201239947 六、發明說明： 【發明所屬之技術領域】 本發明係關於準分子燈及裝載其之準分子光照射裝置 ，特別是關於在發光管的內壁面上形成有紫外線反射膜之 準分子燈及準分子光照射裝置。 【先前技術】 在半導體及液晶基板之製程中，爲了除去附著於砂晶 圓或玻璃基板表面之有機化合物等髒污，廣泛利用使用紫 外線之乾式洗淨方法。 特別是，使用從準分子燈放射之波長200mm以下之 真空紫外線，以臭氧等活性氧來做爲洗淨之方法，爲實施 該方法，係於裝載在準分子光照射裝置的準分子燈上形成 紫外線反射膜，如日本特開2 0 1 0 - 8 0 3 5 1號公報（專利文 獻1 )等即已揭示。 在該專利文獻1中，爲了有效率地放射紫外線，其在 發光管內面上，除了相對被處理物呈直線配置之發光管的 光射出方向側之面以外，會形成由二氧化矽粒子與三氧化 二鋁粒子所構成之紫外線反射膜。 不過，如此形成紫外線反射膜之發光管，隨著點燈時 間的累積，供紫外線穿過之光射出方向的壁上，紫外線形 變會蓄積，導致長度方向收縮。另一方面，形成紫外線反 射膜側的壁上，不受該紫外線形變的影響而不會變形，因 此發光管的中央部會朝向紫外線反射膜形成壁側翹曲，而 201239947 整體會朝向形成紫外線反射膜壁側呈凸狀翹曲，引發問題 〇 一旦準分子燈向上方翹曲，那麼在準分子燈兩端側與 中央部分，玻璃基板等被照射物之工件面與準分子燈之間 的距離就會不同，使得工件面上各部位的光照射照度產生 落差，引發紫外線處理無法均一之問題。 在上述專利文獻1中，爲解決此一問題，其如圖7所 示般，在準分子光照射裝置的框體上，設置移動限制體， 用以限制準分子燈之中央部因紫外線形變之蓄積而產生翹 曲，而令該移動限制體下端與準分子燈之中央部分抵接， 企圖完善地解決翹曲問題。 亦即在圖7中，準分子燈光照射裝置1具有由框體2 所支撐之準分子燈3，而其發光管31之上下平面上設有 外部電極32。準分子燈3之下方，利用搬運滾輪6來搬 運被處理物W。 而前述準分子燈3的略中央部上方設有移動限制體5 ，其先端之旋轉滾子51與準分子燈3之發光管31上方抵 接，隨著點燈時間的累積，紫外線之形變會蓄積，準分子 燈3的中央部會朝上方突出，而以該移動限制體5予以強 制抑止。 然而上述習知技術中，是將使用一定時間後欲彎曲之 準分子燈加以強制地限制其翹曲之故，一旦蓄積於發光管 玻璃的該翹曲限制應力與紫外線應力合計超過一定値，將 會導致破損，而產生新的問題。 -6- 201239947 [先前技術文獻] [專利文獻] [專利文獻1]日本特開20 1 0 — 8035 1號公報 【發明內容】 [發明所欲解決之課題] 本發明有鑑於以上習知技術之問題點，目的在於提供 一種準分子燈之構造，該準分子燈係具備：長型之發光管 ，具有密閉空間，內部封入稀有氣體；及一對對向電極’ 配置於該發光管之外表面，隔著該發光管彼此相對；及紫 外線反射膜，形成於除了前述發光管光射出部以外之內壁 面上：當於具備移動限制體之準分子光照射裝置上裝載該 準分子燈時，防止因紫外線形變與該翹曲限制形變之蓄積 ，而導致發光管的早期損傷；其中，該移動限制體係用以 限制因紫外線之變形形變而導致準分子燈之翹曲。 [用以解決課題之手段] 爲解決上述課題，本發明之準分子燈’其特徵爲：前 述發光管管軸方向之中央部，朝向該發光管之光射出部方 向呈突出的方式彎曲。 又，前述裝載準分子燈之準分子光照射裝置’其特徵 爲，於框體上設置移動限制體，其與該準分子燈中央部之 紫外線反射膜形成部側抵接，同時設置橋正維持構件與光 射出部側抵接；前述準分子燈，藉由該矯正維持構件而於 201239947 管軸方向被矯正成直線狀而予保持。 [發明之功效] 依據本發明，中央部朝光射出部側呈突出之方式彎曲 的準分子燈，裝載於準分子光照射裝置時，藉由矯正維持 構件從該光射出部側與燈抵接，於管軸方向矯正成直線狀 而予保持，故在點燈初期，該矯正所產生的機械形變，會 因紫外線而逐漸緩和，而在經過規定時間後，該機械形變 消失’而翹曲限制應力逐漸蓄積；由於翹曲限制應力與紫 外線應力之合計應力的蓄積會令發光管損傷，而本發明可 大幅延長其導致損傷的累積時間，大幅改善燈破損前的壽 命。 【實施方式】 圖1所示者爲本發明之準分子燈3，圖1(A)爲從 下面側觀察之立體圖、圖1(B)爲其橫切面圖。準分子 燈3之發光管31，剖面呈扁平四角形狀，長度方向呈長 尺形狀，其上下面設有外部電極32、32。 如圖1 ( B)所示，此發光管3 1之內面中，上面側及 側面側被覆有紫外線反射膜3 3而形成紫外線反射膜形成 部3 5，下面側並未形成紫外線反射膜，該部分形成光射 出部3 4。 又如圖2所示，該發光管31於其長度軸方向，中央 部朝向前述光射出部34側，呈突出若干量L的方式彎曲 201239947 又，上述發光管31的形狀不限於剖面角型之扁平形 狀，亦可爲圓型，或2重管構造。 此外，圖示中紫外線反射膜3 3形成於發光管3 1的3 個面，但並不限於此，僅形成於上面亦可。 以下說明此類發光管31之製造方法之一例。 首先，製作出具規定剖面形狀之發光管。此時，發光 管於長度方向並無彎曲。 接下來，在發光管除光射出部以外之內面上，形成紫 外線反射膜。 其後，密封發光管。 接下來，將發光管長度方向之兩端以光射出部側朝下 方的方式予以支撐，並對中央部往下壓相當於欲彎曲的量 L，在該狀態下加熱發光管全體。此時，持續升高加熱溫 度，直到發光管變形並在彎曲規定量狀態下定形。藉此， 下方便形成突出之光射出部。 其後，於彎曲的發光管上下面形成電極。 接下來，於發光管內封入氙氣等規定之放電氣體後， 燈便完成。 裝載上述彎曲之準分子燈3的準分子光照射裝置！， 如圖3以後各圖所示。 圖3爲其全體圖’圖4爲圖3爲重要部分放大圖，圖 5爲圖3之A— A剖面圖。 如圖3所示，長度軸方向的中央部下方，亦即向光射 -9- 201239947 出部3 4側突出彎曲之準分子燈3，其兩端安裝於燈支架4 上。 而如圖4及圖5所示，準分子燈3的中央部，於下方 的光射出部34側與矯正維持構件8抵接，令該構件上昇 以強制矯正準分子燈3之彎曲，使其於長度軸方向維持直 線狀。 像這樣受矯正而於軸方向成爲直線狀之準分子燈3, 於其中央部，設置於上方的移動限制體5先端之旋轉滾子 5 1，便會與紫外線反射膜形成部3 5側抵接。 又，此情形下，準分子燈3與移動限制體5的旋轉滾 子5 1之間，例如亦可具有〇 . 5 mm左右的間隙。 此外，要矯正彎曲之準分子燈3，.亦可不依靠上述矯 正維持構件8，而以未圖示之其他推壓手段，將中央部自 下方往上頂而成直線狀，其後再令其與該矯正維持構件8 抵接，維持直線狀態。 又，上述矯正維持構件8，如圖5所示，是從準分子 燈3長邊側的兩側抵接的方式，而由一對物體構成，藉由 避開電極3 2予以抵接，便不會遮擋射出光，達到充份利 用，不會使被照射物W面產生照度不均。 圖6揭示本發明之實驗結果。 圖6爲點燈持續時間與應力（Μ P a )之間的關係圖， 針對未彎曲（習知例) 、L = 3mm彎曲（本.發明！△)、 L = 5mm彎曲（本發明2〇）、L=l〇mm彎曲（本發明3口 )之燈，揭示其全體承受之應力、及僅來自紫外線形變之 -10- 201239947 應力（♦)。 