TW201313772A - Curable resin composition for sealing optical semiconductor element and cured product thereof - Google Patents

Curable resin composition for sealing optical semiconductor element and cured product thereof Download PDF

Info

Publication number
TW201313772A
TW201313772A TW101132711A TW101132711A TW201313772A TW 201313772 A TW201313772 A TW 201313772A TW 101132711 A TW101132711 A TW 101132711A TW 101132711 A TW101132711 A TW 101132711A TW 201313772 A TW201313772 A TW 201313772A
Authority
TW
Taiwan
Prior art keywords
group
compound
epoxy resin
resin composition
optical semiconductor
Prior art date
Application number
TW101132711A
Other languages
Chinese (zh)
Inventor
Naofusa Miyagawa
Chie Sasaki
Ritsuko Shitara
Kenichi Kuboki
Yoshihiro Kawada
Original Assignee
Nippon Kayaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Kk filed Critical Nippon Kayaku Kk
Publication of TW201313772A publication Critical patent/TW201313772A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4246Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof polymers with carboxylic terminal groups
    • C08G59/4269Macromolecular compounds obtained by reactions other than those involving unsaturated carbon-to-carbon bindings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/681Metal alcoholates, phenolates or carboxylates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • H01L23/296Organo-silicon compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/56Materials, e.g. epoxy or silicone resin
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Led Device Packages (AREA)

Abstract

Provided is a resin composition that is extremely useful as a sealant for an optical semiconductor (such as an LED product) having excellent pot life and sulfur resistance. The curable resin composition for sealing an optical semiconductor comprises a curing catalyst having a melting point between 40 and 200 C and an epoxy resin and/or epoxy resin curing agent. Preferably the epoxy resin curing agent is, for instance, polyvalent carboxylic acid resin (A)obtained by addition reaction of a dual end-type carbinol-modified silicone oil represented by formula (1), a polyhydric alcohol compound having two or more hydroxyl groups per molecule, and a compound having one carboxylic anhydride group per molecule. (In formula (1), R1 is an alkylene group, and the like, R2 is an alkyl group, and the like, and m is an average value and is between 1 and 100.)

Description

光半導體元件密封用硬化樹脂組成物及其硬化物 Hardened resin composition for sealing optical semiconductor elements and cured product thereof

本發明係關於一種適合於光半導體元件密封用途之硬化樹脂組成物、及其硬化物。 The present invention relates to a cured resin composition suitable for sealing an optical semiconductor element, and a cured product thereof.

作為用於密封LED(Light Emitting Diode,發光二極體)等光半導體元件之樹脂,就機械強度、接著力優異之方面而言,可使用利用雙酚型環氧樹脂、脂環式環氧樹脂等液狀環氧樹脂組成物(參照專利文獻1)。近年來,LED正逐漸用於汽車用前照燈或照明用途等要求高亮度之領域,伴隨於此,對密封光半導體元件之樹脂,亦逐漸特別地要求有抗UV性、耐熱性。然而,如上所述之雙酚型環氧樹脂或脂環式環氧樹脂等難說其具有充分之抗UV性、耐熱性,有時無法用於有高亮度需求之領域。因此,作為具有較高之抗UV性、耐熱性等之密封材料,可使用矽氧樹脂(silicone resin)密封材料(參照專利文獻2),其係使用含有不飽和烴基之有機聚矽氧烷與有機氫聚矽氧烷(organohydrogen polysiloxane)而成。然而,使用此種矽氧樹脂而成之密封材料雖抗UV性、耐熱性優異,但存在密封表面有黏膩感、或氣體透過性高之問題。 As a resin for sealing an optical semiconductor element such as an LED (Light Emitting Diode), a bisphenol type epoxy resin or an alicyclic epoxy resin can be used in terms of excellent mechanical strength and adhesion. A liquid epoxy resin composition (see Patent Document 1). In recent years, LEDs are being used in fields requiring high brightness such as automotive headlamps or lighting applications. Accordingly, the resin for sealing optical semiconductor elements is particularly required to have UV resistance and heat resistance. However, it is difficult to say that the bisphenol type epoxy resin or the alicyclic epoxy resin as described above has sufficient UV resistance and heat resistance, and sometimes it cannot be used in a field having high brightness demand. Therefore, as a sealing material having high UV resistance, heat resistance and the like, a silicone resin sealing material (refer to Patent Document 2) using an organopolysiloxane containing an unsaturated hydrocarbon group can be used. It is made of organohydrogen polysiloxane. However, the sealing material using such a silicone resin is excellent in UV resistance and heat resistance, but has a problem that the sealing surface has a sticky feeling or a high gas permeability.

就氣體透過性較高之問題而言,尤其是因硫系氣體之透過而導致用於LED之鍍銀表面受到腐蝕並成為硫化銀,由此產生黑化,引起使LED之照度降低等現象,故而急需採取對策(耐硫化性之提高)。針對此進行有如下對策: 提高矽氧樹脂硬化物之交聯密度、或於分子內增加苯基等芳香族有機基;但由於硬化物之硬度必然會增高,故而熱循環耐性較差,產生裂痕(裂隙)或自基材之剝離等不良影響、或因增加芳香族有機基而導致有抗UV性劣化等擔憂。又,仍無法達成可滿足之耐硫化性。 In the case of a problem of high gas permeability, in particular, the silver-plated surface for the LED is corroded and becomes silver sulfide due to the transmission of the sulfur-based gas, thereby causing blackening, causing a decrease in the illuminance of the LED. Therefore, it is urgent to take countermeasures (improvement of sulfidation resistance). The following countermeasures are made for this: Increasing the crosslink density of the cured epoxy resin or adding an aromatic organic group such as a phenyl group to the molecule; however, since the hardness of the cured product is inevitably increased, the thermal cycle resistance is poor, and cracks (fractures) or self-substrate are generated. There are concerns such as adverse effects such as peeling or deterioration of UV resistance due to an increase in aromatic organic groups. Moreover, it is still impossible to achieve a satisfactory sulfidation resistance.

為了解決該等問題,正對具有環氧基或苯基之矽化物的縮合物與使用環氧樹脂硬化劑之密封材料進行研究,但仍無法滿足。進而,由於混合該等二液後之黏度上升(適用期)較快,因此存在加工性較差等問題。 In order to solve such problems, a condensate having an epoxy group or a phenyl group and a sealing material using an epoxy resin hardener have been studied, but it has not been satisfied. Further, since the viscosity rise (applicable period) after mixing the two liquids is fast, there is a problem that the workability is poor.

專利文獻1:日本特開2003-277473號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2003-277473

專利文獻2:日本專利第4636242號公報 Patent Document 2: Japanese Patent No. 4636242

本發明之目的在於提供一種適用期、耐硫化性優異之光半導體元件密封用硬化樹脂組成物及其硬化物。 An object of the present invention is to provide a cured resin composition for sealing an optical semiconductor element which is excellent in pot life and excellent in vulcanization resistance, and a cured product thereof.

本發明人等鑒於如上所述之現狀而進行銳意研究,結果發現含有熔點為40~200℃之硬化觸媒與環氧樹脂及/或環氧樹脂硬化劑之硬化樹脂組成物可解決上述問題,從而完成本發明。 The inventors of the present invention conducted intensive studies in view of the above-described state of the art, and as a result, found that a hardened resin composition containing a curing catalyst having a melting point of 40 to 200 ° C and an epoxy resin and/or an epoxy resin hardener can solve the above problems. Thus, the present invention has been completed.

即,本發明係如下所述: That is, the present invention is as follows:

(1)一種光半導體密封用硬化樹脂組成物,係含有熔點為40~200℃之硬化觸媒與環氧樹脂及/或環氧樹脂硬化劑。 (1) A cured resin composition for optical semiconductor sealing, which comprises a curing catalyst having a melting point of 40 to 200 ° C and an epoxy resin and/or an epoxy resin curing agent.

(2)如上述(1)之光半導體密封用硬化樹脂組成物,其中,環氧樹脂硬化劑為多元羧酸樹脂(A),該多元羧酸 樹脂(A)包含式(1)所表示之兩末端甲醇改質之矽油(a)與分子內具有一個羧酸酐基之化合物(d)的加成反應物、及分子內具有兩個以上羥基之多元醇化合物(i)與分子內具有一個羧酸酐基之化合物(d)的加成反應物: (2) The cured resin composition for optical semiconductor sealing according to (1) above, wherein the epoxy resin curing agent is a polyvalent carboxylic acid resin (A), and the polyvalent carboxylic acid resin (A) comprises the formula (1) An addition reaction of the methanol-modified oleic oil at both ends (a) with a compound (d) having a carboxylic anhydride group in the molecule, and a polyol compound (i) having two or more hydroxyl groups in the molecule and a carboxy group in the molecule Addition reactant of the acid anhydride group-containing compound (d):

(式(1)中,R1分別獨立表示碳數1~10之伸烷基或碳數1~10之包含醚鍵之伸烷基,R2分別獨立表示碳數1~3之烷基或苯基,m為平均值且表示1~100)。 (In the formula (1), R 1 each independently represents an alkylene group having 1 to 10 carbon atoms or an alkylene group having an ether bond having 1 to 10 carbon atoms, and R 2 each independently represents an alkyl group having 1 to 3 carbon atoms or Phenyl group, m is an average value and represents 1 to 100).

(3)如上述(1)之光半導體密封用硬化樹脂組成物,其中,環氧樹脂硬化劑為藉由使式(1)所表示之兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)及分子內具有一個羧酸酐基之化合物(d)進行加成反應所獲得之多元羧酸樹脂(A)。 (3) The hardened resin composition for optical semiconductor sealing according to the above (1), wherein the epoxy resin hardener is an eucalyptus oil (a) modified by the two-terminal methanol represented by the formula (1), and has an intramolecular A polyvalent carboxylic acid resin (A) obtained by subjecting a polyol compound (i) having two or more hydroxyl groups and a compound (d) having a carboxylic acid anhydride group in the molecule.

(式(1)中,R1分別獨立表示碳數1~10之伸烷基或碳數1~10之包含醚鍵之伸烷基,R2分別獨立表示碳數1~3之烷基或苯基,m為平均值且表示1~100)。 (In the formula (1), R 1 each independently represents an alkylene group having 1 to 10 carbon atoms or an alkylene group having an ether bond having 1 to 10 carbon atoms, and R 2 each independently represents an alkyl group having 1 to 3 carbon atoms or Phenyl group, m is an average value and represents 1 to 100).

(4)如上述(3)之光半導體密封用硬化樹脂組成物,其中,多元羧酸樹脂(A)為藉由進而含有分子內具有兩個以上羧酸酐基之化合物(c)作為反應原料來進行加成反應所獲得者。 (4) The cured resin composition for optical semiconductor sealing according to the above (3), wherein the polyvalent carboxylic acid resin (A) further contains a compound (c) having two or more carboxylic acid anhydride groups in the molecule as a reaction raw material. The person who obtained the addition reaction.

(5)如上述(2)至(4)中任一項之光半導體密封用硬化樹脂組成物,其中,分子內具有兩個以上羥基之多元醇化合物(i)為式(2)所表示之末端醇聚酯化合物: (5) The cured resin composition for optical semiconductor sealing according to any one of the above (2), wherein the polyol compound (i) having two or more hydroxyl groups in the molecule is represented by the formula (2). Terminal alcohol polyester compound:

(式(2)中,R3、R4分別獨立表示碳數1~10之伸烷基,m為平均值且表示1~100)。 (In the formula (2), R 3 and R 4 each independently represent an alkylene group having 1 to 10 carbon atoms, and m is an average value and represents 1 to 100).

(6)如上述(1)至(5)中任一項之光半導體密封用硬化樹脂組成物,其中,環氧樹脂為聚矽氧(silicone)骨架環氧樹脂(B)。 (6) The cured resin composition for optical semiconductor sealing according to any one of the above (1) to (5) wherein the epoxy resin is a silicone skeleton epoxy resin (B).

(7)如上述(6)之光半導體元件密封用硬化樹脂組成物,其中,上述聚矽氧骨架環氧樹脂(B)係經由下述製造步驟1、2而獲得之式(3)所示之矽烷醇基末端矽油與式(4)所示之含環氧基之矽化物的聚合物,且利用JIS K-7236所記載之方法而測得之環氧當量為300~1500 g/eq; 製造步驟1 使矽烷醇末端矽油之矽烷醇基與含環氧基之矽化物之 烷氧基縮合而獲得改質矽油之步驟; 製造步驟2 於製造步驟1後,添加水而進行殘存之烷氧基的水解縮合之步驟; (7) The cured resin composition for sealing an optical semiconductor element according to the above (6), wherein the polyfluorene skeleton epoxy resin (B) is obtained by the following production steps (1) and (2) a decyl alcohol-terminated eucalyptus oil and an epoxy group-containing hydrazine compound represented by the formula (4), and an epoxy equivalent of 300 to 1500 g/eq as measured by the method described in JIS K-7236; Production step 1 a step of obtaining a modified eucalyptus oil by condensing a decyl alcohol group of a decyl alcohol terminal eucalyptus oil with an alkoxy group of an epoxy group-containing hydrazine compound; and a production step 2, after the production step 1, adding water to carry out residual alkoxylation a step of hydrolytic condensation of a base;

(式(3)中,R5表示碳數1~3之烷基或苯基,p為平均值且表示3~200;式中,複數存在之R5可相同亦可不同);XSi(R 6 ) q (OR 7 ) r (4) (In the formula (3), R 5 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, and p is an average value and represents 3 to 200; wherein, in the formula, R 5 may be the same or different); XSi(R) 6 ) q (OR 7 ) r (4)

(式(4)中,X表示含有環氧基之有機基,R6表示碳數1~10之直鏈狀、分支狀或環狀之烷基或碳數6~10之芳香族烴基,R7表示碳數1~10之直鏈狀、分支狀或環狀之烷基,q為整數且表示0~2,r為整數,表示(3-q))。 (In the formula (4), X represents an organic group containing an epoxy group, and R 6 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, R 7 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, q is an integer and represents 0 to 2, and r is an integer representing (3-q)).

(8)如上述(1)至(7)中任一項之光半導體密封用硬化樹脂組成物,其中,熔點為40~200℃之硬化觸媒為金屬皂系硬化觸媒。 (8) The cured resin composition for optical semiconductor sealing according to any one of the above (1) to (7), wherein the curing catalyst having a melting point of 40 to 200 ° C is a metal soap-based curing catalyst.

(9)如上述(8)之光半導體密封用硬化樹脂組成物,其中,金屬皂類為由羧酸化合物構成之鋅鹽(zinc salt)。 (9) The hardened resin composition for optical semiconductor sealing according to (8) above, wherein the metal soap is a zinc salt composed of a carboxylic acid compound.

(10)如上述(9)之光半導體密封用硬化樹脂組成物,其中,由羧酸化合物構成之鋅鹽為由具有羥基之碳數10~30之單羧酸化合物構成之鋅鹽。 (10) The cured resin composition for optical semiconductor sealing according to the above (9), wherein the zinc salt composed of the carboxylic acid compound is a zinc salt composed of a monocarboxylic acid compound having a hydroxyl group having 10 to 30 carbon atoms.

(11)如上述(10)之光半導體密封用硬化樹脂組成物,其中,具有羥基之碳數10~30之單羧酸化合物為12-羥基硬脂酸。 (11) The cured resin composition for optical semiconductor sealing according to (10) above, wherein the monocarboxylic acid compound having a hydroxyl group having 10 to 30 carbon atoms is 12-hydroxystearic acid.

(12)如上述(10)之光半導體密封用硬化樹脂組成物,其中,具有羥基之碳數10~30之單羧酸化合物為硬脂酸。 (12) The cured resin composition for optical semiconductor sealing according to (10) above, wherein the monocarboxylic acid compound having a hydroxyl group having 10 to 30 carbon atoms is stearic acid.

(13)一種硬化物,係使上述(1)至(12)中任一項之光半導體密封用硬化樹脂組成物硬化而成。 (13) A cured product obtained by curing the cured resin composition for optical semiconductor sealing according to any one of the above (1) to (12).

(14)一種LED,其具備上述(13)之硬化物。 (14) An LED comprising the cured product of the above (13).

根據本發明,含有熔點為40~200℃之硬化觸媒與環氧樹脂及/或環氧樹脂硬化劑之硬化樹脂組成物由於耐硫化性、適用期極其優異,故而作為光半導體元件(LED)密封材料極其有用。 According to the present invention, the cured resin composition containing a curing catalyst having a melting point of 40 to 200 ° C and an epoxy resin and/or an epoxy resin hardener is excellent in resistance to vulcanization and has a pot life, so that it is used as an optical semiconductor element (LED). Sealing materials are extremely useful.

本發明之光半導體元件密封材料用硬化樹脂組成物,其特徵在於:含有熔點為40~200℃之硬化觸媒與環氧樹脂及/或環氧樹脂硬化劑。 The cured resin composition for an optical semiconductor element sealing material of the present invention comprises a curing catalyst having a melting point of 40 to 200 ° C and an epoxy resin and/or an epoxy resin curing agent.

所謂本發明中之硬化觸媒,係使環氧基彼此、環氧基與羧基、環氧基與羧酸酐基、環氧基與胺基、環氧基與硫醇基、環氧基與醯胺基等之硬化開始或促進之化合物。 The curing catalyst in the present invention is an epoxy group, an epoxy group and a carboxyl group, an epoxy group and a carboxylic anhydride group, an epoxy group and an amine group, an epoxy group and a thiol group, an epoxy group and an anthracene. A compound which initiates or promotes the hardening of an amine group or the like.

本發明之光半導體密封用樹脂組成物於上述硬化觸媒 中,亦含有熔點為40~200℃之硬化觸媒。 The resin composition for sealing an optical semiconductor of the present invention is the above hardening catalyst It also contains a hardening catalyst with a melting point of 40 to 200 °C.

通常,光半導體密封用樹脂組成物於室溫下為液狀,作為其成形方式,可使用:注入方式,於插入固定有光半導體元件之基板的模框內注入密封材料後,進行加熱硬化而使其成形;壓縮成形方式,預先於模具上注入密封材料,使固定於基板上之光半導體元件浸漬於其中並進行加熱硬化後,自模具脫模等方式。 In general, the resin composition for optical semiconductor sealing is liquid at room temperature, and as a molding method, a sealing material can be injected into a mold frame into which a substrate on which an optical semiconductor element is fixed, and then heat-hardened. In the compression molding method, a sealing material is injected into the mold in advance, and the optical semiconductor element fixed on the substrate is immersed therein, heat-hardened, and then released from the mold.

作為注入方法,可使用分注器(dispenser)等。 As the injection method, a dispenser or the like can be used.

注入之密封樹脂係進行加熱而使其硬化。用以硬化之加熱係使用熱風循環式、紅外線、高頻等方法。加熱條件例如較佳為80~200℃、1分鐘~24小時左右。為了降低加熱硬化時產生之內部應力,通常於例如80~120℃下進行30分鐘~5小時預硬化後,於120~180℃、30分鐘~10小時之條件下進行後續硬化。 The injected sealing resin is heated and hardened. The heating system used for hardening uses a hot air circulation type, an infrared ray, a high frequency, and the like. The heating conditions are, for example, preferably from 80 to 200 ° C for about 1 minute to 24 hours. In order to reduce the internal stress generated during heat curing, it is usually subjected to pre-hardening at, for example, 80 to 120 ° C for 30 minutes to 5 hours, and then subjected to subsequent hardening at 120 to 180 ° C for 30 minutes to 10 hours.

光半導體密封用硬化樹脂組成物於選擇在室溫(25℃)下為固體之觸媒時,存在硬化物白濁等而LED之照度變差之問題,因此通常選擇液狀觸媒。然而,若使用於室溫(25℃)下為液狀之硬化觸媒,則雖然硬化物之外觀優異,但由於與在室溫(25℃)下為液狀之環氧樹脂及環氧樹脂硬化劑相融合,故而於將該等混合後,即便加熱硬化前亦會作為硬化觸媒而發揮功能,引起過度之黏度上升,出現加工性劣化之問題。 When the hardened resin composition for optical semiconductor sealing is a catalyst which is solid at room temperature (25 ° C), there is a problem that the illuminance of the LED is deteriorated due to white turbidity or the like of the cured product. Therefore, a liquid catalyst is usually selected. However, if it is a liquid hardening catalyst at room temperature (25 ° C), although the appearance of the cured product is excellent, it is a liquid epoxy resin and epoxy resin at room temperature (25 ° C). Since the hardeners are fused, they are combined as a curing catalyst even before being heated and hardened, causing an excessive increase in viscosity and a problem of deterioration in workability.

然而,於室溫(25℃)下為固體之觸媒由於在室溫(25℃)下完全不融合於環氧樹脂及環氧樹脂硬化劑,因此不 會引起過度之黏度上升。又,於加熱硬化時,藉由該等固體狀觸媒熔解而表現出觸媒能並直接硬化,因此硬化物之外觀亦無問題。 However, the catalyst which is solid at room temperature (25 ° C) is not fused at all at room temperature (25 ° C) to epoxy resin and epoxy resin hardener, so it is not Will cause excessive viscosity to rise. Further, at the time of heat curing, the solid catalyst is melted to express the catalyst energy and directly harden, so that the appearance of the cured product is not problematic.

就加工性、加熱硬化時熔解而表現出觸媒能之觀點而言,於室溫(25℃)下為固體之觸媒較佳為其熔點為40~200℃者。於此種情形時,就抑制過度之黏度上升之觀點而言,更佳為使用熔點為100~160℃之硬化觸媒,尤佳為使用熔點為120~160℃之硬化觸媒。 The catalyst which is solid at room temperature (25 ° C) preferably has a melting point of 40 to 200 ° C from the viewpoint of processability and melting at the time of heat curing to exhibit catalyst energy. In such a case, it is more preferable to use a hardening catalyst having a melting point of 100 to 160 ° C from the viewpoint of suppressing excessive viscosity increase, and it is particularly preferable to use a curing catalyst having a melting point of 120 to 160 ° C.

就透明性優異之方面而言,熔點為40~200℃之觸媒尤佳為銨鹽系硬化觸媒、鏻鹽系硬化觸媒、金屬皂系硬化觸媒。銨鹽系硬化觸媒例如可列舉:四甲基氫氧化銨(tetramethylammonium hydroxide)、四乙基氫氧化銨、四丙基氫氧化銨、四丁基氫氧化銨、三甲基乙基氫氧化銨、三甲基丙基氫氧化銨、三甲基丁基氫氧化銨、三甲基十六基氫氧化銨(tetramethylcetylammonium hydroxide)、三辛基甲基氫氧化銨、四甲基氯化銨(tetramethylammonium chloride)、四甲基溴化銨、四甲基碘化銨(tetramethylammonium iodide)、乙酸四甲基銨(tetramethylammonium acetate)、乙酸三辛基甲基銨等。鏻鹽系硬化觸媒例如可列舉:乙基三苯基溴化鏻(ethyltriphenylphosphonium bromide)、四苯基鏻四苯基硼酸鹽(tetraphenylphosphonium tetraphenylborate)、甲基三丁基鏻二甲基磷酸鹽、甲基三丁基鏻二乙基磷酸鹽等。金屬皂系硬化觸媒例如可列舉硬脂酸鈣、硬脂酸鋅、硬脂 酸鎂、硬脂酸鋁、硬脂酸鋇、硬脂酸鋰、硬脂酸鈉、硬脂酸鉀、12-羥基硬脂酸鈣、12-羥基硬脂酸鋅、12-羥基硬脂酸鎂、12-羥基硬脂酸鋁、12-羥基硬脂酸鋇、12-羥基硬脂酸鋰、12-羥基硬脂酸鈉、褐煤酸鈣(calcium montanate)、褐煤酸鋅、褐煤酸鎂、褐煤酸鋁、褐煤酸鋰、褐煤酸鈉、二十二酸鈣(calcium behenate)、二十二酸鋅、二十二酸鎂、二十二酸鋰、二十二酸鈉、二十二酸銀、月桂酸鈣、月桂酸鋅、月桂酸鋇、月桂酸鋰、十一碳烯酸鋅、蓖麻醇酸鋅(zinc ricinoleate)、蓖麻醇酸鋇、肉豆蔻酸鋅(zinc myristate)、棕櫚酸鋅等(zinc palmitate)。該等觸媒可使用一種或混合兩種以上而使用。 In terms of excellent transparency, a catalyst having a melting point of 40 to 200 ° C is preferably an ammonium salt-based curing catalyst, a cerium salt-based curing catalyst, or a metal soap-based curing catalyst. Examples of the ammonium salt-based hardening catalyst include tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and trimethylethylammonium hydroxide. , trimethylpropylammonium hydroxide, trimethylbutylammonium hydroxide, tetramethylcetylammonium hydroxide, trioctylmethylammonium hydroxide, tetramethylammonium Chloride), tetramethylammonium bromide, tetramethylammonium iodide, tetramethylammonium acetate, trioctylmethylammonium acetate, and the like. Examples of the barium salt-based hardening catalyst include ethyltriphenylphosphonium bromide, tetraphenylphosphonium tetraphenylborate, methyltributylphosphonium dimethyl phosphate, and A. Tributylphosphonium diethylphosphate and the like. Examples of the metal soap-based hardening catalyst include calcium stearate, zinc stearate, and stearin. Magnesium, aluminum stearate, barium stearate, lithium stearate, sodium stearate, potassium stearate, calcium 12-hydroxystearate, zinc 12-hydroxystearate, 12-hydroxystearic acid Magnesium, aluminum 12-hydroxystearic acid, bismuth 12-hydroxystearate, lithium 12-hydroxystearate, sodium 12-hydroxystearate, calcium montanate, zinc montanate, magnesium montanate, Aluminum montanate, lithium montanate, sodium montanate, calcium behenate, zinc behenate, magnesium phthalate, lithium dodecate, sodium dodecanoate, behenic acid Silver, calcium laurate, zinc laurate, barium laurate, lithium laurate, zinc undecylenate, zinc ricinoleate, ricinoleic acid, zinc myristate, Zinc palmitate. These catalysts may be used alone or in combination of two or more.

為了獲得硬化觸媒之熔點高且透明性、耐硫化性優異之硬化物,尤其可較佳地使用:硬脂酸鋅、褐煤酸鋅、二十二酸鋅、月桂酸鋅、十一碳烯酸鋅、蓖麻醇酸鋅、肉豆蔻酸鋅、棕櫚酸鋅等碳數10~30之羧酸鋅,12-羥基硬脂酸鋅等由具有羥基之碳數10~30的單羧酸化合物構成之鋅鹽。該等中,尤其是就適用期、耐硫化性優異之觀點而言,可較佳地使用硬脂酸鋅、十一碳烯酸鋅等由碳數10~20之單羧酸化合物構成之鋅鹽、12-羥基硬脂酸鋅等由具有羥基之碳數15~20的單羧酸化合物構成之鋅鹽,進而較佳為使用硬脂酸鋅、十一碳烯酸鋅、12-羥基硬脂酸鋅,尤佳為使用硬脂酸鋅、12-羥基硬脂酸鋅。 In order to obtain a cured product having a high melting point of a hardening catalyst and excellent transparency and sulfur resistance, it is particularly preferably used: zinc stearate, zinc montanate, zinc behenate, zinc laurate, undecene. a zinc carboxylic acid such as zinc cinnamate, zinc ricinoleate, zinc myristate or zinc palmitate, and a monocarboxylic acid compound having a carbon number of 10 to 30, such as zinc 12-hydroxystearic acid. The zinc salt is composed. Among these, zinc, which is composed of a monocarboxylic acid compound having 10 to 20 carbon atoms, such as zinc stearate or zinc undecylenate, can be preferably used from the viewpoint of excellent pot life and excellent sulfidation resistance. a zinc salt such as a salt or a monocarboxylic acid compound having a carbon number of 15 to 20, such as zinc, 12-hydroxystearic acid, or the like, and further preferably zinc stearate, zinc undecylenate or 12-hydroxyl hard. Zinc citrate, particularly preferably zinc stearate or zinc 12-hydroxystearate.

相對於下述環氧樹脂100重量份,熔點為40~200℃之硬化觸媒通常於0.001~15重量份之範圍使用。 The curing catalyst having a melting point of 40 to 200 ° C is usually used in an amount of 0.001 to 15 parts by weight based on 100 parts by weight of the epoxy resin described below.

熔點為40~200℃之硬化觸媒亦可進行粉碎而使用。作為其粉碎方法,可使用噴射磨機(jet mill)、行星式球磨機、螺旋磨機等。 The hardening catalyst having a melting point of 40 to 200 ° C can also be pulverized and used. As the pulverization method, a jet mill, a planetary ball mill, a spiral mill or the like can be used.

於本發明之硬化樹脂組成物中,使用環氧樹脂及/或環氧樹脂硬化劑。 An epoxy resin and/or an epoxy resin hardener is used in the cured resin composition of the present invention.

以下,對環氧樹脂硬化劑進行說明。 Hereinafter, the epoxy resin hardener will be described.

作為環氧樹脂硬化劑,例如可列舉胺系化合物、酸酐系化合物、醯胺系化合物、酚系化合物、多元羧酸等。 Examples of the epoxy resin curing agent include an amine compound, an acid anhydride compound, a guanamine compound, a phenol compound, and a polyvalent carboxylic acid.

於本發明中,作為環氧樹脂硬化劑,就硬度、加工性(於室溫下為液狀)、硬化物之透明性之觀點而言,尤佳為酸酐、多元羧酸,其中最佳為如下所述之使兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有一個羧酸酐基之化合物(d)、以及視需要之分子內具有兩個以上羧酸酐基之化合物(c)進行加成反應而獲得的多元羧酸樹脂(A)。 In the present invention, the epoxy resin curing agent is preferably an acid anhydride or a polyvalent carboxylic acid from the viewpoint of hardness, workability (liquid at room temperature), and transparency of the cured product. An oil (a) modified with methanol at both ends, a polyol compound (i) having two or more hydroxyl groups in the molecule, a compound (d) having a carboxylic anhydride group in the molecule, and, if necessary, intramolecular The polyvalent carboxylic acid resin (A) obtained by subjecting the compound (c) having two or more carboxylic anhydride groups to an addition reaction.

作為酸酐,具體而言,可列舉鄰苯二甲酸酐、偏苯三甲酸酐、均苯四甲酸酐(pyromellitic dianhydride)、順丁烯二酸酐、四氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、甲基耐地酸酐(methyl nadic anhydride)、耐地酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、丁烷四甲酸酐(butanetetracarboxylic acid anhydride)、二環[2,2,1]庚烷-2,3-二甲酸酐、甲基二環[2,2,1]庚烷-2,3-二甲酸酐、環己烷-1,3,4-三甲酸-3,4-酐等酸酐。 Specific examples of the acid anhydride include phthalic anhydride, trimellitic anhydride, pyromellitic dianhydride, maleic anhydride, tetrahydrophthalic anhydride, and methyltetrahydroortylene. Dimethyl anhydride, methyl nadic anhydride, ceric anhydride, hexahydrophthalic anhydride, methyl hexahydrophthalic anhydride, butanetetracarboxylic acid anhydride, bicyclo [2,2,1]heptane-2,3-dicarboxylic anhydride, methylbicyclo[2,2,1]heptane-2,3-dicarboxylic anhydride, cyclohexane-1,3,4- Anhydride such as tris-formic acid-3,4-anhydride.

