TW201420221A - Cleaning equipment - Google Patents
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- TW201420221A TW201420221A TW101143294A TW101143294A TW201420221A TW 201420221 A TW201420221 A TW 201420221A TW 101143294 A TW101143294 A TW 101143294A TW 101143294 A TW101143294 A TW 101143294A TW 201420221 A TW201420221 A TW 201420221A
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Abstract
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本發明是有關於一種清潔設備,且特別是有關於一種適用以清潔光學感測系統之透明保護罩的清潔設備。 This invention relates to a cleaning apparatus, and more particularly to a cleaning apparatus suitable for cleaning a transparent protective cover of an optical sensing system.
一般而言,在捲材(如鋼鐵、塑膠、玻璃及不織布之捲材)的加工製程中,會使用到光學感測系統。舉例而言,在鋼鐵捲材的加工製程中,有以含油之液體來沖洗的步驟,所以一般的光學感測系統皆設有透明保護罩來避免光學感測系統中之光學儀器受到髒污甚至毀損。 In general, optical sensing systems are used in the processing of coils such as steel, plastic, glass and non-woven coils. For example, in the processing of steel coils, there is a step of rinsing with oil-containing liquid, so the general optical sensing system is provided with a transparent protective cover to prevent the optical instruments in the optical sensing system from being dirty or even damage.
光學儀器受到髒污時,會阻礙光訊號的傳遞與接收,從而影響光學感測系統的正常運作,進而影響鋼鐵捲材加工製程的進行。因此,透明保護罩需要常常清潔,以確保光學感測系統的正常運作,以及鋼鐵捲材加工製程的正常進行。 When the optical instrument is dirty, it will hinder the transmission and reception of the optical signal, thereby affecting the normal operation of the optical sensing system, thereby affecting the processing process of the steel coil. Therefore, the transparent protective cover needs to be cleaned frequently to ensure the normal operation of the optical sensing system and the normal processing of the steel coil processing.
然而,目前清潔透明保護罩的方式,還停留在以人工的方式進行,缺乏效率。此外,還常會在光學感測系統無法正常運作時,才會想到是光學儀器已髒污到需要清潔,但此時必須暫停鋼鐵捲材加工製程的進行,才能進行清潔的動作,從而影響鋼鐵捲材加工製程的正常進行。 However, the current way of cleaning the transparent protective cover is still carried out in an artificial manner and is inefficient. In addition, it is often thought that when the optical sensing system is not working properly, it will be thought that the optical instrument is dirty and needs to be cleaned, but at this time, the steel coil processing process must be suspended to perform the cleaning action, thereby affecting the steel coil. The material processing process is carried out normally.
因此,本發明之一態樣就是在提供一種清潔設備,其 主要是利用可間歇性噴出高壓氣體與液體之混合流體和單純之高壓氣體的噴射裝置來取代以人工清潔光學感測系統之透明保護罩,以增加效率。 Accordingly, one aspect of the present invention is to provide a cleaning apparatus that The utility model mainly replaces the transparent protective cover for manually cleaning the optical sensing system by using a spraying device capable of intermittently ejecting a mixed fluid of high-pressure gas and liquid and a simple high-pressure gas to increase efficiency.
根據本發明之上述目的,提出一種清潔設備。此清潔設備,適用以清潔光學感測系統之透明保護罩,且此清潔設備包含噴射裝置。此噴射裝置包含真空產生器以及電磁閥。真空產生器包含互相連通之噴嘴與管道,且具有和管道連通之氣體入口與液體入口。當一高壓氣體經由氣體入口進入管道時,可在液體入口產生負壓,以使真空產生器經由液體入口來吸取一液體,並將高壓氣體與液體經由噴嘴噴向透明保護罩。電磁閥與真空產生器接合,以調節進入真空產生器之液體的流量。 According to the above object of the invention, a cleaning apparatus is proposed. This cleaning device is suitable for cleaning the transparent protective cover of the optical sensing system, and the cleaning device comprises a spraying device. This injection device comprises a vacuum generator and a solenoid valve. The vacuum generator includes nozzles and conduits that are in communication with one another and have a gas inlet and a liquid inlet in communication with the conduit. When a high pressure gas enters the conduit via the gas inlet, a negative pressure can be created at the liquid inlet to cause the vacuum generator to draw a liquid through the liquid inlet and spray the high pressure gas and liquid through the nozzle toward the transparent shield. A solenoid valve is engaged with the vacuum generator to regulate the flow of liquid into the vacuum generator.
根據本發明之一實施例,上述之清潔設備更包含氣體產生器以及輸氣管,其中輸氣管連通氣體產生器與氣體入口。 According to an embodiment of the invention, the cleaning apparatus further includes a gas generator and a gas delivery pipe, wherein the gas delivery pipe communicates with the gas generator and the gas inlet.
根據本發明之另一實施例,上述之清潔設備更包含容器以及導流管,其中導流管連通容器與液體入口,且電磁閥設於導流管上。 According to another embodiment of the present invention, the cleaning apparatus further includes a container and a draft tube, wherein the draft tube communicates with the container and the liquid inlet, and the solenoid valve is disposed on the draft tube.
