201128320 發明說明： 【發明所屬之技術區域】 本發明係關於一種具備有在與泰 直之面内排列設置有複數個集光鏡光軸約略垂 eye lens)的雷射曝光裝置，詳細說 /透鏡 繩眼透鏡所產生之雷射光干料 關於一種能將 之照斑而可均勾地進行曝光的雷射曝光裝 1降低雷射光 【先前技術】 習知雷射曝光裝置中，為了壤+ 】°畏雷射光能均勻地照射 至被曝光體，會使用讓雷射光直#_ ’ ,、 ^ k頰大的擴束器（beam expander)以及讓直徑擴大後之雷射光之強度分布均勻 化用的繩喊鏡等光學積分H等。再者，為了降低因雷 射光之同娜(⑶hew ;可干涉性）而導致蝇眼透鏡之 穿透光線干涉所產生的干較，會在擴束器與繩眼透鏡 之間設置光學路徑差調整組件(例如，參考日本專利特 開2004-12757號公報）。 但疋，於月ό述習知雷射曝光裝置中，由於光學路徑 差調整組件僅設置在擴束器與蠅眼透鏡之間，並無法完 全地去除蠅眼透鏡之穿透光線造成之干涉紋，僅存之干 涉紋會產生被曝光體上之照斑，而難以形成微細之圖樣 【發明内容】 201128320 於是’對應前一題點，本發明之 能將蠅眼透鏡魅4科光干練平均化，ί降低ί 射光之照斑而可均句地進行曝光的雷射曝光裝置田 為了達成前述目的，本發明之雷㈣林置且備有 :雷射光源’係放射出雷射光⑼繩眼透鏡 該雷射光狀光軸約略#直之面_列有 透鏡，可將能光_直之面_光強度分布均^匕， 且在先將射出光1¾光之後，呈放射狀發散以擴大雷射 光之截面形狀，聚光透鏡，係將經該第丨繩眼透鏡而射 出之截面形狀擴大彳4的雷射光變為平行光；第2塊眼透 鏡’係設置於該聚光魏之光行進方向下游侧，在與該 光轴約略垂直之面内排列有複數鱗位透鏡，將受至憎 射光所照射的光罩上之照明區域内之光強度分布均勻 化；擴散板，係設置於該第丨蠅眼透鏡與該聚光透鏡之 間’使雷射光擴散；以及透明之迴轉板，係設置於該第 2蠅眼透鏡之雷射光射出側，具有相對於該光軸呈傾斜 之面，且以該光軸為中心進行迴轉。 依前述結構，從雷射光源放射出雷射光，藉由在與 5亥雷射光源之光轴約略垂直之面内排列有複數個單位 透鏡的第1繩眼透鏡來讓垂直於前述光軸之面内的光強 度分布均勻化，並在先將射出光線聚光之後呈放射狀發 散而擴大雷射光的截面形狀，藉由聚光透鏡來讓經第j 蠅眼透鏡而射出之截面形狀擴大後的雷射光變為平行 光’藉由設置在該聚光透鏡之光行進方向下游侧而在與 201128320 立光輛为略垂直之面内排列有複數個透鏡的第2蠅眼透 來將受到雷射絲照射的光罩之照明區域内之光強 ς二布均勻化。此時，藉由設置在第㈣眼透鏡與聚光 、兄之間的擴散板，來讓雷射光擴散以將第2蠅眼透鏡 土所產生之雷射光干涉紋平均化，讓設置於第2繩眼透 :兄之田射光射出側且具有相對於該光轴呈傾斜之面的 透明迴轉板以光軸為中心進行迴轉，來使得光罩上之雷 射光照明區域產生微動進而讓雷射光干涉紋更加均勾田 化、。藉此，可讓蠅眼透鏡所產生之雷射光干涉紋平均化 :並降低雷射光之照斑而均勻地照明光罩。因此，可均 勻地進行曝光，而可輕易地對被曝綠實施微細圖樣之 曝光。又，第1蠅眼透鏡具有雷射光強度分布均勻化功 倉b與束徑擴大功能等兩者，而無需額外具備擴束器， 可減少邬杜個勃。 ' °。故 之 又，該第1蠅眼透鏡之複數個單位透鏡係讓雷射光 能量充分分散而使得由各單位透鏡所聚集之雷射光 不會讓空氣電漿化之程度的間距所排列設置。=此。 藉由第1繩眼透鏡之各單位透鏡來將雷射光&旦 月匕里充分^ 地分散，即使因各單位透鏡而使雷射光聚光，亦可防止 空氣被電漿化而可提高光利用效率。因此，士# ^ 田於無需為 了防止空氣之電漿化’而在藉由第1蠅眼透鏡讓 聚光之點附近處形成真空氛圍，故可簡化單罢七二i 、夏之、、、。構。 再者，第1蠅眼透鏡之各單位透鏡的排列間距， 所使用之蠅眼透鏡之各單位透鏡的排列間距還要,丨、了 201128320 約略一個位數，因此，即使從雷射光源所放射出之雷射 光之波形不均勻，亦可藉由前述第1蠅眼透鏡來達到均 勻化。藉此，可讓光罩上之照度分布更加均勻化。 再者，該擴散板係於表面隨機形成有微細凹凸圖樣 之毛玻璃狀的板。藉此，可將因擴散板而擴散之雷射光 的擴散角抑制於特定值。因此，可一邊將雷射光之擴散 角抑制於特定值，一邊讓第1蠅眼透鏡之各單位透鏡的 射出光之干涉紋平均化。 然後，該第2蠅眼透鏡係於平面内將排列有複數個 單位透鏡之一對的透鏡組相互對向設置，使得經該擴散 板擴散後而入射之擴散光的主光線能平行光軸般射出 。藉此，可藉由第2蠅眼透鏡將因擴散板而擴散之雷射 光收束並照射至光罩，可提向雷射光之利用效率。 又，當1次之曝光係複數次地發射該雷射光以進行 多重曝光之情況，從該多重曝光開始至結束為止，該迴 轉板至少會迴轉1圈。藉此，於雷射光每一次發射時讓 干涉紋移動以均勻地照射至光罩上的全部照射區域。 再者，更具備有另-個聚光透鏡，係於該迴轉板之 光行進方向下游側使得照射至該光罩的雷射光變為平 行光，且接近至該另-個聚光透鏡之射出側面處，可分 離般地設置有防止異物附著於該面處之透明保護板。藉 此’可防止例如感級之霧氣附著於另—個聚光透鏡表 面而造成鏡面起霧。此時，由於設置有可分離之保護板 ，故可輕易地將保護板取下進行清洗。因此，只需^期 6 201128320 地清洗保護板，便可經常地於固定條件下實施曝光，可 達成曝光之穩定化。 【實施方式】 以下，根據添附圖式來詳細說明本發明之實施形態 。圖1係本發明雷射曝光裝置之實施形態的前視圖。該 雷射曝光裝置係經由光罩而將雷射光照射至被曝光體 以進行曝光’其結構具備有雷射光源1、第1蠅眼透鏡2 、擴散板3、第1聚光透鏡4、第2繩眼透鏡5、迴轉板6 、第2聚光透鏡7以及保護板8。 前述雷射光源1係紫外線脈衝雷射振盪器，可使用 準分子雷射或YAG雷射等。 在前述雷射光源1之雷射光放射方向的前方係設置 有第1蠅眼透鏡2。該第1蠅眼透鏡2會將垂直於雷射光源 1光軸9之面内的光強度分布均勻化，且具有先將雷射光 聚光之後呈放射狀發散以擴大雷射光截面形狀的擴束 益之功此，其結構係在與雷射光光軸9約略垂直之面内 以例如約ΙΟΟμηι〜約300μηι之間距，將複數個微小單位 透鏡(集光鏡）以例如1〇〇個x1〇〇個之矩陣狀進行排列。 雷射光行進方向上，於前述第丨蠅眼透鏡2之下游側 β又置有擴放板3。该擴散板3係讓雷射光擴散，而使得經 第1蝇眼透鏡2之各單位透鏡射出的各雷射光在後述第2 蠅眼透鏡5上所干涉產生之干秋平均化，其結構為在 表面處隨機形成有5卿左右之微細凹凸圖樣的毛玻璃 201128320 狀之板。藉此，可將雷射光之擴散角抑制在例如1。左右 。另外’關於擴散板3之設置位置，可於第1蠅眼透鏡2 之後焦點位置與後述第1聚光透鏡4之間處任意選擇。 雷射光行進方向上，於前述擴散板3下游側設置有 第1聚光透鏡4。該第1聚光透鏡4係用以將經第1蠅眼透 鏡2射出且因擴散板3擴散呈放射狀的雷射光變為平行 光’其結構係在光線入射側呈平坦之平凸鏡，且設置而 使其前焦點位置與第丨蠅眼透鏡2之後焦點位置 約略一 致。 雷射光行進方向上’於前述第1聚光透鏡4下游側設 置有第2繩眼透鏡5。該第2蠅眼透鏡5係在垂直於第1聚 光透鏡4光軸9之面内以例如數爪爪間距，將將複數個單 位透鏡(集光鏡)排列呈矩陣狀，使得受到雷射光所照射 的光罩12之照明區域内之光強度分布均勻化，其結構係 將於平面内排列有複數個單位透鏡之一對的透鏡組對 向设置，使得因擴散板3呈擴散狀入射的擴散光之主光 線會平行光轴9般射出。 具體說明，如圖2所示，第2蠅眼透鏡5之結構係由 设置在光行進方向上游側之第丨透鏡組丨〇與設置在下游 側之第2透鏡組11所組成，各透鏡組1〇、u之相對應的 單位透鏡10a、11a之光軸會形成一致。此時，第2透鏡 ，11之單位透鏡11a之前焦點位置會與第丨蠅眼透鏡2之 單位透鏡10a之曲面約略頂點位置形成一致。藉此，因 擴散板3呈擴散狀入射至第丨透鏡組1〇的擴散光（雷射光 8 201128320 13)之主光線便可因第2透鏡組1 i而變為平行光軸9般射 出。因此，可藉由第2蠅眼透鏡5來將因擴散板3呈擴散 狀之雷射光13收束並歸至光罩12,而可提高雷射光13 之利用效率。 另外第1及第2透鏡組10、11為相同結構之情況， 由於第1透鏡組10之後焦點位置會與第2透鏡組11之單 位透鏡11a之曲面約略頂點位置形成一致，而會有由第丄 透鏡組1G所聚光之雷射糾造成第2透鏡組11損傷之虞 。