TW201445109A - Three-dimensional profile acquisition device, pattern inspection apparatus, and three-dimensional profile acquisition method - Google Patents

Three-dimensional profile acquisition device, pattern inspection apparatus, and three-dimensional profile acquisition method Download PDF

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TW201445109A
TW201445109A TW103117065A TW103117065A TW201445109A TW 201445109 A TW201445109 A TW 201445109A TW 103117065 A TW103117065 A TW 103117065A TW 103117065 A TW103117065 A TW 103117065A TW 201445109 A TW201445109 A TW 201445109A
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light
scanning
unit
interference grating
interference
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Tomohiro Murakami
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Inspec Inc
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Abstract

A three-dimensional profile acquisition device includes: a light source (43) emitting light with broader spectrum width, an interferometer (42) having a scanning part (55) and an imaging part (41), the scanning part (55) being configured to scan at a crisscross direction along the inspected plane (12a), wherein the scanning part (55) divides the light emitted from the light source (43) into a measuring light beam and a reference light beam, the inspected plane (12a) reflecting the measuring light beam, a reference mirror (49) reflecting the reference light beam, such that the first reflected light from the inspected plane (12a) and the second reflected light from the reference mirror (49) are converged to generate an interference fringe, the imaging part (41) using the exposure time above the cycle of the interference fringe to image the first reflected light and the second reflected light as a plurality of images; a control part (60) for controlling the scanning part (55) to perform scanning at a crisscross direction along the inspected plane (12a), and controlling the light source (43) to blink as the same cycle as the interference fringe; and an image resolving part (32) for inspecting the peak position of the interference fringe at the scanning direction of the scanning part (55) according to the plurality of images imaged by the imaging part (41) for each pixel of the images, and generating three-dimensional profile according to the peak position of each pixel inspected.

Description

三維輪廓取得裝置、型樣檢測裝置及三維輪廓取得方法 Three-dimensional contour acquisition device, pattern detection device and three-dimensional contour acquisition method

本發明為有關一種光學性測定被測定面之高度分布而取得三維輪廓的三維輪廓取得裝置、具備三維輪廓取得裝置的型樣檢測裝置、以及三維輪廓取得方法。 The present invention relates to a three-dimensional contour acquiring device that optically measures a height distribution of a surface to be measured, obtains a three-dimensional contour, a pattern detecting device including a three-dimensional contour acquiring device, and a three-dimensional contour acquiring method.

作為此種三維輪廓取得裝置,已知有使用干涉儀之異物檢測裝置(例如,專利文獻1)、使用干涉儀之深度測定裝置(例如,專利文獻2)、以及使用干涉儀之表面形狀測定裝置(例如,專利文獻3)。 As such a three-dimensional contour acquisition device, a foreign matter detecting device using an interferometer (for example, Patent Document 1), a depth measuring device using an interferometer (for example, Patent Document 2), and a surface shape measuring device using an interferometer are known. (for example, Patent Document 3).

例如,記載於專利文獻1的異物檢測裝置為包含具有雷射光源之干涉儀,藉由雷射干涉法檢查異物。因此,當有兩道相異光程之雷射光匯合的情況下,不會因為兩道雷射光之光程差有所改變,而是經常性的產生干涉光柵,造成難以實施檢查對象面之高度分布的計測。 For example, the foreign matter detecting device described in Patent Document 1 includes an interferometer including a laser light source, and the foreign matter is inspected by a laser interference method. Therefore, when there are two laser beams with different optical paths converging, the optical path difference between the two laser beams is not changed, but the interference grating is often generated, which makes it difficult to carry out the height distribution of the inspection object surface. Measurement.

對此,專利文獻2及專利文獻3中所記載的測定裝置,包含有發出白光光源的干涉儀,利用白光干涉法而測定深度或是表面形狀。亦即,在專利文獻2所記載的深度測定裝置中,分光器為將白光光束區分為:通過接物透鏡,用以投射至試料的測定光束、以及用以反射至參考鏡的參考光束。光柵掃描手段係使測定光束與參考光束之間的相對光程長度差值產生變化。藉由匯合來自試料之反射光與來自參考鏡之反射光而產生干涉光束。光線檢測手段(例如,線感測器)為接收干涉光束、產生光柵掃描訊 號。訊號處理迴路為依據來自光線檢測手段(例如,線感測器)之光柵掃描訊號的變位資訊、以及接物透鏡與試料間之相對位置資訊,產生凹部的深度資訊。 In contrast, the measurement device described in Patent Document 2 and Patent Document 3 includes an interferometer that emits a white light source, and measures the depth or the surface shape by a white light interference method. That is, in the depth measuring device described in Patent Document 2, the spectroscope divides the white light beam into a measuring beam for projecting to the sample through the object lens, and a reference beam for reflecting to the reference mirror. The raster scanning means changes the relative optical path length difference between the measuring beam and the reference beam. An interference beam is generated by converging the reflected light from the sample with the reflected light from the reference mirror. Light detection means (for example, line sensor) for receiving an interference beam and generating a raster scan signal number. The signal processing circuit generates depth information of the concave portion based on the displacement information of the raster scanning signal from the light detecting means (for example, the line sensor) and the relative position information between the receiving lens and the sample.

此外,於專利文獻3所記載的表面形狀測定裝置中,來自白光光源之白光,係通過帶通濾波器而被限定在特定的頻率光譜中,該白光為藉由驅動部,照射至相對距離呈變動的參照面及測定對象面。合成來自參照面之反射光與來自測定對象面之反射光,因應所合成之兩道反射光的光程差而產生干涉光柵。CCD攝影機為連同干涉光柵,同時進行測定對象面的成像。CPU則是以預定的取樣間隔,對測定對象面之特定處產生變化的干涉光之強度值進行取樣。再者,CPU為依據其特定頻率光譜之光譜寬度,推定具有與干涉光之波峰位置為一致之波峰位置的特定函數。藉由求出該特性函數之波峰位置的高度,CPU得以測定對象面之凹凸形狀。 Further, in the surface shape measuring apparatus described in Patent Document 3, the white light from the white light source is limited to a specific frequency spectrum by a band pass filter, and the white light is irradiated to a relative distance by the driving portion. The changed reference surface and the measurement target surface. The reflected light from the reference surface and the reflected light from the surface of the measurement target are combined, and an interference grating is generated in response to the optical path difference of the two reflected light beams. The CCD camera performs imaging of the measurement target surface together with the interference grating. The CPU samples the intensity value of the interference light that changes at a specific portion of the measurement target surface at a predetermined sampling interval. Furthermore, the CPU estimates a specific function having a peak position that coincides with the peak position of the interference light based on the spectral width of the specific frequency spectrum. By determining the height of the peak position of the characteristic function, the CPU can measure the uneven shape of the object surface.

【先行技術文獻】 [First technical literature] 【專利文獻】 [Patent Literature]

【專利文獻1】日本專利特開平10-293100號公報。 [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 10-293100.

【專利文獻2】日本專利特開2009-36563號公報。 [Patent Document 2] Japanese Laid-Open Patent Publication No. 2009-36563.

【專利文獻3】日本專利特開2001-66122號公報。 [Patent Document 3] Japanese Laid-Open Patent Publication No. 2001-66122.

然而,當使用專利文獻2所記載之白光干涉法的測定裝置時,會因為干涉光柵波長之1/3以下的較短取樣頻率(掃描距離為100nm以下)(專利文獻2之例中為5nm),而造成須利用光線檢測手段,在 干涉光柵的單一週期之間進行複數次(三次以上)的成像處理。在此情況下,當將沿著與被測定面垂直之方向進行掃描的掃描距離設定成例如50μm時,則一次的掃描作業必須要對數百張~1000張程度的圖像進行成像,而具有測定時間變得相當冗長之課題存在。 However, when the measuring device of the white light interferometry described in Patent Document 2 is used, the short sampling frequency (the scanning distance is 100 nm or less) of 1/3 or less of the interference grating wavelength (5 nm in the example of Patent Document 2) And caused by the use of light detection means, Multiple (more than three) imaging processes are performed between single cycles of the interference grating. In this case, when the scanning distance to be scanned in the direction perpendicular to the surface to be measured is set to, for example, 50 μm, the scanning operation of one time must image an image of several hundred to 1000 degrees, and have The problem that the measurement time becomes quite lengthy exists.

此外,在專利文獻3中所記載之使用白光干涉法的表面形狀測定裝置中,由於可以較干涉光柵之週期還長的時間間隔進行取樣,故而在一次的掃描作業下,以攝影機所成像之圖像張數可較為減少。不過,因為推定特定函數的演算需要時間,所以即便是可減少取樣次數,但是卻無法使得表面形狀測定處理變得高速化。 Further, in the surface shape measuring apparatus using the white light interferometry described in Patent Document 3, since the sampling can be performed at a time interval longer than the period of the interference grating, the image imaged by the camera is performed in one scanning operation. The number of sheets can be reduced. However, since it takes time to estimate the calculation of the specific function, even if the number of samplings can be reduced, the surface shape measurement processing cannot be speeded up.

本發明之目的,在於提供一種可藉由較簡單的處理、較高速的取得表示被測定面高度分布之三維輪廓的三維輪廓取得裝置、型樣檢測裝置及三維輪廓取得方法。 It is an object of the present invention to provide a three-dimensional contour acquisition device, a pattern detection device, and a three-dimensional contour acquisition method that can obtain a three-dimensional contour indicating a height distribution of a surface to be measured by a relatively simple process.

本發明的一個面向在於提供一種三維輪廓取得裝置,其具備有:光源,其所發出的光線具有較寬的頻譜寬度;包含掃描部及成像部的干涉儀,前述掃描部構成為可沿著對被測定面交叉的方向進行掃描,其中,前述掃描部為將來自前述光源的光線分離成測定光束與參考光束,藉由前述被測定面反射前述測定光束,且藉由參考鏡反射前述參考光束,使來自前述被測定面的第1反射光與來自前述參考鏡的第2反射光匯合,而可產生干涉光柵,前述成像部則是以前述干涉光柵之週期以上的曝光時間,成像前述第1反射光及前述第2反射光之影像為複數個圖像;控制部,其係將前述掃描部控制成沿著對於被測定面交叉的方向進行掃描,且使前述光 源控制成與前述干涉光柵的週期為相同週期之狀態下進行點滅閃爍;以及,圖像解析部,其為依據藉由前述成像部所成像之前述複數個圖像,分別於圖像之各個像素,檢測出在前述掃描部之掃描方向的干涉光柵之波峰位置,依據所檢測出在各個像素的波峰位置而產生三維輪廓。 An aspect of the present invention provides a three-dimensional contour acquisition device including: a light source having a wide spectral width; and an interferometer including a scanning portion and an imaging portion, the scanning portion being configured to be along the pair Scanning in a direction in which the measurement surface intersects, wherein the scanning unit separates the light from the light source into a measurement beam and a reference beam, and the measurement surface reflects the measurement beam, and the reference beam is reflected by the reference mirror. The first reflected light from the surface to be measured is merged with the second reflected light from the reference mirror to generate an interference grating, and the imaging portion is formed by imaging the first reflection at an exposure time of a period equal to or longer than the period of the interference grating The light and the image of the second reflected light are a plurality of images; and the control unit controls the scanning unit to scan in a direction intersecting the measurement surface, and to cause the light to be The source is controlled to perform dot-off flicker in a state in which the period of the interference grating is the same period; and an image analyzing unit that is respectively formed in the image according to the plurality of images imaged by the image forming unit The pixel detects the peak position of the interference grating in the scanning direction of the scanning unit, and generates a three-dimensional contour in accordance with the detected peak position of each pixel.

在上述構造中,前述控制部用於使前述掃描部沿著對被測定面交叉的方向進行往復動作,且使前述光源於前述掃描部進給時與返回時之間,錯開前述光源點滅的相位為較佳。 In the above configuration, the control unit is configured to reciprocate the scanning unit in a direction intersecting the measurement surface, and to shift the light source between the scanning unit and the returning time. The phase is preferred.

在上述構造中,前述三維輪廓取得裝置更具備有光感測器,其受光有局部之朝向前述成像部的前述第1反射光與第2反射光,產生表示前述第1反射光與第2反射光之局部受光量的受光訊號;前述控制部較佳為依據前述光感測器之受光訊號,使前述光源以與前述干涉光柵呈相同相位進行點滅閃爍。 In the above configuration, the three-dimensional contour acquiring device further includes a photo sensor that receives the first reflected light and the second reflected light that partially face the imaging portion, and generates the first reflected light and the second reflected light. Preferably, the control unit is configured to cause the light source to blink in the same phase as the interference grating according to the received light signal of the photo sensor.

在上述構造中,前述成像部的曝光時間較佳為,設定在前述干涉光柵之發生期間的1/4~1/3範圍內之值。 In the above configuration, the exposure time of the image forming portion is preferably set to a value within a range of 1/4 to 1/3 of the period during which the interference grating is generated.

本發明的一個面向在於提供一種型樣檢測裝置,具備有基於成像有配線基板之配線型樣的圖像,檢查配線是否有缺陷的型樣檢查部,且具備有上述三維輪廓取得裝置,以及驗證部,基於以前述三維輪廓取得裝置所產生的三維輪廓,驗證由前述型樣檢查部所檢測而出之前述缺陷之真偽。 An aspect of the present invention provides a pattern detecting device including a pattern inspection unit that detects whether a wiring is defective based on an image on which a wiring pattern of a wiring board is formed, and includes the three-dimensional contour acquiring device and verification The part verifies the authenticity of the defect detected by the pattern inspection unit based on the three-dimensional contour generated by the three-dimensional contour acquisition device.

