TW201440098A - Multi-layer ceramic capacitor with buffer layer - Google Patents

Multi-layer ceramic capacitor with buffer layer Download PDF

Info

Publication number
TW201440098A
TW201440098A TW102111653A TW102111653A TW201440098A TW 201440098 A TW201440098 A TW 201440098A TW 102111653 A TW102111653 A TW 102111653A TW 102111653 A TW102111653 A TW 102111653A TW 201440098 A TW201440098 A TW 201440098A
Authority
TW
Taiwan
Prior art keywords
electrode
buffer layer
resin
layer
ceramic capacitor
Prior art date
Application number
TW102111653A
Other languages
Chinese (zh)
Inventor
wu-zhou Xu
xiao-yun Chen
Original Assignee
Walsin Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Walsin Technology Corp filed Critical Walsin Technology Corp
Priority to TW102111653A priority Critical patent/TW201440098A/en
Publication of TW201440098A publication Critical patent/TW201440098A/en

Links

Abstract

The present invention provides a multi-layer ceramic capacitor with buffer layer, which comprises a stacked body and two outer electrode components respectively configured on both ends of the stacked body. Each of the outer electrode components comprises an electrode layer, a resin buffer layer, an electrode protection layer and an electrode conduction layer. In which, the resin buffer layer comprises a thermoset resin and a first conductive additive, and also a second conductive additive. Thus, by reducing the thickness of electrode protection layer encapsulated and formed on the surface of the resin buffer layer with electroplating, the present invention may provide excellent resistance to the external stress and excellent solder characteristics, so as to prevent the defects of capacitors from the damages caused by bearing external stress and from the firing or failure due to the differences of thermal expansion coefficients among each layer.

Description

具緩衝層之積層陶瓷電容器 Multilayer ceramic capacitor with buffer layer

本發明係關於一種積層陶瓷電容器,尤其是一種具有樹脂緩衝層之結構,以適應於應用套件後因外部環境或加工所產生之應力,避免產生該元件之外觀破損或內部離裂而造成應用套件之功能或信賴性喪失。 The invention relates to a laminated ceramic capacitor, in particular to a structure with a resin buffer layer, which is adapted to the stress generated by the external environment or processing after the application kit, and avoids the appearance of the component being damaged or internally cracked. Loss of functionality or reliability.

請參閱圖2所示,傳統的積層陶瓷電容器包括一堆疊體30及包覆於該堆疊體30兩端的外端電極組件40,該堆疊體30係由複數介電層31與複數內電極層32交互堆疊所構成,各相鄰的內電極層32係分別露出於堆疊體30兩端,各外端電極組件40係分別與對應的內電極層32接觸,且自堆疊體30朝外之方向分別設有一電極層41、一電極保護層42以及一電極導接層43,藉由電極層41與內電極層32之間的接觸而形成並聯電路,該電極保護層42係包覆在電極層41相對於堆疊體30的另側,以避免電極層41在之後焊接電極導接層43的過程中被融蝕,而該電極導接層43係以電鍍的方式包覆於該電極保護層42相對於電極層41的另側,其係與基板上其他電子元件作電性連接。 Referring to FIG. 2, the conventional multilayer ceramic capacitor includes a stacked body 30 and an outer end electrode assembly 40 coated on both ends of the stacked body 30. The stacked body 30 is composed of a plurality of dielectric layers 31 and a plurality of internal electrode layers 32. Each of the adjacent inner electrode layers 32 is exposed at each end of the stacked body 30, and the outer end electrode assemblies 40 are respectively in contact with the corresponding inner electrode layer 32, and are respectively outward from the stacked body 30. An electrode layer 41, an electrode protection layer 42 and an electrode guiding layer 43 are provided, and a parallel circuit is formed by the contact between the electrode layer 41 and the internal electrode layer 32. The electrode protection layer 42 is coated on the electrode layer 41. With respect to the other side of the stack 30, the electrode layer 41 is prevented from being ablated during the subsequent soldering of the electrode guiding layer 43, and the electrode guiding layer 43 is coated on the electrode protective layer 42 in an electroplated manner. On the other side of the electrode layer 41, it is electrically connected to other electronic components on the substrate.

在電子元件封裝的過程中,係先將該積層陶瓷電容器安裝在基板上,再將其他電子元件安裝在該基板 上,然而,在安裝其他電子元件的過程中會使基板彎曲變形,而讓積層陶瓷電容器承受外部應力而導致堆疊體30產生破裂,而破壞內電極層32,或者讓外端電極組件40和堆疊體30之間產生離裂而導致斷路,造成產品著火或失效。 In the process of packaging the electronic component, the laminated ceramic capacitor is first mounted on the substrate, and other electronic components are mounted on the substrate. However, in the process of mounting other electronic components, the substrate is bent and deformed, and the laminated ceramic capacitor is subjected to external stress to cause the stacked body 30 to be broken, thereby damaging the internal electrode layer 32, or the external electrode assembly 40 and the stack. A split between the bodies 30 causes an open circuit, causing the product to catch fire or fail.

為了避免產生上述問題,如圖3所示,台灣專利第M381157號提供一種具緩衝層以增加其外端電極組件50之延展性和彈性,並適應基板彎曲而避免產生斷裂或瑕疵之積層陶瓷電容器。所述的外端電極組件50係自其堆疊體60朝外之方向分別設有一電極層51、一樹脂緩衝層52、一電極保護層53以及一電極導接層54;其中,樹脂緩衝層52係作為電極層51與電極保護層53之連接媒介而令積層陶瓷電容器設置在一應用套件上,該應用套件的材質可為鋁質基板、環氧玻璃纖維基板(如FR-4)等。 In order to avoid the above problem, as shown in Fig. 3, Taiwan Patent No. M381157 provides a laminated ceramic capacitor having a buffer layer to increase the ductility and elasticity of the outer electrode assembly 50, and to accommodate bending of the substrate to avoid breakage or flaws. . The outer electrode assembly 50 is provided with an electrode layer 51, a resin buffer layer 52, an electrode protection layer 53 and an electrode guiding layer 54 respectively from the direction of the stack 60; wherein the resin buffer layer 52 The laminated ceramic capacitor is disposed on an application kit as a connection medium between the electrode layer 51 and the electrode protective layer 53. The application kit may be made of an aluminum substrate, an epoxy glass fiber substrate (such as FR-4), or the like.

由於該樹脂緩衝層52係為導電性或非導電性熱固性樹脂混合導電添加物所成之膏狀或膠狀物經適當的熱處理而固化形成,因此可使積層陶瓷電容器對於外部應力具備良好的抵抗力,並且有良好的焊錫特性,以解決電容器因承受外部應力所產生的破損,亦避免各層之間因熱膨脹係數之差異而造成產品著火或失效的缺點。 Since the resin buffer layer 52 is formed by curing a paste or a gel of a conductive or non-conductive thermosetting resin mixed conductive additive by appropriate heat treatment, the laminated ceramic capacitor can be made to have good resistance to external stress. Force, and has good soldering characteristics to solve the damage caused by the external stress caused by the capacitor, and also avoid the shortcomings of the product due to the difference in thermal expansion coefficient caused by ignition or failure of the product.

