TW201348356A - Anti-reflection composition and its manufacturing process and uses - Google Patents
Anti-reflection composition and its manufacturing process and uses Download PDFInfo
- Publication number
- TW201348356A TW201348356A TW101121125A TW101121125A TW201348356A TW 201348356 A TW201348356 A TW 201348356A TW 101121125 A TW101121125 A TW 101121125A TW 101121125 A TW101121125 A TW 101121125A TW 201348356 A TW201348356 A TW 201348356A
- Authority
- TW
- Taiwan
- Prior art keywords
- hollow
- hollow particles
- binder
- hydroxyl group
- group
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C215/00—Compounds containing amino and hydroxy groups bound to the same carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本發明係關於一種包含中空顆粒的組合物;特定言之,本發明係關於一種包含中空顆粒的抗反射組合物。 The present invention relates to a composition comprising hollow particles; in particular, the present invention relates to an antireflective composition comprising hollow particles.
反射光存在於二種具有不同折射率(refractive index)之介質的介面處。例如,空氣的折射率為1,玻璃基材及塑膠基材的折射率則為1.45至1.7之間,通常這些基材與空氣介面的反射光大約佔4%至6.5%。在光學元件,如照相機鏡頭、顯示器等成像系統中,光的反射不僅會減少成像強度,還會在像平面造成雜散光,使影像的襯度降低、解析度下降。在太陽能電池系統中,光的反射則會降低太陽能的利用率。 The reflected light is present at the interface of two media having different refractive indices. For example, the refractive index of air is 1, and the refractive index of the glass substrate and the plastic substrate is between 1.45 and 1.7. Generally, the reflected light of these substrates and the air interface accounts for about 4% to 6.5%. In optical components, such as camera lenses, monitors and other imaging systems, the reflection of light not only reduces the imaging intensity, but also causes stray light in the image plane, which reduces the contrast of the image and reduces the resolution. In solar cell systems, the reflection of light reduces the utilization of solar energy.
初期,業界大多會在欲消除反射光的基材表面塗覆單層薄膜作為抗反射薄膜,控制該薄膜材料的折射率及薄膜厚度為一定值,使入射光在該薄膜上、下表面(二側)的反射光產生相消性干涉,達到抗反射效果。具體言之,要產生相消性干涉現象必須滿足以下二條件:條件一,薄膜二側反射光的振幅需相同,即n0/nf=nf/ns或nf=(n0.ns)0.5(其中n0、nf、及ns分別為空氣、薄膜、及基材的折射率);條件二,光程(optical path)滿足反射光相干涉,即薄膜的最小厚度滿足光在介質中之光程的1/4。其中,要滿足條件一,薄膜材料的折射率應低至一定值,例如,在可見光區使用最為普遍的玻璃基材或聚合物基材的折射率約為1.5,當入射介質為空氣時,膜層的折射率應低至約1.23。然而,自然界中存 在的折射率最低的均相固體物質為冰,其折射率仍高達1.35,因此,以往使用單層膜結構常常無法獲得理想的減少反射光的效果。 In the early stage, most of the industry will apply a single-layer film as an anti-reflective film on the surface of the substrate to eliminate reflected light, and control the refractive index and film thickness of the film material to a certain value, so that incident light is on the upper and lower surfaces of the film (two The reflected light from the side produces destructive interference to achieve an anti-reflective effect. Specifically, to produce destructive interference, the following two conditions must be met: Condition 1, the amplitude of the reflected light on both sides of the film needs to be the same, that is, n 0 /n f =n f /n s or n f =(n 0 . n s ) 0.5 (where n 0 , n f , and n s are the refractive indices of air, film, and substrate, respectively); Condition 2, the optical path satisfies the interference of the reflected light phase, that is, the minimum thickness of the film satisfies Light is 1/4 of the optical path in the medium. Wherein, to satisfy the condition 1, the refractive index of the film material should be as low as a certain value. For example, the most common glass substrate or polymer substrate used in the visible light region has a refractive index of about 1.5, and when the incident medium is air, the film The refractive index of the layer should be as low as about 1.23. However, the lowest-index homogeneous solid material existing in nature is ice, and its refractive index is still as high as 1.35. Therefore, the conventional use of a single-layer film structure often fails to obtain an ideal effect of reducing reflected light.
為解決上述問題,另有許多關於抗反射結構的研究,包含如使用等離子蝕刻技術製備梯度漸變的抗反射結構(可參見US 7,858,293)、及多層膜的抗反射結構(可參見CN 101431110 A及CN 101793981 A)等;此等技術雖能獲得良好的抗反射效果,但由於其結構非常複雜、生產成本過高,因此在實際應用上受到限制;再者,抗反射通常應用在需要大面積的結構,這些抗反射結構的製造方法很難滿足實際需求。另有一些先前的研究係使用奈米顆粒提供一層具有多孔結構的薄膜(可參見CN 101638297 A及CN 101280155),利用顆粒之間的孔隙獲得較低的折射率及較佳的抗反射效果,但是由於顆粒與基材之間係屬於「點」與「面」的接觸方式,因此造成所形成薄膜的耐磨性、耐刮擦性不佳,影響薄膜的應用。 In order to solve the above problems, there are many other studies on anti-reflection structures, including the preparation of gradient-graded anti-reflective structures using plasma etching techniques (see US 7,858,293), and anti-reflective structures of multilayer films (see CN 101431110 A and CN). 101793981 A) etc. Although these techniques can obtain good anti-reflection effects, they are limited in practical applications due to their complicated structure and high production cost. Furthermore, anti-reflection is usually applied to structures requiring a large area. These methods of manufacturing anti-reflective structures are difficult to meet practical needs. Other previous studies have used nanoparticle to provide a thin film with a porous structure (see CN 101638297 A and CN 101280155), which uses the pores between the particles to obtain a lower refractive index and better anti-reflection effect, but Since the contact between the particles and the substrate is a "point" and a "face", the abrasion resistance and scratch resistance of the formed film are poor, which affects the application of the film.
鑒於此,本發明提供一種經改良之抗反射組合物,其生產成本低,且可透過簡單的施用步驟,形成具有優良耐磨性與耐刮擦性以及低折射率的塗層,利於用作抗反射薄膜。 In view of this, the present invention provides an improved anti-reflective composition which is low in production cost and which can form a coating having excellent abrasion resistance and scratch resistance and a low refractive index through a simple application step, and is advantageously used as a coating. Anti-reflective film.
本發明之一目的在於提供一種抗反射組合物,包含一表面具有羥基基團之中空顆粒,具有約10奈米至約200奈米之平均粒徑與約10%至約90%之中空部分的孔隙率,且該羥基基團之密度大於約2%;以及一黏結劑,具有可與該羥基基團形成化學鍵結的基團。 It is an object of the present invention to provide an antireflective composition comprising hollow particles having a hydroxyl group on the surface, having an average particle diameter of from about 10 nm to about 200 nm and a hollow portion of from about 10% to about 90%. Porosity, and the density of the hydroxyl group is greater than about 2%; and a binder having a group that can form a chemical bond with the hydroxyl group.
本發明之另一目的在於提供一種製備抗反射組合物的方法,包 括:(a)提供一表面具有羥基基團之中空顆粒;(b)提供一黏結劑,具有可與該羥基基團形成化學鍵結的基團;(c)混合該中空顆粒與該黏結劑以提供一混合物;以及(d)視需要地,於一視需要之催化劑及/或水存在下維持該混合物之溫度於約0℃至約100℃,使該中空顆粒表面之該羥基基團與該黏結劑之該基團反應形成化學鍵結。 Another object of the present invention is to provide a method for preparing an antireflection composition, which comprises Included: (a) providing a hollow particle having a hydroxyl group on the surface; (b) providing a binder having a group capable of forming a chemical bond with the hydroxyl group; (c) mixing the hollow particle with the binder Providing a mixture; and (d) optionally maintaining the temperature of the mixture at a temperature of from about 0 ° C to about 100 ° C in the presence of a desired catalyst and/or water such that the hydroxyl group on the surface of the hollow particle The group of the binder reacts to form a chemical bond.
本發明之又一目的在於提供一種抗反射片,包含一薄膜以及一基材,其中該薄膜係位於該基材之至少一表面上且係由如上所述之抗反射組合物所形成。 It is still another object of the present invention to provide an antireflection sheet comprising a film and a substrate, wherein the film is on at least one surface of the substrate and is formed of an antireflective composition as described above.
本發明之詳細技術及較佳實施態樣,將描述於以下內容中,以供本發明所屬領域具通常知識者據以明瞭本發明之特徵。 The detailed description of the present invention and the preferred embodiments thereof will be described in the following description.
在不背離本發明之精神下,除以下具體描述之部分具體實施態樣,本發明尚可以多種不同形式之態樣來實踐,不應將本發明保護範圍解釋為限於說明書所陳述者。此外,除非文中有另外說明,於本說明書中(尤其是在後述專利申請範圍中)所使用之「一」、「該」及類似用語應理解為包含單數及複數形式。此外,於本文中,「化學鍵結」係指原子間相互作用,使它們穩定聚在一起,特別是指具有共價鍵結的形式。 The present invention may be embodied in a variety of different forms without departing from the spirit and scope of the invention. In addition, the terms "a", "an" and "the" Further, as used herein, "chemical bonding" refers to interatomic interactions that cause them to be stably brought together, particularly in the form of covalent bonding.
