TW201414550A - Method and apparatus for continuous separation of cleaning solvent from rinse fluid in a dual-solvent vapor degreasing system - Google Patents

Abstract

A method for cleaning a precision component which includes the steps of immersing the component in a heated solvating agent disposed in a pre-clean module tank to thereby remove an adherent contaminant; treating the component with a rinsing solvent to remove any remaining contaminants and residual solvating agent in a separate rinse degreaser whereby contaminants removed from the component collect in the rinse degreaser; and removing contaminated solvent from the rinse degreaser to a micro-still to separate the contaminants from the rinse solvent and direct the purified rinse solvent to the rinse degreaser. An apparatus is also provided for cleaning contaminants from a precision component including a pre-clean module tank containing a heated solvating agent, a degreaser containing a rinsing solvent, and a micro-still which separates the contaminants from the rinsing solvent and directs the purified rinsing solvent to the rinse degreaser.

Description

Method and apparatus for continuously separating cleaning solvent from flushing fluid in dual solvent vapor phase degreasing system

This invention relates to a method and apparatus for the continuous separation of contaminants from a flushing fluid in a system for cleaning electronic and other components.

Flux and other contaminants often remain on the manufacture of electronics and other components. Contaminants are removed from the assembly using solvents. Solvents and residual contaminants are removed using a rinse solvent.

A dual solvent cleaning system is used in the manufacture of a variety of products, particularly electronic components such as circuit boards, medical devices, aerospace components, and military components. Typically, a first solvent (also known as a "solvent") is used to remove adhering dirt such as fluxes, oils, lubricants, and the like, and then a second solvent (also known as a "flushing agent") ) to rinse the product. In doing so, a certain amount of cleaning solvent and manufacturing debris are accumulated in the rinsing solvent. It is necessary to periodically remove such contaminants from the flushing solvent without causing costly downtime of the production line.

The present invention is based on a two-solvent process that is continuously performed during system operation to automatically separate multiple solvents and contaminants while recovering expensive flushing solvents for reuse in the degreaser. The process will produce a high percentage of recovered solvent, the quality of which will not affect the Cleansing results in any damage to solvents, equipment, and products being cleaned, and automatically separates the waste stream for periodic removal from the system. The dual solvent process includes an initial cleaning step using a solvent mixture in a type of specific chemical application in a spray-under-immersion, ultrasonic or other agitation process, and subsequent use in secondary cleaning and A second different solvent process that rinses to remove residual contaminants or solvent mixtures.

This cleaning module process will provide an initial stage of soil removal, resulting in less load on the second rinse solvent, thereby extending solvent bath life while increasing cleanliness.

The present invention utilizes a combination of process steps to effectively remove adhering contaminants from the substrate. The term "substrate" is used broadly herein to refer to any device or article of manufacture that may be contaminated with undesirable materials. Thus, the term "substrate" encompasses, for example, machine parts, tools, or electronic components such as printed circuit boards, medical devices, aerospace components, and military components. Similarly, the term "adhesive soil" is also used broadly to indicate, for example, undesirable materials that are not easily removed from the substrate by conventional mechanical means. Therefore, the term "adhesive soil" encompasses inorganic and organic substances such as greases, waxes, oils, adhesives, rosins and resin-based fluxes. The Applicant intends to specifically combine the present invention with cleaning rosin and/or resin flux from printed circuit boards and in combination with cleaning waxes, greases and/or oils from machine parts.

The solvent mixture for use in the present invention is a cleaning agent well known in the art. Examples of such cleaners are those taught by the following patents: U.S. Patent No. 5,128,057 to Bixenman et al., U.S. Patent No. 7,288,511, issued to Doyel et al., and U.S. Patent No. 5,679,175, the entire disclosure of U.S. Patent No. 5,679,175. </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> </ RTI> <RTIgt; Detergents can also have other desirable characteristics and characteristics. For example, the solvent mixture will preferably not adversely affect the strength, integrity or operability of the materials of construction or components of the substrate. Regarding the substrate constituting the printed circuit board, the solvent mixture is preferably inert to the fiber glass impregnated with the epoxy resin and is not a solvent thereof. The solvent mixture preferably also has a low surface tension to improve processing characteristics and is low in toxicity, and has a high flash point to improve safety characteristics. Solvent mixtures are excellent for the atmosphere, soil and water. Chemical and photochemical stability are also other preferred features of the solvent mixture. One of the additional desirable characteristics of the solvent mixture is the boiling point that is matched by the skilled artisan to the boiling point of the rinsing agent, which will facilitate the recovery of the rinsing rinse.

