TW201314706A - Device of chemical and electrochemical decontaminations - Google Patents

Device of chemical and electrochemical decontaminations Download PDF

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TW201314706A
TW201314706A TW100135378A TW100135378A TW201314706A TW 201314706 A TW201314706 A TW 201314706A TW 100135378 A TW100135378 A TW 100135378A TW 100135378 A TW100135378 A TW 100135378A TW 201314706 A TW201314706 A TW 201314706A
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electrochemical
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TWI457948B (en
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Kou-Min Lin
Tsong-Yang Wei
Chin-Hsiang Kan
Ming-Shin Wu
Jen-Chieh Chung
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Atomic Energy Council
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Abstract

A device is provided for decontamination of radioactive polluted metal materials. Metal materials having complicated shapes are decontaminated through a chemical method; and, those having simple shapes, through a chemical or electrochemical method. Thus, radioactive polluted metal materials are decontaminated in a short time for achieving a decontamination ratio higher than 86%. The decontaminated metal materials can be recycled to release burden on finding places for storing radioactive polluted waste.

Description

化學及電化學除污裝置及其方法Chemical and electrochemical decontamination device and method thereof

本發明係有關於一種化學及電化學除污裝置及其方法,尤指涉及一種以無機除污劑對放射性污染金屬廢棄物進行除污,特別係指可達到86%以上污染金屬除污並回收再利用,俾以減緩放射性廢棄物儲存庫倉儲壓力之功效者。The invention relates to a chemical and electrochemical decontamination device and a method thereof, in particular to a decontamination of radioactively contaminated metal waste by an inorganic decontaminant, in particular to decontamination and recovery of more than 86% of contaminated metal. Reuse, to reduce the effectiveness of the storage pressure of the radioactive waste repository.

一座1,000兆瓦(MWe)壓水式或沸水式反應器每年運轉維修可能約產生數十噸左右之污染廢金屬;而將來除役拆廠時,約將產生10,000噸之污染鋼鐵。我國現正運轉中之核能發電廠有三座,運轉維修每年約會產生50噸左右之污染廢金屬,未來三座核能電廠除役,約將產生30,000噸之污染鋼鐵,經適當除污後,將可使86%以上不必進入最終處置場,且可資源回收再利用,故建立適當之除污設施,係可有利於放射性污染廢棄物之處置。A 1,000 megawatt (MWe) pressurized water or boiling water reactor can produce about tens of tons of contaminated scrap metal every year. In the future, about 10,000 tons of contaminated steel will be produced. There are three nuclear power plants in operation in China. The operation and maintenance will produce about 50 tons of contaminated scrap metal every year. The three nuclear power plants will be decommissioned in the future, which will produce about 30,000 tons of contaminated steel. After proper decontamination, it will be More than 86% do not have to enter the final disposal site, and resources can be recycled and reused. Therefore, the establishment of appropriate decontamination facilities can be beneficial to the disposal of radioactive waste.

目前核設施除役作業產生之廢棄物,經適當分類且低放射性污染金屬經除污後,僅剩約3%之放射性廢棄物須送達最終處置場處理,5%可資源回收,約92%可送一般事業廢棄物處置場,可見除污設施對低放射性污染廢棄物之處理,可使絕大部份低放射性污染廢棄物不必進入最終處置場,故建立適當之除污設施,係可有利於放射性污染廢棄物之處置,且為刻不容緩亟待建立之設施。At present, the waste generated by the decommissioning operation of nuclear facilities, after proper classification and low-level radioactive pollution of the metal, only about 3% of the radioactive waste must be delivered to the final disposal site, and 5% can be recycled, about 92%. Sending to the general business waste disposal site, it can be seen that the disposal of low-level radioactive waste by the decontamination facilities can make most of the low-level radioactive wastes not have to enter the final disposal site. Therefore, it is beneficial to establish appropriate decontamination facilities. Disposal of radioactively contaminated waste, and facilities that need to be established without delay.

按現有化學除污技術包括有:According to the existing chemical decontamination technology, there are:

(1)還原氧化試劑(Redox),使用之國家有日本與中國:(1) Reducing oxidizing reagent (Redox), the countries used are Japan and China:

a.氧化:增加金屬離子氧化態,如:鹼性高錳酸鹽;a. Oxidation: increase the oxidation state of metal ions, such as: alkaline permanganate;

Cr(III)?Cr(IV)(CrO4 2-);Cr(III)? Cr(IV)(CrO 4 2- );

b.還原:增加鐵陽離子溶解度(還原酸溶解)。b. Reduction: increase the solubility of iron cations (reducing acid dissolution).

(2)化學氧化還原反應(CODR),使用之國家有德國(核電廠計畫(VAK plan))、瑞典(奧斯卡桑核電站(OsKarshamn unit)),比利時(壓水式反應器(BR3))及俄國:(2) Chemical redox reaction (CODR), using countries such as Germany (VAK plan), Sweden (OsKarshamn unit), Belgium (pressurized water reactor (BR3)) and Russia:

a.氧化:鹼性高錳酸;a. oxidation: alkaline permanganic acid;

b.還原:二羧基的(Dicarboxylic)。b. Reduction: Dicarboxylic.

後續處理:利用離子交換或蒸發溶劑。Subsequent treatment: use of ion exchange or evaporation of solvent.

(3)POD,使用之國家有俄國(水-水動力反應器(WWER reactor)):其除污原理與CODR類似,還原酸試劑改為有機試劑(草酸)。(3) POD, the country of use is Russia (WWER reactor): its decontamination principle is similar to CODR, and the reducing acid reagent is changed to organic reagent (oxalic acid).

後續處理:可採用紫外線(UV)降解。Subsequent treatment: UV (UV) degradation can be used.

(4)CAN-DECON,使用之國家為加拿大(原子能公司(AECL)):其採用之除污劑為乙二胺四乙酸(Ethylene Diamine Tetraacetic Acid,EDTA)、檸檬酸及草酸;利用還原性酸溶解,EDTA具螯合作用,以及鹼性高錳酸鉀(AP)、酸性高錳酸鉀(NP)預氧化之原理,在0.1%除污劑、95~120℃以及24~30小時(hr)之除污條件下進行除污。(4) CAN-DECON, the country of use is Canada (Atomic Energy Corporation (AECL)): the decontaminant used is Ethylene Diamine Tetraacetic Acid (EDTA), citric acid and oxalic acid; using reducing acid Dissolution, EDTA chelation, and the principle of alkaline potassium permanganate (AP), acid potassium permanganate (NP) pre-oxidation, in 0.1% detergent, 95 ~ 120 ° C and 24 ~ 30 hours (hr Decontamination under decontamination conditions.

除污方法:首先灌水、加溫、除氣;其次加入除污劑升溫循環;最後於必要時追加除污劑或利用陽離子樹脂再生除污劑。Decontamination method: firstly watering, heating, degassing; secondly adding a decontaminating agent to heat up the cycle; finally adding a decontaminating agent if necessary or regenerating the decontaminating agent with a cationic resin.

(5)低氧化態金屬離子(Low Oxidation state Metal Ion,LOMI),使用之國家為英國(電力公司(CEGB))及美國(電力研究院(EPRI)):其採用之除污劑為二價釩甲酸鹽(Vanadous formate)及吡啶甲酸(Picolinic acid);利用V+2作還原酸溶解,吡啶甲酸具螯合作用,以及AP、NP預氧化之原理,在0.3~0.7%除污劑、75~95℃以及4~8hr之除污條件下進行除污。(5) Low Oxidation State Metal Ion (LOMI), used in the United Kingdom (Power Company (CEGB)) and the United States (Electrical Research Institute (EPRI)): the decontaminant used is bivalent Vanadous formate and picolinic acid; using V + 2 for reducing acid dissolution, picolinic acid with chelation, and AP, NP pre-oxidation principle, in 0.3-0.7% detergent, Decontamination is carried out under decontamination conditions of 75 to 95 ° C and 4 to 8 hr.

除污方法:首先灌水、加溫、除氣;其次加入氫氧化鈉(NaOH)及吡啶甲酸;最後加入釩甲酸鹽。Decontamination method: first watering, heating, degassing; secondly adding sodium hydroxide (NaOH) and picolinic acid; finally adding vanadium formate.

