TW201141654A - Nanoscale piezoelectric alignment platform mechanism with two degrees of freedom - Google Patents

Nanoscale piezoelectric alignment platform mechanism with two degrees of freedom Download PDF

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TW201141654A
TW201141654A TW99117037A TW99117037A TW201141654A TW 201141654 A TW201141654 A TW 201141654A TW 99117037 A TW99117037 A TW 99117037A TW 99117037 A TW99117037 A TW 99117037A TW 201141654 A TW201141654 A TW 201141654A
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Taiwan
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piezoelectric
freedom
axis
upper cover
alignment
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TW99117037A
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Chinese (zh)
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TWI410295B (en
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Wen-Yu Jue
Jian-Hong Liu
Yun-Feng Deng
Bo-Yu Chen
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Univ Nat Formosa
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Publication of TWI410295B publication Critical patent/TWI410295B/en

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Abstract

A nanoscale piezoelectric alignment platform mechanism with two degrees of freedom is disclosed, which mainly consisting of a substrate, a moving unit, and a piezoelectric driving unit. Mainly, piezoelectric actuators are employed as the driving source of the alignment platform; each piezoelectric actuator matches with its independent flexible device and employs the assembly of linear driving devices whose X-axis and Y-axis perpendicularly intersects; as a result, no matter it moves in the X-axis direction, Y-axis direction, or the direction to compensate for the central reference angle, the interference error between the X-axis and Y-axis can be effectively eliminated, and the minute resolution can also be achieved, thereby providing the substantial benefit of the a nanoscale piezoelectric alignment platform mechanism with two degrees of freedom.