本發明的抗反射組合物包含一表面具有羥基基團之中空顆粒,及一具有可與該羥基基團形成化學鍵結之基團的黏結劑。當本發明之抗反射組合物施用於一基材表面形成一薄膜時,中空顆粒的中空結構可使該薄膜具有較低的折射率及較高的透光性;此外, 該中空顆粒與該黏結劑之間可形成化學鍵結,增強中空顆粒彼此之間以及中空顆粒與基材之間的結合力,使所形成的薄膜具有適當的強度。 The antireflective composition of the present invention comprises a hollow particle having a hydroxyl group on its surface, and a binder having a group capable of forming a chemical bond with the hydroxyl group. When the antireflective composition of the present invention is applied to a surface of a substrate to form a film, the hollow structure of the hollow particles enables the film to have a lower refractive index and a higher light transmittance; A chemical bond may be formed between the hollow particles and the binder to enhance the bonding force between the hollow particles and the hollow particles and the substrate, so that the formed film has an appropriate strength.
如前述,本發明之抗反射組合物特別有用於形成一抗反射薄膜,故其組成及用量與所形成薄膜的所欲特性(如折射率、耐磨性等)之間存在相當程度的關聯性,以下將詳細說明。 As described above, the antireflection composition of the present invention is particularly useful for forming an antireflection film, so that its composition and amount are highly correlated with the desired properties of the formed film (e.g., refractive index, abrasion resistance, etc.). , the details will be explained below.
根據本發明之抗反射組合物,該中空顆粒的平均粒徑一般為約10奈米至約200奈米,較佳為約20奈米至約100奈米。咸知,中空顆粒的粒徑會影響所形成薄膜的厚度;又如前述,要在基材表面形成一具有理想抗反射效果之薄膜的條件之一為,薄膜的最小厚度滿足光在介質中之光程的1/4。以波長最長的紅光(波長為約800奈米)為例,形成薄膜的厚度就不宜超過約200奈米,故亦不宜使用平均粒徑超過約200奈米的中空顆粒。另一方面,當中空顆粒的平均粒徑小於約10奈米時,中空顆粒之間容易凝集而使所形成薄膜的厚度不均,造成抗反射效果不佳。 According to the antireflective composition of the present invention, the hollow particles generally have an average particle diameter of from about 10 nm to about 200 nm, preferably from about 20 nm to about 100 nm. It is known that the particle size of the hollow particles affects the thickness of the formed film; as mentioned above, one of the conditions for forming a film having a desired antireflection effect on the surface of the substrate is that the minimum thickness of the film satisfies the light in the medium. 1/4 of the optical path. Taking the longest wavelength of red light (wavelength of about 800 nm) as an example, the thickness of the formed film should not exceed about 200 nm, so it is not suitable to use hollow particles having an average particle diameter of more than about 200 nm. On the other hand, when the average particle diameter of the hollow particles is less than about 10 nm, the hollow particles are easily aggregated to make the thickness of the formed film uneven, resulting in poor antireflection effect.
所形成薄膜的折射率可由下式(1)表示:nf=np.Vp+nb.Vb+n0.ε (1)其中,nf、np、nb、及n0分別為薄膜、組成中空顆粒之材料、黏結劑、及空氣的折射率;Vp為顆粒的體積含量(不含中空部分);Vb為黏結劑的體積含量;ε為薄膜的孔隙率。由式(1)可知,所形成薄膜的折射率與組成中空顆粒材料的折射率與使用量、黏結劑的折射率與使用量、以及薄膜的孔隙率有關,可藉由調整此等參數,提供具有所欲折射率的薄膜。 The refractive index of the formed film can be expressed by the following formula (1): n f = n p . V p +n b . V b +n 0 . ε (1) wherein n f , n p , n b , and n 0 are the refractive index of the film, the material constituting the hollow particles, the binder, and air, respectively; V p is the volume content of the particles (excluding the hollow portion) V b is the volume content of the binder; ε is the porosity of the film. It can be seen from the formula (1) that the refractive index of the formed film is related to the refractive index and the amount of the constituent hollow particle material, the refractive index and the amount of the binder, and the porosity of the film, which can be provided by adjusting these parameters. A film having a desired refractive index.
概言之,當中空顆粒與黏結劑之組成及體積含量固定時,中空顆粒之中空部分的孔隙率(係指中空顆粒之中空部份體積相對於中空顆粒之全部體積的比率)越大,所形成之薄膜的折射率越低。根據本發明之一具體實施態樣,該中空顆粒之中空部分係具有約10%至約90%之孔隙率,較佳為約20%至約80%之孔隙率;另一方面,該中空顆粒之中空部分可具有約20奈米至約60奈米的平均孔徑。 In summary, when the composition and volume content of the hollow particles and the binder are fixed, the porosity of the hollow portion of the hollow particles (referring to the ratio of the volume of the hollow portion of the hollow particles to the total volume of the hollow particles) is larger. The lower the refractive index of the formed film. According to an embodiment of the present invention, the hollow portion of the hollow particle has a porosity of from about 10% to about 90%, preferably from about 20% to about 80%; and on the other hand, the hollow particle The hollow portion can have an average pore size of from about 20 nanometers to about 60 nanometers.
根據前述獲得理想抗反射效果的條件nf=(ns.n0)0.5,所形成薄膜的折射率亦與所用基材材料的折射率有關,亦即中空顆粒材料的選擇可視基材材料的折射率而定(根據上式(1))。具體言之,於相關業界中,通常會使用玻璃基材、聚甲基丙烯酸甲酯基材、聚碳酸酯基材、或聚對苯二甲酸乙二酯基材等作為抗反射薄膜的基材,此等基材的折射率為約1.4至約1.6之間,在藉由單層塗膜之情況下,所形成薄膜的折射率需為約1.2至約1.3之間(nf=(ns.n0)0.5);再根據上式(1),當黏結劑之組成與體積含量及薄膜之孔隙率固定時,要獲得較低的薄膜折射率,應選擇折射率較低的材料製備中空顆粒。因此,於本發明組合物之一具體實施態樣中,該中空顆粒的材料係選自以下群組:二氧化矽、有機矽烷、及前述之組合,該等材料具有低於1.4的折射率,且易於製得奈米尺寸的中空顆粒。 According to the foregoing condition for obtaining an ideal anti-reflection effect n f = (n s .n 0 ) 0.5 , the refractive index of the formed film is also related to the refractive index of the substrate material used, that is, the selection of the hollow particle material can be regarded as the substrate material. Depending on the refractive index (according to the above formula (1)). Specifically, in the related art, a glass substrate, a polymethyl methacrylate substrate, a polycarbonate substrate, or a polyethylene terephthalate substrate or the like is generally used as a substrate of an antireflection film. The refractive index of such substrates is between about 1.4 and about 1.6. In the case of a single layer coating, the refractive index of the formed film needs to be between about 1.2 and about 1.3 (n f = (n s ) .n 0 ) 0.5 ); according to the above formula (1), when the composition and volume of the binder and the porosity of the film are fixed, to obtain a lower refractive index of the film, a material with a lower refractive index should be selected to prepare a hollow. Particles. Therefore, in one embodiment of the composition of the present invention, the material of the hollow particles is selected from the group consisting of cerium oxide, organic decane, and combinations thereof, having a refractive index lower than 1.4. And it is easy to produce hollow particles of nanometer size.
此外,該中空顆粒的粒徑均勻性亦與所形成之抗反射薄膜的性能有關。使用包含粒徑較均勻之中空顆粒的抗反射組合物,施用後所形成薄膜的厚度與折射率均相對地一致,因此薄膜之抗反射 性亦較為穩定。於本發明之一具體實施態樣中,所用中空顆粒粒徑的多分散係數(Dv/Dn,Dv為體積平均粒徑,Dn為平均粒徑)係小於約1.05。 Further, the particle size uniformity of the hollow particles is also related to the properties of the formed antireflection film. Using an antireflective composition comprising hollow particles having a relatively uniform particle size, the thickness and refractive index of the film formed after application are relatively uniform, and thus the antireflection of the film Sex is also relatively stable. In one embodiment of the present invention, the polydispersity coefficient (Dv/Dn, Dv is a volume average particle diameter, and Dn is an average particle diameter) of the particle diameter of the hollow particles used is less than about 1.05.
可用於本發明抗反射組合物之中空顆粒的外形可包含但不限於球狀、橢球狀、或花生狀等,其中,該中空顆粒的外形可藉由製備過程進行控制。 The shape of the hollow particles which can be used in the antireflection composition of the present invention may include, but is not limited to, spherical, ellipsoidal, or peanut-shaped, etc., wherein the shape of the hollow particles can be controlled by a preparation process.
於習知技術中,通常會對中空顆粒的表面進行化學修飾,例如以具有飽和或不飽和之烴基、巰基、胺基、環氧基等基團的矽烷偶聯劑,具體例子如甲基三甲氧基矽烷、乙烯基三乙氧基矽烷、3-巰丙基三甲氧基矽烷、胺丙基三乙氧基矽烷、3-(甲基丙烯醯氧)丙基三甲氧基矽烷、2,3-環氧丙氧丙基三甲氧基矽烷等。但對如二氧化矽等中空顆粒的表面進行修飾後,會降低顆粒表面的羥基含量,進而影響中空顆粒與黏結劑之間的相互作用,此影響將於下段中說明。 In the prior art, the surface of the hollow particles is usually chemically modified, for example, a decane coupling agent having a saturated or unsaturated hydrocarbon group, a mercapto group, an amine group, an epoxy group or the like, and a specific example is methyl trimethyl. Oxy decane, vinyl triethoxy decane, 3-mercaptopropyltrimethoxy decane, amine propyl triethoxy decane, 3-(methacryl oxirane) propyl trimethoxy decane, 2, 3 - glycidoxypropyltrimethoxydecane, and the like. However, modification of the surface of hollow particles such as cerium oxide reduces the hydroxyl content on the surface of the particles, which in turn affects the interaction between the hollow particles and the binder. This effect will be explained in the next paragraph.