本發明的一個面向在於提供一種取得三維輪廓的方法,所具備的步驟有:干涉形成步驟,為將干涉儀之掃描部沿著對被測定面交叉的方向進行掃描,且將由光源發出之具有較廣頻譜寬度的光,分離成測定光束 與參考光束,以前述被測定面反射前述測定光束,以參考鏡反射前述參考光束,使來自前述被測定面的第1反射光與來自前述參考鏡的第2反射光匯合、產生干涉光柵;發光控制步驟,為使前述光源在與前述干涉光柵週期為相同的週期下進行點滅閃爍;成像步驟,為藉由前述干涉儀之成像部,在前述干涉光柵之週期以上的曝光時間中,成像前述第1反射光及前述第2反射光之影像為複數個圖像;輪廓生成步驟,為依據藉由前述成像部所成像之前述複數個圖像,分別於圖像之各個像素中,檢測出在前述掃描部之掃描方向的干涉光柵之波峰位置,依據檢測而得之各個像素的前述波峰位置,產生三維輪廓。 One aspect of the present invention provides a method for obtaining a three-dimensional contour, comprising the steps of: an interference forming step of scanning a scanning portion of the interferometer along a direction intersecting the surface to be measured, and having a light source Wide spectrum width of light, separated into measuring beams And the reference beam, the measuring beam is reflected by the surface to be measured, and the reference beam is reflected by the reference mirror, and the first reflected light from the surface to be measured is merged with the second reflected light from the reference mirror to generate an interference grating; The controlling step is such that the light source is flash-off at the same period as the period of the interference grating; and the imaging step is to image the exposure time of the period of the interference grating by the imaging portion of the interferometer The image of the first reflected light and the second reflected light is a plurality of images; and the contour generating step is detected in each pixel of the image based on the plurality of images imaged by the imaging unit The peak position of the interference grating in the scanning direction of the scanning unit generates a three-dimensional contour based on the peak position of each pixel obtained by the detection.

若藉由本發明,可以較為簡單的處理、且較快的速度,取得表示被測定面之高度分布的三維輪廓。 According to the present invention, it is possible to obtain a three-dimensional contour indicating the height distribution of the surface to be measured with relatively simple processing and at a relatively high speed.

11‧‧‧型樣檢測裝置 11‧‧‧Model test device

12‧‧‧配線基板 12‧‧‧Wiring substrate

12a‧‧‧被測定面 12a‧‧‧Measured surface

21‧‧‧三維輪廓取得裝置 21‧‧‧3D contour acquisition device

31‧‧‧作為檢查部之一例的型樣檢查部 31‧‧‧The type inspection department as an example of the inspection department

32‧‧‧圖像解析部 32‧‧‧Image Analysis Department

33‧‧‧驗證部 33‧‧‧Verification Department

36‧‧‧配線 36‧‧‧Wiring

41‧‧‧作為成像部之一例的攝影機 41‧‧‧A camera as an example of the imaging department

42‧‧‧干涉儀 42‧‧‧Interferometer

43‧‧‧光源 43‧‧‧Light source

48‧‧‧半反射鏡 48‧‧‧Half mirror

49‧‧‧參考鏡 49‧‧‧ reference mirror

50‧‧‧致動器 50‧‧‧Actuator

55‧‧‧掃描部 55‧‧‧Scanning Department

56‧‧‧光感測器 56‧‧‧Light sensor

60‧‧‧控制部 60‧‧‧Control Department

65‧‧‧構成控制部之一例的發光控制部 65‧‧‧Lighting control unit constituting one example of the control unit

IF‧‧‧干涉光柵 IF‧‧ interference grating

Te‧‧‧曝光時間 Te‧‧‧Exposure time

A、B‧‧‧像素 A, B‧‧ ‧ pixels

Za、Zb‧‧‧波峰位置 Za, Zb‧‧·peak position

PD‧‧‧三維輪廓 PD‧‧‧3D contour

圖1所示之模式斜視圖,為表示在一實施形態中之型樣檢測裝置。 Fig. 1 is a perspective view showing a pattern detecting device in an embodiment.

圖2所示為配線基板的模式局部斷面圖。 Fig. 2 is a schematic partial cross-sectional view showing a wiring board.

圖3所示為三維輪廓取得裝置的模式圖。 Fig. 3 is a schematic view showing a three-dimensional contour acquisition device.

圖4所示之模式圖,為說明在三維光學單元中之白光干涉法的原理。 The schematic diagram shown in Figure 4 illustrates the principle of white light interferometry in a three-dimensional optical unit.

圖5所示圖表,為表示因光程差所造成的干涉光柵。 The graph shown in Fig. 5 is an interference grating which is caused by the optical path difference.

圖6所示之模式斜視圖,為表示具有段差的配線基板。 Fig. 6 is a perspective view showing a wiring board having a step.

圖7所示之圖表,為分別在成像高度相異之面的兩個像素之 間,比較干涉光柵之波峰位置。 The graph shown in Figure 7 is two pixels on the opposite side of the imaging height. Compare the peak position of the interference grating.

圖8所示之圖表,為表示干涉波形、LED驅動波形、攝影機輸入光波形及攝影機輸出的關係。 The graph shown in Fig. 8 shows the relationship between the interference waveform, the LED drive waveform, the camera input light waveform, and the camera output.

圖9所示之圖表,為表示測定時的掃描位置、干涉波形、LED驅動波形及攝影機成像輝度的關係。 The graph shown in FIG. 9 shows the relationship between the scanning position, the interference waveform, the LED driving waveform, and the imaging brightness of the camera at the time of measurement.

圖10(a)所示之圖表,為表示在進給掃描時與返回掃描時中,對於其中一方掃描位置的干涉波形、LED驅動波形、攝影機輸入光波形、攝影機輸出的關係,圖10(b)則為另一方之圖表。 Fig. 10 (a) is a graph showing the relationship between the interference waveform, the LED drive waveform, the camera input light waveform, and the camera output at one of the scanning positions during the feed scanning and the return scanning, Fig. 10 (b) ) is the chart for the other party.

圖11所示之流程圖,為表示三維輪廓取得處理的步驟。 The flowchart shown in Fig. 11 is a step showing the three-dimensional contour acquisition processing.

以下,使用圖1~圖11,針對在一實施形態中具備有三維輪廓取得裝置(被測定面之面狀計測裝置)的型樣檢測裝置進行說明。 In the following, a pattern detecting device including a three-dimensional contour acquiring device (a planar measuring device for measuring a surface) will be described with reference to FIG. 1 to FIG.

如圖1所示,型樣檢測裝置11為對形成在配線基板12之配線型樣檢查是否有缺陷存在。型樣檢測裝置11包含有支撐座13、設於支撐座13上面的可動式台座14、跨過台座14而架設的門型支撐框架15、固定在支撐框架15之橫桿15a的軌道16、以及可將配線基板12進行成像而懸掛至軌道16的成像單元17。例如,支撐座13具有四角箱狀。 As shown in FIG. 1, the pattern detecting device 11 checks whether or not a wiring pattern formed on the wiring substrate 12 is defective. The pattern detecting device 11 includes a support base 13, a movable pedestal 14 provided on the support base 13, a sill-type support frame 15 spanned across the pedestal 14, a rail 16 fixed to the crossbar 15a of the support frame 15, and The wiring substrate 12 can be imaged and suspended to the imaging unit 17 of the track 16. For example, the support base 13 has a rectangular box shape.

成像單元17包含有高解析度透鏡18與攝影機19。例如,攝影機19為採用面攝影機。型樣檢測裝置11進行型樣檢查,其係依據攝影機19所成像之配線基板12的圖像,對配線基板12的配線進行是否存在有缺陷的檢查。然而,型樣檢查之缺陷檢測精度由於有其極限,因 此利用型樣檢查所檢測出作為缺陷候選的配線,必須要依據配線基板12之高度分布資訊來驗證缺陷的真偽。 The imaging unit 17 includes a high resolution lens 18 and a camera 19. For example, the camera 19 is a face camera. The pattern detecting device 11 performs pattern inspection for checking whether or not there is a defect in the wiring of the wiring substrate 12 based on the image of the wiring substrate 12 imaged by the camera 19. However, the defect detection accuracy of the type inspection has its limit, because This wiring which is detected as a defect candidate by the pattern inspection must verify the authenticity of the defect based on the height distribution information of the wiring substrate 12.

在本實施形態之型樣檢測裝置11中,為了進行上述驗證,搭載有三維光學單元20。三維光學單元20所成像的圖像,為用以計測配線基板12之被測定面12a的高度分布。 In the pattern detecting device 11 of the present embodiment, the three-dimensional optical unit 20 is mounted in order to perform the above verification. The image formed by the three-dimensional optical unit 20 is used to measure the height distribution of the surface to be measured 12a of the wiring substrate 12.

當將被測定面12a制定成XY平面的情況下,三維光學單元20構成有三維輪廓取得裝置21的一部份,以取得表示該被測定面12a之高度分布的三維輪廓((x,y,z)座標群)。三維光學單元20所成像的圖像,用以取得在配線基板12檢查對象區域內之被測定面12a(二維平面)上表示高度分布的三維輪廓。 When the measurement surface 12a is set to the XY plane, the three-dimensional optical unit 20 is formed with a part of the three-dimensional contour acquisition device 21 to obtain a three-dimensional contour ((x, y,) indicating the height distribution of the measured surface 12a. z) Coordinate group). The image formed by the three-dimensional optical unit 20 is used to acquire a three-dimensional contour indicating a height distribution on the surface to be measured 12a (two-dimensional plane) in the inspection target region of the wiring substrate 12.

型樣檢測裝置11例如包含有控制器23,其係設在支撐座13內,且驅動控制各個構成部分。控制器23係為,例如進行台座14的移動控制、控制以攝影機19所進行之成像控制等的型樣檢查、且控制三維光學單元20之驅動。 The pattern detecting device 11 includes, for example, a controller 23 which is provided in the support base 13 and drives and controls each component. The controller 23 is configured to perform, for example, movement control of the pedestal 14, control of pattern inspection by the camera 19, and control of driving of the three-dimensional optical unit 20.

此外,型樣檢測裝置11包含有例如個人電腦等之電腦25。電腦25包含有本體26、由鍵盤及滑鼠等所構成之輸入裝置27、以及監視器28。在本體26內的硬碟(未圖示)中,儲存有各種進行配線基板12之配線型樣檢查及缺陷候選驗證等的程式。另外,本體26包含有圖像處理迴路,其係依據由攝影機19所提供的成像圖像,測量配線基板12之被測定面12a的高度分布。作為以運作程式的CPU及圖像處理迴路等所構成機能部分,本體26包含有於圖1所示之檢查部31、圖像解析部32、以及驗證部33(校核部)等。 Further, the pattern detecting device 11 includes a computer 25 such as a personal computer. The computer 25 includes a main body 26, an input device 27 composed of a keyboard, a mouse, and the like, and a monitor 28. In a hard disk (not shown) in the main body 26, various programs for performing wiring pattern inspection and defect candidate verification of the wiring substrate 12 are stored. Further, the main body 26 includes an image processing circuit that measures the height distribution of the surface to be measured 12a of the wiring substrate 12 in accordance with the imaged image supplied from the camera 19. The main body 26 includes the inspection unit 31, the image analysis unit 32, the verification unit 33 (calibration unit), and the like shown in FIG. 1 as a functional portion of the CPU and the image processing circuit.

圖1所示之檢查部31所進行的型樣檢查為,依據攝影機19所成像的圖像,對配線基板12之配線型樣檢查是否存在有缺陷。檢查部31則是進行,作為用以進行型樣檢查的圖像處理而實施型樣匹配處理、或是遲延自我比較處理等的已知處理,檢查出缺陷。圖像解析部32則為,解析以三維光學單元20所成像之複數個圖像,計算測量被測定面12a的高度分布,藉此產生被測定面12a的高度分布為以三維座標所表示之三維輪廓。此外,驗證部33係為在檢查部31的檢查中,針對在真偽方面有所疑慮之缺陷候選,依據圖像解析部32取得之三維輪廓,而驗證(校核)其真偽。 The pattern inspection performed by the inspection unit 31 shown in Fig. 1 is such that the wiring pattern of the wiring substrate 12 is inspected for defects in accordance with the image formed by the camera 19. The inspection unit 31 performs the known processing such as pattern matching processing or delayed self-comparison processing for performing image processing for pattern inspection, and detects defects. The image analysis unit 32 analyzes a plurality of images imaged by the three-dimensional optical unit 20, and calculates a height distribution of the measured surface 12a, thereby generating a height distribution of the measured surface 12a as a three-dimensional coordinate. profile. In addition, the verification unit 33 verifies (verifies) the authenticity of the defect candidate which is suspected in the authenticity based on the three-dimensional contour acquired by the image analysis unit 32 in the inspection by the inspection unit 31.

如圖2所示,配線基板12包含有基板35、以及形成在基板35之被測定面12a的複數個配線36。由於要求配線36的高密度化,因而造成相對於配線36寬度之高度比例的長寬比相對性的變高。在分析被測定面12a之二維圖像、檢測出缺陷的型樣檢查中,如圖2所示,將難以識別形成在配線36上端面之氧化膜36a、位於配線36上端部之凹部36b、配線36高度方向上之缺損一半以上的缺損部36c。例如,由於氧化膜36a已確保配線36的電性阻抗達規定以上,故非為缺陷。另外,凹部36b若為相當淺時,將不視作缺陷。不過,當凹部36b具有一定深度以上的情況下,由於凹部36b會造成配線36的電性阻抗的增大,進而成為缺陷。另一方面,由於缺損部36c會使配線36的電性阻抗顯著增大,進而成為缺陷。因此,在本實施形態的型樣檢查中,依據使用白光干涉法測定被測定面12a之高度分布所得的三維輪廓,使得難以識別的氧化膜36a、凹部36b及缺損部36c的缺陷候選得以 驗證其真偽。 As shown in FIG. 2, the wiring board 12 includes a substrate 35 and a plurality of wirings 36 formed on the surface 12a to be measured of the substrate 35. Since the density of the wiring 36 is required to be increased, the aspect ratio of the height ratio of the width of the wiring 36 is increased. In the pattern inspection for analyzing the two-dimensional image of the surface to be measured 12a and detecting the defect, as shown in FIG. 2, it is difficult to recognize the oxide film 36a formed on the upper end surface of the wiring 36, the concave portion 36b located at the upper end portion of the wiring 36, The defect portion 36c is half or more of the wire 36 in the height direction. For example, since the oxide film 36a ensures that the electrical impedance of the wiring 36 is equal to or greater than a predetermined value, it is not a defect. Further, if the concave portion 36b is relatively shallow, it will not be regarded as a defect. However, when the concave portion 36b has a certain depth or more, the concave portion 36b causes an increase in the electrical impedance of the wiring 36, which further becomes a defect. On the other hand, the defective portion 36c significantly increases the electrical impedance of the wiring 36, and further becomes a defect. Therefore, in the pattern inspection of the present embodiment, the three-dimensional contour obtained by measuring the height distribution of the surface to be measured 12a by the white light interferometry is used, so that the defect candidates of the oxide film 36a, the recess 36b, and the defect portion 36c which are difficult to recognize can be obtained. Verify its authenticity.

