TW201035172A - Polyimide resin, method for producing the same, polyimide resin composition and cured product - Google Patents

Polyimide resin, method for producing the same, polyimide resin composition and cured product Download PDF

Info

Publication number
TW201035172A
TW201035172A TW99105399A TW99105399A TW201035172A TW 201035172 A TW201035172 A TW 201035172A TW 99105399 A TW99105399 A TW 99105399A TW 99105399 A TW99105399 A TW 99105399A TW 201035172 A TW201035172 A TW 201035172A
Authority
TW
Taiwan
Prior art keywords
resin
formula
polyimine resin
polyimine
diisocyanate
Prior art date
Application number
TW99105399A
Other languages
Chinese (zh)
Inventor
Eiju Ichinose
Original Assignee
Dainippon Ink & Chemicals
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink & Chemicals filed Critical Dainippon Ink & Chemicals
Publication of TW201035172A publication Critical patent/TW201035172A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/14Polyamide-imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30Low-molecular-weight compounds
    • C08G18/34Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/343Polycarboxylic acids having at least three carboxylic acid groups
    • C08G18/345Polycarboxylic acids having at least three carboxylic acid groups having three carboxylic acid groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30Low-molecular-weight compounds
    • C08G18/34Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/343Polycarboxylic acids having at least three carboxylic acid groups
    • C08G18/346Polycarboxylic acids having at least three carboxylic acid groups having four carboxylic acid groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/74Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/76Polyisocyanates or polyisothiocyanates cyclic aromatic
    • C08G18/7657Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
    • C08G18/7664Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/74Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/76Polyisocyanates or polyisothiocyanates cyclic aromatic
    • C08G18/7657Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
    • C08G18/7685Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing two or more non-condensed aromatic rings directly linked to each other
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

The present invention provides a heat-cured type resin composition that is excellent to heat resistance, dimension stability and mechanical physical properties upon coating a film as well as excellent to storage stability. Provided are polyimide resin, heat-cured type resin composition and cured product formed by curing the composition, the said polyimide resin is characterized by having the structures of general formula (1) (R1 is a residual group by deleting NCO group from diisocyanate), and general formula (2), preferably it has the structure obtained from using cyclohexanetricarboxylic acid and 4,4'-diisocyanate-3,3'-dimethyl-1,1-biphenyl. (in formula, X is a residual group by deleting two phenolic hydroxyl groups from phenolic-based compound having two and more of hydroxyl group s in one molecule.)

