TW201510094A - Reactive silicone composition, reactive thermoplastic material, cured product, and optical semiconductor device - Google Patents

Reactive silicone composition, reactive thermoplastic material, cured product, and optical semiconductor device Download PDF

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TW201510094A
TW201510094A TW103120372A TW103120372A TW201510094A TW 201510094 A TW201510094 A TW 201510094A TW 103120372 A TW103120372 A TW 103120372A TW 103120372 A TW103120372 A TW 103120372A TW 201510094 A TW201510094 A TW 201510094A
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Ryosuke Yamazaki
Makoto Yoshitake
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Dow Corning Toray Co Ltd
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Abstract

Provided are: a reactive silicon composition which comprises at least (A) an organo polysiloxane having an alkenyl group, (B) an organo polysiloxane having an alkenyl group, (C) an organo polysiloxane having a silicon-bonded hydrogen atom, (D) a hydrosilylation reaction catalyst, (E) a white pigment, (F) spherical silica, nonspherical silica, or glass fiber, and (G) a carboxylic acid or metal salt thereof having ten or more carbon atoms and at least one carbon-carbon double bond per molecule; a reactive thermoplastic thereof, a cured product thereof and a photosemiconductor device having the cured product. The present invention provides: a reactive silicon composition which is capable of forming a reactive thermoplastic; a reactive thermoplastic which temporarily fluidizes when heated, then provides a cured product; a cured product which has small reduction in mechanical strength and less discoloration due to heat and light, a high optical reflectivity, and excellent mold releasability; and a photosemiconductor device which has a high luminous efficiency, less thermal degradation and photodegradation of a light reflection material, and excellent reliability.

Description

反應性聚矽氧組合物、反應性熱塑體、硬化物、及光半導體裝置 Reactive polyoxo composition, reactive thermoplastic, cured product, and optical semiconductor device

本發明係關於一種反應性聚矽氧組合物、反應性熱塑體、硬化物、及光半導體裝置。 The present invention relates to a reactive polysiloxane composition, a reactive thermoplastic, a cured product, and an optical semiconductor device.

藉由矽氫化反應進行硬化之硬化性聚矽氧組合物係用作光電耦合器、發光二極體、固體攝像元件等光半導體裝置中之光半導體元件之保護劑或塗佈劑;此外,用作透鏡成形材料、光反射材料等。其中,作為用作光反射材料之組合物,例如可列舉:光半導體元件收納用安裝封裝用樹脂組合物,其包含具有乙烯基及烯丙基中之任一者及氫原子直接鍵結於矽原子上之結構之熱硬化型加成反應性聚矽氧樹脂、作為硬化觸媒之鉑系觸媒、及白色顏料,亦可含有脫模劑(參照專利文獻1);加成硬化型聚矽氧樹脂組合物,其包含重量平均分子量(Mw)為30,000以上之含乙烯基之有機聚矽氧烷、一分子中具有至少2個與矽鍵結之氫原子之有機氫化聚矽氧烷、白色顏料、除白色顏料以外之無機填充劑、鉑金屬系觸媒及反應控制劑,亦可含有脂肪酸酯、甘油酸酯、硬脂酸鋅等作為內部脫模劑,並且硬化後之可見光平均反射率為80%以上(參照專利文獻2)。 The curable polyelectrolytic composition which is hardened by a hydrogenation reaction is used as a protective agent or coating agent for an optical semiconductor element in an optical semiconductor device such as a photocoupler, a light-emitting diode, or a solid-state imaging device; It is used as a lens forming material, a light reflecting material, or the like. In the composition for use as a light-reflecting material, for example, a resin composition for mounting and encapsulating an optical semiconductor element includes a vinyl group and an allyl group, and a hydrogen atom is directly bonded to the ruthenium. A thermosetting addition-reactive polyfluorene resin having a structure on an atom, a platinum-based catalyst as a curing catalyst, and a white pigment may further contain a release agent (see Patent Document 1); addition-hardening polypene An oxy-resin composition comprising a vinyl group-containing organopolyoxane having a weight average molecular weight (Mw) of 30,000 or more, an organic hydrogenated polyoxyalkylene having at least two hydrogen atoms bonded to a ruthenium in one molecule, and white A pigment, an inorganic filler other than a white pigment, a platinum metal catalyst, and a reaction control agent may further contain a fatty acid ester, a glycerate, a zinc stearate or the like as an internal mold release agent, and the visible light average reflection after hardening The rate is 80% or more (refer to Patent Document 2).

該等組合物於轉移成形、射出成形或壓縮成形時,存在模具填 充性下降,或容易產生孔隙或毛邊,或模具脫模性較差之問題,進而亦存在硬化速度緩慢,成形操作之作業性較差之問題。進而,將該等組合物進行硬化所獲得之硬化物具有由熱或光所引起之變色較少之優點,但存在線膨脹率上升或者高溫下之機械強度較低之問題,或光反射率不充分,由熱或光引起之機械強度之降低較大之問題。 When the compositions are transferred, formed or compressed, there is a mold filling The chargeability is lowered, or pores or burrs are easily generated, or the mold release property is poor, and there is also a problem that the hardening speed is slow and the workability of the forming operation is poor. Further, the cured product obtained by hardening the composition has an advantage of less discoloration caused by heat or light, but has a problem that the linear expansion ratio is increased or the mechanical strength at a high temperature is low, or the light reflectance is not Sufficient, the problem of a large decrease in mechanical strength caused by heat or light.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開2009-021394號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2009-021394

專利文獻2:日本專利特開2011-140550號公報 Patent Document 2: Japanese Patent Laid-Open Publication No. 2011-140550

本發明之目的在於提供一種反應性聚矽氧組合物、反應性熱塑體、硬化物及光半導體裝置,該反應性聚矽氧組合物係可形成反應性熱塑體者,該反應性熱塑體係於加熱後暫時流動化其後提供硬化物者,該硬化物係由熱或光所引起之機械強度下降或變色較少、光反射率較高、模具脫模性優異者,該光半導體裝置係發光效率較高、光反射材之熱劣化或光劣化較少、可靠性優異者。 It is an object of the present invention to provide a reactive polysiloxane composition, a reactive thermoplastic, a cured product, and an optical semiconductor device which can form a reactive thermoplastic, the reactive heat The plastic system is temporarily fluidized after heating to provide a cured product, which is caused by heat or light, which has less mechanical strength or less discoloration, higher light reflectance, and excellent mold release property. The device has high luminous efficiency, less thermal deterioration or photo-degradation of the light-reflecting material, and excellent reliability.

本發明之反應性聚矽氧組合物之特徵在於至少包含:(A)平均單元式:(R1 3SiO1/2)a(R1 2SiO2/2)b(R1SiO3/2)c(SiO4/2)d(R2O1/2)e The reactive polyoxymethylene composition of the present invention is characterized by comprising at least: (A) an average unit formula: (R 1 3 SiO 1/2 ) a (R 1 2 SiO 2/2 ) b (R 1 SiO 3/2 ) c (SiO 4/2 ) d (R 2 O 1/2 ) e

(式中,R1為相同或不同之苯基、碳原子數1~6之烷基或碳原子數2~6之烯基,其中,全部R1之30~80莫耳%為苯基,全部R1之10~20莫耳%為烯基,R2為氫原子或碳原子數1~6之烷基,a、b、c、d及e分別為滿足0≦a≦0.30、0≦b≦0.70、0.3≦c≦0.9、0≦d≦0.20、0≦e≦0.10,且a+b+c+d=1之數) (wherein R 1 is the same or different phenyl group, an alkyl group having 1 to 6 carbon atoms or an alkenyl group having 2 to 6 carbon atoms, wherein 30 to 80 mol% of all R 1 is a phenyl group; All of 10 to 20 mol% of R 1 are alkenyl groups, R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and a, b, c, d and e respectively satisfy 0≦a≦0.30, 0≦. b≦0.70, 0.3≦c≦0.9, 0≦d≦0.20, 0≦e≦0.10, and a+b+c+d=1)

所表示之有機聚矽氧烷 100質量份、(B)通式:R3 3SiO(R3 2SiO)mSiR3 3 100 parts by mass of the organic polyoxane represented, (B) Formula: R 3 3 SiO(R 3 2 SiO) m SiR 3 3

(式中,R3為相同或不同之苯基、碳原子數1~6之烷基或碳原子數2~6之烯基,其中,全部R3之30~70莫耳%為苯基,全部R3之至少1個為烯基,m為10~100之整數) (wherein R 3 is the same or different phenyl group, an alkyl group having 1 to 6 carbon atoms or an alkenyl group having 2 to 6 carbon atoms, wherein 30 to 70 mol% of all R 3 is a phenyl group; At least one of all R 3 is an alkenyl group, and m is an integer from 10 to 100)

所表示之有機聚矽氧烷 0~40質量份、(C)一分子中具有至少2個與矽原子鍵結之氫原子,且與矽原子鍵結之全部有機基之20~70莫耳%為苯基之有機聚矽氧烷{相對於(A)成分與(B)成分中之烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.5~2莫耳之量}、(D)矽氫化反應用觸媒{對於促進(A)成分及(B)成分中之烯基與(C)成分中之與矽原子鍵結之氫原子之矽氫化反應而言充分之量}、(E)白色顏料{相對於(A)成分~(D)成分之合計100質量份為50質量份以上}、(F)非球狀二氧化矽、球狀二氧化矽或玻璃纖維{相對於(A)成分~(D)成分之合計100質量份為100質量份以上}、及(G)一分子中具有至少1個碳-碳雙鍵之碳原子數為10以上之羧酸或其金屬鹽,並且(E)成分及(F)成分之合計含量相對於(A)成分~(D)成分之合計100質量份為400質量份以下,(G)成分之含量相對於(A)成分~(D)成分之合計100質量份為0.01~8質量份。 The organic polyoxane represented by 0 to 40 parts by mass, (C) having at least 2 hydrogen atoms bonded to a ruthenium atom in one molecule, and 20 to 70 mol% of all organic groups bonded to the ruthenium atom It is a total of 1 mole of the phenyl organopolyoxane {relative to the alkenyl group in the component (A) and the component (B), and the hydrogen atom bonded to the ruthenium atom in the component is 0.5 to 2 moles. (1) (D) 触 hydrogenation reaction catalyst {to promote the hydrogenation reaction of the alkenyl group in the (A) component and the (B) component with the hydrogen atom bonded to the ruthenium atom in the component (C) (E) White pigment {50 parts by mass or more based on 100 parts by mass of the components (A) to (D)}, (F) non-spherical cerium oxide, spherical cerium oxide or glass The fiber {100 parts by mass or more based on 100 parts by mass of the components (A) to (D)) and (G) a carboxyl group having 10 or more carbon atoms having at least one carbon-carbon double bond in one molecule. The acid or a metal salt thereof, and the total content of the component (E) and the component (F) is 400 parts by mass or less based on 100 parts by mass of the total of the components (A) to (D), and the content of the component (G) is relative to ( A) 100 parts by mass of the components ~(D) 0.01 to 8 parts by mass.

又,本發明之反應性熱塑體之特徵在於:其係進行上述反應性聚矽氧組合物之矽氫化反應直至轉化率成為70~95%而成。 Further, the reactive thermoplastic of the present invention is characterized in that the hydrogenation reaction of the reactive polyoxosiloxane composition is carried out until the conversion ratio is 70 to 95%.

又,本發明之硬化物之特徵在於:其係藉由將上述反應性熱塑體加熱至100℃以上而獲得,並且於300℃下為固體或黏度為1,000,000 Pa‧s以上,或者特徵在於:其係將上述反應性聚矽氧組合物進行硬化而成。 Further, the cured product of the present invention is characterized in that it is obtained by heating the above-mentioned reactive thermoplastic body to 100 ° C or more, and is solid at 300 ° C or has a viscosity of 1,000,000. Pa‧s or more, or characterized in that it is obtained by hardening the above reactive polyoxo composition.

進而,本發明之光半導體裝置之特徵在於:其係由上述硬化物形成光反射材而成。 Further, the optical semiconductor device of the present invention is characterized in that the light-reflecting material is formed of the cured product.

本發明之反應性聚矽氧組合物之特徵為可形成反應性熱塑體。又,本發明之反應性熱塑體之特徵為於加熱時暫時流動化,其後提供硬化物。又,本發明之硬化物之特徵為由熱或光所引起之機械強度下降或變色較少、光反射率較高、模具脫模性優異。進而,本發明之光半導體裝置之特徵為發光效率較高、光反射材之熱劣化或光劣化較少、可靠性優異。 The reactive polyoxo compositions of the present invention are characterized by the formation of reactive thermoplastics. Further, the reactive thermoplastic of the present invention is characterized in that it is temporarily fluidized upon heating, and thereafter a cured product is provided. Further, the cured product of the present invention is characterized in that the mechanical strength due to heat or light is lowered or the discoloration is small, the light reflectance is high, and the mold release property is excellent. Further, the optical semiconductor device of the present invention is characterized in that the light-emitting efficiency is high, the thermal deterioration of the light-reflecting material or the light deterioration is small, and the reliability is excellent.

1‧‧‧光半導體元件 1‧‧‧Optical semiconductor components

2‧‧‧引線框架 2‧‧‧ lead frame

3‧‧‧引線框架 3‧‧‧ lead frame

4、4'‧‧‧接合線 4, 4'‧‧‧ bonding line

5‧‧‧光反射材 5‧‧‧Light reflective material

6‧‧‧密封材 6‧‧‧ Sealing material

圖1係作為本發明之光半導體裝置之一例的LED之剖面圖。 Fig. 1 is a cross-sectional view showing an LED as an example of the optical semiconductor device of the present invention.

首先,對本發明之反應性聚矽氧組合物進行詳細說明。 First, the reactive polysiloxane composition of the present invention will be described in detail.

(A)成分係本組合物之主成分,且係平均單元式:(R1 3SiO1/2)a(R1 2SiO2/2)b(R1SiO3/2)c(SiO4/2)d(R2O1/2)e The component (A) is the main component of the present composition, and is an average unit formula: (R 1 3 SiO 1/2 ) a (R 1 2 SiO 2/2 ) b (R 1 SiO 3/2 ) c (SiO 4 /2 ) d (R 2 O 1/2 ) e

所表示之有機聚矽氧烷。 The organic polyoxane represented.

式中,R1為相同或不同之苯基、碳原子數1~6之烷基或碳原子數2~6之烯基。作為R1之烷基,可例示甲基、乙基、丙基、丁基、戊基、己基、環戊基、環己基。作為R1之烯基,可例示乙烯基、烯丙基、丁烯基、戊烯基、己烯基。再者,苯基之含量為全部R1之30~80莫耳%之範圍內,較佳為全部R1之60~75莫耳%之範圍內。其原因在於:若苯基之含量為上述範圍之下限以上,則所獲得之反應性熱塑體於室溫下之硬度及高溫下之流動特性良好,又,所獲得之硬化物之機械強度良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化 物於高溫下之硬度良好。又,式中,全部R1內之烯基之含量為10~20莫耳%之範圍內。其原因在於:若烯基之含量為上述範圍之下限以上,則所獲得之硬化物於室溫下之硬度良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物之機械強度良好。 In the formula, R 1 is the same or different phenyl group, an alkyl group having 1 to 6 carbon atoms or an alkenyl group having 2 to 6 carbon atoms. The alkyl group of R 1 may, for example, be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group or a cyclohexyl group. The alkenyl group of R 1 may, for example, be a vinyl group, an allyl group, a butenyl group, a pentenyl group or a hexenyl group. Further, the content of the phenyl group in the range of 1 30 to 80 mole% of all R, 1 is preferably in a range of 60 to 75 mole% of all R. The reason for this is that if the content of the phenyl group is at least the lower limit of the above range, the obtained thermoplastic thermoplastic body has good flow properties at room temperature and high temperature, and the mechanical strength of the obtained cured product is good. On the other hand, if it is below the upper limit of the above range, the hardness of the obtained cured product at a high temperature is good. Further, in the formula, the content of the alkenyl group in all of R 1 is in the range of 10 to 20 mol%. The reason for this is that if the content of the alkenyl group is at least the lower limit of the above range, the hardness of the obtained cured product at room temperature is good, and if it is at most the upper limit of the above range, the obtained cured product is mechanically. Good strength.