Preferably, the rinsing agent also has little or no tendency to cause ozone layer depletion. More specifically, the rinsing agent desirably has an ozone depletion factor (ODP) of no greater than about 0.15, more preferably no greater than about 0.05, and even more preferably about zero. Ozone depleting factors are well-known measures of the negative effects of volatile substances on the Earth's ozone layer.

Those skilled in the art will recognize that the rinsing agents currently in use are relatively mild to atmospheric ozone due, at least in part, to the absence or reduction of the presence of chlorine in the molecules that make up the rinsing agent. However, it is also apparent that the reduced chlorine content will result in a reduced ability of the rinsing agent to solvate many adhering soils, including rosin fluxes. However, the relatively low solvating power of the preferred rinsing agent does not detract from the cleaning utility of the method of the present invention. Thus, it will be apparent that the rinsing agent will wash the solvent mixture from the substrate to be cleaned and that the rinsing agent need not have any ability to solvate the adhering soil, although this ability may be present in a particular embodiment of the invention.

The rinsing agents used in the present invention may also have other desirable and advantageous properties. For example, the rinsing agent preferably does not adversely affect the strength, integrity, or operability of the materials of construction of the substrate of its components. Regarding the substrate constituting the printed circuit board, the rinsing agent is preferably inert to the fiber glass impregnated with the epoxy resin and is not a solvent thereof. The rinsing agent is preferably also low toxicity and has a high flash point to improve safety characteristics. Flushing agent to the atmosphere, soil and water temperature And also excellent. Chemical and photochemical stability are also other preferred features of the rinsing agent. The features indicated above for the rinsing agent are also preferred for the overall rinsing composition. Other desirable characteristics of the rinsing agent will be apparent to those skilled in the art, such as boiling point and properties at the boiling point that facilitate separation of the rinsing agent from the cleaning agent.

Accordingly, in one aspect, the present invention is a device for cleaning contaminants from a precision component, comprising: a. a pre-cleaning module tank containing a heated solvent mixture for removing contaminants from a precision component, b. As a gas phase degreaser with a rinse tank for removing the residual solvent mixture and adhering the dirt from the precision component, and c. separating the residual solvent mixture and adhering the dirt from the rinse agent, guiding the rinse agent back to Flush the tank and direct the residual solvent mixture and contaminants to the waste micro-distillator.

In the apparatus of the present invention, the rinsing tank is operatively coupled to the micro distiller to deliver rinsing agent from the pre-cleaning module tank contaminated with residual solvent mixture and adhering dirt and to transfer the rinsing agent back to the rinsing tank.

In another aspect of the invention, there is provided a method of continuously separating contaminants from a rinse solvent in a system for cleaning electronic and other components, characterized in that it comprises: a. utilizing a rinse solvent in a separate rinse tank Treating the contaminated substrate that has been treated with the solvent mixture to remove any residual contaminants and residual solvent mixture, thereby collecting contaminants removed from the assembly in the rinse tank; and b. contaminating the rinse solvent from the rinse tank Move to the micro-distiller to separate contaminants from the rinse solvent, direct the rinse back to the rinse tank, and direct the residual solvent mixture and contaminants to waste disposal.

In still another aspect of the present invention, a method of cleaning a precision component is provided The method is characterized in that it comprises: a. immersing the component in a heated solvent mixture placed in a pre-cleaning module tank, thereby removing adhering contaminants; b. treating the component with a rinse solvent in a separate rinse degreaser Removing any residual contaminants and residual solvent mixture to collect contaminants removed from the assembly in the rinsing degreaser; and c. moving the contaminated rinsing solvent from the rinsing degreaser to the micro distiller to self rinsing the solvent Separate the contaminants and direct the rinse solvent to the rinse degreaser.

