TW201426959A - Chip package - Google Patents
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- TW201426959A TW201426959A TW101148925A TW101148925A TW201426959A TW 201426959 A TW201426959 A TW 201426959A TW 101148925 A TW101148925 A TW 101148925A TW 101148925 A TW101148925 A TW 101148925A TW 201426959 A TW201426959 A TW 201426959A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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Abstract
Description
本發明係有關於晶片封裝體,且特別是有關於多晶片封裝體。 This invention relates to wafer packages, and more particularly to multi-chip packages.
隨著電子產品朝向輕、薄、短、小發展的趨勢,半導體晶片的封裝結構也朝向多晶片封裝(multi-chip package,MCP)結構發展,以達到多功能和高性能要求。多晶片封裝結構係將不同類型的半導體晶片,例如邏輯晶片、類比晶片、控制晶片或記憶體晶片,整合在單一封裝基底之上。 As electronic products are moving toward light, thin, short, and small trends, the packaging structure of semiconductor wafers is also moving toward multi-chip package (MCP) structures to meet versatility and high performance requirements. Multi-chip package structures integrate different types of semiconductor wafers, such as logic wafers, analog wafers, control wafers or memory chips, onto a single package substrate.
然而,隨著需整合的晶片數量上升,將多晶片二維地整合在封裝基底(如矽基底)上會造成封裝體體積無法有效縮小,且亦會佔去過多面積而造成製作成本增加,不利於可攜式電子產品的應用。 However, as the number of wafers to be integrated increases, the two-dimensional integration of the multi-wafer on the package substrate (such as the germanium substrate) may result in an ineffective reduction of the package volume, and may also occupy too much area, resulting in an increase in manufacturing cost, which is disadvantageous. For the application of portable electronic products.
此外,業界亦有縮小封裝體之尺寸與增加訊號傳遞速度之需求。 In addition, the industry has also reduced the size of the package and increased the speed of signal transmission.
本發明一實施例提供一種晶片封裝體,包括:一第一基底;一第二基底,設置於該第一基底之上,其中該第二基底具有一第一開口,露出該第一基底;一第三基底,設置於該第二基底之上,其中該第三基底具有一第二開口,露出該第一開口與部份之該第二基底;一第一晶片,設置於該第一開口所露出之該第一基底之上;一第二晶片,連 接於該部份之該第二基底,並設置於該第二開口所露出之該第二基底與該第一晶片之上;以及一第三晶片,連接於該第三基底,並設置於該第二開口與該第三基底之上。 An embodiment of the present invention provides a chip package including: a first substrate; a second substrate disposed on the first substrate, wherein the second substrate has a first opening to expose the first substrate; a third substrate disposed on the second substrate, wherein the third substrate has a second opening exposing the first opening and a portion of the second substrate; a first wafer disposed at the first opening Exposed on the first substrate; a second wafer, connected a second substrate connected to the portion and disposed on the second substrate exposed by the second opening and the first wafer; and a third wafer connected to the third substrate and disposed on the second substrate The second opening is over the third substrate.
以下將詳細說明本發明實施例之製作與使用方式。然應注意的是,本發明提供許多可供應用的發明概念,其可以多種特定型式實施。文中所舉例討論之特定實施例僅為製造與使用本發明之特定方式,非用以限制本發明之範圍。此外,在不同實施例中可能使用重複的標號或標示。這些重複僅為了簡單清楚地敘述本發明,不代表所討論之不同實施例及/或結構之間具有任何關連性。再者,當述及一第一材料層位於一第二材料層上或之上時,包括第一材料層與第二材料層直接接觸或間隔有一或更多其他材料層之情形。 The manner of making and using the embodiments of the present invention will be described in detail below. It should be noted, however, that the present invention provides many inventive concepts that can be applied in various specific forms. The specific embodiments discussed herein are merely illustrative of specific ways of making and using the invention, and are not intended to limit the scope of the invention. Moreover, repeated numbers or labels may be used in different embodiments. These repetitions are merely for the purpose of simplicity and clarity of the invention and are not to be construed as a limitation of the various embodiments and/or structures discussed. Furthermore, when a first material layer is referred to or on a second material layer, the first material layer is in direct contact with or separated from the second material layer by one or more other material layers.
