TW201223930A - Method for producing biaryl compound - Google Patents
Method for producing biaryl compound Download PDFInfo
- Publication number
- TW201223930A TW201223930A TW100123857A TW100123857A TW201223930A TW 201223930 A TW201223930 A TW 201223930A TW 100123857 A TW100123857 A TW 100123857A TW 100123857 A TW100123857 A TW 100123857A TW 201223930 A TW201223930 A TW 201223930A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- carbon atoms
- copper
- compound
- acid
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
- C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
- C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D213/06—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom
- C07D213/22—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom containing only hydrogen and carbon atoms in addition to the ring nitrogen atom containing two or more pyridine rings directly linked together, e.g. bipyridyl
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C201/00—Preparation of esters of nitric or nitrous acid or of compounds containing nitro or nitroso groups bound to a carbon skeleton
- C07C201/06—Preparation of nitro compounds
- C07C201/12—Preparation of nitro compounds by reactions not involving the formation of nitro groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/26—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of esters of sulfonic acids
- C07C303/30—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of esters of sulfonic acids by reactions not involving the formation of esterified sulfo groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/32—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of salts of sulfonic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
- C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
- C07C45/72—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
- C07C67/333—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
- C07C67/343—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Pyridine Compounds (AREA)
Abstract
Description
201223930 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種聯芳基化合物之製造方法。 【先前技術】 聯芳基化合物,尤其是具有磺基等拉電子性基之聯芳 基化合物爲作爲醫藥、農藥、液晶材料、有機電致發光材 料及該等之合成中間體之有用化合物。特開2 00 9- 161493 號公報中’記載例如藉由使2,2’-苯二磺酸與亞硝酸鈉反應 獲得之反應混合物,與含有氯化銅之鹽酸混合後,以氫氧 化鈉中和’而製造4,4,-二氯-2,2’-聯苯二磺酸二鈉之方法 【發明內容】 本發明係提供下列等者: <1>一種以式(2)表示之聯芳基化合物之製造方法201223930 VI. Description of the Invention: [Technical Field to Which the Invention Is Ascribed] The present invention relates to a method for producing a biaryl compound. [Prior Art] A biaryl compound, particularly a biaryl compound having an electron withdrawing group such as a sulfo group, is a useful compound as a pharmaceutical, a pesticide, a liquid crystal material, an organic electroluminescent material, and a synthetic intermediate thereof. JP-A-2000-161493 discloses a reaction mixture obtained by reacting 2,2'-benzenedisulfonic acid with sodium nitrite, for example, and mixed with hydrochloric acid containing copper chloride in sodium hydroxide. And the method of producing disodium 4,4,-dichloro-2,2'-biphenyldisulfonate. [Invention] The present invention provides the following: <1> One is represented by the formula (2) Method for producing biaryl compound
Ar-Ar (2) (式中’ Ar表示可具有取代基之芳香族基),該方法包含在 分子內含有至少兩個三級胺基之胺化合物、金屬銅及銅鹽 存在下’使以式(1)表示之化合物偶合之步驟: Ο)Ar-Ar (2) (wherein Ar represents an aromatic group which may have a substituent), and the method comprises the presence of an amine compound having at least two tertiary amino groups in the molecule, metallic copper and a copper salt The step of coupling the compound represented by the formula (1): Ο)
Ar-Cl -5- 201223930 (式中,Ar與前述同義); <2>如<1>所記載之製造方法,其中構成胺化合物中 所含之三級胺基之氮原子爲與三個碳原子鍵結之氮原子; <3>如<1>所記載之製造方法,其中分子內含有至少 兩個三級胺基之胺化合物爲可具有取代基之2,2’-聯吡啶化 合物或可具有取代基之1,10·啡啉化合物: <4>如<1>〜<3>中任一項所記載之製造方法,其中銅 鹽爲由藉由自顯示10以下之酸解離常數(pKa)之布忍斯特 酸去除氫離子而形成之布忍斯特鹼與銅陽離子所成之鹽; <5 >如<4>所記載之製造方法,其中布忍斯特酸爲由 鹵化氫、硫酸、硫氰酸、磷酸、碳酸、硝酸、甲烷磺酸、 三氟甲烷磺酸、苯磺酸、乙酸、三氟乙酸、五氟丙酸、乙 醯基丙酮、酚、五氟酚及硫酚所組成群組選出之至少一種 » <6>如<1>〜<5〉中任一項所記載之製造方法,其中銅 鹽爲由鹵化銅、硫酸銅、硫氰酸銅、磷酸銅、碳酸銅、硝 酸銅、甲烷磺酸銅、三氟甲烷磺酸銅(I)-苯錯合物、三氟 甲烷磺酸銅(I)-甲苯錯合物、三氟甲烷磺酸銅(11)、苯磺酸 銅' 乙酸銅、三氟乙酸銅、五氟丙酸銅、乙醯基丙酮酸銅 (Π)、酚酸銅、五氟酚酸銅及硫酚酸銅所組成群組選出之 至少一種: <7>如<1>~<5>中任一項所記載之製造方法,其中銅 鹽爲鹵化銅; 201223930 <8>如<1>〜<7>中任一項所記載之製造方法,其中 鹽之使用量相對於胺化合物1莫耳爲〇·01莫耳〜1〇莫耳 <9>如<1>〜<8>中任一項所記載之製造方法,其中胺 化合物爲由2,2’-聯吡啶、i,i〇_啡啉、丨’4,7 -三甲基 ,4 5 *7, 三氮雜環壬烷、>1少,;^,:^,-四甲基乙二胺及>^,>1,,1^,_四 乙基乙二胺所組成群組選出之至少一種胺化合物; <10>如<1>〜<9>中任一項所記載之製造方法,其中 胺化合物之使用量相對於芳基氯化物化合物1莫耳爲 0.0001莫耳〜0.5莫耳之範圍; <11>如<1>~<1〇>中任一項所記載之製造方法,其中 Ar爲具有至少一個拉電子基之芳香族基; <12>如<1>〜<11>中任一項所記載之製造方法,其中 以式(1)表示之化合物爲以式(3)表示之化合物:The method of the present invention, wherein the nitrogen atom constituting the tertiary amino group contained in the amine compound is the same as the above, wherein the Ar is the same as the above-mentioned. The carbon atom-bonded nitrogen atom; wherein the amine compound having at least two tertiary amino groups in the molecule is a 2, 2'-linked group which may have a substituent; A pyridine compound or a 1,10 phenanthroline compound which may have a substituent, wherein the copper salt is produced by self-displaying 10, according to any one of <1> to <3>. The salt of the sulphate base and the copper cation formed by the removal of hydrogen ions by the cleavage constant (pKa) of the following acid dissociation constant (pKa); <5 ><5> The special acid is hydrogen halide, sulfuric acid, thiocyanate, phosphoric acid, carbonic acid, nitric acid, methanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, acetic acid, trifluoroacetic acid, pentafluoropropionic acid, acetylacetone, phenol. And at least one selected from the group consisting of pentafluorophenol and thiophenol » <6> as in any of <1>~<5> The manufacturing method of the invention, wherein the copper salt is copper halide, copper sulfate, copper thiocyanate, copper phosphate, copper carbonate, copper nitrate, copper methanesulfonate, copper (I)-benzene complex of trifluoromethanesulfonate, Copper (I)-toluene complex of trifluoromethanesulfonate, copper (11) trifluoromethanesulfonate, copper benzenesulfonate, copper acetate, copper trifluoroacetate, copper pentafluoropropionate, copper acetylacetonate (Π), at least one selected from the group consisting of copper phenolate, copper pentoxide, and copper thiophenolate: <7> The method according to any one of <1> to <5> The method for producing a salt according to any one of the above-mentioned items, wherein the salt is used in an amount relative to the amine compound 1 〇·01 Mo The manufacturing method according to any one of <1>, wherein the amine compound is composed of 2,2'-bipyridine, i, i〇-phenoline, and the method of any one of <1>丨'4,7-trimethyl, 4 5 *7, triazacyclononane, >1 less, ;^,:^,-tetramethylethylenediamine and >^,>1, , 1 ^, _ tetraethyl ethylene diamine group selected to The production method according to any one of <1> to <9>, wherein the amine compound is used in an amount of 0.0001 mol to 0.5 based on the aryl chloride compound 1 molar. The manufacturing method according to any one of <1>, wherein Ar is an aromatic group having at least one electron-withdrawing group; <12> The production method according to any one of the above-mentioned, wherein the compound represented by the formula (1) is a compound represented by the formula (3):
(式中,R1、R2及R3各獨立表示氫原子、鹵素原子、可具 有由下述G群選出之基之碳數1〜20之烷基 '可具有由下述 G群選出之基之碳數1〜20之烷氧基、可具有由下述G群選 出之基之碳數6〜20之芳基、可具有由下述G群選出之基之 碳數6〜2 0之芳氧基、可具有由下述G群選出之基之碳數 7〜2 0之芳烷基、可具有由下述G群選出之基之碳數7〜2 0之 芳烷氧基、或具有可具有由下述G群選出之基之碳數1〜20 201223930 之烴基之胺基, R4表示氫原子、可具有由下述G群選出之基之碳數 1〜2 0之烷基、可具有由下述G群選出之基之碳數1〜20之烷 氧基、可具有由下述G群選出之基之碳數6~2 0之芳基、可 具有由下述G群選出之基之碳數6〜20之芳氧基、可具有由 下述G群選出之基之碳數7〜2 0之芳烷基、可具有由下述G 群選出之基作爲取代基之碳數7〜20之芳烷氧基、或具有可 具有由下述G群選出之基之碳數1〜20之烴基之胺基,又, 分別鍵結於鄰接之碳原子上之R1與R2、R2與R3、或R3與R4 可與分別所鍵結之碳原子一起形成環,E表示拉電子基, [G群] 氟原子;氰基:碳數1〜12之烷氧基;碳數6〜12之芳基 ;及碳數6〜12之芳氧基), 以式(2)表示之聯芳基化合物爲以式(4)表示之聯芳基 化合物: R2 R1 R1 R2(wherein R1, R2 and R3 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms which may have a group selected from the following G group, and may have a carbon selected from the following group G) An alkoxy group having 1 to 20 alkoxy groups, an aryl group having 6 to 20 carbon atoms which may be selected from the group G, and an aryloxy group having 6 to 20 carbon atoms which may have a group selected from the group G below And an aralkyl group having 7 to 20 carbon atoms selected from the group consisting of the following G group, an aralkyloxy group having 7 to 20 carbon atoms which may have a group selected from the group G below, or having The amine group of the hydrocarbon group having a carbon number of 1 to 20 201223930 selected from the group G below, and R4 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a group selected from the group G below, and may have The alkoxy group having 1 to 20 carbon atoms selected from the group G, and the aryl group having 6 to 20 carbon atoms which may be selected from the group G, may have a group selected from the group G below. An aryloxy group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms which may be selected from the group G, and a carbon number 7 which may have a substituent selected from the group G below. 20 aralkoxy, or having the following G group The amine group of the hydrocarbon group having 1 to 20 carbon atoms, and R1 and R2, R2 and R3, or R3 and R4 respectively bonded to adjacent carbon atoms may be formed together with the carbon atoms respectively bonded thereto. Ring, E represents a pull electron group, [G group] fluorine atom; cyano group: alkoxy group having 1 to 12 carbon atoms; aryl group having 6 to 12 carbon atoms; and aryloxy group having 6 to 12 carbon atoms, The biaryl compound represented by the formula (2) is a biaryl compound represented by the formula (4): R2 R1 R1 R2
veer4 (式中,R1、R2、R3、R4及E分別表示與前述相同之意義) f <U>如<11>或<12>所記載之製造方法,其中拉電子 基爲以式(5)表示之基: 201223930 ——S——(Γ Υ (5)Veer4 (wherein, R1, R2, R3, R4 and E respectively represent the same meaning as described above) f <U> The manufacturing method as described in <11> or <12>, wherein the electron-withdrawing group is (5) Representation base: 201223930 ——S——(Γ Υ (5)
C (式中,Υ表示氫離子、鹼金屬離子、以式(6)表示之錶離 子: Υ2 Υ1—I—Υ3 (6)C (wherein Υ represents a hydrogen ion, an alkali metal ion, and an ion represented by the formula (6): Υ2 Υ1—I—Υ3 (6)
I Υ4 (式中,Υ1、Υ2、Υ3及Υ4各獨立表示氫原子或碳數1〜10之 烴基)、可具有由下述G群選出之基之碳數卜20之院基、或 可具有由下述G群選出之基之碳數6〜2 0之芳基’ [G群] 氟原子;氰基;碳數1〜12之烷氧基;碳數6〜12之芳基 ;及碳數6〜12之芳氧基); <M>如<1>~<11>中任一項所記載之製造方法’其中 以式(1)表示之化合物爲以式(10)表示之化合物: (R,0)kI Υ 4 (wherein Υ 1, Υ 2, Υ 3 and Υ 4 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms), may have a carbon number of 20 selected from the group G below, or may have a aryl group having a carbon number of 6 to 20 selected from the group G below [G group] fluorine atom; a cyano group; an alkoxy group having 1 to 12 carbon atoms; an aryl group having 6 to 12 carbon atoms; A method of producing a compound represented by the formula (1), wherein the compound represented by the formula (1) is represented by the formula (10), wherein the compound of the formula (1) is represented by the formula (10). Compound: (R,0)k
(Γ Y (式中’ Y表示氫離子、鹼金屬離子、以式(6)表示之銨離 -9- 201223930 Υ2 Y1—Ν—Υ3 (6) Υ4 (式中’ Υ1' Υ2、Υ3及Υ4各獨立表示氫原子或碳數1~10之 烴基)、可具有由下述G群選出之基之碳數1~20之烷基、或 可具有由下述G群選出之基之碳數6〜20之芳基,R1G各獨立 表示氟原子、可具有由下述G群選出之基之碳數1~20之烷 基、可具有由下述G群選出之基之碳數1〜20之烷氧基、可 具有由下述G群選出之基之碳數6〜2 0之芳基、可具有由下 述G群選出之基之碳數6〜2 0之芳氧基、可具有由下述G群 選出之基之碳數2〜20之醯基或氰基,k表示0〜3之整數,另 外,分別鍵結於鄰接之碳原子之兩個可經鍵結,與其 等所鍵結之碳原子一起形成環, [G群] 氟原子;氰基;碳數1〜12之烷氧基;碳數6〜12之芳基 :及碳數1~12之芳氧基), 以式(2)表示之聯芳基化合物爲以式(Π)表示之聯芳基 化合物:(Γ Y (where Y represents hydrogen ion, alkali metal ion, ammonium represented by formula (6) -9- 201223930 Υ2 Y1—Ν—Υ3 (6) Υ4 (where '1' Υ2, Υ3 and Υ4 Each of the carbon atoms having 1 to 10 carbon atoms independently representing a hydrogen atom or a group having a carbon number of 1 to 10, which may be selected from the group G below, or having a carbon number of 6 selected from the group G below The aryl group of ~20, R1G each independently represents a fluorine atom, may have an alkyl group having 1 to 20 carbon atoms selected from the group of the following G group, and may have a carbon number of 1 to 20 selected from the group of the following G group. The alkoxy group may have an aryl group having 6 to 20 carbon atoms which may be selected from the group G, and an aryloxy group having 6 to 20 carbon atoms which may have a group selected from the group G below, and may have The group selected from the group G below has a carbon number of 2 to 20 or a cyano group, and k represents an integer of 0 to 3, and in addition, two carbon atoms bonded to adjacent carbon atoms may be bonded and bonded thereto. The carbon atoms of the junction form a ring together, [G group] fluorine atom; cyano group; alkoxy group having 1 to 12 carbon atoms; aryl group having 6 to 12 carbon atoms; and aryloxy group having 1 to 12 carbon atoms) The biaryl compound represented by the formula (2) is a combination represented by the formula (Π) Aryl compounds:
