TW201326470A - Composite material electroplating equipment - Google Patents

Composite material electroplating equipment Download PDF

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TW201326470A
TW201326470A TW100149664A TW100149664A TW201326470A TW 201326470 A TW201326470 A TW 201326470A TW 100149664 A TW100149664 A TW 100149664A TW 100149664 A TW100149664 A TW 100149664A TW 201326470 A TW201326470 A TW 201326470A
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tank
plating
homogenization
electroplating
plating tank
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TW100149664A
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TWI454595B (en
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Chii-Rong Yang
shu-fang Chang
Sheng-Kai Chen
Yi Kuo
Jin-Long Chan
Yao-Bang Wu
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Chii-Rong Yang
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Abstract

A composite material electroplating equipment is provided. The equipment includes a homogenization tank having a stirrer disposed therein, and an electroplating tank adjacent to the homogenization tank. The homogenization tank connects to the electroplating tank through an overflow channel, and a substance inside the homogenization tank is pumped into the electroplating tank.

Description

複合材料電鍍設備Composite plating equipment

本案係關於複合材料製造設備,尤指一種以電鍍來製造複合材料的設備。This case relates to composite manufacturing equipment, and more particularly to an apparatus for manufacturing composite materials by electroplating.

複合材料通常就是將兩種或兩種以上物理或化學性質迥異的材料一起使用,使得成品可以同時具有各材料的特性,而在電鍍製程中,主要的材料就是金屬離子與非金屬粒子,並在電鍍的過程中讓非金屬粒子亦混合於電鍍液中,當金屬電鍍在試片上時,非金屬粒子亦會附著於試片上,如此即達成了將兩種物化性質迥異的材料一起製造而達到複合材料的效果。Composite materials usually use two or more materials with different physical or chemical properties, so that the finished product can have the characteristics of each material at the same time. In the electroplating process, the main materials are metal ions and non-metal particles, and During the electroplating process, the non-metallic particles are also mixed in the plating solution. When the metal is electroplated on the test piece, the non-metallic particles are also attached to the test piece, so that the two materials having different physicochemical properties are combined to form a composite. The effect of the material.

不過,由於非金屬粒子通常不帶電、也不溶於如電鍍液類的水溶液,因此,如試圖讓非金屬粒子在電鍍過程中可以均勻的附著在試片上,則必須進行均質作業,以使非金屬粒子可以均勻的散布在電鍍液中,才有可能在電鍍過程中均勻的附著於試片上。但是,目前的複合材料的電鍍製程中,非金屬粒子,如陶瓷粒子,事先在一均質機內進行均質處理,使之均勻的散布在電鍍液內,之後,再將電鍍液搬運、輸送到電鍍機內進行電鍍作業,而在這個搬運、輸送的過程中,非金屬粒子就會逐漸的沉積、沉澱,有時候也會彼此靠近而結塊。而習用技術則為了避免這些不良現象,則多在均質程度上想辦法,希望能用更高的均質程度來彌補將來在搬運、輸送過程中產生的沉澱、聚集現象。但是對於搬運、輸送過程中的不良現象無法根本的改善。However, since non-metal particles are usually not charged and are not soluble in an aqueous solution such as a plating solution, if an attempt is made to uniformly attach non-metal particles to the test piece during the plating process, homogenization must be performed to make the non-metal The particles can be evenly dispersed in the plating solution, so that it is possible to uniformly adhere to the test piece during the plating process. However, in the current electroplating process of composite materials, non-metallic particles, such as ceramic particles, are homogenized in a homogenizer before being uniformly dispersed in the plating solution, and then the plating solution is transported and transported to the plating solution. Electroplating is carried out in the machine, and during this handling and transportation, non-metallic particles are gradually deposited and precipitated, and sometimes they are close to each other and agglomerate. In order to avoid these unhealthy phenomena, the conventional technology is more effective in the degree of homogenization, hoping to use a higher degree of homogenization to compensate for the precipitation and aggregation that will occur during transportation and transportation. However, there is no fundamental improvement in the handling and transportation problems.

