TW201414016A - Light-emitting device - Google Patents

Light-emitting device Download PDF

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TW201414016A
TW201414016A TW102127703A TW102127703A TW201414016A TW 201414016 A TW201414016 A TW 201414016A TW 102127703 A TW102127703 A TW 102127703A TW 102127703 A TW102127703 A TW 102127703A TW 201414016 A TW201414016 A TW 201414016A
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zinc oxide
light
phosphor
silver
reflectance
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TW102127703A
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Chinese (zh)
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TWI594462B (en
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Yoshifumi Tsutai
Takashi Abe
Yutaka Sato
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Nihon Ceratec Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements
    • H01L33/60Reflective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder
    • H01L33/502Wavelength conversion materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Led Device Packages (AREA)
  • Luminescent Compositions (AREA)

Abstract

To provide a light-emitting device in which it is possible to suppress a drop in reflectance resulting from a silver reflector reacting with sulfur components and thus becoming silver sulfide and blackening. The light-emitting device is provided with a light-emitting element (22), a reflector (26) which is made from silver and which reflects the light from the light-emitting element (22), and a fluorescent material (10). A coating (26a), containing zinc oxide (ZnO), is formed on at least one part of the surface of the reflector (26). Thus, the zinc oxide reacts with the sulfur components, thereby inhibiting the generation of silver sulfide.

Description

發光裝置 Illuminating device

本發明係關於具有由銀所成之反射體的發光裝置。 The present invention relates to a light-emitting device having a reflector made of silver.

目前以液晶電視的背光或次世代照明而言,LED燈備受矚目。為了使LED燈發光成白色,必須將LED元件本身的發光,透過經塗布或揉合紅、藍、綠等螢光體的透鏡,將來自螢光體的發光相疊合,藉此獲得白色。近年來,為了提高現色性,含有硫黃的硫化物系螢光體受到矚目。但是,螢光體係具有若曝露在水分、熱、或紫外線時,發光特性會降低的弱點。尤其,硫化物系螢光體係在化學性呈不安定,具有因螢光體表面與水起反應而發生硫化氫,對周圍的構件會造成明顯的不良影響的問題。因此,達成實用化的案例極少。因此,為了進行保護免於受到該等外因影響,提出在螢光體粒子的表面形成被覆層的內容(參照例如專利文獻1)。 At present, LED backlights are attracting attention in terms of backlighting or next-generation lighting of LCD TVs. In order to cause the LED lamp to emit white light, it is necessary to superimpose the light emitted from the LED element itself through a lens coated or blended with a phosphor such as red, blue or green to superimpose the light emitted from the phosphor, thereby obtaining white color. In recent years, in order to improve color rendering properties, sulfur-containing sulfide-based phosphors have attracted attention. However, the fluorescent system has a weak point in which the luminescent properties are lowered when exposed to moisture, heat, or ultraviolet rays. In particular, the sulfide-based fluorescent system is chemically unstable, and has a problem that hydrogen sulfide is generated by the reaction of the surface of the phosphor with water, which causes a significant adverse effect on surrounding members. Therefore, there are very few cases in which practical use has been achieved. Therefore, in order to protect from such external influences, it is proposed to form a coating layer on the surface of the phosphor particles (see, for example, Patent Document 1).

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特願2010-248411號 [Patent Document 1] Japanese Patent Application No. 2010-248411

但是,藉由形成被覆層,螢光體粒子本身的變質雖然可抑制為最小限度,但是,在抑制因硫化氫所造成的影響方面並不充分,會有因所發生的硫化氫,周圍構件,例如反射體、配線、或密封樹脂發生劣化的問題。尤其,若在反射體使用銀時,銀容易與硫化氫起反應而形成為硫化銀而黑色化,反射率明顯降低。 However, the formation of the coating layer can suppress the deterioration of the phosphor particles themselves to a minimum, but it is not sufficient to suppress the influence by hydrogen sulfide, and there may be hydrogen sulfide and surrounding components. For example, the problem that the reflector, the wiring, or the sealing resin is deteriorated. In particular, when silver is used for the reflector, silver easily reacts with hydrogen sulfide to form silver sulfide, which is blackened, and the reflectance is remarkably lowered.

此外,即使因大氣中或構成LED的構件,尤其樹脂系構件所含有的微量硫黃成分,以長期裝置壽命的觀點來看,因反射體黑色化所致之反射率的降低係成為無法忽略的問題。 Further, even in the atmosphere or a member constituting the LED, particularly a trace amount of the sulfur component contained in the resin member, the decrease in the reflectance due to the blackening of the reflector is negligible from the viewpoint of long-term device life. problem.

本發明係根據如上所示之問題而研創者,目的在提供可抑制因由銀所成之反射體與硫黃成分的反應而形成為硫化銀而黑色化而由此反射率降低的情形的發光裝置。 The present invention has been made in view of the above-mentioned problems, and it is an object of the invention to provide a light-emitting device capable of suppressing the formation of silver sulfide by a reaction between a reflector made of silver and a sulfur component, thereby reducing the reflectance. .

本發明之發光裝置係具備有:發光元件、將來自該發光元件的光進行反射之由銀所成之反射體、及螢光體材料,反射體係在至少表面的一部分具有含有氧化鋅的被膜者。 The light-emitting device of the present invention includes a light-emitting element, a reflector made of silver that reflects light from the light-emitting element, and a phosphor material, and the reflection system has a film containing zinc oxide on at least a part of the surface. .

藉由本發明之發光裝置,在由銀所成之反射體的表面的至少一部分具備有含有氧化鋅的被膜,因此藉由與硫黃成分起反應,可抑制硫化銀發生,且可抑制反射率降低。 According to the light-emitting device of the present invention, at least a part of the surface of the reflector made of silver is provided with a film containing zinc oxide. Therefore, by reacting with the sulfur component, generation of silver sulfide can be suppressed, and the reflectance can be suppressed from being lowered. .

尤其,若將被膜的厚度形成為20nm以上1μm以下,可得更高的效果。 In particular, when the thickness of the film is 20 nm or more and 1 μm or less, a higher effect can be obtained.

此外,若在螢光體材料含有由硫化物系螢光體所成之螢光體粒子時,使由螢光體粒子所發生的硫化氫與反射體表面的氧化鋅起反應而分解,可無害化。因此,可減小因發生硫化氫而對反射體或周圍構件所造成的影響,且可抑制特性劣化。 Further, when the phosphor material contains the phosphor particles formed of the sulfide-based phosphor, the hydrogen sulfide generated by the phosphor particles is decomposed by reacting with the zinc oxide on the surface of the reflector, thereby being harmless. Chemical. Therefore, the influence on the reflector or the surrounding member due to the occurrence of hydrogen sulfide can be reduced, and deterioration in characteristics can be suppressed.

此外,若在螢光體粒子的表面設置含有氧化鋅的被覆層,使由螢光體粒子所發生的硫化氫與螢光體粒子的表面的氧化鋅起反應而分解,可無害化。因此,可減小因發生硫化氫而對反射體或周圍構件所造成的影響,且可抑制特性劣化。 Further, when a coating layer containing zinc oxide is provided on the surface of the phosphor particles, hydrogen sulfide generated by the phosphor particles is decomposed by reacting with zinc oxide on the surface of the phosphor particles, thereby being harmless. Therefore, the influence on the reflector or the surrounding member due to the occurrence of hydrogen sulfide can be reduced, and deterioration in characteristics can be suppressed.