因此，作為第1透鏡組之單位透鏡10a，可選用焦點 距離較第2透鏡組11之單位透鏡11a更長或更短者，以避 免雷射光13聚光於第2透鏡組n上。 雷射光13行進方向上，於前述第2蠅眼透鏡5下游側 设置有f轉板6。該迴轉板6係用以讓光罩12上之雷射光 13照明區域14(參考圖3(b))產生微動，使得經第2蠅眼透 銃5之複數個單位透鏡Ua射出之雷射光丨3干涉所產生 之干j歩紋平均化（變得較不明顯），其結構具有相對於光 軸9呈傾斜之面6a，且能以該光軸9為中心進行迴轉之透 明石英板所組成。 /、體况明，如圖3(a)所示，係光線射出側之面如相 對二垂直灿9之面傾斜呈丨。左右之即所·楔形基板 藉此入射進迴轉板6的雷射光13會因射出侧之傾斜 面6a而呈f曲狀射出，光罩12上之雷射光咖明區域（ 圖3⑻中斜線區域）14的中心便會從照射區域15(圖3(b) 中虛線包圍之區域）的中心〇朝側邊偏移。因此，於此狀 9 201128320 態下讓迴轉板6以光軸9為中心進行迴轉，則雷射光13 之照明區域14便會以照射區域15之中心〇為軸心於圖 3(b)所示虛線包圍區域内呈繞圓運動般移動，而藉由雷 射光13來將照射區域15之全區域進行照明。另外，圖3(b) 箭頭所示虛線係當迴轉板6於1次迴轉中，照明區域14 之中心所描繪出的執跡。 此時，當1次之曝光係複數次地發射雷射光13以進 行多重曝光之情況，從多重曝光開始至結束為止，至少 會讓迴轉板6迴轉1圈的方式來進行迴轉控制。藉此， 讓雷射光13照射於光罩12上之照射區域15而不會過與 不及。 雷射光13行進方向上，於前述迴轉板6下游側設置 有第2聚光透鏡7。該第2聚光透鏡7係用以將經第2蠅眼 透鏡5射出之雷射光13變為平行光，並使其垂直入射進 光罩12，其結構係由二片平凸鏡7&、7b組成，而使其前 焦點位置與第2绳眼透鏡5之後焦點位置約略一致般設 置。 ^ ^ --------心乐无远鏡7之射出側之面而可分 般ΐΓΐ有保護板8。該保護板8係用以防止例如感i :務：焱異物附著於第2聚光透鏡7表面而造成鏡面 ‘透明石英基板。另外，圖1中，符1 „彎曲用的平面反射鏡。㈣16 ，說明前述結構之雷射曝光裝置的動作。 h ^光源1所放射出的雷射光13會受到二片1 201128320 反射鏡16、Π之反射’而入射進第1蠅眼透鏡2。接著， 經第1蠅眼透鏡2之複數個微小單位透鏡射出的複數個 雷射光13會各自於各單位透鏡之後焦點處聚光後呈放 射狀發散。 此時，由於第1蠅眼透鏡2之各單位透鏡係以約 1 ΟΟμιη〜約3〇〇μηι之微小間距呈矩陣狀排列，即使從雷 射光源1所放射出的雷射光13之波形會例如圖4(a)所示 般不均勻，在經第1蠅眼透鏡2射出之時點便會混合而如 圖4(b)所示般約略地均勻化。再者，由於雷射光13之能 量會因多數個微小單位透鏡而分散，即使雷射光13因單 位透鏡而聚光亦不會讓空氣電漿化。因此，無需擔心因 電聚化空氣讓雷射光13不規則反射而降低照射至光罩 12的雷射光13之輝度。 經第1蠅眼透鏡2呈放射狀射出而發散的雷射光13 會入射進於表面處隨機形成有5μπι左右之微細凹凸圖 樣的毛玻璃狀之板所組成的擴散板3。該擴散板3會將入 射之雷射光13的擴散角抑制於丨。左右並擴散。藉此，經 第1蝇眼透鏡2之各單位透鏡射出，而於第2麵眼a透鏡$ 之入射側之面上形成干涉之雷射光13干涉紋會被平均 化。又’由於雷射光13之擴散角被抑制於丨。左右，可抑 制雷射光13過度之發散’故可讓從雷射光源说射出之 約略全部雷射光13有效地用來照明至光罩。 經擴散板3射出之放射狀雷射光13會笋 透鏡4變為平行光之後，入射進第2蠅眼透“第2 201128320 繩眼透鏡5中，因擴散板3擴散而入射進第1透鏡組10之 單位透鏡l〇a的擴散光（雷射光13)會如圖2所示般’藉由 第2透鏡組11之對應的單位透鏡lla來讓其主光線變得 平行於光軸9。藉此，因擴散板3擴散之擴散光會受到第 2蠅眼透鏡5之收束’而可有效地用來照明至光罩12。 經第2蠅眼透鏡5射出之雷射光13會入射進迴轉板6 ，而如圖3(a)所示般，於相對光軸9呈傾斜狀設置之射出 側之面6a處彎曲後，因第2聚光透鏡7變為平行光而約略 垂直地入射進光罩12。藉此，光罩12上之雷射光13照明 區域14會如圖3(b)所示’其中心會從光罩12之照射區域 15的中心Ο朝侧邊偏移。此時，由於迴轉板6會以光車由9 為中心進行迴轉’故雷射光13之照明區域14會以照射區 域15之中心0為轴心而呈繞圓運動般移動。藉此，能將 雷射光13照射至照射區域15之全部區域。 另外，當1次之曝光係複數次地發射雷射光13以進 行多重曝光之情況，從多重曝光開始至結束為止，至少 會讓迴轉板6迴轉1圈的方式來進行迴轉控制，故可讓雷 射光13照射於光罩π上之照射區域15而不會過與不及。 如此一來，可讓經第2蠅眼透鏡5之複數個單位透鏡 lla射出之各雷射光13之干涉而於光罩12上所產生的干 涉紋平均化，而變得較不明顯。因此，可將雷射光13 均勻地照射至光罩12上之照射區域15全域，可將光罩12 之i細圖樣南精度地曝光至被曝光體上。 另外，前述實施形態雖係針對藉由第2聚光透鏡7 12 201128320 來讓經第2繩眼透鏡5射出之雷射光13變為平行光之情 況來進行說明’但本發明不限於此，亦可在平面反射鏡 18之位置處設置準直鏡(〇〇11丨11131;丨〇11111丨1：1'〇1^)，以取代第2 聚光透鏡7。此時，準直鏡之前焦點位置可與第2蠅眼透 鏡5之後焦點位置約略形成一致。 【圖式簡單說明】 圖1係本發明雷射曝光裝置之實施形態的前視圖。 圖2係前述雷射曝光裝置所使用之第2蠅眼透鏡主 要部分結構之放大剖面圖。 圖3(a)、（b)係前述雷射曝光裝置所使用之翅轉板的 形狀及其功能說明圖。 圖4係雷射光之波形(profiie)的說明圖’（a)|員示從雷 射光源放射出之雷射光波形之一範例，（b)顯示麵第1蠅 眼透鏡均勻化後之波形之範例。 【主要元件符號說明】 1 雷射光源 2 第1蠅眼透鏡 3 擴散板 4 第1聚光透鏡 5 第2蠅眼透鏡 6 迴轉板 6a 傾斜面 201128320 7 第2聚光透鏡 7a、7b 平凸鏡 8 保護板 9 光軸 10 第1透鏡組 10a 單位透鏡 11 第2透鏡組 11a 單位透鏡 12 光罩 13 雷射光 14 照明區域 15 照射區域 16、17、18 反射鏡 14201128320 DESCRIPTION OF THE INVENTION: Technical Field According to the Invention The present invention relates to a laser exposure apparatus having a plurality of concentrating eye lenses arranged in a plane with a straight surface, in detail, a lens rope The laser light dry material produced by the eye lens reduces the laser light with respect to a laser exposure apparatus capable of exposing it to the spotlight. [Prior Art] In the conventional laser exposure apparatus, for the soil + The laser light is uniformly irradiated onto the object to be exposed, and a beam expander that makes the laser light straight #_ ' , ^ k cheek and a rope that equalizes the intensity distribution of the laser light after the diameter is enlarged are used. Shouting mirrors and other optical integrals H and so on. Furthermore, in order to reduce the dryness caused by the interference of the penetrating light of