TW201338881A - Instrument reprocessor and instrument reprocessing methods - Google Patents

Abstract

An instrument reprocessor for cleaning, disinfecting, and/or sterilizing a medical instrument is disclosed. To reprocess instruments having one or more channels defined therein, the reprocessor can include one or more flow control systems configured to control a flow of fluid through each channel. In various embodiments, a flow control system can include a differential pressure sensor and a proportional valve for controlling the fluid flow in a channel. The reprocessor can also include, one, a fluid circulation pump which can be configured to supply the flow control systems with fluid and, two, a system for controlling the pressure of the fluid supplied to the flow control systems. The reprocessor can also include a system for supplying a metered amount of fluid to the fluid circulation system. The system can include a reservoir having a fluid height sensor to monitor the amount of fluid therein and a pump configured to supply the reservoir with fluid.

Description

Post-processor and appliance post-processing method

The present invention relates generally to the subsequent treatment, cleaning, disinfection and/or purification of medical devices.

In various circumstances, the endoscope can include an elongated portion or tube having a distal end that can be configured to be inserted into a patient, and further, the endoscope can include a plurality of channels extending through the elongated portion The channels can be configured to introduce water, air, and/or any other suitable fluid into the surgical site. In some cases, one or more channels in the endoscope may be configured to guide the surgical instrument into the surgical site. In any event, the endoscope may further include a proximal end having an inlet fluidly coupled to the channels, and further, the endoscope may further include a control head portion having one or more valves and/or switches, The control head portion is configured to control the flow of fluid through the channels. In at least one instance, the endoscope can include an air passage, a water passage, and one or more valves within the control head, the one or more valves configured to control the flow of air and water through the passages.

A purification system can be used to post-process a previously used medical device, such as an endoscope, such that the medical device can be reused. There are various purification systems for processing endoscopes later. Generally, such a system can include at least one irrigation tank in which an endoscope to be cleaned and/or sterilized can be placed. The rinsing tank is typically supported by a housing that supports a circulation system consisting of a line, a pump, and a valve for guiding cleaning and/or sterilant entry and/or to have been placed in the wash. On the endoscope in the slot. During the purification process, the channels within the endoscope can be evaluated to verify that the channel is not blocked. In various embodiments, the circulatory system can be fluidly coupled to the endoscope channel by a connector that releasably engages a port that can define the end of the channel. This The connector can be fluidly sealed when attached to the endoscope and can be easily disengaged at the end of the cleaning process.

The above discussion should not be considered as a denial of the scope of the claims.

In at least one form, an appliance post processor for cleaning a medical device can include a chamber configured to receive the medical device, a supply of post-treatment fluid, and a supply gang that is in fluid connection with the supply of the post-treatment fluid Pu, wherein the supply pump comprises a positive displacement pump, and a reservoir in fluid connection with the supply pump, wherein the reservoir comprises a top and a bottom, and wherein the reservoir can be contained between the top and the bottom The height of the post-treatment fluid. The appliance post processor may further include a line sensor extending between the top of the reservoir and the bottom of the reservoir, wherein the line sensor is configured to detect the height of the post-treatment fluid and, in addition, with the line The sensor is in the processor of signal communication, wherein the processor is configured to operate the supply pump when the post process fluid level is below a predetermined height, and wherein the predetermined height is between the top of the reservoir and the reservoir Between the bottom. The appliance post processor may further include a dispensing pump in fluid connection with the reservoir bottom and the chamber, wherein the dispensing pump includes a positive displacement pump, and wherein the processor is configured to operate the dispensing pump .

In at least one form, a method of controlling the flow of a fluid after passing an appliance, the apparatus having at least a first passage and a second passage, the method comprising the steps of: operating one in fluid connection with a source of post-treatment fluid a pump for flowing the post-treatment fluid through a first fluid circuit, the first fluid circuit comprising a first valve and a first differential pressure sensor, wherein the first fluid circuit and the pump and the first a channel is in fluid connection; and the post-treatment fluid flows through a second fluid circuit, the second fluid circuit comprising a second valve and a second differential pressure sensor, wherein the second fluid circuit and the pump And the second passage is in fluid connection. The method may further comprise the steps of: detecting, by the first differential pressure sensor, a first differential pressure in the post-treatment fluid flowing into the first valve; and detecting the inflow using the second differential pressure sensor a second differential pressure in the post-treatment fluid of the second valve; modulating the first valve with an output from the first differential pressure sensor to control the first of the aftertreatment fluid passing through the first passage a flow rate; and modulating the second valve using an output from the second differential pressure sensor to control a second flow rate of the aftertreatment fluid through the second passage. In at least one form An apparatus for cleaning a medical device including a passage may include: a chamber configured to receive the medical device; and a supply connector configured to be fluidly coupled to the passage; a pump configured to pressurize a post-treatment fluid and supply the post-treatment fluid to the supply connector, the pump including an inlet and an outlet; and a positioning to sense the flow from the pump outlet A gauge pressure sensor that treats the gauge pressure of a fluid. The appliance after processor may further include a flow control system including a valve in fluid connection with the supply connector, wherein the valve is configured to control a flow rate of the post-treatment fluid through the passage, and wherein the valve Includes an entrance and an exit. The appliance post processor may further include a differential pressure sensor configured to sense a pressure drop in the post-treatment fluid on an opposite side of a fixed flow orifice, wherein the differential pressure a sensor is located downstream of the gauge sensor and upstream of the valve outlet; and a processor in signal communication with the differential pressure sensor, wherein the processor is configured to translate the flow rate based on the pressure degradation, And instructing the valve to perform at least one of at least partial closing and at least partial opening.

In at least one form, a method of using a monitoring system to maintain a volume of fluid after treatment in a supply reservoir for a fluid circulation system of an appliance post-processor can include the steps of: supplying a post-treatment from a post-treatment fluid source The amount of fluid is supplied to the supply reservoir, the amount of the post-treatment fluid in the supply reservoir is sensed, and the amount of the post-treatment fluid in the supply reservoir is determined to be greater than a predetermined amount.

The method may further comprise the steps of: operating a positive displacement fill pump to supply a post-treatment fluid to the supply reservoir, provided that the amount of post-treatment fluid in the supply reservoir is less than the predetermined amount, wherein the positive row The quantity filling pump is configured to supply a fixed volume of post-treatment fluid per twitch, monitor the amount of post-treatment fluid in the supply reservoir when operating the positive displacement filling pump, and determine the post-treatment fluid at the supply Whether the amount in the reservoir has increased by a re-supply volume equal to the product of the push volume of each twitch and the number of twitches of the positive displacement fill pump, and if the amount of post-treatment fluid in the supply reservoir is not increased When the volume is re-supply, an alarm is broadcast.

In at least one form, a method of controlling the flow of a fluid after passing through an apparatus comprising a channel, the method can include the steps of: operating a pump in fluid connection with a source of post-treatment fluid; measuring flow from the gang The gauge pressure of the post-treatment fluid; adjusting the flow of the post-treatment fluid to adjust the gauge pressure of the post-treatment fluid; The post-treatment fluid flows through a fluid circuit that includes a valve and a differential pressure sensor, wherein the fluid circuit is in fluid connection with the pump and the passage. The method may further comprise the steps of: using the differential pressure sensor to detect a pressure differential in the post-treatment fluid flowing into the valve, and using the output from the differential pressure sensor to modulate the valve to The flow rate of the treated fluid through the passage is controlled.

In at least one form, a method of controlling fluid flow after passing through an apparatus, the apparatus having at least a first passage and a second passage, wherein the first passage is defined by a first value of one of the parameters, And the second channel is defined by a second value of one of the parameters, the method comprising the steps of: initializing a pump in fluid connection with a source of post-treatment fluid to initiate an operational cycle; supplying the post-treatment fluid to a first fluid circuit including a first valve, wherein the first fluid circuit is in fluid connection with the pump and the first passage; and the post-treatment fluid is supplied to a second fluid circuit including a second valve, Wherein the second fluid circuit is in fluid connection with the pump and the second channel, the method may further comprise the step of modulating the first valve to restrict flow of a post-treatment fluid through the first passage, wherein the post-treatment fluid The flow is limited by an amount based on a difference between the first value of the parameter and the second value of the parameter, whereby the post-treatment fluid is initialized when the pump is initialized Through the first channel and the second channel.

The above discussion should not be taken as a negation of the scope of the claims.