0' Y0' Y
〇· Y (式中,RtG、Y及k表示與前述相同之意義); -10- 201223930 <15>如<13>或<14>所記載之製造方法,其中γ爲鹼 金屬離子: <16>如<11>或<12>所記載之製造方法,其中拉電子 基爲硝 3S.(-N02); <17>如<1>〜<1〇>中任一項所記載之製造方法,其中 Ar爲具有芳香族性之雜環基(但,該雜環基可具有取代基) , < 1 8 >如< 1 7>所記載之製造方法,其中^係Ar中所含 之雜原子與鍵結於C1之Ar之碳原子直接鍵結而成之雜環基 » <19>如<1>〜<10>中任一項所記載之製造方法,其中 以式(1)表示之化合物爲以式(7)表示之化合物: R1La〇· Y (wherein RtG, Y and k represent the same meaning as described above); -10-201223930 <15> The manufacturing method as described in <13> or <14>, wherein γ is an alkali metal ion The manufacturing method according to <11> or <12>, wherein the electron withdrawing group is nitrate 3S. (-N02); <17> as <1>~<1〇> The production method according to any one of the preceding claims, wherein Ar is an aromatic heterocyclic group (however, the heterocyclic group may have a substituent), and <18> is produced as described in <1> The method wherein the hetero atom contained in the Ar is directly bonded to the carbon atom bonded to the carbon atom of Ar of C1 » <19> as in any of <1>~<10> The production method according to the above, wherein the compound represented by the formula (1) is a compound represented by the formula (7): R1La
(式中,R11及R12各獨立表示氫原子、鹵素原子、可具有 由下述G群選出之基之碳數1~20之烷基、可具有由下述G 群選出之基之碳數1〜2 0之烷氧基、可具有由下述G群選出 之基之碳數6~2 0之芳基、可具有由下述G群選出之基之碳 數6~2 0之芳氧基、可具有由下述G群選出之基之碳數7〜2 0 之芳烷基、可具有由下述G群選出之基之碳數7〜20之芳烷 氧基、或具有可具有由下述0群選出之基之碳數1〜20之烴 基之胺基, R14表示氫原子、可具有由下述G群選出之基之碳數 -11 - 201223930 1~2 0之烷基、可具有由下述G群選出之基之碳數1~2 0之烷 氧基、可具有由下述G群選出之基之碳數6〜2 0之芳基、可 具有由下述G群選出之基之碳數6~2 0之芳氧基、可具有由 下述G群選出之基之碳數7〜2 0之芳烷基、可具有由下述G 群選出之基之碳數7~2 0之芳烷氧基、或具有可具有由下述 G群選出之基之碳數1〜20之烴基之胺基,又,分別鍵結於 鄰接之碳原子上之R11與R12、或R12與R14可與分別鍵結之 碳原子一起形成環,Α表示氧原子或硫原子, [G群] 氟原子;氰基;碳數1〜12之烷氧基;碳數6〜12之芳基 ;及碳數1〜12之芳氧基), 以式(2)表示之聯芳基化合物爲以式(8)表示之聯芳基 化合物:(wherein R11 and R12 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms which may have a group selected from the following G group, and may have a carbon number of 1 selected from the following G group; ~20 alkoxy group, an aryl group having 6 to 20 carbon atoms which may be selected from the group G below, and an aryloxy group having 6 to 20 carbon atoms which may have a group selected from the group G below And an aralkyl group having 7 to 20 carbon atoms selected from the group consisting of the following G group, an aralkyloxy group having 7 to 20 carbon atoms which may have a group selected from the group G below, or having The amine group of the hydrocarbon group having 1 to 20 carbon atoms selected from the following 0 groups, and R14 represents a hydrogen atom, and may have a carbon number of the group selected from the group G below - 11 - 201223930 1 to 2 0 alkyl group, An alkoxy group having 1 to 20 carbon atoms selected from the group consisting of the following G groups, and an aryl group having 6 to 20 carbon atoms which may have a group selected from the following group G, may be selected from the following group G The aryloxy group having 6 to 20 carbon atoms, the aralkyl group having 7 to 20 carbon atoms which may be selected from the group G, and the carbon number which may have a group selected from the following group G 7 a aralkyloxy group of ~20 or a carbon which may have a group selected from the group G below The amine group of the hydrocarbon group of 1 to 20, and R11 and R12 respectively bonded to the adjacent carbon atom, or R12 and R14 may form a ring together with the carbon atom respectively bonded, and Α represents an oxygen atom or a sulfur atom, [ Group G] a fluorine atom; a cyano group; an alkoxy group having 1 to 12 carbon atoms; an aryl group having 6 to 12 carbon atoms; and an aryloxy group having 1 to 12 carbon atoms; a biaryl group represented by the formula (2) The compound is a biaryl compound represented by the formula (8):
(式中,A、R11、R12及R14分別表示與前述相同之意義); <2〇>如<1>〜<19>中任一項所記載之製造方法,其中 偶合步驟爲在非質子性極性溶劑之存在下進行之步驟。 【實施方式】 本發明之以式(2)表示之聯芳基化合物(以下簡稱爲化 合物(2)之製造方法,包含在分子內含有至少兩個三級胺 基之胺化合物、金屬銅及銅鹽存在下,使以式(1)表示之 201223930 化合物(以下簡稱爲化合物(丨))偶合之步驟。 金屬銅之使用量相對於化合物(丨”莫耳,通常爲〇5莫 耳〜20莫耳之範圍’較好爲1莫耳〜5莫耳之範圍。金屬銅之 使用量爲0.5莫耳以上時,由於有提高所得化合物(2)收率 之傾向故較佳’且’金屬銅之使用量爲2〇莫耳%以下時, 由於會有自反應系統中回收化合物(2)之後處理操作變簡 單之傾向故較佳。金屬銅之形狀列舉爲粉體狀、線狀、箔 狀、切削狀及粒子狀,就金屬銅之操作觀點而言,以粉體 狀較佳。該等金屬銅可容易自市場購得。該市售之金屬銅 亦可爲其表面之一部分因環境中之氧而氧化成爲氧化銅者 。該等含微量氧化銅之金屬銅可直接使用於化合物(1)之 偶合反應中,亦可以例如氫氧化四甲基銨、單乙醇胺、乙 二胺四乙酸、羥基乙烷二磺酸、兒茶酚、沒食子酸(gallic acid)、草酸、檸檬酸、羥基胺、2-毓基乙醇、硫代甘油等 洗淨劑去除該微量之氧化銅後用於該偶合反應中。 銅鹽係由銅陽離子與陰離子組成。可爲由一價之銅陽 離子與陰離子組成之銅鹽,亦可爲由二價之銅陽離子與陰 離子組成之銅鹽。 陰離子較好爲自顯示10以下之酸解離常數(pKa)之布 忍斯特酸去除氫離子形成之布忍斯特鹼。酸解離常數 (pKa)爲25°C、在水中之數値,且可由化學便覽基礎編修 訂5版ΙΙ-331~Π-343 (日本化學會編,九善股份有限公司發 行)中記載之方法算出。布忍斯特酸爲多元酸時’第一階 段之酸解離常數(PKai)較好爲10以下。 -13- 201223930 至於陰離子,更好爲自酸解離常數(PKa)爲6以下之布 忍斯特酸去除氫離子而形成之布忍斯特鹼,最好爲自酸解 離常數(pKa)爲3以下之布忍斯特酸去除氫離子而形成之布 忍斯特鹼。又,至於陰離子,較好爲自酸解離常數(pKa) 爲-10以上之布忍斯特酸去除氫離子形成之布忍斯特鹼。 較佳之導入陰離子之布忍斯特酸列舉爲鹵化氫(pKa :-4〜2.7)、硫酸(pKa: 2以下)、硫氰酸(pKa: -0.9)、磷酸 (pKa : 1.8)、碳酸(pKa: 6.1)、硝酸(pKa: -1.8)、甲烷磺 酸(pKa: -1.2)、三氟甲烷磺酸、苯磺酸(pKa: -2.5)、乙 酸(pKa : 4.7)、三氟乙酸(pKa: 0.2)、五氟丙酸、乙醯基 丙酮(pKa: 8.8)、苯酚(pKa: 9.9)、五氟酚及噻吩(pKa: 6 · 4) β 至於銅鹽列舉爲鹵化銅、硫酸銅、硫氰酸銅、磷酸銅 、碳酸銅、硝酸銅、甲烷磺酸銅、對-甲苯磺酸銅、三氟 甲烷磺酸銅(I)-苯錯合物、三氟甲烷磺酸銅(I)-甲苯錯合物 、三氟甲烷磺酸銅(II)、苯磺酸銅、乙酸銅、三氟乙酸銅 、五氟丙酸銅、乙醯基丙酮酸銅(Π)、酚酸銅、五氟酚酸 銅及硫酚酸銅。鹵化銅列舉爲氟化銅、氯化銅、溴化銅及 碘化銅。銅鹽亦可混合由該等選出之兩種以上使用。該銅 鹽亦可爲水合物,但較好爲無水物。 銅鹽可直接使用市售者,亦可使用藉由混合一價或兩 價之銅化合物與酸調製而成者。一價或兩價之銅化合物較 好使用氧化銅、氫氧化銅’至於酸較好使用前述之布忍斯 特酸。 -14- 201223930 其中,較好爲鹵化銅、硫酸銅、硫氰酸銅、硝酸銅、 二氟甲烷磺酸銅(1)_苯錯合物、三氟甲烷磺酸銅(1)_甲苯錯 π物、二氟甲烷磺酸銅(Π)'乙醯基丙酮酸銅(1”及硫酚酸 銅,更好爲鹵化銅、硫酸銅、硝酸銅、三氟甲烷磺酸銅 (1) -本錯合物、二氟甲烷磺酸銅(π)及乙醯基丙酮酸銅(H) 〇 銅鹽之使用量相對於胺化合物1莫耳,通常爲〇〇1莫 耳〜10莫耳之範圍,較好爲0 02莫耳〜1莫耳之範圍,更好 爲1/3莫耳〜丨/30莫耳之範圍。 銅鹽之使用量之下限値相對於化合物(1) 1莫耳,通常 爲〇.〇〇〇〇1莫耳,較好爲0 000 1莫耳,更好爲()〇〇1莫耳。 銅鹽之使用量之上限値相對於化合物〇) 1莫耳通常爲 〇.5莫耳’較好爲0.3莫耳,更好爲〇1莫耳。亦即,銅鹽之 使用量相對於化合物(1) ! 00莫耳。/❶,通常爲〇 〇〇1莫耳 %〜50莫耳%之範圍’較好爲〇〇1莫耳%〜5〇莫耳%之範圍, 更好爲0.1莫耳%〜50莫耳%之範圍。就成爲目的之化合物 (2) 之收率及反應結束後之銅鹽去除等之後處理操作性之 觀點而言,較好爲0.1莫耳%〜3〇莫耳%之範圍,更好爲〇5 莫耳%〜1 0莫耳%之範圍。 所謂分子內含有至少兩個三級胺基之胺化合物之三級 胺基意指由與三個碳原子鍵結之氮原子所成之取代基,且 構成胺化合物中所含三級胺基之氮原子意指與三個碳原子 鍵結之氮原子。該碳原子亦可具有芳香族性,至於至少在 兩個分子內含有具有與具有芳香族性之碳原子鍵結之氮原 -15- 201223930 子作爲構成原子之三級胺基之胺化合物,列舉爲可具有取 代基之2,2’-聯吡啶化合物及可具有取代基之1,1〇-啡啉化 合物。 胺化合物中所含之兩個三級胺基較好係透過兩個碳原 子鍵結。 至於胺化合物’列舉爲2,2,-聯吡啶、1,1 〇 -啡啉、 1,4,7-二甲基-i,4,7-三氮雜環壬院、ν,Ν,Ν'Ν’-四甲基乙 二胺及N,N,N’,N’-四乙基乙二胺。 胺化合物之使用量相對於銅鹽】莫耳,通常爲〇1莫耳 〜1〇〇莫耳之範圍,較好爲1莫耳〜5〇莫耳之範圍,更好爲3 莫耳〜30莫耳之範圍。胺化合物之使用量相對於銅鹽1莫耳 爲〇.1莫耳以上時,會有提高化合物(2)之收率之傾向,爲 10 0莫耳以下時,會有反應速度提高之傾向故較佳。 胺化合物之使用量之上限値相對於化合物(丨)丨莫耳, 通常爲50莫耳 莫耳。胺化合 較好爲20莫耳,更好爲5莫耳,最(In the formula, A, R11, R12, and R14 respectively represent the same meaning as described above); and the manufacturing method according to any one of <1> to <19>, wherein the coupling step is The step is carried out in the presence of an aprotic polar solvent. [Embodiment] The biaryl compound represented by the formula (2) (hereinafter referred to as the production method of the compound (2), which comprises an amine compound containing at least two tertiary amino groups in the molecule, metallic copper and copper In the presence of a salt, a step of coupling a compound of the formula 223930 (hereinafter referred to simply as a compound (丨)) represented by the formula (1). The amount of the metal copper used is usually 〇5 mol to 20 mol with respect to the compound (丨" molar. The range of the ear is preferably in the range of 1 mole to 5 moles. When the amount of metal copper used is 0.5 mole or more, it is preferred because of the tendency to increase the yield of the obtained compound (2). When the amount used is 2 〇 mol% or less, the treatment operation tends to be simple after recovering the compound (2) from the reaction system. The shape of the metal copper is exemplified by powder, linear, or foil. The cutting shape and the particle shape are preferably in the form of powder in terms of the operation of the metal copper. The metal copper can be easily obtained from the market. The commercially available metallic copper can also be a part of its surface due to the environment. Oxidation to oxygen oxide The copper metal containing a trace amount of copper oxide may be directly used in the coupling reaction of the compound (1), and may also be, for example, tetramethylammonium hydroxide, monoethanolamine, ethylenediaminetetraacetic acid, hydroxyethanedisulfonic acid, or the like. A cleaning agent such as tea phenol, gallic acid, oxalic acid, citric acid, hydroxylamine, 2-mercaptoethanol, thioglycerol or the like removes the trace amount of copper oxide and is used in the coupling reaction. It is composed of a copper cation and an anion, and may be a copper salt composed of a monovalent copper cation and an anion, or a copper salt composed of a divalent copper cation and an anion. The anion is preferably an acid dissociation constant of 10 or less. (pKa) of Bruce's acid to remove the hydrogen sulfide to form the Bronsted base. The acid dissociation constant (pKa) is 25 ° C, the number in the water, and can be revised by the chemical notes 5 ΙΙ-331~Π- 343 (edited by the Chemical Society of Japan, published by Jiushan Co., Ltd.). When the lincolnic acid is a polybasic acid, the acid dissociation constant (PKai) of the first stage is preferably 10 or less. -13- 201223930 Anion, better dissociation from acid a Brunsten base formed by removing hydrogen ions by a Bruce's acid having a constant (PKa) of 6 or less, preferably a Brunsten formed by removing the hydrogen ions from the Bronsted acid having an acid dissociation constant (pKa) of 3 or less. Further, as the anion, it is preferred that the Bronsted acid is formed by removing the hydrogen ion from the Bronsted acid having an acid dissociation constant (pKa) of -10 or more. Preferably, the Bronsted acid introduced into the anion is exemplified as hydrogen halide ( pKa: -4 to 2.7), sulfuric acid (pKa: 2 or less), thiocyanic acid (pKa: -0.9), phosphoric acid (pKa: 1.8), carbonic acid (pKa: 6.1), nitric acid (pKa: -1.8), methanesulfonate Acid (pKa: -1.2), trifluoromethanesulfonic acid, benzenesulfonic acid (pKa: -2.5), acetic acid (pKa: 4.7), trifluoroacetic acid (pKa: 0.2), pentafluoropropionic acid, acetylacetone ( pKa: 8.8), phenol (pKa: 9.9), pentafluorophenol and thiophene (pKa: 6 · 4) β The copper salt is exemplified by copper halide, copper sulfate, copper thiocyanate, copper phosphate, copper carbonate, copper nitrate, Copper methane sulfonate, copper p-toluenesulfonate, copper (I)-benzene complex of trifluoromethanesulfonate, copper (I)-toluene complex of trifluoromethanesulfonate, trifluoromethanesulfonic acid (II), benzenesulfonic acid, copper acetate, copper trifluoroacetate acetate, copper pentafluoropropionate, copper acetyl pyruvate ([pi), acid copper, acid copper and sulfur pentafluoro acid copper. Copper halides are exemplified by copper fluoride, copper chloride, copper bromide and copper iodide. The copper salt may also be used in combination of two or more selected from the above. The copper salt may also be a hydrate, but is preferably an anhydride. The copper salt may be used as it is, or may be prepared by mixing a one- or two-valent copper compound with an acid. It is preferred to use copper oxide or copper hydroxide as the monovalent or divalent copper compound. As the acid, the aforementioned nucleus acid is preferably used. -14- 201223930 Among them, copper halide, copper sulfate, copper thiocyanate, copper nitrate, copper difluoromethanesulfonate (1)-benzene complex, copper trifluoromethanesulfonate (1)_toluene is preferred. π, copper difluoromethanesulfonate (Π) 'copper acetylacetonate copper (1) and copper thiophenolate, more preferably copper halide, copper sulfate, copper nitrate, copper trifluoromethanesulfonate (1) - The complex compound, copper difluoromethanesulfonate (π) and copper (H) yttrium copper acetylate are used in an amount of from 1 mol to 10 mol per mol of the amine compound. The range is preferably in the range of 0 02 moles to 1 mole, more preferably 1/3 mole to 丨/30 moles. The lower limit of the amount of copper salt used is relative to the compound (1) 1 mole , usually 〇.