TW201414520A - High energy charged particle treatment system - Google Patents

High energy charged particle treatment system Download PDF

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TW201414520A
TW201414520A TW101136408A TW101136408A TW201414520A TW 201414520 A TW201414520 A TW 201414520A TW 101136408 A TW101136408 A TW 101136408A TW 101136408 A TW101136408 A TW 101136408A TW 201414520 A TW201414520 A TW 201414520A
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particle
treatment
treatment rooms
therapy system
charged
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TW101136408A
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Chin-An Chen
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Chin-An Chen
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Abstract

The present invention relates to a charged particle treatment system, at least having a particle injection source, a synchrotron, a beam transmission line assembly, a plurality of treatment rooms and a plurality of particle beam scanning apparatuses.

Description

高能量帶電粒子治療系統 High energy charged particle therapy system

本發明是有關於一種治療系統,且特別是有關於一種帶電粒子治療系統。 This invention relates to a therapeutic system and, more particularly, to a charged particle therapy system.

針對癌症治療的不同方法中,手術和放射治療為腫瘤局部控制之主要方法。過去的放射治療是以X射線為主,穿透力強,能治療深部組織的腫瘤;但缺點是容易同時傷害周邊的正常組織,選擇性較差。相較於X射線而言,更佳的治療方式是使用高能量放射粒子以達到放射治療時對腫瘤細胞與正常組織的較高選擇性。高能量放射粒子沒有被大力推廣的主因在於供產生醫療使用之高能量放射粒子設備本身或與其他醫療設備之間整合不完備,使得治療深度、部位、精確度及每次病人位置設定時間都受到極大的限制,無法達到高標準的醫療要求,因此只能使用於少數腫瘤疾病病例。同時,造價非常昂貴也是無法大量普及化的原因。 Among the different methods of cancer treatment, surgery and radiation therapy are the main methods for local control of tumors. In the past, radiotherapy was based on X-rays, which had strong penetrating power and could treat tumors in deep tissues. However, the disadvantage was that it was easy to damage the surrounding normal tissues at the same time, and the selectivity was poor. A better treatment than X-rays is the use of high-energy radiation particles to achieve higher selectivity for tumor cells and normal tissues during radiation therapy. The main reason for the high-energy radiation particles not being promoted is that the high-energy radiation particle device for medical use itself or the integration with other medical devices is incomplete, so that the treatment depth, location, accuracy and time setting time of each patient are affected. Extreme limitations, unable to meet high standards of medical requirements, can only be used in a small number of cases of cancer diseases. At the same time, the cost is very expensive and it is why it cannot be widely popularized.

本發明提供一種帶電粒子治療系統,至少包括粒子注入源、同步加速器、射束傳輸線組、治療室與粒子束照射裝置。該粒子注入源提供帶電粒子,而該粒子注入源的帶電粒子能量規格為7-19電子伏特(MeV)。該同步加速器加 速該粒子注入源所提供的帶電粒子,將帶電粒子加速至能量範圍70-300 MeV而輸出為粒子束。多個粒子束照射裝置乃分別配置於該些治療室內。該射束傳輸線組將該同步加速器輸出的該粒子束,分別傳送到該些治療室內的該些粒子束照射裝置,以進行照射治療。 The invention provides a charged particle therapy system comprising at least a particle injection source, a synchrotron, a beam transmission line set, a treatment room and a particle beam irradiation device. The particle implantation source provides charged particles, and the charged particles of the particle injection source have an energy specification of 7-19 electron volts (MeV). The synchrotron plus The charged particles provided by the particle injection source accelerate the charged particles to an energy range of 70-300 MeV and output as a particle beam. A plurality of particle beam irradiation devices are disposed in the treatment rooms, respectively. The beam transmission line group transmits the particle beam output by the synchrotron to the particle beam irradiation devices in the treatment rooms to perform irradiation treatment.

