TW201405577A - Monochromator for charged particle beam apparatus - Google Patents

Abstract

This invention provides a monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus, which comprises a beam adjustment element, two Wien-filter type dispersion units and a particle-blockage unit. In the monochromator, a dual proportional-symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually can not be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. Therefore, using the monochromator in SEM can reduce chromatic aberrations without additionally incurring adverse impacts, so as to improve the ultimate imaging resolution. The improvement of the ultimate imaging resolution will be more distinct for Low-Voltage SEM and the related apparatuses which are based on LVSEM principle, such as the defect inspection and defect review in semiconductor yield management. The present invention also provides two ways to build a monochromator into a SEM, one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

Description

Monochromator with charged particle beam device

This invention relates to a charged particle beam apparatus, and more particularly to a monochromator that filters a charged particle beam into a small energy dispersion. The invention also relates to a charged particle beam apparatus suitable for use with such a device. Nevertheless, it should be understood that the invention has a broader scope of applicability.

In the scanning electron microscope for observing samples by the principle of electron microscopy and related industrial fields, such as defect inspection and defect inspection in yield management in semiconductor manufacturing, it is required to obtain a high-resolution test piece image and require low radiation damage.

The only solution to reduce radiation damage in test strip samples is to use a low-energy (or generally low-voltage) electron beam scan (<5 keV) in the field of scanning electron microscopy, but it limits the penetration under the surface of the electron beam test strip. Force and residual charge accumulation on the surface of the test piece. However, since the low-energy electron beam forms a probe point larger than the high-energy electron beam, the resolution is deteriorated.

The diameter of the probe spot on the surface of the test piece is determined by the size of the electron source in the imaging system, the spherical phase difference and dispersion aberration, the diffraction and the Coulomb effect. For low-energy electron beams, the minimum probe spot size that can be achieved is limited by the diffraction circle caused by the larger de Broglie wavelength and due to the larger relative energy spread. Dispersion aberration of dV/V ₀ . The two are shown in equations (1.1) and (1.2), respectively. Here _CA C is the dispersion aberration coefficient, V0 and dV are electron energy and energy dispersion, and a is the particle beam half angle. It is obvious that reducing the probe spot size, reducing the energy spread and reducing the dispersion aberration coefficient is another option.

The energy dispersion of the electron beam is derived from the original energy dispersion, which is generated by the superimposed energy spread caused by the statistical interaction between electrons emanating from an electron source and electrons from the electron source to the target. The electron energy dispersion usually has a shape with a long tail, and the energy dispersion of the electron beam is usually expressed by FWHM (Full Width Half Maximum). The Schottky Field Emission Source is widely used in low voltage scanning electron microscopy (LVSEM) where the energy spread dV at the cathode is 0.3 eV and, depending on the beam current, increases to 0.5 at the exit of the electron gun. 1 eV. For low energy electron beams such as 1 keV, this energy dispersion value means that a relative energy spread dV/V ₀ is much larger than a high energy electron beam such as 10 keV.

A number of solutions are currently available to reduce the energy spread dV of electrons before the test strip. In these solutions, magnetic and/or electrostatic refractors (e.g., Alpha filters, omega filters, and Wien filters) and electrostatic circular lenses (e.g., U.S. Patent No. 7,034,415) are used as dispersing elements. What these elements have in common is that a refractive dispersion occurs when the electron beam is deflected. Of these solutions, only the Wien filter has a constant optical axis and does not deflect electrons with normal energy away from the optical axis. This feature makes the Wien filter easy to prepare and does not produce off-axis phase differences that are virtually impossible to achieve fully compensated, so many of the proposed solutions are based on Wien filters.

As shown in the first figure, in a basic configuration of a standard Wien filter, the electrostatic dipole field E along the X direction and the magnetic dipole field B along the Y direction are vertically superimposed on each other, and both are perpendicular to the Optical axis Z. An electron beam passes through the Wien filter along the optical axis Z. The Wien condition is true only when the electron moves in the Z direction at a speed of ₀ v, as shown in equation (1.3), where the net Lorentz force F for each electron is zero. For an electron moving in the Z direction with a velocity variation d v from velocity ₀ v, it obtains a non-zero net Lorentz force F along the X direction, as expressed by the normal electron energy ₀ V and the energy variation amount d V The equation (1.4) or (1.5) is shown and will be refracted in the X direction and therefore turned away from the Z direction. Here e and m are the charge and mass of the electron, respectively. The angle of refraction α depends on the amount of change in energy d V and on the refractive power K of the magnetic field B and the normal energy V0 as shown in equation (1.6). Therefore, the Wien filter will produce a refractive dispersion, and the refractive power K represents the dispersion strength. For the sake of clarity, the refractive power K and the direction of deflection here are referred to as the dispersion power and the dispersion direction, respectively. In this case, no off-axis aberration occurs for electrons of speed ₀ v.

For each electron that has normal energy but is not moving in the YOZ plane, a change in potential from the electrostatic field will be obtained. Therefore, when it passes through the Wien filter, the speed will be different from ₀ v as shown in (1.7), and a non-zero net Lorentz force will be obtained as shown in (1.8). The net Lorentz force is proportional to the electron position x, so the focusing effect in the X direction (dispersion direction) exists. The focusing effect of the dispersion direction will produce astigmatic focusing and at the same time reduce the angle of refraction of off-axis electrons. The latter means a reduction in distributed power.

Wien filters are used in many ways as monochromators or energy filters, where energy filtering and energy angle filtering are two typical methods. In the energy filtering as shown in Fig. 2a, a particle beam 2 from the electron source 1 is made up of a circular lens 10 and or a Wien filter 11 itself (for example, U.S. Patent No. 6,452,169, U.S. Patent No. 6,658,073, U.S. Patent No. 6,960,763 and U.S. Patent No. 7,507,956, focus on forming an astigmatic image on the energy confining aperture 12. The electrons having the energy V ₀ form the sub-electron beam 3 focused on the optical axis, and the electrons having the energy V ₀ ±dV respectively form the sub-electron beams 4 and 5 which are respectively deflected in the ±X direction and focused away from the optical axis. Therefore, in the particle beam 2, all electrons whose energy changes within ±dV will pass through the aperture 12, and the remaining electrons will be blocked.

As a distinct advantage, energy filtration will completely cut off the long tail of the electron energy distribution. The long tail of the energy distribution produces a sinuous background in the image and reduces image contrast. As a non-negligible shortcoming, energy filtering needs to increase the size of the electron source. The image of electron source 1 at aperture 12 is the source of subsequent electron optics, which is actually determined by the size of the aperture. However, the current actual aperture size (3100 nm) is currently much larger than the size of the original electron source 1 (the virtual source of the Schott field source is about 20 nm). In addition, the image on aperture 12 is the result of the intersection of all electrons, which enhances the electronic interaction of the extra energy spread. Although in terms of electronic interaction, astigmatic images are better than astigmatic confocal images.

A particle beam 2 from the electron source 1 passes through the Wien filter 11 as in the energy angle filter shown in the second panel (e.g., U.S. Patent No. 6,488,621, U.S. Patent No. 7,790,054 and U.S. Patent No. 5,838,004). The electrons having the energy V ₀ form a straight sub-electron beam 3, and the electrons having energies of V ₀ ±dV respectively form sub-electron beams 4 and 5 which are respectively deflected in the ±X direction. The energy angle limits the position of each electron on the aperture 12 depending on its energy and the angle of incidence into the Wien filter 11. Therefore, the aperture 12 not only blocks all electrons whose energy variation is not within ±dV, but even if the energy variation is within ±dV, electrons having a large incident angle are blocked.

