TW201509626A - Mask set and surface treatment method - Google Patents

Abstract

A mask set for mold surface treatment comprises a first mask and a second mask. The first mask comprises a through hole; therefore, the first mask can shield a ring area of an optical surface of a mold. The second mask is configured to at least shield a portion of the inner area encircled by the ring area.

Description

Mask group and surface treatment method

The present invention relates to a mask set and a surface treatment method.

In a process for making contact lenses using a casting process, a quantitative polymerizable lens material is injected into a female mold half. Next, the male mold half and the master mold are closed to form a closed molding cavity. The lens material is polymerized in the cavity to form an unhydrated lens. After that, the mold is opened, the lens is removed, and then the subsequent process is performed.

In the case where a hydrophilic monomer is used as a lens material and a hydrophobic material (for example, a polyolefin) is used to form a male or female mold, the male or female mold is first subjected to surface treatment, thereby improving the integration. The transfer efficiency between the lens material and the surface of the mold to reduce the occurrence of defects when the lens material flows, bypassing areas of the mold surface that have poor receptivity or are not easily wetted.

Before the lens material is injected, the entire surface of the male and female molds may be surface treated together to impart uniform hydrophilic properties to the entire surface of the male and female molds. However, this practice may cause the lens to be too tightly fastened to the male or female mold, not easily detached, or even cause damage to the lens after being detached; or the lens may not adhere well to the male or female mold, and accidentally break away from the public during the process. Or master model.

In view of the foregoing, the present invention correspondingly provides at least one mask set and at least one surface treatment method.

An embodiment of the invention discloses a mask set. This mask set can be used for mold surface treatment. The mask set includes a first mask and a second mask. The first mask has a through hole. The first mask can shield an annular region from the optical surface of a mold. The second mask may cover at least a portion of the inner region surrounded by the annular region.

An embodiment of the invention discloses a surface treatment method, which comprises using a first mask having a through hole to shield an annular region on an inner optical surface of the mold, so that the annular region is not subjected to a surface treatment energy. And utilizing a second mask to at least mask a portion of the interior region defined by the annular region such that the portion is unaffected by the surface treatment energy.

In at least some embodiments of the present invention, the surface of the optical surface of the mold is separately treated to provide a non-uniformly high or consistent low surface free energy, thereby preventing the lens from being too tightly fastened on the mold or Can not be attached to the mold well.

1a, 1b‧‧‧ mirror system

2‧‧‧Female model

3‧‧‧ mask

4‧‧‧projection device

5‧‧‧Male model

11‧‧‧Electrode

12‧‧‧ Plasma Controller

21‧‧‧Optical surface

22‧‧‧ openings

31, 31a, 31b, 31c, 31d‧‧‧ first mask

32, 32b, 32c, 32d‧‧‧ second mask

41‧‧‧Circular area

42‧‧‧Area

51‧‧‧Optical surface

311‧‧‧through hole

312‧‧‧ openings

313‧‧‧ side torus

314‧‧‧ inner edge

315‧‧‧Flange

316‧‧‧ side surface

317‧‧‧ end face

321‧‧‧ end face

322‧‧‧ side torus

323‧‧‧ end face

411‧‧‧ outer border

412‧‧‧ inner boundary

413‧‧‧Internal area

421‧‧‧ border

500‧‧‧ring area

501‧‧‧Internal area

d ₁ , d ₂ ‧‧‧ spacing

H ₁ , H ₂ ‧‧‧ size

w‧‧‧Width

S81, S83‧‧‧ steps

1A is a schematic view of an embodiment of the invention, illustrating a portion of a mirror system.

FIG. 1B is a schematic view of an embodiment of the invention, illustrating a portion of a mirror system.

2A is a top plan view of an embodiment of the present invention illustrating a mask of a mask set.

Figure 2B is a cross-sectional view taken along line 100-100 of Figure 2A.

3A is a schematic view of an embodiment of the present invention illustrating another mask of a mask set.

Figure 3B is a cross-sectional view along the cut line 200-200 of Figure 3A.

4 is a schematic view of an embodiment of the present invention illustrating regions or ranges that are masked by the first mask and the second mask.

FIG. 5 is a schematic view of another embodiment of the present invention, illustrating another first mask.

FIG. 6 is a schematic diagram of a first mask according to another embodiment of the present invention.

FIG. 7 is a schematic diagram of a second mask according to another embodiment of the present invention.

FIG. 8A is a schematic view of an embodiment of the present invention illustrating a first mask of a mask set. FIG.