接著,利用圖3來說明三維輪廓取得裝置21之細部構造。 Next, the detailed structure of the three-dimensional contour acquiring device 21 will be described with reference to Fig. 3 .

如圖3所示,三維輪廓取得裝置21包含有三維光學單元20與控制裝置40。控制裝置40係以控制三維光學單元20的控制器23之局部、以及取得三維輪廓作業中進行必要處理的電腦25之局部所構成。 As shown in FIG. 3, the three-dimensional contour acquisition device 21 includes a three-dimensional optical unit 20 and a control device 40. The control device 40 is constituted by a part of the controller 23 that controls the three-dimensional optical unit 20 and a part of the computer 25 that performs necessary processing in the three-dimensional contour operation.

如圖3所示,三維光學單元20所包含的干涉儀42,具有作為成像部之一例的攝影機41。作為一例,干涉儀42為邁克生型干涉儀(Michelson Interferometer)。干涉儀42包含有發出具有較廣頻譜寬度之光(例如,白光)的光源43(作為一例為白光光源)、聚光透鏡44、光學濾波器45、半反射鏡46、接物透鏡47、半反射鏡48、參考鏡49、壓電式之致動器50、成像透鏡51、以及前述之攝影機41。在攝影機41下部,設置具有與攝影機41光軸同軸的鏡筒52。在鏡筒52內,沿著光軸方向依序隔開指定間隔,配置接物透鏡47、半反射鏡46、成像透鏡51、半反射鏡53。 As shown in FIG. 3, the interferometer 42 included in the three-dimensional optical unit 20 has a camera 41 as an example of an image forming unit. As an example, the interferometer 42 is a Michelson Interferometer. The interferometer 42 includes a light source 43 (for example, a white light source) that emits light having a wide spectral width (for example, a white light source), a collecting lens 44, an optical filter 45, a half mirror 46, a receiver lens 47, and a half The mirror 48, the reference mirror 49, the piezoelectric actuator 50, the imaging lens 51, and the aforementioned camera 41. In the lower portion of the camera 41, a lens barrel 52 having a coaxiality with the optical axis of the camera 41 is provided. In the lens barrel 52, the target lens 47, the half mirror 46, the imaging lens 51, and the half mirror 53 are disposed at predetermined intervals in the optical axis direction.

圖3所示的光源43,包含有例如超高輝度LED。由光源43所射出的白光係以聚光透鏡44聚光,被聚光之光線則通過光學濾波器45,濾波成特定波長區域的光(頻譜寬度較廣的光)。被濾波之光線係以半反射鏡46的下面所反射,通過接物透鏡47及半反射鏡48而照射至配線基板12的被測定面12a。另外,光學濾波器45具有可將後述發生干涉光柵的期間(可干涉距離)調整為適當數值的機能。此外,尤其是當由光源43所發出的光線具有相當寬的頻譜寬度時,干涉光柵之波峰附近的頻率將不同於波峰周邊的頻率。因此,將光學濾波器45配置在光源 43與干涉儀42之間的目的在於,將來自光源43的光線色彩進行某種程度的限制,使得干涉光柵的頻率在其發生期間(可干涉距離)之全區域中靠近一既定頻率。特別是在不需要此種調整的情況下,亦可省略光學濾波器45。 The light source 43 shown in Fig. 3 includes, for example, an ultra-high luminance LED. The white light emitted from the light source 43 is condensed by the condensing lens 44, and the condensed light is filtered by the optical filter 45 into light of a specific wavelength region (light having a wide spectral width). The filtered light is reflected by the lower surface of the half mirror 46, and is irradiated to the to-be-measured surface 12a of the wiring board 12 by the contact lens 47 and the half mirror 48. Further, the optical filter 45 has a function of adjusting a period (interference possible distance) at which an interference grating is generated to an appropriate value. Moreover, especially when the light emitted by the light source 43 has a relatively wide spectral width, the frequency near the peak of the interference grating will be different from the frequency around the peak. Therefore, the optical filter 45 is disposed in the light source The purpose between the interferometer 42 and the interferometer 42 is to limit the color of the light from the source 43 to some extent such that the frequency of the interference grating approaches a predetermined frequency throughout the region during which it occurs (interferable distance). In particular, the optical filter 45 may be omitted in the case where such adjustment is not required.

半反射鏡48為被配置在接物透鏡47與配線基板12之間,其被架設為可連同接物透鏡47而沿著Z方向移動。在來自接物透鏡47的局部光線以半反射鏡48的上面所反射之方向(在圖3為左方)的延伸線上的位置,亦可連同半反射鏡48而沿著Z方向移動的狀態下配置參考鏡49。此外,參考鏡49係以固定在接物透鏡47之支撐構件54所支撐。所構成的掃描部55係為,接物透鏡47、半反射鏡48及參考鏡49可一體狀的沿著Z方向移動。掃描部55則形成為藉由壓電式致動器50的驅動,而可在沿著與配線基板12被測定面12a垂直的高度方向(Z方向)於指定的微量行程(例如,20~100μm範圍內的指定值)內進行移動。 The half mirror 48 is disposed between the object lens 47 and the wiring substrate 12, and is framed so as to be movable in the Z direction together with the object lens 47. The position at which the local ray from the objective lens 47 is reflected on the direction in which the upper surface of the half mirror 48 is reflected (leftward in FIG. 3) may be moved along the Z direction together with the half mirror 48. The reference mirror 49 is configured. Further, the reference mirror 49 is supported by a support member 54 fixed to the objective lens 47. The scanning unit 55 is configured such that the objective lens 47, the half mirror 48, and the reference mirror 49 are integrally movable in the Z direction. The scanning unit 55 is formed to be driven by the piezoelectric actuator 50 so as to be in a specified micro stroke along the height direction (Z direction) perpendicular to the measurement surface 12a of the wiring substrate 12 (for example, 20 to 100 μm). Move within the specified value within the range).

來自接物透鏡47之局部的光,為透過半反射鏡48再以配線基板12的被測定面12a反射,來自被測定面12a的第1反射光為再度透過半反射鏡48,由下側朝向接物透鏡47射入。另外,以半反射鏡48之上面所反射的來自接物透鏡47之其他局部的光線,為以參考鏡49反射,來自參考鏡49的第2反射光則再度以半反射鏡48的上面反射、由下側面而朝向接物透鏡47射入。第1反射光與第2反射光為在半反射鏡48的上面匯合。第1及第2反射光的光程差,會因應掃描部55的掃描位置而產生變化。當第1及第2反射光的光程差形成規定值以下 時,將藉由第1及第2反射光而形成干涉光柵(干涉條紋)。 The light from the portion of the objective lens 47 is reflected by the half mirror 48 and reflected on the surface 12a of the wiring substrate 12, and the first reflected light from the surface to be measured 12a is again transmitted through the half mirror 48, and is directed from the lower side. The contact lens 47 is incident. In addition, other portions of the light from the upper surface of the half mirror 48 that are reflected from the objective lens 47 are reflected by the reference mirror 49, and the second reflected light from the reference mirror 49 is again reflected by the upper surface of the half mirror 48. The lower side faces the entrance lens 47. The first reflected light and the second reflected light merge on the upper surface of the half mirror 48. The optical path difference between the first and second reflected lights changes depending on the scanning position of the scanning unit 55. When the optical path difference between the first and second reflected lights is equal to or less than a predetermined value At this time, an interference grating (interference fringe) is formed by the first and second reflected lights.

另外,在圖3所示的三維光學單元20中設有光感測器56(photo sensor),用以將在半反射鏡48的上面所匯合的局部第1及第2反射光進行受光。已匯合的局部之第1及第2反射光,藉由配置在成像透鏡51與攝影機41之間的半反射鏡53之下面所反射,射入至光感測器56。光感測器56所產生的受光訊號,顯示出與其受光量成比例的值。因此,當發生干涉光柵之際,在光感測器56的受光訊號中包含有因應於干涉光柵之明暗的波形。 Further, a photo sensor 56 is provided in the three-dimensional optical unit 20 shown in FIG. 3 for receiving the partial first and second reflected lights that are merged on the upper surface of the half mirror 48. The first and second reflected lights of the merged portion are reflected by the lower surface of the half mirror 53 disposed between the imaging lens 51 and the camera 41, and are incident on the photo sensor 56. The received light signal generated by the photo sensor 56 shows a value proportional to the amount of light received. Therefore, when the interference grating occurs, the received light signal of the photo sensor 56 includes a waveform corresponding to the brightness of the interference grating.

圖3所示的控制裝置40,包含有前述的圖像解析部32、控制三維光學單元20的控制部60、發光驅動部61、以及壓電驅動部62。控制部60包含有:控制攝影機41的成像控制部63、依據來自光感測器56的受光訊號而監控干涉光柵之週期及相位的干涉監控部64、以及控制光源43的發光控制部65。 The control device 40 shown in FIG. 3 includes the above-described image analysis unit 32, a control unit 60 that controls the three-dimensional optical unit 20, a light-emitting drive unit 61, and a piezoelectric drive unit 62. The control unit 60 includes an imaging control unit 63 that controls the camera 41, an interference monitoring unit 64 that monitors the period and phase of the interference grating based on the received light signal from the photo sensor 56, and an emission control unit 65 that controls the light source 43.

本實施形態之光源43的點滅閃爍週期是與干涉光柵的週期相同。因此,光源43在干涉光柵的半週期內持續發光。當掃描部55進行掃描、且光源43之發光期間中,干涉監控部64對光感測器56的受光訊號之波形進行取樣,在干涉光柵之週期與相位之中至少取得相位。至少所取得之干涉光柵IF的相位,則由干涉監控部64傳送至發光控制部65。 The click-off blinking period of the light source 43 of the present embodiment is the same as the period of the interference grating. Therefore, the light source 43 continues to emit light during the half cycle of the interference grating. When the scanning unit 55 scans and the light source 43 emits light, the interference monitoring unit 64 samples the waveform of the light receiving signal of the photo sensor 56, and at least acquires a phase between the period and the phase of the interference grating. At least the phase of the interference grating IF obtained is transmitted from the interference monitoring unit 64 to the light emission control unit 65.

圖3所示的發光控制部65係為,依據干涉光柵的週期及相位資料或是來自光感測器56的受光訊號,產生具有配合干涉光柵之週期及相位的週期、以及相位的LED驅動脈衝訊號(發光驅動訊號),供給至發 光驅動部61。發光控制部65則例如內藏有相位鎖定迴路(PLL(phase locked loop)迴路)。相位鎖定迴路係基於干涉光柵之週期及相位資料,產生具有與干涉光柵之相位為相同相位的脈衝訊號。替代性的,在產生干涉光柵、且點亮光源43的期間中,相位鎖定迴路為依據光感測器56的受光訊號進行反饋控制,產生LED驅動脈衝訊號,其具有與來自未圖示之發振器的該受光訊號進行同期之相位脈衝波形。在此情況下,發光控制部65為依據光源43點亮期間的半週期之受光訊號,產生半週期份的LED驅動脈衝訊號,產生剩餘半週期份的LED驅動脈衝訊號,其與已經產生的半週期份的LED驅動脈衝訊號之相位為相同相位。 The illumination control unit 65 shown in FIG. 3 generates an LED driving pulse having a period and a phase matching the period and phase of the interference grating according to the period and phase data of the interference grating or the received light signal from the photo sensor 56. Signal (lighting drive signal), supply to the hair Light drive unit 61. The light emission control unit 65 has, for example, a phase locked loop (PLL). The phase locked loop is based on the period and phase data of the interference grating to produce a pulse signal having the same phase as the phase of the interference grating. Alternatively, during the period in which the interference grating is generated and the light source 43 is illuminated, the phase locked loop is feedback-controlled according to the received light signal of the photo sensor 56 to generate an LED driving pulse signal having a signal from an unillustrated The received light signal of the vibrator performs a phase pulse waveform of the same period. In this case, the light emission control unit 65 generates a half cycle digital LED driving pulse signal according to the half cycle of the light receiving signal during the lighting period of the light source 43 to generate the remaining half cycle LED driving pulse signal, which is generated with the half. The phases of the LED driving pulse signals of the periodic portions are of the same phase.

發光驅動部61依據來自發光控制部65的LED驅動脈衝訊號,產生LED驅動電壓脈衝供給至光源43,LED驅動電壓脈衝具有配合干涉光柵週期及相位之週期及相位的。其結果,光源43為以與干涉光柵IF相同週期及相位進行點滅閃爍。 The light-emitting drive unit 61 generates an LED drive voltage pulse to be supplied to the light source 43 in accordance with the LED drive pulse signal from the light-emission control unit 65. The LED drive voltage pulse has a period and a phase in which the interference grating period and phase are matched. As a result, the light source 43 blinks in the same cycle and phase as the interference grating IF.

此外,為使掃描部55進行掃描,而控制部60所產生的壓電驅動訊號係對應施加至致動器50的電壓值有所規定。壓電驅動部62係,依據來自控制部60的壓電驅動訊號,將電壓供給(施加)至壓電式的致動器50。致動器50則構成為而將複數個壓電元件(例如,PZT元件)沿著可伸縮方向積層。致動器50依據所供給的電壓,利用壓電元件的電致伸縮作用而伸長、收縮。藉由致動器50進行伸長、收縮,而將掃描部55沿著Z方向進行移動。在本實施形態中,作為使掃描部55沿著Z方向移動的指定行程的一例,可設定成約50μm。藉此,所謂的指定行程,具有的距離是遠遠大於假設在配線基板12中應測量之凹部深度 及段差高度(例如,配線36的高度)等Z方向的最大測量長度。此外,在本實施形態中,為在一次的高度分布測定中,使掃描部55進行兩次(一往一復)以上的移動。在本例中,則是使掃描部55進行兩次(一往一復)的移動。 Further, in order to scan the scanning unit 55, the piezoelectric driving signal generated by the control unit 60 is defined in accordance with the voltage value applied to the actuator 50. The piezoelectric driving unit 62 supplies (applies) a voltage to the piezoelectric actuator 50 in accordance with the piezoelectric driving signal from the control unit 60. The actuator 50 is configured to laminate a plurality of piezoelectric elements (for example, PZT elements) in a telescopic direction. The actuator 50 is elongated and contracted by the electrostrictive action of the piezoelectric element in accordance with the supplied voltage. The actuator 55 is moved and contracted to move the scanning unit 55 in the Z direction. In the present embodiment, an example of a designated stroke for moving the scanning unit 55 in the Z direction can be set to about 50 μm. Thereby, the so-called specified stroke has a distance far greater than the depth of the recess to be measured in the wiring substrate 12 And the maximum measured length in the Z direction, such as the step height (for example, the height of the wiring 36). Further, in the present embodiment, in the primary height distribution measurement, the scanning unit 55 is moved twice or more (one to one). In this example, the scanning unit 55 is moved twice (one to one).