爰是之故,申請人有鑑於習知技術之缺失,發明出本案「複合材料電鍍設備」,用以改善上述習用手段之缺失。For this reason, the applicant invented the "composite plating equipment" in the present case in view of the lack of the prior art to improve the lack of the above-mentioned conventional means.

本發明之目的是為了提高複合材料的製造良率、減少缺陷的產生,以達到高品質複合材料的製造結果,尤其是在增進以電鍍方法製造的複合材料技術的方面,藉由本發明的設備可以大幅的減少複合材料中其中一種材料的沉積與全體不均勻分布的現象,使得各材料的混合、複合的過程,可與電鍍製程一同整合成為一完整的製造流程,亦即,使各材料從製備到混合再到電鍍製造可以在一個設備內完成,減少了材料運送的搬運時間、亦大幅減少了材料於運送時的沉積現象與變質的危險。此外,還可以立即回收廢液並加以重複使用,大幅的減少了廢液的處理時程,換言之就是提升使用效率、並減少了浪費。The object of the present invention is to improve the manufacturing yield of the composite material and reduce the occurrence of defects to achieve the production result of the high-quality composite material, especially in the aspect of improving the composite material technology manufactured by the electroplating method, by the apparatus of the present invention. Significantly reduce the deposition of one of the composite materials and the uneven distribution of the whole material, so that the mixing and compounding process of each material can be integrated with the electroplating process to form a complete manufacturing process, that is, the materials are prepared from From mixing to electroplating, it can be done in one device, reducing the handling time of material handling and greatly reducing the risk of deposition and deterioration of materials during transport. In addition, the waste liquid can be immediately recovered and reused, which greatly reduces the processing time of the waste liquid, in other words, improves the use efficiency and reduces waste.

為了達到上述之目的,本發明提供一種複合材料電鍍設備,包括:一均質槽,內設有一攪拌棒;以及一電鍍槽,鄰接於該均質槽,其中,該均質槽與該電鍍槽透過一溢流通道相互連通,且透過一幫浦將均質槽內的物質送入該電鍍槽。In order to achieve the above object, the present invention provides a composite plating apparatus comprising: a homogenizing tank having a stirring rod therein; and a plating tank adjacent to the homogenizing tank, wherein the homogenizing tank and the plating tank pass through The flow channels are connected to each other, and the substances in the homogenization tank are fed into the plating tank through a pump.

為了達到上述之目的,本發明再提供一種複合材料製造設備,包括:一本體,並分隔為一電鍍槽以及一均質槽;以及一輸送幫浦,將該均質槽內的材料輸送至該電鍍槽。In order to achieve the above object, the present invention further provides a composite material manufacturing apparatus comprising: a body separated into a plating tank and a homogenizing tank; and a transport pump for transporting material in the homogenizing tank to the plating tank .

為了達到上述之目的,本發明又提供一種複合材料製造設備,包括:一均質槽;以及一電鍍槽,其中,該均質槽與該電鍍槽的上部以一向該均質槽傾斜的溢流通道連接,而該均質槽與該電鍍槽的底部則透過一輸送通道予以連通,使該均質槽輸送材料至該電鍍槽。In order to achieve the above object, the present invention further provides a composite material manufacturing apparatus comprising: a homogenizing tank; and a plating tank, wherein the homogenizing tank and the upper portion of the plating tank are connected by an overflow passage inclined to the homogenous trough, The homogenous trough and the bottom of the electroplating tank are communicated through a transport passage to transport the material to the electroplating tank.

以下針對本案之「複合材料製造設備」的各實施例進行描述,請參考附圖,但實際之配置及所採行的方法並不必須完全符合所描述的內容,熟習本技藝者當能在不脫離本案之實際精神及範圍的情況下,做出種種變化及修改。The following describes the embodiments of the "composite manufacturing equipment" of the present invention, please refer to the accompanying drawings, but the actual configuration and the method adopted do not have to completely conform to the described contents, and those skilled in the art can Various changes and modifications are made without departing from the actual spirit and scope of the case.