根據本發明之上述目的,另提出一種清潔設備。此清潔設備,適用以清潔光學感測系統之透明保護罩,且此清潔設備包含至少一噴射裝置。至少一噴射裝置包含真空產生部以及氣刀部。真空產生部包含互相連通之噴嘴與第一管道,其中真空產生部具有和第一管道連通之第一氣體入口與液體入口。當一第一高壓氣體經由第一氣體入口進入管道時,可在液體入口產生一負壓,以使真空產生部經由 液體入口來吸取一液體,並將第一高壓氣體與液體經由噴嘴噴向透明保護罩。氣刀部鄰設於真空產生部,且包含至少一出氣孔以及氣室。氣室與至少一出氣孔連通且具有第二氣體入口,以使一第二高壓氣體可經由第二氣體入口進入氣室,並從至少一出氣孔噴向透明保護罩。 According to the above object of the present invention, a cleaning apparatus is further proposed. The cleaning device is adapted to clean the transparent protective cover of the optical sensing system, and the cleaning device comprises at least one spraying device. At least one of the injection devices includes a vacuum generating portion and an air knife portion. The vacuum generating portion includes a nozzle and a first pipe that communicate with each other, wherein the vacuum generating portion has a first gas inlet and a liquid inlet in communication with the first pipe. When a first high pressure gas enters the pipeline via the first gas inlet, a negative pressure may be generated at the liquid inlet to allow the vacuum generating portion to pass through The liquid inlet draws a liquid and sprays the first high pressure gas and liquid through the nozzle toward the transparent protective cover. The air knife portion is adjacent to the vacuum generating portion and includes at least one air outlet and a gas chamber. The air chamber is in communication with the at least one air outlet and has a second gas inlet such that a second high pressure gas can enter the air chamber via the second gas inlet and be sprayed from the at least one air outlet toward the transparent protective cover.
根據本發明之一實施例,上述之清潔設備更包含氣體產生器、第一輸氣管以及第二輸氣管,其中第一輸氣管連通氣體產生器與第一氣體入口,第二輸氣管連通氣體產生器與第二氣體入口。 According to an embodiment of the present invention, the cleaning apparatus further includes a gas generator, a first gas delivery pipe, and a second gas delivery pipe, wherein the first gas pipe is connected to the gas generator and the first gas inlet, and the second gas pipe is connected to the gas. And a second gas inlet.
根據本發明之另一實施例,上述之清潔設備更包含容器以及導流管,其中導流管連通容器與液體入口。 In accordance with another embodiment of the present invention, the cleaning apparatus described above further includes a container and a draft tube, wherein the draft tube communicates the container with the liquid inlet.
根據本發明之又一實施例,上述之至少一噴射裝置係包含複數個相鄰之噴射裝置,且相鄰之噴射裝置之間皆設有一第一三通閥,以將第一輸氣管內之第一高壓氣體分流至相鄰之噴射裝置之真空產生部之第一氣體入口。相鄰之噴射裝置之間皆設有一第二三通閥,以將第二輸氣管內之第二高壓氣體分流至相鄰之噴射裝置之真空產生部之此些第二氣體入口,相鄰之噴射裝置之間皆設有一導流管連通相鄰之噴射裝置之真空產生部之液體入口與容器。 According to still another embodiment of the present invention, the at least one spraying device comprises a plurality of adjacent spraying devices, and a first three-way valve is disposed between the adjacent spraying devices to connect the first gas pipe The first high pressure gas is split to a first gas inlet of a vacuum generating portion of an adjacent injection device. A second three-way valve is disposed between the adjacent injection devices to divert the second high pressure gas in the second gas delivery pipe to the second gas inlets of the vacuum generating portions of the adjacent injection devices, adjacent to each other A flow conduit is provided between the injection devices to communicate the liquid inlet and the container of the vacuum generating portion of the adjacent injection device.
根據本發明之再一實施例,上述之清潔設備更包含第一快速接頭以及第二快速接頭分別連接第一氣體入口與第二氣體入口。 According to still another embodiment of the present invention, the cleaning apparatus further includes a first quick connector and a second quick connector respectively connecting the first gas inlet and the second gas inlet.
根據本發明之再一實施例,上述至少一出氣孔包含複數個出氣孔,且此些出氣孔呈直線布列。 According to still another embodiment of the present invention, the at least one air outlet includes a plurality of air outlet holes, and the air outlet holes are arranged in a straight line.
根據本發明之再一實施例,上述之清潔設備更包含液 體通道鄰設於真空產生部,且液體通道部具有液體通道與液體入口連通。 According to still another embodiment of the present invention, the above cleaning device further comprises a liquid The body passage is adjacent to the vacuum generating portion, and the liquid passage portion has a liquid passage communicating with the liquid inlet.
根據本發明之再一實施例,上述之至少一噴射裝置係包含相鄰之複數個真空產生部,且此些真空產生部之液體入口互相連通,此些真空產生部之第一氣體入口互相連通。 According to still another embodiment of the present invention, the at least one spraying device comprises a plurality of adjacent vacuum generating portions, and the liquid inlets of the vacuum generating portions are in communication with each other, and the first gas inlets of the vacuum generating portions are connected to each other. .
根據本發明之再一實施例,上述之清潔設備更包含基體、第一通道以及第二通道,其中基體之內部設有此些真空產生部,其中此些真空產生部包含第一真空產生部以及第二真空產生部,第一通道連通第一真空產生部之液體入口與第二真空產生部之液體入口,第二通道連通第一真空產生部之第一氣體入口與第二真空產生部之第一氣體入口。 According to still another embodiment of the present invention, the cleaning apparatus further includes a base body, a first passage, and a second passage, wherein the vacuum generating portion is disposed inside the base body, wherein the vacuum generating portions include a first vacuum generating portion and a second vacuum generating portion, wherein the first passage communicates with the liquid inlet of the first vacuum generating portion and the liquid inlet of the second vacuum generating portion, and the second passage communicates with the first gas inlet and the second vacuum generating portion of the first vacuum generating portion A gas inlet.
根據本發明之再一實施例,上述之氣刀部之氣室包含複數個通氣孔道,且此些通氣孔道互相連通,氣刀部之至少一出氣孔包含複數個出氣孔,其中每一此些出氣孔之一第一端部與每一此些通氣孔道之一第一端部連通,且每一此些出氣孔之第一端部之孔徑小於每一此些通氣孔道之第一端部之孔徑,每一此些出氣孔之相對於第一端部之一第二端部於基體之一第一側面上形成一開口。 According to still another embodiment of the present invention, the air chamber of the air knife portion includes a plurality of air passages, and the air passages communicate with each other, and at least one air outlet of the air knife portion includes a plurality of air outlets, each of which One of the first end portions of the air outlets is in communication with a first end of each of the plurality of air passages, and a first end of each of the air outlet holes has a smaller aperture than each of the plurality of air passages An aperture of one end portion, each of the air outlets forming an opening on a first side of the base body with respect to a second end of the first end portion.