(6)檸檬酸草酸(Citric plus Oxalic acids,CITROX),使用之國家為美國(陶氏化學(Dow Chemical))、英國(CECO):其採用之除污劑為檸檬酸氨及草酸;利用還原性酸溶解,草酸具螯合作用,以及AP預氧化之原理,在0.2~0.3%除污劑、85~90℃以及5~20hr之除污條件下進行除污。(6) Citric plus Oxalic acids (CITROX), the countries used are the United States (Dow Chemical), the United Kingdom (CECO): the decontaminants used are citric acid ammonia and oxalic acid; Acidic acid dissolution, oxalic acid chelation, and AP pre-oxidation principle, decontamination under 0.2 to 0.3% decontaminant, 85-90 ° C and 5-20 hr decontamination conditions.

除污方法:首先灌水、加溫、除氣;最後加入除污劑。Decontamination method: first watering, heating, degassing; finally adding decontaminant.

(7)NS-1,使用之國家為法國(電力公司(EDF)):其採用之除污劑為EDTA、有機酸及無機酸;利用酸溶解及還原性溶解,維他命C具螯合作用,以及NP預氧化之原理,在0.7~1%除污劑、80℃以及5~10hr之除污條件下進行除污。(7) NS-1, the country of use is France (Electric Power Company (EDF)): the decontaminant used is EDTA, organic acid and inorganic acid; using acid dissolution and reducing dissolution, vitamin C has chelation, And the principle of NP pre-oxidation, decontamination under 0.7 to 1% detergent, 80 ° C and 5-10 hr decontamination conditions.

除污方法:首先灌水、加溫、除氣;最後加入除污劑。Decontamination method: first watering, heating, degassing; finally adding decontaminant.

(8)OZOX/CORD,使用之國家為德國(西門子公司(Siemens)):其採用之除污劑為草酸;利用還原性溶解,草酸具螯合作用,以及高錳酸預氧化之原理,在0.2%除污劑、95℃以及3~5hr之除污條件下進行除污。(8) OZOX/CORD, the country of use is Germany (Siemens): the decontaminant used is oxalic acid; the use of reducing solubility, oxalic acid chelation, and the principle of permanganic preoxidation Decontamination was carried out under 0.2% decontaminant, 95 ° C and 3 to 5 hr decontamination conditions.

除污方法:首先灌水、加溫、除氣;最後加入除污劑。Decontamination method: first watering, heating, degassing; finally adding decontaminant.

(9)EMMAC,使用之國家為法國(電力公司(EDF)):其採用之除污劑為維他命C及硝酸,利用酸溶解及還原性溶解,維他命C具螯合作用,以及NP預氧化之原理,在0.7~1%除污劑,80℃以及5~10hr之除污條件下進行除污。(9) EMMAC, the country of use is France (Electric Power Company (EDF)): its decontaminant is vitamin C and nitric acid, acid dissolution and reductive dissolution, vitamin C chelation, and NP pre-oxidation Principle, decontamination is carried out under a decontamination condition of 0.7 to 1% of a detergent, 80 ° C and 5 to 10 hr.

除污方法:首先灌水、加溫、除氣;最後加入除污劑。Decontamination method: first watering, heating, degassing; finally adding decontaminant.

以上介紹之除污方法,皆需長時間操作,且除污劑絕大部分係有機成份之除污劑,對二次廢棄物之處理較為不利。故,一般習用者係無法符合使用者於實際使用時之所需。The decontamination methods described above all require long-term operation, and most of the decontaminants are decontaminants of organic components, which are disadvantageous for the treatment of secondary waste. Therefore, the general practitioners cannot meet the needs of the user in actual use.

本發明之主要目的係在於,克服習知技藝所遭遇之上述問題並提供一種以無機除污劑對放射性污染金屬廢棄物進行除污,可達到86%以上污染金屬除污並回收再利用,俾以減緩放射性廢棄物儲存庫倉儲壓力之功效者。The main object of the present invention is to overcome the above problems encountered in the prior art and to provide a kind of inorganic decontaminating agent for decontaminating radioactive contaminated metal waste, which can achieve more than 86% of contaminated metal decontamination and recycling. To reduce the effectiveness of storage pressure on radioactive waste storage.

為達以上之目的,本發明係一種化學及電化學除污裝置及其方法,該除污裝置係包括有:一注入一脫脂液之脫脂單元;一設於該脫脂單元一側之第一水洗單元;一設於該第一水洗單元一側之第一化學拋光單元,係注入一25W.T.%之化學除污劑;一設於該第一化學拋光單元一側之第二化學拋光單元,係注入一45W.T.%之化學除污劑;一設於該第二化學拋光單元一側之第一藥液回收單元;一設於該第一藥液回收單元一側之電化學拋光單元,係注入一45W.T.%之電化學除污劑;一設於該電化學拋光單元一側之第二藥液回收單元;一設於該第二藥液回收單元一側之第二水洗單元;一設於該第二水洗單元一側之第三水洗單元;一設於第三水洗單元一側之超音波水洗單元;一設於該超音波水洗單元一側之風切單元;以及一設於該風切單元一側之烘乾單元。該除污方法係以待除污物件形狀分類,以形狀複雜之金屬採用化學除污,形狀規則之金屬採用化學或電化學除污。For the purpose of the above, the present invention is a chemical and electrochemical decontamination apparatus and method thereof, the decontamination apparatus comprising: a degreasing unit for injecting a degreasing liquid; and a first water washing provided on one side of the degreasing unit a first chemical polishing unit disposed on one side of the first water washing unit, injecting a 25W.T.% chemical decontaminant; and a second chemical polishing unit disposed on one side of the first chemical polishing unit Injecting a 45W.T.% chemical decontaminant; a first liquid recovery unit disposed on one side of the second chemical polishing unit; and an electrochemical polishing disposed on the side of the first chemical recovery unit The unit is injected with a 45W.T.% electrochemical decontaminant; a second liquid recovery unit disposed on one side of the electrochemical polishing unit; and a second disposed on the side of the second liquid recovery unit a water washing unit; a third water washing unit disposed on one side of the second water washing unit; an ultrasonic washing unit disposed on one side of the third water washing unit; and a wind cutting unit disposed on one side of the ultrasonic washing unit; A drying unit disposed on one side of the wind cutting unit. The decontamination method is classified according to the shape of the object to be decontaminated, and the metal having a complicated shape is chemically decontaminated, and the metal of the regular shape is chemically or electrochemically decontaminated.

於本發明之一實施例中,該脫脂液之主要成份為偏矽酸鈉24~30%、磷酸三鈉13~17%、純鹼9~11%、三聚磷酸鈉9~11%以及正矽酸鈉7~9%,並以1:10比例配製。In one embodiment of the present invention, the main components of the degreasing liquid are sodium metasilicate sulphate 24 to 30%, trisodium phosphate 13 to 17%, soda ash 9 to 11%, sodium tripolyphosphate 9 to 11%, and ruthenium. Sodium is 7 to 9% and is formulated at a ratio of 1:10.

於本發明之一實施例中,該脫脂液係可為40W.T.%之氫氧化鈉溶液。In one embodiment of the invention, the degreasing liquid can be a 40 W.T.% sodium hydroxide solution.

於本發明之一實施例中,該第一化學拋光單元之化學除污劑係包含有氟硼酸(HBF4)、礦物酸及氧化劑。In an embodiment of the invention, the chemical decontaminant of the first chemical polishing unit comprises fluoroboric acid (HBF 4 ), mineral acid and an oxidizing agent.

於本發明之一實施例中,該第二化學拋光單元之化學除污劑係包含有磷酸(H3PO4)、礦物酸及氧化劑。In an embodiment of the invention, the chemical decontaminant of the second chemical polishing unit comprises phosphoric acid (H 3 PO 4 ), mineral acid and an oxidizing agent.

於本發明之一實施例中,該電化學拋光單元之電化學除污劑係包含有磷酸、礦物酸及氧化劑。In an embodiment of the invention, the electrochemical cleaning agent of the electrochemical polishing unit comprises phosphoric acid, mineral acid and an oxidizing agent.