〇〇〇〇1 molar, preferably 0 000 1 mole, more preferably () 〇〇 1 mole. The upper limit of the amount of copper salt used relative to the compound 〇) 1 mole usually 〇.5莫耳' is preferably 0.3 mol, more preferably 〇1 mol. That is, the amount of copper salt used is relative to the compound (1) 00 m. / ❶, usually 〇〇〇1 Mole%~50% of the range of 'better' 1 mole %~5〇% of the range of moles, more preferably 0.1% by mole to 50% by mole. The yield of the compound (2) which is the target and the copper salt removal after the completion of the reaction, etc. From the viewpoint of workability, it is preferably in the range of 0.1 mol% to 3 mol%, more preferably in the range of 〇5 mol% to 10 mol%. The so-called molecular contains at least two tertiary amines. The tertiary amine group of the amine compound means a substituent formed by a nitrogen atom bonded to three carbon atoms, and the nitrogen atom constituting the tertiary amino group contained in the amine compound means a bond with three carbon atoms a nitrogen atom of the junction. The carbon atom may also be aromatic, and a tertiary amino group having a nitrogen atom -15-201223930 bonded to an aromatic carbon atom as a constituent atom may be contained in at least two molecules. The amine compound is exemplified by a 2,2'-bipyridine compound which may have a substituent, and a 1,1 fluorene phenanthroline compound which may have a substituent. The two tertiary amine groups contained in the amine compound are preferably permeated. Two carbon atoms are bonded. As for the amine compound 'is listed as 2,2,-bipyridine, 1,1 〇 -Porphyrin, 1,4,7-dimethyl-i,4,7-triazaindole, ν,Ν,Ν'Ν'-tetramethylethylenediamine and N,N,N', N'-tetraethylethylenediamine. The amount of the amine compound used relative to the copper salt is usually in the range of 〇1 mol to 1 〇〇mol, preferably 1 mol to 5 〇. The range is more preferably in the range of 3 moles to 30 moles. When the amount of the amine compound is 1 mole or more with respect to the copper salt, there is a tendency to increase the yield of the compound (2). When the temperature is below 10 moles, the reaction rate tends to increase. Therefore, the upper limit of the amount of the amine compound used is usually 50 moles per mole of the compound (丨). The amination is preferably 20 moles, more preferably 5 moles, most
1莫耳 耳之範圍。 最好爲0.5 0.0 0 0 1莫耳。亦即,胺化 1莫耳,通常爲0.0000丨莫 1莫耳〜20莫耳之範圍,更 最好爲0.0001莫耳〜〇 5莫1 range of moir. It is preferably 0.5 0.0 0 0 1 m. That is, the amination is 1 mole, usually 0.0000 丨 Mo 1 mole to 20 moles, more preferably 0.0001 moles to 〇 5 moles
合物(1) 1莫 用量相對於化合物(1)丨莫耳, [耳。亦即,胺化合物之使 更好爲0.001莫耳〜2〇莫耳之 -16- 201223930 範圍,最好爲0·(Η莫耳〜5莫耳之範圍。 化合物(1)之偶合反應較好在溶劑存在下進行。至於 該溶劑列舉爲二甲基亞颯、Ν_甲基_2_吡咯烷酮、Ν,Ν_: 甲基甲醯胺、Ν,Ν-二甲基乙醯胺、六甲基磷酸三醯胺等非 質性極性溶劑’己烷、庚烷、辛烷等之脂肪族烴溶劑,甲 苯、二甲苯等芳香族烴溶劑,四氫呋喃、i,4_二噁烷、二 乙二醇二甲基醚等醚溶劑,及乙酸乙酯、乙酸丁酯、碳酸 二甲醋、碳酸二乙酯等酯溶劑。該溶劑可單獨使用,亦可 混合兩種以上使用。其中,更好爲N -甲基-2-吡咯烷酮等 非質子性極性溶劑、甲苯、二乙二醇二甲基醚及乙酸乙酯 。溶劑之使用量相對於化合物(1) 1重量份,通常爲0.5重 量份〜20重量份之範圍,較好爲1重量份~10重量份之範圍 〇 化合物(1)之偶合反應較好在氮氣、氬氣等對反應惰 性之氣體之氛圍下進行。 偶合反應之反應溫度可依據化合物(1)之種類及其使 用量、金屬銅之使用量、鹵化銅之使用量等適當調節,但 通常爲0°C〜3 00°c之範圍,較好爲50°C〜2 50°c之範圍,更好 爲100°C〜200°C之範圍,最好爲140°C〜180°C之範圍。反應 溫度在〇°C以上時,有提高化合物(2)之生成速度,縮短反 應時間之傾向故較佳,反應溫度爲3 0 0 °C以下時,有抑制 生成之化合物(2)之分解等之副反應發生之傾向故較佳。 偶合反應之反應時間通常可調整爲1小時〜48小時之範 圍。另外,亦可於每特定時間取樣反應混合物之一部分, -17- 201223930 利用例如液體層析分析、氣體層析分析等慣用之分析手段 分析取樣之試料,計算出化合物(1)之消失程度,或聯芳 基化合物(2)之生成程度,而調整反應時間。 依據本發明之製造方法,可使用取得容易之化合物 (1)作爲起始原料,製造對應之聯芳基化合物(2)。 又,化合物(1) 一般會有偶合反應中之反應性低之傾 向,但依據本發明之製造方法,即使使用反應性低之化合 物(1)作爲起始原料,仍可製造對應之聯芳基化合物(2)。 本發明之製造方法中,亦可組合兩種以上之化合物 (1)使用。例如使用Ari-Cl與Ar2-Cl之兩種化合物(1)時,可 獲得AJ-Ai·1、Ai^-Ar2及Ar2-Ar2三種聯芳基化合物(2)。 較好,本發明之製造方法中使用一種之化合物(1)。 化合物(1)之Ar爲可具有取代基之芳香族基。所謂「 可具有取代基之芳香族基」意指藉由去除一個鍵結於可具 有取代基之芳香族化合物之芳香環上之氫原子形成之基。 不具有取代基之芳香族化合物,列舉爲苯、萘、蒽、 芘、聯苯、蒹、9,9’-聯蕗 '菲、茈、苯并菲、萘并苯、并 五苯、三蝶烯等獲得具有芳香族性之環狀烴基之化合物, 吡啶、呋喃、噻吩、苯并噻二唑、吡咯、唾啉、嗤喔啉、 嘧啶、吡嗪等獲得具有芳香族性之雜環基之化合物,及二 茂鐵。不具有取代基之芳香族基爲苯基、萘基、蒽基、芘 基、苯基苯基、莽基、9,9’-聯蒔基、菲基、茈基、苯并菲 基、萘并苯(naphthacenyl)基、并五苯基、三蝶烯基等具 有芳香族性之環狀烴基,吡啶基、呋喃基、噻吩基、苯并 -18- 201223930 噻二唑基、吡咯基、唾啉基、喹啉環基、嘧啶基、吡嗪基 等具有芳香族性之雜環基,及二茂鐵基》 至於可具有芳香族基之取代基列舉爲拉電子基、可具 有由下述G群選出之基之碳數1〜2 0之烷基、可具有由下述 G群選出之基之碳數1~2 0之烷氧基、可具有由下述G群選 出之基之碳數6〜2 0之芳基、可具有由下述G群選出之基之 碳數6〜2 0之芳氧基、可具有由下述G群選出之基之碳數 7〜20之芳烷基、可具有由下述G群選出之基之碳數7~20之 芳烷氧基及具有可具有由下述G群選出之基之碳數1~2 0之 烴基之胺基。 [G群] 氟原子;氰基;碳數1〜12之烷氧基:碳數6〜12之芳基 ;及碳數6~12之芳氧基。 可具有由前述G群選出之基之碳數1〜2 0之烷基中之「 碳數1〜20之烷基」列舉爲甲基、乙基、丙基、異丙基、丁 基、異丁基、第二丁基、第三丁基、戊基、2,2-二甲基丙 基、環戊基、己基、環己基、庚基、2-甲基戊基、辛基、 2-乙基己基、壬基、癸基、十一烷基、十二烷基、十三烷 基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷 基、十九烷基、二十烷基等直鏈狀、分支狀或環狀烷基。 所謂可具有由前述G群選出之基作爲取代基之烷基意指前 述烷基之一個以上之氫原子取代成由前述G群選出之基而 成之基,且烷基具有取代基時,該取代基之碳原子數與烷 基之碳原子數之合計爲1〜20。該等中,較好爲不具有取代 -19- 201223930 基之烷基,更好爲不具有取代基之碳數卜ι〇之烷基。 可具有由前述G群選出之基之碳數1〜2 0之烷氧基中之 「碳數1~20之烷氧基」列舉爲甲氧基、乙氧基、丙氧基、 異丙氧基、丁氧基、異丁氧基、第二丁氧基、第三丁氧基 、戊氧基、2,2-二甲基丙氧基、環戊氧基、己氧基、環己 氧基、庚氧基、2-甲基戊氧基、辛氧基、2-乙基己氧基、 壬氧基、癸氧基、十一烷氧基、十二烷氧基、十三烷氧基 、十四烷氧基、十五烷氧基、十六烷氧基、十七烷氧基、 十八烷氧基、十九烷氧基、二十烷氧基等直鏈狀、分支狀 或環狀碳數1〜20之烷氧基。所謂可具有由前述G群選出之 基作爲取代基之烷氧基意指前述烷氧基之一個以上之氫原 子取代成由前述G群選出之基而成之基,且烷氧基具有取 代基時,該取代基之碳原子數與烷氧基之碳原子數之合計 爲1〜2 0。該等中,較好爲不具有取代基之烷氧基’更好爲 不具有取代基之碳數1〜10之院氧基。 可具有由前述G群選出之基之碳數6~20之芳基中之「 碳數6~20之芳基」列舉爲苯基、2-甲苯基、3-甲苯基、4-甲苯基、2,3-二甲苯基、2,4-二甲苯基、2,5-二甲苯基、 2.6- 二甲苯基、3,4-二甲苯基、3,5-二甲苯基、2,3,4-三甲 基苯基、2,3,5-三甲基苯基、2,3,6-三甲基苯基、2,4,6-三 甲基苯基、3,4,5 -三甲基苯基、2,3,4,5 -四甲基苯基、 2.3.4.6- 四甲基苯基、2,3,5,6-四甲基苯基、五甲基苯基、 乙基苯基、丙基苯基、異丙基苯基、丁基苯基、第二丁基 苯基、第三丁基苯基、戊基苯基、新戊基苯基、己基苯基 -20- 201223930 、辛基苯基、癸基苯基、十二烷基苯基、十四烷基苯基、 萘基及蒽基。所謂可具有由前述G群選出之基作爲取代基 之芳基意指前述芳基之一個以上之氫原子取代成由前述G 群選出之基之基,芳基具有取代基時,該取代基之碳原子 數與芳基之碳原子數合計爲6~20。該等中,較好爲不具有 取代基之芳基,更好爲不具有取代基之碳數6〜1 0之芳基, 最好爲苯基。 可具有由前述G群選出之基作爲取代基之碳數6~20之 芳氧基列聚爲苯氧基、丁基苯氧基、2-萘氧基、2-蒽氧基 等由前述芳基與氧原子構成者。 可具有由前述G群選出之基之「碳數7〜2 0之芳烷基」 列舉爲苄基、(2-甲基苯基)甲基、(3-甲基苯基)甲基、(4-甲基苯基)甲基、(2,3-二甲基苯基)甲基、(2,4-二甲基苯基 )甲基、(2,5-二甲基苯基)甲基、(2,6-二甲基苯基)甲基、 (3,4-二甲基苯基)甲基、(4,6-二甲基苯基)甲基、(2,3,4-三 甲基苯基)甲基、(2,3,5-三甲基苯基)甲基、(2,3,6-三甲基 苯基)甲基、(3,4,5-三甲基苯基)甲基、(2,4,6-三甲基苯蕋) 甲基、(2,3,4,5-四甲基苯基)甲基、(2,3,4,6-四甲基苯基) 甲基、(2,3,5,6-四甲基苯基)甲基、(五甲基苯基)甲基、( 乙基苯基)甲基、(丙基苯基)甲基、(異丙基苯基)甲基、( 丁基苯基)甲基、(第二丁基苯基)甲基、(第三丁基苯基)甲 基、(戊基苯基)甲基、(新戊基苯基)甲基、(己基苯基)甲 基、(辛基苯基)甲基、(癸基苯基)甲基、(癸基苯基)甲基 、萘基甲基及蒽基甲基。所謂可具有由前述G群選出之基 -21 - 201223930 作爲取代基之芳烷基意指前述芳烷基之一個以上之氫原子 取代成由前述G群選出之基之基,芳烷基具有取代基時, 該取代基之碳原子數與芳烷基之碳原子數之合計爲7〜20。 該等中,較好爲不具有取代基之芳烷基,更好爲不具有取 代基之碳數7〜10之芳烷基,最好爲苄基。 可具有由前述G群選出之基之碳數7〜2 0之芳烷氧基之 「碳數7~2 0之芳烷氧基」列舉爲苄氧基、(2-甲基苯基)甲 氧基、(3-甲基苯基)甲氧基、(4-甲基苯基)甲氧基、(2,3-二甲基苯基)甲氧基、(2,4-二甲基苯基)甲氧基、(2,5-二甲 基苯基)甲氧基、(2,6-二甲基苯基)甲氧基、(3,4-二甲基苯 基)甲氧基、(3,5-二甲基苯基)甲氧基、(2,3,4-三甲基苯基 )甲氧基、(2,3,5-三甲基苯基)甲氧基、(2,3,6-三甲基苯基) 甲氧基、(2,4,5-三甲基苯基)甲氧基、(2,4,6-三甲基苯基) 甲氧基、、(3,4,5-三甲基苯基)甲氧基、(2,3,4,5-四甲基苯 基)甲氧基、(2,3,4,6-四甲基苯基)甲氧基、(2,3,5,6-四甲 基苯基)甲氧基、(五甲基苯基)甲氧基、(乙基苯基)甲氧基 、(丙基苯基)甲氧基、(異丙基苯基)甲氧基、(丁基苯基) 甲氧基、(第二丁基苯基)甲氧基、(第三丁基苯基)甲氧基 、(己基苯基)甲氧基、(辛基苯基)甲氧基、(癸基苯基)甲 氧基、萘基甲氧基、蒽基甲氧基等由前述芳烷基與氧原子 所構成者。 至於以可具有由前述G群選出之基之碳數1〜20之烴基 取代之胺基,列舉爲二甲基胺基、二乙基胺基、二丙基胺 基、二異丙基胺基、二丁基胺基、二第二丁基胺基、二第 -22- 201223930 三丁基胺基、二異丁基胺基、第三丁基異丙基胺基、二己 基胺基、二辛基胺基、二癸基胺基及二苯基胺基,該等中 ,以二甲基胺基及二乙基胺基較佳。 化合物(1)之Ar具有拉電子基時,該拉電子基所鍵結 之碳原子與氯原子所鍵結之碳原子係直接鍵結(亦即,該 拉電子基成爲氯原子之鄰位)時,由於有偶合反應中之化 合物(1)之反應性顯著提高之傾向故較佳。 因此,化合物(1)以氯原子之鄰位具有拉電子基之化 合物較佳。氯原子之鄰位具有拉電子基之以式(1 )表示之 化合物有在更溫和之條件,具體而言,在更低反應溫度下 進行偶合反應之傾向,而獲得對應之聯芳基化合物。 本說明書中所謂”拉電子基"爲化學便覽基礎編修訂5 版11-3 79〜11-3 80(日本化學會編,九善股份有限公司發行) 中定義之取代基常數σ/値爲正之基。至於拉電子基較好 爲取代基常數σ/値爲0.3〜1之範圍之基,更好爲〇.5~1之範 圍之基,最好爲0.7〜1之範圍之基。 具體而言,列舉爲硝基(-Ν02)、甲醯基(-CHO)、羧基 (-COOH)、以式(5)表示之基, 0 I. ——S—〇· Υ (5) (式中’ Υ表示氫離子、鹼金屬離子、以式(6)表示之銨離 子、 -23- 201223930 Υ2 u Υ1—Ν—Υ3 (6) Υ4 (式中’ Υ1、Υ2、Υ3及Υ4各獨立表示氫原子或碳數1〜10之 烴基)、可具有由前述G群選出之基之碳數1~20之烷基、或 可具有由前述G群選出之基之碳數6〜2 0之芳基)、Compound (1) 1 Mo is used in an amount relative to the compound (1) 丨mol, [ear. That is, the amine compound is preferably in the range of 0.001 mol to 2 〇 mol −16-201223930, preferably 0·(Η莫耳~5 mol range. The compound (1) has a better coupling reaction. It is carried out in the presence of a solvent. The solvent is exemplified by dimethyl hydrazine, hydrazine-methyl-2-pyrrolidone, hydrazine, hydrazine _: methylformamide, hydrazine, hydrazine-dimethylacetamide, hexamethyl An amorphic polar solvent such as triammonium phosphate, an aliphatic hydrocarbon solvent such as hexane, heptane or octane, an aromatic hydrocarbon solvent such as toluene or xylene, tetrahydrofuran, i.4-dioxane or diethylene glycol. An ether solvent such as dimethyl ether or an ester solvent such as ethyl acetate, butyl acetate, dimethyl carbonate or diethyl carbonate. The solvent may be used singly or in combination of two or more. - an aprotic polar solvent such as methyl-2-pyrrolidone, toluene, diethylene glycol dimethyl ether, and ethyl acetate. The solvent is used in an amount of usually 0.5 part by weight to 20 parts by weight based on 1 part by weight of the compound (1). The range of parts by weight is preferably from 1 part by weight to 10 parts by weight. The coupling reaction of the compound (1) is preferably in the form of nitrogen. The reaction temperature of the coupling reaction may be appropriately adjusted according to the kind of the compound (1), the amount thereof, the amount of the metal copper used, the amount of the copper halide used, etc., but usually The range of 0 ° C to 3 00 ° c, preferably in the range of 50 ° C to 2 50 ° C, more preferably in the range of 100 ° C to 200 ° C, preferably in the range of 140 ° C to 180 ° C When the reaction temperature is 〇 ° C or more, the production rate of the compound (2) is increased, and the reaction time is shortened. Therefore, when the reaction temperature is 300 ° C or lower, the decomposition of the compound (2) is inhibited. The tendency of the side reaction to occur is preferred. The reaction time of the coupling reaction can be usually adjusted to a range of from 1 hour to 48 hours. Alternatively, a part of the reaction mixture can be sampled at a specific time, -17-201223930 using, for example, a liquid layer Analytical methods such as analysis and gas chromatography analysis are used to analyze the sample sample, calculate the degree of disappearance of the compound (1), or the degree of formation of the biaryl compound (2), and adjust the reaction time. The production method according to the present invention ,be usable The compound (1) which is easy to be used as a starting material produces the corresponding biaryl compound (2). Further, the compound (1) tends to have a low reactivity in the coupling reaction, but according to the production method of the present invention, Even if the compound (1) having low reactivity is used as a starting material, the corresponding biaryl compound (2) can be produced. In the production method of the present invention, two or more compounds (1) may be used in combination. When the two compounds (1) of Ari-Cl and Ar2-Cl are used, three kinds of biaryl compounds (2) of AJ-Ai·1, Ai^-Ar2 and Ar2-Ar2 can be obtained. Preferably, in the production method of the present invention A compound (1) of one kind is used. Ar of the compound (1) is an aromatic group which may have a substituent. The "aromatic group which may have a substituent" means a group formed by removing a hydrogen atom bonded to an aromatic ring of an aromatic compound which may have a substituent. Aromatic compounds having no substituents, exemplified by benzene, naphthalene, anthracene, anthracene, biphenyl, anthracene, 9,9'-bifluorene phenanthrene, anthracene, benzophenanthrene, naphthacene, pentacene, and three butterflies A compound obtained by obtaining an aromatic cyclic hydrocarbon group such as pyridine, furan, thiophene, benzothiadiazole, pyrrole, porphyrin, porphyrin, pyrimidine, pyrazine or the like to obtain an aromatic heterocyclic group. Compound, and ferrocene. The aromatic group having no substituent is phenyl, naphthyl, anthracenyl, fluorenyl, phenylphenyl, anthracenyl, 9,9'-bifluorenyl, phenanthryl, anthryl, benzophenanyl, naphthalene An aromatic cyclic hydrocarbon group such as naphthacenyl group, pentaphenyl or triptyl, pyridyl, furyl, thienyl, benzo-18-201223930 thiadiazolyl, pyrrolyl, saliva An aromatic heterocyclic group such as a phenyl group, a quinoline ring group, a pyrimidinyl group or a pyrazinyl group, and a ferrocenyl group. The substituent which may have an aromatic group is exemplified as a pull electron group, and may have the following The alkyl group having a carbon number of 1 to 20 selected from the group G, an alkoxy group having 1 to 20 carbon atoms which may be selected from the group G, and a carbon group which may have a group selected from the following group G An aryl group having 6 to 20 aryl groups, an aryloxy group having 6 to 20 carbon atoms which may be selected from the group G, and an aralkyl group having 7 to 20 carbon atoms which may have a group selected from the group G below The group may have an aralkoxy group having 7 to 20 carbon atoms and a group having a hydrocarbon group having 1 to 20 carbon atoms which may have a group selected from the group G below. [G group] fluorine atom; cyano group; alkoxy group having 1 to 12 carbon atoms; aryl group having 6 to 12 carbon atoms; and aryloxy group having 6 to 12 carbon atoms. The "alkyl group having 1 to 20 carbon atoms" in