又,式中,R2為氫原子或碳原子數1~6之烷基。作為R2之烷基,可例示甲基、乙基、丙基、丁基、戊基、己基。 Further, in the formula, R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. The alkyl group of R 2 may, for example, be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group or a hexyl group.

進而,式中,a係表示通式:R1 3SiO1/2所表示之矽氧烷單元之比例之數,且係滿足0≦a≦0.30之數,較佳為滿足0≦a≦0.25之數。其原因在於:若a為上述範圍之上限以下,則所獲得之硬化物於室溫下之硬度良好。又,式中,b係表示通式:R1 2SiO2/2所表示之矽氧烷單元之比例之數,且係滿足0≦b≦0.70之數,於形成反應性熱塑體之情形時,較佳為滿足0.10≦b≦0.70之數,進而較佳為滿足0.15≦b≦0.60之數。其原因在於:若b為上述範圍之下限以上,則所獲得之反應性熱塑體於室溫下之硬度及高溫下之流動特性良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物於室溫下之硬度良好。又,c係表示通式:R1SiO3/2所表示之矽氧烷單元之比例之數,且係滿足0.3≦c≦0.9之數,較佳為滿足0.35≦c≦0.85之數,更佳為滿足0.40≦c≦0.80之數。其原因在於:若c為上述範圍之下限以上,則所獲得之硬化物於室溫下之硬度良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物之機械強度良好。又,d係表示通式:SiO4/2所表示之矽氧烷單元之比例之數,且係滿足0≦d≦0.20之數,較佳為滿足0≦b≦0.10之數。其原因在於:若d為上述範圍之上限以下,則所獲得之硬化物之機械強度良好。又,e係表示通式:R2O1/2所表示之單元之比例之數,且係滿足0≦e≦0.10之數。其原因在於:若e為上述範圍之上限以下,則所獲得之硬化物於室溫下之硬度良好。再者,式中,a、b、c及d之合計為1。 Further, in the formula, a represents the ratio of the proportion of the oxirane unit represented by the formula: R 1 3 SiO 1/2 , and satisfies the number of 0≦a ≦ 0.30, preferably satisfies 0≦a ≦ 0.25. The number. The reason for this is that if a is at most the upper limit of the above range, the hardness of the obtained cured product at room temperature is good. Further, in the formula, b represents the ratio of the ratio of the oxoxane unit represented by the formula: R 1 2 SiO 2/2 , and satisfies the number of 0≦b ≦ 0.70, in the case of forming a reactive thermoplastic body. Preferably, it satisfies the number of 0.10 ≦ b ≦ 0.70, and further preferably satisfies the number of 0.15 ≦ b ≦ 0.60. The reason for this is that if b is at least the lower limit of the above range, the obtained reactive thermoplastic body has good hardness at room temperature and high flow properties at a high temperature, and if it is at most the upper limit of the above range, The hardened material obtained has a good hardness at room temperature. Further, c is a number representing the ratio of the oxirane unit represented by the formula: R 1 SiO 3/2 , and satisfies the number of 0.3≦c≦0.9, preferably 0.35≦c≦0.85, and more preferably Good to meet the number of 0.40 ≦ c ≦ 0.80. The reason for this is that if c is at least the lower limit of the above range, the obtained cured product has a good hardness at room temperature, and on the other hand, when it is at most the upper limit of the above range, the obtained cured product has good mechanical strength. Further, d is a number indicating the ratio of the oxirane unit represented by the formula: SiO 4/2 , and satisfies the number of 0 ≦ d ≦ 0.20, and preferably satisfies the number of 0 ≦ b ≦ 0.10. The reason for this is that if d is at most the upper limit of the above range, the mechanical strength of the obtained cured product is good. Further, e is a number indicating the ratio of the unit represented by the general formula: R 2 O 1/2 and satisfies the number of 0≦e ≦ 0.10. The reason for this is that if e is at most the upper limit of the above range, the hardness of the obtained cured product at room temperature is good. Further, in the formula, the total of a, b, c, and d is 1.

(A)成分通常係具有分子量分佈者,且係複數種有機聚矽氧烷之混合物。又,(A)成分可為將分別製備之有機聚矽氧烷進行混合而成者,但各有機聚矽氧烷於上述式中,必須為滿足0≦a≦0.30、0≦b≦0.70、0.3≦c≦0.9、0≦d≦0.20、0≦e≦0.10之數。 The component (A) is usually a mixture having a molecular weight distribution and is a mixture of a plurality of organopolyoxanes. Further, the component (A) may be obtained by mixing the organic polysiloxanes prepared separately, but each of the organopolyoxanes in the above formula must satisfy 0≦a≦0.30, 0≦b≦0.70, 0.3≦c≦0.9, 0≦d≦0.20, 0≦e≦0.10.

(B)成分係用以調整本組合物之黏度且調整所獲得之硬化物之硬度及機械強度之任意成分,其係通式:R3 3SiO(R3 2SiO)mSiR3 3 The component (B) is an arbitrary component for adjusting the viscosity of the composition and adjusting the hardness and mechanical strength of the obtained cured product, and is of the formula: R 3 3 SiO(R 3 2 SiO) m SiR 3 3

所表示之有機聚矽氧烷。 The organic polyoxane represented.

式中,R3為相同或不同之苯基、碳原子數1~6之烷基或碳原子數2~6之烯基。作為R3之烷基,可例示甲基、乙基、丙基、丁基、戊基、己基、環戊基、環己基。作為R3之烯基,可例示乙烯基、烯丙基、丁烯基、戊烯基、己烯基。再者,式中,全部R3內之苯基之含量為30~70莫耳%之範圍內,較佳為40~60莫耳%之範圍內。其原因在於:若苯基之含量為上述範圍之下限以上,則所獲得之硬化物之機械強度良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物之硬度良好。又,式中,R3之至少1個為烯基。其原因在於:若具有烯基,則會將本成分引入硬化反應中。 In the formula, R 3 is the same or different phenyl group, an alkyl group having 1 to 6 carbon atoms or an alkenyl group having 2 to 6 carbon atoms. The alkyl group of R 3 may, for example, be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group or a cyclohexyl group. The alkenyl group of R 3 may, for example, be a vinyl group, an allyl group, a butenyl group, a pentenyl group or a hexenyl group. Further, in the formula, the content of the phenyl group in all of R 3 is in the range of 30 to 70 mol%, preferably 40 to 60 mol%. The reason for this is that if the content of the phenyl group is at least the lower limit of the above range, the mechanical strength of the obtained cured product is good, and on the other hand, when the content is less than or equal to the upper limit of the above range, the hardness of the obtained cured product is good. Further, in the formula, at least one of R 3 is an alkenyl group. The reason for this is that if an alkenyl group is present, the component is introduced into the hardening reaction.

又,式中,m為10~100之範圍內之整數,較佳為10~50之範圍內之整數。其原因在於:若m為上述範圍之下限以上,則所獲得之硬化物之機械強度良好,另一方面,若為上述範圍之上限以下,則所獲得之組合物之處理作業性良好。 Further, in the formula, m is an integer in the range of 10 to 100, preferably an integer in the range of 10 to 50. The reason for this is that the mechanical strength of the obtained cured product is good when m is at least the lower limit of the above range, and the treatment workability of the obtained composition is good when the content is at most the upper limit of the above range.

於本組合物中,(B)成分之含量係相對於(A)成分100質量份成為0~40質量份之範圍內之量,較佳為成為0~20質量份之範圍內之量。其原因在於:若(B)成分之含量為上述範圍之上限以下,則所獲得之硬化物之硬度良好。 In the present composition, the content of the component (B) is in the range of 0 to 40 parts by mass based on 100 parts by mass of the component (A), and is preferably in the range of 0 to 20 parts by mass. The reason for this is that if the content of the component (B) is at most the upper limit of the above range, the hardness of the obtained cured product is good.

(C)成分係本組合物之交聯劑,且係一分子中具有至少2個與矽原 子鍵結之氫原子且與矽原子鍵結之全部有機基之20~70莫耳%為苯基的有機聚矽氧烷。(C)成分中之與矽原子鍵結之氫原子於一分子中為至少2個,其原因在於:用以硬化之交聯充分,所獲得之硬化物之硬度良好。又,作為(C)成分中之與矽原子鍵結之有機基,可例示甲基、乙基、丙基、丁基、戊基、己基、庚基、環戊基、環己基、環庚基等烷基;苯基、甲苯基、二甲苯基等芳基;苄基、苯乙基等芳烷基等不具有脂肪族不飽和鍵之一價烴基,較佳為苯基或碳原子數1~6之烷基。於(C)成分中,與矽原子鍵結之全部有機基之20~70莫耳%為苯基。其原因在於:若苯基之含量為上述範圍之下限以上,則所獲得之硬化物於高溫下之機械強度良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物之機械強度良好。 The component (C) is a crosslinking agent of the composition, and has at least 2 and 矽原 in one molecule An organopolyoxane having a hydrogen atom of a sub-bond and a total of 20 to 70 mol% of the total organic groups bonded to the ruthenium atom is a phenyl group. The hydrogen atom bonded to the ruthenium atom in the component (C) is at least two in one molecule because the crosslinking for hardening is sufficient, and the hardness of the obtained cured product is good. Further, examples of the organic group bonded to the ruthenium atom in the component (C) include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, a cyclopentyl group, a cyclohexyl group, and a cycloheptyl group. An alkyl group; an aryl group such as a phenyl group, a tolyl group or a xylyl group; an aralkyl group such as a benzyl group or a phenethyl group; or a monovalent hydrocarbon group having no aliphatic unsaturated bond, preferably a phenyl group or a carbon atom number of 1; ~6 alkyl. In the component (C), 20 to 70 mol% of all the organic groups bonded to the ruthenium atom are phenyl groups. The reason for this is that if the content of the phenyl group is at least the lower limit of the above range, the mechanical strength of the obtained cured product at a high temperature is good, and on the other hand, if it is at most the upper limit of the above range, the obtained cured product is mechanically obtained. Good strength.

作為此種(C)成分,可例示通式:(HR4 2SiO)2SiR4 2 As such a component (C), a general formula: (HR 4 2 SiO) 2 SiR 4 2 can be exemplified.

所表示之有機三矽氧烷、通式:R5 3SiO(R5 2SiO)nSiR5 3 The organic trioxane represented by the formula: R 5 3 SiO(R 5 2 SiO) n SiR 5 3

所表示之直鏈狀之有機聚矽氧烷、及平均單元式:(R5SiO3/2)p(R5 2SiO2/2)q(R5 3SiO1/2)r(SiO4/2)s(R6O1/2)t The linear organopolyoxane represented by and the average unit formula: (R 5 SiO 3/2 ) p (R 5 2 SiO 2/2 ) q (R 5 3 SiO 1/2 ) r (SiO 4 /2 ) s (R 6 O 1/2 ) t

所表示之支鏈狀之有機聚矽氧烷。 A branched organic polyoxane represented by the group.

式中,R4為相同或不同之苯基或碳原子數1~6之烷基。作為R4之烷基,可例示甲基、乙基、丙基、丁基、戊基、己基、環戊基、環己基。再者,全部R4內之苯基之含量為30~70莫耳%之範圍內。 In the formula, R 4 is the same or different phenyl group or an alkyl group having 1 to 6 carbon atoms. The alkyl group of R 4 may, for example, be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group or a cyclohexyl group. Further, the content of the phenyl group in all of R 4 is in the range of 30 to 70 mol%.

又,式中,R5為相同或不同之氫原子、苯基或碳原子數1~6之烷基,式中,至少2個R5為氫原子。作為R5之烷基,可例示甲基、乙基、丙基、丁基、戊基、己基、環戊基、環己基。再者,除氫原子以外之全部R5內之苯基之含量為30~70莫耳%之範圍內。 Further, in the formula, R 5 is the same or different hydrogen atom, a phenyl group or an alkyl group having 1 to 6 carbon atoms, wherein at least two R 5 are a hydrogen atom. The alkyl group of R 5 may, for example, be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclopentyl group or a cyclohexyl group. Further, the content of the phenyl group in all R 5 except the hydrogen atom is in the range of 30 to 70 mol%.

又,式中,R6為氫原子或碳原子數1~6之烷基。作為R6之烷基, 可例示甲基、乙基、丁基、戊基、己基。 Further, in the formula, R 6 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. The alkyl group of R 6 may, for example, be a methyl group, an ethyl group, a butyl group, a pentyl group or a hexyl group.

又,式中,n為5~1,000之範圍內之整數。 Further, in the formula, n is an integer in the range of 5 to 1,000.

又,式中,p為正數,q為0或正數,r為0或正數,s為0或正數,t為0或正數,且,q/p為0~10之範圍內之數,r/p為0~5之範圍內之數,s/(p+q+r+s)為0~0.3之範圍內之數,t/(p+q+r+s)為0~0.4之範圍內之數。 Further, in the formula, p is a positive number, q is 0 or a positive number, r is 0 or a positive number, s is 0 or a positive number, t is 0 or a positive number, and q/p is a number in the range of 0 to 10, r/ p is the number in the range of 0~5, s/(p+q+r+s) is the number in the range of 0~0.3, and t/(p+q+r+s) is in the range of 0~0.4. The number.

於此種(C)成分中,較佳為其全部為通式:(HR4 2SiO)2SiR4 2 Among such (C) components, it is preferred that all of them are of the formula: (HR 4 2 SiO) 2 SiR 4 2

所表示之有機三矽氧烷,但未經過反應性熱塑體而形成硬化物之情形時,較佳為(C)成分之至少50質量%為上述有機三矽氧烷。進而,為了調整所獲得之硬化物之硬度,亦可適時添加其他有機矽氧烷。 When the organic trioxane is not formed, but the cured thermoplastic is not subjected to a reactive thermoplastic, it is preferred that at least 50% by mass of the component (C) is the above organic trioxane. Further, in order to adjust the hardness of the obtained cured product, other organic decane may be added as appropriate.

於本組合物中,(C)成分之含量係相對於(A)成分與(B)成分中之烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.5~2莫耳之範圍內之量,較佳為成為0.5~1.5莫耳之範圍內之量。其原因在於:若(C)成分之含量為上述範圍內,則所獲得之硬化物之硬度良好。 In the present composition, the content of the component (C) is 1 mole based on the total of the alkenyl groups in the component (A) and the component (B), and the hydrogen atom bonded to the ruthenium atom in the component is 0.5 to 2 The amount within the range of the molar is preferably in the range of 0.5 to 1.5 moles. The reason for this is that if the content of the component (C) is within the above range, the hardness of the obtained cured product is good.