用於本發明抗反射組合物中之中空顆粒的表面係含有特定數量的羥基基團,未經上述表面化學修飾。同時,本發明之抗反射組合物除包含該中空顆粒之外,另包含一黏結劑,係用與該中空顆粒表面的羥基基團形成化學鍵結,特別是形成共價鍵結,如-O-、-COO-等。於不受理論限制下,咸信藉由中空顆粒與黏結劑之間形成化學鍵結,可避免中空顆粒發生團聚(凝集)現象,使中空顆粒均勻地分散在黏結劑中,避免後續形成的薄膜出現泛白現象,同時可提高中空顆粒之間以及所形成之薄膜與基材間的相互作用,增強所形成薄膜的耐磨性、耐刮擦性等。 The surface of the hollow particles used in the antireflective composition of the present invention contains a specific amount of hydroxyl groups which are not chemically modified by the above surface. Meanwhile, the anti-reflective composition of the present invention comprises, in addition to the hollow particles, a binder which forms a chemical bond with a hydroxyl group on the surface of the hollow particle, in particular, forms a covalent bond, such as -O- , -COO-, etc. Without being bound by theory, Xianxin can form a chemical bond between the hollow particles and the binder to avoid agglomeration (aggregation) of the hollow particles, so that the hollow particles are uniformly dispersed in the binder to avoid the subsequent formation of the film. The whitening phenomenon can simultaneously improve the interaction between the hollow particles and the formed film and the substrate, and enhance the abrasion resistance, scratch resistance and the like of the formed film.
因此,根據本發明之抗反射組合物,該中空顆粒表面之羥基基團的密度通常大於約2%,較佳大於約2.2%。如同前述,若羥基基團密度太低,不利於中空顆粒與黏結劑之間的作用,會降低所形成薄膜的性能。 Thus, in accordance with the antireflective compositions of the present invention, the density of the hydroxyl groups on the surface of the hollow particles is typically greater than about 2%, preferably greater than about 2.2%. As described above, if the density of the hydroxyl group is too low, it is disadvantageous for the action between the hollow particles and the binder, which lowers the properties of the formed film.
可用於本發明之黏結劑具有可與羥基基團形成化學鍵結的基團,前述的基團可選自以下群組:-OH、-COOH、-CNH、-CONH-、-NCO、及前述之組合,可與該羥基基團形成化學鍵結。適用於本發明之黏結劑可包含但不限於:有機矽樹脂、經改性的有機矽樹脂、無機矽溶膠、或其組合,上述的有機矽樹脂,例如,由氯矽烷、烷氧基矽烷或其混合物水解縮聚形成之具有網狀結構的聚有機矽氧烷(如甲基矽樹脂、苯基矽樹脂、甲基苯基矽樹脂)、或由單官能鏈節(R3SiO0.5)及四官能鏈節(SiO2)組成的MQ樹脂;上述的經改性的有機矽樹脂,如經環氧、聚酯、聚胺酯、酚醛等改性者;上述的無機矽溶膠,如酸催化形成的二氧化矽溶膠。 The binder useful in the present invention has a group capable of forming a chemical bond with a hydroxyl group, and the aforementioned group may be selected from the group consisting of -OH, -COOH, -CNH, -CONH-, -NCO, and the foregoing In combination, a chemical bond can be formed with the hydroxyl group. The binder suitable for use in the present invention may include, but is not limited to, an organic oxime resin, a modified organic oxime resin, an inorganic cerium sol, or a combination thereof, and the above organic oxime resin, for example, from chlorodecane, alkoxy decane or a polyorganosiloxane having a network structure formed by hydrolyzing polycondensation of the mixture (such as methyl hydrazine resin, phenyl hydrazine resin, methyl phenyl hydrazine resin), or a monofunctional chain segment (R 3 SiO 0.5 ) and four An MQ resin composed of a functional chain (SiO 2 ); a modified organic oxime resin as described above, such as an epoxy, polyester, polyurethane, phenolic or the like; and the above-mentioned inorganic cerium sol, such as an acid catalyzed Oxide sol.
根據本發明之抗反射組合物,以100重量份之該黏結劑計,該中空顆粒之含量可為約1重量份至約20重量份,較佳為4重量份至約15重量份。若中空顆粒的比例過低,無法有效降低所形成薄膜的折射率;反之若過高,則所形成的薄膜因密著性不足而易損壞。 According to the antireflection composition of the present invention, the hollow particles may be included in an amount of from about 1 part by weight to about 20 parts by weight, based on 100 parts by weight of the binder, preferably from 4 parts by weight to about 15 parts by weight. If the proportion of the hollow particles is too low, the refractive index of the formed film cannot be effectively lowered; if it is too high, the formed film is easily damaged due to insufficient adhesion.
根據本發明之一具體實施態樣,於該抗反射組合物中,該中空顆粒表面之至少一部份該羥基基團與該該黏結劑之至少一部份該基團形成化學鍵結,特別是共價鍵結。 According to an embodiment of the present invention, in the antireflective composition, at least a portion of the hydroxyl group on the surface of the hollow particle forms a chemical bond with at least a portion of the group of the binder, particularly Covalent bond.
視需要,本發明的抗反射組合物包含任何本領域中具有通常知 識者所知的添加劑,根據本發明的抗反射組合物,以100重量份的上述黏結劑計,添加劑的含量可為約0重量份至約20重量份。上述的添加劑根據其使用需求與用途可包含:可在施用過程(如塗佈)期間維持組合物一定黏度的增稠劑(例如包含但不限於:乙二醇、丙三醇、黃原膠、聚乙烯醇、聚乙二醇);可幫助中空顆粒在黏結劑中均勻分散的分散劑(例如包含但不限於:聚丙烯酸、聚乙烯醇、聚乙二醇);分散劑(例如包含但不限於:聚丙烯酸、聚乙烯醇、聚乙二醇、苯甲酸鈉);架橋劑(例如包含但不限於聚異氰酸酯類);合成中空顆粒或黏結劑過程中使用的溶劑(例如包含但不限於:水、乙醇、異丙醇、甲苯);合成黏結劑過程中使用的無機酸催化劑(例如包含但不限於:鹽酸、硫酸、磷酸)、有機酸或酸酐催化劑(例如包含但不限於:醋酸、醋酸酐、檸檬酸)、無機鹼催化劑(例如包含但不限於:氨水、氫氧化鈉、氫氧化鉀)、無機鹽催化劑(例如包含但不限於:氯化銨、硫酸銨、氯化鈉、硫酸鈉);使中空顆粒與黏結劑之間形成化學鍵結時使用的無機酸催化劑(例如包含但不限於:鹽酸、硫酸、磷酸)、有機酸或酸酐催化劑(例如包含但不限於:醋酸、醋酸酐、檸檬酸)、無機鹼催化劑(例如包含但不限於:氨水、氫氧化鈉、氫氧化鉀)、無機鹽催化劑(例如包含但不限於:氯化銨、硫酸銨、氯化鈉、硫酸鈉)。 The antireflective composition of the present invention includes any conventional knowledge in the art, as needed The additive known in the art, according to the antireflective composition of the present invention, may be included in an amount of from about 0 part by weight to about 20 parts by weight based on 100 parts by weight of the above-mentioned binder. The above additives may include, depending on their use requirements and uses, thickeners that maintain a certain viscosity of the composition during the application process (eg, coating) (eg, including but not limited to: ethylene glycol, glycerol, xanthan gum, Polyvinyl alcohol, polyethylene glycol); a dispersant that can help the hollow particles to be uniformly dispersed in the binder (for example, including but not limited to: polyacrylic acid, polyvinyl alcohol, polyethylene glycol); a dispersing agent (for example, including but not Limited to: polyacrylic acid, polyvinyl alcohol, polyethylene glycol, sodium benzoate); bridging agents (such as, but not limited to, polyisocyanates); solvents used in the synthesis of hollow particles or binders (including but not limited to: water) , ethanol, isopropanol, toluene); inorganic acid catalysts used in the synthesis of binders (including but not limited to: hydrochloric acid, sulfuric acid, phosphoric acid), organic acid or anhydride catalysts (for example including but not limited to: acetic acid, acetic anhydride , citric acid), inorganic base catalyst (including but not limited to: ammonia, sodium hydroxide, potassium hydroxide), inorganic salt catalyst (for example including but not limited to: ammonium chloride, ammonium sulfate, sodium chloride, Sodium sulfate); a mineral acid catalyst (for example, including but not limited to: hydrochloric acid, sulfuric acid, phosphoric acid), an organic acid or an acid anhydride catalyst (for example, including but not limited to: acetic acid, acetic acid) used to form a chemical bond between the hollow particles and the binder. Anhydride, citric acid), inorganic base catalysts (including, but not limited to, ammonia, sodium hydroxide, potassium hydroxide), inorganic salt catalysts (including, but not limited to, ammonium chloride, ammonium sulfate, sodium chloride, sodium sulfate) ).
本發明亦提供一種製備抗反射組合物的方法,包括(a)提供一表面具有羥基基團之中空顆粒;(b)提供一黏結劑,具有可與該羥基基團形成化學鍵結的基團;(c)混合該中空顆粒與該黏結劑以提供一混合物;以及(d)視需要地,於一視需要之催化劑及/或水存在下維持該混合物之溫度於約0℃至約100℃,使該中空顆 粒表面之該羥基基團與該黏結劑之該基團反應形成化學鍵結。其中,可用於本發明方法中的中空顆粒與黏結劑的種類與特性,係如上文所述。 The present invention also provides a method of preparing an antireflective composition comprising (a) providing a hollow particle having a hydroxyl group on a surface thereof; (b) providing a binder having a group capable of forming a chemical bond with the hydroxyl group; (c) mixing the hollow particles with the binder to provide a mixture; and (d) optionally maintaining the temperature of the mixture at a temperature of from about 0 ° C to about 100 ° C in the presence of a desired catalyst and/or water, Make the hollow The hydroxyl group on the surface of the particle reacts with the group of the binder to form a chemical bond. Among them, the types and characteristics of the hollow particles and the binder which can be used in the method of the present invention are as described above.
