201116905 六、發明說明： 【發明所屬之技術領域】 本發明係關於液晶顯示器製程，更特別關於配向裝置 及方法。 【先前技術】 在液晶顯示器中，配向膜（alignment film)為重要元件之 …^而習知液晶面板所用的配向布，在摩擦配向（rubbi^> 鲁许 备易產生靜電，影響生產液晶面板的配向品質。雖 二使用胚棉質配向布(rubbing cotton)略有改善效果，仍然不 „纟示上所述，液晶面板生產業者亟需具有抗靜電效 果的配向布。 ㈣t日本特開平Μ49139中’採用推雜導電碳黑之螺 果…乍為配向布織造用紗，試圖增強配向布之抗靜電效 纖IS日本特開2〇〇7_232938中’採用似、結構的導電i 本v :為配向布織造用的起絨紗(pileyarn)，試圖增強配向 籲之彳/L靜電效果。在日本特2刪_17 二 導雷妈休用摻雜 嫘縈絲作為配向布織造起絨用紗，試圖择 向布之抗靜f絲。 θ強配 然而上述作法均存有缺陷。舉例來說，纖維中掺雜之 電材料如碳黑或其他導電微粒，在高速刷磨 =分離並散布在配向獏上，反而影響產品性質。至= 冓之導電合纖紗之成本高昂’將會增加製程成本。如‘ 二來，目前仍需更方便快速的方法製備配向布，以 如配向膜之良率。 ° 201116905 【發明内容】 本發明提供一種配向裝置，包括承載平台；滾筒，位 於承載平台上方；以及配向布，包覆滾筒表面；其中配向 布係絲光棉。 本發明亦提供一種一種配向方法，包括提供上述之配 向裝置；提供具有配向材料之基板至承載平台上；使滾筒 表面之絲光棉刷磨配向材料，形成配向膜。 【實施方式】 如第1圖所示，本發明採用常見之配向裝置，其含有 承載裝置5及滾筒2a。滾筒2a之表面覆有配向布1，以組 成刷磨元件2。接著將含有配向材料4之基板3置於承載 裝置5上，並以傳動元件如履帶使基板3沿固定方向移動 (如圖示之箭頭）。當基板3經過旋轉之滾筒2a下方時，配 向布將刷磨基板3上之配向材料4如聚胺酸或聚醯胺，使 配向材料4之表面形成溝槽以完成配向膜。 本發明的重點在於配向布1為絲光綿。絲光作用即應 用強鹼溶液處理原棉，可降低原棉纖維的結晶度，進而增 進其吸濕率（Textile Chemistry vol.II, By R.H.Peters,201116905 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a liquid crystal display process, and more particularly to an alignment device and method. [Prior Art] In the liquid crystal display, the alignment film is an important component... and the alignment cloth used in the liquid crystal panel is conventionally used in the rubbing alignment (rubbi^), which is easy to generate static electricity and affects the alignment of the liquid crystal panel. Quality. Although the use of raw cotton fabric has a slight improvement effect, it is still not mentioned in the above description, LCD panel manufacturers need an anti-static effect alignment cloth. (4) t Japanese special Kaiping 49139 Pushing the conductive carbon black screw... 乍 is the weaving yarn for the aligning cloth, trying to enhance the antistatic effect fiber of the aligning cloth IS Japan special opening 2〇〇7_232938 'using similar, structural conductive i this v: weaving for the matching cloth The use of the pile yarn (pileyarn), trying to enhance the matching effect of the 彳 / L electrostatic effect. In Japan special 2 delete _17 two guides Lei Ma used doped silk as a matching cloth weaving yarn, trying to choose The anti-static filament of the cloth. θ strong match, however, the above methods have defects. For example, the electric material doped in the fiber, such as carbon black or other conductive particles, is brushed at high speed = separated and scattered on the alignment raft. anti- Affecting the nature of the product. To = the high cost of the conductive fiber yarn will increase the cost of the process. For example, it is still more convenient and quick to prepare the alignment cloth, such as the yield of the alignment film. ° 201116905 [ SUMMARY OF THE INVENTION The present invention provides an alignment device including a load bearing platform, a drum disposed above the load bearing platform, and an alignment cloth covering the surface of the drum; wherein the alignment cloth is mercerized cotton. The present invention also provides an alignment method, including providing the above Aligning device; providing a substrate with an alignment material to the carrying platform; and arranging the alignment material on the surface of the roller to form an alignment film. [Embodiment] As shown in Fig. 1, the present invention adopts a common alignment device, which contains The carrying device 5 and the roller 2a. The surface of the roller 2a is covered with an alignment cloth 1 to constitute the brushing member 2. Then, the substrate 3 containing the alignment material 4 is placed on the carrier device 5, and the substrate 3 is driven along with a transmission member such as a crawler belt. Moving in a fixed direction (as indicated by the arrow). When the substrate 3 passes under the rotating drum 2a, the alignment cloth will brush the substrate 3 The material 4, such as polyamine or polyamine, forms a groove on the surface of the alignment material 4 to complete the alignment film. The focus of the invention is that the alignment cloth 1 is a mercerized cotton. The mercerizing effect is to treat the raw cotton with a strong alkali solution, which can reduce the raw cotton. The crystallinity of the fiber, which in turn increases its moisture absorption rate (Textile Chemistry vol. II, By RHPeters,
Elsevier Publishing Company 1967. New York，P351)及表面 光澤的效果，甚至具有絲稠的光滑觸感。一般絲光棉之應 用主要為衣物等產品，並無工業上相關應用。Elsevier Publishing Company 1967. New York, P351) and surface gloss effect, even with a silky smooth touch. Generally, the application of mercerized cotton is mainly for clothing and other products, and there is no industrial related application.
在本發明一實施例中，作為配向布1之絲光棉其厚度 介於2.0mm至3.5mm之間。若絲光棉之厚度過薄，則會造 成刷基板配向作用後基板的液晶預傾角偏低，使液晶悬冑I 201116905 冗度偏低。若絲光綿之厚度過厚，則會造成刷基板配向作 用後到傷基板。在本發明一實施例中，絲光棉底紗之經密 ;丨於40根/英吋至18〇根/英吋之間。若底紗之經密過稀， 則會造成©持毛絨力度不夠而鬆弛喪失刷基板配向作用。 #底紗之_過密’則會造成固持毛絨力度夠強而緊密一 體喪失均勻刷基板的配向作用。在本發明一實施例中，底 緯在、介於60根/英吋至28〇根/英吋5之間。若底紗之 過稀’則造成毛絨密度不夠，致使其刷基板配向作用 •力偏，。右.底紗之緯密過密，則會造成固持毛絨力度偏高 @緊密-體無法均句發揮刷基板配向作用。在本發明一實 施例中’絲光棉之織物組織較佳為天鵝絨組織(veWet)。若 絲光棉採用其他組織如縱凸條織物（c〇rd fabrics)、斜紋地緯 棉天鶴絨織物（twill back velveteen)、或條子絨織物 (corduroy)，則縱凸條織物有絨毛不夠長、斜紋地緯棉天鵝 絨織物有絨毛密度不夠、條子絨織物有絨毛過長易起糾纏 等缺點。 秦 上述絲光绵之形成方法係由強鹼溶液處理原棉或棉紗 後，再將絲光處理後之原棉或棉紗織成胚棉質配向布。在 本發明一實施例中’原棉細度介於3 2至4.2纖維細度 (micronaire)。若原棉細度過細，則纖維的剛性不夠，使其 刷基板的作用力偏弱。若原棉細度過粗，則纖維的剛性過 大，使其刷基板的作用力過強刮傷基板。在本發明一實施 例中，綿紗包括20至80支數之單股棉紗或雙股棉紗。若 棉紗支數過低，則使成布貼服性不好，造成配向布包覆滾 筒不能密合，使用時易脫落。若棉紗支數過高，則使纱冬 201116905 斷面纖維偏低，致使成布的刷基板的作用力偏弱。除了以 強鹼溶液絲光處理纖維如原綿或棉紗後再織成配向布的方 法以外，亦可先將未經絲光處理之原棉或棉紗織成胚棉質 配向布後’再以強鹼溶液處理形成絲光配向布。上述之強 驗溶液可為氫氧化納或氫氧化鉀，在絲光處理時之介於 20 C至25 C之間’其重董百分比濃度介於2〇%至3〇%之間。 經上述絲光處理後形成之配向布其背面（靠滾輪2a的 表面，通常與滾輪之間以膠類黏結）的表面電阻平均值介於 LOOE+OW/□至2邏+11~□之間。而絲光棉織毛面(刷磨 面，用以接觸刷磨配向材料4)之表面電阻平均值介於 1.00E+08 Ω/□至 3.00E+11 Ω/□之間。 ' 在這必需說明的是，第1圖僅用以說明而非限縮本發 明。舉例來說’滚筒2之旋轉方向亦可為逆時針而非圖示 之順時針。另-方面，除了採用承載裝置5之傳動元件移 動基板3彳’亦可駭基板3於承餘置5上並同 及移動滾筒2。此外，配向布1可只f蓋滾筒^之部 面而非圖示之全部表面。滾筒2之形狀除了圖示之圓^外 亦可為正多邊形，端視需求而定。 本發明採用低表面電阻之絲光棉作為配向布， 降低因靜電累#而散布於配向膜成品之微粒。另—方面 本發明之配向布"且成不含掺雜物如導電粉體，因 =配^表面電阻的同時’不會因高速刷磨使其中的導電 微拉自i㈣布巾分_散布於配向誠品上。 201116905 如下： 【實施例】 比較例1 具靜電發生的材料如聚乙烯薄膜、聚酯薄膜、聚亞克 力薄膜等在22°C、RH65%下，以曰本製的HIOKISME-8311 電阻量測儀測量其表面電阻值，分別得到第1表所示之數 據： 第1表 有機高分子材料 表面電阻（背面）Ω/口 聚乙烯薄膜 1.85Ε+13 壓克力樹脂膜 1.00Ε+14 聚酯薄膜 4.05Ε+15 比較例2 取胚棉質配向布TY26CL (產自台元紡織股份有限公 司），規格如第2表所示： 第2表 布號 地經英制 支數 地緯英制 支數 毛經英制 支數 經緯密 (根/英 吋） 布厚 (mm) 組織 TY26CL 胚布 50/2 36/2 40/2 47x92 3.0 天鵝絨 (velvet)In an embodiment of the invention, the mercerized cotton as the alignment cloth 1 has a thickness of between 2.0 mm and 3.5 mm. If the thickness of the mercerized cotton is too thin, the liquid crystal pretilt angle of the substrate after the alignment of the brush substrate is low, so that the liquid crystal suspension I 201116905 has a low redundancy. If the thickness of the mercerized cotton is too thick, it will cause the brush substrate to align and damage the substrate. In an embodiment of the invention, the mercerized cotton bottom yarn is densely entangled between 40 pieces/inch to 18 inches/inch. If the warp of the bottom yarn is too thin, it will cause the wool to have insufficient strength and looseness to lose the brush substrate alignment effect. #底纱的_过密' will cause the holding of the pile to be strong enough to completely lose the alignment effect of the uniform brush substrate. In an embodiment of the invention, the bottom weft is between 60/inch to 28/5. If the bottom yarn is too thin, the density of the pile is insufficient, resulting in the alignment of the brush substrate. Right. The weft density of the bottom yarn is too dense, which will cause the holding of the plush strength to be high @tight-body can not play the role of the brush substrate alignment. In an embodiment of the invention, the woven fabric of mercerized cotton is preferably velvet tissue (veWet). If the mercerized cotton is made of other tissues such as c〇rd fabrics, twill back velveteen, or corduroy, the longitudinal rib fabric is not long enough. The twill weft cotton velvet fabric has the disadvantages that the fluff density is not enough, and the sliver fabric has too long fluff and is easy to entangle. Qin The method for forming the silk wool is to treat the raw cotton or cotton yarn with a strong alkali solution, and then weave the raw cotton or cotton yarn after mercerizing into an embryonic cotton matching cloth. In an embodiment of the invention, the raw cotton has a fineness of from 3 2 to 4.2 micronaire. If the fineness of the raw cotton is too fine, the rigidity of the fiber is insufficient, and the force of the brush substrate is weak. If the fineness of the raw cotton is too coarse, the rigidity of the fiber is too large, so that the force of the brush substrate is too strong to scratch the substrate. In one embodiment of the invention, the cotton yarn comprises from 20 to 80 counts of single or double strands of cotton yarn. If the number of cotton yarns is too low, the cloth is not good enough to be applied, so that the alignment cloth coating roller cannot be closed, and it is easy to fall off during use. If the number of cotton yarns is too high, the fiber of the yarn of 201116905 will be low, which will make the brush substrate of the cloth weak. In addition to the method of mercerizing the fiber such as the original cotton or the cotton yarn with a strong alkali solution and then weaving it into the alignment cloth, the raw cotton or cotton yarn which has not been mercerized may be woven into the embryonic cotton distribution cloth, and then treated with a strong alkali solution. Mercerized matching cloth. The above-mentioned test solution may be sodium hydroxide or potassium hydroxide, which is between 20 C and 25 C in mercerizing treatment, and its concentration is between 2% and 3%. The surface resistance of the back surface of the alignment cloth formed by the above mercerizing treatment (the surface of the roller 2a, usually bonded with the roller by the glue) is between LOOE + OW / □ and 2 Logic + 11 ~ □. The average surface resistance of the mercerized cotton woven surface (brushed surface for contacting the brushed alignment material 4) is between 1.00E+08 Ω/□ and 3.00E+11 Ω/□. It must be noted that Figure 1 is for illustrative purposes only and is not intended to be a limitation of the invention. For example, the direction of rotation of the drum 2 can also be counterclockwise rather than clockwise. On the other hand, in addition to the use of the transmission element of the carrier 5, the substrate 3' can be moved, and the substrate 3 can be placed on the bearing 5 and the drum 2 can be moved. Further, the alignment cloth 1 can cover only the surface of the drum 2 instead of the entire surface of the figure. The shape of the drum 2 may be a regular polygon in addition to the circle shown in the figure, depending on the demand. The invention adopts the mercerized cotton with low surface resistance as the alignment cloth, and reduces the particles dispersed in the finished film of the alignment film due to the static electricity. In another aspect, the alignment cloth of the present invention is free from dopants such as conductive powder, because the surface resistance of the surface is not accompanied by high-speed brushing, and the conductive micro-pull from the i (four) cloth towel is dispersed in the Matching Eslite. 201116905 The following are as follows: [Examples] Comparative Example 1 Materials with static electricity such as polyethylene film, polyester film, polyacrylic film, etc. were measured at 22 ° C, RH 65%, using a HIOKISME-8311 resistance measuring instrument manufactured by Mikimoto. The surface resistance values are obtained as shown in Table 1 respectively: Table 1 Surface resistance of organic polymer material (back surface) Ω/mouth polyethylene film 1.85Ε+13 Acrylic resin film 1.00Ε+14 Polyester film 4.05 Ε+15 Comparative Example 2 Take the cotton phasor alignment cloth TY26CL (produced from Taiyuan Textile Co., Ltd.), the specifications are as shown in the second table: The second table cloth number is the inch number of the metric system. Number of warp and weft (root / inch) cloth thickness (mm) organization TY26CL fabric 50/2 36/2 40/2 47x92 3.0 velvet (velvet)
取TY26CL樣布5cmx5cm共兩塊（試片1及試片2)， 經蒸餾水充分水洗後，脫水後置入105°C烘箱烘乾40分 鐘，然後於22°C、RH65%下平衡3天，以日本製的HIOKI SME-8311電阻量測儀測量其表面電阻值兩次，分別得到第 3表所示數據。 201116905 試項目 試片 吸濕量 (%) 表面電阻 (背面）Ω/口 表面電阻(絨毛面） Ω/d 試片1 5.165% 2.21Ε+11 3.39Ε+11 ' 2.33Ε+11 3.39E+H " 試片2 _ 4.516% 2.25Ε+11 3.54Ε+11 2.25Ε+11 3.54Ε+11 平均值 4.841% 2.26Ε+11 3.47Ε+11 實施例1 取TY26CL樣布5cmx5cm共兩塊(試片3及試片4)， 浸入22% NaOH溶液進行絲光作用35秒後’以蒸餾水充分 水洗至水浴pH值7。將鹼處理後之樣布取出脫水，接著置 入105 C烘箱烘乾40分鐘，然後於22°c、RH65%下平衡3 天，以曰本製的HIOKISME-8311電阻量測儀測量其表面 電阻值兩次，分別得到第4表所示數據。 第4表 試項目 試片 吸濕量〇) 表面電阻 (背面）Ω/ο 表面電阻(絨毛面） Ω/ο 試片3 7.220% 3.03Ε+10 6.69Ε+10 3.81Ε+10 3.33Ε+10 試片4 7.239% 5.10Ε+10 1.01Ε+11 7.53Ε+10 1.60Ε+11 平均值 7.229% 4.87Ε+10 9.02Ε+10 實施例2 取TY26CL樣布5cmx5cm共兩塊（試片$及試片6)， 浸入25% NaOH溶料行絲光仙％秒後，以蒸顧水充分 水洗至水浴pH值7。將鹼處理後之樣布取出脫水，接著置 入105 C烘箱烘乾40分鐘，然後於22。〇、RH65%下平衡3 天’以日本製# HIOKISME-8311電阻量測儀測量其表面 201116905 電阻值兩次，分別得到第5表所示數據。 第5表 試項目 試片 吸濕量 (%) 表面電阻 (背面）〇/□ 表面電阻(絨毛面） Ω/α 試片5 7.017% 1.62Ε+11 2.40Ε+11 1.70Ε+11 2.03Ε+11 試片6 7.081% 1.48Ε+11 3.66Ε+11 1.48Ε+11 3.66Ε+11 平均值 7.049% 1.60Ε+11 2.93Ε+11 依比較例1 -2及實施例1 -2的結果比較，經過氫氧化鈉 ® 溶液處理的實例1胚棉布其平均背面電阻值為 4.87Ε+10Ω/□，其平均絨面電阻值為9.02Ε+10Ω/□。經過氣 氧化鈉溶液處理的實例2胚棉布其平均背面電阻值為 1.61Ε+10Ω/□，其平均絨面電阻值為2.93Ε+11Ω/□。上述實 施例之表面電阻值均比比較例1的高分子材料膜如聚乙蝉 薄膜（1.85Ε+13Ω/Ε：)、壓克力樹脂膜（ΐ.〇〇Ε+14Ω/α)、或聚醋 薄膜(4.05Ε+15Ω/Ε：)之表面電阻值低，亦比比較例2未經過 • 苛性鈉溶液處理的胚棉布的平均背面電阻值(2.26Ε+11Ω/ε〇 及平均絨面電阻值(3.47Ε+11Ω/ι=ι)低，顯然具有實質的抗靜 電效果。 雖然本發明已以數個較佳實施例揭露如上，然其並非 用以限定本發明’任何熟習此技藝者，在不脫離本發明之 精神和範圍内’當可作任意之更動與潤飾，因此本發明之 保》蒦範圍當視後附之申請專利範圍所界定者為準。 201116905 【圖式簡單說明】 第1圖係本發明一實施例中配向裝置之側視圖。 【主要元件符號說明】 1〜配向布； 2〜刷磨元件； 2a〜滾筒； 3〜基板； 4〜配向材料； 5〜承載裝置。Take TY26CL sample cloth 5cmx5cm two pieces (test piece 1 and test piece 2), fully washed with distilled water, dehydrated, placed in a 105 ° C oven for 40 minutes, and then equilibrated at 22 ° C, RH65% for 3 days, The surface resistance value was measured twice with a HIOKI SME-8311 resistance measuring instrument manufactured in Japan, and the data shown in Table 3 was obtained. 201116905 Test item moisture absorption (%) Surface resistance (back) Ω/mouth surface resistance (fleece surface) Ω/d Test piece 1 5.165% 2.21Ε+11 3.39Ε+11 ' 2.33Ε+11 3.39E+H " Test piece 2 _ 4.516% 2.25Ε+11 3.54Ε+11 2.25Ε+11 3.54Ε+11 Average 4.841% 2.26Ε+11 3.47Ε+11 Example 1 Take TY26CL sample cloth 5cmx5cm for two pieces (test piece 3 and test piece 4), immersed in 22% NaOH solution for mercerizing for 35 seconds, then 'washed thoroughly with distilled water to pH 7 of the water bath. The sample treated with the alkali was taken out and dehydrated, then placed in a 105 C oven for 40 minutes, and then equilibrated at 22 ° C, RH 65% for 3 days, and the surface resistance was measured with a HIOKISME-8311 resistance measuring instrument manufactured by A. The value is twice, and the data shown in Table 4 is obtained. Table 4 Test item Test piece moisture absorption 〇) Surface resistance (back surface) Ω/ο Surface resistance (fleece surface) Ω/ο Test piece 3 7.220% 3.03Ε+10 6.69Ε+10 3.81Ε+10 3.33Ε+10 Test piece 4 7.239% 5.10Ε+10 1.01Ε+11 7.53Ε+10 1.60Ε+11 Average 7.229% 4.87Ε+10 9.02Ε+10 Example 2 Take TY26CL sample cloth 5cmx5cm for two pieces (test piece $ and test Tablet 6), immersed in 25% NaOH solution, and then washed thoroughly with water to a pH of 7 in a water bath. The base treated sample cloth was taken out and dehydrated, and then placed in a 105 C oven for 40 minutes, and then at 22. 〇, RH65% under the balance for 3 days' The surface of the 201116905 resistance was measured twice by the Japanese HIOKISME-8311 resistance measuring instrument, and the data shown in Table 5 was obtained. Table 5 Test item moisture absorption (%) Surface resistance (back) 〇 / □ Surface resistance (fluff surface) Ω / α Test piece 5 7.017% 1.62 Ε +11 2.40 Ε +11 1.70 Ε +11 2.03 Ε + 11 Test piece 6 7.081% 1.48Ε+11 3.66Ε+11 1.48Ε+11 3.66Ε+11 Average 7.049% 1.60Ε+11 2.93Ε+11 According to the results of Comparative Example 1-2 and Example 1-2, The sample 1 of the cotton fabric treated with the sodium hydroxide® solution had an average back surface resistance of 4.87 Å + 10 Ω / □ and an average pile resistance value of 9.02 Ε + 10 Ω / □. The Example 2 germ cotton cloth treated with the sodium oxide solution had an average back surface resistance value of 1.61 Ε + 10 Ω / □ and an average pile surface resistance value of 2.93 Ε + 11 Ω / □. The surface resistance values of the above examples are all higher than those of the polymer material film of Comparative Example 1, such as a polyethylene film (1.85 Ε + 13 Ω / Ε:), an acrylic resin film (ΐ. 〇〇Ε + 14 Ω / α), or The surface resistance of the polyester film (4.05 Ε + 15 Ω / Ε:) is low, and the average back surface resistance of the woven cotton cloth which is not treated with the caustic soda solution of Comparative Example 2 (2.26 Ε + 11 Ω / ε 〇 and the average suede) The resistance value (3.47 Ε + 11 Ω / ι = ι) is low, apparently having a substantial antistatic effect. Although the invention has been disclosed above in several preferred embodiments, it is not intended to limit the invention 'any skilled person' The scope of the present invention is defined by the scope of the appended claims, which is incorporated herein by reference. 1 is a side view of an alignment device in an embodiment of the present invention. [Main component symbol description] 1 to alignment cloth; 2 to brushing member; 2a to roller; 3 to substrate; 4 to alignment material; .