TW201405936A - Chip antenna and manufacturing method thereof - Google Patents
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本發明係涉及一種天線;特別是指一種晶片型天線結構及其製造方法的創新設計。 The present invention relates to an antenna; and more particularly to an innovative design of a wafer type antenna structure and a method of fabricating the same.
按,通訊設備已是現代人生活中不可或缺的輔助工具,各種通訊設備要達到其訊息傳遞之目的,天線是至關重要的單元構件,而隨著通訊設備的小型化發展趨勢,以及各類通訊產品對於外在美觀性的要求,使得隱藏式天線成為新產品的開發趨勢;而欲將一些結構較為複雜的天線安裝在空間狹窄有限的通訊設備結構中,則天線的微型化設計顯然是有必要的,為此遂有相關業界研發出一些微型天線以為因應。 According to the communication equipment, it is an indispensable auxiliary tool in the life of modern people. For all kinds of communication equipment to achieve the purpose of message transmission, the antenna is a vital unit component, and with the development trend of miniaturization of communication equipment, The requirement of external communication for the communication products makes the hidden antenna become the development trend of new products. However, if some antennas with more complicated structures are to be installed in the structure of communication equipment with limited space, the miniaturization design of the antenna is obviously It is necessary, for this reason, some related micro-antennas have been developed by the relevant industry.
然而,所述微型天線固然因為結構微小化而能夠適應於空間狹窄有限的通訊設備結構中,但其它方面卻仍舊存在未盡完善之處,例如製造成本、製程良率與效率等方面,習知微型天線往往因為其結構型態及製造方法的設計缺失而存在問題;舉例而言,習知微型天線於其天線主體(即接地部、輻射部及饋入部)製造成型後,通常必須再通過一道焊接工序進行饋入線與饋入部的結合,然而,由於此一工序的增加,相對造成製造的成本、良率與效率等多方面的負面影響;換言之,習知微型天線仍受限其結構型態及製造方法的設計,導致其無法採用比較簡易高效率的製程技術(如表面黏著技術,簡稱SMT)來達成,此實為有必要再加以思索突破的技術課題。 However, although the micro-antenna can be adapted to a communication device structure with limited space due to the miniaturization of the structure, other aspects still have some imperfections, such as manufacturing cost, process yield and efficiency, etc. Micro-antennas often have problems due to the lack of design of their structural types and manufacturing methods; for example, conventional micro-antennas must be passed through a common body (ie, the grounding portion, the radiating portion, and the feeding portion) after molding. The welding process combines the feed line and the feed portion. However, due to the increase of this process, it has a negative impact on manufacturing cost, yield and efficiency. In other words, the conventional micro antenna is still limited in its structural form. The design of the manufacturing method has made it impossible to adopt a relatively simple and efficient process technology (such as surface adhesion technology, referred to as SMT), which is a technical issue that needs to be considered again.
是以,針對上述習知天線所存在之問題點,如何研發出一種能夠更具理想實用性之創新設計,實有待相關業界再加以思索突破之目標及方向。 Therefore, in view of the problems existing in the above-mentioned conventional antennas, how to develop an innovative design that can be more ideal and practical, and the relevant industry should further consider the goal and direction of breakthrough.
有鑑於此,發明人本於多年從事相關產品之製造開發與設計經驗,針對上述之目標,詳加設計與審慎評估後,終得一確具實用性之本發明。 In view of this, the inventor has been engaged in the manufacturing development and design experience of related products for many years. After detailed design and careful evaluation, the inventor has finally obtained the practical invention.
