TW201527251A - Glass, lighting device, organic electroluminescence lighting, solar cell and organic electroluminescence display - Google Patents

Glass, lighting device, organic electroluminescence lighting, solar cell and organic electroluminescence display Download PDF

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TW201527251A
TW201527251A TW103141105A TW103141105A TW201527251A TW 201527251 A TW201527251 A TW 201527251A TW 103141105 A TW103141105 A TW 103141105A TW 103141105 A TW103141105 A TW 103141105A TW 201527251 A TW201527251 A TW 201527251A
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glass
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TW103141105A
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Tomoki Yanase
Chia-Lung Lee
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Nippon Electric Glass Co
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097—Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03926—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate comprising a flexible substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Abstract

A glass, which obtains a high refractive index and has high chemical resistance, is characterized as: SiO2+TiO2+ZrO2 ranging from 57 mol% to 80 mol% is contained in a glass composition, a mole ratio (TiO2+2ZrO2)/(SiO2+Al2O3+B2O3) ranges from 0.01 to 0.40, and a refractive index nd ranges from 1.60 to 1.80.

Description

玻璃 glass

本發明是有關於一種玻璃，例如是有關於一種適合於有機電致發光(Electroluminescence，EL)裝置、尤其是有機EL照明的高折射率玻璃。 The present invention relates to a glass, for example, to a high refractive index glass suitable for an organic electroluminescence (EL) device, particularly an organic EL illumination.

近年來，使用有機EL發光元件的顯示器、照明日漸受到矚目。該些有機EL裝置具有藉由形成有氧化銦錫(Indium Tin Oxide，ITO)等透明導電膜的玻璃板夾持有機發光元件的結構。於所述結構中，若電流流經有機發光元件，則有機發光元件中的電洞與電子會合而發光。所發出的光經由ITO等透明導電膜進入玻璃板中，一邊於玻璃板內反復進行反射一邊射出至外部。 In recent years, displays and illumination using organic EL light-emitting elements have been attracting attention. These organic EL devices have a structure in which an organic light-emitting element is sandwiched by a glass plate on which a transparent conductive film such as Indium Tin Oxide (ITO) is formed. In the above configuration, when a current flows through the organic light emitting element, the holes in the organic light emitting element and the electrons merge to emit light. The emitted light enters the glass plate through a transparent conductive film such as ITO, and is emitted to the outside while being repeatedly reflected in the glass plate.

[現有技術文獻] [Prior Art Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2007-186407號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-186407

另外，有機發光元件的折射率nd為1.8~1.9，ITO的折 射率nd為1.9~2.0。相對於此，玻璃板的折射率nd通常為1.5左右。因此，現有的有機EL裝置中存在如下問題：因玻璃板-ITO界面的折射率差而於界面引起全反射，從而無法效率良好地導出自有機發光元件所產生的光。 Further, the refractive index n d of the organic light-emitting element is 1.8 to 1.9, and the refractive index n d of ITO is 1.9 to 2.0. On the other hand, the refractive index n d of the glass plate is usually about 1.5. Therefore, in the conventional organic EL device, there is a problem that total reflection occurs at the interface due to the difference in refractive index between the glass plate and the ITO interface, and light generated from the organic light emitting element cannot be efficiently derived.

若於玻璃板中使用高折射率玻璃、尤其是折射率nd為1.60~1.80的玻璃，則所述問題難以顯現。例如，專利文獻1中揭示了一種包含高折射率玻璃的光學玻璃。 If a high refractive index glass is used in a glass plate, especially a glass having a refractive index n d of 1.60 to 1.80, the problem is difficult to visualize. For example, Patent Document 1 discloses an optical glass comprising a high refractive index glass.

然而，於有機EL裝置的製造步驟中，所述高折射率玻璃容易因進行ITO圖案化時所使用的酸或鹼的化學品而產生白濁或表面粗化。 However, in the manufacturing step of the organic EL device, the high refractive index glass is liable to be white turbid or roughened by the chemical of an acid or a base used in patterning of ITO.

因此，本發明是鑒於所述情況而成，其技術課題在於發明一種高折射率且高耐化學品性的玻璃。 Therefore, the present invention has been made in view of the above circumstances, and a technical object thereof is to invent a glass having high refractive index and high chemical resistance.

本發明者等人進行了努力研究，結果發現藉由將玻璃組成範圍限制為規定範圍可解決所述技術課題，並作為本發明而提出。即，本發明的玻璃的特徵在於：作為玻璃組成，含有57莫耳%~80莫耳%的SiO2+TiO2+ZrO2，莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)為0.01~0.40，且折射率nd為1.60~1.80。此處，「SiO2+TiO2+ZrO2」是指SiO2、TiO2以及ZrO2的合量。「TiO2+2ZrO2」是指TiO2的含量與ZrO2的2倍含量的合量。「SiO2+Al2O3+B2O3」是指SiO2、Al2O3以及B2O3的合量。「莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)」是指「TiO2+2ZrO2」的 含量除以「SiO2+Al2O3+B2O3」的含量所得的值。「折射率nd」是d射線(波長587.6nm)下的測定值，可藉由折射率測定器測定。例如，可藉由於製作25mm×25mm×約3mm的長方體試樣後，以如0.1℃/min般的冷卻速度，於(緩冷點+30℃)~(應變點-50℃)的溫度區域內進行退火處理，繼而一邊使折射率匹配的浸液浸透至玻璃間，一邊使用島津製作所公司製造的折射率測定器KPR-2000進行測定。 As a result of intensive studies, the inventors of the present invention have found that the technical problem can be solved by limiting the glass composition range to a predetermined range, and has been proposed as the present invention. That is, the glass of the present invention is characterized in that it contains 57 mol% to 80 mol% of SiO 2 + TiO 2 + ZrO 2 as a glass composition, and molar ratio (TiO 2 + 2 ZrO 2 ) / (SiO 2 + Al) 2 O 3 + B 2 O 3 ) is 0.01 to 0.40, and the refractive index n d is 1.60 to 1.80. Here, "SiO 2 + TiO 2 + ZrO 2 " means a combined amount of SiO 2 , TiO 2 and ZrO 2 . "TiO 2 +2ZrO 2 " means a combination of the content of TiO 2 and twice the content of ZrO 2 . "SiO 2 + Al 2 O 3 + B 2 O 3 " means a combination of SiO 2 , Al 2 O 3 and B 2 O 3 . "Mohr ratio (TiO 2 + 2ZrO 2 ) / (SiO 2 + Al 2 O 3 + B 2 O 3 )" means the content of "TiO 2 + 2ZrO 2 " divided by "SiO 2 + Al 2 O 3 + B" The value obtained by the content of 2 O 3 ". The "refractive index n d " is a measured value at a d-ray (wavelength: 587.6 nm) and can be measured by a refractive index measuring device. For example, by making a rectangular parallelepiped sample of 25 mm × 25 mm × about 3 mm, at a cooling rate of, for example, 0.1 ° C / min, in a temperature range of (slow cooling point + 30 ° C) ~ (strain point - 50 ° C) The annealing treatment was carried out, and then the refractive index-matched immersion liquid was impregnated into the glass, and the measurement was carried out using a refractive index measuring instrument KPR-2000 manufactured by Shimadzu Corporation.

作為本發明的玻璃的玻璃組成，含有57莫耳%~80莫耳%的SiO2+TiO2+ZrO2，莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)為0.01~0.40。藉此，可於確保耐失透性與成形性的基礎上提高折射率與耐化學品性。 As the glass composition of the glass of the present invention, it contains 57 mol% to 80 mol% of SiO 2 +TiO 2 +ZrO 2 , and molar ratio (TiO 2 +2ZrO 2 )/(SiO 2 +Al 2 O 3 +B 2 O 3 ) is 0.01 to 0.40. Thereby, the refractive index and chemical resistance can be improved while ensuring resistance to devitrification and formability.

第二，本發明的玻璃較佳為平板形狀。 Second, the glass of the present invention is preferably in the shape of a flat plate.

