201200620 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明係關於一種鍍膜方法，尤其涉及一種於滾輪表面 形成氮化鈦薄膜的方法。 【先前技術】 [0002] 目前光學膜片係利用具有微結構雕刻之銅滚輪，將樹脂 載體壓印後照光固化完成，而在製程上，難以避免有塵 粒掉落於滾輪表面。因電鍍之硬質銅硬度較小，所以當 滾輪繼續運轉時，塵粒便在樹脂載體與輪面間隨之帶動 〇 ，最後造成刮傷而導致膜片成品光學品質不良。另一方 面因輪面為銅材，故暴露於大氣環境容易形成氧化銅， 當氧化層面積增大時將造成微結構破壞，最後滚輪報廢 而須重新進行雕刻。 [0003] 於滾輪直接鍍上鎳層或含鈦層再行雕刻，雖增加了輪面 硬度但勢必縮短鑽石刀具使用壽命，因此最佳方式仍是 在銅滚輪上雕刻微結構，再設法製作保護層以達到輪面 之耐磨耗或者抗氧化效果。 〇 [0004] 由於滾輪體積較大，倘若以一般PVD方式進行氮化鈦的鍍 膜，不但因為硬度不夠高，並且因膜層均勻性的考慮， 可能由於靶材置放、電漿源以及滾輪轉動等等疑慮，必 須重新製作一套較為複雜的系統。 【發明内容】 [0005] 有鑑於此，有必要提供一種薄膜厚度容易控制且薄膜平 滑、均勻的於滚輪表面形成氮化鈦薄膜的方法。 099120722 表單編號A0101 第3頁/共10頁 0992036560-0 201200620 [0006] 一種於滾輪表面形成氮化鈦薄膜的方法，其包括：將滾 輪放入反應腔内；對所述反應腔抽真空；加熱所述滚輪 ’分別以脈沖方式間隔向所述反應腔内引入含鈦有機氣 體和含氮氣體以在所述滚輪表面形成氮化鈦薄膜。 [0007] 相較於先前技術’本發明實施例的於滾輪表面形成氮化 欽薄膜的方法為原子層級鍍膜，通過控制引入氣體的週 期數，可以控制薄膜的厚度，故，氮化鈦薄膜的厚度容 易控制，可在不影響滾輪表圖案的前提下完成鍍膜；並 且’上述方法形成的氮化鈦薄膜平滑性、均勻性較好。 【實施方式】 [0008] 下面結合附圖，對本發明實施例作進一步詳細說明。 [0009] 本發明實施例於滾輪表面形成氮化鈦薄嫉的方法包括如 下步驟： [0010] a，將滾輪放入反應腔内。 [0011] b，以脈沖方式向反應腔内引入含鈦有.機氣體； [0012] c，向反應腔内引入惰性氣體； [0013] d，以脈沖方式向反應腔内引入含氮反應氣體； [0014] e，向反應腔内引入惰性氣體； [0015] f，重復步驟b、c、d、e直至於滾輪表面形成鼠化鈦薄膜 [0016] 099120722 請參閱圖1，具體地，在步驟a中，打開反應腔2 0的蓋體 11，將滾輪10放在設置在底座12上的支撐架23上，以使 滾輪10與反應腔2〇内壁隔開一定距離，將蓋體丨1蓋合在 表單編號A0101 第4頁/共1〇頁 0992036560-0 201200620 [0017] [0018] Ο [0019] [0020] [0021] ο [0022] [0023] [0024] 底座12上以使反應腔20内形成一個密封空間，然後對反 應腔20抽真空至反應腔20内壓力范圍為1毫托至1〇〇毫托 、加熱滚輪使其溫度為200至400攝氏度，優選地，溫度 為200至250攝氏度。 對反應腔20抽真空及加熱滚輪並無嚴格先後順序，優選 地，先對反應腔抽真空後加熱滚輪。 具體地，在步驟b中，以10至20秒的週期脈沖將含鈦有機 氣體通過設置在反應腔20上的進氣口 21通入反應腔20内 〇 由於滚輪暴露在反應腔内，鈦從含鈦有金屬氣體中蒸發 並化學地吸附在滚輪表面，形成飽和的鈦層。 當然，此步驟中也可以旋轉滚輪’使得鈦層更加均勻地 形成在滾輪表面。 含鈦有機氣體選自K㈣叫)2)4、 Ώ(賊C2//5)2)4、Ώ⑼(CT/3)(C2//5))4或至> 兩種之混合氣體。 具體地，在步驟C中，將惰性氣體氫氣、氬氣、氦氣或至 少兩種之混合氣體通過設置在反應腔20上的進氣口 21通 入反應腔20内，以將多餘的含鈦有機氣體通過出氣口 22 吹出以淨化反應腔20。 通入惰性氣體的持續時間可以為1至5秒。 具體地，在步驟d中，*以10至20秒的週期脈沖將含氮反應 099120722 表單編號A0101 第5頁/共10頁 0992036560-0 201200620 氣體通過设置在反應腔2〇上的進氣口 21引入反應腔2〇内 [00¾]含氮氣體中的I與化學吸附在滾輪表 面的鈦層中的鈦發 生化學反應從而在滾輪表面生成__層I化鈥（薄 膜。 [0026] 含氮反應氣體選自%、或三者之混合氣體。 闕當然、，此步驟中也可以旋轉滚輪，使得氮化欽薄膜更加 均句地形成在滾輪表面。 [0028]具體地，在步驟e中，將惰性氣體氫氬氣、氦氣或至 少兩種之混合氣體通過設置在反應腔2〇上的龜氣口 21通 入反應腔20内，以將多餘的含i氣體或.其與含鈦金屬有 機氣體反應的副產物通過出氣口 22吹出以淨化反應腔2〇 ，從而完成一個週期的鍍膜。 [0029] 具體地’在步驟f中，由於氪化鈦薄膜為原子層級的薄膜 和每個週期生成一層氮化鈦薄膜那么，為了得到預定 厚度或層數的氮化鈇薄膜需要進行多個週期的鍵膜。 [0030] 當然，如果需要得到一層薄膜，則不需要進行多個週期 的鍍膜。 [0031] 上述於滾輪表面形成氮化欽薄膜的方法為原子層級鍍膜 ，通過控制引入氣體的週期數，可以控制薄膜的厚度， 故，氮化鈦薄膜的厚度容易控制’可在不影響滾輪表圖 案的前提下完成鍍膜且氮化鈦薄膜的硬度較高；並且， 099120722 表單編號A0101 第6頁/共10頁 0992036560-0 201200620 [0032] 上述方法形成的氮化鈦薄膜平滑性、均勻性較好。 综上所述，本發明確已符合發明專利之要件，遂依法提 出專利申請。惟，以上所述者僅為本發明之較佳實施方 式，自不能以此限制本案之申請專利範圍。舉凡熟悉本 案技藝之人士援依本發明之精神所作之等效修飾或變化 ，皆應涵蓋於以下申請專利範圍内。 [0033] 【圖式簡單說明】 圖1係將待鍍膜滚輪置於反應腔之示意圖。 [0034] 【主要元件符號說明】 滚輪：10 [0035] 反應腔：20 [0036] 進氣口 ： 21 [0037] 出氣口 ： 22 [0038] 支撐架：23 [0039] G [0040] 蓋體：11 底座：12 099120722 表單編號A0101 第7頁/共10頁 0992036560-0201200620 VI. Description of the Invention: [Technical Field] [0001] The present invention relates to a coating method, and more particularly to a method of forming a titanium nitride film on a surface of a roller. [Prior Art] [0002] At present, the optical film is formed by using a copper roller having a microstructure for engraving, and the resin carrier is embossed and cured by light, and in the process, it is difficult to prevent dust particles from falling on the surface of the roller. Since the hard copper of electroplating has a small hardness, when the roller continues to operate, the dust particles will be driven between the resin carrier and the wheel surface, and eventually cause scratches, resulting in poor optical quality of the film. On the other hand, since the wheel surface is made of copper, it is easy to form copper oxide when exposed to the atmosphere. When the oxide layer area is increased, the microstructure is destroyed. Finally, the roller is scrapped and must be re-engraved. [0003] The roller is directly plated with a nickel layer or a titanium layer and then engraved. Although the hardness of the wheel surface is increased, the service life of the diamond tool is bound to be shortened. Therefore, the best way is to engrave the microstructure on the copper roller, and then try to make protection. The layer is used to achieve the wear resistance or oxidation resistance of the tread. 