TW201221540A - Condensed aromatic compound, organic semiconductor material and organic transistor element - Google Patents

Condensed aromatic compound, organic semiconductor material and organic transistor element Download PDF

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TW201221540A
TW201221540A TW100136900A TW100136900A TW201221540A TW 201221540 A TW201221540 A TW 201221540A TW 100136900 A TW100136900 A TW 100136900A TW 100136900 A TW100136900 A TW 100136900A TW 201221540 A TW201221540 A TW 201221540A
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Hiroki Terai
Yasuyuki Kurita
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Sumitomo Chemical Co
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Abstract

An objective of this invention is to provide an organic compound having sufficiently small reallocation energy. For attaining this objective, this invention provide a condensed aromatic compound represented by the following formula (2), or a high-polymer compound having a divalent group obtained by removing two hydrogen atoms from the condensed aromatic compound represented by the following formula (2) as a repeated unit. The divalent group may constitute a part of a repeated unit of the high-polymer compound. (in this formula, ring A, ring B and ring C respectively independently represents an aromatic ring, X<SP>1</SP>, X<SP>2</SP>, X<SP>3</SP>, X<SP>4</SP>, X<SP>5</SP>, X<SP>6</SP> and X<SP>7</SP> respectively independently carbon atom or nitrogen atom, R<SP>2</SP> respectively independently represents hydrogen atom, alkyl group, alkoxy group, alkylthio group, aryl group, heteroaryl group, aryloxy group, arylthio group, alkenyl group, alkynyl group, amino group, silyl group, halogen atom, acyl group, acyloxy group, amide group, carboxyl group, nitro group or cyano group, two R<SP>2</SP> may be coupled to each other to form a ring structure.)

Description

201221540 六、發明說明: 【發明所屬之技術領域】 本發明係關於一 芳香族化合物及以該 料之有機電晶體元件 【先前技術】 缩有機半導體材料使用之縮合 縮5方香族化合物作為有機半導體材 0 有機電致發光(Electroluminescence : EL)元件 '有 機電晶體元件、太陽電池、光感測器等之各種有機薄膜元 件近年來之研究極多。其中有機薄膜元件之性能係依存於 其使用的有機半導體材料之特性,因此為改善有機薄膜元 件的特性’最好提高有機半導體材料之電荷遷移率。 在非專利文獻1中揭示,有機半導體材料中決定電荷 遷移率的特性之一為其重定向能量,重定向能量越低之有 機半導體材料的電荷遷移率越高。 在非專利文獻2中揭示’以聚(3-己基噻吩-2, 5-二基) 作為有機半導體材料製造之有機電晶體元件,可具有高的 電荷遷移率及開關比。 在非專利文獻3中揭示,聚(9, 9-二辛基蕹-2, 7-二基) 之薄膜’可表現較高之電荷遷移率及較弱之電場相依性。 然而’上述有機化舍物等,已往以來作為有機半導體 材料使用之有機化合物,重定向能量並不夠小。因此,若 月匕^供重定向能量夠小之有機化合物,在以此作為有機半 導體材料時’即可實現獲得更高之電荷遷移率。 [先前技術文獻] 5 323560 201221540 非專利文獻 非專利文獻 1 : Chemical review, 2004 年,第 104 卷, P. 4971 至 5003 非專利文獻 2 : Applied Physics Letters, 1996 年,第 69 卷,p. 4108 至 4110 非專利文獻 3 : Applied Physics Letters, 1998 年,第 73 卷,p. 1565 至 1567 【發明内容】 [發明欲解決之課題] 本發明為解決上述歷來之問題者,其目的在提供一種 重定向能量夠小之有機化合物。 [解決課題之手段] 亦即,本發明係提供一種下述式(1)所示之化合物,201221540 VI. Description of the Invention: [Technical Field] The present invention relates to an aromatic compound and an organic transistor element of the same material. [Prior Art] A condensation semiconductor compound used for shrinking an organic semiconductor material as an organic semiconductor Materials 0 Organic electroluminescence (EL) devices Various organic thin film devices such as organic transistor components, solar cells, and photosensors have been studied in recent years. Among them, the properties of the organic thin film device depend on the characteristics of the organic semiconductor material used therein, and therefore it is preferable to improve the charge mobility of the organic semiconductor material in order to improve the characteristics of the organic thin film device. Non-Patent Document 1 discloses that one of the characteristics of the organic semiconductor material that determines the charge mobility is its reorientation energy, and the lower the reorient energy, the higher the charge mobility of the organic semiconductor material. Non-Patent Document 2 discloses that an organic transistor element produced by using poly(3-hexylthiophene-2,5-diyl) as an organic semiconductor material can have a high charge mobility and a switching ratio. It is disclosed in Non-Patent Document 3 that a film of poly(9,9-dioctylfluorene-2,7-diyl) can exhibit a higher charge mobility and a weaker electric field dependency. However, the organic compound used in the past as an organic semiconductor material, the reorientation energy is not sufficiently small. Therefore, if the organic compound having a small energy for reorientation is used as the organic semiconductor material, a higher charge mobility can be achieved. [Prior Art Document] 5 323560 201221540 Non-Patent Document Non-Patent Document 1: Chemical review, 2004, Vol. 104, P. 4971 to 5003 Non-Patent Document 2: Applied Physics Letters, 1996, Vol. 69, p. 4108 ~4110 Non-Patent Document 3: Applied Physics Letters, 1998, Vol. 73, p. 1565 to 1567 [Disclosure] The present invention has been made to solve the above problems. An organic compound with a small enough energy to direct. [Means for Solving the Problem] That is, the present invention provides a compound represented by the following formula (1),

[式中,E各為獨立,表示氫原子、烧基、燒氧基、烧硫基、 芳基、雜芳基、芳氧基、芳硫基、稀基、快基、胺基、梦 基、鹵素原子、醯基、醯氧基、酿胺基、竣基、硝基、氰 基、硼酸殘基、硼酸酯殘基或錫烷基。Q1表示由下述式(2) 所示之化合物中去除2個氬原子後之2價基, 323560 (2) 201221540Wherein E is independently, and represents a hydrogen atom, an alkyl group, an alkoxy group, a sulfur-containing group, an aryl group, a heteroaryl group, an aryloxy group, an arylthio group, a dilute group, a fast group, an amine group, and a dream group. A halogen atom, a fluorenyl group, a decyloxy group, a arylamino group, a fluorenyl group, a nitro group, a cyano group, a boronic acid residue, a boronic acid ester residue or a tin alkyl group. Q1 represents a divalent group obtained by removing two argon atoms from a compound represented by the following formula (2), 323560 (2) 201221540

BB

\式中,A環、B環及C環各自獨立,表示芳香環。χ1、χ2、 乂3、^]6及义7各自獨立’表示碳原子或氮原子。尺2 各自獨立’表示氫原子、烧基、燒氧基、燒硫基、芳基、 雜芳基、芳氧基、芳硫基、婦基、炔基、胺基、石夕基、齒 素原子、醯基、醯氧基、醯胺基、羧基、硝基或氰美。其 中々2個之R2可互相鍵結形成環狀結構。}〇q1為複數^固時, 該等可為相同或不同。Q2為式:丨式令,Rla及Rit 各為獨立’表示氫原子、燒基、芳基、雜芳基或氛基。} 所示之基、式_CEC_所示之基或2價之芳香族基 數個時,該等可為相同或不同。η表示1以上之整數:ml 表^ 0至10之整數。蛇表示〇至1〇之整數。惟n個之釘 不能全部為h為2以上時,n個之ml,可為相同或不同。 η個之m2,可為相同或不同。] 同時,本發明亦提供含有前述化合物之組成物、薄膜 或有機半導體材料。 、 此外,本發明亦提供一種具備前述薄膜作為有機半導 體材料之有機薄膜元件或有機電晶體元件。 其中,本發明中之「有機半導體材料」,係指其中包 323560 7 201221540 含表現半導體作用之有機化合物的材料之意。其中,表現 半導體作用之有機化合物本身亦包含在有機半導體材料之 中〇 本發明中之「有機薄膜元件」,係指具備包含有機化 合物之薄膜的元件之意。 此外,本發明中之「有機電晶體元件」,係指具備包 含有機化合物之薄膜的電晶體元件之意。 [發明之效果] 由於本發明之化合物的重定向能量夠小,因此在作為 有機薄膜元件之有機半導體材料方面具有極大用途。 【實施方式】 [發明之實施形態] 以下,再依照須要參照圖面,對本發明之較佳實施形 態詳細說明。又,在圖式之說明中,相同要件以相同之符 號表示,在重複時其說明予以省略。 &lt;化合物&gt; 本發明之化合物係一種低分子或高分子縮合芳香族化 合物,其具有吡咯環上由芳香環縮合之構造,且具有該吡 咯環中所含之氮原子同時包含在其他2個芳香環中之平面 性化學構造。該平面性之化學構造,有利於化合物重定向 能量之降低。更具體言之,本發明之化合物,係上述式(2) 所示之縮合芳香族化合物、或由式(2)所示之縮合芳香族化 合物去除2個氫原子之2價基作為重複單位之高分子化合 物。前述2價之基可為構成高分子化合物的重複單位之一 8 323560 201221540 部分者。 示 亦即,本發明之化合物如式(1)所In the formula, the A ring, the B ring, and the C ring are each independent, and represent an aromatic ring. Χ1, χ2, 乂3, ^]6, and 7 are each independently 'representing a carbon atom or a nitrogen atom. Dimensions 2 are each independently 'representing hydrogen atom, alkyl group, alkoxy group, sulfur-burning group, aryl group, heteroaryl group, aryloxy group, arylthio group, aryl group, alkynyl group, amine group, Shishiji, dentate Atom, sulfhydryl, decyloxy, decylamino, carboxy, nitro or cyanamide. Among them, two R2's can be bonded to each other to form a ring structure. } When q1 is a complex number, these may be the same or different. Q2 is a formula: 丨 令, Rla and Rit are each independently 'representing a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or an aryl group. } When the group shown, the group of the formula _CEC_ or the number of aromatic groups of two valences are used, these may be the same or different. η represents an integer of 1 or more: ml represents an integer of 0 to 10. The snake represents an integer of 1〇. However, when n nails cannot all be h or more, n of ml may be the same or different. η m2, which may be the same or different. Meanwhile, the present invention also provides a composition, film or organic semiconductor material containing the aforementioned compound. Further, the present invention provides an organic thin film element or an organic transistor element comprising the above film as an organic semiconductor material. Here, the "organic semiconductor material" in the present invention means a material in which 323560 7 201221540 contains an organic compound which functions as a semiconductor. Among them, the organic compound which exhibits the action of the semiconductor itself is also included in the organic semiconductor material. The "organic thin film element" in the present invention means an element having a film containing an organic compound. Further, the term "organic transistor element" as used in the present invention means a transistor element having a film containing an organic compound. [Effects of the Invention] Since the reorientation energy of the compound of the present invention is small enough, it has great use in the organic semiconductor material as an organic thin film element. [Embodiment] [Embodiment of the Invention] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. Further, in the description of the drawings, the same elements are denoted by the same reference numerals, and the description will be omitted when they are repeated. &lt;Compound&gt; The compound of the present invention is a low molecular or high molecular condensed aromatic compound having a structure in which a pyrrole ring is condensed by an aromatic ring, and a nitrogen atom contained in the pyrrole ring is simultaneously contained in the other two A planar chemical structure in an aromatic ring. This planar chemical structure facilitates the reduction of compound reorientation energy. More specifically, the compound of the present invention is a condensed aromatic compound represented by the above formula (2) or a condensed aromatic compound represented by the formula (2), wherein a divalent group of two hydrogen atoms is removed as a repeating unit. Polymer compound. The above-mentioned divalent group may be one of the repeating units constituting the polymer compound 8 323560 201221540. That is, the compound of the present invention is as shown in the formula (1)

E Q1·E Q1·

m2 .M2.