在本發明之實施例中,所述帶電粒子治療系統中的該粒子注入源以一第一方向提供帶電粒子至該同步加速器,而該同步加速器以一第二方向輸出該粒子束,使該粒子束順著該第二方向的一延長線直線前進,該第一方向與該第二方向間的夾角為180度或270度。 In an embodiment of the invention, the particle implantation source in the charged particle therapy system supplies charged particles to the synchrotron in a first direction, and the synchrotron outputs the particle beam in a second direction to cause the particle The beam advances linearly along an extension of the second direction, the angle between the first direction and the second direction being 180 degrees or 270 degrees.

在本發明之實施例中,該些治療室包括至少一第一治療室,位於順著該第二方向的該延長線末端,而該粒子束沿著該延長線直線進入該第一治療室。 In an embodiment of the invention, the treatment rooms include at least one first treatment chamber located at the end of the extension line along the second direction, and the particle beam linearly enters the first treatment chamber along the extension line.

在本發明之實施例中,該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的雙邊,該粒子束分別轉彎而以相對於該第二方向左右30度、45度或60度方式分別射入該些第二治療室。 In an embodiment of the invention, the treatment rooms further comprise a plurality of second treatment rooms located on the bilateral sides of the extension line along the second direction, the particle beams respectively turning to be left and right with respect to the second direction 30 Degrees, 45 degrees or 60 degrees are injected into the second treatment rooms.

在本發明之實施例中,該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的單邊,該粒子束分別轉彎而以相對於該第二方向30度、45度或60度方式分別射入該些第二治療室。 In an embodiment of the invention, the treatment rooms further comprise a plurality of second treatment rooms located on a single side of the extension line along the second direction, the particle beams respectively turning to be opposite to the second direction 30 Degrees, 45 degrees or 60 degrees are injected into the second treatment rooms.

在本發明之實施例中,所述帶電粒子治療系統中的該些治療室位於同一平面上。此外,該粒子注入源與該同步加速器與該些治療室位於同一平面上。 In an embodiment of the invention, the treatment rooms in the charged particle therapy system are on the same plane. In addition, the particle injection source and the synchrotron are in the same plane as the treatment rooms.

在本發明之實施例中,所述帶電粒子治療系統所使用的該帶電粒子為質子。 In an embodiment of the invention, the charged particles used in the charged particle therapy system are protons.

為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the present invention will be more apparent from the following description.

本發明整合建置整套高能量帶電放射粒子治療系統,不但降低成本、縮短治療所需的時間,從而能夠普及高能放射粒子於癌症治療上之運用。 The invention integrates and constructs a whole set of high-energy charged radiation particle treatment system, which not only reduces the cost and shortens the time required for treatment, but also can popularize the application of high-energy radiation particles in cancer treatment.

圖1繪示依照本發明之一實施例之一種帶電粒子治療系統的配置示意圖。本發明的高能量帶電放射粒子治療系統10,其結構如圖1所表示,至少包含有:粒子注入源100、同步加速器200、射束傳輸線組300、治療室400與粒子束照射裝置500。 1 is a schematic view showing the configuration of a charged particle therapy system according to an embodiment of the present invention. The high-energy charged radiation particle treatment system 10 of the present invention has a structure as shown in FIG. 1, and includes at least a particle injection source 100, a synchrotron 200, a beam transmission line group 300, a treatment room 400, and a particle beam irradiation device 500.

(1)粒子注入源100:粒子源提供粒子至加速器中而被加速器加速,而本實施例所使用粒子例如為質子。粒子注入源所需的粒子能量規格為7-19電子伏特(MeV)。粒子注入源例如以直線加速器(Linac)作為粒子注入源,能量規格為7-12MeV;而若以例如小型迴旋加速器(baby cyclotron)作為注入源,能量規格則為13-19MeV。 (1) Particle Injection Source 100: The particle source supplies particles to the accelerator to be accelerated by the accelerator, and the particles used in this embodiment are, for example, protons. The particle energy specification required for the particle injection source is 7-19 electron volts (MeV). The particle injection source is, for example, a linear accelerator (Linac) as a particle injection source, and has an energy specification of 7 to 12 MeV; and if, for example, a small cyclotron (baby cyclotron) is used as an injection source, the energy specification is 13 to 19 MeV.