Angle of refraction of energy on the variation amount d V must be greater than at least a half-width b is incident to clearly dual filter out charged particles having energy change amount dV of. This requires that the Wien filter have sufficient dispersion power or that the incident electron beam is dispersed to a small extent. Increasing the dispersion power of the Wien filter will increase the angle of refraction, but at the same time enhance the focus, which in turn will reduce the angle of refraction and limit the maximum angle of refraction that it can achieve. Inhibiting the degree of dispersion of the incident electron beam will limit the particle beam current or enhance the interaction of electrons to increase the energy dispersion of the electron beam. Another disadvantage that cannot be ignored is that the subsequent electron-optical source 1 is changed to a larger virtual source from 14 to 15.

A number of improved methods have been proposed to solve the above problems. In terms of energy angle filtering, one approach is to use a circular lens to image the original electron source onto the Wien filter center (e.g., U.S. Patent No. 7,485,517). This minimizes the Wien filter effect on the electron source size, but adds a true cross. Another method is to use a second Wien filter to compensate for the residual effects of the first Wien filter (e.g., U.S. Patent No. 6,486,621, U.S. Patent No. 7,790,054). While this approach does not produce a true intersection, it will create a virtual intersection away from subsequent electron optics, which will cause large aberrations due to the greatly increased particle beam size.

In terms of energy filtration, a number of documents (e.g., U.S. Patent No. 6,696,763, U.S. Patent No. 6,586,073, and U.S. Patent No. 7,075,596) provide the use of one or more Wien filters 21 to compensate for the energy-limited aperture filter 12 after the first Wien The method of residual effect of the filter 11 (as shown in the third a and third b). In these solutions, the ㄧ confocal and non-dispersive intersection 7, i.e., the 真实 extra true intersection after the first true astigmatism intersection 6 of the energy limiting aperture 12 is formed after the last Wien filter 21. This not only increases the energy dispersion after energy filtering in the electronic interaction, but also increases the total length of the scanning electron microscope by at least the length of the monochromator 8 .

The present invention will provide a solution to the problem of energy filtration and energy angle filtering. Rather than forming a true confocal intersection of the incident charged particle beam through the monochromator, it forms a virtual confocal and non-dispersive intersection within the monochromator. The present invention then provides an efficient method for improving the resolution of low voltage scanning electron microscopes and related equipment based on the principle of low voltage scanning electron microscopy.

It is an object of the present invention to provide a monochromator in a charged particle device to reduce the energy spread of the main charged particle beam. By forming a double symmetry in the refracting chromaticity and the fundamental trajectory particularly along a direct optical axis with respect to an energy-restricted aperture, the monochromator has a reduced energy spread and an effective crossover when a charged particle source exits the charged particle beam away from it. The diameter and direction of travel are unchanged. Therefore, the present invention provides an effective way to improve the imaging resolution of a low voltage scanning electron microscope and related devices based on the principle of a low voltage scanning electron microscope, such as defect detection and defect re-viewing of semiconductor yield management.

Accordingly, the present invention provides an embodiment of a monochromator comprising a first dispersion unit aligned along a constant optical axis of the monochromator to refract a charged particle beam having a normal energy and an energy dispersion. And a second dispersing unit for sequentially refracting charged particles of the charged particle beam passing along the optical axis, a particle blocking unit between the first dispersing unit and the second dispersing unit, and The direct optical axis is aligned and the charged particle beam is focused to form a true intersecting particle beam modulating element on a plane in the particle blocking unit. The charged particle beam passes along the optical axis and comprises charged particles having normal energy passing straight through the each dispersing unit and charged particles having energy changes from normal energy changes and being refracted by the respective dispersing unit in an identical direction of dispersion. The angle of refraction of each charged particle generated by each of the dispersing units is determined by a dispersion power of each of the dispersing units and a change in energy of the each charged particle, wherein the first dispersing unit and the second dispersing unit The direction of dispersion is equal. Within the true intersection, each of the energy-changing particles has a positional offset caused by the angle of refraction generated by the first dispersion unit. The particle blocking unit blocks particles located outside of a region of the real intersection. A dummy intersection is formed in the monochromator after the charged particle beam is dispersed by the second dispersion unit.

The distributed power of the two dispersion units has a proportional relationship such that the virtual intersection of the charged particle beam is not dispersed in the first stage and is located at or near the plane. The first dispersion unit includes a first Wien filter and a first astigmatic aberration compensator, the first astigmatic aberration compensator compensates for astigmatism generated by the first Wien filter, and the second dispersion unit includes a first dispersion unit The second Wien filter and a second astigmatic aberration compensator compensate the astigmatism generated by the second Wien filter. The particle beam adjusting element is located on a particle beam entering side of one of the first dispersing units, and may be a circular lens. The energy dispersion of one of the charged particle beams after leaving the monochromator can be changed by simultaneously changing the dispersion power of the first and second dispersion units in the proportional relationship and changing the focus power of one of the particle beam adjustment elements. .

The particle blocking unit can block the particles with an energy limiting aperture. In addition, the particle blocking unit may have a plurality of energy-limiting pores having different sizes in the dispersion direction of the first dispersion unit. After leaving the monochromator, one of the charged particle beams leaves the energy dispersion by using one. Different energy limits the aperture to change. The particle blocking unit may use a first edge of the blade to block particles, and one of the charged particle beams leaving the energy dispersion after leaving the monochromator may be adjusted by the adjustment in the direction of dispersion of the first dispersion unit The position of one of the edges of the first blade changes. The particle blocking unit may further use a second edge of the blade to block the particles, and one of the charged particle beams leaving the energy dispersion after leaving the monochromator may be adjusted by the adjustment in the direction of dispersion of the first dispersion unit The position of one or both of the edges of the two edges is changed. The particle beam adjusting element is located between the first dispersing unit and the particle blocking unit.

The present invention provides a charged particle beam apparatus comprising a charged particle source providing a main electron beam moving along a constant optical axis of the apparatus, a concentrating mirror aligned with the optical axis to focus the main electron beam, and the optical Shaft alignment to focus the main electron beam on an objective lens on a surface of a test piece that emits secondary electrons, a detector that receives the secondary electrons, and a source aligned with the optical axis and located in the charged particle source A monochromator between the objective lenses to reduce the energy dispersion of one of the main electron beams. The monochromator can refer to the previous embodiment.

The distributed power of the two dispersion units has a proportional relationship such that the virtual intersection has no first stage dispersion and is located at or near the plane. The particle beam adjusting element of the monochromator may be located on the particle beam entering side of one of the first dispersing units of the monochromator. The particle beam adjusting element of the monochromator can be a circular lens. The first dispersion unit includes a first Wien filter and a first astigmatic aberration compensator, the first astigmatic aberration compensator compensates for astigmatism generated by the first Wien filter, and the second dispersion unit includes a first dispersion unit The second Wien filter and a second astigmatic aberration compensator compensate the astigmatism generated by the second Wien filter. The energy dispersion of one of the charged particle beams after leaving the monochromator can be changed by simultaneously changing the dispersion power of the first and second dispersion units in the proportional relationship and changing the focus power of one of the particle beam adjustment elements. Or can be changed by adjusting the particle blocking unit to select the corresponding position and size of the real intersecting spatial region.

The charged particle beam device may further include a first plate having a first particle beam limiting aperture between the charged particle source and the concentrating mirror, and a second particle between the condensing mirror and the objective lens A second plate that limits the aperture, wherein the first and second particle beam limiting apertures are aligned with the optical axis of the device.