第三，本發明的玻璃較佳為於50℃的10質量%HCl水溶液中浸漬3小時後的霧度(Haze)值以厚度0.7mm換算計為3%以下。若如此，則於有機EL裝置製造步驟中，玻璃表面不易因ITO的蝕刻液等化學品而產生白濁、變質。此處，「Haze值」是指利用霧度計(例如日本電飾工業公司製造的霧度計(Haze Meter)NDH-5000)所測定的值。 Third, the glass of the present invention preferably has a haze value of 3% or less in terms of a thickness of 0.7 mm after immersion in a 10% by mass aqueous solution of HCl at 50 ° C for 3 hours. In this case, in the manufacturing process of the organic EL device, the glass surface is less likely to be cloudy or deteriorated by chemicals such as an ITO etching solution. Here, the "Haze value" refers to a value measured by a haze meter (for example, Haze Meter NDH-5000 manufactured by Nippon Denshi Kogyo Co., Ltd.).

第四，本發明的玻璃較佳為ZrO2的含量為0.5莫耳%~3莫耳%。若如此，則可提高折射率，同時可使液相溫度附近的溫度高溫化，提高液相黏度。 Fourth, the glass of the present invention preferably has a ZrO 2 content of from 0.5 mol% to 3 mol%. If so, the refractive index can be increased, and the temperature in the vicinity of the liquidus temperature can be increased to increase the viscosity of the liquid phase.

第五，本發明的玻璃較佳為TiO2的含量為0.01莫耳% ~15莫耳%。若如此，則可提高折射率。 Fifth, the glass of the present invention preferably has a TiO 2 content of from 0.01 mol% to 15 mol%. If so, the refractive index can be increased.

第六，本發明的玻璃較佳為實質上不含PbO，且Bi2O3+La2O3+Gd2O3+Nb2O5+Ta2O5+WO3的含量為10莫耳%以下。若如此，則可照顧到環境要求，同時可降低批料成本。此處，所謂「實質上不含PbO」是指雖儘量避免含有作為明示成分的PbO，但容許以雜質等級混入的主旨，具體而言，是指作為明示成分的PbO的含量未滿0.5%(較佳為未滿0.1%)的情況。於以下說明中的明示成分為PbO以外的成分時，所述主旨亦為同樣適用的事項。「Bi2O3+La2O3+Gd2O3+Nb2O5+Ta2O5+WO3」是指Bi2O3、La2O3、Gd2O3、Nb2O5、Ta2O5以及WO3的合量。 Sixth, the glass of the present invention preferably contains substantially no PbO, and the content of Bi 2 O 3 + La 2 O 3 + Gd 2 O 3 + Nb 2 O 5 + Ta 2 O 5 + WO 3 is 10 moles. %the following. If so, it can take care of the environmental requirements while reducing the cost of the batch. Here, the term "substantially free of PbO" means that PbO as an explicit component is avoided as much as possible, but it is allowed to be mixed in an impurity level, and specifically, the content of PbO as an explicit component is less than 0.5% ( It is preferably less than 0.1%). When the explicit component in the following description is a component other than PbO, the above-mentioned subject matter is also applicable. "Bi 2 O 3 +La 2 O 3 +Gd 2 O 3 +Nb 2 O 5 +Ta 2 O 5 +WO 3 " means Bi 2 O 3 , La 2 O 3 , Gd 2 O 3 , Nb 2 O 5 The combination of Ta 2 O 5 and WO 3 .

第七，本發明的玻璃較佳為ZnO的含量為5莫耳%以下。若如此，則液相溫度容易降低。 Seventh, the glass of the present invention preferably has a ZnO content of 5 mol% or less. If so, the liquidus temperature is liable to lower.

第八，本發明的玻璃較佳為實質上不含鹼金屬氧化物(Li2O、Na2O以及K2O的合量)。若如此，則無需形成SiO2膜等鈍化膜，可使製造成本低廉化。 Eighth, the glass of the present invention preferably contains substantially no alkali metal oxide (combined amount of Li 2 O, Na 2 O, and K 2 O). In this case, it is not necessary to form a passivation film such as a SiO 2 film, and the manufacturing cost can be reduced.

第九，本發明的玻璃較佳為液相黏度為103.8dPa．s以上。若如此，則容易藉由浮式法等成形玻璃板。此處，「液相黏度」是指藉由鉑球提拉法測定液相溫度下的玻璃的黏度所得的值。「液相溫度」是藉由如下方法所測定的值：將通過標準篩30目(500μm)、且殘留於50目(300μm)的玻璃粉末放入鉑舟中，然後將該鉑舟於溫度梯度爐中保持24小時並測定結晶的析出溫度。 9. The glass of the present invention preferably has a liquid viscosity of 10 3.8 dPa. s above. If so, it is easy to shape a glass plate by a floating method or the like. Here, the "liquid phase viscosity" means a value obtained by measuring the viscosity of the glass at a liquidus temperature by a platinum ball pulling method. The "liquidus temperature" is a value measured by a method in which a glass powder passing through a standard sieve of 30 mesh (500 μm) and remaining at 50 mesh (300 μm) is placed in a platinum boat, and then the platinum boat is subjected to a temperature gradient. The furnace was kept for 24 hours and the precipitation temperature of the crystal was measured.

第十，本發明的玻璃較佳為藉由溢流下拉(overflow down draw)法成形而成。 Tenth, the glass of the present invention is preferably pulled by an overflow (overflow) Down draw) method.

第十一，本發明的玻璃較佳為藉由浮式法成形而成。 Eleventh, the glass of the present invention is preferably formed by a floating method.

第十二，本發明的玻璃較佳為藉由軋平(roll out)法或上拉(up draw)法成形而成。 Twelfth, the glass of the present invention is preferably formed by a roll out method or an up draw method.

第十三，本發明的照明裝置的特徵在於具備所述玻璃。 Thirteenth, the lighting device of the present invention is characterized by comprising the glass.

第十四，本發明的有機EL照明的特徵在於具備所述玻璃。 Fourteenth, the organic EL illumination of the present invention is characterized in that the glass is provided.

第十五，本發明的太陽電池的特徵在於具備所述玻璃。 Fifteenth, the solar cell of the present invention is characterized by comprising the glass.

第十六，本發明的有機EL顯示器的特徵在於具備所述玻璃。 Sixteenth, the organic EL display of the present invention is characterized by comprising the glass.

作為本發明的玻璃的玻璃組成，含有57莫耳%~80莫耳%的SiO2+TiO2+ZrO2，莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)為0.01~0.40。以下說明如所述般限定各成分的含有範圍的理由。再者，於各成分的含有範圍的說明中，除事先進行特別說明的情況外，%表達是表示莫耳%。 As the glass composition of the glass of the present invention, it contains 57 mol% to 80 mol% of SiO 2 +TiO 2 +ZrO 2 , and molar ratio (TiO 2 +2ZrO 2 )/(SiO 2 +Al 2 O 3 +B 2 O 3 ) is 0.01 to 0.40. The reason for limiting the content range of each component as described above will be described below. In addition, in the description of the range of the content of each component, the % expression indicates the molar % except for the case where it is specifically described beforehand.

SiO2+TiO2+ZrO2的含量為57%~80%。若SiO2+TiO2+ZrO2的含量變少，則耐化學品性容易降低。由此，SiO2+TiO2+ZrO2的含量為57%以上，較佳為58%以上、59%以上 或者60%以上，尤佳為61%以上。另一方面，若SiO2+TiO2+ZrO2的含量變多，則成形性容易降低，並且難以確保高液相黏度。由此，SiO2+TiO2+ZrO2的含量為80%以下，較佳為75%以下、70%以下、68%以下或者65%以下，尤佳為63%以下。 The content of SiO 2 +TiO 2 +ZrO 2 is 57% to 80%. When the content of SiO 2 +TiO 2 +ZrO 2 is small, the chemical resistance is liable to lower. Thus, the content of SiO 2 +TiO 2 +ZrO 2 is 57% or more, preferably 58% or more, 59% or more, or 60% or more, and particularly preferably 61% or more. On the other hand, when the content of SiO 2 +TiO 2 +ZrO 2 is increased, the formability is liable to lower, and it is difficult to secure a high liquid phase viscosity. Thus, the content of SiO 2 +TiO 2 +ZrO 2 is 80% or less, preferably 75% or less, 70% or less, 68% or less, or 65% or less, and particularly preferably 63% or less.