第1圖顯示根據本發明一實施例之晶片封裝體10的剖面圖。晶片封裝體10為多個基底與多個晶片之堆疊結構。在一實施例中,晶片封裝體10包括彼此堆疊之基底100a、100b、及100c。基底100a、100b、及100c亦可稱為中介層基底(interposer)。基底100a、100b、及100c之材質可包括(但不限於)半導體材料、玻璃、陶瓷材料、高分子材料、或前述之組合。在第1圖之實施例中,係以半導體材料為例。例如,基底100a、100b、及100c可為矽基底或矽晶圓。在一實施例中,基底100a、100b、及100c可彼此不直接接觸。例如,基底100a、100b、及100c可間隔有導電結構 1 shows a cross-sectional view of a chip package 10 in accordance with an embodiment of the present invention. The chip package 10 is a stacked structure of a plurality of substrates and a plurality of wafers. In an embodiment, the chip package 10 includes substrates 100a, 100b, and 100c stacked on each other. The substrates 100a, 100b, and 100c may also be referred to as interposers. The materials of the substrates 100a, 100b, and 100c may include, but are not limited to, a semiconductor material, a glass, a ceramic material, a polymer material, or a combination thereof. In the embodiment of Fig. 1, a semiconductor material is taken as an example. For example, the substrates 100a, 100b, and 100c can be germanium substrates or germanium wafers. In an embodiment, the substrates 100a, 100b, and 100c may not be in direct contact with each other. For example, the substrates 100a, 100b, and 100c may be separated by a conductive structure
如第1圖所示,基底100b係設置於基底100a之上,且具有露出基底100a之開口114b。在一實施例中,基底100a中可形成有導電路徑106a,其可包括水平導電路徑(例如,線路層)、垂直導電路徑(例如,導電插塞)、或前述之組合。這些導電路徑彼此之間可不相連。在一實施例中,基底100a與導電路徑106a之間可形成有絕緣層104a。部分的導電路徑106a可於基底100a之上表面露出,其可用以與其他電子元件電性連接。相似地,基底100b中亦可形成有導電路徑106b及絕緣層104b。導電路徑106b可為多條彼此不相連之線路。基底100c亦可形成有導電路徑106c及絕緣層104c。導電路徑106c可為多條彼此不相連之線路。 As shown in Fig. 1, the substrate 100b is disposed on the substrate 100a and has an opening 114b exposing the substrate 100a. In an embodiment, a conductive path 106a may be formed in the substrate 100a, which may include a horizontal conductive path (eg, a wiring layer), a vertical conductive path (eg, a conductive plug), or a combination of the foregoing. These conductive paths may not be connected to each other. In an embodiment, an insulating layer 104a may be formed between the substrate 100a and the conductive path 106a. A portion of the conductive path 106a may be exposed on the upper surface of the substrate 100a, which may be used to electrically connect with other electronic components. Similarly, a conductive path 106b and an insulating layer 104b may be formed in the substrate 100b. The conductive path 106b can be a plurality of lines that are not connected to each other. The substrate 100c may also be formed with a conductive path 106c and an insulating layer 104c. The conductive path 106c can be a plurality of lines that are not connected to each other.
