TW201120063A - Sugar derivative having a polymerizable group, and resist material using said sugar derivative - Google Patents

Sugar derivative having a polymerizable group, and resist material using said sugar derivative Download PDF

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TW201120063A
TW201120063A TW99128054A TW99128054A TW201120063A TW 201120063 A TW201120063 A TW 201120063A TW 99128054 A TW99128054 A TW 99128054A TW 99128054 A TW99128054 A TW 99128054A TW 201120063 A TW201120063 A TW 201120063A
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derivative
substituent
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Yoshitaka Uenoyama
Katsuki Ito
Hidetoshi Ono
Naoya Kawano
Miki Murakami
Shinji Tanaka
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Idemitsu Kosan Co
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07HSUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H13/00Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids
    • C07H13/02Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by carboxylic acids
    • C07H13/04Compounds containing saccharide radicals esterified by carbonic acid or derivatives thereof, or by organic acids, e.g. phosphonic acids by carboxylic acids having the esterifying carboxyl radicals attached to acyclic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07HSUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H9/00Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical
    • C07H9/02Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical the hetero ring containing only oxygen as ring hetero atoms
    • C07H9/04Cyclic acetals
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2041Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Saccharide Compounds (AREA)
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  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Materials For Photolithography (AREA)

Abstract

Provided are pyranose derivatives and furanose derivatives, depicted in formulas (I) through (V), of glucose, mannose, psicose, sorbose, tagatose, allose, altrose, gulose, idose, or talose. (In the formulas, M1 represents a specific polymerizable group.)

Description

201120063 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種可用於感光性樹脂等之具有聚合性 基之哌喃糖衍生物及呋喃糖衍生物及其製造方法等。 【先前技術】 在應用以ArF準分子雷射所爲之光微影技術的半導體 製造中,感光性光阻方面,係可使用使具有2-甲基-2-金剛 烷基甲基丙烯酸酯般的脂環式骨架之聚合性化合物共聚合 而成之聚合物(專利文獻1 )。 但是,伴隨著半導體製造技術的進步,且電路之微細 化顯著進步後的結果,使稱爲LER( line edge roughness) 、LWR ( line width roughness)的圖型表面粗度或波浪凸 起等平滑性問題更爲顯著。 又’近年來’以液浸曝光之方法中,主要用水作爲液 浸媒體’在此水中’溶入有光阻材料,而因此所導致的光 阻圖型的缺陷寺4顯像不良也時可散見,希望能盡早解決 此等缺陷。液浸曝光中,曝光時爲了避免光阻膜直接接觸 液體’係檢討有將保護膜(以下、稱爲「頂層被覆」)形 成於光阻膜上而從此頂層被覆的上方進行液浸曝光之方法 (專利文獻2 )。又,相對於此,從減少形成頂層被覆之 步驟的目的’亦檢討有無頂層被覆意即使光阻膜表面直接 液浸曝光之方法。此等任一方法中,爲了良好地進行曝光 並爲了提昇曝光機的液浸頭的掃瞄速度,頂層被覆或光阻 -5- 201120063 膜的表面希望爲疏水性。 〔先行技術文獻〕 〔專利文獻〕 〔專利文獻1〕特開平4-39665號公報 〔專利文獻2〕特開2005- 1 5 7259號公報 【發明內容】 本發明之目的在於提供一種可用爲光阻材料之糖衍生 物及其高分子化合物。 本發明者們發現,在單糖類中導入(環狀)脂肪族烴 基的基材其疏水性高,且玻璃轉移點高,當作爲光阻材料 來進行搭配時,光阻材料的疏水性會提昇,難以溶於液浸 媒體中,再者,缺陷會減低,且可改善粗糙度,遂完成本 發明。 根據本發明,係可提供以下單糖類衍生物及其製造方 法等。 1.—種下述以式(I)〜(V)所示之葡萄糖 '甘露糖 、阿洛酮糖、山梨糖、塔格糖、阿洛糖、阿卓糖、古洛糖 、艾杜糖、太洛糖之哌喃糖衍生物及呋喃糖衍生物。 201120063 【化1】[Technical Field] The present invention relates to a piperanose derivative and a furanose derivative which can be used for a polymerizable resin such as a photosensitive resin, a method for producing the same, and the like. [Prior Art] In the semiconductor manufacturing using photolithography technology using ArF excimer laser, in terms of photosensitive photoresist, it can be used to have 2-methyl-2-adamantyl methacrylate A polymer obtained by copolymerizing a polymerizable compound of an alicyclic skeleton (Patent Document 1). However, with the progress of the semiconductor manufacturing technology and the remarks of the refinement of the circuit, the smoothness of the surface roughness or wave bulge of the pattern called LER (line edge roughness) and LWR (line width roughness) is made. The problem is more significant. In the 'in recent years' method of immersion exposure, the main use of water as a liquid immersion medium 'in this water' is dissolved in a photoresist material, and thus the defect of the photoresist pattern is not good. Scattered, I hope to resolve these defects as soon as possible. In liquid immersion exposure, in order to prevent the photoresist film from directly contacting the liquid during exposure, a method of forming a protective film (hereinafter referred to as "top layer coating") on the photoresist film and performing liquid immersion exposure from above the top layer is reviewed. (Patent Document 2). On the other hand, from the viewpoint of reducing the step of forming the top layer coating, the method of whether or not the top layer is covered even if the surface of the photoresist film is directly immersed is also examined. In any of these methods, in order to perform the exposure well and to increase the scanning speed of the liquid immersion head of the exposure machine, the top layer coating or photoresist is desired to be hydrophobic on the surface of the film. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei-4-39665 (Patent Document 2) JP-A-2005-158 A sugar derivative of a material and a polymer compound thereof. The present inventors have found that a substrate in which a (cyclic) aliphatic hydrocarbon group is introduced into a monosaccharide has high hydrophobicity and a high glass transition point, and when used as a photoresist material, the hydrophobicity of the photoresist material is enhanced. It is difficult to dissolve in the liquid immersion medium, and further, the defects are reduced, and the roughness can be improved, and the present invention is completed. According to the present invention, the following monosaccharide derivatives, methods for producing the same, and the like can be provided. 1. The following glucose (mannose, psicose, sorbose, tagatose, allose, altrose, gulose, idose, represented by the formulas (I) to (V) , a glucopyranose derivative of trehalose and a furanose derivative. 201120063 【化1】

(IV) (V) 〔式中,R丨〜R4係獨立地表示氫、可含有 曰句雜原子及; 或取代基之脂肪族烴基、或可含有雜原子及/或 A 乂 基之 脂肪族環狀烴基,且Ri與R2及/或R_3與114亦可逋样 』您形成環 。惟,式(II) 、 ( V)中,Rl〜R4並無全爲甲基之情況 M,表示以下述式所示之基。 【化2】(IV) (V) wherein R丨~R4 independently represent hydrogen, may contain a haiku heteroatom; or an aliphatic hydrocarbon group of a substituent, or an aliphatic group which may contain a hetero atom and/or an A fluorenyl group A cyclic hydrocarbon group, and Ri and R2 and/or R_3 and 114 can also be used to form a ring. However, in the formulas (II) and (V), when R1 to R4 are not all methyl groups, M represents a group represented by the following formula. [Chemical 2]

(式中,R6、R7係獨立地表示氫、可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且R6與R7可一起形成羰基。 m、η係獨立地表示0以上4以下之整數。 201120063 η及/或m爲2以上時’複數的R6、R·7可各自相同或相異 〇 S表示0或1。 X表示下述以式(1)〜(3)之任一者所示的聚合性 基。 【化3】 〇 Re -C—C=CH2 (1) 价 CH\7H2 (2) r9 I -CH,-CH—CH, CH2-0 (3) (式中,R8表示氫原子、鹵素原子、甲基或鹵化甲基 ,且R9表示碳數1〜5之烴基))〕。 2.—種以下述式(VI )所示之半乳哌喃糖衍生物及果 哌喃糖衍生物、以式(V )所示之果哌喃糖衍生物、以式 (VII )或(IV )所示之半乳呋喃糖衍生物、以及以式( VIII )所示之果呋喃糖衍生物。 201120063 【化4】(wherein R6 and R7 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and R6 and R7 may together m and η are independently represented by an integer of 0 or more and 4 or less. 201120063 When η and/or m are 2 or more, 'the plural R6 and R·7 may be the same or different, and S represents 0 or 1. X represents The polymerizable group represented by any one of the formulas (1) to (3) is hereinafter referred to as 〇Re -C—C=CH2 (1) valence CH\7H2 (2) r9 I -CH,- CH-CH, CH2-0 (3) (wherein R8 represents a hydrogen atom, a halogen atom, a methyl group or a halogenated methyl group, and R9 represents a hydrocarbon group having 1 to 5 carbon atoms))]. 2. A galactose-paraffinose derivative and a carraghalose derivative represented by the following formula (VI), a pipose derivative represented by the formula (V), or a formula (VII) or The galactose furanose derivative shown by IV) and the fructose derivative represented by the formula (VIII). 201120063 【化4】

〔式中’ Ri〜R/t、Rii〜Ri4係獨立地表示氫、可含有 雜原子及/或取代基之脂肪族烴基、或可含有雜原子及/或 取代基之脂肪族環狀烴基’且1與112、^與!^、Ri^Ri2 及/或尺门與Rm亦可連結形成環。惟,式(V )之Ri〜^及 Rn〜R14並無全爲甲基之情況。 表示以下述式所示之基。 【化5】[In the formula, Ri to R/t and Rii to Ri4 independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent. And 1 and 112, ^ and! ^, Ri^Ri2 and/or the ruler door and Rm may also be joined to form a ring. However, the case where Ri~^ and Rn~R14 of the formula (V) are not all methyl groups. The base represented by the following formula is shown. 【化5】

(式中,R6、R7係獨立地表示氫 '可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且116與R7可一起形成羰基。 m、η係獨立地表示0以上4以下之整數。 -9 - 201120063 η及/或m爲2以上時’複數的R6、R7可各自相同或相異 〇 s表示0或1。 X表示下述以式(1 )〜(3 )之任一者所示的聚合性 基。 【化6】 〇 ReII I—〜 〇—CH2 价义—/⑶2 (1) (2) R9 I -CH2_CH-ch2 ch2-o (3) (式中,r8表示氣原子、鹵素原子、甲基或鹵化甲基 ,且R9表示碳數1〜5之烴基))〕。 3. 如1或2中記載之衍生物,其中,R1與R2及R3與R4、 或Rll與R12及Rl3與RM係連結而形成可含有雜原子及/或取 代基之金剛烷。 4. 如1或2中記載之衍生物,其中,Ri與R2及R3與R4、 或尺^與&12及R13與Rm係連結而形成金剛烷醇或金剛烷。 5. 如1〜.4中任一項所記載之衍生物,其中,X係以式 (1 )所示之聚合性基。 6. 如1〜5中任一項所記載之衍生物,其中’ m=0。 7. —種以下述式(IX)、式(X)、式(XI)、式( XXX )及式(XXXI )所示之葡萄糖、甘露糖、阿洛酮糠 、山梨糖、塔格糖、阿洛糖、阿卓糖、古洛糖、艾杜糖、 太洛糖之哌喃糖衍生物及呋喃糖衍生物。 -10- 201120063 【化7】(wherein R6 and R7 independently represent an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and 116 together with R7 The carbonyl group is formed by an integer of 0 or more and 4 or less. -9 - 201120063 When η and/or m are 2 or more, 'R6 and R7 of the plural number may be the same or different, and s represents 0 or 1. X The polymerizable group represented by any one of the following formulas (1) to (3) is shown. [Chemical 6] 〇ReII I-~ 〇-CH2 valence—/(3) 2 (1) (2) R9 I -CH2_CH -ch2 ch2-o (3) (wherein r8 represents a gas atom, a halogen atom, a methyl group or a halogenated methyl group, and R9 represents a hydrocarbon group having 1 to 5 carbon atoms))]. 3. The derivative according to 1 or 2, wherein R1 and R2 and R3 and R4, or R11 and R12 and Rl3 are bonded to RM to form adamantane which may contain a hetero atom and/or a substituent. 4. The derivative according to 1 or 2, wherein Ri and R2 and R3 and R4, or a ruthenium & 12 and R13 are bonded to Rm to form adamantyl alcohol or adamantane. 5. The derivative according to any one of 1 to 4, wherein X is a polymerizable group represented by formula (1). 6. The derivative according to any one of 1 to 5, wherein ' m = 0. 7. Glucose, mannose, aldose oxime, sorbose, tagatose, represented by the following formula (IX), formula (X), formula (XI), formula (XXX), and formula (XXXI), Allose, altrose, gulose, idose, a pentose sugar-halfose derivative and a furanose derivative. -10- 201120063 【化7】

(XXXI) 〔式中,1^〜114、Rn〜R|4係獨立地表示氫、可含有 雜原子及/或取代基之脂肪族烴基、或可含有雜原子及/或 取代基之脂肪族環狀烴基’且r@r2、Rii與Ri2 及/或R13與R!4亦可連結形成環。惟,阿洛糖、阿卓糖、葡 萄糖、甘露糖之哌喃糖衍生物及呋喃糖衍生物中,R , t〜 Rm並無全爲甲基之情況。又,式(XXXI)中,^^〜〜全 爲甲基時’並無尺1與112連結而形成環己院環之情況及r3與 R4連結而形成環己烷環之情況。 M3表示以下述式所示之基。 【化8】(XXXI) [wherein, 1^~114 and Rn~R|4 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic group which may contain a hetero atom and/or a substituent The cyclic hydrocarbon group 'and r@r2, Rii and Ri2 and/or R13 and R!4 may also be bonded to form a ring. However, in the case of allose, altrose, glucose, glucomannan, and a furanose derivative, R, t~Rm are not all methyl. Further, in the formula (XXXI), when ^^~~ is all methyl, there is no case where the rule 1 and 112 are joined to each other to form a ring-yard ring, and r3 and R4 are bonded to each other to form a cyclohexane ring. M3 represents a group represented by the following formula. 【化8】

式中’ R·6、R?係獨立地表示氫、可含有雜原子及/ -11 - 201120063 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且R6與R7可一起形成羰基。 m、η係獨立地表示〇以上4以下之整數。 η及/或m爲2以上時,複數的Re、R7可各自相同或相異 〇 s表示0或1。 L表示羥基、鹵素原子。 惟,式(XXX)中,S及m爲0而L爲羥基時,r,〜R4& 無全爲甲基之情況)〕。 8.—種以下述式(ΧΠ) 、(XXXI)所示之果哌喃糖 衍生物及以式(XIII)所示之果呋喃糖衍生物。 【化9】Wherein 'R·6, R? independently represents hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or -11 - 201120063 or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, And R6 and R7 may together form a carbonyl group. m and η independently represent an integer of 4 or more in 〇. When η and/or m is 2 or more, the plural Re and R7 may be the same or different 〇 s represents 0 or 1. L represents a hydroxyl group or a halogen atom. However, in the formula (XXX), when S and m are 0 and L is a hydroxyl group, r, and R4& are not all methyl groups)]. 8. A fruit pipetose derivative represented by the following formula (ΧΠ) and (XXXI) and a fructofuran derivative represented by the formula (XIII). 【化9】

(XII)(XII)

〔式中,R,〜R4係獨立地表示氫、可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且R!與R2、R3與R4亦可連結形成環。Wherein R, R, R4 independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and R! and R2 R3 and R4 may also be joined to form a ring.

