TW201413045A - A chemical vapor deposition method of exhaust gas recycling method for metal organic - Google Patents
A chemical vapor deposition method of exhaust gas recycling method for metal organic Download PDFInfo
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- TW201413045A TW201413045A TW101135523A TW101135523A TW201413045A TW 201413045 A TW201413045 A TW 201413045A TW 101135523 A TW101135523 A TW 101135523A TW 101135523 A TW101135523 A TW 101135523A TW 201413045 A TW201413045 A TW 201413045A
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Abstract
Description
本發明係有關於一種廢氣回收再利用方法，尤其是有關於一種利用氨氣溶解度大之特性可溶解於水中與其他廢氣進行分離後，再經由氣化、加熱以及壓縮降溫之流程，而能達到有機金屬化學氣相沉積法之廢氣回收再利用之目的。
The invention relates to a method for recycling and recycling waste gas, in particular to a process for utilizing the characteristics of large solubility of ammonia gas, which can be dissolved in water and separated from other exhaust gases, and then cooled by gasification, heating and compression. The purpose of waste gas recovery and reuse by organometallic chemical vapor deposition.
有機金屬化學氣相沉積法是當今最先進、最重要的氮化鎵材料和器件大批量製備技術，隨著它的出現，藍色發光材料的製作成本逐漸降低；其係主要使用在LED以及DVD雷射二極體、光通訊雷射二極體、紅藍綠發光二極體、太陽能電池、或是手機通訊射頻晶片的射頻積體電路等處。然而其所產生的廢氣目前均是透過廢氣系統吸附及處理所有通過系統的有毒氣體，以減少對環境的污染。常用的廢氣處理系統可分為乾式、濕式及燃燒式等種類。雖可有效處理有毒廢氣，卻無法使廢氣中可用氣體回收再利用。
因此，如何提供一可有效回收有機金屬化學氣相沉積法之廢氣，並達到循環再利用之環保目的，是發明人亟欲解決之課題。
Organometallic chemical vapor deposition is the most advanced and important GaN material and device mass preparation technology. With its emergence, the cost of blue luminescent materials is gradually reduced. The system is mainly used in LED and DVD. A laser diode, an optical communication laser diode, a red-blue-green LED, a solar cell, or a radio frequency integrated circuit of a mobile communication RF chip. However, the exhaust gas generated by it is currently adsorbing and treating all toxic gases passing through the system through the exhaust system to reduce environmental pollution. Commonly used exhaust gas treatment systems can be classified into dry, wet and combustion types. Although it can effectively treat toxic waste gas, it cannot recycle the available gas in the exhaust gas.
Therefore, how to provide an environmentally-friendly waste gas that can effectively recover the organic metal chemical vapor deposition method and achieve recycling is an object that the inventors are eager to solve.
有鑑於習知有機金屬化學氣相沉積法之廢氣處理法仍存在有不完善處，發明人經長時間不斷的研究開發，終於研發出此種可以回收生產氨氣以及工業用液氨之廢氣回收再生方法。
本發明有機金屬化學氣相沉積法之廢氣回收再生方法，其步驟包括：(A)將有機金屬化學氣相沉積法(MOCVD)所產生之廢氣導入至水中；(B)將含有有機金屬化學氣相沉積法之廢氣之水降溫，以保存於水中之氨氣，去除雜質；以及(C)將前述含有氨氣之水進行升溫使氨氣逸出。
本發明之主要目的在於藉藉由上述之方法，可將有機金屬化學氣相沉積法製程之廢氣去除氮氣、氫氣以及甲烷等雜質後回收生產成可用氨氣，達到廢氣循環再使用之目的。
除此之外，本發明可於步驟(C)後將所得之氨氣進行壓縮降溫，更可進一步得到工業用所需之液氨，使其更具有經濟價值。
為了能讓審查員能更易於了解本發明之特點，請參閱本發明實施方式之說明。
In view of the imperfections in the exhaust gas treatment method of the conventional organometallic chemical vapor deposition method, the inventors have finally developed and researched and developed the exhaust gas for the recovery of ammonia gas and industrial liquid ammonia. Regeneration method.
The method for recovering and recycling an exhaust gas of the organometallic chemical vapor deposition method of the present invention comprises the steps of: (A) introducing an exhaust gas generated by an organic metal chemical vapor deposition (MOCVD) into water; and (B) containing an organic metal chemical gas. The water of the exhaust gas of the phase deposition method is cooled to remove ammonia by the ammonia gas stored in the water; and (C) the water containing the ammonia gas is heated to cause the ammonia gas to escape.