the alkyl group having 1 to 20 carbon atoms which may be selected from the group G is exemplified by methyl group, ethyl group, propyl group, isopropyl group, butyl group or the like. Butyl, t-butyl, tert-butyl, pentyl, 2,2-dimethylpropyl, cyclopentyl, hexyl, cyclohexyl, heptyl, 2-methylpentyl, octyl, 2- Ethylhexyl, decyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, A linear, branched or cyclic alkyl group such as a nonadecyl group or an eicosyl group. The alkyl group which may have a substituent selected from the above-mentioned group G is a group in which one or more hydrogen atoms of the alkyl group are substituted with a group selected from the group G, and when the alkyl group has a substituent, The total number of carbon atoms of the substituent and the number of carbon atoms of the alkyl group is 1 to 20. Among these, an alkyl group having no substituent -19-201223930, and more preferably an alkyl group having no substituent. The "alkoxy group having 1 to 20 carbon atoms" in the alkoxy group having 1 to 20 carbon atoms which may be selected from the above-mentioned group G is exemplified by methoxy group, ethoxy group, propoxy group, and isopropoxy group. , butoxy, isobutoxy, second butoxy, tert-butoxy, pentyloxy, 2,2-dimethylpropoxy, cyclopentyloxy, hexyloxy, cyclohexyloxy , heptyloxy, 2-methylpentyloxy, octyloxy, 2-ethylhexyloxy, decyloxy, decyloxy, undecyloxy, dodecyloxy, tridecaneoxy Linear, branched, etc., tetradecyloxy, pentadecyloxy, hexadecanyloxy, heptadecyloxy, octadecyloxy, nonadecanyloxy, eicosyloxy Or a cyclic alkoxy group having 1 to 20 carbon atoms. The alkoxy group which may have a substituent selected from the above-mentioned group G is a group in which one or more hydrogen atoms of the alkoxy group are substituted with a group selected from the group G, and the alkoxy group has a substituent. The total number of carbon atoms of the substituent and the number of carbon atoms of the alkoxy group is 1 to 2 0. Among these, an alkoxy group which does not have a substituent is more preferably an alkoxy group having 1 to 10 carbon atoms which does not have a substituent. The "aryl group having 6 to 20 carbon atoms" in the aryl group having 6 to 20 carbon atoms which may be selected from the above-mentioned group G is exemplified by a phenyl group, a 2-tolyl group, a 3-tolyl group, a 4-tolyl group, 2,3-xylyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2.6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 2,3, 4-trimethylphenyl, 2,3,5-trimethylphenyl, 2,3,6-trimethylphenyl, 2,4,6-trimethylphenyl, 3,4,5- Trimethylphenyl, 2,3,4,5-tetramethylphenyl, 2.3.4.6-tetramethylphenyl, 2,3,5,6-tetramethylphenyl, pentamethylphenyl, Ethylphenyl, propylphenyl, isopropylphenyl, butylphenyl, t-butylphenyl, tert-butylphenyl, pentylphenyl, neopentylphenyl, hexylphenyl- 20-201223930, octylphenyl, nonylphenyl, dodecylphenyl, tetradecylphenyl, naphthyl and anthracenyl. The aryl group which may have a substituent selected from the above-mentioned G group means that one or more hydrogen atoms of the above aryl group are substituted with a group selected from the above G group, and when the aryl group has a substituent, the substituent The total number of carbon atoms and the number of carbon atoms of the aryl group is 6 to 20. Among these, an aryl group having no substituent is preferred, and an aryl group having 6 to 10 carbon atoms which does not have a substituent is preferred, and a phenyl group is preferred. The aryloxy group having 6 to 20 carbon atoms which may have a substituent selected from the above-mentioned G group may be a phenoxy group, a butylphenoxy group, a 2-naphthyloxy group, a 2-decyloxy group or the like. The base is composed of oxygen atoms. The "aralkyl group having 7 to 20 carbon atoms" which may have a group selected from the above-mentioned group G is exemplified by a benzyl group, a (2-methylphenyl)methyl group or a (3-methylphenyl)methyl group ( 4-methylphenyl)methyl, (2,3-dimethylphenyl)methyl, (2,4-dimethylphenyl)methyl, (2,5-dimethylphenyl)methyl , (2,6-dimethylphenyl)methyl, (3,4-dimethylphenyl)methyl, (4,6-dimethylphenyl)methyl, (2,3,4 -trimethylphenyl)methyl, (2,3,5-trimethylphenyl)methyl, (2,3,6-trimethylphenyl)methyl, (3,4,5-tri Methylphenyl)methyl, (2,4,6-trimethylphenylhydrazine) methyl, (2,3,4,5-tetramethylphenyl)methyl, (2,3,4,6 -tetramethylphenyl)methyl, (2,3,5,6-tetramethylphenyl)methyl, (pentamethylphenyl)methyl, (ethylphenyl)methyl, (propyl Phenyl)methyl, (isopropylphenyl)methyl, (butylphenyl)methyl, (t-butylphenyl)methyl, (t-butylphenyl)methyl, (pentyl) Phenyl)methyl, (neopentylphenyl)methyl, (hexylphenyl)methyl, (octylphenyl)methyl, ( Yl) methyl, (decyl) methyl group, naphthylmethyl group and anthracenyl group. The aralkyl group which may have a group selected from the above-mentioned group G - 21,923,930 as a substituent means that one or more hydrogen atoms of the above aralkyl group are substituted with a group selected from the aforementioned group G, and the aralkyl group has a substituent. In the case of a group, the total number of carbon atoms of the substituent and the number of carbon atoms of the aralkyl group is 7 to 20. Among these, an aralkyl group having no substituent is preferred, and an aralkyl group having 7 to 10 carbon atoms which does not have a substituent is preferred, and a benzyl group is preferred. The "aralkyloxy group having 7 to 20 carbon atoms" which may have an aralkoxy group having 7 to 20 carbon atoms selected from the above-mentioned group G is exemplified by a benzyloxy group or a (2-methylphenyl) group. Oxyl, (3-methylphenyl)methoxy, (4-methylphenyl)methoxy, (2,3-dimethylphenyl)methoxy, (2,4-dimethyl Phenyl)methoxy, (2,5-dimethylphenyl)methoxy, (2,6-dimethylphenyl)methoxy, (3,4-dimethylphenyl)methoxy , (3,5-dimethylphenyl)methoxy, (2,3,4-trimethylphenyl)methoxy, (2,3,5-trimethylphenyl)methoxy , (2,3,6-trimethylphenyl)methoxy, (2,4,5-trimethylphenyl)methoxy, (2,4,6-trimethylphenyl)methoxy , (3,4,5-trimethylphenyl)methoxy, (2,3,4,5-tetramethylphenyl)methoxy, (2,3,4,6-tetramethyl Phenyl) methoxy, (2,3,5,6-tetramethylphenyl)methoxy, (pentamethylphenyl)methoxy, (ethylphenyl)methoxy, (C Phenyl) methoxy, (isopropylphenyl)methoxy, (butylphenyl) methoxy, (second butylphenyl) methoxy (t-butylphenyl)methoxy, (hexylphenyl)methoxy, (octylphenyl)methoxy, (nonylphenyl)methoxy, naphthylmethoxy, fluorenyl The oxy group or the like is composed of the aforementioned aralkyl group and an oxygen atom. The amine group substituted with a hydrocarbon group having 1 to 20 carbon atoms which may have a group selected from the above G group is exemplified by dimethylamino group, diethylamino group, dipropylamino group and diisopropylamino group. , Dibutylamino, di-tert-butylamino, di--22- 201223930 tributylamino, diisobutylamino, tert-butylisopropylamino, dihexylamino, two An octylamino group, a dinonylamino group and a diphenylamino group are preferred, and among these, a dimethylamino group and a diethylamino group are preferred. When Ar of the compound (1) has an electron withdrawing group, the carbon atom to which the electron withdrawing group is bonded is directly bonded to the carbon atom to which the chlorine atom is bonded (that is, the electron withdrawing group is adjacent to the chlorine atom). In this case, the reactivity of the compound (1) in the coupling reaction tends to be remarkably improved, which is preferable. Therefore, the compound (1) is preferably a compound having an electron withdrawing group in the ortho position to the chlorine atom. The compound represented by the formula (1) in the ortho position of the chlorine atom has a tendency to undergo a coupling reaction under milder conditions, specifically, at a lower reaction temperature, to obtain a corresponding biaryl compound. The so-called "pull-on-base" in this manual is the basis for the definition of the substituents σ/値 defined in the basics of the chemical handbook revision 5 edition 11-3 79~11-3 80 (edited by the Chemical Society of Japan, issued by Jiushan Co., Ltd.). The electron-donating group is preferably a group having a substituent constant σ/値 in the range of 0.3 to 1, more preferably a group in the range of 〇.5 to 1, preferably in the range of 0.7 to 1. In terms of nitro (-Ν02), formazan (-CHO), carboxyl (-COOH), a group represented by formula (5), 0 I. —S—〇· Υ (5) Medium ' Υ denotes hydrogen ion, alkali metal ion, ammonium ion represented by formula (6), -23- 201223930 Υ2 u Υ1—Ν—Υ3 (6) Υ4 (wherein Υ1, Υ2, Υ3, and Υ4 are independent representations a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms), an alkyl group having 1 to 20 carbon atoms selected from the group of the G group, or a carbon number 6 to 2 0 which may be selected from the group G base),
-COOY (式中,Υ表示與前述相同之義),及三氟甲基,較好爲以 式(5)表示之基及硝基。 鹼金屬離子列舉爲鋰離子(Li + )、鈉離子(Na + )、鉀離 子(K + )及鉋離子(Cs + ),較好爲鈉離子。 Y1、Y2、Y3及Y4之碳數1〜10之烴基列舉爲甲基、乙 基、丙基、丁基、辛基等之碳數1〜10之烷基及苯基等之碳 數6〜10之芳基。以式(6)表示之銨離子列舉爲銨離子 (NH4 + )、甲基銨離子(N(CH3)H3 + )、二乙基銨離子 (N(C2H5)2H2 + )、二丙基銨離子(N(C3H7)2H2 + ) ' 三丙基銨 離子(n(c3h7)3h + )、四丁基銨離子(n(c4h9)4+)、二異丙基 二乙基銨離子(n(ch(ch3)2)2(c2h5)2 + )、四辛基銨離子 (N(c8Hl7)4 + )、四癸基銨離子(N(c1QH21)4 + )及三苯基銨離 子(N(c6H5)3H+)。 至於化合物(1),列舉爲2 -氯-1·硝基苯、2·氯苯-1-磺 酸、2·氯苯-1-磺酸鋰、2-氯苯-1-磺酸鈉、2-氯苯-1-磺酸 -24- 201223930 鉀、2 -氯苯-1-磺酸甲酯、2 -氯苯-1-磺酸乙酯、2 -氯苯-1-磺酸丙酯、2-氯苯-1-磺酸異丁酯、2-氯苯-1-磺酸(2,2-二 甲基丙酯)、2-氯苯-1-磺酸環己酯、2-氯苯-1-羧酸、2-氯 苯-1-羧酸甲酯、2 -氯苯-1-羧酸乙酯、2 -氯-1-甲醯基苯、 2-氯-1-乙醯基苯、2-氯-卜苯甲醯基苯、2,5-二氯-1-苯甲 醯基苯、2-氯-1-三氟甲基苯, 2-氯-1-苯甲酸、2-氯-1-苯甲酸甲酯、2-氯-1-苯甲酸 乙酯, 2-氯-1-硝基萘、2-氯萘-1-磺酸、2-氯萘-1-磺酸鋰、 2-氯萘-1-磺酸鈉、2-氯萘-1_磺酸鉀、2-氯萘-1-磺酸甲酯 、2-氯萘-1-磺酸乙酯、2-氯萘-1-磺酸丙酯、2-氯萘-1-磺 酸異丁酯、2-氯萘-1-磺酸(2,2-二甲基丙酯)、2_·氯萘-1-磺 酸環己酯、2-氯-1-萘甲酸、2-氯-1-萘甲酸甲酯、2-氯-1-萘甲酸乙酯、2-氯-1-甲醯基萘、2-氯-卜乙醯基萘、2-氯- 1- 苯甲醯基萘、2,5-二氯-1-苯甲醯基萘、2-氯-1-三氟甲基 萘, 2_氯_·1-硝基蒽、2-氯蒽-1-磺酸、2-氯蒽-1-磺酸鋰、 2- 氯蒽-1-磺酸鈉、2-氯蒽-1-磺酸鉀、2-氯蒽-1-磺酸甲酯 、2-氯蒽-1-磺酸乙酯、2-氯蒽-1-磺酸丙酯、2-氯蒽-1_磺 酸異丁酯、2-氯蒽-1-磺酸(2,2-二甲基丙酯)、2-氯蒽-1-磺 酸環己酯、2-氯蒽-1-羧酸、2-氯蒽-1-羧酸甲酯、2-氯蒽· 1-羧酸乙酯、2-氯-1-甲醯基蒽、2-氯-1-乙醯基蒽、2-氯-1-苯甲醯基蒽、2,5-二氯-1-苯甲醯基蒽、2-氯-1-三氟甲蕋 蒽,2-氯-1-硝基芘、2-氯芘-1-磺酸、2-氯芘-1-磺酸鋰·· -25- 201223930 2-氯芘-1-磺酸鈉、2-氯芘-1-磺酸鉀、2_氯芘-1-磺酸甲酯 、2-氯芘-1-磺酸乙酯、2-氯芘-1-磺酸丙酯、2-氯芘-1-磺 酸異丁酯、2-氯芘-1-磺酸(2,2-二甲基丙酯)、2-氯芘-1-磺 酸環己酯、2-氯芘-1-羧酸、2-氯-1-芘羧酸甲酯、2-氯-1-芘羧酸乙酯、2-氯-1-甲醯基芘、2-氯-1-乙醯基芘、2-氯-1-苯甲醯基芘、2-氯-1-三氟甲基芘,2-氯-1-硝基苐、2-氯 苐-.1-磺酸、2-氯莽-1-磺酸鋰、2-氯莽-1-磺酸鈉、2-氯苐- 1- 磺酸鉀、2-氯莽-1-磺酸甲酯、2-氯苐-1-磺酸乙酯、2-氯 蕗-1-磺酸丙酯、2-氯苐-1-磺酸異丁酯、2-氯莽-1-磺酸 (2,2-二甲基丙酯)、2-氯苐-1-磺酸環己酯、2-氯苐-1-羧酸 、2-氯薄-1-羧酸甲酯、2-氯蒔-1-羧酸乙酯、2-氯-1-甲醯 基莽、2-氯-1-乙醯基蕗、2-氯-1-苯甲醯基莽、2-氯-1-三 氟甲基蕗, 2-氯-1-硝基-9,9’-聯蕗、2-氯-1-磺基-9,9’-聯蕗、2-氯-9,9’-聯苐-磺酸鋰、2-氯-9,9’-聯苐-磺酸鈉、2-氯-9,9’-聯蕗-磺酸鉀、2-氯-9,9’-聯莽-磺酸甲酯、2-氯-9,9’-聯莽-磺酸乙酯、2-氯-9,9’-聯莽-磺酸丙酯、2-氯-9,9’-聯苐-磺 酸異丁酯、2-氯-9,9’-聯莽-磺酸(2,2-二甲基丙酯)、2-氯-9,9’-聯莽-磺酸環己酯、2-氯-1-羧基-9,9’-聯莽、2-氯-1-甲醯基-9,9’-聯莽、2-氯-1-乙醯基-9,9’-聯蕗、2-氯-1-苯 甲醯基_9,9’-聯莽、2-氯-1-三氟甲基_9,9,-聯蕗, 2-氯-1-硝基菲、2-氯菲-1-磺酸、2-氯菲-1-磺酸鋰、 2- 氯菲-1-磺酸鈉、2-氯菲-1-磺酸鉀、2-氯菲-1-磺酸甲酯 、2-氯菲-1-磺酸乙酯、2-氯菲-1-磺酸丙酯、2-氯菲-1-磺 -26- 201223930 酸異丁酯、2-氯菲-1-磺酸(2,2-二甲基丙酯)、2-氯菲-1-磺 酸環己酯、2-氯菲-1-羧酸、2-氯-1-甲醯基菲、2-氯-1-乙 醯基菲、2-氯-1-苯甲醯基菲、2-氯-1-三氟甲基菲, 2-氯-1-硝基茈、2-氯茈-1-磺酸、2-氯茈-1-磺酸鋰、 2-氯芘-1-磺酸鈉、2-氯茈-1-磺酸鉀、2-氯茈-1-磺酸甲酯 、2-氯茈-1-磺酸乙酯、2-氯菲-1-磺酸丙酯、2-氯茈-】-磺 酸異丁酯、2-氯茈-1-磺酸(2,2-二甲基丙酯)、2-氯茈-1-磺 酸環己酯、2-氯茈-1-羧酸、2-氯-1-甲醯基茈、2-氯-1-乙 醯基茈、2-氯-1-苯甲醯基茈、2-氯-1-三氟甲基茈, 2-氯-1-硝基苯并菲、2-氯苯并菲-1-磺酸、2-氯苯并 菲-1-磺酸鋰、2-氯苯并菲-1-磺酸鈉、2-氯苯并菲-1-磺酸 鉀、2-氯苯并菲-1-磺酸甲酯、2-氯苯并菲-1-磺酸乙酯、 2-氯苯并菲-1-磺酸丙酯、2-氯苯并菲-1-磺酸異丁酯' 2-氯苯并菲-1-磺酸(2,2-二甲基丙酯)、2-氯苯并菲-1-磺酸環 己酯、2-氯苯并菲-1-羧酸、2-氯苯并菲-1-羧酸甲酯、2-氯苯并菲-1-羧酸乙酯、2-氯-1-甲醯基苯并菲、2-氯-1-乙 醯基苯并菲、2-氯-1-苯甲醯基苯并菲、2-氯-1-三氟甲基 苯并菲, 2-氯-1-硝基萘并苯、2-氯萘并苯-1-磺酸、2-氯萘并 苯-1-磺酸鋰、2-氯萘并苯-1-磺酸鈉、2-氯萘并苯-1-磺酸 鉀、2-氯萘并苯-1-磺酸甲酯、2-氯萘并苯-1-磺酸乙酯、 2-氯萘并苯-1-磺酸丙酯、2-氯萘并苯-1-磺酸異丁酯、2-氯萘并苯-1-磺酸(2,2-二甲基丙酯)、2-氯萘并苯-1-磺酸環 己酯、2-氯萘并苯-1-羧酸、2-氯萘并苯-1-羧酸甲酯、2- -27- 201223930 氯萘并苯-1-羧酸乙酯、2-氯-1-甲醯基萘并苯、2-氯-1-乙 醯基萘并苯、2-氯-1-苯甲醯基萘并苯、2-氯-1-三氟甲基 萘并苯, 2-氯-1-硝基并五苯、2-氯并五苯-1-磺酸、2-氯并五 苯-1-磺酸鋰、2 -氯并五苯-1-磺酸鈉、2 -氯并五苯-1-磺酸 鉀、2-氯并五苯-1-磺酸甲酯、2-氯并五苯-1-磺酸乙酯、 2-氯并五苯-1-磺酸丙酯、2-氯并五苯-1-磺酸異丁酯、2-氯并五苯-1-磺酸(2,2-二甲基丙酯)、2-氯并五苯-1-磺酸環 己酯、2-氯并五苯-1-羧酸、2-氯并五苯-1-羧酸甲酯、2-氯并五苯-1-羧酸乙酯、2-氯-1-甲醯基并五苯、2-氯-1-乙 醯基并五苯、2-氯-1-苯甲醯基并五苯、2-氯-1-三氟甲基 并五苯, 2-氯-1-硝基三蝶燃(triptycene)、2-氯三蝶嫌-1-擴酸 、2-氯三蝶烯-1-磺酸鋰、2-氯三蝶烯-1-磺酸鈉、2-氯三 蝶烯-1-磺酸鉀、2-氯三蝶烯-1-磺酸甲酯、2-氯三蝶烯-1-磺酸乙酯、2-氯三蝶烯-1-磺酸丙酯、2-氯三蝶烯-1-磺酸 異丁酯、2-氯三蝶烯-1-磺酸(2,2-二甲基丙酯)、2·氯三蝶 烯-1-磺酸環己酯、2-氯三蝶烯-1-羧酸、2-氯三蝶烯-1-羧 酸甲酯、2-氯三蝶烯-1-羧酸乙酯、2-氯-1-甲醯基三蝶烯 、2-氯-1-乙醯基三蝶烯、2-氯-1-苯甲醯基三蝶烯、2-氯-1-三氟甲基三蝶烯, 2-氯-3-硝基吡啶、2-氯吡啶-3-磺酸、2-氯吡啶-3-磺 酸鋰、2-氯吡啶-3-磺酸鈉、2-氯吡啶-3-磺酸鉀、2-氯吡 啶-3-磺酸甲酯、2-氯吡啶-3-磺酸乙酯、2-氯吡啶-3-磺酸 -28- 201223930 丙酯、2-氯吡啶-3-磺酸異丁酯、2_氯吡啶-3-磺酸(2,2-二 甲基丙酯)、2-氯吡啶-3-磺酸環己酯、2-氯吡啶-3-羧酸、 2-氯吡啶-3-羧酸甲酯、2-氯吡啶-3-羧酸乙酯、2-氯丨-甲 醯基吡啶、2-氯-3-乙醯基吡啶、2-氯-3-苯甲醯基吡啶、 2-氯-3-三氟甲基吡啶, 2-氯-3·硝基呋喃、2-氯呋喃-3-磺酸、2-氯呋喃-3-磺 酸鋰、2-氯呋喃-3-磺酸鈉、2-氯呋喃-3-磺酸鉀、2-氯呋 