本發明之主要目的,係在提供一種晶片型天線及其製造方法,其所欲解決之問題點,係針對如何研發出一種更具理想實用性之新式晶片型天線結構及其製造方法為目標加以思索創新突破;本發明解決問題之技術特點,係在提供一種晶片型天線,其主要包括:一印刷電路載體,為板狀或塊狀型態的絕緣體所構成,包括表面、著置面及立向銜接於表面與著置面周邊之間的側向面;至少一立體曲折狀輻射層,結合成型於印刷電路載體的至少表面與側向面,該立體曲折狀輻射層包括:蝕刻成型表面區段,結合於印刷電路載體表面;至少二立向連結區段,為塗佈導電體成型之態樣立向結合於印刷電路載體的表面與著置面之間,且立向連結區段上端與蝕刻成型表面區段連結;跨越雙面向的饋入焊接部,由其中一立向連結區段臨近著置面之端部區域,以及自該端部區域連結轉向延伸至著置面的一饋入底層所形成,構成饋入焊接部係跨越涵蓋雙面向的型態;跨越雙面向的接地焊接部,係由另其中一立向連結區段臨近著置面之端部區段,以及自該端部區段連結轉向延伸至著置面的一接地底層所形成,構成接地焊接部係跨越涵蓋雙面向的型 態;藉此創新獨特設計,使本發明對照先前技術而言,該晶片型天線能夠藉其印刷電路載體的著置面著置於一電路基板上,復令其饋入焊接部、接地焊接部與電路基板預設的饋入電路、接地電路相對位靠合,俾可通過表面黏著技術進行該晶片型天線與電路基板的電性結合,並能省去饋入線的焊接製程,達到簡化製程工序、提高良率、降低成本等實用進步性與較佳產業經濟效益。 The main object of the present invention is to provide a wafer type antenna and a manufacturing method thereof, and the problem to be solved is to aim at how to develop a new type of wafer antenna structure and a manufacturing method thereof which are more ideal and practical. Thinking about the innovation breakthrough; the technical feature of the problem solving of the present invention is to provide a wafer type antenna, which mainly comprises: a printed circuit carrier, which is composed of a plate-shaped or block-shaped insulator, including a surface, a facing surface and a standing a laterally facing surface between the surface and the periphery of the facing surface; at least one three-dimensional meandering radiating layer is combined and formed on at least a surface and a lateral surface of the printed circuit carrier, the three-dimensional meandering radiation layer comprising: an etched surface area a segment bonded to the surface of the printed circuit carrier; at least two vertical connecting segments are formed to be vertically coupled between the surface of the printed circuit carrier and the facing surface for forming the coated conductor, and the upper end of the vertical connecting portion is The etched surface section is joined; the feed weld is spanned across the double face, and an end portion of the directional joint is adjacent to the end region of the face, and from the end The regional connection is formed by a feed-in bottom layer extending to the facing surface, and the feed-welding portion is formed to span the double-faced configuration; the double-faced ground-welded portion is formed by another one of the vertical joint sections. Forming an end portion adjacent to the surface and a grounding layer extending from the end portion to the ground surface to form a grounded welded portion spanning the double-faced type With this innovative and unique design, the present invention can be placed on a circuit substrate by the surface of the printed circuit carrier, and is fed to the soldering portion and the grounding soldering portion. The board is matched with the preset feeding circuit and the grounding circuit of the circuit board, and the surface bonding technology can electrically combine the wafer antenna and the circuit board, and the welding process of the feeding line can be omitted, thereby simplifying the process. Improve practical yield and better industrial economic benefits such as improving yield and reducing costs.