請參照第1圖,其係繪示依照本發明之一實施方式的一種清潔設備之使用狀態示意圖。此清潔設備100適用以清潔光學感測系統之透明保護罩102。此光學感測系統可例如為一光學監測設備。此透明保護罩102常見於捲材的 加工製程中,例如生產鋼鐵、塑膠、玻璃及不織布等捲材的工廠中,且可用來保護光學感測系統之光學儀器104。 Please refer to FIG. 1 , which is a schematic diagram showing the use state of a cleaning device according to an embodiment of the present invention. This cleaning device 100 is adapted to clean the transparent protective cover 102 of the optical sensing system. This optical sensing system can be, for example, an optical monitoring device. This transparent protective cover 102 is commonly found in coiled materials. In the manufacturing process, for example, in the production of coils of steel, plastic, glass, and non-woven fabrics, and optical instruments 104 that can be used to protect optical sensing systems.
請同時參閱第1圖至第3圖所示,其中第2圖和第3圖係分別繪示依照本發明之一實施方式的一種清潔設備之噴射裝置之立體示意圖以及側視示意圖。清潔設備100包含噴射裝置110。其中,噴射裝置110包含真空產生器112以及控制閥114。在一實施例中,控制閥114可例如為電磁閥或氣動閥,但不以此為限。在一實施例中,真空產生器112與控制閥114係同時裝設於支撐架120上。而透過支撐架120,可將整個噴射裝置110固定於適當位置。 Please refer to FIG. 1 to FIG. 3 simultaneously, wherein FIG. 2 and FIG. 3 are respectively a perspective view and a side view showing a spraying device of a cleaning device according to an embodiment of the present invention. The cleaning device 100 includes an injection device 110. The injection device 110 includes a vacuum generator 112 and a control valve 114. In an embodiment, the control valve 114 can be, for example, a solenoid valve or a pneumatic valve, but is not limited thereto. In one embodiment, the vacuum generator 112 and the control valve 114 are simultaneously mounted on the support frame 120. Through the support frame 120, the entire spray device 110 can be fixed in position.
真空產生器112包含互相連通之噴嘴112A與管道112B。真空產生器112還具有和管道112B連通之氣體入口112C與液體入口112D。在一實施例中,如第1圖所示,清潔設備100更包含氣體產生器130以及輸氣管140。其中,輸氣管140連通氣體產生器130與氣體入口112C。氣體產生器130可例如為空壓機,以產生高壓氣體。 The vacuum generator 112 includes nozzles 112A and conduits 112B that communicate with each other. The vacuum generator 112 also has a gas inlet 112C and a liquid inlet 112D in communication with the conduit 112B. In an embodiment, as shown in FIG. 1, the cleaning apparatus 100 further includes a gas generator 130 and a gas delivery pipe 140. The gas pipe 140 is connected to the gas generator 130 and the gas inlet 112C. The gas generator 130 can be, for example, an air compressor to generate a high pressure gas.
控制閥114與真空產生器112接合。在一實施例中,如第1圖所示,清潔設備100更包含容器150以及導流管160,其中導流管160連通容器150與液體入口112D。控制閥114可設於導流管160上,而與真空產生器112接合,以調節進入真空產生器112之液體的流量。 Control valve 114 is engaged with vacuum generator 112. In an embodiment, as shown in FIG. 1, the cleaning apparatus 100 further includes a container 150 and a draft tube 160, wherein the draft tube 160 communicates with the container 150 and the liquid inlet 112D. Control valve 114 may be provided on draft tube 160 to engage vacuum generator 112 to regulate the flow of liquid into vacuum generator 112.
請一併參照第1圖與第3圖,當高壓氣體經由輸氣管140至氣體入口112C而進入管道112B時,可在液體入口112D產生負壓。如此一來,可使真空產生器112經由液體入口112D與導流管160來吸取容器150中的液體(可例如 為純水或清潔液),並將高壓氣體與液體經由噴嘴112A噴向透明保護罩102,來清洗透明保護罩102。此外,搭配間歇性地控制控制閥114的開或關,還可使噴嘴112A間歇性噴出高壓氣體與液體混合之流體或是單純的高壓氣體。如此一來,當以高壓氣體與液體混合之流體清洗透明保護罩102後,可再用單純之高壓氣體將透明保護罩102上殘留的液體去除,而使透明保護罩102的表面乾燥。若未將透明保護罩102上殘留的液體去除的話,則較容易在透明保護罩102的表面產生水垢。 Referring to FIGS. 1 and 3 together, when the high pressure gas enters the pipe 112B via the gas pipe 140 to the gas inlet 112C, a negative pressure can be generated at the liquid inlet 112D. In this way, the vacuum generator 112 can be used to draw the liquid in the container 150 via the liquid inlet 112D and the draft tube 160 (for example The pure protective cover 102 is cleaned by spraying high pressure gas and liquid through the nozzle 112A toward the transparent protective cover 102. Further, in conjunction with intermittently controlling the opening or closing of the control valve 114, the nozzle 112A can intermittently eject a fluid in which a high-pressure gas is mixed with a liquid or a simple high-pressure gas. In this way, after the transparent protective cover 102 is cleaned by the fluid mixed with the high-pressure gas and the liquid, the liquid remaining on the transparent protective cover 102 can be removed by a simple high-pressure gas to dry the surface of the transparent protective cover 102. If the liquid remaining on the transparent protective cover 102 is not removed, it is easier to generate scale on the surface of the transparent protective cover 102.