此外,圖3所示的成像控制部63進行攝影機41的成像控制。在該種成像控制中,成像控制部63控制將一張圖像進行成像時的曝光時間Te,也就是說控制將一張圖像進行成像之際的成像時間間隔。攝影機41所成像的圖像資料為逐次傳送至控制裝置40的圖像解析部32。圖像解析部32係分析攝影機41成像之複數個圖像,在各個像素檢測出干涉光柵的波峰位置。由各個像素的波峰位置,演算在被測定面12a中之像素對應位置(x、y)的z座標。 Further, the imaging control unit 63 shown in FIG. 3 performs imaging control of the camera 41. In such imaging control, the imaging control section 63 controls the exposure time Te when imaging one image, that is, the imaging time interval at the time of imaging one image. The image data imaged by the camera 41 is sequentially transmitted to the image analysis unit 32 of the control device 40. The image analysis unit 32 analyzes a plurality of images imaged by the camera 41, and detects the peak position of the interference grating at each pixel. From the peak position of each pixel, the z coordinate of the pixel corresponding position (x, y) in the surface to be measured 12a is calculated.

接著,藉由使用干涉儀42,簡單說明求得被測定面12a之高度分布的原理。 Next, the principle of obtaining the height distribution of the surface to be measured 12a will be briefly explained by using the interferometer 42.

如圖4所示,由光源43所發出的光線通過聚光透鏡44及光學濾波器45,藉由半反射鏡46的下面反射而朝下方射出,以半反射鏡48分離成兩道光束。已透過半反射鏡48之局部光線(測定光束)以配線基板12的被測定面12a反射,再返回半反射鏡48。另一方面,藉由半反射鏡48的上面而反射之其他另一部分的光線(參考光束),則是以參考鏡49反射、返回半反射鏡48。相異光程的測定光束與參考光束在半反射鏡48的上面進行匯合。在掃描部55中,於半反射鏡48與參考鏡49之間具有一定的距離Zm(以下,亦稱「參考距離Zm」。),半反射鏡48與被測定面12a之間的距離Zs(以下,亦稱「測定距離Zs」。) 為伴隨著掃描部55的Z方向之掃描而進行變化。在掃描部55進行掃描的兩道反射光的光程差形成為2(Zs-Zm)。 As shown in FIG. 4, the light emitted from the light source 43 passes through the condensing lens 44 and the optical filter 45, is reflected downward by the lower surface of the half mirror 46, and is split downward into two beams by the half mirror 48. The partial light (measuring light beam) that has passed through the half mirror 48 is reflected by the surface to be measured 12a of the wiring substrate 12, and is returned to the half mirror 48. On the other hand, the other portion of the light (reference beam) reflected by the upper surface of the half mirror 48 is reflected by the reference mirror 49 and returned to the half mirror 48. The measuring beam of the distinct optical path merges with the reference beam above the half mirror 48. In the scanning unit 55, there is a certain distance Zm between the half mirror 48 and the reference mirror 49 (hereinafter also referred to as "reference distance Zm"), and the distance Zs between the half mirror 48 and the surface to be measured 12a ( Hereinafter, it is also called "measuring distance Zs".) The change is made in accordance with the scanning of the scanning unit 55 in the Z direction. The optical path difference of the two reflected lights scanned by the scanning unit 55 is formed to be 2 (Zs - Zm).

在本實施形態中,已通過光學濾波器45的白光為具有較廣的頻譜寬度。因此,測定光束與參考光束係為,僅僅干涉測定光束與參考光束之間的光程差2(Zs-Zm)形成為規定值以下之極小範圍(Zs≒Zm)。利用此種特性,控制部60為使掃描部55沿著Z方向掃描,使得光程差2(Zs-Zm)產生變化。圖像解析部32係為,依據複數個圖像,當Zs≒Zm、產生發生有干涉光柵的發生期間中,出現干涉光柵的波峰時(也就是當Zs=Zm的時候)的掃描位置(Z位置),將其作為波峰位置而求出各個像素。此時,來自光源43之光的色彩,藉由通過光學濾波器45而受到某種程度的限制,干涉光柵的頻率為調整成在干涉光柵的發生期間(可干涉距離)全區域內形成略為一定狀。由三維光學單元20之X方向及Y方向的位置(X,Y)、以及攝影機41之倍率等的已知資訊,在配線基板12的被測定面12a中之攝影機41的成像範圍係為已知。該成像範圍內的像素係可與成像範圍內的被測定面12a上之位置作對應。圖像解析部32係依據攝影機41之複數個像素的Z位置,求出在與複數個像素分別對應的被測定面12a中之複數個位置(x,y)之高度(z座標)分布(x,y,z)的三維輪廓。 In the present embodiment, the white light that has passed through the optical filter 45 has a wide spectral width. Therefore, the measuring beam and the reference beam are such that only the optical path difference 2 (Zs-Zm) between the interfering measuring beam and the reference beam is formed to a minimum range (Zs ≒ Zm) below a predetermined value. With such characteristics, the control unit 60 causes the scanning unit 55 to scan in the Z direction so that the optical path difference 2 (Zs-Zm) changes. The image analyzing unit 32 is a scanning position (Z when Zs=Zm) occurs when Zs≒Zm and the occurrence of the occurrence of the interference grating occur in a plurality of images. Position), and each pixel is obtained as a peak position. At this time, the color of the light from the light source 43 is somewhat limited by the optical filter 45, and the frequency of the interference grating is adjusted to be slightly constant in the entire region during the occurrence of the interference grating (interference distance). shape. The imaging range of the camera 41 in the measurement surface 12a of the wiring substrate 12 is known from the known information such as the position (X, Y) of the three-dimensional optical unit 20 in the X direction and the Y direction, and the magnification of the camera 41. . The pixel within the imaging range can correspond to the position on the surface to be measured 12a within the imaging range. The image analysis unit 32 obtains a height (z coordinate) distribution of a plurality of positions (x, y) in the measurement target surface 12a corresponding to each of the plurality of pixels, based on the Z position of the plurality of pixels of the camera 41 (x). , y, z) three-dimensional outline.

圖5所示為光程差與各像素之亮度的關係。如該圖表所示,當光程差(=2(Zs-Zm))形成為指定規定值(可干涉距離Lf)以下的範圍內時,產生干涉光柵IF。各個像素的輝度波形之振幅因應光程差而產生變化,當光程差為零(也就是Zs=Zm)時,干涉光柵IF的波 峰形成最大。 Figure 5 shows the relationship between the optical path difference and the brightness of each pixel. As shown in the graph, when the optical path difference (=2 (Zs - Zm)) is formed within a range equal to or less than a predetermined predetermined value (interference possible distance Lf), the interference grating IF is generated. The amplitude of the luminance waveform of each pixel changes according to the optical path difference. When the optical path difference is zero (that is, Zs=Zm), the wave of the interference grating IF The peak forms the largest.

在本實施形態中,例如為使參考距離Zm配合接物透鏡47的焦點距離。當接物透鏡47的焦點與配線基板12之被測定面12a(作為一例,為無缺陷之配線36的上面)合致時,測定距離Zs與參考距離Zm幾乎一致、出現干涉光柵IF。藉此,掃描部55使接物透鏡47的焦點僅移動些許距離,該距離係例如將與被測定面12a合致位置作為中心時的指定行程(作為一例,可為50μm)。 In the present embodiment, for example, the reference distance Zm is matched with the focal length of the objective lens 47. When the focal point of the objective lens 47 and the surface to be measured 12a of the wiring substrate 12 (for example, the upper surface of the wiring 36 which is free of defects) are combined, the measurement distance Zs and the reference distance Zm almost coincide with each other, and the interference grating IF appears. Thereby, the scanning unit 55 moves the focus of the objective lens 47 by only a certain distance, which is, for example, a designated stroke when the position to be measured is the center of the surface to be measured 12a (for example, 50 μm).

作為一例,如圖6所示,說明測量具有段差12b之配線基板12的Z方向位置(高度)的情況。例如,配線基板12為具有夾設段差12b的低面PA以及高面PB。 As an example, as shown in FIG. 6, a case where the Z-direction position (height) of the wiring substrate 12 having the step 12b is measured will be described. For example, the wiring substrate 12 is a low surface PA and a high surface PB having a step 12b interposed therebetween.

如圖7所示,當半反射鏡48與低面PA之間的測定距離Zs、以及與參考距離Zm之間的差分以兩倍所示的光程差2(Zs-Zm)形成在規定範圍以內時,在抵接到成像有攝影機41之複數個像素中的低面PA之像素(在圖7中,稱「像素A」。)的光,會出現有干涉光柵IF。因此,在干涉光柵IF的產生區域中,抵接到像素A的光之亮度因應掃描位置而產生變化。此時,抵接到成像有攝影機41之複數個像素中的高面PB之像素(在圖7中,稱之為「像素B」。)的光,並未出現干涉光柵IF。 As shown in FIG. 7, when the difference between the measured distance Zs between the half mirror 48 and the low surface PA and the reference distance Zm is twice the optical path difference 2 (Zs-Zm) shown in the prescribed range, In the case of the light of the low-surface PA (referred to as "pixel A" in Fig. 7) among the plurality of pixels in which the camera 41 is imaged, the interference grating IF appears. Therefore, in the generation region of the interference grating IF, the brightness of the light abutting on the pixel A changes in accordance with the scanning position. At this time, the interference grating IF does not appear in the light of the pixel (referred to as "pixel B" in Fig. 7) of the high-surface PB in the plurality of pixels on which the camera 41 is imaged.

此外,當半反射鏡48與高面PB間之測定距離Zs與參考距離Zm之間的差分之兩倍所示的光程差2(Zs-Zm)形成在規定範圍以內時,抵接到成像高面PB之像素B的光將會出現干涉光柵IF。因此,在干涉光柵IF的產生區域中,抵接像素B的光線亮度將會因應掃描位置 而產生變化。此時,在抵接到成像低面PA之像素A的光線,並不會出現干涉光柵IF。 Further, when the optical path difference 2 (Zs-Zm) indicated by the difference between the measured distance Zs between the half mirror 48 and the high surface PB and the reference distance Zm is formed within a prescribed range, the image is abutted The light of the pixel B of the high side PB will appear as an interference grating IF. Therefore, in the generation region of the interference grating IF, the brightness of the light abutting the pixel B will correspond to the scanning position. And change. At this time, the interference grating IF does not appear at the light that abuts the pixel A of the imaging low surface PA.

在抵接像素A之光線中出現干涉光柵IF時之掃描部55的掃描位置Za、以及在抵接像素B之光線中出現干涉光柵IF時之掃描部55的掃描位置Zb之間的距離2△Z,為形成段差12b之高度△Z的兩倍。若要求出在抵接各像素A、B之光線的干涉光柵之Z方向中的波峰位置Za、Zb時,則可將兩個波峰位置Za、Zb間的距離2△Z之1/2,設為相對於面PA之面PB的高度△Z而求出。 The scanning position Za of the scanning portion 55 when the interference grating IF appears in the light abutting the pixel A, and the distance 2 Δ between the scanning position Zb of the scanning portion 55 when the interference grating IF appears in the light abutting the pixel B Z is twice the height ΔZ of the step 12b. To determine the peak positions Za and Zb in the Z direction of the interference grating that abuts the light of each of the pixels A and B, the distance between the two peak positions Za and Zb can be set to 1/2 of the distance ΔZ. It is obtained with respect to the height ΔZ of the surface PB of the surface PA.

不過,在如專利文獻2所記載之將干涉光柵的波形,以在每一週期進行複數點的取樣方法中,為了求出干涉光柵的波峰,在干涉光柵IF間距至少相當於1/3或是1/4之100nm(奈米)以下的取樣中,必須要取得多數的圖像。在此情況下,假設在掃描部55的移動行程50μm之範圍內取得圖像資料的情況下,則必須要有500張以上的圖像。在此情況下,雖然可以獲得奈米(nm)等級的精度,但是在成像作業方面將會非常的耗時,所需要的記憶體尺寸也將會相當的龐大,此外,計算各個像素之波峰位置的處理時間也會變得相當的長,並不具實用性。再者,在將掃描部55沿Z方向一面進行掃描,一面進行100nm以下的取樣步驟中,將難以抑制在取得細緻且多數圖像之際所產生的曝光時間內的振動,也因此,亦難以搭載至型樣檢測裝置11。另一方面,當使攝影機41的成像速度高速化、進而欲使振動的影響得以減輕時,將會造成圖像變暗,波峰位置檢測精度降低。 However, in the sampling method in which the interference grating is described in Patent Document 2, in the sampling method of performing the complex point in each cycle, in order to obtain the peak of the interference grating, the interference grating IF pitch is at least 1/3 or In the sampling of 1/4 of 100 nm (nano) or less, it is necessary to obtain a large number of images. In this case, in the case where image data is acquired within a range of 50 μm of the movement stroke of the scanning unit 55, it is necessary to have 500 or more images. In this case, although the accuracy of the nanometer (nm) level can be obtained, it will be very time consuming in the imaging operation, and the required memory size will be quite large. In addition, the peak position of each pixel is calculated. The processing time will also become quite long and not practical. Further, in the sampling step of 100 nm or less in scanning the scanning unit 55 in the Z direction, it is difficult to suppress the vibration in the exposure time caused by obtaining a fine and large image, and it is also difficult. It is mounted to the pattern detecting device 11. On the other hand, when the imaging speed of the camera 41 is increased, and the influence of the vibration is to be alleviated, the image is darkened and the peak position detection accuracy is lowered.