The present invention further provides a monochromator comprising a first dispersion unit and a second dispersion unit aligned along a constant optical axis of the monochromator to refract a charged particle beam having a normal energy and an energy dispersion. The charged particles of the charged particle beam passing along the optical axis are sequentially refracted, and a particle blocking unit between the first dispersion unit and the second dispersion unit. Each of the dispersing units has a dispersing power in a dispersing direction, and thus the angle of refraction of each charged particle generated by each dispersing unit is varied by the dispersing power of each dispersing unit and the energy of each charged particle. And the normal energy of one of the charged particle beams is determined. The dispersion direction of the first dispersion unit and the second dispersion unit are respectively equal. The charged particle beam forms a true intersection on a plane in the particle blocking unit, and within the real intersection, each of the energy-changing particles has a position caused by the refraction angle generated by the first dispersing unit Offset. The particle blocking unit blocks particles located outside a region of the real intersection, and the dispersion power of the second dispersion unit causes the charged particle beam to form a virtual cross without a first level dispersion and at or near the plane .

The particle blocking unit can utilize an energy limiting aperture, or one or two edge edges to block the particles.

The invention further provides a method of energy filtering a charged particle beam, comprising providing a particle blocking device to block particles located outside a spatial region of the charged particle beam, providing a distributed power that can be generated along a direction of dispersion. a dispersing device, so that each of the charged particles of the charged particle beam can be refracted by a refractive angle determined by the dispersion power and the energy change of the charged particle and the normal energy of the charged particle beam. The dispersing device forms a dual proportional symmetry comprising a proportional symmetry of a distributed power distribution relative to a plane and a proportional symmetry of a charged particle having a normal energy in a trajectory distribution. The dual proportional symmetry first causes the charged particle beam to form a true intersection in the plane and has a particle position distribution depending on the energy distribution of the charged particle beam, and the particle blocking device makes the space region outside the real intersection The particles are blocked. The dual proportional symmetry then causes the charged particle beam to form a virtual cross without first level dispersion and with a reduced energy dispersion.

The virtual intersection can be at or near the plane.

The invention further provides a method of reducing energy dispersion of a charged particle beam, comprising dispersing the charged particle beam, wherein each particle obtains a refraction angle determined by an energy change of the particle and a normal energy of the charged particle beam . The dispersed charged particle beam is then focused to form a true intersection. The particles located outside of one of the real intersections are then blocked. Finally, the charged particle beam that is not blocked is dispersed to form a virtual cross without first-order dispersion.

The virtual intersection is at or near the true intersection.

Various embodiments of the present invention will now be described more fully with the accompanying drawings. Without limiting the scope of the invention, all descriptions and illustrations in the examples will be exemplified by an electron source and a scanning electron microscope. However, the examples are not intended to limit embodiments of the invention to specific charged particle sources and to specific electron microscopy fields.

The following description will focus on an electron beam that is used as a charged particle. In the figures, the relative dimensions between each element and each element may be exaggerated for clarity. In the following description of the drawings, the same reference numerals are used to refer to the same elements or entities, and only the differences between the individual embodiments are described.

The present invention provides a Wien filter type monochromator having a double symmetry. As shown in the fourth and fourth figures, two identical dispersing units (20 and 40) are symmetrically located on each side of the energy limiting aperture 30 to achieve bisymmetry. Two identical per-dispersion units produce a refractive dispersion of the charged particles with energy changes from a normal energy and focus off-axis charged particles. In one aspect, the two identical dispersing units produce two equal refraction angles (a1 = a2) for charged particles having energy changes from a normal energy change in the same direction. In this case, the refractive dispersion exhibits symmetry with respect to the energy limiting aperture (30) as shown in the fourth a diagram. On the other hand, the two identical dispersion units also focus the off-axis charged particles, and the first dispersion unit (20) passes the charged particles having normal energy through the center of the energy confinement aperture (30). The trajectory of each off-axis particle having normal energy in this case shows the antisymmetry with respect to the energy limiting aperture (30) as shown in the fourth b-picture. Double symmetry achieves energy filtering while ensuring that the exiting charged particle beam has a virtual intersection within the monochromator without first level dispersion and astigmatism.

Each of the dispersing units includes a Wien filter and an astigmatic aberration compensator, and both the electrostatic field and the magnetic field are superposed on the optical axis. For a charged particle beam with normal energy and a certain energy spread, the Wien filter produces the required dispersion power as a function of the bipolar magnetic field and electrostatic field strength, and the astigmatic focus power as a function of the dispersion power, such as the equation ( 1.3)-(1.8). The astigmatic aberration compensator is controlled to produce an astigmatic power to compensate for the astigmatic focus power of the Wien filter. Since the compensation has been completed at the astigmatism generation, the particle beam from each of the dispersing units can achieve astigmatism. Therefore, each of the dispersing units has a dispersion power that can be independently changed and a confocal focusing power that is dependent on the change.

According to the compensation of astigmatism, the focus effect of the Wien filter in the dispersion direction causes the dispersion power reduction to be attenuated because of the negative focus power generated by the astigmatic aberration compensator in the dispersion direction. The energy dispersion of the charged particle beam through the energy confinement aperture is determined by the dispersion power of the first dispersion unit (20) and the size of the energy confinement aperture (30) (in the direction of dispersion), so that the energy dispersion away from the charged particle beam can be changed by Disperse power and/or change the energy-restricted aperture size in the dispersion unit. The former can be achieved by adjusting the electrical excitation applied to the Wien filter, so it can be continuous. However, a change in the power of focus will result in a change in the power of the confocal focus, which will break the antisymmetry of the basic trajectory, thus destroying the offset of the aberrations produced by the two discrete units (20 and 40).

When the dispersion power changes or the incident charged particle beam changes, in order to maintain bisymmetry, a particle beam adjustment element is set before the two dispersion units. The particle beam adjusting element is a magnetic or electrostatic circular lens whose focus power is variable. The particle beam adjustment element acts as a variable particle beam adaptor. When the incident charged particle beam crossover and or normal energy may change for some good reason and or the dispersion power of the first dispersion unit may be varied to obtain a desired reduction in energy dispersion for a particular size of the energy limiting aperture, The power of its focus is adjusted to maintain the charged particle beam with a true intersection at the center of the energy confinement aperture (S71 of the fourth b-graph).

Therefore, from the inlet side to the outlet side, the monochromator 500 of the present invention comprises a particle beam adjusting element (100), a first dispersing unit (200), an energy limiting aperture (300) and a second dispersing unit (400). As shown in the fifth picture. The two dispersing units have the same structure and orientation, are used in the same excitation, and are symmetrically located on each side of the energy limiting aperture (300). All components are set and excited to ensure double symmetry in the refractive dispersion and the fundamental trajectory relative to the energy confined aperture.

The monochromator of the present invention has charged particles that have a constant optical axis and have normal energy and thus are not deflected away from the optical axis. This feature not only makes the monochromator easy to produce and adjust, but does not produce off-axis aberrations that are not actually fully compensated. In addition, a virtual confocal and non-dispersive intersection of a charged particle beam is formed between the first dispersion unit and the energy confinement aperture, rather than a true confocal intersection of the charged particle beam formed on the exit side of the monochromator. This virtual crossover is a source of subsequent optics for a device that requires a monochromator. On the one hand, the Boersch effect of the virtual cross is also smaller than the real intersecting Burrsch effect. On the other hand, the position of the virtual intersection is closer to the original source of charged particles, and thus the modifications required when the monochromator is integrated into an existing design electron microscope such as a low voltage scanning electron microscope will be less than the true cross. In accordance with all of the above, the monochromator of the present invention provides an efficient method for improving the resolution of low voltage scanning electron microscopes and related devices based on the principle of low voltage scanning electron microscopy.

The invention also provides two examples of the use of the monochromator of the invention in a scanning electron microscope. In the first example, as shown in Figure 7a, a monochromator is placed between the electron source 600 and a concentrating mirror 620, and a current limiting aperture 610 is used to control the beam current through the monochromator to reduce The electronic interaction that takes place inside the monochromator. In the second example, as shown in the eighth diagram, the monochromator is placed between a concentrating mirror and an objective lens, and the particle beam limiting aperture 630 controls the incident beam current of the monochromator.

