201139115 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及熱壓印技術領域，尤其涉及一種奈米壓印裝 置及奈米壓印方法。 【先前技術"】 [0002] 奈米壓印，係指將具有奈米級特徵尺寸的微細結構的模 具藉由一定壓力，壓入熔融的塑膠内，待塑膠冷卻或固 化，即該微細結構定型後，移去模具，獲得具有奈米級 微細結構的產品。近年來，奈米壓印技術已廣泛應用於 製作半導體元件及光學元件。 [0003] 一般而言，太陽能集光系統採用菲涅爾透鏡會聚太陽光 ，採用晶片將該會聚後的太陽光轉換為電能。菲涅爾透 鏡一般由塑膠製成，耐候性較差。通常於菲涅爾透鏡表 面附上支撐片或其他高透明片材作為支撐片來提高菲涅 爾透鏡的使用壽命。對應地，採用奈米壓印技術生產菲 涅爾透鏡時，需將模具置於承載台，將塑膠置於模具模 腔中，該模腔中形成有奈米級特徵尺寸的微細結構，將 支撐片置於塑膠表面封閉該模腔，利用加熱裝置加熱壓 印頭，然後利用高溫壓印頭壓住支撐片。於壓印過程中 ，塑膠將形成熔融體，支撐片將與該熔融塑膠成一體。 惟，支撐片容易相對塑膠滑動，且壓力於支撐片的分佈 為中間較大，邊緣較小。這導致支撐片中間部分容易被 壓碎。 [0004] 有鑑於此，提供一種奈米壓印裝置及奈米壓印方法來避 免支撐片移位及被壓碎實為必要。 099114771 表單編號A0101 第4頁/共16頁 0992026210-0 201139115 [0005] [0006] ❹ [0007] Ο [0008] [0009] 【發明内容】 以下以實施方式為例說明一種可避免支撐片移位及被壓 碎的奈米壓印裝置及奈米壓印方法。 一種奈米壓印裝置，其包括壓印頭、模具、加熱裝置及 真空發生裝置。該壓印頭包括壓印面及與該壓印面相對 的固定面。該模具包括模仁及模腔，該模仁自該模腔中 露出，具有奈米級特徵尺寸的微細結構。該壓印頭及加 熱裝置分別設於該模具的上方及下方。該壓印面設有導 氣孔。該導氣孔孔徑與該模腔口徑匹配。該真空發生裝 置與該導氣孔相通，用於藉由該導氣孔於該壓印頭内產 生吸附力。 一種奈米壓印方法，包括：於模具的模腔内填充塑膠料 ;利用加熱裝置於模具下方加熱模具至該塑膠料形成熔 融體；利用真空發生裝置於壓印頭内產生的吸附力將支 撐片固定於該壓印頭；及利用該壓印頭將該支撐片壓至 該熔融體，並使該支撐片封閉該模腔。 相較於習知技術，本技術方案的奈米壓印裝置及奈米壓 印方法採用真空發生裝置於壓印頭内產生吸附力來固定 支撐片，避免支撐片移位。另，該導氣孔孔徑與模腔口 徑匹配，支撐片與該導氣孔相對應的部分不承受壓力， 進一步可避免支撐片破碎。 【實施方式】 本技術方案提供的奈米壓印裝置及奈米壓印方法適用於 藉由模壓工藝製作具有支撐片的光學元件及半導體元件 。為便於理解，以下以製作帶有支撐片的菲涅爾透鏡為 099114771 表單編號Α0101 第5頁/共16頁 0992026210-0 201139115 例，對該奈米壓印裝置及奈米壓印方法進行詳細說明。 [0010] 參見圖1，本技術方案一實施方式提供的奈米壓印裝置 100包括承載台10、模具20、加熱裝置30、壓印頭40及 真空發生裝置50。 [0011] 承載台10具有承載面11。該承載面11用於承載模具20。 [0012] 模具20具有模壓面21、模腔22、模仁23及支撐部24。模 腔22由模壓面21朝模具20内部開設。支撐部24環繞模腔 22。模仁23自該模腔22中暴露出。模仁23具有奈米級特 徵尺寸的微細結構231，該微細結構231與待生產的菲涅 爾透鏡的光學結構一致。模具20可移動地設於承載面11 〇 [0013] 加熱裝置30設於承載台10下方，用於加熱模具20。 [0014] 壓印頭40設於承載台10上方，並與承載面11相對。壓印 頭40具有壓印面41、與壓印面41相對的固定面42及階梯 狀通孔43。壓印面41與承載面11相對。固定面42用於與 驅動裝置（圖未示）相連，以使壓印頭40於該驅動裝置 驅動下朝靠近或遠離該承載面11的方向運動。通孔43包 括導氣孔431及連通孔432。導氣孔431自壓印面41的中 心區域朝靠近固定面42的方向開設，其口徑與模具20的 模腔22的口徑匹配。連通孔432貫通固定面42，並與導氣 孔431相通，其孔徑小於導氣孔431的口徑。由此，連通 孔432與導氣孔431配合貫通壓印面41及固定面42。 [0015] 真空發生裝置50包括導氣管51及與導氣管51相通的真空 發生器52。導氣管51的一端與連通孔432相通，另一端與 099114771 表單編號A0101 第6頁/共16頁 0992026210-0 201139115 該真空發生器52相通。直★级α 真二發生益52用於藉由導氣管51 於導礼孔431處產生吸附力。 [0016] Ο 及圖2，採用本實施方式提供的奈米壓印 _製作菲㈣透鏡時，需將模具20置於承載台10的 面11純具20的模腔22内填充塑膠料，利用加執 置30加熱該塑膠料至形魏融體。將支樓片60置於模 具2〇的切部24，並封閉該模腔22。該支樓片可為玻璃 片或其他透明度㊉的材料。驅動壓印頭獅切片⑽運 動直到愿印頭40的壓印每41與支撐片⑽接觸，開啟真 工發生器52 ’則支.片6〇將因吸附力誠義^於壓印 面4卜繼續壓緊支樓片60及模具2〇，貝,!部分炫融體將被 壓入模仁23内，其餘部分祕_成與㈣22相同的形 狀及尺寸，待該熔融體冷卻固化，移去模具2〇，則製得 附有支撑片60的菲淫爾透鏡。 [0017] 〇 本實施方式的奈米壓印裝置1〇〇利用真空辞生裝置5〇產生 的吸附力吸附支撐片，可避免支撐片6〇於奈米壓印過程 中移位《另，模具20的模腔22的口徑與壓印頭4〇的導氣 孔431的口徑匹配，壓印頭4〇的壓力直接施於模具2〇的支 撐部24對應的部分支撲片6〇，該部分支撐片6〇被支揮部 24支撐，而與模腔22對應的部分支撐片60不承擔壓力， 進一步地避免了支撐片60破碎。 [0018] 請參見圖3，本技術方案另一實施方式提供的奈米壓印裝 置200包括承載台210、模具220、加熱裝置230、壓印頭 240、真空發生裝置250及環形墊圈260。其中，模具220 、壓印頭240及真空發生裝置250的結構與模具20、壓印 099114771 表單編號A0101 第7頁/共16頁 0992026210-0 201139115 頭40及真空發生裝置50的結構相同。加熱裝置230收容於 承載台210内，並臨近承載面211。環形墊圈260固定於 壓印頭240的壓印面241，其内徑與壓印頭240的導氣孔 243的口徑匹配。環形墊圈260環繞導氣孔243。於奈米 壓印時，支撐片於真空發生裝置250產生的吸附力的作用 下固定於該環形墊圈260。 [0019] 請參見圖4，本技術方案再一實施方式提供的奈米壓印裝 置300包括承載台310、模具320、加熱裝置330、壓印頭 340、真空發生裝置350及環形墊圈360。其中，模具320 及真空發生裝置350的結構與模具20及真空發生裝置50的 結構相同。壓印頭340的導氣孔344直徑恆定，其直接貫 通壓印面341及固定面342。環形墊圈360固定於壓印頭 340的壓印面341，其内徑與模具320的模腔322的口徑匹 配。於奈米壓印時，支撐片於真空發生裝置350產生的吸 附力的作用下固定於該環形墊圈360。 [0020] 綜上所述，本發明確已符合發明專利之要件，遂依法提 出專利申請。惟，以上所述者僅為本發明之較佳實施方 式，自不能以此限製本案之申請專利範圍。