就耐光性、透明性、加工性之觀點而言,尤佳為甲基 四氫鄰苯二甲酸酐、甲基耐地酸酐、耐地酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、丁烷四甲酸酐、二環[2,2,1]庚烷-2,3-二甲酸酐、甲基二環[2,2,1]庚烷-2,3-二甲酸酐、環己烷-1,3,4-三甲酸-3,4-酐等。 In terms of light resistance, transparency, and processability, it is particularly preferred to be methyl. Tetrahydrophthalic anhydride, methylic acid anhydride, ceric anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, butane tetracarboxylic anhydride, bicyclo[2,2,1 Heptane-2,3-dicarboxylic anhydride, methylbicyclo[2,2,1]heptane-2,3-dicarboxylic anhydride, cyclohexane-1,3,4-tricarboxylic acid-3,4 - Anhydride, etc.

多元羧酸係如下化合物,該化合物之特徵在於具有至少兩個羧基。 The polycarboxylic acid is a compound characterized by having at least two carboxyl groups.

多元羧酸較佳為2~6官能基之羧酸,例如可列舉:丁二酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、蘋果酸等直鏈烷二酸類,1,3,5-戊烷三甲酸、檸檬酸等烷基三甲酸類,鄰苯二甲酸、六氫鄰苯二甲酸、甲基六氫鄰苯二甲酸、四氫鄰苯二甲酸、甲基四氫鄰苯二甲酸、環己烷三甲酸、耐地酸(nadic acid)、甲基耐地酸等脂肪族環狀多元羧酸類,次亞麻油酸或油酸等不飽和脂肪酸之多聚體及作為該等之還原物之二聚酸類,藉由2~6官能基之多元醇與酸酐之反應而獲得之化合物類,就耐熱性、加工性之觀點而言,更佳為藉由2~6官能基之多元醇與酸酐之反應而獲得之化合物類。進而,就透明性之觀點而言,較佳為上述酸酐為飽和脂肪族環狀酸酐之多元羧酸。 The polyvalent carboxylic acid is preferably a carboxylic acid having 2 to 6 functional groups, and examples thereof include succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, sebacic acid, sebacic acid, malic acid, and the like. Linear alkanoic acid, 1,3,5-pentane tricarboxylic acid, alkyl tricarboxylic acid such as citric acid, phthalic acid, hexahydrophthalic acid, methylhexahydrophthalic acid, tetrahydrogen An aliphatic cyclic polycarboxylic acid such as phthalic acid, methyltetrahydrophthalic acid, cyclohexane tricarboxylic acid, nadic acid or methyl acid, sublinoleic acid or oleic acid A polymer obtained by reacting a polybasic acid of a saturated fatty acid and a dimer acid as a reducing substance thereof with a hydroxyl group of a 2-6 functional group and an acid anhydride, from the viewpoint of heat resistance and workability, It is preferably a compound obtained by the reaction of a 2-6 functional group polyol with an acid anhydride. Further, from the viewpoint of transparency, the above-mentioned acid anhydride is preferably a polyvalent carboxylic acid of a saturated aliphatic cyclic acid anhydride.

作為2~6官能基之多元醇,只要為具有醇性羥基之化合物,則並無特別限定,可列舉:乙二醇、丙二醇、1,3-丙二醇、1,2-丁二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、環己烷二甲醇、2,4-二乙基戊二醇、2-乙基-2-丁基-1,3-丙二醇、新戊二醇、三環癸烷二甲醇、降莰二醇(norbornene diol)等二醇類,甘油、三羥甲基乙烷、三羥甲基丙烷、三羥甲 基丁烷、2-羥甲基-1,4-丁二醇等三醇類,新戊四醇、二-三羥甲基丙烷等四醇類,二新戊四醇等六醇類等。 The polyol having a 2-6 functional group is not particularly limited as long as it is a compound having an alcoholic hydroxyl group, and examples thereof include ethylene glycol, propylene glycol, 1,3-propanediol, and 1,2-butanediol. 4-butanediol, 1,5-pentanediol, 1,6-hexanediol, cyclohexanedimethanol, 2,4-diethylpentanediol, 2-ethyl-2-butyl-1 , diols such as 3-propanediol, neopentyl glycol, tricyclodecane dimethanol, norbornene diol, glycerin, trimethylolethane, trimethylolpropane, trishydroxyl Triols such as butylbutane and 2-hydroxymethyl-1,4-butanediol; tetraols such as pentaerythritol and di-trimethylolpropane; and hexaols such as dipentaerythritol.

較佳之多元醇為碳數為5以上之醇,較佳為1,6-己二醇、1,4-環己烷二甲醇、1,3-環己烷二甲醇、1,2-環己烷二甲醇、2,4-二乙基戊二醇、2-乙基-2-丁基-1,3-丙二醇、新戊二醇、三環癸烷二甲醇、降莰二醇等化合物,其中,就耐熱性、透明性之觀點而言,較佳為2-乙基-2-丁基-1,3-丙二醇、新戊二醇、2,4-二乙基戊二醇、1,4-環己烷二甲醇、三環癸烷二甲醇、降莰二醇等具有支鏈狀結構或環狀結構之醇類,尤佳為三環癸烷二甲醇。 Preferred polyols are alcohols having a carbon number of 5 or more, preferably 1,6-hexanediol, 1,4-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,2-cyclohexane. Alkane dimethanol, 2,4-diethylpentanediol, 2-ethyl-2-butyl-1,3-propanediol, neopentyl glycol, tricyclodecane dimethanol, norbornenediol, etc. Among them, from the viewpoint of heat resistance and transparency, 2-ethyl-2-butyl-1,3-propanediol, neopentyl glycol, 2,4-diethylpentanediol, and 1, An alcohol having a branched structure or a cyclic structure such as 4-cyclohexanedimethanol, tricyclodecane dimethanol or norbornylene glycol, and more preferably tricyclodecane dimethanol.

作為與多元醇反應之酸酐,尤佳為甲基四氫鄰苯二甲酸酐、甲基耐地酸酐、耐地酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、丁烷四甲酸酐、二環[2,2,1]庚烷-2,3-二甲酸酐、甲基二環[2,2,1]庚烷-2,3-二甲酸酐、環己烷-1,3,4-三甲酸-3,4-酐等,其中,就耐熱性、透明性、加工性之觀點而言,較佳為甲基六氫鄰苯二甲酸酐、環己烷-1,3,4-三甲酸-3,4-酐。 As an acid anhydride for reacting with a polyhydric alcohol, methyl tetrahydrophthalic anhydride, methylic acid anhydride, ceric anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, and butyl are preferable. Alkyltetracarboxylic anhydride, bicyclo[2,2,1]heptane-2,3-dicarboxylic anhydride, methylbicyclo[2,2,1]heptane-2,3-dicarboxylic anhydride, cyclohexane -1,3,4-tricarboxylic acid-3,4-anhydride, etc., among them, methylhexahydrophthalic anhydride and cyclohexane are preferable from the viewpoint of heat resistance, transparency, and processability. 1,3,4-tricarboxylic acid-3,4-anhydride.

作為加成反應之條件,只要為公知之方法,則可無特別限定地使用,作為具體之反應條件,例如可列舉:於無觸媒、無溶劑之條件下,使酸酐、多元醇於40~150℃下反應並加熱,反應結束後直接取出之方法。 The conditions of the addition reaction are not particularly limited as long as they are a known method. Specific reaction conditions include, for example, an acid anhydride or a polyhydric alcohol in a solvent-free or solvent-free condition. The reaction is carried out at 150 ° C and heated, and the method is directly taken out after the reaction is completed.

作為本發明之光半導體密封用硬化樹脂組成物所使用之環氧樹脂硬化劑,較佳之多元羧酸樹脂(A)為使兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇 化合物(i)、分子內具有一個酸酐基之化合物(d)、以及視需要之分子內具有兩個以上酸酐基之化合物(c)進行加成反應而獲得的多元羧酸樹脂(A)。 The epoxy resin curing agent used for the cured resin composition for optical semiconductor sealing of the present invention is preferably a polycarboxylic acid resin (A) which is an oil (a) which is modified at both ends of methanol, and has two or more hydroxyl groups in the molecule. Polyol The polyvalent carboxylic acid resin (A) obtained by subjecting the compound (i), the compound (d) having one acid anhydride group in the molecule, and the compound (c) having two or more acid anhydride groups in the molecule as needed.

通常,僅由低分子量之C、H、O原子構成之多元羧酸大多情況下於室溫(25℃)下為固體狀態,難以直接用作由環氧樹脂構成之光半導體密封用硬化樹脂組成物之硬化劑。然而,若其成分中含有具Si-O鍵之重複單元的聚矽氧烷化合物,則可根據其分子間力之大小而於室溫(25℃)下以液狀存在。藉由使用兩末端之甲醇改質之矽油(a)作為反應原料,作為本發明之光半導體密封用硬化樹脂組成物所使用之環氧樹脂硬化劑較佳之多元羧酸樹脂(A)亦可於室溫(25℃)下以液狀存在。 In general, a polycarboxylic acid composed only of low molecular weight C, H, and O atoms is usually in a solid state at room temperature (25 ° C), and is difficult to be directly used as a hardening resin for optical semiconductor sealing composed of an epoxy resin. Hardener of matter. However, if the component contains a polyoxyalkylene compound having a repeating unit of a Si-O bond, it may exist in a liquid state at room temperature (25 ° C) depending on the amount of its intermolecular force. By using the methanol-modified eucalyptus oil (a) at both ends as a reaction raw material, the epoxy resin hardener used as the cured resin composition for optical semiconductor sealing of the present invention is preferably a polyvalent carboxylic acid resin (A). It is present in liquid form at room temperature (25 ° C).

使兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有一個酸酐基之化合物(d)進行加成反應,藉此,兩末端甲醇改質之矽油(a)的甲醇之羥基與分子內具有一個酸酐基之化合物(d)之酸酐基進行伴隨酸酐基之開環之加成反應,又,多元醇化合物(i)之羥基與具有酸酐基之化合物(d)之酸酐基進行伴隨酸酐基之開環之加成反應,而分別獲得兩末端具有羧基之多元羧酸混合物、即多元羧酸樹脂(A)。 The eucalyptus oil (a) modified with methanol at both ends, the polyol compound (i) having two or more hydroxyl groups in the molecule, and the compound (d) having an acid anhydride group in the molecule are subjected to an addition reaction, whereby the methanol at both ends is changed. The hydroxyl group of methanol of the eucalyptus oil (a) and the acid anhydride group of the compound (d) having an acid anhydride group in the molecule undergo a ring-opening addition reaction with the acid anhydride group, and the hydroxyl group of the polyol compound (i) has an acid anhydride. The acid anhydride group of the compound (d) is subjected to a ring-opening addition reaction with an acid anhydride group, and a polycarboxylic acid resin (A) having a carboxyl group at both terminals is obtained, that is, a polycarboxylic acid resin (A).

又,進而使用分子內具有兩個以上酸酐基之化合物(c)作為反應原料,藉此使兩末端甲醇改質之矽油(a)彼此、及/或分子內具有兩個以上羥基之多元醇化合物(i)彼此、及/或兩末端甲醇改質之矽油(a)與分子內具有兩個以上羥 基之多元醇化合物(i)聚合成為同一分子。 Further, a compound (c) having two or more acid anhydride groups in the molecule is used as a reaction raw material, whereby the eucalyptus oil (a) having both ends of methanol reformed and (or) a polyol compound having two or more hydroxyl groups in the molecule (i) 矽 ( (a) modified with methanol and methanol at both ends and/or both ends, and two or more hydroxy groups in the molecule The polyol compound (i) based on the polymerization is polymerized into the same molecule.

尤其是,當兩末端甲醇改質之矽油(a)之兩末端酸酐加成物與分子內具有兩個以上羥基之多元醇化合物(i)之酸酐加成物的相溶性差而分離時,使用分子內具有兩個以上酸酐基之化合物(c),藉此使兩末端甲醇改質之矽油(a)與分子內具有兩個以上羥基之多元醇化合物(i)可成為同一分子而聚合,亦可於室溫(25℃)下作為均勻之液狀物質而獲得。 In particular, when the acid anhydride adduct of the two terminal methanol-modified oleic oils (a) is poorly miscible with the acid anhydride adduct of the polyol compound (i) having two or more hydroxyl groups in the molecule, it is used. a compound (c) having two or more acid anhydride groups in the molecule, whereby the eucalyptus oil (a) modified at both ends of the methanol and the polyol compound (i) having two or more hydroxyl groups in the molecule can be polymerized by the same molecule. It can be obtained as a homogeneous liquid substance at room temperature (25 ° C).

以下,對成為多元羧酸樹脂(A)之原料的兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有兩個以上酸酐基之化合物(c)、及分子內具有一個酸酐基之化合物(d)進行說明。 In the following, the eucalyptus oil (a) which is a two-terminal methanol reforming material which is a raw material of the polyvalent carboxylic acid resin (A), the polyol compound (i) having two or more hydroxyl groups in the molecule, and the compound having two or more acid anhydride groups in the molecule (c) and a compound (d) having an acid anhydride group in the molecule will be described.

首先,對兩末端甲醇改質之矽油(a)進行說明。 First, the two-terminal methanol-modified eucalyptus oil (a) will be described.

作為兩末端之甲醇改質之矽油(a)之例,為下述式(1)所示之兩末端具有醇性羥基之矽氧化合物。 An example of the eucalyptus oil (a) which is modified by the methanol at both ends is an anthracene compound having an alcoholic hydroxyl group at both terminals represented by the following formula (1).

(式(1)中,R1表示碳總數1~10之伸烷基、具有醚鍵之伸烷基,R2表示碳數1~3之烷基或苯基,m為平均值且表示1~100) (In the formula (1), R 1 represents an alkylene group having 1 to 10 carbon atoms, an alkylene group having an ether bond, R 2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, and m is an average value and represents 1 ~100)

式(1)中,作為R1之具體例,可列舉:亞甲基、伸乙 基、伸丙基、伸異丙基、伸丁基、伸異丁基、伸戊基、伸異戊基、伸己基、伸庚基、伸辛基等伸烷基,乙氧基伸乙基、丙氧基伸乙基、丙氧基伸丙基、乙氧基伸丙基等具有醚鍵之伸烷基等。尤佳者為丙氧基伸乙基、乙氧基伸丙基。 In the formula (1), specific examples of R 1 include a methylene group, an exoethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a pentyl group, and an isoamyl group. And an alkyl group having an ether bond such as an alkyl group, an ethoxy group, an ethyl group, a propoxy group, a propoxy group, an ethoxy group, a propyl group, and the like. Particularly preferred are propoxyethyl, ethoxypropyl.

繼而,R2表示甲基等碳數1~3之烷基或苯基,可為相同或不同種類之任一種,為了藉由使兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有一個酸酐基之化合物(d)、及視需要之分子內具有兩個以上酸酐基之化合物(c)進行加成反應而獲得之多元羧酸樹脂(A)於室溫下為液狀,與苯基相比,較佳為甲基。 Further, R 2 represents an alkyl group having 1 to 3 carbon atoms such as a methyl group or a phenyl group, and may be any of the same or different types, in order to modify the both ends of the methanol (a), and have two molecules in the molecule. The polyhydric carboxylic acid resin obtained by the addition reaction of the above hydroxyl group polyol compound (i), the compound (d) having one acid anhydride group in the molecule, and the compound (c) having two or more acid anhydride groups in the molecule as necessary (A) is a liquid at room temperature, and is preferably a methyl group as compared with a phenyl group.

式(1)中,m為平均值且為1~100,較佳為2~80,更佳為5~30。 In the formula (1), m is an average value and is from 1 to 100, preferably from 2 to 80, more preferably from 5 to 30.

式(1)所示之兩末端甲醇改質之矽油(a)例如可列舉:X-22-160AS、KF6001、KF6002、KF6003(均為信越化學工業(股)製造),BY16-201、BY16-004、SF8427(均為Toray Dow Corning(股)製造),XF42-B0970、XF42-C3294(均為Momentive Performance Materials Japan有限公司製造)等,且均可自市場上獲得。該等兩末端甲醇改質之矽油可使用一種或混合兩種以上。該等中,較佳為X-22-160AS、KF6001、KF6002、BY16-201、XF42-B0970。 The two-terminal methanol-modified eucalyptus oil (a) represented by the formula (1) may, for example, be X-22-160AS, KF6001, KF6002, KF6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BY16-201, BY16- 004, SF8427 (all manufactured by Toray Dow Corning Co., Ltd.), XF42-B0970, XF42-C3294 (all manufactured by Momentive Performance Materials Japan Co., Ltd.), and the like, and are available on the market. These two-terminal methanol-modified eucalyptus oils may be used alone or in combination of two or more. Among these, X-22-160AS, KF6001, KF6002, BY16-201, and XF42-B0970 are preferable.

繼而,對分子內具有兩個以上羥基之多元醇化合物(i)進行說明。 Next, a polyol compound (i) having two or more hydroxyl groups in the molecule will be described.

作為分子內具有兩個以上羥基之多元醇化合物(i), 例如可列舉末端醇聚酯化合物(b)、烴多元醇化合物(j)、末端醇聚碳酸酯化合物。 As the polyol compound (i) having two or more hydroxyl groups in the molecule, For example, a terminal alcohol polyester compound (b), a hydrocarbon polyol compound (j), and a terminal alcohol polycarbonate compound are mentioned.

作為末端之醇聚酯化合物(b),並無特別限定,例如可列舉下述式(2)所示之末端具有羥基之聚酯化合物等。 The terminal polyester compound (b) is not particularly limited, and examples thereof include a polyester compound having a hydroxyl group at the terminal represented by the following formula (2).

(式(2)中,R3、R4分別獨立表示碳數1~10之伸烷基,n為平均值且表示1~100) (In the formula (2), R 3 and R 4 each independently represent an alkylene group having 1 to 10 carbon atoms, and n is an average value and represents 1 to 100)

式(2)中,作為R3之具體例,可列舉:伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基、伸辛基等碳數1~10之直鏈伸烷基,伸異丙基、乙基丁基伸丙基、伸異丁基、伸異戊基、伸新戊基、二乙基伸戊基等碳數1~10之具有支鏈之伸烷基,環戊烷二亞甲基、環己烷二亞甲基等具有環狀結構之伸烷基。其中,較佳為碳數1~10之具有支鏈之伸烷基或具有環狀結構之伸烷基,尤其是就硬化物之耐熱透明性之觀點而言,較佳為乙基丁基伸丙基、伸異丁基、伸新戊基、二乙基伸戊基、環己烷二亞甲基。 In the formula (2), specific examples of R 3 include a methyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and a octyl group. a chain extending alkyl group, an extended isopropyl group, an ethyl butyl propyl group, an isobutyl group, an isoamyl group, a neopentyl group, a diethyl pentyl group, and the like a terminal alkyl group having a cyclic structure such as cyclopentane dimethylene or cyclohexane dimethylene. Among them, a branched alkyl group having a carbon number of 1 to 10 or a stretched alkyl group having a cyclic structure is preferred, and in particular, from the viewpoint of heat-resistant transparency of the cured product, ethylbutyl bromide is preferred. Base, isobutylene, neopentyl, diethyl pentyl, cyclohexane dimethylene.

式(2)中,作為R4之具體例,可列舉:伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基、伸辛基等碳數1~10之直鏈伸烷基,伸異丙基、乙基丁基伸丙基、伸異丁基、伸異戊基、伸新戊基(neopentylene)、二乙基伸戊基等 碳數1~10之具有支鏈之伸烷基,環戊烷二亞甲基、環己烷二亞甲基等具有環狀結構之伸烷基。其中,較佳為碳數1~10之直鏈伸烷基,就硬化物對於基材等之密接性之觀點而言,尤佳為伸丙基、伸丁基、伸戊基、伸己基。 In the formula (2), as a specific example of R 4 , a carbon number of 1 to 10 such as an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and an exooctyl group may be mentioned. Chain alkyl, isopropyl, ethyl butyl propyl, isobutyl, isopentyl, neopentylene, diethyl pentyl, etc., having a carbon number of 1 to 10 An alkyl group having a cyclic structure such as an alkyl group, a cyclopentane dimethylene group or a cyclohexane dimethylene group. Among them, a linear alkyl group having 1 to 10 carbon atoms is preferable, and from the viewpoint of adhesion of a cured product to a substrate or the like, a propyl group, a butyl group, a pentyl group and a hexyl group are particularly preferable.

式(2)中,n為平均值且為1~100,較佳為2~40,更佳為3~30。 In the formula (2), n is an average value and is from 1 to 100, preferably from 2 to 40, more preferably from 3 to 30.

末端醇聚酯化合物(b)之重量平均分子量(Mw)為500~20000,較佳為500~5000,更佳為500~3000。若重量平均分子量未達500,則存在本發明之硬化樹脂組成物之硬化物硬度變得過高而於熱循環試驗等產生裂痕之情況,若重量平均分子量大於20000,則存在產生硬化物之黏膩感之情況。於本發明中,作為重量平均分子量,係指基於利用GPC(gel permeation chromatography,凝膠滲透層析法)於下述條件下所測得之值,經聚苯乙烯換算而算出之重量平均分子量(Mw)。 The terminal alcohol polyester compound (b) has a weight average molecular weight (Mw) of from 500 to 20,000, preferably from 500 to 5,000, more preferably from 500 to 3,000. When the weight average molecular weight is less than 500, the cured product of the cured resin composition of the present invention has an excessively high hardness and is cracked in a heat cycle test or the like. If the weight average molecular weight is more than 20,000, the cured product is sticky. Feeling tired. In the present invention, the weight average molecular weight is a weight average molecular weight calculated by polystyrene conversion based on a value measured by GPC (gel permeation chromatography) under the following conditions ( Mw).

GPC之各種條件 Various conditions of GPC

製造商:島津製作所 Manufacturer: Shimadzu Manufacturing Co., Ltd.

管柱:保護管柱SHODEX GPC LF-G LF-804(3根) Pipe column: protection column SHODEX GPC LF-G LF-804 (3 roots)

流速:1.0 ml/min Flow rate: 1.0 ml/min

管柱溫度:40℃ Column temperature: 40 ° C

使用溶劑:THF(Tetrahydrofuran,四氫呋喃) Solvent: THF (Tetrahydrofuran, tetrahydrofuran)

檢測器:RI(示差折射率檢測器) Detector: RI (differential refractive index detector)

式(2)所示之末端醇聚酯化合物(b)例如可列舉末端具有醇性羥基之聚酯多元醇類。作為其具體例,可列舉: 作為聚酯多元醇之Kyowapol 1000PA、Kyowapol 2000PA、Kyowapol 3000PA、Kyowapol 2000BA(均為Kyowa Hakko Chemical(股)製造);Adeka Newace Y9-10、Adeka Newace YT-101(均為ADEKA(股)製造);Placcel 220EB、Placcel 220EC(均為Daicel Chemical Industries(股)製造);Polylite OD-X-286、Polylite OD-X-102、Polylite OD-X-355、Polylite OD-X-2330、Polylite OD-X-240、Polylite OD-X-668、Polylite OD-X-2554、Polylite OD-X-2108、Polylite OD-X-2376、Polylite OD-X-2044、Polylite OD-X-688、Polylite OD-X-2068、Polylite OD-X-2547、Polylite OD-X-2420、Polylite OD-X-2523、Polylite OD-X-2555(均為DIC(股)製造);HS2H-201AP、HS2H-351A、HS2H-451A、HS2H-851A、HS2N-221A、HS2N-521A、HS2H-220S、HS2N-220S、HS2N-226P、HS2B-222A、HOKOKUOL HT-110、HOKOKUOL HT-210、HOKOKUOL HT-12、HOKOKUOL HT-250、HOKOKUOL HT-310、HOKOKUOL HT-40M(均為豐國製油(股)製造)等,且均可自市場上獲得。該等聚酯化合物可使用一種或混合兩種以上而使用。該等中,較佳為Kyowapol 1000PA、Adeka Newace Y9-10、HS2N-221A。 The terminal alcohol polyester compound (b) represented by the formula (2) is, for example, a polyester polyol having an alcoholic hydroxyl group at its terminal. As a specific example, there are mentioned: Kyowapol 1000PA, Kyowapol 2000PA, Kyowapol 3000PA, Kyowapol 2000BA (all manufactured by Kyowa Hakko Chemical Co., Ltd.) as polyester polyol; Adeka Newace Y9-10, Adeka Newace YT-101 (all manufactured by ADEKA); Placcel 220EB, Placcel 220EC (all manufactured by Daicel Chemical Industries); Polylite OD-X-286, Polylite OD-X-102, Polylite OD-X-355, Polylite OD-X-2330, Polylite OD-X- 240, Polylite OD-X-668, Polylite OD-X-2554, Polylite OD-X-2108, Polylite OD-X-2376, Polylite OD-X-2044, Polylite OD-X-688, Polylite OD-X-2068 , Polylite OD-X-2547, Polylite OD-X-2420, Polylite OD-X-2523, Polylite OD-X-2555 (all manufactured by DIC); HS2H-201AP, HS2H-351A, HS2H-451A, HS2H-851A, HS2N-221A, HS2N-521A, HS2H-220S, HS2N-220S, HS2N-226P, HS2B-222A, HOKOKUOL HT-110, HOKOKUOL HT-210, HOKOKUOL HT-12, HOKOKUOL HT-250, HOKOKUOL HT -310, HOKOKUOL HT-40M (both manufactured by Fengguo Oil Co., Ltd.), etc., and are available on the market. These polyester compounds can be used singly or in combination of two or more. Among these, Kyowapol 1000PA, Adeka Newace Y9-10, and HS2N-221A are preferred.

繼而,對烴多元醇化合物(j)進行說明。 Next, the hydrocarbon polyol compound (j) will be described.

烴多元醇化合物(j)為分子中具有兩個以上羥基之烴化合物,例如可列舉:乙二醇、丙二醇(propylene glycol)、丙二醇(propanediol)、丁二醇、二甲基乙醇、戊二醇、新 戊二醇、己二醇、二甲基丁二醇、庚二醇、二甲基戊二醇、二乙基丙二醇、辛二醇、二甲基己二醇、二乙基丁二醇、壬二醇、二甲基庚二醇、二乙基戊二醇、癸二醇、二甲基辛二醇、二乙基己二醇、乙基丁基丙二醇、3-羥甲基-1,5-戊二醇、二甘油、二新戊四醇、三羥甲基丙烷、雙三羥甲基丙烷等鏈狀烴多元醇化合物;或環戊二醇、環戊烷二甲醇、環己二醇、環己烷二甲醇、三環癸二醇、三環癸烷二甲醇、降冰片烷二醇(norbornane diol)、降冰片烷二甲醇等環狀烴多元醇化合物。該等烴多元醇化合物(j)可使用一種或混合兩種以上而使用。該等中,就硬化物之強度、硬化物之透明性之觀點而言,較佳為三環癸烷二甲醇、雙三羥甲基丙烷、二甘油。 The hydrocarbon polyol compound (j) is a hydrocarbon compound having two or more hydroxyl groups in the molecule, and examples thereof include ethylene glycol, propylene glycol, propanediol, butanediol, dimethyl alcohol, and pentanediol. ,new Pentanediol, hexanediol, dimethylbutanediol, heptanediol, dimethylpentanediol, diethylpropanediol, octanediol, dimethylhexanediol, diethylbutanediol, hydrazine Glycol, dimethyl heptanediol, diethyl pentanediol, decanediol, dimethyloctanediol, diethylhexanediol, ethylbutylpropanediol, 3-hydroxymethyl-1,5 a chain hydrocarbon polyol compound such as pentanediol, diglycerin, dipentaerythritol, trimethylolpropane or ditrimethylolpropane; or cyclopentanediol, cyclopentane dimethanol or cyclohexanediol a cyclic hydrocarbon polyol compound such as cyclohexanedimethanol, tricyclodecanediol, tricyclodecane dimethanol, norbornane diol, norbornane dimethanol. These hydrocarbon polyol compounds (j) can be used singly or in combination of two or more. Among these, from the viewpoint of the strength of the cured product and the transparency of the cured product, tricyclodecane dimethanol, ditrimethylolpropane, and diglycerin are preferable.

以下,對末端醇聚碳酸酯化合物進行說明。 Hereinafter, the terminal alcohol polycarbonate compound will be described.

作為末端醇聚碳酸酯化合物,並無特別限定,例如可列舉下述式(7)所示之末端具有羥基之聚碳酸酯化合物等。 The terminal alcohol polycarbonate compound is not particularly limited, and examples thereof include a polycarbonate compound having a hydroxyl group at the terminal represented by the following formula (7).

(式(7)中,R8表示碳數1~10之伸烷基,s為平均值且表示1~100) (In the formula (7), R 8 represents an alkylene group having 1 to 10 carbon atoms, and s is an average value and represents 1 to 100)

式(7)中,作為R8之具體例,可列舉:亞甲基、伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基、伸辛基等碳數1~10之直鏈伸烷基,伸異丙基、乙基丁基伸丙基、 伸異丁基、伸異戊基、伸新戊基、二乙基伸戊基等碳數1~10之具有支鏈之伸烷基,環戊烷二亞甲基、環己烷二亞甲基等具有環狀結構之伸烷基。其中,就末端醇聚碳酸酯化合物之黏度不會過高、加工性之觀點而言,較佳為伸丁基、伸戊基、伸己基、伸庚基等碳數4~7之直鏈伸烷基。 In the formula (7), specific examples of R 8 include a methylene group, an exoethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and a octyl group. ~10 linear alkyl, isopropyl, ethyl butyl propyl, isobutyl, isoamyl, neopentyl, diethyl pentyl The alkyl group having a cyclic structure such as an alkyl group of a chain, a cyclopentane dimethylene group or a cyclohexane dimethylene group. Among them, in view of the fact that the viscosity of the terminal alcohol polycarbonate compound is not excessively high and workability, a linear extension of a carbon number of 4 to 7 such as a butyl group, a pentyl group, a hexyl group or a heptyl group is preferred. alkyl.

式(7)中,複數存在之R8可相同亦可不同。 In the formula (7), R 8 in the plural may be the same or different.

式(7)中,s為平均值且為1~100,較佳為2~40,更佳為3~30。 In the formula (7), s is an average value and is from 1 to 100, preferably from 2 to 40, more preferably from 3 to 30.

