201100678 六、發明說明： 【發明所屬之技術領域】 [0001]本發明涉及一種使多種氣體切換流通的供氣單元及供氣 裝置。 【先前技術】 [00〇2]目前，在用於半導體製造工序等的供氣單元中，為了抑 〇 ^ [0003] 制由於載氣流路的剖面積變化所引起的氣壓的急劇變化 ，使載氣流路的剖面形狀和剖面積在整個流路上基本保 持一定（例如，參照專利文獻1)。 參照第六〜八圖’對專利文獻1所記載結構的進行說明。 第六圖是供氣單元的平面圖，第七圖是第六圖的7_7線的 剖面圖，第八圖是第六圖的8_8線的剖面圖。 [0004] 在上述供氣單元311中，在載氣輸入槔321s和載氣輸出蜂 321e之間形成有一條栽氣流路321，在各閥塊 320A~320D中形成有處理氣體流路322，-處理氣體流路 322連通處理氣體輪入埠322s和載氣流路321。 €) [0005] 各閥塊320A〜於0D中，由啟閉閥35〇在塊體335内在處理 氣體流路322和載氣流路321之間進行通斷操作。塊體 335内部形成有倒V字型的塊狀流路331，與閥室324連通 的處理氣體流路322通過閥孔325與流路331連通。在基 塊340中形成有V字形的塊狀流路332並且該塊狀流路332 之間設置有間隔地，閥塊320A~320D的各塊狀流路331和 基塊340的塊狀流路332進行直列式連接而構成一條載氣 流路321。 099120792 表單編號A0101 0992036687-0 第3頁/共26頁 201100678 [0006] 因此’根據專利文獻1記載的供氣單元311，因為載氣流 路321的刟面形狀和橫剖面積基本一定，所以能夠抑制載 氣流路321中流通的載氣的壓力發生急劇變化，並能抑制 奮流的產生。 [0007] 專利文獻1 :國際公開第2004/036099號。 [0008] 但是’專利文獻1中所記載的結構為：各閥塊320A-320D 的塊狀流路331和基塊340的塊狀流路332分別形成為v字 形，且這些塊狀流路331、332相互連接，所以載氣流路 321呈在多處彎曲的複雜狀，因此，有可能會妨礙載氣 順利地流通。 [0009] 另外，處理氣體輸入埠322s設於與配置有啟閉閥35〇的側 面部335a垂直的側面部335c上，所1以需要在閥塊 320A〜320D的側面上確保設置處理氣體輸入埠322s所需 的空間。在此，可以考慮將處理氣體流路322延伸至與所 述側面部335a平行的側面部335b後使其開口，但在此種 情況下將產生載氣流路321和處理氣體流路322A (用雙點 劃線表示）之間會相互干擾的問.題6因此，很難縮小間 塊320A~320D的寬度（第八圖中左右方向上的長度）， 難以並行排列供氣單元311以進行高集成化。 【發明内容】 [0010] 本發明是鑒於上述實際情況而提出的，其主要目的在於 提供一種供氣單元’該供氣單元能夠使載氣（吹掃氣體 (purge gas))順利流通並能夠縮小設置有多個啟閉 閥的塊的寬度。 099120792 表單編號A0101 第4頁/共26頁 0 物036687-0 201100678 [0011] [0012] 為解決上述課題採用以下方法。 Ο 〇 本發明第-方面提供-種供氣單元，該供氣單元包括内 部設有流路的流路塊，所述流路包括主流路和多個分別 與所述主流路連通的副流路，每個所述副流路都包括啟 閉閥，所述啟閉閥使對應的所述副流路和所述主流路阻 斷或連通，其中，所述流路塊形成為呈長條狀延伸的長 方體狀，且包括搭載所述啟閉閥的閥搭載面以及副流路 開口面，其中，所述副流路在所述副流路開口面形成有 開口’所述閥搭載面和所述副流路開口面位於相反的兩 側’所述啟閉閥沿著所述閥搭載面的長度方向進行直列 式設置，所述跋閉閥的各閥室設於所述閥搭載面，所述 副流路與所述閥室連通，在所述流路塊内部設有連接所 述主流路和所述閥室的連接流路，所述連接流路與所述 閥室的大致中央連通且向背離所述閥搭攀面的方向延伸 ，所述主流路的孔徑比所述連接流路的孔徑粗且沿 著所述閥搭載面的長度方向呈直線狀延伸，並且，在所 述流路塊中，所述主流路設置在關於所述閥搭載面的寬 度方向從所述閥室的中央偏向一側的部分處；在所述流 路塊中，所述副流路在關於所述閥搭載面的寬度方向從 所述閥室的中央偏向與所述主流路相反的一側的部分中 通過。 [0013] 根據上述構成’因為主流路形成得比所述連接流路粗且 沿所述閥搭載面的長度方向呈直線狀延伸，所以可以減 小載氣（吹掃氣體）在主流路中流通時的阻力’並能夠 抑制載氣的紊流。因此’載氣能夠在主流路中順利流通 099120792 表單編號Α0101 第5頁/共26頁 0992036687-0 201100678 。其結果，在主流路中流通載氣的情況下，能夠快速運 輸處理氣體。另外，在主流路中流通吹掃氣體的情況下 ，能夠將處理氣體快速更換為吹掃氣體。 [0014] 在所述流路塊中，主流路設置在關於搭載啟閉閥的閥搭 載面的寬度方向從所述閥室的中央偏向一側的部分中， 所以能夠在與設置有主流路的部分相反一側的部分確保 用於設置其他流路所需的體積（空間）。在此，因為主 流路形成得比連接流路粗，所以，即使將主流路設置在 關於閥搭載面的寬度方向從所述閥室的中央偏向一側的 部分處，也易於確保主流路和連接流路之間的連接。 [0015] 而且，因為副流路的開口形成在與所述閥搭載面相反一 側的副流路開口面，所以無需在從寬度方向夾持閥搭載 面的兩侧面設置處理氣體的輸入埠。在此，因為在所述 流路塊中副流路在關於所述閥搭載面的寬度方向從所述 閥室的中央偏向與所述主流路相反的一側的部分中通過 ，即，在與設置主流路的部分相反的一側用於設置流路 的部分中通過，所以易於在流路塊中在閥搭載面的寬度 範圍内設置副流路。因此，能夠縮小流路塊的寬度，進 而能夠使包含多個供氣單元的供氣裝置高度集成化。 [0016] 為了儘量縮小供氣單元的寬度，在這樣的流路塊中將閥 搭載面和副流路開口面的寬度限制為所需最低限度的寬 度是很常見的。對此，採用以下本發明第2〜第4任一方面 的構成是很有效的。 [0017] 本發明第二方面，所述副流路中從所述主流路旁側通過 099120792 表單編號A0101 第6頁/共26頁 0992036687-0 201100678 的部分形成得比其轉分細，所q於在流路塊中設置 副流路使其不會讀域路。目此，_料流路塊的 寬度。 闺轉明第三方面，所料接祕h於所賴搭載面進 ，且能夠易於對閥 室和連接流路之間的連接部（例如毁於閥㈣閥座）進 行加工。 [_而j_，在所述流路塊中職路在關於所述載面的寬 〇 度方向從所述閥室的中央偏向與所述主流路相反的一側 的部分中通過，在這種情況下，如果副流路的開口形成 在職路__減度方向—料&置處，可能就難 以充分確保設置副流路所需的寬度。 _]對於這-點，本發明第四方面，所述簡路的開口形成 在所述副流路開口面的寬度方向的中央處，所以即使流 路塊的寬度受限制的情:況下’也能夠充.分確保設置副流 路所需的寬度。 W [0021] 本發明第五方面，在所述流路塊中在從寬度方向爽持所 述閥搭載面的兩側面設有加熱器，所以，主流路到加熱 器之間的距離變短，並且，副流路到加熱器之間的距離 也變短，其中，所述主流路設置在關於閥搭載面的寬度 方向從閥室的中央偏向一側的部分處，所述副流路在關 於閥搭載面的寬度方向從閥室的中央偏向與主流路相反 的一側的部分中通過。因此，能夠有欵地加熱在主流路 和副流路中通過的氣體。 099120792 表單編號A0101 第7頁/共26頁 0992036687-0 201100678 [0022] 如上所述’在本發明的供氣單元中’不需要在從寬度方 向夾持閥搭載面的兩側面設置處理氣體的輸入槔。因此 ’如本發明第六方面那樣，所述供氣單元並行排列使得 從寬度方向夾持所述閥搭載面的兩側面相互抵接，由此 能夠縮小各供氣單元的寬度，並能夠省略供氣單元之間 的間隙。所以能夠使供氣裝置高度集成化。 【實施方式】 [0023] 下面參照附圖對具體表現本發明的一個實施方式進行說 明。 [0024] 如第一圖所示，供氣裝置10包括多個相同結構的供氣單 元11。這些供氣單元11被相互固定，作為一個整體被一 體化。 / ,: [0025] 供氣單元11包括以長條狀延伸的長方體的流路塊20和多 個啟閉閥50 ( 50A)。在流路塊20的頂面20a (即閥搭載 面）搭載有啟閉閥50。啟閉闕50沿著頂面20a的長度方向 直列式設置。啟閉閥50大钕呈圓柱狀i流路塊20的頂面 20a的寬度與啟閉閥50呈圓形的躓面的直徑大致相等。而 且，啟閉閥50處於流路塊20的頂面20a的寬度範圍内即可 ，不限於大致圓枉狀的形狀，也可以採用四方柱狀等任 意形狀。 [0026] 在流路塊20的頂面20a的寬度方向（與長度方向正交的方 向）上，多個供氣單元11的侧面相互抵接。即，多個供 氣單元11並列排列，使得在流路塊20中從寬度方向夾持 頂面20a的兩個側面相互抵接。為此，在疊加供氣單元11 的方向上，即，在流路塊20的頂面20a的寬度方向上，在 099120792 表單編號A0101 第8頁/共26頁 〇卯5 201100678 流路塊20彼此之間沒有形成間隙。 [0027] 在流路塊20的頂面20a的長度方向的一個端部設置有載氣 (吹掃氣體）的輸出琿29。在與輸出槔29相反一侧的端 部設置的啟閉閥50A變更載氣的流通狀態，其他的啟閉閥 •‘ 50變更各處理氣體的流通狀態。 [0028] ❹ [0029] 參照第二圖、第三圖以一個供氣單元11的構成為代表對 其進行說明。另外，第二圖是第一圖的2-2線的剖面圖。 第三圖表示第一圖的3-3線的剖面圖，其中省略了啟閉閥 50。 〇 流路塊20的哼部設有沿其長度方向（頂面2〇a的長度方向 )直線狀延伸的載氣流路21 (主流路）。載氣流路21形 成為具有大致圓形的流路剖士，且其粗細（直徑）一定 。具體地，載氣流路21通過用鑽孔機等從流路塊2〇的長 度方向的端面20d進行加工來形成。此外，其加工孔通過 栓31進行關閉。載氣流路2;1的輿栓31;相反一侧的端部連 接有載氣的輸出埠29。流路塊-20的内部設有多個分別與 載氣流路21連通_處理氣矗議;‘22 (副流路）。處理氣 體流路22 ( 22A)的開口形成在流路塊20的底面20b (副 流路開口面）。處理氣體流路22的開口形成在底面20b的 寬度方向（第三圖的左右方向）的中央。即，以虛擬平 面F為中心均等地配置處理氣體流路22的開口部，該虛擬 平面F將流路塊20在寬度方向上二等分。 在流路塊20的頂面20a上，沿著流路塊20的長度方向（頂 面20a的長度方向）以預定間隔設有上述啟閉閥50的閥室 099120792 表單編號A0101 第9頁/共26頁 0992036687-0 [0030] 201100678 24。上述各處理氣體流路22與各閥室24連通。即，對每 一個處理氣體流路22設置有啟閉閥50。 [0031] [0032] [0033] [0034] 閥室24沿載氣流路21延伸的方向以預定間隔設置，且設 置在流路塊20的寬度方向（流路塊20的頂面20a的寬度方 向）的中央。閥室24形成為大致圓形的凹部。並且，為 了縮小流路塊20的寬度，沿著流路塊20的寬度方向的大 致整個長度設置閥室24。換言之，流路塊20的寬度設定 為與閥室24的直徑基本相等或比閥室24的直徑稍寬。 閥室24的中央設有閥座24a，啟閉闕5G的閥體51可與該 〇 閥座24a抵接或脫離。間座24a形成為大致圓環狀的突部 。閥室24的中央即由閥座24a-包圍的部分與連接流路26連 通。在流路塊20内’連接流路26在背離流路塊20的頂面 20a的方向上延伸並連接到上述載氣流路h。即，連接流 路26連接閥室24和載氣流路21。因此，上述處理氣體流 路22通過閥室24及連接流路26連接到載氣流路21。 