201231707 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種鍍膜件及其製備方法，尤其涉及一種具 有抗指紋功能的鍍膜件及該鍍膜件的製備方法。 【先前技術】 [0002] 傳統技術中，早期抗指紋化處理一般係採用在不銹鋼的 鍍鋅層上形成鉻酸鹽層及特殊的樹脂層。該方法首先需 要在不銹鋼板上電鍍一層鋅，然後施以鉻酸鹽處理，最 後以滾壓的方式塗上一層樹脂，其工藝繁鎖，且需要使 用鉻酸鹽處理，環境污染嚴重，成本較高。 [0003] 因此，為避免污染，降低成本，人們開始研究新的抗指 紋材料。目前工業上使用較多的係在基體上喷塗一層有 機化學物質，如抗指紋塗料和抗指紋油等，藉由加熱乾 燥使其附著在基體上。但這種塗層的製備工藝也較複雜 ，而且摻雜於抗指紋塗料和抗指紋油中的有些填料還存 在游離曱醛等，不利於環保和人體健康。另外，這種有 機塗層耐磨性能差，使用一段時間後容易磨損，使得基 體被暴露出來，防腐蝕性能大幅下降且影響美觀。此外 ，抗指紋油的使用會使塗層表面看起來很油腻，大大降 低了視覺美感。 【發明内容】 [0004] 鑒於此，有必要提供一種較為環保的、抗指紋性能佳且 效果較為持久的鍍膜件。 [0005] 另，還有必要提供一種上述鍍膜件的製備方法。 100101668 表單編號 A0101 第 4 頁/共 13 頁 1002002954-0 201231707 [0006] 一種鍍膜件，其包括基體及形成於基體表面的抗指紋層 ，該抗指紋層為奈米級礙氮氟層，其化學式為CXN卜XFY， 其中 〇· 6SXS0. 8，〇. 2SYS0. 4。 [0007] 一種鍍膜件的製備方法’其包括如下步驟： [0008] 提供一基體；201231707 VI. Description of the Invention: [Technical Field] The present invention relates to a coated member and a method of manufacturing the same, and more particularly to a coated member having an anti-fingerprint function and a method of preparing the coated member. [Prior Art] [0002] In the conventional art, early anti-fingerprinting treatment generally uses a chromate layer and a special resin layer on a galvanized layer of stainless steel. The method firstly needs to plate a layer of zinc on the stainless steel plate, then apply chromate treatment, and finally apply a layer of resin by rolling, the process is complicated, and the chromate treatment is needed, the environmental pollution is serious, and the cost is relatively high. high. [0003] Therefore, in order to avoid pollution and reduce costs, people began to study new anti-finger materials. At present, a lot of industrially used ones are sprayed with an organic chemical substance such as an anti-fingerprint coating and an anti-fingerprint oil on the substrate, and are attached to the substrate by heating and drying. However, the preparation process of such a coating is also complicated, and some fillers doped in anti-fingerprint coatings and anti-fingerprint oils also contain free furfural, which is not conducive to environmental protection and human health. In addition, the organic coating has poor wear resistance and is easily worn after a period of use, so that the substrate is exposed, and the corrosion resistance is greatly reduced and the appearance is affected. In addition, the use of anti-fingerprint oils can make the surface of the coating look oily and greatly reduce the visual aesthetic. SUMMARY OF THE INVENTION [0004] In view of this, it is necessary to provide a coating material that is more environmentally friendly, has excellent anti-fingerprint performance and is relatively durable. [0005] In addition, it is also necessary to provide a method of preparing the above-mentioned coated member. 100101668 Form No. A0101 Page 4 of 13 1002002954-0 201231707 [0006] A coated member comprising a substrate and an anti-fingerprint layer formed on a surface of the substrate, the anti-fingerprint layer being a nano-scale nitrogen fluoride layer, the chemical formula thereof For CXN Bu XFY, where 〇·6SXS0. 8, 〇. 2SYS0. 4. [0007] A method for preparing a coated member' includes the following steps: [0008] providing a substrate;