舉凡熟悉本 案技藝之人士援依本發明之精神所作之等效修飾或變化 ，皆應涵蓋於以下申請專利範圍内。 【圖式簡單說明】 [0021] 圖1為本技術方案一實施方式提供的奈米壓印裝置的示意 圖。 [0022] 圖2為採用圖1所示奈米壓印裝置製作菲涅爾透鏡的示意 圖。 099114771 表單編號 A0101 第 8 頁/共 16 頁 0992026210-0 201139115 [0023] 圖3為本技術方案另一實施方式提供的奈米壓印裝置的示 意圖。 [0024] 圖4為本技術方案再一實施方式提供的奈米壓印裝置的示 意圖。 [0025] 【主要元件符號說明】 奈米壓印裝置：100、200、300 [0026] 承載台：10、210、310 [0027] Ο [0028] 模具：20、220、320 加熱裝置：30、230、330 [0029] 壓印頭：40、240、340 [0030] 真空發生裝置：50、250、350 [0031] 承載面：11、211 [0032] 模壓面：21 [0033] Ο 模腔：22、322 [0034] 模仁：23 [0035] 支撐部：24 [0036] 微細結構：231 [0037] 壓印面：41、241、341 [0038] 固定面：42、342 [0039] 通孔：43 099114771 表單編號Α0101 第9頁/共16頁 0992026210-0 201139115 [0040]導氣孔：431、243、344 [0041] 連通孔：432 [0042] 導氣管：51 [0043] 真空發生器：52 [0044] 支撐片：60 0992026210-0 099114771 表單編號A0101 第10頁/共16頁201139115 VI. Description of the Invention: [Technical Field] The present invention relates to the field of hot stamping technology, and more particularly to a nanoimprinting apparatus and a nanoimprinting method. [Previous Technology " [0002] Nano-embossing refers to pressing a mold having a nano-sized feature size into a molten plastic by a certain pressure, and the plastic is cooled or solidified, that is, the microstructure After the setting, the mold was removed to obtain a product having a nano-scale microstructure. In recent years, nanoimprint technology has been widely used to fabricate semiconductor components and optical components. [0003] Generally, a solar concentrating system uses a Fresnel lens to condense sunlight, and a wafer is used to convert the concentrated sunlight into electric energy. Fresnel lenses are generally made of plastic and have poor weatherability. A support sheet or other highly transparent sheet is usually attached to the Fresnel lens surface as a support sheet to increase the life of the Fresnel lens. Correspondingly, when the Fresnel lens is produced by the nano imprinting technology, the mold is placed on the carrying table, and the plastic is placed in the mold cavity, and the micro-structure of the nano-scale feature size is formed in the cavity, which will support The sheet is placed on the plastic surface to close the cavity, the heating head is used to heat the imprint head, and then the high temperature imprint head is used to press the support sheet. During the imprinting process, the plastic will form a melt and the support sheet will be integral with the molten plastic. However, the support piece is easy to slide relative to the plastic, and the distribution of the pressure on the support piece is larger in the middle and the edge is smaller. This causes the intermediate portion of the support sheet to be easily crushed. In view of the above, it is necessary to provide a nanoimprinting apparatus and a nanoimprinting method to avoid displacement and crushing of the support sheets. 099114771 Form No. A0101 Page 4 / Total 16 Page 0992026210-0 201139115 [0005] [0007] [0007] [0008] [0009] [Embodiment] Hereinafter, an embodiment is taken as an example to avoid displacement of a support sheet And crushed nano imprinting device and nano imprinting method. A nanoimprinting apparatus comprising an imprint head, a mold, a heating device, and a vacuum generating device. The stamping head includes a stamping surface and a fixing surface opposite the stamping surface. The mold includes a mold core and a mold cavity, and the mold core is exposed from the mold cavity, and has a fine structure of a nano-scale feature size. The stamping head and the heating device are respectively disposed above and below the mold. The embossed surface is provided with an air guiding hole. The air guide aperture is matched to the cavity diameter. The vacuum generating device communicates with the air guiding hole for generating an adsorption force in the imprinting head by the air guiding hole. A nanoimprinting method comprises: filling a plastic cavity in a cavity of a mold; heating the mold under the mold by using a heating device to form a molten body; and the adsorption force generated by the vacuum generating device in the imprinting head will support a sheet is fixed to the stamping head; and the sheet is pressed to the melt by the stamping head, and the sheet is closed by the sheet. Compared with the prior art, the nanoimprinting device and the nanoimprinting method of the present invention use a vacuum generating device to generate an adsorption force in the imprinting head to fix the supporting piece, thereby avoiding displacement of the supporting piece. In addition, the diameter of the air guiding hole is matched with the diameter of the cavity, and the portion of the supporting piece corresponding to the air guiding hole is not subjected to pressure, and the breaking of the supporting piece can be further avoided. [Embodiment] The nanoimprinting apparatus and the nanoimprinting method provided by the present technical solution are suitable for fabricating an optical element and a semiconductor element having a supporting sheet by a molding process. For ease of understanding, the following is a description of the nanoimprinting device and the nanoimprinting method by making a Fresnel lens with a supporting piece as 099114771 Form No. Α0101, 5th page, and a total of 16 pages 0992026210-0 201139115. . Referring to FIG. 1, a nanoimprinting apparatus 100 according to an embodiment of the present invention includes a stage 10, a mold 20, a heating device 30, an imprint head 40, and a vacuum generating device 50. [0011] The carrier 10 has a bearing surface 11. This bearing surface 11 is used to carry the mold 20. [0012] The mold 20 has a molding surface 21, a cavity 22, a mold core 23, and a support portion 24. The cavity 22 is opened from the molding surface 21 toward the inside of the mold 20. The support portion 24 surrounds the cavity 22. The mold core 23 is exposed from the cavity 22. The mold core 23 has a nanostructure-sized fine structure 231 which is identical to the optical structure of the Fresnel lens to be produced. The mold 20 is movably disposed on the carrying surface 11 〇 [0013] The heating device 30 is disposed below the carrying table 10 for heating the mold 20. [0014] The stamping head 40 is disposed above the carrier 10 and opposite to the carrying surface 11. The embossing head 40 has a embossing surface 41, a fixing surface 42 opposed to the embossing surface 41, and a stepped through hole 43. The embossed surface 41 is opposed to the carrying surface 11. The fixing surface 42 is for connection to a driving device (not shown) to move the stamping head 40 in a direction toward or away from the bearing surface 11 under the driving of the driving device. The through hole 43 includes an air guiding hole 431 and a communication hole 432. The air guiding hole 431 is opened from the central region of the stamping surface 41 toward the fixing surface 42, and its diameter matches the diameter of the cavity 22 of the mold 20. The communication hole 432 penetrates the fixing surface 42 and communicates with the air guiding hole 431, and has a smaller hole diameter than the diameter of the air guiding hole 431. Thereby, the communication hole 432 and the air guide hole 431 are fitted through the embossing surface 41 and the fixing surface 42. [0015] The vacuum generating device 50 includes an air guiding tube 51 and a vacuum generator 52 that communicates with the air guiding tube 51. One end of the air guiding tube 51 communicates with the communication hole 432, and the other end communicates with the vacuum generator 52 with 099114771 Form No. A0101 Page 6 of 16 0992026210-0 201139115. The straight-stage α-true two-effect 52 is used to generate an adsorption force at the guide hole 431 by the air guiding tube 51. [0016] Ο and FIG. 2, when the nano embossing provided by the embodiment is used to make a phenanthrene (four) lens, the mold 20 is placed in the cavity 22 of the surface 11 of the carrier 10 and filled with a plastic material. The holder 30 heats the plastic material to form a shaped melt. The branch piece 60 is placed in the cut portion 24 of the mold 2, and the cavity 22 is closed. The slab can be a glass sheet or other material with a transparency of ten. Drive the embossed lion slice (10) to move until the embossing of the print head 40 is in contact with the support piece (10), and the ergonomic generator 52' is turned on. The piece 6 〇 will continue to press the embossed surface 4 due to the adsorption force. Tightly-supported floor piece 60 and mold 2〇, shell,! Part of the dazzling body will be pressed into the mold core 23, the rest of the secret _ into the same shape and size as (4) 22, the melt is cooled and solidified, remove the mold 2 Then, a Philippine lens with a support sheet 60 is prepared. [0017] The nanoimprinting apparatus 1 of the present embodiment adsorbs the support sheet by the adsorption force generated by the vacuum regenerative device 5, and can prevent the support sheet 6 from being displaced during the nanoimprinting process. The caliber of the cavity 22 of the 20 is matched with the diameter of the air guiding hole 431 of the imprinting head 4, and the pressure of the imprinting head 4 is directly applied to a portion of the supporting portion 24 corresponding to the supporting portion 24 of the mold 2, which supports The sheet 6 is supported by the branch portion 24, and the portion of the support sheet 60 corresponding to the cavity 22 is not subjected to pressure, further preventing the support sheet 60 from being broken. Referring to FIG. 3, a nanoimprinting apparatus 200 according to another embodiment of the present technology includes a carrying platform 210, a mold 