E (1) /其 ,表示氫原子H烧氧基、 =基1基、雜絲、絲基、芳硫基、料、快基、 如基、絲、函素原子、醯基1氧基、酿胺基、幾基、 硝基、减、餐縣、魏_基或錫烧基。 其中’燒基為任何直鏈、分支者均可,亦可為環烧基。 炫基含有之碳數,-般為!至6Q,1至2Q更佳。烧基中以 直鏈烷基、分支烷基為佳,直鏈烷基更佳。 烷基之具體例’可舉如:甲基、乙基、正丙基、正 丁基正正+基、正十二燒基、正十八烧基等直鍵 烷基;異丙基、異丁基、第二丁基、第三丁基、2_乙己 基、3, 7-二曱辛基等分支烷基;環己基、金剛烷基等環 烧基。 烷基亦可含有取代基,其烷基可含有之取代基之例, 可舉如:烷氧基、芳基、雜芳基、鹵素原子等。含有取代 基之烷基之具體例,可舉如:甲氧乙基、苯甲基、三氟甲 基、全氟己基等。 炫氧基亦可含取代基’去除取代基之烷氧基的碳數, 一般為1至20。烧氧基為任何直鏈、分支者均可,環院氧 基亦可。 烷氧基之具體例,可舉如:正丁氧基、正己氧基、2- 9 323560 201221540 乙己氧基、3, 7-二甲辛氧基、正十二烷氧基等。 烷氧基中,以:正丁氧基、正己氧基、正十二烷氧基 等直鏈烷氧基較佳。 烷硫基亦可含取代基,除去取代基之烷硫基的碳數, 一般為1至20。烷硫基為任何直鏈、分支者均可,環烷硫 基亦可。 烷硫基之具體例,可舉如:正丁硫基、正己硫基、2_ 乙己硫基、3, 7-二甲辛硫基、正十二烷硫基等。 烷硫基中’以:正丁硫基、正己硫基、正十二烷硫基 等直鏈烷硫基較佳。 芳基為由芳香族烴化合物中將芳香環上直接鍵結之氫 原子1個去除之原子團,包含:含苯環之基、含縮環之基、 以獨立之芳香環或縮環2個以上直接鍵結之基。芳基所含 之碳數’ 一般為6至60, 6至20更佳。芳基之例,可舉如: 本基、1-4基、2-奈基、1-蒽基、2-蒽基、9-蒽基、1_祐 基、2-芘基、4-芘基、2-第基、3-第基、4-第基、4—聯苯 基(4-phenylphenyl)等。 芳基亦可含取代基。可包含在芳基中之取代基之例, 可舉如:烷基、烷氧基、雜芳基、鹵素原子等。含有取代 基之芳基之例,可舉如:4_己苯基、3, 5-二曱氧苯基、五 氟笨基等。芳基含取代基時,取代基以烷基較佳。 雜务基為由具有芳香族性之雜環化合物,將1個直接 鍵結於芳香環之氫原子去除之原子團,包含:含縮環之基、 以獨立之雜芳香環或縮環2個以上直接鍵結之基。雜芳基 323560 10 201221540 所含之碳數’ 一般為2至60,以3至20更佳。雜芳基之 例,可舉如:2_呋喃基、3_呋喃基、2_噻吩基、3_噻吩基、 2_咬略基、3-鱗基、2哥坐基、2_麵基、2__唾基、 2“比唆基、基、4_«基、2_苯并料基、2_苯并 噻吩基、2-噻吩並噻吩基等。 雜芳基亦可含取代基。可包含在雜芳基中之取代基之 例’可舉如:烧基、烧氧基、芳基、齒素原子等。含有取 代基之雜芳基之例’可舉如:5—辛基+塞吩基、5_苯基一2_ 夫南基等。雜芳基含取代基時,取代基以烧基較佳。 芳氧基亦可含取代基,除去取代基之芳氧基的碳數, -般為6 i 20。芳氧基之例’可舉如:苯氧基、卜蔡氧基、 2-萘氧基等。 芳硫基亦可含取代基’錯取代基之芳硫基的碳數, 一般為6至20。芳硫基之例,可舉如:苯硫基、丨_萘硫基、 2-萘硫基等。 烯基亦可含取代基,去除取代基之烯基的碳數,一般 為2至20。縣之例’可舉如:乙烯基、卜辛稀基等。 炔基亦可含取代基,去除取代基之炔基的碳數,一般 為2至20。可含取代基之炔基之例,可舉如··乙炔基、卜 辛炔基、2-苯乙炔基、三曱矽乙炔基等。 月女基亦可含取代基,去除取代基之胺基的碳數,一般 為〇至40。可含取代基之胺基之例,可舉如:胺基、甲胺 基、二曱胺基、二乙胺基、二異丙胺基、二環己胺基、吡 咯啶基、哌啶基、苯胺基、二苯胺基、丨_萘胺基、2_萘胺 323560 11 201221540 基、β比β定胺基等。 石夕基亦可含取代基,去除取代基之石夕基的碳數,一般 為0至6 0。可含取代基之;g夕基之例,可舉如:♦基、: 曱石夕基、三乙石夕基、三丙石夕基、三異丙石夕基、第三丁二甲 矽基、三苯矽基、三苯曱矽基、二苯曱矽基、二曱苯石夕基 等。 土 鹵素原子之例,可舉如:氟原子、氣原子、壤原子、 碘原子。 酿基亦可含取代基,去除取代基之醢基的碳數,一般 為1至20。可含取代基之醯基之例,可舉如:乙醯基、兩 醯基、丁醯基、三曱基乙醯基、苯曱醯基、三氟乙醯基、 五氟笨甲醯基等。 醯氧基亦可含取代基,去除取代基之醯氧基的碳數, 一般為2至20。可含取代基之醯氧基之例,可舉如:乙醜 氧基、丙醯氧基、丁醯氧基、三曱基乙醯氧基、苯曱酿氧 基、三氟乙醯氧基、五氟苯曱醯氧基等。 醯胺基亦可含取代基、可含取代基之醯胺基之例,可 舉如··甲醯胺基、乙醯胺基、丙醯胺基、丁醯胺基、苯甲 醯胺基、三氟乙醯胺基、五氟苯曱醯胺基、二甲醯胺基、 二乙醯胺基、二苯甲醯胺基等。 綾基亦可含取代基。可含取代基之羧基之例,可舉 如:鲮基、甲氧羰基、乙氧羰基、苯氧羰基、甲胺羰基、 乙胺羰基、苯胺羰基等。 爛酸殘基為如-Β(ΟΗ)2表示之基。 12 323560 201221540 硼酸酯殘基為由硼酸二酯將羥基去除後之基,其例如: 二烷酯殘基、二芳酯殘基、二(芳烷基)酯殘基等。硼酸酯 殘基之例,可舉如下式:E (1) / / represents a hydrogen atom H alkoxy group, = a group 1 group, a heterofilament, a silk group, an arylthio group, a material, a fast group, a group, a silk, a functional atom, a fluorenyl 1 oxy group, Amine amino, a few groups, nitro, minus, meal county, Wei-based or tin-based. Wherein the "burning group" is any straight chain or branch, and may also be a ring-burning group. Hyun base contains the carbon number, - as usual! To 6Q, 1 to 2Q is better. The alkyl group is preferably a linear alkyl group or a branched alkyl group, and a linear alkyl group is more preferred. Specific examples of the alkyl group include, for example, a methyl group, an ethyl group, a n-propyl group, a n-butyl group, a n-butyl group, a n-decyl group, a straight-chain alkyl group such as an n-octadecyl group; a branched alkyl group such as a butyl group, a second butyl group, a tert-butyl group, a 2-ethylhexyl group, a 3,7-dioctyloctyl group; a cycloalkyl group such as a cyclohexyl group or an adamantyl group; The alkyl group may have a substituent, and examples of the substituent which the alkyl group may contain may be an alkoxy group, an aryl group, a heteroaryl group, a halogen atom or the like. Specific examples of the alkyl group having a substituent include a methoxyethyl group, a benzyl group, a trifluoromethyl group, and a perfluorohexyl group. The methoxy group may also have a carbon number of the substituent a' to remove the alkoxy group of the substituent, and is usually from 1 to 20. The alkoxy group can be any straight chain or branch, and the ring oxygen group can also be used. Specific examples of the alkoxy group include n-butoxy group, n-hexyloxy group, 2- 9 323560 201221540 ethylhexyloxy group, 3,7-dimethyloctyloxy group, n-dodecyloxy group and the like. Among the alkoxy groups, a linear alkoxy group such as n-butoxy group, n-hexyloxy group or n-dodecyloxy group is preferred. The alkylthio group may also have a substituent, and the carbon number of the alkylthio group of the substituent is removed, and is usually from 1 to 20. The alkylthio group may be any straight chain or branched, and the cycloalkylthio group may also be used. Specific examples of the alkylthio group include n-butylthio group, n-hexylthio group, 2-hexylthio group, 3,7-dimethyloctylthio group, n-dodecylthio group and the like. Among the alkylthio groups, a straight-chain alkylthio group such as n-butylthio group, n-hexylthio group or n-dodecylthio group is preferred. The aryl group is an atomic group in which one hydrogen atom directly bonded to an aromatic ring is removed from an aromatic hydrocarbon compound, and includes a benzene ring-containing group, a condensed ring-containing group, and a separate aromatic ring or a condensed ring. The basis of the direct bond. The aryl group has a carbon number ' generally from 6 to 60, more preferably from 6 to 20. Examples of the aryl group include a group, a benzyl group, a 1-4 group, a 2-nyl group, a 1-indenyl group, a 2-indenyl group, a 9-fluorenyl group, a 1-mercapto group, a 2-indenyl group, and a 4-fluorenyl group. , 2-diyl, 3-diyl, 4-diyl, 4-phenylphenyl, and the like. The aryl group may also contain a substituent. Examples of the substituent which may be contained in the aryl group include an alkyl group, an alkoxy group, a heteroaryl group, a halogen atom and the like. Examples of the aryl group having a substituent include 4-hexylphenyl, 3,5-dioxaoxyphenyl, pentafluorophenyl and the like. When the aryl group has a substituent, the substituent is preferably an alkyl group. The hydroxy group is an aromatic heterocyclic compound, and one atomic group which is directly bonded to the hydrogen atom of the aromatic ring, and includes: a ring containing a condensed ring, an independent heteroaromatic ring or a condensed ring of two or more. The basis of the direct bond. The number of carbons contained in the heteroaryl group 323560 10 201221540 is generally from 2 to 60, more preferably from 3 to 20. Examples of the heteroaryl group include a 2-furyl group, a 3-furyl group, a 2-thiophenyl group, a 3-thienyl group, a 2-dentyl group, a 3-fluorenyl group, a 2-glycol group, and a 2-sheet group. 2__saltyl, 2"-indenyl, yl, 4_«yl, 2-benzoyl, 2-benzothiophenyl, 2-thienothiophenyl, etc. Heteroaryl may also contain a substituent. Examples of the substituent contained in the heteroaryl group include, for example, an alkyl group, an alkoxy group, an aryl group, a dentate atom, etc. An example of a heteroaryl group having a substituent can be exemplified by 5-octyl group+ When the heteroaryl group has a substituent, the substituent is preferably an alkyl group. The aryloxy group may further have a substituent, and the carbon number of the aryloxy group of the substituent is removed. , and is generally 6 i 20. Examples of the aryloxy group may be exemplified by a phenoxy group, a buccaoxy group, a 2-naphthyloxy group, etc. The arylthio group may also have an arylthio group of a substituent 'alternate substituent. The carbon number is generally 6 to 20. Examples of the arylthio group include a phenylthio group, a fluorenyl-naphthylthio group, a 2-naphthylthio group, etc. The alkenyl group may further contain a substituent, and the substituent is removed. The carbon number of the base is generally 2 to 20. The example of the county is as follows: vinyl, bismuth, and the like. The alkynyl group may further have a substituent, and the carbon number of the alkynyl group which removes the substituent is usually from 2 to 20. Examples of the alkynyl group which may have a substituent include an ethynyl group, a b-alkynyl group, and a 2-benzene group. An ethynyl group, a triterpene ethynyl group, etc. The ruthenium group may further contain a substituent, and the carbon number of the amine group of the substituent is removed, and is generally from 40 to 40. Examples of the amine group which may have a substituent may be, for example, an amine. Base, methylamino, dimethylamino, diethylamino, diisopropylamine, dicyclohexylamino, pyrrolidinyl, piperidinyl, anilino, diphenylamino, anthracene-naphthyl, 2_ Naphthylamine 323560 11 201221540 base, β ratio β-fixed amine group, etc. Shi Xiji may also contain a substituent, and the carbon number of the Shishi unit of the substituent is removed, generally 0 to 60. It may contain a substituent; Examples of the base can be exemplified by: ♦ base,: 曱石夕基, 三乙石夕基, 三丙石夕基, 三isopropyl石夕基, 三丁丁矽基, triphenyl fluorenyl, three Examples of the halogen atom of the earth include a fluorine atom, a gas atom, a phosphorus atom, and an iodine atom. The brewing group may further contain a substituent to remove the phenyl fluorenyl group, the diphenyl fluorenyl group, and the bismuthene group. Replace The carbon number of the fluorenyl group is generally from 1 to 20. Examples of the fluorenyl group which may have a substituent include, for example, an ethyl group, a fluorenyl group, a butyl group, a trimethyl acetyl group, a benzoinyl group, and a third group. Fluorinyl group, pentafluorobenzyl group, etc. The oxime group may further contain a substituent, and the carbon number of the oxirane group of the substituent is removed, and is usually 2 to 20. Examples of the oxime group which may have a substituent may be used. For example, it may be exemplified by ethyl phenoxy, propenyloxy, butyl oxy, trimethyl ethoxycarbonyl, benzoyloxy, trifluoroacetoxy, pentafluorophenyloxy or the like. The amine group may also contain a substituent and an anthranyl group which may have a substituent, and examples thereof include a mercaptoamine group, an acetamino group, a propylamine group, a butylammonium group, a benzamidine group, Trifluoroacetamido, pentafluorophenylamine, dimethylamino, diethylamine, benzhydrylamine, and the like. The thiol group may also contain a substituent. Examples of the carboxyl group which may have a substituent include a mercapto group, a methoxycarbonyl group, an ethoxycarbonyl group, a phenoxycarbonyl group, a methylaminecarbonyl group, an ethylaminecarbonyl group, an anilinecarbonyl group and the like. The rotten acid residue is a group represented by -(Β)2. 12 323560 201221540 The borate residue is a group obtained by removing a hydroxyl group from a boronic acid diester, and examples thereof include a dialkyl ester residue, a diaryl ester residue, a di(aralkyl) ester residue, and the like. An example of a borate residue can be given by the following formula:

(式中,Me表示甲基,Et表示乙基。) 所示之基。 錫烷基亦可含取代基,去除取代基之錫烷基的碳數, 一般為0至20。可含取代基之錫烷基之例,可舉如:三曱 錫烧基、三丁錫烧基等。 由作為高分子化合物製造用單體之觀點,E以各為獨 立之鹵素原子、棚酸殘基、棚酸醋殘基或錫烧基較佳。 式(1)中,Q1表示由式(2)表示之化合物去除2個氫原 子後之2價基。 13 323560 (2) 8 201221540(wherein, Me represents a methyl group, and Et represents an ethyl group.) The group shown. The stannyl group may also have a substituent, and the carbon number of the tin alkyl group from which the substituent is removed is generally from 0 to 20. Examples of the tin alkyl group which may have a substituent include a trimethyltin group and a tributyltin group. From the viewpoint of the monomer for polymer compound production, E is preferably a halogen atom, a linoleic acid residue, a tartanic acid residue or a tin-burning group. In the formula (1), Q1 represents a divalent group obtained by removing two hydrogen atoms from the compound represented by the formula (2). 13 323560 (2) 8 201221540

式(2)中,A環、B環及C環各自獨立,表示芳香環。 X 乂、义、义、;(、)(6及疒各自獨立,表示碳原子或氮原 各自獨立’表示氫原子、炫基、貌氧基、炫硫基、 芳基、雜芳基、芳氧基、芳硫基、烯基、块基、胺基、石夕 f、南素科、縣、醢氧基、醯絲、絲、硝基或氰 。其t 2個之R2亦可互相鍵結形成環狀結構。 式⑵中’ A環、B環及c環各自獨立,表示芳香環。 Γ;又Λ香環之碳數以2至6〇為佳,2至22更佳,3至 例,包含取代基之碳數。芳香環之 铜五苯产im、菲環、铜四苯環、祐環、 物、嗟:Γ t環、曙二唾環、嗟二嗤環、㈣環、 咬環、三啡、;::環、咬喃s、°比啶環,并環、嘴 琳環、異輕r* 4吩%、笨并料環、苯料喃環、喧 環亦可再含有吩並㈣環、苯㈣二錢等。芳香 式(2)中,χΐ、γ2 ν3 碳原子或氮原子。χ1 : x3、x:、χ6及χ7各自獨立’表示 至少4個為碳 、、X4、χ5、χ6及χ7中,以其中 為灭原子者為佳。同時,以χ1、χ2、χ3、χ4、χ5、 323560 14 201221540 Χ6及Χ7中’以相鄰2個中之至少⑽為碳原子者為佳。 式(2)中,Β環由合成容易度之觀點,以6員 • 苯環更佳。 Β環為苯環時,式(2)係以式(3)表示。In the formula (2), the A ring, the B ring and the C ring are each independently and represent an aromatic ring. X 乂, 义,义, ; (, ) (6 and 疒 are independent, meaning that the carbon atom or the nitrogen atom are independent of each other' represents hydrogen atom, 炫, methoxy, thiol, aryl, heteroaryl, aromatic Oxygen, arylthio, alkenyl, block, amine, shixi f, nansko, county, decyloxy, fluorene, silk, nitro or cyanide. The knot forms a cyclic structure. In the formula (2), the 'A ring, the B ring and the c ring are independent of each other, and represent an aromatic ring. Γ; the carbon number of the scented ring is preferably 2 to 6 Å, more preferably 2 to 22, and 3 to For example, the carbon number of the substituent is included. The copper pentene of the aromatic ring is produced by im, phenanthrene ring, copper tetraphenyl ring, yoke ring, substance, 嗟: Γ t ring, 曙 di-salt ring, 嗟 嗤 ring, (four) ring, Biting ring, trimorphine, ::: ring, biting s, ° than pyridine ring, and ring, mouth ring, light weight r * 4 %%, stupid ring, benzene ring, ring can also Containing an pheno (tetra) ring, a benzene (tetra) divalent, etc. In the aromatic formula (2), χΐ, γ2 ν3 carbon atoms or nitrogen atoms. χ1: x3, x:, χ6 and χ7 are each independently 'indicating at least 4 carbons, Among X4, χ5, χ6, and χ7, those in which atoms are destroyed are preferred. In the case of χ1, χ2, χ3, χ4, χ5, 323560 14 201221540 Χ6 and Χ7, it is preferred that at least (10) of the adjacent two are carbon atoms. In the formula (2), the anthracene ring is easily synthesized. The viewpoint is better for 6 members • benzene ring. When the anthracene ring is a benzene ring, the formula (2) is represented by the formula (3).