Roi〜R34係獨立地表示氫、可含有雜原子及/或取代基之碳 數爲2以上的脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且1131與1132及/或R33與r34係可形成以碳 鏈連結而成之碳數爲4、5或7以上的環。又,式(XXXI) -12- 201120063 中,全爲甲基時’並無1^與112連結而形成環己嫁環 之情況及R3與R4連結而形成環己烷環之情況。 M3表示以下述式所示之基。 【化1 0】Roi to R34 each independently represent hydrogen, an aliphatic hydrocarbon group having 2 or more carbon atoms which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and 1131 and 1132 And/or R33 and r34 may form a ring having a carbon number of 4, 5 or 7 or more bonded by a carbon chain. Further, in the formula (XXXI) -12 to 201120063, when all of the methyl groups are present, there is no case where the ring is bonded to the group 112 to form a ring-grafted ring, and R3 and R4 are bonded to each other to form a cyclohexane ring. M3 represents a group represented by the following formula. [化1 0]

立或 獨、 係基 R7烴且 、 族 , 6 R肪基 ’ 脂烴 中之狀 式基環 ^代族 取肪 或脂Lithium or aryl, a group of R7 hydrocarbons, a group, a 6 R fatty group ’ aliphatic hydrocarbon

R 與 6 R 含及 可子 、 原 氨雜 示有 表含 地可 及 子 原 雜 有 之 基 代 取 或 可 基 羰 成 形 起 :m 、 及 m η 猸 爲 異 相 或 同 相 自 。 各 數可 整R7 之、 6 下 R 以的 J-4數 ο , 示時 表上 地以 立2 S表示〇或1。 L表示經基、_素原子)〕。 9_如7或8中記載之衍生物,其中’ Ri與R2及R3_r ^ 4、 或1131與1132及R33與R34連結而形成金剛烷。 1 0.如7〜9中任一項所記載之衍生物’其中’ m > 〇、 係羥基。 1 1 . 一種1〜6中任一項所記載之衍生物之製造方法^ 其係於7〜1 〇中任一項所記載之衍生物上使以下述式(j } 〜(3 )之任一所示之具有聚合性基之化合物反應。 -13- 201120063 化 o=cR and 6 R contain and can be used, and the original ammonia is shown to have a subtropical or heterogeneous carbonyl formation: m and m η 猸 are heterogeneous or in phase. The number of J-4 can be arbitrarily R7 and 6 times R, and 〇 or 1 is represented by 2 S on the table. L represents a trans-base, a _ atom)). A derivative according to 7 or 8, wherein ' Ri and R2 and R3_r ^ 4, or 1131 and 1132 and R33 and R34 are bonded to form adamantane. The derivative according to any one of 7 to 9 wherein 'm' is a hydroxy group. The method for producing a derivative according to any one of 1 to 6, which is based on any one of the following formulas (1) to (3) Reaction of a compound having a polymerizable group as shown. -13- 201120063 oo=c

H2 c8 II RICH2 c8 II RIC

2HVCH -C H2 CH 2 r9 I -CH2-CH—CH2I I ch2-o (3) (式中,R8表示氫原子、鹵素原子、甲基或鹵化甲基 ,且表示碳數1〜5之烴基)。 12.—種以下述式(XX)〜(XXII)所示之單糖類衍 生物之製造方法’其係於金剛烷酮上使半乳糖、葡萄糖、 甘露糖、阿洛酮糖、山梨糖、塔格糖、阿洛糖、阿卓糖、 古洛糖、艾杜糖、太洛糖、果糖反應。 【化1 2】2HVCH -C H2 CH 2 r9 I -CH2-CH-CH2I I ch2-o (3) (wherein R8 represents a hydrogen atom, a halogen atom, a methyl group or a halogenated methyl group, and represents a hydrocarbon group having 1 to 5 carbon atoms) . 12. A method for producing a monosaccharide derivative represented by the following formulas (XX) to (XXII) which is attached to adamantanone to form galactose, glucose, mannose, psicose, sorbose, and tartar Glycemic, allose, altrose, gulose, idose, teraloose, fructose. [1 2]

〔Ms表示以下述式所示之基〕。 【化1 3】[Ms represents a group represented by the following formula]. 【化1 3】

(式中’ R6、R7係獨立地表示氫、可含有雜原子及/ 或取代基之脂肪族煙基、或可含有雜原子及/或取代基之 脂肪族環狀烴基’且汉6與r7可—起形成羰基。 -14- 201120063 m、η係獨立地表示〇以上4以下之整數。 s表示〇或1。 η及/或m爲2以上時,複數的r6、R7可各自相同或相異 〇 L表示羥基、鹵素原子)〕。 1 3 · —種使1〜6中任一項所記載之衍生物聚合而成之 高分子化合物。 1 4. 一種使用1〜6中任一項所記載之衍生物或丨3所記 載之高分子化合物而成之半導體用光阻材料及半導體用基 底膜。 1 5 · —種光阻圖型形成方法,其係含有下述步驟:使 用含有1〜6中任一項所記載之衍生物或1 3所記載之高分子 化合物的光阻組成物,於支持體上形成光阻膜之步驟、使 前述光阻膜曝光之步驟及使前述光阻膜顯像而形成光阻圖 型之步驟。 16· —種使1〜6中任一項所記載之衍生物或13所記載 之高分子化合物藉由加熱或光照射而硬化之硬化物。 1 7. —種使用1〜6中任一項所記載之衍生物或1 3所記 載之高分子化合物而成之彩色光阻及黑色矩陣材料。 1 8 · —種使用1〜6中任一項所記載之衍生物或1 3所記 載之高分子化合物而成之印刷電路基板形成用光阻材料及 抗焊劑材料。 1 9. 一種使用1〜6中任一項所記載之衍生物或1 3所記 載之高分子化合物而成之底部塡充劑。 -15- 201120063 2 0 .—種使用1〜6中任一項所記載之衍生物或丨3所記 載之高分子化合物而成之光記錄材料。 21. —種使用1〜6中任一項所記載之衍生物或13所記 載之高分子化合物而成之光學接著劑及密封劑。 22. —種使用1〜6中任一項所記載之衍生物或13所記 載之高分子化合物之奈米壓印(nanoimprint)用材料。 根據本發明,係可提供可用爲光阻材料之糖衍生物及 其高分子化合物。 【實施方式】 〔實施發明之形態〕 本發明之葡萄糖、甘露糖、阿洛酮糖、山梨糖、塔格 糖、阿洛糖、阿卓糖、古洛糖、艾杜糖、太洛糖之哌喃糖 衍生物及呋喃糖衍生物係以下述式(I )〜(V)所示。 【化1 4】(wherein R6 and R7 independently represent hydrogen, an aliphatic smog group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent] and Han 6 and r7 -14- 201120063 m, η series independently represent an integer of 4 or more in 〇. s represents 〇 or 1. When η and / or m is 2 or more, the plural r6, R7 may be the same or phase The isoindole L represents a hydroxyl group or a halogen atom)]. 1 3 - A polymer compound obtained by polymerizing a derivative according to any one of 1 to 6. 1 . A semiconductor photoresist material and a semiconductor base film which are obtained by using the derivative described in any one of 1 to 6 or the polymer compound described in 丨3. A method for forming a photoresist pattern, comprising the step of using a photoresist composition comprising the derivative according to any one of 1 to 6 or the polymer compound described in 13; a step of forming a photoresist film on the body, a step of exposing the photoresist film, and a step of developing the photoresist film to form a photoresist pattern. (16) A cured product obtained by curing the light-emitting or light-emitting polymer of the derivative according to any one of 1 to 6 or the polymer compound described in 13. A color resist and a black matrix material obtained by using the derivative described in any one of 1 to 6 or the polymer compound described in 13. And a photoresist material for forming a printed circuit board and a solder resist material which are obtained by using the derivative described in any one of the items 1 to 6 or the polymer compound described in the above. A bottom hydrating agent obtained by using the derivative described in any one of 1 to 6 or the polymer compound described in 13. -15-201120063 2 0. An optical recording material obtained by using the derivative described in any one of 1 to 6 or the polymer compound described in 丨3. An optical adhesive or a sealant obtained by using the derivative described in any one of 1 to 6 or the polymer compound described in 13. A material for a nanoimprint using the derivative described in any one of 1 to 6 or the polymer compound described in 13. According to the present invention, a sugar derivative which can be used as a photoresist material and a polymer compound thereof can be provided. [Embodiment] [Form of the invention] Glucose, mannose, psicose, sorbose, tagatose, allose, altrose, gulose, idose, talose in the present invention The vinylidose derivative and the furanose derivative are represented by the following formulas (I) to (V). [化1 4]

(III)(III)

(II)(II)

-16- (IV) 201120063 式中’ R, ~ R4係獨立地表示氫、可含有雜原子及/或 取代基之脂肪族烴基、或可含有雜原子及/或取代基之脂 肪族環狀烴基’且111與112及/或113與114亦可連結形成環。 惟’式(π ) ’ ( v)中,Ri〜“並無全爲甲基之情況。 較佳爲Rl與R2及1與114連結而形成可含有雜原子及/ 或取代基之金剛烷,更佳爲各自形成金剛烷醇或金剛烷, 特佳爲各自形成金剛焼。 表示以下述式所示之基。 【化1 5】-16- (IV) 201120063 wherein R, R, R4 independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent. 'and 111 and 112 and/or 113 and 114 may also be joined to form a ring. However, in the formula (π)' (v), Ri~ "is not all methyl. Preferably, R1 and R2 are bonded to 1 and 114 to form adamantane which may contain a hetero atom and/or a substituent. More preferably, each of them is formed with adamantyl alcohol or adamantane, and it is particularly preferable to form a diamond ruthenium each. The formula is represented by the following formula: [Chem. 1 5]

式中’ R6 ' R7係獨立地表示氫、可含有雜原子及/或 取代基之脂肪族烴基、或可含有雜原子及/或取代基之脂 肪族環狀烴基’且、與!^可—起形成羰基。 m、π係獨立地表示〇以上*以下之整數。 η及/或m爲2以上時,複數的尺6、R7可各自相同或相異 〇 s表不0或1。 X表示下述以式(1 )〜(3 )之任一者所示的聚合性 -17- 201120063 【化1 6】 T9 〇 r8 II ι_ ——CH2—CH—CH2 \ / —ch2-ch- -ch2 1 C—C—CH2 0 ch2- -0 (1) (2) (3) 式中,r8表示氫原子、鹵素原子、甲基或鹵化甲基, 且R9表示碳數1〜5之烴基。 鹵素原子方面,可舉出氟原子、鹵化甲基方面可舉出 三氟甲基等》 又,本發明之半乳哌喃糖衍生物及果哌喃糖衍生物係 以下述式(v I )所示、果哌喃糖衍生物係以式(V )所示 、半乳呋喃糖衍生物係以式(V11 )或(IV )所示、果咲 喃糖衍生物係以式(VIII )所示。 【化1 7】In the formula, 'R6' R7 independently represents hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent. ^ can form a carbonyl group. m and π are independent integers representing 〇 or more*. When η and/or m is 2 or more, the plural scales 6 and R7 may be the same or different from each other. 〇 s is not 0 or 1. X represents the polymerizable property shown by any one of the following formulas (1) to (3) -17- 201120063 [Chemical 1 6] T9 〇r8 II ι_ - CH2 - CH-CH2 \ / -ch2-ch- -ch2 1 C-C-CH2 0 ch2- -0 (1) (2) (3) where r8 represents a hydrogen atom, a halogen atom, a methyl group or a halogenated methyl group, and R9 represents a hydrocarbon group having 1 to 5 carbon atoms. . In terms of a halogen atom, a fluorine atom or a halogenated methyl group may, for example, be a trifluoromethyl group. Further, the galactooligosaccharide derivative and the fruit pipechose derivative of the present invention have the following formula (v I ). The flutose derivative is represented by the formula (V), the galactofuran derivative is represented by the formula (V11) or (IV), and the fructose derivative is represented by the formula (VIII). Show. [化1 7]

(IV) (V) 式中,Rh〜Ri4係獨立地表示氫、可含有雜原子及/或 取代基之脂肪族烴基、或可含有雜原子及/或取代基之脂 -18- 201120063 肪族環狀烴基,且11|1與1^|2及/或R|3與R14亦可連結形成環 。惟、R,,〜R, 4並無全爲甲基之情況。 較佳爲Rh與R12及R13與Rl4連結而形成可含有雜原子 及/或取代基之金剛烷,更佳爲各自形成金剛烷醇或金剛 院’特佳爲各自形成金剛院。 係與上述式(I)〜(V)相同。 式(I )〜(VIII )中,取代基方面,可舉出羥基、胺 基、含醚鍵之取代基、酮基、含酯鍵之取代基、含醯胺鍵 之取代基、含內酯環之取代基、含內醯胺環之取代基等。 以式(I )〜(V111 )所示之衍生物方面,可舉例如以 下之化合物。 【化1 8】(IV) (V) wherein Rh~Ri4 independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or a fat which may contain a hetero atom and/or a substituent -18- 201120063 A cyclic hydrocarbon group, and 11|1 and 1^|2 and/or R|3 and R14 may be bonded to form a ring. However, R, R, and R are not all methyl. Preferably, Rh and R12 and R13 are bonded to Rl4 to form adamantane which may contain a hetero atom and/or a substituent, and it is more preferred that each of them forms an adamantyl alcohol or a diamond. It is the same as the above formulas (I) to (V). In the formulae (I) to (VIII), examples of the substituent include a hydroxyl group, an amine group, an ether bond-containing substituent, a ketone group, an ester bond-containing substituent, a guanamine bond-containing substituent, and a lactone-containing ester. a substituent of a ring, a substituent containing an indoleamine ring, and the like. The derivatives represented by the formulae (I) to (V111) may, for example, be the following compounds. [化1 8]

19- 201120063 【化1 9】19- 201120063 [Chem. 1 9]

-20- 201120063 【化2 0】-20- 201120063 【化2 0】

-21 - 201120063 【化2 1】-21 - 201120063 [Chem. 2 1]

-22- 201120063 【化2 2】-22- 201120063 【化2 2】

-23- 201120063 【化2 3】-23- 201120063 【化2 3】

-24- 201120063-24- 201120063

-25- 201120063 【化2 5】-25- 201120063 [Chem. 2 5]

-26 201120063 【化2 6】-26 201120063 [Chem. 2 6]

-27- 201120063 【化2 7】-27- 201120063 [Chem. 2 7]

-28- 201120063 【化2 8】-28- 201120063 【化2 8】

29- 201120063 【化2 9】29- 201120063 [Chem. 2 9]

-30- 201120063-30- 201120063

201120063 【化3 1】201120063 【化3 1】

-32- 201120063 【化3 2】-32- 201120063 [Chem. 3 2]

33- 201120063 【化3 3】33- 201120063 【化3 3】

又,本發明之葡萄糖、甘露糖、阿洛酮糖、山梨糖、 塔格糖、阿洛糖、阿卓糖、古洛糖、艾杜糖、太洛糖之哌 喃糖衍生物及呋喃糖衍生物係以下述式(IX ) 、(X)、 (XI) 、(XXX)或(XXXI)所示。 【化3 4】Further, the glucose, mannose, psicose, sorbose, tagatose, allose, altrose, gulose, idose, glucopyranose derivative and furanose of the present invention The derivative is represented by the following formula (IX), (X), (XI), (XXX) or (XXXI). [化3 4]

-34 201120063-34 201120063

式中,Rl〜R4、Rll〜Rl4係獨立地表示氫、可含有雜 原子及/或取代基之脂肪族烴基、或可含有雜原子及/或取 代基之脂肪族環狀烴基,且1^與112、R3與R4、與R12及/ 或R13與Rl4亦可連結形成環。惟,阿洛糖、阿卓糖、葡萄 糖、甘露糖之哌喃糖衍生物及呋喃糖衍生物中,Rh〜R14 並無全爲甲基之情況。又,式(XXXI)中,全爲 甲基時,並無1與R2連結而形成環己烷環之情況及R3與R4 連結而形成環己烷環之情況。 較佳爲R丨與R2及R3與R4、或Ru與R丨2及11丨3與R丨4係連 結而形成金剛烷。 M3表示以下述式所示之基。 【化3 5】In the formula, R1 to R4 and R11 to Rl4 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and 1^ And 112, R3 and R4, and R12 and / or R13 and Rl4 may also be joined to form a ring. However, in the case of allose, altrose, glucose, pentose, and a furanose derivative, Rh to R14 are not all methyl groups. Further, in the formula (XXXI), when all are methyl groups, there is no case where 1 is bonded to R2 to form a cyclohexane ring, and R3 and R4 are bonded to form a cyclohexane ring. Preferably, R丨 and R2 and R3 and R4, or Ru and R丨2 and 11丨3 and R丨4 are bonded to form adamantane. M3 represents a group represented by the following formula. [化3 5]

r6 式中,R6、117係獨立地表示氫、可含有雜原子及/或 取代基之脂肪族烴基、或可含有雜原子及/或取代基之脂 肪族環狀烴基’且R6與r7可一起形成羰基。 -35- 201120063 m、η係獨立地表示0以上4以下之整數。m較佳爲〇。 η及/或m爲2以上時,複數的R6、R7可各自相同或相異 〇 s表示0或1。 L表示羥基、鹵素原子,較佳爲羥基。鹵素原子方面 ,可舉出氯基、溴基等。 惟,式(XXX)中,s及m爲0而L爲羥基時,r,〜r4& 無全爲甲基之情況。 又,本發明之果哌喃糖衍生物係以下述式(XII)、 (XXXI )所示,果呋喃糖衍生物係以式(XIII )所示。 【化3 6】In the formula, R6 and 117 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and R6 and r7 may together A carbonyl group is formed. -35- 201120063 m, η series independently represent an integer of 0 or more and 4 or less. m is preferably 〇. When η and/or m is 2 or more, the plural R6 and R7 may be the same or different 〇 s represents 0 or 1. L represents a hydroxyl group or a halogen atom, and is preferably a hydroxyl group. Examples of the halogen atom include a chlorine group and a bromine group. However, in the formula (XXX), when s and m are 0 and L is a hydroxyl group, r, ~r4& are not all methyl. Further, the pistylene derivative of the present invention is represented by the following formulas (XII) and (XXXI), and the furfuran derivative is represented by the formula (XIII). [Chem. 3 6]