the fly-eye lens due to the contrast of the laser light ((3) hew; interferability), an optical path difference adjustment is provided between the beam expander and the eye lens. A component (for example, refer to Japanese Patent Laid-Open Publication No. 2004-12757). However, in the conventional laser exposure apparatus, the optical path difference adjustment component is only disposed between the beam expander and the fly-eye lens, and the interference pattern caused by the penetration of the fly-eye lens cannot be completely removed. The only interference pattern will produce the spot on the exposed body, and it is difficult to form a fine pattern. [Invention content] 201128320 So, corresponding to the previous question, the present invention can average the fly eye lens charm 4 In order to achieve the foregoing object, the laser device of the present invention is provided with a laser light source that emits laser light (9) The laser light axis of the lens is approximately #直面面_ listed with a lens, and the light intensity distribution can be lightly distributed, and after the light is emitted first, the light is diverged radially to expand the laser light. The cross-sectional shape of the condensing lens is such that the laser beam having the cross-sectional shape enlarged by the second eye lens is increased into 平行4, and the second lense lens is disposed on the downstream side of the traveling direction of the concentrating light. About with the optical axis A plurality of scaly lenses are arranged in the straight surface to uniformize the light intensity distribution in the illumination area on the reticle irradiated by the illuminating light; the diffusing plate is disposed on the cephalopod eye lens and the condensing lens The transparent light is diffused; and the transparent rotating plate is disposed on the laser light emitting side of the second fly's eye lens, and has a surface inclined with respect to the optical axis, and is rotated around the optical axis. According to the above configuration, the laser light is emitted from the laser light source, and the first eye lens is arranged with a plurality of unit lenses in a plane approximately perpendicular to the optical axis of the 5 Hz laser light source so as to be perpendicular to the optical axis. The light intensity distribution in the plane is uniformized, and the cross-sectional shape of the laser light is expanded after the light is concentrated, and the cross-sectional shape of the laser beam is enlarged by the condensing lens. The laser light becomes parallel light. The second fly eye, which is arranged on the downstream side of the light traveling direction of the condensing lens, and has a plurality of lenses arranged in a plane perpendicular to the 201128320 illuminator, will be subjected to lightning. The intensity of the light in the illumination area of the illuminating reticle is uniformized. At this time, the laser beam is diffused by the diffusion plate provided between the fourth eye lens and the condensing lens, and the laser light is diffused to average the laser light interference pattern generated by the second fly-eye lens soil. Rope-eye penetration: The transparent rotary plate with the light-emitting side of the brother's field and having an inclined surface with respect to the optical axis is rotated around the optical axis to cause micro-motion of the laser illumination region on the reticle to interfere with the laser light. The pattern is even more natural. Thereby, the laser light interference pattern generated by