TW201403635A - Conductive laminated body, patterned conductive laminated body, method for producing same, and touch panel using the same - Google Patents

Conductive laminated body, patterned conductive laminated body, method for producing same, and touch panel using the same Download PDF

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Publication number
TW201403635A
TW201403635A TW102115190A TW102115190A TW201403635A TW 201403635 A TW201403635 A TW 201403635A TW 102115190 A TW102115190 A TW 102115190A TW 102115190 A TW102115190 A TW 102115190A TW 201403635 A TW201403635 A TW 201403635A
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Taiwan
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conductive
layer
patterned
inorganic particles
laminated body
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TW102115190A
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Chinese (zh)
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Kazuya Nishioka
Yoshikazu Sato
Osamu Watanabe
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Toray Industries
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/202LCD, i.e. liquid crystal displays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/206Organic displays, e.g. OLED
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/208Touch screens

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Liquid Crystal (AREA)
  • Position Input By Displaying (AREA)

Abstract

The present invention provides a patterned conductive laminated body which is excellent in the non-visibility of a pattern. A conductive laminated body which is the conductive laminated body having a conductive layer on at least one side of a substrate, characterizing by the conductive layer containing a metal linear structure with a network structure and any layer of the conductive layer body containing inorganic particles.

Description

導電積層體、圖案化導電積層體、其製造方法、及使用彼等而成之觸控面板 Conductive laminate, patterned conductive laminate, method of manufacturing the same, and touch panel using same

本發明係關於導電積層體及包含導電區域與非導電區域的圖案化導電積層體。更詳細而言,係關於包含導電區域與非導電區域之圖案部分的非辨識性高的圖案化導電積層體。又再者,係關於亦能夠使用於液晶顯示器、有機電致發光、電子紙等之顯示器相關及太陽電池模組等的電極元件的圖案化導電積層體。 The present invention relates to a conductive laminate and a patterned conductive laminate comprising a conductive region and a non-conductive region. More specifically, it relates to a highly non-recognizable patterned conductive laminate including a pattern portion of a conductive region and a non-conductive region. Further, the present invention relates to a patterned electrically conductive laminated body which can be used for a display element related to a liquid crystal display, an organic electroluminescence, an electronic paper, or the like, and an electrode element such as a solar cell module.

近年來,關於觸控面板、液晶顯示器、有機電致發光、電子紙等之顯示器和太陽電池模組等中電極用之導電元件,係藉由在導電元件之導電層形成非導電區域的加工處理而形成包含導電區域與非導電區域之所期望的圖案而使用。 In recent years, conductive elements for electrodes such as touch panels, liquid crystal displays, organic electroluminescence, electronic paper, etc., and solar cell modules have been processed by forming non-conductive regions on conductive layers of conductive elements. It is used to form a desired pattern including a conductive region and a non-conductive region.

導電元件係在基材上積層導電層者,作為該導電層係除了使用ITO或金屬薄膜等習知的導電性薄膜之外,有提案使用金屬奈米線等的線狀的導電成分。例如有提案在以金屬奈米線為導電成分的導電層上積層樹 脂層的導電積層體(專利文獻1)。又,有提案在使用多官能成分之高硬化度的基質內分散金屬奈米線的導電積層體(專利文獻2)。再者,亦有提案將使用金屬奈米線的導電積層體圖案化成為導電區域與殘留金屬奈米線之非導電區域(專利文獻3)。 In the conductive layer, a conductive layer is laminated on the substrate. In addition to a conventional conductive film such as ITO or a metal thin film, a linear conductive component such as a metal nanowire is proposed. For example, there is a proposal to build a tree on a conductive layer with a metal nanowire as a conductive component. Conductive laminate of a lipid layer (Patent Document 1). Further, there has been proposed a conductive laminated body in which a metal nanowire is dispersed in a matrix having a high degree of hardening of a polyfunctional component (Patent Document 2). Further, it has been proposed to pattern a conductive laminate using a metal nanowire into a non-conductive region of a conductive region and a residual metal nanowire (Patent Document 3).

又,當彼等導電元件適用於觸控面板等時,需要形成配線圖案,作為圖案形成方法,通常使用採用光阻劑和蝕刻液的化學蝕刻法(專利文獻4)。 Further, when the conductive elements are applied to a touch panel or the like, it is necessary to form a wiring pattern, and as a pattern forming method, a chemical etching method using a photoresist and an etching liquid is generally used (Patent Document 4).

先行技術文獻 Advanced technical literature 專利文獻 Patent literature

專利文獻1 日本特表2010-507199號公報 Patent Document 1 Japanese Patent Publication No. 2010-507199

專利文獻2 日本特開2011-29037號公報 Patent Document 2 Japanese Patent Laid-Open No. 2011-29037

專利文獻3 日本特開2010-140859號公報 Patent Document 3 Japanese Patent Laid-Open Publication No. 2010-140859

專利文獻4 日本特開2001-307567號公報 Patent Document 4 Japanese Patent Laid-Open Publication No. 2001-307567

然而,記載於專利文獻1的導電積層體係因若形成包含導電區域與非導電區域之圖案,則在導電區域與非導電區域之間導電成分的存在量產生差異,所以發生光學特性的差異,而有所謂能夠區分圖案(亦即非辨識性低)的問題。作為提升該圖案之非辨識性的手段,雖然記載於專利文獻2之導電積層體係基材與導電層之折射率差異縮小,及記載於專利文獻3之導電積層體係導電區域與非導電區域的導電成分殘留量差異縮小,仍然 有圖案之非辨識性低的問題。又,作為導電積層體之圖案形成方法,通常使用如記載於專利文獻4的化學蝕刻法,期望改善採用該圖案化方法之圖案非辨識性。 However, in the conductive laminated system described in Patent Document 1, if a pattern including a conductive region and a non-conductive region is formed, a difference in the amount of the conductive component exists between the conductive region and the non-conductive region, and thus a difference in optical characteristics occurs. There is a problem that the pattern can be distinguished (that is, the non-recognition is low). In the method of improving the non-recognition of the pattern, the refractive index difference between the conductive laminated layer substrate and the conductive layer described in Patent Document 2 is reduced, and the conductive portion and the non-conductive region of the conductive laminated layer described in Patent Document 3 are electrically conductive. The difference in component residues is reduced, still There is a problem of low recognition of patterns. Moreover, as a pattern forming method of a conductive laminated body, the chemical etching method described in Patent Document 4 is generally used, and it is desired to improve the pattern non-recognition property by the patterning method.

本發明係鑒於此種習知技術的問題,獲得圖案部分之非辨識性高的圖案化導電積層體。 The present invention has been made in view of the problems of the prior art, and a patterned electrically conductive laminated body having a high degree of non-recognition of a pattern portion is obtained.

本發明為了解決此種課題,係採用如下之構造。亦即, In order to solve such a problem, the present invention adopts the following structure. that is,

(1)一種導電積層體,其係基材之至少單面具有導電層的導電積層體,其特徵在於:該導電層包含具有網絡結構之金屬系線狀結構體,再者導電積層體之任意層包含無機粒子。 (1) A conductive laminated body which is a conductive laminated body having a conductive layer on at least one side of a substrate, wherein the conductive layer comprises a metal-based linear structure having a network structure, and further any of the conductive laminated bodies The layer contains inorganic particles.

(2)如記載於(1)之導電積層體,其中基材及導電層之間具有含無機粒子之層。 (2) The electrically conductive laminated body according to (1), wherein the substrate and the conductive layer have a layer containing inorganic particles.

(3)一種圖案化導電積層體,其係基材之至少單面具有圖案化導電層的圖案化導電積層體,其特徵在於:該圖案化導電層具有存在具有網絡結構之金屬系線狀結構體的導電區域,及不存在具有網絡結構之金屬系線狀結構體的非導電區域,再者非導電區域之積層構造的任意層存在孔隙。 (3) A patterned electrically conductive laminated body which is a patterned electrically conductive laminated body having a patterned conductive layer on at least one side of a substrate, wherein the patterned electrically conductive layer has a metal-based linear structure having a network structure The conductive region of the body and the non-conductive region in which the metal-based linear structure having the network structure is not present, and any layer of the laminated structure of the non-conductive region exists.

(4)如記載於(3)之圖案化導電積層體,其中基材及圖案化導電層之間具有存在孔隙之層。 (4) The patterned conductive laminate according to (3), wherein the substrate and the patterned conductive layer have a layer having pores therebetween.

(5)如記載於前述(4)之圖案化導電積層體,其特徵在於:非導電區域相較於導電區域存在較多的孔隙。 (5) The patterned electrically conductive laminated body according to (4) above, wherein the non-conductive region has a large number of voids compared to the conductive region.

(6)一種圖案化導電積層體之製造方法,其係記載於前述(3)、(4)、(5)中任一項之圖案化導電積層體之製造方法,其特徵在於:藉由以藥劑處理來溶解記載於(1)或(2)之導電積層體的無機粒子而形成孔隙。 (6) A method of producing a patterned conductive laminate, which is characterized by the method for producing a patterned conductive laminate according to any one of the above (3), (4), or (5), wherein The chemical treatment is performed to dissolve the inorganic particles described in the conductive laminate of (1) or (2) to form pores.

(7)如記載於前述(6)之圖案化導電積層體之製造方法,其特徵在於:在藉由以藥劑處理溶解無機粒子而形成孔隙的同時,亦除去具有網絡結構之金屬系線狀結構體,形成非導電區域。 (7) The method for producing a patterned electrically conductive laminated body according to the above (6), wherein the inorganic particles are dissolved by a chemical treatment to form pores, and the metal-based linear structure having a network structure is also removed. Body, forming a non-conductive area.

(8)一種圖案化導電積層體,其係藉由記載於前述(6)或(7)之圖案化導電積層體之製造方法而獲得。 (8) A patterned electrically conductive laminated body obtained by the method for producing a patterned electrically conductive laminated body according to (6) or (7) above.

(9)如記載於前述(1)之導電積層體,其中金屬系線狀結構體為銀奈米線。 (9) The electrically conductive laminated body according to (1) above, wherein the metal linear structure is a silver nanowire.

(10)如記載於前述(1)之導電積層體,其特徵在於:無機粒子的平均粒徑為500nm以下。 (10) The electrically conductive laminated body according to (1) above, wherein the inorganic particles have an average particle diameter of 500 nm or less.

(11)如記載於前述(3)、(4)、(5)、(8)中任一項之圖案化導電積層體,其特徵在於:非導電區域所包含之孔隙的平均孔隙直徑為500nm以下。 The patterned conductive laminate according to any one of the above (3), (4), (5), or (8), wherein the non-conductive region contains pores having an average pore diameter of 500 nm. the following.

(12)如記載於前述(1)之導電積層體,其特徵在於:無機粒子為碳酸鹽。 (12) The electrically conductive laminated body according to (1) above, wherein the inorganic particles are carbonates.

(13)一種顯示體,其係使用記載於前述(1)之導電積層體,或記載於前述(3)、(4)、(5)、(8)中任一項之圖案化導電積層體。 (13) A display body using the conductive laminated body according to (1) above, or the patterned conductive laminated body described in any one of the above (3), (4), (5), and (8) .

(14)一種觸控面板,其係使用記載於前述(13)之顯示體。 (14) A touch panel using the display body described in the above (13).

(15)一種電子紙,其係使用記載於前述(13)之顯示體。 (15) An electronic paper using the display body described in the above (13).

根據本發明,能夠提供形成圖案後提高圖案部分之非辨識性的導電積層體,及圖案部分之非辨識性高的圖案化導電積層體。 According to the present invention, it is possible to provide a conductive laminated body in which the pattern portion is improved after the pattern is formed, and a patterned conductive laminated body in which the pattern portion is highly unrecognizable.

1‧‧‧基材 1‧‧‧Substrate

2‧‧‧導電層 2‧‧‧ Conductive layer

3‧‧‧金屬系線狀結構體 3‧‧‧Metal linear structure

4‧‧‧無機粒子 4‧‧‧Inorganic particles

5‧‧‧孔隙 5‧‧‧ pores

6‧‧‧基質 6‧‧‧Material

7‧‧‧底塗層 7‧‧‧Undercoat

8‧‧‧導電區域 8‧‧‧Electrical area

9‧‧‧非導電區域 9‧‧‧ Non-conducting area

10‧‧‧內面底塗層 10‧‧‧Inner primer

11‧‧‧從垂直於積層面的方向所觀察的導電面 11‧‧‧ Conductive surfaces observed from a direction perpendicular to the layer

12‧‧‧單一纖維狀導電體 12‧‧‧Single fibrous electrical conductor

13‧‧‧纖維狀導電體的集合體 13‧‧‧A collection of fibrous conductors

14‧‧‧奈米線 14‧‧‧Nami line

15‧‧‧針狀導電體 15‧‧‧ Needle-shaped electrical conductor

16‧‧‧藉由纖維狀導電體之重疊所形成的接點 16‧‧‧Contacts formed by the overlap of fibrous conductors

17‧‧‧藉由奈米線之重疊所形成的接點 17‧‧‧Contacts formed by the overlap of the nanowires

18‧‧‧藉由針狀導電體之重疊所形成的接點 18‧‧‧Contacts formed by the overlap of needle-like conductors

19‧‧‧導電積層體 19‧‧‧Electrical laminate

20‧‧‧導電積層體之基材 20‧‧‧Substrate of conductive laminate

21‧‧‧導電積層體之導電層 21‧‧‧ Conductive layer of conductive laminate

22‧‧‧用於積層導電積層體的接合層 22‧‧‧Connection layer for laminated conductive laminates

23‧‧‧畫面側的基材 23‧‧‧Material on the side of the screen

24‧‧‧硬塗層 24‧‧‧hard coating

25‧‧‧易接著層 25‧‧‧Easy layer

第1圖係本發明之底塗層包含無機粒子之導電積層體的截面模式圖。 Fig. 1 is a schematic cross-sectional view showing a conductive laminate of an undercoat layer containing inorganic particles of the present invention.

第2圖係本發明之導電層包含無機粒子之導電積層體的截面模式圖。 Fig. 2 is a schematic cross-sectional view showing a conductive laminate of a conductive layer of the present invention comprising inorganic particles.

第3圖係本發明之內面硬塗層包含無機粒子之導電積層體的截面模式圖。 Fig. 3 is a schematic cross-sectional view showing the inner surface hard coat layer of the present invention comprising a conductive laminate of inorganic particles.

第4圖係本發明之易接著層包含無機粒子之導電積層體的截面模式圖。 Fig. 4 is a schematic cross-sectional view showing a conductive laminate of an inorganic particle in the easy-adhesion layer of the present invention.

第5圖係本發明之底塗層包含孔隙之圖案化導電積層體的截面模式圖。 Figure 5 is a cross-sectional schematic view of a patterned electrically conductive laminate of the undercoat layer of the present invention comprising pores.

第6圖係本發明之圖案化導電層包含孔隙之圖案化導電積層體的截面模式圖。 Figure 6 is a cross-sectional schematic view of a patterned conductive laminate of the present invention in which the patterned conductive layer comprises voids.

第7圖係本發明之內面硬塗層包含孔隙之圖案化導電積層體的截面模式圖。 Figure 7 is a cross-sectional schematic view of the patterned electrically conductive laminate of the inner surface hard coat layer of the present invention comprising pores.

第8圖係本發明之易接著層包含孔隙之圖案化導電積層體的截面模式圖。 Figure 8 is a cross-sectional schematic view of the patterned electrically conductive laminate of the present invention having an easy-to-adhere layer comprising voids.

第9圖係具有網絡結構之金屬系線狀結構體的範例。 Fig. 9 is an example of a metal-based linear structure having a network structure.