In a preferred embodiment of the invention, the step of treating the assembly with the rinsing agent comprises: d. subjecting the assembly to a pre-impregnation by exposing the assembly to a hot vapor of a rinsing agent disposed on the rinsing degreaser; e. soaking the assembly in a boiling rinse placed in a boiling tank to remove any residual adhering dirt and residual solvent mixture; and f. removing the assembly from the boiling tank and immersing the assembly in a rinse In the purified solvent in the chamber.

10‧‧‧Double Solvent Cleaning System

12‧‧‧Pre-cleaning module slot

14‧‧‧ Flushing degreaser

16‧‧‧Microstiller

18‧‧‧Infusion room

20‧‧‧ solvent mixture

22‧‧‧Electric immersion heater

24‧‧‧ thermostat controller

26‧‧‧Spray cleaning; soaking spray collector

28‧‧‧Seal pump

30‧‧‧Filter system

32‧‧‧ Machine

34‧‧‧Compressed air sweeping collector

36‧‧‧Solenoid valve

38‧‧‧ Flushing degreaser boiling pool

40‧‧‧Transport pump

42‧‧‧ suction hose

44‧‧‧Original solution container

46‧‧‧Compressed air supply valve, degreaser tank

48‧‧‧Hot solvent vapour

50‧‧‧washing pool

52‧‧‧Main condenser coil

54‧‧‧Floating area

56‧‧‧Transport pump

58‧‧‧Distiller level controller

60‧‧‧heater

62‧‧‧External heat exchanger/condenser

64‧‧‧Bottom dumping solenoid valve

66‧‧‧Flexible fittings

68‧‧‧Waste container

BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic illustration of the cleaning system of the present invention showing cleaning and rinsing and degreasing modes; and Figure 2 is a flow chart showing the steps of cleaning, rinsing, and solvent recovery.

Figure 1 shows a dual solvent cleaning system 10 in accordance with the present invention. The dual solvent cleaning system 10 generally includes a pre-cleaning module tank 12 and a flush degreaser 14. The micro distiller 16 is preferably It is contained in the chamber of the pre-cleaning module 12 for continuous low volume distillation of solvent. It will be apparent to those skilled in the art that the device described herein can be constructed of any suitable material known in the art, such as stainless steel or Hastelloy 7 (Hastelloy 7; registered trademark of Haynes International, Inc.; the trademark is used as a "superalloy" One series of 22 different highly corrosion-resistant metal alloys are pre-named).

Stage 1 pre-cleaning process cycle:

The workpiece to be cleaned is lowered through a material handling system (not shown) into the infusion chamber 18 in the pre-cleaning module tank 12 where it is exposed to the heated solvent mixture 20 to achieve "when in the tank" Impregnation. Material handling systems are of a type well known in the art and can be reduced to the carrier (such as a grid or basket) in a tank either manually or by automated system control, as is well known in the art. The solvent mixture 20 is heated by an electric immersion heater 22 mounted in a tank biased from the thermostat controller 24. By biasing the heater 22, it is shielded by the recesses to prevent accidental contact between the incoming parts/basket and possibly damage to the heater. The composition of solvent mixture 20 is specific to the type of substrate and soil and is well known in the art. The composition of the solvent mixture can include, but is not limited to, one or more different phases, or include changes in reactivity, solubility parameters, flash point, acidity or alkalinity, boiling point, and various other chemical and physical knowledge that should be known to those skilled in the art. Nature of additives.

The heated solvent mixture 20 in the infusion chamber 18 removes adhering dirt from the surface of the soiled component. Depending on the nature of the adherent soil, the solution produces a solvent action or a chemical reaction of the cleaning agent with the adhering dirt to be removed. In some applications, the fluid used reacts chemically with the adherent soil to form an emulsion, or softens it to readily release it from the substrate in the future using a flushing solvent.

