TW201303309A - Probe card and manufacturing method thereof - Google Patents

Abstract

A probe card including a carrier and a plurality of probes is provided. The carrier has an upper surface. The probes are disposed on the carrier and arranged at the upper surface. Each probe has at lease a first rod portion and a second rod portion, which are connected in series. The first rod portion is disposed on the upper surface and an included tilt angle is formed between the upper surface and the first rod portion. An included angle is formed between the extending directions of the first rod portion and the second rod portion.

Description

Probe card and manufacturing method thereof

The present invention relates to a test element and a method of fabricating the same, and more particularly to a probe card capable of maintaining relative positioning and flatness of a probe and a method of fabricating the same.

The electrical test of an integrated circuit chip (IC chip) is quite important in the manufacturing process. Each IC wafer must be tested in both wafer and package types to ensure its electrical function. When the integrated circuit is tested, the test machine contacts the device under test through a probe card, and transmits an electrical signal through the driving signal, and then analyzes the received electrical signal to obtain a test. The integrated circuit is the result of good or waste.

The test performed when individual wafers are in wafer type is called wafer test. The method of wafer detection is to make the test machine and the probe card form a test loop, and the probe (Probing pin) on the probe card is directly contacted with a pad or a bump on the wafer to The probe is used to detect each wafer on the wafer, thereby extracting the wafer signal, and sending the wafer signal data to the testing machine for analysis and judgment.

The probe card contains a plurality of precise probes, that is, the tip of each probe is micro-pitch (substantially less than 100 microns), and the probes are unstressed or stressed due to variations in manufacturing process parameters. In this case, the relative positioning and the flatness will be too large, which will cause poor contact of the soldering pad of the object to be tested or excessive indentation of the soldering pad, thereby affecting the reliability and accuracy of the test.

In addition, the spacing between the probes of the various probe cards of the prior art cannot be reduced, so that the electrical testing of the micro-pitch contacts cannot be performed, and the types of wafers that can be tested are limited. Therefore, how to solve the above problems has become one of the goals of the industry's active efforts.

The invention provides a probe card which can perform electrical testing of micro-pitch contacts and maintain the reliability and accuracy of the test.

The invention provides a method for manufacturing a probe card, which is used for manufacturing the probe card described above, and has a low manufacturing cost.

The present invention provides a probe card that includes a carrier and a plurality of probes. The carrier has an upper surface. The probes are disposed on the carrier and arranged on the upper surface, wherein each probe has at least two first and second rod portions connected in sequence, and the first rod portion is disposed on the upper surface and There is an oblique angle with the upper surface, and an angle between the first rod body portion and the extending direction of the second rod body portion.

The invention also proposes a method for manufacturing a probe card, which comprises the following steps. A carrier is provided wherein an upper surface of the carrier is coated with a first photoresist layer. The first photoresist layer is obliquely exposed in a first exposure direction to form a first patterned photoresist layer, wherein the first exposure direction is inclined with respect to the upper surface of the carrier. The first patterned photoresist layer is a first plating mask, and a first patterned conductive layer is plated on a portion of the upper surface of the carrier exposed by the first patterned photoresist layer. Forming a second photoresist layer on the first patterned photoresist layer, wherein the second photoresist layer covers the first patterned photoresist layer and the first patterned conductive layer. Exposing the second photoresist layer obliquely in a second exposure direction to form a second patterned photoresist layer, wherein the second exposure direction is inclined with respect to an outer surface of the first patterned photoresist layer, and the second patterning The photoresist layer exposes a top surface of the first patterned conductive layer. The second patterned photoresist layer is a second plating mask, and a second patterned conductive layer is plated on the top surface of the first patterned conductive layer exposed by the second patterned photoresist layer. The second patterned photoresist layer and the first patterned photoresist layer are removed such that the first patterned conductive layer and the second patterned conductive layer form a plurality of probes disposed on the carrier and arranged on the upper surface. Each probe has at least two first and second body portions connected in series, the first body portion is disposed on the upper surface and is composed of a first patterned conductive layer, and the second body The portion is composed of a second patterned conductive layer. The first rod body has an inclination angle with the upper surface, and an angle between the first rod body portion and the second rod body portion extending direction.