末端醇聚碳酸酯化合物之重量平均分子量(Mw)較佳為500~20000,更佳為500~5000,進而較佳為500~3000。若重量平均分子量為500以上,則本發明之光半導體密封用硬化樹脂組成物之硬化物硬度不會過高,且無需擔心於熱循環試驗等中出現裂痕,故較佳。又,若重量平均分子量為20000以下,則無需擔心產生硬化物之黏膩感,故較佳。於本發明中,作為重量平均分子量,係指基於利用GPC(凝膠滲透層析法)於下述條件下所測得之值,經聚苯乙烯換算而算出之重量平均分子量(Mw)。 The weight average molecular weight (Mw) of the terminal alcohol polycarbonate compound is preferably from 500 to 20,000, more preferably from 500 to 5,000, still more preferably from 500 to 3,000. When the weight average molecular weight is 500 or more, the cured product of the optical resin sealing cured resin composition of the present invention is not excessively high in hardness, and is not required to be cracked in a heat cycle test or the like, which is preferable. Moreover, when the weight average molecular weight is 20,000 or less, there is no need to worry about the sticky feeling of the cured product, which is preferable. In the present invention, the weight average molecular weight is a weight average molecular weight (Mw) calculated based on polystyrene conversion based on a value measured by GPC (gel permeation chromatography) under the following conditions.

GPC之各種條件 Various conditions of GPC

製造商:島津製作所 Manufacturer: Shimadzu Manufacturing Co., Ltd.

管柱:保護管柱SHODEX GPC LF-G LF-804(3根) Pipe column: protection column SHODEX GPC LF-G LF-804 (3 roots)

流速:1.0 ml/min Flow rate: 1.0 ml/min

管柱溫度:40℃ Column temperature: 40 ° C

使用溶劑:THF(四氫呋喃) Solvent: THF (tetrahydrofuran)

檢測器:RI(示差折射率檢測器) Detector: RI (differential refractive index detector)

分子內具有兩個以上羥基之多元醇化合物(i)之使用量並無特別限定,相對於兩末端甲醇改質之矽油(a)100重量份,較佳為0.5~200重量份,更佳為5~50重量份,進而較佳為10~30重量份。若為0.5重量份以上,則硬化物之機械強度進一步提高,故較佳,若為200重量份以下,則硬化物之耐熱透明性進一步提高、或所得之多元羧酸樹脂(A)之黏度變得更適合,故較佳。 The amount of the polyol compound (i) having two or more hydroxyl groups in the molecule is not particularly limited, and is preferably from 0.5 to 200 parts by weight, more preferably from 0.5 to 200 parts by weight, based on 100 parts by weight of the oleic oil (a) modified with methanol at both ends. 5 to 50 parts by weight, more preferably 10 to 30 parts by weight. When the amount is 0.5 parts by weight or more, the mechanical strength of the cured product is further improved, and when it is 200 parts by weight or less, the heat-resistant transparency of the cured product is further improved, or the viscosity of the obtained polyvalent carboxylic acid resin (A) is changed. It is more suitable, so it is better.

以下,對分子內具有兩個以上羧酸酐基之化合物(c)進行說明。 Hereinafter, the compound (c) having two or more carboxylic anhydride groups in the molecule will be described.

分子內具有兩個以上羧酸酐基之化合物(c)例如可列舉1,2,3,4-丁烷四甲酸二酐、1,2,3,4-環丁烷四甲酸二酐、1,2,3,4-環戊烷四甲酸二酐、1,2,4,5-環己烷四甲酸二酐、均苯四甲酸酐、5-(2,5-二氧四氫呋喃基)-3-甲基-3-環己烯-1,2-二甲酸酐(5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride)、4-(2,5-二氧四氫呋喃-3-基)-1,2,3,4-四氫化萘-1,2-二甲酸酐等。 Examples of the compound (c) having two or more carboxylic acid anhydride groups in the molecule include 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, and 1, 2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, pyromellitic anhydride, 5-(2,5-dioxotetrahydrofuranyl)-3 -5-(2,5-dioxotetrahydrofuryl-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride), 4-(2,5 - Dihydrotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic anhydride and the like.

分子內具有兩個以上羧酸酐基之化合物(c)可使用一種或混合兩種以上而使用。其中,由於使多元羧酸樹脂(A)與下述之環氧樹脂硬化而成之硬化物之透明性優異,故較佳為1,2,3,4-丁烷四甲酸二酐、1,2,4,5-環己烷四甲酸二酐、4-(2,5-二氧四氫呋喃-3-基)-1,2,3,4-四氫化萘-1,2-二甲酸酐,尤佳為1,2,3,4-丁烷四甲酸二酐。 The compound (c) having two or more carboxylic anhydride groups in the molecule may be used alone or in combination of two or more. In addition, since the cured product obtained by curing the polyvalent carboxylic acid resin (A) and the epoxy resin described below is excellent in transparency, it is preferably 1,2,3,4-butanetetracarboxylic dianhydride and 1, 2,4,5-cyclohexanetetracarboxylic dianhydride, 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic anhydride, More preferably, it is 1,2,3,4-butane tetracarboxylic dianhydride.

以下,對分子內具有一個羧酸酐基之化合物(d)進行 說明。 Hereinafter, the compound (d) having a carboxylic anhydride group in the molecule is subjected to Description.

分子內具有一個羧酸酐基之化合物(d)可列舉:琥珀酸酐、甲基琥珀酸酐、乙基琥珀酸酐、2,3-丁烷二甲酸酐、2,4-戊烷二甲酸酐、3,5-庚烷二甲酸酐等飽和脂肪族羧酸酐,順丁烯二酸酐、十二烷基琥珀酸酐等不飽和脂肪族羧酸酐,六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、1,3-環己烷二甲酸酐、降冰片烷-2,3-二甲酸酐、甲基降冰片烷-2,3-二甲酸酐、耐地酸酐、甲基耐地酸酐、二環[2,2,2]辛烷-2,3-二甲酸酐、1,2,4-環己烷三甲酸-1,2-酐等環狀飽和脂肪族羧酸酐,四氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、耐地酸酐、甲基耐地酸酐、4,5-二甲基-4-環己烯-1,2-二甲酸酐、二環[2,2,2]-5-辛烯-2,3-二甲酸酐等環狀不飽和脂肪族羧酸酐,鄰苯二甲酸酐、間苯二甲酸酐、對苯二甲酸酐、偏苯三甲酸酐等芳香族羧酸酐等。 The compound (d) having a carboxylic anhydride group in the molecule may, for example, be succinic anhydride, methyl succinic anhydride, ethyl succinic anhydride, 2,3-butane dicarboxylic anhydride, 2,4-pentane dicarboxylic anhydride, 3, a saturated aliphatic carboxylic acid anhydride such as 5-heptane dicarboxylic anhydride, an unsaturated aliphatic carboxylic anhydride such as maleic anhydride or dodecyl succinic anhydride, hexahydrophthalic anhydride or methylhexahydrophthalic acid Anhydride, 1,3-cyclohexanedicarboxylic anhydride, norbornane-2,3-dicarboxylic anhydride, methylnorbornane-2,3-dicarboxylic anhydride, ceric anhydride, methylic acid anhydride, two a cyclic saturated aliphatic carboxylic anhydride such as cyclo[2,2,2]octane-2,3-dicarboxylic anhydride, 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride, tetrahydroortylene Formic anhydride, methyltetrahydrophthalic anhydride, ceric acid anhydride, methyl benzoic anhydride, 4,5-dimethyl-4-cyclohexene-1,2-dicarboxylic anhydride, bicyclo[2, a cyclic unsaturated aliphatic carboxylic acid anhydride such as 2,2]-5-octene-2,3-dicarboxylic acid anhydride, phthalic anhydride, isophthalic anhydride, terephthalic anhydride, trimellitic anhydride, etc. Aromatic carboxylic anhydride and the like.

分子內具有一個羧酸酐基之化合物(d)可使用一種或混合兩種以上而使用。其中,由於使多元羧酸樹脂(A)與環氧樹脂硬化而成之硬化物之透明性優異,故較佳為六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、四氫鄰苯二甲酸酐、降冰片烷-2,3-二甲酸酐、甲基降冰片烷-2,3-二甲酸酐、1,2,4-環己烷三甲酸-1,2-酐。更佳為甲基六氫鄰苯二甲酸酐、1,2,4-環己烷三甲酸-1,2-酐,尤佳為甲基六氫鄰苯二甲酸酐。 The compound (d) having a carboxylic anhydride group in the molecule may be used singly or in combination of two or more. Among them, since the cured product obtained by curing the polyvalent carboxylic acid resin (A) and the epoxy resin is excellent in transparency, it is preferably hexahydrophthalic anhydride, methylhexahydrophthalic anhydride or tetrahydrogen. Phthalic anhydride, norbornane-2,3-dicarboxylic anhydride, methylnorbornane-2,3-dicarboxylic anhydride, 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride. More preferred is methylhexahydrophthalic anhydride, 1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride, and particularly preferably methylhexahydrophthalic anhydride.

於使用之情形時,相對於分子內具有一個羧酸酐基之化合物(d)100重量份,分子內具有兩個羧酸酐基之化合 物(c)之使用量通常為5~1000重量份,較佳為10~500重量份,進而較佳為15~300重量份。若大於300重量份,則存在多元羧酸樹脂(A)過度高分子量化而加工性劣化之情況。 In the case of use, it has a combination of two carboxylic anhydride groups in the molecule with respect to 100 parts by weight of the compound (d) having one carboxylic anhydride group in the molecule. The amount of the substance (c) to be used is usually 5 to 1000 parts by weight, preferably 10 to 500 parts by weight, more preferably 15 to 300 parts by weight. When it is more than 300 parts by weight, the polyvalent carboxylic acid resin (A) may be excessively polymerized and the workability may be deteriorated.

關於兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有兩個以上羧酸酐基之化合物(c)、分子內具有一個羧酸酐基之化合物(d)之使用量,相對於兩末端甲醇改質之矽油(a)與分子內具有兩個以上羥基之多元醇化合物(i)之總醇性羥基1當量,較佳為分子內具有一個羧酸酐基之化合物(d)與在使用時分子內具有兩個以上羧酸酐基之化合物(c)的總羧酸酐基為0.5~2.0當量,更佳為0.8~1.5當量。若為0.5當量以上,則硬化物之機械強度變得良好,故較佳,若為2.0當量以下,則不會殘存大量羧酸酐基,且保管穩定性變得良好,故較佳。 The eucalyptus oil (a) having two-terminal methanol reforming, the polyol compound (i) having two or more hydroxyl groups in the molecule, the compound (c) having two or more carboxylic anhydride groups in the molecule, and one carboxylic anhydride group in the molecule The compound (d) is used in an amount of 1 equivalent to the total alcoholic hydroxyl group of the oleic oil (a) modified with methanol at both ends and the polyol compound (i) having two or more hydroxyl groups in the molecule, preferably having one in the molecule. The compound (d) of the carboxylic anhydride group and the total carboxylic anhydride group of the compound (c) having two or more carboxylic anhydride groups in the molecule at the time of use are from 0.5 to 2.0 equivalents, more preferably from 0.8 to 1.5 equivalents. When the amount is 0.5 equivalent or more, the mechanical strength of the cured product is good, and when it is 2.0 equivalents or less, a large amount of the carboxylic acid anhydride group does not remain, and storage stability is good, which is preferable.

多元羧酸樹脂(A)之製造可於溶劑中進行,亦可於無溶劑之條件下進行。作為溶劑,只要為不與兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有一個羧酸酐基之化合物(d)、使用時分子內具有兩個以上羧酸酐基之化合物(c)反應之溶劑,則可無特別限制地使用。作為可使用之溶劑,例如可列舉:如二甲基甲醯胺、二甲基乙醯胺、二甲基亞碸、四氫呋喃、乙腈之非質子性極性溶劑(aprotic polar solvent),如甲基乙基酮、環戊酮、甲基異丁基酮之酮類,如甲苯、二甲苯 之芳香族烴等,該等中,較佳為芳香族烴或酮類。該等溶劑可使用一種或混合兩種以上而使用。於使用溶劑之情形時,其使用量相對於兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有一個羧酸酐基之化合物(d)、使用之情形時分子內具有兩個以上羧酸酐基之化合物(c)的合計100重量份,較佳為0.5~300重量份。 The production of the polyvalent carboxylic acid resin (A) can be carried out in a solvent or in the absence of a solvent. The solvent is not limited to the eucalyptus oil (a) which is not modified with methanol at both ends, the polyol compound (i) having two or more hydroxyl groups in the molecule, the compound (d) having one carboxylic anhydride group in the molecule, and the intramolecular use during use. A solvent which reacts with the compound (c) having two or more carboxylic anhydride groups can be used without particular limitation. As a solvent which can be used, for example, an aprotic polar solvent such as dimethylformamide, dimethylacetamide, dimethyl hydrazine, tetrahydrofuran or acetonitrile such as methyl b. Ketones of ketone, cyclopentanone, and methyl isobutyl ketone, such as toluene and xylene Among the aromatic hydrocarbons and the like, among these, aromatic hydrocarbons or ketones are preferred. These solvents may be used alone or in combination of two or more. In the case of using a solvent, the amount of the oleic oil (a) modified with methanol at both ends, the polyol compound (i) having two or more hydroxyl groups in the molecule, and the compound having a carboxylic anhydride group in the molecule (d) In the case of use, the total amount of the compound (c) having two or more carboxylic acid anhydride groups in the molecule is preferably from 0.5 to 300 parts by weight.

多元羧酸樹脂(A)可於無觸媒之情況下製造,亦可於使用觸媒之情況下製造。於使用觸媒之情形時,可使用之觸媒可列舉:鹽酸、硫酸、甲磺酸、三氟甲磺酸、對甲苯磺酸、硝酸、三氟乙酸、三氯乙酸等酸性化合物,氫氧化鈉、氫氧化鉀、氫氧化鈣、氫氧化鎂等金屬氫氧化物,三乙胺、三丙胺、三丁胺等胺化合物,吡啶、二甲胺基吡啶、1,8-二吖雙環[5,4,0]十一烯-7、咪唑、三唑、四唑等雜環式化合物,四甲基氫氧化銨、四乙基氫氧化銨、四丙基氫氧化銨、四丁基氫氧化銨、三甲基乙基氫氧化銨、三甲基丙基氫氧化銨、三甲基丁基氫氧化銨、三甲基十六基氫氧化銨、三辛基甲基氫氧化銨、四甲基氯化銨、四甲基溴化銨、四甲基碘化銨、乙酸四甲基銨、乙酸三辛基甲基銨等4級銨鹽,正鈦酸四乙酯、正鈦酸四甲酯等正鈦酸類,辛酸錫(tin octoate)、辛酸鈷、辛酸鋅、辛酸錳、辛酸鈣、辛酸鈉、辛酸鉀等金屬皂類。 The polyvalent carboxylic acid resin (A) can be produced without a catalyst or can be produced using a catalyst. In the case of using a catalyst, examples of the catalyst that can be used include acidic compounds such as hydrochloric acid, sulfuric acid, methanesulfonic acid, trifluoromethanesulfonic acid, p-toluenesulfonic acid, nitric acid, trifluoroacetic acid, and trichloroacetic acid, and hydrogen peroxide. Metal hydroxides such as sodium, potassium hydroxide, calcium hydroxide, magnesium hydroxide, amine compounds such as triethylamine, tripropylamine, and tributylamine, pyridine, dimethylaminopyridine, 1,8-dioxinbicyclo[5 , 4,0] undecene-7, imidazole, triazole, tetrazole and other heterocyclic compounds, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutyl hydroxide Ammonium, trimethylethylammonium hydroxide, trimethylpropylammonium hydroxide, trimethylbutylammonium hydroxide, trimethylhexadecyl ammonium hydroxide, trioctylmethylammonium hydroxide, tetramethyl 4-grade ammonium salt such as ammonium chloride, tetramethylammonium bromide, tetramethylammonium iodide, tetramethylammonium acetate, trioctylmethylammonium acetate, etc., tetraethyl orthotitanate, tetra-ortho-titanate Metal soaps such as tert-acids such as esters, tin octoate, cobalt octoate, zinc octoate, manganese octoate, calcium octylate, sodium octoate and potassium octylate.

於使用觸媒之情形時,亦可使用一種或混合兩種以上而使用。 In the case of using a catalyst, one type or a mixture of two or more types may be used.

於使用觸媒之情形時,其使用量相對於兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)、分子內具有一個羧酸酐基之化合物(d)、使用之情形時分子內具有兩個以上羧酸酐基之化合物(c)的合計100重量份,較佳為0.05~10重量份。 In the case of using a catalyst, the amount of the oleic oil (a) modified with methanol at both ends, the polyol compound (i) having two or more hydroxyl groups in the molecule, and the compound having a carboxylic anhydride group in the molecule (d) In the case of use, the total amount of the compound (c) having two or more carboxylic anhydride groups in the molecule is preferably 100 parts by weight, preferably 0.05 to 10 parts by weight.

觸媒之添加方法可為直接添加,或以溶解於可溶性溶劑等中之狀態而使用。此時,由於與未反應之分子內具有兩個以上羧酸酐基之化合物(c)或分子內具有一個羧酸酐基之化合物(d)反應,故較佳為避免使用甲醇、乙醇等醇性溶劑或水。 The method of adding the catalyst may be directly added or used in a state of being dissolved in a soluble solvent or the like. In this case, since the compound (c) having two or more carboxylic acid anhydride groups in the unreacted molecule or the compound (d) having one carboxylic acid anhydride group in the molecule is reacted, it is preferred to avoid the use of an alcoholic solvent such as methanol or ethanol. Or water.

製造多元羧酸樹脂(A)時之反應溫度取決於觸媒量、使用溶劑,通常為20~160℃,較佳為50~150℃,尤佳為60~145℃。又,反應時間之總計通常為1~20小時,較佳為3~12小時。反應可以2階段以上進行,例如可於20~100℃下反應1~8小時後,於100~160℃下反應1~12小時等。上述情況可藉由如下方式抑制揮發:尤其是分子內具有一個羧酸酐基之化合物(d)多為揮發性較高者,於使用該揮發性較高者時,預先於20~100℃下反應後,於100~160℃下反應。藉此,不僅可抑制有害物質向大氣中擴散,且可獲得如所需般之多元羧酸樹脂(A)。 The reaction temperature at the time of producing the polyvalent carboxylic acid resin (A) depends on the amount of the catalyst and the solvent to be used, and is usually 20 to 160 ° C, preferably 50 to 150 ° C, and particularly preferably 60 to 145 ° C. Further, the total reaction time is usually from 1 to 20 hours, preferably from 3 to 12 hours. The reaction can be carried out in two or more stages. For example, it can be reacted at 20 to 100 ° C for 1 to 8 hours, and then reacted at 100 to 160 ° C for 1 to 12 hours. In the above case, the volatilization can be suppressed by the following means: in particular, the compound (d) having a carboxylic anhydride group in the molecule is mostly volatile, and when the volatility is higher, the reaction is carried out in advance at 20 to 100 ° C. After that, the reaction was carried out at 100 to 160 °C. Thereby, not only the harmful substance can be suppressed from diffusing into the atmosphere, but also the polyvalent carboxylic acid resin (A) can be obtained as needed.

於使用觸媒進行製造之情形時,可視需要藉由進行驟冷(quench)、及/或水洗而去除觸媒,亦可直接使其殘存而用作本發明之硬化樹脂組成物之硬化促進劑。 In the case of production using a catalyst, the catalyst may be removed by quenching and/or washing as needed, or may be directly used as a hardening accelerator for the cured resin composition of the present invention. .

於進行水洗步驟之情形時,較佳為根據所使用之溶劑 之種類而添加可與水分離之溶劑。作為較佳之溶劑,例如可例示:如甲基乙基酮、甲基異丁基酮、環戊酮之酮類,乙酸乙酯、乙酸丁酯、乳酸乙酯、丁酸異丙酯等酯類,如己烷、環己烷、甲苯、二甲苯之烴類等。 In the case of performing the water washing step, it is preferably according to the solvent used. A solvent which can be separated from water is added in the kind. As preferred solvents, for example, methyl ethyl ketone, methyl isobutyl ketone, ketone of cyclopentanone, ethyl acetate, butyl acetate, ethyl lactate, isopropyl butyrate and the like can be exemplified. For example, hydrocarbons such as hexane, cyclohexane, toluene, and xylene.

於將溶劑用於反應或水洗之情形時,可藉由減壓濃縮等而去除。 When the solvent is used for the reaction or water washing, it can be removed by concentration under reduced pressure or the like.

以上述方式獲得之多元羧酸樹脂(A)通常於25℃下為具有流動性之液狀。又,關於其分子量,作為藉由GPC所測得之重量平均分子量,較佳為800~80000,更佳為1000~10000,尤佳為1500~8000。於重量平均分子量低於800之情形時,存在25℃下之流動性降低之情況,於高於80000之情形時,存在製成使用其之硬化樹脂組成物時,與下述環氧樹脂之相溶性差之情況。 The polycarboxylic acid resin (A) obtained in the above manner is usually a liquid having a fluidity at 25 °C. Further, the molecular weight thereof is preferably from 800 to 80,000, more preferably from 1,000 to 10,000, still more preferably from 1,500 to 8,000, as the weight average molecular weight measured by GPC. When the weight average molecular weight is less than 800, there is a case where the fluidity at 25 ° C is lowered, and when it is higher than 80,000, there is a phase of the epoxy resin which is used in the case of using the cured resin composition. Poor solubility.

重量平均分子量為利用GPC(凝膠滲透層析法)於下述條件下所測得之經聚苯乙烯換算之重量平均分子量(Mw)。 The weight average molecular weight is a polystyrene-equivalent weight average molecular weight (Mw) measured by GPC (gel permeation chromatography) under the following conditions.

GPC之各種條件 Various conditions of GPC

製造商:島津製作所 Manufacturer: Shimadzu Manufacturing Co., Ltd.

管柱:保護管柱SHODEX GPC LF-G LF-804(3根) Pipe column: protection column SHODEX GPC LF-G LF-804 (3 roots)

流速:1.0 ml/min Flow rate: 1.0 ml/min

管柱溫度:40℃ Column temperature: 40 ° C

使用溶劑:THF(四氫呋喃) Solvent: THF (tetrahydrofuran)

檢測器:RI(示差折射率檢測器) Detector: RI (differential refractive index detector)

所製造之多元羧酸樹脂(A)之酸值(利用JIS K-2501 所記載之方法而測得)較佳為35~200 mgKOH/g,更佳為50~180 mgKOH/g,尤佳為60~150 mgKOH/g。於官能基當量低於35 mgKOH/g之情形時,有硬化物之機械特性惡化之傾向,於高於150 mgKOH/g之情形時,有該硬化物過硬、彈性模數過高之傾向。 Acid value of the produced polycarboxylic acid resin (A) (using JIS K-2501 The measured method is preferably from 35 to 200 mgKOH/g, more preferably from 50 to 180 mgKOH/g, still more preferably from 60 to 150 mgKOH/g. When the functional group equivalent is less than 35 mgKOH/g, the mechanical properties of the cured product tend to deteriorate, and when it exceeds 150 mgKOH/g, the cured product tends to be too hard and the modulus of elasticity is too high.

多元羧酸樹脂(A)之黏度(E型黏度計,於25℃下測定)較佳為50~800,000 mPa‧s,更佳為500~100,000 mPa‧s,尤佳為800~30,000 mPa‧s。於黏度低於50 mPa‧s之情形時,存在黏度過低而不適於光半導體密封材料用途之情況,於高於800,000 mPa‧s之情形時,存在黏度過高而加工性較差之情況。 The viscosity of the polycarboxylic acid resin (A) (E-type viscometer, measured at 25 ° C) is preferably from 50 to 800,000 mPa ‧ , more preferably from 500 to 100,000 mPa ‧ , and particularly preferably from 800 to 30,000 mPa ‧ s . When the viscosity is lower than 50 mPa‧s, there is a case where the viscosity is too low and it is not suitable for the use of the optical semiconductor sealing material. When the viscosity is higher than 800,000 mPa·s, there is a case where the viscosity is too high and the workability is poor.

於本發明之硬化樹脂組成物中,亦可分別併用兩種以上之酸酐、多元羧酸及多元羧酸樹脂(A)。尤其是於在光半導體之密封等要求於室溫(25℃)下為液狀之用途中使用固體之多元羧酸之情形時,較理想為併用液狀之酸酐及/或多元羧酸樹脂(A)並作為液狀混合物而使用。於併用時,酸酐及/或多元羧酸樹脂(A)能以環氧樹脂硬化劑合計之0.5~99.5重量%之比率使用。 In the cured resin composition of the present invention, two or more kinds of acid anhydrides, polycarboxylic acids, and polycarboxylic acid resins (A) may be used in combination. In particular, when a solid polycarboxylic acid is used in a liquid semiconductor or the like which is required to be liquid at room temperature (25 ° C), it is preferred to use a liquid acid anhydride and/or a polycarboxylic acid resin in combination ( A) and used as a liquid mixture. When used in combination, the acid anhydride and/or polycarboxylic acid resin (A) can be used in a ratio of from 0.5 to 99.5% by weight based on the total of the epoxy resin hardener.

於作為環氧樹脂硬化劑而併用除上述酸酐及/或多元羧酸及/或多元羧酸樹脂(A)以外之硬化劑時,酸酐及/或多元羧酸及/或多元羧酸樹脂(A)之總量於全部硬化劑中所占之比率較佳為30重量%以上,尤佳為40重量%以上。 An acid anhydride and/or a polycarboxylic acid and/or a polycarboxylic acid resin (A) when used as an epoxy resin hardener in combination with a curing agent other than the above-mentioned acid anhydride and/or polycarboxylic acid and/or polycarboxylic acid resin (A) The ratio of the total amount to the total amount of the hardener is preferably 30% by weight or more, and particularly preferably 40% by weight or more.

作為可併用之硬化劑,例如可列舉胺系化合物、醯胺系化合物、酚系化合物等。作為可使用之硬化劑之具體例, 可列舉:胺類或聚醯胺化合物(由二胺基二苯甲烷(diaminodiphenylmethane)、二伸乙基三胺、三伸乙基四胺、二胺基二苯基碸(diaminodiphenylsulfone)、異佛爾酮二胺(isophoronediamine)、二氰二胺、次亞麻油酸之二聚物與乙二胺所合成之聚醯胺樹脂等),多酚類(雙酚A、雙酚F、雙酚S、茀雙酚、萜二酚、4,4'-聯苯酚、2,2'-聯苯酚、3,3',5,5'-四甲基-[1,1'-聯苯]-4,4'-二酚(3,3',5,5'-tetramethyl-[1,1'-biphenyl]-4,4'-diol)、對苯二酚、間苯二酚、萘二酚(naphthalenediol)、三-(4-羥基苯基)甲烷、1,1,2,2-四(4-羥基苯基)乙烷)、苯酚類(苯酚、經烷基取代之苯酚、萘酚、經烷基取代之萘酚、二羥基苯、二羥基萘等)與甲醛、乙醛、苯甲醛、對羥基苯甲醛、鄰羥基苯甲醛、對羥基苯乙酮、鄰羥基苯乙酮、二環戊二烯、糠醛、4,4'-雙(氯甲基)-1,1'-聯苯、4,4'-雙(甲氧基甲基)-1,1'-聯苯、1,4'-雙(氯甲基)苯、1,4'-雙(甲氧基甲基)苯等之聚縮合物及該等之改質物,四溴雙酚A等鹵化雙酚類,萜烯與酚類之縮合物,其他(咪唑、三氟化硼-胺錯合物、胍衍生物等)等,但並不限定於該等,該等可單獨使用,亦可使用兩種以上。 Examples of the curing agent that can be used together include an amine compound, a guanamine compound, and a phenol compound. As a specific example of a hardener that can be used, Mention may be made of amines or polyamine compounds (diaminodiphenylmethane, diethylidene triamine, triethylidene tetramine, diaminodiphenylsulfone, isophor a polyphenol (bisphenol A, bisphenol F, bisphenol S, etc.) of ketone diamine (isophoronediamine), dicyandiamide, dilinoleic acid dimer and ethylenediamine. Bisphenol, stilbene, 4,4'-biphenol, 2,2'-biphenol, 3,3',5,5'-tetramethyl-[1,1'-biphenyl]-4, 4'-diphenol (3,3',5,5'-tetramethyl-[1,1'-biphenyl]-4,4'-diol), hydroquinone, resorcinol, naphthalenediol ), tris-(4-hydroxyphenyl)methane, 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, phenols (phenol, alkyl-substituted phenol, naphthol, transalkane) Substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.) with formaldehyde, acetaldehyde, benzaldehyde, p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, p-hydroxyacetophenone, o-hydroxyacetophenone, dicyclopentane Alkene, furfural, 4,4'-bis(chloromethyl)-1,1'-biphenyl, 4,4'-bis(methoxymethyl)-1,1'-biphenyl, 1,4' - bis(chloromethyl)benzene, 1,4'-bis (methoxy a polycondensate of benzyl or the like, and the like, a halogenated bisphenol such as tetrabromobisphenol A, a condensate of a terpene and a phenol, and the like (imidazole, boron trifluoride-amine complex) However, it is not limited to these, and these may be used alone or in combination of two or more.

以下,對本發明之光半導體密封用硬化樹脂組成物中所含之環氧樹脂進行說明。作為上述環氧樹脂,例如可列舉:作為酚化合物之縮水甘油基醚化物之環氧樹脂、作為各種酚醛清漆樹脂之縮水甘油基醚化物之環氧樹脂、脂環式環氧樹脂、脂肪族系環氧樹脂、雜環式環氧樹脂、縮水 甘油酯系環氧樹脂、縮水甘油基胺系環氧樹脂、使鹵化酚類縮水甘油化而成之環氧樹脂、具有環氧基之矽化物與除此以外之矽化物之縮合物、具有環氧基之聚合性不飽和化合物與除此以外之其他聚合性不飽和化合物之共聚物等。其中,就硬化物之透明性、耐熱透明性之觀點而言,較佳為具有環氧基之矽化物與除此以外之矽化物之縮合物之一態樣、即聚矽氧骨架環氧樹脂(B)。 Hereinafter, the epoxy resin contained in the cured resin composition for optical semiconductor sealing of the present invention will be described. Examples of the epoxy resin include an epoxy resin which is a glycidyl ether compound of a phenol compound, an epoxy resin which is a glycidyl etherate of various novolak resins, an alicyclic epoxy resin, and an aliphatic system. Epoxy resin, heterocyclic epoxy resin, shrinkage a glyceride-based epoxy resin, a glycidylamine-based epoxy resin, an epoxy resin obtained by glycidylating a halogenated phenol, a condensate having an epoxy group and a condensate of a hydrazine compound, and a ring A copolymer of a polymerizable unsaturated compound of an oxy group and a polymerizable unsaturated compound other than the above. Among them, from the viewpoint of the transparency of the cured product and the heat-resistant transparency, it is preferably one of the condensate of the epoxy group and the condensate of the other, that is, the polyoxyl skeleton epoxy resin. (B).

以下,對聚矽氧骨架環氧樹脂(B)進行說明。 Hereinafter, the polyfluorene skeleton epoxy resin (B) will be described.

