TW201350448A - Device for molding float glass, and method for producing float glass - Google Patents

Device for molding float glass, and method for producing float glass Download PDF

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Publication number
TW201350448A
TW201350448A TW102117619A TW102117619A TW201350448A TW 201350448 A TW201350448 A TW 201350448A TW 102117619 A TW102117619 A TW 102117619A TW 102117619 A TW102117619 A TW 102117619A TW 201350448 A TW201350448 A TW 201350448A
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Taiwan
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molten
tin
molten tin
partition wall
glass
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TW102117619A
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Chinese (zh)
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Motoichi Iga
Nobuyuki Ban
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Asahi Glass Co Ltd
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Publication of TW201350448A publication Critical patent/TW201350448A/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • C03B18/16Construction of the float tank; Use of material for the float tank; Coating or protection of the tank wall
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • C03B18/20Composition of the atmosphere above the float bath; Treating or purifying the atmosphere above the float bath

Abstract

Provided is a device for molding float glass, equipped with a bath containing molten tin, molten glass supplied continuously onto the molten tin being molded by being flowed over the molten tin. In this device for molding float glass, the top surface of the molten tin includes an exposed section not covered by the molten glass; and a dividing wall is furnished for dividing the space above the exposed section into a plurality of spaces, the dividing wall including a ceiling part defining a space in relation to the exposed section, and a side wall part inserted into the molten tin from above the exposed section, along at least a portion of a side edge of the molten glass.

Description

浮式玻璃之成形裝置及浮式玻璃之製造方法 Floating glass forming device and method for manufacturing floating glass

本發明係關於一種浮式玻璃之成形裝置及浮式玻璃之製造方法。 The present invention relates to a forming apparatus for a floating glass and a method of manufacturing the floating glass.

浮式玻璃之成形裝置具備容納熔融錫之浴槽,使連續地供給至熔融錫上之熔融玻璃於熔融錫上流動並成形為玻璃帶。成形之玻璃帶係自熔融錫向斜上方被提拉而被送至緩冷爐。於緩冷爐內經緩冷之玻璃帶係利用切割裝置切割成特定之尺寸形狀,而獲得製品即板玻璃。 The float glass forming apparatus includes a bath for absorbing molten tin, and the molten glass continuously supplied to the molten tin flows on the molten tin to form a glass ribbon. The formed glass ribbon is pulled up obliquely from the molten tin and sent to the slow cooling furnace. The slow-cooled glass ribbon in the slow-cooling furnace is cut into a specific size shape by a cutting device to obtain a product, that is, a plate glass.

熔融錫之上方空間係為了防止熔融錫之氧化而以還原性氣體充滿。作為還原性氣體,通常使用含有氮氣與氫氣之混合氣體。還原性氣體係自與熔融錫空出間隔而配置之頂棚之孔進行供給。 The space above the molten tin is filled with a reducing gas in order to prevent oxidation of the molten tin. As the reducing gas, a mixed gas containing nitrogen and hydrogen is usually used. The reducing gas system is supplied from a hole in the ceiling which is disposed apart from the molten tin.

熔融錫之上方空間含有少許自熔融錫揮發之錫蒸氣、及自外部混入之氧氣。若錫蒸氣被氧化,則產生氧化錫粒子,有氧化錫粒子落下至熔融玻璃之上表面而板玻璃之品質受損之情況。 The space above the molten tin contains a small amount of tin vapor volatilized from the molten tin and oxygen mixed from the outside. When the tin vapor is oxidized, tin oxide particles are generated, and the tin oxide particles fall to the upper surface of the molten glass, and the quality of the plate glass is impaired.

因此,為了板玻璃之品質提昇等,而提出有設置將熔融錫之上方空間隔離成複數個空間之間隔壁(例如參照專利文獻1)。間隔壁係沿熔融錫之上表面中被熔融玻璃覆蓋之部分與未被熔融玻璃覆蓋之露出部分的邊界而形成。藉由自熔融錫之露出部分揮發之錫蒸氣之氧化而產生之氧化錫粒子落下至露出部分,而未落下至熔融玻璃之上表面,因此板玻璃之品質變好。 Therefore, in order to improve the quality of the sheet glass, it is proposed to provide a partition wall that separates the space above the molten tin into a plurality of spaces (see, for example, Patent Document 1). The partition wall is formed along the boundary between the portion of the upper surface of the molten tin covered by the molten glass and the exposed portion not covered by the molten glass. The tin oxide particles generated by the oxidation of the tin vapor volatilized from the exposed portion of the molten tin fall to the exposed portion without falling to the upper surface of the molten glass, so that the quality of the plate glass is improved.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]:日本專利特開昭50-3414號公報 [Patent Document 1]: Japanese Patent Laid-Open No. 50-3414

熔融錫中溶入有自外部混入至熔融錫之上方空間之氧氣。因此,熔融錫以雜質之形式含有氧氣,若熔融錫之溫度變低,則於熔融錫中析出氧化錫粒子。浴槽之側面磚與熔融錫相比溫度更低,因此於浴槽之側面磚附近容易析出氧化錫粒子。氧化錫粒子較熔融錫輕,因此浮於熔融錫上。有氧化錫粒子附著於熔融玻璃之下表面之情況。 Oxygen mixed into the space above the molten tin from the outside is dissolved in the molten tin. Therefore, the molten tin contains oxygen as an impurity, and if the temperature of the molten tin becomes low, tin oxide particles are precipitated in the molten tin. The side bricks of the bath have a lower temperature than the molten tin, so that tin oxide particles are easily precipitated near the side bricks of the bath. The tin oxide particles are lighter than the molten tin and therefore float on the molten tin. There are cases where tin oxide particles adhere to the lower surface of the molten glass.

本發明係鑒於上述課題而成者,目的在於提供一種可獲得品質良好之板玻璃的浮式玻璃之成形裝置。 The present invention has been made in view of the above problems, and it is an object of the invention to provide a molding apparatus for a floating glass which can obtain a plate glass of good quality.

為了解決上述課題,本發明之一態樣之浮式玻璃之成形裝置係具備容納熔融錫之浴槽並使連續地供給至上述熔融錫上之熔融玻璃於上述熔融錫上流動而成形者,且上述熔融錫之上表面含有未被上述熔融玻璃覆蓋之露出部分,並設置有將該露出部分之上方空間隔離成複數個空間之隔離壁,該隔離壁包括:頂棚部,其於與上述露出部分之間形成空間;及側壁部,其沿上述熔融玻璃之側緣之至少一部分自上述露出部分之上方插入至上述熔融錫中。 In order to solve the above problems, the apparatus for forming a floating glass according to an aspect of the present invention includes a bath in which molten tin is accommodated, and molten glass continuously supplied to the molten tin flows on the molten tin, and the above-described The upper surface of the molten tin contains an exposed portion not covered by the molten glass, and is provided with a partition wall separating the space above the exposed portion into a plurality of spaces, the partition wall comprising: a ceiling portion, and the exposed portion And a side wall portion inserted into the molten tin from above the exposed portion along at least a portion of a side edge of the molten glass.