若SiO2的含量變少，則難以形成玻璃網狀結構，玻璃化變得困難。而且，若SiO2的含量變少，則玻璃的黏性會過度降低，難以確保高液相黏度，進而耐化學品性容易降低。由此，SiO2的含量較佳為40%以上、43%以上、45%以上、47%以上、48%以上或者50%以上，尤佳為52%以上。另一方面，若SiO2的含量變多，則折射率、熔融性、成形性容易降低。由此，SiO2的含量較佳為68%以下、65%以下、63%以下、61%以下、59%以下或者57%以下，尤佳為56%以下。 When the content of SiO 2 is small, it is difficult to form a glass network structure, and it becomes difficult to vitrify. Further, when the content of SiO 2 is small, the viscosity of the glass is excessively lowered, and it is difficult to secure a high liquid phase viscosity, and the chemical resistance is liable to lower. Therefore, the content of SiO 2 is preferably 40% or more, 43% or more, 45% or more, 47% or more, 48% or more, or 50% or more, and particularly preferably 52% or more. On the other hand, when the content of SiO 2 is increased, the refractive index, the meltability, and the moldability are liable to lower. Therefore, the content of SiO 2 is preferably 68% or less, 65% or less, 63% or less, 61% or less, 59% or less, or 57% or less, and particularly preferably 56% or less.

TiO2+ZrO2為有效提高折射率而不會使批料成本高漲的成分。然而，若TiO2+ZrO2的含量變多，則耐失透性容易降低。由此，TiO2+ZrO2的含量較佳為1%~15%、2%~14%、3%~11%或者4%~8%，尤佳為5%~7%。再者，「TiO2+ZrO2」是指TiO2的含量與ZrO2的含量的合量。 TiO 2 +ZrO 2 is a component that effectively increases the refractive index without increasing the cost of the batch. However, when the content of TiO 2 +ZrO 2 is increased, the devitrification resistance is liable to lower. Therefore, the content of TiO 2 +ZrO 2 is preferably from 1% to 15%, from 2% to 14%, from 3% to 11% or from 4% to 8%, particularly preferably from 5% to 7%. In addition, "TiO 2 + ZrO 2 " means the sum of the content of TiO 2 and the content of ZrO 2 .

就耐失透性及折射率的觀點而言，莫耳比TiO2/ZrO2較佳為0.5~10、超過1~5或者1.5~4，尤佳為1.8~3。再者，「莫耳比TiO2/ZrO2」是指TiO2的含量除以ZrO2的含量所得的值。 From the viewpoint of resistance to devitrification and refractive index, the molar ratio of TiO 2 /ZrO 2 is preferably 0.5 to 10, more than 1 to 5 or 1.5 to 4, and particularly preferably 1.8 to 3. Further, "Mo Erbi TiO 2 /ZrO 2 " means a value obtained by dividing the content of TiO 2 by the content of ZrO 2 .

TiO2為有效提高折射率而不會使批料成本高漲的成分。進而，TiO2為容易使耐化學品性降低的成分。然而，若TiO2 的含量變多，則玻璃會著色，或者耐失透性容易降低。由此，TiO2的含量較佳為0%~15%、0.01%~15%、0.1%~15%、1%~12%、2%~10%、3%~9%或者3.5%~8%，尤佳為4%~7%。 TiO 2 is a component that effectively increases the refractive index without increasing the cost of the batch. Further, TiO 2 is a component which tends to lower chemical resistance. However, when the content of TiO 2 is increased, the glass is colored, or the devitrification resistance is liable to lower. Therefore, the content of TiO 2 is preferably 0% to 15%, 0.01% to 15%, 0.1% to 15%, 1% to 12%, 2% to 10%, 3% to 9% or 3.5% to 8%. %, especially good 4%~7%.

ZrO2為有效提高折射率而不會使批料成本高漲的成分。進而，ZrO2為容易使耐化學品性降低的成分。然而，若ZrO2的含量變多，則液相溫度容易降低。由此，ZrO2的含量較佳為0%~10%、0.01%~8%、0.1%~7%、0.5%~6%、0.8%~5%或者1%~4%，尤佳為1.5%~3%。 ZrO 2 is a component that effectively increases the refractive index without increasing the cost of the batch. Further, ZrO 2 is a component which is easy to reduce chemical resistance. However, if the content of ZrO 2 is increased, the liquidus temperature is liable to lower. Therefore, the content of ZrO 2 is preferably 0% to 10%, 0.01% to 8%, 0.1% to 7%, 0.5% to 6%, 0.8% to 5% or 1% to 4%, and particularly preferably 1.5. %~3%.

莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)為0.01~0.40。若莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)過小，則熔解性、折射率容易降低。由此，莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)為0.01以上，較佳為0.05以上、0.06以上、0.07以上或者0.08以上，尤佳為0.09以上。另一方面，若莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)過大，則難以形成玻璃網狀結構，玻璃化變得困難。進而，若莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)過大，則玻璃的黏性會過度降低，因此難以確保高液相溫度。由此，莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)為0.40以下，較佳為0.35以下、0.30以下、0.25以下或者0.23以下，尤佳為0.20以下。 The molar ratio (TiO 2 + 2ZrO 2 ) / (SiO 2 + Al 2 O 3 + B 2 O 3 ) is 0.01 to 0.40. If the molar ratio (TiO 2 + 2ZrO 2 ) / (SiO 2 + Al 2 O 3 + B 2 O 3 ) is too small, the meltability and the refractive index are liable to lower. Therefore, the molar ratio (TiO 2 + 2ZrO 2 ) / (SiO 2 + Al 2 O 3 + B 2 O 3 ) is 0.01 or more, preferably 0.05 or more, 0.06 or more, 0.07 or more, or 0.08 or more, and particularly preferably 0.09 or more. On the other hand, if the molar ratio (TiO 2 + 2ZrO 2 ) / (SiO 2 + Al 2 O 3 + B 2 O 3 ) is too large, it is difficult to form a glass network structure, and it becomes difficult to vitrify. Further, if the molar ratio (TiO 2 + 2ZrO 2 ) / (SiO 2 + Al 2 O 3 + B 2 O 3 ) is too large, the viscosity of the glass is excessively lowered, so that it is difficult to secure a high liquidus temperature. Thus, the molar ratio (TiO 2 + 2ZrO 2 ) / (SiO 2 + Al 2 O 3 + B 2 O 3 ) is 0.40 or less, preferably 0.35 or less, 0.30 or less, 0.25 or less, or 0.23 or less, and particularly preferably 0.20 or less.

SiO2+Al2O3+B2O3的含量較佳為40%~80%。若SiO2+Al2O3+B2O3的含量變少，則難以形成玻璃網狀結構，玻璃化變得困難。而且，若SiO2+Al2O3+B2O3的含量變少，則玻璃的黏性 會過度降低，難以確保高液相黏度。由此，SiO2+Al2O3+B2O3的含量較佳為40%以上、45%以上、48%以上、50%以上、55%以上或者57%以上，尤佳為59%以上。另一方面，若SiO2+Al2O3+B2O3的含量變多，則熔融性、成形性容易降低，而且折射率容易降低。由此，SiO2+Al2O3+B2O3的含量較佳為80%以下、75%以下、70%以下或者65%以下，尤佳為62%以下。 The content of SiO 2 +Al 2 O 3 +B 2 O 3 is preferably from 40% to 80%. When the content of SiO 2 +Al 2 O 3 +B 2 O 3 is small, it is difficult to form a glass network structure, and it becomes difficult to vitrify. Further, when the content of SiO 2 +Al 2 O 3 +B 2 O 3 is small, the viscosity of the glass is excessively lowered, and it is difficult to ensure high liquid viscosity. Therefore, the content of SiO 2 +Al 2 O 3 +B 2 O 3 is preferably 40% or more, 45% or more, 48% or more, 50% or more, 55% or more, or 57% or more, and particularly preferably 59% or more. . On the other hand, when the content of SiO 2 +Al 2 O 3 +B 2 O 3 is increased, the meltability and moldability are liable to lower, and the refractive index is liable to lower. Therefore, the content of SiO 2 +Al 2 O 3 +B 2 O 3 is preferably 80% or less, 75% or less, 70% or less, or 65% or less, and particularly preferably 62% or less.

Al2O3的含量較佳為0%~10%。若Al2O3的含量變多，則於玻璃中容易析出失透結晶，液相黏度容易降低，而且，折射率容易降低。由此，Al2O3的含量較佳為10%以下或者8%以下，尤佳為6%以下。再者，若Al2O3的含量變少，則玻璃組成的平衡性欠缺，玻璃反而容易失透。由此，Al2O3的含量較佳為0.1%以上、0.5%以上、1%以上、2%以上或者3%以上，尤佳為4%以上。 The content of Al 2 O 3 is preferably from 0% to 10%. When the content of Al 2 O 3 is increased, devitrified crystals are easily precipitated in the glass, the liquidus viscosity is liable to lower, and the refractive index is liable to lower. Therefore, the content of Al 2 O 3 is preferably 10% or less or 8% or less, and particularly preferably 6% or less. Further, when the content of Al 2 O 3 is small, the balance of the glass composition is insufficient, and the glass is easily devitrified. Therefore, the content of Al 2 O 3 is preferably 0.1% or more, 0.5% or more, 1% or more, 2% or more, or 3% or more, and particularly preferably 4% or more.