The invention then also provides a Wien filter type monochromator with dual proportional symmetry. Unlike the double symmetry shown in Figures 4a and 4b, the dual proportional symmetry provides a proportional relationship between the refractive dispersion and the fundamental trajectory along a direct optical axis relative to the energy limiting aperture. Thus the two refractive units may be unequal but their refractive power has a proportional relationship, and the energy limiting aperture should therefore lie in a plane determined by the proportional relationship, where the plane may not be in the midplane of the birefringent unit. Dual-proportional symmetry provides more flexibility in the manufacture and application of monochromators. This double proportional symmetry is shown in the ninth a and ninth b. An embodiment with two dual-proportional symmetrical monochromators is shown in the tenth and eleventh figures.

Thereafter, for the aforementioned monochromator having double symmetry or double proportional symmetry, the present invention further provides a method of using a blade type particle damper to cut off particles having a large energy change. Blade-type particle dampers are simpler to manufacture and more feasible in achieving small energy spreads than energy-constrained apertures that previously required a small size in the direction of refraction to achieve small energy dispersion. Three embodiments of the blade type particle blocker are shown in Figures 12a through 12c.

The detailed description and mechanism of the present invention will be described next.

The present invention provides a Wien filter type monochromator to reduce the energy spread of the main electron beam in a scanning electron microscope or charged particle device. The monochromator forms a double symmetry with respect to the incident particle beam in the refracted dispersion and the fundamental trajectory along the straight optical axis. The double symmetry ensures that the incident charged particle beam from the charged particle source is reduced in energy dispersion as it exits the monochromator, and that the effective cross-diameter and propagation direction are maintained.

The present invention also provides a method of integrating a monochromator into a scanning electron microscope. The monochromator of the present invention helps to reduce the dispersion aberration of the test piece by reducing the energy dispersion of the main particle beam or the imaging particle beam without causing a significant increase in the size of the particle source. Therefore, the probe spot size on the test piece will achieve a lower value by rebalancing the image blur due to aberrations, diffraction, and particle source size. Therefore, the monochromator provides an effective method for improving the imaging resolution of a scanning electron microscope, particularly a low voltage scanning electron microscope and related devices according to the principle of a low voltage scanning electron microscope, such as defect detection in semiconductor yield management and Defect inspection.

The double symmetry which is the basis of the monochromator provided in the present invention includes a symmetry in the refractive dispersion of the energy-restricted aperture and an antisymmetry in a basic trajectory, respectively. In the fourth a diagram showing the symmetry in the refractive dispersion, an on-axis electron beam 50 having a normal energy V ₀ and an energy dispersion continuously enters the two dispersion units 20 and 40 along the Z axis. The two dispersing units 20 and 40 are identical in structure and are located symmetrically toward a plane 31 perpendicular to the optical Z-axis. The location of each discrete unit is defined by the center of the field area. Each of the dispersing units includes a Wien filter and an astigmatic aberration compensator, and the magnetic field and the electric field of the two are superposed on each other. The same is applied in each excitation Wien filter, not to generate energy electron deflection with normal V ₀ (e.g. 61), but will have the energy from a normal V ₀ (e.g. 71) to change the deflection of an electron energy change dV The required refractive power. As shown in equation (1.6), the larger the energy change dV, the larger the refraction angle (for example, a1 and a2). The characteristic of the angle of refraction that changes with the change in energy is called the refractive dispersion, and the refractive angle ratio K and the energy change dV are called the distributed power. Dispersing power with the normal power V ₀ and the magnetic dipole field change can be applied to the electrically Wien filter excitation adjustment.

A flat plate is located on the plane 31, and an aperture 30 on the flat plate is aligned with the optical axis Z. In the fourth a diagram, the refraction of the electrons 71 having the energy change d V is symmetrically separated from the plane 31. The two refraction angles a1 and a2 generated by the Wien filter in the first dispersing unit 20 and the second dispersing unit 40, respectively, are equal to each other, i.e., a1 = a2, and are each proportional to the energy change d V . The trajectory of the electrons 71 exiting from the second dispersion unit 40 virtually intersects the optical axis at a position a distance L2 from the center of the second dispersion unit 40, wherein

If all items higher than the first level can be omitted, the distance L2 does not change with the refraction angle a1. Therefore, the first-order dispersion of the exiting particle beam disappears, and the particle beam on the incident axis becomes an outgoing particle beam which is diverged from the geometric center point S71 of the two-dispersion unit.

The antisymmetric in the basic trajectory is based on the refracting symmetry. Based on the content shown in the fourth a diagram, the fourth figure 4b shows the antisymmetry in the basic trajectory. At each of the dispersing units (20 and 40) in the fourth b-picture, the astigmatic aberration compensator is excited to compensate for the occurrence of the fused dispersion symmetry as shown in the fourth a diagram when the Wien filter is actuated and filtered with Wien The astigmatism increases as the dispersion power increases. Therefore, each of the dispersing units (20 and 40) has an equal increase in the focusing power f in the X and Y directions as the dispersion power of each dispersing unit increases.

In the fourth b-picture, the antisymmetry in the basic trajectory can be achieved by if the incident electron beam 62 having the normal energy V ₀ has an intersection 62a originally at a specific position on the optical axis. The intersection 62a is located at a geometric center point S71 of the first and second dispersion units (20 and 40) at a position a distance L3 forward. If the distance L3 satisfies the following conditions,

Where f represents the focus power of each discrete unit. The first dispersion unit 20 will focus the incident electron beam 62 and correspondingly move it backward from position 62a to the geometric center point S71. Then, in the same manner, the second dispersion unit 40 focuses the incident electron beam 62 and finally moves the intersection at S71 backward by a distance L3 to a position 62b. The trajectory of the electron beam 62 having the normal energy V ₀ electrons has an antisymmetry with respect to the geometric intermediate plane 31 of the first and second dispersion units 20 and 40.

Therefore, the double symmetry shown in the fourth a map and the fourth b graph ensures that an electron beam forms a true intersection in the intermediate plane 31 and a virtual intersection at a distance from the intermediate plane 31. Within the true intersection, electrons with normal energy concentrate into a small circular plane on an optical axis, and have the same energy change from normal energy, concentrating into a small circular plane located away from the optical axis. The greater the change in energy, the farther the circular plane is from the optical axis. If the aperture 30 is set to the midplane in which the true intersection is located, electrons having an off-axis distance greater than the radius within the aperture 30 in all of the circular planes are truncated. In other words, the energy spread of electrons passing through the aperture 30 will be less than a specific value determined by the dispersion power of the first dispersion unit and the radius within the aperture 30. Within the virtual intersection, all of the electrons are concentrated into a small circular plane on an optical axis. The particle beam emitted from the second dispersing unit 40 has a smaller energy spread, an almost unaltered cross size, and a backward moving cross as compared to the particle beam entering the first dispersing unit 20.

The fifth figure shows a dual symmetrical monochromator embodiment based on the fourth a and fourth b diagrams of the present invention. The monochromator 500 includes a particle beam adjusting element 100, a first dispersing unit 200, an energy limiting aperture 300, and a second dispersing unit 400 from the inlet side to the outlet side of the electron beam. All components (100-400) are arranged in a row and perpendicular to the optical axis Z. The two dispersing units 200 and 400 are identical in construction and are located symmetrically toward a plane 310 which is also a vertical optical axis Z. The energy limiting aperture 300 is located on the plane 310. Compared to the fourth a and fourth b, the incident electron beam changes at the intersection position and/or the normal energy changes for some good reason and/or the dispersion power of the first dispersion unit 200 changes to change in the monochromator After the energy dispersion of the electron beam, the particle beam adjusting unit 100 is added in the fifth figure to ensure that the double symmetry is maintained. In other words, the particle beam adjustment element enhances the applicability and flexibility of the monochromator.