(XII)(XII)

r31〜r34係獨立地表示氫、可含有雜原子及/或取代基 之碳數爲2以上的脂肪族烴基、或可含有雜原子及/或取代 基之脂肪族環狀烴基,且1131與1132及/或R33與R34係可形成 以碳鏈連結而成之碳數爲4、5或7以上的環。 較佳爲尺31與R32及R33與R34係連結而形成金剛烷。 R丨〜R4係與上述式(XXXI)相同、M3係與上述式( IX )之M3相同。 接著,就本發明之衍生物的製造方法進行說明。 -36- 201120063 式(I )〜(VIII )之衍生物係使各自對應之中間體與 以上述式(1 )〜(3 )之任一所示之具有聚合性基的化合 物反應所得。上述(IX)〜(XIII) 、(XXX) 、( XXXI )之衍生物係可使用作爲中間體。 使其酯化反應時,係可使用共沸脫水法、醯基氯法、 酸酐法等。形成酯之具有聚合性基之化合物方面,可舉出 丙烯酸、甲基丙烯酸、α-三氟甲基丙烯酸、α-氟丙烯酸、 丙烯酸氯化物、甲基丙烯酸氯化物、三氟甲基丙烯酸氯 化物、α-氟丙烯酸氯化物、丙烯酸酐、甲基丙烯酸酐等。 較佳爲丙烯酸、甲基丙烯酸、丙烯酸氯化物、甲基丙烯酸 氯化物、丙烯酸酐、甲基丙烯酸酐。 共沸脫水法時,反應溫度通常爲50〜200°C,較佳爲 100〜180°C。溫度過低的話,反應速度會降低,反應時間 恐怕會變長。溫度過高的話,則會產生副反應,而恐有著 色激烈之虞。 壓力以一般絕對壓力計爲0.01〜lOMPa,較佳爲常壓 〜1 MPa。壓力過高時,會有安全上的問題,必須要有特別 的裝置,難以運用在產業上。 觸媒係可使用一般的酸觸媒。可舉例如硫酸、P-甲苯 磺酸、三氟乙酸等。對原料醇而言,觸媒通常使用 0 · 0 1 m 〇丨%〜2 0 m ο 1 %、較佳係使用0 · 0 5〜1 0 m 〇丨%。 溶媒係以使用與單糖類衍生物之溶解度爲0.5 %以上、 較佳爲5%以上者爲佳。所用的量係以使單糖類衍生物之濃 度爲0.5%以上、較佳爲5%以上的量爲佳。此時,衍生物可 -37- 201120063 呈懸濁狀態,但以溶解爲佳。溶媒方面,可 烷、十一烷、環己烷、甲基環己烷、乙基環 二甲苯及此等之混合溶媒等。 聚合禁止劑方面,可視需要而添加對苯 酚、啡噻嗪、甲氧基啡噻嗪等。對單糖類衍 合禁止劑通常使用10〜lOOOOwtppm、 5 000 wtppm 〇 醯基氯法、酸酐法時,反應溫度通常爲 較佳爲0〜5 0 °c。溫度若過低,會需要特別 運用在產業上。溫度若過高,則會產生副反 色激烈之虞。 壓力以一般絕對壓力計爲0.01〜lOMPa 〜IMP a。壓力過高時,會有安全上的問題, 的裝置,故難以運用在產業上。 因反應產生之酸的捕捉劑方面,係可使 三丁基胺、吡啶、二甲基胺基吡啶等之有機 、氫氧化鉀、碳酸鈉、碳酸鉀、磷酸鈉、磷 鹼。對單糖類衍生物之鹼的使用比例,其虐 衍生物比通常爲0.5〜20(莫耳比)左右之| 1 〇之量。 溶媒係以使用單糖類衍生物之溶解度爲 佳爲5%以上之溶媒爲佳。用量係以單糖類衍 0.5%以上、較佳5%以上之量者爲佳。此時, 雖可爲懸濁狀態,但以溶解爲佳。溶媒方面 舉出壬烷、癸 己烷、甲苯、 二酚、甲氧苯 生物而言,聚 較佳爲50〜 -50~ 1 0 0 °C、 的裝置,難以 應,而恐有著 ,較佳爲常壓 必須要有特別 用三乙基胺、 胺或氫氧化鈉 酸鉀等之無機 隹/含氟金剛烷 t,較佳爲1〜 0.5 %以上、較 生物之濃度爲 單糖類衍生物 ,可舉出己烷 -38- 201120063 、庚烷、環己烷、甲苯、DMF、NMP、DMAc、DMSO、二 乙基醚、THF、乙酸乙基酯、二氯甲烷、氯仿等。 聚合禁止劑方面,視需要可添加對苯二酚、甲氧苯酣 、啡噻嗪、甲氧基啡噻嗪等。對單糖類衍生物而言,聚合 禁止劑通常使用10〜lOOOOwtppm、較佳爲使用50〜 5 000wtppm 〇 因反應而生成的丙烯酸酯類其純化方法方面,可能是 蒸餾、晶析、管柱分離等,可依生成物之性狀與雜質之種 類來選擇純化方法。 使以式(2 )、( 3 )所示之具有聚合性基之化合物用 於反應時,係使以式(IX )〜(XIII ) 、 ( XXX )、( XXXI )所示之衍生物與以式(2 )、( 3 )所示之具有聚 合性基之化合物於鹼性觸媒存在下反應,可合成在衍生物 中導入環狀醚基爲目的之單糖類衍生物。 以式(2 ) 、 ( 3 )所示之具有聚合性基之化合物方面 ,可舉出以下述式(XIV )或(XV )所示之環狀醚化合物 【化3 7】 RgR31 to r34 are each independently represent hydrogen, an aliphatic hydrocarbon group having 2 or more carbon atoms which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and 1131 and 1132 And/or R33 and R34 may form a ring having a carbon number of 4, 5 or 7 or more bonded by a carbon chain. Preferably, the ruler 31 and R32 and R33 are bonded to R34 to form adamantane. R丨~R4 are the same as the above formula (XXXI), and the M3 system is the same as M3 of the above formula (IX). Next, a method for producing the derivative of the present invention will be described. -36-201120063 The derivatives of the formulae (I) to (VIII) are obtained by reacting each of the corresponding intermediates with a compound having a polymerizable group represented by any one of the above formulas (1) to (3). The derivatives of the above (IX) to (XIII), (XXX) and (XXXI) can be used as an intermediate. When the esterification reaction is carried out, an azeotropic dehydration method, a mercapto chloride method, an acid anhydride method, or the like can be used. Examples of the compound having a polymerizable group of an ester include acrylic acid, methacrylic acid, α-trifluoromethacrylic acid, α-fluoroacrylic acid, acrylic acid chloride, methacrylic acid chloride, and trifluoromethyl acrylate chloride. , α-fluoroacrylic acid chloride, acrylic anhydride, methacrylic anhydride, and the like. Preferred are acrylic acid, methacrylic acid, acrylic acid chloride, methacrylic acid chloride, acrylic acid anhydride, and methacrylic anhydride. In the azeotropic dehydration method, the reaction temperature is usually 50 to 200 ° C, preferably 100 to 180 ° C. If the temperature is too low, the reaction rate will decrease and the reaction time may become longer. If the temperature is too high, there will be side reactions, and there is a fear of intense color. The pressure is 0.01 to 10 MPa in a general absolute pressure, preferably at a normal pressure of ~1 MPa. When the pressure is too high, there will be safety problems, and there must be special equipment that is difficult to use in the industry. A general acid catalyst can be used for the catalyst system. For example, sulfuric acid, P-toluenesulfonic acid, trifluoroacetic acid or the like can be mentioned. For the raw material alcohol, the catalyst is usually used in an amount of from 0. 0 1 m 〇丨% to 2 0 m ο 1 %, preferably 0·0 5 to 1 0 m 〇丨%. The solvent is preferably used in an amount of 0.5% or more, preferably 5% or more, based on the solubility of the monosaccharide derivative. The amount used is preferably such that the concentration of the monosaccharide derivative is 0.5% or more, preferably 5% or more. At this time, the derivative may be in a suspended state from -37 to 201120063, but it is preferably dissolved. Examples of the solvent include alkane, undecane, cyclohexane, methylcyclohexane, ethylcycloxylene, and the like. As the polymerization inhibiting agent, p-phenol, phenothiazine, methoxymorphthiazine or the like may be added as needed. When the monosaccharide-based inhibiting agent is usually used in an amount of 10 to 100 wtppm, 5 000 wtppm of the indenyl chloride method or the acid anhydride method, the reaction temperature is usually preferably 0 to 50 °C. If the temperature is too low, it will need to be used in the industry. If the temperature is too high, there will be a fierce reaction. The pressure is 0.01 to 10 MPa to IMP a in general absolute pressure. When the pressure is too high, there is a safety problem, so it is difficult to use it in the industry. The scavenger for the acid generated by the reaction may be organic, potassium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate or phosphorus base such as tributylamine, pyridine or dimethylaminopyridine. The ratio of the use of the base of the monosaccharide derivative to the ratio of the abused derivative is usually about 0.5 to 20 (mole ratio). The solvent is preferably a solvent having a solubility of a monosaccharide derivative of preferably 5% or more. The amount of the monosaccharide is preferably 0.5% or more, preferably 5% or more. In this case, although it may be in a suspended state, it is preferably dissolved. The solvent is decane, decane, toluene, diphenol, methoxybenzene, and the device is preferably 50 to -50 to 100 ° C, which is difficult to handle, and is preferable. For normal pressure, it is necessary to use an inorganic cerium/fluorinated adamantane t such as triethylamine, an amine or potassium NaOH, preferably 1 to 0.5% or more, and the concentration of the organism is a monosaccharide derivative. Examples thereof include hexane-38-201120063, heptane, cyclohexane, toluene, DMF, NMP, DMAc, DMSO, diethyl ether, THF, ethyl acetate, dichloromethane, chloroform and the like. As the polymerization inhibiting agent, hydroquinone, methoxybenzoquinone, phenothiazine, methoxymorphothiazine, and the like may be added as needed. For the monosaccharide derivative, the polymerization inhibiting agent is usually used in an amount of 10 to 100 wtppm, preferably 50 to 5 000 wtppm of the acrylate produced by the reaction. The purification method may be distillation, crystallization, column separation, etc. The purification method can be selected depending on the nature of the product and the type of the impurity. When a compound having a polymerizable group represented by the formulas (2) and (3) is used for the reaction, the derivatives represented by the formulae (IX) to (XIII), (XXX), and (XXXI) are used. The compound having a polymerizable group represented by the formulae (2) and (3) is reacted in the presence of a basic catalyst to synthesize a monosaccharide derivative for the purpose of introducing a cyclic ether group into the derivative. Examples of the compound having a polymerizable group represented by the formulas (2) and (3) include a cyclic ether compound represented by the following formula (XIV) or (XV).

(XIV) (XV) 式中 ’ Qi 表示 Cl、Br、I或 F、Q2 表示 Cl、Br、1' F、 OTs,且R9表示碳數1〜5之烴基。 以式(XIV )或(XV )所示之環狀醚化合物方面,可 -39- 201120063 舉出表氯醇、表溴醇、3-氯甲基-3-甲基氧雜環丁烷、3-氯 甲基-3-乙基氧雜環丁烷等。 以式(IX)〜(XIII) 、 (XXX) 、 (XXXI)所示之 衍生物與以式(2 ) 、( 3 )所示之具有聚合性基之化合物 的反應中,反應溫度通常爲0〜200 °C、較佳爲50〜150 °C。 溫度若過低,反應速度會降低,恐有延長反應時間之虞。 溫度過高時,恐有著色激烈之虞。 壓力通常以絕對壓力計爲0.01〜lOMPa,較佳爲常壓 〜IMP a。壓力過高時,會有安全上的問題,且會需要特別 的裝置而難以運用在產業上。 反應時間通常爲1分〜2 4小時、較佳爲1小時〜1 0小時 〇 鹼性觸媒方面,可舉出鈉醯胺、三乙基胺、三丁基胺 、三辛基胺、吡啶、N,N-二甲基苯胺、1,5-二氮雜二環〔 4,3,0〕壬烯- 5(DBN) 、1,8-二氮雜二環〔5,4,0〕十一烯-7 ( DBU )、四甲基銨氯化物、四乙基銨氯化物、氫氧化 鈉、氫氧化鉀、氫化鈉、磷酸鈉、磷酸鉀、碳酸鈉、碳酸 鉀、酸化銀、甲氧化鈉、t-丁氧化鉀等。 溶媒方面,係以使用單糖類衍生物之溶解度爲0.5 %以 上、較佳爲5%以上的溶媒爲佳。用量係以單糖類衍生物之 濃度爲0.5%以上、較佳爲5%以上之量者爲佳。此時,單糖 類衍生物雖可爲懸濁狀態,但以溶解爲佳。溶媒方面,可 舉出己垸、庚院 '甲苯、DMF、DMAc、DMSO、乙酸乙基 酯、二乙基醚、四氫呋喃等。亦可使用含鹵化烷基之環狀 -40- 201120063 醚化合物作爲溶媒兼用。 導入了環狀醚基之單糖類衍生物之純化方法方面,雖 可爲蒸餾、晶析、管柱分離等,但可依生成物之性狀與雜 質之種類來選擇純化方法。 接著,說明本發明之含有上述以式(IX)〜(XIII) 、(XXX ) 、 ( XXXI )所示之衍生物的單糖類衍生物之 製造方法。 單糖類衍生物係可使對應之單糖類與具有羰基之有機 化合物藉由縮酮化反應來製造。 單糖類方面,可舉出半乳糖、葡萄糖、果糖、甘露糖 、阿洛酮糖、山梨糖'塔格糖' 阿洛糖、阿卓糖、古洛糖 、艾杜糖、太洛糖。較佳爲葡萄糖、果糖、甘露糖。 具有羰基之有機化合物方面,可舉出2-金剛烷酮、5-羥基-2-金剛烷酮、2,4-金剛烷二酮、4-羥基-2-金剛烷酮、 α-乙醯基-γ-丁內酯、乙醯乙酸乙基酯、環戊酮-2-羧酸乙 基酯、2-環己酮羧酸乙基 '樟腦等。較佳爲2-金剛烷酮、 5-羥基-2-金剛烷嗣等。 例如於單糖類上使金剛烷酮反應,來製造以下述式( XX)〜(XXII)所示之單糖類衍生物。 -41 - 201120063 【化3 8】(XIV) (XV) wherein 'Q' represents Cl, Br, I or F, Q2 represents Cl, Br, 1'F, OTs, and R9 represents a hydrocarbon group having 1 to 5 carbon atoms. In the case of a cyclic ether compound represented by the formula (XIV) or (XV), epichlorohydrin, epibromohydrin, 3-chloromethyl-3-methyloxetane, and 3 may be mentioned in the range of -39-201120063. - chloromethyl-3-ethyloxetane and the like. In the reaction of a derivative represented by the formulae (IX) to (XIII), (XXX) and (XXXI) with a compound having a polymerizable group represented by the formula (2) or (3), the reaction temperature is usually 0. ~200 °C, preferably 50~150 °C. If the temperature is too low, the reaction rate will decrease, which may delay the reaction time. When the temperature is too high, there is a fear of intense coloration. The pressure is usually 0.01 to 10 MPa in absolute pressure, preferably atmospheric pressure to IMP a. When the pressure is too high, there are safety problems, and special equipment is required and it is difficult to use it in the industry. The reaction time is usually from 1 minute to 24 hours, preferably from 1 hour to 10 hours, and the basic catalyst includes sodium decylamine, triethylamine, tributylamine, trioctylamine, and pyridine. , N,N-dimethylaniline, 1,5-diazabicyclo[4,3,0]nonene-5 (DBN), 1,8-diazabicyclo[5,4,0] Undecene-7 (DBU), tetramethylammonium chloride, tetraethylammonium chloride, sodium hydroxide, potassium hydroxide, sodium hydride, sodium phosphate, potassium phosphate, sodium carbonate, potassium carbonate, silver acid sulfate, Sodium oxide, t-butoxide, and the like. The solvent is preferably a solvent having a solubility of a monosaccharide derivative of 0.5% or more, preferably 5% or more. The amount is preferably 0.5% or more, preferably 5% or more, based on the concentration of the monosaccharide derivative. In this case, the monosaccharide derivative may be in a suspended state, but it is preferably dissolved. Examples of the solvent include hexane, Gengyuan 'toluene, DMF, DMAc, DMSO, ethyl acetate, diethyl ether, tetrahydrofuran, and the like. It is also possible to use a halogenated alkyl group-containing -40-201120063 ether compound as a solvent. The purification method of the monosaccharide derivative into which the cyclic ether group is introduced may be distillation, crystallization, column separation, etc., but the purification method may be selected depending on the nature of the product and the type of the impurity. Next, a method for producing a monosaccharide derivative containing the above-described derivatives represented by the formulae (IX) to (XIII), (XXX) and (XXXI) of the present invention will be described. The monosaccharide derivative can be produced by subjecting a corresponding monosaccharide to an organic compound having a carbonyl group by a ketalization reaction. Examples of the monosaccharide include galactose, glucose, fructose, mannose, psicose, sorbose 'tagugose' allose, altrose, gulose, idose, and talose. Preferred are glucose, fructose, and mannose. Examples of the organic compound having a carbonyl group include 2-adamantanone, 5-hydroxy-2-adamantanone, 2,4-adamantanedione, 4-hydroxy-2-adamantanone, and α-ethenyl group. - γ-butyrolactone, ethyl acetoacetate, ethyl cyclopentanone-2-carboxylate, 2-cyclohexanonecarboxylic acid ethyl 'camphor, and the like. Preferred are 2-adamantanone, 5-hydroxy-2-adamantane and the like. For example, adamantone is reacted on a monosaccharide to produce a monosaccharide derivative represented by the following formula (XX) to (XXII). -41 - 201120063 [Chem. 3 8]