Description

201035172 六、發明說明: 【發明所屬之技術領域】 本發明是關於一種可製得具有優越的耐熱性、難燃性 、尺寸穩定性及機械物性(強韌性、柔軟性)、表面平滑 性的塗膜等之硬化物,且經長期儲存後也具有優越的對於 溶劑的溶解性爲良好等儲存穩定性,同時也具有優越的與 其他樹脂之相溶性之聚醯亞胺樹脂及其之製造方法、或聚 醯亞胺樹脂組成物及此等之硬化物。 【先前技術】 近年來,在電氣產業領域所使用之樹脂或樹脂組成物 ,例如耐熱性塗佈材料、印刷配線基板之層間絕緣材料或 半導體之絶緣材料等電絕緣材料、增層材料(build-up material )、預浸材(prepreg)用樹脂、耐熱性黏著劑等 ,被要求提高經長期儲存後也可具有優越的對於溶劑之溶 解性爲良好等儲存穩定性、及所製得硬化物之機械物性( 強韌性、柔軟性)、耐熱性、尺寸穩定性。尤其是在電腦 等電子設備產業領域方面則強烈地要求軟性薄膜基板或剛 性基板之極薄化等小型化,因此爲響應此等要求,提高基 板的保護層、黏著層、絶緣層之機械物性(強韌性、柔軟 性)、耐熱性、尺寸穩定性是不可欠缺。 可用於製得硬化物爲具有優越的耐熱性、機械物性、 尺寸穩定性之聚醯亞胺樹脂是例如已揭述一種聚酶亞胺樹 脂,其係具有藉由酣系化合物之結構殘基(structural residue )與胺基甲酸酯鍵鍵結所獲得之末端結構、及藉由 201035172 酚系羥基與異氰酸酯基之反應所形成的胺基甲酸酯鍵(參 閱例如發明專利文獻1。)。然而,揭示於發明專利文獻1 之聚醯亞胺樹脂卻與環氧樹脂等其他樹脂之相溶性不足夠 ,以致經混合成爲組成物時,則有穩定性不足而導致組成 物凝膠化之問題。 ' (發明專利文獻1 ) ' 日本發明專利特開第2007-2775 1 8號公報 【發明内容】 Ο 〔發明揭示〕 〔發明所欲解決之課題〕 本發明提供一種聚醯亞胺樹脂,其可獲得具有優越的 耐熱性、難燃性、尺寸穩定性及機械物性(強韌性、柔軟 性)、表面平滑性的塗膜等之硬化物,且經長期儲存後也 具有對於溶劑的溶解性爲良好等儲存穩定性,同時也具有 優越的與環氧樹脂等其他樹脂之相溶性;及含有該聚醯亞 胺樹脂之樹脂組成物。 〇 v 〔用以解決課題之手段〕 本發明之發明人等經專心硏討結果發現如下所述第(1 )至(7 )項之見解。 (1) 具有酚系化合物之結構殘基與胺基甲酸酯鍵鍵結所 獲得之末端結構、及環己烷環是直接鍵結於醯亞胺 環的結構之聚醯亞胺樹脂,具有與揭述於前述發明 專利文獻1之聚醯亞胺樹脂爲同等的硬化物之耐熱 性、機械物性、尺寸穩定性,而且經長期儲存後對 201035172 於溶劑之溶解性也爲良好。 (2) 如上述具有酚系化合物之結構殘基與胺基甲酸酯鍵 鍵結所獲得之末端結構、及環己烷環是直接鍵結於 醯亞胺環的結構之聚醯亞胺樹脂’在醯亞胺樹脂末 端隔著胺基甲酸酯鍵而具有嵌段型酚結構(bl〇 eked phenol structure)。藉此則可更再地提尚與環氧樹 脂等之相溶性而顯現出作爲熱硬化性樹脂組成物之 廣泛性能、特性。 (3) 末端之嵌段型酚結構是在製造塗膜時之高溫乾燥條 件下,會由樹脂之主鏈骨架解離而使得黏性降低, 因此可顯著地提高塗膜表面之表面平滑性。 (4) 如上述具有酚系化合物之結構殘基與胺基甲酸酯鍵 鍵結所獲得之末端結構、及環己烷環是直接鍵結於 醯亞胺環的結構之聚醯亞胺樹脂,在酚樹脂等之酚 化合物的存在下,藉由使用異氰酸酯法即可在不至 於導致凝膠化下穩定地進行製造。 (5) 如上述具有酚系化合物之結構殘基與胺基甲酸酯鍵 鍵結所獲得之末端結構、及環己烷環是直接鍵結於 醯亞胺環的結構之聚醯亞胺樹脂,單獨即可獲得具 有優越的耐熱性、尺寸穩定性與機械物性的塗膜, 且更再藉由使用一種含有該聚醯亞胺樹脂與環氧樹 脂的組成物之硬化物,則將可顯現優越的耐熱性、 機械物性、尺寸穩定性。並且,該聚醯亞胺樹脂並 非僅限於環氧樹脂而與各種樹脂之相溶性也良好, ,201035172 且與各種樹脂混合而加以組成物化時也具有優越的 長期儲存穩定性。 ❹ 6) 在如上述具有酚系化合物之結構殘基與胺基甲酸酯 鍵鍵結所獲得之末端結構、及環己烷環是直接鍵結 於醯亞胺環的結構之聚醯亞胺樹脂與環氧樹脂的組 成物中,該聚醯亞胺樹脂所具有的末端之嵌段型酚 結構在製造塗膜時之高溫乾燥條件下,由樹脂之主 鏈骨架解離而再產生酚性羥基與異氰酸酯基,且其 中之酚性羥基則與環氧樹脂進行反應而形成二級羥 基。該所形成的二級羥基則與解離的異氰酸酯基進 行反應而重新形成胺基甲酸酯鍵,因此可抑制通常 在進行環氧樹脂之硬化時即可觀察到的由於形成羥 基而導致介電特性惡化。再者,藉由酚性羥基與異 氰酸酯基之雙重反應來形成更強固的交聯物’則上 述組成物之硬化物將可在耐久性或機械物性等方面 顯現優越性能。 本發明是根據上述見解所達成者。 亦即,本發明提供一種聚醯亞胺樹脂,其特徵爲具有 列以通式(1 )所代表的結構及以通式(3 )所代表的結 構者201035172 VI. Description of the Invention: [Technical Field] The present invention relates to a coating which can have excellent heat resistance, flame retardancy, dimensional stability, mechanical properties (toughness, flexibility), and surface smoothness. A cured resin such as a film, which has excellent solubility in a solvent after long-term storage, and has excellent storage stability, and also has excellent compatibility with other resins, and a method for producing the same. Or a polyimide composition and a cured product thereof. [Prior Art] In recent years, electrical insulating materials such as heat-resistant coating materials, interlayer insulating materials for printed wiring boards, or insulating materials for semiconductors, and build-up materials used in the electrical industry. Up material), a prepreg resin, a heat-resistant adhesive, etc., are required to have excellent storage stability after being stored for a long period of time, and have excellent solubility in a solvent, and a cured product. Mechanical properties (toughness, flexibility), heat resistance, dimensional stability. In particular, in the field of electronic equipment such as computers, there is a strong demand for miniaturization of a flexible film substrate or a rigid substrate. Therefore, in response to these requirements, the mechanical properties of the protective layer, the adhesive layer, and the insulating layer of the substrate are improved ( Strength, flexibility, heat resistance, dimensional stability are indispensable. A polyimine resin which can be used for producing a cured product having superior heat resistance, mechanical properties, and dimensional stability is, for example, a polymerized imine resin having a structural residue by a lanthanoid compound ( Structural residue) A terminal structure obtained by bonding with a urethane bond, and a urethane bond formed by a reaction of a phenolic hydroxyl group with an isocyanate group of 201035172 (see, for example, Patent Document 1). However, the polyamidene resin disclosed in Patent Document 1 is not sufficiently compatible with other resins such as an epoxy resin, so that when it is mixed into a composition, there is a problem that the composition is gelled by insufficient stability. . (Patent Document 1) 'Japanese Patent Application Laid-Open No. 2007-2775 No. 1-8. SUMMARY OF THE INVENTION [Problem to be Solved] [The present invention provides a polyimine resin which can be used A cured product such as a coating film having excellent heat resistance, flame retardancy, dimensional stability, mechanical properties (toughness, flexibility), and surface smoothness is obtained, and the solubility in a solvent is good after long-term storage. The storage stability, and also has excellent compatibility with other resins such as epoxy resin; and a resin composition containing the polyimide resin. 〇 v [Means for Solving the Problem] The inventors of the present invention have found out the findings of the following items (1) to (7) by focusing on the results of the discussion. (1) a polyimine resin having a terminal structure obtained by bonding a structural residue of a phenolic compound to a urethane bond, and a structure in which a cyclohexane ring is directly bonded to a quinone ring; The polyimine resin disclosed in the above-mentioned Patent Document 1 is equivalent to the heat resistance, mechanical properties, and dimensional stability of the cured product, and the solubility in 201035172 in a solvent is also good after long-term storage. (2) A polyimine resin having a terminal structure obtained by bonding a structural residue of a phenolic compound to a urethane bond, and a structure in which a cyclohexane ring is directly bonded to a quinone ring 'There is a bl〇eked phenol structure at the end of the quinone imine resin via a urethane bond. By this, it is possible to further improve the compatibility with an epoxy resin or the like and to exhibit a wide range of properties and characteristics as a thermosetting resin composition. (3) The block type phenol structure at the end is dissociated from the main chain skeleton of the resin under high-temperature drying conditions at the time of producing the coating film, so that the viscosity is lowered, so that the surface smoothness of the surface of the coating film can be remarkably improved. (4) A polyimine resin having a terminal structure obtained by bonding a structural residue of a phenolic compound with a urethane bond, and a structure in which a cyclohexane ring is directly bonded to a quinone ring In the presence of a phenol compound such as a phenol resin, it can be stably produced without causing gelation by using an isocyanate method. (5) A polyimine resin having a terminal structure obtained by bonding a structural residue of a phenolic compound to a urethane bond, and a structure in which a cyclohexane ring is directly bonded to a quinone ring A coating film having superior heat resistance, dimensional stability, and mechanical properties can be obtained alone, and further cured by using a cured product containing the composition of the polyimide resin and the epoxy resin Excellent heat resistance, mechanical properties, dimensional stability. Further, the polyimine resin is not limited to an epoxy resin and has good compatibility with various resins, and has excellent long-term storage stability even when it is mixed with various resins to form a composition. ❹ 6) a terminal structure obtained by bonding a structural residue having a phenolic compound to a urethane bond as described above, and a polyfluorene which is a structure in which a cyclohexane ring is directly bonded to a quinone ring In the composition of the resin and the epoxy resin, the terminal block type phenol structure of the polyimine resin is dissociated from the main chain skeleton of the resin to produce a phenolic hydroxyl group under high-temperature drying conditions at the time of producing a coating film. And an isocyanate group, and wherein the phenolic hydroxyl group reacts with the epoxy resin to form a secondary hydroxyl group. The formed secondary hydroxyl group reacts with the dissociated isocyanate group to reform the urethane bond, thereby suppressing dielectric properties which are usually observed in the curing of the epoxy resin due to formation of a hydroxyl group. deterioration. Further, by forming a stronger crosslinked product by a double reaction of a phenolic hydroxyl group and an isocyanate group, the cured product of the above composition exhibits superior properties in terms of durability, mechanical properties, and the like. The present invention has been achieved based on the above findings. That is, the present invention provides a polyimine resin characterized by having a structure represented by the general formula (1) and a structure represented by the general formula (3).

