201105955 六、發明說明： 【發明所屬之技術領域】 本發明係關於-種評估顯示器畫質時使 顯示器評估系統。 ，愿先盗及 【先前技術】 目前’液晶面板等顯示器之生產線係建構成可實現均 ::品質。然❿’即使是此種生產線，各顯示器亦會產生 ::[因此，A了調整輸出更佳影像之顯示器已進行 各種探討（例如’參照專利文獻1)。此專利文獻i揭示之技 術中，將調整對象裝置之畫皙 仪 質。 質調整成近似於目標裝置之晝 然而’以使用各種攝影元件之攝影機拍攝具有週期性 圖案之對象物時’有時在拍攝 安乂电 像會產生錢（m〇ire)圖 面杯：㉟上晝面上並無上述波紋圖案。波紋圖案係液晶 面板般之格子㈣案（像素格子圖請CXD之各像素之格 子干涉產生之圖案。 因此’亦有各種為除去波紋圖案之探討（例如 利文獻2〜4)。 食…寻 例如，專利文獻2揭示在檢測平板顯示器之像素缺陷 之晝質檢查裝置中，從用於#冑 、、 士八 於畫質檢查之影像資料除去波紋 成刀之技術。此文獻記載之枯 ’ 像資料取出波紋成分，檢測 ^ ^ 期撕…… 檢測此波紋成分之週期，將就各週 期配置之像素質相加以求中 + 欠出除去缺陷成分後之複數個平滑 曲線。求出位於此複數個平滑 深上之像素值與原來影像 201105955 取得缺陷影像資料，並求出複數個平滑曲線之 滑影像^不含波紋圖案之平滑影像資料。接著，將此平 用貪傻眘與缺陷影像資料相加’將此相加結果作為檢查 用影像資料儲存於影像記憶體。 又’專利文獻3揭示在咖檢查裝置中，降低波紋圖 謀未提昇檢查精度之技術。此文獻記載之技術中，在 拍攝被檢查對象物之LCD面板之攝影機、與連接於該攝影 機並顯示攝影機所拍攝之LCD面板之影像之監測器之間， 設置使通過該LCD面板之光擴展至LCD面板之黑光罩部分 之光學低通濾波器。 又，專利文獻4揭示了 一種不需要軟體之處理僅使 用低價且簡單構造之光學構件獲得無波紋圖案之拍攝影像 之技術。此文獻記載之技術中，在攝影機與檢查對象畫面 之間之任意位置插入使光散射之散射透射板來進行拍攝。 專利文獻1 :曰本專利第4109702號公報（第1頁、圖 1) 專利文獻2 :曰本特開平11 _ 352〇丨丨號公報（第1頁、 圖1) 專利文獻3 :曰本特開平8 — 327496號公報（第1頁、 圖1) 專利文獻4 :日本特開平1 1 - 6786號公報（第1頁、圖 【發明内容】 任一習知技術皆具有下述問題，即隨著大幅影像之不 4 201105955 鮮明化，不易觀察或檢測存在於對象物之與圖案週期相同 程度之尺寸變化或缺陷。 當進行液晶面板之偏差修正時，若拍攝到波紋圖案則 無法與原本之偏差圖案區別而成為問題。又，為了拍攝細 微偏差圖案’亦無法非必要地使影像模糊不清。 此處，波紋圖案係數位訊號處理理論中之返折變形。 此返折變形被看見成一圖案即為波紋圖案Q返折變形係奈 奎斯特頻率以上之頻率因取樣而出現在低頻側者。 圖11係顯示用以調整光量之一般圓形光闌5〇，藉由開 口區域使光透射過。 圖12係在一般圓形光闌5〇之模糊之形狀（點像強度分 布函數 PSF : P〇int Spread Functi〇n)之例，目 13 係二維顯 示此形狀。 尺用上述圓形光闌 所示。可知高頻成分並未充分衰減。 又，^般光學低通濾波器係以水晶板構成並設置在 鄰⑽之前方。然而’由於水晶低通濾波器係利用水晶 ;复：射二雙重)，因此基本上係雙重投射於從1點稍微分離 、 般而3 ’將二片水晶板重疊，藉由縱橫二次使用 述效果，將1點八触4、J v 刀離成4個之四重點投射於CCD上。此 低通錢器無法除去錢圖案。 I發明係為了解 一種著目卩於^ 、上述课碭而構成，其目的在於提 又；奈奎斯特頻率、抑制波紋 以1個像素單位解姑夕旦，你^ 圓系且用以拍 衫像之濾光器及顯示器評估系統 201105955 為了解決上述問題點’本 備複數個受光像素之固㈣ 係適用於具 生#❹太 、固良、攝影元件，其特徵在於：設有產 之透射遙八古 之頻率尹之空間頻率成分之波形 之為光後:，該奈㈣特頻率係根據於該固態攝影元件 〈又尤像素之間距决定。 根據本發明’能使高 抑 攻刀充刀哀減。此外，若適當 〇又疋SF之大小以設定奈 作成使奈查斯特頻率以上之ΓΓΓ 點，則能 特頻率以下之頻率成八^ 充分衰減、使奈奎斯 器。 羊成刀良好地通過之理想光學低通濾波 本發明之較佳形態中，為了設置該八 相對橫截濾光器之至少一 ^ 刀 °又 度之開口部。 個松截轴具有常態分布之開口寬 圖宰2上述形態’藉由使該橫截轴與拍攝對象之週期性 例如，液晶面板般之格子狀圖案卜致，能使高頻成分 截站卜i述形態中’較佳為’該開口部係藉由相對橫 截軸對稱配置之二個常態分布曲線構成。 、 形狀=I使在與橫截轴正交之正交軸，亦可獲得「山」 生。-口部’因此在正交軸方向亦可抑制高頻成分之產 件之較佳形態中’該透射率分布係使用形成於板 午之開孔之密度分布構成。 藉此，板件之開孔之密度分布與遽光器之透射率分 6 201105955 布、亦即光學濃度分布對應 定光學濃度分布。 對板件之孔加工精密設 本發明之另_ a彡能+ "，該透射率分布係使用形成於透 明板之點圖案之密度分布構成。 取边 藉此，能維持透明板 *鉻又此谷易徒南透射率。 本發明之較佳形態令， ^ — 作两该透射率分布，#佶用氺 強度在©態# f彡& # 巾係、使用先 干之又先面成為常態分布之分布。 藉此’能使奈奎斯特 叫付领半以上之頻率確實地衰減》 又本發明之顯示輝· 士 & & 4+ 株且供.… L平估系統’其具備：固態攝影元 件’具備複數個受光傻+ .冰輿么^ ^ 冢素，光學系統構件，對 顯示器之影像進行聚隹·以洛法1 Τ㈣果之 ^ Μ，以及濾光器，係設置於該光學系 統構件之光閣位置，設有產生抑制奈查斯特頻率以上之頻 :中之空間頻率成分之波形之透射率分布，該奈奎斯特頻 率係根據於該固態攝影元件之受光像素之間距決定。 根據本發明，可抑制奈奎斯特頻率以上之頻率成分導 致之波紋圖案之產生，可確實進行顯示器之評估。 根據上述本發明，可提供抑制波紋圖案、且用以拍攝 以1個像素單位解析之影像之濾光器及顯示器評估系統。 【實施方式】 (第1實施形態） 以下’針對本發明之濾光器及顯示器評估系統進行說 明。本實施形態中，假設使用CCD影像感測器評估調整對 象之顯示面板之畫質之情形。此處，如圖1所示，作為調 整對象之顯示面板，係使用液晶面板1〇。此液晶面板1〇， 201105955 藉由以既定週期（第1間距）配置之像素元件形成影像 此外，用以評估此液晶面板10之顯示器評 ^ 系統係由 光學調整裝置20、攝影機30、測定裝置35描+ 4再成。又，在 液晶面板1 〇連接有影像訊號產生裝置i 5。 此處’作為攝影手段（攝影裝置）之攝影機3 U 拍攝透 過光學調整裝置20取得之影像，將輸出影像資料供應至測 定裝置35。本實施形態中，攝影機3〇係使用具備作為固態 攝影元件之CCD影像感測器31之單眼攝影機^ Ccd影像 感測器31，藉由以既定週期（與第！間距不同之第2間距） 配置之像素感測器拍攝影像。 測定裝置35評估從CCD影像感測器3丨取得之影像之 畫質。 影像訊號產生裝置1 5對液晶面板丨〇供應晝質評估用 之測》式圖案说號。與該測試圖案訊號對應，將測試圖案影 像輸出至液晶面板10上β 光學調整裝置20係調整顯示於液晶面板1 〇上之影像 之焦點之裝置。光學調整裝置2〇係由濾光器2丨、對影像進 行聚焦之作為光學系統構件之透鏡（221，222)構成。如後 述’為了使PSF形狀成為平滑之「山」形狀，必需使進入 光闌部分之濾光器21周邊部分之透射率為大致「〇」。如 上述’為了進入透射率低之濾光器，作為透鏡（221，222)， 係使用充分明亮F值之透鏡來設計，設計成進入濾光器後 之實效F值成為目的值。 (濾光器） 8 201105955 本實施形態中，將在設置於離焦位置之ccd影像感測 器31之受光面之PSF設定成目的之形狀。具體而言，將產 生抑制奈奎斯特頻率以上之頻率中之空間頻率成分之波形 之透射率分布設置於遽光器21 ’該奈查斯特頻率係根據於 CCD影像感測器31之像素之間距決定。因此，在光學調整 裝置20’在透鏡（221，222)之光闌位置，作為低通滤波器插 入具有光學濃度梯度之濾光器21。 本實施形態中使用之濾光器21，如圖7所示，係藉由 將金屬板（板件）加工成網眼狀形成，藉此濾光器21具有目 的之光學濃度梯度。具體而言，在濾光器21設置開孔2ιι。 此開孔211之密度分布，係藉由離濾光器2丨中心之位置（2 ^ & 21b，21c)改變。亦即，以開孔211之分布密度從濾光器2ι 之中心朝向直徑方向外側呈同心圓變化（減少）之方式，將開 孔211設置於濾光器2 i。 如此，即能以金屬板之加工精度精密設定光學濃度分 布。此網眼之遮蔽率與光學濃度分布對應。 由開孔211構成之網眼圖案本身，由於在像面成為極 細之圖案，因此不經解析即可獲得與開孔2丨丨之密度分布 對應之階度。 (離焦量之決定） 接著’針對離焦量之決定進行說明。 從液晶面板1〇之像素發出之光，依據圖2所示之光路 到達CCD影像感測器31。此處，將從光學調整裝置2〇之 焦點位置至CCD影像感測器3 1之距離設為離焦量（df)。此 201105955201105955 VI. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a display evaluation system for evaluating the image quality of a display. I would like to steal first. [Previous technology] At present, the production line structure of displays such as LCD panels can achieve both quality and quality. Then, even in such a production line, each display will produce :: [therefore, A display for adjusting the output of a better image has been discussed variously (for example, 'Reference Patent Document 1). In the technique disclosed in this patent document i, the photographic quality of the target device will be adjusted. The quality is adjusted to be similar to the target device. However, when an object with a periodic pattern is photographed by a camera using various photographic elements, it is sometimes used to produce an ampoule (m〇ire) cup: 35 There is no such ripple pattern on the surface. The corrugated pattern is a grid-like grid (4) case (the pixel grid pattern is a pattern generated by the lattice interference of each pixel of CXD. Therefore, there are various kinds of discussions for removing the moiré pattern (for example, Lie Literature 2 to 4). Patent Document 2 discloses a technique for removing corrugation into a knife from an image inspection apparatus for detecting image defects of a flat panel display, which is used for image data of #胄, 士八于 image quality inspection. Take out the corrugated component and detect the tearing of the ^^ period. Detect the period of the corrugated component, and add the smoothing curve after removing the defective component from the pixel phase of each period. Find the smoothing in the complex The pixel value in the depth and the original image 201105955 Obtain the defect image data, and find the smooth image of the plurality of smooth curves. ^ The smooth image data without the ripple pattern. Then, add the smug and the defect image data together. The addition result is stored in the image memory as the inspection image data. Further, Patent Document 3 discloses that the ripple pattern is reduced in the coffee inspection apparatus. A technique for improving the inspection accuracy. In the technique described in this document, a camera is provided between the camera that captures the object of the object to be inspected, and a monitor that is connected to the camera and displays an image of the LCD panel that is captured by the camera. The light of the LCD panel is extended to the optical low-pass filter of the black mask portion of the LCD panel. Further, Patent Document 4 discloses a processing method that does not require a soft body and obtains a non-corrugated pattern using only a low-cost and simple-structured optical member. In the technique described in this document, a scattering transmission plate that scatters light is inserted at an arbitrary position between the camera and the inspection target image to perform imaging. Patent Document 1: Japanese Patent No. 4109702 (page 1, figure) 1) Patent Document 2: 曰本特开平11 _ 352〇丨丨 (1st page, Fig. 1) Patent Document 3: 曰本特开平8-327496 (Page 1, Figure 1) Patent Document 4 Japanese Patent Publication No. Hei 1 1 - 6786 (page 1 of the drawings) [Embodiment] Any of the prior art has the following problem, that is, as the large image is not sharpened, It is easy to observe or detect dimensional changes or defects existing in the object at the same level as the pattern period. When the deviation correction of the liquid crystal panel is performed, if the ripple pattern is captured, it cannot be distinguished from the original deviation pattern and becomes a problem. The fine deviation pattern 'cannot unnecessarily obscure the image. Here, the ripple pattern coefficient bit signal processing theory in the folding deformation. This folding deformation is seen as a pattern that is the ripple pattern Q back deformation deformation Nyqui The frequency above the Sterling frequency appears on the low frequency side due to sampling. Figure 11 shows a general circular aperture 5 用以 for adjusting the amount of light, which is transmitted through the open area. Figure 12 is a general circular aperture. For example, the shape of the fuzzy shape (PSF: P〇int Spread Functi〇n) is shown in Fig. 13 and the shape is displayed in two dimensions. The ruler is shown by the above circular aperture. It is known that the high frequency component is not sufficiently attenuated. Further, the