適用於提供該中空顆粒的方法係根據組成中空顆粒之材料及種類而定,並無特殊限制。根據本發明之一具體實施態樣,該中空顆粒可以如下操作提供:提供一模板(template),其係由聚電解質所形成的膠束;沉澱一矽烷類前驅體於該模板上;以及移除該模板,以獲得該中空顆粒。以提供二氧化矽中空顆粒為例,混合如聚丙烯酸、聚丙烯酸鈉、聚丙烯胺鹽酸鹽之聚電解質與如乙醇、異丙醇等極性溶劑以形成膠束作為模板,再沉澱如正矽酸甲酯、正矽酸乙酯、矽酸鈉之矽烷前驅體在該模板上,之後洗滌去除該模板而獲得中空結構的二氧化矽中空顆粒。再以提供有機矽烷中空顆粒為例,如前述提供二氧化矽中空顆粒的程序,惟改使用如四甲氧基矽烷、四乙氧基矽烷(TEOS)、甲基三乙氧基矽烷、甲基三甲氧基矽烷、乙烯基三甲氧基矽烷、苯基三乙氧基矽烷之有機矽倍半氧烷(silsesquioxane)作為矽烷前驅體。 The method suitable for providing the hollow particles is determined depending on the materials and kinds of the hollow particles, and is not particularly limited. According to an embodiment of the present invention, the hollow particles may be provided by providing a template which is a micelle formed of a polyelectrolyte; depositing a decane precursor on the template; and removing The template is obtained to obtain the hollow particles. Taking the hollow particles of cerium oxide as an example, a polyelectrolyte such as polyacrylic acid, sodium polyacrylate, polyacrylamine hydrochloride, and a polar solvent such as ethanol or isopropyl alcohol are mixed to form a micelle as a template, and reprecipitation is performed as a template. The decane precursor of acid methyl ester, ethyl orthosilicate, sodium citrate is on the template, and then the template is washed to remove hollow cerium oxide hollow particles. Further, as an example of providing an organic decane hollow particle, as described above, a procedure for providing cerium oxide hollow particles is used, except for using, for example, tetramethoxy decane, tetraethoxy decane (TEOS), methyl triethoxy decane, methyl The organosilsesquioxane of trimethoxydecane, vinyltrimethoxydecane, and phenyltriethoxydecane is used as a decane precursor.
於本發明方法中,可於製備過程控制該中空顆粒的粒徑、粒徑均勻性和中空部分的孔徑。舉例言之,可藉由調整聚電解質的分子量、用量、以及分散速率,控制所形成膠束(模板)的尺寸及均勻性,從而控制所得中空顆粒之中空部分的孔隙率;而藉由調整膠束(模板)尺寸及矽烷前驅物的用量,則可控制所提供中空顆粒的粒徑。 In the method of the present invention, the particle size, particle size uniformity, and pore diameter of the hollow portion of the hollow particle can be controlled in the preparation process. For example, the size and uniformity of the formed micelles (templates) can be controlled by adjusting the molecular weight, the amount, and the dispersion rate of the polyelectrolyte, thereby controlling the porosity of the hollow portion of the obtained hollow particles; The size of the bundle (template) and the amount of the decane precursor control the particle size of the hollow particles provided.
本發明方法之步驟(b)係在於提供一具有可與該羥基基團形成 化學鍵結的基團的黏結劑,此步驟(b)係視黏結劑種類而有所不同;而如上文所提,可用於本發明中之黏結劑包含有機矽樹脂、經改性的有機矽樹脂、無機矽溶膠、或前述之組合等。 Step (b) of the method of the present invention consists in providing a layer which can form with the hydroxyl group The bonding agent of the chemically bonded group, the step (b) differs depending on the kind of the binder; and as mentioned above, the binder which can be used in the present invention comprises an organic oxime resin, a modified organic oxime resin , inorganic cerium sol, or a combination of the foregoing.
以提供有機矽樹脂黏結劑為例,可在有機溶劑(如甲苯)存在且在一較低溫度的條件下,將水加入帶有氯原子的烷基矽烷(如甲基三氯矽烷、二甲基二氯矽烷、乙烯基三氯矽烷、二乙烯基二氯矽烷)、帶有氯原子的苯基矽烷(如苯基三氯矽烷、二苯基二氯矽烷)、帶有氯原子的烷基苯基矽烷(如甲基苯基二氯矽烷、乙烯基苯基二氯矽烷)、或前述的混合物中,反應得到酸性水解產物,之後再於一加熱條件下或一催化劑存在的條件下,使該水解產物進一步縮聚形成高度交聯之具有網狀結構的聚有機矽氧烷。有機矽樹脂黏結劑亦可經由將帶有烷氧基的烷基矽烷、帶有烷氧基的苯基矽烷、或其混合物,在酸或非酸催化劑存在的條件下與水進行反應而形成。例如,將甲基三乙氧基矽烷溶於乙醇中,於酸催化條件下與水進行反應,聚合成透明的聚甲基三乙氧基倍半矽氧烷樹脂。乙烯基三乙氧基矽烷與苯基三乙氧基矽烷的混合物在酸催化條件下與水進行反應形成聚有機矽倍半氧烷的複合有機矽樹脂。單官能鏈節(R3SiO0.5)及四官能鏈節(SiO2)組成的MQ樹脂,可由四乙氧基矽烷與六甲基二矽氧烷在酸催化的條件下共水解縮聚得到。至於經改性的有機矽樹脂,如環氧改性的有機矽樹脂,通常是將改性基團作為封端或共聚物,並與聚矽氧烷形成雜化有機矽樹脂。無機矽溶膠,如高度交聯的二氧化矽溶膠,則可經由四乙氧基矽烷在酸催化下水解縮聚形成。其中,可使用之催化劑的種類如上文中所提。 In the case of providing an organic tantalum resin binder, water may be added to an alkyl decane having a chlorine atom (such as methyltrichloromethane or dimethyl ester in the presence of an organic solvent such as toluene and at a relatively low temperature. a chlorinated phenyl decane (such as phenyl trichloro decane, diphenyl chlorocycloalkane), an alkyl group having a chlorine atom, a chlorinated phenyl decane (such as phenyl trichloro decane) a phenyl decane (such as methyl phenyl dichloro decane, vinyl phenyl dichloro decane), or a mixture of the foregoing, which is reacted to obtain an acidic hydrolyzate, which is then subjected to a heating or a catalyst. The hydrolyzate is further polycondensed to form a highly crosslinked polyorganosiloxane having a network structure. The organic oxime resin binder can also be formed by reacting an alkyl alkane having an alkoxy group, a phenyl decane having an alkoxy group, or a mixture thereof with water in the presence of an acid or a non-acid catalyst. For example, methyltriethoxydecane is dissolved in ethanol and reacted with water under acid catalysis to polymerize into a transparent polymethyltriethoxysilsesquioxane resin. A mixture of vinyltriethoxydecane and phenyltriethoxydecane is reacted with water under acid catalysis to form a polyorganosilsesquioxane composite organic oxime resin. An MQ resin composed of a monofunctional chain link (R 3 SiO 0.5 ) and a tetrafunctional chain link (SiO 2 ) can be obtained by cohydrolysis polycondensation of tetraethoxynonane and hexamethyldioxane under acid catalysis. As for the modified organic oxime resin, such as an epoxy-modified organic oxime resin, a modifying group is usually used as a blocking or copolymer, and a hybrid organic oxime resin is formed with polysiloxane. Inorganic cerium sols, such as highly crosslinked cerium oxide sols, can be formed by hydrolysis under polycondensation of tetraethoxy decane under acid catalysis. Among them, the types of catalysts that can be used are as mentioned above.
本發明方法接著混合該中空顆粒與該黏結劑以提供混合物,一抗反射組合物,即步驟(c)。於步驟(c)後,本發明方法可更包含一步驟(d),於一視需要之催化劑及/或水存在下維持該混合物之溫度於約0℃至約100℃,較佳約60℃至約90℃,使該中空顆粒表面之該羥基基團與該黏結劑之該基團(如-OH、-COOH、-CNH、-CONH-、-NCO等)反應形成化學鍵結,特別是如-O-、-COO-等之共價鍵結。其中,可使用之催化劑的種類如上文中所提,例如可選自以下群組(但不限於):氫氯酸、硫酸、磷酸、醋酸、醋酸酐、檸檬酸、氨水、氫氧化鈉、氫氧化鉀、氯化銨、硫酸銨、氯化鈉、硫酸鈉、及前述之組合。 The method of the invention then mixes the hollow particles with the binder to provide a mixture, an anti-reflective composition, step (c). After the step (c), the method of the present invention may further comprise a step (d) of maintaining the temperature of the mixture at a temperature of from about 0 ° C to about 100 ° C, preferably about 60 ° C, in the presence of a desired catalyst and/or water. Up to about 90 ° C, the hydroxyl group on the surface of the hollow particle is reacted with the group of the binder (such as -OH, -COOH, -CNH, -CONH-, -NCO, etc.) to form a chemical bond, especially as Covalent bonding of -O-, -COO-, and the like. Wherein, the kind of the catalyst which can be used is as mentioned above, for example, may be selected from the following groups (but not limited to): hydrochloric acid, sulfuric acid, phosphoric acid, acetic acid, acetic anhydride, citric acid, ammonia water, sodium hydroxide, hydrogen hydroxide. Potassium, ammonium chloride, ammonium sulfate, sodium chloride, sodium sulfate, and combinations of the foregoing.