(D)成分係用以促進(A)成分及(B)成分中之烯基與(C)成分中之與矽原子鍵結之氫原子之矽氫化反應的矽氫化反應用觸媒。作為(D)成分,可例示鉑系觸媒、銠系觸媒、鈀系觸媒,由於可顯著促進本組合物之硬化,故而較佳為鉑系觸媒。作為該鉑系觸媒,可例示鉑微粉末、氯鉑酸、氯鉑酸之醇溶液、鉑-烯基矽氧烷錯合物、鉑-烯烴錯合物、鉑-羰基錯合物,尤佳為鉑-烯基矽氧烷錯合物。作為該烯基矽氧烷,可例示1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷、1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷、將該等烯基矽氧烷之一部分甲基取代為乙基及苯基等之烯基矽氧烷、將該等烯基矽氧烷之乙烯基取代為烯 丙基及己烯基等之烯基矽氧烷。尤其是,由於該鉑-烯基矽氧烷錯合物之穩定性良好,故而較佳為1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷。又,由於可提高該鉑-烯基矽氧烷錯合物之穩定性,故而較佳為於該錯合物中添加1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷、1,3-二烯丙基-1,1,3,3-四甲基二矽氧烷、1,3-二乙烯基-1,3-二甲基-1,3-二苯基二矽氧烷、1,3-二乙烯基-1,1,3,3-四苯基二矽氧烷、1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷等烯基矽氧烷或二甲基矽氧烷低聚物等有機矽氧烷低聚物,尤佳為添加烯基矽氧烷。 The component (D) is a catalyst for hydrogenation reaction for promoting the hydrogenation reaction of an alkenyl group in the component (A) and the component (B) with a hydrogen atom bonded to a hydrogen atom bonded to a halogen atom in the component (C). The component (D) is exemplified by a platinum-based catalyst, a ruthenium-based catalyst, and a palladium-based catalyst. Since the curing of the composition can be remarkably promoted, a platinum-based catalyst is preferable. Examples of the platinum-based catalyst include platinum fine powder, chloroplatinic acid, an alcohol solution of chloroplatinic acid, a platinum-alkenyl alkane complex, a platinum-olefin complex, and a platinum-carbonyl complex. Preferably, it is a platinum-alkenyl alkane complex. As the alkenyl alkane, 1,3-divinyl-1,1,3,3-tetramethyldioxane and 1,3,5,7-tetramethyl-1,3 can be exemplified. 5,7-tetravinylcyclotetraoxane, a methyl group of one of the alkenyl alkoxynes being substituted with an alkenyl oxirane such as an ethyl group or a phenyl group, or an ethylene group of the alkenyl oxoxane Substituted as alkene An alkenyl alkane such as propyl or hexenyl. In particular, since the platinum-alkenyl alkoxysilane complex has good stability, it is preferably 1,3-divinyl-1,1,3,3-tetramethyldioxane. Further, since the stability of the platinum-alkenyl alkoxysilane complex can be improved, it is preferred to add 1,3-divinyl-1,1,3,3-tetramethyl to the complex. Dioxane, 1,3-diallyl-1,1,3,3-tetramethyldioxane, 1,3-divinyl-1,3-dimethyl-1,3- Diphenyldioxane, 1,3-divinyl-1,1,3,3-tetraphenyldioxane, 1,3,5,7-tetramethyl-1,3,5, An organic oxirane oligomer such as an alkenyl methoxy oxane such as 7-tetravinylcyclotetraoxane or a dimethyl methoxy siloxane oligomer is more preferably an alkenyl decane.

於本組合物中,(D)成分之含量只要為對於促進(A)成分及(B)成分中之烯基與(C)成分中之與矽原子鍵結之氫原子之矽氫化反應而言充分之量,則無特別限定,較佳為相對於本組合物,本成分中之金屬原子以質量單位計較佳為成為0.01~500ppm之範圍內之量,進而較佳為成為0.01~100ppm之範圍內之量,尤佳為成為0.01~50ppm之範圍內之量。其原因在於:若(D)成分之含量為上述範圍之下限以上,則所獲得之組合物之硬化良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物難以產生著色。 In the present composition, the content of the component (D) is as long as it is a hydrogenation reaction for promoting the hydrogenation of the alkenyl group in the component (A) and the component (B) with the hydrogen atom bonded to the ruthenium atom in the component (C). The amount of the metal atom in the present component is preferably in the range of 0.01 to 500 ppm, and more preferably in the range of 0.01 to 100 ppm, based on the total amount of the composition. The amount inside is particularly preferably in the range of 0.01 to 50 ppm. The reason for this is that if the content of the component (D) is at least the lower limit of the above range, the obtained composition is cured well, and if it is at most the upper limit of the above range, the obtained cured product is less likely to be colored.

(E)成分係用以將本組合物及其硬化物著色為白色而提高光反射率的白色顏料。作為(E)成分,可例示氧化鈦、氧化鋁、氧化鋅、氧化鋯、氧化鎂等金屬氧化物;此外,可例示硫酸鋇、硫化鋅,尤佳為氧化鈦或氧化鋅。 The component (E) is a white pigment for coloring the composition and the cured product thereof to white to increase the light reflectance. The (E) component may, for example, be a metal oxide such as titanium oxide, aluminum oxide, zinc oxide, zirconium oxide or magnesium oxide; and examples thereof include barium sulfate and zinc sulfide, and more preferably titanium oxide or zinc oxide.

(E)成分之平均粒徑或形狀並無限定,平均粒徑較佳為0.05~10.0μm之範圍內,尤佳為0.1~5.0μm之範圍內。關於白色顏料,為了提高與樹脂或無機填充劑之相溶性、分散性,可使用利用矽烷偶合劑、二氧化矽、氧化鋁等進行表面處理而成者。 The average particle diameter or shape of the component (E) is not limited, and the average particle diameter is preferably in the range of 0.05 to 10.0 μm, and particularly preferably in the range of 0.1 to 5.0 μm. The white pigment may be subjected to surface treatment using a decane coupling agent, cerium oxide, aluminum oxide or the like in order to improve compatibility and dispersibility with a resin or an inorganic filler.

於本組合物中,(E)成分之含量相對於(A)成分~(D)成分之合計100質量份為50質量份以上,較佳為60質量份以上。其原因在於:若 (E)成分之含量為上述下限以上,則所獲得之硬化物之光反射率良好。 In the present composition, the content of the component (E) is 50 parts by mass or more, preferably 60 parts by mass or more, based on 100 parts by mass of the total of the components (A) to (D). The reason is: if When the content of the component (E) is at least the above lower limit, the light reflectance of the obtained cured product is good.

(F)成分係用以改善本組合物之由黏度上升引起之作業性下降、減小硬化物之線膨脹率、改善尺寸穩定性的球狀二氧化矽、非球狀二氧化矽或玻璃纖維。作為(F)成分之球狀二氧化矽,可例示乾式二氧化矽、濕式二氧化矽、熔融二氧化矽、爆燃二氧化矽,由於對本組合物之填充性良好,故而較佳為熔融二氧化矽。作為(F)成分之非球狀二氧化矽,可例示石英粉末、玻璃珠,較佳為石英粉末。作為(F)成分之玻璃纖維,可例示短切玻璃纖維、磨碎玻璃纖維,較佳為磨碎玻璃纖維。 The component (F) is used for improving the workability of the composition due to an increase in viscosity, reducing the linear expansion ratio of the cured product, and improving the dimensional stability of the spherical cerium oxide, non-spherical cerium oxide or glass fiber. . Examples of the spherical cerium oxide as the component (F) include dry cerium oxide, wet cerium oxide, molten cerium oxide, and detonation cerium oxide. Since the filling property to the composition is good, it is preferably melted. Yttrium oxide. The non-spherical cerium oxide as the component (F) may, for example, be a quartz powder or a glass beads, and is preferably a quartz powder. The glass fiber as the component (F) may, for example, be chopped glass fibers or ground glass fibers, and is preferably ground glass fibers.

(F)成分之球狀二氧化矽之粒徑並無限定,平均粒徑較佳為0.1~50μm之範圍內,尤佳為0.5~20μm之範圍內。(F)成分之非球狀二氧化矽之平均粒徑並無限定,較佳為0.1~20μm之範圍內,尤佳為0.5~10μm之範圍內。(F)成分之玻璃纖維之形狀並無限定,纖維直徑較佳為1~50μm之範圍內,尤佳為5~20μm之範圍內,又,其纖維長度較佳為5~500μm之範圍內,尤佳為10~300μm之範圍內。 The particle diameter of the spherical cerium oxide of the component (F) is not limited, and the average particle diameter is preferably in the range of 0.1 to 50 μm, particularly preferably in the range of 0.5 to 20 μm. The average particle diameter of the non-spherical cerium oxide of the component (F) is not limited, but is preferably in the range of 0.1 to 20 μm, and more preferably in the range of 0.5 to 10 μm. The shape of the glass fiber of the component (F) is not limited, and the fiber diameter is preferably in the range of 1 to 50 μm, particularly preferably in the range of 5 to 20 μm, and the fiber length is preferably in the range of 5 to 500 μm. Especially preferred is in the range of 10 to 300 μm.

於本組合物中,(F)成分之含量相對於(A)成分~(D)成分之合計100質量份為100質量份以上,較佳為120質量份以上。其原因在於:若(F)成分之含量為上述下限以上,則所獲得之硬化物之線膨脹率較低,尺寸穩定性良好。 In the present composition, the content of the component (F) is 100 parts by mass or more, preferably 120 parts by mass or more, based on 100 parts by mass of the total of the components (A) to (D). The reason for this is that if the content of the component (F) is at least the above lower limit, the obtained cured product has a low coefficient of linear expansion and good dimensional stability.

於本組合物中,(E)成分及(F)成分之合計含量相對於(A)成分~(D)成分之合計100質量份為400質量份以下,較佳為350質量份以下。其原因在於:若(E)成分及(F)成分之合計含量為上述上限以下,則所獲得之組合物之黏度良好。 In the present composition, the total content of the component (E) and the component (F) is 400 parts by mass or less, preferably 350 parts by mass or less, based on 100 parts by mass of the total of the components (A) to (D). The reason for this is that when the total content of the component (E) and the component (F) is at most the above upper limit, the viscosity of the obtained composition is good.

(G)成分係使用本組合物並藉由轉移成形、射出成形或壓縮成形而製作光半導體裝置時,用以提高自模具之硬化物之脫模性的成分, 且係一分子中具有至少1個碳-碳雙鍵之碳原子數為10以上之羧酸或其金屬鹽。作為此種(G)成分,可例示油酸、亞麻油酸、次亞麻油酸、油酸鋅、油酸鋁、油酸鈣。就氧化所致之經年劣化較少之觀點而言,較佳為油酸及其金屬鹽。 (G) component is a component for improving the release property of the cured product from the mold when the optical semiconductor device is produced by transfer molding, injection molding or compression molding using the composition. Further, it is a carboxylic acid having at least one carbon-carbon double bond in one molecule and having a carbon number of 10 or more or a metal salt thereof. Examples of such a component (G) include oleic acid, linoleic acid, linoleic acid, zinc oleate, aluminum oleate, and calcium oleate. From the viewpoint of less deterioration due to oxidation over the years, oleic acid and a metal salt thereof are preferred.

(G)成分之含量相對於(A)成分~(D)成分之合計100質量份為0.01~8質量份之範圍內,尤佳為0.05~5質量份之範圍內。其原因在於:若(G)成分之含量為上述範圍之上限以下,則所獲得之硬化物不會變得太軟,另一方面,若為上述範圍之下限以上,則所獲得之硬化物之脫模性良好。 The content of the component (G) is in the range of 0.01 to 8 parts by mass, more preferably 0.05 to 5 parts by mass, per 100 parts by mass of the total of the components (A) to (D). The reason for this is that if the content of the component (G) is at most the upper limit of the above range, the obtained cured product does not become too soft, and on the other hand, if it is at least the lower limit of the above range, the obtained cured product is The mold release property is good.

於本組合物中,作為用以提高對在硬化中途相接觸之基材之接著性的接著促進劑,較佳為含有(H)平均單元式:(R7 3SiO1/2)f(R7 2SiO2/2)g(R7SiO3/2)h(SiO4/2)i(R8O1/2)j In the present composition, as an adhesion promoter for improving the adhesion to a substrate which is in contact with the middle of hardening, it is preferred to contain (H) an average unit formula: (R 7 3 SiO 1/2 ) f (R) 7 2 SiO 2/2 ) g (R 7 SiO 3/2 ) h (SiO 4/2 ) i (R 8 O 1/2 ) j

所表示之有機聚矽氧烷。 The organic polyoxane represented.

式中,R7為相同或不同之苯基、碳原子數1~6之烷基、碳原子數2~6之烯基或含環氧基之有機基。作為R7之烷基,可例示甲基、乙基、丙基、丁基、戊基、庚基、環戊基、環庚基。作為R7之烯基,可例示乙烯基、烯丙基、丁烯基、戊烯基、己烯基。作為R7之含環氧基之有機基,可例示3-縮水甘油氧基丙基、4-縮水甘油氧基丁基、2-(3,4-環氧環己基)乙基、3-(3,4-環氧環己基)丙基。再者,式中,全部R7內之苯基之含量為15~60莫耳%之範圍內,較佳為20~50莫耳%之範圍內。其原因在於:若苯基之含量為上述範圍之下限以上,則所獲得之硬化物之接著性及反射率良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物之接著性及耐熱性良好。式中,全部R7內之烯基之含量為3~30莫耳%之範圍內,較佳為5~20莫耳%之範圍內。其原因在於:若烯基之含量為上述範圍內,則所獲得之硬化物之接著性良好。又,全部R7內之含環氧基之有機基之含量為5~30莫耳%之 範圍內,較佳為10~20莫耳%之範圍內。其原因在於:若含環氧基之有機基之含量為上述範圍之下限以上,則所獲得之硬化物之接著性良好,另一方面,若為上述範圍之上限以下,則可獲得良好之耐熱性。 In the formula, R 7 is the same or different phenyl group, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms or an organic group having an epoxy group. The alkyl group of R 7 may, for example, be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a heptyl group, a cyclopentyl group or a cycloheptyl group. The alkenyl group of R 7 may, for example, be a vinyl group, an allyl group, a butenyl group, a pentenyl group or a hexenyl group. The epoxy group-containing organic group of R 7 may, for example, be 3-glycidoxypropyl, 4-glycidoxybutyl, 2-(3,4-epoxycyclohexyl)ethyl or 3-( 3,4-epoxycyclohexyl)propyl. Further, in the formula, the content of the phenyl group in all of R 7 is in the range of 15 to 60 mol%, preferably 20 to 50 mol%. The reason for this is that if the content of the phenyl group is at least the lower limit of the above range, the cured material obtained has good adhesion and reflectance, and if it is at most the upper limit of the above range, the cured product obtained is followed. Good properties and heat resistance. In the formula, the content of the alkenyl group in all of R 7 is in the range of 3 to 30 mol%, preferably in the range of 5 to 20 mol%. The reason for this is that if the content of the alkenyl group is within the above range, the cured property of the obtained cured product is good. Further, the content of the epoxy group-containing organic group in all of R 7 is in the range of 5 to 30 mol%, preferably 10 to 20 mol%. The reason for this is that if the content of the epoxy group-containing organic group is at least the lower limit of the above range, the cured material obtained has good adhesion, and if it is at most the upper limit of the above range, good heat resistance can be obtained. Sex.

又,式中,R8為氫原子或碳原子數1~6之烷基。作為R8之烷基,可例示甲基、乙基、丁基、戊基、己基。 Further, in the formula, R 8 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. The alkyl group of R 8 may, for example, be a methyl group, an ethyl group, a butyl group, a pentyl group or a hexyl group.