(3) 如f立3)中/A環、C環、^^及^各表示如 ^思° R各自獨立,表示氫原子、烧基、烧氧基、燒 ^基、芳基、雜芳基、芳氧基、芳硫基、烯基、炔基、胺 =石夕基、齒素原子、醯基、酿氧基、醯胺基、絲、确 基或氰基。苯環目鄰破原子上鍵結之2 鍵結形成環狀結構。 相 -装式H中’ R ^之烧基 '烧氧基、烧硫基、芳基、雜 芳氧基芳碳基、烯基、炔基、胺基、矽基、鹵素 ::…醯* ·氧基、醯胺基、羧基之定義、具體例,係 其刖:之E中^之烷基、烷氧基、烷硫基、芳基、雜芳 =芳氧基芳琉基、烯基、块基、胺基、石夕基、齒素原 酸基、酿氧基、醯胺基、叛基之定義、具體例相同。 抑式(3)中,由使化合物之重定向能量降低之觀點,以/ 极及C環係各為心之㈣環、料環或十南環為佳&quot;塞 323560 201221540 吩環更佳。 其中由合成容易度之觀點,以Q1為式(4a)表示之基或 式(4b)表示之基為佳。(3) In the case of f 3), the /A ring, the C ring, ^^ and ^ are each represented as a separate atom, meaning hydrogen atom, alkyl group, alkoxy group, alkyl group, aryl group, heteroaryl group. Alkyl, aryloxy, arylthio, alkenyl, alkynyl, amine = alkaloid, dentate atom, fluorenyl, alkoxy, amidino, silk, exact or cyano. The benzene ring is adjacent to the bond on the atom to form a ring structure. Phase-mounted H in 'R ^ 'alkyl] alkoxy, thiol, aryl, heteroaryloxy aryl, alkenyl, alkynyl, aminyl, fluorenyl, halogen::...醯* The definitions and specific examples of the oxy group, the decylamino group and the carboxyl group are as follows: the alkyl group, the alkoxy group, the alkylthio group, the aryl group, the heteroaryl group = the aryloxyaryl fluorenyl group, the alkenyl group The definitions of the block group, the amine group, the Shishiji, the dentate ortho acid group, the brewing oxy group, the guanamine group, and the thiol group are the same as the specific examples. In the formula (3), from the viewpoint of lowering the reorientation energy of the compound, it is preferable that the (4) ring, the ring or the ten ring is the core of the /pole and the C ring system. The plug ring of 323560 201221540 is better. Among them, from the viewpoint of easiness of synthesis, it is preferable that Q1 is a group represented by the formula (4a) or a group represented by the formula (4b).

式(4a)及式(4b)中,R2及R3表示與前述相同之意。R4 各自獨立,表示氫原子、院基、烧氧基、烧硫基、芳基、 雜芳基、芳氧基、芳硫基、婦基、快基、胺基、石夕基、_ 素原子、醯基、醯氧基、醯胺基、羧基、硝基或氰基。 R4表示之燒基、院氧基、烧硫基、芳基、雜芳基、芳 氧基.、芳硫基、烯基、炔基、胺基、矽基、鹵素原子、醯 基、醢氧基、醯胺基、羧基之定義、具體例,係與前述之 E中表示之烧基、烧氧基、烧硫基、芳基、雜芳基、芳氧 基、芳硫基、烯基、炔基、胺基、矽基、_素原子、醯基、 醯氧基、醯胺基、羧基之定義、具體例相同。 Q1之例可舉如下之基。 16 323560 201221540In the formulae (4a) and (4b), R2 and R3 are the same as defined above. R4 is independent of each other, and represents a hydrogen atom, a deuterium group, an alkoxy group, a sulfur-containing group, an aryl group, a heteroaryl group, an aryloxy group, an arylthio group, a aryl group, a fast group, an amine group, a sulfhydryl group, and a sulfonium atom. , fluorenyl, decyloxy, decylamino, carboxy, nitro or cyano. R4 represents a decyl group, an alkoxy group, a thiol group, an aryl group, a heteroaryl group, an aryloxy group, an arylthio group, an alkenyl group, an alkynyl group, an amine group, a fluorenyl group, a halogen atom, a fluorenyl group, an anthracene group The definition, specific examples of the group, the mercapto group, and the carboxyl group are the alkyl group, alkoxy group, sulfur group, aryl group, heteroaryl group, aryloxy group, arylthio group, alkenyl group represented by the above E. The definitions of the alkynyl group, the amine group, the fluorenyl group, the _ atom, the fluorenyl group, the decyloxy group, the decylamino group, and the carboxyl group are the same as the specific examples. The example of Q1 can be exemplified below. 16 323560 201221540

17 323560 20122154017 323560 201221540

式(1)中,Q2各為獨立,表示-CRla=CRlb---C三C-或2 價之芳香族基。 1^及1^各為獨立,表示氫原子、烷基、芳基、雜芳 基或氰基。In the formula (1), each of Q2 is independent, and represents -CRla=CRlb---C tri-C- or 2-valent aromatic group. 1^ and 1^ are each independently a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group or a cyano group.

Rla &amp; Rlb中表示之烷基、芳基或雜芳基之定義、具體 18 323560 201221540 例,係與前述之E中表示之院基、芳基或雜芳基之定義、 具體例相同。 二價芳香族基係由芳香環中去除2個氫原子後之原子 團,包含含有縮環之基、獨立芳香環或縮環2個以上直接 鍵結之基。二價芳香族基之例,可舉如:伸苯基、萘二基、 蒽二基、菲二基、稠四苯二基、祐二基、稠五苯二基、花 二基、苐二基、噚二唑二基、噻二唑二基、噚唑二基、噻 β坐二基、嗟吩二基、二°塞吩二基、對σ塞吩二基、聯四°塞吩 二基、°比洛二基、咬喃二基、硒吩二基、吼《定二基、°比哄 二基、嘧啶二基、三畊二基、苯并噻吩二基、苯并吡咯二 基、苯并呋喃二基、喧琳二基、異喧淋二基、嗟吩並嗟吩 二基、苯并噻二唑二基、苯并二噻吩二基等。二價芳香族 基亦可再含有取代基。 Q2以二價芳香族基為佳;可含取代基之伸苯二基、可 含取代基之第二基、可含取代基之噻吩二基、可含取代基 之嗟吩並嗟吩二基、可含取代基之苯并二嗟吩二基更佳; 特別以下述式表示之基又更佳。The definition of the alkyl group, the aryl group or the heteroaryl group represented by Rla &amp; Rlb is specifically the same as the definition and specific examples of the group, aryl or heteroaryl group represented by the above E. The divalent aromatic group is an atomic group obtained by removing two hydrogen atoms from the aromatic ring, and includes a group containing a condensed ring group, an independent aromatic ring or a condensed ring of two or more direct bonds. Examples of the divalent aromatic group include a stretching phenyl group, a naphthyldiyl group, a fluorenyldiyl group, a phenanthrenyl group, a condensed tetraphenyldiyl group, a dienyl group, a fused pentabenzenediyl group, a flower diyl group, and a fluorenyl group. , oxadiazolediyl, thiadiazolediyl, carbazolediyl, thiaphthyldiyl, porphinyldiyl, di-septyldiyl, p-synaptodiyl, hydrazone , 洛洛二基, 乙二基基, selenophene diyl, 吼 "dibasic, 哄 哄 diyl, pyrimidine diyl, tritonin diyl, benzothiophenediyl, benzopyrrolediyl, Benzofuran diyl, fluorene diyl, isoindole diyl, porphin and porphinyl diyl, benzothiadiazole diyl, benzodithiophenediyl and the like. The divalent aromatic group may further contain a substituent. Q2 is preferably a divalent aromatic group; a benzenediyl group which may have a substituent, a second group which may have a substituent, a thiophenediyl group which may have a substituent, and a porphin porphindiyl group which may have a substituent Further, the benzodioxin diyl group which may have a substituent is more preferable; and the group represented by the following formula is more preferable.

(其中,R各為獨立,表示氫原子或烷基。) 式(1)中,η表示1以上之整數;ml表示0至10之整 數;m2表示0至10之整數。惟η個之ml不能全部為0。η 為2以上時,η個之ml,可為相同或不同。η個之m2,可 19 323560 201221540 為相同或不同。由使式(1)表示的化合物之結晶性增加,以 提高含式(1)表示之化合物的電晶體元件之性能之觀點,係 以ml為1、m2為〇者為佳。 由製造式(1)表示之化合物之優良薄膜的觀點,係以n 為3以上者為佳。 由提高式(1)表示之化合物在溶劑中之溶解性而可容 易地製成薄膜的觀點’係以η為3以上10000以下者為佳, 以3以上5000以下更佳。 由提高式(1)表示之化合物之結晶性而提升含式G) 表不之化合物之電晶體元件之性能的觀點,係以η為1者 為佳。 式(1)表示之化合物之例,可舉如下之化合物。(wherein R is independently a hydrogen atom or an alkyl group.) In the formula (1), η represents an integer of 1 or more; ml represents an integer of 0 to 10; and m2 represents an integer of 0 to 10. Only n of the ml cannot be 0. When η is 2 or more, n of ml may be the same or different. η m2, can be the same or different from 19 323560 201221540. From the viewpoint of increasing the crystallinity of the compound represented by the formula (1) and improving the performance of the crystal element containing the compound represented by the formula (1), it is preferred that ml is 1 or m2. From the viewpoint of producing an excellent film of the compound represented by the formula (1), it is preferred that n is 3 or more. The viewpoint of easily forming a film by increasing the solubility of the compound represented by the formula (1) in a solvent is preferably η of 3 or more and 10,000 or less, and more preferably 3 or more and 5,000 or less. From the viewpoint of improving the crystallinity of the compound represented by the formula (1) and improving the performance of the crystal element including the compound represented by the formula G), it is preferred that η is one. Examples of the compound represented by the formula (1) include the following compounds.