根據本發明,提供一種可獲得品質良好之板玻璃的浮式玻璃之成形裝置。 According to the present invention, there is provided a forming apparatus for a floating glass which can obtain a plate glass of good quality.

10‧‧‧玻璃原料 10‧‧‧glass materials

12‧‧‧熔融玻璃 12‧‧‧ molten glass

14‧‧‧玻璃帶 14‧‧‧glass ribbon

100‧‧‧浮式玻璃製造裝置 100‧‧‧Floating glass manufacturing equipment

200‧‧‧熔解裝置 200‧‧‧melting device

210‧‧‧熔解槽 210‧‧‧melting tank

220‧‧‧燃燒器 220‧‧‧ burner

300‧‧‧成形裝置 300‧‧‧Forming device

310‧‧‧熔融錫 310‧‧‧Fused tin

311‧‧‧露出部分 311‧‧‧ exposed part

312‧‧‧被熔融玻璃12覆蓋之部分 312‧‧‧Parts covered by molten glass 12

314‧‧‧氧化錫粒子 314‧‧‧ tin oxide particles

320‧‧‧浴槽 320‧‧‧ bath

321‧‧‧金屬盒 321‧‧‧Metal box

322‧‧‧底部磚 322‧‧‧Bottom brick

323‧‧‧側面磚 323‧‧‧Side brick

324‧‧‧上部側壁 324‧‧‧ upper side wall

326‧‧‧頂棚 326‧‧‧ shed

327‧‧‧空間(露出部分之上方空間) 327‧‧‧ Space (space above the exposed part)

328‧‧‧空間(處理空間) 328‧‧‧ Space (processing space)

329‧‧‧剩餘空間 329‧‧‧ remaining space

330‧‧‧氣體供給路徑 330‧‧‧ gas supply path

332‧‧‧加熱器 332‧‧‧heater

340‧‧‧隔離壁 340‧‧‧ partition wall

340A‧‧‧隔離壁 340A‧‧‧ partition wall

340B‧‧‧隔離壁 340B‧‧‧ partition wall

341‧‧‧頂棚部 341‧‧‧ Ceiling Department

341A‧‧‧頂棚部 341A‧‧‧ Ceiling Department

341B‧‧‧頂棚部 341B‧‧‧ Ceiling Department

342‧‧‧側壁部 342‧‧‧ Sidewall

343‧‧‧對向壁部 343‧‧‧ facing wall

344‧‧‧蓋部 344‧‧‧ 盖部

345‧‧‧蓋部 345‧‧‧ 盖部

346‧‧‧供給管 346‧‧‧Supply tube

347‧‧‧供給口 347‧‧‧ supply port

348‧‧‧排氣管 348‧‧‧Exhaust pipe

349‧‧‧開口部 349‧‧‧ openings

350‧‧‧隔離壁 350‧‧‧ partition wall

361~368‧‧‧塊體 361~368‧‧‧Block

371‧‧‧抗氧化膜 371‧‧‧Antioxidant film

400‧‧‧緩冷裝置 400‧‧‧Slow cooling device

410‧‧‧緩冷爐 410‧‧‧ Slow cooling furnace

420‧‧‧搬送輥 420‧‧‧Transport roller

440‧‧‧加熱器 440‧‧‧heater

510‧‧‧升降輥 510‧‧‧ Lifting roller

H‧‧‧頂棚部341與露出部分311之間之間隔 H‧‧‧Interval between the ceiling portion 341 and the exposed portion 311

L1‧‧‧隔離壁340之X方向尺寸 L1‧‧‧ dimensions of the partition wall 340 in the X direction

L2‧‧‧熔融錫310之X方向尺寸 L2‧‧‧X-direction dimensions of molten tin 310

X‧‧‧與熔融玻璃之流動方向平行之方向 X‧‧‧ parallel to the direction of flow of the molten glass

Y‧‧‧與熔融玻璃之寬度方向平行之方向 Y‧‧‧ parallel to the width direction of the molten glass

Y1‧‧‧隔離壁340之自側面磚323突出之部分的Y方向尺寸 Y1‧‧ ‧ dimensions of the partition wall 340 from the side of the side brick 323 protruding in the Y direction

Y2‧‧‧側面磚323與熔融玻璃310之間之Y方向尺寸 Y2‧‧‧Y direction dimension between side brick 323 and molten glass 310

Z1‧‧‧寬區域 Z1‧‧ wide area

Z2‧‧‧中間區域 Z2‧‧‧ intermediate area

Z3‧‧‧窄區域 Z3‧‧‧ narrow area

圖1係表示本發明之一實施形態之浮式玻璃製造裝置之概略的剖 面圖。 Fig. 1 is a cross-sectional view showing the outline of a floating glass manufacturing apparatus according to an embodiment of the present invention; Surface map.

圖2係表示一實施形態之成形裝置之詳情的剖面圖。 Fig. 2 is a cross-sectional view showing the details of a molding apparatus according to an embodiment.

圖3係表示一實施形態之成形裝置之下部構造的俯視圖。 Fig. 3 is a plan view showing the structure of the lower portion of the molding apparatus of the embodiment.

圖4係圖3之IV-IV剖面圖。 Figure 4 is a cross-sectional view taken along line IV-IV of Figure 3.

圖5係表示圖4之變形例之剖面圖。 Fig. 5 is a cross-sectional view showing a modification of Fig. 4;

圖6係表示圖4之另一變形例之剖面圖。 Fig. 6 is a cross-sectional view showing another modification of Fig. 4;

圖7係表示圖3之變形例之俯視圖。 Fig. 7 is a plan view showing a modification of Fig. 3;

圖8係表示圖4之又一變形例之剖面圖。 Fig. 8 is a cross-sectional view showing still another modification of Fig. 4;

以下,參照圖式對用以實施本發明之形態進行說明。再者,於以下之圖式中,對相同之構成或相應之構成添附相同之符號或相應之符號,並省略說明。 Hereinafter, embodiments for carrying out the invention will be described with reference to the drawings. In the following drawings, the same components or corresponding components will be denoted by the same reference numerals or signs, and the description will be omitted.

圖1係表示本發明之一實施形態之浮式玻璃製造裝置之概略的剖面圖。 Fig. 1 is a cross-sectional view showing the outline of a floating glass manufacturing apparatus according to an embodiment of the present invention.

浮式玻璃製造裝置100具備:熔解裝置200,其將玻璃原料10熔解而製成熔融玻璃12;成形裝置300,其將自熔解裝置200供給之熔融玻璃12成形為帶狀而製成玻璃帶14;及緩冷裝置400,其使於成形裝置300中成形之玻璃帶14緩冷。 The floating glass manufacturing apparatus 100 includes a melting apparatus 200 that melts the glass raw material 10 to obtain a molten glass 12, and a molding apparatus 300 that forms the molten glass 12 supplied from the melting apparatus 200 into a strip shape to form a glass ribbon 14 And a slow cooling device 400 that slows down the glass ribbon 14 formed in the forming device 300.