又,式中,f係表示通式:R7 3SiO1/2所表示之矽氧烷單元之比例之數,且係滿足0≦f≦0.5之數,較佳為滿足0≦f≦0.4之數。其原因在於:若f為上述範圍之上限以下,則所獲得之硬化物之接著性良好。又,式中,g係表示通式:R7 2SiO2/2所表示之矽氧烷單元之比例之數,且係滿足0≦g≦0.9之數,較佳為滿足0≦g≦0.8之數。其原因在於:若g為上述範圍之上限以下,則所獲得之硬化物之接著性良好。又,h係表示通式:R7SiO3/2所表示之矽氧烷單元之比例之數,且係滿足0≦h≦0.7之數,較佳為滿足0≦h≦0.6之數。其原因在於:若h為上述範圍之上限以下,則所獲得之硬化物之接著性良好。又,i係表示通式:SiO4/2所表示之矽氧烷單元之比例之數,且係滿足0≦i≦0.3之數,較佳為滿足0≦i≦0.2之數。其原因在於:若i為上述範圍之上限以下,則所獲得之硬化物之接著性良好。又,j係表示通式:R8O1/2所表示之單元之比例之數,且係滿足0≦j≦0.02之數。其原因在於:若j為上述範圍之上限以下,則本組合物之可使時間及保存穩定性良好。再者,式中,f、g、h及i之合計為1。 Further, in the formula, f is a number representing the ratio of the oxime unit represented by the formula: R 7 3 SiO 1/2 , and is a number satisfying 0≦f≦0.5, preferably satisfying 0≦f≦0.4. The number. The reason for this is that if f is at most the upper limit of the above range, the cured property of the obtained cured product is good. Further, in the formula, g represents the ratio of the ratio of the oxirane unit represented by the formula: R 7 2 SiO 2/2 , and satisfies the number of 0≦g≦0.9, preferably satisfies 0≦g≦0.8. The number. The reason for this is that if g is at most the upper limit of the above range, the cured property of the obtained cured product is good. Further, h is a number representing the ratio of the oxime unit represented by the formula: R 7 SiO 3/2 , and is a number satisfying 0 ≦ h ≦ 0.7, preferably a number satisfying 0 ≦ h ≦ 0.6. The reason for this is that if h is at most the upper limit of the above range, the cured property of the obtained cured product is good. Further, i is a number indicating the ratio of the oxime unit represented by the formula: SiO 4/2 , and satisfies the number of 0≦i≦0.3, and preferably satisfies the number of 0≦i≦0.2. The reason for this is that if i is equal to or less than the upper limit of the above range, the cured property of the obtained cured product is good. Further, j is a number indicating the ratio of the unit represented by the formula: R 8 O 1/2 and satisfies the number of 0≦j≦0.02. The reason for this is that if j is at most the upper limit of the above range, the composition can be made to have good time and storage stability. Furthermore, in the formula, the total of f, g, h, and i is 1.

於本組合物中,(H)成分之含量較佳為相對於(A)成分~(D)成分之合計100質量份成為0.5~10.0質量份之範圍內之量,尤佳為成為1.0~8.0質量份之範圍內之量。其原因在於:若(H)成分之含量為上述範圍之上限以下,則所獲得之硬化物之耐熱性良好,另一方面,若為上述範圍之下限以上,則所獲得之硬化物之接著性良好。 In the present composition, the content of the component (H) is preferably in the range of 0.5 to 10.0 parts by mass based on 100 parts by mass of the total of the components (A) to (D), and more preferably 1.0 to 8.0. The amount within the range of parts by mass. The reason for this is that if the content of the component (H) is at most the upper limit of the above range, the heat resistance of the obtained cured product is good, and on the other hand, if it is at least the lower limit of the above range, the cured product is obtained. good.

於本組合物中,不損害本組合物之硬化性,根據延長常溫下之 可使時間之目的、及提高光半導體裝置用密封材對本組合物之硬化物之接著性之目的,較佳為含有作為第2交聯劑之(I)一分子中具有2個以上之與矽原子鍵結之氫原子且苯基相對於與矽原子鍵結之全部有機基之含量未達20莫耳%的有機聚矽氧烷。 In the present composition, the hardenability of the composition is not impaired, according to the extension at room temperature For the purpose of improving the adhesion of the sealing material for an optical semiconductor device to the cured product of the composition, it is preferable to contain two or more of the molecules (I) as the second crosslinking agent. An atomic bonded hydrogen atom and a phenyl group having an organic polyoxane content of less than 20 mol% relative to the total of the organic groups bonded to the ruthenium atom.

(I)成分中之與矽原子鍵結之氫原子於一分子中為2個以上,其原因在於:用以硬化之交聯充分,所獲得之硬化物之硬度良好。又,作為(I)成分中之與矽原子鍵結之有機基,可例示甲基、乙基、丙基、丁基、戊基、己基、庚基、環戊基、環己基、環庚基等烷基;苯基、甲苯基、二甲苯基等芳基;苄基、苯乙基等芳烷基等不具有脂肪族不飽和鍵之一價烴基,較佳為苯基或碳原子數1~6之烷基。(I)成分中之苯基相對於與矽原子鍵結之全部有機基之含量未達20莫耳%,較佳為10莫耳%以下。又,(I)成分中之與矽原子鍵結之全部有機基之90莫耳%以上較佳為甲基。其原因在於:若苯基之含量未達上述上限,且甲基之含量為上述範圍之下限以上,則所獲得之硬化物對各種基材之接著性良好,又,光半導體裝置用密封材對硬化物之接著性良好。 The hydrogen atom bonded to the ruthenium atom in the component (I) is two or more in one molecule, because the crosslinking for hardening is sufficient, and the hardness of the obtained cured product is good. Further, examples of the organic group bonded to the ruthenium atom in the component (I) include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, a cyclopentyl group, a cyclohexyl group, and a cycloheptyl group. An alkyl group; an aryl group such as a phenyl group, a tolyl group or a xylyl group; an aralkyl group such as a benzyl group or a phenethyl group; or a monovalent hydrocarbon group having no aliphatic unsaturated bond, preferably a phenyl group or a carbon atom number of 1; ~6 alkyl. The content of the phenyl group in the component (I) relative to the total organic group bonded to the ruthenium atom is less than 20 mol%, preferably 10 mol% or less. Further, 90 mol% or more of all the organic groups bonded to the ruthenium atom in the component (I) is preferably a methyl group. The reason for this is that if the content of the phenyl group is less than the above upper limit and the content of the methyl group is at least the lower limit of the above range, the cured product obtained is excellent in adhesion to various substrates, and the sealing material for an optical semiconductor device is used. The cured material has good adhesion.

作為此種(I)成分,可例示式:(MeHSiO)k As such a component (I), a formula: (MeHSiO) k can be exemplified

(式中,Me表示甲基,k為4~8之整數) (wherein Me represents a methyl group and k is an integer from 4 to 8)

所表示之有機聚矽氧烷、通式:Me3SiO(MeHSiO)xSiMe3 The organic polyoxane represented by the formula: Me 3 SiO(MeHSiO) x SiMe 3

Me3SiO(MeHSiO)y(Me2SiO)zSiMe3 Me 3 SiO(MeHSiO) y (Me 2 SiO) z SiMe 3

(式中,Me表示甲基,x為5以上之整數,y、z分別為5以上之整數,但y係與z相同或者其以上) (wherein Me represents a methyl group, x is an integer of 5 or more, and y and z are each an integer of 5 or more, but y is the same as or above z)

所表示之有機聚矽氧烷。 The organic polyoxane represented.

於本組合物中,(I)成分之含量相對於(A)成分與(B)成分中之烯基之合計1莫耳,為本成分中之與矽原子鍵結之氫原子成為0.001~0.20 莫耳之範圍內之量,較佳為成為0.002~0.10莫耳之範圍內之量。其原因在於:若(I)成分之含量為上述範圍內,則組合物在常溫下之可使時間延長,光半導體裝置用密封材對所獲得之硬化物之接著性變得良好,進而將本組合物進行矽氫化反應所獲得之反應性熱塑體於高溫下之流動性變得良好。 In the present composition, the content of the component (I) is 1 mole based on the total of the alkenyl group in the component (A) and the component (B), and the hydrogen atom bonded to the ruthenium atom in the component is 0.001 to 0.20. The amount in the range of the molar is preferably in the range of 0.002 to 0.10 mol. The reason for this is that when the content of the component (I) is within the above range, the composition can be prolonged at a normal temperature, and the sealing material for an optical semiconductor device has good adhesion to the obtained cured product, and further The fluidity of the reactive thermoplastic obtained by the hydrazine hydrogenation reaction of the composition at a high temperature becomes good.

本組合物至少包含上述(A)成分~(G)成分,作為其他任意成分,亦可含有1-乙炔基-1-環己醇、2-甲基-3-丁炔-2-醇、3,5-二甲基-1-己炔-3-醇、2-苯基-3-丁炔-2-醇等炔醇;3-甲基-3-戊烯-1-炔、3,5-二甲基-3-己烯-1-炔等烯炔化合物;1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷、1,3,5,7-四甲基-1,3,5,7-四己烯基環四矽氧烷、苯并三唑等反應抑制劑。該反應抑制劑之含量並無限定,相對於本組合物,以質量單位計較佳為1~5,000ppm之範圍內。 The composition may contain at least the component (A) to the component (G), and may contain, as other optional components, 1-ethynyl-1-cyclohexanol, 2-methyl-3-butyn-2-ol, and 3 , an alkynyl alcohol such as 5-dimethyl-1-hexyn-3-ol, 2-phenyl-3-butyn-2-ol; 3-methyl-3-pentene-1-yne, 3,5 - alkyne compound such as dimethyl-3-hexene-1-yne; 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetraoxane, 1,3 , 5,7-tetramethyl-1,3,5,7-tetrahexenylcyclotetraoxane, benzotriazole and other reaction inhibitors. The content of the reaction inhibitor is not limited, and is preferably in the range of 1 to 5,000 ppm by mass based on the total amount of the composition.

進而,於本組合物中,亦可含有除上述(H)成分以外之接著促進劑。作為此種接著促進劑,可列舉具有三烷氧基矽烷氧基(例如,三甲氧基矽烷氧基、三乙氧基矽烷氧基)或三烷氧基矽烷基烷基(例如,三甲氧基矽烷基乙基、三乙氧基矽烷基乙基)及氫矽烷基或烯基(例如,乙烯基、烯丙基)之有機矽烷,或者矽原子數4~20左右之直鏈狀結構、支鏈狀結構或環狀結構之有機矽氧烷低聚物;具有三烷氧基矽烷氧基或三烷氧基矽烷基烷基及甲基丙烯醯氧基烷基(例如,3-甲基丙烯醯氧基丙基)之有機矽烷,或者矽原子數4~20左右之直鏈狀結構、支鏈狀結構或環狀結構之有機矽氧烷低聚物;具有三烷氧基矽烷氧基或三烷氧基矽烷基烷基及環氧基鍵結烷基(例如,3-縮水甘油氧基丙基、4-縮水甘油氧基丁基、2-(3,4-環氧環己基)乙基、3-(3,4-環氧環己基)丙基)之有機矽烷,或者矽原子數4~20左右之直鏈狀結構、支鏈狀結構或環狀結構之有機矽氧烷低聚物;胺基烷基三烷氧基矽烷與環氧基鍵結烷基三烷氧基矽烷之反應物、含環氧基之聚矽酸乙酯, 具體而言可列舉乙烯基三甲氧基矽烷、烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷、氫化三乙氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷與3-胺基丙基三乙氧基矽烷之反應物、矽烷醇基封阻甲基乙烯基矽氧烷低聚物與3-縮水甘油氧基丙基三甲氧基矽烷之縮合反應物、矽烷醇基封阻甲基乙烯基矽氧烷低聚物與3-甲基丙烯醯氧基丙基三乙氧基矽烷之縮合反應物、三(3-三甲氧基矽烷基丙基)異氰尿酸酯、酸酐。 Further, in the present composition, an adhesion promoter other than the above component (H) may be contained. As such a further promoter, there may be mentioned a trialkoxyquinoloxy group (for example, a trimethoxynonyloxy group, a triethoxysulfonyloxy group) or a trialkoxyphosphonylalkyl group (for example, a trimethoxy group). An organic decane of a decylethyl group, a triethoxy sulfonylethyl group, and a hydroquinoneyl or alkenyl group (for example, a vinyl group, an allyl group), or a linear structure or a branch having a fluorene atom number of about 4 to 20 An organic siloxane oxide having a chain structure or a cyclic structure; having a trialkoxy decyloxy or trialkoxy decylalkyl group and a methacryloxyalkyl group (for example, 3-methyl propylene) An organic decane of methoxypropyl) or an organic oxane oligomer having a linear structure, a branched structure or a cyclic structure of about 4 to 20 fluorene; having a trialkoxy decyloxy group or A trialkoxyalkylalkyl group and an epoxy-bonded alkyl group (for example, 3-glycidoxypropyl, 4-glycidoxybutyl, 2-(3,4-epoxycyclohexyl)B Organo, 3-(3,4-epoxycyclohexyl)propyl) organodecane, or an organic oxane having a linear structure, a branched structure or a cyclic structure of about 4 to 20 fluorene atoms. Copolymer; aminoalkyl trialkoxy silane-bonded epoxy group and an alkyl trialkoxy silane-product of the reaction, ethyl comprising poly silicon epoxy groups, Specific examples thereof include vinyl trimethoxy decane, allyl trimethoxy decane, allyl triethoxy decane, hydrogenated triethoxy decane, 3-glycidoxy propyl trimethoxy decane, and 3 - glycidoxypropyl triethoxy decane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, 3-methyl Reaction of propylene methoxy propyl triethoxy decane, 3-glycidoxy propyl triethoxy decane with 3-aminopropyl triethoxy decane, stanol-based blocked methyl methacrylate Condensation reaction of a base oxyalkylene oligomer with 3-glycidoxypropyltrimethoxydecane, a stanol-based blocked methylvinyloxirane oligomer and 3-methylpropenyloxypropane A condensation reaction product of a triethoxy decane, tris(3-trimethoxydecylpropyl)isocyanurate, or an acid anhydride.

進而,於使本組合物未經過反應性熱塑體而形成硬化物之情形時,為了提高本組合物之處理作業性而調整所獲得之硬化物之硬度,亦可含有與矽原子鍵結之全部有機基之30~60莫耳%為碳原子數2~6之烯基的矽原子數為10以下之有機聚矽氧烷。作為該有機聚矽氧烷中之烯基,可例示乙烯基、烯丙基、丁烯基、戊烯基、己烯基。又,該有機聚矽氧烷中之除烯基以外之與矽原子鍵結之有機基並無特別限定,但可例示甲基、苯基,較佳為甲基。又,與矽原子鍵結之全部有機基之30~60莫耳%為碳原子數2~6之烯基。其原因在於:若烯基之含量為上述範圍之下限以上,則所獲得之硬化物之硬度良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物之機械強度良好。進而,矽原子數為10以下,其原因在於:若矽原子數為10以下,則組合物之黏度良好。 Further, when the composition is not subjected to a reactive thermoplastic to form a cured product, the hardness of the obtained cured product may be adjusted to improve the handling workability of the composition, and may also contain a bond with a ruthenium atom. The organic polysiloxane of 30 to 60 mol% of all the organic groups is an organic polyoxyalkylene having an alkyl group having 2 to 6 carbon atoms and having 10 or less atoms. The alkenyl group in the organopolysiloxane can be exemplified by a vinyl group, an allyl group, a butenyl group, a pentenyl group or a hexenyl group. Further, the organic group to be bonded to the ruthenium atom other than the alkenyl group in the organopolysiloxane is not particularly limited, and a methyl group or a phenyl group is preferable, and a methyl group is preferable. Further, 30 to 60 mol% of all the organic groups bonded to the ruthenium atom are alkenyl groups having 2 to 6 carbon atoms. The reason for this is that the hardness of the cured product obtained is good if the content of the alkenyl group is at least the lower limit of the above range, and the mechanical strength of the obtained cured product is good if the content is less than or equal to the upper limit of the above range. Further, the number of germanium atoms is 10 or less because the viscosity of the composition is good if the number of germanium atoms is 10 or less.

作為此種有機聚矽氧烷,可例示1,3,5,7-四甲基-1,3,5,7-四乙烯基環四矽氧烷、四(二甲基乙烯基矽烷氧基)矽烷、甲基三(二甲基乙烯基矽烷氧基)矽烷及苯基三(二甲基乙烯基矽烷氧基)矽烷。 As such an organic polyoxane, 1,3,5,7-tetramethyl-1,3,5,7-tetravinylcyclotetraoxane and tetrakis(dimethylvinyldecyloxy) can be exemplified. And decane, methyl tris(dimethylvinyl nonyloxy) decane and phenyl tris(dimethylvinyl decyloxy) decane.