When the workpiece is immersed in the solvent mixture 20, the jet cleaning action 26 in the liquid chamber 18 is used as a mechanical aid to remove particulate matter and adhere to dirt from the surface of the substrate. It should be noted that the relationship between jet cleaning activities and the effectiveness of the parts being cleaned may be affected by the part exposure/grid/basket design. A soak spray header 26 is most often installed at the bottom of the tank to provide upward flow in the direction of the heated solution to create a spoiler cleaning active area in the center of the tank. The heated solution is recirculated through the filtration system 30 by a seal pump 28 to remove detached contaminants from the bath and protect the spray nozzle as the fluid is recirculated.

The soaking cycle is determined by the user based on the desired cleaning result. Once the impregnation immersion in the solvent mixture 20 with the jet cleaning effect 26 is completed, the workpiece is lifted to the freeboard region of the machine 32 where it will be allowed to settle for gravity drainage above the tank. This action allows the solution to be drained back into the process tank from the part and the workpiece basket to reduce carry-out/saving of solution.

If desired, an optional compressed air sweeping header 34 (controlled by a solenoid valve 36 via a material handling system for positioning and duration) can be installed in the tank to assist in removing fluid from the part/basket, thus Reduce solution carry-over and fugitive emissions. Once this action is completed, the workpiece can be removed from system 12 and transferred to the next step in the process.

After the workpiece has been cleaned and removed from the pre-cleaning module 12, a small amount of solution is carried over the workpiece (parts/basket). When such items are delivered to the rinsing degreaser 14 for the process cycle, residual carry-over will be deposited into the rinsing degreaser boiling tank 38.

Therefore, the solution level in the cleaning module 12 will begin to decrease in volume over time. To maintain a normal solution operating level, the transfer pump 40 is coupled to the original solution container 44 via a suction hose 42.

The standard transfer pump 40 is a pneumatic pump, and when the manually operated compressed air supply valve 46 is opened, the pump will draw a new solution from the container 44 and transfer it to the pre-cleaning module soaking tank 18. The transfer pump 40 is manually controlled by an operator based on the liquid level in the module tank 12 that the operator periodically observes. The chemical composition can also be automated as an option. Stage 2 Flush Degreaser Process Cycle: After the workpiece has been removed from the pre-cleaning module 12, it is transferred to the rinse degreaser 14 for a second cleaning/rinsing process. Once it has been lowered into the degreaser tank 46 above the degreaser 14, it is exposed to the hot solvent vapor 48 for "pre-impregnation" while being transferred downward into the boiling tank 38. The workpiece is transferred downward and immersed in the boiling chamber 38 of the degreaser. The boiling solvent in this chamber removes any residual contaminants and residual solvent mixture from the surface of the part. The turbulence generated by the boiling solvent in chamber 38 creates a mechanical action to wash the part to enhance the cleaning process.

Additionally, the degreaser can have ultrasonic or other agitation capabilities in the boiling pool 38. Those skilled in the art can incorporate other additives into the rinsing agent to modify desirable properties such as, but not limited to, miscibility, boiling point, solvation characteristics, and azeotrope or azeotrope-like behavior.

Depending on the substrate, the nature of the adhering dirt, the type of solvent system used, and the type of mechanical action used in the process chamber (ultrasonic/jet cleaning/spoiler, etc.), the workpiece is processed for a predetermined length of time and the workpiece is processed. Lifted from the boiling tank 38, transferred to a vapor line (which is below the vertical midpoint of the main condenser coil 52 between the vapor zone 48 and the freeboard zone 54), and in the washing tank 50 of the machine for purification and rinsing The second total immersion is immersed in the solvent to improve the cleanliness of the workpiece.

When the flush cycle is complete, the workpiece is lifted from the liquid and allowed to stay in the vapor zone 48 for draining. Excessive flushing solvent will drain from the parts/basket by gravity and fall back into the rinse tank to save solvent. Here, the workpiece is reheated by exposure to pure cleaning solvent vapor 48 to achieve a final condensate rinse and drying effect.