熔解裝置200具備:熔解槽210,其容納熔融玻璃12;及燃燒器220,其於容納於熔解槽210內之熔融玻璃12之上方形成火焰。投入至熔解槽210內之玻璃原料10係藉由來自燃燒器220形成之火焰之輻射熱而緩慢地熔化成熔融玻璃12。熔融玻璃12係自熔解槽210向成形裝置300連續地供給。 The melting apparatus 200 includes a melting tank 210 that accommodates the molten glass 12, and a burner 220 that forms a flame above the molten glass 12 housed in the melting tank 210. The glass raw material 10 introduced into the melting tank 210 is slowly melted into the molten glass 12 by the radiant heat of the flame formed from the burner 220. The molten glass 12 is continuously supplied from the melting tank 210 to the molding apparatus 300.

成形裝置300具備容納熔融錫310之浴槽320。成形裝置300係藉由使連續地供給至熔融錫310上之熔融玻璃12於熔融錫310上向特定方向流動而成形為帶狀,從而製成玻璃帶14。玻璃帶14係一面向特定方 向流動一面被冷卻,並於浴槽320之下游區域自熔融錫310被提拉。自熔融錫310提拉起之玻璃帶14藉由升降輥510搬送至緩冷裝置400。 The molding apparatus 300 includes a bath 320 that accommodates the molten tin 310. The molding apparatus 300 is formed into a strip shape by flowing the molten glass 12 continuously supplied onto the molten tin 310 on the molten tin 310 in a specific direction, thereby forming the glass ribbon 14. Glass belt 14 is oriented to a specific side The flow side is cooled and pulled from the molten tin 310 in the downstream region of the bath 320. The glass ribbon 14 lifted from the molten tin 310 is transported to the slow cooling device 400 by the lift roller 510.

緩冷裝置400係使於成形裝置300中成形之玻璃帶14緩冷。緩冷裝置400例如包括隔熱構造之緩冷爐(rare)410、及配置於緩冷爐410內之將玻璃帶14向特定方向搬送之複數根搬送輥420。緩冷爐410內之環境溫度自緩冷爐410之入口向出口越來越低。緩冷爐410內之環境溫度係利用設置於緩冷爐410內之加熱器440等進行調整。自緩冷爐410之出口搬出之玻璃帶14係利用切割機切割成特定之尺寸,而獲得製品即板玻璃。 The slow cooling device 400 slows down the glass ribbon 14 formed in the forming device 300. The slow cooling device 400 includes, for example, a slow cooling furnace 410 having a heat insulating structure, and a plurality of conveying rollers 420 disposed in the slow cooling furnace 410 to convey the glass ribbon 14 in a specific direction. The ambient temperature within the slow cooling furnace 410 is decreasing from the inlet to the outlet of the slow cooling furnace 410. The ambient temperature in the slow cooling furnace 410 is adjusted by a heater 440 or the like provided in the slow cooling furnace 410. The glass ribbon 14 carried out from the exit of the slow cooling furnace 410 is cut into a specific size by a cutter to obtain a sheet glass of the product.

圖2係表示一實施形態之成形裝置之詳情的剖面圖。圖3係表示一實施形態之成形裝置之下部構造的俯視圖。於圖3中,X方向為與熔融玻璃之流動方向平行之方向,Y方向為與熔融玻璃之寬度方向平行之方向。X方向及Y方向相互正交。圖4係圖3之IV-IV剖面圖。 Fig. 2 is a cross-sectional view showing the details of a molding apparatus according to an embodiment. Fig. 3 is a plan view showing the structure of the lower portion of the molding apparatus of the embodiment. In FIG. 3, the X direction is a direction parallel to the flow direction of the molten glass, and the Y direction is a direction parallel to the width direction of the molten glass. The X direction and the Y direction are orthogonal to each other. Figure 4 is a cross-sectional view taken along line IV-IV of Figure 3.

成形裝置300係如圖2及圖4所示般,由容納熔融錫310之浴槽320、沿浴槽320之外周上緣設置的環狀之上部側壁324、及覆蓋上部側壁324之上側開口部之頂棚326等構成。頂棚326中設置有向形成於頂棚326與熔融錫310或熔融玻璃12之間之空間(以下稱為「成形裝置300之上部空間」)供給還原性氣體的氣體供給路徑330(參照圖2)。又,氣體供給路徑330中插通有作為加熱源之加熱器332。 As shown in FIGS. 2 and 4, the molding apparatus 300 includes a bath 320 for accommodating the molten tin 310, an annular upper side wall 324 provided along the outer peripheral edge of the bath 320, and a ceiling covering the upper side opening of the upper side wall 324. 326 and so on. The ceiling 326 is provided with a gas supply path 330 (see FIG. 2) for supplying a reducing gas to a space formed between the ceiling 326 and the molten tin 310 or the molten glass 12 (hereinafter referred to as "the upper space of the molding apparatus 300"). Further, a heater 332 as a heating source is inserted into the gas supply path 330.

氣體供給路徑330係為了防止熔融錫310之氧化而向成形裝置300之上部空間供給還原性氣體。還原性氣體例如含有氫氣1體積%~15體積%、氮氣85體積%~99體積%。 The gas supply path 330 supplies a reducing gas to the upper space of the molding apparatus 300 in order to prevent oxidation of the molten tin 310. The reducing gas contains, for example, 1% by volume to 15% by volume of hydrogen and 85% by volume to 99% by volume of nitrogen.

成形裝置300之上部空間係為了限制大氣自構成上部側壁324之磚彼此之間隙等混入,而形成高於大氣壓之氣壓。供給至成形裝置300之上部空間之還原性氣體係自形成於上部側壁324之排出口等向外部排放。 The upper space of the forming apparatus 300 is formed to restrict the atmosphere from the gap between the bricks constituting the upper side wall 324 and the like, thereby forming an air pressure higher than atmospheric pressure. The reducing gas system supplied to the upper space of the forming apparatus 300 is discharged to the outside from the discharge port or the like formed on the upper side wall 324.

加熱器332係為了調節熔融玻璃12之溫度分佈,例如沿熔融玻璃12之流動方向(X方向)及寬度方向(Y方向)空開間隔而設置複數個。加熱器332之輸出係以自上游側向下游熔融玻璃12之溫度越來越低之方式進行控制。又,加熱器332之輸出係以熔融玻璃12之厚度於寬度方向上均勻之方式進行控制。 The heater 332 is provided in plural in order to adjust the temperature distribution of the molten glass 12, for example, in the flow direction (X direction) and the width direction (Y direction) of the molten glass 12. The output of the heater 332 is controlled in such a manner that the temperature from the upstream side to the downstream molten glass 12 is getting lower and lower. Further, the output of the heater 332 is controlled such that the thickness of the molten glass 12 is uniform in the width direction.

