TW201343246A - Gases mixing system - Google Patents

Abstract

The present invention discloses gases mixing system, includes gases well mixing device, well mixed gases reserving device and controlling device. The gases well mixing device includes mixing tube is provided for buffering and mixing multiple gases. The well mixed gases reserving device includes barrel and output tube. The barrel is provided for buffering and reserving the mixed gases, and provides the mixed gases for using terminals via the output tube. The control device controls the timing for the mixed gases entering and exiting the barrel.

Description

Gas mixing system

The present invention relates to a gas mixing system, and more particularly to a technique for buffering and mixing a plurality of gases to improve the uniformity of gas mixing, storage, and supply.

Due to the manufacturing process in today's industry, the mixed gas is often widely used because of the process requirements. For example, in the semiconductor manufacturing industry, for semiconductor substrate processing, or welding applications in other processing technologies, it is necessary to use a mixture of nitrogen and hydrogen; or in the technique of chemical vapor deposition, carbon source gas and protection are required. A gas such as an inert gas or a reducing gas is mixed into the reaction furnace. The uniformity of the mixed gas has a great influence on the processing quality. Highly uniform mixed gas required for semiconductor manufacturing. For applications such as welding or copper wire bonding in other processing technologies, the uniformity of the mixed gas required is low. At present, the most traditional way to supply mixed gas is the gas supplier, which first fills the gas in a cylinder and mixes the cylinders pre-stored with high-pressure mixed gas to the required semiconductor manufacturing and processing companies. The semiconductor manufacturing and processing companies directly connect the cylinders pre-storing the mixed gas to the use end of the semiconductor manufacturing processing equipment, and timely provide the mixed gas required for the use end by the switch control. However, since the different gases are separated from each other, so that the mixed gas supplied to the use end is not in a good proportion of the mixed state, the uniformity of the supplied mixed gas is inconsistent, and the processing quality is seriously affected. When the cylinder is connected to the use end, when the mixed gas is used to replace the cylinder, the use end needs to stop working, interrupting the work and affecting the progress, and easily causing defective products, which may cause a great loss of process interruption, especially in the semiconductor manufacturing industry. Manufacturing. An example of a processing technique for pre-storing a cylinder of a high-pressure gas mixture, such as the apparatus for preparing a carbon nanotube disclosed in the Chinese Patent Application No. 01115547, which uses a gas supply system including a plurality of high-pressure gas storage tanks. The carbon source gas and the protective gas stored in the high pressure gas storage tank are controlled to flow at a specific flow rate by a gas mass flow controller to form a mixed gas of a specific ratio and then supplied to the reactor. However, the gas supply system of the patent only relies on a gas mass flow meter to control the ratio of the ratio of a plurality of gases. In fact, the gas does not uniformly mix before entering the reactor, thereby affecting the processing quality.

In order to improve the above-mentioned conventional pre-storage mixed gas in the cylinder caused by the lack of. At present, manufacturers have designed a supply system for mixed gases. The so-called mixed gas supply system is that the gases to be mixed are prepared as separate gas sources, and all the gas sources to be mixed are merged by the gas mixer, and all the gas sources are merged and mixed with each other by the switching control of the valve body. In order to form a mixed gas, the valve body switch is used to control the supply of the mixed gas to the use end of the semiconductor manufacturing processing equipment, and the gas analyzer is used to monitor the gas mixing ratio in the gas mixer for immediate regulation.

At present, a hybrid gas supply system of the prior art, such as the Republic of China Announcement No. 521000 patent, is applied in the semiconductor manufacturing industry, mainly including a gas mixing manifold, which introduces two kinds of gases into a manifold to form a mixed gas. And then delivered to the use end 50 via a catheter. However, the manifold is only a generally well-known multi-tube fluid junction structure, which is always axially passed through the manifold to the fluid, driving one side of the fluid into the manifold for mixing, and the single-side dissimilar fluid cannot be effectively and straight. The fluid is uniformly mixed, so that the uniformity of the mixing of the two gases is greatly reduced, and the processing quality of the semiconductor manufacturing industry is relatively lowered.

