TW201215500A - Coated article and method for making the same - Google Patents

Abstract

A coated article is provided. The coated article includes a substrate, a base layer formed on the substrate, an intermediate layer formed on the base layer, and a hard layer formed on the intermediate layer. The base layer is an aluminum, titanium, chromium or zirconium layer. The intermediate layer is an AtXyMez(CvN1-v) layer, where A is Al, Ti, Cr or Zr, X is W or Mo, Me is Rh or Pd. The hard layer is a XnMeg(CkN1-k) layer, where X is W or Mo, Me is Rh or Pd. A method for making the coated article is also provided.

Description

201215500 VI. Description of the Invention: [Technology Leading to the Invention] [The present invention relates to a film member and a method of preparing the coated member. [Prior Art] The transitional gold compounds, Wei materials and money compounds have excellent properties such as high hardness, high abrasion resistance and good chemical stability. Therefore, the transition metal nitriding 18 stone inverse and carbon gas are usually recorded in the form of a film on the tool or mold table (4) into a hard f coating, which reduces the service life of the tool and the dies. However, when the temperature of the metal vaporized (four) film is higher than 700, the hardness will decrease, and for the cutting tool, the hard coating is required to maintain its hardness and wear resistance at a high temperature. [0003] Chinese Patent Application No. 20,880,028,837, discloses that a noble metal Ru is introduced into a metal nitride film system, and Ru can be dissolved in the metal nitride crystal lattice and effectively increase the failure temperature of the hard coating. [0004] However, in the preparation process of the coated parts, the thermal expansion coefficient between the film layer and the substrate differs greatly, and the composition and crystal structure of the different layers have obvious changes. The internal stress caused by stress and lattice matching, these stresses can not be eliminated after the preparation of the coated parts, so that the bonding force between the film layer and the substrate is poor, and the film is easily peeled off during use, thus affecting such coating. The service life of the piece and its application range. SUMMARY OF THE INVENTION [0005] In view of the above, it is necessary to provide a coated member that effectively solves the above problems. 099134636 Form No. A0101 Page 3 / Total 13 Page 0992060477-0 201215500 [0006] [0007] [0008] [0009] [ [0012] Further, it is also necessary to provide a method for preparing the above-mentioned coated member. [A mineral film member] comprises a substrate, a primer layer formed on the surface of the substrate, a transition layer formed on the surface of the primer layer, and formation. The hard layer on the surface of the transition layer is the A1, Ti, Cr or Zr layer; the transition layer is A/yMe/Wv) layer, wherein 〇.4StS0.8, 0.35Sy$ 〇·65'〇.〇 5$ zS 0.08,0.75 S(t + y + z) $1.05, 〇·75$ν$1.〇' where a is the metal A1, Ti, Cr or Zr in the bottom layer. X is W or Mo, and Me is Rh. Or Pd; the hard layer is XnMeg (CkNi-k) layer, wherein 〇. 35SnS0. 65,0. 〇5Sg$ 0.08, 0.40g(n+g)s〇.7i, 0.70 helmet kSl.O, where χ The metal W or Mo in the transition layer, Me is the metal Rh or Pd of the transition layer t. A method for preparing a coated member, comprising the steps of: providing a substrate; forming a primer layer on the surface of the substrate, the underlayer being an Ai, Ti, Cr or Zr layer;

A transition layer is formed on the surface of the underlayer, which is an AtXyMez (CvNl_v) layer, wherein 〇.35SyS 0.65'0.05SzS0.08,0. 75S(t + y + z) $1. 〇5, 0· 75Sv$ l. 〇 'where a is the metal ai, Ti, Cr or Zr in the underlayer X is W or Mo, Me is Rh or Pd; a hard layer is formed on the surface of the transition layer, the hard layer is X Me (CN ) Ngk 1 -ky layer 'where 0.35SnS0.65, 0.05Sg$〇.〇8, 〇.4〇s (n + g)S0· 71,0. 70SkSl. 0, where X is the metal W in the transition layer or Mo, Me is the metal Rh or Pd in the transition layer. 099134636 Form No. A0101 Page 4 of 13 0992060477-0 201215500

