TW201222149A - Pattern forming method, pattern forming material, and photosensitive film, pattern film, low refractive index film, optical device and solid-state imaging device using the same - Google Patents

Abstract

A pattern forming method, a pattern forming material, a photosensitive film, a pattern film, a low refractive index film, an optical device and a solid-state imaging device using the same are provided in the invention, which can form patterns having low refractive index and less developing residue under high resolution. The pattern forming method of the invention includes a step of using a photosensitive composition to form a photosensitive film, a step of exposing the photosensitive film, and a step of developing by using a developer containing an organic solvent. The photosensitive composition includes (A) hollow or porous particles, (B) a compound which produces active species by the irradiation of active rays or radiation rays, and (C) a compound for lowering the solubility in the developer containing an organic solvent by the effect of the active species.

Description

201222149

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern forming method, a pattern forming material, a photosensitive film using the same, a pattern film, a low refractive index film, an optical device, and solid-state photography. element. [Prior Art] The low refractive index film is used as an antireflection film, a reflection film, a transflective film, a visible light reflecting infrared penetrating film, an infrared reflecting visible light penetrating film, a blue reflecting film, a green reflecting film or a red reflecting film. The optical function film included in the bright line cut filter and the color tone correction film is formed on the optical member. The surface shape is not limited to a flat optical member, and a Fresnel lens or a lenticular lens which is used in a screen of a liquid crystal backlight for improving the lens film or the diffusion film or the screen of a video projection television. In an optical functional member such as a micro lens, a desired microstructure optical property is obtained by a material having a fine structure, but the surface of the fine structure also needs an optical function including a low refractive index film. membrane. When the low refractive index film is used as an antireflection film, the low refractive index film at the single layer directly becomes an antireflection film. In the case where the substrate is a resin material, the refractive index of the single-layer antireflection film is preferably a low refractive index in the range of 2 to 1.35. The representative material of the refractive index film includes a layer containing a fluorine-based polymer material of 'two'', and 1.35 to 1.4, or a polymer having a refractive index of a polymer containing a fluorine monomer. A microparticle-solubilizing material (for example, refer to Patent Document 1), but a refractive index is not obtained as ^

4 Materials under 201222149. Further, Patent Document 2 and Patent Document 3 disclose a photocurable composition containing cerium oxide fine particles, but there is no description about the case where exposure or development is performed into a pattern. v In addition to the above reflectivity characteristics, it is more desirable to solve many problems such as manufacturing steps. Patent Document 4 and Patent Document 5 disclose a method of patterning without using a photoresist in order to eliminate the complexity of the process step: using a dioxate pure material having a sense of inductiveness, and exposing it to exposure, The development (4) is patterned, but the resolution of the pattern-forming towel is divided, and the low refractive index of the resulting pattern is also insufficient. [Prior Art Document] [Patent Document 1] Japanese Patent No. 3718 No. 31 [Patent Document 2] International Publication No. 2/7/6, No. 884 [Patent Document 3] [Patent Document 4] Japanese Patent Laid-Open Publication No. 22 (Patent Document 5) Japanese Patent Laid-Open No. MU32 " [Summary of the Invention] m describes a lot of === and forms a problem to solve the previous problem. The rate of solidification == formation: and the film, called low refractive index 臈, er set 201222149 ^ 月月 f~p 述 constituting the steps of the above-mentioned objective photosensitive film of the present invention, including the light-off composition a step of exposing the photosensitive film to an organic solvent, and a step of using the film containing the (A) to hard development to irradiate the photosensitive composition with a line of particles, and (8) by actinic rays Or radiation ', 彳 is used to reduce the compound's solubility in organic solvents. [1] The pattern forming method according to the above [1], wherein the hollow or smectite has a refractive index of 1.10 to 1.40. [3] The pattern forming method according to the above [1] or [2] wherein the compound (C) is a polymerizable compound. [4] The pattern forming method according to the above [3], wherein the polymerizable compound contains a low molecular compound having a molecular weight of 2,000 or less. [5] The pattern forming method according to the above [3], wherein the polymerizable compound contains a resin having a polymerizable group. [6] The pattern forming method according to the above [5], wherein the resin has a radical or cationically polymerizable repeating unit. [7] The pattern forming method according to the above [6], wherein the radical or cationically polymerizable repeating unit is a repeating unit represented by any one of the following formulas (1) to (3): 201222149 Jy/4^pif

(3) 逋 (1) to (3)

'Knife word JL means that the atom or the ground represents an oxygen atom, a sulfur atom or _1<[(1141) alkyl group; G, G22 and G each independently represent a divalent linking group; and Z21 independently represents an oxygen atom, _N(R^, R42 represents a hydrogen atom or an alkyl group; an atom or r43矣Y2-1 represents a (four) bond, an oxygen species, a sulfur atom, and a stretcher of H. Tan 43)-, R represents a non-atom atom or an alkyl group; R4G Stand on the surface of a money atom or a valence substituent. The method for forming a pattern according to any one of the above [5] to [7], wherein (9) is a tree of the fourth. There is the following general formula (4) or general formula (5), heavy = description (four) 201222149 J ^ I T-/

X1- R4 I Si-0 I .

R1 R3 R® Si-R7

(5) X2—R9 (4) In the formula (4), R1, R2 and R3 each independently represent a hydrogen atom, an alkyl group or an aryl group; and R4 and R5 each independently represent a hydrogen atom, an alkyl group or a decyloxy group. R6, R7 and R8 each independently represent an alkyl group, a decyloxy group or an alkenyl group; X1 represents a divalent linking group; η1 represents an integer of 0 to 20; and in the formula (5), R1, R2 and R3 have the formula R1, R2 and R3 in (4) are synonymous; X2 represents a divalent linking group; and R9 represents an alkyl group substituted by a fluorine atom. [10] The pattern forming method according to the above [9], wherein the repeating unit represented by the above formula (4) or (5) is represented by the following formula (6) or formula (7) Repeat unit:

R10

(7) 〇~2_Y12_R" (6)

8 201222149 /M-opif In the formula (ό), R10 represents a hydrogen atom or an alkyl group; R, R and R each independently represent an alkyl group, an alkoxy group or an alkenyl group; and A11 represents an oxygen atom or a sulfur atom or _n(R15)_ ; R15 represents a hydrogen atom or an alkyl group; Y11 represents an alkylene group, an alkoxy group or a combination thereof; In the formula (7), A12 represents an oxygen atom, a sulfur atom or _]^ 15)_; Y12 represents a stretching group, an alkylene group or a combination thereof; R14 represents an alkyl group substituted by a fluorine atom; and R10 and R15 are synonymous with Ri〇 and Ru in the formula (6). [11] The pattern forming method according to the above [3], wherein the compound (C) is a compound having a structural unit represented by the following formula (A):

Si-XnT (A) R11 / • In the formula (A), a single bond or a divalent linking group or a monovalent substituent 'in the case where Rn is a single bond or a divalent linking group, the single bond or divalent The linking group is bonded to the other 11 atoms of the compound (C);

Xn represents a single bond or a divalent linking group;

Rp represents a monovalent group containing a polymerizable group. [The above-mentioned pattern forming method, wherein the compound having the structural unit of the above (4) formula (4) is a resin, and a stone atom is contained in the main chain of the resin 201222149. The method of forming a pattern according to the above aspect, wherein the above, A) + ' Χιι denotes a single bond or an oxygen atom, an alkyl group, an alkenyl group, an alkynyl group, an extended aryl group or a combination. The pattern forming method according to any one of the above [1], wherein, in the above formula (A), Ru represents a -valent substituent. [15] The pattern forming method according to the above [14], wherein in the above formula (A), Ru represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or an alkoxy group. [16] The pattern forming method according to any one of (1) to (15), further comprising (A1) a particle dispersing agent. [17] The pattern forming method according to any one of the above [1] to [16], which is used for coating of a microlens. [18] A pattern forming material which is a photosensitive composition, wherein the photosensitive composition contains: (A) a hollow or porous particle, (B) a compound which generates an active species by irradiation with active light or radiation, and (c) A compound which reduces the solubility in a developing solution containing an organic solvent by the action of the above-mentioned active species. [19] A photosensitive crucible formed by using the pattern forming material as described in [18] above. [20] A pattern film obtained by the pattern forming method as described in any of the above [1] to [17]. [21] A low refractive index film which is a pattern film as described in [20] above. [22] An optical device comprising the low refractive index 201222149 [23] of the above [21], which comprises the optical device according to [22] above. The present invention also preferably has the following configuration. [24] The pattern forming method according to any one of [1] to [17] wherein the compound (B) is a photopolymerization initiator. [25] The pattern forming method according to any one of [14], wherein the hollow or porous particles (A) are hollow particles. [26] The pattern forming method according to any one of the above [1], wherein the hollow or porous particle (A) is a cerium dioxide particle. [Effect of the Invention] According to the present invention, a pattern forming method, a pattern forming material, a photosensitive film using the same, a pattern film, a low refractive index film, and an optical film which can form a pattern having a low refractive index and a small amount of development residue can be provided with high resolution. Devices, and solid state imaging elements. [Embodiment] Hereinafter, the present invention will be described in detail. Further, in the expression of the group (atomic group) in the present specification, the unsubstituted and unsubstituted expression is not included, and includes not only a group having no substituent but also a group having a substituent. For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group). In addition, the term "active light" or "radiation" in the present specification means, for example, a bright line spectrum of a mercury lamp, a far ultraviolet light represented by an excimer laser, an extreme ultraviolet light (EUV), an X-ray, and 11 201222149 The so-called light in the moon refers to the active light or the light emitted from the exposure, such as the far line, the ray, the euv ίίΐ^', and the beam of electron beams, ion beams, etc. The light forming method includes a step of exposing the photosensitive film by using a photosensitive composition, a step of exposing the photosensitive film, and a step of developing using a developing solution containing 丨, and the photosensitive composition is hollow or porous, ( B) a compound which produces an active species by irradiation with active light or radiation, and (C) a compound which reduces the solubility in a developer towel containing an organic solvent by the action of the above-mentioned living. The reason why the effect of the present invention is obtained by using the pattern forming method of the present invention is not clear, and it is generally considered that the refractive index of the resulting pattern can be sufficiently reduced by using the hollow or porous particles (A), and the compound ( b) Combined with the compound (C), it is very helpful to obtain the pattern with high resolution. Further, although the effect is not clear, it is presumed that the use of the hollow or porous particle (A) in combination with the compound (c) contributes to the suppression of development residue for some reasons. The photosensitive composition used in the pattern forming method of the present invention is usually a negative type composition (a composition forming a negative pattern). Further, the present invention relates to a pattern forming material which is a photosensitive composition, and the photosensitive composition contains: (A) a hollow or porous plasmid

S 12 201222149 A compound which produces an active species by irradiation with active light or radiation, and (C) a compound which reduces the solubility in a developer containing an organic solvent by the action of the above-mentioned active species. Further, the present invention relates to a photosensitive film formed using the above pattern forming material. Hereinafter, each component of the photosensitive composition will be described in detail. [1] (Α) Hollow or porous particles The hollow particles are particles having a hollow structure inside, and are hollow particles surrounded by an outer shape, and the porous particles are a plurality of porous particles. The pore-producing particles are preferably porous particles in terms of obtaining a more favorable texture. τ二四夕

Cvoldratio) ι〇^^°/〇-8〇 -,. More preferably, it is 20% by volume to 6% by volume, and most preferably 3 = 0.001% by volume. The viewpoint of lowering the refractive index and maintaining the durability of the particles. The porosity of the particles is set to the above range. Preferably, the hollow =====empty or porous particles are more = l〇), so the refractive index thereof is significantly lower than that of the (refractive index). (Reflection = 1.46) Manufacturing method of hollow particles, for example, 2001-233611 In addition, it is described in Japanese Patent Laid-Open No. 327424f, the manufacturing method of the Japanese Patent Laid-Open No. 327,424, and the Japanese Patent Laid-Open No. 13 201222149 2003-335515, Japanese Patent Laid-Open 3 (6), In the publications of 2003-238U0, etc., the average particle diameter of the other t or porous particles is preferably 1 to 200 nm', more preferably i〇nm~1〇〇nm. #d Ϊ or porous #particle The average particle diameter can be thoroughly penetrated by electron microscopy 2: the particles dispersed by yttrium is obtained from the obtained photograph. The area of the granule and the jersey are determined, and the equivalent circle diameter is obtained (the equivalent cirde is the average granule) The diameter (usually, 300 or more particles are measured in order to obtain an average particle diameter). The refractive index of the porous particles is preferably such that the refractive index of the particles is .., preferably 丨15 to 135, preferably. It is 1.15 to 1.3 〇. The refractive index here is the refracting J particle of the particle as a whole. In other words, it is not indicated that only the outer shell of the hollow particles is formed. When the particles are porous particles, the refractive index of the porous particles can be measured by Abbe refractometer (manufactured by Abbe refractometer). 5 In terms of low-refractive-indexed orbital points, it is preferred that the particles are in the middle or the porous inorganic particles. The inorganic low-refractive-index particles can be listed as the particles of the lower-refractive index. The primary particle diameter of the inorganic particles is preferably from Inm to i00 nm, more preferably from Inm to 6 〇 nm, in terms of properties, dispersion stability, and formation. It may be either crystalline or amorphous, and may be scattered particles as well. If the particle size is full, it may be agglomerated particles. = 201222149 The shape is preferably spherical or may be beaded. The shape of the ratio of the long diameter to the short diameter or the indefinite shape. The specific surface area of the inorganic particles is preferably 10 m 2 /g to 2 〇 00 m 2 /g, and particularly preferably 20 m /g to i _ m 2 /g 'best It is 5〇一^~^(8). It is used to achieve dispersion stabilization in the dispersion or coating solution, or ίΐί高The affinity and binding properties of the components of the mixture, and the inorganic particles can be subjected to chemical surface treatment such as plasma discharge treatment or corona discharge treatment, chemical surface treatment using a surfactant or a coupling agent, etc. Special =: make, coupler Preferably, the coupling agent is a tyrosine metal compound (Example 2 'coupling agent, Shi Xiyuan coupling agent, wherein the stone compound coupling treatment of the special compound Ρ' Ι ^ no child is a dioxide oxidizer, and the coupling agent For the reaction of Shixia Shaohua Meiling compound with 11 (tetra) group, the surface of the organic stone eve 'two _ courtyard, three organic stone kiln base) 罝 right 沾 1 surface. When the surface-treated cerium oxide particles are refracted ======== low, or as a burden of pre-dispersion before ==, the inorganic particles are preferably at the surface of the cerium oxide particles. For example, you can use: 曰 to touch the seller. The Surulia series manufactured by Chech Catalyst (2012) 201222149 */✓ / (Isopropanol (isopropyl alcoho) dispersion, 4-methyl-2-pentanone (ΜΙΒΚ) dispersion, etc. ), OSCAL series. Snowtex series manufactured by 曰Chem Chemical Co., Ltd. (IPA dispersion, ethylene glycol dispersion, methyl ethyl ketone (MEK) dispersion, monomethyl acetamide dispersion, MIBK dispersion, Propylene glycol monomethyl acetate dispersion, propylene glycol monoterpene ether dispersion, methanol dispersion, ethyl acetate dispersion, butyl acetate dispersion, diphenylbenzene-n-butanol dispersion, benzene dispersion, etc.; Nippon Mining Co., Ltd. Manufactured SiliNax; pL series manufactured by Fuso Chemical Industry Co., Ltd. (1^dispersion, toluene dispersion, propylene glycol monomethyl ether dispersion, methyl ethyl ketone dispersion, etc.). Aerosil series manufactured by EVONIK (propylene glycol acetate dispersion, Ethylene oxide particles such as ethylene glycol dispersion, MIBK dispersion, etc., and AERODISP series manufactured by EVONIK. In the case where the cerium oxide particles are added to the two photosensitive compositions as a dispersion containing the cerium oxide particles and the particle displacing agent (details of the particle dispersing agent), the cerium oxide particles are dispersed in the cerium oxide. The content in the crucible is preferably from 10% by mass to 50% by mass, more preferably from 15% by mass to 40% by mass, even more preferably from 15% by mass to 3% by mass. /. . ° Hollow or porous particles may be used singly or in combination of two or more. In the case of using two or more kinds in combination, for example, a hollow body may be used in combination with a porous particle. The content of the hollow or porous particles with respect to the total solid content of the photosensitive composition is preferably 76% by mass to 95% by mass. In the case where a photosensitive composition is used to form a film, the amount of hollow or smectic particles is preferably 1 mg/m 2 to 1 〇〇 mg/m 2 , more preferably two sites 2 201222149 280 mg/m '2 More preferably, it is 1 〇 mg/m 2 to 6 〇 mg/m 2 . When the coating is 1 mg/m or more, the effect of lowering the refractive index or the effect of improving the scratch resistance can be surely obtained, and the above-mentioned slaving amount is (10) or less, and can be formed on the surface of the film. The fine unevenness suppresses the deterioration of the integrated reflectance. [2] (A) Particle dispersing agent The photosensitive composition preferably further contains (A,) a particle dispersing agent from the viewpoint of improving the dispersibility of the hollow or porous particles. ~ Particle dispersing agents can be exemplified by polyamidoamine and its salts, polycarboxylic acids and their salts, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified poly( a dispersion resin such as a methyl acrylate, a (fluorenyl) acrylate, or a acid-formaldehyde condensate, or a polyoxyethylene alkyl silicate, A compound such as polyoxyethylene alkylamine or calcinolamine is preferably a resin (hereinafter also referred to as "dispersion resin"). The dispersion resin can be further classified into a linear polymer, a terminal modified polymer, a graft polymer, and a block polymer depending on the structure thereof. The dispersion resin acts by being adsorbed on the surface of the particles to prevent reaggregation. Therefore, a terminal modified polymer having an anchor position on the surface of the pigment, a graft polymer, and a block type high molecule are preferable. The mass average molecular weight of the dispersion resin (polystyrene equivalent value measured by a Gd Permeation Chromatograph (GPC) method) is preferably 1000 to 2 χ 105, particularly preferably 2000 to 1 x 10 〇 5, particularly preferably 5000 〜 5xl04. 17 201222149 jy /*+«jpii Dispersion resin can also be obtained as a commercial product. For the specific example, "Disperbyk-101 (polyamide amine phosphate), Disperbyk-107 (carboxylic acid ester) manufactured by BYK Chemie Co., Ltd. ), Disperbyk-110 (copolymer containing acid group), Disperbyk-lll, Disperbyk-130 (polyamide), Disperbyk-161, Disperbyk-162, Disperbyk-163,

Disperbyk-164, Disperbyk-165, Disperbyk-166,

Disperbyk-170 (polymer copolymer); "BYK-P104, BYK-P105 (high molecular weight unsaturated polycarboxylic acid)", EFKA4047, EFKA4050~EFKA4010~EFKA4165 (polyamine phthalate) manufactured by EFKA ), EFKA4330~EFKA4340 (block copolymer), EFKA4400~EFKA4402 (modified polyacrylate), EFKA5010 (polyester decylamine), EFKA5765 (high molecular weight polycarboxylate), EFKA6220 (fatty acid polyester), EFKA6745 ( Phthalocyanine derivative), EFKA6750 (azo pigment derivative); Ajisper PB82 Ajisper PB822 manufactured by Ajinomoto Fine-Techno Co., Ltd.; Flowlen TG-710 (amine) manufactured by Kyoeisha Chemical Co., Ltd. "Glycolate oligomers", "Polyflow No. 50E, Polyfl〇w No. 300 (acrylic copolymer)"; "Disparlon KS-860, Disparlon 873SN, Disparlon 874, Disparlon" manufactured by Nanben Chemical Co., Ltd. # 2150 (aliphatic polybasic acid), Disparlon #7004 (Poly), Disparlon DA-703-50, Disparlon DA-705, Disparlon DA-725"; Demol RN, Demol N (Naphthene acid) manufactured by Kao Corporation Formalin Compound, Demol MS, Demol C, Demol SN-B (aromatic acid fumarin polycondensate), "Homogenol L-18 (polymer polyglycolic acid)", "Emulgen 920, 18 201222149

Emulgen 930, Emulgen 935, Emulgen 985 (polyoxyethyl phenyl phenyl ether), "Acetamin 86 (stearylamine acetate)"; "Solsperse 5000 (broth derivatives), Solsperse 22000 (made by Lubrizol) Nitrogen pigment derivative), Solsperse 13240 (polyesteramine), Solsperse 3000, Solsperse 17000, Solsperse 27000 (polymer with functional part at the end), Solsperse 24000, Solsperse 28000, Solsperse 32000, Solsperse 38500 (grafted polymer) "Nikkol T106 (polyoxyethylene sorbitan monooleate), Nikkol MYS-IEX (polyoxyethylene monostearate)" manufactured by Nikko Chemical Co., Ltd.; "EFKA-46, manufactured by Morishita Industrial Co., Ltd." EFKA-47, EFKA-47EA, EFKA Polymer 1〇〇, EFKA Polymer 400, EFKA Polymer 401, EFKA Polymer 450"; "Disperse Aid 6, Disperse ΑΜ 8, Disperse Aid 15, Disperse Aid 9100" manufactured by Sannopco Resin, etc. The compound (C) which utilizes the action of the active species to reduce the solubility in the developer containing the organic solvent may have any one of the general formula (21) to the general formula (23) selected from the following. At least one of the structural units represented by the person. Further, the knife-shaped tree can also be a resin obtained by using a compound represented by the above formula (E-1) in the compound (C) as a copolymer. Further, as the particle dispersant, nonionic, anionic marine activity #j can be used. These interfaces can be used as a commercial product, and the ugly cyanine derivative (commercial product EFKA-745 (manufactured by Nippon Lubriz〇1 Co., Ltd.), compound brain U Shin-Etsu Chemical Guard # (share manufacturing), (methyl 19 201222149 (total) polymer Polyflow No. 75, Polyflow No. 90, Polyflow No. 95 (above manufactured by Kyoeisha Chemical Co., Ltd.), W001 (Yu Commercial (share) and other cationic surfactants; polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene ether ether, polyoxyethylene octyl phenyl ether, polyoxyethylene phenylene ether, polyethylene Nonionic surfactants such as diol dilaurate, polyethylene glycol distearate, and sorbitan fatty acid ester; anionic interface such as W004, W005, and W017 (made by Yushang Co., Ltd.) Activators; Solsperse 3000, Solsperse 5000, Solsperse 9000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 24000, Solsperse 26000, Solsperse 28000 and other Solsperse dispersants (made by Lubrizol, Japan); Adeka Pluronic L31, Adeka Pluronic F38, Adeka Pluronic L42, Adeka

Pluronic L44 ' Adeka Pluronic L61 ' Adeka Pluronic L64 >

Adeka Pluronic F68 ' Adeka Pluronic L72 ' Adeka Pluronic P95, Adeka Pluronic F77, Adeka Pluronic P84, Adeka Pluronic F87 ' Adeka Pluronic P94 ' Adeka Pluronic LI01 ' Adeka Pluronic PI03, Adeka Pluronic FI08, Adeka Pluronic L121, Adeka Pluronic P-123 ( The above is made by ADEKA, and IsonetS-20 (made by Sanyo Chemical Co., Ltd.). Further, an amphoteric dispersant such as HinoactT-8000E manufactured by Chuanyan Fine Chemical Co., Ltd. may be mentioned. In addition, ELEBASE BA-100, ELEBASE BA-200, ELEBASE BCP-2, ELEBASE BUB-3, ELEBASE BUB-4, ELEBASE CP-800K, ELEBASE EDP-475, ELEBASE HEB-5, Finesurf 270, Finesurf 7045 , Finesurf 20 3 201222149 /upif 7085, Blaunon DSP-12.5, Blaunon DT-03, Blaunon L-205,

Blaunon LPE-1007, Blaunon 0-205, Blaunon S-202, Blaunon S-204, Blaunon S-207, Blaunon S-205T (Aoki Oil Industry), EMULGEN A-500, EMULGEN PP-290, Amiet 102, Amiet 105 , Amiet 302, Amiet 320, Aminon PK-02S, Emanon CH-25'Emulgen 104P'Emulgen 108'Emulgen 404'Emulgen 408, Emulgen A-60, Emulgen A-90, Emulgen B-66, Emulgen LS-106 ' Emulgen LS-114, Rheodol 430V, Rheodol 440V, Rheodol 460V, Rheodol TW-S106, Rheodol TW-S120V, Rheodol Super TW-L120 (Kao), Newkalgen 3000S, Newkalgen FuS-3PG, Newkalgen FE-7PG, Pionin D-6414 ( Zhuben Oil), DYNOL604, Olfine PD-002W, Surfynol 2502, Surfynol 440, Surfynol 465, Surfynol 485, Surfynol 61 (Kaixin Chemical Industry), etc. In addition, there are: Phosphanol ML-200, Emal 20T, E-27, Neopelex GS, Pelex NBL, Pelex SS-H, Pelex SS-L, Poiz 532A, Lamutel ASK, Latemul E-118B, Latemul E-150 (King (share)), EMULSOGEN COL-020, EMULSOGEN COL-070, EMULSOGEN COL-080 (Clariant), Plysurf A208B, Plysurf A210B, Plysurf A210G, Plysurf A219B, Plysurf AL, Lavelin FC-45 (First Industrial Pharmaceutical), Pionin A-24-EA, Pionin A-28-B, Pionin A_29_M, Pionin A-44-B, Pionin A-44TW (bamboo fat), ΑΚΥΡΟ RLM100NV, ΑΚΥΡΟ RLM45, ΑΚΥΡΟ RLM45NV, ECT ECT-3, ΑΚΥΡΟ 21

201222149 ^ / -r«/ i-fXA ECT-3NEX, ΑΚΥΡΟ ECT-7, Hosten HLP, Hosten HLP-1,

Hosten HLP-TEA (Sakamoto Surfactant Industry). These particle dispersants may be used singly or in combination of two or more. The content of the particle dispersant in the photosensitive composition is preferably 1 mass% / ❶ to 1% by mass, more preferably 5 mass% / 〇 to 80 mass%, more preferably in terms of hollow or porous particles. 1〇% by mass to 6〇% by mass. Specifically, in the case where the particle dispersant is a dispersion resin, the amount thereof is preferably 5 mass% / 〇 to mass%, more preferably 10 mass% to 80 mass%, based on the hollow or porous particles. [3] (B) Compound which produces an active species by irradiation with active light or radiation The photosensitive composition contains (B) a compound which produces an active species by irradiation with active light or radiation. The photosensitive composition of the present invention which imparts photosensitivity by containing the compound (B) can be suitably used for a photoresist, a color resist, an optical coating material or the like. The compound (8) can be suitably exemplified by a photopolymerization initiator. The above active species may suitably be a free radical, a cationic species or an anionic species (more preferably a base or a cationic species). Hereinafter, the photopolymerization initiator will be described in detail. The photopolymerization initiator is not particularly limited and may be appropriately selected from known photopolymerization agents, for example, a photopolymerization initiator which is preferably photosensitive to an ultraviolet region to a visible light, which may be an increase in photoexcitation. The sensitizer produces some action and the activity of the cake-like free radicals may also be an initiator which initiates cationic polymerization according to the type of monomer 22 201222149 jy / HDpif. Further, the photopolymerization initiator preferably contains at least one component, and the above-mentioned forming blade has a molecular absorption coefficient of at least about 50 in a range of about 200 nm to 8 Å (more preferably 1/4 to 45 Å). . The photopolymerization initiator may, for example, be a photoradical polymerization initiator and a photocationic polymerization initiator, and is preferably a photoradical polymerization initiator. (Photoradical polymerization initiator) The photoradical polymerization initiator may, for example, be a halogenated hydrocarbon derivative (for example, a compound having a triazine skeleton or a compound having an oxadiazole skeleton) Hexaar ibiimidazole compounds, loPhine dimers, benzoins, ketals, 2,3-dialkyldione compounds , organic peroxides, sulfides, disulfide compounds, azo compounds, rotten acid salts, inorganic complexes, coumarins (c〇umarin), ke (ketone) compounds (dibenzophenone ( Benzophenone), thioxanthone, thi〇chromanone, anthr (uinone), aromatic onium salt, fluoroamine Fluoroamine compounds, ketoxime ether, acet〇phenone (amino acetophenone compound, basic acetamidine compound), acyl phosphine oxide, etc. Fatty compounds such as phosphine compounds and oxime derivatives Wait. Examples of the halogenated hydrocarbon compound having a triazine skeleton include a compound described in Bull. Chem. Soc. Japan, 42, 2924 (1969), and a compound described in British Patent No. 1,388,492, 曰本23 201222149 The compound described in JP-A-53-133428, the compound described in the specification of German Patent No. 3337024, the compound described in FC Schaefer et al., J Org. Chem.; 29, 1527 (1964), Japanese Patent Laid-Open No. 62- The compound described in the publication of the Japanese Patent Publication No. Hei 5-281728, the compound described in the Japanese Patent Publication No. Hei. The compound described in the above-mentioned specification of the above-mentioned U.S. Patent No. 4,212,976 is exemplified by a compound having an oxadiazole skeleton (for example, 2·3 gas thiol_5_benyl-1,3,4-π oxo sigma, 2-dimethyl fluorenyl-5-(4-phenylphenyl)_ι,3,4_π oxazolidine, 2-terbomethyl-5-(1-naphthyl)-1,3,4_ox Diterpenoid, 2-trimethylmethyl _5_(2_naphthyl)-1,3,4-oxadiazole, 2-tribromoindolyl-5-phenyl-ι, 3,4-oxazide, 2_Dibromomethyl-5-(2-naphthyl)-1,3,4-oxadiazole; 2-trichloromethyl_5-styryl-1,3,4-oxadiazole, 2- Trichloromethyl _5_(4_gasstyryl η, 3,4 oxadiazole, 2-triseodecyl-5-(4-decyloxystyryl)_u, 4 · oxadiazole, 2 tra-trimethylmethyl-5-(1-naphthyl)-1,3,4-oxadiazole, 2-triseodecyl-5-(4-n-butoxystyryl)-1,3 , 4-oxadiazole, 2-tribromomethyl _5-styryl·1) 3,4-oxadiazole, etc.). , examples of benzoin include: benzoin, benzoin scales, benzoin scream, benzoin isopropyl scales, benzyl ketal, benzoin benzoic acid 曰 息 息 曱 增 增 增 增 增 旨 旨 安 安 安 安Shout, benzoin and benzoin. Examples of the rotten acid salt include Japanese Patent No. 2764769, Japanese Patent Laid-Open Publication No. 2002-U6539, and Kunz, and others.

The compound described in the organoborate described in Rad Tech' 98. Proceeding April, S. 24 201222149, pages 19 to 22 (1998, Chicago). For example, the compounds described in paragraphs [0〇22] to [〇〇27] of the above-mentioned Japanese Patent Laid-Open Publication No. 2-116539. In addition, Japanese Laid-Open Patent Publication No. Hei 6-348011, Japanese Patent Laid-Open No. Hei No. Hei No. Hei 7-128785, Japanese Patent Laid-Open No. Hei No. Hei 7 No. Hei. Specific examples of the organoboron transition metal complexing complexes and the like are disclosed in JP-A-7-292A, and specific examples thereof include ion complexes of cationic dyes. Further, examples of the radical polymerization initiator other than the above include an acridine derivative (for example, 9-phenylacridine, bis(9,9--acridinyl)heptane, etc.), N. _Phenylglydamine (N-phenylglydne), etc., polyhalogen compounds (for example, tetrabromofossil, sylvestre, phenyl trimethyl ketone, etc.), coumarins (for example, ^ benzo _7_Diethylamino coumarin (3-(2-benzofuroyl)-7.diethylaminocoumarin) ^ mercapto)-7-(1-pyrrolidinyl) coumarin, 3_ Alum-based diacetyl coumarin, 3-(2-methoxyphenylhydrazinyl)phosphonium diethylamine coumarin: diammonium phenyl ketone) _7_diethylamine coumarin , 3, 3, _ county (: - n-propoxy fragrant sulphate), 3, 3 '· county bis (7_diethylamine coumarin 'benzimidyl-7-methoxycoumarin , 3_(2_furanyl fluorenyl) _ two = fragrant sulphate, 3 · (4 · diethylamino cinnamide) · 7 - diethylamine scent, ^ methoxy-3- (3-pyridyl Bite carbonyl) coumarin, 3_benzoyl _5, _ _ propylene coumarin, 7. benzotris (2- coumarin) In addition, Japanese patent special = 25 201222149 straight irf Japanese Patent Laid-Open No. 7-271028, Japanese Patent Publication No. 363, Japanese Patent No. 2-6, No. 2, No. 2, No. 2, No. 3, No. 3, No. 3, No. 2, No. 2, No. 2, No. 2, No. 2, No. A mixture of fragrant and soy (for example, bis(2 from tridecylphenyl)-phenylphosphine oxide, bis(6-monomethoxyphenyl)-2,4,4_3曱-ylphenylphosphine oxide Lucirm TPO, etc., and metallocene (Calm (3)) (for example, bis(η5-2,4-cyclopentadienyl)-yl)-bis (2,6_ Difluoro·3·(1Η 小 small base) _ phenyl) titanium, η5-cyclopentadienyl cumyl iron (1 吟 敦 趟 趟 1- (1-), etc., Japanese Patent Laid-Open No. 53· Japanese Patent Publication No. 133428, Japanese Patent Publication No. SHO 57_1S19, Japanese Patent Publication No. WO No. WO No., and Japanese Patent No. 3615455. The ketone compound may, for example, be benzophenone or ketone. Dibenzophenone, 3-mercaptobenzophenone, 4-methyldibenzophenone, 4-methoxybisbenzophenone, 2-gasbenzophenone, 4-benzoicone, 4_bromodibenzophenone, 2_protective benzophenone, 2- Oxycarbonyldimercapto ketone, benzophenone tetradecanoic acid or dibenzophenone tetradecanoic acid tetradecyl ester, 4,4'-bis(dialkylamino)benzophenone (for example, 4, 4'-bis(diamidoamino)benzophenone, 4,4,-bisbiscyclohexylamino) benzophenone, 4,4'-bis(diethylamino)benzophenone, 4 , 4'-bis(dihydroxyethylamino)benzophenone, 4-decyloxy-4'-diaminoaminobenzophenone, 4,4,-didecyloxybenzophenone, 4 - bis-amino benzophenone, 4-dimethylaminophenyrene, benzoin (benzil), hydrazine, 2-tert-butyl fluorene, 2-mercapto oxime roll, phenanthrenequinone ( Phenanthraquinone ), xanthone, thioxanthone, 2·gas-嗟° ketone, 2,4-diethyl ° " ton, fluorenone,

26 201222149 3y/45pif benzyl-diammonium-K4_morphinylphenyl)butanone, 2_fyl]_[4_(methylthio)phenyl]-2-like propyl, 2,yl 2-methyl-methylmethyl)phenyl] silk, benzoin, rest; # (eg, benzoin ether, benzoin ethyl ether, benzoin propyl ether, benzoin isopropyl ether, benzoin benzoquinone, dimethyl condensate Ketone), ^丫. Ketone (add·), gas sputum S, N-decyl decandone, time base decidient _, N butyl _ chlorinated cisplatin and so on. The radical polymerization initiator is preferably a compound selected from the group consisting of an aminophenylbenzene compound, a acetophenone compound, a mercaptophosphine compound, and a silk compound. More specifically, for example, an amino acetophenone-based starter described in JP-A-10-291969, a sulfhydryl phosphine oxide-based starter described in Japanese Patent No. 4,258,899, and As the oxime-based initiator, a compound described in JP-A No. 2-233842 can also be used. As the amino acetophenone-based initiator, IRGACURE-907, IRGACURE-369, and IRGACURE-379 (trade name 'both manufactured by BASF Japan Co., Ltd.) are commercially available. Further, as the mercaptophosphine-based initiator, IRGACURE-819 or DAROCUR-TPO (trade name, all manufactured by BASF Corporation) can be used as a commercial product. The hydroxyacetophenone compound is preferably a compound represented by the following formula (V).

27

201222149 /UpiX In the formula (V), Rv1 represents a hydrogen atom, an alkyl group (preferably an alkyl group having 10 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 10 carbon atoms), or a divalent organic compound. base. When Rv1 is a divalent organic group, it means that the two photoactive hydroxyacetophenone structures (that is, the structure in which the substituent Rv1 is removed from the compound represented by the general formula (V)) are dimerized via Rv1. Things. Rv2 and RV3 each independently represent a hydrogen atom or an alkyl group (preferably an alkyl group having 1 to 10 carbon atoms). Further, Rv2 and RV3 may be bonded to form a ring (preferably a ring having 4 to 8 carbon atoms). The above-mentioned alkyl group as Rv1 and alkoxy group, alkyl group as Rv2 and Rv3, and a ring formed by combining Rv2 and Rv3 may further have a substituent. Examples of the hydroxyacetophenone compound include 2-hydroxy-2-mercapto-1-phenylpropan-1-one (DAROCURE 1173), 2-hydroxy-2-methyl-1-phenylbutan-1-嗣, 1-(4-fluorenyl)-2-yl-2-ylpropan-1-ene,1·(4-isopropylphenyl)-2-mercaptopropan-1- Ketone, 1-(4-butylphenyl)-2-yl-2-mercaptopropan-1-one, 2-carboxy-2-mercapto-1-(4-octylphenyl)propene 1-ketone, 1-(4-dodecylphenyl)-2-mercaptopropan-1-one, 1-(4-decyloxyphenyl)-2-methylpropane-yt--1- J, 1-(4-decylthiophenyl)-2-mercapto-di-butyl-1-yl, 1-(4-chlorophenyl)-2-hydroxy-2-mercaptopropan-1-one, 1 -(4-bromophenyl)-2-hydroxy-2-methylpropanol-1--1-iso, 2-carbyl-1-(4-phenylphenyl)-2-mercaptopropan-1 -嗣,1_(4_-Amidinophenyl)-2-yl-2-ylpropan-1-one, 1-(4-o-ethoxyphenyl)-2-yl-2- Mercaptopropan-l-_, 1-cyclohexyl phenyl ketone (IRGACURE 184), 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2_indolyl-1 - Propane-1-one (IRGACURE 2959) and the like. In addition, commercially available α-pyridylacetophenone compounds can also be used.

28 201222149 jy ι^^]}ίί The polymerization initiators obtained by BASF Japan under the following trade names: IRGACURE 184, DAROCURE 1173, IRGACURE 127, IRGACURE 2959, IRGACURE 1800, IRGACURE 1870 and DAROCURE 4265. A mercaptophosphine initiator can be used as a commercial product.

IRGACURE-819, IRGACURE-819DW, DAROCUR-TPO (trade names 'all manufactured by BASF Japan). Further, a phosphine-based initiator described in Japanese Laid-Open Patent Publication No. 2009-134098 can also be used. Examples of the oxime derivative or the like which are suitably used as a photopolymerization initiator in the present invention include 3-benzylideneoxyimidobutane-2-ketone and 3-acetoxyiamine butyl ketone. _2-ketone, 3-propenyloxyimidobutane-2-one, 2-ethyloxyiminopentane-3-ol, 2-ethyloxyimino-indole Propane-1-one, 2-benzylideneoxyimido-indole-phenylpropane-nonanone, 3-(4-sulfonium sulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxyimido-1-phenylpropan-1-one and the like. Fat compounds can be listed as: j· cs Perkin II (1979) pp. 1653-1660, J. c. S. Perkin II (1979) pp. 156-162, Journal of Photopolymer Science (1995) ρρ2〇2·232, the compound described in Japanese Patent Laid-Open Publication No. 2000-66385, Japanese Patent Laid-Open No. 2000-80068, Japanese Patent Laid-Open No. Hei. A compound or the like described in each of the publications of JP-A-2006-342166. 〇 〇 I IRGACURE-CXXE01 (BASF 曰本制制 29 201222149

It is also suitable for use by JY I 'T^UkL), IRGACURE-OXE02 (manufactured by BASF Corporation), CGI-124 (manufactured by BASF Japan), and CGI_242 (manufactured by BASF Japan). Further, the cyclic fatty compound described in the Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. The most preferred one is a compound having a specific substituent (IV) as disclosed in Japanese Laid-Open Patent Publication No. Hei. No. 2007-269779, or a sulfur compound having a thioaryl group as shown in Japanese Patent Laid-Open Publication No. 2009-191. you. In other words, the 'month-deficient compound is preferably a compound represented by the following formula (1), and may be a compound or a compound of the (8) body. Body compound, can also be a mixture of (8) body and (Ζ) body

.OR (I) SAr

Representation = monovalent represents valence substituent, and the valence substituent represented by group A and hydrazine is preferably a monovalent non-metal atom 201222149 • j ^ r-r^yif carbonyl. Additionally, the groups may have more than one substituent. Further, the above substituent may be further substituted with other substituents. The substituents may be exemplified by a _ atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, a decyloxy group, a decyl group, an alkyl group, an aryl group and the like. The alkyl group which may have a substituent is preferably an alkyl group having a carbon number of 丨3 to 3 Å, and specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group or a dodecyl group can be exemplified. , octadecyl, isopropyl, isobutyl, t-butyl, tert-butyl, 1-ethylpentyl 'cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, benzene Phenoyl, 1-naphthoylmethyl, 2-naphthylmethyl, 4-methyl sulfanyl phenacyl , 4-phenylsulfanylphenyl fluorenyl, 4-diamyl phenyl fluorenyl, 4-cyanobenzoquinone methyl, 4-mercaptophenylhydrazine methyl, 2-mercapto Benzamidine methyl, 3-fluorophenylhydrazine methyl, 3_trifluoromethylbenzhydryl, and 3-nitrobenzylidene. The aryl group which may have a substituent is preferably an aryl group having 6 to 30 carbon atoms, and specific examples thereof include a phenyl group, a biphenyl group, a 1-naphthyl group, and a 2- 2-naphthyl, 9-anthryl, 9-phenanthryl, 1-pyrenyl, 5-naphthacenyl, 1-indenyl, 2-azulenyl, 9-fluorenyl, terphenyl, quarterphenyl, o-phenyl O-tolyl), m-tolyl and p-tolyl, xylyl, o-cumenyl, m-isopropyl-phenyl M-cumenyl) and p-cumenyl, mesityl, and cyclopentadiene 31 201222149 pentalenyl, binaphthalenyl, ternaphthalenyl , quarternaphthalenyl, heptalenyl, biphenylenyl, indacenyl, fluoranthenyl, Acenaphthylenyl, ethylene thiol (ace Anthrylenyl), phenalenyl, aryl, anthryl, bianthracenyl, teranthracenyl, quarteranthracenyl 'anthraquinolyl' , phenanthryl, triphenylenyl, pyrenyl, chrysenyl, naphthacenyl, pleiadenyl, picenyl, flower base (perylenyl), pentaphenyl, pentacenyl, tetraphenylenyl, hexaphenyl, hexacenyl, rubicenyl, sulfhydryl (coronenyl), trinaphthylenyl, heptaphenyl, heptacenyl, pyranthrenyl, and ovalenyl ° thiol groups with substituents The fluorenyl group having a carbon number of 2 to 20 is specifically exemplified by an ethyl group, a propyl group, a butyl group, a trifluoroethyl group, a pentamidine group, a benzoinyl group, a 1-naphthyl group, and 2 -naphthyl fluorenyl, 4-mercaptosulfanyl thiol, 4-benyl sulphur Basic base, 4-diaminophenyl benzoate, 4-diethylaminobenzhydryl, 2-chlorophenylindenyl, 2-mercaptophenylhydrazine, 2-decyloxybenzene Sulfhydryl, 2-butoxybenzhydryl, 3-phenylphenylhydrazine, 3-trifluorodecylbenzhydryl, 3-cyanobenzoinyl, 3-nitrophenylhydrazine 8 201222149 Anthracenyl, 4-fluorophenylindenyl, 4-cyanobenzoinyl, and 4-hydrazino. The alkoxycarbonyl group which may have a substituent in the soil is preferably an alkoxy group having a carbon number of 2 to 2 Å, and specifically, a methoxy group, an ethoxy group, a propoxy group, a butoxy group is exemplified. Rebel, hexyloxycarbonyl, octyloxy, fluorenylcarbonyl, octadecyloxycarbonyl, and trifluoromethoxycarbonyl. Soil + as an aryloxycarbonyl group which may have a substituent, specifically, a phenoxy group, a 1-naphthyloxycarbonyl group, a 2-naphthyloxycarbonyl group, a 4-mercaptothiol phenoxycarbonyl group , 4-phenylsulfanylphenoxycarbonyl, 4-diamendyloxycarbonyl, 4-diethylaminooxycarbonyl, 2-chlorophenoxycarbonyl, 2-nonylphenoxycarbonyl , 2-decyloxyphenoxycarbonyl, 2-butoxyphenoxy, benzyl, 3-aphenoxycarbonyl, 3-trifluoromethylphenoxycarbonyl, 3-cyanophenoxycarbonyl, 3-Nitrophenoxycarbonyl, 4-fluorophenoxycarbonyl, 4-cyanophenoxycarbonyl, and 4-methoxyphenoxycarbonyl. The heterocyclic group which may have a substituent is preferably an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom. Specifically, s can be exemplified by: thienyl, benzo[b]nonenyl (benZ〇[b]thienyl), naphtho[23_b]thienyl (naphtho[2,3-b]thienyl), thiophene Thienthrenyl, furyl, pyranyl, isobenzofumnyl, chr〇menyl, xanthenyl, morphine (phenoxathiinyl), 2H-σ ratio 0H-pyrrolyl, pyrrolyl (pyrr〇iy丨), imidazolyl (imidaz〇lyl). Pyrazolyl, pyridyl, pyrazinyl, 33 201222149 pyrimidinyl, pyridazinyl, indolizinyl, is吲哚ind 〇lyl ), 3H-indolyl, indolyl, 1Η-σ3 β sitting (indazolyl), 0 吟 吟 (purinyl), 4H-quinolizinyl ), isoquinolyl, quinolyl, phthalaziny 1, naphthyridinyl, σ 奎. qUinoxaninyi, quinazolinyl, cinn〇linyl, pteridinyl, 4aH-carbazolyl, carbazolyl, beta - Carbolinyl, phenanthridinyl, acridinyl, perimidinyl, phenanthrolinyl, phenazinyl, phenanthrene-methyl Phenarasazinyl ), isothiazolyl, phenothiazinyl, isosazolyl, furazanyl, phenoxazinyl, isobenzodihydrogen Isochromanyl, chromanyl, pyrrolidinyl, pyrrolinyl, imidazolidinyl, imidazolinyl, ° ratio. Sitting σ定基基 (pyraz〇iidinyl), π比嗤°林基 (pyrazolinyl), brittle base (piperidyl), pie 0 基 基 (piperazinyl), π 引引丁丁(indolinyl), 异°弓布朵淋Isoindolinyl, quinuclidinyl, morpholinyl, and thioxanthonyl. Specific examples of the alkylthiocarbonyl group which may have a substituent include a methylthiocarbonyl group, a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, and a octyl group.

S 34 201222149 jy A thiol group, a thiol group, an octadecylthio group, and a trifluorosulfonyl group. Specific examples of the arylthio group which may have a substituent include 1-naphthylthiocarbonyl, 2-naphthylthiocarbonyl, 4-mercaptosulfanylphenylthiocarbonyl, 4-phenylsulfane Phenylthiocarbonyl, 4-dimethylaminophenylthiocarbonyl, 4-diethylaminophenylthiocarbonyl, 2-chlorophenylthiocarbonyl, 2-mercaptophenylthiocarbonyl, 2-methoxy Phenylthiocarbonyl, 2-butoxyphenylthiocarbonyl, 3-p-phenylthiocarbonyl, 3-difluoromethylphenylthiocarbonyl, 3-cyanophenylthiocarbonyl, 3-nitrophenylthio A carbonyl group, a 4-fluorophenylthiocarbonyl group, a 4-cyanophenylthiocarbonyl group, and a 4-methoxyphenylthiocarbonyl group. The monovalent substituent represented by the above B represents an aryl group, a heterocyclic group, an aryl group or a heterocyclic green. Additionally, the filaments may have more than one η. The above substituents can be exemplified. Further, the above substituent may be further substituted with other substituents. Among them, the structure shown below is particularly preferable.

Hyun base organic base can be scaled: carbon number 丨 ~ (four) stretch, these groups can be ~ hexyl, broken number 2 ~ 12 an extended alkynyl group. More than one substituent. The substituents may be exemplified by the substituents described in 35 201222149. Further, the above substituents may be further substituted with other substituents. Wherein 'in terms of improving the sensitivity and suppressing the coloration caused by the passage of the heating time, 'A is preferably an unsubstituted alkylene group, an alkyl group (for example, anthracenyl, ethyl, tert-butyl, ten) Dialkyl) substituted alkylene, alkylene substituted by alkenyl (eg, vinyl, allyl), aryl (eg, phenyl, p-tolyl, diphenyl, cumene) Alkyl, naphthyl, anthracenyl, phenanthryl, styryl) substituted alkylene. The aryl group represented by the above Ar is preferably an aryl group having 6 to 30 carbon atoms, and may have a substituent. The substituent may be the same as the substituent introduced into the substituted aryl group exemplified as the specific example of the aryl group which may have a substituent. Among them, a substituted or unsubstituted phenyl group is preferred in terms of improving the sensitivity and suppressing the coloring caused by the passage of the heating time. In the formula (I), in terms of sensitivity, the structure of "SAr" formed of the above Ar and the adjacent S is preferably the structure shown below. Further, Me represents a thiol group, and Et represents an ethyl group.

S 36 201222149 jy /*tjpxf

SH C〇〇H

The "ό " 0 month loss compound is preferably a compound represented by the following formula (5).