實驗所用之燈，具有長2380mm、高18mm、寬71mm 之石英玻璃製扁平角型發光管，且於發光管內封入氙氣之 準分子燈。 紫外線形變應力（♦)，是在不以物理方式推壓或矯 正燈的情形下，純粹測量紫外線形變之應力値。該紫外線 形變.，會與點燈時間成比例而蓄積，2000小時爲10.6MPa ' 4000 小時達 23.9MPa° 習知例（)，是不對燈施以彎曲處理之情形下，燈 所承受之合計應力値。隨著點燈時間累積，加上紫外線形 變，上方亦即光射出部侧會縮短，並朝向紫外線反射膜形 成部側突出翹曲，而會受到來自移動限制體的矯正應力。 2000 小時爲 22.8MPa > 5000 小時達 49.8MPa。 —般說來，石英玻璃之應力値若達50. OMPa以上便有 破損的可能，而習知例之燈於經過5000小時後便會處於 危險狀態。 本發明1(Δ)，是向下方施以3mm彎曲處理之燈 ，所承受之合計應力値。自點燈初期階段開始，中央支持 部受到來自下方的矯正，會產生一定量的應力。而隨著點 燈時間累積，逐漸朝向上方彎曲變形後，來自下方的前述 矯正應力作用便會減少，使得全體合計應力暫時下降。 原本燈朝下方突出之形狀，由於紫外線形變之蓄積而 逐漸朝上方突出，暫時會成爲直線狀。在此狀態下，來自 矯正的應力幾乎可以不計，而僅與來自紫外線應力之應力 -11 - 201239947 値相符。此即圖6中「本發明1」與「紫外 線相交點。 其後，因朝向上方翹曲，會逐漸受到來 的矯正應力。2000小時爲 18.9MPa、 4 9.1 MPa，但與習知例相比，在累積相同點 下，呈現出應力値較少之結果。 本發明2(〇），是向下方施以5mm ，所承受之合計應力値。在此情形下，亦與 之燈呈現同樣的現象，點燈初期應力値會暫 由於紫外線形變之蓄積而逐漸上昇。 而2000小時爲16.3MPa、4000小時達 累積相同點燈時間的狀態下，相較於習知例 本發明1，呈現出應力値較少之結果。 本發明3(〇)，是向下方施以10mm ，所承受之合計應力値。該燈的測試結果： 10.6MPa (與紫外線應力相同）、4000小時 在累積相同點燈時間的狀態下，甚至相較於 現出應力値較少之結果。 如上所述，依據本發明，預先令準分子 外線反射膜之光射出部側，呈突出的方式彎 於準分子光照射裝置時，將前述彎曲矯正成 載，是故該矯正所產生的機械應力，是與移 制應力呈相反方向而施加，在點燈初期時， 發揮緩和減少的作用，而再經過規定時間後 線應力」的直 自移動限制體 4000 小時達 燈時間的狀態 彎曲處理之燈 前述本發明1 時減少，其後 40.4MPa，在 ，甚至相較於 彎曲處理之燈 2 0 0 0小時爲 達 33.9MPa， 本發明2，呈 燈朝未形成紫 曲，該燈裝載 直線狀而予裝 動限制體之限 該初始應力會 ，移動限制體 -12- 201239947 的題曲限制應力便會蓄積。 亦即，一開始時承受負方向的應力，隨著點燈而漸漸 成爲〇，其後再往正方向作用。 因此’習知例中’限制紫外線變形之翹曲限制應力是 從一開始即逐漸增加，亦即從一開始的〇立刻往正方向作 用；與之相比，可將到達相同應力基準所需的時間延長， 藉此可達到增加燈壽命化之目的。 【圖式簡單說明】 [圖1]本發明準分子燈之說明圖。 [圖2]圖1於軸方向之側視圖。 [圖3]本發明準分子光照射裝置之全體圖。 [圖4]圖3之重要部分放大圖。 [圖5]圖3之A — A剖面圖。 [圖6]本發明功效果之示意圖表。 [圖7]習知之準分子燈光照射裝置。 【主要元件符號說明】 1 :準分子光照射裝置 2 :框體 3 :準分子燈 3 1 :發光管 3 2 :電極 3 3 :紫外線反射膜 -13- 201239947 3 4 :光射出部 3 5 :紫外線反射膜形成部 4 :燈支架 5 :移動限制體 5 1 :旋轉滾子 6 :搬運滾輪 8 :矯正維持構件 L :突出量 W :被處理物201239947 VI. Description of the Invention: [Technical Field] The present invention relates to an excimer lamp and an excimer light irradiation device mounted thereon, and more particularly to an excimer lamp having an ultraviolet reflection film formed on an inner wall surface of an arc tube Excimer light irradiation device. [Prior Art] In the process of semiconductor and liquid crystal substrate, a dry cleaning method using ultraviolet rays is widely used in order to remove contamination such as an organic compound adhering to a sand crystal circle or a glass substrate surface. In particular, vacuum ultraviolet light having a wavelength of 200 mm or less emitted from an excimer lamp is used as a method of cleaning with active oxygen such as ozone, and the method is carried out by forming an excimer lamp mounted on an excimer light irradiation device. The ultraviolet ray-reflecting film is disclosed, for example, in Japanese Laid-Open Patent Publication No. 2000-80357 (Patent Document 1). In order to emit ultraviolet rays efficiently, the inside surface of the arc tube is formed of cerium oxide particles and the surface of the light-emitting tube on the light-emitting direction side of the light-emitting tube arranged linearly with respect to the object to be processed. An ultraviolet reflective film composed of aluminum oxide particles. However, in the arc tube in which the ultraviolet ray reflection film is formed, as the lighting time is