Ri代表由二異氰酸酯脫除NCO基後之殘基); 201035172 ο 又 ΗΟ-Χ-Ο 八 Ν— Η ...........(2) (式中,χ代表由在一分子中具有兩個以上之酚性羥基之 酚系化合物脫除兩個酚性羥基後之殘基)。 此外,本發明提供一種硬化物,其特徵爲將如前述聚 醯亞胺樹脂加以硬化所獲得。 並且,本發明又提供一種熱硬化性樹脂組成物,其特 徵爲含有如前述聚醯亞胺樹脂與環氧樹脂。 並且,本發明另外也提供一種硬化物,其特徵爲將如 前述熱硬化性樹脂組成物加以硬化所獲得。 並且,本發明提供一種如前述聚醯亞胺樹脂之製造方 法,其特徵爲將具有二官能以上之酚性羥基的化合物,與 二異氰酸酯化合物及環己烷三羧酸酐加以反應。 〔發明之功效〕 本發明之聚醯亞胺樹脂具有優越的儲存穩定性,且經 長期儲存後對於泛用溶劑之溶解性也爲良好。並且’一種 含有本發明之聚醯亞胺樹脂或該聚醯亞胺樹脂與環氧樹脂 之組成物,例如將其加以塗膜化時,則該塗膜是具有優越 的尺寸穩定性及機械物性(強靭性、柔軟性)’因此可用 於塗佈劑、配線層間絕緣膜、黏著劑等方面。再者’本發 明之聚醯亞胺樹脂並不受限於環氧樹脂而與各種樹脂之相 溶性爲良好,且也具有優越的儲存穩定性。 【實施方式】 201035172 〔本發明之最佳實施方式〕 本發明之聚醯亞胺樹脂具有下列以通式(1 )所代表的 結構及以通式(3 )所代表的結構:Ri represents the residue after removal of the NCO group from the diisocyanate); 201035172 ο ΗΟ Χ-Χ-Ο Ν Ν Η ........... (2) (wherein, χ represents by A residue in which a phenolic compound having two or more phenolic hydroxyl groups in the molecule removes two phenolic hydroxyl groups). Further, the present invention provides a cured product obtained by hardening a polyimine resin as described above. Further, the present invention provides a thermosetting resin composition characterized by containing a polyimine resin as described above and an epoxy resin. Further, the present invention provides a cured product obtained by hardening the thermosetting resin composition as described above. Furthermore, the present invention provides a method for producing a polyimine resin, which comprises reacting a compound having a difunctional or higher phenolic hydroxyl group with a diisocyanate compound and cyclohexane tricarboxylic anhydride. [Effect of the Invention] The polyimine resin of the present invention has excellent storage stability and is excellent in solubility to a general-purpose solvent after long-term storage. And a composition containing the polyimine resin of the present invention or the polyimide resin and the epoxy resin, for example, when it is coated, the coating film has excellent dimensional stability and mechanical properties. (Strength and flexibility) Therefore, it can be used for a coating agent, a wiring interlayer insulating film, an adhesive, and the like. Further, the polyimine resin of the present invention is not limited to an epoxy resin and has good compatibility with various resins, and also has excellent storage stability. [Embodiment] 201035172 [Best Mode for Carrying Out the Invention] The polyimine resin of the present invention has the following structure represented by the formula (1) and a structure represented by the formula (3):

(1代表由二異氰酸酯脫除NCO基後之殘基);(1 represents a residue obtained by removing an NCO group from a diisocyanate);