為了兼具耐化學品性與耐失透性，莫耳比B2O3/TiO2較佳為0.5~5.5、0.8~4或者1~3，尤佳為1.2~2.5。再者，「莫耳比B2O3/TiO2」是指B2O3的含量除以TiO2的含量所得的值。 In order to have both chemical resistance and devitrification resistance, the molar ratio of B 2 O 3 /TiO 2 is preferably 0.5 to 5.5, 0.8 to 4 or 1 to 3, and particularly preferably 1.2 to 2.5. Further, "mol ratio B 2 O 3 /TiO 2 " means a value obtained by dividing the content of B 2 O 3 by the content of TiO 2 .

B2O3的含量較佳為0%~15%。若B2O3的含量變多，則折射率、楊氏模量容易降低。由此，B2O3的含量較佳為15%以下、12%以下、10%以下或者8%以下，尤佳為6%以下。再者，若B2O3的含量變少，則液相溫度容易降低。由此，B2O3的含量較佳為0.1%以上、1%以上、2%以上、3%以上或者4%以上，尤佳為5%以上。 The content of B 2 O 3 is preferably from 0% to 15%. When the content of B 2 O 3 is increased, the refractive index and the Young's modulus are liable to lower. Therefore, the content of B 2 O 3 is preferably 15% or less, 12% or less, 10% or less, or 8% or less, and particularly preferably 6% or less. Further, when the content of B 2 O 3 is small, the liquidus temperature is liable to lower. Therefore, the content of B 2 O 3 is preferably 0.1% or more, 1% or more, 2% or more, 3% or more, or 4% or more, and particularly preferably 5% or more.

除所述成分以外，例如亦可添加以下成分。 In addition to the above components, for example, the following components may be added.

Li2O+Na2O+K2O為使玻璃的黏性降低的成分，而且為調 整熱膨脹係數的成分，但若大量導入，則玻璃的黏性會過度降低，難以確保高液相黏度。而且，視用途需要於玻璃的表面形成SiO2膜等鈍化膜。由此，Li2O+Na2O+K2O的含量較佳為15%以下、10%以下、5%以下、2%以下或者1%以下，尤佳為未滿0.5%，理想的是實質上不含Li2O+Na2O+K2O。另外，Li2O、Na2O及K2O各自的含量較佳為10%以下、8%以下、5%以下、2%以下或者1%以下，尤佳為0.5%以下，理想的是實質上不含Li2O、Na2O及K2O。再者，「Li2O+Na2O+K2O」是指Li2O、Na2O以及K2O的合量。 Li 2 O+Na 2 O+K 2 O is a component that lowers the viscosity of the glass and is a component that adjusts the coefficient of thermal expansion. However, when introduced in a large amount, the viscosity of the glass is excessively lowered, and it is difficult to ensure high liquid viscosity. Further, it is necessary to form a passivation film such as a SiO 2 film on the surface of the glass depending on the application. Therefore, the content of Li 2 O+Na 2 O+K 2 O is preferably 15% or less, 10% or less, 5% or less, 2% or less or 1% or less, and particularly preferably less than 0.5%, preferably It is substantially free of Li 2 O+Na 2 O+K 2 O. Further, the content of each of Li 2 O, Na 2 O and K 2 O is preferably 10% or less, 8% or less, 5% or less, 2% or less or 1% or less, and particularly preferably 0.5% or less, and is preferably substantially Li 2 O, Na 2 O and K 2 O are not contained above. In addition, "Li 2 O+Na 2 O+K 2 O" means the total amount of Li 2 O, Na 2 O, and K 2 O.

就折射率及耐失透性的觀點而言，MgO+CaO+SrO+BaO較佳為19%~35%，21%~33%或者24%~31%，尤佳為25%~29%。再者，「MgO+CaO+SrO+BaO」為MgO、CaO、SrO以及BaO的合量。 From the viewpoint of refractive index and resistance to devitrification, MgO+CaO+SrO+BaO is preferably 19% to 35%, 21% to 33% or 24% to 31%, and particularly preferably 25% to 29%. Further, "MgO+CaO+SrO+BaO" is a combination of MgO, CaO, SrO, and BaO.

MgO為提高楊氏模量的成分，且為使高溫黏度降低的成分，但若大量含有MgO，則折射率容易降低，或者液相溫度上升、耐失透性容易降低，或者密度、熱膨脹係數容易變高。由此，MgO的含量較佳為10%以下、7%以下、5%以下、3%以下或者2%以下，尤佳為1%以下。 MgO is a component that increases the Young's modulus and is a component that lowers the high-temperature viscosity. However, if a large amount of MgO is contained, the refractive index is likely to be lowered, or the liquidus temperature is increased, the devitrification resistance is likely to be lowered, or the density and thermal expansion coefficient are easy. Becomes high. Therefore, the content of MgO is preferably 10% or less, 7% or less, 5% or less, 3% or less, or 2% or less, and particularly preferably 1% or less.

若CaO的含量變多，則密度、熱膨脹係數容易變高，且若其含量過剩，則玻璃組成的平衡性欠缺，耐失透性容易降低。由此，CaO的含量較佳為15%以下、12%以下、10%以下、8%以下、7%以下或者6%以下，尤佳為5%以下。再者，若CaO的含量變少，則折射率、熔融性、楊氏模量容易降低。由此，CaO的含 量較佳為0.1%以上、0.5%以上、1%以上、2%以上、2.5%以上、3%以上或者3.5%以上，尤佳為4%以上。 When the content of CaO is increased, the density and thermal expansion coefficient tend to be high, and if the content is excessive, the balance of the glass composition is insufficient, and the devitrification resistance is likely to be lowered. Therefore, the content of CaO is preferably 15% or less, 12% or less, 10% or less, 8% or less, 7% or less, or 6% or less, and particularly preferably 5% or less. Further, when the content of CaO is small, the refractive index, the meltability, and the Young's modulus are liable to lower. Thus, the content of CaO The amount is preferably 0.1% or more, 0.5% or more, 1% or more, 2% or more, 2.5% or more, 3% or more, or 3.5% or more, and particularly preferably 4% or more.

若SrO的含量變多，則折射率變高，但密度、熱膨脹係數亦容易變高，且若其含量過剩，則玻璃組成的平衡性欠缺，耐失透性容易降低。由此，SrO的含量較佳為15%以下、12%以下、11%以下或者10%以下，尤佳為9%以下。再者，若SrO的含量變少，則折射率、熔融性容易降低。由此，SrO的含量較佳為0.1%以上、1%以上、3%以上、5%以上或者6%以上，尤佳為7%以上。 When the content of SrO is increased, the refractive index is increased, but the density and thermal expansion coefficient are also likely to be high. If the content is excessive, the balance of the glass composition is insufficient, and the devitrification resistance is likely to be lowered. Therefore, the content of SrO is preferably 15% or less, 12% or less, 11% or less, or 10% or less, and particularly preferably 9% or less. Further, when the content of SrO is small, the refractive index and the meltability are liable to lower. Therefore, the content of SrO is preferably 0.1% or more, 1% or more, 3% or more, 5% or more, or 6% or more, and particularly preferably 7% or more.

於鹼土金屬氧化物中，BaO為提高折射率而不會使玻璃的黏性極端降低的成分。然而，若BaO的含量變多，則折射率、密度、熱膨脹係數容易變高，而且液相黏度容易降低，且若其含量過剩，則玻璃組成的平衡性欠缺，耐失透性容易降低。由此，BaO的含量較佳為20%以下、18%以下、17%以下或者16%以下，尤佳為15%以下。然而，若BaO的含量變少，則難以獲得所期望的折射率，並且難以確保高液相黏度。由此，BaO的含量較佳為1%以上、3%以上、5%以上、8%以上、10%以上、12%以上、13%以上或者13.5%以上，尤佳為14%以上。 Among the alkaline earth metal oxides, BaO is a component which increases the refractive index without extremely lowering the viscosity of the glass. However, when the content of BaO is increased, the refractive index, density, and thermal expansion coefficient tend to be high, and the liquidus viscosity is liable to lower. If the content is excessive, the balance of the glass composition is insufficient, and the devitrification resistance is liable to lower. Therefore, the content of BaO is preferably 20% or less, 18% or less, 17% or less, or 16% or less, and particularly preferably 15% or less. However, if the content of BaO is small, it is difficult to obtain a desired refractive index, and it is difficult to secure a high liquid phase viscosity. Therefore, the content of BaO is preferably 1% or more, 3% or more, 5% or more, 8% or more, 10% or more, 12% or more, 13% or more, or 13.5% or more, and particularly preferably 14% or more.