accumulated, the ultraviolet ray deformation accumulates on the wall in the direction in which the ultraviolet ray passes, and the longitudinal direction shrinks. On the other hand, the wall on the side where the ultraviolet ray reflection film is formed is not affected by the deformation of the ultraviolet ray and is not deformed. Therefore, the central portion of the illuminating tube is warped toward the wall of the ultraviolet ray reflection film, and the entire surface of the 201239947 is formed to reflect ultraviolet rays. The side of the membrane wall is convexly warped, causing a problem. Once the excimer lamp is warped upward, it is between the end surface of the excimer lamp and the central portion, the surface of the workpiece such as the glass substrate and the excimer lamp. The distance will be different, causing a difference in light illumination illuminance at each part of the workpiece surface, causing a problem that the ultraviolet treatment cannot be uniform. In the above Patent Document 1, in order to solve this problem, as shown in FIG. 7, a movement restricting body is provided on the frame of the excimer light irradiation device to restrict the central portion of the excimer lamp from being deformed by ultraviolet rays. Accumulation generates warpage, and the lower end of the movement restricting body abuts against the central portion of the excimer lamp, in an attempt to solve the problem of warpage. That is, in Fig. 7, the excimer light irradiation device 1 has the excimer lamp 3 supported by the frame 2, and the outer electrode 32 is provided on the upper and lower planes of the arc tube 31. Below the excimer lamp 3, the workpiece W is transported by the transport roller 6. A movement restricting body 5 is disposed above the slightly central portion of the excimer lamp 3, and the rotating roller 51 at the tip end abuts against the upper portion of the arc tube 31 of the excimer lamp 3. As the lighting time is accumulated, the ultraviolet light is deformed. When accumulating, the central portion of the excimer lamp 3 protrudes upward, and the movement restricting body 5 is forcibly suppressed. However, in the above-mentioned prior art, the excimer lamp to be bent after a certain period of time is forcibly restricted from warping, and if the warpage limiting stress and the ultraviolet stress accumulated in the arc tube glass exceed a certain amount, It can cause damage and create new problems. -6-201239947 [PRIOR ART DOCUMENT] [Patent Document 1] [Patent Document 1] Japanese Laid-Open Patent Publication No. H20-8035 No. 1 SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] The present invention has been made in view of the above-described prior art. The problem is to provide a structure of an excimer lamp having: a long-shaped light-emitting tube having a sealed space in which a rare gas is enclosed; and a pair of opposite electrodes disposed on an outer surface of the light-emitting tube And the ultraviolet reflecting film is formed on the inner wall surface other than the light emitting portion of the light