為了儘量縮短在阻斷處理氣體衡形成死腔（dead space201100678 VI. Description of the Invention: [Technical Field of the Invention] [0001] The present invention relates to a gas supply unit and a gas supply device for switching a plurality of gases to be circulated. [Prior Art] At present, in the gas supply unit used in the semiconductor manufacturing process or the like, in order to suppress the sudden change in the air pressure caused by the change in the sectional area of the carrier gas flow path, The cross-sectional shape and the cross-sectional area of the air flow path are kept substantially constant throughout the flow path (for example, refer to Patent Document 1). The structure described in Patent Document 1 will be described with reference to sixth to eighth drawings. The sixth drawing is a plan view of the air supply unit, the seventh drawing is a sectional view taken on line 7-7 of the sixth drawing, and the eighth drawing is a sectional view taken along line 8-8 of the sixth drawing. [0004] In the gas supply unit 311, a plant flow path 321 is formed between the carrier gas input port 321s and the carrier gas output bee 321e, and a process gas flow path 322 is formed in each of the valve blocks 320A to 320D, - The processing gas flow path 322 communicates with the processing gas wheel enthalpy 322s and the carrier gas flow path 321 . [0005] In each of the valve blocks 320A to 0D, the opening and closing valve 35 is opened and closed between the processing gas flow path 322 and the carrier gas flow path 321 in the block 335. An inverted V-shaped block flow path 331 is formed inside the block 335, and the process gas flow path 322 communicating with the valve chamber 324 communicates with the flow path 331 through the valve hole 325. A V-shaped block flow path 332 is formed in the base block 340, and a block flow path is provided between the block flow paths 332, and the block flow paths 331 of the valve blocks 320A to 320D and the block flow path of the base block 340 are provided. The 332 is in-line connected to form a carrier gas flow path 321 . 099120792 Form No. A0101 0992036687-0 Page 3 of 26 201100678 [0006] Therefore, the air supply unit 311 according to Patent Document 1 can suppress the shape of the surface of the carrier gas flow path 321 and the cross-sectional area. The pressure of the carrier gas flowing through the carrier gas flow path 321 abruptly changes, and the occurrence of the striking flow can be suppressed. Patent Document 1: International Publication No. 2004/036099. [0008] However, in the configuration described in Patent Document 1, the block flow path 331 of each of the valve blocks 320A to 320D and the block flow path 332 of the base block 340 are formed in a v shape, and these block flow paths 331 are formed. Since the 332 and the 332 are connected to each other, the carrier gas flow path 321 has a complicated shape in which it is bent at a plurality of places, and thus the carrier gas may be prevented from flowing smoothly. Further, the processing gas input port 322s is provided on the side surface portion 335c perpendicular to the side surface portion 335a on which the opening and closing valve 35A is disposed, and it is necessary to ensure the setting of the processing gas input on the side faces of the valve blocks 320A to 320D. The space required for 322s. Here, it is conceivable to extend the process gas flow path 322 to the side surface portion 335b parallel to the side surface portion 335a, and in this case, the carrier gas flow path 321 and the process gas flow path 322A are generated (with double The dotted line indicates that there is a mutual interference between each other. Therefore, it is difficult to reduce the width of the inter-blocks 320A to 320D (the length in the left-right direction in the eighth figure), and it is difficult to arrange the air supply unit 311 in parallel for high integration. Chemical. SUMMARY OF THE INVENTION [0009] The present invention has been made in view of the above circumstances, and a main object thereof is to provide a gas supply unit that can smoothly carry a carrier gas (purge gas) and can reduce it. The width of the block with multiple on-off valves is set. 099120792 Form No. A0101 Page 4 of 26 0 Item 036687-0 201100678 [0012] In order to solve the above problems, the following method is employed. A third aspect of the present invention provides a gas supply unit including a flow path block having a flow path therein, the flow path including a main flow path and a plurality of auxiliary flow paths respectively communicating with the main flow path Each of the secondary flow paths includes an opening and closing valve that blocks or connects the corresponding secondary flow path and the main flow path, wherein the flow path block is formed in a strip shape a rectangular parallelepiped shape including a valve mounting surface and an auxiliary flow path opening surface on which the opening and closing valve is mounted, wherein the auxiliary flow path has an opening 'the valve mounting surface and the opening on the auxiliary flow path opening surface The opening and closing surfaces of the auxiliary flow path are located on opposite sides. The opening and closing valve is arranged in an in-line manner along the longitudinal direction of the valve mounting surface, and each valve chamber of the shut-off valve is provided on the valve mounting surface. The secondary flow path communicates with the valve chamber, and a connection flow path connecting the main flow path and the valve chamber is provided inside the flow path block, and the connection flow path communicates with a substantially central portion of the valve chamber Extending in a direction away from the valve landing surface, the main passage has an aperture smaller than the connecting flow path The hole diameter is thick and linearly extends along the longitudinal direction of the valve mounting surface, and in the flow path block, the main flow path is provided from the valve chamber in the width direction of the valve mounting surface. a portion of the flow path block that is biased toward the one side; and the portion of the flow path block that is biased from a center of the valve chamber toward a side opposite to the main flow path in a width direction of the valve mounting surface Passed in. [0013] According to the above configuration, since the main flow path is formed thicker than the connection flow path and linearly extends along the longitudinal direction of the valve mounting surface, it is possible to reduce the flow of the carrier gas (purge gas) in the main flow path. The resistance at the time 'can suppress the turbulence of the