就確保高液相黏度的觀點而言，B2O3+ZnO的含量較佳為0.1%~20%、0.5%~18%、1%~15%、2%~12%、3%~10%或者3.5%~9%，尤佳為4%~8%。再者，「B2O3+ZnO」為B2O3及ZnO的合量。 From the viewpoint of ensuring high liquid viscosity, the content of B 2 O 3 + ZnO is preferably 0.1% to 20%, 0.5% to 18%, 1% to 15%, 2% to 12%, and 3% to 10%. % or 3.5% to 9%, especially preferably 4% to 8%. Further, "B 2 O 3 +ZnO" is a combination of B 2 O 3 and ZnO.

為了兼具折射率及耐失透性，莫耳比ZnO/B2O3較佳為 0.2~2、0.3~1.5、0.35~1或者0.4~0.8，尤佳為0.45~0.6。再者，「莫耳比ZnO/B2O3」是指ZnO的含量除以B2O3的含量所得的值。 In order to have both a refractive index and a devitrification resistance, the molar ratio of ZnO/B 2 O 3 is preferably 0.2 to 2, 0.3 to 1.5, 0.35 to 1 or 0.4 to 0.8, and particularly preferably 0.45 to 0.6. Further, "Mo Erby ZnO/B 2 O 3 " means a value obtained by dividing the content of ZnO by the content of B 2 O 3 .

若ZnO的含量變多，則密度、熱膨脹係數容易變高，並且玻璃組成的平衡性欠缺、耐失透性降低，或者高溫黏性過度降低而難以確保高液相黏度。由此，ZnO的含量較佳為15%以下、10%以下、6%以下或者5%以下，尤佳為4%以下。然而，若ZnO的含量過少，則耐失透性降低，難以確保高液相黏度。由此，ZnO的含量較佳為0.1%以上、0.5%以上、1%以上、超過1%、1.5%以上、2%以上或者2.5%以上，尤佳為3%以上。再者，於優先使密度、熱膨脹係數降低的情況下，ZnO的含量較佳為2%以下、1%以下或者0.5%以下，尤佳為0.1%以下。 When the content of ZnO is increased, the density and the coefficient of thermal expansion are likely to be high, and the balance of the glass composition is insufficient, the devitrification resistance is lowered, or the high-temperature viscosity is excessively lowered, and it is difficult to ensure high liquid viscosity. Therefore, the content of ZnO is preferably 15% or less, 10% or less, 6% or less, or 5% or less, and particularly preferably 4% or less. However, when the content of ZnO is too small, the devitrification resistance is lowered, and it is difficult to ensure high liquid viscosity. Therefore, the content of ZnO is preferably 0.1% or more, 0.5% or more, 1% or more, more than 1%, 1.5% or more, 2% or more, or 2.5% or more, and particularly preferably 3% or more. Further, when the density and the thermal expansion coefficient are preferably lowered, the content of ZnO is preferably 2% or less, 1% or less, or 0.5% or less, and particularly preferably 0.1% or less.

作為澄清劑，可添加0%~3%的選自As2O3、Sb2O3、CeO2、SnO2、F、Cl、SO3的群組中的一種或兩種以上。其中，就環境觀點而言，較佳為實質上不含As2O3及F，尤其是As2O3。作為澄清劑，尤佳為Sb2O3、SnO2、SO3及Cl。Sb2O3的含量較佳為0%~1%或者0.01%~0.5%，尤佳為0.05%~0.4%。SnO2的含量較佳為0%~1%或者0.01%~0.5%，尤佳為0.05%~0.4%。而且，SnO2+SO3+Cl的含量較佳為0%~1%、0.001%~1%或者0.01%~0.5%，尤佳為0.01%~0.3%。此處，「SnO2+SO3+Cl」是指SnO2、SO3及Cl的合量。 As the clarifying agent, one or two or more selected from the group consisting of As 2 O 3 , Sb 2 O 3 , CeO 2 , SnO 2 , F, Cl, and SO 3 may be added in an amount of 0% to 3%. Among them, from the viewpoint of the environment, it is preferable to contain substantially no As 2 O 3 and F, especially As 2 O 3 . As the clarifying agent, Sb 2 O 3 , SnO 2 , SO 3 and Cl are particularly preferable. The content of Sb 2 O 3 is preferably from 0% to 1% or from 0.01% to 0.5%, particularly preferably from 0.05% to 0.4%. The content of SnO 2 is preferably from 0% to 1% or from 0.01% to 0.5%, particularly preferably from 0.05% to 0.4%. Further, the content of SnO 2 +SO 3 +Cl is preferably from 0% to 1%, from 0.001% to 1% or from 0.01% to 0.5%, particularly preferably from 0.01% to 0.3%. Here, "SnO 2 +SO 3 +Cl" means a combination of SnO 2 , SO 3 and Cl.

PbO為使高溫黏性降低的成分，但就環境觀點而言，較 佳為實質上不含PbO。 PbO is a component that lowers the viscosity at high temperatures, but from an environmental point of view, Jia is essentially free of PbO.

Bi2O3+La2O3+Gd2O3+Nb2O5+Ta2O5+WO3雖為提高折射率的成分，但會提高批料成本。由此，Bi2O3+La2O3+Gd2O3+Nb2O5+Ta2O5+WO3的含量較佳為10%以下、8%以下、6%以下、3%以下、2%以下、1.5%以下或者1%以下，尤佳為未滿1%，理想的是實質上不含Bi2O3+La2O3+Gd2O3+Nb2O5+Ta2O5+WO3。再者，Bi2O3、La2O3、Gd2O3、Nb2O5、Ta2O5、WO3各自的含量較佳為8%以下、6%以下、3%以下、2%以下、1.5%以下或者1%以下，尤佳為未滿1%，理想的是實質上不含Bi2O3、La2O3、Gd2O3、Nb2O5、Ta2O5、WO3。 Bi 2 O 3 +La 2 O 3 +Gd 2 O 3 +Nb 2 O 5 +Ta 2 O 5 +WO 3 is a component for increasing the refractive index, but it increases the batch cost. Therefore, the content of Bi 2 O 3 +La 2 O 3 +Gd 2 O 3 +Nb 2 O 5 +Ta 2 O 5 +WO 3 is preferably 10% or less, 8% or less, 6% or less, or 3% or less. 2% or less, 1.5% or less, or 1% or less, and particularly preferably less than 1%, desirably substantially not containing Bi 2 O 3 + La 2 O 3 + Gd 2 O 3 + Nb 2 O 5 + Ta 2 O 5 +WO 3 . Further, the content of each of Bi 2 O 3 , La 2 O 3 , Gd 2 O 3 , Nb 2 O 5 , Ta 2 O 5 , and WO 3 is preferably 8% or less, 6% or less, 3% or less, and 2%. Hereinafter, it is 1.5% or less or 1% or less, and particularly preferably less than 1%, and it is preferable that substantially no Bi 2 O 3 , La 2 O 3 , Gd 2 O 3 , Nb 2 O 5 , Ta 2 O 5 , WO 3 .

除所述成分以外，亦可添加其他成分。其添加量較佳為5%以下，尤其是3%以下。 In addition to the ingredients, other ingredients may be added. The amount thereof to be added is preferably 5% or less, particularly 3% or less.

本發明的玻璃較佳為平板形狀，板厚較佳為1.5mm以下、1.3mm以下、1.1mm以下、0.8mm以下、0.6mm以下、0.5mm以下、0.3mm以下或者0.2mm以下，尤佳為0.1mm以下。板厚越小，可撓性越高，從而越容易製作設計性優異的照明裝置，但若板厚變得極小，則玻璃容易破損。由此，板厚較佳為10μm以上，尤佳為30μm以上。 The glass of the present invention preferably has a flat plate shape, and the plate thickness is preferably 1.5 mm or less, 1.3 mm or less, 1.1 mm or less, 0.8 mm or less, 0.6 mm or less, 0.5 mm or less, 0.3 mm or less, or 0.2 mm or less, and particularly preferably 0.1mm or less. The smaller the thickness, the higher the flexibility, and the easier it is to produce an illumination device having excellent design properties. However, if the thickness is extremely small, the glass is easily broken. Therefore, the thickness of the sheet is preferably 10 μm or more, and more preferably 30 μm or more.