M3係與上述式(IX )相同。 縮酮化反應的反應溫度通常爲〇〜200。(:、較佳爲20〜 1 5 0 C。溫度若過低’反應速度會降低,恐有使反應時間 延長之虞。溫度若過高,則有著色激烈的情況。 壓力通常以絕對壓力計爲0.01〜lOMPa、較佳爲常壓 〜IMPa。壓力過高時’會有安全上的問題會需要特別的裝 置,難以運用在產業上。 反應時間通常爲1分〜2 4小時、較佳爲1小時〜1 5小時 〇 酸方面係可舉出鹽酸、硫酸、磷酸等之無機酸,或P-甲苯磺酸、二甲苯磺酸、甲烷磺酸等之有機酸、氯化鋁、 氯化鋅、硫酸銅等之路易士酸等。此等可單獨使用,亦可 如無機酸與路易士酸、有機酸與路易士酸混合使用。 溶媒可不使用,但以使用使單糖類或具有羰基之有機 化合物之溶解度爲0.5%以上、較佳爲10%以上之溶媒爲佳 。用量係以使單糖類或具有羰基之有機化合物之濃度爲 0.5%以上、較佳爲10%以上之量爲佳。此時,單糖類或具 有羰基之有機化合物雖可爲懸濁狀態,但以溶解爲佳。溶 -42- 201120063 媒方面,可舉出己院’庚院、甲苯、DMF、DMAc、DMSO 、乙酸乙基醋、一乙基醚、四氫呋喃、丙酮、甲基乙基酮 、甲基異丁基酮等。此等可單獨使用或組合使用。較佳爲 四氫呋喃、DMF、DMSO。 反應生成物之純化方法方面,雖可視需要而爲蒸餾、 晶析、管柱分離等,但可依生成物之性狀與雜質之種類來 選擇純化方法。 接著,藉由使以上述縮酮化反應而得之單糖類衍生物 與羧酸衍生物、鹵化醇、鹵化合物等反應,可獲得m、η爲 1以上之式(IX)〜(XIII) 、 (XXX) 、 (XXXI)之衍 生物。 此反應方面可舉出酯化反應或醚化反應等》 羧酸衍生物方面,可舉例如以下之化合物。 -43- 201120063 【化3 9】The M3 system is the same as the above formula (IX). The reaction temperature of the ketalization reaction is usually from 〇 to 200. (:, preferably 20 to 150 ° C. If the temperature is too low, the reaction rate will decrease, and the reaction time may be prolonged. If the temperature is too high, the coloring may be intense. The pressure is usually measured by absolute pressure. It is 0.01 to 10 MPa, preferably atmospheric pressure to 1 MPa. When the pressure is too high, there is a problem that safety may require a special device, and it is difficult to use it in the industry. The reaction time is usually 1 minute to 2 hours, preferably 1 hour to 15 hours of citrate may be an inorganic acid such as hydrochloric acid, sulfuric acid or phosphoric acid, or an organic acid such as P-toluenesulfonic acid, xylenesulfonic acid or methanesulfonic acid, aluminum chloride or zinc chloride. And Lewis acid such as copper sulfate, etc. These may be used alone or as a mixture of mineral acid and Lewis acid, organic acid and Lewis acid. The solvent may not be used, but the organic sugar or organic compound having a carbonyl group may be used. The solvent having a solubility of the compound of 0.5% or more, preferably 10% or more is preferred. The amount is preferably such that the concentration of the monosaccharide or the organic compound having a carbonyl group is 0.5% or more, preferably 10% or more. Monosaccharide or organic with carbonyl Although the compound may be in a suspended state, it is preferably dissolved. In the case of solvent-42-201120063, it can be cited as a hospital, Gengyuan, toluene, DMF, DMAc, DMSO, ethyl acetate, ethyl ether, Tetrahydrofuran, acetone, methyl ethyl ketone, methyl isobutyl ketone, etc. These may be used singly or in combination, preferably tetrahydrofuran, DMF, DMSO. In terms of purification method of the reaction product, distillation may be used as needed. , crystallization, column separation, etc., but the purification method can be selected depending on the nature of the product and the type of impurities. Next, the monosaccharide derivative obtained by the ketalization reaction and the carboxylic acid derivative are halogenated. By reacting an alcohol, a halogen compound or the like, a derivative of the formula (IX) to (XIII), (XXX) and (XXXI) wherein m and η are 1 or more can be obtained. Examples of the reaction include an esterification reaction or an etherification reaction. The carboxylic acid derivative may, for example, be the following compound: -43- 201120063 [Chem. 3 9]

αΑ^ΟΗ C|A/CI b「X^〇h b「A^B「 h〇A/OHΑΑ^ΟΗ C|A/CI b"X^〇h b"A^B" h〇A/OH

aApH Cl 人,CI &人# 人,H。人/〇H BrAL〇H hoA^ci H〇vJ^〇人/OH c\^X〇X^c\aApH Cl person, CI &person# person, H.人/〇H BrAL〇H hoA^ci H〇vJ^〇人/OH c\^X〇X^c\

BrBr

較佳爲二醇酸、2-羥基異丁酸、2-氯異丁酸、溴乙醯 氯化物、氯乙醯氯化物。 鹵化醇方面,可舉例如以下之化合物。 【化4 0】Preferred are diol acid, 2-hydroxyisobutyric acid, 2-chloroisobutyric acid, bromoethene chloride, and chloroacetic chloride. The halogenated alcohol may, for example, be the following compounds. [化4 0]

較佳爲2-氯乙醇、2-溴乙醇、1-氯-2-甲基-2-丙醇、1-溴-2-甲基-2-丙醇。 鹵化合物方面,可舉例如以下之化合物。 -44- 201120063 【化4 1】Preferred are 2-chloroethanol, 2-bromoethanol, 1-chloro-2-methyl-2-propanol, and 1-bromo-2-methyl-2-propanol. As the halogen compound, for example, the following compounds can be mentioned. -44- 201120063 [Chem. 4 1]