Based on the above, since the present invention uses microelectromechanical fabrication techniques to define the position and geometry of these probes by oblique exposure, these probes are formed by electroplating. Therefore, the probe card of the present invention is suitable for mass production and has a low manufacturing cost.

Furthermore, the probe body of the adjacent carrier of the present invention has an inclination angle between the rod body portion and the upper surface of the carrier, and an angle between the extending directions of the adjacent two rod body portions. Therefore, the arrangement density of these probes is reduced, which is advantageous for testing wafers with high wafer pad density or other high junction density electronic components. In addition, the present invention can maintain the relative positioning and flatness of the probe head without becoming large due to variations in the manufacturing process, thereby affecting the reliability and accuracy of the test. In short, the probe card of the present invention is suitable for performing electrical testing of micro-pitch contacts.

The above described features and advantages of the present invention will be more apparent from the following description.

1A to 1H are schematic cross-sectional views showing a method of fabricating a probe card according to an embodiment of the present invention. According to the method for fabricating the probe card of the present embodiment, first, referring to FIG. 1A, a carrier 110 is provided, wherein the carrier 110 has an upper surface 112, and the upper surface 112 is coated with a first photoresist layer 120. In the present embodiment, the carrier 110 is, for example, a circuit board or a resin (such as a bismaleimide-triazine resin (BT resin)) circuit substrate. That is, the carrier 110 is a germanium substrate or a BT substrate having a wiring structure (not shown).

Next, referring to FIG. 1A and FIG. 1B, a first patterned mask M1 is provided, and the first photoresist layer 120 is obliquely exposed in a first exposure direction L1 to form a first patterned photoresist layer 120a. That is, at least one first hole 121 penetrating through the first photoresist layer 120 and extending to the upper surface 112 of the carrier 110 is formed. The first exposure direction L1 is inclined with respect to the upper surface 112 of the carrier 110, and thus the first hole 121 is inclined with respect to the upper surface 112 of the carrier 110 and exposes a portion of the upper surface 112 of the carrier 110.

Next, referring to FIG. 1C, the first patterned photoresist layer 120a is a first plating mask, and the first hole 121 (shown in FIG. 1B) of the first patterned photoresist layer 120a is plated and exposed. A portion of the upper surface 112 of the carrier 110 is formed to form a first patterned conductive layer 130. For the flatness of the subsequent steps, a polishing step may be followed to substantially align a top surface 132 of the first patterned conductive layer 130 with an outer surface 122 of the first patterned photoresist layer 120a. Of course, the grinding step is an optional step, and the user can select whether to perform the grinding step according to the difference in the manufacturing process, which is not limited herein.

Next, referring to FIG. 1D, a second photoresist layer 140 is formed on the first patterned photoresist layer 120a, wherein the second photoresist layer 140 covers the first patterned photoresist layer 120a and the first patterned conductive layer 130. .

Next, referring to FIG. 1D and FIG. 1E, a second patterned mask M2 is provided, and the second photoresist layer 140 is obliquely exposed in a second exposure direction L2 to form a second patterned photoresist layer 140a. That is, at least one second hole 141 penetrating through the second photoresist layer 140 and extending to the outer surface 122 of the first patterned photoresist layer 120a is formed. The second exposure direction L2 is inclined with respect to the outer surface 122 of the first patterned photoresist layer 120a, so the second hole 141 is inclined with respect to the outer surface 122 of the first patterned photoresist layer 120a and exposes the first patterned conductive layer 130. The top surface 132, wherein the first exposure direction L1 in FIG. 1A is substantially different from the second exposure direction L2 in FIG. 1D.