[0009] 以石墨靶為靶材，以氮氣、四氟化碳氣體為反應氣體， 採用磁控濺射鍍膜法在該基體的表面濺鍍奈米級碳氮氟 的抗指紋層，該奈米級礙氮氟的化學式為CXN1XFY，其中 〇. 6SXS0. 8，0. 2SYS0. 4。 [0010] 相較於習知技術，所述的鍍膜件採用磁控濺射鍍膜的方 法在基體表面形成一奈米級碳氮氟的抗指紋層，該奈米 級碳氮氟層的表面能低，可實現較佳的抗指紋功能。另 外’所述的抗指紋層以磁控濺射鍍膜的方法形成，相較 於傳統的抗指紋材料，其具有較好的耐磨性，可防止所 述抗指紋層被磨損，使得所述的鍍膜件的抗指紋功能更 持久，外觀上也更具有美感。另外’所述鍍膜件及其製 備方法較為環保。 【實施方式】 [0011] 請參閱圖1，本發明—較佳實施方式的鍍膜件10包括基體 π及形成於基體11上的抗指紋層13。 [0012] 基體11的材質可為不銹鋼或玻璃。 [0013] 抗指紋層13為奈米級碳氮氟層，其化學式為， 其中0.6SXS0.8，0.2SYS0.4。該抗指紋層13可以 磁控濺射鍍膜法形成，如中頻磁控濺射鍍膜法。該抗指 100101668 1002002954-0 第5頁/共13頁 表單編號A0101 201231707 紋層13的厚度為600-900nm。 [0014] [0015] [0016] [0017] [0018] [0019] [0020] 對所述鍍膜件10進行了水油接觸角測試，結果顯示，所 述抗指紋層13與水油混合物的接觸角在log—〗〗〗。之間， 證明所述鍍膜件ίο具有良好的抗指紋功能。 本發明較佳實施方式的鍍膜件10的製備方法包括如下步 驟： 提供基體11，並對該基體丨丨進行清潔前處理。該清潔前 處理可包括以下步驟： 依次用去離子水及無水乙醇對基體丨丨表面進行擦拭。 將基體11放入盛裝有丙酮溶液的超聲波清洗器中進行超 聲波清洗，以除去基體11表面的雜質和油考等。 對經上述清潔前處理後的基體丨丨的表面進行電漿清洗， 以進一步去除基體11表面的髒污，以及改善基體丨丨表面 與後續鍍層的結合力。 明參閱圖2，將基體11放入一磁控濺射鑛膜機2〇的鍍膜室 21中，於鍍膜室21中安裝石墨乾23，抽真空該锻膜室21 至本底真空度為3. Oxio 5T〇rr，然後通入流量為 SOOsccni (標準毫升每分）的工作氣體氬氣（純度為 99. 999%)，並對基體丨丨施加_4〇〇v的偏壓，使鍍膜室 21中產生南頻電壓。所述氬氣在高頻電壓下電漿化而產 生高能氬氣電漿，該氬氣電漿對基體11的表面進行物理 轟擊，從而清除掉基體U表面的髒污，達到清洗的目的 。所述電漿清洗的時間為1 〇分鐘。 100101668 表單編號A0101 第6頁/共13頁 1002002954-0 201231707 [0021] 所述電漿清洗完成後，在所述鍍膜室21中以磁控濺射鍍 膜法，如中頻磁控濺射鍍膜法，在基體11的表面濺鍍抗 指紋層13。濺鍍該抗指紋層13時，加熱所述鍍膜室21至 溫度為60-1 80°C (即濺鍍溫度為60-1 80°C)，調節氬氣 的流量在300-420sccm之間，通入流量為300-420sccm 的反應氣體氮氣及流量為15-70sccm的反應氣體四氣化 碳（CF,)，調節基體11的偏壓至-50 — 1 50V，設置偏壓 的佔空比為50°/9，開啟石墨靶23的電源，使氮氣及CF,產 4 生輝光放電而電漿化，此時，電漿的氮及氟同時與石墨 靶23濺射出的粒子反應，而於基體11的表面沉積形成奈 米級CXN1XFY的抗指紋層13，其中0. 6SXS0. 8，0. 2S YS0. 4。所述石墨靶23的電源功率為5-1 OkW。沉積該抗 指紋層13的時間為20-60分鐘，抗指紋層13的厚度在 60 0-90 0 nm之間。 [0022] 以下結合具體實施例對鍍膜件10的製備方法及鍍膜件10 的抗指紋性能進行說明。各實施例中清潔前處理及電漿 Q 清洗均按上述揭露的方式進行，這裏不再詳述。 [0023] 實施例1 [0024] 該實施例基體11的材質為不銹鋼。 [0025] 滅鍍奈米級CXN1XFY以製備抗指紋層13 :氬氣流量為 420sccm，氮氣流量為150sccm，四氟化碳流量為 15sccm，基體11的偏壓為-50V，偏壓的佔空比為50%， 石墨靶23的功率為6kW，濺鍍溫度為60°C，濺鍍時間為 30分鐘，抗指紋層13的厚度為620nm。 100101668 表單編號A0101 第7頁/共13頁 1002002954-0 201231707 [0026] 本實施例Cvt VFV中X的值為0. 62，Y的值為0. 28。 [0027] 按本實施例方法所製得的抗指紋層1 3與水油混合物的接 觸角為108°。 [0028] 實施例2 [0029] 該實施例方法基本同實施例1，不同的係基體11的材質為 玻璃。 [0030] 實施例3 [0031] 該實施例基體11的材質為不銹鋼。 [0032] 濺鍍奈米級CyL VFV以製備抗指紋層13 :氬氣流量為 300sccm，氮氣流量為220seem，四氟化碳流量為 62sccm，基體11的偏壓為-150V，偏壓的佔空比為50% ，石墨靶23的功率為10kW，濺鍍溫度為150°C，濺鍍時 間為45分鐘，抗指紋層13的厚度為86Onm。 [0033] 本實施例CyN, YFV*X的值為0. 8，Y的值為0. 36。[0009] using a graphite target as a target, using nitrogen gas, carbon tetrafluoride gas as a reaction gas, using a magnetron sputtering coating method to sputter an anti-fingerprint layer of nano-carbon fluoride on the surface of the substrate, the nano-particle The chemical formula of the nitrogen fluoride is CXN1XFY, wherein 〇. 6SXS0. 8,0. 2SYS0. 4. [0010] Compared with the prior art, the coating member adopts a magnetron sputtering coating method to form an anti-fingerprint layer of a nano-scale carbon-nitrogen fluoride on the surface of the substrate, and the surface energy of the nano-scale carbon-nitrogen fluoride layer Low, can achieve better anti-fingerprint function. In addition, the anti-fingerprint layer is formed by a magnetron sputtering coating method, which has better wear resistance than the conventional anti-fingerprint material, and prevents the anti-fingerprint layer from being worn, so that the The anti-fingerprint function of the coated parts is more durable and aesthetically pleasing. Further, the coated member and its preparation method are environmentally friendly. [Embodiment] Referring to Figure 1, a coated member 10 of the present invention, which is a preferred embodiment, includes a substrate π and an anti-fingerprint layer 13 formed on the substrate 11. [0012] The material of the base 11 may be stainless steel or glass. [0013] The anti-fingerprint layer 13 is a nano-scale carbonitride layer having a chemical formula of 0.6SXS0.8, 0.2SYS0.4. The anti-fingerprint layer 13 can be formed by a magnetron sputtering coating method such as an intermediate frequency magnetron sputtering coating method. The resistance is 100101668 1002002954-0 Page 5 of 13 Form No. A0101 201231707 The thickness of the layer 13 is 600-900 nm. [0016] [0020] [0020] The coating member 10 was subjected to a water-oil contact angle test, and the results showed that the anti-fingerprint layer 13 was in contact with the water-oil mixture. The angle is in the log-〗〗 〖. Between, it proves that the coated member ίο has a good anti-fingerprint function. The method for preparing the coated member 10 of the preferred embodiment of the present invention comprises the steps of: providing a substrate 11 and subjecting the substrate to a pre-cleaning treatment. The pre-cleaning treatment may include the following steps: Wiping the surface of the substrate crucible with deionized water and absolute ethanol in sequence. The substrate 11 is placed in an ultrasonic cleaner containing an acetone solution for ultrasonic cleaning to remove impurities and oil on the surface of the substrate 11. The surface of the substrate crucible subjected to the above pre-cleaning treatment is subjected to plasma cleaning to further remove the surface of the substrate 11 and to improve the adhesion of the surface of the substrate to the subsequent plating. Referring to Figure 2, the substrate 11 is placed in a coating chamber 21 of a magnetron sputtering film machine 2, a graphite dry 23 is installed in the coating chamber 21, and the forging chamber 21 is evacuated to a background vacuum of 3 Oxio 5T〇rr, then a working gas argon (purity of 99.99%) with a flow rate of SOOsccni (standard milliliters per minute) was applied, and a bias of _4 〇〇v was applied to the substrate , to make the coating chamber The south frequency voltage is generated in 21. The argon gas is plasmad at a high frequency voltage to produce a high energy argon plasma which physically bombards the surface of the substrate 11 to remove the dirt on the surface of the substrate U for cleaning purposes. The plasma cleaning time is 1 〇 minutes. 