100‧‧‧post processor

101‧‧‧Endoscope

Section 102‧‧‧

103‧‧‧Parts

104‧‧‧Parts

110‧‧‧washing tank

111‧‧‧floor

112‧‧‧Nozzles

114‧‧‧Port

116‧‧‧Export

120‧‧‧ bracket

130‧‧‧Folding door/cover

140‧‧‧Frame

150‧‧‧Control panel

157‧‧‧ fluid feedback loop

158‧‧‧Proportional valve

159‧‧‧ gauge pressure sensor

160‧‧‧Channel Flow Subsystem/Fluid Circulation System

161‧‧‧ entrance

162‧‧‧

163‧‧ Export

164‧‧‧Supply pipeline

165‧‧‧ second entrance

166‧‧‧Management

167‧‧‧ valve

168‧‧‧ entrance

170‧‧‧Control unit/control unit components

171‧‧‧Shell

172‧‧‧Differential pressure sensor / pressure sensor

173a‧‧‧ entrance

173b‧‧‧Export

174‧‧‧ proportional valve

175‧‧‧ orifice

176‧‧‧ gauge pressure sensor

177‧‧‧Electrical contacts

178‧‧‧Differential pressure sensor / pressure sensor

179‧‧‧PCB components

180‧‧‧ chamber

183‧‧‧Export

185‧‧‧ pathway

187‧‧‧Electrical contacts

190‧‧‧ pressurized air source

191‧‧‧Alcohol supply

192‧‧‧ check valve

200‧‧‧Fluid distribution system

200a‧‧‧Fluid distribution subsystem

200b‧‧‧Fluid distribution subsystem

201a‧‧‧Disinfectant container/fluid source

201b‧‧‧Disinfectant container/fluid source

210‧‧‧Supply pump/distribution pump/storage

211‧‧‧Storage cavity / internal cavity / entrance

212‧‧‧Piston

213‧‧‧Cylinder

214‧‧‧Export

215‧‧‧Valve lifter

220‧‧‧Storage

221‧‧‧cavity/chamber

222‧‧‧ bottom part

223‧‧‧Shell

224‧‧‧ top part

225‧‧‧ bottom

226‧‧‧ top

227‧‧‧ overflow pipeline

228‧‧‧port

229‧‧‧O-ring

230‧‧‧Assignment of pumps

238‧‧‧port

240‧‧‧ Liquid level sensor

241‧‧‧ first end

242‧‧‧ second end

250‧‧‧PCB components

280a‧‧‧Valve

280b‧‧‧ valve

290a‧‧ Circulatory system

290b‧‧ Circulatory System

The features and advantages of the present invention, as well as the manner in which the features and advantages are realized, will become more apparent from the <RTIgt; 1 is a perspective view of an endoscope rear processor according to at least one embodiment including two washing tanks; FIG. 2 is a perspective view of the washing machine of the endoscope rear processor of FIG. 1; FIG. 3 is an endoscope of FIG. Figure 3A is a diagram of a channel flow subsystem for controlling the pressure of a fluid flowing therethrough; Figure 4 is a perspective view of a manifold assembly including a plurality of flow control units; Figure 3 is a perspective view of the manifold of the manifold assembly; Figure 6 is a flow control configured to control fluid flow through the endoscope channel supply line Figure 7 is a perspective view of the proportional valve of the flow control unit of Figure 6; Figure 8 is a perspective view of the flow control unit of Figure 6 after removing the proportional valve of Figure 7; Figure 9 is a subassembly of the control unit of Figure 6 Stereo view, the sub-assembly comprises a printed circuit board (PCB) component, a gauge pressure sensor and two differential pressure sensors; FIG. 10 is a perspective view of the differential pressure sensor of the control unit of FIG. 9; FIG. 11 is FIG. Figure 12 is a perspective view of the fluid delivery system; Figure 13 is a plan view of the fluid delivery system of Figure 12; Figure 14 is a cross-sectional view of the fluid delivery system of Figure 12; Figure 15 is Figure 12 A front view of the fluid delivery system; FIG. 16 is a schematic illustration of the fluid delivery system of FIG. 12; and FIG. 17 illustrates an endoscope positioned within the interior lens holder of the wash tank of FIG.

In the different figures, the corresponding components are denoted by the same reference symbols. The exemplifications set forth herein are illustrative of certain embodiments of the invention in one form and are not intended to limit the scope of the invention in any way.

Some illustrative embodiments are now described to provide a thorough understanding of the principles of the structure, function, manufacture and use of the devices and methods disclosed herein. One or more examples of these embodiments are illustrated in the accompanying drawings. Those having ordinary skill in the art will appreciate that the devices and methods specifically recited and illustrated in the drawings are non-limiting exemplary embodiments, and that the scope of various embodiments of the present invention is solely claimed. Scope. Features illustrated or described with respect to an exemplary embodiment may be combined with features of other embodiments. Such modifications and variations are intended to be included within the scope of the invention.

The various embodiments, "some embodiments", "one embodiment" or "an embodiment" or the like referred to throughout the specification are intended to describe a particular feature, structure, or characteristic of the embodiment. Included in at least one embodiment. Thus, appearances of the phrases "in the various embodiments", "in the embodiments", "in an embodiment" or "in an embodiment" or the like Example. Furthermore, the particular features, structures may be combined in any suitable manner in one or more embodiments. Or characteristics. Thus, the particular features, structures, or characteristics shown or described with respect to one embodiment may be combined in whole or in part with the features or characteristics of one or more other embodiments without limitation. Such modifications and variations are intended to be included within the scope of the invention.

The terms "proximal" and "distal" as used herein relate to surgical instruments. The term "proximal" refers to the portion closest to the clinician, and the term "distal" refers to the portion that is located away from the clinician. It will be further understood that with regard to the illustrations, spatial terms such as "vertical", "horizontal", "above" and "below" may be used herein for convenience and clarity. However, in some instances, the devices disclosed herein can be used in a number of orientations and positions, and such terms are not intended to be limiting and/or absolute.

As described above, referring to FIG. 1, a medical device post processor, such as endoscope post processor 100, can be configured to clean one or more endoscopes. In some embodiments, the endoscope post processor can be configured to sterilize and/or sterilize the endoscope. In various embodiments, the endoscope post processor can include at least one wash tank 110, wherein each wash tank 110 can be configured to receive an endoscope. Although the endoscope post processor 100 includes, for example, two wash tanks, various alternative embodiments including any suitable number of wash tanks 110 are contemplated. In various embodiments, the post-processor 100 can further include one or more endoscope brackets 120 that are internally configured to support an endoscope, and the endoscope bracket 120 can be placed in each of the wash basins 110. In use, the clinician can place the endoscope into the endoscope holder 120 and then place the endoscope holder 120 in the wash tank 110. Alternatively, the clinician can place the cradle 120 in the wash tank 110 and then place the endoscope in the cradle 120. In either case, once the endoscope has been properly placed in the wash tank 110, the folding door 130 can be closed, closed, and/or closed to the processor frame 140 to enclose the endoscope in the wash tank 110. . Thereafter, the clinician can operate the endoscope post processor 100, for example, by interfacing with the control panel 150. Illustrative embodiments of the wash tank 110, the cradle 120, and the folding door 130 are described in the co-pending U.S. Patent Application Serial No. U.S. Patent Application Serial No. The entire disclosure of this application is incorporated herein by reference. Referring now to Figure 17, the illustrated endoscope 101 is placed within a cradle 120 that is placed in the wash tank 110. In various embodiments, endoscope 101 can include various portions 102, 103, and/or 104 that can be supported within bracket 120.

In various embodiments, for the above, the endoscope rear processor 100 can include a circulation system that can circulate one or more aftertreatment fluids, such as detergents, disinfectants, bactericides, water, alcohol, and/or any other suitable fluid through the endoscope and/or spray the fluid On the endoscope. The circulation system can include a fluid supply and a circulation pump, wherein the circulation pump can be fluidly coupled to the fluid supply such that the fluid can be withdrawn from the fluid supply into the circulation system. In certain embodiments, the circulation system can include a mixing chamber in which the fluid can be mixed with another fluid, such as water, wherein the mixing chamber can be fluidly coupled to the circulating pump. In either case, referring now to Figure 2, each wash tank 110 can include one or more nozzles 112 that can be fluidly coupled to the recycle pump such that fluid pressurized by the recycle pump can be from the cycle The system ejects through nozzle 112 and onto the endoscope. In at least one such embodiment, each wash tank 110 can include a plurality of nozzles 112 located adjacent the periphery thereof and one or more nozzles 112 that can be sprayed upwardly from the wash tank floor 111 or the tailgate. Certain exemplary embodiments are described in more detail in the co-pending, co-pending U.S. Patent Application Serial No. U.S. Patent Application Serial No. The entire disclosure of this application is incorporated herein by reference.