carrier gas. Therefore, the carrier gas can flow smoothly in the mainstream road. 099120792 Form No. Α0101 Page 5 of 26 0992036687-0 201100678 . As a result, when the carrier gas is circulated in the main flow path, the processing gas can be quickly transported. Further, when the purge gas flows through the main flow path, the process gas can be quickly replaced with the purge gas. [0014] In the flow path block, the main flow path is provided in a portion in which the width direction of the valve mounting surface on which the opening and closing valve is mounted is shifted from the center of the valve chamber to one side, so that the main flow path can be provided Part of the opposite side ensures the volume (space) required to set up other flow paths. Here, since the main flow path is formed thicker than the connection flow path, it is easy to ensure the main flow path and the connection even if the main flow path is provided at a portion deviated from the center of the valve chamber to the width direction of the valve mounting surface. The connection between the flow paths. Further, since the opening of the auxiliary flow path is formed on the side surface of the auxiliary flow path opposite to the valve mounting surface, it is not necessary to provide the input port of the processing gas on both side surfaces of the valve mounting surface sandwiched in the width direction. Here, in the flow path block, the sub-flow path passes through a portion of the valve mounting surface that is biased from the center of the valve chamber to a side opposite to the main flow path in the width direction of the valve mounting surface, that is, Since the opposite side of the portion where the main flow path is provided is used to pass through the portion where the flow path is provided, it is easy to provide the sub-flow path in the width of the valve mounting surface in the flow path block. Therefore, the width of the flow path block can be made small, and the gas supply device including the plurality of gas supply units can be highly integrated. [0016] In order to minimize the width of the air supply unit, it is common to limit the widths of the valve mounting surface and the secondary flow path opening surface to the minimum required width in such a flow path block. On the other hand, the configuration of any of the second to fourth aspects of the present invention is very effective. [0017] In the second aspect of the present invention, the portion of the secondary flow path that passes through the 099120792 form number A0101 page 6/26 pages 0992036687-0 201100678 from the main road side is formed to be smaller than the sub-flow path. The secondary flow path is set in the flow path block so that it does not read the domain path. For this purpose, the width of the _ stream block. In the third aspect, it is expected that the pick-up will be carried out on the mounting surface, and the connection between the valve chamber and the connecting flow path (for example, the valve seat of the valve (4)) can be easily processed. [_] j_, in the flow path block, the duty path passes through a portion of the valve chamber that is biased from the center of the valve chamber to a side opposite to the main flow path in the width direction of the carrier surface, In the case, if the opening of the secondary flow path is formed in the service path __decrement direction-material & setting, it may be difficult to sufficiently ensure the width required for setting the secondary flow path. _] For this point, in the fourth aspect of the invention, the opening of the simplified path is formed at the center in the width direction of the opening surface of the secondary flow path, so even if the width of the flow path block is limited: It is also possible to fill the width required to set the secondary flow path. According to a fifth aspect of the present invention, in the flow path block, a heater is provided on both side surfaces that hold the valve mounting surface from the width direction, so that the distance between the main flow path and the heater becomes short. Further, the distance between the secondary flow path and the heater is also shortened, wherein the main flow path is provided at a portion deviating from the center of the valve chamber to one side in the width direction of the valve mounting surface, the secondary flow path being The width direction of the valve mounting surface passes through a portion of the valve chamber that is biased toward the side opposite to the main flow path. Therefore, it is possible to heat the gas passing through the main flow path and the auxiliary flow path in an awkward manner. 099120792 Form No. A0101 Page 7 of 26 0992036687-0 201100678 [0022] As described above, in the air supply unit of the present invention, it is not necessary to provide the input of the processing gas on both sides of the valve mounting surface from the width direction. water pulley. Therefore, as in the sixth aspect of the present invention, the air supply units are arranged in parallel such that the side surfaces of the valve mounting surface sandwiched from each other in the width direction abut each other, whereby the width of each air supply unit can be reduced, and the supply can be omitted. The gap between the gas units. Therefore, the gas supply device can be highly integrated. [Embodiment] An embodiment in which the present invention is specifically described will be described below with reference to the drawings. [0024] As shown in the first figure, the air supply device 10 includes a plurality of air supply units 11 of the same configuration. These air supply units 11 are fixed to each other and integrated as a whole. / [0025] The air supply unit 11 includes a flow block 20 of a rectangular parallelepiped extending in a long strip shape and