此外,若將被覆層中的氧化鋅層的量,以氧化鋅相對螢光體粒子的重量的重量比,形成為0.75重量%以上30重量%以下,此外,在被覆層設置氧化鋅層,且將氧化鋅層的厚度形成為30nm以上1μm以下,可使亮度維持率提升。 In addition, the amount of the zinc oxide layer in the coating layer is 0.75 wt% or more and 30 wt% or less by weight of the weight of the zinc oxide to the weight of the phosphor particles, and a zinc oxide layer is provided on the coating layer, and When the thickness of the zinc oxide layer is 30 nm or more and 1 μm or less, the brightness maintenance rate can be improved.

再者此外,若在被覆層具有氧化鋅層及二氧化矽層,可使亮度維持率更加提升,並且可更加減小因發生硫化氫而對周圍構件所造成的影響。 Further, if the coating layer has a zinc oxide layer and a ceria layer, the brightness maintenance rate can be further improved, and the influence on the surrounding members due to the occurrence of hydrogen sulfide can be further reduced.

10‧‧‧螢光體材料 10‧‧‧Fluorescent materials

11‧‧‧螢光體粒子 11‧‧‧Silver particles

12‧‧‧被覆層 12‧‧‧ Cover

20‧‧‧發光裝置 20‧‧‧Lighting device

21‧‧‧基板 21‧‧‧Substrate

22‧‧‧發光元件 22‧‧‧Lighting elements

23‧‧‧配線 23‧‧‧ wiring

24‧‧‧導線 24‧‧‧Wire

25‧‧‧反射體框 25‧‧‧ reflector frame

26‧‧‧反射體 26‧‧‧ reflector

26a‧‧‧被膜 26a‧‧‧film

27‧‧‧密封層 27‧‧‧ Sealing layer

31‧‧‧銀板 31‧‧‧ Silver board

32‧‧‧密閉容器 32‧‧‧Contained containers

33‧‧‧水 33‧‧‧ water

第1圖係顯示本發明之一實施形態之發光裝置之構成的圖。 Fig. 1 is a view showing the configuration of a light-emitting device according to an embodiment of the present invention.

第2圖係顯示第1圖之發光裝置所使用之螢光體材料 之構成之一例的示意圖。 Figure 2 is a view showing the phosphor material used in the light-emitting device of Figure 1. A schematic diagram of an example of the configuration.

第3圖係顯示在實施例中所使用的實驗裝置的圖。 Fig. 3 is a view showing the experimental apparatus used in the examples.

第4圖係顯示參考例1-1~1-3、1-7之發光亮度的經時變化的特性圖。 Fig. 4 is a characteristic diagram showing changes with time in the light-emitting luminances of Reference Examples 1-1 to 1-3 and 1-7.

第5圖係顯示參考例1-1、1-7、2-1之發光亮度的經時變化的特性圖。 Fig. 5 is a characteristic diagram showing changes with time in the light-emitting luminance of Reference Examples 1-1, 1-7, and 2-1.

[實施發明之形態] [Formation of the Invention]

以下參照圖式,詳細說明本發明之實施形態。 Embodiments of the present invention will be described in detail below with reference to the drawings.

第1圖係顯示本發明之一實施形態之發光裝置20之一構成例者。該發光裝置20係在基板21之上裝載有發光元件22,發光元件22係藉由形成在基板21之上的配線23及導線24來作電性連接。配線23及導線24係例如藉由銅等所構成。此外,在發光元件22的周圍形成有例如反射體框25。在反射體框25的內側表面,亦即發光元件22之側的表面形成有例如將來自發光元件22的光進行反射之由銀所成的反射體26。在發光元件22之上係以覆蓋發光元件22的方式形成有密封層27。密封層27係藉由例如使螢光體材料10作分散的樹脂所構成。 Fig. 1 is a view showing an example of a configuration of a light-emitting device 20 according to an embodiment of the present invention. In the light-emitting device 20, a light-emitting element 22 is mounted on a substrate 21, and the light-emitting element 22 is electrically connected by a wiring 23 and a wire 24 formed on the substrate 21. The wiring 23 and the wire 24 are made of, for example, copper or the like. Further, for example, a reflector frame 25 is formed around the light-emitting element 22. On the inner side surface of the reflector frame 25, that is, the surface on the side of the light-emitting element 22, for example, a reflector 26 made of silver that reflects light from the light-emitting element 22 is formed. A sealing layer 27 is formed on the light-emitting element 22 so as to cover the light-emitting element 22. The sealing layer 27 is made of, for example, a resin that disperses the phosphor material 10.

在反射體26的表面的至少一部分形成有含有氧化鋅(ZnO)的被膜26a。藉此,氧化鋅與硫黃成分起反應而抑制硫化銀發生,可抑制因黑色化所致之反射率的降低。被膜26a係以非為明顯損及反射體26的反射率的白濁的膜為佳,較佳為緻密且均一的膜。被膜26a的厚度係 以例如20nm以上1μm以下為佳,若為40nm以上600nm以下為更佳。若厚度較薄,藉由被膜26a來抑制反射率降低的效果較小,若厚度較厚,會導致反射體26的初期反射率降低之故。 A film 26a containing zinc oxide (ZnO) is formed on at least a part of the surface of the reflector 26. Thereby, zinc oxide reacts with the sulfur component to suppress the occurrence of silver sulfide, and the decrease in reflectance due to blackening can be suppressed. The film 26a is preferably a white turbid film which does not significantly impair the reflectance of the reflector 26, and is preferably a dense and uniform film. The thickness of the film 26a is For example, it is preferably 20 nm or more and 1 μm or less, and more preferably 40 nm or more and 600 nm or less. When the thickness is thin, the effect of suppressing the decrease in reflectance by the film 26a is small, and if the thickness is thick, the initial reflectance of the reflector 26 is lowered.

被膜26a係例如藉由各種方法來形成在由銀 The film 26a is formed by silver, for example, by various methods.

所成之反射體26的表面。具體而言,例如可列舉:溶膠凝膠法、藉由濕式或乾式等各種方法而使氧化鋅的微粒子附著在反射體26的表面的方法、CVD法、PVD法、或濺鍍法。此外,成膜可以1次進行,亦可分為複數次來成膜。此外,成膜之後,為了使被膜26a定著,亦可視需要進行熱處理。 The surface of the resulting reflector 26. Specifically, for example, a sol-gel method, a method of adhering fine particles of zinc oxide to the surface of the reflector 26 by various methods such as wet or dry, a CVD method, a PVD method, or a sputtering method can be mentioned. Further, the film formation may be carried out once, or may be divided into a plurality of times to form a film. Further, after the film formation, in order to fix the film 26a, heat treatment may be performed as needed.

在發光元件22係使用例如發出紫外光、藍色 光、或綠色光作為激勵光者。 In the light-emitting element 22, for example, ultraviolet light, blue light is emitted. Light, or green light, acts as an excitation light.

以螢光體材料10而言,以1種或視需要混合使 用例如藉由由發光元件22所發出的激勵光而發出紅色光者、發出藍色光者、發出綠色光者、發出黃色光者等。 In the case of the phosphor material 10, one type or as needed For example, a person who emits red light by excitation light emitted from the light-emitting element 22, a person who emits blue light, a person who emits green light, a person who emits yellow light, or the like.

第2圖係模式顯示螢光體材料10者之一例。該 螢光體材料10較佳為具有:螢光體粒子11、及設在螢光體粒子11的表面的被覆層12。此外,被覆層12亦可未形成。 Fig. 2 is a diagram showing an example of a phosphor material 10. The The phosphor material 10 preferably has phosphor particles 11 and a coating layer 12 provided on the surface of the phosphor particles 11. Further, the coating layer 12 may not be formed.