Description

201141654 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種二自由度奈米級壓電對位平台機構, 特別是指一種二自由度奈米級壓電對位平台機構。 【先前技術】 近年來隨工具機、各種產業機械、量測儀器的高精度化, 加上超精密加工機、半導體製程裝置、電子資訊機器、原子 •力顯微鏡等的需要高精密定位技術儀器的發展,不論是在精 密機械、半導體產業、微(奈)米科技皆朝向微小化、精密化 發展,自從半導體開始到現在成熟以後,奈米的領域和技術 漸漸導入,已經是現今的主流之一,微定位平台更是很多產 業的重要J1具之-。而微定位平台為各種精密設備中不可缺 少之載具,其驅動源必須具備體積小,反應時間快,精度高 的制動器,另外在動作時並不會產生高量的熱能或是摩擦的 •問題而減降推動的效率’故微定位平台多以壓電驅動作為其 動力源》 就習知微動定位平台的技術,有分別為利用摩擦滞滑現 象的摩擦驅動平台’利用夾持力的尺礎(inehw_)式平台等 類坦。對利用摩擦驅動平台中,是採用慣性力與摩擦力搭配 的原理’㈣㈣元件使材料產生微小變形的方式與底 軌道產生滯滑現象而達成長行程運動,而利用夾持力的 式平台中’是採用壓電陶瓷的變形’輔以具有靜電吸引 [S] 3 201141654 腳座而設計出以尺蠖摩擦致滑原理製作單軸精密定位平 台,雖然摩擦滞滑式平台與尺蠖式平台的優點為其具有無限 長運動範圍’但是其缺點為兩者的裝配複雜,易造成組裝誤 差,且操控性不易。 此外,由於過去之平台是以線切割加工而《,但是此加 方式使得其結構上的強度稍嫌不足,再加上微定位平台 有考量旋轉角之自由度“的情況下,通常會造成其於X軸 籲與γ轴作動時’會有互相干㈣情況發生,以致其工作精密 度上會有著重大影響。有鑑於上述習知平台技術之問題缺 失亟須改善,本發明人特別從平台的設計、製造以及整個 系統做-整合,並研發利用零組件的方式組合規劃的平台機 構’使之具有極佳剛性,且其零組件搭配之使用壽命較為長 久,相對亦能減少❹修護上和生產上的時間,有效地提升 整體品質及良率。 φ 【發明内容】 本發明之目的即在於提供-種二自由度奈米級壓電對位 平台機構’主要採用壓電致動器作為對位平台之驅動源,每 個壓電致動器配合其獨立的撓性元件,以便在每個麗電致動 器進行往復運動時能夠快速回復到定位。 本發月之-人目的係在於提供—種二自由度奈米級壓電 對位平台機構,利用X轴與γ轴垂直相交之線性驅動元件之 組合’使之無論在Χϋγ軸或補正中心基準角度之作動時, 201141654 不僅能有效消除X軸與Y轴之間的干涉誤差,且能在承受高 負荷下依舊能保有良好的精度。 本發明之另一目的係在於提供一種二自由度奈米級壓電 對位平台機構’藉由移動早元和虔電驅動單元的組成,可使 平台於X轴、Υ軸及中心基準角度補正之作動下,能有效的 消除X軸與Υ軸兩軸間之干涉誤差,可以達到微小的解析 度,以提供二自由度奈米級麼電對位平台機構之實質效益。 可達成上述發明目的之二自由度奈米級壓電對位平台機 構,包括有: 一基板; 一移動單元,為以下蓋固定於基板,該下蓋並以線性移 動元件與上蓋連接,且該上蓋與下蓋之接觸面間設有一滾柱 π件作滑動接觸,其中該移動單元於χ軸或γ軸方向所設置 之另一移動單元,其二移動單元的移動方向呈互相垂直; -壓電驅動單兀,為以一下蓋固定於移動單元的上蓋, 該下蓋一端所設之固定部以一壓電模組與上蓋之連接部連 接,且該下蓋再以線性移動元件與上蓋連接作為滑動接觸, 其中該移動單元於水平方向所設置之壓電驅動單元,其移動 單元與壓電驅動單元的移動方向呈互相垂直; 一工作平台,係設置於壓電驅動單元上。 【實施方式】 "月參閱圖-’本發明所提供之二自由度奈米級壓電對位 201141654 平台機構,主要於上基板!與工作平台4之間設置有數 軸與γ軸方向移動之移動單元2,2,和壓電驅動單元3,3,,其 包括有: 如圖二與圖三所示,該移動單元2為以下蓋22固定於基 板卜該下蓋22並以線性移動元件24與上蓋21連接且= 上蓋21與下蓋22之接觸面間設有一滾柱元件23作滑動接 觸;移動單元2中皆包含有:一上蓋21、—下蓋22、滚柱 元件23、線性移動元件24,利用此線性移動元件μ與滾柱 元件23設計,可使平台在直線作動中承受高負荷之情況下, 依舊能保有良好的精度。移動單元2之上蓋21與下蓋。之 間包含兩組線性移動元件24,該線性移動元件24中其—固 定於下蓋22,另一則固定於卜苗、, 钔圊疋於上蓋21,以供應壓電驅動單元 3,3’之線性位移。 如圖四至圖六所示,該壓電驅動單元3,3,為以一下蓋33 固定於移動單元2之上蓋21,該下蓋33—端所設之固定部 331以一壓電模組31與上蓋32之連接部32ι連接,且該下 蓋33再以線性移動元件34與上蓋32連接作為滑動接觸; 其中該壓電驅動單元3,3,包含有:一屋電模組31、一上蓋 32、一下蓋33、線性移動元件34。一壓電模組31包含一壓 電致動器311,壓電致動器311二側係以撓性元件312所包 覆其架構,該壓電模組31係位於下蓋33内,壓電模組Μ 之固定端314以之撓性元件312固定於下蓋33固定部331, 201141654 壓電模組31之移動端313以撓性元件312另一端固定於連 接部321 ’連接部321固定於上蓋32,壓電模組31作動時 推動連接部321進行對上蓋32相對方向之作動,虔電模組 31上之撓性元件312以供應應力集中及壓電致動器3ιι作動 狀覆歸回原點作用,藉由上工作平台4配合上㈣電驅動 單元3,3’與移動單元2,2,之組合設立,即形程本發明之一種 屋電二自由度奈米級對位平台機構。 再者’請參閱圖七所示’當本發明進行χ轴移動之實施 作動時,即啟動位於X袖方向之屋電驅動單元3中愿電模組 31的壓電致動器311往Χ軸方向作動, 作動驅使其壓電致動器 311推動撓性元件312進而推動一 初埂接部321,而帶動其壓 電驅動單元3之上篕32 孩#-201141654 VI. Description of the Invention: [Technical Field] The present invention relates to a two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism, and more particularly to a two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism. [Prior Art] In recent years, with the high precision of machine tools, various industrial machines, and measuring instruments, ultra-precision processing machines, semiconductor processing equipment, electronic information equipment, atomic force microscopes, etc. Development, whether in the precision machinery, semiconductor industry, micro (Nym) technology is toward miniaturization, precision development, since the semiconductor began to mature, the field and technology of nano is gradually introduced, is now one of the mainstream The micro-positioning platform is an important J1 for many industries. The micro-positioning platform is an indispensable carrier in various precision equipments. The driving source must have a small volume, fast response time, high precision brake, and it does not generate high heat or friction during operation. The efficiency of the reduction and promotion is so that the micro-positioning platform mostly uses piezoelectric drive as its power source. According