本發明之另一目的,係更提供一種晶片型天線製造方法,其主要包括:製備板狀或塊狀的絕緣基材,該絕緣基材包括表面及著置面;藉由一蝕刻成型手段於絕緣基材表面形成一立體曲折狀輻射層的至少一蝕刻成型表面區段;並於絕緣基材的著置面至少形成間隔分佈的饋入底層及接地底層;藉由一鑽孔手段於印刷電路載體形成貫通表面與著置面的至少二穿孔,且令所述穿孔連通蝕刻成型表面區段與饋入底層、接地底層;於所述穿孔中填入一導電材料並使其硬化結合定型於穿孔的整體孔壁表面;藉由一切割手段自所述穿孔位置進行絕緣基材的邊形切割步驟,以獲得至少一印刷電路載體,所述印刷電路載體具有立向銜接於該表面與著置面周邊之間的側向面;藉此,連通蝕刻成型表面區段與饋入底層的穿孔中所結合定型的導電材料,係構成該立體曲折狀輻射層的其中一立向連結區段,且其臨近著置面的端部區域係與饋入底層共同形成一跨越雙面向的饋入焊接部;該連通蝕刻成型表面區段與接地底層的穿孔中所結合定型的導電材料,則構成該立體曲折狀輻射層的另一立向連結區段,且其臨近著置面的端部區段係與饋入接地底層共同形成一跨越雙面向的接地焊接部。 Another object of the present invention is to provide a method for manufacturing a wafer type antenna, which mainly comprises: preparing a plate-like or block-shaped insulating substrate, the insulating substrate comprising a surface and a facing surface; Forming at least one etched surface portion of the three-dimensional meandering radiation layer on the surface of the insulating substrate; and forming at least a gap-shaped feed bottom layer and a ground bottom layer on the surface of the insulating substrate; The carrier forms at least two perforations of the through surface and the facing surface, and the through hole is connected to the etched surface portion and the feed bottom layer and the ground bottom layer; a conductive material is filled in the through hole and hardened and shaped to be perforated The entire hole wall surface; the edge cutting step of the insulating substrate is performed from the punching position by a cutting means to obtain at least one printed circuit carrier having the vertical direction of the surface and the facing surface a lateral surface between the perimeters; thereby, the conductive material bonded to the perforations fed into the bottom layer is connected to form a three-dimensional meandering spoke One of the vertical joining sections of the layer, and the end region adjacent to the facing surface forms a feed-welding portion spanning the double face together with the feed bottom layer; the communicating etched surface section and the grounding bottom layer are perforated The electrically conductive material combined with the shaping constitutes another vertical connecting section of the three-dimensional meandering radiating layer, and the end section adjacent to the facing surface forms a spanning double-faced joint with the feeding grounded bottom layer. Ground welding part.
請參閱第1至6圖所示,係本發明晶片型天線及其製造方法之較佳實施例,惟此等實施例僅供說明之用,在專利申請上並不受此結構之限制;所述晶片型天線A係包括下述構成:一印刷電路載體10,為板狀或塊狀型態的絕緣體所構成,包括一表面11、一著置面12以及立向銜接於該表面11與著置面12周邊之間的側向面13;至少一立體曲折狀輻射層20,結合成型於印刷電路載體10的至少表面11與側向面13,該立體曲折狀輻射層20包括:蝕刻成型表面區段21,為蝕刻成型態樣結合於印刷電路載體10的表面11;至少二立向連結區段221、223,為塗佈導電體成型之態樣立向結合於印刷電路載體10的表面11與著置面12之間,且該立向連結區段221、223上端係與蝕刻成型表面區段21連結;其中該立向連結區段221、223可為設於印刷電路載體10的側向面13呈凹溝面型態或平面型態;其中所述凹溝面型態包含圓弧形斷面態樣、長形斷面態樣;此如第1圖所揭立向連結區段221、223,即為設於印刷電路載體10的側向面13且呈圓弧形斷面凹溝面型態的實施態樣;一跨越雙面向的饋入焊接部23,係由其中一立向連結區段221臨近著置面12之端部區域231,以及自該端部區域231連結轉向延伸至著置面12的一饋入底層232所形成,構成該饋入焊接部23係跨越涵蓋雙面向的型態(詳如第5圖所示);一跨越雙面向的接地焊接部24,係由另其中一立向連結區段223臨近著置面12之端部區段241,以及自該端部 區段241連結轉向延伸至著置面12的一接地底層242所形成,構成該接地焊接部24係跨越涵蓋雙面向的型態(詳如第6圖所示);藉由上述結構組成設計,如第7圖所示,該晶片型天線A能夠藉其印刷電路載體10的著置面12著置於一電路基板30上,復令其饋入焊接部23、接地焊接部24與電路基板30預設的饋入電路31、接地電路32相對位靠合,俾可通過表面黏著技術進行該晶片型天線A與電路基板30的電性結合作業,並能省去饋入線的焊接製程。其中所述表面黏著技術亦稱為表面貼裝技術(Surface Mount Technology,簡稱SMT),係將精密化IC、電阻、電容、電感等等半導體零件放置並迴焊定位於印刷電路板(PCB)上的一種技術,而採用此SMT的好處,是能夠讓電子產品小型化且生產速度加快,其透過錫爐熱溶的方式直接與電路基板結合,不需透過人工組裝,可大幅降低工時成本,故相較於傳統習知插件生產機器而言能夠提高速度與品質,不良率可有效降低。 