optical low-pass filter is formed of a crystal plate and placed in front of the adjacent (10). However, 'because the crystal low-pass filter uses crystal; complex: shot two doubles, so basically double projection is slightly separated from 1 point, and 3' overlaps two crystal plates, by vertical and horizontal secondary use The effect is to project the 1:8 touch 4, J v knife into 4 four focus on the CCD. This low money machine cannot remove the money pattern. The I invention department is constructed to understand a kind of subject matter, and the purpose is to raise it; the Nyquist frequency and the suppression ripple are solved in 1 pixel unit, and you are round and used to shoot Shirt filter and display evaluation system 201105955 In order to solve the above problem, the fixed number of light-receiving pixels (four) is suitable for the students. #❹太,固良, photographic components, characterized by: transmission The frequency of the spatial frequency component of Yin’s frequency is the light: the nano (four) special frequency is determined according to the solid-state imaging element. According to the present invention, the high-suppression tool can be squandered. In addition, if the size of the SF is set to a point above the Nesbet frequency, the frequency below the special frequency can be sufficiently attenuated to make the Nyquis. Ideal optical low pass filtering for good passage of sheep. In a preferred embodiment of the invention, at least one opening of the eight opposing cross-sectional filters is provided. The opening cross-sectional axis of the loose cross-axis has a normal distribution. The above-mentioned form 'by making the cross-sectional axis and the periodicity of the object, for example, a grid-like pattern of a liquid crystal panel, enables high-frequency components to be intercepted. In the embodiment, the 'preferably' opening portion is constituted by two normal distribution curves which are symmetrically arranged with respect to the axial axis. , shape = I makes the orthogonal axis perpendicular to the cross-axis, and can also obtain "mountain". The mouth portion is thus preferably in a preferred form of a product for suppressing high-frequency components in the direction of the orthogonal axis. The transmittance distribution is constituted by a density distribution of openings formed in the plate. Thereby, the density distribution of the opening of the plate member and the transmittance of the chopper are divided into 6 201105955 cloth, that is, the optical density distribution corresponds to the optical density distribution. The hole processing of the plate member is precisely designed. According to the present invention, the transmittance distribution is constituted by a density distribution of a dot pattern formed on the transparent plate. By taking the edge, it is possible to maintain the transparency of the transparent plate * chrome. The preferred embodiment of the present invention allows ^ to be the distribution of the two transmissions, and the intensity of the 佶 在 在 © © © 彡 彡 彡 © 、 、 、 、 、 、 、 、 、 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 In this way, 'the Nyquist can be surely attenuated by the frequency of more than half of the volume.>> The display of the present invention is also provided by the F. &&& 4+ strains. 'Equipped with a plurality of light-stricken singers. · Hail ^ ^ ^ 冢 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , The position of the light chamber is provided with a transmittance distribution that produces a waveform that suppresses the spatial frequency component of the frequency above the Nystst frequency, and the Nyquist frequency is determined according to the distance between the pixels of the solid-state imaging element. According to the present invention, the generation of the ripple pattern caused by the frequency components above the Nyquist frequency can be suppressed, and the evaluation of the display can be surely performed. According to the present invention described above, it is possible to provide a filter and a display evaluation system for suppressing a moiré pattern and for