另一方面,在型樣檢測裝置11中所進行的配線基板12之缺 陷驗證方面,無須奈米(nm)等級,100nm等級的精度便十分足夠。因此,以可減少進行成像的圖像張數而得以增加曝光時間為佳。但由於干涉光柵IF在明部與暗部具有週期性顯現的波形,因此,在使光源43連續性的發光,且攝影機41的像素在干涉光柵IF之週期以上的一定曝光時間Te受光的情況下,將導致抵接至各像素之光的干涉光柵IF之明部與暗部被平均化。此將造成難以檢測出干涉光柵IF的波峰。 On the other hand, the shortage of the wiring substrate 12 performed in the pattern detecting device 11 In terms of verification, there is no need for a nanometer (nm) level, and the accuracy of the 100 nm level is sufficient. Therefore, it is preferable to increase the exposure time by reducing the number of images to be imaged. However, since the interference grating IF has a waveform that periodically appears in the bright portion and the dark portion, when the light source 43 is continuously emitted, and the pixel of the camera 41 receives light at a certain exposure time Te of the period of the interference grating IF or more, The bright portion and the dark portion of the interference grating IF that causes the light that abuts each pixel are averaged. This will make it difficult to detect the peak of the interference grating IF.

在此,如圖8所示,在本實施形態中,以與干涉光柵IF的波形(以下,亦稱「干涉波形」。)為相同週期(換言之,為相同頻率)及相位,使光源43(LED)進行點滅閃爍。例如,攝影機41為選擇性的成像對應於在干涉波形中之光源43點亮期間的明部(在圖8中,為較輸入光波形中心線更位於上側的部分)。在圖8的例子中,射入至攝影機41之各像素之光的波形,約略等同於在曝光時間Te下所選擇之明部的波形。因此,攝影機41之像素的輸出(在圖8中為攝影機輸出)所具有的輝度值,對應在曝光時間Te之間,像素受光之受光量的積算值(積分值)。在圖8的例子中,已被成像之圖像中所對應的像素之輝度值,具有對應選擇性積算明部之受光量的數值。在此情況下,由於朝光源43熄滅時之攝影機41的輸入光之光量經常維持極低之一定值,因此作為在曝光時間Te中之像素受光量之積分值的攝影機輸出值(像素之輝度值),幾乎與干涉光柵IF之包絡線EV(在圖5中的兩點鏈線)的高度成比例。圖像解析部32則依據複數個圖像,進行相異圖像對應之像素的兩個輝度值間之內插演算,以較成像間隔更細的位置精度演算載置於包絡線EV上的複數個輝度值,藉由該等輝度值演算包絡線EV之波峰位置,以求出干涉光柵I F的波峰位置。另外,於圖8中,以點表示攝影機輸出值(輝度值),以實線表示在曝光時間Te之間的攝影機41之像素受光量的時間變化。 Here, as shown in FIG. 8, in the present embodiment, the light source 43 is made to have the same period (in other words, the same frequency) and phase as the waveform of the interference grating IF (hereinafter also referred to as "interference waveform"). LED) flashes off. For example, the selective imaging of the camera 41 corresponds to the bright portion during the lighting of the light source 43 in the interference waveform (in FIG. 8, the portion located further on the upper side than the center line of the input light waveform). In the example of Fig. 8, the waveform of the light incident on each pixel of the camera 41 is approximately equivalent to the waveform of the bright portion selected at the exposure time Te. Therefore, the luminance value of the output of the pixel of the camera 41 (the camera output in FIG. 8) corresponds to the integrated value (integral value) of the amount of light received by the pixel between the exposure times Te. In the example of Fig. 8, the luminance value of the pixel corresponding to the image that has been imaged has a value corresponding to the amount of received light of the selective integrated portion. In this case, since the amount of light of the input light of the camera 41 when the light source 43 is turned off is often maintained at a very low constant value, the camera output value (the luminance value of the pixel as the integral value of the amount of received light of the pixel in the exposure time Te) ) is almost proportional to the height of the envelope EV of the interference grating IF (the two-point chain line in Fig. 5). The image analysis unit 32 performs an interpolation calculation between two luminance values of pixels corresponding to the different images according to the plurality of images, and calculates a complex number placed on the envelope EV with a positional accuracy smaller than the imaging interval. The luminance value, by which the peak position of the envelope EV is calculated to obtain the interference grating I The peak position of F. In addition, in FIG. 8, the camera output value (luminance value) is shown by a dot, and the time change of the pixel light-receiving amount of the camera 41 between exposure time Te is shown by the solid line.

此外,如圖8所示,設定有光源43(LED)之LED驅動波形為一週期以上的曝光時間Te。例如,將曝光時間Te設定成LED驅動波形之一週期的自然數的倍數。在圖8的例子中,曝光時間Te為等同於LED驅動波形的一週期。當然並非僅限定於此,若是可將曝光時間Te設定成光源43點滅週期之自然數的倍數即可。例如,曝光時間Te可以為LED驅動波形之週期的2倍或3倍。另外,由於不需要特別的處理便得以增長曝光時間,因此在出現干涉光柵IF的可干涉距離Lf之區間中移動掃描部55時,設定的曝光時間Te的值期望為可成像3張以上的圖像。亦即,較佳為將曝光時間Te設定在干涉光柵IF發生期間(換言之,為掃描可干涉距離Lf的時間)之1/4~1/3範圍內之值。當然,亦可將曝光時間Te設定為,當可檢測出干涉光柵IF之波峰的情況下,超過干涉光柵IF發生期間之1/3之值。在此情況下,亦可併用得以進行干涉光柵之波峰檢測、且得以儘量將曝光時間Te設定成較長的作業(波峰檢測解析處理等)。例如,當所要求的精度比較沒有那麼高的情況下,亦可設定干涉光柵IF發生期間以上的曝光時間Te。 Further, as shown in FIG. 8, the LED driving waveform in which the light source 43 (LED) is set is an exposure time Te of one cycle or more. For example, the exposure time Te is set to a multiple of the natural number of one cycle of the LED drive waveform. In the example of FIG. 8, the exposure time Te is equivalent to one cycle of the LED drive waveform. Of course, it is not limited to this, and the exposure time Te may be set to a multiple of the natural number of the light source 43 click-off period. For example, the exposure time Te may be 2 or 3 times the period of the LED drive waveform. Further, since the exposure time is increased without requiring special processing, when the scanning portion 55 is moved in the section where the interference distance Lf of the interference grating IF occurs, the value of the set exposure time Te is desirably three or more images that can be imaged. image. That is, it is preferable to set the exposure time Te to a value within a range of 1/4 to 1/3 of the period during which the interference grating IF is generated (in other words, the time for scanning the interferenceable distance Lf). Of course, the exposure time Te can also be set such that when the peak of the interference grating IF can be detected, it exceeds a value of 1/3 of the period during which the interference grating IF occurs. In this case, it is also possible to use an operation (wave peak detection analysis process or the like) in which the peak detection of the interference grating is performed and the exposure time Te is set to be as long as possible. For example, when the required accuracy is not so high, the exposure time Te above the period during which the interference grating IF is generated may be set.

然而在圖8所示之例中,干涉波形之明部與LED驅動波形之點亮期間雖然幾乎一致、且干涉波形的相位與LED驅動波形的相位幾乎合致,但仍會有因為控制上的限制而造成有相位偏移的情況產生。例如,如圖10(a)所示,當相對於干涉波形之相位,LED驅動波形的相位僅偏移約90度的情況下,在曝光時間Te內之LED驅動波形的點亮期 間中,於攝影機輸入光波形分別出現有略一半的干涉波形之明部與暗部。在此情況下,即便假設波形的振幅相異,但由於相對於明部之振幅中心的差值約略等同於相對於暗部之振幅中心的差值,因而造成其明部與暗部受到平均化,在成像於攝影機41之複數個圖像中對應的像素間,於曝光時間Te中之受光量,將不會產生有差異。其結果將會造成難以由攝影機41之各個像素的輝度值演算干涉光柵IF的波峰位置。在此,於本實施形態中採用下述控制。 However, in the example shown in FIG. 8, although the bright portion of the interference waveform and the LED driving waveform are almost coincident, and the phase of the interference waveform is almost the same as the phase of the LED driving waveform, there is still a limitation in control. This causes a phase shift. For example, as shown in FIG. 10(a), when the phase of the LED driving waveform is shifted by about 90 degrees with respect to the phase of the interference waveform, the lighting period of the LED driving waveform during the exposure time Te is In the middle, there are slightly more than half of the interference waveform in the bright and dark portions of the camera input light waveform. In this case, even if the amplitudes of the waveforms are different, since the difference from the center of the amplitude of the bright portion is approximately equal to the difference from the center of the amplitude of the dark portion, the bright and dark portions are averaged. The amount of light received in the exposure time Te between the corresponding pixels in the plurality of images imaged by the camera 41 will not be different. As a result, it is difficult to calculate the peak position of the interference grating IF by the luminance value of each pixel of the camera 41. Here, in the present embodiment, the following control is employed.

圖9所示之圖表,由上依序揭示有掃描部55之掃描位置(Z位置)、於攝影機41之像素中的干涉波形、LED驅動波形、攝影機成像輝度(攝影機輸出)。攝影機成像輝度所表示的輝度值,為因應在測定時(成像時)之攝影機41像素的受光量。如圖9所示,掃描部55為對一個測定區域進行一往一復的掃描。發光控制部65係為在進給運動過程與返回運動過程中,僅將LED驅動波形的相位偏移90度。在掃描部55由作為掃描開始位置之原點(位置0μm)移動至掃描上限位置Zo(位置50μm)的進給掃描過程中,LED驅動波形的相位則形成預設的相位,在返回掃描過程中,LED驅動波形的相位形成為,對進給掃描過程的相位偏移90度。 The graph shown in FIG. 9 sequentially displays the scanning position (Z position) of the scanning unit 55, the interference waveform in the pixels of the camera 41, the LED driving waveform, and the camera imaging luminance (camera output). The luminance value indicated by the camera imaging luminance is the amount of light received by the camera 41 in response to the measurement (imaging). As shown in FIG. 9, the scanning unit 55 performs one-to-one scanning for one measurement area. The light emission control unit 65 shifts only the phase of the LED drive waveform by 90 degrees during the feed motion process and the return motion process. In the feed scanning process in which the scanning portion 55 is moved from the origin (position 0 μm) as the scanning start position to the scanning upper limit position Zo (position 50 μm), the phase of the LED driving waveform forms a preset phase, and is returned to the scanning process. The phase of the LED drive waveform is formed such that the phase of the feed scanning process is shifted by 90 degrees.

例如,在如圖10(a)所示的進給掃描過程中,若是將干涉波形與LED驅動波形之間的相位偏移約90度時,將難以進行如前所述之干涉光柵IF之波峰位置的演算。即便是在此種情況下,於圖10(b)所示之返回掃描過程中,干涉波形與LED驅動波形之間的相位形成為相同,且由於僅積算曝光時間Te內之明部,因此可依據像素的輝度值來進 行干涉光柵IF波峰位置的演算。如此,在掃描部55之進給時與返回時藉由使光源43點滅閃爍而使相位偏移90度,而可演算進給時與返回時之至少任一方的干涉光柵IF之波峰位置。在此,圖像解析部32係為,在掃描部55的掃描中,使用攝影機41成像之複數個圖像中的各像素之輝度值,在相異圖像中對應的像素之兩個輝度值間進行內插演算,而演算干涉光柵IF的包絡線EV之波峰位置。另外,藉由圖像解析部32所進行之各個像素之干涉光柵的波峰位置檢測處理,則使利用電腦25內的圖像處理迴路以高速來進行。 For example, in the feed scan process as shown in FIG. 10(a), if the phase between the interference waveform and the LED drive waveform is shifted by about 90 degrees, it is difficult to perform the peak of the interference grating IF as described above. The calculation of the position. Even in this case, in the return scanning process shown in FIG. 10(b), the phase between the interference waveform and the LED driving waveform is formed to be the same, and since only the bright portion in the exposure time Te is accumulated, According to the luminance value of the pixel The calculation of the peak position of the interfering grating IF. As described above, at the time of feeding and returning of the scanning unit 55, by shifting the light source 43 by blinking, the phase is shifted by 90 degrees, and the peak position of the interference grating IF at least one of the feed timing and the return timing can be calculated. Here, the image analysis unit 32 is configured to use the luminance values of the pixels in the plurality of images imaged by the camera 41 in the scanning of the scanning unit 55, and the two luminance values of the corresponding pixels in the different images. Interpolation calculations are performed to calculate the peak position of the envelope EV of the interference grating IF. Further, the peak position detecting process of the interference grating of each pixel by the image analyzing unit 32 is performed at a high speed by the image processing circuit in the computer 25.

接著,說明型樣檢測裝置11及三維輪廓取得裝置21之作用。 Next, the roles of the pattern detecting device 11 and the three-dimensional contour acquiring device 21 will be described.

首先,對已形成在配線基板12之全數配線36進行型樣檢查。檢查部31係依據成像單元17之攝影機19所成像的被測定面12a之圖像進行型樣檢查,而檢測出真偽有疑慮的缺陷候選之情況下,則要求進行驗證處理。例如,如圖2所示之配線36上的氧化膜36a、凹部36b、缺損部36c,在型樣檢查中作為缺陷候選而被檢測而出,成為驗證的對象。接收驗證要求指令的控制部60則使台座14於可將缺陷候選者進行成像的X方向之位置移動,且使三維光學單元20於可將缺陷候選者進行成像的Y方向之位置移動。 First, pattern inspection is performed on all the wirings 36 that have been formed on the wiring substrate 12. The inspection unit 31 performs pattern inspection based on the image of the surface to be measured 12a imaged by the camera 19 of the image forming unit 17, and when detecting a defect candidate having doubts about authenticity, it is required to perform verification processing. For example, the oxide film 36a, the recessed portion 36b, and the defective portion 36c on the wiring 36 shown in FIG. 2 are detected as defect candidates in the pattern inspection, and are verified. The control unit 60 that receives the verification request command moves the pedestal 14 at a position in the X direction in which the defect candidate can be imaged, and moves the three-dimensional optical unit 20 at a position in the Y direction in which the defect candidate can be imaged.