於本發明之一實施例中,該脫脂單元、該第一水洗單元、該第一化學拋光單元、該第二化學拋光單元、該第一藥液回收單元、該電化學拋光單元、該第二藥液回收單元、該第二水洗單元、該第三水洗單元、該超音波水洗單元、該風切單元以及該烘乾單元係設於一除污作業室中,該除污作業室兩側係設有一操作用走道及一維修用走道,而該除污作業室上係活動設有一吊運單元,且鄰近該脫脂單元與該烘乾單元之位置處係分別設有一上料區及一下料區,並於該除污作業室外側設有一操作機構、一脫脂液儲槽、一第一化學除污劑儲槽、一第二化學除污劑儲槽及一電化學除污劑儲槽,且該操作機構除連接該吊運單元之外,更可進一步連接有一進料/過濾單元、一循環/處理單元、一加熱單元、一冷卻單元及一廢氣洗滌塔單元。In one embodiment of the present invention, the degreasing unit, the first water washing unit, the first chemical polishing unit, the second chemical polishing unit, the first chemical liquid recovery unit, the electrochemical polishing unit, and the second The chemical liquid recovery unit, the second water washing unit, the third water washing unit, the ultrasonic water washing unit, the wind cutting unit and the drying unit are disposed in a decontamination working room, and the decontamination working room is flanked by An operation aisle and a maintenance aisle are provided, and the decontamination operation room is provided with a lifting unit, and a loading area and a sampling area are respectively disposed adjacent to the degreasing unit and the drying unit. And an operating mechanism, a degreasing liquid storage tank, a first chemical decontaminant storage tank, a second chemical decontaminant storage tank and an electrochemical decontaminant storage tank are disposed on the outdoor side of the decontamination operation, and In addition to connecting the lifting unit, the operating mechanism may further be connected with a feeding/filtering unit, a circulation/processing unit, a heating unit, a cooling unit and an exhaust gas scrubber unit.

於本發明之一實施例中,該進料/過濾單元係包含有設於分別連通該脫脂液儲槽、該第一化學除污劑儲槽、該第二化學除污劑儲槽及該電化學除污劑儲槽之進料泵與過濾器。In an embodiment of the present invention, the feeding/filtering unit comprises: respectively connecting the degreasing liquid storage tank, the first chemical decontaminant storage tank, the second chemical decontaminant storage tank, and the electrification Learn the feed pump and filter of the decontamination tank.

於本發明之一實施例中,該循環/處理單元係包含有多數分別連通於該脫脂單元與該脫脂液儲槽間、該第一化學拋光單元與該第一化學除污劑儲槽間、該第二化學拋光單元與該第二化學除污劑儲槽間、及該電化學拋光單元與該電化學除污劑儲槽間之循環泵、以及一設於該除污作業室中之鼓風機。In an embodiment of the present invention, the circulation/processing unit includes a plurality of communication between the degreasing unit and the degreasing liquid storage tank, between the first chemical polishing unit and the first chemical decontaminant storage tank, a circulation pump between the second chemical polishing unit and the second chemical detergent storage tank, and between the electrochemical polishing unit and the electrochemical detergent storage tank, and a blower disposed in the decontamination working chamber .

於本發明之一實施例中,該加熱單元係設於該脫脂單元及該第一與第二化學拋光單元中。In an embodiment of the invention, the heating unit is disposed in the degreasing unit and the first and second chemical polishing units.

於本發明之一實施例中,該冷卻單元係包含有多數與該第一化學拋光單元、該第二化學拋光單元及該電化學拋光單元連通之冷卻泵。In an embodiment of the invention, the cooling unit comprises a plurality of cooling pumps in communication with the first chemical polishing unit, the second chemical polishing unit, and the electrochemical polishing unit.

於本發明之一實施例中,該廢氣洗滌塔單元係設於該除污作業室頂端且連通至該第一化學拋光單元、該第二化學拋光單元及該電化學拋光單元。In an embodiment of the invention, the exhaust gas scrubber unit is disposed at a top end of the decontamination working chamber and is connected to the first chemical polishing unit, the second chemical polishing unit, and the electrochemical polishing unit.

於本發明之一實施例中,該加熱單元係以蒸氣通入披覆鐵氟龍之不鏽鋼管內,間接對除污劑加熱。In an embodiment of the invention, the heating unit is heated by steam into the stainless steel tube coated with Teflon.

於本發明之一實施例中,該第一化學拋光單元係以25W.T.%之化學除污劑,於63~77℃之操作溫度及54~66 min之操作時間下進行除污。In one embodiment of the invention, the first chemical polishing unit is decontaminated with a 25 W.T.% chemical decontaminant at an operating temperature of 63-77 ° C and an operating time of 54-66 min.

於本發明之一實施例中,該第二化學拋光單元係以45W.T.%之化學除污劑,於45~55℃之操作溫度及18~22 min之操作時間下進行除污。In one embodiment of the present invention, the second chemical polishing unit performs decontamination with a 45 W.T.% chemical decontaminant at an operating temperature of 45-55 ° C and an operating time of 18-22 min.

於本發明之一實施例中,該電化學拋光單元係以45W.T.%之電化學除污劑,於0.27~0.33 A/cm2之電流密度及27~33 min之操作時間下對該待除污物件進行除污。In one embodiment of the present invention, the electrochemical polishing unit is a 45 W.T.% electrochemical decontaminant at a current density of 0.27 to 0.33 A/cm 2 and an operation time of 27 to 33 min. Decontamination items are to be decontaminated.

於本發明之一實施例中,其對放射性污染金屬廢棄物係達到至少86%以上污染金屬除污並回收再利用。In one embodiment of the present invention, at least 86% of the contaminated metal is decontaminated and recycled for radioactively contaminated metal waste.

請參閱『第1圖』所示,係本發明之裝置架構示意圖。如圖所示:本發明係一種化學及電化學除污裝置及其方法,本裝置至少包括一脫脂單元101、一第一水洗單元102、一第一化學拋光單元103、一第二化學拋光單元104、一第一藥液回收單元105、一電化學拋光單元106、一第二藥液回收單元107、一第二水洗單元108、一第三水洗單元109、一超音波水洗單元110、一風切單元111以及一烘乾單元112所構成。Please refer to FIG. 1 for a schematic diagram of the device architecture of the present invention. As shown in the figure: the present invention is a chemical and electrochemical decontamination apparatus and method thereof. The apparatus comprises at least a degreasing unit 101, a first water washing unit 102, a first chemical polishing unit 103, and a second chemical polishing unit. 104, a first chemical liquid recovery unit 105, an electrochemical polishing unit 106, a second chemical liquid recovery unit 107, a second water washing unit 108, a third water washing unit 109, an ultrasonic washing unit 110, a wind The cutting unit 111 and a drying unit 112 are formed.

上述所提之脫脂單元101係注入一脫脂液用以清除一待除污物件表面油污,而該脫脂液之主要成份為偏矽酸鈉24~30%(較佳為27%)、磷酸三鈉13~17%(較佳為15%)、純鹼9~11%(較佳為10%)、三聚磷酸鈉9~11%(較佳為10%)以及正矽酸鈉7~9%(較佳為8%),並以1:10比例配製;或為40W.T.%之氫氧化鈉溶液。The degreasing unit 101 mentioned above is injected with a degreasing liquid for removing the oil stain on the surface of the material to be decontaminated, and the main component of the degreasing liquid is sodium citrate 24 to 30% (preferably 27%) and trisodium phosphate. 13 to 17% (preferably 15%), soda ash 9 to 11% (preferably 10%), sodium tripolyphosphate 9 to 11% (preferably 10%), and sodium ortho-sodium citrate 7 to 9% ( Preferably it is 8%) and is formulated in a ratio of 1:10; or a 40 W.T.% sodium hydroxide solution.

該第一水洗單元102係設於該脫脂單元101之一側,係利用水洗清該待除污物件表面污垢及殘留之脫脂液。The first water washing unit 102 is disposed on one side of the degreasing unit 101, and cleans the dirt on the surface of the object to be decontaminated and the residual degreasing liquid by water.