然應注意的是,本發明實施例不限於此。在其他實施例中,基底100a中之多條導電路徑106a中,可有部分的導電路徑106a係彼此電性連接,例如部分的導電路徑106a可電性連接至一相同的電極。相似地,基底100b中之多條導電路徑106b中,可有部分的導電路徑106b係彼此電性連接,而基底100c中之多條導電路徑106c中,亦可有部分的導電路徑106c係彼此電性連接。如第1圖所示,晶片102a係設置於基底100b之開口114b之中,且設置於開口114b所露出之基底100a之上。在一實施例中,晶片102a可透過導電結構110a而與基底100a之上表面上之導電路徑106a電性連接。因此,電性訊號可於基底100a與晶片102a之間傳遞。導電結構110a可為銲球、導電凸塊、或其 相似物。 It should be noted that embodiments of the present invention are not limited thereto. In other embodiments, among the plurality of conductive paths 106a in the substrate 100a, a portion of the conductive paths 106a may be electrically connected to each other. For example, a portion of the conductive paths 106a may be electrically connected to a same electrode. Similarly, in the plurality of conductive paths 106b in the substrate 100b, a part of the conductive paths 106b may be electrically connected to each other, and in the plurality of conductive paths 106c in the substrate 100c, a part of the conductive paths 106c may be electrically connected to each other. Sexual connection. As shown in Fig. 1, the wafer 102a is disposed in the opening 114b of the substrate 100b and is disposed on the substrate 100a exposed by the opening 114b. In one embodiment, the wafer 102a is electrically coupled to the conductive path 106a on the upper surface of the substrate 100a through the conductive structure 110a. Therefore, an electrical signal can be transferred between the substrate 100a and the wafer 102a. The conductive structure 110a may be a solder ball, a conductive bump, or Similar.
晶片封裝體10還更包括晶片102b。晶片102b係設置於基底100c開口114c中,且設置於開口114c露出之基底100b上。在一實施例中,晶片102b透透過導電結構110b與基底100b上表面上之導電路徑106b電性連接。因此,電性訊號可於基底100b與晶片102b之間傳遞。此外,基底100b之導電路徑106b可透過導電結構108b而電性連接基底100a中之導電路徑106a。因此,電性訊號亦可於基底100b與晶片102b之間傳遞或於晶片102a與晶片102b之間傳遞。導電結構110b及導電結構108b可為銲球、導電凸塊、或其相似物。 The chip package 10 further includes a wafer 102b. The wafer 102b is disposed in the opening 114c of the substrate 100c and disposed on the exposed substrate 100b of the opening 114c. In one embodiment, the wafer 102b is electrically connected to the conductive path 106b on the upper surface of the substrate 100b through the conductive structure 110b. Therefore, an electrical signal can be transferred between the substrate 100b and the wafer 102b. In addition, the conductive path 106b of the substrate 100b can be electrically connected to the conductive path 106a in the substrate 100a through the conductive structure 108b. Therefore, the electrical signal can also be transferred between the substrate 100b and the wafer 102b or between the wafer 102a and the wafer 102b. The conductive structure 110b and the conductive structure 108b may be solder balls, conductive bumps, or the like.
晶片封裝體10還更包括晶片102c。晶片102c設置於基底100c之上。在一實施例中,晶片102c過導電結構110c與基底100c上表面上之導電路徑106c電性連接。因此,電性訊號可於基底100c與晶片102c之間傳遞。在一實施例中,晶片102c可透過基底100c中之導電路徑106c、導電結構108c、及基底100b中之導電路徑106b而與晶片102b彼此傳遞及/或接收訊號。晶片102c與晶片102a之間,亦可透過基底100a、100b、及100c中之導電路徑而彼此傳遞及/或接收訊號。導電結構110c及導電結構108c可為銲球、導電凸塊、或其相似物。在一實施例中,晶片封裝體10還包括設置於基底100a下之導電結構108a。導電結構108a可為銲球、導電凸塊、或其相似物。導電結構108a可用以與其他電子元件(例如,電路板)電性連接。此 外,在一實施例中,可使用封裝膠體包覆第1圖所示之晶片封裝體10。或者,可於晶片封裝體10之中設置散熱構件。 The chip package 10 further includes a wafer 102c. The wafer 102c is disposed on the substrate 100c. In one embodiment, the wafer 102c is electrically connected to the conductive path 106c on the upper surface of the substrate 100c via the conductive structure 110c. Therefore, an electrical signal can be transferred between the substrate 100c and the wafer 102c. In one embodiment, the wafer 102c can transmit and/or receive signals to and from the wafer 102b through the conductive paths 106c, the conductive structures 108c, and the conductive paths 106b in the substrate 100b. Between the wafer 102c and the wafer 102a, signals can also be transmitted and/or received through the conductive paths in the substrates 100a, 100b, and 100c. The conductive structure 110c and the conductive structure 108c may be solder balls, conductive bumps, or the like. In an embodiment, the chip package 10 further includes a conductive structure 108a disposed under the substrate 100a. Conductive structure 108a can be a solder ball, a conductive bump, or the like. The conductive structure 108a can be used to electrically connect with other electronic components (eg, a circuit board). this In addition, in one embodiment, the chip package 10 shown in FIG. 1 can be coated with an encapsulant. Alternatively, a heat dissipating member may be disposed in the chip package 10.