第10圖係搭載本發明之導電積層體而成的觸控面板。 Fig. 10 is a touch panel in which the electrically conductive laminated body of the present invention is mounted.

[導電積層體] [Electrically conductive laminate]

本發明之導電積層體係基材之至少單面具有導電層。亦即,僅基材之單面具有導電層,或亦可為基材之雙面具有導電層。導電層係在包含具有交聯結構之高分子的基質中含有具有包含金屬系線狀結構體之網絡結構的導電成分而成者。若具有包含金屬系線狀結構體之網絡結構的導電成分為隨機的配向,則因除了導電性及耐久性之外亦能夠獲得良好的光學特性,所以使用本發明之導電積層體的顯示體因顯示畫面變得鮮明而佳。導電積層體根據需要亦能夠賦予硬塗層和底塗層等的各種功能性層。硬塗層能夠設置於形成有導電積層體之導電層之側的最表層、或夾住基材而在反側的最表層。硬塗層主要為了提升表面強度或防污性、耐指紋性等而設置,再者亦能夠在表面形成細微凹凸而賦予防眩光性。作為硬塗層,從硬化之際的透明性、硬度等之特性優良的觀點而言,能夠適當地使用熱硬化型、紫外線硬化型的丙烯酸系樹脂。底塗層係設置於基材及導電層之間,主要以提升基材及導電層之密著性為目的而設置。底塗層從與基材、導電層之密著性、透明性的觀點而言,能夠適當地使用熱硬化型或紫外線硬化型的聚酯系樹脂或丙烯 酸系樹脂。若本發明之導電積層體在前述任意層中包含後述之無機粒子,能夠在圖案化後展現圖案之非辨識性變佳的效果。又,若導電層或底塗層包含無機粒子,則因採用化學蝕刻法時與導電層之圖案化同時展現圖案之非辨識性變佳的效果,所以從步驟數目減少所導致之製造成本削減的觀點而言,期望導電層及/或底塗層包含無機粒子。 The conductive laminate system substrate of the present invention has a conductive layer on at least one side thereof. That is, only one side of the substrate has a conductive layer, or it may have a conductive layer on both sides of the substrate. The conductive layer is composed of a conductive component having a network structure including a metal-based linear structure in a matrix containing a polymer having a crosslinked structure. When the conductive component having the network structure including the metal-based linear structure has a random alignment, since good optical characteristics can be obtained in addition to conductivity and durability, the display body of the conductive laminate of the present invention is used. The display becomes clear and good. The conductive laminate can also impart various functional layers such as a hard coat layer and an undercoat layer as needed. The hard coat layer can be provided on the outermost layer on the side where the conductive layer of the conductive laminate is formed, or the outermost layer on the opposite side sandwiching the substrate. The hard coat layer is mainly provided for the purpose of improving surface strength, antifouling property, fingerprint resistance, etc., and it is also possible to form fine unevenness on the surface to impart antiglare property. As the hard coat layer, a thermosetting type or an ultraviolet curable type acrylic resin can be suitably used from the viewpoint of excellent properties such as transparency and hardness during curing. The undercoat layer is provided between the substrate and the conductive layer, and is mainly provided for the purpose of improving the adhesion between the substrate and the conductive layer. From the viewpoint of adhesion to the substrate and the conductive layer, and transparency, the undercoat layer can be suitably used as a thermosetting type or an ultraviolet curing type polyester resin or propylene. Acid resin. When the conductive laminate of the present invention contains inorganic particles described later in any of the above layers, it is possible to exhibit an effect of improving the non-recognition of the pattern after patterning. Further, when the conductive layer or the undercoat layer contains inorganic particles, the effect of the non-recognition of the pattern is improved at the same time as the patterning of the conductive layer by the chemical etching method, so that the manufacturing cost is reduced due to the reduction in the number of steps. From a viewpoint, it is desirable that the conductive layer and/or the undercoat layer contain inorganic particles.

[基材] [substrate]

作為本發明導電積層體之基材的材料,具體上能夠舉例透明樹脂、玻璃等。作為樹脂,能夠舉出聚乙烯對苯二甲酸酯(PET)、聚萘二甲酸乙二酯(PEN)等的聚酯、聚醯胺、聚醯亞胺、聚苯硫、聚芳醯胺、聚乙烯、聚丙烯、聚苯乙烯、聚乳酸、聚氯乙烯、聚碳酸酯、聚甲基丙烯酸甲酯等的丙烯酸系.甲基丙烯酸系樹脂、脂環式丙烯酸樹脂、環烯樹脂、三乙醯纖維素、丙烯腈-丁二烯-苯乙烯共聚合成樹脂(ABS)、聚乙酸乙烯酯、三聚氰胺系樹脂、酚系樹脂、聚氯乙烯和聚偏二氯乙烯等之含氯原子(Cl原子)的樹脂、含氟原子(F原子)的樹脂、矽氧系樹脂及彼等樹脂的混合及/或共聚合者,作為玻璃,能夠使用通常的鈉玻璃。又,亦能夠組合使用彼等複數種基材。例如亦可為組合樹脂及玻璃的基材、積層2種以上樹脂的基材等的複合基材。基材的形狀可為厚度250μm以下且能夠捲取的薄膜,或即便為厚度大於250μm的基板亦可具有後述之全光線透光率之區域。從成本、生產性、處理性等的觀點而言,以250μm以下的樹脂薄 膜為佳,較佳為190μm以下、更佳為150μm以下、特佳為100μm以下的樹脂薄膜。使用樹脂薄膜作為基材時,能夠適用未延伸、單軸延伸、雙軸延伸樹脂而形成薄膜者。彼等樹脂薄膜之中,從成為基材的成形性、透明性等的光學特性、生產性等的觀點而言,以能夠使用聚乙烯對苯二甲酸酯(PET)、聚萘二甲酸乙二酯(PEN)等的聚酯薄膜、又與PEN之混合及/或共聚合的PET薄膜、聚丙烯薄膜為佳。還有,使用於基材之樹脂薄膜亦可為設置易接著層於單面或雙面的易接著薄膜。 Specific examples of the material of the substrate of the electrically conductive laminate of the present invention include a transparent resin, glass, and the like. Examples of the resin include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyamines, polyimine, polyphenylene sulfide, and polyarsenamide. Polyethylene, polypropylene, polystyrene, polylactic acid, polyvinyl chloride, polycarbonate, polymethyl methacrylate, etc. Methacrylic resin, alicyclic acrylic resin, cycloolefin resin, triacetyl cellulose, acrylonitrile-butadiene-styrene copolymer synthetic resin (ABS), polyvinyl acetate, melamine resin, phenol resin Mixing and/or copolymerizing a resin containing a chlorine atom (Cl atom) such as polyvinyl chloride or polyvinylidene chloride, a fluorine atom-containing (F atom) resin, a ruthenium-oxygen resin, and a resin thereof Glass can be used with usual soda glass. Further, it is also possible to use a plurality of substrates in combination. For example, a composite substrate such as a base material of a combination resin or glass or a base material of two or more types of resin may be used. The shape of the substrate may be a film having a thickness of 250 μm or less and capable of being wound up, or a substrate having a thickness of more than 250 μm may have a region of total light transmittance described later. From the viewpoints of cost, productivity, handling, etc., the resin is thinner than 250 μm. The film is preferably a resin film of 190 μm or less, more preferably 150 μm or less, and particularly preferably 100 μm or less. When a resin film is used as the substrate, it is possible to apply a film which is not stretched, uniaxially stretched, or biaxially stretched to form a film. Among the resin films, polyethylene terephthalate (PET) or polyethylene naphthalate can be used from the viewpoints of optical properties such as moldability and transparency of the substrate, productivity, and the like. A polyester film such as a diester (PEN) or a PET film or a polypropylene film which is mixed and/or copolymerized with PEN is preferred. Further, the resin film used for the substrate may be an easy-adhesion film provided with an easy-to-attach layer on one side or both sides.

[金屬系線狀結構體] [Metal-based linear structure]

作為本發明的金屬系線狀結構體,能夠舉例纖維狀導電體、奈米線、晶鬚或如奈米棒的針狀導電體等。還有,所謂纖維狀係指縱橫比=長軸的長度(金屬系線狀結構體的長度)/短軸的長度(金屬系線狀結構體的直徑)大於10。形狀係無特別之限制,可為直線狀或曲線狀,亦可為其中一部分具有直線部分及/或曲線部分的形狀。所謂奈米晶鬚,係指如例示於第7圖之符號14,呈圓弧形狀的結構體,所謂針狀係指例如第7圖中例示於符號15,呈直線形狀的結構體。還有,金屬系線狀結構體,除了單獨存在之外,亦形成集合體而存在。集合體可為例如金屬系線狀結構體的配置方向性無規則性且隨機集合的狀態,又亦可為金屬系線狀結構體長軸方向之表面彼此平行地集合的狀態。作為長軸方向表面彼此平行地集合的狀態範例,已知有形成所謂束(bundle)的集合體,亦可為金屬系線狀結構體具有類似的束結構。本發明中 較佳地被使用的金屬系線狀結構體為金屬奈米線,作為金屬奈米線的金屬組成係無特別之限制,能夠由貴金屬元素、貴金屬氧化物和卑金屬元素之1種或複數種金屬所構成,但以屬於包含貴金屬(例如金、鉑、銀、鈀、銠、銥、釕、鋨等)及鐵、鈷、銅、錫之群組的至少1種金屬為佳,從導電性的觀點而言,較佳為至少包含銀。能夠使用作為金屬系線狀結構體的貴金屬和貴金屬氧化物的奈米晶鬚,係記載於日本特表2009-505358號公報、日本特開2009-129607號公報、日本特開2009-070660號公報,又作為金屬氧化物的晶鬚或如纖維狀的針狀結晶,市售有例如其為鈦酸鉀纖維與錫及銻系氧化物的複合氧化物的DENTALL WK系列(大塚化學股份有限公司製)的WK200B、WK300R、WK500。 The metal-based linear structure of the present invention may, for example, be a fibrous conductor, a nanowire, a whisker or a needle-like conductor such as a nanorod. In addition, the term "fibrous" means the aspect ratio = the length of the long axis (the length of the metal-based linear structure) / the length of the short axis (the diameter of the metal-based linear structure) is more than 10. The shape is not particularly limited, and may be linear or curved, or may have a shape in which a part has a straight portion and/or a curved portion. The term "nano whisker" refers to a structure having an arc shape as exemplified in reference numeral 14 in Fig. 7, and the needle-like shape is, for example, a structure having a linear shape as exemplified in reference numeral 15 in Fig. 7. Further, the metal-based linear structure exists in addition to being formed alone, and forms an aggregate. The aggregate may be, for example, a state in which the arrangement direction of the metal-based linear structures is irregular and randomly collected, or a state in which the surfaces of the long-axis directions of the metal-based linear structures are gathered in parallel. As an example of a state in which the long-axis direction surfaces are arranged in parallel with each other, an aggregate forming a so-called bundle is known, and the metal-based linear structure may have a similar bundle structure. In the present invention The metal-based linear structure to be preferably used is a metal nanowire, and the metal composition of the metal nanowire is not particularly limited, and may be one or more of a noble metal element, a noble metal oxide, and a base metal element. It is composed of a metal, but it is preferably at least one metal belonging to a group containing a noble metal (for example, gold, platinum, silver, palladium, rhodium, iridium, ruthenium, osmium, etc.) and iron, cobalt, copper, or tin. From the viewpoint, it is preferred to contain at least silver. The nanowhisker which can be used as the metal-based linear structure of the noble metal and the noble metal oxide is described in Japanese Laid-Open Patent Publication No. 2009-505358, JP-A-2009-129607, and JP-A-2009-070660 Further, as a whisker of a metal oxide or a needle-like crystal such as a fiber, a DENTALL WK series, which is a composite oxide of potassium titanate fiber and tin and a lanthanide oxide, is commercially available (manufactured by Otsuka Chemical Co., Ltd.). ) WK200B, WK300R, WK500.

[網絡結構] [Network Structure]

本發明中所謂網絡結構係指針對導電層內之個別金屬系線狀結構體時,具有如與其它金屬系線狀結構體之接點數平均至少大於1個的分散結構。此時接點可形成於金屬系線狀結構體之任何部分之間,亦可為金屬系線狀結構體之末端部彼此連接、同時末端與金屬系線狀結構體末端以外的部分連接、同時金屬系線狀結構體末端以外的部分彼此連接。此處,所謂連接係指該接點接合,或亦可僅單純地接觸。還有,導電層中之金屬系線狀結構體中,亦可存在一部分未造成網絡之形成(亦即接點為0,且與網絡為獨立而存在著)的金屬系線狀結構體。 In the present invention, the network structure refers to a dispersion structure in which the number of contacts of the other metal-based linear structures is at least one more than that of the individual metal-based linear structures in the conductive layer. In this case, the contacts may be formed between any portion of the metal-based linear structure, or the end portions of the metal-based linear structures may be connected to each other, and the ends may be connected to portions other than the ends of the metal-based linear structures, and Portions other than the ends of the metal-based linear structures are connected to each other. Here, the term "connection" means that the contacts are joined, or may be simply contacted. Further, in the metal-based linear structure in the conductive layer, a part of the metal-based linear structure which does not cause formation of a network (that is, the contact is 0 and exists independently of the network) may be present.

[基質] [matrix]

本發明之導電層係以包含於包含前述金屬系線狀結構體具有交聯結構之高分子的基質中為佳。 The conductive layer of the present invention is preferably contained in a matrix comprising a polymer having a crosslinked structure of the metal-based linear structure.

作為基質成分,能夠舉出有機或無機系的高分子等。 Examples of the matrix component include organic or inorganic polymers.

作為無機系高分子,能夠舉出無機系的氧化物等,能夠舉例由三烷氧基矽烷類等,藉由水解.聚合反應所形成的矽氧化物,或藉由噴濺沉積法所形成的矽氧化物。 The inorganic polymer may, for example, be an inorganic oxide or the like, and may be, for example, a lanthanum oxide formed by hydrolysis or polymerization by a trialkoxy decane or the like, or formed by a sputtering deposition method. Niobium oxide.