capturing an image analyzed in units of one pixel. [Embodiment] (First Embodiment) Hereinafter, a filter and a display evaluation system according to the present invention will be described. In the present embodiment, it is assumed that the CCD image sensor is used to evaluate the image quality of the display panel of the adjustment object. Here, as shown in Fig. 1, a liquid crystal panel 1 is used as a display panel to be adjusted. The liquid crystal panel 1A, 201105955 forms an image by a pixel element arranged at a predetermined period (first pitch). Further, the display evaluation system for evaluating the liquid crystal panel 10 is provided by the optical adjustment device 20, the camera 30, and the measuring device 35. Trace + 4 again. Further, an image signal generating device i 5 is connected to the liquid crystal panel 1 . Here, the camera 3 U, which is a photographing means (photographing device), captures an image obtained by the optical adjusting device 20, and supplies the output image data to the measuring device 35. In the present embodiment, the camera 3 uses a monocular camera Ccd image sensor 31 including a CCD image sensor 31 as a solid-state imaging device, and is configured by a predetermined period (second pitch different from the first pitch). The pixel sensor captures the image. The measuring device 35 evaluates the image quality of the image taken from the CCD image sensor 3. The image signal generating device 15 supplies the liquid crystal panel 丨〇 with a test pattern number for evaluation of the enamel. Corresponding to the test pattern signal, the test pattern image is output to the liquid crystal panel 10. The beta optical adjustment device 20 is a device for adjusting the focus of the image displayed on the liquid crystal panel 1. The optical adjustment device 2 is composed of a filter 2, a lens (221, 222) as an optical system member that focuses on an image. As will be described later, in order to make the PSF shape a smooth "mountain" shape, it is necessary to make the transmittance of the peripheral portion of the filter 21 entering the aperture portion substantially "〇". As described above, in order to enter a filter having a low transmittance, the lens (221, 222) is designed using a lens having a sufficiently bright F value, and is designed such that the effective F value after entering the filter becomes a target value. (Filter) 8 201105955 In the present embodiment, the PSF of the light receiving surface of the ccd image sensor 31 provided at the out-of-focus position is set to the intended shape. Specifically, a transmittance distribution that generates a waveform of a spatial frequency component in a frequency above the Nyquist frequency is set to the chopper 21'. The Nystast frequency is based on the pixel of the CCD image sensor 31. The distance between the decisions. Therefore, the optical adjustment device 20' is inserted into the optical filter 21 having the optical density gradient as a low-pass filter at the pupil position of the lens (221, 222). As shown in Fig. 7, the optical filter 21 used in the present embodiment is formed by processing a metal plate (plate) into a mesh shape, whereby the optical filter 21 has a desired optical density gradient. Specifically, the aperture 21 is provided in the filter 21. The density distribution of the opening 211 is changed by the position of the center of the filter 2 (2 ^ & 21b, 21c). That is, the opening 211 is provided in the filter 2 i such that the distribution density of the opening 211 is concentrically changed (reduced) from the center of the filter 2 ι toward the outer side in the diametrical direction. Thus, the optical density distribution can be precisely set with the processing precision of the metal plate. The masking rate of this mesh corresponds to the optical density distribution. Since the mesh pattern itself constituted by the opening 211 has a very fine pattern on the image surface, the gradation corresponding to the density distribution of the opening 2丨丨 can be obtained without analysis. (Determining the amount of defocus) Next, the decision on the amount of defocus is explained. The light emitted from the pixels of the liquid crystal panel reaches the CCD image sensor 31 in accordance with the optical path shown in FIG. Here, the distance from the focus position of the optical adjustment device 2 to the CCD image sensor 31 is set as the defocus amount (df). This 201105955