浴槽320係由朝上方開放之箱狀金屬盒321、以及設置於金屬盒321內之底部磚322及側面磚323構成。金屬盒321防止大氣自側面或下方混入至浴槽320內。複數塊底部磚322係二維地排列,並由環狀地排列之複數塊側面磚323包圍。 The bath 320 is composed of a box-shaped metal case 321 that is open upward, and a bottom brick 322 and a side wall 323 that are provided in the metal case 321 . The metal case 321 prevents the atmosphere from being mixed into the bathtub 320 from the side or below. The plurality of bottom bricks 322 are two-dimensionally arranged and surrounded by a plurality of side tiles 323 that are annularly arranged.

浴槽320內之熔融錫310之上表面係如圖3所示般,自上游側依序具備寬度較寬之寬區域Z1、寬度緩慢變窄之中間區域Z2、及寬度較窄之窄區域Z3。寬區域Z1之溫度於含鹼玻璃之情形時,設定為700℃以上。又,寬區域Z1之溫度於無鹼玻璃之情形時,設定為900℃以上。 The upper surface of the molten tin 310 in the bath 320 has a wide region Z1 having a wide width, an intermediate portion Z2 having a gradually narrow width, and a narrow region Z3 having a narrow width, as shown in FIG. When the temperature of the wide region Z1 is in the case of containing alkali glass, it is set to 700 ° C or higher. Further, when the temperature of the wide region Z1 is in the case of an alkali-free glass, it is set to 900 ° C or higher.

浴槽320內之熔融錫310之上表面係如圖3及圖4所示,包括未被熔融玻璃12覆蓋之露出部分311、與被熔融玻璃12覆蓋之部分312(參照圖4)。露出部分311係如圖3所示般處於熔融玻璃12之寬度方向兩側。 As shown in FIGS. 3 and 4, the upper surface of the molten tin 310 in the bath 320 includes an exposed portion 311 not covered with the molten glass 12 and a portion 312 covered with the molten glass 12 (see FIG. 4). The exposed portion 311 is on both sides in the width direction of the molten glass 12 as shown in FIG.

成形裝置300係如圖3及圖4所示般,進而具備將露出部分311之上方空間327隔離成複數個空間328、329(參照圖4)之隔離壁340、350。隔離壁340、350係以不妨礙熔融玻璃12之流動之方式自熔融玻璃12空出距離而配置,且隔著熔融玻璃12對稱地配置。隔離壁340、350為大致相同之構造,因此,以下代表性地對一隔離壁340進行說明。 As shown in FIGS. 3 and 4, the molding apparatus 300 further includes partition walls 340 and 350 that partition the upper space 327 of the exposed portion 311 into a plurality of spaces 328 and 329 (see FIG. 4). The partition walls 340 and 350 are disposed so as to be free from the distance from the molten glass 12 so as not to interfere with the flow of the molten glass 12, and are disposed symmetrically with the molten glass 12 interposed therebetween. The partition walls 340 and 350 have substantially the same structure. Therefore, a partition wall 340 will be representatively described below.

隔離壁340係如圖4所示般,例如為朝下方開放之箱形,覆蓋熔融錫310之露出部分311之一部分。隔離壁340抑制自熔融錫310之露出部分311揮發之錫蒸氣之擴散,降低氧化錫粒子之生成。又,隔離壁 340限制自構成上部側壁324之磚彼此之間隙等處混入之氧氣與熔融錫310的接觸,抑制熔融錫310中之氧濃度之增加。又,隔離壁340係自熔融錫310之上方插入至熔融錫310中,將來自加熱器332之受熱傳遞至熔融錫310。 The partition wall 340 is, for example, a box shape that is open downward, and covers a portion of the exposed portion 311 of the molten tin 310, as shown in FIG. The partition wall 340 suppresses diffusion of tin vapor volatilized from the exposed portion 311 of the molten tin 310, and reduces generation of tin oxide particles. Separate wall 340 restricts contact between the oxygen mixed with the molten tin 310 from the gap between the bricks constituting the upper side wall 324 and the like, and suppresses an increase in the oxygen concentration in the molten tin 310. Further, the partition wall 340 is inserted into the molten tin 310 from above the molten tin 310, and transfers heat from the heater 332 to the molten tin 310.

隔離壁340包括:頂棚部341,其於與熔融錫310之露出部分311之間形成空間328(以下亦稱為「處理空間328」);及側壁部342,其沿熔融玻璃12之側緣之至少一部分形成。又,隔離壁340包括:對向壁部343,其與側壁部342大致對向;蓋部344,其使處理空間328之上游側之開口部閉合;及蓋部345,其使處理空間328之下游側之開口部閉合。 The partition wall 340 includes a ceiling portion 341 which forms a space 328 (hereinafter also referred to as "processing space 328") with the exposed portion 311 of the molten tin 310, and a side wall portion 342 which is along the side edge of the molten glass 12. At least a portion is formed. Further, the partition wall 340 includes: a facing wall portion 343 that substantially faces the side wall portion 342; a lid portion 344 that closes an opening portion on the upstream side of the processing space 328; and a lid portion 345 that allows the processing space 328 The opening on the downstream side is closed.

頂棚部341係自覆蓋上部側壁324之上側開口部之頂棚326空出距離而配置,自浴槽320之側面磚323向浴槽320之內側延伸。頂棚部341阻擋自上方落下之氧化錫粒子314,抑制熔融錫310之污染。 The ceiling portion 341 is disposed at a distance from the ceiling 326 covering the upper opening portion of the upper side wall 324, and extends from the side wall 323 of the bath 320 to the inside of the bathtub 320. The ceiling portion 341 blocks the tin oxide particles 314 dropped from above to suppress contamination of the molten tin 310.

形成於頂棚部341與露出部分311之間的空間328可為用以對熔融錫310進行淨化處理之處理空間。淨化處理之詳情見後述,係將熔融錫310中之雜質即氧去除之處理。淨化處理包括如下處理:由自熔融錫310揮發之氧化錫蒸氣生成含氧之氣體(例如水蒸氣或一氧化碳氣體)與錫液滴,並將含氧之氣體排出至處理空間328之外部。 The space 328 formed between the ceiling portion 341 and the exposed portion 311 may be a processing space for purifying the molten tin 310. The details of the purification treatment will be described later, and the treatment of removing impurities such as oxygen in the molten tin 310 is performed. The purification treatment includes treatment of generating an oxygen-containing gas (for example, water vapor or carbon monoxide gas) and tin droplets from the tin oxide vapor volatilized from the molten tin 310, and discharging the oxygen-containing gas to the outside of the processing space 328.

側壁部342係以不妨礙熔融玻璃12之流動之方式自熔融玻璃12空出距離而配置。側壁部342係自上方插入至熔融錫310之上表面之露出部分311中。側壁部342亦可離開浴槽320之底部磚322以使浴槽320內之熔融錫310藉由對流變均質。 The side wall portion 342 is disposed so as to be free from the distance from the molten glass 12 so as not to interfere with the flow of the molten glass 12 . The side wall portion 342 is inserted into the exposed portion 311 of the upper surface of the molten tin 310 from above. The side wall portion 342 can also exit the bottom brick 322 of the bath 320 to homogenize the molten tin 310 in the bath 320 by convection.