Furthermore, a conventional gas mixing device, such as the Patent No. I255484 of the Republic of China, is applied to a gas smelting device for growing a carbon nanotube by chemical vapor deposition, which mainly comprises a two-phase connected gas. The mixing chamber has a gas mixing chamber which is an elongated curved cavity, thereby increasing the chance of collision of a plurality of gas molecules, so that the mixing of the plurality of gases is more uniform. However, the curved cavity has a slightly better effect of improving the mixing uniformity than the single circular diameter manifold. However, as in the case of the aforementioned manifold, the straight flow gas is rapidly passed through the mixing cavity, and various The gas does not get proper buffering for mixing during mixing, and the gas molecules flow in the streamline. The power to make side collisions is quite limited, so the improvement of mixing uniformity is still quite limited. In addition, a conventional technique, such as the mixed gas supply system of the Republic of China Publication No. 201142056, is mainly constructed by using two mixing chambers to improve the uniformity of mixing of various gases, while other valve control is general mixed gas control. The system, apparently, is the same as the patent No. I255484, which utilizes two mixing chambers, and the uniformity of mixing for a plurality of gases is rather limited.

In view of the fact that the various conventional techniques described above cannot truly improve the uniformity of mixing of a plurality of gases, the inventors have been engaged in various processing equipment industries for many years, and have worked hard to conduct in-depth research. After continuous experimentation and implementation, the research and development design finally improves the mixed gas. Uniformity, and the present invention is fully utilized in various manufacturing industries, particularly in the copper wire processing industry of semiconductor packaging.

A first object of the present invention is to provide a gas mixing technique for improving the uniformity of mixing of a plurality of gases. The technical means for achieving this purpose include a gas uniform mixing device, a mixed gas uniform storage device, and a mixed gas uniform reserve control device. The gas uniform mixing device includes a mixing drum in which a plurality of gases enter to form a buffer and mix. The mixed gas uniform storage device comprises a storage tank and a first output pipe. The inside of the storage cylinder is supplied with mixed gas for buffering and storage, and the output pipe supplies the mixed gas in the storage cylinder to at least one used end. A mixed gas uniform reserve control device for controlling the timing at which the mixed gas enters the storage cylinder and is discharged from the storage cylinder to the use end.

A second object of the present invention is to provide a gas mixing technique that further enhances the uniformity of mixing of a plurality of gases. The technical means for achieving this purpose include a gas uniform mixing device, a mixed gas uniform storage device, and a mixed gas uniform reserve control device. The gas uniform mixing device comprises a mixing cylinder, two intake pipes and a second output pipe. A plurality of gases enter the mixing tank to form a buffer and mix. The two ends of the mixing cylinder are respectively connected with an intake pipe and a second output pipe, and one side is connected to the other intake pipe. The two intake pipes are respectively connected to a gas source. An end of the intake pipe connected to one end of the mixing drum has an extension. The extension extends into the inner chamber of the mixing cylinder, and the circumferential surface is provided with at least one first through hole extending obliquely. The axial direction of the first through hole and the axial direction of the extended portion have a less than ninety degrees The angle is controlled by the nozzle to make the gas enter the mixing cylinder to form a spoiler, thereby greatly increasing the probability of collision of various gases, thereby effectively improving the uniformity of gas mixing.

A third object of the present invention is to provide a gas mixing technique that ensures uniformity of supply of a mixed gas to a use end. The technical means for achieving this purpose include a gas uniform mixing device, a mixed gas uniform storage device, and a mixed gas uniform reserve control device. The mixed gas uniform storage device includes a storage cylinder, and a second output pipe from the gas uniform mixing device extends to connect an extension pipe. At least one exit hole is provided at the end or the proximal end of the extension tube, the extension tube extends into the interior from the top end of the cartridge, and the end thereof penetrates to a position near the bottom of the internal chamber of the cartridge. The mixed gas from the gas uniform mixing device is filled into the interior of the cartridge from the bottom of the cartridge to maintain the natural flow state of the mixed gas to ensure that the mixed gas output from the cartridge still maintains high uniformity.