該第一化學拋光單元103係設於該第一水洗單元102之一側,以25W.T.%之化學除污劑,針對形狀複雜之待除污物件進行除污,而該第一化學拋光單元103之化學除污劑係包含有氟硼酸(HBF4)、礦物酸及氧化劑。The first chemical polishing unit 103 is disposed on one side of the first water washing unit 102, and decontaminates the shape-to-decontamination object with a 25W.T.% chemical decontaminant, and the first chemical polishing The chemical decontaminant of unit 103 contains fluoroboric acid (HBF 4 ), mineral acid, and an oxidizing agent.

該第二化學拋光單元104係設於該第一化學拋光單元103之一側,以45W.T.%之化學除污劑,針對形狀規則之待除污物件進行除污,而該第二化學拋光單元之化學除污劑係包含有磷酸(H3PO4)、礦物酸及氧化劑。The second chemical polishing unit 104 is disposed on one side of the first chemical polishing unit 103, and decontaminates the shape-predetermined material to be decontaminated with 45W.T.% of the chemical decontaminant, and the second chemical The chemical decontaminant of the polishing unit contains phosphoric acid (H 3 PO 4 ), mineral acid, and an oxidizing agent.

該第一藥液回收單元105係設於該第二化學拋光單元104之一側,用以回收化學除污劑,避免過多之除污劑留存於廢水中,增加廢水處理困難。The first chemical liquid recovery unit 105 is disposed on one side of the second chemical polishing unit 104 for recovering the chemical detergent, avoiding excessive detergent remaining in the wastewater, and increasing wastewater treatment difficulty.

該電化學拋光單元106係設於該第一藥液回收單元105之一側,以45W.T.%之電化學除污劑,針對形狀規則之待除污物件進行除污。其中,該待除污物件係可為任何金屬材質,其使用45W.T.%磷酸之電化學除污劑,係包含有磷酸、礦物酸及氧化劑,係於0.27~0.33 A/cm2(較佳為0.3 A/cm2)之電流密度及27~33 min(較佳為30 min)之操作時間下對該待除污物件進行除污。The electrochemical polishing unit 106 is disposed on one side of the first liquid chemical recovery unit 105, and decontaminates the shape-predetermined material to be decontaminated with a 45 W.T.% electrochemical detergent. Wherein, the material to be decontaminated can be any metal material, which uses an electrochemical decontaminant of 45 W.T.% phosphoric acid, which comprises phosphoric acid, mineral acid and oxidant, and is in the range of 0.27-0.33 A/cm 2 (compare The current density of 0.3 A/cm 2 ) and the operation time of 27 to 33 min (preferably 30 min) are used to decontaminate the object to be decontaminated.

該第二藥液回收單元107係設於該電化學拋光單元106之一側,用以回收電化學除污劑,避免過多之除污劑留存於廢水中,增加廢水處理困難。The second liquid chemical recovery unit 107 is disposed on one side of the electrochemical polishing unit 106 for recovering the electrochemical detergent, avoiding excessive detergent remaining in the wastewater, and increasing wastewater treatment difficulties.

該第二水洗單元108係設於該第二藥液回收單元107之一側,係利用水洗清該待除污物件表面污垢及殘留之化學除污劑。The second water washing unit 108 is disposed on one side of the second chemical liquid recovery unit 107, and cleans the surface of the material to be decontaminated by the water and the residual chemical detergent.

該第三水洗單元109係設於該第二水洗單元108之一側,係利用水洗清該待除污物件表面污垢及殘留之化學除污劑。The third water washing unit 109 is disposed on one side of the second water washing unit 108, and cleans the dirt on the surface of the object to be decontaminated and the residual chemical detergent by water.

該超音波水洗單元110係設於第三水洗單元109之一側,係以超音波之功能,對殘存於該待除污物件表面、孔縫之污垢及殘留之化學除污劑清洗,清洗完之待除污物件,吊離時再以水自動噴洗,以確保該待除污物件清潔乾淨。The ultrasonic washing unit 110 is disposed on one side of the third washing unit 109, and functions as an ultrasonic wave to clean the chemical decontaminants remaining on the surface of the object to be decontaminated, the dirt and the residual of the hole, and is cleaned. The object to be decontaminated is automatically sprayed with water when it is lifted to ensure that the object to be decontaminated is clean.

該風切單元111係設於該超音波水洗單元110之一側,係利用風力將該待除污物件表面水份吹除The wind cutting unit 111 is disposed on one side of the ultrasonic washing unit 110, and blows off the surface moisture of the object to be decontaminated by using wind power.

該烘乾單元112係設於該風切單元111之一側,係利用熱力將該待除污物件表面水份進一步去除。The drying unit 112 is disposed on one side of the wind cutting unit 111, and further removes moisture from the surface of the object to be decontaminated by heat.

上述第一、二化學拋光單元103、104係可針對形狀複雜或規則之待除污物件進行除污,不同材質之金屬,分別以不同之除污劑及操作條件處理;其中,不鏽鋼材質係採用25W.T.%氟硼酸加些許礦物酸及氧化劑之化學除污劑,於63~77℃(較佳為70℃)之操作溫度及54~66 min(較佳為60 min)之操作時間下進行除污;碳鋼材質則採用45W.T.%磷酸加些許礦物酸及氧化劑之化學除污劑,於45~55℃(較佳為50℃)之操作溫度及18~22 min(較佳為20 min)之操作時間下進行除污;於其中,加熱方式係以蒸氣通入披覆鐵氟龍之不鏽鋼管內,間接對除污劑加熱。The first and second chemical polishing units 103 and 104 can be used for decontaminating the materials to be decontaminated in a complicated shape or in a regular manner, and the metals of different materials are treated by different decontaminants and operating conditions respectively; 25W.T.% fluoroboric acid plus a chemical decontaminant of mineral acid and oxidant, operating at 63-77 ° C (preferably 70 ° C) and operating time of 54-66 min (preferably 60 min) Decontamination; carbon steel material is 45W.T.% phosphoric acid plus a little mineral acid and oxidant chemical decontaminant, operating temperature of 45 ~ 55 ° C (preferably 50 ° C) and 18 ~ 22 min (preferably Decontamination is carried out at an operating time of 20 min; in which the heating is carried out by steam into a stainless steel tube coated with Teflon, indirectly heating the decontaminant.