作為使用於此種情況的三烷氧基矽烷類,能夠舉出四甲氧基矽烷、四乙氧基矽烷、四正丙氧矽烷、四異丙氧基矽烷、四正丁氧基矽烷等的四烷氧基矽烷類,甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、正丙基三甲氧基矽烷、正丙基三乙氧基矽烷、異丙基三甲氧基矽烷、異丙基三乙氧基矽烷、正丁基三甲氧基矽烷、正丁基三乙氧基矽烷、正戊基三甲氧基矽烷、正戊基三乙氧基矽烷、正己基三甲氧基矽烷、正庚基三甲氧基矽烷、正辛基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、環己基三甲氧基矽烷、環己基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、3-氯丙基三甲氧基矽烷、3-氯丙基三乙氧基矽烷、3,3,3-三氟丙基三甲氧基矽烷、3,3,3-三氟丙基三乙氧基矽烷、2-羥乙基三甲氧基矽烷、2-羥乙基三乙氧基矽烷、2-羥丙基三甲氧基矽烷、2-羥丙基三乙氧基矽烷、3-羥丙基三甲氧基矽烷、3-羥丙基三 乙氧基矽烷、3-縮水甘油丙基三甲氧基矽烷、3-縮水甘油丙基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三乙氧基矽烷、3-(甲基)丙烯醯氧丙基三甲氧基矽烷、3-(甲基)丙烯醯氧丙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、丙烯基三甲氧基矽烷、乙烯基三乙醯氧基矽烷等。 Examples of the trialkoxy decane used in this case include tetramethoxy decane, tetraethoxy decane, tetra-n-propoxy decane, tetraisopropoxy decane, tetra-n-butoxy decane, and the like. Tetraalkoxydecanes, methyltrimethoxydecane, methyltriethoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, n-propyltrimethoxydecane, n-propyltriethyl Oxydecane, isopropyltrimethoxydecane, isopropyltriethoxydecane, n-butyltrimethoxydecane, n-butyltriethoxydecane, n-pentyltrimethoxydecane, n-pentyltrifoxide Ethoxy decane, n-hexyl trimethoxy decane, n-heptyltrimethoxy decane, n-octyltrimethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, cyclohexyl trimethoxy decane, Cyclohexyltriethoxydecane, phenyltrimethoxydecane, phenyltriethoxydecane, 3-chloropropyltrimethoxydecane, 3-chloropropyltriethoxydecane, 3,3,3- Trifluoropropyltrimethoxydecane, 3,3,3-trifluoropropyltriethoxydecane, 2-hydroxyethyltrimethoxydecane, 2-hydroxyethyl Triethoxysilane Silane, trimethoxy Silane 2-hydroxypropyl, 2-hydroxypropyl triethoxysilane Silane, trimethoxy Silane 3-hydroxypropyl, 3-hydroxypropyl three Ethoxy decane, 3-glycidyl propyl trimethoxy decane, 3-glycidyl propyl triethoxy decane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxy decane, 2-( 3,4-epoxycyclohexyl)ethyltriethoxydecane, 3-(meth)acryloxypropyltrimethoxydecane, 3-(methyl)propenyloxypropyltriethoxydecane, Vinyl trimethoxy decane, vinyl triethoxy decane, propylene trimethoxy decane, vinyl triethoxy decane, and the like.

作為有機系高分子,能夠舉出熱硬化性樹脂、光硬化性樹脂等,能夠舉例聚酯系樹脂、聚碳酸酯樹脂、丙烯酸系樹脂、甲基丙烯酸系樹脂、環氧系樹脂、耐綸或苯胍等的聚醯胺系樹脂、ABS樹脂、聚醯亞胺系樹脂、聚乙烯或聚丙烯等的烯烴系樹脂、聚苯乙烯樹脂、聚乙酸乙烯酯樹脂、三聚氰胺系樹脂、酚系樹脂、聚氯乙烯或聚偏二氯乙烯等的含氯原子(Cl原子)樹脂、含氟原子(F原子)樹脂、矽氧系樹脂、纖維素系樹脂等的有機系高分子,亦可為在彼等高分子的結構內具有交聯結構者,和使彼等高分子及交聯劑反應而形成交聯高分子者。亦可基於所需要之特性而從彼等有機系高分子選擇至少1種,又亦可從彼等混合使用2種以上。彼等有機系高分子中,以包含含有具有3個以上碳-碳雙鍵基之化合物進行聚合反應之結構的高分子為佳。此種有機系高分子能夠以包含選自包含具有3個以上含碳-碳雙鍵之官能基的單體、寡聚物、聚合物之群組之1種以上的組成物作為原料,藉由以碳-碳雙鍵為反應點進行聚合反應而獲得。 Examples of the organic polymer include a thermosetting resin and a photocurable resin, and examples thereof include a polyester resin, a polycarbonate resin, an acrylic resin, a methacrylic resin, an epoxy resin, and nylon. Benzoquinone Polyamide type resin, ABS resin, polyimide resin, olefin resin such as polyethylene or polypropylene, polystyrene resin, polyvinyl acetate resin, melamine resin, phenol resin, polychlorinated resin The organic polymer such as a chlorine atom (Cl atom) resin such as ethylene or polyvinylidene chloride, a fluorine atom (F atom) resin, a ruthenium oxide resin or a cellulose resin may be at the same height. Those having a crosslinked structure in the structure of a molecule and reacting them with a polymer and a crosslinking agent to form a crosslinked polymer. At least one type of the organic polymer may be selected based on the required characteristics, or two or more types may be used in combination. Among the organic polymers, a polymer containing a structure containing a compound having three or more carbon-carbon double bond groups for polymerization reaction is preferred. Such an organic polymer can be used as a raw material by including at least one component selected from the group consisting of a monomer having three or more functional groups containing a carbon-carbon double bond, an oligomer, and a polymer. It is obtained by carrying out a polymerization reaction using a carbon-carbon double bond as a reaction point.

作為含碳-碳雙鍵的官能基,能夠舉例乙烯基、異丙烯基、異戊烯基、烯丙基、丙烯醯基、甲基丙烯醯基、丙烯醯氧基、甲基丙烯醯氧基、甲基丙烯酸基、丙烯醯胺基、甲基丙烯醯胺基、亞烯丙基、亞丙炔基(allylidyne)、乙烯基醚基、或將鍵結於構成彼等基之碳-碳雙鍵之碳的氫取代成氟或氯等的鹵素原子者(例如氟化乙烯基、二氟亞乙烯基、氯化乙烯基、二氯亞乙烯基等)。除了彼等以外,亦能夠舉出包含如將具有苯基或萘基等芳香環鍵結於碳-碳雙鍵之碳的取代基(例如苯乙烯基等)、或丁二烯基(例如CH2=C(R1)-C(R2)=CH-、CH2=C(R1)-C(=CH2)-(R1、R2係H或CH3))之具有共軛多烯結構之基等。考慮所需要之特性和生產性等,亦可從彼等混合使用1種或2種以上。 As the functional group having a carbon-carbon double bond, a vinyl group, an isopropenyl group, an isopentenyl group, an allyl group, an acrylonitrile group, a methacryl fluorenyl group, an acryloxy group, a methacryloxy group can be exemplified. a methacrylic acid group, a acrylamide group, a methacrylamide group, an allyl group, an allylidyne group, a vinyl ether group, or a carbon-carbon double bond bonded to a group thereof The hydrogen of the carbon of the bond is substituted with a halogen atom such as fluorine or chlorine (for example, a fluorinated vinyl group, a difluorovinylidene group, a vinyl chloride group, a dichlorovinylidene group, or the like). In addition to these, a substituent (for example, a styryl group or the like) or a butadienyl group (for example, CH) containing a carbon having an aromatic ring such as a phenyl group or a naphthyl group bonded to a carbon-carbon double bond may be mentioned. 2 = C(R1)-C(R2)=CH-, CH 2 =C(R1)-C(=CH 2 )-(R1, R2 is H or CH 3 )) having a conjugated polyene structure Wait. One or two or more kinds may be used in combination depending on the characteristics and productivity required.

作為具有3個以上賦予聚合反應之碳-碳雙鍵的化合物,能夠舉例新戊四醇三丙烯酸酯、新戊四醇三甲基丙烯酸酯、新戊四醇四丙烯酸酯、新戊四醇四甲基丙烯酸酯、新戊四醇乙氧基三丙烯酸酯、新戊四醇乙氧基三甲基丙烯酸酯、新戊四醇乙氧基四丙烯酸酯、新戊四醇乙氧基四甲基丙烯酸酯、二新戊四醇三丙烯酸酯、二新戊四醇三甲基丙烯酸酯、二新戊四醇四丙烯酸酯、二新戊四醇四甲基丙烯酸酯、二新戊四醇五丙烯酸酯、二新戊四醇五甲基丙烯酸酯、二新戊四醇六丙烯酸酯、二新戊四醇六甲基丙烯酸酯、三羥甲丙烷三丙烯酸酯、三羥甲丙烷三甲基丙烯酸酯、三羥甲丙烷乙氧基三丙烯酸酯、三羥甲丙烷乙氧基三甲基丙烯酸酯、二-三羥 甲丙烷三丙烯酸酯、二-三羥甲丙烷三甲基丙烯酸酯、二-三羥甲基丙烷四丙烯酸酯、二-三羥甲基丙烷四甲基丙烯酸酯、丙三醇丙氧基三丙烯酸酯、丙三醇丙氧基三甲基丙烯酸酯、或環丙烷環、環丁烷環、環戊烷環、環己烷環等之分子內具有環狀骨架的化合物(例如三丙烯酸酯、三甲基丙烯酸酯、四丙烯酸酯、四甲基丙烯酸酯、五丙烯酸酯、五甲基丙烯酸酯、六丙烯酸酯、六甲基丙烯酸酯等)、或將彼等化合物之一部分改質的化合物(例如以2-羥丙酸等改質的2-羥丙酸改質新戊四醇三丙烯酸酯、2-羥丙酸改質新戊四醇三甲基丙烯酸酯、2-羥丙酸改質新戊四醇四丙烯酸酯、2-羥丙酸改質新戊四醇四甲基丙烯酸酯、又將矽氧烷骨架導入之矽氧烷三丙烯酸酯、矽氧烷三甲基丙烯酸酯、矽氧烷四丙烯酸酯、矽氧烷四甲基丙烯酸酯、矽氧烷五丙烯酸酯、矽氧烷五甲基丙烯酸酯、矽氧烷六丙烯酸酯、矽氧烷六甲基丙烯酸酯等)、或骨架內與乙烯基及/或亞乙烯基同時具有其它骨架的化合物(例如具有胺基甲酸酯骨架的胺基甲酸酯三丙烯酸酯、胺基甲酸酯三甲基丙烯酸酯、胺基甲酸酯四丙烯酸酯、胺基甲酸酯四甲基丙烯酸酯、胺基甲酸酯五丙烯酸酯、胺基甲酸酯五甲基丙烯酸酯、胺基甲酸酯六丙烯酸酯、胺基甲酸酯六甲基丙烯酸酯、具有醚骨架的聚醚三丙烯酸酯、聚醚三甲基丙烯酸酯、聚醚四丙烯酸酯、聚醚四甲基丙烯酸酯、聚醚五丙烯酸酯、聚醚五甲基丙烯酸酯、聚醚六丙烯酸酯、聚醚六甲基丙烯酸酯、具有來自環氧基之骨架的環氧基三丙烯酸酯、環氧基三 甲基丙烯酸酯、環氧基四丙烯酸酯、環氧基四甲基丙烯酸酯、環氧基五丙烯酸酯、環氧基五甲基丙烯酸酯、環氧基六丙烯酸酯、環氧基六甲基丙烯酸酯、具有酯骨架之聚酯三丙烯酸酯、聚酯三甲基丙烯酸酯、聚酯四丙烯酸酯、聚酯四甲基丙烯酸酯、聚酯五丙烯酸酯、聚酯五甲基丙烯酸酯、聚酯六丙烯酸酯、聚酯六甲基丙烯酸酯等)。考慮用途和所需要之特性和生產性等,彼等能夠使用以單體聚合者或者混合2種以上之以單體聚合者的組成物、又由共聚合2種以上之二聚物以上的寡聚物所形成的組成物,且彼等並無特別之限制。彼等化合物之中,更佳為能夠使用4個以上賦予聚合反應之碳-碳雙鍵基,亦即4官能以上之化合物。4官能以上之化合物能夠舉例前述4官能的四丙烯酸酯、四甲基丙烯酸酯、5官能的五丙烯酸酯、五甲基丙烯酸酯、6官能的六丙烯酸酯、六甲基丙烯酸酯等,再者亦可為7官能以上者。 As a compound having three or more carbon-carbon double bonds imparting a polymerization reaction, neopentyl alcohol triacrylate, neopentyl alcohol trimethacrylate, neopentyl alcohol tetraacrylate, and neopentyl alcohol can be exemplified. Methacrylate, pentaerythritol ethoxy triacrylate, pentaerythritol ethoxy trimethacrylate, pentaerythritol ethoxy tetraacrylate, neopentyl alcohol ethoxytetramethyl Acrylate, dipentaerythritol triacrylate, dipentaerythritol trimethacrylate, dipentaerythritol tetraacrylate, dipentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate Ester, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate , trimethylolpropane ethoxy triacrylate, trimethylolpropane ethoxy trimethacrylate, di-trishydroxy Propane triacrylate, di-trimethylolpropane trimethacrylate, di-trimethylolpropane tetraacrylate, di-trimethylolpropane tetramethacrylate, glycerol propoxy triacrylate a compound having a cyclic skeleton in an molecule such as an ester, glycerol propoxytrimethacrylate, or a cyclopropane ring, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring or the like (for example, triacrylate, three) a methacrylate, tetraacrylate, tetramethacrylate, pentaacrylate, pentamethyl acrylate, hexaacrylate, hexamethacrylate, etc., or a compound that partially modifies one of their compounds (eg Modified 2-hydroxypropionic acid modified neopentyl alcohol triacrylate, 2-hydroxypropionic acid modified pentaerythritol trimethacrylate, 2-hydroxypropionic acid modified with 2-hydroxypropionic acid Pentaerythritol tetraacrylate, 2-hydroxypropionic acid modified neopentaerythritol tetramethacrylate, oxirane triacrylate, helium oxide trimethacrylate, helium oxygen introduced into the oxoxane skeleton Alkyl tetraacrylate, decane tetramethacrylate, decane pentoxide, decyl pentoxide a olefinic acid ester, a decyl hexaacrylate, a decyl hexamethacrylate, or the like, or a compound having a skeleton other than a vinyl group and/or a vinylidene group in the skeleton (for example, having a urethane skeleton) Urethane triacrylate, urethane trimethacrylate, urethane tetraacrylate, urethane tetramethacrylate, urethane pentaacrylate, amine Carbamate pentamethacrylate, urethane hexaacrylate, urethane hexamethacrylate, polyether triacrylate with ether backbone, polyether trimethacrylate, polyether Tetraacrylate, polyether tetramethacrylate, polyether pentaacrylate, polyether pentamethacrylate, polyether hexaacrylate, polyether hexamethacrylate, epoxy having a skeleton derived from an epoxy group Triacrylate, epoxy III Methacrylate, epoxy tetraacrylate, epoxy tetramethacrylate, epoxy pentaacrylate, epoxy penta methacrylate, epoxy hexaacrylate, epoxy hexamethyl Acrylate, polyester triacrylate with ester backbone, polyester trimethacrylate, polyester tetraacrylate, polyester tetramethacrylate, polyester pentaacrylate, polyester penta methacrylate, poly Ester hexaacrylate, polyester hexamethacrylate, etc.). In consideration of the use, the required properties, the productivity, and the like, it is possible to use a monomer which is polymerized by a monomer or a mixture of two or more monomers, and a copolymer of two or more kinds of dimers or more. The composition formed by the polymer is not particularly limited. Among these compounds, it is more preferable to use four or more carbon-carbon double bond groups which impart a polymerization reaction, that is, a compound having four or more functions. The tetrafunctional or higher compound can be exemplified by the above-mentioned tetrafunctional tetraacrylate, tetramethacrylate, 5-functional pentaacrylate, pentamethyl acrylate, 6-functional hexaacrylate, hexamethacrylate, etc. It can also be 7 or more.

彼等化合物作為具體市售者能夠舉例共榮社化學股份有限公司製的輕丙烯酸酯系列、輕酯系列、環氧酯系列、胺基甲酸酯丙烯酸酯AH系列、胺基甲酸酯丙烯酸酯AT系列(Urethane Acrylate AT series)、胺基甲酸酯丙烯酸酯UA系列(Urethane Acrylate UA series)、Daicel.Cytec股份有限公司製的EBECRYL系列、PETIA、TMPTA、TMPEOTA、OTA 480、DPHA、PETA-K、綜研化學股份有限公司製的Full Cure系列、東洋油墨製造股份有限公司製的「LIODURAS」(註冊商標)系列、中國塗料股份有限公司製的Folder Seed series、MATSUI CHEMICAL股份有限公司製的EXP系列、Daicel.Cytec股份有限公司製的EBECRYL1360、信越化學工業股份有限公司製的X-12-2456系列等。 As a specific commercial product, these compounds can be exemplified by the light acrylate series, the light ester series, the epoxy ester series, the urethane acrylate AH series, and the urethane acrylate manufactured by Kyoei Chemical Co., Ltd. AT series (Urethane Acrylate AT series), Urethane Acrylate UA series, Daicel. EBECRYL series, PETIA, TMPTA, TMPEOTA, OTA 480, DPHA, PETA-K, "Full Cure series" by Synthetic Chemical Co., Ltd., and "LIODURAS" (registered trademark) by Toyo Ink Manufacturing Co., Ltd. Series, China Seed Co., Ltd., Frozen Seed series, MATSUI EXP series made by CHEMICAL Co., Ltd., Daicel. EBECRYL1360 manufactured by Cytec Co., Ltd., X-12-2456 series manufactured by Shin-Etsu Chemical Co., Ltd., etc.