A fourth object of the present invention is to provide a gas mixing technique which ensures uniformity of supply of a mixed gas to a use end. The technical means for achieving this purpose include a gas uniform mixing device, a mixed gas uniform storage device, and a mixed gas uniform reserve control device. The mixed gas uniform reserve control device includes a first control valve, a second control valve and a pressure sensor. The first control valve is disposed on the passage of the mixed gas from the mixing drum to the cartridge. The second control valve is disposed on the passage of the mixed gas from the reservoir to the use end. The pressure sensor is configured to sense the pressure of the mixed gas in the cartridge and generate a pressure signal to a signal processing module, wherein the signal processing module controls the first control valve and the second according to the pressure signal Control valve opening and closing timing.

壹. Embodiments of the present invention achieving the first object

As shown in FIGS. 1 to 6, the present invention achieves a specific embodiment of the above first object, mainly by using a gas uniform mixing device 10, a mixed gas uniform storage device 20, and a mixed gas uniform reserve control device 30 in the system. In order to improve the uniformity of the mixed gas, the purpose of improving the processing quality of various manufacturing industries, especially the copper wire processing industry of semiconductor packaging, is achieved. The system of the present invention includes a gas uniform mixing device 10, a mixed gas uniform storage device 20, and a mixed gas uniform reserve control device 30. The gas uniform mixing device 10 includes a mixing cylinder 11 for buffering and mixing at least a first gas and a second gas to form a mixed gas, thereby improving the uniformity of mixing of the plurality of gases. The mixed gas uniform storage device 20 includes a storage cylinder 21 and at least one first output pipe 22, the inside of the storage cylinder 21 is for the mixed gas to enter for buffering and storage, and the output pipe supplies the mixed gas in the storage cylinder 21 to at least one use end. 50, in order to maintain the mixing uniformity of the reserve mixed gas. The mixed gas uniform reserve control device 30 is for controlling the timing at which the mixed gas enters the cartridge 21 and is discharged from the cartridge 21 to the use end 50, thereby ensuring the uniformity of the mixed gas supplied from the output.

贰. Embodiments of the present invention achieving the second object

As shown in FIGS. 1 to 6, the present invention achieves a specific embodiment of the above second object, which comprises a gas uniform mixing device 10, a mixed gas uniform storage device 20, and a mixed gas uniform reserve control device 30. The gas uniform mixing device 10 includes a mixing cylinder 11 in which at least a first gas and a second gas are buffered and mixed to form a mixed gas. The mixed gas uniform storage device 20 includes a reservoir 21 and at least one first output tube 22. The inside of the cartridge 21 is supplied with a mixed gas for buffering and storage. The output pipe 22 is for supplying the mixed gas in the cartridge 21 to at least one use end 50. The mixed gas uniform reserve control device 30 is for controlling the timing at which the mixed gas enters the cartridge 21 and is discharged from the cartridge 21 for utilization by at least one user terminal.