(2)同步加速器(synchrotron)200:加速粒子注入源100所注入的粒子,其規格要求例如為圓周30米以內,較佳圓周為20米內,採方形配置,並可將粒子加速至能量範圍70-300MeV。 (2) Synchrotron 200: Accelerates the particles injected by the particle injection source 100, and the specification thereof is, for example, within 30 meters of the circumference, preferably within 20 meters of the circumference, and is arranged in a square shape, and accelerates the particles to the energy range. 70-300 MeV.

(3)射束傳輸線組300:將同步加速器200加速至特定能量之粒子束P,利用射束管及轉彎磁鐵的組合成的射束傳輸線組300,以一特定角度傳送到治療室400。 (3) Beam transmission line group 300: The particle beam P which accelerates the synchrotron 200 to a specific energy, and the beam transmission line group 300 formed by a combination of a beam tube and a turning magnet is transmitted to the treatment room 400 at a specific angle.

(4)治療室400:治療室400定義為治療病人之空間,治療室內安置有粒子束照射裝置500、相關機器手臂及定位系統以便於定位與移動患者。 (4) Treatment Room 400: The treatment room 400 is defined as a space for treating a patient, and a particle beam irradiation device 500, a related robot arm, and a positioning system are disposed in the treatment room to facilitate positioning and moving the patient.

(5)粒子束照射裝置500:當高能粒子束P被傳送至治療室400後,再利用粒子束照射系統500來瞄準患者或病灶來進行高能帶電粒子照射治療。治療系統來針對病人的不同需求進行照射,照射區域規格可達為30x30x30cm3,而劑量位置分佈準確度可達2 mm以內。 (5) Particle beam irradiation device 500: After the high-energy particle beam P is transmitted to the treatment room 400, the particle beam irradiation system 500 is used to aim the patient or the lesion to perform high-energy charged particle irradiation treatment. The treatment system is designed to meet the different needs of the patient, and the irradiation area can be up to 30x30x30cm 3 , and the dose position distribution accuracy can be up to 2 mm.

圖1所繪示之粒子注入源100與同步加速器200可位在同一房間或不同房間。特定能量之粒子束P與原先注入方向成270度轉折射出。治療室400包括治療室400A與治療室400B。基本上,該些治療室400乃是配置於同一平面上,也就是建築物之同一樓面上。而粒子注入源100與同步加速器200可與該些治療室400位於同一平面(樓面)上。同步加速器200應與該些治療室400位於同一平面(樓面),但因粒子束P出射方向與與原先粒子注入方向成270度轉折,粒子注入源100或可位於另一樓面(上一層或下一層)。將高能粒子束P之射出方向設為橫軸(X軸),在其橫軸延長線末端搭配配置一治療室400A,而高能粒子束P可沿著橫軸直線進入治療室400A。相對於該橫軸(X軸),治療室400B可相對於該橫軸延長線雙邊配置,射 束傳輸線組300可將高能粒子束P分別轉彎,而使粒子束P相對於該橫軸採左右45度(圖中看來為相對於橫軸上下45度)方式分別射入該些治療室400B。針對雙邊配置的治療室400B,粒子束P可以相對於該橫軸以左45度或右45度方式,分別射入該些治療室400B。雖然此實施例中該角度為45度,但此角度不限於45度而可任選自於30-60度間之範圍。 The particle injection source 100 and the synchrotron 200 illustrated in FIG. 1 can be located in the same room or in different rooms. The particle beam P of a specific energy is refracted at a 270 degree turn from the original injection direction. The treatment room 400 includes a treatment room 400A and a treatment room 400B. Basically, the treatment rooms 400 are arranged on the same plane, that is, on the same floor of the building. The particle injection source 100 and the synchrotron 200 can be located on the same plane (floor) as the treatment rooms 400. The synchrotron 200 should be in the same plane (floor) as the treatment rooms 400, but the particle injection source 100 may be located on the other floor (upper layer) because the particle beam P exit direction is 270 degrees away from the original particle injection direction. Or the next layer). The emission direction of the high-energy particle beam P is set to the horizontal axis (X-axis), and a treatment room 400A is disposed at the end of the horizontal axis extension line, and the high-energy particle beam P can enter the treatment room 400A along the horizontal axis. The treatment room 400B can be bilaterally arranged with respect to the horizontal axis extension line with respect to the horizontal axis (X axis) The beam transmission line group 300 can respectively turn the high-energy particle beam P into a treatment, and the particle beam P is injected into the treatment rooms 400B respectively by 45 degrees to the horizontal axis (which appears to be 45 degrees above and below the horizontal axis). . For the treatment chamber 400B disposed bilaterally, the particle beam P may be injected into the treatment rooms 400B at 45 degrees to the left or 45 degrees to the right with respect to the horizontal axis. Although the angle is 45 degrees in this embodiment, the angle is not limited to 45 degrees and may be selected from the range of 30-60 degrees.