請參閱圖1,為本發明的實施例示意圖。其中包括了一均質槽1與一電鍍槽2。本發明是用於複合材料的製造設備,顧名思義,是將兩種或以上的不同性質的材料予以混合製造成為一單獨的結構,通常是一金屬材料與一非金屬材料如陶瓷粉末,且陶瓷粉末無法溶解於電鍍液中,因此若要陶瓷粉末順利的附著於試片3上時,就必須將陶瓷粉末均勻的散布於電解液中,因此,均質槽1就是盡可能的將非金屬材料均勻的擴散於電解液中避免其沉澱、結塊。通常,均質槽1具有一攪拌馬達12轉動一攪拌器10,用以擾動電解液,進而使當中的非金屬材料隨著電解液一起流動,使非金屬材料本身得以均勻的散布在電解液內。不過,由於在攪拌液體的同時會使液體溫度升高,因此並不是一開機之後攪拌器10就持續動作,只要均勻度達到需求即可停止攪拌馬達12。Please refer to FIG. 1 , which is a schematic diagram of an embodiment of the present invention. It includes a homogenizing tank 1 and a plating tank 2. The present invention is a manufacturing apparatus for composite materials. As the name implies, two or more materials of different properties are mixed and manufactured into a single structure, usually a metal material and a non-metal material such as ceramic powder, and ceramic powder. It cannot be dissolved in the plating solution. Therefore, if the ceramic powder is smoothly attached to the test piece 3, the ceramic powder must be uniformly dispersed in the electrolyte. Therefore, the homogenization tank 1 is as uniform as possible for the non-metal material. Diffusion in the electrolyte to prevent precipitation and agglomeration. Generally, the homogenizing tank 1 has a stirring motor 12 rotating a stirrer 10 for disturbing the electrolyte, so that the non-metallic material therein flows along with the electrolyte, so that the non-metal material itself is uniformly dispersed in the electrolyte. However, since the temperature of the liquid is raised while stirring the liquid, the agitator 10 does not continue to operate after the start-up, and the agitation motor 12 can be stopped as long as the uniformity reaches the demand.

請繼續參閱圖1,當均質槽1內的非金屬材料均勻散布後,即以一輸送通道4將均質槽1內的液體送入電鍍槽2內,在輸送通道4的路徑上則會有一幫浦(圖中未揭示)以便推送液體。以圖1的實施例而言但不限於以湧泉鍍的方式,將液體自電鍍槽3的下方向上送入,藉以抵銷重力對電鍍液內非金屬材料所產生的沉澱作用,不過由於電鍍槽2內的液體不如均質槽1內的受到激烈的攪拌,故而仍然會有逐漸沉澱,甚至有可能凝結成塊,因此,在電鍍槽2內靠近底部的位置則設有一止擋件7,以免沉澱的、結塊的非金屬材料堵塞輸送通道4的出口,或回落入輸送通道4內。Referring to FIG. 1 , when the non-metallic material in the homogenizing tank 1 is evenly dispersed, the liquid in the homogenizing tank 1 is sent into the plating tank 2 by a conveying passage 4, and there is a gang in the path of the conveying passage 4. Pu (not shown) to push the liquid. In the embodiment of FIG. 1, but not limited to, by means of spring plating, the liquid is fed upward from the lower side of the plating tank 3, thereby offsetting the precipitation effect of gravity on the non-metal material in the plating solution, but due to electroplating The liquid in the tank 2 is not as intensely stirred as in the homogenizing tank 1, so that there is still a gradual precipitation, and it is even possible to condense into a block. Therefore, a stopper 7 is provided in the plating tank 2 near the bottom to avoid The precipitated, agglomerated non-metallic material blocks the outlet of the delivery channel 4 or falls back into the delivery channel 4.