In the fifth figure, the particle beam adjusting element 100 includes a circular lens which may be electrostatic or magnetic. Each of the dispersing units (200, 400) includes a Wien filter that can be electrostatic or magnetic and an astigmatic aberration compensator, both of which are superposed on each other along the Z axis. The shape of the energy limiting aperture 300 can be circular, elliptical, square or rectangular. If the aperture shape is elliptical or rectangular, its shorter axis or shorter side is located in the direction of dispersion of the first dispersion unit 200. The pore size in the dispersion direction is selected in accordance with the degree of reduction in the required energy dispersion and the dispersion power of the first dispersion unit 200.

The method of operation of the monochromator shown in the fifth figure will be shown step by step in the sixth to sixth f diagrams. Figure 6a shows the function of the particle beam adjusting element 100. S1 is an electron source or electron beam crossing with normal energy V ₀ and original energy spread ± ΔV ₀ and energy spread will be reduced to ± ΔV ₁ . If S1 is an electron beam crossing, it may be located on the inlet side or the outlet side of the monochromator. S2 is determined by the way shown in equation (2.2) to form the position required for antisymmetry in the basic trajectory. The particle beam adjustment element 100 initially focuses the electron beam from the electron source S1 to form a particle beam that converges at S2 before entering the first dispersion unit 200. More specifically, the focusing power of the particle beam adjusting element 100 changes with the change of the initial position S1 at which the incident electron beam intersects and the focusing power f of the first dispersion unit 200. The latter changes with the dispersion power of the first dispersion unit 200.

The sixth b diagram and the sixth c diagram show the influence of the first dispersion unit 200 on the incident particle beam on the XOZ plane and the YOZ plane, respectively. The Wien filter in the first dispersion unit 200 is excited to satisfy the Wien condition and produces a desired X-direction refraction spread over the incident electron beam. The astigmatic aberration compensator in the first dispersion unit 200 is excited to compensate for the aberration generated by the Wien filter in the first dispersion unit 200. The residual confocal focusing power f after aberration compensation focuses the incident particle beam on the intermediate plane 310 to form a true intersection from S2 shown in the sixth a diagram. Due to the X-direction refraction of the Wien filter, only electrons with normal energy are concentrated into the on-axis circular plane S3. According to the magnetic deflection direction, the circular planes S4 and S5 formed by electrons having energy changes dV (>0) and -dV are respectively shifted from the X and -X directions of the optical axis. The larger the energy change dV, the larger the off-axis offset. In the Y direction, the discs of the circular planes S3, S4 and S5 are located on the optical axis as shown in the sixth c diagram.

The sixth graph shows the electronic dispersion of the energy confinement aperture 300. In the sixth graph, only the electronic display having the normal energy V ₀ and the six specific energy changes are shown, and a circular aperture 300 is taken as an example. The inner radius of the energy confinement aperture 300 is equal to the off-axis offset of the electron with an energy change ± ΔV ₁ . As such, the electron beam exits from the aperture 300 with a reduced energy change ± ΔV ₁ , but the size of an enlarged intersection in the X direction is equal to the inner diameter of the energy limiting aperture 300. The reduced energy change ±ΔV _{1 is} determined by the dispersion power of the first dispersion unit and the energy-restricted pore size in the dispersion direction of the first dispersion unit.

The sixth e-figure and the sixth f-figure show the effect produced by the second dispersing unit 400 on the incident particle beam. The second dispersion unit 400 functions in the same excitation as the first dispersion unit 200. Therefore, the second dispersion unit 400 refracts and focuses the electron beam from the true intersection in the intermediate plane 310 as the first dispersion unit 200 makes to the electron beam in front of the aperture 300. As shown in the sixth e-picture, in the XOZ plane, the second dispersing unit 400 not only moves the circular planes S3-S5 backward by the same distance from the intermediate plane 310, but also eliminates the circular plane offset existing in the X direction of the true intersection. . On the YOZ plane as shown in the sixth f-picture, the second dispersion unit 400 moves the circular planes S3-S5 by the same distance as XOZ backwards. Therefore, after leaving the second dispersion unit 400, the electrons leaving from the three circular planes S3-S5 shown in the sixth b and sixth c diagrams actually intersect at almost the same position on the optical axis Z and form a virtual cross. S6. The virtual crossover S6 is located between the first dispersing unit 200 and the intermediate plane 310, and has an inner diameter or energy limiting aperture 300 of the energy limiting aperture 300 as shown in the sixth d diagram without loss of the main portion. A small size in the direction of dispersion.

The seventh and eighth figures respectively show two embodiments of a scanning electron microscope using the monochromators shown in the above and fifth and sixth to sixth f diagrams. For the sake of simplicity, the bias scan is not shown. In Figure 7a, an electron source 600 emits an electron beam 700 along the optical axis Z. A first current limiting aperture 610 cuts a portion of the electron beam 700 to limit the beam current into the monochromator 500. A large beam current in the monochromator 500 will produce a strong electronic interaction within the electron beam focus range, especially at the true intersection of the central region of the energy limiting aperture 300, thus creating an additional energy spread in the monochromator and A cross size increases. Therefore, it is necessary to limit the beam current to a range in which the effect of the electron interaction is not significant.

In the monochromator 500 of the seventh graph, the electron beam is initially focused by the particle beam adjusting element 100 into a desired bundle of converging particles. The concentrated particle beam is then dispersed and focused by the first dispersion unit 200. Specifically, electrons having normal energy pass substantially straight through and form a true confocal intersection on the optical axis and at the center of the energy confining aperture 300, and electrons having the same energy change with respect to normal energy are deflected and form a Far from the optical axis but the confocal true intersection on the plane of the energy limiting aperture 300. The greater the change in the energy of the electron, the farther it crosses the optical axis. The energy confinement aperture 300 then cuts the electrons outside of the desired range ± ΔV ₁ to cause the exiting electron beam to have a reduced energy dispersion ± ΔV ₁ .

Subsequently, in the monochromator 500 of the seventh diagram, electrons coming out of the energy confinement aperture 300 will enter the second dispersion unit 400. The second dispersion unit 400 operates in the same manner as the first dispersion unit 200. The second dispersing unit 400 thus deflects the intersection of electrons from each of the energy confining apertures 300 away from the optical axis having the same angle and focuses the electrons as if it were the first dispersing unit 200, in the same axis from the last corresponding true cross. The position of the upper distance forms a virtual intersection of positions. However, here all virtual intersections are virtually identical on the optical axis. Thus, all electrons exiting the monochromator appear to be ejected from the virtual electron source 602 and have an energy variation within the desired range ± Δ ₁ V.

In the seventh diagram, the electron beam exiting from the monochromator 500 then enters a subsequent imaging system of a conventional scanning electron microscope and is focused by the condensing mirror 620 and the objective lens 640 onto the surface of the test strip 650. The condenser and particle beam limiting aperture 630 together control the final probe current. In fact, the particle beam confinement aperture 630 has the same additional effects as the energy angle filtering, as shown in Figure 7b. Although all of the electrons exiting from the monochromator 500 are virtually intersected at the same position 602 on the optical axis, electrons having a change in energy accumulate the angle of refraction produced by the first and second dispersion units 200 and 400. Thus, electrons having the same energy change have an equal additional traverse on the particle beam confinement aperture 630, and some electrons having a larger polar angle will be blocked by the particle beam confinement aperture 630, as in the shaded portion of Figure 7b. Show. The greater the change in energy, the more electrons that do not pass through the particle beam limiting aperture 630, so the particle beam limiting aperture 630 actually further reduces the effective energy dispersion of the electron beam entering the objective lens 640 that focuses the electron beam on the test strip 650. . Therefore, the dispersion aberration of the probe point will be reduced and the size of the probe point will be smaller than the probe point without the monochromator.