(Π) (Formula (8), R&X independently represents a monovalent substituent and Y each independently represents a divalent organic group, Ar S represents an aryl group, and n is an integer of 〇~5.) In the formula (II) R, VIII, and 1 are synonymous with R, A, and Ar in the above formula (1), and preferred examples are also the same. 37 201222149 The monovalent substituent represented by the above hydrazine may, for example, be an alkyl group, a ^yl group 'oxy group, an oxy group, an alkoxy group, an amine group: a hetero group or a dentate atom. Further, these groups may have one or more substituents, and the group may be substituted with the above substituents. Further, the above-mentioned screaming base may be further substituted by other substituents. Among these groups, X is preferably an alkyl group in terms of solvent solubility and absorption efficiency in a long wavelength region. Further, n in the formula (2) represents an integer of 〇 to $, and is preferably an integer of 〇 〜2. The divalent organic group represented by the above hydrazine may be exemplified by the structures shown below. Further, among the groups shown below, "*" indicates the position at which the carbon atoms adjacent to each other in the above formula (η) are read.

From the viewpoint of och3, it is preferably a structure shown below, which is a highly sensitive structure.

38 B 201222149 jy /Hjpif

Further, the fatty compound is preferably a compound represented by the following formula (in).

(In the formula (III), R and X each independently represent a monovalent substituent, A represents a divalent organic group, Ar represents an aryl group, and η is an integer of 0 to 5.) R, X in the formula (III) A, Ar and η are synonymous with R, X, A, Ar and η in the above formula (II), and preferred examples are also the same. Hereinafter, specific examples (Β-1) to specific examples (Β-10) of the ruthenium compound which are suitably used are shown below, but the present invention is not limited to these specific examples. 39 201222149

The ruthenium compound is a compound having a maximum absorption wavelength in a wavelength range of 350 nm to 500 nm, preferably a compound having an absorption wavelength in a wavelength range of 360 nm to 480 nm, and particularly preferably a compound having a high absorbance at 365 nm and 405 nm. . From the viewpoint of sensitivity, the molar absorption coefficient of the cerium compound at 365 nm or 4 〇 5 is preferably 3 〇〇〇 to 3 〇〇〇〇〇, more preferably 5, (8) 〇

S 40

201222149 I ~ 300,000, especially good for loooo ~ 200,000. The molar absorption coefficient of the compound can be determined by a known method, and specifically, for example, an ultraviolet-visible spectrophotometer (Carry-5 spectrophotometer manufactured by Varian Co., Ltd.), using an ethyl acetate solvent, and 0.01 g is preferably used. The concentration of /L was measured. (Photocationic polymerization initiator) The photocationic polymerization initiator may be, for example, a compound which generates a substance which initiates polymerization of photocations by receiving an energy ray such as ultraviolet rays, and is preferably a rust salt or more preferably a fragrant salt. The cerium salt is particularly preferably an aryl sulfonium salt and an aryl sulfonium salt. Specific examples of the rust salt include diphenyl hydrazine, 4 fluorenyl diphenyl fluorene, bis(4-methylphenyl) fluorene, bis(4_t-butylphenyl) fluorene, and bis (ten). Dialkyl phenyl) fluorenylphenyl, diphenyl thiophenoxy phenoxy phenyl, bis[4_(diphenyl), phenyl] sulfide, bis[4_(bis(4_(2) Superethyl ethyl)phenyl) sulfhydryl)_^yl 1 sulfide, η5_2,4_(cyclopentadienyl)fluorene, 2,3,4,5,6-ηΗmethylethyl ruthenium (1) Specific examples of the anion include a tetrafluoro side acid salt, a second F4 acid, a wide 6·), a hexafluoroantimonate (sbF6·), a six gas s, a hexachloroantimonate (SbCV), and a perchlorate ion. t gas methyl sulphate ion (CF3S 〇 3 ·), fluoroheteroate ion tearing acid anion, three open two salt = example 'may be listed: 曰 专利 专利 专利 专利 专利 专利 专利 专利 专利 专利 — — 去 去 去 去 去 去 去Kaisho 50-158680, aromatic halonium salt; 曰201222149 · - - Λ', Japanese Patent Laid-Open No. SHO 50.151997, Japanese Patent Laid-Open No. 52-30899, Japanese Patent The VI Α aromatics described in Japanese Patent Laid-Open Publication No. SHO-5 5 125105, and the like. Japanese Patent Laid-Open Publication No. Hei. No. 58698, and the like. Japanese Patent Publication No. 3, the like, Japanese Patent Laid-Open No. 56-149402, Japanese Patent Laid-Open No. 57-19 Aromatic diazonimn salt described in the publication of the Japanese Patent Publication No. SHO 49-17〇4〇, and the like; The thiopyranium rust salt (thi〇byrylium sal 〇 ', iron/propyl thief complex, yt complex/photodecomposition sin compound starter described in the specification of Patent No. 4,139,655, halogenated A hydrogen-generating halide, an o-nitrobenzyl ester compound, a quinone imide sulfonate compound, a bis-hydrogenated azolyl compound, and a bisphosphonate compound. A photocationic polymerization initiator which can be used in the present invention For example, a chemically amplified photoresist or a compound used in photocationic polymerization can be widely used (refer to "Organic Materials for Imaging" edited by the Organic Electronic Materials Research Society, published by Bunshin Corporation (1993)"第187页~第192 pages).

These compounds can be combined with the THE CHEMICAL SOCIETY OF JAPAN Vol. 71 No. 11, 1998, and the Organic Electronic Materials Research Society and published by Bunshin (1993). In the material, the light 117 ion polymerization initiator contained in the same manner is easily synthesized by a known method. Commercial products of photocationic polymerization initiators include UVI-6950, UVI-6970, UVI-6974, UVI-6990, UVI-6992 (above by Union)

S 42 201222149

Carbide manufactured by Adeka Optomer SP-150, Adeka Optomer SP-151, Adeka Optomer SP-170, Adeka Optomer SP-171, Adeka Optomer SP-172 (made by ADEKA); Irgacure 26 IRGACURE ΟΧΕ ( Π, IRGACURE CGI-1397, IRGACURE CGI-1325, IRGACURE CGI-1380, IRGACURE CGI-1311, IRGACURE CGI-263, IRGACURE CGI-268, IRGACURE CGI-1397, IRGACURE CGI-1325, IRGACURE CGI-1380, IRGACURE CGI- 1311 (above manufactured by BASF Japan); CI-2481, CI-2624, CI-2639, CI-2064 (above manufactured by Japan Soda (share)); CD-1010, CD_1011, CD-1012 (above by Sartomer Corporation) Manufacturing); DTS-102, DTS-103, NAT-103, NDS-103, TPS-103, MDS-103, MPI-103, BBI_103 (above manufactured by Green Chemical Co., Ltd.); PCI-061T, PCI-062T , PCI-020T, PCI-022T (above manufactured by Sakamoto Chemical Co., Ltd.); PHOTOINITIATOR 2074 (manufactured by Rhodia Corporation); UR-1104, UR-1105, UR-1106, UR-1107, UR-1113, UR -1114, UR-1115, UR-1118, UR-1200, UR-1201, UR-1202, UR-1203, UR-1204, UR-1205, UR-120 7. UR-1401, UR-1402, UR-1403, UR-M1010, UR-M1011, UR-M10112, UR-SAIT01, UR-SAIT02, UR-SAIT03, UR-SAIT04, UR-SAIT05, UR-SAIT06, UR-SAIT07, UR-SAIT08, UR-SAIT09, UR-SAIT10, UR-SAIT11, UR-SAIT12, UR-SAIT13, UR-SAIT14, UR-SAIT15, UR-SAIT16, UR-SAIT22, UR-SAIT30 (above URAY company) and so on. Among these commercial products, 43 201222149 UVI-6970 λ UVI-6974 ' Adeka Optomer SP-170 ' Adeka

Optomer SP-Πΐ . Adeka Optomer SP-172 'CD-1012 ' MPI-103 can use the composition containing these to exhibit high light hardening sensitivity. The above photocationic polymerization initiators may be used alone or in combination of two or more. The photoradical polymerization initiator or the photocationic polymerization initiator may be used singly or in combination of two or more. The content of the compound (B) based on the total solid content of the photosensitive composition is preferably from 0.1% by mass to 50% by mass, more preferably from 5% by mass to 5% by mass, even more preferably from 1% by mass to 5% by mass. [4] (C) A compound photosensitive composition which reduces the solubility in a developing solution containing an organic solvent by the action of an active species, contains (C) a function of reducing the activity in a developing solution containing an organic solvent by the action of an active species Solubility compound. / Hereinafter, a compound which reduces the solubility in an organic solvent developing solution by the action of an active species will be described in detail. As the compound which reduces the solubility in the liquid containing the organic solvent by the action of the active species, a polymerizable compound can be suitably mentioned. ‘If the polymerizable compound is a low molecular compound, it may be a resin having an I octa group, but the hollow or porous particles are easily dispersed in the film. In view of the fact that the polymerizable compound preferably contains a polymerizable group, the poly-complex preferably contains a low molecular compound and has polymerizability from the viewpoint of easy adjustment of sensitivity and strength. In the case of the polymerizable compound, for example, an addition polymerizable compound having at least one ethylahydrate-unsaturated double bond is exemplified. Specifically, it is selected from compounds having at least one, preferably two or more terminal ethylenically unsaturated bonds. Such a compound group is a well-known compound in the industrial field, and these compounds can be used without particular limitation in the present invention. The polymerizable compound is preferably a low molecular weight compound having a molecular weight of 2,000 or less, more preferably a low molecular weight compound of 15 Å or less, and particularly preferably a low molecular weight compound having a molecular weight of 900 or less. Here, the term "low molecular compound" in the present invention does not mean that a compound having an unsaturated bond (so-called polymerizable monomer) is cleaved by using an initiator to cause an unsaturated bond to be cleaved. The term "polymer or nutrient obtained by growth" refers to a compound having a molecular weight of 2 Å or less (more preferably 1,500 or less, particularly preferably 900 or less) (substantially has no molecular weight distribution) compound of). Further, the molecular weight is usually 100 or more. Examples of the polymerizable compound include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, decylene succinic acid, crotonic acid, methacrylic acid, maleic acid, etc.) or esters thereof, guanamines, and the like. Preferably, it is an ester of an unsaturated carboxylic acid and an aliphatic polyol compound, and an amide of an unsaturated carboxylic acid and an aliphatic polyamine compound. Further, an unsaturated carboxylic acid ester having a hydroxyl group such as a hydroxyl group, an amine group or a fluorenyl group, or an addition reaction of a guanamine with a monofunctional or polyfunctional isocyanate or epoxy group, or a monofunctional or polyfunctional A dehydration condensation reaction product of a carboxylic acid or the like is also suitably used. Further, a subtractive reaction of an electrophilic substituent such as an isocyanate=epoxy group or an addition reaction of a guanamine with a monofunctional or polyfunctional alcohol, an amine or a thiol is carried out in 45 201222149 - -· --1--- and the substitution of unsaturated sulphuric acid vinegar or miscellaneous compounds with de-hetero substituents such as i- or xyl-pinoxy groups and monofunctional elixirs, amines, thiols Further, as another example, a compound group of unsaturated Wei, styrene, and Ethyl ether may be substituted for the above-mentioned unsaturated ship. The compound described in Paragraph No. 〇〇95 to Paragraph No. 〇1〇8 of JP-A-2009-288705 is used in the present invention. The mercapto acrylate may, for example, be tetradecyl diol dimercapto acrylate. Diethylene glycol dimercapto acrylate, neopentyl glycol dimercapto acrylate, triterpene propyl trimethacrylate, trishydroxy ethane tridecyl acrylate, ethylene glycol dimethyl Acrylate, 1,3-butanediol dimercapto acrylate, hexanediol dimercaptopropyl Acid ester, pentaerythritol dimercapto acrylate, pentaerythritol tridecyl acrylate, pentaerythritol tetradecyl acrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbus Sugar alcohol tetradecyl acrylate, bis[p-(3-methylpropenyloxy-2-hydroxypropyloxy)phenyl]didecyl decane, bis-[p-(mercapto propylene methoxy ethoxylate) Ethylene oxide (EO) modified or propylene oxide (PO) modified body of phenyl]didecyl decane and the like Itaconic acid ester: ethylene glycol dimercaptosuccinate, propylene glycol dimethylene succinate, 1,3-butylene glycol dimercapto butyl Diacid ester, 1,4-butanediol diquinone succinate, tetradecylene glycol dimethylene succinate, pentaerythritol dimethylene succinate,

46 201222149 Sorbitol tetradecyl butyl butyl _ and so on. The butyric acid vinegar includes ethylene glycol dibutenoate, tetramethylene glycol bisenoate, pentaerythritol dimethyl acrylate, sorbitol tetrabutyl acrylate, and the like. The methacrylates are: ethylene glycol diisobutylene, hydrazine Sa, pentaerythritol dimethacrylate, sorbitan tetracene, etc. Maleic acid|There are: ethylene glycol dimaleic acid g|, triethylene glycol mono maleate, pentaerythritol di maleate, sorbitol tetramethylene Acid esters, etc. As another S-related, for example, it is also suitable for (4): Japanese Patent Special Publication No. 51_47334, Japanese Patent Special Opening Ceremony ^962^, the aliphatic alcohol-based scorpion, or Japanese Patent Laid-Open No. 59.524, Japanese Patent Japanese Laid-Open Patent Publication No. 59-524 discloses an aromatic system, and a vinegar containing an amine group is described in Japanese Patent No. '4. Further, the above ester monomers may also be used as a mixture. Further, specific examples of the monomer of the 'aliphatic polyamine compound and the decylamine of the unsaturated carboxylic acid are: anthracenyl bis acrylamide, fluorenylene bis-mercapto acrylamide, 1,6 hexamethylene fluorene Bis-propenylamine, 1,6-hexamethylene bis-mercaptopropenylamine, di-ethyltriamine triacrylamide, benzodiamidoxime, benzyldimethylene Acrylamide and the like. An example of the other preferred amide-based monomer is a guanamine-based monomer having a cyclohexylene structure as described in JP-A-54-21726. In addition, the urethane-based addition-polymerizable compound produced by the addition reaction of an isocyanate and a hydroxyl group is also suitable, and such a specific example is contained in one molecule described in JP-A-48-417〇8. Two or more polymerizable vinyl vinylamino phthalate compounds, etc., the 201222149 vinyl amino phthalate compound is a polyiso oxoate compound having two or more isocyanate groups in one molecule. The hydroxyl group-containing vinyl monomer represented by the following formula (E) is added. CH2=C(R4)COOCH2CH(R5)OH(E) (wherein 'R4 and R5 each independently represent Η or CH3.) In addition, Japanese Patent Laid-Open No. 51-37193, Japanese Patent Special Fair No. 2_32293, Japan Patent 4 Temple Fair 2_16765 shot recorded by acrylamide lanthanum lanthanum, or Japanese Patent Special Public Show No. 58_49, Japanese Patent Special Public Show No. 56-17654, Japanese Patent Special Public Show No. 62 39417, Japanese Lit Gong Zhao 62-Li The epoxy acetal compound described in No. 8 is also suitable. _, by one = two it, the molecule has an amine structure or an I" compound, and can obtain the sensitization of the patented special patents, the postal code 48__, the 酿 各 各 记载 记载 记载 ^ :=2:30490, the ring gas obtained by the reaction of the olefinic acid makes % oxyphyllin and (meth) propyl methacrylate. In addition, it is also possible to classify a polyfunctional acrylate such as a hydrazine, or a specific unsaturation of the Japanese Patent Publication No. Sho 46-43946, and a Japanese Patent Publication No. 1-40336. The vinyl sulfonic acid system described: & i or Japanese Patent Laid-Open No. 2-25493 should be used in Japanese Patent Specially-designed Μ 另外 另外 另外 ' 于 于 于 于 于 于 于 20 20 48 48 20 20 20 20 20 20 20 20 20 2012 2012 2012 2012 2012 2012 2012 Structure. Further, it can be used as a photocurable monomer in the Journal of the Japan Adhesive Society v〇i 2g, n〇 7, pp. 00 pp. - 308 (1984). In the present invention, from the viewpoint of the curing sensitivity, it is preferred to contain two or more ethylenically unsaturated bonds, and it is preferable to contain three or more ethylenically unsaturated bonds. Preferably, it contains two or more (meth) acrylic acid vinegar structures, more preferably contains three or more (indenyl) propyl hydrazine structures, and most preferably contains four or more (fluorenyl) acrylic acid (four) Structure. Further, from the viewpoint of the curing sensitivity and the developability of the unexposed portion, it is preferred to contain an E 〇 modified body. Further, from the viewpoint of the hardening sensitivity and the strength of the exposed portion, it is preferred to contain an amino phthalate bond. From the above viewpoints, the following compounds are exemplified as preferred examples: bisphenol A diacrylate, bis-di acrylate E 〇 plastomer, trihydroxy decyl propane triacrylate, trishydroxy propyl propane tris(propylene hydrazine) Oxypropyl)ether, trihydroxydecylethane triacrylate, tetraethylene glycol diacrylate, pentaerythritol-propionic acid I, pentaerythritol triacrylate vinegar, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, two Pentaerythritol pentaacrylate, pentaerythritol hexapropanoic acid S, sorbitol triacrylate vinegar, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tris(propylene hydrazine Oxyethyl)isocyanurate, pentaerythritol tetrapropionate E 〇 plastomer, diquaternary stilbene hexaacrylate EO modified body, etc., and commercially available products are preferably amino citrate Ester polymer UAS-10, XJAB-14〇C manufactured by Shanyang Guosheng Paper Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, XJA-306I, AH-600, T -600, AI-600 49 201222149 (manufactured by Kyoei Corporation). Wherein 'bisphenol A diacrylate E 〇 plastomer, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tris(propylene methoxyethyl) isocyanurate , pentaerythritol tetraacrylate E0 modified body, dipentaerythritol hexaacrylate EO modified body, etc., commercially available products are more preferably DpHA_4〇H (manufactured by Sakamoto Chemical Co., Ltd.), UA_306H, UA-306T, UA-306I, AH -600, T-600, AI-600 (manufactured by Kyoei Corporation). Further, an ethylenically unsaturated compound having an I group is also suitable, and as a commercial product, for example, a carboxyl group-containing trifunctional acrylate vinegar 756 manufactured by Toagosei Co., Ltd., and a carboxyl group-containing 5-functional acrylate ΤΟ- 1382 and so on. Further, it is preferable that the above polymerizable compound has a boiling point of at least one addition-polymerizable state. A compound having a ethylenically unsaturated group above c. Examples thereof include polyethylene glycol mono(, fluorenyl) ruthenium citrate, polypropylene glycol mono(meth)acrylic acid, and (meth)acrylic acid phenoxylate. Or methacrylic acid@purpose; polyethylene glycol di(meth)acrylic acid vinegar, tris-decyl ethane tris(methyl)propionic acid brewing, neodymium dimethicone (mercapto) acrylic vinegar, pentaerythritol three (曱 )) Acrylic vinegar, pentaerythritol IV = tetra (methyl) propyl _8, dipentaerythritol five (f-based) propylene riding energy, two seasons ^ four leave six (mercapto) acrylic acid vinegar, hexanediol (A (Acrylic acid), ternary (tetra) urine or propylene oxide after the (mercapto) acrylated; 曰 3 =

50 201222149 Japanese Patent Laid-Open No. 48-41708, Japanese Patent Laid-Open No. Sho. No. Sho. No. 51-37193, and Japanese Patent Laid-Open No. Sho. Polyester acrylates described in each of the publications of Japanese Patent Publication No. SHO-49-43191, Japanese Patent Publication No. SHO52-35-49, and epoxy acrylates, which are reaction products of epoxy resins and (meth)acrylic acid. A polyfunctional acrylate or mercapto acrylate such as an ester and a mixture thereof. In addition to the above, a radical polymerizable monomer represented by the following formula (?-1) to (?-5) can also be suitably used. Further, in the formula, in the case where hydrazine is an alkylene group, the terminal on the carbon atom side is bonded to R.

(MO-3)

(MO-4) N (MO-5) 仰 R: H2C=CC-0— H2C=CC-0—0-C-fcH2V-C-〇H -OCW^CHjV-C-OH —OH —CM3 H6 6 . 6 , 6 , , T: *-{CH 七·0CH2-, -OCHjChb- --0CH2CH2CH2OI2 t ch3 o-chch2- —c 9^3 >-ΟΗ2〇Η- 2; -0~C_N&lt ;CH2^-N~0~0- 51 201222149 一·..._r In the above formula, η is 0 to 14 and m is 1 to 8. There may be multiple R and T in one molecule, which may be the same or different. In each of the monomers of the radical polymerizable monomer represented by the above formula (MO-1) to formula (MO-5), at least one of the plurality of R represents -oc(=o)ch= Ch2, or a group represented by -oc(=o)c(ch3)=ch2. Specific examples of the radical polymerizable monomer represented by the above formula (MO-1) to (MO-5) may be appropriately selected from paragraph number 0248 to paragraph number of JP-A-2007-269779. The compound described in 0251 is used in the present invention.

52

201222149 L/lI

Hj —O—C—CHj—·〇Η2""0—0 H (Μ-1)

(M-2)

(Μ·3) Η2〇=〇Η 0=0 h

2-CH2-C-OH h2c=ch i-C-

(M-4) 00 h2c=<!:h C-CH2-CH2

-C--OH 53 201222149 --- -χ--- H2〇=CHc=o ch2 3-i-c十 2 (c=o HsC^Hc=o h2c=ch Γih ch2 HO-C-CH2-CH2 -<:'-O-CH2-0--CH2-0-CH2-C-CH2-0»C-0H2»CH2-C-〇H (M-5)ΰ 〇iH2 ίπ2 ο o 0 Ic=o Η2〇=ΟΗ h2c=chc=o HO-C-CH2—CH2-CO-CH2-C—CH2-O-CH3-C~CH3-0TMC-*CH2-CH2-C-0H (M-6) o ch2 ch3 h2c: ch3 »c=ci=o

V-»c=o =iH 6-ch2-ch2-cTMoh H2C=ip-0-CH2-<!:»CH2-〇1-CH2-CH2-^-OH (M-7) S iH2 〇 〇I 4o i=o . h2c— ch3 ch3 h2c=co ch5 h2c=cu ά CHs CH2 CH2 H2C=0~C—0-CH2-i-CH2-〇-CH2-<!:_CH: 6 hn2 Ϊη2 i =o h2c=c ch3 L h2c^c ch3 ,-OC-Ci

:H2*^H2-C-ON (W-6) 54 s 201222149 =c Ic«oo H2C==? C=0 io 〇冰+CH厂”-CH2-CHq-〇H (M-9) ii &lt ; 丨2 . ch2 ο ° 〇. CHa CH3 ch3 c=o Η2〇=〇6h3 ch3 1 aH^c*cc=o ! 0 1 c-ch2-ch2-c-oh CH2 o C-CHa-CH2-C -〇H oo ch2 » * c=o 0h3

C-CH2"CH2-C-OH CHs HjC·-C c=o?H2 CH3 h2c=oc=o o ?H2 HO-c-CH2~CH2,c~〇-CH2-C-CH2^〇-CH2-. CH2-〇, C-CH2-CH2-C-〇H (ΜΊ1) o ch2 ch2 0 c=o HjC a c=o CH3 HaC=Cέ=ο I 0 1 CK2 ch3 CHS h2c=oc=o ch2 C— CHj-OH' (WH2) ch2 o ch2 p c-ch2-ch2 ch3 The details of the structure, the use of the polymerizable compound alone or in combination, the amount of addition, etc. may be based on the final properties of the photosensitive composition. Design and set arbitrarily. For example, from the viewpoint of sensitivity, it is preferred that the structure has a large content of unsaturated groups per molecule, and in many cases, it is preferably 2 55 201222149 Lv Yue b or more. In addition, from the viewpoint of the strength of the Tyrank film, it is preferable to use a trifunctional or higher functional group, and further, different functional groups and different polymerizable groups (for example, acrylate, methacrylate, styrene compound, The method of adjusting the sensitivity and the strength of the compound of the ethyl ether compound is also effective. Further, the compatibility and dispersibility of the other components (for example, a photopolymerization initiator) which are contained in the photosensitive composition, the selection and use of the poly-based compound are also important factors, for example, There are cases in which compatibility can be improved by using a low-purity compound or a combination of two or more. Further, it is also possible to select a specific structure by increasing the point of the hard surface with the support or the like. The 有 which has I is described below, and is also referred to as a developable binder resin in the case of a (tetra) conjugate group which is a polymerizable compound. = The adhesive resin is a solvent that utilizes the action of the active species, and the solubility of the developer in the developer, and is based on the resistance, developability, hardenability, and accessibility. Having =:=2::: consists only of carbon atoms, or the incorporation of the known money. "Combination, successive classes are known to have free radical polymerization, yang: sub-polymerization = = separation of species, ring-opening polymerization, etc. It can be applied to a case where a copolymer is generally known to be combined with a resin to form a copolymer, and random copolymerization can be arbitrarily selected.

56 201222149 Alternating copolymerization, block copolymerization, graft copolymerization, and the like. The polymerizable group is not particularly limited, and is preferably a group having a radical, a cation or a bond which undergoes polymerization by heating, and examples thereof include an unsaturated group (such as a carbon-carbon unsaturated double bond) and an epoxy group. An oxetanyl group or the like is preferably an unsaturated group. The above unsaturated group may, for example, be a (meth) acrylonitrile group, a (meth) acryl oxime group, a thio(meth) acryl fluorenyl group or a (meth) acryl fluorenyl group or a (meth) acryl oxime group. And a carbon-carbon unsaturated group other than a thio(fluorenyl) acrylonitrile group. The carbon-carbon unsaturated group other than the above (meth)acrylic acid group, (meth)acrylic acid amine group, and thio(meth)acrylylene group preferably has a radical polymerizable group and a cation. The enthalpy of the bond of the freshly polymerizable group or the reaction which is heated. Such a carbon·carbon unsaturated group is preferably a vinyl group, an allyl group, a propargyl group, a %pentenyl group, a cyclohexenyl group, a styrene group, an ethylene group, an ethyl acetate group, an allyl ether group. , allyl ester group, propargyl ether group, propargyl ester group, dicyclopentene, especially preferably ethyl, stalk, dilute, acetylene, and bicyclol. The polymerizable group in the present invention is preferably a (meth) propyl group: an ene amide group, a thio(meth) acryl fluorenyl group or a vinyl group, more preferably an acryl fluorenyl group or a fluorenyl propylene group. Amidino or vinyl. Further, when a polymerizable group is introduced into the resin, for example, it is possible to carry out the treatment of imparting a polymerizable group by applying a monomer after the polymerization. Only y material records _ jiajia is self-domain or surface ionic polymerization. Free radicals or heteropolymeric repeating units are gelled by utilizing acid 57 201222149 j〆· , upper / 羼 ▲ or the side of the free radicals to form crosslinks, thereby helping to reduce the inclusion of organic Solubility in the developer of the solvent. In the resin which can be bonded to a compound having a radical polymerizable group, the radical polymerizable repeating unit is preferably introduced into the resin by reacting the compound having a radical polymerizable group. Examples of the resin having a radically polymerizable repeating unit include the following resins: representative resins: in the resin of the read group, a propylene-containing epoxide, an allyl epoxide (tetra), etc. a resin obtained by reacting a compound with an unsaturated alcohol such as a compound or an allyl alcohol, a 2-acrylic acid vinegar or a 2-mercapto acrylic acid vinegar; and a free isocyanate group in a resin having a reduced weight a resin obtained by reacting an unsaturated compound or an unsaturated acid anhydride; a resin obtained by reacting a polybasic acid anhydride in an addition reaction reaction between an epoxy resin and an unsaturated carboxylic acid; a resin obtained by reacting a hydroxyl group-containing polymerizable monomer in an addition reaction product of a saturated dicarboxylic anhydride; and a resin having a specific functional group which imparts a desorption reaction by an alkali treatment to impart an unsaturated group, _resin The test process is carried out to thereby form an unsaturated group of resin or the like. One of them is more preferably a resin obtained by reacting a glycidyl group-containing unsaturated compound such as (meth)acrylic acid propyl acrylate or allyl epoxidized ether in a carboxyl group-containing resin; In a resin obtained by polymerizing a hydroxyl group-containing (fluorenyl) acrylate-based compound, a (mercapto) acrylate having a free isocyanate group such as (nonyl)acrylic acid 2-isocyanate ethyl ester is reacted and f is obtained. a resin; a resin having an i complex unit represented by the following formulas ο) to (3); and a synthesis having a desorption reaction by alkali treatment

S 58 201222149 / ~T"pif A resin having a specific functional group to an unsaturated group, and the resin is subjected to an inspection treatment, thereby not only removing a hetero group, but also forming a pure base resin. The resin having a cationically polymerizable repeating unit may have a cationic polymerization state in the side bond, for example, a polymer containing an epoxy group, a sulfhydryl group or the like may be used. In order to obtain a resin having a cationically polymerizable repeating unit, for example, a monomer having an epoxy group (hereinafter sometimes referred to as "a monomer for introducing an epoxy group") may be polymerized as a monomer component. The above-mentioned monomer having an epoxy group may, for example, be acrylonitrile propylene acrylate, (meth) propyl sulfonium 3,4-3⁄4 oxycyclohexylmethyl ester, ortho (or m, or p-)vinylbenzyl benzyl Glycidyl ether and the like. The monomers for introducing an epoxy group may be only one type, and $ may be above. The precursor component in the case of obtaining a resin having a cationically polymerized (tetra) complex unit includes the above-mentioned monomer for introducing an epoxy group, and the content thereof is not particularly limited, and is preferably 5% by mass in the total monomer component. The amount %, preferably 10% by mass to 6 〇 mass 〇 / 〇. The radical or cationically polymerizable repeating unit is preferably a repeating unit represented by any one of the following formulas (1) to (3).

0) f *C two Φ R26 C"·-, R?1 * rf6 ^39 R37 r3« R*° (3) 59 201222149 〆Λ U upper track encounters A ~ general formula (3), eight 21, Eight 22 and eight 23 points = = no oxygen atom, sulfur atom or na, r41 represents a hydrogen atom or a pit. G=, G22, and G23 each independently represent a divalent linking group. =21 and Z21 each independently represent an oxygen atom or a sulfur atom -N(R)·, and R42 represents a hydrogen atom or an alkyl group. And Y2 -1 represents a single bond, an oxygen atom, a sulfur atom, a phenyl group or a naphthene. R represents a hydrogen atom or a burnt group. R21 to R4G each independently represent a hydrogen atom or a monovalent substituent. The above formula (1) towel represents a hydrogen atom or a valence substituent. The monovalent substituent represented by R21 to R23 may, for example, be an alkyl group which may have a substituent (preferably, carbon number 丨~忉, more preferably carbon number 丨~), and the substituent which the ketone group may have may be a hydroxyl group. , halogen atoms, etc. Among them, R and R22 are preferably a hydrogen atom, and r23 is preferably a hydrogen atom or a methyl group. R24 to R26 each independently represent a hydrogen atom or a monovalent substituent. R24 may, for example, be a hydrogen atom or an alkyl group which may have a substituent (preferably having a carbon number of 1 to 10, more preferably a carbon number of 1 to 4), and examples of the substituent which the alkyl group may have include a hydroxyl group and a hydroxyl atom. Wherein R24 is preferably a hydrogen atom, a fluorenyl group or an ethyl group; and 'R25 and R26 each independently represent a hydrogen atom, a halogen atom, an alkoxycarbonyl group (preferably having a carbon number of 2 to 15), a hydrazine, and a nitro group. a cyano group, an alkyl group which may have a substituent (preferably having a carbon number of 1 to 20), an aryl group which may have a substituent (preferably, a carbon number of 6 to 20), and an alkoxy group which may have a substituent (more Preferably, the carbon number is 1 to 15), the aryloxy group which may have a substituent (preferably, the carbon number is 6 to 2 Å), the thiol group which may have a substituent (preferably, the carbon number is 1 to 20), An aryl group having a substituent of 201222149 (preferably having a carbon number of 6 to 2 G), etc., wherein a hydrogen atom, an alkoxy group, an alkyl group which may have a substituent, and a substituent may be preferable. An aryl group, a better riding material or a calcining group which may have a substituent, and particularly preferably a hydrogen atom or a mercapto group. Here, examples of the usable substituent include a decyloxy group, an ethoxycarbonyl group, an isopropoxycarbonyl group, a decyl group, an ethyl group, a phenyl group and the like. A 1 represents an oxygen atom, a sulfur atom or _N(R41)_, and χ21 represents an oxygen atom disulfide atom or -N(R42)-. Here, ρ4ΐ and R42 each independently represent a hydrogen atom or an alkyl group (preferably having a carbon number of 1 to 10, more preferably a carbon number of 1 to 4). A21 and X21 are preferably an oxygen atom. G21 represents a divalent linking group. The divalent linking group represented by g2i is preferably an alkylene group which may have a substituent, a cycloalkyl group which may have a substituent, a divalent aromatic group which may have a substituent, _〇c(〇)_, _c(〇)〇_, _n(r44)_ and a linking group obtained by combining the groups (the total carbon number is preferably 20, more preferably the total carbon number is 1 to 15, more preferably the total carbon number 2) ~1〇). R44 represents a hydrogen atom or an alkyl group (preferably a carbon number, more preferably a carbon number i to 4). ^ G is more preferably an alkyl group having a substituent of 1 to 2 carbon atoms and a carbon number of 3~ a cycloalkyl group which may have a substituent, a divalent aromatic group which may have a substituent of 6 to 2 carbon atoms, _〇C(〇;)_, _c(c〇〇_, _n(;H44 And a linking group obtained by combining the above-mentioned groups, wherein, in terms of properties such as strength and developability, a linear or branched alkyl group having a carbon number of 丨~(7) which may have a substituent, a cycloalkyl group having a substituent of 3 to 1 Å having a substituent, a divalent aromatic group having a substituent of 6 to 12 carbon atoms, -OC(O)-, -C(0)0-, - N(R44)· and the combination of the groups of 201222149. Here, as the substituent in G21, it is preferred that the group of the rabbit atom does not contain a group other than the secret group, for example, ^ The substituent of the alcohol group or the carboxyl group is preferably a hydroxyl group. The melon soil t in the formula (7) wherein 'π#9 independently represents a hydrogen atom or a -valent substituent. The preferred range of R27 to R29 is preferably a preferred range. The same. IK R's more |~R > The site represents a hydrogen atom or a valence substituent. Specific examples of r3〇 to R include a hydrogen atom, a halogen atom, a dialkylamino group (preferably having a carbon number of 2 to 20), and an alkoxy group ( Preferred is a carbon number of 2 to 15), a fluorenyl group, a nitro group, a cyano group, a filament which may have a substituent (preferably having a carbon number of 1 to 20), and an aryl group which may have a substituent (preferably a carbon number) 6 to 2 〇), an alkoxy group which may have a substituent (preferably, carbon number ^~^), a aryloxy group which may have a substituent (preferably, a carbon number of 6 to 20), and a group which may have a substituent A sulfhydryl group (preferably having a carbon number of 1 to 20), an arylsulfonyl group which may have a substituent (preferably having a carbon number of 6 to 20), etc. An alkyl group which may have a substituent, or an aryl group which may have a substituent. Here, as the substituent which can be introduced, the group which is the substituent which can be introduced into R21 to R23 in the formula (1) is also exemplified. A22 independently represents an oxygen atom, a sulfur atom or _n(r4i)_. Here, R41 represents a hydrogen atom or an alkyl group (preferably a carbon number, more preferably a carbon number of 1 to 4). G22 represents two. Price link Specific examples and preferred ranges of the divalent linking group represented by the group g22 are the same as those of the specific example 62 201222149 and the preferred range of the divalent linking group represented by the above G21. One-TVJ tan, 丨, tj 丨 J 〇 ^ single bond, oxygen atom, sulfur atom, -N (R43) _ or a stupid base. 匕T' represents an atom or an alkyl group which may have a substituent (preferably carbon = 'better carbon number 4) The stabilizing group represented by γ21 may have a substituent, and the substituent may be a ruthenium, a self-nuclear atom or the like. In the above formula (3), r33 to r35 each independently represent a nitrogen atom group. The preferred range of ~5 is the above ^^4, 36~114. The _ standing ground represents a hydrogen atom or a valence substituent. The specific examples of the psychology_ and the recorded _r3q~r32, and the comparator and the second table indicate the same as the R1R42 of the oxygenogen. And R may be a divalent linking group represented by G23 in the formula (1). The examples and preferred ranges of g23 are the same as those of G, the divalent == body and the preferred range. Specific examples of the organic compound having the above-described general formula (1) to the general formula (1) can be synthesized based on the synthesis method described in Japanese Patent Laid-Open No. 3.262958 == iff [0027] to _7] Preferably, the synthesis method in the above publication is used, wherein the content of the display unit in the developable binder resin is 63 201222149 / T-/pix Molar is preferably 5 mol% to 6 mol%. , the best is 1 〇 Moer% ~ 6 〇 Moer%. One of preferred embodiments of the developable binder resin is a resin containing a halogen atom or a fluorine atom in a side chain. According to this embodiment, the resin having a cerium atom or a fluorine atom has a low polarizability, and when such a resin is used, the refractive index of the photosensitive composition can be lowered, and as a result, the photosensitive composition is used. The refractive index of the obtained pattern is also further lowered. Further, in particular, in the case where the developable binder resin contains ruthenium in the side chain, it is considered that the presence of ruthenium atoms as an inorganic material contributes to the weather resistance of the laminate. The resin containing a fluorine atom in the side chain is preferably a resin containing a repeating unit having a fluorine atom in a side chain. 8. In order to lower the refractive index, a resin containing a repeating monomole having a fluorine atom in a side chain is preferably a resin obtained by using a fluorine-containing monomer. In order to achieve the rate of riding, it is preferred to prepare a homopolymer or a copolymer of a fluorine-containing monomer, or a copolymer of a fluorine-containing monomer and a non-fluorine monomer. The following monomers are exemplified as the fluorine-containing monomer. H2C=CH-CnF2n+1 F2C=C~CF3 F2C=C- °-CnF2n+i

In the above formula, n represents an integer.

64 S 201222149 jy

Cf2=cfocf2cfcf=cf2 , cf3 CF2=CFOCF2CF2CH-CHCF=CF2 ch2 ch2 \ / ch2-ch2 cf2=cfocf2ocf2cf=cf2 , cf2=cfocf2cf2ch=ch2, 0 II CF2=CFOCF2(CH2)xNHCCH=CH2 (X : 1 ～4 Integer),

Cf2=cfocf2cfcf2cf=cf2 , cf=cf2 cf2=cfocf—cfcf=cf2 , · c—cf2 f2 CF2~CFOCF2CF2C—CF2 1 cf3 cf2=cfo(cf2)2cf=cfcf3, cf2=cfocf2cf2ocf=cfci , 0 cf3 II 1 cf2 =cfcnhcch2ch=ch2 , cf3 CF2=CFCF2CF2CH=CH2 , cf2=cfcf2cfch=ch2 , cf3 CF2=CHOCH2CH2CF=CF2 , ch2=cfcoch2ch2cf=cf2 , 0 CF3 cf2=ccoch2ch2cf=cf2 , 0 CH2=CHOCH2CH2CF CF=CF2 , oX FP Human CFS F The polymer structure obtained from the above fluorine monomer is shown below, but the present invention is not limited to the polymer structure. 65 201222149 χ· (CF2), ,('CFR)n V〇-(CF2)m

1 is 0 to 5 and inversely F (wherein, 1 + m + n is 1 to 6, integer, m is an integer of 1 to 4, η is an integer of 〇 〜1, or CF3.) — (~CF-CF-)—

(where 'heart and rule 2 are independently F or CF

The resin containing a halogen atom in the side chain of f3c κ ~fcF2-~CF^-CP3 is preferably a resin containing a repeating unit having an atom in a side chain. Further, the repeating unit containing a halogen atom or a fluorine atom in the side chain which may be contained in the developable binder resin is preferably a repeating unit represented by the following formula (4) or formula (5).

S 66 201222149

(4)

In the cis |i4), R, R & R3 each independently represent a hydrogen atom, an alkyl group or an aryl group. 'and ^ each independently represent a hydrogen atom, an alkyl group or a decyloxy group. nice. R, R7 and R8 each independently represent a burnt group, a sulphur-oxygen group or 归1 represents a divalent linking group. Η1 represents an integer of 0 to 20. In the formula (5), R1, R2 & R3 are synonymous with r1, r2 and R3 in the formula (4). X2 represents a divalent linking group. R9 represents an alkyl group substituted with a fluorine atom. The alkyl group represented by R, R2 and R3 is preferably an alkyl group having a carbon number of 丨1 to 1 Å, more preferably an alkyl group having a carbon number of 1 to 4, and most preferably a methyl group. Further, the aryl group represented by R3 is preferably an aryl group having a carbon number of 5 to aryl group, more preferably an aryl group having a carbon number of 6 to 8. The weis and green may have a substituent such as a hetero atom, a silane atom, or a silk. The best is for R1 and R2, and the R3 amount is the original. 67 201222149 The paste is transferred to an atom, a wire or a Weixy. ί, refers to a monovalent substituent in which the austenite atom of the alkaloid having an arbitrary substituent is bonded via an oxygen atom. The alkyl group represented by R and R5 is preferably an alkyl group having a carbon number of 丨1 to 1 Å, more preferably an alkyl group having 1 to 4 carbon atoms, and most preferably a fluorenyl group. The decyloxy group represented by the soils R4 and R5 is _〇Si(R51) (, π, . . . and each independently represents a silk or a dilute group. The radix represented by R, R and R is preferably a carbon number. The alkyl group of ^ is more preferably an alkyl group having 1 to 4 carbon atoms, most preferably a fluorenyl group. The alkenyl group represented by rm, ^^ and r53 is an alkenyl group having a carbon number of 2 to 1 G, more preferably a carbon number. The alkenyl group of Μ is preferably a vinyl group and R8 is a stand-up filament, a Weixy group or a women's soil. The alkyl group represented by R, R and R8 is preferably an alkyl group having a carbon number of 丨~1〇, more Preferably, the alkyl group having a carbon number of 1 to 4 is preferably a fluorenyl group. The decyloxy group represented by R6, R7 and R8 is _〇Si(R51)(R52) (the structure represented by R, its definition and preferably The range is the same as the above-mentioned decyloxy group represented by R4 and R5. The alkenyl group represented by R, R and R8 is preferably an alkenyl group having 2 to 1 Å carbon atoms, more preferably an alkenyl group having 2 to 4 carbon atoms. Preferably, it is a vinyl group. χ1 and χ2 represent a divalent linking group. Examples of the divalent linking represented by X1 and X2 include an oxygen atom, a sulfur atom, a stretching group, a stretching group, a stretching group, and a :(0)·, -c(0)0-, -C(0)N(R15)-, and a combination of these groups Junction group (preferably having a total carbon number of 1~20, more preferably a total carbon number t ~15, particularly preferably a total carbon number 2~1〇) .Rls other represents a hydrogen atom or an alkyl group

S 68 201222149 /Hjpif Lucky 1 is annoying, 1 2. More preferably, it is a carbon number, and it is preferably a nitrogen atom. The divalent linking group represented by X and X is preferably a stretching group, a _C00-Rt- group, an -O-Rt- group, and a group formed by combining two or more of these groups.

The Rt is not a stretching group or a stretching group, and is preferably a stretching group having a carbon number of 1 to 5, more preferably a _CH22'' group, a -(CH2)2- group or a -(CH2)3- group. The alkylene group contained in the divalent linking group of X1 and X2 may be substituted by a hydroxy group or a trialkylalkylene group (preferably a trimethyldecyl group). Η1 represents an integer of 0 to 20, preferably an integer of 〇10, more preferably an integer of 0-5. R9 represents an alkyl group substituted by a fluorine atom, preferably a fluorine atom-substituted alkyl group having 1 to 20 carbon atoms, more preferably a fluorine atom-substituted alkyl group having 1 to 10 carbon atoms. The number of fluorine atoms in the alkyl group substituted by a fluorine atom represented by Κ9 is preferably from 3 to 20, more preferably from 3 to 15. Furthermore, the repeating unit represented by the above formula (4) and the repeating unit represented by the formula (5) are each preferably a repeating unit represented by the following formula (6), from the viewpoint of the simplicity of the synthesis. And a repeating unit represented by the formula (7). R10 r1〇)) R11 c/C, A11-Y11-S! - R12 〇々C, a12-Y12-R14 〇13 (6) (7) 69 201222149 In the formula (6), R10 represents a hydrogen atom or an alkyl group.

Rl1, R12 and R13 each independently represent an alkyl group, a decyloxy group or an alkenyl group. A11 represents an oxygen atom, a sulfur atom or _N(Ri5)_. R15 represents a hydrogen atom or an alkyl group. Γ11 represents an alkylene group, an alkylene group or a combination thereof. In the formula (7), 12 A represents an oxygen atom, a sulfur atom or _N(Ri5)_. Y represents an alkylene group, an alkylene group or a combination thereof. R14 represents an alkyl group substituted with a fluorine atom. R and Rl5 are synonymous with R10 and R15 in the formula (6). In the formula (6), R1G represents a hydrogen atom or the alkyl group represented by the alkyl group eRiG may have a substituent such as a hydroxyl group, a halogen atom or a carboxyl group. The alkyl group represented by R1〇 is preferably an alkyl group having a carbon number of 丨~(1), more preferably an alkyl group having a carbon number of 丨~4, more preferably an anthracenyl group, an ethyl group or a propyl group, and most preferably a fluorenyl group.

Rl1, R12 and R13 each independently represent an alkyl group, a decyloxy group or an alkenyl group. The preferred range of the alkyloxy group and the dilute group represented by R, R12 and Rn is the same as the preferred range of the silk, the heterooxy group and the alkenyl group represented by the above R6, R7 and R8. A 1 represents an oxygen atom, a sulfur atom or -N(R15)-. R15 represents a hydrogen atom or a strictly base. The preferred range is the same as above. Απ is preferably an oxygen atom or -N(R 5)- ' is more preferably an oxygen atom. Mountain Y represents an extended base, an extended alkyl group, or a combination thereof. Y" is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms. Specifically, in the case of γΐι, an alkylene group such as a methylene group, an exoethyl group or a propyl group may be substituted by a hydroxyl group. In the general formula (7), Α12 represents an oxygen atom, a sulfur atom or ruthenium is preferably an oxygen atom or _N(R15)_, more preferably an oxygen atom. Y12 represents a siloxane group or a combination thereof. ΐ ΐ is an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having a carbon number of 丨 〜5. Further, examples of the substance include a methylene group, an ethyl group, a propyl group and the like. Further, the alkylene group contained in the group / may be substituted by an alkyl group substituted by a fluorine atom, preferably a trifluoromethyl group. R14 represents an alkyl group substituted with a fluorine atom. The preferred range of the fluorine atom-substituted alkyl group represented by R14 is the same as the fluorine atom-substituted alkyl group represented by the above R9. R10 and R15 have the same meanings as R10 and R15 in the formula (6), and the preferred ranges are also the same. Specific examples of the repeating unit represented by the formula (4) include the following repeating units. 71 201222149

η=3^5 The repeating unit represented by the formula (5) specifically includes the following repetitions.

72 4 201222149

Ch3

=;==: Shadow: This can be more and more sorghum. Repeated ΐ: ί:) at least ~ in the above formula (7) - at least ~ in terms of weather resistance, 1 shirt, adhesive resin Low refractive index. Further, the bond containing the raw material development _ mixture resin preferably contains two components. $ (4) or the repeating formula represented by the general formula (6) relative to the development, the ton# person has a total of repeating units in the stone atom or gas, and the content in the side chain is preferably 〖mole 殁 7 7 N i ' ^ 〇 / ^ ry Q ^ W 0 / mol % of the developable adhesive resin t, preferably 2 〇 straight. More preferably] 〇莫耳%~70 ay ^ Wu Dou/. ~60 Moer 0/Cyanide=;ifr has two words, and there is a choice of Ge early. In this case, the sea-made a ° J 3 ‘, 、, and the styling m-mixing resin is preferably 73 201222149 having a cyano group-containing repeating unit represented by the following formula (III).

Rc31 L (ΠΙ) k KC32 In the general formula (III),

RcM represents a hydrogen atom, a thiol group, a cyano group or a -CH2-〇-Rac2 group. In the formula, 'Rac】 indicates no gas atom, dazzle or base.艮32 represents a group having an alkyl group, a cycloalkyl group, an alkenyl group, or a cycloalkenyl group. These groups can be substituted by a cyano group. Wherein at least one of 'RcS1, Rc32 contains a cyano group.

Lc3 represents a single bond or a divalent linking group. R in the formula (III). The alkyl group of 32 is preferably a linear or branched garden base having a carbon number of 3 to 2 Å. The cycloalkyl group is preferably a cycloalkyl group having 3 to 20 carbon atoms. The dilute group is preferably an alkenyl group having 3 to 20 carbon atoms. The cycloalkenyl group is preferably a cycloalkenyl group having 3 to 20 carbon atoms. The fluorene 32 is preferably an unsubstituted alkyl group.