Next, referring to FIG. 1F, the second patterned photoresist layer 140a is a second plating mask, and the second hole 141 (shown in FIG. 1D) of the second patterned photoresist layer 140a is plated and exposed. The top surface 132 of the first patterned conductive layer 130 is patterned to form a second patterned conductive layer 150.

Next, referring to FIG. 1G, the second patterned photoresist layer 140a and the first patterned photoresist layer 120a are removed, and the first patterned conductive layer 130 and the second patterned conductive layer 150 are configured to be disposed on the carrier. The probes 160 are arranged on the upper surface 112, and the probes 160 are electrically connected to the line structure (not shown) of the carrier 110. In particular, each probe 160 has a plurality of first and second rod portions 161 and 163 connected in series, and a slope between the first rod portion 161 and the upper surface 112 of the adjacent carrier 110 The angle T and the adjacent first rod body portion 161 and the extending direction E1, E2 of the second rod body portion 163 have an angle θ. Here, the included angle θ is substantially greater than the tilt angle T, and the included angle θ is substantially twice the tilt angle T, the tilt angle T is, for example, between 50 degrees and 70 degrees, and the included angle θ is, for example, between 100 degrees and Between 140 degrees. In addition, each probe 160 has a top end 162 and a bottom end 164, and the orthographic projection of the top end 162 on the carrier 110 at least partially overlaps the orthographic projection of the bottom end 164 on the carrier.

It should be noted that the first rod portion 161 of each probe 160 of the embodiment is composed of the first patterned conductive layer 130, that is, the first rod portion 161 of the adjacent carrier 110 is first. The patterned conductive layer 130 is formed. The second rod portion 163 of each probe 160 is composed of a second patterned conductive layer 150, that is, the second rod portion 163 remote from the carrier 110 is composed of the second patterned conductive layer 150. Herein, the material of the first patterned conductive layer 130 and the material of the second patterned conductive layer 150 may be the same or different, and the material is, for example, an alloy such as nickel, cobalt, gold or copper, and is not limited thereto. In other words, the material of these probes 160 is, for example, an alloy of nickel, cobalt, gold or copper. Further, the adjacent two probes 160 have a separation distance S therebetween, and the separation distance S is, for example, less than 50 micrometers. Here, the separation distance S refers to the distance from the center of the shape of the bottom end 164 of the first rod portion 161 of the adjacent two probes 160.

Referring to FIG. 1H, a soft insulating layer 170 is formed on the upper surface 112 of the carrier 110, wherein the soft insulating layer 170 fills the gap between the adjacent probes 160. Here, the material of the soft insulating layer 170 is, for example, polydimethylsiloxane (PDMS) or gelatin (Gelatin). For the flatness of the subsequent steps, a grinding step can then be performed to substantially align the surface 172 of the flexible insulating layer 170 with the plurality of tips 162 of the probes 160. Of course, the grinding step is an optional step, and the user can select whether to perform the grinding step according to the difference in the manufacturing process, which is not limited herein. It is worth mentioning that, since the gap between the probes 160 is filled with the soft insulating layer 170 in this embodiment, the short circuit between the adjacent two probes 160 can be avoided, and the probes 160 can be effectively fixed. position.

Referring to FIG. 1I, finally, a plurality of wear pads 180 are respectively formed on the top ends 162 of the probes 160, wherein the wear pads 180 are made of, for example, nickel gold. It must be noted herein that the present invention does not limit the order in which the soft insulating layer 170 and the wear pad 180 are formed, although in the present embodiment, the wear pads 180 are formed after the soft insulating layer 170 is formed. However, in other embodiments, there may be no soft insulating layer 170, that is, after the second patterned photoresist layer 140a and the first patterned photoresist layer 120a are removed, directly to the probes 160. These wear pads 180 are formed on these tips 162. So far, the production of the probe card 100a has been completed.