然而,該專利案中,其外端電極組件50中之電極保護層53與電極導接層54若以電鍍方式施行時,因為樹脂緩衝層52之電導率較傳統積層陶瓷電容器的電極層41為差,因此在其電極保護層53與電極導接層54形成時,其電極保護層53及電極導接層54之厚度,係需較傳 統積層陶瓷電容器之電極保護層42及電極導接層43之厚度為厚,以避免焊錫特性不良的問題,但是,較厚的電極保護層53與電極導接層54反倒令該專利案之結構對於應力之緩衝性能下降,則難以適應外部應力如基板彎曲或溫度改變等現象,易產生斷裂或瑕疵。 However, in this patent, when the electrode protective layer 53 and the electrode guiding layer 54 in the outer terminal electrode assembly 50 are applied by electroplating, since the electrical conductivity of the resin buffer layer 52 is higher than that of the electrode layer 41 of the conventional laminated ceramic capacitor. Poor, therefore, when the electrode protective layer 53 and the electrode guiding layer 54 are formed, the thickness of the electrode protective layer 53 and the electrode guiding layer 54 are required to be transmitted. The thickness of the electrode protective layer 42 and the electrode guiding layer 43 of the integrated ceramic capacitor is thick to avoid the problem of poor soldering characteristics, but the thicker electrode protective layer 53 and the electrode guiding layer 54 reverse the structure of the patent. For the buffering performance of stress, it is difficult to adapt to external stress such as substrate bending or temperature change, and it is easy to cause breakage or flaws.

其中,利用降低熱固性樹脂比例或改變金屬種類,以改善由電鍍方式施行所得之該專利結構對於應力之緩衝性能,都是目前已知的可行技術,但是反而使該電容器之焊錫特性劣化。 Among them, the use of lowering the ratio of the thermosetting resin or changing the metal type to improve the buffering performance of the patented structure obtained by electroplating is a currently known feasible technique, but instead deteriorates the soldering characteristics of the capacitor.

是以,亟待一種解決目前技術之困境的方式。 Therefore, it is a way to solve the dilemma of the current technology.

有鑑於上述現有技術之具樹脂緩衝層之結構之積層陶瓷電容器,其於外端電極組件中之電極保護層與電極導接層以電鍍方式施行時,電極保護層與電極導接層之厚度較厚,而造成此結構對於應力之緩衝性能下降之缺點。 In view of the above-mentioned prior art multilayer ceramic capacitor having a structure of a resin buffer layer, when the electrode protective layer and the electrode conductive layer in the outer electrode assembly are electroplated, the thickness of the electrode protective layer and the electrode conductive layer are compared. Thick, which causes the shortcomings of this structure to reduce the cushioning performance of stress.

本發明之目的係在於提供一種具緩衝層之積層陶瓷電容器,其於無須更動樹脂緩衝層之導電添加物種類之前提下,係可具有更佳之導電性,而得以降低外端電極組件之電極保護層與電極導接層厚度,以適應外部應力如基板彎曲或溫度改變等現象,進而避免產生斷裂或瑕疵。 SUMMARY OF THE INVENTION The object of the present invention is to provide a laminated ceramic capacitor having a buffer layer which can be provided with better conductivity without the need to change the type of the conductive additive of the resin buffer layer, thereby reducing the electrode protection of the outer electrode assembly. The layer and the electrode are connected to the thickness of the layer to accommodate external stress such as substrate bending or temperature change, thereby avoiding breakage or flaws.

為了可達前述之發明目的,本發明所採取之技術手段為提供一種具緩衝層之積層陶瓷電容器,其中包含:一堆疊體,其係由至少三介電層與至少二內電極層交互堆疊所構成,而各相鄰的內電極層係分別露出於該堆疊 體兩端;以及,二外端電極組件,兩外端電極組件分別設置於該堆疊體之兩端部,各外端電極組件包含一電極層、一樹脂緩衝層、一電極保護層以及一電極導接層;該電極層係至少包覆於該堆疊體之端部,與露出於該堆疊體相對端的內電極層接觸;該樹脂緩衝層係包覆於該電極層之外表面,其係包含有熱固性樹脂、第一導電添加物及第二導電添加物,該第二導電添加物為金屬,該熱固性樹脂之固化溫度係高於第二導電添加物之熔點;該電極保護層係包覆成形於該樹脂緩衝層之外表面;該電極導接層係包覆成形於該電極保護層之外表面。 In order to achieve the foregoing object, the technical means adopted by the present invention is to provide a laminated ceramic capacitor having a buffer layer, comprising: a stacked body which is alternately stacked by at least three dielectric layers and at least two internal electrode layers. Constructed, and each adjacent inner electrode layer is exposed to the stack And two outer end electrode assemblies respectively disposed at two ends of the stack, each outer end electrode assembly comprising an electrode layer, a resin buffer layer, an electrode protection layer and an electrode a conductive layer; the electrode layer is at least covered at an end of the stacked body, and is in contact with an inner electrode layer exposed at an opposite end of the stacked body; the resin buffer layer is coated on an outer surface of the electrode layer, and the a thermosetting resin, a first conductive additive and a second conductive additive, wherein the second conductive additive is a metal, the curing temperature of the thermosetting resin is higher than a melting point of the second conductive additive; and the electrode protective layer is overmolded And a surface of the resin buffer layer; the electrode conductive layer is overmolded on the outer surface of the electrode protection layer.

較佳的是,該熱固性樹脂之含量為12至50重量百分比(wt%),以樹脂緩衝層總重量為基礎。 Preferably, the thermosetting resin is present in an amount of from 12 to 50% by weight (wt%) based on the total weight of the resin buffer layer.

較佳的是,以該第一導電添加物及該第二導電添加物之重量總和為基礎,該第一導電添加物之含量係介於50至95 wt%。 Preferably, the first conductive additive is contained in an amount of from 50 to 95% by weight based on the total weight of the first conductive additive and the second conductive additive.

較佳的是,該第二導電添加物之尺寸介於為0.1微米(μm)至100微米(μm)之間。 Preferably, the second conductive additive has a size between 0.1 micrometers (μm) and 100 micrometers (μm).

較佳的是,該第二導電添加物之熔點係介於100至300℃之間。 Preferably, the second conductive additive has a melting point between 100 and 300 °C.

較佳的是,該樹脂緩衝層之厚度介於0.1微米(μm)至100微米(μm)之間。 Preferably, the resin buffer layer has a thickness of between 0.1 micrometers (μm) and 100 micrometers (μm).

較佳的是,該電極保護層之厚度介於0.1微米(μm)至30微米(μm)之間。 Preferably, the thickness of the electrode protective layer is between 0.1 micrometers (μm) and 30 micrometers (μm).

較佳的是,該熱固性樹脂為導電性樹脂,該導電性樹脂係包含至少一種選自於由聚乙炔類、聚噻吩類、聚吡咯類、聚苯胺類以及聚芳香烴乙烯所組成之群組的熱固性樹脂。 Preferably, the thermosetting resin is a conductive resin, and the conductive resin comprises at least one selected from the group consisting of polyacetylenes, polythiophenes, polypyrroles, polyanilines, and polyaromatic ethylene. Thermosetting resin.