1 to 6 are preferred embodiments of the wafer type antenna of the present invention and a method of manufacturing the same, but the embodiments are for illustrative purposes only and are not limited by the structure in the patent application; The wafer-type antenna A includes a printed circuit carrier 10 which is formed of a plate-shaped or block-shaped insulator, and includes a surface 11 , a facing surface 12 , and a vertical connection to the surface 11 . a lateral surface 13 between the periphery of the surface 12; at least one three-dimensional meandering radiation layer 20 is integrally formed on at least the surface 11 and the lateral surface 13 of the printed circuit carrier 10, the three-dimensional meandering radiation layer 20 comprising: an etched surface The segment 21 is bonded to the surface 11 of the printed circuit carrier 10 in an etched molding state; at least two vertical connecting portions 221 and 223 are vertically bonded to the surface of the printed circuit carrier 10 in a state in which the coated conductor is molded. 11 is disposed between the facing surface 12 and the upper ends of the vertical connecting sections 221 and 223 are coupled to the etched molding surface section 21; wherein the vertical connecting sections 221 and 223 are disposed on the side of the printed circuit carrier 10 The face 13 has a grooved surface pattern or a planar pattern; wherein The groove surface pattern includes a circular arc-shaped cross-sectional aspect and an elongated cross-sectional aspect; the vertical connecting sections 221 and 223 as shown in FIG. 1 are the lateral faces 13 provided on the printed circuit carrier 10. And the embodiment of the arc-shaped cross-sectional groove surface type; the feed-welding portion 23 spanning the double-face is formed by one of the vertical connecting sections 221 adjacent to the end region 231 of the facing surface 12, And a feed-in bottom layer 232 that is coupled to the end surface region 231 and extends to the facing surface 12, and the feed-welding portion 23 is formed to span a double-faceted configuration (as shown in FIG. 5); A double-faceted grounding weld 24 is adjacent to the end section 241 of the facing surface 12 from the other of the vertical joint sections 223, and from the end The section 241 is coupled to a grounding layer 242 extending to the facing surface 12, and the grounding soldering portion 24 is formed to span a double-faced configuration (as shown in FIG. 6); As shown in FIG. 7, the wafer type antenna A can be placed on a circuit substrate 30 by the surface 12 of the printed circuit carrier 10, and is fed back to the soldering portion 23, the ground soldering portion 24, and the circuit substrate. 30 The predetermined feeding circuit 31 and the grounding circuit 32 are oppositely arranged, and the electrical bonding operation between the wafer type antenna A and the circuit substrate 30 can be performed by the surface adhesion technology, and the welding process of the feeding line can be omitted. The surface mount technology, also known as Surface Mount Technology (SMT), places and repositions semiconductor components such as precision ICs, resistors, capacitors, inductors, etc. on a printed circuit board (PCB). One of the technologies, the advantage of using this SMT is that it can miniaturize electronic products and speed up production. It can be directly combined with the circuit board through the hot melt of the tin furnace, without manual assembly, which can greatly reduce the labor cost. Therefore, compared with the conventional conventional plug-in production machine, the speed and quality can be improved, and the defect rate can be effectively reduced.
本發明中所述跨越雙面向型態的饋入焊接部23與接地焊接部24之優點,主要是進行所述SMT製程時,熔融的焊料除了能夠結合於著置面12的饋入底層232、接地底層242之外,更能被向上吸引延伸至立向連結區段221、223的端部區域231、端部區段241,藉此而能獲得極佳的電性連結與牢固定位效果。 The advantages of the feed-welding portion 23 and the ground-welding portion 24 across the double-faceted configuration in the present invention are mainly that the molten solder can be bonded to the bottom layer 232 of the placement surface 12 when the SMT process is performed. In addition to the grounding layer 242, the end region 231 and the end portion 241 of the vertical connecting sections 221 and 223 can be further attracted upward, thereby obtaining excellent electrical connection and firm positioning effect.
