TW201307353A - Novel organic electroluminescence compounds and organic electroluminescence device using the same - Google Patents

Novel organic electroluminescence compounds and organic electroluminescence device using the same Download PDF

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TW201307353A
TW201307353A TW101126211A TW101126211A TW201307353A TW 201307353 A TW201307353 A TW 201307353A TW 101126211 A TW101126211 A TW 101126211A TW 101126211 A TW101126211 A TW 101126211A TW 201307353 A TW201307353 A TW 201307353A
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金侈植
梁綬晉
文斗鉉
黃守振
李仙優
李孝姃
全志松
羅弘燁
趙英俊
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羅門哈斯電子材料韓國公司
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Abstract

The present invention relates to novel organic electroluminescence compounds and an organic electroluminescence device containing the same. The compounds according to the present invention have high luminous efficiency and long operation lifetime. Therefore, they can produce an organic electroluminescence device having enhanced power consumption efficiency.

Description

新穎有機電場發光化合物及使用該化合物之有機電場發光裝置 Novel organic electroluminescent compound and organic electric field illuminating device using the same

本發明係有關於新穎有機電場發光化合物及使用該化合物之有機電場發光裝置。 The present invention relates to novel organic electroluminescent compounds and organic electroluminescent devices using the same.

電場發光(electroluminescent,EL)裝置係自發光裝置,其具有提供寬廣視角、較高的對比率以及較快的反應時間之優於其他類型顯示器裝置之優點。伊斯門-柯達(Eastman Kodak)首先研發出藉由使用小分子,其為芳香族二胺和鋁錯合物作為形成發光材料之有機EL裝置[Appl.Phys.Lett.51,913,1987]。 Electroluminescent (EL) devices are self-illuminating devices that have the advantage of providing a wider viewing angle, a higher contrast ratio, and faster reaction times than other types of display devices. Eastman Kodak first developed an organic EL device that forms a luminescent material by using a small molecule, which is an aromatic diamine and an aluminum complex [Appl. Phys. Lett. 51, 913, 1987].

決定有機EL裝置之發光效率的最重要因素係發光材料。至今,螢光材料已廣泛地用作為發光材料。然而,從電場發光機制的觀點來看,發展磷光材料為在理論上增進發光效率四倍之最佳方法之一。銥(III)錯合物係已廣為人知之磷光材料,其包含雙(2-(2’-苯并噻吩基)-吡啶-N,C3’)銥(乙醯基丙酮)[(acac)Ir(btp)2]、參(2-苯基吡啶)銥[Ir(ppy)3]以及雙(4,6-二氟苯基吡啶-N,C2)甲吡啶銥(Firpic),分別作為紅光、綠光以及藍光材料。尤其是,許多磷光材料最近已在日本、歐洲及美國中有研究。 The most important factor determining the luminous efficiency of an organic EL device is a luminescent material. Fluorescent materials have been widely used as luminescent materials to date. However, from the standpoint of the electric field luminescence mechanism, the development of phosphorescent materials is one of the best ways to theoretically increase the luminous efficiency by a factor of four. The ruthenium (III) complex is a well-known phosphorescent material comprising bis(2-(2'-benzothienyl)-pyridine-N,C3') oxime (acetamidacetone) [(acac)Ir ( Btp) 2 ], ginseng (2-phenylpyridine) fluorene [Ir(ppy) 3 ] and bis(4,6-difluorophenylpyridine-N,C 2 )methylpyridinium (Firpic), respectively, as red light, Green light and blue light materials. In particular, many phosphorescent materials have recently been studied in Japan, Europe, and the United States.

目前為止,4,4’-N,N’-二咔唑-聯苯(CBP)係最廣為人知之用於磷光物質之主體材料。再者,已知使用浴銅靈(bathocuproine,BCP)及雙(2-甲基-8-羥基喹啉)(4-苯基酚)鋁(III)(BAlq)作為電洞阻擋層(hole blocking layer) 之有機EL裝置,且日本先鋒公司(Pioneer)等發展了使用BAlq衍生物作為主體材料之高效能有機EL裝置。 Up to now, 4,4'-N,N'-dicarbazole-biphenyl (CBP) is the most widely known host material for phosphorescent materials. Furthermore, it is known to use bathocuproine (BCP) and bis(2-methyl-8-hydroxyquinoline) (4-phenylphenol) aluminum (III) (BAlq) as a hole blocking layer (hole blocking). Layer) The organic EL device, and Pioneer et al. have developed a high-performance organic EL device using a BAlq derivative as a host material.

儘管這些材料提供良好的發光特性,其仍具有下列缺點:因為其有低玻璃轉化溫度以及熱安定性差,在真空高溫沉積製程期間可能發生降解。有機EL裝置之功率效率係由下列公式所定義:[(Π/電壓)×電流效率],且該功率效率與電壓呈反比,因此需要提高功率效率以減少功率耗損。雖然包括磷光材料之有機EL裝置相較於包括螢光材料者提供較高之電流效率(燭光/安培,cd/A),使用傳統磷光材料(諸如BAlq或CBP)之有機EL裝置較使用螢光材料之有機EL裝置具有較高的驅動電壓。因此,使用傳統磷光材料之有機EL裝置在功率效率(流明/瓦,lm/W)上並無優勢。再者,該有機EL裝置之操作壽命短。 Although these materials provide good luminescent properties, they still have the following disadvantages: degradation may occur during vacuum high temperature deposition processes because of their low glass transition temperature and poor thermal stability. The power efficiency of the organic EL device is defined by the following formula: [(Π/voltage) × current efficiency], and the power efficiency is inversely proportional to the voltage, so it is necessary to improve power efficiency to reduce power consumption. Although organic EL devices including phosphorescent materials provide higher current efficiency (candle/amperes, cd/A) than those including phosphor materials, organic EL devices using conventional phosphorescent materials (such as BAlq or CBP) use fluorescence. The organic EL device of the material has a high driving voltage. Therefore, an organic EL device using a conventional phosphorescent material has no advantage in power efficiency (lumens/watt, lm/W). Furthermore, the organic EL device has a short operational life.

韓國專利第KR0948700揭露作為用於有機EL裝置之化合物之芳基咔唑化合物,其經包括氮原子之雜芳基取代。然而,其並未揭露在其氮位置上直接或間接連接至經聯苯基或聯三苯基取代之雜芳基之經稠合的咔唑化合物。 Korean Patent No. KR0948700 discloses an aryl carbazole compound as a compound for an organic EL device, which is substituted with a heteroaryl group including a nitrogen atom. However, it does not disclose a fused carbazole compound which is attached directly or indirectly to its heterophenyl group substituted with a biphenyl or a terphenyl group at its nitrogen position.

本發明之目的係提供一種用於有機電場發光之化合物,其給予裝置高發光效率以及長操作壽命,並具有適宜色座標;以及一種使用該化合物作為發光材料之有機電場發光裝置,其具有高效率以及長壽命。 It is an object of the present invention to provide a compound for organic electric field luminescence which imparts high luminous efficiency and long operational life to a device and has suitable color coordinates; and an organic electric field illuminating device using the compound as a luminescent material, which has high efficiency And long life.

本發明之發明人發現上揭目的可以藉由下列式(1)表示之化合物達成: The inventors of the present invention have found that the above object can be achieved by the compound represented by the following formula (1):

其中,L1表示單鍵、經取代或未經取代之3至30員伸雜芳基、經取代或未經取代之(C6-C30)伸芳基、或經取代或未經取代之(C3-C30)伸環烷基;X1及X2各獨立表示CH或N;Y1及Y2各獨立表示-O-、-S-、-CR5R6-或-NR7-,限制條件為Y1及Y2不同時存在;Ar1及Ar2各獨立表示氫、氘、鹵素、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、或經取代或未經取代之3至30員雜芳基;R1至R4各獨立表示氫、氘、鹵素、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、經取代或未經取代之3至30員雜芳基、經取代或未經取代之(C3-C30)環烷基、經取代或未經取代之5至7員雜環烷基、經取代或未經取代之(C6-C30)芳基(C1-C30)烷基、 -NR11R12、-SiR13R14R15、-SR16、-OR17、氰基、硝基、或羥基;或R1至R4鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環,且該環之一個或多個碳原子可經至少一個選自氮、氧及硫之雜原子置換;R5至R7及R11至R17各獨立表示氫、氘、鹵素、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、經取代或未經取代之3至30員雜芳基、經取代或未經取代之5至7員雜環烷基、或經取代或未經取代之(C3-C30)環烷基;或R5至R7及R11至R17鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環,且該環之一個或多個碳原子可經至少一個選自氮、氧及硫之雜原子置換;a、b、c及d各獨立表示1至4之整數;當a、b、c或d係2或更多之整數時,每一個R1、每一個R2、每一個R3或每一個R4係相同或相異;該雜環烷基及該(伸)雜芳基含有至少一個選自B、N、O、S、P(=O)、Si及P之雜原子。 Wherein L 1 represents a single bond, a substituted or unsubstituted 3 to 30 membered heteroaryl group, a substituted or unsubstituted (C6-C30) extended aryl group, or a substituted or unsubstituted group (C3) -C30)cycloalkyl group; X 1 and X 2 each independently represent CH or N; Y 1 and Y 2 each independently represent -O-, -S-, -CR 5 R 6 - or -NR 7 -, restrictions Y 1 and Y 2 are not present at the same time; Ar 1 and Ar 2 each independently represent hydrogen, deuterium, halogen, substituted or unsubstituted (C1-C30) alkyl, substituted or unsubstituted (C6-C30) An aryl group, or a substituted or unsubstituted 3 to 30 membered heteroaryl; each of R 1 to R 4 independently represents hydrogen, deuterium, halogen, substituted or unsubstituted (C1-C30) alkyl, Substituted or unsubstituted (C6-C30) aryl, substituted or unsubstituted 3 to 30 membered heteroaryl, substituted or unsubstituted (C3-C30)cycloalkyl, substituted or unsubstituted Substituted 5- to 7-membered heterocycloalkyl, substituted or unsubstituted (C6-C30) aryl (C1-C30) alkyl, -NR 11 R 12 , -SiR 13 R 14 R 15 , -SR 16 , -OR 17 , cyano, nitro, or hydroxy; or R 1 to R 4 bonded to one or more adjacent substituents to form a monocyclic or polycyclic ring (C5-C30) an alicyclic or aromatic ring, and one or more carbon atoms of the ring may be substituted with at least one hetero atom selected from the group consisting of nitrogen, oxygen and sulfur; R 5 to R 7 and R 11 to R 17 each Independently represents hydrogen, deuterium, halogen, substituted or unsubstituted (C1-C30) alkyl, substituted or unsubstituted (C6-C30) aryl, substituted or unsubstituted 3 to 30 member Aryl, substituted or unsubstituted 5 to 7 membered heterocycloalkyl, or substituted or unsubstituted (C3-C30)cycloalkyl; or R 5 to R 7 and R 11 to R 17 bonded Adjacent to one or more substituents to form a monocyclic or polycyclic (C5-C30) alicyclic or aromatic ring, and one or more carbon atoms of the ring may be selected from at least one selected from the group consisting of nitrogen, oxygen, and sulfur a hetero atom substitution; a, b, c and d each independently represent an integer from 1 to 4; when a, b, c or d is an integer of 2 or more, each R 1 , each R 2 , each R 3 or each R 4 is the same or different; the heterocycloalkyl group and the (hetero)heteroaryl group contain at least one selected from the group consisting of B, N, O, S, P(=O), Si and P atom.

本發明之有機電場發光化合物可製造具有高發光效率及長操作壽命之有機電場發光裝置。 The organic electroluminescent compound of the present invention can produce an organic electric field light-emitting device having high luminous efficiency and long operational life.

此外,由於本發明之化合物具有高電子傳輸效率,當製造裝置時可防止結晶。再者,該化合物具有良好的成層性且改善該裝置之電流特性。因此,其可製造具有降低之驅動電壓及增進之功率效率的有機電場發光裝置。 Further, since the compound of the present invention has high electron transport efficiency, crystallization can be prevented when the device is manufactured. Furthermore, the compound has good layering properties and improves the current characteristics of the device. Therefore, it is possible to manufacture an organic electric field light-emitting device having a reduced driving voltage and improved power efficiency.

後文中將詳細描述本發明。然而,下文描述係意於解釋本發明,而非意欲以任何方式侷限本發明之範疇。 The invention will be described in detail hereinafter. However, the following description is intended to be illustrative of the invention and is not intended to limit the scope of the invention in any way.

本發明係關於上揭式(1)表示之有機電場發光化合物,及包括該化合物之有機電場發光裝置。 The present invention relates to an organic electroluminescent compound represented by the above formula (1), and an organic electric field light-emitting device comprising the same.

