TW201111312A - Molten glass manufacturing device, molten glass manufacturing method, and sheet glass manufacturing method using the device and the method - Google Patents

Molten glass manufacturing device, molten glass manufacturing method, and sheet glass manufacturing method using the device and the method Download PDF

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Publication number
TW201111312A
TW201111312A TW099125520A TW99125520A TW201111312A TW 201111312 A TW201111312 A TW 201111312A TW 099125520 A TW099125520 A TW 099125520A TW 99125520 A TW99125520 A TW 99125520A TW 201111312 A TW201111312 A TW 201111312A
Authority
TW
Taiwan
Prior art keywords
molten glass
bubbler
glass
row
flow path
Prior art date
Application number
TW099125520A
Other languages
Chinese (zh)
Other versions
TWI483913B (en
Inventor
Ryosuke Akagi
Atsushi Ichikawa
Hajime Itoh
Hiroshi Todoriki
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW201111312A publication Critical patent/TW201111312A/en
Application granted granted Critical
Publication of TWI483913B publication Critical patent/TWI483913B/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18Stirring devices; Homogenisation
    • C03B5/193Stirring devices; Homogenisation using gas, e.g. bubblers
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/18Stirring devices; Homogenisation
    • C03B5/183Stirring devices; Homogenisation using thermal means, e.g. for creating convection currents
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/235Heating the glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/42Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
    • C03B5/43Use of materials for furnace walls, e.g. fire-bricks

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Compositions (AREA)

Abstract

Provided are a molten glass manufacturing device and a molten glass manufacturing method which are suitable for manufacturing high-quality non-alkali glass, and a sheet glass manufacturing method using the device and the method. A molten glass manufacturing device for manufacturing molten glass which has a viscosity (η) of 102 (dPa.S) at a temperature (Tη) in the range of 1500 - 1760 DEG C, the molten glass manufacturing device being provided with a melting vessel, the melting vessel being provided with second bubblers and first bubblers provided upstream of the second bubblers. In the molten glass manufacturing device, if the length of the molten glass flow path of the melting vessel is LF, the distance from the upstream end of the molten glass flow path to the row of the first bubblers is in the range of 0.4 LF - 0.5 LF, the distance from the downstream end of the molten glass flow path to the row of the second bubblers is in the range of 0.45 LF - 0.55 LF, the distance (LP) between the row of the first bubblers and the row of the second bubblers is in the range of 500 - 1000 mm, the distance (LB1) between the row of the first bubblers and the burner closest to the row on the upstream side of the row is in the range of 0 - 2000 mm, the distance (LB2) between the row of the second bubblers and the burner closest to the row on the downstream side of the row is in the range of 800 - 2500 mm, and LB2 > LB1.