to the technology of the conventional micro-motion positioning platform, there are friction drive platforms that utilize the friction and slip phenomenon respectively. (inehw_) type platform and other classes. In the friction-driven platform, the principle of inertial force and friction force is used. (4) (4) The element causes the material to be slightly deformed and the bottom track produces a slip phenomenon to achieve long-stroke motion, while in the platform using the clamping force The deformation of piezoelectric ceramics is complemented by the electrostatic attraction [S] 3 201141654 feet to design a single-axis precision positioning platform based on the principle of friction and slip. The advantages of the friction and slip platform and the ruler platform are It has an infinitely long range of motion' but its disadvantage is that the assembly of the two is complicated, which is easy to cause assembly errors and the handling is not easy. In addition, since the platform in the past was processed by wire cutting, the addition method made the structural strength slightly insufficient, and the micro-positioning platform has the degree of freedom to consider the rotation angle, which usually causes When the X-axis and the γ-axis act, there will be a mutual dryness (four), so that the precision of the work will have a significant impact. In view of the above-mentioned problems of the conventional platform technology, the inventors particularly need to improve from the platform. Design, manufacturing, and the entire system to do - integration, and the development of the use of components in a way to combine the planning of the platform mechanism 'to make it extremely rigid, and its component life with a longer life, relative to reduce the repair and The time of production effectively improves the overall quality and yield. φ [Invention] The object of the present invention is to provide a two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism, which mainly uses a piezoelectric actuator as a pair. The driving source of the platform, each piezoelectric actuator cooperates with its independent flexible component to quickly recover each reciprocating actuator To the positioning. The purpose of this month is to provide a two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism, which uses a combination of linear drive elements whose X-axis and γ-axis perpendicularly intersect to make it 无论γ axis or When correcting the center reference angle, 201141654 can not only effectively eliminate the interference error between the X-axis and the Y-axis, but also maintain good accuracy under high load. Another object of the present invention is to provide a two-free freedom. The nano-scale piezoelectric alignment platform mechanism 'by moving the early element and the electric drive unit can make the platform correct the X-axis, the Υ axis and the central reference angle, which can effectively eliminate the X-axis and Υ The interference error between the two axes of the shaft can achieve a small resolution to provide the substantial benefits of the two-degree-of-freedom nano-level power-aligned platform mechanism. The two-degree-of-freedom nano-scale piezoelectric alignment platform that can achieve the above object The mechanism includes: a substrate; a moving unit fixed to the substrate by a cover, and the lower cover is connected to the upper cover by a linear moving component, and a roller is disposed between the contact surface of the upper cover and the lower cover The π-piece is in sliding contact, wherein the moving unit is disposed in the y-axis or the γ-axis direction, and the moving direction of the two moving units is perpendicular to each other; - the piezoelectric driving unit is fixed