20 323560 20122154020 323560 201221540

21 323560 201221540 &lt;化合物之製造方法&gt; 本發明之化合物,在為低分子化合物時,可以一般已 知之方法合成。本發明之化合物為高分子化合物時,其製 造方法並無特別之限定,可舉如:使用以Ni催化劑進行還 原性偶合反應之方法、使用Stille偶合反應之方法、使用 Suzuk i偶合反應之方法等。惟由化合物合成之容易性、交 替共聚化合物製成容易的觀點,以使用St ille偶合反應及 Suzuki偶合反應之方法為佳。 使用Suzuk i偶合反應之方法,可列舉如:具有使式: E!-T 丨-E2 (100) [式中,T1表示Q1或Q2。E1及E2,各為獨立,表示硼酸殘 基或硼酸酯殘基。] 所示之1種以上之化合物、與式: E3-T2-E4 (200) [式中,T2在T1為Q1時表示Q2; T1為Q2時表示Q、E3及E4, 各為獨立,表示鹵素原子或續酸殘基。] 所示之1種以上之化合物,在Ιε催化劑及鹼之存在下反應 的步驟之製造方法。 式(200)中,Ε3及Ε4表示之鹵素原子之例,可舉如: 氟原子、氯原子、溴原子、碘原子。由高分子化合物之合 成容易度之點,以溴原子、碘原子為佳,溴原子更佳。 式(200)中,Ε3及Ε4表示之磺酸殘基,係指由磺酸 (-S〇3H)將酸性氫去除後之原子團之意,具體之例可舉如: 烧基續酸醋基(例如:曱烧續酸醋基、乙烧續酸醋基)、芳 22 323560 201221540 基磺酸酯基(例如:苯磺酸酯基、對曱苯磺酸酯基)、芳烷 基磺酸酯基(例如:苯曱基磺酸酯基)及三氟曱烷磺酸酯基。 使用Stille偶合反應之方法,可列舉如:具有使式: E5-T3-E6 (300) [式中,T3表示Q1或Q2。E5及E6各為獨立,表示三烷基錫 烧基。] 所示之1種以上之化合物、與式: E7-T4-E8 (400) [式中,T4在T3為Q1時表示Q2; T3為Q2時表示Q1。E7及E8, 各為獨立,表示鹵素原子。] 所示之1種以上之化合物,在Is催化劑之存在下反應的步 驟之製造方法。 式(300)中,E5及E6表示之三烷基錫烷基之例,可舉 如:-S11R3所示之基等。其中之R表示烧基。 式(400)中,E7及E8表示之鹵素原子之例,可舉如: 氟原子、氯原子、漠原子、破原子。在高分子化合物之合 成容易度方面,以溴原子、碘原子為佳,溴原子更佳。 &lt;組成物&gt; 本發明之組成物,為含有上述本發明之化合物的物種, 本發明之組成物之例,可舉如:含有2種以上之式(1)所示 之化合物的組成物、含有與式(1)所示之化合物不同的化合 物及1種以上之式(1)所示之化合物的組成物。與式(1)所 示之化合物不同的化合物之例,可舉如:式(1)所示之化合 物以外之有機半導體材料。本發明之組成物,亦可為包含 23 323560 201221540 式(1)所示之化合物與溶劑之液狀組成物。 &lt;薄膜&gt; 其次說明包含本發明之式(1)所示之化合物的薄膜。 由於式(1)所示之化合物為有機化合物,因此以下亦可稱此 種薄膜為「有機薄膜」。 本發明之有機薄膜的較佳厚度,係依照使用該有機薄 膜的元件而不同,惟一般在lnm至100//m之範圍,以2nm 至lOOOnm為佳,5nm至500nm更佳,20nm至200nm又更佳。 此種厚度之有機薄膜,可形成具有良好之電荷傳輸性 且強度充分之有機薄膜元件。 有機薄膜可以單獨含前述式(1)所示之化合物之1種, 亦可含2種以上。有機薄膜在含前述式(1)所示之化合物以 外之成分時,前述式(1)所示之化合物以含10質量%以上為 佳,30質量%以上更佳。如前述式(1)所示之化合物之含量 低於30質量%時,會有薄膜化變為困難,因此不易製成具 有良好電荷遷移率之傾向。 前述式(1)所示之化合物以外之成分之例,可舉如: 前述式(1)所示之化合物以外之有機半導體材料。 本發明之有機薄膜,以任何方法製成者均可,例如可 使式(1)所示之化合物溶解#有機溶劑中成為溶液,再以該 溶液成膜而製成。 本發明之有機薄膜在製造時所使用的有機溶劑,以可 使有機薄膜中所含之成分良好地溶解或分散之有機溶劑為 佳。依照其必要,亦可進行加熱使有機薄膜中所含之成分 24 323560 201221540 溶解在有機溶劑中。有機溶劑之例’可舉 辛燒、環己烧等飽和烴;苯、^ 了舉如·己烧、庚燒、 .氯仿、二氣甲燒、四氯化:、:二二:苯等不飽和煙; 烴;氯苯、 臭已院等鹵化飽和 異丙醇、丁SE筮一本相化不飽和烴;乙醇、丙醇、 ,了醇、第三丁醇等醇類;二乙峻、甲 =喃、二nf烧等_ ; N,N_二甲基甲醯二二、 基乙醯胺、&quot;基味啉氧化物 人:甲 地溶解之觀點,以不飽和烴、㈣^貝,由使化合物良好 劑,二氯仿或二氯笨更佳。前述咖 &quot;種早獨亦可以二種以上併用。 上塗:發= = 製:’可以以前述溶液等在基板 劑去除操作。該_之例==在塗佈後將溶 ::版塗佈法、凹版塗佈法、棒塗佈法、輥塗法、線 法、/ 3 /X塗佈法、嘴塗法、網版印刷法、柔版印刷 毛細管法、嘴墨印刷法、點膠印刷法、喷嘴塗佈法、 也迷之塗佈操作’亦可在加熱之狀態下進行。藉 望勝、除了可使其以高濃度之塗佈液塗佈而形成均質之 臈之外,在室溫下塗佈困難之材料等亦可使用。 同時’亦可再S前述有機薄膜,以研磨法、光定向法、 性踢、拉提塗佈法等賦予其定向,以更提高其電荷傳輸 &gt; &lt;有機薄膜元件 323560 25 201221540 本發明之有機薄膜,由於含有重定向能量低之式(1) 所示之化合物,因此具有優良之電荷傳輸性,因此可用以 製造有機半導體元件、有機太陽電池等之有機薄膜元件。 本發明之化合物及包含此之組成物,特別可作為有機 半導體元件之電荷傳輸材料。 其重定向能量相當於隨著電洞移動之構造變化上相關 的能量障壁之4倍量,此量越小即越可能有高電洞遷移率。 &lt;有機電晶體元件&gt; 有機電晶體元件可列舉如:含有具備下述之構成者: 源極電極與汲極電極、成為此等電極間之電流路徑之包含 式(1)所示化合物之活性層、以及控制通過該電流路徑之電 流量之閘極電極。具有此種構成之有機電晶體元件之例, 可舉如:場效型有機電晶體元件、靜電感應型有機電晶體 元件等。 場效型有機電晶體元件,一般係具有下述構成之有機 電晶體元件:源極電極與汲極電極、成為此等電極間之電 流路徑之包含式(1)所示化合物之活性層、控制通過該電流 路徑之電流量之閘極電極、以及配置在活性層與閘極電極 之間之絕緣層。特別以其中源極電極與汲極電極,設置成 連接於活性層,並夾著連接於活性層之絕緣層而設置閘極 電極的有機電晶體元件為佳。 靜電感應型有機電晶體元件,一般係具有下述構成之 有機電晶體元件:源極電極與汲極電極、成為此等電極間 之電流路徑之包含式(1)所示化合物之活性層、以及控制通 26 323560 201221540 過該電流路徑之電流量之閘極電極,而該閘極電極係設置 在活性層中。其中特別以源極電極、汲極電極以及前述閘 極電極配置成連接於前述活性層之有機電晶體元件為佳。 閘極電極只要為可形成由源極電極流向汲極電極之 電流路徑,且可由施加在閘極電極之電壓控制流經該電流 路徑之電流量的構造即可,其例可舉如:梳型電極。 第1圖所不係本發明之有機電晶體元件(場效型有機 電晶體元件)之一例的模式斷面圖。第1圖中所示之有機電 晶體元件100,其中具備:基板1、在基板1上保持預定之 間隔所形成之源極電極5與汲極電極6、以覆蓋源極電極5 與汲極電極6之方式在基板1上形成之活性層2、在活性 層2上形成之絕緣層3、以及以覆蓋在源極電極5與汲極 電極6之間之領域上的絕緣層3之方式在絕緣層3上形成 之閘極電極4。 第2圖所示係本發明之有機電晶體元件(場效型有機電 晶體元件)之其他之例的模式斷面圖。第2圖中所示之有機 電晶體元件110,其中具備:基板1與在基板1上形成之 源極電極5、以覆蓋源極電極5之方式在基板1上形成之活 性層2、與源極電極5保持預定之間隔在活性層2上形成之 汲極電極6、在活性層2與汲極電極6上形成之絕緣層3、 以及以覆蓋在源極電極5與汲極電極6之間之領域上的絕 緣層3之方式在絕緣層3上形成之閘極電極4。 第3圖所示係本發明之有機電晶體元件(場效型有機 電晶體元件)之其他之例的模式斷面圖。第3圖中所示之有 27 323560 201221540 機電晶體το件120 ’其中具備:基板丨與在基板i上形成 之閘極電極4以覆蓋間極電極4之方式在基板工上形成 之絕緣廣3、以覆蓋下方形成有閘極電極4之絕緣層3的 部分領域之方式在絕緣層3上保_定之間隔所形成之源 極電極5與祕電極6、以及以覆蓋源極電極5與沒極電 極6之-部分之方式在絕料3上形成之活性層2。 第4圖所不係本發明之有機電晶體元件(場效型有機 電晶體元件)之其他之例的模式斷面圖。第4圖中所示之有 機電晶體元件130 ’其中具備:基板1、在基板1上形成之 間極電極4、以覆蓋閘極電極4之方式在基板1上形成之 .’、邑緣層3以覆蓋下方形成有閘極電極4之絕緣層3的部 分領域之方式在絕緣層3上形成之源極電極5、以覆蓋源 極電極部分的方式在絕緣層3上形成之活性層2、 及以覆蓋雜層2之-部分的方式而與源極電極5保持預 定之間隔在絕緣層3上形成线極電極6。 第5圖所不係本發明之有機電晶體元件(靜電感應型 有機電晶體70件)之其他之例的模式斷面圖。第5圖中所示 :有機電晶體元件140,其中具備:基板卜在基板i上形 成之源極電極5、在源極電極5上形成之活性層2、在活性 曰2上保持預定之間隔而形成之複數個閘極電極4、以覆 ^極電極4之全部的方式在活性層2上形成之活性層2a 冓成活性層^之材料,可與構成活性層2之材料相同或 不同)、及在活性層2a±形成之祕電極6。 第6圖所示係本發明之有機電晶體元件(場效型有機 323560 28 201221540 • 電晶體元件)之其他之例的模式斷面圖。第6圖中所示之有 *機電晶體元件150,其巾具備:基板丨、在基板丨上形成之 •活性層2、在活性層2上㈣預定之間隔形成之源極電極5 與汲極電極6、以覆蓋源極電極5與汲極電極6之一部分 的方式在活性層2上形成之絕緣層3、及以各覆蓋在下方 形成有源極電極5之絕緣層3之部分領域與在下方形成有 汲極電極6之絕緣層3之部分領域的方式而在絕緣層3上 形成之閘極電極4。 第7圖所示係本發明之有機電晶體元件(場效型有機 電晶體元件)之其他之例的模式斷面圖。第7圖中所示之有 機電晶體元件160,其中具備:基板丨、在基板丨上形成之 閘極電極4、以覆蓋閘極電極4之方式在基板丨上形成之 緝緣層3、以覆蓋在下方形成有閘極電極4之絕緣層3之 領域的方式形成之活性層2、以覆蓋活性層2之一部分的 方式在活性層2上形成之源極電極5、及以覆蓋活性層2 之一部分且與源極電極5保持預定之間隔的方式在活性層 2上形成之汲極電極6。 第8圖所示係本發明之有機電晶體元件(場效型有機 電曰曰體元件)之其他之例的模式斷面圖。第8圖中所示之有 機電sa體元件170 ’其中具備·閘極電極4、在閘極電極4 上形成之絕緣層3、在絕緣層3上形成之活性層2、及在活 性層2上保持預定之間隔而形成之源極電極5與沒極電極 6。該情形時,閘極電極4兼為基板1。 上述之本發明之有機電晶體元件中,活性層2及/或 323560 29 201221540 活性層2a,係由含本發明化合物之膜所構成,而形成源極 電極5與汲極電極6之間之電流路徑(通道)。同時,閘極 電極4可經由施加電壓而控制通過電流路徑(通道)之電流 量。 此種場效型有機電晶體元件,可以已知之方法,如在 曰本特開平5-110069號公報中所載之方法製造。靜電感應 型有機電晶體元件,可以如在日本特開2004-006476號公 報中所載之已知之方法製造。 基板1之材料,只要為不妨礙有機電晶體元件特性之 材料即可。基板可使用:玻璃基板、撓性薄膜基板、塑膠 基板。 絕緣層3之材料,只要為電絕緣性高之材料即可,可 使用:Si〇x、SiNx、Ta2〇5、聚醯亞胺、聚乙烯醇、聚乙烯 酚、有機玻璃、光阻劑等,惟由低電壓化之觀點,以使用 高電容率之材料為佳。 在絕緣層3上形成活性層2時,為改善絕緣層3與活 性層2之界面特性,亦可以矽烷偶合劑等表面處理劑處理 絕緣層3之表面以進行表面改質後再形成活性層2。 在有機場效電晶體時,電子及電洞等之電荷,一般係 通過絕緣層與活性層之界面附近。因此,該界面之狀態對 電晶體之遷移率有大的影響。由於如此,在改良界面狀態 以提高特性之方法方面,已有以矽烷偶合劑控制界面之提 議(其例如:表面化學,2007年,第28卷,第5號,p. 242-248)。 30 323560 201221540 矽烷偶合劑之例,可舉如:烷基氯矽烷類(辛基三氯 . 矽烷(0TS)、十八烷基三氯矽烷(0DTS)、苯乙基三氣矽烷 • 等)、烷基烷氧矽烷類、氟烷基氯矽烷類、氟烷基烷氧矽烷 類、六曱基二矽氮(HMDS)等矽基胺化合物等。在以表面處 理劑處理前,絕緣層表面亦可實施臭氧uv處理、〇2電漿處 理。 經由此種處理,可以控制作為絕緣層使用之矽氧化膜 等之表面能量,時,亦可藉由表面處理,提高構成活性 層之膜在絕緣層上之定向性,得到高的電荷傳輸性(遷移 率)。 閘極電極4中’亦可使用:金、鉑、銀、銅、鉻、鈀、 銘姻、翻、低電阻石夕聚合物、低電阻非晶石夕化合物等之 金屬、及錫氧化物 '氧化銦、銦.錫氧化物(ITG)等材料。 此等材料’可以1種單獨使用亦可2種以上併用。閘極電 極4亦可❹高濃度摻雜之⑪基板。高濃度摻雜之梦基板, ==作為_餘讀能,同時亦併㈣為基板之性 肖此種具有作為基板之性能的閘極電極4時,在 i基it閘極電極4連接之有機電晶體元件中,亦可省略 你徑電極5及汲極雷搞 為佳,特別以由金m以由低電阻材料所㈣ 槿占… 鋼、鉻、鈀、鋁、銦、在 用佳。此等材料可以1種單獨使用亦可2種以」 前述有機電晶體元件中, 源極電極5及汲極電極6、 323560 31 201221540 與活性層2之間,亦可再介入由其他化合物所構成之層。 此種層之例,可舉如由:具有電子傳輸性之低分子化合物、 具有電洞傳輸性之低分子化合物、驗金屬、鹼土金屬、稀 土金屬、此等金屬與有機化合物之錯合物、碘、溴、氣、 氣化破等齒素、硫酸、脫水硫酸、二氧化硫、硫酸鹽等氧 化硫化合物、硝酸、二氧化氮、硝酸鹽等氧化氮化合物、 過氯酸、次氯酸等鹵化之化合物、烷硫醇化合物、芳硫醇 類、氟化烷基芳硫醇類等芳硫醇化合物等所形成之層。 同時’上述種類之有機電晶體元件在製成後,為保護 元件’以於有機電晶體元件上形成保護膜者為佳。如此, ,晶體元件可阻斷大氣,因此可抑制有機電晶體元件 特性之降低。此外,在有機電 元件時,在形成步驟切有機電晶因^ 保護膜而減低。 卞心办s丌了因忒 保護膜形成之方法,可彳 硬化樹脂、熱硬化樹脂及叙機:=有機電晶體元件以υν 為有效地_大氣’以在有膜等覆蓋之方法等。 暴露在大氣中(例如在 機 專)之下形成保護膜為佳。 具二甲 具有此種構成之有機電 型電晶體’可使用作為主= 場效 有機電發光顯示器之❹^陣鶴方式之液晶顯不器及 施形態之有機場效型電 切換70件p此外,上述實 之化合物而具有改=二射之活性層因含有本發明 輪丨生之活性層,因此可提高該 323560 32 201221540 場效遷移率。因此,可用以製造具有充分反應速度之顯示 器等。 實施例 以下’再舉實施例以更詳細說明本發明,惟本發明並 不限定於此。 (NMR分析) NMR之測定’係將化合物溶於氘化氯仿中以匪r裝 置(Varian公司製造,INOVA300型)進行測定。 (重量平均分子量) 重量平均分子量係以膠體過濾層析(Gpc,島津製作所 公司製造,商品名:LC-lOAvp)求出。測定之高分子化合物 先以調成0.5重量%濃度溶於四氫呋喃中,再取5〇 注入 GPC。GPC之移動相係使用四氫呋喃,並以〇. 6 mL/分鐘之 流速流動。管柱以TSKgel Super HM-H(日本東曹公司製 造)2支及TSKgel Super H2000(日本東曹公司製造)1支直 列連接。檢測器使用折射率偵檢器(曰本島津製作所公司製 造:RID-10A)。 合成例1 (N-(2, 6-二漠苯基)π比η各之合成)21 323560 201221540 &lt;Production method of compound&gt; The compound of the present invention can be synthesized by a generally known method when it is a low molecular compound. When the compound of the present invention is a polymer compound, the production method thereof is not particularly limited, and examples thereof include a method of performing a reductive coupling reaction with a Ni catalyst, a method using a Stille coupling reaction, a method using a Suzuk i coupling reaction, and the like. . The method of using the Stille coupling reaction and the Suzuki coupling reaction is preferred from the viewpoint that the ease of synthesis of the compound and the exchange of the copolymerization compound are easy. The method using the Suzuk i coupling reaction can be exemplified by having the formula: E!-T 丨-E2 (100) [wherein T1 represents Q1 or Q2. E1 and E2, each independently, represent a boronic acid residue or a boronic acid ester residue. One or more compounds shown in the formula: E3-T2-E4 (200) [wherein T2 represents Q2 when T1 is Q1; when T1 is Q2, it represents Q, E3, and E4, and each is independent, indicating A halogen atom or a reductive acid residue. A method for producing a step of reacting one or more compounds shown in the presence of a ruthenium ε catalyst and a base. In the formula (200), examples of the halogen atom represented by Ε3 and Ε4 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. The bromine atom and the iodine atom are preferred, and the bromine atom is more preferable because of the ease of synthesis of the polymer compound. In the formula (200), the sulfonic acid residue represented by Ε3 and Ε4 means the atomic group after the acidic hydrogen is removed by the sulfonic acid (-S〇3H), and specific examples thereof may be as follows: (Example: 曱 续 酸 酸 、 、 、 、 、 、 、 、 芳 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 22 An ester group (for example, a phenyl sulfonate group) and a trifluorosulfonate group. The method using the Stille coupling reaction can be exemplified by having the formula: E5-T3-E6 (300) [wherein, T3 represents Q1 or Q2. E5 and E6 are each independently and represent a trialkyltin alkyl group. One or more compounds shown in the formula: E7-T4-E8 (400) [wherein T4 represents Q2 when T3 is Q1; and Q1 when T3 is Q2. E7 and E8, each independently, represent a halogen atom. A method for producing a step of reacting one or more compounds shown in the presence of an Is catalyst. In the formula (300), examples of the trialkylstannyl group represented by E5 and E6 include a group represented by -S11R3 and the like. Wherein R represents an alkyl group. In the formula (400), examples of the halogen atom represented by E7 and E8 include a fluorine atom, a chlorine atom, a desert atom, and a broken atom. In terms of ease of synthesis of the polymer compound, a bromine atom or an iodine atom is preferred, and a bromine atom is more preferable. &lt;Composition&gt; The composition of the present invention is a species containing the compound of the present invention, and examples of the composition of the present invention include a composition containing two or more compounds represented by the formula (1) A composition containing a compound different from the compound represented by the formula (1) and one or more compounds represented by the formula (1). Examples of the compound different from the compound represented by the formula (1) include organic semiconductor materials other than the compound represented by the formula (1). The composition of the present invention may also be a liquid composition comprising a compound represented by the formula (1) of 23 323560 201221540 and a solvent. &lt;Film&gt; Next, a film comprising the compound of the formula (1) of the present invention will be described. Since the compound represented by the formula (1) is an organic compound, the film may be referred to as an "organic film" hereinafter. The preferred thickness of the organic film of the present invention varies depending on the element using the organic film, but is generally in the range of 1 nm to 100//m, preferably 2 nm to 100 nm, more preferably 5 nm to 500 nm, and 20 nm to 200 nm. Better. An organic thin film of such a thickness can form an organic thin film element having good charge transportability and sufficient strength. The organic film may contain one type of the compound represented by the above formula (1), or two or more types. When the organic film contains a component other than the compound represented by the above formula (1), the compound represented by the above formula (1) is preferably contained in an amount of 10% by mass or more, more preferably 30% by mass or more. When the content of the compound represented by the above formula (1) is less than 30% by mass, film formation becomes difficult, and thus it is difficult to produce a favorable charge mobility. Examples of the components other than the compound represented by the above formula (1) include organic semiconductor materials other than the compound represented by the above formula (1). The organic film of the present invention can be produced by any method. For example, the compound represented by the formula (1) can be dissolved in an organic solvent to form a solution, and then formed into a film. The organic solvent used in the production of the organic film of the present invention is preferably an organic solvent which can dissolve or disperse the components contained in the organic film well. If necessary, it may be heated to dissolve the component contained in the organic film 24 323560 201221540 in an organic solvent. Examples of organic solvents can be exemplified by saturated hydrocarbons such as octyl alcohol and cyclohexane; benzene, benzene, hexanol, gamma, chloroform, dioxin, tetrachlorination, and benzene; Saturated smoke; hydrocarbon; chlorobenzene, odorant, etc., halogenated saturated isopropanol, butyl SE筮, one phase of unsaturated hydrocarbon; ethanol, propanol, alcohol, third butanol, etc.; A = N, N, Nf, etc. _; N, N-dimethylformamidine, acetophenone, &quot; basal porphyrin oxides: A view of the dissolution of the ground, with unsaturated hydrocarbons, (four) ^ shell It is better to make the compound good, dichloroform or dichloro. The aforementioned coffee &quot; kinds of early alone can also be used in combination of two or more. Top coating: hair = = system: 'The substrate removal operation can be performed with the aforementioned solution or the like. Example of _== After coating, solution: plate coating method, gravure coating method, bar coating method, roll coating method, line method, /3/X coating method, nozzle coating method, screen printing The printing method, the flexographic printing capillary method, the nozzle ink printing method, the dispensing printing method, the nozzle coating method, and the coating operation can also be carried out under heating. In addition to being capable of being coated with a high concentration coating liquid to form a homogeneous crucible, a material which is difficult to apply at room temperature or the like can be used. At the same time, the organic film can be further imparted with a grinding method, a photo-alignment method, a sexual kicking method, a pull coating method, or the like to further enhance its charge transport. &lt;Organic film element 323560 25 201221540 The present invention Since the organic thin film contains a compound represented by the formula (1) having a low reorientation energy, it has excellent charge transport properties, and thus can be used for producing an organic thin film device such as an organic semiconductor element or an organic solar cell. The compound of the present invention and the composition containing the same are particularly useful as a charge transport material for an organic semiconductor device. The reorientation energy is equivalent to four times the energy barrier associated with the structural change of the hole movement. The smaller the amount, the more likely the high hole mobility. &lt;Organic Oxygen Element&gt; The organic transistor element includes a compound having the following composition: a source electrode and a drain electrode, and a current path between the electrodes includes a compound represented by the formula (1). An active layer, and a gate electrode that controls the amount of current through the current path. Examples of the organic transistor element having such a configuration include a field effect type organic transistor element and an electrostatic induction type organic transistor element. The field effect type organic transistor element generally has an organic transistor element having the following structure: a source electrode and a drain electrode, and an active layer containing the compound represented by the formula (1) as a current path between the electrodes, and control A gate electrode that passes a current amount of the current path, and an insulating layer disposed between the active layer and the gate electrode. In particular, an organic transistor element in which a source electrode and a drain electrode are provided to be connected to an active layer and a gate electrode is provided sandwiching an insulating layer connected to the active layer is preferable. The electrostatic induction type organic transistor device generally has an organic transistor element having a structure in which a source electrode and a drain electrode, an active layer including a compound represented by the formula (1), and a control of a current path between the electrodes; Passing 26 323560 201221540 passes the gate electrode of the current amount of the current path, and the gate electrode is disposed in the active layer. Among them, an organic transistor element in which a source electrode, a drain electrode, and the above-described gate electrode are disposed to be connected to the active layer is particularly preferable. The gate electrode may have a configuration in which a current path from the source electrode to the drain electrode can be formed, and a current amount flowing through the current path can be controlled by a voltage applied to the gate electrode, and examples thereof include a comb type. electrode. Fig. 1 is a schematic cross-sectional view showing an example of an organic transistor element (field effect type organic transistor element) of the present invention. The organic transistor element 100 shown in FIG. 1 includes a substrate 1, a source electrode 5 and a gate electrode 6 formed at a predetermined interval on the substrate 1, to cover the source electrode 5 and the drain electrode. 6 is an insulating layer formed on the substrate 1, an insulating layer 3 formed on the active layer 2, and insulated in such a manner as to cover the insulating layer 3 on the field between the source electrode 5 and the drain electrode 6. A gate electrode 4 is formed on layer 3. Fig. 2 is a schematic cross-sectional view showing another example of the organic transistor element (field effect type organic transistor element) of the present invention. The organic transistor element 110 shown in FIG. 2 includes a substrate 1 and a source electrode 5 formed on the substrate 1 and an active layer 2 and a source formed on the substrate 1 so as to cover the source electrode 5 The electrode electrode 5 holds the gate electrode 6 formed on the active layer 2 at predetermined intervals, the insulating layer 3 formed on the active layer 2 and the gate electrode 6, and covers between the source electrode 5 and the drain electrode 6. The gate electrode 4 is formed on the insulating layer 3 in the manner of the insulating layer 3 in the field. Fig. 3 is a schematic cross-sectional view showing another example of the organic transistor element (field effect type organic transistor element) of the present invention. As shown in Fig. 3, there is a 27 323 560 201221540 electromechanical crystal τ 120 120' which has a substrate 丨 and a gate electrode 4 formed on the substrate i to cover the interpole electrode 4 to form an insulating layer on the substrate. a source electrode 5 and a secret electrode 6 formed on the insulating layer 3 in a manner to cover a portion of the insulating layer 3 on which the gate electrode 4 is formed, and a source electrode 5 and a gate electrode The active layer 2 formed on the extrudate 3 in the manner of the portion of the electrode 6. Fig. 4 is a schematic cross-sectional view showing another example of the organic transistor element (field effect type organic transistor element) of the present invention. The organic transistor element 130' shown in FIG. 4 is provided with a substrate 1, a pole electrode 4 formed on the substrate 1, and a substrate formed on the substrate 1 so as to cover the gate electrode 4. 3 a source electrode 5 formed on the insulating layer 3 so as to cover a portion of the insulating layer 3 on which the gate electrode 4 is formed, and an active layer 2 formed on the insulating layer 3 so as to cover the source electrode portion The line electrode 6 is formed on the insulating layer 3 at a predetermined interval from the source electrode 5 in such a manner as to cover the portion of the impurity layer 2. Fig. 5 is a schematic cross-sectional view showing another example of the organic transistor element (70 pieces of the electrostatic induction type organic transistor) of the present invention. As shown in Fig. 5, an organic transistor element 140 is provided with a source electrode 5 formed on a substrate i, an active layer 2 formed on the source electrode 5, and a predetermined interval on the active crucible 2 The plurality of gate electrodes 4 formed and the active layer 2a formed on the active layer 2 so as to form the active layer 2 may be the same as or different from the material constituting the active layer 2) And the secret electrode 6 formed on the active layer 2a±. Fig. 6 is a schematic cross-sectional view showing another example of the organic transistor element of the present invention (field effect type organic 323560 28 201221540 • transistor element). The electromechanical crystal element 150 shown in Fig. 6 has a substrate 丨, an active layer 2 formed on the substrate 2、, a source electrode 5 and a drain formed on the active layer 2 at predetermined intervals. The electrode 6, the insulating layer 3 formed on the active layer 2 so as to cover a portion of the source electrode 5 and the drain electrode 6, and the insulating layer 3 each covering the source electrode 5 underneath are in the field of A gate electrode 4 formed on the insulating layer 3 in a manner in which a portion of the insulating layer 3 of the gate electrode 6 is formed is formed below. Fig. 7 is a schematic cross-sectional view showing another example of the organic transistor element (field effect type organic transistor element) of the present invention. The organic transistor element 160 shown in FIG. 7 includes a substrate 丨, a gate electrode 4 formed on the substrate 、, and a rim layer 3 formed on the substrate 覆盖 so as to cover the gate electrode 4, The active layer 2 formed to cover the field of the insulating layer 3 having the gate electrode 4 formed thereon, the source electrode 5 formed on the active layer 2 in such a manner as to cover a portion of the active layer 2, and the active layer 2 are covered The drain electrode 6 is formed on the active layer 2 in part and at a predetermined interval from the source electrode 5. Fig. 8 is a schematic cross-sectional view showing another example of the organic transistor element (field effect type organic electrode element) of the present invention. The organic electric sa body element 170' shown in Fig. 8 includes a gate electrode 4, an insulating layer 3 formed on the gate electrode 4, an active layer 2 formed on the insulating layer 3, and an active layer 2 The source electrode 5 and the electrodeless electrode 6 are formed while maintaining a predetermined interval. In this case, the gate electrode 4 also serves as the substrate 1. In the above organic transistor device of the present invention, the active layer 2 and/or 323560 29 201221540 active layer 2a is composed of a film containing the compound of the present invention, and a current between the source electrode 5 and the drain electrode 6 is formed. Path (channel). At the same time, the gate electrode 4 can control the amount of current passing through the current path (channel) via application of a voltage. Such a field effect type organic transistor element can be produced by a known method, for example, in the method described in Japanese Laid-Open Patent Publication No. Hei 5-100069. The electrostatic induction type organic transistor element can be produced by a known method as disclosed in Japanese Laid-Open Patent Publication No. 2004-006476. The material of the substrate 1 may be any material that does not interfere with the characteristics of the organic transistor element. A substrate, a glass substrate, a flexible film substrate, or a plastic substrate can be used. The material of the insulating layer 3 may be any material having high electrical insulating properties, and may be used: Si〇x, SiNx, Ta2〇5, polyimine, polyvinyl alcohol, polyvinylphenol, organic glass, photoresist, etc. However, from the viewpoint of low voltage, it is preferable to use a material having a high permittivity. When the active layer 2 is formed on the insulating layer 3, in order to improve the interface characteristics between the insulating layer 3 and the active layer 2, the surface of the insulating layer 3 may be treated with a surface treating agent such as a decane coupling agent to perform surface modification to form the active layer 2 . When there is an airport effect transistor, the charge of electrons and holes is generally near the interface between the insulating layer and the active layer. Therefore, the state of the interface has a large influence on the mobility of the transistor. Because of this, there has been a proposal to control the interface with a decane coupling agent in terms of improving the interface state to improve the characteristics (for example, Surface Chemistry, 2007, Vol. 28, No. 5, p. 242-248). 30 323560 201221540 Examples of decane coupling agents include alkyl chloro decanes (octyltrichloro decane (0TS), octadecyl trichloro decane (ODTS), phenethyl trioxane, etc.), A mercaptoamine compound such as an alkyl alkoxysilane, a fluoroalkylchlorodecane, a fluoroalkyl alkane oxide or a hexamethylene diazoxide (HMDS). The surface of the insulating layer may also be subjected to ozone uv treatment or 〇2 plasma treatment before being treated with the surface treatment agent. By such a treatment, the surface energy of the tantalum oxide film or the like used as the insulating layer can be controlled, and the orientation of the film constituting the active layer on the insulating layer can be improved by surface treatment, thereby obtaining high charge transportability ( Mobility). In the gate electrode 4' can also be used: gold, platinum, silver, copper, chromium, palladium, ing, turn, low-resistance Shixi polymer, low-resistance amorphous austenite compound metal, and tin oxide Indium oxide, indium, tin oxide (ITG) and other materials. These materials may be used alone or in combination of two or more. The gate electrode 4 can also be doped with a high concentration doped 11 substrate. High-density doped dream substrate, == as _remaining energy, and also (4) is the nature of the substrate. When the gate electrode 4 has the performance as a substrate, the i-based it is connected to the gate electrode 4 In the electromechanical crystal element, it is better to omit your radial electrode 5 and bungee ray, especially from gold m to low-resistance material (four) ... ... steel, chromium, palladium, aluminum, indium, in good use. These materials may be used alone or in combination of two or more. In the above organic transistor device, the source electrode 5 and the drain electrode 6, the 323560 31 201221540 and the active layer 2 may be interposed by other compounds. Layer. Examples of such a layer include a low molecular compound having electron transport property, a low molecular compound having hole transportability, a metal test, an alkaline earth metal, a rare earth metal, a complex of such a metal and an organic compound, Oxidizing sulfur compounds such as iodine, bromine, gas, gasification, sulphuric acid, sulfuric acid, sulfur dioxide, sulfate, etc., nitric oxide compounds such as nitric acid, nitrogen dioxide, nitrate, halogenated acid such as perchloric acid and hypochlorous acid A layer formed of an arylthiol compound such as a compound, an alkanethiol compound, an aryl thiol or a fluorinated alkyl aryl thiol. At the same time, it is preferable that the organic transistor element of the above type is a protective element after it is formed to form a protective film on the organic transistor element. Thus, the crystal element blocks the atmosphere, and thus the deterioration of the characteristics of the organic transistor element can be suppressed. Further, in the case of an organic electric element, the organic electroforming film is reduced in the forming step.卞 办 丌 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 忒 = It is preferred to form a protective film under exposure to the atmosphere (for example, under the machine). An organic electro-type transistor having a dimethyl structure of this type can be used as a main-field-effect organic electroluminescence display, a liquid crystal display device of the 阵 阵 阵 及 及 及 及 及 及 及 及 机场 机场 机场 机场 机场 机场The active compound having the above-mentioned actual compound and having the modified-two-shot active layer has the active layer of the rim of the present invention, so that the field effect mobility of the 323560 32 201221540 can be improved. Therefore, it is possible to manufacture a display or the like having a sufficient reaction speed. EXAMPLES Hereinafter, the present invention will be described in more detail, but the present invention is not limited thereto. (NMR analysis) The measurement of NMR was carried out by dissolving the compound in deuterated chloroform in a 匪r apparatus (manufactured by Varian Co., Ltd., INOVA300 type). (Weight average molecular weight) The weight average molecular weight was determined by colloidal filtration chromatography (Gpc, manufactured by Shimadzu Corporation, trade name: LC-lOAvp). The polymer compound to be measured was first dissolved in tetrahydrofuran at a concentration of 0.5% by weight, and then injected into GPC at 5 Torr. The mobile phase of GPC was tetrahydrofuran and flowed at a flow rate of mL 6 mL/min. The column was connected in series with TSKgel Super HM-H (manufactured by Tosoh Corporation of Japan) and TSKgel Super H2000 (manufactured by Tosoh Corporation of Japan). The detector used a refractive index detector (manufactured by Sakamoto Shimadzu Corporation: RID-10A). Synthesis Example 1 (Synthesis of each N-(2,6-di-diphenyl) π ratio η)