FIG. 8B is a schematic view of an embodiment of the present invention, illustrating a second mask of the mask set.

9A is a schematic view of an embodiment of the present invention illustrating a first mask of a mask set.

9B is a schematic view of an embodiment of the present invention illustrating a second mask of a mask set.

Figure 10 is a flow chart showing an embodiment of a method of surface treatment according to an embodiment of the present invention.

1A is a schematic view of an embodiment of a mirror system 1a illustrating an embodiment of the present invention. 1B is a schematic view of an embodiment of a mirror system 1b illustrating an embodiment of the present invention. Referring to FIG. 1A, the mirror system 1a can include two electrodes 11 and a plasma controller 12, wherein the two electrodes 11 are coupled to the plasma controller 12. The plasma controller 12 controls a displacement current to excite the plasma, wherein the plasma can serve as a surface treatment energy for surface treatment of the mold or master 2. The plasma controller 12 can include a power supply and associated auxiliary circuitry.

In an embodiment, the plasma comprises a low temperature plasma. In one embodiment, the plasma comprises an atmospheric glow plasma. In one embodiment, the plasma can be produced using a Corona Discharge. In one embodiment, the plasma can be produced using Dielectric Barrier Townsend Discharges.

When the master mold 2 of the mold is subjected to surface treatment, a plurality of masks 3 of the mask group are used. The masks 3 are used to shield different areas of the optical surface of the master 2, and at least some of the areas are partially overlapped. After surface treatment of the master 2 with a plurality of masks 3, the optical surface of the master 2 may have a plurality of regions having different surface properties (for example, hydrophilic properties); or the affinity or hydrophobicity of the optical faces of the master 2 It has a high and low undulation distribution; or the affinity or hydrophobicity of the optical surface of the master 2 is gradually distributed from the inside to the outside. In one embodiment, the mold is used to produce contact lenses.

Referring to Figure 1B, the mask 3 can be utilized in different surface treatment systems. The mirror system 1b includes a projection device 4 that provides surface treatment energy. In an embodiment, the surface treatment energy comprises ultraviolet light. In an embodiment, the surface treatment energy comprises short-wave ultraviolet light (UV-C).

2A is a top plan view of an embodiment of the present invention illustrating a mask 31 of a mask set. Figure 2B is a cross-sectional view taken along line 100-100 of Figure 2A. 3A is a schematic view of an embodiment of the present invention illustrating another mask 32 of the mask set. Figure 3B is a cross-sectional view along the cut line 200-200 of Figure 3A. Referring to FIGS. 2A-3B, the mask set includes a first mask 31 and a second mask 32. The first mask 31 and the second mask 32 respectively shield different regions on the optical surface 21 of the master 2.

Referring to FIGS. 2A and 2B, the first mask 31 includes a through hole 311 so that an annular region can be shielded. When the first mask 31 shields the master 2, the first mask 31 is in the master 2 The optical face 21 can shield an annular region 500, wherein the annular region 500 can define an interior region 501. When the surface treatment is performed, the first mask 31 can shield the surface treatment energy, so that the annular region 500 is less affected by the surface treatment energy, and the surface property of the annular region 500 is not changed significantly; or other surface-treated energy The surface properties of the annular region 500 are only slightly altered by the affected optical surface.

Referring to FIGS. 3A and 3B, the second mask 32 may at least shield a portion of the inner region 501 defined by the annular region 500 such that a portion of the inner region 501 is not affected by surface treatment energy, and thus After the mask 32 is subjected to the surface treatment of the optical surface 21 of the master 2, at least the surface property of the portion of the inner region 501 is not significantly changed or slightly changed before the treatment; and the surface properties of other portions of the optical surface 21 are significantly changed. Or drastically changed.

In an embodiment, the second mask 32 obscures the entire interior region 501.

In an embodiment, the inner region 501 can be an intermediate region of the optical surface 21, but the invention is not limited thereto.

In an embodiment, after the surface of the optical surface 21 of the master 2 is surface treated using the first mask 31 and the second mask 32, the optical surface 21 of the master 2 may be formed, the inner region of which has an outer region A smaller surface contact angle; or an inner region thereof having a larger surface free energy than the outer region.

In an embodiment, after the surface of the optical surface 21 of the master 2 is surface treated using the first mask 31 and the second mask 32, the optical surface 21 of the master 2 may be formed, the inner region of which has an outer region Greater adhesion.