to the moving by the lower cover The upper cover of the unit, the fixing portion provided at one end of the lower cover is connected to the connecting portion of the upper cover by a piezoelectric module, and the lower cover is further connected with the upper cover as a sliding contact by the linear moving element, wherein the moving unit is horizontally The piezoelectric driving unit is arranged such that the moving direction of the moving unit and the piezoelectric driving unit are perpendicular to each other; a working platform is disposed on the piezoelectric driving unit. [Embodiment] "Monthly Referring to Figure-'The present invention provides The second degree of freedom nano-scale piezoelectric alignment 201141654 platform mechanism, mainly on the upper substrate! The moving unit 2, 2 and the piezoelectric driving unit 3, 3 are arranged between the working platform 4 and the y-axis direction. , which includes: as shown in FIG. 2 and FIG. 3 , the moving unit 2 is fixed to the substrate 22 by the lower cover 22 and connected to the upper cover 21 by the linear moving element 24 and = the upper cover 21 and the lower cover 22 A roller member 23 is disposed between the contact surfaces for sliding contact; the moving unit 2 includes: an upper cover 21, a lower cover 22, a roller member 23, and a linear moving member 24, and the linear moving member μ and the roller member are utilized. The 23 design allows the platform to maintain high accuracy while being subjected to high loads during linear actuation. The mobile unit 2 has an upper cover 21 and a lower cover. There are two sets of linear moving elements 24, which are fixed to the lower cover 22, and the other is fixed to the upper cover 21 to supply the piezoelectric driving units 3, 3' Linear displacement. As shown in FIG. 4 to FIG. 6 , the piezoelectric driving unit 3 , 3 is fixed to the upper cover 21 of the mobile unit 2 by a lower cover 33 , and the fixing portion 331 provided at the end of the lower cover 33 is a piezoelectric module 31 . The lower cover 33 is connected to the upper cover 32 as a sliding contact by the linear moving element 34. The piezoelectric driving unit 3, 3 includes: a house electric module 31 and an upper cover. 32. Next cover 33, linear moving element 34. A piezoelectric module 31 includes a piezoelectric actuator 311. The piezoelectric actuator 311 is covered by a flexible member 312. The piezoelectric module 31 is located in the lower cover 33. The fixed end 314 of the module 固定 is fixed to the fixing portion 331 of the lower cover 33 by the flexible member 312. The moving end 313 of the piezoelectric module 31 is fixed to the connecting portion 321 at the other end of the flexible member 312. The upper cover 32, when the piezoelectric module 31 is actuated, pushes the connecting portion 321 to move in the opposite direction of the upper cover 32, and the flexible member 312 on the electric power module 31 is returned to the original by the supply of stress concentration and the piezoelectric actuator 3 The point function is established by the combination of the upper working platform 4 and the (four) electric driving unit 3, 3' and the mobile unit 2, 2, that is, a house electric two-degree-of-freedom nano-level alignment platform mechanism of the present invention. Further, 'please refer to FIG. 7'. When the present invention performs the operation of the reel movement, the piezoelectric actuator 311 of the electro-mechanical module 31 in the electric drive unit 3 in the X-sleeve direction is activated. The direction is actuated, and the actuator drives the piezoelectric actuator 311 to push the flexible element 312 to push the initial splicing portion 321 to drive the piezoelectric driving unit 3 to 篕32 ##-

上盍32及移動早疋2帶動工作平台4往X 轴方向移動,位於γ軸方向的蒋 万向的移動早& 2,則不動。且當壓電 致動1§ 311受正壓電效庵接付门、苗去 應後彺回運動,撓性元件312能使上 工作平台4以較快速回到定位。 請參閱圖人所示,當本發明 a* , ρο ^ 1釉移動之實施作動 時即啟動位於Y軸之壓電驅動單元3,φΜφ 電致動器3U,使其㈣… 中壓電模組的壓 進而推動/器3U推動繞性元件川 進而推動—連接部321,而帶㈣壓電㈣單元 及移動單元2,,使得上工作平台 羞32The upper jaw 32 and the moving early 疋 2 drive the working platform 4 to move in the X-axis direction, and the movement of Jiang Wanxiang in the γ-axis direction is early & 2, and does not move. And when the piezoelectric actuator 1 § 311 is subjected to the positive piezoelectric effect, the flexible member 312 enables the upper working platform 4 to return to the positioning more quickly. Referring to the figure, when the a*, ρο ^ 1 glaze movement of the present invention is actuated, the piezoelectric driving unit 3, φΜφ electric actuator 3U, which is located on the Y axis, is activated to make the piezoelectric module The pressure pushes the device 3U to push the winding element and pushes the connecting portion 321, and the (four) piezoelectric (four) unit and the moving unit 2, making the upper working platform shame 32