The valent linking group of Lc3 is preferably an alkylene group (preferably a carbonoxy group, an ester bond (a group represented by -COO-)) <5) 1) (4) heavy material feed-feeding type (coffee)

S 74 201222149 (CHI-1) 0^0

I

The synonym of Rs. Wherein, the group of r31, 5r = group - and at least one of the formula (10) 'T CM R5 is suffixed with a chain or a ring number of 3, more preferably a carbon number of 3~; The carbon is preferably 3 to 12's better than the carbon number 6 to 12), and the „ (the number is 7 to 20, more preferably the carbon number is 7 to 12), etc., the meta-soil (preferably the carbon ring) The filament includes a ring assembly county, (4) a hydrocarbon ring, a 3-ring hydrocarbon ring, a 4-ring hydrocarbon ring, and the like: a condensed ring containing, for example, a plurality of 5 to 8 membered cycloalkane rings condensed. Preferred crosslinking ring The hydrocarbon ring of the formula may be exemplified by norbornyl, ada_tyl, bieyd (K) etanyi, tris [5, 2, 1, fluorene] fluorenyl, etc. More preferably Examples of the crosslinked cyclic hydrocarbon ring include a norbornyl group and an adamantyl group. Some of the hydrocarbon groups may have a substituent, and preferred examples of the substituent include a bromine atom, a gas atom, an alkyl group, a hydrogen atom substituted by a hydrogen atom, and a hydrogen atom. A substituted amino group, a cyano group. Preferred alkyl groups include a mercapto group, an ethyl group, a butyl group, and a second butyl group. The above alkyl group may have a more substituent, and a more substituent y may be mentioned: bromine Atom, gas atom, alkyl, hydrogen A hydroxyl group substituted with an atom and an amine group substituted with a hydrogen atom. 75 201222149 Examples of the substituent of the above hydrogen atom include a silk, a cyclodextrin, an aromatic methyl group, a substituted ethyl group, an alkoxy group, and a aryl group. Preferred examples of the alkyl group include a carbon group having 1 to 4 carbon atoms, preferably a substituted fluorenyl group y exemplified by a methoxymethyl group, a methoxythiomethyloxymethyl group, and a second butyl group. Preferred are oxymethyl, 2-methoxyethoxymethyl, and preferred substituted ethyl groups include 1-ethoxyethyl, 1-decyl-1-methoxyethyl, preferably Examples of the fluorenyl group include an aliphatic aryl group having a carbon number of 1 to 6 such as a methyl group, an ethyl group, a propyl group, a butyl group, an isobutyl fluorenyl group, and a pentyl alcohol group. The alkoxycarbonyl group of 4, etc. The following is a specific example of the repeating unit containing a cyano group represented by the general formula (ΠΙ), but is not limited to these specific examples (in the specific example, Ra represents a hydrogen atom, an alkyl group, A cyano group or a _CH2_〇_RaC2 group; wherein, Ra~ represents a hydrogen atom, an alkyl group or a fluorenyl group).

Jc^r -fHt

The content of the cyano group-containing repeating unit is preferably from 10 mol% to 80 mol%, particularly preferably from 10 mol% to 60 mol%, based on the total repeating unit of the developable binder resin. Further, the developer binder resin may be a resin obtained by using a compound represented by the following formula (E-D (hereinafter sometimes referred to as "ether dimer") as a copolymer.

76 201222149 jy z^opif o

o

(E-1) In the formula (E-1), R1 and R2 each independently represent a hydrogen atom or a hydrocarbon group. The hydrocarbon group of R1 and R2 is preferably a hydrocarbon group having a carbon number of -15 to 15 and may have a more substituent. The photosensitive composition contains a resin obtained by using the compound represented by the above formula (E-D as a copolymer), whereby the cured coating film formed using the composition is improved in heat resistance and transparency. In the above formula (E-丨) of the ether dimer, the hydrocarbon group represented by r1 & r2 is not particularly limited, and examples thereof include mercapto group, ethyl group, n-propyl group, isopropyl group, n-butyl group and the like. Butyl group, tert-butyl group: a linear or branched alkyl group such as a trimethyl group, a hard fluorenyl group, a decyl group or a 2-ethylhexyl group; an aryl group such as a phenyl group; a cyclohexyl group and a t-butyl group; Cyclohexyl, dicyclopentadienyl, f-ring fluorenyl, isobornyl, diamond, 2 methyl methyl sulphate "wei oxy ethoxy group, oxime ethoxylate] a substituted alkyl group; an alkyl group substituted with an aryl group such as a benzyl group, etc. Among these hydrocarbon groups, particularly in terms of heat resistance, it is particularly difficult to contain such as a methyl group, an ethyl group, a cyclohexyl group or the like. a group which is thermally degraded or a grade 2 carbon. Further, R1 and R2 may be the same substituent or may be a non-alkenyl group. For example, dimercapto _ 2 2 (anthracenyl)] bis-2, enoic acid g, diethyl 2, 2, _ [oxygen bis (arylene) = 77 201222149 jy t τ ^ Ιι acrylate, di(n-propyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, di(isopropyl)-2,2'-[oxybis(anthracene) Base]] bis-2-acrylate, di(n-butyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, di(isobutyl)-2,2'- [oxybis(indenyl)]bis-2-acrylate, di(t-butyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, di(third pentylene) -2,2'-[oxybis(indenyl)]bis-2-acrylate, bis(stearyl)-2,2'-[oxybis(indenyl)]bis-2-propenyl Ester, bis(lauryl)-2,2'-[oxybis(methylene)]bis-2-acrylate, di(2-ethylhexyl)-2,2'-[oxybis(methylene) )] bis-2-acrylate, bis(1-methoxyethyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, di(1-ethoxyethyl) -2,2'-[oxybis(methylene)]bis-2-acrylate, dibenzyl-2,2'-[oxybis(methylene)]bis-2-acrylate, diphenyl Base-2,2'-[oxybis(indenyl)]bis-2-acrylate, bicyclo Hexyl-2,2'-[oxybis(indenyl)]bis-2-acrylate, bis(t-butylcyclohexyl)-2,2'-[oxybis(indenyl)]bis-2 - acrylate, bis(dicyclopentadienyl)-2,24oxybis(indenyl)]bis-2-acrylate, bis(tricycloindenyl)-2,2'-[oxybis(Asia Mercapto)]bis-2-acrylate, bis(isobornyl)_2,2'-[oxybis(indenyl)]di-2-acrylate, diamantyl-2,2'-[oxygen Bis(indenyl)]bis-2-propionic acid ester, bis(2-methyl-2-adamantyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate Wait. Among the ether dimers, particularly preferred are dimercapto-2J-[oxybis(indenyl)]bis-2-acrylate, diethyl-2,2'-[oxybis(indenylene) Bis-2-acrylate, dicyclohexyl-2,2'-[oxybis(methylene)]bis-2-acrylate, dibenzyl-2,2'-[oxybis(indenylene) ] Bi-2-acrylate. These ether dimers may be used alone or in combination of two or more. The content of the repeating unit corresponding to the compound represented by the above formula (E-1) is preferably 20 with respect to the total repeating unit of the developable binder resin.

78 201222149 Moer % ~ 90 mol %, especially good for 30 mol % ~ 60 mol %. The developable binder resin may contain a repeating unit other than the repeating unit described above (hereinafter also referred to as another repeating unit). The other repeating unit may, for example, be a repeating unit having an alkali-soluble group. The acid/base group may be exemplified by an acid group, an alcoholic group, a hydrazine group, and a % oxyalkyl group. The acid group is not particularly limited, and examples thereof include a buffer group, a reactive sulfhydryl group, a phosphoric acid group, a sulfonic acid group, a phenolic hydroxyl group, and a carboxylic anhydride group. Preferably, a carboxyl group, an active methylene group, and more preferably a carboxylic acid group. base. Further, the active fluorenylene group is preferably a group represented by -nh-c(o)-ch2-c(o)-rm, and Rm represents an alkyl group or an alkoxy group. The filament group may have a substituent such as a fluorine atom. . RM is preferably a filament or a neooxy group having a carbon number of 1 to 6, more preferably an anthracenyl group, a trifluoromethyl group or a methoxy group. These acid groups may be only one type or two or more types. In order to introduce an acid group into the binder resin, for example, a monomer having an acid group and/or a monomer which can impart an acid group after polymerization (hereinafter sometimes referred to as "a monomer for introducing an acid group") The polymerization may be carried out as a monomer component. Further, after the polymerization of the acid group is introduced as a monomer component by a monomer which can impart an acid group after the polymerization, it is necessary to carry out a treatment for an acid group, which will be described later. Examples of the monomer having an acid group include a (meth) acrylic acid or a methylene butyl ketone-based monomer, and the N• secret silk has a single reduction in the olefinic The body has a ship material such as dilute lining, methylene succinic anhydride, etc., and the fresh shot is (曱I) C79 201222149 enoic acid. Examples of the monomer which imparts an acid group after the polymerization include a monomer having a hydroxyl group such as (meth) 2 on the methyl ester, a monomer having a (meth)acrylic acid epoxy group, and (meth) Acrylic acid 2_isocyanate acetophenone has an isocyanate (tetra) group of monolith. These monomers for introducing a human acid group may be used alone or in combination of two or more. In the case of using a monomer which can impart an acid group after polymerization, a treatment for assigning a group after polymerization is a treatment for modifying a part of a polar group of a polymer side chain by polymerization minus. The developable binder resin may contain a repeating unit having an alkali-soluble group or may not contain the repeating unit, and in the case of containing the repeating unit, it has an alkali-soluble repeat with respect to the total repeating unit in the developable binder resin. The content of the unit in the developable binder resin is preferably from 1 mol/〇 to 50 mol%, more preferably from 1 mol% to 40 mol%, most preferably from 1 mol% to 3 mol%. . The monomers corresponding to the other repeating units include the following compounds (1) to (12). (1) 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 4-hydroxybutyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, A Acrylates having an aliphatic hydroxyl group such as 3-hydroxypropyl acrylate or 4-hydroxybutyl methacrylate, and mercapto acrylates. (2) decyl citrate, ethyl acetoacetate, propyl acrylate, butyl acrylate, isobutyl acrylate, amyl acrylate, hexyl acrylate, acrylic acid 201222149 2-ethylhexyl ester, octyl acrylate Benzyl acrylate, _2_gas ethyl acrylate, glycidyl acrylate, 3,4-epoxycyclohexyl acrylate, acetyl acrylate, acrylic acid 2-> ethyl vinegar, propylene An acrylic acid such as 1-acrylic acid, acrylic acid propyl acrylate, 2-allyloxyethyl acrylate or propargyl propyl acrylate. (3) Ethyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, isobutyl methacrylate, n-butyl methacrylate, fluorenyl Second butyl acrylate, tert-butyl methacrylate, amyl decyl acrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, cyclohexyl methacrylate, methacrylate, hydrazine 2-ethyl ethyl acrylate, glycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, vinyl methacrylate, 2-phenylvinyl thioglycolate Alkyl methacrylate such as 1-propene methacrylate, allyl propyl acrylate, 2-allyloxyethyl methacrylate or propargyl methacrylate. (4) acrylamide, methyl propylamine, N-methyl propylamine, N-ethyl acrylamide, N-hexyl methacrylamide, N-cyclohexyl acrylamide, N-hydroxyethyl acrylamide, N-phenyl acrylamide, N-nitrophenyl decylamine, N-ethyl-N-phenyl acrylamide, vinyl acrylamide, vinyl methyl Propylene oxime, hydrazine, hydrazine, diallyl acrylamide, N,N-diisopropyl propyl acrylamide, propyl propyl amide, propyl propyl amide, etc. Amine or methacrylamide. (5) ethyl vinyl test, 2-chloroethyl ether, vinyl ethyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, etc. B 81 201222149 enol class. (6) Vinyl esters such as vinyl acetate, vinyl acetate, vinyl butyrate, and vinyl benzoate. (7 styrene, α-fluorenyl stupid ethylene, methyl styrene, chloromethyl styrene, p-ethoxylated styrene, etc. (8) mercapto ethylene _, ethyl ketene, propyl A ketene such as ketene or styrene ketene. (9) An olefin such as acetamethylene, propylene, isobutylene, butadiene or isoprene. (10) Ν-vinyl rofenidone, acrylonitrile, A Acrylonitrile, etc. (11) Maleimide, hydrazine-acrylonitrile acrylamide, hydrazine-ethyl propyl methacrylate, Ν 醯 propyl methacrylate, Ν _ ( (12) A fluorenyl acrylonitrile-based monomer having a hetero atom bonded to the α-position, for example, Japanese Patent Laid-Open No. 2 〇〇 2 3 〇 The compound described in Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. 2-12004, Japanese Patent Laid-Open No. Hei No. 1200, 2004, Japanese Patent Special Fair No. 120-112, No. Japanese Patent Special 8-12424, Japanese Patent Special Open 63_287944, Japanese Patent Special Open 63-287947, Japanese Patent Special Open (3), Japan Patent Unexamined Patent Publication No. 11-352691, hereinafter referred to as an acid-based urethane-based slag-bonding compound, or an amine-based lysine-based adhesive having an organic group and a double bond in a side chain as described in Japanese Patent Laid-Open Publication No. 18. The agent polymer is suitable because it is very excellent in strength.

82 S 201222149 Each of the solvents can be polymerized by a conventionally known method, and the corresponding polymerizable monomer can be subjected to radical polymerization or a solvent used for the alkane or it, for example, tetrahydrofuran or dioxin. A, A, Methanol, Ethanol, Ethylene = Glycolic acid slightly: B:, Diethylene glycol, single methyl acetate, acetoxyacetate, 2-methoxyethoxyxan-2-indole-diethyl ether, Ioxime Base-2-propanol, acetic acid " methyl lactic acid, lactic acid, dimethyl sulphate, water, etc. The granules may be used singly or in combination of two or more. The self-polymerization initiator-based peroxide, the iso-diphenyl hydroperoxide, and the third; the second, the over--, the peroxycarbonic acid diisopropylation, the second Tributyl peroxyisomer; nitrile oxime and other organic peroxides, 2,2,-azo bis to make these 1 base polymerization initiators better (10) bis, = active species to reduce inclusion One of the preferred embodiments of the compound (c) which is a tetrasity in the organic solvent is exemplified by a compound having the structural unit of the following U). According to this embodiment, the compound having a Zeolite atom has a low polarization ratio, and when such a compound is used, the refractive index of the photosensitive composition can be lowered, and as a result, the refractive index of the pattern obtained from the photosensitive composition is The rate is also lower. In addition, it is believed that the presence of Shixia atoms as an inorganic material contributes to the improvement of weather resistance. \ (A) \ R11 / In the general formula (A), Rii represents a single bond or a divalent linking group, or a monovalent substituent. In the case where Rh is a single bond or a divalent linking group, the single bond or the divalent linking group is bonded to the other of the compound (C); Χι 1 represents a single bond or a divalent linking group.

Rp represents a monovalent group containing a polymerizable group.

Rii preferably represents a monovalent substituent. When it is a single bond or a divalent linking group, the structural unit represented by the formula (A) is another structural unit represented by the formula (A) via the above-mentioned single bond or divalent linking group, or a formula (hereinafter described) C) The structural unit represented by the combination of other hydrazine-containing repeating units.

Examples of the divalent linking group represented by R11 include an oxygen atom, an alkylene group, an extended alkenyl group, an alkynylene group, an extended aryl group, or a combination thereof.

The alkylene group represented by R11 is preferably an alkylene group having a carbon number of 1 to 1 Å, more preferably a number of 1 to 4. The alkenyl group represented by R" is preferably an alkenyl group having 2 to 1 carbon atoms, more preferably 2 to 4 carbon atoms, and may have an unsaturated double bond at any position.

The alkynyl group represented by Ru is preferably an alkynylene group having a carbon number of 2 to 1 Å, more preferably a carbon number of 2 to 4 Å, and may have an unsaturated triple bond at any position.

The aryl group represented by Ru is preferably a carbon number of 6 to 2 (d).

S 84 201222149 /45pif is a carbon number of 6~10. The divalent linking group represented by the denier may be at least two groups selected from the group consisting of an oxygen atom, a bentonite, a soil #alkynyl group and an extended aryl group. Preferably, it is selected from an oxygen atom and a stretching group. A group consisting of a combination of an alkyl group and (4) a ruthenium ruthenium. The total carbon number in the group in which at least two are combined is preferably from 1 to 40, more preferably Ν20, still more preferably from 1 to 10. The valent linking group may have a substituent, and the substituent may be a stone age = a number of 1 to 1 G, more preferably a carbon number of 1 to 6, and particularly preferably a "square" of preferably a carbon number of 6 to 20, more preferably a carbon number of 6 to 10), an alkane group (preferably a carbon number U, more preferably a carbon number, 2 carbon, 6:20, more preferably a carbon number of 6 to 10), a ethoxy group (preferably Soil is better for carbon ~4), brewing base (preferably carbon number 2~10, A Shanxu =, ~4, silk base (preferably carbon number 2~10, better ^), amine base, a heterocyclic group (preferably having a carbon number of 2 to 20, more preferably a carbon number of 2 to 10), a halogen atom, etc., and at least one group of the group of Malian ====== Health is carbon number 1 More soil is stone annoyance 1~6' is particularly good for carbon number 4) Good carbon number is 3~2G, more preferably carbon number is 3~12, especially "earth (more alkenyl) Preferably, the carbon number is 2 to 10, more preferably the carbon number is 2 to 4), the block base (preferably 85 201222149 jy is a carbon number of 2 to 10, more preferably a carbon number of 2 to 4), and an aryl group (preferably carbon) The number 6 to 20' is more preferably a carbon number of 6 to 10), an alkoxy group (preferably, carbon number 丨~忉, more preferably a carbon number of 1 to 4), etc. These groups may have a substituent and a substituent. Can be listed as above The divalent linking group represented by Rn may have the same substituent as the specific substituent of the substituent. In the case where R" represents a monovalent substituent, Ru preferably represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or an alkane. The oxy group is more preferably an alkyl group or an alkoxy group, more preferably an alkyl group having 1 to 6 carbon atoms or an alkoxy group having a carbon number of 丨4, and most preferably an anthracenyl group.

The single bond or divalent linking group represented by Xn is preferably a divalent linking group. Specific examples of the divalent linking group represented by Xu and preferred examples of the polymerizable group contained in the monovalent group represented by the preferred range of the divalent linking group represented by Xu may be The same groups as the above specific examples of the polymerizable group of the adhesion-attachment are listed. When the monovalent group containing a polymerizable group represented by RP contains a "group", the valence group containing a (tetra)-compatible group represented by Rp and 1 Å 疋' may be the above-mentioned polymerizable group itself, or may be polymerized. The base and the rolling atom, the sulfur atom, the alkyl group, the cycloalkyl group, the arsenic, which, the hua, the v, and the at least one of the groups formed by the group The above-mentioned polymerizable group itself or the polymerizable group is composed of a milk atom, an alkyl group, a cycloalkyl group, an aryl group, a c-c group, and a ruthenium consisting of ruthenium 86 201222149 jy a monovalent group in which at least one of the /45plf groups is combined. Here, rl represents a hydrogen atom or an alkyl group (preferably, a carbon number of 1 to 10, more preferably a carbon number of 1 to 4), preferably Hydrogen atom The total carbon number of the monovalent group represented by RP (that is, the total carbon number of the residue represented by RP) is not particularly limited and is usually 2 to 40, preferably 2 to 30, more preferably 2 to 20. The molecular weight of the monovalent group represented by RP (that is, the molecular weight of the residue represented by RP) is not particularly limited, and is usually in the range of 20 to 2,000, preferably 20 to 1,000. More preferably, it is 20 to 500. The number of the polymerizable groups contained in the monovalent group represented by RP is not particularly limited, but is usually 1 to 6, preferably 1 to 4, more preferably 1 In view of imparting scratch resistance, it is preferable to contain two or more. The structural unit represented by the general formula (A) may be the following general formula (A-1) or (A-2). The structural unit represented.

In the formula, Rap represents a monovalent group containing an alkali-soluble group and a polymerizable group. Ra represents a monovalent group containing an alkali-soluble group.

Rii, Χιι and Rp are respectively synonymous with Rn, Xn and RP in the above formula (A), and the specific examples and preferred examples are also the same.

The monovalent group 87 201222149 group containing an alkali-soluble group and a polymerizable group represented by Rap is not particularly limited as long as it contains both an alkali-soluble group and a polymerizable group, and may be a soluble group or a polymerizable group. Selective oxygen atom, sulfur atom, alkylene group, alkenyl group, alkynyl group, cycloalkyl group, aryl group, -c(o)〇-, -(:(9) 妒)·, _c(〇) A monovalent group in which at least one of the groups consisting of s_, _n(rL), _si(RL)2, and a linking group obtained by combining the groups is combined. Preferably, the above-mentioned alkali-soluble group and polymerizable group are selected from an oxygen atom, an alkylene group, an alkenyl group, a cycloalkyl group, an extended aryl group, -C(〇)〇_, _C(0)N ( RL)_ and a monovalent group obtained by combining at least one of the group consisting of the linking groups obtained by combining the groups. Here, the RL is the same as above. Here, specific examples of the polymerizable group and the alkali-soluble group include the same groups as the above-mentioned specific examples of the polymerizable group and the alkali-soluble group described in the developer adhesive.

The amount of the alkali-soluble group contained in the monovalent group represented by Rap is not particularly limited, but is usually from 1 to 6, preferably from 4 to 4, more preferably 1 or 2.

The number of the polymerizable groups contained in the monovalent group represented by Rap is not particularly limited, and is usually ～6, preferably 〜4 to 4, more preferably 1 or 2. From the viewpoint of imparting scratch resistance, it is preferred to contain two or more. As long as the monovalent group containing an alkali-soluble group represented by RA contains the 'Valley·· Shengji, the expressed monovalent group containing the soluble group has no special ship ^, which can be used for money. The hetero group itself, or the test can be combined with 11 groups and selected from the group consisting of an oxygen atom, a face, a stretching base, a stretching ring, and a stretching

88 S 201222149 jy/45pif aryl, ·〇:(〇)〇_' _C(0)N(RL)...c(〇)s·,·Ν(^)·, _si(RL)2_ and these A monovalent group in which at least one of the groups consisting of the linking groups of the groups is combined. Preferably, the above alkali-soluble group itself or an alkali-soluble group is selected from the group consisting of an oxygen atom, an alkyl group, a cycloalkyl group, an extended aryl group, -c(0)0-, -C(0)N(RL). And a monovalent group obtained by combining at least one of the group consisting of the linking groups obtained by combining the groups. This is the same as above.

The total carbon number of the monovalent group represented by Rap (that is, the total carbon number of the residue represented by Rap) is not particularly limited and is usually 3 to 4 Å, preferably 3 to 3 Å, and more preferably 3 ~20. The molecular weight of the monovalent group represented by Rap (that is, the molecular weight of the residue represented by RAp) is not particularly limited and is usually in the range of 50 to 2,000, preferably 50 to 1 Torr, and more preferably 5 or less. 〇~5〇〇.

The number of alkali-soluble groups contained in the monovalent group represented by Ra, the total carbon number of the -valent group represented by Ra, and the molecular weight (that is, the total carbon number of the residue represented and the molecular weight) and the above The Rap is the same. The compound having a structural unit represented by the formula (A) may further have a structural unit represented by the following formula (B). H- \

Rii, Xu and ra are synonymous with R", X" and ra in the above formula (A) and formula (a_2), respectively, and specific examples and preferred examples are also the same. (Polymer containing a structural unit containing a halogen atom) 89 201222149 In the form of the compound in which the compound (C) is a structural unit represented by the general formula (A), the compound (C) preferably contains the above formula (A). ) expressed, 纟. The polymer of the unit and the form of the polymer are not particularly limited, and examples thereof include a known (10) filament compound, a cage type polyoxoxime, and a ladder (ladde type polyfluoride. In this form, the compound (6) In view of the analysis|± and the coating property, it is preferable that the resin is a fine g of a stone atom in the main chain of the resin from the viewpoint of further lowering the ratio. The resin of the polymer is, for example, a direct-bonded polyoxylated linear polycarbon 11 or the like, and more preferably a linear polyfluorene fired from the viewpoint of raw material availability. Ladder type polyoxane) The type of the compound of the type of the compound of the type of the compound of the type of the compound of the type of the compound of the type of the compound. The so-called halve. The structure of the structure of each of the four atoms is combined with the three recorded atoms, and each oxygen atom is combined with a stone atom (the oxygen atom relative to the number of atoms of the stone atom, ?) too t-type polyoxane and ladder type Specific examples of the oxyalkylene can be as described in Japanese Patent Laid-Open No. Hei. Cattle (a resin which is a linear polymer) When a resin which is a linear polymer is a resin of a polymer, there is no structural unit represented by a specific element or a compound represented by the formula (4)). Α) ___ unit m (B) _ ^ 201222149 resin -, more unit m 黯 ^ total о complex unit, material (4) shirt structure early 即 (ie, heavy 稷 early 兀) content Good for mildew. The structure represented by the formula (4), which has a (fluorene) group or a thio (meth) propylene group as a polymerizable "== unit 'formula U) Unit: 5 mol/° to 5 G mol%, and more preferably 10 mol% to 45 and =%. The structural unit represented by the general formula (A) (ie, repeating unit: having (fluorenyl) In the case of a propylene-based base, a (meth)-glycine group, and a thio group (a carbon-carbon-unsaturated group other than a stilbene group), as a polymerizable group, it is represented by the formula (A) with respect to the total four complex units. The structural unit amount ^=.4〇mol%~9G mol%, and more preferably (6) mol%~9〇 as a linear polymer may contain the structural unit represented by the above formula (8), The structural unit may not be contained, and in the case of containing the structural unitary unit, the content of the general formula (8) unit (ie, repeating unit) is preferably 5 mol% to mol %, relative to the total repeating unit of the resin. More preferably, it is 10 mol% to 45 mol%. The polymer containing the structural unit represented by the above formula (4) contains other structural units of the above structural unit material. The structural unit exemplifies the structural unit represented by the following formula (C): 91 201222149 ^ / ~F-/ (C) / ^22 ^ ΤΓ; In the formula (c), r21 and R22 each independently represent a single bond or a divalent linking group, or a hydrogen atom or a monovalent substituent, which does not have an alkali-soluble group and a polymerizable group. When Rh and R22 are each independently a single bond or a divalent linking group, the single bond or divalent group The linking group and other broken atomic junctions of the compound (C).

Xh represents a single bond or a divalent linking group. And the single bond or divalent linking group represented by R22, or a hydrogen atom or a monovalent substituent is preferably a divalent linking group or a monovalent substituent. And the divalent linking group and the monovalent substituent represented by R22 may be exemplified by specific examples and preferred examples of the above-mentioned divalent linking group and monovalent substituent, respectively, but Rh and R22 have no alkali-soluble group. Second, the polymerizable group. The early bond or divalent linking group is preferably a divalent fluorenyl group. Specific examples and preferred examples of the valent linking group represented by the above are exemplified as the divalent linking group represented by X21. The resin of the linear polymer may be a structural unit other than the structural unit, and may not contain the structural unit, and may be contained with respect to the resin core in the case where the coating is contained. The structural unit of the structure (ie, the early morning H type (C) is six moles /., more preferably 10 moles % ~ 9 moles %. The different ears ~ 9 upper polymer can be obtained by the method: a method of modifying the polymer of the stone-bearing shoulder 92 201222149 to introduce an alkali-soluble or polymerizable group or an organic halogen-containing and/or corresponding to each single-cell building unit having a cross-linking filament A method of co-hydrolyzing and condensing two or more kinds of organic alkoxy groups. Further, other preferred examples of the compound (C) include Japanese Patent Publication No. 2__160418, and Japanese Patent Special Opening No. -12 A compound having an anthracene ring and having an upper vinyl polymerizable group described in JP-A-64210, and the like, a resin, etc., and each of the above-described examples of the chemical substance (C) is described. The number average molecular weight (Μη) of the polystyrene oxime converted by the gei permeati〇n chr〇matography 'GPC method is preferably 400 to 5 〇, _ 'more Preferably, _~4〇, _, optimally ΓΓΓ, as the compound (c) of the present invention The weight average molecular weight (Mw) of the resin by the gel permeation chromatography (GPC) method is preferably i, ~, (four), more preferably 2, gal to 15 〇, and preferably 3 _〜12G, _. If the weight average molecular weight and the number average molecular weight are on the same, the resin of the compound (C) of the present invention has good solubility, and can be carried out without dissipating during heating. More specifically, when the average molecular weight of the filament is 働 or more, good coatability or hardenability can be obtained, and when the number average molecular weight is 50,000 or less, good developability is obtained. In the case of the base, the degree of unsaturation of the compound (C) of the month is preferably 0.5 mm〇l/g 93 201222149 or more 'more preferably 〇7 mm〇i/g or more, the best When the unsaturated value of the compound (C) is 0.5 mmol/g or more, that is, the number of unsaturated double bonds in the resin is increased, the photopolymerizability and sensitivity are increased by 1%. Further, the polymerizability is improved, and the adhesion to the solid surface of the support or the like is contained or contained therein. The immobilization property of the empty or porous particles is also improved, and as a result, it is easy to obtain a pattern in which the hollow or porous particles in the developed pattern film are less likely to be drawn and have a tapered or rectangular cross-sectional shape. The acid value of the compound (C) of the present invention is preferably 2 〇 mg K 〇 H / g to 300 mg KOH / g, more preferably 4 〇 mg K 〇 H / g ~ 200 mg KOH / g, particularly preferably 50 mg KOH / g ～160 mgK〇H/g. If the acid value is within this range, the development residue is more difficult to remain at the time of pattern formation, and the coating uniformity becomes better. The compound (C) may be used alone or in combination of two or more. It is preferred that the compound (c) is a polymerizable compound, and the polymerizable compound contains a low molecular compound and a polymerizable base adhesive. The form of the resin). In this embodiment, the mass ratio of the low molecular compound to the developable binder resin is not particularly limited, but is preferably 1 (): 9 〇 to 9 (): 1 (), more preferably 〜 80: 20.化合物 The compound (c) is preferably 5% by mass to 5% by mass based on the total solid content of the photosensitive composition, and particularly preferably 1 ()% by mass to 4% by mass%, particularly preferably 15% by mass to 3 Å. Quality 〇 / 〇.

Further, the refractive index of the compound (c) is preferably 155 or less, and particularly preferably not more than L48. By this, you can reduce it more reliably ^

S 94 201222149 The refractive index of the resulting pattern. Specific examples of the compound (C) of the present invention are shown below, but the present invention is not limited to these specific examples. The numerical values shown in the respective units indicate the molar fraction of each unit in the resin molecule (wherein, the values in the side chains of C-5 and C-31 represent the number of repetitions of -Si(CH3)2-0-).

Mw=15000 (C-1) MyiF5OD0 Unsaturated value: 1.58mmol/g •2) Unsaturated value:

Not chain and value: 1

¢¢-5) Mw=8000 No and value: 1 «eSTHmol/g

Ο (C^) Mw=20000 and the sum value: 1.42mmoI/g

(C-7) Mw=1SOOO Unsaturated value: 1. .eemmol/g does not run and value: 2.6^nmol/g (C-8) Mw=6000 Unsaturated value: 2»22mmol/g

[j (C-10) Mw=14000 Not you and the value: 2i27mnial/g Μ 65 F9r CF3 OH '

(°*11) Mw=22000 Unsaturated value: 1.31 mmol/g (012) Mw=27000 Uneven value: 2.55 mmol/g 95 201222149 jy /*τ-; ριι

^γ° (C«13) r (C-14) Unsaturation: 7.0 mmol/g ~. -y factory. ''~. ~. ρ ·; ί^γ"0ν\〇_^ factory. , ^〇/〇~〇", 〇0〇 ~0 0 (〇16) Unsaturated value: 7.57mmol/g 0 0 0 (c-m unsaturated value: 10.lnnmo昀

Ic-17) Unsaturated value: 10.1mmd/g

0 0 (C-19 ) (1^6, 01^12) Unsaturation: 2.52 mmol/g

(C-20) Residual value: 7.49 mmol/g (c·21) Unsaturated value: 7.57 mmol/g

96 201222149

(026) Mw=3100 Unsaturated value: 1.8mmo丨/g (C-25) Mw=5000 Unbalanced value: 1 ammol/g

Not also value: 7.5 mmol/g (027) Mw»3S00 Unsaturated value: 4.0 mmol/g

(C-3Q) Mw^SOOO Unsaturated value: 3.1 mmol/g (〇茨) Mw=28D0 Unsaturated value: 1.5 mmol/g

[5] (D) Organic solvent The photosensitive composition usually contains an organic solvent. The organic solvent is basically not particularly limited as long as it satisfies the solubility of each component or the coating property of the photosensitive composition, and is preferably selected in consideration of solubility, coating property, and safety of the ultraviolet absorber and the binder. As the organic solvent, examples of the esters include, for example, ethyl acetate, acetic acid-97 201222149 / ~r^yx.L·n-butyl ester, isobutyl acetate, amyl decanoate, isoamyl acetate, isobutyl acetate, Butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, butyl lactate, alkyl oxyacetate (eg methyl oxyacetate, oxy group) Ethyl acetate and butyl oxyacetate (for example, decyl methoxyacetate, ethyl decyloxyacetate, butyl oxyacetate, ethoxylated hydrazine, ethoxylate, ethoxyacetic acid, etc.) )), 3-oxypropionic acid-based vinegar (for example: 3-oxypropionate, 3-oxypropionate, etc. (for example, 3-methoxypropionate, 3-methyl) Ethyl oxypropionate, decyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.), alkyl 2-oxopropionate (Example: 2-oxypropionic acid A) Ester, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc. (for example, decyl methoxypropionate, ethyl 2-methoxypropionate, 2-methoxypropionic acid Ester, decyl 2-ethoxypropionate, ethyl 2-ethoxypropionate 2-oxy-2-methyl Ethyl propionate and ethyl 2-oxy-2-mercaptopropionate (for example, decyl 2-methoxymethylpropionate, ethyl 2-ethoxy-2-mercaptopropionate, etc.), Methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxobutanoate, ethyl 2-oxetoxybutyrate, nonyloxybutyl Acetate, etc.; ethers, for example, exemplified by diethylene glycol dimethyl test, tetrachlorine bite, ethylene glycol monomethyl test, ethylene glycol monoethyl hydrazine, methyl cellosolve acetate vinegar, ethyl solution Fibrin acetate g, diethylene glycol monomethyl shunt, diethylene glycol monoethyl acetate, diethylene glycol monobutyl ether, propylene glycol monomethyl ether (PGME: alias methoxy-2-propanol), propylene glycol single Ether, dipropylene glycol monomethyl ether, ethylene glycol monoethyl ether oxime 1 曰 (alias 2-methoxyethyl acetate), ethylene glycol monoethyl ether 酉夂 S 曰 (alias 2 ethoxyethyl) Acetate), diethylene glycol monobutyl acetate, propylene glycol monomethyl acetate (PGMEA: alias 1_methoxy_2_B

S 98 201222149 醯 丙 丙 ) 、 、 、 、 、 、 、 、 、 、 、 、 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; Examples of the aromatic hydrocarbons include, for example, anthracene, diphenyl, benzene, and the like. Further, the organic solvent may, for example, be an alcohol such as isopropyl alcohol or an aprotic polar solvent such as cycline = pyrrolidone. In the case of the ultraviolet absorber (details will be described later), the solubility of the soluble fat, and the time of coating the surface, the organic solvent is preferably two or more. In this case, a mixed solution composed of two or more selected from the group consisting of the following organic solvents: the above-mentioned 3 - ethoxylated vinegar vinegar, 3-ethoxypropionic acid vinegar, ethyl cellosolve Acetic acid vinegar, milk, acetaminophen, diethylene glycol dimethyl mystery, butyl acetate, methyl methoxypropionate, 2_heptanone, cyclohexanide, ethyl carbitol acetate vinegar, τ base card Alcoholic acid vinegar, methyl ethyl ketone, ethylbenzene, propylene glycol monomethine, and propylene glycol monomethyl acetate. From the viewpoint of the coating property, the content of the organic solvent in the photosensitive composition is preferably such that the total solid content concentration of the composition becomes 5 mass% to 8 mass%, and particularly preferably 5 mass% to 6 〇. The amount of f% is particularly preferably 1% by mass to 50% by mass. [6] Additives The photosensitive composition can be added with a surfactant and adhesion promotion within a range that does not impair the properties (fat heat, mechanical strength, applicability, adhesion, etc.) of the film obtained by using the composition. Additives such as a polymerization agent, a polymerization inhibitor, an ultraviolet absorber, an antioxidant, an anti-aggregation agent, and a sensitizer. <Surfactant> 99 201222149 Λ 域 域 ’ ’ 就 域 域 域 的 的 域 的 域 的 域 的 的 的 的 的 的 的 的 的 的 的 的As the surfactant, various surfactants such as a fluorine-based surfactant, a property agent, a cationic surfactant, an anion-based barrier, and a polyfluorene-based surfactant can be used. In particular, by containing a gas-based surfactant, the liquid properties (especially fluidity) when the photosensitive composition is prepared into a coating liquid are further improved, so that the uniformity of the coating thickness or the liquid-saving property can be further improved. In other words, when the film is formed by using a coating liquid containing a fluorine-based interface-active sensitizing photosensitive composition, the interfacial tension between the surface to be coated and the coating liquid is lowered, whereby the surface to be coated is moistened. The wettability is improved and the coatability to the coated surface is improved. Therefore, in the case where a film of several μm is formed with a small amount of liquid, it is also effective in forming a film having a uniform thickness having a small thickness unevenness. The fluorine content in the fluorine-based surfactant is suitably from 3% by mass to 4% by mass, more preferably from 5% by mass to 3% by mass, particularly preferably from 7% by mass to 255% by mass. The fluorine-based surfactant having a fluorine content in this range is effective in the uniformity of the thickness of the coating film or the liquid-saving property, and the solubility in the photosensitive composition is also good. Examples of the fluorine-based surfactant include Megafac F171, Megafac F172, Megafac F173, Megafac F176, Megafac F177, Megafac F141, Megafac F142'Megafac F143'Megafac FI44'Megafac R30, Megafac F437, Megafac F475, Megafac F479, Megafac F482 , Megafac F554, Megafac F780, Megafac F781 (manufactured by DIC); Fluorad FC430, Fluorad FC431, Fluorad 100 201222149 iy/4^pif FC171 (above Sumitomo 3M (share)); Surfllon S-3 82 , Surflon SC-101, Surflon SC-103, Surflon SC-104, Surflon SC-105, Surflon SC1068 ' Surflon SC-381 ' Surflon SC-383 &gt; Surflon S393, Surflon KH-40 (above by Xu Zhizi) ))); Solsperse 20000 (manufactured by Sakamoto Lubrizol). Specific examples of the nonionic surfactant include glycerin, trishydroxypropyl propane, trihydrocarbyl ethane, and ethoxylates and propoxylates thereof (for example, glycerol propoxylate, glycerol ethoxylate) Base, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene decyl phenyl ether, polyethylene glycol dilaurate, poly Ethylene glycol distearate, sorbitan fatty acid ester (manufactured by BASF Corporation)

Pluronic L10, Pluronic L31, Pluronic L61, Pluronic L62, Pluronic 10R5, Pluronic 17R2, Pluronic 25R2, Tetronic 304, Tetronic 701, Tetronic 704, Tetronic 901, Tetronic 904,

Tetronic 150R1) and so on. Specific examples of the cation-based surfactant include a phthalocyanine derivative (trade name: EFKA-745 'Mori, Ltd.'), and an organic kiln oxide polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), Methyl) acrylic (co)polymer Polyflow No. 75, Polyflow No. 90, P〇lyfl〇w No. 95 (manufactured by Kyoeisha Chemical Co., Ltd.), W001 (manufactured by Yusei Co., Ltd.), and the like. Specific examples of the anionic surfactant include W004, W005, and W017 (manufactured by Yusei Co., Ltd.). Examples of the polyoxo-based surfactant include "Toray Silicone DC3PA", "Toray Silicone SH7PA", "Toray Silicone DC 11 PA", and "Toray Silicone SH21 PA" manufactured by Toray Dow Coming 101 201222149 /υμιι (share). "Toray Silicone SH28PA", "Toray Silicone SH29PA", "Toray Silicone SH30PA", "Toray Silicone SH8400"; "TSF-4440", "TSF-4300", "TSF-4445", "TSF" manufactured by Momentive Performance Materials -4460", "TSF4452"; "KP341", "KF6001", "KF6002" manufactured by Shin-Etsu Silicone Co., Ltd.; "BYK307", "BYK323", "BYK330" manufactured by BYK-Chemie "Wait. The surfactant may be used alone or in combination of two or more. The photosensitive composition may or may not contain a surfactant, and in the case of containing a surfactant, the content of the surfactant is preferably 相对 with respect to the total solid content of the photosensitive composition of the present invention. 〇1% by mass or more and 1% by mass or less, more preferably 0.001% by mass or more and 〇1% by mass or less. <Adhesion Promoter> The photosensitive composition of the present invention can contain a coating adhesion promoter in a range that does not impair the object of the present invention. Examples of the adhesion promoter include: 3-glycidyloxy prop tdmethoxy Silane, 曱-mercapto propylene methoxypropyl decyl dimethoxy oxy, 3-amino ring Oxypropoxypropyl triethoxy sylvestre, 3 • epoxidized &amp; propyl decyl dimethoxy decane, 3-aminopropyl trimethoxy decane, and the like. 1: The compound described in [pp. 48] of the paragraph of Japanese Patent Laid-Open Publication No. 2008-243945. 102 201222149 jy.mpif The photosensitive composition of the invention may contain a adhesion promoter, or may not contain a promoter, in the case of containing a adhesion promoter, and the preferred amount of the adhesion promoter is not limited to (4), usually The total solid content of the composition towel is preferably 10% by mass or less, and particularly preferably 0.005% by mass to 5% by mass. <Polymerization inhibitor> The photosensitive composition of the present invention may contain a small amount of a polymerization inhibitor in order to prevent unnecessary thermal polymerization of the polymerizable compound during storage or storage of the photosensitive composition. Examples of inhibitors include hydr0qUinone, p-methoxyphenol, di-t-butyl-P-cres〇l, Pyrogallol (pyr〇gall〇1), t-butylcatechol, benzoquinone, 4,4'·thiobis(3-mercapto-6_third (4,4'-thiobis(3-methyl-6-t-butylphenol)), 2,2,-fluorenylene bis(4-decyl-6-tert-butylphenol) (2, 2-methylenebis(4-methyl-6-t-butylphenol), N-rylorylphenylhydroxylamine sulfonium salt, and the like. The content of the polymerization inhibitor is preferably from 0.0005% by mass to 5% by mass based on the total solid content of the photosensitive composition. <Ultraviolet absorber> The photosensitive composition of the present invention may contain an ultraviolet absorber. UV absorbers can be used: salicylate, benzophenone, benz〇triaz〇le, 103 201222149 substituted acrylnitrile, external Absorbent. Examples of the triazine-based purple salicylic acid I-based ultraviolet absorber include vinegar, water, octyl, salicylic acid, and tert-butylbenzene, and ketone-based ultraviolet absorption. Illustrative examples include benzophenone, 2,2'-di- 4,4,-dimethoxydiphenyl; two J,: 4 base four = one ketone, 2-hydroxy _4 methoxy benzophenone Ketone, 2,4_di, 2-meryl octyloxybenzophenone and the like. Further, examples of the benzotriazole fluorene external absorbent include 2_(2,_hydroxy_3,5,-di-diphenyl)_5·gas benzotrisole, 2_(2, _ base group _3, tert-butyl _5, · a = base) _5_ chlorobenzotrisene, 2 _ (2, · carbyl 3, _ third pentyl), isobutyl ^,): 5 · gas benzene And three saliva, 2_(2, · secret · 3, · isobutyl _5, _ methyl phenyl chlorobenzene hexamidine, 2 · (2, - thiol-3, · isobutyl _ 5, _propylphenyl)5 gas benzotrisodium, 2-(2'. carbyl 3', 5'-di-t-butylphenyl) benzotrisole, 2 must-based -j'- Methylphenyl)benzotrisole, 2_[2,_transalkyl, (1) methyl detailed group] Examples of substituted acrylonitrile-based ultraviolet absorbers include: 2 • cyano-3,3 diphenyl Acrylic acid, 2-cyano-3,3-diphenylpropionic acid 2·ethylhexyl ester, and the like. Further, examples of the triazine-based ultraviolet absorber include 2-[4-[(2-trans)- 3-dodecyloxypropyl)oxy]_2-hydroxyphenyl]_4,6-bis (2) , 4-dimercaptophenyl)],3,5-triazine, 2_[4·[(2hydroxyltridecyloxypropyl)oxy]-2-hydroxyphenyl]·4,6- Bis(2,4-dimethylphenyl)_ι,3,5-triazine, 2·(2,4-dihydroxyphenylhydrazine, 6-bis(2,4-dimethylphenyl)-1 , 3,5-triazine and other mono(hydroxyphenyl)triazine compounds; 2,4_bis(2-hydroxy-4-propoxybenzene 104 201222149 /4〇pif base)-6-(2,4-di Nonylphenyl)_13,5-triazine, 2,4-bis(2-hydroxy-3-methyl-4-propoxyphenyl)-6-(4-mercaptophenyl)·1,3 ,5-triazine, 2,4-bis(2-hydroxy-3-indolyl-4-hexyloxy)- 6-(2,4-diphenyl) 4,3,5-triazine Iso-bis(hydroxyphenyl)triazine compound; 2,4-bis(2-hydroxy-4-butoxyphenyl)-6-(2,4-dibutoxyphenyl)-1,3,5 -triazine, 2,4,6-tris(2-hydroxyl octyloxyphenyl)-1,3,5-triazine, 2,4,6-tris[2-hydroxy-4-(3-butyl) a tris(hydroxyphenyl)triazine compound such as oxy-2-hydroxypropoxy)phenyl]-1,3,5.triazine, etc. In the present invention, the above various ultraviolet absorbers may be used. One type may be used alone or two or more types may be used in combination. The photosensitive composition may contain an ultraviolet absorber or may not contain an ultraviolet absorber, and in the case of containing an ultraviolet absorber, relative to the total solid content of the photosensitive composition, The content of the ultraviolet absorber is preferably 〇〇〇〇% by mass or more and 1% by mass or less, more preferably (9) 丨% by mass or more 〇1 质

Us. Li······································································· j is a non-photosensitive composition which can be used for a low refractive index material: species: the content of each component is determined according to the purpose or the added low purity is a good axis, and is used for a sufficiently photosensitive composition. It is preferred that the metal content as an impurity is less than 201222149 jy /njuii. The metal concentration in the composition can be measured with high sensitivity by the Icp_MS method or the like, and the metal content other than the transition metal at this time is preferably 3 〇〇 ppm or less and more preferably 1 〇〇 ppm or less. The method for producing the photosensitive composition is not particularly limited, and in the case of containing an organic solvent, the photosensitive group is obtained by adding each component of the composition to an organic solvent and stirring. The above composition is preferably filtered by a filter to remove insoluble matter, and the gelatinous component is finely divided. The diameter of the _ (four) rhyme _ is preferably 〇. 〇 5 μιη~2.0 μηι 'better than the aperture 〇〇 5 〇 μιη, the most, the pore diameter of the pores 0.05 μηι~0.5 μηΐβ filter is preferably poly four Vinyl fluoride, polyethylene, polypropylene, nylon, more preferably polytetrafluoroethylene, polyethylene and nylon. [7] Pattern forming method, and the pattern forming method of the present invention, comprising: a step of forming a photosensitive film using a photosensitive composition, a step of exposing a photosensitive layer, and a step of using a developing solution containing an organic solvent (IV), and the above-mentioned photosensitive The composition contains (A) a hollow or porous particle, a compound which produces an active species by irradiation with active light or radiation, and (6) a fairy with a low activity in the above-mentioned active species. A soluble compound of the towel. Further, the present invention also relates to a pattern film which is obtained by the pattern forming method. The photosensitive ridge method formed by the photosensitive composition used in the pattern forming method of the present invention is not particularly useful, for example, by the following operation

S 106 201222149 3y/4ipif is formed by any method such as a spin coating method, a roll coating method, a dip coating method, a scanning method, a jet method, a bar coating method, or an inkjet method. After the composition is applied onto the substrate, the solvent is removed by heat treatment as needed to form a coating film (photosensitive film), and then a prebaking treatment is performed. Examples of the substrate include a germanium wafer substrate, a Si 2 wafer substrate, a SiN wafer substrate, and a glass substrate, or a substrate having various metal layers formed on the surface of the substrates, or a plastic film, a microlens, and an image. The substrate of the crystal-loaded color filter is used for the sensor. The method of coating on the substrate is preferably a spin coating method, a scanning method, or an ink jet method. Particularly preferred is a spin coating method. A commercially available device can be used for the spin coating method. For example, it is preferable to use the Clean Track series (made by Tokyo Electron) and the D_SPIN series (Dainipp〇n)

Screen), SS series, or (^ series (manufactured by Tokyo Chemical Industry Co., Ltd.). As the spin coating conditions, it can be any kind of rotation speed, but in terms of the in-plane uniformity of the film, the diameter is 3 The 〇〇mm 矽 substrate preferably has a rotation speed of about 1300 rpm. Further, in the method of discharging the composition solution, j may be a dynamic ejection of a composition solution sprayed on a rotating substrate, and sprayed on a stationary substrate. Any one of the static discharge of the composition solution is used, but it is preferably dynamically discharged from the viewpoint of the in-plane uniformity of the film. Further, it is also possible to use a viewpoint of suppressing the amount of consumption of the composition. In the following method, only the main solvent nozzle of the composition is discharged onto the substrate to form a liquid film 'and then the itl composition is sprayed thereon. There is no particular limitation on the spin coating time. In the case of the control of 107 201222149 / -r-^μιι = , it is also preferable to carry out the treatment for preventing the film at the edge portion of the substrate from remaining (edge rinsing, back rinsing) In addition, the photosensitive composition is For example, the nozzle attached to the discharge portion of the coating device, the piping portion of the coating device, the inside of the coating device, or the like may be easily cleaned and removed using a known cleaning liquid. In this case, the efficiency is further improved. The cleaning is removed, and the above-mentioned towel is used as a cleaning liquid as the solvent disclosed in the photosensitive granules of the present invention, and is also used as a cleaning agent. Further, Japanese Patent Laid-Open No. Hei 7-128867 Japanese Patent Laid-Open No. Hei 7-M6562, Japanese Patent Laid-Open No. 7-1, Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. 2006-85140, Japanese Patent Laid-Open No. 2006-85140, Japanese Patent Laid-Open The cleaning liquid described in the Japanese Patent Laid-Open Publication No. Hei. No. 2007-2101, the Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. 2007-281523, and the like. (4) As the cleaning solution for cleaning and removing the photosensitive material, the cleaning liquid is preferably an alkylene glycol monoalkyl ether carboxylate or an alkyl glycol monoalkyl ether. The solvent of the liquid may be used alone or in combination of two When two or more solvents are mixed, a mixed solvent of a solvent having a hydroxyl group and a solvent having no hydroxyl group is preferred. The mass ratio of the solvent having a hydroxyl group to the solvent having no hydroxyl group is 1/ 99~99/1, preferably 10/90~9080, especially preferably 20/80~80/20. The mixed solvent is preferably propylene glycol monomethyl ether