the fly's eye lens can be averaged: and the spot of the laser light is reduced to uniformly illuminate the mask. Therefore, the exposure can be performed uniformly, and the exposure of the fine pattern to the exposed green can be easily performed. Further, the first fly-eye lens has both the laser light intensity distribution uniformizing function b and the beam diameter expanding function, and the like, and it is not necessary to additionally have a beam expander, thereby reducing the number of sputum. ' °. Therefore, the plurality of unit lenses of the first fly's eye lens sufficiently disperse the laser light energy so that the laser light collected by each unit lens does not have a pitch at which the air is plasmated. = this. The laser light is uniformly dispersed by the unit lenses of the first rope lens, and even if the laser light is collected by each unit lens, the air can be prevented from being plasmaized and the light can be increased. usage efficiency. Therefore, Shi # ^ Tian does not need to create a vacuum atmosphere near the point where the first fly-eye lens is used to collect the light in order to prevent the plasmaization of the air, so it is possible to simplify the single stop, the second, the summer, the . Structure. Furthermore, the arrangement pitch of the unit lenses of the first fly's eye lens, the arrangement pitch of each unit lens of the fly-eye lens used is even more, and the number of bits is approximately one-digit, so that even if it is emitted from a laser light source, The waveform of the laser light is not uniform, and the uniformity can be achieved by the first fly-eye lens. Thereby, the illuminance distribution on the reticle can be made more uniform. Further, the diffusing plate is a frosted glass plate in which a fine uneven pattern is randomly formed on the surface. Thereby, the diffusion angle of the laser light diffused by the diffusion plate can be suppressed to a specific value. Therefore, it is possible to average the interference fringe of the light emitted from each unit lens of the first fly's eye lens while suppressing the diffusion angle of the laser light to a specific value. Then, the second fly-eye lens is arranged in a plane to face the lens groups in which one of the plurality of unit lenses is arranged opposite to each other, so that the principal rays of the diffused light incident through the diffusion plate can be parallel to the optical axis. Shoot out. Thereby, the laser light diffused by the diffusion plate can be bundled and irradiated to the reticle by the second fly-eye lens, and the utilization efficiency of the laser light can be improved. Further, when the exposure is performed for a plurality of times to perform multiple exposures, the revolving plate is rotated at least once from the start to the end of the multiple exposure. Thereby, the interference fringes are moved every time the laser light is emitted to uniformly illuminate the entire illuminated area on the reticle. Furthermore, a further concentrating lens is provided on the downstream side of the light traveling direction of the slewing plate such that the laser light irradiated to the reticle becomes parallel light and is close to the emission of the other concentrating lens At the side surface, a transparent protective plate for preventing foreign matter from adhering to the surface is provided separately. By this, it is possible to prevent the mist of the sense level from adhering to the surface of the other collecting lens to cause mirror fogging. At this time, since the