另擇的是,該熱固性樹脂為非導電性樹脂,該非導電性樹脂係包含至少一種選自於由環氧樹脂類、酚醛類樹脂、尿素樹脂、美耐皿樹脂、不飽和聚脂樹脂、矽脂樹脂以及聚胺基甲酸脂所組成之群組的熱固性樹脂。 Alternatively, the thermosetting resin is a non-conductive resin, and the non-conductive resin contains at least one selected from the group consisting of epoxy resins, phenol resins, urea resins, melamine resins, unsaturated polyester resins, and hydrazines. A thermosetting resin of a group consisting of a resin and a polyurethane.

較佳的是,該第一添加物係選自於由金屬類粉末、金屬類箔片、金屬類纖維、碳類纖維和碳類形態之導電添加物所組成之群組;其中金屬類粉末、金屬類箔片、金屬類纖維係包含至少一種選自於由鎳、銀、銅、鈀、其混合物及其合金所組成之群組中的物質;其碳類纖維和碳類形態之導電添加物包含至少一種選自於由活性碳、碳纖維以及碳奈米管所組成之群組中的物質。 Preferably, the first additive is selected from the group consisting of metal powders, metal foils, metal fibers, carbon fibers, and carbon-based conductive additives; The metal foil and the metal fiber comprise at least one selected from the group consisting of nickel, silver, copper, palladium, mixtures thereof and alloys thereof; and carbon-based and carbon-based conductive additives At least one material selected from the group consisting of activated carbon, carbon fibers, and carbon nanotubes is included.

較佳的是,該第二導電添加物係包含至少一種選自由金屬類粉末、金屬類箔片、金屬類纖維所組成之群組中之導電物;其中金屬類粉末、金屬類箔片、金屬類纖維之組成物,係選自於由錫、鉍、鉛、銦、其混合物及其合金所組成之群組中之至少一種物質。 Preferably, the second conductive additive comprises at least one electrically conductive material selected from the group consisting of metal powders, metal foils, and metal fibers; wherein the metal powder, the metal foil, and the metal The fiber-like composition is selected from at least one selected from the group consisting of tin, antimony, lead, indium, mixtures thereof, and alloys thereof.

較佳的是,該內電極層係選自於由鎳、銅、銀、鈀的粉末、合金、化合物以及其組合所組成之群組。 Preferably, the inner electrode layer is selected from the group consisting of powders of nickel, copper, silver, palladium, alloys, compounds, and combinations thereof.

較佳的是,該介電層係為陶瓷材料所組成。 Preferably, the dielectric layer is comprised of a ceramic material.

較佳的是,該電極層係為玻璃與銅、銀、鎳的金屬粉末或其混合物所組成。 Preferably, the electrode layer is composed of glass and a metal powder of copper, silver or nickel or a mixture thereof.

較佳的是,該電極保護層係由鎳所組成。 Preferably, the electrode protection layer is composed of nickel.

較佳的是,該電極導接層係由錫所組成。 Preferably, the electrode guiding layer is composed of tin.

本發明藉由於樹脂緩衝層中加入第二種添加物,可降低外端電極組件之電極保護層之厚度,藉以使依據本發明的積層陶瓷電容器對於外部應力具備較為良好的抵抗力,並且有良好的焊錫特性,以解決電容器因承受外部應力所產生的破損,亦避免各層之間因熱膨脹係數之差異而造成產品著火或失效的缺點。 In the present invention, since the thickness of the electrode protective layer of the outer electrode assembly can be reduced by adding the second additive to the resin buffer layer, the multilayer ceramic capacitor according to the present invention has better resistance to external stress and has good resistance. The soldering characteristics of the capacitor to solve the damage caused by the external stress caused by the capacitor, and also avoid the shortcomings of the product due to the difference in thermal expansion coefficient caused by ignition or failure of the product.

10‧‧‧堆疊體 10‧‧‧Stack

11‧‧‧介電層 11‧‧‧Dielectric layer

12‧‧‧內電極層 12‧‧‧Internal electrode layer

20‧‧‧外端電極組件 20‧‧‧External electrode assembly

21‧‧‧電極層 21‧‧‧electrode layer

22‧‧‧樹脂緩衝層 22‧‧‧ resin buffer layer

23‧‧‧電極保護層 23‧‧‧Electrode protective layer

24‧‧‧電極導接層 24‧‧‧Electrode conductive layer

30‧‧‧堆疊體 30‧‧‧Stack

31‧‧‧介電層 31‧‧‧Dielectric layer

32‧‧‧內電極層 32‧‧‧Internal electrode layer

40‧‧‧外端電極組件 40‧‧‧External electrode assembly

41‧‧‧電極層 41‧‧‧Electrical layer

42‧‧‧電極保護層 42‧‧‧electrode protective layer

43‧‧‧電極導接層 43‧‧‧Electrode conductive layer

50‧‧‧外端電極組件 50‧‧‧External electrode assembly

51‧‧‧電極層 51‧‧‧electrode layer

52‧‧‧樹脂緩衝層 52‧‧‧ resin buffer layer

53‧‧‧電極保護層 53‧‧‧electrode protective layer

54‧‧‧電極導接層 54‧‧‧Electrode conductive layer

60‧‧‧堆疊體 60‧‧‧Stack

圖1為本發明之具緩衝層之積層陶瓷電容器之局部側視剖面示意圖。 1 is a partial side cross-sectional view showing a laminated ceramic capacitor having a buffer layer of the present invention.

圖2為現有技術之積層陶瓷電容器之局部側視剖面示意圖。 2 is a partial side cross-sectional view showing a prior art multilayer ceramic capacitor.

圖3為現有技術之具緩衝層之積層陶瓷電容器之局部側視剖面示意圖。 3 is a partial side cross-sectional view of a prior art multilayer ceramic capacitor with a buffer layer.

請參閱圖1所示,係本發明之積層陶瓷電容器的較佳實施例,其係包括一堆疊體10以及設置於該堆疊體10之兩端部的外端電極組件20。 Referring to FIG. 1, a preferred embodiment of the multilayer ceramic capacitor of the present invention includes a stacked body 10 and an outer terminal electrode assembly 20 disposed at both ends of the stacked body 10.

請參閱圖1所示,所述的堆疊體10係由至少三介電層11與至少二內電極層12交互堆疊所構成,而各相鄰的內電極層12係分別露出於該堆疊體10兩端,該介電層11係由陶瓷材料所組成,該內電極層12係與露出於該堆疊體10相對端的內電極層12接觸,該內電極層12之 金屬組成之群組係選自由鎳、含鎳之合金、含鎳化合物以及含鎳之有機複合材料所組成之群組;或選自由銅、含銅之合金、含銅化合物以及含銅之有機複合材料所組成之群組;或選自由鈀、含鈀之合金、含鈀化合物以及含鈀之有機複合材料所組成之群組。較佳的是,該內電極層12的材質為陶瓷粉末與鎳金屬粉末混合之膏狀物。較佳的是,該電極層21係為銅所組成。 Referring to FIG. 1 , the stacked body 10 is formed by alternately stacking at least three dielectric layers 11 and at least two internal electrode layers 12 , and each adjacent internal electrode layer 12 is exposed to the stacked body 10 respectively. At both ends, the dielectric layer 11 is composed of a ceramic material, and the internal electrode layer 12 is in contact with the internal electrode layer 12 exposed at the opposite end of the stacked body 10, and the internal electrode layer 12 is The group of metal components is selected from the group consisting of nickel, nickel-containing alloys, nickel-containing compounds, and nickel-containing organic composite materials; or selected from copper, copper-containing alloys, copper-containing compounds, and organic composites containing copper. a group consisting of materials; or a group selected from the group consisting of palladium, palladium-containing alloys, palladium-containing compounds, and palladium-containing organic composite materials. Preferably, the inner electrode layer 12 is made of a paste in which ceramic powder and nickel metal powder are mixed. Preferably, the electrode layer 21 is composed of copper.