請參照第4圖至第7圖所示,其中第4圖係繪示依照本發明之另一實施方式的一種清潔設備之架構示意圖,第5圖至第7圖係分別繪示此清潔設備之噴射裝置之上視透視圖、側視透視圖、以及立體示意圖。在此實施方式中,清潔設備200包含至少一噴射裝置210。每一噴射裝置210皆包含真空產生部212以及氣刀部214。在一實施例中,真空產生部212以及氣刀部214可設於基體216。 Please refer to FIG. 4 to FIG. 7 , wherein FIG. 4 is a schematic structural view of a cleaning device according to another embodiment of the present invention, and FIG. 5 to FIG. 7 respectively illustrate the cleaning device. The spray device has a top perspective view, a side perspective view, and a perspective view. In this embodiment, the cleaning apparatus 200 includes at least one injection device 210. Each of the injection devices 210 includes a vacuum generating portion 212 and an air knife portion 214. In an embodiment, the vacuum generating portion 212 and the air knife portion 214 may be disposed on the base 216.
如第5圖與第6圖所示,在噴射裝置210中,真空產生部212包含互相連通之噴嘴212A與第一管道212B。真空產生部212還具有和第一管道212B連通之第一氣體入口212C與液體入口212D。在一實施例中,如第4圖所示,清潔設備200更可包含氣體產生器220以及第一輸氣管230,其中第一輸氣管230連通氣體產生器220與第一氣體入口212C。此外,在一實施例中,清潔設備200更可包含容器240以及導流管250,其中導流管250連通容器240與液體入口212D。在實際應用時,若容器240是位於液體 入口212D的上方,可在導流管250上設有控制閥250A,以避免液體受重力的影響而在不適當的時機,經第一管道212B自噴嘴212A流出。在一實施例中,控制閥250A可例如為電磁閥、氣動閥或壓力瓣,其中壓力瓣的優點是可隨壓力變化而自動打開或關閉。 As shown in FIGS. 5 and 6, in the injection device 210, the vacuum generating portion 212 includes nozzles 212A and a first duct 212B that communicate with each other. The vacuum generating portion 212 also has a first gas inlet 212C and a liquid inlet 212D that communicate with the first conduit 212B. In an embodiment, as shown in FIG. 4, the cleaning apparatus 200 further includes a gas generator 220 and a first gas delivery pipe 230, wherein the first gas delivery pipe 230 communicates with the gas generator 220 and the first gas inlet 212C. Moreover, in an embodiment, the cleaning apparatus 200 can further include a container 240 and a draft tube 250, wherein the draft tube 250 communicates with the container 240 and the liquid inlet 212D. In practical applications, if the container 240 is in a liquid Above the inlet 212D, a control valve 250A can be provided on the draft tube 250 to prevent the liquid from flowing out of the nozzle 212A via the first conduit 212B at an inappropriate timing due to gravity. In an embodiment, the control valve 250A can be, for example, a solenoid valve, a pneumatic valve, or a pressure flap, wherein the pressure flap has the advantage of being automatically opened or closed as pressure changes.
請一併參照第4圖與第5圖,當第一高壓氣體自氣體產生器220產生後,經由第一輸氣管230而流至第一氣體入口212C並進入第一管道212B時,可在液體入口212D產生負壓。因此,真空產生部212可經由液體入口212D與導流管250來吸取儲存於容器240中之液體,並將第一高壓氣體與液體經由噴嘴212A噴向透明保護罩102(請參照第1圖所示)。 Referring to FIG. 4 and FIG. 5 together, when the first high-pressure gas is generated from the gas generator 220 and flows through the first gas pipe 230 to the first gas inlet 212C and enters the first pipe 212B, the liquid can be in the liquid. The inlet 212D generates a negative pressure. Therefore, the vacuum generating unit 212 can suck the liquid stored in the container 240 through the liquid inlet 212D and the draft tube 250, and spray the first high-pressure gas and the liquid to the transparent protective cover 102 via the nozzle 212A (refer to FIG. 1 Show).
請再次參照第5圖和第6圖所示,在噴射裝置210中,氣刀部214鄰設於真空產生部212,且包含至少一出氣孔214A以及氣室214B。其中,氣室214B與出氣孔214A連通,且具有第二氣體入口214C。在一實施例中,如第4圖所示,清潔設備200可進一步包含第二輸氣管260,其中第二輸氣管260連通氣體產生器220與第二氣體入口214C。藉此,第二高壓氣體可透過第二輸氣管260,並經由第二氣體入口214C而進入氣室214B,並從出氣孔214A噴向透明保護罩102(請參照第1圖所示)。 Referring again to FIGS. 5 and 6, in the spray device 210, the air knife portion 214 is adjacent to the vacuum generating portion 212 and includes at least one air outlet 214A and a gas chamber 214B. The air chamber 214B is in communication with the air outlet 214A and has a second gas inlet 214C. In an embodiment, as shown in FIG. 4, the cleaning apparatus 200 may further include a second gas delivery pipe 260, wherein the second gas delivery pipe 260 is in communication with the gas generator 220 and the second gas inlet 214C. Thereby, the second high-pressure gas can pass through the second gas delivery pipe 260, enter the gas cell 214B via the second gas inlet 214C, and be ejected from the gas outlet hole 214A to the transparent protective cover 102 (refer to FIG. 1).
此外,請參照第4圖和第5圖所示,使用者可藉由調節第一高壓氣體與第二高壓氣體是否分別進入真空產生部212以及氣刀部214,而使高壓氣體與液體之混合氣體、和單純之高壓氣體間歇性地噴向透明保護罩102(請參照第1 圖所示)。再者,如第4圖所示,在一實施例中,可在第一輸氣管230以及第二輸氣管260上分別設置電磁閥230A與260A,以便於調節第一高壓氣體與第二高壓氣體的流量。 In addition, referring to FIG. 4 and FIG. 5, the user can mix the high pressure gas and the liquid by adjusting whether the first high pressure gas and the second high pressure gas respectively enter the vacuum generating portion 212 and the air knife portion 214. The gas and the simple high-pressure gas are intermittently sprayed onto the transparent protective cover 102 (please refer to the first Figure shows). Furthermore, as shown in FIG. 4, in an embodiment, solenoid valves 230A and 260A may be respectively disposed on the first gas delivery pipe 230 and the second gas delivery pipe 260 to adjust the first high pressure gas and the second high pressure gas. Traffic.