本說明書中,「(C1-C30)(伸)烷基」意指具有1至30個碳原子之直鏈或分支鏈(伸)烷基,其中,該碳原子之數量較佳為1至20,更佳為1至10個,且包含甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基等;「(C2-C30)烯基」意指具有2至30個碳原子之直鏈或分支鏈烯基,其中,該碳原子之數量較佳為2至20,更佳為2至10個,且包含乙烯基、1-丙烯基、2-丙烯基、1-丁烯基、2-丁烯基、3-丁烯基、2-甲基丁-2-烯基等;「(C2-C30)炔基」係具有2至30個碳原子之直鏈或分支鏈炔基,其中,該碳原子之數量較佳為2至20,更佳為2至10個,且包含乙炔基、1-丙炔基、2-丙炔基、1-丁炔基、2-丁炔基、3-丁炔基、1-甲基戊-2-基炔基等;「(C3-C30)環烷基」係具有3至30個碳原子之單環或多環烴,其中,該碳原子之數量較佳為3至20,更佳為3至7個,且包含環丙基、環丁基、環戊基、環己基等;「3至7員雜環烷基」係具有至少一個選自B、N、O、S、P(=O)、Si及P之雜原子(較佳為O、S及N),以及3至7環主鏈原子之環烷基,且包含四氫呋喃、吡咯啶、四氫噻吩(thiolan)、四氫哌喃等;「(C6-C30)(伸)芳基」係衍生自具有6至30個碳原子之芳香烴之單環或稠 合環,其中,該碳原子之數量較佳為6至20,更佳為6至15個,且包含苯基、聯苯基、聯三苯基、萘基、茀基、菲基、蒽基、茚基、聯伸三苯基(triphenylenyl)、芘基、并四苯基(tetracenyl)、苝基、蒯基(chrysenyl)、稠四苯基(naphthacenyl)、丙二烯合茀基(fluoranthenyl)等;「3至30員(伸)雜芳基」係具有至少一個(較佳為1至4個)係選自B、N、O、S、P(=O)、Si以及P所組成群組之雜原子,以及3至30個環主鏈原子之芳基;係單環或與至少一個苯環縮合之稠合環;具有較佳為5至20個,更佳為5至15個環主鏈原子;可為部份飽合;可為藉由將至少一個雜芳基或芳基透過一個或多個單鍵鍵結至雜芳基而形成者;且包含單環類型雜芳基,包含呋喃基、噻吩基、吡咯基、咪唑基、吡唑基、噻唑基、噻二唑基、異噻唑基、異唑基、唑基、二唑基、三基、四基、三唑基、四唑基、呋吖基、吡啶基、吡基、嘧啶基、嗒基等,以及稠合環類型雜芳基,包含苯并呋喃基、苯并噻吩基、異苯并呋喃基、二苯并呋喃基、二苯并噻吩基、苯并咪唑基、苯并噻唑基、苯并異噻唑基、苯并異唑基、苯并唑基、異吲哚基、吲哚基、吲唑基、苯并噻二唑基、喹啉基、異喹啉基、噌啉基(cinnolinyl)、喹唑啉基、喹啉基、咔唑基、啡基、啡啶基、苯并二呃基(benzodioxolyl)等。再者,「鹵素」包含F、Cl、Br及I。 In the present specification, "(C1-C30)(alkyl)alkyl" means a straight or branched alkyl group having 1 to 30 carbon atoms, wherein the number of the carbon atoms is preferably from 1 to 20 More preferably, it is 1 to 10, and includes methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, t-butyl, etc.; "(C2-C30) alkenyl" means a linear or branched alkenyl group having 2 to 30 carbon atoms, wherein the number of the carbon atoms is preferably 2 to 20, more preferably 2 to 10, and includes a vinyl group, a 1-propenyl group, and 2 Propylene, 1-butenyl, 2-butenyl, 3-butenyl, 2-methylbut-2-enyl, etc.; "(C2-C30)alkynyl" has 2 to 30 carbon atoms a linear or branched alkynyl group, wherein the number of carbon atoms is preferably from 2 to 20, more preferably from 2 to 10, and includes ethynyl, 1-propynyl, 2-propynyl, 1- Butynyl, 2-butynyl, 3-butynyl, 1-methylpentan-2-ylalkynyl, etc.; "(C3-C30)cycloalkyl" is a single ring having 3 to 30 carbon atoms Or a polycyclic hydrocarbon, wherein the number of the carbon atoms is preferably from 3 to 20, more preferably from 3 to 7, and comprises a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group. "3 to 7 membered heterocycloalkyl" has at least one hetero atom selected from B, N, O, S, P(=O), Si and P (preferably O, S and N), and 3 a cycloalkyl group to a 7-ring main chain atom, and comprising tetrahydrofuran, pyrrolidine, thiolan, tetrahydropyran, etc.; "(C6-C30) (extended) aryl" is derived from having 6 to 30 a monocyclic or fused ring of an aromatic hydrocarbon having one carbon atom, wherein the number of the carbon atoms is preferably from 6 to 20, more preferably from 6 to 15, and includes a phenyl group, a biphenyl group, a triphenyl group, Naphthyl, anthryl, phenanthryl, anthracenyl, fluorenyl, triphenylenyl, fluorenyl, tetracenyl, fluorenyl, chrysenyl, naphthacenyl , fluoranthenyl, etc.; "3 to 30 members (extended) heteroaryl" having at least one (preferably 1 to 4) selected from the group consisting of B, N, O, S, P ( a hetero atom of a group consisting of: O), Si, and P, and an aryl group of 3 to 30 ring main chain atoms; a monocyclic ring or a condensed ring condensed with at least one benzene ring; preferably 5 to 20 More preferably 5 to 15 ring backbone atoms; may be partially saturated; One less heteroaryl or aryl group formed by one or more single bonds bonded to a heteroaryl group; and comprises a monocyclic type heteroaryl group, including furyl, thienyl, pyrrolyl, imidazolyl, pyrazolyl , thiazolyl, thiadiazolyl, isothiazolyl, iso Azolyl, Azolyl, Diazolyl, three Base, four Base, triazolyl, tetrazolyl, furazolyl, pyridyl, pyridyl Base, pyrimidinyl, oxime Base, and fused ring type heteroaryl, including benzofuranyl, benzothienyl, isobenzofuranyl, dibenzofuranyl, dibenzothiophenyl, benzimidazolyl, benzothiazolyl Benzoisothiazolyl, benzopyrene Azolyl, benzo Azyl, isodecyl, fluorenyl, oxazolyl, benzothiadiazolyl, quinolinyl, isoquinolyl, cinnolinyl, quinazolinyl, quin Orolinyl, carbazolyl, brown Peptidyl, benzodiyl Benzodioxolyl and the like. Further, "halogen" includes F, Cl, Br, and I.

本說明書中,在「經取代或未經取代」的表達中的「經取代」意為在某個官能基的氫原子經其他原子或基團(亦 即,取代基)置換。 In the present specification, "substituted" in the expression "substituted or unsubstituted" means that a hydrogen atom of a certain functional group passes through another atom or group (also That is, the substituent is substituted.

在式(1)中,L1、Ar1、Ar2、R1至R7及R11至R17基團之經取代之烷基、經取代之(伸)芳基、經取代之(伸)雜芳基、經取代之(伸)環烷基、經取代之雜環烷基及經取代之芳烷基之取代基係各獨立為選自下列所組成群組之至少一者:氘、鹵素、經鹵素取代或未經取代之(C1-C30)烷基、(C6-C30)芳基、經(C1-C30)烷基或(C6-C30)芳基取代或未經取代之3至30員雜芳基、(C3-C30)環烷基、5至7員雜環烷基、三(C1-C30)烷基矽烷基、三(C6-C30)芳基矽烷基、二(C1-C30)烷基(C6-C30)芳基矽烷基、(C1-C30)烷基二(C6-C30)芳基矽烷基、(C2-C30)烯基、(C2-C30)炔基、氰基、N-咔唑基、二(C1-C30)烷基胺基、二(C6-C30)芳基胺基、(C1-C30)烷基(C6-C30)芳基胺基、二(C6-C30)芳基硼羰基、二(C1-C30)烷基硼羰基、(C1-C30)烷基(C6-C30)芳基硼羰基、(C6-C30)芳基(C1-C30)烷基、(C1-C30)烷基(C6-C30)芳基、羧基、硝基、以及羥基,較佳為選自下列所組成群組之至少一者:氘、鹵素、(C1-C6)烷基、(C6-C20)芳基及二(C6-C20)芳基胺基,更佳為選自下列所組成群組之至少一者:氘、氟、甲基、苯基及二苯基胺基。 In the formula (1), a substituted alkyl group, a substituted (extended) aryl group, a substituted (extended) group of L 1 , Ar 1 , Ar 2 , R 1 to R 7 and R 11 to R 17 groups And the substituents of the substituted arylalkyl group, the substituted heterocycloalkyl group and the substituted aralkyl group are each independently selected from the group consisting of: hydrazine, Halogen, halogen-substituted or unsubstituted (C1-C30) alkyl, (C6-C30) aryl, substituted by (C1-C30) alkyl or (C6-C30) aryl or unsubstituted 3 to 30-membered heteroaryl, (C3-C30)cycloalkyl, 5- to 7-membered heterocycloalkyl, tri(C1-C30)alkyldecyl, tris(C6-C30)aryldecyl,di(C1- C30) alkyl (C6-C30) aryldecyl, (C1-C30)alkylbis(C6-C30)aryldecyl, (C2-C30)alkenyl, (C2-C30)alkynyl, cyano , N-carbazolyl, di(C1-C30)alkylamino, di(C6-C30)arylamino, (C1-C30)alkyl(C6-C30)arylamino, di(C6- C30) aryl boron carbonyl, di(C1-C30)alkyl boroncarbonyl, (C1-C30)alkyl (C6-C30) aryl boroncarbonyl, (C6-C30) aryl (C1-C30) alkyl, (C1-C30)alkyl (C6-C30) aryl, carboxyl, nitro, and hydroxy, preferably selected from the group consisting of At least one of the group consisting of: hydrazine, halogen, (C1-C6) alkyl, (C6-C20) aryl, and di(C6-C20) arylamine, more preferably selected from the group consisting of At least one of the group: hydrazine, fluorine, methyl, phenyl, and diphenylamino.

在上揭式(1)中,L1表示單鍵、3至30員伸雜芳基或(C6-C30)伸芳基;X1及X2各獨立表示CH或N;Y1及Y2各獨立表示-O-、-S-、-CR5R6-或-NR7-,限制條件為Y1及Y2不同時存在;Ar1及Ar2各獨立表示氫、氘、鹵素、(C1-C30)烷基、(C6-C30)芳基、或3至30員雜芳基;R1至R4各獨立 表示氫、氘、鹵素、(C1-C30)烷基、(C6-C30)芳基、3至30員雜芳基、咔唑基、或-SiR13R14R15;或R4鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環,且該環之一個或多個碳原子可經至少一個選自氮、氧及硫之雜原子置換;R5至R7各獨立表示(C1-C30)烷基、(C6-C30)芳基、或3至30員雜芳基;或R5及R6係彼此鍵結以形成單環或多環之(C5-C30)脂環或芳香環,且該環之一個或多個碳原子可經至少一個選自氮、氧及硫之雜原子置換;R13至R15各獨立表示(C1-C30)烷基、(C6-C30)芳基、或3至30員雜芳基;以及在L1之伸芳基及伸雜芳基,在Ar1及Ar2之烷基、芳基、雜芳基及咔唑基,及在R1至R7及R13至R15之烷基、芳基及雜芳基可經選自下列所組成群組之至少一者取代:氘、鹵素、經鹵素取代或未經取代之(C1-C30)烷基、(C6-C30)芳基、經(C1-C30)烷基或(C6-C30)芳基取代或未經取代之3至30員雜芳基、(C3-C30)環烷基、三(C1-C30)烷基矽烷基、三(C6-C30)芳基矽烷基、二(C1-C30)烷基(C6-C30)芳基矽烷基、(C1-C30)烷基二(C6-C30)芳基矽烷基、咔唑基、二(C1-C30)烷基胺基、二(C6-C30)芳基胺基、(C1-C30)烷基(C6-C30)芳基胺基、(C6-C30)芳基(C1-C30)烷基、以及(C1-C30)烷基(C6-C30)芳基。 In the above formula (1), L 1 represents a single bond, a 3 to 30 member heteroaryl group or a (C6-C30) extended aryl group; X 1 and X 2 each independently represent CH or N; Y 1 and Y 2 Each independently represents -O-, -S-, -CR 5 R 6 - or -NR 7 -, and the restrictions are that Y 1 and Y 2 are not present at the same time; Ar 1 and Ar 2 each independently represent hydrogen, deuterium, halogen, ( C1-C30)alkyl, (C6-C30)aryl, or 3 to 30 membered heteroaryl; R 1 to R 4 each independently represent hydrogen, deuterium, halogen, (C1-C30)alkyl, (C6-C30 An aryl group, a 3 to 30 membered heteroaryl group, a carbazolyl group, or -SiR 13 R 14 R 15 ; or R 4 bonded to one or more adjacent substituents to form a monocyclic or polycyclic ring (C5) -C30) an alicyclic or aromatic ring, and one or more carbon atoms of the ring may be substituted with at least one hetero atom selected from the group consisting of nitrogen, oxygen and sulfur; R 5 to R 7 each independently represent a (C1-C30) alkyl group. , (C6-C30) aryl, or 3 to 30 membered heteroaryl; or R 5 and R 6 are bonded to each other to form a monocyclic or polycyclic (C5-C30) alicyclic or aromatic ring, and the ring One or more carbon atoms may be replaced by at least one hetero atom selected from the group consisting of nitrogen, oxygen and sulfur; R 13 to R 15 each independently represent (C1-C30)alkyl, (C6-C30)aryl, or 3 to 30 members of the mixed ; And L 1 and the arylene group extending heteroaryl in Ar 1 and Ar 2 of the alkyl group, aryl group, heteroaryl group and carbazolyl group, and in R 1 to R 7 and R 13 to R 15 of The alkyl, aryl and heteroaryl groups may be substituted by at least one selected from the group consisting of hydrazine, halogen, halogen-substituted or unsubstituted (C1-C30) alkyl, (C6-C30) aryl 3- to 30-membered heteroaryl, (C3-C30)cycloalkyl, tri(C1-C30)alkylnonane substituted or unsubstituted with (C1-C30)alkyl or (C6-C30)aryl , tris(C6-C30)arylalkylene, di(C1-C30)alkyl(C6-C30)aryldecyl,(C1-C30)alkylbis(C6-C30)aryldecyl,fluorene Azyl, bis(C1-C30)alkylamino, bis(C6-C30)arylamino, (C1-C30)alkyl(C6-C30)arylamino, (C6-C30)aryl C1-C30) alkyl, and (C1-C30)alkyl (C6-C30) aryl.

在上揭式(1)中,L1較佳為單鍵或經(C1-C6)烷基取代或未經取代之(C6-C20)伸芳基,更佳為單鍵、伸苯基、或經甲基取代之伸苯基。 In the above formula (1), L 1 is preferably a single bond or a (C1-C6) alkyl substituted or unsubstituted (C6-C20) extended aryl group, more preferably a single bond, a phenyl group, Or a phenyl group substituted by a methyl group.

Y1及Y2各獨立表示-O-、-S-、-CR5R6-或-NR7-,其中,R5至R7各獨立較佳為未經取代之(C1-C6)烷基或未經取代之(C6-C20)芳基、或Y1及Y2鍵結在一起以形成單環或多環之(C5-C20)脂環或芳香環、Y1及Y2更佳為甲基、苯基或螺式鍵結在一起。 Y 1 and Y 2 each independently represent -O-, -S-, -CR 5 R 6 - or -NR 7 -, wherein R 5 to R 7 are each independently preferably unsubstituted (C1-C6) alkane. Or an unsubstituted (C6-C20) aryl group, or Y 1 and Y 2 bonded together to form a monocyclic or polycyclic (C5-C20) alicyclic or aromatic ring, preferably Y 1 and Y 2 It is a methyl, phenyl or spiro bond.

Ar1及Ar2各獨立較佳為氫;鹵素;未經取代之(C1-C6)烷基;經氘、鹵素或(C1-C6)烷基取代或未經取代之(C6-C20)芳基;或未經取代之5至15員雜芳基;更佳為氫、氟、甲基、苯基、經氘取代之苯基、經氟取代之苯基、萘基、聯苯基、經甲基取代之茀基、或咔唑基。 Ar 1 and Ar 2 are each independently preferably hydrogen; halogen; unsubstituted (C1-C6) alkyl; substituted or unsubstituted (C6-C20) aryl by hydrazine, halogen or (C1-C6)alkyl Or an unsubstituted 5 to 15 membered heteroaryl; more preferably hydrogen, fluorine, methyl, phenyl, phenyl substituted by fluorene, phenyl substituted by fluorine, naphthyl, biphenyl, A methyl substituted sulfhydryl group or a carbazolyl group.

R1至R4各獨立較佳為氫、未經取代之(C1-C6)烷基、經二(C6-C20)芳基胺基取代或未經取代之(C6-C20)芳基、未經取代之5至15員雜芳基、或-SiR13R14R15、或R1至R4鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環,更佳為氫、甲基、苯基、經二苯基胺基取代之苯基、咔唑基、或三苯基矽烷基、或經氟取代之苯基、萘基、聯苯基、經甲基取代之茀基、或咔唑基;或鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環。 R 1 to R 4 are each independently hydrogen, unsubstituted (C1-C6)alkyl, substituted or unsubstituted (C6-C20) aryl by di(C6-C20)arylamino group, Substituted 5 to 15 membered heteroaryl, or -SiR 13 R 14 R 15 , or R 1 to R 4 bonded to one or more adjacent substituents to form a monocyclic or polycyclic ring (C5-C30) An alicyclic or aromatic ring, more preferably hydrogen, methyl, phenyl, phenyl substituted with diphenylamine, carbazolyl or triphenylsulfanyl, or phenyl substituted with fluoro, naphthyl And a biphenyl group, a methyl-substituted fluorenyl group, or a carbazolyl group; or a bond to an adjacent one or more substituents to form a monocyclic or polycyclic (C5-C30) alicyclic or aromatic ring.