當在掃描開始前使光源43發光的情況下,所進行的校準作業,使掃描部55至少進行一次掃描,依據光感測器56的受光訊號至少在干涉光柵之週期與相位之中求出相位。利用該種校準作業,求出對於掃描部55之掃描位置的干涉光柵之相位。 When the light source 43 is caused to emit light before the start of scanning, the calibration operation is performed so that the scanning unit 55 performs at least one scanning, and the phase is obtained based on at least the period and phase of the interference grating according to the received light signal of the photo sensor 56. . With this calibration operation, the phase of the interference grating with respect to the scanning position of the scanning unit 55 is obtained.

控制裝置40係為實施於圖11所示之三維輪廓取得處理常式 的程式。以下,依據圖11之流程圖,針對三維輪廓取得處理常式進行說明。此外,在圖11的處理中,包含有光源43的發光控制、掃描部55的掃描控制及攝影機41的成像控制等在控制器23內之控制部60所進行的控制、以及藉由圖像解析部32所進行的處理。另外,控制部60所進行的控制中,可將其局部的處理或是全部的處理以電腦25來進行。且亦可在控制器23內備有圖像解析部32。 The control device 40 is a three-dimensional contour acquisition processing routine implemented in FIG. Program. Hereinafter, the three-dimensional contour acquisition processing routine will be described based on the flowchart of FIG. Further, in the processing of FIG. 11, control by the control unit 60 in the controller 23, and image analysis by the light emission control of the light source 43, the scanning control of the scanner unit 55, and the imaging control of the camera 41 are included. The processing performed by the unit 32. Further, in the control performed by the control unit 60, the partial processing or the entire processing can be performed by the computer 25. Further, an image analysis unit 32 may be provided in the controller 23.

在步驟S1中,使掃描部55進行進給運動。亦即,控制部60為將壓電驅動訊號供給至壓電驅動部62,藉由使施加至致動器50的電壓產生變化,而使掃描部55以一定的速度由掃描開始位置(原點=位置0μm)至掃描終了位置(位置50μm)進行進給運動。 In step S1, the scanning unit 55 is caused to perform a feed motion. In other words, the control unit 60 supplies the piezoelectric driving signal to the piezoelectric driving unit 62, and changes the voltage applied to the actuator 50 to cause the scanning unit 55 to be scanned at a certain speed (origin). The position is 0 μm) to the end position of scanning (position 50 μm) for the feed motion.

在步驟S2中,使光源以與干涉光柵之週期為相同的週期作點滅閃爍。亦即,發光控制部65產生與干涉光柵IF之週期相同週期的LED驅動脈衝訊號,將該脈衝訊號供給至發光驅動部61、將脈衝電壓施加至光源43,藉此使光源43以與干涉光柵IF之週期為相同的週期作點滅閃爍。 In step S2, the light source is caused to blink at the same period as the period of the interference grating. That is, the light emission control unit 65 generates an LED drive pulse signal of the same period as the period of the interference grating IF, supplies the pulse signal to the light emission drive unit 61, and applies a pulse voltage to the light source 43, thereby causing the light source 43 to interact with the interference grating. The period of the IF is blinking for the same period.

在步驟S3中,藉由攝影機而在干涉光柵之週期的自然數的倍數之曝光時間,將被測定面12a進行成像。亦即,成像控制部63係為在攝影機41中,進行在各曝光時間Te中的成像。藉由攝影機41所成像的圖像資料,為逐次傳送至圖像解析部32。 In step S3, the surface to be measured 12a is imaged by the camera at an exposure time which is a multiple of the natural number of the period of the interference grating. That is, the imaging control unit 63 performs imaging at each exposure time Te in the camera 41. The image data imaged by the camera 41 is sequentially transmitted to the image analyzing unit 32.

在接下來的步驟S4中,解析複數個圖像,分別於各個像素檢測出出現有干涉光柵之波峰的Z位置。亦即,圖像解析部32係將成像有未顯現出干涉光柵時的被測定面12a的像素之輝度作為基準輝度值,儲 存至記憶體中。而圖像解析部32則是在圖像資料之各個像素中,演算輝度值與基準輝度值之間的差分△B,將各個像素之差分△B逐次儲存至記憶體中。而圖像解析部32則使用複數次份量之各個像素的差分△B來進行內插演算,分別在較掃描部55於一次成像之間所移動的成像間距還窄的位置(掃描位置)上,逐次求出各個像素的干涉光柵IF之包絡線EV(參照圖5)上的差分。圖像解析部32則是逐次比較包絡線EV上的差分,將成為最大值時的掃描位置設為波峰位置(Z位置)檢測而得。 In the next step S4, a plurality of images are analyzed, and the Z position at which the peak of the interference grating appears is detected for each pixel. In other words, the image analysis unit 32 stores the luminance of the pixel on the surface to be measured 12a when the interference grating is not displayed as the reference luminance value. Save to memory. On the other hand, the image analysis unit 32 calculates the difference ΔB between the luminance value and the reference luminance value in each pixel of the image data, and sequentially stores the difference ΔB of each pixel in the memory. On the other hand, the image analysis unit 32 performs the interpolation calculation using the difference ΔB of each of the plurality of pixels, and is respectively at a position (scanning position) where the imaging interval moved by the scanning unit 55 between the one imaging is narrow. The difference on the envelope EV (see FIG. 5) of the interference grating IF of each pixel is successively obtained. The image analysis unit 32 sequentially compares the difference on the envelope EV, and detects the scanning position at the maximum value as the peak position (Z position).

在干涉光柵IF的出現區間中,由於在光感測器56點亮期間中,於受光訊號內包含有干涉光柵的波形,因此干涉監控部64可檢測出干涉光柵的週期及相位。發光控制部65則依據光感測器56的受光訊號,配合干涉光柵的相位而產生LED驅動脈衝訊號。因此,在干涉光柵IF的發生區間中,光源43之點滅波形的相位為與干涉光柵的相位合致,獲得相對性較大的差分△B,進而提高波峰位置檢測感度。 In the appearance section of the interference grating IF, since the waveform of the interference grating is included in the received light signal during the lighting period of the photo sensor 56, the interference monitoring unit 64 can detect the period and phase of the interference grating. The light emission control unit 65 generates an LED drive pulse signal according to the received light signal of the light sensor 56 and the phase of the interference grating. Therefore, in the generation section of the interference grating IF, the phase of the click-off waveform of the light source 43 is aligned with the phase of the interference grating, and a relatively large difference ΔB is obtained, thereby improving the peak position detection sensitivity.

在步驟S5中判定是否已經結束掃描部的進給運動。控制部60係用以判定壓電驅動訊號之值,是否已經達到掃描部55僅結束移動指定行程(例如,50μm)、且位於掃描上限位置Zo時的數值。若是在掃描部55進給運動結束前時,則回到步驟S3,將步驟S3的成像處理及以步驟S4圖像解析所進行的波峰位置檢測處理,重複運作直到於步驟S5中判定進給運動結束為止。 It is determined in step S5 whether or not the feed motion of the scanning portion has been ended. The control unit 60 is configured to determine whether the value of the piezoelectric driving signal has reached a value when the scanning unit 55 only ends the movement of the designated stroke (for example, 50 μm) and is located at the scanning upper limit position Zo. If it is before the end of the feeding operation of the scanning unit 55, the process returns to step S3, and the imaging process of step S3 and the peak position detection process by the image analysis of step S4 are repeated until the feed motion is determined in step S5. End it.

例如,當測定於圖6所示的配線基板12之被測定面12a的情況下,在掃描部55的進給運動過程中,在圖7所示的掃描位置Za中,抵接至成像低面PA的像素A之光中出現干涉光柵IF的波峰,在掃描位 置Zb中,抵接至成像高面PB的像素B之光中出現干涉光柵IF的波峰。因此,在步驟S4中,分別檢測出因應於被測定面12a上的兩個面PA、PB之高度的兩個波峰位置Za、Zb。而當結束掃描部55的進給運動之後,前進至步驟S6。 For example, when the measurement surface 12a of the wiring substrate 12 shown in FIG. 6 is measured, during the feeding movement of the scanning portion 55, in the scanning position Za shown in FIG. 7, the low surface is abutted. The peak of the interference grating IF appears in the light of the pixel A of the PA, in the scanning bit In Zb, the peak of the interference grating IF appears in the light of the pixel B abutting on the imaging high plane PB. Therefore, in step S4, two peak positions Za and Zb corresponding to the heights of the two faces PA and PB on the surface to be measured 12a are detected. On the other hand, when the feeding motion of the scanning unit 55 is ended, the process proceeds to step S6.

在步驟S6中,使掃描部55進行返回動作。亦即,控制部60將壓電驅動訊號供給至壓電驅動部62,藉由將施加至致動器50的電壓變化成與進給時為逆向,而使得掃描部55以一定的速度,由掃描終了位置(位置50μm)返回至掃描開始位置(原點=位置0μm)。 In step S6, the scanner unit 55 is caused to perform a return operation. That is, the control unit 60 supplies the piezoelectric driving signal to the piezoelectric driving portion 62, and by changing the voltage applied to the actuator 50 to be reversed at the time of feeding, the scanning portion 55 is caused by the scanning speed at a certain speed. The scanning end position (position 50 μm) is returned to the scanning start position (origin = position 0 μm).

在步驟S7中,使光源以與干涉光柵相同週期、且與掃描部55進給時為90度相異之相位進行點滅閃爍。亦即,先前干涉監控部64監控的干涉光柵週期為已知,藉由將LED驅動脈衝訊號的輸出時間點對於掃描部55進給時的輸出時間點偏移1/4週期,而將LED驅動脈衝訊號的相位相對於進給時偏移90度,該LED驅動脈衝訊號的輸出時間點為相對於掃描部55之掃描位置藉由發光控制部65產生。接著,將與該相位偏移90度之干涉光柵IF週期為相同週期的LED驅動脈衝訊號供給至發光驅動部61,以與干涉光柵IF週期為相同的週期、且與掃描部55進給時呈90度相異的相位,使光源43點滅閃爍。 In step S7, the light source is caused to blink at a phase different from the interference grating and different from the scanning unit 55 by 90 degrees. That is, the interference grating period monitored by the previous interference monitoring unit 64 is known, and the LED driving is performed by shifting the output time point of the LED driving pulse signal by 1/4 cycle for the output time point when the scanning portion 55 is fed. The phase of the pulse signal is shifted by 90 degrees with respect to the feed, and the output time point of the LED drive pulse signal is generated by the light emission control unit 65 with respect to the scanning position of the scanning unit 55. Then, the LED driving pulse signal having the same period of the interference grating IF period shifted by 90 degrees from the phase is supplied to the light-emitting driving portion 61 so as to be the same period as the interference grating IF period and when the scanning portion 55 is fed. The 90 degree phase is different, causing the light source 43 to flash off.

接下來的步驟S8及S9的各個處理,為進行與步驟S2及S3的各個處理相同的處理。亦即,在步驟S8中,以干涉光柵週期之自然數的倍數的曝光時間,藉由攝影機來將被測定面12a進行成像。以攝影機41所成像的圖像資料,逐次傳送至圖像解析部32。並且在步驟S9中,解析複數個圖像,分別於各個像素檢測出顯現有干涉光柵之波峰的Z 位置。 The respective processes of the subsequent steps S8 and S9 are the same processes as the respective processes of steps S2 and S3. That is, in step S8, the surface to be measured 12a is imaged by a camera at an exposure time which is a multiple of the natural number of the interference grating period. The image data imaged by the camera 41 is sequentially transmitted to the image analysis unit 32. And in step S9, the plurality of images are analyzed, and the Z of the peak of the existing interference grating is detected in each pixel. position.

在步驟S10中,則判定掃描部之返回運動是否已經結束。亦即,控制部60為判定壓電驅動訊號之值,是否已經達到掃描部55位於掃描開始位置時之值。倘若掃描部55的返回運動為結束之前時,則回到步驟S8,反覆進行藉由步驟S8之成像處理及S9之圖像解析所進行的波峰位置檢測處理,直到在步驟S10中判定返回運動結束為止。當結束掃描部55的返回運動後,前進至步驟S11。例如,在掃描部55之進給時與返回時中之任一方,對於干涉光柵IF的相位,即便是光源43的點滅波形之相位略為偏移90度,在另一方,相對於干涉光柵IF的相位,光源43的點滅波形之相位則形成為略為合致、或是略為偏移180度。因此,在另一方進行掃描時,可依據差分△B檢測出干涉光柵IF之包絡線EV的波峰位置(Z位置)。 In step S10, it is determined whether or not the return movement of the scanning unit has ended. That is, the control unit 60 determines whether or not the value of the piezoelectric driving signal has reached the value when the scanning unit 55 is at the scanning start position. If the return motion of the scanning unit 55 is before the end, the process returns to step S8, and the peak position detection processing by the imaging processing of step S8 and the image analysis of S9 is repeatedly performed until the end of the return motion is determined in step S10. until. When the return movement of the scanning unit 55 is completed, the process proceeds to step S11. For example, at the time of the feeding and returning of the scanning unit 55, even if the phase of the click-off waveform of the light source 43 is slightly shifted by 90 degrees with respect to the phase of the interference grating IF, on the other hand, with respect to the interference grating IF The phase of the click-off waveform of the light source 43 is formed to be slightly uniform or slightly offset by 180 degrees. Therefore, when scanning is performed on the other side, the peak position (Z position) of the envelope EV of the interference grating IF can be detected based on the difference ΔB.

於步驟S11中,依據在各個像素所檢測而得的Z位置產生三維輪廓。亦即,圖像解析部32為分別在各個像素,比較於掃描部55進給時所檢測而出的波峰、以及於掃描部55返回時所檢測而出的波峰,採用波峰較大的一方作為Z位置。在此情況下亦可構成為,針對全像素中的局部像素,比較進給時的波峰與返回時的波峰,判定採用的波峰位置是否已在掃描部55進給時檢測而出、或是已在返回時檢測而出,採用判定一方的波峰位置。當決定採用的各個像素之Z位置時,依據因應Z位置的z座標來產生三維輪廓PD。 In step S11, a three-dimensional contour is generated in accordance with the Z position detected by each pixel. In other words, the image analysis unit 32 uses a peak having a larger peak as the peak detected when the scanning unit 55 is fed and the peak detected when the scanning unit 55 returns. Z position. In this case, it is also possible to compare the peaks at the time of the feed and the peaks at the time of return to the local pixels in the entire pixel, and determine whether or not the adopted peak position has been detected when the scanning unit 55 is fed, or has It is detected at the time of return, and the peak position of the judgment side is used. When determining the Z position of each pixel to be employed, the three-dimensional contour PD is generated in accordance with the z coordinate of the Z position.