108 S 201222149 ^y/43pif acetate ’ PGMEA ) A mixed solvent with propylene glycol monoterpene ether (Guangzhou Coffee (3) i m〇_ethyl ether, E), and the ratio is 6_. Further, in order to increase the permeability of the cleaning liquid to the photosensitive composition, the surfactant disclosed above as an interface agent which can be contained in the photosensitive composition may be added to the cleaning liquid. The method of pre-bake processing is not particularly limited, and it can be applied by heating using a hot plate which is usually used, heating by using a furnace, and by a rapid hot process (kissing note)

ThermalProcessor, RTP, etc., using light irradiation, heating, etc. of a gas lamp. It is preferably a heating method in which the heating plate is heated and the furnace is used. Heating plate A commercially available device is preferably used, such as a Clean Track series (manufactured by Tokyo Electronics Co., Ltd.), a D-SPIN series (manufactured by Otsuka Screen), an ss series, or a cs series (manufactured by Tokyo Chemical Industry Co., Ltd.). The furnace is preferably a usable series (manufactured by Tokyo Electronics) #. The conditions for the above prebaking can be exemplified by using a hot plate or an oven at 6 Torr. (:~150t: (preferably 6 (Tc^120°C) for 0.5 minutes to 15 minutes. The step of exposing the photosensitive film is performed as needed through a mask. Active light that can be applied to the exposure Examples of the radiation include infrared light, g-line, h-line, i-line, KrF light, ArF light, X-ray, electron beam, etc. From the viewpoints of exposure amount, sensitivity, and resolution, it is preferably a twist line or a KrF. The light, the ArF light, and the electron beam are preferably i-line or KrF light from the viewpoint of wide-spreadness. In the case where the i-line is used for irradiating light, it is preferably 100 mJ/cm 2 to 10000 mJ/cm 2 . The exposure amount is irradiated. In the case of using KrF light, it is preferably irradiated at an exposure amount of 30 mJ/cm 2 to 300 mJ/cm 2 . 109 201222149 jy /H-jpu In addition, the exposed composition layer can be used as needed One manifestation

Use a hot plate or oven before heating at °5 for about 30 minutes at 70 °C ~ 180 °C. ",,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, A negative pattern (resist pattern) is formed. The second developing solution which can be used for development by a developing solution containing an organic solvent may be a solvent containing a solvent, an alcohol solvent, an amine solvent, an amine solvent, or the like. Examples of the polar solvent such as a solvent, and the ketone-based solvent-developing & ketone-based solvent include L octanone, 2 _ octyl copper, 2 ketone in acetone, 3 hexanone, 4 ketone, hexanone, 2 - Benzyl Benzyl®, methylpentyl _, cyclohexyl _, methyl ring _, yl ethyl _, decyl butyl ketone, ethionyl propyl _, guanyl propyl _, violet _ 〇. Gorge), Inner Gangyi Xitong, Tian-Yizhizhi, acetamyl sterol, floc soil, soil _, isophor _, propyl carbonate, etc. The oxime solvent can be exemplified by: Acetyl acetate, isopropyl acetate, pentane acetate &amp; butyl hydrazine acetate ethanol monoethyl HCl H = / a & A ^, ethanediacetic acid hydrazine, ethyl 匕 t is acetic acid , diethylene glycol monoethyl 3- oxime, acetyl propyl propionate, 1 methoxy butyl hydrazine shovel T- 3 - methoxy butyl acetate, bismuth citrate, 丁, brewing, Formic acid propyl, lactic acid, §, B, 4, acetic acid, acetaminophen, lactate, etc. Special money and other acetic acid. ―Ethyl acetate, isopropyl acetate, and acetic acid alcohol solvent, for example, &gt; TS^, ethanol, n-propanol, isopropanol, 110 201222149 jy/nopif n-butanol, second butanol, third Butanol, isobutanol, n-hexanol, 4-methyl-2-pentanol, n-heptanol, n-octanol, n-nonanol, etc., or ethylene glycol, mono-diethylene glycol, triethylene glycol, etc. Alcohol solvent, or ethylene glycol monoterpene - propylene glycol monoterpene ether, ethylene glycol monoethyl ether, propylene glycol monoethyl ether, diethylene glycol monomethyl ethane triethylene glycol monoethyl ether, decyloxy hydrazine For example, a glycol-based solvent such as a butanol, or an ether-based solvent may, for example, be a di-ether, a dioxane or a tetrahydrofuran. For the present mercapto solvent, for example, N-mercapto-2-pyrrolidine_, dimercaptoacetamide, N,N-dimercaptocarbamide, hexamethylene ruthenium Amine C hexamethyl phosphoric triamide ), 1,3 dimethyl odor 2 tons, and the like. Do not! Examples of the flue-based solvent include aromatic solvents such as toluene and xylene, and aliphatic hydrocarbon solvents such as pentane, hexane, octane and decane. The above solvents may be mixed in a plurality of types, or may be used in combination with a solvent or water having a property of & Among them, in order to achieve the effect of charging and clarifying, it is preferred that the water content of the entire developing solution is less than that of the two-wax. In addition, the amount of the developer is preferably 90% by mass or more based on the total amount of the developing solution, and the amount of the developer is more than 100% by mass based on the amount of the coating agent. Further, it is preferably 95. The I-containing organic solvent-developing solution preferably contains at least one of the group of the solvent, the alcohol solvent, and the guanamine solvent. The vapor pressure of the developing solution containing the organic solvent in the crepe solvent is preferably 2 、: 5 111 201222149 jy / HDpu kPa or less 1 main horse 3 lc|&gt;a The vapor pressure of the turbid liquid is set to 5 ki> Ar is 2 kPa or less. By suppressing the evaporation in the shadow cup, the temperature uniformity in the size of the developer on the substrate or in the wafer surface is improved, and the transfer is good for 5 coffee or less. Specific examples of the octanone and the pressure can be exemplified by the same, hexanone, decylcyclohexanone, cage I-g-, 2-hexanone, diisobutyl ketone, butyl hexanoic acid, pentane acetate, Di-,, methyl isobutyl ketone, etc., the same solvent, continuous acetic acid vinegar, diethylene glycol, monobutyl: alcohol: hydrazine-acetic acid vinegar, ethylene glycol monoethyl ethane, ethyl-3-ethoxy ruthenate致美二二 glycol 乙一乙叫乙ethoxybutyl b _ oxybutyl butyl acetate S, 3-methyl lactic acid butyl vinegar, lactic acid formic propyl vinegar, lactic acid B, alcohol, second butanol , tert-butanol, iso-n-propanyl, isopropanol, n-butanol, n-heptanol, n-octanol, n-hexanol, 4-methyl-2-pentanediol, triethylene glycol, etc.: :Special alcohol solvent 乙二醇 glycol, diethyl ether, ethylene glycol monoethyl ether, long-term oxime ether, propylene glycol, ethylene glycol, single-ethyl bond, methoxy--: Ding morning, diethylene glycol A Yue, a sputum and other slavish solvents, Ν•甲一赖 solvent, tetrahydro as χτ χτ A storm 2_ than each bite, Ν, Ν-dimethyl: a, ,, - 曱 曱Amine amide solvent, benzene benzene = acetaminophen, brothel and other fat _ solvent And aryl: Qiao, cyclohexyl - cyclohexanone, benzene, ketone group paid solution 2 has: - Fan Ding day unitary purpose amyl acetate, propylene glycol monomethyl ether acetate Yue acetate,:, beta]

S 112 201222149 jy/43pif Drunken early butyl ether acetic acid, _ ester, ethyl I ethoxy propionate ^ ethylene glycol monoethyl _ acetic acid butyl acetate vinegar, 3 - methyl _3_ = base two acid vinegar ), alcoholic solvents such as decyloxybutyrate, isobutanol, n-hexanol, 4·-first butanol, and third n-nonanol, B, ', n-heptanol, n-octanol, soluble sword, B Glycol propylene glycol monoethyl ether such as alcohol mono 2 2, triethylene glycol, etc., diol mono (10), methoxydioxoyl group, such as ethylene glycol monoethyl ether and butyl butyl alcohol. Acetylamine, N,N-dimethyl sulphate, methyl 1 pyrrolidone, n, n- and other aromatic flue-based solvents, succinium: amide-based solvent, dioxin-based fluorochemical and / = n-ionic or non-existing Japanese patent special-purpose daily call such as =3 profit = the surfactant described in: #61-226746, Japanese Taizhi 41唬^ newspaper, Japanese patent special open Zhaoben patent special opening Zhao 62_17Cai = Kairi = 226745, Japanese Gazette No. 63-34540, Japanese special, Japanese Patent Special Open __ from _2230165, Japanese eight-phase alpha _ i 唬 &quot; '报, Japan Patent special opening 9-54432 ί 解释 奎 呈 = Ping Μ 988 U.S. Patent No. 5,405, 720, 'Café's Patent No. 536_, US Patent No. A, Brother's Letter, US Patent No. 5,296,330, U.S. Patent No. 5,436,098, U.S. Patent No. 5,576,143, 113 201222149 =Special No. 5,294,511, U.S. Patent No. 5,824,451, which is a non-ionic surfactant. The non-ionic interface is active and has no axis limitation, and it is particularly preferable to use a Schottky surfactant or a Shixia surfactant. The amount of the surfactant used in the total amount of the developer is usually 0.001% by mass to 5% by mass, preferably 5% by mass to 2% by mass, particularly preferably 0.01% by mass to 5% by mass. . For the development method using the organic hydrazine developing solution, for example, the following method can be applied: a method of immersing a substrate in a tank filled with a developing solution for a certain period of time (immersion =); by using surface tension, stacking a developer on the surface of the substrate , the method of squatting at the door, and the method of smear (puddie meth〇d); the method of spraying the surface of the substrate (spraying method); the speed of the substrate rotating on the sole-money rotation at a certain speed A method (dynamic dispense method) in which the developer is ejected from the nozzle while being continuously scanned by scanning, and the liquid is discharged. Development _ will vary depending on the shouting of the composition of the sensation. Usually it is 30 seconds to 12 sec seconds at 253⁄4. - in the case where the above various development methods include a step of ejecting the developer from the developing nozzle of the self-developing device to the resist film, it is preferable that the discharge amount of the ejected liquid (the flow rate per unit area of the ejected developing solution) is preferably Below $mL/sec/mm2, more preferably 1.5 mL/Sec/mm2 or less, and particularly preferably mL/Sec/mm2 or less. There is no particular lower limit for the flow rate, and if it is ^1, it is preferably 0.2 mL/sec/mm2 or more. ^Processing The discharge pressure of the developer to be discharged is set to the above range, thereby reducing the tendency of pattern defects caused by development residue after development

S 114 201222149 39745pif For the sake of T not determined, it is generally considered that the pressure may be reduced, and the range of the light is suppressed, the developer is applied to the photoresist film, and the developer solution is not carefully cut (4). ^(四)Μ—) at the outlet of the nozzle is a method of using a pump in the developing device, and the following method may be mentioned: a method of changing the pressure to change the pressure, or hunting by the supply from the pressurized box: the side can be implemented after the side Replace it with:;=:r=== 淋^. The solvent described in the organic solvent in the developing solution is at least one type of organic solvent in the group consisting of the solvent. = is a step of performing rinsing containing an alcohol-based solvent or a vinegar-based solvent selected from the group consisting of _solvent, "machine 115 201222149 after use", and more preferably after use for development, using rinsing The step of washing with liquid is to carry out the step of washing with a rinsing solution of monohydric alcohol having a right carbon number of 5 or more after ageing. This: using:: The alcohol used in the subsequent rinsing step can be listed as straight a chain-like alcohol, specifically: r butanol, 2-butanol, 3-butanol, tert-butanol, r-pentanol, 2-pentanol, b-hexanol decyl alcohol, 1: heptanol, 1: octanol, 2-hexanol, cyclopentanol, 2-heptanol methyl glycol pentane 3-hexanol, 3-heptanol, 3-octanol, 4-octanol, etc. I-hexanol, 2-hexanol, and a good stone-to-peel number of 3-methylbutanol or the like are used. "Methyl 2-pentanol, pentyl alcohol, and mixed use." The water content in the organic solvent eluent other than the above may preferably be less than 5% by mass, particularly preferably less than 3 mass Q/L mass 1/°' more preferably less than the amount ❶ /. A good developing material can be obtained so that the water content is less than 10%, that is, the amount of the oblique amount is preferably 90% by mass or more based on the total amount of the eluent, and the mass % of the organic solvent of the washing liquid is more than The mass% or less is preferably less than the % by weight. Preferably, the amount of the liquid is 97% by mass or more, and the developer containing the organic solvent has a vapor pressure of 2 Torr, preferably QT. Preferably, the leaching is preferably 0.1 kPa or more and 5 kPa or less, ^, 5 kPa or more. Below, below 3 kPa. It is preferable to set the shape and φ light to 0.12 kPa or more, and to set the money pressure of the eluent to (four) kpa or more, 5

S 116 201222149 iy/45pif ::: can also be added with an appropriate amount of surfactant. μ The above-mentioned eluent containing organic solvent is used for the following: eg; application:; method: the method of cleaning is not particularly limited, and the method is as follows: at a constant speed method (rotary coating) Method), the substrate is filled with leaching =; method of anti-surface spray _ lotion method (3) shot method) 4, which is preferably rotated by the spin coating method qing ~ 4 face ah, the other The pattern forming method of the invention can be developed by using an organic developer after development with an organic developing solution. As the alkaline developing solution, for example, inorganic bases such as sodium hydroxide, potassium hydroxide, sodium stove, sodium citrate, sodium metasilicate, and aqueous ammonia; primary amines such as ethylamine and n-diamine; diethylamine and di- a secondary amine such as n-butylamine; a tertiary amine such as triethylamine or diethyldiamine; an alcohol amine such as dimethylethanolamine or triethanolamine. tetramethylammonium hydroxide or tetraethylammonium hydroxide Amphoteric salt; D is a cyclic amine such as a pyridyl group; etc.; 1,8-diazabicyclo[5 4 0]-7-undecene, 丨5_dioxabicyclo[4.3.0]-5 • An aqueous solution such as terpene. Further, an appropriate amount of an alcohol or a surfactant may be added to the aqueous alkaline solution and used. The concentration of the test developer is usually 〇 1 mass% to 20 mass y 117 201222149 The pH of the alkaline developer is usually 10 0 to 15 〇. Particularly preferred is a 3% by mass aqueous solution of tetradecyl ammonium hydroxide. The method described in the developing method using the organic shirting liquid can be similarly employed by the developing method of the test (IV) liquid. Preferably, the step of washing the wood washing liquid after the development is carried out is carried out. The eluent in the rinsing treatment may be used by adding an appropriate amount of the montmorillon active agent using pure water. Further, the pattern forming method of the present invention is preferably a step of heating followed by a heating step (pGstBake) after the development step using the phase H'5V liquid or the developer. The developer and the eluent remaining in the figure (4) and inside the pattern are removed by baking. The ageing shot after the rinsing step is performed by heating the pattern 加热 by a heating means such as a heating plate or (d). The post-baking towel has a heating temperature of usually 12 (TC~25 (TC, preferably _C 230 C. In addition, the heating time varies depending on the heating method, and is usually heated on a hot plate, usually 5 minutes to minutes or so 'in the case of heating in the box, usually 30 minutes to 9 minutes or so. In addition, when the grill is used for baking, it is also possible to use a staged baking method such as heating twice or more. After the step is performed, post-heating and/or post-exposure of the formed pattern film may be performed as needed to further promote hardening of the pattern film (post-hardening step by hard film treatment).

S 118 201222149 3y/45pif By this, there are cases where light resistance, weather resistance, and film refractive index are also improved. , a (five), and then low mouth hard film treatment, refers to the substrate on the coffee and so on. Coffee, (team). For example, a polymerization reaction in which the polymerizable property remaining in the resin can be utilized can be utilized. The post-heat treatment: "It is preferably in the range of 1 minute to 3 hours, more preferably in the range of 丨 minutes to 围, and particularly preferably in the range of 1 minute to 1", and the number of the temples of the Japanese 丰 的 χ ^ ^ ^ ^ is performed. (4) (4). The post-heat treatment may be further classified into the present invention, and the high energy, such as light irradiation or radiation riding, may be exemplified by electron beam, ultraviolet ray, xenon ray, etc., without being subjected to heat treatment, but The methods. The row (7) is limited to the case where the beam is used as a high-energy line, and the energy is preferably kev~50 keV, more preferably 0.2 keV~3G keV, especially preferably 〇5咏~20 keV. The total dose of the electron beam is (4)_ _ μ 〆 为 _ _ _ 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 2 。 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射 照射4〇〇ΐ。 The force is preferably 0 kPa to 133 kPa, more preferably 〇kpa~6() kp OkPa ~ 20 kPa. ^ From the viewpoint of preventing oxidation of the polymer, the gas ring around the substrate 119 201222149 is An inert gas atmosphere such as Ar, He, or nitrogen is used. In addition, gases such as oxygen, hydrocarbons, and ammonia may be added to the opposite of the enthalpy, the electromagnetic wave, and the chemical species. The electron beam irradiation can be carried out in two cases. The electron beam irradiation conditions are set to be the same every time, and the mother and the child can be carried out under different conditions. The cookware and the wire are used as high energy rays. Wei A two car father is 2160 nm ~ 400 nm, its power is directly above the substrate

ItlTZT ^2000 mw cm'2° ^ degree is preferably 25〇C~45(rc, more preferably 25〇t~·.c, especially good for im5(rc:. In other words, the gas environment around the substrate is preferably Ar'He. The pressure at the second time is preferably (10) a~i 33 kp=f raw milk %. High energy such as heat treatment line irradiation can be performed simultaneously or sequentially. Recorded occupational exposure (four) into a hard film. t, shot into a radiation film, for the dry film thickness 'can be formed i times the thickness of the coating is 〇〇 5 哗 = Oh, 2: thickness when under coating 〇" The use of the pattern forming method of the present invention is not particularly limited to the above, and is used for producing a low refractive index film. Therefore, the present invention also relates to a method obtained by using the above method. , that is, a low refractive index film. The present invention also relates to light including the above low refractive index film. In addition, the present invention also relates to a solid state including such an optical device.

S 120 201222149 3y/45pif photography elements. Hereinafter, such a low refractive index film (e.g., an antireflection film) will be described in detail. Among them, the preferable range of the following various physical properties of the low refractive index film is particularly preferably in the range of use of the low refractive index film, but is not limited to this use. <Low Refractive Index Film> The pattern film obtained by using the above composition exhibited excellent low refractive index. Specifically, the refractive index of the pattern film (wavelength: 633 nm, measurement temperature: 25 ° C) is preferably 1.35 or less, more preferably [23 to 1.34, particularly preferably 1.25 to 1.33. When it is within the above range, it is useful as an antireflection film to be described later. <Antireflection film> A preferred use aspect of the pattern 获 obtained by using the composition used in the pattern forming method of the present invention described above is an antireflection film. It is particularly suitable for an anti-reflection film for optical devices (for example, image sensing ||microlenses, (four) display panels, liquid crystal displays, organic electroluminescence, etc.). The lower the reflectance when used as an antireflection film, the better. Specifically, the mirror average reflectance in a wavelength region of preferably 450 nm to 650 nm is preferably 3% or less, more preferably 2% or less, and most preferably 1% or less. In addition, the smaller the reflectance, the better, preferably 0. The haze of the antireflection film is preferably 3% or less, particularly preferably 1% or less, and most preferably 0.5% or less. In addition, the smaller the reflectance, the better, and the best is 〇. In the case where the film is used as a single-layer type anti-reflection film, if the refractive index of the transparent substrate is nG, the refractive index n of the anti-reflective ruthenium is preferably ^, 121 201222149 jy /^^ριι is relatively transparent The refractive index of the substrate is 1/2 power. For example, the refractive index of the glass is 1.47 to 1.92 (wavelength is 633 nm, and the measurement temperature is 25C), so that the single-layer antireflection film formed on the optical glass is preferably 1H38. Further, the film thickness of the antireflection film at this time is preferably from 10 to 10 μm. In the case where the above film is used as a multilayer antireflection film, the film may be a low refractive index layer, for example, a high refractive index layer, a hard coat layer, and a transparent plate may be included. The scales may or may not be provided with a hard coat on the substrate: and the tantalum is straight into a ten-refractive index layer. Further, a medium refractive index layer may be provided between the high refractive index layer "low refractive index layer" or between the high refractive index layer and the hard coat layer. Hereinafter, each layer of the multilayer type will be described in detail. 1) Low refractive index layer The low refractive index layer includes a pattern film obtained by using the composition of the present invention as described above. The refractive index and thickness of the low refractive index I are explained. (i) The refractive index is preferably used. The refractive index of the pattern film obtained by the composition of the invention (wavelength: 633 nm, measurement temperature: 25 Å), that is, the refractive index of the low refractive index film (also referred to as a low refractive index layer) is 1.35 or less. The j low refractive index film has a refractive index of 135 or less, and when combined with a high refractive index film (also referred to as a high refractive index layer), it exhibits an antireflection effect. (More preferably, a low refractive index) The refractive index of the film is 1.34 or less, and particularly preferably 1.33 or less. Further, in the case where a plurality of low refractive index films are provided, only

S 122 201222149 jy/4Dpif It is sufficient to have the above-described value of the refractive index. Reflection: The :::=:r case, the more excellent anti-film;:: multiply effect, and it is easy to get 1 〇f 〇ί refraction between the low refractive index layer and the high refractive index layer The value in the range of values within the rate difference is particularly preferably set to 〇·15, and the thickness of the nm 2 refractive index layer is not limited. For example, it is preferably 20 if the low refractive index layer When the thickness is 20 or more, the breakage of the high-refractive-index film which is a base is transmitted, and the other side = 3 〇 0 η &quot; 1 or less, it is difficult to cause light interference, and it is easy to produce a reflection county. Therefore, it is more preferable to make the low refractive index layer sigh as 20 nm to 250 nm, and particularly preferably to 2 〇 fine ~ 2 〇〇 mail. ???: In order to obtain higher antireflection properties, a plurality of low refractive index layers are provided to form a layer structure, as long as the total thickness is 20 nm to 300 nm. (2) The high-refractive-index layer is not particularly limited as a curable composition for forming the refractive index layer, and is a resin containing a resin, a phenol resin, a melamine resin, an alcohol, and a cyanic acid. The vinegar resin, the acrylic acid resin, the polyester resin, the amine bismuth citrate, the eucalyptus, or the combination of 123 201222149 jy/Η^ριι is used as the film forming component. The film is made of a high-definition two-piece, and the purpose is to form a strong scratch. θ is a case where the resistance of the antireflection film can be remarkably improved. 5 The magnetic flux is suspended. The refractive index of the respective resins is h45 to n, and the deuteration energy is not sufficient. Because the refractive index is set to (four) ~ 2.2G. Further, as the hardened form, the thermosetting composition of the heat curing, ultraviolet curing, and electron beam curing is conventionally used, and an ultraviolet curable composition having good productivity is used. The thickness of the interlayer layer is not particularly limited, and is, for example, preferably 20 nm O'OOOnm. When the thickness of the high refractive index layer is 2 〇 nm or more, when the = low refractive index layer is combined, it is easy to obtain an antireflection effect or a squeezing force against the soil plate. On the other hand, when the thickness is 30,000 nm or less, It is difficult to generate light interference, and it is more sure to obtain an anti-reflection effect. Therefore, it is more preferable to set the thickness of the high refractive index layer to 20 nm to 1,000 nm, and more preferably to 50 nm to 5 〇〇 nm. Further, in the case where a plurality of high refractive index layers are provided in order to obtain higher antireflection properties to form a multilayer structure, the thickness of the octadecometer may be 2 〇 nm to 30 〇〇〇 nm. Further, in the case where a hard coat layer is provided between the high refractive index layer and the substrate, the thickness of the high refractive index layer may be 20 nm to 300 nm (3) hard coat layer is used for the antireflection film of the present invention. The constituent material of the hard coat layer is not particularly limited. Such a material may be a single type or a combination of two or more types such as a sulphur oxide resin, a propylene carbonate resin, a melamine resin, and an epoxy resin.

124 S 201222149 3y745pif. Further, the thickness of the hard coat layer is not particularly limited, and it is preferably set to be i π 〜 50 μm η ', and more preferably set to 5 pm to 1 〇 μηι. When the thickness of the hard coat layer is f pm or more, it is easy to more reliably increase the back-force of the anti-reflection film against the substrate. On the other hand, when the thickness is 5 〇jim or less, it is easy to form uniformly. (4) Substrate The type of the substrate used in the low refractive index film of the present invention is not particularly limited, and examples thereof include glass, polycarbon-based resin, polyg-type resin, acrylic acid f resin, and triethyl hydrazine. A fiber-receiving (triaeetyleellulose, TAC), etc. By (4) forming an anti-reflection film including the substrates, the lens portion of the camera, the screen display portion of the television (cathode ray tube, cathode ray tube 'CRT), the color of the liquid crystal display device, the light color, and the photography Excellent anti-reflection effect is obtained in a wide range of anti-reflection films. The pattern film obtained by using the composition used in the pattern forming method of the present invention can also be used as a surface protective glow or retardation film for an optical device (for example, a microlens). The composition used in the pattern forming method of the present invention can be particularly suitably used as a covering use of a microlens which makes the concept of a microlens include the concept of a microlens array. The pattern film obtained by the pattern forming method of the present invention is formed by using the above-mentioned photosensitive composition, has a low refractive index, and has few development residues, and is formed with high resolution. Therefore, it is extremely useful as a film provided in the following regions. ^ : 125 201222149 jy/^opir Various, A-automation (〇fflCe aut〇mati〇n, 〇A) machine, LCD TV mobile phone, tongue, technical camera, etc., fax, electronic copier, solid state photography it An imaging photonic system of a crystal-loaded (_hip) color filter, etc., a region of a fiber optic connector or the like that is particularly intended to suppress light reflection. In particular, by using the pattern forming method of the present invention, a surface is formed on the surface of the microlens. The patterned film of the invention can easily form a high-definition micro-permeation coated with a film having the above characteristics at a high product yield. [Examples] The present invention will be described in more detail below, but is not intended to be &lt;Preparation of Photosensitive Compositions> The components shown in the following Tables 1 to 3 were dissolved in a solvent shown in Table 3 of Table 1 below, and the pore diameter was 〇.2 μιη. The photosensitive composition of the example i to the example 32 and the whistling 2 was prepared by the concentrating of the four gas _ _ 32 Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Μ Specific examples correspond to the above components. The following commercially available products are used for hollow or porous particles.

Snowtex MIBK-SD丄: 30% by mass dispersion of porous cerium oxide manufactured by Nissan Chemical Co., Ltd. —

Snowtex MIBK-ST: 20% by mass dispersion of porous tantalum dioxide manufactured by Nissan Chemical Co., Ltd.

SiliNax SP-PN(b): Powder of hollow cerium oxide manufactured by Nippon Mining Co., Ltd. 201222149 /4^pif

Surulia 2320: 20% by mass dispersion of hollow cerium oxide manufactured by Nippon Chemical Co., Ltd.

Surulia 1110: 20% by mass dispersion of hollow cerium oxide manufactured by Nisshin Chemical Co., Ltd. PL-1-IPA: 12.5% by mass of porous cerium oxide manufactured by Fuso Chemical Co., Ltd. Dispersion PL-1-TOL: Fuso Chemical 40% by mass dispersion of porous cerium oxide produced by the company, PL-2L-PGME: 20% by mass dispersion of porous cerium oxide manufactured by Fuso Chemical Co., Ltd. PL-2L-MEK: Porous Manufactured by Fuso Chemical Co., Ltd. 20% by mass dispersion of cerium oxide AERODISP G1220 : 20% by mass dispersion of porous silica dioxide manufactured by EVONIK company AERODISP 1030 : 20% by mass dispersion of porous cerium oxide manufactured by EVONIK Corporation OSCAL: Daily catalyst The 20 mass% dispersion liquid particle dispersing agent of the hollow ceria which is manufactured by Kasei Co., Ltd. uses the following commercial products. EMULSOGEN COL-020 : alkyl ether carboxylic acid manufactured by Clariant

Disperbyk-101: Polyamide amine acid salt manufactured by BYKChemie

PelexSS-L: Sodium alkyl diphenyl ether disulfonate manufactured by Kao Corporation 127 201222149 J-as Inch Δ6ε i&lt;Organic solvent (D) (mass parts) PGMEA (616) PGMEA/PGME=90/10 (mass ratio) (580) PGMEA (530) PGMEA/cyclohexanone = 80/20 (mass ratio) (715) PGMEA (809.5) PGMEA/ethyl lactate = 70/30 (mass ratio) (833) PGMEA/methyl ethyl ketone =60/40 (mass ratio) (900) Cyclohexan-1 lactic acid ethyl acetate = 80/20 (mass ratio) (620) PGMEA/cyclohexanone = 70/30 (mass ratio) (680) PGMEA (670) PGMEA/PGME=9 (V10 (mass ratio) (914) PGMEA (874) Particle dispersant (A') 1 (mass) § OS Ο 9 ^ ω • 1 1 Disperbyk-101 (0.5) t 1 1 1 Pelex SS-L (1.5) 1 1 Compound (C) (mass) Cl (29) C-2 (17) C-3 05) C-4/C-13=80/20 (mass ratio) (21.5) C -5 (14.5) C-6/C-7=60/40 (mass ratio) (15) C-7 (28) C-8 (29) C-9 (17) C-10 (25) C-ll /C-21=90/10 (mass ratio) (5.8) C-12 (5.1) Compound (B) (mass) CQ &lt;s ^ m3 m ^ OQ 〇B-5 (0.5) \s〇卜00 ^ 0Q Os ZN CQ w B-2 (0.2) B-3 (0.9) Hollow or porous particles (A) (mass) Surulia 2320 (350) S Urulia 2320 (400) Surulia 1110 (450) Snowtex MIBK-SD-L (263) PL-2L-PGME/Surulia 2320 (75/100) OSCAL (150) SiliNax SP-PN(b) (70) AERODISPG1220 (350) AERODISP 1030 (400) AERODISP 1030 (300) Surulia 1110 (80) Surulia 2320 (120) Example 2 Example 3 Example 4 Example 5 Example 6 Example 8 Example 9 Example 10 Example 11 Example 12

SI s 201222149 J-alo inch 6ε organic solvent (D) (mass parts) PGMEA/cyclohexanone = 90/10 (mass ratio) (790) PGMEA/cyclohexanone = 90/10 (mass ratio) (630) Ethyl lactate (730) 4-methyl-2-pentanone (670) cyclohexanone (520) butyl lactate (765) dipropylene glycol monomethyl ether (882.5) dipropylene glycol dimethyl _ (900) diethylene glycol Monobutyl ether acetate (660) ethylene glycol monomethyl ether acetate (829.5) diethylene glycol dioxime ether (912) 3-ethoxypropionate ethyl ester (640) particle dispersant (A') (Parts by mass) 1 1 1 1 1 1 1 1 1 Pelex SS-L (0.5) 1 1 Compound (C) (parts by mass) C-13 (8.5) C-14/C-18=50/50 (mass ratio) (19) ^ /-SV 00 Ό ^ C-16 (25) C-17 (15) C-18 (7.5) C-19 (3.7) ! C-20 (28) C-21/C-22= L0/90 (mass ratio) (39) C-22 (19.5) C-23 (12.7) U ^ Compound (B) (mass) B-4 (1.5) in 0Q 〇VO ώ C 00 ^ B-9 ( 2-5) B-1 (1.3) CN ^ OQ C rn PQ II B-4 (0.5) PQ 〇PQ ___^ Hollow or porous particles (A) (mass) Surulia 2320 (200) Surulia 2320 (350) Snowtex MIBK-SD-L (250) Snowtex MIBK-ST (300) PL-2L-MEK (450) PL-1-IPA (225) PL-1-TOL (1 12.5) SiliNax SP-PN(b) (70) Surulia 2320 (300) Snowtex MIBK-ST (150) PL-2L-MEK (75) PL-1-IPA (450) Example 13 Example 14 Example 15 Example 16 Example Example 18 Example 19 Example 20 Example 21 Example 22 Example 23 Example 24 6 (ni 201222149 J-as inch.6ΓΟ Organic solvent (D) (parts by mass) 3-decyloxypropionate (770) N-methyl Pyrrolidone (900) Dipropylene glycol monoterpene ether (660) Isopropanol (540) Mercaptoethyl ketone (770) 3-decyloxybutyl acetate (790) Dipropylene glycol monoterpene ether (660) 1 Isopropyl alcohol (540) ethyl lactate (905) decyl lactate (660) particle dispersant (A') (parts by mass) &lt; 1 I 1 1 1 &lt; 1 compound (C) (parts by mass) C-25 (4.5) C-26/C-31=70/30 (mass ratio) | (19) | C-27 (35) C-29 (9) C-30 (4.5). ON 〇^ C-28 (35) C-32 (9) 〇^ mo ό巴 1 compound (B) (parts by mass) B-7 (0.5) 00 CQ C PQ w ώ C B-2 (0.5) ώ C 〇\ ^ PQ w Β-9 (10) Hollow or porous particles (A) (mass) PL-1-TOL (225) SiliNax SP-PN(b) (80) Surulia 2320 (300) Surulia 1110 (450 AERODISP 1030 (225) Surulia 1110 (200) Surulia 2320 (300) Surulia 1110 (450) 1 Snowtex MIBK-ST (350) Example 25 Example 26 Example 27 Example 28 Example 29 Example 30 Example 31 Example 32 Comparative Example 1 Comparative Example 2 201222149 iy/45pif <Preparation of Low Refractive Index Pattern Film> The photosensitive composition obtained above was applied onto a tantalum wafer by a spin coating method, and then 100 on a hot plate. The crucible was heated for 2 minutes to obtain a photosensitive film having a film thickness of 0.3 μm. Then, 'for the obtained photosensitive film, a mask of a dot array pattern having a size different from 5 square micrometers to 1 square micrometer by using an i-line stepping machine FPA-3000i5+ (manufactured by Canon)) Exposure was performed at a wavelength of 365 nm. The photosensitive film after the above exposure was subjected to immersion development at 23 ° C for 60 seconds using the developing solution ' shown in Table 4 below. Then, it was rinsed with a rinse liquid shown in Table 4 below using a rotary sprayer, and further washed with pure water to obtain a transparent pattern having a film thickness of 0.3 μm. 131 201222149 jy /*ι·^ριι Table 4 Developer Eluent Example 1 Butyl Acetate 1-Hexan Example 2 PGME 4-Mercapto-2-pentanol Example 3 PGMEA 1-Hexan Example 4 2-Hexanone 4-Methyl-2-pentanol Example 5 2-Heptanone 1·Hexan Example 6 3-Hept-4-Methyl-2-pentanol Example 7 Clum ether 1-hexanol Example 8 3-Ethoxy Ethyl propionate 4-methyl-2-pentanol Example 9 Butyl acetate 4-methyl-2-pentanol Example 10 PGME 1-Hexan Example 11 PGMEA 4-methyl-2-pentanol Example 12 2- Hexanone 1-hexanol Example 13 2-Heptanone 4-mercapto-2-pentanol Example 14 3-Heptanone 1-hexanol Example 15 Benzoate 4-mercapto-2-pentanol Example 16 3-B Ethyl oxypropionate 1-hexanol Example 17 Butyl Acetate 1-Hexan Example 18 PGME 4-Mercapto-2-pentanol Example 19 PGMEA 1-Hexan Example 20 2-Hexanone 4-mercapto-2 - Pentanol Example 21 2·heptanone 1-hexanol Example 22 3·Heptanol I 4-mercapto-2-pentanol Example 23 Benzoate 1-hexanol Example 24 3-Ethyloxypropanoate 4 -Methyl-2-pentanol Example 25 Butyl Acetate 4-Methyl-2-Pentanol Example 26 PGME 1-Hexan Example 27 PGMEA 4-Methyl-2-pentanol Example 28 2-Hexanone 1-Hex Alcohol 29 2-heptanone 4-mercapto-2-pentanol Example 30 3·heptanone 1-hexanol Example 31 2-heptanone 4-mercapto-2-pentanol Example 32 3-heptanone 1-hexanol comparison Example 1 Clum ether 4-mercapto-2-pentanol Comparative Example 2 3-Ethyloxypropionate 1-hexanol <Analysis and residue evaluation> For the obtained transparent pattern, a length measuring SEM (S- 7800H, (manufactured by Hitachi, Ltd.) observed at 30,000 times on the wafer. Will be 132

S 201222149 ^y/4Dplf The minimum size of the dot pattern is taken as the lower the value, which means that it is resolved in Table 5. The minimum size is also observed in the periphery of the pattern: the residual (four) material is observed. In the case of the case, the measurement of the refractive index of the low-refractive-index pattern film was not carried out. Then, the group was applied to a simple one, and a transparent film was obtained by JAW ii σ" for 2 minutes. ΤΓΓηΠΓ Polarimeter (VASE), rate. The value measured by the moon-shaped film at wavelengths of 633 nm and 25CT as refraction, and the results are shown in Table 5. 133 201222149 jy /^tjpn Table 5 Refractive Index Analytical Residue Example 1 1.30 30 μηι ο Example 2 1.28 50 μπι ο Example 3 1.26 70 μπι ο Example 4 1.29 30 μπι ο Example 5 1.32 40 μΐΏ 0 Example 6 1.33 50 μιη ο Example 7 1.30 80 μιτι ο Example 8 1.32 70 μηι ο Example 9 1.32 40 μηι ο Example 10 1.32 50 μπι 〇 Example 11 1.29 60 μπι ο Example 12 1.33 50 μηι 0 Example 13 1.34 40 μηι ο Example 14 1.32 30 μηι ο Example 15 1.33 80 μηη 〇 Example 16 1.33 70 μπι ο Example 17 1.34 50 μηι ο Example 18 1.32 50 Ππι ο Example 19 1.33 30 μηι ο Example 20 1.32 40 μπι ο Example 21 1.30 60 μπι ο Example 22 1.27 60 μηι 〇 Example 23 1.29 50 μηι 〇 Example 24 1.26 70 μηι ο Example 25 1.28 80 μτη ο Example 26 1.29 60 μπι 〇 Example 27 1.29 50 μιη ο Example 28 1.27 50 μηι ο Example 29 1.29 40 μπι 〇 Example 30 1.27 50 μτη 〇 Example 31 1.29 40 μηι 〇 Example 32 1.27 50 μηι ο Comparative Example 1 1.45 30 μπι 〇Comparative Example 2 1.35 No pattern formation was impossible. According to the results of Table 5, when the photosensitive composition of the present invention was used, the refractive index was low and the refractive index was low. A pattern with less development residue. 134

S 201222149 jy /Hjpif On the other hand, Comparative Example 2 which does not contain the compound corresponding to the compound (c) of the present invention cannot be analyzed (formed). (In Table 5, the residue of Comparative Example 2 cannot be formed because of the pattern. Unable to measure). [Simple description of the diagram] None. [Main component symbol description] No 0 135

Claims (1)