emitting tube: when the excimer lamp is mounted on the excimer light irradiation device having the movement restricting body, the prevention is prevented Due to the accumulation of ultraviolet rays and the deformation of the warpage, the early damage of the arc tube is caused; wherein the movement limiting system is used to limit the warpage of the excimer lamp due to deformation of the ultraviolet light. [Means for Solving the Problems] In order to solve the above problems, the excimer lamp of the present invention is characterized in that the central portion of the light guide tube axial direction is curved so as to protrude toward the light emitting portion of the light emitting tube. Further, the excimer light irradiation device that mounts the excimer lamp is characterized in that a movement restricting body is provided on the casing, and the ultraviolet reflection film forming portion side of the central portion of the excimer lamp is in contact with each other, and the bridge is maintained. The member abuts against the light emitting portion side, and the excimer lamp is corrected in a straight line shape in the tube axis direction of 201239947 by the correction maintaining member. [Effect of the Invention] According to the present invention, the excimer lamp that is curved so as to protrude toward the light emitting portion side of the center portion is attached to the excimer light irradiation device, and is abutted against the lamp from the light emitting portion side by the correction maintaining member. Since it is corrected in a straight line shape in the tube axis direction, the mechanical deformation caused by the correction is gradually relieved by the ultraviolet rays at the initial stage of lighting, and the mechanical deformation disappears after a predetermined time elapses, and the warpage is restricted. The stress is gradually accumulated; the accumulation of stress due to the warpage limiting stress and the ultraviolet stress causes damage to the arc tube, and the present invention can greatly prolong the accumulation time of the damage and greatly improve the life before the lamp is broken. [Embodiment] The one shown in Fig. 1 is the excimer lamp 3 of the present invention. Fig. 1(A) is a perspective view as seen from the lower side, and Fig. 1(B) is a cross-sectional view thereof. The arc tube 31 of the excimer lamp 3 has a flat quadrangular cross section and a long length in the longitudinal direction, and external electrodes 32 and 32 are provided on the upper and lower surfaces thereof. As shown in Fig. 1 (B), in the inner surface of the arc tube 31, the upper surface side and the side surface side are covered with the ultraviolet ray reflection film 33 to form the ultraviolet ray reflection film forming portion 35, and the lower surface side is not formed with the ultraviolet ray reflection film. This portion forms the light emitting portion 34. Further, as shown in Fig. 2, the arc tube 31 is curved in the longitudinal axis direction, and the central portion is curved toward the light emitting portion 