另,該脫脂單元101、該第一水洗單元102、該第一化學拋光單元103、該第二化學拋光單元104、該第一藥液回收單元105、該電化學拋光單元106、該第二藥液回收單元107、該第二水洗單元108、該第三水洗單元109、該超音波水洗單元110、該風切單元111以及該烘乾單元112係設於一除污作業室10中,該除污作業室10兩側係設有一操作用走道113及一維修用走道114,而該除污作業室10上方,係活動設有一吊運單元115,可吊運待除污物件於各單元間移動,且鄰近該脫脂單元101與該烘乾單元112之位置處,係分別設有一上料區116及一下料區117,並於該除污作業室10外側設有一操作機構21、一脫脂液儲槽22、一第一化學除污劑儲槽23、一第二化學除污劑儲槽24及一電化學除污劑儲槽25,且該操作機構21除連接該吊運單元115之外,更可進一步連接有一進料/過濾單元31、一循環/處理單元32、一加熱單元33、一冷卻單元34及一廢氣洗滌塔單元35。其中,該進料/過濾單元31係包含有設於分別連通該脫脂液儲槽22、該第一化學除污劑儲槽23、該第二化學除污劑儲槽24及該電化學除污劑儲槽25之進料泵311與過濾器312;該循環/處理單元32係包含有多數分別連通於該脫脂單元101與該脫脂液儲槽間22、該第一化學拋光單元103與該第一化學除污劑儲槽23間、該第二化學拋光單元104與該第二化學除污劑儲槽24間、及該電化學拋光單元106與該電化學除污劑儲槽25間之循環泵321、以及一設於該除污作業室10中之鼓風機322;該加熱單元33係設於該脫脂單元101及該第一與第二化學拋光單元103、104中;該冷卻單元34係包含有多數與該第一化學拋光單元103、該第二化學拋光單元104及該電化學拋光單元106連通之冷卻泵341;以及該廢氣洗滌塔單元35係設於該除污作業室10頂端且連通至該第一化學拋光單元103、該第二化學拋光單元104及該電化學拋光單元106。In addition, the degreasing unit 101, the first water washing unit 102, the first chemical polishing unit 103, the second chemical polishing unit 104, the first chemical liquid recovery unit 105, the electrochemical polishing unit 106, and the second medicine The liquid recovery unit 107, the second water washing unit 108, the third water washing unit 109, the ultrasonic water washing unit 110, the wind cutting unit 111, and the drying unit 112 are disposed in a decontamination working room 10, and the dividing unit An operation walkway 113 and a maintenance walkway 114 are disposed on both sides of the dirty working room 10, and a lifting unit 115 is disposed above the decontamination working room 10 to lift the object to be decontaminated and move between the units. And adjacent to the degreasing unit 101 and the drying unit 112, respectively, a loading area 116 and a blanking area 117 are provided, and an operating mechanism 21 and a degreasing liquid are disposed outside the decontamination working room 10. a tank 22, a first chemical decontaminant storage tank 23, a second chemical decontaminant storage tank 24, and an electrochemical decontaminant storage tank 25, and the operating mechanism 21 is connected to the lifting unit 115. Further connected to a feed/filter unit 31, a cycle/process list 32, a heating unit 33, a cooling unit 34, and an exhaust gas washing tower 35 units. The feed/filter unit 31 is configured to be respectively connected to the degreasing liquid storage tank 22, the first chemical decontaminant storage tank 23, the second chemical decontaminant storage tank 24, and the electrochemical decontamination unit. a feed pump 311 of the reagent storage tank 25 and a filter 312; the circulation/treatment unit 32 includes a plurality of the respective degreasing unit 101 and the degreasing liquid storage tank 22, the first chemical polishing unit 103 and the first a cycle between the chemical decontamination reservoir 23, the second chemical polishing unit 104 and the second chemical decontamination reservoir 24, and between the electrochemical polishing unit 106 and the electrochemical decontamination reservoir 25 a pump 321 and a blower 322 disposed in the decontamination working chamber 10; the heating unit 33 is disposed in the degreasing unit 101 and the first and second chemical polishing units 103, 104; the cooling unit 34 includes There are a plurality of cooling pumps 341 communicating with the first chemical polishing unit 103, the second chemical polishing unit 104, and the electrochemical polishing unit 106; and the exhaust gas scrubber unit 35 is disposed at the top of the decontamination working chamber 10 and is connected To the first chemical polishing unit 103 and the second chemical polishing unit 104 The electrochemical polishing unit 106.

如是,使本裝置可經由該吊運單元115吊掛待除污物件,並以該操作機構21控制該吊運單元115,連續完成各單元操作,使達成放射性污染金屬除污。If so, the device can suspend the object to be decontaminated through the lifting unit 115, and the operating unit 21 controls the lifting unit 115 to continuously complete the operation of each unit to achieve decontamination of the radioactive contaminated metal.

當本發明於使用時,係藉由該進料泵311分別將該脫脂液輸入於該脫脂液儲槽22中,而將25W.T.%氟硼酸之化學除污劑輸入於該第一化學除污劑儲槽23中,且將45W.T.%磷酸之化學除污劑輸入於該第二化學除污劑儲槽24及該電化學除污劑儲槽25中,待配製所需濃度後,再經由各循環泵321分別輸入於該脫脂單元101、該第一化學拋光單元103、該第二化學拋光單元104及該電化學拋光單元106中進行使用,而各循環泵321除可當進料使用外,尚可作為運轉中之循環攪拌使用,且進料時係可利用該過濾器312對該脫脂單元101、該第一化學拋光單元103、該第二化學拋光單元104及該電化學拋光單元106做過濾,使粗顆粒之雜質能過濾掉,以增進處理槽使用效能;而運用時,係以該操作機構21進行各步驟之作業控制,且以該吊運單元115運送放射性廢棄物等相關物件,並配合各循環泵321做該脫脂單元101、該第一化學拋光單元103、該第二化學拋光單元104及該電化學拋光單元106之各別循環攪拌,且藉由該加熱單元33使該脫脂單元101之溫度約為60℃,且使該第一及第二化學拋光槽103、104之溫度各約為70℃、50℃,進而讓該脫脂單元101將放射性廢棄物表面上之油脂去除,以利化學除污或電化學除污,而該第一化學拋光單元103係裝有氟硼酸系列除污劑,對不鏽鋼、碳鋼、鈦、銅、鋁等溶解速率快,相對地除污時間可縮短,而該第二化學拋光單元104係裝有磷酸系列除污劑,除污時間比氟硼酸系列除污劑長,但廢水處理只需酸鹼中和至PH=7左右即可,可省去廢水處理之困擾,另該電化學拋光單元106主要係以45W.T.%磷酸當電解液,其原理剛好跟電鍍原理相反,電鍍係鍍上一層,電拋光係剝除一層,而電流密度愈大反應愈快,且拋光出來之亮度也較大,電化學拋光之好處係除污時間短,在常溫下即可操作,但隨著電解液溫度上升,反應會加速,亮度亦會增加,在此需注意電解產生之氫氣,需以抽氣設備處理。When the present invention is used, the degreasing liquid is separately input into the degreasing liquid storage tank 22 by the feed pump 311, and the chemical decontaminant of 25 W.T.% fluoroboric acid is input to the first chemical. In the detergent storage tank 23, a chemical decontaminant of 45 W.T.% phosphoric acid is input into the second chemical decontaminant storage tank 24 and the electrochemical decontaminant storage tank 25, and the desired concentration is to be prepared. Then, it is input to the degreasing unit 101, the first chemical polishing unit 103, the second chemical polishing unit 104, and the electrochemical polishing unit 106 via the respective circulation pumps 321, and the circulation pump 321 can be used as a In addition to the use of the feed, it can be used as a circulating agitation during operation, and the degreasing unit 101, the first chemical polishing unit 103, the second chemical polishing unit 104, and the electrification can be utilized by the filter 312 during feeding. The polishing unit 106 is filtered to filter out impurities of the coarse particles to improve the use efficiency of the processing tank. In operation, the operating mechanism 21 performs the operation control of each step, and the lifting unit 115 carries the radioactive waste. Objects and other related items, and cooperate with each circulating pump 321 The degreasing unit 101, the first chemical polishing unit 103, the second chemical polishing unit 104, and the electrochemical polishing unit 106 are respectively circulated and stirred, and the temperature of the degreasing unit 101 is about 60 ° C by the heating unit 33. And the temperature of the first and second chemical polishing tanks 103, 104 are each about 70 ° C, 50 ° C, and then the degreasing unit 101 removes the grease on the surface of the radioactive waste to facilitate chemical decontamination or electrochemistry Decontamination, the first chemical polishing unit 103 is equipped with a fluoroboric acid series decontaminating agent, and has a fast dissolution rate for stainless steel, carbon steel, titanium, copper, aluminum, etc., and the relative decontamination time can be shortened, and the second chemical The polishing unit 104 is equipped with a phosphoric acid series decontaminating agent, and the decontamination time is longer than the fluoroboric acid series decontaminating agent, but the wastewater treatment only needs to be neutralized by acid and alkali to pH=7, which can save the trouble of wastewater treatment, and The electrochemical polishing unit 106 mainly uses 45W.T.% phosphoric acid as the electrolyte, and the principle is just opposite to the electroplating principle. The electroplating system is plated with one layer, and the electropolishing system is stripped of one layer, and the higher the current density, the faster the reaction, and Polished brightness is also large, electricity The polishing benefits Science Department of decontamination short time, can be operated at room temperature, but as the electrolyte temperature increased, the reaction is accelerated, the brightness will increase, this is noted in the hydrogen produced by electrolysis, the extraction equipment needed to handle.