較佳爲1,2-二氯乙烷、I,2-二溴乙烷。 使以上述縮酮化反應所得之單糖類衍生物與羧酸衍生 物進行酯化反應時,可使用共沸脫水法或醯基氯法、酸酑 法等。反應條件等係與上述酯化反應同樣。 使以上述縮酮化反應所得之單糖衍生物與幽化醇或鹵 化合物進行醚化反應時,反應溫度通常爲0〜200 °C、較佳 爲50〜150 °C。溫度若過低,反應速度會降低,恐有使反 應時間延長之虞。溫度過高時,恐有著色激烈之虞。 壓力通常以絕對壓力計爲0.01〜lOMPa、較佳爲常壓 〜1 Μ P a。壓力過高時,會有安全上的問題會需要特別的裝 置,難以運用在產業上。 反應時間通常爲1分〜24小時、較佳爲1小時〜1 〇小時 〇 觸媒方面’以提筒反應速度爲目的則是使用确化狎爲 佳。 溶媒方面,係以使單糖類衍生物之溶解度爲0.5 %以上 、較佳爲5%以上之溶媒爲佳。用量係以使單糖類衍生物之 -45- 201120063 濃度爲0.5%以上、較佳爲5%以上之量爲佳。此時,單糖類 衍生物雖可爲懸濁狀態,但以溶解爲佳。溶媒方面,可舉 出己烷,庚烷、甲苯、DMF、NMP、DMAc、DMSO、乙酸 乙基酯、二乙基醚、四氫呋喃等。含鹵素之化合物係可兼 用作溶媒使用。 反應生成物之純化方法方面雖可爲蒸餾、晶析、管柱 分離等,但可依生成物之性狀與雜質之種類來選擇純化方 法。 上述之衍生物(I)〜(VIII)係可以公知的方法使其 聚合而爲高分子化合物。 高分子化合物可爲單獨聚合物或共聚物。共聚物的情 況下其他單體方面,可舉出3-羥基-1-金剛烷基甲基丙烯酸 酯、3-羥基-1-金剛烷基丙烯酸酯、2-甲基-2-金剛烷基甲 基丙烯酸酯、2-甲基-2-金剛烷基丙烯酸酯、t-丁基甲基丙 烯酸酯、t-丁基丙烯酸酯、甲基甲基丙烯酸酯、甲基丙烯 酸酯、2-羥基乙基甲基丙烯酸酯、2-羥基乙基丙烯酸酯等 〇 高分子化合物之重量平均分子量較佳爲1,〇〇〇〜 100,000。較佳爲 3,000〜15,000。 上述之衍生物(I )〜(VIII )與高分子化合物係可添 加PAG (光酸產生劑)或有機胺等之消化體、溶媒等作爲 溶液,可使用爲光阻。衍生物(I)〜(VIII)與高分子化 合物係疏水性高、玻璃轉移點高,且由此所得之光阻在減 低缺陷、改善粗糖度上表現優異。 -46- 201120063 加入光阻之溶媒方面,可舉出丙二醇甲基醚、環 、丙二醇單甲基醚乙酸酯等。 又,衍生物(I )〜(VIII )及高分子化合物與聚 始劑混合而成之組成物方面,係可使其硬化。例如, 成型的模型,或者藉由塗佈形成所期望的形狀後,使 化。此時,在耐熱性或機械物性等未有不良影響下, 含有其他聚合性單體。該具有聚合性不飽和基之化合 面’可舉例如甲基(甲基)丙烯酸酯、乙基(甲基) 酸酯、丙基(甲基)丙烯酸酯、丁基(甲基)丙烯酸 金剛烷基(甲基)丙烯酸酯、苯甲基(甲基)丙烯酸 乙二醇二(甲基)丙烯酸酯、I,3·丙二醇二(甲基 烯酸酯、I,4-丁二醇二(甲基)丙烯酸酯、三環癸 甲醇二(甲基)丙烯酸酯、金剛烷-1,3-二醇二( )丙烯酸酯、金剛烷-1,3 -二甲醇二(甲基)丙烯酸 金剛烷-I,3-二乙醇二(甲基)丙烯酸酯、季戊四鹿 丙烯酸酯、二季戊四醇六丙烯酸酯等。 聚合起始劑,當以熱使其硬化時係用熱聚合起始 當以光使其硬化時則使用光聚合起始劑。熱聚合起始 面,可舉出苯甲醯基過氧化物、甲基乙基酮過氧化物 基異丁基過氧化物、過氧化氫異丙苯、t-丁基過氧化 之有機過酸化物或偶氮雙異丁腈等之偶氮系起始劑。 合起始劑方面,可舉出乙醯苯類、二苯基酮類、苯甲 、安息香醚類、苯甲基二縮酮類、噻吨酮類、醯基氧 、醯基膦酸酯類、芳香族重氮鐵鹽、芳香族锍鹽、芳 己酮 合起 注入 其硬 亦可 物方 丙烯 酯、 酯、 )丙 烷二 甲基 酯、 四 劑, 劑方 、甲 氫等 光聚 基類 膦類 香族 -47- 201120063 鎮鹽、芳香族氧碘鹽、芳香族氧鏑鹽、金屬芳香類化合物 等。聚合起始劑之添加量對全組成物而言爲0.01〜10重量 %、較佳爲〇· 〇5〜5重量%,此等可單獨使用,亦可合倂使 用。 再者,此組成物亦可含有黏合劑聚合物。黏合劑聚合 物方面,可舉例如丙烯酸系樹脂、苯乙烯系樹脂、環氧系 樹脂、醯胺系樹脂、醯胺環氧系樹脂、醇酸系樹脂、苯酚 系樹脂等。鹼顯像性的觀點來看,係以丙烯酸系樹脂爲佳 。此等可單獨使用,或組合2種以上使用之。 黏合劑聚合物,例如可藉由使聚合性單體自由基聚合 來製造。上述聚合性單體方面,可舉例如苯乙烯、乙烯基 甲苯、a-甲基苯乙烯、p-甲基苯乙烯、p-乙基苯乙烯等之 可聚合的苯乙烯衍生物、丙烯醯胺、丙烯腈、乙烯基-η-丁 基醚等之乙烯基醇之酯類、(甲基)丙烯酸烷基酯、(甲 基)丙燃酸四氮糖醇、(甲基)丙嫌酸—甲基胺基乙基醋 ' (甲基)丙烯酸二乙基胺基乙基酯、(甲基)丙烯酸環 氧丙基酯、2,2,2-三氟乙基(甲基)丙烯酸酯、2,2,3,3-四 氟丙基(甲基)丙烯酸酯、(甲基)丙烯酸、α_溴(甲基 )丙烯酸、α-氯(甲基)丙烯酸、β-呋喃基(甲基)丙烯 酸、β·苯乙烯基(甲基)丙烯酸、順丁烯二酸、順丁烯二 酸酐、順丁烯二酸單甲基酯、順丁烯二酸單乙基、順丁烯 二酸單異丙基等之順丁烯二酸單酯、反丁烯二酸、桂皮酸 、α -氰基桂皮酸、伊康酸、巴豆酸、丙炔酸等。此等可單 獨使用或組合2種類以上使用之。 48 - 201120063 上述(甲基)丙烯酸烷基酯方面,可舉例如( 丙烯酸甲基酯、(甲基)丙烯酸乙基酯、(甲基) 丙基酯、(甲基)丙烯酸丁基酯、(甲基)丙烯酸 、(甲基)丙烯酸己基酯、(甲基)丙烯酸庚基酯 基)丙烯酸辛基酯、(甲基)丙烯酸2-乙基己基酯 之異構物等。此等可單獨使用,或組合2種以上使用 熱硬化時,溫度通常爲30〜200 °C、較佳爲50〃 〇 光硬化中,例如可藉由紫外線之照射而得硬化 射強度因由單體或聚合起始劑之種類、硬化物之膜 定而爲任意,但通常爲100〜5 000m J/cm2、更佳爲 4000mJ/cm2 ° 硬化物在透明性、(長期)耐光性等之光學特 熱性上表現優異,且有良好的機械物性,而線膨張 硬化收縮率低。因此,可適用於各種塗佈劑、透鏡 鏡、薄膜電容器、以奈米壓印(nan〇imPrint)法所 圖型形成體等。 如此含有本發明之衍生物(I)〜(VIII )及高 合物之組成物,因具有優異特性’故可適用於光半 LED等)、平面面板顯示器(有機EL元件等)、電 、光電路(光導波路)用之樹脂(封止劑、接著劑 通信用透鏡及光學用薄膜等之光學電子構件。 上述之組成物可使用於半導體元件/積體電路 )、個別半導體(二極體、電晶體、熱阻器等) 甲基) 丙烯酸 戊基酯 、(甲 、此等 之。 -1 5 0 °C 物。照 厚等決 ,5 00 〜 性、耐 係數或 、微透 形成的 分子化 導體( 子電路 )、光 (1C他 方面’ -49- 201120063 LED ( LED燈 '晶片LED、受光元件、光半導體用透鏡) 、感應器(溫度感應器、光感應器、磁氣感應器)、被動 零件(高頻裝置、電阻器、電容器等)、機構零件(連接 器、切換器、繼電器等)、汽車零件(電路系、控制系、 感應器類、燈貼等)、接著劑(光學零件、光碟片、攝影 鏡頭)等’亦可用爲光學用薄膜等之表面塗佈用。又,本 發明之衍生物(I )〜(VIII )及高分子化合物因具有金剛 烷骨架而在耐熱性、接著性上表現優異,且亦因具備有蝕 刻耐性,可用爲半導體用封止劑、半導體用抗反射膜等半 導體形成材料。 因此,前述組成物亦可使用於光半導體用封止劑、電 子電路用封止劑、光導波路、光通信用透鏡、有機EL元件 用封止劑及光學薄膜。 作爲光半導體(LED等)用封止劑之構成,係適用於 砲彈型或表面黏著(SMT )型等之元件,可與金屬或聚醯 胺上所形成之GaN等之半導體良好地密著,再者,可使 YAG等之螢光色素分散而使用之。而且,也可使用在砲彈 型LED的表面被覆劑、SMT型LED之透鏡等。 適用於有機EL用時的構成,係於一般的玻璃或透明樹 脂等之透光性基板上依序設置有陽極/電洞注入層/發光層/ 電子注入層/陰極之構成的有機EL元件。有機EL元件的封 止材方面,因使金屬罐或金屬薄片或SiN等之經塗佈的樹 脂薄膜覆蓋於EL元件上時的接著劑、或賦予本發明之衍生 物氣體障壁性用之無機塡料等予以分散,係可直接將EL元 -50- 201120063 件封止。顯示方式方面,現在雖適用於主流的底部發光型 ,但今後因適用於以光取出效率等之點而備受期待之頂部 發光型,而可活用上述之組成物的透明性或耐熱性之效果 0 用於光電路時的構成,亦可適用於單模態或多模態用 之熱光學切換器或是陣列導波路型格子、合分波器、波長 可變濾光器、或光纖之核材料或包覆材料。又,適用於導 波路上集光之微透鏡陣列或MEMS型光切換器的鏡子。此 外,也適用於光電變換元件的色素黏合劑等。 用作光學用薄膜時的構成,可適用於液晶用之薄膜基 板、有機EL用薄膜基板等之顯示器用方面,或光拡散薄膜 、抗反射薄膜、藉由分散螢光色素等而成之色變換薄膜等 〇 將使用本發明之衍生物(I )〜(v 111 )及高分子化合 物之組成物用於電路形成用基板時,係可以高水準維持對 該基板之密著性與剝離特性雙方。因此,在形成配線時, 可避免配線的斷線及短路的發生。 半導體產業中’持續地要求要更小形狀,最近則出現 有關193111111光微影而以31115_1〇〇11111製造裝置之技術。如此 更短波長的光之使用,必須要有底部抗反射膜(BARC) 。此B ARC可降低基材上的反射,且藉由吸收通過光阻的 光來抑制因光阻振動所導致的硬化。市售的抗反射膜( ARC )係由有機材料及無機材料雙方所成。一般而言’顯 不出良好耐鈾刻性的無機ARC,基於CVD,容易完全地接 -51 - 201120063 受因極端微細構造(topography :形貌學)所導致的積體 不利。有機ARC材料係依Spin-on製程所塗佈’具有優異 的塡充特性及平坦化特性,且因金剛烷骨架多,故耐蝕刻 性良好,而以導入率可改變蝕刻特性。 近年來,LSI裝置之小型化備受要求。因此,CSP或 BGA等之新的封裝愈來愈普及。此無導線的晶片載體,一 般而言,係由一片含陶瓷的封裝所成,該陶瓷係晶片載體 ,意即形成基底,且於該基底上實裝有晶片。實裝有晶片 之封裝,在實裝於更大的印刷電路基板(PCB )等中。具 體而言,封裝的接觸部與在鏡像關係中的接觸部係形成於 PCB上,使兩者符合後,藉由進行迴流焊接等,而得以電 性及機械性地接續,且予以表面實裝。使封裝藉由焊料而 接續於PCB時,通常是使用焊料糊或使用焊料凸塊。封裝 基材與PCB基材之間因焊料凸塊而產生的縫隙,一般可注 入環氧系等之封止樹脂(底部塡充材料)。又,將晶片予 以封裝或實裝於PCB時必須減少面積用之方法之一,係有 倒裝晶片接續法。此時’晶片基材面與晶片載體基材或晶 片基材面與PCB基材之間因焊料凸塊導致縫隙產生之故, 同樣地可注入底部塡充材料。底部塡充材料不僅包埋位在 接續部之縫隙或空間,在密封電性接點而自周圍保護的同 時’會有例如使封裝基材及PCB基材接著的機能,且具有 小的機械性接合點之焊料凸塊接合部上防止過度的力作用 之目的。 使用本發明之衍生物(I )〜(V111 )及高分子化合物 -52- 201120063 的組成物,係可用於將2片以上的基材縫隙封止之底部塡 充材料,此底部塡充劑可發揮短時間硬化、優異接著性、 高耐熱性。此等之結果,可達成電子零件之信頼性提昇、 生產性提高等。 〔實施例〕 以下,有關本發明係顯示出實施例及比較例以更具體 地說明,但本發明非受限於此等者。 尙且,各種分析方法係實施如以下所示。 〔玻璃轉移點(Tg):差示掃瞄熱量分析(DSC)〕 使用 SII NanoTechnology 股份公司製 EXSTAR D S C 7 0 2 0進行測定。 〔分子量、分子量分布:膠體滲透層析(GPC )〕 使用TOSOH股份公司製 HLC-8220GPC進行測定。 實施例1 1,2: 3,4-二-0-(2,2-亞金剛烷基)-D-半乳哌喃糖之 合成 在裝有滴下漏斗與還流管之2000mL的3 口茄型燒瓶中 ,加入2-金剛烷酮l〇〇g、D- ( + )-半乳糖60g、氯化鋅 90g、四氫呋喃(THF) lOOOmL。加熱至40°C ’滴下 Η 2 S Ο 4 1 5 m L,於4 0 t:攪拌6小時。之後,冷卻至室溫爲止後 ,將生成的鹽以膜過濾器濾掉。在濾液中,加入碳酸鉀水 溶液進行中和。以乙酸乙基酯l〇〇〇mL稀釋’去除水層後’ -53- 201120063 以飽和食鹽水進行洗淨。以硫酸鎂使有機層乾燥’餾去溶 媒。藉由將所得之白色固體以THF再結晶’得到目的化合 物(136.2g、產率 92%)。 【化4 2】Preferred is 1,2-dichloroethane, I,2-dibromoethane. When the monosaccharide derivative obtained by the above ketalization reaction is subjected to an esterification reaction with a carboxylic acid derivative, an azeotropic dehydration method, a mercapto chloride method, an acid hydrazine method or the like can be used. The reaction conditions and the like are the same as those of the above esterification reaction. When the monosaccharide derivative obtained by the above ketalization reaction is subjected to etherification reaction with a hydroxyl group or a halogen compound, the reaction temperature is usually from 0 to 200 ° C, preferably from 50 to 150 ° C. If the temperature is too low, the reaction rate will decrease, which may cause the reaction time to prolong. When the temperature is too high, there is a fear of intense coloration. The pressure is usually 0.01 to 10 MPa in absolute pressure, preferably at normal pressure 〜1 Μ P a . When the pressure is too high, there are safety problems that require special equipment and are difficult to use in the industry. The reaction time is usually from 1 minute to 24 hours, preferably from 1 hour to 1 hour. 触 The catalyst side is preferably used to determine the reaction speed of the tube. The solvent is preferably a solvent having a solubility of the monosaccharide derivative of 0.5% or more, preferably 5% or more. The amount is preferably such that the concentration of the monosaccharide derivative -45 to 201120063 is 0.5% or more, preferably 5% or more. In this case, the monosaccharide derivative may be in a suspended state, but it is preferably dissolved. The solvent may, for example, be hexane, heptane, toluene, DMF, NMP, DMAc, DMSO, ethyl acetate, diethyl ether or tetrahydrofuran. The halogen-containing compound can also be used as a solvent. Although the purification method of the reaction product may be distillation, crystallization, column separation, etc., the purification method may be selected depending on the properties of the product and the type of the impurities. The above derivatives (I) to (VIII) can be polymerized to form a polymer compound by a known method. The polymer compound may be a single polymer or a copolymer. In the case of a copolymer, other monomers may, for example, be 3-hydroxy-1-adamantyl methacrylate, 3-hydroxy-1-adamantyl acrylate, 2-methyl-2-adamantyl group Acrylate, 2-methyl-2-adamantyl acrylate, t-butyl methacrylate, t-butyl acrylate, methyl methacrylate, methacrylate, 2-hydroxyethyl methyl The weight average molecular weight of the fluorene polymer compound such as acrylate or 2-hydroxyethyl acrylate is preferably 1, 〇〇〇 100,000. It is preferably 3,000 to 15,000. The above-mentioned derivatives (I) to (VIII) and the polymer compound may be a solution obtained by adding a digested product such as PAG (photoacid generator) or an organic amine or a solvent, and may be used as a resist. The derivatives (I) to (VIII) and the polymer compound have high hydrophobicity and high glass transition point, and the photoresist thus obtained is excellent in reducing defects and improving coarse sugar content. -46- 201120063 Examples of the solvent to be added to the photoresist include propylene glycol methyl ether, cyclohexane, and propylene glycol monomethyl ether acetate. Further, the derivatives (I) to (VIII) and the composition in which the polymer compound and the polymer are mixed can be cured. For example, the formed model is either formed by coating to form the desired shape. At this time, other polymerizable monomers are contained without adverse effects such as heat resistance and mechanical properties. The compounding surface having a polymerizable unsaturated group may, for example, be a methyl (meth) acrylate, an ethyl (meth) acrylate, a propyl (meth) acrylate or a butyl (meth) acrylate adamantane. (meth) acrylate, benzyl (meth) acrylate ethylene di(meth) acrylate, I, 3 · propylene glycol bis (methyl enoate, I, 4-butanediol di (A) Acrylate, tricyclodecanol di(meth)acrylate, adamantane-1,3-diol di()acrylate, adamantane-1,3-dimethanoldi(methyl)acrylic acid adamantane- I,3-diethanol di(meth)acrylate, pentaerythritol acrylate, dipentaerythritol hexaacrylate, etc. Polymerization initiator, when hardened by heat, is initiated by thermal polymerization when light is used When it is hardened, a photopolymerization initiator is used. Examples of the thermal polymerization starting surface include benzammonium peroxide, methyl ethyl ketone peroxide isobutyl peroxide, and cumene hydroperoxide. An azo initiator such as t-butyl peroxy organic peracid or azobisisobutyronitrile. Acetylbenzene, diphenyl ketone, benzo, benzoin ether, benzyl ketal, thioxanthone, mercaptooxy, decylphosphonate, aromatic diazo iron salt, Aromatic sulfonium salts and aryl ketones are combined to inject their hard aryl acrylates, esters, propane dimethyl esters, four doses, agents, methyl hydrogen and other photopolymers of phosphines -47- 201120063 Town Salt, aromatic oxygen iodide salt, aromatic oxonium salt, metal aromatic compound, and the like. The addition amount of the polymerization initiator is 0.01 to 10% by weight, preferably 5% to 5% by weight based on the total composition, and these may be used singly or in combination. Further, the composition may also contain a binder polymer. Examples of the binder polymer include an acrylic resin, a styrene resin, an epoxy resin, a guanamine resin, a guanamine epoxy resin, an alkyd resin, and a phenol resin. From the viewpoint of alkali developability, an acrylic resin is preferred. These may be used alone or in combination of two or more. The binder polymer can be produced, for example, by radical polymerization of a polymerizable monomer. Examples of the polymerizable monomer include polymerizable styrene derivatives such as styrene, vinyl toluene, a-methylstyrene, p-methylstyrene, and p-ethylstyrene, and acrylamide. An ester of a vinyl alcohol such as acrylonitrile or vinyl-η-butyl ether, an alkyl (meth)acrylate, a (meth)propionic acid tetrakiltitol, or a (meth)acrylic acid- Methylaminoethyl vinegar diethylaminoethyl (meth)acrylate, glycidyl (meth)acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3-tetrafluoropropyl (meth) acrylate, (meth)acrylic acid, α-bromo (meth)acrylic acid, α-chloro(meth)acrylic acid, β-furanyl (methyl) Acrylic acid, β·styryl (meth)acrylic acid, maleic acid, maleic anhydride, maleic acid monomethyl ester, maleic acid monoethyl, maleic acid A maleic acid monoester such as monoisopropyl, fumaric acid, cinnamic acid, α-cyanocinnamic acid, itaconic acid, crotonic acid, propiolic acid or the like. These can be used alone or in combination of two or more types. 48 - 201120063 The above (meth)acrylic acid alkyl ester may, for example, be (methyl acrylate, ethyl (meth) acrylate, (meth) propyl ester, butyl (meth) acrylate, ( Methyl)acrylic acid, hexyl (meth)acrylate, octyl (meth)acrylate) octyl acrylate, 2-ethylhexyl (meth) acrylate isomer, and the like. These may be used singly or in combination of two or more types, and the temperature is usually 30 to 200 ° C, preferably 50 Å. In the case of calender curing, for example, the curing intensity can be obtained by irradiation of ultraviolet rays. The type of the polymerization initiator and the film of the cured product are arbitrary, but usually 100 to 5 000 m J/cm 2 , more preferably 4000 mJ/cm 2 °. The optical properties of the cured product in transparency, (long-term) light resistance, and the like It is excellent in heat and has good mechanical properties, while the linear expansion hardening shrinkage rate is low. Therefore, it can be applied to various coating agents, lens mirrors, film capacitors, pattern forming bodies by nanoimprint method, and the like. The composition containing the derivatives (I) to (VIII) and the high compound of the present invention is excellent in characteristics, so that it can be applied to a light semi-LED or the like, a flat panel display (organic EL device, etc.), electricity, and optoelectronics. Resin for optical circuit (optical waveguide) (optical electronic component such as sealing agent, adhesive communication lens, and optical film. The above composition can be used for semiconductor device/integrated circuit), individual semiconductor (diode, Transistors, thermal resistors, etc.) Methyl) pentyl acrylate, (A, etc. -1 50 °C. Depending on the thickness, 5 00 ~ sex, resistance coefficient or micro-permeable molecules Conductor (sub-circuit), light (1C other aspects - -49- 201120063 LED (LED lamp 'wafer LED, light-receiving element, optical semiconductor lens), sensor (temperature sensor, light sensor, magnetic sensor) , passive parts (high-frequency devices, resistors, capacitors, etc.), mechanical parts (connectors, switches, relays, etc.), automotive parts (circuits, control systems, sensors, light stickers, etc.), adhesives (optical Parts, light The film, the photographic lens, etc. can also be used for surface coating of an optical film or the like. Further, the derivatives (I) to (VIII) of the present invention and the polymer compound have heat resistance and adhesion due to the adamantane skeleton. It is excellent in the above-mentioned performance, and it can be used as a semiconductor forming material such as a semiconductor sealing agent or an antireflection film for a semiconductor. Therefore, the composition can be used for a sealing agent for an optical semiconductor or a sealing for an electronic circuit. A stopper, an optical waveguide, a lens for optical communication, a sealing agent for an organic EL device, and an optical film. The sealing agent for an optical semiconductor (LED or the like) is applied to a bullet type or a surface mount (SMT) type. The element can be well adhered to a semiconductor such as GaN formed on a metal or polyimide, and a fluorescent pigment such as YAG can be dispersed and used. Further, it can be used on the surface of a bullet-type LED. For the organic EL, the anode/cavity injection layer/light-emitting layer/electron is provided on a light-transmissive substrate such as a general glass or a transparent resin. An organic EL device having a structure of an in-layer/cathode. In the case of a sealing material for an organic EL device, an adhesive agent for coating a resin film such as a metal can or a metal foil or SiN on an EL element, or an application to the present invention The inorganic gas material for the gas barrier of the invention is dispersed, and the EL element-50-201120063 can be directly sealed. The display method is now applicable to the mainstream bottom emission type, but it is suitable for use in the future. The top emission type which is expected from the viewpoint of light extraction efficiency, etc., and the effect of transparency or heat resistance of the composition described above can be utilized for the configuration of the optical circuit, and can be applied to single mode or multimode. A thermal optical switch or an array of waveguide type grids, a combiner/demultiplexer, a wavelength variable filter, or a nuclear material or cladding material of an optical fiber. Further, it is applied to a mirror of a microlens array or a MEMS type optical switch that collects light on a waveguide. Further, it is also applicable to a pigment binder such as a photoelectric conversion element. When it is used as a film for optical use, it can be applied to a display for liquid crystal film, a film substrate for organic EL, or the like, or a light-transmissive film, an anti-reflection film, or a color conversion by dispersing a fluorescent dye. When a composition such as a derivative (I) to (v 111 ) and a polymer compound of the present invention is used for a substrate for circuit formation, it is possible to maintain both the adhesion and the peeling property of the substrate at a high level. Therefore, when wiring is formed, occurrence of disconnection and short circuit of the wiring can be avoided. The semiconductor industry has been continually demanding smaller shapes, and recently there have been technologies for manufacturing devices with 193111111 lithography and 31115_1〇〇11111. For the use of such shorter wavelengths of light, a bottom anti-reflective film (BARC) is required. This B ARC reduces reflection on the substrate and suppresses hardening due to photoresist vibration by absorbing light passing through the photoresist. Commercially available antireflection film (ARC) is made of both organic materials and inorganic materials. In general, inorganic ARC, which exhibits good uranium resistance, is easily and completely connected based on CVD. -51 - 201120063 is disadvantageous due to the formation of extremely fine structures (topography). The organic ARC material is coated according to the Spin-on process. It has excellent charging characteristics and flattening characteristics, and because of the large number of adamantane skeletons, the etching resistance is good, and the etching property can be changed at the introduction rate. In recent years, miniaturization of LSI devices has been demanded. Therefore, new packages such as CSP or BGA are becoming more and more popular. The wire-free wafer carrier, in general, is formed from a ceramic-containing package which is intended to form a substrate on which the wafer is mounted. A package containing a wafer is mounted on a larger printed circuit board (PCB) or the like. Specifically, the contact portion of the package and the contact portion in the mirror image relationship are formed on the PCB, and after the two are matched, electrical and mechanical connection is performed by reflow soldering or the like, and the surface is mounted. . When the package is soldered to the PCB by solder, it is common to use solder paste or solder bumps. A gap between the substrate and the PCB substrate due to solder bumps is generally applied to an epoxy resin or the like (bottom charge material). Further, one of the methods for reducing the area when the wafer is packaged or mounted on the PCB is a flip chip bonding method. At this time, the gap between the wafer substrate surface and the wafer carrier substrate or the wafer substrate surface and the PCB substrate due to the solder bumps is generated, and the underlying chelating material can be injected in the same manner. The bottom splicing material not only embeds the gap or space in the splicing portion, but also protects the package substrate and the PCB substrate, and has small mechanical properties while sealing the electrical contacts and protecting from the periphery. The purpose of preventing excessive force on the solder bump joint of the joint. The composition using the derivatives (I) to (V111) of the present invention and the polymer compound-52-201120063 is a bottom entangled material which can be used for sealing two or more substrates with a gap, and the bottom sputum can be used. It exhibits short-time hardening, excellent adhesion, and high heat resistance. As a result of this, it is possible to achieve improved reliability and productivity of electronic components. [Examples] Hereinafter, the present invention shows examples and comparative examples to explain more specifically, but the present invention is not limited thereto. Moreover, various analytical methods are implemented as follows. [Glass Transfer Point (Tg): Differential Scanning Thermal Analysis (DSC)] The measurement was carried out using EXSTAR D S C 7 0 2 0 manufactured by SII NanoTechnology Co., Ltd. [Molecular weight, molecular weight distribution: colloidal permeation chromatography (GPC)] The measurement was carried out using HLC-8220GPC manufactured by TOSOH Co., Ltd. Example 1 Synthesis of 1,2: 3,4-di-O-(2,2-adamantyl)-D-galacto-pentanose A 2000 mL 3-golate type containing a dropping funnel and a reflux tube To the flask, 2-adamantanone l〇〇g, D-(+)-galactose 60 g, zinc chloride 90 g, and tetrahydrofuran (THF) 100 mL were added. Heat to 40 ° C 'drop Η 2 S Ο 4 1 5 m L, at 40 t: stir for 6 hours. Thereafter, after cooling to room temperature, the resulting salt was filtered off through a membrane filter. In the filtrate, a potassium carbonate aqueous solution was added for neutralization. Dilute with ethyl acetate l〇〇〇mL 'after removing the aqueous layer' -53- 201120063 Wash with saturated saline. The organic layer was dried with magnesium sulfate to distill off the solvent. The title compound (136.2 g, yield: 92%) was obtained by recrystallised from white solids. [化4 2]