由於本發明帶電粒子治療系統射出的高能量粒子束P乃規畫為雙邊傳送至治療室400,可以使整個系統在規畫上更為彈性之外,更大幅提高了粒子射束的利用率以及醫療場地的空間使用率。 Since the high-energy particle beam P emitted by the charged particle therapy system of the present invention is bilaterally transmitted to the treatment room 400, the entire system can be more elastic in planning, and the utilization of the particle beam is greatly improved. The space utilization rate of the medical site.

至於位於治療室400內的粒子束照射裝置500,相對於傳統固定病床或病人位置,而以機頭(Gantry)或具旋轉功能照射部轉動粒子束射出行進方向來對不同癌灶位置進行放射照射之方式,本發明治療室400內可採用機械手臂承載病床而以三度空間方式轉動或移動病床與病人位置,組合搭配固定入射角度粒子束的照射方式,能省卻傳統機頭以不同轉動角度射出粒子束時所需要的龐大偏轉磁鐵的空間需求,精簡治療室的場地成本。當然,減少使用昂貴的傳統機頭也可顯著降低系統整體製造成本。同時,也可以達到減低病患長時間維持固定位置之難度,從而提高系統整體定位的精準度。 As for the particle beam irradiation device 500 located in the treatment room 400, relative to the conventional fixed bed or patient position, the lens head (Gantry) or the rotating function irradiation unit rotates the particle beam to emit the traveling direction to irradiate the different cancerous positions. In the treatment room 400 of the present invention, the mechanical arm can be used to carry the bed, and the bed and the patient position can be rotated or moved in a three-dimensional manner, and the irradiation mode of the fixed incident angle particle beam can be combined to eliminate the traditional machine head from being emitted at different rotation angles. The space requirements of the large deflection magnets required for the particle beam streamline the cost of the treatment room. Of course, reducing the use of expensive conventional handpieces can also significantly reduce overall system manufacturing costs. At the same time, it can also reduce the difficulty of maintaining a fixed position for a long time, thereby improving the accuracy of the overall positioning of the system.

位於治療室內的粒子束照射裝置500同時運用整合其他醫療儀器,包括電腦斷層掃描(in-room CT)、核磁共振現 象(MRI)、正子斷層造影(PET)或雷射影像定位導航系統等,來對對病人進行檢冊、定位並治療。整合治療室中多種治療輔助器材,不但可避免多種醫療儀器檢驗併行所造成醫療資源浪費,更可提升放射粒子治療標的多樣化。 The particle beam irradiation device 500 located in the treatment room simultaneously integrates other medical instruments, including computed tomography (in-room CT), and magnetic resonance imaging. Image (MRI), positron tomography (PET) or laser image localization navigation system to check, locate and treat patients. Integrating a variety of therapeutic aids in the treatment room not only avoids the waste of medical resources caused by the parallel inspection of multiple medical instruments, but also enhances the diversification of radiation particle treatment targets.