以螢光體粒子11而言,例如可列舉: BaMgAl10O17:Eu、ZnS:Ag,Cl、BaAl2S4:Eu或者CaMgSi2O6:Eu等藍色系螢光體、Zn2SiO4:Mn、(Y,Gd)BO3:Tb,ZnS:Cu,Al、SrGa2S4:Eu、或者(Ba,Sr,Mg)O.aAl2O3:Mn等綠色系螢光體、CaGa2S4:Eu等黃色螢光體、 (Y,Gd)BO3:Eu、Y2O2S:Eu、YPVO4:Eu、La2O2S:Eu、CaS:Eu、SrS:Eu、或者(Ca,Sr)S:Eu等紅色系螢光體。螢光體粒子11的粒子徑基本上不拘,惟平均粒子徑為5μm至20μm程度,以粒子徑儘可能一致為佳。可使特性安定之故。 Examples of the phosphor particles 11 include blue phosphors such as BaMgAl 10 O 17 :Eu, ZnS:Ag, Cl, BaAl 2 S 4 :Eu or CaMgSi 2 O 6 :Eu, and Zn 2 SiO. 4 : Mn, (Y, Gd) BO 3 : Tb, ZnS: Cu, Al, SrGa 2 S 4 : Eu, or (Ba, Sr, Mg) O. a green phosphor such as aAl 2 O 3 : Mn, a yellow phosphor such as CaGa 2 S 4 :Eu, (Y,Gd)BO 3 :Eu, Y 2 O 2 S:Eu, YPVO 4 :Eu, La 2 O 2 S: Eu, CaS:Eu, SrS:Eu, or a red-based phosphor such as (Ca, Sr)S:Eu. The particle diameter of the phosphor particles 11 is substantially constant, but the average particle diameter is about 5 μm to 20 μm, and it is preferable that the particle diameters are as uniform as possible. The characteristics can be stabilized.

在如上所示之螢光體粒子11之中亦若使用硫 Sulfur is also used in the phosphor particles 11 as shown above.

化物系螢光體,例如ZnS:Ag,Cl或BaAl2S4:Eu等藍色系螢光體、ZnS:Cu,Al或SrGa2S4:Eu等綠色系螢光體、CaGa2S4:Eu等黃色螢光體、Y2O2S:Eu、La2O2S:Eu、CaS:Eu、SrS:Eu、或(Ca,Sr)S:Eu等紅色系螢光體時,因螢光體粒子11會與水等起反應而發生硫化氫(H2S),容易發生反射體26的黑色化,但是藉由本實施形態,可有效抑制因硫化銀的發生所致之黑色化。 a compound-based phosphor such as a blue-based phosphor such as ZnS:Ag, Cl or BaAl 2 S 4 :Eu, a green-based phosphor such as ZnS:Cu, Al or SrGa 2 S 4 :Eu, or CaGa 2 S 4 : When a yellow phosphor such as Eu or a red phosphor such as Y 2 O 2 S:Eu, La 2 O 2 S:Eu, CaS:Eu, SrS:Eu, or (Ca,Sr)S:Eu The phosphor particles 11 react with water or the like to generate hydrogen sulfide (H 2 S), and the blackening of the reflector 26 is likely to occur. However, according to the present embodiment, blackening due to the occurrence of silver sulfide can be effectively suppressed.

被膜26a所含有的氧化鋅係如化1所示,在常 溫常壓下容易與硫化氫起反應,轉換成對光學特性所造成的影響較小的硫化鋅(ZnS)及水(H2O)之故。 The zinc oxide contained in the coating film 26a is easily reacted with hydrogen sulfide at normal temperature and pressure, and is converted into zinc sulfide (ZnS) and water (H 2 O) which have little influence on optical characteristics. The reason.

ZnO+H2S → ZnS+H2O...(化1) ZnO+H 2 S → ZnS+H 2 O. . . (1)

螢光體材料10的被覆層12較佳為含有氧化鋅,尤其,螢光體粒子11由硫化物系螢光體所成時為更佳。如上所述,藉由氧化鋅可將硫化氫轉換成對光學特性所造成的影響較小的硫化鋅及水之故。被覆層12係可藉由由氧化鋅所成之氧化鋅層的單層所構成,惟以藉由將氧化鋅層與其他1以上的層進行層積的複數層所構成為佳。藉由與其他層進行層積,可抑制螢光體粒子11的劣化,並且亦可藉此抑制硫化氫發生之故。 The coating layer 12 of the phosphor material 10 preferably contains zinc oxide, and particularly preferably, the phosphor particles 11 are formed of a sulfide-based phosphor. As described above, by the zinc oxide, hydrogen sulfide can be converted into zinc sulfide and water which have less influence on optical characteristics. The coating layer 12 is preferably composed of a single layer of a zinc oxide layer made of zinc oxide, but is preferably formed of a plurality of layers in which a zinc oxide layer and another one or more layers are laminated. By laminating with other layers, deterioration of the phosphor particles 11 can be suppressed, and hydrogen sulfide can be suppressed by this.

以其他層而言,例如可列舉:含有由氧化鎂 (MgO)、氧化鋁(Al2O3)、二氧化矽(SiO2)、氧化鈦(TiO2)、氧化釔(Y2O3)、氧化鑭(La2O3)、氧化鈰(CeO2)、氧化釓(Gd2O3)、及氧化鋯(ZrO2)所成群組之中的至少1種的層。若其他層含有2種以上的化合物時,係可將該等混合或複合含有在1層之中,此外,亦可以層狀層積複數化合物而含有。其中亦以其他層而言,較佳為含有二氧化矽者,若形成為具有由二氧化矽所成之二氧化矽層,則更佳。可得更高效果之故。 Other layers include, for example, magnesium oxide (MgO), aluminum oxide (Al 2 O 3 ), cerium oxide (SiO 2 ), titanium oxide (TiO 2 ), and cerium oxide (Y 2 O 3 ). A layer of at least one selected from the group consisting of lanthanum oxide (La 2 O 3 ), cerium oxide (CeO 2 ), cerium oxide (Gd 2 O 3 ), and zirconia (ZrO 2 ). When the other layer contains two or more kinds of compounds, they may be mixed or compositely contained in one layer, or may be contained in a layered manner in a plurality of layers. Further, in other layers, it is preferable to contain cerium oxide, and it is more preferable if it is formed to have a cerium oxide layer formed of cerium oxide. Can get higher results.

氧化鋅層的厚度較佳為例如30nm以上1μm以 下,若為100nm以上500nm以下為更佳。此外,被覆層12中的氧化鋅的量係以氧化鋅相對螢光體粒子11的重量的重量比,以0.75重量%以上30重量%以下為佳,若為2.5重量%以上15重量%以下為更佳。若氧化鋅層的厚度較薄或氧化鋅的量較少時,減小因發生硫化氫而對周圍構件所造成的影響的效果較小,若氧化鋅層的厚度較厚或氧化鋅的量較多時,初期亮度的降低及亮度的經時劣化會變大之故。其他層的厚度較佳為例如30nm以上1μm以下,若為100nm以上500nm以下則更佳。在該範圍內,可得更高效果之故。 The thickness of the zinc oxide layer is preferably, for example, 30 nm or more and 1 μm. Next, it is more preferably 100 nm or more and 500 nm or less. Further, the amount of zinc oxide in the coating layer 12 is preferably from 0.75% by weight to 30% by weight, based on the weight ratio of the zinc oxide to the weight of the phosphor particles 11, and is from 2.5% by weight to 15% by weight. Better. If the thickness of the zinc oxide layer is thin or the amount of zinc oxide is small, the effect of reducing the influence of hydrogen sulfide on the surrounding members is small, if the thickness of the zinc oxide layer is thicker or the amount of zinc oxide is smaller. For a long time, the decrease in the initial luminance and the deterioration of the luminance over time become large. The thickness of the other layer is preferably, for example, 30 nm or more and 1 μm or less, and more preferably 100 nm or more and 500 nm or less. Within this range, higher effects can be obtained.

