‧‧循環泵 9‧‧‧Circulating pump

10‧‧‧供液系統 10‧‧‧liquid supply system

11‧‧‧電磁閥 11‧‧‧ solenoid valve

12‧‧‧供水配管 12‧‧‧Water supply piping

13‧‧‧排水配管 13‧‧‧Drainage piping

14‧‧‧液位感測器 14‧‧‧ Liquid level sensor

15‧‧‧溫度調節部 15‧‧‧ Temperature Regulation Department

16‧‧‧空調機 16‧‧‧Air conditioner

17‧‧‧排水配管 17‧‧‧Drainage piping

18‧‧‧電磁閥 18‧‧‧ solenoid valve

19‧‧‧天花板 19‧‧‧ ceiling

20‧‧‧上部配管 20‧‧‧Upper piping

Claims (4)

一種植物栽培裝置,其具備:栽培用支架,其係配置於房間之栽培用支架,且包括於相對於上述房間之地面之鉛垂方向排列成多段之複數個支持框架;栽培床,其被支持於上述複數個支持框架之各者,並形成用以儲存培養液之貯存槽;隔熱層,其塗佈於上述栽培床之外側;照明部,其被支持於上述複數個支持框架之各者,並對下側之段之上述栽培床之方向進行照明;培養液箱;培養液循環系統,其使上述培養液於上述培養液箱與上述栽培床之間循環;溫度控制部,其控制上述培養液箱之內部之上述培養液之溫度;空調機,其將冷氣供給至配置有上述栽培用支架之上述房間;及排水配管,其將因自上述空調機排出之冷氣而產生之排供液至上述培養液箱。 A plant cultivation apparatus comprising: a cultivation support, which is disposed in a cultivation bracket of a room, and includes a plurality of support frames arranged in a plurality of stages in a vertical direction with respect to a floor of the room; the cultivation bed is supported Each of the plurality of support frames forms a storage tank for storing the culture solution; a heat insulation layer applied to the outside of the cultivation bed; and an illumination unit supported by each of the plurality of support frames And illuminating the direction of the cultivation bed in the lower section; the culture liquid tank; the culture liquid circulation system, wherein the culture liquid is circulated between the culture liquid tank and the cultivation bed; and the temperature control unit controls the above a temperature of the culture solution inside the culture tank; an air conditioner that supplies cold air to the room in which the cultivation bracket is disposed; and a drain pipe that discharges liquid from the air conditioner discharged from the air conditioner To the above culture tank. 如請求項1之植物栽培裝置,其中上述隔熱層係由熱導率大於上述栽培床之材料形成。 The plant cultivation apparatus of claim 1, wherein the heat insulating layer is formed of a material having a thermal conductivity greater than that of the cultivation bed. 如請求項1或2之植物栽培裝置,其中上述隔熱層覆蓋上述栽培床之底面與側面。 A plant cultivation apparatus according to claim 1 or 2, wherein said heat insulating layer covers a bottom surface and a side surface of said cultivation bed. 如請求項1或2之植物栽培裝置,其中上述空調機將冷氣供給至上述栽培用支架與上述房間之天花板之間之空間即天花板空間, 上述培養液循環系統具備配置於上述天花板空間之上部配管,上述培養液係於經過上述上部配管後被供給至上述栽培床。 The plant cultivation apparatus according to claim 1 or 2, wherein the air conditioner supplies cold air to a space between the cultivation bracket and a ceiling of the room, that is, a ceiling space, The culture solution circulation system includes a pipe disposed above the ceiling space, and the culture liquid is supplied to the cultivation bed after passing through the upper pipe.
TW103133329A 2013-09-25 2014-09-25 Plant cultivation apparatus TW201528936A (en)

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