201102682 六、發明說明： 【發明所屬之技術領域】 本發明係關係一種繞射光學元件及繞射光學元件陣列之製作方 法，特別是以蝕刻方式製作繞射光學元件及繞射光學元件陣列的製作 方法。 【先前技術】 目前各類之繞射光學元件(DOEs，diffractive optical elements)在成 像光學、紅外光學、照明、微顯示器(micro display)、光通訊、太陽能集 光模組、光感測器(sensors)、光學量測(metr〇l〇gy)、光資料儲存(〇ptical datastorage)、光譜儀、光微影蝕刻、雷射加工(lasermachining)等領域 皆扮演相當重要的角色’由於玻璃具有高折射率，低熱膨脹係數、低收 縮率、低折射率改變量且玻璃材料的硬度與抗刮傷的能力也較一般高分 子材料來的好，加上玻璃材料可用之工作波長範圍較廣，也較能於高 溫、高熱及真空環境下工作，使得應用在高精度、高解析度的繞射光學 元件上具有絕對的優勢。 習知技術中採用玻璃模造成形的方式生產製作玻璃光學元件，以同 時提昇生產效率及降低製作成本’但如何對應於欲模造成形之光學玻璃 元件的微結構圖形，製備出用於玻璃模造成形此等極精密光學玻璃元件 的玻璃模造模仁，則是首要克服的挑戰。一般而言，此種用於模造成形 玻璃光學元件的玻璃模造模仁，不外乎是以直接研磨加工的方式，或是 利用放電、雷射等非傳統加工的方式製作，但於玻璃模造模仁的微結構 必須對應於光學元件的微結構圖形，因此研磨加工的困難度極高，也因 此，提尚了玻璃鑄造模仁的的製作成本，再者，若以放電或雷射等非傳 統加工方式加工製作的玻璃模造模仁，則常有玻璃微結構加工精度及表 面狀況粗糙度較差的問題。 .201102682 由於以玻璃材料製作光學元件具有上述種種的問題，因此業界亟需 -種低製作成本、高生產麟且又能翻高精需麵光學元件製作 方法》 【發明内容】 為克服上述缺點，本發明提供一種繞射光學元件的製作方法包括 提供具有第-硬度與第-厚度的基材，並於紐上形成絲層，光阻 層具有均勻的第_南度’接著提供表面形成有繞射光學元件公圖案 (malepattern)的模具，公圖案的外部周圍形成有複數個支腳，各支腳具 有第二高度，第二高度不小於紐層的第—高度，模具具有第二硬度， 第二硬度不大於基材的第-硬度’之後以模具對絲層進行壓印，並 使模具的複數個支腳穩定接觸基材的表面，藉此在光阻層的表面形成 對應於公圖案的母圖案(female pattem)，接著硬化光阻層，然後移除模 具，再以反應式離子蝕刻(RIE)自光阻層的上方對光阻層與基材進行蝕 刻，最後持續姓刻以移除細層，藉此形成一繞射光學元件的公圖案 於該基材的上表面，且此時基材具有第二厚度，且第二厚度小於第一 厚度。 ' 因此，本發明之主要目的在於提供一種繞射光學元件的製作方 法，由於模具可重複使用，故可降低繞射光學元件的製作成本。 本發明之另一目的在於提供一種繞射光學元件的製作方法，由於 利用模具壓㈣枝形成繞射光學聽的_，故可提升繞射光學元 件的生產效率。 本發明之再一目的在於提供一種繞射光學元件的製作方法，由於 模具表面公圖案係以高精密度的車削加工形成，故可製作出高精密度 的繞射光學元件。 又 此外’本發明亦提供一種繞射光學元件陣列的製作方法，包括提供 具有第-硬度與第-厚度的紐，並於基材上形就阻層，光阻層具 201102682 有均勻的第一高度，接著提供表面形成有繞射光學元件公圖案(male pattern)的模具，公圖案的外部周圍形成有複數個支腳，各支腳具有第 二高度，第二高度不小於光阻層的第一高度，模具具有第二硬度，第 二硬度不大於基材的第一硬度，之後以模具依序對光阻層進行壓印， 並使模具的複數個支腳穩定接觸基材的表面，藉此在光阻層的表面形 成對應於公圖案的母圖案(female pattern)陣列，接著硬化光阻層，然後 移除模具，再以反應式離子触刻(RIE)自光阻層的上方對光阻層與基材 進行蝕刻，最後持續蝕刻以移除光阻層，藉此形成繞射光學元件的公 圖案陣列於基材的上表面，且此時基材具有第二厚度，且第二厚度小 於第一厚度。 因此，本發明之另一目的在於提供一種繞射光學元件陣列的製作 方法，由於模具可重複使用，故可降低繞射光學元件的製作成本。 本發明之另一目的在於提供一種繞射光學元件陣列的製作方法， 由於利用模具壓印的方式形成繞射光學元件的圖案，故可提升繞射光 學元件的生產效率。 本發明之再一目的在於提供一種繞射光學元件陣列的製作方法， 由於模具表面公圖案係以高精密度的車削加工形成，故可製作出高精 密度的繞射光學元件。 此外，本發明亦提供另一種繞射光學元件陣列的製作方法，包括 提供具有第一硬度與第一厚度的基材，並於基材上形成光阻層，光阻 層具有均勻的第一高度，接著提供表面形成有複數個繞射光學元件公 圖案(malepattern)的模具’公圖案的外部周圍形成有複數個支腳，各支 腳具有第二高度，第二高度不小於光阻層的第一高度，模具具有第二 硬度，第二硬度不大於基材的第一硬度，之後以模具對光阻層進行壓 印，並使模具的複數個支腳穩定接觸基材的表面，藉此在光阻層的表 面形成對應於公圖案的母圖案陣列，接著硬化光阻層， 201102682 然後移除模具，私反赋離子侧(RIE)自絲層的上謂光阻層與 基材進行蝕刻，最後持續蝕刻以移除光阻層，藉此形成繞射光學元件 的公圖案陣列於基材的上表面，且此時基材具有第二厚度，且第二厚 度小於第一厚度。 因此’本發明之另-目的在於提供一種繞射光學元件陣列的製作 方法，由於模具可重複使用，故可降低繞射光學元件的製作成本。 本發明之另-目的在於提供-種繞射光學元件陣列的製作方法，201102682 VI. Description of the Invention: [Technical Field] The present invention relates to a method for fabricating a diffractive optical element and an array of diffractive optical elements, in particular for fabricating a diffractive optical element and an array of diffractive optical elements by etching method. [Prior Art] Currently, various types of diffractive optical elements (DOEs) are used in imaging optics, infrared optics, illumination, micro display, optical communication, solar collector modules, and light sensors (sensors). ), optical measurement (metr〇l〇gy), optical data storage (〇ptical datastorage), spectrometer, photolithography, laser machining (lasermachining) and other fields play a very important role 'because glass has a high refractive index Low thermal expansion coefficient, low shrinkage rate, low refractive index change, and the hardness and scratch resistance of glass materials are better than those of general polymer materials. In