In the illustrated example, the gas uniform mixing device 10 includes a mixing cylinder 11, a first intake pipe 12, a second intake pipe 13, and a second output pipe 14, and the inner diameter of the mixing cylinder 11 is larger than the first one. The inner diameters of the air tube 12, the second air inlet tube 13, and the second output tube 14 are at least twice, so that the mixing cylinder 11 has a buffering and mixing function. The mixing cylinder 11 has a first end and a second end opposite to each other in the axial direction thereof, and one side thereof is connected to the second intake pipe 13 to communicate with each other. The first end of the mixing drum 11 is connected to the first intake pipe 12 to be in communication. One end of the first intake pipe 12 is supplied with a first gas from a first gas source 41 of a gas source supply device 40, and the other end has an extension portion 120, and a first check valve 15 is disposed thereon to avoid entering the mixture. The first gas in the barrel 11 is recirculated. The extending section 120 extends into the inner chamber 110 of the mixing cylinder 11, and has a circumferential surface provided with at least one obliquely extending first through hole 121 (illustrated as a plurality of first through holes 121). The axial direction of the first through hole 121 and the axial direction of the extended section 120 have an angle of less than ninety degrees. One end of the second intake pipe 13 is supplied with a second gas from the second gas source 42 of the gas supply device 40, and a second check valve 16 is disposed thereon to prevent the second gas entering the mixing drum 11 from flowing back. The second end of the mixing drum 11 is connected to one end of the second output pipe 14. The second output pipe 14 is for introducing the mixed gas in the mixing drum 11 into the cartridge 21. The first gas is partially discharged from the first outlet hole 123 at the end of the extension portion 120, and is further guided by the first through hole 121 to cause another portion of the first gas to enter the mixing cylinder 11 to form a spoiler. The probability of collision of the first gas and the second gas is increased, thereby effectively improving the uniformity of mixing of the first gas and the second gas. In a preferred embodiment, the extension section 120 has a circular tubular shape and has a sufficient wall thickness. The first through hole 121 is formed through the wall of the extension section 120 by a drilling process and surface treatment. The at least one first through hole 121 is plural and radially distributed on the wall of the extending section 120.

Participation. Embodiment of the present invention achieving the third object

As shown in FIGS. 1 to 6, the present invention achieves a specific embodiment of the above third object, which comprises a gas uniform mixing device 10, a mixed gas uniform storage device 20, and a mixed gas uniform reserve control device 30. The gas uniform mixing device 10 includes a mixing cylinder 11 in which at least a first gas and a second gas are buffered and mixed to form a mixed gas. The mixed gas uniform storage device 20 includes a reservoir 21 and at least one first output tube 22. The inside of the cartridge 21 is supplied with a mixed gas for buffering and storage. The first output pipe 22 is for supplying the mixed gas in the cartridge 21 to the at least one use end 50. The mixed gas uniform reserve control device 30 is for controlling the timing at which the mixed gas enters the cartridge 21 and is discharged from the cartridge 21 to supply at least one use end 50.

A gas mixing system and method for ensuring uniformity of the mixed gas during storage and supply to the use end 50. In the illustrated example, a second output tube 14 from the gas homomixing device 10 extends to connect an extension tube 140. At the end or near end of the extension tube 140, at least a second outlet hole 143 is provided, and the extension tube 140 extends from the top end of the reservoir tube 21 into the interior of the cartridge 21. Moreover, the end of the extension tube 140 penetrates to a position near the bottom of the interior chamber 210 of the cartridge 21. The mixed gas from the gas uniform mixing device 10 is charged into the inside of the cartridge 21 from the bottom of the reservoir 21 to maintain the mixed gas in a natural flow state to ensure that the mixed gas output from the cartridge 21 remains high in uniformity.

Further, in order to raise the mixed gas from the mixing cylinder 11 after entering the cartridge 21, it is still possible to cause disturbance in the cartridge 21 to collide with the mixed gas originally existing in the cartridge 21, thereby maintaining the securing cartridge 21. The uniformity of the internal mixed gas. The present invention is designed to have at least one second through hole 141 (illustrated as a plurality of second through holes 141) on the proximal end surface of the extension tube 140. The axis of the second through hole 141 is directed to the end of the extension tube 140. The axis points at an angle of less than ninety degrees. In a preferred embodiment, the extension tube 140 has a circular tubular shape and has a sufficient wall thickness, and at least one second through hole 141 is formed through the tube wall of the extension tube 140. The at least one first through hole 141 is plural and radially distributed on the pipe wall of the extension pipe 140. Thereby, the mixed gas from the mixing drum 11 is not only partially discharged from the second outlet hole 143 at the end of the extension pipe 140, but also guided by the second through hole 141 to cause another portion of the mixed gas to enter the mixing cylinder 11 to form a disturbance. flow. In the embodiment of the present invention, the volume of the chamber of the cartridge 21 is at least 5 times the volume of the chamber of the mixing cylinder 11. In a specific embodiment of the invention, the mixing bowl 11 has a cylindrical shape with a diameter of 1 inch and a length of 18 inches. Of course, the present invention will be designed according to actual needs, but there are still better design principles, that is, if the inner diameter of the first intake pipe 12, the second intake pipe 13, and the second output pipe 14 The same as T, the inner diameter of the mixing cylinder 11 is 5~10T, and the distance between the inner wall of the first end of the mixing cylinder 11 and the second inlet pipe 13 is L, and the length of the extension section 120 extending into the mixing cylinder 11 is 1/ 2L, and the distance from the inner wall of the second end of the mixing cylinder 11 to the second intake pipe 13 is 2.5L to 5L. The cartridge 21 has a cylindrical shape with a diameter of 36 cm and a height of 120 cm. In the experimental example, the mixed gas is a mixture of nitrogen and hydrogen, and the maximum volume accommodated is about 122 L/KG, and the volume percentage of nitrogen mixed with hydrogen is about 95:5. The invention is designed with a gas control interface panel for the user to adjust the range of the set gas mixing ratio. A gas proportional anomaly protection alarm device is also designed to give an alarm when the gas mixing ratio is abnormal. It can also be connected to the PC device for monitoring.