請參閱圖1所示,所述的外端電極組件20係包括一電極層21、一樹脂緩衝層22、一電極保護層23以及一電極導接層24的四層結構。 Referring to FIG. 1 , the outer electrode assembly 20 includes a four-layer structure including an electrode layer 21 , a resin buffer layer 22 , an electrode protection layer 23 , and an electrode guiding layer 24 .

請參閱圖1所示,該電極層21係至少包覆於該堆疊體10之端部,與露出於該堆疊體10相對端的內電極層12接觸,該電極層21之組成物係包含至少一選自於由銅、銀、鉑、鈀和金所組成之群組中之金屬;進一步而言,該電極層21係為玻璃與銅、銀、鎳的金屬粉末或其混合物所組成。。 Referring to FIG. 1 , the electrode layer 21 is at least covered at the end of the stacked body 10 and is in contact with the internal electrode layer 12 exposed at the opposite end of the stacked body 10 . The composition of the electrode layer 21 includes at least one. A metal selected from the group consisting of copper, silver, platinum, palladium, and gold; further, the electrode layer 21 is composed of glass and a metal powder of copper, silver, nickel, or a mixture thereof. .

請參閱圖1所示,該樹脂緩衝層22係包覆於該電極層21之外表面,其係以熱固性樹脂混合第一導電添加物及第二導電添加物所組成。該熱固性樹脂係為導電性樹脂或非導電性樹脂,較佳的,其係以印刷或沾附等形式所形成,其厚度為0.1微米(μm)~100微米(μm);該導電性樹脂係包含至少一選自由聚乙炔類、聚噻吩類、聚吡咯類、聚苯胺類以及聚芳香烴乙烯所組成之群組的熱固性樹脂。該非導電性樹脂係包含至少一選自由環氧樹脂類、酚醛類樹脂、尿素樹脂、美耐皿樹脂、 不飽和聚脂樹脂、矽類樹脂以及聚胺基甲酸脂所組成之群組的熱固性樹脂;該第一導電添加物係選自由金屬類粉末、金屬類箔片、金屬類纖維、碳類纖維及碳形態之導電物所組成之群組;其中金屬類粉末、金屬類箔片、金屬類纖維係包含至少一選自由鎳、銀、銅、鈀、其混合物及其合金所組成之群組中的物質;其中碳類纖維和碳形態之導電物係選自於至少一種活性碳、碳纖維以及碳奈米管所組成之群組中的物質;該第二導電添加物為一種低熔點金屬,其係包含至少一選自由金屬類粉末、金屬類箔片、金屬類纖維之導電物所組成之群組;其中金屬類粉末、金屬類箔片、金屬類纖維係包含至少一選自由錫、鉍、鉛、銦、其混合物及其合金所組成之群組中的物質,進一步而言,該第二導電添加物之特性要求為熔點範圍為100至300℃之間,其中較佳的第二導電添加物之熔點範圍為130~250℃;尺寸大小為0.1微米(μm)~100微米(μm),為符合外端電極之尺寸規格,其中較佳的尺寸大小為1.0微米(μm)~60微米(μm)。 Referring to FIG. 1 , the resin buffer layer 22 is coated on the outer surface of the electrode layer 21 and is composed of a thermosetting resin mixed with a first conductive additive and a second conductive additive. The thermosetting resin is a conductive resin or a non-conductive resin, preferably formed by printing or adhering, and has a thickness of 0.1 μm to 100 μm; the conductive resin is A thermosetting resin comprising at least one selected from the group consisting of polyacetylenes, polythiophenes, polypyrroles, polyanilines, and polyaromatic vinyls. The non-conductive resin comprises at least one selected from the group consisting of epoxy resins, phenolic resins, urea resins, melamine resins, a thermosetting resin composed of an unsaturated polyester resin, an anthraquinone resin, and a polyurethane; the first conductive additive is selected from the group consisting of metal powders, metal foils, metal fibers, carbon fibers, and a group of conductive materials of carbon form; wherein the metal powder, the metal foil, and the metal fiber comprise at least one selected from the group consisting of nickel, silver, copper, palladium, mixtures thereof, and alloys thereof. a substance; wherein the carbon fiber and the carbon form of the conductive material are selected from the group consisting of at least one of activated carbon, carbon fiber, and carbon nanotubes; the second conductive additive is a low melting point metal And comprising at least one selected from the group consisting of metal powders, metal foils, and metal fiber conductors; wherein the metal powder, the metal foil, and the metal fiber comprise at least one selected from the group consisting of tin, antimony, and lead. Further, the second conductive additive is characterized by a melting point in the range of 100 to 300 ° C, wherein a preferred second guide is used. The melting point of the additive ranges from 130 to 250 ° C; the size ranges from 0.1 μm to 100 μm, which is in accordance with the size of the outer electrode, and the preferred size is from 1.0 μm to 60 μm. (μm).

較佳的是,該樹脂緩衝層22係由12至50重量百分比之熱固性樹脂、25至83.6重量百分比之第一導電添加物,以及4.4至63.0重量百分比之第二導電添加物所組成;該熱固性樹脂係由環氧樹脂類與酚醛類樹脂所製成;該第一導電添加物係為金屬類箔片且為銅,該第二種導電添加物係為金屬類粉末且為錫鉍合金。更佳的是,以 該第一導電添加物及該第二導電添加物之重量總和為基礎,該第一導電添加物之含量係介於50至95wt%。 Preferably, the resin buffer layer 22 is composed of 12 to 50% by weight of a thermosetting resin, 25 to 83.6% by weight of the first conductive additive, and 4.4 to 63.0% by weight of the second conductive additive; The resin is made of an epoxy resin and a phenolic resin; the first conductive additive is a metal foil and is copper, and the second conductive additive is a metal powder and is a tin-bismuth alloy. Better yet, to Based on the sum of the weights of the first conductive additive and the second conductive additive, the content of the first conductive additive is between 50 and 95% by weight.

請參閱圖1所示,該電極保護層23係包覆成形於該樹脂緩衝層22之外表面,其厚度為0.1微米(μm)~30微米(μm),最佳厚度為2微米(μm)~20微米(μm)。較佳的是,該電極保護層23係選自於由鎳、含鎳之合金、含鎳化合物以及含鎳之有機複合材料所組成之群組。 Referring to FIG. 1 , the electrode protection layer 23 is overmolded on the outer surface of the resin buffer layer 22 and has a thickness of 0.1 micrometer (μm) to 30 micrometers (μm), and an optimum thickness of 2 micrometers (μm). ~20 microns (μm). Preferably, the electrode protection layer 23 is selected from the group consisting of nickel, a nickel-containing alloy, a nickel-containing compound, and a nickel-containing organic composite material.