addition, glass materials can be used in a wide range of operating wavelengths. Working in high temperature, high heat and vacuum environments makes the application an absolute advantage in high precision, high resolution diffractive optics. In the prior art, the glass optical component is produced by using a glass mold to form a glass optical component to simultaneously improve production efficiency and reduce the manufacturing cost, but how to correspond to the microstructure pattern of the optical glass component to be molded, the glass mold is formed. Glass-molded mold cores of equipolar precision optical glass components are the primary challenge. In general, the glass mold mold used for the mold-forming glass optical element is produced by direct grinding or by non-traditional processing such as discharge or laser, but is molded by glass mold. The microstructure of the kernel must correspond to the microstructure of the optical component, so the difficulty of the grinding process is extremely high, and therefore, the manufacturing cost of the glass casting mold is increased, and further, if the discharge or laser is not conventional The glass mold core made by the processing method often has the problem of poor processing precision of the glass microstructure and roughness of the surface condition. .201102682 Since optical components made of glass materials have various problems as described above, there is a need in the industry for a low production cost, high production cost, and high-precision optical component manufacturing method. [SUMMARY OF THE INVENTION] To overcome the above disadvantages, The invention provides a method for fabricating a diffractive optical element, comprising providing a substrate having a first hardness and a first thickness, and forming a silk layer on the button, the photoresist layer having a uniform first degree 'then' and then providing a surface formed with a winding a mold for projecting a male pattern, a plurality of legs are formed around an outer portion of the male pattern, each leg has a second height, the second height is not less than a first height of the layer, and the mold has a second hardness, After the second hardness is not greater than the first hardness of the substrate, the silk layer is embossed by the mold, and the plurality of legs of the mold are stably contacted with the surface of the substrate, thereby forming a surface corresponding to the male pattern on the surface of the photoresist layer. a female pattern (female pattem), followed by hardening the photoresist layer, then removing the mold, and etching the photoresist layer and the substrate from above the photoresist layer by reactive ion etching (RIE). After continuing to remove fine name engraved layer, thereby forming a diffraction pattern on the surface of the well base of the optical element, and a second substrate having a thickness at this time, and a second thickness less than the first thickness. Therefore, it is a primary object of the present invention to provide a method of fabricating a diffractive optical element which can reduce the manufacturing cost of the diffractive optical element since the mold can be reused. Another object of the present invention is to provide a method of fabricating a diffractive optical element which can improve the production