It is well known that electrons having an energy change greater than the limit enthalpy can be cut such that using a monochromator to increase imaging resolution sacrifices a portion of the probe beam current. For applications requiring the use of large probe beam currents, monochromator 500 can be deactivated in addition to particle beam conditioning unit 100, as shown in Figure 7c. In this case, the particle beam adjusting unit 100 will replace the original condensing mirror 620 as a condensing mirror. A concentrating mirror that is generally closer to the electron source and further away from the particle beam limiting aperture produces a smaller aberration than the opposite condition.

The eighth figure shows another embodiment of a scanning electron microscope using a monochromator in which the scanning electron microscope originally has a true intersection 602 at a fixed position in front of the objective lens 640. In the eighth diagram, electron source 600 emits an electron beam 700 along optical axis Z. Condenser 620 and particle beam limiting aperture 630 control the beam current entering the monochromator. Then in monochromator 500, the electron beam will undergo the same energy filtering as described in Figure 7a. The particle beam exiting the monochromator 500 has a virtual intersection 602 and reduced energy spread. For applications requiring the use of large probe beam currents, the monochromator 500 can be deactivated in addition to the particle beam conditioning unit 100. In this case, the particle beam adjusting unit 100 can focus the electron beam to have a true intersection 620 at the same position. The objective lens 640 then focuses the electron beam on the surface of the test strip 650. Therefore, the dispersion aberration of the probe point will be reduced and the size of the probe point will be smaller than the probe point without the monochromator.

Returning to the fourth a diagram, if the refraction angles a1 and a2 of the dispersing units 20 and 40 are not equal to each other but have a proportional symmetry relationship, which is shown in equation (2.3), the distance L ₂ changes the proportional relationship as in equation (2.4). Shown. Similar to equation (2.1), the distance L ₂ does not change with the angle of refraction a1 if all items above the first level are omitted. At this time, the first-stage dispersion leaving the particle beam disappears and the dispersion power of the two-dispersion unit simply has a proportional relationship as shown in the equation (2.5). Therefore, the dispersing unit having the dispersion power proportional relationship can also realize the energy filtering without the dispersion cross.

The ninth and ninth b diagrams show the dispersion compensation and the basic trajectory in this case. In the ninth a diagram, the two dispersion units 20P and 40P and an energy limiting aperture 30P are aligned along an optical axis Z. Along the axial electron beam 50 moves along the optical axis Z and continuously passes through the first dispersion unit 20P, the energy limiting aperture 30P and the second dispersion unit 40P. For an electron 71 having an energy offset from the normal energy of the electron beam 50, the dispersion power of the two dispersion units 20P and 40P is set such that the refraction angles a1 and a2 have a ratio k as shown by one of the equations (2.3). After leaving the second dispersing unit 40P trajectories of electrons through the virtual axis 71 from the second dispersing unit 40P center position rewind distance L _2, and L ₂ depending on the distance as in equation (2.3) shown in the ratio k. The intersection P71 divides the interval L ₁ between the two dispersion units into two intervals L ₄ and L ₂ . According to equation (2.4), the ratio of the interval L ₄ to L ₂ is also equal to the ratio k. The plane 32 is perpendicular to the optical axis Z and contains an intersection P71. The energy limiting aperture 30P is located on the plane 32. The two dispersing units thus form a proportional symmetry with respect to the dispersion of the plane 32 or the energy limiting aperture 30P.

Each of the dispersing units 20P and 40P may have only one Wien filter or an astigmatic aberration compensator having a Wien filter and an astigmatism that compensates for the Wien filter. On the basis of the dispersion compensation shown in Fig. 9a, the ninth bth diagram shows the basic trajectory of each of the dispersion units having a Wien filter and an astigmatic aberration compensator. Each of the dispersion units as described above thus has the same focus power that increases with the dispersion power in the X and Y directions. In the ninth bth diagram, the electron beam 62 having the normal energy ₀ V has an intersection on the optical axis and at a specific position 62a between the intersection P71 and the second dispersion unit 40P. If the distance L ₃ between the intersection P71 and the intersection 62a satisfies the following conditions,

Where ₁ f represents the focus power of the first dispersion unit 20P, and the first dispersion unit 20P will focus the incident electron beam 62 and thus move its intersection from the intersection 62a back to the intersection P71, in other words, to the center of the energy limiting aperture 30P . The second dispersion unit 40P then focuses the electron beam 62 and moves the intersection P71 backward by a distance L ₅ to L ₂ position 62a. The distance L ₅ changes the focus power ₂ f of the second dispersion unit 40P as shown in equation (2.8). In the intervals L ₄ and L ₂ of the proportional relationship, the electron trajectories in the electron beam 62 have an antisymmetry with respect to the energy limiting aperture 30P.

The two dispersion units 20P and 40P thus form a dispersed double-scale symmetry and a basic trajectory as shown in the ninth and ninth bth diagrams, which ensures that an electron beam forms a true dispersed intersection on the plane 32 and is first formed on the plane 32. The non-dispersive virtual cross of the distance L ₅ is then moved back and forth. Dual proportional symmetry provides more possibilities to achieve an energy filter with no discrete intersections than the double symmetry shown in the fourth and fourth graphs.

The tenth graph shows an embodiment of the present invention based on a dispersed dual-proportional symmetrical monochromator shown in the ninth and fifth lb diagrams. The monochromator 500P includes a particle beam adjusting element 100P, a first dispersing unit 200P, an energy limiting aperture 300P, and a second dispersing unit 400P from the side where the electron beam enters to the side away from the electron beam. All components (100P~400P) are aligned and perpendicular to the optical axis Z. The dispersion power of the two dispersion units 200P and 400P is set to have a ratio k, and the energy restriction aperture 300P is located on the plane 320. The plane 320 divides the interval L ₁ between the two dispersion units 200P and 400P into two intervals L ₄ and L ₂ by a ratio k. In contrast to the ninth and fifth lbs, the particle beam modulating element 100P is added to ensure that the incident electron beam, whether for some good reason, crosses the position and or changes in normal energy, or passes through the monochromator When the dispersion power of the first first dispersion unit 200P is changed to change the energy dispersion of the electron beam, the double proportional symmetry can be maintained. In other words, the particle beam adjustment element enhances the applicability and flexibility of the monochromator.

In the tenth diagram, the particle beam adjusting element 100P includes a circular lens which can be electrostatic or magnetic. The two dispersion units 200P and 400P may comprise only one Wien filter or a Wien filter and an astigmatic aberration compensator that may be electrostatic or magnetic. The shape of the energy limiting aperture 300P may be circular, elliptical, square or rectangular. The aperture size selection of the energy limiting aperture 300P in the dispersion direction is based on the required energy dispersion reduction and the dispersion power of the first dispersion unit 200P.

The eleventh embodiment shows another embodiment of the monochromator 510P of the present invention in terms of the dispersion of the double proportional symmetry of the dispersion shown in the ninth and ninth bth views. The monochromator 510P includes a first dispersion unit 210P, a particle beam adjustment element 110P, an energy limiting aperture 310P, and a second dispersion unit 410P from the side of the electron beam entering the side to the exit side. All components (110P~410P) are aligned and perpendicular to the optical axis Z. The energy limiting aperture 310P is located on the plane 330. The plane 330 sets the interval L ₁ between the two dispersion units 210P and 410P, and the ratio of the two intervals L ₄ to L ₂ is not necessarily one. The dispersion power of the first dispersion unit 210P and the focus power of the particle beam adjustment element 110P are both set to obtain a desired dispersion and a true intersection of an incident particle beam on the plane 330 or the energy confinement aperture 310P, and the second dispersion unit 410P The dispersion power is set to form an incident particle beam with no discrete virtual intersections on plane 330.