detachable protective plate is provided, the protective plate can be easily removed for cleaning. Therefore, it is only necessary to clean the protective plate by using the method of 201128320, and the exposure can be performed under fixed conditions frequently, and the exposure can be stabilized. [Embodiment] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a front elevational view of an embodiment of a laser exposure apparatus of the present invention. The laser exposure apparatus irradiates laser light onto an object to be exposed through a mask to expose the laser light source 1 , the first fly-eye lens 2 , the diffusion plate 3 , and the first condensing lens 4 . 2 a rope lens 5, a rotary plate 6, a second condensing lens 7, and a protective plate 8. The aforementioned laser light source 1 is an ultraviolet pulse laser oscillator, and an excimer laser or a YAG laser can be used. The first fly's eye lens 2 is provided in front of the direction in which the laser light of the laser light source 1 is radiated. The first fly's eye lens 2 uniformizes the light intensity distribution perpendicular to the plane of the optical axis 9 of the laser light source 1, and has a beam expander that converges the laser light first to expand the cross section of the laser light. For this reason, the structure is such that, in a plane approximately perpendicular to the laser optical axis 9, for example, a distance between about ΙΟΟμηι and about 300 μm, and a plurality of micro unit lenses (light collecting mirrors) are, for example, 1 x x1 〇〇 Arranged in a matrix. In the direction of travel of the laser light, an expansion plate 3 is placed on the downstream side β of the aforementioned second eye lens 2 . The diffusing plate 3 diffuses the laser light, and the laser light emitted from each unit lens of the first fly's eye lens 2 is averaged by the interference generated by the interference of the second fly's eye lens 5, which is described later. A frosted glass 201128320-shaped plate with a fine uneven pattern of about 5 qing is randomly formed on the surface. Thereby, the diffusion angle of the laser light can be suppressed to, for example, one. Left and right. Further, the position where the diffusion plate 3 is placed can be arbitrarily selected between the focus position after the first fly-eye lens 2 and the first condensing lens 4 to be described later. In the direction in which the laser light travels, the first condensing lens 4 is disposed on the downstream side of the diffusing plate 3. The first condensing lens 4 is a plano-convex mirror in which the laser light that has been emitted through the first fly-eye lens 2 and is diffused by the diffusing plate 3 into a parallel light has a structure in which the light is incident on the light incident side. And it is set such that its front focus position is approximately coincident with the focus position after the second fly eye lens 2. The second eye lens 5 is disposed on the downstream side of the first condensing lens 4 in the direction in which the laser light travels. The second fly-eye lens 5 is arranged in a matrix shape such that a plurality of unit lenses (light collecting mirrors) are arranged in a matrix perpendicular to the optical axis 9 of the first collecting lens 4 so as to be subjected to laser light. The light intensity distribution in the illumination region of the irradiated reticle 12 is uniformized, and the structure is such that the lens groups in which a pair of a plurality of unit lenses are arranged in a plane are opposed to each