轴方向移動單元2則“ Y轴方向移動’位於X 應後往口運叙 且當壓電致動器311受正壓電效 應後在回運動’心件戰使上工作平台4以較快迷回 201141654 到定位。 本發明一種二自由度奈米級壓電對位平台機構, 疋J用數個獨立電驅動單元3中的壓電致動器⑶推動挽 性元件312進而推動一連接部321以產生位移,且當壓電致 動器311觉正壓電效應後既會往回運動,能夠使上工作平台 4快速回到定位,曰4丨 _ 且利用滾柱几件23支撐整個機構元件。 並且利用四個移動單元2,2,不僅能有效逹到X軸與γ轴 籲之間的微位移運動’且能在平台4工作巾承受高負荷之情況 下’依舊能保有良好的精度’以達本發明之廢電二自由度奈 米級對位對準平台機構的實質效益。 本發明所提供之二自由度奈米級壓電對位平台機構,與 前述引證案及其他習用技術相互比較時,更具有下列之優 點: 1. 本發明採用以壓電驅動單元中的壓電致動器 • (Piezoelectric actuators)作為獨立微動單元中之動力驅動 源,可利用其具有可控制性、高頻響應特性、電能與機械 能之間的高轉換率、微小化,以及不易發熱等優點,而可 達到平台精密定位之功能。 2. 本發明採用撓性元件在配合壓電制動器產生彈性變形時, 同時推動推動連接部’並且可將應力集中,可減少壓電制 動器壓電晶體以及各元件連接觸產生應力集中之問題,減 少移動時所產生的自變形,更於作動後,可提供快速回歸 201141654 原點之能力。 3. 本發明利用壓電驅動單元及移動單元皆採以線性移動元件 組之設計,使其運動為動磨擦,磨擦力較小,最小移動單 位準確,熱變位小’精度安冑,裝配容易,具互換性及擴 充性》 4. 本發明料平台配合壓電驅動單元及移動單元各組零組件 之組成規劃,可以減少报多修護上和生產上的時間,如此 參—來,對無論是壓電驅動單元或移動單元哪個零件如果損 壞’可以針對那個零件換新的就好,不會因此就不能用, 在命考量上以零件方式可以達到比較長久的時間,進而 有效地提升產品之整個品質及良率。 上列詳細說明係針對本發明之一可行實施例之具體說 明’惟該實施例並非用以限制本發明之專利範圍,凡未脫離 本發明技藝精神所為之等效實施或變更,均應包含於本案之 φ 專利範圍中。 综上所述,本㈣但在空間㈣上㈣創新,並能較習 用物品增進上述多項功效,應已充分符合新穎性及進步性之 法定發明專利要件1依法提出申請,懇請t局核准本件 發明專利申請案,以勵發明,至感德便。 【圖式簡單說明】 圖-為本發明二自由度奈米級塵電對位平台機構之立體 分解視圖; 201141654 圖二為該移動單元之立體分解視圖; 圖三為該移動單元之剖面示意圖; 圖四為該壓電驅動單元之立體分解視圖; 圖五為該壓電驅動單元之放大示意圖; 圖六為該壓電驅動單元之剖面示意圖; X轴移 Y轴移 圖七為該二自由度奈米級壓電對位平台機構進行 動之實施作動示意圖;以及 圖八為該一自由度奈米級壓電對位平台機構進行 動之實施作動示意圖。 【主要元件符號說明】 1基板 2,2’移動單元 21上蓋 22 下蓋 23 滾柱元件 24線性移動元件 3,3 壓電驅動單元 3 1壓電模組 311麗電致動器 312 撓性元件 313移動端 201141654 314固定端· 32 上蓋 321 連接部 33 下蓋 331固定部 34 線性移動元件 4 工作平台In the axial direction moving unit 2, the "Y-axis direction movement" is located after the X should be traversed and when the piezoelectric actuator 311 is subjected to the positive piezoelectric effect, the movement is moved back. Back to 201141654 to the positioning. The invention provides a two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism, and the piezoelectric actuator (3) in the plurality of independent electric drive units 3 pushes the characterization element 312 to push a connection portion 321 In order to generate displacement, and when the piezoelectric actuator 311 senses the piezoelectric effect, it will move back, and the upper working platform 4 can be quickly returned to the positioning, and the entire mechanism component is supported by the roller 23 pieces 23 . And using the four mobile units 2, 2, not only can effectively move the micro-displacement movement between the X-axis and the γ-axis, and can still maintain good precision when the platform 4 work towel is subjected to high load. The utility model provides the two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism provided by the invention, and the two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism, and the foregoing cited cases and other conventional technologies When comparing, it has the following advantages: 1. The present invention employs a piezoelectric actuator (Piezoelectric actuators) in a piezoelectric driving unit as a power driving source in an independent micro-motion unit, which can utilize controllability, high-frequency response characteristics, electrical energy and mechanical energy. The high conversion rate, miniaturization, and low heat generation, etc., can achieve the function of precise positioning of the platform. 2. The invention adopts a flexible element to push the connection portion when the elastic brake is elastically deformed, and can simultaneously push the connection portion' Concentration of stress can reduce the stress concentration of the piezoelectric actuator of the piezoelectric actuator and the contact between the components, reduce the self-deformation caused by the movement, and provide the ability to quickly return to the origin of 201141654 after the operation. The invention utilizes the piezoelectric driving unit and the moving unit to adopt the design of the linear moving component group, so that the motion is dynamic friction, the friction force is small, the minimum moving unit is accurate, the thermal displacement is small, the precision is good, the assembly is easy, and the interchange is easy. Sexuality and expandability 4. The material platform of the invention cooperates with the piezoelectric drive unit and the components of the mobile unit components, and can Underreporting the time of repairing and production, so that if the part of the piezo drive unit or the mobile unit is damaged, it can be replaced with a new one, so it cannot be used. It can be used in the form of parts to achieve a relatively long time, and thus effectively improve the overall quality and yield of the product. The above detailed description is specific to one of the possible embodiments of the present invention, but the embodiment is not intended to limit The scope of the invention, the equivalent implementation or modification of the invention, should be included in the scope of the φ patent of the present invention. In summary, this (four) but in space (four) (4) innovation, and can be compared The use of customary articles to enhance the above-mentioned multiple functions, should be fully in line with the novelty and progressiveness of the statutory invention patents 1 to apply in accordance with the law, please ask the bureau to approve the invention patent application, in order to invent invention, to the sense of virtue. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 3 is a perspective exploded view of a two-degree-of-freedom nano-scale dust-electric aligning platform mechanism; 201141654 FIG. 2 is a perspective exploded view of the mobile unit; FIG. 3 is a schematic cross-sectional view of the mobile unit; Figure 4 is a perspective exploded view of the piezoelectric driving unit; Figure 5 is an enlarged schematic view of the piezoelectric driving unit; Figure 6 is a schematic cross-sectional view of the piezoelectric driving unit; X-axis shift Y-axis shift Figure 7 is the two degrees of freedom A schematic diagram of the implementation of the nano-scale piezoelectric alignment platform mechanism; and FIG. 8 is a schematic diagram of the operation of the one-degree-of-freedom nano-scale piezoelectric alignment platform mechanism. [Main component symbol description] 1 substrate 2, 2' moving unit 21 upper cover 22 lower cover 23 roller member 24 linear moving member 3, 3 piezoelectric driving unit 3 piezoelectric module 311 electric actuator 312 flexible member 313 mobile terminal 201141654 314 fixed end · 32 upper cover 321 connecting portion 33 lower cover 331 fixing portion 34 linear moving element 4 working platform