該有機聚矽氧烷之含量較佳為相對於(A)成分100質量份成為0~50質量份之範圍內之量,於將本組合物用作液狀之反應性聚矽氧組合 物時,尤佳為成為5~40質量份之範圍內之量。其原因在於:若該有機聚矽氧烷之含量為上述範圍之下限以上,則組合物之黏度良好,另一方面,若為上述範圍之上限以下,則所獲得之硬化物之機械強度良好。 The content of the organopolysiloxane is preferably in the range of 0 to 50 parts by mass based on 100 parts by mass of the component (A), and the present composition is used as a liquid reactive polyoxane combination. In the case of a substance, it is particularly preferable to be in the range of 5 to 40 parts by mass. The reason for this is that if the content of the organopolysiloxane is more than the lower limit of the above range, the viscosity of the composition is good. On the other hand, when the content is less than or equal to the upper limit of the above range, the mechanical strength of the obtained cured product is good.

進而,於本組合物中,只要不損害本發明之目的,作為其他任意成分,亦可含有除球狀二氧化矽、非球狀二氧化矽、玻璃纖維以外之無機填充劑,聚甲基丙烯酸酯樹脂或聚矽氧樹脂等有機樹脂微粉末;苯并三唑、羧基苯并三唑等防腐蝕劑、耐熱劑、阻燃性賦予劑、溶劑等。 Further, in the present composition, as long as the object of the present invention is not impaired, an inorganic filler other than spherical cerium oxide, non-spherical cerium oxide or glass fiber may be contained as the other optional component, and polymethacrylic acid may be contained. An organic resin fine powder such as an ester resin or a polysiloxane resin; an anticorrosive agent such as benzotriazole or carboxybenzotriazole, a heat resistant agent, a flame retardant imparting agent, a solvent, and the like.

本組合物在25℃下之黏度並無特別限定,但獲得反應性熱塑體之情形時,較佳為10,000Pa‧s以下,尤佳為10~5,000Pa‧s之範圍內。其原因在於:若黏度為上述範圍之下限以上,則容易形成所需形狀之反應性熱塑體,另一方面,若為上述範圍之上限以下,則所獲得之組合物之處理作業性良好。 The viscosity of the composition at 25 ° C is not particularly limited, but in the case of obtaining a reactive thermoplastic, it is preferably 10,000 Pa ‧ or less, and particularly preferably 10 to 5,000 Pa ‧ . The reason for this is that when the viscosity is at least the lower limit of the above range, the reactive thermoplastic body having a desired shape is easily formed. On the other hand, when the viscosity is at most the upper limit of the above range, the handling property of the obtained composition is good.

又,於將本組合物用作液狀之反應性聚矽氧組合物之情形時,其於25℃下之黏度較佳為5~200Pa‧s之範圍內,進而較佳為5~120Pa‧s之範圍內,尤佳為10~80Pa‧s之範圍內。其原因在於:若黏度為上述範圍之下限以上,則成形時抑制毛邊產生,另一方面,若為上述範圍之上限以下,則所獲得之組合物之處理作業性良好。 Further, in the case where the composition is used as a liquid reactive polyoxymethylene composition, the viscosity at 25 ° C is preferably in the range of 5 to 200 Pa‧s, more preferably 5 to 120 Pa‧ Within the range of s, it is especially within the range of 10~80Pa‧s. The reason for this is that when the viscosity is at least the lower limit of the above range, the occurrence of burrs is suppressed during molding, and when the viscosity is at most the upper limit of the above range, the handling property of the obtained composition is good.

其次,對本發明之反應性熱塑體進行詳細說明。 Next, the reactive thermoplastic body of the present invention will be described in detail.

本發明之反應性熱塑體係進行上述反應性聚矽氧硬化物之矽氫化反應直至轉化率成為70%~95%而成者。所謂矽氫化之轉化率,係指將進行矽氫化反應之全官能基量中實際引起反應者之比例以百分比表示者,其確認法並無特別限定,例如可使用示差掃描熱量計(DSC),測定反應性聚矽氧組合物與所獲得之反應性熱塑體之反應發熱量,並根據其差異簡單地算出轉化率。反應係藉由室溫或加熱而進 行反應,但為有效獲得反應性熱塑體,較佳為進行加熱。作為該加熱溫度,較佳為50~150℃之範圍內,進而較佳為80~130℃之範圍內。 The reactive thermoplastic system of the present invention is obtained by subjecting the above-mentioned reactive polyanthracene hardened product to a hydrogenation reaction until the conversion ratio is 70% to 95%. The conversion rate of the hydrogenation of the hydrazine is a percentage of the total amount of the functional group which is subjected to the hydrogenation reaction, and the ratio of the actual reaction is expressed by a percentage. The confirmation method is not particularly limited, and for example, a differential scanning calorimeter (DSC) can be used. The reaction calorific value of the reactive polyfluorene composition and the obtained reactive thermoplastic was measured, and the conversion was simply calculated from the difference. The reaction is carried out by room temperature or heating The reaction is carried out, but in order to obtain a reactive thermoplastic body efficiently, it is preferred to carry out heating. The heating temperature is preferably in the range of 50 to 150 ° C, more preferably in the range of 80 to 130 ° C.

本發明之反應性熱塑體較佳為在25℃下為固體或者黏度為1,000,000Pa‧s以上,且在100℃下黏度為100,000Pa‧s以下之液狀者。 The reactive thermoplastic of the present invention is preferably a liquid having a solidity or a viscosity of 1,000,000 Pa ‧ or more at 25 ° C and a viscosity of 100,000 Pa ‧ s or less at 100 ° C.

又,本發明之反應性熱塑體較佳為JIS K 7215-1986「塑料之硬度計硬度試驗方法」所規定之D型硬度計硬度在25℃下為30以上。 Further, the reactive thermoplastic of the present invention is preferably a D-type durometer having a hardness of 30 or more at 25 ° C as defined in JIS K 7215-1986 "Plastic hardness test method for plastics".

此種本發明之反應性熱塑體係於加熱至100℃以上時暫時流動化,其後進行矽氫化反應,而提供硬化物。 Such a reactive thermoplastic system of the present invention is temporarily fluidized when heated to 100 ° C or higher, and thereafter subjected to a hydrazine hydrogenation reaction to provide a cured product.

其次,對本發明之硬化物進行詳細說明。 Next, the cured product of the present invention will be described in detail.

本發明之硬化物係將上述反應性熱塑體進行加熱而進行剩餘之矽氫化反應所獲得者,或者未經過反應性熱塑體,將上述液狀之反應性聚矽氧組合物進行加熱而進行矽氫化反應所獲得者,且於300℃下為固體或者黏度為1,000,000Pa‧s以上。硬化物之硬度並無特別限定,但JIS K 7215-1986「塑料之硬度計硬度試驗方法」所規定之D型硬度計硬度較佳為60以上,進而較佳為65以上,尤佳為70以上。其原因在於:若硬度為上述下限以上,則硬化物之尺寸穩定性提高,難以引起硬化物之變形。 The cured product of the present invention is obtained by heating the reactive thermoplastic body to obtain the remaining hydrogenation reaction, or heating the liquid reactive polyoxymethylene composition without passing through the reactive thermoplastic. The obtained hydrogenation reaction was carried out, and it was solid at 300 ° C or had a viscosity of 1,000,000 Pa ‧ or more. The hardness of the cured product is not particularly limited, but the hardness of the D-type durometer specified in JIS K 7215-1986 "Test method for hardness of plastics" is preferably 60 or more, more preferably 65 or more, and particularly preferably 70 or more. . The reason for this is that if the hardness is at least the above lower limit, the dimensional stability of the cured product is improved, and deformation of the cured product is less likely to occur.

又,本硬化物之反射率並無特別限定,但藉由JIS K 7375:2008「塑料-全光線透過率及全光線反射率之求取方法」所規定之方法進行測定之全光線反射率較佳為75%以上,尤佳為80%以上。 Further, the reflectance of the cured product is not particularly limited, but the total light reflectance measured by the method specified in JIS K 7375:2008 "Plastic-total light transmittance and total light reflectance" is measured. Good is more than 75%, especially better than 80%.

又,本硬化物之線膨脹率並無特別限定,但作為藉由JIS K 7197-1991「利用熱機械分析對塑料之線膨脹率的試驗方法」所規定之方法進行測定之線膨脹率在25~200℃之溫度範圍內之平均值,較佳為200ppm/℃以下,尤佳為150ppm/℃以下。 In addition, the coefficient of linear expansion of the cured product is not particularly limited, but the coefficient of linear expansion measured by a method defined in JIS K 7197-1991 "Testing method for linear expansion ratio of plastic by thermomechanical analysis" is 25 The average value in the temperature range of ~200 ° C is preferably 200 ppm / ° C or less, and particularly preferably 150 ppm / ° C or less.

又,本發明之硬化物較佳為將上述反應性熱塑體或上述反應性 聚矽氧組合物在加熱至100℃以上之金屬模具中進行硬化而成。作為形成本硬化物作為光半導體裝置之反射材之情形時之硬化方法,例如可列舉壓縮成形、轉移成形、射出成形。 Further, the cured product of the present invention preferably has the above reactive thermoplastic or the above reactivity. The polyoxymethylene composition is hardened in a metal mold heated to 100 ° C or higher. Examples of the curing method in the case where the cured product is formed as a reflective material of an optical semiconductor device include compression molding, transfer molding, and injection molding.

其次,對本發明之光半導體裝置進行詳細說明。 Next, the optical semiconductor device of the present invention will be described in detail.

本發明之光半導體裝置之特徵在於:由上述硬化物形成光反射材。作為此種光半導體裝置,可例示發光二極體(LED)。於該光半導體裝置中,光反射材亦作為光半導體裝置之框材(封裝材)而發揮功能。 The optical semiconductor device of the present invention is characterized in that the light-reflecting material is formed of the cured product. As such an optical semiconductor device, a light emitting diode (LED) can be exemplified. In the optical semiconductor device, the light reflecting material also functions as a frame material (packaging material) of the optical semiconductor device.

將作為本半導體裝置之一例的表面安裝型LED之剖面圖示於圖1。於圖1所示之LED中,將光半導體元件1藉由黏晶材而黏晶於引線框架2上,並藉由接合線4、4'打線接合有該光半導體元件1與引線框架2、3。於該光半導體元件1之除上部以外之周圍,具有包含上述硬化物之光反射材5,並由密封材6密封該光反射材5之內側之光半導體元件1。 A cross-sectional view of a surface mount type LED as an example of the semiconductor device is shown in Fig. 1. In the LED shown in FIG. 1, the optical semiconductor element 1 is bonded to the lead frame 2 by a bonding material, and the optical semiconductor element 1 and the lead frame 2 are bonded by bonding wires 4, 4'. 3. A light-reflecting member 5 including the cured product is provided around the upper portion of the optical semiconductor element 1 except for the upper portion, and the optical semiconductor element 1 inside the light-reflecting member 5 is sealed by the sealing member 6.

作為製造圖1所示之表面安裝型LED之方法,可例示包含如下步驟之方法:(1)將本發明之反應性熱塑體藉由轉移成形或壓縮成形而形成與引線框架2、3成為一體之光反射材5;(2)於引線框架2上藉由黏晶材而黏晶光半導體元件1;(3)藉由接合線4、4'打線接合光半導體元件1與引線框架2、3;及,(4)將光半導體元件1密封於密封材6。 As a method of manufacturing the surface mount type LED shown in Fig. 1, a method including the following steps can be exemplified: (1) The reactive thermoplastic body of the present invention is formed by transfer molding or compression molding to form a lead frame 2, 3; (1) bonding the optical semiconductor element 1 to the lead frame 2 by means of a die bonding material; (3) bonding the optical semiconductor element 1 and the lead frames 2, 3 by bonding wires 4, 4' And (4) sealing the optical semiconductor element 1 to the sealing material 6.

[實施例] [Examples]

對本發明之硬化性聚矽氧組合物、反應性熱塑體、硬化物及光半導體裝置,藉由實施例進行詳細說明。再者,式中之Me、Ph、Vi及Ep分別表示甲基、苯基、乙烯基及3-縮水甘油氧基丙基。 The curable polyfluorene oxide composition, the reactive thermoplastic, the cured product, and the optical semiconductor device of the present invention will be described in detail by way of examples. Further, Me, Ph, Vi and Ep in the formula represent a methyl group, a phenyl group, a vinyl group and a 3-glycidoxypropyl group, respectively.

又,反應性熱塑體及硬化物之硬度係利用JIS K 7215-1986「塑料之硬度計硬度試驗方法」所規定之D型硬度計進行測定。 Further, the hardness of the reactive thermoplastic body and the cured product was measured by a D-type hardness tester specified in JIS K 7215-1986 "Testing method for hardness of plastics".

又,硬化物之彎曲強度係藉由JIS K 6911-1995「熱硬化性塑料一 般試驗方法」所規定之方法進行測定。 Moreover, the bending strength of the cured product is by JIS K 6911-1995 "The thermosetting plastic one The method specified in the general test method is measured.

又,硬化物之全光線反射率係藉由JIS K 7375:2008「塑料-全光線透過率及全光線反射率之求取方法」所規定之方法進行測定。 Further, the total light reflectance of the cured product is measured by a method defined in JIS K 7375:2008 "Plastic-total light transmittance and total light reflectance method".

又,硬化物之線膨脹率係藉由JIS K 7197-1991「利用熱機械分析對塑料之線膨脹率的試驗方法」所規定之方法測定在25~200℃之範圍內之平均線膨脹率。 In addition, the linear expansion ratio of the cured product is measured by the method specified in JIS K 7197-1991 "Testing method for linear expansion ratio of plastic by thermomechanical analysis" in the range of 25 to 200 °C.

又,關於本組合物之模具脫模性,使用轉移成形機,在成形溫度120℃、成形時間5分鐘之條件下進行與引線框架之一體成型10次,並藉由確認成型後之光半導體裝置中產生龜裂及自引線框架之剝離等成型不良之次數而進行評價。 In addition, the mold release property of the composition was measured by forming a single body of the lead frame 10 times at a molding temperature of 120 ° C and a molding time of 5 minutes using a transfer molding machine, and confirming the molded optical semiconductor device. The number of molding defects such as cracks and peeling from the lead frame was evaluated and evaluated.

又,關於矽氫化反應之轉化率,利用示差掃描熱量計求出各狀態下之反應熱量,並根據其差異而算出。 Further, regarding the conversion ratio of the hydrazine hydrogenation reaction, the heat of reaction in each state was determined by a differential scanning calorimeter, and calculated based on the difference.

[實施例1] [Example 1]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷100質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 100 parts by mass of methyl vinyl phenyl polysiloxane, represented by the formula: ViMe 2 SiO (MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷13.3質量份、式:(HMe2SiO)2SiPh2 13.3 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷33.3質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為1.15莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組 合物,以質量單位計成為300ppm之量)、油酸(東京化成工業公司製造)0.1質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)122質量份、及平均粒徑5μm之破碎石英粉末(龍森製造之CRYSTALITE VX-52)220質量份進行混合,從而製備出在25℃下之黏度為390Pa‧s之反應性聚矽氧組合物。 33.3 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminated polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the present component is 1.15 moles, and the 1,3-divinyl group of platinum- a solution of 1,1,3,3-tetramethyldioxane as a complex of 1,3-divinyl-1,1,3,3-tetramethyldioxane (relative to the present composition, Platinum metal in an amount of 5.0 ppm by mass), 1-ethynyl-1-cyclohexanol (relative to this group) a compound (in an amount of 300 ppm by mass), 0.1 parts by mass of oleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and 122 parts by mass of titanium oxide (SX-3103, manufactured by Nippon Chemical Industry Co., Ltd.) having an average primary particle diameter of 0.2 μm, and 220 parts by mass of crushed quartz powder (CRYSTALITE VX-52 manufactured by Ronson) having an average particle diameter of 5 μm was mixed to prepare a reactive polyoxymethylene composition having a viscosity of 390 Pa·s at 25 ° C.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為65、在100℃下之黏度為590Pa‧s之熱塑體。矽氫化反應之轉化率為88%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that it was a solid which could not measure the viscosity at 25 ° C, a D-type durometer hardness of 65, and a viscosity of 590 Pa s at 100 ° C. The conversion of the hydrazine hydrogenation reaction was 88%.