喃-3-磺酸甲酯、2-氯呋喃-3-磺酸乙酯、2-氯呋喃-3-磺酸 丙酯、2-氯呋喃-3-磺酸異丁酯、2-氯呋喃-3-磺酸(2,2-二 甲基丙酯)、2-氯呋喃-3-磺酸環己酯、2-氯呋喃-3-羧酸、 2-氯呋喃-3-羧酸甲酯、2-氯呋喃-3-羧酸乙酯、2-氯-3-甲 醯基呋喃、2-氯-3-乙醯基呋喃、2-氯-3-苯甲醯基呋喃、 2-氯-3-三氟甲基呋喃, 2-氯-3-硝基噻吩、2_氯噻吩-3_磺酸、2-氯噻吩-3-磺 酸鋰、2-氯噻吩-3-磺酸鈉、2-氯噻吩-3-磺酸鉀、2-氯噻 吩-3-磺酸甲酯、2-氯噻吩-3-磺酸乙酯、2-氯噻吩-3-磺酸 丙酯、2-氯噻吩-3-磺酸異丁酯、2-氯噻吩-3-磺酸(2,2-二 甲基丙酯)、2-氯噻吩-3-磺酸環己酯、2-氯噻吩-3-羧酸、 2-氯噻吩-3-羧酸甲酯、2-氯噻吩-3-羧酸乙酯、2-氯-3-甲 醯基噻吩、2-氯-3-乙醯基噻吩、2-氯-3-苯甲醯基噻吩、 2-氯-3-三氟甲基噻吩, 7-氯-6-硝基苯并噻二唑、7-氯苯并噻二唑-6-磺酸、 7-氯苯并噻二唑-6-磺酸鋰、7-氯苯并噻二唑-6-磺酸鈉、 7-氯苯并噻二唑-6-磺酸鉀、7-氯苯并噻二唑-6-磺酸甲酯 -29- 201223930 、7-氯苯并噻二唑-6-磺酸乙酯、7-氯苯并噻二唑-6-磺酸 丙酯、7-氯苯并噻二唑-6-磺酸異丁酯、7-氯苯并噻二唑-6-磺酸(2,2-二甲基丙酯)、7-氯苯并噻二唑-6-磺酸環己酯 、7-氯苯并噻二唑-6-羧酸、7-氯苯并噻二唑-6-羧酸甲酯 、7-氯苯并噻二唑-6-羧酸乙酯、7-氯-6-甲醯基苯并噻二 唑、7-氯-6-乙醯基苯并噻二唑、7-氯-6-苯甲醯基苯并噻 二唑、7 -氯-6-三氟甲基苯并噻二唑, 2-氯-3-硝基吡咯、2-氯吡咯-3-磺酸、2-氯吡咯-3-磺 酸鋰、2-氯吡咯-3-磺酸鈉、2-氯吡咯-3-磺酸鉀、2-氯吡 咯-3-磺酸甲'酯、2-氯吡咯-3-磺酸乙酯、2-氯吡咯-3-磺酸 丙酯、2-氯吡咯-3-磺酸異丁酯、2-氯吡咯-3-磺酸(2,2-二 甲基丙酯)、2-氯吡咯-3-磺酸環己酯、2-氯吡咯-3-羧酸、 2-氯吡咯-3-羧酸甲酯、2-氯吡咯-3-羧酸乙酯、2-氯-3-甲 醯基吡咯、2-氯-3-乙醯基吡咯、2-氯-3-苯甲醯基吡咯、 2-氯-3-三氟甲基吡咯, 2-氯-3-硝基唾啉、2-氯唾啉-3-磺酸、2-氯喹啉-3-磺 酸鋰、2-氯喹啉-3-磺酸鈉、2-氯喹啉-3-磺酸鉀、2-氯喹 啉-3-磺酸甲酯、2-氯喹啉-3-磺酸乙酯、2-氯喹啉-3-磺酸 丙酯、2-氯喹啉-3-磺酸異丁酯、2-氯喹啉-3-磺酸(2,2-二 甲基丙酯)、2-氯喹啉-3-磺酸環己酯、2-氯喹啉-3-羧酸、 2-氯喹啉-3-羧酸甲酯、2-氯喹啉-3-羧酸乙酯、2-氯-3-甲 醯基喹啉、2-氯-3-乙醯基喹啉、2-氯-3-苯甲醯基喹啉、 2-氯-3-三氟甲基喹啉, 2 -氯-3-硝基嗤喔咐、2 -氯唾喔咐-3 -擴酸、2 -氯嗤喔 -30- 201223930 啉-3-磺酸鋰、2-氯喹喔啉-3-磺酸鈉、2-氯喹喔啉-3-磺酸 鉀、2-氯唾喔啉-3-磺酸甲酯、2-氯喹喔啉-3-磺酸乙酯、 2-氯喹喔啉-3-磺酸丙酯、2-氯喹喔啉-3-磺酸異丁酯、2-氯喹喔啉-3-磺酸(2,2-二甲基丙酯)、2-氯唾喔啉-3-磺酸環 己酯、2-氯喹喔啉-3-羧酸、2-氯唾喔啉-3-羧酸甲酯、2-氯喹喔啉-3-羧酸乙酯、2-氯-3-甲醯基喹喔啉、2-氯-3-乙 醯基喹喔啉、2-氯-3-苯甲醯基喹喔啉、2-氯-3-三氟甲基 喹喔琳, 4-氯-5-硝基嘧啶、4-氯嘧啶-5-磺酸、4-氯嘧啶-5-磺 酸鋰、4-氯嘧啶-5-磺酸鈉、4-氯嘧啶-5-磺酸鉀、4-氯嘧 啶-5-磺酸甲酯、4-氯嘧啶-5-磺酸乙酯、4-氯嘧啶-5-磺酸 丙酯、4-氯嘧啶-5-磺酸異丁酯、4-氯嘧啶-5-磺酸(2,2-二 甲基丙酯)' 4-氯嘧啶-5-磺酸環己酯、4-氯嘧啶-5-羧酸、 4-氯嘧啶-5-羧酸甲酯、4_氯嘧啶-5-羧酸乙酯、4-氯-5-甲 醯基嘧啶、4-氯-5-乙醯基嘧啶、4-氯-5-苯甲醯基嘧啶、 4-氯-5-三氟甲基嘧啶, 2-氯-3-硝基吡嗪、2-氯吡嗪-3-磺酸、2-氯吡嗪-3-磺 酸鋰、2-氯吡嗪-3-磺酸鈉、2-氯吡嗪-3-磺酸鉀、2-氯吡 嗪-3-磺酸甲酯、2-氯吡嗪-3-磺酸乙酯、2-氯吡嗪-3-磺酸 丙酯' 2-氯吡嗪-3-磺酸異丁酯、2-氯吡嗪-3-磺酸(2,2-二 甲基丙酯)、2-氯吡嗪-3-磺酸環己酯、2-氯吡嗪-3-羧酸、 2-氯吡嗪-3-羧酸甲酯、2-氯吡嗪-3-羧酸乙酯、2-氯-3·甲 醯基吡嗪、2-氯-3-乙醯基吡嗪、2-氯-3-苯甲醯基吡嗪、 2-氯-3-三氟甲基吡嗪。 -31 - 201223930 其中,較好爲以式(3)表示之化合物(以下簡稱爲化合 物(3)):-COOY (wherein Υ represents the same meaning as defined above), and a trifluoromethyl group, preferably a group represented by the formula (5) and a nitro group. The alkali metal ions are exemplified by lithium ions (Li + ), sodium ions (Na + ), potassium ions (K + ), and planing ions (Cs + ), preferably sodium ions. The hydrocarbon group having 1 to 10 carbon atoms of Y1, Y2, Y3 and Y4 is exemplified by a carbon number of 1 to 10 such as a methyl group, an ethyl group, a propyl group, a butyl group or an octyl group, and a carbon number of a phenyl group or the like 6~ 10 aryl. The ammonium ion represented by the formula (6) is exemplified by ammonium ion (NH4 + ), methylammonium ion (N(CH3)H3 + ), diethylammonium ion (N(C2H5)2H2 + ), dipropylammonium ion. (N(C3H7)2H2 + ) 'Tripropylammonium ion (n(c3h7)3h + ), tetrabutylammonium ion (n(c4h9)4+), diisopropyldiethylammonium ion (n(ch) (ch3)2)2(c2h5)2 + ), tetraoctylammonium ion (N(c8Hl7)4 + ), tetradecylammonium ion (N(c1QH21)4 + ) and triphenylammonium ion (N(c6H5) ) 3H+). As the compound (1), it is exemplified by 2-chloro-1·nitrobenzene, 2·chlorobenzene-1-sulfonic acid, lithium chlorobenzene-1-sulfonate, sodium 2-chlorobenzene-1-sulfonate, 2-Chlorobenzene-1-sulfonic acid-24- 201223930 Potassium, methyl 2-chlorobenzene-1-sulfonate, ethyl 2-chlorobenzene-1-sulfonate, 2-chlorobenzene-1-sulfonic acid propyl ester , 2-chlorobenzene-1-sulfonic acid isobutyl ester, 2-chlorobenzene-1-sulfonic acid (2,2-dimethylpropyl ester), 2-chlorobenzene-1-sulfonic acid cyclohexyl ester, 2- Chlorobenzene-1-carboxylic acid, methyl 2-chlorobenzene-1-carboxylate, ethyl 2-chlorobenzene-1-carboxylate, 2-chloro-1-methylnonylbenzene, 2-chloro-1-B Nonylbenzene, 2-chloro-p-benzoylbenzene, 2,5-dichloro-1-benzhydrylbenzene, 2-chloro-1-trifluoromethylbenzene, 2-chloro-1-benzoic acid , 2-chloro-1-benzoic acid methyl ester, 2-chloro-1-benzoic acid ethyl ester, 2-chloro-1-nitronaphthalene, 2-chloronaphthalene-1-sulfonic acid, 2-chloronaphthalene-1- Lithium sulfonate, sodium 2-chloronaphthalene-1-sulfonate, potassium 2-chloronaphthalene-1-sulfonate, methyl 2-chloronaphthalene-1-sulfonate, ethyl 2-chloronaphthalene-1-sulfonate, 2-chloronaphthalene-1-sulfonate propyl ester, 2-chloronaphthalene-1-sulfonic acid isobutyl ester, 2-chloronaphthalene-1-sulfonic acid (2,2-dimethylpropyl ester), 2_·chloronaphthalene Cyclohexyl-1-sulfonate, 2-chloro-1-naphthoic acid, methyl 2-chloro-1-naphthoate, ethyl 2-chloro-1-naphthoate, 2- -1-Minylnaphthalene, 2-chloro-b-ethenylnaphthalene, 2-chloro-1-benzoylnaphthalene, 2,5-dichloro-1-benzylidene naphthalene, 2-chloro-1 -trifluoromethylnaphthalene, 2-chloro-l-nitroguanidine, 2-chloroindole-1-sulfonic acid, lithium 2-chloroindole-1-sulfonate, sodium 2-chloroindole-1-sulfonate, Potassium 2-chloroindole-1-sulfonate, methyl 2-chloroindole-1-sulfonate, ethyl 2-chloroindole-1-sulfonate, propyl 2-chloroindole-1-sulfonate, 2-chloro蒽-1_ isobutyl sulfonate, 2-chloroindole-1-sulfonic acid (2,2-dimethylpropyl), 2-chloroindole-1-sulfonic acid cyclohexyl ester, 2-chloroindole-1 -carboxylic acid, methyl 2-chloroindole-1-carboxylate, ethyl 2-chloroindole-1-carboxylate, 2-chloro-1-methylindenylhydrazine, 2-chloro-1-ethylindenylhydrazine, 2-Chloro-1-benzylidene hydrazide, 2,5-dichloro-1-benzylidene hydrazine, 2-chloro-1-trifluoromethyl hydrazine, 2-chloro-1-nitroindole, 2 -Chloroindole-1-sulfonic acid, lithium 2-chloroindole-1-sulfonate·· -25- 201223930 Sodium 2-chloroindole-1-sulfonate, potassium 2-chloroindole-1-sulfonate, 2-chloro Methyl 芘-1-sulfonate, ethyl 2-chloroindole-1-sulfonate, propyl 2-chloroindole-1-sulfonate, isobutyl 2-chloroindole-1-sulfonate, 2-chloroindole 1-sulfonic acid (2,2-dimethylpropyl), 2-chloroindole-1-sulfonic acid cyclohexyl ester, 2-chloroindole-1-carboxylic acid, 2-chloro-1-indolecarboxylic acid A Ester, 2-chloro-1-pyrene Ethyl acetate, 2-chloro-1-methylindenyl hydrazine, 2-chloro-1-ethenyl hydrazine, 2-chloro-1-benzylidene hydrazine, 2-chloro-1-trifluoromethyl hydrazine, 2-Chloro-1-nitroindole, 2-chloroindole-.1-sulfonic acid, lithium 2-chloroindole-1-sulfonate, sodium 2-chloroindole-1-sulfonate, 2-chloroindole- 1- Potassium sulfonate, methyl 2-chloroindole-1-sulfonate, ethyl 2-chloroindole-1-sulfonate, propyl 2-chloroindole-1-sulfonate, 2-chloroindole-1-sulfonic acid Butyl ester, 2-chloroindole-1-sulfonic acid (2,2-dimethylpropyl), 2-chloroindole-1-sulfonic acid cyclohexyl ester, 2-chloroindole-1-carboxylic acid, 2-chloro Methyl thin-1-carboxylate, ethyl 2-chloroindole-1-carboxylate, 2-chloro-1-methylindenyl hydrazine, 2-chloro-1-ethylindenyl hydrazine, 2-chloro-1-benzene Methyl hydrazide, 2-chloro-1-trifluoromethyl hydrazine, 2-chloro-1-nitro-9,9'- hydrazine, 2-chloro-1-sulfo-9,9'- hydrazine , 2-Chloro-9,9'-bifluorene-sulfonic acid lithium, 2-chloro-9,9'-biindole-sodium sulfonate, 2-chloro-9,9'-bi-p-sulfonic acid potassium, 2 -Chloro-9,9'-biindole-sulfonic acid methyl ester, 2-chloro-9,9'-bifluorene-sulfonic acid ethyl ester, 2-chloro-9,9'-bifluorene-sulfonic acid propyl ester, 2-Chloro-9,9'-biindole-isobutyl sulfonate, 2-chloro-9,9'-biindole-sulfonic acid (2,2-dimethylpropyl), 2-chloro-9, 9'-bifluorene-cyclohexyl sulfonate, 2-chloro-1-carboxy-9,9'-linked , 2-chloro-1-methylindolyl-9,9'-biguanidine, 2-chloro-1-ethenyl-9,9'-biguanidine, 2-chloro-1-benzhydryl-yl, 9'-biguanidine, 2-chloro-1-trifluoromethyl_9,9,-bifluorene, 2-chloro-1-nitrophenanthrene, 2-chlorophenan-1-sulfonic acid, 2-chlorophenanol- Lithium 1-sulfonate, sodium 2-chlorophenanthrene-1-sulfonate, potassium 2-chlorophenan-1-sulfonate, methyl 2-chlorophenan-1-sulfonate, 2-chlorophenan-1-sulfonic acid Ester, 2-chlorophenanthrene-1-sulfonate, 2-chlorophenan-1-sulfo-26- 201223930 isobutyl acrylate, 2-chlorophenan-1-sulfonic acid (2,2-dimethylpropyl ester) ), 2-chlorophenan-1-sulfonic acid cyclohexyl ester, 2-chlorophenan-1-carboxylic acid, 2-chloro-1-methylpyridyl phenanthrene, 2-chloro-1-ethenyl phenanthrene, 2-chloro 1-benzylidene phenanthrene, 2-chloro-1-trifluoromethylphenanthrene, 2-chloro-1-nitroindole, 2-chloroindole-1-sulfonic acid, 2-chloroindole-1-sulfonic acid Lithium, sodium 2-chloroindole-1-sulfonate, potassium 2-chloroindole-1-sulfonate, methyl 2-chloroindole-1-sulfonate, ethyl 2-chloroindole-1-sulfonate, 2- Propyl chlorophenan-1-sulfonate, 2-chloroindole-]-isobutyl sulfonate, 2-chloroindole-1-sulfonic acid (2,2-dimethylpropyl), 2-chloroindole-1 - cyclohexyl sulfonate, 2-chloroindole-1-carboxylic acid, 2-chloro-1-methylindenyl hydrazine, 2-chloro-1-ethylindenyl hydrazine, 2-chloro-1-benzhydryl hydrazine 2-chloro-1-trifluoromethyl hydrazine, 2-chloro 1-nitrobenzophenanthrene, 2-chlorobenzophenanthrene-1-sulfonic acid, lithium 2-chlorobenzophenanthrene-1-sulfonate, sodium 2-chlorobenzophenanthrene-1-sulfonate, 2-chloro Potassium benzophenanthrene-1-sulfonate, methyl 2-chlorobenzophenan-1-sulfonate, ethyl 2-chlorobenzophenan-1-sulfonate, 2-chlorobenzophenanthrene-1-sulfonate Ester, isobutyl 2-chlorobenzophenanthrene-1-sulfonate 2-chlorobenzophenanthrene-1-sulfonic acid (2,2-dimethylpropyl), 2-chlorobenzophenanthrene-1-sulfonate Cyclohexyl ester, 2-chlorobenzophenan-1-carboxylic acid, methyl 2-chlorobenzophenan-1-carboxylate, ethyl 2-chlorobenzophenan-1-carboxylate, 2-chloro-1 -Methylmercaptobenzophenanthrene, 2-chloro-1-ethinylbenzophenanthrene, 2-chloro-1-benzoguanidinobenzophenanthrene, 2-chloro-1-trifluoromethylbenzophenanthrene, 2 -Chloro-1-nitronaphthacene, 2-chloronaphthene-1-sulfonic acid, lithium 2-chloronaphthene-1-sulfonate, sodium 2-chloronaphthene-1-sulfonate, 2 - Potassium chloronaphthyl-1-sulfonate, methyl 2-chloronaphthyridin-1-sulfonate, ethyl 2-chloronaphthoquinone-1-sulfonate, 2-chloronaphthene-1-sulfonate Acid propyl ester, 2-chloronaphthene-1-sulfonate isobutyl ester, 2-chloronaphthene-1-sulfonic acid (2,2-dimethylpropyl), 2-chloronaphthene-1 - cyclohexyl sulfonate, 2-chloronaphthene-1-carboxylic acid, methyl 2-chloronaphthacene-1-carboxylate, 2--27-20122 3930 ethyl chloronaphthyl-1-carboxylate, 2-chloro-1-methylindolyl benzophenone, 2-chloro-1-ethenylnaphthacene, 2-chloro-1-benzylidene naphthalene Acetylene, 2-chloro-1-trifluoromethylnaphthacene, 2-chloro-1-nitropentacene, 2-chloropentacene-1-sulfonic acid, 2-chloropentacene-1- Lithium sulfonate, sodium 2-chloropentacene-1-sulfonate, potassium 2-chloropentacene-1-sulfonate, methyl 2-chloropentacene-1-sulfonate, 2-chloropentacene Ethyl-1-sulfonate, 2-chloropenta-benzene-1-sulfonate, 2-chloropentacene-1-sulfonate isobutyl ester, 2-chloropentacene-1-sulfonic acid (2 ,2-dimethylpropyl ester), 2-chloropentacene-1-sulfonic acid cyclohexyl ester, 2-chloropentacene-1-carboxylic acid, 2-chloropentacene-1-carboxylic acid methyl ester , 2-chloropentacene-1-carboxylic acid ethyl ester, 2-chloro-1-methylindolo pentacene, 2-chloro-1-ethenyl pentacene, 2-chloro-1-benzamide Pentacene, 2-chloro-1-trifluoromethyl pentacene, 2-chloro-1-nitrotripterin (triptycene), 2-chlorotripterin-1-acid, 2-chlorotri Lithium pterene-1-sulfonate, sodium 2-chlorotripycenes-1-sulfonate, potassium 2-chlorotripadene-1-sulfonate, methyl 2-chlorotripadene-1-sulfonate, 2 -Chloricopyran-1-sulfonate ethyl ester, 2-chlorotriptycee-1-sulfonate propyl ester, 2-chlorotripter Isobutyl 1-sulfonate, 2-chlorotriptycee-1-sulfonic acid (2,2-dimethylpropyl), 2·chlorotridecene-1-sulfonic acid cyclohexyl ester, 2-chloro Triptycene-1-carboxylic acid, methyl 2-chlorotripycenes-1-carboxylate, ethyl 2-chlorotripycenes-1-carboxylate, 2-chloro-1-methyldecyl triptycene, 2-Chloro-1-ethenyl triptycene, 2-chloro-1-benzylidene triptycene, 2-chloro-1-trifluoromethyl triptycene, 2-chloro-3-nitropyridine , 2-chloropyridine-3-sulfonic acid, lithium 2-chloropyridine-3-sulfonate, sodium 2-chloropyridine-3-sulfonate, potassium 2-chloropyridine-3-sulfonate, 2-chloropyridine-3 -methyl sulfonate, ethyl 2-chloropyridine-3-sulfonate, 2-chloropyridine-3-sulfonic acid -28-201223930 propyl ester, 2-chloropyridine-3-sulfonic acid isobutyl ester, 2-chloro Pyridine-3-sulfonic acid (2,2-dimethylpropyl), 2-chloropyridine-3-sulfonic acid cyclohexyl ester, 2-chloropyridine-3-carboxylic acid, 2-chloropyridine-3-carboxylic acid Methyl ester, ethyl 2-chloropyridine-3-carboxylate, 2-chloroindole-methylpyridylpyridine, 2-chloro-3-acetylpyridylpyridine, 2-chloro-3-benzylidenepyridine, 2- Chloro-3-trifluoromethylpyridine, 2-chloro-3.nitrofuran, 2-chlorofuran-3-sulfonic acid, lithium 2-chlorofuran-3-sulfonate, 2-chlorofuran-3-sulfonic acid Sodium, potassium 2-chlorofuran-3-sulfonate, 2-chlorofur Methyl m--3-sulfonate, ethyl 