本發明的玻璃較佳為具有以下特性。 The glass of the present invention preferably has the following characteristics.

折射率nd為1.60以上，較佳為1.61以上、1.62以上、1.63以上或者1.64以上。若折射率nd未滿1.60，則因ITO-玻璃界面的反射，光的導出效率容易降低。另一方面，若折射率nd變高， 則玻璃組成的平衡性欠缺，耐失透性容易降低。而且，若折射率nd變得極高，則空氣-玻璃界面上的反射率變高，即便對玻璃表面實施粗糙面化處理，亦難以提高光的導出效率。再者，若於玻璃組成中大量導入重金屬，則雖可於確保耐失透性的基礎上提高折射率nd，但此時，批料成本會高漲。由此，折射率nd為1.80以下，較佳為1.75以下、1.70以下或者1.68以下，尤佳為1.66以下。 The refractive index n d is 1.60 or more, preferably 1.61 or more, 1.62 or more, 1.63 or more, or 1.64 or more. When the refractive index n d is less than 1.60, the light extraction efficiency is liable to be lowered due to the reflection at the ITO-glass interface. On the other hand, when the refractive index n d is increased, the balance of the glass composition is insufficient, and the devitrification resistance is liable to lower. Further, when the refractive index n d is extremely high, the reflectance at the air-glass interface becomes high, and even if the surface of the glass is roughened, it is difficult to improve the light extraction efficiency. Further, when a large amount of heavy metal is introduced into the glass composition, the refractive index n d can be improved while ensuring the devitrification resistance, but at this time, the batch cost is high. Therefore, the refractive index n d is 1.80 or less, preferably 1.75 or less, 1.70 or less, or 1.68 or less, and particularly preferably 1.66 or less.

密度較佳為5.0g/cm3以下、4.8g/cm3以下、4.5g/cm3以下、4.3g/cm3以下、3.7g/cm3以下、3.5g/cm3以下或者3.45g/cm3以下，尤佳為3.4g/cm3以下。若如此，則可使裝置輕量化。再者，「密度」可藉由周知的阿基米德(Archimedes)法測定。 The density is preferably 5.0 g/cm 3 or less, 4.8 g/cm 3 or less, 4.5 g/cm 3 or less, 4.3 g/cm 3 or less, 3.7 g/cm 3 or less, 3.5 g/cm 3 or less, or 3.45 g/cm. 3 or less is particularly preferably 3.4 g/cm 3 or less. If so, the device can be made lighter. Further, "density" can be measured by the well-known Archimedes method.

30℃~380℃下的熱膨脹係數較佳為30×10-7/℃~100×10-7/℃、40×10-7/℃~90×10-7/℃、60×10-7/℃~85×10-7/℃或者65×10-7/℃~80×10-7/℃，尤佳為67×10-7/℃~77×10-7/℃。近年來，於有機EL照明、有機EL顯示器等有機EL裝置及色素增感型太陽電池中，就提高設計要素的觀點而言，有時對玻璃板要求可撓性。為了提高可撓性，需要減小玻璃板的厚度，但此時，若玻璃板與ITO、氟摻雜錫氧化物(Fluorine-doped Tin Oxide，FTO)等透明導電膜之間熱膨脹係數變得不匹配，則玻璃板容易翹曲。因此，若將30℃~380℃下的熱膨脹係數設為所述範圍，則容易防止此種事態。再者，「30℃~380℃下的熱膨脹係數」可利用膨脹計(dilatometer)等測定。 The coefficient of thermal expansion at 30 ° C to 380 ° C is preferably 30 × 10 -7 / ° C ~ 100 × 10 -7 / ° C, 40 × 10 -7 / ° C ~ 90 × 10 -7 / ° C, 60 × 10 -7 / °C~85×10 -7 /°C or 65×10 -7 /°C~80×10 -7 /°C, especially preferably 67×10 -7 /°C~77×10 -7 /°C. In recent years, in an organic EL device such as an organic EL illumination or an organic EL display, and a dye-sensitized solar cell, flexibility is required for a glass plate from the viewpoint of improving design factors. In order to increase the flexibility, it is necessary to reduce the thickness of the glass plate. However, at this time, if the glass plate is not thermally expanded, the thermal expansion coefficient between the transparent conductive film such as ITO or Fluorine-doped Tin Oxide (FTO) becomes Matching, the glass plate is easily warped. Therefore, when the thermal expansion coefficient at 30 ° C to 380 ° C is set to the above range, it is easy to prevent such a situation. In addition, "the coefficient of thermal expansion at 30 ° C to 380 ° C" can be measured by a dilatometer or the like.

應變點較佳為500℃以上、550℃以上、600℃以上、620℃ 以上、630℃以上、640℃以上、650℃以上、660℃以上、670℃以上、680℃以上或者690℃以上，尤佳為700℃~800℃。若如此，則玻璃板不易因裝置的製造步驟中的高溫熱處理而進行熱收縮。 The strain point is preferably 500 ° C or higher, 550 ° C or higher, 600 ° C or higher, and 620 ° C. The above is 630 ° C or higher, 640 ° C or higher, 650 ° C or higher, 660 ° C or higher, 670 ° C or higher, 680 ° C or higher, or 690 ° C or higher, and particularly preferably 700 ° C to 800 ° C. If so, the glass sheet is not easily heat-shrinked by the high-temperature heat treatment in the manufacturing process of the apparatus.

102.0dPa．s下的溫度較佳為1200℃以上、1220℃以上、1240℃以上、1250℃以上、1260℃以上、1270℃以上、1280℃以上或者1290℃以上，尤佳為1300℃~1450℃。若如此，則可使成形溫度高溫化，因此容易防止成形時的失透。 10 2.0 dPa. The temperature under s is preferably 1200 ° C or higher, 1220 ° C or higher, 1240 ° C or higher, 1250 ° C or higher, 1260 ° C or higher, 1270 ° C or higher, 1280 ° C or higher, or 1290 ° C or higher, and particularly preferably 1300 ° C to 1450 ° C. If so, the molding temperature can be increased, so that devitrification during molding can be easily prevented.

液相溫度較佳為1150℃以下、1130℃以下、1100℃以下、1050℃以下、1030℃以下、1000℃以下或者990℃以下，尤佳為980℃以下。而且，液相黏度較佳為103.8dPa．s以上、104.0dPa．s以上、104.2dPa．s以上或者104.5dPa．s以上，尤佳為104.6dPa．s以上。若如此，則成形時玻璃不易失透，容易藉由浮式法等成形玻璃板。 The liquidus temperature is preferably 1150 ° C or lower, 1130 ° C or lower, 1100 ° C or lower, 1050 ° C or lower, 1030 ° C or lower, 1000 ° C or lower, or 990 ° C or lower, and particularly preferably 980 ° C or lower. Moreover, the liquid viscosity is preferably 10 3.8 dPa. s above, 10 4.0 dPa. s above, 10 4.2 dPa. s above or 10 4.5 dPa. Above s, especially preferably 10 4.6 dPa. s above. In this case, the glass is less likely to devitrify during molding, and the glass sheet can be easily formed by a floating method or the like.

於50℃的10質量%HCl水溶液中浸漬3小時後的Haze值以厚度0.7mm換算計較佳為3%以下、2%以下、1.5%以下、1%以下、未滿1%、0.7%以下或者0.5%以下，尤佳為未滿0.5%。若於50℃的10質量%HCl水溶液中浸漬3小時後的Haze值過低，則於有機EL裝置的製造步驟中，容易因進行ITO圖案化時所使用的酸或鹼的化學品而於玻璃表面產生白濁或表面粗化。其結果，難以適用於照明裝置等。 The Haze value after immersing in a 10 mass % HCl aqueous solution at 50 ° C for 3 hours is preferably 3% or less, 2% or less, 1.5% or less, 1% or less, less than 1%, 0.7% or less, or the like, in terms of thickness 0.7 mm. Below 0.5%, especially preferably less than 0.5%. When the Haze value after immersing in a 10% by mass aqueous solution of HCl at 50 ° C for 3 hours is too low, in the production step of the organic EL device, it is easy to use the acid or alkali chemical used in the patterning of ITO in the glass. The surface is cloudy or roughened. As a result, it is difficult to apply to a lighting device or the like.