請參閱圖1所示,該電極導接層24係包覆成形於該電極保護層23之外表面,其厚度為0.1微米(μm)~10微米(μm),最佳厚度為3微米(μm)~8微米(μm)。較佳的是,該金屬導接層係選自於由錫、含錫之合金、含錫化合物以及含錫之有機複合材料所組成之群組。 Referring to FIG. 1, the electrode guiding layer 24 is overmolded on the outer surface of the electrode protective layer 23, and has a thickness of 0.1 micrometer (μm) to 10 micrometers (μm), and an optimum thickness of 3 micrometers (μm). ) ~ 8 microns (μm). Preferably, the metal conducting layer is selected from the group consisting of tin, a tin-containing alloy, a tin-containing compound, and a tin-containing organic composite.

下列實施例用以說明本發明,但不用以對本發明作任何實質上的限制。 The following examples are intended to illustrate the invention, but are not intended to limit the invention in any way.

實施例一 Embodiment 1

本實施例係比較使用電鍍方式分別製作如圖3中所示之現有技術之具緩衝層之積層陶瓷電容器;以及如圖2中所示之現有技術之積層陶瓷電容器,前者之樹脂緩衝層52之導電率、後者之電極層41之電導率、兩者之電極保護層42、53之厚度,以及兩者之應力緩衝性能;其中,應力緩衝性能係以彎折測試失敗率表示,且前者之樹脂緩衝層52係由環氧樹脂(epoxy)及銅(Cu)所製成。上述測試結果分別示於表1、表2及表3中,表1至表3中,現有品係指現有技術之具緩衝層之積層陶瓷電容器;傳統品則為 現有技術之積層陶瓷電容器。 In this embodiment, a prior art laminated ceramic capacitor having a buffer layer as shown in FIG. 3 is separately prepared by using an electroplating method; and a multilayer ceramic capacitor of the prior art as shown in FIG. 2, the former resin buffer layer 52 Conductivity, electrical conductivity of the latter electrode layer 41, thickness of the electrode protective layers 42, 53 of both, and stress buffering performance of the two; wherein the stress buffering performance is represented by a bending test failure rate, and the former resin The buffer layer 52 is made of epoxy resin and copper (Cu). The above test results are shown in Table 1, Table 2 and Table 3, respectively. In Tables 1 to 3, the existing products refer to the prior art laminated ceramic capacitors with a buffer layer; the conventional products are A multilayer ceramic capacitor of the prior art.

根據測試結果,現有技術之具緩衝層之積層陶瓷電容器的電極保護層53於以電鍍的方式包覆在其樹脂緩衝層52之外表面時,因為其電導率較現有技術之積層陶瓷電容器之電極層41為差(如表1),因此在於前者之電極保護層53以電鍍方式形成時,其厚度需較後者之電極保護層42為厚(如表2),造成前者結構對於應力之緩衝性能雖能較後者為佳(如表3),並符合規格要求而屬於可接受範圍,但仍有所不足,使產品仍有著火或失效之風險。 According to the test results, the electrode protective layer 53 of the prior art laminated ceramic capacitor with a buffer layer is coated on the outer surface of the resin buffer layer 52 by electroplating because of its electrical conductivity compared with the electrode of the multilayer ceramic capacitor of the prior art. The layer 41 is inferior (as shown in Table 1). Therefore, when the electrode protective layer 53 of the former is formed by electroplating, the thickness of the electrode protective layer 53 is thicker than that of the electrode protective layer 42 of the latter (as shown in Table 2), resulting in cushioning performance of the former structure for stress. Although it is better than the latter (as shown in Table 3) and meets the specifications and is acceptable, there are still deficiencies, so that the product is still at risk of fire or failure.

實施例二 Embodiment 2

本實施例係比較使用電鍍方式分別製作如圖1中所示之本發明之具緩衝層之積層陶瓷電容器;以及如圖3中所示之現有技術之具緩衝層之積層陶瓷電容器,兩者之外端電極組件20、50之厚度(T),以及兩者之電極層21、51之厚度(Ta)、樹脂緩衝層22、52之厚度(Tb)、電極保護層23、53之厚度(Tc)以及電極導接層24、54之厚度(Td);其中外端電極組件20、50厚度(T)係為電極層21、51之厚度(Ta)、樹脂緩衝層22、52之厚度(Tb)、電極保護層23、53之厚度(Tc)及電極導接層24、54之厚度(Td)之總合。上述測試結果示於表4中。 In this embodiment, a multilayer ceramic capacitor having a buffer layer of the present invention as shown in FIG. 1 is separately produced by using an electroplating method; and a multilayer ceramic capacitor having a buffer layer as shown in FIG. The thickness (T) of the outer end electrode assemblies 20, 50, and the thickness (Ta) of the electrode layers 21, 51, the thickness (Tb) of the resin buffer layers 22, 52, and the thickness of the electrode protective layers 23, 53 (Tc) And the thickness (Td) of the electrode guiding layers 24, 54; wherein the thickness (T) of the outer electrode assembly 20, 50 is the thickness (Ta) of the electrode layers 21, 51, and the thickness of the resin buffer layers 22, 52 (Tb) The sum of the thickness (Tc) of the electrode protective layers 23, 53 and the thickness (Td) of the electrode guiding layers 24, 54. The above test results are shown in Table 4.

根據測試結果,就外端電極組件20、50之厚度(T)而言,本發明較現有為小,進一步比較後得知,兩者,之外端電極組件20、50之厚度(T)的差異係來自於,電極保護層23、53之厚度(Tc)以及電極導接層24、54之厚度(Td),即本發明之電極保護層23之厚度(Tc)以及電極導接層24(Td)之厚度皆較現有之電極保護層53之厚度(Tc)以及電極導接層54之厚度(Td)為小。 According to the test results, in terms of the thickness (T) of the outer end electrode assemblies 20, 50, the present invention is smaller than the prior art, and further, after comparison, the thickness (T) of the outer end electrode assemblies 20, 50 is known. The difference is derived from the thickness (Tc) of the electrode protective layers 23, 53 and the thickness (Td) of the electrode guiding layers 24, 54, that is, the thickness (Tc) of the electrode protective layer 23 of the present invention and the electrode guiding layer 24 ( The thickness of Td) is smaller than the thickness (Tc) of the conventional electrode protective layer 53 and the thickness (Td) of the electrode conductive layer 54.

實施例三 Embodiment 3

本實施例係比較使用電鍍方式分別製作如圖1中所示之本發明之具緩衝層之積層陶瓷電容器;以及如圖3中所示之現有之積層陶瓷電容器,兩者之電導率、電極保護層23、53之厚度(Tc)以及應力緩衝性能(彎折測試失敗率);兩者之樹脂緩衝層22、52之成分配比及測試結果如表五中所示。此外,本實施例之測試方法係同於實施例一,並同時調整固化性樹脂的比例,以確認本發明之特性之改善。 In this embodiment, a multilayer ceramic capacitor having a buffer layer of the present invention as shown in FIG. 1 is separately produced by using an electroplating method; and a conventional multilayer ceramic capacitor as shown in FIG. 3, the conductivity and electrode protection of the two are compared. The thickness (Tc) of the layers 23, 53 and the stress buffering performance (bending test failure rate); the distribution ratio of the resin buffer layers 22, 52 of the two and the test results are shown in Table 5. Further, the test method of this example is the same as that of the first embodiment, and the ratio of the curable resin is adjusted at the same time to confirm the improvement of the characteristics of the present invention.