[無機粒子] [Inorganic Particles]

本發明之導電積層體係以其任意層中包含無機粒子為佳。藉由以藥劑處理溶解層中之無機粒子而產生孔隙而發揮變化光學特性的效果。 The electroconductive laminate system of the present invention preferably contains inorganic particles in any of its layers. The effect of changing optical characteristics is exhibited by treating the inorganic particles in the dissolution layer with a drug to generate pores.

本發明能夠藉由使用各種碳酸鹽和氧化鋅、氧化錫、ITO等之酸處理所溶解的無機化合物。其中特別從易與酸反應、對水或鹼性溶液、有機溶劑的安定性、和酸反應時容易產生二氧化碳而形成孔隙的觀點而言,以使用碳酸鹽為佳,特別地較佳為能夠使用取得容易且廉價的碳酸鈣。無機粒子的尺寸從能夠使包含無機粒子之層薄層化而言,以平均粒徑500nm以下為佳,為了抑制導電積層體之透光率低落、霧度值上升,較佳為平均粒徑300nm以下。此處所謂無機粒子的平均粒徑a係定義為從以長徑數目為基礎的分布曲線所獲得的眾數(mode)。又所謂長徑係個別的無機粒子每個在藉由顯微鏡所攝影之圖像上能夠被辨識的最長直徑。作為用於採取此種數據的方法,可使用例如以場發射型掃描電子顯微鏡(SEM)(日本電子股份有限公司製JSM-6700-F)觀察包含無機粒子層之截面的圖像。還有,本發明之無機粒子的平均粒徑係指:若為單分散則為該無機粒子的一次粒徑,若為凝集多個一次粒子的凝集體則為該凝集粒子的粒徑。粒子為凝集的狀態時,藉由顯微鏡攝影該凝集 體,將在圖像上能夠辨識之最長直徑視為粒子的長徑,以前述方法計算平均粒徑a。 In the present invention, the dissolved inorganic compound can be treated by using various carbonates and an acid such as zinc oxide, tin oxide, ITO or the like. Among them, from the viewpoints of easy reaction with an acid, stability to water or an alkaline solution, an organic solvent, and formation of pores by easily generating carbon dioxide upon reaction with an acid, it is preferred to use a carbonate, and it is particularly preferable to use it. Obtain easy and inexpensive calcium carbonate. The size of the inorganic particles is preferably such that the thickness of the layer containing the inorganic particles is less than 500 nm, and the average particle diameter is preferably 300 nm in order to suppress the light transmittance of the conductive laminated body from being lowered and the haze value is increased. the following. Here, the average particle diameter a of the inorganic particles is defined as a mode obtained from a distribution curve based on the number of long diameters. Also, the long diameter is the longest diameter that each of the individual inorganic particles can be recognized on the image photographed by the microscope. As a method for taking such data, an image including a cross section of the inorganic particle layer can be observed using, for example, a field emission type scanning electron microscope (SEM) (JSM-6700-F, manufactured by JEOL Ltd.). In addition, the average particle diameter of the inorganic particles of the present invention means the primary particle diameter of the inorganic particles in the case of monodispersion, and the aggregate particle size in the case of agglomerates in which a plurality of primary particles are aggregated. When the particles are in a state of agglutination, the agglutination is performed by microscopy The longest diameter that can be recognized on the image is regarded as the long diameter of the particle, and the average particle diameter a is calculated by the aforementioned method.

[孔隙] [pore]

本發明之圖案化導電層體係在非導電區域的任意層包含孔隙。該孔隙在非導電區域展現透光霧度值的減少及減少擴散反射光的效果。非導電區域係起因於相較於導電區域,金屬系線狀結構體較少而使透光霧度值及擴散反射光減少,本發明能夠藉由縮小如前述之光學特性的差異而獲得提升圖案之非辨識性的圖案化導電層體。 The patterned conductive layer system of the present invention comprises pores in any layer of the non-conductive region. The pores exhibit a reduction in the value of the transmitted haze value and a decrease in the effect of diffusing the reflected light in the non-conductive region. The non-conductive region is caused by a decrease in the light-transmitting haze value and the diffused reflection light due to the fact that the metal-based linear structure is smaller than the conductive region, and the present invention can obtain the lift pattern by reducing the difference in optical characteristics as described above. Non-identifiable patterned conductive layer body.

本發明之孔隙尺寸從能夠將包含孔隙之層薄層化而言,以平均孔隙直徑500nm以下為佳,為了抑制圖案化導電積層體之非導電區域的透光率低落、透光霧度值上升,並有效地獲得擴散反射光,較佳為平均孔隙直徑300nm以下。平均孔隙直徑的測定方法與前述之[無機粒子]項所記載之無機粒子的平均粒徑相同。此時,以能夠藉由SEM觀察圖像所確認之長徑10nm以上的孔隙為本發明之孔隙。 The pore size of the present invention is preferably from an average pore diameter of 500 nm or less in order to reduce the thickness of the layer containing the pores, and the light transmittance of the non-conductive region of the patterned conductive laminate is lowered, and the light transmittance is increased. And efficiently obtaining diffuse reflected light, preferably having an average pore diameter of 300 nm or less. The method of measuring the average pore diameter is the same as the average particle diameter of the inorganic particles described in the above [Inorganic Particles]. At this time, the pores having a major axis of 10 nm or more which can be confirmed by observation of the image by SEM are the pores of the present invention.

其次,說明孔隙的生成方法。本發明之孔隙係以溶解或分解前述無機粒子而生成。具體而言,能夠舉出將酸或鹼性溶液滲透含無機粒子之層,藉由化學反應溶解無機粒子而生成孔隙的方法,或藉由從外部施加以加熱或雷射等的能量將無機粒子分解而生成孔隙的方法。彼等方法中,從能夠對應於細微圖案化導電層與可以同時進行其它步驟、生產性良好的觀點而言,適用滲透溶液而藉由化學反應溶解無機粒子生成孔隙的方法。 Next, a method of generating pores will be described. The pores of the present invention are produced by dissolving or decomposing the aforementioned inorganic particles. Specifically, a method in which an acid or an alkaline solution is permeated into a layer containing inorganic particles, a chemical reaction dissolves the inorganic particles to form pores, or an inorganic particle is applied by external application of energy such as heat or laser. A method of decomposing to form pores. Among these methods, a method of dissolving inorganic particles to form pores by a chemical reaction is applied from the viewpoint of being able to correspond to a finely patterned conductive layer and performing other steps simultaneously with good productivity.

[含無機粒子之層] [layer containing inorganic particles]

本發明之含無機粒子之層能夠配置於導電積層體中的任意位置。例如能夠配置於基材及導電層之間作為底塗層,同時亦能夠配置於導電層之反面作為硬塗層。 The inorganic particle-containing layer of the present invention can be disposed at any position in the electrically conductive laminate. For example, it can be disposed between the substrate and the conductive layer as an undercoat layer, and can also be disposed on the reverse side of the conductive layer as a hard coat layer.

又,亦能夠在基質中或基材的易接著層中分散無機粒子而形成含無機粒子之層。 Further, it is also possible to form inorganic layer-containing layers by dispersing inorganic particles in a matrix or in an easy-adhesion layer of a substrate.

其中,以採用化學蝕刻法時在和導電層之圖案化同時展現圖案之非辨識性變佳的效果,及從步驟數減少導致之製造成本削減的觀點而言,期望將含無機粒子之層配置於導電層側。又,如[無機粒子]項所記載,為了獲得本發明之效果而使無機粒子之平均粒徑有較佳區域,含無機粒子之層係以恰足以包覆無機粒子之層厚為佳。具體而言,期望200nm以上的層厚,而層厚小於200nm時,則產生因不能被包覆之無機粒子所導致的凹凸而使透明性低落。又,由於溶解無機粒子時層內未能產生孔隙而流出,所以不能獲得本發明效果之光學特性的變化。還有,作為層厚的上限,從導電積層體的柔軟性、處理性等的觀點而言,以1μm以下為佳。從該層厚的觀點而言,含無機粒子之層係以形成層厚未對處理性和接觸電阻值造成影響的底塗層或基材的易接著層為佳。 Among them, in the case of using the chemical etching method, the effect of the non-recognition of the pattern is exhibited at the same time as the patterning of the conductive layer, and the layer containing the inorganic particles is desired from the viewpoint of reducing the manufacturing cost due to the reduction in the number of steps. On the side of the conductive layer. Further, as described in the item [Inorganic Particles], in order to obtain the effect of the present invention, the average particle diameter of the inorganic particles is preferably a region, and the layer containing the inorganic particles is preferably a layer thickness sufficient to coat the inorganic particles. Specifically, a layer thickness of 200 nm or more is desired, and when the layer thickness is less than 200 nm, irregularities due to inorganic particles that cannot be coated are generated, and transparency is lowered. Further, since the pores are not generated in the layer when the inorganic particles are dissolved, the optical characteristics of the effect of the present invention cannot be obtained. In addition, the upper limit of the layer thickness is preferably 1 μm or less from the viewpoint of flexibility, handleability, and the like of the conductive laminate. From the viewpoint of the layer thickness, the layer containing the inorganic particles is preferably formed into an easy-adhesion layer of the undercoat layer or the substrate which does not affect the handleability and the contact resistance value.

作為含無機粒子之層的組成能夠適當地使用具有與前述之記載於[基質]項相同的交聯結構的高分子。 As the composition of the layer containing the inorganic particles, a polymer having the same crosslinked structure as that described in the above [Substrate] can be suitably used.

本發明之含無機粒子之層雖然能夠配置於導電積層體的任意位置,但是以配置於基材及導電層之間為佳。 The inorganic particle-containing layer of the present invention can be disposed at any position of the conductive laminate, but is preferably disposed between the substrate and the conductive layer.

亦即,僅基材的單面具有導電層時,以基材及導電層之間具有含無機粒子之層為佳。 That is, when only one side of the substrate has a conductive layer, it is preferred to have a layer containing inorganic particles between the substrate and the conductive layer.

此外,基材之雙面具有導電層時,可為(i)形成於基材雙面的任意導電層及基材之間具有含無機粒子之層,亦可為(ii)形成於基材雙面之導電層中的任一導電層及基材之間具有含無機粒子之層。 Further, when the double-sided substrate has a conductive layer, it may be (i) a layer containing inorganic particles formed between any conductive layer and the substrate on both sides of the substrate, or (ii) formed on the substrate double A layer containing inorganic particles is provided between any one of the conductive layers and the substrate.

含無機粒子之層的形成方法係適當地使用在含無機粒子之層的組成物溶液中分散無機粒子並塗布於基材上的方法。塗布方法亦能夠舉出澆鑄、旋轉塗布、浸塗、棒塗布、噴塗、刮刀塗布、狹縫擠壓塗布、凹版塗布、逆塗法、網版印刷、模塗料、印刷轉印、噴墨等的濕式塗布法等,其中特別因藉由捲軸式(Roll to Roll)能夠均勻且生產性佳地塗布,所以以使用狹縫擠壓塗布和微凹版印刷(Micro-gravure)的濕式塗布法為佳。又,在將基材薄膜製膜時將已分散無機粒子之易接著層溶液塗布於未延伸薄膜後,亦能夠在經延伸之基材薄膜上形成含無機粒子的易接著層。 The method of forming the layer containing the inorganic particles is a method in which the inorganic particles are dispersed and applied to the substrate in a composition solution of the layer containing the inorganic particles as appropriate. Examples of the coating method include casting, spin coating, dip coating, bar coating, spray coating, blade coating, slit extrusion coating, gravure coating, reverse coating, screen printing, die coating, printing transfer, inkjet, and the like. A wet coating method or the like, in which a coating method using slit extrusion coating and micro-gravure is used, in particular, because it can be uniformly and productively coated by a roll to roll. good. Further, when the base film is formed into a film, the easy-adhesion layer solution in which the inorganic particles are dispersed is applied to the unstretched film, and an easily-adhesive layer containing inorganic particles can be formed on the stretched base film.

[圖案化導電積層體] [patterned conductive laminate]

本發明之圖案化導電積層體係基材的至少單側具有圖案化導電層。 The patterned conductive laminate system substrate of the present invention has a patterned conductive layer on at least one side.

圖案化導電層係其內面具有導電區域及非導電區域。導電區域係基質中包含具有網絡結構之金屬系 線狀結構體。具有網絡結構之金屬系線狀結構體因形成作為所謂導電成分之機能而降低電阻值,所以展現作為導電區域所需要的導電性。非導電區域因不存在金屬系線狀結構體、或成為相較於導電區域存在量較少且不具有網絡結構的狀態,所以未展現導電性。 The patterned conductive layer has a conductive region and a non-conductive region on its inner surface. The conductive region contains a metal system having a network structure in the matrix Linear structure. The metal-based linear structure having a network structure lowers the resistance value by forming a function as a so-called conductive component, and thus exhibits conductivity required as a conductive region. The non-conductive region does not exhibit a conductivity because it does not have a metal-based linear structure or has a state in which the amount is less than that of the conductive region and does not have a network structure.

其次說明圖案化導電層的製造方法。圖案化導電層的製造方法有基材之單面全面形成導電層後除去或減少一部份區域的金屬系線狀結構體而形成非導電區域的方法,及藉由網版印刷、間接凹版印刷(offset gravure printing)、噴墨等之方法直接形成導電區域之圖案的方法。本發明能夠適用於前者之全面形成導電層後形成非導電區域的方法。作為全面形成導電層的方法,能夠舉出在前述之基質中分散並塗布金屬系線狀結構體的方法、或塗布金屬系線狀結構體之分散液乾燥後塗布並含浸基質溶液且硬化的方法等。作為金屬系線狀結構體之分散液及基質溶液的塗布方法,能夠舉出澆鑄、旋轉塗布、浸塗、棒塗布、噴塗、刮刀塗布、狹縫擠壓塗布、凹版塗布、逆塗法、網版印刷、模塗料、印刷轉印、噴墨等濕式塗布法等通常的方法。彼等塗布方法中,特別以在上述各方法能夠均勻塗布分散液且對基材不易損傷的狹縫擠壓塗布、或者能夠均勻且生產性佳地形成導電層的微凹版印刷的濕式塗布法為佳。 Next, a method of manufacturing the patterned conductive layer will be described. The method for manufacturing a patterned conductive layer includes a method of forming a conductive layer on one side of a substrate, removing or reducing a portion of the metal-based linear structure to form a non-conductive region, and performing screen printing and indirect gravure printing. (Offset gravure printing), a method of inkjet or the like directly forms a pattern of a conductive region. The present invention can be applied to a method in which a conductive layer is formed in the former to form a non-conductive region. As a method of integrally forming a conductive layer, a method of dispersing and coating a metal-based linear structure in the above-mentioned matrix, or a method of applying a dispersion of a metal-based linear structure, drying, coating and impregnating a matrix solution, and curing can be mentioned. Wait. Examples of the method for applying the dispersion of the metal-based linear structure and the substrate solution include casting, spin coating, dip coating, bar coating, spray coating, blade coating, slit extrusion coating, gravure coating, reverse coating, and netting. A usual method such as a wet coating method such as plate printing, mold coating, printing transfer, or inkjet. Among the coating methods, the wet coating method of microgravure printing in which the dispersion liquid can be uniformly applied to the respective substrates and the substrate is not easily damaged by the above-described respective methods, or the conductive layer can be formed uniformly and productively. It is better.