請同時參照第4圖、第5圖和第7圖所示,在一實施例中,清潔設備200更可包含液體通道部218鄰設於真空產生部212,且液體通道部218具有液體通道218A與液體入口212D連通。藉此,可將液體入口212D連通至基體216設有第一氣體入口212C以及第二氣體入口214C的一側,以便於組裝導流管250、第一輸氣管230以及第二輸氣管260。 Referring to FIG. 4, FIG. 5 and FIG. 7 simultaneously, in an embodiment, the cleaning apparatus 200 may further include a liquid passage portion 218 adjacent to the vacuum generating portion 212, and the liquid passage portion 218 has a liquid passage 218A. It is in communication with the liquid inlet 212D. Thereby, the liquid inlet 212D can be communicated to one side of the base body 216 provided with the first gas inlet 212C and the second gas inlet 214C to facilitate assembly of the draft tube 250, the first gas delivery tube 230 and the second gas delivery tube 260.
請再次參照第4圖和第5圖所示,在一實施例中,清潔設備200更可選擇性地設有第一快速接頭202以及第二快速接頭204。第一快速接頭202以及第二快速接頭204分別連接第一氣體入口212C與第二氣體入口214C,以便於將第一輸氣管230組裝於第一氣體入口212C,以及將第二輸氣管260組裝於第二氣體入口214C。 Referring again to FIGS. 4 and 5, in an embodiment, the cleaning apparatus 200 is further selectively provided with a first quick connector 202 and a second quick connector 204. The first quick connector 202 and the second quick connector 204 are connected to the first gas inlet 212C and the second gas inlet 214C, respectively, to assemble the first gas pipe 230 to the first gas inlet 212C, and to assemble the second gas pipe 260 to Second gas inlet 214C.
請參照第5圖和第7圖所示,至少一出氣孔214A可包含複數個出氣孔。此些出氣孔214A可呈直線布列,以利於清潔呈長方形之透明保護罩102(請參照第1圖所示)。在另一實施例中,出氣孔214A亦可為一長條狀孔洞。 Referring to FIGS. 5 and 7, at least one air outlet 214A may include a plurality of air outlets. The air outlets 214A may be arranged in a straight line to facilitate cleaning of the rectangular transparent protective cover 102 (refer to FIG. 1). In another embodiment, the air outlet 214A can also be an elongated hole.
請參照第4圖和第5圖所示,在一實施例中,清潔設備200可包含複數個相鄰之噴射裝置210。相鄰之噴射裝置210之間可設有第一三通閥206,以將第一輸氣管230內之第一高壓氣體分流至相鄰之噴射裝置210之真空產生 部212的第一氣體入口212C。此外,相鄰之噴射裝置210之間亦可設有第二三通閥208,以將第二輸氣管260內之第二高壓氣體分流至相鄰之噴射裝置210之真空產生部212的第二氣體入口214C。 Referring to Figures 4 and 5, in an embodiment, the cleaning apparatus 200 can include a plurality of adjacent ejection devices 210. A first three-way valve 206 may be disposed between adjacent injection devices 210 to divert the first high pressure gas in the first gas delivery pipe 230 to the vacuum generation of the adjacent injection device 210. The first gas inlet 212C of the portion 212. In addition, a second three-way valve 208 may be disposed between the adjacent injection devices 210 to divert the second high pressure gas in the second gas delivery pipe 260 to the second vacuum generation portion 212 of the adjacent injection device 210. Gas inlet 214C.
相鄰之噴射裝置210之間可設有導流管250與270。導流管250與270分別連通相鄰之噴射裝置210之真空產生部212的液體入口212D與容器240。雖然第4圖中僅繪示兩個噴射裝置210,然而實際上,噴射裝置210的數量可視使用上的需求而調整。在清潔設備200中,相鄰之噴射裝置210可共用電磁閥230A與260A。 Guide tubes 250 and 270 may be provided between adjacent injection devices 210. The draft tubes 250 and 270 respectively communicate with the liquid inlet 212D of the vacuum generating portion 212 of the adjacent spraying device 210 and the container 240. Although only two ejection devices 210 are shown in Fig. 4, in practice, the number of ejection devices 210 can be adjusted depending on the needs of use. In the cleaning apparatus 200, adjacent injection devices 210 may share solenoid valves 230A and 260A.
由於電磁閥的成本高昂,因此在這種設計下,隨著清潔設備200之噴射裝置210數量的增加,可節省更多的成本。 Due to the high cost of the solenoid valve, with this design, as the number of injection devices 210 of the cleaning device 200 increases, more cost can be saved.
請參照第8圖和第9圖所示,第8圖與第9圖係分別繪示依照本發明之又一實施方式的一種清潔設備之噴射裝置之一視角之內部結構立體示意圖以及另一視角之內部結構立體示意圖。在此實施方式中,噴射裝置310包含相鄰之複數個真空產生部。在一實施例中,如第8圖所示,此些真空產生部可包含第一真空產生部312以及第二真空產生部314。其中,第一真空產生部312之液體入口312A和第二真空產生部314之液體入口314A互相連通。且如第9圖所示,第一真空產生部312之第一氣體入口312B和第二真空產生部314之第一氣體入口314B亦互相連通。 Referring to FIG. 8 and FIG. 9 , FIG. 8 and FIG. 9 are respectively a perspective view showing an internal structure of a spray device of a cleaning device according to still another embodiment of the present invention, and another perspective view. A three-dimensional schematic diagram of the internal structure. In this embodiment, the spray device 310 includes a plurality of adjacent vacuum generating portions. In an embodiment, as shown in FIG. 8, the vacuum generating portions may include a first vacuum generating portion 312 and a second vacuum generating portion 314. The liquid inlet 312A of the first vacuum generating portion 312 and the liquid inlet 314A of the second vacuum generating portion 314 are in communication with each other. As shown in Fig. 9, the first gas inlet 312B of the first vacuum generating portion 312 and the first gas inlet 314B of the second vacuum generating portion 314 are also in communication with each other.