a plurality of opening and closing valves 50 (50A). The on-off valve 50 is mounted on the top surface 20a of the flow path block 20 (that is, the valve mounting surface). The opening and closing jaws 50 are arranged inline along the length of the top surface 20a. The top surface 20a of the opening and closing valve 50 is substantially cylindrical and the width of the top surface 20a of the flow path block 20 is substantially equal to the diameter of the circular surface of the opening and closing valve 50. Further, the on-off valve 50 may be in the width range of the top surface 20a of the flow path block 20, and is not limited to a substantially circular shape, and may have any shape such as a square column shape. In the width direction (the direction orthogonal to the longitudinal direction) of the top surface 20a of the flow path block 20, the side surfaces of the plurality of air supply units 11 abut each other. That is, the plurality of gas supply units 11 are arranged side by side such that the two side faces sandwiching the top surface 20a from the width direction in the flow path block 20 abut each other. For this reason, in the direction in which the air supply unit 11 is superimposed, that is, in the width direction of the top surface 20a of the flow path block 20, at 099120792, the form number A0101, page 8 / total 26 pages 〇卯 5 201100678, the flow path blocks 20 are mutually There is no gap formed between them. [0027] An output port 29 of a carrier gas (purge gas) is provided at one end portion of the top surface 20a of the flow path block 20 in the longitudinal direction. The on-off valve 50A provided at the end opposite to the output port 29 changes the flow state of the carrier gas, and the other on-off valves "50" change the flow state of each process gas. [0028] The configuration of one air supply unit 11 will be described with reference to the second and third figures. In addition, the second figure is a cross-sectional view taken along line 2-2 of the first figure. The third figure shows a cross-sectional view taken along line 3-3 of the first figure, in which the opening and closing valve 50 is omitted. The crotch portion of the turbulent flow path block 20 is provided with a carrier gas flow path 21 (main flow path) extending linearly in the longitudinal direction (the longitudinal direction of the top surface 2A). The carrier gas flow path 21 is formed into a channel having a substantially circular flow path, and its thickness (diameter) is constant. Specifically, the carrier gas flow path 21 is formed by processing from the end surface 20d of the flow path block 2〇 in the longitudinal direction by a drill or the like. Further, the machined hole is closed by the plug 31. The plug 31 of the carrier gas flow path 2; 1; the end of the opposite side is connected to the output port 29 of the carrier gas. A plurality of flow path blocks 20 are provided in communication with the carrier gas flow path 21, respectively, and a process gas is referred to as "22" (sub-flow path). The opening of the processing gas flow path 22 (22A) is formed in the bottom surface 20b (the auxiliary flow path opening surface) of the flow path block 20. The opening of the processing gas flow path 22 is formed at the center in the width direction (the horizontal direction of the third drawing) of the bottom surface 20b. In other words, the opening of the processing gas flow path 22 is equally disposed around the virtual plane F, and the virtual plane F bisects the flow path block 20 in the width direction. On the top surface 20a of the flow path block 20, the valve chamber 099120792 of the above-described opening and closing valve 50 is provided at a predetermined interval along the longitudinal direction of the flow path block 20 (the longitudinal direction of the top surface 20a). Form No. A0101 Page 9 / Total 26 pages 0992036687-0 [0030] 201100678 24. Each of the processing gas channels 22 communicates with each of the valve chambers 24. That is, the opening and closing valve 50 is provided for each of the processing gas channels 22. [0033] The valve chamber 24 is disposed at a predetermined interval in the direction in which the carrier gas flow path 21 extends, and is disposed in the width direction of the flow path block 20 (the width direction of the top surface 20a of the flow path block 20). Central. The valve chamber 24 is formed as a substantially circular recess. Further, in order to reduce the width of the flow path block 20, the valve chamber 24 is provided along substantially the entire length in the width direction of the flow path block 20. In other words, the width of the flow path block 20 is set to be substantially equal to the diameter of the valve chamber 24 or slightly wider than the diameter of the valve chamber 24. A valve seat 24a is provided at the center of the valve chamber 24, and the valve body 51 of the opening and closing port 5G can abut or disengage from the valve seat 24a. The spacer 24a is formed as a substantially annular projection. The center of the valve chamber 24, that is, the portion surrounded by the valve seat 24a-, communicates with the connecting flow path 26. In the flow path block 20, the connection flow path 26 extends in the direction away from the top surface 20a of the flow path block 20 and is connected to the above-described carrier gas flow path h. That is, the connection flow path 26 connects the valve chamber 24 and the carrier gas flow path 21. Therefore, the processing gas flow path 22 is connected to the carrier gas flow path 21 through the valve chamber 24 and the connection flow path 26. In order to minimize the formation of dead space in the blocking process gas balance (dead space
)的連接流路26，將載氣流路21設置在閥室24附近。連 U 接流路26從流路塊20的頂面2〇a垂直地延伸並連接到載氣 流路21。具體地，關於頂面2〇a的寬度方向，連接流路26 連接到載氣流路21的端部附近。此外，連接流路2 6配置 於流路塊20的寬度方向的中央。因此，流路塊2〇中多個 連接流路26的中心轴線位於虛擬平面F上，該虛擬平面F 將流路塊20在寬度方向上二等分。 載氣流路21被形成得比連接流路26及處理氣體流路22粗 099120792 表單編號A0101 第10頁/共26頁 0992036687-0 201100678 。因此’即使是載氣流路21在流路塊20的長度方向上呈 直線狀延伸的結構，也能較為容易地進行加工。 [0035] 啟閉閥50是電磁驅動式閥，通過對線圈52的通電控制， 對閥體51進行往復驅動。此外，通過使閥體51抵接或脫 離被設於閥室24的閥座24a，來阻斷或連通閥室24和連接 流路26。另外’啟閉閥5〇並不限於電磁驅動式閥，也可 以採用氣動式閥或壓電元件驅動式閥等任意結構的閥。The connection flow path 26 is provided in the vicinity of the valve chamber 24 with the carrier gas flow path 21. The U-connecting flow path 26 extends perpendicularly from the top surface 2A of the flow path block 20 and is connected to the carrier gas flow path 21. Specifically, regarding the width direction of the top surface 2A, the connection flow path 26 is connected to the vicinity of the end portion of the carrier gas flow path 21. Further, the connection flow path 26 is disposed at the center in the width direction of the flow path block 20. Therefore, the center axis of the plurality of connection flow paths 26 in the flow path block 2 is located on the virtual plane F, which bisects the flow path block 20 in the width direction. The carrier gas flow path 21 is formed thicker than the connection flow path 26 and the process gas flow path 22. 099120792 Form No. A0101 Page 10 of 26 Page 0992036687-0 201100678. Therefore, even if the carrier gas flow path 21 is linearly extended in the longitudinal direction of the flow path block 20, the processing can be performed relatively easily. [0035] The opening and closing valve 50 is an electromagnetically driven valve, and the valve body 51 is reciprocally driven by energization control of the coil 52. Further, the valve chamber 24 and the connecting flow path 26 are blocked or communicated by abutting or disengaging the valve body 51 from the valve seat 24a provided in the valve chamber 24. Further, the "opening and closing valve 5" is not limited to the electromagnetically driven valve, and a valve of any configuration such as a pneumatic valve or a piezoelectric element driven valve may be employed.
[0036] G 載氣流路21設置在關於流路塊2〇的寬度方向從閥室24的 中央偏向一侧的部分、即’偏離虛擬平面F的部分處。即 ’載氣流路21的中心軸線壜離虛擬平面f，載氣流路21偏 離流路塊20的寬度方向的中央。換言之，在流路塊2〇中 ，載氣流路21的配置位置靠近兩個側面2 〇 c中的一個側面 ’該兩個側面2〇c在寬度方向上夾持頂面2〇a。因此，在 流路塊20中，能夠在與設有載氣流路21的部分相反一側 的部分確保用於配置其他流路的遒積（空間）。此外， Ο 在能夠與從閥室24的中央垂直於頂面2〇a延伸的連接流路 26連接的範圍内，載氣流路21在流路塊2〇的寬度方向上 從閥室24的中央偏向一侧《此外，對载氣流路21的流路 刳面積（直徑）進行設定，使得能夠在氣體供給單元u 中使所需量的載氣流通。 [0037] 此外，通過將載氣流路21設置為偏離於虛擬平面F，能使 處理氣體流路22在相反側所確保的部分中通過。在流路 塊20中，處理氣體流路22在從虛擬平面ρ1偏向與載氣流路 21相反一側的部分中通過後連接到上述閥室24。因此， 無需在與設有啟閉閥50 (閥室24)的頂面2〇a垂直的側面 099120792 表單編號A0101 第11頁/共26頁 0992036687-0 201100678 20c設置處理氣體的輸入埠。 [0038] 處理氣體流路22包括相對於流路塊20的頂面20a垂直延伸 的垂直部分22b。並且，該垂直部分22b通超載氣流路21 的旁側。因此，流路塊20内，能夠設置垂直部分22b以使 載氣流路21和侧面20c之間的間隔保持一定。在處理氣體 流路22中，通超載氣流路21旁侧的垂直部分22b比其他部 分即傾斜部分22a細。根據這種結構，即使在流路塊2〇的 寬度受限制的情況下，也易於在流路塊2 0内設置處理氣 體流路22 (垂直部分22b)使其不干擾載氣流路21。此外 ，處理氣體流路22在流路塊20的底面2〇b的寬度方向的中 央形成開口，且彎曲以避開載氣流路21並連接到閥室24 〇 [0039] 在上述構成的供氣單元11中，在多個處理氣體流路22中 ’在流路塊20的長度方向的與載氣（吹掃氣體）的輪出 埠29相反一侧的端部設置的氣體處理流路22A被用作載氣 的流路。而且’通過與該疼理氣體流路2〇A對應的啟閉閥 50A使載氣阻斷或流通。在其他蚱氣體處理流路22中供應 各處理氣體，通過各自所對應的啟閉閥使各處理氣體阻 斷或流通。另外，由並行排列的供氣單元丨丨構成供氣裝 置10 ’作為整體對載氣和處理氣鱧的流通狀態進行控制 。另外，在載氣流路21中也可以不流通載氣，而是將載 氣流路21用作處理氣體及吹掃氣體的流路。 [0040] 以上詳細描述的本實施方式具有以下優點。 [0041] 因為載氣流路21的孔徑比連接流路26的孔徑粗（大） 099120792 表單編號A0101 第12頁/共26頁 0992036687-0 201100678 且著流路塊20的長度方向（頂面2〇a的長度方向）呈直 線狀延伸，所以可以減小載氣在載氣流路21中流通時的 阻力，並能夠抑制載氣的紊流。為此，能夠使得載氣在 載氣流路21中順利地流通◊其結果’在載氣流路21中流 通載氣的情況下，能夠快速輸送處理氣體。另外，在載 氣流路21中流通吹掃氣體的情況下，能夠將處理氣體快 速更換為吹掃氣體。 [0042] 在流路塊20中，載氣流路21設置在頂面2〇a的寬度方向上 從閥室24的中央偏向一侧的部分，即，設置在偏離虛擬 平面F的部分處’其中，在頂面2〇a上搭載有啟閉閥5〇， 虛擬平面F將流路塊20在寬度方向上二等分。因此，能夠 在與設有截氣流路21的部分相反一側的部分禮保用於配 設其他流路的體積（空間）。這裏，由於載氣流路21被 形成得比連接流路26粗’因此，即使在:偏離虛擬平面f的 部分處設置有載氣流路21，也易於確保載氣流路21和連 接流路26之間的連接' ' [0043] 而且，因為處理氣體流路22的開口形成在與頂面2〇a相反 一侧的底面20b，其中’頂面20a設有啟閉閥50的閥室24 ’所以’無需在從寬度方向夾持頂面20a的兩的側面20c 、即，垂直於頂面20a的侧面20c設置處理氣體的輸入埠 。在此，在流路塊20中，處理氣體流路22通過從虛擬平 面F偏向與載氣流路21相反一側的部分後，即，通過與配 置有載氣流路21的部分相反一側用於設置其他流路的部 分後連接到閥室24，所以，易於在流路塊2〇的寬度範圍 内設置處理氣體流路22。因此，能夠縮小流路塊20的寬 099120792 表單編號A0101 第13頁/共26頁 0992036687-0 201100678 度，進而能夠將包含多個供氣單元11的供氣裝置10高度 集成化。 [0044] 為了儘量減小供氣單元11的寬度，在流路塊20中將頂面 20a和底面20b的寬度限定為所需最低限度的寬度。對此 ，以下的構成是有效的。 [〇〇45] 在處理氣體流路中，從載氣流路21的旁侧通過的垂直部 分22b被形成得比其他部分即傾斜部分22a細，所以易於 設置處理氣體流路22使得不會在流路塊20中干擾載氣流 路21。因此，能夠縮小流路塊20的寬度。 [〇〇46] 因為連接流路26垂直於流路塊20的頂面20a延伸’因此能 夠縮小流路塊20的寬度，且易於對閥室24和連接流路26 的連接部即閥座24a進行加工。 [0047] 而且，在流路塊20中，處理氣體流路22在關於頂面20a的 寬度方向從閥室24的中央偏向與載氣流路21相反的一侧 的部分中通過，在這種情況下，如果處理氣體流路22的 開口形成在底面20¾的靠寬度方向一端的位置處，可能就 難以充分確保設置處理氣體流路22所需的寬度。 [0048] 對於這一點，由於處理氣體流路22在流路塊20的底面2〇a 的流路塊20寬度方向的中央形成開口，因此，即使在流 路塊20的寬度受限制的情況下，也能夠充分確保用於設 置處理氣體流路22所需的寬度。 [0049] 在供氣單元11中，無需在與設有啟閉閥50 (閥室24)的 頂面20a垂直的侧面20c設置處理氣體的輸入埠。並且， 供氣裝置包括多個供氣單元11，且供氣單元11並行排列 099120792 表單編號A0101 第Η頁/共26頁 0992036687-0 201100678 [0050] [0051] Ο [0052] Ο [0053] 使得從寬度方向夾持頂面2〇a的兩個侧面20c相互抵接。 為此，能夠縮小各供氣單元丨丨的寬度，並能夠省略各供 氣單元11之間的間隙。其結果，能夠將供氣裝置1〇高度 集成化。 本發明不限於所述實施方式，例如還可以如下實施。 處理氣體流路22的開口形成在流路塊2〇的底面2〇b在寬度 方向的中央處，且彎折以避開載氣流路21並連接到閥室 24。但是，如果載氣流路21和處理氣體流路22不相互干 擾’也可以設置從底面2〇b沿傾斜方向延伸到閥室24的直 線狀的處理氣體流路。並且，還可以使處理氣體流路的 粗細一定。 在第二圖中，在流路塊2〇的長度方向的端部設置有堵住 載氣流路21上游側的端部的栓31，但是也可使載氣從該 開口流入’以代替設置該栓31。在此情況下，使處理氣 體從處理氣體流路22A流入啟:閉閥5UA使處理氣體阻斷 或連通。另外，改變載氣流通狀態—的啟閉閥與供氣單元 11另行設置即可。勇外，在=載氣流.路21下游侧的端部設 置有在流路塊20的頂面20a處開口的輸出埠29，但也可以 使載氣流路21的下游側延伸至流路塊20的端部後形成開 口 〇 如第四圖所示，還可通過設置於流路塊120的侧面i2〇c的 槽122和設置於槽開口處的蓋123形成載氣流路121。根 據這樣的構成，與第三圖所示需要在流路塊20的側面20c 附近確保形成載氣流路21的内壁的厚度的情況不同，即 099120792 表單編號A0101 第15頁/共26頁 0992036687-0 201100678 使在流路塊120的寬度受限制的情況下，也易於在流路塊 120的寬度方向上確保載氣流路121的寬度（槽122的深 度）。 [0054] [0055] [0056] [0057] 099120792 如第五圖所示’也可以在與虛擬平面F相向的側面2〇c上 設置加熱器70A、70B ’該虛擬平面F將流路塊2〇在寬度 方向上二等分。在此情況下’載氣流路21到加熱器70A之 間的距離變短’並且處理氣體流路22到加熱器70B之間的 距離也變短，其中，載氣流路21設置在偏離虛擬平面F的 部分處，處理氣體流路22通過由虛擬平面f偏向與載氣流 路21相反一側的部分。因此，能夠有效地加熱載氣流路 21及處理氣體流路22中流通的氣體。而且，如第五圖所 示，通過將加熱器70A、7 0B形成為沿流路塊2〇的長度方 向延伸的薄板狀或薄膜狀，能夠抑制供氣單元11的寬度 擴大。另外’在多個供氣單元11並行排列以構成供氣裝 置10的情況下，在加熱器70A被夾於相鄰的流路塊2〇之間 的狀態下’通過採用使相鄰的流路塊2〇 —體化的構成， 能夠通過一個加熱器7GA加熱相鄰的兩個流路塊2〇0另外 ，在此情況下只設置加熱器70A或加熱器70B。 流路塊20被形成為縱長大於橫寬的長方體狀，但也可以 採用橫寬和縱長相等的方形柱狀的流路塊。 在第一圖中，也可以通過將多個供氣單元11的輸出埠29 連接來組合多個供氣單元11從而控制氣體的種類和流量 〇 【圖式簡單說明】 第一圖是本發明的供氣單元的平面圖。 表單編號A0101 第16頁/共26頁 201100678 Ο Ο [0058] [0059] [0060] [0061] [0062] [0063] [0064] [0065] [0066] [0067] [0068] [0069] [0070] [0071] [0072] 第二圖是第一圖的2-2線的剖面圖。 第二圖是第一圖的3-3線的剖面圖。 第四圖是表示載氣流路的另一實施例的剖面圖。 第五圖是表示供氣單元的又一實施例的剖面圖。 第六圖是習知供氣單元的平面圖。 第七圖是第六圖的7-7線的剖面圖。 第八圖是第六圖的8-8線的剖面圖。 【主要元件符號說明】 <習知> ; 311…供氣單元 320A~320D…閥塊 321…載氣流路 321s…載氣輸入埠 321e…載氣輪出崞 ΡΪΌ |k 322、322A…處理氣體流路 322s…處理氣體輸入埠 [0073] 3 24…閥室 [0074] 325…閥孔 [0075] 331、332…塊狀流路 [0076] 335…塊體 099120792 表單編號A0101 第Π頁/共26頁 0992036687-0 201100678 [0077] 340…基塊 [0078] 350…啟閉閥 [0079] 335a…啟閉閥的侧面部 [0080] 3 3 5 b…平行的側面部 [0081] 3 3 5 c…垂直的侧面部 [0082] <本發明> [0083] 10…供氣裝置 [0084] 11…供氣單元 [0085] 20…流路塊 [0086] 20a…閥搭載面的頂面 [0087] 2Ob…副流路開口面的底面 [0088] 2 0 c…側面 [0089] 20d…流路塊長度方向的端面 [0090] 21…主流路的載氣流路 [0091] 22 ( 22A)…處理氣體流路 [0092] 2 2a…傾斜部分 [0093] 22b…垂直部分 [0094] 2 4…閥室 [0095] 24a…閥座 099120792 表單編號A0101 第18頁/共26頁 0992036687-0 201100678 [0096] 26…連接流路 [0097] 29…輸出埠 [0098] 3卜.栓 [0099] 50 ( 50A)…啟閉閥 [0100] 51…閥體 [0101] 5 2…線圈 [0102] 120…流路塊 〇 [0103] 120c…側面 [0104] 121…載氣流路 [0105] 122…槽 [0106] 123…蓋 [0107] 70A、70B…加熱器 〇 .- 味)ΐ:ΐ" γ .. 1 1 ..- c" V 1 +¾. 3 f 1- 1, 099120792 表單編號A0101 第19頁/共26頁 0992036687-0[0036] The G carrier gas flow path 21 is provided at a portion deviated from the center of the valve chamber 24 toward the one side in the width direction of the flow path block 2, that is, a portion deviated from the virtual plane F. That is, the central axis of the carrier gas flow path 21 is separated from the virtual plane f, and the carrier gas flow path 21 is offset from the center in the width direction of the flow path block 20. In other words, in the flow path block 2, the arrangement position of the carrier gas flow path 21 is close to one of the side faces 2 〇 c 'the two side faces 2 〇 c sandwich the top surface 2 〇 a in the width direction. Therefore, in the flow path block 20, the accumulation (space) for arranging the other flow paths can be secured in the portion opposite to the portion where the carrier gas flow path 21 is provided. Further, in a range in which the connection flow path 26 extending from the center of the valve chamber 24 perpendicular to the top surface 2A is connected, the carrier gas flow path 21 is from the center of the valve chamber 24 in the width direction of the flow path block 2A. Further, the flow path area (diameter) of the carrier gas flow path 21 is set so that the required amount of carrier gas can be passed through the gas supply unit u. Further, by setting the carrier gas flow path 21 to deviate from the virtual plane F, the process gas flow path 22 can be passed through the portion secured on the opposite side. In the flow path block 20, the process gas flow path 22 passes through a portion which is deflected from the virtual plane ρ1 toward the side opposite to the carrier gas flow path 21, and is then connected to the valve chamber 24. Therefore, it is not necessary to set the input port of the process gas on the side 099120792 which is perpendicular to the top surface 2〇a of the opening and closing valve 50 (valve chamber 24), the form number A0101, the 11th page, and the 26th page, 0992036687-0 201100678 20c. The process gas flow path 22 includes a vertical portion 22b that extends perpendicularly with respect to the top surface 20a of the flow path block 20. Further, the vertical portion 22b passes to the side of the overload air flow path 21. Therefore, in the flow path block 20, the vertical portion 22b can be provided to keep the interval between the carrier gas flow path 21 and the side surface 20c constant. In the processing gas flow path 22, the vertical portion 22b on the side of the passage of the overload gas flow path 21 is thinner than the other portion, that is, the inclined portion 22a. According to this configuration, even when the width of the flow path block 2 is restricted, it is easy to provide the processing gas flow path 22 (vertical portion 22b) in the flow path block 20 so as not to interfere with the carrier gas flow path 21. Further, the processing gas flow path 22 is formed at the center in the width direction of the bottom surface 2b of the flow path block 20, and is bent to avoid the carrier gas flow path 21 and is connected to the valve chamber 24. [0039] The gas supply in the above configuration In the unit 11, the gas processing flow path 22A provided at the end of the flow path block 20 on the opposite side to the wheel 埠 29 of the carrier gas (purge gas) in the plurality of processing gas channels 22 is Used as a flow path for carrier gas. Further, the carrier gas is blocked or circulated by the opening and closing valve 50A corresponding to the painful gas flow path 2A. Each of the processing gases is supplied to the other helium gas processing flow paths 22, and the respective processing gases are blocked or circulated by the respective on-off valves. Further, the gas supply unit 10', which is arranged in parallel, constitutes the gas supply means 10' as a whole to control the flow state of the carrier gas and the process gas. Further, the carrier gas flow path 21 may not be used to flow the carrier gas, but the carrier gas flow path 21 may be used as a flow path for the processing gas and the purge gas. [0040] The present embodiment described in detail above has the following advantages. [0041] Since the aperture of the carrier gas flow path 21 is thicker than the diameter of the connection flow path 26 (large) 099120792 Form No. A0101 Page 12/26 pages 0992036687-0 201100678 and the length direction of the flow path block 20 (top surface 2〇) Since the longitudinal direction of a extends linearly, the resistance when the carrier gas flows through the carrier gas flow path 21 can be reduced, and