In various embodiments, further to the above, each wash tank 110 can be configured to direct fluid sprayed therein down to a discharge port 116 at its bottom, after which the fluid can re-enter the circulatory system. To clean, sterilize, and/or sterilize internal passages within the endoscope, the endoscope post processor 100 can include one or more supply lines that are fluidly coupled to the circulation system pump, which can be placed in The internal passage of the endoscope is fluidly connected. In various embodiments, referring again to FIG. 2, each wash tank 110 can include one or more ports 114, and port 114 can include an end of a supply line. In the illustrated embodiment, each wash tank 110 has a row of four ports 114 on opposite sides thereof, although various alternative embodiments including any suitable number and configuration of ports 114 are also contemplated. In some embodiments, the endoscope post processor 110 can further include one or more flexible catheters that can be coupled and/or sealingly engaged with the ports defined in the port 114 and the endoscope such that The pressurized fluid of the circulatory system can flow through the port 114, the flexible catheter, and then into the endoscope. A flexible catheter and a connector for sealingly engaging a flexible catheter with an endoscope are described in U.S. Patent Application Serial No. 12/998,459, filed on Aug. 29, 2011, entitled Mirror post-processing system fluid connector (FLUID CONNECTOR FOR EN 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The entire disclosure of the application is incorporated herein.

In various circumstances, further to the above, the channels defined within the endoscope may become blocked or blocked, for example by debris, which may cause the endoscope to be improperly cleaned, sterilized and/or sterilized. In some cases, debris located within the endoscope channel will at least partially block fluid flow therethrough, thereby reducing the rate at which the fluid flows through the channel. Embodiments of various endoscope post-processors are also contemplated herein in which the flow rate of the fluid through the endoscope passage can be monitored to assess if there is a blockage in the passage. In such an embodiment, the monitoring system can measure the actual flow rate of the fluid and compare it to the expected fluid flow rate at a known pressure (where the flow system is pressurized by the circulation pump). Certain monitoring systems may also evaluate whether the connector of the flexible catheter is in sealing engagement with, for example, the endoscope channel and/or the sink port 114. In such systems, the monitoring system can, for example, detect if the flow rate of the fluid is higher than the expected flow rate. The entire disclosure of U.S. Pat.

Referring now to the diagram of FIG. 3, the endoscope rear processor may include a channel flow subsystem 160 that includes a manifold 166 that is in fluid communication with a circulatory system pump (referred to as a pump 162). The Pu 162 can be configured to dispense pressurized fluid to the channel supply line of the endoscope rear processor and then to the endoscope mirror. Such a channel supply line for the endoscope rear processor is indicated by supply line 164 in the diagram of FIG. In various embodiments, each endoscope post processor supply line 164 can include at least one differential pressure sensor 172, at least one proportional valve 174, and at least one gauge sensor 176. In some embodiments, referring now to FIGS. 6 and 9, each of the post processor channel supply lines 164 can include a control unit assembly 170 that includes a housing 171, a differential pressure sensor 172, and a proportional valve 174. And gauge pressure sensor 176. In at least one such embodiment, each housing 171 can include an inlet 168 and an internal passage that can be configured to direct fluid flow through the inlet 173a of the differential pressure sensor 172 and the subsequent outlet 173b. At the differential pressure sensor 172 A flow hole 175 having a fixed diameter (Fig. 10) may be defined between the inlet 173a and the outlet 173b. In at least one such embodiment, the diameter of the orifice 175 can be fixed along its length. Such a flow hole can be formed, for example, by a drilling process. In various other embodiments, the diameter of the orifice 175 may not be fixed along its length. In either case, such a flow orifice may be constant in that it does not change over time or at least does not substantially change. As described in more detail below, referring now to FIGS. 9 and 10, the differential pressure sensor 172 can further include a plurality of electrical contacts 177 that enable printing of the differential pressure sensor 172 and the control unit assembly 170. Circuit board (PCB) assembly 179 is in electrical communication. Electrical contact 177 can also be configured to supply power to differential pressure sensor 172. Various differential pressure sensors are commercially available, for example, from Honeywell.

As outlined above, the differential pressure sensor 172 can be in electrical and/or signal communication with the PCB assembly 179. More specifically, PCB assembly 179 can include, for example, a microprocessor and/or any suitable computer, among others, wherein differential pressure sensor 172 can be configured to generate a microprocessor that is passed to PCB assembly 179. Voltage potential. In at least one such embodiment, the microprocessor of PCB assembly 179 can be configured to interpret the voltage potential energy supplied by differential pressure sensor 172 and calculate the flow rate of fluid flowing through differential pressure sensor 172.

In some embodiments, for the above, a plurality of fluid flow rate values can be stored, for example, in a lookup table defined in a programmable memory on the PCB assembly 179. In various embodiments, the value of the expected fluid flow rate in the lookup table can often be theoretically predicted, however in some embodiments, the equivalent can be tested empirically and then stored in programmable memory. . In either case, the fluid flow rate can be determined as a function of the gauge pressure of the fluid being released by the circulation pump 162 and supplied to the manifold 166. In at least one such embodiment, a gauge pressure sensor, such as gauge pressure sensor 159 (FIG. 3), can be placed downstream of the outlet of the circulation pump 162 to measure the supply to each of the post processor channel supply lines. The gauge pressure of the fluid of 164. In such an embodiment, the gauge sensor 159 can be placed in electrical and/or signal communication with each of the PCB components 179 of the flow control unit 170 such that the gauge pressure of the fluid can be communicated to the voltage potential energy. A microprocessor for each PCB assembly 179. In various embodiments, once the gauge pressure of the fluid has been communicated to the PCB assembly 179, the microprocessor can generate a fluid flow rate for the fluid from the lookup table and compare the fluid flow rate value to the target fluid flow rate. The actual flow rate often does not exactly match the target flow rate, so the range of actual flow rate values between the minimum target value and the maximum target value is acceptable.

In various embodiments, for the above, the fluid flow rate through the after-processor channel supply line 164 can be determined as a function of two variables, namely the gauge reading from the gauge sensor 159 (described above). And furthermore, a differential pressure reading from the differential pressure sensor 172 of the corresponding flow control unit 170. Such a system can use a plurality of lookup tables to derive the flow rate of the fluid. For example, for each possible gauge pressure of fluid that can be supplied to the manifold 166, such as 35 pounds per psi, the associated differential pressure sensor 172 can be stored in a table of expected flow rates. Within each PCB assembly 179. In such an embodiment, a wide range of gauge pressures may need to be considered, and thus a large number of lookup tables may be required. In various other embodiments, the pressure of the fluid supplied to the after-processor supply line 164 can be limited to a particular pressure or a limited pressure range. In at least one such embodiment, referring to FIG. 3A, the fluid circulation system of the appliance after-processor 100 can include a pressure limiting valve, such as a proportional valve 158, which can be coupled to the outlet of the circulation pump 162 and the fluid feedback loop 157. In fluid connection. In at least one such embodiment, the proportional valve 158 can be configured to redirect a portion of the fluid released by the pump 162 and return the redirected fluid to the circulatory system, for example, at an inlet upstream of the pump 162, such that The pressure of the fluid supplied to the manifold 166 is provided at a constant pressure or at least a substantially constant pressure, such as 35 psig per square inch. In at least one such embodiment, a PCB assembly can be used, for example, including a microprocessor and/or any suitable computer that is in electrical and/or signal communication with gauge pressure sensor 159 and proportional valve 158. In use, when the gauge pressure of the fluid is, for example, above 35 psig, the PCB assembly can command the proportional valve 158 to open a certain amount or additional amount to allow fluid or more fluid to flow through the fluid feedback loop 157. In such a case, such an action can reduce the pressure of the fluid flowing to the manifold 166. In the event that the pressure of the fluid is still greater than 35 psig, the PCB assembly can command the proportional valve 158 to open an additional amount. Such steps can be repeated any suitable number of times to achieve the desired fluid pressure. Accordingly, when the gauge pressure of the fluid is, for example, less than 35 psig, the PCB assembly can command the proportional valve 158 to close a certain amount to reduce the rate of fluid flowing through the fluid feedback loop 157. In such a case, such an action can increase the pressure of the fluid flowing to the manifold 166. With the fluid pressure still below 35 psig, the PCB assembly can command the proportional valve 158 to close an additional amount. Such steps can be repeated any suitable number of times to achieve the desired fluid pressure.

In view of the above, in various embodiments, the gauge pressure of the fluid supplied to the flow control unit 170 of the post-processor supply line 164 can be controlled such that it can be maintained at a constant pressure Or at least substantially constant pressure. Thus, one of the variables used to calculate the flow rate of the fluid flowing through the post-processor supply line 164 can be maintained as a constant or at least a substantial constant. Thus, as a result, the flow rate of fluid through each of the post-processor supply lines 164 and its associated control unit 170 can be a function of only one variable, i.e., from the differential pressure sensor 172. In at least one such embodiment, only one lookup table may be needed to calculate the actual, calculated flow rate and/or correlate the actual, calculated flow rate to the target flow rate to determine the actual, calculated flow rate. Whether it is between the minimum and maximum acceptable values of the fluid flow rate through the after-processor supply line 164.