先在燒瓶中加入2, 6-二溴苯胺48g(0. 19mol)、2, 5-曱氧基四氫咬喃28g(0. 21mol)及乙酸。再將反應 33 323560 201221540 溶液加熱至120° C並同時擾拌4小時。之後,再濃縮該反 應溶液,並在500mL之水與500mL之曱醇之混合液中將該 濃縮溶液滴入以生成析出物。將該析出物過濾後,加以乾 燥’即製成N-(2, 6-二溴苯基)。比洛。其製成量為52g,產 率為91%。 Α-ΝΜΚΟΟΟΜΗζ,CDCla) &lt;5 7. 65(d,2H),7. 15(t,1H),6. 69 (m,2H),6. 39(m,2H) 合成例2 (N-(2, 6-二(3-嗟吩基)苯基)。比洛之合成)First, 2,6-dibromoaniline 48 g (0.19 mol), 2, 5-decyloxytetrahydrocarbamate 28 g (0.2 mol) and acetic acid were added to the flask. The reaction 33 323560 201221540 solution was then heated to 120 ° C while being disturbed for 4 hours. Thereafter, the reaction solution was further concentrated, and the concentrated solution was dropped into a mixture of 500 mL of water and 500 mL of decyl alcohol to form a precipitate. The precipitate was filtered and dried to give N-(2,6-dibromophenyl). Bilo. The amount produced was 52 g and the yield was 91%. Α-ΝΜΚΟΟΟΜΗζ, CDCla) &lt;5 7. 65(d, 2H), 7. 15 (t, 1H), 6. 69 (m, 2H), 6. 39 (m, 2H) Synthesis Example 2 (N- (2,6-bis(3-nonyl)phenyl). Synthesis of bilo