R11至R17各獨立較佳為未經取代之(C6-C20)芳基,更佳為苯基。 R 11 to R 17 are each independently preferably an unsubstituted (C6-C20) aryl group, more preferably a phenyl group.

在上揭式(1)中,較佳為,L1係單鍵或經(C1-C6)烷基取代或未經取代之(C6-C20)伸芳基;X1及X2各獨立表示CH或N;Y1及Y2各獨立表示-O-、-S-、-CR5R6-或-NR7-,其中, R5至R7各獨立表示未經取代之(C1-C6)烷基或未經取代之(C6-C20)芳基;Ar1及Ar2各獨立表示氫;鹵素;未經取代之(C1-C6)烷基;經氘、鹵素或(C1-C6)烷基取代或未經取代之(C6-C20)芳基;或未經取代之5至15員雜芳基;R1至R4各獨立表示氫、未經取代之(C1-C6)烷基、經二(C6-C20)芳基胺基取代或未經取代之(C6-C20)芳基、未經取代之5至15員雜芳基、或-SiR13R14R15;或R1至R4鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環,其中,R13至R15各獨立表示未經取代之(C6-C20)芳基。 In the above formula (1), it is preferred that the L 1 is a single bond or a (C1-C6)alkyl substituted or unsubstituted (C6-C20) extended aryl group; and X 1 and X 2 are each independently represented. CH or N; Y 1 and Y 2 each independently represent -O-, -S-, -CR 5 R 6 - or -NR 7 -, wherein R 5 to R 7 each independently represent unsubstituted (C1-C6 An alkyl or unsubstituted (C6-C20) aryl group; Ar 1 and Ar 2 each independently represent hydrogen; halogen; unsubstituted (C1-C6) alkyl; oxime, halogen or (C1-C6) Alkyl-substituted or unsubstituted (C6-C20) aryl; or unsubstituted 5 to 15 membered heteroaryl; R 1 to R 4 each independently represent hydrogen, unsubstituted (C1-C6) alkyl a (C6-C20) aryl group substituted or unsubstituted with a bis(C6-C20)arylamino group, an unsubstituted 5 to 15 membered heteroaryl group, or -SiR 13 R 14 R 15 ; or R 1 And R 4 is bonded to one or more adjacent substituents to form a monocyclic or polycyclic (C5-C30) alicyclic or aromatic ring, wherein R 13 to R 15 each independently represent unsubstituted (C6 -C20) aryl.

更具體而言,L1表示單鍵、伸苯基、伸聯苯基、伸聯三苯基、伸茚基、伸茀基、伸聯伸三苯基、伸芘基、伸苝基、伸蒯基、伸稠四苯基、伸丙二烯合茀基、伸噻吩基、伸吡咯基、伸吡唑基、伸噻唑基、伸唑基、伸二唑基、伸三基、伸四基、伸三唑基、伸呋吖基、伸吡啶基、伸苯并呋喃基、伸苯并噻吩基、伸吲哚基、伸苯并咪唑基、伸苯并噻唑基、伸苯并異噻唑基、伸苯并異唑基、伸苯并唑基、伸苯并噻二唑基、伸二苯并呋喃基或伸二苯并噻吩基;Ar1及Ar2各獨立表示氫、甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、異戊基、正己基、正庚基、正辛基、2-乙基己基、正壬基、癸基、十二基、十六基、三氟甲基、全氟乙基、三氟乙基、全氟丙基、全氟丁基、苯基、聯苯基、茀基、丙二烯合茀基、聯三苯基、芘基、蒯基、稠四苯基、苝基、吡啶基、吡咯基、呋喃基、噻吩基、咪唑基、苯并咪唑基、喹啉基、三 基、苯并呋喃基、二苯并呋喃基、苯并噻吩基、二苯并噻吩基、吡唑基、吲哚基、咔唑基、噻唑基、唑基、苯并噻唑基、苯并唑基、啡啉基、喹啉基、或N-咔唑基;R1至R4各獨立表示氫、氘、氯基、氟基、甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、異戊基、正己基、正庚基、正辛基、2-乙基己基、正壬基、癸基、十二基、十六基、三氟甲基、全氟乙基、三氟乙基、全氟丙基、全氟丁基、苯基、萘基、蒽基(anthryl)、聯苯基、茀基、丙二烯合茀基、聯伸三苯基、芘基、蒯基、稠四苯基、苝基、吡啶基、吡咯基、呋喃基、噻吩基、咪唑基、苯并咪唑基、茚基、吡基、嘧啶基、嗒基、喹啉基、三基、苯并呋喃基、二苯并呋喃基、苯并噻吩基、二苯并噻吩基、吡唑基、吲哚基、咔唑基、噻唑基、唑基、苯并噻唑基、苯并唑基、啡啉基、三甲基矽烷基、三乙基矽烷基、三丙基矽烷基、三(第三丁基)矽烷基、第三丁基二甲基矽烷基、二甲基苯基矽烷基、甲基二苯基矽烷基或三苯基矽烷基;該L1、Ar1、Ar2及R1至R4中之取代基各獨立可經選自下列所組成群組之至少一者取代:氘、氯基、氟基、甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正戊基、異戊基、正己基、正庚基、正辛基、2-乙基己基、正壬基、癸基、十二基、十六基、三氟甲基、全氟乙基、三氟乙基、全氟丙基、全氟丁基、苯基、萘基、聯苯基、9,9-二甲基茀基、9,9-二苯基茀基、丙二烯合茀基、聯伸三苯基、芘基、蒯基、稠四苯基、苝 基、二甲基胺基、二乙基胺基、甲基苯基胺基、二苯基胺基、三甲基矽烷基、三乙基矽烷基、三丙基矽烷基、三(第三丁基)矽烷基、第三丁基二甲基矽烷基、二甲基苯基矽烷基、甲基二苯基矽烷基、三苯基矽烷基、N-咔唑基及N-苯基咔唑基。 More specifically, L 1 represents a single bond, a phenyl group, a phenyl group, a triphenyl group, a fluorene group, a hydrazine group, a stretched triphenyl group, a hydrazine group, a hydrazine group, and a hydrazine group. Base, thickened tetraphenyl, acrodiene thiol, thienyl, thyrrolyl, pyrazolyl, thiazolyl, extens Azolyl Diazolyl, stretched three Base, stretch four , triazole, exofuran, pyridyl, benzofuranyl, benzothiophene, decyl, benzimidazolyl, benzothiazolyl, benzoisothiazolyl Benzene Azolyl Azolyl, benzothiadiazolyl, dibenzofuranyl or dibenzothiophenyl; Ar 1 and Ar 2 each independently represent hydrogen, methyl, ethyl, n-propyl, isopropyl, n-butyl , isobutyl, tert-butyl, n-pentyl, isopentyl, n-hexyl, n-heptyl, n-octyl, 2-ethylhexyl, n-decyl, decyl, dodecyl, hexadecanyl, Trifluoromethyl, perfluoroethyl, trifluoroethyl, perfluoropropyl, perfluorobutyl, phenyl, biphenyl, anthryl, alkadienyl, triphenyl, fluorenyl, Mercapto, fused tetraphenyl, fluorenyl, pyridyl, pyrrolyl, furyl, thienyl, imidazolyl, benzimidazolyl, quinolyl, tri Base, benzofuranyl, dibenzofuranyl, benzothienyl, dibenzothiophenyl, pyrazolyl, fluorenyl, oxazolyl, thiazolyl, Azolyl, benzothiazolyl, benzo Azyl, morpholinyl, quin a phenyl group, or an N-carbazolyl group; each of R 1 to R 4 independently represents hydrogen, deuterium, chloro, fluoro, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, Tertiary butyl, n-pentyl, isopentyl, n-hexyl, n-heptyl, n-octyl, 2-ethylhexyl, n-decyl, decyl, dodecyl, hexadecanyl, trifluoromethyl, Perfluoroethyl, trifluoroethyl, perfluoropropyl, perfluorobutyl, phenyl, naphthyl, anthryl, biphenyl, anthracenyl, allyldienyl, orthotriphenyl , mercapto, fluorenyl, fused tetraphenyl, fluorenyl, pyridyl, pyrrolyl, furyl, thienyl, imidazolyl, benzimidazolyl, fluorenyl, pyridyl Base, pyrimidinyl, oxime Base, quinolyl, three Base, benzofuranyl, dibenzofuranyl, benzothienyl, dibenzothiophenyl, pyrazolyl, fluorenyl, oxazolyl, thiazolyl, Azolyl, benzothiazolyl, benzo Azyl, morpholinyl, trimethyldecyl, triethyldecyl, tripropyldecyl, tris(t-butyl)decyl, tert-butyldimethylalkyl, dimethylphenyl a decyl group, a methyldiphenyl fluorenyl group or a triphenyl fluorenyl group; the substituents of the L 1 , Ar 1 , Ar 2 and R 1 to R 4 each independently may be at least one selected from the group consisting of the following Replace: hydrazine, chloro, fluoro, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, n-pentyl, isopentyl, n-hexyl, positive Heptyl, n-octyl, 2-ethylhexyl, n-decyl, decyl, dodecyl, hexadecyl, trifluoromethyl, perfluoroethyl, trifluoroethyl, perfluoropropyl, perfluoro Butyl, phenyl, naphthyl, biphenyl, 9,9-dimethylindenyl, 9,9-diphenylfluorenyl, allyldienyl, tert-triphenyl, anthracenyl, fluorenyl , thick tetraphenyl, decyl, dimethylamino, diethylamino, methylphenylamino, diphenylamino, trimethyldecyl, triethyldecyl, tripropyldecane Base, tris(t-butyl)decyl, tert-butyldimethylalkyl, dimethyl Silicon phenyl group, diphenyl methyl group silicon, silicon triphenyl group, N- phenyl-N- carbazolyl group and a carbazolyl group.

在上揭式(1)中,該部份係選自下列結構,但不限於此: In the above (1), Some are selected from the following structures, but are not limited to this:

其中,R5、R6及R7之定義如式(1)中之定義。 Wherein R 5 , R 6 and R 7 are as defined in the formula (1).

本發明之代表性化合物包含下列化合物: Representative compounds of the invention comprise the following compounds:

本發明之有機電場發光化合物可以依據下列反應方案製備。 The organic electroluminescent compound of the present invention can be prepared according to the following reaction scheme.

其中,L1、Ar1、Ar2、X1、X2、Y1、Y2、R1至R4、a、b、c及d之定義如同上述式(1)之定義,及Hal表示鹵素。 Wherein, L 1 , Ar 1 , Ar 2 , X 1 , X 2 , Y 1 , Y 2 , R 1 to R 4 , a, b, c and d are defined as defined in the above formula (1), and Hal represents halogen.

此外,本發明提供包括該式(1)之化合物之有機電場發光裝置。該有機電場發光裝置包括第一電極、第二電極、以及至少一層插置於該第一電極以及第二電極間的有機層。該有機層包括至少一種本發明之式(1)之化合物。再者,該有機層包括發光層,其中該發光層包括式(1)之化合物作為主體材料。 Further, the present invention provides an organic electric field light-emitting device comprising the compound of the formula (1). The organic electric field light-emitting device includes a first electrode, a second electrode, and at least one organic layer interposed between the first electrode and the second electrode. The organic layer comprises at least one compound of the formula (1) of the present invention. Furthermore, the organic layer comprises a light-emitting layer, wherein the light-emitting layer comprises a compound of the formula (1) as a host material.

此外,與本發明之主體材料一起用於有機電場發光裝置之磷光摻雜劑,可選自由下列式(2)表示之化合物:M 1 L 101 L 102 L 103 ---(2) Further, a phosphorescent dopant for use in an organic electric field light-emitting device together with the host material of the present invention may be selected from compounds represented by the following formula (2): M 1 L 101 L 102 L 103 ---(2)

其中,M1係選自Ir、Pt、Pd及Os所組成群組;L101、L102及L103各獨立選自下列結構: Wherein, M 1 is selected from the group consisting of Ir, Pt, Pd and Os; L 101 , L 102 and L 103 are each independently selected from the following structures:

R201至R203各獨立表示氫、氘、未經取代或經一個或多個鹵素取代之(C1-C30)烷基、未經取代或經一個或多個(C1-C30)烷基取代之(C6-C30)芳基、或鹵素; R204至R219各獨立表示氫、氘、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C1-C30)烷氧基、經取代或未經取代之(C3-C30)環烷基、經取代或未經取代之 (C2-C30)烯基、經取代或未經取代之(C6-C30)芳基、經取代或未經取代之單或二(C1-C30)烷基胺基、經取代或未經取代之單或二(C6-C30)芳基胺基、SF5、經取代或未經取代之三(C1-C30)烷基矽烷基、經取代或未經取代之二(C1-C30)烷基(C6-C30)芳基矽烷基、經取代或未經取代之三(C6-C30)芳基矽烷基、氰基或鹵素;R220至R223各獨立表示氫、氘、未經取代或經一個或多個鹵素取代之(C1-C30)烷基、或未經取代或經一個或多個(C1-C30)烷基取代之(C6-C30)芳基;R224及R225各獨立表示氫、氘、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、或鹵素;或R224及R225鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環;R226表示經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、經取代或未經取代之5或30員雜芳基或鹵素;R227至R229各獨立表示氫、氘、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基或鹵素; Q表示;R231至R242各獨立表示氫、氘、未經取代或經一個或多個鹵素取代之(C1-C30)烷基、(C1-C30)烷氧基、鹵素、經取代或未經取代之(C6-C30)芳基、氰基、或經取代或未經取代之(C5-C30) 環烷基;或每一個R231至R242可透過伸烷基或伸烯基鍵結至相鄰取代基以形成螺環或稠合環或者可透過伸烷基或伸烯基鍵結至R207或R208以形成飽和或不飽和之稠合環。 R 201 to R 203 each independently represent hydrogen, deuterium, unsubstituted or substituted by one or more halogen (C1-C30) alkyl groups, unsubstituted or substituted by one or more (C1-C30) alkyl groups. (C6-C30) aryl, or halogen; R 204 to R 219 each independently represent hydrogen, deuterium, substituted or unsubstituted (C1-C30) alkyl, substituted or unsubstituted (C1-C30) Alkoxy, substituted or unsubstituted (C3-C30)cycloalkyl, substituted or unsubstituted (C2-C30)alkenyl, substituted or unsubstituted (C6-C30) aryl, Substituted or unsubstituted mono or di(C1-C30)alkylamino, substituted or unsubstituted mono or di(C6-C30)arylamino, SF 5 , substituted or unsubstituted Tri(C1-C30)alkyldecane, substituted or unsubstituted bis(C1-C30)alkyl(C6-C30)aryldecyl, substituted or unsubstituted tris(C6-C30)aryl Alkyl, cyano or halogen; R 220 to R 223 each independently represent hydrogen, deuterium, unsubstituted or substituted by one or more halo (C1-C30) alkyl groups, or unsubstituted or via one or more a (C1-C30) alkyl substituent of (C6-C30) aryl; R 224 and R 225 each independently represents hydrogen, , Substituted or non-substituted (C1-C30) alkyl, substituted or non-substituted (C6-C30) aryl, or halogen; or R 224 and R 225 bonded to one or more of the adjacent a substituent to form a monocyclic or polycyclic (C5-C30) alicyclic or aromatic ring; R 226 represents a substituted or unsubstituted (C1-C30) alkyl group, substituted or unsubstituted (C6-C30 Aryl, substituted or unsubstituted 5 or 30 membered heteroaryl or halogen; R 227 to R 229 each independently represent hydrogen, deuterium, substituted or unsubstituted (C1-C30) alkyl, substituted Or unsubstituted (C6-C30) aryl or halogen; Q represents ; R 231 to R 242 each independently represent hydrogen, deuterium, unsubstituted or substituted by one or more halogens (C1-C30)alkyl, (C1-C30) alkoxy, halogen, substituted or unsubstituted (C6-C30) aryl, cyano, or substituted or unsubstituted (C5-C30) cycloalkyl; or each R 231 to R 242 permeable to alkyl or alkenyl bonded to the phase The ortho substituent is formed to form a spiro or fused ring or is permeable to an alkyl or alkenyl group to R 207 or R 208 to form a saturated or unsaturated fused ring.