201222149 IT^/L/ΛΑ VII. Patent application scope: The method of silk formation: including the method of diminishing the optical composition, the step of exposing the above photosensitive film, and the use of the liquid containing the package i a step of developing, and the above-mentioned photosensitive composition is irradiated with radiation, and the particles, (8) by active light or the compound of the tongue species, and (C) the phase of the compound are used to reduce the inclusion of the organic solvent. Solubility of the liquid The above-mentioned method for forming a pattern of sr = two, wherein the above-mentioned patterning method, in which matter. A low molecular compound having a knife amount of 2,000 or less. 5. The above-mentioned polymerizable compound package, and the pattern forming method, as described in the patent application, wherein, as in the patent application range, a resin having a polymerizable group. The above resin has a method of forming a radical according to the item 5, wherein, as described in the ''Ion ionic polymerizable repeating unit. The above-mentioned method for the formation of the above-mentioned radicals, wherein the complex unit of the formula (3) and (4) is a repeating unit represented by the following formula (1): S 136 201222149 jy/45pif (2) R3&quot; In the above formulas (1) to (3), a21, octa 22 and a23 each independently represent an oxygen atom, a sulfur atom or -N(R41)-, and R41 represents a hydrogen atom or a burnt group; G, G22 and G23 The divalent linking group is independently represented; X2! and Z21 each independently represent an oxygen atom, a sulfur atom or • N(R42)· ' R42 represents a hydrogen atom or an alkyl group; Y21 represents a single bond, an oxygen atom, a sulfur atom, and a stretching Phenyl or _N(R43)_, R43 represents a hydrogen atom or an alkyl group; and R21 to R4G each independently represent a hydrogen atom or a valence substituent. 8. The method of forming a pattern according to any one of claims 5 to 7 wherein the above-mentioned Na is (4) a resin containing cut liver or a gas atom. 9. The pattern forming method according to claim 8, wherein the resin contains a repeating unit represented by the lower ship type (4) or the general formula (5): 137 201222149 In the above formula (4), R1, R2 and R3 each independently represent a hydrogen atom, an alkyl group or an aryl group; and R4 and R5 each independently represent a hydrogen atom, an alkyl group or a decyloxy group; and R6, R7 and R8 are each independently The ground represents an alkyl group, a decyloxy group or an alkenyl group; X1 represents a divalent linking group; η1 represents an integer of 0 to 20; in the above formula (5), R1, R2 and R3 and R1 in the above formula (4) R2 and R3 are synonymous; X2 represents a divalent linking group; and R9 represents an alkyl group substituted by a fluorine atom. 10. The pattern forming method according to claim 9, wherein the repeating unit represented by the above formula (4) or (5) is represented by the following formula (6) or formula (7) Repeating unit: R10 〇10 R13 138 S (6) 201222149 ^y/43pif In the above formula (6), 'R10 represents a hydrogen atom or an alkyl group; and R11, R1 and R13 each independently represent an alkyl group, a decyloxy group or a dilute group; and A11 represents an oxygen atom. And a sulfur atom or _n(R15)-; R15 represents a hydrogen atom or an alkyl group; Y11 represents an alkylene group, an alkoxy group or a combination thereof; in the above formula (7), A12 represents an oxygen atom, a sulfur atom or _n(r15)_; Y12 represents an alkylene group, an alkoxy group or a combination thereof; R14 represents an alkyl group substituted with a fluorine atom; and R10 and R15 have the same meanings as R1〇 and Rl5 in the above formula (6). The pattern forming method according to claim 3, wherein the compound (C) is a compound having a structural unit represented by the formula (4): =+, R+, and R&quot; represents a single bond or a divalent linking group, or a known substituent, in which Ru is a single bond or a divalent linking group bond or a compound (C). It is known that the material X ^ is not a bond or a divalent linking group; the Rp table does not contain A monovalent group of a polymerizable group. The pattern forming method according to claim 11, wherein the structural unit represented by the above formula (A) is contained in 139 201222149, and a ruthenium atom is contained in the main chain of the resin. The object is a tree 曰13. As described in the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ An aryl group, or a combination thereof. Soil 14', as in the method of forming the patent range from item u to ^, the pattern forming method of the above formula (4) towel, Rll shirt, upper two: fr, item 14, wherein 1 = A in formula (4) The method for forming a pattern as described in the above-mentioned Japanese Patent Application No. 7 to Item 7 contains a (A,) particle dispersing agent. The method for forming a pattern as described in the above-mentioned item, which is used for the coating of the microlens. 18. A pattern forming material which is a photosensitive or site-forming material, comprising: (Α) hollow or porous particles, (8) a compound which produces an active species by irradiation with active light or radiation, and (c) _ The action of the active species to reduce the solubility of the developer containing the organic solvent. A photosensitive film formed using a pattern forming material as described in the item [51] of the patent application. 20. A pattern film obtained by the pattern forming method according to any one of the above claims. A low-refractive-index film which is a pattern film as described in the above-mentioned Japanese Patent Application Laid-Open No. Hei. No. Hei. 22. An optical device comprising a low refractive index film as described in claim 21 of the patent application. 23. A solid state photographic element comprising the optical device of claim 22 of the patent application. 141 201222149 jy/HDpif IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the symbol of the representative figure 〆 None. 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: R25 » I i 0 r24 »21 201222149 Chinese manual without line correction This revision date: February 10, 2012 invention patent specification (this manual Format, order 'Do not change any more' ※Do not fill in the mark) ※Application number: ※Application曰:(β·rQ'lZ&quot; Classification: I. Name of the invention: (Chinese/English) Pattern formation method, pattern formation Material, photosensitive film using the same, patterned film, low refractive index film, optical device, and solid-state imaging element PATTERN FORMING METHOD, PATTERN 〇FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE USING THE SAME 2. SUMMARY OF THE INVENTION The present invention provides a pattern forming method, a pattern forming material, a ruthenium photosensitive film, a pattern film, and a low refraction which can form a pattern having a low refractive index and a small amount of development residue at a high resolution. Rate film, optical device, and solid state imaging element. The invention The pattern forming method includes a step of forming a photosensitive film using a photosensitive composition, a step of exposing the photosensitive film, and a step of developing using a developing solution containing an organic solvent, and the photosensitive composition has (A) hollow Or a porous particle, (b) a compound which produces an active species by irradiation with active light or radiation, and (C) a function of reducing the dissolution in a developing solution containing an organic solvent by the action of the above-mentioned white, ?? 201222149 39745pifl Amendment date: February 1, 2012, No. 100137021, Chinese manual, no underline correction, sixth, invention description: [Technical Field] The present invention relates to a pattern forming method, a pattern forming material, and a use thereof a photosensitive film, a pattern film, a low refractive index film, an optical device, and a solid-state imaging element. [Prior Art] A low refractive rare film is used as an antireflection film, a reflection film, a transflective film, a visible light reflection infrared penetrating film, Infrared reflecting visible light penetrating film, blue reflecting film, green reflecting or red reflecting film, bright line The optical function film included in the color filter and the color correction film is formed on the optical member. ° The surface shape is not limited to a flat optical member, and the brightness of the liquid crystal backlight is increased by a lens film, a diffusion film, and a video projection. In the screen of the TV, the fresnel lens or the lenticular lens (丨(10)心_) is the optical functional component of the micro lens #microfibers, which are made of a resin material with a fine knot. The geometrical optical properties of f, but the surface of the microstructure also requires an optically functional film comprising a low refractive index film. In the case where a low refractive index film is used as the anti-reflex film, the single-layer junction luminosity film directly becomes an anti-reflection film. The antireflection film of the If' single layer structure in which the substrate is a resin material or the like has a refractive index of preferably lower than that in the range of 〜1.35. The representative material of the rate film includes a layer containing the following materials: a gas polymer material having a refractive index of 1.46 μ./~I·4, or a polymerization index of i.37~ A porous material obtained by dispersing fine particles of a substance (for example, refer to the patent document υ, but the refractive index is not obtained as L3, 201222149 39745pifl is the 100130137021 Chinese manual without a slash correction. This revision period: February 10, 2012 In addition, Patent Document 2 and Patent Document 3 disclose a photohard composition containing silica fine particles, but there is no description in the case where exposure or development is carried out to form a pattern. In addition to the rate characteristics, it is more desirable to solve the problem of a large number of manufacturing steps, etc. Patent Document 4 and Patent Document 5 disclose the following method as a method of not using a photoresist in order to eliminate the complexity of the process. The dioxin material having the sensation is formed by patterning and developing the film itself, but the resolution in the pattern formation is not filled, and the low refractive index of the obtained pattern is also insufficient. [Patent Document 1] Japanese Patent No. 3718-31 (Patent Document 2) International Publication No. 2007/060884 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2009-197155 (Patent Document 4) [Patent Document 5] Japanese Patent Laid-Open Publication No. 2010-32996 [Summary of the Invention] The problem is to solve the problem of solving the previous incidence rate: In order to provide a method for forming a film having a low resolution and a low H, and a photosensitive film, a pattern film, a low refractive index film, a light material, and a solid-state imaging element using the same. 201222149 39745pifl Revision date: February 10, 2012 is No. 100137021 Chinese specification without scribe line correction The present invention has the following constitution, thereby achieving the above object of the present invention. [1] - Pattern forming method 'includes utilizing photosensitivity a step of forming a photosensitive film by a composition, a step of exposing the photosensitive crucible, and a step of developing using a hybrid containing an organic solvent, wherein the inductive composition comprises: (A) hollow microporous particles, (8) A compound which produces an active species by active irradiation or irradiation with radiation, and (c) a compound which reduces the solubility in an organic solvent-containing developer by the action of the above-mentioned active species. [2] A pattern as described in the above [1] The method of forming a pattern according to the above [1] or [2] wherein the compound (C) is polymerizable. [4] The pattern forming method according to the above [3], wherein the polymerizable compound contains a low molecular compound having a molecular weight of 2 Å or less. [5] The pattern forming method according to the above [3], wherein the polymerizable compound contains a resin having a polymerizable group. [6] The pattern forming method according to the above [5], wherein the resin has a radical or cationically polymerizable repeating unit. [7] The pattern forming method according to the above [6], wherein the radical or cationically polymerizable repeating unit is a repeating unit represented by any one of the following formulas: (3): 201222149 39745pifl Date: February 1st, 2012 is the No. 100137021 Chinese manual without line correction (1&gt; R25 F1 -Cz^C Ο A23-Q23—2«- R36 〇通, (1) to (3), A21, and A23 each independently represent an oxygen atom, a sulfur atom or -N(R41)-, and R41 represents a hydrogen atom or a burnt group; G21, G22 and G23 each independently represent two Valence linkage; isrni and independently represent an oxygen atom, a sulfur atom or -N (RJ丨, R represents a hydrogen atom or an alkyl group; 43 large - represents a single bond, an oxygen atom, a sulfur atom, a phenyl group or a -N ( R43)-, R represents an oxygen atom or a burnt group, · o |^R4() is divided into a surface material or a valence substituent. The upper middle = is a side bond hetero atom or two of which have the above resin work ( Or a repeating unit represented by the general formula (5): 7 201222149 39745pifl is the Chinese manual of No. 100137021 without a line repair &gt; + Revision date: February 10, 2012, the appearance of the base or green; a ^ substantially represents the hydrogen atom, the base; R6 represents the hydrogen atom group or the Wei oxygen; ^ knife independently represents the alkyl group, decane oxygen The base or the alkene X1 represents a divalent linking group; η1 represents an integer of 〇~20; in the formula (5), R1, R2 and R3 are synonymous with ri, r2 and R3 in the formula (4); X2 represents a divalent linkage And a base group, R9 represents an alkyl group substituted by a fluorine atom. [1] The pattern forming method according to the above [9], wherein the repeating unit of the above formula (4) or formula (5) is a compound of the following formula (6) or formula (7) Representation of the repeated Tsui Yuan: R1. R11 〇~1 -yi1 a mouth *13 R10 士〇^CV2-Y«_r14 (7) (6) 201222149 39745pifl No. 100137021 Chinese manual without line correction This revision date: 2012 In the general formula (6), R1Q represents a wind atom or a stilbant, and R11, R12 and R13 each independently represent an alkyl group, a decyloxy group or a dilute group; and A11 represents an oxygen atom, a sulfur atom or -N ( R15)-; R15 represents a hydrogen atom or a burnt group; Y11 represents an alkylene group, an alkoxy group or a combination thereof; in the formula (7), A12 represents an oxygen atom, a sulfur atom or -N(R15)-; Y12 Representing an extended group, an extended alkyl group or a combination thereof; R14 represents an alkyl group substituted with a fluorine atom; and R10 and R15 are synonymous with R10 in the formula (6). [11] The pattern forming method according to the above [3], wherein the compound (C) is a compound having a structural unit represented by the following formula (A): (A) In the formula (A), Ru represents a single bond or a divalent linking group, or a monovalent substituent; in the case where RU is a single bond or a divalent linking group, the single bond or divalent linking group and the compound ( c) other (four) sub-links; / Χιι denotes a single bond or a divalent link; Rp denotes a monovalent group containing a polymerizable group. The above formula is the above and is in the resin 201222149 39745pifl is the Chinese specification of the No. 100137021. There is no line correction. This revision date: February 1st, February 1st, the main chain contains germanium atoms. [13] The pattern forming method according to the above [Η] or [12], wherein in the above formula (A), xu represents a single bond or an oxygen atom, a stretching group, an alkenyl group, an alkynyl group, and an aromatic group. Base or a combination thereof. [14] The pattern forming method according to any one of the above [11] to [π] wherein, in the above formula (A), Rn represents a monovalent substituent. [15] The pattern forming method according to the above [M], wherein, in the above formula (A), Rn represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or an alkoxy group. [16] The pattern forming method according to any one of the above [1] to [15], further comprising (A,) a particle dispersing agent. The pattern forming method according to any one of the above [1] to [16] is used for the coating use of the microlens. [18] A pattern forming material which is a photosensitive composition, wherein the photosensitive composition contains: (A) a hollow pore-preserving particle, (8) a compound which generates an active species by irradiation with active light or radiation, and (c) The compound containing the above-mentioned living impurities is used to reduce the solubility to the organic fine developing solution. [19 kinds of photosensitive film, using the pattern material just described above to open 4 忐. [20] The pattern film is obtained by the pattern forming method according to any one of the above (1) to [17]. [21] A low refractive index film which is the pattern film as described in [20] above. [22] A photonic device' includes the above-mentioned [low refractive index 201222149 39745pifl] date: February 1st, February 1st, is the Chinese manual of No. 100137021, without the slash correction [23] device. A solid-state imaging element comprising the optical body according to the above [22]. The present invention is also preferably the following configuration. [24] The pattern forming method according to any one of (1) to [17] wherein the compound (B) is a photopolymerization initiator. [25] The pattern forming method according to any one of [1] to [17], wherein the hollow or porous particle (A) is a hollow particle. [26] The pattern forming method according to any one of [1] to [17], wherein the hollow or porous particle (A) is a cerium oxide particle. [Effect of the Invention] According to the present invention, a pattern forming method, a pattern forming material, a photosensitive film using the same, a pattern film, a low refractive index film, and an optical film which can form a pattern having a low refractive index and a small amount of development residue can be provided with high resolution. Devices, and solid state imaging elements. [Embodiment] Hereinafter, the present invention will be described in detail. Further, in the expression of the group (atomic group) in the present specification, the unsubstituted and unsubstituted expression is not included, and includes not only a group having no substituent but also a group having a substituent. For example, "the so-called "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also a group having a substituent (substituted alkyl group). In addition, the term "active light" or "radiation" in the present specification means, for example, a bright line spectrum of a mercury lamp, a far ultraviolet light represented by an excimer laser, an extreme ultraviolet light (EUV), an X-ray, and 11 201222149 39745pifl Amendment date for the first pass: February 2012, the next day: the light in the invention refers to the active light or the radiation is a mercury lamp, i does not matter "exposure", as long as there is no special description, then not only the ancient 77 The far-ultraviolet rays, x-rays, and euvs represented by lasers are exposed in the exposure, and the traces of particle beams such as electron beams and ion beams are also included in the method including: Xiang-level composition to form the sensitization step, the thief a step of domain exposure, and a step of developing using a solution containing a solution, and the photosensitive composition = A hollow or porous particle, (B) a compound which produces an active species by irradiation with active light or a pay line, And (C) a compound which reduces the properties of the developer towel containing the organic solvent by the action of the above-mentioned =! The reason why the effect of the present invention is obtained by using the pattern forming method of the present invention is not clear, and it is generally considered that 'the refractive index of the obtained pattern can be sufficiently reduced by using the towel or the microporous particle (A), and the compound is (b) /, the combination of the chemical (C), is very helpful to obtain the pattern with high resolution. Further, although the effect is unknown, it is presumed that the use of the hollow or porous particle (A) in combination with the compound (c) contributes to the suppression of development residue for some reasons. The photosensitive composition used in the pattern forming method of the present invention is usually a negative type composition (a composition forming a negative pattern). Further, the present invention relates to a pattern forming material which is a photosensitive composition, and the photosensitive composition contains: (A) hollow or porous plasmid 201222149 39745pifl Revision date: February 10, 2012 is No. 100137021 A compound having no scribing correction, (B) a compound which generates an active species by irradiation with active rays or radiation, and (C) a compound which reduces the solubility in a developing solution containing an organic solvent by the action of the above-mentioned active species. Further, the present invention relates to a photosensitive film formed using the above-described pattern forming material. Hereinafter, each component of the photosensitive composition will be described in detail. [1] (A) Hollow or porous particles ❹ 中空 Hollow particles are particles having a structure inside a cavity, and are particles having a cavity surrounded by an outer shape, and a porous particle refers to a porous particle having a plurality of voids. . The hollow cell particles are preferably porous particles in terms of obtaining a better view of dry characterization. The porosity of such particles is preferably from 1% by volume to 8% by volume, particularly preferably from 20% by volume to 60% by volume, most preferably from 3% by volume to 20,000% by volume. From the viewpoint of lowering the refractive index and maintaining the longness of the particles (four). ° The porosity of the hollow pupil (four) is set to the above range. From the viewpoint of the tendency of the valley to lower the refractive index, hollow or porous is preferably a hollow particle. For example, 'the anaerobic cleavage is used to form the empty particles of the towel. The oxygen oxime particles have a low refractive index air (the "phase ratio" and the usual dioxotomy (refractive bismuth) are described in曰本专利特开_ _W 立立曰's 13 201222149 39745pifl is the first 00〗 3702 〗 No. Chinese manual no slash correction This revision date: February 1, 2012, 2003-335515, Japanese Patent Special Edition, 3_226516 Further, in Japanese Laid-Open Patent Publication No. 2003-238140, etc., the average particle diameter of the hollow or porous particles is preferably from i to 200 nm, more preferably from i 〇 nm to 1 〇〇 nm. The average particle size of the particles can be observed by a penetrating electron microscope to obtain the equivalent circle diameter based on the projected area of the resulting illuminator (eq lei/cf = dmmeteO as the average particle) The diameter (usually measured in order to obtain particles having an average particle diameter of 300 or more). The refractive index of the hollow or porous particles is preferably 1.10 to 1.40, and more preferably U5 to 1.35 'best is 15 to 丨3折. The folding material is the whole material of the filament, in the grain The refractive index of the outer shell of only the hollow particles is shown in the middle of the particle, and the refractive index of the porous particle can be determined. For example, hollow or porous inorganic particles. I machine 2; for magnesium or di(4) Μ 4 • The particles of the granules can be exemplified by the particles of dee Et-E, which are low in refractive index, dispersion stability, and cost. From the viewpoint of view, it is more preferable that the particles of the inorganic particles are purely 丨 丨 丨 丨 1 1 1 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文 文Any one of them can also be a knife-shaped particle. If the particle size is satisfied, it can also be agglomerated particles. 4 14 201222149 39745pifl Correction period: February 1, 2012, the number 100137021 Chinese manual has no plan The line correction may be a ball shape, a bead shape, a ratio of a long diameter to a short diameter of 1 or more, or an indefinite shape. The specific surface area of the inorganic particles is preferably 1 〇 m 2 /g 2 . 〇m2/g, especially preferably 20 m2/g~UOO m2/g, optimally 50 m2/g~1500 m 2/g. 无机 In order to achieve dispersion stabilization in the dispersion or coating solution, or to improve the affinity and bonding with the binder component, the inorganic particles may be subjected to plasma discharge treatment or corona discharge treatment or the like. Physical surface treatment, chemical surface treatment using a surfactant, a coupling agent, etc. It is particularly preferred to use a coupling agent. The coupling agent is preferably an alkoxy metal compound (for example, a titanium coupling agent or a decane coupling agent). Among them, the decane coupling treatment is particularly suitable, in which the domain particles are dioxins, and the coupling agent is a reaction of the Weihua borrowing compound, the organic sulphur base, the diorganowei group, the three have _ ) knot surface. The surface-treated cerium oxide granules ^18 can also be used as a treatment before use. The burden of the inorganic particles is preferably a oxidized surface at the surface. It is preferably used. For example, it can be used: 曰 曰 媒 ( ( ( ( ( ( ( ( 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 137 137 Date: February 1st, 2012 (isopropyl alcohol 'IPA dispersion, 4-methyl-2-pentanone (MIBK) dispersion, etc.), OSCAL series; Chemicals (stock) manufactured by Snowtex series (IPA dispersion, ethylene glycol dispersion, methyl ethyl ketone (MEK) dispersion, dimercaptoacetic acid amine dispersion, MIBK dispersion, propylene glycol monomethyl ether acetate dispersion, propylene glycol Monomethyl ether dispersion, sterol dispersion, ethyl acetate dispersion, acetic acid butyl vinegar dispersion, diphenyl benzene-n-butanol dispersion, benzene benzene dispersion, etc.; SiliNax manufactured by Nippon Mining Co., Ltd.; Fuso Chemical Industry Co., Ltd. ) PL series (IpA dispersion, benzene dispersion, propylene glycol monoterpene ether dispersion, mercaptoethyl ketone dispersion, etc.); Aerosil series manufactured by EVONIK (propylene glycol acetate dispersion, ethylene glycol dispersion, MIBK dispersion, etc.) EVON The cerium oxide particles such as the AERODISP series manufactured by IK Corporation are added to the photosensitive composition as a dispersion containing the cerium oxide particles and the particle dispersing agent (details of the particle dispersing agent). In the case of the cerium oxide particles, the content of the cerium oxide particles in the cerium oxide dispersion is preferably from 10% by mass to 5% by mass, more preferably from 15% by mass to 40% by mass, even more preferably 15% by mass. 3% by mass. The hollow or porous particles may be used singly or in combination of two or more. For example, it may be used in combination with a porous particle. a# Relative to the total amount of the photosensitive composition The content of the hollow or a plurality of solid components is preferably 76% by mass to 95% by mass. When the photosensitive composition is used to form a film, the coating amount of the hollow particles is preferably 1 mg/m2 to 1 Torr. Mg/m2, more preferably $: two 16 201222149 39745pifl Revision date: February 12, 1st, February 1st, the number 100137021 Chinese manual without line correction this jOmg/m, especially good for 1〇mg/m2~6 〇mg/m2. By the above painting ^ When the amount is 1 mg/m or more, the effect of lowering the refractive index or the effect of improving the scratch resistance/healing can be surely obtained, and by the above-mentioned coating amount being 1 〇〇 咖 2 or less, a fine unevenness can be formed on the surface of the film. Further, the integral reflectance is suppressed from being deteriorated. [2] The (A') particle dispersant preferably contains (A,) a particle dispersant from the viewpoint of the dispersibility of the hollow or porous particles. ❸ Particle granules can be exemplified by polyamidoamine and eight π·1 acid and its salts, high molecular weight unsaturated acid ester, modified polyglycolic acid, modified poly vinegar, modified poly (曱a dispersion resin such as acrylic acid vinegar, (meth)acrylic acid copolymer, naphthalenesulf〇nic acui-fomia Uiehydecondensate or polyoxyethylene alkyl phosphate or polyoxyethylene alkyl A compound such as an amine or an alkanolamine is preferably a resin (hereinafter also referred to as "dispersion resin"). According to the structure, the knife-dispersed resin can be further classified into a linear high-grade scorpion, a terminal-modified polymer, a graft-type polymer, and a block-type polymer. The dispersion resin acts on the surface of the particles to prevent re-coagulation. Therefore, a terminal modified polymer having an anchor position on the surface of the pigment, a graft polymer, and a block type high molecule are preferable. The mass average molecular weight of the dispersion resin (the polystyrene conversion value measured by the Gd Permeation Chromatograph 'GPC method) is preferably from 1 00 to 2 χ 105, particularly preferably from 2000 to 1 x 10 〇 5, particularly preferably 5000~5xl〇4. 17 201222149 39745pifl For the Chinese manual No. 100137021, there is no slash correction. This revision date: February 10, 2012, the dispersion resin can also be obtained as a commercial product. For the specific example, "Disperbyk-101" manufactured by BYK Chemie Co., Ltd. Polyamide amine sulphate), Disperbyk-107 (carboxylate), Disperbyk-110 (copolymer containing acid group), Disperbyk-111, Disperbyk-130 (polyamide), Disperbyk-161, Disperbyk- 162, Disperbyk-163, Disperbyk-164, Disperbyk-165, Disperbyk-166, Disperbyk-170 (polymer copolymer); "BYK-P104, BYK-P105 (high molecular weight unsaturated polycarboxylic acid)", EFKA Manufactured "EFKA4047, EFKA4050~EFKA4010~EFKA4165 (polyurethane), EFKA4330~EFKA4340 (block copolymer), EFKA4400~EFKA4402 (modified polyacrylate), EFKA5010 (polyester decylamine), EFKA5765 (high molecular weight polycarboxylate), EFKA6220 (fatty acid polyester), EFKA6745 (phthalocyanine derivative), EFKA6750 (azo pigment derivative)"; Ajinomoto Fine-Techno "AjisperPB82 AjisperPB822" manufactured by Kyoei Chemical Co., Ltd., "Flowlen TG-710 (urethane oligomer)", "Polyflow N〇.50E, Polyflow No. 300 (acrylic copolymer)" ; "Disparlon KS-860, Disparlon 873SN, Disparlon 874, Disparlon #2150 (aliphatic poly-rebel), Disparlon # 7004 (polyether vinegar), Disparlon DA-703-50, Disparlon DA- manufactured by Nanben Chemical Co., Ltd. 705, Disparlon DA-725"; DemolRN, DemolN (formalin condensation condensate of naphthalenesulfonate), Demol MS, Demol C, Demol SN-B (aromatic condensate of aromatic rhein) "Homogenol L-18 (Polymer Polycarboxylate)", "Emulgen 920, 18 201222149 39745pifl is the Chinese manual of No. 100137021. No slash correction. Amendment date: February 10, 2012 Emulgen 930, Emulgen 935, Emulgen 985 (Polyoxyethylene nonylphenyl ether), "Acetamin 86 (stearylamine acetate)"; "Solsperse 5000 (enantiomer derivative), Solsperse 22000 (azo pigment derivative), Solsperse 13240 manufactured by Lubrizol ( Polyesteramine), Solsperse 3000, Solsperse 17000, Solsperse 27000 (polymer with functional part at the end), Solsperse 24000, Solsperse 28000, Solsperse 32000, Solsperse 38500 (grafted polymer); "Nikko1 T1〇6 (polyoxyethylene sorbitan monooleate), Nikkol MYS-IEX (polyoxyethylene monostearate)"; EFKA-46, EFKA-47, manufactured by Morishita Industrial Co., Ltd. EFKA-47EA, EFKA Polymer 100, EFKA Polymer 400, EFKA Polymer 401, EFKA Polymer 450"; dispersion resins such as "Disperse Aid 6, Disperse Aid 8, Disperse Aid 15, Disperse Aid 9100" manufactured by Sannopco. The compound (C) which utilizes the action of the active species to reduce the solubility in the developer containing the organic solvent may have any one of the general formula (21) to the general formula (23) selected from the following. At least one of the structures ^ units represented by the person. Further, the dispersion resin may be a resin obtained by using a compound represented by the above formula (E-1) in the compound (C) as a copolymer. Further, as the particle dispersing agent, a nonionic, anionic or cationic surfactant can be used. These surfactants are also commercially available, and examples thereof include a phthalocyanine derivative (commercial product EFKA_745 (manufactured by EFKA)), disperse 5000 (manufactured by Lubriz(R) Co., Ltd.), and an organic siloxane polymer. KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth)acrylic acid system 19 201222149 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. This revision date: February 10, 2012 (total) Polymer Polyflow No. 75, Polyflow No.90, Polyflow No.95 (above manufactured by Kyoeisha Chemical Co., Ltd.), W001 (manufactured by Yushang Co., Ltd.) and other cationic surfactants; polyoxyethylene lauryl ether, polyoxyethylene hard Aliphatic ether, polyoxyethylene ether ether, polyoxyethylene octyl phenyl ether, polyoxyethylene decyl phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester Nonionic surfactants; anionic surfactants such as W004, W005, W017 (made by Yushang); Solsperse 3000, Solsperse 5000, Solsperse 9000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 170 00, Solsperse 24000, Solsperse 26000, Solsperse 28000 and other Solsperse dispersants (made by Lubrizol, Japan); Adeka Pluronic L31, Adeka Pluronic F38, Adeka Pluronic L42, Adeka Pluronic L44, Adeka Pluronic L61, Adeka Pluronic L64, Adeka Pluronic F68 ' Adeka Pluronic L72 ' Adeka Pluronic P95, Adeka Pluronic F77, Adeka Pluronic P84, Adeka Pluronic F87 ' Adeka Pluronic P94 ' Adeka Pluronic LI01 ' Adeka Pluronic P103 ' Adeka Pluronic F108 ' Adeka Pluronic L121, Adeka Pluronic P-123 (above (shares) manufactured by ADEKA), and IsonetS-20 (manufactured by Sanyo Chemicals Co., Ltd.). Further, an amphoteric dispersant such as HinoactT-8000E manufactured by Chuanyan Fine Chemical Co., Ltd. may be mentioned. In addition, ELEBASE BA-100, ELEBASE BA-200, ELEBASE BCP-2, ELEBASE BUB-3, ELEBASE BUB-4 'ELEBASE CP-800K, ELEBASE EDP-475, ELEBASE HEB-5, Finesurf 270, Finesurf 7045 Finesurf 20 201222149 39745pifl is the Chinese manual of the No. 100137021. There is no slash correction. This revision date: February 10, 10, 2007, Blaunon DSP-12.5, Blaunon DT-03, Blaunon L-205, Blaunon LPE-1007, Blaunon 0- 205, Blaunon S-202, Blaunon S-204, Blaunon S-207, Blaunon S-205T (Aoki Oil Industry), EMULGEN A-500, EMULGEN PP-290, Amiet 102, Amiet 105, Amiet 302, Amiet 320, Aminon PK-02S, Emanon CH-25'Emulgen 104P'Emulgen 108'Emulgen 404'Emulgen 408, Emulgen A-60, Emulgen A-90, Emulgen B-66, Emulgen LS-106, Emulgen LS-114, Rheodol 430V, Rheodol 440V, Rheodol 460V, Rheodol TW-S106, Rheodol TW-S120V, Rheodol Super TW-L120 (Kao), Newkalgen 3000S, Newkalgen FS-3PG, Newkalgen FE-7PG, Pionin D-6414 (Bamboo Oil), DYNOL604, Olfine PD -002W, Surfynol 2502, Surfynol 440, S Urfynol 465, Surfynol 485, Surfynol 61 (Japan Chemical Industry), etc. In addition, there are: Phosphanol ML-200, Emal 20T, E-27, Neopelex GS, Pelex NBL, Pelex SS-H, Pelex SS-L, Poiz 532A, Latemul ASK, Latemul E-118B, Latemul E-150 (King (share)), EMULSOGEN COL-020 'EMULSOGEN COL-070, EMULSOGEN COL-080 (Clariant), Plysurf A208B, Plysurf A210B, Plysurf A210G, Plysurf A219B, Plysurf AL, Lavelin FC-45 (First Industrial Pharmaceutical), Pionin A-24-EA, Pionin A-28-B, Pionin A-29-M, Pionin A-44-B, Pionin A-44TW (bamboo fat), ΑΚΥΡΟ RLM100NV, ΑΚΥΡΟ RLM45, ΑΚΥΡΟ RLM45NV, ΑΚΥΡΟ ECT-3, ΑΚΥΡΟ 21 201222149 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. This revision date: February 2012, ECT-3NEX, ECT ECT-7, Hosten HLP, Hosten HUM, HostenHLP-TEA (Japan Interface Active Agent Industry) . These particle dispersants may be used singly or in combination of two or more. The content of the particle dispersant in the photosensitive composition is preferably from 1% by mass to 1% by mass, more preferably from 5 mass% to 8% to 80% by mass, even more preferably 1%, based on the hollow or porous particles. Mass % ~ 6 〇 mass%. Specifically, in the case where the particle dispersant is a dispersion resin, the use 1 is preferably 5% by mass to 1% by mass relative to the hollow or porous particles, and more preferably 10% by mass to 8 Å by mass. Hey. [3] (B) Compound which produces an active species by irradiation with active light or radiation J. A photosensitive composition containing active light or radiation contains a compound which irradiates to produce an active species. 5 "Do not (B) impart sensitivity to the photosensitive light of the present invention, and the compound is used for calendering: a color resist, an optical coating material, etc. From the photopolymerization (4), the above-mentioned active species or anion (more preferably, the free starter is described in detail. The starter is not selected as a special agent, for example, the photopolymerization of the first polymerization start of the Zhishi 4 J mesh A The region-to-visible light produces some activity and generates activity j', which may be the active agent for the photo-excited sensitizer, or may be based on the monomer 22 201222149 39745pifl No. 1〇〇137〇21 The Chinese manual does not have a slash correction. This correction period: an initiator for starting cationic polymerization starting from February 1, 2011. Further, the photopolymerization initiator preferably contains at least one component, and the above components are a molecular absorption coefficient of at least about 50 in the range of about 200 nm to 800 nm (more preferably 300 nm to 450 nm). The photopolymerization initiator may be a photoradical polymerization initiator and a photocationic polymerization initiator. Photoactive free radical (Poly radical polymerization initiator) 0 In the photoradical polymerization initiator, for example, a halogenated hydrocarbon derivative (for example, a compound having a triazine skeleton, a compound having an oxadiazole skeleton, etc.) , hexaaryl biimidazole compounds, lophine dimers, benzoins, ketals, 2,3-dialkyldiones (2, 3-dialkyldione) compounds, organic peroxides, sulfides, disulfide compounds, azo compounds, rotten acid salts, inorganic complexes, c〇umarins, ketone compounds (benzophenone, thioxanthone, thi〇chromanone, anthraquinone), aromatic rust salt (ar〇matic 〇nium salt) ), fluoroamine compounds, ketoxime ether, acetophenone (amino phenylethyl compound, basic ethyl ketone compound), aCyl phosphine oxide, etc. Thiophosphine compound, oxime For example, the compound of the above-mentioned compound having a triterpene skeleton may be, for example, a compound described in Bull. Chem. Soc. Japan, 42, 2924 (1969), and a description of the British Patent No. 1,388,492. Compound, 曰本23 201222149 39745pifl For the H) 0 丨 中文 Chinese saying that the duck has no slash correction This revision date: February 12, 1 February, Japanese Patent Laid-open No. 53-133428, the compound, Germany The compound described in the specification of the patent No. 3337024, the compound described in F. c Schaefer et al., Org. Chem.; 29, 1527 (1964), the compound described in JP-A-62-58241, Japanese Patent Laid-Open No. 5 The compound described in Japanese Laid-Open Patent Publication No. Hei-5-34920, and the compound described in the specification of U.S. Patent No. 4,212,976. The compound described in the specification of the above-mentioned U.S. Patent No. 4,212,976 is exemplified by a compound having an oxadiazole skeleton (for example, 2-trichloromethyl-5-phenyl-1,3,4-oxadiazole, 2_trigas). Methyl_5_(4_gasphenyl H,3,4-oxo, 2-dichloromethyl_5_(ι_naphthyl)+3,4-oxadiazole, 2_trichloromethyl_ 5_(2_naphthyl)-1,3,4-oxadiazole, 2_tribromomethyl-5-phenyl-1,3,4-oxadiazole, 2-dibromomethyl-5-(2 -naphthyl)-l,3,4-oxadiazole; 2-trimethylsulfonyl_5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-M4-chlorostyrene -1,3,4-oxadipine, 2-dichloroindenyl-5-(4-methoxystyryl)-^oxadiazole, 2_trichloro:yl-5-(1 -naphthyl)-1,3,4-oxadiazole, 2-trichloromethyl_5_(4-n-butoxyphenyl)-1,3,4-oxadiazole, 2-tribromofluorene Base _5_styryl 4,3,4-oxadiazole, etc.) and the like. Examples of benzoin include: benzoin, benzoin methyl ether, rest; = yoke, dimethoate, benzyl dimethyl ketal, benzoin benzoate, benzoin toluene, benzoin Hyperthyroidism, benzoin B and benzoin isopropyl. For example, Japanese Patent No. 2764769, Japanese Patent Laid-Open No. 2002-116539, and Kunz, Martm et al. 24 201222149 39745pifl revised period: February 1st, 2012 is the first painting 37G21 lion "RadTech'98. Proceeding April", page 19 of the revised version of the essay, page 19 (page 1998) Organic borate compound described in the year of Chicago, et al. For example, the compounds described in paragraphs [〇〇22] to [0027] of the above-mentioned Japanese Patent Laid-Open Publication No. JP-A No. 2-116539 can be cited.彳 彳 其他 其他 6 6 6 6 6 6 6 6 6 6 6 6 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 7-1 Specific examples of the organoboron transition metal complexing complexes and the like are disclosed in the Japanese Patent Laid-Open Publication No. Hei 7-292〇14, and the like. Specific examples include ion-based complexes with cationic dyes. Further, examples of the radical polymerization initiator other than the above include an acride derivative (for example, '9-phenylacridine, bis(9,9'-anthracene)heptane, etc.), N_ Phenylglycine (jN-phenylglydne), etc., polyhalogen compounds (for example, carbon tetrabromide, phenyldibromomethyl sulfone, phenyltrichloromethane, etc.), coumarins (for example, 3_(2_benzo) 3-(2-benzofuroyl)-7-diethylaminocoumarin, 3-(2-benzofuranyl)-7-(1-pyrrolidine) Coumarin, 3_benzhydryl-7-diethylamine sulphate, 3-(2-methoxybenzimidyldiethylamine coumarin, 3_(4-dimethylamino) Benzyl hydrazino)-7-diethylamino coumarin, 3,3,-carbonyl bis(5,7-n-propoxy coumarin), 3,3L carbonyl bis(7-diethylamine coumarin素), 3_ benzoinyl _7_methoxy coumarin, 3♦ 咬 醯 ) ) ) _ _ 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 7 _Diethylamine coumarin, 7-methoxy-3-(3-pyridylcarbonyl)coumarin, 3-benzylidene- 5,7-dipropoxycoumarin, 7-stupid Diazol-2- Coumarin, in addition, 曰本专利特开平25 201222149 39745pifl is No. 100137021 Chinese manual without scribe correction# Revision date: February 1st, 2012, No. 5-19475, Japanese Patent Special Open 7_271() No. 28 Coumarin described in Japanese Laid-Open Patent Publication No. 2002-363206, Japanese Patent Laid-Open Publication No. Hei. Compounds, etc., phosphatide phosphines (for example, bis(2,4,6-trimethylphenyl fluorene) phenyl oxide scales, bis(2,6-dimethoxybenzoquinone)_2 , 4,4_tridecyl-pentylphenylphosphine oxide, Lucirin TPO, etc.), metallocene (m-time) (for example, bis(η5-2,4-cyclopentadien-1-yl) _bis(2,6·difluoro_3_(1hpyrrolyl)-phenyl)titanium, η5-cyclopentadienyl cumyl-iron (1+)-hexafluorophosphate (1-), etc.) The compound described in Japanese Patent Publication No. Sho 57-133428, Japanese Patent Publication No. Sho 57-1819, Japanese Patent Publication No. SHO 57-96-96, and the specification of U.S. Patent No. 3,615,455. Examples of the ketone compound include diphenyl fluorenone, 2-mercaptobenzophenone, 3-mercaptobenzophenone, 4-mercaptobenzophenone, 4-methoxydibenzoquinone, and 2 - gas diphenyl _, 4- benzophenone, 4-dibenzophenone, 2-carboxy benzophenone, 2-ethoxycarbonyl dibenzophenone, benzophenone tetradecanoic acid or Tetrabenzophenone tetradecanoate tetrakisperate, 4,4,-bis(dialkylamino)benzophenone (for example, 4,4'-bis(diguanyl)dibenzophenone, 4 , 4'·bis(dicyclohexylamino) dioxin, 4,4′-bis(diethylamino)benzophenone, 4,4,-bis(dihydroxyethylamino)diphenylhydrazine Ketone, 4-decyloxy-4'-diguanidinium benzophenone, 4,4,-dimethoxy benzophenone, 4, dimethylaminodibenzophenone, 4-diamine Acetophenone, benzil, hydrazine, 2-tert-butyl fluorene, 2-methyl hydrazine, phenanthraquinone, xanthone, thioxanthone, 2 -Chlorine-finch β-brewed J, 2,4-diethyl hydrazine, j, ketone (fiu〇ren〇ne), 2- 26 201222149 39745pifl is the first 37 〇 21 Chinese manual without line correction The date of this revision: Guannian 2 On the 10th of the month, benzyl-dimethylamino-1-(4-morphinylphenyl)-1-butanone, 2-methylmethylthio)phenyl]-2-morphinyl_1_propan 2_ 经基基_2_曱基-[4_(ι_曱基乙基基基基基)propanol aroma, benzoin, benzoin (for example, benzoin jiayue, feminine scent, benzoin Propionium, benzoin isopropylidene, benzoin phenyl ether, benzyldimethylketal), acridone, chloroacridone, N-mercaptopurine. Anthrone, N-butyl octazone, N-butyl chlor ketone, and the like. 〇 The radical polymerization initiator is preferably a compound selected from the group consisting of an amine-based acetophenone compound, a phenylethyl benzene compound, a mercaptophosphine compound, and a fat compound. More specifically, for example, an aminophenyl benzene-based initiator described in JP-A-10-291969, a sulfhydryl oxidized squama initiator as described in Japanese Patent No. 4,258,899, and two As the initiator, the compound described in Japanese Patent Laid-Open No. 2001-233842 can also be used as the oxime-based initiator. As the aminoacetophenone-based initiator, IRGACURE-907, IRGACURE-369, and irGACURE_379 (trade name 'both manufactured by BASF Japan Co., Ltd.) are commercially available. Further, as the sulfhydryl scale-based initiator, IRGACUR £_8i9 or DAR〇CUR_TP(R) (trade name, all manufactured by BASF Japan) can be used as a commercial product. The acetophenone compound is preferably a compound represented by the following formula (v) 27 (V) 201222149 39745pifl Revision date: February 1, 2012, No. 100137021 Chinese manual No line correction In this formula (V), Rv1 represents a hydrogen atom, an alkyl group (preferably a carbon number 10 alkane) Alkoxy group (preferably a carbon number alkoxy group) or a monovalent organic group. In the case where Rv1 is a divalent organic group, it means that the two photoactive hydroxyacetophenone structures (that is, the structure in which the substituent Rv1 is removed from the compound represented by the general formula (V)) are dimerized via Rv1. Things. Rv2 and Rv3 each independently represent a hydrogen atom or an alkyl group (preferably an alkyl group having 1 to 10 carbon atoms). Further, Rv2 and Rv3 may be combined to form a ring = a ring having a carbon number of 4 to 8). The above-mentioned acetophenone ketone compound which has a substituted alkyl group as an alkyl group and an alkoxy group of Rv1, a combination of R2 and an alkyl group, and a combination of Rv2 and Rv3 may, for example, be a 2-perylene group. -2-曱=propan-1-one (DAROCURE 1173), 2-hydroxy-2-indolyl-1, 4 oxa-1-one, 1-(4-mercaptophenyl)-2-yl- 2-mercaptopropene-small _, i-butyl "(4-isopropylphenyl)-2-methylpropan-1-one, 1-(4-butylphenyl)-2-yl, 2, Propane-1-one, 2-hydroxy-2-methyl-1-(4-octylphenyl)propane·ι_word, ^methyldodecylphenyl)-2-mercaptopropane-1· Ketone, 1_(4_decyloxyphenyl), 2propanol-l-_, 1-(4-indolethiophenyl)-2-mercaptopropen-1-ol], base)-2- Benzyl-2-methylpropanone, 1-(4-bromophenyl)-2-yl, 2-propanol-1-one, 2-hydroxy-1-(4-hydroxyphenyl)- 2-methylpropane, j-methyldiaminophenyl)-2-hydroxy-2-mercaptopropan-1-one, 1-(4-methyl)-2-yl-2-ylidene Isopropan-1-one, 1-hydroxycyclohexyl bromide ^ (IRGACURE 184), 1-[4-(2-P-ethoxyethyl)-phenyl]indolyl-1-propan-1-one (IRGACURE 2959) Etc. Earth '2-other' Commercially available α-hydroxyacetophenone compounds can also be used from 28 201222149 39745pifl No. 100137021 Chinese manual without a slash correction. Amendment date: February 10, 2012 BASF Japan company obtained the following product name from the polymerization Starting agents: IRGACURE 184, DAROCURE 1173, IRGACURE 127, IRGACURE 2959, IRGACURE 1800, IRGACURE 1870, and DAROCURE 4265. Acid phosphine-based initiators can be used as IRGACURE-819 ' IRGACURE-819DW ' DAROCUR-TPO (commercially available) The phosphine-based initiator described in JP-A-2009-134098, which is suitable for use as a photopolymerization initiator, in the present invention. Examples of the ruthenium compound include 3-benzoquinoneoxyiminobutane-2·one, 3-acetic acidoxyimidobutane-2-yl, and 3-propenyloxyimidobutane-2. _ ketone, 2-ethyl fluorenyl imido pentyl _3-_, 2-acetoxy oxyimido group - _ _ propyl propyl -1-S with, 2- 曱 氧基 oxyimine -1-phenylpropanoid_1·酉, 3_(4-tosulphonyloxy)iminobutan-2-one, and 2-ethoxycarbonyl Imino-1-phenyl propan-burning -1_ ketone. Compounds can be cited as: JCS Perkin II (1979) PP.1653_1660, JC S, Perkin II (1979) ρρ.ΐ56·162, Journal of Photop〇lymer Science and Technology (1995) Pp. 202-232, the compound described in Japanese Laid-Open Patent Publication No. 2000-66385, Japanese Patent Laid-Open Publication No. 2000-80068, Japanese Patent Laid-Open Publication No. Hei No. Hei. No. Hei. No. Hei. Compounds and the like described in each of the publications of the Japanese Patent Publication No. In the market, IRGACURE-OXE01 (BASF 曰 公司 29 29 201222149 39745pifl is No. 100137021 Chinese manual no slash correction date: February 10, 2012), IRGACURE-OXE02 (BASF 曰 manufactured by the company), CGI-124 (manufactured by BASF, Inc.) and CGI-242 (manufactured by BASF, Inc.) are also suitable for use. Further, the cyclic anthraquinone compound described in Japanese Laid-Open Patent Publication No. Hei. No. 2007-322744, and the Japanese Patent Publication No. 2007-322744 can also be suitably used. The oxime compound having a specific substituent as shown in the Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. Specifically, the ruthenium compound is preferably a compound represented by the following formula (1). In addition, the n_q bond which can be used as the (E) body gambling compound can also be the compound of the (Z) body, or the mixed NBAA.SAr (1) of the (8) body and the (7) body (in the formula (I), The divalent organic group, R and B each independently represent a monovalent substituent, Ar represents an aryl group.) A The non-metal atomic group of the valence substituent represented by R above is preferably a valence non-metal valence: Base, aryl, ruthenium, fluorenyl sulfhydryl, oxathiol, alkylthiocarbonyl, arylthio 30 201222149 39745pifl Corrected period: February 1, 2012, the first Chinese manual No. 100137021 The present carbonyl group and the like. Additionally, the groups may have more than one substituent. Further, the above substituent may be further substituted with other substituents. The substituent may be a functional atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, a decyloxy group, a fluorenyl group, an alkyl group, an aryl group or the like. The alkyl group which may have a substituent is preferably an alkyl group having 1 to 30 carbon atoms, and specific examples thereof include a mercapto group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, and a decyl group. Octadecyl, isopropyl, isobutyl, t-butyl, decyl butyl, fluorenyl-ethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, benzene Phenoyl, 1-naphthoylmethyl, 2-naphthoylmethyl, 4-methyl sulfanyl phenacyl , 4-phenylsulfanyl benzhydryl, 4-diaminoaminophenyl, 4-cyanobenzomethyl, 4-methylbenzhydrylmethyl, 2-methyl Benzamidine methyl, 3-fluorobenzhydrylmethyl, 3-trifluoromethylbenzhydrylmethyl, and 3-nitrophenylhydrazino. The aryl group which may have a substituent is preferably an aryl group having 6 to 30 carbon atoms, and specific examples thereof include a phenyl group, a biphenyl group, a 1-naphthyl group (Ι-naphthyl), and 2 -naphthyl, 9-anthryl, 9-phenanthryl, 1-pyrenyl, 5-naphthacenyl, 1-anthracene Ι-indenyl, 2-azulenyl, 9-fluorenyl, terphenyl, quarterphenyl, ortho-phenyl ), m-tolyl and p-tolyl, xylyl, o-cumenyl, m-cumenyl And p-cumenyl, mesityl, and cyclopentadiene 31 201222149 39745pitl is the Chinese manual of No. 100137021 without a slash correction. Amendment date: February 10, 2012 (pentalenyl), binaphthalenyl, ternaphthalenyl, quarternaphthalenyl, heptalenyl, biphenylenyl, dicyclopentadiene Phenyl Indacenyl), fluoranthenyl, acenaphthylenyl, aceanthrylenyl, phenalenyl, sulfhydryl, anthryl, hydrazino Bianthracenyl ), teranthracenyl, quarteranthracenyl, anthraquinolyl, phenanthryl, triphenylenyl, pyrenyl, sulfhydryl Chrysenyl), naphthacenyl, pleiadenyl, picenyl, perylenyl, pentaphenyl, pentacenyi, tetraphenylene Tetraphenylenyl ), hexaphenyl, hexacenyl, rubicenyl, coronenyl, trinaphthylenyl, heptaphenyl, hexaphenyl (heptacenyl), pyranthrenyl, and ovalenyl ° The fluorenyl group which may have a substituent is preferably a fluorenyl group having 2 to 20 carbon atoms, and specifically, an acetyl group or a propyl group is exemplified. , butyl sulfhydryl, trifluoroethenyl, Mercapto, phenylhydrazine, 1-naphthylmethyl, 2-naphthyl, 4-mercaptosulfanylcarbamyl, 4-benzylthioalkylbenzoic acid, 'diamine Benzyl fluorenyl, 4-diethylaminophenyl fluorenyl, 2- phenanthrenyl, 2-nonylphenyl fluorenyl, 2-decyloxyphenyl fluorenyl, 2-butoxyphenyl hydrazine Sulfhydryl, 3-chlorobenzoic acid, 3-difluoroindole basic broth, 3-cyanobenzoquinone, 3-nitrophenyl hydrazine 32 201222149 39745pifl No. 100137021 Chinese manual no underline revision Amendment date: February 12, February 醯 醯, 4-fluorobenzhydryl, 4-cyanobenzylidene, and 4-decyloxy adenyl. The alkoxy group which may have a substituent is preferably an alkoxycarbonyl group having 2 to 20 carbon atoms, and specific examples thereof include a decyloxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, and a hexyloxycarbonyl group. An oxycarbonyl group, an octyloxycarbonyl group, a decyloxycarbonyl group, an octadecyloxycarbonyl group, and a trifluoromethoxycarbonyl group. Specific examples of the aryloxy group which may have a substituent include an anthraceneoxycarbonyl group, a 1-naphthyloxy group, a 2-naphthyloxy group, and a 4-methylthio-based basic oxyalkyl group. , 4-phenylthiononylphenoxy, 4-diguanyloxypropionyl, 4-diethylaminophenoxy, 2-phenoxyoxy, 2-methyl Phenoxymethyl, 2-decyloxyphenoxy, 2-butoxyphenoxycarbonyl, 3-chlorophenoxycarbonyl, 3-trifluoromethylphenoxycarbonyl, 3-cyano basic Oxythiol, 3- surely phenoxy, 4-cyclophenoxy, 4-cyanophenoxycarbonyl, and 4-methoxyphenoxycarbonyl. The heterocyclic group which may have a substituent is preferably an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a 0 sulfur atom or a scaly atom. Specifically, it can be exemplified: thienyl, benzo[b]thenyl (benzo[b]thienyl), naphtho[2,3-b]thienyl (naphtho[2,3-b]thienyl ), thianthrenyl, 吱"furyl", pyranyl, isobenzofuranyl, chromenyl, xanthenyl, brown 11 phenoxathiinyl, 2H-π2H-pyrrolyl, pyrrolyl, imidaz〇lyl, pyrazolyl, pyridy 1, purine Pyrazinyl, 33 201222149 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. This revision date: February 10, 2012 ° pyrimidinyl, ° pyridazinyl, σ 引 ° Qin (indolizinyl), isoindolyl, 3H- °, 3H-indolyl, °indolyl, 1Η-, α-indyllyl, purinyl , 4H-quinolizinyl, isoquinolyl, quinolyl, phthalazinyl, naphthyridyl Inyl), quinaclinyl, quinazolinyl, dnnolinyl, pteridinyl, 4aH-carbazolyl, carbazolyl , β-carbolinyl, phenanthridinyl, acridinyl, perimidinyl, phenanthrolinyl, phenazinyl, phenoxazine (phenarsazinyl), isothiazolyl, phenothiazinyl, isoxazolyl, furazanyl, phenoxazinyl, isobenzodihydrogen α bottom e (isochr〇manyl), benzodiazepine (chromanyl), η pyrrolidinyl, pyrrolinyl, imidazolidinyl, π m坐 坐 基 im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im im ), isoindolinyl, quinuclidinyl Morpholino (m〇rpholinyl), and thioxanthone-yl (thioxanthonyl). Specific examples of the alkylthiocarbonyl group which may have a substituent include sulfonylthiocarbonyl, propylthiocarbonyl, butylthiocarbonyl, hexylthiocarbonyl, and octane 34 201222149 39745pifl Revision period: February 1, 2012 The next day is the Chinese manual No. 100137021. Nothing is drawn! Dirty correction of the thiocarbonyl group, sulfonylcarbonyl group, octadecylthiocarbonyl group, and trifluorosulfonylthio group. Specific examples of the arylthio group which may have a substituent include 1-naphthylthiocarbonyl, 2-naphthylthiocarbonyl, 4-methylsulfanylphenylthiocarbonyl, 4-phenylsulfane. Phenylthiocarbonyl, 4-dimethylaminophenylthiocarbonyl, perylenediethylphenylthiocarbonyl, 2-chlorophenylthiocarbonyl, 2-methylphenylthiocarbonyl, 2:methoxybenzene Sulfur-based, 2·τ-oxyphenylthio-based, 3-chlorophenylthio-yl, 3·di-methylphenylthio, 3-cyanophenylthio, y-phenylthio 4. Fluorophenylthiol, 4-cyanothione, and 4-methoxyphenylthiocarbonyl. The above-mentioned B-line shows that 麻代丝 shows aryl, transyl, aryl, or miscellaneous. Further, the bases ® may have one or more t groups. The substituent may be substituted for the above substituents. Further, the above substituent may be further substituted with other substituents. Among them, the structure shown below is particularly preferable. The divalent organic group of the shape and the surface may be exemplified by the extension of the carbon number of 1 to 12, and the inverse of the number of the rubble stones of 6 to 12, which is 3 y ^ . ~12 stretch block base. Another &quot; two earthy groups may have more than one substituent. The wire can be exemplified above. 