對向壁部343固定於側面磚323之凹部。對向壁部343係自上方插入至露出部分311中。對向壁部343之與熔融錫310之接觸面、與側面磚323之與熔融錫310之接觸面形成一個平面。 The opposite wall portion 343 is fixed to the concave portion of the side wall 323. The opposing wall portion 343 is inserted into the exposed portion 311 from above. The contact surface of the opposing wall portion 343 with the molten tin 310 and the contact surface of the side wall 323 with the molten tin 310 form a flat surface.

蓋部344、345係自上方插入至露出部分311中。 The lid portions 344, 345 are inserted into the exposed portion 311 from above.

然而,熔融錫310中溶入有自外部混入至成形裝置300之上部空間中之氧氣。因此,熔融錫310以雜質之形式含有氧氣,若熔融錫310之溫度變低,則析出氧化錫粒子。浴槽320之側面磚323與熔融錫310相比溫度低,因此於浴槽320之側面磚323附近容易析出氧化錫粒子314。氧化錫粒子314較熔融錫310輕,因此浮於熔融錫310上。 However, the molten tin 310 is dissolved with oxygen which is mixed into the upper space of the forming apparatus 300 from the outside. Therefore, the molten tin 310 contains oxygen as an impurity, and when the temperature of the molten tin 310 becomes low, tin oxide particles are precipitated. Since the side wall 323 of the bathtub 320 has a lower temperature than the molten tin 310, the tin oxide particles 314 are easily precipitated in the vicinity of the side wall 323 of the bath 320. The tin oxide particles 314 are lighter than the molten tin 310 and thus float on the molten tin 310.

於本實施形態中,側壁部342係沿熔融玻璃12之側緣之至少一部分形成,並自上方插入至熔融錫310之上表面之露出部分311中。側壁部342阻擋浮於熔融錫310上之氧化錫粒子,抑制其向熔融玻璃12之下表面潛行。因此,板玻璃之品質變好。 In the present embodiment, the side wall portion 342 is formed along at least a part of the side edge of the molten glass 12, and is inserted into the exposed portion 311 of the upper surface of the molten tin 310 from above. The side wall portion 342 blocks the tin oxide particles floating on the molten tin 310 and suppresses the sneaking to the lower surface of the molten glass 12. Therefore, the quality of the plate glass becomes better.

於隔離壁340中貫通形成有自處理空間328之外部向內部供給還原性氣體之供給口347。供給口347上連接有供給管346。供給管346之還原性氣體例如包括氫氣(H2)或乙炔氣體(C2H2)。乙炔氣體與氫氣相比還原能力較高、淨化作用較強,因此較佳。為了防止處理空間328之溫度下降,供給管346之還原性氣體係可為於向處理空間328供給前經加熱之高溫氣體,亦可於供給管346上纏繞帶式加熱器。自供給管346向處理空間328供給之還原性氣體可通過隔離壁340中貫通形成之排氣口自與排氣口連接之排氣管348(參照圖3)向成形裝置300之外部排出。排氣可利用成形裝置300之外部與處理空間328之氣壓差進行,亦可使用與排氣管348連接之真空泵等吸氣源進行。供給口347及排氣口之設置位置並不限定於圖示之位置。 A supply port 347 for supplying a reducing gas to the inside from the outside of the processing space 328 is formed in the partition wall 340. A supply pipe 346 is connected to the supply port 347. The reducing gas of the supply pipe 346 includes, for example, hydrogen (H 2 ) or acetylene gas (C 2 H 2 ). Acetylene gas is preferred because it has higher reducing power and stronger purification than hydrogen. In order to prevent the temperature of the processing space 328 from dropping, the reducing gas system of the supply pipe 346 may be for supplying the previously heated high temperature gas to the processing space 328, or may be wound around the supply tube 346. The reducing gas supplied from the supply pipe 346 to the processing space 328 can be discharged to the outside of the forming apparatus 300 from the exhaust pipe 348 (see FIG. 3) connected to the exhaust port through the exhaust port formed in the partition wall 340. The exhaust gas can be performed by the difference in air pressure between the outside of the forming apparatus 300 and the processing space 328, or by using an intake source such as a vacuum pump connected to the exhaust pipe 348. The installation position of the supply port 347 and the exhaust port is not limited to the illustrated position.

供給管346之還原性氣體亦可為包含氮氣(N2)等惰性氣體之混合氣體,於該情形時,較佳為含有乙炔氣體。乙炔氣體與氫氣相比比重較高,與惰性氣體之比重差較小,因此容易遍佈處理空間328之下方,適於處於處理空間328之下方之熔融錫310之淨化。再者,為了降低成本,供給管346之還原性氣體亦可使用與氣體供給路徑330之還原性氣體相同種類的氣體。 The reducing gas of the supply pipe 346 may be a mixed gas containing an inert gas such as nitrogen (N 2 ). In this case, it is preferable to contain an acetylene gas. The acetylene gas has a higher specific gravity than the hydrogen gas, and has a small difference in specific gravity from the inert gas, so that it is easily spread under the processing space 328 and is suitable for purification of the molten tin 310 below the processing space 328. Further, in order to reduce the cost, the reducing gas of the supply pipe 346 may be the same type of gas as the reducing gas of the gas supply path 330.

供給管346之還原性氣體(例如H2)於處理空間328內與自熔融錫310揮發之氧化錫蒸氣(SnO)發生反應,生成錫蒸氣(Sn)與水蒸氣(H2O)。若處理空間328內之錫之蒸氣量超過飽和蒸氣量,則新生成之錫蒸氣形成錫液滴,落下至浴槽320內之熔融錫310上。來自熔融錫310之氧化錫蒸氣(SnO)之揮發於700℃以上容易發生,於800℃以上較為顯著,於1000℃以上尤為顯著。 The reducing gas (for example, H 2 ) of the supply pipe 346 reacts with the tin oxide vapor (SnO) volatilized from the molten tin 310 in the processing space 328 to generate tin vapor (Sn) and water vapor (H 2 O). When the amount of tin vapor in the processing space 328 exceeds the saturated vapor amount, the newly formed tin vapor forms tin droplets and falls onto the molten tin 310 in the bath 320. The volatilization of the tin oxide vapor (SnO) from the molten tin 310 is likely to occur at 700 ° C or higher, and is more remarkable at 800 ° C or higher, and is particularly remarkable at 1000 ° C or higher.

又,自供給管346向處理空間328供給之還原性氣體與熔融錫310中之氧氣發生反應,生成水蒸氣。該水蒸氣與還原性氣體一併自排氣管348向成形裝置300之外部排出。處理空間328之氣壓亦可設定為高於剩餘之空間329之氣壓。混入至剩餘之空間329中之氧氣向處理空間328之流入受到限制。 Further, the reducing gas supplied from the supply pipe 346 to the processing space 328 reacts with the oxygen in the molten tin 310 to generate steam. This steam is discharged from the exhaust pipe 348 to the outside of the forming apparatus 300 together with the reducing gas. The air pressure of the processing space 328 can also be set to be higher than the air pressure of the remaining space 329. The inflow of oxygen mixed into the remaining space 329 into the processing space 328 is limited.