D

[_In contrast to the known technique, the ruthenium film is deposited on the surface of the base (4) as a primer layer, and then a transition layer is deposited on the surface of the primer layer, and then a hard layer is deposited on the surface of the transition layer. Well, there is no obvious stress generation inside the film layer, so that in the case of applying an external force, the plated film layer does not fail due to internal stress defects; and Rh or Pd is introduced in the transition layer and the hard layer, Rh or Pd is soluble in the metal carbonitride lattice in the transition layer and the hard layer. At high temperature, the metal carbonitride undergoes crystal transformation, the lattice is distorted and the distortion stress is generated to the transition layer and the hard layer. The hardness acts as a compensating effect, thereby effectively improving the thermal hardness of the transition layer and the hard layer and the curability of the underarm, and correspondingly increasing the service life of the coated member and the black temperature range. [Embodiment] Referring to Figure 1 , a coated member 1 of a preferred embodiment of the present invention includes a substrate 11, a primer layer 13 formed on the surface of the substrate 11, and a transition formed on the surface of the primer layer 13. The layer 15 and the hard layer 17 formed on the surface of the transition layer 15. [0015] The substrate 11 may be an aluminum alloy, a magnesium alloy, a titanium alloy or stainless steel. [0016] The underlayer 13 can be formed by magnetron sputtering. The primer layer 13 may be an AK aluminum, Ti (titanium), Cr (chromium) or Zr (zirconium) layer. The underlayer 13 may have a thickness of 100 to 200 nm. [0017] The transition layer 15 can be formed by magnetron sputtering. The transition layer 15 is an AtXyMez (CvNl v) layer, wherein [0018] St. 4StS0. 8, [0019] 35. 35SySO. 65, [0020] 〇.05SzS0.08, 0992060477-0 099134636 Form No. A0101 Page 5 [0012] [0023] [0028] [0028] [0030] [0032] [0033] [0033] 099134636 〇. 75^( t + y + z)^l. 〇5 , 0. 75 S 1. 〇, where A can be the bottom layer! The metal A1, η, Cr or Zr in 3, X may be W (crane) or Mo (turn)' Me may be Rh (姥) or Pd (descriptive). The transition layer 15 may have a thickness of 1 〇〇 to 3 〇〇 ηιη. The hard layer 17 can be formed by magnetron sputtering. The hard layer 17 is a layer of ^(Cklk), wherein 〇. 35SnS0. 65, 0. 05Sg$〇. 〇8, 〇. 4〇S(n+g)S〇. 7卜7〇Sk$l. 0, Wherein X may be the metal w or M〇 in the transition layer 15, and Me may be the metal Rh or Pd in the transition layer 15. The hard layer of the monument! The thickness of 7 can be 3 〇 600 ~ 600nm. A method for preparing a coated member 10 of a preferred embodiment of the present invention comprises the steps of: (a) providing a substrate π, which may be an aluminum alloy, a magnesium alloy titanium alloy or a steel. (b) The substrate 11 is placed in absolute ethanol for ultrasonic cleaning to remove the stain on the surface of the substrate 11. The cleaning time may be 5 to 丨〇m丨n. (c) performing argon plasma cleaning on the surface of the substrate ruthenium treated as described above to further remove oil stain on the surface of the substrate 11, and improving the surface of the substrate u. Form No. A0101 Page 6 of 13 0992060477 -0 201215500 Binding to subsequent coatings. The specific operation and process parameters of the plasma cleaning may be as follows: the substrate 11 is placed in a coating chamber of a magnetron sputtering coating machine (not shown), and the coating chamber is evacuated to 3. 