請再次參照第8圖和第9圖所示,此實施方式之清潔設備更包含基體320。在一實施例中,基體320可例如為 矩形體而包含有相對之第一側面321與第二側面322、相對之第三側面323與第四側面324、以及相對之第五側面325與第六側面326。其中,第一側面321係與第三側面323、第四側面324、第五側面325以及第六側面326鄰接,第四側面324與第一側面321、第二側面322、第五側面325以及第六側面326鄰接。 Referring again to FIGS. 8 and 9, the cleaning apparatus of this embodiment further includes a base 320. In an embodiment, the substrate 320 can be, for example, The rectangular body includes opposite first side 321 and second side 322, opposite third side 323 and fourth side 324, and opposite fifth side 325 and sixth side 326. The first side surface 321 is adjacent to the third side surface 323, the fourth side surface 324, the fifth side surface 325, and the sixth side surface 326, and the fourth side surface 324 and the first side surface 321, the second side surface 322, the fifth side surface 325, and the The six sides 326 are adjacent.
基體320之內部設有此些真空產生部312與314。基體320內部還設有第一通道327以及第二通道328。其中,第一通道327連通第一真空產生部312之液體入口312A與第二真空產生部314之液體入口314A,第二通道328連通第一真空產生部312之第一氣體入口312B與第二真空產生部314之第一氣體入口314B。 The vacuum generating portions 312 and 314 are provided inside the base body 320. The first body 327 and the second channel 328 are also disposed inside the base body 320. The first channel 327 communicates with the liquid inlet 312A of the first vacuum generating portion 312 and the liquid inlet 314A of the second vacuum generating portion 314, and the second channel 328 communicates with the first gas inlet 312B of the first vacuum generating portion 312 and the second vacuum. The first gas inlet 314B of the generating portion 314.
值得一提的是,在一實施例中,第一通道327可例如包含互相連通之第一孔道327A以及第二孔道327B,且概呈「T」字型。其中,第一孔道327A係貫穿基體320,第一孔道327A的兩端於第三側面323以及第四側面324上各形成一開口327C和327D。且第二孔道327B的一端與第一孔道327A連通,另一端於第二側面322上形成一開口327E。第二通道328可例如包含互相連通之第三孔道328A以及第四孔道328B,且概呈「T」字型。其中,第三孔道328A係貫穿基體320,第三孔道328A的兩端於第三側面323以及第四側面324上各形成一開口327C和327D。且第四孔道328B的一端與第三孔道328A連通,另一端於第二側面322上形成一開口328E。 It is worth mentioning that, in an embodiment, the first channel 327 can include, for example, a first channel 327A and a second channel 327B that are in communication with each other, and is generally "T" shaped. The first hole 327A penetrates through the base 320. The two ends of the first hole 327A form an opening 327C and 327D on the third side 323 and the fourth side 324, respectively. And one end of the second hole 327B communicates with the first hole 327A, and the other end forms an opening 327E on the second side surface 322. The second channel 328 can include, for example, a third channel 328A and a fourth channel 328B that are in communication with each other and are generally "T" shaped. The third tunnel 328A extends through the base 320. The two ends of the third tunnel 328A form openings 327C and 327D on the third side 323 and the fourth side 324, respectively. And one end of the fourth tunnel 328B communicates with the third tunnel 328A, and the other end forms an opening 328E on the second side 322.
藉此設計,液體除了可由液體入口312A或314A進入 第一真空產生部312以及第二真產生部314,亦可由開口327C、327D或327E進入。同理,第一高壓氣體除了可由第一氣體入口312B或314B進入第一真空產生部312以及第二真產生部314,亦可由開口328C、328D或328E進入。如此一來,當使用者在安裝噴射裝置310時,除了液體入口312A和314A以及第一氣體入口312B和314B外,還可視環境的需要,選擇適合的開口連接導流管或輸氣管,並將未使用之開口以塞子(圖未示)封閉,從而便於安裝。而且,藉此設計,第一真空產生部312和第二真空產生部314還可共用一導流管和一輸器管,以簡化導流管和輸氣管之配置。 By this design, the liquid can be accessed by the liquid inlet 312A or 314A. The first vacuum generating portion 312 and the second true generating portion 314 may also enter through the openings 327C, 327D or 327E. Similarly, the first high pressure gas may enter the first vacuum generating portion 312 and the second true generating portion 314 by the first gas inlet 312B or 314B, and may also enter through the opening 328C, 328D or 328E. In this way, when the user installs the spraying device 310, in addition to the liquid inlets 312A and 314A and the first gas inlets 312B and 314B, the appropriate opening can be selected to connect the draft tube or the gas pipe according to the needs of the environment, and Unused openings are closed with a plug (not shown) for easy installation. Moreover, by this design, the first vacuum generating portion 312 and the second vacuum generating portion 314 can also share a draft tube and an oil tube to simplify the configuration of the draft tube and the gas tube.
除此之外,在一實施例,第一孔道327A、第二孔道327B、第三孔道328A以及第四孔道328B皆可藉由鑽床加工來製造,因此加工亦相當簡化。 In addition, in one embodiment, the first tunnel 327A, the second tunnel 327B, the third tunnel 328A, and the fourth tunnel 328B can be manufactured by drilling machine processing, and the processing is also relatively simplified.
