TW201325320A - Homogeneous permanent magnetic field generation device - Google Patents

Abstract

A homogeneous permanent magnetic field generation device comprises a permeability backboard; a magnet stone board disposed on a surface of the permeability backboard; a permeability frame disposed to a surface of the magnet board, wherein each surface of the permeability frame is respectively disposed with a side magnet board, and a vacuum chamber is formed between the magnet board and the permeability frame. Accordingly, it can be supplied for the utilization of the electron cyclotron resonant plasma generation equipment to allow the inside of the vacuum chamber to generate the permanent magnetic field having high intensity and homogeneous by incorporating with the permeability backboard, the upper magnet, the permeability frame and the side magnet board. Moreover, while in use, it does not need to supply electricity and perform cooling neither, thereby achieving efficacies of effectively reducing costs and utilization space.

Description

Uniform permanent magnetic field generating device

The invention relates to a uniform permanent magnetic field generating device, in particular to a device capable of providing an electron cyclotron resonance plasma generating device, and the vacuum chamber can be made by using a magnetically conductive back plate, an upper magnet, a magnetic conducting frame and a side magnet plate. The body produces a high-intensity and uniform permanent magnetic field, and does not require power supply and cooling when used, thereby achieving the effect of reducing cost and reducing the use space.

According to the general electron cyclotron resonance plasma generating device, a large-area and uniform magnetic field must be provided for the reaction, and the source of the magnetic field is usually an electromagnet to generate a uniform magnetic field surface and control the distribution position thereof.

However, in view of the above-mentioned magnetic field source, not only a power supply and a large amount of electric energy are required, but also a cooling system is required to dissipate heat and cool the heating electromagnetic coil, so that not only the production and maintenance costs are relatively expensive, but also the electric power. The supply and cooling system settings take up more space.

In view of this, the inventors of this case have intensively discussed the above-mentioned problems of conventional inventions, and actively pursued solutions through years of experience in R&D and manufacturing of related industries. After long-term efforts in research and development, they finally succeeded in developing this book. The invention discloses a "uniform permanent magnetic field generating device" for improving various problems of the conventional use.

The main object of the present invention is to provide an electron cyclotron resonance plasma generating apparatus, and the magnetic magnetic backing plate, the upper magnet, the magnetic conducting frame and the side magnetic plate can be used to produce high strength and uniformity in the vacuum chamber. Permanent magnetic field, and does not require power supply and cooling when used, but can effectively reduce costs and reduce the use of space.

In order to achieve the above object, the present invention is a uniform permanent magnetic field generating device comprising: a magnetically conductive back plate; a magnet plate disposed on one side of the magnetically conductive back plate; and a magnetic conductive member disposed on one side of the upper magnet plate The frame body has a side magnet plate on each side of the magnetic conductive frame body, and a vacuum cabin body is formed between the upper magnet plate and the magnetic conductive frame body.

In an embodiment of the invention, the magnetically permeable back plate and the upper magnet plate are respectively provided with a plurality of corresponding openings for use by the microwave waveguide of the electron cyclotron resonance plasma generating device.

In an embodiment of the invention, each of the openings may have a different shape.

In an embodiment of the invention, the magnetically conductive backplane can be a flat surface.

In one embodiment of the present invention, the magnet plates on each side of the magnetically permeable frame are joined in an adjacent manner on both sides, so that the magnet plates on each side are coated and matched with the magnet plate to form a vacuum chamber.

In one embodiment of the invention, the specific location within the vacuum chamber produces a uniform magnetic field of 873 Gauss.

In an embodiment of the invention, the bottom of the magnetic shielding frame is provided with a magnet plate corresponding to the upper magnet plate, and the magnetic frame is matched with the upper and lower magnet plates to form a vacuum cabin.

Please refer to the "1, 2, 3, and 4" drawings, which are respectively a perspective view of a first embodiment of the present invention, a perspective exploded view of the first embodiment of the present invention, and another embodiment of the first embodiment of the present invention. A perspective view of the perspective of the perspective and a computer analysis diagram of the first embodiment of the present invention. As shown in the figure, the present invention is a uniform permanent magnetic field generating device comprising at least one magnetic backing plate 1, an upper magnet plate 2 and a magnetic conducting frame 3.

The magnetically permeable back plate 1 is provided with a plurality of openings 11 , and the openings 11 can be of different shapes for use by the microwave waveguide of the electron cyclotron resonance plasma generating device, and the magnetic conduction The back sheet 1 can also be a flat surface, and the present invention is exemplified by having the opening 11.

The upper magnet plate 2 is disposed on one surface of the magnetic conductive back plate 1, and the upper magnet plate 2 is also provided with a plurality of openings 21, and each of the openings 21 is respectively formed with the opening 11 of the magnetic conductive back plate 1. Corresponding.

The magnetic shielding frame 3 is disposed on one surface of the upper magnet plate 2, and the magnetic shielding frame body 3 has the function of converging magnetic lines of force, so as to prevent the magnetic lines from being scattered to the outside, and each surface of the magnetic shielding frame 3 is separately provided. The side magnet plates 31 are combined with the side magnet plates 31 so as to be adjacent to each other, so that the side magnet plates 31 are coated and fitted with the magnet plate 2 to form the vacuum chamber 32, and the vacuum chamber 32 is made. The specific location within the system produces a uniform magnetic field of 873 Gauss. If so, a new uniform permanent magnetic field generating device is constructed by the above design.