0 IJ Η Ο —X— Ο Ν_ ❹ (式中, Η ...........(2) X代表由在一分子中具有兩個以上之酚性羥基之 酚系化合物脫除兩個酹性羥基後之殘基)。 經於具有通式(1)之結構,使用本發明之聚醯亞胺樹 脂所製得之硬化物具有優越的溶劑溶解性及機械物性(強 靭性、柔軟性)、耐熱性、尺寸穩定性等物性均衡之顯著 的功效。 在本發明之聚醯亞胺樹脂中(1 )與(2 )之結構比例 以重量比計,則較佳爲1:99至40:60,更佳爲2:98至30:70 ,因爲具有優越的機械物性,且形成組成物時與環氧樹脂 等其他成份之相溶性趨向於良好的緣故。 前述通式(1)中之1代表由二異氰酸酯脫除NCO基 後之殘基。更具體而言,較佳爲R!具有以如下所示通式( 3) 、(4)或(5)的結構之聚醯亞胺樹脂,因爲其可獲得 本發明之顯著的功效,亦即,具有優越的耐熱性、難燃性 、尺寸穩定性及機械物性(強靭性、柔軟性)、表面平滑 性的塗膜等之硬化物,且可製得經長期儲存後對於溶劑之 201035172 溶解性也爲良好等儲存穩定性之聚醯亞胺樹脂的緣故。 (3)0 IJ Η Ο —X— Ο Ν ❹ ❹ (wherein, Η ..... (2) X represents the removal of a phenolic compound having two or more phenolic hydroxyl groups in one molecule. Residues after two purifying hydroxyl groups). The cured product obtained by using the polyimine resin of the present invention has a superior solvent solubility and mechanical properties (toughness, flexibility), heat resistance, dimensional stability, etc., by the structure of the general formula (1). Significant effect of physical balance. In the polyimine resin of the present invention, the structural ratio of (1) to (2) is preferably from 1:99 to 40:60, more preferably from 2:98 to 30:70 by weight, since Excellent mechanical properties, and compatibility with other components such as epoxy resin tends to be good when the composition is formed. One of the above formula (1) represents a residue obtained by removing an NCO group from a diisocyanate. More specifically, R! has a polyimine resin having a structure of the following formula (3), (4) or (5) because it can attain the remarkable effects of the present invention, that is, A cured product having excellent heat resistance, flame retardancy, dimensional stability, mechanical properties (toughness, flexibility), surface smoothness, and the like, and can be obtained for solvent 201035172 solubility after long-term storage. It is also a reason for the good storage stability of the polyimide resin. (3)

(4)(4)

(式中’ 112各自獨立地代表氫原子、碳原子數爲1至9之 烴基’*代表鍵結點(binding site))。 在本發明之聚醯亞胺樹脂中,較佳爲作爲通式(1)之 Ri具有前述通式(5)的結構之聚醯亞胺樹脂,因爲其可 獲得低線性膨脹係數,亦即,具有優越的尺寸穩定性之硬 化物的緣故。通式(5)所具有之r2較佳爲碳原子數爲1 至5之烴基,更佳爲碳原子數爲1至3之烴基,再更佳爲 碳原子數爲1之烴基(甲基)。此外,r2_部份或全部的 羥基可經鹵素等加以取代。 BU述通式(5 )之具體結構是例如可例示下述通式(5 -1 )至(5-4 )所代表的結構。其中,較佳爲以通式() 所代表的結構,因爲其可獲得用於製造具有優越的尺寸穩 定性的硬化物之聚醯亞胺樹脂的緣故。(wherein '112 each independently represents a hydrogen atom, and a hydrocarbon group of from 1 to 9 '* represents a binding site). In the polyimine resin of the present invention, a polyimine resin having a structure of the above formula (5) as Ri of the formula (1) is preferred because it can obtain a low linear expansion coefficient, that is, The reason for the cured product having superior dimensional stability. R2 of the formula (5) is preferably a hydrocarbon group having 1 to 5 carbon atoms, more preferably a hydrocarbon group having 1 to 3 carbon atoms, still more preferably a hydrocarbon group having 1 carbon atom (methyl group). . Further, part or all of the hydroxyl groups of r2_ may be substituted by halogen or the like. The specific structure of the general formula (5) is, for example, a structure represented by the following general formulae (5-1) to (5-4). Among them, a structure represented by the formula () is preferred because it can obtain a polyimide resin for producing a cured product having superior dimensional stability.

ί 5-1) -ΙΟ- 201035172ί 5-1) -ΙΟ- 201035172

(5-2 )(5-2)

(5-3) (5-4)(5-3) (5-4)

〔在由上述之通式(5-1)至(5-4)中’*代表鍵結 本發明之聚醯亞胺樹脂所具有的以通式(2 )所代表的 結構較佳爲以如下所示之式(2-1 )、式(2-2)、式(2_4 )或式(2-5)之結構作爲X之結構,因爲其可獲得具有優 越的與其他樹脂之相溶性或儲存穩定性,且製成爲熱硬化 性樹脂組成物時,則可製得硬化性爲良好,且除了耐熱性 、機械物性、尺寸穩定性以外,也具有優越的適用期之聚 醯亞胺樹脂的緣故。[In the above formula (5-1) to (5-4), the structure represented by the formula (2) of the polyimine resin of the present invention is preferably as follows The structure of the formula (2-1), the formula (2-2), the formula (2_4) or the formula (2-5) is shown as the structure of X because it can be obtained to have superior compatibility with other resins or storage. When it is made into a thermosetting resin composition, it can produce a polyimine resin which is excellent in hardenability and has excellent pot life in addition to heat resistance, mechanical properties, and dimensional stability. .