請繼續參閱圖1,在電鍍槽2內還包括一金屬塊6連接到直流電正極60,用以提供金屬離子電鍍在試片3上,試片3則被一馬達30轉動,以利複合材料附著於試片3,此外,尚有一直流電負極31透過馬達30內與試片3之間的電路(圖中未揭示)與試片3電連接,以使金屬離子可以獲得電子並吸附於試片3上。由於均質槽1內的液體會輸送到電鍍槽2內,因此電鍍槽2內的液體可能過多而溢出,因此,本發明的製造設備在均質槽1與電鍍槽2之間更設置一溢流通道5,且朝向均質槽1傾斜,當電鍍槽2內的液體液面高到溢流通道5之處時液體就會順勢流入均質槽1內。此外,在電鍍槽2內更可增設一電場整流遮板20,使得電場盡可能集中通過至試片3上。電場整流遮板20通常是一中間開孔的薄板,開孔的直徑則配合試片3的長度,開孔直徑至少等於試片3的長度。Referring to FIG. 1 , a metal block 6 is further connected to the DC positive electrode 60 in the plating tank 2 for providing metal ion plating on the test piece 3, and the test piece 3 is rotated by a motor 30 to facilitate the adhesion of the composite material. In the test strip 3, in addition, a DC negative electrode 31 is electrically connected to the test strip 3 through a circuit (not shown) between the motor 30 and the test strip 3, so that metal ions can acquire electrons and adsorb on the test strip 3. on. Since the liquid in the homogenizing tank 1 is transported into the plating tank 2, the liquid in the plating tank 2 may overflow too much. Therefore, the manufacturing apparatus of the present invention further provides an overflow passage between the homogenizing tank 1 and the plating tank 2. 5, and inclined toward the homogenizing tank 1, when the liquid level in the plating tank 2 is high to the overflow passage 5, the liquid flows into the homogenizing tank 1 at a proper rate. In addition, an electric field rectifying shutter 20 may be further added to the plating tank 2 so that the electric field is concentrated as much as possible onto the test piece 3. The electric field rectifying shutter 20 is usually a thin plate having an intermediate opening, and the diameter of the opening is matched with the length of the test piece 3, and the opening diameter is at least equal to the length of the test piece 3.

請參閱圖2,為本發明的另一實施例示意圖。其中,本發明的複合材料電鍍設備呈現一整體狀,即是一本體但分隔成為一電鍍槽2與一均質槽1,亦可說是圖1的電鍍槽2與均質槽1以共用一個槽壁的方式減少橫向的體積。均質槽1與電鍍槽2之間亦具有溢流缺口5’用以當電鍍槽2內的液面高過溢流缺口5’時,可以直接回流到均質槽1,因而達到直接回收的效果。均質槽1內亦具有一攪拌馬達12轉動一攪拌器10,用以擾動電解液,進而使當中的非金屬材料隨著電解液一起流動,使非金屬材料本身得以均勻的散布在電解液內。不過,由於在攪拌液體的同時會使液體溫度升高,因此並不是一開機之後攪拌器10就持續動作,只要均勻度達到需求即可停止攪拌馬達12。並可依據經驗決定在停止攪拌多久時間之後再次啟動攪拌馬達12。Please refer to FIG. 2, which is a schematic diagram of another embodiment of the present invention. Wherein, the composite plating apparatus of the present invention exhibits an integral shape, that is, a body but separated into a plating tank 2 and a homogeneous tank 1, and it can be said that the plating tank 2 and the homogenizing tank 1 of FIG. 1 share a tank wall. The way to reduce the lateral volume. An overflow notch 5' is also provided between the homogenizing tank 1 and the plating tank 2 for directly returning to the homogenizing tank 1 when the liquid level in the plating tank 2 is higher than the overflow notch 5', thereby achieving the effect of direct recovery. The homogenization tank 1 also has a stirring motor 12 rotating an agitator 10 for disturbing the electrolyte, so that the non-metallic material flows along with the electrolyte, so that the non-metal material itself is uniformly dispersed in the electrolyte. However, since the temperature of the liquid is raised while stirring the liquid, the agitator 10 does not continue to operate after the start-up, and the agitation motor 12 can be stopped as long as the uniformity reaches the demand. It is also possible to empirically decide to start the stirring motor 12 again after stopping the stirring for a long time.