Claims (1)

201141654 七、申請專利範圍: 機構,包括 1. 一種二自由度奈米級壓電對位平台 一基板; -移動單元,為以下蓋Μ於基板,該下蓋並以線性移 動7〇件與上蓋連接,且該上蓋與下蓋之接觸面間設有一 滾柱元件作滑動接觸; 壓電驅動單元,為以-下蓋固^於移動單元的上蓋, 該下蓋一端所設之固定部以一㈣模組與上蓋之連接部 連接’且該下蓋再以線性移動元件與上蓋連接作為滑動 接觸; 工作平台,係設置於壓電驅動單元上。 • 3. 2·=請專職圍第彳項所述之二自由度奈綠壓電對位 機構’其中該壓電模組包含一壓電致動器與一撓性 件該壓電致動器二側係以撓性元件所包覆。 2請專㈣圍第j項所述之二自由度奈綠壓電對位 4. '機構’其中該壓電模組之固定端以之撓性元件固定 於下蓋固定部。 平月專利範圍第1項所述之二自由度奈米級壓電對位 /機構’其中該壓電模組之移動端以挽性元件另一端 固定於連接部。 申晴專利範圍第1 j§ %、+. 平^ 乐項所述之二自由度奈米級壓電對位 ’冑其中該壓電模組作動時推動連接部進行對上 [S3 12 6 201141654 蓋相對方向之作動,壓電模組上之撓性元件以供應應力 集令及屢電致動器作動後之覆歸回原點作用。 6. 如申請專利範圍第1項所述之二自由度奈米級壓電對位 平台機構,其中該移動單元於χ軸或γ軸方向所設置之 另一移動單元’其二移動單元的移動方 向呈互相垂直 〇201141654 VII. Patent application scope: The mechanism includes: 1. A substrate with a two-degree-of-freedom nano-scale piezoelectric alignment platform; - a mobile unit that covers the substrate with the following cover, and the lower cover moves linearly with the upper cover and the upper cover Connecting, and a roller member is disposed in sliding contact between the contact surface of the upper cover and the lower cover; the piezoelectric driving unit is a top cover fixed to the upper cover of the moving unit, and the fixing portion provided at one end of the lower cover is (4) The module is connected to the connecting portion of the upper cover and the lower cover is connected to the upper cover by a linear moving element as a sliding contact; the working platform is disposed on the piezoelectric driving unit. • 3. 2·=Please refer to the two-degree-of-freedom nano-piezoelectric alignment mechanism described in the second paragraph, where the piezoelectric module includes a piezoelectric actuator and a flexure. The two sides are covered with a flexible element. 2 Please use the four-degree-of-freedom nano-piezoelectric alignment described in item j. 4. 'Mechanism' The fixed end of the piezoelectric module is fixed to the lower cover fixing portion by the flexible member. The two-degree-of-freedom nano-scale piezoelectric alignment/mechanism described in the first paragraph of the patent application of the first aspect of the invention wherein the moving end of the piezoelectric module is fixed to the connecting portion at the other end of the magnetic component. Shen Qing patent scope 1st j§ %, +. Ping ^ music, the two degrees of freedom nano-scale piezoelectric alignment '胄 where the piezoelectric module is pushed to push the connection to the opposite side [S3 12 6 201141654 The cover is moved in the opposite direction, and the flexible component on the piezoelectric module is returned to the origin by the supply of the stress set and the repeated action of the electric actuator. 6. The two-degree-of-freedom nano-scale piezoelectric alignment platform mechanism according to claim 1, wherein the mobile unit is moved by another mobile unit disposed in the x-axis or the γ-axis direction The directions are perpendicular to each other〇 由度奈米級壓電對位 方向所設置之壓電驅 元的移動方向呈互相 如申請專利範圍第1項所述之二自 平台機構,其中該移動單元於水平 動單元’其移動單元與壓電驅動單 垂直。The moving direction of the piezoelectric driving element set by the piezoelectric alignment direction of the nanometer is a self-plating mechanism according to the first item of the patent application scope, wherein the mobile unit is in the horizontal moving unit The piezoelectric drive is single vertical. 13 m13 m
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CN104097071A (en) * 2013-04-10 2014-10-15 高明铁企业股份有限公司 Positioning method for precision alignment platform
TWI457733B (en) * 2012-08-22 2014-10-21
CN104117859A (en) * 2013-04-25 2014-10-29 高明铁企业股份有限公司 Positioning method of suspension type precise alignment platform
TWI463784B (en) * 2012-11-21 2014-12-01 Univ Nat Yunlin Sci & Tech Quick positioning device with piezoelectric element

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US3886421A (en) * 1973-09-10 1975-05-27 Ibm Precision tool and workpiece positioning apparatus with ringout detection
US4575942A (en) * 1982-10-18 1986-03-18 Hitachi, Ltd. Ultra-precision two-dimensional moving apparatus
RU2233736C2 (en) * 2002-07-11 2004-08-10 Раховский Вадим Израилович Nanometer-range positioning device
TWI238752B (en) * 2004-04-12 2005-09-01 Univ Nat Formosa A five-axis coplanar micro-actuated platform of nano-scale precision

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Publication number Priority date Publication date Assignee Title
TWI457733B (en) * 2012-08-22 2014-10-21
TWI463784B (en) * 2012-11-21 2014-12-01 Univ Nat Yunlin Sci & Tech Quick positioning device with piezoelectric element
CN104097071A (en) * 2013-04-10 2014-10-15 高明铁企业股份有限公司 Positioning method for precision alignment platform
CN104117859A (en) * 2013-04-25 2014-10-29 高明铁企业股份有限公司 Positioning method of suspension type precise alignment platform

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