MY146268A - Cleaning agent composition for electronic device substrate and electronic device substrate cleaning method - Google Patents

Cleaning agent composition for electronic device substrate and electronic device substrate cleaning method

Info

Publication number
MY146268A
MY146268A MYPI20094029A MYPI20094029A MY146268A MY 146268 A MY146268 A MY 146268A MY PI20094029 A MYPI20094029 A MY PI20094029A MY PI20094029 A MYPI20094029 A MY PI20094029A MY 146268 A MY146268 A MY 146268A
Authority
MY
Malaysia
Prior art keywords
electronic device
device substrate
agent composition
cleaning agent
cleaning
Prior art date
Application number
MYPI20094029A
Inventor
Shingo Machida
Masahiro Arai
Original Assignee
Lion Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lion Corp filed Critical Lion Corp
Publication of MY146268A publication Critical patent/MY146268A/en

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Landscapes

  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

A CLEANING AGENT COMPOSITION FOR AN ELECTRONIC DEVICE THAT HAS SUPERIOR CLEANING PERFORMANCE EVEN WHEN COLLOIDAL SILICA IS USED FOR THE POLISHING MATERIAL AND IS ABLE TO ADEQUATELY REMOVE ABRASIVE PARTICLES AND POLISHING DEBRIS, AND AN ELECTRONIC DEVICE SUBSTRATE CLEANING METHOD, ARE PROVIDED. THE CLEANING AGENT COMPOSITION CONTAINS 0.01 TO 5.00% BY WEIGHT OF A COMPONENT (A) IN THE FORM OF A HYDROXIDE OF AN ALKALI METAL AND 0.10 TO 10.00% BY WEIGHT OF A COMPONENT (B) IN THE FORM OF A HYDROXYCARBOXYLIC ACID AND/OR SALT THEREOF, AND THE CONTENT OF SURFACTANT IS LESS THAN 1.00% BY WEIGHT.
MYPI20094029A 2008-10-02 2009-09-28 Cleaning agent composition for electronic device substrate and electronic device substrate cleaning method MY146268A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008257298 2008-10-02
JP2009184568A JP5518392B2 (en) 2008-10-02 2009-08-07 Electronic device substrate cleaning composition, and electronic device substrate cleaning method

Publications (1)

Publication Number Publication Date
MY146268A true MY146268A (en) 2012-07-31

Family

ID=42298432

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20094029A MY146268A (en) 2008-10-02 2009-09-28 Cleaning agent composition for electronic device substrate and electronic device substrate cleaning method

Country Status (3)

Country Link
JP (1) JP5518392B2 (en)
MY (1) MY146268A (en)
TW (1) TWI468511B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6050580B2 (en) * 2010-11-30 2016-12-21 三洋化成工業株式会社 Electronic material cleaner
TW201439312A (en) * 2012-11-16 2014-10-16 Lion Corp Method for cleaning semiconductor substrate and method for producing semiconductor substrate
JP2014141669A (en) * 2012-12-27 2014-08-07 Sanyo Chem Ind Ltd Cleaner for electronic material
JP2014141668A (en) * 2012-12-27 2014-08-07 Sanyo Chem Ind Ltd Cleaner for electronic material
CN106605291B (en) 2014-09-11 2020-05-05 株式会社德山 Method for cleaning aluminum nitride single crystal substrate and laminate
CN116323882A (en) * 2020-09-30 2023-06-23 福吉米株式会社 Polishing and cleaning method, cleaning agent, and polishing and cleaning kit
CN113755251A (en) * 2021-10-13 2021-12-07 常州智高化学科技有限公司 Substrate cleaning solution for water-based electronic material

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6110883A (en) * 1996-11-13 2000-08-29 The Procter & Gamble Company Aqueous alkaline peroxygen bleach-containing compositions
EP0906950A1 (en) * 1997-10-03 1999-04-07 The Procter & Gamble Company Peroxygen bleach-containing compositions comprising a particular chelating agent system
TWI276682B (en) * 2001-11-16 2007-03-21 Mitsubishi Chem Corp Substrate surface cleaning liquid mediums and cleaning method
JP2005251936A (en) * 2004-03-03 2005-09-15 St Lcd Kk Chemical treatment apparatus
JP4912791B2 (en) * 2006-08-21 2012-04-11 Ｊｓｒ株式会社 Cleaning composition, cleaning method, and manufacturing method of semiconductor device

Also Published As

Publication number Publication date
JP2010109329A (en) 2010-05-13
TW201022432A (en) 2010-06-16
JP5518392B2 (en) 2014-06-11
TWI468511B (en) 2015-01-11

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