本發明之聚矽氧骨架環氧樹脂(B)為具有以矽氧鍵(Si-O鍵)為主骨架之環氧基之樹脂,例如可藉由使含環氧基之矽化物與除此以外之矽化物聚合而獲得,可列舉具有環氧基之烷氧基矽烷化合物與具有甲基或苯基之烷氧基矽烷的水解縮聚物、或具有環氧基之烷氧基矽烷化合物與矽烷醇基末端矽油的縮聚物等。又,亦可例示具有氫矽基(SiH基)之矽氧樹脂與具有乙烯基等不飽和烴基之環氧化合物的加成聚合物等。 The polyfluorene skeleton epoxy resin (B) of the present invention is a resin having an epoxy group having a oxime bond (Si-O bond) as a main skeleton, and can be obtained, for example, by using an epoxy group-containing oxime compound. Further, obtained by polymerization of a hydrazine compound, a hydrolyzed polycondensate of an alkoxy decane compound having an epoxy group and an alkoxy decane having a methyl group or a phenyl group, or an alkoxy decane compound having an epoxy group and decane may be mentioned. a polycondensate of an alcohol-based terminal eucalyptus oil or the like. Further, an addition polymer of an anthracene resin having a hydroquinone group (SiH group) and an epoxy compound having an unsaturated hydrocarbon group such as a vinyl group or the like can also be exemplified.

關於本發明中之聚矽氧骨架環氧樹脂(B),其中,最佳為以矽烷醇基末端矽油(e)與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))作為原料,經由下述2階段之製造步驟而獲得之聚矽氧骨架環氧樹脂。 With regard to the polyfluorene skeleton epoxy resin (B) in the present invention, among them, a decyl alcohol-terminated eucalyptus oil (e) and an epoxy group-containing hydrazine compound (f) (and an alkoxylate as necessary) are preferred. (g) A polyfluorene skeleton epoxy resin obtained as a raw material through the following two-stage production step.

以下,對矽烷醇基末端矽油(e)、含環氧基之矽化物(f)、烷氧矽化物(g)進行說明。 Hereinafter, the stanol-based terminal eucalyptus oil (e), the epoxy group-containing hydrazine compound (f), and the alkoxy sulfonium compound (g) will be described.

首先,對矽烷醇基末端矽油(e)進行說明。 First, the stanol-based terminal eucalyptus oil (e) will be described.

矽烷醇基末端矽油(e)為下述式(3)所示之兩末端具 有矽烷醇基之矽氧樹脂。 The stanol-based terminal eucalyptus oil (e) is a terminal having the following formula (3) A decyl alcohol-based oxime resin.

式(3)中,R5表示甲基等碳數1~3之烷基或苯基。複數存在之R5可相同亦可不同,就與其他樹脂之相溶性、高折射率、耐硫化性提高之觀點而言,較佳為含有苯基。 In the formula (3), R 5 represents an alkyl group having 1 to 3 carbon atoms such as a methyl group or a phenyl group. R 5 which is present in plural may be the same or different, and it is preferable to contain a phenyl group from the viewpoint of compatibility with other resins, high refractive index, and sulfurization resistance.

就聚矽氧骨架環氧樹脂(B)之黏度調整之觀點而言,較佳為含有甲基。 From the viewpoint of viscosity adjustment of the polyoxymethylene skeleton epoxy resin (B), it is preferred to contain a methyl group.

所含之苯基之比率相對於取代甲基1莫耳,較佳為0.05~2.0莫耳,更佳為0.1~1.0莫耳,進而較佳為0.15~0.3莫耳,尤佳為0.15~0.2莫耳。若低於0.05莫耳,則存在不僅與組成物中之其他原料的相溶性較差,而且硬化物之折射率較低、LED之光提取效率惡化、或耐硫化性較差之情況,若高於2.0莫耳,則存在硬化物之耐光性(耐UV性)較差、或熱循環耐性較差之情況。 The ratio of the phenyl group contained is preferably 0.05 to 2.0 moles, more preferably 0.1 to 1.0 moles, still more preferably 0.15 to 0.3 moles, and even more preferably 0.15 to 0.2, based on the substituted methyl group 1 mole. Moor. If it is less than 0.05 mol, there is a case where the compatibility with other raw materials in the composition is poor, the refractive index of the cured product is low, the light extraction efficiency of the LED is deteriorated, or the sulfurization resistance is poor, and if it is higher than 2.0, In the case of Mohr, there is a case where the light resistance (UV resistance) of the cured product is poor or the thermal cycle resistance is poor.

式(3)中,p為平均值且表示3~200,較佳為3~100,更佳為3~50。若p小於3,則存在硬化物過硬、熱循環耐性降低之情況。若p大於200,則存在硬化物之機械強度降低之情況。 In the formula (3), p is an average value and represents 3 to 200, preferably 3 to 100, more preferably 3 to 50. When p is less than 3, the cured product is too hard and the thermal cycle resistance is lowered. If p is more than 200, there is a case where the mechanical strength of the cured product is lowered.

矽烷醇基末端矽油(e)之重量平均分子量(Mw)較佳 為400~3000(GPC)之範圍者。於重量平均分子量低於400之情形時,有難以表現矽氧部分之特性,且耐熱性、耐光性較差之虞,若超過3000,則存在因具有較明顯之層分離結構而於用於光半導體元件密封時透過性降低之情況。 The weight average molecular weight (Mw) of the stanol-based terminal eucalyptus (e) is preferably It is in the range of 400~3000 (GPC). When the weight average molecular weight is less than 400, it is difficult to express the characteristics of the oxygen-containing portion, and the heat resistance and the light resistance are poor. If it exceeds 3,000, it is used for the optical semiconductor because of the relatively clear layer separation structure. The permeability is reduced when the component is sealed.

於本發明中,作為矽烷醇基末端矽油(e)之分子量,係指基於利用GPC(凝膠滲透層析法)於下述條件下所測得之值,經聚苯乙烯換算而算出之重量平均分子量(Mw)。 In the present invention, the molecular weight of the stanol-based terminal eucalyptus oil (e) is a weight calculated based on a value measured by GPC (gel permeation chromatography) under the following conditions. Average molecular weight (Mw).

GPC之各種條件 Various conditions of GPC

製造商:島津製作所 Manufacturer: Shimadzu Manufacturing Co., Ltd.

管柱:保護管柱SHODEX GPC LF-G LF-804(3根) Pipe column: protection column SHODEX GPC LF-G LF-804 (3 roots)

流速:1.0 ml/min Flow rate: 1.0 ml/min

管柱溫度:40℃ Column temperature: 40 ° C

使用溶劑:THF(四氫呋喃) Solvent: THF (tetrahydrofuran)

檢測器:RI(示差折射率檢測器) Detector: RI (differential refractive index detector)

矽烷醇基末端矽油(e)例如可藉由使如下物質水解、縮合來製造:二甲基二烷氧矽烷、甲苯基二氯矽烷、二苯基烷氧矽烷、二甲基二氯矽烷、甲苯基二氯矽烷、二苯基二氯矽烷。 The stanol-based terminal eucalyptus oil (e) can be produced, for example, by hydrolyzing and condensing: dimethyldioxane, tolyldichlorodecane, diphenylalkane, dimethyldichlorodecane, toluene Dichlorodecane, diphenyl dichlorodecane.

作為矽烷醇基末端矽油(e)之較佳之具體例,可列舉以下之製品名。例如可列舉:Toray Dow Corning公司製造之PRX413、BY16-873,信越化學工業公司製造之X-21-5841、KF-9701,Momentive公司製造之XC96-723、TSR160、YR3370、YF3800、XF3905、YF3057、YF3807、YF3802、YF3897、YF3804、XF3905,Gelest公司製造之 DMS-S12、DMS-S14、DMS-S15、DMS-S21、DMS-S27、DMS-S31、DMS-S32、DMS-S33、DMS-S35、DMS-S42、DMS-S45、DMS-S51、PDS-0332、PDS-1615、PDS-9931等。上述中,就分子量、動黏度之觀點而言,較佳為PRX413、BY16-873、X-21-5841、KF-9701、XC96-723、YF3800、YF3804、DMS-S12、DMS-S14、DMS-S15、DMS-S21、PDS-1615。該等中,就分子量之觀點而言,尤佳為X-21-5841、XC96-723、YF3800、YF3804、DMS-S14、PDS-1615。該等矽烷醇基末端矽油(e)可單獨使用,亦可併用兩種以上。 Preferred examples of the stanol-based terminal eucalyptus oil (e) include the following product names. For example, PRX413 and BY16-873 manufactured by Toray Dow Corning, X-21-5841 and KF-9701 manufactured by Shin-Etsu Chemical Co., Ltd., XC96-723, TSR160, YR3370, YF3800, XF3905, and YF3057 manufactured by Momentive Co., Ltd. YF3807, YF3802, YF3897, YF3804, XF3905, manufactured by Gelest DMS-S12, DMS-S14, DMS-S15, DMS-S21, DMS-S27, DMS-S31, DMS-S32, DMS-S33, DMS-S35, DMS-S42, DMS-S45, DMS-S51, PDS- 0332, PDS-1615, PDS-9931, etc. Among the above, from the viewpoints of molecular weight and dynamic viscosity, it is preferably PRX413, BY16-873, X-21-5841, KF-9701, XC96-723, YF3800, YF3804, DMS-S12, DMS-S14, DMS-. S15, DMS-S21, PDS-1615. Among these, from the viewpoint of molecular weight, X-21-5841, XC96-723, YF3800, YF3804, DMS-S14, and PDS-1615 are particularly preferable. These stanol-based terminal eucalyptus oils (e) may be used singly or in combination of two or more.

繼而,對含環氧基之矽化物(f)進行說明。 Next, the epoxy group-containing telluride (f) will be described.

本發明中之含環氧基之矽化物(f)為式(4)所表示之烷氧矽化物。 The epoxy group-containing telluride (f) in the present invention is an alkoxyhalide compound represented by the formula (4).

XSi(RXSi(R 66 )) qq (OR(OR 77 )) rr (4)   (4)

式(4)中,X只要為具有環氧基之有機基,則並無特別限制。 In the formula (4), X is not particularly limited as long as it is an organic group having an epoxy group.

例如可列舉:β-縮水甘油氧基乙基(β-glycidoxy ethyl)、γ-縮水甘油氧基丙基、γ-縮水甘油氧基丁基等經縮水甘油氧基取代之碳數1~4之烷基,縮水甘油基、β-(3,4-環氧基環己基)乙基、γ-(3,4-環氧基環己基)丙基、β-(3,4-環氧環庚基)乙基、4-(3,4-環氧基環己基)丁基、5-(3,4-環氧基環己基)戊基等經具有環氧乙烷基之碳數 5~8之環烷基取代的碳數1~5之烷基。該等中,作為經縮水甘油氧基取代之碳數1~3之烷基、經具有環氧基之碳數5~8之環烷基取代之碳數1~3之烷基,例如較佳為β-縮水甘油氧基乙基、γ-縮水甘油氧基丙基、β-(3,4-環氧基環己基)乙基,尤其是就可抑制著色之方面而言,較佳為β-(3,4-環氧基環己基)乙基。 For example, β-glycidoxy ethyl, γ-glycidoxypropyl, γ-glycidoxybutyl, and the like have a carbon number of 1 to 4 substituted by a glycidoxy group. Alkyl, glycidyl, β-(3,4-epoxycyclohexyl)ethyl, γ-(3,4-epoxycyclohexyl)propyl, β-(3,4-epoxycycloheptane Ethyl group, 4-(3,4-epoxycyclohexyl)butyl, 5-(3,4-epoxycyclohexyl)pentyl, etc. A cycloalkyl group of 5 to 8 is substituted with an alkyl group having 1 to 5 carbon atoms. In the above, an alkyl group having 1 to 3 carbon atoms substituted with a glycidyloxy group and an alkyl group having 1 to 3 carbon atoms substituted by a cycloalkyl group having 5 to 8 carbon atoms having an epoxy group is preferably used. It is β-glycidoxyethyl, γ-glycidoxypropyl, β-(3,4-epoxycyclohexyl)ethyl, and especially in terms of coloring inhibition, preferably β -(3,4-Epoxycyclohexyl)ethyl.

式(4)中,R6表示碳數1~10之直鏈狀、分支狀、環狀之烷基或碳數6~10之芳香族烴基。例如可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、正己基、環戊基、環己基、苯基、萘基等。該等R6中,就相溶性、硬化物之耐熱透明性之觀點而言,較佳為甲基、苯基。 In the formula (4), R 6 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms. For example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, n-hexyl, cyclopentyl, cyclohexyl, phenyl, naphthyl Wait. Among these R 6 , a methyl group or a phenyl group is preferred from the viewpoint of compatibility and heat-resistant transparency of the cured product.

式(4)中之R7表示碳數1~10之直鏈狀、分支狀或環狀之烷基。例如可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、正己基、環戊基、環己基等。該等R7中,就相溶性、反應性等反應條件之觀點而言,較佳為甲基或乙基,尤佳為甲基。 R 7 in the formula (4) represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms. For example, a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a n-pentyl group, a n-hexyl group, a cyclopentyl group, a cyclohexyl group, etc. are mentioned. Among these R 7 , a methyl group or an ethyl group is preferred from the viewpoint of reaction conditions such as compatibility and reactivity, and a methyl group is particularly preferable.

式(4)中之q為整數且表示0、1、2,r表示(3-q)。就聚矽氧骨架環氧樹脂(B)之黏度、硬化物之機械強度之觀點而言,q較佳為0或1。 q in the formula (4) is an integer and represents 0, 1, 2, and r represents (3-q). q is preferably 0 or 1 from the viewpoint of the viscosity of the polyoxymethylene skeleton epoxy resin (B) and the mechanical strength of the cured product.

作為含環氧基之矽化物(f)之較佳之具體例,可列舉:β-縮水甘油氧基乙基三甲氧基矽烷(β-glycidoxy ethyltrimethoxysilane)、β-縮水甘油氧基乙基三乙氧基矽烷、γ-縮水甘油氧基丙基三甲氧基矽烷、γ-縮水甘油氧基 丙基三乙氧基矽烷、γ-縮水甘油氧基丙基甲基二甲氧基矽烷、γ-縮水甘油氧基丙基苯基二甲氧基矽烷、γ-縮水甘油氧基丙基環己基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、2-(3,4-環氧基環己基)乙基三乙氧基矽烷、2-(3,4-環氧基環己基)乙基甲基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基苯基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基環己基二甲氧基矽烷等,尤佳為2-(3,4-環氧基環己基)乙基三甲氧基矽烷。該等含環氧基之矽化物(f)可單獨使用或使用兩種以上,亦可與以下所示之烷氧矽化物(g)併用。 Preferred examples of the epoxy group-containing telluride (f) include β-glycidoxy ethyltrimethoxysilane and β-glycidoxyethyltriethoxysilane. Baseline, γ-glycidoxypropyltrimethoxydecane, γ-glycidyloxy Propyltriethoxydecane, γ-glycidoxypropylmethyldimethoxydecane, γ-glycidoxypropylphenyldimethoxydecane, γ-glycidoxypropylcyclohexyl Dimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltriethoxydecane, 2-( 3,4-Epoxycyclohexyl)ethylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethylphenyldimethoxydecane, 2-(3,4- Ethoxycyclohexyl)ethylcyclohexyldimethoxydecane, etc., more preferably 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane. These epoxy group-containing tellurides (f) may be used singly or in combination of two or more kinds, and may be used in combination with the alkoxy sulfonate (g) shown below.

於聚矽氧骨架環氧樹脂(B)中,可與含環氧基之矽化物(f)一起併用下述式(5)所示之烷氧矽化物(g)。藉由併用烷氧矽化物(g),可調整聚矽氧骨架環氧樹脂之黏度、折射率等。 In the polyoxymethylene skeleton epoxy resin (B), an alkoxy ruthenium compound (g) represented by the following formula (5) can be used together with the epoxy group-containing telluride (f). The viscosity, refractive index, and the like of the polyfluorene skeleton epoxy resin can be adjusted by using the alkoxylate (g) in combination.

Si(RSi(R 66 )) ss (OR(OR 77 )) tt (5)   (5)

式(5)中之R6、R7表示與上述者相同之內容,s為整數且表示0、1、2、3,t表示(4-s)。 R 6 and R 7 in the formula (5) represent the same contents as the above, and s is an integer and represents 0, 1, 2, and 3, and t represents (4-s).

作為可併用之烷氧矽化物(g)之較佳之具體例,可列舉甲基三甲氧基矽烷、苯基三甲氧基矽烷、環己基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三乙氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷等。上述中,較佳為甲基三甲氧基矽烷、苯基三甲氧基矽烷、二甲基二甲氧基矽烷、二苯 基二甲氧基矽烷。 Preferable specific examples of the alkoxyhalide compound (g) which can be used together include methyltrimethoxydecane, phenyltrimethoxydecane, cyclohexyltrimethoxydecane, methyltriethoxydecane, and phenyl. Triethoxy decane, dimethyl dimethoxy decane, dimethyl diethoxy decane, diphenyl dimethoxy decane, diphenyl diethoxy decane, and the like. Among the above, preferred are methyltrimethoxydecane, phenyltrimethoxydecane, dimethyldimethoxydecane, and diphenyl. Dimethoxy decane.

於本發明中,就折射率上升、耐硫化性降低之觀點而言,較佳為所使用之矽烷醇基末端矽油(e)與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))中之至少任一種使用具有芳香族骨架之化合物,尤佳為使用具有苯基之化合物。尤其是矽烷醇基末端矽油(e)較佳為具有苯基。其原因在於,藉由使用導入有苯基之矽烷醇基末端矽油(e),可抑制聚矽氧骨架環氧樹脂(B)之過度之黏度上升,另一方面,若使用附有苯基之含環氧基之矽化物(f)(及視需要之烷氧矽化物(g)),則存在黏度上升變大、加工性較差之情況。 In the present invention, from the viewpoint of an increase in refractive index and a decrease in sulfidation resistance, a decyl alcohol-terminated eucalyptus oil (e) and an epoxy group-containing hydrazine compound (f) (and an optional alkane) are preferably used. At least one of the oxonides (g)) uses a compound having an aromatic skeleton, and it is particularly preferred to use a compound having a phenyl group. In particular, the stanol-based terminal eucalyptus oil (e) preferably has a phenyl group. The reason for this is that the excessive viscosity increase of the polyfluorene skeleton epoxy resin (B) can be suppressed by using the decyl alcohol-based terminal eucalyptus oil (e) introduced with a phenyl group, and on the other hand, if a phenyl group is used The epoxy group-containing telluride (f) (and, if necessary, the alkoxylate (g)) may have a large increase in viscosity and poor workability.

於聚矽氧骨架環氧樹脂(B)之製造中,若相對於矽烷醇基末端矽油(e)之矽烷醇基1當量,以小於1.5當量之量來使含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之烷氧基反應,則含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))中之兩個以上烷氧基於末端與矽烷醇基末端矽油(e)之矽烷醇基會反應,而於下述製造步驟1結束時過度高分子化而引起膠化。因此,必需相對於矽烷醇基1當量,以1.5當量以上之量來使烷氧基反應。就控制反應之觀點而言,較佳為2.0當量以上。 In the production of the polyoxyl skeleton epoxy resin (B), the epoxy group-containing telluride (f) is used in an amount of less than 1.5 equivalents per equivalent of the stanol group of the decyl alcohol end oxime (e). And (or optionally alkoxylate (g)) alkoxy group, then two or more of the epoxy group-containing telluride (f) (and optionally alkoxylate (g)) The oxy group reacts with the stanol group at the terminal end of the decyl alcohol-terminated eucalyptus oil (e), and is excessively polymerized at the end of the production step 1 described below to cause gelation. Therefore, it is necessary to react an alkoxy group in an amount of 1.5 equivalent or more with respect to 1 equivalent of the stanol group. From the viewpoint of controlling the reaction, it is preferably 2.0 equivalent or more.

繼而,對製造步驟1、2進行說明。 Next, the manufacturing steps 1 and 2 will be described.

(製造步驟1) (manufacturing step 1)

使矽烷醇基末端矽油(e)之矽烷醇基、與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之烷氧基縮合 而獲得改質矽油(h)之步驟。 Condensation of a decyl alcohol group of a decyl alcohol end oxime oil (e) with an alkoxy group of an epoxy group-containing oxime compound (f) (and optionally an alkoxylate (g)) And the step of obtaining the modified oyster sauce (h).

(製造步驟2) (manufacturing step 2)

於製造步驟1後,添加水而進行殘存之烷氧基的水解縮合之步驟。 After the production step 1, a step of hydrolyzing and condensing the remaining alkoxy group is carried out by adding water.

本發明之特徵在於:經由上述製造步驟1、2而進行改質矽油(h)與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之聚合。 The present invention is characterized in that the polymerization of the modified emu oil (h) and the epoxy group-containing telluride (f) (and optionally the alkoxylate (g)) is carried out via the above-mentioned production steps 1 and 2.

藉由將製造步驟分為兩個階段,可於使矽烷醇基末端矽油(e)之矽烷醇基、與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之烷氧基確實地反應而獲得改質矽油(h)後,進行殘存之烷氧基的脫醇水解縮合而獲得均勻之穩定製品。 By dividing the manufacturing step into two stages, the stanol group of the decyl alcohol end eucalyptus oil (e) and the oxo group containing the epoxy group (f) (and optionally the alkoxylate (g)) After the alkoxy group is reacted to obtain the modified eucalyptus oil (h), the residual alkoxy group is subjected to dealcoholization condensation to obtain a uniform stable product.

若將製造步驟設為一個階段,自製造之起始時添加水,則矽烷醇基與烷氧基之縮合反應、及烷氧基矽烷彼此之聚合反應會成為競爭反應,因相互之反應速度差、產物的相溶性之差而導致獲得不均之化合物,或因殘存大量不具有環氧基之矽烷醇基末端矽油(e)而對製品造成不良影響。 If the manufacturing step is set to one stage and water is added at the beginning of the production, the condensation reaction of the stanol group with the alkoxy group and the polymerization reaction of the alkoxydecane with each other may become a competitive reaction due to the mutual reaction rate. The difference in the compatibility of the product results in the acquisition of a heterogeneous compound, or the adverse effect on the product due to the residual large amount of stanol-based terminal eucalyptus oil (e) having no epoxy group.

製造步驟1較佳為於存在溶劑之情況下反應,就控制反應之觀點而言,溶劑中尤佳為醇。作為可使用之醇,可列舉碳數1~10之醇,具體而言,可列舉:甲醇、乙醇、丙醇、異丙醇、丁醇、第三丁醇、己醇、辛醇、壬醇、癸醇、環己醇、環戊醇等。本發明中,較佳為一級醇、二級醇,尤佳為使用一級醇、或混合一級醇與二級醇而使用。 作為一級醇之例,可列舉甲醇、乙醇、丙醇、丁醇、己醇、辛醇、壬醇、癸醇、丙二醇等,又,作為二級醇之例,可列舉異丙醇、環己醇、丙二醇等。又,就後續之去除性能之問題而言,較佳為甲醇、乙醇、丙醇、異丙醇、丁醇、第三丁醇等碳數1~4之低分子量醇。該等醇可混合使用,於混合之情形時,較佳為選自一級醇、二級醇中之兩種以上,就下述觸媒之溶解性優異之方面而言,較佳為至少1種成分中含有一級醇。較佳之一級醇之量為全部醇量之5重量%以上,更佳為10重量%以上。 The production step 1 is preferably carried out in the presence of a solvent, and in terms of controlling the reaction, an alcohol is particularly preferred in the solvent. Examples of the alcohol which can be used include alcohols having 1 to 10 carbon atoms, and specific examples thereof include methanol, ethanol, propanol, isopropanol, butanol, tert-butanol, hexanol, octanol, and decyl alcohol. , decyl alcohol, cyclohexanol, cyclopentanol and the like. In the present invention, a primary alcohol or a secondary alcohol is preferred, and it is particularly preferred to use a primary alcohol or a primary alcohol and a secondary alcohol. Examples of the primary alcohol include methanol, ethanol, propanol, butanol, hexanol, octanol, decyl alcohol, decyl alcohol, and propylene glycol. Further, as an example of the secondary alcohol, isopropyl alcohol or cyclohexane may be mentioned. Alcohol, propylene glycol, and the like. Further, in view of the subsequent removal performance, a low molecular weight alcohol having 1 to 4 carbon atoms such as methanol, ethanol, propanol, isopropanol, butanol or t-butanol is preferred. These alcohols may be used in combination, and when they are mixed, they are preferably two or more selected from the group consisting of primary alcohols and secondary alcohols, and at least one kind is preferable in terms of excellent solubility of the following catalysts. The composition contains a primary alcohol. The amount of the preferred primary alcohol is 5% by weight or more, more preferably 10% by weight or more based on the total amount of the alcohol.

於本反應併用二級醇,藉此製造步驟1之反應系每單位時間的重量平均分子量之變化量小於僅使用一級醇之情形,因此反應之控制更加容易。通常,於工業生產等大規模之反應時,反應時間、反應溫度之嚴格控制變得困難,因此就控制反應之觀點而言,二級醇之併用尤其是於工業生產等大規模反應時有用。 In the present reaction, a secondary alcohol is used, whereby the amount of change in the weight average molecular weight per unit time of the reaction system of the production step 1 is smaller than that in which only the primary alcohol is used, so that the control of the reaction is easier. In general, in the case of large-scale reaction such as industrial production, strict control of reaction time and reaction temperature becomes difficult, and therefore, in terms of controlling the reaction, the combination of secondary alcohols is useful for large-scale reactions such as industrial production.

於製造步驟1中,醇之使用量相對於矽烷醇基末端矽油(e)與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之總重量,較佳為含有2重量%以上。更佳為2~100重量%,進而較佳為3~50重量%,尤佳為4~40重量%。 In the production step 1, the amount of the alcohol used is preferably based on the total weight of the decyl alcohol-terminated oxime (e) and the epoxy group-containing oxime (f) (and optionally the alkoxylate (g)). It is contained in an amount of 2% by weight or more. More preferably, it is 2 to 100% by weight, further preferably 3 to 50% by weight, and particularly preferably 4 to 40% by weight.

若超過100重量%,則反應之進行極度變慢,於未達2重量%之情形時,存在進行除目標反應以外之反應,引起高分子量化,產生膠化、黏度之上升、硬化物之彈性模數之增加之情況。 When the amount is more than 100% by weight, the progress of the reaction is extremely slow. When the amount is less than 2% by weight, the reaction other than the target reaction is carried out to cause a high molecular weight, which causes gelation, an increase in viscosity, and elasticity of the cured product. The increase in modulus.

於本反應中,亦可視需要併用其他溶劑。 In the present reaction, other solvents may be used in combination as needed.

作為可併用之溶劑,例如可例示:如甲基乙基酮、甲基異丁基酮、環戊酮之酮類,乙酸乙酯、乙酸丁酯、乳酸乙酯、丁酸異丙酯等酯類,如己烷、環己烷、甲苯、二甲苯之烴類等。 As a solvent which can be used together, for example, esters such as methyl ethyl ketone, methyl isobutyl ketone, and cyclopentanone, ethyl acetate, butyl acetate, ethyl lactate, and isopropyl butyrate can be exemplified. Classes, such as hydrocarbons of hexane, cyclohexane, toluene, xylene, and the like.

製造步驟1中之反應亦可於無觸媒之情況下進行,但若無觸媒,則反應進行較慢,因此就縮短反應時間之觀點而言,較佳為於存在觸媒之情況下進行。作為可使用之觸媒,只要為顯示酸性或鹼性之化合物,則可使用。作為酸性觸媒之例,可列舉:鹽酸、硫酸、硝酸等無機酸,或甲酸、乙酸、草酸等有機酸。又,作為鹼性觸媒之例,可使用:如氫氧化鈉、氫氧化鉀、氫氧化鋰、氫氧化銫之鹼金屬氫氧化物,如碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀之鹼金屬碳酸鹽等無機鹼,氨、三乙胺、二伸乙基三胺、正丁胺、二甲胺基乙醇、三乙醇胺、四甲基氫氧化銨等有機鹼。 The reaction in the production step 1 can also be carried out without a catalyst, but if the catalyst is not used, the reaction proceeds slowly, so from the viewpoint of shortening the reaction time, it is preferably carried out in the presence of a catalyst. . As the usable catalyst, any compound which exhibits acidity or alkalinity can be used. Examples of the acidic catalyst include inorganic acids such as hydrochloric acid, sulfuric acid, and nitric acid, and organic acids such as formic acid, acetic acid, and oxalic acid. Further, as an example of the alkaline catalyst, an alkali metal hydroxide such as sodium hydroxide, potassium hydroxide, lithium hydroxide or barium hydroxide such as sodium carbonate, potassium carbonate, sodium hydrogencarbonate or potassium hydrogencarbonate can be used. An inorganic base such as an alkali metal carbonate, an organic base such as ammonia, triethylamine, di-ethyltriamine, n-butylamine, dimethylaminoethanol, triethanolamine or tetramethylammonium hydroxide.

該等中,尤佳為鹼性觸媒,就容易將觸媒自產物中去除之方面而言,較佳為無機鹼。具體而言,較佳為氫氧化鈉、氫氧化鉀、氫氧化鈣等鹼金屬鹽,或鹼土類金屬鹽,尤佳為氫氧化物。 Among these, an alkaline base is preferred, and an inorganic base is preferred because it is easy to remove the catalyst from the product. Specifically, an alkali metal salt such as sodium hydroxide, potassium hydroxide or calcium hydroxide, or an alkaline earth metal salt is preferred, and a hydroxide is particularly preferred.

觸媒之添加量相對於矽烷醇基末端矽油(e)與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之總重量,通常為0.001~5重量%,較佳為0.01~2重量%。 The amount of the catalyst added is usually 0.001 to 5% by weight based on the total weight of the decyl alcohol-terminated oxime (e) and the epoxy group-containing oxime (f) (and optionally the alkoxylate (g)). Preferably, it is 0.01 to 2% by weight.

觸媒之添加方法可為直接添加,或以溶解於可溶性溶 劑等中之狀態使用。其中,較佳為以預先將觸媒溶解於甲醇、乙醇、丙醇、丁醇等醇類中之狀態添加。此時,由於除目標反應以外之溶膠-凝膠反應會進行競爭,使含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之烷氧基之聚縮合單方面進行,藉此生成之反應物與矽烷醇基末端矽油(e)有不相溶而產生白濁之可能性,故必需注意作為使用水等之水溶液而添加之情況。 The catalyst may be added directly or dissolved in a soluble solution. It is used in the state of the agent or the like. Among them, it is preferred to add the catalyst in a state in which the catalyst is dissolved in an alcohol such as methanol, ethanol, propanol or butanol. At this time, since the sol-gel reaction other than the target reaction competes, the alkoxy group of the epoxy group-containing telluride (f) (and optionally the alkoxylate (g)) is condensed. On the other hand, the reaction product formed by this is incompatible with the stanol-based terminal eucalyptus oil (e), and it is likely to be white turbid. Therefore, it is necessary to add it as an aqueous solution using water or the like.