式(2)之摻雜劑包含下列者,但不限於此: The dopant of the formula (2) includes the following, but is not limited thereto:

本發明之有機電場發光裝置,除了包括式(1)表示之化合物外,可復包括選自下列所組成群組之至少一種化合物:芳基胺系化合物以及苯乙烯基芳基胺系化合物。 The organic electroluminescence device of the present invention may further comprise at least one compound selected from the group consisting of an arylamine-based compound and a styrylarylamine-based compound, in addition to the compound represented by the formula (1).

在本發明之有機電場發光裝置中,該有機層可復包括選自週期表上第1族之金屬、第2族之金屬、第4週期之過渡金屬、第5週期之過渡金屬、鑭系金屬以及d族過鍍元素之有機金屬所組成群組之至少一種金屬,或包括該金屬之至少一種錯合物。該有機層可包括發光層以及電荷產生層。 In the organic electric field light-emitting device of the present invention, the organic layer may further comprise a metal selected from Group 1 of the periodic table, a metal of the second group, a transition metal of the fourth cycle, a transition metal of the fifth cycle, and a lanthanide metal. And at least one metal of the group consisting of organometallics of the d-group plating element, or at least one complex of the metal. The organic layer may include a light emitting layer and a charge generating layer.

此外,除了包括本發明之化合物外,該有機電場發光裝置可藉由復包括至少一層發光層,該發光層包括藍光電場發光化合物、紅光電場發光化合物或綠光電場發光化合物,以發出白光。 Furthermore, in addition to the compound of the present invention, the organic electroluminescent device may comprise at least one luminescent layer comprising a blue electric field luminescent compound, a red electric field luminescent compound or a green electric field luminescent compound to emit white light.

較佳地,在本發明之有機電場發光裝置中,可將至少一層選自硫屬化合物(chalcogenide)層、金屬鹵化物層以及金屬氧化物層之層體(後文中表示「表面層」)設置於單一或兩個電極之一個或多個內表面上。具體而言,較佳為將矽或鋁之硫屬化合物(包含氧化物)層設置於電場發光介質層之陽極表面上,以及將金屬鹵化物層或金屬氧化物層設置於電場發光介質層之陰極表面上。該等表面層提供該有機電場發光裝置之操作安定性。較佳地,該硫屬化合物包含SiOX(1≦X≦2)、AlOX(1≦X≦1.5)、SiON、SiAlON等;該金屬鹵化物包含LiF、MgF2、CaF2、稀土金屬氟化物等;以及該金屬氧化物包含Cs2O、Li2O、MgO、SrO、BaO、CaO 等。 Preferably, in the organic electroluminescence device of the present invention, at least one layer selected from the group consisting of a chalcogenide layer, a metal halide layer, and a metal oxide layer (hereinafter referred to as "surface layer") may be provided. On one or more inner surfaces of a single or two electrodes. Specifically, it is preferable to provide a layer of a chalcogen compound (including an oxide) of bismuth or aluminum on the anode surface of the electric field luminescent medium layer, and to provide a metal halide layer or a metal oxide layer on the luminescent medium layer. On the surface of the cathode. The surface layers provide operational stability of the organic electric field illuminating device. Preferably, the chalcogen compound comprises SiO X (1≦X≦2), AlO X (1≦X≦1.5), SiON, SiAlON, etc.; the metal halide comprises LiF, MgF 2 , CaF 2 , rare earth metal fluoride And a metal oxide containing Cs 2 O, Li 2 O, MgO, SrO, BaO, CaO, or the like.

較佳地,在本發明之有機電場發光裝置中,可在電極對之至少一個表面上設置電子傳輸化合物及還原性摻雜劑之混合區、或電洞傳輸化合物及氧化性摻雜劑之混合區。在此例中,將該電子傳輸化合物還原成陰離子,而使得易於自該混合區注入及傳輸電子至電場發光介質。再者,將該電洞傳輸化合物氧化成陽離子,而使得易於自該混合區注入及傳輸電洞至該電場發光介質。較佳地,該氧化性摻雜劑包含多種路易士酸及受體化合物;以及該還原性摻雜劑包含鹼金屬、鹼金屬化合物、鹼土金屬、稀土金屬、及其混合物。可使用還原性摻雜層作為電荷產生層以製備具有二層或多層電場發光層且發射白光之電場發光裝置。 Preferably, in the organic electric field light-emitting device of the present invention, a mixing region of the electron transporting compound and the reducing dopant, or a mixture of the hole transporting compound and the oxidizing dopant may be disposed on at least one surface of the electrode pair. Area. In this case, the electron transporting compound is reduced to an anion, making it easy to inject and transport electrons from the mixing zone to the electric field illuminating medium. Furthermore, the hole transport compound is oxidized to a cation such that it is easy to inject and transport holes from the mixing zone to the electric field illuminating medium. Preferably, the oxidizing dopant comprises a plurality of Lewis acids and acceptor compounds; and the reducing dopant comprises an alkali metal, an alkali metal compound, an alkaline earth metal, a rare earth metal, and a mixture thereof. A reductive doping layer can be used as the charge generating layer to prepare an electric field illuminating device having two or more layers of an electroluminescent layer and emitting white light.

後文,將參考下列實施例詳細描述本發明之用於有機電場發光化合物、該化合物之製備方法,以及包括該化合物之裝置的發光性質: Hereinafter, the organic electroluminescent compound, the preparation method of the compound, and the luminescent properties of the device including the compound of the present invention will be described in detail with reference to the following examples:

實施例1:化合物C-55之製備 Example 1: Preparation of Compound C-55

化合物1-1之製備 Preparation of Compound 1-1

混合2-溴-9,9-二甲基-9H-茀(50克(g),0.183莫耳 (mol))、2-氯苯胺(57毫升(ml),0.549莫耳)、Pd(OAc)2(1.6克,0.007莫耳)、P(t-Bu)3(7.2毫升,0.0146莫耳)、NaOt-Bu(44克,0.458莫耳)及甲苯(500毫升)後,在120℃攪拌該反應混合物12小時。終止該反應後,以乙酸乙酯(EA)萃取該反應混合物。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物1-1(32克,55%)。 Mix 2-bromo-9,9-dimethyl-9H-indole (50 g (g), 0.183 mol (mol)), 2-chloroaniline (57 ml (ml), 0.549 mol), Pd (OAc) 2 (1.6 g, 0.007 mol), P(t-Bu) 3 (7.2 ml, 0.0146 mol), NaOt-Bu (44 g, 0.458 mol) and toluene (500 ml), stirred at 120 ° C The reaction mixture was allowed to stand for 12 hours. After the reaction was terminated, the reaction mixture was extracted with ethyl acetate (EA). The obtained organic layer was dried (MgSO 4 ), filtered, evaporated, evaporated,

化合物1-2之製備 Preparation of Compound 1-2

混合化合物1-1(32克,0.1莫耳)、Pd(OAc)2(1.1克,0.005莫耳)、四氟硼酸二-第三丁基(甲基)鏻(2.48克,0.01莫耳)、K2CO3(42克,0.30莫耳)及DMA(550毫升)後,在200℃攪拌該反應混合物12小時。終止該反應後,以EA萃取該反應混合物。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物1-2(14克,47%)。 Mixed compound 1-1 (32 g, 0.1 mol), Pd(OAc) 2 (1.1 g, 0.005 mol), di-t-butyl(methyl)phosphonium tetrafluoroborate (2.48 g, 0.01 mol) After K 2 CO 3 (42 g, 0.30 mol) and DMA (550 ml), the reaction mixture was stirred at 200 ° C for 12 hours. After the reaction was terminated, the reaction mixture was extracted with EA. The organic layer was dried over MgSO 4 of the resulting, filtered, evaporated under reduced pressure to remove the solvent, and was filtered through column to give compound 1-2 (14 g, 47%).

化合物1-3之製備 Preparation of Compound 1-3

混合9,9-二甲基茀-2-硼酸(30g,126.0毫莫耳(mmol))、1,3-二溴苯(30.45毫升,252.00毫莫耳)、PdCl2(PPh3)2(2.6克,3.78毫莫耳)、2M Na2CO3(160毫升)及甲苯(500毫升)後,在100℃加熱該反應混合物。5小時後,將該反應混合物冷卻至室溫,以EA萃取,以蒸餾水清洗,以MgSO4乾燥,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物1-3(80克,67.46%)。 Mix 9,9-dimethylindole-2-boronic acid (30 g, 126.0 mmol (mmol)), 1,3-dibromobenzene (30.45 ml, 252.00 mmol), PdCl 2 (PPh 3 ) 2 ( After 2.6 g, 3.78 mmol, 2M Na 2 CO 3 (160 mL) and toluene (500 mL), the reaction mixture was heated at 100 °C. After 5 hours, the reaction mixture was cooled to room temperature, extracted with EA, washed with distilled water, dried over MgSO 4, filtered, evaporated under reduced pressure to remove the solvent, and was filtered through column to give compound 1-3 (80 g , 67.46%).

化合物1-4之製備 Preparation of compound 1-4

將化合物1-3(30克,85.89毫莫耳)溶解於四氫呋喃(THF)(500毫升)、及在-78℃添加2.5M正丁基鋰(n-BuLi)之己烷溶液(41.23毫升,103.07毫莫耳)至該反應混合物後,攪拌該反應混合物1小時。在室溫攪拌該反應混合物12小時,伴隨緩慢添加B(OMe)3(14.36毫升,128.84毫莫耳)至該反應混合物,及緩慢增加溫度。以EA萃取後,以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及以EA及己烷再結晶以得到化合物1-4(24克,68.93%)。 Compound 1-3 (30 g, 85.89 mmol) was dissolved in tetrahydrofuran (THF) (500 ml), and a solution of 2.5 M n-butyllithium (n-BuLi) in hexane (41.23 ml) was added at -78 °C. After 103.07 mmoles to the reaction mixture, the reaction mixture was stirred for 1 hour. The reaction mixture was stirred at room temperature for 12 hours with the slow addition of B(OMe) 3 (14.36 mL, 128.84 mmol) to the reaction mixture and slowly increasing temperature. After extraction with EA, the obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and recrystallized from EA and hexane to give compound 1-4 (24 g, 68.93%) .

化合物1-5之製備 Preparation of compound 1-5

混合2,4-二氯嘧啶(7克,46.98毫莫耳)、化合物1-4(16.2克,51.68毫莫耳)、Pd(PPh3)4(1.62克,1.40毫莫耳)、2M Na2CO3(60毫升)及二甲醚(DME)(400毫升)後,在90℃攪拌該反應混合物。4小時後,將該反應混合物冷卻至室溫,添加蒸餾水,及以EA萃取該反應混合物。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物1-5(14克,77.83%)。 Mix 2,4-dichloropyrimidine (7 g, 46.98 mmol), compound 1-4 (16.2 g, 51.68 mmol), Pd(PPh 3 ) 4 (1.62 g, 1.40 mmol), 2M Na After 2 CO 3 (60 ml) and dimethyl ether (DME) (400 ml), the reaction mixture was stirred at 90 °C. After 4 hours, the reaction mixture was cooled to room temperature, distilled water was added, and the mixture was extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and filtered through a column to obtain compound 1-5 (14 g, 77.83%).

化合物C-55之製備 Preparation of Compound C-55

將化合物1-2(4.5克,15.89毫莫耳)及化合物1-5(7.3克,19.07毫莫耳)溶解於二甲基甲醯胺(DMF)(130毫升)後,將60% NaH(於礦物油中,0.76克,19.07毫莫耳)緩慢添加至該混合物,及在室溫攪拌12小時。終止該反應後,將MeOH添加至該反應混合物。透過矽膠過濾該所得之 固體,以EA及DMF再結晶以得到化合物C-55(1.8克,18%)。 After compound 1-2 (4.5 g, 15.89 mmol) and compound 1-5 (7.3 g, 19.07 mmol) were dissolved in dimethylformamide (DMF) (130 ml), 60% NaH ( In mineral oil, 0.76 g, 19.07 mmol was slowly added to the mixture and stirred at room temperature for 12 hours. After the reaction was terminated, MeOH was added to the reaction mixture. Filter the resulting by gelatin The solid was recrystallized from EA and DMF to afford compound C-55 (l.

MS/FAB實測值630;計算值629.79 MS/FAB measured value 630; calculated value 629.79

實施例2:化合物C-56之製備 Example 2: Preparation of Compound C-56

化合物2-1之製備 Preparation of Compound 2-1

混合3-聯三苯基硼酸(8.2克,29.9毫莫耳)、2,4-二氯嘧啶(6.6克,44.9毫莫耳)、Pd(PPh3)4(1.7克,1.5毫莫耳)、Na2CO3(7.9克,74.8毫莫耳)、甲苯(100毫升)、EtOH(25毫升)及純水(25毫升)後,在回流下攪拌該反應混合物5小時。終止該反應後,將該反應混合物冷卻至室溫,及過濾。以MgSO4乾燥該所得之有機層,減壓下濃縮,透過矽膠過濾。減壓下濃縮殘餘溶液以得到化合物2-1(7克,70%)。 Mix 3-triphenylboronic acid (8.2 g, 29.9 mmol), 2,4-dichloropyrimidine (6.6 g, 44.9 mmol), Pd(PPh 3 ) 4 (1.7 g, 1.5 mmol) After Na 2 CO 3 (7.9 g, 74.8 mmol), toluene (100 ml), EtOH (25 ml) and purified water (25 ml), the reaction mixture was stirred under reflux for 5 hours. After the reaction was terminated, the reaction mixture was cooled to room temperature and filtered. The obtained organic layer was dried with MgSO 4 The residual solution was concentrated under reduced pressure to give Compound 2-1 (7 g, 70%).

化合物C-56之製備 Preparation of Compound C-56

將化合物1-2(3.27克,11.5毫莫耳)溶解於DMF(80毫升)後,在0℃添加NaH(507毫克,12.7毫莫耳),及攪拌10分鐘。將化合物2-1(4.2克,12.1毫莫耳)添加至該反應混合物,及攪拌7小時。終止該反應後,將MeOH添加至該反應混合物。透過矽膠過濾該所得之固體,以DMF再結晶以得到化合物C-56(3.4克,50%)。 After dissolving Compound 1-2 (3.27 g, 11.5 mmol) in DMF (80 mL), NaH (507 mg, 12.7 mmol) was added at 0 ° C and stirred for 10 min. Compound 2-1 (4.2 g, 12.1 mmol) was added to the reaction mixture and stirred for 7 hours. After the reaction was terminated, MeOH was added to the reaction mixture. The obtained solid was filtered through EtOAc (EtOAc) (EtOAc)

MS/FAB實測值590;計算值589.73 MS/FAB measured value 590; calculated value 589.73

實施例3:化合物C-67之製備 Example 3: Preparation of Compound C-67

化合物3-1之製備 Preparation of Compound 3-1

混合4-二苯并噻吩硼酸(10克,43.84毫莫耳)、2-溴硝基苯(10.6克,52.61毫莫耳)、Pd(PPh3)4(2.53克,2.19毫莫耳)、2M K2CO3(50毫升)、甲苯(200毫升)及乙醇(50毫升)後,在回流下攪拌該反應混合物。4小時後,將該反應混合物冷卻至室溫及添加蒸餾水,及以EA萃取。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物3-1(11克,82.17%)。 Mix 4-dibenzothiopheneboronic acid (10 g, 43.84 mmol), 2-bromonitrobenzene (10.6 g, 52.61 mmol), Pd(PPh 3 ) 4 (2.53 g, 2.19 mmol), After 2 M K 2 CO 3 (50 ml), toluene (200 ml) and ethanol (50 ml), the reaction mixture was stirred under reflux. After 4 hours, the reaction mixture was cooled to room temperature and distilled water was added and extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and filtered through a column to obtain Compound 3-1 (11 g, 82.17%).