如此,當產生各像素以座標(x,y,z)來表現的三維輪廓PD後,將該三維輪廓PD傳遞至驗證部33。驗證部33由三維輪廓P D取得真偽具有疑慮的缺陷表面之高度分布,依據該高度而進行缺陷真偽的驗證。例如,在圖2所示之氧化膜36a的情況下,由於配線36之上面的高度已超過規定高度,故而缺陷驗證為否定。當如圖2所示之凹部36b的情況下,配線36之上面的高度若已超過規定高度時,則缺陷驗證為否定,若未達規定高度時,則缺陷驗證為肯定。再者,如圖2所示之缺損部36c的情況下,則由於配線36之上面的高度未達規定高度,因此在缺陷驗證方面則被驗證為肯定。 In this manner, when the three-dimensional contour PD in which each pixel is represented by a coordinate (x, y, z) is generated, the three-dimensional contour PD is transmitted to the verification unit 33. The verification section 33 is composed of a three-dimensional contour P D obtains the height distribution of the defect surface with doubts about authenticity, and verifies the authenticity of the defect based on the height. For example, in the case of the oxide film 36a shown in FIG. 2, since the height of the upper surface of the wiring 36 has exceeded a predetermined height, the defect verification is negative. In the case of the recess 36b as shown in FIG. 2, if the height of the upper surface of the wiring 36 has exceeded a predetermined height, the defect verification is negative, and if the predetermined height is not reached, the defect verification is affirmative. Further, in the case of the defective portion 36c shown in Fig. 2, since the height of the upper surface of the wiring 36 is less than the predetermined height, it is verified as affirmation in the defect verification.

此外,依據在步驟S4及S9中複數個圖像來檢測各個像素之干涉光柵的波峰位置的演算,亦可在步驟S10的掃描部55之掃描中,以攝影機41所進行的成像(於步驟S10中為肯定判定)全數結束之後來進行。亦即,在上述的例子中,波峰位置的演算處理為在掃描部55的去程與回程之成像中進行。然而,在掃描部55的去程與回程中,當結束藉由攝影機41所進行之全數的成像後,依據至此在記憶體所儲存之複數個圖像,在去程與回程分別演算各個像素的干涉光柵之波峰位置,在相同像素之去程與回程中,採用波峰較高的一方,檢測各個像素的波峰位置亦可。 Further, the calculation of the peak position of the interference grating of each pixel is detected based on the plurality of images in steps S4 and S9, and the imaging by the camera 41 may be performed in the scanning of the scanning unit 55 in step S10 (in step S10). In the affirmative judgment, the whole number is finished. That is, in the above example, the calculation processing of the peak position is performed in the imaging of the outward and return paths of the scanning unit 55. However, in the outbound and backhaul of the scanning unit 55, after the full imaging by the camera 41 is completed, the respective pixels are calculated in the forward and the return according to the plurality of images stored in the memory so far. The peak position of the interference grating can be used to detect the peak position of each pixel in the forward and return strokes of the same pixel.

如以上詳述內容,若藉由第1實施形態,則可獲得以下之效果。 As described in detail above, according to the first embodiment, the following effects can be obtained.

(1)使光源43點滅閃爍成與以干涉儀42所產生的干涉光柵IF的週期為同期。從而,當攝影機41將通過干涉儀42的反射光之影像以干涉光柵IF週期以上的曝光時間Te進行成像的情況下,干涉光柵的光線為每隔半週期、也就是在光源43點亮的期間內,抵接至攝影機41的像素。因此,攝影機41的像素係為,將干涉光柵IF以每隔半週 期的方式進行受光。此時,例如僅成像干涉光柵IF的明部、或是僅成像其暗部。其結果,圖像資料的像素為具有反映干涉光柵IF之包絡線EV的輝度值,圖像解析部32則可依據複數個圖像,檢測在各個像素中之干涉光柵IF的波峰位置。藉此,圖像解析部32由在各個像素中所測得的干涉光柵IF之波峰位置取得被測定面12a之高度分布,而可產生三維輪廓PD。 (1) The light source 43 is blinked to be synchronized with the period of the interference grating IF generated by the interferometer 42. Therefore, when the camera 41 images the image of the reflected light passing through the interferometer 42 at an exposure time Te of the interference grating IF period or more, the light of the interference grating is every half cycle, that is, during the lighting of the light source 43. Within, it abuts the pixels of the camera 41. Therefore, the pixel of the camera 41 is such that the interference grating IF is every half cycle. The way of the period is to receive light. At this time, for example, only the bright portion of the interference grating IF is imaged, or only the dark portion thereof is imaged. As a result, the pixel of the image data has a luminance value reflecting the envelope EV of the interference grating IF, and the image analyzing unit 32 can detect the peak position of the interference grating IF in each pixel based on the plurality of images. Thereby, the image analysis unit 32 obtains the height distribution of the surface to be measured 12a from the peak position of the interference grating IF measured in each pixel, and generates the three-dimensional contour PD.

(2)使掃描部55進行往復掃描,使光源43在掃描部55的進給時與返回時進行點滅閃爍、使相位偏移約略90度,藉此,在進給時與返回時之至少任一方,可檢測出干涉光柵IF的波峰位置。例如,即便是不嚴密的將光源43之點滅與干涉光柵之間的相位一致化,仍可分別在各個像素檢測出干涉光柵IF的波峰位置、產生三維輪廓PD。此外,相較於僅一次使掃描部55進行掃描的構造,可以更高的精度產生三維輪廓PD。 (2) The scanning unit 55 is reciprocally scanned to cause the light source 43 to blink at the time of feeding and returning of the scanning unit 55, and to shift the phase by about 90 degrees, thereby at least at the time of feeding and returning. Either side, the peak position of the interference grating IF can be detected. For example, even if the phase between the light source 43 and the interference grating are not closely aligned, the peak position of the interference grating IF can be detected in each pixel, and the three-dimensional contour PD can be generated. Further, the three-dimensional contour PD can be generated with higher precision than the configuration in which the scanning portion 55 is scanned only once.

(3)設置的光感測器56,用以將局部通過干涉儀42的反射光進行受光,依據光感測器56的受光訊號,在干涉光柵IF的相位,可使光源43進行點滅閃爍。因而可減低在成像時的曝光時間Te內,導因於干涉光柵IF之明部與暗部因受到平均化而導致的干涉光柵IF之波峰位置檢測錯誤的情況產生。 (3) The optical sensor 56 is configured to receive the reflected light partially passing through the interferometer 42. According to the received signal of the photo sensor 56, the phase of the interference grating IF can be used to flash the light source 43. . Therefore, it is possible to reduce the detection of the peak position of the interference grating IF caused by the averaging of the bright portion and the dark portion of the interference grating IF during the exposure time Te at the time of imaging.

(4)攝影機41之曝光時間Te所設定的值,為在由掃描部55之掃描速度所決定的干涉光柵IF之發生期間的1/4~1/3之範圍內。因此,相較於例如以取樣法檢測波峰的情況下,使用數分之一~數十分之一之較少數量的圖樣,便可檢測干涉光柵IF的波峰位置。此外, 圖像資料保存所需的記憶體大小也可以較少的容量便可解決。此外,圖像張數極少張即可,且圖像解析部32無需使用複數個圖像來進行波峰位置檢測處理等特別的處理(複雜的波峰檢測解析處理等),僅須以較簡單的處理方式便可解決,因此可藉由圖像解析部32而使得三維輪廓PD的取得處理得以高速化。 (4) The value set by the exposure time Te of the camera 41 is within a range of 1/4 to 1/3 of the period during which the interference grating IF is determined by the scanning speed of the scanning unit 55. Therefore, the peak position of the interference grating IF can be detected by using a smaller number of patterns of one-tenth to one-tenth of a degree, for example, in the case of detecting a peak by a sampling method. In addition, The memory size required for image data storage can also be solved with less capacity. In addition, the image analysis unit 32 does not need to use a plurality of images to perform special processing such as peak position detection processing (complex peak detection analysis processing, etc.), and it is only necessary to perform simple processing. Since the method can be solved, the image analysis unit 32 can speed up the acquisition process of the three-dimensional contour PD.

(5)三維輪廓取得裝置21適用於型樣檢測裝置11,將藉由配線基板12的型樣檢查所檢測的缺陷候選之真偽,以驗證部33依據由三維輪廓取得裝置21所取得的三維輪廓PD來進行驗證。藉此,因配線36之微細化的需求而在包含較高長寬比的配線36之配線基板12的檢查中,可以高精度來檢測因配線36的高度不足所導致的缺陷。 (5) The three-dimensional contour acquisition device 21 is applied to the pattern detecting device 11, and the authenticity of the defect candidate detected by the pattern inspection of the wiring substrate 12 is verified by the verification portion 33 in accordance with the three-dimensional contour acquisition device 21. The contour PD is used for verification. As a result, in the inspection of the wiring substrate 12 including the wiring 36 having a high aspect ratio due to the demand for miniaturization of the wiring 36, it is possible to accurately detect defects due to insufficient height of the wiring 36.

(6)光源43的點滅閃爍週期為設定成與干涉光柵IF的週期相同。從而,依據在掃描部55的掃描作業中之光感測器56的受光訊號,可每隔干涉光柵IF的半週期檢測出其波形,且可將LED驅動脈衝訊號的相位調整成配合干涉光柵IF的相位。因而提高干涉光柵IF之波峰檢測感度,進而可取得較高精度的三維輪廓PD。例如,可提高藉由驗證部33所進行之缺陷候選的驗證精度。 (6) The dot-off blinking period of the light source 43 is set to be the same as the period of the interference grating IF. Therefore, according to the light receiving signal of the photo sensor 56 in the scanning operation of the scanning unit 55, the waveform can be detected every half period of the interference grating IF, and the phase of the LED driving pulse signal can be adjusted to match the interference grating IF. The phase. Therefore, the peak detection sensitivity of the interference grating IF is improved, and a high-precision three-dimensional contour PD can be obtained. For example, the verification accuracy of the defect candidate by the verification unit 33 can be improved.

實施形態並非僅限定於上述態樣,亦可變更成如以下之態様。 The embodiment is not limited to the above-described aspect, and may be changed to the following state.

.在前述實施形態中,雖然使掃描部55沿著與被測定面12a垂直的Z方向進行往復運動,但亦可進行只有進給運動、或是僅有返回運動的單程掃描。例如,當由輸入光感測器56之受光訊號的發光控制部65內的相位鎖定迴路,可輸出與干涉光柵之相位為同相位的LED驅動脈衝訊號的情況下,即便是掃描部55的單程掃描,仍可取得具有必要精 度的三維輪廓PD。另外,藉由光感測器56及干涉監控部64,依據干涉光柵之波形的取樣所取得的干涉光柵IF之相位資訊,若是可將LED驅動波形的相位進行正確的校正時,僅掃描部55之一次掃描便可以較佳的精度檢測干涉光柵IF的波峰位置,取得具有一定程度以上之精度的三維輪廓PD。 . In the above embodiment, the scanning unit 55 is reciprocated in the Z direction perpendicular to the surface to be measured 12a, but it is also possible to perform one-way scanning with only a feed motion or only a return motion. For example, when the phase-locked loop in the light-emission control unit 65 of the light-receiving signal input to the photosensor 56 outputs an LED drive pulse signal having the same phase as the phase of the interference grating, even one-way of the scanning unit 55 Scan, still get the necessary essence The three-dimensional contour of the degree PD. Further, when the phase information of the interference grating IF obtained by the sampling of the waveform of the interference grating is corrected by the photo sensor 56 and the interference monitoring unit 64, only the scanning unit 55 can correct the phase of the LED driving waveform. In one scan, the peak position of the interference grating IF can be detected with better precision, and a three-dimensional contour PD having a certain degree of precision can be obtained.

.測定被測定面之同一區域之高度分布之際的掃描部55的掃描次數,並非僅限定在一次往返運動(進行兩次掃描),亦可為一點五次的往返(進行三次掃描)、複數次的往返運動(進行四次以上之偶數次掃描)、或是五次以上的奇數次掃描。在該等情況下,較佳為將相異的進給運動或是返回運動時的相位進行些許的偏移,而該等已被偏移的相位中,以包含有至少一個為偏移90度相位的情況為佳。當然,亦可構成為不偏移光源43之點滅閃爍的相位。 . The number of scans of the scanning unit 55 when measuring the height distribution of the same area of the measurement surface is not limited to one round-trip motion (two scans), but may be one-to-five round trips (three scans), plural Round trips (for even scans of more than four times) or odd scans of five or more times. In such cases, it is preferred to slightly shift the phase of the different feed motion or the return motion, and the phase that has been offset includes at least one offset by 90 degrees. The phase is better. Of course, it is also possible to configure a phase that does not shift the blinking of the light source 43.

.亦可不設置光感測器56及干涉監控部64。即使是在此種構造中,於掃描部55進給時與返回時,若將光源43的點滅閃爍之相位改變90度時,由於可檢測干涉光柵IF的波峰位置,故可產生三維輪廓。 . The photo sensor 56 and the interference monitoring unit 64 may not be provided. Even in such a configuration, when the phase of the blinking of the light source 43 is changed by 90 degrees during the feeding and returning of the scanning unit 55, since the peak position of the interference grating IF can be detected, a three-dimensional contour can be generated.

.光源43只要是可發出頻譜寬度較廣的光即可,其發光色並非一定得限定在白光。只要來自光源的光譜具有一定寬度、且可在光程差較窄的範圍內產生干涉光柵IF、並可使用於白光干涉法者即可。此外,光源43並非僅限於LED,亦可為燈泡、有機EL發光體、螢光燈。此外,光源43之光,亦可局部包含有可藉由攝影機41所受光之紅外光或是紫外光。 . The light source 43 is not limited to white light as long as it emits light having a wide spectral width. As long as the spectrum from the light source has a certain width and the interference grating IF can be generated in a range in which the optical path difference is narrow, and it can be used for white light interference. Further, the light source 43 is not limited to an LED, and may be a bulb, an organic EL illuminator, or a fluorescent lamp. In addition, the light of the light source 43 may partially include infrared light or ultraviolet light that can be received by the camera 41.