Hey. Embodiments of the present invention achieving the fourth object

As shown in FIGS. 1 to 6, the present invention achieves a specific embodiment of the above fourth object, which comprises a gas uniform mixing device 10, a mixed gas uniform storage device 20, and a mixed gas uniform reserve control device 30. The gas uniform mixing device 10 includes a mixing cylinder 11 in which at least a first gas and a second gas are buffered and mixed to form a mixed gas. The mixed gas uniform storage device 20 includes a reservoir 21 and at least a second output tube 22. The inside of the cartridge 21 is supplied with a mixed gas for buffering and storage. The first output pipe 22 is for supplying the mixed gas in the cartridge 21 to the at least one use end 50. The mixed gas uniform reserve control device 30 is for controlling the timing at which the mixed gas enters the cartridge 21 and is discharged from the cartridge 21 for utilization by at least one of the use ends 50.

In the illustrated example, the uniformity of the supply of the mixed gas to the use end 50 is ensured. The mixed gas uniform reserve control device 30 of the present invention is designed to include a first control valve 31 and a second control valve 32 (a specific example is a pressure switch, which may be a mechanical double contact pressure switch, or a digital pressure switch). And a pressure sensor 33. The first control valve 31 is disposed on the passage of the mixed gas from the mixing drum 11 to the cartridge 21. The second control valve 32 is disposed on the passage of the mixed gas from the reservoir 21 to the use end 50. The pressure sensor 33 is configured to sense the pressure of the mixed gas in the cartridge 21 and generate a pressure signal to the signal processing module 34 (the microcomputer processing controller is included in the signal processing module example). The signal processing module 34 is provided by the signal processing module 34. The opening and closing timings of the first control valve 31 and the second control valve 32 are controlled according to the pressure signal. For example, in the experimental example of the present invention, when the pressure sensor 33 senses that the pressure of the mixed gas in the cartridge 21 is less than 2 kg/cm ² , the signal processing module 34 controls the first control valve 31 to open to make the mixing cylinder 11 The mixed gas inside is injected into the cartridge 21 through the second output pipe 14. When the pressure sensor 33 senses that the pressure of the mixed gas in the cartridge 21 is greater than 10 kg/cm ² , the signal processing module 34 controls the second control valve 32 to open, so that the mixed gas in the mixing cylinder 11 is output. The tube is supplied to the use end 50. Thereby, when the mixed gas originally stored in the cartridge 21 is used to the remaining smaller amount, the mixed gas that has just been mixed is replenished from the mixing drum 11 into the cartridge 21, and is mixed every time the cartridge 21 is mixed. When the filling amount of the gas reaches a predetermined amount, it is supplied to the use end 50, so that the same batch of the mixed gas is stored in the cartridge 21 for a long time and the uniformity thereof is lowered.