In an embodiment, when surface treatment is performed using the first mask 31 and when surface treatment is performed using the second mask 32, both use the same surface treatment energy. In an embodiment, the surface treatment energy used in the two steps is different when the surface treatment is performed using the first mask 31 and when the surface treatment is performed using the second mask 32.

4 is a schematic view of an embodiment of the present invention illustrating regions or ranges that are masked by the first mask 31 and the second mask 32. Referring to FIG. 4, the first mask 31 can shield an annular region 41, wherein the annular region 41 is defined by an outer boundary 411 and an inner boundary 412. The second mask 32 can mask an area 42. Region 42 can be a complete or solid region. Region 42 can be defined by a boundary 421. In an embodiment, the boundary 421 of the region 42 may extend between the outer boundary 411 and the inner boundary 412. In an embodiment, the boundary 421 may overlap the inner boundary 412. In a In an embodiment, the boundary 421 may extend within the inner region 413 defined by the inner boundary 412 of the annular region 41.

In an embodiment, the inner region 413 can be circular. In an embodiment, the inner region 413 can be non-circular. In an embodiment, the inner boundary 412 includes at least a straight edge.

In an embodiment, the width w of the annular region 41 is uniform. In an embodiment, the width w of the annular region 41 is not uniform. In an embodiment, the annular region 41 has the same center of gravity or center or center as the inner region 413. In an embodiment, the annular region 41 and the inner region 413 have different centers of gravity or centers or centers. In an embodiment, the inner region 413 is adjacent a section of the outer boundary 411 away from the opposing section of the segment. In an embodiment, the shape of the inner region 413 is symmetrical. In an embodiment, the shape of the inner region 413 is asymmetrical.

Referring to FIG. 2B, when the first mask 31 shields the master 2, the first mask 31 extends at least partially into the mother mold 2. The inwardly extending portion includes an end through which the through hole 311 passes and an opening 312 is formed at the end. The first mask 31 includes a one side annulus 313. When the first mask 31 shields the master 2, the side annulus 313 is positioned within the master 2. The side annulus 313 is adjacent a corresponding portion of the optical surface 21 of the master 2, wherein the side annulus 313 is at least partially identical in shape to the corresponding portion. In other words, the side ring surface 313 is substantially the same as the spacing d _{1 of} the corresponding portion, wherein substantially the same also includes the distance of the corresponding point between the side ring surface 313 and the corresponding portion or the percentage difference of the distance does not exceed 30%. . In one embodiment, the spacing d ₁ between the side annulus 313 and the corresponding portion of the optical surface 21 is about 1 mm. Since the distance d ₁ between the side annular surface 313 and the corresponding portion on the optical surface 21 is small and the shapes are similar or the same, the optical surface 21 of the female mold 2 is close after surface treatment using the first mask 31. The change in surface properties of the side surface of the opening 22 is less pronounced, and the adhesion of the side surface can be made significantly smaller than the exposed inner region 501 on the optical surface 21.

In an embodiment, the side annulus 313 extends proximate the opening 312.

Referring to FIG. 2B, the first mask 31 includes an inner edge surface 314, wherein the inner edge surface 314 defines a portion of the through hole 311. The inner edge surface 314 is adjacent to the opening 312. In an embodiment, the inner edge surface 314 can be a curved surface. In an embodiment, the shape (or contour) of the inner rim surface 314 and the shape (or contour) of the side annulus 313 are the same or similar.

Referring to FIG. 3B, when the second mask 32 shields the master 2, the second mask 32 can at least partially extend into the master 2. The second mask 32 can include an end surface 321 and the end surface 321 can Positioned on the portion that extends into the master mold 2. When the second mask 32 shields the female mold 2, the end surface 321 may be adjacent to the inner region 501 of the female mold 2, facing the inner region 501.

In an embodiment, the end surface 321 can be a curved surface, but the invention is not limited thereto.

In an embodiment, the end surface 321 is at least partially identical or similar to the shape (or contour) of the inner region 501. In other words, the points on the inner region 501 are the same as the corresponding points on the end face 321 or the percentage difference in the pitch is not more than 30%. In an embodiment, the shape (or profile) of the end face 321 is different from the inner region 501.

Referring to FIG. 3B, the second mask 32 includes a side annulus 322 that surrounds the second mask 32. When the second mask 32 shields the master 2, the side annulus 322 is positioned within the master 2.

In an embodiment, the side annulus 322 can define a cylindrical shape, but the invention is not limited thereto.

