TW201401709A - Contactless power supply device and contactless power supply system - Google Patents

Contactless power supply device and contactless power supply system Download PDF

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Publication number
TW201401709A
TW201401709A TW102118057A TW102118057A TW201401709A TW 201401709 A TW201401709 A TW 201401709A TW 102118057 A TW102118057 A TW 102118057A TW 102118057 A TW102118057 A TW 102118057A TW 201401709 A TW201401709 A TW 201401709A
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Taiwan
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power supply
coil
detection
frequency
receiving coil
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TW102118057A
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Chinese (zh)
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Satoshi Hyodo
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Panasonic Corp
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    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02JCIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/40Circuit arrangements or systems for wireless supply or distribution of electric power using two or more transmitting or receiving devices
    • H02J50/402Circuit arrangements or systems for wireless supply or distribution of electric power using two or more transmitting or receiving devices the two or more transmitting or the two or more receiving devices being integrated in the same unit, e.g. power mats with several coils or antennas with several sub-antennas
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02JCIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/10Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02JCIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/90Circuit arrangements or systems for wireless supply or distribution of electric power involving detection or optimisation of position, e.g. alignment
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02JCIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/005Mechanical details of housing or structure aiming to accommodate the power transfer means, e.g. mechanical integration of coils, antennas or transducers into emitting or receiving devices

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  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Power Engineering (AREA)
  • Charge And Discharge Circuits For Batteries Or The Like (AREA)

Abstract

Disclosed is a contactless power supply device and a contactless power supply system that, based on the existence/non-existence of a powered coil supplied with power by a power supply coil via the Electromagnetic Induction, adjust the working frequency of detecting process that works repeatedly to detect the existence/non-existence of the powered coil. Thus, such the contactless power supply device and contactless power supply system are able to decrease the consumed power under the situation that the powered coil is not disposed oppositely with the power supply coil.

Description

非接觸式供電裝置及非接觸式供電系統 Contactless power supply unit and contactless power supply system

本發明係關於一種非接觸式供電裝置及包含從非接觸式供電裝置供應電力之被供電裝置和前述非接觸式供電裝置的非接觸式供電系統。 The present invention relates to a contactless power supply device and a contactless power supply system including the power supply device that supplies power from the contactless power supply device and the aforementioned contactless power supply device.

以往為人所週知的有一種藉由利用電磁感應現象而從非接觸式供電裝置之供電線圈將電力供應至被供電裝置之受電線圈的非接觸式供電系統。而且,有一種以下之非接觸式供電系統為人所週知:執行檢測在與一次側線圈(供電線圈)相對向的位置是否配置有包含二次側線圈(受電線圈)的二次側機器(被供電裝置)之偵測處理,在配置有二次側機器的情況時驅動供電線圈(例如,參照專利文獻1)。 A contactless power supply system that supplies power from a power supply coil of a contactless power supply device to a power receiving coil of a power supply device by utilizing an electromagnetic induction phenomenon has been known in the past. Further, there is a following non-contact power supply system in which it is known whether or not a secondary side machine including a secondary side coil (receiving coil) is disposed at a position opposing the primary side coil (supply coil) ( In the detection processing of the power supply device, the power supply coil is driven when the secondary side device is disposed (for example, refer to Patent Document 1).

在該專利文獻1所揭示的技術中,係能基於已對一次側線圈供應交流之激磁電流時輸入至一次側線圈之驅動電路的輸入電流值,來檢測二次側機器(受電線圈)之有無。又,如此的二次側機器之偵測處理係被週期性地執行。 In the technique disclosed in Patent Document 1, it is possible to detect the presence or absence of the secondary side machine (receiving coil) based on the input current value of the drive circuit input to the primary side coil when the excitation current of the primary side coil is supplied to the primary side coil. . Moreover, the detection processing of such a secondary side machine is periodically performed.

然而,在上述之技術中,為了檢測受電線圈而有必要驅動供電線圈。因此,在二次側機器(受電線圈)未被對向 配置於非接觸式供電裝置(供電線圈)的情況,為了執行偵測處理也會消耗電力。尤其是,在非接觸式供電裝置具備複數個供電線圈的情況,有必要以供電線圈之數份來執行偵測處理。因此,為了偵測處理而被消耗的電力之增大就變得顯著。 However, in the above technique, it is necessary to drive the power supply coil in order to detect the power receiving coil. Therefore, the secondary side machine (receiving coil) is not facing When it is placed in a contactless power supply unit (power supply coil), power is also consumed in order to perform detection processing. In particular, in the case where the non-contact power supply device includes a plurality of power supply coils, it is necessary to perform detection processing with a plurality of power supply coils. Therefore, the increase in the power consumed to detect the processing becomes remarkable.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

(專利文獻1)日本特開2011-30284號公報 (Patent Document 1) Japanese Patent Laid-Open Publication No. 2011-30284

本發明係有鑑於上述之情事而開發完成的發明,其目的在於提供一種可以在受電線圈未被對向配置於供電線圈的情況降低被消耗之電力的非接觸式供電裝置及非接觸式供電系統。 The present invention has been made in view of the above circumstances, and an object of the invention is to provide a contactless power supply device and a contactless power supply system capable of reducing power consumed when a power receiving coil is not disposed opposite to a power feeding coil. .

本發明之非接觸式供電裝置及非接觸式供電系統,係能基於從供電線圈藉由電磁感應現象而供電的受電線圈之存在的有無,來調節反覆執行之偵測前述受電線圈之存在的有無的偵測處理之執行頻率(frequency)。因此,如此的非接觸式供電裝置及非接觸式供電系統係可以在受電線圈未被對向配置於供電線圈的情況降低被消耗的電力。 The non-contact power supply device and the non-contact power supply system of the present invention are capable of adjusting the presence or absence of the presence of the power receiving coil based on the presence or absence of the power receiving coil supplied from the power supply coil by the electromagnetic induction phenomenon. The execution frequency (frequency) of the detection process. Therefore, in such a non-contact power supply device and a non-contact power supply system, it is possible to reduce the consumed electric power when the power receiving coil is not disposed opposite to the power feeding coil.

上述以及其他本發明之目的、特徵及優點,係可從以下之詳細記載與附圖中獲得明白。 The above and other objects, features, and advantages of the present invention will be apparent from the description and appended claims.

1、1a、1b‧‧‧非接觸式供電系統 1, 1a, 1b‧‧‧ contactless power supply system

2、2a、2b‧‧‧非接觸式供電裝置 2, 2a, 2b‧‧‧ contactless power supply

3‧‧‧被供電裝置 3‧‧‧Powered devices

4、4a、4b‧‧‧控制部 4, 4a, 4b‧‧‧Control Department

21、31‧‧‧框體 21, 31‧‧‧ frame

22‧‧‧載置面(第1對向面) 22‧‧‧Loading surface (1st opposite)

23、23a、23b、23c、23d‧‧‧供電線圈 23, 23a, 23b, 23c, 23d‧‧‧ power supply coil

24‧‧‧電流檢測部 24‧‧‧ Current Detection Department

25‧‧‧電源部 25‧‧‧Power Department

32‧‧‧被載置面(第2對向面) 32‧‧‧Loaded surface (2nd opposite)

33‧‧‧受電線圈 33‧‧‧Acoustic coil

41‧‧‧偵測部 41‧‧‧Detection Department

42、42a、42b‧‧‧偵測控制部 42, 42a, 42b‧‧‧Detection Control Department

43‧‧‧線圈選擇部 43‧‧‧Coil Selection Department

44‧‧‧線圈控制部 44‧‧‧Coil Control Department

45‧‧‧計時器 45‧‧‧Timer

46‧‧‧計數器 46‧‧‧ counter

47‧‧‧記憶部 47‧‧‧Memory Department

251‧‧‧閘極驅動器電路 251‧‧ ‧ gate driver circuit

421‧‧‧檢測頻率取得部 421‧‧‧Detection Frequency Acquisition Department

422‧‧‧執行頻率調節部 422‧‧‧Execution frequency adjustment department

B‧‧‧線圈驅動方塊 B‧‧‧Coil Drive Block

C‧‧‧電容器 C‧‧‧ capacitor

Cj‧‧‧判定次數 Cj‧‧‧Number of decisions

Cf‧‧‧頻率計數值 Cf‧‧‧ frequency count value

CT‧‧‧計數值 CT‧‧‧ count value

i‧‧‧線圈編號 I‧‧‧ coil number

I‧‧‧線圈電流 I‧‧‧ coil current

P1‧‧‧連接點 P1‧‧‧ connection point

Q1、Q2‧‧‧場效電晶體 Q1, Q2‧‧‧ field effect transistor

ts‧‧‧基準時間 Ts‧‧‧ benchmark time

tw‧‧‧經過時間 Tw‧‧‧Elapsed time

VDD‧‧‧電源電壓 VDD‧‧‧Power supply voltage

Ref1、Ref2‧‧‧頻率基準值 Ref1, Ref2‧‧‧ frequency reference value

TM‧‧‧計時器設定值 TM‧‧‧Timer setting

圖1係用以說明本發明第1實施形態的非接觸式供電系統之構成之一例的說明圖。 1 is an explanatory view for explaining an example of a configuration of a non-contact power supply system according to a first embodiment of the present invention.

圖2係圖1所示的非接觸式供電系統中的非接觸式供電裝置之電氣構成之一例的方塊圖。 Fig. 2 is a block diagram showing an example of an electrical configuration of a contactless power supply device in the contactless power supply system shown in Fig. 1.

圖3係用以就在圖1所示的非接觸式供電系統中以供電線圈與受電線圈重疊之方式而對向配置的情況之供電線圈的電感(相互作用)加以說明的說明圖。 FIG. 3 is an explanatory diagram for explaining inductance (interaction) of the power supply coil in the case where the power supply coil and the power receiving coil are overlapped in the non-contact power supply system shown in FIG. 1 .

圖4係用以說明在圖1所示的非接觸式供電系統中因供電線圈與受電線圈之位置關係而引起的相互作用之說明圖。 Fig. 4 is an explanatory view for explaining an interaction caused by a positional relationship between a power supply coil and a power receiving coil in the non-contact power supply system shown in Fig. 1.

圖5係顯示在圖1所示的非接觸式供電系統中供電線圈與受電線圈的正對面積、與供電線圈的電感之關係之一例的曲線圖。 Fig. 5 is a graph showing an example of the relationship between the facing area of the power supply coil and the power receiving coil and the inductance of the power supply coil in the non-contact power supply system shown in Fig. 1.

圖6係用以說明在圖1所示的非接觸式供電系統中以重疊於供電線圈之方式被配置於對向之位置的受電線圈之有無、與供電線圈的線圈電流之關係的說明圖。 FIG. 6 is an explanatory view for explaining the relationship between the presence or absence of the power receiving coil disposed at the opposite position and the coil current of the power feeding coil in the non-contact power supply system shown in FIG.

圖7係顯示圖2所示的非接觸式供電裝置之動作之一例的流程圖。 Fig. 7 is a flow chart showing an example of the operation of the non-contact power supply device shown in Fig. 2.

圖8係顯示本發明第2實施形態的非接觸式供電裝置之構成之一例的方塊圖。 Fig. 8 is a block diagram showing an example of a configuration of a non-contact power supply device according to a second embodiment of the present invention.

圖9係顯示圖8所示的非接觸式供電裝置之動作之一例的流程圖。 Fig. 9 is a flow chart showing an example of the operation of the non-contact power supply device shown in Fig. 8.

圖10係顯示本發明第3實施形態的非接觸式供電裝置之構成之一例的方塊圖。 Fig. 10 is a block diagram showing an example of a configuration of a non-contact power supply device according to a third embodiment of the present invention.

圖11係顯示圖10所示的非接觸式供電裝置之動作之一例的流程圖之前半部。 Fig. 11 is a front half of the flowchart showing an example of the operation of the non-contact power supply device shown in Fig. 10.

圖12係顯示圖10所示的非接觸式供電裝置之動作之一例的流程圖之後半部。 Fig. 12 is a second half of the flowchart showing an example of the operation of the non-contact power supply device shown in Fig. 10.

以下,基於圖式說明本發明的實施之一形態。另外,在各圖中附記同一符號的構成,係顯示同一構成,且適當地省略其說明。又,在本說明書中,於統稱的情況係以省略添加文字後的參照符號來顯示,且在指個別構成的情況係以附有添加文字的參照符號來顯示。 Hereinafter, an embodiment of the present invention will be described based on the drawings. In the drawings, the same components are denoted by the same reference numerals, and the description thereof will be omitted as appropriate. Further, in the present specification, the case of the collective designation is displayed by omitting the reference symbol after the addition of the character, and in the case of the individual configuration, the reference symbol with the added character is displayed.

(第1實施形態) (First embodiment)

圖1係用以說明第1實施形態的非接觸式供電系統之構成之一例的說明圖。圖1所示的非接觸式供電系統1係具備非接觸式供電裝置2及被供電裝置3,且組合此等所構成。非接觸式供電裝置2和被供電裝置3係以能夠分離的方式所構成。 Fig. 1 is an explanatory view for explaining an example of a configuration of a non-contact power supply system according to the first embodiment. The non-contact power supply system 1 shown in FIG. 1 includes a non-contact power supply device 2 and a power supply device 3, and is configured in combination. The contactless power supply device 2 and the power supply device 3 are configured to be separable.