Description

201111312 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種熔融玻璃製造裝置、熔融玻璃製造方 法及使用彼等之平板玻璃之製造方法。更具體而言,本發 明係關於一種用以生產均質性較高之高品質無鹼玻璃之熔 融玻璃製造裝置、熔融玻璃製造方法及使用彼等之平板玻 璃之製造方法。 【先前技術】 使用實質上不含鹼金屬離子之無鹼玻璃製造平板顯示器 (FPD,Flat Panel Display)用玻璃基板,對於提高玻璃基板 之絕緣性而言,較為理想。又,無鹼玻璃係於熱膨脹係數 小之方面,對於FPD用玻璃基板之製造而言較為理想。 於FPD用玻璃基板之製造中,要求製造更加高品質化、 亦即均質性較南之向品質玻璃基板。因此,炫解玻璃原料 獲知炫融玻璃之炫解槽(炼融爐)不斷經各種設計’以提高 熔融玻璃之均質性。 專利文獻1揭示之熔融爐係藉由橫隔板而將熔解爐劃分 為上游區域及下游區域,於各個區域形成炫融玻璃之環流 (上游側環流、下游側環流)’藉此進行原料之熔解及熔融 玻¥之均負化。更具體而言’藉由於上游區域形成上游側 環流而進行玻璃原料之熔解,並藉由於下游區域形成下游 側環流而進行熔融玻璃之均質化。於專利文獻1揭示之熔 W虫爐中’為控制上游側環流及下游側環流,而於橫隔板之 上游側設置有起泡器。 15004] .doc 201111312 專利文獻2揭示之熔融爐(熔融箱)雖然不具有相當於專 利文獻1揭示之熔融爐之橫隔板之結構,但揭示有使用至 少1行起泡器及至少兩個彼此相向之燃燒器,將玻璃熔融 及淨化之情形。 先前技術文獻 專利文獻 專利文獻1 :日本專利特開平9-124323號公報 專利文獻2 :曰本專利特開平7-144923號公報 【發明内容】 發明所欲解決之問題 然而’專利文獻1、2揭示之熔融爐未必適於生產高品質 無驗玻璃。 於玻璃之熔解溫度之指標中,係使用Τη、亦即玻璃黏度 η達到102[dPa.S]之溫度’但無鹼玻璃之%為ι5〇〇〜 1760C ’較普通驗石灰玻璃(SO(ja lime glass)等含驗玻璃相 比,Τη高出100°C以上,故而均質化較難。因此,無法利 用專利文獻1、2揭示之鹼石灰玻璃等一般性大量生產用等 之佈局之溶融爐充分進行均質化’故而未必適合製造對均 質性要求特別嚴格之破璃製品(FpD用玻璃基板等)。 又’如上所述’因無鹼玻璃之Τη高於鹼石灰玻璃等含鹼 玻璃,故而溶融爐内之炫融玻璃之溫度亦必然升高。若熔 融玻璃之溫度較高’則相應地熔融玻璃對爐内結構物之侵 蝕作用增強。因此,於無鹼玻璃之情形時,若如專利文獻 1揭示之熔融爐内之橫隔板或專利文獻2揭示之熔融爐内之 150041.doc 201111312 清澄台般於熔融爐之底部存在對熔融玻璃流造成影響之階 差’則出現導致熔融玻璃侵蝕階差、以及由此產生雜質之 問題。 又,於無鹼玻璃之情形時,熔融爐内之熔融玻璃之溫度 必然升尚,因此,若如專利文獻丨般為下游區域較長之結 構,或如專利文獻2般為大型之熔融爐,則使用燃燒器加 熱之範圍將會擴大,故而不利於能量效率。又,亦出現熔 融玻离之知姓、及由此產生雜質、或熔融玻璃之流速之變 化之問題。 為解決上述先前技術之問題,本發明之目的在於提供一 種適於生產均質性較尚之尚品質無驗玻璃之熔融玻璃製造 裝置、熔融玻璃製造方法及使用彼等之平板玻璃製造方 法。 解決問題之技術手段 為實現上述目的而銳思研究之結果,本案發明者發現, 為生產均質性較高之冑品質無驗玻璃,必冑以使玻璃原料 熔解之炫解槽内之上游側環流之流速與下游側環流之流速 達到.! 互定關係之方式進行控制。 - 本發明係基於本申請案發明者之上述見解開發而成,從 ‘ 而提供—種熔融玻璃製造裝置,其特徵在於:其係用以製 造玻璃黏度η達到102[dPa.S]之溫度&為15〇〇〜176〇。〇之熔 融玻璃者’该炫融玻璃製造裝置包括溶解玻璃原料之炫解 槽, 於上述熔解槽之底面附近’於遍及熔融玻璃流路之寬度 150041.doc 201111312 方向上包括複數個第1起泡器及複數個第2起泡器, 上述第1起泡器係相較上述第2起泡器設置於熔融玻璃流 路之上游側, 上述熔解槽係包括用以加熱該熔融槽之上部空間之燃燒 器,且於將上述熔解槽之熔融玻璃流路之長度設為U時, 自上述熔融玻璃流路之上游端起至上述第丨起泡器行為止 之距離為0.4LF〜〇.5LF,自上述熔融玻璃流路之下游端起至 上述第2起泡器行為止之距離為〇45Lf〜〇55Lf,上述第is 泡器行與上述第2起泡器行之距離]^為5〇〇〜1〇〇〇 mm, 上述熔解槽中之熔融玻璃之流路方向上之上述第】起泡 器行與最接近該行上游側之燃燒器之距離為〇〜2〇〇〇 mm, 上述炼解槽中之㈣玻璃之流路方向上之上述第2起泡 器行與最接近該行下游側之燃燒器之距離Lb^_〜25〇〇 mm,且 LB2>LB1。 又,本發明係提供一種熔融玻璃製造方法,其係使用上 述熔融玻璃製造裝置製造溶融玻璃者,並於將上述糾起 泡器所供給之氣體之平均流量設為%[公升/分鐘],上述第 2起泡器所供給之氣體之平均流量設為^[公升/分鐘],上 述第1起泡器之上方之環境氣體溫度設為T〗rc],上述第2 起泡器之上方之環境氣體溫度設為hrc]時,以Vi>V2、 τ 1 >T2之條件’製造溶融玻璃。 又,本發明提供一 述本發明之溶融玻璃 種平板玻璃製造方法,其係將藉由上 製造方法所得之熔融玻璃成形為平板 150041.doc 201111312 玻璃者。 發明之效果 本發明之熔融玻璃製造裝置及熔融玻璃製造方法係適於 生產均質性較高之高品質無驗玻璃。 本發明之平板玻璃製造方法可製造均質性較高且透明性 較尚之平板玻璃,故而適於製造FpD用基板。 【實施方式】 以下,參照圖式,對本發明進行說明。 如上所述,Τη係用作玻璃之熔解溫度之指標者。本發明 之作為對象之玻璃係Τη為1500〜1760。(:,從而與普通鹼石 灰玻璃等含鹼玻璃之Τη相比高出l〇〇»C以上,故而熔融玻 璃之均質化較難》本發明之熔融玻璃製造裝置及熔融玻璃 製造方法係適於實現此種熔融玻璃之均質化。再者,作為 Τη達到1500〜1760eC之玻璃之具體例,無鹼玻璃尤其適 合。 根據此方面,本發明之熔融玻璃製造裝置及熔融玻璃製 造方法適於以特定量(20〜100噸/日)生產如FPD用玻璃基板 般對品質要求嚴格之玻璃製品。 圖1係本發明之熔融玻璃製造裝置中之熔解槽之一實施 形態之剖面圖,圖2係圖1所示之熔解槽之平面圖。其中, 為便於理解,而省略熔解槽10之上部壁面。 於炼解槽10之上游側之端部設置有玻璃原料之投入口 π。自投入口丨丨投入之玻璃原料係藉由燃燒器15之加熱而 熔解成為熔融玻璃G,且保持於熔解槽1〇内。於熔解槽1〇 150041.doc 201111312 之下游側之端部設置有用以將熔融玻璃G排放至下一步驟 之排放口 12。排放口 12係與下游側之導管20連通。 於圖1、2所示之熔解槽1〇之底面附近,設置有複數個第 1起泡器13及複數個第2起泡器14。 複數個第1起泡器13及複數個第2起泡器14係於遍及熔解 槽10之寬度方向上,更具體而言,於遍及熔解槽1〇之熔融 玻璃流路之寬度方向上’隔開特定間隔(間距)而配設。 又’第1起泡器13係相較第2起泡器14而設置於炼融玻璃 流路之上游側,且於第丨起泡器13行與第2起泡器14行之間 設有特定間隔。 再者,對於第1起泡器13及第2起泡器14之行方向上之各 個起泡器之間距、以及第丨起泡器13行與第2起泡器14行之 距離之較佳範圍,將於下文中進行敍述。 於圖1、2所示之熔解槽1〇之兩側面,以相較保持於該熔 解槽10内之熔融玻璃G位於上方之方式’配置有燃燒器 15。燃燒器15係除下述例外部分以外,係於遍及熔融槽1〇 之整個長度方向上以等間隔設置。 本發明之熔融玻璃製造裝置中之熔解槽1〇係藉由將第i 起泡器13、第2起泡器14及燃燒器15以下述特定之方式配 置,而無需於熔融玻璃流路之底部設置如專利文獻丨、2揭 示之對熔融玻璃流造成影響之階差結構,便可促進熔解槽 〇内之炫融玻璃G之環流(上游側環流丨〇〇、下游側環流 101)之形成,且,可控制上游側環流1〇〇之流速與下游側 環流10 1之流速達到特定關係。 150041.doc 201111312 本發明之熔融玻璃製造裝置中之熔解槽10由於熔融玻璃 流路之底部不存在熔融玻璃之侵蝕成為問題之階差結構, 故而適於製造Τη為1500〜1760。(:之玻璃。 本發明之溶融玻璃製造裝置中之炼解槽1〇係於該熔解槽 10之熔融玻璃流路之長度設為。時,自熔融玻璃流路之上 游端起至第1起泡器13行為止之距離為〇 4Lf〜〇 5Lf,自熔 融玻璃流路之下游端起至第2起泡器14行為止之距離為 〇.45Lf~〇.55Lf 〇 因此,與專利文獻丨、2揭示之先前之熔解槽(熔融爐)相 比,熔解槽10之長度較短,且熔解槽内之形成下游側環流 之部位之長度亦較短。 發明之熔解槽10之熔融玻璃流路之長度^係因熔融玻 璃冰路之寬度不同而不同,但較佳為10〜30 m,更佳為 1 0〜25 m ’進而較佳為15〜22 m。 另一方面,熔融玻璃流路之寬度較佳為5〜1〇 m,更佳 5·5〜9m,進而較佳為65〜8m。 〆 本發明之熔融玻璃製造裝置中之熔解槽ι〇係藉由將來自 二起泡器u與第2起泡器14之氣體16、17之流量設為下述 、疋之關係,且將燃燒器15設為下述特定之配置,來降低 二=域中之炫融玻璃流(下游側環流⑻)之每—單位時間 二,從而可控制上游側環流1〇〇之流速與下游側環流 之产二特定關係。藉此,於製“為测〜1戰 表面上時’可抑制玻璃原料中之未炼解物或炼融玻璃 揮發等而出現比重較輕之異質層(浮渣層)之行進 J50041.doc 201111312 (直接通過下游區域),促進炼融玻璃之均質化,從而可獲 得均質性較高之高品質熔融玻璃。 再者,於第1起泡器及第2起泡器14所供給之氣體16、 中較佳為使用不會對熔融玻璃G及起泡器13、14等熔 解槽10之構成要素造成不良影響之氣體。作為此種氣體之 具體例’例示有空氣、氮、氧、氦、氬等。於使用翻或翻 合金作為起泡器13、14之材料之情形時,由起泡器η、起 泡器14供給之氣體16、17中’較佳為使用I、氦及氬之不 含氧之氣體。該等之中,尤佳為氮。 於熔解槽10中 熔融玻璃流路之上游端起至第丨起泡 器13行為止之距離較佳為〇 43Lf〜〇 46Lp, 之下游端起至第2起泡器14行為止 〇‘47LF〜〇_54LF。 自熔融玻璃流路 之距離較佳為 於溶解槽1〇中,於將第1起泡器13行與第2起泡器14行之 距離設為LP時’ Lpb⑼〜觀mm。若^滿足上述範圍, 則對溶解槽1G内之_玻璃G之環流(上游側環流1〇〇、下 游側環流之形成促進之效果優異,且控制上游側環流 1〇〇之流速與下游側環流101之流速達到特定關係,故而較 佳。 若LP小於500 mm,則因第丨起泡器丨3行與第2起泡器“行 之距離過近,而使對熔解槽1〇内之熔融玻璃g之環流(上游 側環流100、下游側環流1〇1)之形成促進之效果不足且 難以控制上游側環流i 。之流速與下游側環流i q ι之流速達 到特定關係。 150041.doc 201111312 於Lp超過丨_ mm之情形時,亦因第丨起泡器i3行鱼第2BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a molten glass manufacturing apparatus, a method of manufacturing a molten glass, and a method of manufacturing the flat glass using the same. More specifically, the present invention relates to a method for producing a molten glass for producing high-quality alkali-free glass having high homogeneity, a method for producing a molten glass, and a method for producing the flat glass using the same. [Prior Art] A glass substrate for a flat panel display (FPD) using an alkali-free glass substantially free of alkali metal ions is preferable for improving the insulating properties of the glass substrate. Further, the alkali-free glass is preferably used for the production of a glass substrate for FPD because the coefficient of thermal expansion is small. In the production of a glass substrate for FPD, it is required to produce a glass substrate having a higher quality, that is, a homogenization quality. Therefore, the glass raw material is clarified, and the smelting glass (refining furnace) of the smelting glass is continuously subjected to various designs to improve the homogeneity of the molten glass. In the melting furnace disclosed in Patent Document 1, the melting furnace is divided into an upstream region and a downstream region by a diaphragm, and a circulating flow of the molten glass (upstream side circulation and downstream side circulation) is formed in each region, thereby melting the raw material. And the melting glass is negatively divided. More specifically, the melting of the glass raw material is carried out by the formation of the upstream side circulation in the upstream region, and the homogenization of the molten glass is performed by the formation of the downstream side circulation in the downstream region. In the melter furnace disclosed in Patent Document 1, 'the upstream side circulation and the downstream side circulation are controlled, and the bubbler is provided on the upstream side of the horizontal partition. 15004] .doc 201111312 The melting furnace (melting tank) disclosed in Patent Document 2 does not have a structure corresponding to the diaphragm of the melting furnace disclosed in Patent Document 1, but discloses the use of at least one row of bubblers and at least two of each other. The opposite burner, the situation in which the glass is melted and purified. CITATION LIST Patent Literature Patent Literature 1: Japanese Patent Application Laid-Open No. Hei 9-124323 (Patent Document No. Hei. The melting furnace is not necessarily suitable for the production of high quality non-test glass. In the index of the melting temperature of the glass, Τη, that is, the glass viscosity η reaches a temperature of 102 [dPa.S], but the % of the alkali-free glass is ι5〇〇~1760C 'Compared with ordinary lime glass (SO(ja) Lime glass) is more difficult to homogenize than 含η, which is higher than 100 °C, and therefore it is not possible to use a melting furnace of a general mass production such as soda lime glass disclosed in Patent Documents 1 and 2. It is not necessarily suitable for the production of a glass-filled product (such as a glass substrate for FpD) which is particularly strict in terms of homogeneity. Further, as described above, the Τη due to the alkali-free glass is higher than the alkali-containing glass such as soda lime glass. The temperature of the glazed glass in the melting furnace is also inevitably increased. If the temperature of the molten glass is higher, the corresponding effect of the molten glass on the structure inside the furnace is enhanced. Therefore, in the case of alkali-free glass, if it is a patent The transverse partition in the melting furnace disclosed in Document 1 or the melting furnace disclosed in Patent Document 2 is 150041.doc 201111312. There is a step in the bottom of the melting furnace that affects the flow of molten glass. The problem of the erosion gradient of the molten glass and the resulting impurities. Moreover, in the case of alkali-free glass, the temperature of the molten glass in the melting furnace is inevitably increased, and therefore, if the downstream area is long as in the patent document The structure, or a large-scale melting furnace as in Patent Document 2, the range in which the burner is heated is increased, which is disadvantageous to energy efficiency. Moreover, the melting of the glass is also known, and impurities are generated therefrom, or The problem of the change of the flow rate of the molten glass. In order to solve the problems of the prior art mentioned above, it is an object of the present invention to provide a molten glass manufacturing apparatus, a method for manufacturing a molten glass, and a method thereof, which are suitable for producing a homogeneous quality glass having no homogeneity. The method for manufacturing flat glass The technical means for solving the problem In order to achieve the above-mentioned purpose and the result of the research, the inventors of the present invention found that in order to produce a high-quality, high-quality enamel-free glass, it is necessary to melt the glass raw material. The flow rate of the upstream side circulation in the tank and the flow rate of the downstream side circulation are controlled in a manner of mutual relationship. - The present invention Based on the above findings of the inventors of the present application, a molten glass manufacturing apparatus is provided, which is characterized in that it is used to produce a glass viscosity η of 102 [dPa.S] and a temperature of 15 〇. 〇~176〇. The molten glass of the ' ' 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该a first bubbler and a plurality of second bubblers, wherein the first bubbler is disposed upstream of the molten glass flow path than the second bubbler, and the melting tank includes heating for the melting a burner in the upper space of the tank, and when the length of the molten glass flow path of the melting tank is U, the distance from the upstream end of the molten glass flow path to the third bubbler is 0.4LF ~〇.5LF, the distance from the downstream end of the molten glass flow path to the second bubbler is 〇45Lf~〇55Lf, and the distance between the first isolator row and the second bubbler row] ^ is 5〇〇~1〇〇〇mm The distance between the first bubbler row in the direction of the flow path of the molten glass in the melting tank and the burner closest to the upstream side of the row is 〇~2〇〇〇mm, and the (four) glass in the refining tank The distance between the second bubbler row in the flow path direction and the burner closest to the downstream side of the row is Lb^_~25〇〇mm, and LB2>LB1. Moreover, the present invention provides a method for producing a molten glass by using the above-described molten glass manufacturing apparatus to produce a molten glass, and setting an average flow rate of the gas supplied from the correction foamer to % [liter/min], The average flow rate of the gas supplied from the second bubbler is set to [[liters per minute], and the ambient gas temperature above the first bubbler is set to T rc], and the environment above the second bubbler is set. When the gas temperature is hrc], the molten glass is produced under the condition of Vi > V2, τ 1 > T2. Further, the present invention provides a method for producing a molten glass seed glass of the present invention, which is obtained by forming a molten glass obtained by the above manufacturing method into a flat plate 150041.doc 201111312 glass. Advantageous Effects of Invention The molten glass manufacturing apparatus and the molten glass manufacturing method of the present invention are suitable for producing a high-quality non-glass having high homogeneity. The flat glass manufacturing method of the present invention can produce a flat glass having high homogeneity and transparency, and is therefore suitable for producing a substrate for FpD. [Embodiment] Hereinafter, the present invention will be described with reference to the drawings. As described above, Τη is used as an indicator of the melting temperature of glass. The glass system Τη of the present invention is 1500 to 1760. (:, it is higher than l〇〇»C or more than the alkali-containing glass such as ordinary soda lime glass, so that it is difficult to homogenize the molten glass. The molten glass manufacturing apparatus and the molten glass manufacturing method of the present invention are suitable. Further, as a specific example of the glass having a Τ 1500 to 1760 eC, an alkali-free glass is particularly suitable. According to this aspect, the molten glass manufacturing apparatus and the molten glass manufacturing method of the present invention are suitable for specific A quantity (20 to 100 tons/day) produces a glass product which is strict in quality as a glass substrate for FPD. Fig. 1 is a cross-sectional view showing an embodiment of a melting tank in the molten glass manufacturing apparatus of the present invention, and Fig. 2 is a diagram A plan view of the melting tank shown in Fig. 1. In order to facilitate understanding, the upper wall surface of the melting tank 10 is omitted. The glass material inlet port π is provided at the upstream end of the refining tank 10. The glass raw material is melted into molten glass G by heating by the burner 15, and is held in the melting tank 1〇. It is disposed at the end of the downstream side of the melting tank 1〇150041.doc 201111312. There is a discharge port 12 for discharging the molten glass G to the next step. The discharge port 12 is in communication with the conduit 20 on the downstream side. In the vicinity of the bottom surface of the melting tank 1〇 shown in Figs. The bubbler 13 and the plurality of second bubblers 14. The plurality of first bubblers 13 and the plurality of second bubblers 14 are arranged in the width direction of the melting tank 10, more specifically, in the melting The first glass bubbler 13 is disposed in the flow path of the smelting glass in the width direction of the molten glass flow path of the groove 1 by a predetermined interval (pitch). On the upstream side, a specific interval is provided between the first bubbler 13 row and the second bubbler 14 row. Further, for each of the first bubbler 13 and the second bubbler 14 in the row direction The preferred range of the distance between the bubblers and the distance between the third bubbler 13 row and the second bubbler 14 row will be described later. On both sides of the melting tank 1 shown in Figs. The burner 15 is disposed in such a manner that the molten glass G held in the melting tank 10 is located above. The burner 15 is external to the following example. In addition, the melting tank 1 in the molten glass manufacturing apparatus of the present invention is provided by the i-th bubbler 13, the second bubbler 14 and The burner 15 is disposed in a specific manner as follows, and it is not necessary to provide a stepped structure which affects the flow of the molten glass as disclosed in Patent Documents 2 and 2 at the bottom of the molten glass flow path, thereby promoting the molten glass in the melting tank. The circulation of G (the upstream side circulation stream, the downstream side circulation stream 101) is formed, and the flow rate of the upstream side circulation 1〇〇 can be controlled to have a specific relationship with the flow rate of the downstream side circulation 10 1 150041.doc 201111312 The melting tank 10 in the molten glass manufacturing apparatus is suitable for the production of Τ 1500 to 1760 because the bottom of the molten glass flow path does not have a stepped structure in which the erosion of the molten glass is a problem. (The glass of the molten glass manufacturing apparatus of the present invention is the length of the molten glass flow path of the melting tank 10 from the upstream end of the molten glass flow path to the first The distance of the bubbler 13 is 〇4Lf~〇5Lf, and the distance from the downstream end of the molten glass flow path to the second bubbler 14 is 〇.45Lf~〇.55Lf. Therefore, with the patent document, 2, the length of the melting tank 10 is shorter than that of the prior melting tank (melting furnace), and the length of the portion of the melting tank that forms the downstream side circulation is also short. The molten glass flow path of the melting tank 10 of the invention The length is different depending on the width of the molten glass ice path, but is preferably 10 to 30 m, more preferably 10 to 25 m' and further preferably 15 to 22 m. On the other hand, the molten glass flow path The width is preferably 5 to 1 μm, more preferably 5·5 to 9 m, and still more preferably 65 to 8 m. The melting tank in the molten glass manufacturing apparatus of the present invention is obtained by using two bubblers u The flow rate of the gases 16 and 17 with the second bubbler 14 is set to the following relationship, and the burner 15 is set to the following. The configuration is to reduce the per-unit time two of the glazed glass flow (downstream side circulation (8)) in the two= domain, thereby controlling the specific relationship between the flow rate of the upstream side circulation and the downstream side circulation. In the "measurement on the surface of the 1st battle", it can suppress the progress of the heterogeneous layer (scum layer) with a lighter specific gravity in the unrefined material in the glass raw material or the volatilization of the smelting glass. J50041.doc 201111312 (Direct By the homogenization of the smelting glass by the downstream region, high-quality molten glass having high homogeneity can be obtained. Further, in the gas 16 supplied from the first bubbler and the second bubbler 14, It is preferable to use a gas which does not adversely affect the constituent elements of the molten glass G and the melting tanks 10 and 14 such as the bubblers 13. As a specific example of such a gas, air, nitrogen, oxygen, helium, argon or the like is exemplified. In the case where a turning or turning alloy is used as the material of the bubblers 13, 14, the gas, 16, 17 supplied by the bubbler η, the bubbler 14 is preferably 'containing oxygen without using I, helium and argon. The gas, especially among these, is nitrogen. The distance from the upstream end of the middle molten glass flow path to the second bubbler 13 is preferably 〇43Lf to 〇46Lp, and the downstream end of the molten glass flow path to the second bubbler 14 is stopped from '47LF to 〇_54LF. The distance from the molten glass flow path is preferably in the dissolution tank 1〇, and when the distance between the first bubbler 13 row and the second bubbler 14 is LP, 'Lpb(9) to mm. In the range, the effect of promoting the circulation of the upstream side circulation 1〇〇 and the downstream side circulation in the dissolution tank 1G is excellent, and the flow rate of the upstream side circulation 1〇〇 and the downstream side circulation 101 are controlled. A particular relationship is therefore preferred. If the LP is less than 500 mm, the third row of the second bubbler is too close to the second bubbler, and the circulation of the molten glass g in the melting tank 1 is upstream (upstream side circulation 100, downstream) The effect of the formation of the side circulation 1〇1) is insufficient and it is difficult to control the upstream side circulation i. The flow rate has a specific relationship with the flow rate of the downstream side circulation iq ι. 150041.doc 201111312 When Lp exceeds 丨_mm, Dijon bubbler i3 line fish number 2