此時之水分之容許範圍相對於矽烷醇基末端矽油(e)與含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之總重量,通常為0.5量量%以下,更佳為0.3重量%以下,進而更佳為儘可能無水分。 The allowable range of moisture at this time is usually 0.5 by weight relative to the total weight of the decyl alcohol-terminated oxime (e) and the epoxy-containing oxime (f) (and optionally the alkoxylate (g)). % or less, more preferably 0.3% by weight or less, and even more preferably no moisture as much as possible.

製造步驟1之反應溫度取決於觸媒量、使用溶劑,通常為20~160℃,較佳為40~100℃,尤佳為50~95℃。又,反應時間通常為1~20小時,較佳為3~12小時。 The reaction temperature in the production step 1 depends on the amount of the catalyst and the solvent to be used, and is usually 20 to 160 ° C, preferably 40 to 100 ° C, and particularly preferably 50 to 95 ° C. Further, the reaction time is usually from 1 to 20 hours, preferably from 3 to 12 hours.

可認為,以上述方式由製造步驟1獲得之改質矽油(h)具有如下述式(6)所示之結構作為主要成分(結構之確認較為困難,無法正確鑑定)。 It is considered that the modified eucalyptus oil (h) obtained in the above-described manner in the production step 1 has a structure represented by the following formula (6) as a main component (confirmation of the structure is difficult and cannot be correctly identified).

式(6)中,R5、p表示與上述相同之含義。R8表示上述之X、R6、-OR7中之任一者,R9表示R6及/或-OR7In the formula (6), R 5 and p have the same meanings as described above. R 8 represents any of X, R 6 and -OR 7 described above, and R 9 represents R 6 and/or -OR 7 .

繼而,對製造步驟2進行詳細說明。 Next, the manufacturing step 2 will be described in detail.

製造步驟1之反應結束後,添加水而進行殘存於所得之改質矽油(h)的烷氧基彼此聚合(溶膠-凝膠反應)。此時,亦可視需要於上述量之範圍內添加上述含有環氧基之矽化物(f)(及視需要之烷氧矽化物(g))、觸媒。該反應係於(1)改質矽油(h)彼此、及/或(1)改質矽油(h)與(2)含有環氧基之矽化物(f)(及使用之情形時烷氧矽化物(g))之間、及/或(3)含有環氧基之矽化物(f)(及使用之情形時烷氧矽化物(g))及(4)含有環氧基之矽化物(f)(及使用之情形時烷氧矽化物(g))之部分聚合物與改質矽油(h)之間進行聚合反應的步驟。可認為,上述(1)~(4)之聚合反應係同時平行地進行。 After completion of the reaction in the production step 1, water is added to carry out polymerization of the alkoxy groups remaining in the obtained modified eucalyptus oil (h) (sol-gel reaction). In this case, the above-mentioned epoxy group-containing telluride (f) (and optionally alkoxylate (g)) and a catalyst may be added as needed within the above range. The reaction is based on (1) upgrading the eucalyptus oil (h) to each other, and/or (1) upgrading the eucalyptus oil (h) and (2) the epoxy group-containing hydrazine compound (f) (and alkoxylation in the case of use) Between the substances (g)), and/or (3) the oxime containing the epoxy group (f) (and the alkoxy saccharide (g) in the case of use) and (4) the oxime containing the epoxy group ( f) (and in the case of use, a step of carrying out a polymerization reaction between a part of the polymer of the alkoxylate (g)) and the modified eucalyptus oil (h). It is considered that the polymerization reactions of the above (1) to (4) are simultaneously carried out in parallel.

尤其是,於製造步驟2中,亦與先前相同,作為觸媒,同樣較佳為鹼性無機觸媒,可於製造步驟1之階段預先添加必要之量。然而,不宜超過於製造步驟1中作為較佳之態樣而記載之範圍。 In particular, in the production step 2, as in the prior art, as the catalyst, an alkaline inorganic catalyst is also preferable, and the necessary amount can be added in advance at the stage of the production step 1. However, it should not exceed the range described in the manufacturing step 1 as a preferred aspect.

於製造步驟2中,較佳為添加溶劑。 In the production step 2, it is preferred to add a solvent.

作為製造步驟2中之溶劑,較佳為與製造步驟1同樣地使用醇。作為可使用之醇,可列舉碳數1~10之醇,具體而言,可列舉甲醇、乙醇、丙醇、異丙醇、丁醇、第三丁醇、己醇、辛醇、壬醇、癸醇、環己醇、環戊醇等。於本發明中,尤其較佳為一級醇、二級醇,尤佳為一級醇。又,就後續之去除性能之問題而言,較佳為甲醇、乙醇、丙醇、異丙醇、丁醇、第三丁醇等碳數1~4之低分子量醇。該等醇可混合使用。該等醇之存在有助於分子量控制及其 穩定性。 As the solvent in the production step 2, it is preferred to use an alcohol in the same manner as in the production step 1. Examples of the alcohol that can be used include alcohols having 1 to 10 carbon atoms, and specific examples thereof include methanol, ethanol, propanol, isopropanol, butanol, tert-butanol, hexanol, octanol, and decyl alcohol. Sterol, cyclohexanol, cyclopentanol, and the like. In the present invention, a primary alcohol, a secondary alcohol, and particularly preferably a primary alcohol are particularly preferred. Further, in view of the subsequent removal performance, a low molecular weight alcohol having 1 to 4 carbon atoms such as methanol, ethanol, propanol, isopropanol, butanol or t-butanol is preferred. These alcohols can be used in combination. The presence of such alcohols contributes to molecular weight control and stability.

醇之添加量相對於在製造步驟1中添加之矽烷醇基末端矽油(e)與含有環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之總重量,為20~200重量%,較佳為20~150重量%,尤佳為30~120重量%。 The amount of the alcohol added is relative to the total weight of the decyl alcohol-terminated eucalyptus oil (e) added in the production step 1 and the epoxy group-containing hydrazine compound (f) (and optionally the alkoxylate (g)). 20 to 200% by weight, preferably 20 to 150% by weight, particularly preferably 30 to 120% by weight.

於製造步驟2中添加水(可使用離子交換水、蒸餾水、淨水之任一者)。水之使用量相對於殘存之烷氧基量,通常為0.5~8.0當量,更佳為0.6~5.0當量,尤佳為0.65~2.0當量。 Water is added to the production step 2 (any of ion-exchanged water, distilled water, and purified water can be used). The amount of water used is usually from 0.5 to 8.0 equivalents, more preferably from 0.6 to 5.0 equivalents, still more preferably from 0.65 to 2.0 equivalents, based on the amount of the alkoxy group remaining.

於水之量低於0.5當量時,有如下可能性:產生反應之進行變慢、且含環氧基之矽化物(f)(及視需要之烷氧矽化物(g))會不反應而殘存等問題,或無法形成充分之網狀物而於製成下述之硬化樹脂組成物之硬化後亦引起硬化不良。又,於超過8.0當量時,無法控制分子量,成為必要以上之高分子量。進而,有妨礙聚矽氧骨架環氧樹脂(B)之穩定性的可能性。 When the amount of water is less than 0.5 equivalent, there is a possibility that the progress of the reaction proceeds slowly, and the epoxy group-containing telluride (f) (and optionally the alkoxylate (g)) does not react. Problems such as residualness, or the inability to form a sufficient mesh, cause hardening failure after hardening of the cured resin composition described below. Further, when it exceeds 8.0 equivalents, the molecular weight cannot be controlled, and a high molecular weight of more than necessary is required. Further, there is a possibility of hindering the stability of the polyoxymethylene skeleton epoxy resin (B).

製造步驟2之反應溫度取決於觸媒量、使用溶劑,通常為20~160℃,較佳為40~100℃,尤佳為50~95℃。又,反應時間通常為1~20小時,較佳為3~12小時。 The reaction temperature in the production step 2 depends on the amount of the catalyst and the solvent to be used, and is usually 20 to 160 ° C, preferably 40 to 100 ° C, and particularly preferably 50 to 95 ° C. Further, the reaction time is usually from 1 to 20 hours, preferably from 3 to 12 hours.

反應結束後,視需要藉由驟冷、及/或水洗而去除觸媒。於進行水洗之情形時,較佳為根據所使用之溶劑之種類而添加可與水分離之溶劑。作為較佳之溶劑,例如可例示:如甲基乙基酮、甲基異丁基酮、環戊酮之酮類,乙酸乙酯、乙酸丁酯、乳酸乙酯、丁酸異丙酯等酯類,如己烷、環己 烷、甲苯、二甲苯之烴類等。 After the reaction is completed, the catalyst is removed by quenching and/or washing with water as needed. In the case of performing water washing, it is preferred to add a solvent which can be separated from water depending on the kind of the solvent to be used. As preferred solvents, for example, methyl ethyl ketone, methyl isobutyl ketone, ketone of cyclopentanone, ethyl acetate, butyl acetate, ethyl lactate, isopropyl butyrate and the like can be exemplified. , such as hexane, cyclohexane Hydrocarbons of alkane, toluene and xylene.

本反應可僅藉由水洗而進行觸媒之去除,就於酸性、鹼性條件之任一條件下進行反應之方面而言,較佳為於藉由中和反應而進行驟冷後進行水洗,或於使用吸附劑吸附觸媒後藉由過濾而去除吸附劑。 In the present reaction, the catalyst can be removed by washing only with water, and in the case of performing the reaction under any of acidic and basic conditions, it is preferably subjected to rapid cooling by a neutralization reaction and then washed with water. Alternatively, the adsorbent may be removed by filtration after adsorbing the catalyst with an adsorbent.

中和反應可使用只要為顯示酸性或鹼性之化合物。作為顯示酸性之化合物之例,可列舉:鹽酸、硫酸、硝酸等無機酸,或甲酸、乙酸、草酸等有機酸。又,作為顯示鹼性之化合物之例,可使用:如氫氧化鈉、氫氧化鉀、氫氧化鋰、氫氧化銫之鹼金屬氫氧化物,如碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀之鹼金屬碳酸鹽,如磷酸、磷酸二氫鈉、磷酸氫二鈉、磷酸三鈉、多磷酸、三聚磷酸鈉之磷酸鹽類等無機鹼,氨、三乙胺、二伸乙基三胺、正丁胺、二甲胺基乙醇、三乙醇胺、四甲基氫氧化銨等有機鹼。該等中,尤其是就容易自產物中去除之方面而言,較佳為無機鹼或無機酸,進而較佳為更容易將pH值調整至中性附近之磷酸鹽類等。 The neutralization reaction can be used as long as it is a compound which exhibits acidity or basicity. Examples of the compound which exhibits acidity include inorganic acids such as hydrochloric acid, sulfuric acid, and nitric acid, and organic acids such as formic acid, acetic acid, and oxalic acid. Further, as an example of a compound showing basicity, an alkali metal hydroxide such as sodium hydroxide, potassium hydroxide, lithium hydroxide or barium hydroxide such as sodium carbonate, potassium carbonate, sodium hydrogencarbonate or hydrogencarbonate can be used. Potassium alkali metal carbonate, such as phosphoric acid, sodium dihydrogen phosphate, disodium hydrogen phosphate, trisodium phosphate, polyphosphoric acid, sodium phosphate triphosphate, etc., inorganic base, ammonia, triethylamine, diethyl ether An organic base such as an amine, n-butylamine, dimethylaminoethanol, triethanolamine or tetramethylammonium hydroxide. Among these, in particular, from the viewpoint of easy removal from the product, an inorganic base or an inorganic acid is preferred, and further preferably a phosphate which is more easily adjusted to a pH near neutral.

作為吸附劑,可例示活性白土、活性碳、沸石、無機/有機系之合成吸附劑、離子交換樹脂等,作為具體例,可列舉下述製品。 Examples of the adsorbent include activated clay, activated carbon, zeolite, inorganic/organic synthetic adsorbent, ion exchange resin, and the like. Specific examples thereof include the following products.

活性白土例如可列舉:東新化成公司製造之活性白土SA35、SA1、T、R-15、E、Nikkanite G-36、G-153、G-168,水澤化學工業公司製造之Galleon Earth、Mizuka Ace等。活性碳例如可列舉:Ajinomoto Fine-Techno公司製造之 CL-H、Y-10S、Y-10SF,Futamura化學公司製造之S、Y、FC、DP、SA1000、K、A、KA、M、CW130BR、CW130AR、GM130A等。作為沸石,例如可列舉Union Showa公司製造之Molecular Sieve 3A、4A、5A、13X等。作為合成吸附劑,例如可列舉:協和化學公司製造之Kyoword 100、200、300、400、500、600、700、1000、2000,或Rohm and Hass公司製造之Amberlyst 15JWET、15DRY、16WET、31WET、A21、Amberlite IRA400JCI、IRA403BLCI、IRA404JCI、Dow Chemical公司製造之Dowex 66、HCR-S、HCR-W2、MAC-3等。 Examples of the activated clay include: activated clay SA35, SA1, T, R-15, E, Nikkanite G-36, G-153, and G-168 manufactured by Toshinaga Chemical Co., Ltd., Galleon Earth, Mizuka Ace, manufactured by Mizusawa Chemical Industry Co., Ltd. Wait. Examples of the activated carbon include those manufactured by Ajinomoto Fine-Techno Co., Ltd. CL-H, Y-10S, Y-10SF, S, Y, FC, DP, SA1000, K, A, KA, M, CW130BR, CW130AR, GM130A, etc. manufactured by Futamura Chemical Co., Ltd. Examples of the zeolite include Molecular Sieve 3A, 4A, 5A, and 13X manufactured by Union Showa. Examples of the synthetic adsorbent include Kyoword 100, 200, 300, 400, 500, 600, 700, 1000, 2000 manufactured by Kyowa Chemical Co., Ltd., or Amberlyst 15JWET, 15DRY, 16WET, 31WET, A21 manufactured by Rohm and Hass. Amberlite IRA400JCI, IRA403BLCI, IRA404JCI, Dowex 66, HCR-S, HCR-W2, MAC-3, etc. manufactured by Dow Chemical Company.

將吸附劑添加於反應液中並進行攪拌、加熱等處理而吸附觸媒後,過濾吸附劑,進而對殘渣進行水洗,藉此可去除觸媒、吸附劑。 After the adsorbent is added to the reaction liquid and subjected to a treatment such as stirring or heating to adsorb the catalyst, the adsorbent is filtered, and the residue is washed with water, whereby the catalyst and the adsorbent can be removed.

反應結束後或驟冷後,可藉由水洗、過濾之其他慣用之分離純化手段而使其純化。作為純化手段,例如可列舉管柱層析法、減壓濃縮、蒸餾、萃取等。該等純化手段可單獨進行,亦可組合複數種進行。 After completion of the reaction or after quenching, it may be purified by washing and filtration by other conventional separation and purification means. Examples of the purification means include column chromatography, concentration under reduced pressure, distillation, and extraction. These purification means may be carried out singly or in combination of plural kinds.

於使用與水混合之溶劑作為反應溶劑而進行反應時,較佳為在驟冷後藉由蒸餾或減壓濃縮將與水混合之反應溶劑自系統中去除後,使用可與水分離之溶劑而進行水洗。 When the reaction is carried out using a solvent mixed with water as a reaction solvent, it is preferred to use a solvent which can be separated from water after the reaction solvent mixed with water is removed from the system by distillation or concentration under reduced pressure after quenching. Washed with water.

水洗後,藉由利用減壓濃縮等去除溶劑,可獲得本發明之聚矽氧骨架環氧樹脂(B)。 After washing with water, the polyfluorene skeleton epoxy resin (B) of the present invention can be obtained by removing the solvent by concentration under reduced pressure or the like.

以上述方式獲得之聚矽氧骨架環氧樹脂(B)之外觀通常為無色透明,且於25℃下為具有流動性之液狀。又,其 分子量係以利用GPC所測得之重量平均分子量計較佳為800~3000,更佳為1000~3000,尤佳為1500~2800。於重量平均分子量低於800之情形時,存在耐熱性降低之情況,於高於3000之情形時,存在使用其密封之LED元件之回流焊時密封材料自基板剝離之情況。 The polyfluorene skeleton skeleton epoxy resin (B) obtained in the above manner is usually colorless and transparent, and is liquid in a fluidity at 25 °C. Again, its The molecular weight is preferably from 800 to 3,000, more preferably from 1,000 to 3,000, still more preferably from 1,500 to 2,800, based on the weight average molecular weight measured by GPC. When the weight average molecular weight is less than 800, there is a case where the heat resistance is lowered. When the weight average molecular weight is higher than 3,000, there is a case where the sealing material is peeled off from the substrate during reflow using the sealed LED element.

重量平均分子量為利用GPC(凝膠滲透層析法)於下述條件下所測得之經聚苯乙烯換算之重量平均分子量(Mw)。 The weight average molecular weight is a polystyrene-equivalent weight average molecular weight (Mw) measured by GPC (gel permeation chromatography) under the following conditions.

GPC之各種條件 Various conditions of GPC

製造商:島津製作所 Manufacturer: Shimadzu Manufacturing Co., Ltd.

管柱:保護管柱SHODEX GPC LF-G LF-804(3根) Pipe column: protection column SHODEX GPC LF-G LF-804 (3 roots)

流速:1.0 ml/min Flow rate: 1.0 ml/min

管柱溫度:40℃ Column temperature: 40 ° C

使用溶劑:THF(四氫呋喃) Solvent: THF (tetrahydrofuran)

檢測器:RI(示差折射率檢測器) Detector: RI (differential refractive index detector)

聚矽氧骨架環氧樹脂(B)之環氧當量(利用JIS K-7236所記載之方法測得)較佳為300~1500 g/eq,更佳為320~1400 g/eq,進而較佳為350~1200 g/eq,尤佳為350~1000 g/eq。於環氧當量低於300 g/eq之情形時,有該硬化物變得過硬之傾向,於高於1500 g/eq之情形時,有硬化物之機械特性惡化之傾向。 The epoxy equivalent of the polyoxymethylene skeleton epoxy resin (B) (measured by the method described in JIS K-7236) is preferably from 300 to 1,500 g/eq, more preferably from 320 to 1400 g/eq, and further preferably. It is 350~1200 g/eq, especially 350~1000 g/eq. When the epoxy equivalent is less than 300 g/eq, the cured product tends to be too hard, and when it is higher than 1500 g/eq, the mechanical properties of the cured product tend to deteriorate.

聚矽氧骨架環氧樹脂(B)可為單一之聚矽氧骨架環氧樹脂(B),亦可為兩種以上之聚矽氧骨架環氧樹脂(B)之混合物。此處,就硬化物之適度之機械強度之觀點而言, 若為單一之聚矽氧骨架環氧樹脂(B),則該環氧樹脂較佳為300~1500 g/eq,尤佳為350~1000 g/eq;於為兩種以上之聚矽氧骨架環氧樹脂(B)之混合物之情形時,特定之聚矽氧骨架環氧樹脂(B)之環氧當量×(該特定之聚矽氧骨架環氧樹脂(B)之含量/聚矽氧骨架環氧樹脂(B)之總量)之總和的環氧當量較佳為300~1500 g/eq,尤佳為350~1000 g/eq。 The polyoxyl skeleton epoxy resin (B) may be a single polyfluorene skeleton epoxy resin (B), or a mixture of two or more polyfluorene skeleton epoxy resins (B). Here, as far as the moderate mechanical strength of the hardened material is concerned, In the case of a single polyoxyl skeleton epoxy resin (B), the epoxy resin is preferably from 300 to 1500 g/eq, particularly preferably from 350 to 1000 g/eq; in the case of two or more polyfluorene skeletons In the case of a mixture of epoxy resins (B), the epoxy equivalent of the specific polyoxyl skeleton epoxy resin (B) × (the content of the specific polyoxyl skeleton epoxy resin (B) / polyoxyn skeleton The epoxy equivalent of the sum of the total amount of the epoxy resins (B) is preferably from 300 to 1,500 g/eq, particularly preferably from 350 to 1000 g/eq.

聚矽氧骨架環氧樹脂(B)之黏度(E型黏度計,於25℃下測得)較佳為50~20,000 mPa‧s,更佳為500~10,000 mPa‧s,尤佳為800~5,000 mPa‧s。於黏度低於50 mPa‧s之情形時,存在黏度過低而不適於光半導體密封材料用途之情況,於高於20,000 mPa‧s之情形時,存在黏度過高而加工性降低之情形。 The viscosity of the polyoxyl skeleton epoxy resin (B) (measured by an E-type viscometer at 25 ° C) is preferably 50 to 20,000 mPa ‧ , more preferably 500 to 10,000 mPa ‧ , and particularly preferably 800 5,000 mPa‧s. When the viscosity is less than 50 mPa ‧ s, there is a case where the viscosity is too low and it is not suitable for the use of the optical semiconductor sealing material, and when it is higher than 20,000 mPa ‧ s, the viscosity is too high and the workability is lowered.

於聚矽氧骨架環氧樹脂(B)中,鍵結有3個氧原子之矽原子相對於全部矽原子的比率較佳為3~50莫耳%,更佳為5~30莫耳%,尤佳為6~15莫耳%。若源自矽倍半氧烷之鍵結於3個氧原子的矽原子相對於全部矽原子的比率低於3莫耳%,則有硬化物變得過軟之傾向,存在產生表面褶皺或損傷之情況。又,若高於50莫耳%,則存在硬化物變得過硬之情況。 In the polyfluorene skeleton epoxy resin (B), the ratio of the ruthenium atom having three oxygen atoms bonded to the entire ruthenium atom is preferably from 3 to 50 mol%, more preferably from 5 to 30 mol%, It is especially good for 6~15 moles. If the ratio of the ruthenium atom bonded to the three oxygen atoms derived from the sesquisestam atom to all the ruthenium atoms is less than 3 mol%, the cured product tends to be too soft, and surface wrinkles or damage may occur. The situation. Moreover, if it exceeds 50 mol%, there exists a case where a hardened|cured material becomes hard.

存在之矽原子之比率可藉由聚矽氧骨架環氧樹脂(B)之1H NMR(nuclear magnetic resonance)、29Si NMR、元素分析等而求出。 The ratio of the ruthenium atoms present can be determined by 1 H NMR (nuclear magnetic resonance), 29 Si NMR, elemental analysis, or the like of the polyfluorene skeleton epoxy resin (B).

以上,對本發明之聚矽氧骨架環氧樹脂(B)之較佳之 態樣,即經由製造步驟1、2而獲得之矽烷醇基末端矽油(e)與含有環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之縮合物進行說明。 The above is preferred for the polyoxyl skeleton epoxy resin (B) of the present invention. Illustratively, that is, a condensate of a decyl alcohol-terminated oleic oil (e) obtained by the production steps 1 and 2 and an alkyl group-containing oxime compound (f) (and optionally an alkoxylate (g)) .

作為聚矽氧骨架環氧樹脂(B),亦可例示不使用上述矽烷醇基末端矽油(e)之含有環氧基之矽化物(f)(及視需要之烷氧矽化物(g))的縮聚物。 As the polyoxyl skeleton epoxy resin (B), an epoxy group-containing telluride (f) (and optionally an alkoxylate (g)) which does not use the above stanol-based terminal eucalyptus oil (e) can also be exemplified. Polycondensate.

此種情形時,可藉由一個階段之反應而製造,可使上述式(4)所表示之含有環氧基之矽化物(f)(及視需要之上述式(5)所表示之烷氧矽化物(g))於上述之存在觸媒、溶劑之情況下,滴加水,於反應溫度為40~100℃、反應時間為1~24小時之條件下縮合而獲得。 In this case, the epoxy group-containing telluride (f) (and the alkoxy group represented by the above formula (5) represented by the above formula (4) can be produced by a reaction of one stage. The telluride (g) is obtained by adding water in the presence of a catalyst or a solvent as described above, and condensing under the conditions of a reaction temperature of 40 to 100 ° C and a reaction time of 1 to 24 hours.

縮合後,可藉由如上述之觸媒之驟冷、去除、水洗、濃縮而獲得含有環氧基之矽化物(f)(及視需要之烷氧矽化物(g))之縮合物。 After the condensation, the condensate of the epoxy group-containing telluride (f) (and optionally the alkoxylate (g)) can be obtained by quenching, removing, washing with water and concentration as described above.

本發明之就具有優異之耐硫化性與優異之適用期之觀點而言尤佳之聚矽氧骨架環氧樹脂(B)之實施形態係如下所述。 The embodiment of the polyfluorene skeleton epoxy resin (B) which is particularly preferable in view of having excellent sulfur resistance and excellent pot life is as follows.

(i)一種聚矽氧骨架環氧樹脂(B),其中與矽連結之取代基中苯基的比率相對於取代甲基1莫耳而為0.05~2.0莫耳。 (i) A polyfluorene skeleton epoxy resin (B) wherein the ratio of the phenyl group in the substituent bonded to the fluorene is 0.05 to 2.0 moles with respect to the substituted methyl group 1 mole.

(ii)一種聚矽氧骨架環氧樹脂(B),其中與矽連結之取代基中苯基的比率相對於取代甲基1莫耳而為0.15~0.2莫耳。 (ii) A polyfluorene skeleton epoxy resin (B) wherein the ratio of the phenyl group in the substituent bonded to the oxime is 0.15 to 0.2 mol per mol of the substituted methyl group.

(iii)如上述(i)或(ii)之聚矽氧骨架環氧樹脂(B), 其中鍵結有3個氧原子之矽原子相對於全部矽原子的比率為3~50莫耳%。 (iii) a polyfluorene skeleton epoxy resin (B) as described in (i) or (ii) above, The ratio of the ruthenium atom having 3 oxygen atoms bonded to the total ruthenium atom is 3 to 50 mol%.

(iv)如上述(i)或(ii)之聚矽氧骨架環氧基樹脂(B),其中鍵結有3個氧原子之矽原子相對於全部矽原子的比率為6~15莫耳%。 (iv) a polyfluorene skeleton epoxy resin (B) according to the above (i) or (ii), wherein a ratio of ruthenium atoms having 3 oxygen atoms bonded to all ruthenium atoms is 6 to 15 mol% .

(v)如上述(i)至(iv)中任一項之聚矽氧骨架環氧樹脂(B),其中環氧當量為350~1000 g/eq。 (v) The polyfluorene skeleton epoxy resin (B) according to any one of the above (i) to (iv), wherein the epoxy equivalent is from 350 to 1000 g/eq.

(vi)如上述(i)至(iv)中任一項之聚矽氧骨架環氧樹脂(B)混合物,其中當為兩種以上之聚矽氧骨架環氧樹脂(B)之混合物時,特定之聚矽氧骨架環氧樹脂之環氧當量×(該特定之聚矽氧骨架環氧樹脂(B)之含量/聚矽氧骨架環氧樹脂(B)之總量)之總和的環氧當量為350~1000 g/eq。 (vi) The polyxanylene skeleton epoxy resin (B) mixture according to any one of the above (i) to (iv), wherein when it is a mixture of two or more polyfluorene skeleton epoxy resins (B), The epoxy equivalent of the specific polyoxyl skeleton epoxy resin × (the content of the specific polyoxyl skeleton epoxy resin (B) / the total amount of the polyoxyl skeleton epoxy resin (B)) The equivalent weight is 350~1000 g/eq.

於本發明之光半導體密封用樹脂組成物中,亦可單獨或混合使用除上述聚矽氧骨架環氧樹脂(B)以外之環氧樹脂。 In the resin composition for optical semiconductor sealing of the present invention, an epoxy resin other than the above-mentioned polyoxymethylene skeleton epoxy resin (B) may be used singly or in combination.

作為可使用之其他環氧樹脂,可列舉:為酚化合物之縮水甘油基醚化物之環氧樹脂、為各種酚醛清漆樹脂之縮水甘油基醚化物之環氧樹脂、脂環式環氧樹脂、脂肪族系環氧樹脂、雜環式環氧樹脂、縮水甘油酯系環氧樹脂、縮水甘油基胺系環氧樹脂、使鹵化酚類縮水甘油化而成之環氧樹脂、具有環氧基之聚合性不飽和化合物與除此以外之其他聚合性不飽和化合物之共聚物等。 Examples of other epoxy resins that can be used include epoxy resins which are glycidyl ether compounds of phenol compounds, epoxy resins which are glycidyl ether compounds of various novolak resins, alicyclic epoxy resins, and fats. Family epoxy resin, heterocyclic epoxy resin, glycidyl ester epoxy resin, glycidylamine epoxy resin, epoxy resin obtained by glycidylating halogenated phenols, polymerization with epoxy groups A copolymer of an unsaturated compound and a polymerizable unsaturated compound other than the above.

作為可作為上述酚類化合物之縮水甘油基醚化物之環 氧樹脂,例如可列舉如下環氧樹脂等:該等環氧樹脂係2-[4-(2,3-環氧丙氧基)苯基]-2-[4-[1,1-雙[4-(2,3-羥基)苯基]乙基]苯基]丙烷、雙酚A、雙酚F、雙酚S、4,4'-聯苯酚、四甲基雙酚A、二甲基雙酚A、四甲基雙酚F、二甲基雙酚F、四甲基雙酚S、二甲基雙酚S、四甲基-4,4'-聯苯酚、二甲基-4,4'-聯苯酚、1-(4-羥基苯基)-2-[4-(1,1-雙-(4-羥基苯基)乙基)苯基]丙烷、2,2'-亞甲基-雙(4-甲基-6-第三丁基苯酚)、4,4'-亞丁基-雙(3-甲基-6-第三丁基苯酚)、三羥基苯基甲烷、間苯二酚、對苯二酚、鄰苯三酚、間苯三酚、具有二亞異丙基骨架之酚類、1,1-二-4-羥基苯基茀等具有茀骨架之酚類、酚化聚丁二烯等多酚化合物之縮水甘油基醚化物。 As a ring of glycidyl etherate which can be used as the above phenolic compound Examples of the oxygen resin include epoxy resins such as 2-[4-(2,3-epoxypropoxy)phenyl]-2-[4-[1,1-double [ 4-(2,3-hydroxy)phenyl]ethyl]phenyl]propane, bisphenol A, bisphenol F, bisphenol S, 4,4'-biphenol, tetramethylbisphenol A, dimethyl Bisphenol A, tetramethylbisphenol F, dimethyl bisphenol F, tetramethyl bisphenol S, dimethyl bisphenol S, tetramethyl-4,4'-biphenol, dimethyl-4, 4'-biphenol, 1-(4-hydroxyphenyl)-2-[4-(1,1-bis-(4-hydroxyphenyl)ethyl)phenyl]propane, 2,2'-methylene Base-bis(4-methyl-6-tert-butylphenol), 4,4'-butylene-bis(3-methyl-6-tert-butylphenol), trishydroxyphenylmethane, isophthalic acid Diphenols, hydroquinones, pyrogallols, phloroglucinol, phenols having a diisopropylidene skeleton, 1,1-di-4-hydroxyphenylhydrazine and the like, phenols having an anthracene skeleton, phenol A glycidyl etherate of a polyphenol compound such as polybutadiene.