圖2繪示依照本發明之另一實施例之一種帶電粒子治療系統的配置示意圖。相對於圖1之系統配置,圖2所繪示之粒子注入源100與同步加速器200位在同一房間,特定能量之粒子束P與原先注入方向成180度轉折射出。治療室400包括治療室400A與治療室400B。粒子注入源100與同步加速器200可與該些治療室400位於同一平面(樓面)上。將高能粒子束P之射出方向設為橫軸(X軸),在其橫軸延長線末端搭配配置一治療室400A,而高能粒子束P可沿著橫軸直線進入治療室400A。相對於該橫軸(X軸),治療室400B可相對於該橫軸延長線採單邊配置。圖2中採單邊配置的治療室400B,粒子束P可以相對於該橫軸45度之方式,選擇性地僅以單邊方式分別射入該些治療室400B。圖2中單邊配置之治療室400B可為2至4間。 2 is a schematic view showing the configuration of a charged particle therapy system according to another embodiment of the present invention. With respect to the system configuration of FIG. 1, the particle injection source 100 illustrated in FIG. 2 and the synchrotron 200 are in the same room, and the particle beam P of a specific energy is refracted 180 degrees from the original injection direction. The treatment room 400 includes a treatment room 400A and a treatment room 400B. The particle injection source 100 and the synchrotron 200 can be located on the same plane (floor) as the treatment rooms 400. The emission direction of the high-energy particle beam P is set to the horizontal axis (X-axis), and a treatment room 400A is disposed at the end of the horizontal axis extension line, and the high-energy particle beam P can enter the treatment room 400A along the horizontal axis. With respect to the horizontal axis (X-axis), the treatment room 400B can be arranged unilaterally with respect to the horizontal axis extension line. In the treatment room 400B, which is unilaterally arranged in Fig. 2, the particle beam P can be selectively injected into the treatment rooms 400B only in a unilateral manner so as to be 45 degrees with respect to the horizontal axis. The treatment room 400B in the unilateral configuration of Figure 2 can be between 2 and 4.

圖3繪示依照本發明之又一實施例之一種帶電粒子治療系統的配置示意圖。配置於同一平面上該些治療室400包括治療室400A位於高能粒子束P之射出方向(設為橫軸/X軸)延長線末端,而高能粒子束P可沿著橫軸直線進入治療室400A。相對於該橫軸(X軸),治療室400B、與400B’乃對稱於於該橫軸延長線雙邊配置,射束傳輸線組300可將高能粒子束P分別轉彎,而使粒子束P相對於 該橫軸分別採左右45度與左右30度方式分別射入該些治療室400B與400B’。 3 is a schematic diagram showing the configuration of a charged particle therapy system according to still another embodiment of the present invention. Disposed on the same plane, the treatment rooms 400 include the treatment room 400A located at the end of the extension line of the high energy particle beam P (set to the horizontal axis / X axis), and the high energy particle beam P can enter the treatment room 400A along the horizontal axis. . With respect to the horizontal axis (X-axis), the treatment rooms 400B and 400B' are bilaterally arranged symmetrically with respect to the horizontal axis extension line, and the beam transmission line group 300 can turn the high-energy particle beam P separately, so that the particle beam P is opposed to The horizontal axes are respectively injected into the treatment rooms 400B and 400B' by 45 degrees left and right and 30 degrees left and right, respectively.

圖4繪示依照本發明之一實施例之一種帶電粒子治療系統的部份配置示意圖。圖4繪示粒子注入源100注入粒子至同步加速器200(如虛線箭頭所示),待同步加速器200將帶電粒子加速至所要求的能量範圍時,特定能量之粒子束P與原先注入方向成270度轉折射出(箭頭所示),再透過傳輸線300傳送至治療室400(見圖1)。 4 is a partial schematic view showing a configuration of a charged particle therapy system in accordance with an embodiment of the present invention. 4 illustrates the particle injection source 100 injecting particles into the synchrotron 200 (as indicated by the dashed arrow). When the synchrotron 200 accelerates the charged particles to the desired energy range, the particle beam P of the specific energy is 270 from the original injection direction. The degree of refraction is shown (indicated by the arrow) and transmitted to the treatment room 400 through the transmission line 300 (see Fig. 1).