先將燒瓶中之氣體以氮氣取代,然後在此燒瓶中加入 卜(2,6-二漠苯基)'»比嘻23旦(78丽〇1)、3~°塞吩删酸24舀 (〇. 19mol)、氯化曱基三辛基銨(商品名:Aliquat 336(註 冊商標),Aldrich公司製造)1.6g、二氣雙(三苯基膦)把 i· 6g(2· 3mmol)及曱苯300mL,並使反應溶液回流。再於該 反應溶液中滴入2mol/L之碳酸鈉水溶液150mL。滴入後, 反應溶液再經過8小時回流。之後,去除該反應溶液之水 層’並以水洗淨3次。該製成之曱苯溶液再經過濃縮,並 滴入甲醇以生成析出物。該析出物經過過濾、乾燥後,即 製成(N-(2, 6-二(3-噻吩基)苯基比咯。其製成量為20g, 產率為84%。 34 323560 201221540 ^-NMRCSOOMHz^DCh) δ1 〇ttn .r 沖…&quot;川… ,2Η),7.45“,1Η),7.18 (m,2H),6.91(m,2H),6. 72(m 9u、p 實施例 (化合物1之合成) ^^ ,, , ’ 2H)’6· 42(ro, 2H),6.15(m,2H)First, the gas in the flask was replaced with nitrogen, and then the flask was added with b (2,6-di-diphenyl)'» than 嘻23 denier (78 〇1), and 3~° thiophene was acid 舀24舀 ( 19. 19 mol), decyltrimethylammonium chloride (trade name: Aliquat 336 (registered trademark), manufactured by Aldrich Co., Ltd.) 1.6 g, di- gas bis(triphenylphosphine), i·6 g (2.3 mmol) and Toluene 300 mL, and the reaction solution was refluxed. Further, 150 mL of a 2 mol/L sodium carbonate aqueous solution was added dropwise to the reaction solution. After the dropwise addition, the reaction solution was refluxed for another 8 hours. Thereafter, the aqueous layer of the reaction solution was removed and washed three times with water. The resulting benzene solution was further concentrated, and methanol was added dropwise to form a precipitate. After the precipitate was filtered and dried, it was made into (N-(2,6-bis(3-thienyl)phenylpyrrole. The yield was 20 g, and the yield was 84%. 34 323560 201221540 ^- NMRCSOOMHz^DCh) δ1 〇ttn .r 冲...&quot;川... , 2Η), 7.45", 1Η), 7.18 (m, 2H), 6.91 (m, 2H), 6. 72 (m 9u, p Example ( Synthesis of Compound 1) ^^ ,, , ' 2H)'6· 42(ro, 2H), 6.15(m, 2H)

入 先將燒瓶中之氣體以氮氣 N-(2 6-二(3-噻吩某)笼其/、代,後在此燒瓶中加 πτηη 苴土)吡咯3.k(9.8raraol)、氣化鐵 (III)13g(78mmol)、硝基甲 ρ 1Λ τ ^ . 1〇mL 及二曱苯 500mL。之後, 該反應&gt;谷液再於至溫(25°c)下播胜q 、,4 β。t A r筏拌3小時。該反應溶液再 以水洗淨3 :人,之後,將二曱笑 τ本〉谷液中之二甲苯蒸發,製 成固體。再將該m體吸附於㈣管柱中之鄉並以正己 烷沖提精製’再回收該正己烷溶液。之後,蒸發正己烧, 即製成化合物1。其製成量為0. 40g,產率為14%。 j-NMRQOOMHz,CDC13) 5 7. 94(d,2H),7. 75(d,2H),7. 61 (t,1H),7. 44(d,2H),7. 12(s,2H) 合成例3 (N-(2, 6-二(3-噻吩基)-4-十二烷基苯基)°比咯之合成) 35 323560 201221540 C12H25The gas in the flask was firstly purged with nitrogen N-(2 6-bis(3-thiophene), then πτηη alumina was added to the flask. Pyrrole 3.k (9.8raraol), gasified iron (III) 13 g (78 mmol), nitromethyl ρ 1 Λ τ ^ . 1 〇 mL and diphenyl benzene 500 mL. Thereafter, the reaction &gt; the trough was again propagated to q (, 4 β) at a temperature (25 ° C). t A r 筏 mix for 3 hours. The reaction solution was washed with water for 3: a person, and then the xylene in the sputum broth was evaporated to prepare a solid. The m body was adsorbed to the (four) column and washed with n-hexane to recover the n-hexane solution. Thereafter, the evaporation was once burned to prepare Compound 1. The yield was 0.40 g, and the yield was 14%. j-NMRQOOMHz, CDC13) 5 7. 94(d,2H), 7.75(d,2H), 7.61 (t,1H), 7.44(d,2H), 7. 12(s,2H Synthesis Example 3 (Synthesis of N-(2,6-bis(3-thienyl)-4-dodecylphenyl) ° ratio) 35 323560 201221540 C12H25

A 9i2H25 MeO-^/^N^-OMeA 9i2H25 MeO-^/^N^-OMe

NBS DMF nh2 nh2 b(〇h)2 0 PdCI2(PPh3)2 ?12H25 Aliquat 336 XX Νβ2〇〇3 / H2O ^ -^ 甲笨 sJ ύ is 先在燒舨中加入4-十二烷基苯胺31g(0. 12mol)、N,N-二甲基甲醯胺150mL。再將該反應溶液冷卻至〇°c,一面攪 拌一面滴入含N-漠琥ί白醯亞胺2. 6mol/L之N,N-二曱基甲 醯胺溶液100mL。滴入終了後’再於室溫(25°C)下攪拌反 應1小時。之後,將該反應溶液倒入7〇〇mL之水中,再加 入700mL之氣仿,萃取其中之有機層。該有機層再以水洗 淨3次,之後,將有機層濃縮而製成2, 6-二溴-4-十二烷 基苯胺。其製成量為45g。 再在燒瓶中加入2, 6-二溴-4-十二烷基苯胺45g、2, 5- 二甲氧基四氫呋喃20g(0. 15mol)及乙酸400mL。再將該反 應溶液加熱至12(TC,並攪拌4小時。之後,濃縮該反應 溶液’並在300mL之水與200mL之甲醇之混合液中滴入經 濃縮之反應溶液,製成析出物。該析出物經過過濾、乾燥 後即製成N-(2, 6-二漠-4-十二烧基苯基比p各。其製成 量為42g。 36 323560 201221540 之後將燒瓶甲之氣體以氮氣取代後,在該燒瓶中加入 N-(2, 6-二溴-4-十二烷基苯基)吡咯4〇g、3-噻吩硼酸23g (0· 18mol)、氣化曱基三辛基銨(商品名:Aliquat 336(登 錄商標)’ Aldrich公司製造)3.〇g、二氯二(三苯基膦)鈀 (PdCl2(PPh3)2)l. 〇g及甲苯3〇〇mL,並使反應溶液回流。再 於該反應溶液中滴入2mol/L之碳酸鈉水溶液170mL。滴入 後’反應溶液經過8小時回流。之後,去除該反應溶液之 水層’並以水洗淨2次。再將甲苯溶液中之甲苯蒸發,製 成固體。之後將該固體吸附於矽膠管柱中之矽膠,並以正 己烷沖提精製’再回收該正己烷溶液。之後,蒸發正己烷, 即製成N-(2, 6-二(3-噻吩基)-4-十二烷基苯基)吼咯。其 製成量為32g,產率為79%。 W-NMRQOOMHz,CDC13) 5 7. 36(s,2H),7. 16(m,2H), 6. 90(m,2H),6. 71(m,2H),6. 41(m,2H) ’ 6· 12(m,2H),2. 70 (t,2H),1· 71(m,2H),1· 2-1· 4(m,18H),0· 88(t,3H) 實施例2 (化合物2之合成)NBS DMF nh2 nh2 b(〇h)2 0 PdCI2(PPh3)2 ?12H25 Aliquat 336 XX Νβ2〇〇3 / H2O ^ -^ A stupid sJ ύ is first added 4-dodecylaniline 31g in the burning pot ( 0. 12 mol), N,N-dimethylformamide 150 mL. The reaction solution was cooled to 〇 °c, and 100 mL of a N,N-dimercaptocaramine solution containing N-methyl sulphonimine 2. 6 mol/L was added dropwise while stirring. After the completion of the dropwise addition, the reaction was further stirred at room temperature (25 ° C) for 1 hour. Thereafter, the reaction solution was poured into 7 mL of water, and then 700 mL of a gas mixture was added thereto, and the organic layer was extracted. The organic layer was washed three times with water, and then the organic layer was concentrated to give 2,6-dibromo-4-dodecanilide. It was made in an amount of 45 g. Further, 45 g of 2,6-dibromo-4-dodecylaniline, 20 g (0.15 mol) of 2,5-dimethoxytetrahydrofuran, and 400 mL of acetic acid were placed in the flask. The reaction solution was further heated to 12 (TC, and stirred for 4 hours. Thereafter, the reaction solution was concentrated] and a concentrated reaction solution was added dropwise to a mixture of 300 mL of water and 200 mL of methanol to prepare a precipitate. After the precipitates were filtered and dried, N-(2,6-di-di-4-pyrylphenyl group ratio p was prepared. The amount of the precipitate was 42 g. 36 323560 201221540, the gas of the flask was nitrogen. After the substitution, N-(2,6-dibromo-4-dodecylphenyl)pyrrole 4〇g, 3-thiopheneboronic acid 23g (0·18 mol), gasified mercaptotrioctyl group were added to the flask. Ammonium (trade name: Aliquat 336 (registered trademark) 'Manufactured by Aldrich Co., Ltd.) 3. 〇g, dichlorobis(triphenylphosphine)palladium (PdCl2(PPh3)2)l. 〇g and toluene 3〇〇mL, and The reaction solution was refluxed, and 170 mL of a 2 mol/L sodium carbonate aqueous solution was added dropwise to the reaction solution. After the dropwise addition, the reaction solution was refluxed for 8 hours. Thereafter, the aqueous layer of the reaction solution was removed and washed twice with water. Then, the toluene in the toluene solution is evaporated to prepare a solid, and then the solid is adsorbed to the tannin extract in the tannin tube column, and refined by n-hexane. The n-hexane solution was recovered again, and then n-hexane was evaporated to obtain N-(2,6-bis(3-thienyl)-4-dodecylphenyl)phosphonium. The amount thereof was 32 g. The yield is 79%. W-NMRQOOMHz, CDC13) 5 7. 36(s, 2H), 7. 16 (m, 2H), 6. 90 (m, 2H), 6. 71 (m, 2H), 6 41(m,2H) ' 6· 12(m,2H), 2. 70 (t,2H),1·71(m,2H),1· 2-1· 4(m,18H),0· 88(t,3H) Example 2 (Synthesis of Compound 2)

先將燒瓶中之氣體以氮氣取代後,在該燒瓶中加入After the gas in the flask was replaced with nitrogen, it was added to the flask.