When the condensate rinse is complete, the workpiece is lifted into the machine's freeboard area 54 where it will remain for one-third of the condensate rinse/dry time Or extend the time to reduce any residual rinse solvent, thus saving the rinse solvent.

Once this step is completed, the workpiece can be removed from the degreaser 14 and re-replicated with a new workpiece to be machined as needed.

Stage 3 micro-distillator process cycle:

When the workpiece is rinsed in the degreaser 14, the mass of contaminants removed from the product by the solvent mixture begins to increase in the boiling pool 38 over time. To maintain the solvent purity value within an acceptable range so as not to affect cleaning and/or rinsing capabilities and vapor generation capacity, it is desirable to periodically remove contaminants from the boiling tank 38.

This is done by using a solvent distillation system. The "microstiller" 16 is connected to a degreaser boiling tank 38 to continuously distill the contaminated rinse solvent in a low volume.

The micro distiller 16 periodically receives the contaminated rinsing solvent from the transfer pump 56 controlled by the distiller level controller 58. The distiller vessel is heated by a heater 60 to evaporate the internal solvent portion of the mixture. Adhesive contaminants/contaminants will generally not evaporate within the lower temperature design range applied based on the type of solvent used to rinse the solvent, and will therefore remain in the container as the hot rinse solvent vapor rises and migrate to the outside through the vapor The heat exchanger/condenser 62 leaves.

This air-cooled external condenser 62 lowers the temperature of the hot solvent vapor to become a liquid, where it is drained by gravity and flows through the tube to the associated degreaser 14. The flow of the distilled/recovered rinsing agent is directed to a degreaser boiling tank 38 for blending with existing solvents where it evaporates during normal dehumidifier action.

In a standard design, the microdistillers and components described herein are housed in the compartment of the pre-cleaning module 10 as shown in FIG.

Automatic dumping features:

Based on the selected process parameters of the retort vessel 16, the distillation will be initiated periodically The kettle is boiled without passing other contaminated rinsing agents into the micro distiller container 16. The transfer pump 56 is automatically locked. The existing fluid in the micro distiller vessel 16 will continue to be heated by the heater 60 until most of the high yield recyclable rinse solvent is removed. Process parameters take into account the following factors: the use of solvents, the type and volume of contaminants removed from the recirculating rinse solvent stream, the elapsed time of system operation, based on the type of substrate being processed / contaminants / adhering dirt Changes in the type of contaminant/adhesive contaminant loading, the end user's preference for micro-distiller cooking based on the desired solvent purity value, and substrate cleanliness.

Once the monitoring device reaches the preset condition, the heater 60 will be powered off and the bottom dump solenoid valve 64 will be powered "on". The bottom valve 64 is connected to the waste container 68 via a flexible tube 66 which receives the "bottom residual liquid" of the distiller for regular disposal by the consumer.

Once the automatic dump cycle has completed a predetermined period of time, the bottom valve 64 will automatically close. The program will then resume normal operation by refilling the micro distiller container 16 through the transfer pump 56. Once the container level is at the normal operating level as determined by the level sensor 58, the pump 56 will be de-energized and then the heater 60 will be powered to return the micro-stiller 16 to normal operation.

Once the micro-distiller 16 has reached heating and steam generation, the transfer pump 56 will circulate as needed to refill the distiller with the contaminated rinsing solvent from the degreaser boiling tank 38.

This design automatically controls the operation of the microstiller, cooking, and dumping cycles while isolating the operator from the process. This feature is displayed on the HMI screen for process monitoring.

Micro distiller B solvent cycle:

Simultaneously, when the micro distiller processes the contaminated rinsing solvent from the degreaser boiling tank, the rinsing solvent circulates from the degreaser to the micro distiller back to the degreaser, with less The amount is periodically discarded with the residual liquid at the bottom of the distiller. A specific amount of rinsing solvent is maintained in suspension together with the solvent mixture and the adherent soil/contaminants periodically removed from the distiller via the "automatic dumping" cycle described above.