於表5中,實驗例#1~#7係為本發明,比較例#1~#3則為現有之積層陶瓷電容器。 In Table 5, Experimental Examples #1 to #7 are the present invention, and Comparative Examples #1 to #3 are conventional multilayer ceramic capacitors.

其中,實驗例#1~#7之樹脂緩衝層22,其熱固性樹脂係使用環氧樹脂,其第一導電添加物係為銅粉/銅片,其第二導電添加物係為錫鉍合金粉;比較例#1~#3之樹脂緩衝層22,其樹脂同樣係使用熱固性樹脂,其導電添加物係為銅粉及銅片。 Among them, the resin buffer layer 22 of the experimental examples #1 to #7, the thermosetting resin is an epoxy resin, the first conductive additive is a copper powder/copper sheet, and the second conductive additive is a tin-bismuth alloy powder. The resin buffer layer 22 of Comparative Examples #1 to #3 is similarly made of a thermosetting resin, and the conductive additive is copper powder and copper sheet.

如表5中所示,實驗例#1~#5中,在維持固定的樹脂緩衝層22之厚度為70~90um時;以及熱固性樹脂的比例的條件下,隨著第二導電添加物的比例減少,電導率會逐步上升,但是到達一定添加量(實驗例#3)之後,由於第二導電添加物(本實施例中為錫鉍合金粉)的電導率較第一導電添加物(本實施例中為銅粉/銅片)為低,因而造成電導率下降。實驗例#6~#7為降低固化性樹脂的添加量,而使電導率有明顯提升的趨勢,但在於彎折測試則開始有失效品出現。又,相對於比較例#1~#3的電導率及電極保護層53之厚度,實驗例#1~#7的電導率都有比較明顯的提升,並具有較小厚度之電極保護層23。 As shown in Table 5, in Experimental Examples #1 to #5, the ratio of the second conductive additive was maintained while maintaining the thickness of the fixed resin buffer layer 22 of 70 to 90 μm and the ratio of the thermosetting resin. Decreasing, the conductivity will gradually increase, but after reaching a certain addition amount (Experimental Example #3), the conductivity of the second conductive additive (in this embodiment, tin-bismuth alloy powder) is higher than that of the first conductive additive (this embodiment) In the case of copper powder/copper sheet, it is low, resulting in a decrease in electrical conductivity. In the experimental examples #6 to #7, in order to reduce the amount of the curable resin, the electrical conductivity was significantly increased, but in the bending test, the defective product began to appear. Further, with respect to the electrical conductivity of Comparative Examples #1 to #3 and the thickness of the electrode protective layer 53, the electrical conductivity of the experimental examples #1 to #7 was significantly improved, and the electrode protective layer 23 having a small thickness was provided.

另外,如表5中所示,依據樹脂緩衝層22的 成分比例之不同,乃分別比較實驗例#1與比較例#1、實驗例#6與比較例#3,以及實驗例#7與比較例#2之彎折測試失敗率及電極保護層23、53之厚度,顯示出實驗例#1、#6、#7之彎折測試結果分別優於其相對應的比較例,亦具有較其相對應的比較例為薄的電極保護層23。 In addition, as shown in Table 5, according to the resin buffer layer 22 The difference in composition ratio was compared between Experimental Example #1 and Comparative Example #1, Experimental Example #6 and Comparative Example #3, and Experimental Example #7 and Comparative Example #2, the bending test failure rate and the electrode protective layer 23, The thickness of 53 shows that the bending test results of Experimental Examples #1, #6, and #7 are superior to the corresponding comparative examples, and the electrode protective layer 23 is thinner than the corresponding comparative example.

實施例四 Embodiment 4

本實施例係使用電鍍方式製作如圖1中所示之本發明之具緩衝層之積層陶瓷電容器;依據其樹脂緩衝層22之第二導電添加物的尺寸的不同分為實驗例#8~#12,測試結果如表6中所示。其中,本實施例之測試方法係同於實施例一,且本實施例之樹脂緩衝層22所使用的熱固性樹脂、第一導電添加物及第二導電添加物之種類係與實施例三之實驗例#1~#7相同。 In this embodiment, a laminated ceramic capacitor having a buffer layer of the present invention as shown in FIG. 1 is produced by electroplating; according to the size of the second conductive additive of the resin buffer layer 22, it is divided into experimental examples #8~# 12. The test results are shown in Table 6. The test method of the embodiment is the same as that of the first embodiment, and the types of the thermosetting resin, the first conductive additive and the second conductive additive used in the resin buffer layer 22 of the embodiment are the same as those in the third embodiment. Example #1~#7 are the same.

如表5及表6所示,實驗例#8~#12,在維持固定的樹脂緩衝層22之厚度為70~90um時、以及熱固性樹脂、第一導電添加物、第二導電添加物之比例的條件下,不同尺寸(1~20μm)的第二導電添加物(本實施例中為錫鉍合金粉)的電導率都較實施例三的比較例#1~#3為佳,且實驗例#8~#12係具有較薄的電極保護層23,進而達到良好的彎折測試結果。 As shown in Tables 5 and 6, in Experimental Examples #8 to #12, when the thickness of the fixed resin buffer layer 22 was 70 to 90 μm, and the ratio of the thermosetting resin, the first conductive additive, and the second conductive additive Under the condition, the electrical conductivity of the second conductive additive of different sizes (1~20μm) (the tin-bismuth alloy powder in this embodiment) is better than the comparative examples #1~#3 of the third embodiment, and the experimental example #8~#12 has a thin electrode protection layer 23, and thus achieves a good bending test result.

實施例五 Embodiment 5

本實施例係使用電鍍方式製作如圖1中所示之本發明之具緩衝層之積層陶瓷電容器;固定樹脂緩衝層22之成分比例及種類,依據樹脂緩衝層22成形過程中時,對其加熱至其樹脂固化之間的不同溫度點,分為實施例 #13~#21,進行樹脂緩衝層22之電導率、電極保護層23之厚度以及應力緩衝性能(彎折測試失敗率)進行測試,其測試結果及成份比例如表七中所示。其中,本實施例之測試方法係同於實施例一,且本實施例之樹脂緩衝層22所使用的樹脂、第一導電添加物及第二導電添加物之種類係與前述之實驗例#1~#7及#8~#12相同,進一步而言,熱固性樹脂為環氧樹脂,其固化溫度為260C,第二導電添加物為錫鉍合金粉,其熔點為139C。 In this embodiment, a laminated ceramic capacitor having a buffer layer of the present invention as shown in FIG. 1 is produced by electroplating; the composition ratio and type of the fixed resin buffer layer 22 are heated according to the resin buffer layer 22 during the forming process. Different temperature points between the curing of the resin, divided into examples #13~#21, the conductivity of the resin buffer layer 22, the thickness of the electrode protective layer 23, and the stress buffering performance (bending test failure rate) were tested, and the test results and composition ratios are shown in Table 7. The test method of the present embodiment is the same as that of the first embodiment, and the types of the resin, the first conductive additive and the second conductive additive used in the resin buffer layer 22 of the present embodiment are the same as the experimental example #1 described above. ~#7 and #8~#12 are the same. Further, the thermosetting resin is an epoxy resin having a curing temperature of 260 C, and the second conductive additive is tin antimony alloy powder having a melting point of 139 C.