氧化鋅層與其他層的層積順序並未特別限定 。例如可為氧化鋅層為螢光體粒子11之側,其他層為螢光體粒子11之側,此外,亦可在氧化鋅層之間插入其他層,在其他層之間插入氧化鋅層。 The order of lamination of the zinc oxide layer and other layers is not particularly limited. . For example, the zinc oxide layer may be on the side of the phosphor particles 11, and the other layers may be on the side of the phosphor particles 11. Further, another layer may be interposed between the zinc oxide layers, and a zinc oxide layer may be interposed between the other layers.

此外,被覆層12亦可構成為具有含有氧化鋅 及其他物質的混合層或複合層。以其他物質而言,例如可列舉:由氧化鎂、氧化鋁、二氧化矽、氧化鈦、氧化釔、氧化鑭、氧化鈰、氧化釓、或氧化鋯所成群組之中的至少1種。此外,亦可形成為將含有氧化鋅與其他物質的混合層或複合層、及上述其他層進行層積的構造。此時亦為被覆層12中的氧化鋅的量係以氧化鋅相對螢光體粒子11的重量的重量比,較佳為0.75重量%以上30重量%以下,若為3重量%以上15重量%以下為更佳。 In addition, the coating layer 12 may also be configured to have zinc oxide. And a mixed layer or composite layer of other substances. The other substance may, for example, be at least one selected from the group consisting of magnesium oxide, aluminum oxide, cerium oxide, titanium oxide, cerium oxide, cerium oxide, cerium oxide, cerium oxide, or zirconium oxide. Further, a structure in which a mixed layer or a composite layer containing zinc oxide and another substance and the other layer are laminated may be formed. In this case, the amount of zinc oxide in the coating layer 12 is preferably 0.75% by weight or more and 30% by weight or less based on the weight ratio of the zinc oxide to the weight of the phosphor particles 11, and is 3% by weight or more and 15% by weight or less. The following is better.

該螢光體材料10係例如藉由利用各種方法, 將被覆層12形成在螢光體粒子11的表面而得。具體而言,例如可列舉:溶膠凝膠法、或使構成被覆層12的微粒子,藉由濕式或乾式等各種方法而附著在螢光體粒子11的表面的方法。 The phosphor material 10 is made, for example, by using various methods. The coating layer 12 is formed on the surface of the phosphor particles 11. Specifically, for example, a sol-gel method or a method of adhering fine particles constituting the coating layer 12 to the surface of the phosphor particles 11 by various methods such as wet or dry can be mentioned.

在如上所示之發光裝置20中,因空氣中的硫 黃成分、或由螢光體材料10的螢光體粒子11所發生的硫化氫,反射體26、配線23、導線24、及密封層27等會劣化。尤其,反射體26係藉由銀所構成,因此銀與硫黃成分,尤其硫化氫的反應性高,生成硫化銀,且因黑色化所致之反射率降低等的劣化明顯。但是,藉由本實施形態,在反射體26的表面的至少一部分係形成有含有氧化鋅的被膜26a,藉此,由於氧化鋅與硫黃成分起反應,因此可抑制硫化銀發生,且可抑制因黑色化所致之反射率的降低等。此外,若在螢光體粒子11的表面形成有含有氧化鋅的被覆層12時,係可抑制硫化氫發生,且可抑制反射體26、配線23、導線24、及密封層27等劣化。 In the light-emitting device 20 as shown above, due to sulfur in the air The yellow component or the hydrogen sulfide generated by the phosphor particles 11 of the phosphor material 10, the reflector 26, the wiring 23, the wires 24, the sealing layer 27, and the like are deteriorated. In particular, since the reflector 26 is made of silver, the reactivity of silver with a sulfur component, particularly hydrogen sulfide, is high, and silver sulfide is formed, and deterioration such as a decrease in reflectance due to blackening is remarkable. However, according to the present embodiment, the coating film 26a containing zinc oxide is formed on at least a part of the surface of the reflector 26, whereby zinc oxide reacts with the sulfur component, thereby suppressing the occurrence of silver sulfide and suppressing the occurrence of silver sulfide. The decrease in reflectance due to blackening, and the like. In addition, when the coating layer 12 containing zinc oxide is formed on the surface of the phosphor particles 11, the occurrence of hydrogen sulfide can be suppressed, and deterioration of the reflector 26, the wiring 23, the wires 24, and the sealing layer 27 can be suppressed.

如上所示藉由本實施形態,在由銀所成之反 射體26的表面的至少一部分具備含有氧化鋅的被膜26a,因此藉由與硫黃成分起反應,可抑制硫化銀發生,且可抑制反射率降低。 As shown above, in the present embodiment, the opposite is made by silver. At least a part of the surface of the projectile 26 is provided with the film 26a containing zinc oxide. Therefore, by reacting with the sulfur component, the occurrence of silver sulfide can be suppressed, and the decrease in reflectance can be suppressed.

尤其,若將被膜26a的厚度形成為20nm以上 1μm以下,可得更高效果。 In particular, when the thickness of the film 26a is 20 nm or more Below 1μm, higher results can be obtained.

此外,若在螢光體材料10含有由硫化物系螢 光體所成之螢光體粒子11時,係使由螢光體粒子11所發生的硫化氫與氧化鋅起反應而分解,可無害化。因此,可減小因發生硫化氫而對反射體26或周圍構件所造成的影響,可抑制特性劣化。 In addition, if the phosphor material 10 contains sulfuric acid When the phosphor particles 11 are formed by the light body, the hydrogen sulfide generated by the phosphor particles 11 is decomposed by reacting with zinc oxide, and is harmless. Therefore, the influence on the reflector 26 or the surrounding members due to the occurrence of hydrogen sulfide can be reduced, and deterioration in characteristics can be suppressed.

此外,若在螢光體粒子11的表面設置含有氧 化鋅的被覆層12,使由螢光體粒子11所發生的硫化氫與被覆層12的氧化鋅起反應而分解,可無害化。因此,可減小因發生硫化氫而對反射體26或配線23、導線24、及密封層27等周圍構件所造成的影響,且可抑制特性劣化。 Further, if oxygen is contained on the surface of the phosphor particles 11, The coating layer 12 of zinc is decomposed by reacting hydrogen sulfide generated by the phosphor particles 11 with zinc oxide of the coating layer 12, thereby being harmless. Therefore, it is possible to reduce the influence on the surrounding members such as the reflector 26, the wiring 23, the wiring 24, and the sealing layer 27 due to the occurrence of hydrogen sulfide, and it is possible to suppress deterioration in characteristics.

此外,若將被覆層12中的氧化鋅層的量,以 氧化鋅相對螢光體粒子11的重量的重量比,形成為0.75重量%以上30重量%以下,此外,在被覆層12設置氧化鋅層,且將氧化鋅層12的厚度形成為30nm以上1μm以下,則可使亮度維持率提升。 In addition, if the amount of the zinc oxide layer in the coating layer 12 is to be The weight ratio of the weight of the zinc oxide to the weight of the phosphor particles 11 is 0.75 wt% or more and 30 wt% or less, and the zinc oxide layer is provided on the coating layer 12, and the thickness of the zinc oxide layer 12 is 30 nm or more and 1 μm or less. , the brightness maintenance rate can be improved.

再者此外,若在被覆層12具有氧化鋅層及二 氧化矽層,可使亮度維持率更加提升,並且可更加減小因發生硫化氫而對周圍構件所造成的影響。 Furthermore, if the coating layer 12 has a zinc oxide layer and two The ruthenium oxide layer can further improve the brightness maintenance rate and can further reduce the influence on the surrounding members due to the occurrence of hydrogen sulfide.