由於本發明整合使用小型迴旋加速器(或直線加速器)做為粒子源,並以同步加速器加速達到所引出的粒子能量範圍在70-300MeV,再由相對應於注入方向270度之一邊引出,此非直線配置方式可以節省配置空間,可達到降低系統整體尺寸的目標。使用小型迴旋加速器為粒子源,因其直徑較小(一般可小於1.5m),也有助於降低系統尺寸。當然,空間餘裕時,粒子源100與同步加速器200也可採直線配置方式(圖2),由相對應於注入方向180度之一邊引出。 Since the invention integrates a small cyclotron (or a linear accelerator) as a particle source, and accelerates with a synchrotron to reach a range of energy of the extracted particles of 70-300 MeV, and then is extracted by one side corresponding to the injection direction of 270 degrees, this non- Straight line configuration saves configuration space and achieves the goal of reducing overall system size. The use of small cyclotrons as particle sources, due to their small diameter (generally less than 1.5 m), also helps to reduce system size. Of course, when the space is sufficient, the particle source 100 and the synchrotron 200 can also be arranged in a straight line (Fig. 2), and are drawn by one side corresponding to the injection direction by 180 degrees.

圖4也繪示出同步加速器200之結構配置。在加速器中,粒子運動於一封閉真空管道,要能有效控制高速運動粒子的轉彎、聚焦、引入、引出等運動軌跡,必須依賴高精密設計之磁鐵組件佈建於粒子運動軌跡上所形成的控制磁場。同步加速器200採方形配置,使用四個90度的二極磁鐵(Dipole)202來控制粒子射束的轉彎,搭配有4個四極磁鐵(trim-Quadrupole)204進行射束聚焦與一個六極磁鐵 (Sextupole)206做射束能量修正與補償。同步加速器200為能加速至能量範圍在70-300百萬電子伏特(MeV)的同步加速器。 FIG. 4 also depicts the structural configuration of the synchrotron 200. In the accelerator, the particles move in a closed vacuum pipeline, and it is necessary to effectively control the turning, focusing, introducing, and extracting motion trajectories of high-speed moving particles, and must rely on the control formed by the high-precision design of the magnet component on the particle motion trajectory. magnetic field. The synchrotron 200 is a square configuration that uses four 90-degree dipole magnets (Dipole) 202 to control the turning of the particle beam, with four quad-quadrupoles 204 for beam focusing and a six-pole magnet. (Sextupole) 206 for beam energy correction and compensation. The synchrotron 200 is a synchrotron that can be accelerated to an energy range of 70-300 million electron volts (MeV).

一般而言,同步加速器即是由不同種類與數量的磁鐵組合成一封閉回路來達成連續加速之目的。本發明以設計並計算使用最少的磁鐵以及最簡省的磁鐵佈建位置來達到降低系統整體尺寸以及建置成本的目標,同時,因為使用的磁鐵越少則所需造價越低,所需控制的磁鐵數量減少而穩定性因此提高,因此在後續的維修上亦更加簡單。 In general, the synchrotron is a combination of different types and quantities of magnets into a closed loop to achieve continuous acceleration. The invention aims to reduce the overall size of the system and the cost of construction by designing and calculating the minimum number of magnets and the simplest magnet construction position, and at the same time, the lower the required magnet cost, the lower the required cost. The number of magnets is reduced and the stability is thus increased, so that the subsequent maintenance is also simpler.

針對本發明整合建置的整套高能量帶電放射粒子治療系統,其主要優點至少包括: The main advantages of the complete set of high-energy charged radiation particle therapy systems integrated for the present invention include:

1.簡省面積,在相同佔地面積下,本發明之系統可提供更大治療用帶電粒子放射線能量。 1. Simple area, the system of the present invention can provide more therapeutic charged particle radiation energy under the same footprint.

2.帶電粒子束同時傳送至雙邊多間治療室,縮短治療系統維護間隔且提升治療系統周轉率。 2. The charged particle beam is simultaneously transmitted to multiple treatment rooms on both sides, shortening the maintenance interval of the treatment system and increasing the turnover rate of the treatment system.

3.提升患者接受帶電粒子放射線治療時之定位精準度。 3. Improve the positioning accuracy of patients receiving charged particle radiation therapy.