其中,該印刷電路載體10可為單體設置型態或複數個堆疊設置型態者;其中呈複數個堆疊設置型態時,相堆疊的印刷電路載體10之間係可藉由蝕刻成型的表層達成導電連結狀態。 The printed circuit carrier 10 can be in a single-set configuration or a plurality of stacked configurations; wherein, in a plurality of stacked configurations, the phase-stacked printed circuit carriers 10 can be formed by etching. A conductive connection state is achieved.
請配合參照第1、2圖所示,該立體曲折狀輻射層20更可包括以蝕刻成型態樣結合於印刷電路載體10著置面12 的底部輻射區段25,且該底部輻射區段25係藉由印刷電路載體10相對應側向面所設立向連結區段22B與蝕刻成型表面區段21相連結。 Referring to FIGS. 1 and 2, the three-dimensional meandering radiation layer 20 may further include an etched molding surface bonded to the printed circuit carrier 10. The bottom radiating section 25 is coupled to the etched surface section 21 by the corresponding lateral faces of the printed circuit carrier 10 to the joining section 22B.
請配合參照第1至6圖所示,該印刷電路載體10並可設有單一或複數個間隔排列設置且貫穿表面11與著置面12的導電穿孔40,該導電穿孔40的整體孔壁表面係結合有導電層41,又該導電穿孔40的上端係與立體曲折狀輻射層20的蝕刻成型表面區段21連結,導電穿孔40的下端則與饋入底層232、接地底層242或底部輻射區段25至少其中一者連結。所述導電穿孔40可視為一金屬化通孔(Plated Through Hole,簡稱PTH),其複數間隔排列的導電穿孔40結構型態,量產時可作為請相關廠商裁切不同規格的參考點位,藉此而能靈活因應客戶端多元需求。 Referring to FIGS. 1 to 6, the printed circuit carrier 10 may be provided with a single or a plurality of electrically conductive perforations 40 arranged at intervals and extending through the surface 11 and the facing surface 12, the entire aperture wall surface of the conductive via 40 The conductive layer 41 is bonded, and the upper end of the conductive via 40 is connected to the etched surface portion 21 of the three-dimensional meandering radiating layer 20, and the lower end of the conductive via 40 is fed to the bottom layer 232, the ground layer 242 or the bottom radiation region. At least one of the segments 25 is linked. The conductive via 40 can be regarded as a plated through hole (PTH), and the conductive perforations 40 are arranged at a plurality of intervals, and can be used as a reference point for cutting different specifications by the relevant manufacturer during mass production. In this way, it can flexibly respond to the diverse needs of the client.
接著,再就本發明晶片型天線的製造方法說明如下,係包括:(請配合參第8圖所示)1、如第8圖之(a)所示,製備板狀或塊狀型態的絕緣基材10B,該絕緣基材10B包括一表面11及一著置面12;2、如第8圖之(b)所示,藉由一蝕刻成型手段,於絕緣基材10B的表面11形成一立體曲折狀輻射層20的至少一蝕刻成型表面區段21;並於絕緣基材10B的著置面12至少形成間隔分佈的饋入底層232及接地底層242;3、如第8圖之(c)所示,藉由一鑽孔手段50,於該絕緣基材10B形成貫通表面11與著置面12的至少二穿孔40B,且令所述穿孔40B係連通蝕刻成型表面區段21與饋入底層232、接地底層242;4、如第8圖之(d)所示,於所述穿孔40B中填入一導 電材料41B並使其硬化結合定型於穿孔40B的整體孔壁表面;5、如第8圖之(e)所示,藉由一切割手段60,自所述穿孔40B位置進行絕緣基材的邊形切割步驟,以獲得至少一印刷電路載體10,如第8圖之(f)所示,所述印刷電路載體10具有立向銜接於該表面11與著置面12周邊之間的側向面13;藉此,該連通蝕刻成型表面區段21與饋入底層的穿孔40B中所結合定型的導電材料41B,係構成該立體曲折狀輻射層20的其中一立向連結區段221,且其臨近著置面12的端部區域係與饋入底層232共同形成一跨越雙面向的饋入焊接部23(請配合參閱第1、2、5、6圖);該連通蝕刻成型表面區段21與接地底層242的穿孔40B中所結合定型的導電材料41B,則構成該立體曲折狀輻射層20的另一立向連結區段223,且其臨近著置面12的端部區段係與接地底層242共同形成一跨越雙面向的接地焊接部24(請配合參閱第1、2、5、6圖)。 Next, the method for manufacturing the wafer antenna of the present invention will be described as follows: (please refer to FIG. 8) 1. As shown in FIG. 8(a), a plate or block type is prepared. The insulating substrate 10B includes a surface 11 and a facing surface 12; 2. As shown in FIG. 8(b), the surface 11 of the insulating substrate 10B is formed by an etching forming means. At least one etched surface portion 21 of a three-dimensional meandering radiation layer 20; and at least a gap-shaped feed bottom layer 232 and a ground