自供給管346向處理空間328供給之還原性氣體中的氫氣濃度(體積%)較佳為高於自氣體供給路徑330向成形裝置300之上部空間供給之還原性氣體中的氫氣濃度(體積%)。與未設置供給管346之情形相比,處理空間328之環境之還原能力變高。自供給管346向處理空間328供給之還原性氣體可實質上僅由氫氣構成,亦可具有99體積%以上之氫氣濃度。自供給管346向處理空間328供給之還原性氣體中的乙炔氣體濃度(體積%)可低於自氣體供給路徑330向成形裝置300之上部空間304供給之還原性氣體中的氫氣濃度(體積%)。與未設置供給管346之情形相比,處理空間328之環境之還原能力變高即可。 The concentration (% by volume) of hydrogen in the reducing gas supplied from the supply pipe 346 to the processing space 328 is preferably higher than the concentration of hydrogen in the reducing gas supplied from the gas supply path 330 to the upper space of the forming device 300 (% by volume) ). The reducing power of the environment of the processing space 328 becomes higher as compared with the case where the supply pipe 346 is not provided. The reducing gas supplied from the supply pipe 346 to the processing space 328 may be substantially composed only of hydrogen gas, and may have a hydrogen gas concentration of 99% by volume or more. The acetylene gas concentration (% by volume) in the reducing gas supplied from the supply pipe 346 to the processing space 328 may be lower than the hydrogen concentration (vol%) in the reducing gas supplied from the gas supply path 330 to the upper space 304 of the forming device 300. ). The reducing power of the environment of the processing space 328 becomes higher as compared with the case where the supply pipe 346 is not provided.

隔離壁340可由沿熔融玻璃12之流動方向(X方向)連續地配置之複數個塊體361~368構成。可設置每個塊體361~368,因此設置作業較容易。 The partition wall 340 may be composed of a plurality of blocks 361 to 368 that are continuously disposed in the flow direction (X direction) of the molten glass 12. Each block 361~368 can be set, so setting up the job is easier.

隔離壁340可由碳(C)形成。碳具有還原能力,於氧濃度較低之環境下產生一氧化碳氣體(CO)。例如,碳與處理空間328內之氧化錫蒸氣(SnO)發生反應,生成錫蒸氣(Sn)與一氧化碳氣體(CO)。若處理空 間328內之錫之蒸氣量超過飽和蒸氣量,則新生成之錫蒸氣形成錫液滴,落下至浴槽320內之熔融錫310上。又,碳與熔融錫310中之氧氣發生反應,生成一氧化碳氣體。該一氧化碳氣體與還原性氣體一併通過排氣管348向成形裝置300之外部排出。利用碳之還原反應於450℃以上容易進行。 The partition wall 340 may be formed of carbon (C). Carbon has a reducing ability to produce carbon monoxide gas (CO) in an environment with a low oxygen concentration. For example, carbon reacts with tin oxide vapor (SnO) in the processing space 328 to form tin vapor (Sn) and carbon monoxide gas (CO). If empty When the amount of tin vapor in the space 328 exceeds the saturated vapor amount, the newly formed tin vapor forms tin droplets and falls onto the molten tin 310 in the bath 320. Further, carbon reacts with oxygen in the molten tin 310 to form carbon monoxide gas. The carbon monoxide gas is discharged to the outside of the forming apparatus 300 through the exhaust pipe 348 together with the reducing gas. The reduction reaction using carbon is easy to carry out at 450 ° C or higher.

碳與熔融玻璃12之潤濕性良好,因此於因熔融玻璃12之流動之變化而熔融玻璃12與隔離壁340接觸之情形時,不易妨礙熔融玻璃12之流動。 Since the wettability of the carbon and the molten glass 12 is good, when the molten glass 12 is in contact with the partition wall 340 due to the change in the flow of the molten glass 12, the flow of the molten glass 12 is hardly hindered.

以此種方式於處理空間328內進行去除熔融錫310中之氧氣的(1)~(3)淨化處理。(1)藉由自熔融錫310揮發之氧化錫蒸氣(SnO)與還原性氣體之反應而產生錫蒸氣及水蒸氣,由錫蒸氣液化而成之錫液滴恢復成熔融錫310,水蒸氣向外部排出。(2)藉由熔融錫310中之氧氣與還原性氣體之反應而產生水蒸氣,水蒸氣向外部排出。(3)藉由自熔融錫310揮發之氧化錫蒸氣(SnO)與碳之反應而產生錫蒸氣及一氧化碳氣體,由錫蒸氣液化而成之錫液滴恢復成熔融錫310,一氧化碳氣體向外部排出。再者,上述(1)~(3)淨化處理中,進行至少任一淨化處理即可,可不進行全部淨化處理。 In this manner, (1) to (3) purification treatment for removing oxygen in the molten tin 310 is performed in the processing space 328. (1) Tin vapor and water vapor are generated by reaction of tin oxide vapor (SnO) volatilized from molten tin 310 with a reducing gas, and tin droplets liquefied from tin vapor are returned to molten tin 310, and water vapor is transferred to External discharge. (2) Water vapor is generated by the reaction of oxygen in the molten tin 310 with a reducing gas, and the water vapor is discharged to the outside. (3) Tin vapor and carbon monoxide gas are generated by reaction of tin oxide vapor (SnO) volatilized from molten tin 310 with carbon, and tin droplets liquefied by tin vapor are returned to molten tin 310, and carbon monoxide gas is discharged to the outside. . Further, in the above (1) to (3) purification treatment, at least one of the purification treatments may be performed, and the entire purification treatment may not be performed.

此處,假設於側壁部342不插入至熔融錫310中而於側壁部342與熔融錫310之間形成間隙的情形時,與本實施形態之情形相比,還原性氣體難以儲存於處理空間328內,而難以獲得上述(1)淨化處理之效果及上述(2)淨化處理之效果。又,無法獲得阻擋浮於熔融錫310上之氧化錫粒子之效果。因此,於本實施形態中,將側壁部342插入至熔融錫310中。 Here, when the side wall portion 342 is not inserted into the molten tin 310 and a gap is formed between the side wall portion 342 and the molten tin 310, the reducing gas is difficult to store in the processing space 328 as compared with the case of the present embodiment. In addition, it is difficult to obtain the effects of the above (1) purification treatment and the above (2) purification treatment effects. Further, the effect of blocking the tin oxide particles floating on the molten tin 310 cannot be obtained. Therefore, in the present embodiment, the side wall portion 342 is inserted into the molten tin 310.

隔離壁340之X方向尺寸L1(參照圖3)較佳為熔融錫310之X方向尺寸L2(參照圖3)之50%以上,更佳為70%以上,進而較佳為90%以上。若為50%以上,則可充分地獲得阻擋浮於熔融錫310上之氧化錫粒子 之效果。再者,隔離壁340之X方向尺寸L1為熔融錫310之X方向尺寸L2之100%以下。 The X-direction dimension L1 (see FIG. 3) of the partition wall 340 is preferably 50% or more, more preferably 70% or more, and still more preferably 90% or more of the X-direction dimension L2 (see FIG. 3) of the molten tin 310. If it is 50% or more, the tin oxide particles floating on the molten tin 310 can be sufficiently obtained. The effect. Further, the dimension L1 of the partition wall 340 in the X direction is 100% or less of the dimension L2 of the molten tin 310 in the X direction.