非接觸式供電裝置2係具備大致箱狀的框體21,被供電裝置3係具備大致箱狀的框體31。在圖1中,非接觸式供電裝置2之框體21的上面係被當作用以載置被供電裝置3的載置面(第1對向面)22。形成框體21之上面的部分為載置構件之一例。被供電裝置3之框體31的下面係設為用以與載置面22相對向且使其接觸的被載置面(第2對向面)32。在圖1所示之例中,非接觸式供電裝置2之框體21係比被供電裝置3之框體31還大,且載置面22係比被 載置面還寬。 The non-contact power supply device 2 includes a substantially box-shaped casing 21, and the power feeding device 3 includes a substantially box-shaped casing 31. In FIG. 1, the upper surface of the casing 21 of the non-contact power supply device 2 is regarded as a mounting surface (first opposing surface) 22 on which the power feeding device 3 is placed. The portion on which the upper surface of the frame 21 is formed is an example of a mounting member. The lower surface of the casing 31 of the power feeding device 3 is a mounting surface (second opposing surface) 32 for contacting the mounting surface 22 and contacting it. In the example shown in FIG. 1, the frame 21 of the contactless power supply device 2 is larger than the frame 31 of the power supply device 3, and the mounting surface 22 is compared. The mounting surface is also wide.

在非接觸式供電裝置2,係以作為框體21內的載置面22之內側(正下方)且線圈上面大致平行地沿著載置面22的方式,配置有呈二次元陣列狀的複數個供電線圈23。複數個供電線圈23係以供電線圈23相互間的間隔大致成為零的方式緊密地配設。亦即,以線圈周面彼此相接的方式,配設有複數個供電線圈23。 In the non-contact power supply device 2, a plurality of quadratic arrays are arranged so as to be inside (directly below) the mounting surface 22 in the casing 21 and the coil upper surface is substantially parallel along the mounting surface 22. Power supply coils 23. The plurality of power feeding coils 23 are closely arranged such that the distance between the power feeding coils 23 is substantially zero. That is, a plurality of power supply coils 23 are disposed such that the circumferential surfaces of the coils are in contact with each other.

在被供電裝置3係以作為框體31內的被載置面32之內側(正上方)且線圈上面大致平行地沿著被載置面32的方式,配置有複數個受電線圈33。受電線圈33為藉由電磁感應現象而由供電線圈23所供電的供電對象。被供電裝置3係具備未圖示之負載。而且,在受電線圈33受電的電力係供應至前述未圖示之負載。 The power receiving device 3 is provided with a plurality of power receiving coils 33 disposed on the inner side (directly above) of the mounting surface 32 in the casing 31 and the coil upper surface is substantially parallel along the mounting surface 32. The power receiving coil 33 is a power supply target that is supplied by the power feeding coil 23 by the electromagnetic induction phenomenon. The power receiving device 3 is provided with a load (not shown). Further, the electric power received by the power receiving coil 33 is supplied to the load (not shown).

圖2係圖1所示的非接觸式供電系統1中的非接觸式供電裝置2之電氣構成之一例的方塊圖。圖2所示的非接觸式供電裝置2係具備複數個線圈驅動方塊B及控制部4。線圈驅動方塊B係包含供電線圈23,且此等複數個線圈驅動方塊B係分別對應複數個供電線圈23而設置。 Fig. 2 is a block diagram showing an example of the electrical configuration of the non-contact power supply device 2 in the non-contact power supply system 1 shown in Fig. 1. The non-contact power supply device 2 shown in FIG. 2 includes a plurality of coil drive blocks B and a control unit 4. The coil drive block B includes a power supply coil 23, and the plurality of coil drive blocks B are respectively provided corresponding to the plurality of power supply coils 23.

線圈驅動方塊B係包含供電線圈23、電流檢測部24及電源部25。電源部25為選擇性地將高頻電壓供應至複數個供電線圈23的電路,且例如具備閘極驅動器電路251、FET(Field Effect Transistor:場效電晶體)Q1、Q2及電容器C。 The coil drive block B includes a power supply coil 23, a current detecting unit 24, and a power supply unit 25. The power supply unit 25 is a circuit that selectively supplies a high-frequency voltage to the plurality of power supply coils 23, and includes, for example, a gate driver circuit 251, FETs (Field Effect Transistors) Q1, Q2, and a capacitor C.

另外,供電線圈23亦可為一個,而線圈驅動方塊B 亦可為一個。 In addition, the power supply coil 23 can also be one, and the coil drive block B Can also be one.

FETQ1係例如為P通道(channel)FET,而FETQ2係例如為N通道FET。然後,在FETQ1之源極(source)施加有從未圖示之電源電路供應的電源電壓VDD,FETQ1之汲極(drain)連接於FETQ2之汲極,FETQ2之源極連接於電路接地(ground)。FETQ1與FETQ2之連接點P1係透過電容器C、電流檢測部24及供電線圈23而連接於電路接地。 The FET Q1 is, for example, a P channel FET, and the FET Q2 is, for example, an N channel FET. Then, a source voltage VDD supplied from a power supply circuit (not shown) is applied to the source of the FET Q1, a drain of the FET Q1 is connected to the drain of the FET Q2, and a source of the FET Q2 is connected to the ground of the circuit. . The connection point P1 between the FET Q1 and the FET Q2 is connected to the circuit ground through the capacitor C, the current detecting unit 24, and the power supply coil 23.

閘極驅動器電路251係按照來自控制部4之控制信號,使FETQ1和FETQ2大致交互地以高頻進行接通(ON)、斷開(OFF),俾於在使一方接通的情況使另一方斷開。藉此,能藉由FETQ1、Q2而在連接點P1產生高頻電壓。電容器C係從藉由FETQ1、Q2而產生的高頻電壓中切斷直流成分,且將殘留的高頻成分供應至供電線圈23。 The gate driver circuit 251 turns on (ON) and turns off (OFF) the FET Q1 and the FET Q2 in a substantially high frequency in accordance with a control signal from the control unit 4, and turns on the other side when one is turned on. disconnect. Thereby, a high-frequency voltage can be generated at the connection point P1 by the FETs Q1 and Q2. The capacitor C cuts off the DC component from the high-frequency voltage generated by the FETs Q1 and Q2, and supplies the remaining high-frequency component to the power supply coil 23.

電流檢測部24係按照藉由電源部25而供應來的高頻電壓來檢測流動至供電線圈23的線圈電流I。然後,電流檢測部24係將顯示被檢測出的線圈電流I之電流值的信號輸出至控制部4。電流檢測部24係例如為分流電阻器(shunt resistor)或霍爾(Hall)元件等的電流感測器。 The current detecting unit 24 detects the coil current I flowing to the power feeding coil 23 in accordance with the high-frequency voltage supplied from the power supply unit 25. Then, the current detecting unit 24 outputs a signal indicating the current value of the detected coil current I to the control unit 4. The current detecting unit 24 is, for example, a current sensor such as a shunt resistor or a Hall element.

非接觸式供電裝置2係僅具備與供電線圈相同數目之以此方式構成的線圈驅動方塊B。 The contactless power supply device 2 is only provided with the same number of coil drive blocks B constructed in this manner as the power supply coil.

控制部4係具備:例如執行預定之運算處理的CPU(Central Processing Unit:中央處理單元);記憶有預定之控制程式的非揮發性之ROM(Read Only Memory:唯讀記憶體);暫時記憶資料的揮發性之RAM(Random Access Memory:隨機存取記憶體);以及此等之周邊電路等所構成。然後,控制部4係藉由執行例如記憶於ROM的控制程式,而功能性地具備偵測部41、偵測控制部42、線圈選擇部43及線圈控制部44,且發揮作為偵測部41、偵測控制部42、線圈選擇部43及線圈控制部44的功能。 The control unit 4 includes, for example, a CPU (Central Processing Unit) that performs predetermined arithmetic processing; a non-volatile ROM (Read Only Memory) that stores a predetermined control program; and temporarily stores data. Volatile RAM (Random Access Memory: Random access memory); and these peripheral circuits are constructed. Then, the control unit 4 functionally includes the detection unit 41, the detection control unit 42, the coil selection unit 43, and the coil control unit 44 by executing, for example, a control program stored in the ROM, and functions as the detection unit 41. The functions of the detection control unit 42, the coil selection unit 43, and the coil control unit 44.

偵測部41係以偵測控制部42所設定的執行間隔反覆執行用以偵測以分別與複數個供電線圈23重疊之方式被配置於對向之位置的受電線圈33之存在的有無的偵測處理。更具體而言,偵測部41係例如藉由各線圈驅動方塊B之電源部25而分別將高頻電壓供應至供電線圈23(處理A)。然後,偵測部41係在藉由各線圈驅動方塊B之電流檢測部24將高頻電壓供應至分別對應的供電線圈23之期間中,使各供電線圈23之線圈電流I藉由各電流檢測部24而檢測(處理B)。然後,偵測部41係判定在與對應於電流檢測部24之供電線圈23相對向的位置存在有受電線圈(處理C),該電流檢測部24係檢測出超過預先被設定之判定值的線圈電流1。 The detecting unit 41 repeatedly executes the detection of the presence or absence of the power receiving coil 33 disposed at the opposite position so as to overlap the plurality of power feeding coils 23 at the execution interval set by the detection control unit 42. Measurement processing. More specifically, the detecting unit 41 supplies the high-frequency voltage to the power feeding coil 23, for example, by driving the power supply unit 25 of the block B for each coil (Process A). Then, the detecting unit 41 causes the coil current I of each of the power feeding coils 23 to be detected by each current while the high-frequency voltage is supplied to the corresponding power feeding coils 23 by the current detecting unit 24 of each coil driving block B. The portion 24 detects (process B). Then, the detecting unit 41 determines that there is a power receiving coil (process C) at a position facing the power feeding coil 23 corresponding to the current detecting unit 24, and the current detecting unit 24 detects a coil exceeding a determination value set in advance. Current 1.

偵測部41係對應於複數個供電線圈23而分別執行包含上述處理A、處理B及處理C的偵測處理。如此,偵測部41係偵測被配置於與複數個供電線圈23分別相對向之位置的受電線圈33之存在的有無。然後,偵測部41係以與各供電線圈23分別對應之執行間隔來對應於各供電線圈23而分別反覆執行如此之偵測處理。 The detecting unit 41 performs detection processing including the above-described processing A, processing B, and processing C corresponding to the plurality of power feeding coils 23, respectively. In this manner, the detecting unit 41 detects the presence or absence of the power receiving coil 33 disposed at a position facing each of the plurality of power feeding coils 23, respectively. Then, the detecting unit 41 repeatedly performs such detection processing corresponding to each of the power feeding coils 23 at an execution interval corresponding to each of the power feeding coils 23, respectively.

圖3係用以就在圖1所示的非接觸式供電系統1中以 供電線圈23與受電線圈33重疊之方式而對向配置的情況之供電線圈23的電感加以說明的說明圖。首先,如圖3A所示,在圖3A所示之例中係以完全重疊之方式對向配置,俾供電線圈23與受電線圈33在彼此之後述的線圈面重疊。 Figure 3 is used in the contactless power supply system 1 shown in Figure 1 An illustration of the inductance of the power supply coil 23 in the case where the power feeding coil 23 and the power receiving coil 33 are overlapped with each other is disposed. First, as shown in FIG. 3A, in the example shown in FIG. 3A, the alignment is performed in a completely overlapping manner, and the power feeding coil 23 and the power receiving coil 33 are overlapped with each other on a coil surface which will be described later.

其次,從電源部25輸出電壓並使得線圈電流流動至供電線圈23(圖3B)。當線圈電流流動至供電線圈23時,就以貫通供電線圈23與受電線圈33之方式藉由供電線圈23而產生交鏈(interlinkage)磁通(圖3C)。 Next, the voltage is output from the power supply unit 25 and the coil current is caused to flow to the power supply coil 23 (Fig. 3B). When the coil current flows to the power supply coil 23, an interlinkage magnetic flux is generated by the power supply coil 23 so as to penetrate the power supply coil 23 and the power receiving coil 33 (FIG. 3C).

當交鏈磁通貫通至受電線圈33時,就在受電線圈33藉由電磁感應現象而流動有與供電線圈23逆旋轉的線圈電流。藉由該逆旋轉之線圈電流,而在受電線圈33產生有與在供電線圈23所產生之磁通相反方向的交鏈磁通。因此,在供電線圈23係流動有電流俾阻擋在受電線圈33所產生的交鏈磁通(圖3D)。 When the interlinkage magnetic flux penetrates the power receiving coil 33, the coil current of the power receiving coil 23 is reversely rotated by the electromagnetic induction phenomenon. By the reversely rotating coil current, the power receiving coil 33 generates an interlinkage magnetic flux in a direction opposite to the magnetic flux generated by the power feeding coil 23. Therefore, a current flows in the power supply coil 23 blocks the interlinkage magnetic flux generated by the power receiving coil 33 (Fig. 3D).

如此,當供電線圈23與受電線圈33以在相互的線圈面重疊之方式對向配置時,藉由取決於由供電線圈23與受電線圈33所形成之磁性電路的相互作用,而在供電線圈23單體的情況、和供電線圈23與受電線圈33對向配置的情況,使得流動至供電線圈23的電流有所不同。因而,在供電線圈23單體的情況、和供電線圈23與受電線圈33對向配置的情況,供電線圈23之外觀上的電感會產生變化。 In this manner, when the power supply coil 23 and the power receiving coil 33 are opposed to each other so as to overlap each other, the power supply coil 23 is supported by the magnetic circuit formed by the power supply coil 23 and the power receiving coil 33. In the case of the single unit and the case where the power supply coil 23 and the power receiving coil 33 are opposed to each other, the current flowing to the power supply coil 23 is different. Therefore, in the case where the power supply coil 23 is single and the power supply coil 23 and the power receiving coil 33 are arranged to face each other, the inductance of the external appearance of the power supply coil 23 changes.