Referring again to FIG. 1I, the probe card 100a of the present embodiment includes a carrier 110 and the probes 160. The carrier 110 has an upper surface 112, wherein the carrier 110 is, for example, a tantalum wiring substrate or a resin wiring substrate. The probes 160 are disposed on the carrier 110 and arranged on the upper surface 112. The materials of the probes 160 are, for example, alloys of nickel, cobalt, gold or copper. Each of the probes 160 has the first rod body portion 161 and the second rod body portion 163 which are sequentially connected, and the first rod body portion 161 of the adjacent carrier 110 and the upper surface 112 have an inclination angle T, and the phase The adjacent first rod body portion 161 has an included angle θ with the extending directions E1 and E2 of the second rod body portion 163. Preferably, the inclination angle T is, for example, between 50 degrees and 70 degrees, and the angle θ is, for example, between 100 degrees and 140 degrees. Furthermore, the adjacent two of the probes 160 have a separation distance S therebetween, wherein the separation distance S is, for example, less than 50 micrometers. Each probe 160 further has a top end 162 and a bottom end 164, and the orthographic projection of the top end 162 on the carrier 110 at least partially overlaps the orthographic projection of the bottom end 164 on the carrier 110. In addition, the probe card 100a of the embodiment further includes a soft insulating layer 170 and the wear pads 180, wherein the soft insulating layer 170 is disposed on the upper surface 112 of the carrier 110 and fills the gap between the adjacent two probes 160. These wear pads 180 are disposed on the top ends 162 of the probes 160, respectively. Here, the material of the soft insulating layer 170 is, for example, polydimethylsiloxane (PDMS) or gelatin (Gelatin), and the wear pad 180 is made of nickel gold.

Since the present embodiment uses microelectromechanical fabrication techniques to define the position and geometry of the probes 160 by oblique exposure, the probes 160 are formed by electroplating. Therefore, the probe card 100a of the present embodiment is suitable for mass production and has a low manufacturing cost. Furthermore, since the first rod body portion 161 of the probes 160 of the adjacent carriers 110 of the present embodiment and the upper surface 112 of the carrier 110 have an inclination angle T, and the adjacent first rod portions 161 and The extending directions E1 and E2 of the two-bar body portion 163 have an included angle θ. Therefore, the arrangement density of these probes 160 is reduced, which is advantageous for testing wafers with high wafer pad density or other high junction density electronic components. In short, the probe card 100a of the present embodiment is suitable for performing electrical testing of micro-pitch contacts.

Referring to FIG. 2, those skilled in the art can refer to the description of the foregoing embodiments, and according to actual needs, before the step of FIG. 1I, that is, before forming the polishing pads 180 on the top ends 162 of the probes 160, The second photoresist layer 140 is formed in sequence (refer to the step of FIG. 1D), the second patterned photoresist layer 140a is formed (please refer to the step of FIG. 1E), and the second patterned conductive layer 150 is plated (refer to the figure). The step of step 1F) forms the probe card 100b of FIG. 2, wherein the probes 160b of the probe card 100b are the first rod portion 161, the second rod portion 163, and the third which are sequentially connected by these. The rod body 165 is composed of.

Please refer to FIG. 3, or according to actual needs, before the step of FIG. 1I, that is, before the polishing pads 180 are formed on the top ends 162 of the probes 160, the second photoresist layer 140 is sequentially formed twice. Please refer to FIG. 1D), forming a second patterned photoresist layer 140a (please refer to the step of FIG. 1E) and plating the second patterned conductive layer 150 (refer to the step of FIG. 1F) to form FIG. The probe card 100c, wherein the probes 160c of the probe card 100c are connected by the first rod body portion 161, the second rod body portion 163, the third rod body portion 165, and the fourth rod body portion 167 which are sequentially connected. composition. In short, the structure of the probe card 100a illustrated in FIG. 1H is for illustrative purposes only, and those skilled in the art can adjust the first rod portion 161 and the second portion of the probes 160 according to actual conditions. The number of stacks of the rod portions 163 is in accordance with the requirements, and will not be described one by one here.