起泡器14行之距離過寬,而使對炼解槽_之溶融玻璃G 之MU游側環流⑽、下游側環流⑻)之形成促進之效 果不足’轉以控制上游側環流刚之流速與下游側環流 1 〇 1之流速達到特定關係。 於熔解槽10中,Lp較佳為6〇〇〜8〇〇 mm。 於第1起泡器13及第2起泡器14中,起泡器之行方向上之 各個起泡器間之間距p、亦即熔解槽1〇之熔融玻璃流路之 寬度方向上之各個起泡器間之距離,較佳為400〜700 醜。若各個起泡器間之間距p為上述範圍内,則對炫解槽 10内之熔融玻璃G之環流(上游側環流1〇〇、下游側環流 U之开/成促進之效果優異,從而可控制上游側環流⑽ 之流速與下游侧環流1G1之流速達到特定關係,故而較 佳,且,就製造成本之觀點而言亦較為優異。 若各個起泡器間之間距P超過7〇〇 mm,則因各個起泡器 間之距離過寬,而存在對溶解槽_之溶融玻璃G之環流 (上游側環流刚、下游側環流101)之形成促進之效果變得 不充分之虞,尤其存在著於熔融玻璃流路之寬度方向上因 部位不同而導致熔融玻璃G之環流(上游側環流100、下游 側核流101)之形成促進產生差異,使得環流之流速產生不 均一之虞,故而,就熔融玻璃G之均質化而言,較為欠 佳。又,存在著難以控制上游側環流100之流速與下游側 裱流101之流速達到特定關係之虞。 另一方面,即便使各個起泡器間之間距P小於400 mm I5004I.doc 201111312 亦仍然無助於促進熔解槽10内之熔融玻璃G之環流(上游側 環流100、下游側環流101)之形成,反而,就費用對比效 果之觀點而言,設置於熔解槽10内之第i、第2起泡器、 14之數量變成過剩,導致熔融玻璃之製造成本增加,故而 欠佳。 於將熔解槽10中之熔融玻璃之流路方向作為軸時,第^ 起泡器13與第2起泡器14較佳為以不同軸存在之方式配 置。 於圖2所示之熔解槽10中,第1起泡器13之突出口與第2 起泡益14之突出口係以鋸齒狀配置,第1起泡器13之突出 口與第2起泡器14之突出口不存在於同轴上。 於以此方式進行配置之情形時’即便第1起泡器1 3之突 出口之其中-個無法發揮作用,亦可因存在鋸齒狀配置於 下游側之第2起泡器14之突出口,而不會損及對炫解槽κ 内之熔融玻璃G之環流(上游侧環流100、下游側環流101) 之形成促進之效果,且可控制上游側環流⑽之流速與下 游側環流1 01之流速達到特定關係。 於圖1、2所示之熔解槽1〇之兩側面,於遍及該熔解槽1〇 之整個長度方向上’以等間隔設置有燃燒器15。其中,於 第2起泡器14之上方未設置燃燒器15。 下文中將進仃詳細敍述,而本發明係使第2起泡器Η 供。之氣體17之平均流量%小於第i起泡器"所供給之 :尸之平均机里v〆控制〇,且使第2起泡器Μ之上方之 土見氣體溫度结·I 4· • ' 起泡裔13之上方之環境氣體溫 15004I.docThe distance between the rows of the bubblers 14 is too wide, and the effect of promoting the formation of the MU swim side circulation (10) and the downstream side circulation (8) of the molten glass G of the refining tank is insufficient to control the flow velocity of the upstream side circulation. The flow rate of the downstream side circulation 1 〇1 reaches a specific relationship. In the melting tank 10, Lp is preferably 6 〇〇 to 8 〇〇 mm. In the first bubbler 13 and the second bubbler 14, the distance between the respective bubblers in the direction of the bubbler, that is, the width direction of the molten glass flow path of the melting tank 1〇 The distance between the bubblers is preferably 400 to 700 ugly. When the distance p between the bubblers is within the above range, the effect of promoting the circulation of the molten glass G in the cooling tank 10 (the upstream side circulation 1〇〇 and the downstream side circulation U) is excellent. It is preferable to control the flow rate of the upstream side circulation (10) and the flow rate of the downstream side circulation 1G1, and is preferable in terms of manufacturing cost. If the distance P between the bubblers exceeds 7 mm, In particular, since the distance between the bubblers is too wide, the effect of promoting the formation of the circulating flow of the molten glass G (the upstream side circulation and the downstream side circulation 101) of the dissolution tank is insufficient, and there is a possibility. In the width direction of the molten glass flow path, the formation of the circulating flow of the molten glass G (the upstream side circulation flow 100 and the downstream side nuclear flow 101) is promoted to be different due to the difference in the position, so that the flow velocity of the circulation flow is uneven, so that In the homogenization of the molten glass G, it is less preferable. Further, it is difficult to control the flow rate of the upstream side circulation 100 and the flow velocity of the downstream side turbulence 101 to a specific relationship. The distance P between the bubblers is less than 400 mm. I5004I.doc 201111312 also does not contribute to the formation of the circulation of the molten glass G in the melting tank 10 (the upstream side circulation 100, the downstream side circulation 101), but the cost comparison effect In view of the above, the number of the i-th and second bubblers 14 disposed in the melting tank 10 becomes excessive, which leads to an increase in the manufacturing cost of the molten glass, which is not preferable. The flow path of the molten glass in the melting tank 10 is obtained. When the direction is the axis, the second bubbler 13 and the second bubbler 14 are preferably arranged in different axes. In the melting tank 10 shown in Fig. 2, the protruding end of the first bubbler 13 is The protruding opening of the second foaming benefit 14 is arranged in a zigzag manner, and the protruding opening of the first bubbler 13 and the protruding opening of the second bubbler 14 are not coaxial. When the configuration is performed in this manner 'Even if one of the protruding ports of the first bubbler 13 does not function, it may be arranged in a zigzag manner on the protruding end of the second bubbler 14 on the downstream side without damaging the splicing groove. The formation of the circulating flow of the molten glass G in the κ (the upstream side circulation 100 and the downstream side circulation 101) The effect is that the flow rate of the upstream side circulation (10) can be controlled to have a specific relationship with the flow rate of the downstream side circulation 101. The two sides of the melting tank 1〇 shown in Figs. 1 and 2 are throughout the length of the melting tank 1〇. The burner 15 is disposed at equal intervals in the direction. The burner 15 is not disposed above the second bubbler 14. As will be described in detail hereinafter, the present invention provides the second bubbler. The average flow rate of the gas 17 is less than that of the i-th bubbler " supplied: the average machine in the corpse is v〆 control 〇, and the soil above the second bubbler 见 is the gas temperature junction·I 4· 'Environmental gas temperature above the bubbler 13 is 15040I.doc