The micro distiller container liquid volume will be automatically controlled when supplied from the degreaser. Therefore, the degreaser boiling tank will periodically replenish the solvent depending on the operating hours, the type/size/configuration of the parts/basket being processed, and the retort dump cycle.

Overview of the solvent process:

Referring to Figure 2, it will be seen that at stage 1, the workpiece is immersed in a solvent mixture, the original solvent is introduced, and the solvent used and filtered. The workpiece is then moved to stage 2 where it undergoes rinsing and additional cleaning in the vapor and liquid rinsing agent.

The solvent mixture and adherent dirt and rinsing agent that is carried out are sent to a micro distiller unit which thermally separates the low boiling rinsing agent from the high boiling solvent mixture and other contaminants. Concentrate the incoming contaminated rinsing agent to reduce the quality of the waste stream.

The evaporated rinsing agent is condensed and returned to the gas phase dehumidifier boiling tank. The condensate bottoms, which are primarily a solvent mixture and a decontaminated concentrate, are transferred to a waste container as an ecologically acceptable treatment.

It is to be understood that the present invention is not intended to be limited by the particular embodiments and examples disclosed herein. In the examples, all percentages are by weight.

Example 1:

To demonstrate the efficiency of separating the cleaning agent from the rinsing agent, the rinsing degreaser was filled with 2,3-dihydrodecafluoropentane and allowed to boil at 54 ° C (about 129 ° F). The micro-distillator is activated and the program controls the temperature of the addition of the contaminated rinse solvent to the micro-distillator and the micro-distillator. 250 ml parts per hour mainly consisting of tetrahydrofuran methanol, together with activators, surfactants, A solvent mixture of a corrosion inhibitor (the formulation of which is identical to U.S. Patent No. 5,128,057) is added to the rinsing agent. This 250 ml portion is 25 times larger than the volume of the solvent mixture that is expected to be carried out when the PCB is cleaned. The gas chromatographic sample of the rinsing agent in the boiling pool before and after the addition of the solvent mixture is mainly composed of tetrahydrofuran methanol, together with an activator, a surfactant, and a corrosion inhibitor, and the formulation thereof is combined with U.S. Patent No. 5,128,057, The distillate from the microstiller and the bottom residue from the microstiller are identical. The micro-distillator can concentrate the adhering dirt and a solvent mixture mainly composed of tetrahydrofuran methanol, together with an activator, a surfactant, and a corrosion inhibitor (the formulation of which is consistent with U.S. Patent No. 5,128,057) to less than 2% by weight. The purity, rinsing agent contamination significantly reduces the amount of valuable rinsing agent that will be disposed of when the bottoms of the distiller are disposed of as waste. The distillate from the microstillator is essentially a pure rinsing agent (less than 1% by weight of solvent mixture and adherent dirt contamination), confirming that the micro distiller is indeed effective in removing solvent mixture and adhering dirt from the rinsing agent.

Example 2:

To further illustrate the various cleaners and solvent combinations that can be used in this process, the rinse degreaser is filled with ethyl nonafluorobutyl ether and allowed to boil at 78 ° C (about 172 ° F). The micro-distillator is activated and the program controls the temperature of the addition of the contaminated rinse solvent to the micro-distillator and the micro-distillator. a 250 ml portion of a solvent mixture consisting essentially of 3-methoxy-3-methyl-1-butanol, a small amount of tetrahydrofuran methanol, a surfactant, an activator, and a corrosion inhibitor (the formulation and Doyel) U.S. Patent No. 6,130,195, et al. The gas chromatographic sample of the rinsing agent before and after the addition of the solvent mixture in the boiling pool is mainly composed of 3-methoxy-3-methyl-1-butanol, a small amount of tetrahydrofuran methanol, a surfactant, an activator, and A corrosion inhibitor, and a distillate from the microstillator and a bottom liquid from the microstiller. The micro-distillator can adhere to the soil and is mainly composed of 3-methoxy-3-methyl-1-butanol, a small amount of tetrahydrofuran methanol, a surfactant, an activator, and a corrosion inhibitor. The resulting solvent mixture is concentrated to a purity of less than 2% by weight, and the contamination of the rinsing agent significantly reduces the amount of valuable rinsing agent that will be disposed of when the bottom liquid of the distiller is disposed of as waste. The distillate from the microstillator is essentially a pure rinsing agent (less than 1% by weight of solvent mixture and adherent dirt contamination), confirming that the micro distiller does effectively separate the solvent mixture from the solvent and adhere to the soil.