請繼續參閱圖2,均質槽1內的液體透過一輸送通道4送至電鍍槽2,在輸送通道4的路徑上則設置一幫浦8來輸送液體。當然,圖2的實施例仍可以圖1所示的湧泉鍍的方式,自電鍍槽2的下方將液體輸送其內部,不過,圖2的實施例則揭示了另一種方式供給液體,即自電鍍槽2的上方透過淋浴孔40灑落在電鍍槽2內,因此,液體內的非金屬材料會因為重力而沉降,並抵達試片3所在,並且當金屬塊6的成分溶解於電鍍槽2而成的金屬離子電鍍於試片3上時,非金屬材料也會一同附著在試片3上,如此即達到了複合材料製造的效果。此外,在電鍍槽2下方亦具有一止擋件7用以阻擋金屬塊6向下掉落。而在電鍍槽2的下方末端則具有一蓋體21,經過長時間的運作之後,以重力沉降的方式運作的電鍍槽,其中的非金屬材料會逐漸的沉積在電鍍槽2最底部,為了便於清理故在電鍍槽2最底部設置了一蓋體21,除了可以在不翻轉電鍍槽2的狀況下排出液體之外,還可以讓非金屬材料蒐集在蓋體21內,對於清潔電鍍槽2與回收非金屬材料而言十分的簡便,較佳者,可以將電鍍槽2的底部設計為漸縮的漏斗狀,以更能達到將非金屬材料集中沉積在蓋體21內的效果。此外,在電鍍槽2內更可增設一電場整流遮板20,使得電場盡可能集中通過至試片3上。電場整流遮板20通常是一中間開孔的薄板,開孔的直徑則配合試片3的長度,開孔直徑至少等於試片3的長度。Referring to FIG. 2, the liquid in the homogenization tank 1 is sent to the plating tank 2 through a conveying passage 4, and a pump 8 is disposed in the path of the conveying passage 4 to transport the liquid. Of course, the embodiment of FIG. 2 can still transport the liquid from the bottom of the plating tank 2 by means of the spring plating method shown in FIG. 1. However, the embodiment of FIG. 2 discloses another way of supplying the liquid, that is, The upper portion of the plating tank 2 is sprinkled through the shower hole 40 in the plating tank 2, so that the non-metal material in the liquid settles due to gravity and reaches the test piece 3, and when the composition of the metal block 6 is dissolved in the plating tank 2 When the formed metal ions are electroplated on the test piece 3, the non-metal materials are also attached to the test piece 3 together, thus achieving the effect of the composite material. In addition, a stopper 7 is also provided under the plating tank 2 for blocking the metal block 6 from falling downward. At the lower end of the plating tank 2, there is a lid body 21. After a long period of operation, the electroplating tank operated by gravity sedimentation, wherein the non-metal material is gradually deposited at the bottom of the plating tank 2, for the convenience. Therefore, a cover body 21 is disposed at the bottom of the plating tank 2, and in addition to discharging the liquid without inverting the plating tank 2, non-metallic materials can be collected in the cover body 21 for cleaning the plating tank 2 and The recycling of the non-metallic material is very simple. Preferably, the bottom of the plating tank 2 can be designed as a tapered funnel shape, so that the effect of depositing non-metallic materials in the lid body 21 can be more effectively achieved. In addition, an electric field rectifying shutter 20 may be further added to the plating tank 2 so that the electric field is concentrated as much as possible onto the test piece 3. The electric field rectifying shutter 20 is usually a thin plate having an intermediate opening, and the diameter of the opening is matched with the length of the test piece 3, and the opening diameter is at least equal to the length of the test piece 3.