-(2-1 ) 式中,R2代表單鍵或二價連結基,R3代表氫或碳原子數 爲1至5之烷基)-(2-1) wherein R2 represents a single bond or a divalent linking group, and R3 represents hydrogen or an alkyl group having 1 to 5 carbon atoms)

(2-2) -11- 201035172 、或以如下 (式中,R4代表氫或碳原子數爲1至5之烷基 所示通式(2-3 )所代表的結構)(2-2) -11- 201035172, or as follows (wherein R4 represents a structure represented by the formula (2-3) represented by hydrogen or an alkyl group having 1 to 5 carbon atoms)

〇H OH OH ό""5 ^Rs -〇"R5" R6 FV a r6 Re b Re (式中,Rs代表直接鍵結或二價連結基;R6可 同,且代表氫原子或碳原子數爲1至18之烷g 之合計爲1以上,*爲連結基)。 其中,通式(2-1)之尺2的更具體結構包 及羰基、磺醯基、亞甲基、亞異丙基、六氟亞 氧基、二甲基亞矽烷基、蕗-9-二基、三環〔5. 烷-二基等之二價連結基等,且可爲單一種或複 體。此外,R3包括:例如,氫原子、及甲基、 、丁基、戊基等之碳原子數爲1至5之烷基等 包括從經由多元酚化合物例如苯酚酚醛清漆樹 醛清漆型樹脂、及萘酚、烷基苯酚與甲醛縮合 多元酚樹脂等脫除兩個羥基後之結構殘基等。 並且,通式(2)之X的結構較佳爲通式( —(2-5) 爲相同或不 括:單鍵; 異丙基、側 2. 1 .02,8〕癸 數種之混合 乙基、丙基 。此外,也 脂或甲酚酚 物所合成的 2-2 )之 R4 -12- 201035172 是通式(2-3)的如下所示之式(2-6)之結構’因爲其可 獲得用於製造具有優越的耐熱性硬化物之聚醯亞胺樹脂的 緣故。藉由如式(2-6)之結構般使其含有具有磷原子的源 自特定的酚之結構作爲嵌段型酚結構,則可大幅度地提高 聚醯亞胺樹脂之難燃性。〇H OH OH ό""5 ^Rs -〇"R5" R6 FV a r6 Re b Re (wherein Rs represents a direct bond or a divalent linker; R6 may be the same and represents a hydrogen atom or a carbon atom The total number of alkyl groups 1 to 18 is 1 or more, and * is a linking group). Wherein, a more specific structure of the rule 2 of the general formula (2-1) and a carbonyl group, a sulfonyl group, a methylene group, an isopropylidene group, a hexafluoromethoxy group, a dimethylarylene group, and a fluorene-9- a divalent linking group such as a di- or tricyclo[5-alkyl-diyl group, etc., and may be a single compound or a complex. Further, R3 includes, for example, a hydrogen atom, an alkyl group having 1 to 5 carbon atoms such as a methyl group, a butyl group or a pentyl group, and the like, and the like, including a polyphenol compound such as a phenol novolak fum varnish type resin, and A structural residue such as a naphthol, an alkylphenol, a formaldehyde-condensed polyphenol resin, or the like after removing two hydroxyl groups. Further, the structure of X of the formula (2) is preferably a mixture of the formula (-(2-5) is the same or excludes: a single bond; an isopropyl group, a side 2.1.2, 8] Ethyl group and propyl group. Further, R4 -12-201035172 which is 2-2) synthesized from a lipid or a cresol phenol is a structure of the formula (2-6) of the following formula (2-3). This is because it can be obtained for producing a polyimide resin having a superior heat-resistant cured product. By using a structure having a phosphorus atom derived from a specific phenol as a block type phenol structure as in the structure of the formula (2-6), the flame retardancy of the polyimide resin can be greatly improved.

(2-6) (*代表鍵結點)。 本發明之聚醯亞胺樹脂較佳爲具有以式(6 )所代表的 結構之聚醯亞胺樹脂,因爲其具有優越的溶劑溶解性’且 可獲得具有優越的機械物性、尺寸穩定性之硬化物的緣故(2-6) (* stands for the key node). The polyimine resin of the present invention is preferably a polyimine resin having a structure represented by the formula (6) because it has superior solvent solubility and can be obtained with superior mechanical properties and dimensional stability. Sulphur

(1代表由二異氰酸酯脫除NCO基後之殘基)。 通式(6)中之1^較佳爲前述通式(3) 、(4)或(5 )之結構,因爲其可獲得本發明之顯著的功效,亦即,可 獲得具有優越的耐熱性、難燃性、尺寸穩定性及機械物性 (強韌性、柔軟性)、表面平滑性的塗膜等之硬化物,且 可製成經長期儲存後對於溶劑之溶解性也爲良好等儲存穩 定性之聚醯亞胺樹脂的緣故。 在本發明之聚醯亞胺樹脂中,較佳爲作爲通式(6)之 -13- 201035172(1 represents a residue obtained by removing an NCO group from a diisocyanate). The compound of the formula (6) is preferably a structure of the above formula (3), (4) or (5) because it can attain the remarkable effects of the present invention, that is, it can obtain superior heat resistance. A hardened material such as a flame retardant, dimensional stability, mechanical properties (toughness, flexibility), and a smooth surface coating film, and can be prepared for long-term storage and solubility in a solvent. The reason for the polyimide resin. In the polyimine resin of the present invention, it is preferably -13- 201035172 of the formula (6)

Ri具有前述通式(5)的結構之聚醯亞胺樹脂,因爲其可 獲得低線性膨脹係數,亦即,具有優越的尺寸穩定性之硬 化物的緣故。通式(5)所具有的R2較佳爲碳原子數爲1 至5之烴基,更佳爲碳原子數爲1至3之烴基,再更佳爲 碳原子數爲1之烴基(甲基)。此外,R2 —部份或全部的 羥基可經鹵素等加以取代。 前述通式(5)之具體結構是可例示以前述通式(5-1 )至(5-4)所代表的結構。其中,較佳爲以通式(5-1) 所代表的結構,因爲其可獲得用於製造具有優越的尺寸穩 定性的硬化物之聚醯亞胺樹脂的緣故。 若同時具有前述通式(1)與通式(6)時,則其之重 量比較佳爲5:95至90:10,更佳爲10:90至60:40,因爲其 可獲得優越的溶劑溶解性,且所製得之硬化物也具有優越 的機械物性之聚醯亞胺樹脂的緣故。 本發明之聚醯亞胺樹脂較佳爲更再具有以通式(7)所 代表的結構,因爲其可獲得用於製造機械強度爲良好的硬 化物之聚醯亞胺樹脂的緣故。Ri polyimine resin having the structure of the above formula (5) because it can attain a low coefficient of linear expansion, i.e., a carbide having superior dimensional stability. R2 of the formula (5) is preferably a hydrocarbon group having 1 to 5 carbon atoms, more preferably a hydrocarbon group having 1 to 3 carbon atoms, still more preferably a hydrocarbon group having 1 carbon atom (methyl group). . Further, R2 - part or all of the hydroxyl group may be substituted by halogen or the like. The specific structure of the above formula (5) is exemplified by the structures represented by the above formulas (5-1) to (5-4). Among them, a structure represented by the formula (5-1) is preferable because it can obtain a polyimide resin for producing a cured product having excellent dimensional stability. If it has the above formula (1) and formula (6), the weight thereof is preferably from 5:95 to 90:10, more preferably from 10:90 to 60:40, because it can obtain a superior solvent. Solubility, and the resulting cured product also has a superior mechanical properties of the polyimide resin. The polyimine resin of the present invention preferably further has a structure represented by the formula (7) because it can be obtained for producing a polyimide resin having a good mechanical strength.