bottom layer 242 are formed on the face 12 of the insulating substrate 10B; 3. As shown in FIG. 8 ( c), by means of a drilling means 50, at least two through holes 40B are formed in the insulating substrate 10B for the through surface 11 and the facing surface 12, and the perforations 40B are connected to the etched surface section 21 and the feed Into the bottom layer 232, the grounding bottom layer 242; 4, as shown in Figure 8 (d), fill the perforation 40B with a guide The electric material 41B is hardened and bonded to the surface of the entire hole wall of the through hole 40B; 5. As shown in FIG. 8(e), the edge of the insulating substrate is made from the position of the through hole 40B by a cutting means 60. Forming a step of obtaining at least one printed circuit carrier 10, as shown in FIG. 8(f), the printed circuit carrier 10 having a lateral face that is vertically engaged between the surface 11 and the periphery of the face 12 13; thereby, the conductive etching surface portion 21 and the conductive material 41B combined in the through hole 40B fed into the bottom layer constitute one of the vertical connecting sections 221 of the three-dimensional meandering radiation layer 20, and The end region adjacent to the face 12 is combined with the feed bottom layer 232 to form a feed weld 23 that spans the double face (please refer to Figures 1, 2, 5, and 6); the interconnected etched surface section The electrically conductive material 41B, which is formed in the perforation 40B of the grounding layer 242, forms another vertical connecting section 223 of the three-dimensional meandering radiating layer 20, and is adjacent to the end section of the facing surface 12. The grounding bottom layer 242 together form a grounding soldering portion 24 that spans the double facing (please refer to the first Figure 2,5,6).
另如第9圖所示,係該立體曲折狀輻射層20的立向連結區段221、223為設於印刷電路載體10的側向面13且呈長形斷面凹溝面型態的實施態樣。又如第10圖所揭立向連結區段221、223,則為設於印刷電路載體10的側向面13呈平面型態的實施態樣。 Further, as shown in FIG. 9, the vertical connecting sections 221 and 223 of the three-dimensional meandering radiating layer 20 are formed on the lateral surface 13 of the printed circuit board 10 and have a long-shaped concave groove surface type. Aspect. Further, as shown in Fig. 10, the vertical connecting sections 221 and 223 are formed in a planar state in which the lateral surface 13 of the printed circuit board 10 is formed.
再如第11圖所示,本圖中,該立體曲折狀輻射層20的立向連結區段221、223係藉由貫穿表面11與著置面12的導電透孔225所構成,令該導電透孔225上端與立體曲折狀輻射層20的蝕刻成型表面區段21連結,導電透孔225下端則與饋入底層232、接地底層242連結;本例係用以說明該立向連結區段221、223除了可為前述外露於側向面13的型態之外,亦可穿孔式隱藏型態者。 Further, as shown in FIG. 11, in the figure, the vertical connecting sections 221 and 223 of the three-dimensional meandering radiating layer 20 are formed by the conductive through holes 225 penetrating the surface 11 and the facing surface 12, so that the conductive The upper end of the through hole 225 is connected to the etched surface portion 21 of the three-dimensional meandering radiation layer 20, and the lower end of the conductive through hole 225 is connected to the feed bottom layer 232 and the ground bottom layer 242. This example is used to illustrate the vertical joint portion 221 In addition to the above-mentioned form of being exposed to the lateral surface 13, the 223 may also be a perforated hidden type.