-12· 201111312 T1(控制2),藉此便可降低下游側環流101之每一單位時間 之流量’從而控制上游側環流1〇〇之流速與下游側環流1〇1 之抓速達到特定關係。藉此,於製造Tn為1500〜1760°C之 炼融玻璃時,可促進熔融玻璃之均質化,從而可獲得均質 性較高之高品質熔融玻璃。 為實現上述控制2,如圖2所示,必需以某種程度分隔配 置第2起泡器14行與最接近該行下游側之燃燒器1 5。因 此’必需使LB2=800 mm以上。 其中’若使第2起泡器14行與最接近該行下游側之燃燒 器15過度分隔,則會使第2起泡器14之上方之環境氣體溫 度過度下降,反而產生熔融玻璃之均質化變得不充分等問 通又,δ又置於熔解槽1 〇之下游側端部之排放口 12所排放 之熔融玻璃G之溫度下降,於後續步驟中進行減壓消泡之 情形時,將產生難以消泡等問題。因此,必需使Lb2=2500 m m. \J\ 下 〇 因此,LB2 = 800〜2500 mm。再者,較佳為]^2 = 1〇〇〇〜2〇〇〇 mm 更佳為 Lb2=1000〜1600 mm。 又為貫現上述控制2,而於圖2所示之熔解槽1〇中,熔 解才曰1 〇中之熔融玻璃之流路方向上之第1起泡器13行與最 接近該行上游側之燃燒器15之距離Lbi和第2起泡器14行與 最接近該行下游側之燃燒器15之距離LB2形成為Lb2>Lbi之 關係。亦即’於第!起泡器13之上方設置有燃燒器Η,相 •十;此於弟2起泡器14之上方則未設置燃燒器丨5。圖2所 不之熔解槽10可藉由設為此種配置,而使第2起泡器之上 150041.doc -13- 201111312 方之環境氣體溫度T2低於第1起泡器之上方之環境氣體溫 度τ,。 於本發明中,較佳為Lb2_Lb43〇〇 mm,更佳為Lb2 LBQ50〇mm’尤佳為。山丨㈣〇_。 另一方面,圖2所示之熔解槽1〇係於第丨起泡器13行之上 方。又置有燃燒态15 ’但只要滿足之關係,則亦可 以某種程度分隔配置^起泡器13行與最接近該行上游側 之燃燒器15。丨中,若使第1起泡器13行與最接近該行上 游側之燃燒器15過度分隔,則會使第丨起泡器13之上方之 環境氣體溫度過度下降,而使上游側環流1〇〇變弱,導致 玻璃原料之轉變得不充分,又,由此會產生炫解槽1〇之 下游區中之熔融玻璃G之均質化變得不充分等問題。因 此’必需使1^1=2000 mm以下。 因此-12·201111312 T1 (Control 2), by which the flow rate per unit time of the downstream side circulation 101 can be reduced, thereby controlling the flow rate of the upstream side circulation 1〇〇 to the specific relationship of the downstream side circulation 1〇1. . As a result, when the tempered glass having a Tn of 1500 to 1760 °C is produced, the homogenization of the molten glass can be promoted, and a high-quality molten glass having high homogeneity can be obtained. In order to realize the above control 2, as shown in Fig. 2, it is necessary to arrange the second bubbler 14 row and the burner 15 closest to the downstream side of the row to some extent. Therefore, it is necessary to make LB2 = 800 mm or more. Wherein, if the second bubbler 14 row is excessively separated from the burner 15 closest to the downstream side of the row, the ambient gas temperature above the second bubbler 14 is excessively lowered, and the molten glass is homogenized. When the temperature of the molten glass G discharged from the discharge port 12 at the downstream end of the melting tank 1 is lowered, the temperature of the molten glass G discharged from the discharge port 12 at the downstream end of the melting tank 1 is lowered, and when decompression and defoaming are performed in the subsequent step, It creates problems such as difficulty in defoaming. Therefore, it is necessary to make Lb2 = 2500 m m. \J\ 〇 Therefore, LB2 = 800~2500 mm. Further, it is preferably [^2 = 1 〇〇〇 ~ 2 〇〇〇 mm or more preferably Lb2 = 1000 1600 mm. In addition, in the above-mentioned control 2, in the melting tank 1〇 shown in FIG. 2, the first bubbler 13 in the flow direction of the molten glass in the melting direction is the closest to the upstream side of the row. The distance Lbi of the burner 15 and the distance LB2 between the second bubbler 14 row and the burner 15 closest to the downstream side of the row are formed in a relationship of Lb2 > Lbi. That is, 'Yu! A burner Η is disposed above the bubbler 13, and the burner 丨5 is not disposed above the bubbler 14 of the second. The melting tank 10 of FIG. 2 can be configured such that the ambient gas temperature T2 of the 15041.doc -13-201111312 on the second bubbler is lower than the environment above the first bubbler. Gas temperature τ,. In the present invention, Lb2_Lb43〇〇 mm is preferable, and Lb2 LBQ50〇mm' is more preferable. Hawthorn (four) 〇 _. On the other hand, the melting tank 1 shown in Fig. 2 is attached to the top of the third bubbler 13 row. Further, the combustion state 15 is placed. However, as long as the relationship is satisfied, the burners 13 and the burners 15 closest to the upstream side of the row can be disposed to some extent. In the crucible, if the first bubbler 13 row is excessively separated from the burner 15 closest to the upstream side of the row, the ambient gas temperature above the third bubbler 13 is excessively lowered, and the upstream side circulation 1 is caused. When the enthalpy is weakened, the conversion of the glass raw material is insufficient, and the homogenization of the molten glass G in the downstream region of the smear tank 1 is insufficient. Therefore, it is necessary to make 1^1=2000 mm or less. therefore

Lb1 = 〇〜2000 mm。再者,較佳為LB丨= 500〜1500 mm。 又,相鄰燃燒器1 5間之間距係取決於燃燒器丨5之種類或 熔解槽ίο之佈局,但較佳為600〜26〇〇 mm,更佳為 800〜2400 mm 〇 燃燒器15中之燃燒係可將燃料與氧氣加以混合進行燃 燒’或者將燃料與氧氣及空氣加以混合進行燃燒。可藉由 使用該等方法,而使熔融玻璃包含水分。於自熔解槽1〇輸 送至下游側導管20之熔融玻璃之後步驟中,於藉由減壓消 泡消除熔融玻璃中之泡沫之情形時,熔融玻璃包含水分之 情況較佳,故而較佳為如上所述之燃燒。 150041.doc . 14. S. 201111312 對於熔解槽10之與熔融玻璃G接觸之部分之構成材料, 要求耐熱性及對熔融玻璃之耐蝕性優異,故而使用含Zr〇2 之耐火磚’但於形成熔融玻璃流路之熔解槽1〇之底面中之 自第1起泡器13行起至上游側為止之〇.ilf〜〇.31^之部分, 較佳為使用以質量%計Zr〇2為85%以上97%以下且剩餘部 分以Si〇2為主體之玻璃質之熱熔融耐火物。其原因在於: 流通於炼解槽10内之熔融玻璃之溫度係上游側高於下游 側,又,來自第1起泡器丨3之流量大於來自第2起泡器14之 流量,故而耐火磚易於受到侵蝕。於該情形時,各個熱熔 W虫耐火物之厚度較佳為別〜丨20 mm,且較佳為積層2〜3個 熱熔融耐火物。進而,於如此形成之熱熔融耐火物之層之 外側,可積層2〜5層其他含Zr〇2之耐火磚❶再者,較佳為Lb1 = 〇~2000 mm. Further, it is preferably LB 丨 = 500 to 1500 mm. Moreover, the distance between the adjacent burners 15 depends on the type of the burner 丨5 or the layout of the melting tank ίο, but is preferably 600 to 26 〇〇mm, more preferably 800 to 2400 mm. The combustion system can mix the fuel with oxygen for combustion' or combine the fuel with oxygen and air for combustion. The molten glass can be made to contain moisture by using these methods. In the step of transporting the molten glass from the melting tank 1 to the downstream side conduit 20, in the case where the foam in the molten glass is removed by decompression under reduced pressure, the molten glass contains moisture preferably, and thus preferably Said burning. 150041.doc. 14. S. 201111312 The constitutive material of the portion of the melting tank 10 that is in contact with the molten glass G is required to have excellent heat resistance and corrosion resistance to molten glass, so that a refractory brick containing Zr 〇 2 is used. In the portion of the bottom surface of the melting tank 1 of the molten glass flow path from the first bubbler 13 to the upstream side, it is preferable to use Zr〇2 in mass%. 85% or more and 97% or less and the remaining part is a glassy hot-melt refractory mainly composed of Si〇2. The reason for this is that the temperature of the molten glass flowing in the refining tank 10 is higher on the upstream side than on the downstream side, and the flow rate from the first bubbler crucible 3 is larger than the flow from the second bubbler 14, so that the refractory brick Easily eroded. In this case, the thickness of each of the hot-melt Worms refractories is preferably from ~20 mm, and preferably from 2 to 3 hot-melt refractories. Further, on the outer side of the layer of the hot-melt refractory thus formed, 2 to 5 layers of other refractory bricks containing Zr〇2 may be laminated, preferably

由上述組成之熱炫融对火物構成溶解槽1〇之與炫融玻璃G 接觸之所有部分。又,可介隔氧化鋁‘鍅石質等填充材積 層各耐火磚。 若於熔解槽10底部之耐火磚之外側,設置用以冷卻該耐 火磚之空冷或水冷等冷卻機構,則可提高耐火磚之壽命, 故而較佳。 其次,對本發明之熔融玻璃製造方法,進行說明。 本發明之熔融玻璃製造方法係一方面進行上述控制丄、 2 ’ 一方面製造熔融玻璃。 :藉由進行上述控制1、2,而降低下游側環流1〇1之每 一早位時間之流量,從而控制上游側環流100之流速與下 游側環流1 〇 1之流速達到下述特定關係。 150041.doc S- •15. 201111312 :本發明之熔融破璃製造方法t,上述%較 :她’吏佳為0.7〜5公升,分鐘,進而更佳為〇9〜二 升/刀鐘’尤佳為κ8〜2.6公升/分鐘。又,上^ 分鐘’更佳為。·…公升/分鐘,進而= 為〇·5〜2公升/分鐘,尤佳為〇 9〜2 〇公升/分鐘。 又’較佳為Vl_Vg0.2公升/分鐘,更佳 升"分鐘’進而更佳為V]⑽公升/分鐘;為4: VAi.o公升/分鐘。 凡住為V” 於本發明之炼融玻璃製造方法中,上述τ ⑽〜mot:,更佳為觸〜】695te又, 為 ic7n 1/ς〇Λ〇^ 上通丁2較佳為 〜1690 C,更佳為 1580〜1675°C。 又,Τι-Τ2較佳為 10〜35。〇,Τι_ 更佳為19〜抓。 巧5 3〇C ’進而 再者’ 丁丨及丁2係可藉由以下方法而測定。 (測定位置) 丁1:相較第味泡器行接近上游側之燃燒器、與相較該燃 燒益更接近上游側之燃燒器的中間位置。 Τ2 ·第2起泡行、與相較該起泡器接近下游側之燃燒器 之中間位置。 ° (測定方法) 自設置於炫解槽之側面之觀察用窗戶,利用輻射溫度計 (radlatl〇n thermometer)(例如,cmN〇 IR-AH3SU(測定波 ε 1 ·〇))測&對面側之側面之、溶解槽内壁 溫度。 150041.docThe thermal fusion of the above composition constitutes all parts of the dissolution tank 1 which are in contact with the glazed glass G. Further, each of the refractory bricks may be laminated with a filler such as alumina 鍅 质. If the cooling means such as air cooling or water cooling for cooling the fire resistant brick is provided on the outer side of the refractory brick at the bottom of the melting tank 10, the life of the refractory brick can be improved, which is preferable. Next, a method of producing a molten glass of the present invention will be described. The method for producing a molten glass of the present invention is to carry out the above-described control, on the one hand, to produce molten glass on the one hand. By reducing the flow rate of each of the downstream side loops 1〇1 by performing the above-described controls 1, 2, the flow rate of the upstream side loop stream 100 and the flow rate of the downstream side loop stream 1 〇 1 are controlled to achieve the following specific relationship. 150041.doc S- •15.201111312: The method for manufacturing the molten glass of the present invention t, the above % comparison: her '吏佳 is 0.7~5 liters, minutes, and more preferably 〇9~2 liters/knife clock' For κ8~2.6 liters/min. Also, the last ^ minutes' is better. · ... liters / minute, and then = 〇 · 5 ~ 2 liters / minute, especially good 〇 9 ~ 2 〇 liters / minute. Further, it is preferably Vl_Vg of 0.2 liters/minute, more preferably liters "minutes and further preferably V] (10) liters/minute; and 4: VAi.o liters/minute. Where the residence is V" In the method for producing a smelting glass of the present invention, the above τ (10) ~ mot:, more preferably touches ~ 695te, and is ic7n 1 / ς〇Λ〇 ^ on the pass 2 is preferably ~ 1690 C, more preferably from 1580 to 1675 ° C. Also, Τι-Τ2 is preferably 10 to 35. 〇, Τι_ is better for 19~ grasping. Qiao 5 3〇C 'and then' Ding and Ding 2 series can The measurement was carried out by the following method: (measurement position) D1: The burner was closer to the upstream side than the first bubbler row, and the middle position of the burner closer to the upstream side than the combustion benefit. Τ2 · 2nd The bubble line is in the middle of the burner closer to the downstream side than the bubbler. ° (Measurement method) The observation window is provided on the side of the splicing tank, and a radiation thermometer (radlatl〇n thermometer) is used (for example, cmN〇IR-AH3SU (measured wave ε 1 ·〇)) measured & the side of the opposite side, the temperature of the inner wall of the dissolution tank. 150041.doc

-16- 201111312 本發明之熔融玻璃製造方法係於將上游側環流1〇〇之平 均流速設為F1[m/hr],下游側環流1〇1之平均流速設為 F2[m/hr]時,較佳為,以 Fi=5〜2〇 m/hr、f2=〇 5〜7 ^/1ΐΓ之方 式進行控制。藉此,於製造&為15〇〇〜176(rc之熔融玻璃 時,可促進熔融玻璃之均質化,從而可獲得均質性較高之 尚品質溶融玻璃。 更佳為以?丨=8〜15 m/hr、F2 = l〜4 m/hr之方式進行控制。 再者,6及F2係可藉由以下方法而測定。 (測定位置)-16- 201111312 The molten glass manufacturing method of the present invention is characterized in that the average flow velocity of the upstream side circulation is set to F1 [m/hr], and the average flow velocity of the downstream side circulation 1〇1 is set to F2 [m/hr]. Preferably, the control is performed in such a manner that Fi=5~2〇m/hr and f2=〇5~7^/1ΐΓ. Therefore, in the case of manufacturing and melting glass of 15 〇〇 to 176 (rc, the homogenization of the molten glass can be promoted, and a still-quality molten glass having higher homogeneity can be obtained. More preferably, it is 丨=8~ Control is carried out in a manner of 15 m/hr and F2 = 1 to 4 m/hr. Further, the 6 and F2 systems can be measured by the following methods.

Fi .與熔融玻璃流路之上游端相距之距離為〇.3〇L广〇 34Lf 且炼融玻璃流路之寬度方向上之中央附近。 F2 .與熔融玻璃流路之下游端相距之距離為〇 22“〜〇 且熔融玻璃流路之寬度方向上之中央附近。 (測定方法) 對熔融玻璃之表層上之泡沫流動進行視頻拍攝,測定相 對於泡沫移動距離之移動時間作為流速。將此順序反覆進 行2〜3次,求出平均流速。 其次’對本發明之平板玻璃製造方法進行說明。 本發明之平板玻璃製造方法係將藉由上述本發明之熔融 玻璃製造方法所得之熔融玻璃成形為平板玻璃。作為將熔 融玻璃成形為平板玻璃之方法,可使用浮式法、下拉法等 各種成形方法。於丁”為1500〜176(rCi玻璃之情形時,尤 佳為浮式法。 於本發明之平板玻璃製造方法中,將藉由上述本發明之 150041.doc •17- 201111312 炼融玻璃製造方法所得之炼融玻璃成形為平板破璃之前, 亦可藉由減壓消泡消除該熔融玻璃令之泡沫。 ,本發明之平板玻璃製造方法係將藉由本發明之溶融破璃 製造方法所得之均質性較高之㈣玻璃成形為平板玻璃, 因此可獲得均質性較高且透明性較高之平板玻璃。 本發明之平板玻續製造裝置可適用於製造各種用途之平 板玻璃,但由於謂得均質性較高且透明性較高之平板玻 璃,故而尤佳為適用於製造如FPD用玻璃基板般對均質性 要求極為嚴格之用途之平板玻璃。 實施例 對圖1、2所示之熔解槽10之投入口以達到所需組成之方 式投入玻璃原料,製造'為1500〜176〇。〇之無鹼玻璃。圖 1、2所示之熔解槽1〇之各部分之尺寸為如下。 熔融玻璃流路之長度Lf: 16〜25m 炼融玻璃流路之寬度:5.5〜9m 自熔融玻璃流路之上游端起至第丨起泡器13行為止之距離 〇.43Lp—〇.46Lp 自熔融玻璃流路之下游端起至第2起泡器14行為止之距離 :〇.47Lf~〇.54Lf 第1起泡器13行與第2起泡器14行之距離Lp : 6〇〇〜8〇〇 mm 之泡器之行方向上之各個起泡器丨3、14之間距p : 4〇〇〜7 mm 熔解槽中之熔融玻璃之流路方向上之第1起泡器13行與最 接近4行上游側之燃燒器15之距離: 5〇〇〜i5〇〇 mm 150041.doc 201111312 炫解槽中之熔融玻璃之流路方向上之第2起泡器14行與最 接近該行下游側之燃燒器! 5之距離Lb2 :〗〇〇〇〜2⑼〇 mm Lb2-Lbi^500 mm 熔解槽中之熔融玻璃之流路方向上之各個燃燒器間之距 離: 800〜2400 mm 以來自第1起泡器13之平均流量Vi及自第2起泡器14之平 均流量V2達到下述條件之方式進行調整。 V! : 1.8〜2.6公升/分鐘 V2 : 0.9〜2.0公升/分鐘 vi-V2g〇.6公升/分鐘 藉由燃燒器15中之姆煻,而监钕,& & …乂而將弟1起泡器13之上方之環 去兄氣體溫度T丨及第2起泡器j 4 之上方之%境軋體溫度T2保 持為下述條件。再者,ΤI另τ在^丄 T. Τ2 I及丁2係糟由上述方法而測定。 τ · 1590〜1710。。Fi. The distance from the upstream end of the molten glass flow path is 〇.3〇L, which is 34Lf, and is near the center in the width direction of the fused glass flow path. F2. The distance from the downstream end of the molten glass flow path is 〇22"~〇 and the vicinity of the center in the width direction of the molten glass flow path. (Measurement method) Video shooting of the foam flow on the surface of the molten glass is carried out. The moving time with respect to the moving distance of the foam is used as the flow rate. This sequence is repeated 2 to 3 times to determine the average flow rate. Next, the method for producing the flat glass of the present invention will be described. The molten glass obtained by the method for producing a molten glass of the present invention is formed into a flat glass. As a method of forming the molten glass into a flat glass, various forming methods such as a float method and a down-draw method can be used. The dicing is 1500 to 176 (rCi glass) In the case of the flat glass manufacturing method of the present invention, the smelting glass obtained by the above-described 15041.doc • 17-201111312 smelting glass manufacturing method of the present invention is formed into a flat glass. Previously, the molten glass foam can also be eliminated by vacuum defoaming. The method for manufacturing the flat glass of the present invention will be The glass having a high homogeneity obtained by the method for producing a molten glass of the invention is formed into a flat glass, so that a flat glass having high homogeneity and high transparency can be obtained. The flat glass continuous manufacturing apparatus of the present invention can be applied to various types of manufacturing. Flat glass for use, but flat glass having high homogeneity and high transparency is particularly suitable for use in the production of flat glass which is extremely strict in homogeneity, such as a glass substrate for FPD. The input port of the melting tank 10 shown in Figs. 1 and 2 is put into a glass raw material in such a manner as to achieve a desired composition, and an alkali-free glass of '1500 to 176 Å. 〇. The melting tank shown in Figs. 1 and 2 is produced. The size of each part is as follows. Length of molten glass flow path Lf: 16 to 25 m Width of flow path of molten glass: 5.5 to 9 m Distance from the upstream end of the molten glass flow path to the behavior of the third bubbler 13 .43Lp—〇.46Lp Distance from the downstream end of the molten glass flow path to the second bubbler 14: 〇.47Lf~〇.54Lf The first bubbler 13 rows and the second bubbler 14 Distance Lp: 6〇〇~8〇〇mm bubbler trip The distance between each of the bubblers 丨3, 14 in the direction is: p〇〇4〇〇~7 mm The first bubbler 13 row in the direction of the molten glass flow path in the melting tank and the burner closest to the upstream side of the 4 rows Distance from 15: 5〇〇~i5〇〇mm 150041.doc 201111312 The second bubbler 14 in the direction of the flow path of the molten glass in the solution tank and the burner closest to the downstream side of the line! Lb2 : 〇〇〇 2 〜 2 (9) 〇 mm Lb2-Lbi ^ 500 mm The distance between the burners in the direction of the flow path of the molten glass in the melting tank: 800 to 2400 mm with the average flow rate from the first bubbler 13 Vi and the average flow rate V2 of the second bubbler 14 are adjusted as follows. V! : 1.8~2.6 liters/min V2: 0.9~2.0 liters/min vi-V2g〇.6 liters/min by the burner 15 in the sputum, while the sputum, && The ring gas temperature T丨 above the bubbler 13 and the % rolling body temperature T2 above the second bubbler j 4 are maintained under the following conditions. Furthermore, ΤI and τ are measured by the above method in the case of T. Τ2 I and butyl 2. τ · 1590~1710. .

1580 〜1675 〇C Ti-T2 : l〇~35°C1580 ~ 1675 〇C Ti-T2 : l〇~35°C

Fi=8〜15 m/hr F2=l~4 m/hr 而製造Τη為1S00〜1760。(:且均質 藉由以上述條件實施, !生較尚之兩品質無鹼玻璃 150041.doc -19. 5 201111312 對本發明進行了詳細說明,又,參 行了說明’但業者須知只要不脫離本態樣進 便可進行各種變更或修正。 之精砷及範圍, 本申請案係基於2〇〇9年9月 請案2009-219347研發而成者 處0 24日提出申請之日本專利申 ,將其内容作為參考編入此 產業上之可利用性 本發明之炫融玻璃製造裝置及溶融玻璃製造方法適於生 產均質性較高之高品質無鹼玻璃。又,本發明之平板玻璃 製造方法可製造均質性較高且透明性較高之平板玻璃,故 而適於製造FPD用基板。 【圖式簡單說明】 圖1係本發明之溶融玻璃製造裝置中之熔解槽之一實施 形態之剖面圖;及 圖2係圖1所示之熔解槽1〇之平面圖,其中,省略了熔解 槽10之上部壁面。 【主要元件符號說明】 10 熔解槽 11 投入口 12 排放口 13 弟1起泡 14 第2起泡器 15 燃燒器 16 來自第1起泡器之氣體 150041.doc 201111312Fi = 8 to 15 m / hr F2 = 1 ~ 4 m / hr and the manufacturing Τ is 1S00 to 1760. (: and homogenization is carried out by the above conditions, the two quality non-alkali glass is more than 150041.doc -19. 5 201111312 The invention is described in detail, and the description has been made 'but the operator knows that as long as it does not deviate from this aspect Various changes or amendments can be made. The application is based on the Japanese patent application filed on the 24th of September 2009, the application for the case of 2009-219347. The availability of the glazed glass manufacturing apparatus and the molten glass manufacturing method of the present invention is suitable for producing a high-quality alkali-free glass having high homogeneity. Moreover, the flat glass manufacturing method of the present invention can produce homogeneity. Fig. 1 is a cross-sectional view showing an embodiment of a melting tank in a molten glass manufacturing apparatus of the present invention; and Fig. 2 is a flat glass having a high transparency and a high transparency. Fig. 1 is a plan view of the melting tank 1〇, in which the upper wall surface of the melting tank 10 is omitted. [Main component symbol description] 10 Melting tank 11 inlet 12 discharge port 13 brother 1 The second bubbler 14 bubbles 15 from the gas burner 16 of the first bubbler 150041.doc 201111312

17 20 100 101 G Lbi、 Lf P 來自第2起泡器之氣體 下游側之導管 上游側環流 下游側環流 溶融玻璃17 20 100 101 G Lbi, Lf P Gas from the second bubbler downstream of the conduit upstream side circulation downstream side circulation molten glass

Lb2 ' Lp 距離 長度 間距 150041.doc -21 ·Lb2 ' Lp distance length spacing 150041.doc -21 ·

Claims (1)

201111312 七、申請專利範圍: 1. 一種熔融玻璃製造裝置,其特徵在於:其係用以製造玻 璃黏度η達到l〇2[dPa.S]之溫度1^為1500〜1760°C之熔融玻 璃者該炫融玻璃製造裝置包括熔解玻璃原料之熔解 槽, 於上述熔解槽之底面附近,於遍及熔融玻璃流路之寬 度方向上包括複數個第丨起泡器及複數個第2起泡器, 上述第1起泡器係相較上述第2起泡器設置於熔融玻璃 流路之上游側, 上述溶解槽係包括用以加熱該炼融槽之上部空間之燃 燒器,且於將上述熔解槽之熔融玻璃流路之長度設為^ 時,自上述熔融玻璃流路之上游端起至上述第丨起泡器 灯為止之距離為〇.4LF〜〇.5LF,自上述熔融玻璃流路之下 游端起至上述第2起泡器行為止之距離為 〇.45LF〜〇.55LF,上述第丨起泡器行與上述第2起泡器行之 距離Lp為500〜1〇〇〇 mm, 上述熔解槽中之熔融玻璃之流路方向上之上述第1起 泡器行與最接近該行上游側之燃燒器之距離“丨為〇〜2_ mm, 上述熔解槽中之熔融玻璃之流路方向上之上述第2起 泡器行與最接近該行下游側之燃燒器之距離為 800〜2500 mm ’ 且 LB2>LB1。 2_如請求項丨之熔融玻璃製造裝置,其中於上述第1起泡器 及上述第2起泡器中,起泡器之行方向上之各個起泡器 150041.doc 201111312 之間距p為400〜700 mm。 3. 如請求項1或2之熔融玻璃製造裝置,其中於將上述熔解 槽中之熔融玻璃之流路方向作為軸時,上述第丨起泡器 與上述苐2起泡器係以不在同一轴上之方式配置。 4. 如請求項1至3中任一項之熔融玻璃製造裝置,其中上述 熔解槽之構成材料係為含Zr〇2之耐火磚’於形成熔融玻 璃流路之上述熔解槽之底面中之自上述第丨起泡器行起 至上游側之0.1LF〜0.3LF之部分,使用以質量%計心〇2為 85%以上97%以下且剩餘部分以Si〇2為主體之玻璃質之 熱溶融耐火物。 5. 如請求項1至4中任一項之熔融玻璃製造裝置,其中上述 第1起泡器及上述第2起泡器係為鉑製或鉑合金製,由上 述第1起泡器及上述第2起泡器供給之氣體為不含氧之氣 樘熔融玻璃製 〇. 項之熔融玻璃製造裝置’並於將上述第i起泡器所供 之氣體之平均流量設為、[公升/分鐘],上述第2起泡 供給之氣體之平均流量設為%[公升/分鐘],上述第夏 泡器之上方之環境氣體溫度設為Tirc],上述第2起泡 之上方之環境氣體溫度設為IK]時,以VP%、 之條件’製造熔融玻璃。 1 如請求項6之熔融玻璃製造方法,其中於相較上述第i 泡器而形成於上游側之㈣玻璃之上游側環流之平均 速設為Fl[m/hr],相較上述第2起泡器而形成於下游側 150041 .doc 201111312 熔融破璃之下游倒 Γ 〇Λ 爪之千均流逮設為F2〖m/hrJ時,以 F,=5~20 m/hr > f2-〇 c 7 ,, • 7 m/hr之條件,製造熔融玻璃。 8. -種平板玻璃製造方法,其係將藉由如請求項之熔 融玻璃製造方法所得之熔融玻璃成形為平板破續者 150041.doc201111312 VII. Patent application scope: 1. A molten glass manufacturing device, which is characterized in that it is used for manufacturing a molten glass having a glass viscosity η of l〇2 [dPa.S] and a temperature of 1500 to 1760 °C. The glazing glass manufacturing apparatus includes a melting tank for melting the glass raw material, and includes a plurality of second bubblers and a plurality of second bubblers in a width direction of the molten glass flow path in the vicinity of a bottom surface of the melting tank, The first bubbler is disposed on the upstream side of the molten glass flow path than the second bubbler, and the dissolution tank includes a burner for heating the upper space of the refining tank, and the melting tank is When the length of the molten glass flow path is set to ^, the distance from the upstream end of the molten glass flow path to the first bubbler lamp is 〇.4LF to 〇.5LF, from the downstream end of the molten glass flow path The distance from the second bubbler to the above-mentioned second bubbler is 〇.45LF~〇.55LF, and the distance Lp between the first bubbler row and the second bubbler row is 500~1〇〇〇mm, the above melting The flow path of the molten glass in the tank The distance between the first bubbler row and the burner closest to the upstream side of the row is "丨~2_mm, and the second bubbler row in the flow direction of the molten glass in the melting tank is The distance of the burner closest to the downstream side of the row is 800 to 2500 mm ' and LB2 > LB1. 2_ The molten glass manufacturing apparatus of claim 1 wherein the first bubbler and the second bubbler are The distance between the respective bubblers in the direction of the bubbler 150041.doc 201111312 is 400 to 700 mm. 3. The molten glass manufacturing apparatus according to claim 1 or 2, wherein the molten glass in the melting tank is When the direction of the flow path is the axis, the first bubbler and the 苐2 bubbler are disposed on the same axis. The molten glass manufacturing apparatus according to any one of claims 1 to 3, wherein The constituent material of the melting tank is a portion of the bottom surface of the melting tank containing the Zr〇2 in the bottom surface of the melting tank forming the molten glass flow path from the first bubbler row to the upstream side of 0.1 LF to 0.3 LF. Use the mass% 2 to be 85% or more and 97% The glass-melting refractory refractory material of the present invention, wherein the first blistering device and the second blistering device are The apparatus is made of platinum or a platinum alloy, and the gas supplied from the first bubbler and the second bubbler is a gas-free molten glass made of oxygen-free molten glass. The average flow rate of the gas supplied from the i-th bubbler is [liters per minute], and the average flow rate of the gas supplied from the second bubbling is set to % [liters per minute], and the environment above the first bubbler is set. When the gas temperature is Tirc] and the ambient gas temperature above the second foaming is IK], the molten glass is produced at a condition of VP%. 1. The method for producing a molten glass according to claim 6, wherein an average velocity of the upstream side of the (four) glass formed on the upstream side of the first i-bubble is set to F1 [m/hr], which is compared with the second The bubbler is formed on the downstream side 150041.doc 201111312 The downstream of the molten glass is inverted Γ The thousand-average flow of the claw is set to F2 [m/hrJ, with F,=5~20 m/hr > f2-〇 C 7 ,, • 7 m/hr conditions to make molten glass. 8. A method of manufacturing a flat glass, which is formed by forming a molten glass obtained by a molten glass manufacturing method as claimed in claim 150.
TW099125520A 2009-09-24 2010-07-30 A method for producing a molten glass, a method for producing a molten glass, and a method of manufacturing the same, TWI483913B (en)

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