隨後說明非導電區域的形成方法。非導電區域之形成亦即金屬系線狀結構體之除去或減少,能夠舉出使用蝕刻液、蝕刻糊而將基質中的金屬系線狀結構體 斷線、除去的化學蝕刻法,藉由雷射切除使金屬系線狀結構體斷線、消失等方法。本發明能夠在與蝕刻金屬系線狀結構體之同時溶解無機粒子,由於能夠與圖案化及非導電層產生孔隙之步驟在同一步驟進行而能夠適當地使用化學蝕刻法。 A method of forming a non-conductive region will be described later. The formation of the non-conductive region, that is, the removal or reduction of the metal-based linear structure, may be a metal-based linear structure in the matrix using an etching solution or an etching paste. A chemical etching method for disconnection and removal, and a method of disconnecting or disappearing a metal-based linear structure by laser ablation. In the present invention, the inorganic particles can be dissolved while etching the metal-based linear structure, and the chemical etching method can be suitably used because the step of generating pores in the patterned and non-conductive layers can be performed in the same step.

本發明中此種導電積層體係以從前述導電層側入射時之根據JIS K7361-1(1997年)的全光線透光率為80%以上的透明導電積層體為佳。組裝有本發明之導電積層體的觸控面板顯示優良的透明性,能夠鮮明地辨識已設置於使用該透明導電積層體之觸控面板下層之顯示器的顯示。所謂本發明之透明性係表示從前述導電層側入射時之根據JIS K7361-1(1997年)的全光線透光率為80%以上的意思,以85%以上為佳,較佳為90%以上。 In the present invention, the conductive laminated layer is preferably a transparent conductive laminated body having a total light transmittance of 80% or more according to JIS K7361-1 (1997) when incident on the side of the conductive layer. The touch panel in which the conductive laminate of the present invention is assembled exhibits excellent transparency, and can clearly recognize the display of the display provided on the lower layer of the touch panel using the transparent conductive laminate. The transparency of the present invention means that the total light transmittance according to JIS K7361-1 (1997) when the light is incident from the side of the conductive layer is 80% or more, preferably 85% or more, preferably 90%. the above.

又,在本發明相對於基材而與導電側(本發明係積層著導電層之側)的反面,亦可實施賦予耐摩耗性、高表面硬度、耐溶劑性、耐污染性等的硬塗層處理。 Further, in the present invention, a hard coat which imparts abrasion resistance, high surface hardness, solvent resistance, stain resistance, and the like may be applied to the reverse side of the substrate and the conductive side (the side on which the conductive layer is laminated in the present invention). Layer processing.

本發明之導電積層體係以該導電層側的表面電阻值為1×101Ω/□以上、1×104Ω/□以下為佳,較佳為1×101Ω/□以上、1.5×103Ω/□以下。由於在該區域能夠較佳地使用作為觸控面板用的導電積層體。亦即,若為1×101Ω/□以上能夠使減少消耗電力,若為1×104Ω/□以下能夠縮小觸控面板之座標讀取的誤差影響。 The conductive laminated layer of the present invention has a surface resistance value of 1 × 10 1 Ω/□ or more and 1 × 10 4 Ω/□ or less, preferably 1 × 10 1 Ω/□ or more, 1.5 ×. 10 3 Ω/□ or less. A conductive laminated body for use as a touch panel can be preferably used in this area. In other words, if the power consumption is 1 × 10 1 Ω/□ or more, the power consumption can be reduced, and if it is 1 × 10 4 Ω/□ or less, the influence of the error in the coordinate reading of the touch panel can be reduced.

在本發明所使用的基材及/或導電層,能夠在不妨害本發明之效果的區域內添加各種添加劑。作為添加劑能夠使用例如有機的微粒子、交聯劑、阻燃劑、阻 燃助劑、耐熱安定劑、抗氧化安定劑、勻塗劑、滑性賦活劑、抗靜電劑、紫外線吸收劑、光安定劑、成核劑、染料、填充劑、分散劑及偶合劑等。 In the substrate and/or the conductive layer used in the present invention, various additives can be added in a region which does not impair the effects of the present invention. As the additive, for example, organic fine particles, a crosslinking agent, a flame retardant, and a hindrance can be used. Combustion aids, heat stabilizers, antioxidant stabilizers, leveling agents, slip activators, antistatic agents, UV absorbers, light stabilizers, nucleating agents, dyes, fillers, dispersants and coupling agents.

又,本發明之圖案化導電體層能夠積層2層以上來使用。積層2層以上時能夠藉由接合層來接合而積層。作為接合層能夠使用接著劑或黏著劑,從處理性和柔軟性的觀點而言,能夠適當地使用黏著劑。本發明能夠使用丙烯酸系黏著劑、矽氧烷系黏著劑、胺基甲酸酯系黏著劑等,特別從黏著特性或容易調整色調而言,能夠適當地使用丙烯酸系黏著劑。 Further, the patterned conductor layer of the present invention can be used by laminating two or more layers. When two or more layers are laminated, it is possible to laminate by bonding layers. An adhesive or an adhesive can be used as the bonding layer, and an adhesive can be suitably used from the viewpoint of handleability and flexibility. In the present invention, an acrylic pressure-sensitive adhesive, a siloxane-based pressure-sensitive adhesive, a urethane-based pressure-sensitive adhesive or the like can be used, and an acrylic pressure-sensitive adhesive can be suitably used in particular from the viewpoint of adhesive properties or easy adjustment of color tone.

本發明之導電積層體及/或圖案化導電積層體能夠較佳地使用於顯示體,其中特別能夠較佳地使用於觸控面板及電子紙。其中,第8圖表示顯示觸控面板之一範例的截面模式圖。觸控面板係單獨或多片、進一步與其他元件組合而搭載積層具有包含金屬系線狀結構體之網絡結構之導電層的本發明導電積層體(例如第1圖)者,能夠舉出電阻膜式觸控面板和靜電容量式觸控面板等作為其範例。本發明之導電積層體的導電層包含(任意或複數個)如第7圖所示之如符號12、13、14、15表示的金屬系線狀結構體,形成具有(任意或複數個)如符號16、17、18表示之接點的網絡結構。搭載本發明之導電積層體而成的觸控面板,例如第8圖所表示藉由接著劑或黏著劑等的接合層22接合以積層導電積層體19,再者設置著觸控面板之畫面側的基材、已積層於觸控面板之畫面側基材的硬塗層24。此種觸控面板例如安裝引線及驅動單元等,並組裝於液晶顯示器前面來使用。 The conductive laminated body and/or the patterned conductive laminated body of the present invention can be preferably used for a display body, and particularly preferably used for a touch panel and an electronic paper. 8 is a cross-sectional schematic view showing an example of a touch panel. The touch panel is a single or a plurality of sheets, and a conductive laminated body of the present invention (for example, FIG. 1 ) in which a conductive layer having a network structure of a metal-based linear structure is laminated, and a resistive film can be used. As an example, a touch panel and a capacitive touch panel are used. The conductive layer of the electrically conductive laminated body of the present invention comprises (optionally or plurally) a metal-based linear structure represented by the symbols 12, 13, 14, 15 as shown in Fig. 7, formed of (optional or plural) Symbols 16, 17, and 18 indicate the network structure of the contacts. The touch panel in which the conductive laminated body of the present invention is mounted is bonded to the bonding layer 22 such as an adhesive or an adhesive to laminate the conductive laminated body 19, and the screen side of the touch panel is further provided. The substrate is a hard coat layer 24 laminated on the substrate side substrate of the touch panel. Such a touch panel is mounted, for example, with a lead wire, a driving unit, and the like, and is assembled in front of a liquid crystal display.

[存在孔隙之層] [layer of pores present]

本發明之存在孔隙之層雖能夠配置於圖案化導電積層體中的任意位置,但是以配置於基材及圖案化導電層之間為佳。 The layer in which the pores of the present invention are present can be disposed at any position in the patterned conductive laminate, but is preferably disposed between the substrate and the patterned conductive layer.

亦即,僅基材單面具有圖案化導電層時,以於基材及圖案化導電層之間具有存在孔隙之層為佳。 That is, when only one side of the substrate has a patterned conductive layer, it is preferred that a layer having pores be present between the substrate and the patterned conductive layer.

此外,基材之雙面具有圖案化導電層時,可為(i)形成於基材雙面的任何圖案化導電層及基材之間具有存在孔隙之層,亦可為(ii)形成於基材雙面之圖案化導電層中的任一圖案化導電層及基材之間具有存在孔隙之層。 In addition, when the patterned double-sided substrate has a patterned conductive layer, it may be (i) a layer having pores formed between any patterned conductive layer formed on both sides of the substrate and the substrate, or (ii) formed on A layer having voids between any of the patterned conductive layers and the substrate in the patterned conductive layer on both sides of the substrate.

又,如[孔隙]項所記載之本發明之孔隙係藉由溶解或分解無機粒子而生成。因此,藉由將含無機粒子之層浸透於酸或鹼性溶液同時以加熱或雷射等從外部施加能量而生成孔隙而形成存在孔隙之層。由於若形成如以上之存在孔隙之層的處理及導電積層體形成非導電區域的處理同時進行,則使步驟數減少而提升生產性,所以存在孔隙之層係以形成於與圖案化導電層相同之面為佳。又,存在孔隙之層若形成於相較於圖案化導電層更表面側,則大氣中的水分或氣體容易透過層體,圖案化導電層的耐久性亦降低。因此,存在孔隙之層係以形成於基材及圖案化導電層之間為佳。 Further, the pores of the present invention as described in [Pore] are produced by dissolving or decomposing inorganic particles. Therefore, a layer in which pores are formed is formed by impregnating an acid or an alkaline solution with an acid or an alkaline solution while applying energy from the outside by heating or laser. Since the treatment for forming the layer having the pores as described above and the process of forming the non-conductive region of the conductive laminate are simultaneously performed, the number of steps is reduced to improve productivity, so that the layer of the void is formed to be formed in the same manner as the patterned conductive layer. The face is better. Further, when the layer in which the pores are formed is formed on the more surface side than the patterned conductive layer, moisture or gas in the atmosphere easily permeates the layer, and the durability of the patterned conductive layer is also lowered. Therefore, it is preferred that a layer of pores be formed between the substrate and the patterned conductive layer.

存在孔隙之層係以僅足以包覆孔隙之層厚為佳。具體而言,期望為200nm以上的層厚,層厚小於200nm時,層中未形成孔隙而不能獲得本發明效果之光 學特性變化。還有,作為層厚之上限,從圖案化導電積層體的柔軟性、處理性等的觀點而言,以1μm以下為佳。 The layer in which the pores are present is preferably only a layer thickness sufficient to coat the pores. Specifically, it is desirable that the layer thickness is 200 nm or more, and when the layer thickness is less than 200 nm, pores are not formed in the layer, and the light of the effect of the present invention cannot be obtained. Learning characteristics change. In addition, the upper limit of the layer thickness is preferably 1 μm or less from the viewpoint of flexibility, handleability, and the like of the patterned conductive laminate.

作為存在孔隙之層的組成能夠適當地使用具有與前述[基質]項所記載之相同的交聯結構的高分子。 As the composition of the layer in which the pores are present, a polymer having the same crosslinked structure as that described in the above [Matrix] can be suitably used.

[實施例] [Examples]

以下,根據實施例具體地說明本發明。惟,本發明係非下述實施例所限制者。 Hereinafter, the present invention will be specifically described based on examples. However, the present invention is not limited by the following examples.

[評估方法] [evaluation method]

首先,說明各實施例及比較例的評估方法。 First, the evaluation methods of the respective examples and comparative examples will be described.

(1)導電成分的形態 (1) Form of conductive component

使用絕緣電組計(三和電氣計器股份有限公司製,DG6),在試料的各面施加探針,由是否通電來鑑定試料的導電面。 A probe was applied to each side of the sample using an insulated electric meter (manufactured by Sanwa Electric Co., Ltd., DG6), and the conductive surface of the sample was identified by energization.

其次使用掃描透射電子顯微鏡(日立高科技股份有限公司製,日立掃描透射電子顯微鏡HD-2700)或電場放射型掃描電子顯微鏡(日本電子股份有限公司製,JSM-6700-F),加速電壓為3.0kV,適宜地調節觀察倍率與圖像的對比,以各種倍率觀察試料的導電區域(A)及非導電區域(B)的各表面。 Next, a scanning transmission electron microscope (Hitachi Hi-Tech Co., Ltd., Hitachi Scanning Transmission Electron Microscope HD-2700) or an electric field emission type scanning electron microscope (JSM-6700-F, manufactured by JEOL Ltd.) was used, and the acceleration voltage was 3.0. kV, the observation magnification is appropriately adjusted in comparison with the image, and the surfaces of the conductive region (A) and the non-conductive region (B) of the sample are observed at various magnifications.

以前述方法觀察困難時,其次使用彩色3D雷射顯微鏡(KEYENCE股份有限公司製VK-9700/9710)、觀察應用(KEYENCE股份有限公司製VK-H1V1)、形狀解析應用(KEYENCE股份有限公司製VK-H1A1),以附屬的標準對物透鏡10X(Nikon股份有限 公司製CF IC EPI Plan 10X)、20X(Nikon股份有限公司製CF IC EPI Plan 20X)、50X(Nikon股份有限公司製CF IC EPI Plan Apo 50X)、150X(Nikon股份有限公司製CF IC EPI Plan Apo 150X)以各倍率表面觀察導電側的相同位置,由該圖像數據進行圖像解析。 When it is difficult to observe by the above method, a color 3D laser microscope (VK-9700/9710, manufactured by KEYENCE Co., Ltd.), an observation application (VK-H1V1 manufactured by KEYENCE Co., Ltd.), and a shape analysis application (VK manufactured by KEYENCE Co., Ltd.) are used. -H1A1), with the attached standard lens 10X (Nikon shares limited CF IC EPI Plan 10X), 20X (CF IC EPI Plan 20X manufactured by Nikon Co., Ltd.), 50X (CF IC EPI Plan Apo 50X manufactured by Nikon Co., Ltd.), 150X (CF IC EPI Plan Apo manufactured by Nikon Co., Ltd.) 150X) The same position on the conductive side was observed on the surface at each magnification, and image analysis was performed from the image data.

(2)導電成分、無機粒子的鑑定 (2) Identification of conductive components and inorganic particles

將從試料剝離導電層並溶解於溶解溶劑。根據需要,適用以矽膠管柱層析法、膠透層析法、液體高速層析法等為代表之通常的層析法等,分離精製成各個單一物質,並提供於以下的定性分析。 The conductive layer was peeled off from the sample and dissolved in a dissolved solvent. If necessary, it is suitable for the separation of each individual substance by a usual chromatography method represented by ruthenium column chromatography, gel permeation chromatography, liquid high-speed chromatography, etc., and is provided in the following qualitative analysis.

然後,將導電成分進行適宜濃縮及稀釋以調製試料。其次,使用以下的評估方法鑑定試料中所包含的成分。 Then, the conductive component is appropriately concentrated and diluted to prepare a sample. Next, the following evaluation methods were used to identify the components contained in the sample.