如第1圖所示,在一實施例中,開口114c大於開口114b。開口114c與開口114b可彼此相連通。在一實施例中,晶片102c之寬度大於晶片102b之寬度,且晶片102b之寬度大於晶片102a之寬度。在另一實施例中,晶片102c之面積大於晶片102b之面積,且晶片102b之面積大於晶片102a之面積。此外,在一實施例中,晶片102b之上表面可高於基底100c之上表面而凸出基底100c之開口114c之外。在此情形下,晶片102b之上表面與晶片102c之間的間距小於基底100c之上表面與晶片102c之間的間距。在一實施例中,晶片102a之上表面可高於基底100b之上表面而凸出基底100b之開口114b之外。在此情形下,晶片102a之上表面與晶片102b之間的間距小於基底100b之上表面與晶片102b之間的間距。 As shown in FIG. 1, in one embodiment, the opening 114c is larger than the opening 114b. The opening 114c and the opening 114b may be in communication with each other. In one embodiment, the width of the wafer 102c is greater than the width of the wafer 102b, and the width of the wafer 102b is greater than the width of the wafer 102a. In another embodiment, the area of the wafer 102c is greater than the area of the wafer 102b, and the area of the wafer 102b is greater than the area of the wafer 102a. Further, in an embodiment, the upper surface of the wafer 102b may be higher than the upper surface of the substrate 100c to protrude beyond the opening 114c of the substrate 100c. In this case, the spacing between the upper surface of the wafer 102b and the wafer 102c is smaller than the spacing between the upper surface of the substrate 100c and the wafer 102c. In an embodiment, the upper surface of the wafer 102a may be higher than the upper surface of the substrate 100b to protrude beyond the opening 114b of the substrate 100b. In this case, the spacing between the upper surface of the wafer 102a and the wafer 102b is smaller than the spacing between the upper surface of the substrate 100b and the wafer 102b.
在一實施例中,晶片102a、晶片102b、及晶片102c可為功能彼此不同之晶片。例如,晶片102a可為快閃晶片(flash chip),晶片102b可為動態隨機存取記憶體晶片(DRAM chip),而晶片102c可為中央處理器晶片(CPU chip)。然應注意的是,本發明實施例不限於此。在其他實施例中,晶片封裝體中之部分晶片可能具有大抵相同之功能。 In one embodiment, wafer 102a, wafer 102b, and wafer 102c may be wafers that differ in function from one another. For example, the wafer 102a may be a flash chip, the wafer 102b may be a DRAM chip, and the wafer 102c may be a CPU chip. It should be noted that embodiments of the present invention are not limited thereto. In other embodiments, some of the wafers in the chip package may have substantially the same function.