efficiency of a diffractive optical element by forming a diffractive optical yoke by using a die pressure (four) branch. Still another object of the present invention is to provide a method for fabricating a diffractive optical element. Since the male pattern on the surface of the mold is formed by high-precision turning, a high-precision diffractive optical element can be produced. In addition, the present invention also provides a method for fabricating an array of diffractive optical elements, comprising providing a first hardness and a first thickness, and forming a resist layer on the substrate, and the photoresist layer 201102682 has a uniform first a height, followed by providing a mold having a male pattern of a diffractive optical element formed on the surface, a plurality of legs formed around the outer portion of the male pattern, each leg having a second height, and the second height being not less than the first layer of the photoresist layer a height, the mold has a second hardness, the second hardness is not greater than the first hardness of the substrate, and then the photoresist layer is embossed sequentially by the mold, and the plurality of legs of the mold are stably contacted with the surface of the substrate, This forms an array of female patterns corresponding to the male pattern on the surface of the photoresist layer, and then hardens the photoresist layer, then removes the mold, and then reacts to the light above the photoresist layer by reactive ion lithography (RIE). The resist layer is etched with the substrate, and finally etching is continued to remove the photoresist layer, thereby forming a male pattern array of the diffractive optical element on the upper surface of the substrate, and at this time the substrate has a second thickness and a second thickness Less than the first a thickness. Accordingly, it is another object of the present invention to provide a method of fabricating an array of diffractive optical elements which can reduce the fabrication cost of the diffractive optical element since the mold can be reused. Another object of the present invention is to provide a method of fabricating a diffractive optical element array in which the pattern of the diffractive optical element is formed by means of mold imprinting, thereby improving the production efficiency of the diffractive optical element. Still another object of the present invention is to provide a method of fabricating a diffraction optical element array in which a high-precision diffractive optical element can be produced since a male pattern on a mold surface is formed by high-precision turning. In addition, the present invention also provides another method for fabricating an array of diffractive optical elements, comprising providing a substrate having a first hardness and a first thickness, and forming a photoresist layer on the substrate, the photoresist layer having a uniform first height And then providing a mold having a plurality of diffractive optical element male patterns on the surface. The outer circumference of the male pattern is formed with a plurality of legs, each leg having a second height, and the second height is not less than the first layer of the photoresist layer a height, the mold has a second hardness, the second hardness is not greater than the first hardness of the