4A is a perspective view of a probe according to an embodiment of the present invention. 4B is a partial cross-sectional perspective view of the probe and the soft insulating layer of FIG. 4A. The same reference numerals are used to denote the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted portions, reference may be made to the foregoing embodiments, and the detailed description is not repeated herein.

Referring to FIG. 4A and FIG. 4B simultaneously, the probe 160d of the present embodiment is similar to the probe 160 of the previous embodiment, but the main difference between the two is that the probe 160d of the embodiment is connected by these sequentially. a rod body portion 161, a second rod body portion 163, a third rod body portion 165, a fourth rod body portion 167, a fifth rod body portion 168, and a sixth rod body portion 169, and the soft insulating layer 170d is not The tip 162 of the probe 160d is aligned. That is, the soft insulating layer 170d exposes a portion of the rod portion 169.

In summary, since the present invention uses microelectromechanical fabrication techniques to define the position and geometry of these probes by oblique exposure, these probes are formed by electroplating. Therefore, the probe card of the present invention is suitable for mass production and has a low manufacturing cost. Furthermore, the probe body of the adjacent carrier of the present invention has an inclination angle between the rod body portion and the upper surface of the carrier, and an angle between the extending directions of the adjacent two rod body portions. Therefore, the arrangement density of these probes is reduced, which is advantageous for testing wafers with high wafer pad density or other high junction density electronic components.

Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

100a, 100b, 100c, 100d. . . Probe card

110. . . Carrier

112. . . Upper surface

120. . . First photoresist layer

120a. . . First patterned photoresist layer

121. . . First hole

122. . . The outer surface

130. . . First patterned conductive layer

132. . . Top surface

140. . . Second photoresist layer

140a. . . Second patterned photoresist layer

141. . . First hole

150. . . Second patterned conductive layer

160, 160b, 160c, 160d. . . Probe

161, 163, 165, 167, 168, 169. . . Rod body

162. . . top

164. . . Bottom end

170, 170d. . . Soft insulation

172. . . surface

180. . . Wear layer

L1. . . First exposure direction

L2. . . Second exposure direction

S. . . Spacing distance

T. . . Tilt angle

M1. . . First patterned mask

M2. . . Second patterned mask

θ. . . Angle

1A to 1I are schematic cross-sectional views showing a method of fabricating a probe card according to an embodiment of the present invention.

2 is a cross-sectional view showing a probe card according to another embodiment of the present invention.

3 is a cross-sectional view showing a probe card according to still another embodiment of the present invention.

4A is a perspective view of a probe according to an embodiment of the present invention.

4B is a partial cross-sectional perspective view of the probe and the soft insulating layer of FIG. 4A.

100a. . . Probe card

110. . . Carrier

112. . . Upper surface

160. . . Probe

161, 163. . . Rod body

162. . . top

164. . . Bottom end

170. . . Soft insulation

180. . . Wear layer

E1, E2. . . Extension direction

S. . . Spacing distance

T. . . Tilt angle

θ. . . Angle

Claims (20)