other such that the diffusion plate 3 is diffused. The chief ray of the diffused light is emitted in parallel with the optical axis 9. Specifically, as shown in FIG. 2, the structure of the second fly-eye lens 5 is composed of a second lens group 设置 disposed on the upstream side in the light traveling direction and a second lens group 11 disposed on the downstream side, each lens group. The optical axes of the unit lenses 10a and 11a corresponding to 1〇 and u are formed to be uniform. At this time, the focus position of the unit lens 11a of the second lens 11 is matched with the approximate vertex position of the curved surface of the unit lens 10a of the second eye lens 2. Thereby, the chief ray of the diffused light (the laser light 8 201128320 13) which is diffused into the second lens group 1 扩散 in the diffusing plate 3 can be emitted as the parallel optical axis 9 by the second lens group 1 i. Therefore, the laser light 13 diffused by the diffusion plate 3 can be collected by the second fly-eye lens 5 and returned to the photomask 12, whereby the utilization efficiency of the laser light 13 can be improved. Further, in the case where the first and second lens groups 10 and 11 have the same configuration, the focus position after the first lens group 10 is aligned with the approximate vertex position of the curved surface of the unit lens 11a of the second lens group 11, and The laser condensed by the 丄 lens group 1G corrects the damage of the second lens group 11. Therefore, as the unit lens 10a of the first lens group, the focal length can be longer or shorter than that of the unit lens 11a of the second lens group 11, so that the laser light 13 can be prevented from being concentrated on the second lens group n. In the traveling direction of the laser light 13, the f-rotation plate 6 is provided on the downstream side of the second fly-eye lens 5. The rotating plate 6 is used to cause the laser light irradiation region 14 (refer to FIG. 3(b)) on the reticle 12 to be micro-motiond so that the laser beam emitted from the plurality of unit lenses Ua of the second fly-eye lens 5 is emitted. 3 The interference produced by the interference is averaged (less obvious), and the structure has a surface 6a inclined with respect to the optical axis 9, and can be formed by a transparent quartz plate which is rotated around the optical axis 9. . /, body condition, as shown in Fig. 3 (a), the surface of the light exit side is inclined like a face of the opposite two vertical can 9 . The left and right sides of the wedge-shaped substrate are incident on the slewing plate 6 by the inclined surface 6a on the emission side, and are projected in a f-curve shape, and the laser light-emitting area on the reticle 12 (the oblique line in Fig. 3 (8)) The center of 14 is offset from the center of the irradiation area 15 (the area surrounded by the broken line in Fig. 3(b)) toward the side. Therefore, in this state 9 201128320, the revolving plate 6 is rotated about the optical axis 9, and the illumination region 14 of the laser light 13 is centered on the center of the irradiation region 15 as shown in Fig. 3(b). The area enclosed by the dotted line moves in a circular motion, and the entire area of the illumination area 15 is illuminated by the laser light 13. In addition, the dotted line indicated by the arrow in Fig. 3(b) is the trace drawn by the center of the illumination area 14 when the rotary plate 6 is rotated once. At this time, when the exposure is performed for a plurality of times to perform the multiple exposure, the