Wu‧The experiment of the invention

In order to further prove the mixing effect of the present invention, it is indeed possible to achieve the demand, and the inventors conducted an experiment on the finished product of the designed device. The experiment is a mixture of nitrogen and hydrogen. The mass flow controller (MFC) for controlling the nitrogen gas N2 in the gas source supply device designed by the present invention is set to 30 liters per minute (30 SLPM), and the mass flow controller for controlling the hydrogen gas H2 (Mass) The Flow Controller (MFC) is set to 2 liters per minute (2SLPM). Nitrogen-hydrogen mixed gas was produced at 30.4 liters per minute (30.4 SLPM). Nitrogen accounted for 28.8 L (set at 96%), hydrogen accounted for 1.24 L (set at 62%), and the gas output was 20 SLPM/MIN. The actual run was 2 hours and recorded. As a result, the recorded results of the monitoring, as shown in Table 1 of Annex 1, show that the ratio of nitrogen to hydrogen is in a stable ratio of 96% and 62%, respectively, and the hydrogen concentration of the test can be maintained as required in Table 2 of Annex 1. 4.2%.

‧ conclusion

Therefore, by way of illustration of the above specific embodiments, it can be summarized that the present invention does have the following features:

1. The complete matching of the gas uniform mixing device, the mixed gas uniform storage device and the mixed gas uniform reserve control device. It can improve the uniformity of gas mixing, storage and supply, and improve the processing quality of the manufacturing industry.

2. The extension of the end of the intake pipe is extended into the mixing cylinder, and the nozzle hole is arranged on the circumferential surface to naturally guide the gas to form a spoiler in the mixing cylinder, thereby greatly increasing the probability of collision of various gases, thereby effectively improving the gas mixing. Evenness.

3. An extension tube is connected by a second output tube from the mixing barrel, and a first hole is formed at the end or near end of the extension tube, and extends from the top end of the storage tube to the bottom of the storage tube. The mixture gas is charged from the bottom of the storage tank into the interior of the storage tank to keep the mixed gas flowing naturally, so as to ensure that the mixed gas output from the storage cylinder can maintain high uniformity.

4. The mixed gas uniform reserve control device design includes a first control valve, a second control valve, and a pressure sensor. The pressure sensor senses the pressure of the mixed gas in the cartridge within a predetermined range, and controls the opening and closing timing of the first control valve and the second control valve respectively, thereby preventing the mixed gas originally stored in the cartridge from being left over. It is uneven for a long time.

The above is only one of the possible embodiments of the present invention, and is not intended to limit the scope of the patents of the present invention, and the equivalent implementations of other changes according to the contents, features and spirits of the following claims are It should be included in the scope of the patent of the present invention. The invention is specifically defined in the structural features of the request item, is not found in the same kind of articles, and has practicality and progress, has met the requirements of the invention patent, and has filed an application according to law, and invites the bureau to approve the patent according to law to maintain the present invention. The legal rights of the applicant.

10. . . Gas uniform mixing device

11. . . Mixing cylinder

12. . . First intake pipe

120. . . Extension

121. . . First through hole

123. . . First exit hole

13. . . Second intake pipe

14. . . Second output tube

140. . . Extension tube

141. . . Second through hole

143. . . Second exit hole

15. . . First check valve

16. . . Second check valve

20. . . Mixed gas uniform reserve device

twenty one. . . Storage tube

210. . . Chamber

twenty two. . . Second output tube

30. . . Mixed gas uniform reserve control device

31. . . First control valve

32. . . Second control valve

33. . . Pressure sensor

34. . . Signal processing module

40. . . Gas supply device

41. . . First gas source

42. . . Second gas source

50. . . Use side

1 is a block diagram showing the overall architecture of the present invention.

2 is a schematic diagram of a loop architecture of the present invention.

Figure 3 is a schematic illustration of a gas homogenizing apparatus of the present invention.

Figure 4 is an enlarged cross-sectional view of the mixing cylinder of the present invention.

Figure 5 is a schematic view of the mixed gas uniform storage device of the present invention.

Figure 6 is an enlarged cross-sectional view of the cartridge of the present invention.