另該第一、二、三水洗單元102、108、109及該超音波水洗單元110主要目的為洗去附著於除污物件上之殘存藥液或放射性物質,其中該第一水洗單元102主要用來洗去廢棄物表面上之脫脂鹼液,因為經由該脫脂單元101後,廢棄物表面殘存之藥液洗淨,可減少處理槽酸性藥液之消耗,而該第二、三水洗單元108、109及該超音波水洗單元110操作方式係當除污物件經由該第二、三水洗單元108、109、及該超音波水洗單元110起來時,最後再噴水清洗除污物件,以確保物件清潔;其中,噴洗水將由該超音波水洗單元110溢流至該第三水洗單元109,再溢流至該第二水洗單元108,最後導入廢水處理系統,如此不僅可節省廢水產生,且該超音波水洗單元110之水係比該第三水洗單元109乾淨,而該第三水洗單元109又比該第二水洗單元108乾淨。The first, second and third water washing units 102, 108, 109 and the ultrasonic washing unit 110 are mainly used for washing away the residual chemical liquid or radioactive substance attached to the decontamination object, wherein the first water washing unit 102 is mainly used. The defatted lye on the surface of the waste is washed away, because after the degreasing unit 101, the liquid remaining on the surface of the waste is washed, the consumption of the acidic solution of the treatment tank can be reduced, and the second and third washing units 108, 109 and the ultrasonic washing unit 110 are operated when the decontamination object is passed through the second and third water washing units 108, 109 and the ultrasonic washing unit 110, and finally the water is cleaned to clean the decontamination object to ensure the object is clean; Wherein, the jetting water will overflow from the ultrasonic washing unit 110 to the third washing unit 109, then overflow to the second washing unit 108, and finally into the wastewater treatment system, so that not only waste water generation but also the ultrasonic wave can be saved. The water of the water washing unit 110 is cleaner than the third water washing unit 109, and the third water washing unit 109 is again cleaner than the second water washing unit 108.

另,該第一藥液回收單元105及該第二藥液回收單元107之用途主要係讓除污物件在此停留,可回收一些藥液,並且此單元之槽位亦可當各物件之調度空間。In addition, the first chemical liquid recovery unit 105 and the second medical liquid recovery unit 107 are mainly used to allow the decontamination object to stay there, and some liquid medicine can be recovered, and the slot of the unit can also be used as the scheduling of each object. space.

之後待除污物件經由該風切單元111加以吹乾,其風力係採用循環方式,藉由風力把殘留於廢棄物上之水,吹落於該風切單元111中,最後再進入該烘乾單元112烘乾,而該烘乾單元112中之溫度係維持於60℃並使熱風不停地循環,且在處理中亦設置該鼓風機322提供空氣源,當待除污物件下到該脫脂單元101至該超音波水洗單元110任一槽位時(該第一藥液回收單元105及該第二藥液回收單元107除外),該鼓風機322即啟動,並以氣體攪拌液體,使待除污物件充份除污或清洗,當離開時該鼓風機322即關閉。Then, the to-be-decontaminated object is blown through the wind-cut unit 111, and the wind power is circulated, and the water remaining on the waste is blown into the wind-cut unit 111 by the wind, and finally the drying is performed. The unit 112 is dried, and the temperature in the drying unit 112 is maintained at 60 ° C and the hot air is continuously circulated, and the blower 322 is also disposed in the process to provide an air source, and the degreasing unit is lowered to the degreasing unit. When the 101 is in any slot of the ultrasonic washing unit 110 (except the first liquid chemical recovery unit 105 and the second chemical liquid recovery unit 107), the blower 322 is activated, and the liquid is stirred by the gas to be decontaminated. The article is fully decontaminated or cleaned and the blower 322 is closed when it leaves.

若該第一化學拋光單元103、該第二化學拋光單元104及該電化學拋光單元106之操作溫度超過80℃(因槽體有變形軟化之顧慮),便利用該冷卻單元34之冷卻泵341分別抽取該第一化學拋光單元103、該第二化學拋光單元104及該電化學拋光單元106中之藥液進行熱交換,以維持於適當之操作溫度。If the operating temperature of the first chemical polishing unit 103, the second chemical polishing unit 104, and the electrochemical polishing unit 106 exceeds 80 ° C (due to the deformation softening of the tank), the cooling pump 341 of the cooling unit 34 is facilitated. The first chemical polishing unit 103, the second chemical polishing unit 104, and the chemical polishing unit 106 are separately extracted for heat exchange to maintain the proper operating temperature.

由於本發明之化學拋光作業之操作溫度約50℃至70℃,然,在此條件下進行化學拋光,會產生酸氣,而電化學拋光除了酸氣之產生外,電解拋光過程亦會產生氫氣,這些氣體將經由該廢氣洗滌塔單元35抽氣並把酸洗淨後加以排放。Since the chemical polishing operation of the present invention operates at a temperature of about 50 ° C to 70 ° C, chemical polishing under such conditions generates acid gas, and electrochemical polishing produces hydrogen gas in addition to the generation of acid gas. These gases will be pumped through the exhaust scrubber unit 35 and washed with acid and then discharged.

藉此,本發明利用上述化學及電化學除污裝置,經由龍門式天車吊掛待除污物件,並以可程式邏輯控制器(Programmable Logic Controller,PLC)控制連續完成各單元操作,使達成放射性污染金屬除污。其除污之方式係以待除污物件形狀分類,以形狀複雜之金屬採用化學除污,形狀規則之金屬採用化學或電化學除污,並以金屬材質分類,採用無機除污劑對放射性污染金屬廢棄物進行除污,不僅操作時間短,其產生之二次廢棄物亦可另行處理,進而使本發明可達到86%以上污染金屬除污並回收再利用,俾以減緩放射性廢棄物儲存庫倉儲壓力之功效。Thereby, the present invention utilizes the above chemical and electrochemical decontamination device to suspend the object to be decontaminated by the gantry crane, and continuously completes the operation of each unit by a programmable logic controller (PLC) to achieve Decontamination of radioactively contaminated metals. The method of decontamination is classified by the shape of the object to be decontaminated, chemically decontaminated by metal with complicated shape, chemically or electrochemically decontaminated by metal of regular shape, classified by metal material, and radioactively contaminated by inorganic decontaminant. Metal waste is decontaminated, not only for short operation time, but also the secondary waste generated by it can be treated separately, so that the invention can achieve more than 86% of the contaminated metal decontamination and recycling, and to reduce the radioactive waste repository. The effect of storage pressure.

綜上所述,本發明係一種化學及電化學除污裝置及其方法,可有效改善習用之種種缺點,可將低污染放射性金屬廢棄物,變成可忽略微量放射性廢棄物,進而達到資源回收再利用或外釋之目的,可減緩放射性廢棄物儲存庫倉儲壓力,進而使本發明之產生能更進步、更實用、更符合使用者之所須,確已符合發明專利申請之要件,爰依法提出專利申請。In summary, the present invention is a chemical and electrochemical decontamination apparatus and method thereof, which can effectively improve various disadvantages of the conventional use, and can turn low-pollution radioactive metal waste into negligible micro-radioactive waste, thereby achieving resource recovery. For the purpose of use or external release, the storage pressure of the radioactive waste storage warehouse can be alleviated, so that the invention can be more advanced, more practical and more suitable for the user, and indeed meets the requirements of the invention patent application, and is proposed according to law. patent application.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍;故,凡依本發明申請專利範圍及發明說明書內容所作之簡單的等效變化與修飾,皆應仍屬本發明專利涵蓋之範圍內。However, the above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto; therefore, the simple equivalent changes and modifications made in accordance with the scope of the present invention and the contents of the invention are modified. All should remain within the scope of the invention patent.