化合物3-2之製備 Preparation of Compound 3-2

混合化合物3-1(11克,36.02毫莫耳)、P(OEt)3(100毫升)及1,2-二氯苯(100毫升)後,在150℃回流下攪拌該反應混合物。5小時後,將該反應混合物冷卻至室溫,減壓蒸餾,及透過管柱過濾以得到化合物3-2(7克,25.60毫莫耳,71.13%)。 After mixing compound 3-1 (11 g, 36.02 mmol), P(OEt) 3 (100 ml) and 1,2-dichlorobenzene (100 ml), the reaction mixture was stirred at 150 ° C under reflux. After 5 hours, the reaction mixture was cooled to room temperature, distilled under reduced pressure, and filtered through a column to afford compound 3-2 (7 g, 25.60 mmol, 71.13%).

化合物3-3之製備 Preparation of Compound 3-3

將2,4,6-三氯-1,3,5-三(43.5克,236毫莫耳)溶解於THF(230毫升)後,在-78℃攪拌該反應混合物(反應混合物A)。將化合物3-2(22克,79毫莫耳)溶解於THF(150毫升)後,將該反應混合物放置於NaH(4.7克,118毫莫耳)中(反應混合物B)。緩慢將反應混合物B放置於反應混合物A中後,攪拌該反應混合物4小時。攪拌後緩慢添加蒸餾水(500毫升),及攪拌30分鐘。該所得之固體透過管柱層析法過濾及再結晶以得到化合物3-3(31克,92%)。 Will 2,4,6-trichloro-1,3,5-three (43.5 g, 236 mmol) After dissolving in THF (230 ml), the reaction mixture was stirred at -78 °C (reaction mixture A). After dissolving compound 3-2 (22 g, 79 mmol) in THF (150 mL), the reaction mixture was taken in NaH (4.7 g, 118 m. After the reaction mixture B was slowly placed in the reaction mixture A, the reaction mixture was stirred for 4 hours. After stirring, distilled water (500 ml) was slowly added, and stirred for 30 minutes. The solid obtained was filtered through column chromatography and recrystallized to give compound 3-3 (31 g, 92%).

化合物3-4之製備 Preparation of compound 3-4

混合化合物3-3(12克,28毫莫耳)、聯苯-3-基硼酸(6克,31毫莫耳)、Na2CO3(8克,71毫莫耳)、甲苯(370毫升)、蒸餾水(36毫升)及Pd(PPh3)4(1克,0.9毫莫耳)後,在120℃攪拌該反應混合物。5小時後,將該反應混合物冷卻至室溫,添加蒸餾水,及以EA萃取該反應混合物。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除該溶劑。該所得之固體以甲醇清洗,過濾,乾燥及透過管柱層析法過濾及再結晶以得到化合物3-4(15克,98%)。 Mixed compound 3-3 (12 g, 28 mmol), biphenyl-3-ylboronic acid (6 g, 31 mmol), Na 2 CO 3 (8 g, 71 mmol), toluene (370 ml) After distilling water (36 ml) and Pd(PPh 3 ) 4 (1 g, 0.9 mmol), the reaction mixture was stirred at 120 °C. After 5 hours, the reaction mixture was cooled to room temperature, distilled water was added, and the mixture was extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water and distilled under reduced pressure to remove solvent. The solid obtained was washed with methanol, filtered, dried and filtered and purified by column chromatography to afford compound 3-4 (15 g, 98%).

化合物C-67之製備 Preparation of Compound C-67

混合化合物3-4(8.5克,16毫莫耳)、苯基硼酸(3克,23毫莫耳)、Na2CO3(5克,47毫莫耳)、甲苯(168毫升)、蒸餾水(24毫升)、乙醇(24毫升)及Pd(PPh3)4(1克,0.9毫莫耳)後,在120℃攪拌該反應混合物。5小時,將該反應混合物冷卻至室溫,添加蒸餾水,及以EA萃取該反應混 合物。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除該溶劑。該所得之固體以甲醇清洗,過濾,乾燥,及透過管柱層析法過濾及再結晶以得到化合物C-67(6.1克,66%)。 Mix compound 3-4 (8.5 g, 16 mmol), phenylboronic acid (3 g, 23 mmol), Na 2 CO 3 (5 g, 47 mmol), toluene (168 mL), distilled water ( After 24 ml), ethanol (24 ml) and Pd(PPh 3 ) 4 (1 g, 0.9 mmol), the reaction mixture was stirred at 120 °C. After 5 hours, the reaction mixture was cooled to room temperature, distilled water was added, and the mixture was extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water and distilled under reduced pressure to remove solvent. The obtained solid was washed with methanol, filtered, dried, and filtered and purified by column chromatography to afford Compound C-67 (6.1 g, 66%).

MS/FAB實測值581;計算值580.70 MS/FAB measured value 581; calculated value 580.70

實施例4:化合物C-87之製備 Example 4: Preparation of Compound C-87

化合物C-87之製備 Preparation of Compound C-87

將化合物1-5(10.5克,27.44毫莫耳)及化合物3-2(5克,18.29毫莫耳)溶解於DMF(100毫升)後,將60% NaH(於礦物油中,1.08克,27.44毫莫耳)緩慢添加至該混合物,及在室溫攪拌12小時。終止該反應後,將蒸餾水添加至該反應混合物。在減壓下過濾該所得之固體,及將該所得之固體溶解於CHCl3,及透過管柱過濾以得到化合物C-87(7.5克,67.25%)。 After dissolving compound 1-5 (10.5 g, 27.44 mmol) and compound 3-2 (5 g, 18.29 mmol) in DMF (100 mL), 60% NaH (in mineral oil, 1.08 g, 27.44 mmol was slowly added to the mixture and stirred at room temperature for 12 hours. After the reaction was terminated, distilled water was added to the reaction mixture. The obtained solid was filtered under reduced pressure, and the obtained solid was dissolved in CHCl 3 and filtered through a column to give Compound C-87 (7.5 g, 67.25%).

MS/FAB實測值620;計算值619.78 MS/FAB measured value 620; calculated value 619.78

實施例5:化合物C-88之製備 Example 5: Preparation of Compound C-88

化合物C-88之製備 Preparation of Compound C-88

將化合物3-2(3.5克,12.83毫莫耳)及化合物2-1(4克,11.66毫莫耳)溶解於DMF(150毫升)後,將60% NaH(於礦物油中,0.7克,17.50毫莫耳)緩慢添加至該混合物,及在室溫攪拌12小時。終止該反應後,將蒸餾水添加至該反應混合物。在減壓下過濾該所得之固體,及依順序以EA、DMF及THF清洗該所得之固體,以得到化合物C-88(3.7克,49.74%)。 After compound 3-2 (3.5 g, 12.83 mmol) and compound 2-1 (4 g, 11.66 mmol) were dissolved in DMF (150 mL), 60% NaH (in mineral oil, 0.7 g, 17.50 mmol was slowly added to the mixture and stirred at room temperature for 12 hours. After the reaction was terminated, distilled water was added to the reaction mixture. The obtained solid was filtered under reduced pressure, and the obtained solid was washed with EA, DMF and THF to afford Compound C-88 (3.7 g, 49.74%).

MS/FAB實測值580;計算值579.71 MS/FAB measured value 580; calculated value 579.71

實施例6:化合物C-91之製備 Example 6: Preparation of Compound C-91

化合物6-1之製備 Preparation of Compound 6-1

混合4-二苯并噻吩硼酸(40克,175.36毫莫耳)、溴苯(36.8毫升,350.73毫莫耳)、Pd(PPh3)4(4.05克,3.50毫莫耳)、2M Na2CO3(220毫升)、甲苯(600毫升)及乙醇(60毫升)後,在100℃攪拌該反應混合物。3小時後,將該反應混合物冷卻至室溫及添加蒸餾水,及以EA萃取。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物6-1(35克,76.57%)。 Mix 4-dibenzothiopheneboronic acid (40 g, 175.36 mmol), bromobenzene (36.8 ml, 350.73 mmol), Pd(PPh 3 ) 4 (4.05 g, 3.50 mmol), 2M Na 2 CO After 3 (220 ml), toluene (600 ml) and ethanol (60 ml), the reaction mixture was stirred at 100 °C. After 3 hours, the reaction mixture was cooled to room temperature and distilled water was added and extracted with EA. The obtained organic layer was dried with MgSO 4 , filtered, evaporated, evaporated,

化合物6-2之製備 Preparation of compound 6-2

將化合物6-1(35克,134.43毫莫耳)溶解於THF(500毫升)、及在-78℃添加2.5M正丁基鋰之己烷溶液(107.5毫升,268.8毫莫耳)至該反應混合物後,在-78℃攪拌該反應混合物1小時,加熱至室溫,及攪拌2小時。在-78℃緩慢添加B(OMe)3(41.9毫升,403.30毫莫耳),緩慢加熱至室溫的同時攪拌該反應混合物12小時。以EA萃取後,以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及以氯甲烷(MC)及己烷再結晶以得到化合物6-2(26克,63.78%)。 Compound 6-1 (35 g, 134.33 mmol) was dissolved in THF (500 mL), and a solution of 2.5 M n-butyllithium in hexane (107.5 mL, 268.8 mmol) was added at -78 °C to the reaction. After the mixture, the reaction mixture was stirred at -78 ° C for 1 hour, heated to room temperature, and stirred for 2 hours. B(OMe) 3 (41.9 ml, 403.30 mmol) was slowly added at -78 °C, and the mixture was stirred while stirring slowly to room temperature for 12 hours. After extraction with EA, the obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and recrystallized from chloromethane (MC) and hexane to give compound 6-2 (26 g , 63.78%).

化合物6-3之製備 Preparation of Compound 6-3

混合化合物6-2(26克,85.47毫莫耳)、2-溴硝基苯(18.9克,52.61毫莫耳)、Pd(PPh3)4(1.9克,1.70毫莫耳)、2M Na2CO3(100毫升)、甲苯(250毫升)及乙醇(50毫升)後,在回流下攪拌該反應混合物。4小時後,將該反應混合物冷卻至室溫及添加蒸餾水,及以EA萃取。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物6-3(32克,98.15%)。 Compound 6-2 (26 g, 85.47 mmol), 2-bromonitrobenzene (18.9 g, 52.61 mmol), Pd(PPh 3 ) 4 (1.9 g, 1.70 mmol), 2M Na 2 After CO 3 (100 ml), toluene (250 ml) and ethanol (50 ml), the reaction mixture was stirred under reflux. After 4 hours, the reaction mixture was cooled to room temperature and distilled water was added and extracted with EA. The obtained organic layer was dried (MgSO 4 ), filtered, evaporated, evaporated,

化合物6-4之製備 Preparation of Compound 6-4

混合化合物6-3(32克,83.87毫莫耳)、P(OEt)3(200毫升)及1,2-二氯苯(100毫升)後,在150℃回流下攪拌該反應混合物。12小時後,將該反應混合物冷卻至室溫,減壓蒸餾及透過管柱過濾以得到化合物6-4(9克,30.70%)。 After mixing compound 6-3 (32 g, 83.87 mmol), P(OEt) 3 (200 ml) and 1,2-dichlorobenzene (100 ml), the reaction mixture was stirred at 150 ° C under reflux. After 12 hours, the reaction mixture was cooled to rt.

化合物C-91之製備 Preparation of Compound C-91

將化合物6-4(4克,11.44毫莫耳)及化合物2-1(4.7克,13.73毫莫耳)溶解於DMF(190毫升)後,將60% NaH(於礦物油中,0.68克,17.16毫莫耳)緩慢添加至該混合物,及在室溫攪拌12小時。終止該反應後,將蒸餾水添加至該反應混合物。在減壓下過濾該所得之固體,及依順序以EA、DMF及THF清洗該所得之固體,以得到化合物C-91(2.0克,26.65%)。 After dissolving compound 6-4 (4 g, 11.44 mmol) and compound 2-1 (4.7 g, 13.73 mmol) in DMF (190 mL), 60% NaH (in mineral oil, 0.68 g, 17.16 mmol was slowly added to the mixture and stirred at room temperature for 12 hours. After the reaction was terminated, distilled water was added to the reaction mixture. The obtained solid was filtered under reduced pressure, and the obtained solid was washed with EA, DMF and THF to give Compound C-91 (2.0 g, 26.65%).

MS/FAB實測值656;計算值655.81 MS/FAB measured value 656; calculated value 655.81

實施例7:化合物C-94之製備 Example 7: Preparation of Compound C-94

化合物7-1之製備 Preparation of Compound 7-1

製備於飽合NaCl水溶液中放置冰之-4℃浴後,將硝酸(1.5當量)放置至硫酸溶劑中,及等待至直該反應溶劑之溫度成為0℃。將1,3-二溴苯(10克,42.4毫莫耳)放置入滴液漏斗中,及逐滴加入以不超過10℃。30分鐘後,以水終止該反應混合物。過濾該所得之固體,以純化水清洗數次,及透過管柱過濾以得到化合物7-1(7克,59%)。 After preparing a bath at -4 ° C in an aqueous solution of saturated NaCl, nitric acid (1.5 equivalents) was placed in a sulfuric acid solvent, and the temperature of the reaction solvent was allowed to become 0 ° C. 1,3-Dibromobenzene (10 g, 42.4 mmol) was placed in a dropping funnel and added dropwise at no more than 10 °C. After 30 minutes, the reaction mixture was quenched with water. The obtained solid was filtered, washed with purified water several times, and filtered through a column to give Compound 7-1 (7 g, 59%).

化合物7-2之製備 Preparation of compound 7-2

混合4-聯苯基噻吩硼酸(41克,181毫莫耳)、化合物7-1(71克,254.5毫莫耳)、2M Na2CO3(270毫升)、甲苯(900毫升)及乙醇(300毫升)後,在回流下攪拌該反應混合物。5小時後,將該反應混合物冷卻至室溫,及以EA萃取。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物7-2(34克,35%)。 Mix 4-biphenylthiopheneboronic acid (41 g, 181 mmol), compound 7-1 (71 g, 254.5 mmol), 2M Na 2 CO 3 (270 mL), toluene (900 mL) and ethanol ( After 300 ml), the reaction mixture was stirred under reflux. After 5 hours, the reaction mixture was cooled to room temperature and extracted with EtOAc. The organic layer was dried over MgSO 4 of the resulting, filtered, evaporated under reduced pressure to remove the solvent, and was filtered through column to give compound 7-2 (34 g, 35%).