圖4係用以說明在圖1所示的非接觸式供電系統中因供電線圈23與受電線圈33之位置關係而引起的相互作用 之說明圖。圖5係顯示在圖1所示的非接觸式供電系統中供電線圈23與受電線圈33的正對面積、與供電線圈23的電感之關係之一例的曲線圖。 4 is a view for explaining the interaction caused by the positional relationship between the power supply coil 23 and the power receiving coil 33 in the contactless power supply system shown in FIG. 1. Description of the figure. Fig. 5 is a graph showing an example of the relationship between the facing area of the power supply coil 23 and the power receiving coil 33 and the inductance of the power feeding coil 23 in the non-contact power supply system shown in Fig. 1.

圖4A係顯示供電線圈23之位置與受電線圈33之位置在彼此的線圈軸為一致的情況之說明圖。亦即,圖4A係顯示供電線圈23與受電線圈33以在彼此之線圈面完全地重疊之方式對向配置,且供電線圈23與受電線圈33之正對面積成為最大的情況之例的說明圖。 4A is an explanatory view showing a state in which the position of the power feeding coil 23 and the position of the power receiving coil 33 coincide with each other. In other words, FIG. 4A is an explanatory view showing an example in which the power feeding coil 23 and the power receiving coil 33 are opposed to each other so as to completely overlap each other, and the facing area of the power transmitting coil 23 and the power receiving coil 33 is maximized. .

所謂供電線圈23及受電線圈33之各線圈面,係指由供電線圈23及受電線圈33之最外周的捲線所包圍而成的平面,且為沿著與供電線圈23及受電線圈33之交鏈磁通正交的方向擴展的平面。所謂供電線圈23之面積係指供電線圈23之線圈面的面積,所謂受電線圈33之面積係指受電線圈33之線圈面的面積。然後,所謂供電線圈23與受電線圈33之正對面積,係指供電線圈23之線圈面與受電線圈33之線圈面相對向並彼此重疊的部分之面積。 The coil faces of the power supply coil 23 and the power receiving coil 33 are planes surrounded by the winding wires on the outermost circumference of the power feeding coil 23 and the power receiving coil 33, and are interlinked with the power feeding coil 23 and the power receiving coil 33. A plane in which the flux is orthogonal to the direction of expansion. The area of the power feeding coil 23 is the area of the coil surface of the power feeding coil 23, and the area of the power receiving coil 33 is the area of the coil surface of the power receiving coil 33. The area where the power supply coil 23 and the power receiving coil 33 face each other is the area of the portion where the coil surface of the power feeding coil 23 and the coil surface of the power receiving coil 33 face each other and overlap each other.

如圖4A所示,在供電線圈23之位置與受電線圈33之位置在彼此之線圈軸一致的情況,供電線圈23與受電線圈33之正對面積係成為最大。在該供電線圈23與受電線圈33之正對面積變成最大的情況,交鏈於供電線圈23及受電線圈33的交鏈磁通數會變成最大,且供電線圈23及受電線圈33之相互作用成為最大。結果,供電線圈23之電感係成為最少。 As shown in FIG. 4A, when the position of the power feeding coil 23 and the position of the power receiving coil 33 coincide with each other, the facing area of the power transmitting coil 23 and the power receiving coil 33 is maximized. When the facing area of the power feeding coil 23 and the power receiving coil 33 becomes the largest, the number of interlinking magnetic fluxes that are interlinked between the power feeding coil 23 and the power receiving coil 33 becomes maximum, and the interaction between the power feeding coil 23 and the power receiving coil 33 becomes maximum. As a result, the inductance of the power supply coil 23 is minimized.

如圖4B所示,在供電線圈23之位置與受電線圈33 之位置在彼此之線圈軸不一致,而在各線圈軸之各位置有偏移的情況,供電線圈23與受電線圈33之正對面積係變得比圖4A所示的情況還為小。因而,交鏈於供電線圈23及受電線圈33的交鏈磁通數會減少。因此,供電線圈23及受電線圈33之相互作用會變小,結果,供電線圈23之電感係變得比圖4A所示的情況還更為大。 As shown in FIG. 4B, at the position of the power supply coil 23 and the power receiving coil 33 The positions of the coil axes do not coincide with each other, and when the respective positions of the coil axes are shifted, the facing area of the power feeding coil 23 and the power receiving coil 33 is smaller than that shown in Fig. 4A. Therefore, the number of interlinkage fluxes that are interlinked to the power feeding coil 23 and the power receiving coil 33 is reduced. Therefore, the interaction between the power feeding coil 23 and the power receiving coil 33 becomes small, and as a result, the inductance of the power feeding coil 23 becomes larger than the case shown in Fig. 4A.

如圖4C所示,在供電線圈23之位置與受電線圈33之位置不在彼此之線圈面重疊而完全偏移的情況,供電線圈23與受電線圈33之正對面積係變成零。因而,供電線圈23及受電線圈33之相互作用會變無,而供電線圈23之電感會變成最大。 As shown in FIG. 4C, when the position of the power feeding coil 23 and the position of the power receiving coil 33 do not overlap each other and are completely shifted, the facing area of the power transmitting coil 23 and the power receiving coil 33 becomes zero. Therefore, the interaction between the power supply coil 23 and the power receiving coil 33 becomes unnecessary, and the inductance of the power supply coil 23 becomes maximum.

根據以上,供電線圈23與受電線圈33之正對面積、和供電線圈23之電感,係處於預定之關係,例如圖5所示,當線圈正對面積越大則電感就變得越小。由於供電線圈23之電感與線圈正對面積係如圖5所示處於1對1對應的關係,所以供電線圈23之電感係成為顯示線圈正對面積的資訊,且為前述資訊之一例。 According to the above, the facing area of the power feeding coil 23 and the power receiving coil 33 and the inductance of the power feeding coil 23 are in a predetermined relationship. For example, as shown in FIG. 5, the inductance becomes smaller as the opposing area of the coil is larger. Since the inductance of the power supply coil 23 and the direct facing area of the coil are in a one-to-one correspondence relationship as shown in FIG. 5, the inductance of the power supply coil 23 is information indicating the area in which the coil is facing, and is an example of the aforementioned information.

圖6係用以說明在圖1所示的非接觸式供電系統中以重疊於供電線圈之方式被配置於對向之位置的受電線圈之有無、與供電線圈的線圈電流之關係的說明圖。例如,如圖6A所示,在四個供電線圈23a、23b、23c、23d被配置成一行的情況,受電線圈33就橫跨於彼此鄰接的供電線圈23b與供電線圈23c而對向配置。 FIG. 6 is an explanatory view for explaining the relationship between the presence or absence of the power receiving coil disposed at the opposite position and the coil current of the power feeding coil in the non-contact power supply system shown in FIG. For example, as shown in FIG. 6A, when the four power feeding coils 23a, 23b, 23c, and 23d are arranged in a row, the power receiving coil 33 is disposed to face the power feeding coil 23b and the power feeding coil 23c which are adjacent to each other.

在該圖6A所示之狀態中,由於供電線圈23a、23d對 受電線圈33的各正對面積為零,所以根據圖5所示之曲線圖,供電線圈23a、23d之各電感係變成較大的值。在將供電線圈23之電感設為L,將從電源部25輸出的高頻電壓之電壓設為V,將頻率設為f的情況,供電線圈23之線圈電流I係能以下列公式(1)來表示。 In the state shown in FIG. 6A, since the power supply coils 23a, 23d are paired Since the respective facing areas of the power receiving coils 33 are zero, the inductances of the power feeding coils 23a and 23d become large values according to the graph shown in FIG. When the inductance of the power supply coil 23 is L, the voltage of the high-frequency voltage output from the power supply unit 25 is V, and the frequency is f, the coil current I of the power supply coil 23 can be expressed by the following formula (1). To represent.

I=V/(2 π fL)…(1) I=V/(2 π fL)...(1)

因而,線圈電流I係當電感越小則變得越大。由於線圈電流I與電感係處於1對1對應的關係,所以藉由電流檢測部24而被檢測出的線圈電流I係成為顯示供電線圈23之電感的資訊,且為前述資訊之一例。 Therefore, the coil current I becomes larger as the inductance is smaller. Since the coil current I and the inductance are in a one-to-one correspondence relationship, the coil current I detected by the current detecting unit 24 is information indicating the inductance of the power feeding coil 23, and is an example of the above information.

又,線圈電流I係當正對面積越大就成為越大的值。由於線圈電流I與正對面積係處於1對1對應的關係,所以藉由電流檢測部24而被檢測出的線圈電流I亦成為顯示供電線圈23之正對面積的資訊,且為前述資訊之一例。 Further, the coil current I is a value that becomes larger as the opposing area is larger. Since the coil current I has a one-to-one correspondence with the area of the pair, the coil current I detected by the current detecting unit 24 also becomes the information indicating the area of the power supply coil 23, and is the aforementioned information. An example.

如以上所述,由於線圈電流I係當正對面積越小就成為越小的值,所以流動至正對面積為零的供電線圈23a、23d之線圈電流I,係如圖6B所示成為較小的值。如此,比流動至正對面積為零的供電線圈23a、23d之線圈電流I還些微大的電流值,係預先被設定作為用以判定是否為以與受電線圈33在線圈面重疊之方式對向的供電線圈23之判定值。另一方面,流動至以與受電線圈33在線圈面重疊之方式對向的供電線圈23b、23c之線圈電流I,係比流動至供電線圈23a、23d之線圈電流I還更為大,且比判定值還更為大。 As described above, since the coil current I is a smaller value as the area is smaller, the coil current I flowing to the power supply coils 23a and 23d having the area zero is as shown in Fig. 6B. Small value. In this way, a current value which is slightly larger than the coil current I flowing to the power supply coils 23a and 23d having the area of zero is set in advance as a determination as to whether or not to overlap the power receiving coil 33 on the coil surface. The judgment value of the power supply coil 23. On the other hand, the coil current I flowing to the power feeding coils 23b and 23c opposed to the power receiving coil 33 so as to overlap the coil surface is larger than the coil current I flowing to the power feeding coils 23a and 23d, and is larger than The decision value is still larger.

另外,雖然已顯示偵測部41基於線圈電流I之電流值來檢測受電線圈33之例,但是並不一定限於基於線圈電流I來檢測受電線圈33之例。例如,亦可構成為:在各供電線圈23之附近分別配設有光學感測器,且偵測部41係藉由此等之複數個光學感測器來檢測在與各供電線圈23相對向的位置是否存在被供電裝置3(受電線圈33)。當在載置面22上載置有被供電裝置3時由於光學感測器之受光量會減少,所以能藉由此等複數個光學感測器來檢測被供電裝置3之載置的有無,且可以檢測被載置於載置面22上的被供電裝置3之位置。 Further, although the example in which the detecting unit 41 detects the power receiving coil 33 based on the current value of the coil current I has been shown, it is not necessarily limited to the case where the power receiving coil 33 is detected based on the coil current I. For example, an optical sensor may be disposed in the vicinity of each of the power feeding coils 23, and the detecting portion 41 detects the opposite side of each of the power feeding coils 23 by the plurality of optical sensors. Whether or not the power supply device 3 (power receiving coil 33) exists. When the power supply device 3 is placed on the mounting surface 22, the amount of light received by the optical sensor is reduced, so that the presence or absence of the placement of the power supply device 3 can be detected by the plurality of optical sensors. The position of the power supply device 3 placed on the mounting surface 22 can be detected.

又,偵測部41亦可構成為藉由例如公知的電感測定手段來測定各供電線圈23之電感。然後,在如此之情況,偵測部41係判定在與未檢測出未滿上述判定值和對應之電感值的電感之供電線圈23相對向的位置存在有受電線圈33。 Further, the detecting unit 41 may be configured to measure the inductance of each of the power feeding coils 23 by, for example, a known inductance measuring means. Then, in such a case, the detecting unit 41 determines that the power receiving coil 33 exists at a position facing the power feeding coil 23 that does not detect the inductance that is less than the above-described determination value and the corresponding inductance value.

雖然光學感測器、或供電線圈23之電感測定處理會消耗電力,但是在偵測部41基於光學感測器或電感測定而偵測受電線圈的情況,可以藉由減少偵測處理之執行頻率來降低消耗電力。 Although the inductance measurement process of the optical sensor or the power supply coil 23 consumes power, the detection unit 41 detects the power receiving coil based on the optical sensor or the inductance measurement, and can reduce the execution frequency of the detection process. To reduce power consumption.

偵測控制部42係在藉由偵測部41而偵測出受電線圈33之存在為止,一邊使取決於偵測部41的偵測處理之執行間隔增大一邊使偵測部41反覆進行偵測處理。 The detection control unit 42 causes the detection unit 41 to repeatedly detect the execution interval of the detection processing by the detection unit 41 while detecting the presence of the power receiving coil 33 by the detecting unit 41. Measurement processing.

線圈選擇部43係從複數個供電線圈23之中選擇藉由偵測部41而判定出在該對向之位置存在有受電線圈33的 1個或複數個供電線圈23作為激磁對象線圈。 The coil selecting unit 43 selects, from among the plurality of power feeding coils 23, that the detecting unit 41 determines that the power receiving coil 33 is present at the opposite position. One or a plurality of power supply coils 23 are used as excitation target coils.