若本發明之聚醯亞胺樹脂具有前述通式(7)之結構時 ,則在本發明之聚醯亞胺樹脂中之通式(7)的含率較佳爲 1至30重量%,更佳爲2至20%,因爲其可獲得優越的溶 劑溶解性,且所製得之硬化物具有優越的機械物性之聚醯 亞胺樹脂的緣故。 -14- 201035172 更具體而言,本發明之聚醯亞胺樹脂更佳爲具有以通 式(8-1 )所代表的結構及以通式(8-2 )所代表的結構之 聚醯亞胺樹脂,因爲其可獲得優越的溶劑溶解性,且所製 得之硬化物的尺寸穩定性也會趨於良好的緣故。When the polyimine resin of the present invention has the structure of the above formula (7), the content of the formula (7) in the polyimine resin of the present invention is preferably from 1 to 30% by weight, more preferably It is preferably 2 to 20% because it can obtain superior solvent solubility, and the obtained cured product has a superior mechanical properties of a polyimide resin. More specifically, the polyimine resin of the present invention is more preferably a polyphenylene having a structure represented by the formula (8-1) and a structure represented by the formula (8-2). An amine resin because it can obtain superior solvent solubility, and the dimensional stability of the resulting cured product tends to be good.

〇 (式中,m、η各自爲1至100)。 其中,以(8-1) 、 (8-2)所代表的結構單元在一分 子中可爲無規、嵌段、交替等之聚合物。 若本發明之聚醯亞胺樹脂爲具有以前述通式(8-1)所 Ο 代表的結構及以通式(8-2 )所代表的結構之聚醯亞胺樹脂 時,則其之含量各自較佳爲在10至90重量%之範圍,更 佳爲20至80重量%,因爲其可獲得用於製造具有優越的 尺寸穩定性的硬化物之聚醯亞胺樹脂的緣故。前述通式( 8-1)與通式(8-2)之重量比較佳爲5:95至95:5,更佳爲 10:90至60:40,因爲其可製成具有優越的溶劑溶解性與經 時溶液穩定性之聚醯亞胺樹脂的緣故。 本發明之聚醯亞胺樹脂之具體的例示如下所述。本發 -15- 201035172 明之聚醯亞胺樹脂較佳爲具有以如下所示通式(9-1)至( 9-4)所代表的結構,因爲其可獲得用於製造具有優越的耐 熱性、尺寸穩定性的硬化物之聚醯亞胺樹脂的緣故。〇 (where m and η are each 1 to 100). Among them, the structural unit represented by (8-1) and (8-2) may be a polymer of random, block, alternating or the like in one molecule. When the polyimine resin of the present invention is a polyimine resin having a structure represented by the above formula (8-1) and a structure represented by the formula (8-2), the content thereof is Each is preferably in the range of 10 to 90% by weight, more preferably 20 to 80% by weight, because it can obtain a polyimide resin for producing a cured product having superior dimensional stability. The weight of the above formula (8-1) and formula (8-2) is preferably from 5:95 to 95:5, more preferably from 10:90 to 60:40, since it can be prepared to have a superior solvent dissolution. The reason for the stability of the polyimine resin with stability over time. Specific examples of the polyimine resin of the present invention are as follows. The polyimine resin of the present invention preferably has a structure represented by the following general formulae (9-1) to (9-4) because it can be obtained for the manufacture of superior heat resistance. The reason for the dimensional stability of the cured polyimine resin.

〇 II C-N--* Η〇 II C-N--* Η

(9-1 ) (9-2) *__γ.(9-1) (9-2) *__γ.

(9-3 )(9-3)

〔式中,m、n、p、q各自爲1至100,Υ代表以如下所示 通式(3)或(4)所代表的結構〕。 上述之式(9-1)至(9-4)之結構單元在一分子中可 爲無規、嵌段、交替等之聚合物。在此情況下,上述之式 (9-1)至(9-4)之結構較佳爲各含有5至70重量%之範 _,更佳爲10至50重量%之範圍’因爲其可獲得具有優 越的溶劑溶解性,且可製得具有優越的尺寸穩定性、機械 物性的硬化物之聚醯亞胺樹脂的緣故。 具有以前述通式(9-1 )至(9-4 )所代表的結構之聚 -16 - 201035172 醯亞胺樹脂之具體實例是包括:例如具有以如下所示通式 (9)所代表的結構之聚醯亞胺樹脂等。Wherein m, n, p and q are each 1 to 100, and Υ represents a structure represented by the following formula (3) or (4). The structural units of the above formulas (9-1) to (9-4) may be random, block, alternating, etc. polymers in one molecule. In this case, the structures of the above formulas (9-1) to (9-4) preferably each have a range of 5 to 70% by weight, more preferably 10 to 50% by weight 'because it is available It has excellent solvent solubility and can produce a polyimide resin having a cured product having excellent dimensional stability and mechanical properties. Specific examples of the poly-16 - 201035172 quinone imine resin having a structure represented by the above general formulae (9-1) to (9-4) include, for example, having the formula represented by the following formula (9) Structure of polyimine resin and the like.