2-chlorofuran-3-sulfonate, propyl 2-chlorofuran-3-sulfonate, isobutyl 2-chlorofuran-3-sulfonate, 2-chlorofuran 3-sulfonic acid (2,2-dimethylpropyl), 2-chlorofuran-3-sulfonic acid cyclohexyl ester, 2-chlorofuran-3-carboxylic acid, 2-chlorofuran-3-carboxylic acid A Ester, ethyl 2-chlorofuran-3-carboxylate, 2-chloro-3-methylmercaptofuran, 2-chloro-3-ethylmercaptofuran, 2-chloro-3-benzylidenefuran, 2- Chloro-3-trifluoromethylfuran, 2-chloro-3-nitrothiophene, 2-chlorothiophene-3-sulfonic acid, lithium 2-chlorothiophene-3-sulfonate, 2-chlorothiophene-3-sulfonic acid Sodium, potassium 2-chlorothiophene-3-sulfonate, methyl 2-chlorothiophene-3-sulfonate, ethyl 2-chlorothiophene-3-sulfonate, propyl 2-chlorothiophene-3-sulfonate, 2 -chlorothiophene-3-sulfonate isobutyl ester, 2-chlorothiophene-3-sulfonic acid (2,2-dimethylpropyl), 2-chlorothiophene-3-sulfonic acid cyclohexyl ester, 2-chlorothiophene 3-carboxylic acid, methyl 2-chlorothiophene-3-carboxylate, ethyl 2-chlorothiophene-3-carboxylate, 2-chloro-3-methylsulfonylthiophene, 2-chloro-3-ethylhydrazine Thiophene, 2-chloro-3-benzylidenethiophene, 2-chloro-3-trifluoromethylthiophene, 7-chloro-6-nitrobenzothiadiazole, 7-chlorobenzothiadiazole-6 -sulfonic acid, 7-chlorobenzothiadiazole-6- Lithium acid, sodium 7-chlorobenzothiadiazole-6-sulfonate, potassium 7-chlorobenzothiadiazole-6-sulfonate, methyl 7-chlorobenzothiadiazole-6-sulfonate-29 - 201223930, ethyl 7-chlorobenzothiadiazole-6-sulfonate, propyl 7-chlorobenzothiadiazole-6-sulfonate, isobutyl 7-chlorobenzothiadiazole-6-sulfonate Ester, 7-chlorobenzothiadiazole-6-sulfonic acid (2,2-dimethylpropyl), 7-chlorobenzothiadiazole-6-sulfonic acid cyclohexyl ester, 7-chlorobenzothiazide Diazole-6-carboxylic acid, methyl 7-chlorobenzothiadiazole-6-carboxylate, ethyl 7-chlorobenzothiadiazole-6-carboxylate, 7-chloro-6-methylnonylbenzene Thiadiazole, 7-chloro-6-ethylmercaptobenzothiadiazole, 7-chloro-6-benzhydrylbenzothiadiazole, 7-chloro-6-trifluoromethylbenzothiazepine Oxazole, 2-chloro-3-nitropyrrole, 2-chloropyrrole-3-sulfonic acid, lithium 2-chloropyrrole-3-sulfonate, sodium 2-chloropyrrole-3-sulfonate, 2-chloropyrrole-3 - potassium sulfonate, methyl 2-chloropyrrole-3-sulfonate, ethyl 2-chloropyrrole-3-sulfonate, propyl 2-chloropyrrole-3-sulfonate, 2-chloropyrrole-3-sulfonate Isobutyl acrylate, 2-chloropyrrole-3-sulfonic acid (2,2-dimethylpropyl), 2-chloropyrrole-3-sulfonic acid cyclohexyl ester, 2-chloropyrrole-3-carboxylic acid, 2 -Chloropyrrol-3-carboxylate, 2-chloro Ethyl 3-carboxylic acid, 2-chloro-3-methylpyridylpyrrole, 2-chloro-3-ethinylpyrrole, 2-chloro-3-benzylidenepyrrole, 2-chloro-3-tri Fluoromethylpyrrole, 2-chloro-3-nitrosporphyrin, 2-chlorosporin-3-sulfonic acid, lithium 2-chloroquinoline-3-sulfonate, sodium 2-chloroquinoline-3-sulfonate, 2 - chloroquinoline-3-sulfonate potassium, 2-chloroquinoline-3-sulfonic acid methyl ester, 2-chloroquinoline-3-sulfonic acid ethyl ester, 2-chloroquinoline-3-sulfonic acid propyl ester, 2-chloroquinoline Isobutyl -3-sulfonate, 2-chloroquinoline-3-sulfonic acid (2,2-dimethylpropyl), 2-chloroquinoline-3-sulfonic acid cyclohexyl ester, 2-chloroquinoline-3- Carboxylic acid, methyl 2-chloroquinoline-3-carboxylate, ethyl 2-chloroquinoline-3-carboxylate, 2-chloro-3-methylindolylquinoline, 2-chloro-3-ethenylquinoline , 2-chloro-3-benzylidenequinoline, 2-chloro-3-trifluoromethylquinoline, 2-chloro-3-nitroindole, 2-chlorosporin-3-propionic acid , 2-Chloroindole-30- 201223930 Lithium phthalate-3-sulfonate, sodium 2-chloroquinoxaline-3-sulfonate, potassium 2-chloroquinoxaline-3-sulfonate, 2-chlorosporphyrin-3 - methyl sulfonate, ethyl 2-chloroquinoxaline-3-sulfonate, 2-chloroquinoxaline-3-sulfonate propyl ester, 2-chloroquinoxaline-3-sulfonate isobutyl ester, 2-chloroquinoline Porphyrin-3-sulfonic acid (2,2-dimethylpropyl) 2-Chloroporphyrin-3-sulfonic acid cyclohexyl ester, 2-chloroquinoxaline-3-carboxylic acid, 2-chlorosupporin-3-carboxylic acid methyl ester, 2-chloroquinoxaline-3-carboxylic acid Ethyl ester, 2-chloro-3-methylindolyl quinoxaline, 2-chloro-3-ethylhydrazinoquinoxaline, 2-chloro-3-benzylidene quinoxaline, 2-chloro-3-tri Fluoromethylquinoxaline, 4-chloro-5-nitropyrimidine, 4-chloropyrimidine-5-sulfonic acid, lithium 4-chloropyrimidine-5-sulfonate, sodium 4-chloropyrimidine-5-sulfonate, 4 - chloropyrimidine-5-sulfonate, 4-chloropyrimidine-5-sulfonic acid methyl ester, 4-chloropyrimidine-5-sulfonic acid ethyl ester, 4-chloropyrimidine-5-sulfonic acid propyl ester, 4-chloropyrimidine -5-isobutyl sulfonate, 4-chloropyrimidine-5-sulfonic acid (2,2-dimethylpropyl) ' 4-chloropyrimidine-5-sulfonic acid cyclohexyl ester, 4-chloropyrimidine-5- Carboxylic acid, methyl 4-chloropyrimidine-5-carboxylate, ethyl 4-chloropyrimidine-5-carboxylate, 4-chloro-5-methylpyridylpyrimidine, 4-chloro-5-ethenylpyrimidine, 4 -Chloro-5-benzimidylpyrimidine, 4-chloro-5-trifluoromethylpyrimidine, 2-chloro-3-nitropyrazine, 2-chloropyrazine-3-sulfonic acid, 2-chloropyrazine Lithium-3-sulfonate, sodium 2-chloropyrazine-3-sulfonate, potassium 2-chloropyrazine-3-sulfonate, methyl 2-chloropyrazin-3-sulfonate, 2-chloropyrazine- Ethyl 3-sulfonate, 2-chloropyrazine-3-sulfonate propyl 2-chloropyrazine-3- Isobutyl sulfonate, 2-chloropyrazine-3-sulfonic acid (2,2-dimethylpropyl), 2-chloropyrazine-3-sulfonic acid cyclohexyl ester, 2-chloropyrazine-3- Carboxylic acid, methyl 2-chloropyrazine-3-carboxylate, ethyl 2-chloropyrazine-3-carboxylate, 2-chloro-3.methylpyridylpyrazine, 2-chloro-3-ethenyl Pyrazine, 2-chloro-3-benzylidylpyrazine, 2-chloro-3-trifluoromethylpyrazine. -31 - 201223930 Among them, a compound represented by the formula (3) (hereinafter referred to simply as a compound (3)) is preferred:
CiCi
(式中,R1、R2及R3各獨立表示氫原子、鹵素原子、可具 有由下述G群選出之基之碳數1〜2 0之烷基、可具有由下述 G群選出之基之碳數卜2 0之烷氧基、可具有由下述G群選 出之基之碳數6〜2 0之芳基、可具有由下述G群選出之基之 碳數6~2 0之芳氧基、可具有由下述G群選出之基之碳數 7〜2 0之芳烷基、可具有由下述G群選出之基之碳數7~2 0之 芳烷氧基、或具有可具有由下述G群選出之基之碳數卜2 0 之烴基之胺基, R4表示氫原子、可具有由下述G群選出之基之碳數 1〜2 0之烷基、可具有由下述G群選出之基之碳數1~2 0之烷 氧基、可具有由下述G群選出之基之碳數6〜2 0之芳基、可 具有由下述G群選出之基之碳數6〜2 0之芳氧基、可具有由 下述G群選出之基之碳數7~2 0之芳烷基、可具有由下述〇 群選出之基作爲取代基之碳數7〜20之芳烷氧基、或具有可 具有由下述G群選出之基之碳數1〜20之烴基之胺基’又’ 分別鍵結於鄰接之碳原子上之R1與R2、R2與R3、或r3與r4 可與分別所鍵結之碳原子一起形成環,E表示拉電子基’ [G群] -32- 201223930 氟原子;氰基;碳數1〜12之烷氧基;碳數6〜12之芳基 ;及碳數6~12之芳氧基)。 化合物(3)之以E表示之拉電子基較好爲硝基(-N02)、 以式(5)表示之基。化合物(3)之具體例列舉爲2-氯-1-硝基 苯、2-氯-1-苯磺酸或其金屬鹽、2-氯-苯甲酸或其金屬鹽 、2-氯-1-苯磺酸甲酯及2-氯-苯甲酸甲酯。 化合物(1)之偶合反應中,如前述,拉電子基之鄰位 上具有氯原子之化合物(1)之氯原子之特徵爲即使在較低 之溫度下,仍可參與偶合反應。藉由活用該特徵,可製造 位置選擇之聯芳基化合物(2)。至於化合物(1)使用以式(1) 表示之化合物(以下簡稱爲化合物(10))時,(wherein R1, R2 and R3 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms which may have a group selected from the following G group, and may have a group selected from the following G group; An alkoxy group having a carbon number of 2, and an aryl group having a carbon number of 6 to 20 selected from the group of the following G group, and having a carbon number of 6 to 2 0 selected from the group of the following G group The oxy group may have an aralkyl group having 7 to 20 carbon atoms selected from the group consisting of the following group G, and an aralkyloxy group having 7 to 20 carbon atoms which may have a group selected from the group G below, or An amine group which may have a hydrocarbon group of a carbon number selected from the group G, and R4 represents a hydrogen atom, may have an alkyl group having a carbon number of 1 to 20 selected from the group of the following G group, and may have The alkoxy group having 1 to 20 carbon atoms selected from the group G, and the aryl group having 6 to 20 carbon atoms which may be selected from the group G, may be selected from the group G below. An aryloxy group having 6 to 20 carbon atoms, a aralkyl group having 7 to 20 carbon atoms which may be selected from the group G, and a carbon which may have a substituent selected from the group of the following groups a 7 to 20 aralkyloxy group, or having a group selected from the group G below The amine group of the hydrocarbon group having 1 to 20 carbon atoms is further bonded to the adjacent carbon atom, and R1 and R2, R2 and R3, or r3 and r4 may form a ring together with the carbon atom to be bonded, respectively. The electron-forming group '[G group] -32- 201223930 fluorine atom; cyano group; alkoxy group having 1 to 12 carbon atoms; aryl group having 6 to 12 carbon atoms; and aryloxy group having 6 to 12 carbon atoms). The electron withdrawing group represented by E in the compound (3) is preferably a nitro group (-N02) and a group represented by the formula (5). Specific examples of the compound (3) are 2-chloro-1-nitrobenzene, 2-chloro-1-benzenesulfonic acid or a metal salt thereof, 2-chloro-benzoic acid or a metal salt thereof, and 2-chloro-1- Methyl benzenesulfonate and methyl 2-chloro-benzoate. In the coupling reaction of the compound (1), as described above, the chlorine atom of the compound (1) having a chlorine atom in the ortho position of the electron withdrawing group is characterized in that it can participate in the coupling reaction even at a lower temperature. By utilizing this feature, a position-selective biaryl compound (2) can be produced. When the compound (1) is a compound represented by the formula (1) (hereinafter referred to simply as the compound (10)),
(式中,Y表示與前述相同之義,R1()各獨立表示氟原子、 可具有由前述G群選出之基之碳數1〜20之烷基、可具有由 前述G群選出之基之碳數1~2 0之烷氧基、可具有由前述G 群選出之基之碳數6〜2 0之芳基、可具有由前述G群選出之 基之碳數6〜2 0之芳氧基、可具有由前述G群選出之基之碳 數2〜20之醯基或氰基,k表示〇〜3之整數,又,分別鍵結於 鄰接之碳原子之兩個R1G可經鍵結,與其等所鍵結之碳原 子一起形成環),相對於爲拉電子基的「-S〇3-Y」爲鄰位 之氯原子相較於相對於「-S03-Y」爲間位之氯原子,在偶 -33- 201223930 合反應中具有更高之反應性,藉由該反應性之差異,而獲 得以式(1 1)表示之聯芳基化合物(以下簡稱爲聯芳基化合 物(11)): 〇~ γ :s=o(wherein Y represents the same meaning as defined above, and R1() each independently represents a fluorine atom, may have an alkyl group having 1 to 20 carbon atoms selected from the group of the above G group, and may have a group selected from the aforementioned G group. An alkoxy group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms which may be selected from the group G, and an aromatic oxygen having 6 to 20 carbon atoms which may be selected from the group G The base may have a fluorenyl group or a cyano group having a carbon number of 2 to 20 selected from the group G, and k represents an integer of 〇~3, and further, two R1Gs respectively bonded to adjacent carbon atoms may be bonded. , which forms a ring together with the carbon atom to which it is bonded, and is a meta atom relative to the "-S03-Y" which is an electron-based group. The chlorine atom has a higher reactivity in the coupling of the -33 to 201223930, and the biaryl compound represented by the formula (1 1) (hereinafter referred to as a biaryl compound) is obtained by the difference in reactivity. 11)): 〇~ γ :s=o
GIGI
(式中’ R1()、γ及k表示與前述相同之意義)。 化合物(10)較佳之例,與所得聯芳基化合物(1 1)示於 下表1。 [表1] 化合物(10) 聯芳基化合物(11) 2,5-二氯苯磺酸鈉 4,4’-二氯-2,2’-聯苯二磺酸一鈉 2,5-二氯苯磺酸鋰 4,4’-二氯-2,2’-聯苯一磺酸一鋰 2,5-二氯苯磺酸(2,2-二甲基丙醋) 4,4’-二氯-2,2’_聯苯一磺酸一(2,2-二甲基丙酯) 又’至於化合物(1),可使用以式(12)表示之化合物:(wherein 'R1(), γ, and k represent the same meaning as described above). Preferred examples of the compound (10) and the obtained biaryl compound (1 1) are shown in Table 1 below. [Table 1] Compound (10) Biaryl compound (11) Sodium 2,5-dichlorobenzenesulfonate 4,4'-Dichloro-2,2'-biphenyldisulfonic acid monosodium 2,5-di Lithium chlorobenzenesulfonate 4,4'-dichloro-2,2'-biphenyl monosulfonic acid monolithium 2,5-dichlorobenzenesulfonic acid (2,2-dimethylpropyl vinegar) 4,4'- Dichloro-2,2'-biphenyl monosulfonic acid mono(2,2-dimethylpropyl ester) Further, as for the compound (1), a compound represented by the formula (12) can be used:
(式中’ R1()及k表示與前述相同之義),製造以式(13)表示 之聯芳基化合物: -34- 201223930(wherein R1() and k are the same as defined above), and a biaryl compound represented by the formula (13) is produced: -34- 201223930
(式中’ R1Q及k表示與前述相同之義)。 依據本發明’化合物(1)所含之Ar即使爲具有芳香族 性之雜環基(但’該雜環基可具有取代基)仍可進行偶合反 應。 至於Ar爲具有芳香族性之雜環基(但,該雜環基可具 有取代基)之化合物(1)較好爲Ar所含之雜原子與鍵結於C1 之Ar之碳原子直接鍵結而成之含有雜環基之化合物。具體 而言,列舉爲以式(7)表示之化合物_·(wherein R1Q and k represent the same meaning as described above). According to the present invention, the Ar contained in the compound (1) can be subjected to a coupling reaction even if it is an aromatic heterocyclic group (but the heterocyclic group may have a substituent). The compound (1) wherein Ar is an aromatic heterocyclic group (however, the heterocyclic group may have a substituent) is preferably a direct bond of a hetero atom contained in Ar to a carbon atom bonded to Ar of C1. A compound containing a heterocyclic group. Specifically, it is listed as a compound represented by the formula (7).