35 201222149 39745pifl Correction period: February 1, 2012 The Chinese manual No. 100137021 has no underline to correct the substituents. Further, the above substituent may be further taken up by other substituents to enhance the sensitivity and suppress the coloring caused by the passage of heating time. s, A is preferably an unsubstituted extended alkyl group, a burnt group. (e.g., 1 benzyl, ethyl, tert-butyl, dodecyl) substituted alkyl, alkyl (e.g., vinyl, allyl) substituted alkyl, aryl j, for example, benzene Base, p-phenylene, xylyl, cumyl, naphthyl: anthracenyl, phenanthryl, styryl) substituted alkylene. The aryl group represented by the above Ar is preferably an aryl group having 6 to 3 Å carbon atoms, and may have a substituent. The substituent may be the same as the substituent introduced into the substituted aryl group exemplified as the specific example of the aryl group which may have a substituent. Among them, a phenyl group which is preferably substituted or unsubstituted is preferred in terms of improving the sensitivity and suppressing the coloring caused by the passage of the heating time. In the formula (I), in terms of sensitivity, the structure of "SAr" formed of the above Ar and the adjacent S is preferably the structure shown below. Further, Me represents a methyl group, and Et represents an ethyl group. 36 201222149 39745pifl For the Chinese manual No. 100137021, there is no slash correction. The revised period: February 10, 2012 The monthly deficient compound is preferably a compound represented by the following formula (II). (Π) (In the formula (II), R and X each independently represent a monovalent substituent, A and Y each independently represent a divalent organic group, Ar represents an aryl group, and η is an integer of 0 to 5.) R, Α and Ar in II) are the same as the preferred examples of R, Α and Ar in the above formula (I). 37 201222149 39745pifl Revision date: February 1, 2012, No. 100137021 Chinese manual without scribe correction The monovalent substituents represented by X above may be exemplified by alkyl, aryl, oxy, aryloxy, Alkoxy group, mercapto group, alkoxycarbonyl group, amine group, heterocyclic group, halogen atom. Further, the groups may have one or more substituents, and the substituents may be exemplified by the above substituents. Further, the above substituent may be further substituted with other substituents. Among these groups, X is preferably an alkyl group in terms of solvent solubility and absorption efficiency in a long wavelength region. The number of signatures is preferably 〇~; 2 Further, η in the formula (2) represents an integer of 0 to 5. The structure shown in the above is the structure shown below. Further, in the group shown below, ^ ^ ^ ^ , . t " does not coat the binding position of Y in the formula (II) to the adjacent carbon atom. Which structure. 4 senses and (4) words' is preferably the following knot 38 201222149 39745pifl is the Chinese manual of the number 100137021 without a slash correction. Amendment date: February 10, 2012 Further, the ruthenium compound is preferably a compound represented by the following formula (III). (In the formula (III), R and X each independently represent a monovalent substituent, A represents a divalent organic group, Ar represents an aryl group, and η is an integer of 0 to 5.) R, X in the formula (III) A, Ar and η are synonymous with R, X, A, Ar and η in the above formula (II), and preferred examples are also the same. Hereinafter, specific examples (Β-1) to specific examples (Β-10) of the ruthenium compound which are suitably used are shown below, but the present invention is not limited to these specific examples. 39 201222149 39745pifl For the Chinese manual No. 100137021, there is no slash correction. This revision period: February 2012 i〇 The ruthenium compound is a compound having a maximum absorption wavelength in a wavelength range of 350 nm to 500 nm, preferably a compound having an absorption wavelength in a wavelength range of 360 nm to 480 nm, and particularly preferably a compound having a high absorbance at 365 nm and 405 nm. . From the viewpoint of sensitivity, the molar concentration of the 肟 compound at 365 nm or 4〇5 nm is preferably 3, _~·, and more preferably 5〇〇〇201222149 / for the 10G137021 No slash correction this revision date: February 10, 2012 ~ 300,000, especially good for loooo ~ 2 〇〇, 〇〇〇. The molar absorption coefficient of the compound can be determined by a known method, and specifically, for example, an ultraviolet-visible spectrophotometer (Carry-5 spectrophotometer manufactured by Varian Co., Ltd.), using an ethyl acetate solvent, and 0.01 g is preferably used. The concentration of /L was measured. (Photocationic polymerization initiator) The photocationic polymerization initiator may be, for example, a compound which generates a substance which initiates photocationic polymerization by receiving an energy ray such as an ultraviolet ray, and is preferably a cerium salt. It is an aromatic onium salt, and particularly preferably an arylsulfonium salt and an arylsulfonium salt. Specific examples of the onium salt include diphenyl ore, 4-methoxydiphenylphosphonium, bis(4-methylphenyl)fluorene, bis(4_t-butylphenyl)fluorene, and bis (ten). Dialkyl phenyl) hydrazine, triphenyl sulfonium, diphenyl _4 thiophenoxyphenyl hydrazine, bis[4_(diphenyl phenyl)-phenyl] sulfide, bis [4 ren (4_ (2_Bisylethyl) stupid base), sulfonate, η5-2,4_(cyclopentadienyl) (10) from the group of methyl ethyl bromide) iron] (1+) oxime. Specific examples of the anion include ruthenium tetrafluorophosphate (10) 4·), hexafluorowei salt (called), hexafluoroantimonate (·6·), and hexa-7 acid salt (AsF6_) 'hexachloromethane salt ( SbCV), perchlorate ion = 〇 '), trifluoromethyl acid ion (Cf3S 〇 3 ·), gas sulphide ion S 〇 3 ), phthalic acid acid ion, tribasic benzoate anion, three Nitroguanidene sulfonate anion and the like. In particular, as a specific example of the aromatic rust salt, 曰 专利 专利 50 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 -15 The aromatic halogen recorded in the book. 'aromatic halonmm salt; 曰41 201222149 jy /Hjpxii revised period: February 10, 2012 stomach stomach 1_7021 Chinese manual no line repair _ this patent special opening Zhao八五2-3_号号, 曰本专利特::二: Π:=Γ105#, etc.: VA group salt described in the 2nd 〇-15_ gong gong; Japanese Patent Special _ 56. Japanese Patent Laid-Open Publication No. 56.1494G2, Japanese Patent Laid-Open No. 57-192429, etc., etc., such as the _suifoxonium salt, and the aromatics described in the Japanese Patent Publication No. 49-17_. 〇 〇 lc 〇 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; The complex compound/photodecomposition ruthenium compound is an initiator, a dentate compound which produces hydrogen halide, an o-nitrobenzyl ester compound, and a sulfimine sulfonate. Salt compounds, bis diazo Yue alkyl sulfonic acyl compound, oxime sulfonate compound. The photocationic polymerization initiator which can be used in the present invention can be widely used, for example, as a chemically amplified photoresist or a compound used in photocationic polymerization (refer to "Organic Materials for Imaging", edited by Organic Electronic Materials Research, Bunshin). Company Publishing (1993), pp. 187 ~ 192). These compounds can be combined with THE CHEMICAL SOCIETY OF JAPAN Vol. 71 No. 11, 1998 and the Organic Electronic Materials Research Society and published by Bunshin (1993). In the same manner as the photocationic polymerization initiator described in the organic material, it can be easily synthesized by a known method. Commercially available products of photocationic polymerization initiators include UVI-6950, UVI-6970, UVI-6974, UVI-6990, and UVI-6992 (the above is not defined by Union 42 201222149 39745pifl No. 100137021) Revision date: February 10, 2012, manufactured by Carbide); Adeka Optomer SP-150, Adeka Optomer SP-151, Adeka Optomer SP-170, Adeka Optomer SP-171, Adeka Optomer SP-172 (above by ADEKA) Manufactured; Irgacure 261, IRGACURE OXEO, IRGACURE CGI-1397, IRGACURE CGI-1325, IRGACURE CGI-1380, IRGACURE CGI-1311, IRGACURE CGI-263, IRGACURE CGI-268, IRGACURE CGI-1397, IRGACURE CGI-1325, IRGACURE CGI-1380, IRGACURE CGI-1311 (above manufactured by BASF Japan); CI-2481, CI-2624, CI-2639, CI-2064 (above manufactured by Japan Soda (share)); CD-1010, CD-1011 , CD-1012 (above by Sartomer); DTS-102, DTS-103, NAT, 103, NDS-103, TPS-103, MDS-103, MPI-103, BBI-103 (above by Green Chemicals) ) Manufacturing); PCI-061T, PCI-062T, PCI-020T, PCI-022T (above) Manufactured by 曰本化药(股); PHOTOINITIATOR 2074 (manufactured by Rhodia); UR-1104, UR-1105, UR-1106, UR_1107, UR-1113, UR-1114, UR-1115, UR-1118, UR -1200, UR-1201, UR-1202, UR-1203, UR-1204, UR-1205, UR-1207, UR-1401, UR-1402, UR-1403, UR-M1010, UR-M1011, UR-M10112 , UR_SAIT01, UR-SAIT02, UR-SAIT03, UR-SAIT04, UR-SAIT05, UR-SAIT06, UR-SAIT07, UR-SAIT08, UR-SAIT09, UR-SAIT10, UR-SAIT11, UR-SAIT12, UR-SAIT13 , UR-SAIT14, UR-SAIT15, UR-SAIT16, UR-SAIT22, UR-SAIT30 (above, manufactured by URAY). Among these commercial products, 43 201222149 39745pifl is the Chinese manual of No. 100137021. There is no underline correction. This revision date: February 2, February 10, UVI-6970 &gt; UVI-6974 &gt; Adeka Optomer SP-170 &gt; Adeka Optomer SP-171, Adeka Optomer SP-172, CD-1012, and MPI-103 can exhibit high light hardening sensitivity by using the composition containing these. The above photocationic polymerization initiators may be used alone or in combination of two or more. The photoradical polymerization initiator or the photocationic polymerization initiator may be used singly or in combination of two or more. The content of the compound (B) with respect to the total solid content of the photosensitive composition is preferably 0.1% by mass to 50% by mass, more preferably 5% by mass to 2% by mass, particularly preferably 1% by mass to 5% by mass. /4] (C) A compound which utilizes the action of an active species to reduce the solubility in a developing solution containing an organic solvent, and contains a light-reducing agent (6) using an active surface to reduce the dissolution in a developing solution of an L 3 organic solvent. Sex compounds. The reduction of the filaments of the active species in the organic solvent-containing compound and the solubility in the literature will be described in detail. ^The compound which is a developing compound which contains an organic solvent and which is "excitable" is a function of a fine active species, and a polymerizable compound can be suitably mentioned. The conjugated compound may be a low molecular compound or a polymerizable one, but the fluorinated compound which contains the polymerizable group in the case where the hollow or porous f particles are easily dispersed in the film is preferable. From the viewpoint of easy adjustment of sensitivity and strength, the polymerizable port 2 is a resin containing a low molecular compound and a polymerizable group. Bai Xian, as a compounding _ low molecular compound will be described. 44 201222149 39745pifl For the Chinese manual No. 100137021, there is no slash correction. Revision date: February 10, 2012 This kind of polymerizable compound can be enumerated, for example, at least! An addition polymerizable compound of an ethylenically unsaturated double bond. Specifically, it is selected from compounds having at least one, preferably two or more terminal ethylenic unbondable bonds. Such a compound group is a compound widely known in the industrial field, and these compounds can be used without particular limitation in the present invention. The polymerizable compound is preferably a low molecular compound having a molecular weight of 2 or less, more preferably the following low molecular compound, and particularly preferably a low molecular weight having a molecular weight of 9 or less. Things. Here, the term "low molecular compound in the present invention" does not mean that a compound having an unsaturated bond (so-called polymerizable monomer) is used, and an initiator is used to cleavate an unsaturated bond to bond the bond. The polymer or the spring polymer obtained by the growth refers to a compound having a molecular weight of (8) or less (more preferably (9) or less, more preferably _ or less) (a compound having no molecular weight distribution in the permeate) ). Further, the molecular weight is usually 100 or more. Examples of the polymerizable compound include unsaturated carboxylic acids (for example, acrylonitrile, sulfhydryl succinic acid, butyric acid, methacrylic acid, maleic acid, etc.) or esters thereof, guanamines, and the like. It is preferably an unsaturated carboxylic acid and an aliphatic polyol compound, and an amide of an aliphatic polyamine compound. Further, an addition reaction of an unsaturated carboxylic acid ester or a guanamine having a nucleating substituent such as a hydroxyl group, an amine group or a fluorenyl group with a monofunctional or polyfunctional isocyanate or epoxy group, or a monofunctional or polyfunctional group A dehydration condensation reaction product of a carboxylic acid or the like is also suitably used. In addition, an addition reaction of an unsaturated carboxylic acid ester or an oxime amine having an isocyanate or an epoxy group 4 electrophilic substituent with a monofunctional or polyfunctional alcohol, an amine or a thiol, 201222149 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. The date of this amendment is: February 12, February i, and the unsaturated acid S having a detachment substituent such as dentate or tosyloxy is Substituted reactants of guanamines with monofunctional or polyfunctional alcohols, amines, and thiols are also suitable. Further, as another example, a compound group substituted with an unsaturated sulfonic acid, stupid ethylene, vinyl ether or the like may be used instead of the above unsaturated carboxylic acid. As the specific compound, a compound described in Paragraph No. 〇〇95 to Paragraph No. 08 of JP-A-2009-288705 can also be suitably used in the present invention. Examples of the mercapto acrylate include tetradecyl diol dimercapto acrylate, triethylene glycol dimercapto acrylate, neopentyl glycol dimercapto acrylate, and dimethylol propyl tridecyl. Acrylate, trishydroxycarbonyl trimethyl acrylate, ethylene glycol dimercapto acrylate, 1,3-butylene glycol dimethacrylate, hexanol monodecyl acrylate S , pentaerythritol dimethyl acrylate acid, pentaerythritol trimethacrylate, pentaerythritol tetramethyl acrylate, dipentaerythritol dimercapto acrylate, dipentaerythritol hexamethylene acrylate, sorbitol triterpene Acrylate, sorbitol tetramethacrylate, bis[p-(3-mercaptopropenyloxy-2-hydroxypropyloxy)phenyl]dithiol oxime, bis-[pair Ethylene oxyethoxy)phenyl]didecyl decane, and the ethylene oxide (EO) modified body, propylene oxide (propylene oxide) of the mercaptopropionate PO) modified body. Itaconic acid esters are: ethylene glycol dimethyl methylene succinate, propylene glycol dimethylene succinate, 1,3-butylene glycol dimercapto butyl Acid ester, 1,4-butanediol dimercaptosuccinic acid succinate, tetramethylene glycol dimethylene succinate, pentaerythritol dimercapto succinic acid vinegar, 46 201222149 39745pifl On February 1, 2012, the Chinese manual No. 100137021 has no underline to correct the sorbitol tetradecyl succinate. The crotonic acid esters include ethylene glycol dibutyl ene, tetradecyl decyl methacrylate, quaternary tetraol bis acrylate, sorbitol tetrabutyrate and the like. The methacrylates include ethylene glycol dimethacrylate, pentaerythritol dimethacrylate, sorbitol tetramethacrylate, and the like. Maleic acid s is intended to be: ethylene glycol di- succinyl diacid, triethylene glycol dimaleic acid g, pentaerythritol dimaleic acid _, sorbitol tetrahydrobutanic acid Vinegar and so on. ❹ 〇 〇 〇 〇 〇 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 51 An acetal containing an aromatic group as described in JP-A-59-S24, Japanese Patent Application Laid-Open No. Hei No. Hei. Further, the above ester monomers may also be used as a mixture. Specific examples of the monomer which is a guanamine compound and a decylamine of an unsaturated carboxylic acid are: methylene bis propylene amide, fluorenylene bis-mercapto acrylamide, 1,6 hexa Mercapto bis-acrylamide, 1,6-hexamethylene bis-methyl propyl, decylamine, diethylidene triamine methacrylamide, benzodimethyl propylene amine, benzodiazepine Bismuthyl (tetra) decylamine and the like. Other preferred examples of the ruthenium (IV) monomer include an acid amine monomer having a cyclohexylene structure as described in Japanese Patent Publication No. Sho 54-21726. Further, an amine-type formic acid-based addition polymerizable compound produced by an addition reaction of an isocyanate and a hydroxyl group is also suitable, and such a specific example is exemplified in Japanese Patent Publication No. 48_4丨7〇8. The vinyl urethane compound containing two or more polymerizable vinyl groups in the ruthenium molecule, the 47 201222149 39745pifl is the Chinese manual of the No. 100137021. No correction is made. Correction date: February 1, 2012, vinyl The amino phthalate compound is a polyisocyanate compound having two or more isocyanate groups in one molecule, and a vinyl group-containing vinyl monomer represented by the following formula (E) is added. CH2=C(R4)COOCH2CH(R5)〇H (E) (where 'R4 and R5 each independently represent Η or CH3.) In addition, '曰本专利专用开昭51_37193号, 曰本专利特公平2-32293号Japanese Patent Publication No. 2-16765, or Japanese Patent Publication No. Sho 58_49860, Japanese Patent No. Sho 56_17654, Sakamoto Patent No. 62_39417, and Sakamoto Patent Special Public Show An amino phthalic acid vinegar compound having an ethylene oxide skeleton as described in No. 62-39418 is also suitable. Further, by using Japanese Patent Laid-Open No. 63-277653, Japan No. Kawasaki No. 6-9, Japanese Patent Kaiping (four) Yingshiji _ to distribute a silk-bonding compound shaft having a silk structure or a sulfide structure, It can be photohardenable. Other examples of the towel Xia························································ The epoxy epoxide (methyl) propyl methacrylate is obtained by reacting an acid. In addition, it can also be a thief: η ^ f s s % propyl vinegar or the number, the Japanese patent special fair M 〇 337j patent special public Zhao 46-43946, the specific unsaturated compound, ^ Ge = special fair 1,336 A vinyl sulfonic acid compound or the like. Special Kaiping 2-25493 It is advisable to use the Japanese Patent Special Open to describe the situation. It is suitable for the full-fluorinated alkyl group 48 201222149 39745pifl ^ 10013702, revised date: February 2012 i〇 day structure can also use Japanese adhesive In the present invention, as a photocurable monomer, in the present invention, it is preferable to contain two or more, from the viewpoint of the hardening sensitivity, in the association publication ν〇Ι·2〇, 7, pp. 308 (the year). The ethylenically unsaturated bond, especially preferably contains more than 3 ethyl ether unsaturated bonds. Among them, it is preferable to contain two or more (meth)acrylic acid vinegar structures, more preferably three or more (meth)acrylic acids, and it is preferable to contain * or more (meth)acrylic acid vinegar structures. . Further, from the viewpoint of the curing sensitivity and the developability of the unexposed portion, it is preferred to contain an EO modified body. Further, from the viewpoint of the curing sensitivity and the strength of the exposed portion, a urethane bond is contained. According to the above viewpoint, the following compounds are exemplified as bisphenol A diacrylate, bisphenol A diacrylate E 〇 plastomer, trimethylolpropane triacrylate, trimethylolpropane tris(propylene)醯oxypropyl) 、, 曱 曱 曱 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙 乙, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylic acid vinegar, sorbitol pentapropyl phthalate, sorbitol hexaacrylate, bis (acrylic acid) Ethoxyethyl)isocyanuric acid vinegar, pentaerythritol tetraacrylate vinegar E plastomer, dipentaerythritol hexaacrylate EO modified body, etc., and commercially available products are preferably: amino phthalate oligomer UAS- 10. UAB-140 (manufactured by Shanyang Guoce Pulp Co., Ltd.), DPHA-40H (manufactured by Sakamoto Chemical Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 49 201222149 39745pifl is the number 100137021 Chinese The specification has no slash correction. Date of revision: February 10, 2012 (manufactured by Kyoei Co., Ltd.). Among them, preferred is 'bisphenol A diacrylate EO modified body, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tris(propylene decyloxyethyl) isocyanate Uric acid ester, pentaerythritol tetraacrylate EO modified body, dipentaerythritol hexaacrylate EO modified body, etc., and commercially available products are preferably DPHA-40H (manufactured by Sakamoto Chemical Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoei Corporation). Further, an ethylenically unsaturated compound having an acid group is also suitable, and as a commercial product, for example, a carboxyl group-containing trifunctional acrylate TO-756 manufactured by Toagosei Co., Ltd., and a carboxyl group-containing 5-functional acrylate TO can be mentioned. -1382 and so on. Further, the above polymerizable compound is also preferably an ethylene group having at least one addition polymerizable polymer, and has a boiling point i (8) at normal pressure. A compound having an ethylenically unsaturated group or higher. Examples thereof include monofunctional acrylates or methacrylates such as polyethylene glycol mono(indenyl) acrylate, polypropylene glycol mono(meth)acrylate, and phenoxyethyl (meth)acrylate; Ethylene glycol di(yl)acrylic acid vinegar, dimethicone tris(fluorenyl)acrylic acid vinegar, neopenta-2, bis(indenyl)acrylic acid vinegar, pentaerythritol tris(meth)acrylic acid vinegar, pentaerythritol Tetrakis(meth)acrylic acid vinegar, dipentaerythritol penta(methyl) acrylate vinegar, diquaternary pentoxide hexa(meth) acrylate vinegar, hexanediol (mercapto) vinegar vinegar, three-way two-two-burning Tris(propylene oxypropyl) bond, tris(acrylic acid &amp;ethyl)isonitrourethane j. Addition of polyfunctional alcohol towels such as glycerin or tris(tetra)yl bromide to ethylene bromide 2%, oxygen After the propylene is burned, the (meth)acrylic acid is made into a vinegar; Japanese Patent Special 50 201222149 39745pifl Revision date: February 10, 2012 is the 100137, 137021 Chinese manual without a slash correction. The public syllabus 48_4 〇 8 ^ Tiger, Japan The uric acid amino carboxylic acid vinegar described in each of the Japanese Patent Publication No. 5, No. 3, No. 37,193 The reaction of an epoxy resin with (meth)acrylic acid, as described in Japanese Patent Laid-Open Publication No. SHO-48-64183, Japanese Patent Publication No. Sho 49-43191, and Japanese Patent Publication No. Sho 52-313-49. The product is a polyfunctional acrylic acid or methyl acrylate vinegar such as oxalic acid acrylate or the like and a mixture thereof.自由基 In addition to the above, a radical polymerizable monomer represented by the following formula (ΜΟ·1) to (MO-5) may be suitably used. Further, in the formula, in the case where hydrazine is an alkylene group, the terminal on the carbon atom side is bonded to R. T: **{CH2^* -*—0012**·—OCHsCHj-—OCH2CH2CH2-—ΟΟΗ2〇Η2〇Η2〇ί2- t 1 H2t '~〇-chJ?— 51 201222149 39745pifl is No. I00137〇2l Chinese manual without slash correction This revision date: 2〇12年2月〇曰 In the above formula, η is 〇~η, and m is 1~8. There may be multiple R and T in one molecule, which may be the same or different. In each of the monomers of the radical polymerizable monomer represented by the above formula (MO-1) to formula (MO-5), at least one of the plurality of r represents_0C(=0)CH= CH2, or _〇c(=〇)c(CH3)= group represented by CH2. As a specific example of the radical polymerizable monomer represented by the above formula (MO-1) to (MO-5), the paragraph number 〇 248 to the paragraph of JP-A-2007-269779 can be suitably used. The compound described in No. 251 is used in the present invention. 52 201222149 39745pifl is No. 100137021 Chinese manual (no line correction) Correction period: 2〇12年2日丨〇0=0 9HS H2C!=CH - p-〇-CH2-i~CH2-〇- C -OHr-CHr-J-OH (M-1) Ο 6 h2c= Qss^J h2〇=9h i Η2〇=ΟΗ- ο o (off-2) i=o H2C=CH -C&quot;-o~&quot ;CH2—c—CH2&quot;—· c=o HjC^CH I-ch2-&lt;m2 h2c=ch ch2 i -C-OH (M-3) -CH2-C-0H ο H2G=CH 0=0 i o t 0=0 Η2〇=^Η o |&quot;&quot;CH2 2TM-〇—〇—^OH 0*-CH2-€H2M:-&lt;W (M-4) 53 201222149 39745pifl is the Chinese manual of No. 100137021 No underline correction This revision period: February 10, 2012 Η2〇=〇η ^ Ic=o 6 ch2 h2c^ch Γ Ϊη2 Η〇^^Η2—CH2^^-CH2-CTMCH2^TM&quot;CH2--CTM-CH2-〇~-C~ON2- ~CH2--C-OH (Μ-5) C-0 H2〇=CH Ηρ=〇Η 0=0 }ο }, 〒η2,-c-c^ ch2οc~o ch2 0 1 c~ h2c=ch ch3 H2c=c ch2 Y^2 ch2 οο ί C-0 H^C^CH H2C=rCHc=o tο ch2 ch2 6-ch2^ch2-c»oh ch3 chl 1*^ 2〇——0^2 TM0 — Oj (M-7) H2〇=C ch3 CHS h2c=c ch3c=oo 〇=〇I o H2c=c ch3 c^=o 54 201222149 Date of revision: February 1st, 2012, 39745pifl ^ is the Chinese manual of No. 100137021 without a line o HaC 0 I! C-CH2-i C=0 i 0 1 0 1 ch2»c- L ch2 r 〇C*&quot;CH2&quot;&quot;CH2—Loan CHS c=o H^C: CHa i =〇Ic= o I o CH2 CHa Γ —CH2-〇H2-C-~〇—CH2«H^—0-CH2_cp—CHfO—Good CH2-^-0H 〇o CHa oc=o CHa CHs H^J=Cc=o I 0 1 ch2 c=o H2C=C ch3 CHS h2c-oc=o Io CHa Η〇-〇^Η2-Κ^2-〇-〇-〇Η2·Η!ϊ--〇Η2-〇-ϋΗ2-0- &lt;!Η2--〇--〇TM·〇Η2-〇Ηΐ2·-^-〇Η έ&gt; ch2 ch2 〇〇O o I c金¢5 H2Cs〇Ϊη3 C-CH2-CHj-C-〇H About The details of the structure, the use of the polymerizable compound, or the method of use alone or in combination, and the amount of addition may be arbitrarily set depending on the final performance design of the photosensitive composition. For example, from the viewpoint of sensitivity, it is preferred that the structure has a large content of unsaturated groups per molecule, and in many cases, it is preferably 2 55 201222149 39745pifl Revision date: February 2, February 1st, the first 100137021 No. Chinese manual has no scribe correction. Further, from the viewpoint of increasing the strength of the ruthenium, it is preferable to use a trifunctional or higher functional group, and further, different functional groups and different polymerizable groups (for example, acrylate, mercapto acrylate, styrene compound, vinyl ether) The compound of the compound) is used to adjust both the sensitivity and the strength, and the compatibility and dispersibility with other components (for example, a photopolymerization initiator, etc.) which may be contained in the photosensitive composition are also provided. In other words, the selection and use of the polymerizable compound are also important factors. For example, there are cases where the compatibility can be improved by using a low-purity compound or a combination of two or more. A specific structure is selected in accordance with the viewpoint of improving the adhesion to the hard f surface of the support or the like. In the following, a resin (for ', filial is a developable binder resin) having a polymerizable compound will be described. The ^人^ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Addition, addition condensation, etc. = class f is known to have addition polymerization, i shell is known to have radical polymerization, cationic polymerization, and the like is divided into &amp; polymerization, etc., and generally known = sub-contracting &amp; The formation of _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Graft copolymerization and the like. The polymerizable group is not particularly limited, and is preferably a group having a radical, a cation or a bond which undergoes polymerization by heating, and examples thereof include an unsaturated group (such as a carbon-carbon unsaturated double bond) and an epoxy group. An oxetanyl group or the like is preferably an unsaturated group. The above unsaturated group may, for example, be a (fluorenyl) propylene fluorenyl group, a (fluorenyl) acrylamide group, a thio(meth) acryl fluorenyl group or a (meth) acryl fluorenyl group or a (meth) propyl oxalate group. An amine group and a carbon-carbon unsaturated group other than a thio(methyl) propylene group. The carbon-carbon unsaturated group other than the (meth) acrylonitrile group, the (fluorenyl) acrylamide group, and the thio(methyl) propyl fluorenyl group preferably has a radical polymerizable group or a cationic polymerization group. A group of a bond that undergoes a reaction or a reaction by heating. Such a carbon-carbon unsaturated group is preferably a vinyl group, an allyl group, a propargyl group, a cyclopentenyl group, a cyclohexenyl group, a styryl group, a vinyl ether group, a vinyl ester group, an allyl ether group or an alkene group. Propyl ester, propargyl ether, propargyl ester, dicyclopentenyl, particularly preferably vinyl, allyl, allyl ester, propargyl ester, dicyclopentenyl, most preferably B Dilute base. The polymerizable group in the present invention is preferably a (fluorenyl) acrylonitrile group, a (fluorenyl) acrylamide group, a thio(fluorenyl) propylene group or a vinyl group, more preferably a (fluorenyl) propylene group. Base, (meth) acrylamide or vinyl. In addition, when a polymerizable group is introduced into the resin, the resin can be polymerized by a monomer which imparts a polymerizable group after the polymerization, and can be applied after the polymerization to impart a treatment to the polymerizable group. The resin having a polymerizable group is preferably a radical or cationically polymerizable repeating unit. Free radical or cationically polymerizable repeating unit by using acid 57 201222149 39745pifl No. 100137021 Chinese specification without slash correction This revision date: February 12, 1 February or the role of free radicals 'produces between polymer molecules It is crosslinked and gelled to help reduce the solubility in the developer containing the organic solvent. The radically polymerizable repeating unit is preferably introduced into the resin by reacting the compound having a radical polymerizable group in a resin which can be bonded to a compound having a radical polymerizable group. Examples of the resin having a radical polymerizable repeating unit include the following resins as a representative resin: a carboxyl group-containing resin containing a glycidyl group such as (meth)acrylic acid propyl acrylate or allyl epoxidized ether a base-based unsaturated compound, or a resin obtained by reacting an unsaturated alcohol such as a dilute alcohol, a 2-hydroxy acrylate or a 2-trans methacrylic acid vinegar; and a resin having a hydroxyl group; a resin obtained by reacting a group of unsaturated compounds and an unsaturated acid needle, a resin obtained by reacting a polybasic acid anhydride in an addition reaction product of an epoxy resin and an unsaturated acid; a resin obtained by reacting a polymerizable monomer containing a radical with an addition reaction product of an unsaturated silicic anhydride; and synthesizing a specific functional group having a desorption reaction by a treatment to impart an unsaturated group The resin is subjected to an alkali treatment to thereby form a resin or the like which forms an unsaturated group. Among them, a resin obtained by reacting a non-saturated compound containing a glycidyl group such as glycidyl (meth)acrylate or dipropyl epoxidized propyl ether in a resin containing a thiol group; In a resin obtained by polymerizing a hydroxyl group-containing (meth) acrylate compound, '(mercapto) acrylate having a free isocyanate group such as (mercapto)acrylic acid 2-isocyanate ethyl ester is reacted a resin; a resin having a repeating unit represented by the following general formulas (1) to (3); and a synthesis having a desorption reaction by alkali treatment, 58 201222149 39745pifl Revision date: February 10, 2012 Japanese Patent No. 100137G21 states that a duck is subjected to a test for the resin of the specific functional group without a scribe line, and the resin is subjected to a test, and a resin having an unsaturated group is produced. The resin of the ionic poly. repeating unit may have a polymer such as cation in the side chain; and also has an epoxy group in the side chain, and the oxetane group has a cationically polymerizable repeating simple resin, for example, ruthenium. A monomer having a monomer as a monomer component, for example, a cyclooxy 3,4-epoxycyclohexene (tetra)(tetra)ester or a (meth)propionate Wait. There are two or more kinds of vinyl-based epoxys. The monomer to which the epoxy group is added may be only one type, or the case where the monomer component contains a resin having a cationically polymerizable repeating unit, and the ratio of the monomer to which the epoxy group is introduced is not included. Jiajiao is 5% by mass in the total monomer component, and 10 mass% 〇/〇~60% by mass. ο (1) From the cation polymerization (4) Fresh reading material The repeating unit represented by any one of the following formulas (). (" C·——1 RW r36 , ^0 A^-G^—yk___ (2) fi?1 '〇=Λ R30 R92 59 201222149 39745pifl Revision date: February 10, 2012 is the first 〇 0137 ( In the above formula (1) to formula (3), A21, A22 and A23 each independently represent oxygen slant, face shirt 41), and r41 represents a nitrogen atom or a burnt group. G2i and G=G23 each independently represent a divalent linking group. And /I each independently represent an oxygen atom, a sulfur atom or a 2i 11 atom or a burnt group. One, 7F single bond, oxygen atom, sulfur atom, benzene stretching A group or a group of 43)_, R represents a hydrogen atom or an alkyl group. R, R, and a knife independently represent a hydrogen atom or a valence substituent. In the case of J (l), r21 to r23 are independently represented. a nitrogen atom or a ruthenium substituted soil. The valence substituent represented by R to R23 is a substituted filament (preferably having a carbon number of 1 to H), more preferably a carbon number /), and the like 21' Examples of the substituent include a transradical group, an imine atom, etc. In the pot, R" is a hydrogen atom, and R23 is preferably a hydrogen atom or a methyl group. R to R each independently represent a gas atom or a monovalent one may include a hydrogen atom or a filament which may have a substituent (more preferably, 1 to 4, more preferably Wei 1 to 4), and the wire may have (4) substituted f, and R AR respectively A hydrogen atom, a halogen atom, an alkoxy group (preferably having a carbon number of 2 to 15), a fluorenyl group, a certain group, an aryl group, and a substitutable group (preferably a carbon number 丨~ And a ketone group (preferably having a carbon number of from 6 to 20) which may have a substituent, or a aryloxy group (preferably having a carbon number of from 6 to 20) which may have a substituent. A silky base having a substituent (preferably a carbon number) 60 201222149 39745pifl Revision date: February 10, 2012 is the Chinese manual of the number 100137021, the aryl group of f (preferably carbon number 6~20) And the like, among which, preferred: ', ', hydrogenogen =, alkoxy group, a thio group which may have a substituent, an aryl group which may have an alumina, more preferably a hydrogen atom or may have a substituent Hyun base, especially a hydrogen atom or a methyl group. Here, examples of the substituent which can be introduced include unicorn, ethoxylate, isopropoxy, methyl, ethyl, phenyl and the like. Α21 represents an oxygen atom, a sulfur atom or a -. ·, χΖ1 represents oxogen scorpion: sulfur atom or -N(R42)_. Here, R42 and each independently represent a hydrogen atom or a burnt group (preferably, carbon number, more preferably carbon number N 4 ). Preferably, 21 and X2i are oxygen atoms. G represents a monovalent linking group. The divalent linking group represented by the above is preferably a stretching group which may have a substituent, a stretching group which may have a substituent, a divalent aromatic group which may have a substituent, _〇c(〇)-, _c (〇)〇_, _n(r44)_ and a linking group obtained by combining the groups (the total number of breaks is preferably 20', more preferably the total carbon number is 〜15, and particularly preferably the total carbon number is 2~ (1)) (&gt; R44 represents a benzene or an alkyl group (preferably, a carbon number of 1 to 10, more preferably a carbon number of 1 to 4). More preferably, G is a hydrocarbon having a substituent and having a substituent. a dicycloalkyl group which may have a substituent, a divalent aromatic group having a carbon number of 6 to 2 fluorene, a ruthenium group having a substituent of 3 to 20, a ruthenium group having a substituent of 3 to 20, and a ruthenium having a carbon number of 6 to 20 Å, 〇c(〇)·, _c(〇)〇 _, _N(R44)_ and a linking group obtained by combining the groups, wherein, in terms of properties such as strength and developability, a carbon number of a substituent may be linear or a branched alkyl group having a substituent of a carbon number of 3 to 1 Å, a divalent aromatic group having a substituent of carbon number 1212, _0C(0)-, -C(0) 0-, -N(R44)_ and the combination of these groups 61 201222149 39745 Pifl Revision date: February 20, 2012, No. 100137021 Chinese manual, no underline correction of this base. Here, as a substituent in G21, it is preferred that a hydrogen atom is bonded to a hetero atom group. The group other than the hydroxyl group, for example, an amino group, a thiol group or a carboxyl group, is preferably a hydroxyl group. In the above formula (2), R27 to R29 each independently represent a hydrogen atom or a monovalent substituent. The preferred range of R27 to R29 is the same as the preferred range of the above R2i to R23. R3G to R32 each independently represent a hydrogen atom or a monovalent substituent. Specific examples of r3〇 to R32 include a hydrogen atom and a halogen atom. a dialkylamino group (preferably having a carbon number of 2 to 20), an alkoxycarbonyl group (preferably having a carbon number of 2 to 15), a sulfo group, a nitro group, a cyano group, and an alkyl group which may have a substituent (more Preferably, the carbon number is 1 to 20), the aryl group which may have a substituent (preferably, the carbon number is 6 to 2 Å), the alkoxy group which may have a substituent (preferably, the carbon number is 1 to 15), and may have a substitution. a aryloxy group (preferably having a carbon number of 6 to 2 Å), an alkylsulfonyl group which may have a substituent (preferably, a carbon number iKZO), An arylsulfonyl group having a substituent (preferably having a carbon number of 6 to 20), etc., wherein a hydrogen atom, an alkoxy group, an alkyl group which may have a substituent, and an aryl group which may have a substituent are preferable. Here, as the substituent which can be introduced, a group which is exemplified as a substituent in the general formula (1) to R21 to R23 is also exemplified. A4i each independently represents an oxygen atom, a sulfur atom or - N(R41)-. This table is not a hydrogen atom or an alkyl group (preferably having a carbon number of 1 to 10, more preferably a slave number of 1 to 4). G represents a monovalent linking group. The specific x and the range of the divalent linking group represented by G22 and the specific example of the divalent linking group represented by the above G2! 62 201222149 39745pifl are the Chinese manual of No. 100137021 [[Line correction revision period: 2 〇12年月月〗 〇曰 and the preferred range is the same. Υ21 represents a single bond, an oxygen atom, a sulfur atom, _N(R43)_ or a phenyl group. Here, R43 represents a hydrogen atom or an alkyl group which may have a substituent (preferably, the carbon number is 1 to 10, more preferably the carbon number is 1 to 4). The phenylene group represented by Y21 may have a substituent, and examples of the substituent include an alkyl group, a halogen atom and the like. In the above formula (3), R33 to R35 each independently represent a hydrogen atom or a monovalent substituent. The preferred range of R33 to R35 is the same as the above-mentioned range of 3^. A monovalent substituent. Specific examples of R36 and specific examples in which R to R independently represent a hydrogen atom or ?R4G and a preferred range are the same as those of R3? to R32. A represents a non-oxygen atom, a sulfur atom or _n(r41)_, z2 oxime, a sulfur atom or _N(R42)_. And r = the same. (a) /, in the formula (1), 〇 G23 represents a divalent linking group. The examples and preferred ranges are the same as the above G and preferred ranges. The specific example paragraph number of the divalent linking group represented by the divalent linking group represented by f is [0027]~[〇〇571巾_^' 958. It is preferable to use the synthetic formula in the above publication. The method is carried out. Among them, the complex unit in the developable adhesive resin 63 201222149 39745pifl Revision date: February 10, 2012 is the first face 37021 Chinese _ 鸠 no sizing correction Ben Moer % 'better 5 mo %% ~ 6 〇 Mo Er%, the most 60 Mo. /. . A preferred embodiment of the present invention comprising a == is a resin having a side chain and a ruthenium atom. According to this embodiment, the polarization ratio (pdahz coffee I#) having an atom or a fluorine atom is low, and the refractive index of the photosensitive composition can be lowered when the resin is used, and the composition is directly bonded. The obtained (four) refractive index is also more advanced - the stick is not the same &gt; especially the developable adhesive resin contains high enthalpy in the side chain 'ι Γ brother (10) as the inorganic material (four) atom helps the extraction Fluorine (10) is a resin containing a repeating unit having a fluorine atom. For the low refractive index of the sapphire octagonal fluorine, it is required to carry out the riding of the resin in the side chain element (10) fine = atomic repetition, preferably a homopolymer of fluorinated monomer or octagonal, Or a copolymer of a fluorine-containing monomer and a non-fluorine monomer. Examples of the X fluorine-containing monomer include the following monomers. H2C=CH-C„F· F nF2n+l FaC^C-CFj FF^C^C—O &quot;〇,F; FF p F2C=C-~〇-cf2CF(CF3)-〇*CF2CF2c〇〇CH3 F3C, CF In the above formula, n represents the integer 64 201222149 Revision date: February 10, 2012, 39,745 pifl is the No. 100137021 Chinese manual without a slash correction cf2=cfocf2cfcf=cf2, cf3 cf2=cfocf2ocf2cf=cf2, cf2=cfocf2cf2ch- Chcf=cf2 ch2 ch2 \ / ch2-ch2 CF2==CFOCF2cl:r2CH=CH2 , oo CF2=CFOCF2(CH2&gt;xNHCCH=CH2 cf2=cfocf2cfcf2cf=cf2 cf=cf2 CF2=CFOCF2CF2C=CF2 , cf3 cf2=cfocf2cf2ocf=cfci ( x : an integer from 1 to 4), CF^CFOCI^—FCF=CF2, c—cf2 f2 CF2=CFO(CF2)2CF=CFCF3, o cf3 II I CF2=CFCNHCGH2CH=CH2 , cf3 cf2=cfcf2cf2ch=ch2 , Cf2=choch2ch2cf=cf2 , CF2=CFCF2?FCH=CH2 , cf3 CH2=CFCOCH2CH2CF=CF2, o CF3 cf2=ccoch2ch2cf=cf2 ,o CH2=CHOCH2CH2CFi2CF=CF2 o F3cr The following is a polymer structure obtained from the above fluorine monomer, but the present invention is not limited to the polymer structure. 65 201222149 39745pifl No instruction for the Chinese manual No. 100137021; Date of revision: February 10, 2012 (where 'in l + m + n is an integer, m is an integer from 1 to 4, n or cf3.) 4 Under the condition, 1 is an integer of 0~1 of 〇~5, and R is F (CF wins ppH)n ~(-CF-0^0 r/, r2 (wherein, the heart and R 2 are respectively F or CF, /0^ -fCF2-CF CF+ CF2~CF cf3 , 兮--f The resin of 〇F2~CFf °χ° 0^3 n〇f3 , preferably contains a repeating unit having a halogen atom on the side chain of the side chain, and may be contained in the resin of the developing adhesive resin. The repeating unit having a halogen atom or a fluorine atom in the side chain is preferably a repeating unit represented by the following formula (4) or formula (5). 66 201222149 39745pifl No. 100137021 Chinese manual without a sizing correction# Amendment date: February 12, 2011 1 In the general formula (4), R1, R2 and R3 each independently represent a hydrogen atom, a burnt group or an aryl group. R4 and R5 each independently represent a hydrogen atom, an alkyl group or a decyloxy group. R6, R7 and R8 each independently represent an alkyl group, a decyloxy group or X represents a divalent linking group. 11 represents an integer of 0 to 20. In the formula (5), R1, R2 and R3 have the same meanings as R1, R2 and R3 in the formula (4). The clothing is not linked to the base. Represents an alkyl group substituted with a fluorine atom. The alkyl group represented by R3 and the alkyl group represented by R3 is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and most preferably a methyl group. The aryl group represented by R, R2 and R3 is preferably an aryl group having 5 to 30 carbon atoms and an aryl group having 6 to 8 carbon atoms. These alkyl groups and aryl groups may have a substituent such as a hydroxyl group, a dentate atom or a carboxyl group. Most preferably, R1 &amp; R2 represents a hydrogen atom, and R3 is a hydrogen atom or an alkyl group. 67 201222149 39745pifl is the Chinese manual of No. 100137021. There is no dirty correction. This revision date: February 2012 i〇 day R4 and R5 independently represent a hydrogen atom, a hospital base or a sulphur alkoxy group. The so-called oxime oxy group means a monovalent substituent in which a shixi atom of a group having an arbitrary substituent is bonded via an oxygen atom. The alkyl group represented by R4 and R5 is preferably a carbon group having 1 to 1 carbon atom, more preferably an alkyl group having 1 to 4 carbon atoms, most preferably a methyl group. The oxime oxy group represented by R4 and R5 is a structure represented by _〇Si(R5l)(R52)(R53), and R51, R52 and R53 each independently represent an alkyl group or an alkenyl group. The ray group represented by R51, R52 and R53 is preferably a carbon number of 1 to 4, more preferably an alkyl group having a hindrance of 1 to 4, and most preferably a fluorenyl group. The alkenyl group represented by R52 and R53 is preferably an alkenyl group having 2 to 10 carbon atoms, more preferably an alkenyl group having 2 to 4 carbon atoms, and most preferably a vinyl group. R6, R7 and R8 each independently represent an alkyl group, a decyloxy group or an alkenyl group. The alkyl group represented by R6, R7 and R8 is preferably a carbon number alkyl group, more preferably a carbon number of 1 to 4, and most preferably a methyl group. The decyloxy group represented by R6, R7 and R8 is a structure represented by _〇Si(RM)(R52)(R53), and its definition and preferred range are as per 7 oxy* groups represented by the above R4 and r5. the same. The alkenyl group represented by R6, R7 and R8 is preferably an alkenyl group having 2 to 1 Å carbon atoms, more preferably an alkenyl group having 2 to 4 carbon atoms, and most preferably a vinyl group. X1 and X2 represent a divalent linking group. Examples of the divalent linking group represented by fluorene and X2 include an oxygen atom, a sulfur atom, a stretching group, a stretching group, a stretching phenyl group, a -C(9)...C(0)0...C(0)N( Rl5)_ and a linking group obtained by combining the groups (the total carbon number is preferably 卜, more preferably the total carbon number is 〜15', and particularly preferably the total carbon number is 2 to 10). Rl5 represents a gas atom or a burnt group 68 201222149 39745pifl Revision date: February 10, 2012 is No. 100137021 Chinese manual without a line (preferably a broken number 1~ω 'better carbon number 4), preferably Nitrogen atom. The divalent linking group of Table 7F of X and X is preferably a stretching wire, a _c〇〇_Rt_ group, a -0-Rt- group, and a group formed by combining two or more of these groups. Rt represents a stretching group or a stretched wire, preferably a stretching group having a carbon number of 1 to 5, more preferably a group, a (CH2)2 group or a _(CH2)3 group. The alkylene group contained in the divalent linking group of X1 and X may be substituted by a hydrazine or a trialkylalkylene group (preferably a trimethyldecyl group). The η1 is not an integer of 0 to 20, preferably an integer of 〇~1〇, more preferably an integer of 〇~5. A R9 represents an alkyl group substituted by a fluorine atom, preferably an alkyl group substituted by a fluorine atom having 1 to 20 carbon atoms, more preferably an alkyl group substituted by a fluorine atom. The number of fluorine atoms in the alkyl group substituted by a fluorine atom represented by R9 is preferably from 3 to 20, more preferably from 3 to 15. Further, from the viewpoint of the simplicity of the synthesis, the repeating unit represented by the above formula and the repeating unit represented by the formula (5) are each preferably a repeating unit represented by the following formula (6). A repeating unit represented by the formula (7). 0~C, A12_Y12-R14 (7) ί^^'s R11 C^C, A11-Y1,-s|-R12 R13 69 (6) 201222149 39745pifl For Brother 100137021 Chinese Manual _j Line Correction Revision Date: 2〇 In February, 12, in the formula (6), Ri 〇 represents a hydrogen atom or an alkyl group. R11, R12 and R13 each independently represent an alkyl group, a decyloxy group or a dilute group. A11 represents an oxygen atom, a sulfur atom or -N(R15)-. R represents a wind atom or a sleek base. Y11 represents an alkylene group, an alkylene group or a combination thereof. In the formula (7), A12 represents an oxygen atom, a sulfur atom or -N(R15)-. Γ12 represents an alkylene group, an alkylene group or a combination thereof. R14 represents an alkyl group substituted with a fluorine atom. R10 and R15 are synonymous with R10 in the formula (6). In the formula (6), 'R1G represents a hydrogen atom or an alkyl group. The alkyl group represented by rig may have a substituent such as a hydroxyl group, a dentate atom or a carboxyl group. The alkyl group represented by rig is preferably a carbon group having a carbon number of 1 to 10, more preferably a carbon group having a carbon number of 丨4, more preferably a mercapto group, an ethyl group or a propyl group, and most preferably a mercapto group. R11, R12 and R13 each independently represent an alkyl group, a decyloxy group or an alkenyl group. The preferred ranges of the alkyl group, the decyloxy group and the alkenyl group represented by R11, R12 and R13 are the same as those of the alkyl group, the decyloxy group and the alkenyl group represented by the above R6, R7 and R8. A11 represents an oxygen atom, a sulfur atom or _]^(foot 15)-. R15 represents a hydrogen atom or a stilbene group, and the preferred range is the same as described above. A11 is preferably an oxygen atom or -N(R15)-, more preferably an oxygen atom. Y11 represents an alkylene group, an alkylene group or a combination thereof. Y11 is preferably an alkylene group having a carbon number of 1 to 1 Å, more preferably an alkylene group having a carbon number of 1 to 5. Specific 70 201222149 /wpifl For the 100130137021 Chinese saying that the sun and the moon are not underlined. Amendment date: February 10, 2012 and Luke cited methylene, ethyl, and propyl groups. Further, the alkylene group contained in γ" may be substituted by a hydroxyl group. In the formula (7), 'A12 represents an oxygen atom or a sulfur atom or A12 is an oxygen atom or _;^(&amp;15)_, More preferably, it is an oxygen atom, and represents an alkylene group, an alkylene group or a combination thereof. γΐ2 is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 5 carbon atoms. The s may, for example, be a methylene group, an ethylidene group, a propyl group, etc. Further, the alkylene group of Ο 2 2 may be substituted by a fluorine atom-substituted alkyl group (preferably a trifluoromethyl group). The alkyl group substituted with a fluorine atom is preferably the same as the fluorine atom-substituted alkyl group represented by the above R9 represented by R14. 'Rl〇&amp;Rl5 and the formula (6) R10 and R15 are synonymous with each other, and the preferred range is also the same. The repeating unit represented by the formula (4) specifically includes the following repeating unit. G 71 201222149 is the Chinese specification of the No. 100137021 : February 10, 2012 Γ&gt; «3^5 The repeating unit represented by the formula (5) specifically includes the following repeating qp - monoterpene. 