N-(2, 6-二(3-噻吩基)—4-十二烷基苯基)吡咯7. 6g (0· 016mol)、氯化鐵(iji)2ig(〇· i3m〇l)、峭基甲烧 i〇mL 37 323560 201221540 及甲苯5GGmL。該反應溶液再於室溫(饥)下麟4小時。 之後,遭縮該反應溶液,並注入5〇〇mL之水。再加入况 之氯仿’萃取其中有機層之氣仿溶液,氣仿溶液再以水洗 淨2 -人。之後’將氣仿溶液中之氣仿蒸發,製成固體。再 將該固體吸附於石夕膠管柱中之石夕膠,並以正己燒沖提精製, 再回收該正己烧溶液。之後,蒸發正己院。其中製成之固 體,再經過熱的異丙醇再結晶,即製成化合物2。其製成 量為2. 2g,產率為2. 9%。 H-NMR(300MHz,CDCh) 6 7. 65 至 7. 70(m,4H),7. 38(m, 2H), 7. 02(s,2H),2. 85(t,2H),1. 77(m,2H),1. l-l. 4(m,18H), 0.88(t, 3H) 實施例3 (化合物3之合成)N-(2,6-bis(3-thienyl)-4-dodecylphenyl)pyrrole 7. 6g (0· 016mol), iron chloride (iji) 2ig (〇· i3m〇l), steric Base carb i i mL 37 323560 201221540 and toluene 5 GGmL. The reaction solution was further incubated at room temperature (hunger) for 4 hours. Thereafter, the reaction solution was contracted, and 5 mL of water was injected. The chloroform was added to extract the gas-like solution of the organic layer, and the gas-like solution was washed with water for 2 - person. Thereafter, the gas in the gas imitation solution was evaporated to give a solid. Then, the solid is adsorbed to the Shiqi gum in the Shixi rubber pipe column, and refined by the hexaplox, and the normal hexane solution is recovered. After that, it evaporated into the courtyard. The solid formed therein was recrystallized by hot isopropanol to prepare Compound 2. 9%。 The yield was 2. 2g, the yield was 2.9%. H-NMR (300MHz, CDCh) 6 7. 65 to 7.70 (m, 4H), 7. 38 (m, 2H), 7. 02 (s, 2H), 2. 85 (t, 2H), 1 77(m, 2H), 1. ll. 4(m, 18H), 0.88(t, 3H) Example 3 (Synthesis of Compound 3)

在燒瓶中加入0. 50g(l. lmmol)之化合物2、lOOmL之 氣仿,再將反應溶液冷卻至-78°C並攪拌。之後於該反應溶 液中加入N-硪琥珀醯亞胺〇.48g(2. lmmol),再於-78°C下 保溫攪拌3小時。然後,將反應溶液之溫度緩緩降至室溫 (25°C)。之後’該氣仿溶液之反應溶液再以水(5〇mL)洗淨 2次。將氯仿溶液中之氣仿蒸發,即製成固體。之後將該 38 323560 201221540 固禮吸附於矽膠管柱中之矽膠,並以正己烷沖提精製,再 回收該正己烷溶液。經過蒸發正己烷後。即製成化合物3。 其製成量為0. 20g,產率為26%。 j-NMRQOOMHz,CDCh) 5 7· 78(d,2H),7. 65(s,2H),7. 49 (d,2H) ’ 2. 86(t,2H),1. 77(m,2H),1. 2-1. 3(m,18H),0. 87 (t,3H) 實施例4 (化合物4之合成)0. 50 g (1.1 mmol) of the compound 2, 100 mL of a gas mixture was added to the flask, and the reaction solution was cooled to -78 ° C and stirred. Then, N-non-ammonium iodide 〇.48 g (2.1 mmol) was added to the reaction solution, and the mixture was stirred at -78 °C for 3 hours. Then, the temperature of the reaction solution was gradually lowered to room temperature (25 ° C). Thereafter, the reaction solution of the gas-like solution was washed twice with water (5 〇mL). The gas in the chloroform solution was evaporated to give a solid. Then, the 38 323560 201221540 was applied to the silicone rubber in the squeezing tube column, and refined by n-hexane purification, and the n-hexane solution was recovered. After evaporation of n-hexane. That is, Compound 3 was prepared. The yield was 0.20 g, and the yield was 26%. j-NMRQOOMHz, CDCh) 5 7·78(d, 2H), 7. 65(s, 2H), 7. 49 (d, 2H) ' 2. 86(t, 2H), 1. 77(m, 2H ), 1. 2-1. 3 (m, 18H), 0. 87 (t, 3H) Example 4 (Synthesis of Compound 4)

八n* ,Ί夂· # 口及 TOU 丁刀口 /V rn J(〇 15ΐΜ〇1)之化合物 3、2,2,-聯吡啶 0.059g 应龐JT1)、四氫咳喃7mL ’並於室溫(25°C)下擾样。言 之ί飞i再加人雙(1,4~環辛二烯)錄(Q)G· 1Gg(G· 38mmo1 以氯苯作為展㈣· = ^溶解,職苯溶液再通」 苯溶液濃縮,並滴3柱進行精製。將精製後之』 之化合物4。該化合物4 *物,即可製成 為1.3xl〇3。 奐舁聚本乙烯之重量平均分子i 實施例 323560 39 201221540 (化合物5之合成)Eight n*, Ί夂·# mouth and TOU Dingdaokou/V rn J (〇15ΐΜ〇1) compound 3, 2, 2,-bipyridyl 0.059g should be Pang JT1), tetrahydrogenethane 7mL 'and room Disturbance at temperature (25 ° C).言之紫飞i plus human double (1,4~cyclooctadiene) recorded (Q)G· 1Gg (G· 38mmo1 with chlorobenzene as a display (four)· = ^ dissolved, benzene solution re-passed) benzene solution concentrated And refining is carried out by dropping 3 columns. The compound 4 after purification is prepared. The compound 4* can be made into 1.3×l〇3. The weight average molecular weight of the fluorene ethylene is 323560 39 201221540 (Compound 5 Synthesis)

化合物3 PdCI2(dppf) NaOH aq.Compound 3 PdCI2(dppf) NaOH aq.

9-BBN9-BBN

THF 先將燒瓶中之氣體以氮氣取代後,之在該燒瓶中加入 1-十二烯 〇. 21g(l· 2mmol)、0. 5M 之 9-硼二環[3. 3. 1]壬烷 之四氫呋喃溶液2. 5mL,再使反應溶液於室溫(25。〇下攪 拌10小時。之後’再於該反應溶液中加入〇. 6〇g(〇. 83mmol) 之化合物3。其次,加入二氯[1,丨,-雙(二苯基膦)二茂鐵] 把(PdCl2(dppf))6. 8mg。該反應溶液經過回流後,於其中 加入5M之氫氧化鈉水溶液〇· 66mL。之後,反應溶液再經 過回流10小時。再將該反應溶液注入水中,並加入曱苯, 再將曱苯層萃取。之後,曱苯溶液再以水洗淨2次。將甲 苯溶液中之曱笨蒸發’即製成固體。之後將該固體吸附於 矽膠管柱中之矽膠’並以正己烷沖提精製,再回收該正已 烷溶液。之後,蒸發正己烷,即製成化合物25。其製成量 為0. 20g,產率為30%。 - W-NMROOOMHz,CDCh) &lt;5 7. 72(d,2H),7. 66(d,2H),7. 〇5(s, 2H) ’ 2. 85(m,6H),1· 80(m,6H),1. 2 至 1. 5(m, 54H),〇. 95 40 323560 201221540 (m,9H) * 實施例6 • (化合物6之合成)THF After the gas in the flask was replaced with nitrogen, 1-dodecene was added to the flask. 21 g (1.2 mmol), 0. 5M 9-borobicyclo[3.3.1]decane The solution of the tetrahydrofuran solution was 2.5 mL, and the reaction solution was stirred at room temperature (25 ° C. for 10 hours. Then, the reaction solution was further added with 〇. 6 〇g (〇. 83 mmol) of the compound 3. Next, two were added. Chloro[1,丨,-bis(diphenylphosphino)ferrocene] (PdCl2(dppf)) 6.8 mg. After the reaction solution was refluxed, a 5 M aqueous sodium hydroxide solution was added thereto, 66 mL. The reaction solution was further refluxed for 10 hours, and then the reaction solution was poured into water, and toluene was added, and then the benzene layer was extracted. After that, the benzene solution was washed twice with water, and the ruthenium solution was evaporated. 'A solid is formed. The solid is then adsorbed to the tannin extract in the column of the rubber hose and rinsed with n-hexane to recover the n-hexane solution. Thereafter, the n-hexane is evaporated to prepare the compound 25. The amount is 0. 20g, the yield is 30%. - W-NMROOOMHz, CDCh) &lt;5 7. 72(d, 2H), 7. 66(d, 2H), 7. 〇5(s, 2H) 2. 85 (m, 6H), 1·80 (m, 6H), 1. 2 to 1.5 (m, 54H), 〇. 95 40 323560 201221540 (m, 9H) * Example 6 • (Compound 6 Synthesis)

先將燒瓶中之氣體以氮氣取代後,在該燒瓶中加入 0. 20g(0. 25mmol)之化合物5、氯苯50mL。該反應液中再加 入氣化鐵(111)0.4(^(2.5111111〇1)。之後,再於120°(:下反應 6小時。其後,該反應溶液再以水洗淨2次,並將該氯苯 溶液通過矽膠管柱進行精製。再濃縮該氯苯溶液,並滴入 曱醇中。過濾、該析出物,即可製成化合物6。其製成量為 44mg。化合物6換算聚苯乙烯之重量平均分子量為4.4x103。 實施例7 (有機電晶體元件1之製造及其特性之評估) 係以含電荷傳輸性化合物之化合物4的溶液,製成含 有如第8圖所示構造之有機電晶體元件1。 即先以作為閘極電極之高濃度摻雜η-型矽基板進行 表面熱氧化操作,以形成200nm之矽氧化膜。將經過此操 作製成已形成熱氧化膜(以下亦稱為熱氧化膜)的基板在丙 酮中浸泡10分鐘進行超音波洗淨後,再以臭氧-UV處理器 經臭氧-UV處理30分鐘。之後,熱氧化膜再於大氣中將六 41 323560 201221540 甲基H(HMDS) tu讀塗佈將熱氧化膜進行表面修飾操 作。 、 其次,將化合物4溶解於氯仿中,經過過滤膜過遽調 製成塗佈液。該塗佈液中之化合物4之濃度,為〇·5重量%。 之後’再以該塗佈液在已經過前述表面修飾操作之执 氧化膜上以旋轉塗佈法塗佈,形成含有化合物4之有機薄 膜。其後,以使用金屬罩之真空級法在有_膜上蒸鍛 氧化鉬(Μο〇3),以形成源極電極及汲極電極,製成有機電 晶體元件1。 之後在使有機電晶體元件i之閘極電壓Vg及源極/沒 極間之電壓Vsd變化下’測^其電晶體特性。遷移率為 9xl〇-6cra2/Vs » 合成例4 (聚(9,9,-二辛基第-2,7-二基)之合成)After the gas in the flask was replaced with nitrogen, 0. 20 g (0.25 mmol) of compound 5 and chlorobenzene 50 mL were added to the flask. Further, gasification iron (111) 0.4 (^(2.5111111〇1) was added to the reaction liquid, and then reacted at 120 ° (: 6 hours). Thereafter, the reaction solution was washed twice with water, and The chlorobenzene solution is purified through a ruthenium tube column, and the chlorobenzene solution is further concentrated and dropped into decyl alcohol. The precipitate is filtered to obtain a compound 6. The amount of the compound 6 is 44 mg. The weight average molecular weight of ethylene was 4.4 x 103. Example 7 (Evaluation of the manufacture of the organic transistor element 1 and evaluation of its characteristics) A solution containing the compound 4 containing a charge transporting compound was prepared to have a structure as shown in Fig. 8. The organic transistor element 1. First, a surface thermal oxidation operation is performed by doping a η-type ruthenium substrate with a high concentration as a gate electrode to form a tantalum oxide film of 200 nm. A thermal oxide film is formed by this operation (below) The substrate, also known as the thermal oxide film, was soaked in acetone for 10 minutes for ultrasonic cleaning, and then subjected to ozone-UV treatment for 30 minutes with an ozone-UV processor. Thereafter, the thermal oxide film was again placed in the atmosphere. 201221540 Methyl H (HMDS) tu read coating will be hot The film is subjected to a surface modification operation. Next, the compound 4 is dissolved in chloroform and passed through a filtration membrane to prepare a coating liquid. The concentration of the compound 4 in the coating liquid is 〇·5% by weight. The coating liquid is applied by spin coating on the oxide film which has been subjected to the surface modification operation described above to form an organic film containing the compound 4. Thereafter, the film is vaporized by a vacuum method using a metal cover. Forging molybdenum oxide (Μο〇3) to form a source electrode and a drain electrode to form an organic transistor element 1. Then, the gate voltage Vg and the source/no-pole voltage Vsd of the organic transistor element i are made. Under the change, the crystal characteristics were measured. The mobility was 9xl〇-6cra2/Vs. Synthesis Example 4 (synthesis of poly(9,9,-dioctyl-2,7-diyl))

CeHi7 CeH17CeHi7 CeH17

Ni(cod)2 gr 聨吹咬Ni(cod)2 gr

THF 先將燒瓶中之氣體以氮氣取代後,在該燒瓶中加入 2,7-二溴-9’9,-二辛基第0.5〇2(〇9111]111〇1)、2,2,聯吡 °定0· 31g(2. Gmmol)、四氫咬喃5QmL。該反應溶液經擾掉並 加熱至60°C ’再加入雙(環辛二稀)錄〇.44g(2 ()mm〇1)。之 後,使其於60 C下反應1〇分鐘。再於反應溶液中加入甲 醇後生成析出物。之後將該析出物溶解於曱苯中,並以水 洗淨2次。再通過以甲苯溶液作為展·狀㈣管柱進 323560 42 201221540 行精製。之後,將曱笨溶液濃縮,计 -析出物,即製成聚(9,9,〜二辛基第^入甲醇中。過滤該 -6換算聚苯乙烯之重量平均分子旦7〜二基)。該化合物 丁里為 1. 9χΐ〇3 〇 比較例1 (有機電晶體元件2之製造及其特性之坪 除了將化合物4變更為聚2估) 以外,以如實施例7同樣操作,製〜辛基第一2’7一二基) 之後在使有機電晶體元件上之^機電晶體元件2。 極間之電壓Vsd變化下,測定電壓^及源極/汲 電晶體反應,顯示並未表現電晶體性,其結果並無 計算例1 、 ° (重定向能量之量子化學計算) 化合物之重定向能量,係依照Thej〇urnai〇f 中所載之式(5)計算後算出。 [數學式1] L朴二j⑽持中性狀態的安定構造之狀態下施予正 5何時:化口 能量]+[保持陽離子自由基狀態的安定構 =之狀u電荷為零時之化合物能量]—[在中性狀態的安 疋構&amp;下化合物之能量卜[在陽離子自由基狀態的安定構 造下化合物之能量] (5) 本發明之化合物(如式⑹所示之化合物) 、聚(9,9,-二烧基第'2,7—二基)(如式⑺所示之化合物)、聚(3-炫基 嘆% 2,5 —基)(如式(8)所示之化合物),係以密度泛函法 43 323560 201221540 (使用B3LYP密度泛函及6-31G*基底函數),計算在式(5) 時之重定向能量。計算中係使用量子化學計算程式 Gaussian 09 Reision A 02 ° 再計算具有各化合物在中性狀態中之末端碳原子間距 離低於30 A而最接近30 A之值的聚合度(tl)的化合物、 及具有在中性狀態中之末端碳原子間距離在30 A以上而 最接近30 A之值的聚合度(t2)的化合物之重定向能量,再 以以距離為目標之内插法,求出在中性狀態中之末端碳原 子間距離成為30 A之化合物的值,並加以比較。其計算結 果如表1所示。THF After replacing the gas in the flask with nitrogen, 2,7-dibromo-9'9,-dioctyl 0.5〇2 (〇9111]111〇1), 2,2, in the flask was added to the flask. Pyridine was set to 0. 31 g (2. Gmmol) and tetrahydrocyanate was 5 Q mL. The reaction solution was scrambled and heated to 60 ° C' and then added to bis(cyclohexanediphenyl). 44 g (2 () mm 〇 1). Thereafter, it was allowed to react at 60 C for 1 minute. Further, methanol was added to the reaction solution to form a precipitate. Thereafter, the precipitate was dissolved in toluene and washed twice with water. Further, it was purified by using a toluene solution as a column (4) into a column of 323560 42 201221540. After that, the solution is concentrated, and the precipitate is precipitated into poly(9,9,~dioctyl) methanol. The weight average molecular weight of the -6-converted polystyrene is 7 to 2 groups. . The compound Dingli was 1. 9χΐ〇3 〇Comparative Example 1 (The manufacture of the organic transistor element 2 and the characteristics thereof were changed to the poly 2 evaluation except that the compound 4 was changed to the poly 2 evaluation), and the same operation as in Example 7 was carried out. After the first 2'7-two base), the electromechanical crystal element 2 is placed on the organic transistor element. When the voltage Vsd between the electrodes is changed, the voltage of the voltage and the source/tantalum crystal are measured, and the crystallinity is not shown. As a result, there is no calculation example 1. ° (Quantitative calculation of the reorient energy) The energy is calculated according to the formula (5) contained in Thej〇urnai〇f. [Math 1] L 朴二j(10) When the neutral state is stabilized, the state is given to the positive 5: the energy of the mouth] + [the stability of the cation free radical state = the energy of the compound when the u charge is zero ]—[The energy of the compound in the neutral state of the ampoule &amp; [the energy of the compound in the stable structure of the cationic radical state] (5) The compound of the present invention (such as the compound represented by the formula (6)), (9,9,-dialkyl group '2,7-diyl) (as shown in formula (7)), poly(3-throated sin% 2,5-yl) (as shown in formula (8) The compound is calculated by the density functional method 43 323560 201221540 (using the B3LYP density functional and the 6-31G* basis function) to calculate the reorient energy at equation (5). The calculation uses a quantum chemical calculation program Gaussian 09 Reision A 02 ° to calculate a compound having a degree of polymerization (tl) having a distance between the terminal carbon atoms of each compound in the neutral state of less than 30 A and closest to 30 A. And a reorientation energy of a compound having a degree of polymerization (t2) having a distance between the terminal carbon atoms in the neutral state of 30 A or more and a value closest to 30 A, and then obtaining the distance by the interpolation method The value of the compound at a terminal carbon atom in the neutral state at 30 A is compared and compared. The calculation results are shown in Table 1.