0xl0_5 Torr, and then to the coating chamber. An argon gas (purity of 99.999%) having a flow rate of 50 to 400 sccm (standard state ml/min) was introduced, and a bias of -300 to -600 V was applied to the substrate 11, and argon gas was applied to the surface of the substrate 11. Slurry cleaning, cleaning time is 5~10miη ° [0034] ❹ (d) A layer of underlayer 13 is sputtered on the substrate 11 after argon plasma cleaning by magnetron sputtering, and the underlayer 13 can be A1 , Ti, Cr or Zr layer. The bottom layer 13 is carried out in the magnetron sputtering coater. One of an aluminum target, a titanium target, a chromium target or a ruthenium target is used as a target, and argon gas is used as a working gas, and the flow rate of the argon gas may be 100 to 300 sccm. When the plating is off, a bias of -100 to -200 V is applied to the substrate, and the coating chamber is heated to bring the temperature of the substrate 11 to 200 to 500 ° C, and the coating time may be 10 to 30 minutes. The underlayer 13 may have a thickness of 100 to 200 nm. [0035] 〇 (e) continues to sputter a transition layer 15 on the surface of the underlayer 13 by magnetron sputtering. The transition layer 15 is a layer of X Me (CN,), wherein 0.4S tS0.8, 0.35Sy$0.65, 0.05S z$ 0.08, 0.75 S (t + y + z) SI. 05,0. 75SvSl. 0, Wherein A may be the metal A1, Ti, Cr or Zr in the underlayer 13, X may be W or Mo, and Me may be Rh or Pd. Splashing the transition layer 15 uses one of tungsten le* and molybdenum, one of a bond target and a palladium target, and a metal target used in the step (d), using ammonia gas and acetylene as a reaction gas, and the ammonia gas flow rate can be 50~200sccm, the fast flow rate of B can be 30~200sccm, the working gas is argon gas, the gas flow rate can be 100~300sccm, and the coating time can be 30~60min. The transition 099134636 Form number A0101 Page 7 of 13 0992060477-0 201215500 Layer 15 can be loo~. [0036] (〇 continued to deposit a hard layer 17 on the surface of the transition layer 15 by magnetron sputtering. The hard layer 17 is XnMeg (w_kM, where 〇35" ^0.65 > 〇.05^g^ 〇.〇8 > 0. 40^(n + g)^0. 71 - 〇. γ〇SkSl. 〇, where χ may be the metal w or Μ〇 in the transition layer η, Me may be The metal Rh or pd in the transition layer 15. The hard layer 17 is sputtered using one of the tungsten target and the molybdenum target used in the step (e), one of the dry and palladium targets, and ammonia gas and acetylene as reaction gases. The flow rate of ammonia gas can be 5〇~200sccm, the flow rate of acetylene can be 3〇~20〇sccm, and the working volume of argon gas can be 1〇〇~300's; cc:m.,: film time The thickness of the hard layer π may be 500 to 700 nm. [0037] In the preferred embodiment of the present invention, the coated member 1 is deposited on the surface of the substrate π as the underlayer 13, and then underlying the underlayer 13 The surface layer is deposited with the transition layer 15, and then the hard layer 17 is deposited on the surface of the transition layer 15. The film layer is well transitioned layer by layer, and no obvious stress is generated inside the film layer, and the film is plated under the application of external force. The layer does not fail due to internal stress defects; and Rh or Pd is introduced into the transition layer 15 and the hard layer 17, and the metal carbonitride lattice of Rh or Pd soluble in the transition layer 15 and the hard layer 17 is introduced. In the south temperature state, the metal carbonitride undergoes a crystal transformation, and the crystal lattice undergoes a sag change to generate a distortion stress, thereby strengthening the hardness of the transition layer 15 and the hard layer 丨7, thereby effectively improving the transition layer 15 and The hot hardness of the hard layer 17 and the wear resistance at high temperature, correspondingly increase the service life and the temperature range of use of the mineral film member 1 [Schematic description] [0038] FIG. 1 is a preferred embodiment of the present invention. Cross-sectional view of the mineral film member of the embodiment 099134636 Form No. A0101 Page 8 of 13 0992060477-0 201215500 ' [Main component symbol description] [0039] Coated member: 10 [0040] Substrate: 11 [0041] Bottom layer: 13 [0042] Transition layer: 15 [0043] Hard layer: 17

099134636 Form No. A0101 Page 9 of 13 0992060477-0

Claims (1)

201215500 VII. Patent application scope: L—a coated member ′ includes a substrate, and the improvement thereof comprises: forming a primer layer formed on a surface of the substrate, a transition layer formed on the surface of the primer layer, and a surface formed on the surface of the transition layer. a hard layer, the underlayer is M, Ti, or with a layer; the transition layer is an AtXyMez (c human V) layer, wherein 〇.仏钱8 J 〇.35^y^〇.65 > 0.05^ z^ 0.08 . 0.75 ^(t + y + z) $1·〇5,〇·75$ν$1.〇, where A is the metal M, Τι, Cr or Zr in the bottom layer. X is W or Mo, and Me is Rh. Or Pd; the hard layer is a xnMeg (CkNl k) layer, wherein 〇35$η$〇. 65, U8 '0·40%4)^·7Γ' 〇7〇客红1〇, which makes 乂 a transition layer The metal W or Mo, Me is the metal Rh*pd in the transition layer. 2. The mineral film member of claim 7, wherein the substrate is a sinter alloy, a magnesium alloy, a titanium alloy or a stainless steel. 3. If you apply for a patent scope! The mineral film member according to the invention, wherein the underlayer is formed by magnetron sputtering, and the underlayer has a thickness of 100 to 20 Å. 4. The mineral film member of claim w, wherein the transition layer is formed by magnetron sputtering, the transition layer; having a thickness of 1 〇〇 3 〇〇 nm. 5. If you apply for a patent scope! The mineral film zen: wherein the hard layer is formed by magnetron sputtering, and the thickness of the hard layer is 3 〇〇 6 6 〇〇 nm. 6. A method of preparing a coated member, comprising the steps of: providing a substrate; forming a primer layer on a surface of the substrate of the substrate, the underlayer being an A1, Ti, Cr or Zr layer; forming a transition layer on the surface of the underlying layer The transition layer is the AtWhU layer, where 0.4StS0.8, 〇.35SyS 099134636 Form No. A0101 Page 10 / Total 13 Page 0992060477-0 201215500 0.65, 0.05SzS0.08, 0. 75S(t + y + z) SI 05, 0.75SvS1.0, where A is the metal A1, Ti, Cr or Zr in the underlayer, X is W or Mo, Me is Rh or Pd; a hard layer is formed on the surface of the transition layer, the hard layer is X Me (C^N,,) ngk 1 -k layer, where 0.35SnS0.65, 0.05SgS0.08, 0.40S (n + g)S0.71, 0.70SkS1.0, where X is the metal W in the transition layer Or Mo, Me is the metal Rh or Pd in the transition layer. The method for preparing a coated member according to claim 6, wherein the step of forming the underlayer is carried out by using a magnetron sputtering method, using an aluminum dry, a titanium target, a chrome dry, and a crucible. One of the dry targets is argon gas, the flow rate of argon gas is 100~300sccm, the substrate bias is -100~-200V, and the temperature of the substrate is 200~500°C. The coating time is 10~30miη. The method for preparing a coated member according to claim 6, wherein the step of forming the transition layer is carried out by using a magnetron sputtering method, using an aluminum target, a titanium target, a chromium target, and a zirconium target. One of the tungsten target and the molybdenum target, and one of the upset and the disc is a material, the ammonia gas and the acetylene are used as the reaction gas, the ammonia gas flow rate is 50 to 200 sccm, and the acetylene flow rate is 30 to 200 sccm. The argon gas is a working gas, the flow rate of the argon gas is 100 to 300 sccm, the substrate bias is -100 to -200 V, and the temperature of the substrate is 200 to 500 ° C by heating, and the coating time is 30 to 40 min. The method for preparing a coated member according to claim 6, wherein the step of forming a hard layer is performed by using a magnetron sputtering method, using one of a tungsten target and a molybdenum target, and a target One of the palladium targets is a target gas, ammonia gas and acetylene are used as reaction gases, ammonia gas flow rate is 50~200sccm, acetylene flow rate is 30~200seem, argon gas is used as working gas, argon gas flow form number A0101 page 11/ A total of 13 pages 0992060477-0 201215500 is 100~300sccm, the substrate bias is -100--200V, the substrate temperature is 200~500 °C, and the coating time is 30~60min. 099134636 Form No. A0101 Page 12 of 13 0992060477-0