根據本發明之一具體實施態樣,可經由包含以下步驟來製備抗反射組合物:(a)提供一表面具有羥基基團之中空顆粒,及分散該中空顆粒於一第一溶劑中以提供一第一分散液;其中,該第一溶劑之選擇係視中空顆粒的表面性質而定,可以為水、醇類等極性溶劑、或為甲苯等非極性溶劑,以可形成均勻、穩定、分散的中空顆粒分散液為宜;(b)提供一具有可與該羥基基團形成化學鍵結的基團的黏結劑,及分散該黏結劑於一第二溶劑中以提供一第二分散液;其中,該第二溶劑之選擇係視黏結劑與溶劑的溶解性而定,可為是水、醇類等極性溶劑、或為甲苯等非極性溶劑,以形成澄清透明的溶液為宜;(c)混合該第一分散液與該第二分散液以提供該混合物;以及(d)視需要地,於一視需要之催化劑及/或水存在下維持該混 合物之溫度於約0℃至約100℃,較佳約60℃至約90℃,使該中空顆粒表面之該羥基基團與該黏結劑之該基團反應形成化學鍵結。 According to an embodiment of the present invention, the antireflective composition can be prepared by the following steps: (a) providing a hollow particle having a hydroxyl group on a surface, and dispersing the hollow particle in a first solvent to provide a a first dispersion; wherein the first solvent is selected depending on the surface properties of the hollow particles, and may be a polar solvent such as water or an alcohol or a non-polar solvent such as toluene to form a uniform, stable, and dispersed solvent. a hollow particle dispersion is preferred; (b) providing a binder having a group capable of forming a chemical bond with the hydroxyl group, and dispersing the binder in a second solvent to provide a second dispersion; The second solvent is selected depending on the solubility of the binder and the solvent, and may be a polar solvent such as water or an alcohol or a non-polar solvent such as toluene to form a clear and transparent solution; (c) mixing The first dispersion and the second dispersion to provide the mixture; and (d) optionally maintaining the mixture in the presence of a desired catalyst and/or water The temperature of the compound is from about 0 ° C to about 100 ° C, preferably from about 60 ° C to about 90 ° C, such that the hydroxyl group on the surface of the hollow particle reacts with the group of the binder to form a chemical bond.
於上述混合步驟(c)之前或期間,可加入其他添加物,包含分散劑(如聚丙烯酸、聚乙烯醇、聚乙二醇、苯甲酸鈉);小分子助溶劑(如水楊酸鈉,對胺基苯甲酸、尿素,菸醯胺、乙醯胺);具有增溶作用的表面活性劑(如吐溫(Tween)、斯盤(Span)),有助於提供均勻、穩定、透明的混合分散體。 Other additives may be added before or during the above mixing step (c), including dispersing agents (such as polyacrylic acid, polyvinyl alcohol, polyethylene glycol, sodium benzoate); small molecule cosolvents (such as sodium salicylate, amines) Benzoic acid, urea, nicotinamide, acetaminophen); surfactants with solubilizing effects (such as Tween, Span), help to provide uniform, stable and transparent mixed dispersion body.
在上述混合步驟(d)中,在催化劑及/或水存在下維持混合物的溫度於約60℃至約90℃,使中空顆粒表面的至少一部分該羥基基團與黏結劑的至少一部分該基團反應形成化學鍵結。在本文中「至少一部分該羥基基團」是指至少二個或二個以上的羥基基團,較佳為約20%至約100%之羥基基團,更佳為約40%至約60%之羥基基團;「至少一部分該基團」是指至少二個或二個以上之可與羥基基團反應的基團,較佳為約20%至約100%之可與羥基基團反應的基團,更佳為約40%至約60%之可與羥基基團反應的基團,可依抗反射薄膜實際應用的特性需要或光學性質的需求作調整。 In the above mixing step (d), maintaining the temperature of the mixture in the presence of a catalyst and/or water at from about 60 ° C to about 90 ° C such that at least a portion of the hydroxyl groups on the surface of the hollow particles and at least a portion of the binder are present in the group The reaction forms a chemical bond. As used herein, "at least a portion of the hydroxyl group" means at least two or more hydroxyl groups, preferably from about 20% to about 100% hydroxyl groups, more preferably from about 40% to about 60%. a hydroxyl group; "at least a portion of the group" means at least two or more groups reactive with a hydroxyl group, preferably from about 20% to about 100% reactive with a hydroxyl group. The group, more preferably from about 40% to about 60% of the groups reactive with the hydroxyl group, can be tailored to the desired properties or optical properties of the antireflective film.
本發明亦提供一種抗反射片,通常包含一基材,且上述基材之至少一表面係具有至少一層由如上述之抗反射組合物所形成之薄膜。該抗反射薄膜係由中空顆粒與黏結劑所構成,中空顆粒在薄膜中可形成單層排列,也可形成多層排列,端視需求而定。如後附實施例所示,本發明所提供的薄膜具有相對低的折射率(約1.2至1.3),展現優良的耐磨性、耐刮擦性,並提供改良的密著性。 The present invention also provides an antireflective sheet, generally comprising a substrate, and at least one surface of the substrate has at least one film formed from the antireflective composition as described above. The anti-reflective film is composed of hollow particles and a binder, and the hollow particles can be formed in a single layer arrangement in the film, or can be formed in a multi-layer arrangement depending on the requirements. As shown in the appended examples, the films provided by the present invention have a relatively low refractive index (about 1.2 to 1.3), exhibit excellent abrasion resistance, scratch resistance, and provide improved adhesion.
適用於本發明之抗反射片的基材可根據實際應用來選擇,例如可包含但不限於:玻璃基材、矽基材、聚合物基材(如聚甲基丙烯酸甲酯基材、聚碳酸酯基材、聚對苯二甲酸乙二酯基材)。 The substrate suitable for the antireflection sheet of the present invention may be selected according to practical applications, and may include, but not limited to, a glass substrate, a ruthenium substrate, a polymer substrate (such as a polymethyl methacrylate substrate, polycarbonate). Ester substrate, polyethylene terephthalate substrate).
舉例而言,可將本發明之抗反射組合物施用於基材至少一表面上以形成至少一塗層,再經加熱乾燥後形成一具有優良耐磨性與耐刮擦性以及低折射指數的薄膜,可用作抗反射薄膜。上述施用方法可為任何本發明所屬技術領域中具有通常知識者所習知者,通常可包含但不限於網印(screen-printing)方法、塗佈方法或點膠方法。其中,塗佈方法包含如刮刀式塗佈(knife coating)、滾輪塗佈(roller coating)、微凹版印刷塗佈(micro gravure coating)、流塗(flow coating)、含浸塗佈(dip coating)、噴霧塗佈(spray coating)、簾塗(curtain coating)、或上述方法之組合。 For example, the anti-reflective composition of the present invention can be applied to at least one surface of a substrate to form at least one coating, and then dried by heating to form an excellent abrasion resistance and scratch resistance and a low refractive index. The film can be used as an antireflection film. The above methods of administration may be any of those of ordinary skill in the art to which the present invention pertains, and may generally include, but are not limited to, a screen-printing method, a coating method, or a dispensing method. Wherein, the coating method includes, for example, knife coating, roller coating, micro gravure coating, flow coating, dip coating, Spray coating, curtain coating, or a combination of the above.
於本發明中,可依製程便利性與使用者的需求,進行使中空顆粒表面之該羥基基團係與該黏結劑之基團形成化學鍵結的步驟。舉例言之,該步驟可於混合該中空顆粒與該黏結劑之後、於施用於基材上之前、或施用於基材上之後進行。 In the present invention, the step of forming a chemical bond between the hydroxyl group on the surface of the hollow particle and the group of the binder can be carried out according to the process convenience and the needs of the user. For example, this step can be carried out after mixing the hollow particles with the binder, before applying to the substrate, or after application to the substrate.
本發明之抗反射片特別適用於顯示器、光學鏡頭、偏光膜、及太陽能電池面板,亦可用於本領域中已有的其他應用。 The antireflective sheet of the present invention is particularly useful for displays, optical lenses, polarizing films, and solar cell panels, as well as for other applications found in the art.
茲以下列具體實施態樣以進一步例示說明本發明,但該等實施態樣不以任何方式限制本發明的範圍。 The invention is further illustrated by the following specific examples, which are not intended to limit the scope of the invention in any way.
取約0.08公克數目平均分子量為約5000的聚丙烯酸與約1.5毫升之25%氨水混合至完全溶解,添加至約30毫升無水乙醇中,於約900 rpm轉速下攪拌約30分鐘,得到一淡藍色溶膠。添加約0.5毫升四乙氧基矽烷至該淡藍色溶膠中,攪拌約4小時後,以去離子水稀釋所得的產物,再以超濾膜反覆洗滌,以獲得中空顆粒。 Approximately 0.08 grams of polyacrylic acid having an average molecular weight of about 5,000 was mixed with about 1.5 ml of 25% aqueous ammonia to completely dissolve, added to about 30 ml of absolute ethanol, and stirred at about 900 rpm for about 30 minutes to obtain a pale blue. Color sol. About 0.5 ml of tetraethoxysilane was added to the pale blue sol, and after stirring for about 4 hours, the obtained product was diluted with deionized water, and washed repeatedly with an ultrafiltration membrane to obtain hollow particles.
取約0.08公克數目平均分子量為約5000的聚丙烯酸與約1.5毫升之25%氨水混合至完全溶解,添加至約30毫升無水乙醇中,在約900 rpm轉速下攪拌約30分鐘,得到一淡藍色溶膠。添加約0.5毫升四乙氧基矽烷至該淡藍色溶膠中,攪拌約4小時後,以去離子水稀釋所得的產物,再以超濾膜反覆洗滌後,分散到甲醇中,以獲得中空顆粒甲醇溶膠。接著,添加最終濃度為約28%的氨水至約100公克之約20重量%的中空奈米顆粒甲醇溶膠中,充分混合後,調整濃度至約400 ppm,再添加約4公克甲基丙烯醯基矽烷(購自信越化學株式會社,KBM503),混合均勻,升溫至約50℃加熱約15小時,使反應液冷卻至室溫後,以超濾膜過濾,再反覆洗滌以獲得經修飾的中空顆粒。 Approximately 0.08 grams of polyacrylic acid having an average molecular weight of about 5,000 was mixed with about 1.5 ml of 25% aqueous ammonia to completely dissolve, added to about 30 ml of absolute ethanol, and stirred at about 900 rpm for about 30 minutes to obtain a pale blue. Color sol. About 0.5 ml of tetraethoxy decane was added to the pale blue sol, and after stirring for about 4 hours, the obtained product was diluted with deionized water, washed repeatedly with an ultrafiltration membrane, and dispersed in methanol to obtain hollow particles. Methanol sol. Next, a final concentration of about 28% ammonia water is added to about 100 grams of about 20% by weight of the hollow nanoparticle methanol sol. After thorough mixing, the concentration is adjusted to about 400 ppm, and about 4 grams of methacrylonitrile is added.矽 ( ( purchased from Confidence Chemical Co., Ltd., KBM503), mixed uniformly, heated to about 50 ° C for about 15 hours, cooled to room temperature, filtered through an ultrafiltration membrane, and washed repeatedly to obtain modified hollow particles. .