(式中,R11及R12各獨立表示氫原子、鹵素原子、可具有 由前述G群選出之基之碳數1〜2 0之烷基、可具有由前述G 群選出之基之碳數1〜20之烷氧基、可具有由前述G群選出 之基之碳數6~2 0之芳基、可具有由前述G群選出之基之碳 數6〜20之芳氧基、可具有由前述G群選出之基之碳數7〜2 0 之芳烷基、可具有由前述G群選出之基之碳數7〜2 0之芳烷 氧基、或具有可具有由前述G群選出之基之碳數1〜20之烴 基之胺基| R14表示氫原子、可具有由前述G群選出之基之碳數 1〜2 0之烷基、可具有由前述G群選出之基之碳數1~20之烷 -35- 201223930 氧基、可具有由前述G群選出之基之碳數6〜20之芳基、可 具有由前述G群選出之基之碳數6〜2 0之芳氧基、可具有由 前述G群選出之基之碳數7〜2 0之芳烷基、可具有由前述G 群選出之基之碳數7〜2 0之芳烷氧基、或具有可具有由前述 G群選出之基之碳數1〜20之烴基之胺基,又,分別鍵結於 鄰接之碳原子上之R11與R12、或R12與R14可與各鍵結之碳 原子一起形成環,A表示氧原子或硫原子)。 藉由使以式(7)表示之化合物進行偶合反應,可製造 以式(8)表示之聯芳基化合物:(wherein R11 and R12 each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms which may be selected from the group G, and may have a carbon number of 1 selected from the group G; An alkoxy group of 20, an aryl group having 6 to 20 carbon atoms which may be selected from the group G, and an aryloxy group having 6 to 20 carbon atoms which may be selected from the group G, may have the above-mentioned The aralkyl group having a carbon number of 7 to 20 selected from the group G, may have an aralkoxy group having 7 to 20 carbon atoms selected from the group of the G group, or may have a group selected from the group G The amine group of the hydrocarbon group having 1 to 20 carbon atoms| R14 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a group selected from the above G group, and a carbon number which may have a group selected from the above G group ~20-alkane-35-201223930 oxy group, an aryl group having 6 to 20 carbon atoms which may have a group selected from the above G group, and an aryloxy group having 6 to 20 carbon atoms which may have a group selected from the above G group And an aralkyl group having 7 to 20 carbon atoms selected from the group of the G group, an aralkoxy group having 7 to 20 carbon atoms which may be selected from the group G, or having the aforementioned The basis of the G group The amine group of a hydrocarbon group having 1 to 20 carbon atoms, and R11 and R12 respectively bonded to adjacent carbon atoms, or R12 and R14 may form a ring together with each bonded carbon atom, and A represents an oxygen atom or a sulfur atom. ). The biaryl compound represented by the formula (8) can be produced by subjecting a compound represented by the formula (7) to a coupling reaction:
(式中,A、R11、R12及R14分別表示與前述相同之意義)》 藉由偶合反應獲得之聯芳基化合物(2)亦可進一步經 純化。聯芳基化合物(2)可藉由在進行偶合反應後,自金 屬銅、銅鹽、未反應之化合物(1)等未反應物及溶劑中分 離純化所生成之聯芳基化合物(2)而獲得。該分離純化可 自過濾、萃取、濃縮、再結晶、再沉澱、層析分離之習知 純化手段,依據前述未反應物之種類、或成爲分離純化對 象之聯芳基化合物(2)之種類而適當選擇最適合之手段。 實施例 以下以實施例更詳細說明本發明。 以下實施例中,利用局速液體層析(L C)或氣相層析 201223930 (G C)分析偶合反應後生成之聯芳基化合物(2),基於所得 層析面積値計算出收率。 LC分析之分析條件如下: <分析條件> LC測定裝置 :LC-10AT(島津製作所股份有限公司 製造) 管柱 :L -管柱 ODS(5pm,4.6mm<^xl5cm)(wherein, A, R11, R12 and R14 respectively have the same meanings as defined above). The biaryl compound (2) obtained by the coupling reaction can be further purified. The biaryl compound (2) can be obtained by separating and purifying the biaryl compound (2) formed from a copper metal, a copper salt, an unreacted compound (1), and the like, and a solvent, after the coupling reaction. obtain. The separation and purification can be carried out by filtration, extraction, concentration, recrystallization, reprecipitation, and chromatographic separation, depending on the type of the unreacted product or the type of the biaryl compound (2) to be isolated and purified. Choose the most suitable means. EXAMPLES Hereinafter, the present invention will be described in more detail by way of examples. In the following examples, the biaryl compound (2) formed after the coupling reaction was analyzed by means of liquid chromatography (L C) or gas chromatography 201223930 (G C), and the yield was calculated based on the obtained chromatographic area 値. The analysis conditions of the LC analysis were as follows: <Analytical conditions> LC measuring device: LC-10AT (manufactured by Shimadzu Corporation) Column: L-column ODS (5 pm, 4.6 mm < ^ xl 5 cm)
管柱溫度 :40°C 移動相 : A : 0· 1 %溴化四丁基銨水溶液 B : 〇· 1 %溴化四丁基銨乙腈溶液 梯度: Omin B = 3 0 % 20min B = 9 Ο % 3 5min Β = 9 Ο % 3 5 . 1 m i η Β = 3 Ο % 45min 停止 總分析時間 45分鐘 流量:1 .OmL/分鐘 偵測:紫外線吸收(波長:254nm) GC分析之分析條件如下: <分析條件> GC測定裝置:GC-2010A(島津製作所股份有限公司製 管柱:J&W DB-17Ol(O.32mm0 x30m,Ι.Ομηι) -37- 201223930 管柱溫度:50°c(保持〇分鐘)+ (以l〇°C/分鐘升溫 )">150°C (保持〇分鐘)+ (以20°C/分鐘升溫)4280°C (保持8分 鐘) 總分析時間 24.5分鐘 注入口溫度:2 5 0〇C,偵測器溫度:2 5 0°C(FID,範圍 1 01) 載氣:He(流速約2.3mL/分鐘) 注入口壓力:75.2kPa(控制模式壓力) 分流比:全流量 55.9mL/分鐘(分流比約1/22)Column temperature: 40 ° C Mobile phase: A : 0 · 1 % tetrabutylammonium bromide aqueous solution B : 〇 · 1 % tetrabutylammonium bromide solution gradient: Omin B = 3 0 % 20 min B = 9 Ο % 3 5min Β = 9 Ο % 3 5 . 1 mi η Β = 3 Ο % 45min Stop total analysis time 45 minutes Flow rate: 1.0 mL/min Detection: UV absorption (wavelength: 254 nm) The analytical conditions for GC analysis are as follows: <Analytical conditions> GC measuring device: GC-2010A (manufactured by Shimadzu Corporation: J&W DB-17Ol (O.32mm0 x 30m, Ι.Ομηι) -37- 201223930 Column temperature: 50°C (keep 〇 minute) + (heating at l〇°C/min)">150°C (keep 〇min)+ (warm at 20°C/min) 4280°C (for 8 minutes) Total analysis time 24.5 Minute inlet temperature: 2 5 0 〇 C, detector temperature: 2 5 0 ° C (FID, range 1 01) Carrier gas: He (flow rate about 2.3 mL / min) Injection pressure: 75.2 kPa (control mode pressure Split ratio: full flow 55.9mL / min (split ratio about 1/22)
注入量:1 pLInjection volume: 1 pL
[實施例1][Example 1]
混合2,5-二氯苯磺酸鈉0.8(^、粉末狀金屬銅0.41§、 碘化銅(I)〇.〇31g、N,N,N’,N’-四甲基乙二胺0.019g及N-甲 基-2-吡咯烷酮4. Og。所得混合物邊維持在氮氣氛圍,邊升 溫至100 °C。直接維持在氮氣氛圍下,在100 °C攪拌該混合 物4小時,獲得含有4,4’-二氯-2,2’-聯苯二磺酸二鈉之反應 混合物。冷卻後,取樣反應混合物之一部分,進行前述 LC分析,算出4,4’-二氯-2,2’-聯苯二磺酸二鈉之收率。收 率:98%。 [實施例2] -38- 201223930 2 ClMixing sodium 2,5-dichlorobenzenesulfonate 0.8 (^, powdered metal copper 0.41 §, copper iodide (I) 〇. 〇 31 g, N, N, N', N'-tetramethylethylenediamine 0.019 g and N-methyl-2-pyrrolidone 4. Og. The obtained mixture was heated to 100 ° C while maintaining a nitrogen atmosphere. The mixture was directly maintained under a nitrogen atmosphere, and the mixture was stirred at 100 ° C for 4 hours to obtain a content of 4, a reaction mixture of 4'-dichloro-2,2'-diphenyldisulfonic acid disodium. After cooling, a portion of the reaction mixture was sampled and subjected to the aforementioned LC analysis to calculate 4,4'-dichloro-2,2'- Yield of disodium diphenyl disulfonate. Yield: 98% [Example 2] -38- 201223930 2 Cl
混合2,5-二氯苯磺酸鈉0.8(^、粉末狀金屬銅0.41§、 碘化銅(I)〇.031g、2,2’-聯吡啶0.025g及N-甲基-2-吡咯烷 酮4.0g。所得混合物邊維持在氮氣氛圍,邊升溫至10〇°C 。直接維持在氮氣氛圍下,在100 °C攪拌該混合物4小時’ 獲得含有4,4’-二氯-2,2’-聯苯二磺酸二鈉之反應混合物。 冷卻後,取樣反應混合物之一部分,進行前述LC分析’ 算出4,4’-二氯-2,2’-聯苯二磺酸二鈉之收率。收率:96% [實施例3 ]Mixing sodium 2,5-dichlorobenzenesulfonate 0.8 (^, powdered metal copper 0.41 §, copper iodide (I) 〇.031 g, 2,2'-bipyridine 0.025 g and N-methyl-2-pyrrolidone 4.0 g. The obtained mixture was heated to 10 ° C while maintaining a nitrogen atmosphere. The mixture was directly maintained under a nitrogen atmosphere, and the mixture was stirred at 100 ° C for 4 hours to obtain 4,4'-dichloro-2,2'. - a reaction mixture of disodium diphenyl disulfonate. After cooling, sample one part of the reaction mixture and perform the aforementioned LC analysis' to calculate the yield of disodium 4,4'-dichloro-2,2'-biphenyldisulfonate Yield: 96% [Example 3]
2 C1~^~C1 S03Na 混合2,5-二氯苯磺酸鈉0.5(^、粉末狀金屬銅〇.25§、 碘化銅(I)0.019g、l,l〇 -啡啉0.018g及N -甲基-2 -吡咯烷酮 2 · 5 g。所得混合物邊維持在氮氣氛圍,邊升溫至1 〇 〇 。 直接維持在氮氣氛圍下,在100 °C攪拌該混合物4小時,獲 得含有4,4’-二氯-2,2’-聯苯二磺酸二鈉之反應混合物。冷 卻後’取樣反應混合物之一·部分,進行前述L C分析,算 出4,4’-二氯-2,2’-聯苯二磺酸二鈉之收率。收率:95%。 -39- 201223930 [實施例4]2 C1~^~C1 S03Na mixed sodium 2,5-dichlorobenzenesulfonate 0.5 (^, powdered metal copper ruthenium. 25 §, copper iodide (I) 0.019 g, l,l porphyrin 0.018 g and N-methyl-2-pyrrolidone 2 · 5 g. The mixture was heated to 1 Torr while maintaining a nitrogen atmosphere. The mixture was stirred at 100 ° C for 4 hours while maintaining the nitrogen atmosphere. a reaction mixture of '-dichloro-2,2'-diphenyldisulfonic acid disodium. After cooling, 'sampling one part of the reaction mixture, performing the aforementioned LC analysis to calculate 4,4'-dichloro-2,2' - yield of disodium diphenyl disulfonate. Yield: 95% - 39 - 201223930 [Example 4]
混合2,5-二氯苯磺酸(2,2-二甲基丙酯)0.59g、粉末狀 金屬銅0.25g、碘化銅(I)0.019g、Ν,Ν,Ν’,Ν’-四甲基乙二胺 〇.〇35g及N-甲基-2-吡咯烷酮2.5g。所得混合物邊維持在氮 氣氛圍,邊升溫至l〇〇°C。直接維持在氮氣氛圍下,在 l〇〇°C攪拌該混合物4小時,獲得含有4,4’-二氯聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之反應混合物。冷卻後,取樣 反應混合物之一部分,進行前述LC分析,算出4,4’-二氯 聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之收率。收率:56%Mixing 2,5-dichlorobenzenesulfonic acid (2,2-dimethylpropyl) 0.59 g, powdered metal copper 0.25 g, copper iodide (I) 0.019 g, hydrazine, hydrazine, hydrazine, Ν'- Tetramethylethylenediamine oxime. 35 g and N-methyl-2-pyrrolidone 2.5 g. The resulting mixture was heated to l ° ° C while maintaining a nitrogen atmosphere. The mixture was stirred under nitrogen for a period of 4 hours at 10 ° C to obtain bis(2,2-dimethylpropyl) 4,4'-dichlorobiphenyl-2,2'-disulfonate. The reaction mixture. After cooling, a part of the reaction mixture was sampled, and the above LC analysis was carried out to calculate the yield of 4,4'-dichlorobiphenyl-2,2'-disulfonic acid bis(2,2-dimethylpropyl). Yield: 56%
添加2,5-二氯苯磺酸(2,2-二甲基丙酯)120.0g、粉末狀 金屬銅28.2g及甲苯300.0g。濃縮所得混合物至成爲290g ,濃縮後之混合物之水份値確認爲2 1 ppm。於其中添加三 -40- 201223930 氟甲院礦酸銅(II)1.46g及N,N,N,,N,-四甲基乙二胺2.35g。 所得混合物邊維持在氮氣氛圍,邊升溫至1001 ^直接維 持在氮氣氛圍下’在100 °C攪拌該混合物24小時,獲得含 有4,4’·二氯聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之反應混 合物。取樣反應混合物之一部分,進行前述LC分析,算 出4,4’-二氯聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之收率》 收率:8 6 %。 於所得反應混合物中添加甲苯4 8 0.0 g後,滴加於 1 8 · 9 %鹽酸3 8 8.2 g中。所得混合物在7 5。(:攪拌1 0分鐘後, 在75 °C去除水層。所得油層以水洗淨至成爲pH4,冷卻至 5 °C析出固體。以過濾濾取析出之固體,並乾燥,獲得 4,4’-二氯聯苯-2,2’-二磺酸二(2,2 -二甲基丙酯)72.4g。收 率:68%。 [實施例6]120.0 g of 2,5-dichlorobenzenesulfonic acid (2,2-dimethylpropyl), 28.2 g of powdered metallic copper, and 300.0 g of toluene were added. The resulting mixture was concentrated to 290 g, and the water mixture of the concentrated mixture was confirmed to be 2 1 ppm. Among them, 3.60 g of copper (II) fluorocarbonate and 2.35 g of N,N,N,N,-tetramethylethylenediamine were added thereto. The resulting mixture was heated to 1001 ^ while maintaining the nitrogen atmosphere. The mixture was stirred at 100 ° C for 24 hours to obtain 4,4'-dichlorobiphenyl-2,2'-disulfonic acid. A reaction mixture of bis(2,2-dimethylpropyl). A portion of the reaction mixture was sampled and subjected to the aforementioned LC analysis to calculate the yield of 4,4'-dichlorobiphenyl-2,2'-disulfonic acid bis(2,2-dimethylpropyl). Yield: 8 6 %. After adding toluene 4 8 0.0 g to the obtained reaction mixture, it was added dropwise to 8 8 8.2 g of 1 8 · 9 % hydrochloric acid. The resulting mixture was at 75. (: After stirring for 10 minutes, the aqueous layer was removed at 75 ° C. The obtained oil layer was washed with water until pH 4, and cooled to 5 ° C to precipitate a solid. The precipitated solid was collected by filtration and dried to obtain 4, 4' - 72.4 g of dichlorobiphenyl-2,2'-disulfonic acid bis(2,2-dimethylpropyl). Yield: 68%. [Example 6]
CHCH
CH^ CH.CH^ CH.