〇[0004] Due to the large volume of the roller, if the coating of titanium nitride is performed by the general PVD method, not only the hardness is not high enough, but also due to the uniformity of the film layer, the target material placement, the plasma source and the roller may be rotated. Waiting for doubts, we must recreate a more complex system. SUMMARY OF THE INVENTION [0005] In view of the above, it is necessary to provide a method of forming a titanium nitride film on the surface of a roller which is easy to control the thickness of the film and which is smooth and uniform in film. 099120722 Form No. A0101 Page 3 of 10 0992036560-0 201200620 [0006] A method of forming a titanium nitride film on a surface of a roller, comprising: placing a roller into a reaction chamber; vacuuming the reaction chamber; heating The roller 'injects a titanium-containing organic gas and a nitrogen-containing gas into the reaction chamber at intervals in a pulsed manner to form a titanium nitride film on the surface of the roller. [0007] Compared with the prior art, the method for forming a nitride film on the surface of the roller is an atomic layer coating, and by controlling the number of cycles of introducing the gas, the thickness of the film can be controlled, so that the titanium nitride film is The thickness is easy to control, and the coating can be completed without affecting the pattern of the roller table; and the titanium nitride film formed by the above method has better smoothness and uniformity. [Embodiment] Hereinafter, embodiments of the present invention will be further described in detail in conjunction with the accompanying drawings. The method for forming a titanium nitride thin crucible on the surface of the roller according to an embodiment of the present invention includes the following steps: [0010] a, placing the roller into the reaction chamber. [0011] b, introducing a titanium-containing organic gas into the reaction chamber in a pulsed manner; [0012] c, introducing an inert gas into the reaction chamber; [0013] d, introducing a nitrogen-containing reaction gas into the reaction chamber in a pulsed manner [0014] e, introducing an inert gas into the reaction chamber; [0015] f, repeat steps b, c, d, e until the surface of the roller forms a titanium rat film [0016] 099120722 See Figure 1, in particular, in In step a, the cover 11 of the reaction chamber 20 is opened, and the roller 10 is placed on the support frame 23 disposed on the base 12 so that the roller 10 is spaced apart from the inner wall of the reaction chamber 2 by a certain distance. Covered in Form No. A0101 Page 4 / Total 1 Page 0992036560-0 201200620 [0018] [0018] [0020] [0022] [0023] [0024] [0024] on the base 12 to make the reaction A sealed space is formed in the cavity 20, and then the reaction chamber 20 is evacuated to a pressure in the reaction chamber 20 in a range of 1 mTorr to 1 Torr, and the heating roller is heated to a temperature of 200 to 400 ° C. Preferably, the temperature is 200. To 250 degrees Celsius. There is no strict sequence for evacuating the reaction chamber 20 and heating the rollers. Preferably, the reaction chamber is evacuated and the roller is heated. Specifically, in step b, the titanium-containing organic gas is introduced into the reaction chamber 20 through the gas inlet 21 disposed on the reaction chamber 20 in a period of 10 to 20 seconds, and the titanium is exposed from the reaction chamber. The titanium-containing metal gas evaporates and chemically adsorbs on the surface of the roller to form a saturated titanium layer. Of course, it is also possible to rotate the roller in this step so that the titanium layer is more uniformly formed on the surface of the roller. The titanium-containing organic gas is selected from the group consisting of K (four) called) 2) 4, Ώ (thief C2 / /5) 2) 4, Ώ (9) (CT / 3) (C2 / /5)) 4 or to > a mixture of two. Specifically, in step C, an inert gas of hydrogen, argon, helium or a mixture of at least two gases is introduced into the reaction chamber 20 through an air inlet 21 disposed in the reaction chamber 20 to remove excess titanium. The organic gas is blown out through the gas outlet 22 to purify the reaction chamber 20. The duration of the introduction of the inert gas may be from 1 to 5 seconds. Specifically, in step d, * the nitrogen-containing reaction 099120722 form number A0101, page 5 / 10 page 0992036560-0 201200620 gas is passed through the gas inlet 21 provided in the reaction chamber 2〇 in a cycle of 10 to 20 seconds. Introduced into the reaction chamber 2〇 [003⁄4] I in the nitrogen-containing gas chemically reacts with titanium which is chemically adsorbed in the titanium layer on the surface of the roller to form a yttrium layer on the surface of the roller (film) [0026] The gas is selected from the group consisting of % or a mixture of the three. 阙 Of course, the roller can also be rotated in this step, so that the nitride film is formed more uniformly on the surface of the roller. [0028] Specifically, in step e, An inert gas of hydrogen argon, helium or a mixture of at least two gases is introduced into the reaction chamber 20 through a gas nozzle 21 disposed on the reaction chamber 2 to remove excess i-containing gas or titanium-containing metal organic gas. The by-product of the reaction is blown out through the gas outlet 22 to purify the reaction chamber 2〇, thereby completing one cycle of coating. [0029] Specifically, in the step f, since the titanium telluride film is an atomic layer film and a layer is formed per cycle Titanium nitride film In order to obtain a predetermined thickness or number of layers of tantalum nitride film, it is necessary to perform a plurality of cycles of the key film. [0030] Of course, if a film is required, it is not necessary to perform a plurality of cycles of coating. [0031] The method for forming the nitride film is an atomic layer coating, and the thickness of the film can be controlled by controlling the number of cycles of introducing the gas. Therefore, the thickness of the titanium nitride film can be easily controlled to complete the coating without affecting the pattern of the roller. The hardness of the titanium nitride film is high; and, 099120722 Form No. A0101 Page 6 / Total 10 Page 0992036560-0 201200620 [0032] The titanium nitride film formed by the above method has better smoothness and uniformity. The present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations in accordance with the spirit of the present invention are intended to be included in the scope of the following claims. [0033] [Simple Description] Figure 1 is a schematic view showing the roller to be coated placed in the reaction chamber. [0034] [Main component symbol description] Roller: 10 [0035] Reaction chamber: 20 [0036] Air inlet: 21 [0037] Air outlet: 22 [0038] ] Support frame: 23 [0039] G [0040] Cover: 11 Base: 12 099120722 Form No. A0101 Page 7 / Total 10 Page 0992036560-0