分析方法係組合以下的分析方法來進行,以能夠藉由較少組合進行測定者為優先適用。 The analysis method is performed by combining the following analysis methods, so that it can be preferentially applied by being able to perform measurement by a small combination.

核磁共振光譜法(1H-NMR、13C-NMR、29Si-NMR、19F-NMR)、二維核磁共振光譜法(2D-NMR)、紅外線光譜測定法(IR)、拉曼光譜法、各種質譜法(氣相層析-質譜法(GC-MS)、熱分解氣相層析-質譜法(熱分解GC-MS)、基質輔助雷射脫附游離質譜法(MALDI-MS)、飛行時間型質譜法(TOF-MS)、飛行時間型基質輔助雷射脫附游離質譜法(MALDI-TOF-MS)、動態二次離子質譜法(Dynamic-SIMS)、飛行時間型二次離子質譜法(TOF-SIMS)、其它靜態二次離子質譜法(Static-SIMS)等)、X射線繞射法(XRD)、中子繞射法(ND)、低能量電 子繞射法(LEED)、高速反射電子繞射法(RHEED)、原子吸光分析(AAS)、紫外光電子光譜法(UPS)、歐傑電子能譜法(AES)、X-射線光電子光譜法(XPS)、X射線螢光分析(XRF)、感應耦合電漿原子發射光譜法(ICP-AES)、電子探針微量分析法(EPMA)、粒子誘發X射線發射法(PIXE)、低能離子散射譜法(RBS或LEIS)、中能離子散射譜法(MEIS)、高能散射譜法(ISS或HEIS)、膠透層析法(GPC)、穿透式電子顯微鏡-能量色散X射線分析(TEM-EDX)、掃描式電子顯微鏡-能量色散X射線分析(SEM-EDX)、氣相層析法(GC)之其它元素分析。 Nuclear magnetic resonance spectroscopy ( 1 H-NMR, 13 C-NMR, 29 Si-NMR, 19 F-NMR), two-dimensional nuclear magnetic resonance spectroscopy (2D-NMR), infrared spectroscopy (IR), Raman spectroscopy , mass spectrometry (GC-MS), thermal decomposition gas chromatography-mass spectrometry (thermal decomposition GC-MS), matrix-assisted laser desorption free mass spectrometry (MALDI-MS), Time-of-flight mass spectrometry (TOF-MS), time-of-flight matrix-assisted laser desorption mass spectrometry (MALDI-TOF-MS), dynamic secondary ion mass spectrometry (Dynamic-SIMS), time-of-flight secondary ion mass spectrometry Method (TOF-SIMS), other static secondary ion mass spectrometry (Static-SIMS), etc., X-ray diffraction (XRD), neutron diffraction (ND), low energy electron diffraction (LEED), High-speed reflection electron diffraction (RHEED), atomic absorption spectrometry (AAS), ultraviolet photoelectron spectroscopy (UPS), Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), X-ray fluorescence analysis (XRF), inductively coupled plasma atomic emission spectrometry (ICP-AES), electron probe microanalysis (EPMA), particle induced X-ray emission (PIXE), low energy ion scattering spectroscopy (RBS or LEIS), medium Energy ion Spectroscopy (MEIS), high energy scattering spectroscopy (ISS or HEIS), gel permeation chromatography (GPC), transmission electron microscopy-energy dispersive X-ray analysis (TEM-EDX), scanning electron microscopy-energy dispersion X-ray analysis (SEM-EDX), other elemental analysis of gas chromatography (GC).

(3)表面電阻值R0 (3) Surface resistance value R 0

以使用非接觸式電阻率計(Napson股份有限公司製NC-10)之渦電流方式測定100mm×50mm之試料中央部分導電積層體之導電層側的表面電阻值。針對3試料算出平均值,以其為表面電阻值R0[Ω/□]。超過檢測限制而不能獲得表面電阻值時,其次由以下的方法來測定。 The surface resistance value of the conductive layer side of the central portion of the conductive laminated body of the sample of 100 mm × 50 mm was measured by an eddy current method using a non-contact resistivity meter (NC-10 manufactured by Napson Co., Ltd.). The average value was calculated for the three samples, and this was the surface resistance value R 0 [Ω/□]. When the surface resistance value is not obtained beyond the detection limit, it is measured by the following method.

使用高電阻率計(三菱化學股份有限公司製Hiresta-UP MCP-HT450),連接環型探針(三菱化學股份有限公司製URS探針MCP-HTP14)而以雙環方式測定100mm×100mm之試料的中央部分。針對3試料而算出平均值,以其為表面電阻值R0[Ω/□]。 A high-resistivity meter (Hiresta-UP MCP-HT450 manufactured by Mitsubishi Chemical Corporation) was used, and a ring-shaped probe (URS probe MCP-HTP14 manufactured by Mitsubishi Chemical Corporation) was connected to measure a sample of 100 mm × 100 mm in a double loop manner. Central part. The average value was calculated for the three samples, and this was the surface resistance value R 0 [Ω/□].

(4)全光線透光率、霧度 (4) Full light transmittance, haze

在試料的導電層側以透明黏著劑(日東電工股份有限公司製LUCIACS CS9621T)將已形成硬塗層(中國塗料股份有限公司製Folder Seed 423C)貼合於單面之厚度 188μm的光學PET膜的PET膜側,使用濁度計(霧度計)NDH2000(日本電色工業股份有限公司製)並根據JIS K7361-1(1997年),從導電層側入射光來測定導電積層體厚度方向的全光線透光率、霧度。測定3試料,算出3試料的平均值,以其為各程度的全光線透光率、霧度。對於本測定,係四捨五入至小數點以下第2位求出數值。 On the conductive layer side of the sample, a hard coat (Folder Seed 423C manufactured by Nippon Paint Co., Ltd.) was bonded to the thickness of one side with a transparent adhesive (LUCIACS CS9621T manufactured by Nitto Denko Corporation). The PET film side of the 188 μm optical PET film was measured by using a haze meter (haze meter) NDH2000 (manufactured by Nippon Denshoku Industries Co., Ltd.) and measuring light from the side of the conductive layer according to JIS K7361-1 (1997). The total light transmittance and haze in the thickness direction of the laminate. The three samples were measured, and the average value of the three samples was calculated, and this was the total light transmittance and the haze of each degree. For this measurement, the value is rounded to the second decimal place.

(5)擴散反射光 (5) diffused reflected light

在試料的導電層側,以透明黏著劑(日東電工股份有限公司製LUCIACS CS9621T)將已形成硬塗層(中國塗料股份有限公司製Folder Seed423C)貼合於單面之厚度188μm之光學PET膜的PET膜側,使用分光光度計CM-2600d(KONICA MINOLTA SENSING股份有限公司製)來測定導電層側的反射光。採用以SCE方式之L*a*b*表色系的L*值作為擴散反射光的指標。測定係個別在導電區域及非導電區域二者進行,求出個別之L*值之差的△L*值。 On the conductive layer side of the sample, a hard coat layer (Folder Seed 423C manufactured by Nippon Paint Co., Ltd.) was attached to a single-sided optical PET film having a thickness of 188 μm by a transparent adhesive (LUCIACS CS9621T manufactured by Nitto Denko Corporation). On the PET film side, the reflected light on the side of the conductive layer was measured using a spectrophotometer CM-2600d (manufactured by KONICA MINOLTA SENSING Co., Ltd.). The L* value of the L*a*b* color system in the SCE mode is used as an index of diffuse reflected light. The measurement is performed individually in both the conductive region and the non-conductive region, and the ΔL* value of the difference between the individual L* values is obtained.

(6)圖案之非辨識性評估 (6) Non-identification evaluation of patterns

前述之擴散反射光測定的△L*值為0.7以下時,判定為圖案之非辨識性良好。又,與所測定之試料同等的表面電阻值之不包含本發明之無機粒子及/或孔隙的圖案化導電積層體進行同樣的擴散反射光測定之值為△L*0值。該△L*0值係隨金屬系線狀結構體的存在量,亦即導電積層體的表面電阻值而變化。例如金屬系線狀結構體的存在量多、表面電阻值低時,△L*0值變大。此處,同等之表面電阻值的△L*-△L*0≦-0.3時,判定為圖案 非辨識性改善,△L*-△L*0>-0.3時,圖案的非辨識性未被改善而不佳。還有,所謂同等之表面電阻值係指若在某值±15Ω/□的區域內,則為同等之表面電阻值。 When the ΔL* value of the above-described diffused reflected light measurement was 0.7 or less, it was judged that the pattern was not distinguished. Moreover, the value of the surface-resistance value equivalent to the sample to be measured which does not include the inorganic particle and/or the void of the patterned conductive laminate of the present invention is the same as the value of ΔL* 0 measured by the same diffuse reflected light. The ΔL* 0 value varies depending on the amount of the metal-based linear structure, that is, the surface resistance value of the conductive laminate. For example, when the amount of the metal-based linear structure is large and the surface resistance value is low, the value of ΔL* 0 becomes large. Here, when ΔL*-ΔL* 0 ≦-0.3 of the same surface resistance value, it is judged that the pattern non-recognition is improved, and when ΔL*-ΔL* 0 >-0.3, the non-recognition of the pattern is not obtained. Improvement is not good. Further, the equivalent surface resistance value means an equivalent surface resistance value in a region of a certain value of ±15 Ω/□.

(7)△L*0值之測定 (7) Determination of △L* 0 value

預備任一層均不包含無機粒子之表面電阻值為140.1Ω/□、150.5Ω/□、162.0Ω/□、51.0Ω/□的4種導電積層體。將彼等圖案化所獲得的圖案化導電積層體的△L*個別為1.93、1.96、2.02、3.27,個別之值為其表面電阻值之△L*0。此時的導電積層體及圖案化導電積層體係以與後述之比較例1及2同樣的方法所獲得。 None of the prepared layers contained four kinds of conductive laminates having surface resistance values of inorganic particles of 140.1 Ω/□, 150.5 Ω/□, 162.0 Ω/□, and 51.0 Ω/□. The ΔL* of the patterned electroconductive laminate obtained by patterning them is 1.93, 1.96, 2.02, and 3.27, respectively, and the individual values are ΔL* 0 of the surface resistance value thereof. The conductive laminate and the patterned conductive laminate system at this time were obtained in the same manner as in Comparative Examples 1 and 2 to be described later.

(8)濕熱耐久性試驗 (8) Damp heat durability test

將裁切成100mm×50mm的試料投入以溫濕度條件為60℃ 90%RH運轉的恆溫恆濕器(TABAI ESPEC股份有限公司製PR-3SP),240小時後取出測定表面電阻值。藉由以下的計算式,算出表面電阻值試驗前後之表面電阻值的變化率(單位:%)。還有,表面電阻值的測定亦在試驗前後以(3)記載之方法實施。 A sample which was cut into a size of 100 mm × 50 mm was placed in a thermo-hygrostat (PR-3SP manufactured by TABAI ESPEC Co., Ltd.) operating at 60 ° C and 90% RH under a temperature and humidity condition, and the surface resistance value was taken out after 240 hours. The rate of change of the surface resistance value before and after the surface resistance value test (unit: %) was calculated by the following calculation formula. Further, the measurement of the surface resistance value was also carried out by the method described in (3) before and after the test.

(試驗後的試料之表面電阻值/試驗前的試料之表面電阻值)×100(%)…(式) (surface resistance value of sample after test/surface resistance value of sample before test) × 100 (%)...

[材料] [material] <基材> <Substrate>

使用厚度125μm的聚對苯二甲酸乙二酯薄膜(東麗股份有限公司製「Lumirror」(註冊商標)U48)。 A polyethylene terephthalate film ("Lumirror" (registered trademark) U48, manufactured by Toray Industries, Inc.) having a thickness of 125 μm was used.

<金屬系線狀結構體> <Metal-based linear structure>

金屬系線狀結構體「銀奈米線」 Metal-based linear structure "silver nanowire"

銀奈米線(短軸:50~100nm、長軸:20~40μm) Silver nanowire (short axis: 50~100nm, long axis: 20~40μm)

<基質及底塗層> <matrix and undercoat>

(1)丙烯酸系組成物A (1) Acrylic composition A

含有具有3個以上促進聚合反應之碳-碳雙鍵基作為丙烯醯基之化合物的丙烯酸系組成物(綜研化學股份有限公司製Fullcure HC-6,固體成分濃度為51質量%)。硬化物具有交聯結構。 An acrylic composition containing a compound having three or more carbon-carbon double bond groups for promoting polymerization as a propylene group (Fullure HC-6 manufactured by Soken Chemical Co., Ltd., solid content concentration: 51% by mass). The cured product has a crosslinked structure.

(2)光聚合起始劑A (2) Photopolymerization initiator A

.極大吸收波長300nm的光聚合起始劑(千葉.日本(Chiba.Japan)股份有限公司製Ciba IRGACURE(註冊商標)907)。 . A photopolymerization initiator (Ciba IRGACURE (registered trademark) 907, manufactured by Chiba. Japan Co., Ltd.) was used to absorb a wavelength of 300 nm.

(3)光聚合起始劑B (3) Photopolymerization initiator B

.極大吸收波長320nm之光聚合起始劑(千葉.日本股份有限公司製Ciba IRGACURE(註冊商標)369)。 . A photopolymerization initiator having a maximum absorption wavelength of 320 nm (Ciba IRGACURE (registered trademark) 369, manufactured by Chiba Japan Co., Ltd.).

<易接著層組成物> <Easy layer composition>

(1)塗液A (1) Coating A

在水中將包含下述共聚合組成之丙烯酸樹脂分散成粒子狀的水性分散液(亦即乳化塗液且乳液粒徑為50nm) An aqueous dispersion containing an acrylic resin having the following copolymerization composition dispersed in a particle form in water (that is, an emulsion coating liquid having an emulsion particle diameter of 50 nm)

.共聚成分 . Copolymerization

(2)塗液B (2) Coating liquid B

在水中將包含下述共聚合組成之聚酯樹脂分散成粒子狀的銨鹽型的水性分散液 An aqueous dispersion of an ammonium salt type in which a polyester resin having the following copolymerization composition is dispersed in a particulate form in water

.酸成分 . Acid component

.二醇成分 . Glycol component

<無機粒子> <Inorganic Particles>

無機粒子A Inorganic particle A

已由脂肪酸表面處理之碳酸鈣微粒粉末(Newlime股份有限公司製CalflexC,一次平均粒徑為40nm) Calcium carbonate microparticle powder which has been surface-treated with fatty acid (Calflex C manufactured by Newlime Co., Ltd., primary average particle diameter of 40 nm)

無機粒子B Inorganic particle B

碳酸鈣分散體(丸尾鈣股份有限公司製NK-03,固體成分濃度20質量%平均粒徑300nm) Calcium carbonate dispersion (NK-03, manufactured by Marui Co., Ltd., solid content concentration: 20% by mass, average particle diameter: 300 nm)

無機粒子C Inorganic particle C

已由脂肪酸表面處理之碳酸鈣微粒粉末(Newlime股份有限公司製VisCal P,一次平均粒徑150nm)。 Calcium carbonate fine particle powder (VisCal P manufactured by Newlime Co., Ltd., primary average particle diameter: 150 nm) which has been surface-treated with a fatty acid.

[實施例1] [Example 1]

混合5.0g無機粒子A、95.0g乙酸乙酯、200.0g平均粒徑0.4mm的氧化鋯珠粒,以振動機SR-2DW(Taitec 股份有限公司製)振動次數300次/分鐘的條件振動2小時加以分散後,藉由過濾除去氧化鋯珠粒而獲得無機粒子A的分散體。 5.0 g of inorganic particles A, 95.0 g of ethyl acetate, 200.0 g of zirconia beads having an average particle diameter of 0.4 mm, and a vibrating machine SR-2DW (Taitec) After the conditions of vibration of 300 times/min were shaken for 2 hours and dispersed, the zirconia beads were removed by filtration to obtain a dispersion of inorganic particles A.