時，光闌之形狀以與離焦量（df)成正比之大小投影至CCD 影像感測器3 1上。是以，藉由調整離焦量（df)，可製作自 由大小之離焦影像（模糊）。此外，模糊之形不取決於離焦量 (df)。 圖3係顯示本實施形態目的之模糊形狀、亦即使用滤 光器時之光強度分布。高度方向表示光之強度，χγ軸表示 在CCD影像感測器3 1面上之位置。 圖4係以二維顯示此光強度分布。橫軸刻度係格式化 成CCD影像感測器3 1之間距之長度正好成為r丨」。縱軸 刻度係以最大光強度格式化。 圖5係顯示此形狀之頻率特性。橫軸之單位為頻率， 係格式化成根據於C C D影像感測器3丨之間距決定之奈奎斯 特頻率成為「1」。縱軸之單位係以回應dB顯示，—4〇dB 時成為「1/100」。 本實施形態之離焦量（df)係調整成模糊之大小成為圖5 所不。模糊之形係藉由進入光闌位置之濾光器2丨決定，即 使改變離焦量亦不會變化。 又，以圖5為基準使離焦量變化之頻率特性係顯示於 圖6。此處’圖6之⑷係使離焦量變化成基準之2倍、⑻ 係使離焦量變化成與基準相同、⑷係使離焦量變化成基準 之—半時的頻率特性。若增加離焦量則模糊變大，取代從 頻衰減，可使奈㈣特頻率以上之頻率確實衰減。若減 少離焦量則模糊變小，取代抑制低頻之衰減，無法使奈查 特頻率以上之頻率衰減反而增加。如上述，藉由使離焦 10 201105955 量變化，可取得高社衰減量與低頻成分之通過量之折衷。 此處’對液晶面板10上之點光源，設定成光在離焦位 置之強度「V⑴」成為f態分布，係藉由下述算式表示。 V(r)= exp(- 2xr2) 此處 r」係離原點（〇，0)之距離，設與CCD影像感 測…間距間隔相同之長度為「丨」(單位卜本實= 之濾光器2 1之透射率分布亦近似於常態分布，修正成在離 焦位置光強度成為常態分布。此外，雖透射率分布近似於 常態分布為佳，但實質上在與常態分布有❹之情形亦可 降低波紋之產生。 上述算式中，即使增加「r」亦不會成為「〇」，因此嚴 格來說光之存在範圍成為無限。如此則無法製作，因此要 限制在適當圍。考慮此限制時之最適當形狀雖與上式不 同’但結果上而言成為與上述算式相#類似之形狀。 根據本實施形態，可獲得以下效果。 •本實施形態中’在光闌位置設置具有透射率梯度（光 學濃度梯度）之濾光器21。藉由此濾光器，遮斷影像中之奈 奎斯特頻率成分以上。此處，比較本實施形態之頻率特性（圖 5)與一般光闌之頻率特性（圓14)。圖14與圓5中，調整模 糊之大小以使在奈奎斯特頻率之回應成為相同。比較兩圖 之頻率特性，可知在目的之形狀高頻充分衰減，但在一妒 形狀之模糊高頻不會衰減0 又 波紋圖案之產生原因係顯示器之格子圖案，其集中在 高頻。若能使此高頻有效衰減則能抑制波紋圖案之產生。 201105955 疋以’可抑制波紋圖案’確實進行顯示器之評估。 •本實施形態中，為了在濾光器21實現目的之光學濃 度梯度，將金屬板加工成網眼狀。即使使用一般減光濾光 器（ND濾光器）使光學濃度分布精密變化，亦不易控制此光 學濃度梯度。本實施形態中，金屬板之網眼之遮蔽率與光 學濃度分布對應，能以金屬加工精度精密設定光學濃度分 布。 (第2實施形態） 上述第1實施形態中，將開孔211以其分布密度呈同 〜圓變化之方式設置於濾光器2丨，藉此在濾光器2〖設置透 射率分布。第2實施形態中，針對使用具有常態分布之開 口寬度之開口部之濾光器進行說明。 此處，對圖8(a)所示之液晶面板1〇之像素n，使用圖 8(b)所不之濾光器21。此濾光器2丨具有開口部2丨3。此開 口部213係藉由將相對橫截轴214對稱配置之二個常態分 布曲線加以接合後形狀之緣部構成。本實施形態中，將此 橫截軸214配置成通過光軸（濾光器21)之中心。 使用此濾光器21之情形，使橫截軸214 一致於rgb 各色之像素11之配置方向（圖8(a)中水平方向）。 根據本實施形態，可獲得以下效果。 •本實施形態中，開口部213具有將相對橫截軸214 對稱配置之二個常態分布曲線加以接合後之形I在液晶 面板H)’由於RGB各色之像素相對亮度不同，因此 產生縱條紋之亮度圖案(週期性圖案藉由配合此週期性圖 12 201105955 案之產生方向（此處為水平方向）設置由常態分布曲線構成 之開口部，可抑制波紋圖案，確實進行顯示器之評估。 •本實施形態中’藉由設置將相同形狀之常態分布曲 線加以對稱接合後形狀之開口部213，即使在與橫截轴正交 之正交軸(圖8中垂直方向）’亦可獲得「山」形狀之開口寬 度分布。藉此，可抑制高頻成分在正交軸之產生。 •本實施形態中’將開口部213之橫截軸214構成為 通過光轴（渡光器2丨）之中心。藉此，可抑制透鏡之像差之 產生。 又’上述實施形態亦可進行下述變更。 〇上述實施形態中，適用於液晶面板1〇之波紋圖案之 抑制，但調整對象之顯示面板並不限於此。亦可適用於電 _示器（磨）、有機EL(電致發光）顯示器、投影型投影機 專之藉由週期性像素構成之影像之輸出裝置。 〇上述實施形態中，使用具備以既定週期配置之像素 感測器之CCD影像感測器31拍攝影像，但攝影元件並不限 於此。可適用於具備以因顯示器之像素配置之週期產生波 紋圖案之週期配置之像素感測器之攝影元件（例如， CMOS(互補金屬氧化半導體）攝影元件）。 〇上述實施形態中，對金屬板加工以作成濾光器21。 替代此，亦可在透明板（例如玻璃板）上印刷網眼圖案以作成 濾光器21。在玻璃板上形成點分布密度不同之點圖案。點 例如配置成其分布密度從濾光器21之中心朝向直徑方向外 側呈同心圓變化（增加）。金屬板加工之情形，開孔數變多則 13 201105955 有時金屬板之強度會降低，但玻璃板之情形，能容易提昇 透射率。 然而’使用玻璃板之情形，必需進行包含玻璃板之透 鏡設計。又，為了抑制在玻璃板表面之不必要反射，必需 施加與透鏡相同之低反射塗布。 關於此時使用之透鏡’在光闌位置之光線通過位置與 離焦時之到達像面位置之關係，較佳為遍布整個拍攝區域 皆不會變化。是以，使用遍布整個拍攝區域幾乎無像差之 透鏡。 〇上述第2實施形態中’開口部213之緣部係藉由將 相對橫截軸214對稱之常態分布曲線加以接合後之曲線構 成。此緣部之形狀並不限於此，只要開口部2丨3之開口寬 度相對橫截軸成為常態分布即可。例如，如圖9(a)所示，使 用使直線與常態分布曲線成為緣部之開口部亦可。又，如 圖9(b)所示’藉由在曲線上設定常態分布之開口寬度形成 開口部亦可。 又在開口部213’只要橫截轴214上之開口寬度之分 布接近常態分布即可。此時，即使開口寬度為一部分成為 常態刀布或接近常態分布之分布之情形，亦可降低波紋之 產生。 ◦上述第2實施形態中’將開口部213之橫截軸214 構成為通過光軸（濾光器21)之中心，但其位置並不限於中 心。例如，如圖1〇所示，即使橫截軸214從濾光器21之 中心偏移之情形，亦可降低波紋之產生。 201105955 【圆式簡單說明】 係本發明-實施形態之顯示器評估系統的說明圖。 圖係顯示器評估系統的光線圖。 =3係❹本發明之滤光器時之光強度分布的說明圖。 說明/係使用本發明之滤光器時之光強度分布（二維）的 時之光強度分布之頻率特 圖5係使用本發明之濾光器 性的說明圖。 圖6係離焦量與光強度分布之頻率特性之關係的說明 圖’⑷係使離焦量變化成2倍、(b)係使離 ⑷係使離焦量變化成基準之一半時的頻率特性。 圖7係本發明一實施形態之濾光器的說明圖。 圖8係本發明第2實施形態之濾光器的說明圖，（昀係 拍攝對象之像素、（b)係濾光器構造的說明圖。 圖9係本發明另一實施形態之濾光器的說明圖，（昀係 使用一個常態分布曲線的開口部、係使用曲線上之常態 分布曲線的開口部。 圖10係本發明另一實施形態之濾光器的說明圖。 圖11係習知光闌的說明圖。 圖12係使用習知光闌時之光強度分布的說明圖。 圖13係使用習知光闌時之光強度分布（二維）的說明 圖〇 圖1 4係使用習知光闌時之光強度分布之頻率特性的說 明圖。 