綜上所述,本發明「複合材料製造設備」就是讓均質槽在完成了均質作業之後,可以立即直接的將液體送到電鍍槽內進行電鍍,從而使的均質後的非金屬材料可以在電鍍製程中附著在試片上,以免如同習用技術於運輸均質液體的過程中產生沉積、結塊的現象,而本發明由於是直接將均質後的液體送入電鍍槽,故非金屬材料是來不及沉澱、或結塊的。且更進一步的透過湧泉鍍來減緩沉澱、或是以沉降的方式盡可能的減少液體的擾動來供給非金屬材料。此外,更以一溢流通道或是溢流缺口使得當電鍍槽內的液體過多時,讓多餘的液體回到均質槽內,如此便可立即的將液體重複使用,而不用如同習用技術一般須先另行蒐集多餘的液體再送回均質槽內重新均質。由此觀之,本發明的製造設備將均質與電鍍兩個製程整合成近乎一個步驟,亦即在均質之後可以迅速的電鍍,大幅度的減少了均質液體於搬運、輸送過程中沉澱、結塊的可能性,由於沉澱、沉積、或結塊的可能性大幅減少,雖然不可能降為零,但是至少本發明也將這些不良現象的程度降至極低,透過直接將均質液體供給至電鍍槽的方式既然可以大幅減低非金屬材料沉澱、結塊的可能性,也就是說在電鍍過程中,非金屬材料可以更均勻的附著在試片上。本發明透過相鄰設置的均質槽與電鍍槽,將均質液體的運送時間與路途縮至最短以盡可能的避免沉積、沉澱、或結塊的現象產生,如此即可增加複合材料製造的良率,可見本發明對於複合材料的製造技術具有莫大的貢獻。In summary, the "composite material manufacturing equipment" of the present invention allows the homogenization tank to directly and directly pump the liquid into the plating tank after the homogenization operation is completed, so that the homogenized non-metal material can be electroplated. The process is attached to the test piece to prevent deposition and agglomeration during the process of transporting the homogeneous liquid. However, since the present invention directly feeds the homogeneous liquid into the plating tank, the non-metallic material is too late to precipitate. Or agglomerated. Further, the spring is plated to slow down the precipitation, or the sedimentation is used to reduce the disturbance of the liquid as much as possible to supply the non-metallic material. In addition, an overflow channel or overflow gap allows the excess liquid to be returned to the homogenization tank when there is too much liquid in the plating tank, so that the liquid can be reused immediately without the need for conventional techniques. The additional liquid is collected separately and sent back to the homogenization tank for re-homogenization. From this point of view, the manufacturing apparatus of the present invention integrates the two processes of homogenization and electroplating into nearly one step, that is, rapid electroplating after homogenization, and greatly reduces the precipitation and agglomeration of the homogeneous liquid during handling and transportation. The possibility of precipitation, deposition, or agglomeration is greatly reduced, although it is impossible to reduce to zero, but at least the present invention also reduces the extent of these undesirable phenomena to a very low level by directly supplying the homogeneous liquid to the plating tank. Since the method can greatly reduce the possibility of precipitation and agglomeration of non-metallic materials, that is, non-metallic materials can be more uniformly attached to the test piece during the electroplating process. The invention reduces the transportation time and the path of the homogeneous liquid to the shortest by the homogenization groove and the plating tank disposed adjacent to each other to avoid deposition, precipitation, or agglomeration as much as possible, thereby increasing the yield of the composite material manufacturing. It can be seen that the present invention contributes greatly to the manufacturing technology of composite materials.

實施例:Example:

1. 一種複合材料電鍍設備,包括:一均質槽,內設有一攪拌棒;以及一電鍍槽,鄰接於該均質槽,其中,該均質槽與該電鍍槽透過一溢流通道相互連通,且透過一幫浦將均質槽內的物質送入該電鍍槽。A composite plating apparatus comprising: a homogenizing tank having a stirring rod therein; and a plating tank adjacent to the homogenizing tank, wherein the homogenizing tank and the plating tank communicate with each other through an overflow passage A pump feeds the contents of the homogenization tank into the plating tank.