34 side so as to protrude by a certain amount L. 201239947. The shape of the arc tube 31 is not limited to the cross-sectional angle type. The flat shape can also be round or 2-tube construction. Further, although the ultraviolet ray reflection film 33 is formed on the three surfaces of the arc tube 31, the present invention is not limited thereto, and may be formed only on the surface. An example of a method of manufacturing such an arc tube 31 will be described below. First, an illuminating tube having a predetermined cross-sectional shape is produced. At this time, the arc tube is not bent in the longitudinal direction. Next, an ultraviolet reflective film is formed on the inner surface of the arc tube except for the light emitting portion. Thereafter, the light-emitting tube is sealed. Next, both ends of the longitudinal direction of the arc tube are supported so that the light emitting portion side faces downward, and the central portion is pressed downward by the amount L to be bent, and the entire arc tube is heated in this state. At this time, the heating temperature is continuously raised until the arc tube is deformed and shaped in a state of being bent by a prescribed amount. Thereby, it is convenient to form a protruding light emitting portion. Thereafter, an electrode is formed on the lower surface of the curved light-emitting tube. Next, after the predetermined discharge gas such as helium gas is sealed in the arc tube, the lamp is completed. An excimer light irradiation device that mounts the above-described curved excimer lamp 3! , as shown in the following figures in Figure 3. Fig. 3 is an enlarged view of an essential part, and Fig. 5 is a cross-sectional view taken along line A-A of Fig. 3. As shown in Fig. 3, the excimer lamp 3 which is bent downward toward the center portion of the light beam -9-201239947 is attached to the lamp holder 4 at its lower end. As shown in FIG. 4 and FIG. 5, the central portion of the excimer lamp 3 is in contact with the correction maintaining member 8 on the lower light emitting portion 34 side, and the member is raised to forcibly correct the bending of the excimer lamp 3 to It maintains a linear shape in the longitudinal axis direction. The excimer lamp 3 which is corrected in the axial direction and which is linear in the axial direction is provided at the center portion thereof, and the rotating roller 5 1 provided at the tip end of the movement restricting body 5 at the upper end is in contact with the ultraviolet reflecting film forming portion 35 Pick up. Further, in this case, the excimer lamp 3 and the rotating roller 5 1 of the movement restricting body 5 may have a gap of, for example, about 5 mm. Further, in order to correct the curved excimer lamp 3, the center portion may be linearly formed from the lower side by a pressing means (not shown), and the rear portion of the excimer lamp 3 may be straightened. The correction maintaining member 8 is brought into contact with each other to maintain a straight state. Further, as shown in FIG. 5, the above-described correction