雖然晶片封裝體10僅顯示三個堆疊晶片,然本發明實 施例不限於此。在其他實施例之中,晶片封裝體可包括四個以上之晶片的堆疊。在本發明實施例中,多個功能相同或不同之晶片可透過之間的基底而彼此電性連接。此外,由於基底中形成有開口,可使晶片設置於其中而減小晶片封裝體之整體厚度。再者,晶片之間的訊號傳遞可更為快速。例如,在第1圖之中,晶片102c與晶片102b可僅透過基底100c與基底100b中之導電路徑106c及106b而彼此電性連接。晶片102c與晶片102b之間的訊號傳遞可選擇性不透過基底100a中之導電路徑,因而可於較短路徑中較快速地傳遞訊號。 Although the chip package 10 only displays three stacked wafers, the present invention The embodiment is not limited to this. In other embodiments, the chip package can include a stack of more than four wafers. In the embodiment of the present invention, a plurality of wafers having the same or different functions may be electrically connected to each other through a substrate therebetween. In addition, since an opening is formed in the substrate, the wafer can be placed therein to reduce the overall thickness of the chip package. Moreover, signal transmission between the wafers can be faster. For example, in FIG. 1, the wafer 102c and the wafer 102b may be electrically connected to each other only through the conductive paths 106c and 106b in the substrate 100c and the substrate 100b. The signal transmission between the wafer 102c and the wafer 102b can selectively pass through the conductive path in the substrate 100a, thereby allowing signals to be transmitted faster in a shorter path.
第4圖顯示根據本發明一實施例之晶片封裝體40的剖面圖,其中相同或相似之標號用以標示相同或相似之元件。在此實施例中,晶片102c與晶片102b可僅透過基底100c與基底100b中之導電路徑106c及106b而彼此電性連接。如第4圖之左側部分所示,晶片102c與晶片102b之間的部分或全部訊號之傳遞可選擇性不透過基底100a中之導電路徑,而可直接採用基底100c與基底100b中之導電路徑106c及106b,因而可於較短路徑中較快速地傳遞訊號。 4 is a cross-sectional view of a wafer package 40 in accordance with an embodiment of the invention, wherein the same or similar reference numerals are used to designate the same or similar elements. In this embodiment, the wafer 102c and the wafer 102b can be electrically connected to each other only through the conductive paths 106c and 106b in the substrate 100c and the substrate 100b. As shown in the left part of FIG. 4, part or all of the signal transmission between the wafer 102c and the wafer 102b can selectively pass through the conductive path in the substrate 100a, and the conductive path 106c in the substrate 100c and the substrate 100b can be directly used. And 106b, so that the signal can be transmitted faster in a shorter path.
本發明實施例還可有許多變化。例如,第2圖顯示根據本發明一實施例之晶片封裝體20的剖面圖,而第3圖顯示根據本發明一實施例之晶片封裝體30的剖面圖,其中相同或相似之標號用以標示相同或相似之元件。 There are many variations to the embodiments of the invention. For example, FIG. 2 shows a cross-sectional view of a chip package 20 in accordance with an embodiment of the present invention, and FIG. 3 shows a cross-sectional view of a chip package 30 in accordance with an embodiment of the present invention, wherein the same or similar reference numerals are used to indicate The same or similar components.
如第2圖所示,在一實施例中,晶片封裝體20可更包 括晶片102d。晶片102d可與晶片102a將基底100a夾置於其間。晶片102d中可包括穿晶片導電結構112。晶片102d可包括包覆穿晶片導電結構112之絕緣層104d以避免短路。晶片102d可透過穿晶片導電結構112、導電結構108a、基底100a而與堆疊於其上之晶片102a、102b、及102c電性連接。 As shown in FIG. 2, in an embodiment, the chip package 20 can be further packaged. The wafer 102d is included. The wafer 102d can be sandwiched between the substrate 100a and the wafer 102a. A through wafer conductive structure 112 can be included in the wafer 102d. Wafer 102d may include an insulating layer 104d overlying wafer conductive structure 112 to avoid shorting. The wafer 102d can be electrically connected to the wafers 102a, 102b, and 102c stacked thereon by the through-wafer conductive structure 112, the conductive structure 108a, and the substrate 100a.
本發明實施例可有許多變化。例如,在第3圖之實施例中,晶片102b之上表面可不突出於開口114c而大抵與基底100c之上表面齊平。或者,晶片102a之上表面可低於基底100b之上表面。因此,本發明實施例之封裝體適於封裝各種厚度之晶片。 There are many variations to the embodiments of the invention. For example, in the embodiment of FIG. 3, the upper surface of the wafer 102b may not protrude beyond the opening 114c to be substantially flush with the upper surface of the substrate 100c. Alternatively, the upper surface of the wafer 102a may be lower than the upper surface of the substrate 100b. Therefore, the package of the embodiment of the present invention is suitable for packaging wafers of various thicknesses.