[實施例] [Examples]

(實施例1-1) (Example 1-1)

如第3圖所示,將在表面形成有氧化鋅的被膜的銀板31、及由硫化物系螢光體(Ca,Sr)S:Eu的螢光體粒子11所成且未形成有被覆層12的螢光體材料10收納在密閉容器32內,進行85℃的高溫濕環境曝露試驗。在密閉容器32之中放入水33,銀板31及螢光體材料10係以不會浸到水33的方式,配置在水33的上方。銀板31的表面的被膜係使平均粒子徑20nm的氧化鋅微粒子在醇系溶劑分散,使用噴霧噴嘴而以成為約100nm的厚度的方式塗布在銀板31的表面,使其乾燥而形成。 As shown in Fig. 3, a silver plate 31 having a film of zinc oxide formed on the surface thereof and a phosphor particle 11 made of a sulfide-based phosphor (Ca, Sr) S: Eu are formed without being coated. The phosphor material 10 of the layer 12 was housed in the sealed container 32, and subjected to a high-temperature wet environment exposure test at 85 °C. Water 33 is placed in the sealed container 32, and the silver plate 31 and the phosphor material 10 are disposed above the water 33 so as not to be immersed in the water 33. The film on the surface of the silver plate 31 is formed by dispersing zinc oxide fine particles having an average particle diameter of 20 nm in an alcohol solvent, and applying them to the surface of the silver plate 31 so as to have a thickness of about 100 nm, and drying them.

每隔30分鐘,藉由分光光度計,測定銀板31之反射率對曝露時間的變化。以判斷基準而言,若所測定到的銀板的反射率為80%以上,即設為合格,在小於80%的時點,視為銀的反射率明顯降低而結束試驗。在表1中顯示銀板31的初期反射率及反射率小於80%的時間及該時的反射率。表1的反射率係另外準備作為基準的銀板(未形成有被膜者),以將作為基準的銀板的反射率設為100時的相對值表示。此外,實施例1-1的初期反射率為在銀板31形成被膜後的反射率。 The change in the reflectance of the silver plate 31 against the exposure time was measured by a spectrophotometer every 30 minutes. In the judgment criterion, if the measured reflectance of the silver plate is 80% or more, it is regarded as pass, and when it is less than 80%, the reflectance of silver is considered to be remarkably lowered, and the test is terminated. Table 1 shows the initial reflectance and the reflectance of the silver plate 31 of less than 80% and the reflectance at that time. The reflectance of Table 1 is prepared by separately preparing a silver plate as a reference (when no film is formed), and expressing the relative value when the reflectance of the silver plate as a reference is 100. Further, the initial reflectance of Example 1-1 is the reflectance after the silver plate 31 is formed into a film.

以比較例1-1而言,準備在表面未形成有被膜的銀板31,以比較例1-2而言,準備在表面形成有氧化釔(Y2O3)的被膜的銀板31,以比較例1-3而言,準備在表面形成有氧化鋯(ZrO2)的被膜的銀板31,以比較例1-4而言,準備在表面形成有二氧化矽(SiO2)的被膜的銀板31。在 比較例1-2、1-3、1-4中,除了使用氧化釔微粒子、氧化鋯微粒子、或二氧化矽微粒子來取代氧化鋅微粒子以外,其他係與實施例1-1同樣地在銀板31的表面形成被膜。關於比較例1-1至比較例1-4,亦與實施例1-1同樣地,連同由硫化物系螢光體(Ca,Sr)S:Eu的螢光體粒子11所成之螢光體材料10一起將銀板31收納在密閉容器32之內,進行85℃的高溫濕環境曝露試驗。將所得結果一併顯示於表1。此外,比較例1-2、1-3、1-4的初期反射率係在銀板31形成被膜後的反射率。 In Comparative Example 1-1, a silver plate 31 having no film formed thereon was prepared, and in Comparative Example 1-2, a silver plate 31 having a film of yttrium oxide (Y 2 O 3 ) formed on the surface was prepared. In Comparative Example 1-3, a silver plate 31 on which a film of zirconium oxide (ZrO 2 ) was formed was prepared, and in Comparative Example 1-4, a film in which ceria (SiO 2 ) was formed on the surface was prepared. Silver plate 31. In Comparative Examples 1-2, 1-3, and 1-4, except for using cerium oxide fine particles, zirconia fine particles, or cerium oxide fine particles in place of zinc oxide fine particles, the other silver was used in the same manner as in Example 1-1. The surface of the plate 31 forms a film. In the same manner as in Example 1-1, Comparative Example 1-1 to Comparative Example 1-4 were combined with the phosphor particles of the sulfide-based phosphor (Ca, Sr) S: Eu. The body material 10 was placed in the sealed container 32 together with the silver plate 31, and subjected to a high temperature wet environment exposure test at 85 °C. The results obtained are shown together in Table 1. Further, the initial reflectances of Comparative Examples 1-2, 1-3, and 1-4 are reflectances after the silver plate 31 was formed into a film.

如表1所示,在實施例1-1中,係在經過16小時後,銀板31的反射率小於80%,相對於此,在比較例1-1、比較例1-2、比較例1-3中,係以30分鐘,銀板31的反射率小於80%,在比較例1-4中亦以3小時,銀板31的反射率小於80%。此外,在實施例1-1中,係在銀板31的表面形成氧化鋅的被膜,但是初期反射率係與未形成有被膜的基準的銀板為相同程度,並未發現反射率降低。 As shown in Table 1, in Example 1-1, the reflectance of the silver plate 31 was less than 80% after 16 hours passed, whereas in Comparative Example 1-1, Comparative Example 1-2, and Comparative Example. In 1-3, the reflectance of the silver plate 31 was less than 80% in 30 minutes, and also in the comparative example 1-4 for 3 hours, and the reflectance of the silver plate 31 was less than 80%. Further, in Example 1-1, a film of zinc oxide was formed on the surface of the silver plate 31, but the initial reflectance was the same as that of the silver plate on which the film was not formed, and the reflectance was not found to be lowered.

亦即,可知若在反射體26的表面設置含有氧化鋅的被膜26a,可抑制因硫化氫所致之反射體26的黑色化,且可抑制反射率降低。 In other words, when the film 26a containing zinc oxide is provided on the surface of the reflector 26, it is possible to suppress blackening of the reflector 26 due to hydrogen sulfide and to suppress a decrease in reflectance.

(實施例2-1) (Example 2-1)

與實施例1-1同樣地,將形成有氧化鋅的被膜的銀板31、及由硫化物系螢光體(Ca,Sr)S:Eu的螢光體粒子11所成之螢光體材料10收納在密閉容器32內,在密閉容器32之中並未放入水33,以85℃進行高溫環境曝露試驗,來調查銀板31的反射率的變化。實施例2-1係未積極地加濕而保持在85℃時的試驗。此外,以比較例2-1而言,針對未形成被膜的銀板31,與實施例2-1同樣地,以85℃進行高溫環境曝露試驗,調查出銀板31的反射率的變化。此時,包含密閉容器32的內部、以及設置在密閉容器32的內部的螢光體材料10、及銀板31的全部內容物並未特別地進行事前的乾燥,吸附水分因升溫而在密閉容器32的內部蒸發擴散,藉此形成為在密閉容器32的內部存在一定量的水分的環境。 In the same manner as in Example 1-1, a silver plate 31 in which a film of zinc oxide is formed, and a phosphor material made of phosphor particles 11 of a sulfide-based phosphor (Ca, Sr) S: Eu are formed. 10 is stored in the sealed container 32, and water 33 is not placed in the sealed container 32, and a high-temperature environmental exposure test is performed at 85 ° C to investigate the change in the reflectance of the silver plate 31. Example 2-1 was a test which was not actively humidified and kept at 85 °C. Further, in Comparative Example 2-1, the silver plate 31 in which the film was not formed was subjected to a high-temperature environmental exposure test at 85 ° C in the same manner as in Example 2-1, and the change in the reflectance of the silver plate 31 was examined. At this time, the inside of the sealed container 32 and the entire contents of the phosphor material 10 and the silver plate 31 provided inside the sealed container 32 are not particularly dried beforehand, and the adsorbed water is heated in a closed container. The inside of the 32 is evaporatively diffused, whereby an environment in which a certain amount of moisture exists in the inside of the hermetic container 32 is formed.