maintaining member 8 is formed so as to be in contact with both sides on the long side of the excimer lamp 3, and is constituted by a pair of objects, and is abutted against the electrode 3 2 to be abutted. It does not block the emitted light, and it can be fully utilized without causing illuminance unevenness on the W surface of the object to be irradiated. Figure 6 reveals the experimental results of the present invention. Figure 6 is a graph showing the relationship between the duration of the lighting and the stress (Μ P a ), for the unbent (conventional example), L = 3 mm bending (present invention! △), L = 5 mm bending (the invention 2 〇 ), L=l〇mm bending (3 ports of the invention), revealing the stresses that it bears all, and the stress (♦) from only the ultraviolet deformation. The lamp used in the experiment has a flat angle type light-emitting tube made of quartz glass having a length of 2380 mm, a height of 18 mm, and a width of 71 mm, and a xenon excimer lamp is enclosed in the arc tube. UV deformation stress (♦) is a measure of the stress of pure UV deformation without physically pushing or correcting the lamp. The ultraviolet ray deformation will accumulate in proportion to the lighting time, and it is 10.6 MPa '4000 hours to 23.9 MPa in 2000 hours. The conventional example () is the total stress that the lamp bears without bending the lamp. value. As the lighting time is accumulated and the ultraviolet ray is deformed, the upper side, that is, the light emitting portion side is shortened, and warps are protruded toward the ultraviolet ray reflection film forming portion side, and the corrective stress from the movement restricting body is received. 2000 hours is 22.8MPa > 5000 hours up to 49.8MPa. In general, the stress of quartz glass is as high as 50. OMPa or more, and the lamp of the conventional example is in danger after 5000 hours. The present invention 1 (?) is a total stress 値 which is subjected to a 3 mm bending treatment lamp to the lower side. Since the initial stage of lighting, the central support is subjected to correction from below and a certain amount of stress is generated. As the lighting time is accumulated and gradually deformed toward the upper side, the aforementioned corrective stress from the lower side is reduced, so that the total total stress temporarily decreases. The shape in which the original lamp protrudes downward gradually protrudes upward due to the accumulation of ultraviolet rays, and temporarily becomes linear. In this state, the stress from the correction can be almost ignored, and only the stress from the UV stress is -11 - 201239947 値. This is the intersection point of "the invention 1" and the "ultraviolet light" in Fig. 6. Thereafter, the correction stress is gradually received due to warping upward. The 2000 hours are 18.9 MPa and 4 9.1 MPa, but compared with the conventional example. Under the same point of accumulation, the result is less stress 。. The present invention 2 (〇) is a total stress of 5 mm applied downward, and in this case, the same phenomenon as the