72 201222149 39745pifl For the Dirty 3rd Chinese, the duck has no line correction. Date of revision: February 1st of the year The developable binder resin preferably has the above-mentioned radical or cation-polymerizable repeating unit, and at least one repeating unit represented by any of the above formulas (4) to (7), whereby the degree of hardening can be more surely Basic developability with less residue and residue. The lower refractive index of at least one of the developing agent resins represented by any of the above-mentioned formulas (4) to (7). ^ In terms of weather resistance, _ ^ further, the atom has a general formula, and the content of the side chain is preferably the molar % of the i mole A unit in the developable binder resin. Good for 20 materials. / Moer %, more preferably 1G Mo %% ~ 7〇, today 4~60 Mo Er%. The developable binder resin may have a repeating unit of a cyano group. In the case of ', ', the body can have the content of 含, 匕 ,, the developing adhesive resin is preferably 73 201222149 Revision date: February 10, 2012, 39,745 pifl is the No. 100137021 Chinese manual without line repair 1 A repeating unit containing a cyano group represented by the following formula (III). (ΠΙ) In the formula (III), RC31 represents a hydrogen atom, an alkyl group, a cyano group or a -CH2-〇-RaC2 group. In the formula, Rac2 represents a hydrogen atom, an alkyl group or a fluorenyl group. Rc32 represents a group having an alkyl group, a cycloalkyl group, a dilute group, or a cycloalkenyl group. These groups can be substituted by a cyano group. Wherein at least one of Rc31 and Rc32 comprises a cyano group. Lc3 represents a single bond or a divalent linking group. The alkyl group of Rc32 in the formula (III) is preferably a linear or branched group having 3 to 20 carbon atoms. The cycloalkyl group is preferably a cycloalkyl group having 3 to 20 carbon atoms. The alkenyl group is preferably an alkenyl group having 3 to 20 carbon atoms. The cycloaliphatic group is preferably a ring-based group having a carbon number of 3 to 20. RC32 is preferably an unsubstituted alkyl group. The divalent linking group of LcS is preferably an alkylene group (preferably having a carbon number of 5~5) and an oxy-ester bond (a group represented by -COO-). The repeating unit represented by the formula (III) is preferably a repeating unit represented by the following formula (cm: 74 201222149 39745pifl Amendment date: February 2012, ι〇日 is the Chinese manual No. 100137021 without a sizing correction $ ( OHM) 0^0 I Rs r through i , where 'R5 represents a nicotine group, and at least one of the formula (m) and Re3i'R5 includes a nitrogen group. The reduction of R5 may be a chain or a ring. A single ring or a polycyclic ring 〜~7) 'monocyclic or polycyclic ring dilute base (more = 3:12, more preferably carbon number 6~12), aryl group (preferably carbon number) 7 to 20, more preferably carbon number 7 to 12) and so on. The cycloalkyl group includes a hydrocarbyl group and a crosslinked cyclic hydrocarbon group, and the crosslinked cyclic formula (IV) may, for example, be a 2-ring hydrocarbon ring, a 3-ring hydrocarbon ring or a 4-ring hydrocarbon ring. Further, the crosslinked cyclic hydrocarbon ring also contains, for example, a condensed ring in which a plurality of ring-burning hydrocarbon rings of 5 to 8 members are condensed. Preferred crosslinked cyclic hydrocarbon rings are exemplified by: ice silk (η. wall nyl), adamantyl, bicyd〇〇ctanyl, three percent [5, 2, 1 '〇2'6] 癸基等. More preferably, the crosslinked cyclic hydrocarbon ring may be a norbornene group or a diamond base. The hydrocarbon group may have a substituent. Preferred substituents include a bromine atom, a chlorine atom, an alkyl group, a substituted hydroxyl group of a hydrogen atom, an amine group substituted with a hydrogen atom, and a cyano group. Preferred alkyl groups include mercapto, ethyl, butyl and t-butyl groups. The above alkyl group may have a more substituent, and examples of the substituent which may be further include a bromine atom, a chlorine atom, an alkyl group, a hydroxyl group substituted with a hydrogen atom, and an amine group substituted with a hydrogen atom. 75 201222149 39745pifl For the first pass! Amendment date: The substituent of the above hydrogen atom on the first day of February 1, 2012, for example, a pyridyl group, a cycloalkyl group, an aryl group, a substituted methyl group, a substituted ethyl group, an alkoxy group, and a Fangxuan Lacto-based. Preferred examples of the filaments include carbonic acid, and preferred finely substituted methyl groups include methoxymethyl, f-oxythiomethyl, oxy-oxymethyl, and second butoxymethyl. 2-methoxyethoxymethyl, preferred substituted ethyl can be enumerated! · Ethoxyethyl, methyl small methoxyethyl, preferred mercapto groups can be listed as Jiaxian, B, propyl sulfonyl, butyl, isobutyric acid, pentyl group, special extract, etc. Examples of the carbon number of the cymbal base and the alkoxy group include an alkoxy group having a carbon number of 1 to 4. The following table is not a specific example of a repeating unit containing a cyano group represented by the formula (ΙΠ), but it is determined by the axial frequency example (Rain, Ra represents a nitrogen atom, an alkyl group, a cyano group or a _CH2_〇_RaC2 group). Wherein Rac2 represents a hydrogen atom, a pyridyl group or a fluorenyl group). The content of the repeating single unit containing a cyano group is more than 1% by mole to 8% by weight, more preferably 1% by mole to 60% by mole, relative to the total repeating unit of the viscous binder resin. Further, the 'developable binder resin' may be a resin obtained by using a compound represented by the following formula (hereinafter referred to as "ether dimer") as a copolymer. 76 Revision date: 2012 February 10 (E-1) In the formula (E-1), R1 and R2 each independently represent a hydrogen atom or a hydrocarbon group. The hydrocarbon group as R1 and R2 is preferably a hydrocarbon group having a carbon number of -15 to 15 or more. The photosensitive composition contains a resin obtained by using the compound represented by the above formula (E-1) as a copolymer, whereby the heat-resistant coating film formed using the composition is heat-resistant and transparent. Sexuality is improved. 201222149 39745pifl is the Chinese manual of No. 100137021 without a slash correction In the above formula (E-1) which represents the above terpene dimer, the hydrocarbon group represented by r1 and r2 is not particularly limited, and examples thereof include mercapto group, ethyl group, n-propyl group, isopropyl group, n-butyl group and the like. a linear or branched alkyl group such as a butyl group, a tert-butyl group, a third pentyl group, a stearyl group, a lauryl group or a 2-ethylhexyl group; an aryl group such as a phenyl group, a cyclohexyl group or a t-butyl group; Hexyl, dicyclopentadienyl, tricyclodecyl, isobornyl, adamantyl, 2-methyl-2-bromide ring, methoxyethyl 4-ethoxyethyl, etc. a group-substituted alkyl group; an aryl group-substituted alkyl group such as a benzyl group. Among these hydrocarbon groups, in terms of heat resistance, a group containing a grade B or a grade 2 carbon which is difficult to be used, such as a particularly preferred A group, a cyclohexyl group, or the like. Further, the substituent may be a substituent, or a specific example of the above-mentioned ether monomer. For example, dimethyl 2 2, (methylene)] bis-2-acrylic acid vinegar, diethyl Base_2,2,_[Oxygen double (Asiatic sulfonyl group 77 201222149 39745pifl is No. 100137021 Chinese manual) No slash correction This revision date: February 10, 2012 acrylate, di(n-propyl)-2, 2'-[oxybis(indenyl)]bis-2-acrylate, di(isopropyl)-2,2'-[oxybis(methylene)]bis-2-acrylate, two (positive) Butyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, di(isobutyl)-2,2'-[oxybis(indenyl)]di-2- Acrylate, bis(t-butyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, bis(third amyl)-2,24oxybis(indenylene) Bis-2-acrylate, bis(stearyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, bis(lauryl)-2,2'-[oxygen double (indenylene)] bis-2-acrylate, bis(2-ethylhexyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, di(1-decyloxy) Ethyl)-2,2'-[oxybis(methylene)]bis-2-acrylate, di(1-ethoxyethyl)-2,2 -[oxybis(indenyl)]bis-2-acrylate, dibenzyl-2,2'-[oxybis(indenyl)]bis-2-acrylate, diphenyl-2,2' -[oxybis(indenyl)]bis-2-acrylate, dicyclohexyl-2,2'-[oxybis(indenyl)]bis-2-acrylate, bis(t-butylcyclohexyl) -2,2'-[oxybis(indenyl)]bis-2-acrylate, bis(dicyclopentadienyl)-2,2'-[oxybis(indenyl)]-2 - acrylate, bis(tricyclodecyl)-2,2'-[oxybis(indenyl)]bis-2-acrylate, bis(isobornyl)-2,2'-[oxybis(Asia Methyl)]bis-2-acrylate, diamantyl-2,2'-[oxybis(methylene)]bis-2-acrylate, bis(2-indolyl-2-adamantyl) -2,2'-[oxybis(indenyl)]bis-2-acrylate, etc. Among these ether dimers, particularly preferred is dimethyl-2,2'-[oxybis(indenylene) )] bis-2-acrylate, diethyl-2,2'-[oxybis(methylene)]bis-2-acrylate, dicyclohexyl-2,2'-[oxybis(methylene) )] bis-2-acrylate, dibenzyl-2,2'-[oxybis(indenyl)]bis-2-acrylate. These ether dimers may be one type or two types. Above. Relative to The total repeating unit of the developable binder resin preferably has a repeating unit content of 20 78 201222149 39745 pifl corresponding to the compound represented by the above formula (E-1). Date of revision: February 1, 2012, number 100137021 Chinese manual without slash correction of this Moll%~9G Moll%, especially good for 30 Mo%%~6〇 Moer%. It will show that the raw adhesive contains the repeated early sputum other than the repeating unit prepared above (also known as other repeating units). The other repeating unit may, for example, be a repeating unit having a core-soluble group. The soluble group can be exemplified by an acid group, an alcoholic base group, a scaly ketone group, an epoxy group, and the like, and more preferably an acid group. The decanoic acid group is not particularly limited, and examples thereof include a lindane, an active fluorenylene group, a hetero group, an acid group, a sulfhydryl group, a carboxylic anhydride group, etc., and a sulfhydryl group is preferred. Acid group. Further, the active methylene group is preferably -nh-c(o), a group represented by ch2_c (o> rm, Rm represents a silk or an alkoxy group, and these groups may have a (tetra)fluorene substituent, preferably a carbon number of 1. More preferably, it is a methyl group, a trimethyl group or a methoxy group, and these acid groups may be only one type or two or more types. In order to introduce an acid into the binder resin For example, a monomer having an acid group and/or a monomer capable of imparting an acid group after mixing (hereinafter sometimes referred to as "a monomer for introducing an acid group") may be polymerized as a monomer component. In addition, in the case where a monomer capable of imparting an acid group after polymerization is introduced as a monomer component, it is necessary to carry out a treatment for imparting an acid group, for example, which will be described later after the polymerization. For example, a monomer having a carboxyl group such as (fluorenyl)acrylic acid or a decyl succinic acid, a monomer having a phenolic hydroxyl group such as fluorene-hydroxyphenyl maleimide or the like, maleic anhydride, and anthracene a monomer having a carboxylic anhydride group such as butyl dianhydride, etc., particularly preferably (mercapto) propyl 79 201222149 39745pifl Amendment date: February 10, 2012 is the Chinese version of the olefinic acid of the No. 100137021. The above-mentioned monomer which can be used for the acid group after the polymerization can be exemplified by acrylic acid 2 _ _ _ _ _ _ _ _ The monomer of the oxy group, the monomer of (meth)acrylic acid and the monomer of the isocyanic acid (IV) may be used alone or in combination of two or more. In the case of using a monomer which can impart an acid group after polymerization, a treatment for modifying a part of a polar group of a polymer: chain by a polymer reaction can be mentioned. The == agent resin may contain a repeating unit having an alkali-soluble group. In the case where the repeating unit is contained, the total repeating unit in the resin has a face-soluble ear % to 3 mol% of mol% to 40 mol. The compound corresponding to the following (1) to (1)) can be exemplified as the monomer corresponding to the repeating unit. Dipropylene: acid 2: hydroxyethyl brew, acrylic acid 2-hydroxypropyl vinegar, acrylic acid 4_ keidine, methyl propyl phthalate 2 _ base ethyl: methyl methacrylate 12 _ Acid 3 _ hydroxy (four) = rare butyl brewing and other aliphatic methacrylates. (7) Acrylic acid vinegar, acrylic acid ethyl acetate, acrylic acid propyl vinegar, butyl acetonate, C, "isobutyl 8", _ acid money, acrylic acid g | 'propionic acid 80 201222149 39745pifl for the 10th 〇137〇21号 Chinese manual without slash correction This revision period: February 2012, 1 day, 2-ethylhexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, acrylic acid ring Oxypropyl vinegar, propylene glycol acid 3,4-oxoxacyclohexyl hydrazine, ethyl acetoacetate, 2-phenylethylene acrylate, 1-propylene acrylate, propylene glycol A propyl acrylate such as propyl propyl ester, allyloxyethyl acrylate or propargyl acrylate. (3) decyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, 0 isobutyl methacrylate, n-butyl methacrylate, hydrazine Second butyl acrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-ethylene ethyl methacrylate, glycidyl methacrylate, 3,4-epoxycyclohexyl decyl methacrylate, vinyl methacrylate, 2-phenyl vinyl methacrylate, fluorenyl A mercapto acrylate acrylate such as 1-propenyl acrylate, allyl methacrylate, 2-allyloxyethyl methacrylate or propargyl methacrylate. ◎ (4) acrylamide, mercapto acrylamide, N-hydroxydecyl acrylamide, N-ethyl acrylamide, hexyl decyl acrylamide, N-cyclohexyl acrylamide, N-hydroxy ethane Acrylamide, N-phenyl acrylamide, N-nitrophenyl acrylamide, N_ethyl-N-phenyl acrylamide, vinyl acrylamide, vinyl methacrylamide, N,N-diallyl acrylamide, N,N-diallyl decyl acrylamide, allyl acrylamide, allyl decyl acrylamide, etc. Acrylamide or decyl propylene oxime amine. (5) Ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, etc. B 81 201222149 39745pifl Revision date: 2012 On February 1st of the year, the Chinese manual No. 100137021 has no underline correction # olefins. (6) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, and vinyl alum. (7) Styrene, α-methylstyrene, methylstyrene, gas-pure styrene, p-ethoxylated styrene and other styrenes. (8) A ketene such as mercapto ketene, ethyl ketene, propyl ketene or phenyl ketene. (9) Olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene. (10) Ν-vinyl η bromidone, acrylonitrile, mercapto acrylonitrile, and the like. (11) cis- s-imine, acrylonitrile, acrylamide, propyl decyl acrylamide, hydrazine _ (p-chlorobenzoquinone) fluorenyl The acrylamide is not saturated with the imine. (12) A methacrylic monomer having a hetero atom bonded to the α-position, for example, a compound described in JP-A-2002-313, No. 2002-311569, and the like. In addition, the Japanese patent special fair 7_12〇〇4, the 曰本 patent special fair 7-12〇〇4Η虎, Japanese patent special fair 'that is like tiger, Japanese patent special fair 8-12424, Japanese patent special open Zhao 63_287944 Japanese Patent Laid-Open No. 47, Japanese Patent Laid-Open No. (7) (10), Japanese Patent Laid-Open No. Hei 11-352691, etc., and an acid group-containing urethane-based adhesive polymer, or Japanese Patent Laid-Open No. 2 The amine-based adhesive polymer having an acid group and a double bond in the side chain described in 〇2_1〇7918 is particularly excellent in strength. 82 201222149 39745pifl For the Chinese manual No. 100137G21, there is no slash correction. This revision period: February 1, 2012, the developing adhesive resin can be made by the polymerizable monomer corresponding to each repeating unit. Obtained by polymerization. The solvent used in the radical polymerization or cation formation, for example, calcination, cyclohexyl, methyl ethyl hydrazine, propylene _, tetra-South-milk, shouting, ethylene glycol single-ethyl shouting, and b-b- Alcohol early base acetic acid brewing, dihexan- building ^ formazan acetate vinegar, 2 methoxy ethoxy oxime 2 _ shout, L methoxy propanol, acetic acid 1-methyl =, Ν, Ν-dimethylformic acid The amine, dimethylacetamide, hydrazine:=, methyl lactate, acetaminophen, and dimethyl sulfoxide may be used singly or in combination of _ or more. Two of the base-based emulsions, cumene hydrogen, peroxide, diisopropyl peroxydicarbonate, di-tert-butyl: isobutyronitrile and other azo-nitrides, 2, 2, -Azo double G is a solvent-soluble liquid, and has the following general formula (4) ===:: The form of the compound having a stone atom is low, and in the case of using the compound, The refractive index of the photosensitive composition can be lowered, and the result is a decrease in the yield of the photosensitive composition (IV). In addition, the presence of the stone atom as an inorganic material contributes to the improvement of the weather resistance 83 201222149 39745pifl Amendment date: February 1st, 2012 is the 100137th 21st Chinese manual without a slash correction. (A) In the formula (A), 'Ru represents a single bond or a di- or substituent. In the case where Rn is a single bond or a divalent linkage/linkage group, or the valence linkage group and the compound (8) have a & bond or two X&quot; represent a single bond or a divalent linking group. / Original R Rp represents a monovalent group 圏 Rn containing a polymerizable group. Rn is preferably a face-valent substituent. t When the base is grouped, the (4) represented by the general formula (A) belongs to the 1st horse early bond &amp; the - price linker _ 俨远, the dance 疋 is the other structural unit represented by the above single bond or r =, Ϊ (C) The structure of the table is single-turned to other cuts. The frequency of the bivalent Wei-rays is listed as follows: oxygen atom, stretching group, aryl group, or a combination thereof. - is carbon; = is preferably a carbon number of 1 to 丨. The stretching (four) is preferably an alkenyl group having a carbon number of 2 to 1 Q, more preferably the stone m 4 may have money and a double bond at any position. The alkyne group is preferably an alkynyl group having a carbon number of 2 to 1 q, more preferably 2 to 4, and may have an unsaturated triple bond at any position. The aryl group represented by η is preferably a carbon number of 6 to 2 (four) stretched wire, and more preferably 84 201222149 39745pifl is the Chinese specification of the 1001371371 without a scribe line correction. The carbon number is 6 to 10. The divalent linking group represented by Rii may be a group obtained by combining at least two selected from the group consisting of an oxygen atom, a stretching group, an alkenyl group, an alkynyl group and an extended aryl group, preferably A group selected from a combination of at least two selected from the group consisting of an oxygen atom and a stretching group. The total carbon number in the group in which at least two are combined is preferably from 1 to 40, more preferably from 1 to 10, particularly preferably from 1 to 10, and the divalent linking group represented by Rn may have The substituent may be a group of a substituent (preferably having a carbon number of 1 to 10, more preferably a carbon number of i to 6, more preferably a carbon number of 1 to 4) or an aryl group (preferably having a carbon number of 6 to 20). More preferably, the carbon number is 6 to 1 Å), the alkoxy group (preferably having a carbon number of 1 to 10' is more preferably a carbon number of 44), and the aryloxy group (preferably having a carbon number of 6 to 20) is more preferred. It is a carbon number of 6 to 10), a decyloxy group (more than 2 to 10, more preferably a carbon number of 2 to 4), and a fluorenyl group (preferably a carbon number of 2 to '1 〇 is more preferably carbon). a number of 2 to 4), an alkoxycarbonyl group (preferably having a carbon number of 2 to 1 Å, a carbon number of 2 to 4), an amine group, and a heterocyclic group (preferably having a carbon number of 2 to = a carbon number of 2 to 1 Å). ), dentate atoms, etc. Better The monovalent substituent represented by 11 may be exemplified by an alkyl group (preferably, carbon number i 1 to 4) and a cycloalkyl group (more preferably 10, more preferably a carbon number of 1 to 6, more preferably a carbon number). Number 3 to 20, more preferably 3 to I], ^ base (preferably carbon number 2 to 1 〇, nightmare soap reading, better for carbon number 2, especially good for carbon number 3 to 7) , 2~4), block base (preferably 85 201222149 39745pifl is the 10013719021 Chinese manual without a slash correction. The revised period: February 10, 2012 is the carbon number 2~10, more preferably the number 2~4 And an aryl group (preferably, the carbon number ό 20 20 is more preferably a carbon number of 6 to 10), an alkoxy group (preferably a carbon number dip, more preferably a carbon number of 1 to 4). These groups may have a substituent, and the substituent may be the same as the specific examples of the substituent which the divalent linking group represented by the above Rn may have. In the case where R&quot; represents a monovalent substituent, Rn preferably represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group or an alkoxy group, more preferably an alkyl group or an alkoxy group, and particularly preferably a carbon number of 1 to 6 The alkyl group or the alkoxy group having 1 to 4 carbon atoms is preferably a methyl group. The single bond or divalent linking group represented by Xn is preferably a divalent linking group. Specific examples and preferred ranges of the divalent linking group represented by Xu are the same as those of the specific examples and preferred ranges of the divalent linking group represented by Rn. Specific examples of the polymerizable group contained in the monovalent group represented by RP may be the same as those of the above specific examples of the polymerizable group in the retinescent binder resin. As long as the monovalent group containing a polymerizable group represented by the heart contains the above-mentioned group, the valence group of the Rp silk-containing silky group is not specific, and may be the above-mentioned polymerizable group itself or may be polymerizable. And a group selected from the group consisting of a halogen atom, a sulfur atom, an alkylene group, a cycloalkyl group, an extended aryl group, _c(〇)〇_, =)n(rV -C_-, _N(RV _Sl(RL)w and The group of groups 2 is composed of at least one combination of the group of filaments. It is preferably the above polymerizable group itself, or • free oxygen material, stretching base, stretching ring, stretching Aryl group, 0^ 〇)N(R)_ and the group of wires that are combined with the wire 86 201222149 39745pifl Revision date: February 10, 2012 is the 1001373721. A monovalent group in which at least one of the groups is combined. #子或烧基 (preferably carbon number 1 (), more preferably ^ is not a hydrogen atom. 隹 is a number 1 to 4) Preferably, she = (tetra) t char number (ie, the residue represented by &amp; is not particularly limited, and is usually 2 to 4 Å, preferably 2 to 30, m~^ represents the molecular weight of the monovalent group ( That is, the sputum = = sub-quantity) is not particularly limited, usually 2. 2 dry circumference, more than 20~1000, more preferably 2〇~5〇〇. The sample shows the quantity and benefit of the (4) wire From the viewpoint of the scratch resistance of the front material, it is preferred that the structural unit represented by two may be the following general formula (4)) or have (A) -2) The structural unit represented. (A-2) ^AF ·_ 卜 xiif · CM) R11 wherein Rap represents a group containing an alkali-soluble group and a polymerizable group. The J 1 shell Ra table does not contain a monovalent group of an alkali-soluble group. Ru, /&quot; and heart are respectively synonymous with R&quot;, X11 and Rp in the above formula (A), and specific examples and preferred examples are also the same. A monovalent group containing an alkali-soluble group and a polymerizable group represented by Rap 201222149 39745pifl Revision date: February 1, 2012, No. 100137〇21 Chinese specification No underline correction This group only contains alkali-soluble groups and polymerization. There is no particular limitation on the nature of the two, and it may be an alkali-soluble group and a polymerizable group, a sulfonium atom, a hetero group, a stretching group, an extension wire, an extension ring, and a base-c(o)o. -, -C'(rL)_, _c(〇)s_, _n(rL) si(RL)2-, and at least one of the groups of the groups in which the groups are combined Into the stomach group. Preferably, the above-mentioned soluble group and polymerizable f' are selected from the group consisting of an oxygen atom, an expanded wire, an extended alkenyl group, a stretched wire, a aryl group = C(O)C) C(Q)N(RL)_, and The combination of the bases* is a valence group formed by combining at least one of the groups. Here, rl is the same as above. c. The specific examples of the base = the radical and the soluble group can be enumerated and the ones having the "two" 7-polymerizable group and the soluble group are not included, and the number of the capacitive groups is one or 2 The number of the polymerizable groups contained in the base towel is not one or two, and is preferably one to four. It is given: 6j solid, preferably 1 to 4, more preferably more than one. In view of the bismuth, it is preferred to contain two alkali-soluble groups, and the monovalent group having an alkali-soluble group of S has no particular limitation on the group, and the monovalent group containing an alkali-soluble group The base-soluble group is selected from the above-mentioned alkali-soluble group itself of the oxygen horse, or the base can be ', the sulfur atom, the alkyl group, the alkylene group, the extension 88 201222149 39745pifl is the No. 100137021曰期: February 10, 2012 aryl, -c(o)o-, -c(o)n(rl)-, _c(〇)S-, _N(RL)_, _si(RL)2_ and a monovalent group obtained by combining at least one of the groups in which the linking groups are combined, preferably the above-mentioned alkali-soluble group itself, or an alkali-soluble group selected from an oxygen atom, At least one of a group consisting of an alkyl group, a cycloalkyl group, an extended aryl group, -c(o)o_, -c(o)n(rl)_, and a linking group formed by combining the groups A monovalent group combined. Here RL is the same as above. The total carbon number of the monovalent group represented by Rap (that is, the total carbon number of the group represented by Rap) is not particularly limited and is usually 3 to 4 Å, preferably 3 to 3 Å, more preferably 3 〜. 20. The molecular weight of the monovalent group represented by Rap (that is, the molecular weight of the residue represented by R) is not particularly limited, and is usually in the range of 5 Å to ADD, preferably 5 Å to 1 Å, more preferably Good for 5〇~5〇〇. The number of alkali-soluble groups contained in the monovalent group represented by Ra, the total carbon number of the listener® and the molecular weight (that is, the RA represents ^ 歹 戈 基 = total stone inverse number and molecular weight) ) is the same as the above. The compound having a structural unit represented by the formula (A) may further be a structural unit represented by the following formula (B). &gt;, Xl1 and Han Chinese in (B) are the same as the above-mentioned general formula (A) and general formula (12), and (synonym for human 丨1 and Ra' are specific examples and preferred examples. 3 Polymerization of structural units containing atomic atoms 89) 201222149 39745pifl Revision date: February 10, 2012 is the Chinese manual No. 100137021. There is no scribe correction. In the case where the compound (C) is a chemical substance having the structural unit represented by the general formula (4), the compound ( c) preferably a polymer comprising the structural unit s of the above formula (4), wherein the form of the polymer is not particularly limited to the linear polymer of the mrt, the cage type, and the ladder. (1) In the form of the compound (6), the compound (6) is preferably a resin from the viewpoint of resolution and coatability, and is preferable from the viewpoint of further lowering the refractive index. The resin containing a stellite atom in the main bond of the resin, for example, a resin such as a straight-chain oxidized polycarbite, which is a linear polymer, is preferably a linear one. Polyoxane (cage polyoxane, ladder polyoxane) Poly-Wei and 梯 (4) Wei-burn is a compound of a compound having a structure of a half-corpse gentile = ulGxane). The so-called sesquiterpene oxygen e-two structure, 疋 refers to each (four) sub- and three oxygen atoms combined, and each oxygen atom plaque; solid dream atomic structure (relative to (four) sub-number of atoms, ^-type poly- 峨 and ladder type The sample of the sample can be as described in Japanese Patent Laid-Open Publication No. 2, No. 788-788. The bovine case (resin as a linear polymer) is used as the money compound (10) as a homopolymer. The resin is not limited, and is preferably a fabric, a developability, a pattern formability, and a raw material acquisition. The resin of the linear polymer of the present invention is selected from the group consisting of the structural unit represented by the formula (4). The structural unit represented by the structure single 'yuan (A) jin A-2) and the formula represented by the general formula (8) are the 90. 201222149 39745pifl is the ugly 3702! Chinese manual without the slash correction. Revision date: 2 The unit of February 10, 12 is preferably a main chain constituting the resin of the compound (C), and more preferably a main chain constituting the linear polyoxyalkylene. The content of the structural unit (i.e., repeating unit) represented by the general formula (A) is preferably from 5 mol% to 95 mol%/〇, and preferably 10 mol% to the total repeating unit of the resin. 9〇% of the ear. The structure f兀 (ie, the 'repeating unit') represented by the formula (a) has a (fluorenyl) acrylonitrile group, a (fluorenyl) propyl sulfonium group or a thio(indenyl) propyl group as a polymerizable group. In the case of the base, the total repeating unit of the resin = the total repeating unit of the resin, the content of the structural unit represented by the formula (A) is particularly preferably 5 mol% to 5 mol%, and more preferably 1 mol%. 45 Molar/〇° The structural unit represented by the formula (A) (ie, repeating unit) has a (meth)acryloyl group, a (meth)acrylamide group, and a thio(methyl)propene group. In the case where the carbon-carbon unsaturated group other than the fluorenyl group is a polymerizable group, the content of the structural unit represented by the general formula (A) with respect to the total repeating unit of the resin is preferably 40 mol% to 9 〇 mol%. More preferably, it is 6% molar. The resin which is a linear polymer may contain a structural unit represented by the above formula (B) or may not contain the structural unit, and may contain a total repeating unit with respect to the resin in the case of containing the structural unit. The content of the structure unit (i.e., the 'repeating unit) represented by the formula (B) is preferably from 5 mol% to 5 mol%, more preferably from 10 mol% to 45 mol%. The polymer of the structural unit represented by the above formula (A) may be more than 3 other structural units other than the above structural unit. Such a structural unit may be a structural unit represented by the following formula (C). 91 201222149 39745pifl Revision date: February 10, 2012 For the Chinese manual No. 100137021, no underline repair a# (C), the formula (C) R22 each independently represents a single bond or a divalent linking group, or a hydrogen atom or a monovalent substituent. Among them, ^ and shame and hetero group and polymerizable group. In the case where R21 and the moiety are in a single form, the single bond or the divalent linking group is bonded to another cerium atom of the compound (C). X21 represents a single bond or a divalent linking group. The single bond or the divalent linking monovalent substituent represented by R21 and r22 is a divalent linking group or a divalent linking group represented by a 2 α atom or a ruthenium 21 and R 22 in the same manner - the same as the above-mentioned R ll Specific examples and preferred examples of the divalent group are the R 1 ^ substituent and the polymerizable group. —21 and 2, the single bond or the divalent linking group represented by Α without a soluble group is preferably a two-bonded linking group represented by a divalent linkage, and specific examples of the above-described two-based linking group can be similarly enumerated. And preferred examples. U shows the ===, the fat may contain the total repeating unit of the above formula (C) with respect to the resin, the formula 3 and the second J are %, and the content of the fm repeat is preferably 5 mol% to 95. 'More preferably 1% Moer%~9〇 Moer%. The above-mentioned polymer can be obtained by the following method: a commercially available product containing Shishihara 92 201222149 39745pifl is amended: February 1, 2012, the first specification of the Chinese patent specification No. 100137021 a method of causing an alkali-soluble group or a polymerizable group, or co-hydrolyzing a mixture of two or more kinds of organic dentane and/or organoalkoxy decane corresponding to each monomer structural unit having a soluble group or a polymerizable group; Methods. Further, other preferred examples of the compound (C) include an anthracene ring described in Japanese Patent Laid-Open Publication No. 2010-160418, Japanese Patent Laid-Open Publication No. Hei No. Hei. ° \ Functionality or more of a compound that blocks a polymerizable group, a carcass, a tree, and the like. Although the various forms of the compound (C) have been described above, the number average molecular weight of the resin as the compound (C) by the gel permeation chromatography (GPC) method is polystyrene-equivalent ( Mn) is preferably 400 to 5 Å, 〇〇〇, more preferably 600 to 40,000, most preferably 30, 〇〇〇. The polystyrene-equivalent weight average molecular weight ❹ j W) of the resin of the compound (c) of the present invention by gel electrophoresis (GPC) method is preferably from 0 to 200,000, more preferably 2, 4 Å. ~150,000, = good ^ 3, _~12G, _. If the weight average molecular weight and the number average are within the range of the above numerical values, the work of the present invention has a good solubility and correction, and can be hardened in the heating stalk. More specifically, when the number average molecular weight is 400 or more, good enamel coating property or curability is obtained, and when the number average molecular weight is 〇〇〇 or less, good developability is obtained. In the case where the polymerizable group is an unsaturated group, the viewpoint of increasing the degree of the domain 5 'the present invention (4) The unsaturated value of the compound (c) is preferably 0.5 mmol/g 93 201222149 39745pifl Revision date: February 10, 2012 The Chinese manual No. 100137021 has no underline repair] E# or more, and particularly preferably 0.7 mm 〇 l / g or more, and most preferably 1 〇 mm 〇 1 / g or more. - by setting the unsaturated value of the compound (C) to 〇5 mm〇1/g or more, by increasing the number of the unsaturated double bonds, the photopolymerizability and the sensitivity are increased, and further, the polymerizability is obtained. It is improved, and the adhesion to the solid surface of the support or the like or the mosquito net containing the empty or the pores of the porphyrin is also increased, and it becomes easy to obtain the defect of the empty space or the porous vein in the development lining. It is preferable to have a tendency of a pattern having a tapered or rectangular cross-sectional shape. The acid value of the compound (C) of the present invention is preferably 2 〇 mg K 〇 H / g 〜 3 〇〇 mg KOH / g ' More preferably 4 〇 mg K (10) g 〜 2 〇〇 mg K 〇 H / g, particularly preferably 50 mg KOH / g~160 mgK〇H/g. If the acid value is in this range, the development of the pattern is more difficult to make the coating uniformity more favorable. The compound (C) may be used singly or in combination of two or more kinds, and as described above, the compound (C) is a polymerizable compound, and the polycondensate contains a low molecular compound and a resin having a polymerizable group. The form of the (bright adhesive resin). The mass of the low molecular compound and the developable binder resin in this form is not particularly limited, and is preferably 1G: 9G to 9G: 1 () to 80: 20. The compound (6) is more than 5% by mass to 4% by mass, particularly preferably from 15% by mass to 30% by mass, based on the total solid content of the photosensitive composition. Further, the refractive index of the compound (c) is preferably 155 or less, particularly preferably W or less, and most preferably. Therefore, it can be more reliably reduced. 94 201222149 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. This revision period: February 10, 2012 The refractive index of the obtained pattern. Specific examples of the compound (C) of the present invention are shown below, but the present invention is not limited to these specific examples. The numerical values shown in the respective units indicate the molar fraction of each unit in the resin molecule (wherein, the values in the side chains of C-5 and C-31 represent the number of repetitions of -Si(CH3)2-0-). ^70 〇人〇~S丨, (C-2) MW=15〇〇° (C-1) Μψ»5000 Unsaturated value: 1.58mmo!/g Unsaturated value: 1*31mmol/g Uneven value: 1.44mmol^ /an Ο nu I 70 w long 〇· OH (03) Mw«30000 Unsaturated value: 1.20mmol/g (C-5) Mw»8000 Unsaturated value: 1 jB5mmolig (0*6) Mw=20000 Unsaturated value: 1.42mmol/g (C-7) Mw=16000 No more than the value *丄eemmoUig 65 F3C’, CF3 OH ' (°*11) Mw=22000 Uneven value: 1.31mmol/g (C-12) Mw=27000 Unsaturated value: 2.55mmol/g 95 201222149 39745pifl No. 100137021 Chinese manual without sizing correction Date: February 10, 2012 (014) Unsaturation: 7.0 mmol/g 0 (c-15) Unsaturated value: ΊΟ.Ιηηπτο^ 5-V~c ::P (c-16) Unsaturation: 7.57m!O〇l/g (c-18) Unsaturation: l0, 4 mmol/g (C-i9) &lt;i+n=6, m^i2) Unsaturation: 2.52 mmoi/g (C-20) Unsaturated value: 7.49mrr> ol/g (c_21) Unsaturated value: 7.57mnnol/g 96 201222149 39745pifl No. 100137021 Chinese manual without line correction This revision date: February 2012 i〇 (02$) Mw=SOOO No* and value: 12mmol/g / CH (C-2^ Mw&lt;3100 not worth sum: 1 .emwoi/g (027) Mw=3500 No robe and value: 4.0mmoI^g (C-30) Mw»80X Residual value: 3. Immol/g Inspection (C-32) Mw &lt;000 Residual value: 2.7 mmol/g [5] (D) Organic solvent The photosensitive composition usually contains an organic solvent. The organic solvent is selected in accordance with the solubility of each component or the coating property of the photosensitive composition, and is not particularly limited. It is particularly preferable to consider the solubility, coating property, and safety of the ultraviolet absorber and the binder. As an organic solvent, esters are exemplified, for example, ethyl acetate and acetic acid _ 97 201222149 39745 pifl is the 100 137 021 Chinese specification without a slash correction. Amendment date: February 10, 2012, n-butyl ester, isobutyl acetate, citric acid Amyl ester, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, decyl lactate, ethyl lactate, butyl lactate, oxyacetate Base ester (for example: methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (for example, methyl methoxyacetate, ethyl methoxyacetate, butyl oxyacetate, ethoxyacetic acid) Anthracene ester, ethyl ethoxyacetate, etc.)), alkyl 3-oxopropionate (eg, 3-oxopropionate, 3-oxypropionate, etc. (for example, 3-曱) Methyl oxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.), alkyl 2-oxopropionate (Example: decyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc. (for example, methyl 2-methoxypropionate, 2-methoxypropionic acid) Ethyl ester, 2-methoxypropane Propyl ester, decyl 2-ethoxypropionate, ethyl 2-ethoxypropionate), 2-oxo-2-mercaptopropionate and 2-oxy-2-methylpropionic acid Ethyl ester (for example, decyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, etc.), decyl pyruvate, ethyl pyruvate, propionate Ester, acetonitrile acetate, ethyl acetate, 2-oxo-oxybutyrate, 2-oxo-oxybutyrate, 3-decyloxybutyl acetate, etc.; ethers are, for example, suitably listed: Diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monoterpene ether, ethylene glycol monoethyl ether, thiol cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monoterpene ether, two Ethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monoterpene ether (PGME: alias 1-decyloxy-2-propanol), propylene glycol monoethyl ether, dipropylene glycol monoterpene ether, ethylene glycol monoterpene ether Acetate (alias 2-methoxyethyl acetate), ethylene glycol monoethyl ether acetate (alias 2-ethoxyethyl acetate), diethylene glycol monobutyl ether acetate, Propylene glycol monomethyl ether acetate (PGMEA: alias 1-methoxy-2-ethyl 98 201222149 39745pifl Amendment date: February 1, 2012, the Chinese manual No. 100137021, no underline correction of oxypropyl ketone), propanol monoacetic acid vinegar, propylene glycol monopropyl hydrazine acetate, etc.; Examples include mercaptoethyl ketone, cyclohexanone, 2-g-heptyl, and 3-heptane. The aromatic hydrocarbons are, for example, terpene, diphenyl or ethylbenzene. Further, the organic solvent may, for example, be an alcohol such as isopropyl alcohol or an aprotic polar solvent such as N-methylperpyrrolidone. In view of the ultraviolet absorbing agent (details are described later), the solubility of the soluble resin, and the improvement of the coating surface, the organic solvent 亦 is preferably two or more kinds. In this case, a mixed solution composed of two or more selected from the group consisting of the following organic solvents: methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethyl cellosolve Acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2_heptane, cyclohexanone, ethyl carbitol acetate, butyl card Alcoholic acid brewing, mercaptoethyl ketone, ethylbenzene, propylene glycol monoterpene ether, and propylene glycol monoterpene ether acetate. The cerium content of the organic solvent in the photosensitive composition is preferably an amount of the total solid content of the composition of from 5% by mass to 80% by mass, particularly preferably from 5% by mass to 60% by mass. %, particularly preferably 1% by mass% to 50% by mass. [6] The additive photosensitive composition can be added with a surfactant and adhesion promotion within a range that does not impair the properties (heat resistance, mechanical strength, coatability, adhesion, etc.) of the film obtained by using the composition. Additives such as a polymerization agent, a polymerization inhibitor, an ultraviolet absorber, an antioxidant, an anti-aggregation agent, and a sensitizer. <Surfactant> 99 201222149 39745pifl Revision date: February 10, 2012 is the 100137th G21 Chinese _ Wei line correction this * owing: and the product, in terms of improving the coating properties, can be added j ion system: =: boundary: the active agent can use a fluorine-based surfactant, a scraping, a cationic surfactant, an anionic system, and a poly-wei interface active fresh surfactant. In particular, by containing a fluorine-based surfactant, the liquid property (particularly fluidity) when the photosensitive composition is prepared into a coating liquid is further improved, so that the uniformity of the coating thickness or the liquid-saving property can be further improved. In the case where a film is formed by using a coating liquid containing an interface-active fine photosensitive composition, the interfacial tension between the surface to be coated and the coating liquid is lowered, whereby the wettability to the coated surface is obtained. It is improved and the coatability to the coated surface is improved. Therefore, in the case where a film of several μm is formed with a small amount of liquid, it is also effective in forming a film having a uniform thickness having a small thickness unevenness. The fluorine content in the fluorine-based surfactant is suitably from 3% by mass to 4% by mass, more preferably from 5% by mass to 30% by mass, particularly preferably from 7% by mass to 25% by mass. The fluorine-based surfactant having a fluorine content in this range is effective in the uniformity of the thickness of the coating film or the liquid-saving property, and the solubility in the photosensitive composition is also good. Examples of the fluorine-based surfactant include Megafac F171, Megafac F172, Megafac F173, Megafac F176, Megafac F177, Megafac F141, Megafac F142, Megafac F143, Megafac F144, Megafac R30, Megafac F437, Megafac F475, Megafac F479, and Megafac F482. , Megafac F554, Megafac F780, Megafac F781 (above produced by DIC); Fluorad FC430, Fluorad FC431, Fluorad 100 201222149 39745pifl No. 100137021 Chinese manual without retracement Revision date: February 10, 2012 FC171 (The above is manufactured by Sumitomo 3M (share)); Surfflon S-3 82, Surflon SC-101, Surflon SC-103, Surflon SC-104, Surflon SC-105, Surflon SC1068, Surflon SC-381, Surflon SC-383, Surflon S393, Surflon KH-40 (above manufactured by Asahi Glass Co., Ltd.); Solsperse 20000 (manufactured by Sakamoto Lubrizol Co., Ltd.). Specific examples of the nonionic surfactant include glycerin, trishydroxypropyl propane, trihydrocarbyl ethane, and ethoxylates thereof and propoxylated oximes (for example, 'glycerol propoxylate, glycerin Ethoxylate, etc., polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene decyl phenyl ether, polyethylene glycol dilaurate , polyethylene glycol distearate, sorbitan fatty acid ester (Pluronic L10, Pluronic L31, Pluronic L61, Pluronic L62, Pluronic 10R5 'Pluronic 17R2 ' Pluronic 25R2 ' Tetronic 304, Tetronic 7 (H) manufactured by BASF Tetronic 704, Tetronic 901, Tetronic 904 'Tetronic 150R1), etc. Specific examples of the cationic surfactant include a phthalocyanine derivative (trade name: EFKA-745, manufactured by Morishita Industry Co., Ltd.), and an organic oxirane. Polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (fluorenyl) acrylic (co)polymer Polyflow No. 75, Polyflow n〇.90, P〇lyflow No. 95 (Kyoeisha Chemical Co., Ltd.) ), W001 (Yu (manufacturing of the company), etc. &quot; Anionic surfactants include, for example, w〇〇4, w〇〇5, W017 (manufactured by Yusei Co., Ltd.), etc. For example, T〇ray D〇wc〇ming 101 201222149 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. This revision date: "Toray Silicone DC3PA" and "Toray Silicone" manufactured on February 10, 2012. SH7PA, "Toray Silicone DC 11 PA", "Toray Silicone SH21 PA", "Toray Silicone SH28PA", "Toray Silicone SH29PA", "Toray Silicone SID0ΡΑ", "Toray Silicone SH8400"; "TSF" by Momentive Performance Materials -4440", "TSF-4300", "TSF-4445", "TSF-4460", "TSF-4452"; "KP341" and "KF6001" manufactured by Shin-Etsu Silicone Co., Ltd. "KF6002"; "BYK307", "BYK323", "BYK330" manufactured by BYK-Chemie. The surfactant may be used alone or in combination of two or more. The photosensitive composition may contain a surfactant or may not contain a surfactant, and in the case of containing a surfactant, the content of the surfactant is preferably 相对 with respect to the total solid content of the photosensitive composition of the present invention. 〇1% by mass or more and 1% by mass or less, more preferably 〇·〇1% by mass or more 〇 〖质量% or less. <Adhesion Promoter> The photosensitive composition of the present invention may contain any adhesion promoter in a range that does not impair the object of the present invention. The adhesion promoter may, for example, be exemplified by bis-glycidyl methoxypyryl trimethoxy siloxane (3 glycidyl 〇 xy pr 〇 yl yl tri yl 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Glycidoxypropyltriethoxydecane, oxime epoxide &amp; propylmethyl-anthracene ketone, 3-aminopropyltrimethoxy oxysulfide, etc. The compound described in Paragraph No. [0048] of JP-A-2008-243945. 102 201222149 39745pifl The Chinese manual No. 100137021 has no underline correction. This revision date: February 10, 2012 = Ming sense composition can contain dense The accelerator may not contain 3 agents: in the case of a adhesion promoter, the adhesion promoter is usually preferably 1 G mass% or less with respect to the total solid boring tool in the composition, and particularly preferably G.OOS mass% to 5 mass%% 0 <Polymerization inhibitor> The photosensitive composition of the present invention prevents the unnecessary thermal polymerization of the polymerizable compound in the production of the photosensitive composition or in the storage of the photosensitive composition. A small amount of polymerization inhibitor can also be added. ^ The inhibitors may be exemplified by hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, ortho-benzene. Triphenol (pyrogall〇1), t-butylcatechol, benzoquinone (benz〇quin〇ne), 4 4, _ thiobis(3-methyl-6-tert-butylphenol (^T-thiobisO-methyK-t-butylphenol)), 2,2,-methylenebis(4_0-mercapto-6-t-butylphenol) (2,2'-methylenebis(4-methyl-) 6-t-butylphenol)), N- succinyl phenylhydroxylamine sulfonium salt, and the like. The content of the polymerization inhibitor is preferably from 0.0005% by mass to 5% by mass based on the total solid content of the photosensitive composition. <Ultraviolet absorber> The photosensitive composition of the present invention may contain an ultraviolet absorber. UV absorbers can be used: salicylate, benzophenone, benzotriazole, 103 201222149 Modified period: February 12, 1st, February 3rd Qin (triazine) is a acrylnitrile external absorbent that is substituted for the 1001 side. Examples of the salicylic acid g-based ultraviolet absorber include salicylate, poplar-p-octylphenyl ester, and salicylic acid-p-butylphenyl ester. Examples of the dioxane-based ultraviolet absorber include : n secret ice - benzoquinone _, 2, 2 '- dipyridyl _4, 4 '- dimethoxy benzophenone _, 2, 2,, 4, 4, _ tetra J bisdiphenyl hydrazine _, 2-hydroxybutyroxylene dibenzophenone, 2, each di-alkyl group, benzoquinone_, 2-perylene- 4-octyloxybenzophenone and the like. In addition, examples of the stupid and external absorbents include: 2_(2,-hydroxydi-tert-butylphenyl)-5-chlorobenzotrisole, 2_(2,_trans-base_3,- Third butyl _5, _methylphenyl)-5-chlorobenzo-three "sit, 2_(2, _ _ _ _ 3, _ s pentyl _ 5, _ butyl phenyl) - 5: chlorobenzotriazole, 2_(2,_hydroxy_3'-isobutyl-5,-nonylphenyl)_5-chlorobenzotriazine, 2-(2,-hydroxy_3, _ Butyl _5, propyl propyl phenyl benzotriene 2-(2 yl-3,5,-di-t-butylphenyl) succinimide, 2_(2,-p-benzophenone Triazole and the like. Examples of the substituted acrylonitrile-based ultraviolet absorber include 2-ethyl cyano-3,3-phenyl acrylate and 2-ethylhexyl 2-cyano-3,3-diphenyl acrylate. . Further, examples of the triterpenoid ultraviolet absorber include 2-[4-[(2-hydroxy-3-dodecyloxypropyl)oxy]·2_hydroxyphenyl]_4,6-bis ( 2,4-Dimercaptophenyl)_1,3,5-triazine, 2_[4_[(2-hydroxy-3-tridecyloxypropyl)oxy]-2-ylphenyl]]-七卜双仏斗二曱基phenyl^(10)-three. Qin, 2-(2,4-di-diphenylphenyl)-bis(hydroxyphenyl)triazine compound such as diphenylphenyl; diazide; 2,4-bis(2-hydroxy-4- Propyloxy stupid 104 201222149 39745pifl Revision date: 2〇12年1月1〇曰为第100137021号 Chinese manual no underline#正本基)-6-(2,4-dimethyl stupid)4,3, 5-triazine, 2,4_bis(2-hydroxy-3-indolyl-4-propoxyphenyl)-6-(4-methylphenyl)_1,3,5-triazine, 2 , 4_bis(2-hydroxy-3-indolyl-4-hexylindolyl)_6_(2,4-diphenylphenyl H,3,5-triazine, etc. bis(hydroxyphenyl)triazine Compound; 2,4_bis(2-hydroxy-4-indolylphenyl)-6-(2,4-dibutyldecylphenyl)dioxatriazine, 24 6 tris(2hydroxy-4-inocyloxy) -1,3,5-triazine, 2,4,6-tris[2-hydroxy-4-(3-butoxy-2-hydroxypropyloxy)phenyl]-1,3,5-triazine In the present invention, the above various ultraviolet absorbers may be used singly or in combination of two or more. The photosensitive composition may contain an ultraviolet absorber. May not contain UV absorbers, but also contains UV absorbers. The total solid content of the phase-forming product, the content of the ultraviolet absorber is preferably ==% by mass or more and 1% by mass or less, more preferably % by mass or more (U-mass% or less). The components of the composition are described, and the photosensitivity % ==&gt; the solution in the organic solvent as described above also contains the solid matter of the organic solvent. The horse is not suitable for various types represented by the low refractive index material. The content of each component of the species of the mosquito used in the species, or the added additive, etc., is preferably used for the photosensitive photosensitive composition, preferably as the impurity metal content (4) 105 201222149 39745pifl is the ugly 3 No slash correction This revision period: February 10, 2012) ° The metal content of the composition towel can be finely smeared (10) The metal content of the metal other than the metal is better than 100 ppm. (4) Sex composition The method for producing the material is not limited, and the organic compound is obtained by adding the respective components of the composition to the organic solvent. The glandular pigment is preferably used for film formation by filtering through a filter to remove insoluble matter, coagulation, and the like. The pore size of the filter used at this time is: M5 μιη to 2.0 Å, more preferably the pore diameter 〇 μ 5 μιη~1 〇 最 最 、 :, = diameter 0.05 μιη〜〇·5 μηι. The material of the filter is preferably polytetrafluoroethylene 2, poly(tetra), nylon, more preferably polytetrafluoroethylene, polyethylene, and nylon. [7] Pattern forming method The method for forming a pattern of the cost of the moon includes: a step of using a photosensitive composition, a step of smearing, a step of exposing the photosensitive film, and a step of using a developing solution containing a grazing agent (4) and the above-mentioned sensitizing Sex composition = (Α) towel empty or porous particles, (Β) a compound that produces an active species by irradiation with active light or radiation, and (c) use of the action of the above-mentioned active species to reduce the inclusion of organic solution The solubility of the liquid towel is related to the method of forming the pattern, and the photosensitive composition formed by the photosensitive composition used in the pattern forming method of the present invention is obtained, for example, by the following operation 106 201222149 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. The date of this revision is: February, February, February, i: The use of spin coating, roll coating, dip coating, scanning Any method such as a spray method, a bar coating method, or an inkjet method, after applying a photosensitive composition onto a substrate, if necessary, removing the solvent by heat treatment to form a coating film (photosensitive) ), And then prebaking treatment. Examples of the substrate include a germanium wafer substrate, a Si 2 wafer substrate, a SiN wafer substrate, and a glass substrate, or various metals are formed on the surfaces of the substrates. The substrate of the layer or a substrate coated with a plastic film, a microlens, an on-chip color filter for an image sensor, or the like. The method of coating on the substrate is preferably a spin coating method, a scanning method, or an ink jet method. Particularly preferred is a spin coating method. A commercially available device can be used for the spin coating method. For example, it is preferable to use the cleanlYack series (made by Tokyo Electronics Co., Ltd.), the D_S system, the column (made by the Japanese screen (d-卯如=reen)), the SS series or the cs series (Tokyo). Manufactured by Chemical Industry Co., Ltd. As the condensing coating condition, it is possible to have any rotation speed. However, from the viewpoint of the == property of the film, the rotation speed is about 2 i300 rpm on a county plate having a diameter of mm. In addition, the composition dissolves (4) W 4^, the household light can be a dynamic spray of the composition solution sprayed on the rotating substrate, or the static discharge of the composition solution discharged on the substrate, and the in-plane uniformity From the viewpoint, it is preferably a dynamic ejection. From the viewpoint of the amount of consumption of the composition of the first embodiment, the following film may be used, and then the main solvent of the m product is ejected onto the substrate to form a liquid, and the composition is ejected from the ruthenium. The spin coating time is not particularly limited, and is preferably within a few seconds from the viewpoint of the amount of treatment. In addition, the processing of the film (the edge rinsing, the rinsing of the film) Back side rinse> Extremely Joan, 彖邛 Further, the photosensitive composition is cleaned and removed by a known neon volume (4), for example, when it is attached to a nozzle, a piping portion of a coating device, a coating device, or the like. In this case, it is preferable to use the above-mentioned towel as a solvent contained in the photosensitive composition of the present invention as a cleaning liquid for more efficient cleaning and removal. 