Where the actual fluid flow rate is between the minimum and maximum acceptable values for a given endoscope channel, as supplied by the post processor supply line 164, the PCB assembly 179 of the corresponding flow control unit 170 may not be adjusted. Proportional valve 174, in turn, continuously monitors the flow rate of fluid flowing through flow control unit 170. Where the actual fluid flow rate through the after-processor supply line 164 is below a minimum acceptable value or above a maximum acceptable value (the acceptable values are stored for a given post-processor supply line 164) In the look-up table of the gauge pressure, the PCB assembly 179 can open, partially open, close, and/or partially close the proportional valve 174 associated therewith. In at least one embodiment, referring to FIGS. 6-8, the proportional valve 174 can include a flow orifice or chamber 180, a valve element located within the chamber 180, and a solenoid that can be activated to move the chamber 180 The inner member rotates between an open position, a closed position, and/or any other suitable position therebetween, wherein fluid can flow through the chamber in the open position, in which the member blocks passage therethrough The flow of fluid.

In various embodiments, for the above, the microprocessor of PCB assembly 179 can be configured to adjust the position of the valve element within valve chamber 180 of proportional valve 174. In use, if the actual fluid flow rate through the after-processor supply line 164 is higher than the target fluid flow rate, the solenoid of the proportional valve 174 can move the valve member to its closed position to further limit the flow of fluid therethrough. . Likewise, if the actual fluid flow rate through the after-processor supply line 164 is lower than the target fluid flow rate, the solenoid of the proportional valve 174 can move the valve member to its open position to reduce the restriction on fluid flow therethrough. . In various embodiments, for example, the valve member can be rotated from the open position to the first position to limit the valve orifice to a first amount (eg, approximately 25%), to the second position to limit the valve orifice to a second amount (eg, approximately 50%), to the third position to limit the valve orifice to a third amount (eg, approximately 75%) And to the closed position (where the valve orifice is approximately 100% limited). In various embodiments, the valve member of the proportional valve 174 can be placed in any suitable suitable amount to provide the required restrictions on fluid flow through the valve 174. In any case, the position of the valve element can be controlled by the voltage potential applied to the valve solenoid by the PCB assembly 179, wherein the valve element is positioned, for example, when a higher voltage level is applied to the valve solenoid. The lower voltage level applied to the valve solenoid can cause the valve element to be positioned, for example, in a position closer to its fully closed position when compared to a position closer to its fully open position.

In various circumstances, due to the above results, the PCB assembly 179 can be configured to continuously monitor the fluid flow rate through the post-processor supply line 164 and adjust the proportional valve 174 to increase and/or decrease flow through the post-processor supply line. 164 and the velocity of the fluid of the endoscope channel that is fluidly coupled thereto. In various embodiments, for the above, the PCB assembly 179 can be configured to maintain the flow rate of the fluid at and/or near the desired flow rate. In embodiments where the fluid being circulated is, for example, a disinfectant or a solution comprising a disinfectant, the disinfectant can sterilize the endoscope; however, the disinfectant can also negatively affect or degrade the endoscope. Thus, in view of the above, the channel flow subsystem 160 can be configured to supply sufficient minimum disinfectant flow to the endoscope to disinfect the endoscope while limiting the maximum flow of disinfectant to the endoscope so that the disinfectant does not The mirror is excessively degraded. Similarly, in view of the above, the channel flow subsystem 160 can be configured to supply sufficient minimum sterilant flow to the endoscope to sterilize the endoscope while limiting the maximum flow of sterilant to the endoscope so that the sterilant does not The endoscope is excessively degraded. In various embodiments, each of the endoscope channel supply lines may further include a second differential pressure sensor, such as a differential pressure sensor 178, which may also be detected by the post processor supply line 164. The flow rate of the fluid. In at least one such embodiment, the first differential pressure sensor 172 and the second differential pressure sensor 178 of the control unit assembly 170 can be placed in parallel with each other, wherein the pressure sensors 172 and 178 supply significantly Where different voltages are read to the PCB assembly 179, the PCB assembly 179 can perform routine corrective actions that can include, for example, closing the proportional valve 174 and/or issuing an indication to the operator that the control unit assembly 170 may require servicing. Alert or warning.

As outlined above, each proportional valve 174 can be configured to control the state of the variable orifice. In at least one such embodiment, each proportional valve 174 can include a biasing element, such as a spring, which can be configured to valve elements of the proportional valve 174 discussed above. The offset becomes a normal off state. As also discussed above, the solenoid of the proportional valve 174 can be actuated to move the valve member to an at least partially open position. In at least one embodiment, a series of voltage pulses can be applied from the corresponding PCB assembly 179 to the solenoids, which can control the extent or amount of opening of the valve elements. In at least one such embodiment, the higher the frequency of the voltage pulse applied to the solenoid, the larger the variable orifice, allowing for a larger fluid flow rate to pass. Accordingly, the lower the frequency of the voltage pulse applied to the solenoid, the smaller the variable orifice, allowing for a smaller fluid flow rate to pass. If the voltage pulse is no longer applied to the solenoid of the proportional valve 174, the biasing element can again move the valve element to the closed state. Other various embodiments are also contemplated in which the valve member is biased into a normally open state, and the solenoid of the proportional valve can act to bias the valve member into an at least partially closed state. In various other embodiments, the valve for controlling the flow orifice can be configured to circulate the valve member between the fully open position and the fully closed position, and by controlling the valve member to close for a time relative to the opening time of the valve member. Control the velocity of the fluid flowing therethrough. In at least one such embodiment, the valve element can be cycled between its open and closed states, for example, by a solenoid.

Further to the above, each of the post-processor supply lines 164 can include a control unit assembly 170 that can be configured to control the flow of fluid through the post-processor supply line 164 independently of each other. In various embodiments, the control unit components 170 may not be in electrical and/or signal communication with each other. In such an embodiment, each control unit assembly 170 is configured to monitor and adjust the flow rate of fluid flowing through the post-processor supply line 164 without communicating with other control unit assemblies 170. In various other embodiments, however, the control unit assemblies 170 can be in electrical and/or signal communication with one another such that certain parameters of the fluid within the post-processor supply line 164 can be compared, for example, to one another. In either case, the PCB assembly 179 of the programmable control unit 170 fully opens its proportional valve 174 when the gauge pressure exiting the control unit 170 exceeds a predetermined maximum pressure (eg, approximately 21.75 psig). In various embodiments, the gauge pressure sensor 176 of the control unit assembly 170 described above can be configured to detect the fluid gauge pressure of the proportional valve 174 exiting the post processor supply line 164, and to communicate the voltage level to Its individual PCB assembly 179, PCB assembly 179 can interpret voltage potential as gauge pressure. The gauge sensor 176 can detect the actual pressure or gauge pressure of the fluid as compared to the differential pressure sensors 172 and 178 that can detect the pressure drop in the fluid between the two points in the fluid supply line. . In various embodiments, referring to Figures 9 and 11, gauge pressure sensor 176 A passage 185 can be included that can be configured to direct the flow of fluid through the sensing element and to the outlet 183 of the flow control unit 170. Similar to the above, each gauge sensor 176 can include a plurality of electrical contacts 187 that can cause the gauge sensor 176 to be in electrical and/or signal communication with the corresponding PCB assembly 179. .

Further to the above, the manifold 166 of the fluid circulation system 160 can be configured to distribute fluid flowing therethrough to the eight endoscope post processor supply lines 164 and the associated endoscope channels. Referring now to FIG. 5, the manifold 166 can include an inlet 161, eight outlets 163, and a second inlet 165 on the opposite side of the manifold 166. In various embodiments, the manifold 166 can be configured to receive and dispense several different fluids throughout the operation of the endoscope processor 100. Referring again to FIG. 3, the inlet 161 of the manifold 166 can be configured to receive a solution flow that contains, among other things, water and detergent from the pump 162. In various embodiments, one or more valves may be operated to fluidly connect the pump 162 to the water source such that the pump 162 can draw water into the supply line 164. In certain embodiments, one or more valves may be operated to cause the pump 162 to be in fluid connection with a disinfectant source or disinfectant solution such that the pump 162 can draw disinfectant into the supply line 164. In the last embodiment, referring again to FIG. 5, the endoscope post processor 100 can include one or more valves, such as valve 167, which can be operated to allow pressurized air to flow from the pressurized air source 190, such as Tube 166. In at least one such embodiment, pressurized air can force any residual water, detergent, and/or disinfectant to exit the endoscope passage. In some embodiments, the endoscope post processor 100 can further include an alcohol supply 191 and a pump configurable to draw alcohol from the alcohol supply 191 and direct the alcohol to the manifold via, for example, the second inlet 165. 166. In at least one such embodiment, the one-way valve 192 can be placed intermediate such a pump and second inlet 165 such that other fluid from the manifold 166 cannot flow into the alcohol supply 191.

In view of the above, the appliance post processor can be configured to supply one or more pressurized fluids to the passage of the appliance, such as an endoscope. In various embodiments, the flow rate of fluid supplied to the endoscope channel can be monitored. The appliance post processor can increase the flow rate of the fluid flowing therethrough if the flow rate of the fluid supplied to the endoscope passage is below the target flow rate or the minimum acceptable flow rate. The appliance post processor can reduce the flow rate of the fluid flowing therethrough if the flow rate of the fluid supplied to the endoscope passage is higher than the target flow rate or the maximum acceptable flow rate. In some embodiments, the appliance post processor may include a plurality of supply fluids to the endoscope channel Supply lines, wherein each supply line may include a variable valve orifice that can be modulated to adjust the flow rate of fluid therethrough. In various embodiments, the variable valve orifice of each supply line may be part of a closed loop configuration that includes a fixed orifice differential pressure sensor configured to sense the flow rate of the fluid. In various embodiments, the differential pressure sensor can be placed upstream of the variable valve orifice and downstream of the recycle pump. In at least one embodiment, the appliance after processor can further include a gauge pressure sensor to sense fluid gauge pressure exiting the circulation pump and a pressure control system configured to modulate fluid pressure relative to the target pressure. In at least one such embodiment, the differential pressure sensor can be placed downstream of the gauge pressure sensor and the pressure control system.

As noted above, the fluid circulation system of the endoscope post processor 100 can be configured to circulate fluid through the endoscope and/or spray the fluid onto the outer surface of the endoscope. In various embodiments, referring now to FIG. 8, endoscope post-processor 100 can include a fluid dispensing system 200 that can be configured to dispense one or more fluids to a fluid circulation system. In various embodiments, referring now to Figures 12-16, fluid dispensing system 200 can include two or more separate fluid dispensing subsystems, such as fluid dispensing subsystems 200a and 200b, each fluid dispensing subsystem such as a configuration Distribute different fluids to the fluid circulation system. In various embodiments, referring now to Figure 16, the endoscope post-processor 100 can include a storage area configurable to receive one or more fluid containers, such as a sterilant container 201a and/or a detergent container. 201b, wherein the endoscope post processor 100 can further include one or more fluid connectors, each fluid connector being sealingly engageable with one of the fluid containers. In some embodiments, the endoscope post processor 100 can further include an RFID reader and/or a barcode reader configurable to read the RFID tag and/or barcode on the fluid container to ensure that it is used The correct fluid, and second, for example, to use the fluid before an expiration date. In any event, once the fluid connector has been coupled to the fluid container, the fluid dispensing system 200 can be configured to draw fluid from the fluid container and dispense it into the circulatory system, as described in further detailed description below. .

In various embodiments, for the above, the fluid subsystem 200a can include a supply pump 210, a reservoir 220, and a distribution pump 230. In certain embodiments, the supply pump 210 can include an inlet 211 that is fluidly coupled to a fluid container and/or any other suitable fluid source. In at least one embodiment, the supply pump 210 can include A positive displacement pump, in at least one such embodiment, the positive displacement pump can include a piston configured to push a fixed amount of volume, or fluid, each time the piston is pumped. More specifically, referring primarily to FIG. 14, supply pump 210 can include a piston 212 that can be configured to be within a first position (or bottom dead center (BDC) position) and a second position within cylinder 213 (or Moving or reciprocating between top dead center (TDC) positions to introduce fluid into the cylinder 213 and push fluid through the cylinder outlet 214. In certain embodiments, the supply pump 210 can further include a valve lifter 215 that can contact the valve lifter 215 to open the valve element and allow fluid to exit via the pump outlet 214 when the piston 212 reaches its TDC position. When the piston 212 returns to its BDC position, for example, a valve spring located behind the valve lifter 215 can be configured to return the valve element and valve lifter 215 to a fixed position, with the outlet 214 sealing closed until the valve element and valve lifter 215 is again lifted by piston 212 during the next draw of piston 212. As described in more detail below, the outlet 214 of the supply pump 210 can be fluidly coupled to the reservoir 220 such that fluid pressurized by the supply pump 210 can be released into the interior cavity 221 defined in the reservoir 220.

In various embodiments, the reservoir 220 can include a bottom portion 222, a housing 223, and a top portion 224, wherein, in at least one embodiment, the outlet 214 of the supply pump 210 can be stored, for example, via the port 228 of the bottom portion 222. The internal cavity 221 of the vessel 220 is fluidly connected. In other various embodiments, the supply pump 210 can be fluidly coupled to the reservoir cavity 211 via, for example, a port and/or a top portion 224 in the housing 223. In any event, the bottom portion 222 and the top portion 224 can be in sealing engagement with the housing 223, wherein, in at least one embodiment, the bottom portion 222 and the top portion 224 can be configured, for example, in a snap and/or crimp configuration The manner of engaging the housing 223. In various embodiments, the bottom portion 222 and the top portion 224 can be comprised, for example, of plastic that is not degraded by the fluid contained within the reservoir 220. In some embodiments, the reservoir 220 can further include a seal (eg, an O-ring 229) that can be intermediate the bottom portion 222 and the housing 223 and a seal (eg, an O-ring 229 intermediate the housing 223 and the top portion 224) The seals prevent fluid from leaking out of the reservoir 220. In various embodiments, the housing 223 can be constructed of any suitable material, such as glass. In at least one embodiment, the housing 223 can be constructed, for example, from borosilicate, which is not degraded by the fluid contained within the reservoir 220.

As discussed above, the supply pump 210 can be configured to supply a pump piston A fixed amount of fluid is supplied to the internal reservoir cavity 221 for each twitch of 212. In use, the supply pump 210 can be operated a suitable number of cycles or cycles to fill the interior cavity 221 and/or fill the interior cavity 221 to a predetermined extent or height within the interior cavity 221. In certain embodiments, the reservoir 220 can include an overflow line 227 that can be configured to discharge the fluid back to the fluid source if the reservoir 220 is loaded to overflow. In various embodiments, referring again to FIG. 14, the interior cavity 221 can have a bottom 225, a top 226, and a height defined between the bottom 225 and the top 226. In at least one such embodiment, the inner cavity 221 can be cylindrical and can have a fixed circumference along its height, while in other embodiments, the inner cavity 221 can have any suitable architecture. In various embodiments, because of the above relationship, each cycle of the supply pump 210 can raise the fluid level within the internal reservoir cavity 221 by a certain amount or a fixed amount. In at least one embodiment, the amount of fluid in the reservoir 220 can be maintained by operating the supply pump 210 to the same number of draws as, for example, the dispensed pump 230. In some embodiments, the reservoir 210 can include a sensor, such as a level sensor 240, which can be configured to detect fluid height and/or reservoir within the reservoir cavity 221. The change in fluid height within cavity 221 is as described in more detail below.

In various embodiments, for the above, the level sensor 240 can include an analog sensor and can be secured to the reservoir housing 223. In at least one embodiment, the housing 223 can be constructed of glass and the level sensor 240 can be adhered to the glass, for example, using at least one adhesive. In at least one such embodiment, the level sensor can include a capacitive sensor, such as a linear capacitive sensor, which can have a first end located at or adjacent the bottom 225 of the reservoir cavity 221. 241 and a second end 242 at or adjacent to the top 226 of the reservoir cavity 221. In such an embodiment, the liquid level sensor 240 can be configured to generate a first voltage (or low voltage) when the internal cavity 211 is clear or at least substantially clear, and when the internal cavity 211 is full or at least substantially full The level sensor 240 can be configured to generate a second voltage (or high voltage). Additionally, level sensor 240 can be configured to generate a range of voltages between the low voltage and the high voltage, depending on the fluid level within reservoir cavity 211. In particular, in various embodiments, the voltage generated by level sensor 240 can be a function of the height of the fluid within reservoir cavity 221, and thus, the voltage will increase as the height of the fluid increases. In at least one such embodiment, for example, the voltage can be high with the fluid The degree is linearly proportional, wherein in at least one embodiment, for example, the low voltage can be about zero volts and the high voltage can be about five volts.

In various embodiments, the fluid dispensing subsystem 200a can further include a dispensing pump 230 that can be fluidly coupled to the interior cavity 211 of the reservoir 210 and configurable to draw fluid from the reservoir cavity 211 and dispense The fluid enters the fluid circulation system of the endoscope rear processor 100 and/or the mixing chamber within the fluid circulation system. In at least one embodiment, the inlet to the distribution pump 230 can be fluidly coupled to the bottom 225 of the interior chamber 221 via a port 238 in the bottom portion 222 of the reservoir 220. In some embodiments, the distribution pump 230 can include a positive displacement pump that can be configured to push a fixed volume of fluid at each twitch. The supply pump 210 has a detailed description of the positive displacement pump. For the sake of brevity, this discussion will not be repeated here. In some embodiments, the supply pump 210 and the distribution pump 230 can be the same or at least nearly identical. In at least one embodiment, the dispensing pump 230 can be configured to push the same or at least substantially the same volume or amount of fluid as each of the twitches.