線圈控制部44係藉由電源部25使高頻電壓供應至藉由線圈選擇部43而被選出作為激磁對象線圈之供電線圈、在圖6所示之例中為供電線圈23b、23c。藉此,在該圖6所示之例中,能從複數個供電線圈23b、23c供應電力至受電線圈33。 The coil control unit 44 supplies the high-frequency voltage to the power supply coil as the excitation target coil by the coil selection unit 43 by the power supply unit 25, and the power supply coils 23b and 23c in the example shown in FIG. Thereby, in the example shown in FIG. 6, electric power can be supplied from the plurality of power feeding coils 23b and 23c to the power receiving coil 33.

藉此,使用者只要將被供電裝置3載置於圖1所示之載置面22上,即便未將供電線圈23與受電線圈33正確地定位,亦能藉由線圈選擇部43選擇以與受電線圈33在線圈面重疊之方式對向的1個或複數個供電線圈23作為激磁對象線圈。然後,對該激磁對象線圈供應高頻電壓,並從激磁對象線圈供應電力至受電線圈33。因而,即便在未使供電線圈23與受電線圈33正確地定位,而發生供電線圈與受電線圈之位置偏移的情況,亦可以從非接觸式供電裝置2供電至被供電裝置3。 Thereby, the user can place the power feeding device 3 on the mounting surface 22 shown in FIG. 1, and even if the power feeding coil 23 and the power receiving coil 33 are not correctly positioned, the coil selecting unit 43 can select and One or a plurality of power feeding coils 23 that are opposed to each other by the power receiving coil 33 on the coil surface are used as the exciting target coil. Then, a high-frequency voltage is supplied to the excitation target coil, and electric power is supplied from the excitation target coil to the power receiving coil 33. Therefore, even if the power feeding coil 23 and the power receiving coil 33 are not correctly positioned, the position of the power feeding coil and the power receiving coil is shifted, and the power can be supplied from the non-contact power feeding device 2 to the power receiving device 3.

以下,就構成如上述的非接觸式供電系統1之動作加以說明。首先,供電線圈23之個數係設為n個。然後,在n個供電線圈23係附記有1至n的線圈編號。以下,線圈編號i之供電線圈23係表記為供電線圈23(i)。包含供電線圈23(i)之線圈驅動方塊B係表記為線圈驅動方塊B(i)。線圈驅動方塊B(i)中所含的電流檢測部24及電源部25、即與供電線圈(i)對應的電流檢測部24及電源部25,係分別表記為電流檢測部24(i)及電源部25(i)。藉由電流檢測部24(i)而被檢測出的線圈電流I、即流動至供電線圈23(i) 的線圈電流I,係表記為線圈電流I(i)。又,與供電線圈23(i)對應的計時器45係表記為計時器(i),且計時器45(i)之計時器設定值TM係表記為計時器設定值TM(i)。 Hereinafter, the operation of the non-contact power supply system 1 as described above will be described. First, the number of the power supply coils 23 is set to n. Then, coil numbers of 1 to n are attached to the n power feeding coils 23. Hereinafter, the power supply coil 23 of the coil number i is referred to as a power supply coil 23 (i). The coil drive block B including the power supply coil 23(i) is denoted as a coil drive block B(i). The current detecting unit 24 and the power supply unit 25 included in the coil driving block B(i), that is, the current detecting unit 24 and the power supply unit 25 corresponding to the power feeding coil (i) are respectively referred to as the current detecting unit 24(i) and Power supply unit 25(i). The coil current I detected by the current detecting unit 24(i), that is, flows to the power supply coil 23(i) The coil current I is denoted as the coil current I(i). Further, the timer 45 corresponding to the power feeding coil 23(i) is denoted by the timer (i), and the timer setting value TM of the timer 45(i) is expressed as the timer setting value TM(i).

圖7係顯示圖2所示的非接觸式供電裝置2之動作之一例的流程圖。圖7所示之流程圖係顯示對應於供電線圈23(i)的動作。控制部4係對全部的供電線圈23(1)至23(n)平行執行與圖7所示之流程圖同樣的動作。 Fig. 7 is a flow chart showing an example of the operation of the non-contact power supply device 2 shown in Fig. 2. The flowchart shown in Fig. 7 shows the action corresponding to the power supply coil 23(i). The control unit 4 performs the same operations as those of the flowchart shown in Fig. 7 in parallel with all of the power feeding coils 23(1) to 23(n).

首先,偵測控制部42係對計時器設定值TM(i)設定預先被設定之初始值作為初始處理(步驟S1)。初始值係被設為預定之時間、例如1秒。又,初始值為計時器設定值TM(執行間隔)之下限值。 First, the detection control unit 42 sets an initial value set in advance to the timer setting value TM(i) as an initial process (step S1). The initial value is set to a predetermined time, for example, 1 second. Also, the initial value is the lower limit value of the timer set value TM (execution interval).

其次,偵測部41係對計時器45(i)設定計時器設定值TM(i),且使計時器45(i)開始計時(步驟S2)。計時器45(i)係在從計時開始經過了計時器設定值TM(i)之時間的情況就已時間到(time’s up)。 Next, the detecting unit 41 sets the timer setting value TM(i) to the timer 45(i), and starts the timer 45(i) (step S2). The timer 45(i) is time's up when the timer setting value TM(i) has elapsed from the time of counting.

其次,偵測部41係判定計時器45(i)是否已時間到(步驟S3)。然後,在計時器45(i)已時間到的情況(步驟S3中為「是」),偵測部41係為了開始偵測處理而使電源部25(i)將高頻電壓供應至供電線圈23(i)(步驟S4)。 Next, the detecting unit 41 determines whether or not the timer 45(i) has elapsed (step S3). Then, when the timer 45(i) has elapsed (YES in step S3), the detecting unit 41 causes the power supply unit 25(i) to supply the high-frequency voltage to the power supply coil in order to start the detection processing. 23(i) (step S4).

其次,偵測部41係比較藉由電流檢測部24(i)而被檢測出的線圈電流I(i)、和判定值(步驟S5)。該比較之結果,在線圈電流I(i)為判定值以下的情況(步驟S5中為「否」),偵測部41係判定在與供電線圈23(i)相對向的位置不存在受電線圈33(步驟S6)。另一方面,前述比較之結果,在線 圈電流I(i)超過判定值的情況(步驟S5中為「是」),偵測部41係判定在與供電線圈23(i)相對向的位置存在有受電線圈33(步驟S9)。以上之步驟S4至S6、S9係相當於偵測處理之一例。 Next, the detecting unit 41 compares the coil current I(i) detected by the current detecting unit 24(i) with the determination value (step S5). As a result of the comparison, when the coil current I(i) is equal to or less than the determination value (NO in step S5), the detecting unit 41 determines that there is no power receiving coil at a position facing the power feeding coil 23(i). 33 (step S6). On the other hand, the results of the aforementioned comparison, online When the loop current I(i) exceeds the determination value (YES in step S5), the detecting unit 41 determines that the power receiving coil 33 exists at a position facing the power feeding coil 23(i) (step S9). The above steps S4 to S6 and S9 are equivalent to an example of detection processing.

然後,在步驟S6中,偵測部41判定出在與供電線圈23(i)相對向的位置不存在受電線圈33的情況,線圈控制部44係使電源部25(i)停止對供電線圈23(i)供應高頻電壓(步驟S7)。其次,偵測控制部42係藉由對計時器設定值TM(i)加上例如1秒來增大計時器設定值TM(i)(步驟S8)。然後,偵測控制部42係為了反覆進行取決於偵測部41之偵測處理而移至步驟S2。 Then, in step S6, the detecting unit 41 determines that there is no power receiving coil 33 at a position facing the power feeding coil 23(i), and the coil control unit 44 causes the power supply unit 25(i) to stop the power feeding coil 23 (i) Supplying a high frequency voltage (step S7). Next, the detection control unit 42 increases the timer setting value TM(i) by adding, for example, one second to the timer setting value TM(i) (step S8). Then, the detection control unit 42 proceeds to step S2 in order to repeatedly perform the detection processing by the detection unit 41.

藉此,由於偵測部41係以計時器設定值TM(i)之時間間隔反覆進行偵測處理,所以計時器設定值TM(i)係相當於執行間隔之一例。 Thereby, since the detecting unit 41 repeatedly performs the detecting process at the time interval of the timer setting value TM(i), the timer setting value TM(i) corresponds to an example of the execution interval.

另一方面,在步驟S9中,偵測部41判定出在與供電線圈23(i)相對向的位置存在有受電線圈33的情況,線圈選擇部43係選擇供電線圈23(i)作為激磁對象線圈。然後,線圈控制部44係使電源部25(i)將高頻電壓供應至作為激磁對象線圈的供電線圈23(i)(步驟S10)。藉此,非接觸式供電裝置2係能夠以非接觸方式將電力供應至被供電裝置3。 On the other hand, in step S9, the detecting unit 41 determines that the power receiving coil 33 exists at a position facing the power feeding coil 23(i), and the coil selecting unit 43 selects the power feeding coil 23(i) as the exciting object. Coil. Then, the coil control unit 44 causes the power supply unit 25(i) to supply the high-frequency voltage to the power supply coil 23(i) as the excitation target coil (step S10). Thereby, the non-contact power supply device 2 can supply electric power to the power-supplied device 3 in a non-contact manner.

在此情況,偵測控制部42並不使計時器設定值TM(i)之值增大,為了反覆進行取決於偵測部41之偵測處理而會移至步驟S2。 In this case, the detection control unit 42 does not increase the value of the timer setting value TM(i), and moves to step S2 in order to repeat the detection processing by the detecting unit 41.

表1係顯示在第1次至第4次之偵測處理中未被偵測到受電線圈33的情況之例。依據步驟S1至S10,則如表1所示,計時器設定值TM係對應未被偵測到受電線圈33的第1次至第4次之偵測處理而逐次增加1秒。然後,當在第5次之偵測處理中被偵測到受電線圈33時(步驟S5中為「是」,步驟S9),與第5次之偵測處理對應的計時器設定值TM就不增加。 Table 1 shows an example in which the power receiving coil 33 is not detected in the first to fourth detection processes. According to steps S1 to S10, as shown in Table 1, the timer setting value TM is sequentially increased by one second in response to the detection processing of the first to fourth times in which the power receiving coil 33 is not detected. Then, when the power receiving coil 33 is detected in the fifth detection processing (YES in step S5, step S9), the timer setting value TM corresponding to the fifth detection processing is not increase.

如此,藉由步驟S2至S10之處理,偵測控制部42係在藉由偵測部41而偵測到受電線圈33之存在為止,一邊使取決於偵測部41的偵測處理之執行間隔增大一邊使偵測部41反覆進行偵測處理。結果,如表1所示,藉由偵測部41而未偵測到受電線圈33之存在的期間(偵測處理次數第1次至第4次)持續越長,計時器設定值TM(執行間隔)就越為增大。 In this way, the detection control unit 42 causes the execution interval of the detection processing by the detection unit 41 to be detected by the detection unit 41 by the detection of the steps S2 to S10. When the increase is made, the detecting unit 41 repeatedly performs the detecting process. As a result, as shown in Table 1, the period during which the detection unit 41 does not detect the existence of the power receiving coil 33 (the first to fourth detection times) continues to be longer, and the timer setting value TM (execution) The interval is increased.

偵測處理之執行間隔的增大係使偵測處理之執行頻率減少。因而,偵測控制部42係藉由偵測部41而未偵測到受電線圈33之存在的期間持續越長,就使偵測處理之執行 頻率越為減少。 The increase in the execution interval of the detection process reduces the execution frequency of the detection process. Therefore, the detection control unit 42 performs the detection processing by the detection unit 41 not detecting that the period of the existence of the power receiving coil 33 continues for a long period of time. The frequency is reduced.

使用者藉由將被供電裝置3對向配置於非接觸式供電裝置2來進行非接觸式供電的非接觸式供電裝置2(供電線圈23)之使用頻率,係依使用者之情形或非接觸式供電裝置2及被供電裝置3之性質而大為不同。因此,在非接觸式供電裝置2之使用頻率較低的情況和較高的情況,當使偵測處理之執行頻率相等時,就會在非接觸式供電裝置2之使用頻率較低的情況,於受電線圈33未被對向配置於供電線圈23時增大被消耗之白白浪費掉的電力。 The frequency of use of the non-contact power supply device 2 (power supply coil 23) for non-contact power supply by the power supply device 3 facing the non-contact power supply device 2 is based on the user's situation or non-contact. The nature of the power supply device 2 and the power supply device 3 are greatly different. Therefore, in the case where the frequency of use of the non-contact power supply device 2 is low and the case where the frequency of use of the non-contact power supply device 2 is low, when the execution frequency of the detection process is made equal, When the power receiving coil 33 is not disposed opposite to the power feeding coil 23, the power that is consumed is lost.

因此,若依據步驟S2至S10之處理的話,則在藉由偵測部41而未被偵測到受電線圈33之存在的期間長期持續的情況、即考慮取決於使用者的非接觸式供電裝置2之使用頻率較低的情況,偵測處理之執行頻率就會減少。因此,在受電線圈33未被對向配置於供電線圈23的情況較易降低被消耗的電力。即便在供電線圈23為一個的情況亦能獲得同樣的效果。 Therefore, if the processing of steps S2 to S10 is performed, the period in which the presence of the power receiving coil 33 is not detected by the detecting unit 41 continues for a long period of time, that is, the contactless power supply device depending on the user is considered. When the frequency of use 2 is low, the execution frequency of the detection process is reduced. Therefore, it is easier to reduce the consumed electric power when the power receiving coil 33 is not disposed opposite to the power feeding coil 23. The same effect can be obtained even in the case where the power supply coil 23 is one.