The main object of the present invention is to remove the impurities such as nitrogen, hydrogen and methane from the exhaust gas of the organometallic chemical vapor deposition process by the above method, and then recover the available ammonia gas to achieve the purpose of recycling the exhaust gas.
In addition, the present invention can compress and cool the obtained ammonia gas after the step (C), and further obtain liquid ammonia required for industrial use, thereby making it more economical.
In order to make it easier for the examiner to understand the features of the present invention, please refer to the description of the embodiments of the present invention.
請同時參閱圖一以及圖二，圖一係為本發明有機金屬化學氣相沉積法之廢氣回收再生方法流程圖，圖二係為本發明有機金屬化學氣相沉積法之廢氣回收再生方法之氨水濃度表。本發明有機金屬化學氣相沉積法之廢氣回收再生方法，其步驟包括：(A)將有機金屬化學氣相沉積法(MOCVD)所產生之廢氣導入至水中；(B)將含有有機金屬化學氣相沉積法之廢氣之水降溫，以保存於水中之氨氣，去除雜質；以及(C)將前述含有氨氣之水進行升溫使氨氣逸出；藉由上述之方法，可將有機金屬化學氣相沉積法製程之廢氣去除氮氣、氫氣以及甲烷等雜質後回收生產成可用氨氣，達到廢氣循環再使用之目的。
本發明有機金屬化學氣相沉積法之廢氣回收再生方法，可於步驟(C)後再增加步驟(D)，其係為將步驟(C)逸出之氨氣進行壓縮以及降溫，用以得到工業級之液氨。
以上所述僅是藉由較佳實施例詳細說明本發明，然而對於該實施例所作的任何修改與變化，例如水降溫或氣體壓縮設備之數量以及種類等等之變化均不脫離本發明之精神與範圍。
由以上詳細說明可使熟知本項技藝者明瞭本發明的確可達成前述之目的，實已符合專利法之規定，爰依法提出發明專利申請。
Please refer to FIG. 1 and FIG. 2 simultaneously. FIG. 1 is a flow chart of an exhaust gas recovery and regeneration method of the organic metal chemical vapor deposition method of the present invention, and FIG. 2 is an ammonia water of the waste gas recovery and regeneration method of the organic metal chemical vapor deposition method of the present invention. Concentration table. The method for recovering and recycling an exhaust gas of the organometallic chemical vapor deposition method of the present invention comprises the steps of: (A) introducing an exhaust gas generated by an organic metal chemical vapor deposition (MOCVD) into water; and (B) containing an organic metal chemical gas. The water of the exhaust gas of the phase deposition method is cooled to remove the impurities by the ammonia gas stored in the water; and (C) the ammonia gas is heated to cause the ammonia gas to escape; by the above method, the organic metal chemistry can be The exhaust gas of the vapor deposition process removes impurities such as nitrogen, hydrogen and methane, and then recovers the usable ammonia gas to achieve the purpose of recycling the exhaust gas.
In the method for recovering and regenerating the exhaust gas of the organometallic chemical vapor deposition method of the present invention, the step (D) may be further added after the step (C), wherein the ammonia gas escaping from the step (C) is compressed and cooled to obtain Industrial grade liquid ammonia.
The above description is only intended to explain the present invention in detail by the preferred embodiments, however, any modifications and variations to the embodiments, such as variations in the number and type of water cooling or gas compression devices, etc., do not depart from the spirit of the invention. With scope.
From the above detailed description, those skilled in the art can understand that the present invention can achieve the foregoing objects, and has already met the requirements of the Patent Law, and has filed an invention patent application according to law.
10．．．(A)將有機金屬化學氣相沉積法所產生之廢氣導入至水中10. . . (A) introducing waste gas generated by organometallic chemical vapor deposition into water
20．．．(B)將含有有機金屬化學氣相沉積法之廢氣之水降溫，以保存於水中之氨氣，去除雜質20. . . (B) cooling the water containing the exhaust gas of the organometallic chemical vapor deposition method to store the ammonia gas in the water to remove impurities
30．．．(C)將前述含有氨氣之水進行升溫使氨氣逸出30. . . (C) heating the aforementioned ammonia-containing water to make the ammonia escape
40．．．(D)將步驟(C)逸出之氨氣進行壓縮以及降溫40. . . (D) compressing and cooling the ammonia gas escaped in step (C)
圖一 係為本發明有機金屬化學氣相沉積法之廢氣回收再生方法之流程圖
圖二 係為本發明有機金屬化學氣相沉積法之廢氣回收再生方法之氨水濃度表
1 is a flow chart of an exhaust gas recovery and regeneration method of the organometallic chemical vapor deposition method of the present invention. FIG. 2 is an ammonia water concentration table of an exhaust gas recovery and regeneration method of the organic metal chemical vapor deposition method of the present invention.