如表7所示,實驗例#13~#16為尚未達到熱固性樹脂之固化溫度,則無電導率之數值、電極保護層23之厚度及彎折測試失敗率。實驗例#17~#19之溫度雖然尚未達到熱固性樹脂的固化溫度,但其電導率已達到可電鍍的條件,但在於彎折測試中,因為熱固性樹脂未完全固化,因此彎折測試的特性並無明顯的改善。#20~#21則達到熱固性樹脂的固化溫度,因此彎折測試的失敗率明顯下降。 As shown in Table 7, in the experimental examples #13 to #16, the curing temperature of the thermosetting resin was not reached, and the value of the electric conductivity, the thickness of the electrode protective layer 23, and the bending test failure rate were not obtained. Although the temperature of the experimental example #17~#19 has not reached the curing temperature of the thermosetting resin, the electrical conductivity has reached the condition of electroplating, but in the bending test, since the thermosetting resin is not completely cured, the characteristics of the bending test are No significant improvement. #20~#21 reached the curing temperature of the thermosetting resin, so the failure rate of the bending test was significantly reduced.

其中,由於第二導電添加物為低熔點之金屬,其融化溫度係低於熱固性樹脂之固化溫度,在熱固性樹脂未完全固化時,第二導電添加物開始有熔融的現象,並可導通第一導電添加物;因此在導通路徑上除了原先熱固性樹脂固化造成第一導電添加物緻密化而導通之外並增加第二種導通路徑,藉此提升電導率。 Wherein, since the second conductive additive is a low melting point metal, the melting temperature is lower than the curing temperature of the thermosetting resin, and when the thermosetting resin is not completely cured, the second conductive additive begins to melt and can be turned on first. The conductive additive; thus, in addition to the densification of the first conductive additive in the conduction path, the first conductive additive is densified and turned on, and the second conduction path is increased, thereby increasing the conductivity.

由上述可知,本發明藉由於樹脂緩衝層22中加入第二種添加物,改善樹脂緩衝層22的導電性改善,進而降低電極保護層23的厚度,以提升積層陶瓷電容器的緩衝功能,並解決其內電極層12與堆疊體10因外部應力所 導致破裂而短路的問題,故本發明作之積層陶瓷電容器可對於外部應力具備優良的抵抗力。 As described above, the present invention improves the conductivity of the resin buffer layer 22 by adding a second additive to the resin buffer layer 22, thereby reducing the thickness of the electrode protective layer 23, thereby improving the buffering function of the laminated ceramic capacitor and solving the problem. The inner electrode layer 12 and the stacked body 10 are externally stressed The problem of causing a rupture and a short circuit makes the multilayer ceramic capacitor of the present invention excellent in resistance to external stress.

10‧‧‧堆疊體 10‧‧‧Stack

11‧‧‧介電層 11‧‧‧Dielectric layer

12‧‧‧內電極層 12‧‧‧Internal electrode layer

20‧‧‧外端電極組件 20‧‧‧External electrode assembly

21‧‧‧電極層 21‧‧‧electrode layer

22‧‧‧樹脂緩衝層 22‧‧‧ resin buffer layer

23‧‧‧電極保護層 23‧‧‧Electrode protective layer

24‧‧‧電極導接層 24‧‧‧Electrode conductive layer

Claims (16)