100101668 Form No. A0101 Page 6 of 13 1002002954-0 201231707 [0021] After the plasma cleaning is completed, a magnetron sputtering coating method, such as an intermediate frequency magnetron sputtering coating method, is applied in the coating chamber 21. The anti-fingerprint layer 13 is sputtered on the surface of the substrate 11. When the anti-fingerprint layer 13 is sputtered, the coating chamber 21 is heated to a temperature of 60-1 80 ° C (ie, the sputtering temperature is 60-1 80 ° C), and the flow rate of the argon gas is adjusted between 300-420 sccm. The reaction gas nitrogen gas having a flow rate of 300-420 sccm and the reaction gas four vaporized carbon (CF,) having a flow rate of 15-70 sccm are introduced, and the bias voltage of the substrate 11 is adjusted to -50 to 150 V, and the duty ratio of the bias voltage is set to 50°/9, the power of the graphite target 23 is turned on, and nitrogen and CF are generated to generate a glow discharge and plasma. At this time, the nitrogen and fluorine of the plasma simultaneously react with the particles sputtered by the graphite target 23, and The surface of the substrate 11 is deposited to form an anti-fingerprint layer 13 of the nano-scale CXN1XFY, wherein 0. 6SXS0. 8,0. 2S YS0. The power of the graphite target 23 is 5-1 OkW. The time for depositing the anti-fingerprint layer 13 is 20-60 minutes, and the thickness of the anti-fingerprint layer 13 is between 60 0-90 0 nm. [0022] Hereinafter, a method for preparing the coated member 10 and an anti-fingerprint performance of the coated member 10 will be described with reference to specific embodiments. The pre-cleaning treatment and the plasma Q cleaning in each of the examples are carried out in the manner disclosed above and will not be described in detail herein. [0023] Embodiment 1 [0024] The base 11 of this embodiment is made of stainless steel. [0025] Deplating nanometer CXN1XFY to prepare anti-fingerprint layer 13: argon flow rate is 420 sccm, nitrogen flow rate is 150 sccm, carbon tetrafluoride flow rate is 15 sccm, base body 11 bias is -50 V, bias duty ratio For 50%, the graphite target 23 has a power of 6 kW, a sputtering temperature of 60 ° C, a sputtering time of 30 minutes, and a thickness of the anti-fingerprint layer 13 of 620 nm. The value of X in the Cvt VFV is 0. 62, and the value of Y is 0. 