將所得的結果顯示於表2。此外,表2的反射率係另外準備作為基準的銀板(未形成有被膜者),以將作為基準的銀板的反射率設為100時的相對值表示。此外,實施例2-1的初期反射率係在銀板31形成被膜後的反射率。 The results obtained are shown in Table 2. In addition, the reflectance of Table 2 is prepared separately as a reference silver plate (when no film is formed), and the relative value when the reflectance of the silver plate as a reference is 100 is shown. Further, the initial reflectance of Example 2-1 is the reflectance after the silver plate 31 forms a film.

如表2所示,在比較例2-1中,係以9小時,銀 板31的反射率小於80%,相對於此,在實施例2-1中,即使在經過1000小時後,反射率亦為100%左右。在比較例2-1中,無關於在密閉容器32的內部未放入水33而反射率降低的原因被認為由於存在於密閉容器32之內部的一定量的吸附水分蒸發擴散,因此在該微量的吸附水分,螢光體材料10起反應而發生硫化氫,以致銀板31變色者。 亦即,可知若在反射體26的表面設置含有氧化鋅的被膜26a,可有效抑制因硫化氫所致之反射體26的黑色化,且可抑制反射率降低。 As shown in Table 2, in Comparative Example 2-1, it was 9 hours, silver The reflectance of the plate 31 was less than 80%. On the other hand, in Example 2-1, the reflectance was about 100% even after 1000 hours passed. In Comparative Example 2-1, it is considered that the reason why the reflectance is not lowered in the case where the water 33 is not placed inside the sealed container 32 is considered to be due to evaporation and diffusion of a certain amount of adsorbed water existing inside the sealed container 32. When the moisture is adsorbed, the phosphor material 10 reacts to generate hydrogen sulfide, so that the silver plate 31 is discolored. In other words, when the film 26a containing zinc oxide is provided on the surface of the reflector 26, it is possible to effectively suppress the blackening of the reflector 26 due to hydrogen sulfide and to suppress a decrease in reflectance.

(實施例3-1~3-5) (Examples 3-1 to 3-5)

除了改變形成在銀板31的表面的氧化鋅的被膜的厚度以外,其他係與實施例1-1同樣地進行85℃的高溫濕環境曝露試驗。形成在銀板31的表面的氧化鋅的被膜的厚度係實施例3-1為20nm,實施例3-2為40nm,實施例3-3為400nm,實施例3-4為600nm,實施例3-5為1000nm。關於任一者,均在螢光體粒子11並未形成有被覆層12。 The high-temperature wet environment exposure test at 85 ° C was carried out in the same manner as in Example 1-1, except that the thickness of the film of zinc oxide formed on the surface of the silver plate 31 was changed. The thickness of the film of zinc oxide formed on the surface of the silver plate 31 is 20 nm in Example 3-1, 40 nm in Example 3-2, 400 nm in Example 3-3, and 600 nm in Example 3-4. -5 is 1000 nm. In either case, the coating layer 12 is not formed in the phosphor particles 11 .

將所得的結果連同實施例1-1及比較例1-1的 結果一起顯示於表3。此外,表3的反射率係另外準備作為基準的銀板(未形成有被膜者),以將作為基準的銀板的反射率設為100時的相對值表示。此外,實施例1-1,3-1~3-5的初期反射率係在銀板31形成被膜後的反射率。 The results obtained were combined with those of Example 1-1 and Comparative Example 1-1. The results are shown together in Table 3. In addition, the reflectance of Table 3 was prepared separately as a reference silver plate (when no film was formed), and the relative value when the reflectance of the silver plate as a reference was 100 was shown. Further, the initial reflectances of Examples 1-1 and 3-1 to 3-5 are reflectances after the silver plate 31 forms a film.

如表3所示,銀板31的反射率小於80%的,在 實施例3-1中係在1小時後,在實施例3-2中係在2小時後,在實施例3-3中係在30小時後,在實施例3-4中係在40小時後,在實施例3-5中係在75小時後,在任一者中,相較於比較例1-1,反射率的降低均較慢。可知該效果係銀板31的被膜的厚度愈厚則愈高。此外,初期反射率係隨著被膜的厚度變厚而變低。亦即,可知以將設在反射體26的表面的含有氧化鋅的被膜26a的厚度設為20nm以上1μm以下為佳。 As shown in Table 3, the reflectance of the silver plate 31 is less than 80%, In Example 3-1, after 1 hour, in Example 3-2, after 2 hours, in Example 3-3, after 30 hours, and in Example 3-4, after 40 hours. In Example 3-5, after 75 hours, in either of them, the decrease in reflectance was slower than in Comparative Example 1-1. It is understood that this effect is such that the thicker the film of the silver plate 31 is, the higher the thickness is. Further, the initial reflectance becomes lower as the thickness of the film becomes thicker. In other words, it is preferable that the thickness of the zinc oxide-containing coating 26a provided on the surface of the reflector 26 is 20 nm or more and 1 μm or less.

(實施例4-1) (Example 4-1)

在由硫化物系螢光體(Ca,Sr)S:Eu所成之螢光體粒子11的表面,形成由二氧化矽所成之二氧化矽層、及由氧化鋅所成之氧化鋅層,作為被覆層12,而製作螢光體材料10。氧化鋅層係形成在二氧化矽層之上,二氧化矽層的厚度為約300nm,氧化鋅層的厚度為約200nm。二氧化矽層係藉由在將全氫聚矽氮烷及溶媒加以混合之含矽的前驅體溶液混合螢光體粒子11,進行乾燥且熱處理而 形成。氧化鋅層係在螢光體粒子11塗布使氧化鋅的微粒子分散在溶媒的漿料,藉由熱處理而形成。 On the surface of the phosphor particles 11 made of a sulfide-based phosphor (Ca, Sr) S: Eu, a cerium oxide layer made of cerium oxide and a zinc oxide layer made of zinc oxide are formed. As the coating layer 12, a phosphor material 10 is produced. A zinc oxide layer is formed on the ceria layer, the ceria layer has a thickness of about 300 nm, and the zinc oxide layer has a thickness of about 200 nm. The cerium oxide layer is dried and heat-treated by mixing the phosphor particles 11 with a cerium-containing precursor solution in which perhydropolyazane and a solvent are mixed. form. The zinc oxide layer is formed by applying a slurry in which fine particles of zinc oxide are dispersed in a solvent to the phosphor particles 11 and heat-treating.

將所製作的螢光體材料10、及在表面形成有 氧化鋅的被膜的銀板31,如第3圖所示收納在密閉容器32內,與實施例1-1同樣地,進行85℃的高溫濕環境曝露試驗。實施例3-1係除了使用在螢光體粒子11的表面形成有具有二氧化矽層及氧化鋅層之2層構造的被覆層12者作為螢光體材料10以外,其他係與實施例1-1相同。將所得的結果連同實施例1-1及比較例1-1的結果一起顯示於表4。此外,表4的反射率係另外準備作為基準的銀板(未形成有被膜者),以將作為基準的銀板的反射率設為100時的相對值表示。此外,實施例1-1、3-1的初期反射率係在銀板31形成被膜後的反射率。 The produced phosphor material 10 is formed on the surface The silver plate 31 of the film of zinc oxide was housed in the sealed container 32 as shown in Fig. 3, and a high-temperature wet environment exposure test at 85 ° C was carried out in the same manner as in Example 1-1. Example 3-1 is the same as Example 1 except that the coating layer 12 having a two-layer structure having a cerium oxide layer and a zinc oxide layer formed on the surface of the phosphor particles 11 is used as the phosphor material 10. -1 is the same. The results obtained are shown in Table 4 together with the results of Example 1-1 and Comparative Example 1-1. In addition, the reflectance of Table 4 is prepared separately as a reference silver plate (when no film is formed), and the relative value when the reflectance of the silver plate as a reference is 100 is shown. Further, the initial reflectances of Examples 1-1 and 3-1 are reflectances after the silver plate 31 was formed into a film.