綜上所述,本發明實施例可整合多個晶片、可增加訊號傳遞速度、且適於封裝各種不同尺寸之晶片。 In summary, embodiments of the present invention can integrate multiple wafers, increase signal transmission speed, and are suitable for packaging wafers of various sizes.
雖然本發明已以數個較佳實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作任意之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of several preferred embodiments, it is not intended to limit the scope of the present invention, and any one of ordinary skill in the art can make any changes without departing from the spirit and scope of the invention. And the scope of the present invention is defined by the scope of the appended claims.
10、20、30、40‧‧‧晶片封裝體 10, 20, 30, 40‧‧‧ chip package
100a、100b、100c‧‧‧基底 100a, 100b, 100c‧‧‧ base
102a、102b、102c、102d‧‧‧晶片 102a, 102b, 102c, 102d‧‧‧ wafer
104a、104b、104c、104d‧‧‧絕緣層 104a, 104b, 104c, 104d‧‧‧ insulation
106a、106b、106c‧‧‧導電路徑 106a, 106b, 106c‧‧‧ conductive paths
108a、108b、108c、110a、110b、110c、110d‧‧‧導電結構 108a, 108b, 108c, 110a, 110b, 110c, 110d‧‧‧ conductive structure
112‧‧‧穿晶片導電結構 112‧‧‧Wearing wafer conductive structure
114b、114c‧‧‧開口 114b, 114c‧‧‧ openings
第1圖顯示根據本發明一實施例之晶片封裝體的剖面圖。 1 shows a cross-sectional view of a chip package in accordance with an embodiment of the present invention.
第2圖顯示根據本發明一實施例之晶片封裝體的剖面圖。 2 is a cross-sectional view showing a chip package in accordance with an embodiment of the present invention.
第3圖顯示根據本發明一實施例之晶片封裝體的剖面圖。 Figure 3 is a cross-sectional view showing a chip package in accordance with an embodiment of the present invention.
第4圖顯示根據本發明一實施例之晶片封裝體的剖面圖。 4 is a cross-sectional view showing a chip package in accordance with an embodiment of the present invention.
10‧‧‧晶片封裝體 10‧‧‧ chip package
100a、100b、100c‧‧‧基底 100a, 100b, 100c‧‧‧ base
102a、102b、102c‧‧‧晶片 102a, 102b, 102c‧‧‧ wafer
104a、104b、104c‧‧‧絕緣層 104a, 104b, 104c‧‧‧ insulation
106a、106b、106c‧‧‧導電路徑 106a, 106b, 106c‧‧‧ conductive paths
108a、108b、108c、110a、110b、110c‧‧‧導電結構 108a, 108b, 108c, 110a, 110b, 110c‧‧‧ conductive structure
114b、114c‧‧‧開口 114b, 114c‧‧‧ openings
Claims (7)
Priority Applications (1)
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TW101148925A TW201426959A (en) | 2012-12-21 | 2012-12-21 | Chip package |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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TW101148925A TW201426959A (en) | 2012-12-21 | 2012-12-21 | Chip package |
Publications (1)
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TW201426959A true TW201426959A (en) | 2014-07-01 |
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TW101148925A TW201426959A (en) | 2012-12-21 | 2012-12-21 | Chip package |
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TW (1) | TW201426959A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106469656A (en) * | 2015-08-12 | 2017-03-01 | 商升特公司 | Form method and the semiconductor device of the encapsulation of inverted pyramid formula cavity semiconductor |
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2012
- 2012-12-21 TW TW101148925A patent/TW201426959A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106469656A (en) * | 2015-08-12 | 2017-03-01 | 商升特公司 | Form method and the semiconductor device of the encapsulation of inverted pyramid formula cavity semiconductor |
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