又,如圖1所示,在複數個供電線圈23沿著板(table)狀之載置面22而配置成矩陣(matrix)狀的情況,使用者將被供電裝置3載置於載置面22之中央附近的可能性較高。結果,被配置於載置面22之中央附近的供電線圈23、和被配置於載置面22之端部附近的供電線圈23,會在被使用的頻率上發生差異。如此,複數個供電線圈23相互間有在被使用之頻率上發生差異的情況。 Further, as shown in FIG. 1, when a plurality of power feeding coils 23 are arranged in a matrix shape along the table-like mounting surface 22, the user places the power feeding device 3 on the mounting surface. The probability of being near the center of 22 is higher. As a result, the power feeding coil 23 disposed near the center of the mounting surface 22 and the power feeding coil 23 disposed near the end of the mounting surface 22 differ in the frequency to be used. Thus, the plurality of power supply coils 23 may have a difference in frequency between them.

複數個供電線圈23相互間在被使用之頻率上有差異 的情況,當使與各供電線圈23對應的偵測處理之執行頻率等相等時,就會在使用頻率較低的供電線圈23中,於受電線圈33未被對向配置於供電線圈23的情況增大被消耗之白白浪費掉的電力。 The plurality of power supply coils 23 differ in frequency between them In the case where the execution frequencies of the detection processes corresponding to the respective power feeding coils 23 are equal, the power receiving coils 23 having a lower frequency of use are not disposed opposite to the power feeding coils 23 in the power receiving coils 33. Increase the power that is wasted and wasted.

因此,能藉由對應各供電線圈23分別執行步驟S2至S10之處理,來減少與供電線圈23對應的偵測處理之執行頻率,該供電線圈23為藉由偵測部41而未被偵測到受電線圈33之存在的期間長期持續的供電線圈23、即考慮取決於使用者之使用頻率較低的供電線圈23。結果,容易用供電線圈23對應於未被對向配置之受電線圈33的偵測處理來降低被消耗的電力。 Therefore, the execution frequency of the detection processing corresponding to the power supply coil 23 can be reduced by performing the processing of steps S2 to S10 corresponding to the respective power supply coils 23, and the power supply coil 23 is not detected by the detecting unit 41. The power supply coil 23 that continues for a long period of time until the presence of the power receiving coil 33 is considered to be dependent on the power supply coil 23 whose frequency of use is low. As a result, it is easy to reduce the consumed electric power by the power supply coil 23 corresponding to the detection processing of the power receiving coil 33 that is not disposed oppositely.

另外,雖然已顯示控制部4平行執行對應於各供電線圈23的偵測處理之例,但是非接觸式供電裝置2亦可對應各供電線圈23而具備複數個控制部4。 Further, although the control unit 4 has been shown to execute the detection processing corresponding to each of the power feeding coils 23 in parallel, the non-contact power feeding device 2 may include a plurality of control units 4 corresponding to the respective power feeding coils 23.

又,在步驟S8中,雖然已顯示偵測控制部42係使計時器設定值TM(執行間隔)逐次增加1秒之例,但是偵測控制部42增加計時器設定值TM(執行間隔)的態樣並未被限定。偵測控制部42亦可構成為:例如藉由乘上預先被設定之倍率而使計時器設定值TM(執行間隔)增加。 Further, in step S8, although the detection control unit 42 has increased the timer setting value TM (execution interval) by one second, the detection control unit 42 increases the timer setting value TM (execution interval). The situation is not limited. The detection control unit 42 may be configured to increase the timer setting value TM (execution interval) by, for example, multiplying the previously set magnification.

另外,雖然已顯示偵測控制部42係在偵測部41判定出在與供電線圈23(i)相對向的位置存在有受電線圈33之情況(步驟S9),不使計時器設定值TM(i)之值增大而移至步驟S2之例,但是亦可構成為:在偵測部41判定出在與供電線圈23(i)相對向的位置存在有受電線圈33之情況(步 驟S9),偵測控制部42移至步驟S1並設定初始值作為計時器設定值TM(i)。 Further, although the detection control unit 42 has been shown that the detection unit 41 has determined that the power receiving coil 33 is present at a position facing the power feeding coil 23 (i) (step S9), the timer setting value TM is not made ( The value of i) is increased to the example of step S2, but the detection unit 41 may determine that the power receiving coil 33 is present at a position facing the power feeding coil 23(i) (step In step S9), the detection control unit 42 moves to step S1 and sets an initial value as the timer setting value TM(i).

使用者使用非接觸式供電裝置2(供電線圈23)之頻率係有產生變化的情況。因此,在偵測部41判定出在與供電線圈23(i)相對向的位置存在有受電線圈33之情況(步驟S9),偵測控制部42較佳是設定初始值、即計時器設定值TM(執行間隔)之下限值作為計時器設定值TM(i)。亦即,偵測控制部42係在已藉由偵測部41而偵測到受電線圈33之存在的情況,較佳是對預先被設定作為前述執行間隔之下限值的初始值設定前述執行間隔,藉此在將前述執行間隔初始化之後,使偵測部41重新反覆進行偵測處理。藉此,在使用者之使用頻率已增加的情況,可以縮短計時器設定值TM(執行間隔),且使偵測處理之執行頻率增大。 The frequency at which the user uses the non-contact power supply device 2 (the power supply coil 23) is changed. Therefore, when the detecting unit 41 determines that the power receiving coil 33 is present at a position facing the power feeding coil 23 (i) (step S9), the detecting control unit 42 preferably sets the initial value, that is, the timer setting value. The TM (execution interval) lower limit value is used as the timer set value TM(i). In other words, the detection control unit 42 detects that the power receiving coil 33 is detected by the detecting unit 41, and preferably sets the foregoing execution to an initial value that is set as the lower limit of the execution interval in advance. The interval is such that after the execution interval is initialized, the detecting unit 41 repeats the detection processing. Thereby, in the case where the frequency of use of the user has increased, the timer setting value TM (execution interval) can be shortened, and the execution frequency of the detection processing can be increased.

又,偵測控制部42亦可構成為:在預先被設定之次數的偵測處理中,連續判定出在與供電線圈23(i)相對向的位置存在有受電線圈33之情況,偵測控制部42係移至步驟S1,並設定初始值作為計時器設定值TM(i)。亦即,偵測控制部42亦可構成為:在以預先被設定之次數反覆執行偵測處理的期間,已藉由偵測部41連續地偵測到受電線圈33之存在的情況,將前述執行間隔初始化。 Further, the detection control unit 42 may be configured to continuously detect that the power receiving coil 33 is present at a position facing the power feeding coil 23(i) in the detection processing of the number of times set in advance, and to detect the control. The unit 42 moves to step S1 and sets an initial value as the timer setting value TM(i). In other words, the detection control unit 42 may be configured to continuously detect the presence of the power receiving coil 33 by the detecting unit 41 while the detection processing is repeatedly performed for a predetermined number of times. Execution interval initialization.

偵測部41在預先被設定之次數的偵測處理中連續地判定出在與供電線圈23(i)相對向的位置存在有受電線圈33之情況,可以判斷使用者之使用頻率已增加的確實性很高。因而,在以較高之確實性可以判斷使用者之使用頻率 已增加的情況,可以縮短計時器設定值TM(執行間隔),且使偵測處理之執行頻率增大。 The detecting unit 41 continuously determines that the power receiving coil 33 is present at a position facing the power feeding coil 23(i) in the detection process of the number of times set in advance, and can determine that the frequency of use of the user has increased. Very high. Therefore, the user's frequency of use can be judged with higher certainty. In the case of an increase, the timer set value TM (execution interval) can be shortened, and the execution frequency of the detection process is increased.

(第2實施形態) (Second embodiment)

其次,就第2實施形態之非接觸式供電系統1a加以說明。非接觸式供電系統1a係包含非接觸式供電裝置2a及被供電裝置3(圖1)。第2實施形態之非接觸式供電系統1a與第1實施形態之非接觸式供電系統1的不同點係在於非接觸式供電裝置2a之構成。 Next, the non-contact power supply system 1a of the second embodiment will be described. The contactless power supply system 1a includes a contactless power supply device 2a and a power supply device 3 (FIG. 1). The non-contact power supply system 1a of the second embodiment differs from the non-contact power supply system 1 of the first embodiment in the configuration of the contactless power supply device 2a.

圖8係顯示非接觸式供電裝置2a之構成之一例的方塊圖。圖8所示之非接觸式供電裝置2a與圖2所示之非接觸式供電裝置2的不同點係在於控制部4a之構成。第2實施形態之非接觸式供電裝置2a中的控制部4a與第1實施形態之非接觸式供電裝置2中的控制部4之不同點係在於偵測控制部42a之動作以及更進一步具備計數器46。計數器46係與複數個供電線圈23對應而設置有複數個。以下,對應於供電線圈23(i)的計數器46係表示為計數器46(i),且計數器46(i)之計數值CT係表示為計數值CT(i)。 Fig. 8 is a block diagram showing an example of the configuration of the non-contact power supply device 2a. The difference between the non-contact power supply device 2a shown in FIG. 8 and the non-contact power supply device 2 shown in FIG. 2 is the configuration of the control unit 4a. The control unit 4a of the non-contact power supply device 2a of the second embodiment differs from the control unit 4 of the non-contact power supply device 2 of the first embodiment in the operation of the detection control unit 42a and further includes a counter. 46. The counter 46 is provided in plural numbers corresponding to the plurality of power supply coils 23. Hereinafter, the counter 46 corresponding to the power feeding coil 23(i) is denoted as the counter 46(i), and the counter value CT of the counter 46(i) is expressed as the count value CT(i).

由於其他的構成係與圖2所示之非接觸式供電裝置2相同所以省略其說明,以下主要就本實施形態之特徵點加以說明。 Since the other components are the same as those of the non-contact power supply device 2 shown in Fig. 2, the description thereof will be omitted. Hereinafter, the features of the present embodiment will be mainly described.

偵測控制部42a係在偵測部41偵測到受電線圈33之存在為止,使偵測部41反覆進行偵測處理。在反覆進行該偵測處理時,偵測控制部42a係當每次以預先被設定之判定次數Cj次反覆進行在偵測處理中未偵測到受電線圈33 之存在時,就使偵測處理之執行間隔增大。亦即,偵測控制部42a係當藉由前述偵測處理而未偵測到受電線圈33之存在的次數每次到達預先被設定之判定次數時,就使前述執行間隔增大。 The detection control unit 42a causes the detection unit 41 to repeatedly perform the detection process until the detection unit 41 detects the presence of the power receiving coil 33. When the detection processing is repeatedly performed, the detection control unit 42a repeatedly detects that the power receiving coil 33 is not detected in the detection processing every time the number of determinations Cj is set in advance. When it exists, the execution interval of the detection process is increased. In other words, the detection control unit 42a increases the execution interval each time the number of times the power receiving coil 33 is not detected by the detection processing reaches the number of determinations set in advance.

計數器46係計數藉由偵測部41判定出不存在受電線圈33的次數。 The counter 46 counts the number of times the detecting unit 41 determines that the power receiving coil 33 does not exist.

其次,就圖8所示的非接觸式供電裝置2a之動作加以說明。圖9係顯示圖8所示的非接觸式供電裝置2a之動作之一例的流程圖。 Next, the operation of the non-contact power supply device 2a shown in Fig. 8 will be described. Fig. 9 is a flow chart showing an example of the operation of the non-contact power supply device 2a shown in Fig. 8.

在圖9所示之流程圖中,與圖7同樣之處理係附記與圖7相同的步驟編號並省略其說明。亦即,偵測控制部42a係除了步驟S101、S102、S103之各處理以外的其他處理,與偵測控制部42進行同樣動作。 In the flowchart shown in FIG. 9, the same steps as those in FIG. 7 are attached with the same step numbers as in FIG. 7, and the description thereof is omitted. In other words, the detection control unit 42a performs the same operation as the detection control unit 42 except for the processes other than the processes of steps S101, S102, and S103.

首先,偵測控制部42a係在步驟S1的處理之後將計數器46(i)之計數值CT(i)初始化為0,且移至步驟S2之處理(步驟S101)。 First, the detection control unit 42a initializes the count value CT(i) of the counter 46(i) to 0 after the processing of step S1, and proceeds to the processing of step S2 (step S101).

又,偵測控制部42a係在步驟S7的處理之後對計數器46(i)之計數值CT(i)加上1(步驟S102)。藉此,偵測控制部42a係使計數器46(i)計數偵測部41判定出在與供電線圈23(i)相對向的位置不存在受電線圈33之次數。 Further, the detection control unit 42a adds 1 to the count value CT(i) of the counter 46(i) after the processing of step S7 (step S102). Thereby, the detection control unit 42a causes the counter 46(i) to count the detection unit 41 to determine the number of times the power receiving coil 33 does not exist at the position facing the power feeding coil 23(i).

然後,偵測控制部42a係在該步驟S102的處理之後比較計數器46(i)之計數值CT(i)、和判定次數Cj(步驟S103)。然後,在計數值CT(i)、和判定次數Cj相等的情況(步驟S103中為「是」),偵測控制部42a係移至步驟S8之處理 並增大計時器設定值TM(i)。另一方面,在計數值CT(i)未滿判定次數Cj且不相等的情況(步驟S103中為「否」),偵測控制部42a係不增大計數器設定值TM(i)而移至步驟S2之處理,且反覆進行取決於偵測部41之偵測處理。 Then, the detection control unit 42a compares the count value CT(i) of the counter 46(i) with the number of determinations Cj after the processing of the step S102 (step S103). Then, when the count value CT(i) and the number of determinations Cj are equal (YES in step S103), the detection control unit 42a moves to the processing of step S8. And increase the timer setting value TM(i). On the other hand, when the count value CT(i) is less than the number of determinations Cj and is not equal (NO in step S103), the detection control unit 42a moves to the counter set value TM(i) without increasing it. The processing of step S2 is performed in response to the detection processing by the detecting unit 41.