當將所獲得之熱塑體在150℃下加熱時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係於300℃下無法測定黏度之固體,在25℃下之D型硬度計硬度為84,彎曲強度為17MPa,全光線反射率為94.2%,硬化物之線膨脹率為110ppm/℃。 When the obtained thermoplastic body was heated at 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour is a solid which cannot be measured at 300 ° C. The hardness of the D-type durometer at 25 ° C is 84, the bending strength is 17 MPa, and the total light reflectance is 94.2%. The linear expansion ratio of the object was 110 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果所獲得之成型物中未確認到成型不良,可獲得無毛邊或孔隙之良好之成型物。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, no molding defects were observed in the obtained molded product, and no burrs or voids were obtained. Good shape.

[實施例2] [Embodiment 2]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷48.4質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 48.4 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷51.6質量份、平均單元式:(Me2ViSiO1/2)0.2(MeEpSiO2/2)0.25(PhSiO3/2)0.55(HO1/2)0.005 51.6 parts by mass of methyl vinyl phenyl polyoxyalkylene represented by an average unit formula: (Me 2 ViSiO 1/2 ) 0.2 (MeEpSiO 2/2 ) 0.25 (PhSiO 3/2 ) 0.55 (HO 1/2 ) 0.005

所表示之含環氧基之聚矽氧烷1.5質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 1.5 parts by mass of the epoxy group-containing polyoxyalkylene represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷12.9質量份、式: (HMe2SiO)2SiPh2 12.9 parts by mass of dimethylvinyl nonyloxy terminal polymethylphenyl fluorene represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷29.0質量份(相對於上述甲基乙烯基苯基聚矽氧烷、二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷及含環氧基之聚矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.94莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、油酸(東京化成工業製造)0.2質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)118質量份、及平均粒徑15μm之球狀二氧化矽(新日鐵Materials Micron公司製造之HS-202)213質量份進行混合,從而製備出在25℃下之黏度為130Pa‧s之硬化性聚矽氧組合物。 29.0 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene, dimethylvinyl decane) The total of the hydroxyl group of the oxy-terminated polymethylphenyl siloxane and the epoxy group-containing polyoxyalkylene is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.94 moles, 1,3-divinyl-1,1,3,3-tetramethyldifluoride of platinum 1,3-divinyl-1,1,3,3-tetramethyldioxane complex An oxane solution (in an amount of 5.0 ppm by mass of the platinum metal), 1-ethynyl-1-cyclohexanol (in an amount of 300 ppm by mass based on the composition), Oleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.2 parts by mass, an average primary particle diameter of 0.2 μm of titanium oxide (SX-3103, manufactured by Seiko Chemical Industry Co., Ltd.), 118 parts by mass, and a spherical cerium oxide having an average particle diameter of 15 μm (Nippon Steel Co., Ltd.) 213 parts by mass of HS-202 manufactured by Materials Micron Co., Ltd. was mixed to prepare a curable polyoxynoxy composition having a viscosity of 130 Pa s at 25 °C.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為62、在100℃下之黏度為4,700Pa‧s之熱塑體。矽氫化反應之轉化率為79%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 62, and the viscosity at 100 ° C was 4,700 Pa·s. . The conversion of the hydrazine hydrogenation reaction was 79%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係於300℃下無法測定黏度之固體,在25℃下之D型硬度計硬度為86,彎曲強度為25MPa,全光線反射率為94.4%,硬化物之線膨脹率為100ppm/℃。 When the obtained thermoplastic body was heated to 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour is a solid which cannot be measured at 300 ° C. The hardness of the D-type durometer at 25 ° C is 86, the bending strength is 25 MPa, and the total light reflectance is 94.4%. The linear expansion ratio of the object was 100 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果所獲得之成型物中未確認到成型不良,可獲得無毛邊或孔隙之良好之成型物。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, no molding defects were observed in the obtained molded product, and no burrs or voids were obtained. Good shape.

[實施例3] [Example 3]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷48.4質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 48.4 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷51.6質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 51.6 parts by mass of methyl vinyl phenyl polyoxyalkylene represented, average formula: ViMe 2 SiO (MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷12.9質量份、式:(HMe2SiO)2SiPh2 12.9 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷29.0質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.96莫耳之量)、1,3,5,7-四甲基四環矽氧烷0.5質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.0467莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、亞麻油酸(東京化成工業製造)0.1質量份、平均一次粒徑0.24μm之氧化鈦(石原產業製造之Tipaque R-630)118質量份、及平均切割長度20μm且平均纖維直徑3μm之磨碎玻璃纖維(旭纖維玻璃製造之MF03JB1-20)213質量份進行混合,從而製備出在25℃下之黏度為150Pa‧s之反應性聚矽氧組合物。 29.0 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminal polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.96 moles, and 1,3,5,7-tetra 0.5 parts by mass of a tetracyclopentane alkane (relative to the total of 1 m of the vinyl group of the above methyl vinyl phenyl polyoxy siloxane and dimethyl vinyl decyloxy terminal polymethyl phenyl oxane, In this component, the hydrogen atom bonded to the ruthenium atom is 0.0467 moles, and the platinum 1,3-divinyl-1,1,3,3-tetramethyldioxane complex is 1 , a solution of 3-divinyl-1,1,3,3-tetramethyldioxane (with respect to the composition, the platinum metal is 5.0 ppm by mass unit), 1-ethynyl-1- Cyclohexanol (in an amount of 300 ppm by mass of the composition), 0.1 part by mass of linoleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and titanium oxide having an average primary particle diameter of 0.24 μm (Tipaque R-made by Ishihara Sangyo Co., Ltd.) 630) 118 parts by mass, and an average cutting length of 20 μm and an average fiber 3μm diameter of milled glass fibers (manufactured by Asahi Glass fibers of MF03JB1-20) 213 parts by mass were mixed to prepare a viscosity at 25 deg.] C under the reactive silicon 150Pa‧s of polyethylene oxide composition.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為70、在100℃下之黏度為16,500Pa‧s之熱塑體。矽氫化反應之轉化率為87%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that it was a solid which could not measure viscosity at 25 ° C, a hardness of D hardness of 70, and a viscosity of 16,500 Pa s at 100 ° C. . The conversion of the hydrazine hydrogenation reaction was 87%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流 動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為85,彎曲強度為20MPa,全光線反射率為94.7%,硬化物之線膨脹率為108ppm/℃。 When the obtained thermoplastic body is heated to 150 ° C, the flow is lost and the flow is lost. Motivation. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 85, the bending strength is 20 MPa, and the total light reflectance is 94.7%. The linear expansion ratio was 108 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果所獲得之成型物中未確認到成型不良,可獲得無毛邊或孔隙之良好之成型物。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, no molding defects were observed in the obtained molded product, and no burrs or voids were obtained. Good shape.

[實施例4] [Example 4]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷38.5質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 38.5 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷61.5質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 61.5 parts by mass of methylvinylphenyl polysiloxane, represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷19.4質量份、式:(HMe2SiO)2SiPh2 19.4 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷28.2質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.92莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、亞麻油酸(東京化成工業製造)0.2質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)118質量份、及平均粒徑5μm之破碎石英粉末(山森土本礦業所製造之Silsic SAB-500)213質量份進行混合,從而製備出在25℃下之 黏度為360Pa‧s之反應性聚矽氧組合物。 28.2 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminated polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.92 moles, and the 1,3-divinyl group of platinum- a solution of 1,1,3,3-tetramethyldioxane as a complex of 1,3-divinyl-1,1,3,3-tetramethyldioxane (relative to the present composition, Platinum metal is 5.0 ppm by mass), 1-ethynyl-1-cyclohexanol (300 ppm by mass based on the composition), linoleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.2 118 parts by mass of titanium oxide (SX-3103 manufactured by Seiko Chemical Industry Co., Ltd.) having an average primary particle diameter of 0.2 μm, and crushed quartz powder having an average particle diameter of 5 μm (Silsic SAB-500 manufactured by Shansen Tuben Mining Co., Ltd.) 213 Mix and prepare to prepare at 25 ° C A reactive polyoxymethylene composition having a viscosity of 360 Pa ‧ .

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為69、在100℃下之黏度為7,600Pa‧s之熱塑體。矽氫化反應之轉化率為88%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 69, and the viscosity at 100 ° C was 7,600 Pa·s. . The conversion of the hydrazine hydrogenation reaction was 88%.

當將所獲得之熱塑體在150℃下加熱時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為86,彎曲強度為19MPa,全光線反射率為94.5%,硬化物之線膨脹率為113ppm/℃。 When the obtained thermoplastic body was heated at 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 86, the bending strength is 19 MPa, and the total light reflectance is 94.5%. The linear expansion ratio was 113 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果所獲得之成型物中未確認到成型不良,可獲得無毛邊或孔隙之良好之成型物。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, no molding defects were observed in the obtained molded product, and no burrs or voids were obtained. Good shape.

[實施例5] [Example 5]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷38.5質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 38.5 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷61.5質量份、平均式:(Me2ViSiO1/2)0.2(MeEpSiO2/2)0.25(PhSiO3/2)0.55(HO1/2)0.005 61.5 parts by mass of methylvinylphenyl polysiloxane, represented by the formula: (Me 2 ViSiO 1/2 ) 0.2 (MeEpSiO 2/2 ) 0.25 (PhSiO 3/2 ) 0.55 (HO 1/2 ) 0.005

所表示之含環氧基之聚矽氧烷1.5質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 1.5 parts by mass of the epoxy group-containing polyoxyalkylene represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷25.6質量份、式:(HMe2SiO)2SiPh2 25.6 parts by mass of dimethylvinyl nonyloxy terminal polymethylphenyl fluorene represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷28.2質量份(相對於上述甲基乙烯基苯基聚矽氧烷、二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷及含環氧基之聚矽氧烷之乙烯基之合計1莫耳,本成分中之 與矽原子鍵結之氫原子成為0.89莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、次亞麻油酸(東京化成工業製造)0.2質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)128質量份、及平均粒徑15μm之球狀二氧化矽(新日鐵Materials Micron公司製造之HS-202)256質量份進行混合,從而製備出在25℃下之黏度為147Pa‧s之反應性聚矽氧組合物。 28.2 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene, dimethylvinyl decane) 1 mil of the total of the oxy-terminated polymethylphenyl siloxane and the epoxy group-containing polyoxyalkylene, in this component The hydrogen atom bonded to the ruthenium atom is 0.89 moles, and the 1,3-divinyl-1,1,3,3-tetramethyldioxane complex of platinum is 1,3-two Vinyl-1,1,3,3-tetramethyldioxane solution (in terms of mass ratio of platinum metal to 5.0 ppm relative to the present composition), 1-ethynyl-1-cyclohexanol ( Titanium oleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 0.2 parts by mass, and an average primary particle diameter of 0.2 μm (SX-3103, manufactured by Suga Chemical Industry Co., Ltd.) A mass fraction and 256 parts by mass of spherical cerium oxide (HS-202 manufactured by Nippon Steel Materials Micron Co., Ltd.) having an average particle diameter of 15 μm were mixed to prepare a reactive polycondensate having a viscosity of 147 Pa·s at 25 ° C. Oxygenated composition.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為76、在100℃下之黏度為4,600Pa‧s之熱塑體。矽氫化反應之轉化率為79%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 76, and the viscosity at 100 ° C was 4,600 Pa ‧ . The conversion of the hydrazine hydrogenation reaction was 79%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為85,彎曲強度為20MPa,全光線反射率為94.3%,硬化物之線膨脹率為101ppm/℃。 When the obtained thermoplastic body was heated to 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 85, the bending strength is 20 MPa, and the total light reflectance is 94.3%. The linear expansion ratio was 101 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果所獲得之成型物中未確認到成型不良,可獲得無毛邊或孔隙之良好之成型物。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, no molding defects were observed in the obtained molded product, and no burrs or voids were obtained. Good shape.

[實施例6] [Embodiment 6]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷38.5質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 38.5 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷61.5質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 61.5 parts by mass of methylvinylphenyl polysiloxane, represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷25.6質量份、式:(HMe2SiO)2SiPh2 25.6 parts by mass of dimethylvinyl nonyloxy terminal polymethylphenyl fluorene represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷28.2質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.9莫耳之量)、1,3,5,7-四甲基四環矽氧烷0.5質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.0439莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、油酸鋅(關東化學製造)0.2質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX3103)141質量份、及平均切割長度20μm且平均纖維直徑3μm之磨碎玻璃纖維(旭纖維玻璃製造之MF03JB1-20)282質量份進行混合,從而製備出在25℃下之黏度為290Pa‧s之硬化性聚矽氧組合物。 28.2 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminated polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in this composition is 0.9 moles, and 1,3,5,7-tetra 0.5 parts by mass of a tetracyclopentane alkane (relative to the total of 1 m of the vinyl group of the above methyl vinyl phenyl polyoxy siloxane and dimethyl vinyl decyloxy terminal polymethyl phenyl oxane, In this component, the hydrogen atom bonded to the ruthenium atom is 0.0439 mol), and the platinum 1,3-divinyl-1,1,3,3-tetramethyldioxane complex is 1 , a solution of 3-divinyl-1,1,3,3-tetramethyldioxane (with respect to the composition, the platinum metal is 5.0 ppm by mass unit), 1-ethynyl-1- Cyclohexanol (in an amount of 300 ppm by mass in terms of the composition), 0.2 parts by mass of zinc oleate (manufactured by Kanto Chemical Co., Ltd.), and titanium oxide having an average primary particle diameter of 0.2 μm (SX3103, manufactured by Nippon Chemical Industry Co., Ltd.) 141 Parts by mass, and an average cutting length of 20 μm and an average fiber diameter of 3 μm 282 parts by mass of ground glass fiber (MF03JB1-20 manufactured by Asahi Glass) was mixed to prepare a curable polyoxynoxy composition having a viscosity of 290 Pa s at 25 °C.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為73、在100℃下之黏度為7,100Pa‧s之熱塑體。矽氫化反應之轉化率為85%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 73, and the viscosity at 100 ° C was 7,100 Pa s. . The conversion of the hydrazine hydrogenation reaction was 85%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為85,彎曲強度為25MPa,全光線反射率為94.5%,硬化物之線膨脹率為69ppm/℃。 When the obtained thermoplastic body was heated to 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 85, the bending strength is 25 MPa, and the total light reflectance is 94.5%. The linear expansion ratio was 69 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果所獲得之成型物中未確認 到成型不良,可獲得無毛邊或孔隙之良好之成型物。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, the obtained molded product was not confirmed. In the case of poor molding, a molded product having no burrs or voids can be obtained.

[比較例1] [Comparative Example 1]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷100質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 100 parts by mass of methyl vinyl phenyl polysiloxane, represented by the formula: ViMe 2 SiO (MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷13.3質量份、式:(HMe2SiO)2SiPh2 13.3 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷33.3質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為1.15莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)122質量份、及平均粒徑5μm之破碎石英粉末(龍森製造之CRYSTALITE VX-52)220質量份進行混合,從而製備出在25℃下之黏度為410Pa‧s之反應性聚矽氧組合物。 33.3 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminated polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the present component is 1.15 moles, and the 1,3-divinyl group of platinum- a solution of 1,1,3,3-tetramethyldioxane as a complex of 1,3-divinyl-1,1,3,3-tetramethyldioxane (relative to the present composition, a platinum metal in an amount of 5.0 ppm by mass), 1-ethynyl-1-cyclohexanol (in an amount of 300 ppm by mass based on the composition), and an average primary particle diameter of 0.2 μm. 220 parts by mass of crushed quartz powder (CRYSTALITE VX-52 manufactured by Ronson) of 122 parts by mass of SX-3103) manufactured by Seiko Chemical Industry Co., Ltd., and a viscosity of 410 Pa ‧ at 25 ° C was mixed. a reactive polyoxo composition of s.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為65、在100℃下之黏度為650Pa‧s之熱塑體。矽氫化反應之轉化率為87%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that it was a solid which could not measure viscosity at 25 ° C, a D-type durometer hardness of 65, and a viscosity of 650 Pa s at 100 ° C. The conversion of the hydrazine hydrogenation reaction was 87%.