作為可作為上述各種酚醛清漆樹脂之縮水甘油基醚化物之環氧樹脂,例如可列舉:以苯酚、甲酚類、乙酚類、丁酚類、辛酚類、雙酚A、雙酚F及雙酚S等雙酚類、萘酚類等各種酚為原料之酚醛清漆樹脂,含二甲苯骨架之酚類酚醛清漆樹脂,含二環戊二烯骨架之酚類酚醛清漆樹脂,含聯苯骨架之酚類酚醛清漆樹脂,含茀骨架之酚類酚醛清漆樹脂等各種酚醛清漆樹脂之縮水甘油基醚化物等。 Examples of the epoxy resin which can be used as the glycidyl etherate of the various novolak resins include phenol, cresol, phenol, butanol, octylphenol, bisphenol A, and bisphenol F. A phenol novolak resin containing various phenols such as bisphenols and naphthols, a phenolic novolac resin containing a xylene skeleton, a phenolic novolac resin containing a dicyclopentadiene skeleton, and a biphenyl skeleton The phenolic novolac resin, the glycidyl etherified product of various novolak resins, such as a phenolic novolak resin containing an anthracene skeleton.

作為上述脂環式環氧樹脂,例如可列舉3,4-環氧基環己基甲基-(3,4-環氧基)羧酸環己酯、雙(3,4-環氧基環己基甲基)己二酸酯等具有脂肪族環骨架之脂環式環氧樹脂。 Examples of the alicyclic epoxy resin include 3,4-epoxycyclohexylmethyl-(3,4-epoxy)carboxylic acid cyclohexyl ester and bis(3,4-epoxycyclohexyl). An alicyclic epoxy resin having an aliphatic ring skeleton such as methyl) adipate.

作為上述脂肪族系環氧樹脂,例如可列舉1,4-丁二醇、1,6-己二醇、聚乙二醇、新戊四醇等多元醇之縮水甘油基醚類。 Examples of the aliphatic epoxy resin include glycidyl ethers of polyhydric alcohols such as 1,4-butanediol, 1,6-hexanediol, polyethylene glycol, and pentaerythritol.

作為雜環式環氧樹脂,例如可列舉具有異氰尿酸環、乙內醯脲環等雜環之雜環式環氧樹脂。 Examples of the heterocyclic epoxy resin include heterocyclic epoxy resins having a heterocyclic ring such as an isocyanuric acid ring or an intramethylene urea ring.

上述縮水甘油酯系環氧樹脂例如可列舉由六氫鄰苯二甲酸二縮水甘油酯等羧酸酯類所構成之環氧樹脂。 The glycidyl ester-based epoxy resin may, for example, be an epoxy resin composed of a carboxylic acid ester such as hexahydrophthalic acid diglycidyl ester.

縮水甘油基胺系環氧樹脂例如可列舉使苯胺、甲苯胺等胺類縮水甘油化而成之環氧樹脂。 Examples of the glycidylamine-based epoxy resin include an epoxy resin obtained by glycidylating an amine such as aniline or toluidine.

上述使鹵化酚類縮水甘油化而成之環氧樹脂例如可列舉使溴化雙酚A、溴化雙酚F、溴化雙酚S、溴化酚類酚醛清漆、溴化甲酚酚醛清漆、氯化雙酚S、氯化雙酚A等鹵化酚類縮水甘油化而成之環氧樹脂。 Examples of the epoxy resin obtained by glycidylating a halogenated phenol include brominated bisphenol A, brominated bisphenol F, brominated bisphenol S, brominated phenol novolac, and brominated cresol novolac. An epoxy resin obtained by glycidylating a halogenated phenol such as chlorinated bisphenol S or chlorinated bisphenol A.

作為具有環氧基之聚合性不飽和化合物與除此以外之其他聚合性不飽和化合物之共聚物,就可自市場上獲得之製品而言,可列舉Marproof G-0115S、Marproof G-0130S、Marproof G-0250S、Marproof G-1010S、Marproof G-0150M、Marproof G-2050M(日油(股)製造)等,作為具有環氧基之聚合性不飽和化合物,例如可列舉丙烯酸縮水甘油酯、甲基丙烯酸縮水甘油酯、4-乙烯基-1-環己烯-1,2-環氧化物等。又,作為其他聚合性不飽和化合物之共聚物,例如可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸醚酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸環己酯、苯乙烯、乙烯環己烷等。 As a copolymer of a polymerizable unsaturated compound having an epoxy group and a polymerizable unsaturated compound other than the above, commercially available products include Marproof G-0115S, Marproof G-0130S, and Marproof. G-0250S, Marproof G-1010S, Marproof G-0150M, Marproof G-2050M (manufactured by Nippon Oil Co., Ltd.), etc., as the polymerizable unsaturated compound having an epoxy group, for example, glycidyl acrylate and methyl group are mentioned. Glycidyl acrylate, 4-vinyl-1-cyclohexene-1,2-epoxide, and the like. Moreover, examples of the copolymer of the other polymerizable unsaturated compound include methyl (meth)acrylate, (meth)acrylate, (benzyl) methacrylate, cyclohexyl (meth)acrylate, and benzene. Ethylene, ethylene cyclohexane, and the like.

上述環氧樹脂可使用一種或混合兩種以上而使用。 These epoxy resins may be used alone or in combination of two or more.

於上述環氧樹脂中,就透明性、耐熱透明性、耐光透明性之觀點而言,較佳為脂環式環氧樹脂之併用。於為脂環式環氧樹脂之情形時,較佳為骨架中具有環氧基環己烷 結構之化合物,尤佳為藉由具有環己烯結構之化合物之酸化反應而獲得之環氧樹脂。 Among the above epoxy resins, from the viewpoint of transparency, heat-resistant transparency, and light-resistant transparency, an alicyclic epoxy resin is preferably used in combination. In the case of an alicyclic epoxy resin, it is preferred to have an epoxycyclohexane in the skeleton. The compound of the structure is particularly preferably an epoxy resin obtained by an acidification reaction of a compound having a cyclohexene structure.

該等環氧樹脂可列舉:使可藉由如下方法製造之化合物氧化而成者等(該等例示之全部內容係作為參照而編入於此):環己烯羧酸與醇類之酯化反應或環己烯甲醇與羧酸類之酯化反應(Tetrahedron vol.36 p.2409(1980)、Tetrahedron Letter p.4475(1980)等中所記載之方法),或環己烯醛之季先科反應(tishchenko reaction)(日本專利特開2003-170059號公報、日本專利特開2004-262871號公報等中所記載之方法)、進而環己烯羧酸酯之酯交換反應(日本專利特開2006-052187號公報等中所記載之方法)。 Examples of the epoxy resin include those obtained by oxidizing a compound which can be produced by the following method (all of which are incorporated herein by reference): esterification of cyclohexenecarboxylic acid with an alcohol Or an esterification reaction of cyclohexene methanol with a carboxylic acid (Tetrahedron vol. 36 p. 2409 (1980), Tetrahedron Letter p. 4475 (1980), etc.), or a cyclohexaaldehyde quaternary reaction (tishchenko) The method described in Japanese Patent Laid-Open No. Hei. No. 2003-262871, and the like, and the transesterification reaction of cyclohexene carboxylate (Japanese Patent Laid-Open No. 2006-052187) The method described in the bulletin and the like).

作為醇類,只要為具有醇性羥基之化合物,則並無特別限定,可列舉:乙二醇、丙二醇、1,3-丙二醇、1,2-丁二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、環己烷二甲醇、2,4-二乙基戊二醇、2-乙基-2-丁基-1,3-丙二醇、新戊二醇、三環癸烷二甲醇、降莰二醇等二醇類,甘油、三羥甲基乙烷、三羥甲基丙烷、三羥甲基丁烷、2-羥基甲基-1,4-丁二醇等三醇類,新戊四醇、二-三羥甲基丙烷等四醇類等。又,作為羧酸類,可列舉草酸、順丁烯二酸、反丁烯二酸、鄰苯二甲酸、間苯二甲酸、己二酸、環己烷二甲酸等,但並不限於此。 The alcohol is not particularly limited as long as it is a compound having an alcoholic hydroxyl group, and examples thereof include ethylene glycol, propylene glycol, 1,3-propanediol, 1,2-butanediol, and 1,4-butanediol. 1,5-pentanediol, 1,6-hexanediol, cyclohexanedimethanol, 2,4-diethylpentanediol, 2-ethyl-2-butyl-1,3-propanediol, new a glycol such as pentanediol, tricyclodecane dimethanol or norbornene, glycerin, trimethylolethane, trimethylolpropane, trimethylolbutane, 2-hydroxymethyl-1, Triols such as 4-butanediol, tetraols such as neopentyl alcohol and di-trimethylolpropane. Further, examples of the carboxylic acid include oxalic acid, maleic acid, fumaric acid, phthalic acid, isophthalic acid, adipic acid, and cyclohexanedicarboxylic acid, but are not limited thereto.

進而,可列舉藉由環己烯醛衍生物與醇體之縮醛反應所獲得之縮醛化合物。 Further, an acetal compound obtained by a reaction of a cyclohexenal derivative with an acetal of an alcohol may be mentioned.

作為該等環氧樹脂之具體例,可列舉:ERL-4221、 UVR-6105、ERL-4299(全部為商品名,均為Dow Chemical製造),Celloxide 2021P、Epolead GT401、EHPE3150、EHPE3150CE(全部為商品名,均為Daicel Chemical Industries製造),及二環戊二烯二環氧化物等,但並不限定於該等(參考文獻:環氧樹脂總論 基礎編I p76-85,其全部內容係作為參照而編入於此)。 Specific examples of the epoxy resins include: ERL-4221 UVR-6105, ERL-4299 (all trade names, all manufactured by Dow Chemical), Celloxide 2021P, Epolead GT401, EHPE3150, EHPE3150CE (all trade names, all manufactured by Daicel Chemical Industries), and dicyclopentadiene Epoxides and the like, but are not limited thereto (Reference: Epoxy Resin General Basics, p. 76-85, the entire contents of which are incorporated herein by reference).

於併用聚矽氧骨架環氧樹脂(B)與其他環氧樹脂之情形時,相對於全部環氧樹脂組成物,聚矽氧骨架環氧樹脂(B)之比率較佳為60~99重量份,尤佳為90~97重量份。若低於60重量份,則存在硬化物之耐光性(抗UV性)降低之情況。 In the case where the polyfluorene skeleton epoxy resin (B) and other epoxy resins are used in combination, the ratio of the polyoxymethylene skeleton epoxy resin (B) is preferably 60 to 99 parts by weight with respect to the entire epoxy resin composition. It is especially suitable for 90 to 97 parts by weight. When it is less than 60 parts by weight, the light resistance (UV resistance) of the cured product may be lowered.

於本發明之硬化樹脂組成物中,含有聚矽氧骨架環氧樹脂(B)之全部環氧樹脂與環氧樹脂硬化劑之調配比率相對於全部環氧樹脂之環氧基1當量,較佳為使用0.5~1.2當量之硬化劑。於相對於環氧基1當量而未達0.5當量之情形或超過1.2當量之情形時,均存在硬化不完全而無法獲得良好之硬化物性之情況。 In the hardened resin composition of the present invention, the blending ratio of all the epoxy resin and the epoxy resin hardener containing the polyfluorene skeleton epoxy resin (B) is preferably 1 equivalent to the epoxy group of the entire epoxy resin. To use 0.5 to 1.2 equivalents of hardener. When it is less than 0.5 equivalents or more than 1.2 equivalents with respect to 1 equivalent of the epoxy group, there is a case where hardening is incomplete and good hardened physical properties cannot be obtained.

於本發明之硬化樹脂組成物中,可於不損害硬化樹脂組成物之適用期特性之範圍內將室溫(25℃)下為液狀之硬化觸媒與熔點為40~200℃之硬化觸媒一起使用。作為室溫(25℃)下為液狀之硬化觸媒,就透明性、耐硫化性優異之方面而言,可列舉辛酸鋅。 In the hardened resin composition of the present invention, a hardening catalyst which is liquid at room temperature (25 ° C) and a hardened contact having a melting point of 40 to 200 ° C can be used without impairing the pot life characteristics of the cured resin composition. Use together with the media. As a curing catalyst which is liquid at room temperature (25 ° C), zinc octoate is mentioned in terms of transparency and sulfidation resistance.

於將室溫(25℃)下為液狀之硬化觸媒與熔點為40~200℃之觸媒混合使用之情形時,於全部硬化觸媒中,熔點 為40~20O℃之硬化觸媒較佳為60~99重量份。若低於60重量份,則存在適用期降低之情況。又,相對於全部環氧樹脂100重量份,全部硬化觸媒通常係於0.001~15重量份之範圍內使用。 When mixing a liquid hardening catalyst at room temperature (25 ° C) with a catalyst having a melting point of 40 to 200 ° C, the melting point of all the hardening catalysts The hardening catalyst for 40 to 20 ° C is preferably 60 to 99 parts by weight. If it is less than 60 parts by weight, there is a case where the pot life is lowered. Further, all of the curing catalyst is usually used in the range of 0.001 to 15 parts by weight based on 100 parts by weight of the total epoxy resin.

藉由視需要於本發明之硬化樹脂組成物中使用偶合劑,可調整組成物之黏度、補充硬化物之硬度。 By using a coupling agent as needed in the cured resin composition of the present invention, the viscosity of the composition and the hardness of the cured product can be adjusted.

作為可使用之偶合劑,例如可列舉:3-縮水甘油氧基丙基三甲氧矽烷、3-縮水甘油氧基丙基甲基二甲氧矽烷、3-縮水甘油氧基丙基甲基二甲氧矽烷、2-(3,4-環氧基環己基)乙基三甲氧矽烷、N-(2-胺基乙基)3-胺基丙基甲基二甲氧矽烷、N-(2-胺基乙基)3-胺基丙基甲基三甲氧矽烷、3-胺基丙基三乙氧矽烷、3-巰丙基三甲氧矽烷、乙烯基三甲氧矽烷、N-(2-(乙烯基苄基胺基)乙基)3-胺基丙基三甲氧矽烷鹽酸鹽(N-(2-(vinylbenzylamino)ethyl)3-aminopropyl trimethoxysilane hydrochloride)、3-甲基丙烯醯氧基丙基三甲氧矽烷、3-氯丙基甲基二甲氧矽烷、3-氯丙基三甲氧矽烷等矽烷系偶合劑;(N-乙基胺基乙基胺基)鈦酸異丙酯、三硬脂酸鈦酸異丙酯(isopropyl triisostearoyl titanate)、雙(焦磷酸二辛酯)氧乙酸鈦、雙(亞磷酸二辛酯)鈦酸四異丙酯、新烷氧基三(對-N-(β-胺基乙基)胺基苯基)鈦酸酯等鈦系偶合劑;乙醯丙酮酸鋯、甲基丙烯酸鋯、丙酸鋯、鋯酸新烷氧基酯、三新癸醯基鋯酸新烷氧基酯、三(十二碳醯基)苯磺醯基鋯酸新烷氧基酯、三(乙二胺基乙基)鋯酸新烷氧基酯、三(間胺基苯基)鋯酸新烷氧基酯、碳酸鋯銨、乙醯丙酮酸 鋁、甲基丙烯酸鋁、丙酸鋁等鋯或鋁系偶合劑等。 Examples of the coupling agent which can be used include 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxydecane, and 3-glycidoxypropylmethyldimethacrylate. Oxane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, N-(2-aminoethyl)3-aminopropylmethyldimethoxydecane, N-(2- Aminoethyl) 3-aminopropylmethyltrimethoxy decane, 3-aminopropyltriethoxy decane, 3-mercaptopropyltrimethoxy decane, vinyltrimethoxy decane, N-(2-(ethylene) N-(2-(vinylbenzylamino)ethyl) 3-aminopropyl trimethoxysilane hydrochloride, 3-methylpropenyloxypropyl trimethyl a decane coupling agent such as oxoxane, 3-chloropropylmethyldimethoxydecane or 3-chloropropyltrimethoxyoxane; (N-ethylaminoethylamino) isopropyl titanate, tristearyl Isopropyl triisostearoyl titanate, bis(dioctyl pyrophosphate) oxyacetate, bis(dioctyl phosphite) tetraisopropyl titanate, neoalkoxy tris(p-N-( a titanium-based coupling agent such as β-aminoethyl)aminophenyl) titanate; Ethylene zirconium pyruvate, zirconium methacrylate, zirconium propionate, neoalkoxy zirconate, neo-alkoxy neosyl zirconate, tris(dodecyl) benzenesulfonyl zirconate Neoalkoxy ester, neoalkoxy ester of tris(ethylenediamineethyl)zirconate, neoalkoxylate of tris(m-aminophenyl)zirconate, ammonium zirconium carbonate, acetoacetate A zirconium or aluminum coupling agent such as aluminum, aluminum methacrylate or aluminum propionate.

該等偶合劑可使用一種或混合兩種以上而使用。 These coupling agents may be used alone or in combination of two or more.

偶合劑係視需要於本發明之硬化樹脂組成物中通常含有0.05~20重量份,較佳為含有0.1~10重量份。 The coupling agent is usually contained in an amount of 0.05 to 20 parts by weight, preferably 0.1 to 10 parts by weight, based on the hardening resin composition of the present invention.

於本發明之硬化樹脂組成物中,藉由視需要使用奈米級水準之無機填充材料,可於不妨礙透明性之情況下補充機械強度等。就透明性之觀點而言,奈米級水準之標準較佳為使用平均粒徑為500 nm以下、尤佳為平均粒徑為200 nm以下之填充材料。作為無機填充劑,可列舉晶性矽石、熔融矽石、氧化鋁、鋯英石、矽酸鈣、碳酸鈣、碳化矽、氮化矽、氮化硼、氧化鋯、鎂橄欖石、塊滑石、尖晶石、氧化鈦、滑石等粉體或使該等球形化而成之珠粒等,但並不限定於該等。該等填充材料可單獨使用,亦可使用兩種以上。該等無機填充劑之含量係使用於本發明之硬化樹脂組成物中占0~95重量%之量。 In the cured resin composition of the present invention, by using an inorganic filler of a nanometer level as needed, mechanical strength and the like can be supplemented without impairing transparency. From the viewpoint of transparency, the standard of the nano level is preferably a filler having an average particle diameter of 500 nm or less, and particularly preferably an average particle diameter of 200 nm or less. Examples of the inorganic filler include crystalline vermiculite, molten vermiculite, alumina, zircon, calcium silicate, calcium carbonate, tantalum carbide, tantalum nitride, boron nitride, zirconium oxide, forsterite, and talc. A powder such as spinel, titanium oxide or talc, or a bead formed by spheroidizing or the like, but is not limited thereto. These filler materials may be used singly or in combination of two or more. The content of the inorganic filler is from 0 to 95% by weight based on the cured resin composition of the present invention.

於本發明之硬化樹脂組成物中,可視需要添加螢光體。螢光體例如係具有藉由吸收自藍色LED元件發出之藍色光之一部分並發出經波長轉換之黃色光而形成白色光之作用者。使螢光體預先分散於硬化樹脂組成物中,其後密封光半導體。作為螢光體,並無特別限制,可使用先前公知之螢光體,例如可例示稀土類元素之鋁酸鹽、硫代沒食子酸鹽、原矽酸鹽等。更具體而言,可列舉YAG螢光體、TAG螢光體、原矽酸酯螢光體、硫代鎵酸鹽螢光體、硫化物螢光體等螢光體,可例示YAlO3:Ce、Y3Al5O12:Ce、 Y4Al2O9:Ce、Y2O2S:Eu、Sr5(PO4)3Cl:Eu、(SrEu)O‧Al2O3等。作為該螢光體之粒徑,可使用於該領域中公知之粒徑,作為平均粒徑,通常為1~250 μm,尤佳為2~50 μm。於使用該等螢光體之情形時,其添加量相對於該樹脂成分100重量份,通常為1~80重量份,較佳為5~60重量份。 In the cured resin composition of the present invention, a phosphor may be added as needed. The phosphor has, for example, a function of forming white light by absorbing a portion of the blue light emitted from the blue LED element and emitting wavelength-converted yellow light. The phosphor is previously dispersed in the cured resin composition, and thereafter the photo-semiconductor is sealed. The phosphor is not particularly limited, and a conventionally known phosphor can be used, and examples thereof include an aluminate of a rare earth element, a thiogallate, an orthosilicate, and the like. More specifically, a phosphor such as a YAG phosphor, a TAG phosphor, a prophthalate phosphor, a thiogallate phosphor, or a sulfide phosphor can be exemplified, and YAlO 3 :Ce can be exemplified. Y 3 Al 5 O 12 :Ce, Y 4 Al 2 O 9 :Ce, Y 2 O 2 S:Eu, Sr 5 (PO 4 ) 3 Cl:Eu, (SrEu)O‧Al 2 O 3 or the like. As the particle diameter of the phosphor, the particle diameter known in the art can be used as the average particle diameter, and is usually from 1 to 250 μm, particularly preferably from 2 to 50 μm. In the case of using such a phosphor, the amount thereof is usually 1 to 80 parts by weight, preferably 5 to 60 parts by weight, per 100 parts by weight of the resin component.

為了防止各種螢光體於硬化時沈降,可於本發明之硬化樹脂組成物中添加以矽石細粉末(亦稱作aerosil或aerosol)為代表之搖變(thixotropes)性賦予劑。作為此種矽石細粉末,例如可列舉Aerosil 50、Aerosil 90、Aerosil 130、Aerosil 200、Aerosil 300、Aerosil 380、Aerosil OX50、Aerosil TT600、Aerosil R972、Aerosil R974、Aerosil R202、Aerosil R812、Aerosil R812S、Aerosil R805、RY200、RX200(日本Aerosil公司製造)等。 In order to prevent sedimentation of various phosphors upon hardening, a thixotropes imparting agent typified by a fine powder of vermiculite (also referred to as aerosil or aerosol) may be added to the cured resin composition of the present invention. As such fine powder of vermiculite, for example, Aerosil 50, Aerosil 90, Aerosil 130, Aerosil 200, Aerosil 300, Aerosil 380, Aerosil OX50, Aerosil TT600, Aerosil R972, Aerosil R974, Aerosil R202, Aerosil R812, Aerosil R812S, Aerosil R805, RY200, RX200 (manufactured by Japan Aerosil Co., Ltd.).

為了防止著色,於本發明之硬化樹脂組成物中,可含有作為光穩定劑之胺化合物、或作為抗氧化材料之磷系化合物及酚系化合物。 In order to prevent coloring, the cured resin composition of the present invention may contain an amine compound as a light stabilizer or a phosphorus compound and a phenol compound as an antioxidant.

作為上述胺化合物,例如可列舉:四(1,2,2,6,6-五甲基-4-哌啶基)-1,2,3,4-丁烷四甲酸酯、四(2,2,6,6-四甲基-4-哌啶基)-1,2,3,4-丁烷四甲酸酯、1,2,3,4-丁烷四甲酸與1,2,2,6,6-五甲基-4-哌啶醇及3,9-雙(2-羥基-1,1-二甲基乙基)-2,4,8,10-四氧螺[5,5]十一烷之混合酯化物,癸二酸雙(2,2,6,6-四甲基-4-哌啶基)癸二酸酯、雙(1-十一烷氧基-2,2,6,6-四甲基哌啶-4-基)碳酸酯、2,2,6,6-四甲基-4-哌啶基甲基丙烯酸酯、雙(2,2,6,6-四甲基-4-哌啶基)癸二酸酯、雙 (1,2,2,6,6-五甲基-4-哌啶基)癸二酸酯、4-苯甲醯氧基-2,2,6,6-四甲基哌啶、1-[2-[3-(3,5-二-第三丁基-4-羥基苯基)丙醯氧基]乙基]-4-[3-(3,5-二-第三丁基-4-羥基苯基)丙醯氧基]-2,2,6,6-四甲基哌啶、1,2,2,6,6-五甲基-4-哌啶基-甲基丙烯酸酯、雙(1,2,2,6,6-五甲基-4-哌啶基)[[3,5-雙(1,1-二甲基乙基)-4-羥基苯基]甲基]丁基丙二酸酯、癸二酸雙(2,2,6,6-四甲基-1-(辛氧基)-4-哌啶基)酯、1,1-二甲基乙基氫過氧化物與辛烷之反應產物,N,N',N",N"'-四-(4,6-雙-(丁基-(N-甲基-2,2,6,6-四甲基哌啶-4-基)胺基)-三-2-基)-4,7-二吖癸烷-1,10-二胺、二丁胺-1,3,5-三-N,N'-雙(2,2,6,6-四甲基-4-哌啶基-1,6-六亞甲基二胺與N-(2,2,6,6-四甲基-4-哌啶基)丁胺之聚縮合物,聚[[6-(1,1,3,3-四甲基丁基)胺基-1,3,5-三 -2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基[(2,2,6,6-四甲基-4-哌啶基)亞胺基]]、琥珀酸二甲酯與4-羥基-2,2,6,6-四甲基-1-哌啶乙醇之聚合物、2,2,4,4-四甲基-20-(β-月桂氧基羰基)乙基-7-氧雜-3,20-二吖二螺[5,1,11,2]二十一烷-21-酮、β-丙胺酸N-(2,2,6,6-四甲基-4-哌啶基)-十二烷基酯/十四烷基酯、N-乙醯基-3-十二烷基-1-(2,2,6,6-四甲基-4-哌啶基)吡咯啶-2,5-二酮、2,2,4,4-四甲基-7-氧雜-3,20-二吖二螺[5,1,11,2]二十一烷-21-酮、2,2,4,4-四甲基-21-氧雜-3,20-二吖二環-[5,1,11,2]-二十一烷-20-丙酸十二烷基酯/十四烷基酯、丙二酸[(4-甲氧基苯基)-亞甲基]-雙(1,2,2,6,6-五甲基-4-哌啶基)酯、2,2,6,6-四甲基-4-哌啶醇之高級脂肪酸酯、N,N'-雙(2,2,6,6-四甲基-4-哌啶基)-1,3-苯二 甲醯胺等受阻胺系、八苯酮等二苯甲酮系化合物、2-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)苯酚、2-(2-羥基-5-甲基苯基)苯并三唑、2-[2-羥基-3-(3,4,5,6-四氫鄰苯二甲醯亞胺-甲基)-5-甲基苯基]苯并三唑、2-(3-第三丁基-2-羥基-5-甲基苯基)-5-氯苯并三唑、2-(2-羥基-3,5-二-第三戊基苯基)苯并三唑、3-(3-(2H-苯并三唑-2-基)-5-第三丁基-4-羥基苯基)丙酸甲酯與聚乙二醇之反應產物、2-(2H-苯并三唑-2-基)-6-十二烷基-4-甲基苯酚等苯并三唑系化合物、2,4-二-第三丁基苯基-3,5-二-第三丁基-4-羥基苯甲酸酯等苯甲酸酯系、2-(4,6-二苯基-1,3,5-三-2-基)-5-[(己基)氧基]苯酚等三系化合物等,尤佳為受阻胺系化合物。 As the above amine compound, for example, tetrakis(1,2,2,6,6-pentamethyl-4-piperidinyl)-1,2,3,4-butane tetracarboxylate, tetrakis (2) can be mentioned. , 2,6,6-tetramethyl-4-piperidinyl-1,2,3,4-butane tetracarboxylate, 1,2,3,4-butanetetracarboxylic acid and 1,2, 2,6,6-pentamethyl-4-piperidinol and 3,9-bis(2-hydroxy-1,1-dimethylethyl)-2,4,8,10-tetraoxy Mixed ester of spiro[5,5]undecane, bis(2,2,6,6-tetramethyl-4-piperidinyl) sebacate, bis(1-undecyloxy) Base-2,2,6,6-tetramethylpiperidin-4-yl)carbonate, 2,2,6,6-tetramethyl-4-piperidyl methacrylate, bis (2,2 ,6,6-tetramethyl-4-piperidinyl) sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidyl)sebacate, 4-benzene Methoxyoxy-2,2,6,6-tetramethylpiperidine, 1-[2-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propenyloxy] Ethyl]-4-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propanoxy]-2,2,6,6-tetramethylpiperidine, 1,2 , 2,6,6-pentamethyl-4-piperidinyl-methacrylate, bis(1,2,2,6,6-pentamethyl-4-piperidinyl)[[3,5- Bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl]butylmalonate, bis(2,2,6,6-tetramethyl-1-(xin) Reaction product of oxy)-4-piperidinyl)ester, 1,1-dimethylethylhydroperoxide and octane, N,N',N",N"'-tetra-(4,6 - bis-(butyl-(N-methyl-2,2,6,6-tetramethylpiperidin-4-yl)amino)-three -2-yl)-4,7-dioxane-1,10-diamine, dibutylamine-1,3,5-three -N,N'-bis(2,2,6,6-tetramethyl-4-piperidinyl-1,6-hexamethylenediamine and N-(2,2,6,6-tetramethyl) Polycondensate of phenyl-4-piperidyl)butylamine, poly[[6-(1,1,3,3-tetramethylbutyl)amino-1,3,5-tri -2,4-diyl][(2,2,6,6-tetramethyl-4-piperidinyl)imido]hexamethylene[(2,2,6,6-tetramethyl- 4-piperidinyl)imido]], dimethyl succinate and 4-hydroxy-2,2,6,6-tetramethyl-1-piperidineethanol polymer, 2, 2, 4, 4 -tetramethyl-20-(β-lauroyloxycarbonyl)ethyl-7-oxa-3,20-dioxaspiro[5,1,11,2]icosane-21-one, β - N-(2,2,6,6-tetramethyl-4-piperidinyl)-dodecyl ester/tetradecyl acetate, N-ethyl decyl-3-dodecyl- 1-(2,2,6,6-tetramethyl-4-piperidinyl)pyrrolidine-2,5-dione, 2,2,4,4-tetramethyl-7-oxa-3, 20-dioxaspiro[5,1,11,2]icosane-21-one, 2,2,4,4-tetramethyl-21-oxa-3,20-dioxinbicyclo- [5,1,11,2]-docosane-20-propionic acid lauryl ester/tetradecyl ester, malonic acid [(4-methoxyphenyl)-methylene]- Bis(1,2,2,6,6-pentamethyl-4-piperidinyl) ester, higher fatty acid ester of 2,2,6,6-tetramethyl-4-piperidinol, N,N Hindered amines such as '-bis(2,2,6,6-tetramethyl-4-piperidyl)-1,3-benzenedimethylamine, benzophenone-based compounds such as benzophenone, 2- (2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol, 2-(2-hydroxy-5-methylphenyl)benzotriene Oxazole, 2-[2-hydroxy-3-(3,4,5,6-tetrahydrophthalimido-methyl)-5-methylphenyl]benzotriazole, 2-(3 -T-butyl-2-hydroxy-5-methylphenyl)-5-chlorobenzotriazole, 2-(2-hydroxy-3,5-di-third-pentylphenyl)benzotriazole , the reaction product of methyl 3-(3-(2H-benzotriazol-2-yl)-5-t-butyl-4-hydroxyphenyl)propanoate and polyethylene glycol, 2-(2H- Benzotriazole-based compound such as benzotriazol-2-yl)-6-dodecyl-4-methylphenol, 2,4-di-t-butylphenyl-3,5-di- Benzoate such as tributyl-4-hydroxybenzoate, 2-(4,6-diphenyl-1,3,5-three -2-yl)-5-[(hexyl)oxy]phenol, etc. A compound or the like is particularly preferably a hindered amine compound.