While the present invention has been shown and described, it is understood that the invention is not limited thereto, but may be embodied in other different ways within the scope of the following claims. Various modifications and alterations of the present invention will be apparent to those skilled in the art.

10‧‧‧Double Solvent Cleaning System

12‧‧‧Pre-cleaning module slot

14‧‧‧ Flushing degreaser

16‧‧‧Microstiller

18‧‧‧Infusion room

20‧‧‧ solvent mixture

22‧‧‧Electric immersion heater

24‧‧‧ thermostat controller

26‧‧‧Spray cleaning; soaking spray collector

28‧‧‧Seal pump

30‧‧‧Filter system

32‧‧‧ Machine

34‧‧‧Compressed air sweeping collector

36‧‧‧Solenoid valve

38‧‧‧ Flushing degreaser boiling pool

40‧‧‧Transport pump

42‧‧‧ suction hose

44‧‧‧Original solution container

46‧‧‧Compressed air supply valve, degreaser tank

48‧‧‧Hot solvent vapour

50‧‧‧washing pool

52‧‧‧Main condenser coil

54‧‧‧Floating area

56‧‧‧Transport pump

58‧‧‧Distiller level controller

60‧‧‧heater

62‧‧‧External heat exchanger/condenser

64‧‧‧Bottom dumping solenoid valve

66‧‧‧Flexible fittings

68‧‧‧Waste container

Claims (5)

A device for cleaning contaminants from a precision component, comprising: a. a pre-cleaning module tank containing a heated solvent mixture for removing contaminants from the precision component, b. as being mounted from the precision component a gas phase degreaser for removing the residual solvent mixture and the rinsing agent for adhering the dirt, and c. separating the residual solvent mixture and adhering dirt from the rinsing agent, guiding the rinsing agent back to the rinsing tank, and The residual solvent mixture and contaminants are directed to a microdistiller for waste disposal. The apparatus of claim 1, wherein the rinsing tank is operatively coupled to the micro distiller to deliver a rinsing agent contaminated with a solvent mixture and residual contaminants from the pre-cleaning module tank and to rinse The agent is delivered back to the rinse tank. A method for continuously separating contaminants from a rinse solvent in a system for cleaning electronic and other components, characterized in that it comprises: a. treating a contaminated substrate that has been treated with a solvent mixture by a flushing solvent in a separate rinse tank, To remove any residual contaminants and residual solvent mixture, thereby collecting contaminants removed from the assembly in the rinsing tank; and b. moving the contaminated rinsing solvent from the rinsing tank to the micro distiller to The rinsing solvent separates the contaminants, directs the rinsing agent back to the rinsing tank, and directs the residual solvent mixture and contaminants to waste disposal. A method of cleaning a precision component, comprising: a. immersing the component in a heated solvent mixture placed in a pre-cleaning module tank to thereby remove adhering contaminants; b. in a separate rinse degreaser Treat the assembly with a rinse solvent to remove any residue a contaminant and residual solvent mixture whereby the contaminants removed from the assembly are collected in the rinse degremer; and c. the contaminated rinse solvent is transferred from the rinse deliter to the microdistiller to be flushed therefrom The solvent separates the contaminants and directs the rinsing solvent to the rinsing degreaser. The method of claim 4, wherein the step of treating the component with a rinsing agent comprises: d. subjecting the component to a pre-exposure by exposing the component to a hot vapor of a rinsing agent disposed in the rinsing degreaser Immersion; e. immersing the assembly in a boiling rinse placed in a boiling tank to remove any residual adhering dirt and residual solvent mixture; and f. removing the assembly from the boiling pool and soaking the assembly In a purification rinse solvent placed in the rinse chamber.