.使光源43配合干涉光柵的暗部、於點亮的相位使其點滅閃爍,依據已將干涉光柵的暗部進行積分的輝度值來求出干涉光柵之波峰位置亦可。 . The light source 43 is fitted to the dark portion of the interference grating, and the phase of the illumination is blinked, and the peak position of the interference grating may be obtained based on the luminance value obtained by integrating the dark portion of the interference grating.

.當進給掃描時以及返回掃描時的偏移光源43之點滅閃爍相位的角度並非僅限定在90度,亦可設定為其他角度。例如,以80~100度範圍內之值為佳,但即便是偏移些許角度,仍可藉由進給運動與返回運動中任一方的運動來提升波峰位置檢測精度。此外,當偏移相位的情況下,亦可推進或是延遲相對於掃描部55進給時的返回時之相位。即便是在此種構成下,仍可藉由掃描部55在進給時與返回時中之至少一方來確實的檢測干涉光柵之波峰位置。 . The angle of the blinking phase of the offset light source 43 at the time of the feed scanning and the return scanning is not limited to only 90 degrees, and may be set to other angles. For example, it is better to use a value in the range of 80 to 100 degrees, but even if the angle is shifted by a small angle, the peak position detection accuracy can be improved by the motion of either the feed motion or the return motion. Further, in the case of shifting the phase, the phase at the time of return with respect to the feeding of the scanning portion 55 can be advanced or delayed. Even in such a configuration, the scanning unit 55 can reliably detect the peak position of the interference grating by at least one of the feeding and returning.

.不進行將光源43點滅時的相位與干涉光柵合致之相位的控制的構成,亦可。即使不進行相位的控制,仍可進行干涉光柵之波峰位置的檢測。 . The configuration of controlling the phase of the phase when the light source 43 is turned off and the interference grating may not be performed. The detection of the peak position of the interference grating can be performed even without phase control.

.亦可採用米勞干涉儀(Mirau interferometer)來取代邁克生型干涉儀,其係在接物透鏡中心表面上安裝極小的參考鏡(反射鏡),將半反射鏡設置在焦點面的途中,以干涉來自被測定面的光線及來自透鏡上的參考鏡的反射光。 . A Miruau interferometer can also be used instead of a Mikeson interferometer, which mounts a very small reference mirror (mirror) on the center surface of the lens, and places the half mirror on the way to the focal plane. Interfering with light from the surface being measured and reflected light from a reference mirror on the lens.

.可將控制部60中至少一部分以軟體構成、以硬體構成、或是以軟體與硬體之間的協動所構成。亦可藉由軟體構成圖像解析部32,或是將其以軟體與硬體之間的協動所構成。 . At least a part of the control unit 60 may be formed of a soft body, a hard body, or a combination of a soft body and a hardware. The image analyzing unit 32 may be configured by software or may be configured by cooperation between a software and a hardware.

.配線基板12亦可為實施有封裝、TAB帶、IC晶片等配線型樣的配線基板、或是平面顯示器用的配線基板。例如,亦可為液晶 顯示器用、有機電致發光(有機EL)用、電漿顯示器用的扁平面板配線基板。另外,配線基板可為玻璃配線基板、亦可為塑膠配線基板。而作為檢查對象的被測定面上之型樣,並不限定於配線36,亦可為凸塊,可利用型樣檢測裝置11來進行配線基板之凸塊型樣的檢查。 . The wiring board 12 may be a wiring board on which a wiring pattern such as a package, a TAB tape, or an IC chip is implemented, or a wiring board for a flat panel display. For example, it can also be liquid crystal Flat panel wiring board for display, organic electroluminescence (organic EL), and plasma display. Further, the wiring board may be a glass wiring board or a plastic wiring board. The type of the surface to be inspected to be inspected is not limited to the wiring 36, and may be a bump. The pattern detecting device 11 can be used to inspect the bump pattern of the wiring board.

.三維輪廓取得裝置並非僅限定於適用在型樣檢測裝置。測定對象不限定在配線基板,作為檢查對象,只要是被測定面具有細微的凹部、凸部、段差中任一樣式即可。在此情況下,所作的檢查可以是將細微凹部或凸部未達到指定深度或高度的對象視為缺陷的檢查,也可以是檢查在應為平坦面之處是否有無細微凹部或凸部所形成的缺陷的檢查。另外,亦可使用在如專利文獻1所述之異物檢查,或是使用在如專利文獻2所述之穿孔檢查。再者,亦可適用於檢查半導體晶圓上之微凸塊高度或體積的內建晶圓凸塊檢測裝置。亦可適用於檢查覆晶(FC)之凸塊搭載的單片或框狀IC封裝之凸塊高度或體積的FC凸塊檢測裝置。此外,亦可適用於監控在積層基板之二維型樣之電鍍厚度的積層基板電鍍厚度監控裝置。再者,亦可適用於精密的進行監控、反饋焊料或導電性油墨之塗覆厚度(印刷厚度)等的高精度印刷監控裝置。 . The three-dimensional contour acquisition device is not limited to being applied to the pattern detecting device. The measurement target is not limited to the wiring substrate, and any one of the concave surface, the convex portion, and the step of the measurement surface may be used as the inspection target. In this case, the inspection may be performed to treat the object whose fine recess or convex portion does not reach the specified depth or height as a defect, or to check whether there is a fine recess or convex portion where it should be a flat surface. Inspection of defects. Further, it is also possible to use the foreign matter inspection as described in Patent Document 1, or the perforation inspection as described in Patent Document 2. Furthermore, it can also be applied to a built-in wafer bump detecting device for inspecting the height or volume of microbumps on a semiconductor wafer. It can also be applied to the FC bump detecting device for checking the height or volume of the bump of a single-chip or frame-shaped IC package mounted on a bump of a flip chip (FC). In addition, it can also be applied to a laminated substrate plating thickness monitoring device for monitoring the plating thickness of a two-dimensional type of a laminated substrate. Further, it is also applicable to a high-precision printing monitoring device that performs precise monitoring, feedback soldering, or coating thickness (printing thickness) of conductive ink.

.以三維輪廓取得裝置所測定的對象物,並非僅限定於配線基板等電子構裝元件,只要是需要將高度分布進行精密的測量、檢測之物即可。例如,亦可測定在MEMS(Micro Electro Mechanical Systems)中之高度分布。例如,可將應用有微型機械、顯示裝置、感測器、致動器作為測定對象。再者,亦可進行在生物晶片(例如,DNA晶片)中之用以實現感測器機能之微小凹槽深度的管理。此外,在所謂的將原版壓接至基 板、藉由轉印來實現微細加工的奈米壓印中,亦可適用於轉印微細構造之高速且精密的檢測。此外,亦可適用於光通訊裝置或是光IC、光導波路等深度分布檢查。 . The object to be measured by the three-dimensional contour acquisition device is not limited to an electronic component such as a wiring board, and may be any material that requires precise measurement and detection of the height distribution. For example, the height distribution in MEMS (Micro Electro Mechanical Systems) can also be measured. For example, a micromachine, a display device, a sensor, and an actuator can be applied as measurement targets. Furthermore, management of the micro-groove depth in the biochip (eg, DNA wafer) to achieve sensor function can also be performed. In addition, the so-called crimping of the original to the base The plate and the nanoimprint which realizes microfabrication by transfer can also be applied to the high-speed and precise detection of the transfer fine structure. In addition, it can also be applied to optical communication devices or depth distribution inspections such as optical ICs and optical waveguides.

11‧‧‧型樣檢測裝置 11‧‧‧Model test device

12‧‧‧配線基板 12‧‧‧Wiring substrate

12a‧‧‧被測定面 12a‧‧‧Measured surface

21‧‧‧三維輪廓取得裝置 21‧‧‧3D contour acquisition device

31‧‧‧檢查部 31‧‧‧Inspection Department

32‧‧‧圖像解析部 32‧‧‧Image Analysis Department

33‧‧‧驗證部 33‧‧‧Verification Department

Claims (6)

一種三維輪廓取得裝置,其特徵在於具備有:光源,其所發出的光線具有較寬的頻譜寬度;包含掃描部及成像部的干涉儀,其中,前述掃描部構成為可沿著對被測定面交叉的方向進行掃描,前述掃描部將來自前述光源的光線分離成測定光束與參考光束,藉由前述被測定面反射前述測定光束,且藉由參考鏡反射前述參考光束,使來自前述被測定面的第1反射光與來自前述參考鏡的第2反射光匯合,而可產生干涉光柵;前述成像部則是以前述干涉光柵之週期以上的曝光時間,成像前述第1反射光及前述第2反射光之影像為複數個圖像;控制部,其係控制前述掃描部沿著對於被測定面交叉的方向進行掃描,且控制前述光源與前述干涉光柵的週期為相同週期之狀態下進行點滅閃爍;以及,圖像解析部,其依據前述成像部所成像之前述複數個圖像,分別於圖像之各個像素,檢測出在前述掃描部之掃描方向的干涉光柵之波峰位置,而依據所檢測出在各個像素的波峰位置,而產生三維輪廓。 A three-dimensional contour acquiring device comprising: a light source having a wide spectral width; and an interferometer including a scanning unit and an imaging unit, wherein the scanning unit is configured to be along the opposite measuring surface Scanning in the intersecting direction, the scanning unit separates the light from the light source into a measuring beam and a reference beam, and the measuring surface reflects the measuring beam, and the reference beam is reflected by the reference mirror to obtain the surface to be measured. The first reflected light merges with the second reflected light from the reference mirror to generate an interference grating, and the imaging portion images the first reflected light and the second reflection by an exposure time of a period equal to or longer than the period of the interference grating The image of the light is a plurality of images, and the control unit controls the scanning unit to scan in a direction intersecting the surface to be measured, and to control the period of the light source and the interference grating to be the same period. And an image analysis unit that is respectively based on the plurality of images imaged by the image forming unit The pixels detect the peak position of the interference grating in the scanning direction of the scanning portion, and generate a three-dimensional contour according to the detected peak position of each pixel. 如請求項1所記載之三維輪廓取得裝置,其中,前述控制部用於使前述掃描部沿著對被測定面交叉的方向進行往復動作,且使前述光源於前述掃描部進給時與返回時之間,錯開前述光源點滅的相位。 The three-dimensional contour acquiring device according to claim 1, wherein the control unit is configured to reciprocate the scanning unit in a direction intersecting the measurement surface, and to cause the light source to be fed and returned when the scanning unit is driven. Between the two, the phase of the aforementioned light source is turned off. 如請求項1或請求項2所記載之三維輪廓取得裝置,其中,前述三維輪廓取得裝置更具備有光感測器,其受光有局部之朝向前述成像部的前述第1反射光與第2反射光,而產生表示前述第1反射光與第2 反射光之局部受光量的受光訊號;前述控制部基於前述光感測器之受光訊號,使前述光源在與前述干涉光柵相同相位下,進行點滅閃爍。 The three-dimensional contour acquisition device according to claim 1 or claim 2, wherein the three-dimensional contour acquisition device further includes a photosensor that receives the first reflected light and the second reflection partially directed toward the imaging portion. Light, which produces the first reflected light and the second And a light receiving signal of the partial light receiving amount of the reflected light; the control unit causes the light source to blink at the same phase as the interference grating based on the received light signal of the light sensor. 如請求項1或請求項2所記載之三維輪廓取得裝置,其中,前述成像部的曝光時間,為設定在前述干涉光柵之發生期間的1/4~1/3範圍內之值。 The three-dimensional contour acquiring device according to claim 1 or claim 2, wherein the exposure time of the image forming unit is set to a value within a range of 1/4 to 1/3 of a period in which the interference grating is generated. 一種型樣檢測裝置,具備有型樣檢查部,其基於成像有配線基板之配線型樣的圖像,檢查配線是否有缺陷,其特徵在於具備有:請求項1或請求項2中所記載的前述三維輪廓取得裝置;以及,基於前述三維輪廓取得裝置所產生的三維輪廓,驗證由前述型樣檢查部檢測到之前述缺陷之真偽的驗證部。 A pattern detecting device including a pattern inspection unit that detects whether or not a wiring is defective based on an image on which a wiring pattern of a wiring board is imaged, and is characterized by including the item 1 or the request item 2 The three-dimensional contour acquisition device; and a verification unit that verifies the authenticity of the defect detected by the pattern inspection unit based on the three-dimensional contour generated by the three-dimensional contour acquisition device. 一種三維輪廓取得方法,其特徵在於具備有下述步驟:干涉形成步驟,將干涉儀之掃描部沿著對被測定面交叉的方向進行掃描,且將由光源發出之具有較廣頻譜寬度的光,分離成測定光束與參考光束,利用前述被測定面反射前述測定光束,以參考鏡反射前述參考光束,使來自前述被測定面的第1反射光與來自前述參考鏡的第2反射光匯合、而產生干涉光柵;發光控制步驟,使前述光源在與前述干涉光柵週期為相同的週期下進行點滅閃爍;成像步驟,藉由前述干涉儀之成像部,在前述干涉光柵之週期以上的曝光時間中,成像前述第1反射光及前述第2反射光之影像成為複數個圖像;輪廓生成步驟,為依據藉由前述成像部所成像之前述複數個圖像,分別 於圖像之各個像素中,檢測出在前述掃描部之掃描方向的干涉光柵之波峰位置,而依據檢測而得之各個像素的前述波峰位置,產生三維輪廓。 A method for obtaining a three-dimensional contour, comprising: an interference forming step of scanning a scanning portion of the interferometer along a direction intersecting the surface to be measured, and emitting light having a wider spectral width by the light source, Separating into a measurement beam and a reference beam, and reflecting the measurement beam by the measurement surface, and reflecting the reference beam by a reference mirror, and merging the first reflected light from the surface to be measured with the second reflected light from the reference mirror Generating an interference grating; the illuminating control step is such that the light source is flash-off at a period equal to the period of the interference grating; and the imaging step is performed by the imaging portion of the interferometer in an exposure time above a period of the interference grating And imaging the image of the first reflected light and the second reflected light into a plurality of images; the contour generating step is based on the plurality of images imaged by the imaging unit, respectively In each pixel of the image, a peak position of the interference grating in the scanning direction of the scanning portion is detected, and a three-dimensional contour is generated according to the detected peak position of each pixel obtained by the detection.
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