作為可作為上述光穩定材之胺化合物,可使用如下所示之市售品。 As the amine compound which can be used as the above-mentioned light stabilizer, a commercially available product as shown below can be used.

作為市售之胺系化合物,並無特別限定,例如可列舉:Ciba Specialty Chemicals製造之TINUVIN765、TINUVIN770DF、TINUVIN144、TINUVIN123、TINUVIN622LD、TINUVIN152、CHIMASSORB944,ADEKA製造之LA-52、LA-57、LA-62、LA-63P、LA-77Y、LA-81、LA-82、LA-87等。 The commercially available amine-based compound is not particularly limited, and examples thereof include TINUVIN 765, TINUVIN 770 DF, TINUVIN 144, TINUVIN 123, TINUVIN 622 LD, TINUVIN 152, CHIMASSO RB 944 manufactured by Ciba Specialty Chemicals, and LA-52, LA-57, LA-62 manufactured by ADEKA. , LA-63P, LA-77Y, LA-81, LA-82, LA-87, etc.

作為上述磷系化合物,並無特別限定,例如可列舉:1,1,3-三(2-甲基-4-二-亞磷酸十三烷酯-5-第三丁基苯基)丁烷(1,1,3-tris(2-methyl-4-ditridecylphosphite-5-t-butylphenyl)butane)、二硬脂新戊四醇二亞磷酸酯、雙(2,4-二-第三丁基苯基)新戊四醇二亞磷酸酯、雙(2,6-二-第三丁基-4-甲 苯基)新戊四醇二亞磷酸酯、苯基雙酚A新戊四醇二亞磷酸酯、二環己基新戊四醇二亞磷酸酯、三(二乙基苯基)亞磷酸酯、三(二-異丙基苯基)亞磷酸酯、三(二-正丁基苯基)亞磷酸酯、三(2,4-二-第三丁基苯基)亞磷酸酯、三(2,6-二-第三丁基苯基)亞磷酸酯、三(2,6-二-第三丁基苯基)亞磷酸酯、2,2'-亞甲基雙(4,6-二-第三丁基苯基)(2,4-二-第三丁基苯基)亞磷酸酯、2,2'-亞甲基雙(4,6-二-第三丁基苯基)(2-第三丁基-4-甲基苯基)亞磷酸酯、2,2'-亞甲基雙(4-甲基-6-第三丁基苯基)(2-第三丁基-4-甲基苯基)亞磷酸酯、2,2'-亞乙基雙(4-甲基-6-第三丁基苯基)(2-第三丁基-4-甲基苯基)亞磷酸酯、四(2,4-二-第三丁基苯基)-4,4'-伸聯苯二亞膦酸酯、四(2,4-二-第三丁基苯基)-4,3'-伸聯苯二亞膦酸酯、四(2,4-二-第三丁基苯基)-3,3'-伸聯苯二亞膦酸酯、四(2,6-二-第三丁基苯基)-4,4'-伸聯苯二亞膦酸酯、四(2,6-二-第三丁基苯基)-4,3'-伸聯苯二亞膦酸酯、四(2,6-二-第三丁基苯基)-3,3'-伸聯苯二亞膦酸酯、雙(2,4-二-第三丁基苯基)-4-苯基-苯基亞膦酸酯、雙(2,4-二-第三丁基苯基)-3-苯基-苯基亞膦酸酯、雙(2,6-二-正丁基苯基)-3-苯基-苯基亞膦酸酯、雙(2,6-二-第三丁基苯基)-4-苯基-苯基亞膦酸酯、雙(2,6-二-第三丁基苯基)-3-苯基-苯基亞膦酸酯、四(2,4-二-第三丁基-5-甲基苯基)-4,4'-伸聯苯二亞膦酸酯、磷酸三丁酯、磷酸三甲酯、磷酸三甲苯酯、磷酸三苯酯、磷酸三氯苯酯、磷酸三乙酯、磷酸甲酚基二苯酯(diphenyl cresyl phosphate)、磷酸單鄰聯苯基二苯基酯(diphenyl monoorthoxenyl phosphate)、磷酸三丁氧 基乙酯、磷酸二丁酯、磷酸二辛酯、磷酸二異丙酯等。 The phosphorus compound is not particularly limited, and examples thereof include 1,1,3-tris(2-methyl-4-di-phosphite tridecyl-5-t-butylphenyl)butane. (1,1,3-tris(2-methyl-4-ditridecylphosphite-5-t-butylphenyl)butane), distearyl pentaerythritol diphosphite, bis(2,4-di-t-butyl Phenyl) pentaerythritol diphosphite, bis(2,6-di-t-butyl-4-methyl Phenyl) pentaerythritol diphosphite, phenyl bisphenol A neopentyl alcohol diphosphite, dicyclohexyl neopentyl alcohol diphosphite, tris(diethylphenyl) phosphite, Tris(di-isopropylphenyl)phosphite, tris(di-n-butylphenyl)phosphite, tris(2,4-di-t-butylphenyl)phosphite, tris(2) ,6-di-t-butylphenyl)phosphite, tris(2,6-di-t-butylphenyl)phosphite, 2,2'-methylenebis(4,6-di -T-butylphenyl)(2,4-di-t-butylphenyl)phosphite, 2,2'-methylenebis(4,6-di-t-butylphenyl) ( 2-tert-butyl-4-methylphenyl)phosphite, 2,2'-methylenebis(4-methyl-6-t-butylphenyl) (2-tert-butyl- 4-methylphenyl)phosphite, 2,2'-ethylenebis(4-methyl-6-tert-butylphenyl)(2-tert-butyl-4-methylphenyl) Phosphite, tetrakis(2,4-di-t-butylphenyl)-4,4'-extended biphenylphosphonate, tetrakis(2,4-di-t-butylphenyl)- 4,3'-Extended biphenyl diphosphinate, tetrakis(2,4-di-t-butylphenyl)-3,3'-extended biphenylphosphonate, tetrakis (2,6- Di-t-butylphenyl)-4,4'-extended biphenylphosphonate, tetra ( 2,6-di-t-butylphenyl)-4,3'-extended biphenylphosphonate, tetrakis(2,6-di-t-butylphenyl)-3,3'- Biphenyl diphosphinate, bis(2,4-di-t-butylphenyl)-4-phenyl-phenylphosphinate, bis(2,4-di-t-butylphenyl) )-3-phenyl-phenylphosphinate, bis(2,6-di-n-butylphenyl)-3-phenyl-phenylphosphinate, bis(2,6-di- Tributylphenyl)-4-phenyl-phenylphosphinate, bis(2,6-di-t-butylphenyl)-3-phenyl-phenylphosphinate, tetra(2) ,4-di-t-butyl-5-methylphenyl)-4,4'-extended biphenylphosphonate, tributyl phosphate, trimethyl phosphate, tricresyl phosphate, triphenyl phosphate Ester, trichlorophenyl phosphate, triethyl phosphate, diphenyl cresyl phosphate, diphenyl monoorthoxyl phosphate, tributyl phosphate Ethyl ethyl ester, dibutyl phosphate, dioctyl phosphate, diisopropyl phosphate, and the like.

上述磷系化合物亦可使用市售品。作為市售之磷系化合物,並無特別限定,例如可列舉:ADEKA製造之Adekastab PEP-4C、Adekastab PEP-8、Adekastab PEP-24G、Adekastab PEP-36、Adekastab HP-10、Adekastab 2112、Adekastab 260、Adekastab 522A、Adekastab 1778、Adekastab 1500、Adekastab C、Adekastab 135A、Adekastab 3010、Adekastab TPP等。 Commercially available products can also be used as the phosphorus compound. The commercially available phosphorus-based compound is not particularly limited, and examples thereof include Adekastab PEP-4C, Adekastab PEP-8, Adekastab PEP-24G, Adekastab PEP-36, Adekastab HP-10, Adekastab 2112, and Adekastab 260 manufactured by ADEKA. Adekastab 522A, Adekastab 1778, Adekastab 1500, Adekastab C, Adekastab 135A, Adekastab 3010, Adekastab TPP, and the like.

作為酚化合物,並無特別限定,例如可列舉:2,6-二-第三丁基-4-甲基苯酚、正十八烷基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯、四[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、2,4-二-第三丁基-6-甲基苯酚、1,6-己二醇-雙-[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、三(3,5-二-第三丁基-4-羥基苄基)-異三聚氰酸酯、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、新戊四醇-四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、3,9-雙-[2-[3-(3-第三丁基-4-羥基-5-甲基苯基)-丙醯氧基]-1,1-二甲基乙基]-2,4,8,10-四氧螺[5,5]十一烷、三乙二醇-雙[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]、2,2'-亞丁基雙(4,6-二-第三丁基苯酚)、4,4'-亞丁基雙(3-甲基-6-第三丁基苯酚)、2,2'-亞甲基雙(4-甲基-6-第三丁基苯酚)、2,2'-亞甲基雙(4-乙基-6-第三丁基苯酚)、2-第三丁基-6-(3-第三丁基-2-羥基-5-甲基苄基)-4-甲基苯酚丙烯酸酯、2-[1-(2-羥基-3,5-二-第三戊基苯基)乙基]-4,6-二-第三戊基苯基丙烯酸酯、4,4'-硫代雙(3-甲 基-6-第三丁基苯酚)、4,4'-亞丁基雙(3-甲基-6-第三丁基苯酚)、2-第三丁基-4-甲基苯酚、2,4-二-第三丁基苯酚、2,4-二-第三戊基苯酚、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)、4,4'-亞丁基雙(3-甲基-6-第三丁基苯酚)、雙-[3,3-雙-(4'-羥基-3'-第三丁基苯基)-丁酸]-二醇酯、2,4-二-第三丁基苯酚、2,4-二-第三戊基苯酚、2-[1-(2-羥基-3,5-二-第三戊基苯基)乙基]-4,6-二-第三戊基苯基丙烯酸酯、雙-[3,3-雙-(4'-羥基-3'-第三丁基苯基)-丁酸]-二醇酯等。 The phenol compound is not particularly limited, and examples thereof include 2,6-di-tert-butyl-4-methylphenol and n-octadecyl-3-(3,5-di-t-butyl- 4-hydroxyphenyl)propionate, tetrakis[methylene-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate]methane, 2,4-di-third Butyl-6-methylphenol, 1,6-hexanediol-bis-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], three (3,5) -di-t-butyl-4-hydroxybenzyl)-isocyanate, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl -4-hydroxybenzyl)benzene, pentaerythritol-tetrakis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 3,9-bis-[2- [3-(3-Tertibutyl-4-hydroxy-5-methylphenyl)-propenyloxy]-1,1-dimethylethyl]-2,4,8,10-tetraoxy Spiro[5,5]undecane, triethylene glycol-bis[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate], 2,2'-butylene Bis(4,6-di-tert-butylphenol), 4,4'-butylene bis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4- Methyl-6-tert-butylphenol), 2,2'-methylenebis(4-ethyl-6-tert-butylphenol), 2-tert-butyl-6-(3-third Butyl-2-hydroxy-5-methylbenzyl)-4-methylphenol acrylate, 2-[1-(2-hydroxy-3,5-di-p-pentylphenyl)ethyl]- 4,6-di-third amyl phenyl acrylate, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 4,4'-butylene bis(3-甲Base-6-tert-butylphenol), 2-tert-butyl-4-methylphenol, 2,4-di-tert-butylphenol, 2,4-di-p-pentylphenol, 4, 4'-thiobis(3-methyl-6-tert-butylphenol), 4,4'-butylene bis(3-methyl-6-tert-butylphenol), bis-[3,3 - bis-(4'-hydroxy-3'-tert-butylphenyl)-butyric acid]-glycol ester, 2,4-di-tert-butylphenol, 2,4-di-third pentyl Phenol, 2-[1-(2-hydroxy-3,5-di-third-pentylphenyl)ethyl]-4,6-di-third-pentyl phenyl acrylate, bis-[3,3 -bis-(4'-hydroxy-3 '-Tertiary butylphenyl)-butyric acid]-diol ester and the like.

上述酚系化合物亦可使用市售品。作為市售之酚系化合物,並無特別限定,例如可列舉:Ciba Specialty Chemicals製造之IRGANOX1010、IRGANOX1035、IRGANOX1076、IRGANOX1135、IRGANOX245、IRGANOX259、IRGANOX295、IRGANOX3114、IRGANOX1098、IRGANOX1520L,ADEKA製造之Adekastab AO-20、Adekastab AO-30、Adekastab AO-40、Adekastab AO-50、Adekastab AO-60、Adekastab AO-70、Adekastab AO-80、Adekastab AO-90、Adekastab AO-330,住友化學工業製造之SumiliZer GA-80、Sumilizer MDP-S、Sumilizer BBM-S、Sumilizer GM、Sumilizer GS(F)、Sumilizer GP等。 Commercially available products can also be used as the phenolic compound. The commercially available phenolic compound is not particularly limited, and examples thereof include IRGANOX 1010, IRGANOX 1035, IRGANOX 1076, IRGANOX 1135, IRGANOX 245, IRGANOX 259, IRGANOX 295, IRGANOX 3114, IRGANOX 1098, IRGANOX 1520 L, manufactured by Ciba Specialty Chemicals, and Adekastab AO-20 manufactured by ADEKA. Adekastab AO-30, Adekastab AO-40, Adekastab AO-50, Adekastab AO-60, Adekastab AO-70, Adekastab AO-80, Adekastab AO-90, Adekastab AO-330, SumiliZer GA-80, manufactured by Sumitomo Chemical Industries, Sumilizer MDP-S, Sumilizer BBM-S, Sumilizer GM, Sumilizer GS (F), Sumilizer GP, etc.

其中,作為樹脂之著色防止劑,可使用市售之添加材料。例如可列舉Ciba Specialty Chemicals製造之THINUVIN328、THINUVIN234、THINUVIN326、THINUVIN120、THINUVIN477、THINUVIN479、CHIMASSORB2020FDL、CHIMASSORB119FL等。 Among them, commercially available additive materials can be used as the coloring preventive agent for the resin. For example, THINUVIN 328, THINUVIN 234, THINUVIN 326, THINUVIN 120, THINUVIN 477, THINUVIN 479, CHIMASSO RB 2020 FDL, CHIMASSO RB FF, and the like manufactured by Ciba Specialty Chemicals can be cited.

較佳為含有上述磷系化合物、胺化合物、酚系化合物中之至少一種以上,其調配量並無特別限定,相對於本發明之硬化樹脂組成物之全部重量,為0.005~5.0重量%之範圍。 At least one or more of the phosphorus compound, the amine compound, and the phenol compound are preferably contained, and the amount thereof is not particularly limited, and is 0.005 to 5.0% by weight based on the total weight of the cured resin composition of the present invention. .

本發明之硬化樹脂組成物可藉由將熔點為40~200℃之硬化觸媒、環氧樹脂、環氧樹脂硬化劑、偶合劑、抗氧化劑、光穩定劑等添加物充分混合而製備硬化樹脂組成物,作為密封材料而使用。作為混合方法,可使用捏合機、三輥研磨機、萬能混合機、行星式混合機、均質混合機、均質分散機、珠磨機等,於常溫下或加熱條件下混合。 The hardened resin composition of the present invention can be prepared by sufficiently mixing an additive such as a hardening catalyst having a melting point of 40 to 200 ° C, an epoxy resin, an epoxy resin hardener, a coupling agent, an antioxidant, and a light stabilizer. The composition is used as a sealing material. As the mixing method, a kneader, a three-roll mill, a universal mixer, a planetary mixer, a homomixer, a homodisperser, a bead mill, or the like can be used, and it can be mixed at normal temperature or under heating conditions.

高亮度白色LED等光半導體元件通常係使用接著劑(晶片接合材料)使積層於藍寶石、尖晶石、SiC、Si、ZnO等基板上之GaAs、GaP、GaAlAs、GaAsP、AIGa、InP、GaN、InN、AlN、InGaN等半導體晶片接著於引線框架或放熱板、封裝體上而成。為了使電流流通,亦存在連接有金線等引線之類型。為了使該半導體晶片避免熱或濕氣之損害且發揮透鏡功能之作用而利用環氧樹脂等密封材料將其密封。本發明之硬化樹脂組成物可用於該密封材料。 Optical semiconductor elements such as high-brightness white LEDs are usually laminated on GaAs, GaP, GaAlAs, GaAsP, AIGa, InP, GaN, etc. on a substrate such as sapphire, spinel, SiC, Si, or ZnO using an adhesive (wafer bonding material). A semiconductor wafer such as InN, AlN, or InGaN is formed on a lead frame, a heat release plate, or a package. In order to circulate current, there is also a type in which a lead wire such as a gold wire is connected. In order to prevent the semiconductor wafer from being damaged by heat or moisture and functioning as a lens, it is sealed with a sealing material such as an epoxy resin. The hardened resin composition of the present invention can be used for the sealing material.

作為密封材料之成形方法,可使用:於插入固定有光半導體元件之基板之模框內注入密封材料後進行加熱硬化而成形之注入方法;於模具上預先注入密封材料,使固定於基板上之光半導體元件浸漬於其中並進行加熱硬化後,自模具脫模之壓縮成形方法等。 As a method of forming the sealing material, an injection method in which a sealing material is injected into a mold frame in which a substrate on which an optical semiconductor element is fixed is inserted and then heat-hardened and formed is formed; a sealing material is preliminarily injected onto the mold to be fixed on the substrate. A compression molding method in which an optical semiconductor element is immersed therein and heat-hardened, and then released from a mold.

作為注入方法,可列舉分注法等。 As the injection method, a dispensing method or the like can be cited.

加熱可使用熱風循環式、紅外線、高頻等方法。加熱條件例如較佳為80~230℃、1分鐘~24小時左右。為了降低加熱硬化時產生之內部應力,例如可於80~120℃下進行30分鐘~5小時之預硬化後,於120~180℃、30分鐘~10小時之條件下進行後續硬化。 For heating, a hot air circulation type, an infrared ray, a high frequency, or the like can be used. The heating conditions are, for example, preferably from 80 to 230 ° C for about 1 minute to 24 hours. In order to reduce the internal stress generated during heat hardening, for example, pre-hardening may be carried out at 80 to 120 ° C for 30 minutes to 5 hours, and then subsequent hardening may be carried out at 120 to 180 ° C for 30 minutes to 10 hours.

於本說明書中,比率、百分比、份等,只要無特別說明,則為基於重量者。於本說明書中,「X~Y」之表述係表示自X至Y為止之範圍,該範圍包括X、Y。 In the present specification, the ratio, the percentage, the portion, and the like are based on the weight unless otherwise specified. In the present specification, the expression "X~Y" means a range from X to Y, and the range includes X and Y.

實施例 Example

以下,藉由合成例、實施例對本發明進行更詳細地說明。再者,本發明並不限定於該等合成例、實施例。再者,合成例中之各物性值係利用以下之方法而測定。 Hereinafter, the present invention will be described in more detail by way of Synthesis Examples and Examples. Furthermore, the present invention is not limited to the above-described synthesis examples and examples. Further, each physical property value in the synthesis example was measured by the following method.

○重量平均分子量:算出利用GPC法於下述條件下測得之經聚苯乙烯換算之重量平均分子量。 ○ Weight average molecular weight: The weight average molecular weight in terms of polystyrene measured by the GPC method under the following conditions was calculated.

GPC之各種條件 Various conditions of GPC

製造商:島津製作所 Manufacturer: Shimadzu Manufacturing Co., Ltd.

管柱:保護管柱SHODEX GPC LF-G LF-804(3根) Pipe column: protection column SHODEX GPC LF-G LF-804 (3 roots)

流速:1.0 ml/min Flow rate: 1.0 ml/min

管柱溫度:40℃ Column temperature: 40 ° C

使用溶劑:THF(四氫呋喃) Solvent: THF (tetrahydrofuran)

檢測器:RI(示差折射率檢測器) Detector: RI (differential refractive index detector)

○環氧當量:利用於JIS K-7236中所記載之方法測定。 ○ Epoxy equivalent: measured by the method described in JIS K-7236.

○酸值:利用於JIS K-2501中所記載之方法測定。 ○ Acid value: It was measured by the method described in JIS K-2501.

○黏度:於25℃下使用E型黏度計測定。 ○ Viscosity: Measured at 25 ° C using an E-type viscometer.

合成例1(經由2階段之製造步驟而製造矽烷醇基末端矽油(e)與含環氧基之矽化物(f)的聚矽氧骨架環氧樹脂(B)之合成例) Synthesis Example 1 (Synthesis Example of Polyaroxy Oxide Skeleton Epoxy Resin (B) Producing Cerium Alkenyl Terminal Emu Oil (e) and Epoxy Group Containing Telluride (f) via a Two-Step Manufacturing Process)

(製造步驟1) (manufacturing step 1)

於反應容器中添加2-(3,4-環氧基環己基)乙基三甲氧矽烷394份、分子量1700(GPC測定值)之具有矽烷醇基之聚二甲基二苯基矽氧烷(相對於甲基1莫耳,具有0.18莫耳苯基)475份、0.5%KOH甲醇溶液4份、異丙醇36份,升溫至75℃。升溫後,於回流下反應10小時。 394 parts of 2-(3,4-epoxycyclohexyl)ethyltrimethoxy decane and a dimethylol diphenyl decane having a stanol group having a molecular weight of 1,700 (GPC measured value) were added to the reaction vessel. There were 475 parts of 0.18 moles of phenyl group, 4 parts of a 0.5% KOH methanol solution, and 36 parts of isopropyl alcohol with respect to methyl 1 molar, and the temperature was raised to 75 °C. After the temperature was raised, the reaction was carried out under reflux for 10 hours.

(製造步驟2) (manufacturing step 2)

追加甲醇656份後,歷經60分鐘滴加50%蒸餾水甲醇溶液172.8份,於回流下進一步反應10小時。 After adding 656 parts of methanol, 172.8 parts of a 50% distilled water methanol solution was added dropwise over 60 minutes, and further reacted under reflux for 10 hours.

反應結束後,藉由5%磷酸一氫鈉水溶液中和,其後於80℃下進行甲醇之蒸餾回收。其後,為了進行清洗而於添加MIBK 780份後反覆水洗3次。繼而,藉由於減壓下在100℃下去除有機相之溶劑而獲得聚矽氧骨架環氧樹脂(B-1)731份。所得之樹脂之環氧當量為491 g/eq,重量平均分子量為2090,黏度為3530 mPa‧s,外觀為無色透明之液狀。 After completion of the reaction, it was neutralized by a 5% aqueous solution of sodium hydrogen monophosphate, and then methanol was recovered by distillation at 80 °C. Thereafter, 780 parts of MIBK was added for washing, and then washed with water three times. Then, 731 parts of the polyfluorene skeleton epoxy resin (B-1) was obtained by removing the solvent of the organic phase at 100 ° C under reduced pressure. The obtained resin had an epoxy equivalent of 491 g/eq, a weight average molecular weight of 2090, a viscosity of 3530 mPa·s, and a colorless transparent liquid.

合成例2(經由2階段之製造步驟而製造矽烷醇基末端之矽油(e)與含環氧基之矽化物(f)的聚矽氧骨架環氧樹脂(B)之合成例) Synthesis Example 2 (Synthesis example of a polyfluorene skeleton epoxy resin (B) which produces a decyl alcohol group-terminated eucalyptus oil (e) and an epoxy group-containing hydrazine compound (f) via a two-stage production step)

(製造步驟1) (manufacturing step 1)

於反應容器中添加2-(3,4-環氧基環己基)乙基三甲氧矽 烷444份、分子量1700(GPC測定值)之具有矽烷醇基之聚二甲基二苯基矽氧烷(相對於甲基1莫耳,具有0.18莫耳苯基)400份、0.5%KOH甲醇溶液3.6份、異丙醇32.4份,升溫至75℃。升溫後,於回流下反應10小時。 Add 2-(3,4-epoxycyclohexyl)ethyltrimethoxine to the reaction vessel 444 parts of alkane having a molecular weight of 1700 (GPC measured value) of dimethylol diphenyl decane having a decyl alcohol group (having 0.18 moles of phenyl groups relative to methyl 1 molar) 400 parts, 0.5% KOH methanol The solution was 3.6 parts, 32.4 parts of isopropyl alcohol, and the temperature was raised to 75 °C. After the temperature was raised, the reaction was carried out under reflux for 10 hours.

(製造步驟2) (manufacturing step 2)

追加甲醇480份後,歷經60分鐘滴加50%蒸餾水甲醇溶液194.4份,於回流下進一步反應10小時。 After adding 480 parts of methanol, 194.4 parts of a 50% distilled water methanol solution was added dropwise over 60 minutes, and further reacted under reflux for 10 hours.

反應結束後,藉由5%磷酸一氫鈉水溶液中和,其後於80℃下進行甲醇之蒸餾回收。其後,為了進行清洗而於添加MIBK 724份後反覆水洗3次。繼而,藉由於減壓下在100℃下去除有機相之溶劑而獲得聚矽氧骨架環氧樹脂(B-2)658份。所得之樹脂之環氧當量為410 g/eq,重量平均分子量為2713,黏度為15680 mPa‧s,外觀為無色透明之液狀。 After completion of the reaction, it was neutralized by a 5% aqueous solution of sodium hydrogen monophosphate, and then methanol was recovered by distillation at 80 °C. Thereafter, 724 parts of MIBK was added for washing, and then washed three times with water. Then, 658 parts of the polyfluorene skeleton epoxy resin (B-2) was obtained by removing the solvent of the organic phase at 100 ° C under reduced pressure. The obtained resin had an epoxy equivalent of 410 g/eq, a weight average molecular weight of 2713, a viscosity of 15680 mPa·s, and a colorless transparent liquid.

合成例3(藉由使兩末端甲醇改質之矽油(a)、末端醇聚酯化合物(b)、分子內具有兩個以上羧酸酐基之化合物(c)及分子內具有一個羧酸酐基之化合物(d)進行加成反應而獲得之多元羧酸樹脂(A)之合成例) Synthesis Example 3 (an oil (a) modified with both ends of methanol, a terminal alcohol polyester compound (b), a compound (c) having two or more carboxylic acid anhydride groups in the molecule, and a carboxylic anhydride group in the molecule Synthesis Example of Polycarboxylic Acid Resin (A) Obtained by Addition Reaction of Compound (d)

於設置有攪拌裝置、戴氏冷凝器、溫度計之玻璃製分離式燒瓶中添加兩末端甲醇改質之矽氧X22-160AS(信越化學工業(股)製造)47.1份、作為聚酯多元醇之ADEKA NEWACE Y9-10(ADEKA(股)製造,上述式(2)中R3為伸新戊基且R4為伸丁基之聚酯多元醇)11.8份、RIKACID BT-100(1,2,3,4-丁烷四甲酸二酐,新日本理化(股)製造) 2.5份、RIKACID MH(甲基六氫鄰苯二甲酸酐,新日本理化(股)製造)16.6份,於140℃下反應10小時而獲得多元羧酸樹脂(A-1)77.5份。此時,於GPC測定中,RIKACID BT-100及RIKACID MH之波峰消失。該多元羧酸樹脂於反應結束時為無色透明之液體,但隨著反應液之溫度下降而成為白濁之液體。所得之化合物之酸值為88.8 mgKOH/g,重量平均分子量為3452,黏度為5730 mPa‧S,外觀為白色液體之液狀。 Adding 47.1 parts of Xenon X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.), which is modified with methanol at both ends, to a glass separation flask equipped with a stirring device, a Dairy condenser, and a thermometer, ADEKA as a polyester polyol. NEWACE Y9-10 (ADEKA (shares) manufactured by the above formula (2) wherein R 3 is a neopentyl group extending and R 4 is butyl extension of the polyester polyol) 11.8 parts, RIKACID BT-100 (1,2,3 , 4-butane tetracarboxylic dianhydride, manufactured by Nippon Chemical and Chemical Co., Ltd.) 2.5 parts, RIKACID MH (methylhexahydrophthalic anhydride, manufactured by Nippon Chemical and Chemical Co., Ltd.), 16.6 parts, reacted at 140 ° C 77.5 parts of the polycarboxylic acid resin (A-1) was obtained in 10 hours. At this time, the peaks of RIKACID BT-100 and RIKACID MH disappeared in the GPC measurement. The polycarboxylic acid resin is a colorless and transparent liquid at the end of the reaction, but becomes a cloudy liquid as the temperature of the reaction liquid drops. The obtained compound had an acid value of 88.8 mgKOH/g, a weight average molecular weight of 3452, a viscosity of 5730 mPa·s, and a white liquid appearance.

合成例4 Synthesis Example 4

(藉由使兩末端甲醇改質之矽油(a)、烴多元醇化合物(j)及分子內具有兩個以上羧酸酐基之化合物(c)進行加成反應而獲得之多元羧酸樹脂(A)之合成例) (Polycarboxylic acid resin obtained by addition reaction of eucalyptus oil (a) having a two-terminal methanol modification, a hydrocarbon polyol compound (j), and a compound (c) having two or more carboxylic acid anhydride groups in the molecule (A) Synthesis example)

於設置有攪拌裝置、戴氏冷凝器、溫度計之玻璃製分離式燒瓶中添加兩末端甲醇改質之矽氧X22-160AS(信越化學工業(股)製造)589份、作為烴多元醇化合物之三環癸烷二甲醇74份、RIKACID MH(甲基六氫鄰苯二甲酸酐,新日本理化(股)製造)337份,於90℃下反應10小時而獲得多元羧酸樹脂(A-2)份。此時,於GPC測定中,RIKACID MH之波峰消失。所得之化合物之酸值為111.1 mgKOH/g,重量平均分子量為1216,黏度為7870 mPa‧s,外觀為無色透明之液狀。 Adding 589 parts of Xenon X22-160AS (manufactured by Shin-Etsu Chemical Co., Ltd.), which is modified with methanol at both ends, to a glass separation flask equipped with a stirring device, a Dairy condenser, and a thermometer, as a hydrocarbon polyol compound 74 parts of cyclodecane dimethanol, 337 parts of RIKACID MH (methylhexahydrophthalic anhydride, manufactured by Nippon Chemical and Chemical Co., Ltd.), and reacted at 90 ° C for 10 hours to obtain a polycarboxylic acid resin (A-2) Share. At this time, the peak of RIKACID MH disappeared in the GPC measurement. The obtained compound had an acid value of 111.1 mgKOH/g, a weight average molecular weight of 1216, a viscosity of 7,870 mPa·s, and a colorless transparent liquid.