如表4所示,在實施例1-1中,銀板31的反射 率小於80%的時間係在16小時後,相對於此,藉由實施例3-1,銀板31的反射率小於80%的時間係在20小時後。 亦即,可知若在反射體26的表面設置含有氧化鋅的被膜26a,此外,在螢光體粒子11的表面設置被覆層12,可得更高的效果。 As shown in Table 4, in Example 1-1, the reflection of the silver plate 31 The time when the rate is less than 80% is after 16 hours, whereas the time when the reflectance of the silver plate 31 is less than 80% is after 20 hours by the embodiment 3-1. In other words, it is understood that when the coating film 26a containing zinc oxide is provided on the surface of the reflector 26, and the coating layer 12 is provided on the surface of the phosphor particles 11, a higher effect can be obtained.

(參考例1-1~1-7) (Reference Example 1-1~1-7)

以參考例1-1~1-6而言,在由硫化物系螢光體(Ca,Sr)S:Eu所成之螢光體粒子11的表面形成由氧化鋅所成之氧化鋅層作為被覆層12,而製作螢光體材料10。 被覆層12係在螢光體粒子11塗布使氧化鋅的微粒子分散在溶媒的漿料,藉由進行熱處理而形成。此時,在參考例1-1~1-6中使分散在溶媒的氧化鋅的微粒子的量改變,藉此使被覆層12(亦即氧化鋅層)的厚度改變。被覆層12的厚度係參考例1-1為約200nm,參考例1-2為約500nm,參考例1-3為約1μm,參考例1-4為約100nm,參考例1-5為約40nm,參考例1-6為約20nm。此外,若將被覆層12(亦即氧化鋅層)的量換算成氧化鋅相對螢光體粒子11的重量的重量比,參考例1-1為約5重量%,參考例1-2為約15重量%,參考例1-3為約30重量%,參考例1-4為約2.5重量%,參考例1-5為約1.0重量%,參考例1-6為約0.5重量%。 In Reference Examples 1-1 to 1-6, a zinc oxide layer made of zinc oxide is formed on the surface of the phosphor particles 11 made of a sulfide-based phosphor (Ca, Sr) S: Eu. The phosphor layer material 10 is formed by coating the layer 12. The coating layer 12 is formed by applying a slurry in which fine particles of zinc oxide are dispersed in a solvent to the phosphor particles 11 and heat-treating. At this time, in Reference Examples 1-1 to 1-6, the amount of the fine particles of zinc oxide dispersed in the solvent was changed, whereby the thickness of the coating layer 12 (that is, the zinc oxide layer) was changed. The thickness of the coating layer 12 is about 200 nm in Reference Example 1-1, about 500 nm in Reference Example 1-2, about 1 μm in Reference Example 1-3, about 100 nm in Reference Example 1-4, and about 40 nm in Reference Example 1-5. Reference Examples 1-6 were about 20 nm. Further, when the amount of the coating layer 12 (i.e., the zinc oxide layer) is converted into the weight ratio of the zinc oxide to the weight of the phosphor particles 11, the reference example 1-1 is about 5% by weight, and the reference example 1-2 is about 15% by weight, Reference Examples 1-3 are about 30% by weight, Reference Examples 1-4 are about 2.5% by weight, Reference Examples 1-5 are about 1.0% by weight, and Reference Examples 1-6 are about 0.5% by weight.

將所製作的螢光體材料10、及銀板31,如第3 圖所示收納在密閉容器32內,與實施例1-1同樣地,進行85℃的高溫濕環境曝露試驗。參考例1-1~1-6係使用在螢光體粒子11的表面形成有由氧化鋅所成之被覆層12者作為螢光體材料10,在銀板31的表面未形成被膜者。以判斷基準而言,若所測定出的銀板31的反射率為80%以上,即設為合格,在小於80%的時點,視為銀板31的反射率明顯降低而結束試驗。將所得的結果顯示於表5。此外,反射率係另外準備作為基準的銀板,以將作為基準的銀板的反射率設為100時的相對值表示。 The produced phosphor material 10 and the silver plate 31 are as in the third As shown in the figure, in a sealed container 32, a high-temperature wet environment exposure test at 85 ° C was carried out in the same manner as in Example 1-1. In the reference examples 1-1 to 1-6, the coating material 12 made of zinc oxide is formed on the surface of the phosphor particles 11 as the phosphor material 10, and the film is not formed on the surface of the silver plate 31. In the judgment criterion, if the measured reflectance of the silver plate 31 is 80% or more, it is considered to be acceptable, and when it is less than 80%, the reflectance of the silver plate 31 is considered to be remarkably lowered, and the test is terminated. The results obtained are shown in Table 5. Further, the reflectance is additionally prepared as a reference silver plate, and is expressed as a relative value when the reflectance of the silver plate as a reference is 100.

此外,以參考例1-7而言,準備未形成有被覆 層的螢光體材料10,亦即螢光體粒子11,與參考例1-1~1-6同樣地,進行85℃的高溫濕環境曝露試驗,調查銀板31的反射率的變化。螢光體粒子11係使用與參考例1-1~1-6為相同者。參考例1-1的結果亦一併顯示於表5。 Further, in the case of Reference Examples 1-7, preparation was not formed with a coating The phosphor material 10 of the layer, that is, the phosphor particles 11, was subjected to a high-temperature wet environment exposure test at 85 ° C in the same manner as in Reference Examples 1-1 to 1-6, and the change in reflectance of the silver plate 31 was examined. The phosphor particles 11 were used in the same manner as in Reference Examples 1-1 to 1-6. The results of Reference Example 1-1 are also shown in Table 5.

如表5所示,與在螢光體粒子11未形成有被覆層12的參考例1-7相比,在形成有氧化鋅的被覆層12的參考例1-1~1-6中,反射率的降低較慢。亦即,可知若設置含有氧化鋅的被覆層12,可減小因硫化氫發生而對反射體26等周圍構件所造成的影響,且可抑制特性劣化。可知該效果係氧化鋅層的厚度愈厚愈高。 As shown in Table 5, in Reference Examples 1 to 1 to 1-6 in which the coating layer 12 of zinc oxide was formed, reflection was performed as compared with Reference Example 1-7 in which the coating layer 12 was not formed on the phosphor particles 11. The rate of decrease is slower. In other words, it is understood that when the coating layer 12 containing zinc oxide is provided, the influence of the occurrence of hydrogen sulfide on the surrounding members such as the reflector 26 can be reduced, and deterioration in characteristics can be suppressed. It can be seen that this effect is that the thicker the thickness of the zinc oxide layer, the higher the thickness.

此外,另外針對參考例1-1~1-3,1-7的螢光體材料10,進行85℃、85%RH的高溫高濕環境曝露試驗,調查亮度的經時變化。將所得的結果顯示於第4圖。在第4圖中,縱軸係將參考例1-7的初期亮度設為100時的相對亮度值。 Further, the phosphor materials 10 of Reference Examples 1-1 to 1-3 and 1-7 were subjected to a high-temperature and high-humidity environment exposure test at 85 ° C and 85% RH, and the temporal change in luminance was examined. The results obtained are shown in Fig. 4. In Fig. 4, the vertical axis indicates the relative luminance value when the initial luminance of Reference Example 1-7 is 100.