A probe card comprising: a carrier having an upper surface; and a plurality of probes disposed on the carrier and arranged on the upper surface, wherein each probe has a plurality of first poles connected in sequence And a second rod body portion, the first rod body portion is disposed on the upper surface and has an inclined angle with the upper surface, and a direction between the first rod body portion and the second rod body portion extending direction Angle. The probe card of claim 1, wherein the tilt angle is between 50 degrees and 70 degrees. The probe card of claim 1, wherein the included angle is between 100 degrees and 140 degrees. The probe card of claim 1, wherein the adjacent two probes have a separation distance between the two probes, and the separation distance is less than 50 micrometers. The probe card of claim 1, further comprising: a soft insulating layer disposed on the upper surface of the carrier and filling a gap between adjacent probes. The probe card of claim 5, wherein the soft insulating layer is made of polydimethylsiloxane (PDMS) or gelatin (Gelatin). The probe card of claim 1, further comprising: a plurality of wear pads respectively disposed on the plurality of top ends of the probes. The probe card of claim 7, wherein the wear pads are made of nickel gold. The probe card of claim 1, wherein the probe material comprises an alloy of nickel, cobalt, gold or copper. The probe card of claim 1, wherein each probe further has a top end and a bottom end, and the orthographic projection of the top end on the carrier and the orthographic projection of the bottom end on the carrier are at least Partial overlap. The probe card of claim 1, wherein the carrier comprises a circuit substrate, a flexible substrate or a resin circuit substrate. A method for manufacturing a probe card, comprising: providing a carrier, an upper surface of the carrier is coated with a first photoresist layer; and the first photoresist layer is obliquely exposed in a first exposure direction to form a first a patterned photoresist layer, wherein the first exposure direction is inclined with respect to the upper surface of the carrier; wherein the first patterned photoresist layer is a first plating mask, and a first patterned conductive layer is plated a portion of the upper surface of the carrier exposed by the patterned photoresist layer; a second photoresist layer formed on the first patterned photoresist layer, wherein the second photoresist layer covers the first pattern a photoresist layer and the first patterned conductive layer; obliquely exposing the second photoresist layer in a second exposure direction to form a second patterned photoresist layer, wherein the second exposure direction is opposite to the first pattern An outer surface of the photoresist layer is inclined, and the second patterned photoresist layer exposes a top surface of the first patterned conductive layer; and the second patterned photoresist layer is a second plating mask. Electroplating a second patterned conductive layer exposed by the second patterned photoresist layer And affixing the second patterned photoresist layer and the first patterned photoresist layer to the first patterned conductive layer and the second patterned conductive layer; Forming a plurality of probes disposed on the carrier and arranged on the upper surface, wherein each probe has at least two first and second body portions connected in sequence, the first body portion is disposed The upper surface is composed of the first patterned conductive layer, and the second rod portion is formed by the second patterned conductive layer, and the first rod portion and the upper surface have a The inclination angle has an angle between the first rod body and the extending direction of the second rod body. The method for fabricating the probe card of claim 12, further comprising: plating the first patterned conductive layer on a portion of the upper surface of the carrier exposed by the first patterned photoresist layer Thereafter, a grinding step is performed to substantially align the top surface of the first patterned conductive layer with the outer surface of the first patterned photoresist layer. The method for fabricating a probe card according to claim 12, further comprising: after removing the second patterned photoresist layer and the first patterned photoresist layer, forming a soft insulating layer on the carrier The upper surface of the upper surface, wherein the soft insulating layer fills a gap between adjacent probes. The method of manufacturing the probe card of claim 14, further comprising: after forming the soft insulating layer on the upper surface of the carrier, performing a grinding step to make the surface of the flexible insulating layer The plurality of tips of the probes are substantially aligned. The method for manufacturing a probe card according to claim 12, further comprising: after removing the second patterned photoresist layer and the first patterned photoresist layer, forming a plurality of wear pads respectively The probes are on multiple tops. The method for fabricating a probe card according to claim 12, further comprising: repeating at least one time in sequence to remove the second patterned photoresist layer and the first patterned photoresist layer a second photoresist layer, a step of forming the second patterned photoresist layer, and plating the second patterned conductive layer. The method of fabricating the probe card of claim 12, wherein the tilt angle is between 50 degrees and 70 degrees. The method of fabricating the probe card of claim 12, wherein the included angle is between 100 degrees and 140 degrees. The method of fabricating the probe card of claim 12, wherein the adjacent two probes have a separation distance between each other, and the separation distance is less than 50 micrometers.