隔離壁340之自側面磚323突出之部分的Y方向尺寸Y1與該側面磚323與熔融玻璃310之間之Y方向尺寸Y2之比(Y1/Y2)的平均值較佳為1/2以上,更佳為7/10以上。又,上述比(Y1/Y2)之平均值較佳為9/10以下。 The average value of the ratio (Y1/Y2) of the Y-direction dimension Y1 of the portion of the partition wall 323 protruding from the side wall 323 and the Y-direction dimension Y2 between the side wall 323 and the molten glass 310 is preferably 1/2 or more. More preferably 7/10 or more. Further, the average value of the above ratio (Y1/Y2) is preferably 9/10 or less.

隔離壁340亦可設置於高溫之寬區域Z1中。寬區域Z1之溫度通常為氧化錫蒸氣(SnO)開始揮發之700℃以上,因此會進行由氧化錫蒸氣生成含有氧之氣體(例如水蒸氣或一氧化碳氣體)與錫液滴的反應。 The partition wall 340 may also be disposed in the wide region Z1 of high temperature. The temperature of the wide region Z1 is usually 700 ° C or more at which the tin oxide vapor (SnO) starts to volatilize, so that a reaction between the oxygen-containing gas (for example, water vapor or carbon monoxide gas) and the tin droplets by the tin oxide vapor is performed.

頂棚部341與露出部分311之間的間隔H(參照圖4)較佳為2mm~35mm,更佳為5mm~25mm,進而較佳為5mm~10mm。若間隔H為2mm以上,則可充分確保用以進行淨化處理之還原性氣體之量。又,若間隔H為35mm以下,則處理空間328之換氣效率良好,又,隔離壁340之剛性良好。 The interval H (see FIG. 4) between the ceiling portion 341 and the exposed portion 311 is preferably 2 mm to 35 mm, more preferably 5 mm to 25 mm, and still more preferably 5 mm to 10 mm. When the interval H is 2 mm or more, the amount of the reducing gas used for the purification treatment can be sufficiently ensured. Further, when the interval H is 35 mm or less, the ventilation efficiency of the treatment space 328 is good, and the rigidity of the partition wall 340 is good.

若處理空間328之每1小時之換氣次數過少,則無法充分地進行淨化處理,若過多則成本提高,因此較佳為3次~20次,更佳為8次~10次。此處,換氣次數係根據於1小時之間向處理空間328供給之還原性氣體之標準狀態(1個大氣壓、25℃)下的體積(Nm3)與處理空間328之體積的比算出。 If the number of air changes per hour of the processing space 328 is too small, the purification process cannot be sufficiently performed. If the cost is increased if the number is too large, it is preferably 3 to 20 times, more preferably 8 to 10 times. Here, the number of ventilations is calculated from the ratio of the volume (Nm 3 ) in the standard state (1 atm, 25 ° C) of the reducing gas supplied to the processing space 328 to the volume of the processing space 328 over one hour.

以上,已對本發明之實施形態進行說明,但本發明並不限定於上述實施形態,於申請專利範圍中所記載之本發明之主旨之範圍內,可進行各種變形、變更。 The embodiment of the present invention has been described above, but the present invention is not limited to the above-described embodiment, and various modifications and changes can be made without departing from the spirit and scope of the invention.

例如,上述實施形態之隔離壁340設為連接有供給管346及排氣管348,但亦可不連接。即便不連接供給管346,亦可至少謀求(1)抑制自熔融錫310之露出部分311揮發之錫蒸氣的擴散、(2)抑制自上部側壁324之間隙等處混入之氧氣與熔融錫310的接觸、(3)抑制熔融錫 310中產生之氧化錫粒子向熔融玻璃的附著。又,即便不連接供給管346及排氣管348,例如,若如圖7所示般於隔離壁340中穿設有開口部349,則還原性氣體可於由隔離壁340隔離成之處理空間328與剩餘之空間329之間往來,因此可進行處理空間328內之利用還原性氣體之淨化處理。開口部349亦可穿設於隔離壁340之頂棚部341中。再者,開口部349之穿設位置不限定於圖示之位置。又,若隔離壁340為多孔質且具有透氣性,則隔離壁340中亦可不穿設開口部。於隔離壁340中穿設有開口部349之情形時,隔離壁340為多孔質且具有透氣性之情形時,隔離壁340之內壁面之開口率較佳為1%~15%。若開口率小於1%,則還原性氣體之往來不充分。若開口率大於15%,則自上部側壁324之間隙等處混入之氧氣容易進入至處理空間328內,而無法充分獲得上述(2)之效果。 For example, the partition wall 340 of the above embodiment may be connected to the supply pipe 346 and the exhaust pipe 348, but may not be connected. Even if the supply pipe 346 is not connected, it is possible to at least (1) suppress the diffusion of the tin vapor volatilized from the exposed portion 311 of the molten tin 310, and (2) suppress the oxygen mixed with the molten tin 310 from the gap between the upper side walls 324 and the like. Contact, (3) inhibit molten tin The adhesion of the tin oxide particles generated in 310 to the molten glass. Further, even if the supply pipe 346 and the exhaust pipe 348 are not connected, for example, if the opening portion 349 is formed in the partition wall 340 as shown in FIG. 7, the reducing gas can be separated into the processing space by the partition wall 340. 328 is in communication with the remaining space 329, so that the purification process using the reducing gas in the processing space 328 can be performed. The opening portion 349 may also be disposed in the ceiling portion 341 of the partition wall 340. Further, the position at which the opening portion 349 is to be placed is not limited to the illustrated position. Further, when the partition wall 340 is porous and has gas permeability, the partition wall 340 may not have an opening portion. When the opening 349 is formed in the partition wall 340, when the partition wall 340 is porous and has gas permeability, the opening ratio of the inner wall surface of the partition wall 340 is preferably from 1% to 15%. If the aperture ratio is less than 1%, the exchange of the reducing gas is insufficient. When the aperture ratio is more than 15%, oxygen mixed in from the gap of the upper side wall 324 or the like easily enters into the processing space 328, and the effect of the above (2) cannot be sufficiently obtained.

又,為了抑制隔離壁340之燒毀,隔離壁340上例如如圖8所示般形成有抗氧化膜371。抗氧化膜371係由碳化矽(SiC)等陶瓷形成。作為抗氧化膜371之形成方法,例如有噴敷法等。抗氧化膜371亦可覆蓋隔離壁340之整個表面。 Further, in order to suppress the burning of the partition wall 340, the partition wall 340 is formed with an oxidation resistant film 371 as shown, for example, in FIG. The oxidation resistant film 371 is formed of a ceramic such as tantalum carbide (SiC). As a method of forming the oxidation resistant film 371, for example, a spray method or the like is used. The oxidation resistant film 371 may also cover the entire surface of the partition wall 340.