10...除污作業室10. . . Decontamination operation room

101...脫脂單元101. . . Degreasing unit

102...第一水洗單元102. . . First washing unit

103...第一化學拋光單元103. . . First chemical polishing unit

104...第二化學拋光單元104. . . Second chemical polishing unit

105...第一藥液回收單元105. . . First liquid recovery unit

106...電化學拋光單元106. . . Electrochemical polishing unit

107...第二藥液回收單元107. . . Second liquid recovery unit

108...第二水洗單元108. . . Second washing unit

109...第三水洗單元109. . . Third washing unit

110...超音波水洗單元110. . . Ultrasonic washing unit

111...風切單元111. . . Wind cut unit

112...烘乾單元112. . . Drying unit

113...操作用走道113. . . Operational walkway

114...維修用走道114. . . Maintenance aisle

115...吊運單元115. . . Lifting unit

116...上料區116. . . Loading area

117...下料區117. . . Cutting area

21...操作機構twenty one. . . Operating mechanism

22...脫脂液儲槽twenty two. . . Degreasing liquid storage tank

23...第一化學除污劑儲槽twenty three. . . First chemical decontamination tank

24...第二化學除污劑儲槽twenty four. . . Second chemical decontamination tank

25...電化學除污劑儲槽25. . . Electrochemical decontaminant storage tank

31...進料/過濾單元31. . . Feed/filter unit

311...進料泵311. . . Feed pump

312...過濾器312. . . filter

32...循環/處理單元32. . . Loop/processing unit

321...循環泵321. . . Circulating pump

322...鼓風機322. . . Blower

33...加熱單元33. . . Heating unit

34...冷卻單元34. . . Cooling unit

341...冷卻泵341. . . Cooling pump

35...廢氣洗滌塔單元35. . . Exhaust scrubber unit

第1圖,係本發明之裝置架構示意圖。Fig. 1 is a schematic view showing the structure of the apparatus of the present invention.

10...除污作業室10. . . Decontamination operation room

101...脫脂單元101. . . Degreasing unit

102...第一水洗單元102. . . First washing unit

103...第一化學拋光單元103. . . First chemical polishing unit

104...第二化學拋光單元104. . . Second chemical polishing unit

105...第一藥液回收單元105. . . First liquid recovery unit

106...電化學拋光單元106. . . Electrochemical polishing unit

107...第二藥液回收單元107. . . Second liquid recovery unit

108...第二水洗單元108. . . Second washing unit

109...第三水洗單元109. . . Third washing unit

110...超音波水洗單元110. . . Ultrasonic washing unit

111...風切單元111. . . Wind cut unit

112...烘乾單元112. . . Drying unit

113...操作用走道113. . . Operational walkway

114...維修用走道114. . . Maintenance aisle

115...吊運單元115. . . Lifting unit

116...上料區116. . . Loading area

117...下料區117. . . Cutting area

21...操作機構twenty one. . . Operating mechanism

22...脫脂液儲槽twenty two. . . Degreasing liquid storage tank

23...第一化學除污劑儲槽twenty three. . . First chemical decontamination tank

24...第二化學除污劑儲槽twenty four. . . Second chemical decontamination tank

25...電化學除污劑儲槽25. . . Electrochemical decontaminant storage tank

31...進料/過濾單元31. . . Feed/filter unit

311...進料泵311. . . Feed pump

312...過濾器312. . . filter

32...循環/處理單元32. . . Loop/processing unit

321...循環泵321. . . Circulating pump

322...鼓風機322. . . Blower

33...加熱單元33. . . Heating unit

34...冷卻單元34. . . Cooling unit

341...冷卻泵341. . . Cooling pump

35...廢氣洗滌塔單元35. . . Exhaust scrubber unit

Claims (18)