再者,請參照第8圖和第9圖所示,在此實施方式中,氣刀部316之氣室316A包含複數個通氣孔道316B,且此些通氣孔道316B互相連通。而且,氣刀部316之至少一出氣孔316C包含複數個出氣孔。其中,每一出氣孔316C一第一端部316C’與每一通氣孔道316B之第一端部316B’連通。且每一出氣孔316C之第一端部316C’之孔徑小於每一通氣孔道316B之第一端部316B’之孔徑。每一出氣孔316C之相對於第一端部316C’一第二端部316C”於基體320之一第一側面321上形成一開口316D。此外,在一實施例中,通氣孔道316B、出氣孔316C以及開口316D皆可藉由鑽床加工來製造,如此一來,氣刀部316之加工亦可相當簡 化。 Furthermore, please refer to FIG. 8 and FIG. 9. In this embodiment, the air chamber 316A of the air knife portion 316 includes a plurality of air passages 316B, and the air passages 316B communicate with each other. Further, at least one of the air outlets 316C of the air knife portion 316 includes a plurality of air outlet holes. Each of the air outlets 316C has a first end 316C' that communicates with the first end 316B' of each of the vents 316B. And the aperture of the first end 316C' of each air vent 316C is smaller than the aperture of the first end 316B' of each vent 316B. Each of the air outlets 316C defines an opening 316D on a first side 321 of the base 320 with respect to the first end 316C' and a second end 316C". Further, in an embodiment, the vent 316B, Both the air holes 316C and the opening 316D can be manufactured by drilling machine processing, so that the processing of the air knife portion 316 can be relatively simple. Chemical.
應注意的是,第8圖和第9圖乃此實施方式之噴射裝置310的內部結構立體示意圖,目的是便於表現噴射裝置310的內部結構。然而實際上,基體320可為一實心矩形體再藉由鑽床加工而製造出基體320內部之第一通道327、第二通道328以及氣刀部316等結構。 It should be noted that Figs. 8 and 9 are perspective views of the internal structure of the spraying device 310 of this embodiment for the purpose of facilitating the expression of the internal structure of the spraying device 310. However, in practice, the base body 320 can be a solid rectangular body and then processed by a drill press to fabricate the first passage 327, the second passage 328, and the air knife portion 316 inside the base 320.
由上述之實施方式可知,本發明之清潔設備之一優點即在於藉由可間歇性噴出高壓氣體與液體之混合流體和單純之高壓氣體的噴射裝置來取代以人工清潔光學感測系統之透明保護罩,而可增加效率。 It can be seen from the above embodiments that one of the advantages of the cleaning device of the present invention is that the transparent protection of the optical sensing system is manually replaced by a spraying device capable of intermittently discharging a mixed gas of a high pressure gas and a liquid and a simple high pressure gas. Cover, which increases efficiency.
由上述之實施方式可知,本發明之清潔設備之一優點即在於噴射裝置係藉由電磁閥來調控,而電磁閥可利用控制電路來控制,故可定時啟動清潔設備進行清潔的動作,而較可避免人為的疏失。 It can be seen from the above embodiments that one of the advantages of the cleaning device of the present invention is that the injection device is regulated by a solenoid valve, and the solenoid valve can be controlled by the control circuit, so that the cleaning device can be started periodically for cleaning. Avoid human error.
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.
100‧‧‧清潔設備 100‧‧‧Cleaning equipment
102‧‧‧透明保護罩 102‧‧‧Transparent protective cover
104‧‧‧光學儀器 104‧‧‧Optical instruments
110‧‧‧噴射裝置 110‧‧‧Injection device
112‧‧‧真空產生器 112‧‧‧Vacuum generator
112A‧‧‧噴嘴 112A‧‧‧Nozzles
112B‧‧‧管道 112B‧‧‧ Pipes
112C‧‧‧氣體入口 112C‧‧‧ gas inlet
112D‧‧‧液體入口 112D‧‧‧Liquid inlet
114‧‧‧控制閥 114‧‧‧Control valve
120‧‧‧支撐架 120‧‧‧Support frame
130‧‧‧氣體產生器 130‧‧‧ gas generator
140‧‧‧輸氣管 140‧‧‧ gas pipeline
150‧‧‧容器 150‧‧‧ container
160‧‧‧導流管 160‧‧‧drain tube
200‧‧‧清潔設備 200‧‧‧ cleaning equipment
202‧‧‧第一快速接頭 202‧‧‧First quick connector
204‧‧‧第二快速接頭 204‧‧‧Second quick connector
206‧‧‧第一三通閥 206‧‧‧ first three-way valve
208‧‧‧第二三通閥 208‧‧‧ second three-way valve
210‧‧‧噴射裝置 210‧‧‧Spray device
212‧‧‧真空產生部 212‧‧‧ Vacuum Generation Department
212A‧‧‧噴嘴 212A‧‧‧ nozzle
212B‧‧‧第一管道 212B‧‧‧First Pipe
212C‧‧‧第一氣體入口 212C‧‧‧First gas inlet
212D‧‧‧液體入口 212D‧‧‧Liquid inlet
214‧‧‧氣刀部 214‧‧‧ Air Knife Department
214A‧‧‧至少一出氣孔 214A‧‧‧ at least one vent
214B‧‧‧氣室 214B‧‧‧ air chamber
214C‧‧‧第二氣體入口 214C‧‧‧Second gas inlet
216‧‧‧基體 216‧‧‧ base
218‧‧‧液體通道部 218‧‧‧Liquid channel
218A‧‧‧液體通道 218A‧‧‧Liquid channel
220‧‧‧氣體產生器 220‧‧‧ gas generator
230‧‧‧第一輸氣管 230‧‧‧First gas pipeline
230A‧‧‧電磁閥 230A‧‧‧ solenoid valve
240‧‧‧容器 240‧‧‧ container
250‧‧‧導流管 250‧‧‧drain tube
250A‧‧‧控制閥 250A‧‧‧Control valve
260‧‧‧第二輸氣管 260‧‧‧Second gas pipeline
260A‧‧‧電磁閥 260A‧‧‧ solenoid valve
270‧‧‧導流管 270‧‧‧drain tube