rotation control is performed so that at least one rotation of the rotary plate 6 is performed from the start to the end of the multiple exposure. Thereby, the laser light 13 is irradiated onto the irradiation region 15 on the reticle 12 without being overwhelmed. In the traveling direction of the laser light 13, a second condensing lens 7 is provided on the downstream side of the slewing plate 6. The second condensing lens 7 is configured to convert the laser light 13 emitted from the second fly's eye lens 5 into parallel light and vertically enter the reticle 12, and the structure is composed of two plano-convex mirrors 7&, 7b. The composition is set such that its front focus position is approximately the same as the focus position after the second eye lens 5. ^ ^ -------- Heart music does not have the side of the exit side of the far-end mirror 7 and can be divided into a protective plate 8. The protective plate 8 is used to prevent, for example, a foreign matter from adhering to the surface of the second condensing lens 7 to cause a mirror-shaped transparent quartz substrate. In addition, in Fig. 1, the symbol 1 for bending, (4) 16, explains the operation of the laser exposure apparatus of the above configuration. h ^The laser light 13 emitted by the light source 1 is subjected to two sheets 1 201128320 mirror 16, The reflection of the ' is incident on the first fly's eye lens 2. Then, the plurality of laser light 13 emitted by the plurality of micro unit lenses of the first fly's eye lens 2 are respectively condensed after the focus of each unit lens In this case, each unit lens of the first fly-eye lens 2 is arranged in a matrix at a minute pitch of about 1 ΟΟμηη to about 3〇〇μηι, even if the laser light 13 emitted from the laser light source 1 is emitted. The waveform is uneven as shown, for example, in Fig. 4(a), and is mixed at the time when the first fly's eye lens 2 is emitted, and is approximately uniform as shown in Fig. 4(b). Further, due to the laser light 13 The energy is dispersed by a plurality of tiny unit lenses, and even if the laser light 13 is concentrated by the unit lens, the air will not be plasmaized. Therefore, there is no need to worry about the irregular reflection of the laser light 13 due to the polymerization of the air. The luminance of the laser light 13 to the photomask 12. The laser beam 13 which is emitted radially by the first fly-eye lens 2 is incident on the diffusing plate 3 which is formed by a frosted glass plate having a fine uneven pattern of about 5 μm on the surface. The diffusing plate 3 will be incident. The diffusion angle of the laser beam 13 is suppressed by the 丨. The left and right sides are diffused. Thereby, the unit lenses of the first fly's eye lens 2 are emitted, and the interference surface is formed on the incident side of the lens 2 of the second face a. The interference pattern of the illuminating light 13 is averaged. In addition, since the diffusion angle of the laser light 13 is suppressed to 丨, the left and right of the laser light 13 can be suppressed from being excessively diverged, so that approximately all of the laser light 13 emitted from the laser light source can be made effective. The ground is used to illuminate the reticle. The radial laser light 13 emitted from the diffuser plate 3 is incident on the second lens, and then enters the second fly eye lens. The diffused light (the laser light 13) which is incident on the unit lens 10a of the first lens group 10 is diffused by the corresponding unit lens 11a of the second lens