一種化學及電化學除污裝置,係包括:一脫脂單元,係注入一脫脂液用以清除一待除污物件表面油污;一第一水洗單元,係設於該脫脂單元之一側,利用水洗清該待除污物件表面污垢及殘留之脫脂液;一第一化學拋光單元,係設於該第一水洗單元之一側,以25W.T.%之化學除污劑,針對形狀複雜之待除污物件進行除污;一第二化學拋光單元,係設於該第一化學拋光單元之一側,以45W.T.%之化學除污劑,針對形狀規則之待除污物件進行除污;一第一藥液回收單元,係設於該第二化學拋光單元之一側,用以回收化學除污劑;一電化學拋光單元,係設於該第一藥液回收單元之一側,以45W.T.%之電化學除污劑,針對形狀規則之待除污物件進行除污;一第二藥液回收單元,係設於該電化學拋光單元之一側,用以回收電化學除污劑;一第二水洗單元,係設於該第二藥液回收單元之一側,利用水洗清該待除污物件表面污垢及殘留之化學除污劑;一第三水洗單元,係設於該第二水洗單元之一側,利用水洗清該待除污物件表面污垢及殘留之化學除污劑;一超音波水洗單元,係設於第三水洗單元之一側,用以對殘存於該待除污物件表面、孔縫之污垢及殘留之化學除污劑清洗乾淨;一風切單元,係設於該超音波水洗單元之一側,利用風力將該待除污物件表面水份吹除;以及一烘乾單元,係設於該風切單元之一側,利用熱力將該待除污物件表面水份進一步去除。A chemical and electrochemical decontamination device comprises: a degreasing unit, which is filled with a degreasing liquid for removing oil on the surface of a decontaminating object; a first water washing unit is disposed on one side of the degreasing unit and is washed with water. Clearing the dirt on the surface of the object to be decontaminated and the residual degreasing liquid; a first chemical polishing unit is disposed on one side of the first water washing unit, and has a chemical decontaminant of 25 W.T.% for a complicated shape Decontaminating material is decontaminated; a second chemical polishing unit is disposed on one side of the first chemical polishing unit, and decontaminating the shape-predetermined decontaminating object with a 45W.T.% chemical decontaminating agent a first chemical liquid recovery unit is disposed on one side of the second chemical polishing unit for recovering a chemical detergent; an electrochemical polishing unit is disposed on one side of the first liquid recovery unit 45W.T.% of the electrochemical decontaminant for decontaminating the shape of the object to be decontaminated; a second liquid recovery unit is disposed on one side of the electrochemical polishing unit for recovering the electrochemical a detergent unit; a second water washing unit is provided in the second medicine On one side of the recovery unit, the surface of the material to be decontaminated is cleaned with water and the residual chemical decontaminant; a third water washing unit is disposed on one side of the second water washing unit, and the object to be decontaminated is washed with water. Surface dirt and residual chemical decontaminant; an ultrasonic washing unit is disposed on one side of the third water washing unit for the chemical decontamination agent remaining on the surface of the object to be decontaminated, the dirt of the hole and the residue Cleaned; a wind-cut unit is disposed on one side of the ultrasonic washing unit, and blows off the surface moisture of the object to be decontaminated by the wind; and a drying unit is disposed on one side of the wind-cut unit The surface moisture of the object to be decontaminated is further removed by heat. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該脫脂液之主要成份為偏矽酸鈉24~30%、磷酸三鈉13~17%、純鹼9~11%、三聚磷酸鈉9~11%以及正矽酸鈉7~9%,並以1:10比例配製。According to the chemical and electrochemical decontamination device of claim 1, wherein the main component of the degreasing solution is sodium metasilicate, 24 to 30%, trisodium phosphate, 13 to 17%, and soda ash, 9 to 11%. Sodium tripolyphosphate 9-11% and sodium orthonotate 7-9% were prepared at a ratio of 1:10. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該脫脂液係可為40W.T.%之氫氧化鈉溶液。The chemical and electrochemical decontamination apparatus according to claim 1, wherein the degreasing liquid is a 40 W.T.% sodium hydroxide solution. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該第一化學拋光單元之化學除污劑係包含有氟硼酸(HBF4)、礦物酸及氧化劑。The chemical and electrochemical decontamination apparatus according to the first aspect of the invention, wherein the chemical decontaminant of the first chemical polishing unit comprises fluoroboric acid (HBF 4 ), mineral acid and an oxidizing agent. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該第二化學拋光單元之化學除污劑係包含有磷酸、礦物酸及氧化劑。The chemical and electrochemical decontamination apparatus according to claim 1, wherein the chemical decontaminant of the second chemical polishing unit comprises phosphoric acid, mineral acid and an oxidizing agent. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該電化學拋光單元之電化學除污劑係包含有磷酸、礦物酸及氧化劑。The chemical and electrochemical decontamination apparatus according to claim 1, wherein the electrochemical decontamination unit of the electrochemical polishing unit comprises phosphoric acid, mineral acid and an oxidizing agent. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該脫脂單元、該第一水洗單元、該第一化學拋光單元、該第二化學拋光單元、該第一藥液回收單元、該電化學拋光單元、該第二藥液回收單元、該第二水洗單元、該第三水洗單元、該超音波水洗單元、該風切單元以及該烘乾單元係設於一除污作業室中,該除污作業室兩側係設有一操作用走道及一維修用走道,而該除污作業室上係活動設有一吊運單元,且鄰近該脫脂單元與該烘乾單元之位置處係分別設有一上料區及一下料區,並於該除污作業室外側設有一操作機構、一脫脂液儲槽、一第一化學除污劑儲槽、一第二化學除污劑儲槽及一電化學除污劑儲槽,且該操作機構除連接該吊運單元之外,更可進一步連接有一進料/過濾單元、一循環/處理單元、一加熱單元、一冷卻單元及一廢氣洗滌塔單元。The chemical and electrochemical decontamination apparatus according to claim 1, wherein the degreasing unit, the first water washing unit, the first chemical polishing unit, the second chemical polishing unit, and the first chemical liquid recovery The unit, the electrochemical polishing unit, the second liquid recovery unit, the second water washing unit, the third water washing unit, the ultrasonic water washing unit, the wind cutting unit, and the drying unit are disposed in a decontamination operation In the chamber, an operation walkway and a maintenance walkway are disposed on both sides of the decontamination operation room, and the decontamination operation room is provided with a lifting unit on the upper activity, and is adjacent to the degreasing unit and the drying unit. There is a loading area and a sampling area respectively, and an operating mechanism, a degreasing liquid storage tank, a first chemical decontaminant storage tank and a second chemical decontaminant storage tank are arranged on the outdoor side of the decontamination operation. And an electrochemical decontaminant storage tank, and the operating mechanism is further connected with a feeding/filtering unit, a circulation/processing unit, a heating unit, a cooling unit and an exhaust gas in addition to the lifting unit. Washing tower unit 依申請專利範圍第7項所述之化學及電化學除污裝置,其中,該進料/過濾單元係包含有設於分別連通該脫脂液儲槽、該第一化學除污劑儲槽、該第二化學除污劑儲槽及該電化學除污劑儲槽之進料泵與過濾器。The chemical and electrochemical decontamination apparatus according to the seventh aspect of the invention, wherein the feed/filter unit comprises: a first chemical decontaminant storage tank respectively disposed in the degreasing liquid storage tank; a second chemical decontaminant reservoir and a feed pump and filter of the electrochemical decontamination reservoir. 依申請專利範圍第7項所述之化學及電化學除污裝置,其中,該循環/處理單元係包含有多數分別連通於該脫脂單元與該脫脂液儲槽間、該第一化學拋光單元與該第一化學除污劑儲槽間、該第二化學拋光單元與該第二化學除污劑儲槽間、及該電化學拋光單元與該電化學除污劑儲槽間之循環泵、以及一設於該除污作業室中之鼓風機。The chemical and electrochemical decontamination apparatus according to the seventh aspect of the invention, wherein the circulation/treatment unit comprises a plurality of respectively connected between the degreasing unit and the degreasing liquid storage tank, the first chemical polishing unit and a first chemical decontaminant storage tank, a second chemical polishing unit and the second chemical decontaminant storage tank, and a circulation pump between the electrochemical polishing unit and the electrochemical decontaminant storage tank, and A blower disposed in the decontamination working room. 依申請專利範圍第7項所述之化學及電化學除污裝置,其中,該加熱單元係設於該脫脂單元及該第一與第二化學拋光單元中。The chemical and electrochemical decontamination apparatus according to claim 7, wherein the heating unit is disposed in the degreasing unit and the first and second chemical polishing units. 依申請專利範圍第7項所述之化學及電化學除污裝置,其中,該冷卻單元係包含有多數與該第一化學拋光單元、該第二化學拋光單元及該電化學拋光單元連通之冷卻泵。The chemical and electrochemical decontamination apparatus according to the seventh aspect of the invention, wherein the cooling unit comprises a plurality of cooling connected to the first chemical polishing unit, the second chemical polishing unit and the electrochemical polishing unit. Pump. 依申請專利範圍第7項所述之化學及電化學除污裝置,其中,該廢氣洗滌塔單元係設於該除污作業室頂端且連通至該第一化學拋光單元、該第二化學拋光單元及該電化學拋光單元。The chemical and electrochemical decontamination apparatus according to claim 7, wherein the exhaust gas scrubber unit is disposed at a top end of the decontamination working chamber and communicates with the first chemical polishing unit and the second chemical polishing unit. And the electrochemical polishing unit. 依申請專利範圍第7項所述之化學及電化學除污裝置,其中,該加熱單元係以蒸氣通入披覆鐵氟龍之不鏽鋼管內,間接對除污劑加熱。The chemical and electrochemical decontamination apparatus according to claim 7, wherein the heating unit is heated by steam into a stainless steel tube coated with Teflon. 依申請專利範圍第1項所述之化學及電化學除污裝置,係由該待除污物件形狀分類進行除污,以形狀複雜之金屬採用化學除污,形狀規則之金屬採用化學或電化學除污。According to the chemical and electrochemical decontamination device described in the first paragraph of the patent application, the shape of the object to be decontaminated is decontaminated, the metal with a complex shape is chemically decontaminated, and the metal of the shape is chemically or electrochemically. Decontamination. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該第一化學拋光單元係以25W.T.%之化學除污劑,於63~77℃之操作溫度及54~66 min之操作時間下對該待除污物件進行除污。The chemical and electrochemical decontamination apparatus according to claim 1, wherein the first chemical polishing unit is a chemical decontaminant of 25 W.T.%, an operating temperature of 63 to 77 ° C, and 54 to The material to be decontaminated is decontaminated at an operation time of 66 min. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該第二化學拋光單元係以45W.T.%之化學除污劑,於45~55℃之操作溫度及18~22 min之操作時間下對該待除污物件進行除污。The chemical and electrochemical decontamination apparatus according to claim 1, wherein the second chemical polishing unit is a 45 W.T.% chemical decontaminant, an operating temperature of 45 to 55 ° C and 18 to The object to be decontaminated is decontaminated under an operation time of 22 min. 依申請專利範圍第1項所述之化學及電化學除污裝置,其中,該電化學拋光單元係以45W.T.%之電化學除污劑,於0.27~0.33 A/cm2之電流密度及27~33 min之操作時間下對該待除污物件進行除污。The chemical and electrochemical decontamination apparatus according to claim 1, wherein the electrochemical polishing unit has a current density of 0.27 to 0.33 A/cm 2 with an electrochemical decontaminant of 45 W.T.%. And decontaminating the object to be decontaminated under the operation time of 27 to 33 minutes. 依申請專利範圍第1項所述之化學及電化學除污裝置,其對放射性污染金屬廢棄物係達到至少86%以上污染金屬除污According to the chemical and electrochemical decontamination device described in the first paragraph of the patent application, it has at least 86% of contaminated metal decontamination for radioactively contaminated metal waste.
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TWI503845B (en) * 2013-09-06 2015-10-11 Hitachi Ge Nuclear Energy Ltd Chemical decontamination method of carbon steel components in nuclear power plant
EP3792936A4 (en) * 2018-05-11 2023-01-04 Joint Stock Company "Rosenergoatom" Assembly for the electrochemical decontamination of metallic radioactive waste

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TW288145B (en) * 1994-02-01 1996-10-11 Toshiba Co Ltd
DE19818772C2 (en) * 1998-04-27 2000-05-31 Siemens Ag Process for reducing the radioactivity of a metal part
WO2000078403A1 (en) * 1999-06-24 2000-12-28 The University Of Chicago Method for the decontamination of metallic surfaces
KR100724710B1 (en) * 2002-11-21 2007-06-04 가부시끼가이샤 도시바 System and method for chemical decontamination of radioactive material
TW200909077A (en) * 2007-08-23 2009-03-01 Atomic Energy Council Decontamination method of radioactivity-contaminated metal surface
ATE538478T1 (en) * 2007-10-29 2012-01-15 Atomic Energy Council DECONTAMINATION METHOD FOR A METAL SURFACE CONTAMINATED BY RADIOACTIVE ELEMENTS

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI503845B (en) * 2013-09-06 2015-10-11 Hitachi Ge Nuclear Energy Ltd Chemical decontamination method of carbon steel components in nuclear power plant
EP3792936A4 (en) * 2018-05-11 2023-01-04 Joint Stock Company "Rosenergoatom" Assembly for the electrochemical decontamination of metallic radioactive waste

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