28, the value of X is 0. [0027] The contact angle of the anti-fingerprint layer 13 and the water-oil mixture prepared by the method of this example was 108°. [0028] Embodiment 2 [0029] The method of this embodiment is basically the same as that of Embodiment 1, and the material of the different base body 11 is glass. [0030] Embodiment 3 [0031] The base 11 of this embodiment is made of stainless steel. [0032] Sputtering nano-scale CyL VFV to prepare anti-fingerprint layer 13: argon gas flow rate is 300 sccm, nitrogen gas flow rate is 220 seem, carbon tetrafluoride flow rate is 62 sccm, base body 11 bias voltage is -150 V, bias duty The ratio is 50%, the power of the graphite target 23 is 10 kW, the sputtering temperature is 150 ° C, the sputtering time is 45 minutes, and the thickness of the anti-fingerprint layer 13 is 86 Onm. The value of Y is 0. 36. The value of Y is 0. 36.
λ 1 — λ Iλ 1 — λ I
[0034] 按本實施例方法所製得的抗指紋層1 3與水油混合物的接 觸角為11Γ。 [0035] 實施例4 [0036] 該實施例方法基本同實施例3，不同的係基體11的材質為 玻璃。 [0037] 相較於習知技術，所述的鍍膜件10採用磁控濺射鍍膜的 方法在基體11表面形成一奈米級碳氮氟的抗指紋層13， 該奈米級碳氮氟層的表面能低，可實現較佳的抗指紋功 100101668 表單編號A0101 第8頁/共13頁 1002002954-0 201231707 能。另外，所述的抗指紋層13以磁控濺射鍍膜的方法形 成，相較於傳統的抗指紋材料，其具有較好的耐磨性， 可防止所述抗指紋層13被磨損，使得所述的鍍膜件10的 抗指紋功能更持久，外觀上也更具有美感。另外，所述 鍍膜10件及其製備方法較為環保。 【圖式簡單說明】 [0038] 圖1係本發明較佳實施方式的鍍膜件的刳視示意圖。 [0039] 圖2係本發明較佳實施方式的磁控濺射鍍膜機的俯視示意 Ο 圖。 【主要元件符號說明】 [0040] 鍍膜件：10 [0041] 基體：11 [0042] 抗指紋層：13 [0043] 磁控濺射鍍膜機：20 [0044] 鍍膜室：21 〇 [0045] 石墨靶：23 1002002954-0 100101668 表單編號A0101 第9頁/共13頁[0034] The contact angle of the anti-fingerprint layer 13 and the water-oil mixture prepared by the method of the present embodiment was 11 Å. [0036] Embodiment 4 [0036] The method of this embodiment is basically the same as that of Embodiment 3. The material of the different base body 11 is glass. [0037] Compared with the prior art, the coating member 10 forms a nano-scale carbon-nitrofluoride anti-fingerprint layer 13 on the surface of the substrate 11 by magnetron sputtering coating, the nano-scale carbon-nitrogen fluoride layer. The surface energy is low, and the better anti-fingerprint work can be achieved. 100101668 Form No. A0101 Page 8 / Total 13 pages 1002002954-0 201231707 Yes. In addition, the anti-fingerprint layer 13 is formed by magnetron sputtering coating, which has better wear resistance than the conventional anti-fingerprint material, and prevents the anti-fingerprint layer 13 from being worn. The anti-fingerprint function of the coated member 10 is more durable and aesthetically pleasing. In addition, the coating 10 pieces and the preparation method thereof are environmentally friendly. BRIEF DESCRIPTION OF THE DRAWINGS [0038] FIG. 1 is a schematic perspective view of a coated member according to a preferred embodiment of the present invention. 2 is a top plan view of a magnetron sputtering coater in accordance with a preferred embodiment of the present invention. [Main component symbol description] [0040] Coating member: 10 [0041] Base: 11 [0042] Anti-fingerprint layer: 13 [0043] Magnetron sputtering coating machine: 20 [0044] Coating chamber: 21 〇 [0045] Graphite Target: 23 1002002954-0 100101668 Form No. A0101 Page 9 of 13