the turbulent flow of the carrier gas can be suppressed. For this reason, the carrier gas can be smoothly flowed through the carrier gas flow path 21, and as a result, when the carrier gas flows through the carrier gas flow path 21, the processing gas can be quickly transported. Further, when the purge gas flows through the carrier gas flow path 21, the process gas can be quickly replaced with the purge gas. [0042] In the flow path block 20, the carrier gas flow path 21 is provided at a portion which is offset from the center of the valve chamber 24 to one side in the width direction of the top surface 2A, that is, at a portion deviated from the virtual plane F. The opening and closing valve 5 is mounted on the top surface 2〇a, and the virtual plane F bisects the flow path block 20 in the width direction. Therefore, the volume (space) for arranging the other flow paths can be provided in the portion opposite to the portion where the air cut passage 21 is provided. Here, since the carrier gas flow path 21 is formed thicker than the connection flow path 26, even if the carrier gas flow path 21 is provided at a portion deviated from the virtual plane f, it is easy to ensure the between the carrier gas flow path 21 and the connection flow path 26. [0043] Further, since the opening of the process gas flow path 22 is formed on the bottom surface 20b on the side opposite to the top surface 2A, wherein the 'top surface 20a is provided with the valve chamber 24' of the opening and closing valve 50' It is not necessary to provide the input enthalpy of the processing gas in the side surface 20c which sandwiches the top surface 20a from the width direction, that is, the side surface 20c which is perpendicular to the top surface 20a. Here, in the flow path block 20, the processing gas flow path 22 is biased from the virtual plane F toward the portion opposite to the carrier gas flow path 21, that is, by the side opposite to the portion where the carrier gas flow path 21 is disposed. Since the portion of the other flow path is provided and connected to the valve chamber 24, it is easy to provide the processing gas flow path 22 within the width of the flow path block 2''. Therefore, it is possible to reduce the width of the flow path block 20 by 099120792, the form number A0101, the 13th page, and the 26th page, 0992036687-0, 201100678 degrees, and it is possible to highly integrate the gas supply device 10 including the plurality of gas supply units 11. [0044] In order to minimize the width of the air supply unit 11, the widths of the top surface 20a and the bottom surface 20b are defined in the flow path block 20 to a desired minimum width. In this regard, the following constitution is effective. [〇〇45] In the process gas flow path, the vertical portion 22b passing from the side of the carrier gas flow path 21 is formed thinner than the other portion, that is, the inclined portion 22a, so that it is easy to provide the process gas flow path 22 so that it does not flow. The road block 20 interferes with the carrier air flow path 21. Therefore, the width of the flow path block 20 can be reduced. Since the connection flow path 26 extends perpendicularly to the top surface 20a of the flow path block 20', it is possible to reduce the width of the flow path block 20, and it is easy to connect the valve chamber 24 and the connection flow path 26, that is, the valve seat 24a. Processing. Further, in the flow path block 20, the process gas flow path 22 passes through a portion which is offset from the center of the valve chamber 24 toward the side opposite to the carrier gas flow path 21 in the width direction of the top surface 20a, in which case Next, if the opening of the process gas flow path 22 is formed at one end of the bottom surface 205a in the width direction, it may be difficult to sufficiently ensure the width required to set the process gas flow path 22. [0048] In this regard, since the processing gas flow path 22 forms an opening in the center in the width direction of the flow path block 20 of the bottom surface 2〇a of the flow path block 20, even if the width of the flow path block 20 is limited The width required for setting the process gas flow path 22 can also be sufficiently ensured. [0049] In the air supply unit 11, it is not necessary to provide an input port of the processing gas on the side surface 20c perpendicular to the top surface 20a of the opening and closing valve 50 (valve chamber 24). And, the air supply device includes a plurality of air supply units 11, and the air supply unit 11 is arranged in parallel. 099120792 Form No. A0101 Page 26/26 pages 0992036687-0 201100678 [0050] [0052] 005 [0053] The two side faces 20c that sandwich the top surface 2A from the width direction abut each other. For this reason, the width of each of the air supply units 丨丨 can be reduced, and the gap between the respective air supply units 11 can be omitted. As a result, the air supply device 1 can be highly integrated. The present invention is not limited to the embodiment, and may be embodied, for example, as follows. The opening of the process gas flow path 22 is formed at the center of the bottom surface 2〇b of the flow path block 2〇 in the width direction, and is bent to avoid the carrier gas flow path 21 and is connected to the valve chamber 24. However, if the carrier gas flow path 21 and the process gas flow path 22 do not interfere with each other, a linear process gas flow path extending from the bottom surface 2b in the oblique direction to the valve chamber 24 may be provided. Further, the thickness of the processing gas flow path can be made constant. In the second figure, a plug 31 that blocks an end portion on the upstream side of the carrier gas flow path 21 is provided at an end portion of the flow path block 2A in the longitudinal