220, a heating device 230, an imprinting head 240, a vacuum generating device 250, and an annular gasket 260. The structure of the mold 220, the embossing head 240, and the vacuum generating device 250 is the same as that of the mold 20, embossing 099114771, Form No. A0101, Page 7/16, 0992026210-0, 201139115. The heating device 230 is housed in the carrying platform 210 and adjacent to the bearing surface 211. The annular gasket 260 is fixed to the embossing surface 241 of the embossing head 240, and its inner diameter matches the diameter of the air guiding hole 243 of the embossing head 240. An annular gasket 260 surrounds the air guiding hole 243. At the time of imprinting, the support piece is fixed to the annular gasket 260 by the suction force generated by the vacuum generating device 250. Referring to FIG. 4, a nanoimprinting apparatus 300 according to still another embodiment of the present invention includes a carrying platform 310, a mold 320, a heating device 330, an imprinting head 340, a vacuum generating device 350, and an annular gasket 360. Among them, the structure of the mold 320 and the vacuum generating device 350 is the same as that of the mold 20 and the vacuum generating device 50. The air guiding hole 344 of the embossing head 340 has a constant diameter, and directly passes through the embossing surface 341 and the fixing surface 342. The annular gasket 360 is fixed to the embossing surface 341 of the embossing head 340, the inner diameter of which matches the caliber of the cavity 322 of the mold 320. At the time of nanoimprinting, the support piece is fixed to the annular gasket 360 by the suction force generated by the vacuum generating device 350. [0020] In summary, the present invention has indeed met the requirements of the invention patent, and the patent application is filed according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims. BRIEF DESCRIPTION OF THE DRAWINGS [0021] FIG. 1 is a schematic view of a nanoimprinting apparatus according to an embodiment of the present invention. 2 is a schematic view showing the fabrication of a Fresnel lens by using the nanoimprinting apparatus shown in FIG. 1. 099114771 Form No. A0101 Page 8 of 16 0992026210-0 201139115 [0023] FIG. 3 is a schematic diagram of a nanoimprinting apparatus provided by another embodiment of the present technical solution. 4 is a schematic view of a nanoimprinting apparatus provided by still another embodiment of the present technical solution. [Description of main component symbols] Nano imprinting device: 100, 200, 300 [0026] Carrier: 10, 210, 310 [0027] Mold: 20, 220, 320 Heating device: 30, 230, 330 [0029] Imprint head: 40, 240, 340 [0030] Vacuum generating device: 50, 250, 350 [0031] Bearing surface: 11, 211 [0032] Molded surface: 21 [0033] 模 Cavity: 22,322 [0034] Mold: 23 [0035] Support: 24 [0036] Fine structure: 231 [0037] Embossing surface: 41, 241, 341 [0038] Fixed surface: 42, 342 [0039] Through hole: 43 099114771 Form No. 1010101 Page 9 of 16 0992026210-0 201139115 [0040] Air vent: 431, 243, 344 [0041] Connecting hole: 432 [0042] Air pipe: 51 [0043] Vacuum generator: 52 [ 0044] Support: 60 0992026210-0 099114771 Form No. A0101 Page 10 of 16