substrate, and then the photoresist layer is embossed with the mold, and the plurality of legs of the mold are stably contacted with the surface of the substrate, thereby The surface of the photoresist layer forms an array of mother patterns corresponding to the male pattern, and then the photoresist layer is cured, 201102682 and then the mold is removed, and the opposite side of the filament layer (RIE) is etched from the substrate by the photoresist layer. Finally etching is continued to remove the photoresist layer, thereby forming a male pattern array of diffractive optical elements on the upper surface of the substrate, and at this point the substrate has a second thickness and the second thickness is less than the first thickness. Therefore, another object of the present invention is to provide a method of fabricating an array of diffractive optical elements which can reduce the manufacturing cost of the diffractive optical element since the mold can be reused. Another object of the present invention is to provide a method for fabricating an array of diffractive optical elements,
由於利用模具齡的方式形賴射光學元件關案，故可提升繞射光 學元件的生產效率。 本發明之再-目的在於提供—種繞射光學元件_的製作方法， 由於模具表面公圖錢以高難度的賴加工軸，故可製’ 密度的繞射光學元件。 间 此外 所製作。 ’本發明亦提供另-魏射光學元件，驗由±述製造方法 ’係經由上述製造 再者，本發明亦提供另一種繞射光學元件陣列 方法所製作。 L貫施方式】 由於本發明係揭露—種繞射光學元件的製作方法，其中所利用加 工及_技術’已為相關技術領域具有通常知識者所能明瞭，故 文中之說明，不再作完整描述。同時，以下文中所對照之圖式，係表 特徵有關之示意，並未亦不需要依據實際情形完整繪製， f參閱第1Α圖，係本發明之第—較佳實施例製 一種繞射光學元件的製作方法，包含下列步驟： 圖為 步驟心触紐1G。料畔料lB ，构 實施例__。歸1G __硬度鄕—厚度叫，基^ 201102682 材質可以為含碳化矽(Sic)或碳化鎢(WC)的玻璃。 步驟102 :於基材10上形成光阻層i卜請共同參考第1C圖為 本發明第-較佳實關中基材10上形成絲之示_。光阻層n 均勻的第一高度hi。 、 步驟103 :提供模具12，請共同參考第1D圓，為本發日月第—較佳 實施例中模具示意模具12的表面形成錄射光學元件的公圖案 mjmalepatten!) ’其外部周圍形成有4個支腳122，各支腳具I。有第 二高度h2,第二高度h2不小於光阻層u的第—高度w，模具12具有 第二硬度，第二硬度不大於基材1〇的第一硬度，模具η的材質可為 紹、紹合金、無氧銅或銅合等軟質金屬。 步驟1〇4 ··請共同參考第1E圖’為本發明第一較佳實施讎具壓 印示意圖。賴具12對光_ U進行騎，並賴具u的複數個支 腳122穩定接觸基材10的表面，藉此在光阻層u的表面形成對應於公 圖案121的母圖案13(female pattem) ’由於模具12具有等高的支腳 122，因此可精準的控制壓印後光阻層丨丨之厚度。 步驟H>5 :硬化細層U，請刺參考第1F圖，為本發明第一較 佳實施例光Μ硬㈣意圖。本項魏步财透财12加熱藉由 模具12導熱至光阻層11而將使光阻層u硬化’或是利用紫外光照射 基材10底部’使料光穿透基材1G而照㈣^使其硬化。 步驟i〇6 ··請共同參考第1G圖’為本發明第一較佳實施例侧光 阻層11與基板1G示_。絲層u經上述步驟15硬化完成後，移除 模具12，独歧應式離子__)自光阻層u的上方對 光阻層11與基材10進行蝕刻。 步_ :請制參考第1關，為本發料—_實施例基板1〇 表面形成繞射光學元件綠圖。職働Ux錄練層u，藉此形成 繞射光學元件公圖案121於基材1G的上表面，由於光阻層U經模且 201102682 η壓印後之厚度會影轴刻的結果，故經侧後基材1G具有第二厚度 D2 ’第二厚度D2會小於第一厚度di。 请參閱第II圖’係模具12示意圖，模具12可以超精密鑽石車削 之奈米級定位精度於模具12之表面進行加工形成公圖案121。 本發明除提供如S -較佳實補獅之賴光學元件製作方法 外，亦提供-種繞射光學元件陣列之製作方法，如第二較佳實施例所 述。本實_與第-較佳實施例之差異在於本實施狀模具係依序於 基板上之光阻層進行壓印’而纽層經模具依序壓印即產生母圖案陣 列。 請參閱第2A ®，係本發明第二較佳實施例製作方法流程圖，為一 種繞射光學元件陣列的製作方法，包含下列步驟： 步驟201 :請參閱第2A 0 ’係本發明第二較佳實施例示意圖。首 先，提供基材20，基材20具有第-硬度與第一厚度，基材2〇之材質 可以為含碳化矽(SiC)或碳化鎢(WC)的玻璃。 步驟202 :請繼續參閱第2A圖，於基材2〇上形成光阻層2ι，光 阻層21具有均勻的第一高度。 步驟203 :請繼續參閱第2A圖，提供模具22，模具22的表面形 成有繞射光學元件的公®案，公_的料關軸有紐個支腳， 各支腳具有第二高度，第二高度不小於光阻層21的第—高度，模具22 具有第二硬度’第二硬度不大於基材20的第一硬度。 步驟204 :請繼續參閱第2A圖，依序以模具22對光阻層21進行 壓印後將紐2〇輯魏’靴的方法可以是透·類Μ加熱藉 由模具22導熱至光阻層21而使光阻層21硬化，或是紫外光昭射 基材20底部’使餅光穿透基材2G而照_光阻層21使其硬化，藉 以在光阻層21的表_成_狀调案23，其巾各個賴祕對應^ 公圖案’且麼印時’需使模具22的複數個切觀接觸基材2〇的表 201102682 面。 步驟205 ·移除模具，並以電漿侧或反應式離子侧(肌)_ 光阻層22與基材2〇。 ，步驟206 :請繼續參閱第2A圖，持續蝕刻以移除光阻層21，藉此 形成陣列狀排列的繞射光學元件的公圖案於基材2G的上表面由於光 阻層21、經模具22壓印後之厚度會影響侧的結果，故經触刻後基材 2〇具有第二厚度且此時基材2〇具有第二厚度，第二厚度小於第一厚 度而光阻層21經模具22依序壓印後所產生之母圖案陣列23，如第 2B圖及第2C圖所示》 本發明除提供如第-較佳實施例所示之繞射光學元件製作方法 外，再提供-種繞射光學元件陣列之製作方法，如第三較佳實施例所 述。本實施例與第-較佳實施例之差異在於，本實施㈣鱗列式模 具對基板上之光阻層進行壓印，經_式模具壓印後之光阻層即可產 生母圖案陣列。 