10．．．(A)將有機金屬化學氣相沉積法所產生之廢氣導入至水中10. . . (A) introducing waste gas generated by organometallic chemical vapor deposition into water
20．．．(B)將含有有機金屬化學氣相沉積法之廢氣之水降溫，以保存於水中之氨氣，去除雜質20. . . (B) cooling the water containing the exhaust gas of the organometallic chemical vapor deposition method to store the ammonia gas in the water to remove impurities
30．．．(C)將前述含有氨氣之水進行升溫使氨氣逸出30. . . (C) heating the aforementioned ammonia-containing water to make the ammonia escape
40．．．(D)將步驟(C)逸出之氨氣進行壓縮以及降溫40. . . (D) compressing and cooling the ammonia gas escaped in step (C)
Claims (2)
(A)將有機金屬化學氣相沉積法所產生之廢氣導入至水中；
(B)將含有有機金屬化學氣相沉積法之廢氣之水降溫，以保存於水中之氨氣，去除雜質；以及
(C)將前述含有氨氣之水進行升溫使氨氣逸出；
藉由上述之方法，可將有機金屬化學氣相沉積法製程之廢氣去除氮氣、氫氣以及甲烷等雜質後回收生產成可用氨氣，達到廢氣循環再使用之目的。An exhaust gas recovery and regeneration method of an organometallic chemical vapor deposition method, the steps comprising:
(A) introducing an exhaust gas generated by an organometallic chemical vapor deposition method into water;
(B) cooling the water containing the exhaust gas of the organometallic chemical vapor deposition method to store the ammonia gas in the water to remove impurities;
(C) heating the aforementioned ammonia-containing water to cause the ammonia gas to escape;
By the above method, impurities such as nitrogen, hydrogen and methane can be removed from the exhaust gas of the organometallic chemical vapor deposition process, and then recovered into an usable ammonia gas to achieve the purpose of recycling and reuse of the exhaust gas.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101135523A TW201413045A (en) | 2012-09-27 | 2012-09-27 | A chemical vapor deposition method of exhaust gas recycling method for metal organic |
| CN201210528111.0A CN103691255A (en) | 2012-09-27 | 2012-12-10 | Waste gas recovery and regeneration method of organic metal chemical vapor deposition method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101135523A TW201413045A (en) | 2012-09-27 | 2012-09-27 | A chemical vapor deposition method of exhaust gas recycling method for metal organic |
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| TW201413045A true TW201413045A (en) | 2014-04-01 |
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| TW101135523A TW201413045A (en) | 2012-09-27 | 2012-09-27 | A chemical vapor deposition method of exhaust gas recycling method for metal organic |
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| TW (1) | TW201413045A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1085555C (en) * | 1999-12-01 | 2002-05-29 | 上海交通大学 | Equipment and method to exhaust nitridation waste gas and recover residual ammonia |
| JP4062710B2 (en) * | 2003-12-03 | 2008-03-19 | 大陽日酸株式会社 | Method and apparatus for purifying ammonia |
| CN101397144B (en) * | 2007-10-22 | 2010-05-26 | 贵州赤天化股份有限公司 | Method for absorbing ammonia by cooling down of high pressure shift temperature water from stripping urea plant |
| CN201599989U (en) * | 2010-01-28 | 2010-10-06 | 吕瑞强 | Residual heat collecting device of ammonia refrigerating system |
| CN101816841B (en) * | 2010-05-17 | 2012-01-04 | 赣州华兴钨制品有限公司 | Method for recovering ammonia nitrogen from ammonia-containing steam |
| CN202055878U (en) * | 2010-12-31 | 2011-11-30 | 杨学军 | Industrial exhaust heat power generation system |
| CN202254527U (en) * | 2011-08-22 | 2012-05-30 | 山东蓝星东大化工有限责任公司 | Ammonia gas emission, recovery and utilization system |
| CN102671515A (en) * | 2012-06-13 | 2012-09-19 | 北京烨晶科技有限公司 | System for separating ammonia and carbon dioxide mixed gas |
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- 2012-09-27 TW TW101135523A patent/TW201413045A/en unknown
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