以下列方法分析製備例1與製備例2之中空顆粒的各種性質。 The various properties of the hollow particles of Preparation Example 1 and Preparation Example 2 were analyzed in the following manner.
將約1毫升中空顆粒溶膠滴在銅網上,乾燥後以穿透式電子顯微鏡(購自日本電子株式會社,JEOL 1011)分析顆粒之形貌。 About 1 ml of the hollow particle sol was dropped on a copper mesh, and after drying, the morphology of the particles was analyzed by a transmission electron microscope (purchased from JEOL Co., Ltd., JEOL 1011).
將中空顆粒溶膠稀釋至約0.5重量%,使用粒徑分佈測定裝置(Malvern Nano ZS,動態光散射法的測定原理),以雷射動態光散射法測定粒徑分佈曲線、體積平均粒徑、體積平均粒徑(Dv)、數量平均粒徑(Dn),並計算多分散係數(Dv/Dn)。 The hollow particle sol was diluted to about 0.5% by weight, and the particle size distribution curve, the volume average particle diameter, and the volume were measured by a laser dynamic light scattering method using a particle size distribution measuring device (Malvern Nano ZS, measuring principle of dynamic light scattering method). The average particle diameter (Dv), the number average particle diameter (Dn), and the polydispersity coefficient (Dv/Dn) were calculated.
在約60℃下將約100毫升中空顆粒溶膠乾燥約48小時,以表面積及孔隙率分析儀ASAP2020(Micromeritics Instrument Corporation)分析所得樣品之平均孔徑及孔徑分佈。 About 100 ml of the hollow particle sol was dried at about 60 ° C for about 48 hours, and the average pore size and pore size distribution of the obtained sample were analyzed by a surface area and porosity analyzer ASAP2020 (Micromeritics Instrument Corporation).
在約60℃下將約100毫升中空顆粒溶膠乾燥約48小時,將所得樣品置於傅立葉轉換紅外線光譜儀(Nicolet 380 FT-IR)中,以探測頭及機台擠壓乾燥後的粉末樣品,進行紅外光譜分析。 About 100 ml of the hollow particle sol was dried at about 60 ° C for about 48 hours, and the obtained sample was placed in a Fourier transform infrared spectrometer (Nicolet 380 FT-IR) to detect the powder sample of the head and the machine after extrusion drying. Infrared spectroscopy.
以滴定法測定奈米顆粒表面之羥基密度,具體步驟如下:稱取約1公克之乾燥中空奈米顆粒樣品並置於250毫升的碘量瓶中,添加約10毫升甲苯並充分混合;添加約25毫升之0.5莫耳/公升2,4-甲苯二異氰酸酯甲苯溶液及約1毫升之1% N,N-二甲基環己胺甲苯溶液,充分混合並放置約10分鐘;接著,添加約25毫升之1莫耳/公升二乙基胺甲苯溶液,充分混合並放置約10分鐘;添加約 20毫升異丙醇及1至2滴溴甲酚綠指示劑溶液,再以0.5莫耳/公升鹽酸標準溶液滴定至藍色突變為黃色為止,計量所消耗之鹽酸標準溶液的體積。 Determine the hydroxyl density of the surface of the nanoparticle by titration. The specific steps are as follows: Weigh about 1 gram of dried hollow nanoparticle sample and place it in a 250 ml iodine measuring flask, add about 10 ml of toluene and mix well; add about 25 0.5 ml/ml of 2,4-toluene diisocyanate toluene solution and 1 ml of 1% N,N-dimethylcyclohexylamine toluene solution, thoroughly mixed and left for about 10 minutes; then, add about 25 ml 1 mol/L of diethylamine toluene solution, mix well and leave for about 10 minutes; add about 20 ml of isopropanol and 1 to 2 drops of bromocresol green indicator solution were titrated with a 0.5 mol/liter hydrochloric acid standard solution until the blue color became yellow, and the volume of the hydrochloric acid standard solution consumed was measured.
根據公式0.01701×C(V1-V0)/m計算樣品中的羥基百分含量,其中m為樣品的質量(公克);C為鹽酸標準溶液的濃度(莫耳/公升);V1為樣品所消耗之鹽酸標準溶液的體積(毫升);V0為對照樣品(blank)所消耗之鹽酸標準溶液的體積(毫升)。 Calculate the percentage of hydroxyl in the sample according to the formula 0.01701×C(V1-V0)/m, where m is the mass of the sample (g); C is the concentration of the standard solution of hydrochloric acid (mole/liter); V1 is the consumption of the sample The volume of the hydrochloric acid standard solution (ml); V0 is the volume (ml) of the hydrochloric acid standard solution consumed by the control sample (blank).
第1圖為製備例1之中空顆粒的穿透式電子顯微鏡照片,顯示所得的顆粒為圓球形且具有中空結構。 Fig. 1 is a transmission electron micrograph of the hollow particles of Preparation Example 1, showing that the obtained particles were spherical and had a hollow structure.
第2圖為製備例1之中空顆粒的粒徑分佈,由計算結果可知所得中空顆粒的數量平均粒徑(Dn)為57.5奈米,體積平均粒徑(Dv)為58.6奈米,多分散係數(Dv/Dn)為1.02,小於1.05,顯示其粒徑非常均勻。 Fig. 2 is a particle size distribution of the hollow particles of Preparation Example 1. From the calculation results, it was found that the obtained hollow particles had a number average particle diameter (Dn) of 57.5 nm, a volume average particle diameter (Dv) of 58.6 nm, and a polydispersion coefficient. (Dv/Dn) was 1.02, less than 1.05, indicating that the particle size was very uniform.
第3圖為製備例1之中空顆粒的孔徑分佈,所得奈米顆粒中空部分的平均孔徑為24.5奈米。 Fig. 3 is a view showing the pore size distribution of the hollow particles of Preparation Example 1, and the average pore diameter of the hollow portion of the obtained nanoparticles was 24.5 nm.
第4圖為製備例1及製備例2之中空顆粒的FT-IR光譜圖,其中3390公分-1至3200公分-1及910公分-1至830公分-1為Si-OH的特徵峰。FT-IR譜圖顯示製備例1及製備例2之中空奈米顆粒均含有羥基,但製備例2之數據顯示其羥基的透過峰較弱,顯示經過化學修飾後之中空顆粒表面的羥基密度會明顯下降。 Fig. 4 is a FT-IR spectrum chart of the hollow particles of Preparation Example 1 and Preparation Example 2, wherein 3390 cm -1 to 3200 cm -1 and 910 cm -1 to 830 cm -1 are characteristic peaks of Si-OH. The FT-IR spectrum shows that the hollow nanoparticles of Preparation Example 1 and Preparation Example 2 all contain hydroxyl groups, but the data of Preparation Example 2 shows that the hydroxyl group has a weak peak of the hydroxyl group, indicating that the hydroxyl density of the surface of the hollow particles after chemical modification is Significant decline.
表1為製備例1及製備例2之中空顆粒表面的羥基密度,顯示相較於製備例1,製備例2之經含烴基的矽烷偶聯劑表面修飾後之 中空顆粒的羥基含量降低。 Table 1 shows the hydroxyl groups on the surface of the hollow particles of Preparation Example 1 and Preparation Example 2, which are shown as being surface-modified with respect to the hydrocarbon-containing decane coupling agent of Preparation Example 2 as compared with Preparation Example 1. The hollow particles have a reduced hydroxyl content.
取約7公克環氧改性的有機矽樹脂溶於約30毫升二甲苯中,與約100毫升5重量%之製備例1的中空顆粒乙醇分散液混合,再添加約5毫升1莫耳濃度HCl溶液,於約80℃下減壓蒸餾約5小時。 About 7 grams of epoxy-modified organic hydrazine resin was dissolved in about 30 ml of xylene, and mixed with about 100 ml of 5% by weight of the hollow particle ethanol dispersion of Preparation 1, and about 5 ml of 1 molar concentration of HCl was added. The solution was distilled under reduced pressure at about 80 ° C for about 5 hours.
取約6公克經甲基三甲氧基矽烷與乙烯基三乙氧基矽烷在酸催化下共水解而獲得的聚有機矽倍半氧烷樹脂溶於約30毫升異丙醇中,與約100毫升5重量%之製備例1的中空顆粒異丙醇分散液混合,再加入約6毫升1莫耳濃度HCl溶液,於約80℃下減壓蒸餾約8小時。 Approximately 6 g of a polyorganosilsesquioxane resin obtained by cohydrolysis of methyltrimethoxydecane with vinyltriethoxydecane under acid catalysis is dissolved in about 30 ml of isopropanol, and about 100 ml. 5 wt% of the hollow particle isopropyl alcohol dispersion of Preparation Example 1 was mixed, and about 6 ml of a 1 molar solution of HCl was added thereto, and distilled under reduced pressure at about 80 ° C for about 8 hours.