於本發明的玻璃為平板形狀時，較佳為至少其中一個表面未經研磨。玻璃的理論強度本來非常高，但即便為遠低於理論 強度的應力，其導致破壞的情況亦多。其原因在於，於成形後的步驟、例如研磨步驟等中會產生被稱作格利菲裂紋(Griffith flaw)的小的表面缺陷。由此，若未對玻璃表面進行研磨，則不易損害玻璃原本的機械強度，因此不易破壞玻璃板。而且，若未對玻璃表面進行研磨，則可省略研磨步驟，因而可使玻璃板的製造成本低廉化。 When the glass of the present invention is in the form of a flat plate, it is preferred that at least one of the surfaces is not ground. The theoretical strength of glass is very high, but even far below theory The stress of the strength, which causes damage, is also a lot. The reason for this is that a small surface defect called a Griffith flaw occurs in a step after forming, for example, a polishing step or the like. Therefore, if the surface of the glass is not polished, the original mechanical strength of the glass is not easily impaired, so that the glass sheet is not easily broken. Further, if the surface of the glass is not polished, the polishing step can be omitted, so that the production cost of the glass sheet can be reduced.

於本發明的玻璃中，至少其中一個表面(其中，為有效面)的表面粗糙度Ra較佳為10Å以下、5Å以下或者3Å以下，尤佳為2Å以下。若表面粗糙度Ra大於10Å，則形成於該表面的ITO的品質下降，難以獲得均勻的發光。此處，「表面粗糙度Ra」是指利用依據日本工業標準(Japanese Industrial Standards，JIS)B0601：2001的方法進行測定所得的值。 In the glass of the present invention, the surface roughness Ra of at least one of the surfaces (including the effective surface) is preferably 10 Å or less, 5 Å or less, or 3 Å or less, and particularly preferably 2 Å or less. When the surface roughness Ra is more than 10 Å, the quality of ITO formed on the surface is lowered, and it is difficult to obtain uniform light emission. Here, "surface roughness Ra" means a value measured by a method according to Japanese Industrial Standards (JIS) B0601:2001.

本發明的玻璃較佳為對其中一個表面進行粗糙面化處理。粗糙面化處理面的表面粗糙度Ra較佳為10Å以上、20Å以上或者30Å以上，尤佳為50Å以上。若將粗糙面化處理面設為有機EL照明等的與空氣接觸之側，則因粗糙面化處理面成為無反射結構，故有機發光層中產生的光不易返回至有機發光層內，作為其結果，可提高光的導出效率。 The glass of the present invention is preferably subjected to a roughening treatment on one of the surfaces. The surface roughness Ra of the roughened surface is preferably 10 Å or more, 20 Å or more, or 30 Å or more, and more preferably 50 Å or more. When the roughened surface is made to be in contact with air such as an organic EL illumination, since the roughened surface is a non-reflective structure, light generated in the organic light-emitting layer is less likely to return to the organic light-emitting layer. As a result, the light extraction efficiency can be improved.

作為粗糙面化處理的方法，例如較佳為HF蝕刻、噴砂(sand blast)、再壓(repress)等。若如此，則可於其中一個表面上形成準確的無反射結構。關於凹凸形狀，只要一邊考慮折射率一邊調整其間隔與深度即可。 As a method of the roughening treatment, for example, HF etching, sand blasting, repressing, or the like is preferable. If so, an accurate non-reflective structure can be formed on one of the surfaces. Regarding the uneven shape, the interval and depth may be adjusted while considering the refractive index.

本發明的玻璃較佳為藉由大氣壓電漿製程對其中一個表面進行粗糙面化處理。若藉由大氣壓電漿製程進行粗糙面化處理，則針對其中一個表面可形成均勻的粗糙面化處理面，並且可將另一個表面的表面狀態維持為平滑的狀態。另外，作為大氣壓電漿製程的源材(source)，較佳為使用含有F的氣體(例如SF6、CF4)。若如此，則會產生含有HF系氣體的電漿，因此粗糙面化處理的效率提高。 Preferably, the glass of the present invention is subjected to a roughening treatment of one of the surfaces by an atmospheric piezoelectric slurry process. If the roughening treatment is performed by the atmospheric piezoelectric slurry process, a uniform roughened surface can be formed for one surface, and the surface state of the other surface can be maintained in a smooth state. Further, as a source of the atmospheric piezoelectric slurry process, it is preferred to use a gas containing F (for example, SF 6 or CF 4 ). In this case, a plasma containing an HF-based gas is generated, so that the efficiency of the roughening treatment is improved.

再者，於成形時於表面形成無反射結構的情況下，即便不進行粗糙面化處理亦可享有同樣的效果。而且，亦較佳為將具有凹凸形狀(表面粗糙度Ra較佳為10Å以上、20Å以上或者30Å以上，尤佳為50Å以上)的樹脂膜貼附於其中一個表面上。 Further, in the case where a non-reflective structure is formed on the surface during molding, the same effect can be obtained without performing the roughening treatment. Further, it is also preferable to attach a resin film having a concavo-convex shape (surface roughness Ra is preferably 10 Å or more, 20 Å or more, or 30 Å or more, and particularly preferably 50 Å or more) to one surface.

繼而，例示製造本發明的玻璃的方法。首先，以成為所期望的玻璃組成的方式調配玻璃原料來製作玻璃批料。繼而，將該玻璃批料熔融、澄清後成形為所期望的形狀、尤其是平板形狀。然後，加工成所期望的形狀。 Next, a method of producing the glass of the present invention is exemplified. First, a glass batch is prepared by blending a glass raw material in such a manner as to have a desired glass composition. The glass batch is then melted, clarified and shaped into a desired shape, especially a flat plate shape. Then, it is processed into a desired shape.

作為玻璃板的成形方法，可選用各種方法。若藉由浮式法成形玻璃板，則可廉價且大量地製造玻璃板。而且容易實現玻璃板的大型化。 As a method of forming the glass sheet, various methods can be selected. When the glass plate is formed by a floating method, the glass plate can be produced inexpensively and in a large amount. Moreover, it is easy to enlarge the glass plate.

若藉由溢流下拉法成形玻璃板，則因未經研磨而可提高玻璃板的表面品質。而且，容易實現玻璃板的大型化、薄板化。 When the glass sheet is formed by the overflow down-draw method, the surface quality of the glass sheet can be improved without being polished. Further, it is easy to increase the size and thickness of the glass sheet.

若藉由軋平法或上拉法成形玻璃板，則容易抑制成形時的失透。 When the glass plate is formed by the flattening method or the pull-up method, devitrification at the time of molding is easily suppressed.

實施例 Example

以下，基於實施例詳細說明本發明。再者，以下的實施例僅為例示。本發明並不受以下實施例的任何限定。 Hereinafter, the present invention will be described in detail based on examples. Furthermore, the following examples are merely illustrative. The invention is not limited by the following examples.

表1~表7表示本發明的實施例(試樣No.1~No.73)及比較例(試樣No.74)。 Tables 1 to 7 show examples (sample Nos. 1 to 73) and comparative examples (sample No. 74) of the present invention.

首先，以成為表中所記載的玻璃組成的方式調配玻璃原料，然後將所得的玻璃批料供給至玻璃熔融爐，以1400℃~1500℃熔融4小時。繼而，將所得的熔融玻璃流出至碳板上並成形為平板形狀後，進行規定的退火處理。最後，對所得的玻璃板評價各種特性。 First, the glass raw material is blended so as to have the glass composition described in the table, and the obtained glass batch is supplied to a glass melting furnace and melted at 1400 ° C to 1500 ° C for 4 hours. Then, the obtained molten glass is discharged to a carbon plate and formed into a flat plate shape, and then subjected to a predetermined annealing treatment. Finally, various characteristics were evaluated on the obtained glass plate.

密度ρ是藉由周知的阿基米德法所測定的值。 The density ρ is a value measured by a well-known Archimedes method.

熱膨脹係數α是使用膨脹計測定30℃~380℃下的平均熱膨脹係數所得的值。作為測定試樣，使用Φ5mm×20mm的圓柱狀試樣(端面經R加工)。 The coefficient of thermal expansion α is a value obtained by measuring an average coefficient of thermal expansion at 30 ° C to 380 ° C using a dilatometer. As the measurement sample, a cylindrical sample of Φ 5 mm × 20 mm (end surface processed by R) was used.