請參閱第3Α圖，係本發明第三較佳實施例製作方法流程圖，為一 種繞射光學元件陣列的製作方法，包含下列步驟： 步驟301 :請參閱第3Α圆，提供基材3〇，基材3〇具有第一硬度 與第-厚度。於基材30形成光阻層31 ’光阻層31具有均勻的第一高 度。 步驟302 :請繼續參閱第3Α圖，提供模具陣列32，模具陣列32 的表面形成有複數個繞射光學元件的公圖案(malepattem)，公圆案的外 部周圍形成有複數個支腳，各支腳具有第二高度，第二高度不小於光 阻層3!的第-高度’模具32具有第二硬度，第二硬度不大於基材邓 的第一硬度。 步驟303:請繼續參閱第3A圆，以模具32對光阻31進行壓印與 201102682 _ 31_自撕綱刚调帛33，其中各個 材案’壓印時需使模具32的複數個支腳穩定接觸基 光阻層1= 材Γ具，並以電浆峨反應式離恤_)_ =304 :請繼續參閱第3A圖，移除模具32，並以絲_或反 應式離子蝕刻光阻層32與基材3〇。 / 步驟305 :請繼續參閱第3A圖，持續侧以移除光阻層31，藉此，Since the optical element is cut by the mold age, the production efficiency of the optical element can be improved. A further object of the present invention is to provide a method for fabricating a diffractive optical element, which is capable of producing a density diffractive optical element because of the difficulty in processing the axis of the mold surface. Also produced in addition. The present invention also provides an additional -wei optical element, which is manufactured by the above-described manufacturing method. Further, the present invention also provides another method of diffractive optical element array. The present invention discloses a method for fabricating a diffractive optical element, wherein the processing and the technique used are well known to those skilled in the relevant art, and therefore the description in the text is no longer complete. description. At the same time, the drawings referred to in the following texts are diagrams related to the features of the watch, and are not required to be completely drawn according to the actual situation. Referring to FIG. 1 , a diffractive optical element is a preferred embodiment of the present invention. The manufacturing method includes the following steps: The figure shows the step heart touch button 1G. Material material lB, structure Example __. 1G __hardness 鄕—thickness is called, base ^ 201102682 The material can be glass containing strontium carbide (Sic) or tungsten carbide (WC). Step 102: Forming a photoresist layer on the substrate 10. Referring to FIG. 1C in common, the wire 10 is formed on the substrate 10 in the first preferred embodiment of the present invention. The first height hi of the photoresist layer n is uniform. Step 103: Providing the mold 12, please refer to the 1st circle in common. In the first embodiment of the present invention, the mold of the mold 12 is formed on the surface of the mold 12 to form a male pattern of the recording optical element mjmalepatten!) 4 legs 122, each leg I. There is a second height h2, the second height h2 is not less than the first height w of the photoresist layer u, the mold 12 has a second hardness, the second hardness is not greater than the first hardness of the substrate 1〇, and the material of the mold η can be Soft metal such as smelting alloy, oxygen-free copper or copper. Step 1〇4··Please refer to FIG. 1E as a schematic view of the first preferred embodiment of the present invention. The spacer 12 rides on the light_U, and the plurality of legs 122 of the u are stably contacted with the surface of the substrate 10, whereby a mother pattern 13 corresponding to the male pattern 121 is formed on the surface of the photoresist layer u (female pattem) ) Since the mold 12 has the legs 122 of equal height, the thickness of the photoresist layer after imprinting can be precisely controlled. Step H>5: Hardening the fine layer U, please refer to