化合物7-3之製備 Preparation of compound 7-3

混合化合物7-2(34克,89.52毫莫耳)、P(OEt)3(350毫升)及1,2-二氯苯(350毫升)後,在150℃攪拌該反應混合物。7小時後,將該反應混合物冷卻至室溫,減壓蒸餾,及以EA再結晶以得到化合物7-3(11克,35%)。 After mixing compound 7-2 (34 g, 89.52 mmol), P(OEt) 3 (350 ml) and 1,2-dichlorobenzene (350 ml), the reaction mixture was stirred at 150 °C. After 7 hours, the reaction mixture was cooled to room temperature, distilled under reduced pressure and then recrystallised from EA to afford compound 7-3 (11 g, 35%).

化合物7-4之製備 Preparation of compound 7-4

放置化合物7-3(7克,25.60毫莫耳)、碘苯(10.44克,51.21毫莫耳)、CuI(2.5克,12.80毫莫耳)、K3PO4(16.30克,76.82毫莫耳)及甲苯(200毫升)後,將該反應混合物加熱至50℃,添加乙二胺(1.72毫升,25.60毫莫耳),及在回流下攪拌。12小時後,將該反應混合物冷卻至室溫,以EA萃取,以NaHCO3水溶液清洗,以MgSO4乾燥,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物7-4(8克,89.41%)。 Place compound 7-3 (7 g, 25.60 mmol), iodobenzene (10.44 g, 51.21 mmol), CuI (2.5 g, 12.80 mmol), K 3 PO 4 (16.30 g, 76.82 mmol) After the reaction mixture was heated to 50 ° C, ethylenediamine (1.72 mL, 25.60 mmol) was added and stirred under reflux. After 12 hours, the reaction mixture was cooled to room temperature, extracted with EA to aqueous NaHCO 3, dried over MgSO 4, filtered, evaporated under reduced pressure to remove the solvent, and was filtered through column to give compound 7-4 ( 8 grams, 89.41%).

化合物C-94之製備 Preparation of Compound C-94

將NaH(600毫克)溶解於DMF(40毫升)後,攪拌該溶液。將化合物7-4(3.5克,10.015毫莫耳)溶解於DME(30毫升)後,將該溶液添加至上揭NaH溶液,及攪拌1小時。 將化合物2-1(4.1克,12.0189毫莫耳)溶解於DMF(30毫升),及攪拌後,將化合物7-4之混合溶液添加至化合物2-1之混合溶液,及攪拌12小時。終止該反應後,將純水添加至該反應混合物中。過濾該所得之固體,及透過管柱過濾以得到化合物C-94(3克,34%)。 After dissolving NaH (600 mg) in DMF (40 ml), the solution was stirred. After dissolving compound 7-4 (3.5 g, 10.015 mmol) in DME (30 ml), this solution was added to the above-mentioned NaH solution, and stirred for 1 hour. Compound 2-1 (4.1 g, 12.0189 mmol) was dissolved in DMF (30 ml), and after stirring, a mixed solution of compound 7-4 was added to a mixed solution of compound 2-1, and stirred for 12 hours. After the reaction was terminated, pure water was added to the reaction mixture. The resulting solid was filtered and filtered through a pad to afford compound C-94 (3 g, 34%).

MS/FAB實測值656;計算值655.81 MS/FAB measured value 656; calculated value 655.81

實施例8:化合物C-96之製備 Example 8: Preparation of Compound C-96

化合物8-1之製備 Preparation of Compound 8-1

混合2,5-二溴硝基苯(30克,106.8毫莫耳)、二苯并噻吩-4-基硼酸(20.3克,88.9毫莫耳)、Pd(PPh3)4(5.1克,4.45毫莫耳)、Na2CO3(27.9克,267毫莫耳)、甲苯(600毫升)及EtOH(100毫升)後,在90℃攪拌該反應混合物3小時。攪拌後緩慢添加純化水以終止該反應。以EA萃取該反應混合物。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物8-1(24克,59%)。 Mix 2,5-dibromonitrobenzene (30 g, 106.8 mmol), dibenzothiophen-4-ylboronic acid (20.3 g, 88.9 mmol), Pd(PPh 3 ) 4 (5.1 g, 4.45 After mM, Na 2 CO 3 (27.9 g, 267 mmol), toluene (600 mL) and EtOH (100 mL), the reaction mixture was stirred at 90 ° C for 3 hours. Purified water was slowly added after stirring to terminate the reaction. The reaction mixture was extracted with EA. The obtained organic layer was dried (MgSO 4 ), filtered, evaporated

化合物8-2之製備 Preparation of Compound 8-2

混合化合物8-1(23克,59.85毫莫耳)、苯基硼酸(8.8克,71.83毫莫耳)、Pd(PPh3)4(3.46克,2.99毫莫耳)、Na2CO3(19克,179.5毫莫耳)、甲苯(180毫升)及EtOH(90毫升)後,在120℃回流下攪拌該反應混合物3小時。攪拌後緩慢添加純化水以終止該反應。以EA萃取該反應混合物。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物8-2(22克,96%)。 Compound 8-1 (23 g, 59.85 mmol), phenylboronic acid (8.8 g, 71.83 mmol), Pd(PPh 3 ) 4 (3.46 g, 2.99 mmol), Na 2 CO 3 (19) After gram, 179.5 mmol, toluene (180 mL) and EtOH (90 mL), the reaction mixture was stirred at 120 ° C for 3 hr. Purified water was slowly added after stirring to terminate the reaction. The reaction mixture was extracted with EA. The obtained organic layer was dried with MgSO 4 , filtered, evaporated, evaporated,

化合物8-3之製備 Preparation of Compound 8-3

混合化合物8-2(15克,39.3毫莫耳)、及P(OEt)3(150毫升)後,在150℃攪拌該反應混合物24小時。攪拌後使用蒸餾管柱移除殘餘溶劑,及該反應混合物透過管柱過濾以得到化合物8-3(6克,46%)。 After mixing compound 8-2 (15 g, 39.3 mmol) and P(OEt) 3 (150 ml), the reaction mixture was stirred at 150 ° C for 24 hours. After stirring, the residual solvent was removed using a distillation column, and the reaction mixture was filtered through a column to afford compound 8-3 (6 g, 46%).

化合物C-96之製備 Preparation of Compound C-96

將NaH(1克,30.6毫莫耳)溶解於DMF(20毫升)後,攪拌該溶液。將化合物8-3(8.56克,24.5毫莫耳)溶解於DMF(300毫升)後,將該溶液添加至上揭NaH溶液,及攪拌1小時。將化合物2-1(7克,20.4毫莫耳)溶解於DMF(250毫升),及攪拌後,將化合物8-3之混合溶液添加至化合物2-1之混合溶液,及攪拌12小時。終止該反應後,將純化水添加至該反應混合物中。過濾該所得之固體,及透過管柱過濾以得到化合物C-96(8.9克,67%)。 After dissolving NaH (1 g, 30.6 mmol) in DMF (20 mL), the solution was stirred. After dissolving Compound 8-3 (8.56 g, 24.5 mmol) in DMF (300 mL), this solution was added to a NaH solution and stirred for 1 hour. Compound 2-1 (7 g, 20.4 mmol) was dissolved in DMF (250 ml), and after stirring, a mixed solution of compound 8-3 was added to a mixed solution of compound 2-1, and stirred for 12 hours. After the reaction was terminated, purified water was added to the reaction mixture. The resulting solid was filtered and filtered through a pad to afford compound C-96 (8.9 g, 67%).

MS/FAB實測值656;計算值655.81 MS/FAB measured value 656; calculated value 655.81

實施例9:化合物C-97之製備 Example 9: Preparation of Compound C-97

化合物9-1之製備 Preparation of Compound 9-1

放置二苯并[b,d]呋喃-4-基硼酸(20克,94.3毫莫耳)、2-溴硝基苯(17克,84.9毫莫耳)、Pd(PPh3)4(4.9克,4.24毫莫耳)、K2CO3(23.5克,169.8毫莫耳)、甲苯(100毫升)、EtOH(50毫升)、及純化水(50毫升)後,在回流下攪拌該反應混合物3小時。終止該反應後,將該反應混合物冷卻至室溫,移除該水層,及以MgSO4乾燥該有機層,過濾,減壓蒸餾以移除溶劑,及透過矽膠過濾。減壓下濃縮殘餘溶液以得到化合物9-1(24克,98%)。 Place dibenzo[ b,d ]furan-4-ylboronic acid (20 g, 94.3 mmol), 2-bromonitrobenzene (17 g, 84.9 mmol), Pd(PPh 3 ) 4 (4.9 g After stirring 4.20 mmol, K 2 CO 3 (23.5 g, 169.8 mmol), toluene (100 ml), EtOH (50 ml), and purified water (50 ml), the reaction mixture was stirred under reflux 3 hour. After the reaction was terminated, the reaction mixture was cooled to room temperature, the aqueous layer was removed, and the organic layer was dried with MgSO 4 , filtered and evaporated to remove solvent and filtered through silica gel. The residual solution was concentrated under reduced pressure to give Compound 9-1 (24 g, 98%).

化合物9-2之製備 Preparation of Compound 9-2

混合化合物9-1(24克,83.0毫莫耳)、PPh3(65克,248.9毫莫耳)及1,2-二氯苯(250毫升)後,在回流下攪拌該反應混合物18小時。終止該反應後,將該反應混合物冷卻至室溫,以蒸餾水清洗,及以二氯甲烷(DCM)萃取。以5% NH4Cl水溶液清洗該經萃取之DCM層,以MgSO4乾燥,過濾,減壓蒸餾以移除溶劑,及透過矽膠過濾。減壓下濃縮殘餘溶液,以MeOH磨碎以得到化合物9-2(11.2克,52%)。 After compound 9-1 (24 g, 83.0 mmol), PPh 3 (65 g, 248.9 mmol) and 1,2-dichlorobenzene (250 ml), the mixture was stirred under reflux for 18 hours. After the reaction was terminated, the reaction mixture was cooled to room temperature, washed with distilled water and extracted with dichloromethane. In 5% NH 4 Cl aqueous washing the DCM layer was extracted, the dried MgSO 4, filtered, evaporated under reduced pressure to remove the solvent, and filtered through silica gel. The residual solution was concentrated under reduced pressure and purified with EtOAc EtOAc EtOAc

化合物C-97之製備 Preparation of Compound C-97

將化合物9-2(6克,23.3毫莫耳)溶解於DMF(60毫升) 後,在0℃添加NaH(1.1克,28.0毫莫耳),及攪拌10分鐘。將化合物2-1(8.8克,25.7毫莫耳)添加至該反應混合物,及攪拌19小時。終止該反應後,將MeOH添加至該反應混合物。透過矽膠過濾該所得之固體,以DMF再結晶以得到化合物C-97(7克,53%)。 Compound 9-2 (6 g, 23.3 mmol) was dissolved in DMF (60 mL) After that, NaH (1.1 g, 28.0 mmol) was added at 0 ° C and stirred for 10 min. Compound 2-1 (8.8 g, 25.7 mmol) was added to the reaction mixture and stirred for 19 h. After the reaction was terminated, MeOH was added to the reaction mixture. The obtained solid was filtered through EtOAc (EtOAc) (EtOAc)

MS/FAB實測值656;計算值655.81 MS/FAB measured value 656; calculated value 655.81

實施例10:化合物C-99之製備 Example 10: Preparation of Compound C-99

化合物10-1之製備 Preparation of Compound 10-1

混合化合物3-2(30克,109.7毫莫耳)、4-溴碘苯(62克,219.4毫莫耳)、CuI(20.9克,109.7毫莫耳)、乙二胺(14.7毫升,219.4毫莫耳)、K3PO4(58克,274.3毫莫耳)及甲苯(600毫升)後,在回流下攪拌該反應混合物。15小時後,將該反應混合物冷卻至室溫,藉由減壓下過濾移除CuI及K3PO4。以蒸餾水清洗殘餘溶液,以MC萃取。以MgSO4乾燥該所得之有機層,過濾,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物10-1(37克,78.74%)。 Compound 3-2 (30 g, 109.7 mmol), 4-bromoiodobenzene (62 g, 219.4 mmol), CuI (20.9 g, 109.7 mmol), ethylenediamine (14.7 mL, 219.4 m) After the molar, K 3 PO 4 (58 g, 274.3 mmol) and toluene (600 mL), the reaction mixture was stirred under reflux. After 15 hours, the reaction mixture was cooled to room temperature, filtered and removed under reduced pressure by CuI and K 3 PO 4. The residual solution was washed with distilled water and extracted with MC. The obtained organic layer was dried (MgSO 4 ), filtered, evaporated, evaporated,

化合物10-2之製備 Preparation of Compound 10-2

將化合物10-1(25克,58.36毫莫耳)溶解於THF(500毫升)、及在-78℃添加2.5M正丁基鋰之己烷溶液(23.3毫 升,58.36毫莫耳)至該反應混合物後,攪拌該反應混合物。1小時後,緩慢添加B(Oi-Pr)3(20.1毫升,87.54毫莫耳),及攪拌該反應混合物1小時。在室溫攪拌該反應混合物4小時,伴隨緩慢增溫。攪拌後添加蒸餾水,及以EA萃取該反應混合物。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及以EA及己烷再結晶以得到化合物10-2(19克,82.78%)。 Compound 10-1 (25 g, 58.36 mmol) was dissolved in THF (500 mL), and a solution of 2.5 M n-butyllithium in hexane (23.3 mL, 58.36 mmol) was added at -78 °C to the reaction. After the mixture, the reaction mixture was stirred. After 1 hour, B(O i -Pr) 3 (20.1 mL, 87.54 mmol) was slowly added, and the mixture was stirred for 1 hour. The reaction mixture was stirred at room temperature for 4 hours with a slow increase in temperature. After stirring, distilled water was added, and the reaction mixture was extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and recrystallized from EA and hexane to give compound 10-2 (19 g, 82.78%).

化合物C-99之製備 Preparation of Compound C-99

混合化合物2-1(6.1克,17.79毫莫耳)、化合物10-2(7克,17.79毫莫耳)、Pd(PPh3)4(1.0克,0.88毫莫耳)、2MK3PO4水溶液(22毫升)、甲苯(130毫升)及乙醇(66毫升)後,在回流下攪拌該反應混合物。4小時後,將甲醇添加至該反應混合物。在減壓下過濾該所得之固體,及透過管柱過濾該經過濾之固體以得到化合物C-99(4.0克,34.28%)。 Compound 2-1 (6.1 g, 17.79 mmol), compound 10-2 (7 g, 17.79 mmol), Pd(PPh 3 ) 4 (1.0 g, 0.88 mmol), 2MK 3 PO 4 After (22 ml), toluene (130 ml) and ethanol (66 ml), the reaction mixture was stirred under reflux. After 4 hours, methanol was added to the reaction mixture. The solid obtained was filtered under reduced pressure, and the filtered solid was filtered to afford compound C-99 (4.0 g, 34.28%).