In an embodiment, the maximum spacing d ₂ between the side annulus 322 and the optical surface 21 of the master _{2 is} no more than 2 mm. In an embodiment, the maximum spacing d ₂ is at the opening.

In one embodiment, the second mask 32 does not shield the surface of the optical surface 21 of the master 2 on the side, such that the side surface may be altered by surface treatment energy to alter its surface properties. In an embodiment, the portion of the side surface is located within the annular region 500. In an embodiment, the side surface may extend to the opening 22 of the female mold 2.

Referring to Figures 2B and 3B, in one embodiment, the first mask 31 has a cross section that is larger than the cross section of the second mask 32. In an embodiment, a dimension H ₁ on a cross section of the first mask 31 is greater than a dimension H ₂ on a cross section of the second mask 32, wherein the dimension H ₁ and the dimension H ₂ may represent a corresponding cross section. The size, the largest dimension in the cross section, the smallest dimension in the cross section, the diameter or the diagonal, and so on.

Referring to FIGS. 2B and 3B, in an embodiment, when the master 2 is shielded, the end of the second mask 32 may be closer to the bottom surface of the master 2 than the end of the first mask 31.

FIG. 5 is a schematic view of another embodiment of the present invention, illustrating another first mask 31a. Referring to FIGS. 2B and 5, the first mask 31a is similar to the first mask 31 shown in FIG. 2B, and the two are mainly different in that the first mask 31a has a flange 315. When the first mask 31a shields the master 2, the flange 315 may be located outside the master 2 and shield the side surface 316 on the optical surface 21 of the master 2, thus ensuring only the optical face 21 of the master 2 Upper inner area 501 and/or inner area The surface near the outer edge of 501 is surface treated. Moreover, in an embodiment, the first mask 31a may not have the inner edge surface 314 of the first mask 31.

FIG. 6 is a schematic diagram of a first mask 31b according to another embodiment of the present invention. FIG. 7 is a schematic diagram of a second mask 32b according to another embodiment of the present invention. Referring to Figure 6, the first mask 31b can be similar to a plate ring. The first mask 31b can shield an annular region. In an embodiment, the first mask 31b can have a thickness. In an embodiment, the first mask 31b may have a different thickness. In an embodiment, when the first mask 31b shields the master 2, the first mask 31b is located outside the master 2. In an embodiment, when the first mask 31b shields the master 2, the first mask 31b is positioned within the master 2.

Referring to FIG. 7, the second mask 32b is formed corresponding to the through hole 311 of the first mask 31b, so that the portion of the optical surface 21 of the female mold 2 exposed by the through hole 311 can be at least partially covered by the second mask 32b. . In an embodiment, the second mask 32b may be a plate shape, but the invention is not limited thereto. In an embodiment, when the second mask 32b shields the master 2, the second mask 32b may be located outside the master 2. In an embodiment, when the second mask 32b shields the master 2, the second mask 32b may be located within the master 2.

FIG. 8A is a schematic view of an embodiment of the present invention illustrating a first mask 31c of a mask set. FIG. 8B is a schematic view of an embodiment of the present invention, illustrating a second mask 32c of the mask set. Referring to FIGS. 8A and 8B, the first mask 31c and the second mask 32c are used for a mold or a male mold 5. The first mask 31c includes a through hole 311. The first mask 31c can shield an annular region on the optical surface 51 of the male mold 5; and the second mask 32c can be used to shield at least a portion of the inner region defined by the annular region.

In an embodiment, the second mask 32c shields the entire interior region defined by the annular region.

Referring to FIG. 8A, the first mask 31c includes an end surface 317. When the first mask 31c shields the male mold 5, the end surface 317 faces the male mold 5. In an embodiment, the end face 317 includes a curved surface. In an embodiment, the end surface 317 has the same outer contour as the corresponding portion on the optical surface 51 of the male mold 5; that is, the difference in the spacing between the end surface 317 and the corresponding portion on the optical surface 51 of the male mold 5 is the same or the percentage difference in the pitch ( The percentage difference) does not exceed 30%.

Referring to FIG. 8B, the second mask 32c includes an end surface 323. When the second mask 32c shields the male mold 5, the end surface 323 faces the male mold 5. In an embodiment, the end face 323 comprises Surface, but not invented is not limited to this. In one embodiment, the end face 323 and the optical face 51 of the male mold 5 are at least partially contoured identically.