Figure 1F for the first preferred embodiment of the present invention. The heating step 12 of this step is heated by the mold 12 to conduct heat to the photoresist layer 11 to harden the photoresist layer u or to illuminate the bottom portion of the substrate 10 with ultraviolet light to cause the light to penetrate the substrate 1G (4) It hardens. Step i〇6··Please refer to FIG. 1G for the first preferred embodiment of the present invention. The side photoresist layer 11 and the substrate 1G are shown as _. After the silk layer u is hardened by the above step 15, the mold 12 is removed, and the photoresist layer 11 and the substrate 10 are etched from above the photoresist layer u. Step _: Please refer to the first level to form a green image of the diffractive optical element on the surface of the substrate. The Ux is used to form the layer u, thereby forming the diffractive optical element male pattern 121 on the upper surface of the substrate 1G. Since the thickness of the photoresist layer U is embossed by the mold and 201102682 η, the thickness of the substrate is etched. The side rear substrate 1G has a second thickness D2 'the second thickness D2 will be smaller than the first thickness di. Referring to Figure II, a schematic view of the mold 12, the mold 12 can be processed on the surface of the mold 12 to form a male pattern 121 by the nano-positioning accuracy of ultra-precision diamond turning. In addition to providing a method for fabricating an optical component such as an S-preferred lion, the present invention also provides a method of fabricating an array of diffractive optical elements, as described in the second preferred embodiment. The difference between this and the first preferred embodiment is that the mold of the embodiment is embossed sequentially on the photoresist layer on the substrate, and the layer is sequentially imprinted by the mold to produce a matrix of mother patterns. Referring to FIG. 2A, a flow chart of a second preferred embodiment of the present invention is a flow chart of a method for fabricating a diffractive optical element, comprising the following steps: Step 201: Please refer to FIG. 2A 0 ' is a second comparison of the present invention. A schematic diagram of a preferred embodiment. First, a substrate 20 is provided. The substrate 20 has a first hardness and a first thickness, and the material of the substrate 2 may be a glass containing tantalum carbide (SiC) or tungsten carbide (WC). Step 202: Please continue to refer to FIG. 2A to form a photoresist layer 2ι on the substrate 2, and the photoresist layer 21 has a uniform first height. Step 203: Please continue to refer to FIG. 2A to provide a mold 22, the surface of the mold 22 is formed with a diffractive optical element, the main shaft of the mold has a new leg, and each leg has a second height, The height is not less than the first height of the photoresist layer 21, and the mold 22 has a second hardness 'the second hardness is not greater than the first hardness of the substrate 20. Step 204: Please continue to refer to FIG. 2A. The method of imprinting the photoresist layer 21 with the mold 22 in sequence may be a method of heat-transferring the photoresist through the mold 22 to the photoresist layer. 