表2係顯示判定次數Cj為2之情況的非接觸式供電裝置2a之動作之一例。 Table 2 shows an example of the operation of the non-contact power supply device 2a in the case where the number of determinations Cj is 2.

以上,若依據步驟S1至S10之各處理及S101至S103之各處理的話,則如表2所示,在第1次之偵測處理中,即便以步驟S6之處理判定出無受電線圈33的情況,由於計數值CT亦未滿判定次數Cj(=2),所以計時器設定值TM不會增大。在第2次之偵測處理中,由於以步驟S6之處理判定出無受電線圈33,且計數值CT與判定次數Cj(=2)相等,所以計時器設定值TM會從1秒增大至2秒。 As described above, according to the respective processes of steps S1 to S10 and the processes of S101 to S103, as shown in Table 2, in the first detection process, even if the process of step S6 is performed, it is determined that there is no power receiving coil 33. In the case, since the count value CT is also less than the number of determinations Cj (= 2), the timer set value TM does not increase. In the second detection processing, since the power receiving coil 33 is determined by the processing of step S6, and the count value CT is equal to the number of determinations Cj (= 2), the timer setting value TM is increased from 1 second to 1 second. 2 seconds.

因而,在每次以判定次數Cj次反覆執行未偵測到受電線圈33之存在時,計時器設定值TM就會被增大。結果, 如表2所示,當藉由偵測部41而未被偵測到受電線圈33之存在的期間(偵測處理次數第1次至第4次)持續越長,計時器設定值TM(執行間隔)就越為增大。 Therefore, the timer set value TM is increased every time the presence of the undetected power receiving coil 33 is repeatedly performed by the number of determinations Cj. result, As shown in Table 2, the period during which the presence of the power receiving coil 33 is not detected by the detecting unit 41 (the first to fourth times of the number of detection processes) continues to be longer, and the timer setting value TM (execution) The interval is increased.

偵測處理之執行間隔的增大係使偵測處理之執行頻率減少。因而,偵測控制部42a係當藉由偵測部41而未被偵測到受電線圈33之存在的期間持續越長,就會使偵測處理之執行頻率越為減少。藉此,非接觸式供電裝置2a係能獲得與非接觸式供電裝置2同樣的效果。 The increase in the execution interval of the detection process reduces the execution frequency of the detection process. Therefore, when the detection control unit 42a continues to detect that the period in which the power receiving coil 33 is not present by the detecting unit 41, the execution frequency of the detection processing is reduced. Thereby, the contactless power supply device 2a can obtain the same effect as the non-contact power supply device 2.

又,即便使用者之使用頻率較高的情況,亦很少有使用者長期間不使用非接觸式供電裝置2a(供電線圈23(i))的情況。在如此之情況,當每次偵測部41未偵測到受電線圈33,而使計時器設定值TM(i)(執行間隔)增大時,就無論使用者之使用頻率是否較高,偵測處理之執行頻率都會變低。當偵測處理之執行頻率變低時,使用者將受電線圈33對向配置於供電線圈23(i)之後直至開始供電為止的響應時間就會延遲。此若以確保對於使用頻率高之使用者的便利性觀點來看並不佳。 Further, even when the user's use frequency is high, there are few cases where the user does not use the non-contact power supply device 2a (the power supply coil 23(i)) for a long period of time. In such a case, each time the detecting unit 41 does not detect the power receiving coil 33 and increases the timer setting value TM(i) (execution interval), regardless of whether the user's frequency of use is high or not, the detection is high. The execution frequency of the measurement process will become lower. When the execution frequency of the detection processing is low, the response time after the user has placed the power receiving coil 33 facing the power feeding coil 23 (i) until the power supply is started is delayed. This is not good in terms of ensuring the convenience of users who use it frequently.

另一方面,若依據步驟S102、S103之各處理的話,則在以複數次反覆進行偵測部41未偵測到受電線圈33的情況,才會使得計時器設定值TM(i)(執行間隔)增大。因此,即便使用頻率高之使用者很少長時間不使用非接觸式供電裝置2a(供電線圈23(i))的情況,亦能抑制計時器設定值TM(i)(執行間隔)之增大。 On the other hand, if the processing of the power receiving coils 33 is not detected by the detecting unit 41 in a plurality of times in accordance with the processing of the steps S102 and S103, the timer setting value TM(i) (execution interval) is caused. ) increase. Therefore, even if the user with a high frequency of use does not use the non-contact power supply device 2a (the power supply coil 23(i)) for a long time, the increase of the timer setting value TM(i) (execution interval) can be suppressed. .

另外,雖然已例示判定次數Cj為2的情況,但是判定 次數Cj例如可為10,亦可為100,數值並未被限定。又,在上述中,雖然已顯示判定次數Cj為固定值之例,但是判定次數Cj亦可做變化。例如,亦可在計數值CT每次與判定次數Cj相等時,就增加判定次數Cj。 In addition, although the case where the number of determination times Cj is 2 has been exemplified, it is determined. The number of times Cj can be, for example, 10 or 100, and the numerical value is not limited. Further, in the above, although the example in which the number of determinations Cj is a fixed value has been shown, the number of determinations Cj may be changed. For example, the number of determinations Cj may be increased each time the count value CT is equal to the number of determinations Cj.

(第3實施形態) (Third embodiment)

其次,就第3實施形態之非接觸式供電系統1b加以說明。非接觸式供電系統1b係包含非接觸式供電裝置2b及被供電裝置3(圖1)。第3實施形態之非接觸式供電系統1b與第1實施形態之非接觸式供電系統1的不同點係在於非接觸式供電裝置2b之構成。 Next, the non-contact power supply system 1b of the third embodiment will be described. The contactless power supply system 1b includes a contactless power supply device 2b and a power supply device 3 (FIG. 1). The non-contact power supply system 1b of the third embodiment differs from the non-contact power supply system 1 of the first embodiment in the configuration of the contactless power supply device 2b.

圖10係顯示非接觸式供電裝置2b之構成之一例的方塊圖。圖10所示之非接觸式供電裝置2b與圖2所示之非接觸式供電裝置2的不同點係在於控制部4b之構成。第3實施形態之控制部4b與第1實施形態之非接觸式供電裝置2中的控制部4之不同點係在於偵測控制部42b之構成及動作,而且更進一步具備記憶部47。 Fig. 10 is a block diagram showing an example of the configuration of the non-contact power supply device 2b. The difference between the non-contact power supply device 2b shown in FIG. 10 and the non-contact power supply device 2 shown in FIG. 2 is the configuration of the control unit 4b. The control unit 4b of the third embodiment differs from the control unit 4 of the non-contact power supply device 2 of the first embodiment in the configuration and operation of the detection control unit 42b, and further includes a storage unit 47.

由於其他的構成係與圖2所示之非接觸式供電裝置2相同所以省略其說明,以下主要就本實施形態之特徵點加以說明。 Since the other components are the same as those of the non-contact power supply device 2 shown in Fig. 2, the description thereof will be omitted. Hereinafter, the features of the present embodiment will be mainly described.

偵測控制部42b係包含檢測頻率取得部421及執行頻率調節部422。檢測頻率取得部421係基於在偵測處理中偵測部41是否已偵測到受電線圈33(基於偵測部41的受電線圈33之存在的有無),而取得偵測部41已偵測到受電線圈33之頻率作為偵測頻率值。執行頻率調節部422係當 偵測頻率越少就使偵測處理之執行頻率越為減少。 The detection control unit 42b includes a detection frequency acquisition unit 421 and an execution frequency adjustment unit 422. The detection frequency acquisition unit 421 is based on whether or not the detection unit 41 has detected the power receiving coil 33 (based on the presence or absence of the power receiving coil 33 of the detecting unit 41) during the detection processing, and the acquisition detecting unit 41 has detected The frequency of the power receiving coil 33 is used as the detection frequency value. Execution frequency adjustment unit 422 is The less the detection frequency, the more the detection processing execution frequency is reduced.

記憶部47係記憶藉由檢測頻率取得部421所取得的偵測頻率值。記憶部47係例如為EEPROM(Electrically Erasable and Programmable Read Only Memory:可電性抹除可編程唯讀記憶體)或FeRAM(Ferroelectric Random Access Memory:鐵電隨機存取記憶體)等之非揮發性的記憶元件。 The memory unit 47 stores the detected frequency value obtained by the detection frequency acquisition unit 421. The memory unit 47 is, for example, non-volatile such as an EEPROM (Electrically Erasable and Programmable Read Only Memory) or a FeRAM (Ferroelectric Random Access Memory). Memory component.

其次,就圖10所示的非接觸供電裝置2b之動作加以說明。圖11及圖12係顯示非接觸式供電裝置2b之動作之一例的流程圖。在圖11及圖12所示之流程圖中,與圖7同樣的處理係附記與圖7相同的步驟編號並省略其說明。亦即,偵測控制部42b係除了步驟S201至S204、S211至S215之各處理以外的其他處理,與偵測控制部42進行同樣動作。 Next, the operation of the contactless power supply device 2b shown in Fig. 10 will be described. 11 and 12 are flowcharts showing an example of the operation of the non-contact power supply device 2b. In the flowcharts shown in FIG. 11 and FIG. 12, the same steps as those in FIG. 7 are attached with the same step numbers as in FIG. 7, and the description thereof is omitted. In other words, the detection control unit 42b performs the same operations as the detection control unit 42 except for the processes other than the processes of steps S201 to S204 and S211 to S215.

在圖11所示之步驟S1至S7、S9、S10、S201至S204中,首先在預先被設定之基準時間ts的期間執行頻率計數值Cf(i)之計數。在執行頻率計數值Cf(i)之計數的期間中,計時器設定值TM(i)係被設為固定值(例如1秒)。頻率計數值Cf(i)係在基準時間ts之期間偵測部41判定出在與供電線圈23(i)相對向的位置存在有受電線圈33之次數。亦即,頻率計數值Cf(i)為表示偵測部41在與供電線圈23(i)相對向的位置已偵測到受電線圈33的檢測頻率之資訊之一例。 In steps S1 to S7, S9, S10, and S201 to S204 shown in FIG. 11, the counting of the frequency count value Cf(i) is first performed during the reference time ts which is set in advance. The timer set value TM(i) is set to a fixed value (for example, 1 second) during the period in which the counting of the frequency count value Cf(i) is performed. The frequency count value Cf(i) is the number of times the detection unit 41 determines that the power receiving coil 33 is present at a position facing the power feeding coil 23(i) during the reference time ts. In other words, the frequency count value Cf(i) is an example of information indicating that the detection unit 41 has detected the detection frequency of the power receiving coil 33 at a position facing the power feeding coil 23(i).

基準時間ts為取得檢測頻率的處理之執行時間,例如可採用1天、或是1個月等之時間。 The reference time ts is the execution time of the process of obtaining the detection frequency, and for example, one day, or one month may be used.

檢測頻率取得部421係在步驟S1的處理之後將頻率計數值Cf(i)初始化為0(步驟S201)。其次,檢測頻率取得部421係藉由使用例如軟體計時器而開始經過時間tw之計時(步驟S202)。該經過時間tw為開始頻率取得處理之後所經過的時間。 The detection frequency acquisition unit 421 initializes the frequency count value Cf(i) to 0 after the processing of step S1 (step S201). Next, the detection frequency acquisition unit 421 starts counting the elapsed time tw by using, for example, a software timer (step S202). The elapsed time tw is the elapsed time after the start of the frequency acquisition process.

以下,由於步驟S2至S10之處理係與從圖7中移除步驟S8之處理後的情況同樣所以省略其說明。 Hereinafter, since the processing of steps S2 to S10 is the same as the processing after the processing of step S8 is removed from FIG. 7, the description thereof will be omitted.

檢測頻率取得部421係在與供電線圈23(i)相對向的位置沒有受電線圈33之情況(步驟S6),在步驟S7的處理之後,比較經過時間tw和基準時間ts(步驟S204)。然後,在經過時間tw為基準時間ts以下的情況(步驟S204中為「否」),檢測頻率取得部421係為了在將計時器設定值TM(i)固定為初始值之狀態下直接反覆進行偵測處理而移至步驟S2。 The detection frequency acquisition unit 421 does not have the power receiving coil 33 at a position facing the power feeding coil 23 (i) (step S6), and after the processing of step S7, compares the elapsed time tw with the reference time ts (step S204). Then, when the elapsed time tw is equal to or less than the reference time ts (NO in step S204), the detection frequency acquisition unit 421 directly repeats the state in which the timer setting value TM(i) is fixed to the initial value. The detection process proceeds to step S2.