In use, the supply pump 210 can be operated to fill the internal chamber 221 value of the reservoir 220 until the fluid level has met or exceeded a predetermined height within the chamber 221. In various embodiments, the fluid dispensing subsystem 200a can include a computer or microprocessor, such as a PCB assembly 250, which can be electrically coupled to the supply pump 210, the distribution pump 230, and/or the level sensor 240. And / or signal communication. In at least one such embodiment, the PCB assembly 250 can be configured to detect the voltage potential generated by the level sensor 240 and calculate the fluid level within the reservoir 220 as a function of voltage potential. Where the PCB assembly 250 calculates that the fluid level within the reservoir 220 is below a predetermined height, the PCB assembly 250 can operate the fluid supply pump 210 until the fluid level has met or exceeded a predetermined height. In at least one embodiment, PCB assembly 250 may not operate dispensing pump 230 when the fluid level in reservoir 220 is below a predetermined level. Where the PCB assembly 250 calculates that the fluid level in the reservoir 220 is at or above a predetermined height, the PCB assembly 250 can operate the dispensing pump 230 to supply fluid to the fluid circulation system as needed. In certain embodiments, the PCB assembly 250 can be configured to operate the supply pump 210 prior to operating the dispense pump 230 such that there is sufficient fluid supply in the reservoir 220 prior to operating the dispense pump 230. In at least one embodiment, the PCB assembly 250 can be configured to operate the supply pump 210 after operating the distribution pump 230 to supplement the reservoir 220 Fluid supply inside. In various embodiments, the PCB assembly 250 can be configured to operate the dispensing pump 230 and the supply pump 210 simultaneously such that the fluid in the reservoir 220 can be replenished when the dispensing pump 230 dispenses fluid in the reservoir 220.

As outlined above, the supply pump 210 can include a positive displacement pump, and in such an embodiment, the PCB assembly 250 can be configured to monitor whether the supply pump 210 is properly delivered each time the pump piston 212 is twitched. The amount of fluid is passed to the reservoir 220. More specifically, information regarding the fixed volume displacement of the supply pump 210 can be programmed into the PCB assembly 250 such that the PCB assembly 250 can calculate an increase in fluid volume within the reservoir 220 for each twitch of the supply pump 210. Whether (as measured by fluid level sensor 240) matches the volumetric displacement of supply pump 210. The PCB increases (as measured by fluid level sensor 240) equal to or at least substantially equal to the fixed volume displacement of supply pump 210 for each twitch of supply pump 210, PCB The component 250 can signal to the operator of the endoscope post processor 100 that the supply pump 210 is being adequately supplied with fluid from the fluid source. In the event that the fluid increase in reservoir 220 (as measured by fluid level sensor 240) is not equal to or at least substantially equal to the fixed volume displacement of supply pump 210 at each twitch of supply pump 210, The PCB assembly 250 can signal the operator of the endoscope post processor 100 that the supply pump 210 is not adequately supplied with fluid from the fluid source and that the source of the fluid may need to be checked because, for example, the fluid source may be empty. In various circumstances, checking the fluid source can include replacing or supplementing the fluid source. In various embodiments, the reservoir 220 can contain a quantity of fluid that can be sufficient to supply the endoscope post processor 100 while the operator is inspecting the fluid supply. In previous endoscope postprocessors, the fluid circulation system directly extracted fluid from the fluid supply, so the endoscope post processor could not confirm that the fluid source had been exhausted until the operating cycle had begun and the lack of fluid had interrupted the operating cycle. .

In various embodiments, further to the above, the endoscope post processor 100 can include, for example, two wash tanks 110, each of which can be erected such that the endoscopes can be cleaned, sterilized, and/or sterilized. In certain embodiments, referring again to FIG. 16, endoscope post processor 100 can include separate fluid circulation systems, such as circulation systems 290a and 290b, for supplying fluid to each wash tank 110. In such an embodiment, the fluid dispensing subsystem 200a can be configured to supply fluid from the fluid source 201a to both fluid circulation systems 290a, 290b, and similarly, the fluid dispensing subsystem 200b can be configured to supply fluid from the fluid. The fluid of source 201b is supplied to both fluid circulation systems 290a, 290b. In at least one such embodiment, the endoscope post processor 100 can include a valve 280a that can be fluidly coupled to the dispensing pump 230 of the fluid dispensing subsystem 200a, and that can be coupled to the fluid circulation system 290a, 290b is in selective fluid connection such that fluid can be selectively supplied to fluid circulation system 290a, 290b from fluid source 201a. Similarly, the endoscope post processor 100 can include a valve 280b that can be in fluid connection with the dispensing pump 230 of the fluid dispensing subsystem 200b and, in addition, can be in selective fluid with the fluid circulation system 290a, 290b. The connection is such that fluid can be selectively supplied to the fluid circulation system 290a, 290b from the fluid source 201b. Prior to operating an operating cycle of the fluid circulation system, in certain embodiments, the fluid circulation system may require a quantity of fluid from one of the fluid distribution subsystems 200a, such as a cleaning agent and/or a disinfectant. In such an embodiment, further to the above, the programmable PCB assembly 250 maintains a quantity of fluid within the reservoir 220 of the subsystem 200a such that when fluid is required to be supplied to the fluid circulation system 290a, 290b, the fluid is It does not need to operate the supply pump 210. In various circumstances, the amount of fluid from the reservoir 220 required by the fluid circulation system may be greater than the volume of fluid that the distribution pump 230 can supply in a single stroke, and thus, multiple strokes of the pump 230 may need to be dispensed. In any event, the particular amount of fluid required by the fluid circulation system prior to the operational cycle of the appliance post processor 100 can be equal to the minimum amount of fluid that the programmable PCB assembly 250 maintains in the reservoir 220. In certain embodiments, the programmable PCB assembly 250 maintains sufficient fluid in the reservoir 220 to supply a particular fluid to both of the fluid circulation systems to begin its cycle of operation without refilling by the corresponding supply pump 210. . Of course, for the above further, after a sufficient amount of fluid has been supplied to the fluid circulation system, the supply pump 210 can then be operated to refill the reservoir 220. In view of the above, in various embodiments, prior to initiating the corresponding supply pump 210 to refill the reservoir 220, the reservoir 220 may contain sufficient fluid to supply at least one cycle of operation of the fluid circulation system, wherein In the event that the reservoir 210 cannot refill the reservoir 220, for example due to an empty fluid supply, the operator of the endoscope post processor 100 may have an opportunity to replace the fluid supply prior to the next operational cycle of the fluid circulation system.

Further to the above, the distribution pump 230 can include a positive displacement pump, and in such an embodiment, the PCB assembly 250 can monitor whether the dispensing pump 230 draws the correct amount of fluid from the reservoir 220 with each twitch. More specifically, you can program Information regarding the fixed volumetric displacement of the distribution pump 230 is within the PCB assembly 250 such that the PCB assembly 250 can evaluate the fluid within the reservoir 220 for each twitch of the dispense pump 230 (eg, by fluid level sensing) Whether measured by the device 240 is consistent with the fixed volume displacement of the distribution pump 230. With each twitch of the dispense pump 210, the fluid reduction within the reservoir 220 is equal to or at least substantially equal to the fixed volume displacement of the dispense pump 230 (as measured by the fluid level sensor 240), the PCB The component 250 signals to the operator of the endoscope rear processor 100 that the fluid distribution pump 230 is being supplied sufficiently from the reservoir 220. Under each twitch of the dispense pump 230, the fluid within the reservoir 220 is reduced (as measured by the fluid level sensor 240) not equal to or at least substantially equal to the volumetric displacement of the dispensed pump 230, PCB The assembly 250 can signal the operator of the endoscope post processor 100 that the fluid distribution pump 230 is not adequately supplied and that some inspection and/or repair of the fluid dispensing subsystem may be required.