第5圖為實施例2之反應產物的FT-IR譜圖,1110公分-1附近為Si-O-Si的特徵峰,顯示黏結劑單獨存在時(即,聚有機矽倍半氧烷樹脂,PSQ)在1110公分-1附近有一個較弱的透過峰,而當黏結劑在酸催化條件下與中空奈米顆粒反應一段時間後所得產物在1110公分-1附近透過峰變強。這說明黏結劑中本身含有一定量的Si-O-Si共價鍵,與中空顆粒在酸催化條件下反應一段時間後形 成更多的Si-O-Si共價鍵。 Fig. 5 is a FT-IR spectrum of the reaction product of Example 2, and a characteristic peak of Si-O-Si in the vicinity of 1110 cm -1 indicates that the binder is present alone (i.e., polyorgano-silsesquioxane resin, PSQ) has a weaker transmission peak around 1110 cm -1 , and the resulting product becomes stronger at a peak of 1110 cm -1 when the binder reacts with the hollow nanoparticles under acid catalysis for a period of time. This indicates that the binder itself contains a certain amount of Si-O-Si covalent bond, and forms more Si-O-Si covalent bonds after reacting with the hollow particles under acid catalysis for a period of time.
取約8公克MQ樹脂溶於約20毫升甲苯中,與約100毫升5重量%之製備例1的中空奈米顆粒異丙醇分散液混合均勻,再添加約2毫升1莫耳濃度H2SO4溶液,於約90℃下減壓蒸餾約8小時。 About 8 grams of MQ resin was dissolved in about 20 ml of toluene, and mixed with about 100 ml of 5% by weight of the hollow nanoparticle isopropyl alcohol dispersion of Preparation Example 1, and about 2 ml of 1 molar concentration of H 2 SO was added. The solution was distilled under reduced pressure at about 90 ° C for about 8 hours.
將製備例2之中空顆粒置換到約100毫升乙醇溶液中,與約30毫升含有約7公克環氧改性的有機矽樹脂的二甲苯溶液混合均勻,再添加約5毫升1莫耳濃度HCl溶液,於約80℃下減壓蒸餾約5小時。 The hollow particles of Preparation Example 2 were replaced with about 100 ml of ethanol solution, and mixed with about 30 ml of a xylene solution containing about 7 g of epoxy-modified organic hydrazine resin, and about 5 ml of a 1 molar concentration of HCl solution was added. It was distilled under reduced pressure at about 80 ° C for about 5 hours.
將製備例2之中空顆粒置換到約100毫升異丙醇溶液中,與約30毫升含有約6公克甲基三甲氧基矽烷與乙烯基三乙氧基矽烷在酸催化下共水解得到的聚有機矽倍半氧烷樹脂的異丙醇溶液混合均勻,再添加約6毫升1莫耳濃度HCl溶液,於約80℃下減壓蒸餾約8小時。 The hollow particles of Preparation Example 2 were replaced with about 100 ml of an isopropanol solution, and about 30 ml of a polyorganic organic compound obtained by cohydrolysis of about 6 g of methyltrimethoxydecane with vinyltriethoxydecane under acid catalysis. The isopropanol solution of the sesquisesquioxane resin was uniformly mixed, and about 6 ml of a 1 molar solution of HCl was added thereto, and the mixture was distilled under reduced pressure at about 80 ° C for about 8 hours.
將製備例2之中空顆粒分散液置換到約100毫升異丙醇溶液中,與約30毫升含有約8公克MQ樹脂的甲苯溶液混合均勻,再添加約2毫升1莫耳濃度H2SO4溶液,於約90℃下減壓蒸餾約8小時。 The hollow particle dispersion of Preparation Example 2 was replaced with about 100 ml of an isopropanol solution, and mixed with about 30 ml of a toluene solution containing about 8 g of MQ resin, and about 2 ml of a 1 molar concentration of H 2 SO 4 solution was added. It was distilled under reduced pressure at about 90 ° C for about 8 hours.
分別取約100公克上述實施例1至3及比較例1至3所得的產物作為抗反射組合物,將玻璃基材以約5分鐘/秒之速度浸入該抗反射組合物中,浸漬約5秒後以相同速度取出玻璃基材,在約500℃下乾燥約1小時,形成薄膜I、II及III與比較薄膜IV、V及VI。 About 100 g of the products obtained in the above Examples 1 to 3 and Comparative Examples 1 to 3 were respectively taken as an antireflection composition, and the glass substrate was immersed in the antireflection composition at a rate of about 5 minutes/second, and immersed for about 5 seconds. Thereafter, the glass substrate was taken out at the same speed and dried at about 500 ° C for about 1 hour to form films I, II and III and comparative films IV, V and VI.
以下列方式測定薄膜I、II及III與比較薄膜IV、V及VI的密著性、鉛筆硬度、耐刮擦性、折射率、在波長為約550奈米處的透光率、及反射率。 The adhesion of the films I, II and III to the comparative films IV, V and VI, the pencil hardness, the scratch resistance, the refractive index, the light transmittance at a wavelength of about 550 nm, and the reflectance were measured in the following manner. .
以1毫米之間隔在玻璃基材上的薄膜表面用刀於水平及垂直方向各劃出11條平行劃痕,形成100個方格,以膠帶(3M)與其黏合後,將膠帶剝離薄膜,對殘留的格子數按以下標準進行密著性評價。 11 parallel scratches were drawn in the horizontal and vertical directions by a knife on the surface of the film on the glass substrate at intervals of 1 mm to form 100 squares. After bonding with tape (3M), the tape was peeled off from the film. The number of remaining lattices was evaluated for adhesion according to the following criteria.
A:殘留方格字數在95以上;B:殘留方格字數90-94;C:殘留方格字數85-89;以及D:殘留方格字數84以下。 A: The number of residual squares is 95 or more; B: the number of residual squares is 90-94; C: the number of residual squares is 85-89; and D: the number of residual squares is 84 or less.
以鉛筆硬度器測試鉛筆硬度,以與基材上的薄膜表面呈約45度角安裝不同硬度(8H、7H、6H、5H)的鉛筆,負載一定的重量後以一定的速度拉伸,觀察有無劃痕。 Pencil hardness was measured with a pencil hardness tester, and pencils of different hardness (8H, 7H, 6H, 5H) were attached at an angle of about 45 degrees to the surface of the film on the substrate. After loading a certain weight, the pencil was stretched at a certain speed to observe the presence or absence of Scratches.
使用0000#鋼絲絨在約250公克負載下劃過基材上的薄膜表面10次,目測觀察塗層表面,按照下列標準進行評價。 The surface of the film on the substrate was slid 10 times under a load of about 250 g using 0000# steel wool, and the surface of the coating was visually observed and evaluated according to the following criteria.
AA:無條紋狀劃痕;BB:可見輕微條紋狀劃痕;CC:可見大量條紋狀劃痕;以及DD:表面整體脫落。 AA: no streaky scratches; BB: slightly striped scratches; CC: a large number of striped scratches; and DD: overall surface shedding.
以橢圓偏振儀(購自J.A.Woollam公司,M-2000V)分析基材上的薄膜的折射率。 The refractive index of the film on the substrate was analyzed with an ellipsometer (available from J.A. Woollam, Inc., M-2000V).
以紫外光-可見分光光度計(Lambda 950)測定基材上的薄膜於波長約550奈米下之透光率;並以紫外光-可見分光光度計(Lambda 950)測定其反射率。其中空白玻璃基材於波長約550奈米下的透光率為約91.76%,反射率為約8.2%。 The transmittance of the film on the substrate at a wavelength of about 550 nm was measured by an ultraviolet-visible spectrophotometer (Lambda 950); and the reflectance was measured by an ultraviolet-visible spectrophotometer (Lambda 950). The blank glass substrate has a light transmittance of about 91.76% and a reflectance of about 8.2% at a wavelength of about 550 nm.
測試方法(F)至(J)之結果如表2所示。 The results of the test methods (F) to (J) are shown in Table 2.
表2之結果顯示,相較於含有經表面修飾之中空奈米顆粒的薄膜(比較薄膜IV至VI),由本發明之抗反射組合物所形成的薄膜(薄膜I至III)具有較佳的密著性、較大的鉛筆硬度、較佳的耐劃擦性。同時,本發明之薄膜I至III具有所欲的低折射率、高透光率及低反射率。 The results in Table 2 show that the films (films I to III) formed by the antireflection composition of the present invention have better density than the films containing the surface-modified hollow nanoparticles (Comparative Films IV to VI). Significant, large pencil hardness, better scratch resistance. Meanwhile, the films I to III of the present invention have a desired low refractive index, high light transmittance, and low reflectance.
上述實施例僅為例示性說明本發明之原理及其功效,並闡述本發明之技術特徵,而非用於限制本發明之保護範疇。任何熟悉本技術者在不違背本發明之技術原理及精神下,可輕易完成之改變或安排,均屬本發明所主張之範圍。因此,本發明之權利保護範圍係如後附申請專利範圍所列。 The above embodiments are merely illustrative of the principles and effects of the present invention, and are illustrative of the technical features of the present invention and are not intended to limit the scope of the present invention. Any changes or arrangements that can be easily accomplished by those skilled in the art without departing from the technical principles and spirit of the invention are within the scope of the invention. Accordingly, the scope of the invention is set forth in the appended claims.
第1圖為製備例1之中空顆粒的穿透式電子顯微鏡照片;第2圖為製備例1之中空顆粒的粒徑分佈圖、數量平均粒徑(Dn)、及多分散係數(Dv/Dn); 第3圖為製備例1之中空顆粒的平均孔徑及孔徑分佈圖;第4圖為製備例1與製備例2之之中空奈米顆粒的傅立葉轉換紅外線光譜圖;以及第5圖所示為實施例2之中空顆粒與黏結劑反應形成之抗反射組合物的傅立葉轉換紅外線光譜圖。 1 is a transmission electron micrograph of the hollow particles of Preparation Example 1; and FIG. 2 is a particle size distribution diagram, a numerical average particle diameter (Dn), and a polydispersity coefficient (Dv/Dn) of the hollow particles of Preparation Example 1. ); 3 is an average pore size and pore size distribution diagram of the hollow particles of Preparation Example 1; FIG. 4 is a Fourier-converted infrared spectrum of hollow nanoparticles of Preparation Examples 1 and 2; and FIG. 5 is an implementation The Fourier transform infrared spectrum of the antireflective composition formed by the reaction of the hollow particles of Example 2 with a binder.