另一方面,檢測頻率取得部421係在與供電線圈23(i)相對向的位置有受電線圈33之情況(步驟S9),在步驟S10的處理之後,對頻率計數值Cf(i)加上1(步驟S203),且移至步驟S204之處理。然後,檢測頻率取得部421係如上述般地比較經過時間tw和基準時間ts(步驟S204),且在經過時間tw為基準時間ts以下的情況(步驟S204中為「否」),檢測頻率取得部421係為了在將計時器設定值TM(i)固定為初始值之狀態下直接反覆進行偵測處理而移至步驟S2。 On the other hand, the detection frequency acquisition unit 421 has the power receiving coil 33 at a position facing the power feeding coil 23 (i) (step S9), and after the processing of step S10, adds the frequency count value Cf(i). 1 (step S203), and the process proceeds to step S204. Then, the detection frequency acquisition unit 421 compares the elapsed time tw with the reference time ts as described above (step S204), and when the elapsed time tw is equal to or less than the reference time ts (NO in step S204), the detection frequency acquisition is performed. The unit 421 directly performs the detection processing in a state where the timer setting value TM(i) is fixed to the initial value, and moves to step S2.

然後,在步驟S204中,當經過時間tw超過基準時間 ts的情況(步驟S204中為「是」),檢測頻率取得部421係使當時的頻率計數值Cf(i)記憶於記憶部47作為表示偵測頻率的資訊,且移至步驟S211之處理。 Then, in step S204, when the elapsed time tw exceeds the reference time In the case of ts (YES in step S204), the detection frequency acquisition unit 421 stores the current frequency count value Cf(i) in the memory unit 47 as information indicating the detection frequency, and proceeds to the process of step S211.

其次,在步驟S211至S215之各處理中,執行頻率調節部422係基於被記憶於記憶部47的頻率計數值Cf(i)、和預先被設定的頻率基準值Ref1、Ref2,而設定計時器設定值TM(i)。頻率基準值Ref1係被設定為比頻率基準值Ref2還更為小的值。 Next, in each of the processes of steps S211 to S215, the execution frequency adjustment unit 422 sets the timer based on the frequency count value Cf(i) stored in the storage unit 47 and the frequency reference values Ref1 and Ref2 set in advance. Set value TM(i). The frequency reference value Ref1 is set to a value smaller than the frequency reference value Ref2.

首先,在步驟S211之處理中,執行頻率調節部422係比較頻率計數值Cf(i)和頻率基準值Ref1。比較之結果,在頻率計數值Cf(i)為頻率基準值Ref1以下的情況(步驟S211中為「否」),執行頻率調節部422係判定偵測頻率較低,且設定例如10秒作為計時器設定值TM(i)(步驟S212)。之後,執行頻率調節部422係移至步驟S2之處理。 First, in the processing of step S211, the execution frequency adjustment unit 422 compares the frequency count value Cf(i) with the frequency reference value Ref1. As a result of the comparison, when the frequency count value Cf(i) is equal to or lower than the frequency reference value Ref1 (NO in step S211), the execution frequency adjustment unit 422 determines that the detection frequency is low, and sets, for example, 10 seconds as the timing. The set value TM(i) is set (step S212). Thereafter, the execution frequency adjustment unit 422 shifts to the processing of step S2.

另一方面,在頻率計數值Cf(i)超過頻率基準值Ref1的情況(步驟S211中為「是」),執行頻率調節部422係比較頻率計數值Cf(i)和頻率基準值Ref2。比較之結果,在頻率計數值Cf(i)為頻率基準值Ref2以下的情況、即頻率計數值Cf(i)超過頻率基準值Ref1且為頻率基準值Ref2以下的情況(步驟S213中為「否」),執行頻率調節部422係判定偵測頻率為中程度,且設定例如5秒作為計時器設定值TM(i)(步驟S214)。之後,執行頻率調節部422係移至步驟S2之處理。 On the other hand, when the frequency count value Cf(i) exceeds the frequency reference value Ref1 (YES in step S211), the execution frequency adjustment unit 422 compares the frequency count value Cf(i) with the frequency reference value Ref2. As a result of the comparison, when the frequency count value Cf(i) is equal to or less than the frequency reference value Ref2, that is, the frequency count value Cf(i) exceeds the frequency reference value Ref1 and is equal to or lower than the frequency reference value Ref2 (NO in step S213) The execution frequency adjustment unit 422 determines that the detection frequency is moderate, and sets, for example, 5 seconds as the timer setting value TM(i) (step S214). Thereafter, the execution frequency adjustment unit 422 shifts to the processing of step S2.

處理S213之比較的結果,在頻率計數值Cf(i)超過頻 率基準值Ref2的情況、即頻率計數值Cf(i)超過頻率基準值Ref1且超過頻率基準值Ref2的情況(步驟S213中為「是」),執行頻率調節部422係判定偵測頻率為較高,且設定例如1秒作為計時器設定值TM(i)(步驟S215)。之後,執行頻率調節部422係移至步驟S2之處理。 Processing the result of the comparison of S213, the frequency count value Cf(i) exceeds the frequency When the rate reference value Ref2 is exceeded, that is, when the frequency count value Cf(i) exceeds the frequency reference value Ref1 and exceeds the frequency reference value Ref2 (YES in step S213), the execution frequency adjustment unit 422 determines that the detection frequency is higher. It is high, and, for example, 1 second is set as the timer setting value TM(i) (step S215). Thereafter, the execution frequency adjustment unit 422 shifts to the processing of step S2.

以上,藉由步驟S211至S215之處理,執行頻率調節部422係當偵測頻率越少則越加大計時器設定值TM(i)。亦即,執行頻率調節部422係當偵測頻率越少則使偵測處理之執行頻率越為減少。 As described above, by the processing of steps S211 to S215, the execution frequency adjustment unit 422 increases the timer setting value TM(i) as the detection frequency is smaller. That is, the execution frequency adjustment unit 422 reduces the execution frequency of the detection processing as the detection frequency is smaller.

以下,藉由步驟S2至S7、S9、S10之各處理,並基於執行頻率調節部422所設定的計時器設定部TM(i)而反覆進行偵測處理。 Hereinafter, the detection processing is repeatedly performed based on the timer setting unit TM(i) set by the execution frequency adjustment unit 422 by the respective processes of steps S2 to S7, S9, and S10.

以上,若依據圖11及圖12所示之處理,則與圖2所示之非接觸式供電裝置2同樣,在取決於使用者的非接觸式供電裝置2之使用頻率較低的情況,減少偵測處理之執行頻率。因此,容易在受電線圈33未被對向配置於供電線圈23的情況降低被消耗的電力。即便是供電線圈23為一個的情況亦能獲得同樣的效果。 As described above, according to the processing shown in FIG. 11 and FIG. 12, similarly to the non-contact power supply device 2 shown in FIG. 2, the frequency of use of the non-contact power supply device 2 depending on the user is reduced. The execution frequency of the detection process. Therefore, it is easy to reduce the consumed electric power when the power receiving coil 33 is not disposed opposite to the power feeding coil 23. The same effect can be obtained even in the case where the power supply coil 23 is one.

又,如圖1所示,在複數個供電線圈23沿著板狀之載置面22而配置成矩陣狀的情況,與圖2所示之非接觸式供電裝置2同樣,可以減少與取決於使用者的使用頻率較低之供電線圈23對應的偵測處理之執行頻率。結果,容易用供電線圈23對應於未被對向配置之受電線圈33的偵測處理來降低被消耗的電力。 Further, as shown in FIG. 1, in the case where a plurality of power feeding coils 23 are arranged in a matrix along the plate-shaped mounting surface 22, similarly to the non-contact power feeding device 2 shown in FIG. 2, it is possible to reduce and depend on The execution frequency of the detection processing corresponding to the power supply coil 23 of the user whose frequency of use is low. As a result, it is easy to reduce the consumed electric power by the power supply coil 23 corresponding to the detection processing of the power receiving coil 33 that is not disposed oppositely.

本說明書雖然如上述般地已揭示各種態樣的技術,但是其中主要的技術將歸納以下。 Although the present specification has disclosed various aspects of the technology as described above, the main techniques thereof will be summarized below.

一態樣之非接觸式供電裝置,係藉由電磁感應現象將電力供應至成為供電對象之受電線圈者,其具備:供電線圈,其係能夠對向配置前述受電線圈;偵測部,其係反覆執行用以偵測與前述供電線圈相對向的位置中的前述受電線圈之存在的偵測處理;以及偵測控制部,其係基於是否已藉由前述偵測部而偵測到前述受電線圈之存在,來調節前述偵測部執行前述偵測處理之執行頻率。又,另一態樣之非接觸式供電裝置,係具備:供電線圈,其係用以藉由電磁感應現象而供電至受電線圈;偵測部,其係反覆執行在與前述供電線圈相對向的位置偵測有無前述受電線圈之存在的偵測處理;以及偵測控制部,其係基於前述偵測部所偵測的前述受電線圈之存在的有無,來調節藉由前述偵測部而反覆執行的前述偵測處理之執行頻率。 A non-contact power supply device that supplies power to a power receiving coil that is a power supply target by an electromagnetic induction phenomenon, and includes: a power supply coil that is capable of arranging the power receiving coil in a facing direction; and a detecting unit And a detection process for detecting the presence of the power receiving coil in a position opposite to the power supply coil; and a detection control unit that detects whether the power receiving coil is detected by the detecting unit The presence of the detection unit performs the aforementioned execution frequency of the detection process. In addition, another aspect of the non-contact power supply device includes: a power supply coil for supplying power to the power receiving coil by electromagnetic induction; and a detecting portion that is repeatedly disposed opposite to the power supply coil Detecting whether the position detection detects the presence or absence of the power receiving coil; and detecting a control unit that is repeatedly executed by the detecting unit based on the presence or absence of the power receiving coil detected by the detecting unit The execution frequency of the aforementioned detection processing.

如此之非接觸式供電裝置,係基於偵測部的受電線圈之存在的有無而可以調節偵測部執行偵測處理之執行頻率。因而,如此之非接觸式供電裝置,係容易在受電線圈未被對向配置於供電線圈之情況降低被消耗的電力。 In such a non-contact power supply device, the execution frequency of the detection processing performed by the detecting unit can be adjusted based on the presence or absence of the power receiving coil of the detecting unit. Therefore, in such a non-contact power supply device, it is easy to reduce the consumed electric power when the power receiving coil is not disposed opposite to the power feeding coil.

在另一態樣中,於上述之非接觸式供電裝置中,前述偵測控制部係當藉由前述偵測部而未偵測到前述受電線圈之存在的期間持續越長就使前述執行頻率越為減少。 In another aspect, in the non-contact power supply device, the detection control unit causes the execution frequency to be longer when the period in which the power receiving coil is not detected by the detecting unit continues to be longer. The more it is reduced.

如此之非接觸式供電裝置,係在考慮藉由偵測部而未被偵測到受電線圈之存在的期間長期持續、即受電線圈被 對向配置於供電線圈的頻率較低的情況,減少偵測處理之執行頻率。結果,如此之非接觸式供電裝置,係容易在受電線圈未被對向配置於供電線圈之情況降低被消耗的電力。 In such a non-contact power supply device, it is considered that the period in which the power receiving coil is not detected by the detecting unit continues for a long period of time, that is, the power receiving coil is When the frequency of the opposite arrangement to the power supply coil is low, the execution frequency of the detection processing is reduced. As a result, in such a non-contact power supply device, it is easy to reduce the consumed electric power when the power receiving coil is not disposed opposite to the power feeding coil.

另一態樣,於上述之非接觸式供電裝置中,前述偵測控制部係在藉由前述偵測部而偵測到前述受電線圈之存在為止,一邊使前述偵測處理之執行間隔增大一邊使前述偵測部反覆進行前述偵測處理。 In another aspect of the invention, in the non-contact power supply device, the detection control unit increases the execution interval of the detection processing while detecting the presence of the power receiving coil by the detecting unit. The detection unit is repeatedly subjected to the detection processing described above.

如此之非接觸式供電裝置,係當偵測部未偵測到受電線圈之存在的期間持續越長,偵測處理之執行間隔就越為增大。當偵測處理之執行間隔增大時,偵測處理之執行頻率就會減少。因而,如此之非接觸式供電裝置,係在考慮藉由偵測部而未被偵測到受電線圈之存在的期間長期持續、即受電線圈被對向配置於供電線圈的頻率較低的情況,減少偵測處理之執行頻率。結果,如此之非接觸式供電裝置,係容易在受電線圈未被對向配置於供電線圈之情況降低被消耗的電力。 In such a non-contact power supply device, the longer the duration during which the detection unit does not detect the presence of the power receiving coil, the more the execution interval of the detection process increases. When the execution interval of the detection process is increased, the execution frequency of the detection process is reduced. Therefore, in such a non-contact power supply device, it is considered that the period in which the power receiving coil is not detected by the detecting unit continues for a long period of time, that is, the frequency at which the power receiving coil is opposed to the power feeding coil is low. Reduce the execution frequency of detection processing. As a result, in such a non-contact power supply device, it is easy to reduce the consumed electric power when the power receiving coil is not disposed opposite to the power feeding coil.

另一態樣,於上述之非接觸式供電裝置中,前述偵測控制部係每次以預先被設定之判定次數反覆進行在前述偵測處理中未偵測到前述受電線圈之存在時,執行使前述執行間隔增大之處理。亦即,前述偵測控制部係當藉由前述偵測處理而在未偵測到前述受電線圈之存在的次數每次到達預先被設定的判定次數時,就使前述執行間隔增大。 In another aspect of the invention, in the non-contact power supply device, the detection control unit performs the detection of the presence of the power receiving coil in the detection process by repeating the number of determinations set in advance. The process of increasing the aforementioned execution interval. In other words, the detection control unit increases the execution interval when the number of times the presence of the power receiving coil is not detected reaches the predetermined number of determinations by the detection processing.