其次,混合、攪拌53.5g丙烯酸系組成物A、1.29g光聚合起始劑A、1.29g光聚合起始劑B、886.9g乙酸乙酯、60.0g前述無機粒子A的分散體,調製底塗層材料。使用已安裝材質為sus之墊片(墊片厚度50μm)的狹縫擠壓塗布機塗布該底塗層材料於基材,以120℃乾燥2分鐘後,照射80mJ/cm2紫外線進行硬化,形成厚度為600nm的底塗層。 Next, 53.5 g of an acrylic composition A, 1.29 g of a photopolymerization initiator A, 1.29 g of a photopolymerization initiator B, 886.9 g of ethyl acetate, and 60.0 g of the dispersion of the above inorganic particles A were mixed and stirred to prepare a primer. Layer material. The undercoat material was applied to the substrate using a slit extrusion coater having a gasket of sus (the thickness of the gasket of 50 μm), and dried at 120 ° C for 2 minutes, and then irradiated with ultraviolet rays of 80 mJ/cm 2 to be hardened. An undercoat layer having a thickness of 600 nm.

隨後,預備銀奈米線分散液(美國Cambrios 公司製CleraOhm Ink-A AQ)作為包含金屬系線狀結構體的水分散液。將該銀奈米線分散液稀釋成銀奈米線濃度為0.054質量%以調製銀奈米線分散塗液。使用已安裝材質為sus之墊片(墊片厚度50μm)的狹縫擠壓塗布機將該銀奈米線分散塗液塗布於前述底塗層之上,以120℃乾燥2分鐘而積層形成導電成分。 Subsequently, a silver nanowire dispersion (CleraOhm Ink-A AQ manufactured by Cambrios, USA) was prepared as an aqueous dispersion containing a metal-based linear structure. The silver nanowire dispersion was diluted to a silver nanowire concentration of 0.054% by mass to prepare a silver nanowire dispersion coating liquid. The silver nanowire dispersion coating liquid was applied onto the undercoat layer by using a slit extrusion coater having a gasket of sus material (gasket thickness: 50 μm), and dried at 120 ° C for 2 minutes to form a conductive layer. ingredient.

接著,混合、攪拌26.7g丙烯酸系組成物A、0.16g光聚合起始劑A、0.16g光聚合起始劑B、972.0g乙酸乙酯,調製基質組成物。 Next, 26.7 g of the acrylic composition A, 0.16 g of the photopolymerization initiator A, 0.16 g of the photopolymerization initiator B, and 972.0 g of ethyl acetate were mixed and stirred to prepare a matrix composition.

使用已安裝材質為sus之墊片(墊片厚度50μm)的狹縫擠壓塗布機將所調製之基質組成物塗布於已積層導電成分之側,以120℃乾燥2分鐘後,照射80mJ/cm2紫外線進行硬化,形成基質部分厚度為120nm的導電層,獲得導電積層體。 The prepared matrix composition was applied to the side of the laminated conductive component using a slit extrusion coater having a gasket of sus material (gasket thickness: 50 μm), and dried at 120 ° C for 2 minutes, and then irradiated at 80 mJ/cm. 2 The ultraviolet rays were hardened to form a conductive layer having a thickness of the substrate portion of 120 nm to obtain a conductive laminate.

該導電積層體為底塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於底塗層包含10質量%的量。無機粒子之平均粒徑為152nm。又,該導電積層體的表面電阻值R0為154.8Ω/□。 The conductive laminate is a conductive laminate in which the undercoat layer contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 10% by mass based on the undercoat layer. The average particle diameter of the inorganic particles was 152 nm. Further, the surface resistivity R 0 of the electrically conductive laminated body was 154.8 Ω/□.

隨後將所獲得的導電積層體裁切成3片50mm×100mm尺寸來預備作為圖案的非辨識性確認用試料。 Subsequently, the obtained electroconductive laminate was cut into three pieces of 50 mm × 100 mm in size to prepare a sample for non-identification confirmation as a pattern.

其次,將以36質量%鹽酸:60質量%硝酸:水為20:3:17的質量比例所摻混的蝕刻液加熱至45℃,將試料僅一半的區域(50mm×50mm的區域)浸漬5分鐘以進行蝕刻處理。藉此獲得將浸漬於蝕刻液的區域變成非導電區域,除此以外之區域為導電區域的圖案化導電積層體試料。該圖案化導電積層體的非導電區域包含平均孔隙直徑160nm的孔隙,圖案的非辨識性良好,又和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則圖案的非辨識性已改善。 Next, the etching liquid mixed with a mass ratio of 36% by mass hydrochloric acid: 60% by mass of nitric acid:water of 20:3:17 was heated to 45 ° C, and only half of the sample (50 mm × 50 mm region) was immersed in the sample. Minutes for etching. Thereby, a region in which the region immersed in the etching liquid is changed into a non-conductive region, and the region other than the conductive region is a patterned conductive laminate sample is obtained. The non-conductive region of the patterned conductive laminate includes pores having an average pore diameter of 160 nm, and the pattern is not discernible, and is similar to the patterned conductive laminate without equivalent inorganic particles and/or pores. Non-identification has improved.

[實施例2] [Embodiment 2]

以與實施例1同樣的材料、方法在基材積層形成導電成分。 A conductive component was formed on the substrate by the same material and method as in Example 1.

其次,以與實施例1同樣的材料、方法獲得無機粒子A的分散體。 Next, a dispersion of the inorganic particles A was obtained in the same manner and in the same manner as in Example 1.

隨後混合、攪拌53.5g丙烯酸系組成物A、0.32g光聚合起始劑A、0.32g光聚合起始劑B、886.9g乙酸乙酯、60.0g前述無機粒子A的分散體,調製基質組成物。 Subsequently, 53.5 g of an acrylic composition A, 0.32 g of a photopolymerization initiator A, 0.32 g of a photopolymerization initiator B, 886.9 g of ethyl acetate, and 60.0 g of a dispersion of the above inorganic particles A were mixed and stirred to prepare a matrix composition. .

使用已安裝材質為sus之墊片(墊片厚度50μm)的狹縫擠壓塗布機將所調製之基質組成物塗布於已積層導電成分之側,以120℃乾燥2分鐘後,照射80mJ/cm2紫外線進行硬化,形成基質部分的厚度為600nm的導電層,獲得導電積層體。 The prepared matrix composition was applied to the side of the laminated conductive component using a slit extrusion coater having a gasket of sus material (gasket thickness: 50 μm), and dried at 120 ° C for 2 minutes, and then irradiated at 80 mJ/cm. 2 Ultraviolet rays were hardened to form a conductive layer having a thickness of 600 nm in the matrix portion, and a conductive laminate was obtained.

該導電積層體為基質包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於基質材料包含10質量%的量。無機粒子之平均粒徑為145nm。又,該導電積層體的表面電阻值R0為156.0Ω/□。 The conductive laminate is a conductive laminate in which a matrix contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 10% by mass based on the matrix material. The average particle diameter of the inorganic particles was 145 nm. Further, the surface resistivity R 0 of the electrically conductive laminated body was 156.0 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體試料。該圖案化導電積層體的非導電區域包含平均孔隙直徑為164nm的孔隙,圖案的非辨識性良好,又和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則圖案的非辨識性已改善。 Next, a patterned conductive laminate sample was obtained in the same manner as in Example 1. The non-conductive region of the patterned conductive laminate includes pores having an average pore diameter of 164 nm, and the pattern is non-recognizable, and is compared with a patterned conductive laminate without equivalent inorganic particles and/or pores. The non-identification has improved.

[實施例3] [Example 3]

以與實施例1同樣的方法獲得無機粒子A的分散體。 A dispersion of the inorganic particles A was obtained in the same manner as in Example 1.

其次,混合、攪拌53.5g丙烯酸系組成物A、1.29g光聚合起始劑A、1.29g光聚合起始劑B、886.9g乙酸乙酯、60.0g前述無機粒子A的分散體,調製硬塗層材料。使用已安裝材質為sus之墊片(墊片厚度50μm)的狹縫擠壓塗布機將該硬塗層材料塗布於基材,以120℃乾燥2分鐘後,照射80mJ/cm2紫外線進行硬化,形成厚度為600nm的硬塗層。 Next, 53.5 g of an acrylic composition A, 1.29 g of a photopolymerization initiator A, 1.29 g of a photopolymerization initiator B, 886.9 g of ethyl acetate, and 60.0 g of a dispersion of the above inorganic particles A were mixed and stirred to prepare a hard coat. Layer material. The hard coat material was applied to a substrate using a slit extrusion coater having a gasket of sus (gas thickness: 50 μm), and dried at 120 ° C for 2 minutes, and then hardened by irradiation with 80 mJ/cm 2 of ultraviolet rays. A hard coat layer having a thickness of 600 nm was formed.

其次,以與實施例1同樣的方法在已形成硬塗層之反面形成導電成分及基質,獲得導電積層體。 Next, a conductive component and a matrix were formed on the reverse side of the hard coat layer formed in the same manner as in Example 1 to obtain a conductive laminate.

該導電積層體為已形成於導電層之相反側的硬塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於硬塗層材料包含10質量%的量。無機粒子之平均粒徑為149nm。又,該導電積層體的表面電阻值R0為167.3Ω/□。 The conductive laminate is a conductive laminate in which a hard coat layer formed on the opposite side of the conductive layer contains inorganic particles, and the inorganic particles are calcium carbonate and are contained in an amount of 10% by mass based on the hard coat material. The average particle diameter of the inorganic particles was 149 nm. Further, the surface resistivity R 0 of the electroconductive laminate was 167.3 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體試料。該圖案化導電積層體的非導電區域包含平均孔隙直徑為151nm的孔隙,圖案的非辨識性良好,又和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則圖案的非辨識性已改善。又由於本實施例之圖案化導電積層體的構成係包含無機粒子及/或孔隙之層夾住基材而位於導電積層體及相反面,需要個別將雙面進行圖案化加工的步驟。 Next, a patterned conductive laminate sample was obtained in the same manner as in Example 1. The non-conductive region of the patterned conductive laminate comprises pores having an average pore diameter of 151 nm, and the pattern is not discernible, and the pattern is compared with the patterned conductive laminate without equivalent inorganic particles and/or pores. The non-identification has improved. Further, since the pattern of the patterned electroconductive laminate of the present embodiment includes a layer in which inorganic particles and/or pores sandwich the substrate and is located on the electroconductive laminate and the opposite surface, it is necessary to separately perform patterning processing on both sides.

[實施例4] [Example 4]

除了底塗層材料組成為53.5g丙烯酸系組成物A、1.29g光聚合起始劑A、1.29g光聚合起始劑B、801.4g乙酸乙酯、150.0g無機粒子A的分散體,塗布銀奈米線分散液時的條件為75μm的墊片厚度並將濕膜厚調整成為1.5倍以外,以與實施例1同樣的方法獲得導電積層體。 In addition to the undercoat material composition of 53.5 g of acrylic composition A, 1.29 g of photopolymerization initiator A, 1.29 g of photopolymerization initiator B, 801.4 g of ethyl acetate, and 150.0 g of inorganic particle A dispersion, silver coating A conductive laminate was obtained in the same manner as in Example 1 except that the condition of the nanowire dispersion was 75 μm and the wet film thickness was adjusted to 1.5 times.

該導電積層體為底塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於底塗層材料包含25質量%的量。無機粒子之平均粒徑為154nm。又,該導電積層體的表面電阻值R0為50.3Ω/□。 The conductive laminate is a conductive laminate in which the undercoat layer contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 25% by mass based on the undercoat material. The average particle diameter of the inorganic particles was 154 nm. Further, the surface resistivity R 0 of the electrically conductive laminated body was 50.3 Ω / □.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域包含平均孔隙直徑155nm的孔隙,圖案的非辨識性良好,又和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則圖案的非辨識性已改善。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. The non-conductive region of the patterned conductive laminate includes pores having an average pore diameter of 155 nm, and the pattern is not discernible, and is similar to the patterned conductive laminate without equivalent inorganic particles and/or pores. Non-identification has improved.

[實施例5] [Example 5]

除了底塗層材料組成為53.5g丙烯酸系組成物A、1.29g光聚合起始劑A、1.29g光聚合起始劑B、931.9g乙酸乙酯、15.0g無機粒子B以外,以與實施例1同樣的方法獲得導電積層體。 In addition to the undercoat material composition of 53.5 g of acrylic composition A, 1.29 g of photopolymerization initiator A, 1.29 g of photopolymerization initiator B, 931.9 g of ethyl acetate, and 15.0 g of inorganic particles B, 1 The same method was used to obtain a conductive laminate.

該導電積層體為底塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於底塗層材料包含10質量%的量。無機粒子之平均粒徑為284nm。又,該導電積層體的表面電阻值R0為153.5Ω/□。 The conductive laminate is a conductive laminate in which the undercoat layer contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 10% by mass based on the undercoat material. The average particle diameter of the inorganic particles was 284 nm. Further, the surface resistivity R 0 of the electroconductive laminate was 153.5 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域雖然包含平均孔隙直徑303nm的孔隙而圖案的非辨識性未能達到良好的水準,但是和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則已改善。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. Although the non-conductive region of the patterned conductive laminate contains pores having an average pore diameter of 303 nm and the non-recognition of the pattern fails to reach a good level, the patterned surface conduction does not include inorganic particles and/or pores. The comparison of laminates has improved.

[實施例6] [Embodiment 6]

除了底塗層材料組成為53.5g丙烯酸系組成物A、1.29g光聚合起始劑A、1.29g光聚合起始劑B、829.9g乙酸乙酯、120.0g無機粒子A的分散體以外,以與實施例1同樣的方法獲得導電積層體。 Except for the dispersion of the undercoat material composition of 53.5 g of the acrylic composition A, 1.29 g of the photopolymerization initiator A, 1.29 g of the photopolymerization initiator B, 829.9 g of ethyl acetate, and 120.0 g of the inorganic particles A, A conductive laminate was obtained in the same manner as in Example 1.

該導電積層體為底塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於底塗層材料包含20質量%的量。無機粒子之平均粒徑為154nm。又,該導電積層體的表面電阻值R0為57.5Ω/□。 The conductive laminate is a conductive laminate in which the undercoat layer contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 20% by mass based on the undercoat material. The average particle diameter of the inorganic particles was 154 nm. Further, the surface resistivity R 0 of the electroconductive laminate was 57.5 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域雖然包含平均孔隙直徑156nm的孔隙而圖案的非辨識性未能達到良好的水準,但是和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則已改善。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. Although the non-conductive region of the patterned conductive laminate contains pores having an average pore diameter of 156 nm and the pattern non-recognition fails to reach a good level, and the patterned surface conductivity does not include inorganic particles and/or pores. The comparison of laminates has improved.

[實施例7] [Embodiment 7]

除了底塗層材料組成為53.5g丙烯酸系組成物A、1.29g光聚合起始劑A、1.29g光聚合起始劑B、915.4g乙酸乙酯、30.0g無機粒子A的分散體以外,以與實施例1同樣的方法獲得導電積層體。 Except for the dispersion of the undercoat material composition of 53.5 g of the acrylic composition A, 1.29 g of the photopolymerization initiator A, 1.29 g of the photopolymerization initiator B, 915.4 g of ethyl acetate, and 30.0 g of the inorganic particles A, A conductive laminate was obtained in the same manner as in Example 1.