OHOH

核磁共振光譜(溶媒:氯仿-d )日本電子股份公司製 JNM-EC A500 'H-NMR ( 500MHz ) : 1.55-2.20 ( m, 28H ) , 4.73- 4.80 ( m, 2H ) , 4.86-4.92 ( m, 2H ) , 4.28 ( dd, 1H, J = 7.9, 1.5Hz) , 4.37 ( dd, 1H, J = 4.9, 2.5Hz ) , 4.65 ( dd, 1H, J = 7.9, 2.5Hz) , 5.59 ( d, 1H, J = 5.2Hz) 1 3 C-NMR (125MHz ): 26.65, 26. 82, 26. 90, 26. 95, 34. 12, 34 • 42, 34.61, 34.64, 34.89, 34. 96, 35 • 00, 35. 02, 3 5 . .06, 35 .35, 36.95, 37.02, 37.14, 37. 32, 62 • 77, 68. 06, 70. .23, 70. 58, 7 1.45, 95.93, 1 1 1.70, 1 112.56 實 施例2 1, 2 : 3,4· 二-〇- ( 2,2-亞 金剛院 基) -6- 0-甲基 丙烧 1醯 基-D-半乳哌喃糖之合成 在裝有滴下漏斗與還流管之2000mL的3 口茄型燒瓶中 201120063 ,加入實施例1所得之1,2 : 3,4-二-〇- ( 2,2-亞金剛烷基)-D-半乳哌喃糖2g、三乙基胺0.82g、N,N-二甲基胺基吡啶 165mg、甲苯l〇m L。邊攪拌邊於室溫滴下無水甲基丙烯酸 1.34mL,攪拌1小時。之後,力[I入甲苯與蒸餾水各50mL, 洗淨有機層。接著’以3%K3P〇4水溶液、飽和食鹽水各 100mL進行1次洗淨。以硫酸鎂使有機層乾燥,餾去溶媒’ 得到目的化合物(2g、產率8 7% ) °Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform-d) JNM-EC A500 'H-NMR (500MHz) : 1.55-2.20 ( m, 28H ) , 4.73- 4.80 ( m, 2H ) , 4.86-4.92 ( m , 2H ) , 4.28 ( dd, 1H, J = 7.9, 1.5Hz) , 4.37 ( dd, 1H, J = 4.9, 2.5Hz ) , 4.65 ( dd, 1H, J = 7.9, 2.5Hz) , 5.59 ( d, 1H, J = 5.2 Hz) 1 3 C-NMR (125MHz): 26.65, 26. 82, 26. 90, 26. 95, 34. 12, 34 • 42, 34.61, 34.64, 34.89, 34. 96, 35 • 00, 35. 02, 3 5 . .06, 35 .35, 36.95, 37.02, 37.14, 37. 32, 62 • 77, 68. 06, 70. .23, 70. 58, 7 1.45, 95.93, 1 1 1.70, 1 112.56 Example 2 1, 2 : 3,4· Di-anthracene - (2,2-Adamantry) -6- 0-methylpropanone 1 fluorenyl-D-galactose It was synthesized in a 2000 mL 3-port eggplant type flask equipped with a dropping funnel and a reflux tube. 201120063, and 1,2:3,4-di-indole-(2,2-adamantyl)-D obtained in Example 1 was added. - galactose 2g, triethylamine 0.82g, N,N-dimethylaminopyridine 165mg, toluene l〇m L. 1.34 mL of anhydrous methacrylic acid was added dropwise at room temperature with stirring, and the mixture was stirred for 1 hour. Thereafter, the force [I was added to 50 mL of toluene and distilled water, and the organic layer was washed. Then, it was washed once with 100 mL of each of a 3% K3P〇4 aqueous solution and a saturated saline solution. The organic layer was dried over magnesium sulfate, and the solvent was evaporated to give the objective compound (2 g, yield: 7%).

核磁共振光譜(溶媒:氯仿-d )日本電子股份公司製 JNM-EC A500 *H-NMR ( 500MHz ) : 1.60-2. 1 Ο ( m, 3 1 Η ) , 4.08( ddd, 1 H, J = 6.1, 4.3, 1.9Hz ),4.21-4.3 0 ( i m, 2H ) ^ t 4.36 (< dd, 1H, J = 4.9, 2.5Hz ), 4.00 ( dd ,1 H, J — 11.3, 4. 3 Hz ): ,4.66 ( dd, 1H, J= 7.9, 2. 7Hz) , 5 .55 (d, 1H, J = 4. 9Hz ): ,5.56 ( s, 1 H ) ,6.12 ( s, 1H ) 1 : 3c-nmr (1 25MHz ): 18.19, 26. 62, 26 .84, 26 .90’ 26. .92, 34 .09, 34. 41, 34.57, 34.63, 34. 85, 34 .88, 34 .93, 34. .92, 3 5 .17, 35. 48, 36.96, 37.04, 37. 13, 37 .43 , 63 .99, 6 6. .17, 70. 21, 70.47, 70.71, 95.77, 11 1.65, 1 12. 57, 1 25 .62, -55- 201120063 136.24, 167.35 實施例3 1,2 : 5,6-二-〇_ 2,2-亞金剛烷基)-D-葡萄呋喃糖之 合成 除了使用葡萄糖來 s|μ代半乳糖之外,其餘係與實施例 _地實施而得到目的物(i3i.8g、產率89%)。 【化4 4】Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform-d) JNM-EC A500 manufactured by JEOL Ltd. *H-NMR (500MHz): 1.60-2. 1 Ο ( m, 3 1 Η ) , 4.08( ddd, 1 H, J = 6.1, 4.3, 1.9 Hz), 4.21 - 4.3 0 ( im, 2H ) ^ t 4.36 (< dd, 1H, J = 4.9, 2.5 Hz), 4.00 ( dd , 1 H, J — 11.3, 4. 3 Hz ): , 4.66 ( dd, 1H, J = 7.9, 2. 7Hz) , 5 .55 (d, 1H, J = 4. 9Hz ): , 5.56 ( s, 1 H ) , 6.12 ( s, 1H ) 1 : 3c-nmr (1 25MHz): 18.19, 26. 62, 26 .84, 26 .90' 26. .92, 34 .09, 34. 41, 34.57, 34.63, 34. 85, 34 .88, 34 .93 , 34. .92, 3 5 .17, 35. 48, 36.96, 37.04, 37. 13, 37 .43 , 63 .99, 6 6. .17, 70. 21, 70.47, 70.71, 95.77, 11 1.65, 1 12. 57, 1 25 .62, -55- 201120063 136.24, 167.35 Example 3 1,2 : 5,6-di-indole 2,2-adamantyl)-D-glucofuranose synthesis The target product (i3i.8 g, yield 89%) was obtained by the use of glucose to s|μ galactose. [4 4]

核磁共振光譜(溶媒:氯仿_d )日本電子股份公司製 JNM-ECA500 'H-NMR ( 5 00MHz ) : 1.50-2.40 ( m, 28H ) , 3.95( dd, 1H, J=8.7, 5.4Hz) , 4.〇5(dd, 1H, J=7.6, 2.8Hz), 4.17 (dd, 1H, J=8.6, 6.1HZ) ? 4.30-4.38 (m, 2H) , 4.54 (d, J = 3.7Hz) , 5.97 ( d, J = 3.7Hz, 1H) 13 C-NMR (125MHz ): 26. 68, 26. 73, 26. 84, 26. ,88, 3 1 .84, 34.3 0, 34.63, 34 .68, 34 .90, 34, ,96, 35, .05, 35. ‘10, 35, .75, 3 6.7 8, 3 6.9 8, 37 .91, 3 8 .05, 39 ‘24, 67 .45, 74, .53, 75 .78, 81.33, 84.3 8, 104. 84, 112 .67, 11 4 .91 實施例4 1,2 : 5,6-二-O- ( 2,2-亞金剛烷基)-3_〇_甲基丙烯醯 -56- 201120063 基-D -葡萄呋喃糖 烷基)-D-葡萄 烷基)-D-半乳 丨而得到目的物 除了使用1,2:5,6-二-0-(2,2-亞金剛 咲喃糖來取代1,2 ·· 3,4 -二-Ο - ( 2,2 -亞金剛 峨喃糖之外’其餘係與實施例2同樣地實方彳 (1.7g、產率 74%)。 【化4 5】Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform_d) JNM-ECA500 manufactured by JEOL Ltd. 'H-NMR (500 MHz): 1.50-2.40 (m, 28H), 3.95 (dd, 1H, J=8.7, 5.4Hz), 4.〇5(dd, 1H, J=7.6, 2.8Hz), 4.17 (dd, 1H, J=8.6, 6.1HZ) ? 4.30-4.38 (m, 2H) , 4.54 (d, J = 3.7Hz), 5.97 ( d, J = 3.7 Hz, 1H) 13 C-NMR (125MHz ): 26. 68, 26. 73, 26. 84, 26. ,88, 3 1 .84, 34.3 0, 34.63, 34 .68, 34 .90, 34, ,96, 35, .05, 35. '10, 35, .75, 3 6.7 8, 3 6.9 8, 37 .91, 3 8 .05, 39 '24, 67 .45, 74 , .53, 75 .78, 81.33, 84.3 8, 104. 84, 112 .67, 11 4 .91 Example 4 1,2 : 5,6-di-O-( 2,2-adamantyl) -3_〇_methacrylofluorene-56- 201120063 base-D-grape furanose alkyl)-D-glucosyl)-D-galactosylate to obtain the target except for 1,2:5,6- 2--0-(2,2-Adamantane sucrose to replace 1,2 ··3,4 -di- Ο- (2,2-a ruthenium hexose), the rest is the same as in the second embodiment Real formula (1.7g, yield 74%). [Chemical 4 5]

核磁共振光譜(溶媒:氯仿-d )日本 JNM-EC A5 00 1 H. -NMR ( 500MH z ) :1.54 -2.34 ( m, dd, 1H, J = 8.7, 5.4Hz ) ,4.12 ( dd, 1H, J - 4.1 5 ( dd, 1 H, J =8.4, 6.3Hz ), 4.2 1 -4.27 ( (d 1, J = :3.7Hz, 1H), 5 _ 57 ( s, 1H ) ,5 .97 1 H ),6.14 ( s,: IH) 13C-NMR ( 125MHz ) : 18 .3 1 , 26. 68, 26. 88, 31.84, 3 4.30, 34 .63, 34 • 68, 34.90, 3 5. 10, 35.75, 3 6.78, 36 .98, 37 • 91, 3 8. 05, 74. 53, 75.78, 8 1.33 ,: 34.38, 104. 84, 1 125 ;.34, 136.83, 167.2 1 實施例5 2,3 :5,6-二 -0-( 2,2 -亞金剛 烷基 :)- D-— 【子股份公司製 3 1H ) , 3.95( = 7.4, 3.1Hz), m, 2 Η ) , 4.55 (d, J = 3.7Hz, 26.73, 26.84, 34.96, 35.05, 39.24, 68.94, 12.67, 114.91, 露糖之合成 -57- 201120063 除了使用甘露糖來取代半乳糖之外,其餘係與實施例 1同樣地實施而得到目的物(1 12.5g、產率76%)。 【化4 6】Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform-d) Japan JNM-EC A5 00 1 H.-NMR (500MH z ) : 1.54 -2.34 ( m, dd, 1H, J = 8.7, 5.4Hz ) , 4.12 ( dd, 1H, J - 4.1 5 ( dd, 1 H, J = 8.4, 6.3 Hz ), 4.2 1 - 4.27 ( (d 1, J = : 3.7 Hz, 1H), 5 _ 57 ( s, 1H ) , 5.97 1 H ), 6.14 ( s,: IH) 13C-NMR ( 125MHz ) : 18 .3 1 , 26. 68, 26. 88, 31.84, 3 4.30, 34 .63, 34 • 68, 34.90, 3 5. 10, 35.75 , 3 6.78, 36 .98, 37 • 91, 3 8. 05, 74. 53, 75.78, 8 1.33 ,: 34.38, 104. 84, 1 125 ;.34, 136.83, 167.2 1 Example 5 2,3 : 5,6-di-0-( 2,2-ardamantyl:)- D-— [3H, manufactured by Subsidiary Co., Ltd., 3.95 (= 7.4, 3.1 Hz), m, 2 Η ) , 4.55 (d , J = 3.7 Hz, 26.73, 26.84, 34.96, 35.05, 39.24, 68.94, 12.67, 114.91, Synthesis of sucrose-57-201120063 The same procedure as in Example 1 was carried out except that mannose was used instead of galactose. The target product (1 12.5 g, yield 76%) was obtained.

OH 核磁共振光譜(溶媒:氯仿-d )日本電子股份公司製 JNM-EC A500 1H-NMR ( 500MHz ) : 1.60-2.05 ( m, 28H ) , 4.00- 4.10 ( m, 2H ) , 4.33 ( t, 1 H, J = 4.6Hz ),4.44( dd,1 H, J = 11.3,6.1Hz),4.60( d,1H,J = 5.8Hz),4.76( dd,1H, J = 5.8,3.7Hz) ,5.40 (d,1H,J = 2.1Hz) 1 3 lC-NMR ( 125MHz ): 26. 77, 26. 85, 26. 90, 27. 00, 34. .50, 34 • 5 7, 3 4.70, 34.87, 35 .00, 35. 03, 3 5 ' .04, 3 5. 05, 35. .28, 3 5 .71, 3 Ί .02, 37.16, 3 7 .3 1, 37. 40, 65 .54, 73 . 17, 79. .3 8, 80. 60, 85 • 00, 1 01.63, 111 .3 8, 115 • 79 實 施例6 2, 3 : 5,6- •二 -0-( 2,2-亞 金剛烷 基) -1 - 0-甲基 丙燃 :醯 基-D-甘露糖之合成 除了使用2,3: 5,6-二- Ο- (2,2-亞金剛烷基)-D-甘露 糖來取代1,2 : 3,4-二_0- ( 2,2-亞金剛烷基)-D-半乳哌喃 糖之外,其餘係與實施例2同樣地實施而得到目的物( -58- 201120063 2.〇g、產率 87%)。 【化4 7】NMR spectrum of OH (solvent: chloroform-d) JNM-EC A500 manufactured by JEOL Ltd. 1H-NMR (500MHz): 1.60-2.05 ( m, 28H ) , 4.00- 4.10 ( m, 2H ) , 4.33 ( t, 1 H, J = 4.6 Hz), 4.44 (dd, 1 H, J = 11.3, 6.1 Hz), 4.60 (d, 1H, J = 5.8 Hz), 4.76 (dd, 1H, J = 5.8, 3.7 Hz), 5.40 (d, 1H, J = 2.1 Hz) 1 3 lC-NMR (125MHz): 26. 77, 26. 85, 26. 90, 27. 00, 34. .50, 34 • 5 7, 3 4.70, 34.87, 35 .00, 35. 03, 3 5 ' .04, 3 5. 05, 35. .28, 3 5 .71, 3 Ί .02, 37.16, 3 7 .3 1, 37. 40, 65 .54, 73 . 17, 79. .3 8, 80. 60, 85 • 00, 1 01.63, 111 .3 8, 115 • 79 Example 6 2, 3 : 5,6- • 2-0-( 2,2- Aradamantyl) -1 - 0-methylpropanone: Synthesis of decyl-D-mannose except 2,3: 5,6-di-fluorenyl-(2,2-adamantyl)-D The same procedure as in Example 2 was carried out except that mannose was substituted for 1,2:3,4-di-#-(2,2-adamantyl)-D-galactose. (-58- 201120063 2.〇g, yield 87%). [化 4 7]

核磁共振光譜(溶媒:氯仿-d )日本電子股份公司製 JNM-EC A500 'H-NMR ( 500MHz ) : 1 .59-2. 1 3 ( m, 3 1 Η ) , 4.2 1-4.18 ( m, 2H ) , 4.33 (t, 1 H, J = 4.6Hz ) , 4.44 ( dd, 1 H, J = 11.3, 6.1Hz) , 4.60 (d, 1H, J=5.8Hz) , 4.76 (dd, J = 5.8 ,3 .7Hz ), 5 •40 ( d, 1H, J = 2.Π Hz ) ,5 .58 (s, 1 H ), 6.1 1 ( s, 1H ) 1 : JC-NMR ( 125MHz )·' 18 . 32, 26. 65 , 26. .97, 26. 91, 27. 00, 34.5 1 , 3 4.54, 34 .61 , 34 .65 , 34. ,87, 3 5 . .01, 3 5 . 03, 3 5. 07, 3 5.3 1 , 3 5.89, 36 .83, 3 7 • 19, 37. 43 , 3 7. .76, 65 . 35, 15. 04, 79.3 8, 80.60, 85.00, 10 1. ,63, 11 1 . 3 8, 1 15. 79, 1 2 5.1 9, 1 3 6.3 2, 1 67.22 實施例7 1,2: 4,5 -二-O- (2,2 -亞金剛烷基)-D -果哌喃糖之合 成 除了使用果糖來取代半乳糖之外,其餘係與實施例1 同樣地實施而得到目的物(1 2 5 · 8 g、產率8 5 % )。 -59- 201120063 【化4 8】Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform-d) JNM-EC A500 'H-NMR (500MHz): 1.59-2. 1 3 ( m, 3 1 Η ) , 4.2 1-4.18 ( m, 2H ) , 4.33 (t, 1 H, J = 4.6Hz ) , 4.44 ( dd, 1 H, J = 11.3, 6.1Hz) , 4.60 (d, 1H, J=5.8Hz) , 4.76 (dd, J = 5.8 , 3 .7 Hz ), 5 • 40 ( d, 1H, J = 2.Π Hz ) , 5 .58 (s, 1 H ), 6.1 1 ( s, 1H ) 1 : JC-NMR ( 125MHz )·' 18 32, 26. 65 , 26. .97, 26. 91, 27. 00, 34.5 1 , 3 4.54, 34 .61 , 34 .65 , 34. , 87, 3 5 . .01, 3 5 . 03, 3 5. 07, 3 5.3 1 , 3 5.89, 36 .83, 3 7 • 19, 37. 43 , 3 7. .76, 65 . 35, 15. 04, 79.3 8, 80.60, 85.00, 10 1. 63, 11 1 . 3 8, 1 15. 79, 1 2 5.1 9, 1 3 6.3 2, 1 67.22 Example 7 1,2: 4,5 -di-O-(2,2-ardamantyl) The synthesis of -D-fructofuran was carried out in the same manner as in Example 1 except that fructose was used instead of galactose, and the objective compound (1 2 5 · 8 g, yield: 85 %) was obtained. -59- 201120063 [Chem. 4 8]

核磁共振光譜(溶媒:氯仿-d )日本電子股份公司製 JNM-EC A500 1H-NMR ( 5 00MHz ) : 1 .50-2.3 2 ( m, 28H ) , 3.64 ( t, 1H, J = 7.7Hz ) , 3.96 ( d, 1H, J=8.6Hz) , 4.04 ( d, 1H, J =1 3 . 1 Hz ) ,4.1 0-4.24 ( m, 4H ) 1 3 'C-NMR ( 125MHz ): 26. 60, 26. 70, 26. .84, 26. .87, 34. .05, 34 .48, 3 4.75, 34 .79, 34 .96, 34. 99, 3 5 . .03, 3 5. ,22, 36. .29, 36 • 96, 3 7.06, 37 • 10, 3 7 • 11, 39. 21, 6 1 , .28, 70. .95, 7 1 . .79, 72. 92, 77 • 00, 104. 26, 112 .50, 114 .89 實施例8 1,2:4,5-二-0-(2,2-亞金剛烷基)-3-0-甲基丙烯醯 基-D-果哌喃糖 除了使用1,2 : 4,5-二- Ο- ( 2,2-亞金剛烷基)-D-果哌 喃糖來取代〗,2: 3,4-二-0-(2,2-亞金剛烷基)-D-半乳哌 喃糖之外,其餘係與實施例2同樣地實施而得到目的物( 2 . 1 7 g、產率 9 4 % )。 -60- 201120063 【化4 9】Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform-d) JNM-EC A500 1H-NMR (500 MHz): 1.50-2.3 2 ( m, 28H ) , 3.64 ( t, 1H, J = 7.7Hz ) , 3.96 ( d, 1H, J = 8.6 Hz) , 4.04 ( d, 1H, J =1 3 . 1 Hz ) , 4.1 0-4.24 ( m, 4H ) 1 3 'C-NMR ( 125MHz ): 26. 60 , 26. 70, 26. .84, 26. .87, 34. .05, 34 .48, 3 4.75, 34 .79, 34 .96, 34. 99, 3 5 . .03, 3 5. ,22 , 36. .29, 36 • 96, 3 7.06, 37 • 10, 3 7 • 11, 39. 21, 6 1 , .28, 70. .95, 7 1 . .79, 72. 92, 77 • 00 , 104. 26, 112 .50, 114 .89 Example 8 1,2:4,5-di-O-(2,2-adamantyl)-3-0-methylpropenyl-D- The pistylene is replaced by 1,2:4,5-di-indole-(2,2-adamantyl)-D-fructofuran, 2:3,4-di--0-( The objective compound (2.17 g, yield 94%) was obtained in the same manner as in Example 2 except for the 2,2-y-adamantyl)-D-galactose. -60- 201120063 [Chem. 4 9]

核磁共振光譜(溶媒:氯仿-d)日本電子股份公司製 JNM-EC A500Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform-d) JNM-EC A500

1 H-NMR ( 5 00MHz ) : 1 .44-2.3 1 ( m, 3 1 Η ) , 3.64 ( t, 1 H, J = 7.7Hz ) , 3.96 ( d, 1 H, J = 8.6Hz ) , 4.04 ( d, 1H, J — 13.1Hz) ,4. .1 3-4.24 ( m, 4H ) ,5. 4 9 ( s, 1H) ,6. 15 (s, 1 Η ) 1 3c-nmr ( 125MHz ):18. .24, 26. 60, 26. 70, 26. 84, 26 • 8 7, 3 4. 05, 34.48, 34 .75, 34.79, 34. 96, 34. 99, 35. .03, 35 .22, 3 6. 29, 3 6.96, 37 .06, 37 .10, 37. 11, 39. 21, 62. .67, 70 .95, 71 • 79, 72.92, 77.00, 104, .26, 11 2.50, 1 14. 89, 125.77, 13 6.65 5 167.54 實施例9 1,2 : 3,4 -二-O- ( 2,2-亞金剛烷基)-6-0-丙烯醯基-D- 半乳哌喃糖之合成 除了使用丙烯醯氯來取代無水甲基丙烯酸之外,其餘 係與實施例2同樣地實施而得到目的物(1.9g、產率88% ) -61 - 2011200631 H-NMR ( 5 00 MHz ) : 1. . . . . . ( d, 1H, J — 13.1Hz) , 4..1 3-4.24 ( m, 4H ) , 5. 4 9 ( s, 1H) , 6. 15 (s, 1 Η ) 1 3c-nmr ( 125MHz ) :18. .24, 26. 60, 26. 70, 26. 84, 26 • 8 7, 3 4. 05, 34.48, 34 .75, 34.79, 34. 96, 34. 99, 35. .03, 35 .22, 3 6. 29, 3 6.96, 37 .06, 37 .10, 37. 11, 39. 21, 62. .67, 70 .95, 71 • 79, 72.92, 77.00, 104, .26, 11 2.50, 1 14. 89, 125.77, 13 6.65 5 167.54 Example 9 1,2 : 3,4-di-O-( 2,2-adamantyl)-6-0-propenyl-D- The synthesis of the lactose was carried out in the same manner as in Example 2 except that acryloyl chloride was used in place of anhydrous methacrylic acid (1.9 g, yield 88%) -61 - 201120063

核磁共振光譜(溶媒:氯仿-d )日本電子股份公司製 JNM-ECA500 1 H-NMR ( 500MHz ) : 1.54-2.07 ( m, 28H ) , 4.11 ( ddd, 1H, J = 6.2, 4.3, 1.8Hz) , 4.20-4.32 ( m, 2Η) , 4.32 (dd, 1 Η, J = 4.9, 2.5Hz ) , 4.01 ( dd, 1 Η, J = 1 1.2, 4.3Ηζ ),4.63 ( dd, 1 Η, J = 7.7, 2·7Ηζ) , 5.98 ( dd, J = 9.7, 2.0Hz, 1Η) , 6.01 ( dd, J= 10.1Hz, J= 16.3Hz, 1H) , 6.47 (dd, J = 1 6. 1 , 1,4Hz, 1 H ) 1 3 C-NMR (125MHz ): 26. 59, 26. 57, 26. ,65, 26, ,87, 34. .15, 34.34, 34.76, 34.79, 34 • 8 1, 34. .88, 34 91, 34. .93, 35. ,33, 35.48, 36.95, 37.01, 37 .15, 37. .27, 63 .89, 6 6. .11, 70. ,19, 70.33, 70.65, 95.47, 111. 21, 11 2.36, 125. .22, 136.56,167,67。 實施例1 〇 〔(甲基)丙烯酸系單獨聚合物之合成〕 使甲基乙基酮8 4 m L於室溫進行1小時氮氣起泡。之後 ’加入實施例4所得之1,2 : 5,6 -二-〇 - ( 2,2 -亞金剛烷基)- -62- 201120063 3-0-甲基丙稀酿基-D-葡甸咲喃糖1〇8g ( 211mm〇1)與ν· 601 ( Dimethyl2,2’-AZ〇bis ( is〇butyrate ) 4g5 gmg ( 2.1 mmol ),加熱至8〇C ,將氮氣以i〇mL/min邊起泡邊攪 拌6小時。使反應溶液冷卻至室溫爲止後,邊攪拌邊滴入 甲醇84〇mL中。濾別生成的白色固體,將所得之白色固體 在減壓下進行乾燥後’得到下述構造式之i,2 _· 5,6_二·〇_ (2,2-亞金剛烷基)-3-0-甲基丙烯醯基-D_葡萄呋喃糖之 聚合物體l〇g (重量平均分子量(Mw) 18,6〇0、分散度( Mw/Mn ) =1.4)。結果顯示於表j。 【化5 1】Nuclear Magnetic Resonance Spectroscopy (Solvent: Chloroform-d) JNM-ECA500 manufactured by JEOL Ltd. 1 H-NMR (500MHz) : 1.54-2.07 ( m, 28H ) , 4.11 ( ddd, 1H, J = 6.2, 4.3, 1.8Hz) , 4.20-4.32 ( m, 2Η) , 4.32 (dd, 1 Η, J = 4.9, 2.5Hz ) , 4.01 ( dd, 1 Η, J = 1 1.2, 4.3Ηζ ), 4.63 ( dd, 1 Η, J = 7.7, 2·7Ηζ), 5.98 ( dd, J = 9.7, 2.0Hz, 1Η), 6.01 ( dd, J= 10.1Hz, J= 16.3Hz, 1H) , 6.47 (dd, J = 1 6. 1 , 1 , 4Hz, 1 H ) 1 3 C-NMR (125MHz ): 26. 59, 26. 57, 26. ,65, 26, ,87, 34. .15, 34.34, 34.76, 34.79, 34 • 8 1, 34 .88, 34 91, 34. .93, 35. , 33, 35.48, 36.95, 37.01, 37 .15, 37. .27, 63 .89, 6 6. .11, 70. ,19, 70.33, 70.65 , 95.47, 111. 21, 11 2.36, 125. .22, 136.56,167,67. Example 1 〇 [Synthesis of (meth)acrylic acid alone polymer] Methyl ethyl ketone 8 4 ml was bubbled with nitrogen gas at room temperature for 1 hour. After adding '1,2: 5,6-di-anthracene-(2,2-aradamantyl)--62- 201120063 3-0-methyl propylene-based-D-Guandian 1 〇 8g ( 211mm 〇 1) and ν· 601 (Dimethyl 2, 2'-AZ〇bis ( is〇 butyrate ) 4g5 gmg ( 2.1 mmol ), heated to 8 ° C, nitrogen gas i〇mL / min The mixture was stirred for 6 hours while bubbling. After cooling the reaction solution to room temperature, it was added dropwise to 84 mL of methanol while stirring. The resulting white solid was filtered, and the obtained white solid was dried under reduced pressure. The polymer of the following formula i,2 _· 5,6_di·〇_(2,2-adamantyl)-3-0-methylpropenyl-D_glucofuranose l〇g (weight average molecular weight (Mw) 18,6〇0, degree of dispersion (Mw/Mn) = 1.4). The results are shown in Table j. [Chem. 5 1]

式中η係重複之數。 比較例1 使以下之聚合物體遵照Havard, Vladimirov,Ν.The number of η repeats in the formula. Comparative Example 1 The following polymer bodies were made in accordance with Havard, Vladimirov, Ν.

Frechet,J. M. Macromolecules 1 999,32,86_ 予以合成。 結果顯示於表1。 【化5 2】 201120063 式中η係重複之數。 〔表ηFrechet, J. M. Macromolecules 1 999, 32, 86_ was synthesized. The results are shown in Table 1. [化5 2] 201120063 The number of η-system repeats in the formula. [Table η

Mw Mw/Mn Tg(°C) 比較例1 20,200 1.42 157 實施例10 18,600 1.40 >250 實施例1 1 〔(甲基)丙烯酸系共聚物之合成〕 於甲基異丁基酮中,重量比0.1/1.0/1.0/1.0置入2,2’-偶氮雙(異丁酸)二甲基/單體Α/單體Β/單體C,於加熱還 流下攪拌2小時。單體C方面,係使用實施例2所得之I,2 : 3,4-二-0-(2,2-亞金剛烷基)-6-0-甲基丙烯醯基_〇-半乳 哌喃糖。之後,進行3次將反應液與大量的甲醇注入水的 混合溶媒中使其沈澱之動作進行純化。其結果,得到單體 Α:單體Β:單體C之共聚合組成(mol) = 28: 42: 30、 重量平均分子量(Mw) 7 542、分散度(Mw/Mn) 1.56的共 聚物。Mw Mw/Mn Tg (°C) Comparative Example 1 20,200 1.42 157 Example 10 18,600 1.40 >250 Example 1 1 [Synthesis of (meth)acrylic copolymer] In methyl isobutyl ketone, weight ratio 0.1/1.0/1.0/1.0 was placed in 2,2'-azobis(isobutyric acid) dimethyl/monomer oxime/monomer oxime/monomer C, and stirred under heating for 2 hours. In the case of monomer C, I, 2: 3,4-di-0-(2,2-adamantyl)-6-0-methylpropenyl hydrazine-hydrazine-half-pipeper obtained in Example 2 was used. Brown sugar. Thereafter, the operation of precipitating the reaction solution with a large amount of methanol and water was carried out three times to purify it. As a result, a copolymer of monomer Α: monomer Β: monomer C having a copolymerization composition (mol) = 28:42:30, a weight average molecular weight (Mw) of 7 542, and a degree of dispersion (Mw/Mn) of 1.56 was obtained.

-64- 201120063 實施例1 2 〔光阻膜之形成〕 對實施例11之共聚物,加入作爲光酸產生劑之九氟丁 烷磺酸三苯基锍5wt%,以丙二醇單甲基醚乙酸酯溶解使此 等成爲l〇wt %,以調製光阻組成物。在砂晶圓上塗佈調製 之光阻組成物,以1 1 〇 °C進行烘烤6 0秒,形成光阻膜。將 如此所得之晶圓藉由波長248nm之光,以不同的曝光量進 行數點開放式曝光。曝光後立刻於1 1 0 °C加熱6 0秒後,以 氫氧化四甲基銨水溶液(2.3 8質量% )顯像6 0秒。對此時 曝光量之膜厚變化顯示於圖1。 如此實施可確認,藉由曝光量會產生膜厚變化,而具 有作爲感光性樹脂之機能。 〔產業上的可利用性〕 本發明之衍生物(I )〜(VIII )及高分子化合物,係 可使用作爲半導體用光阻材料、彩色光阻材料、印刷電路 基板形成用光阻材料及抗焊劑材料等之光阻材料。又,本 發明之衍生物(I )〜(VIII )及高分子化合物,係可使用 作爲半導體用基底膜、黑色矩陣材料、底部塡充劑、光記 錄材料、光學接著劑及密封劑、奈米壓印(nanoimprint) 用材料。本發明之衍生物(IX )〜(X111 ) (XXX)、( XXXI)係可使用作爲製造衍生物(I)〜(VIII)用的中 間體。 上述雖然詳細地說明了幾個本發明之實施形態及/或 -65- 201120063 實施例,但此領域具通常知識者,在實質上不偏離本發明 之新穎的教示及效果下,可容易地在此等例示之實施形態 及/或實施例中加入多數變更。因此,此等之多數變更含 於本發明之範圍中》 此說明書中記載之文獻的內容在此全部援用。 【圖式簡單說明】 〔圖1〕顯示對實施例12所製作之光阻膜曝光量的膜 厚變化之圖。 -66 --64- 201120063 Example 1 2 [Formation of Photoresist Film] To the copolymer of Example 11, 5 wt% of triphenylsulfonium nonafluorobutanesulfonate as a photoacid generator was added to propylene glycol monomethyl ether B. The ester is dissolved so that it becomes 10% by weight to modulate the photoresist composition. The prepared photoresist composition was coated on a sand wafer and baked at 1 1 〇 ° C for 60 seconds to form a photoresist film. The wafer thus obtained was subjected to a number of open exposures with different exposure amounts by light having a wavelength of 248 nm. Immediately after the exposure, the mixture was heated at 110 ° C for 60 seconds, and then developed with an aqueous solution of tetramethylammonium hydroxide (2.3 8 mass%) for 60 seconds. The film thickness change of the exposure amount at this time is shown in Fig. 1. As a result of this, it was confirmed that the film thickness was changed by the amount of exposure, and the function as a photosensitive resin was exhibited. [Industrial Applicability] The derivatives (I) to (VIII) and the polymer compound of the present invention can be used as a photoresist material for a semiconductor, a color resist material, a photoresist material for forming a printed circuit board, and an anti-resistance. A photoresist material such as a flux material. Further, the derivatives (I) to (VIII) and the polymer compound of the present invention can be used as a base film for a semiconductor, a black matrix material, a bottom entangler, an optical recording material, an optical adhesive and a sealant, and a nano Material for embossing (nanoimprint). The derivatives (IX) to (X111) (XXX) and (XXXI) of the present invention can be used as intermediates for the production of the derivatives (I) to (VIII). Although the embodiments of the present invention and/or the -65-201120063 embodiment have been described in detail above, those skilled in the art can readily at the same time without departing from the novel teachings and effects of the present invention. Many variations are added to these exemplary embodiments and/or embodiments. Therefore, many such changes are intended to be included within the scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a graph showing changes in film thickness of a photoresist film produced in Example 12. -66 -

Claims (1)