Like the monochromator 500P, the monochromators 500P and 510P can be applied to a scanning electron microscope in the manner shown in the seventh and eighth figures. In addition, the monochromators 500P and 510P provide more flexibility in manufacturing and application. For the monochromator 500P, the ratio k of the second dispersion unit can be set to be less than one if it is necessary to project the electron beam virtual intersection 602 (in the seventh and eighth figures) very close to the application of the electron source 600. If there is a need for energy dispersion reduction, and the energy limiting aperture 300P has to have a small size that is difficult to manufacture, a larger ratio k value is used to move the energy limiting aperture 300P closer to the second dispersion unit 400P to limit the energy. The required size of the aperture 300P is increased.

Referring again to Figure 4a (or Figure 9a), a required energy spread reduction may require the energy limiting aperture 30 (or 30P) to have a small dimension in the dispersion direction (in the X direction) that is in manufacture It can be very difficult. At this time, the energy limiting aperture may be formed by two flat plates each having a blade edge. The two blade edges of the two plates are opposed to each other in the direction of dispersion to form a slit aligned with the optical axis. The size of the slit can be made very small by adjusting the position of the edge of each blade in the direction of dispersion in advance. For applications that only need to intercept electrons having energy greater than or less than a particular value, similar to high pass rate filtering or low pass rate filtering, electron blocking can be accomplished by using a single edge of the blade.

Taking the monochromator 500P in the tenth diagram as an example, three embodiments of the blade type particle blocker are shown in the twelfth a to tth c. In the twelfth a diagram, the monochromator 500P-B1 includes two flat plates 300P-1 and 300P-2, wherein the two blade edge edges K1 and K2 of the two plates are located on the same plane 320, and are in the X direction (dispersion direction). Opposite each other to form a slit covering the optical axis Z. In order to avoid the possibility of collision of the edges of the two edges when adjusting the slit size, the edge edges K1 and K2 can be arranged on two different planes. In contrast to the twelfth a diagram, the edge K1 of the blade in the twelfth bth is located closer to the plane 321 of the second dispersion unit 400P than the plane 320. In the twelfth c-th graph, electrons having an energy higher than a specific value or lower than a specific value are blocked using only a single blade edge. Without prejudice to commonality, all of the foregoing methods (eg, using energy-restricted apertures or edge edges) and their corresponding embodiments for blocking electrons are generally indicated by a particle blocking device and a particle blocking unit, respectively. .

In the present invention, there is provided a monochromator in a scanning electron microscope capable of reducing the energy dispersion of a main electron beam, which is used to reduce the dispersion chromatic aberration of imaging to improve the final imaging resolution of a scanning electron microscope, especially based on low Low-voltage scanning electron microscope and related devices based on the principle of voltage scanning electron microscope. The monochromator uses a Wien filter as a dispersing element to perform energy filtering along the optical axis, substantially avoiding off-axis aberrations that are practically uncompensable. The dual proportional symmetry is formed in a monochromator that includes a proportional relationship between the refractive dispersion and a fundamental trajectory with respect to a plane within the particle blocking unit. Dual proportional symmetry and particle blocking unit achieve energy orientation filtering (high pass rate, low pass rate and band pass) while ensuring that the exiting charged particle beam has a monochromator and no first level dispersion and astigmatism Virtual cross. A virtual crossover within the monochromator produces less electronic interaction and requires only minor modifications to the original design of the scanning electron microscope as compared to a real crossover on the exit side of the monochromator in the prior art. Further, the monochromator of the present invention has wider applicability and greater flexibility when applied to a device than the prior art. The invention also provides two methods for integrating a monochromator into a scanning electron microscope, one of which is to place a monochromator between the electron source and the concentrating mirror, and the other is to place the monochromator in the particle beam limiting aperture. Between the objective lens and the objective lens. The former provides additional energy angle filtering and achieves a smaller effective energy spread than the latter.

While the invention has been described with respect to the specific embodiments thereof, it will be understood by those skilled in the art that Therefore, it is to be understood that the invention is not to be limited

1. . . Electronic source

2. . . Particle beam

3. . . Secondary electron beam

4. . . Secondary electron beam

5. . . Secondary electron beam

6. . . True astigmatism

7. . . Confocal and astigmatic cross

8. . . Monochromator length

10. . . Round lens

11. . . Wien filter

12. . . Energy limited aperture

14. . . Virtual electron source

15. . . Virtual electron source

20. . . First dispersion unit

20P. . . First dispersion unit

twenty one. . . Wien filter

30. . . Energy limited aperture

30P. . . Energy limited aperture

31. . . flat

32. . . flat

40. . . Second dispersion unit

40P. . . Second dispersion unit

50. . . On-axis electron beam

61. . . Normal energy V0 electron

62. . . Incident electron beam

62a. . . cross

62b. . . position

71. . . Normal energy V0 electron

100. . . Particle beam adjustment component

100P. . . Particle beam adjustment component

110P. . . Particle beam adjustment component

200. . . First dispersion unit

200P. . . First dispersion unit

210P. . . First dispersion unit

300. . . Energy limited aperture

300P. . . Energy limited aperture

300P-1. . . flat

300P-2. . . flat

310. . . flat

310P. . . Energy limited aperture

320. . . flat

321. . . flat

330. . . flat

400. . . Second dispersion unit

400P. . . Second dispersion unit

410P. . . Second dispersion unit

500. . . Monochromator

500P. . . Monochromator

500P-B1. . . Monochromator

500P-B2. . . Monochromator

500P-B3. . . Monochromator

510P. . . Monochromator

600. . . Electronic source

602. . . True cross

610. . . Current limiting aperture

620. . . Condenser

630. . . Particle beam limiting aperture

640. . . Objective lens

650. . . Audition

700. . . Electron beam

The invention will be more readily understood from the following detailed description, which is illustrated by the accompanying drawings, in which reference numerals indicate structural elements, wherein the first figure shows the basic structure of a Wien filter. Figure 2a shows an overview of a monochromator using a Wien filter as a dispersive element. Figure b is a schematic representation of a monochromator using a Wien filter as a dispersive element. Figure 3a shows an overview of a monochromator using two Wien filters. Figure 3b shows an overview of a monochromator using two Wien filters. Figure 4a shows a schematic representation of the symmetry of a refractive dispersion according to the invention. Figure 4b shows a schematic representation of the antisymmetry of a basic trajectory in accordance with the present invention. The fifth figure shows a schematic illustration of a xenon monochromator for a charged particle device in accordance with a first embodiment of the present invention. The sixth to sixth f diagrams show an outline of the function (XOZ, YOZ plane) of the monochromator shown in the fifth diagram of the present invention. Figures 7a through 7c show a schematic illustration of the integration of a monochromator into a scanning electron microscope in accordance with a second embodiment of the present invention. The eighth figure shows a schematic illustration of the integration of a monochromator into a scanning electron microscope in accordance with a third embodiment of the present invention. The ninth and ninth bth graphs show the double proportional symmetry of the dispersion compensation and the basic trajectory of the present invention. Figure 11 shows a fourth embodiment of a monochromator for a charged particle device of the present invention. Figure 11 shows a fifth embodiment of a monochromator for a charged particle device of the present invention. Figures 12a through 12c show a sixth embodiment of a monochromator for a charged particle device.