一種具緩衝層之積層陶瓷電容器,其中包含:一堆疊體,其係由至少三介電層與至少二內電極層交互堆疊所構成,而各相鄰的內電極層係分別露出於該堆疊體兩端;以及,二外端電極組件,兩外端電極組件分別設置於該堆疊體之兩端部,各外端電極組件包含一電極層、一樹脂緩衝層、一電極保護層以及一電極導接層;該電極層係至少包覆於該堆疊體之端部,與露出於該堆疊體相對端的內電極層接觸;該樹脂緩衝層係包覆於該電極層之外表面,其係包含有熱固性樹脂、第一導電添加物及第二導電添加物,該第二導電添加物為金屬,該熱固性樹脂之固化溫度係高於第二導電添加物之熔點;該電極保護層係包覆成形於該樹脂緩衝層之外表面;該電極導接層係包覆成形於該電極保護層之外表面。 A multilayer ceramic capacitor with a buffer layer, comprising: a stacked body, wherein at least three dielectric layers are alternately stacked with at least two internal electrode layers, and adjacent adjacent internal electrode layers are respectively exposed to the stacked body And the two outer end electrode assemblies are respectively disposed at two ends of the stack, and the outer end electrode assemblies comprise an electrode layer, a resin buffer layer, an electrode protection layer and an electrode lead a layer of the electrode; the electrode layer is at least covered at an end of the stack, and is in contact with an inner electrode layer exposed at an opposite end of the stack; the resin buffer layer is coated on an outer surface of the electrode layer, and the a thermosetting resin, a first conductive additive and a second conductive additive, wherein the second conductive additive is a metal, and the curing temperature of the thermosetting resin is higher than a melting point of the second conductive additive; the electrode protective layer is overmolded The outer surface of the resin buffer layer; the electrode conductive layer is overmolded on the outer surface of the electrode protective layer. 如請求項1所述之具緩衝層之積層陶瓷電容器,其中該熱固性樹脂之含量為12至50重量百分比(wt%),以樹脂緩衝層總重量為基礎。 The multilayer ceramic capacitor having a buffer layer according to claim 1, wherein the thermosetting resin is contained in an amount of from 12 to 50% by weight (% by weight) based on the total mass of the resin buffer layer. 如請求項1所述之具緩衝層之積層陶瓷電容器,其中以該第一導電添加物及該第二導電添加物之重量總和為基礎,該第一導電添加物之含量係介於50至95wt%。 The multilayer ceramic capacitor with a buffer layer according to claim 1, wherein the first conductive additive is based on a total weight of the first conductive additive and the second conductive additive, and the content of the first conductive additive is between 50 and 95 wt. %. 如請求項1所述之具緩衝層之積層陶瓷電容器,其中該第二導電添加物之尺寸介於為0.1微米(μm)至100微米(μm)之間。 The multilayer ceramic capacitor with a buffer layer according to claim 1, wherein the second conductive additive has a size of between 0.1 micrometer (μm) and 100 micrometers (μm). 如請求項1所述之具緩衝層之積層陶瓷電容器,其中該第二導電添加物之熔點係介於100℃至300℃之間。 The multilayer ceramic capacitor with a buffer layer according to claim 1, wherein the second conductive additive has a melting point of between 100 ° C and 300 ° C. 如請求項1所述之具緩衝層之積層陶瓷電容器,其中該樹脂緩衝層之厚度介於0.1微米(μm)至100微米(μm)之間。 The multilayer ceramic capacitor with a buffer layer according to claim 1, wherein the resin buffer layer has a thickness of between 0.1 micrometer (μm) and 100 micrometers (μm). 如請求項1所述之具緩衝層之積層陶瓷電容器,其中該電極保護層之厚度介於0.1微米(μm)至30微米(μm)之間。 The multilayer ceramic capacitor with a buffer layer according to claim 1, wherein the electrode protective layer has a thickness of between 0.1 micrometer (μm) and 30 micrometers (μm). 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該熱固性樹脂為導電性樹脂,該導電性樹脂係包含至少一種選自於由聚乙炔類、聚噻吩類、聚吡咯類、聚苯胺類以及聚芳香烴乙烯所組成之群組的熱固性樹脂。 The multilayer ceramic capacitor with a buffer layer according to any one of claims 1 to 7, wherein the thermosetting resin is a conductive resin, and the conductive resin comprises at least one selected from the group consisting of polyacetylenes and polythiophenes. A thermosetting resin of a group consisting of polypyrroles, polyanilines, and polyaromatic ethylene. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該熱固性樹脂為非導電性樹脂,該非導電性樹脂係包含至少一種選自於由環氧樹脂類、酚醛類樹脂、尿素樹脂、美耐皿樹脂、不飽和聚脂樹脂、矽脂樹脂以及聚胺基甲酸脂所組成之群組的熱固性樹脂。 The multilayer ceramic capacitor with a buffer layer according to any one of claims 1 to 7, wherein the thermosetting resin is a non-conductive resin, and the non-conductive resin comprises at least one selected from the group consisting of epoxy resins and phenols. A thermosetting resin composed of a group of a resin, a urea resin, a melamine resin, an unsaturated polyester resin, a resin resin, and a polyurethane. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該第一添加物係選自於由金屬類粉末、金屬類箔片、金屬類纖維、碳類纖維和碳類形態之導電添加物所組成之群組;其中金屬類粉末、金屬類箔片、金屬類纖維係包含至少一種選自於由鎳、銀、銅、鈀、其混合物及其合金所組成之群組中的物質;其中碳類纖維和碳類形態之導電添加物包含至少一種選自於由活性碳、碳纖維以及碳奈米管所組成之群組中的物質。 The multilayer ceramic capacitor with a buffer layer according to any one of claims 1 to 7, wherein the first additive is selected from the group consisting of metal powders, metal foils, metal fibers, carbon fibers, and carbon. a group consisting of a class of conductive additives; wherein the metal powder, the metal foil, and the metal fiber comprise at least one selected from the group consisting of nickel, silver, copper, palladium, mixtures thereof, and alloys thereof. The substance in the group; wherein the carbon fiber and the carbon-based conductive additive comprise at least one selected from the group consisting of activated carbon, carbon fiber, and carbon nanotubes. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該第二導電添加物係包含至少一種選自由金屬類粉末、金屬類箔片、金屬類纖維之導電物所組成之群組中之物質;其中金屬類粉末、金屬類箔片、金屬類纖維之組成物係包含至少一選自由錫、鉍、鉛、銦、其混合物及其合金所組成之群組中的物質。 The multilayer ceramic capacitor with a buffer layer according to any one of claims 1 to 7, wherein the second conductive additive comprises at least one selected from the group consisting of a metal powder, a metal foil, and a metal fiber. a substance in a group; wherein the metal powder, the metal foil, and the metal fiber composition comprise at least one selected from the group consisting of tin, antimony, lead, indium, mixtures thereof, and alloys thereof substance. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該內電極層係選自於由鎳、銅、銀、鈀的粉末、合金、化合物以及其組合所組成之群組。 The multilayer ceramic capacitor with a buffer layer according to any one of claims 1 to 7, wherein the internal electrode layer is selected from the group consisting of powders, alloys, compounds, and combinations thereof of nickel, copper, silver, and palladium. Group. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該介電層係為陶瓷材料所組成。 The multilayer ceramic capacitor having a buffer layer according to any one of claims 1 to 7, wherein the dielectric layer is composed of a ceramic material. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該電極層的材質係為玻璃與銅、銀、鎳的金屬粉末或其混合物所組成。 The multilayer ceramic capacitor having a buffer layer according to any one of claims 1 to 7, wherein the electrode layer is made of glass and a metal powder of copper, silver or nickel or a mixture thereof. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該電極保護層係由鎳所組成。 The multilayer ceramic capacitor having a buffer layer according to any one of claims 1 to 7, wherein the electrode protective layer is composed of nickel. 如請求項1至7中任一項所述之具緩衝層之積層陶瓷電容器,其中該電極導接層係由錫所組成。 The multilayer ceramic capacitor having a buffer layer according to any one of claims 1 to 7, wherein the electrode conductive layer is composed of tin.
TW102111653A 2013-04-01 2013-04-01 Multi-layer ceramic capacitor with buffer layer TW201440098A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW102111653A TW201440098A (en) 2013-04-01 2013-04-01 Multi-layer ceramic capacitor with buffer layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102111653A TW201440098A (en) 2013-04-01 2013-04-01 Multi-layer ceramic capacitor with buffer layer

Publications (1)

Publication Number Publication Date
TW201440098A true TW201440098A (en) 2014-10-16

Family

ID=52113898

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102111653A TW201440098A (en) 2013-04-01 2013-04-01 Multi-layer ceramic capacitor with buffer layer

Country Status (1)

Country Link
TW (1) TW201440098A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI573156B (en) * 2014-12-05 2017-03-01 Taiyo Yuden Kk Laminated ceramic electronic parts

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI573156B (en) * 2014-12-05 2017-03-01 Taiyo Yuden Kk Laminated ceramic electronic parts

Similar Documents

Publication Publication Date Title
US9368251B2 (en) Multilayer ceramic capacitor with conductive fullerene-filling resin layer, method for same, and mounting board with same
JP4844311B2 (en) Ceramic electronic components
KR101245250B1 (en) Chip-type electronic component
US20130088810A1 (en) Multilayer ceramic capacitor and method for manufacturing the same
KR20180084030A (en) Multilayered capacitor and method of manufacturing the same
US20130294006A1 (en) Conductive resin composition, multilayer ceramic capacitor having the same and method of manufacturing the same
JP5930045B2 (en) Ceramic electronic components
KR20070089629A (en) An electronic component
KR101814084B1 (en) Conductive paste compound for soft termination electrode of ceramic chip parts
US20120305302A1 (en) Mounting structure of electronic component
US20210375545A1 (en) Chip ceramic electronic component and method for manufacturing the same
KR20150144290A (en) Conductive resin paste and ceramic electronic component
US10381152B2 (en) Coil component and coil-component-equipped mounting substrate
CN104103421A (en) Multilayer ceramic capacitor with buffer layer
US11581141B2 (en) Leadless stack comprising ceramic capacitor
JP5071118B2 (en) Ceramic electronic components
CN105702432B (en) Electronic component and board having the same
JP2009283744A (en) Method for manufacturing ceramic electronic component
JP2013110372A (en) Chip type electronic component
JP4973546B2 (en) Conductive paste, multilayer ceramic electronic component and multilayer ceramic substrate
US20230230766A1 (en) Ceramic electronic chip component and method for manufacturing the same
TW201440098A (en) Multi-layer ceramic capacitor with buffer layer
EP3876251A1 (en) Leadless stack comprising ceramic capacitors
JP3206736B2 (en) Ceramic capacitors
KR20220096782A (en) Multi-layer ceramic electronic component