As discussed above with respect to various embodiments, each fluid distribution subsystem 200a, 200b can include a fluid supply pump 210 and a separate fluid distribution pump 230. As also discussed above, in various embodiments, the fluid supply pump 210 and the fluid distribution pump 230 can operate independently of one another to supply fluid to the reservoir 220 and dispense fluid from the reservoir 220, respectively. In certain alternative embodiments, a single pumping device can be configured to pump fluid from the fluid supply into the reservoir 220 and, in addition, to pump fluid from the reservoir 220 into the fluid circulation system. In at least one such embodiment, the pumping device can include a piston having a first piston head within the first cylinder and a second piston head located within the second cylinder, wherein the piston can linearly reciprocate Movement moves the first and second piston heads within the first and second cylinders, respectively. In various embodiments, the first cylinder can be fluidly coupled to the fluid source and the reservoir, and the second cylinder can be fluidly coupled to the reservoir and the fluid circulation system such that movement within the first cylinder The first piston head can pump fluid from the fluid source into the reservoir, and the second piston head moving within the second cylinder can pump fluid from the reservoir into the fluid circulation system. In various embodiments, the configuration of the first piston head and the first cylinder can include a first positive displacement pump, and the configuration of the second piston head and the second cylinder can include a second positive displacement Pump. In certain embodiments, the pumping device can include a valve control system configurable to control or limit the flow of fluid into, for example, the first cylinder and/or the second cylinder. In at least one such embodiment, the valve control system can It is configured to close the valve element and prevent fluid from flowing into the second cylinder as fluid is pumped from the first cylinder into the reservoir. Similarly, the valve control system can be configured to close the valve element and prevent fluid from flowing into the first cylinder as fluid is pumped from the reservoir via the second cylinder. In such an embodiment, the first and second piston heads can reciprocate within their respective first and second cylinders; however, fluid flow through the cylinders can be prevented, as described above. In various alternative embodiments, the pump can include a rotary pump having a first bore in fluid connection with the fluid source, a second bore in fluid connection with the reservoir, and a fluid with the fluid circulation system The third hole connected. In at least one such embodiment, the valve control system can be configured to close or block the third hole when pumping fluid into the reservoir, and alternatively, block the fluid as it is pumped from the reservoir The first hole. In certain embodiments, the valve control system can include one or more of a suitable configuration of, for example, a shuttle valve and/or a slide shaft valve. In various embodiments, any suitable positive displacement pump including a three-way valve can be used to pump fluid from the fluid source into the reservoir 220 and then pump fluid from the reservoir 220 into the fluid circulation system.

As discussed above, referring again to FIG. 16, endoscope post processor 100 can include a fluid dispensing system 200 that can be configured to supply fluid to one or more fluid circulation systems. As also discussed above, the fluid dispensing system 200 can include more than one fluid dispensing subsystem, such as the first subsystem 200a and the second subsystem 200b. In various embodiments, the second subsystem 200b can be identical or at least substantially identical to the first subsystem 200a, and thus, for the sake of brevity, the structure and operation of the second subsystem 200b are not repeated herein. In at least one embodiment, the first subsystem 200a can be configured to dispense a first fluid to one or more fluid circulation systems, such as fluid circulation systems 290a and 290b, and the second subsystem 200b can be configured to dispense a second The fluid is to, for example, fluid circulation systems 290a, 290b. In at least one such embodiment, the first fluid dispensing subsystem 200a can be configured to dispense, for example, a cleaning agent to the fluid circulation system, and the second fluid dispensing subsystem 200b can be configured to dispense a disinfectant (eg, peroxyacetic acid). To the fluid circulation system. As also discussed above, fluid dispensing systems 200a and 200b can be operated at different times while their respective fluids are supplied to the fluid circulation systems at different times during the operating cycle. In various other situations, fluid subsystems 200a and 200b can be operated at the same time to, for example, supply different fluids to the same fluid circulation system and/or supply different fluids to different fluid circulation systems at the same time.

Further to the above, the first fluid circulation system 290a can include a first channel flow subsystem 160 and a first pump 162 for circulating fluid through the first circulation system 290a, and the second fluid circulation system 290b can include a second channel flow. Subsystem 160 and second pump 160 are used to circulate fluid through second circulation system 290b. In various other embodiments, the appliance post-processor can include any suitable number of fluid circulation systems; however, with respect to any of the fluid circulation systems, its channel flow subsystem 160 can be configured to control the initialization of the fluid circulation system (or Start) program. More specifically, after the appliance has been placed in the wash tank 110 and the cover 130 has been closed, the operator can initiate an operational cycle to clean the appliance, and at such point in time, the channel flow subsystem 160 can be configured to control from The initial flow of the post-treatment fluid of the pump 162. In various embodiments, an instrument (eg, an endoscope) can include a plurality of channels or lumens extending therebetween, such channels having, for example, different lengths, diameters, and/or configurations, such that the channels have, for example, different The overall flow resistance or limit. In the case where the pump 162 is initialized with all of the proportional valves 174 in the open state and/or the same state, flow from the pump 162 before filling and/or pressurizing the endoscope passage having a higher flow resistance Fluids tend to fill and/or pressurize endoscope channels with lower flow resistance. In various situations, such a situation would be short-lived and would eventually reach the desired operating conditions or steady-state operating conditions of the fluid circulation system. In some cases, this starting procedure is perfectly suitable. However, in other situations, different starting procedures may be required.

In various embodiments, for further of the above, the channel flow subsystem 160 can include, for example, a computer and/or a microprocessor that can configure the valve 174 in different states during the initialization process. in. In at least one embodiment, the subsystem computer can operate the valve 174 to compensate for different flow resistances or limitations, such as endoscope channels. For example, for a valve 174 that controls fluid flow through a high flow resistance endoscope passage, the subsystem computer can place such a valve 174 in a fully open state and control fluid flow through the low flow resistance endoscope passage The flow valve 174, the subsystem computer can place such a valve 174 in a partially closed state. In such an embodiment, fluid flow from the pump 162 may tend to fill and/or press all of the endoscope channels simultaneously or at least substantially simultaneously. In some cases, the transient state of filling the channel with pressurized fluid can be shortened, and steady state operating conditions or desired operating conditions can be achieved in less time. Such an embodiment can reduce the total time required to perform the cleaning cycle of the appliance post processor 100. For example with eight In an embodiment of the endoscope channel and eight flow control units 170 for controlling the flow of fluid through the eight corresponding channel supply lines 164, all of its eight proportional valves 174 can be placed in different conditions and/or the same The conditions are, for example, on, off, partially on, and/or partially off.

In various embodiments described herein, the flow subsystem computer can use one or more criteria or parameters to control the valve 174 of the flow control unit 170 during initialization (or startup) of the program. Further to the above, the first proportional valve 174 of the first control unit 170 can be configured to control fluid flowing through the first endoscope channel, the first endoscope channel being defined by a first value of a particular parameter, The second proportional valve 174 of the second control unit 170 can be configured to control fluid flowing through the second endoscope channel, the second endoscope channel being defined by a second value of a particular parameter, and a third control unit The third proportional valve 174 of 170 can be configured to control fluid flow through the third endoscope passage, the third endoscope passage being defined by a third value of a particular parameter. In various embodiments, the first value of the parameter may be greater than the second value of the parameter, and the second value may be greater than the third value of the parameter, wherein the first valve 174 may be adjusted to the first open state, The second valve 174 can be adjusted to a second open state based on a difference between the first value and the second value of the parameter, and the third valve can be based on a difference between the first value and the third value of the parameter The 174 is adjusted to a third open state to regulate fluid flow through the first, second, and third passages. In at least one such embodiment, the first open state, the second open state, and the third open state of the first, second, and third valves 174 can be selected, respectively, such that an initialization (or start) procedure in the fluid circulation system During the process, fluid flow through the first, second, and third endoscope channels may be evenly or at least substantially evenly distributed across the first, second, and third endoscope channels. In at least one embodiment, the first, second, and third open states of the valve 174 can be selected such that when the endoscope passage is filled with fluid, the volumetric flow rates through the endoscope passages are equal or at least substantially equal to one another. In such an embodiment, the fluid flow rate through the endoscope passage can be increased during the initialization process, wherein each fluid flow can be increased simultaneously with other fluid flows. In at least one embodiment, the first, second, and third open states of the valve 174 can be selected such that when the endoscope passage is filled with fluid, the gauge pressure of the fluid flowing through the endoscope passage is equal or at least substantially equal. In such an embodiment, pressure or fluid flow through the endoscope passage may be increased during the initialization process, wherein the pressure of each fluid flow may increase simultaneously with the pressure of other fluid flows.

In at least one embodiment, for the above, to select a ratio The parameter of the open state of the valve 174 may include the flow resistance value of the appliance passage. In each case, the flow resistance value of the appliance channel can be affected by many variables; however, the flow resistance value of the appliance channel can be primarily determined by the channel length, the channel diameter, and the bend (or bend) in the channel path. Appliance passages having longer lengths, smaller diameters, and/or more curvature in the passage path will generally have higher passages than appliance passages having shorter lengths, larger diameters, and/or less bending in the passage path. The value of the flow resistance. In any event, the appliance channel having the highest flow resistance value of the medical device can be selected as a reference from which the fluid flowing through the other appliance channels can be adjusted. In at least one embodiment, for example, the first appliance passage can have the highest fluid flow resistance, and the first proportional valve 174 can be set to a fully open state. In various embodiments, a certain amount of the second proportional valve 174 may be closed based on the difference between the first flow resistance value and the second flow resistance value. Similarly, a certain amount of the third proportional valve 174 may be closed based on the difference between the first flow resistance value and the third flow resistance value. In each case, the greater the difference between the flow resistance value of the appliance passage and the first flow resistance value (or the reference flow resistance value), the greater the degree to which the proportional valve 174 can be closed accordingly.