21, the photoresist layer 21 is hardened, or the ultraviolet light illuminates the bottom portion of the substrate 20 to cause the cake light to penetrate the substrate 2G and harden it according to the photoresist layer 21, whereby the surface of the photoresist layer 21 is formed. For the adjustment of the case 23, the towel of each of the towels corresponds to the "male pattern" and when it is printed, it is necessary to make a plurality of faces of the mold 22 contact the surface 201102682 of the substrate 2〇. Step 205 - The mold is removed and the substrate 2 is rubbed with a plasma side or a reactive ion side (muscle)_photoresist layer 22. Step 206: Please continue to refer to FIG. 2A, continue etching to remove the photoresist layer 21, thereby forming a common pattern of the array-arranged diffractive optical elements on the upper surface of the substrate 2G due to the photoresist layer 21, through the mold 22 The thickness after imprinting affects the side result, so after the etch, the substrate 2 has a second thickness and at this time the substrate 2 has a second thickness, the second thickness is smaller than the first thickness and the photoresist layer 21 passes through The mother pattern array 23 produced by the dies 22 sequentially imprinted, as shown in FIGS. 2B and 2C. The present invention provides a method of fabricating a diffractive optical element as shown in the first preferred embodiment. A method of fabricating an array of diffractive optical elements, as described in the third preferred embodiment. The difference between this embodiment and the first preferred embodiment is that the quaternary mold of the present embodiment embosses the photoresist layer on the substrate, and the photoresist layer embossed by the _ mold can produce an array of mother patterns. Referring to FIG. 3, a flow chart of a method for fabricating a third preferred embodiment of the present invention is a method for fabricating an array of diffractive optical elements, comprising the following steps: Step 301: Referring to the third circle, providing a substrate 3〇, The substrate 3 has a first hardness and a first thickness. The photoresist layer 31 is formed on the substrate 30. The photoresist layer 31 has a uniform first height. Step 302: Please continue to refer to FIG. 3 to provide a mold array 32. The surface of the mold array 32 is formed with a plurality of dummy optical elements (malepattem), and a plurality of legs are formed around the outer circumference of the square case. The foot has a second height, and the second height is not less than the first height of the photoresist layer 3! The mold 32 has a second hardness, and the second hardness is not greater than the first hardness of the substrate Deng. Step 303: Please continue to refer to the 3A circle, and emboss the photoresist 31 with the mold 32 and the 201102682 _ 31_ self-shearing 帛 33, wherein each material 'imprinting needs to make the plurality of legs of the mold 32 Stable contact-based photoresist layer 1 = material cookware, and reactive with plasma _ _ _ = 304: Please continue to refer to Figure 3A, remove the mold 32, and etch the photoresist with wire _ or reactive ion Layer 32 is bonded to substrate 3. / Step 305: Please continue to refer to FIG. 3A, and continue to remove the photoresist layer 31, thereby