MS/FAB實測值656;計算值655.81 MS/FAB measured value 656; calculated value 655.81

實施例11:化合物C-41之製備 Example 11: Preparation of Compound C-41

化合物11-1之製備 Preparation of Compound 11-1

混合(1,1’-聯苯)-3-基硼酸(25克,0.1莫耳)、1-溴-4-碘苯(89.3克,0.32莫耳)、Pd(PPh3)2Cl2(2.7克,0.038莫耳)、Na2CO3(26克,0.25莫耳)、甲苯(150毫升)、EtOH(38毫升)及蒸餾水(150毫升)後,在110℃攪拌該反應混合物3小時。終止該反應後,以EA萃取該反應混合物。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及透過管柱過濾以得到化合物11-1(31克,80%)。 Mixing (1,1'-biphenyl)-3-ylboronic acid (25 g, 0.1 mol), 1-bromo-4-iodobenzene (89.3 g, 0.32 mol), Pd(PPh 3 ) 2 Cl 2 ( After 2.7 g, 0.038 mol, Na 2 CO 3 (26 g, 0.25 mol), toluene (150 ml), EtOH (38 ml) and distilled water (150 ml), the reaction mixture was stirred at 110 ° C for 3 hours. After the reaction was terminated, the reaction mixture was extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and filtered through a column to give compound 11-1 (31 g, 80%).

化合物11-2之製備 Preparation of Compound 11-2

將化合物11-1(31克,0.1莫耳)溶解於THF(750毫升)、及在-78℃添加2.25M正丁基鋰之己烷溶液(60毫升)至該反應混合物後,攪拌該反應混合物。1小時後,緩慢添加B(Oi--Pr)3(46毫升,0.2莫耳),及在室溫攪拌該反應混合物12小時,伴隨緩慢增溫。攪拌後添加蒸餾水,及以EA萃取該反應混合物。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及透過管柱過濾 以得到化合物11-2(21克,76%)。 Compound 11-1 (31 g, 0.1 mol) was dissolved in THF (750 mL), and a solution of 2.25 M hexanes hexane (60 ml) was added to the reaction mixture at -78 ° C, and then the reaction was stirred. mixture. After 1 hour, added slowly B (O i --Pr) 3 ( 46 mL, 0.2 mole), and the reaction mixture was stirred for 12 hours at room temperature, with gentle warming. After stirring, distilled water was added, and the reaction mixture was extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and filtered through a column to give compound 11-2 (21 g, 76%).

化合物11-3之製備 Preparation of Compound 11-3

混合2,4-二氯嘧啶(7.6克,0.05莫耳)、化合物11-2(10.7克,0.39莫耳)、Pd(PPh3)4(2.3克,0.02莫耳)、Na2CO3(10克,0.089莫耳)、甲苯(200毫升)、EtOH(50毫升)及純化水(50毫升)後,在120℃攪拌該反應混合物12小時。終止該反應後,以EA萃取該反應混合物。以無水MgSO4乾燥該所得之有機層以移除殘餘水分,減壓蒸餾以移除溶劑,及再結晶以得到化合物11-3(9.4克,70%)。 Mix 2,4-dichloropyrimidine (7.6 g, 0.05 mol), compound 11-2 (10.7 g, 0.39 mol), Pd(PPh 3 ) 4 (2.3 g, 0.02 mol), Na 2 CO 3 ( After 10 g, 0.089 mol, toluene (200 ml), EtOH (50 ml) and purified water (50 ml), the reaction mixture was stirred at 120 ° C for 12 hours. After the reaction was terminated, the reaction mixture was extracted with EA. The obtained organic layer was dried over anhydrous MgSO 4 to remove residual water, distilled under reduced pressure to remove solvent, and recrystallized to give compound 11-3 (9.4 g, 70%).

化合物C-41之製備 Preparation of Compound C-41

將60% NaH(1.0克,0.025莫耳)溶解於DMF(40毫升)後,攪拌該溶液。將化合物1-2(5.0克,0.017莫耳)溶解於DMF(40毫升)後,將該溶液添加至上揭NaH溶液,及攪拌1小時。將化合物11-3(7.2克,0.017莫耳)溶解於DMF(20毫升),及攪拌後,將化合物1-2之混合溶液添加至化合物11-3之混合溶液,及攪拌12小時。過濾該所得之黃色固體,以MeOH清洗,及再結晶以得到化合物C-41(5克,48%)。 After dissolving 60% NaH (1.0 g, 0.025 mol) in DMF (40 ml), the solution was stirred. After dissolving Compound 1-2 (5.0 g, 0.017 mol) in DMF (40 mL), this solution was added to a NaH solution and stirred for 1 hour. Compound 11-3 (7.2 g, 0.017 mol) was dissolved in DMF (20 ml), and after stirring, a mixed solution of compound 1-2 was added to a mixed solution of compound 11-3, and stirred for 12 hours. The resulting yellow solid was filtered, washed with MeOH and crystallised to afford compound C-41 (5 g, 48%).

MS/FAB實測值590;計算值589.73 MS/FAB measured value 590; calculated value 589.73

試驗例1:使用本發明化合物之OLED裝置之製備 Test Example 1: Preparation of an OLED device using the compound of the present invention

使用本發明化合物製備OLED裝置。使用超音波依序以三氯乙烯、丙酮、乙醇以及蒸餾水清洗用於有機發光二極體(OLED)裝置(Samsung Corning,大韓民國)之玻璃基材上的透明電極銦錫氧化物(ITO)薄膜(15Ω/sq),然後儲存在 異丙醇中。之後,將該ITO基材裝設在真空氣相沉積設備之基板夾持器上。將N1,N1'-([1,1’-聯苯]-4,4’-二基)雙(N1-(萘-1-基)-N4,N4-二苯基苯-1,4-二胺)導入該真空氣相沉積設備之小室(cell)中,然後控制該設備之腔室壓力達10-6托耳(torr)。之後,對該小室施加電流以蒸發上揭導入之材料,藉以在該ITO基材上形成具有60nm厚度之電洞注入層。之後,將N,N’-二(4-聯苯基)-N,N’-二(4-聯苯基)-4,4’-二胺基聯苯導入該真空氣相沉積設備之另一個小室,以及藉由對該小室施加電流使之蒸發,藉以在該電洞注入層上形成具有20nm厚度之電洞傳輸層。之後,將化合物C-67導入該真空氣相沉積設備之一個小室中作為主體材料,以及將化合物D-56導入另一個小室作為摻雜劑。將該兩種材料以不同速率蒸發而以15重量%(wt%)之摻雜量沉積,以在該電洞傳輸層上形成具有30nm厚度之發光層。之後,將2-(4-(9,10-二(萘-2-基)蒽-2-基)苯基)-1-苯基-1H-苯并[d]咪唑導入一個小室以及將8-羥基喹啉鋰(lithium quinolate)導入另一個小室中。將該兩種材料以相同速率蒸發以及以50重量%之摻雜量沉積,以在該發光層上形成具有30nm厚度之電子傳輸層。之後,在沉積具有2nm厚度之8-羥基喹啉鋰作為該電子傳輸層上的電子注入層後,藉由另一個真空氣相沉積設備將具有150nm厚度之Al陰極沉積在該電子注入層上。因而製得OLED裝置。用於製造該OLED裝置之所有材料皆已於使用前藉由10-6torr之真空昇華而純化。 An OLED device is prepared using the compounds of the invention. A transparent electrode indium tin oxide (ITO) film for use on a glass substrate of an organic light-emitting diode (OLED) device (Samsung Corning, Republic of Korea) was washed with a mixture of trichloroethylene, acetone, ethanol, and distilled water using ultrasonic waves ( 15 Ω/sq) and then stored in isopropanol. Thereafter, the ITO substrate was mounted on a substrate holder of a vacuum vapor deposition apparatus. N 1 ,N 1 ' -([1,1'-biphenyl]-4,4'-diyl) bis(N 1 -(naphthalen-1-yl)-N 4 ,N 4 -diphenylbenzene -1,4-Diamine) is introduced into the cell of the vacuum vapor deposition apparatus, and then the chamber pressure of the apparatus is controlled to 10 -6 torr. Thereafter, a current was applied to the cell to evaporate the material introduced, thereby forming a hole injecting layer having a thickness of 60 nm on the ITO substrate. Thereafter, N,N'-bis(4-biphenyl)-N,N'-bis(4-biphenyl)-4,4'-diaminobiphenyl is introduced into the vacuum vapor deposition apparatus. A cell, and by applying a current to the cell to evaporate, thereby forming a hole transport layer having a thickness of 20 nm on the hole injection layer. Thereafter, the compound C-67 was introduced into one chamber of the vacuum vapor deposition apparatus as a host material, and the compound D-56 was introduced into another chamber as a dopant. The two materials were evaporated at different rates and deposited at a doping amount of 15% by weight (wt%) to form a light-emitting layer having a thickness of 30 nm on the hole transport layer. Thereafter, 2-(4-(9,10-di(naphthalen-2-yl)indol-2-yl)phenyl)-1-phenyl-1H-benzo[ d ]imidazole is introduced into a chamber and 8 Lithium quinolate is introduced into another chamber. The two materials were evaporated at the same rate and deposited at a doping amount of 50% by weight to form an electron transport layer having a thickness of 30 nm on the light-emitting layer. Thereafter, after depositing lithium hydroxyquinolate having a thickness of 2 nm as an electron injecting layer on the electron transporting layer, an Al cathode having a thickness of 150 nm was deposited on the electron injecting layer by another vacuum vapor deposition apparatus. Thus an OLED device is produced. All materials used to make the OLED device were purified by vacuum sublimation of 10 -6 torr prior to use.

該製得之OLED裝置在驅動電壓3.0 V顯示具有發光度為1,040 cd/m2及電流密度為2.29 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,040 cd/m 2 and a current density of 2.29 mA/cm 2 at a driving voltage of 3.0 V.

試驗例2:使用本發明化合物之OLED裝置之製備 Test Example 2: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-41作為主體材料,及化合物D-5作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-41 was used as a host material, and the compound D-5 was used as a dopant.

該製得之OLED裝置在驅動電壓3.2 V顯示具有發光度為1,030 cd/m2及電流密度為2.60 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,030 cd/m 2 and a current density of 2.60 mA/cm 2 at a driving voltage of 3.2 V.

試驗例3:使用本發明化合物之OLED裝置之製備 Test Example 3: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-55作為主體材料,及化合物D-57作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-55 was used as a host material, and the compound D-57 was used as a dopant.

該製得之OLED裝置在驅動電壓3.9 V顯示具有發光度為1,050 cd/m2及電流密度為2.35 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,050 cd/m 2 and a current density of 2.35 mA/cm 2 at a driving voltage of 3.9 V.

試驗例4:使用本發明化合物之OLED裝置之製備 Test Example 4: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-56作為主體材料,及化合物D-57作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that Compound C-56 was used as a host material, and Compound D-57 was used as a dopant.

該製得之OLED裝置在驅動電壓4.0 V顯示具有發光度為1,040 cd/m2及電流密度為2.09 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,040 cd/m 2 and a current density of 2.09 mA/cm 2 at a driving voltage of 4.0 V.

試驗例5:使用本發明化合物之OLED裝置之製備 Test Example 5: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-56作為主體材料,及化合物D-58作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that Compound C-56 was used as a host material, and Compound D-58 was used as a dopant.

該製得之OLED裝置在驅動電壓3.0 V顯示具有發光度為1,060 cd/m2及電流密度為2.67 mA/cm2之橘光發光。 The obtained OLED device showed orange light emission having a luminance of 1,060 cd/m 2 and a current density of 2.67 mA/cm 2 at a driving voltage of 3.0 V.

試驗例6:使用本發明化合物之OLED裝置之製備 Test Example 6: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用 化合物C-71作為主體材料,及化合物D-34作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that Compound C-71 was used as a host material, and compound D-34 was used as a dopant.

該製得之OLED裝置在驅動電壓3.8 V顯示具有發光度為1,020 cd/m2及電流密度為2.51 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,020 cd/m 2 and a current density of 2.51 mA/cm 2 at a driving voltage of 3.8 V.

試驗例7:使用本發明化合物之OLED裝置之製備 Test Example 7: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-73作為主體材料,及化合物D-34作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that Compound C-73 was used as a host material, and Compound D-34 was used as a dopant.

該製得之OLED裝置在驅動電壓3.3 V顯示具有發光度為1,000 cd/m2及電流密度為2.17 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,000 cd/m 2 and a current density of 2.17 mA/cm 2 at a driving voltage of 3.3 V.

試驗例8:使用本發明化合物之OLED裝置之製備 Test Example 8: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-87作為主體材料,及化合物D-5作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-87 was used as a host material, and the compound D-5 was used as a dopant.

該製得之OLED裝置在驅動電壓3.5 V顯示具有發光度為1,030 cd/m2及電流密度為2.52 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,030 cd/m 2 and a current density of 2.52 mA/cm 2 at a driving voltage of 3.5 V.

試驗例9:使用本發明化合物之OLED裝置之製備 Test Example 9: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-87作為主體材料,及化合物D-59作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-87 was used as a host material, and the compound D-59 was used as a dopant.

該製得之OLED裝置在驅動電壓3.2 V顯示具有發光度為1,040 cd/m2及電流密度為6.34 mA/cm2之深橘光發光。 The obtained OLED device showed a deep orange light emission having a luminance of 1,040 cd/m 2 and a current density of 6.34 mA/cm 2 at a driving voltage of 3.2 V.

試驗例10:使用本發明化合物之OLED裝置之製備 Test Example 10: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-90作為主體材料,及化合物D-5作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-90 was used as a host material, and the compound D-5 was used as a dopant.

該製得之OLED裝置在驅動電壓3.1 V顯示具有發光度為1,050 cd/m2及電流密度為2.45 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,050 cd/m 2 and a current density of 2.45 mA/cm 2 at a driving voltage of 3.1 V.

試驗例11:使用本發明化合物之OLED裝置之製備 Test Example 11: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-91作為主體材料,及化合物D-5作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-91 was used as a host material, and the compound D-5 was used as a dopant.

該製得之OLED裝置在驅動電壓3.7 V顯示具有發光度為1,050 cd/m2及電流密度為2.18 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,050 cd/m 2 and a current density of 2.18 mA/cm 2 at a driving voltage of 3.7 V.

試驗例12:使用本發明化合物之OLED裝置之製備 Test Example 12: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-94作為主體材料,及化合物D-37作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-94 was used as a host material, and the compound D-37 was used as a dopant.

該製得之OLED裝置在驅動電壓4.3 V顯示具有發光度為1,020 cd/m2及電流密度為3.15 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,020 cd/m 2 and a current density of 3.15 mA/cm 2 at a driving voltage of 4.3 V.

試驗例13:使用本發明化合物之OLED裝置之製備 Test Example 13: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-97作為主體材料,及化合物D-34作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-97 was used as a host material, and the compound D-34 was used as a dopant.

該製得之OLED裝置在驅動電壓4.1 V顯示具有發光度為1,070 cd/m2及電流密度為2.30 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,070 cd/m 2 and a current density of 2.30 mA/cm 2 at a driving voltage of 4.1 V.

試驗例14:使用本發明之化合物之OLED裝置之製備 Test Example 14: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-98作為主體材料,及化合物D-5作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-98 was used as a host material, and the compound D-5 was used as a dopant.

該製得之OLED裝置在驅動電壓3.1 V顯示具有發光度為1,050 cd/m2及電流密度為2.39 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,050 cd/m 2 and a current density of 2.39 mA/cm 2 at a driving voltage of 3.1 V.

試驗例15:使用本發明化合物之OLED裝置之製備 Test Example 15: Preparation of an OLED device using the compound of the present invention

使用與實施例1相同之方式製備OLED裝置,除了使用化合物C-99作為主體材料,及化合物D-5作為摻雜劑。 An OLED device was prepared in the same manner as in Example 1, except that the compound C-99 was used as a host material, and the compound D-5 was used as a dopant.