FIG. 9A is a schematic view of an embodiment of the present invention, illustrating a first mask 31d of a mask set. FIG. 9B is a schematic view of an embodiment of the present invention, illustrating a second mask 32d of the mask set. Referring to Figures 9A and 9B, the first mask 31d can be similar to a plate ring and can cover an annular region. The second mask 32d can at least shield the portion of the optical surface 51 of the male mold 5 that is exposed by the first mask 31d. The second mask 32d may be a plate shape, but the invention is not limited thereto.

Figure 10 is a flow chart showing an embodiment of a method of surface treatment according to an embodiment of the present invention. Referring to Fig. 10, in step S81, a mold is first provided, wherein the mold has an optical surface. In an embodiment, the mold comprises a master mold 2. In an embodiment, the mold comprises a male mold 5. Thereafter, at least an annular region on the optical surface of the mold is shielded. Surface treatment energy is then provided to surface treat the optical surface that shields the mold. Since the annular region is shielded, the annular region can be at least less affected by the surface treatment energy. In an embodiment, the surface treatment method may shield the optical surface of the mold with a first mask (31, 31a, 31b, 31c or 31d) having a through hole.

Referring to Fig. 10, in step S83, at least a portion of the inner region defined by the annular region on the optical surface of the mold is shielded. Next, surface treatment energy is provided to surface treat the optical surface of the mold. Since the inner region is shielded, the inner region is less affected by the surface treatment energy. In an embodiment, the surface treatment method may shield the interior region with a solid second mask (32, 32b, 32c or 32d).

In an embodiment, the surface processing method may first perform step S81 and then perform step S83. In an embodiment, the surface processing method may first perform step S83 and then perform step S81.

In an embodiment, the first mask (31, 31a, 31b, 31c or 31d) comprises an insulating material such as bakelite (phenolic resin) or engineering plastic. In an embodiment, the second mask (32, 32b, 32c or 32d) comprises an insulating material such as bakelite (phenolic resin) or engineering plastic.

In an embodiment, after the first mask (31, 31a, or 31b, 31c or 31d) and the second mask (32, or 32b, 32c or 32d) are respectively used to surface-treat the optical surface of the mold, the mold is The surface free energy of the optical surface is gradually reduced from the inside to the outside.

In at least some embodiments, the optical surfaces of the mold are separated at different locations The surface free energy of the optical surface of the mold is non-uniformly high or consistently low, so that the lens is prevented from being too tightly attached to the mold or attached to the mold.

The technical content and technical features of the present disclosure have been disclosed as above, and those skilled in the art can still make various substitutions and modifications without departing from the spirit and scope of the disclosure. Therefore, the scope of the present disclosure is not to be construed as being limited by the scope of

2‧‧‧Female model

21‧‧‧Optical surface

22‧‧‧ openings

31‧‧‧ first mask

311‧‧‧through hole

312‧‧‧ openings

313‧‧‧ side torus

314‧‧‧ inner edge

500‧‧‧ring area

501‧‧‧Internal area

d ₁ ‧‧‧ spacing

H ₁ ‧‧‧ size

Claims (10)

A mask set for mold surface treatment, comprising: a first mask having a through hole for shielding an annular region on an optical surface of a mold; and a second mask for at least A portion of the inner region defined by the annular region is shielded. The mask set according to claim 1, wherein the mold is selected from one of a master mold and a male mold. The mask set of claim 2, wherein the second mask comprises an end surface having at least a partial outline identical to the outer contour of the optical surface. The mask set of claim 3, wherein the second mask comprises a side annulus, wherein the side annulus and the optical side of the mold are when the second mask shields the mold The spacing is no more than 2 mm. The mask set of claim 3, wherein the first mask comprises a one-sided annulus, wherein the side annulus and the optical surface of the mold are when the first mask shields the mold The spacing is 1 mm. A surface treatment method comprising: masking an annular region on an optical surface of a mold by using a first mask having a through hole, so that the annular region is not affected by a surface treatment energy; The second mask obscures at least a portion of the inner region defined by the annular region such that the portion is unaffected by the surface treatment energy. The surface treatment method according to claim 6, wherein the mold The system can be selected as one of a female mold and a male mold. The surface treatment method of claim 7, wherein the first mask comprises a one-sided annulus, the distance between the side annulus and the optical surface of the mold when the first mask shields the mold It is 1 mm. The surface treatment method of claim 7, wherein the second mask comprises an end surface having at least a partial outline identical to the outer contour of the optical surface. The surface treatment method of claim 9, wherein the second mask comprises a one-sided annulus, wherein the side annulus is away from the optical surface of the mold when the second mask shields the mold The spacing is no more than 2 mm.