當將所獲得之熱塑體在150℃下加熱時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係於300℃下無法測定黏度之固體,在25℃下之D型硬度計硬度為85,彎曲強度為17MPa,全光線反射率為94.3%,硬化物之線膨脹率為110ppm/℃。 When the obtained thermoplastic body was heated at 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour is a solid which cannot be measured at 300 ° C. The hardness of the D-type durometer at 25 ° C is 85, the bending strength is 17 MPa, and the total light reflectance is 94.3%. The linear expansion ratio of the object was 110 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果10次中有5次在成型物中確認到成型不良。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, molding failure was confirmed in the molded product five times out of ten times.

[比較例2] [Comparative Example 2]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷48.4質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 48.4 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷51.6質量份、平均單元式:(Me2ViSiO1/2)0.2(MeEpSiO2/2)0.25(PhSiO3/2)0.55(HO1/2)0.005 51.6 parts by mass of methyl vinyl phenyl polyoxyalkylene represented by an average unit formula: (Me 2 ViSiO 1/2 ) 0.2 (MeEpSiO 2/2 ) 0.25 (PhSiO 3/2 ) 0.55 (HO 1/2 ) 0.005

所表示之含環氧基之聚矽氧烷1.5質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 1.5 parts by mass of the epoxy group-containing polyoxyalkylene represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷12.9質量份、式:(HMe2SiO)2SiPh2 12.9 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷29.0質量份(相對於上述甲基乙烯基苯基聚矽氧烷、二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷及含環氧基之聚矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.94莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、硬脂酸(東京化成工業製造)0.2質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)118質量份、及平均粒徑15μm之球狀二氧化矽(新日鐵Materials Micron公司製造之HS-202)213質量份進行混合,從而製備出在25℃下之黏度為160Pa‧s之硬化性聚矽 氧組合物。 29.0 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene, dimethylvinyl decane) The total of the hydroxyl group of the oxy-terminated polymethylphenyl siloxane and the epoxy group-containing polyoxyalkylene is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.94 moles, 1,3-divinyl-1,1,3,3-tetramethyldifluoride of platinum 1,3-divinyl-1,1,3,3-tetramethyldioxane complex An oxane solution (in an amount of 5.0 ppm by mass of the platinum metal), 1-ethynyl-1-cyclohexanol (in an amount of 300 ppm by mass based on the composition), 0.2 parts by mass of stearic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 118 parts by mass of titanium oxide having an average primary particle diameter of 0.2 μm (SX-3103 manufactured by Seiko Chemical Industry Co., Ltd.), and spherical cerium oxide having an average particle diameter of 15 μm (New Day) 213 parts by mass of HS-202 manufactured by Iron Materials Micron Co., Ltd. was mixed to prepare a hardening polycondensate having a viscosity of 160 Pa‧s at 25 ° C Oxygen composition.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為63、在100℃下之黏度為4,900Pa‧s之熱塑體。矽氫化反應之轉化率為76%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 63, and the viscosity at 100 ° C was 4,900 Pa ‧ . The conversion of the hydrazine hydrogenation reaction was 76%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係於300℃下無法測定黏度之固體,在25℃下之D型硬度計硬度為87,彎曲強度為25MPa,全光線反射率為94.2%,硬化物之線膨脹率為97ppm/℃。 When the obtained thermoplastic body was heated to 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour is a solid which cannot be measured at 300 ° C. The hardness of the D-type durometer at 25 ° C is 87, the bending strength is 25 MPa, and the total light reflectance is 94.2%. The linear expansion ratio of the material was 97 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果10次中有3次在成型物中確認到成型不良。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, molding failure was confirmed in the molded product three times out of ten times.

[比較例3] [Comparative Example 3]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷48.4質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 48.4 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷51.6質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 51.6 parts by mass of methyl vinyl phenyl polyoxyalkylene represented, average formula: ViMe 2 SiO (MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷12.9質量份、式:(HMe2SiO)2SiPh2 12.9 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷29.0質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.96莫耳之量)、1,3,5,7-四甲基四環矽氧烷0.5質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽 氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.0467莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、硬脂酸鈣(東京化成工業製造)0.2質量份、平均一次粒徑0.24μm之氧化鈦(石原產業製造之Tipaque R-630)118質量份、及平均切割長度20μm且平均纖維直徑3μm之磨碎玻璃纖維(旭纖維玻璃製造之MF03JB1-20)213質量份進行混合,從而製備出在25℃下之黏度為190Pa‧s之反應性聚矽氧組合物。 29.0 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminal polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.96 moles, and 1,3,5,7-tetra 0.5 parts by mass of a tetracyclic alkane (relative to the above methyl vinyl phenyl polyoxyalkylene and dimethyl vinyl alkoxy end polymethylphenyl hydrazine) The total of the vinyl groups of the oxyalkylene is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.0467 moles, and the 1,3-divinyl-1,1,3,3-tetra of platinum a solution of a methyl dioxane complex 1,3-divinyl-1,1,3,3-tetramethyldioxane (with respect to the composition, the platinum metal is 5.0 ppm in mass units) An amount of 1-ethynyl-1-cyclohexanol (in an amount of 300 ppm by mass based on the composition), 0.2 parts by mass of calcium stearate (manufactured by Tokyo Chemical Industry Co., Ltd.), and an average primary particle diameter of 0.24 118 parts by mass of titanium oxide (Tipaque R-630 manufactured by Ishihara Sangyo Co., Ltd.) and 213 parts by mass of ground glass fiber (MF03JB1-20 manufactured by Asahi Glass) having an average cutting length of 20 μm and an average fiber diameter of 3 μm were mixed. A reactive polyoxymethylene composition having a viscosity of 190 Pa s at 25 ° C was prepared.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為71、在100℃下之黏度為17,100Pa‧s之熱塑體。矽氫化反應之轉化率為85%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 71, and the viscosity at 100 ° C was 17,100 Pa ‧ . The conversion of the hydrazine hydrogenation reaction was 85%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為85,彎曲強度為21MPa,全光線反射率為94.5%,硬化物之線膨脹率為104ppm/℃。 When the obtained thermoplastic body was heated to 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 85, the flexural strength is 21 MPa, and the total light reflectance is 94.5%. The linear expansion ratio was 104 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果10次中有2次在成型物中確認到成型不良。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, molding failure was confirmed in the molded article twice in 10 times.

[比較例4] [Comparative Example 4]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷38.5質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 38.5 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷61.5質量份、平均式: ViMe2SiO(MePhSiO)17.5SiViMe2 61.5 parts by mass of methylvinylphenyl polysiloxane, represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷19.4質量份、式:(HMe2SiO)2SiPh2 19.4 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷28.2質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.92莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、聚矽氧油(東麗道康寧製造SH-200(1000cs))0.2質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)118質量份、及平均粒徑5μm之破碎石英粉末(山森土本礦業所製造之Silsic SAB-500)213質量份進行混合,從而製備出在25℃下之黏度為340Pa‧s之反應性聚矽氧組合物。 28.2 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminated polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.92 moles, and the 1,3-divinyl group of platinum- a solution of 1,1,3,3-tetramethyldioxane as a complex of 1,3-divinyl-1,1,3,3-tetramethyldioxane (relative to the present composition, Platinum metal is 5.0 ppm by mass), 1-ethynyl-1-cyclohexanol (300 ppm by mass based on the composition), polyfluorene oxide (Toray Dow Corning SH) -200 (1000 cs)) 0.2 parts by mass of titanium oxide (SX-3103, manufactured by Seiko Chemical Industry Co., Ltd.) having an average primary particle diameter of 0.2 μm, and a crushed quartz powder having an average particle diameter of 5 μm (manufactured by Shansen Tuben Mining Co., Ltd.) Silsic SAB-500) 213 parts by mass was mixed to prepare a reactive polyoxymethylene composition having a viscosity of 340 Pa‧s at 25 °C.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為71、在100℃下之黏度為16,000Pa‧s之熱塑體。矽氫化反應之轉化率為87%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 71, and the viscosity at 100 ° C was 16,000 Pa·s. . The conversion of the hydrazine hydrogenation reaction was 87%.

當將所獲得之熱塑體在150℃下加熱時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為87,彎曲強度為20MPa,全光線反射率為94.3%,硬化物之線膨脹率為117ppm/℃。 When the obtained thermoplastic body was heated at 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 87, the bending strength is 20 MPa, and the total light reflectance is 94.3%. The linear expansion ratio was 117 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果10次中有6次在成型物中確認到成型不良。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, molding failure was confirmed in the molded article six times out of ten times.

[比較例5] [Comparative Example 5]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷38.5質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 38.5 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷61.5質量份、平均式:(Me2ViSiO1/2)0.2(MeEpSiO2/2)0.25(PhSiO3/2)0.55(HO1/2)0.005 61.5 parts by mass of methylvinylphenyl polysiloxane, represented by the formula: (Me 2 ViSiO 1/2 ) 0.2 (MeEpSiO 2/2 ) 0.25 (PhSiO 3/2 ) 0.55 (HO 1/2 ) 0.005

所表示之含環氧基之聚矽氧烷1.5質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 1.5 parts by mass of the epoxy group-containing polyoxyalkylene represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷25.6質量份、式:(HMe2SiO)2SiPh2 25.6 parts by mass of dimethylvinyl nonyloxy terminal polymethylphenyl fluorene represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷28.2質量份(相對於上述甲基乙烯基苯基聚矽氧烷、二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷及含環氧基之聚矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.89莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、聚矽氧油(東麗道康寧製造SH-200(10000cs))0.2質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)128質量份、及平均粒徑15μm之球狀二氧化矽(新日鐵Materials Micron公司製造之HS-202)256質量份進行混合,從而製備出在25℃下之黏度為164Pa‧s之反應性聚矽氧組合物。 28.2 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene, dimethylvinyl decane) The total of the hydroxyl group of the oxy-terminated polymethylphenyl siloxane and the epoxy group-containing polyoxyalkylene is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the composition is 0.89 moles, 1,3-divinyl-1,1,3,3-tetramethyldifluoride of platinum 1,3-divinyl-1,1,3,3-tetramethyldioxane complex An oxane solution (in an amount of 5.0 ppm by mass of the platinum metal), 1-ethynyl-1-cyclohexanol (in an amount of 300 ppm by mass based on the composition), Polyfluorene oil (manufactured by Toray Dow Corning SH-200 (10000cs)) 0.2 parts by mass, an average primary particle diameter of 0.2 μm of titanium oxide (SX-3103, manufactured by Seiko Chemical Industry Co., Ltd.), 128 parts by mass, and a ball having an average particle diameter of 15 μm 256 parts by mass of cerium oxide (HS-202 manufactured by Nippon Steel Materials Micron Co., Ltd.) was mixed to prepare a reactive polyoxymethylene composition having a viscosity of 164 Pa s at 25 °C.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為77、在100℃下之黏度為5,100Pa‧s之熱塑體。矽氫化反應之轉化率為84%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 77, and the viscosity at 100 ° C was 5,100 Pa·s. . The conversion of the hydrazine hydrogenation reaction was 84%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為86,彎曲強度為20MPa,全光線反射率為94.4%,硬化物之線膨脹率為98ppm/℃。 When the obtained thermoplastic body was heated to 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 86, the bending strength is 20 MPa, and the total light reflectance is 94.4%. The linear expansion ratio was 98 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果10次中有5次在成型物中確認到成型不良。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, molding failure was confirmed in the molded product five times out of ten times.

[比較例6] [Comparative Example 6]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷38.5質量份、平均單元式:(Me2ViSiO1/2)0.20(PhSiO3/2)0.80(HO1/2)0.01 38.5 parts by mass of methyl vinyl phenyl polysiloxane, and the average unit formula: (Me 2 ViSiO 1/2 ) 0.20 (PhSiO 3/2 ) 0.80 (HO 1/2 ) 0.01

所表示之甲基乙烯基苯基聚矽氧烷61.5質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 61.5 parts by mass of methylvinylphenyl polysiloxane, represented by the formula: ViMe 2 SiO(MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷25.6質量份、式:(HMe2SiO)2SiPh2 25.6 parts by mass of dimethylvinyl nonyloxy terminal polymethylphenyl fluorene represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷28.2質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.9莫耳之量)、1,3,5,7-四甲基四環矽氧烷0.5質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.0439莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合 物,以質量單位計成為300ppm之量)、油酸(東京化成工業公司製造)0.01質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX3103)141質量份、及平均切割長度20μm且平均纖維直徑3μm之磨碎玻璃纖維(旭纖維玻璃製造之MF03JB1-20)282質量份進行混合,從而製備出在25℃下之黏度為300Pa‧s之硬化性聚矽氧組合物。 28.2 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminated polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in this composition is 0.9 moles, and 1,3,5,7-tetra 0.5 parts by mass of a tetracyclopentane alkane (relative to the total of 1 m of the vinyl group of the above methyl vinyl phenyl polyoxy siloxane and dimethyl vinyl decyloxy terminal polymethyl phenyl oxane, In this component, the hydrogen atom bonded to the ruthenium atom is 0.0439 mol), and the platinum 1,3-divinyl-1,1,3,3-tetramethyldioxane complex is 1 , a solution of 3-divinyl-1,1,3,3-tetramethyldioxane (with respect to the composition, the platinum metal is 5.0 ppm by mass unit), 1-ethynyl-1- Cyclohexanol (relative to this combination) Mn mass (300 parts by mass), oleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 0.01 parts by mass, average primary particle diameter of 0.2 μm, titanium oxide (SX3103, manufactured by Nippon Chemical Industry Co., Ltd.), 141 parts by mass, and average cutting length 282 parts by mass of ground glass fiber (MF03JB1-20, manufactured by Asahi Glass) of 20 μm and an average fiber diameter of 3 μm was mixed to prepare a curable polyoxynoxy composition having a viscosity of 300 Pa·s at 25 ° C.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為75、在100℃下之黏度為7,300Pa‧s之熱塑體。矽氫化反應之轉化率為88%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that the solid which could not be measured at 25 ° C, the hardness of the D-type durometer was 75, and the viscosity at 100 ° C was 7,300 Pa·s. . The conversion of the hydrazine hydrogenation reaction was 88%.

當將所獲得之熱塑體加熱至150℃時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係在300℃以下不具有流動性,在25℃下之D型硬度計硬度為86,彎曲強度為25MPa,全光線反射率為94.4%,硬化物之線膨脹率為73ppm/℃。 When the obtained thermoplastic body was heated to 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour has no fluidity below 300 ° C, the hardness of the D-type durometer at 25 ° C is 86, the flexural strength is 25 MPa, and the total light reflectance is 94.4%. The linear expansion ratio was 73 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果10次中有5次在成型物中確認到成型不良。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, molding failure was confirmed in the molded product five times out of ten times.