15 201105955 【主要元件符號說明】 10 液晶面板 15 影像訊號產生裝置 20 光學調整裝置 21 渡光器 211 開孔 213 開口部 214 橫截轴 221, 222 透鏡 30 攝影機 31 CCD影像感測器 35 測定裝置 16At the time, the shape of the pupil is projected onto the CCD image sensor 3 1 in a size proportional to the amount of defocus (df). Therefore, by adjusting the amount of defocus (df), a free-focus image (blur) of a free size can be produced. In addition, the shape of the blur does not depend on the amount of defocus (df). Fig. 3 is a view showing the blur shape of the object of the embodiment, that is, the light intensity distribution when the filter is used. The height direction indicates the intensity of light, and the χ γ axis indicates the position on the face of the CCD image sensor 31. Figure 4 shows this light intensity distribution in two dimensions. The horizontal axis scale is formatted so that the length between the CCD image sensors 3 1 is exactly r丨”. The vertical axis scale is formatted with maximum light intensity. Figure 5 shows the frequency characteristics of this shape. The unit of the horizontal axis is the frequency, which is formatted so that the Nyquist frequency determined according to the distance between the C C D image sensors 3 成为 becomes "1". The unit of the vertical axis is displayed in response to dB, which becomes "1/100" at -4〇dB. The amount of defocus (df) in the present embodiment is adjusted so that the size of the blur is as shown in Fig. 5 . The shape of the blur is determined by the filter 2 that enters the pupil position, even if the amount of defocusing is changed. Further, the frequency characteristic in which the amount of defocus is changed based on Fig. 5 is shown in Fig. 6. Here, (4) of Fig. 6 is such that the amount of defocus is changed to twice the reference, (8) the amount of defocus is changed to be the same as the reference, and (4) is the frequency characteristic when the defocus amount is changed to the reference half. If the amount of defocus is increased, the blur becomes larger, and instead of the attenuation of the frequency, the frequency above the frequency of the nano (four) is actually attenuated. If the amount of defocus is reduced, the blur becomes smaller, instead of suppressing the attenuation of the low frequency, the frequency attenuation above the Netchat frequency cannot be increased. As described above, by varying the amount of defocus 10 201105955, a compromise between the amount of high attenuation and the throughput of the low frequency component can be obtained. Here, the point light source on the liquid crystal panel 10 is set such that the intensity "V(1)" of the light at the defocusing position is in the f-state distribution, and is expressed by the following formula. V(r)= exp(- 2xr2) where r is the distance from the origin (〇, 0), and the length of the same distance from the CCD image sensing... is “丨” (the unit is the filter of the true = The transmittance distribution of 2 1 is also approximated to the normal distribution, and the light intensity is corrected to be a normal distribution at the defocus position. In addition, although the transmittance distribution is preferably similar to the normal distribution, it may be substantially in the case of a normal distribution. Reduce the occurrence of ripples. In the above formula, even if "r" is added, it will not become "〇". Therefore, strictly speaking, the range of light is infinite. Therefore, it cannot be produced, so it is necessary to limit it to appropriate circumference. The most appropriate shape is different from the above formula, but in the result, it has a shape similar to the above formula. According to the present embodiment, the following effects can be obtained. • In the present embodiment, 'the transmittance gradient is set at the pupil position ( The filter 21 of the optical density gradient is used to block the Nyquist frequency component in the image by the filter. Here, the frequency characteristic of the embodiment (Fig. 5) and the frequency of the general pupil are compared. special (Circle 14). In Figure 14 and Circle 5, adjust the size of the blur so that the response at the Nyquist frequency becomes the same. Comparing the frequency characteristics of the two figures, it can be seen that the shape of the target is sufficiently attenuated at high frequencies, but in a The blurring high frequency of the shape does not attenuate 0. The reason why the corrugated pattern is generated is the grid pattern of the display, which is concentrated at the high frequency. If this high frequency is effectively attenuated, the generation of the moiré pattern can be suppressed. The pattern 'is indeed evaluated