20P. . . First dispersion unit

30P. . . Energy limited aperture

32. . . flat

40P. . . Second dispersion unit

50. . . On-axis electron beam

61. . . Normal energy V ₀ electron

71. . . Normal energy V ₀ electron

Claims (31)

A monochromator comprising: a first dispersion unit and a second dispersion unit aligned along a direct optical axis to refract a charged particle beam having a normal energy and an energy dispersion, the charged particle beam passing along the optical axis and comprising Normal energy passes straight through the charged particles of each of the dispersing units and charged particles having energy changes from normal energy changes and refracted by the respective dispersing units in an identical direction of dispersion, wherein each of the discrete units is produced The angle of refraction of the charged particles is determined by a dispersion power of each of the dispersion units and an energy change of the charged particles, wherein the dispersion direction of the first dispersion unit and the second dispersion unit are respectively equal; a cell blocking unit located between the first dispersing unit and the second dispersing unit; and a particle beam adjusting element aligned with the direct optical axis and focusing the charged particle beam Forming a true intersection on a plane in the particle blocking unit; wherein within the real intersection, each particle having energy changes has a cause a positional shift caused by the refraction angle generated by the first dispersing unit, wherein the particle blocking unit blocks particles located outside a spatial region of the real intersection, wherein a virtual crossover of the charged particle beam is caused by the second dispersion The unit is dispersed and formed in the monochromator. The monochromator of claim 1, wherein the distributed power of the two dispersion units has a proportional relationship such that the virtual intersection has no first level dispersion and is located at or near the plane. The monochromator of claim 2, wherein the particle beam adjusting element is located on a particle beam entering side of one of the first dispersing units. The monochromator of claim 3, wherein the first dispersing unit comprises a first Wien filter and a first astigmatic aberration compensator, the first astigmatic aberration compensator compensating the first Wien The astigmatism generated by the filter, the second dispersion unit includes a second Wien filter and a second astigmatic aberration compensator, and the second astigmatic aberration compensator compensates for the astigmatism generated by the second Wien filter. The monochromator of claim 4, wherein the particle beam adjusting element is a circular lens. The monochromator of claim 5, wherein the one of the charged particle beams leaves the energy dispersion after leaving the monochromator, and the first and second dispersion units are changed by the proportional relationship at the same time. The power is dispersed and the focus power of one of the particle beam adjusting elements is changed to change. The monochromator of claim 2, wherein the particle blocking unit blocks the particles with an energy limiting aperture. The monochromator according to claim 7, wherein the particle blocking unit has a plurality of energy-restricted apertures having different sizes in the dispersion direction of the first dispersion unit, and the charging is performed after leaving the monochromator. One of the particle beams leaving the energy spread can be changed by using a different energy limiting aperture. The monochromator of claim 2, wherein the particle blocking unit uses a first edge of the blade to block particles. The monochromator of claim 9, wherein one of the charged particle beams leaves the energy dispersion after leaving the monochromator by adjusting the first blade in the dispersion direction of the first dispersion unit One of the edges changes position. The monochromator of claim 9, wherein the particle blocking unit further uses a second edge of the blade to block particles. The monochromator of claim 11, wherein one of the charged particle beams exits the energy dispersion after leaving the monochromator by adjusting the edge of the two edges in the direction of dispersion of the first dispersion unit Change the position of one or both. The monochromator of claim 2, wherein the particle beam adjusting element is located between the first dispersing unit and the particle blocking unit. A charged particle beam device comprising: a charged particle source, the charged particle source providing a main electron beam moving along a constant optical axis of the device; a condensing mirror aligned with the optical axis to focus the main electron beam; An objective lens aligned with the optical axis to focus the main electron beam on a surface of a test piece that emits secondary electrons; a detector that receives the secondary electron; and a first item according to the request A monochromator wherein the monochromator is aligned with the optical axis and located between the source of charged particles and the objective lens to reduce energy spread of one of the main electron beams. The charged particle beam device of claim 14, wherein the dispersion power of the two dispersion units has a proportional relationship such that the virtual intersection of the charged particle beam is not dispersed in the first stage and is located at or near the plane. The charged particle beam device of claim 15, wherein the particle beam adjusting element of the monochromator is located on a particle beam entering side of one of the first dispersing units of the monochromator. The charged particle beam device of claim 16, wherein the particle beam adjusting component of the monochromator is a circular lens. The charged particle beam device of claim 17, wherein the first dispersion unit comprises a first Wien filter and a first astigmatic aberration compensator, the first astigmatic aberration compensator compensating the first The astigmatism generated by the Wien filter, the second dispersion unit includes a second Wien filter and a second astigmatism aberration compensator, and the second astigmatic aberration compensator compensates for the astigmatism generated by the second Wien filter. The charged particle beam device of claim 18, wherein one of the charged particle beams leaves the energy dispersion after leaving the monochromator, and the first and second dispersion units are simultaneously changed by the proportional relationship. The dispersion power is varied by changing the focus power of one of the particle beam adjustment elements. The charged particle beam device of claim 18, wherein the one of the charged particle beams leaving the energy dispersion after leaving the monochromator can adjust the particle blocking unit to select a correspondence of the real intersecting spatial regions. Position and size change. The charged particle beam device of claim 15, further comprising a first plate having a first particle beam limiting aperture between the charged particle source and the concentrating mirror; a second plate having a second particle beam limiting aperture between the concentrating mirror and the objective lens, wherein the first and second particle beam limiting apertures are aligned with the optical axis of the device. The charged particle beam device of claim 21, wherein the monochromator is located between the first plate and the concentrating mirror. The charged particle beam device of claim 21, wherein the monochromator is located between the second plate and the objective lens. A monochromator comprising: a first dispersion unit and a second dispersion unit aligned along a constant optical axis of the monochromator to refract a charged particle beam having a normal energy and an energy dispersion to be along the optical axis The charged particles passing through the charged particle beam are sequentially refracted, and each of the dispersing units has a dispersion power in a dispersion direction, and thus the refractive angle of each charged particle generated by each of the dispersing units is obtained by each of the dispersing units The dispersion power and the energy change of the charged particle and the normal energy of the charged particle beam are determined, wherein the dispersion direction of the first dispersion unit and the second dispersion unit are respectively equal; and a particle blockage a unit, the particle blocking unit is located between the first dispersion unit and the second dispersion unit, wherein the charged particle beam forms a true intersection on a plane in the particle blocking unit, wherein within the real intersection, Each of the energy-changing particles has a positional shift caused by the angle of refraction generated by the first dispersing unit, wherein the particle blocking unit blocks the true cross A particle outside a spatial region of the fork, wherein the dispersed power of the second dispersion unit causes the charged particle beam to form a virtual intersection having no first-order dispersion and located at or near the plane. The monochromator of claim 24, wherein the particle blocking unit blocks the particles with an energy limiting aperture. The monochromator of claim 24, wherein the particle blocking unit uses a first edge of the blade to block particles. The monochromator of claim 26, wherein the particle blocking unit further uses a second edge of the blade to block particles. A method of energy filtering a charged particle beam, comprising: providing a particle blocking device to block particles located outside a spatial region of the charged particle beam; providing a dispersing device capable of generating a distributed power along a direction of dispersion, Therefore, each charged particle of the charged particle beam is refracted at a refraction angle determined by the dispersion power and the energy change of the charged particle and the normal energy of the charged particle beam; and using the dispersion device Forming a dual proportional symmetry comprising a proportional symmetry on a distributed power distribution relative to a plane and a proportional symmetry of a charged particle having a normal energy in a trajectory distribution, wherein the dual proportional symmetry First, the charged particle beam is formed into a true intersection in the plane and has a particle position distribution depending on the energy distribution of the charged particle beam, and the particle blocking device blocks the particles located outside the real intersecting space region Broken, wherein the double proportional symmetry then causes the charged particle beam to form a first-order dispersion without a reduction The amount of dispersant virtual cross. The method of claim 28, wherein the virtual intersection is at or near the plane. A method for reducing energy dispersion of a charged particle beam, comprising: dispersing the charged particle beam, wherein each particle obtains a refraction angle determined by an energy change of the particle and a normal energy of the charged particle beam; The charged particle beam is focused to form a true intersection; the particles located outside of the spatial region of the true intersection are blocked; and the charged particle beam that is not blocked is dispersed to form a virtual intersection without the first level dispersion. The method of claim 30, wherein the virtual intersection is at or near the true intersection.