共軛系高分子中,一般已知在聚合度增加時,係有吸 收波長幾乎不會變化的有效共軛長度。因此對如式(6)所示 之化合物、如式(7)所示之化合物、如式(8)所示之化合物, 自其末端碳原子間距離成為15 A以上之聚合度t中各選擇 7至17個,再計算各t之重定向能量之值。聚合度t與重 323560 201221540 定向能量之關係再以式(9)調整,即可求出聚合度為無限大 時之如式(6)至式(8)所示化合物之重定向能量(λ )。 [數學式2] [重定向能量]=λ + axexp(-bxt2—ext) (9) 式(9)中,a、b及c係表示配合參數。其中配合之精 密度之範圍的相關函數之2次方之值,均為0.995以上。 其計算結果如表1所示。 [表1] 化合物之重定向能量(括弧内為t值及中性狀態之安定構 造中的末端碳原子間距離) 化合物 t=tl之化合物 t=t2之化合物 中性狀態中之末端 破原子間距離成為 30 A之化合物 λ (6)表示之化 合物 4.14 keal/mol (t=2,20.373 A) 3.10 keal/mol (t=3 &gt; 31.300 A) 3.23 keal/mol 1.16 keal/mol (7)表示之化 合物 4.93 keal/mol (t=3,23.718 A) 4.02 keal/mol (t=4,32.125 A) 4.25 keal/mol 1.51 keal/mol (8)表示之化 合物 7.40 keal/mol (t=8,29.460 A) 6.80 keal/mol (t=9,33.800 A) 7.33 keal/mol 2. 96 keal/mol 由結果可知本發明化合物之重定向能量,均比聚苐、 聚&quot;塞吩之重定向能量小。 【圖式簡單說明】 第1圖係表示本發明有機電晶體元件之一例的模式斷 面圖。 第2圖係表示本發明有機電晶體元件之其他之例的模 式斷面圖。 第3圖係表示本發明有機電晶體元件之其他之例的模 45 323560 201221540 式斷面圖。 第4圖係表示本發明有機電晶體元件之其他之例的模 式斷面圖。 第5圖係表示本發明有機電晶體元件之其他之例的模 式斷面圖。 第6圖係表示本發明有機電晶體元件之其他之例的模 式斷面圖。 第7圖係表示本發明有機電晶體元件之其他之例的模 式斷面圖。 第8圖係表示本發明有機電晶體元件之其他之例的模 式斷面圖。 【主要元件符號說明】 1 基板 2、2a 活性層 3 絕緣層 4 閘極電極 5 源極電極 6 汲極電極 100、110、120、130、140、150、160、170 有機電晶體 元件 46 323560In the conjugated polymer, it is generally known that when the degree of polymerization is increased, the effective conjugate length at which the absorption wavelength hardly changes is known. Therefore, for the compound represented by the formula (6), the compound represented by the formula (7), and the compound represented by the formula (8), each of the polymerization degrees t having a distance between the terminal carbon atoms of 15 A or more is selected. 7 to 17, and then calculate the value of the redirect energy of each t. The relationship between the polymerization degree t and the weight 323560 201221540 directional energy is adjusted by the formula (9), and the reorientation energy (λ) of the compound represented by the formula (6) to the formula (8) when the degree of polymerization is infinite can be obtained. . [Math 2] [Redirect Energy] = λ + axexp (-bxt2 - ext) (9) In the formula (9), a, b, and c represent the fitting parameters. The value of the second power of the correlation function of the range of the precision density to be matched is 0.995 or more. The calculation results are shown in Table 1. [Table 1] The reorientation energy of the compound (the distance between the terminal carbon atoms in the stability structure of the t value and the neutral state in the parentheses) The compound t=tl compound t=t2 The compound in the neutral state The compound represented by the compound λ (6) of 30 A is 4.14 keal/mol (t=2, 20.373 A) 3.10 keal/mol (t=3 &gt; 31.300 A) 3.23 keal/mol 1.16 keal/mol (7) Compound 4.93 keal/mol (t=3,23.718 A) 4.02 keal/mol (t=4,32.125 A) 4.25 keal/mol 1.51 keal/mol (8) indicates that the compound is 7.40 keal/mol (t=8,29.460) A) 6.80 keal/mol (t=9,33.800 A) 7.33 keal/mol 2. 96 keal/mol From the results, it is known that the reorientation energy of the compound of the present invention is smaller than that of polyfluorene and poly&quot; . BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an example of an organic transistor element of the present invention. Fig. 2 is a schematic cross-sectional view showing another example of the organic transistor element of the present invention. Fig. 3 is a cross-sectional view showing a mold of another example of the organic transistor element of the present invention, model 45 323560 201221540. Fig. 4 is a schematic cross-sectional view showing another example of the organic transistor element of the present invention. Fig. 5 is a schematic cross-sectional view showing another example of the organic transistor element of the present invention. Fig. 6 is a schematic cross-sectional view showing another example of the organic transistor element of the present invention. Fig. 7 is a schematic sectional view showing another example of the organic transistor element of the present invention. Fig. 8 is a schematic cross-sectional view showing another example of the organic transistor element of the present invention. [Main component symbol description] 1 substrate 2, 2a active layer 3 insulating layer 4 gate electrode 5 source electrode 6 drain electrode 100, 110, 120, 130, 140, 150, 160, 170 organic transistor component 46 323560

Claims (1)

201221540 七、申請專利範圍: - 1. 一種下述式(1)所示之化合物,201221540 VII. Patent application scope: - 1. A compound represented by the following formula (1), (1) [式中’E各為獨立’表示氫原子、炫基 '院氧基、烧 硫基、芳基、雜芳基、芳氧基、芳硫基、烯基、炔基、 胺基、矽基、齒素原子、醯基、醯氧基、醯胺基、羧基、 硝基、氰基、硼酸殘基、硼酸酯殘基或錫烷基;Ql表示 由下述式(2)所示之化合物中去除2個氫原子後的2價 基;Q1為複數個時,該等可為相同或不同;q2為式: -CRla=CRlb- {式中,RU及心各為獨立,表示氫原子、烧基、芳基、 鼠基}所示之基、式'㈣,示之基或2價之 : 數個時,該等Q2可為相同或不同;η 至ίο之整數·進數,ml表示°至10之整數;m2表示0 至1U之整數,惟η個之λ 時’η個之ml可為相 二:為0;“ 2以上 不同], ^不冋,n個之m2可為相同或(1) [wherein 'E is independently' denotes a hydrogen atom, a thiol's alkoxy group, a sulfur-burning group, an aryl group, a heteroaryl group, an aryloxy group, an arylthio group, an alkenyl group, an alkynyl group, an amine group , fluorenyl, dentate atom, fluorenyl, decyloxy, decylamino, carboxyl, nitro, cyano, boronic acid residue, boronic acid ester residue or tin alkyl; Ql is represented by the following formula (2) The divalent group after removing two hydrogen atoms in the compound shown; when Q1 is plural, the same may be the same or different; q2 is of the formula: -CRla=CRlb- {wherein, RU and heart are independent, A group represented by a hydrogen atom, a pyridyl group, an aryl group, or a murine group, a formula '(4), a base or a divalent number: when several, these Q2s may be the same or different; an integer from η to ίο· The number, ml represents an integer from ° to 10; m2 represents an integer from 0 to 1U, but the η of η's ml can be phase two: 0; "2 or more different", ^ 不冋, n M2 can be the same or 323560 201221540 {式中’ A環、β環及C環各自獨立,表示芳香環;χΐ、 X X X、χ、x及X各自獨立,表示碳原子或it原 子,R2各自獨立,表示氫原子、烷基、烷氧基、烷硫基、 芳基、雜芳基、芳氧基、芳硫基、烯基、炔基、胺基、 矽基、i素原子、醯基、醯氧基、醯胺基、羧基、硝基 或氰基;其中2個之R2可互相鍵結形成環狀結構}。 2.如專利申請範圍第丨項所述之化合物,其中,Ql為由下 述式(3)所示之化合物中去除2個氫原子後之2價基,323560 201221540 {wherein A ring, β ring and C ring are independent of each other, indicating an aromatic ring; χΐ, XXX, χ, x and X are each independently, meaning a carbon atom or an atom, and R2 is independent, meaning a hydrogen atom, an alkyl group. , alkoxy, alkylthio, aryl, heteroaryl, aryloxy, arylthio, alkenyl, alkynyl, amine, fluorenyl, imine, fluorenyl, decyloxy, decylamino , a carboxyl group, a nitro group or a cyano group; wherein two of R 2 may be bonded to each other to form a cyclic structure}. 2. The compound according to the invention of claim 3, wherein Q1 is a divalent group obtained by removing two hydrogen atoms from the compound represented by the following formula (3), = (3)中,A 環、C 環、、χ2、χ6、r2,各表示如 刖述之思,R各自獨立,表示氫原子、烷基、烷氧基、 院硫基、芳基、雜芳基、芳氧基、芳硫基、烯基、块基、 胺基、碎基、齒素原子、醯基、醯氧基、醯胺基、叛基、 硝基或减;苯環之相鄰的碳原子上所鍵結之2個R3 可互相鍵結形成環狀結構]。 3·如專利申請範圍第2項所述之化合物,其中,A環及C 環各自獨立地為芳香族雜環。 4·如專利申請範圍D項所述之化合物,其t’A環及c 環各自獨立地為嗟吩環、吼略環或咬喃環。 323560 2 201221540 5·如專利申請範圍第4項所述之化合物’其中,表示下 • 述式(4a)或(4b)所示之基, R3 R3= (3), A ring, C ring, χ2, χ6, r2, each means as described above, R is independent, meaning hydrogen atom, alkyl group, alkoxy group, thiol group, aryl group, miscellaneous Aryl, aryloxy, arylthio, alkenyl, block, amine, fragment, dentate atom, fluorenyl, decyloxy, decyl, ruthenium, nitro or subtractive; benzene ring phase The two R3 bonded to the adjacent carbon atom may be bonded to each other to form a cyclic structure]. 3. The compound of claim 2, wherein the A ring and the C ring are each independently an aromatic heterocyclic ring. 4. The compound of claim D, wherein the t'A ring and the c ring are each independently an porphin ring, a ring or a ring. 323560 2 201221540 5. The compound as described in the fourth application of the patent application, wherein the group represented by the following formula (4a) or (4b), R3 R3 [式中’ R2與r3表示與前述相同之意;R4各自獨立,表 示氫原子、烷基、烷氧基、烷硫基、芳基、雜芳基、芳 氧基、芳硫基、烯基、炔基、胺基、矽基、鹵素原子、 醯基、醯氧基、醯胺基、羧基、硝基或氰基]。 6·如專利申請範圍第1至5項中任一項所述之化合物,其 中’ ml為1,m2為〇。 7. 如專利申請範圍第丨至6項中任一項所述之化合物,其 _ ’ η為3至1 〇 〇 〇 〇之整數。 8. 如專利申請範圍第丨至6項中任一項所述之化合物,其 中,η為1。 9.如專利申請範圍第1至8項中任一項所述之化合物,其 中’ Ε各為獨立,表示_素原子、硼酸殘基、硼酸酯殘 基或錫燒基。 10.—種組成物,係含有如專利申請範圍第丨至9項中任一 項所述之化合物者。 u.-種薄膜’係含有如專利中請範圍第i至9項中任一項 所述之化合物者。 323560 201221540 12. —種有機半導體材料,係含有如專利申請範圍第1至9 項中任一項所述之化合物者。 13. —種有機薄膜元件,係具備如專利申請範圍第11項所 述之薄膜作為有機半導體材料者。 14. 一種有機電晶體元件,係具備如專利申請範圍第11項 所述之薄膜作為有機半導體材料者。 4 323560[wherein R 2 and r 3 represent the same meaning as defined above; R 4 each independently represents a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, a heteroaryl group, an aryloxy group, an arylthio group, an alkenyl group. , alkynyl, amine, fluorenyl, halogen atom, fluorenyl, decyloxy, decylamino, carboxy, nitro or cyano]. 6. The compound according to any one of claims 1 to 5, wherein 'ml is 1, and m2 is hydrazine. 7. The compound of any one of clauses 6 to 6, wherein _' η is an integer from 3 to 1 〇 〇 〇 。. 8. The compound of any one of clauses 6 to 6, wherein η is 1. The compound according to any one of claims 1 to 8, wherein the oxime is independent, and represents a γ atom, a boronic acid residue, a boronic acid ester residue or a tin alkyl group. 10. A composition comprising a compound as described in any one of claims -9 to 9. The film of the invention is a compound according to any one of the items i to 9 of the patent. 323560 201221540 12. An organic semiconductor material containing a compound according to any one of claims 1 to 9. An organic thin film element comprising the film as described in claim 11 of the patent application form as an organic semiconductor material. An organic transistor element comprising the film according to claim 11 of the patent application as an organic semiconductor material. 4 323560
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