TW201129692A - Cleaning composition of substrate for manufacturing flat panel display device - Google Patents

Cleaning composition of substrate for manufacturing flat panel display device

Info

Publication number
TW201129692A
TW201129692A TW099130902A TW99130902A TW201129692A TW 201129692 A TW201129692 A TW 201129692A TW 099130902 A TW099130902 A TW 099130902A TW 99130902 A TW99130902 A TW 99130902A TW 201129692 A TW201129692 A TW 201129692A
Authority
TW
Taiwan
Prior art keywords
substrate
flat panel
panel display
cleaning composition
display device
Prior art date
Application number
TW099130902A
Other languages
Chinese (zh)
Inventor
Hyo-Joong Yoon
Soon-Hong Bang
Sung-Sik Kim
Byoung-Mook Kim
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of TW201129692A publication Critical patent/TW201129692A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • C11D7/08Acids
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/36Organic compounds containing phosphorus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)

Abstract

Disclosed is an aqueous cleaning composition for use in cleaning the surface of a substrate for a flat panel display, which includes a boric acid component and one or more compounds selected from among organic phosphoric acids and salts thereof and which is highly capable of removing organic contaminants or particles generated on the substrate during the manufacturing of the flat panel display, and is very effective in preventing corrosion of metal wiring formed on the substrate. The aqueous cleaning composition includes a large amount of deionized water and thus is easy to handle and is environmentally friendly.
TW099130902A 2009-09-11 2010-09-13 Cleaning composition of substrate for manufacturing flat panel display device TW201129692A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20090086045 2009-09-11
KR1020100088419A KR20110028239A (en) 2009-09-11 2010-09-09 Rinsing composition of substrate for manufacturing flat panel display device

Publications (1)

Publication Number Publication Date
TW201129692A true TW201129692A (en) 2011-09-01

Family

ID=43934697

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099130902A TW201129692A (en) 2009-09-11 2010-09-13 Cleaning composition of substrate for manufacturing flat panel display device

Country Status (3)

Country Link
KR (1) KR20110028239A (en)
CN (1) CN102575201B (en)
TW (1) TW201129692A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI514453B (en) * 2013-05-09 2015-12-21 Ecocera Optronics Co Ltd Method for manufacturing and cleaning a substrate

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107004575A (en) * 2014-06-04 2017-08-01 恩特格里斯公司 ARC cleaning and post-etch residue with metal, dielectric and nitride compatibility remove constituent
CN107346095B (en) * 2017-09-14 2020-12-22 江阴江化微电子材料股份有限公司 Semiconductor process positive photoresist degumming liquid and application
CN108169939A (en) * 2018-01-19 2018-06-15 京东方科技集团股份有限公司 Liquid crystal display substrate cleaning method, the method for forming oriented layer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4752270B2 (en) * 2002-11-08 2011-08-17 和光純薬工業株式会社 Cleaning liquid and cleaning method using the same
KR100664403B1 (en) * 2005-01-31 2007-01-03 테크노세미켐 주식회사 Composition for Cleaning Etch Residue and Cleaning Method of using the same
KR20080111268A (en) * 2007-06-18 2008-12-23 동우 화인켐 주식회사 Cleaning solution composition and cleaning method using the same
WO2009078123A1 (en) * 2007-12-17 2009-06-25 Sanyo Chemical Industries, Ltd. Cleaning agent and cleaning method for electronic material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI514453B (en) * 2013-05-09 2015-12-21 Ecocera Optronics Co Ltd Method for manufacturing and cleaning a substrate

Also Published As

Publication number Publication date
KR20110028239A (en) 2011-03-17
CN102575201A (en) 2012-07-11
CN102575201B (en) 2014-07-09

Similar Documents

Publication Publication Date Title
MY157114A (en) Silicon polishing compositions with high rate and low defectivity
WO2011019189A3 (en) Resist stripping solution composition, and method for stripping resist by using same
MY165726A (en) Cleaning liquid composition for electronic device
SG168509A1 (en) Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
EP2592131A3 (en) Aqueous cerium-containing solution having an extended bath lifetime for removing mask material
SG162680A1 (en) Wet clean compositions for cowp and porous dielectrics
EA201071150A1 (en) COMPLETE OF ORGANIC CORROSION INHIBITOR FOR ORGANIC ACIDS
WO2008137790A3 (en) Cleaning compositions containing water soluble magnesium compound and methods of using them
WO2009101588A3 (en) Use of activator complexes to enhance lower temperature cleaning in alkaline peroxide cleaning systems
IL180944A0 (en) Cleaning formulations
MY163201A (en) Silicon polishing compositions with improved psd performance
WO2011018756A3 (en) Use of activator complexes to enhance lower temperature cleaning in alkaline peroxide cleaning systems
MY171383A (en) Polishing liquid composition for wafers
TW201129692A (en) Cleaning composition of substrate for manufacturing flat panel display device
EP2580303A4 (en) Aqueous alkaline etching and cleaning composition and method for treating the surface of silicon substrates
WO2009072529A1 (en) Method and solution for washing substrate for semiconductor device
DOP2006000228A (en) ACID CLEANING COMPOSITIONS
EP2226834A3 (en) Method for physical force assisted cleaning with reduced damage
TW200620446A (en) Removing liquid and removing method of copper deteriorated layer containing copper oxide
WO2010055160A3 (en) Acid aqueous thiodiglycol ethoxylate composition and the use thereof in a method for etching metallic surfaces
BR112018015267A2 (en) Method and composition for removing dirt, labels and other adhesive material from a surface.
MX2011008787A (en) Multipurpose acidic, organic solvent based microelectronic cleaning composition.
MY146268A (en) Cleaning agent composition for electronic device substrate and electronic device substrate cleaning method
CN104498219A (en) Formula of rust remover for solar silicon wafer
IN2014DN02474A (en)