本發明所揭「晶片型天線及其製造方法」對照【先前技術】所提習知技術而言,係令晶片型天線能夠藉其印刷電路載體的著置面著置於一電路基板上,復令其饋入焊接部、接地焊接部與電路基板預設的饋入電路、接地電路相對位靠合,俾可通過表面黏著技術進行該晶片型天線與電路基板的電性結合,並能省去饋入線的焊接製程,達到簡化製程工序、提高良率、降低成本等實用進步性與較佳產業經濟效益。 According to the prior art of the prior art, the wafer type antenna can be placed on a circuit substrate by the surface of the printed circuit carrier. The feeding portion and the grounding soldering portion are matched with the predetermined feeding circuit and the grounding circuit of the circuit board, and the electrical connection between the wafer type antenna and the circuit substrate can be performed by the surface adhesion technology, and the photoelectric bonding can be omitted. The welding process of the feed line achieves practical progress and better industrial economic benefits such as simplifying the process, improving the yield, and reducing the cost.
上述實施例所揭示者係藉以具體說明本發明,且文中雖透過特定的術語進行說明,當不能以此限定本發明之專利範圍;熟悉此項技術領域之人士當可在瞭解本發明之精神與原則後對其進行變更與修改而達到等效之目的,而此等變更與修改,皆應涵蓋於如后所述之申請專利範圍所界定範疇中。 The above embodiments are intended to be illustrative of the present invention, and are not to be construed as limiting the scope of the invention. The principles are changed and modified to achieve an equivalent purpose, and such changes and modifications are to be included in the scope defined by the scope of the patent application as described later.
A‧‧‧晶片型天線 A‧‧‧wafer antenna
10‧‧‧印刷電路載體 10‧‧‧Printed circuit carrier
10B‧‧‧絕緣基材 10B‧‧‧Insulation substrate
11‧‧‧表面 11‧‧‧ surface
12‧‧‧著置面 12‧‧‧Setting
13‧‧‧側向面 13‧‧‧ lateral side
20‧‧‧立體曲折狀輻射層 20‧‧‧Three-dimensional zigzag radiation layer
21‧‧‧蝕刻成型表面區段 21‧‧‧etched surface section
221、223、22B‧‧‧立向連結區段 221, 223, 22B‧‧ ‧ vertical link section
225‧‧‧導電透孔 225‧‧‧Electrical through holes
23‧‧‧饋入焊接部 23‧‧‧Feed in the welding department
231‧‧‧端部區域 231‧‧‧End area
232‧‧‧饋入底層 232‧‧‧Feed into the ground floor
24‧‧‧接地焊接部 24‧‧‧Grounding Welding Department
241‧‧‧端部區段 241‧‧‧End section
242‧‧‧接地底層 242‧‧‧ Grounding ground
25‧‧‧底部輻射區段 25‧‧‧Bottom radiation section
30‧‧‧電路基板 30‧‧‧ circuit board
31‧‧‧饋入電路 31‧‧‧Feed in circuit
32‧‧‧接地電路 32‧‧‧ Grounding circuit
40‧‧‧導電穿孔 40‧‧‧Electrical perforation
40B‧‧‧穿孔 40B‧‧‧Perforation
41‧‧‧導電層 41‧‧‧ Conductive layer
41B‧‧‧導電材料 41B‧‧‧Electrical materials
50‧‧‧鑽孔手段 50‧‧‧Drilling means
60‧‧‧切割手段 60‧‧‧ cutting means
第1圖:本發明晶片型天線結構較佳實施例之俯視角度立體圖。 Fig. 1 is a top perspective view showing a preferred embodiment of the wafer type antenna structure of the present invention.