如第4圖所示,在參考例1-1~1-3中,與參考 例1-7相比,初期亮度降低,但是藉由參考例1-1、1-2,與參考例1-7相比,可使亮度維持率提升。亦即,可知若將氧化鋅層的厚度形成為500nm以下,可使亮度維持率提升,初期亮度的降低亦可抑制。 As shown in Fig. 4, in Reference Examples 1-1 to 1-3, and reference In the case of Example 1-7, the initial luminance was lowered, but by referring to Examples 1-1 and 1-2, the luminance maintenance ratio was improved as compared with Reference Example 1-7. In other words, when the thickness of the zinc oxide layer is 500 nm or less, the brightness maintenance rate can be improved, and the decrease in the initial brightness can be suppressed.

(參考例2-1) (Reference example 2-1)

除了將被覆層12形成為由二氧化矽所成之二氧化矽層、及由氧化鋅所成之氧化鋅層的2層構造以外,其他係與參考例1-1同樣地製作螢光體材料10。氧化鋅層係形成在二氧化矽層之上,二氧化矽層的厚度為約300nm、氧化鋅層的厚度為約200nm。二氧化矽層係將螢光體粒子11混合在將全氫聚矽氮烷及溶媒加以混合之含矽的前驅體溶液,進行乾燥,藉由熱處理來形成。 A phosphor material was produced in the same manner as in Reference Example 1-1, except that the coating layer 12 was formed into a two-layer structure of a cerium oxide layer made of cerium oxide and a zinc oxide layer made of zinc oxide. 10. A zinc oxide layer is formed on the ceria layer, the ceria layer has a thickness of about 300 nm, and the zinc oxide layer has a thickness of about 200 nm. In the cerium oxide layer, the phosphor particles 11 are mixed in a cerium-containing precursor solution in which perhydropolyazane and a solvent are mixed, dried, and formed by heat treatment.

針對參考例2-1的螢光體材料10,亦與參考例 1-1同樣地,進行連同銀板31一起收納在密閉容器32的85℃的高溫濕環境曝露試驗、及85℃、85%RH的高溫高濕環境曝露試驗。將所得的結果連同參考例1-1、1-7的結果一起顯示於表6及第5圖。表6的反射率係另外準備作為基準的銀板,以將作為基準的銀板的反射率設為100時的相對值表示。在第5圖中,縱軸係將參考例1-7的初期亮度設為100時的相對亮度值。 The phosphor material 10 of Reference Example 2-1 is also referred to the reference example. In the same manner, a high-temperature wet environment exposure test at 85 ° C in which the sealed container 32 was housed together with the silver plate 31 and a high-temperature and high-humidity environment exposure test at 85 ° C and 85% RH were carried out. The results obtained are shown in Tables 6 and 5 together with the results of Reference Examples 1-1 and 1-7. The reflectance of Table 6 is separately prepared as a reference silver plate, and is expressed as a relative value when the reflectance of the silver plate as a reference is 100. In Fig. 5, the vertical axis is the relative luminance value when the initial luminance of Reference Example 1-7 is set to 100.

如表6所示,藉由參考例2-1,與參考例1-1相比,可使特性大幅提升。此外,如第5圖所示,藉由參考例2-1,與參考例1-1相比,可使亮度維持率大幅提升。亦即,可知若設置包含二氧化矽層及氧化鋅的被覆層12,可更加減小因硫化氫發生而對反射體26等周圍構件所造成的影響,並且可使亮度維持率更加提升。 As shown in Table 6, with reference to Example 2-1, the characteristics were greatly improved as compared with Reference Example 1-1. Further, as shown in FIG. 5, with reference to Example 2-1, the brightness maintenance rate can be greatly improved as compared with Reference Example 1-1. In other words, it is understood that when the coating layer 12 including the cerium oxide layer and the zinc oxide is provided, the influence of the occurrence of hydrogen sulfide on the surrounding members such as the reflector 26 can be further reduced, and the brightness maintenance rate can be further improved.

以上列舉實施形態及實施例來說明本發明,惟本發明可為各種變形,而非限定於上述實施形態及實施例。例如在上述實施形態中,係具體說明發光裝置20的構成,但是亦可具有其他構成。此外,在上述實施例中,係具體調查對銀的影響,但是關於因發生硫化氫而對其他構件所造成的影響,亦可得相同的效果。 The present invention has been described with reference to the embodiments and examples, but the present invention may be variously modified and not limited to the above-described embodiments and examples. For example, in the above embodiment, the configuration of the light-emitting device 20 will be specifically described, but other configurations may be employed. Further, in the above embodiment, the influence on silver was specifically investigated, but the same effect can be obtained with respect to the influence of hydrogen sulfide on other members.

[產業上之可利用性] [Industrial availability]

可使用在LED等發光裝置。 A light-emitting device such as an LED can be used.

10‧‧‧螢光體材料 10‧‧‧Fluorescent materials

20‧‧‧發光裝置 20‧‧‧Lighting device

21‧‧‧基板 21‧‧‧Substrate

22‧‧‧發光元件 22‧‧‧Lighting elements

23‧‧‧配線 23‧‧‧ wiring

24‧‧‧導線 24‧‧‧Wire

25‧‧‧反射體框 25‧‧‧ reflector frame

26‧‧‧反射體 26‧‧‧ reflector

26a‧‧‧被膜 26a‧‧‧film

27‧‧‧密封層 27‧‧‧ Sealing layer

Claims (8)

一種發光裝置,其特徵為具備有:發光元件;將來自該發光元件的光進行反射之由銀所成之反射體;及螢光體材料,前述反射體係在至少表面的一部分具有含有氧化鋅的被膜。 A light-emitting device comprising: a light-emitting element; a reflector made of silver that reflects light from the light-emitting element; and a phosphor material, wherein the reflection system has at least a part of a surface containing zinc oxide. Membrane. 如申請專利範圍第1項之發光裝置,其中前述被膜的厚度為20nm以上1μm以下。 The light-emitting device according to claim 1, wherein the film has a thickness of 20 nm or more and 1 μm or less. 如申請專利範圍第1項之發光裝置,其中前述螢光體材料係含有由硫化物系螢光體所成之螢光體粒子。 The light-emitting device according to claim 1, wherein the phosphor material contains phosphor particles made of a sulfide-based phosphor. 如申請專利範圍第1項之發光裝置,其中前述螢光體材料係具備有:螢光體粒子、及設在該螢光體粒子的表面且含有氧化鋅的被覆層。 The light-emitting device according to the first aspect of the invention, wherein the phosphor material comprises: a phosphor particle; and a coating layer provided on the surface of the phosphor particle and containing zinc oxide. 如申請專利範圍第4項之發光裝置,其中前述被覆層中的氧化鋅層的量,以氧化鋅對螢光體粒子的重量的重量比,為0.75重量%以上30重量%以下。 The light-emitting device according to claim 4, wherein the amount of the zinc oxide layer in the coating layer is 0.75% by weight or more and 30% by weight or less based on the weight ratio of the zinc oxide to the weight of the phosphor particles. 如申請專利範圍第4項之發光裝置,其中前述被覆層係具有由氧化鋅所成之氧化鋅層。 The light-emitting device of claim 4, wherein the coating layer has a zinc oxide layer formed of zinc oxide. 如申請專利範圍第6項之發光裝置,其中前述氧化鋅層的厚度為30nm以上1μm以下。 The light-emitting device of claim 6, wherein the zinc oxide layer has a thickness of 30 nm or more and 1 μm or less. 如申請專利範圍第6項之發光裝置,其中前述被覆層進一步具有由二氧化矽所成之二氧化矽層。 The illuminating device of claim 6, wherein the coating layer further has a cerium oxide layer formed of cerium oxide.
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