310‧‧‧噴射裝置 310‧‧‧Spray device
312‧‧‧第一真空產生部 312‧‧‧First Vacuum Generation Department
312A‧‧‧液體入口 312A‧‧‧Liquid inlet
312B‧‧‧第一氣體入口 312B‧‧‧First gas inlet
314‧‧‧第二真空產生部 314‧‧‧Second Vacuum Generation Department
314A‧‧‧液體入口 314A‧‧‧Liquid inlet
314B‧‧‧第一氣體入口 314B‧‧‧First gas inlet
316‧‧‧氣刀部 316‧‧‧ Air Knife Department
316A‧‧‧氣室 316A‧‧ gas chamber
316B‧‧‧通氣孔道 316B‧‧‧ Ventilation tunnel
316B’‧‧‧第一端部 316B’‧‧‧ first end
316C‧‧‧出氣孔 316C‧‧‧ Vents
316C’‧‧‧第一端部 316C’‧‧‧ first end
316C”‧‧‧第二端部 316C”‧‧‧second end
316D‧‧‧開口 316D‧‧‧ openings
320‧‧‧基體 320‧‧‧ base
321‧‧‧第一側面 321‧‧‧ first side
322‧‧‧第二側面 322‧‧‧ second side
323‧‧‧第三側面 323‧‧‧ third side
324‧‧‧第四側面 324‧‧‧ fourth side
325‧‧‧第五側面 325‧‧‧ fifth side
326‧‧‧第六側面 326‧‧‧ sixth side
327‧‧‧第一通道 327‧‧‧First Passage
327A‧‧‧第一孔道 327A‧‧‧ first tunnel
327B‧‧‧第二孔道 327B‧‧‧Second hole
327C‧‧‧開口 327C‧‧‧ openings
327D‧‧‧開口 327D‧‧‧ openings
327E‧‧‧開口 327E‧‧‧ openings
328‧‧‧第二通道 328‧‧‧second channel
328A‧‧‧第三孔道 328A‧‧‧ third tunnel
328B‧‧‧第四孔道 328B‧‧‧4th tunnel
328C‧‧‧開口 328C‧‧‧ openings
328D‧‧‧開口 328D‧‧‧ openings
328E‧‧‧開口 328E‧‧‧ openings
為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:第1圖係繪示依照本發明之一實施方式的一種清潔設備之使用狀態示意圖。 The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; schematic diagram.
第2圖係繪示依照本發明之一實施方式的一種清潔設 備之噴射裝置之立體示意圖。 2 is a view showing a cleaning device according to an embodiment of the present invention. A schematic view of a spray device.
第3圖係繪示依照本發明之一實施方式的一種清潔設備之噴射裝置之側視示意圖。 3 is a side elevational view of a spray device of a cleaning apparatus in accordance with an embodiment of the present invention.
第4圖係繪示依照本發明之另一實施方式的一種清潔設備之架構示意圖。 4 is a schematic view showing the structure of a cleaning device according to another embodiment of the present invention.
第5圖係繪示依照本發明之另一實施方式的一種清潔設備之噴射裝置之上視透視圖。 Figure 5 is a top perspective view of a spray device of a cleaning apparatus in accordance with another embodiment of the present invention.
第6圖係繪示依照本發明之另一實施方式的一種清潔設備之噴射裝置之側視透視圖。 Figure 6 is a side perspective view showing a spray device of a cleaning apparatus in accordance with another embodiment of the present invention.
第7圖係繪示依照本發明之另一實施方式的一種清潔設備之噴射裝置之立體示意圖。 Figure 7 is a perspective view showing a spraying device of a cleaning device in accordance with another embodiment of the present invention.
第8圖係繪示依照本發明之又一實施方式的一種清潔設備之噴射裝置之一視角之內部結構立體示意圖。 Figure 8 is a perspective view showing the internal structure of a spray device of a cleaning device according to still another embodiment of the present invention.
第9圖係繪示依照本發明之又一實施方式的一種清潔設備之噴射裝置之另一視角之內部結構立體示意圖。 Figure 9 is a perspective view showing the internal structure of another view of the spraying device of the cleaning device according to still another embodiment of the present invention.
100‧‧‧清潔設備 100‧‧‧Cleaning equipment
102‧‧‧透明保護罩 102‧‧‧Transparent protective cover
104‧‧‧光學儀器 104‧‧‧Optical instruments
110‧‧‧噴射裝置 110‧‧‧Injection device
112‧‧‧真空產生器 112‧‧‧Vacuum generator
112C‧‧‧氣體入口 112C‧‧‧ gas inlet
112D‧‧‧液體入口 112D‧‧‧Liquid inlet
114‧‧‧控制閥 114‧‧‧Control valve
120‧‧‧支撐架 120‧‧‧Support frame
130‧‧‧氣體產生器 130‧‧‧ gas generator
140‧‧‧輸氣管 140‧‧‧ gas pipeline
150‧‧‧容器 150‧‧‧ container
160‧‧‧導流管 160‧‧‧drain tube
Claims (13)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101143294A TW201420221A (en) | 2012-11-20 | 2012-11-20 | Cleaning equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101143294A TW201420221A (en) | 2012-11-20 | 2012-11-20 | Cleaning equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201420221A true TW201420221A (en) | 2014-06-01 |
Family
ID=51393116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101143294A TW201420221A (en) | 2012-11-20 | 2012-11-20 | Cleaning equipment |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW201420221A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI615208B (en) * | 2015-07-06 | 2018-02-21 | Shibaura Mechatronics Corp | Water jet, substrate processing device and substrate processing method |
-
2012
- 2012-11-20 TW TW101143294A patent/TW201420221A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI615208B (en) * | 2015-07-06 | 2018-02-21 | Shibaura Mechatronics Corp | Water jet, substrate processing device and substrate processing method |
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