第2圖:本發明晶片型天線結構較佳實施例之仰視角度立體圖。 Fig. 2 is a bottom perspective view of a preferred embodiment of the wafer type antenna structure of the present invention.
第3圖:本發明晶片型天線結構較佳實施例之平面俯視圖。 Figure 3 is a plan top plan view of a preferred embodiment of the wafer type antenna structure of the present invention.
第4圖:本發明晶片型天線結構較佳實施例之平面仰視圖。 Figure 4 is a plan bottom plan view of a preferred embodiment of the wafer type antenna structure of the present invention.
第5圖:係第3圖之A-A剖面圖。 Fig. 5 is a cross-sectional view taken along line A-A of Fig. 3.
第6圖:係第3圖之B-B剖面圖。 Fig. 6 is a cross-sectional view taken along line B-B of Fig. 3.
第7圖:本發明晶片型天線著置結合於電路基板之實施例立體圖。 Fig. 7 is a perspective view showing an embodiment in which the wafer type antenna of the present invention is placed on a circuit board.
第8圖:本發明晶片型天線製造方法之步驟簡示圖。 Fig. 8 is a schematic view showing the steps of a method of manufacturing a wafer type antenna of the present invention.
第9圖:本發明之立向連結區段設為長形斷面凹溝面型態的實施例圖。 Fig. 9 is a view showing an embodiment in which the upright connecting section of the present invention is in the form of a long-section concave groove surface.
第10圖:本發明之立向連結區段設為平面型態之實施例圖。 Fig. 10 is a view showing an embodiment in which the standing connecting section of the present invention is in a planar form.
第11圖:本發明之立向連結區段藉由導電透孔所構成之實施例圖。 Fig. 11 is a view showing an embodiment of a vertical connecting section of the present invention which is constituted by a conductive through hole.
A‧‧‧晶片型天線 A‧‧‧wafer antenna
10‧‧‧印刷電路載體 10‧‧‧Printed circuit carrier
11‧‧‧表面 11‧‧‧ surface
12‧‧‧著置面 12‧‧‧Setting
13‧‧‧側向面 13‧‧‧ lateral side
20‧‧‧立體曲折狀輻射層 20‧‧‧Three-dimensional zigzag radiation layer
21‧‧‧蝕刻成型表面區段 21‧‧‧etched surface section
221、223、22B‧‧‧立向連結區段 221, 223, 22B‧‧ ‧ vertical link section
23‧‧‧饋入焊接部 23‧‧‧Feed in the welding department
24‧‧‧接地焊接部 24‧‧‧Grounding Welding Department
40‧‧‧導電穿孔 40‧‧‧Electrical perforation
Claims (10)
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US10135129B2 (en) | 2012-10-08 | 2018-11-20 | Taoglas Group Holding Limited | Low-cost ultra wideband LTE antenna |
US10483644B2 (en) | 2015-11-20 | 2019-11-19 | Taoglas Group Holdings Limited | Eight-frequency band antenna |
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US11088442B2 (en) | 2012-10-08 | 2021-08-10 | Taoglas Group Holdings Limited | Ultra-wideband LTE antenna system |
US10135129B2 (en) | 2012-10-08 | 2018-11-20 | Taoglas Group Holding Limited | Low-cost ultra wideband LTE antenna |
US10283854B2 (en) | 2012-10-08 | 2019-05-07 | Taoglas Group Holdings Limited | Low-cost ultra wideband LTE antenna |
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US11081784B2 (en) | 2012-10-08 | 2021-08-03 | Taoglas Group Holdings Limited | Ultra-wideband LTE antenna system |
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US10483644B2 (en) | 2015-11-20 | 2019-11-19 | Taoglas Group Holdings Limited | Eight-frequency band antenna |
US11264718B2 (en) | 2015-11-20 | 2022-03-01 | Taoglas Group Holdings Limited | Eight-frequency band antenna |
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CN115084840B (en) * | 2021-03-10 | 2024-03-22 | 昌泽科技有限公司 | Method for manufacturing chip antenna and structure thereof |
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