該導電積層體為底塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於底塗層材料包含5質量%的量。無機粒子之平均粒徑為161nm。又,該導電積層體的表面電阻值R0為144.2Ω/□。 The conductive laminate is a conductive laminate in which the undercoat layer contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 5% by mass based on the undercoat material. The average particle diameter of the inorganic particles was 161 nm. Further, the surface resistivity R 0 of the electroconductive laminate was 144.2 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域雖然包含平均孔隙直徑160nm的孔隙而圖案的非辨識性未能達到良好的水準,但是和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則已改善。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. Although the non-conductive region of the patterned conductive laminate contains pores having an average pore diameter of 160 nm and the unrecognition of the pattern fails to reach a good level, the patterned surface conduction does not include inorganic particles and/or pores. The comparison of laminates has improved.

[實施例8] [Embodiment 8]

除了塗布銀奈米線分散液時的條件為墊片厚度75μm並調整濕膜厚成為1.5倍以外,以與實施例1同樣的方法獲得導電積層體。 A conductive laminate was obtained in the same manner as in Example 1 except that the silver nanowire dispersion was applied under the conditions of a gasket thickness of 75 μm and a wet film thickness of 1.5.

該導電積層體為底塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於底塗層材料包含10質量%的量。無機粒子之平均粒徑為144nm。又,該導電積層體的表面電阻值R0為50.8Ω/□。 The conductive laminate is a conductive laminate in which the undercoat layer contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 10% by mass based on the undercoat material. The average particle diameter of the inorganic particles was 144 nm. Further, the surface resistivity R 0 of the electroconductive laminate was 50.8 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域雖然包含平均孔隙直徑152nm的孔隙而圖案的非辨識性未能達到良好的水準,但是和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則已改善。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. Although the non-conductive region of the patterned conductive laminate contains pores having an average pore diameter of 152 nm and the non-recognition of the pattern fails to reach a good level, the patterned surface conduction does not include inorganic particles and/or pores. The comparison of laminates has improved.

[實施例9] [Embodiment 9]

除了混合5.0g無機粒子A、95.0g乙酸乙酯,並以超音波洗淨機US-2R(As-1股份有限公司製)以功率160W的條件振動分散2小時,獲得無機粒子A的分散體以外,以與實施例1同樣的方法獲得導電積層體。 In addition to 5.0 g of inorganic particles A and 95.0 g of ethyl acetate, the dispersion was dispersed for 2 hours under the conditions of a power of 160 W by an ultrasonic cleaner US-2R (manufactured by As-1 Co., Ltd.) to obtain a dispersion of inorganic particles A. A conductive laminate was obtained in the same manner as in Example 1 except for the above.

該導電積層體為底塗層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於底塗層材料包含10質量%的量。無機粒子之平均粒徑為641nm。又,該導電積層體的表面電阻值R0為163.3Ω/□。 The conductive laminate is a conductive laminate in which the undercoat layer contains inorganic particles, and the inorganic particles are calcium carbonate and contained in an amount of 10% by mass based on the undercoat material. The average particle diameter of the inorganic particles was 641 nm. Further, the surface resistivity R 0 of the electroconductive laminate was 163.3 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域雖然包含平均孔隙直徑711nm的孔隙而圖案的非辨識性未能達到良好的水準,但是和同等表面電阻值之不包含無機粒子 及/或孔隙的圖案化導電積層體比較則已改善。又該圖案化導電層體展現霧度值的上升。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. Although the non-conductive region of the patterned conductive laminate includes pores having an average pore diameter of 711 nm and the pattern non-recognition fails to reach a good level, the same surface resistance value does not include inorganic particles. The comparison of the patterned conductive laminates of the pores and/or pores has been improved. Further, the patterned conductive layer exhibits an increase in haze value.

[實施例10] [Embodiment 10]

除了混合10.0g無機粒子C、54.0g水、36.0g異丙醇、200.0g平均粒徑0.4mm的氧化鋯珠粒,並以振動機SR-2DW(TIETECH股份有限公司製)以振動次數300次/分鐘的條件振動2小時而分散後,藉由過濾除去氧化鋯珠粒而獲得無機粒子C的分散體。 In addition to mixing 10.0 g of inorganic particles C, 54.0 g of water, 36.0 g of isopropyl alcohol, and 200.0 g of zirconia beads having an average particle diameter of 0.4 mm, the vibration machine SR-2DW (manufactured by TIETECH Co., Ltd.) was used for 300 times of vibration. After the conditions of the reaction were shaken for 2 hours and dispersed for 2 hours, the dispersion of the inorganic particles C was obtained by removing zirconia beads by filtration.

隨後,充分地真空乾燥不含有外部添加粒子之PET顆粒(極限黏度0.63dl/g)後,供給至擠塑機而以285℃熔融,從T字型口模擠出成為片狀,使用外加靜電壓鑄法(electrostatic application casting method)捲取在表面溫度25℃的鏡面鑄造鼓(casting drum)來冷卻固化。將該未延伸薄膜加熱至90℃並在縱向延伸3.4倍,形成單軸延伸薄膜。在該薄膜單面於空氣中實施電暈放電處理。再者以固體成分質量比為塗液A/塗液B/無機粒子C的分散體=25/75/8.4混合易接著層組成物的塗液A、塗液B及無機粒子C的分散體之物作為易接著層塗液,塗布於單軸延伸薄膜的電暈放電處理面。 Subsequently, the PET pellets (exclusive viscosity 0.63 dl/g) containing no externally added particles were sufficiently vacuum-dried, and then supplied to an extruder to be melted at 285 ° C, extruded from a T-shaped die into a sheet shape, and externally applied with static electricity. The electrostatic application casting method was taken up by a mirror casting drum having a surface temperature of 25 ° C to be cooled and solidified. The unstretched film was heated to 90 ° C and extended 3.4 times in the machine direction to form a uniaxially stretched film. A corona discharge treatment was performed on the single side of the film in air. Further, in the solid content ratio, the dispersion of the coating liquid A/coating liquid B/inorganic particle C=25/75/8.4, the dispersion of the coating liquid A, the coating liquid B, and the inorganic particle C of the easy-adhesion layer composition The material was applied as an easy-to-layer coating liquid to the corona discharge treated surface of the uniaxially stretched film.

接著,以夾具固定已塗布易接著層塗液之單軸延伸薄膜並引導至預熱區,以環境溫度75℃乾燥並使用輻射加熱器升溫至110℃,再次以90℃乾燥後,繼續在120℃的加熱區連續地在寬方向延伸3.5倍,接著在220℃的加熱區實施20秒熱處理,製作已結晶配向之積層薄膜作為基材薄膜。此時,基材薄膜厚度為125μm、易接著層的厚度為350nm。 Next, the uniaxially stretched film coated with the easy-to-apply coating liquid is fixed by a jig and guided to the preheating zone, dried at an ambient temperature of 75 ° C and heated to 110 ° C using a radiant heater, and dried again at 90 ° C, and then continued at 120 ° The heating zone of ° C was continuously extended 3.5 times in the width direction, followed by heat treatment in a heating zone of 220 ° C for 20 seconds to prepare a laminated film having crystal orientation as a substrate film. At this time, the thickness of the base film was 125 μm, and the thickness of the easy-adhesion layer was 350 nm.

其次,以與實施例4同樣的方法在基材上積層形成導電成分及基質,獲得導電積層體。該導電積層體為易接著層包含無機粒子的導電積層體,無機粒子為碳酸鈣,且相對於易接著層組成物包含7.7質量%的量。無機粒子之平均粒徑為155nm。又,該導電積層體的表面電阻值R0為53.0Ω/□。 Next, a conductive component and a matrix were laminated on the substrate in the same manner as in Example 4 to obtain a conductive laminate. The electrically conductive laminated body is a conductive laminated body in which an easy-to-adhere layer contains inorganic particles, and the inorganic particles are calcium carbonate and are contained in an amount of 7.7% by mass based on the easily-adhesive layer composition. The average particle diameter of the inorganic particles was 155 nm. Further, the surface resistivity R 0 of the electroconductive laminate was 53.0 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域雖然包含平均孔隙直徑161nm的孔隙而圖案的非辨識性未能達到良好的水準,但是和同等表面電阻值之不包含無機粒子及/或孔隙的圖案化導電積層體比較則已改善。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. Although the non-conductive region of the patterned conductive laminate contains pores having an average pore diameter of 161 nm and the pattern non-recognition fails to reach a good level, and the patterned surface conductivity does not include inorganic particles and/or pores. The comparison of laminates has improved.

[比較例1] [Comparative Example 1]

除了底塗層材料組成為53.5g丙烯酸系組成物A、1.29g光聚合起始劑A、1.29g光聚合起始劑B、943.9g乙酸乙酯以外,以與實施例1同樣的方法獲得導電積層體。 Conduction was conducted in the same manner as in Example 1 except that the undercoat material composition was 53.5 g of the acrylic composition A, 1.29 g of the photopolymerization initiator A, 1.29 g of the photopolymerization initiator B, and 943.9 g of ethyl acetate. Laminated body.

該導電積層體為任何層均不包含無機粒子。該導電積層體的表面電阻值R0為152.7Ω/□。 The conductive laminate does not contain inorganic particles in any of the layers. The surface resistivity R 0 of the electroconductive laminate was 152.7 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域係任何層均不包含孔隙,圖案的非辨識性低。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. The non-conductive region of the patterned conductive laminate has no pores in any layer, and the pattern is low in non-recognition.

[比較例2] [Comparative Example 2]

除了塗布銀奈米線分散液時的條件為墊片厚度為75μm且調整濕膜厚成為1.5倍以外,以與比較例1同樣的方法獲得導電積層體。 A conductive laminate was obtained in the same manner as in Comparative Example 1, except that the conditions for coating the silver nanowire dispersion were such that the thickness of the spacer was 75 μm and the thickness of the adjusted wet film was 1.5.

該導電積層體為任何層均不包含無機粒子。該導電積層體的表面電阻值R0為53.8Ω/□。 The conductive laminate does not contain inorganic particles in any of the layers. The surface resistivity R 0 of the electroconductive laminate was 53.8 Ω/□.

接著以與實施例1同樣的方法獲得圖案化導電積層體。該圖案化導電積層體的非導電區域為任何層均不包含孔隙,圖案的非辨識性低。 Then, a patterned conductive laminate was obtained in the same manner as in Example 1. The non-conductive region of the patterned conductive laminate has no voids in any of the layers, and the pattern is low in non-recognition.

[產業上之利用可能性] [Industry use possibility]

本發明之導電積層體及圖案化導電積層體因圖案非辨識性良好而適用於觸控面板、液晶顯示器、電子紙等的顯示體用途。 The conductive laminated body and the patterned electrically conductive laminated body of the present invention are suitable for use in a display body such as a touch panel, a liquid crystal display, or an electronic paper because of poor pattern recognition.

1‧‧‧基材 1‧‧‧Substrate

2‧‧‧導電層 2‧‧‧ Conductive layer

3‧‧‧金屬系線狀結構體 3‧‧‧Metal linear structure

4‧‧‧無機粒子 4‧‧‧Inorganic particles

6‧‧‧基質 6‧‧‧Material

7‧‧‧底塗層 7‧‧‧Undercoat

Claims (15)

一種導電積層體,其係基材之至少單面具有導電層的導電積層體,其特徵在於:該導電層包含具有網絡結構之金屬系線狀結構體,再者導電積層體之任意層包含無機粒子。 A conductive laminated body comprising a conductive layered body having a conductive layer on at least one side of a substrate, wherein the conductive layer comprises a metal-based linear structure having a network structure, and further any layer of the conductive laminated body comprises inorganic particle. 如申請專利範圍第1項之導電積層體,其中基材及導電層之間具有含無機粒子之層。 The conductive laminate according to claim 1, wherein the substrate and the conductive layer have a layer containing inorganic particles. 一種圖案化導電積層體,其係基材之至少單面具有圖案化導電層的圖案化導電積層體,其特徵在於:該圖案化導電層具有存在具有網絡結構之金屬系線狀結構體的導電區域,及不存在具有網絡結構之金屬系線狀結構體的非導電區域,再者非導電區域之積層構造的任意層存在孔隙。 A patterned conductive laminate body, which is a patterned conductive laminate body having a patterned conductive layer on at least one side of a substrate, wherein the patterned conductive layer has a conductive structure in which a metal-based linear structure having a network structure exists. The region, and the non-conductive region in which the metal-based linear structure having the network structure is not present, and the void layer is present in any layer of the laminated structure of the non-conductive region. 如申請專利範圍第3項之圖案化導電積層體,其中基材及圖案化導電層之間具有存在孔隙之層。 The patterned conductive laminate according to claim 3, wherein the substrate and the patterned conductive layer have a layer having pores therebetween. 如申請專利範圍第4項之圖案化導電積層體,其中非導電區域相較於導電區域存在較多的孔隙。 The patterned conductive laminate according to claim 4, wherein the non-conductive region has more pores than the conductive region. 一種圖案化導電積層體之製造方法,其係如申請專利範圍第3、4、5項中任一項之圖案化導電積層體之製造方法,其特徵在於:藉由以藥劑處理來溶解如申請專利範圍第1或2項之導電積層體的無機粒子而形成孔隙。 A method for producing a patterned electrically conductive laminated body, which is a method for producing a patterned electrically conductive laminated body according to any one of claims 3, 4, and 5, which is characterized in that it is dissolved by a chemical treatment as applied The inorganic particles of the electroconductive laminate of the first or second aspect of the patent form pores. 如申請專利範圍第6項之圖案化導電積層體之製造方法,其中在藉由以藥劑處理來溶解無機粒子而形成孔隙之同時,亦除去具有網絡結構的金屬系線狀結構體,形成非導電區域。 The method for producing a patterned electrically conductive laminate according to claim 6, wherein the pores are formed by dissolving the inorganic particles by treatment with a chemical, and the metal-based linear structure having a network structure is also removed to form a non-conductive region. 一種圖案化導電積層體,其係以如申請專利範圍第6或7項之圖案化導電積層體之製造方法所獲得。 A patterned electrically conductive laminated body obtained by the method of producing a patterned electrically conductive laminated body according to claim 6 or 7. 如申請專利範圍第1項之導電積層體,其中金屬系線狀結構體為銀奈米線。 The conductive laminate according to claim 1, wherein the metal linear structure is a silver nanowire. 如申請專利範圍第1項之導電積層體,其中無機粒子的平均粒徑為500nm以下。 The conductive laminate according to claim 1, wherein the inorganic particles have an average particle diameter of 500 nm or less. 如申請專利範圍第3、4、5、8項中任一項之圖案化導電積層體,其中非導電區域所包含之孔隙的平均孔隙直徑為500nm以下。 The patterned electrically conductive laminate according to any one of claims 3, 4, 5, and 8, wherein the non-conductive region comprises pores having an average pore diameter of 500 nm or less. 如申請專利範圍第1項之導電積層體,其中無機粒子為碳酸鹽。 The conductive laminate according to claim 1, wherein the inorganic particles are carbonates. 一種顯示體,其係使用如申請專利範圍第1項之導電積層體,或如申請專利範圍第3、4、5、8項中任一項之圖案化導電積層體。 A display body using the conductive laminate of the first aspect of the patent application or the patterned conductive laminate according to any one of claims 3, 4, 5 and 8. 一種觸控面板,其係使用如申請專利範圍第13項之顯示體。 A touch panel using the display body of claim 13 of the patent application. 一種電子紙,其係使用如申請專利範圍第13項之顯示體。 An electronic paper using the display body of claim 13 of the patent application.
TW102115190A 2012-07-10 2013-04-29 Conductive laminated body, patterned conductive laminated body, method for producing same, and touch panel using the same TW201403635A (en)

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