又,上述實施形態之隔離壁340係朝下方開放之箱形,以對向壁部343固定於側面磚323上,亦可無對向壁部343。例如,如圖5所示般,隔離壁340A亦可以頂棚部341A固定於側面磚323上。又,如圖6所示般,隔離壁340B係使頂棚部341B與熔融錫310之間之間隔H(參照圖4)變窄,因此頂棚部341B中形成有階差。 Further, the partition wall 340 of the above-described embodiment is formed in a box shape that is opened downward, and is fixed to the side wall 323 by the opposing wall portion 343, or the opposing wall portion 343 is not provided. For example, as shown in FIG. 5, the partition wall 340A may be fixed to the side wall 323 by the ceiling portion 341A. Further, as shown in FIG. 6, the partition wall 340B narrows the gap H (see FIG. 4) between the ceiling portion 341B and the molten tin 310, so that a step is formed in the ceiling portion 341B.

本申請案係主張基於2012年5月28日向日本專利廳提出申請之日本專利特願2012-121348號之優先權者,且將日本專利特願2012-121348號之全部內容引用於該國際申請案中。 The present application claims the priority of Japanese Patent Application No. 2012-121348, filed on May 28, 2012, to the Japanese Patent Office, and the entire contents of the Japanese Patent Application No. 2012-121348. in.

12‧‧‧熔融玻璃 12‧‧‧ molten glass

300‧‧‧成形裝置 300‧‧‧Forming device

310‧‧‧熔融錫 310‧‧‧Fused tin

311‧‧‧露出部分 311‧‧‧ exposed part

312‧‧‧被熔融玻璃12覆蓋之部分 312‧‧‧Parts covered by molten glass 12

314‧‧‧氧化錫粒子 314‧‧‧ tin oxide particles

320‧‧‧浴槽 320‧‧‧ bath

322‧‧‧底部磚 322‧‧‧Bottom brick

323‧‧‧側面磚 323‧‧‧Side brick

324‧‧‧上部側壁 324‧‧‧ upper side wall

326‧‧‧頂棚 326‧‧‧ shed

327‧‧‧空間(露出部分之上方空間) 327‧‧‧ Space (space above the exposed part)

328‧‧‧空間(處理空間) 328‧‧‧ Space (processing space)

329‧‧‧剩餘空間 329‧‧‧ remaining space

340‧‧‧隔離壁 340‧‧‧ partition wall

341‧‧‧頂棚部 341‧‧‧ Ceiling Department

342‧‧‧側壁部 342‧‧‧ Sidewall

343‧‧‧對向壁部 343‧‧‧ facing wall

346‧‧‧供給管 346‧‧‧Supply tube

347‧‧‧供給口 347‧‧‧ supply port

H‧‧‧頂棚部341與露出部分311之間之間隔 H‧‧‧Interval between the ceiling portion 341 and the exposed portion 311

Y1‧‧‧隔離壁340之自側面磚323突出之部分的Y方向尺寸 Y1‧‧ ‧ dimensions of the partition wall 340 from the side of the side brick 323 protruding in the Y direction

Y2‧‧‧側面磚323與熔融玻璃310之間之Y方向尺寸 Y2‧‧‧Y direction dimension between side brick 323 and molten glass 310

Claims (8)

一種浮式玻璃之成形裝置,其係具備容納熔融錫之浴槽並使連續地供給至上述熔融錫上之熔融玻璃於上述熔融錫上流動而成形者,且上述熔融錫之上表面含有未被上述熔融玻璃覆蓋之露出部分,設置有將該露出部分之上方空間隔離成複數個空間之隔離壁,該隔離壁包括:頂棚部,其於與上述露出部分之間形成空間;及側壁部,其沿上述熔融玻璃之側緣之至少一部分自上述露出部分之上方插入至上述熔融錫中。 A molding apparatus for a floating glass, comprising: a bath that contains molten tin and a molten glass that is continuously supplied onto the molten tin flows on the molten tin, and the surface of the molten tin is not contained above The exposed portion of the molten glass cover is provided with a partition wall separating the space above the exposed portion into a plurality of spaces, the partition wall comprising: a ceiling portion forming a space between the exposed portion and the sidewall portion; At least a part of the side edge of the molten glass is inserted into the molten tin from above the exposed portion. 如請求項1之浮式玻璃之成形裝置,其中上述隔離壁上連接有自形成於上述頂棚部與上述露出部分之間之空間之外部向內部供給還原性氣體的供給管。 The apparatus for forming a floating glass according to claim 1, wherein the partition wall is connected to a supply pipe for supplying a reducing gas to the inside from a space formed between the ceiling portion and the exposed portion. 如請求項1或2之浮式玻璃之成形裝置,其中上述隔離壁上連接有將形成於上述頂棚部與上述露出部分之間之空間中之氣體向上述成形裝置之外部排出的排氣管。 The apparatus for forming a floating glass according to claim 1 or 2, wherein the partition wall is connected to an exhaust pipe that discharges a gas formed in a space between the ceiling portion and the exposed portion to the outside of the forming device. 如請求項2之浮式玻璃之成形裝置,其中上述還原性氣體包含氫氣(H2)。 A forming apparatus for a floating glass according to claim 2, wherein said reducing gas contains hydrogen (H 2 ). 如請求項1至4中任一項之浮式玻璃之成形裝置,其中上述隔離壁由碳形成。 The apparatus for forming a floating glass according to any one of claims 1 to 4, wherein the partition wall is formed of carbon. 如請求項5之浮式玻璃之成形裝置,其中上述隔離壁上形成有抗氧化膜。 The apparatus for forming a floating glass according to claim 5, wherein the partition wall is formed with an oxidation resistant film. 如請求項1至6中任一項之浮式玻璃之成形裝置,其中上述隔離壁為多孔質且具有透氣性,或具有將由上述隔離壁隔離成之上 述複數個空間連通之開口部。 A forming apparatus for a floating glass according to any one of claims 1 to 6, wherein said partition wall is porous and gas permeable, or has a partition which is to be separated by said partition wall A plurality of openings that communicate with each other are described. 一種浮式玻璃之製造方法,其係使用如請求項1至7中任一項之浮式玻璃之成形裝置製造板玻璃。 A method of producing a floating glass, which is produced by using a forming apparatus for a floating glass according to any one of claims 1 to 7.
TW102117619A 2012-05-28 2013-05-17 Device for molding float glass, and method for producing float glass TW201350448A (en)

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WO2019093231A1 (en) * 2017-11-07 2019-05-16 Agc株式会社 Method for producing float glass, and apparatus for producing float glass
CN108863025A (en) * 2018-09-25 2018-11-23 台玻安徽玻璃有限公司 A kind of float glass preparation facilities and the method for preparing float glass using the device

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GB1103276A (en) * 1964-03-13 1968-02-14 Pilkington Brothers Ltd Improvements in or relating to the manufacture of flat glass
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