2. 如實施例1所述的設備,其中該溢流通道是連通該均質槽與該電鍍槽的上部。2. The apparatus of embodiment 1, wherein the overflow passage is an upper portion that communicates the homogenous tank with the plating tank.

3. 如實施例1所述的設備,更包括一輸送管路,連通該均質槽與該電鍍槽的下部,其中該幫浦是設於該輸送管路上。3. The apparatus of embodiment 1, further comprising a delivery line communicating the homogenous trough and a lower portion of the electroplating tank, wherein the pump is disposed on the delivery line.

4. 一種複合材料電鍍設備,包括:一本體,並分隔為一電鍍槽以及一均質槽;以及一輸送幫浦,將該均質槽內的材料輸送至該電鍍槽。4. A composite plating apparatus comprising: a body separated into a plating bath and a homogenizing tank; and a transport pump that transports material in the homogenizing tank to the plating tank.

5. 如實施例4所述的電鍍設備,其中在該電鍍槽與該均質槽之間更具有一溢流缺口,使該電鍍槽中的液體可以溢流至該均質槽。5. The electroplating apparatus of embodiment 4, wherein there is an overflow gap between the plating bath and the homogenization tank, so that liquid in the plating tank can overflow to the homogenization tank.

6. 如實施例4所述的電鍍設備,其中該均質槽內的材料是以湧泉方式輸送至該電鍍槽內。6. The electroplating apparatus of embodiment 4, wherein the material in the homogenous trough is delivered to the electroplating bath in a spring manner.

7. 如實施例4所述的電鍍設備,其中該均質槽內的材料是由該電鍍槽的上方注入。7. The electroplating apparatus of embodiment 4, wherein the material in the homogenization tank is injected from above the plating bath.

8. 一種複合材料電鍍設備,包括:一均質槽;以及一電鍍槽,其中,該均質槽與該電鍍槽的上部以一向該均質槽傾斜的溢流通道連接,而該均質槽與該電鍍槽的底部則透過一輸送通道予以連通,使該均質槽輸送材料至該電鍍槽。8. A composite plating apparatus comprising: a homogenization tank; and a plating tank, wherein the homogenization tank and the upper portion of the plating tank are connected by an overflow passage inclined to the homogenization tank, and the homogenization tank and the plating tank The bottom of the bottom is communicated through a delivery channel that causes the homogenous trough to deliver material to the plating bath.

9. 實施例8所述的電鍍設備,其中該均質槽與該電鍍槽合為一雙槽體結構。9. The electroplating apparatus of embodiment 8, wherein the homogenizing tank and the electroplating tank are combined into a double tank structure.

10. 如實施例8所述的電鍍設備,其中該電鍍槽內更設有一電場整流遮板。10. The electroplating apparatus of embodiment 8, wherein the electroplating bath is further provided with an electric field rectifying shutter.

上述實施例僅係為了方便說明而舉例,雖遭熟悉本技藝之人士任施匠思而為諸般修飾,然皆不脫如附申請專利範圍所欲保護者。The above-described embodiments are merely examples for the convenience of the description, and those skilled in the art will be modified as described above, and are not intended to be protected as claimed.

1...均質槽1. . . Homogeneous trough

10...攪拌棒10. . . Stir bar

12...攪拌馬達12. . . Mixing motor

2...電鍍槽2. . . Plating tank

20...電場整流遮板20. . . Electric field rectifying shutter

21...蓋體twenty one. . . Cover

3...試片3. . . Audition

30...馬達30. . . motor

31...直流電負極31. . . DC negative

4...輸送通道4. . . Conveying channel

40...淋浴孔40. . . Shower hole

5...液流通道5. . . Flow channel

5’...溢流孔5’. . . Overflow hole

6...金屬塊6. . . Metal block

60...直流電正極60. . . DC positive electrode

7...止擋件7. . . Stop

8...幫浦8. . . Pump

圖1,為本發明的實施例示意圖;以及Figure 1 is a schematic view of an embodiment of the present invention;

圖2,為本發明的另一實施例示意圖。2 is a schematic view of another embodiment of the present invention.