該製得之OLED裝置在驅動電壓3.2 V顯示具有發光度為1,040 cd/m2及電流密度為2.66 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,040 cd/m 2 and a current density of 2.66 mA/cm 2 at a driving voltage of 3.2 V.

比較例1:使用傳統電場發光化合物之OLED裝置之製備 Comparative Example 1: Preparation of an OLED device using a conventional electroluminescent compound

使用與實施例1相同之方式製備OLED裝置,除了使用4,4’-雙(咔唑-9-基)聯苯(CBP)作為主體材料及使用化合物D-5作為摻雜劑導入該真空氣相沉積設備之小室中,以及藉由使用雙(2-甲基-8-羥基喹啉)(對-苯基酚)鋁(III)(Balq)沉積具有10nm厚度之電洞阻擋層。 An OLED device was prepared in the same manner as in Example 1, except that 4,4'-bis(carbazol-9-yl)biphenyl (CBP) was used as a host material and Compound D-5 was used as a dopant to introduce the vacuum gas. A cavity barrier layer having a thickness of 10 nm was deposited in a chamber of a phase deposition apparatus and by using bis(2-methyl-8-hydroxyquinoline) (p-phenylphenol) aluminum (III) (Balq).

該製得之OLED裝置在驅動電壓4.9 V顯示具有發光度為1,000 cd/m2及電流密度為2.86 mA/cm2之綠光發光。 The obtained OLED device showed green light emission having a luminance of 1,000 cd/m 2 and a current density of 2.86 mA/cm 2 at a driving voltage of 4.9 V.

比較例2:使用傳統電場發光化合物之OLED裝置之製備 Comparative Example 2: Preparation of an OLED device using a conventional electroluminescent compound

使用與實施例1相同之方式製備OLED裝置,除了使用4,4’-雙(咔唑-9-基)聯苯(CBP)作為主體材料及使用化合物D-58作為摻雜劑導入該真空氣相沉積設備之小室中,以及藉由使用雙(2-甲基-8-羥基喹啉)(對-苯基酚)鋁(III)(Balq)沉積具有10nm厚度之電洞阻擋層。 An OLED device was prepared in the same manner as in Example 1, except that 4,4'-bis(carbazol-9-yl)biphenyl (CBP) was used as a host material and Compound D-58 was used as a dopant to introduce the vacuum gas. A cavity barrier layer having a thickness of 10 nm was deposited in a chamber of a phase deposition apparatus and by using bis(2-methyl-8-hydroxyquinoline) (p-phenylphenol) aluminum (III) (Balq).

該製得之OLED裝置在驅動電壓4.6 V顯示具有發光度為1,000 cd/m2及電流密度為3.05 mA/cm2之橘光發光。 The obtained OLED device showed orange light emission having a luminance of 1,000 cd/m 2 and a current density of 3.05 mA/cm 2 at a driving voltage of 4.6 V.

本發明之化合物相較於傳統材料具有優越之發光特性。此外,使用本發明之化合物作為綠光或橘光發光之主體材料之裝置不僅具有優越之發光特性,亦藉由減低驅動電壓而引致增加之功率效率。 The compounds of the present invention have superior luminescent properties compared to conventional materials. Further, the apparatus using the compound of the present invention as a host material for green light or orange light emission not only has superior light-emitting characteristics, but also causes increased power efficiency by reducing the driving voltage.

Claims (6)

一種式(1)表示之化合物, 其中,L1表示單鍵、經取代或未經取代之3至30員伸雜芳基、經取代或未經取代之(C6-C30)伸芳基、或經取代或未經取代之(C3-C30)伸環烷基;X1及X2各獨立表示CH或N;Y1及Y2各獨立表示-O-、-S-、-CR5R6-或-NR7-,限制條件為Y1及Y2不同時存在;Ar1及Ar2各獨立表示氫、氘、鹵素、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、或經取代或未經取代之3至30員雜芳基;R1至R4各獨立表示氫、氘、鹵素、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、經取代或未經取代之3至30員雜芳基、經取代或未經取代之(C3-C30)環烷基、經取代或未經取代之5至7員雜環烷基、經取代或未經取代之(C6-C30)芳基 (C1-C30)烷基、-NR11R12、-SiR13R14R15、-SR16、-OR17、氰基、硝基、或羥基;或該R1至R4鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環,且該環之一個或多個碳原子可經至少一個選自氮、氧及硫之雜原子置換;R5至R7及R11至R17各獨立表示氫、氘、鹵素、經取代或未經取代之(C1-C30)烷基、經取代或未經取代之(C6-C30)芳基、經取代或未經取代之3至30員雜芳基、經取代或未經取代之5至7員員雜環烷基、或經取代或未經取代之(C3-C30)環烷基;或該R5至R7及R11至R17鍵結至相鄰之一個或多個取代基以形成單環或多環之(C5-C30)脂環或芳香環,且該環之一個或多個碳原子可經至少一個選自氮、氧及硫之雜原子置換;a、b、c及d各獨立表示1至4之整數;其中當a、b、c或d係2或更多之整數時,每一個R1、每一個R2、每一個R3或每一個R4係相同或相異;該雜環烷基及該(伸)雜芳基含有至少一個選自B、N、O、S、P(=O)、Si及P之雜原子。 a compound represented by the formula (1), Wherein L 1 represents a single bond, a substituted or unsubstituted 3 to 30 membered heteroaryl group, a substituted or unsubstituted (C6-C30) extended aryl group, or a substituted or unsubstituted group (C3) -C30)cycloalkyl group; X 1 and X 2 each independently represent CH or N; Y 1 and Y 2 each independently represent -O-, -S-, -CR 5 R 6 - or -NR 7 -, restrictions Y 1 and Y 2 are not present at the same time; Ar 1 and Ar 2 each independently represent hydrogen, deuterium, halogen, substituted or unsubstituted (C1-C30) alkyl, substituted or unsubstituted (C6-C30) An aryl group, or a substituted or unsubstituted 3 to 30 membered heteroaryl; each of R 1 to R 4 independently represents hydrogen, deuterium, halogen, substituted or unsubstituted (C1-C30) alkyl, Substituted or unsubstituted (C6-C30) aryl, substituted or unsubstituted 3 to 30 membered heteroaryl, substituted or unsubstituted (C3-C30)cycloalkyl, substituted or unsubstituted Substituted 5 to 7 membered heterocycloalkyl, substituted or unsubstituted (C6-C30) aryl (C1-C30) alkyl, -NR 11 R 12 , -SiR 13 R 14 R 15 , -SR 16 , -OR 17, cyano, nitro, or hydroxy; or the R 1 to R 4 bonded to the one or more adjacent substituents to form a monocyclic or The (C5-C30) aliphatic or aromatic ring, and one of the ring carbon atoms or more may be at least one heteroatom selected from nitrogen, oxygen and sulfur of substituted; R 5 to R 7 and R 11 to R 17 each Independently represents hydrogen, deuterium, halogen, substituted or unsubstituted (C1-C30) alkyl, substituted or unsubstituted (C6-C30) aryl, substituted or unsubstituted 3 to 30 member Aryl, substituted or unsubstituted 5 to 7 membered heterocycloalkyl, or substituted or unsubstituted (C3-C30)cycloalkyl; or R 5 to R 7 and R 11 to R 17 Bonding to one or more adjacent substituents to form a monocyclic or polycyclic (C5-C30) alicyclic or aromatic ring, and one or more carbon atoms of the ring may be selected from at least one selected from the group consisting of nitrogen and oxygen And a hetero atom substitution of sulfur; a, b, c and d each independently represent an integer from 1 to 4; wherein when a, b, c or d is an integer of 2 or more, each R 1 , each R 2 Each R 3 or each R 4 is the same or different; the heterocycloalkyl group and the (hetero)heteroaryl group contain at least one member selected from the group consisting of B, N, O, S, P(=O), Si, and P hetero atom. 如申請專利範圍第1項所述之化合物,其中,L1、Ar1、Ar2、R1至R7及R11至R17基團之該經取代之烷基、經取代之(伸)芳基、經取代之(伸)雜芳基、經取代之(伸)環烷基、經取代之雜環烷基及經取代之芳烷基之取代基各獨立選自下列所組成群組之至少一者:氘、鹵素、經鹵素取代或未經取代之(C1-C30)烷基、(C6-C30)芳基、 經(C1-C30)烷基或(C6-C30)芳基取代或未經取代之3至30員雜芳基、(C3-C30)環烷基、5至7員雜環烷基、三(C1-C30)烷基矽烷基、三(C6-C30)芳基矽烷基、二(C1-C30)烷基(C6-C30)芳基矽烷基、(C1-C30)烷基二(C6-C30)芳基矽烷基、(C2-C30)烯基、(C2-C30)炔基、氰基、N-咔唑基、二(C1-C30)烷基胺基、二(C6-C30)芳基胺基、(C1-C30)烷基(C6-C30)芳基胺基、二(C6-C30)芳基硼羰基、二(C1-C30)烷基硼羰基、(C1-C30)烷基(C6-C30)芳基硼羰基、(C6-C30)芳基(C1-C30)烷基、(C1-C30)烷基(C6-C30)芳基、羧基、硝基以及羥基。 The compound of claim 1, wherein the substituted alkyl group, substituted (stretched) of the groups L 1 , Ar 1 , Ar 2 , R 1 to R 7 and R 11 to R 17 The substituents of the aryl group, the substituted (extended) heteroaryl group, the substituted (extended) cycloalkyl group, the substituted heterocycloalkyl group and the substituted aralkyl group are each independently selected from the group consisting of At least one of: hydrazine, halogen, halogen-substituted or unsubstituted (C1-C30) alkyl, (C6-C30) aryl, substituted by (C1-C30)alkyl or (C6-C30) aryl or Unsubstituted 3 to 30 membered heteroaryl, (C3-C30)cycloalkyl, 5 to 7 membered heterocycloalkyl, tris(C1-C30)alkyldecane, tris(C6-C30)aryldecane , bis(C1-C30)alkyl (C6-C30) arylalkyl, (C1-C30)alkylbis(C6-C30)aryldecyl, (C2-C30)alkenyl, (C2-C30 Alkynyl, cyano, N-carbazolyl, bis(C1-C30)alkylamino, bis(C6-C30)arylamino, (C1-C30)alkyl(C6-C30)arylamine Base, di(C6-C30) aryl boroncarbonyl, di(C1-C30)alkyl boroncarbonyl, (C1-C30)alkyl (C6-C30) aryl boroncarbonyl, (C6-C30) aryl (C1 -C30)alkyl, (C1-C30)alkyl (C6-C30) aryl, carboxyl, And hydroxy groups. 如申請專利範圍第1項所述之化合物,其中, 式(1)中之該部份,係選自下列結構: 其中,R5、R6及R7之定義如申請專利範圍第1項之定義。 The compound according to claim 1, wherein the formula (1) The part is selected from the following structures: Wherein, R 5 , R 6 and R 7 are as defined in the first item of the patent application. 如申請專利範圍第1項所述之化合物,其中,L1表示單鍵、3至30員伸雜芳基或(C6-C30)伸芳基;X1及X2各獨立表示CH或N;Y1及Y2各獨立表示-O-、-S-、-CR5R6-或-NR7-,限 制條件為Y1及Y2不同時存在;Ar1及Ar2各獨立表示氫、氘、鹵素、(C1-C30)烷基、(C6-C30)芳基、或3至30員雜芳基;R1至R4各獨立表示氫、氘、鹵素、(C1-C30)烷基、(C6-C30)芳基、3至30員雜芳基、咔唑基、或-SiR13R14R15;R5至R7各獨立表示(C1-C30)烷基、(C6-C30)芳基、或3至30員雜芳基;或R5及R6係彼此鍵結以形成單環或多環之(C5-C30)脂環或芳香環,且該環之一個或多個碳原子可經至少一個選自氮、氧及硫之雜原子置換;R13至R15各獨立表示(C1-C30)烷基、(C6-C30)芳基、或3至30員雜芳基;以及L1之該伸芳基及伸雜芳基,Ar1及Ar2之該烷基、芳基、雜芳基及咔唑基,及R1至R7及R13至R15之該烷基、芳基及雜芳基可經至少一個選自下列所組成群組者取代:氘、鹵素、經鹵素取代或未經取代之(C1-C30)烷基、(C6-C30)芳基、經(C1-C30)烷基或(C6-C30)芳基取代或未經取代之3至30員雜芳基、(C3-C30)環烷基、三(C1-C30)烷基矽烷基、三(C6-C30)芳基矽烷基、二(C1-C30)烷基(C6-C30)芳基矽烷基、(C1-C30)烷基二(C6-C30)芳基矽烷基、咔唑基、二(C1-C30)烷基胺基、二(C6-C30)芳基胺基、(C1-C30)烷基(C6-C30)芳基胺基、(C6-C30)芳基(C1-C30)烷基、以及(C1-C30)烷基(C6-C30)芳基。 The compound of claim 1, wherein L 1 represents a single bond, a 3 to 30 member heteroaryl group or a (C6-C30) extended aryl group; and X 1 and X 2 each independently represent CH or N; Y 1 and Y 2 each independently represent -O-, -S-, -CR 5 R 6 - or -NR 7 -, and the restriction conditions are that Y 1 and Y 2 are not present at the same time; Ar 1 and Ar 2 each independently represent hydrogen, Anthracene, halogen, (C1-C30)alkyl, (C6-C30)aryl, or 3 to 30 membered heteroaryl; R 1 to R 4 each independently represent hydrogen, deuterium, halogen, (C1-C30)alkyl , (C6-C30) aryl, 3 to 30 membered heteroaryl, carbazolyl, or -SiR 13 R 14 R 15 ; R 5 to R 7 each independently represent (C1-C30)alkyl, (C6-C30 An aryl group, or a 3 to 30 membered heteroaryl group; or R 5 and R 6 groups bonded to each other to form a monocyclic or polycyclic (C5-C30) alicyclic or aromatic ring, and one or more of the rings The carbon atom may be substituted with at least one hetero atom selected from the group consisting of nitrogen, oxygen and sulfur; R 13 to R 15 each independently represent a (C1-C30) alkyl group, a (C6-C30) aryl group, or a 3 to 30 membered heteroaryl group. And the alkyl group and the heteroaryl group of L 1 , the alkyl group, the aryl group, the heteroaryl group and the oxazolyl group of Ar 1 and Ar 2 , and R 1 to R 7 and R 13 to R 15 Alkyl, aryl and heteroaryl It may be substituted by at least one group selected from the group consisting of hydrazine, halogen, halogen-substituted or unsubstituted (C1-C30) alkyl, (C6-C30) aryl, (C1-C30) alkyl Or (C6-C30) aryl substituted or unsubstituted 3 to 30 membered heteroaryl, (C3-C30)cycloalkyl, tri(C1-C30)alkyldecyl, tris(C6-C30)aryl矽alkyl, bis(C1-C30)alkyl(C6-C30)aryldecyl, (C1-C30)alkylbis(C6-C30)aryldecyl, oxazolyl, bis(C1-C30)alkane Amino group, bis(C6-C30)arylamino group, (C1-C30)alkyl (C6-C30) arylamino group, (C6-C30) aryl (C1-C30) alkyl group, and (C1 -C30) alkyl (C6-C30) aryl. 如申請專利範圍第1項所述之化合物,其中,該式(1) 表示之化合物係選自下列所組成群組: The compound according to claim 1, wherein the compound represented by the formula (1) is selected from the group consisting of: 一種有機電場發光裝置,包括申請專利範圍第1項所述之化合物。 An organic electric field illuminating device comprising the compound according to claim 1 of the patent application.
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