如此之非接觸式供電裝置,係只要不以預先被設定之 判定次數反覆進行在偵測處理中未偵測到前述受電線圈之存在,就不執行使執行間隔增大之處理。因而,如此之非接觸式供電裝置,係在例如非接觸式供電裝置之使用頻率較高的使用者很少不使用非接觸式供電裝置(未將受電線圈對向配置於供電線圈)的情況,能降低執行間隔被增大之虞。 Such a non-contact power supply device is not required to be set in advance. When the number of determinations is repeated and the presence of the aforementioned power receiving coil is not detected in the detection processing, the processing for increasing the execution interval is not performed. Therefore, in such a non-contact power supply device, for example, a user who uses a non-contact power supply device with a high frequency of use does not use a non-contact power supply device (the power receiving coil is not disposed opposite to the power supply coil). It can reduce the increase in the execution interval.

另一態樣,於上述之非接觸式供電裝置中,前述偵測控制部係在已藉由前述偵測部而偵測到前述受電線圈之存在的情況,對預先被設定作為前述執行間隔之下限值的初始值設定前述執行間隔,藉此在將前述執行間隔初始化之後,重新使前述偵測部反覆進行前述偵測處理。 In another aspect, in the non-contact power supply device, the detection control unit detects that the presence of the power receiving coil is detected by the detecting unit, and is set in advance as the execution interval. The initial value of the lower limit value sets the execution interval, and after the initialization interval is initialized, the detection unit is again caused to perform the detection processing in reverse.

如此之非接觸式供電裝置,係在藉由偵測部而未偵測到受電線圈之存在的情況,使得執行間隔回到初始值,且直到再次偵測到受電線圈之存在為止,一邊使偵測處理之執行間隔增大一邊反覆進行取決於偵測部之偵測處理。因而,如此之非接觸式供電裝置,係在使用者之使用頻率增加的情況,能夠縮短執行間隔並使偵測處理之執行頻率增大。 In such a non-contact power supply device, the presence of the power receiving coil is not detected by the detecting portion, so that the execution interval returns to the initial value, and until the existence of the power receiving coil is detected again, the detection is performed. The execution interval of the measurement process is increased while the detection process is repeated depending on the detection process of the detection unit. Therefore, in such a non-contact power supply device, when the frequency of use of the user increases, the execution interval can be shortened and the execution frequency of the detection process can be increased.

另一態樣,於上述之非接觸式供電裝置中,前述偵測控制部係在預先被設定之次數的前述偵測處理中,連續藉由前述偵測部而偵測到前述受電線圈之存在的情況,被初始化。亦即,前述偵測控制部係在以預先被設定之次數反覆執行前述偵測處理的期間,在已藉由前述偵測部連續偵測到前述受電線圈之存在的情況時,將前述執行間隔初始 化。 In another aspect, in the non-contact power supply device, the detection control unit continuously detects the presence of the power receiving coil by the detecting unit in the detecting process of the preset number of times The situation is initialized. In other words, the detection control unit sets the execution interval when the detection unit continuously detects the presence of the power receiving coil while the detection processing is repeatedly performed for a predetermined number of times. initial Chemical.

在預先被設定之次數的偵測處理中,連續在與供電線圈相對向的位置偵測到受電線圈之存在的情況,可以判斷使用者之使用頻率已增加的確實性較高。因而,如此之非接觸式供電裝置,係在能以較高之確實性判斷使用者之使用頻率已增加的情況,可以初始化並縮短執行間隔,且使偵測處理之執行頻率增大。 In the detection processing of the number of times set in advance, the presence of the power receiving coil is continuously detected at a position facing the power feeding coil, and it is possible to determine that the user's use frequency has increased with high certainty. Therefore, in such a non-contact power supply device, it is possible to judge that the frequency of use of the user has increased with a high degree of certainty, and it is possible to initialize and shorten the execution interval and increase the execution frequency of the detection process.

另一態樣,於上述之非接觸式供電裝置中,前述偵測控制部係包含:檢測頻率取得部,其係基於前述偵測部所偵測的前述受電線圈之存在的有無而取得前述偵測部已偵測到前述受電線圈之存在的頻率作為偵測頻率;以及執行頻率調節部,其係當前述偵測頻率越少就使前述執行頻率越為減少。 In another aspect, in the non-contact power supply device, the detection control unit includes: a detection frequency acquisition unit that acquires the Detector based on the presence or absence of the power receiving coil detected by the detection unit The measuring unit has detected the frequency of the presence of the power receiving coil as the detecting frequency; and executes the frequency adjusting unit, which reduces the aforementioned execution frequency as the detecting frequency is less.

如此之非接觸式供電裝置,係能藉由檢測頻率取得部而取得偵測部已偵測到受電線圈之存在的頻率、即使用者之使用頻率作為偵測頻率。然後,藉由執行頻率調節部,當偵測頻率越少、即使用者之使用頻率越少就越能減少偵測處理之執行頻率。因而,如此之非接觸式供電裝置,係容易在受電線圈未被對向配置於供電線圈之情況降低被消耗的電力。 In such a non-contact power supply device, the frequency at which the detecting unit has detected the presence of the power receiving coil, that is, the frequency of use of the user, can be obtained as the detection frequency by detecting the frequency obtaining unit. Then, by executing the frequency adjustment unit, the smaller the detection frequency, that is, the less the user's use frequency, the more the detection processing frequency can be reduced. Therefore, in such a non-contact power supply device, it is easy to reduce the consumed electric power when the power receiving coil is not disposed opposite to the power feeding coil.

另一態樣,於上述之非接觸式供電裝置中,前述供電線圈係具備複數個線圈,前述偵測部係對前述複數個線圈之各個線圈執行前述偵測處理,前述偵測控制部係分別調節與各前述線圈對應的各偵測處理之執行頻率。 In another aspect, in the non-contact power supply device, the power supply coil includes a plurality of coils, and the detecting unit performs the detection processing on each of the plurality of coils, and the detection control unit is respectively The execution frequency of each detection process corresponding to each of the aforementioned coils is adjusted.

如此之非接觸式供電裝置,係即便複數個線圈彼此間在被使用的頻率上有差異之情況,亦能對應各線圈而分別調節偵測處理之執行頻率。結果,如此之非接觸式供電裝置,係容易在受電線圈對應於未被對向配置之線圈的偵測處理中,降低被消耗的電力。 In such a non-contact power supply device, even if a plurality of coils differ in the frequency of use, the execution frequency of the detection processing can be individually adjusted for each coil. As a result, in such a non-contact power supply device, it is easy to reduce the consumed electric power in the detection process of the power receiving coil corresponding to the coil that is not disposed oppositely.

又,另一態樣之非接觸式供電系統,係具備:上述之其中一個非接觸式供電裝置;以及具備有前述受電線圈的被供電裝置。 Further, another aspect of the non-contact power supply system includes: one of the above-described non-contact power supply devices; and a power supply device including the power receiving coil.

如此之非接觸式供電系統,係容易在受電線圈未被對向配置於供電線圈之情況降低被消耗的電力。 In such a non-contact power supply system, it is easy to reduce the consumed electric power when the power receiving coil is not disposed opposite to the power feeding coil.

本申請案係以2012年6月1日於日本提出發明專利申請的特願2012-125947為基礎者,其內容係包含於本案中。 This application is based on Japanese Patent Application No. 2012-125947, filed on Jan. 1, 2012 in Japan, the content of which is incorporated herein.

為了表現本發明,雖然在上述中已一邊參照圖式一邊通過實施形態適切且充分地說明本發明,但是應明白只要是本發明所屬技術領域中具有通常知識者自能輕易變更及/或改良上述之實施形態。因而,可解釋為本發明所屬技術領域中具有通常知識者所實施的變更形態或改良形態,只要非為脫離申請專利範圍中所記載之請求項所請權利範圍之程度,則該變更形態或該改良形態仍為該請求項之所請權利範圍所涵蓋。 In the above, the present invention has been described with sufficient reference to the drawings, and the present invention will be described with reference to the drawings. However, it should be understood that those skilled in the art of the present invention can easily change and/or improve the above. The embodiment. Therefore, it is to be understood that the modifications and improvements may be made by those of ordinary skill in the art to which the invention pertains. The modified form is still covered by the claimed scope of the claim.

(產業上之可利用性) (industrial availability)

依據本發明,則可以提供一種非接觸式供電系統、非接觸式供電裝置及被供電裝置。 According to the present invention, a contactless power supply system, a contactless power supply device, and a powered device can be provided.

1、1a、1b‧‧‧非接觸式供電系統 1, 1a, 1b‧‧‧ contactless power supply system

2、2a、2b‧‧‧非接觸式供電裝置 2, 2a, 2b‧‧‧ contactless power supply

3‧‧‧被供電裝置 3‧‧‧Powered devices

21、31‧‧‧框體 21, 31‧‧‧ frame

22‧‧‧載置面(第1對向面) 22‧‧‧Loading surface (1st opposite)

23‧‧‧供電線圈 23‧‧‧Power supply coil

32‧‧‧被載置面(第2對向面) 32‧‧‧Loaded surface (2nd opposite)

33‧‧‧受電線圈 33‧‧‧Acoustic coil

Claims (9)

一種非接觸式供電裝置,其特徵為具備:供電線圈,其係用以藉由電磁感應現象而供電至受電線圈;偵測部,其係反覆執行在與前述供電線圈相對向的位置偵測有無前述受電線圈之存在的偵測處理;以及偵測控制部,其係基於前述偵測部所偵測的前述受電線圈之存在的有無,來調節藉由前述偵測部而反覆執行的前述偵測處理之執行頻率。 A non-contact power supply device characterized by comprising: a power supply coil for supplying power to a power receiving coil by electromagnetic induction; and a detecting portion for repeatedly detecting whether a position opposite to the power feeding coil is detected The detection processing of the presence of the power receiving coil; and the detection control unit adjusts the detection performed by the detecting unit based on the presence or absence of the power receiving coil detected by the detecting unit The frequency of execution of the process. 如請求項1所記載之非接觸式供電裝置,其中前述偵測控制部係當藉由前述偵測部而未偵測到前述受電線圈之存在的期間持續越長就使前述執行頻率越為減少。 The non-contact power supply device according to claim 1, wherein the detection control unit reduces the execution frequency as the period during which the detection unit does not detect the existence of the power receiving coil continues to be longer. . 如請求項2所記載之非接觸式供電裝置,其中前述偵測控制部係在藉由前述偵測部而偵測到前述受電線圈之存在為止,一邊使前述偵測處理之執行間隔增大一邊使前述偵測部反覆進行前述偵測處理。 The non-contact power supply device according to claim 2, wherein the detection control unit increases the execution interval of the detection processing while detecting the presence of the power receiving coil by the detecting unit The detecting unit is repeatedly caused to perform the detecting process. 如請求項3所記載之非接觸式供電裝置,其中前述偵測控制部係當藉由前述偵測處理而在未偵測到前述受電線圈之存在的次數每次到達預先被設定的判定次數時,就使前述執行間隔增大。 The non-contact power supply device of claim 3, wherein the detection control unit is configured to detect, when the number of times the power receiving coil is not detected, reaches a predetermined number of determinations each time , the aforementioned execution interval is increased. 如請求項3所記載之非接觸式供電裝置,其中前述偵測控制部係在已藉由前述偵測部偵測到前述受電線圈之存在的情況,對預先被設定作為前述執行間隔之下 限值的初始值設定前述執行間隔,藉此在將前述執行間隔初始化之後,重新使前述偵測部反覆進行前述偵測處理。 The non-contact power supply device of claim 3, wherein the detection control unit is configured to detect the presence of the power receiving coil by the detecting unit, and the pair is set in advance as the execution interval. The initial value of the limit value sets the execution interval, and after the initialization interval is initialized, the detection unit is again caused to perform the detection processing in reverse. 如請求項5所記載之非接觸式供電裝置,其中前述偵測控制部係在以預先被設定之次數反覆執行前述偵測處理的期間,在已藉由前述偵測部連續偵測到前述受電線圈之存在的情況時,將前述執行間隔初始化。 The non-contact power supply device of claim 5, wherein the detection control unit continuously detects the power receiving by the detecting unit while repeatedly performing the detecting process for a predetermined number of times In the case of the presence of a coil, the aforementioned execution interval is initialized. 如請求項1所記載之非接觸式供電裝置,其中前述偵測控制部係包含:檢測頻率取得部,其係基於前述偵測部所偵測的前述受電線圈之存在的有無而取得前述偵測部已偵測到前述受電線圈之存在的頻率作為偵測頻率;以及執行頻率調節部,其係當前述偵測頻率越少就使前述執行頻率越為減少。 The non-contact power supply device of claim 1, wherein the detection control unit includes: a detection frequency acquisition unit that acquires the detection based on the presence or absence of the power receiving coil detected by the detection unit The portion has detected the frequency of the presence of the power receiving coil as the detection frequency; and the frequency adjustment unit performs a reduction in the execution frequency as the detection frequency is less. 如請求項1所記載之非接觸式供電裝置,其中前述供電線圈係具備複數個線圈;前述偵測部係對前述複數個線圈之各個線圈執行前述偵測處理;前述偵測控制部係分別調節與各前述線圈對應的各偵測處理之執行頻率。 The non-contact power supply device of claim 1, wherein the power supply coil has a plurality of coils; the detecting unit performs the detection processing on each of the plurality of coils; and the detection control unit adjusts The execution frequency of each detection process corresponding to each of the aforementioned coils. 一種非接觸式供電系統,其特徵為具備:請求項1所記載之非接觸式供電裝置;以及具備有受電線圈的被供電裝置。 A contactless power supply system comprising: the contactless power supply device described in claim 1; and a power supply device including a power receiving coil.
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