by the display. · In the present embodiment, in order to achieve the desired optical density gradient in the filter 21, the metal plate is processed into a mesh shape. Even if a general dimming filter (ND filter) is used. In the present embodiment, the optical density distribution is not easily controlled, and the optical density gradient is not easily controlled. In the present embodiment, the shielding ratio of the mesh of the metal plate corresponds to the optical density distribution, and the optical density distribution can be precisely set with the metal working precision. In the first embodiment, the opening 211 is provided in the filter 2丨 so that the distribution density thereof is changed from the circle to the circle, whereby the filter 2 is provided in the filter 2 In the second embodiment, an optical filter using an opening having a normal width of the opening width will be described. Here, the pixel n of the liquid crystal panel 1 shown in Fig. 8(a) is used. 8(b) No filter 21. The filter 2 has an opening 2丨3. The opening 213 is joined by two normal distribution curves symmetrically arranged with respect to the transverse axis 214. In the present embodiment, the cross-sectional axis 214 is disposed so as to pass through the center of the optical axis (filter 21). With the filter 21, the cross-sectional axis 214 is aligned with the pixels of the rgb colors. The arrangement direction of 11 (horizontal direction in Fig. 8(a)). According to the present embodiment, the following effects can be obtained. In the present embodiment, the opening portion 213 has two normal distribution curves which are symmetrically arranged with respect to the transverse axis 214. After the bonding, the shape I is different in the liquid crystal panel H)' because the relative brightness of the pixels of the RGB colors is different, so that the brightness pattern of the vertical stripes is generated (the periodic pattern is generated by the timing of the periodic pattern 12 201105955 (here, the horizontal direction) ) set by the normal distribution An opening portion, the pattern of corrugations can be suppressed, the display does evaluated. In the present embodiment, the opening 213 having a shape in which the normal distribution curve of the same shape is symmetrically joined is provided, and even the orthogonal axis (vertical direction in FIG. 8) orthogonal to the cross-sectional axis can be obtained. The width of the opening of the shape of the mountain. Thereby, generation of high frequency components on the orthogonal axis can be suppressed. In the present embodiment, the cross-sectional axis 214 of the opening portion 213 is configured to pass through the center of the optical axis (the optical pulverizer 2). Thereby, the occurrence of aberration of the lens can be suppressed. Further, the above embodiment may be modified as follows. In the above embodiment, the suppression of the ripple pattern of the liquid crystal panel 1 is applied, but the display panel to be adjusted is not limited thereto. It can also be applied to electric image display devices, organic EL (electroluminescence) displays, and projection projectors. In the above embodiment, the image is captured by the CCD image sensor 31 having the pixel sensor arranged in a predetermined cycle, but the imaging element is not limited thereto. It is applicable to a photographic element (for example, a CMOS (Complementary Metal Oxide Semiconductor) photographic element) having a pixel sensor arranged in a periodic pattern of a wavy pattern due to a pixel arrangement period of the display. In the above embodiment, the metal plate is processed to form the filter 21. Alternatively, a mesh pattern may be printed on a transparent plate (e.g., a glass plate) to form the filter 21. A pattern of dots having different dot distribution densities is formed on the glass plate. The point is, for example, configured such that its distribution density changes concentrically (increases) from the center of the filter 21 toward the outer side in the diametrical direction. In the case of sheet metal processing, the number of openings increases. 