=陣列狀排列的繞射光學树的公圖案於基材3〇的上表面，且此時 二厚度，第二厚度小於第一厚度。而光阻層31經陣列 ^一…32依序壓印後所產生之母圖案陣列23，如第3B圖及第 戶If不。 此外，本發明亦提供另一種繞射光學元件，係經 例製作方法所製作。 4第實施 再者’本發明亦提供另一種繞射光學元件陣列 實施例製作方法所製作。 田上述弟一 【圖式簡單說明】 第1A圖’係本發明之第—幢實關製作方法流程圖。 第1B圖，係本發明第—較佳實施例中基材示意务 第1C圖’係本發明第—較佳實施例中基材上形成光阻之示意圖。 第1D圖’係本發明第—較佳實賴巾提供模具示意圖。 第m圖’係本發明第—較佳實施纖具卿示意圖。 第1F圖’係本發明第—較佳實施例光阻層硬化示意圖。 第1G圖’係、本發明第—較佳實施讎刻光阻層與基板示意圖。 第1H @ ’縣翻第—較佳實施鑛板表面形成舖光學元件示 201102682 第ii圖，係模具結構示意圖。 第2A圖，係本發明第二較佳實施例製作方法流程圖 第2B圖，係本發明第二較佳實施例示意圖。 第2C圖，係本發明第二較佳實施例繞射光學元件陣列示意圖。 第3A圖，係本發明第三較佳實施例製作方法流程圖。 第3B圖，係本發明第三較佳實施例示意圖。 第3C圖，係本發明第三較佳實施例繞射光學元件陣列示意圖。 【主要元件符號說明】 基板 10, 20, 30 步驟 101 ' 102 光阻層 11,21,31 模具 12,22， 公圖案 121 支腳 122 母圖案 13 步驟 201 ' 202 母圖案陣列 23,33 步驟 301 ' 302 模具陣列 32 第一高度 hi 第二高度 h2 第一厚度 D1 第二厚度 D2 103、104、105、106、107 、203、204、205、206 、303、304、305、306= The pattern of the array of diffractive optical trees is on the upper surface of the substrate 3, and at this time, the thickness is less than the first thickness. The mother pattern array 23 produced by the photoresist layer 31 after being sequentially imprinted by the arrays ... 32, as shown in FIG. 3B and the household If. Further, the present invention also provides another diffractive optical element which is produced by a method of fabrication. 4 EMBODIMENT Further, the present invention also provides another method of fabricating an array of diffractive optical elements. The above-mentioned younger brother [Simplified illustration of the drawing] Fig. 1A is a flow chart of the method for producing the actual building of the present invention. Fig. 1B is a schematic view showing the formation of a photoresist on a substrate in the first preferred embodiment of the present invention in the first preferred embodiment of the present invention. Fig. 1D is a schematic view of a mold provided by the first preferred napkin of the present invention. The mth figure is a schematic view of the first preferred embodiment of the present invention. Fig. 1F is a schematic view showing the hardening of the photoresist layer of the first preferred embodiment of the present invention. Fig. 1G is a schematic view showing a photoresist layer and a substrate in a preferred embodiment of the present invention. 1H @ ‘County Turning—Preferred implementation of the surface of the ore plate to form optical components 201102682 Figure ii, is a schematic diagram of the mold structure. 2A is a flow chart of a second preferred embodiment of the present invention. FIG. 2B is a schematic view showing a second preferred embodiment of the present invention. Figure 2C is a schematic view of a diffractive optical element array in accordance with a second preferred embodiment of the present invention. FIG. 3A is a flow chart of a manufacturing method of a third preferred embodiment of the present invention. Figure 3B is a schematic view of a third preferred embodiment of the present invention. Figure 3C is a schematic view of an array of diffractive optical elements in accordance with a third preferred embodiment of the present invention. [Description of main component symbols] Substrate 10, 20, 30 Step 101 '102 Photoresist layer 11, 21, 31 Mold 12, 22, male pattern 121 Leg 122 Master pattern 13 Step 201 ' 202 Mother pattern array 23, 33 Step 301 ' 302 die array 32 first height hi second height h2 first thickness D1 second thickness D2 103, 104, 105, 106, 107, 203, 204, 205, 206, 303, 304, 305, 306
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