Claims (13)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210166957.4A CN102702966B (en) | 2012-05-24 | 2012-05-24 | Reflection-deducting composition as well as preparation method and application thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201348356A true TW201348356A (en) | 2013-12-01 |
TWI452096B TWI452096B (en) | 2014-09-11 |
Family
ID=46896029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101121125A TWI452096B (en) | 2012-05-24 | 2012-06-13 | Anti-reflection composition and its manufacturing process and uses |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2013246433A (en) |
KR (1) | KR101553823B1 (en) |
CN (1) | CN102702966B (en) |
TW (1) | TWI452096B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI557425B (en) * | 2015-11-24 | 2016-11-11 | 財團法人金屬工業研究發展中心 | Optoelectronic structure with anti-reflection conductive film |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102924990A (en) * | 2012-10-16 | 2013-02-13 | 上海瑞冕新材料科技有限公司 | Transparent antireflection coating liquid and preparation method and application thereof |
CN103074620A (en) * | 2013-02-07 | 2013-05-01 | 蚌埠玻璃工业设计研究院 | Preparation method of hollow microsphere silicon dioxide (SiO2) antireflection film |
JP6266230B2 (en) * | 2013-05-15 | 2018-01-24 | 日揮触媒化成株式会社 | Surface-modified metal oxide fine particles, coating liquid for thin film formation, substrate with thin film, photoelectric cell, and method for producing surface-modified metal oxide fine particles |
CN104448963B (en) * | 2013-09-13 | 2018-05-04 | 江苏春阳幕墙门窗股份有限公司 | Low-E glass visible rays surpass antireflective coating layer material and preparation method thereof |
CN106164713B (en) * | 2014-03-31 | 2018-01-09 | 富士胶片株式会社 | Antireflection film, polarizer, cover glass, the manufacture method of image display device and antireflection film |
KR101615713B1 (en) * | 2014-07-25 | 2016-04-26 | 양철호 | Eco-Friendly Inorganic Coating Composition and Preparation Methods Thereof |
CN104238198B (en) * | 2014-08-21 | 2017-08-25 | 京东方科技集团股份有限公司 | A kind of display panel and preparation method thereof |
CN104927416B (en) * | 2015-06-09 | 2017-08-29 | 中国南玻集团股份有限公司 | Simaldrate colloidal sol and doping nucleocapsid silicon dioxide microsphere coating liquid and application and preparation |
CN108610799A (en) * | 2017-01-21 | 2018-10-02 | 深圳市首骋新材料科技有限公司 | Anti reflection paint, anti-reflection coating and crystal silicon solar batteries |
JP6503128B1 (en) * | 2018-02-13 | 2019-04-17 | 日本板硝子株式会社 | Film, liquid composition, optical element, and imaging device |
WO2019167944A1 (en) * | 2018-02-28 | 2019-09-06 | 富士フイルム株式会社 | Laminated body, protective sheet for solar cell, and solar cell module |
CN112229824B (en) * | 2020-10-19 | 2023-07-21 | 航天特种材料及工艺技术研究所 | Method for measuring consumption speed of silicic acid in preparation process of silica sol |
CN115947545B (en) * | 2022-12-22 | 2024-03-26 | 东莞南玻太阳能玻璃有限公司 | Anti-reflection and anti-reflection coating liquid, photovoltaic coated glass and preparation method thereof |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004341541A (en) * | 1994-02-15 | 2004-12-02 | Dainippon Printing Co Ltd | Optical functional membrane, optical functional film, antiglare- antireflection film, manufacturing method therefor, polarizing plate, and liquid crystal display device |
US5853809A (en) * | 1996-09-30 | 1998-12-29 | Basf Corporation | Scratch resistant clearcoats containing suface reactive microparticles and method therefore |
TWI274662B (en) * | 2002-03-29 | 2007-03-01 | Toray Industries | Laminated film, filter for display and display |
CN1754108A (en) * | 2003-02-06 | 2006-03-29 | Sdc技术-亚洲株式会社 | Method for producing article having been subjected to low reflection treatment, solution for forming low reflection layer and article having been subjected to low reflection treatment |
TWI388876B (en) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | Antireflection film, polarizing plate, method for producing them, liquid crystal display element, liquid crystal display device, and image display device |
JP4580774B2 (en) * | 2004-02-16 | 2010-11-17 | 富士フイルム株式会社 | Antireflection film, polarizing plate using the same, and display device using them |
WO2005085913A1 (en) * | 2004-03-09 | 2005-09-15 | Teijin Dupont Films Japan Limited | Antireflection film and process for producing the same |
JP4632403B2 (en) | 2004-03-26 | 2011-02-16 | 大日本印刷株式会社 | Antireflection film |
JP4857801B2 (en) * | 2005-02-16 | 2012-01-18 | コニカミノルタオプト株式会社 | Antireflection film, method for producing antireflection film, polarizing plate and display device |
US8110128B2 (en) * | 2005-09-21 | 2012-02-07 | Konica Minolta Opto, Inc. | Method of manufacturing an anti-glare anti-reflection film |
JP2007114305A (en) * | 2005-10-18 | 2007-05-10 | Asahi Kasei Corp | Antireflection film for transfer |
JP5457179B2 (en) * | 2007-06-26 | 2014-04-02 | 電気化学工業株式会社 | Method for producing hollow particles |
JP5370150B2 (en) * | 2007-06-28 | 2013-12-18 | コニカミノルタ株式会社 | Antireflection film, polarizing plate, display device, and production method of antireflection film |
JP2009108262A (en) * | 2007-10-31 | 2009-05-21 | Nof Corp | Fluorine-containing curing coating liquid and reflection-reducing material using the same |
JP4948387B2 (en) * | 2007-12-27 | 2012-06-06 | リケンテクノス株式会社 | Antireflection film |
JP2010167410A (en) * | 2008-12-26 | 2010-08-05 | Fujifilm Corp | Method for manufacturing hollow particulate, hollow particulate obtained by this method and its dispersion, and antireflection film using the hollow particulate |
JP2011122005A (en) * | 2009-12-08 | 2011-06-23 | Sony Corp | Anti-reflection film, method for producing the same, and coating liquid of ultraviolet-curable resin material composition |
-
2012
- 2012-05-24 CN CN201210166957.4A patent/CN102702966B/en active Active
- 2012-06-13 TW TW101121125A patent/TWI452096B/en active
- 2012-09-25 KR KR1020120106265A patent/KR101553823B1/en active IP Right Grant
- 2012-11-28 JP JP2012259353A patent/JP2013246433A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI557425B (en) * | 2015-11-24 | 2016-11-11 | 財團法人金屬工業研究發展中心 | Optoelectronic structure with anti-reflection conductive film |
Also Published As
Publication number | Publication date |
---|---|
CN102702966B (en) | 2014-08-06 |
TWI452096B (en) | 2014-09-11 |
KR101553823B1 (en) | 2015-09-17 |
CN102702966A (en) | 2012-10-03 |
KR20130132223A (en) | 2013-12-04 |
JP2013246433A (en) | 2013-12-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI452096B (en) | Anti-reflection composition and its manufacturing process and uses | |
KR101151486B1 (en) | Optical film and method for producing same | |
CN102653628B (en) | Preparation method and application of nano sol modified waterborne polyurethane emulsion | |
TWI579341B (en) | Low refractive index film-forming composition and method of forming low refractive index film using the same | |
CN107902918B (en) | Preparation method of anti-reflection and anti-reflection film layer | |
TW201219507A (en) | Coating composition and method of making and using the same | |
US20160075883A1 (en) | Methods of fabricating superhydrophobic, optically transparent surfaces | |
US20170073237A1 (en) | Method for manufacturing hollow silica particles, hollow silica particles, and composition and thermal insulation sheet comprising same | |
JP7182358B2 (en) | Adhesive sheet containing low refractive index layer, method for producing adhesive sheet containing low refractive index layer, and optical device | |
KR102169533B1 (en) | Void layer, laminate, manufacturing method of void layer, optical member and optical device | |
CN103013205A (en) | Curable resin composition for hard coat layer and hard coat film | |
CN104334652A (en) | Composition and process for making a porous inorganic oxide coating | |
WO2008041681A1 (en) | Coating composition for formation of antireflective film, and article having antireflective film formed therein | |
KR20100019959A (en) | A coating composition endowing transparent substrate with anti-reflection effect and a preparing method for transparent substrate with anti-reflection effect using the composition | |
JP5370147B2 (en) | Hollow fine particles, method for producing the same, coating composition and article on which coating film is formed | |
CN105754381B (en) | A kind of nanometer anti-reflection coating liquid and its preparation method and application | |
JP2016001200A (en) | Antifouling antireflection film, article and production method thereof | |
JP2017500384A (en) | Process for producing anti-reflective coating composition and porous coating produced therefrom | |
CN104449185A (en) | Preparation method of antifogging and antireflection film coating liquid | |
TW201638612A (en) | Laminated film roll and method for producing same | |
WO2009107874A1 (en) | Manufacturing method for a laminated body | |
KR101445437B1 (en) | Anti-Reflection Film and Method of Producing The Same | |
WO2023169539A1 (en) | Hydrophobic anti-reflective glass for vehicle, fabrication method therefor, and laminated glass | |
JP5782916B2 (en) | Antireflection film composition containing modified hollow silica fine particles and antireflection film using the same | |
TWI691559B (en) | Paint and its manufacturing method |