1...均質槽1. . . Homogeneous trough

10...攪拌棒10. . . Stir bar

12...攪拌馬達12. . . Mixing motor

2...電鍍槽2. . . Plating tank

20...電場整流遮板20. . . Electric field rectifying shutter

3...試片3. . . Audition

30...馬達30. . . motor

31...直流電負極31. . . DC negative

4...輸送通道4. . . Conveying channel

5...溢流通道5. . . Overflow channel

6...金屬塊6. . . Metal block

60...直流電正極60. . . DC positive electrode

7...止擋件7. . . Stop

Claims (10)

一種複合材料電鍍設備,包括:一均質槽,內設有一攪拌棒;以及一電鍍槽,鄰接於該均質槽,其中,該均質槽與該電鍍槽透過一溢流通道相互連通,且透過一幫浦將均質槽內的物質送入該電鍍槽。A composite material electroplating apparatus comprising: a homogenizing tank having a stirring rod therein; and a plating tank adjacent to the homogenizing tank, wherein the homogenizing tank and the plating tank communicate with each other through an overflow passage, and through a group of Pu sent the substance in the homogenization tank to the plating tank. 如申請專利範圍第1項所述的設備,其中該溢流通道是連通該均質槽與該電鍍槽的上部。The apparatus of claim 1, wherein the overflow passage is an upper portion that communicates the homogenous tank with the plating tank. 如申請專利範圍第1項所述的設備,更包括一輸送管路,連通該均質槽與該電鍍槽的下部,其中該幫浦是設於該輸送管路上。The apparatus of claim 1, further comprising a delivery line connecting the homogenous trough and a lower portion of the electroplating tank, wherein the pump is disposed on the delivery line. 一種複合材料電鍍設備,包括:一本體,並分隔為一電鍍槽以及一均質槽;以及一輸送幫浦,將該均質槽內的材料輸送至該電鍍槽。A composite plating apparatus includes: a body divided into a plating tank and a homogenizing tank; and a transport pump that transports material in the homogenizing tank to the plating tank. 如申請專利範圍第4項所述的電鍍設備,其中在該電鍍槽與該均質槽之間更具有一溢流缺口,使該電鍍槽中的液體可以溢流至該均質槽。The electroplating apparatus of claim 4, wherein an overflow gap is formed between the plating tank and the homogenization tank, so that liquid in the plating tank can overflow to the homogenization tank. 如申請專利範圍第4項所述的電鍍設備,其中該均質槽內的材料是以湧泉方式輸送至該電鍍槽內。The electroplating apparatus according to claim 4, wherein the material in the homogenization tank is conveyed into the plating tank in a spring manner. 如申請專利範圍第4項所述的電鍍設備,其中該均質槽內的材料是由該電鍍槽的上方注入。The electroplating apparatus of claim 4, wherein the material in the homogenization tank is injected from above the plating tank. 一種複合材料電鍍設備,包括:一均質槽;以及一電鍍槽,其中,該均質槽與該電鍍槽的上部以一向該均質槽傾斜的溢流通道連接,而該均質槽與該電鍍槽的底部則透過一輸送通道予以連通,使該均質槽輸送材料至該電鍍槽。A composite plating apparatus comprising: a homogenization tank; and a plating tank, wherein the homogenization tank is connected to an upper portion of the plating tank by an overflow passage inclined toward the homogenization tank, and the homogenization tank and the bottom of the plating tank Then, through a conveying passage, the homogeneous tank conveys material to the plating tank. 如申請專利範圍第8項所述的電鍍設備,其中該均質槽與該電鍍槽合為一雙槽體結構。The electroplating apparatus according to claim 8, wherein the homogenizing tank and the electroplating tank are combined into a double tank structure. 如申請專利範圍第8項所述的電鍍設備,其中該電鍍槽內更設有一電場整流遮板。The electroplating apparatus of claim 8, wherein the electroplating bath is further provided with an electric field rectifying shutter.
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