When the invention is used, it can provide an electron cyclotron resonance plasma generating device, and the array of distributed microwave sources is arranged with the opening 11 on the magnetically conductive back plate 1 and the opening 21 on the upper magnet plate 2. a wave tube (not shown), and the magnetic magnetic backing plate 1, the upper magnet 2, the magnetic shielding frame 3 and the side magnetic plate 31 can be used to generate a high-strength and uniform permanent magnetic field in the vacuum chamber 32; As shown in FIG. 4, the magnetic field of the vacuum chamber 32 is covered by a computer analyzing the magnetic backing plate 1, the upper magnet 2, the magnetic shielding frame 3 and the side magnetic plate 31 covering the magnetic field at a specific plane in the vacuum chamber 32. The magnetic field size distribution is about 815 Gauss to 942 Gauss, so the present invention can achieve a uniform magnetic field within ±10% of the 873 Gauss design error; and the present invention can at least achieve the following advantages:

1. The device can generate a large area of uniform permanent magnetic field, and its uniformity can be compared with the magnetic field generated by the American electromagnet.

2. This device does not need power supply and power supply, which can effectively reduce cost and space.

3. This device does not generate heat, so it does not require cooling water or a fan to cool it, which helps to reduce costs.

Please refer to FIG. 5, which is a schematic view of a second embodiment of the present invention. As shown in the figure, the present invention may be in the form of the second embodiment in addition to the configuration of the first embodiment described above, and the difference is that the bottom of the magnetic shielding frame 3 is The magnetic plate 4 corresponding to the upper magnet plate 1 is disposed, and the upper and lower magnet plates 2 and 4 are matched in the magnetic conductive frame 3 to form a vacuum chamber 32. Thus, it is easier to achieve a uniform magnetic field for practical use. Needed.

In summary, the uniform permanent magnetic field generating device of the present invention can effectively improve various disadvantages of the conventional use, and can provide an electron cyclotron resonance plasma generating device, and can utilize a magnetic conductive back plate, an upper magnet, a magnetic conductive frame and a side magnetic plate. The combination produces a high-strength and uniform permanent magnetic field in the vacuum chamber, and does not require power supply and cooling during use, thereby achieving the effect of effectively reducing the cost and reducing the use space; thereby further improving the production of the present invention. Practical and more in line with the needs of consumers, it has indeed met the requirements of the invention patent application, and filed a patent application according to law.

However, the above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto; therefore, the simple equivalent changes and modifications made in accordance with the scope of the present invention and the contents of the invention are modified. All should remain within the scope of the invention patent.

1. . . Magnetic backplane

11. . . Opening

2. . . Upper magnet plate

twenty one. . . Opening

3. . . Magnetic frame

31. . . Side magnet plate

32. . . Vacuum chamber

4. . . Lower magnet plate

Fig. 1 is a perspective view showing the appearance of a first embodiment of the present invention.

Fig. 2 is a perspective exploded view showing the first embodiment of the present invention.

Fig. 3 is a perspective view showing the perspective of another angle of the first embodiment of the present invention.

Fig. 4 is a schematic diagram of computer analysis of the first embodiment of the present invention.

Figure 5 is a schematic view of a second embodiment of the present invention.

1. . . Magnetic backplane

11. . . Opening

2. . . Upper magnet plate

twenty one. . . Opening

3. . . Magnetic frame

31. . . Side magnet plate

32. . . Vacuum chamber

Claims (7)

A uniform permanent magnetic field generating device comprises: a magnetically conductive back plate; an upper magnet plate disposed on one surface of the magnetic conductive back plate; and a magnetic conductive frame body disposed on one surface of the upper magnet plate Each side of the magnetic shielding frame is provided with a side magnet plate, and a vacuum chamber is formed between the upper magnet plate and the magnetic shielding frame. The uniform permanent magnetic field generating device according to claim 1, wherein the magnetic conducting back plate and the upper magnet plate are respectively provided with a plurality of corresponding openings for the microwave guiding of the electron cyclotron resonance plasma generating device. Wave tube use. The uniform permanent magnetic field generating device according to claim 2, wherein each of the openings is different in shape. The uniform permanent magnetic field generating device according to claim 1, wherein the magnetically conductive back plate is a flat surface. The uniform permanent magnetic field generating device according to claim 1, wherein the magnet plates of each side of the magnetic shielding frame are combined in an adjacent manner on both sides, so that the magnet plates on each side are coated and matched with the magnet plate. The vacuum chamber is formed. The uniform permanent magnetic field generating device according to claim 1, wherein the specific position in the vacuum chamber produces a uniform magnetic field of 873 Gauss. The uniform permanent magnetic field generating device according to claim 1, wherein the bottom of the magnetic shielding frame is provided with a magnet plate corresponding to the upper magnet plate, and the magnetic shielding frame is matched with the upper and lower magnet plates. The vacuum chamber is formed.