lamp In the initial stage of lighting, the stress 逐渐 will gradually increase due to the accumulation of ultraviolet ray deformation. In the state where the same lighting time is accumulated in 2000 hours of 16.3 MPa and 4000 hours, the stress 値 is exhibited in comparison with the conventional example of the present invention 1. Less results. The present invention 3 (〇) is a total stress of 10 mm applied to the lower side. The test result of the lamp: 10.6 MPa (same as the ultraviolet stress), 4000 hours accumulating the same lighting time In the state of the excimer light-emitting device, the light-emitting portion side of the excimer outer-line reflection film is bent in the manner of the excimer light-emitting device, as described above. Will be mentioned above The curvature is corrected to the load, so the mechanical stress generated by the correction is applied in the opposite direction to the transfer stress, and at the initial stage of lighting, the effect of relaxation and reduction is achieved, and after a predetermined period of time, the linear stress is directly The state in which the movement restricting body is illuminated for 4000 hours of the lamp time is reduced in the first embodiment of the present invention, and thereafter is 40.4 MPa, and is even 33.9 MPa in comparison with the lamp for bending treatment, the present invention 2, When the lamp is not in the form of a purple curvature, the lamp is loaded in a straight line and the limit is applied to the limiter. The initial stress will be accumulated, and the limit constraint stress of the movement limiter -12-201239947 will accumulate. That is, the stress in the negative direction at the beginning is gradually become a sputum with the lighting, and then acts in the positive direction. Therefore, in the conventional example, the warpage limiting stress that limits the UV deformation is gradually increased from the beginning, that is, the 〇 from the beginning is immediately applied in the positive direction; in comparison, it is required to reach the same stress reference. The time is extended, thereby increasing the life of the lamp. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] An explanatory view of an excimer lamp of the present invention. Fig. 2 is a side view of Fig. 1 in the axial direction. Fig. 3 is a general view of an excimer light irradiation device of the present invention. [Fig. 4] An enlarged view of an important part of Fig. 3. [Fig. 5] A-A cross-sectional view of Fig. 3. Fig. 6 is a schematic view showing the effect of the present invention. [Fig. 7] A conventional excimer light irradiation device. [Explanation of main component symbols] 1 : Excimer light irradiation device 2 : Frame 3 : Excimer lamp 3 1 : Light-emitting tube 3 2 : Electrode 3 3 : Ultraviolet reflection film-13 - 201239947 3 4 : Light emitting portion 3 5 : Ultraviolet reflection film forming portion 4: Lamp holder 5: Movement restricting body 5 1 : Rotating roller 6 : Transporting roller 8 : Correction maintaining member L : Projection amount W : Object to be processed