13 201105955 Sometimes the strength of the metal sheet is lowered, but in the case of a glass sheet, the transmittance can be easily improved. However, in the case of using a glass plate, it is necessary to carry out a lens design including a glass plate. Further, in order to suppress unnecessary reflection on the surface of the glass plate, it is necessary to apply the same low-reflection coating as the lens. It is preferable that the relationship between the position of the light passing through the position of the lens at the pupil position and the position of the image plane at the time of defocusing is not changed over the entire imaging area. Therefore, a lens with almost no aberration throughout the entire shooting area is used. In the second embodiment, the edge portion of the opening portion 213 is formed by joining a normal distribution curve which is symmetrical with respect to the cross-sectional axis 214. The shape of the edge portion is not limited thereto, as long as the opening width of the opening portion 2丨3 is normally distributed with respect to the transverse axis. For example, as shown in Fig. 9(a), an opening portion in which a straight line and a normal distribution curve are formed as edges may be used. Further, as shown in Fig. 9(b), the opening portion may be formed by setting the opening width of the normal distribution on the curved line. Further, in the opening portion 213', the distribution of the opening width on the cross-sectional axis 214 is close to the normal distribution. At this time, even if a part of the opening width becomes a normal knife cloth or a distribution close to a normal distribution, the generation of the ripple can be reduced. In the second embodiment described above, the cross-sectional axis 214 of the opening 213 is configured to pass through the center of the optical axis (filter 21), but the position is not limited to the center. For example, as shown in Fig. 1A, even if the cross-sectional axis 214 is offset from the center of the filter 21, the generation of ripples can be reduced. 201105955 [Circular Simple Description] An explanatory diagram of a display evaluation system according to the present invention. The diagram displays the ray diagram of the system. = 3 is an explanatory diagram of the light intensity distribution when the filter of the present invention is used. Description/The frequency of the light intensity distribution at the time of the light intensity distribution (two-dimensional) when the optical filter of the present invention is used. Fig. 5 is an explanatory view showing the use of the filter of the present invention. Fig. 6 is an explanatory diagram showing the relationship between the defocus amount and the frequency characteristic of the light intensity distribution. (4) is a frequency in which the amount of defocus is changed by a factor of two, and (b) is a frequency at which the amount of defocusing is changed to one half of the reference. characteristic. Fig. 7 is an explanatory view showing an optical filter according to an embodiment of the present invention. 8 is an explanatory view of a filter according to a second embodiment of the present invention, (a pixel of a subject to be imaged, and (b) an explanatory view of a filter structure. FIG. 9 is a filter according to another embodiment of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 10 is an explanatory view of an optical filter according to another embodiment of the present invention. Fig. 11 is a schematic view of a filter according to another embodiment of the present invention. Fig. 12 is an explanatory diagram of light intensity distribution when a conventional aperture is used. Fig. 13 is an explanatory diagram of light intensity distribution (two-dimensional) when a conventional aperture is used. Fig. 14 is a light intensity distribution when a conventional aperture is used. 15 201105955 [Description of main component symbols] 10 LCD panel 15 Video signal generating device 20 Optical adjusting device 21 Drain 211 Opening 213 Opening 214 Cross-axis 221, 222 Lens 30 Camera 31 CCD image Sensor 35 measuring device 16