應變點Ps是基於美國材料與試驗協會(American Society for Testing and Materials，ASTM)C336-71中記載的方法所測定的值。再者，應變點Ps越高，耐熱性越高。 The strain point Ps is a value measured based on the method described in American Society for Testing and Materials (ASTM) C336-71. Furthermore, the higher the strain point Ps, the higher the heat resistance.

軟化點Ta、軟化點Ts是基於ASTM C338-93中記載的方法所測定的值。 The softening point Ta and the softening point Ts are values measured based on the method described in ASTM C338-93.

高溫黏度104.0dPa．s、103.0dPa．s、102.5dPa．s及102.0dPa．s下的溫度是藉由鉑球提拉法所測定的值。再者，該些溫度越低，熔融性、成形性越優異。 High temperature viscosity 10 4.0 dPa. s, 10 3.0 dPa. s, 10 2.5 dPa. s and 10 2.0 dPa. The temperature under s is a value measured by a platinum ball pulling method. Further, the lower the temperatures, the more excellent the meltability and moldability.

液相溫度TL是藉由如下方法所測定的值：將通過標準篩30目(500μm)、且殘留於50目(300μm)的玻璃粉末放入鉑舟中，然後將該鉑舟於溫度梯度爐中保持24小時並測定結晶的析出溫度。另外，液相黏度logηTL是指藉由鉑球提拉法測定液相溫度下的玻璃的黏度所得的值。再者，液相黏度越高且液相溫度越低，耐失透性、成形性越優異。 The liquidus temperature TL is a value measured by a method in which a glass powder passing through a standard sieve of 30 mesh (500 μm) and remaining at 50 mesh (300 μm) is placed in a platinum boat, and then the platinum boat is placed in a temperature gradient furnace. The temperature was maintained for 24 hours and the precipitation temperature of the crystal was measured. Further, the liquid phase viscosity log η TL is a value obtained by measuring the viscosity of the glass at the liquidus temperature by a platinum ball pulling method. Further, the higher the liquidus viscosity and the lower the liquidus temperature, the more excellent the devitrification resistance and the formability.

折射率nd是使用島津製作所公司製造的折射率測定器KPR-2000所測定的值，且是d射線(波長587.6nm)下的測定值。再者，當進行測定時，於製作25mm×25mm×約3mm的長方體試樣後，以如0.1℃/min般的冷卻速度，於(Ta+30℃)~(Ps-50℃) 的溫度區域內進行退火處理，繼而使折射率匹配的浸液浸透至玻璃間。 The refractive index n d is a value measured using a refractive index measuring instrument KPR-2000 manufactured by Shimadzu Corporation, and is a measured value under d-ray (wavelength: 587.6 nm). Further, when measuring, a rectangular parallelepiped sample of 25 mm × 25 mm × about 3 mm is produced, and a temperature region of (Ta + 30 ° C) to (Ps - 50 ° C) is set at a cooling rate of, for example, 0.1 ° C / min. The annealing treatment is carried out, and then the refractive index-matched immersion liquid is impregnated into the glass.

關於耐酸性，是於50℃的10質量%HCl水溶液中浸漬3小時後，將於試樣表面未確認到白濁或表面粗化的情況評價為「○」，將確認到白濁或表面粗化的情況評價為「×」。再者，耐酸性是耐化學品性的指標。 In the case of immersion in a 10% by mass aqueous solution of HCl at 50 ° C for 3 hours, it was evaluated as "○" when no white turbidity or surface roughening was observed on the surface of the sample, and it was confirmed that white turbidity or surface roughening was observed. The evaluation is "X". Furthermore, acid resistance is an indicator of chemical resistance.

Haze值是利用霧度計(日本電飾工業公司製造的霧度計(Haze Meter)NDH-5000)對所述耐酸性試驗後的厚度為0.7mm的試樣進行測定所得的值。 The Haze value is a value obtained by measuring a sample having a thickness of 0.7 mm after the acid resistance test using a haze meter (Haze Meter NDH-5000 manufactured by Nippon Denshi Kogyo Co., Ltd.).

Claims (16)

一種玻璃，其特徵在於：作為玻璃組成，含有57莫耳%~80莫耳%的SiO2+TiO2+ZrO2，莫耳比(TiO2+2ZrO2)/(SiO2+Al2O3+B2O3)為0.01~0.40，且折射率nd為1.60~1.80。 A glass characterized by containing 57 mol% to 80 mol% of SiO 2 +TiO 2 +ZrO 2 as a glass composition, and molar ratio (TiO 2 +2ZrO 2 )/(SiO 2 +Al 2 O 3 +B 2 O 3 ) is 0.01 to 0.40, and the refractive index n d is 1.60 to 1.80. 如申請專利範圍第1項所述的玻璃，其為平板形狀。 The glass according to claim 1, which is in the shape of a flat plate. 如申請專利範圍第1項或第2項所述的玻璃，其於50℃的10質量%HCl水溶液中浸漬3小時後的霧度值以厚度0.7mm換算計為3%以下。 The glass of the first or second aspect of the invention is immersed in a 10% by mass aqueous solution of HCl at 50 ° C for 3 hours, and has a haze value of 3% or less in terms of a thickness of 0.7 mm. 如申請專利範圍第1項至第3項中任一項所述的玻璃，其中ZrO2的含量為0.5莫耳%~3莫耳%。 The glass according to any one of claims 1 to 3, wherein the content of ZrO 2 is from 0.5 mol% to 3 mol%. 如申請專利範圍第1項至第4項中任一項所述的玻璃，其中TiO2的含量為0.01莫耳%~15莫耳%。 The glass according to any one of claims 1 to 4, wherein the content of TiO 2 is from 0.01 mol% to 15 mol%. 如申請專利範圍第1項至第5項中任一項所述的玻璃，其實質上不含PbO，且Bi2O3+La2O3+Gd2O3+Nb2O5+Ta2O5+WO3的含量為10莫耳%以下。 The glass according to any one of claims 1 to 5, which is substantially free of PbO, and Bi 2 O 3 +La 2 O 3 +Gd 2 O 3 +Nb 2 O 5 +Ta 2 The content of O 5 + WO 3 is 10 mol% or less. 如申請專利範圍第1項至第6項中任一項所述的玻璃，其中ZnO的含量為5莫耳%以下。 The glass according to any one of claims 1 to 6, wherein the content of ZnO is 5 mol% or less. 如申請專利範圍第1項至第7項中任一項所述的玻璃，其實質上不含鹼金屬氧化物。 The glass according to any one of claims 1 to 7, which is substantially free of an alkali metal oxide. 如申請專利範圍第1項至第8項中任一項所述的玻璃，其液相黏度為103.8dPa．s以上。 The glass according to any one of claims 1 to 8, which has a liquid viscosity of 10 3.8 dPa. s above. 如申請專利範圍第1項至第9項中任一項所述的玻璃，其 藉由溢流下拉法成形而成。 The glass according to any one of claims 1 to 9, wherein It is formed by an overflow down-draw method. 如申請專利範圍第1項至第9項中任一項所述的玻璃，其藉由浮式法成形而成。 The glass according to any one of claims 1 to 9, which is formed by a floating method. 如申請專利範圍第1項至第9項中任一項所述的玻璃，其藉由軋平法或上拉法成形而成。 The glass according to any one of claims 1 to 9, which is formed by a flattening method or a pull-up method. 一種照明裝置，其特徵在於：具備如申請專利範圍第1項至第12項中任一項所述的玻璃。 A illuminating device, comprising: the glass according to any one of claims 1 to 12. 一種有機電致發光照明，其特徵在於：具備如申請專利範圍第1項至第12項中任一項所述的玻璃。 An organic electroluminescence illumination comprising the glass according to any one of claims 1 to 12. 一種太陽電池，其特徵在於：具備如申請專利範圍第1項至第12項中任一項所述的玻璃。 A solar cell, comprising: the glass according to any one of claims 1 to 12. 一種有機電致發光顯示器，其特徵在於：具備如申請專利範圍第1項至第12項中任一項所述的玻璃。 An organic electroluminescence display comprising the glass according to any one of claims 1 to 12.
TW103141105A 2013-11-27 2014-11-27 Glass, lighting device, organic electroluminescence lighting, solar cell and organic electroluminescence display TW201527251A (en)

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