Cu.rCu.r
混合2-氯噻吩0.95g、粉末狀金屬銅1.02 g、三氟甲烷 磺酸銅(II)0.029g、>^,>1山’,:^’-四甲基乙二胺〇.〇93§及1^-甲 基-2-吡咯烷酮l.Og »所得混合物邊維持在氮氣氛圍,邊升 溫至150°C。直接維持在氮氣氛圍下,在150°C攪拌該混合 物4小時,獲得含有2,2’-聯噻吩之反應混合物。冷卻後, 取樣反應混合物之一部分,進行前述GC分析,算出2,2,-聯噻吩之收率。收率:20%。 -41 - 201223930 [實施例7]0.95 g of 2-chlorothiophene, 1.02 g of powdered metal copper, 0.029 g of copper (II) trifluoromethanesulfonate, >^, >1 mountain', :^'-tetramethylethylenediamine 〇.〇 93§ and 1^-methyl-2-pyrrolidone l.Og»The obtained mixture was heated to 150 ° C while maintaining a nitrogen atmosphere. The mixture was stirred at 150 ° C for 4 hours while maintaining a nitrogen atmosphere to obtain a reaction mixture containing 2,2'-bithiophene. After cooling, a part of the reaction mixture was sampled, and the above GC analysis was carried out to calculate the yield of 2,2,-bithiophene. Yield: 20%. -41 - 201223930 [Embodiment 7]
混合2-氯硝基苯〇.95g、粉末狀金屬銅0.77g、碘化銅 (I) 0.05 7g、N,N,N’,N’-四甲基乙二胺 〇.〇35g及 N-甲基-2-吡咯烷酮7.5g。所得混合物邊維持在氮氣氛圍,邊升溫至 150 °C»直接維持在氮氣氛圍下,在150 °C攪拌該混合物4 小時,獲得含有2,2’-二硝基聯苯之反應混合物。冷卻後, 取樣反應混合物之一部分,進行前述GC分析,算出2,2’-二硝基聯苯之收率。收率:54%。 [實施例8]Mixed 2-chloronitrophenylhydrazine.95g, powdered metal copper 0.77g, copper iodide (I) 0.05 7g, N,N,N',N'-tetramethylethylenediamine 〇.〇35g and N- Methyl-2-pyrrolidone 7.5 g. The resulting mixture was heated to 150 ° C while maintaining a nitrogen atmosphere. The mixture was directly maintained under a nitrogen atmosphere, and the mixture was stirred at 150 ° C for 4 hours to obtain a reaction mixture containing 2,2'-dinitrobiphenyl. After cooling, a part of the reaction mixture was sampled, and the above GC analysis was carried out to calculate the yield of 2,2'-dinitrobiphenyl. Yield: 54%. [Embodiment 8]
混合2-氯苯甲酸甲酯1.36g、粉末狀金屬銅l.〇2g、三 氟甲烷磺酸銅(II) 0.029g、N,N,N’,N’-四甲基乙二胺 〇.〇93g及N -甲基-2 -吡咯烷酮l.Og。所得混合物邊維持在氮 氣氛圍,邊升溫至150 °C。直接維持在氮氣氛圍下,在 15(TC攪拌該混合物4小時,獲得含有2,2’-雙(甲氧基羰基) 聯苯之反應混合物。冷卻後,取樣反應混合物之一部分, -42- 201223930 進行前述GC分析,算出2,2’-雙(甲氧基羰基)聯苯之收率 。收率:2 9 %。 [實施例9]Methyl 2-chlorobenzoate 1.36 g, powdered metal copper l. 〇 2 g, copper (II) trifluoromethanesulfonate 0.029 g, N, N, N', N'-tetramethylethylenediamine oxime. 〇93g and N-methyl-2-pyrrolidone l.Og. The resulting mixture was heated to 150 ° C while maintaining a nitrogen atmosphere. Directly maintained under a nitrogen atmosphere, the mixture was stirred at 15 (TC for 4 hours to obtain a reaction mixture containing 2,2'-bis(methoxycarbonyl)biphenyl. After cooling, a portion of the reaction mixture was sampled, -42-201223930 The GC analysis was carried out to calculate the yield of 2,2'-bis(methoxycarbonyl)biphenyl. Yield: 29%. [Example 9]
混合2,5-二氯苯磺酸(2,2-二甲基丙酯)2.388、粉末狀 金屬銅0.56g、三氟甲烷磺酸銅(II)〇.〇29g、1,4,7-三甲基-1,4,7-三氮雜環壬烷〇.21g及甲苯2.38g。所得混合物邊維 持在氮氣氛圍,邊升溫至100°C»直接維持在氮氣氛圍下 ’在l〇〇°C攪拌該混合物4小時,獲得含有4,4’-二氯聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之反應混合物。冷卻後, 取樣反應混合物之一部分,進行前述LC分析,算出4,4,- 二氯聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之收率。收率: 82%。 [實施例10] h3c.n^i!iMix 2,5-dichlorobenzenesulfonic acid (2,2-dimethylpropyl) 2.388, powdered metal copper 0.56 g, copper (II) trifluoromethanesulfonate 〇.〇29g, 1,4,7- Trimethyl-1,4,7-triazacyclononane.21 g and toluene 2.38 g. The resulting mixture was heated to 100 ° C while maintaining a nitrogen atmosphere. The mixture was directly maintained under a nitrogen atmosphere. The mixture was stirred at 1 ° C for 4 hours to obtain a 4,4'-dichlorobiphenyl-2,2'. a reaction mixture of di(2,2-dimethylpropyl) disulfonate. After cooling, a part of the reaction mixture was sampled, and the above LC analysis was carried out to calculate the yield of 4,4,-dichlorobiphenyl-2,2'-disulfonic acid bis(2,2-dimethylpropyl). Yield: 82%. [Embodiment 10] h3c.n^i!i
混合2-氯吡啶0.91g、粉末狀金屬銅i.〇2g、三氟甲烷 磺酸銅(II) 0_029g、N,N,N’,N’-四甲基乙二胺 0.093g及 N-甲基-2-啦咯烷酮l.〇g。所得混合物邊維持在氮氣氛圍下, 201223930 邊升溫至150 °C。直接維持在氮氣氛圍下,在150 °C攪拌該 混合物4小時,獲得含有2,2’-聯吡啶之反應混合物。冷卻 後,取樣反應混合物之一部分,進行前述GC分析,算出 2,2 ’ ·聯吡啶之收率。收率:1 〇 %。 [實施例1 1]Mixing 0.91 g of 2-chloropyridine, powdered metal copper i.〇2g, copper (II) trifluoromethanesulfonate 0_029g, N,N,N',N'-tetramethylethylenediamine 0.093g and N-A Ke-2-pyrrolidone l.〇g. The resulting mixture was maintained under a nitrogen atmosphere and heated to 150 °C on 201223930. The mixture was stirred at 150 ° C for 4 hours while maintaining a nitrogen atmosphere to obtain a reaction mixture containing 2,2'-bipyridine. After cooling, a part of the reaction mixture was sampled, and the above GC analysis was carried out to calculate the yield of 2,2'-bipyridine. Yield: 1 〇 %. [Embodiment 1 1]
混合2,5-二氯二苯甲銅2.(^、粉末狀金屬銅1.〇28、三 氟甲烷磺酸銅(II)〇.〇29g、N,N,N’,N’-四甲基乙二胺0.093g 及N-甲基-2-吡咯烷酮l.Og。所得混合物邊維持在氮氣氛 圍下,邊升溫至15(TC。直接維持在氮氣氛圍下,在150°C 攪拌該混合物4小時,獲得含有4,4’-二氯-2,2’-雙(苯甲醯 基)聯苯之反應混合物》冷卻後,取樣反應混合物之一部 分,進行前述GC分析,算出4,4’-二氯-2,2’-雙(苯甲醯基) 聯苯之收率。收率:21%。 [實施例12]Mix 2,5-dichlorodiphenyl copper 2. (^, powdered metal copper 1. 〇 28, copper (II) trifluoromethanesulfonate 〇. 〇 29g, N, N, N', N'-four 0.093 g of methylethylenediamine and 1.0 g of N-methyl-2-pyrrolidone. The mixture was heated to 15 (TC) while maintaining a nitrogen atmosphere, and the mixture was stirred at 150 ° C directly under nitrogen atmosphere. After 4 hours, a reaction mixture containing 4,4'-dichloro-2,2'-bis(benzimidyl)biphenyl was obtained. After cooling, a part of the reaction mixture was sampled, and the above GC analysis was carried out to calculate 4, 4'. - yield of dichloro-2,2'-bis(benzimidyl)biphenyl. Yield: 21%. [Example 12]
-44 - 201223930 混合對-甲苯磺酸· 1水合物1.15g及乙酸銅(II)0.55g以 及甲苯1 3 5 g,使所得混合物在1 1 〇 °C加熱1小時,餾除甲苯 54g,獲得含有對-甲苯磺酸銅之濃縮物。於該濃縮物中添 加2,5-二氯苯磺酸(2,2-二甲基丙酯)45.0g及粉末狀金屬銅 10.6g,使所得混合物在l〇〇°C攪拌20小時,獲得含有4,4’-二氯聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之反應混合物。 取樣反應混合物之一部分,進行前述LC分析,算出4,4’-二氯聯苯-2,2’-二磺酸二(2,2-二甲基丙酯)之收率。收率: 7 7%。 [實施例13]-44 - 201223930 1.15 g of p-toluenesulfonic acid·1 hydrate and 0.55 g of copper (II) acetate and 1 35 g of toluene were mixed, and the obtained mixture was heated at 1 〇 ° C for 1 hour to distill off 54 g of toluene. A concentrate containing copper p-toluenesulfonate. 45.0 g of 2,5-dichlorobenzenesulfonic acid (2,2-dimethylpropyl) and 10.6 g of powdery metallic copper were added to the concentrate, and the resulting mixture was stirred at 10 ° C for 20 hours. A reaction mixture containing 4,4'-dichlorobiphenyl-2,2'-disulfonic acid bis(2,2-dimethylpropyl). A part of the reaction mixture was sampled, and the above LC analysis was carried out to calculate the yield of 4,4'-dichlorobiphenyl-2,2'-disulfonic acid bis(2,2-dimethylpropyl). Yield: 7 7%. [Example 13]
添加2,5-二氯苯磺酸(2,2-二甲基丙酯)4 5.(^、粉末狀 金屬銅l〇.6g、氫氧化銅(II)0.30g、甲烷磺酸0.58g及甲苯 9〇g,使所得含有生成之甲烷磺酸銅之混合物濃縮至成爲 l〇4g。濃縮後之混合物之水份値確認爲20ppm。於其中添 加N,N,N’,N’-四甲基乙二胺3.5g,所得混合物邊維持在氮 氣氛圍下,邊升溫至105 °C。直接維持在氮氣氛圍下,在 l〇5°C攪拌該混合物26小時,獲得含有4,4’-二氯聯苯-2,2’· 二磺酸二(2,2-二甲基丙酯)之反應混合物。取樣反應混合 -45- 201223930 物之一部分,進行前述LC分析,算 二磺酸二(2,2-二甲基丙酯)之收率。 [產業上之可能利用性] 依據本發明,可由容易取得之 製造相對應之聯芳基化合物。 4,4’-二氯聯苯-2,2’-率:72%。 式(1)表示之化合物 -46 -Add 2,5-dichlorobenzenesulfonic acid (2,2-dimethylpropyl) 4 5. (^, powdered metal copper l〇.6g, copper (II) hydroxide 0.30g, methanesulfonic acid 0.58g And 9 甲苯g of toluene, and the obtained mixture containing the produced copper methane sulfonate was concentrated to become 4 g. The water enthalpy of the concentrated mixture was confirmed to be 20 ppm, and N, N, N', N'-four was added thereto. 3.5 g of methylethylenediamine, and the mixture was heated to 105 ° C while maintaining a nitrogen atmosphere. The mixture was directly maintained under a nitrogen atmosphere, and the mixture was stirred at 10 ° C for 26 hours to obtain 4,4'- a reaction mixture of dichlorobiphenyl-2,2'. di(2,2-dimethylpropyl) disulfonate. Sampling reaction is mixed with one part of -45-201223930, and the above LC analysis is carried out to calculate disulfonic acid Yield of (2,2-dimethylpropyl). [Industrial Applicability] According to the present invention, a corresponding biaryl compound can be produced by easily obtaining it. 4,4'-Dichlorobiphenyl- 2,2'- rate: 72%. Compound of formula (1) -46 -
Claims (1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010193376 | 2010-08-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201223930A true TW201223930A (en) | 2012-06-16 |
Family
ID=45772522
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100123857A TW201223930A (en) | 2010-08-31 | 2011-07-06 | Method for producing biaryl compound |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5742500B2 (en) |
TW (1) | TW201223930A (en) |
WO (1) | WO2012029411A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103030594A (en) * | 2012-12-11 | 2013-04-10 | 安徽国星生物化学有限公司 | Synthesis method of 2,2'-dipyridyl |
CN103992248A (en) * | 2014-04-22 | 2014-08-20 | 北京理工大学 | Aromatic side-chain type sulfonated dihalobiphenyl and preparing method thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6476280B1 (en) * | 2002-01-11 | 2002-11-05 | The United States Of America As Represented By The Secretary Of The Navy | Method for making nonanitroterphenyl |
KR20100056497A (en) * | 2007-08-22 | 2010-05-27 | 수미토모 케미칼 컴퍼니 리미티드 | Method for producing dihalobiphenyl compound |
JP5266786B2 (en) * | 2008-02-20 | 2013-08-21 | 富士ゼロックス株式会社 | Novel phenothiazine compounds |
JP5298636B2 (en) * | 2008-05-21 | 2013-09-25 | 宇部興産株式会社 | Heterocyclic oligomer compound having a pentafluorosulfanyl group |
WO2011013834A1 (en) * | 2009-07-31 | 2011-02-03 | 住友化学株式会社 | Method for producing biaryl compound |
-
2011
- 2011-06-16 JP JP2011134136A patent/JP5742500B2/en active Active
- 2011-07-04 WO PCT/JP2011/065740 patent/WO2012029411A1/en active Application Filing
- 2011-07-06 TW TW100123857A patent/TW201223930A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP5742500B2 (en) | 2015-07-01 |
JP2012072114A (en) | 2012-04-12 |
WO2012029411A1 (en) | 2012-03-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Solomatina et al. | Dibenzothiophene-platinated complexes: probing the effect of ancillary ligands on the photophysical performance | |
CN108586500A (en) | Zinc co-ordination complex and the method for preparing organic zinc reagent | |
JP2021098722A (en) | Metal complexes | |
Devkule et al. | Synthesis, characterization, luminescence and catalytic properties of copper (I) complexes with N-(2-pyridylmethylene)-1, 5-dimethyl-2-pyrazole-3-(2H)-one and triphenylphosphine as ligands | |
Beims et al. | Geometrically Deformed and Conformationally Rigid Phosphorus Trisamides Featuring an Unsymmetrical Backbone | |
TW201223930A (en) | Method for producing biaryl compound | |
Gese et al. | Toward a 1, 4-diphosphinine-based molecular CPS-ternary compound | |
Cardinale et al. | Convenient preparation of (4-iodophenyl) aryliodonium salts | |
Gayathri et al. | Efficient multicomponent synthesis of propargylamines catalyzed by Cu (I) complexes encompassing hydrazone ligands under solvent-free condition | |
CN115010763B (en) | Circular polarization phosphorescence platinum (II) complex, and preparation method and application thereof | |
Perl et al. | Postcomplexation synthetic routes to dipyrrin complexes | |
EP2460789B1 (en) | Method for producing biaryl compound | |
Arifin et al. | Synthesis, structure and theoretical investigation into a homoleptic tris (dithiolene) tungsten | |
Seidel et al. | C 2-Symmetric (SO) N (SO) Sulfoxide Pincer Complexes of Mg and Pd: Helicity Switch by Ambidentate S/O-Coordination and Isolation of a Chiral Pd-Sulfenate | |
Sheokand et al. | 1, 2, 3-Triazolyl bisphosphine with pyridyl functionality: synthesis, copper (i) chemistry and application in click catalysis | |
Tang et al. | Coinage Metal (Bisfluorosulfonyl) imide Complexes: Preparation, Characterization, and Catalytic Applications | |
Son et al. | 1, 2-Nucleophilic addition of 2-(picolyl) organoboranes to nitrile, aldehyde, ketone, and amide | |
JP2010235453A (en) | Method for producing platinum complex | |
Liddle et al. | Tricarbonylrhenium (I) and manganese (I) complexes of 2-(pyrazolyl)-4-toluidine | |
Batsanov et al. | Dimethylthiophosphoryl hydrazone ligands and their copper complexes: crystal structures and analysis of their solution complexation behaviour by electrospray mass spectrometry | |
Le Sueur | Synthesis and Investigation of Light Responsive Molecules Containing Cyclopropenium Ions | |
Wu et al. | An efficient chloride-selective fluorescent chemosensor based on 2, 9-bis (4′-hydroxyphenyl) phenanthroline Cu (II) complex | |
Singh et al. | Directly accessing the alkyne-aldehyde-amine (A3) coupling catalytic cycle using molecular gold (I) acetylide complexes for synthesizing propargylamines and amino indolizines | |
Lolage et al. | Heterobimetallic acetylide bridged Cu (I)/Ru (II)-halide/pseudohalide hybrid complexes: Synthesis, structural characterization, luminescence and electrochemical studies | |
Thompson | Applications of titanium-catalyzed hydroamination towards the syntheses of electron rich materials |