direction, but a carrier gas may also flow from the opening to replace the setting. Bolt 31. In this case, the processing gas is caused to flow from the processing gas flow path 22A to the opening valve 5UA to block or communicate the processing gas. Further, the on-off valve and the air supply unit 11 which change the state of the carrier gas flow are separately provided. Further, the output port 29 opened at the top surface 20a of the flow path block 20 is provided at the end portion on the downstream side of the carrier gas flow path 21. However, the downstream side of the carrier gas flow path 21 may be extended to the flow path block 20. The opening is formed after the end portion. As shown in the fourth figure, the carrier gas flow path 121 can also be formed by the groove 122 provided on the side surface i2〇c of the flow path block 120 and the cover 123 provided at the opening of the groove. According to such a configuration, it is necessary to ensure the thickness of the inner wall of the carrier gas flow path 21 in the vicinity of the side surface 20c of the flow path block 20 as shown in the third figure, that is, 099120792 Form No. A0101 Page 15 / Total 26 Page 0992036687-0 201100678 When the width of the flow path block 120 is restricted, it is also easy to ensure the width of the carrier gas flow path 121 (the depth of the groove 122) in the width direction of the flow path block 120. [0057] [0057] 099120792 As shown in FIG. 5, 'the heaters 70A, 70B' may be disposed on the side surface 2〇c facing the virtual plane F. The virtual plane F will be the flow path block 2 〇 bisect in the width direction. In this case, the 'distance between the carrier gas flow path 21 to the heater 70A becomes shorter' and the distance between the process gas flow path 22 and the heater 70B is also shortened, wherein the carrier gas flow path 21 is set at a deviation from the virtual plane F At the portion where the processing gas flow path 22 is deflected by the virtual plane f toward the side opposite to the carrier gas flow path 21. Therefore, the gas flowing through the carrier gas flow path 21 and the process gas flow path 22 can be efficiently heated. Further, as shown in Fig. 5, by forming the heaters 70A and 70B in a thin plate shape or a film shape extending in the longitudinal direction of the flow path block 2A, it is possible to suppress an increase in the width of the air supply unit 11. In addition, in the case where the plurality of air supply units 11 are arranged in parallel to constitute the air supply device 10, in the state where the heater 70A is sandwiched between the adjacent flow path blocks 2', the adjacent flow paths are adopted by adoption. The block 2 is configured to be heated, and the adjacent two flow path blocks 2 to 0 can be heated by one heater 7GA. In this case, only the heater 70A or the heater 70B is provided. The flow path block 20 is formed in a rectangular parallelepiped shape having a longitudinal length larger than the horizontal width. However, a square columnar flow path block having a horizontal width and a vertical length may be used. In the first figure, it is also possible to control the type and flow rate of the gas by combining the plurality of air supply units 11 by connecting the output ports 29 of the plurality of air supply units 11 [a brief description of the drawings] The first figure is the present invention. A plan view of the gas supply unit. Form No. A0101 Page 16 / Total 26 Page 201100678 Ο Ο [0058] [0060] [0064] [0064] [0067] [0067] [0069] [0069] [0072] The second diagram is a cross-sectional view taken along line 2-2 of the first diagram. The second figure is a cross-sectional view taken on line 3-3 of the first figure. The fourth figure is a cross-sectional view showing another embodiment of the carrier gas flow path. Fig. 5 is a cross-sectional view showing still another embodiment of the air supply unit. The sixth figure is a plan view of a conventional air supply unit. The seventh drawing is a sectional view taken on line 7-7 of the sixth drawing. The eighth figure is a cross-sectional view taken along line 8-8 of the sixth figure. [Description of main component symbols] <General knowledge>; 311... Air supply unit 320A to 320D... Valve block 321... Carrier gas flow path 321s... Carrier gas input 埠 321e... Carrier gas outlet 崞ΡΪΌ |k 322, 322A... Gas flow path 322s...Processing gas input 埠[0073] 3 24...Valve chamber [0074] 325...Valve hole [0075] 331, 332... Block flow path [0076] 335... Block 099120792 Form No. A0101 Page / A total of 26 pages 0992036687-0 201100678 [0077] 340...Base block [0078] 350...Opening and closing valve [0079] 335a... Side portion of the opening and closing valve [0080] 3 3 5 b... Parallel side portion [0081] 3 3 5 c...Vertical side portion [0082] <The present invention> [0083] 10: Air supply unit [0084] 11: Air supply unit [0085] 20... Flow path block [0086] 20a... Top of valve mounting surface Surface [0087] 2Ob... bottom surface of the opening surface of the secondary flow path [0088] 2 0 c... side surface [0089] 20d... end surface in the longitudinal direction of the flow path block [0090] 21... carrier gas flow path of the main flow path [0091] 22 (22A Processing gas flow path [0092] 2 2a... inclined portion [0093] 22b... vertical portion [0094] 2 4... valve chamber [0095] 24a... valve seat 099120792 Form No. A0101 Page 18 of 2 Page 6 0992036687-0 201100678 [0096] 26...Connecting flow path [0097] 29... Output 埠 [0098] 3 Bu. Bolt [0099] 50 ( 50A)... Opening and closing valve [0100] 51... Valve body [0101] 5 2...coil [0102] 120...flow block 〇[0103] 120c...side [0104] 121...carrier flow path [0105] 122...slot [0106] 123...cover [0107] 70A, 70B...heater 〇.-味)ΐ:ΐ" γ .. 1 1 ..- c" V 1 +3⁄4. 3 f 1- 1, 099120792 Form No. A0101 Page 19 of 26 0992036687-0