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The cleaning liquid described in Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The cleaning liquid for cleaning and removing the photosensitive composition of the present invention. Preferably, the cleaning liquid is an alkylene glycol monoalkyl ether carboxylate or a mercapto diol monoalkyl group. These solvents which can be used as the cleaning liquid can be used singly or in combination of two or more. In the case where two or more solvents are mixed, a mixed solvent obtained by mixing a hydroxy group-containing agent with a solvent having no hydroxyl group is preferred. The mass ratio of the solvent having a hydroxyl group to the solvent having no hydroxyl group is from 1/99 to 99/1, preferably from _10^0 to 90/10, particularly preferably from 20/80 to 80/20. The mixed solvent is particularly preferably propylene glycol monomethyl ether 108 (201222149 39745pifl is the Chinese manual of No. 100137021). There is no scribe correction date: February 1, 2012 acetate, PGMEA ', propylene glycol table Methyl ether (propylene glycol monrr Γ Γ = Ε) mixed solvent, and the ratio is _. This evening ^, for the heart lotion for the photosensitive composition can also add force to the cleansing towel (four) for the level composition A surfactant that is disclosed as a surfactant. J ' The method of pre-baking treatment is not particularly limited, and a hot plate secret which is generally used, a heating method of (4), a rapid thermal process (Thermamoce bribe, RTP), a light irradiation using a gas lamp, and the like can be applied. It is preferably a heating method in which the heating plate is heated and the furnace is used. It is preferable to use a commercially available device for the heating plate, and it is preferable to use a cleanTrack series (manufactured by Tokyo Electronics Co., Ltd.), a D-SPIN series (manufactured by Dainippon Screen), a % series or a cs series (manufactured by Tosoh Industries). . The furnace is preferably a usable series (manufactured by Tokyo Electronics Co., Ltd.) or the like. The conditions for the above prebaking can be exemplified by using a hot plate or an oven at 6 Torr. (: ~150 ° C (preferably 60. (: ~ 120 ° C) heating for 0.5 minutes ~ 15 minutes. The step of exposing the photosensitive film is carried out as needed through a mask. Can be applied to the exposure Examples of the active light or the radiation include infrared light, g-line, h-line, i-line, KrF light, ArF light, X-ray, electron beam, etc. From the viewpoints of exposure amount, sensitivity, and resolution, the i-line is preferable. KrF light, ArF light, and electron beam are more preferably i-line or KrF light from the viewpoint of wide-spreadness. In the case where the i-line is used for irradiating light, it is preferably 100 mJ/cm 2 to 10000 mJ. The exposure amount of /cm2 is irradiated. When KrF light is used, it is preferably irradiated with an exposure amount of 30 mJ/cm2 to 300 mj/cm2. 109 201222149 39745pifl No. 100137〇21 Chinese manual without scribe correction# Amendment date: February 1, 2012 〇曰 In addition, the exposed composition layer can be used before heating or oven, at 7〇t:~18 (rrnr is in the next, ,, and the shadow processing is about minutes. U Heating for G. 5 minutes to 15, and then, for the exposed composition layer, the development of the light portion is obtained. The film (transfer step) = the exposure step of the photosensitive yttrium). By this, when a negative pattern is formed = :: = ==, a polar solvent such as an amine solvent or an ether solvent, and an alcohol The sling agent and the sputum can be exemplified by a developing solution of a solvent. , C, _, 2. Heptanone, 3 sin, sin 4^2=, 壬^ = gang, triisobutyl ketone, decylpentyl hydrazine Same as, cyclohexanide, acesulfame, I group (IV), methyl ethyl ketone, methyl. 衣衣己_, its Gongxing j Ming, acetyl acetonide, and two soils, ionone (i〇n〇n ), _ 〜 nal naphthyl ketone, isofine carbon = = agents, for example, acetic acid brewing, butyl mercaptan monoacetate, amyl acetate, propylene glycol monomethyl vinegar, B - = 3 Acetic acid: diethylene glycol monobutyl ether B, 2, 2, 4: = ethyl Eethyl-3-ethoxypropionic acid, 3, early B, methyl Imethoxy butyl acetate , formazan formic acid; = wide purpose, Tg»= ® said π 1 text τ consumption, ethyl formate, 曱酴隹Ϊ B = vinegar, lactic acid ethyl acetate, lactic acid butyric acid, lactic acid propyl vinegar, etc.: for B I 曱Ethyl acetate, butyl acetate, ethyl acetate, Esaki, etc. Examples of the alcohol-based solvent include methanol, ethanol, n-propanol, and isopropanol. 110 201222149 39745pifl is No. 100137021. The Chinese manual has no underline correction. This revision date is: February 12, 1 February, n-butanol, Dibutanol, tert-butanol, isobutanol, n-hexanol, indomethacin, n-heptanol, n-octanol, n-nonanol, etc., or ethylene glycol, di-diol, di Glycol-based solvent such as ethylene glycol, or ethylene glycol monoterpene ether, propylene disulfide, ethylene glycol monoethyl sulfonate, propylene glycol monoethyl _, diethylene glycol mono 'triethylene glycol monoethyl _, A A glycol-based solvent such as oxymercaptobutanol or the like. The ether solvent may, for example, be a bond other than the above glycol ether solvent, dioxin or tetrahydronaphthene. The present formazan-methyl t solvent can be used, for example: &amp;methyl-2_beeidine _, ΝΝ-mercaptoethyl H Ν, Ν dimethyl dimethyl decylamine, hexamethyl phosph〇ric triamide, 】 3 soil ^ 醯 diamine and so on. , 丞 丞 2 咪唑 咪唑 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃 烃Above the door, the external solvent or water is used in combination. Among them, there are inner and outer effects, and it is preferable to display the same, and to fully exert the performance of the present invention, which is substantially free of Hr and has a mass of less than 1 g. /. , i content I is better than the total amount of shadow liquid, for the organic, halogen of the developer. In the case of the vehicle, the amount of the organic solvent of 9 g% by mass or more (10) is 100% by mass or less. The lower part is more preferably 95. In particular, the developing solution of the human J&lt;k solvent and organic solvent preferably contains a group consisting of the selected white mountain, an alcohol solvent, and a solvent of 2 = _ including organic^ '- species (four) _ shadow liquid. Grain agent (4) (4) is preferably 111 5 201222149 39745pifl No. 100137021 Chinese manual without line correction This revision date: February 10, 2012 kPa or less, especially preferably 3 kPa or less, especially preferably 2 kPa or less. By setting the vapor pressure of the developer to 5 kPa or less, evaporation of the developer on the substrate or in the developing cup is suppressed, and temperature uniformity in the wafer surface is improved, and as a result, dimensional uniformity in the wafer surface becomes uniform. good. Specific examples of the vapor pressure of 5 kPa or less include 1-octyl ketone, 2-octanone, 1-nonanone, 2-nonanone, 4-heptanone, 2-hexanone, diisobutyl ketone, and cyclohexane. Ketone solvents such as ketone, methylcyclohexanone, phenylacetone, and mercaptoisobutyl ketone, butyl acetate, amyl acetate, propylene glycol monoterpene ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol Alcohol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, ethyl-3-ethoxy propionate, 3-decyloxybutyl acetate, 3-mercapto-3-methoxy Ester ester solvents such as butyl acetate, butyl formate, propyl formate, ethyl lactate, butyl lactate, propyl lactate, n-propanol, isopropanol, n-butanol, second butanol, third Alcoholic solvents such as butanol, isobutanol, n-hexanol, 4-mercapto-2-pentanol, n-heptanol, n-octanol, n-nonanol, ethylene glycol, diethylene glycol, triethylene glycol, etc. Glycol solvent, or ethylene glycol monoterpene ether, propylene glycol monoterpene ether, ethylene glycol monoethyl ether, propylene glycol monoethyl ether, diethylene glycol monoterpene ether, triethylene glycol monoethyl ether, decyloxy decyl butanol Ethylene glycol solvent, ether solvent such as tetrahydrofuran, N - mercapto-based solvents such as mercapto-2-pyrrolidone, anthracene, fluorene-dimercaptoacetamide, hydrazine, hydrazine-dimethylformamide, aromatic hydrocarbon solvents such as toluene and xylene, xin An aliphatic hydrocarbon solvent such as an alkane or a decane. Specific examples of the vapor pressure of 2 kPa or less which is a particularly preferable range include 1-octanone, 2-octanone, 1-nonanone, 2-nonanone, 4-heptanone, 2-hexanone, and diisophoric acid. Ketone solvents such as butanone, cyclohexanone, nonylcyclohexanone, phenylacetone, butyl acetate, amyl acetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl 112 201222149 39745pifl is the number 100137021 The instructions are not corrected by line; ^ Corrected period: 2〇U, February 1st, 1st day, ether acetate, diethylene glycol monobutyl ether acetate, _ _ ^ mouth ester, ethyl-3-ethoxy Propionate Ethyl Ethyl Ethyl Ethyl Ethyl Acetate Butyl Acetate, 3-Methyl-3-Methoxybutyl Acetate Ethyl Acetate), 3' Methionine Butyrate, Lactic Acid, Acetate, etc. H-capacity agent, alcoholic solvent such as 2 caproic acid vinegar, ethyl lactate, lactbutol, isobutanol, n-hexanol, 4-methyl, second butanol, and third n-nonanol, ethylene glycol, soil _ 7. Alcohol, n-heptanol, n-octanol, hydrazine solvent 'ethylene glycol monomethyl scale, didiol d? and other glycol propylene glycol monoethyl ether, diethylene glycol monoterpene ether, diether, ethyl ether and early ether , Ν, Ν--曱phenylmercaptanol, etc. Ether solvent, group diethylene glycol monoethyl sulfonate, methoxy-field 苴7\T f base-2-咐^ each biting ketone-mercapto-ethyl, N, N-didecyl and other aromatic hydrocarbon solvents , octane, oxime amine system / Fen film 1, 龅 卜 六 六 叮 叮 叮 叮 叮 叮 叮 叮 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪 肪For example, it can be exemplified in the following patent documents: = 2 bounds 631-226741 ^ ^ # ^ + special ~ Hokai-zhao 61-226745, Gong Hao, η, this patent, special open Kai 62-17_, Japan = 34540 Japanese Patent Laid-Open No. Hei No. Hei No. 8-62834, Japanese Patent Laid-Open No. Hei 9-54432, Japanese Patent Application Laid-Open No. Hei 9-9998, No. 〇 692, US Patent No. 55, 291, 988, US Patent No. 529, 633, US Patent No. 5, 436, 998, US Patent No. 5, 576, 143, Ref., No. 5, 576, 143, 39, 745, pp, pp, pp, pp, pp, pp, pp, pp The Chinese booklet fine line correction is described in the specification of U.S. Patent No. 5,294,511 and U.S. Patent No. 5,824,451, 'preferably a nonionic surfactant. Nonionic surfactants are not specifically formulated, and are preferably used surfactants or Shixia surfactants. For the total amount of the developer, the amount of the surfactant used is usually 0.001 Berry / 0 to 5 mass 0 / 〇, preferably 〇〇〇 5 mass % ~ 2 mass 〇 / 〇, particularly preferably 0.01 Mass % to 0.5% by mass. For the development method using the organic hydrazine developing solution, for example, the following method can be applied: a method of immersing the substrate + in a tank filled with a developing solution for a certain period of time (dip)*, and stacking and developing on the surface of the substrate by utilizing surface tension Liquid, a method of developing while standing still for a day (puddle method); a method of spraying a developer on a surface of a substrate (spraying method); spraying a developer at a constant speed on a substrate rotating at a constant speed A method (dynamic dispense method) in which the nozzle liquid is continuously ejected while the nozzle is being scanned. The development time varies depending on the composition of the photosensitive composition, but it is usually about 30 seconds to 120 seconds at 25 °C. In the above various development methods including the step of ejecting the developer from the developing nozzle of the developing device to the photoresist film, the discharge pressure of the developer to be ejected (the flow rate per unit area of the ejected developer) is preferably 2 Below mL/sec/mm2, more preferably 15 mL/sec/mm2 or less, especially ^mL/sec/mm2 or less. There is no particular lower limit for the flow rate, and it is preferably 0.2 mL/sec/mm2 or more in consideration of the treatment. When the discharge pressure of the developer to be discharged is in the above range, the pattern defect caused by the development residue after development tends to be reduced. 114 201222149 39745pifl For the Chinese manual No. 100137021, there is no scribe line. Revision date: February 10, 2012. The details of the mechanism are as follows. By setting the mouth pressure to the upper limit, it is generally considered that the pressure may be caused. When it is made smaller, the photoresist L is suppressed, and the developer is applied to the photoresist film. Further, the photoresist pattern of the developer is carefully removed or collapsed. The value at the exit of the developing nozzle. (mL/sec/mm) is a slab that adjusts the discharge pressure of the developer in the developing device, and adjusts the pressure of the nozzle by a pump or the like. For example, the following method is used: a method of changing the pressure and adjusting it. Or, by the supply from the pressure tank, in addition, in the step of performing the development, the solvent-side stop development step A'11 is replaced by the side-by-side replacement for the use of the organic solvent. Eluent! Steps for cleaning). The eluent used is not limited as long as it does not dissolve the solution of the organic solvent in the rinsing step after the development of the lamp. The use of the solvent selected from the flue solvent, lanthanide solution = lotion is preferred. A solvent containing a solvent and a flavonoid solvent, a fermentation solvent, and a guanamine eluent are used. A specific example of the organic f = used as a developing solution in a solvent of at least one type of organic solvent, which is used as a eluent, and an acid-based solvent, can be exemplified. The text is better as the solvent described after μ·. The i-based solvent, the alcohol-based solvent, or at least one step selected from the group consisting of the _-based solvent and the organic-soluble solution. Further, it is more preferably in the development of 201222149 39745pifl No. 100137021 Chinese manual without a scribe line Revision date: February 1, 2012, after the day of the 'lighting step, using an eluent containing an alcohol solvent or a 26-series solvent to clean. Further, it is more preferred to carry out the step of washing with an eluent containing a -ol after development. After the surface of the special material, a step of washing using a rinsing test containing a carbon number of 5 or more is carried out. Here, the use of the rinsing step after development is exemplified by a linear, branched, or cyclical alcohol, and specifically, it can be used: butanol, 2-butanol, and 3-methyl Butanol-butanol, i.pentanol, 2-decanol, p-hexanol, 4-methylol, 1-heptanol, 1-octanol, 2_p妒ia. 戍3-hexanol, 3- Heptanol, 3-octanol: octyl isopropanol, 2-heptanol, 2-octanol, -ol can be used, such as dihexanol, 2, methyl or butanol having a carbon number of 5 or more. %hex%, 4·methyl-2-pentanol, pentanol, and mixed=a variety of components may be mixed, or may be mixed with an organic solvent other than the above, and the liquid content is preferably 2; the water rate is preferably less than 10 More preferably, the mass % is less than 5%. The specific k is less than 3% by mass. 'Good development characteristics are obtained. The total amount of the stomach used is 3 or less, and the amount of the organic solvent is less than or equal to the amount of the organic solvent of the eluent. The optimum is 97 mass. The vapor pressure of the above 1 enamel liquid is preferably 0.1 kPa or more and 5 liters after the development of the machine. The second, 5 kPa or less, 3 kPa. Below. 藓 by the next 'best of 0.12 kPa or more, the wrong The vapour pressure of the eluent is set to be more than the secret coffee, and $116 201222149 39745pifl. Correction date: February 1, 2012, No. 100137021, the Chinese manual has no underline kPa, and the temperature uniformity in the wafer surface is improved. The rinsing caused by the rinsing is suppressed, and the uniformity of the size in the wafer surface becomes an appropriate amount of the surfactant in the eluent. In the rinsing step, the above-mentioned organic solvent-containing rinsing is used. The liquid-to-shadow crystal is cleaned. The cleaning material is green and has no limit. ',,,, for example, the following method can be applied: a method of continuously ejecting the eluent on a substrate rotating on a monetary scale. ), the substrate is immersed in the eluent--time-method (dipping method), and the method of spraying the surface of the substrate (spraying method) is used, wherein it is preferably processed by a spin coating method. 'After cleaning, the substrate is removed at 2 rpm to 4 rpm = to remove the eluent from the substrate. %. Further, the pattern forming method of the present invention can be developed after development using an organic developing solution Using alkali The developing solution can be used for development. For example, sodium hydroxide, potassium hydroxide, potassium sulphate, sodium sulphate, sodium sulphate, ammonia water, etc. can be used for the alkaline developing solution; ethylamine, positive = first grade Amines; secondary amines such as diethylamine and di-n-butylamine; tertiary amines such as triethylamine and methyldiethylamine; alcoholamines such as dimethylethanolamine and triethanolamine. Four grades of salt, tetraethyl hydroxide, etc.; 环状' bite and other cyclic amines, etc.], 8 diazabicyclo[5.4.ϋ]·7·+-rare, 5•diazepine An alkaline aqueous solution such as bicyclo[4,3·〇]-5-pinene. Further, an appropriate amount of an alcohol active agent may be added to the above alkaline aqueous solution for use. Interface The alkali concentration of the alkaline developer is usually 〇% by mass to 2% by mass. 117 201222149 39745pifl Revision date: February 10, 2012 For the Chinese manual No. 100137021, there is no scribe correction. The pH of the alkaline developer is usually ΐ〇·〇~15 (). It n is an α3% by mass aqueous solution of tetramethylammonium hydroxide. • 1 development method of the secret test method of the development method of the developer solution. Use organic 糸 乡. Preferably, the eluent in the step of washing with the eluent after alkaline development may also use pure water to add an appropriate amount of interfacial s or formation method, preferably after heating. (After: two display = the rinsing step after the sequel is left in _, and the heating step after baking to remove the township can be! == and the eluent. The rinsing step heats the pattern film == 仙Heating plate 'heating oven and other heating devices, 1 2: ? = hot temperature is usually _ ~ Fu, preferably the same, on the reduction plate will be pure according to the heating method, in the deletion = love brother 2 Usually 5 minutes, minutes or so. ... the obstacles, usually 30 minutes ~ 90 minutes left another 'post-baking, baking method, etc. Can also be used after heating more than 2 stages of the stage drying process, depending on / or post-exposure, a post-hardening step to post-heat the formed pattern film). ^Improve the hardening of the pattern film (by hard film treatment 118 201222149 39745pifl Correction period: February 10, 2012 is the No. 100137021 Chinese manual without a slash correction. This means that there is a wealth of light, weather resistance, film strength In the case of the hard film treatment, the pattern film on the substrate is further cured, and the film is further imparted with a dopant property, etc. The method of the hard film is preferably heat treatment ( For calcination), for example, a polymerization reaction in which post-heating of a polymerizable group remaining in a resin is carried out. The condition of the post-heat treatment is preferably 1 〇叱 6〇〇c, more preferably 200 ° C ~ 50 (TC, particularly preferably 2 ° ° ° ~ 45 °. 〇, and preferably a range of 1 minute ~ 3 hours, more preferably 丨 minutes ~ 2 hours The range is particularly preferably in the range of 1 minute to 1 +. The post-heating treatment can be carried out in several stages. In addition, in the present invention, the heat treatment is not performed, but the light irradiation or the radiation is high. Energy_riding, in the polymerization county where the polymer remains. _ Polymerization and the work ^ can be exemplified by electron beams, ultraviolet rays, xenon rays, etc., but are also determined by these methods. W limit (four) ~ / / ^ ^ ^ can The condition of the ^ line is preferably (1) more preferably 0.2 keV to 30 keV, particularly preferably 〇 5 k to 20 keV. The total dose of the electron beam is better &amp; 〇^W^, i40.01 μ〇/^ 2, c/cm2, 4; m; ~, 1 The substrate temperature when irradiating the electron beam is preferably 〇 佺 佺 〇 〜 〜 , , , , , , , , , , , , , , , , , , , , , 厥 厥 厥It is 0 kPa to 133 kPa 'better for G kpa~6() 佳佳〇 kPa~20 kPa. Seeking good for the prevention of oxidation of the polymer, the gas ring around the substrate 119 201222149 39745pifl is No. 100137021 The Chinese manual has no scribe line correction date: 2〇12年二月境 is preferably a heart body produced by the interaction of inert gas such as Ar, He, nitrogen, etc.; UV is used as a high energy line. (4) Material = area is better It is 16〇nm~4(K)nm, and its power ^M M (u mW cm-2~2_ mw em.2 two squares compared to 2S0°r^A^n the substrate temperature when the tooth is shot = preferably 2f〇 C~450C, more preferably for shoes~ gamma.c, for special plates: from the viewpoint of preventing oxidation of the polymer of the present invention, t, = the surrounding gas atmosphere is preferably an inert gas such as Ar, He or nitrogen. In addition, the pressure at this time is preferably from 0 kpa to 133 kpa. The clothes may be formed by simultaneous or sequential heat treatment and high-energy treatment such as light irradiation, to form a dura mater., ,, 3, ~ film, In order to dry the film thickness, it is possible to form a coating having a thickness of (10) _ 骐·· μ: η and a thickness of about 〇1_~3_ at the time of secondary coating, and the use of the pattern forming method of the present invention is not particularly limited. Preferably, as described above, for producing a low refractive index film, ', and therefore, the present invention also relates to the use of the above invention a pattern film obtained by a pattern forming method, that is, a low-refractive-index film. The present invention also relates to a light including the above-described low-refractive-index film. In addition, the present invention also relates to an optical device including such an optical device. Solid state 120 201222149 39745pifl For the Chinese manual No. 100137021, there is no slash correction. This revision period: February 12, 1st, February 1st photographic element. Hereinafter, a description will be made of such a low refractive index film (for example, an antireflection film). Among them, the following various physical properties of the low refractive index film are preferable, and it is preferably in the range of use of the low refractive index film, but is not limited thereto. <Low Refractive Index Film> 图案 The pattern film obtained by using the above composition exhibits an excellent ratio. Specifically, the refractive index of the pattern film (wavelength (8) (10)' - the measurement temperature is 25 C) is preferably 1.35 or less. Good for i knife ~i % ^ (a) · 33. In the above range, the antireflection film (antireflection film) to be described later is used in the pattern forming method of the present invention, the microlens for image sensor, the plasma display panel, the liquid disorder, and the organic electroluminescence. Antireflective film used. The lower the reflectance when used as an antireflection film, the better. Specifically, it is preferable that the mirror average reflectance of the wavelength region of ί = rrrnm is: y = = r, preferably 1% or less. —^ The haze of the antireflection film is preferably 3% or less (4) or less. In addition, the smaller the reflectance is, the more the single-layer type anti-reflection film is. If the refractive index of the transparent substrate is nG, the refractive index η of the anti-reflection film is preferably #, 121 201222149 39745pifl is the Chinese manual No. 100137021 No slash correction This correction date: February 1st, 2012 is 1/2 power with respect to the refractive index of the transparent substrate. For example, the refractive index of the glass is L47 to L92 (wavelength: 633 Å, measurement temperature: 25 C), so n of the single-layer anti-reflection film formed on the optical glass is preferably from 1/1 to 1.38. Further, the film thickness of the antireflection film at this time is preferably 〜10 μηη. In the case where the above film is used as a multilayer antireflection film, the film can be used as a low refractive index layer, and for example, a high refractive index layer, a transparent substrate can be contained under the film. At this time, a hard ytterbium formation refractive index layer may not be provided on the substrate. Alternatively, a medium refractive index layer may be provided between the high refractive index layers or the high refractive index layer and the hard coat layer 2.乂 乂 The following describes each layer of the multi-layer case in detail. 〇) Mapping of Low Refractive Index Layer: The layer comprises a pattern film obtained by using the composition of the present invention as described above. The refractive index and thickness of the low-refractive-index layer (0 refractive index is defined by the date of the fourth (four) (four) (four) film refracting, the ten-in-in, the measurement temperature is pit), that is, the low-refractive-index film (also = low refractive index) The refractive index of the layer) is set! 35 or less. ^ When the refractive index of the low-refractive-index film is i:, ::, when the poplar is a south-refractive-index layer, the anti-reflective effect can be surely set to 3 h34 or less, and particularly preferably. In addition, in the case of setting a plurality of layers of low refractive index ,, only 122 201222149 39745pifl is the Chinese specification of the No. 100137021, which has no scribe correction, and the date of revision: February 10, 2012, at least one of which has a refractive index within the above range. The value is fine. Further, in the case where the low refractive index layer is provided, it is preferable that the refractive index difference between the low refractive index layer and the high refractive layer is set to G.G5 or more in terms of obtaining a better reflection effect. value. By the difference in refractive index between the low refractive index layer and the high refractive index layer being 0.05 or more, the multiplication effect of the reflective film layer can be easily obtained, and the antireflection effect can be easily obtained more reliably. The value between the refractive index layer and the high refractive index layer is set to a value in the range of 0·1 to 0·8, and more preferably set to a value within the range. Dry (ii) Thickness The thickness of the low refractive index layer is not particularly limited, and for example, it is preferable to add rnn to 300 nm. When the thickness of the low refractive index layer is 2 〇 1 or more, the adhesion to the high refractive index film as the substrate is obtained in reality, and if the thickness is 300 nm or less, it is difficult to cause light interference, and the capacitance is more sure. Get 抗f anti-reflective effect. Therefore, it is more preferable to set the thickness of the low refractive index layer to 20 nm to 250 nm, and more preferably to 2 〇 nm to 2 〇〇 nm. Further, in the case where a plurality of layers of low refractive index reed are provided in order to obtain higher antireflection properties to form a multilayer structure, the total thickness thereof may be 2 Å 300 nm. (2) Still refractive index layer The curable composition for forming the refractive index layer is not particularly limited, and is preferably contained. a single or two of an oxygen resin, a material, a resin, a melamine resin, an alkyd resin, a cyanate resin, an acrylic resin, a polyester resin, a urethane resin, a decyl oxide resin, or the like Kind to 123 201222149 39745pifl Revision date: February 1st, 2012 is the first drawing of the No. 37021 Chinese manual without a slash correction. If these resins are used, a strong film can be formed as the emissivity layer, and as a result, the anti-reflective scratch resistance can be remarkably improved. However, the "normal" of these resins alone has a refractive index of 145 to 162, which is insufficient for obtaining high antireflection performance. Therefore, the alumina is set to have a refractive index of i 7 () to 22 () by blending inorganic particles having a refractive index, for example, metal oxide particles. Further, as the hardened form, it is possible to use a hardenability which can be thermally cured, ultraviolet-cured, or electron beam-cured, and it is more preferable to use a productivity and a good strand curable composition. The thickness of the 咼 refractive index layer is not particularly limited, and is, for example, preferably 2 〇 nm 30'OOOnm. When the thickness of the high refractive index layer is 2 〇 mn or more, when the = refractive index layer is combined, the anti-reflection effect or the adhesion to the substrate is reliably obtained, and the thickness is 30 Å or less. ^ With the interference of the production of light, it is easy to obtain the anti-reflection effect more surely. Therefore, the second is to set the thickness of the high refractive index layer to 2 〇 nm 〜1, and 〇(8) to beat the melon, especially:=5 〇 nm 〜5 〇〇 nm. Further, in order to obtain a multilayer antireflection layer and a plurality of high refractive index layers to form a multilayer structure, the thickness of the emitter may be 2 〇 nm to 3 〇 nm. Further, in the case where a hard coat layer is provided between the high-fold sore and the substrate, the degree of the high refractive index layer can be made 20 nm to 300 nm. (3) Hard coat layer The material of the (4) hard coat layer is limited by the antireflection film of the present invention. Such a material may be a single type or a combination of two or more types such as a diarrhea, an acrylic resin, an A-amine resin, and an epoxy resin. 201222149 Revision date: February 10, 2012, 39,745 pifl mm 100137021 In addition, the thickness of the hard coating layer is not particularly limited, and it is preferably set to i 〜 50 μιη, and more preferably set to 5 divisions ~ ι 〇. When the thickness of the hard coat layer is 々2"μηι or more", it is easy to more reliably improve the name of the antireflection film to the substrate. When the thickness is 50 μm or less, it is easy to form uniformly. (4) Substrate OG ▲I ϋ(4) The type of the substrate to be used for the low-refractive-index film is not particularly limited. Ylj includes glass, polycarbonate, (4) resin, ^ (triacetylcellulose plate, and Shixi wafer. The film-forming film including the substrates can be widely used in a lens portion of a camera, a screen display portion of a television (cathode ray tube, Cat=ay tube, CRT), a light sheet or a photographing device in a liquid crystal display device. In the antireflection, an excellent antireflection effect is obtained. (4) Μ = = The pattern film obtained by using the composition used in the pattern formation method can also be used as an optical device (for example, a microlens film or a retardation film). The composition used in the method of forming the reinsurance side can be particularly suitable as a U lens (wherein the concept of the microlens includes the application of the microlens array for the purpose of coating. Heart) ~ obtained by the method of the present invention __ _ is formed using a photosensitive composition, and has a low refractive index and a small degree of resolution of the development residue. Therefore, it is set as the _ extreme solution in the following areas. 201222149 39745pifl Revision date: February 1, 2012 For the ugly 37021 towel rules duck no i dirty correction this two kinds of work = movement (. ffice aut_ti〇n, 〇 A) machine, LCD 7 mobile phone, projector, etc. liquid crystal display components direct = two components Ordinary crystal carrier - fine optical core image, fiber optic connector, etc., which are particularly intended to suppress light reflection. Hunting uses the pattern forming method of the present invention, and the microlens == invented pattern film can achieve high product yield The high-definition microlens whose surface is covered by the film having the above characteristics is simply formed. [Examples] Hereinafter, the present invention will be described in more detail, but the present invention is not limited by the examples. Preparation of the composition > The components shown in the following Tables 1 to 3 were dissolved in the following table 丨 to Table 3, and the profit path was (). 2 A PTFE filter was introduced.仃Filtering' was used to prepare the photosensitive composition of the example 丨~Example 32 and the comparative example 比较 and the comparative example 2. The compound (B) and the symbol of the compound (C) in Table 1 - Table 3 as a specific example of each component. And corresponds to the above components. Hollow or porous plasmid The following commercial products are used. & Snowtex MIBK-SD-L: 30% by mass dispersion of porous two-gas fossils manufactured by Nissan Chemical Co., Ltd. Snowtex MIBK-ST: Porous oxidizing manufactured by Nissan Chemical Co., Ltd. 2020% by mass dispersion S leg ax SP-PN(b) ··Nippon Mining Co., Ltd. hollow cerium oxide powder 126 201222149 39745pifl No. 100137021 Chinese manual without scribe correction This revision date: 2012 February 10 曰Surulia 2320: 20% by mass dispersion of hollow silica dioxide manufactured by Nippon Kasei Chemical Co., Ltd. Surulia 1110: 20% by mass dispersion PL-1- of hollow silica dioxide manufactured by Nippon Chemical Co., Ltd. IPA: 12.5 mass% dispersion of porous cerium oxide manufactured by Fuso Chemical Co., Ltd. PL-1-TOL: 40% by mass of porous cerium oxide manufactured by Fuso Chemical Co., Ltd. Dispersion PL-2L-PGME: Fuso Chemical Co., Ltd. 20% by mass dispersion of porous cerium oxide, PL-2L-MEK: 20% by mass of porous cerium oxide manufactured by Fuso Chemical Co., Ltd. AERODISP G1220 : Porous cerium oxide manufactured by EVONIK 20% by mass dispersion liquid AERODISP 1030 : 20% by mass dispersion liquid of multi-layer L-type cerium oxide manufactured by EVONIK Co., Ltd. 〇 OSCAL: 20% by mass dispersion liquid dispersant of hollow silica dioxide manufactured by Nippon Chemical Co., Ltd. The following commercial products are used. EMULSOGEN COL-020 : Disperbyk-101, an alkyl ether carboxylic acid manufactured by Clariant: Polyamine amine phosphate PelexSS-L manufactured by BYK Chemie: sodium alkyl diphenyl ether disulfonate manufactured by Kao Corporation 127 201222149 mo Im: (Niti-(Nl 0&lt;N: step on S3T _ piece w cui} fla挨»Ka 扒 扒-fi-lsltNo /. e ι ο o 濉 濉 υ · Β, ιτ)? 6ε organic solvent (D) (quality PGMEA (616) PGMEA/PGME=90/10 (mass ratio) (580) PGMEA (530) | PGMEA/cyclohexanone = 80/20 (mass ratio) ί (715) PGMEA 1 (809.5) PGMEA/lactic acid Ethyl ester = 70/30 (mass ratio) (833) PGMEA/methyl ethyl ketone = 60/40 (mass ratio) (900) Cyclohexanone / ethyl lactate = 80/20 (mass ratio) (620) PGMEA /cyclohexanone=70/30 (mass ratio) (680) PGMEA (670) PGMEA/PGME=90/10 (mass ratio) (914) PGMEA (874) Particle dispersant (A') (mass) § 〇 Ο 〇^ mouth 8 s υ ω 1 1 1 Disperbyk-101 (0.5) 1 1 1 1 Pelex SS-L (1.5) 1 1 Compound (C) (mass) S) C-2 (17) C-3 ( 15) C-4/C-13=80/20 (mass ratio) (21.5) C-5 (14.5) C-6/C-7=60/40 (mass ratio) (15) C-7 i (28 ) C-8 I (29) C-9 (17) C-10 (25) C-11/C-21=9 (V10 (mass ratio) (5.8) C-12 (5.1) Compound (B) (mass) - ώ C ff) /-~N • CQ ✓ B-4 (0.5) B-5 (0.5) v〇ώ w 〇〇^ PQ C 〇\ ^ 'm CQ w —B-2 (0.2) , On CQ 〇Vw〆 hollow or porous particles (A ) (mass) Surulxa 2320 (350) Surulia 2320 (400) Surulia 1110 (450) Snowtex MIBK-SD-L (263) PL-2L-PGME/Surulia 2320 (75/100) OSCAL (150) SiliNax SP-PN (b) 1 (70) AERODISPG1220: (350) AERODISP 1030 (400) AERODISP 1030 (300) Surulia 1110 (80) Surulia 2320 (120) ♦ Hi Example 2 m -1 Example 4 Example 6 Example 7 〇〇¥ (4) Example 9 Example 10 Example 11 Example 12 00&quot; 201222149 [nollfiN Zhuang (NIOZ :s&gt;[n3I injury} 〇12 21001濉_υί-?6ε organic solvent (D) (mass) PGMEA/cyclohexanone=90/10 (mass ratio) (790) PGMEA/cyclohexanone = 90/10 (mass ratio) (630) Ethyl lactate (730) 4-methyl-2-pentanone (670) Cyclohexanone (520) Butyl lactate (765) Dipropylene glycol monomethyl ether (882.5) Dipropylene glycol dimethyl ether (900) Diethylene glycol monobutyl ether acetate (660) Ethylene glycol monomethyl ether Acid ester (829.5) Diethylene glycol dimethyl ether (912) 3-Ethoxypropionate ethyl ester (640) Particle dispersant (A') (mass parts) 1 1 1 1 1 1 1 1 1 Pelex SS- L (0.5) 1 1 Compound (C) (parts by mass) C-13 (8.5) C-14/C-18=50/50 (mass ratio) (19) V 〇〇UW C-16 (25) — 0C C-18 (7.5) C-19 (3.7) Ο ^ CN 〇〇0C C-21/C-22=l0/90 (mass ratio) (39) C-22 (19.5) C-23 (12.7) CJ W Compound (B) (parts by mass) B-4 (1.5) CQ ώΰ CQ 〇〇B-9 (2.5) 1 Bl 1 (1.3) CN ^ ώ w B-4 (0.5) B-5 (0.3) PQ Hollow or Porous Particles (A) (mass) Surulia 2320 (200) Surulia 2320 (350) Snowtex MIBK-SD-L (250) Snowtex MIBK-ST (300) PL-2L-MEK (450) PL-l-IPA ( 225) PL-l-TOL i (112.5) SiliNax SP-PN(b) (70) Surulia 2320 (300) Snowtex MIBK-ST (150) PL-2L-MEK (75) PL-1-IPA (450) Example 13 Example 14 Example 15 Example 16 Example 17 Example 18 Example 19 Example 20 Example 21 Example 22 Example 23 Example 24 6-201222149 πποιΠΓ(Ν^&lt;Νίο&lt;Ν: hi-hat 乐 lrslOArnlool«脉 cf^寸卜6ε &lt; Umbrella ¥铋) (a) i#姨姨 (0E B-key ^1^&amp;--ε (006) (099) (3⁄4 (0Ε lflo^®- (0£ 温韹«0毛卜硪^&amp;--£ (099) 5S) 1&amp; (S6) 遛 «0 Helmets (099) Ι5®-^Ί# (Umbrella 峒铋) (-V) 蘅 屮趄 屮趄 (Golden ¥ 铋) (3) Rong Ming An (Umbrella 蛔铋) «) Rong Umbrella (per ¥铋) (V)屮趄铋_3^喵喵(sS3 (61) 2=11-铋)0§/.=lrn-CJ/9&lt;Nu (s αύ (s 03 ύ (δ 83 (6) &lt;n3 (06)03 (2)s (szz) Ίοι-ljd (I) 8,ffl (08)(q)zd-ds xeNHis s6-e (ooo 03.21 / ,ΓΝΙΪ ο),m (OS olll.2Isns oozf swallow ίκ (2) &lt;Na S&lt;N)osl dslaoawv (05 sins s6ώ (1) I-OQ sε-a (01)6-a (00ε) 03.21 ( OS inch) 01 ins (05 Hs-wss XSAVOUS 6&lt;Ni#v ιε¥lk p!f 香铋si 201222149 39745pifl is the first leg of the 37G21 Chinese _ book without loss correction date: February 10, 2012 <low Preparation of Refractive Index Pattern Film ^ ^ Rotating coating method The above-mentioned inductive composition was applied to a 曰曰 曰曰 0, and then heated on a hot plate for 2 minutes to obtain a film thickness of 0.3 μm. The photosensitive film obtained by using the i-line stepper FPA-3000i5+ (manufactured by Canon) is a dot array pattern having a size different from 0.5 square micron to 1 〇 0 square micrometer. The mask was exposed to light at a wavelength of 365 nm. The photosensitive film after the above exposure was subjected to immersion development at 23 ° C for 60 seconds using a developing solution shown in Table 4 below. The device was rinsed with pure water using the eluent shown in Table 4 below, and then washed with pure water to obtain a transparent pattern with a film thickness of 〇·3 μιη. 〇131 201222149 39745pifl ...shi is the Chinese manual No. 100137021 No dirty corrections This revision date: February 1, 2012, Table 4 ‘^性 and residue evaluation> 曰立::: Transparent pattern, using Measured length reading (made by S_7800H), it is observed at 30,000 times on the wafer. 132 201222149 39745pifl is the 10013702] Chinese manual without painting _^^ Revision date: 2〇12年2月〇日 :=: The most CM is analytical and shown in Table 5. The lower the value of this minimum size, the higher the resolution. In addition, the case where the residual fishing is observed in the vicinity of the pattern is denoted by 〇, and the same is shown as x, and the measurement of the refractive index of the film of the low refractive index pattern is not applied. On the tree wafer, 〇, f is heated on the hot plate for 2 minutes to obtain transparency. “The rounding polarizer (WE) manufactured by 'j!r pan company, rate. / « at a wavelength of 633 mn, 25. The values measured under the armpits are shown in Table 5 as the results of the refraction. 133 201222149 39745pitl is the Chinese manual of No. 100137021 without a slash correction. This revision date: February 10, 2012 曰 Table 5 Refractive Index Analytical Residue Example 1 1.30 30 μηι 〇 Example 2 L28 50 μηα 〇 Example 3 1.26 70 μπι 〇 Example 4 1.29 30 μηη 〇Example 5 1.32 40 μηι 0 Example 6 1.33 50 μτη 〇 Example 7 1,30 80 μηι 〇 Example 8 1.32 70 μηη 〇Example 9 1.32 40 μηα 〇Example 10 1.32 50 μηι 〇Example 11 1.29 60 μηι 〇Example 12 1.33 50 μπι 〇 Example 13 1.34 40 μηα 〇 Example 14 1.32 30 μπι ο Example 15 1.33 80 μηι 〇 Example 16 1.33 70 μηι 〇 Example 17 1.34 50 μπι 〇 Example 18 1.32 50 μηη 〇 Example 19 1.33 30 μηι 〇 Example 20 1.32 40 Ππι 〇Example 21 1.30 60 μπι 〇 Example 22 1.27 60 μηι 〇 Example 23 1.29 50 μπι 〇 Example 24 1.26 70 μπι 〇 Example 25 1.28 80 μηι 〇 Example 26 1.29 60 μηι 〇 Example 27 1.29 50 μπι 〇 Example 28 1.27 50 μπι 〇 Example 29 1.29 40 μπι 〇 Example 30 1.27 50 μιη 〇 Example 31 1.29 40 μηι 0 Example 32 1.27 50 μηη 〇Comparative Example 1 1.45 30 μτη 〇Comparative Example 2 1.35 No pattern formation was impossible. It can be seen from the results of Table 5 that high sensitivity can be obtained in the case of using the photosensitive composition of the present invention. A pattern having a low refractive index and a small development residue is formed. 134 201222149 39745pifl No. 100137021 Chinese manual without scribe correction This revision date: February 10, 2012 On the other hand, Comparative Example 2 containing no compound corresponding to the compound (C) of the present invention cannot be resolved (patterning) (In Table 5, the residue of Comparative Example 2 cannot be measured because the pattern cannot be formed). [Simple diagram description] [Main component symbol description] No 0 135 201222149 Chinese manual without line correction This revision date: February 10, 2012 invention patent specification (This manual format, order 'Do not change any more' ※Do not fill in the mark) ※Application number: ※Application曰: (β·rQ'lZ&quot; Classification: I. Name of the invention: (Chinese/English) Pattern forming method, pattern forming material, photosensitive film using the same, pattern film, low refractive index film, optical device, and solid-state imaging element PATTERN FORMING METHOD , PATTERN 〇FORMING MATERIAL, AND PHOTOSENSITIVE FILM, PATTERN FILM, LOW REFRACTIVE INDEX FILM, OPTICAL DEVICE AND SOLID-STATE IMAGING DEVICE USING THE SAME II. Abstract: The present invention provides a high resolution to form a low refractive index and develop a pattern forming method of a pattern having a small amount of residue, a pattern forming material, a ruthenium photosensitive film using the same, a pattern film, a low refractive index film, an optical device, and a solid-state photographic element. The pattern forming method of the present invention includes: using a photosensitive composition a step of forming a photosensitive film, exposing the photosensitive film And a step of developing using a developing solution containing an organic solvent, wherein the photosensitive composition contains (A) hollow or porous particles, (b) a compound which generates an active species by irradiation with active rays or radiation, And (C) using the above-mentioned effects of white, !, to reduce the dissolution in the developing solution containing the organic solvent 201222149, 39745pifl is the Chinese manual of the No. 100137021 No-line correction This revision date: February 10, 2012 III. English invention summary·· A pattern forming method, a pattern forming material, a photosensitive film, a pattern film, a low refractive index film, an optical device and a solid-state imaging device using the same are provided in the invention, which can form patterns having low The film forming method of the invention includes a step of using a photosensitive composition to form a photosensitive film, a step of exposing the photosensitive film, and a step of developing by using a developer containing an organic Solvent. The Atomic composition includes (A) hollow or porous particles, (B) a compound which produces active species by the irradiation of active rays or radiation rays, and (C) a compound for lowering the solubility in the developer containing an organic solvent by the effect 2 201222149 39745pifl Amendment date: February 1, 2012, No. 100137021 Chinese manual without scribe correction. 7. Scope of application: ^ Pattern formation method, including: using photosensitive composition to form a step of exposing the photosensitive film, a step of exposing the photosensitive film, and (4) using a display containing an organic solvent, and the photosensitive composition contains (A) a hollow or porous particle, (8) by active light or A compound which produces an active species by irradiation of a rose ray, and (c) a silk which uses the above-mentioned active species to reduce the solubility of a substance containing age-availability. 2. The pattern forming method according to claim 1, wherein the hollow or porous particles have a refractive index of 1.10 to 1.40. 3. The pattern forming method according to claim 1, wherein the compound (C) is a polymerizable compound. 4. The pattern forming method according to claim 3, wherein the polymerizable compound contains a low molecular weight compound having a molecular weight of 2,000 or less. The pattern forming method according to the third aspect of the invention, wherein the polymerizable compound contains a resin having a silky group. 6. The pattern forming method according to claim 5, wherein the resin has a radical or cationically polymerizable repeating unit. 7. The pattern forming method according to claim 6, wherein the radical or cationically polymerizable repeating unit is a repeating unit represented by any one of the following formulas (1) to (3). ·· 136 201222149 39745pifl is the Chinese manual of No. 100137021 without a slash correction. Amendment date: February 10, 2012 (3} In the above formulae (1) to (3), A21, A22 and A23 each independently represent an oxygen atom, a sulfur atom or -N(R41)-, and R41 represents a hydrogen atom or a dahlia; G21, G22 and G23; Respectively, respectively, represent a divalent linking group; X21 and Z21 each independently represent an oxygen atom, a sulfur atom or -N(R42)-, and R42 represents a hydrogen atom or an alkyl group; γ21 represents a single bond, an oxygen atom, a sulfur atom, and a benzene extension. Or a group of -N(R43)-, R43 represents a hydrogen atom or an alkyl group; and R21 to R4G each independently represent a hydrogen atom or a monovalent substituent. For example, in the drawing # in any of the items 5 to 7 of the patent application, the above-mentioned resin is a pattern forming method of a tree atom or a fluorine atom in the side chain. The above resin contains a repeating unit represented by the following formula: VIII, formula 14) or formula (5): 137 201222149 39745ριίΊ is the 丨 简 中文 Chinese manual without a slash correction. Amendment date: February of the moving year 10th In the above formula (4), Ri, R2 and R3 each independently represent a hydrogen atom, an alkyl group or an aryl group; and R5 each independently represents a hydrogen atom, an alkyl group or a decyloxy group; and R6, R7 and R8 are each independently And an alkyl group, a decyloxy group or X1 represents a divalent linking group; 11 represents an integer of 0 to 20; in the above formula (5), R1, R2 and R3 are the same as W and R2 in the above formula (4) and R3 is synonymous; X2 represents a divalent linking group; and R9 represents an alkyl group substituted with a fluorine atom. 10. The pattern forming method according to claim 9, wherein the repeating unit represented by the above formula (4) or (5) is represented by the following formula (6) or formula (7) Repeat unit: Y12^14 (7) 138 201222149 A 39745pifl is the Chinese manual of No. 100137021. There is no slash correction. This revision period: February 12, 2011 February ι 〇 In the above formula (6), R10 represents a hydrogen atom or an alkyl group; R11, R12 and R13 each independently represent an alkyl group, a decyloxy group or an alkenyl group; A11 represents an oxygen atom or a sulfur atom; R15 represents a hydrogen atom or an alkyl group; and Y11 represents an alkylene group, an alkylene group or a combination thereof. In the above formula (7), () A12 represents an oxygen atom, a sulfur atom or -N(R15)-; Y12 represents an alkylene group, an alkylene group or a combination thereof; and R14 represents an alkyl group substituted by a fluorine atom; R10 and R15 have the same meanings as R10 and ru in the above formula (6). The pattern forming method according to claim 3, wherein the compound (C) is a compound having a structure represented by the following formula (A): 6 令bx+ (a) the above formula (A), Ru represents a monovalent or divalent linking group monovalent substituent; in the case where Ru is a single bond or a divalent linking group, the above M bond or divalent linking group and other compounds of the compound (c) Early X&quot; indicates a single bond or a divalent linking group; . . . Rp represents a monovalent group containing a polymerizable group. 12. The method for forming a pattern as described in the patent application 帛n_ 139 201222149 39745ρίΠ is the Chinese manual of the table 100137021. There is no slash correction. This revision period: February 2012 has the above formula (A) The surname of the above-mentioned resin, which contains the sigma of the sylvestre sylvestre 70 in the main chain of the above-mentioned resin, is a tree wax, 13. The method for forming a dry pattern of the Xu table according to the above formula (4) in the scope of the patent application u, Extending the field base, stretching the base, extending the aryl group, or a combination thereof. Shen Kengji, 14. The method of forming a pattern according to the scope of application of the patent application u', wherein the base is described in the above general term. , "A" is not a price to take 15. As in the above-mentioned patent (4), in the above formula (A), r ^ „ 口示~ Kanwan to 'their alkoxy 11 table shouting, female, Silk, aryl or hydrazine. The method of forming a pattern in the first to seventh aspects of the patent application 'the towel further contains (A), (iv) a dispersing agent., a 17. as claimed in the scope of claim 1 to And a pattern forming method for the galvanic coating of the microlens, wherein the ϋιΐϋ forming material is a photosensitive composition containing: (A) and is irradiated with active light or radiation, And (C) utilizing the action of the above-mentioned active species to reduce the dissolution of the compound containing the organic solvent (4). The pattern is formed by the pattern forming material described in the application of the special item (4). 7 =0. The film is obtained by the pattern forming method as described in any one of the above-mentioned claims. The second low-refractive-index film is the same as the sun-filled item 140 201222149 39745pifl No. 100137021 Chinese manual without line correction This revision period: 2012 A patterned film as described in February 10. 22. An optical device comprising a low refractive index film as described in claim 21 of the patent application. 23. A solid state photographic element, comprising as described in claim 22 Optical device 201222149 39745pifl For the Chinese manual No. 100137021, there is no slash correction. This revision period: February 10, 2012. 4. Representative representative map: (1) The representative representative of the case is: No. (2) Representative map A brief description of the component symbols: jttk 〇5. If there is a chemical formula in this case, please reveal the chemical formula that best shows the characteristics of the invention: