TW201139523A - Process for production of element substrate and composition to be used therein - Google Patents

Process for production of element substrate and composition to be used therein Download PDF

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TW201139523A
TW201139523A TW100109699A TW100109699A TW201139523A TW 201139523 A TW201139523 A TW 201139523A TW 100109699 A TW100109699 A TW 100109699A TW 100109699 A TW100109699 A TW 100109699A TW 201139523 A TW201139523 A TW 201139523A
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film
group
component
polyimine
compound
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TWI502003B (en
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Takashi Okada
Takaaki Uno
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Jsr Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/452Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
    • C08G77/455Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences containing polyamide, polyesteramide or polyimide sequences
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
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  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Optics & Photonics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

A process for the production of an element substrate, characterized by including: a step (a) of applying a polyimide-based film-forming composition which comprises both a polyamic acid that contains a structural unit represented by general formula (1) and an organic solvent to a supporting body, and drying the resulting coating to form a coating film that contains the polyamic acid; a step (b) of heating the coating film to form a polyimide-based film; a step (c) of forming an element on the polyimide-based film; and a step (d) of peeling the polyimide-based film which has the element thereon from the supporting body. In general formula (1), multiple R1s are each independently a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 100.

Description

201139523 六、發明說明: 【發明所屬之技術領域】 本發明係有關基板之製造方法及用於該方法之組成物 【先前技術】 一般,由芳香族四羧酸二酐與芳香族二胺所得之全芳 香族聚醯亞胺係因分子之剛直性或分子爲共振安定、具有 強的化鍵結等,因此具有優異的耐熱性、機械特性、電特 性、耐氧化·水解性等’在電、電池、汽車及航空宇宙產 業等領域,廣泛作爲薄膜、塗覆劑、成型零件、絕緣材料 使用。 例如使苯均四酸二酐與4,4’-氧二苯胺聚縮合所得之聚 醯亞胺(聚醯亞胺薄膜)係耐熱性及電絕緣性優異,尺寸 安定性高,可用於可撓性印刷基板等。 具體而言,聚醯亞胺薄膜係使苯均四酸二酐與4,4’-氧 二苯胺反應所得之聚醯胺酸溶液中,經過脫溶劑、熱醯亞 胺化步驟而製得。通常,聚醯亞胺薄膜係在不鏽鋼帶等比 較剛直的支持體上成膜。 由苯均四酸二酐、4,4’-氧二苯胺及p-苯二胺所合成之 聚醯亞胺係熱尺寸安定性優異者(專利文獻1及專利文獻2 )0 更提高尺寸安定性之聚醯亞胺薄膜例如有由以4,4·-氧 二苯二甲酸二酐與苯均四酸二酐爲必須成分的四羧酸二酐 -5- 201139523 及含有p-苯二胺與4,4·-氧二苯胺之芳香族二胺所得之聚醯 亞胺薄膜爲人所知(專利文獻3 )。 〔先前技術文獻〕 〔專利文獻〕 〔專利文獻1〕特開平1 -1 3 1 24 1號公報 〔專利文獻2〕特開平1 - 1 3 1 242號公報 〔專利文獻3〕特開2009-5 1 8500號公報 【發明內容】 〔發明槪要〕 〔發明欲解決的課題〕 但是使用上述以往的聚醯亞胺(形成組成物),在如 矽晶圓、無鹼玻璃之支持體上成膜時,隨著成膜時之收縮 變形,基板或薄膜本身產生翹曲的問題。因此,由此等聚 醯亞胺(形成組成物)製造被要求平滑性、彎曲性、柔軟 性、尺寸安定性的用途、特別是可撓性印刷基板、可撓性 顯示器基板等之可撓性基板較困難。此外,將以往之聚醯 亞胺薄膜成膜於矽晶圓、無鹼玻璃等之支持體上時,同時 兼具所得之薄膜與支持體之密著性及剝離性有困難。 本發明之目的係提供更有效避免翹曲或扭曲之發生, 以低成本且簡便之基板之製造方法及用於該製造方法的組 成物。 〔解決課題的手段〕 -6 - 201139523 本發明人爲了解決上述課題,精心檢討結果,發現使 用含有具有特定構造單位之聚醯胺酸與有機溶劑之聚醯亞 胺系膜形成用組成物,在支持體上製造基板,可更有效避 免翹曲或扭曲之發生,此外,可同時兼具所得之薄膜與支 持體之密著性及剝離性的組成物及製造方法,遂完成本發 明。 換言之,本發明係提供以下之Π]〜[10]者》 Π]—種基板之製造方法,其特徵係含有: (a) 在支持體塗佈含有具有下述式(1)表示之構造 單位的聚醯胺酸與有機溶劑的聚醯亞胺系膜形成用組成物 ,經乾燥形成含有聚醯胺酸之塗膜的步驟、 (b) 將前述含有聚醯胺酸之塗膜加熱,得到聚醯亞 胺系膜的步驟、 (c) 在前述聚醯亞胺系膜上形成元件的步驟、 (d) 將前述形成元件之聚醯亞胺系膜由支持體上剝 離的步驟, 【化1】 R1 -fsi—0-)— (1) η R1 (式(1)中,複數之R1係各自獨立爲碳數1〜20之1價 有機基,η係1〜200之整數)。 201139523 [2] 如前述[1]項之基板之製造方法,其中前述聚醯胺 酸爲使(A )含有選自四羧酸二酐及此反應性衍生物所成 群之至少1種醯基化合物的成分與(B)含有亞胺基形成化 合物的成分反應所得’且滿足下述(i)及/或(ii), (i)前述(A)成分含有(A-1)具有上述式(1)表 示之構造單位的醯基化合物 (Π)前述(B)成分含有(B-1)具有上述式(1) 表示之構造單位的亞胺基形成化合物。 [3] 如前述[2]項之基板之製造方法,其中前述(B )成 分中之前述(B-1)具有上述式(1)表示之構造單位之亞 胺基形成化合物的含量係相對於前述(B)成分之合計量 1 〇 〇質量%爲5 ~ 7 0質量%。 [4] 如前述[2]或[3]項之基板之製造方法,其中根據前 述(B-1)具有上述式(1)表示之構造單位的亞胺基形成 化合物之胺價所計算的數平均分子量爲50 0~ 10,000» [5] 如前述[2]~[4]項中任一項之基板之製造方法,其 中前述聚醯胺酸爲使前述(A)成分與前述(B)成分在( A)成分與(B)成分之莫耳比((B)成分/ (A)成分) 〇·8〜1.2之範圍內反應所得。 [6] 如前述[1]〜[5]項中任一項之基板之製造方法,其 中前述有機溶劑爲選自Ν,Ν’·二甲基咪唑啉酮、γ-丁內酯、 Ν -甲基-2 -吡咯烷酮、Ν,Ν -二甲基乙醯胺、四氫呋喃、環 己酮、乙腈及乙二醇單乙醚所成群之至少1種溶劑,相對 於有機溶劑全量含有50重量%以上。 201139523 [7] 如前述[1]〜[6]項中任一項之基板之製造方法,其 中前述構成聚醯亞胺系膜之聚醯亞胺,以差示掃描熱量測 定(DSC、昇溫速度20 °C/分鐘)測定的玻璃轉化溫度爲 3 5 0°C以上。 [8] 如前述[1]~[7]項中任一項之基板之製造方法,其 中前述步驟(b)中之加熱在200〜350 °C之範圍內進行,且 在聚醯亞胺系膜之玻璃轉化溫度以下進行。 [9] 如前述[1]〜[8]項中任一項之基板之製造方法,其 中前述支持體爲矽晶圓或無鹼玻璃。 [1 〇] —種聚醯亞胺系膜形成用組成物,其特徵係用於 如前述[1]〜[9]項中任一項之基板之製造方法的聚醯亞胺系 膜形成用組成物,且含有具有下述式(1)表示之構造單 位的聚醯胺酸與有機溶劑, 【化2】 R1 —(-Si—〇]— (1) η R1 (式(1)中,複數之R1係各自獨立爲碳數1〜20之1價 有機基,η係1〜200之整數)。 〔發明效果〕 依據本發明之基板之製造方法時’可容易製造較少產 -9- 201139523 生翹曲或扭曲之基板。 本發明之聚醯亞胺系膜形成用組成物係由含有具有上 述式(1)表示之構造單位的聚醯胺酸與有機溶劑的組成 物所構成,因此製造基板時,可有效避免產生翹曲或扭曲 〇 藉由使用本發明之聚醯亞胺系膜形成用組成物,即使 在矽晶圓、無鹼玻璃等之支持體上成膜,也可減低隨著成 膜時之收縮變形,在基板或薄膜上所產生之翹曲。因此, 本發明之聚醯亞胺系膜形成用組成物,適合要求平滑性、 彎曲性、柔軟性、尺寸安定性之用途,特別是適合製造可 撓性印刷基板、可撓性顯示器基板等之可撓性基板。此外 ,依據本發明之基板之製造方法,即使使用作爲支持體之 矽晶圓或無鹼玻璃等時,也可容易製造可兼具與該支持體 之密著性與剝離性的聚醯亞胺系膜及基板。 本發明中,「密著性」係指例如在步驟(b )或步驟 (c)中,形成於支持體上之聚醯亞胺系膜及基板與支持 體不易剝離的性質。 本發明中,「剝離性j係指例如在步驟(d )中,剝 離痕較少,且可將基板自支持體上剝離的性質。 〔實施發明的形態〕 本發明係一種基板之製造方法,其特徵係含有: (a)在支持體塗佈含有具有下述式(1)表示之構造 單位的聚醯胺酸與有機溶劑的聚醯亞胺系膜形成用組成物 -10- 201139523 ’經乾燥形成含有聚醯胺酸之塗膜的步驟; (b )將前述含有聚醯胺酸之塗膜加熱,得到聚醯亞 胺系膜的步驟; (c )在前述聚醯亞胺系膜上形成元件的步驟; (d)將前述形成元件之聚醯亞胺系膜由支持體上剝 離的步驟。 【化3】 R1 -fsi—0^— (1) η R1 式(1)中,複數之R1係各自獨立爲碳數1〜20之有機 基,η係1〜200之整數。 「碳數1~2〇」係表示「碳數1以上、碳數20以下」。 本發明中之相同的記載係表示相同的意義。 式(1 )中,R1係碳數1〜2 0之1價有機基,例如有碳數 1〜20之1價烴基及選自氧原子及氮原子所成群之至少1種原 子之碳數1〜20之1價有機基等。 以R1表示之碳數1〜20之烴基,例如有碳數1~20之院基 、碳數3〜2.0之環烷基或碳數6〜20之芳基等。 碳數1~20之烷基,較佳爲碳數1~1〇之烷基’具體而言 ,例如有甲基、乙基、丙基、異丙基、丁基、異丁基、t_ 丁基、戊基、己基等。 碳數3~20之環院基’較佳爲碳數3〜10之環院基’具體 -11 - 201139523 而言,例如有環戊基、環己基等。 碳數6〜20之芳基,較佳爲碳數6〜12之芳基,具體而言 ,例如有苯基、甲苯基、萘基等。 含有氧原子之碳數卜2 0之有機基,例如有由氫原子、 碳原子及氧原子所構成之有機基,具體而言,例如有具有 醚鍵、羰基及酯基之碳數1~2 0之有機基等。 具有醚鍵之碳數1〜20之有機基’例如有碳數1〜20之烷 氧基、碳數2〜20之烯氧基、碳數2〜20之炔氧基、碳數6〜20 之芳氧基及碳數1~20之烷氧基烷基等。具體而言,甲氧基 、乙氧基、丙氧基、異丙氧基、丁氧基、苯氧基、丙烯氧 基、環己氧基及甲氧基甲基等。 具有羰基之碳數卜20之有機基’例如有碳數2〜20之醯 基等。具體而言,例如有乙醯基、丙醯基、異丙醯基及苯 甲醯基等。 具有酯基之碳數卜20之有機基’例如有碳數2〜20之醯 氧基等。具體而言,例如有乙醯氧基、丙醯氧基、異丙醯 氧基及苯甲醯氧基等。 含有氮原子之碳數1〜20之有機基,例如有由氫原子、 碳原子及氧原子所構成之有機基,具體而言,例如有咪唑 基、三唑基、苯並咪唑基及苯並三唑基等。 含有氧原子及氮原子之碳數1~2〇之有機基,例如有由 氫原子 '碳原子、氧原子及氮原子所構成之有機基,具體 而言,例如有噁唑基、噁二唑基、苯並噁唑基及苯並噁二 唑基等 -12- 201139523 前述式(1)中之複數之R1之至少1個,從可有效避免 所得之聚醯亞胺系膜產生翹曲或扭曲的觀點等’較佳爲含 有芳基。更具體而言,複數之R1較佳爲碳數1〜1〇之烷基及 碳數6〜12之芳基。此時,前述式(1)表示之構造單位( 以下也稱爲「構造單位(1)」)中之全部的R1中,碳數 1〜10之烷基之莫耳數(i)與碳數6〜12之芳基之莫耳數(ii )之比(但示(i ) + ( Π ) =1〇〇 )較佳爲(i ) : ( ii ) =90 〜10: 10-90,更佳爲(i ) : (ii)=85〜15: 15-85,更 佳爲(i) : (ii) =85〜6 5: 15-3 5。構造單位(1)中之全 部的R1中,烷基(i)與芳基(ii)之比在前述範圍時,可 有效避免所得之聚醯亞胺系膜產生翹曲或扭曲。前述碳數 1〜10之烷基(i),較佳爲甲基,前述碳數6~12之芳基(ii )較佳爲苯基。 前述式(1)中之η係1〜200之整數,較佳爲3〜200,更 佳爲1 0-200,更佳爲20〜150,更佳爲30〜100,特佳爲 35〜80之整數。前述式(1)中之η在上述範圍內時,由聚 醯胺酸所得之聚醯亞胺容易形成微相分離構造,因此可抑 制所得之聚醯亞胺系膜產生翹曲或扭曲,可抑制聚醯亞胺 系膜之白濁或機械強度降低。 [步驟(a)] 首先說明在支持體上塗佈含有具有構造單位(1)之 聚醯胺酸與有機溶劑之聚醯亞胺系膜形成用組成物,經乾 燥形成含有聚醯胺酸之塗膜的步驟。 •13- 201139523 本步驟所用的聚醯亞胺系膜形成用組成物係含有具有 構造單位(1)之聚醯胺酸與有機溶劑者。使用這種聚醯 胺酸,可得到密著性與剝離性之平衡、及無翹曲之平滑性 優異的基板。前述聚醯亞胺系膜形成用組成物中,在不影 響本發明之目的的範圍內,可調配氧化防止劑、紫外線吸 收劑、界面活性劑等的添加劑。 具有構造單位(1)之聚醯胺酸,較佳爲使(A)含有 選自四.殘酸二酐及此反應性衍生物所成群之至少1種醯基 化合物的成分(本發明中也稱爲「(A)成分」)與(B) 含有亞胺基形成化合物的成分(本發明中也稱爲「(B) 成分」)反應所得。此時,(A)成分使用含有(A-1)構 造單位(1)的醯基化合物(以下也稱爲「化合物(A-1) 」),或(B)成分使用含有(B_l)構造單位(1)的亞 胺基形成化合物(以下也稱爲「化合物(B-1 )」)較佳 。此外,也可使用化合物(A-1)與化合物(B-1)兩者。 依據此反應時,可得到配合使用之原料化合物的構造 的聚醯胺酸,而配合使用之原料化合物之使用量的量,可 得到具有來自該化合物之構造單位的聚醯胺酸。 [(A)成分] (A)成分係含有選自四羧酸二酐及此反應性衍生物 所成群之至少1種醯基化合物的成分。較佳爲含有選自上 述化合物(A-1 )及化合物(A-1 )以外之醯基化合物(A-2 )所成群之至少1種化合物。 -14- 201139523 上述化合物(A-l)具體例有選自具有構造單位(!) 之四羧酸二酐及此反應性衍生物之至少1種醯基化合物’ 較佳爲下述式(2)、式(2A)、式(2B)及式(2C)表 示之化合物等。 上述反應性衍生物例如有具有構造單位(1 )之四羧 酸、該四羧酸之酸酯化物、該四羧酸之酸氯化物等。 【化4】201139523 VI. [Technical Field] The present invention relates to a method for producing a substrate and a composition therefor. [Prior Art] Generally, it is obtained from an aromatic tetracarboxylic dianhydride and an aromatic diamine. The wholly aromatic polyimine has excellent heat resistance, mechanical properties, electrical properties, oxidation resistance, hydrolysis resistance, etc. due to the rigidity of the molecule or the resonance of the molecule, and strong chemical bonding. It is widely used as a film, a coating agent, a molded part, and an insulating material in the fields of batteries, automobiles, and aerospace industries. For example, a polyimine (polyimine film) obtained by polycondensing pyromellitic dianhydride and 4,4'-oxydiphenylamine is excellent in heat resistance and electrical insulation, and has high dimensional stability and can be used for flexibility. Printing substrates, etc. Specifically, the polyimine film is obtained by subjecting a polyphthalic acid solution obtained by reacting pyromellitic dianhydride with 4,4'-oxydiphenylamine by a solvent removal or thermal amination process. Usually, the polyimide film is formed on a relatively rigid support such as a stainless steel belt. The polydiimide synthesized from pyromellitic dianhydride, 4,4'-oxydiphenylamine, and p-phenylenediamine is excellent in thermal dimensional stability (Patent Document 1 and Patent Document 2). The polyimine film of the present invention is, for example, a tetracarboxylic dianhydride having an essential component of 4,4·-oxydiphthalic dianhydride and pyromellitic dianhydride-5-201139523 and containing p-phenylenediamine. A polyimine film obtained from an aromatic diamine of 4,4-oxydiphenylamine is known (Patent Document 3). [PRIOR ART DOCUMENT] [Patent Document 1] [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. Hei No. Hei. SUMMARY OF THE INVENTION [Summary of the Invention] [Problems to be Solved by the Invention] However, the above-mentioned conventional polyimine (formation composition) is used to form a film on a support such as a ruthenium wafer or an alkali-free glass. At the time of shrinkage deformation at the time of film formation, the substrate or the film itself has a problem of warpage. Therefore, the polyimine (formation composition) is used for the production of smoothness, flexibility, flexibility, dimensional stability, and flexibility of a flexible printed circuit board or a flexible display substrate. The substrate is more difficult. Further, when a conventional polyimide film is formed on a support such as a ruthenium wafer or an alkali-free glass, it is difficult to obtain both the adhesion and the releasability of the obtained film and the support. SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate manufacturing method and a composition therefor which are more effective in preventing warpage or distortion from occurring at a low cost and in a simple manner. [Means for Solving the Problem] -6 - 201139523 In order to solve the above problems, the inventors of the present invention have carefully reviewed the results and found that a composition for forming a polyimine film containing a polyamine and a specific solvent having a specific structural unit is used. The present invention can be completed by manufacturing a substrate on a support, which can more effectively prevent the occurrence of warpage or distortion, and a composition and a production method capable of simultaneously obtaining the adhesion and releasability of the obtained film and the support. In other words, the present invention provides a method for producing a substrate comprising: (a) coating a support having a structural unit represented by the following formula (1); a step of forming a polyimide-based film-forming composition of a poly-proline and an organic solvent, forming a coating film containing poly-proline, and (b) heating the coating film containing the poly-proline a step of forming a polyimide film, (c) a step of forming an element on the polyimide film, and (d) a step of peeling the polyimine film forming the element from the support; 1] R1 - fsi - 0 -) - (1) η R1 (In the formula (1), the plural R1 groups are each independently a monovalent organic group having 1 to 20 carbon atoms, and the η is an integer of 1 to 200). The method for producing a substrate according to the above [1], wherein the polyamic acid is at least one mercapto group containing (A) selected from the group consisting of tetracarboxylic dianhydride and the reactive derivative. The component of the compound is reacted with (B) a component containing an imine group-forming compound and satisfies the following (i) and/or (ii), (i) the component (A) contains (A-1) having the above formula ( 1) A mercapto compound (Π) of the structural unit represented by the above (B) component contains (B-1) an imido group-forming compound having a structural unit represented by the above formula (1). [3] The method for producing a substrate according to the above [2], wherein the content of the imine group-forming compound having the structural unit represented by the above formula (1) in the above (B) component is relative to The total amount of the above components (B) is 1% by mass and the mass% is 5 to 70% by mass. [4] The method for producing a substrate according to the above [2] or [3], wherein the number calculated based on the amine valence of the imine group-forming compound having the structural unit represented by the above formula (1) (B-1) The method for producing a substrate according to any one of the above-mentioned items, wherein the poly (A) component and the component (B) It is obtained by reacting the molar ratio of (A) component and (B) component ((B) component / (A) component) 〇·8 to 1.2. [6] The method for producing a substrate according to any one of [1] to [5] wherein the organic solvent is selected from the group consisting of ruthenium, Ν'·dimethylimidazolidinone, γ-butyrolactone, Ν- At least one solvent group of methyl-2-pyrrolidone, hydrazine, hydrazine-dimethylacetamide, tetrahydrofuran, cyclohexanone, acetonitrile, and ethylene glycol monoethyl ether, and 50% by weight or more based on the total amount of the organic solvent . The method for producing a substrate according to any one of the above-mentioned items, wherein the polyimine which constitutes the polyimine film is subjected to differential scanning calorimetry (DSC, temperature increase rate). The glass transition temperature measured at 20 ° C / min) was above 350 ° C. [8] The method for producing a substrate according to any one of [1] to [7] wherein the heating in the step (b) is carried out in the range of 200 to 350 ° C, and in the polyimine system The glass transition temperature of the film is carried out below. [9] The method for producing a substrate according to any one of [1] to [8] wherein the support is a tantalum wafer or an alkali-free glass. [1 〇] A polyimine film for forming a substrate, which is used for the formation of a polyimide film of the method for producing a substrate according to any one of the above [1] to [9] a composition comprising a polyamic acid having a structural unit represented by the following formula (1) and an organic solvent, wherein R 1 —(—Si—〇]—(1) η R1 (in the formula (1), The plural R1 is each independently a monovalent organic group having 1 to 20 carbon atoms, and the η is an integer of 1 to 200. [Effect of the Invention] According to the method for producing a substrate of the present invention, it is easy to manufacture less -9- 201139523 The warpage or the twisted substrate is formed. The composition for forming a polyimine film of the present invention is composed of a composition containing a polyamine having a structural unit represented by the above formula (1) and an organic solvent. When the substrate is produced, warpage or distortion can be effectively prevented. By using the composition for forming a polyimide film of the present invention, it can be reduced even if it is formed on a support such as a ruthenium wafer or an alkali-free glass. The warpage generated on the substrate or the film as the shrinkage deformation at the time of film formation. Therefore, the polyfluorene of the present invention The composition for forming an amine film is suitable for applications requiring smoothness, flexibility, flexibility, and dimensional stability, and is particularly suitable for producing a flexible substrate such as a flexible printed circuit board or a flexible display substrate. In the method for producing a substrate of the present invention, even when a ruthenium wafer or an alkali-free glass as a support is used, a polyimide film which can have both adhesion and releasability to the support can be easily produced. In the present invention, the term "adhesiveness" means, for example, in the step (b) or the step (c), the polyimide film formed on the support and the substrate and the support are not easily peeled off. In the step (d), for example, the peeling property is small, and the substrate can be peeled off from the support. The present invention is a method for producing a substrate, and the characteristics thereof. (a) A composition for forming a polyimine-based film containing a polyamic acid having a structural unit represented by the following formula (1) and an organic solvent in the support, which is formed by drying - (2011) Containing polyaminic acid a step of forming a film; (b) a step of heating the coating film containing the poly-proline to obtain a polyimide film; (c) a step of forming a component on the polyimine film; (d) The step of peeling off the polyimine film forming the element from the support is carried out. [Chemical 3] R1 - fsi - 0^ - (1) η R1 In the formula (1), the plural R1 systems are each independently a carbon number of 1 The organic group of -20 is an integer of η 1 to 200. The "carbon number 1 to 2 〇" means "a carbon number of 1 or more and a carbon number of 20 or less." The same description in the present invention means the same meaning. In the above (1), R1 is a monovalent organic group having 1 to 2 carbon atoms, for example, a monovalent hydrocarbon group having 1 to 20 carbon atoms and a carbon number of at least one atom selected from the group consisting of an oxygen atom and a nitrogen atom. ~20% of the price of organic base and so on. The hydrocarbon group having 1 to 20 carbon atoms represented by R1 may, for example, be a group having a carbon number of 1 to 20, a cycloalkyl group having 3 to 2.0 carbon atoms or an aryl group having 6 to 20 carbon atoms. The alkyl group having 1 to 20 carbon atoms, preferably an alkyl group having 1 to 1 carbon number, specifically, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, and a t-butyl group. Base, pentyl, hexyl and the like. The ring-ring base of the carbon number of 3 to 20 is preferably a ring-shaped base of a carbon number of 3 to 10, and specifically, for example, -11 - 201139523, there are, for example, a cyclopentyl group, a cyclohexyl group and the like. The aryl group having 6 to 20 carbon atoms is preferably an aryl group having 6 to 12 carbon atoms, and specific examples thereof include a phenyl group, a tolyl group, a naphthyl group and the like. The organic group having a carbon number of oxygen atoms, for example, an organic group composed of a hydrogen atom, a carbon atom, and an oxygen atom, specifically, for example, a carbon number of 1 to 2 having an ether bond, a carbonyl group, and an ester group 0 organic base and so on. The organic group having a carbon number of 1 to 20 having an ether bond is, for example, an alkoxy group having 1 to 20 carbon atoms, an alkenyloxy group having 2 to 20 carbon atoms, an alkoxy group having 2 to 20 carbon atoms, and a carbon number of 6 to 20 An aryloxy group and an alkoxyalkyl group having 1 to 20 carbon atoms. Specifically, it is a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a phenoxy group, a propyleneoxy group, a cyclohexyloxy group, a methoxymethyl group or the like. The organic group having a carbon number of the carbonyl group is, for example, a fluorenyl group having 2 to 20 carbon atoms. Specific examples thereof include an ethyl group, a propyl group, an isopropyl group, and a benzamidine group. The organic group having a carbon number of the ester group is, for example, an anthracene group having a carbon number of 2 to 20 or the like. Specific examples thereof include an ethoxylated group, a propyloxy group, an isopropyloxy group, and a benzamidine group. The organic group having a carbon number of 1 to 20 containing a nitrogen atom, for example, an organic group composed of a hydrogen atom, a carbon atom and an oxygen atom, specifically, for example, an imidazolyl group, a triazolyl group, a benzimidazolyl group, and a benzo group Triazolyl and the like. The organic group having 1 to 2 carbon atoms of an oxygen atom and a nitrogen atom, for example, an organic group composed of a hydrogen atom 'carbon atom, an oxygen atom and a nitrogen atom, specifically, for example, an oxazolyl group or an oxadiazole Base, benzoxazolyl and benzooxadiazolyl, etc. -12-201139523 At least one of the plural R1 in the above formula (1) is effective in preventing warpage of the obtained polyimine film or A distorted view or the like 'preferably contains an aryl group. More specifically, the plural R1 is preferably an alkyl group having 1 to 1 carbon atom and an aryl group having 6 to 12 carbon atoms. In this case, the number of moles (i) and carbon number of the alkyl group having 1 to 10 carbon atoms in all of R1 in the structural unit (hereinafter also referred to as "structural unit (1)") represented by the above formula (1). The ratio of the molar number of the aryl group of 6 to 12 (ii) (but (i) + ( Π ) = 1 〇〇) is preferably (i) : ( ii ) = 90 〜 10: 10-90, more Good for (i): (ii)=85~15: 15-85, more preferably (i): (ii) =85~6 5: 15-3 5. In R1 of all the structural units (1), when the ratio of the alkyl group (i) to the aryl group (ii) is in the above range, warpage or distortion of the obtained polyimide film can be effectively prevented. The alkyl group (i) having 1 to 10 carbon atoms is preferably a methyl group, and the aryl group (ii) having 6 to 12 carbon atoms is preferably a phenyl group. The η of the above formula (1) is an integer of from 1 to 200, preferably from 3 to 200, more preferably from 10 to 200, still more preferably from 20 to 150, still more preferably from 30 to 100, particularly preferably from 35 to 80. The integer. When η in the above formula (1) is in the above range, the polyimine obtained from the poly-proline is likely to form a microphase-separated structure, so that warpage or distortion of the obtained polyimide film can be suppressed. It inhibits the white turbidity or mechanical strength of the polyimide film. [Step (a)] First, a composition for forming a polyimine-based film containing a polyamine acid having a structural unit (1) and an organic solvent is applied onto a support, and dried to form a polyglycine-containing composition. The step of coating the film. • 13-201139523 The polyimine film-forming composition used in this step contains a polyamic acid having a structural unit (1) and an organic solvent. By using such a polyamic acid, a substrate having excellent balance between adhesion and peelability and smoothness without warpage can be obtained. In the composition for forming a polyimine-based film, an additive such as an oxidation preventive, an ultraviolet absorber, or a surfactant may be added to the extent that the object of the present invention is not impaired. The polyamic acid having the structural unit (1), preferably (A) a component containing at least one mercapto compound selected from the group consisting of four residual dianhydrides and the reactive derivative (in the present invention) It is also referred to as "(A) component") and (B) a component containing an imine group-forming compound (also referred to as "(B) component in the present invention). In this case, the component (A) is a thiol compound containing (A-1) structural unit (1) (hereinafter also referred to as "compound (A-1)"), or (B) is a component containing (B-1) structural unit. The imido group forming compound (hereinafter also referred to as "compound (B-1)") of (1) is preferred. Further, both the compound (A-1) and the compound (B-1) can also be used. According to this reaction, polylysine having a structure of a raw material compound to be used in combination can be obtained, and the amount of the starting compound used in combination can be used to obtain a polylysine having a structural unit derived from the compound. [Component (A)] The component (A) is a component containing at least one mercapto compound selected from the group consisting of tetracarboxylic dianhydride and the reactive derivative. It is preferably at least one compound containing a group of the mercapto compound (A-2) selected from the group consisting of the above compound (A-1) and the compound (A-1). -14-201139523 The specific compound (Al) is preferably a tetracarboxylic dianhydride having a structural unit (!) and at least one mercapto compound of the reactive derivative, which is preferably the following formula (2). A compound represented by the formula (2A), the formula (2B), and the formula (2C). The above reactive derivative may, for example, be a tetracarboxylic acid having a structural unit (1), an acid ester of the tetracarboxylic acid, an acid chloride of the tetracarboxylic acid or the like. 【化4】

(2A)(2A)

R2——R11 (2)R2——R11 (2)

(2B) (2C) .前述式(2) 、( 2A ) 、 (2B)及(2C)中’複數之 R1及η係各自獨立爲與前述式(1)中之R1及η同義’較佳 之範圍也相同。R2係各自獨立表示碳數卜20之2價烴基。 前述式(2Α)及(2C)中,R11係各自獨立表示氫原子' -15- 201139523 或碳數1~20之1價有機基,此碳數1~20之1價有機基例如有 與前述式(1)中’ Rl中之碳數1〜20之1價有機基同樣的基 等。 R2中之碳數卜20之2價烴基,例如有亞甲基、碳數 2〜20之伸烷基、碳數3〜20之伸環烷基或碳數6〜20之伸芳基 等。 碳數2~20之伸烷基,較佳爲碳數2〜10之伸烷基,例如 有二亞甲基、伸丙基、伸丁基、伸戊基、伸己基等。 碳數3~20之伸環烷基,較佳爲碳數3〜10之伸環烷基, 例如有伸環丁基、伸環戊基、伸環己基、伸環庚基等。 碳數6〜20之伸芳基較佳爲碳數6〜12之伸芳基,例如有 伸苯基、伸萘基等。 化合物(A-1 )從得到耐熱性(高玻璃轉化溫度)及 耐水性優異的聚醯胺酸及/或聚醯亞胺的觀點,數平均分 子量較佳爲200~1 0,000,更佳爲5 00〜8,000。 化合物(A-1 )具體而言,例如有Gelest公司製 DMS-Z21 (數平均分子量600~800、n = 4〜7)等。合成聚醯胺酸 時,此等化合物(A-1)可1種單獨或混合2種以上使用。 (A)成分含有上述化合物(A-1)時,相對於全醯基 化合物((A)成分)之全量100質量%, (A)成分較佳 爲含有化合物(A-1) 10〜60質量%,更佳爲含有20〜50質 量% ’更佳爲含有25〜50質量%’特佳爲含有3〇〜50質量%。 從得到耐熱性及對支持體之密著性與剝離性優異的基板( 聚醯亞胺系膜)的觀點,化合物(A-1)之使用量係包含 -16- 201139523 於上述範圍內較佳。 但是上述化合物(A-1 )相對於全醯基化合物((A) 成分)之全量100質量%之較佳調配量係合成聚醯胺酸時’ 不使用前述化合物(B-1)的情形,合成聚醯胺酸時,其 原料使用化合物(A-1 )及化合物(B-1 )的情形,使用之 化合物(A-1 )及化合物(B-1 )之合計量較佳爲與前述化 合物(A-1 )之較佳調配量同程度者。 (A-2 )化合物(A-1 )以外之醯基化合物 上述化合物(A-1)以外之其他的醯基化合物(A-2) ’例如有選自芳香族四羧酸二酐、脂肪族四羧酸二酐、脂 環族四羧酸二酐、及此等之反應性衍生物所成群之至少1 種化合物。具體例有丁烷四羧酸二酐、1,2,3,4 -環丁烷四 羧酸二酐、1,2,3,4-環戊烷四羧酸二酐、2,3,5_三羧基環戊 基乙酸二酐、1,2,4,5 -環己烷四羧酸二酐、3,5,6 -三羧基降 坎院_2_乙酸二酐、2,3,4,5-四氣呋喃四殘酸二酐、 1,3,3&,4,5,915-六氫-5-(四氫-2,5 - 一氧代-3-咲喃基)-萘并 [1,2-<:]-呋喃-1,3-二酮、5-(2,5-二氧代四氫呋喃基)-3_ 甲基-3-環己烯-1,2-二羧酸二酐、雙環[2,2,2]_辛_7_傭_ 2,3,5,6 -四殘酸二酐等之脂肪族四殘酸二酐或脂環族四竣 酸二酐及此等之反應性衍生物; 4,4’-氧基—本一甲酸一肝、本均四酸二酐、3,3,4,4,-—苯甲酮四殘酸一酐、3,3’,4,4’ -聯苯颯四殘酸二酐、 1,4,5,8-萘四羧酸二酐、2,3,6,7-萘四羧酸二酐、3,3,,4,4,. -17- 201139523 二甲基二苯基矽烷四羧酸二酐、3,3’,4,4’-四苯基矽烷四羧 酸二酐、2,3,4,5-呋喃四羧酸二酐、4,4’-雙(3,4-二羧基苯 氧基)二苯基硫醚二酐、4,4’-雙(3,4-二羧基苯氧基)二 苯基諷二酐、4,4’·雙(3,4-二羧基苯氧基)二苯基丙烷二 酐、3,3’,4,4’-全氟異亞丙基二苯二甲酸二酐、3,3’,4,4’· 聯苯四羧酸二酐、雙(苯二甲酸)苯基膦氧化物二酐、 對-伸苯基-雙(三苯基苯二甲酸)二酐、間-伸苯基-雙( 三苯基苯二甲酸)二酐、雙(三苯基苯二甲酸)-4,4,-二 苯基醚二酐、雙(三苯基苯二甲酸)-4,4’-二苯基甲烷二 酐等芳香族四羧酸二酐及此等之反應性衍生物。 此等中,從優異透明性、對有機溶劑之良好溶解性的 觀點,較佳爲使用脂肪族四羧酸二酐或脂環族四羧酸二酐 。又’從耐熱性、低線膨脹係數(尺寸安定性)、低吸水 性的觀點,較佳爲使用芳香族四羧酸二酐。 前述醯基化合物(A-2)從可有效避免所得之聚醯亞 胺系膜產生翹曲或扭曲的觀點等,較佳爲具有下述式(4 )表示之基團的化合物,更佳爲具有下述式(41)表示之 基團的化合物。 【化5】 (R4)b(2B) (2C) In the above formulae (2), (2A), (2B) and (2C), the plural R1 and η are each independently synonymous with R1 and η in the above formula (1). The scope is also the same. R2 each independently represents a divalent hydrocarbon group of carbon number. In the above formulae (2Α) and (2C), R11 each independently represents a hydrogen atom '-15-201139523 or a monovalent organic group having 1 to 20 carbon atoms, and the monovalent organic group having 1 to 20 carbon atoms is as described above. In the formula (1), the same group or the like of the monovalent organic group having a carbon number of 1 to 20 in R1. The divalent hydrocarbon group of carbon number in R2 is, for example, a methylene group, an alkylene group having 2 to 20 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms or a aryl group having 6 to 20 carbon atoms. The alkylene group having 2 to 20 carbon atoms is preferably an alkylene group having 2 to 10 carbon atoms, and examples thereof include a dimethylene group, a propyl group, a butyl group, a pentyl group, and a hexyl group. The cycloalkyl group having 3 to 20 carbon atoms is preferably a cycloalkyl group having 3 to 10 carbon atoms, and examples thereof include a cyclobutyl group, a cyclopentylene group, a cyclohexylene group, a cyclohexyl group, and the like. The exoaryl group having 6 to 20 carbon atoms is preferably an exoaryl group having 6 to 12 carbon atoms, for example, a phenyl group, a naphthyl group or the like. The compound (A-1) preferably has a number average molecular weight of from 200 to 10,000, more preferably from the viewpoint of obtaining polyamic acid and/or polyimide having excellent heat resistance (high glass transition temperature) and water resistance. 00~8,000. Specific examples of the compound (A-1) include DMS-Z21 (number average molecular weight: 600 to 800, n = 4 to 7) manufactured by Gelest Corporation. In the case of synthesizing polyamic acid, these compounds (A-1) may be used alone or in combination of two or more. When the component (A) contains the compound (A-1), the component (A) preferably contains the compound (A-1) in an amount of 10 to 60% by mass based on 100% by mass based on the total amount of the allyl group-based compound ((A) component). %, more preferably 20 to 50% by mass 'better than 25 to 50% by mass' is particularly good for containing 3 〇 to 50% by mass. The compound (A-1) is used in an amount of from -16 to 201139523 in the above range, from the viewpoint of obtaining heat resistance and a substrate (polyimine film) excellent in adhesion and releasability to a support. . However, a preferred blending amount of the above compound (A-1) with respect to 100% by mass of the total amount of the wholly mercapto compound (component (A)) is the case where the above compound (B-1) is not used when synthesizing polyglycine. In the case of synthesizing poly-proline, when the compound (A-1) and the compound (B-1) are used as a raw material, the total amount of the compound (A-1) and the compound (B-1) to be used is preferably the same as the above compound. The preferred blending amount of (A-1) is the same. (A-2) A mercapto compound other than the compound (A-1) The mercapto compound (A-2) other than the above compound (A-1) is selected, for example, from an aromatic tetracarboxylic dianhydride or an aliphatic group. At least one compound in which the tetracarboxylic dianhydride, the alicyclic tetracarboxylic dianhydride, and the reactive derivative are grouped. Specific examples are butane tetracarboxylic dianhydride, 1,2,3,4-cyclobutane tetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 2,3,5 _Tricarboxycyclopentyl acetic acid dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 3,5,6-tricarboxylamine-2, acetic anhydride dianhydride, 2,3,4 , 5-tetrafuran tetraresic acid dianhydride, 1,3,3&,4,5,915-hexahydro-5-(tetrahydro-2,5-monooxy-3-indolyl)-naphtho[ 1,2-<:]-furan-1,3-dione, 5-(2,5-dioxotetrahydrofuranyl)-3_methyl-3-cyclohexene-1,2-dicarboxylic acid An aliphatic tetrahydro acid dianhydride or an alicyclic tetraphthalic acid dianhydride such as an anhydride, a bicyclo[2,2,2]-octyl_7_server_2,3,5,6-tetraresidic acid dianhydride, and the like And other reactive derivatives; 4,4'-oxyl - Benzoic acid monohepatic, Bentotetracarboxylic dianhydride, 3,3,4,4,--benzophenone tetrahydro acid anhydride, 3,3 ',4,4'-biphenylfluorene tetraresic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride, 3,3, ,4,4,. -17- 201139523 Dimethyldiphenylnonanetetracarboxylic dianhydride, 3,3',4,4'-tetraphenylnonanetetracarboxylic dianhydride, 2,3,4,5 -furan tetracarboxylic dianhydride, 4,4'-bis(3,4-dicarboxyl) Phenoxy group) diphenyl sulfide dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl succinic anhydride, 4,4'·bis(3,4-dicarboxyl Phenoxy)diphenylpropane dianhydride, 3,3',4,4'-perfluoroisopropylidene di phthalic anhydride, 3,3',4,4'·biphenyltetracarboxylic acid Anhydride, bis(phthalic acid) phenylphosphine oxide dianhydride, p-phenylene-bis(triphenylphthalic acid) dianhydride, m-phenylene-bis(triphenylphthalic acid) Aromatic tetracarboxylic acid such as anhydride, bis(triphenylphthalic acid)-4,4,-diphenyl ether dianhydride or bis(triphenylphthalic acid)-4,4'-diphenylmethane dianhydride Acid dianhydride and such reactive derivatives. Among these, from the viewpoint of excellent transparency and good solubility in an organic solvent, aliphatic tetracarboxylic dianhydride or alicyclic tetracarboxylic dianhydride is preferably used. Further, from the viewpoints of heat resistance, low linear expansion coefficient (size stability), and low water absorption, aromatic tetracarboxylic dianhydride is preferably used. The fluorenyl compound (A-2) is preferably a compound having a group represented by the following formula (4), and the like, from the viewpoint of effectively preventing warpage or distortion of the obtained polyimide film. A compound having a group represented by the following formula (41). [5] (R4)b

-18- 201139523-18- 201139523

前述式(4)中’ R4係各自獨立表示氫原子或垸基, 烷基之氫原子可被鹵素原子取代,A係各自獨立表示選自 醚基、硫醚基、酮基、酯基、磺醯基、伸烷基、醯胺基及 矽氧烷基所成群之至少1種之基團的基團,伸烷基之氫原 子可被鹵素原子取代’ D係表示醚基、硫醚基、酮基、酯 基、磺醯基、伸烷基、醯胺基或.砂氧烷基,伸烷基之氫原 子可被鹵素原子取代’ b係各自獨立表示1或2’ c係各自獨 立表示1〜3之整數’ f係表示〇〜3之整數。 前述式(4)中’ R4中之烷基較佳爲碳數1〜20之院基 ,更佳爲碳數1~1〇之院基’具體而言’例如有甲基、乙基 -19- 201139523 、丙基、異丙基、丁基、異丁基、t-丁基、戊基'己基等 0 此等之院基中之任意的氫原子可被氟原子、氯原子、 溴原子或碘原子取代。 前述式(4)中,D中之伸烷基,例如有亞甲基或碳數 2〜2 0之伸烷基等,此亞甲基及伸烷基之氫原子可被鹵素原 子取代。 前述碳數2〜20之伸烷基,較佳爲碳數2〜10之伸烷基, 例如有二亞甲基、伸丙基、伸丁基、伸戊基、伸己基、異 亞丙基、苐基及此等之伸烷基中之任意氫原子被氟原子、 氯原子、溴原子或碘原子取代的基團等。 A係各自獨立表示含有選自醚基(-0-)、硫醚基(-S-)、酮基(-C ( =0 )-)、酯基(-COO-) '磺醯基(-S02-)、伸烷基(-R7-) ' 醯胺基(-C ( =0 ) -NR8-)及 矽氧烷基(-Si ( R9 ) 2-0-Si ( R9 ) 2·)所成群之至少1種之 基團的基團,伸烷基之氫原子可被鹵素原子取代。 前述R8及R9係各自獨立表示氫原子、烷基或鹵素原子 ,此烷基之氫原子可被鹵素原子取代。前述R8及R9中之烷 基,例如有與前述R4中之烷基同樣的基團等。前述鹵素原 子較佳爲氯原子或氟原子。 前述A中之伸烷基(-R7-)例如有與前述D中之伸烷基 同樣的基團等,此等中,較佳爲亞甲基、異亞丙基、六氟 異亞丙基及蒹基。 R4較佳爲氫原子,A較佳爲醚基,D較佳爲磺醯基。 -20- 201139523 f較佳爲0〜2之整數,更佳爲〇或1,更佳爲〇。 【化6】In the above formula (4), 'R4 each independently represents a hydrogen atom or a fluorenyl group, and a hydrogen atom of the alkyl group may be substituted by a halogen atom, and each of the A groups independently represents an ether group, a thioether group, a ketone group, an ester group, a sulfonate. a group of at least one group of a group consisting of a fluorenyl group, an alkylene group, a decylamino group, and a decyloxy group, wherein a hydrogen atom of an alkyl group may be substituted by a halogen atom. 'D system represents an ether group or a thioether group. a keto group, an ester group, a sulfonyl group, an alkylene group, a decylamino group or a oxalyl group. The hydrogen atom of the alkyl group may be substituted by a halogen atom. The 'b systems each independently represent 1 or 2'. An integer representing '1 to 3' is an integer representing 〇~3. In the above formula (4), the alkyl group in 'R4 is preferably a hospital group having a carbon number of 1 to 20, more preferably a carbon number of 1 to 1 Å. Specifically, for example, a methyl group or an ethyl group is used. - 201139523, propyl, isopropyl, butyl, isobutyl, t-butyl, pentyl 'hexyl, etc. Any of the hydrogen atoms in the hospital base may be a fluorine atom, a chlorine atom, a bromine atom or Substituted by iodine atoms. In the above formula (4), the alkyl group in D may, for example, be a methylene group or a C 2 to 2 alkyl group, and the hydrogen atom of the methylene group and the alkyl group may be substituted by a halogen atom. The alkylene group having 2 to 20 carbon atoms, preferably an alkylene group having 2 to 10 carbon atoms, for example, a dimethylene group, a propyl group, a butyl group, a pentyl group, a hexyl group, an isopropylidene group. And a thiol group and a group in which any hydrogen atom in the alkylene group is substituted by a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. Each of the A lines independently represents an ether group (-0-), a thioether group (-S-), a keto group (-C ( =0 )-), and an ester group (-COO-) 'sulfonyl group (- S02-), alkylene (-R7-) 'nonylamino (-C ( =0 ) -NR8-) and oxiranyl (-Si ( R9 ) 2-0-Si ( R9 ) 2 ·) A group of at least one group of groups in which a hydrogen atom of an alkyl group may be substituted by a halogen atom. The above R8 and R9 each independently represent a hydrogen atom, an alkyl group or a halogen atom, and the hydrogen atom of the alkyl group may be substituted by a halogen atom. The alkyl group in the above R8 and R9 may, for example, be the same as the alkyl group in the above R4. The above halogen atom is preferably a chlorine atom or a fluorine atom. The alkylene group (-R7-) in the above A has, for example, the same group as the alkylene group in the above D, and among them, preferably a methylene group, an isopropylidene group or a hexafluoroisopropylidene group. And 蒹基. R4 is preferably a hydrogen atom, A is preferably an ether group, and D is preferably a sulfonyl group. -20- 201139523 f is preferably an integer of 0 to 2, more preferably 〇 or 1, more preferably 〇. 【化6】

上述化合物(Α-1 )以外之醯基化合物(Α-2 )係在( Α)成分中含有上述化合物(Α-1)時,全醯基化合物(( Α)成分)之全量爲100質量%時,(Α)成分中含有40質 量%以上較佳’含有40〜90質量%更佳,含有50〜80質量%更 佳’含有50〜75質量%更佳,含有50〜70質量%特佳。從得 到耐熱性及對基板之密著性與剝離性優異之基板(聚醯亞 胺系膜)的觀點,醯基化合物(Α-2)之使用量較佳爲包 含於上述範圍內。 [(Β)成分] (Β )成分係亞胺基形成化合物。其中,「亞胺基形 成化合物」係指與(A )成分反應形成亞胺(基)的化合 物,具體而言,例如有二胺化合物、二異氰酸酯化合物、 雙(三烷基甲矽烷基)胺基化合物等。 (B)成分ii較佳爲含有選自上述化合物(B-1)及化 合物(B-1)以外之亞胺基形成化合物(B-2)所成群之至 少一種。 -21 - 201139523 具有(B -1 )構造單位(1 )之亞胺基形成化合物,例 如有下述式(3)及式(3A)表示之化合物。 【化7】 R1 R1 H2N—R3—^~Si—〇-j—Si—R3—NH2 (3) R1 R1 if H2N— R3 卜 Si—叶 Si —R3——R11 (3A) \R1 /nR1 前述式(3)中,複數之R1及n係各自獨立與前述式( 1)中之R1及η同義,較佳之範圍也同樣。前述式(3A)中 ,R11係與前述式(2Α)及(2C)中之R11同義。R3係各自 獨立表示碳數1〜20之2價烴基,此碳數1〜20之2價烴基,例 如有與前述式(2) 、(2Α) 、(2Β)及(2C)中,R2中 之碳數1〜20之2價烴基同樣的基團等。 上述化合物(Β-1 )從得到耐熱性(高玻璃轉化溫度 )及耐水性優異的聚醯胺酸及/或聚醯亞胺的觀點,由胺 價計算的數平均分子量較佳爲5 00~ 1 0,000,更佳爲 1,000〜9,000,更佳爲 3,000~8,000。 上述化合物(Β-1 )具體而言,例如有兩末端胺基變 性甲基苯基聚矽氧(信越化學公司製 Χ22- 1 660Β-3'(數平 均分子量4,400、聚合度11 = 41,苯基:甲基=25:75111〇1%) ,Χ22-9409 (數平均分子量1,300))、兩末端胺基變性 二甲基聚矽氧(信越化學公司製 Χ22-161 Α (數平均分子 量1,600、聚合度n = 20) ,X22-161B(數平均分子量3,000 -22- 201139523 、聚合度n = 39) 、KF8012 (數平均分子量4400、聚合度 n = 5 8 )、東麗Dowcorning製 BY16-835U(數平均分子量 9〇〇、聚合度n= 11))等。合成聚醯胺酸時,上述亞胺基 形成化合物(B-1 )可單獨1種使用或組合2種以上使用。 (B)成分含有具有上述式(1)表示之構造單位的亞 胺基形成化合物(B-1)時,相對於全亞胺基形成化合物 ((6)成分)之全量100質量%,(B)成分較佳爲含有 化合物(B-1 ) 5〜70質量%,更佳爲含有10〜60質量%,更 佳爲含有1 5〜5 5質量%。從得到耐熱性及對基板之密著性與 剝離性優異之聚醯亞胺系膜的觀點,亞胺基形成化合物( B-1)之使用量包含於上述範圍較佳。 但是上述化合物(B-1 )相對於全亞胺基形成化合物 ((B )成分)之全量1〇〇質量%之較佳的調配量係合成聚 醯胺酸時,不使用前述化合物(A -1 )的情形。 (B-2 )化合物(B-1 )以外之亞胺基形成化合物 上述化合物(B -1 )以外之其他的亞胺基形成化合物 (B - 2 )’例如有選自由芳香族二胺、脂肪族二胺、脂環 族二胺所成群之至少1種的化合物等。 前述芳香族二胺例如有p-苯二胺、m-苯二胺、2,4 -二 胺基甲苯、4,4’-二胺基二苯基甲烷、4,4,-二胺基二苯醚( 4,4’-ODA) 、3,4’ -二胺基二苯醚(34,_〇DA) 、33,_ 二 胺基二苯醚(3,3’-ODA) 、3,3,-二甲基-4,4,-二胺基聯苯 、2,2’-二甲基-4,4’-二胺基聯苯、4,4,_二胺基_2,2,_雙(三 -23- 201139523 氟甲基)聯苯、3,7-二胺基-二甲基二苯並噻吩- 5,5-物、4,4’-二胺基二苯甲酮、3,3’-二胺基二苯甲酮 雙(4-胺基苯基)硫化物、4,4’-二胺基二苯基颯、 胺基苯甲醯苯胺、l,n-雙(4-胺基苯氧基)烷烴、 [2- (4-胺基苯氧基乙氧基)]乙烷、9,9-雙(4-胺基 莽、9,9-雙(4-胺基苯氧基苯基)莽、5 (6)-胺基 胺基甲基)-1,3,3-三甲基茚滿、1,4-雙(4-胺基苯 苯(TPE-Q) 、1,3-雙(4-胺基苯氧基)苯(TPE 1,3-雙(3-胺基苯氧基)苯(人?8)、2,5-雙(4-胺 基)聯苯(P-TPEQ) 、4,4’-雙(4-胺基苯氧基) 4,4’-雙(3-胺基苯氧基)聯苯、2,2-雙[4- ( 4-胺基 苯基)]丙烷、2,2-雙(4-胺基苯氧基苯基)六氟丙 [4- ( 4-胺基苯氧基)苯基]颯、雙[4- ( 3-胺基苯氧 基]颯、2,2-雙[4 一(4-胺基苯氧基)苯基]六氟丙烷 胺、3,3-二甲氧基-4,4-二胺基聯苯、2,2’-二氯-4^ 基-5,5’-二甲氧基聯苯、2,2’,5,5’-四氯-4,4’-二胺基 4,4’-亞甲基-雙(2-氯苯胺)、9,10-雙(4-胺基苯 、〇-三嗪楓等。此等芳香族二胺可單獨1種或混合2 使用。 前述脂肪族二胺例如有碳數2〜3 0之脂肪族二胺 體例有乙二胺、1,3-丙二胺、1,4-丁二胺、1,5-戊 1,6-己二胺、1,7-庚二胺、1,8-辛二胺、1,9-壬二胺 癸二胺、1,12-十二烷二胺等之烷二胺;氧二(2-胺 )、氧二(2-胺基丙烷)、2-(2-胺基乙氧基)乙 二氧化 、4,4’-4,4,-二 1,3-雙 苯基) -1-(4- 氧基) -R )、 基苯氧 聯苯、 苯氧基 烷、雙 基)苯 、聯苯 ,-二胺 聯苯、 基)蒽 種以上 ,其具 二胺、 ' 1,10- 基乙烷 氧基胺 -24- 201139523 基乙烷等之氧烷二胺。此等脂肪族二胺可單獨1種或混合2 種以上,供給醯亞胺化反應。 前述脂環族二胺可使用分子內具有至少1個脂環基者 ,脂環基可爲單環、多環、縮合環之任一基團。前述脂環 族二胺可使用碳數4~30之脂環族二胺,例如有4,4’-二胺基 二環己基甲烷、4,4’-二胺基-3,3’-二甲基環己基甲烷、 4,4’-二胺基-3,3’,5,5’-四甲基環己基甲烷、1,3-二胺基環 己烷、1,4-二胺基環己烷、1-胺基-3-胺基甲基-3,5,5-三甲 基環己烷、2,2-雙(4,4,-二胺基環己基)丙烷、1,3-雙胺 基甲基環己烷、1,4-雙胺基甲基環己烷、2,3-二胺基雙環 〔2.2.1〕庚烷、2,5·二胺基雙環〔2.2.1〕庚烷、2,6-二胺 基雙環〔2.2.1〕庚烷、2,7-二胺基雙環〔2.2.1〕庚烷、 2,5-雙(胺基甲基)-雙環〔2.2.1〕庚烷、2,6-雙(胺基甲 基)-雙環〔2.2.1〕庚烷、2,3-雙(胺基甲基)-雙環〔 2.2.1〕庚烷、3(4),8(9)-雙(胺基甲基)-三環〔 5.2.1.02’6〕癸烷等。 此等亞胺基形成化合物可單獨1種或組合2種以上使用 〇 前述亞胺基形成化合物(B-2 )從可避免所得之聚醯 亞胺系膜產生翹曲或扭曲的觀點等,較佳爲具有下述式( 5)表示之基團的化合物,更佳爲具有下述式(51)表示之 基團的化合物。 -25- 201139523 【化8】When the mercapto compound (Α-2) other than the above compound (Α-1) contains the above compound (Α-1) in the (Α) component, the total amount of the total mercapto compound ((Α) component is 100% by mass) When the (Α) component contains 40% by mass or more, it is preferable to contain 40 to 90% by mass, more preferably 50 to 80% by mass, more preferably 50 to 75% by mass, and more preferably 50 to 70% by mass. . The amount of the mercapto compound (Α-2) to be used is preferably included in the above range from the viewpoint of heat resistance and a substrate (polyimide film) excellent in adhesion to the substrate and releasability. [(Β)Component] (Β) The component is an imine group forming compound. Here, the "imine forming compound" means a compound which reacts with the component (A) to form an imine (group), and specifically, for example, a diamine compound, a diisocyanate compound, or a bis(trialkylformamidine)amine Base compound, etc. (B) Component ii is preferably at least one selected from the group consisting of the imine group-forming compound (B-2) selected from the group consisting of the above compound (B-1) and the compound (B-1). -21 - 201139523 The imine group-forming compound having a (B -1 ) structural unit (1), for example, a compound represented by the following formula (3) and formula (3A). [Chemical 7] R1 R1 H2N—R3—^~Si—〇-j—Si—R3—NH2 (3) R1 R1 if H2N— R3 Si Si—Leave Si—R3—R11 (3A) \R1 /nR1 In the formula (3), the plural R1 and n are each independently the same as R1 and η in the above formula (1), and the preferred range is also the same. In the above formula (3A), R11 is synonymous with R11 in the above formulas (2Α) and (2C). R3 each independently represents a divalent hydrocarbon group having 1 to 20 carbon atoms, and the divalent hydrocarbon group having 1 to 20 carbon atoms is, for example, in the above formulae (2), (2Α), (2Β), and (2C), in R2. The same group such as a divalent hydrocarbon group having 1 to 20 carbon atoms. The above compound (Β-1) is preferably a number average molecular weight calculated from an amine value from the viewpoint of obtaining a polylysine and/or a polyimide having excellent heat resistance (high glass transition temperature) and water resistance. 1 0,000, more preferably 1,000 to 9,000, more preferably 3,000 to 8,000. Specifically, the above compound (Β-1) has, for example, a terminal amino group-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd. 22- 1 660Β-3' (number average molecular weight 4,400, degree of polymerization 11 = 41, benzene) Base: methyl = 25:75111〇1%), Χ22-9409 (number average molecular weight 1,300)), both terminal amine-denatured dimethylpolyfluorene (Shin-Etsu Chemical Co., Ltd. Χ22-161 Α (number average molecular weight) 1,600, degree of polymerization n = 20), X22-161B (number average molecular weight 3,000 -22-201139523, degree of polymerization n = 39), KF8012 (number average molecular weight 4400, degree of polymerization n = 5 8), Toray by Dow Corning BY16- 835 U (number average molecular weight 9 〇〇, polymerization degree n = 11)) and the like. When the polyaminic acid is synthesized, the above-mentioned imine group-forming compound (B-1) may be used alone or in combination of two or more. When the component (B) contains the imine group-forming compound (B-1) having the structural unit represented by the above formula (1), the total amount of the compound ((6) component) is 100% by mass based on the total imine group-forming compound (B). The component preferably contains the compound (B-1) in an amount of 5 to 70% by mass, more preferably 10 to 60% by mass, still more preferably 15 to 55% by mass. The amount of the imine group-forming compound (B-1) to be used is preferably in the above range from the viewpoint of obtaining a heat-resistant and a polyimide film having excellent adhesion to a substrate and releasability. However, when the compound (B-1) is a compounding amount of the total amount of the total imine group-forming compound (the component (B)) in an amount of 1% by mass, the above compound (A - 1) The situation. (B-2) An imide group-forming compound other than the compound (B-1) The imine group-forming compound (B-2) other than the above compound (B-1) is selected, for example, from an aromatic diamine or a fat. A compound of at least one of a group consisting of a group of diamines and an alicyclic diamine. The aforementioned aromatic diamine is, for example, p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 4,4'-diaminodiphenylmethane, 4,4,-diaminodiyl Phenyl ether (4,4'-ODA), 3,4'-diaminodiphenyl ether (34,_〇DA), 33,-diaminodiphenyl ether (3,3'-ODA), 3, 3,-Dimethyl-4,4,-diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl, 4,4,-diamino 2,2 ,_双(三-23- 201139523 fluoromethyl)biphenyl, 3,7-diamino-dimethyldibenzothiophene-5,5-, 4,4'-diaminobenzophenone , 3,3'-diaminobenzophenone bis(4-aminophenyl) sulfide, 4,4'-diaminodiphenylanthracene, aminobenzamide, l,n-double (4-Aminophenoxy)alkane, [2-(4-aminophenoxyethoxy)]ethane, 9,9-bis(4-aminopurine, 9,9-bis(4- Aminophenoxyphenyl)anthracene, 5 (6)-aminoaminomethyl)-1,3,3-trimethylindan, 1,4-bis(4-aminophenylbenzene (TPE-) Q), 1,3-bis(4-aminophenoxy)benzene (TPE 1,3-bis(3-aminophenoxy)benzene (human?8), 2,5-bis(4-amine) Biphenyl (P-TPEQ), 4,4'-bis (4-amine Phenoxy group) 4,4'-bis(3-aminophenoxy)biphenyl, 2,2-bis[4-(4-aminophenyl)]propane, 2,2-bis(4- Aminophenoxyphenyl)hexafluoropropan[4-(4-aminophenoxy)phenyl]anthracene, bis[4-(3-aminophenoxy)anthracene, 2,2-bis[4 Mono(4-aminophenoxy)phenyl]hexafluoropropanamine, 3,3-dimethoxy-4,4-diaminobiphenyl, 2,2'-dichloro-4^yl-5 , 5'-dimethoxybiphenyl, 2,2',5,5'-tetrachloro-4,4'-diamino 4,4'-methylene-bis(2-chloroaniline), 9 , 10-bis(4-aminobenzene, hydrazine-triazine maple, etc. These aromatic diamines may be used alone or in combination 2. The above aliphatic diamines have, for example, aliphatic groups having a carbon number of 2 to 30. Examples of the amines are ethylenediamine, 1,3-propanediamine, 1,4-butanediamine, 1,5-pentane 1,6-hexanediamine, 1,7-heptanediamine, 1,8-octane An alkanediamine such as an amine, 1,9-nonanediamine oxime diamine or 1,12-dodecanediamine; oxygen bis(2-amine), oxybis(2-aminopropane), 2-(2) -aminoethoxy)ethylene dioxygenate, 4,4'-4,4,-di1,3-diphenyl)-1-(4-oxy)-R), phenoxybiphenyl, benzene Oxyalkane, diyl)benzene Biphenyl, - biphenyl diamine above, yl) anthracene species which has diamine, siloxane diamine '1,10 ethane amine group, etc. -24-201139523 ethane. These aliphatic diamines may be used alone or in combination of two or more kinds thereof to supply a hydrazine imidization reaction. The alicyclic diamine may have at least one alicyclic group in the molecule, and the alicyclic group may be any of a monocyclic, polycyclic or condensed ring. The alicyclic diamine may be an alicyclic diamine having 4 to 30 carbon atoms, for example, 4,4'-diaminodicyclohexylmethane, 4,4'-diamino-3,3'-di Methylcyclohexylmethane, 4,4'-diamino-3,3',5,5'-tetramethylcyclohexylmethane, 1,3-diaminocyclohexane, 1,4-diamine Cyclohexane, 1-amino-3-aminomethyl-3,5,5-trimethylcyclohexane, 2,2-bis(4,4,-diaminocyclohexyl)propane, 1, 3-Diaminomethylcyclohexane, 1,4-diaminomethylcyclohexane, 2,3-diaminobicyclo[2.2.1]heptane, 2,5.diaminobicyclo[2.2 .1] heptane, 2,6-diaminobicyclo[2.2.1]heptane, 2,7-diaminobicyclo[2.2.1]heptane, 2,5-bis(aminomethyl)- Bicyclo[2.2.1]heptane, 2,6-bis(aminomethyl)-bicyclo[2.2.1]heptane, 2,3-bis(aminomethyl)-bicyclo[2.2.1]heptane , 3(4), 8(9)-bis(aminomethyl)-tricyclo[5.2.1.02'6]decane, and the like. These imine group-forming compounds may be used alone or in combination of two or more. The above-described imine group-forming compound (B-2) may be used to prevent warpage or distortion of the obtained polyimide film. A compound having a group represented by the following formula (5) is preferred, and a compound having a group represented by the following formula (51) is more preferred. -25- 201139523 【化8】

前述式(5 )中,R5係各自獨立表示含有醚基、硫醚 基、酮基、酯基、磺醯基、伸烷基、醯胺基或矽氧烷基之 基團、氫原子、鹵素原子、烷基、羥基、硝基、氰基或磺 酸基,此烷基及伸烷基之氫原子可被鹵素原子取代,al係 各自獨立表示1〜3之整數,a2係各自獨立表示1或2,a3係 各自獨立表示1〜4之整數,e係表示0〜3之整數。A及D係各 自獨立與前述式(4)中之A及D同義,較佳之基團也同樣 前述式(5)中,R5較佳爲氫原子、鹵素原子、烷基 、羥基、硝基、氛基或磺酸基,較佳爲氫原子或烷基。 前述式(5)中,R5中之烷基係與前述式(4)中’ R4 -26- 201139523 中之烷基同義,前述式(5)中’ R5中之伸院基係與前述 式(4)中,D中之伸烷基同義。 e較佳爲0〜2之整數’更佳爲0或1 ’更佳爲0 ° 【化9】 R5 R5In the above formula (5), R5 each independently represents a group containing an ether group, a thioether group, a ketone group, an ester group, a sulfonyl group, an alkylene group, a decylamino group or a decyloxy group, a hydrogen atom, or a halogen. An atom, an alkyl group, a hydroxyl group, a nitro group, a cyano group or a sulfonic acid group, wherein the hydrogen atom of the alkyl group and the alkyl group may be substituted by a halogen atom, and the a units each independently represent an integer of 1 to 3, and the a2 groups each independently represent 1 Or 2, a3 each independently represents an integer of 1 to 4, and e represents an integer of 0 to 3. A and D are each independently synonymous with A and D in the above formula (4), and preferred groups are also the same as in the above formula (5), and R5 is preferably a hydrogen atom, a halogen atom, an alkyl group, a hydroxyl group or a nitro group. The aryl group or the sulfonic acid group is preferably a hydrogen atom or an alkyl group. In the above formula (5), the alkyl group in R5 is synonymous with the alkyl group in 'R4 -26-201139523 in the above formula (4), and the above-mentioned formula (R5) in the above formula (5) In 4), the alkyl group in D is synonymous. e is preferably an integer of 0 to 2', more preferably 0 or 1 ', more preferably 0 ° [Chemical 9] R5 R5

前述式(5')中,R5係各自獨立與前述式(5)中之R5 同義。 上述化合物(B-1 )以外之亞胺基形成化合物(B-2 ) 係全亞胺基形成化合物((B)成分)之全量爲100質量% 時,(B)成分中較佳爲含有4 0〜90質量%,更佳爲含有 50~80質量%,更佳爲含有50〜75質量%,特佳爲含有50~70 質量%。從可得到耐熱性及對基板之密著性與剝離性優異 的基板(聚醯亞胺系膜)的觀點,亞胺基形成化合物(B- 2)之使用量係包含在上述範圍內較佳。 含有聚醯胺酸與有機溶劑之聚醯亞胺系膜形成用組成 物係使前述(A)成分與(B)成分在有機溶劑中反應而得 。使(A )成分與(B )成分反應之具體的方法,例如有使 至少1種之(B )亞胺基形成化合物溶解於有機溶劑後,所 得之溶液中添加至少1種的(A )醯基化合物,在〇〜i t -27- 201139523 之溫度下,攪拌1〜60小時的方法等。 上述有機溶劑例如有N-甲基-2-吡咯烷酮、N,N-二甲 基乙醯胺、N,N-二甲基甲醯胺、二甲基亞颯、γ-丁內酯、 Ν,Ν’-二甲基咪唑啉酮、四甲基脲、四氫呋喃、環己酮、 乙腈及乙二醇單乙醚等之非質子系極性溶劑;甲酚、二甲 酚、鹵化酚等之酚系溶劑等。其中較佳爲Ν,Ν’_二甲基咪 唑啉酮、γ-丁內酯、Ν-甲基-2-吡咯烷酮、Ν,Ν-二甲基乙醯 胺、四氫呋喃、環己酮、乙腈及乙二醇單乙醚。 相對於使用之有機溶劑全量(100重量%),含有50重 量%以上,較佳爲含有70〜100重量%之選自Ν,Ν’-二甲基咪 唑啉酮、γ·丁內酯、Ν-甲基-2-吡咯烷酮、Ν,Ν-二甲基乙醯 胺、四氫呋喃、環己酮、乙腈及乙二醇單乙醚之至少1種 溶劑。 此等溶劑可單獨1種或混合2種以上使用。 前述有機溶劑從所得之塗膜(膜)之密著性、剝離性 及殘留應力等的觀點,較佳爲使用醯胺系溶劑與選自醚系 溶劑、酮系溶劑、腈系溶劑及酯系溶劑所成群之至少1種 之非醯胺系溶劑之混合溶劑。使用前述混合溶劑時,可得 到膜形成時之乾燥速度提昇、膜質不會降低,聚醯亞胺系 膜之生產性優異、聚醯胺酸之濃度高的組成物。 前述非醯胺系溶劑較佳爲下述真空乾燥中,選擇性蒸 發,可由形成於基板上之塗膜上幾乎被完全除去的溶劑, 且沸點在40~200°C之範圍的溶劑,更佳爲100〜170°C之範圍 的溶劑。使用這種溶劑時,從組成物中容易除去形成膜時 -28- 201139523 之溶劑,因此得到生產性優異的組成物。本發明中,沸點 係指大氣中,latm下的沸點。 前述非醯胺系溶劑,較佳爲含有選自酮系溶劑、醚系 溶劑及腈系溶劑所成群之至少1種之有機溶劑。此等溶劑 因極性較高,因此具有可得到保存安定性優異之組成物的 傾向。 前述醚系溶劑較佳爲碳數3以上10以下之酸類,更佳 爲碳數3以上7以下之醚類。較佳之醚系溶劑,具體的有乙 二醇、二乙二醇單、乙二醇單乙醚等之單或二烷醚類、二 噁烷、四氫呋喃(THF )等之環狀醚類、苯甲醚等之芳香 族醚類等。此等中較佳爲四氫呋喃。 此等醚系溶劑可單獨1種或組合2種以上使用。 前述酮系溶劑較佳爲碳數3以上1 0以下之酮類,從沸 點及成本的觀點等,更佳爲碳數3以上6以下之酮類。較佳 之酮系溶劑,具體有丙酮(bp = 5 7°C )甲基乙基酮( bp = 80°C)、甲基-η -丙基酮(bp=105°C)、甲基-is〇 -丙基 酮(bp=116°C)、二乙基酮(bp=101°C)、甲基- η-丁基酮 (bp=127°C)、甲基-iso-丁基酮(bp=118°C)、甲基-sec-丁基酮(bp=l 1 8°C )、甲基-tert-丁基酮(bp=l 16°C )等之 二烷基酮類、環戊酮(bp=130°C )、環己酮(CHN ’ bp=156°C)、環庚酮(bp=185°C)等之環狀酮類等。此等 中,從可得到乾燥性、生產性等優異的組成物’下述真空 乾燥中,選擇性蒸發,可由形成於基板上之塗膜上幾乎被 完全除去的溶劑等的觀點,較佳爲環己酮。 -29- 201139523 此等酮系溶劑可單獨1種或組合2種以上使用。 前述腈系溶劑較佳爲碳數2以上1 0以下之腈類,更佳 爲碳數2以上7以下之腈類。較佳之腈系溶劑例如有乙腈( bp = 8 2°C )、丙腈(bp = 9 7°C ) 、丁腈(bp=l )、異丁 腈(bp=107°C)、戊腈(bp=140°C)、異戊腈(bp=129°C )、苯甲腈(bp= 1 91 °C )等。此等中,從低沸點的觀點等 ,較佳爲乙腈。 此等腈系溶劑可單獨1種或組合2種以上使用。 前述酯系溶劑較佳爲碳數3以上10以下之酯類,更佳 爲碳數3以上6以下之酯類。較佳之酯系溶劑例如有乙酸乙 酯(bp = 77°C)、乙酸丙酯(bp = 97t)、乙酸-i-丙酯( bp = 89°C)、乙酸丁酯(bp = 126°C)等烷酯類、β-丙內酯( bp=155°C )等之環狀酯類等。 此等酯系溶劑可單獨1種或組合2種以上使用。 前述醯胺系溶劑較佳爲碳數3以上10以下之醯胺類, 更佳爲碳數3以上6以下之醯胺類。此等中,步驟(a )中 ’ 1次乾燥、接著2次乾燥,得到聚醯亞胺系膜時,從具有 1次乾燥溫度以上之沸點的醯胺系溶劑所得之膜的平坦性 等的觀點較佳,具體而言,沸點爲20(TC以上之醯胺系溶 劑較佳。較佳之醯胺系溶劑例如有N,N-二甲基甲醯胺、 N,N-二甲基乙醯胺(DMAc )等之烷基醯胺類、1,3-二甲 基-2-咪唑啉酮、N-甲基-2-吡咯烷酮(NMP)等之環狀醯 胺類等。此等中,N-甲基-2-吡咯烷酮及N,N-二甲基乙醯 胺,在使非醯胺系溶劑蒸發之真空乾燥或1次乾燥後殘存 -30- 201139523 ’以200°C〜500t所進行之2次乾燥時,可以維持塗膜表面 之平滑性的蒸發速度揮發等,故較佳,若考慮環境污染等 時,更佳爲N-甲基-2-吡咯烷酮。 此等醯胺系溶劑可單獨1種或組合2種以上使用。 前述混合溶劑從乾燥性及生產性等的觀點,較佳爲N-甲基-2-吡咯烷酮與環己酮之混合溶劑、N-甲基-2-吡咯烷 酮與乙腈之混合溶劑,特佳爲N-甲基-2-吡咯烷酮與環己 酮之混合溶劑。又,從所得膜之白濁防止等的觀點,較佳 爲N,N-二甲基乙醯胺與四氫呋喃之混合溶劑。 前述混合溶劑係相對於混合溶劑1 00質量份,較佳爲 含有前述醯胺系溶劑5〜95質量份,更佳爲含有25〜95質量 份,若考慮所得之膜的物性時,更佳爲含有35〜65質量份 。前述混合溶劑相對於混合溶劑1 〇〇質量份,特佳爲含有 前述醯胺系溶劑40~60質量份,混合溶劑中含有此量的前 述醯胺系溶劑時,可得到不僅乾燥速度快,生產性優異之 組成物,且白濁及抗拉強度等之膜質特性、保存安定性等 優異,與基板之密著·剝離性優異不易產生翹曲的膜。 醯胺系溶劑的量未達5質量份時,有時前述聚醯胺酸 不會溶解,無法得到組成物,醯胺系溶劑的量超過9 5質量 份時,有時形成膜時之乾燥速度變慢,生產性差。 反應液中之(B)成分與(A)成分之合計量較佳爲反 應液全量之5〜30質量%。 前述聚醯胺酸係將(A)成分與(B)成分在使用比例 (投入量比)爲(A)成分與(B)成分之莫耳比((B) -31 - 201139523 成分/ (A)成分)成爲0.8〜1.2的範圍內進行反應較佳,成 爲0.95-1.0的範圍內進行反應更佳。(A)醯基化合物與 (B)亞胺基形成物之莫耳比未達0.8當量,或超過1.2當量 時,有時分子量降低,形成聚醯亞胺系膜有困難》 含有上述反應所得之聚醯胺酸與有機溶劑的組成物可 直接作爲前述膜形成用組成物使用,但是前述膜形成用組 成物也可將上述反應所得之聚醯胺酸以固體分形態單離後 ,再溶解於有機溶劑而得。再溶解之有機溶劑例如有與上 述有機溶劑同樣者,較佳爲前述混合溶劑。單離聚醯胺酸 的方法,例如有將含有聚醯胺酸及有機溶劑等的溶液投入 於甲醇或異丙醇等對聚醯胺酸之弱溶劑中,使聚醢胺酸等 沈澱,經濾過·洗淨·乾燥等,使聚醯胺酸以固體分形態分 離的方法等。 聚醯胺酸係指具有含有-CO-NH-及-CO-OH之構造的酸 、或其衍生物(例如具有含有-CO-NH-及-CO-OR (但是R 爲烷基等)之構造者)。聚醯胺酸係藉由加熱等,-CO-NH -之Η與-CO-OH之OH進行脫水(-CO-NH -之Η與-CO-OR 之OR脫離)成爲具有環狀之化學構造(-CO-N-CO-(以下 也稱爲醯亞胺環構造))的聚醯亞胺(以下含有-CO-NH-與- CO-OH之構造、或含有-C0-NH_與_CO_〇r (但是r爲烷 基等)的構造等也稱爲醯胺酸構造) 聚醯胺酸係藉由下述式算出之聚矽氧化合物濃度爲 3〜5 0 %者較佳,5〜4 0 %者更佳,8〜3 0 %者更佳。 聚矽氧化合物濃度[單位:%]=(聚矽氧化合物之重量 -32- 201139523 )/{( (A)全醯基化合物之重量)+ ( (B)全亞胺基形 成化合物之重量)卜1〇〇 「聚矽氧化合物之重量」係指具有上述式(1)表示 之構造單位之化合物全部重量。 前述聚醯胺酸之重量平均分子量(Mw)較佳爲10, 〇〇〇 ~1,000,000’ 更佳爲 10000~200000,更佳爲 20000〜150000 。數平均分子量(Μη)較佳爲5000〜10000000,更佳爲 5 000〜5 00000,特佳爲20 000〜2 00000。聚醯胺酸之重量平 均分子量或數平均分子量未達上述下限時,有時塗膜之強 度會降低。此外’有時所得之聚醯亞胺系膜之線膨張係數 上升至必要以上。聚醯胺酸之重量平均分子量或數平均分 子量超過上述上限時’因聚醯亞胺系膜形成用組成物之黏 度上升’因此將該組成物塗佈於支持體,形成膜時之可調 配於組成物的聚醯胺酸的量變少,有時所得之塗膜之平坦 性等之膜厚精度變差。 前述聚醯胺酸之分子量分布(Mw/Mn )較佳爲1〜1 〇 , 更佳爲2~5,特佳爲2〜4。 前述重量平均分子量、數平均分子量及分子量分布係 與實施例同樣測定的値。 前述聚醯亞胺系膜形成用組成物之黏度係因聚醯胺酸 之分子量或濃度而異,通常爲500〜500,000mPa.s,較佳爲 1,000〜5 0,000mPa_s。未達500mPa.s時,成膜中之組成物 之滯留性差’有時會由支持體流出。而超過500,000mPa . s 時’黏度過高’膜厚之調整困難,有時聚醯亞胺系膜之形 -33- 201139523 成困難。 前述組成物之黏度係使用E型黏度計(東機產業製、 黏度計MODEL RE 100 ),在大氣中,以25 °C測定的値》 前述聚醯亞胺系膜形成用組成物中之聚醯胺酸的濃度 係將組成物之黏度調整成爲上述範圍較佳,也因聚醯胺酸 之分子量而異,通常爲3〜60質量%,較佳爲5〜40質量%, 更佳爲1 〇~40質量%,特佳爲1 0〜3 0質量%。未達3質量%時 ,可能有產生厚膜化困難,生產性差,容易產生針孔,平 坦性等之膜厚精度差等的問題。而超過60質量%時,組成 物之黏度過高,有時不易形成膜,且有時得到欠缺表面平 滑性之聚醯亞胺系膜。 前述聚醯亞胺系膜形成用組成物之黏度及該組成物中 之聚醯胺酸的濃度在前述範圍時,使用生產性等優異之縫 隙塗佈法,可將該組成物塗佈於支持體上,可以生產性良 好、短時間形成膜厚精度等優異的聚醯亞胺系膜。 聚醯亞胺系膜形成用組成物可含有局部醯亞胺化之聚 醯胺酸。 此局部醯亞胺化之聚醯胺酸係以使用脫水劑之方法( 以化學性部分醯亞胺化)或以溶液在1 60〜220°C程度進行 熱處理的方法(以熱部分醯亞胺化)合成,可藉由更低溫 之加熱進行部分環化等,因此較佳爲化學醯亞胺化等之以 化學性部分醯亞胺化者。 前述脫水劑例如有乙酸酐、丙酸酐、苯甲酸酐等之酸 酐、或對應此等化合物之酸氯化物類、二環己基碳二亞胺 -34- 201139523 等之碳二亞胺化合物等。以化學性部分醯亞胺化時,較佳 爲以60〜120°C之溫度加熱。 以熱部分醯亞胺化時,將脫水反應所產生之水排除至 系外,同時進行較佳。此時,使用苯、甲苯、二甲苯等, 將水共沸除去較佳。 部分醯亞胺化時,必要時可使用吡啶 '異喹啉、三甲 胺、三乙胺、Ν,Ν-二甲基胺基吡啶、咪唑等之鹼觸媒。上 述脫水劑或鹼觸媒係相對於(Α)成分1莫耳,分別使用 0.1〜8莫耳之範圍較佳。 進行部分醯亞胺化時,部分醯亞胺化係聚醯胺酸中 之-CO-NH-或- CO-OH等之參與環化反應之官能基1〇〇莫耳 %之至少一部、具體而言爲聚醯胺酸構造及醯亞胺環構造 之合計1 〇〇莫耳%中,醯亞胺環構造之比例(以下也稱爲閉 環率)較佳成爲5~70莫耳%,更佳成爲10〜60莫耳%,特佳 成爲20〜50莫耳%的狀態下進行。 塗佈聚醯亞胺系膜形成用組成物之對象的支持體,例 如有矽晶圓、無鹼玻璃(板)、聚對苯二甲酸乙二酯( PET )薄膜、聚萘二甲酸乙二酯(ΡΕΝ )薄膜、聚對苯二 甲酸丁二酯(ΡΒΤ )薄膜、尼龍6薄膜、尼龍6,6薄膜、聚 丙烯薄膜、聚四氟乙烯製帶、玻璃晶圓、玻璃(板)(不 包括無鹼玻璃(板))、Cu板及SUS板等。無鹼玻璃係指 不包含鉀或鈉等鹼成分的玻璃。 依據本發明之基板之製造方法時,可使用矽晶圓或無 驗玻璃(板)等之支持體成膜。這種支持體在加熱條件下 -35- 201139523 ,具有高尺寸安定性,因此,步驟(a)或步驟(b)中, 即使加熱也無尺寸變化。因此,設置於該支持體上之聚醯 亞胺系膜,尺寸變化減少,可在所望位置容易形成元件。 使用這種支持體,可降低去除該支持體後之基板減低 翹曲或扭曲。因此,在這種支持體上形成膜,再形成元件 較佳。 將聚醯亞胺系膜形成用組成物塗佈於支持體上,形成 塗膜的方法,例如有輥塗佈法、凹版塗佈法、旋轉塗佈法 、浸漬塗佈法及使用刮板、模具、塗佈器、噴霧器、毛刷 、輥等進行塗佈的方法等。可藉由重複塗佈控制薄膜之厚 度或表面平坦性等。其中較佳爲縫塗佈法。 所得之塗膜乾燥後的厚度(包括聚醯胺酸之塗膜厚度 )無特別限定,例如1〜5 00μπι,較佳爲1〜45 0μηι,更佳爲 1〜250μηι,更佳爲 2〜150μηι,更佳爲 10~125μηι。 上述塗膜乾燥的步驟,具體而言可藉由將塗膜加熱來 進行。將塗膜加熱可使該塗膜中之有機溶劑蒸發除去。上 述加熱條件只要有機溶劑蒸發則無特別限制,例如在 6 0〜2 5 0 t,加熱1〜5小時。又,加熱可分二階段進行。例 如,以7 0 °C加熱3 0分鐘後,以1 2 0 °C加熱3 0分鐘等。 加熱氣氛無特別限定,較佳爲大氣下或惰性氣體氣氛 下等,特佳爲惰性氣體氣氛下。惰性氣體從著色性的觀點 ,例如有氮、氬、氦等,較佳爲氮。 前述步驟(a)也可在進行前述加熱之前或取代加熱 而進行真空乾燥,使該塗膜中之有機溶劑蒸發除去。該真 -36- 201139523 空乾燥係不必將熱風等吹送於形成於支持體上之塗膜,可 將溶劑容易由塗膜中除去,因此可得到平坦性優異的聚醯 亞胺系膜,由含有聚醯胺酸之塗膜表面固定化,可以再現 性良好形成平坦性優異、具有均勻膜質的聚醯亞胺系膜。 前述真空乾燥係將放置有塗膜之裝置內的壓力(減壓 度)成爲760mmHg以下,較佳爲lOOmmHg以下,更佳爲 50mmHg以下,特佳爲ImmHg以下爲止,減少裝置內的壓 力較佳。超過760mmHg時,從真空乾燥後之塗膜中再除去 溶劑時之蒸發速度明顯變慢,有時生產性差。真空乾燥係 壓力降至所定値時作爲0分鐘,進行0〜60分鐘,較佳爲 〇〜30分鐘,更佳爲0〜20分鐘。未達〇分鐘時,乾燥不足, 有時塗膜之表面未固定化,很難得到均勻膜質的膜。超過 6 0分鐘時,有時膜之生產性差。 [步驟(b)] 接著’將步驟(a)所得之塗膜進行加熱得到聚醯亞 胺系膜。步驟(b )係將所得之塗膜例如以1 6 0 °C〜3 5 0 °C熱 處理’進行脫水環化(熱醯亞胺化)。熱醯亞胺化之溫度 係比前述步驟(a)中’藉由加熱乾燥(使有機溶劑蒸發 )時之溫度更高的溫度’從所得之基板之剝離性的觀點, 較佳爲200〜3 5 0 °C,更佳爲23 0〜270°C,更佳爲240〜25(TC。 熱醯亞胺化之溫度’從剝離性的觀點,特佳爲聚醯亞胺系 膜之玻璃轉化溫度以下。 醯亞胺化係醯胺酸構造及醯亞胺環構造之合計1 〇 〇莫 -37- 201139523 耳%中’醯亞胺環構造之比例較佳爲7 5莫耳%以上,較佳 爲85莫耳%以上,特佳爲9〇莫耳%以上的狀態進行。醯亞 胺環構造之比例未達7 5莫耳%時,有時聚醯亞胺系膜之吸 水率變高,或耐久性降低。 前述聚醯亞胺系膜係由聚醯亞胺等構成,該聚醯亞胺 以差示掃描熱量測定(D S C、昇溫速度2 0。(: /分鐘)測定的 玻璃轉化溫度’較佳爲3 5 0 °C以上,更佳爲4 5 01:以上。聚 醯亞胺之玻璃轉化溫度在前述範圍時,所得之基板顯示優 異的耐熱性。 由聚醯胺酸所得之聚醯亞胺之醯亞胺基濃度,當醯亞 胺化率假設爲100莫耳%時,較佳爲2.5〜7.5mmol/g,更佳 爲 3.0〜6.0mmol/g,更佳爲 3.5〜5.5mmol/g » 本發明中’聚醯亞胺系膜(薄膜)之厚度較佳爲 1~250μηι,更佳爲 2_〜150μηι,特佳爲 10〜125μηι。 前述聚醯亞胺系膜係玻璃轉化溫度(Tg )較佳爲 3 5 0°C以上,更佳爲45 0°C以上。由於具有這種玻璃轉化溫 度,而具有優異的耐熱性。 [步驟(c)] 接著,在前述步驟(b)所得之聚醯亞胺系膜上形成 元件,製作基板。形成的元件例如有有機電致發光(EL ) 元件、薄膜電晶體(TFT )元件等之發光元件、金屬配線 、半導體積體電路等之模組等。 在前述步驟(b)所得之聚醯亞胺系膜上,形成有機 -38- 201139523 EL元件、TFT元件等之發光元件等時,可作爲可撓性顯示 器基板等使用。此外,形成金屬配線、半導體積體電路等 之模組時,可作爲可撓性配線用基板等使用。 形成TFT元件之方法,例如在前述步驟(b )所得之聚 醯亞胺系膜上,以濺鍍法等形成金屬或金屬氧化物等之膜 後,進行蝕刻等設置閘極電極。以濺鍍法等形成金屬或金 屬氧化物等之膜時的溫度,可配合使用之聚醯亞胺系膜形 成用組成物、支持體或形成之元件來適當選擇,較佳爲 210°C 〜400°C,更佳爲 220 〜3 70 °C,更佳爲 23 0 〜3 5 0〇C。 接著,例如以電漿CVD法等於設置閘極電極之聚醯亞 胺系膜上形成氮化矽膜等閘極絕緣膜。進而,以電漿CVD 法等在閘極絕緣膜上形成由有機半導體等所構成之活性層 。以電漿CVD法等形成閘極絕緣膜或有機半導體等之膜時 之溫度,可配合使用之聚醯亞胺系膜形成用組成物、支持 體或形成之元件來適當選擇,較佳爲210°C〜400°C,更佳爲 220〜3 7 0°C,更佳爲230〜3 5 0 °C。其次,以濺鍍法等在活性 層上形成金屬或金屬氧化物等之膜後,進行蝕刻等,設置 源極電極及汲極電極。最後,可視需要以電漿CVD法等形 成氮化矽膜等,作爲保護膜,可製造薄膜電晶體元件。 以上說明底閘極型(bottom gate)之薄膜電晶體元件 ,但前述TFT元件並不限於此構造,亦可爲頂閘極型(top gate)。 閘極電極、源極電極、汲極電極只要是以導電性材料 形成則無特別限制。導電性材料例如有金屬或金屬氧化物 -39- 201139523 等。 金屬例有鉑、金、銀、鎳、鉻、銅、鐵、錫、銻鉛、In the above formula (5'), R5 is each independently synonymous with R5 in the above formula (5). When the total amount of the imine group-forming compound (B-2) other than the compound (B-1) is 100% by mass, the component (B) preferably contains 4 0 to 90% by mass, more preferably 50 to 80% by mass, still more preferably 50 to 75% by mass, particularly preferably 50 to 70% by mass. The use amount of the imine group-forming compound (B-2) is preferably in the above range from the viewpoint of obtaining a substrate (polyimine film) excellent in heat resistance and adhesion to the substrate and releasability. . The polyimine-based film-forming composition containing a poly-proline and an organic solvent is obtained by reacting the component (A) and the component (B) in an organic solvent. In a specific method of reacting the component (A) with the component (B), for example, at least one (B) imine group-forming compound is dissolved in an organic solvent, and at least one kind of (A) is added to the obtained solution. The base compound is stirred at a temperature of 〇~it -27-201139523 for 1 to 60 hours. The above organic solvent is, for example, N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, dimethyl hydrazine, γ-butyrolactone, hydrazine, An aprotic polar solvent such as Ν'-dimethylimidazolidinone, tetramethylurea, tetrahydrofuran, cyclohexanone, acetonitrile or ethylene glycol monoethyl ether; phenolic solvent such as cresol, xylenol or halogenated phenol Wait. Preferred among them are hydrazine, Ν'_dimethylimidazolidinone, γ-butyrolactone, Ν-methyl-2-pyrrolidone, hydrazine, hydrazine-dimethylacetamide, tetrahydrofuran, cyclohexanone, acetonitrile and Ethylene glycol monoethyl ether. It is contained in an amount of 50% by weight or more, preferably 70% to 100% by weight, based on the total amount (100% by weight) of the organic solvent to be used, selected from the group consisting of hydrazine, Ν'-dimethylimidazolidinone, γ-butyrolactone, and hydrazine. At least one solvent of -methyl-2-pyrrolidone, hydrazine, hydrazine-dimethylacetamide, tetrahydrofuran, cyclohexanone, acetonitrile, and ethylene glycol monoethyl ether. These solvents may be used alone or in combination of two or more. The organic solvent is preferably a guanamine-based solvent and a solvent selected from the group consisting of an ether solvent, a ketone solvent, a nitrile solvent, and an ester system from the viewpoints of adhesion, peelability, and residual stress of the obtained coating film (film). A mixed solvent of at least one non-melamine-based solvent in which a solvent is a group. When the above-mentioned mixed solvent is used, it is possible to obtain a composition in which the drying speed at the time of film formation is increased, the film quality is not lowered, the productivity of the polyimide film is excellent, and the concentration of polyglycine is high. The non-amine-based solvent is preferably a solvent which is selectively evaporated in the following vacuum drying, and which can be almost completely removed from the coating film formed on the substrate, and preferably has a boiling point in the range of 40 to 200 ° C. A solvent in the range of 100 to 170 ° C. When such a solvent is used, the solvent at the time of film formation -28-201139523 is easily removed from the composition, and thus a composition excellent in productivity is obtained. In the present invention, the boiling point refers to the boiling point in the atmosphere at a lamat. The non-melamine-based solvent preferably contains at least one organic solvent selected from the group consisting of a ketone solvent, an ether solvent, and a nitrile solvent. Since these solvents have a high polarity, they tend to have a composition excellent in storage stability. The ether solvent is preferably an acid having 3 or more and 10 or less carbon atoms, more preferably an ether having 3 or more and 7 or less carbon atoms. Preferred ether solvents are, in particular, mono or dialkyl ethers such as ethylene glycol, diethylene glycol monohydrate, ethylene glycol monoethyl ether, cyclic ethers such as dioxane or tetrahydrofuran (THF), and benzoic acid. An aromatic ether such as ether. Preferred among these are tetrahydrofuran. These ether solvents may be used alone or in combination of two or more. The ketone-based solvent is preferably a ketone having a carbon number of 3 or more and 10 or less, and more preferably a ketone having 3 or more carbon atoms from the viewpoint of boiling point and cost. Preferred ketone solvents, specifically acetone (bp = 5 7 ° C) methyl ethyl ketone (bp = 80 ° C), methyl - η - propyl ketone (bp = 105 ° C), methyl - is 〇-propyl ketone (bp = 116 ° C), diethyl ketone (bp = 101 ° C), methyl - η-butyl ketone (bp = 127 ° C), methyl-iso-butyl ketone ( Bt = 118 ° C), di-alkyl ketones such as methyl-sec-butyl ketone (bp = l 18 ° C), methyl-tert-butyl ketone (bp = l 16 ° C), etc. A cyclic ketone such as pentanone (bp = 130 ° C), cyclohexanone (CHN ' bp = 156 ° C), or cycloheptanone (bp = 185 ° C). In the above-mentioned vacuum drying which is excellent in drying property and productivity, it is preferable to selectively evaporate from the viewpoint of solvent which is almost completely removed from the coating film formed on the substrate. Cyclohexanone. -29- 201139523 These ketone solvents may be used alone or in combination of two or more. The nitrile-based solvent is preferably a nitrile having a carbon number of 2 or more and 10 or less, more preferably a nitrile having a carbon number of 2 or more and 7 or less. Preferred nitrile-based solvents are, for example, acetonitrile (bp = 8 2 ° C), propionitrile (bp = 9 7 ° C), butyronitrile (bp = l), isobutyronitrile (bp = 107 ° C), valeronitrile ( Bp = 140 ° C), isovaleronitrile (bp = 129 ° C), benzonitrile (bp = 1 91 ° C) and the like. Among these, from the viewpoint of a low boiling point, etc., acetonitrile is preferred. These nitrile-based solvents may be used alone or in combination of two or more. The ester solvent is preferably an ester having 3 or more and 10 or less carbon atoms, more preferably an ester having 3 or more and 6 or less carbon atoms. Preferred ester solvents are, for example, ethyl acetate (bp = 77 ° C), propyl acetate (bp = 97 t), -i-propyl acetate (bp = 89 ° C), butyl acetate (bp = 126 ° C). a cyclic ester such as an alkyl ester or a β-propiolactone (bp = 155 ° C). These ester-based solvents may be used alone or in combination of two or more. The amide-based solvent is preferably an amide having a carbon number of 3 or more and 10 or less, more preferably an amide having a carbon number of 3 or more and 6 or less. In the above, in the step (a), the film is dried once, and then dried twice to obtain a flatness of the film obtained from a guanamine-based solvent having a boiling point equal to or higher than the primary drying temperature. The viewpoint is preferable. Specifically, a hydrazine-based solvent having a boiling point of 20 or more is preferred. Preferred examples of the guanamine-based solvent are N,N-dimethylformamide, N,N-dimethylacetamidine. a cyclic guanamine such as a alkyl guanamine such as an amine (DMAc), 1,3-dimethyl-2-imidazolidinone or N-methyl-2-pyrrolidone (NMP). N-methyl-2-pyrrolidone and N,N-dimethylacetamide are left in a vacuum drying or one drying after evaporation of a non-amine solvent, -30-201139523' at 200 ° C to 500 t In the case of drying twice, it is preferable to maintain the evaporation rate of the smoothness of the surface of the coating film, etc., and it is more preferable to use N-methyl-2-pyrrolidone in consideration of environmental pollution or the like. The solvent mixture may be used alone or in combination of two or more. The mixed solvent is preferably a mixed solvent of N-methyl-2-pyrrolidone and cyclohexanone, and N-A from the viewpoints of drying property and productivity. A mixed solvent of -2-pyrrolidone and acetonitrile, particularly preferably a mixed solvent of N-methyl-2-pyrrolidone and cyclohexanone. Further, from the viewpoint of prevention of white turbidity of the obtained film, etc., N, N-dimethyl is preferable. The mixed solvent of the acetamide and the tetrahydrofuran. The mixed solvent is preferably used in an amount of 5 to 95 parts by mass, more preferably 25 to 95 parts by mass, based on 100 parts by mass of the mixed solvent. In the case of the physical properties of the obtained film, it is more preferably 35 to 65 parts by mass. The mixed solvent is preferably contained in an amount of 40 to 60 parts by mass based on 1 part by mass of the mixed solvent, and the mixed solvent contains the mixture. When the amount of the above-mentioned amide-based solvent is obtained, it is possible to obtain a composition which is excellent in productivity and excellent in productivity, and is excellent in film properties such as white turbidity and tensile strength, storage stability, and the like, and is excellent in adhesion and peeling property to a substrate. When the amount of the guanamine-based solvent is less than 5 parts by mass, the polylysine may not be dissolved, and the composition may not be obtained. When the amount of the guanamine-based solvent exceeds 95 parts by mass, the film may sometimes be Drying speed when forming a film The amount of the component (B) and the component (A) in the reaction liquid is preferably 5 to 30% by mass based on the total amount of the reaction liquid. The polyamic acid is the component (A) and the component (B). It is preferable to carry out the reaction in a range in which the ratio (input ratio) is a molar ratio of (A) component to (B) component ((B) -31 - 201139523 component / (A) component) is 0.8 to 1.2. The reaction is preferably carried out in the range of 0.95 to 1.0. When the molar ratio of the (A) mercapto compound to the (B) imido group formation is less than 0.8 equivalents, or more than 1.2 equivalents, the molecular weight sometimes decreases to form a polyazide. The amine film is difficult. The composition of the polyamic acid and the organic solvent obtained by the above reaction can be used as the film forming composition. However, the film forming composition may also be a polylysine obtained by the above reaction. It is obtained by separating it into a solid form and then dissolving it in an organic solvent. The organic solvent to be redissolved is, for example, the same as the above organic solvent, and the mixed solvent is preferred. The method of separating the polyamic acid is, for example, a solution containing a polyamic acid, an organic solvent, or the like, which is added to a weak solvent such as methanol or isopropyl alcohol in the form of polyaminic acid to precipitate a polyamine or the like. A method in which polylysine is separated as a solid fraction by filtration, washing, drying, or the like. Polylysine refers to an acid having a structure containing -CO-NH- and -CO-OH, or a derivative thereof (for example, having -CO-NH- and -CO-OR (but R is an alkyl group, etc.) Constructor). Polylysine is dehydrated by heating, such as -CO-NH - and OH of -CO-OH (OR separation of -CO-NH - and -CO-OR) into a chemical structure having a ring shape (-CO-N-CO- (hereinafter also referred to as yttrium ring structure)) polyimine (the structure containing -CO-NH- and -CO-OH, or -C0-NH_ and _ The structure of CO_〇r (but r is an alkyl group or the like) is also called a proline structure. The polyamine acid is preferably a concentration of a polyoxonium compound of 3 to 50% calculated by the following formula. 5 to 4 0% are better, and 8 to 3 0% are better. Polyxanthene concentration [unit: %] = (polyoxyl compound weight - 32 - 201139523) / {( (A) total mercapto compound weight) + ( (B) total imine group forming compound weight) The "weight of the polyoxymethylene compound" means the total weight of the compound having the structural unit represented by the above formula (1). The weight average molecular weight (Mw) of the polyamic acid is preferably 10, 〇〇〇 ~1,000,000' is more preferably 10,000 to 200,000, still more preferably 20,000 to 150,000. The number average molecular weight (?n) is preferably from 5,000 to 10,000,000, more preferably from 5,000 to 50,000, and particularly preferably from 20,000 to 20,000. When the weight average molecular weight or the number average molecular weight of the polyamic acid does not reach the above lower limit, the strength of the coating film may be lowered. Further, the linear expansion coefficient of the obtained polyimide film is sometimes increased to more than necessary. When the weight average molecular weight or the number average molecular weight of the polyamic acid exceeds the above upper limit, the viscosity of the composition for forming a polyimine film is increased. Therefore, the composition is applied to the support, and the film is formed when the film is formed. The amount of the polyamic acid of the composition is small, and the film thickness accuracy such as the flatness of the obtained coating film may be deteriorated. The molecular weight distribution (Mw/Mn) of the polyamic acid is preferably from 1 to 1 Torr, more preferably from 2 to 5, particularly preferably from 2 to 4. The weight average molecular weight, number average molecular weight, and molecular weight distribution are the same as those measured in the examples. The viscosity of the polyimine-based film-forming composition varies depending on the molecular weight or concentration of the poly-proline, and is usually 500 to 500,000 mPa·s, preferably 1,000 to 50,000 mPa·s. When it is less than 500 mPa·s, the poor retention of the composition in the film formation may sometimes flow out from the support. When the thickness exceeds 500,000 mPa·s, the viscosity is too high, and the adjustment of the film thickness is difficult. In some cases, the shape of the polyimide film is difficult to be -33-201139523. In the viscosity of the above-mentioned composition, an E-type viscometer (manufactured by Toki Sangyo Co., Ltd., viscosity meter MODEL RE 100), which is measured at 25 ° C in the atmosphere, is used in the composition of the polyimine film forming composition. The concentration of the proline is preferably adjusted to have the viscosity of the composition in the above range, and is also preferably from 3 to 60% by mass, preferably from 5 to 40% by mass, more preferably 1 due to the molecular weight of the poly-proline. 〇~40% by mass, particularly preferably from 10 to 30% by mass. When the amount is less than 3% by mass, there is a problem that thick film formation is difficult, productivity is poor, pinholes are likely to occur, and film thickness accuracy such as flatness is poor. On the other hand, when it exceeds 60% by mass, the viscosity of the composition is too high, and a film may not easily form, and a polyimide film which lacks surface smoothness may be obtained. When the viscosity of the polyimine-based film-forming composition and the concentration of the poly-proline in the composition are within the above range, the composition can be applied to a support by using a slit coating method which is excellent in productivity and the like. In the form of a film, the polyimide film having excellent productivity and short film thickness can be formed in a short period of time. The polyimine film-forming composition may contain a partially ruminated imidized polyamine. The partially ruthenium imidized polyamine is a method of heat treatment using a dehydrating agent (chemically hydrazide) or a solution at a temperature of about 160 to 220 ° C The synthesis can be carried out by partial cyclization or the like by heating at a lower temperature. Therefore, it is preferably a chemical moiety which is imidized by chemical imidization. The dehydrating agent may, for example, be an acid anhydride such as acetic anhydride, propionic anhydride or benzoic anhydride, or an acid chloride such as these compounds, or a carbodiimide compound such as dicyclohexylcarbodiimide-34-201139523. When the chemical moiety is imidized, it is preferably heated at a temperature of from 60 to 120 °C. When the hot portion is imidized, the water produced by the dehydration reaction is excluded from the system while being preferably carried out. At this time, it is preferred to use a benzene, toluene, xylene or the like to azeotropically remove water. In the case of partial ruthenium iodide, a base catalyst such as pyridine 'isoquinoline, trimethylamine, triethylamine, hydrazine, hydrazine-dimethylaminopyridine or imidazole may be used as necessary. The dehydrating agent or the base catalyst is preferably used in the range of 0.1 to 8 mol per mol of the (Α) component. When partial oxime imidization is carried out, at least one of the functional groups involved in the cyclization reaction, such as -CO-NH- or -CO-OH, in the partial ruthenium-based polyglycolic acid, Specifically, in the total of the polyamine structure and the quinone ring structure, the ratio of the quinone ring structure (hereinafter also referred to as a ring closure ratio) is preferably 5 to 70 mol%. More preferably, it becomes 10 to 60% by mole, and is particularly good to be in a state of 20 to 50% by mole. A support for coating a composition for forming a polyimide film, for example, a germanium wafer, an alkali-free glass (plate), a polyethylene terephthalate (PET) film, or a polyethylene naphthalate Ester (ΡΕΝ) film, polybutylene terephthalate (ΡΒΤ) film, nylon 6 film, nylon 6,6 film, polypropylene film, polytetrafluoroethylene tape, glass wafer, glass (plate) (not Including alkali-free glass (plate), Cu board and SUS board. The alkali-free glass refers to a glass which does not contain an alkali component such as potassium or sodium. According to the method for producing a substrate of the present invention, a support such as a tantalum wafer or a non-inspective glass (plate) can be used for film formation. Such a support has a high dimensional stability under heating conditions of -35 to 201139523, and therefore, in step (a) or step (b), there is no dimensional change even if heated. Therefore, the polyimide film provided on the support has a small dimensional change and can easily form an element at a desired position. With such a support, it is possible to reduce the warpage or distortion of the substrate after removing the support. Therefore, it is preferable to form a film on such a support, and to form an element. A method of forming a coating film on a support by applying a composition for forming a polyimide film to a support, for example, a roll coating method, a gravure coating method, a spin coating method, a dip coating method, and a squeegee, A method of coating a mold, an applicator, a sprayer, a brush, a roll, or the like. The thickness or surface flatness of the film can be controlled by repeated coating. Among them, a slit coating method is preferred. The thickness of the obtained coating film after drying (including the thickness of the coating film of polyamic acid) is not particularly limited, and is, for example, 1 to 5 00 μm, preferably 1 to 45 0 μm, more preferably 1 to 250 μm, and even more preferably 2 to 150 μm. More preferably, it is 10~125μηι. The step of drying the coating film can be specifically carried out by heating the coating film. Heating the coating film allows the organic solvent in the coating film to be removed by evaporation. The heating conditions are not particularly limited as long as the organic solvent evaporates, for example, at 60 to 2 500 t, and heating for 1 to 5 hours. Further, the heating can be carried out in two stages. For example, after heating at 70 ° C for 30 minutes, heating at 120 ° C for 30 minutes, and the like. The heating atmosphere is not particularly limited, and it is preferably an atmosphere or an inert gas atmosphere, and particularly preferably an inert gas atmosphere. The inert gas is, for example, nitrogen, argon, helium or the like from the viewpoint of coloring property, preferably nitrogen. The above step (a) may be carried out by vacuum drying before or after the heating, to remove the organic solvent in the coating film. The true-36-201139523 air-drying system does not need to blow hot air or the like to the coating film formed on the support, and the solvent can be easily removed from the coating film, so that a polyimide film having excellent flatness can be obtained. The surface of the coating film of poly-proline is immobilized, and it is excellent in reproducibility to form a polyimide film having excellent flatness and a uniform film quality. In the vacuum drying, the pressure (decompression degree) in the apparatus in which the coating film is placed is 760 mmHg or less, preferably 100 mmHg or less, more preferably 50 mmHg or less, and particularly preferably 1 mmHg or less, and the pressure in the apparatus is preferably reduced. When the amount is more than 760 mmHg, the evaporation rate is remarkably slowed when the solvent is removed from the coating film after vacuum drying, and the productivity is sometimes poor. The vacuum drying system is carried out for 0 minutes at a pressure of 0 minutes, preferably from 0 to 60 minutes, more preferably from 〇 to 30 minutes, more preferably from 0 to 20 minutes. When it is less than 〇 minute, the drying is insufficient, and the surface of the coating film may not be fixed, and it is difficult to obtain a film having a uniform film quality. When the temperature exceeds 60 minutes, the film may be poorly produced. [Step (b)] Next, the coating film obtained in the step (a) is heated to obtain a polyimide film. In the step (b), the obtained coating film is subjected to dehydration cyclization (thermal hydrazine imidization) by, for example, heat treatment at 160 ° C to 350 ° C. The temperature at which the heat imidization is carried out is preferably 200 to 3 from the viewpoint of the peeling property of the substrate obtained by heating drying (the temperature at which the organic solvent is evaporated) in the above step (a) from the obtained substrate. 5 0 ° C, more preferably 23 0 to 270 ° C, more preferably 240 to 25 (TC. The temperature of the heat imidization is from the viewpoint of the peelability, particularly the glass transition of the polyimide film) The temperature is below. The total structure of the ruthenium amide structure and the quinone ring structure is 1 〇〇 Mo-37- 201139523 The ratio of the 'imine ring structure in the ear % is preferably 7 5 mol% or more. It is preferably 85 mol% or more, and particularly preferably 9 mol% or more. When the ratio of the quinone ring structure is less than 75 mol%, the water absorption of the polyimide film may become high. The polyimine film is composed of polyimine or the like, and the polyimide is measured by differential scanning calorimetry (DSC, temperature increase rate of 20. (: /min). The temperature ' is preferably 305 ° C or higher, more preferably 4 5 01 : or more. When the glass transition temperature of the polyimine is in the above range, the obtained The substrate exhibits excellent heat resistance. The concentration of the quinone imine of the polyimine obtained from polylysine is preferably 2.5 to 7.5 mmol/g when the ruthenium imidation ratio is assumed to be 100 mol%. Preferably, it is 3.0 to 6.0 mmol/g, more preferably 3.5 to 5.5 mmol/g. In the present invention, the thickness of the polyimine film (film) is preferably from 1 to 250 μm, more preferably from 2 to 150 μm. The glass transition temperature (Tg) of the polyimine film is preferably 350° C. or higher, more preferably 45° C. or higher, and has excellent glass transition temperature. [Step (c)] Next, an element is formed on the polyimide film obtained in the above step (b) to form a substrate. The formed element is, for example, an organic electroluminescence (EL) element or a thin film transistor ( A module such as a light-emitting element such as a TFT or a metal wiring or a semiconductor integrated circuit, etc. The organic-38-201139523 EL element, TFT element, etc. are formed on the polyimide film obtained in the above step (b). When a light-emitting element or the like is used, it can be used as a flexible display substrate or the like. When a module such as a wire or a semiconductor integrated circuit is used, it can be used as a substrate for flexible wiring, etc. A method of forming a TFT element is, for example, a sputtering method on the polyimide film obtained in the above step (b). After a film such as a metal or a metal oxide is formed, a gate electrode is provided by etching, etc., and a temperature at which a film such as a metal or a metal oxide is formed by a sputtering method or the like can be used for forming a polyimide film which can be used in combination. The composition, the support or the formed member is appropriately selected, preferably 210 ° C to 400 ° C, more preferably 220 to 3 70 ° C, still more preferably 23 0 to 3 5 0 ° C. Next, a gate insulating film such as a tantalum nitride film is formed on the polyimide film of the gate electrode by a plasma CVD method, for example. Further, an active layer made of an organic semiconductor or the like is formed on the gate insulating film by a plasma CVD method or the like. The temperature at which the film of the gate insulating film or the organic semiconductor is formed by a plasma CVD method or the like can be appropriately selected in combination with the composition for forming a polyimide film for forming a film, a support or a formed element, and is preferably 210. °C~400°C, more preferably 220~3 7 0°C, more preferably 230~3 5 0 °C. Then, a film of a metal or a metal oxide or the like is formed on the active layer by sputtering or the like, and then etching or the like is performed to provide a source electrode and a drain electrode. Finally, a tantalum nitride film or the like can be formed by a plasma CVD method or the like as a protective film to produce a thin film transistor element. The thin film transistor element of the bottom gate is described above, but the TFT element is not limited to this structure, and may be a top gate. The gate electrode, the source electrode, and the drain electrode are not particularly limited as long as they are formed of a conductive material. The conductive material is, for example, a metal or a metal oxide -39-201139523 or the like. Examples of metals are platinum, gold, silver, nickel, chromium, copper, iron, tin, antimony,

鉬、銦、鋁、鋅、鎂及此等之合金,金屬氧化物例有ITO 、IZO、ZnO及Ιη203。此外,除此之外,考慮與聚醯亞胺 系膜之黏著性,可使用導電性聚合物作爲前述導電性材料 〇 此等中,若使用金屬氧化物,由於可形成透明電極, 故較佳。 又,形成有機EL元件的方法,例如有於前述聚醯亞胺 系膜上,自膜面側依序形成絕緣層、第1電極、有機半導 體層、第2電極及保護層的方法。 再者,形成金屬配線之方法,例如藉由層合法、金屬 化法等,於聚醯亞胺系膜上形成銅層,藉由以習知方法處 理該銅層,可設置金屬配線。層合法時,例如將銅箔等金 屬箔熱壓著於前述薄膜上,可設置銅層。金屬化法時,例 如以蒸鍍法或濺鍍法,形成由與前述聚醯亞胺系膜結合之 Ni系金屬所構成之薄片層。此外,以濕式電鍍法可設置所 定膜厚之銅層。又,使用金屬化法時,亦可預先進行前述 聚醯亞胺系膜之表面改質,以展現與金屬之親和性。 前述聚醯亞胺系膜(薄膜)由於耐熱性優異,與支持 體之密著性優異,因此,於膜(薄膜)上形成元件時之可 施加溫度範圍廣,可得到性能優異的基板。 [步驟(d)] -40- 201139523 接著’自前述支持體上剝離前述步驟(c)所得之基 板。由前述聚醯亞胺系膜所得之基板,由於剝離性優異, 故可容易地自支持體中,將基板全面剝離。 剝離的方法,例如有預先將保護膠帶黏貼於基板之端 部’實施上述步驟(a)至(c)後,將保護膠帶撕下作爲 起點’剝離基板的方法,或於支持體之端部切割作爲起點 ,進行剝離的方法,或浸漬於水或醇等溶劑中予以剝離的 方法等。剝離時之溫度通常爲O-lOOt,較佳爲10〜70 °C, 更佳爲20〜50°C。 【實施方式】 [實施例] 以下以實施例具體說明本發明。 (1 )玻璃轉化溫度(Tg) 使用下述實施例1〜1 6、或比較例1及2所得之薄膜,再 使用Rigaku公司製823 0型DSC測定裝置,以昇溫速度 20°C/min測定聚醯亞胺之玻璃轉化溫度。 (2 )聚矽氧化合物濃度 下述實施例1〜16或比較例1及2所得之聚醯胺酸的聚矽 氧化合物濃度係藉由下述式求得。 聚矽氧化合物濃度[單位:%]=(聚矽氧化合物之重量 )/{( (A)全醯基化合物之重量)+ ( (B)全亞胺基形 成化合物之重量)}χ1〇〇 -41 - 201139523 聚矽氧化合物之重量=化合物(Α·1 )之重量+化合物 (B-1 )之重量 (3 )醯亞胺基濃度 假定醯亞胺化率爲1 0 0莫耳%時,下述實施例1〜1 6或比 較例1及2所得之聚醯亞胺中之重複單位的分子量係以(醯 基化合物之分子量)+ (二胺之分子量)-2χ(水之分子量 )得到。此重複單位1個,含有2個醯亞胺基,因此下述實 施例1〜16或比較例1及2所得之聚合物之醯亞胺基濃度(假 定醯亞胺化率爲100莫耳%時的理論値)係藉由下述式求得 〇 [醯亞胺基濃度](單位:mmol/g ) =2/{(醯基化合物 之分子量)+ (二胺之分子量)-2x(水之分子量)卜1000 (4 )密著性 下述實施例1〜16或比較例1及2之醯亞胺化步驟( 2 5 0°C乾燥)終了後,將冷卻至室溫的附聚醯亞胺系膜之 支持體,以30分鐘昇溫至3 00°C後,以30分鐘冷卻至室溫 的步驟當做1循環,此循環重複1 〇次後,無由支持體之剝 離者評價爲[◎]、重複此循環5次後,無由支持體之剝離者 評價爲[〇],發現剝離者評價爲[叫。 (5 )剝離性 下述實施例1〜1 6或比較例1及2之醯亞胺化步驟( -42- 201139523 2 50°C乾燥)終了後’聚醯亞胺系膜可由支持體全面剝離 者’評價爲[◎],可全面剝離且一部份殘留剝離痕者,評 價爲[〇],有一部份無法剝離者,評價爲[△],無法全面 剝離者,評價爲[X ]。 (6 )薄膜翹曲 將下述實施例1 ~ 1 6或比較例1及2所得之由支持體剝離 的聚醯亞胺系膜切成40 x40mm,翹曲(將所得之聚醯亞胺 系膜放置於水平的基板上,測定該膜之四角的膜與基板之 分開距離,此等之平均値)未達1 .0mm時,評價爲[◎], 翹曲爲1.0mm以上,未達2.0mm時,評價爲[〇],翅曲爲 2.0mm以上,未達3.0mm時,評價爲[△],翹曲爲3.0mm以 上時,評價爲[X ]。 (7)重量平均分子量 下述實施例1〜16或比較例1及2所得之聚醯胺酸之重量 平均分子量係使用TOSOH製HLC-8020型GPC裝置測定。溶 劑係使用添加溴化鋰及燐酸之N-甲基-2-吡咯烷酮(NMP ) ,以測定溫度4(TC下得到聚苯乙烯換算的分子量。 [實施例1] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:2,2’-二甲基-4,4’-二胺基聯苯(以下也稱爲「m-TB」)6.07g ( -43- 201139523 28.6mmol)與(B_l)成分:兩末端胺基變性甲基苯基聚 矽氧(信越化學製,乂22-16608-3,數平均分子量4,400) 2.57g ( 0.6mmol )。其次,將燒瓶內進行氮取代後,添加 N,N-二甲基乙醯胺(以下也稱爲「DMAc」)58ml及四氫 呋喃(以下也稱爲「THF」)20ml,攪拌至均勻爲止。所 得之溶液中,在室溫下添加(A·2 )成分:苯均四酸二軒 (以下也稱爲「PMDA」)6.36g(29.2mmol),該溫度下 ,繼續攪拌24小時,得到組成物(聚醯胺酸溶液)。使用 所得之組成物之一部份,由該組成物中單離聚醯胺酸。評 價單離後的聚醯胺酸之重量平均分子量、聚矽氧化合物濃 度、醯亞胺基濃度(假定醯亞胺化率爲100莫耳%時之理論 値)。 其次,將所得之聚醯胺酸溶液以旋轉塗佈器(以 3 00rpm旋轉5秒後,以ll〇〇rpm旋轉1〇秒)塗佈於無鹼玻璃 支持體上,以7〇°C乾燥30分鐘,接著以120°C乾燥30分鐘, 得到塗膜。將醯亞胺化步驟所得之塗膜再以25 0°C乾燥2小 時後,由無鹼玻璃支持體上剝離,得到膜厚30μπι ( 0_03mm)之聚醯亞胺系膜(薄膜)。 此外,對於上述聚醯亞胺系膜,評價對支持體之密著 性、剝離性、聚醯亞胺系膜之翹曲。 結果如表1所示。 [實施例2] 於裝設有溫度計、攬拌機、氮導入管、冷卻管之 -44 - 201139523 300mL之四口燒瓶中,添加(B-2)成分:2,2’-二甲基· 4,4 5 - 一 Η女基聯本 6.07g ( 28.6mmol)與(B-1)成分:兩末 端胺基變性甲基苯基聚矽氧(信越化學製,X22-1660B-3 ,數平均分子量4,400) 2.57g(〇.6mmol)。其次,將燒瓶 內進行氮取代後,添加N,N -二甲基乙醯胺58ml攪拌至均勻 爲止。所得之溶液中,在室溫下添加(A-2 )成分:苯均 四酸二酐6.36g ( 29.2mmol ),該溫度下,繼續攪拌2 4小 時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇3 mm的膜(薄膜)外,與實施例1同樣操作 ’得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [實施例3] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:2,2,-二甲基-4,4’-二胺基聯苯6.68g(31.4mmol)與(B-1)成分:兩末 端胺基變性甲基苯基聚矽氧(信越化學製,X22-1660B-3 ,數平均分子量4,400 ) 1.40g ( 0.3mmol )。其次,將燒瓶 內進行氮取代後’添加N,N-二甲基乙醯胺58ml與四氫呋喃 20ml ’攪拌至均勻爲止。所得之溶液中,在室溫下添加( A-2)成分:苯均四酸二酐6.93g(31.8mmol),該溫度下 ’繼續攪拌24小時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, -45- 201139523 以得到膜厚〇_〇3mm的膜(薄膜)外,與實施f ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醢 亞胺系膜之物性如表1所示。 [實施例4] 於裝設有溫度計、攪拌機、氮導入管 300mL之四口燒瓶中,添加(B-2)成分:對苯 也稱爲「PDA」)1.42g ( 13_lmmol)及 2,2’-基苯氧基)苯基]丙烷(以下也稱爲「BAPP 13.1mmol)與(B-1)成分:兩末端胺基變性 砂氧(信越化學製,X22-1660B-3,數平均分. 2.36g(0.5mmol)。其次,將燒瓶內進行氮取 N,N-二甲基乙醯胺58ml與四氫呋喃20ml,攪拌 。所得之溶液中,在室溫下添加(A-2 )成分 二酐5.84g(26.8mmol),該溫度下,繼續攪 得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施{ ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯 亞胺系膜之物性如表1所示。 [實施例5] 於裝設有溫度計、攪拌機、氮導入管 300mL之四口燒瓶中,添加(B-2)成分: J 1同樣操作 胺酸、聚醯 、冷卻管之 二胺(以下 雙[4- ( 4-胺 」)5.39g ( 甲基苯基聚 子量4,400 ) 代後,添加 至均勻爲止 :苯均四酸 拌2 4小時, 時間塗佈, 河1同樣操作 胺酸、聚醯 、冷卻管之 -46- 201139523 4,4’-二胺基二苯基醚(以下也稱爲「ODA」)6.46g (32.3mmol )與(Β·1)成分:兩末端胺基變性甲基苯基 聚矽氧(信越化學製,Χ2 2-1660Β-3,數平均分子量4,4〇〇 )1.43g ( 0.3mmol )。其次,將燒瓶內進行氮取代後,添 加N,N-二甲基乙醯胺58ml與四氫呋喃20ml,攪拌至均勻爲 止。所得之溶液中,在室溫下添加(A-2 )成分:苯均四 酸二酐7.1 lg ( 32.6mmol ),該溫度下,繼續攪拌24小時 ,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [實施例6] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:2,2’-二甲基-4,4’-二胺基聯苯6.04g(28.4mmol)與(B-1)成分:兩末 端胺基變性甲基苯基聚矽氧(信越化學製,X22-9409,數 平均分子量1,300) 2.36g( 1.8mmol )。其次,將燒瓶內進 行氮取代後,添加N,N-二甲基乙醯胺5 8ml,攪拌至均勻爲 止。所得之溶液中,在室溫下添加(A-2 )成分:苯均四 酸二酐6.60g ( 30.3mmol ),該溫度下,繼續攪拌2 4小時 ,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, -47- 201139523 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施例1 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺 亞胺系膜之物性如表1所示。 [實施例7] 於裝設有溫度計、攪拌機、氮導入管、; 300mL之四口燒瓶中,添加(B-2 )成分:2,2’ 4,4’-二胺基聯苯 6.41g(30.2mmol)與(B-1)成 端胺基變性甲基苯基聚矽氧(信越化學製,X22-平均分子量3,000) 1.85g( 0.6mmol )。其次,將 行氮取代後,添加Ν,Ν-二甲基乙醯胺58ml,攪拌 止》所得之溶液中,在室溫下添加(A-2 )成分 酸二酐6.73g ( 30.9mmol ),該溫度下,繼續攪 ,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時 以得到膜厚〇. 〇3mm的膜(薄膜)外,與實施例1 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺 亞胺系膜之物性如表1所示。 [實施例8] 於裝設有溫度計、攪拌機、氮導入管、; 3 00mL之四口燒瓶中,添加(B-2 )成分:2,2’ 4,4’-二胺基聯苯 6.29g(29.6mmol)與(B-1)成 端胺基變性甲基苯基聚矽氧(信越化學製,X2 2- 同樣操作 酸、聚醯 令卻管之 -二甲基-分:兩末 161B > 數 燒瓶內進 至均句爲 :苯均四 伴2 4小時 間塗佈, 同樣操作 酸、聚醯 令卻管之 -二甲基-分:兩末 161A ,數 -48- 201139523 平均分子量1,600) 1.98g(1.2mmol)。其次,將燒瓶內進 行氮取代後,添加N,N-二甲基乙醯胺58ml,攪拌至均勻爲 止。所得之溶液中,在室溫下添加(A-2)成分:苯均四 酸二酐6.73g ( 30.9mm〇l ),該溫度下,繼續攪拌2 4小時 ,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇. 〇3mm的膜(薄膜)外,與實施例1同樣操作 ’得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [實施例9] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:2,2,-二甲基_ 4,4’-二胺基聯苯6.65g(31.3mmol)。其次,將燒瓶內進 行氮取代後,添加Ν,Ν-二甲基乙醯胺58ml,攪拌至均句爲 止。所得之溶液中,在室溫下添加(A-2 )成分:苯均四 酸二酐6.15g(28.2mmol)與(A-1)成分:兩末端酸酐變 性甲基聚矽氧(GELEST製,DMS-Z21,數平均分子量7〇〇 )2.1 9g ( 3 .1 mmol ),該溫度下,繼續攪拌2 4小時,得到 組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚M 亞胺系膜之物性如表1所示。 -49- 201139523 [實施例ι〇] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分: 2,2’-二甲基-4,4’-二胺基聯苯 6.59g(31.0mmol)與( B-1)成分:兩末端胺基變性甲基苯基聚矽氧(信越化學 製,X22- 1 660B-3,數平均分子量 4,400 ) 1 · 3 8 g ( 0.3 mm ο 1 )。其次,將燒瓶內進行氮取代後,添加Ν,Ν·二甲基乙醯 胺58ml,攪拌至均勻爲止。所得之溶液中,在室溫下添加 (A-2)成分:1,2,4,5-環己烷四羧酸二酐(以下也稱爲「 PMDAH」)7.03g(31.4mmol),該溫度下,繼續攪拌24 小時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [實施例1 1] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 3 00mL之四口燒瓶中,添加(B-2 )成分:4,4,-二胺基二 環己基甲院(以下也稱爲「MBCHA」)6.64g(31.6mmol )與(B-1 )成分:兩末端胺基變性甲基苯基聚矽氧(信 越化學製,X22-1 660B-3,數平均分子量4,400 ) 1.40g ( 〇-3mmol )。其次,將燒瓶內進行氮取代後,添加N,N -二 -50- 201139523 甲基乙醯胺58ml,攪拌至均勻爲止。所得之溶液中,在室 溫下添加(A-2)成分:苯均四酸二酐6.96g( 3 1.9mmol ) ,該溫度下,繼續攪拌24小時,得到組成物(聚醯胺酸溶 液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇 3 mm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [實施例12] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:1,4 -二胺基環己 烷(以下也稱爲「CHDA」)2.87g(25.1mmol)與(B-1 )成分:兩末端胺基變性甲基苯基聚矽氧(信越化學製, X22- 1 660B-3,數平均分子量 4,400 ) 3.42g ( 〇.8mmol)。 其次,將燒瓶內進行氮取代後,添加N,N-二甲基乙醯胺 58ml’攪拌至均勻爲止。所得之溶液中,在室溫下添加( A-2)成分:二苯基-3,3\4,4’-四羧酸二酐(以下也稱爲「 s-BPDA」)8.71g(25.9mmol) ’該溫度下,繼續攪拌24 小時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇 · 0 3 m m的膜(薄膜)外,與實施例1同樣操作 ’得到聚醯亞胺系膜。所得之聚醯亞胺、聚酿胺酸、聚酿 亞胺系膜之物性如表1所示。 -51 - 201139523 [實施例13] 於裝設有溫度計、攪拌機、氮導入管、 300mL之四口燒瓶中,添加(B-2)成分:1,4-二 院2.99g(26.2mmol)與(B-1)成分:兩末端胺 基苯基聚矽氧(信越化學製,X22-9409,數平 1,3 00 ) 2.5 6g ( 2.0mmol)。其次,將燒瓶內進行 ,添加N,N-二甲基乙醯胺58ml,攪拌至均勻爲止 溶液中,在室溫下添加(A-2 )成分:二苯基-3,: 羧酸二酐9.46g(28.1mmol),該溫度下,繼續 時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施例1 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺 亞胺系膜之物性如表1所示。 [實施例14] 於裝設有溫度計、攪拌機、氮導入管、 3 00mL之四口燒瓶中,添加(B-2 )成分:4,4’ 2,2’-雙(三氟甲基)聯苯(以下也稱爲「TFMB (24.5mmol)與( B-1)成分:兩末端胺基變性 聚矽氧(信越化學製’ X22-9409,數平均分子: 2.03g( 1.6mmol)。其次’將燒瓶內進行氮取代 N,N-二甲基乙醯胺58ml,搅拌至均勻爲止。所得 冷卻管之 胺基環己 基變性甲 均分子量 氮取代後 。所得之 3’,4,4’-四 攪拌2 4小 間塗佈, 同樣操作 酸、聚醯 冷卻管之 -二胺基-」)7.85g 甲基苯基 1 1,3 00 ) 後,添加 之溶液中 -52- 201139523 ,在室溫下添加(Ad )成分:1,2,3,4-環丁烷四羧酸二酐 (以下也稱爲「CBDA」)5.12g(26.1mmol),該溫度下 ,繼續攪拌24小時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇3rnm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [實施例15] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:2,2’-二甲基-4,4’-二胺基聯苯6.34g(29.9mmol)與(B-1)成分:兩末 端胺基變性甲基苯基聚矽氧(信越化學製,X22- 1 660B-3 ,數平均分子量4,400 ) 2.68g ( 0.6mmol )。其次,將燒瓶 內進行氮取代後,添加N,N-二甲基乙醯胺58ml,攪拌至均 勻爲止。所得之溶液中,在室溫下添加(A-2 )成分: 1,2,3,4 -環丁院四錢酸二酐5.98g ( 30.5mmol),該溫度下 ,繼續攪拌24小時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚酶 亞胺系膜之物性如表1所示。 [實施例1 6 ] -53- 201139523 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:2,2’-二甲基-4,4’-二胺基聯苯4.78g(22.3mmol)與(B-1)成分:兩末 端胺基變性甲基苯基聚矽氧(信越化學製,X22- 1 660B-3 ,數平均分子量4,400) 5.16g( 1.2mmol)。其次,將燒瓶 內進行氮取代後,添加N,N-二甲基乙醯胺58ml,攪拌至均 勻爲止。所得之溶液中,在室溫下添加(A-2 )成分:苯 均四酸二酐5·1 lg ( 23.4mmol ),該溫度下,繼續攪拌24 小時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚0.03 mm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [實施例17] 將上述實施例1中調製的聚醯胺酸溶液(組成物), 以旋轉塗佈機流延塗佈於無鹼玻璃支持體上,使所得之塗 膜厚度成爲25μπι,以70°C乾燥30分鐘,接著以12(TC乾燥 3 0分鐘得到塗膜。其後,將環化(醯亞胺化)步驟所得之 塗膜再以2 5 0 °C乾燥2小時。 接著,使用濺鍍裝置在所得之塗膜表面,在氬氣氛下 ’以23 0°C、5分鐘之成膜條件下形成透明導電膜(元件) 。靶材料使用ITO。所得之基板之比電阻値爲2χ10·4 ( Ω . cm)。將設置有透明導電膜之聚醯亞胺系膜由無鹼玻璃支 -54- 201139523 持體上剝離,得到可撓性基板。基板可由支持體上全面剝 離,位觀察到翹曲。 [比較例1] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(B-2)成分:2,2’-二甲基 4,4,-二胺基聯苯7.40g(34.9mm〇l)。其次’將燒瓶內進 行氮取代後,添加Ν,Ν-二甲基乙醯胺58ml ’攪拌至均勻爲 止。所得之溶液中,在室溫下添加(A·2 )成分:苯均四 酸二酐7.60g ( 34.9mmoI ),該溫度下’繼續攪拌2 4小時 ,得到組成物(聚醯胺酸溶液)° 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈’ 以得到膜厚〇.〇3mm的膜(薄膜)外’與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示。 [比較例2 ] 於裝設有溫度計、攪拌機、氮導入管、冷卻管之 300mL之四口燒瓶中,添加(b-2)成分:2,2,-雙[4-(4-胺基苯氧基)苯基]丙烷9.25g(22.5mmol)。其次,將燒 瓶內進行氮取代後,添加Ν,Ν-二甲基乙醯胺58ml,攪拌至 均勻爲止。所得之溶液中,在室溫下添加(A_2 )成分: 苯均四酸二酐2.95g ( 13.5mmol)及4,4,-氧二苯二甲酸二 酐(以下也稱爲「ODPA」)2.80g(0.9mmol),該溫度 -55- 201139523 下,繼續攪拌24小時,得到組成物(聚醯胺酸溶液)。 除了將所得之聚醯胺酸溶液以任意轉數及時間塗佈, 以得到膜厚〇.〇3mm的膜(薄膜)外,與實施例1同樣操作 ,得到聚醯亞胺系膜。所得之聚醯亞胺、聚醯胺酸、聚醯 亞胺系膜之物性如表1所示° -56- 201139523 s租 敏騸 ◎ ◎ 〇 〇 ◎ ◎ 〇 〇 〇 〇 〇 ◎ ◎ ◎ ◎ < X 1 剝離性 ◎ ◎ 〇 ◎ ◎ ◎ ◎ ◎ ◎ 〇 O ◎ ◎ ◎ ◎ < 〇 X 密著性 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Ο o ◎ ◎ ◎ ◎ 〇 ◎ ◎ 薄膜外觀 m •m i透明均勻1 迎 m 迎 m m 项 S m m m m JjT m ϋΓ ST m ϋΓ ST 盔 m 迎 m JIT 驭 s OUT m ϋΓ ίΓ 盔 m m ^ Μ :4.18 | 1 4.18 J (SB I » CO t— r-» Γ 4.35 1 ? | 4.45 | l«2 J 1 4.52 J | 4.60 | I 3.99 I L«? j δ I 4-38 I ο u> I 3.18 I 聚矽氧化 合物濃度 [%] 卜_ 5 C9 〇> ! 15.8 | CO 〇» 1 15.7 I rp csi CNJ ci CO 〇> 5 | 22.8 | 1 13.6 j a> 丨 34.3 1 o ο 聚醯亞胺之 Tg (°C) ! >350 | 1 >350 1 ! >350 | [>350 Ί I >350 | I >350 I I >350 | Γ >350 1 Γ >35(ΓΊ 1 >350 1 I >350 | | >350 | | >350 | I >350 | | >350 | Γ >350 1 I >350 | s CM 聚醯胺酸之 Mw Γ 95,000 | ο ο σ» Γ 84,000 | o 〇_ O o 〇 o CO I 83,000 | O o OO CO | 94,000 I 1 72,000 Π I 65,000 | O o s | 82,000 · | | 76,000 | I 69.000 I ο 1 〇> 1 101,000 I 〇 § ci c〇 1 iDMAc/THFl 1 DMAc 1 |DMAc/THF| iDMAcAHFl |DMAc/THF| I DMAc | I DMAc I I DMAc | | DMAc 1 1 DMAc 1 | DMAc | I DMAc | 丨 DMAc I | DMAc | | DMAc I 1 DMAc 1 | DMAc | | DMAc | (B-1) 1X22-1660B-3 1 1 Χ22-1660Β-3 | 1 X22-1660B-3 | 1 Χ22-1Θ60Β-3 | I X22-1660B-3 | I X22-9409 | | X22-161B | | X22-161A | 1 X22-1660B-3 | I X22-1660B-3 | IX22-1660B-3 | | X22-9 概 1 | X22-9409 | I X22-1660B-3 | 1 Χ22-1660Β-3 I 1 (B-2) 1_ | BAPP | | ODA | IMBCHAl I BAPP ] | m-TB 1 I m-TB | I m-TB I I PDA I I m-TB | | m-TB | I m-TB I | m-TB | I m-TB I | CHDA 1 「CHDA j I TFMB | i m-TB | 1 m-TB | I m-TB | (A-1) 1 DMS-Z21 | 1 (A-2) 1 1_ I ODPA | | PMDA | I PMDA | | PMDA | | PMDA I | PMDA | | PMDA I I PMDA ] I PMDA I | PMDA | IPMDAHj I PMDA I |s-BPDA| |s-BPDA| I CBDA I 1 CBDA 1 1 PMDA | I PMDA | I PMDA | m m Μ 1實施例2 ] m m 寸 m 握 K vr> 匡 m 佩 o m m K 握 K 00 1 撢 Os 握 倾 0 1 m 握 挪 i 握 飄 c〇 | 握 i m 獅 VO i m 御 v〇 i m I比較例1 1 m ±3 -57- 201139523 (1) 重量平均分子量(Mw)、數平均分子量(Μη) 及分子量分布(Mw/Mn) 下述實施例18〜27及比較例3所得之聚醯胺酸之重量平 均分子量(Mw)、數平均分子量(Μη)及分子量分布( Mw/Mn)係使用TOSOH製HLC-8220型GPC裝置(保護管柱 :TSK guard colomn ALPHA 管柱:TSKgelALPHA — Μ、 展開溶劑:ΝΜΡ )測定。 (2) -15 °C時之儲存安定性 將下述實施例18〜27及比較例3所得之清漆(聚醯亞胺 系膜形成用組成物)在-15°C下保存48小時後,藉由目視, 透明且無沈澱物者評價爲〇,不透明且有沈澱物析出者評 價爲X。 (3 )清漆黏度 使用下述實施例18〜2 7及比較例3所得之清漆1.5g,測 定25t時之清漆黏度。具體而言,使用東機產業製黏度 計 MODEL RE 100測定。 (4)真空乾燥後之塗膜固定化 在下述實施例1 8〜27及比較例3所得之真空乾燥後之附 玻璃支持體之塗膜的中央部及玻璃支持體的中央部劃標線 ,將附塗膜之支持體直立放置1 〇分鐘。在塗膜上所劃標線 與玻璃支持體上所劃標線之高度無變化時,判斷爲固定化 -58- 201139523 ’有變化時判斷爲流動化。 (5 )真空乾燥後之聚合物(聚醯胺酸)濃度 將下述實施例18〜27及比較例3所得之真空乾燥後之塗 膜中之聚合物(聚醯胺酸)的濃度依據下述式計算得到。 塗佈後清漆重量=清漆塗佈後之玻璃支持體重量-清漆 塗佈前之玻璃支持體重量 投入時聚合物濃度(% )=投入單體全量/(投入單體 量+投入溶劑全量)xl 00 塗佈後聚合物重量=塗佈後清漆重量X投入時聚合物濃 度(% ) 真空乾燥後塗膜重量=真空乾燥後之附塗膜之玻璃支 持體重量-清漆塗佈前之玻璃支持體重量 真空乾燥後之聚合物濃度(% )=(塗佈後聚合物重量 /真空乾燥後塗膜重量)χ1 00 (6 )真空乾燥後之溶劑組成比 將下述實施例18~27及比較例3所得之真空乾燥後之塗 膜中之溶劑組成比,依據上述式及下述式計算得到。 塗佈後溶劑重量=塗佈後清漆重量-塗佈後聚合物重量 塗佈後非醯胺系溶劑重量=塗佈後溶劑重量X非醯胺系 溶劑之投入量(混合溶劑中之非醯胺系溶劑之比例)(% ) 真空乾燥後溶劑重量=真空乾燥後塗膜重量-塗佈後聚 -59- 201139523 合物重量 以真空乾燥蒸發後溶劑重量=塗佈後溶劑重量_真空乾 燥後溶劑重量 真空乾燥後之非醯胺系溶劑重量=塗佈後非醯胺系溶 劑之重量-以真空乾燥蒸發後溶劑重量 非醯胺系溶劑之組成比(% )=(真空乾燥後之非醯胺 系溶劑重量/真空乾燥後溶劑重量X 1 00 ) 醯胺系溶劑之組成比(% )= 1 〇〇-非醯胺系溶劑之組成 比 (以真空乾燥蒸發後溶劑係定義爲混合溶劑中之沸點 最低的溶劑(非醯胺系溶劑)) (7) 1次乾燥後之黏著性(Tack) 將下述實施例18〜27及比較例3所得之1次乾燥後之塗 膜使用金屬製刮刀用力摩擦,塗膜不會移動者評價爲無黏 著性,塗膜移動者評價爲有黏著性。 (8 )光學特性 對於形成於下述實施例18〜27及比較例3所得之1次乾 燥後及2次乾燥後之玻璃支持體上的塗膜,分別依據JIS K7 105透明度試驗法測定Haze (霧度)。具體而言,使用 SUGA試驗機公司製SC-3H型Haze meter測定。 (9)玻璃轉化溫度(Tg) -60- 201139523 將下述實施例18〜27及比較例3所得之聚醯亞胺系膜由 玻璃支持體上剝離,剝離後之聚醯亞胺系膜使用Rigaku製 Thermo Plus DSC 823 0 (差示掃描熱量測定),在氮下, 昇溫速度爲20°C/min,40~450°C之範圍測定。 (1 〇 )線膨張係數 將下述實施例18〜27及比較例3所得之聚醯亞胺系膜由 玻璃支持體上剝離,剝離後之聚醯亞胺系膜使用Seiko Instrument SSC/5200,在昇溫速度爲 6°C/min,25 〜3 5 0°C 之 範圍內測定。由測定結果計算100〜200°C之線膨張係數。 (1 1 )塗膜之殘留應力 將下述實施例18~27及比較例3所得之清漆,使用FLX-2320 ( KLA公司製)於矽晶圓板(殘留應力測定用、秩父 電子股份公司製、厚度= 300μπι、直徑=4吋)上形成2次乾 燥後之30μπι的膜,以雷射測定翹曲,以下述式計算塗膜之 應力。 從可抑制所得之聚醯亞胺系膜之翹曲的觀點,塗膜之 殘留應力較佳爲l〇MPa以下,更佳爲5MPa以下。 【數1】 戊 Eh2 6(l-v)Rt σ:膜之殘留應力 t:膜之厚度 R :測定之曲率半徑 h :基板之厚度 E:基板之楊氏模數 v:基板之泊松(poisson) -61 - 201139523 (1 2 )醯亞胺化率 將下述實施例18~27及比較例3所得之2次乾燥後之聚 醯亞胺系膜中之聚醯亞胺的醯亞胺化率,使用FT-IR ( Thermo F i sher S ci ent i f i c製、Thermο NIC OLET6 7 00 )依據 以下方法進行定量。 來自聚醯胺酸之NH變角振動之波峰( 1520CHT1)面積 與芳香族非對稱三取'代物之=C-H面外變角振動之波峰( 990(:11^1)面積以Gaussian分布,進行波峰分離 '定量。測 定1次乾燥前之聚醯胺酸之波峰面積比(990CHT1之波峰面 積/ 1 5 20(:1^1之波峰面積)及2次乾燥後之此等之波峰面積 比,使用下述計算式算出醯亞胺化率。 醯亞胺化率(% )=( 1 -2次乾燥後之波峰面積比/1次 乾燥前之波峰面積比)x 1〇〇 (13)聚醯亞胺系膜之強度 使用JISK6 25 1之7號啞鈴,將下述實施例18〜27及比較 例3所得之2次乾燥後之玻璃支持體上剝離後之膜厚30μηι的 聚醯亞胺系膜,以23°C下、50mm/min的速度進行抗拉試驗 ,測定拉伸、抗拉強度、彈性模數。 (1 4 )與玻璃支持體之剝離性 下述實施例18~27及比較例3所得之2次乾燥後之附玻 璃支持體之3〇μπι塗膜以切割刀切削成寬l〇mmx長50mm, -62- 201139523 然後,拉剝離至長度20mm後’以180度的角度且以速度 5 0 m m / m i η測定剝離強度。 (15)聚醯亞胺系膜之翹曲 下述實施例1 8〜2 7及比較例3所得之2次乾燥後之附玻 璃支持體之30μηι塗膜以切割刀切削成寬60mmX60mm大小 後,測定4個端部之上浮,算出平均値。 [實施例18] 在附溫度計、氮導入管及攪拌葉之三口燒瓶中,以 25°C氮氣流下,添加m-三嗪(m-TB ) 45.23099g ( 0.2 1 3 06mol )、兩末端胺基變性側鏈苯基.甲基型聚矽氧 X-22- 1 660B-3 [9.4694g ( 0.002 1 5 2 1 mο 1 )]、使清漆中之聚 醯胺酸之濃度成爲14%的狀態,添加脫水N-甲基-2-吡咯烷 酮(NMP) 307g及脫水環己酮(CHN) 307g,攪拌10分鐘 直到m-TB及X-22- 1 660B-3完全溶解爲止。添加苯均四酸二 酐(PMDA) 22_6498g ( 0.10384mol)攪拌 30 分鐘後,再 添力口 PMDA22.6498g ( 0.1 03 84mol )攪拌 60 分鐘,使反應 結束,接著使用聚四氟乙烯製過濾器(孔徑ΐμη〇進行精 密過濾製作清漆(PMDA/(mTB + X-22- 1 660B-3 ) =0.96 5 當 量)。清漆特性如表2所示。 X-22-1 660B-3 :信越化學工業(股)製、兩末端胺基 變性側鏈苯基·甲基型聚矽氧(藉由〗H-NMR之甲基與苯基 之莫耳組成比爲75 : 25,數平均分子量4400、目錄:信越 -63- 201139523 化學工業股份公司、聚矽氧事業部總部參照聚矽氧新聞 122號平成22年7月) 將玻璃支持體(寬:300mmx長:3 50爪111><厚:〇.7mm )固定於對重力成垂直設置的控制塗佈機台,2次乾燥後 ,使膜厚成爲30μιη的狀態,將間距(gap )間隔設定爲 405μιη,將清漆12g於玻璃支持體中央部形成寬:200mmx 長:220mm的塗膜。 其後,使用真空乾燥機在25t、真空乾燥10分鐘後減 壓至O.lmmHg後,返回常壓( 760mmHg)結束真空乾燥。 真空乾燥後之塗膜的物性如表2所示。真空乾燥後之塗膜 爲透明,塗膜被固定化,無液滴垂流等。真空乾燥後之聚 醯胺酸之1520CHT1與990(:1^1之波峰面積分別爲5.09、6.89 〇 真空乾燥後,在熱風乾燥機中,以130°C進行1次乾燥 1 〇分鐘。對1次乾燥後之塗膜採樣進行物性評價的結果如 表2所示。其次,以300°C.進行2次乾燥1小時。評價結果如 表2所示。可得到聚醯亞胺系膜無翹曲,Tg也爲45(TC以上 ,且耐熱性優異、透明性、平滑性優異、線膨張係數低之 強韌的聚醯亞胺系膜。此外,所得之塗膜係乾燥速度快, 在1次乾燥、2次乾燥中,與玻瑪支持體之密著性優異,2 次乾燥後所得之聚醯亞胺系膜,由玻璃支持體之剝離性優 異。 [實施例19] • 64 - 201139523 實施例18中’除了 .ΤΒ、X-22-1660B-3及PMDA之使 用量改爲如表2所示外’與實施例丨8同樣操作。結果如表2 所示。 可得到耐熱性、透明性、平滑性優異、無翹曲、強韌 的聚醯亞胺系膜。此外,所得之塗膜係乾燥速度快,在i 次乾燥、2次乾燥中’與玻璃支持體之密著性優異,2次乾 燥後所得之聚酿亞胺系膜,由玻璃支持體之剝離性優異。 [實施例20] 實施例 18 中,除了 m-TB、X-22-1 660B-3 及 PMDA 之使 用量改爲如表2所示外,與實施例丨8同樣操作。結果如表2 所示。 可得到耐熱性、透明性、平滑性優異、無翹曲、強韌 的聚醯亞胺系膜。此外,所得之塗膜係乾燥速度快,在i 次乾燥、2次乾燥中,與玻璃支持體之密著性優異,2次乾 燥後所得之聚醯亞胺系膜,由玻璃支持體之剝離性優異。 [實施例21] 實施例18中,除了使用111-丁832.56478§及4,4'-二胺基 二苯醚(ODA ) 7.8760g 取代 m-TB45.23099g - X-22- 1660B-3及PMDA之使用量改爲如表2所示外,與實施例18 同樣操作。結果如表2所示。 可得到薄膜之延伸提高,且耐熱性、透明性、平滑性 優異、無翹曲的聚醯亞胺系膜。此外,所得之塗膜係乾燥 -65- 201139523 速度快’在1次乾燥、2次乾燥中,與玻璃支持 優異’ 2次乾燥後所得之聚醯亞胺系膜,由玻 剝離性優異。 [實施例22] 實施例18中,除了醯胺系溶劑使用Ν,Ν-二 (DMAc )取代ΝΜΡ外,與實施例18同樣操作> 所示。 可得到耐熱性、透明性、平滑性優異、無 張係數低之強韌的聚醯亞胺系膜。此外,所得 燥速度快,在1次乾燥、2次乾燥中,與玻璃支 性優異,2次乾燥後所得之聚醯亞胺系膜,由 之剝離性優異。 [實施例23] 實施例1 8中,除了非醯胺系溶劑使用乙 CHN307g,而NMP之使用量改爲如表2所示外 1 8同樣操作。結果如表2所示。 可得到耐熱性、透明性、平滑性優異、無 張係數低之強韌的聚醯亞胺系膜。此外’所得 燥速度快,在1次乾燥、2次乾燥中’與玻璃支 性優異,2次乾燥後所得之聚醯亞胺系膜,由 之剝離性優異。 體之密著性 璃支持體之 甲基乙醯胺 •結果如表2 翹曲、線膨 之塗膜係乾 持體之密著 玻璃支持體 腈430g取代 ,與實施例 翹曲、線膨 之塗膜係乾 持體之密f 玻璃支持體 -66- 201139523 [實施例2 4 ] 貫施例1 8中,除了倂用信越化學製兩末端兒胺基變性 側鏈甲基型聚矽氧KF8010 (數平均分子量(44〇〇、m = 58 ))2.8408g與 X22-1660B-3 ( 6.6286g)取代 χ_22-1660Β-3 (9.4694g)外’與實施例18同樣操作。結果如表2所示。 可得到耐熱性、透明性、平滑性優異、無翹曲、線膨 張係數低之強韌的聚醯亞胺系膜。此外,所得之塗膜係乾 燥速度快,在1次乾燥、2次乾燥中,與玻璃支持體之密著 性優異’ 2次乾燥後所得之聚醯亞胺系膜,由玻璃支持體 之剝離性優異。 [實施例2 5 ] 貫施例18中’除了 NMP與CHN之使用量如表2所示外 ’與實施例1 8同樣操作。結果如表2所示。 可得到耐熱性、平滑性優異、無翹曲、強韌的聚醯亞 胺系膜。此外,所得之塗膜係乾燥速度快,在1次乾燥、2 次乾燥中,與玻璃支持體之密著性優異,2次乾燥後所得 之聚醯亞胺系膜,由玻璃支持體之剝離性優異。 [實施例2 6 ] 實施例18中,除了使用乙二醇單甲醚取代chn外,與 實施例1 8同樣操作。結果如表2所示。 可得到耐熱性、透明性、平滑性優異、無翹曲、強韋刃 的聚醯亞胺系膜。此外,所得之塗膜係乾燥速度快,在】 -67- 201139523 次乾燥、2次乾燥中’與玻璃支持體之密著性優異,2次乾 燥後所得之聚醯亞胺系膜’由玻璃支持體之剝離性優異。 [實施例27] 實施例18中,除了使用NMP614取代NMP3 07g及 CHN3〇7g外’與實施例18同樣操作。結果如表2所示。 可得到耐熱性、平滑性優異、無翹曲的聚醯亞胺系膜 。此外’所得之塗膜在1次乾燥、2次乾燥中,與玻璃支持 體之密著性優異’ 2次乾燥後所得之聚醯亞胺系膜,由玻 璃支持體之剝離性優異。 [比較例3 ] 實施例27中’除了不使用χ·22_166〇Β-3,且m_TB及 PMD A之使用量改爲如表2所示外,與實施例2 7同樣操作。 結果如表2所示。 比較例3所得之清漆,乾燥速度慢。此外,2次乾燥後 ,殘留應力增加,由玻璃支持體剝離後之聚醯亞胺系膜發 生較大的翹曲。 -68- 201139523 r> CO rj r> CM s' I 4400 2200 ! I ! 49.7β66 l_ 614 1 丨 110000 1 37900 1 3 0 I 250000 | ί 胆 η g 〇 1—1—30 I e CN G Γ; - S: m CN 1 100 I -3.5 eo ο cc 至4501C爲止, 未®察到 m CM O 45.23099 I X-22- 1660B-3 4400 I 2200 1 ,9.4694 | I to σ> Cl in 1__ 814 _ I <β· 1 73500 1 I 24500 1 L 3.00 I 0 1 4300 I 苗 rj〇〇 〇 g o CD a rj - m m, CS α <〇 rg iO e (Ο CO 至45〇r爲止, 未観察到 CM Ο o 45.23099 I i 7 11 4400 \ 2200 I 5 9.4694 I I '45.2896 1 307 1 r» n 46000 1 1 14400 I O ri X 3300 J g 晅 a a C0 ο a **! Ο rs - W n P3 〇 〇 r· - s Ξ 至4501:爲止, 未觀察到 - d o 45.23099Π X-22- 1660B-3 4400 | 2200 1 9.4694 1 I 45.2990 1 o 5 对 62000 1 ο w 2.44 I X 12000 1 m s S I__130___I o m Γ» ο cn - m -n 〇 I 100 1 CJ - o α> 至450X:爲止, 未觀察到 - ϋ o 5 45.23099 i X-22- 1660B-3 4400 1 2200 1 6,6286 1 KF8012 1 4400 1 1 2200 1 g Γ2·β4〇8 1 1 45.2996 1 5 CO Γ 307 | 713001 I 23200 I 3.07 I 0 1 4000 1 与 ίϋ m OJ CM & Γ5 ο o m 3 ο r> - 苗 5 〇 〇 1 210 ' OB 至4501C爲止, 未観察到 CO d o 45.23099 1 X-2Z-1660B-3 4400 | 2200 | 9.4694 1 1 (O σ> 〇> CSJ JO _m_ § in ί 73000 1 I 24300 I f 3.00 Ί o I 6500 Ί 睡 o O 〇 § o 璀 η 1 300 1 - m η η e C|J <» β> eo 至450*C爲止, 未觀察到 Γ5 5 o 翠 脑 〇> g rs IA X-22- 1660B-3 4400 1 2200 1 9.4694 1 1 CD Oi in CM JO 307 1 g rj a 1 70000I I 21200 I o 1 5200 1 1 晅 s s - 1_130_! 。 m rj 1 300 - 粕 Γ> 异 ο W v- XT 〇> CO 至450t:爲止, 未觀察到 ί〇 5 o 3^56478 1 7.8760 I X-22- 1660Θ-3 4400 | .2200 1 17.3064 I 1 42.2528 1 % 96700 Ί I 35200 I 「2)5 I o I in 1 s eo L_132_I o 薜 § 1 5 ο CD s <〇 η 至450T;爲止, 未觀察到 σ» r> d o a 38.91890 Π X-22· 1660B-3 4400 \ 2200 1 20.6Θ33 I 1 40.3978 1 1 -307 Ί 1 307 1 1 102000 1 I 32900 I o ! 12000 i ί 晤 s βο LZ.130-H o 抵 C«J 1 - 粮 Ν 异 α CO CO 至450TC爲止, 未観察到 ο 5 o α> 42.67864 I X-22- 1660B-3 4400 I 2200 1 13.4707 I 1 43.8507 1 307 i o' i O I 33770 I to P3 o 1 16000 I K s rs i__m_I a 雔 eg 1 - m CSl ο o o ir> oi 至450X;爲止, 未觀察到 (Ο 5 o CO 45.23099 I X-22- 1660Β·3 4400 1 2200 | 9.4694 I 1 45.2996 Ί 307 1 g 72400 1 22300__ 3.25 1 o 4200 I ί 脰 Si CD I__m_] o 握 f〇 1 300 1 - 然 Γ> ο CjJ σ> e 至450*0爲止, 未観察到 Γ> ο* o 仨 η bi hi bl bl M M M M 求 I mPa*s I $ P P 圍 £ a o MPa GPe P 1 MPa N/cm | m-TB _ ____I ODA I 聚矽氧種① & i m 嵌 m 铤 e m 联 ε & <〇 联 Θ i m. Θ m 联 ® u ! £Γ β- 截 β I 65 m Θ 联 ε <π 联 Θ m 0 联 PMDA 1 i CN i 揉 DMAci 沸 «=1660 1 1 i <*·> ά % m NJ 汽1 Q寒 u 轾 涅 I Mw/Mn 1 由 琳 趄 P 2 1 结 妇 海 笔 1 a 珀 辰 味 挡 埋 Η § i m 味 β 雔 I 1 苗 裏 越 •M S | s Λ N 郵 n •M 兹 逛 徂 i 赶 1 1 1 1 I Μ 兹 教 CS a 班 © 掛 1 涵 P I g £ 1 1 1 fiei 想 截 m 玻璃轉化溫度 § S3 i SI 由玻班支持愤之塗膜 剁雔後之翹曲 單體 溶劑 聚蘸胺酸 清漆 真空乾燥後 1次乾垅 2^C乾燥 1 聚醯亞胺系膜1 之特性 -69-Molybdenum, indium, aluminum, zinc, magnesium, and the like, and examples of metal oxides include ITO, IZO, ZnO, and 203η203. Further, in addition to the above, a conductive polymer can be used as the conductive material in consideration of adhesion to a polyimide film, and if a metal oxide is used, a transparent electrode can be formed, which is preferable. . Further, a method of forming an organic EL device is, for example, a method of forming an insulating layer, a first electrode, an organic semiconductor layer, a second electrode, and a protective layer from the film surface side on the polyimide film. Further, a method of forming a metal wiring, for example, a copper layer is formed on a polyimide film by lamination or metallization, and a metal wiring can be provided by treating the copper layer by a conventional method. In the case of lamination, for example, a metal foil such as a copper foil is heat-pressed on the film, and a copper layer can be provided. In the metallization method, for example, a sheet layer composed of a Ni-based metal bonded to the polyfluorene-based film is formed by a vapor deposition method or a sputtering method. Further, a copper layer having a predetermined film thickness can be provided by wet plating. Further, when the metallization method is used, the surface of the polyimide film may be modified in advance to exhibit affinity with metal. The polyimide film (thin film) is excellent in heat resistance and excellent in adhesion to a support. Therefore, when a device is formed on a film (film), a temperature range can be widened, and a substrate excellent in performance can be obtained. [Step (d)] -40 - 201139523 Next, the substrate obtained in the above step (c) is peeled off from the above support. Since the substrate obtained from the above polyimide film is excellent in peelability, the substrate can be easily peeled off from the support. For the peeling method, for example, the protective tape is adhered to the end portion of the substrate in advance. After performing the above steps (a) to (c), the protective tape is peeled off as a starting point to peel the substrate, or the end of the support is cut. As a starting point, a method of peeling off, or a method of immersing in a solvent such as water or alcohol, and the like are carried out. The temperature at the time of peeling is usually from 0 to 100 t, preferably from 10 to 70 ° C, more preferably from 20 to 50 ° C. [Embodiment] [Examples] Hereinafter, the present invention will be specifically described by way of examples. (1) Glass transition temperature (Tg) Using the films obtained in the following Examples 1 to 16 or Comparative Examples 1 and 2, the film was measured at a temperature increase rate of 20 ° C/min using a Model 823 0 DSC measuring apparatus manufactured by Rigaku Co., Ltd. The glass transition temperature of polyimine. (2) Concentration of polyoxymethylene compound The concentration of the polyoxymethylene compound of the polyamic acid obtained in the following Examples 1 to 16 or Comparative Examples 1 and 2 was determined by the following formula. Polyxanthene concentration [unit: %] = (weight of polyoxyl compound) / {((A) weight of total mercapto compound) + ((B) weight of total imine forming compound)}χ1〇〇 -41 - 201139523 Weight of polyoxyxide = weight of compound (Α·1) + weight of compound (B-1) (3) concentration of quinone imine, assuming that the imidization ratio is 190% by mole The molecular weight of the repeating unit in the polyimine obtained in the following Examples 1 to 16 or Comparative Examples 1 and 2 is (molecular weight of the mercapto compound) + (molecular weight of the diamine) - 2 χ (molecular weight of water) get. This repeating unit has 2 quinone imine groups, so the yttrium imine group concentration of the polymers obtained in the following Examples 1 to 16 or Comparative Examples 1 and 2 (assuming the oxime imidization ratio is 100 mol%) The theoretical 値) is obtained by the following formula: 醯 [醯 imine concentration] (unit: mmol / g) = 2 / { (molecular weight of mercapto compound) + (molecular weight of diamine) - 2x (water Molecular weight) Bu 1000 (4) Adhesion Agglomeration of the following Examples 1 to 16 or Comparative Examples 1 and 2 after the imidization step (250 ° C drying) was completed, and the mixture was cooled to room temperature. The support of the imide film was heated to 300 ° C for 30 minutes, and then cooled to room temperature for 30 minutes as one cycle. After repeating this cycle for 1 time, no peeling from the support was evaluated as [ ◎], after repeating this cycle 5 times, the peeler without the support was evaluated as [〇], and the peeler was found to be [called. (5) Peelability The following examples 1 to 16 or the imidization steps of Comparative Examples 1 and 2 (-42-201139523 2 50 ° C drying) were completed, and the polyimide film was completely peeled off from the support. The person's evaluation was [◎], which could be completely peeled off and a part of the residual peeling marks was evaluated as [〇], and some of them could not be peeled off, and the evaluation was [△], and it could not be fully peeled off, and the evaluation was [X]. (6) Film warpage The polyimine film obtained by the following Examples 1 to 16 or Comparative Examples 1 and 2, which was peeled off from the support, was cut into 40 × 40 mm, and warped (the obtained polyimine film was obtained). The film was placed on a horizontal substrate, and the separation distance between the film at the four corners of the film and the substrate was measured. When the average 値) of the film was less than 1.0 mm, the evaluation was [◎], and the warpage was 1.0 mm or more, which was less than 2.0. When it was mm, it was evaluated as [〇], the fin shape was 2.0 mm or more, and when it was less than 3.0 mm, it was evaluated as [Δ], and when the warpage was 3.0 mm or more, it was evaluated as [X]. (7) Weight average molecular weight The weight average molecular weight of the polyamines obtained in the following Examples 1 to 16 or Comparative Examples 1 and 2 was measured using a GPC apparatus manufactured by TOSOH Model HLC-8020. In the solvent, N-methyl-2-pyrrolidone (NMP) containing lithium bromide and citric acid was used to measure the temperature at 4 (polystyrene-converted molecular weight at TC) [Example 1] A thermometer, a stirrer, and a nitrogen introduction were installed. In a 300-mL four-necked flask of a tube and a cooling tube, a component (B-2): 2,2'-dimethyl-4,4'-diaminobiphenyl (hereinafter also referred to as "m-TB") is added. 6.07g (-43-201139523 28.6mmol) and (B-1) component: two-terminal amine-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., 乂22-16608-3, number average molecular weight 4,400) 2.57g (0.6mmol Next, after nitrogen substitution in the flask, 58 ml of N,N-dimethylacetamide (hereinafter also referred to as "DMAc") and 20 ml of tetrahydrofuran (hereinafter also referred to as "THF") were added, and the mixture was stirred until uniform. In the obtained solution, 6.36 g (29.2 mmol) of a component (A·2 ): pyromellitic acid dioxide (hereinafter also referred to as "PMDA") was added at room temperature, and stirring was continued for 24 hours at this temperature. Composition (poly-proline solution). Using one of the obtained compositions, the composition was isolated from poly-proline. The weight average molecular weight of the proline, the concentration of the polyoxygen oxide, and the concentration of the quinone imine (the theoretical enthalpy when the oxime imidization rate is 100 mol%). Next, the obtained polyaminic acid solution is spin coated. The cloth (rotated at 300 rpm for 5 seconds, and then rotated at ll rpm for 1 sec.) was applied to an alkali-free glass support, dried at 7 ° C for 30 minutes, and then dried at 120 ° C for 30 minutes. The film obtained by the ruthenium imidization step was further dried at 25 ° C for 2 hours, and then peeled off from the alkali-free glass support to obtain a polyimide film (film) having a film thickness of 30 μm (0_03 mm). Further, the polyimide-based film was evaluated for adhesion to the support, peelability, and warpage of the polyimide film. The results are shown in Table 1. [Example 2] Thermometer, mixer, nitrogen inlet tube, cooling tube -44 - 201139523 300mL four-necked flask, add (B-2) component: 2,2'-dimethyl-4,4 5 - one Η Co-benction 6.07g (28.6mmol) and (B-1) component: two-terminal amine-denatured methylphenyl polyfluorene (Xin Yue Chemical, X22-1660B-3, number average Molecular weight 4,400) 2.57 g (〇.6 mmol). Next, after nitrogen substitution in the flask, 58 ml of N,N-dimethylacetamide was added and stirred until uniform. The obtained solution was added at room temperature (A). -2) Component: 6.36 g ( 29.2 mmol) of pyromellitic dianhydride, and stirring was continued for 24 hours at this temperature to obtain a composition (polyglycine solution). A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was applied at a random number of times and for a film having a film thickness of 〇3 mm. The physical properties of the obtained polyimine, polylysine, and polyimine film are shown in Table 1. [Example 3] A (B-2) component: 2,2,-dimethyl-4,4'-di was added to a 300 mL four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube. Aminobiphenyl 6.68 g (31.4 mmol) and (B-1) component: two-terminal amine-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., X22-1660B-3, number average molecular weight 4,400) 1.40 g (0.3 Mmmol). Next, after replacing the inside of the flask with nitrogen, 58 ml of N,N-dimethylacetamide and 20 ml of tetrahydrofuran were added and stirred until uniform. In the obtained solution, 6.13 g (31.8 mmol) of a component (A-2): pyromellitic dianhydride was added at room temperature, and stirring was continued for 24 hours at this temperature to obtain a composition (polyglycine solution). The polyimine film was obtained by applying f to the film (film) having a film thickness of 〇_〇3 mm, except that the obtained polyamic acid solution was applied at an arbitrary number of revolutions and time -45-201139523. The physical properties of the obtained polyimine and polyimine film are shown in Table 1. [Example 4] In a four-necked flask equipped with a thermometer, a stirrer, and a nitrogen introduction tube of 300 mL, a component (B-2): p-benzene (also referred to as "PDA") was added, and 1.42 g (13_1 mmol) and 2, 2' were added. -Phenylphenoxy)phenyl]propane (hereinafter also referred to as "BAPP 13.1mmol" and (B-1) component: two terminal amine-denatured sand oxygen (Xinhwa Chemical, X22-1660B-3, number average). 2.36 g (0.5 mmol). Next, 58 ml of N,N-dimethylacetamide and 20 ml of tetrahydrofuran were added to the flask, and the mixture was stirred. In the obtained solution, (A-2) component dianhydride was added at room temperature. 5.84 g (26.8 mmol), at this temperature, stirring was continued to obtain a composition (polyglycine solution). The obtained polyamic acid solution was obtained at an arbitrary number of revolutions to obtain a film having a film thickness of 〇3 mm (film). In addition, with the implementation of {, a polyimide film was obtained. The physical properties of the obtained polyimide and polyimine film were as shown in Table 1. [Example 5] A thermometer, a stirrer, and nitrogen were installed. Into a four-necked flask of 300 mL, a component (B-2) was added: J 1 was similarly operated with a diamine of an amine acid, a polyfluorene, and a cooling tube (hereinafter bis [4-(4-amine)) 5.39 g ( The amount of methylphenyl polycondensate is 4,400). After the generation, it is added until it is uniform: the mixture is mixed with pyromellitic acid for 24 hours, and the time is applied. The river 1 is also operated with the amine acid, polyfluorene, and cooling tube -46-201139523 4,4 '-Diaminodiphenyl ether (hereinafter also referred to as "ODA") 6.46 g (32.3 mmol) and (Β·1) component: both terminal amine-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., Χ2) 2-1660Β-3, number average molecular weight 4,4〇〇) 1.43g (0.3mmol). Next, after replacing the inside of the flask with nitrogen, add 58 ml of N,N-dimethylacetamide and 20 ml of tetrahydrofuran, and stir until In the obtained solution, (A-2) component: pyromellitic dianhydride 7.1 lg (32.6 mmol) was added at room temperature, and stirring was continued for 24 hours at this temperature to obtain a composition (polyproline). The solution was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was applied at any number of revolutions and time to obtain a film (film) having a film thickness of mm3 mm. The physical properties of the obtained polyimine, polylysine, and polyimide membranes are shown in Table 1. [Example 6] A thermometer was installed and stirred. In a 300 mL four-necked flask of a mixer, a nitrogen introduction tube, and a cooling tube, a component (B-2): 6.04 g (28.4 mmol) of 2,2'-dimethyl-4,4'-diaminobiphenyl was added. And (B-1) component: a two-terminal amine-denatured methylphenyl polyfluorene (X22-9409, number average molecular weight 1,300) 2.36 g (1.8 mmol). Next, after nitrogen substitution in the flask, 5 ml of N,N-dimethylacetamide was added, and the mixture was stirred until uniform. In the obtained solution, (A-2) component: 6.60 g (30.3 mmol) of pyromellitic dianhydride was added at room temperature, and stirring was continued for 24 hours at this temperature to obtain a composition (polyglycine solution). . A polyimide film was obtained in the same manner as in Example 1 except that the obtained polyamic acid solution was applied at a random number and time, -47-201139523 to obtain a film (film) having a film thickness of 〇3 mm. The physical properties of the obtained polyimine and polyimine film are shown in Table 1. [Example 7] A (B-2) component: 2.1 g of 2,2' 4,4'-diaminobiphenyl was added to a four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a 300 mL ( 30.2 mmol) and (B-1) terminal amino group-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., X22-average molecular weight 3,000) 1.85 g (0.6 mmol). Next, after replacing nitrogen with nitrogen, 58 ml of hydrazine, hydrazine-dimethylacetamide was added, and the solution obtained by stirring was added, and 6.73 g (30.9 mmol) of the acid dianhydride of (A-2) component was added at room temperature. At this temperature, stirring was continued to obtain a composition (polyglycine solution). A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was obtained in an arbitrary number of revolutions to obtain a film (film) having a film thickness of 〇3 mm. The physical properties of the obtained polyimine and polyimine film are shown in Table 1. [Example 8] A (B-2) component: 2,2' 4,4'-diaminobiphenyl 6.29 g was placed in a three-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a 300 mL. (29.6mmol) and (B-1) terminal amine-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., X2 2- is the same as the acid, and the poly- oxime is the tube - dimethyl-minute: two ends 161B > The number of flasks into the sentence is: benzene is tetrazed with 2 4 hours of coating, the same operation of acid, poly- sputum but tube - dimethyl-minute: two 161A, number -48- 201139523 average molecular weight 1,600) 1.98 g (1.2 mmol). Next, after nitrogen substitution in the flask, 58 ml of N,N-dimethylacetamide was added, and the mixture was stirred until uniform. In the obtained solution, (A-2) component: 6.73 g (30.9 mm 〇l) of pyromellitic dianhydride was added at room temperature, and stirring was continued for 24 hours at this temperature to obtain a composition (polyproline). Solution). The polyimine film was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was applied at an arbitrary number of revolutions and time to obtain a film (film) having a film thickness of 〇3 mm. The physical properties of the obtained polyimine, polylysine, and polyimine film are shown in Table 1. [Example 9] A (B-2) component: 2,2,-dimethyl-4,4'-di was added to a 300 mL four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube. Aminobiphenyl 6.65 g (31.3 mmol). Next, after nitrogen substitution in the flask, 58 ml of hydrazine, hydrazine-dimethylacetamide was added, and the mixture was stirred until the same sentence. In the obtained solution, (A-2) component: 6.15 g (28.2 mmol) of pyromellitic dianhydride and (A-1) component: two-terminal anhydride denatured methyl polyfluorene (made by GELEST) was added at room temperature. DMS-Z21, number average molecular weight 7 〇〇) 2.1 9 g (3.1 mmol), stirring was continued for 24 hours at this temperature to obtain a composition (polyglycine solution). A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was applied at a random number of times and time to obtain a film (film) having a film thickness of 〇3 mm. The physical properties of the obtained polyimine, polylysine, and poly M imine films are shown in Table 1. -49-201139523 [Example 〇] In a 300 mL four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube, a component (B-2) was added: 2,2'-dimethyl-4 , 4'-diaminobiphenyl 6.59g (31.0mmol) and (B-1) component: two-terminal amine-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., X22-1 660B-3, number average molecular weight 4,400 ) 1 · 3 8 g (0.3 mm ο 1 ). Next, after nitrogen substitution in the flask, 58 ml of hydrazine, hydrazine dimethylacetamide was added, and the mixture was stirred until uniform. In the obtained solution, a component (A-2): 7.03 g (31.4 mmol) of 1,2,4,5-cyclohexanetetracarboxylic dianhydride (hereinafter also referred to as "PMDAH") was added at room temperature. Stirring was continued for 24 hours at the temperature to obtain a composition (polyglycine solution). A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was applied at a random number of times and time to obtain a film (film) having a film thickness of 〇3 mm. The physical properties of the obtained polyimine, polylysine, and polyimine film are shown in Table 1. [Example 1 1] In a 300-neck four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube, a component (B-2) was added: 4,4,-diaminodicyclohexyl group. (hereinafter also referred to as "MBCHA") 6.64 g (31.6 mmol) and (B-1) component: two-terminal amine-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., X22-1 660B-3, number average molecular weight) 4,400 ) 1.40g (〇-3mmol). Next, after nitrogen substitution in the flask, 58 ml of N,N-di-50-201139523 methyl acetamide was added, and the mixture was stirred until uniform. In the obtained solution, (6-2 g (3 1.9 mmol) of pyromellitic dianhydride was added at room temperature, and stirring was continued for 24 hours at this temperature to obtain a composition (polyglycine solution). . A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyamic acid solution was applied at an arbitrary number of revolutions and time to obtain a film (film) having a film thickness of 〇3 mm. The physical properties of the obtained polyimine, polylysine, and polyimine film are shown in Table 1. [Example 12] A (B-2) component: 1,4-diaminocyclohexane (hereinafter also referred to as a four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube) "CHDA") 2.87g (25.1mmol) and (B-1) component: a two-terminal amine-denatured methylphenyl polyfluorene (X22- 1 660B-3, number average molecular weight 4,400) 3.42g ( 〇.8mmol). Next, after nitrogen substitution in the flask, N,N-dimethylacetamide 58 ml' was added and stirred until uniform. In the obtained solution, (A-2) component: diphenyl-3,3\4,4'-tetracarboxylic dianhydride (hereinafter also referred to as "s-BPDA") 8.71 g (25.9) was added at room temperature. Methyl) 'At this temperature, stirring was continued for 24 hours to obtain a composition (polyglycine solution). A polyimide film was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was applied at an arbitrary number of revolutions and time to obtain a film (film) having a film thickness of 0·0 3 m. The physical properties of the obtained polyimine, poly-araminic acid, and polyiamine film are shown in Table 1. -51 - 201139523 [Example 13] In a four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a 300 mL, a component (B-2) was added: 2.94 g (26.2 mmol) of 1,4-second house and ( B-1) Component: a two-terminal aminophenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., X22-9409, number 1,300) 2.5 6 g (2.0 mmol). Next, the flask was placed, and 58 ml of N,N-dimethylacetamide was added thereto, and the mixture was stirred until homogeneous. The component (A-2) was added at room temperature: diphenyl-3::carboxylic acid dianhydride 9.46 g (28.1 mmol), at this temperature, continued, the composition (polyglycine solution) was obtained. A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyamic acid solution was applied in an arbitrary number of revolutions to obtain a film (film) having a film thickness of mm3 mm. The physical properties of the obtained polyimine and polyimine film are shown in Table 1. [Example 14] In a four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a 300 mL, a component (B-2) was added: 4,4' 2,2'-bis(trifluoromethyl) Benzene (hereinafter also referred to as "TFMB (24.5mmol) and (B-1) components: two-terminal amine-denatured polyfluorene (Xinith Chemical's X22-9409, number average molecule: 2.03g (1.6mmol). Secondly' The flask was subjected to nitrogen substitution of 58 ml of N,N-dimethylacetamide, and the mixture was stirred until uniform. The resulting amine tube was substituted with an aminocyclohexyl modified methyl-average molecular weight nitrogen. The resulting 3', 4, 4'-four Stir the mixture for 24 hours, and operate the acid, polyfluorene cooling tube -diamine-") 7.85g methylphenyl 1,1,00 00), then add the solution -52-201139523 at room temperature Addition of (Ad) component: 1,2,3,4-cyclobutanetetracarboxylic dianhydride (hereinafter also referred to as "CBDA") 5.12 g (26.1 mmol), and stirring was continued at this temperature for 24 hours to obtain a composition. (polyglycine solution). A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyamic acid solution was applied at a random number of times and time to obtain a film (film) having a film thickness of 〇3 nm nm. The physical properties of the obtained polyimine, polylysine, and polyimine film are shown in Table 1. [Example 15] A (B-2) component: 2,2'-dimethyl-4,4'-di was added to a 300 mL four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube. Aminobiphenyl 6.34g (29.9mmol) and (B-1) component: two-terminal amine-denatured methylphenyl polyfluorene (X22- 1 660B-3, number average molecular weight 4,400) 2.68g ( 0.6mmol). Next, after nitrogen substitution in the flask, 58 ml of N,N-dimethylacetamide was added, and the mixture was stirred until it became homogeneous. In the obtained solution, (A-2) component: 1,2,3,4-cyclobutanic acid dianhydride 5.98 g (30.5 mmol) was added at room temperature, and stirring was continued for 24 hours at this temperature. Composition (polyglycine solution). A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyaminic acid solution was applied at a random number of times and time to obtain a film (film) having a film thickness of 〇3 mm. The physical properties of the obtained polyimine, polylysine, and polyamidimide films are shown in Table 1. [Example 1 6 ] -53- 201139523 A (B-2) component: 2,2'-dimethyl-4 was added to a 300 mL four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube. 4'-diaminobiphenyl 4.78g (22.3mmol) and (B-1) component: two-terminal amine-denatured methylphenyl polyfluorene (manufactured by Shin-Etsu Chemical Co., Ltd., X22-1 660B-3, number average molecular weight 4,400) 5.16g (1.2mmol). Next, after nitrogen substitution in the flask, 58 ml of N,N-dimethylacetamide was added, and the mixture was stirred until it became homogeneous. In the obtained solution, (A-2) component: pyromellitic dianhydride 5·1 lg (23.4 mmol) was added at room temperature, and stirring was continued for 24 hours at this temperature to obtain a composition (polyglycine solution). ). A polyimine film was obtained in the same manner as in Example 1 except that the obtained polyamic acid solution was applied at a random number of revolutions and time to obtain a film (film) having a film thickness of 0.03 mm. The physical properties of the obtained polyimine, polylysine, and polyimine film are shown in Table 1. [Example 17] The polylysine solution (composition) prepared in the above Example 1 was cast-coated on a non-alkali glass support by a spin coater to obtain a coating film thickness of 25 μm. The film was dried at 70 ° C for 30 minutes, and then dried at 12 (TC for 30 minutes) to obtain a coating film. Thereafter, the film obtained by the cyclization (hydrazylation) step was further dried at 250 ° C for 2 hours. A transparent conductive film (element) was formed on the surface of the obtained coating film by a sputtering apparatus under the argon atmosphere at a film formation condition of 23 ° C for 5 minutes. The target material was ITO. The specific resistance of the substrate obtained was 値2χ10·4 (Ω·cm). The polyimide film provided with a transparent conductive film is peeled off from the alkali-free glass branch-54-201139523 to obtain a flexible substrate. The substrate can be completely peeled off from the support. [Comparative Example 1] A (B-2) component: 2,2'-dimethyl 4 was added to a 300 mL four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube. 4,-diaminobiphenyl 7.40g (34.9mm〇l). Secondly, after the nitrogen substitution in the flask, Ν,Ν-dimethyl Acetylamine 58 ml 'stirred until homogeneous. In the obtained solution, (A·2 ) component: pyromellitic dianhydride 7.60 g (34.9 mmoI) was added at room temperature, and stirring was continued for 24 hours at this temperature. The composition (polyamine acid solution) was obtained. The same procedure as in Example 1 was carried out except that the obtained polyaminic acid solution was applied at an arbitrary number of revolutions and time to obtain a film (film) having a film thickness of 〇3 mm. The polyimine film was obtained, and the physical properties of the obtained polyimine, polylysine, and polyimine film were as shown in Table 1. [Comparative Example 2] A thermometer, a stirrer, and a nitrogen introduction were installed. A 300 mL four-necked flask of a tube and a cooling tube was added with a component (b-2): 2.25 g (22.5 mmol) of 2,2,-bis[4-(4-aminophenoxy)phenyl]propane. After replacing the inside of the flask with nitrogen, 58 ml of hydrazine, hydrazine-dimethylacetamide was added, and the mixture was stirred until homogeneous. In the obtained solution, (A_2) component was added at room temperature: pyromellitic dianhydride 2.95 g ( 13.5 mmol) and 4,4,- oxydiphthalic dianhydride (hereinafter also referred to as "ODPA") 2.80 g (0.9 mmol), and the temperature is -55-201139523, stirring is continued 24 When the film (thickness) having a film thickness of mm3 mm was obtained by coating the obtained polyamic acid solution at an arbitrary number of revolutions and time to obtain a film (film) having a film thickness of 〇3 mm, and Example 1 In the same manner, a polyimide film was obtained, and the physical properties of the obtained polyimine, polylysine, and polyimine film were as shown in Table 1. ° -56 - 201139523 s rent-sensitive 骟 ◎ ◎ 〇〇 ◎ ◎ 〇〇〇〇〇 ◎ ◎ ◎ ◎ <X 1 peelability ◎ ◎ 〇 ◎ ◎ ◎ ◎ ◎ ◎ 〇 O ◎ ◎ ◎ ◎ < 〇X Adhesiveness ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Ο o ◎ ◎ ◎ ◎ 〇 ◎ ◎ Film appearance m • mi transparent uniform 1 welcoming m welcoming mm Item S mmmm JjT m ϋΓ ST m ϋΓ ST Helmet m m JIT 驭s OUT m ϋΓ ίΓ Helmet mm ^ Μ :4.18 | 1 4.18 J (SB I » CO t- r-» Γ 4.35 1 ? | 4.45 | l«2 J 1 4.52 J | 4.60 | I 3.99 IL«? j δ I 4-38 I ο u> I 3.18 I Polyoxane concentration [%] Bu _ 5 C9 〇> ! 15.8 | CO 〇» 1 15.7 I rp csi CNJ ci CO 〇> 5 | 22.8 | 1 13.6 j a> 丨34.3 1 o ο Tg of polyimine (°C) ! >350 | 1 >350 1 ! >350 | [>350 Ί I >350 | I >350 II &gt ;350 | Γ >350 1 Γ >35(ΓΊ 1 >350 1 I >350 | | >350 | | >350 | I >350 | | >350 | Γ >350 1 I >350 | s CM Polymethane Mw Γ 95,000 | ο ο σ» Γ 84,000 | o 〇 _ O o 〇o CO I 83,000 | O o OO CO | 94,000 I 1 72,000 Π I 65,000 | O os | 82,000 · | | 76,000 | I 69.000 I ο 1 〇> 1 101,000 I 〇§ ci c〇1 iDMAc/THFl 1 DMAc 1 |DMAc/THF| iDMAcAHF l |DMAc/THF| I DMAc | I DMAc II DMAc | | DMAc 1 1 DMAc 1 | DMAc | I DMAc | 丨DMAc I | DMAc | | DMAc I 1 DMAc 1 | DMAc | | DMAc | (B-1) 1X22 -1660B-3 1 1 Χ22-1660Β-3 | 1 X22-1660B-3 | 1 Χ22-1Θ60Β-3 | I X22-1660B-3 | I X22-9409 | | X22-161B | | X22-161A | 1 X22 -1660B-3 | I X22-1660B-3 | IX22-1660B-3 | | X22-9 Overview 1 | X22-9409 | I X22-1660B-3 | 1 Χ22-1660Β-3 I 1 (B-2) 1_ | BAPP | | ODA | IMBCHAl I BAPP ] | m-TB 1 I m-TB | I m-TB II PDA II m-TB | | m-TB | I m-TB I | m-TB | I m-TB I | CHDA 1 "CHDA j I TFMB | i m-TB | 1 m-TB | I m-TB | (A-1) 1 DMS-Z21 | 1 (A-2) 1 1_ I ODPA | | PMDA | I PMDA | | PMDA | | PMDA I PMDA | | PMDA II PMDA ] I PMDA I | PMDA | IPMDAHj I PMDA I |s-BPDA| |s-BPDA| I CBDA I 1 CBDA 1 1 PMDA | I PMDA | | mm Μ 1Example 2] mm inch m grip K vr> 匡m peo omm K grip K 00 1 撢Os grip tilt 0 1 m grip i grip 飘 c〇| grip im lion VO im 御 v〇im I comparison Example 1 1 m ±3 -57- 201139523 (1 Weight average molecular weight (Mw), number average molecular weight (?n), and molecular weight distribution (Mw/Mn) The weight average molecular weight (Mw) and number average molecular weight of the polylysine obtained in the following Examples 18 to 27 and Comparative Example 3. (Μη) and molecular weight distribution (Mw/Mn) were measured using a HPC-8220 GPC apparatus (protective column: TSK guard colomn ALPHA column: TSKgelALPHA - Μ, developing solvent: ΝΜΡ) manufactured by TOSOH. (2) Storage stability at -15 °C The varnish (polyimine film-forming composition) obtained in the following Examples 18 to 27 and Comparative Example 3 was stored at -15 ° C for 48 hours. By visual inspection, those who were transparent and free of sediment were evaluated as 〇, and those who were opaque and precipitated were evaluated as X. (3) Varnish viscosity Using the following varnishes of Examples 18 to 27 and Comparative Example 3, 1.5 g of varnish was used to measure the varnish viscosity at 25 t. Specifically, it was measured using a Toki Shoji viscometer MODEL RE 100. (4) The coating film after vacuum drying was fixed in the central portion of the coating film of the glass-attached support after vacuum drying, which was obtained in the following Examples 18 to 27 and Comparative Example 3, and the center portion of the glass support. Place the support with the coated film upright for 1 〇. When there is no change in the height of the marking line on the coating film and the marking line on the glass support, it is judged that the fixing is -55-201139523. (5) Polymer (poly-proline) concentration after vacuum drying The concentration of the polymer (poly-proline) in the vacuum-dried coating film obtained in the following Examples 18 to 27 and Comparative Example 3 was The formula is calculated. Varnish weight after coating = weight of glass support after varnish coating - polymer concentration before varnish coating, polymer concentration (%) = total amount of input monomer / (input monomer amount + total amount of input solvent) xl 00 polymer weight after coating = varnish weight after coating X polymer concentration at input (%) film weight after vacuum drying = glass support weight of coated film after vacuum drying - glass support before varnish coating Polymer concentration after vacuum drying (%) = (weight of polymer after coating / weight of film after vacuum drying) χ1 00 (6) Solvent composition ratio after vacuum drying The following Examples 18 to 27 and Comparative Examples 3 The solvent composition ratio in the obtained coating film after vacuum drying is calculated according to the above formula and the following formula. Solvent weight after coating = weight of varnish after coating - weight of polymer after coating, weight of non-amined solvent after coating = weight of solvent after coating X input of non-amined solvent (non-amine in mixed solvent) Solvent ratio) (%) Solvent weight after vacuum drying = film weight after vacuum drying - after coating poly-59-201139523 Compound weight by vacuum drying After evaporation solvent weight = solvent weight after coating _ vacuum drying solvent Weight of non-melamine solvent after vacuum drying = weight of non-amined solvent after coating - composition ratio of solvent-weight non-amined solvent after evaporation by vacuum drying (%) = (non-guanamine after vacuum drying) Solvent weight / solvent weight after vacuum drying X 1 00 ) Composition ratio of guanamine solvent (%) = 1 〇〇-non-amine amine solvent composition ratio (solvent in vacuum solvent evaporation is defined as a mixed solvent) The solvent having the lowest boiling point (non-melamine-based solvent)) (7) Adhesiveness after one-time drying (Tack) The coating film obtained by drying each of the following Examples 18 to 27 and Comparative Example 3 was made of a metal scraper. Friction by force, the film does not move. No significant viscosity, the coating film were evaluated as mobile adhesion. (8) Optical characteristics The coating film formed on the glass support after one drying and the second drying obtained in the following Examples 18 to 27 and Comparative Example 3 was measured for Haze according to the viscous test method of JIS K7 105, respectively. Haze). Specifically, it was measured using a SC-3H type Haze meter manufactured by SUGA Testing Machine Co., Ltd. (9) Glass transition temperature (Tg) -60-201139523 The polyimine film obtained in the following Examples 18 to 27 and Comparative Example 3 was peeled off from the glass support, and the polyimide film after peeling was used. The Thermo Plus DSC 823 0 (differential scanning calorimetry) manufactured by Rigaku was measured at a temperature rise rate of 20 ° C / min and a range of 40 to 450 ° C under nitrogen. (1 〇) Line Expansion Coefficient The polyimine film obtained in the following Examples 18 to 27 and Comparative Example 3 was peeled off from the glass support, and the sequined imide film after peeling was Seiko Instrument SSC/5200. The measurement was carried out at a temperature rising rate of 6 ° C / min and 25 to 3 50 ° C. The linear expansion coefficient of 100 to 200 ° C was calculated from the measurement results. (1 1 ) Residual stress of the coating film The varnish obtained in the following Examples 18 to 27 and the comparative example 3 was used in a ruthenium wafer sheet (manufactured by KLA Co., Ltd.) for use in the measurement of residual stress, and was made by Chichibu Electronics Co., Ltd. A film of 30 μm after drying was formed twice on the thickness = 300 μm, diameter = 4 Å, and warpage was measured by laser, and the stress of the coating film was calculated by the following formula. From the viewpoint of suppressing the warpage of the obtained polyimide film, the residual stress of the coating film is preferably 10 MPa or less, more preferably 5 MPa or less. [Equation 1] Eh2 6 (lv) Rt σ: residual stress of the film t: thickness of the film R: radius of curvature measured h: thickness of the substrate E: Young's modulus of the substrate v: poisson of the substrate -61 - 201139523 (1 2 ) oxime imidization ratio The ruthenium imidization ratio of the polyimine in the polyimine film obtained after drying twice in the following Examples 18 to 27 and Comparative Example 3 Quantification was carried out according to the following method using FT-IR (manufactured by Thermo F i sher Sci ific ific, Thermο NIC OLET6 7 00). The peak of the peak of the NH variable angle vibration (1520CHT1) from the poly-proline acid and the peak of the aromatic asymmetric three-received 'CH-external angle-angle vibration (990(:11^1) area with the Gaussian distribution, the peak Separation 'quantitative. Determine the peak area ratio of the poly-proline before the drying (the peak area of 990 CHT1 / the peak area of 1 5 20 (: 1 ^ 1) and the peak area ratio after 2 drying, use The oxime imidization ratio was calculated by the following formula: 醯 imidization ratio (%) = (peak area ratio after 1 - 2 drying / peak area ratio before 1 drying) x 1 〇〇 (13) poly 醯For the strength of the imide film, the polyimine film having a film thickness of 30 μm was obtained by peeling off the dried glass support obtained in the following Examples 18 to 27 and Comparative Example 3 using the dumbbell No. 7 of JIS K6 25 1 The film was subjected to a tensile test at 23 ° C and a speed of 50 mm/min, and the tensile strength, tensile strength, and elastic modulus were measured. (1 4 ) Peeling property with the glass support The following Examples 18 to 27 and comparison were carried out. The 3 〇μπι coating film of the glass support after the second drying obtained in Example 3 was cut into a width l〇mmx length 50 mm by a cutter, -62-201139523 After peeling to a length of 20 mm, the peel strength was measured at an angle of 180 degrees and at a speed of 50 mm / mi η. (15) Warpage of the polyimide film was carried out in the following Examples 1 to 2 7 and Comparative Examples (3) The 30 μηι coating film of the glass-supported body obtained after the second drying was cut into a width of 60 mm×60 mm by a dicing blade, and then the four ends were floated upward to calculate an average enthalpy. [Example 18] A thermometer and a nitrogen introduction tube were attached. And stirring the leaf three-necked flask, adding m-triazine (m-TB) 45.23099g (0.2 1 3 06 mol), and dimerizing the side chain phenyl group. X-22- 1 660B-3 [9.4694g ( 0.002 1 5 2 1 mο 1 )], the concentration of poly-proline in the varnish is 14%, and dehydrated N-methyl-2-pyrrolidone (NMP) is added. 307g and 307g of dehydrated cyclohexanone (CHN), stirred for 10 minutes until m-TB and X-22-1 660B-3 are completely dissolved. Add pyromellitic dianhydride (PMDA) 22_6498g (0.10384mol) and stir for 30 minutes. After that, add PMDA22.6498g (0.103 84mol) to the end of the reaction for 60 minutes to complete the reaction, followed by a filter made of polytetrafluoroethylene (aperture ΐμη Precision filter for making a varnish (PMDA / (mTB + X-22- 1 660B-3) = 0.96 5 eq). The varnish properties are shown in Table 2. X-22-1 660B-3 : Shin-Etsu Chemical Co., Ltd., two-terminal amine-denatured side chain phenyl-methyl polyoxyl (composed of H-NMR methyl group and phenyl molybdenum) The ratio is 75: 25, the number average molecular weight is 4,400, and the catalogue is: Shin-Etsu-63-201139523 Chemical Industry Co., Ltd., Polyoxane Business Unit Headquarters Reference Poly Oxygen News No. 122, July, 2002) Glass support (width: 300mmx Length: 3 50 claws 111> <Thickness: 〇.7 mm) Fixed to a control coating machine set vertically to the gravity. After drying twice, the film thickness was 30 μm, the gap interval was set to 405 μm, and the varnish was 12 g to the glass. The center of the support body is formed into a coating film having a width of 200 mm x length: 220 mm. Thereafter, the pressure was reduced to 0.1 mmHg after vacuum drying for 10 minutes at 25 t using a vacuum dryer, and then returned to normal pressure (760 mmHg) to complete vacuum drying. The physical properties of the coating film after vacuum drying are shown in Table 2. The film after vacuum drying is transparent, the coating film is fixed, and there is no dripping of liquid droplets. After vacuum drying, the peak regions of 1520 CHT1 and 990 (:1^1) of the polyglycolic acid were vacuum dried at 5.09 and 6.89, respectively, and then dried in a hot air dryer at 130 ° C for 1 〇 minute. The results of the physical property evaluation of the coating film sample after the secondary drying are shown in Table 2. Next, the drying was performed twice at 300 ° C for 1 hour. The evaluation results are shown in Table 2. The polyimide film was obtained without warping. The Tg is also a tough polyimine film having a heat resistance of 45 (TC or more, excellent heat resistance, transparency, smoothness, and low linear expansion coefficient. Further, the obtained coating film has a high drying speed, and is 1 In the secondary drying and the secondary drying, the adhesion to the Boma support is excellent, and the polyimide film obtained after the second drying is excellent in peelability from the glass support. [Example 19] • 64 - 201139523 In Example 18, except that the amount of use of "ΤΒ, X-22-1660B-3, and PMDA was changed as shown in Table 2, the same operation as in Example 8 was carried out. The results are shown in Table 2. Heat resistance, It is excellent in transparency and smoothness, and has no warpage or tough polyimide film. In addition, the obtained coating film is dried at a high speed. It is excellent in the adhesion to the glass support in the i-time drying and the second-time drying, and the polyi-imide film obtained after the second drying is excellent in the releasability from the glass support. [Example 20] In Example 18, except that the amounts of use of m-TB, X-22-1 660B-3 and PMDA were changed as shown in Table 2, the same operation as in Example 8 was carried out. The results are shown in Table 2. Heat resistance was obtained. It is excellent in transparency and smoothness, and has no warpage or tough polyimide film. In addition, the obtained coating film has a high drying speed, and is adhered to the glass support in i-time drying and secondary drying. It is excellent in the properties, and the polyimide film obtained after the second drying is excellent in peelability from the glass support. [Example 21] In Example 18, except that 111-butyl 832.56478 § and 4,4'-diamine were used. The use amount of 7.8760 g of the substituted diphenyl ether (ODA) instead of m-TB45.23099g - X-22- 1660B-3 and PMDA was changed as shown in Table 2, and the results were as shown in Table 2. A polyimide film having improved heat resistance, transparency, and smoothness and having no warpage can be obtained, and the obtained coating film system can be obtained. Dry-65-201139523 Fast speed 'In the first drying and the second drying, the polyimine film obtained after two times of drying with excellent glass support is excellent in glass peeling property. [Example 22] Example 18 In addition to hydrazine-based solvent, hydrazine-di(DMAc) was used in place of hydrazine, and the same operation as in Example 18 was carried out. It was excellent in heat resistance, transparency, smoothness, and low tensile modulus. Further, the obtained polyimine film has a high drying rate, and is excellent in glass branching property in primary drying and secondary drying, and the polyimide film obtained by drying twice is excellent in peelability. [Example 23] In Example 18, except that the non-amine-based solvent was used, CHN307g was used, and the amount of NMP used was changed to the same as shown in Table 2 except that the same procedure was carried out. The results are shown in Table 2. A tough polyimide film which is excellent in heat resistance, transparency, smoothness, and lowness of onset can be obtained. Further, the obtained drying speed is fast, and it is excellent in glass branching in one drying and two drying, and the polyimide film obtained by drying twice is excellent in peeling property. Methyl acetamide of the close-contact glass support of the body. The results are shown in Table 2. The warp and the swell of the coating film are replaced by the dense glass support nitrile 430g, and the examples are warped and inflated. Coating film dry support dense glass support -66-201139523 [Example 2 4] In Example 18, except for the use of Shin-Etsu Chemical, the two-terminal amine-denatured side chain methyl type polyoxyl KF8010 (Number average molecular weight (44 Å, m = 58)) 2.8408 g and X22-1660B-3 (6.6286 g) were substituted in the same manner as in Example 18 except that χ_22-1660Β-3 (9.4694 g) was used. The results are shown in Table 2. A tough polyimide film which is excellent in heat resistance, transparency, and smoothness, and has no warpage and a low linear expansion coefficient can be obtained. Further, the obtained coating film has a high drying rate, and is excellent in adhesion to the glass support in one drying and two dryings. The polyimine film obtained after drying twice is peeled off from the glass support. Excellent sex. [Example 2 5] The same procedure as in Example 18 was carried out in the same manner as in Example 18 except that the amounts of NMP and CHN used were as shown in Table 2. The results are shown in Table 2. A polyimide film which is excellent in heat resistance and smoothness and which is free from warpage and toughness can be obtained. Further, the obtained coating film has a high drying speed, and is excellent in adhesion to a glass support in one drying and two drying, and the polyimine film obtained after drying twice is peeled off from the glass support. Excellent sex. [Example 2 6] In Example 18, the same operation as in Example 18 was carried out except that ethylene glycol monomethyl ether was used instead of chn. The results are shown in Table 2. A polyimide film having excellent heat resistance, transparency, and smoothness, and having no warpage or a strong weft edge can be obtained. Further, the obtained coating film has a high drying speed, and is excellent in adhesion to the glass support in the -67-201139523 drying and secondary drying, and the polyimide film obtained after the second drying is made of glass. The support is excellent in peelability. [Example 27] In Example 18, except that NMP614 was used instead of NMP3 07g and CHN3〇7g, the same operation as in Example 18 was carried out. The results are shown in Table 2. A polyimide film which is excellent in heat resistance and smoothness and has no warpage can be obtained. In addition, the obtained coating film is excellent in adhesion to the glass support in one drying and two dryings. The polyimide film obtained by drying twice is excellent in peelability from the glass support. [Comparative Example 3] In Example 27, the same operation as in Example 27 was carried out except that χ·22_166〇Β-3 was not used, and the amounts of use of m_TB and PMD A were changed as shown in Table 2. The results are shown in Table 2. The varnish obtained in Comparative Example 3 had a slow drying rate. Further, after the secondary drying, the residual stress increased, and the polyimide film which was peeled off by the glass support exhibited a large warpage. -68- 201139523 r> CO rj r> CM s' I 4400 2200 ! I ! 49.7β66 l_ 614 1 丨110000 1 37900 1 3 0 I 250000 | 胆 ηη g 〇1—1—30 I e CN G Γ; - S: m CN 1 100 I -3.5 eo ο cc up to 4501C, not detected by m CM O 45.23099 I X-22- 1660B-3 4400 I 2200 1 ,9.4694 | I to σ> Cl in 1__ 814 _ I <β· 1 73500 1 I 24500 1 L 3.00 I 0 1 4300 I seedling rj〇〇 〇 g o CD a rj - m m, CS α <〇rg iO e (ΟCO to 45〇r, no CM is observed o 45.23099 I i 7 11 4400 \ 2200 I 5 9.4694 II '45.2896 1 307 1 r» n 46000 1 1 14400 IO ri X 3300 J g 晅aa C0 ο a **! Ο rs - W n P3 〇〇r· - s Ξ to 4501: not observed - do 45.23099Π X-22- 1660B-3 4400 | 2200 1 9.4694 1 I 45.2990 1 o 5 to 62000 1 ο w 2.44 IX 12000 1 ms S I__130___I om » ο cn - m -n 〇I 100 1 CJ - o α> Up to 450X: Not observed - ϋ o 5 45.23099 i X-22- 1660B-3 4400 1 2200 1 6,6286 1 KF8012 1 4400 1 1 2200 1 g Γ2·β4〇8 1 1 45.2996 1 5 CO Γ 307 | 713001 I 23200 I 3.07 I 0 1 4000 1 with ϋ m OJ CM & Γ5 ο om 3 ο r> - Miao 5 〇〇1 210 ' OB to 4501C, no CO do 45.23099 1 X-2Z-1660B-3 4400 | 2200 | 9.4694 1 1 (O σ>〇> CSJ JO _m_ § in ί 73000 1 I 24300 I f 3.00 Ί o I 6500 Ί Sleep o O 〇§ o 璀η 1 300 1 - m η η e C|J <» β> eo up to 450*C, Γ5 5 o 翠脑〇> g rs IA X-22- 1660B-3 4400 1 2200 1 9.4694 1 1 CD Oi in CM JO 307 1 g rj a 1 70000I I 21200 I o 1 5200 1 1 晅ss - 1_130_! m rj 1 300 - 粕Γ> ο ο ο ο ο 1 42.2528 1 % 96700 Ί I 35200 I "2) 5 I o I in 1 s eo L_132_I o 薜§ 1 5 ο CD s <〇η to 450T; so far, no σ»r> doa 38.91890 Π X-22· 1660B-3 4400 \ 2200 1 20.6Θ33 I 1 40.3978 1 1 -307 Ί 1 307 1 1 102000 1 I 32900 I o 12000 i ί s s βο LZ.130-H o to C«J 1 - grain Ν different α CO CO to 450 TC, not observed ο 5 o α> 42.67864 I X-22- 1660B-3 4400 I 2200 1 13.4707 I 1 43.8507 1 307 io' i OI 33770 I to P3 o 1 16000 IK s rs i__m_I a 雔eg 1 - m CSl ο oo ir> oi to 450X; until, no observation (Ο 5 o CO 45.23099 I X- 22- 1660Β·3 4400 1 2200 | 9.4694 I 1 45.2996 Ί 307 1 g 72400 1 22300__ 3.25 1 o 4200 I ίSi CD I__m_] o Grip f〇1 300 1 - Then Γ > CjJ σ> e to 450* 0, until the Γ 観 Γ Γ Γ MM MM MM MM MM MM MM MM MM MM MM MM MM MM a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a a & im embed m 铤em ε &<〇 Θ Θ i m. Θ m 联 ® u ! £Γ β- 截 β I 65 m Θ ε <π Θ Θ m 0 联 PMDA 1 i CN i 揉 DMAci Boiling «=1660 1 1 i <*·> ά % m NJ 汽1 Q寒u 轾 I I Mw/Mn 1 by 琳趄 P 2 1 结妇海笔 1 a 珀辰味埋Η § im 味β 雔I 1 Miao Li Yue • MS | s Λ N 邮 n • M 徂 徂 1 1 1 1 I Μ 教 CS a class © hanging 1 culvert PI g £ 1 1 1 fiei want to cut m glass transition temperature § S3 i SI by Ban Ban Supports the irritating film, the warp monomer solvent, the poly-amic acid varnish, the vacuum drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying, the drying

Claims (1)

201139523 七、申請專利範圍: 1. 一種基板之製造方法,其特徵係含有: (a) 在支持體塗佈含有具有下述式(1)表示之構造 單位的聚醯胺酸與有機溶劑的聚醯亞胺系膜形成用組成物 ,經乾燥形成含有聚醯胺酸之塗膜的步驟、 (b) 將前述含有聚醯胺酸之塗膜加熱,得到聚醯亞 胺系膜的步驟、 (c) 在前述聚醯亞胺系膜上形成元件的步驟、 (d) 將前述形成元件之聚醯亞胺系膜由支持體上剝 離的步驟, 【化1】 R1 —fsi—0^— (1) I η R1 (式(1)中,複數之R1係各自獨立爲碳數1〜20之1價 有機基,η係1〜200之整數)。 2. 如申請專利範圍第1項之基板之製造方法,其中前 述聚醯胺酸爲使(A )含有選自四羧酸二酐及此反應性衍 生物所成群之至少1種醯基化合物的成分與(B)含有亞胺 基形成化合物的成分反應所得’且滿足下述(i)及/或( Π), (i)前述(A)成分含有(A-1)具有上述式(1)表 示之構造單位的醯基化合物 • 70- 201139523 (ii)前述(B)成分含有(B_l)具有上述式(1) 表示之構造單位的亞胺基形成化合物。 3. 如申請專利範圍第2項之基板之製造方法,其中前 述(B)成分中之前述(B-1)具有上述式(1)表示之構 造單位之亞胺基形成化合物的含量係相對於前述(B )成 分之合計量100質量%爲5〜70質量%。 4. 如申請專利範圍第2或3項之基板之製造方法,其 中根據前述(B-1)具有上述式(1)表示之構造單位的亞 胺基形成化合物之胺價所計算的數平均分子量爲 500〜10,000 。 5 ·如申請專利範圍第2〜4項中任一項之基板之製造方 法,其中前述聚醯胺酸爲使前述(A)成分與前述(B)成 分在(A)成分與(B)成分之莫耳比((B)成分/ (A) 成分)0.8~1.2之範圍內反應所得。 6 .如申請專利範圍第1〜5項中任一項之基板之製造方 法,其中前述有機溶劑爲選自Ν,Ν’-二甲基咪唑啉酮、γ-丁 內酯、Ν -甲基-2-吡咯烷酮、Ν,Ν-二甲基乙醯胺、四氫呋 喃、環己酮、乙腈及乙二醇單乙醚所成群之至少1種溶劑 ,相對於有機溶劑全量含有5 0重量%以上。 7. 如申請專利範圍第1〜6項中任一項之基板之製造方 法,其中前述構成聚醯亞胺系膜之聚醯亞胺,以差示掃描 熱量測定(DSC、昇溫速度20°C /分鐘)測定的玻璃轉化溫 度爲3 5 0 °C以上。 8. 如申請專利範圍第1〜7項中任一項之基板之製造方 -71 - 201139523 法,其中前述步驟(b )中之加熱在20 0〜3 5 0 °C之範圍內進 行,且在聚醯亞胺系膜之玻璃轉化溫度以下進行。 9. 如申請專利範圍第1〜8項中任一項之基板之製造方 法,其中前述支持體爲矽晶圓或無鹼玻璃。 10. —種聚醯亞胺系膜形成用組成物,其特徵係用於 如申請專利範圍第1〜9項中任一項之基板之製造方法的聚 醯亞胺系膜形成用組成物,且含有具有下述式(1)表示 之構造單位的聚醯胺酸與有機溶劑, 【化2】 R1 —fsi—— (1) η Ri (式(1)中,複數之R1係各自獨立爲碳數1〜20之1 價有機基,η係1〜200之整數)。 •72- 201139523 四 指定代表圖: (一) 本案指定代表圖為:無 (二) 本代表圖之元件符號簡單說明:無 201139523 五 本案若有化學式時,請揭示最能顯示發明特徵的化學 式:無201139523 VII. Patent application scope: 1. A method for producing a substrate, comprising: (a) coating a support comprising a polyamine acid having a structural unit represented by the following formula (1) and an organic solvent; a step of forming a coating film containing a polyaminic acid by drying a composition for forming a quinone imine film, and (b) heating the coating film containing polyamic acid to obtain a polyimide film; c) a step of forming an element on the polyimide film, and (d) a step of peeling off the polyimide film forming the element from the support, [1] R1 - fsi - 0 - ( 1) I η R1 (In the formula (1), the plural R1 groups are each independently a monovalent organic group having 1 to 20 carbon atoms, and the η is an integer of 1 to 200). 2. The method for producing a substrate according to claim 1, wherein the polyamic acid is at least one mercapto compound containing (A) selected from the group consisting of tetracarboxylic dianhydride and the reactive derivative. The component (B) reacts with the component containing the imine group-forming compound and satisfies the following (i) and/or (Π), (i) the component (A) contains (A-1) having the above formula (1) ) A mercapto compound represented by the structural unit of the present invention. 70-201139523 (ii) The component (B) contains (II) an imine group-forming compound having a structural unit represented by the above formula (1). 3. The method for producing a substrate according to the second aspect of the invention, wherein the content of the imine group-forming compound having the structural unit represented by the above formula (1) in the above (B) component is relative to 100% by mass of the total amount of the component (B) is 5 to 70% by mass. 4. The method for producing a substrate according to claim 2, wherein the number average molecular weight calculated based on the amine valence of the imine group-forming compound having the structural unit represented by the above formula (1) (B-1) For 500~10,000. The method for producing a substrate according to any one of claims 2 to 4, wherein the polyamic acid is such that the component (A) and the component (B) are in the components (A) and (B). The molar ratio ((B) component / (A) component) is obtained by reacting in the range of 0.8 to 1.2. The method for producing a substrate according to any one of claims 1 to 5, wherein the organic solvent is selected from the group consisting of ruthenium, Ν'-dimethylimidazolidinone, γ-butyrolactone, Ν-methyl At least one solvent of the group consisting of -2-pyrrolidone, hydrazine, hydrazine-dimethylacetamide, tetrahydrofuran, cyclohexanone, acetonitrile, and ethylene glycol monoethyl ether contains 50% by weight or more based on the total amount of the organic solvent. 7. The method for producing a substrate according to any one of claims 1 to 6, wherein the polyimine of the polyimine film is measured by differential scanning calorimetry (DSC, temperature increase rate: 20 ° C) /min) The measured glass transition temperature was 350 ° C or higher. 8. The method of manufacturing a substrate according to any one of claims 1 to 7, wherein the heating in the step (b) is carried out in the range of 20 0 to 350 ° C, and It is carried out below the glass transition temperature of the polyimide film. 9. The method of producing a substrate according to any one of claims 1 to 8, wherein the support is a tantalum wafer or an alkali-free glass. A composition for forming a polyimine-based film, which is characterized in that the composition for forming a substrate of the method for producing a substrate according to any one of claims 1 to 9 is Further, the polyglycine and the organic solvent having the structural unit represented by the following formula (1) are contained, and R1 — fsi — (1) η Ri (in the formula (1), the plural R1 systems are each independently The number of carbon atoms is 1 to 20, and the η is an integer of 1 to 200. • 72- 201139523 Four designated representatives: (1) The representative representative of the case is: No (2) The symbol of the representative figure is a simple description: No 201139523 If there is a chemical formula in the case, please disclose the chemical formula that best shows the characteristics of the invention: no
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