201120063 七、申請專利範圍: 1. 一種下述以式(D〜(V)所示之葡萄糖、甘露 糖、阿洛酮糖、山梨糖、塔格糖、阿洛糖、阿卓糖、古洛 糖、艾杜糖、太洛糖之哌喃糖衍生物及呋喃糖衍生物, 【化5 4】201120063 VII. Patent application scope: 1. A kind of glucose, mannose, psicose, sorbose, tagatose, allose, altogether, gulo, represented by the formula (D~(V) Sugar, idose, glucopyranose derivatives and furanose derivatives, [5, 5] (IV)(IV) (V) 〔式中,係獨立地表示氫、可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且Ri與R·2及/或R·3與R4亦可連結形成環 ;惟,式(11 ) 、 ( V )中’ R,〜R4並無全爲甲基之情況 表示以下述式所示之基; 【化5 5】(V) [wherein, independently represents hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and Ri and R·2 And/or R·3 and R4 may be bonded to each other to form a ring; however, in the case where the formulas (11) and (V) are not all methyl groups, the group represented by the following formula; 5] R7 -67- 201120063 (式中,R6、R·7係獨地表不氫、可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且R6與R?可一起形成羰基; m、η係獨立地表示〇以上4以下之整數; η及/或m爲2以上時’複數的R6、R·7可各自相同或相異 1 s表示0或1 ; X表示下述以式(1 )〜(3 )之任一者所示的聚合性 基: lit 5 6) Rg I 0 Re II I ru. -c—C—CH2 •CH2 一 CH—CH2 \j —ch2-ch—ch2 ch2-o (1) (2) (3) (式中,R8表示氣原子、齒素原子、甲基或鹵化甲基 ,且R9表示碳數1〜5之烴基))〕。 2 ·—種下述以式(VI )所示之半乳哌喃糖衍生物及 果哌喃糖衍生物、以(V )所示之果哌喃糖衍生物、以式 (v π )或(IV )所示之半乳呋喃糖衍生物、以及以式( VIII)所示之果呋喃糖衍生物’ -68- 201120063 【化5 7R7-67-201120063 (wherein R6 and R·7 are independently an aliphatic hydrocarbon group which may not contain hydrogen, may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent And R6 and R? may together form a carbonyl group; m and η independently represent an integer of 4 or less in 〇; and when η and/or m are 2 or more, 'R6 and R·7 of plural numbers may be the same or different 1 s. 0 or 1; X represents a polymerizable group represented by any one of the following formulas (1) to (3): lit 5 6) Rg I 0 Re II I ru. -c-C-CH2 • CH2 CH—CH2 \j —ch2-ch—ch2 ch2-o (1) (2) (3) (wherein R8 represents a gas atom, a dentate atom, a methyl group or a halogenated methyl group, and R9 represents a carbon number of 1~ 5 of the hydrocarbon group))]. 2 - a galactose-halfose derivative and a carraghalose derivative represented by the formula (VI), a peptidose derivative represented by (V), or a formula (v π ) or a galactose furanose derivative represented by (IV), and a fructofuran derivative represented by the formula (VIII) '-68- 201120063 [Chem. 5 7 (IV) 〔式中,Rl〜R4、Rl1〜RM係獨立地表示氫、可含 雜原子及/或取代基之脂肪族烴基 '或3 J曰句雑原子及/ 取代基之脂肪族環狀烴基,且R丨與r2、p D 2心與R4、Rn與R 及/或R13與R14亦可連結形成環;惟,贫 式(V )之Rl〜R4 Rn〜Rm並無全爲甲基之情況; 表示以下述式所示之基; 【化5 8】(IV) wherein R1 to R4 and Rl1 to RM each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic ring of a 3 J 雑 雑 atom and/or a substituent a hydrocarbon group, and R丨 and r2, p D 2 core and R4, Rn and R and/or R13 and R14 may also be bonded to form a ring; however, R1 to R4 Rn~Rm of the formula (V) are not all methyl The case; represents a base represented by the following formula; [Chem. 5 8] (式中,R6、R7係獨立地表示氫、可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且R 6與R 7可一起形成羰基; -69- 201120063 m、η係獨立地表示0以上4以下之整數; η及/或m爲2以上時,複數的R6、R7可各自 s表示0或1 ; X表示下述以式(1 )〜(3 )之任一者所 【化5 9】 | ^8 —ch2-ch-ch2 一c—c==ch2 、〇/ (1) (2) (式中,R8表示氫原子、鹵素原子、甲基 ,且R9表示碳數1〜5之烴基))〕。 3·如請求項1或2中記載之衍生物,其中 R3與R4、或Ru與R12及R13與R14係連結而形成 子及/或取代基之金剛烷。 4.如請求項1或2中記載之衍生物,其中 R3與R4、或Rm與R12及Rl3與Rm係連結而形成 金剛烷。 5 .如請求項1或2中記載之衍生物,其中, 1 )所示之聚合性基。 6. 如請求項1或2中記載之衍生物,其中, 7. —種下述以式(IX)、式(X)、式( XXX )及式(XXXI)所示之葡萄糖、甘露糖 、山梨糖、塔格糖、阿洛糖、阿卓糖、古洛糖 相同或相異 示的聚合性 R9 I ——CH2-CH—CH; ch2-o (3) 或鹵化甲基 ’ R1與及 可含有雜原 ,Ri與R2及 金剛烷醇或 X係以式( m = 0 〇 XI)、式( 、阿洛酮糖 、艾杜糖、 -70- 201120063 太洛糖之哌喃糖衍生物及呋喃糖衍生物, 【化6 0】(wherein R6 and R7 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and R 6 and R 7 The carbonyl group may be formed together; -69-201120063 m, η is an integer representing 0 or more and 4 or less; and when η and/or m is 2 or more, the plural R6 and R7 may each represent 0 or 1; X represents the following Any one of the formulas (1) to (3) [化5 9] | ^8 —ch2-ch-ch2 a c—c==ch2 , 〇 / (1) (2) (wherein R8 represents A hydrogen atom, a halogen atom, a methyl group, and R9 represents a hydrocarbon group having 1 to 5 carbon atoms))]. The derivative according to claim 1 or 2, wherein R3 and R4, or Ru and R12 and R13 and R14 are bonded to form adamantane of a sub-and/or a substituent. 4. The derivative according to claim 1 or 2, wherein R3 and R4, or Rm and R12 and Rl3 are bonded to Rm to form adamantane. 5. The derivative according to claim 1 or 2, wherein the polymerizable group represented by 1). 6. The derivative according to claim 1 or 2, wherein the glucose, mannose, and the following formula (IX), formula (X), formula (XXX), and formula (XXXI) are used. Polymeric R9 I of the same or different properties of sorbose, tagatose, allose, altrose, gulose, CH2-CH-CH; ch2-o (3) or halogenated methyl 'R1 and May contain miscellaneous, Ri and R2 and amantadine or X-based formula ( m = 0 〇 XI), formula ( , psicose, idose, -70- 201120063 thaoseose peptose derivative And furanose derivatives, [chemical 60] 〔式中,Ri〜R4、Rii〜Ri4係獨立地表示氫、可含有 雜原子及/或取代基之脂肪族烴基、或可含有雜 取代基之脂肪族環狀烴基,且1^與R2、R3與R4、11與R!2 及/或R! 3與Rl4亦可連結形成環;惟,阿洛糖、阿卓糖、葡 萄糖、甘露糖之哌喃糖衍生物及呋喃糖衍生物中,R U〜 R丨4並無全爲甲基之情況;又,式(XXXI )中,Ri〜R4全 爲甲基時,並無1^與R2連結而形成環己烷環之情況及R3與 R4連結而形成環己烷環之情況; m3表示以下述式所示之基; -71 - 201120063 【化6 1】[wherein, Ri to R4 and Rii to Ri4 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero substituent, and 1 and R2; R3 and R4, 11 and R!2 and/or R! 3 and Rl4 may also be linked to form a ring; however, among allose, altrose, glucose, pentose pistose derivatives and furanose derivatives, When RU to R丨4 are not all methyl groups; in the formula (XXXI), when Ri to R4 are all methyl groups, there is no case where a ring is formed by linking R2 to R2 and R3 and R4 are formed. a case where a cyclohexane ring is formed by linking; m3 represents a group represented by the following formula; -71 - 201120063 [Chem. 6 1] (式中,Re、R7係獨立地表示氫 '可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基’且R·6與& 7可~起形成羯基; m、η係獨立地表示〇以上4以下之整數; η及/或m爲2以上時’複數的r6、r7可各自相同或相異 s表示0或1 ; L表示羥基、鹵素原子; 惟,式(XXX)中,s及m爲0而L爲羥基時,1^〜114並 無全爲甲基之情況)〕。 8.—種下述以式(XII) 、(XXXI)所示之果哌喃糖 衍生物及以式(XIII)所示之果呋喃糖衍生物, 【化6 2】(In the formula, Re and R7 independently represent an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and R·6 and & 7 may form a sulfhydryl group; m and η independently represent an integer of 4 or more 〇; when η and/or m are 2 or more, 'the plural r6 and r7 may each be the same or the different s represents 0 or 1; L represents a hydroxyl group or a halogen atom; however, in the formula (XXX), when s and m are 0 and L is a hydroxyl group, 1^ to 114 are not all methyl groups). 8. The following: a fruit-pentane sugar derivative represented by the formula (XII) or (XXXI) and a furfuran derivative represented by the formula (XIII), [Chem. 6 2] 〔式中,Ri〜R4係獨立地表示氫、可含有雜原子及/ -72- 201120063 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且Rl與R2、Rs與b亦可連結形成環; Rm〜R34係獨立地表示氫、可含有雜原子及/或取代基之碳 數爲2以上的脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且汉门與尺32及/或!^3與R34係可形成以碳 鏈連結而成之碳數爲4、5或7以上的環;又,式(χχχι ) 中’ R!〜R4全爲甲基時’並無1^與R2連結而形成環己烷環 之情況及R3與R4連結而形成環己烷環之情況; M3表示以下述式所示之基; 【化6 3】[wherein, Ri to R4 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and /72-201120063 or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and R1 R2 to Rb may be bonded to each other to form a ring; and Rm to R34 each independently represent hydrogen, may contain a hetero atom, and/or a substituent having an aliphatic hydrocarbon group having 2 or more carbon atoms, or may contain a hetero atom and/or a substituent. Base of aliphatic cyclic hydrocarbon groups, and Hanmen and ruler 32 and / or! ^3 and R34 can form a ring having a carbon number of 4, 5 or more, which is linked by a carbon chain; and, in the formula (χχχι), when 'R!~R4 are all methyl groups', there is no 1^ and R2 a case where a cyclohexane ring is formed to form a ring, and a case where R3 and R4 are bonded to form a cyclohexane ring; M3 represents a group represented by the following formula; [Chem. 6 3] (式中,R6、R?係獨立地表示氫、可含有雜原子及/ 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且R6與R7可一起形成羰基; m ' η係獨立地表示0以上4以下之整數; η及/或m爲2以上時,複數的R6、R7可各自相同或相異 » s表示0或1 ; L表示羥基、鹵素原子)〕° 9. 如請求項7或8中記載之衍生物’其中’ R !與R2及 113與114、或r3I與R32及R33與R34係連結而形成金剛烷。 10. 如請求項7或8中記載之衍生物’其中’ m=0、L -73- 201120063 係羥基》 11.—種請求項〗〜6中任一項所記載之衍生物之製造 方法’其係於請求項7〜i 〇中任—項所記載之衍生物上使 下述以式(1 )〜(3 )之任一所示之具有聚合性基之化合 物反應, 【化6 4】 Rg I -CH2~CH—CH2 CH2~ο (3) II I —ch2-ch—CH2 —C—C=CH2 ⑴ (2) (式中’ R8表示氫原子、鹵素原子、甲基或鹵化甲基 ,且R9表示碳數1〜5之烴基)。 12.—種下述以式(XX )〜(XXII )所示之單糖類 衍生物之製造方法,其係於金剛烷酮上使半乳糖、葡萄糖 、甘露糖、阿洛酮糖、山梨糖、塔格糖、阿洛糖、阿卓糖 、古洛糖、艾杜糖、太洛糖、果糖反應’ 【化6 5】(wherein R6 and R? independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and/or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and R6 and R7 may The carbonyl group is formed together; m ' η is independently an integer of 0 or more and 4 or less; when η and/or m is 2 or more, the plural R 6 and R 7 may be the same or different each other » s represents 0 or 1; L represents a hydroxyl group, Halogen atom)] 9. The derivative described in the claim 7 or 8 wherein R' and R2 and 113 and 114, or r3I and R32 and R33 and R34 are bonded to form adamantane. 10. The method of producing a derivative according to any one of claims 1 to 8 wherein the derivative is described in the item 7 or 8 wherein the 'm=0, L-73-201120063 is a hydroxyl group. It is obtained by reacting a compound having a polymerizable group represented by any one of the following formulas (1) to (3) on a derivative described in any one of the claims 7 to i, (Chem. 6 4) Rg I -CH2~CH-CH2 CH2~ο (3) II I —ch2-ch—CH 2 —C—C=CH 2 (1) (2) (wherein R 8 represents a hydrogen atom, a halogen atom, a methyl group or a halogenated methyl group And R9 represents a hydrocarbon group having 1 to 5 carbon atoms). 12. A method for producing a monosaccharide derivative represented by the following formula (XX) to (XXII), which is based on adamantanone to impart galactose, glucose, mannose, psicose, sorbose, Tagatose, allose, altrose, gulose, idose, telose, fructose reaction [Chem. 6 5] (XX)(XX) 所示之基〕Base shown] 〔Μ 3表示以下述 -74- 201120063 【化6 6】[Μ 3 indicates the following -74- 201120063 [Chem. 6 6] (式中,Re、R·7係獨立地表示氫、可含有雜原子及y 或取代基之脂肪族烴基、或可含有雜原子及/或取代基之 脂肪族環狀烴基,且116與R7可一起形成羰基; m、η係獨立地表示0以上4以下之整數; s表示0或1 ; η及/或m爲2以上時,複數的R·6、R·7可各自相同或相異 t L表示羥基、鹵素原子)〕。 1 3 . —種高分子化合物,其係使請求項1〜6中任一項 所記載之衍生物聚合而成者。 I4. 一種半導體用光阻材料及半導體用基底膜,其係 使用請求項1〜6中任一項所記載之衍生物或請求項1 3中記 載之高分子化合物者》 1 5 . —種光阻圖型形成方法,其係含有 使用含有請求項1〜6中任一項所記載之衍生物或請求 項1 3中記載之高分子化合物之光阻組成物,而於支持體上 形成光阻膜之步驟、 使前述光阻膜曝光之步驟、及 使前述光阻膜顯像而形成光阻圖型之步驟。 -75- 201120063 16‘一種硬化物,其係使請求項丨〜6中任一項所 之衍生物或請求項13中記載之高分子化合物藉由加熱 照射而硬化者。 17. —種彩色光阻及黑色矩陣材料其係使用請 1〜6中任一項所記載之衍生物或請求項13中記載之高 化合物者。 1 8. —種印刷電路基板形成用光阻材料及抗焊劑 ,其係使用請求項1〜6中任一項所記載之衍生物或請 13中記載之高分子化合物者。 1 9. 一種底部塡充劑,其係使用請求項〗〜6中任 所記載之衍生物或請求項1 3中記載之高分子化合物者 20. —種光記錄材料’其係使用請求項1〜6中任 所記載之衍生物或請求項1 3中記載之高分子化合物者 2 1 . —種光學接著劑及密封劑,其係使用請求項 中任一項所記載之衍生物或請求項1 3中記載之高分子 物者。 22.—種奈米壓印(nanoimprint)用材料,其係 請求項1〜6中任一項所記載之衍生物或請求項1 3中記 高分子化合物者》 記載 或光 求項 分子 材料 求項 -項 〇 -項 0 1〜6 化合 使用 載之 •76-(In the formula, Re and R·7 each independently represent hydrogen, an aliphatic hydrocarbon group which may contain a hetero atom and y or a substituent, or an aliphatic cyclic hydrocarbon group which may contain a hetero atom and/or a substituent, and 116 and R7 The carbonyl group may be formed together; m and η independently represent an integer of 0 or more and 4 or less; s represents 0 or 1; and when η and/or m is 2 or more, the plural R·6, R·7 may be the same or different. t L represents a hydroxyl group, a halogen atom)]. A polymer compound obtained by polymerizing a derivative described in any one of claims 1 to 6. I. A photoresist film for a semiconductor and a base film for a semiconductor, which is the derivative according to any one of claims 1 to 6, or the polymer compound described in claim 1 1 . A resist pattern forming method comprising forming a photoresist on a support by using a photoresist composition containing the derivative according to any one of claims 1 to 6 or the polymer compound described in claim 13 a step of forming a film, a step of exposing the photoresist film, and a step of developing the photoresist film to form a photoresist pattern. -75- 201120063 16 'A hardened material which is obtained by subjecting the derivative of any one of claims 1-6 to the polymer compound of claim 13 to hardening by heating. 17. A color resist and a black matrix material, wherein the derivative described in any one of items 1 to 6 or the high compound described in claim 13 is used. (1) A photoresist material for forming a printed circuit board and a solder resist, which is the derivative according to any one of claims 1 to 6, or the polymer compound described in the above. 1 . A bottom tamping agent, which is the use of the derivative described in any of claims 1-6, or the polymer compound described in claim 13 of the invention. The derivative according to any one of the above-mentioned items, or the polymer compound according to claim 1 of the invention, wherein the optical adhesive and the sealant are used as the derivative or the claim described in any one of the claims. The polymer described in 1 3 is a polymer. 22. A material for nanoimprint, which is described in any one of claims 1 to 6, or a polymer compound in claim 1 or as claimed in the optical product. Item-item-item 0 1~6 combined use: 76-
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