4.整合臨床上所需使用到的輔助器材於同一治療室,達到縮短並簡化放射治療所需的前置處理時間與流程。 4. Integrate the clinically needed auxiliary equipment in the same treatment room to shorten and simplify the pre-processing time and process required for radiotherapy.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

10‧‧‧高能量帶電放射粒子治療系統 10‧‧‧High-energy charged radiation particle therapy system

100‧‧‧粒子注入源 100‧‧‧Particle injection source

200‧‧‧同步加速器 200‧‧‧Sync Accelerator

202‧‧‧二極磁鐵 202‧‧‧ two-pole magnet

204‧‧‧四極磁鐵 204‧‧‧ four-pole magnet

206‧‧‧六極磁鐵 206‧‧‧Six-pole magnet

300‧‧‧射束傳輸線組 300‧‧‧beam transmission line set

400、400A、400B、400B’‧‧‧治療室 400, 400A, 400B, 400B’‧‧‧ treatment rooms

500‧‧‧粒子束照射裝置 500‧‧‧Particle beam irradiation device

圖1繪示依照本發明之一實施例之一種帶電粒子治療系統的配置示意圖。 1 is a schematic view showing the configuration of a charged particle therapy system according to an embodiment of the present invention.

圖2繪示依照本發明之另一實施例之一種帶電粒子治療系統的配置示意圖。 2 is a schematic view showing the configuration of a charged particle therapy system according to another embodiment of the present invention.

圖3繪示依照本發明之又一實施例之一種帶電粒子治療系統的配置示意圖。 3 is a schematic diagram showing the configuration of a charged particle therapy system according to still another embodiment of the present invention.

圖4繪示依照本發明之一實施例之一種帶電粒子治療系統的部份配置示意圖。 4 is a partial schematic view showing a configuration of a charged particle therapy system in accordance with an embodiment of the present invention.

10‧‧‧高能量帶電放射粒子治療系統 10‧‧‧High-energy charged radiation particle therapy system

100‧‧‧粒子注入源 100‧‧‧Particle injection source

200‧‧‧同步加速器 200‧‧‧Sync Accelerator

300‧‧‧射束傳輸線組 300‧‧‧beam transmission line set

400、400A、400B‧‧‧治療室 400, 400A, 400B‧‧ ‧ treatment room

500‧‧‧粒子束照射裝置 500‧‧‧Particle beam irradiation device

Claims (15)