[比較例7] [Comparative Example 7]

將平均單元式:(MeViSiO2/2)0.25(Ph2SiO2/2)0.30(PhSiO3/2)0.45(HO1/2)0.02 The average unit formula is: (MeViSiO 2/2 ) 0.25 (Ph 2 SiO 2/2 ) 0.30 (PhSiO 3/2 ) 0.45 (HO 1/2 ) 0.02

所表示之甲基乙烯基苯基聚矽氧烷100質量份、平均式:ViMe2SiO(MePhSiO)17.5SiViMe2 100 parts by mass of methyl vinyl phenyl polysiloxane, represented by the formula: ViMe 2 SiO (MePhSiO) 17.5 SiViMe 2

所表示之二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷13.3質量份、式:(HMe2SiO)2SiPh2 13.3 parts by mass of a dimethylvinyl nonyloxy terminal polymethylphenyl siloxane represented by the formula: (HMe 2 SiO) 2 SiPh 2

所表示之1,1,5,5-四甲基-3,3-二苯基三矽氧烷33.3質量份(相對於上述甲基乙烯基苯基聚矽氧烷與二甲基乙烯基矽烷氧基末端聚甲基苯基矽氧烷之乙烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子 成為1.15莫耳之量)、鉑之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷錯合物之1,3-二乙烯基-1,1,3,3-四甲基二矽氧烷溶液(相對於本組合物,鉑金屬以質量單位計成為5.0ppm之量)、1-乙炔基-1-環己醇(相對於本組合物,以質量單位計成為300ppm之量)、油酸(東京化成工業公司製造)12質量份、平均一次粒徑0.2μm之氧化鈦(堺化學工業製造之SX-3103)122質量份、及平均粒徑5μm之破碎石英粉末(龍森製造之CRYSTALITE VX-52)220質量份進行混合,從而製備出在25℃下之黏度為130Pa‧s之反應性聚矽氧組合物。 33.3 parts by mass of 1,1,5,5-tetramethyl-3,3-diphenyltrioxane represented (relative to the above methylvinylphenyl polyoxyalkylene and dimethylvinylnonane) The total of the vinyl groups of the oxy-terminal polymethylphenyl fluorene oxide is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the present component 1,3-divinyl-1,1,3 which is a 1.15 molar amount of platinum, a 1,3-divinyl-1,1,3,3-tetramethyldioxane complex of platinum , 3-tetramethyldioxane solution (in terms of mass ratio of platinum metal to 5.0 ppm relative to the present composition), 1-ethynyl-1-cyclohexanol (relative to the composition, by mass) 12 parts by mass of oleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), 12 parts by mass of oleic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and 0.2 parts by mass of titanium oxide (SX-3103, manufactured by Seiko Chemical Industry Co., Ltd.) having an average primary particle diameter of 0.2 μm, and an average particle diameter of 5 μm. 220 parts by mass of crushed quartz powder (CRYSTALITE VX-52 manufactured by Ronson) was mixed to prepare a reactive polyoxyl composition having a viscosity of 130 Pa s at 25 °C.

將該組合物在120℃下加熱10分鐘,結果可知曉其係在25℃下無法測定黏度之固體、D型硬度計硬度為51、在100℃下之黏度為240Pa‧s之熱塑體。矽氫化反應之轉化率為86%。 The composition was heated at 120 ° C for 10 minutes, and as a result, it was found that it was a solid which could not measure viscosity at 25 ° C, a D-type durometer hardness of 51, and a viscosity of 120 Pa s at 100 ° C. The conversion of the hydrazine hydrogenation reaction was 86%.

當將所獲得之熱塑體在150℃下加熱時,進行了流動化後,失去流動性。在150℃下加熱1小時所獲得之硬化物係於300℃下無法測定黏度之固體,在25℃下之D型硬度計硬度為72,彎曲強度為5MPa,全光線反射率為94.4%,硬化物之線膨脹率為115ppm/℃。 When the obtained thermoplastic body was heated at 150 ° C, fluidity was lost and fluidity was lost. The cured product obtained by heating at 150 ° C for 1 hour is a solid which cannot be measured at 300 ° C. The hardness of the D-type durometer at 25 ° C is 72, the bending strength is 5 MPa, and the total light reflectance is 94.4%. The linear expansion of the material was 115 ppm/°C.

又,為製造圖1所示之光半導體裝置,將上述熱塑體使用轉移成形機進行與引線框架之一體成型10次,結果所獲得之成型物中未確認到成型不良,可獲得無毛邊或孔隙之良好之成型物。然而,可知曉所獲得之成型物太軟。 Further, in order to manufacture the optical semiconductor device shown in Fig. 1, the thermoplastic body was molded into a single body of the lead frame 10 times using a transfer molding machine, and as a result, no molding defects were observed in the obtained molded product, and no burrs or voids were obtained. Good shape. However, it is known that the molded article obtained is too soft.

[產業上之可利用性] [Industrial availability]

本發明之反應性聚矽氧組合物可獲得反應性熱塑體,該反應性熱塑體適合於已加熱之模具中之硬化物之成形,所獲得之硬化物由於由熱或光所引起之機械強度下降或變色較少,光反射率較高,模具脫模性優異,因此較佳地用作發光二極體之白色框材之形成材料。 The reactive polyoxo composition of the present invention can obtain a reactive thermoplastic which is suitable for the formation of a cured product in a heated mold, which is obtained by heat or light. The mechanical strength is lowered or the discoloration is small, the light reflectance is high, and the mold release property is excellent, so that it is preferably used as a material for forming a white frame material of a light-emitting diode.

1‧‧‧光半導體元件 1‧‧‧Optical semiconductor components

2‧‧‧引線框架 2‧‧‧ lead frame

3‧‧‧引線框架 3‧‧‧ lead frame

4、4'‧‧‧接合線 4, 4'‧‧‧ bonding line

5‧‧‧光反射材 5‧‧‧Light reflective material

6‧‧‧密封材 6‧‧‧ Sealing material

Claims (16)

一種反應性聚矽氧組合物,其至少包含:(A)平均單元式:(R1 3SiO1/2)a(R1 2SiO2/2)b(R1SiO3/2)c(SiO4/2)d(R2O1/2)e(式中,R1為相同或不同之苯基、碳原子數1~6之烷基或碳原子數2~6之烯基,其中,全部R1之30~80莫耳%為苯基,全部R1之10~20莫耳%為烯基,R2為氫原子或碳原子數1~6之烷基,a、b、c、d及e分別為滿足0≦a≦0.30、0≦b≦0.70、0.3≦c≦0.9、0≦d≦0.20、0≦e≦0.10,且a+b+c+d=1之數)所表示之有機聚矽氧烷 100質量份、(B)通式:R3 3SiO(R3 2SiO)mSiR3 3(式中,R3為相同或不同之苯基、碳原子數1~6之烷基或碳原子數2~6之烯基,其中,全部R3之30~70莫耳%為苯基,全部R3之至少1個為烯基,m為10~100之整數)所表示之有機聚矽氧烷 0~40質量份、(C)一分子中具有至少2個與矽原子鍵結之氫原子,且與矽原子鍵結之全部有機基之20~70莫耳%為苯基之有機聚矽氧烷{相對於(A)成分與(B)成分中之烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.5~2莫耳之量}、(D)矽氫化反應用觸媒{對於促進(A)成分及(B)成分中之烯基與(C)成分中之與矽原子鍵結之氫原子之矽氫化反應而言充分之量}、(E)白色顏料{相對於(A)成分~(D)成分之合計100質量份為50質量份以上}、 (F)非球狀二氧化矽、球狀二氧化矽或玻璃纖維{相對於(A)成分~(D)成分之合計100質量份為100質量份以上}、及(G)一分子中具有至少1個碳-碳雙鍵之碳原子數為10以上之羧酸或其金屬鹽,並且(E)成分及(F)成分之合計含量相對於(A)成分~(D)成分之合計100質量份為400質量份以下,(G)成分之含量相對於(A)成分~(D)成分之合計100質量份為0.01~8質量份。 A reactive polyoxynoxy composition comprising at least: (A) an average unit formula: (R 1 3 SiO 1/2 ) a (R 1 2 SiO 2/2 ) b (R 1 SiO 3/2 ) c ( SiO 4/2 ) d (R 2 O 1/2 ) e (wherein R 1 is the same or different phenyl group, an alkyl group having 1 to 6 carbon atoms or an alkenyl group having 2 to 6 carbon atoms, wherein , R & lt all 30 1 to 80 mole% of the phenyl, R & lt entire 1 to 20 mole% of the 10 alkenyl group, R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, of, a, b, c , d and e respectively satisfy 0≦a≦0.30, 0≦b≦0.70, 0.3≦c≦0.9, 0≦d≦0.20, 0≦e≦0.10, and a+b+c+d=1) 100 parts by mass of the organic polyoxane represented by the formula (B): R 3 3 SiO(R 3 2 SiO) m SiR 3 3 (wherein R 3 is the same or different phenyl group, carbon number 1 ~ 6 carbon atoms or an alkyl group of an alkenyl group of 2 to 6, wherein all of R 3 is 30 to 70 mole% phenyl, all R 3 is at least one alkenyl group, m is an integer of 10 to 100 The organic polyoxane represented by 0 to 40 parts by mass, (C) having at least 2 hydrogen atoms bonded to a ruthenium atom in one molecule, and 20 to 70 moles of all organic groups bonded to the ruthenium atom % is a phenyl organopolyoxane {relative to (A) The total amount of alkenyl groups in the component (B) is 1 mole, and the hydrogen atom bonded to the ruthenium atom in the component is 0.5 to 2 moles}, (D) 触 hydrogenation reaction catalyst {for promotion A sufficient amount of the (A) component and the alkenyl group in the component (B) to the hydrogenation reaction of the hydrogen atom bonded to the halogen atom in the component (C), and (E) the white pigment {relative to (A) 100 parts by mass or more of the component (D) component is 50 parts by mass or more}, (F) non-spherical cerium oxide, spherical cerium oxide or glass fiber {compared to the total of (A) component to (D) component 100 parts by mass or more of 100 parts by mass or more, and (G) a carboxylic acid having 10 or more carbon atoms or a metal salt thereof having at least one carbon-carbon double bond in one molecule, and (E) component and (F) The total content of the components is 400 parts by mass or less based on 100 parts by mass of the total of the components (A) to (D), and the content of the component (G) is 0.01% by mass based on 100 parts by mass of the components (A) to (D). ~8 parts by mass. 如請求項1之反應性聚矽氧組合物,其進而含有相對於(A)成分~(D)成分之合計100質量份為0.5~10.0質量份之(H)平均單元式:(R7 3SiO1/2)f(R7 2SiO2/2)g(R7SiO3/2)h(SiO4/2)i(R8O1/2)j(式中,R7為相同或不同之苯基、碳原子數1~6之烷基、碳原子數2~6之烯基或含環氧基之有機基,其中,全部R7之15~60莫耳%為苯基,全部R7之3~30莫耳%為烯基,5~30莫耳%為含環氧基之有機基,R8為氫原子或碳原子數1~6之烷基,f、g、h、i及j分別為滿足0≦f≦0.5、0≦g≦0.9、0≦h≦0.7、0≦i≦0.3、0≦j≦0.02,且f+g+h+i=1之數)所表示之有機聚矽氧烷。 The reactive Paragraph 1 request poly silicon oxide composition, which further contains with respect to component (A) - the total component (D) of 100 parts by mass of 0.5 to 10.0 parts by mass of (H) the average unit formula: (R 7 3 SiO 1/2 ) f (R 7 2 SiO 2/2 ) g (R 7 SiO 3/2 ) h (SiO 4/2 ) i (R 8 O 1/2 ) j (wherein R 7 is the same or a different phenyl group, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms or an organic group having an epoxy group, wherein all 15 to 60 mol% of R 7 are a phenyl group, all 3 to 30 mol% of R 7 is an alkenyl group, 5 to 30 mol % is an epoxy group-containing organic group, R 8 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and f, g, h, i and j are respectively satisfying 0≦f≦0.5, 0≦g≦0.9, 0≦h≦0.7, 0≦i≦0.3, 0≦j≦0.02, and f+g+h+i=1) The organic polyoxane represented. 如請求項1之反應性聚矽氧組合物,其進而含有相對於(A)成分與(B)成分中之烯基之合計1莫耳,本成分中之與矽原子鍵結之氫原子成為0.001~0.20莫耳之量之(I)一分子中具有至少2個與矽原子鍵結之氫原子且苯基相對於與矽原子鍵結之全部有機基之含量未達20莫耳%的有機聚矽氧烷。 The reactive polyoxosiloxane composition of claim 1, which further contains 1 mole of the total of the alkenyl groups in the component (A) and the component (B), and the hydrogen atom bonded to the ruthenium atom in the component becomes 0.001 to 0.20 moles of (I) organic having at least 2 hydrogen atoms bonded to a ruthenium atom in one molecule and having a phenyl group having less than 20 mol% relative to all organic groups bonded to the ruthenium atom Polyoxane. 如請求項2之反應性聚矽氧組合物,其進而含有(I)一分子中具有至少2個與矽原子鍵結之氫原子且苯基相對於與矽原子鍵結之全部有機基之含量未達20莫耳%的有機聚矽氧烷,該(I)成分之含量為相對於(A)成分與(B)成分中之烯基之合計1莫耳,本成分中之 與矽原子鍵結之氫原子成為0.001~0.20莫耳之量。 The reactive polyoxosiloxane composition of claim 2, which further comprises (I) a content of at least 2 hydrogen atoms bonded to a ruthenium atom in one molecule and a phenyl group bonded to a ruthenium atom Less than 20 mol% of the organopolyoxane, the content of the component (I) is 1 mol in total with respect to the alkenyl group in the component (A) and the component (B), in the component The hydrogen atom bonded to the ruthenium atom is 0.001 to 0.20 moles. 如請求項1至4中任一項之反應性聚矽氧組合物,其於25℃下之黏度為10,000Pa‧s以下。 The reactive polyoxosiloxane composition according to any one of claims 1 to 4, which has a viscosity at 25 ° C of 10,000 Pa ‧ or less. 一種反應性熱塑體,其係進行如請求項1至5中任一項之反應性聚矽氧組合物之矽氫化反應直至轉化率成為70~95%而成。 A reactive thermoplastic body which is subjected to a hydrogenation reaction of a reactive polyoxosiloxane composition according to any one of claims 1 to 5 until the conversion ratio is 70 to 95%. 如請求項6之反應性熱塑體,其於25℃下為固體或者黏度為1,000,000Pa‧s以上,且係於100℃下之黏度為100,000Pa‧s以下之液狀。 The reactive thermoplastic of claim 6 which is solid at 25 ° C or has a viscosity of 1,000,000 Pa ‧ or more and is a liquid having a viscosity of 100,000 Pa ‧ s or less at 100 ° C. 如請求項6之反應性熱塑體,其於25℃下之JIS K 7215所規定之D型硬度計硬度為30以上。 The reactive thermoplastic of claim 6 which has a D-type durometer hardness of 30 or more as defined by JIS K 7215 at 25 °C. 如請求項7之反應性熱塑體,其於25℃下之JIS K 7215所規定之D型硬度計硬度為30以上。 The reactive thermoplastic of claim 7 has a D-type durometer hardness of 30 or more as defined by JIS K 7215 at 25 °C. 如請求項6至9中任一項之反應性熱塑體,其係加熱至100℃以上,而形成於300℃以下不顯示出流動性之硬化物。 The reactive thermoplastic according to any one of claims 6 to 9, which is heated to 100 ° C or higher to form a cured product which does not exhibit fluidity below 300 ° C. 一種硬化物,其係藉由將如請求項6至10中任一項之反應性熱塑體加熱至100℃以上而獲得,且於300℃下為固體或者黏度為1,000,000Pa‧s以上。 A cured product obtained by heating a reactive thermoplastic body according to any one of claims 6 to 10 to 100 ° C or higher, and having a solidity at 300 ° C or a viscosity of 1,000,000 Pa ‧ or more. 一種硬化物,其係將如請求項1至5中任一項之反應性聚矽氧組合物進行硬化而成。 A cured product obtained by hardening a reactive polyoxymethylene composition according to any one of claims 1 to 5. 如請求項11之硬化物,其全光線反射率為80%以上。 The cured product of claim 11 has a total light reflectance of 80% or more. 如請求項12之硬化物,其全光線反射率為80%以上。 The cured product of claim 12 has a total light reflectance of 80% or more. 如請求項11至14中任一項之硬化物,其於25~200℃之範圍內之平均線膨脹率為200ppm/℃以下。 The cured product according to any one of claims 11 to 14, which has an average linear expansion ratio of 200 ppm/° C. or less in the range of 25 to 200 ° C. 一種光半導體裝置,其特徵在於:其係由如請求項11至15中任一項之硬化物形成光反射材而成。 An optical semiconductor device obtained by forming a light-reflecting material from the cured product according to any one of claims 11 to 15.
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