Annex 1: Table 1 is a test record table for the ratio of nitrogen to hydrogen in an experiment for setting a hydrogen concentration of 4.1% according to the present invention; Table 2 is a test record table for hydrogen concentration in an experiment for setting a hydrogen concentration of 4.1% in the present invention.

10. . . Gas uniform mixing device

11. . . Mixing cylinder

12. . . First intake pipe

13. . . Second intake pipe

14. . . Second output tube

15. . . First check valve

16. . . Second check valve

20. . . Mixed gas uniform reserve device

twenty one. . . Storage tube

210. . . Chamber

twenty two. . . Second output tube

30. . . Mixed gas uniform reserve control device

31. . . First control valve

32. . . Second control valve

33. . . Pressure sensor

40. . . Gas supply device

Claims (10)

A gas mixing system comprising: a gas uniform mixing device comprising a mixing cylinder, wherein the mixing cylinder is internally buffered and mixed with at least a first gas and a second gas to form a mixed gas; a mixed gas uniform storage device The utility model comprises a storage tank and at least one first output pipe, the inside of the storage cylinder is provided for buffering and storage, and the output pipe is used for supplying the mixed gas in the storage cylinder to at least one use end; A gas uniform reserve control device for controlling the timing at which the mixed gas enters the cartridge and is discharged from the cartridge for utilization by at least one use end. The gas mixing system of claim 1, wherein the gas uniform mixing device comprises a first intake pipe, a second intake pipe, and a second output pipe; the mixing cylinder has an axial direction along the same a first end and a second end opposite to each other, one side of which is connected to the second intake pipe to be in communication; the first end of the mixing tube is connected to the first intake pipe to be in communication; the first intake One end of the tube is supplied with the first gas by a gas source supply device, and the other end has an extension portion; the extension portion extends into the inner chamber of the mixing tube, and the peripheral surface thereof is provided with at least one first through hole extending obliquely. The axial direction of the first through hole and the axial direction of the extending portion have an angle of less than ninety degrees; the second intake pipe is supplied with the second gas by the gas supply device at one end; the mixing tube The second end is connected to one end of the second output tube, and the second output tube is used to introduce the mixed gas into the cartridge. The gas mixing system of claim 2, wherein the extension has a circular tubular shape and has a sufficient wall thickness, and the at least one first through hole is formed through the wall of the extension. The gas mixing system of claim 2, wherein the at least one first through hole is plural and radially distributed on the wall of the extension. The gas mixing system of claim 2, wherein the second output tube extends to connect an extension tube, and the end portion or the proximal end of the extension tube is provided with at least a second outlet hole; the extension tube extends from the top end of the storage tube, And its end penetrates to the position near the bottom of the inner chamber of the cartridge. The gas mixing system of claim 5, wherein the proximal end surface of the extension tube is provided with at least one second through hole, the axis of the second through hole pointing toward the axis of the end of the extension tube has a smaller than nine Ten degrees of angle. The gas mixing system of claim 5, wherein the extension tube is round tubular and has a sufficient wall thickness, and the at least one second through hole is formed through the tube wall of the extension tube. The gas mixing system of claim 1, wherein the mixed gas uniform reserve control device comprises a first control valve, a second control valve and a pressure sensor; the first control valve is disposed in the mixed gas The mixing tube is disposed on the passage of the cartridge; the second control valve is disposed on the passage of the mixed gas from the cartridge to the use end; the pressure sensor is configured to sense the pressure of the mixed gas in the cartridge And generating a pressure signal to the signal processing module, wherein the signal processing module controls the opening and closing timing of the first control valve and the second control valve according to the pressure signal. The gas mixing system of claim 1, wherein the first gas is nitrogen and the second gas is hydrogen, and the manufacturing device is a copper wire processing tool for semiconductor packaging. The gas mixing system of claim 9, wherein the volume of the chamber of the cartridge is at least 5 times the volume of the chamber of the mixing cylinder, and the volume percentage of the nitrogen to the hydrogen in the mixed gas is about 95: 5.