實施例1 Example 1

添加合成例1中所獲得之聚矽氧骨架環氧樹脂(B-1)40份、合成例2中所獲得之聚矽氧骨架環氧樹脂(B-2)60 份、ERL-4221(3,4-環氧基環己基甲基-(3,4-環氧基)環己基羧酸酯,Dow Chemical製造)5份、作為環氧樹脂硬化劑之合成例3中所獲得之多元羧酸樹脂(A-1)72.4份、作為硬化觸媒之硬脂酸鋅(熔點120~126℃)1.1份,將該等混合並進行5分鐘脫泡而獲得本發明之光半導體密封用硬化樹脂組成物。 40 parts of the polyfluorene skeleton epoxy resin (B-1) obtained in Synthesis Example 1 and the polyfluorene skeleton skeleton epoxy resin (B-2) 60 obtained in Synthesis Example 2 were added. Part, ERL-4221 (3,4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexylcarboxylate, manufactured by Dow Chemical) 5 parts, Synthesis Example 3 as an epoxy resin hardener 72.4 parts of the polycarboxylic acid resin (A-1) obtained in the above, 1.1 parts of zinc stearate (melting point: 120 to 126 ° C) as a curing catalyst, and these were mixed and defoamed for 5 minutes to obtain the present invention. A cured resin composition for optical semiconductor sealing.

實施例2 Example 2

添加合成例1中所獲得之聚矽氧骨架環氧樹脂(B-1)40份、合成例2中所獲得之聚矽氧骨架環氧樹脂(B-2)60份、ERL-4221(3,4-環氧基環己基甲基-(3,4-環氧基)環己基羧酸酯,Dow Chemical製造)5份、作為環氧樹脂硬化劑之合成例3中所獲得之多元羧酸樹脂(A-1)72.4份、作為硬化觸媒之十一碳烯酸鋅(熔點115~125℃)1.1份,將該等混合並進行5分鐘脫泡而獲得本發明之光半導體密封用硬化樹脂組成物。 40 parts of the polyfluorene skeleton epoxy resin (B-1) obtained in Synthesis Example 1 and 60 parts of the polyfluorene skeleton epoxy resin (B-2) obtained in Synthesis Example 2 were added, and ERL-4221 (3) was added. , 4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexylcarboxylate (manufactured by Dow Chemical) 5 parts, a polycarboxylic acid obtained in Synthesis Example 3 as an epoxy resin hardener 72.4 parts of the resin (A-1) and 1.1 parts of zinc undecylenate (melting point: 115 to 125 ° C) as a curing catalyst, and these were mixed and defoamed for 5 minutes to obtain the hardening of the optical semiconductor sealing of the present invention. Resin composition.

實施例3 Example 3

添加合成例1中所獲得之聚矽氧骨架環氧樹脂(B-1)40份、合成例2中所獲得之聚矽氧骨架環氧樹脂(B-2)60份、ERL-4221(3,4-環氧基環己基甲基-(3,4-環氧基)環己基羧酸酯,Dow Chemical製造)5份、作為環氧樹脂硬化劑之合成例3中所獲得之多元羧酸樹脂(A-1)72.4份、作為硬化觸媒之12-羥基硬脂酸鋅(熔點145~155℃)1.6份,將該等混合並進行5分鐘脫泡而獲得本發明之光半導體密封用硬化樹脂組成物。 40 parts of the polyfluorene skeleton epoxy resin (B-1) obtained in Synthesis Example 1 and 60 parts of the polyfluorene skeleton epoxy resin (B-2) obtained in Synthesis Example 2 were added, and ERL-4221 (3) was added. , 4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexylcarboxylate (manufactured by Dow Chemical) 5 parts, a polycarboxylic acid obtained in Synthesis Example 3 as an epoxy resin hardener 72.4 parts of the resin (A-1) and 1.6 parts of zinc 12-hydroxystearate (melting point 145 to 155 ° C) as a curing catalyst, and these were mixed and defoamed for 5 minutes to obtain the optical semiconductor sealing of the present invention. Hardened resin composition.

實施例4 Example 4

添加合成例1中所獲得之聚矽氧骨架環氧樹脂(B-1)40份、合成例2中所獲得之聚矽氧骨架環氧樹脂(B-2)60份、ERL-4221(3,4-環氧基環己基甲基-(3,4-環氧基)環己基羧酸酯,Dow Chemical製造)5份、作為環氧樹脂硬化劑之合成例3中所獲得之多元羧酸樹脂(A-1)72.4份、作為硬化觸媒之12-羥基硬脂酸鋅(熔點145~155℃)1.1份,將該等混合並進行5分鐘脫泡而獲得本發明之光半導體密封用硬化樹脂組成物。 40 parts of the polyfluorene skeleton epoxy resin (B-1) obtained in Synthesis Example 1 and 60 parts of the polyfluorene skeleton epoxy resin (B-2) obtained in Synthesis Example 2 were added, and ERL-4221 (3) was added. , 4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexylcarboxylate (manufactured by Dow Chemical) 5 parts, a polycarboxylic acid obtained in Synthesis Example 3 as an epoxy resin hardener 72.4 parts of the resin (A-1) and 1.1 parts of zinc 12-hydroxystearate (melting point: 145 to 155 ° C) as a curing catalyst, and these were mixed and defoamed for 5 minutes to obtain the optical semiconductor sealing of the present invention. Hardened resin composition.

實施例5 Example 5

添加合成例2中所獲得之聚矽氧骨架環氧樹脂(B-2)60份、ERL-4221(3,4-環氧基環己基甲基-(3,4-環氧基)環己基羧酸酯,Dow Chemical製造)5份、作為環氧樹脂硬化劑之合成例4中所獲得之多元羧酸樹脂(A-2)59.9份、作為硬化觸媒之硬脂酸鋅(熔點120~126℃)1.1份,將該等混合並進行5分鐘脫泡而獲得本發明之光半導體密封用硬化樹脂組成物。 60 parts of the polyfluorene skeleton epoxy resin (B-2) obtained in Synthesis Example 2, ERL-4221 (3,4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexyl group was added. 5 parts of the polycarboxylic acid resin (A-2) obtained in Synthesis Example 4 as an epoxy resin hardener, 5 parts by weight of the carboxylic acid ester (manufactured by Dow Chemical), zinc stearate as a curing catalyst (melting point 120~) 1.1 parts of 126 ° C), and these were mixed and defoamed for 5 minutes to obtain a cured resin composition for optical semiconductor sealing of the present invention.

比較例1 Comparative example 1

添加合成例1中所獲得之聚矽氧骨架環氧樹脂(B-1)40份、合成例2中所獲得之聚矽氧骨架環氧樹脂(B-2)60份、ERL-4221(3,4-環氧基環己基甲基-(3,4-環氧基)環己基羧酸酯,Dow Chemical製造)5份、作為環氧樹脂硬化劑之合成例3中所獲得之多元羧酸樹脂(A-1)72.4份、作為硬化觸媒之辛酸鋅(於室溫(25℃)下為液狀)0.5份,將 該等混合並進行5分鐘脫泡而獲得光半導體密封用硬化樹脂組成物。 40 parts of the polyfluorene skeleton epoxy resin (B-1) obtained in Synthesis Example 1 and 60 parts of the polyfluorene skeleton epoxy resin (B-2) obtained in Synthesis Example 2 were added, and ERL-4221 (3) was added. , 4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexylcarboxylate (manufactured by Dow Chemical) 5 parts, a polycarboxylic acid obtained in Synthesis Example 3 as an epoxy resin hardener 72.4 parts of the resin (A-1), 0.5 parts of zinc octoate (liquid at room temperature (25 ° C)) as a curing catalyst, These were mixed and defoamed for 5 minutes to obtain a cured resin composition for optical semiconductor sealing.

比較例2 Comparative example 2

添加合成例2中所獲得之聚矽氧骨架環氧樹脂(B-2)60份、ERL-4221(3,4-環氧基環己基甲基-(3,4-環氧基)環己基羧酸酯,Dow Chemical製造)5份、作為環氧樹脂硬化劑之合成例4中所獲得之多元羧酸樹脂(A-2)59.9份、作為硬化觸媒之辛酸鋅(於室溫(25℃)下為液狀)1.1份,將該等混合並進行5分鐘脫泡而獲得光半導體密封用硬化樹脂組成物。 60 parts of the polyfluorene skeleton epoxy resin (B-2) obtained in Synthesis Example 2, ERL-4221 (3,4-epoxycyclohexylmethyl-(3,4-epoxy)cyclohexyl group was added. 5 parts of a polycarboxylic acid resin (A-2) obtained in Synthesis Example 4 as an epoxy resin hardener, 5 parts by weight of carboxylic acid ester (manufactured by Dow Chemical), zinc octoate as a hardening catalyst (at room temperature (25) 1.1 parts in a liquid form at ° C), and the mixture was mixed and defoamed for 5 minutes to obtain a cured resin composition for optical semiconductor sealing.

評價試驗 Evaluation test

將實施例1~5、比較例1~2中所獲得之光半導體密封用硬化樹脂組成物之調配比、及該硬化物之適用期試驗、耐硫化試驗、硬度計硬度、硬化物透過率之結果示於表1。表1中之試驗係以如下方式進行。 The blending ratio of the cured resin composition for optical semiconductor sealing obtained in Examples 1 to 5 and Comparative Examples 1 and 2, and the pot life test of the cured product, the sulfurization resistance test, the hardness of the durometer, and the cured product transmittance The results are shown in Table 1. The tests in Table 1 were carried out in the following manner.

(1)適用期試驗: (1) Applicable period test:

將實施例1~5、比較例1~2中所獲得之光半導體密封用硬化樹脂組成物填充至聚丙烯製10 cc之注射器中,進行2分鐘之真空脫泡後放置於25℃、65%RH之環境下,於0小時、8小時、24小時後使用E型黏度計測定25℃下之黏度。算出所得之各放置時間下之黏度自初始黏度起之增加率。 The cured semiconductor composition for optical semiconductor sealing obtained in Examples 1 to 5 and Comparative Examples 1 and 2 was filled in a 10 cc syringe made of polypropylene, vacuum degassed for 2 minutes, and placed at 25 ° C, 65%. The viscosity at 25 ° C was measured using an E-type viscometer at 0 hours, 8 hours, and 24 hours in an RH environment. The increase rate of the viscosity at each set time from the initial viscosity was calculated.

(2)耐硫化試驗: (2) Vulcanization resistance test:

對實施例1~5、比較例1~2中所獲得之光半導體密封 用硬化樹脂組成物實施5分鐘真空脫泡後,填充至注射器中,使用精密噴出裝置以開口部成為平面之方式,使其於搭載有具有發光波長450 nm之發光元件之表面封裝型LED上澆鑄成型。於120℃下進行1小時之預硬化後,於150℃下硬化3小時而密封表面封裝型LED。將表面封裝型LED與2個添加有20%硫化銨水溶液6 ml之開口部直徑2cm、高度1.5 cm之聚乙烯製容器(蓋為開放)一起放入約3.2升之聚丙烯製密閉容器中,於室溫(20~27℃)下放置。放置後以目視確認底面之鍍銀部分之變色。表中,◎為放置6小時亦完全無變色者;○為放置4小時亦完全無變色者;△為放置4小時而略有變色者;×為放置4小時而變色嚴重者。 The optical semiconductor seals obtained in Examples 1 to 5 and Comparative Examples 1 and 2 After the vacuum defoaming was performed for 5 minutes with the hardened resin composition, it was filled in a syringe, and cast on a surface-mount type LED equipped with a light-emitting element having an emission wavelength of 450 nm by using a precision discharge device so that the opening was flat. forming. After pre-curing at 120 ° C for 1 hour, it was cured at 150 ° C for 3 hours to seal the surface-mount LED. The surface-encapsulated LED was placed in a closed container of about 3.2 liters of polypropylene together with two polyethylene containers (opened) having an opening diameter of 2 cm and a height of 1.5 cm, which were filled with 6 ml of a 20% ammonium sulfide aqueous solution. Place at room temperature (20 ~ 27 ° C). After standing, the discoloration of the silver-plated portion of the bottom surface was visually confirmed. In the table, ◎ is completely discolored without being placed for 6 hours; ○ is completely discolored without being placed for 4 hours; Δ is slightly discolored when placed for 4 hours; and × is discolored if placed for 4 hours.

(3)硬度計硬度: (3) Hardness tester hardness:

對實施例1~5、比較例1~2中所獲得之光半導體密封用硬化樹脂組成物實施5分鐘真空脫泡後,以成為直徑30 mm、高度70 mm之方式,使其於使用鋁箔之模具中澆鑄成型。使該澆鑄成型物於120℃下預硬化1小時後,於150℃下硬化3小時而獲得厚度7 mm之硬度計硬度用試驗片。利用JIS K-6253中所記載之方法測定所得之試驗片之硬度計硬度(類型A)。 The cured resin composition for optical semiconductor sealing obtained in Examples 1 to 5 and Comparative Examples 1 and 2 was subjected to vacuum degassing for 5 minutes, and then used to have an aluminum foil so as to have a diameter of 30 mm and a height of 70 mm. Casting in the mold. The cast molded product was pre-cured at 120 ° C for 1 hour, and then cured at 150 ° C for 3 hours to obtain a test piece for hardness tester having a thickness of 7 mm. The hardness of the obtained test piece (type A) was measured by the method described in JIS K-6253.

(4)硬化物透過率: (4) Hardened material transmittance:

對實施例1~5、比較例1~2中所獲得之環氧樹脂組成物實施5分鐘真空脫泡後,以成為30 mm×20 mm×高度0.8 mm之方式,於藉由耐熱膠帶製成障壁之玻璃基板上緩慢地 澆鑄成型。使該澆鑄成型物於120℃下預硬化1小時後,於150℃下硬化3小時而獲得厚度0.8 mm之透過率用試驗片。於下述條件下對所得之試驗片測定400 nm之透光率。 The epoxy resin composition obtained in Examples 1 to 5 and Comparative Examples 1 and 2 was subjected to vacuum defoaming for 5 minutes, and then formed into a heat-resistant adhesive tape to have a size of 30 mm × 20 mm × a height of 0.8 mm. Slowly on the glass substrate of the barrier Cast molding. The cast molded product was pre-cured at 120 ° C for 1 hour, and then cured at 150 ° C for 3 hours to obtain a test piece for transmittance of 0.8 mm in thickness. The obtained test piece was measured for light transmittance at 400 nm under the following conditions.

分光光計測定條件 Spectrophotometer measurement conditions

製造商:Hitachi High-Technologies股份有限公司 Manufacturer: Hitachi High-Technologies Co., Ltd.

機種:U-3300 Model: U-3300

狹縫寬度:2.0 nm Slit width: 2.0 nm

掃描速度:300 nm/min Scanning speed: 300 nm/min

由表1所示之結果可明確,使用於室溫(25℃)下為液狀之硬化觸媒辛酸鋅之比較例1~2雖耐硫化性優異,但於適用期試驗中,放置8小時後自初始黏度增黏1.7倍~2.0倍,因此加工性較差。另一方面,使用熔點為40~200℃之間的於室溫(25℃)下為固體之各硬化觸媒之實施例1~5不僅耐硫化性優異,而且於適用期試驗中,放置8小時後自初始黏度增黏1.2~1.4倍為止,因此加工性優異。進而,硬度計硬度為適度之硬度,硬化物透過率優異,可較佳地用作光半導體密封用樹脂組成物。 From the results shown in Table 1, it is clear that Comparative Examples 1 to 2 which are liquid-based hardening catalyst zinc octoate at room temperature (25 ° C) are excellent in sulfidation resistance, but are placed in the pot life test for 8 hours. After the initial viscosity increased by 1.7 times to 2.0 times, the processability is poor. On the other hand, Examples 1 to 5 using a curing catalyst having a melting point of 40 to 200 ° C which is solid at room temperature (25 ° C) are excellent not only in vulcanization resistance but also in the pot life test. After the hour, the initial viscosity is increased by 1.2 to 1.4 times, so the workability is excellent. Further, the hardness of the durometer is moderate hardness, and the cured product has excellent transmittance, and can be preferably used as a resin composition for optical semiconductor sealing.

再者,本申請案係基於在2011年9月9日提出申請之日本專利申請案(日本專利特願2011-196936),藉由引用而援引其全部內容。又,所引用之全部參照係作為整體而編入於此。 In addition, the present application is based on a Japanese patent application filed on Sep. 9, 2011 (Japanese Patent Application No. 2011-196936). Moreover, all references cited are incorporated herein in their entirety.

[產業上之可利用性] [Industrial availability]

本發明之硬化樹脂組成物由於耐硫化性、適用期極其優異,故作為光半導體元件(LED)密封材料極其有用。 The cured resin composition of the present invention is extremely useful as an optical semiconductor element (LED) sealing material because it has excellent sulfur resistance and long pot life.

Claims (14)

一種光半導體密封用硬化樹脂組成物,係含有熔點為40~200℃之硬化觸媒、及環氧樹脂及/或環氧樹脂硬化劑。 A cured resin composition for optical semiconductor sealing, comprising a curing catalyst having a melting point of 40 to 200 ° C, and an epoxy resin and/or an epoxy resin curing agent. 如申請專利範圍第1項之光半導體密封用硬化樹脂組成物,其中,環氧樹脂硬化劑為多元羧酸樹脂(A),該多元羧酸樹脂(A)包含:式(1)所表示之兩末端甲醇改質之矽油(a)與分子內具有一個羧酸酐基之化合物(d)的加成反應物、及分子內具有兩個以上羥基之多元醇化合物(i)與分子內具有一個羧酸酐基之化合物(d)的加成反應物: (式(1)中,R1分別獨立表示碳數1~10之伸烷基或碳數1~10之包含醚鍵之伸烷基,R2分別獨立表示碳數1~3之烷基或苯基,m為平均值且表示1~100)。 The cured resin composition for optical semiconductor sealing according to the first aspect of the invention, wherein the epoxy resin curing agent is a polyvalent carboxylic acid resin (A), and the polycarboxylic acid resin (A) comprises: represented by the formula (1) An addition reaction of the methanol-modified oleic oil at both ends (a) with a compound (d) having a carboxylic anhydride group in the molecule, and a polyol compound (i) having two or more hydroxyl groups in the molecule and a carboxy group in the molecule Addition reactant of the acid anhydride group-containing compound (d): (In the formula (1), R 1 each independently represents an alkylene group having 1 to 10 carbon atoms or an alkylene group having an ether bond having 1 to 10 carbon atoms, and R 2 each independently represents an alkyl group having 1 to 3 carbon atoms or Phenyl group, m is an average value and represents 1 to 100). 如申請專利範圍第1項之光半導體密封用硬化樹脂組成物,其中,環氧樹脂硬化劑為藉由使式(1)所表示之兩末端甲醇改質之矽油(a)、分子內具有兩個以上羥基之多元醇化合物(i)及分子內具有一個羧酸酐基之化合物(d)進行加成反應所獲得的多元羧酸樹脂(A): (式(1)中,R1分別獨立表示碳數1~10之伸烷基或碳數1~10之包含醚鍵之伸烷基,R2分別獨立表示碳數1~3之烷基或苯基,m為平均值且表示1~100)。 The hardened resin composition for optical semiconductor sealing according to the first aspect of the invention, wherein the epoxy resin hardener is an oil (a) modified by the two-terminal methanol represented by the formula (1), and has two molecules in the molecule. A polyvalent carboxylic acid resin (A) obtained by subjecting a polyol compound (i) having a hydroxyl group or more and a compound (d) having a carboxylic anhydride group in the molecule to an addition reaction: (In the formula (1), R 1 each independently represents an alkylene group having 1 to 10 carbon atoms or an alkylene group having an ether bond having 1 to 10 carbon atoms, and R 2 each independently represents an alkyl group having 1 to 3 carbon atoms or Phenyl group, m is an average value and represents 1 to 100). 如申請專利範圍第3項之光半導體密封用硬化樹脂組成物,其中,多元羧酸樹脂(A)為藉由進而含有分子內具有兩個以上羧酸酐基之化合物(c)作為反應原料來進行加成反應所獲得者。 The hardened resin composition for optical semiconductor sealing according to the third aspect of the invention, wherein the polyvalent carboxylic acid resin (A) is further composed of a compound (c) having two or more carboxylic acid anhydride groups in the molecule as a reaction raw material. The winner of the addition reaction. 如申請專利範圍第2項至第4項中任一項之光半導體密封用硬化樹脂組成物,其中,分子內具有兩個以上羥基之多元醇化合物(i)為式(2)所表示之末端醇聚酯化合物: (式(2)中,R3、R4分別獨立表示碳數1~10之伸烷基,m為平均值且表示1~100)。 The hardened resin composition for optical semiconductor sealing according to any one of claims 2 to 4, wherein the polyol compound (i) having two or more hydroxyl groups in the molecule is an end represented by the formula (2) Alcohol polyester compound: (In the formula (2), R 3 and R 4 each independently represent an alkylene group having 1 to 10 carbon atoms, and m is an average value and represents 1 to 100). 如申請專利範圍第1項至第5項中任一項之光半導體密封用硬化樹脂組成物,其中,環氧樹脂為聚矽氧骨架環氧樹脂(B)。 The hardened resin composition for optical semiconductor sealing according to any one of the items 1 to 5, wherein the epoxy resin is a polyfluorene skeleton epoxy resin (B). 如申請專利範圍第6項之光半導體元件密封用硬化樹脂組成物,其中,上述聚矽氧骨架環氧樹脂(B)為經由下述製造步驟1、2而獲得之式(3)所表示之矽烷醇基末端矽油與式(4)所表示之含環氧基之矽化物的聚合物,且 利用JIS K-7236所記載之方法而測得之環氧當量為300~1500 g/eq:製造步驟1使矽烷醇基末端矽油之矽烷醇基與含環氧基之矽化物之烷氧基縮合而獲得改質矽油之步驟;製造步驟2於製造步驟1後,添加水而進行殘存之烷氧基的水解縮合之步驟; (式(3)中,R5表示碳數1~3之烷基或苯基,p為平均值且表示3~200;式中,複數存在之R5可相同亦可不同);XSi(R 6 ) q (OR 7 ) r (4)(式(4)中,X表示含有環氧基之有機基,R6表示碳數1~10之直鏈狀、分支狀或環狀之烷基或碳數6~10之芳香族烴基,R7表示碳數1~10之直鏈狀、分支狀或環狀之烷基,q為整數且表示0~2,r為整數,表示(3-q))。 The hardened resin composition for sealing an optical semiconductor element according to the sixth aspect of the invention, wherein the polyfluorene skeleton epoxy resin (B) is represented by the formula (3) obtained by the following production steps 1 and 2. A polymer of a decyl alcohol-terminated eucalyptus oil and an epoxy group-containing hydrazine compound represented by the formula (4), and an epoxy equivalent of 300 to 1500 g/eq as measured by the method described in JIS K-7236: Step 1: a step of condensing a decyl alcohol group of a decyl alcohol terminal sulfonate with an alkoxy group of an epoxy group-containing hydrazine compound to obtain a modified eucalyptus oil; and a production step 2, after the production step 1, adding water to carry out residual alkoxylation a step of hydrolytic condensation of a base; (In the formula (3), R 5 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, and p is an average value and represents 3 to 200; wherein, in the formula, R 5 may be the same or different); XSi(R) 6 ) q (OR 7 ) r (4) (In the formula (4), X represents an organic group containing an epoxy group, and R 6 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms or An aromatic hydrocarbon group having 6 to 10 carbon atoms, R 7 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, q is an integer and represents 0 to 2, and r is an integer, indicating (3-q) )). 如申請專利範圍第1項至第7項中任一項之光半導體密封用硬化樹脂組成物,其中,熔點為40~200℃之硬化觸媒為金屬皂系硬化觸媒。 The hardened resin composition for optical semiconductor sealing according to any one of the above-mentioned items, wherein the curing catalyst having a melting point of 40 to 200 ° C is a metal soap-based curing catalyst. 如申請專利範圍第8項之光半導體密封用硬化樹脂組成物,其中,金屬皂類為由羧酸化合物構成之鋅鹽。 The hardened resin composition for optical semiconductor sealing according to the eighth aspect of the invention, wherein the metal soap is a zinc salt composed of a carboxylic acid compound. 如申請專利範圍第9項之光半導體密封用硬化樹脂組成物,其中,由羧酸化合物構成之鋅鹽為由具有羥基之碳數10~30之單羧酸化合物構成之鋅鹽。 The hardened resin composition for optical semiconductor sealing according to the ninth aspect of the invention, wherein the zinc salt composed of a carboxylic acid compound is a zinc salt composed of a monocarboxylic acid compound having a hydroxyl group having 10 to 30 carbon atoms. 如申請專利範圍第10項之光半導體密封用硬化樹脂組成物,其中,具有羥基之碳數10~30之單羧酸化合物為12-羥基硬脂酸。 The hardened resin composition for optical semiconductor sealing according to claim 10, wherein the monocarboxylic acid compound having a hydroxyl group having 10 to 30 carbon atoms is 12-hydroxystearic acid. 如申請專利範圍第10項之光半導體密封用硬化樹脂組成物,其中,具有羥基之碳數10~30之單羧酸化合物為硬脂酸。 The hardened resin composition for optical semiconductor sealing according to claim 10, wherein the monocarboxylic acid compound having a hydroxyl group having 10 to 30 carbon atoms is stearic acid. 一種硬化物,係使申請專利範圍第1項至第12項中任一項之光半導體密封用硬化樹脂組成物硬化而成。 A cured product obtained by curing the cured resin composition for optical semiconductor sealing according to any one of claims 1 to 12. 一種LED,其具備申請專利範圍第13項之硬化物。 An LED having a cured product of claim 13 of the patent application.
TW101132711A 2011-09-09 2012-09-07 Curable resin composition for sealing optical semiconductor element and cured product thereof TW201313772A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011196936 2011-09-09

Publications (1)

Publication Number Publication Date
TW201313772A true TW201313772A (en) 2013-04-01

Family

ID=47832185

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101132711A TW201313772A (en) 2011-09-09 2012-09-07 Curable resin composition for sealing optical semiconductor element and cured product thereof

Country Status (4)

Country Link
JP (1) JP6006725B2 (en)
CN (1) CN103781815A (en)
TW (1) TW201313772A (en)
WO (1) WO2013035740A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2014157552A1 (en) * 2013-03-28 2017-02-16 日本化薬株式会社 Epoxy resin composition for optical semiconductor encapsulation, cured product thereof and optical semiconductor device
JP6016697B2 (en) * 2013-04-03 2016-10-26 日本化薬株式会社 Curable resin composition for light-emitting semiconductor coating protective material
JP6143359B2 (en) * 2013-11-19 2017-06-07 日本化薬株式会社 Silicone-modified epoxy resin and composition thereof
JP6866098B2 (en) * 2016-10-04 2021-04-28 サンスター技研株式会社 Curable composition
CN112513146A (en) * 2018-08-10 2021-03-16 东丽株式会社 Polysiloxane-polyalkylene glycol block copolymer and method for producing same
JP7115744B2 (en) * 2018-12-17 2022-08-09 協立化学産業株式会社 Cationic polymerizable ink-jet resin composition for encapsulating organic EL elements
JP7424788B2 (en) * 2019-10-04 2024-01-30 日鉄ケミカル&マテリアル株式会社 Curable resin composition containing siloxane resin, cured film thereof, and method for producing siloxane resin
CN114846088B (en) * 2019-12-11 2023-06-27 三键有限公司 Curable resin composition, method for producing same, and cured product

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008019350A (en) * 2006-07-13 2008-01-31 Yokohama Rubber Co Ltd:The Curable resin composition
KR20110101139A (en) * 2008-12-19 2011-09-15 닛뽄 가야쿠 가부시키가이샤 Carboxylic acid compound and epoxy resin composition containing same
KR20120085256A (en) * 2009-10-06 2012-07-31 닛뽄 가야쿠 가부시키가이샤 Polycarboxylic acid composition, process for preparation thereof, and curable resin compositions containing the polycarboxylic acid composition
WO2011108588A1 (en) * 2010-03-02 2011-09-09 日本化薬株式会社 Curable resin composition and cured article thereof
SG186254A1 (en) * 2010-06-11 2013-01-30 Nippon Kayaku Kk Curable resin composition and cured product thereof
JP5626856B2 (en) * 2010-06-11 2014-11-19 日本化薬株式会社 Curable resin composition and cured product thereof
CN102971355B (en) * 2010-06-30 2015-07-08 日本化药株式会社 Polyvalent carboxylic acid composition, curing agent composition, and curable resin composition containing polyvalent carboxylic acid composition or curing agent composition as curing agent for epoxy resin
JP5472924B2 (en) * 2010-10-21 2014-04-16 日本化薬株式会社 Curable resin composition and cured product thereof
JP5561778B2 (en) * 2010-10-21 2014-07-30 日本化薬株式会社 Curable resin composition and cured product thereof
KR20140022828A (en) * 2011-04-07 2014-02-25 닛뽄 가야쿠 가부시키가이샤 Polycarboxylic acid resin and composition thereof

Also Published As

Publication number Publication date
JP6006725B2 (en) 2016-10-12
WO2013035740A1 (en) 2013-03-14
CN103781815A (en) 2014-05-07
JPWO2013035740A1 (en) 2015-03-23

Similar Documents

Publication Publication Date Title
TW201313772A (en) Curable resin composition for sealing optical semiconductor element and cured product thereof
TWI538959B (en) Hardened resin composition and hardened product thereof
TWI512016B (en) Polycarboxylic acid resin and its composition
JP5730852B2 (en) Method for producing organopolysiloxane, organopolysiloxane obtained by the production method, and composition containing the organopolysiloxane
TWI504628B (en) Hardened resin composition and hardened product thereof
JP6150415B2 (en) Curable resin composition and cured product thereof
TWI564318B (en) Epoxy resin composition
TWI494376B (en) A hardened resin composition for light semiconductors and a hardened product thereof
TW201609676A (en) Polycarboxylic acid and polycarboxylic acid composition containing same, epoxy resin composition, thermosetting resin composition, and cured material of same, and optical semiconductor device
TWI485202B (en) Hardened resin composition and hardened product thereof
TWI625357B (en) Curable resin composition and cured product thereof
TWI580707B (en) Polycarboxylic acid resin and epoxy resin composition
JP6239616B2 (en) Epoxy group-containing polyorganosiloxane and curable resin composition containing the same
JP2014145073A (en) Curable resin composition and cured product of the same
JP6279830B2 (en) Curable resin composition and cured product thereof
JP2015165013A (en) Epoxy resin curing agent composition and epoxy resin composition
JPWO2014157552A1 (en) Epoxy resin composition for optical semiconductor encapsulation, cured product thereof and optical semiconductor device
JP6016697B2 (en) Curable resin composition for light-emitting semiconductor coating protective material
JP2018030999A (en) Curable resin composition and cured product of the same
JP2014177531A (en) Epoxy resin composition including hydrotalcite compound