In any event, further to the above, once the steady state operating conditions or desired operating conditions of the fluid circulation system have been reached, the subsystem computer can allow the flow control unit 170 to independently control and manage the supply line 164 through the endoscope channel. The flow of fluid is as discussed above. In various circumstances, the devices and methods described herein can be designed to provide a suitable post-treatment fluid supply to clean, sterilize, and/or sterilize the endoscope and/or any other suitable device that includes passages having different flow resistances. Further to the above, these devices and methods can be configured to supply an appropriate post-treatment fluid supply to the channel by individually controlling fluid flow through each channel.

In each case, the pump 162 may have sufficient output, while supplying appropriate post-processing fluid to all of the post-processor supply lines 164 and associated endoscopes during initialization of the operating cycle and throughout the operational cycle. aisle. Further to the above, the flow control unit 170 can be configured to manage the fluid supplied thereto such that each of the after-processor supply lines 164 has a flow rate through which it meets or exceeds a minimum target flow rate, and thus does not deplete fluid. The output of the pump 162 may be increased if the fluid flow through the one or more post-processor supply lines 164 is below the minimum target flow rate and the pump 162 is not operating at the maximum capacity. In some cases, the gauge pressure of the post-treatment fluid exiting the pump 162 may To at least temporarily increase above the target gauge, such as 35 psig, the pump 162 meets the supply requirements of the post processor supply line 164 and its associated endoscope channel. In the event that fluid flow through one or more of the after-processor supply lines 164 is below a minimum target flow rate and the pump 162 is operating at a maximum (or near maximum) capacity, at least one booster pump may be operated to increase the inlet manifold The flow rate and/or pressure of the post-treatment fluid of 166 and after-processor supply line 164. In various embodiments, the at least one booster pump can be, for example, in series with the pump 162 and/or in parallel with the pump 162, wherein the at least one booster pump can be selectively operated to assist the pump 162.

In various embodiments discussed herein, each of the post processor supply lines 164 of the channel flow subsystem 160 can include a proportional valve 174 configured to control the variable orifice. In various other embodiments, the at least one post processor supply line 164 can include a fixed orifice or a fixed orifice valve. In at least one embodiment, the fixed orifice valve can be placed in an open state or a closed state. In at least one such embodiment, a post processor supply line 164 having a fixed orifice valve can be coupled to, for example, an endoscope passage having the highest fluid flow resistance, wherein the fluid flow rate through such an endoscope passage can be A function of the gauge pressure of the post-treatment fluid supplied by the pump 162. In various embodiments, for example, when the fixed orifice valve is in the open state, the rear processor supply line 164 having a fixed orifice valve can be used to modulate the supply of the variable orifice after the control is controlled, for example, by the proportional valve 174. Line 164.

All or part of any patent, document, or other disclosure disclosed herein is hereby incorporated by reference in its entirety herein in its entirety in its entirety in the extent of Reveal the extent to which information is in conflict. As such, and to the extent necessary, the disclosure as explicitly set forth herein supersedes any conflicting material incorporated herein by reference. Any material or part thereof that is hereby incorporated by reference, but which is hereby incorporated herein by reference in its entirety herein inso There is no conflict between them.

While the invention has been described as being illustrative, the invention may be further modified within the spirit and scope of the disclosure. This application is therefore intended to cover any variations, uses, or adaptations Further, the present application is intended to cover such departures of the present disclosure within the scope of the teachings of the invention.

100‧‧‧post processor

110‧‧‧washing tank

120‧‧‧ bracket

130‧‧‧Folding door/cover

140‧‧‧Frame

150‧‧‧Control panel

Claims (9)

A method of controlling the flow of a fluid after passing an apparatus, the apparatus having at least one first and second passages, the method comprising the steps of: operating a pump in fluid connection with a source of post-treatment fluid; The fluid flows through a first fluid circuit, the first fluid circuit includes a first valve and a first differential pressure sensor, wherein the first fluid circuit is in fluid connection with the pump and the first channel; The first differential pressure sensor detects a first differential pressure in the post-treatment fluid flowing into the first valve; and modulates the first valve using an output from the first differential pressure sensor to control passage a first flow rate of the post-treatment fluid of the first passage; flowing the post-treatment fluid through a second fluid circuit, the second fluid circuit including a second valve and a second differential pressure sensor, wherein the second a fluid circuit in fluid connection with the pump and the second passage; using the second differential pressure sensor to detect a second differential pressure in the post-treatment fluid flowing into the second valve; and using the second from the second An output modulation of the differential pressure sensor a second valve to control a second flow rate of the aftertreatment fluid passing through the second passage; wherein the step of modulating the first valve includes modulating a first variable valve orifice, and wherein the second valve is modulated This step includes modulating a second variable valve orifice. The method of claim 1, further comprising the steps of: measuring a first gauge pressure of the post-treatment fluid in the first fluid circuit; comparing the first gauge pressure to a first maximum pressure; and The first gauge pressure exceeds the first maximum pressure, the first valve is closed to stop the flow of fluid through the first fluid circuit. The method of claim 1, further comprising the steps of: comparing the first flow rate to a first target flow rate; and at least partially closing the first valve if the first flow rate is higher than the first target flow rate Or at least partially opening the first valve if the first flow rate is lower than the first target flow rate; Comparing the second flow rate to a second target flow rate; and at least partially closing the second valve if the second flow rate is higher than the second target flow rate or at least partially lowering the second flow rate below the second target flow rate The second valve is opened. A post-processor for cleaning a medical device, the medical device comprising a passage, the post-processor comprising: a chamber configured to receive the medical device; a fluid coupling configured to the passage a supply connector; a pump configured to pressurize a post-treatment fluid and supply the post-treatment fluid to the supply connector, wherein the pump includes an inlet and an outlet; a positioning to sense flow from the a gauge pressure sensor for the gauge pressure of the post-treatment fluid at the outlet of the pump; and a flow control system comprising: a valve fluidly coupled to the supply connector, wherein the valve is configured to control the passage of the post-treatment fluid a flow rate of the passage, and wherein the valve includes an inlet and an outlet; a differential pressure sensor configured to sense the post-treatment fluid on opposite sides of a fixed orifice a pressure drop, wherein the differential pressure sensor is located downstream of the gauge sensor and upstream of the valve outlet; and a processor in signal communication with the differential pressure sensor, wherein the processor is configured to be based Interpreting the flow rate by the pressure drop, And commanding the valve is at least partially closed and at least a portion of the at least one opening. A method of controlling the flow of a fluid after passing an appliance, the apparatus comprising a passage, the method comprising the steps of: operating a pump in fluid connection with a source of post-treatment fluid; measuring the post-treatment of the stream from the pump a gauge pressure of the fluid; adjusting a flow of the post-treatment fluid to adjust a gauge pressure of the post-treatment fluid to maintain the post-treatment fluid flowing from the pump at a substantially constant pressure; flowing the post-treatment fluid through a a fluid circuit comprising a valve and a differential pressure sensor, wherein the fluid circuit is in fluid connection with the pump and the channel; the differential pressure sensor is used to detect the post-treatment fluid flowing into the valve One of the pressure differences; The valve is modulated using an output from the differential pressure sensor to control the flow rate of the post-treatment fluid through the passage; wherein the step of modulating the valve includes modulating a variable valve orifice. The method of claim 5, further comprising the step of calculating a flow rate of the post-treatment fluid through the passage. A method of controlling the flow of a fluid after passing an appliance, the apparatus having at least a first passage and a second passage, wherein the first passage is defined by a first value of a parameter and the second passage is Defined by a second value of one of the parameters, the method includes the steps of: initializing a pump in fluid connection with a source of post-treatment fluid to initiate an operational cycle; supplying the post-treatment fluid to a first valve comprising a first fluid circuit, wherein the first fluid circuit is in fluid connection with the pump and the first channel; the post-treatment fluid is supplied to a second fluid circuit including a second valve, wherein the second fluid circuit The pump and the second passage are in fluid connection; and modulating the first valve to limit flow of the aftertreatment fluid through the first passage, wherein the flow of the aftertreatment fluid is limited by the first value of the parameter a function of a relationship with the second value of the parameter whereby the post-treatment fluid flows through the first passage and the second passage when the pump is activated; wherein the first valve is modulated The modulation step comprises a first variable orifice valve, and wherein the step of modulating the second modulating valve to include a second variable orifice valve. The method of claim 7, wherein the modulating step comprises limiting a flow of the post-treatment fluid through the first passage such that a pressure of the post-treatment fluid flowing through the first passage flows through the post-treatment fluid The pressure of the second passage is the same. The method of claim 7, further comprising the step of modulating the second valve to restrict flow of the post-treatment fluid through the second passage, wherein the flow of the post-treatment fluid is limited by the parameter A function of the relationship between the second value and a target value of one of the parameters.