group 11 as shown in FIG. It is parallel to the optical axis 9. Thereby, the diffused light diffused by the diffusing plate 3 is condensed to the reticle 12 by the converging 'of the second fly's eye lens 5'. The laser light 13 emitted from the second fly's eye lens 5 is incident on the rotary plate 6, and as shown in Fig. 3(a), after being bent at the output side surface 6a which is inclined with respect to the optical axis 9, The second condensing lens 7 becomes parallel light and enters the reticle 12 approximately perpendicularly. Thereby, the illumination region 14 of the laser light 13 on the reticle 12 will be shifted from the center 照射 toward the side of the illuminating region 15 of the reticle 12 as shown in Fig. 3(b). At this time, since the rotary plate 6 is rotated about the light vehicle 9 from the center of the light, the illumination region 14 of the laser light 13 moves in a circular motion with the center 0 of the irradiation region 15 as the axis. Thereby, the laser light 13 can be irradiated to the entire area of the irradiation area 15. In addition, when the exposure is performed for a plurality of times to perform multiple exposures, the rotation control is performed at least one rotation of the rotary plate 6 from the start to the end of the multiple exposure, so that the lightning can be performed. The illuminating light 13 is irradiated onto the irradiation region 15 on the reticle π without being too far out of reach. As a result, the interference pattern generated on the mask 12 by the interference of the respective laser beams 13 emitted from the plurality of unit lenses 11a of the second fly's eye lens 5 can be made less uniform. Therefore, the laser light 13 can be uniformly irradiated to the entire area of the irradiation region 15 on the reticle 12, and the fine pattern of the reticle 12 can be accurately exposed to the object to be exposed. In the above-described embodiment, the case where the laser beam 13 emitted through the second eye lens 5 is converted into parallel light by the second condensing lens 7 12 201128320 will be described. However, the present invention is not limited thereto. A collimating mirror (〇〇11丨11131; 丨〇11111丨1:1'〇1^) may be provided at the position of the plane mirror 18 instead of the second collecting lens 7. At this time, the focus position before the collimator lens can be approximately coincident with the focus position after the second fly-eye lens 5. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front elevational view showing an embodiment of a laser exposure apparatus of the present invention. Fig. 2 is an enlarged cross-sectional view showing the structure of a main portion of a second fly-eye lens used in the above-described laser exposure apparatus. Fig. 3 (a) and (b) are views showing the shape and function of the fin rotating plate used in the above laser exposure apparatus. Fig. 4 is an explanatory diagram of a waveform of a laser light (profiie), an example of a laser light beam emitted from a laser light source, and (b) a waveform of a first fly eye lens uniformized on a display surface. example. [Main component symbol description] 1 Laser light source 2 First fly-eye lens 3 Diffuser plate 4 First concentrating lens 5 Second fly-eye lens 6 Swivel plate 6a Inclined surface 201128320 7 Second concentrating lens 7a, 7b Plano-convex mirror 8 Protective plate 9 Optical axis 10 First lens group 10a Unit lens 11 Second lens group 11a Unit lens 12 Light mask 13 Laser light 14 Illumination area 15 Irradiation area 16, 17, 18 Mirror 14