一種帶電粒子治療系統,至少包括:粒子注入源,其提供帶電粒子,而該粒子注入源的帶電粒子能量規格為7-19電子伏特(MeV);同步加速器,其加速該粒子注入源所提供的帶電粒子,將帶電粒子加速至能量範圍70-300 MeV而輸出為粒子束;多個治療室;多個粒子束照射裝置,配置於該些治療室內;以及射束傳輸線組,將該同步加速器輸出的該粒子束分別傳送到該些治療室內的該些粒子束照射裝置,以進行照射治療。 A charged particle therapy system comprising at least: a particle injection source that provides charged particles, and a charged particle energy specification of the particle injection source is 7-19 electron volts (MeV); a synchrotron that accelerates the supply of the particle injection source Charged particles, accelerate charged particles to an energy range of 70-300 MeV and output as a particle beam; a plurality of treatment chambers; a plurality of particle beam irradiation devices disposed in the treatment rooms; and a beam transmission line group to output the synchrotron The particle beams are respectively delivered to the particle beam irradiation devices in the treatment rooms for irradiation treatment. 如申請專利範圍第1項所述帶電粒子治療系統,其中該粒子注入源以一第一方向提供帶電粒子至該同步加速器,而該同步加速器以一第二方向輸出該粒子束,使該粒子束順著該第二方向的一延長線直線前進,該第一方向與該第二方向間的夾角為180度。 The charged particle therapy system of claim 1, wherein the particle injection source supplies charged particles to the synchrotron in a first direction, and the synchrotron outputs the particle beam in a second direction to cause the particle beam Advancing along an extension line in the second direction, the angle between the first direction and the second direction is 180 degrees. 如申請專利範圍第1項所述帶電粒子治療系統,其中該粒子注入源以一第一方向提供帶電粒子至該同步加速器,而該同步加速器以一第二方向輸出該粒子束,使該粒子束順著該第二方向的一延長線直線前進,該第一方向與該第二方向間的夾角為270度。 The charged particle therapy system of claim 1, wherein the particle injection source supplies charged particles to the synchrotron in a first direction, and the synchrotron outputs the particle beam in a second direction to cause the particle beam Advancing along an extension line in the second direction, the angle between the first direction and the second direction is 270 degrees. 如申請專利範圍第1項所述帶電粒子治療系統,其中該些治療室包括至少一第一治療室,位於順著該第二方 向的該延長線末端,而該粒子束沿著該延長線直線進入該第一治療室。 The charged particle therapy system of claim 1, wherein the treatment rooms comprise at least one first treatment room, located along the second side The end of the extension line is directed, and the particle beam enters the first treatment room along the extension line. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的單邊,該粒子束分別轉彎而以相對於該第二方向45度方式分別射入該些第二治療室。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located on a single side of the extension line along the second direction, the particle beams respectively turning The second treatment rooms are respectively injected into the 45-degree manner with respect to the second direction. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的雙邊,該粒子束分別轉彎而以相對於該第二方向左右45度方式分別射入該些第二治療室。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located on a bilateral side of the extension line along the second direction, the particle beams respectively turning to be opposite The second treatment chambers are respectively injected into the second direction and the left and right 45 degrees. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的單邊,該粒子束分別轉彎而以相對於該第二方向30度方式分別射入該些第二治療室。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located on a single side of the extension line along the second direction, the particle beams respectively turning The second treatment rooms are respectively injected into the 30-degree manner with respect to the second direction. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的雙邊,該粒子束分別轉彎而以相對於該第二方向左右30度方式分別射入該些第二治療室。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located on a bilateral side of the extension line along the second direction, the particle beams respectively turning to be opposite The second treatment chambers are respectively injected into the second direction by 30 degrees. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的單邊,該粒子束分別轉彎而以相對於該第二方向60度方式分別射入該些第二治療室。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located on a single side of the extension line along the second direction, the particle beams respectively turning The second treatment rooms are respectively injected 60 degrees with respect to the second direction. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方 向的該延長線的雙邊,該粒子束分別轉彎而以相對於該第二方向左右60度方式分別射入該些第二治療室。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located along the second side On the bilateral sides of the extension line, the particle beams are respectively turned and injected into the second treatment chambers in a manner of 60 degrees left and right with respect to the second direction. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的單邊,該粒子束分別轉彎而以相對於該第二方向至少兩個以上角度分別射入該些第二治療室,所述兩個以上角度介於30-60度之間。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located on a single side of the extension line along the second direction, the particle beams respectively turning At least two or more angles are respectively incident on the second treatment chambers relative to the second direction, the two or more angles being between 30-60 degrees. 如申請專利範圍第4項所述帶電粒子治療系統,其中該些治療室更包括多個第二治療室,位於順著該第二方向的該延長線的雙邊,該粒子束分別轉彎而以相對於該第二方向左右至少兩個以上角度分別射入該些第二治療室,所述兩個以上角度介於30-60度之間。 The charged particle therapy system of claim 4, wherein the treatment rooms further comprise a plurality of second treatment rooms located on a bilateral side of the extension line along the second direction, the particle beams respectively turning to be opposite At least two or more angles are respectively injected into the second treatment chambers in the second direction, and the two or more angles are between 30-60 degrees. 如申請專利範圍第1項所述帶電粒子治療系統,其中該些治療室位於同一平面上。 The charged particle therapy system of claim 1, wherein the treatment rooms are on the same plane. 如申請專利範圍第13項所述帶電粒子治療系統,其中該粒子注入源與該同步加速器與該些治療室位於同一平面上。 The charged particle therapy system of claim 13, wherein the particle injection source and the synchrotron are in the same plane as the treatment rooms. 如申請專利範圍第1項所述帶電粒子治療系統,其中該帶電粒子為質子。 The charged particle therapy system of claim 1, wherein the charged particles are protons.
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