在上述通式(9)中’ m、n、p、q之括弧內的結構單 元是在一分子中可爲無規、嵌段、交替等之聚合物。 此外’本發明之聚醯亞胺樹脂較佳爲具有以如下所示 通式(丨0·1)至(1〇-6)所代表的結構、且重量平均分子 Ο 量爲1000至100000之聚醯亞胺樹脂,因爲其可獲得具有 優越的溶劑溶解性,且可製得具有優越的耐熱性、機械物 性、尺寸穩定性的硬化物之聚醯亞胺樹脂的緣故。在如通 式(10-1)之結構般環己烷環是直接鍵結於醯亞胺環之結 構上再再具有聯苯基骨架之聚醯亞胺樹脂,其爲具有優越 的儲存穩定性,經長期儲存後對於溶劑之溶解性良好,而 且其硬化物顯現具有優越的機械物性、耐熱性及尺寸穩定 Q 性之特性。 -17· 201035172The structural unit in the parentheses of 'm, n, p, q in the above formula (9) is a polymer which may be random, block, alternating or the like in one molecule. Further, the polyimine resin of the present invention preferably has a structure represented by the following formulas (丨0·1) to (1〇-6), and a weight average molecular weight of from 1,000 to 100,000. The quinone imine resin is obtained because it can obtain a polyimine resin having superior solvent solubility and a cured product having excellent heat resistance, mechanical properties, and dimensional stability. In the structure of the general formula (10-1), the cyclohexane ring is a polyimine resin which is directly bonded to the structure of the quinone ring and further has a biphenyl skeleton, which has excellent storage stability. After long-term storage, the solubility in a solvent is good, and the cured product exhibits characteristics of superior mechanical properties, heat resistance, and dimensional stability Q. -17· 201035172

(10-1 ) (10-2 ) (10-3)(10-1) (10-2) (10-3)

在前述通式(10-1)至通式(10-2)中之各al至a6 各自爲1至10000。此外,,*代表鍵結點。在通式(10-4 )至通式(1〇-6)中之γ代表以上述之式(3)或式(4) 所代表的結構。 但是,通式(12-1)至(12-6)之括弧內的結構單元 -18- 〇 201035172 在一分子中可爲無規、嵌段、交替等之聚合物。在此 下’以al至a6之用括弧所包括的結構較佳爲各含有 9〇重量%之範圍,更佳爲各含有5至70重量%之範 因爲其可獲得具有優越的溶劑溶解性,且可製得具有 的尺寸穩定性、機械物性的硬化物之聚醯亞胺樹脂的 在具有以前述通式(10-1)至(10-6)所代表的 、且重量平均分子量爲1000至100000之聚醯亞胺樹 ’ al至a6是代表結構單元之重複且爲1至10000。具 通式(10-1)至(1〇_6)所代表的結構單元之聚醯亞 脂是適用於解決本發明課題的具體結構例,且此等結 元可在一分子中含有複數個,或也可含有其他的結構 。具有以前述通式(10-1)至(10-6)所代表的結構 重量平均分子量爲1 000至1 00000之聚醯亞胺樹脂之 實例如下所示。 情況 2至 圍, 優越 緣故 結構 脂中 有以 胺樹 構單 單元 、且 具體 Η0-Χ-0 又 -Af a1 -a2- a2 -A4- a3 'A5~ a4Each of a1 to a6 in the above formula (10-1) to formula (10-2) is from 1 to 10,000. In addition, * represents a key node. γ in the general formula (10-4) to the general formula (1〇-6) represents a structure represented by the above formula (3) or formula (4). However, the structural unit -18- 〇 201035172 in the parentheses of the general formulae (12-1) to (12-6) may be a random, block, alternating or the like polymer in one molecule. Here, the structure included in the parentheses of a1 to a6 is preferably in the range of 9% by weight each, more preferably in the range of 5 to 70% by weight, since it is excellent in solvent solubility. And a polyimine resin which can obtain a cured product having dimensional stability and mechanical properties, having a weight average molecular weight of 1,000 as represented by the above formulas (10-1) to (10-6) The 100000 polyimine tree 'al to a6 is a repeat representing a structural unit and is from 1 to 10,000. The polyarylene resin having the structural unit represented by the general formulae (10-1) to (1〇_6) is a specific structural example suitable for solving the problem of the present invention, and such a binding element may contain a plurality of molecules in one molecule. Or may also contain other structures. Examples of the polyimine resin having a structure represented by the above formulas (10-1) to (10-6) and having a weight average molecular weight of 1,000 to 1,000 Å are shown below. Case 2 to the periphery, superior structure, the structure of the grease has an amine tree unit, and specifically Η0-Χ-0 and -Af a1 -a2- a2 -A4- a3 'A5~ a4

Nr a5 a6Nr a5 a6

o U -Ri——N^O-X-OH a7 在通式(10-7 )中,Ri由二異氰酸酯化合物脫除 異氰酸酯基後之殘基結構。1^較佳爲前述通式(3)、 )或(5 )之結構,因爲其可獲得具有優越的機械物性 寸穩定性之聚醯亞胺樹脂的緣故。a7代表重複數且爲 至10000之範圍,同時不受限在括弧內之31至a6的 弧所包括的結構單元之順序、出現次數。在通式(1C 中’ Ai代表以上述(10-1 )所代表的結構、a2代表以 -(10-7) 兩個 (4 及尺 在1 用括 丨-7 ) 上述 -19- 201035172 (10-2)所代表的結構、a3代表以上述(ι〇_3) 結構、A*代表以上述(1〇_4)所代表的結構、A5 述(10-5)所代表的結構、a6代表(1〇_6)所 此外’更再上述通式(1〇_7)之末端的酚 異氰酸酯基反應而鏈段增長所獲得之聚醯亞胺 示具有下列結構之聚醯亞胺樹脂。 所代表的 代表以上 表的結構 羥基經與 脂是可例 〇 HO -X-0人 N- -A7- ΟX -Ri—N^O-X-H a7 〇 人 -a7- oX —Ri——N^o—X—OH H a7 .. a8 在具有以上述之式(10-8 )所代表的結構 樹脂中’ A7以如下所示之式所代表的結構:o U -Ri - N^O-X-OH a7 In the formula (10-7), the residue structure of Ri after the isocyanate group is removed by the diisocyanate compound. The structure of the above formula (3), () or (5) is preferred because it can obtain a polyimide resin having excellent mechanical properties. A7 represents the number of repetitions and is in the range of 10,000, and is not limited to the order and number of occurrences of structural units included in the arc of 31 to a6 in parentheses. In the general formula (1C, 'Ai represents the structure represented by the above (10-1), a2 represents -(10-7) two (4 and the ruler is 1 in 用-7) -19- 201035172 ( 10-2) The structure represented by a3 represents the above (ι〇_3) structure, A* represents the structure represented by the above (1〇_4), the structure represented by A5 (10-5), a6 Further, the polyimine obtained by the reaction of the phenol isocyanate group at the end of the above formula (1〇_7) and the chain segment growth is represented by (1〇_6), and the polyimine resin having the following structure is shown. The representative hydroxy group represented by the above table is exemplified by HO-X-0 human N--A7-ΟX-Ri-N^OXH a7 〇人-a7- oX-Ri-N^o-X —OH H a7 .. a8 In the structural resin represented by the above formula (10-8), the structure represented by the formula "A7" is as follows:

Ai-j a2 a3 -a4 a5 一 A6 a1 a2 a3 a< l· a5 在式(10-9)中,Αι至A6與式(10-7)之t 同。此外,al至a6代表結構單元之重複且爲1 al至a6的結構單元是不受限於在a7括弧內之丨丨1| 次數。a7代表結構單元之重複且爲1至100。此 代表結構單元之重複且爲1至100。 在具有上述通式(1〇-7)與通式(10-8)等 W-l)至通式(10-6)之聚醯亞胺樹脂的通式(1 1〇-6)之結構單元的含量各自較佳爲在5至70j 佳爲在10至50重量%之範圍,因爲其可獲得姜 溶劑溶解性,且所製得之硬化物具有優越的尺1 —(10-8) 〇 .聚醯亞胺 --…(10-9 )。 、ι至A6相 至 10000° i序、出現 外,a8也 〖之通式( 10-1 )至( 童量% ’更 I有優越的 卜穩定性、 -20- 201035172 機械物性之聚醯亞胺樹脂的緣故。 在具有以通式(10-1)至通式(10-6)所代表的結構 之聚醯亞胺樹脂中,較佳爲含有10至40重量%之以通式 (10-1 )及(10-4 )所代表的結構單元作爲結構單元之聚 醯亞胺樹脂,因爲其具有優越的溶劑溶解性,且可製得具 有優越的與其他樹脂之相溶性之聚醯亞胺樹脂的緣故。在 具有以通式(10-1)至通式(10-6)之聚醯亞胺樹脂中, 較佳爲含有10至60重量%之通式(10-1)至(10-3)之結 〇 構單元之聚醯亞胺樹脂,因爲其可獲得用於製造得具有優 越的耐熱性或尺寸穩定性的硬化物之聚醯亞胺樹脂的緣故 在以前述通式(10-7 )所代表之聚醯亞胺樹脂中,具 有X之結構式爲(2-1)的結構之聚醯亞胺樹脂的實例如下 所示:Ai-j a2 a3 - a4 a5 - A6 a1 a2 a3 a < l· a5 In the formula (10-9), Αι to A6 are the same as the formula (10-7). Further, a to a6 represents a repeat of the structural unit and the structural unit of 1 al to a6 is not limited to the number of 丨丨 1| times in the a7 bracket. A7 represents a repeat of the structural unit and is from 1 to 100. This represents a repetition of the structural unit and is from 1 to 100. a structural unit of the formula (1 1〇-6) having a polyimine resin of the above formula (1〇-7) and the formula (10-8) and the like (10) to the formula (10-6) The content is preferably in the range of 5 to 70j, preferably in the range of 10 to 50% by weight, because it can obtain the solubility of ginger solvent, and the cured product obtained has a superior ruler of 1 - (10-8) 〇.醯imine--...(10-9). , ι to A6 phase to 10000 ° i sequence, appearance, a8 also 〖formula (10-1) to (children% 'more I have superior stability, -20- 201035172 mechanical properties of the Juyi In the polyimine resin having a structure represented by the general formula (10-1) to the general formula (10-6), it is preferred to contain 10 to 40% by weight of the general formula (10). The structural unit represented by -1) and (10-4) is a polyimine resin as a structural unit because it has superior solvent solubility and can be obtained by having a superior compatibility with other resins. In the polyimine resin having the formula (10-1) to the formula (10-6), it is preferred to contain 10 to 60% by weight of the formula (10-1) to (in the case of the amine resin). 10-3) The polyimine resin of the knot structure unit, because it can obtain a polyimide resin for producing a cured product having superior heat resistance or dimensional stability, in the above formula ( 10-7) The polyimine resin represented by the structure of the polyimine resin having the structure of (2-1) of X is as follows:

hAi^4_A2~H"A34fA44fA5-]4A6H—R,_i a1 a2 a3 a4 a5 站』yhAi^4_A2~H"A34fA44fA5-]4A6H-R,_i a1 a2 a3 a4 a5 station』y

(10-10) O 在以前述通式(10-8)所代表之聚醯亞胺樹脂中,具 有X之結構式爲(2 -1 )的結構之聚醯亞胺樹脂的實例如下 所示:(10-10) O In the polyimine resin represented by the above formula (10-8), an example of a polyimine resin having a structure of a structural formula of (2 -1 ) of X is as follows :

在以前述通式(10·7)所代表之聚醯亞胺樹脂中’具 有X之結構式爲(2-2 )的結構之聚醯亞胺樹脂的實例如下 所示: -21- 201035172An example of a polyimine resin having a structure of the formula (2-2) having X in the polyimine resin represented by the above formula (10·7) is as follows: -21- 201035172

HOHO

Αι -a3—— 33Αι -a3 - 33

(10-12) 〇(10-12) 〇

在以前述通式(10-8)所代表之聚醯亞胺樹脂中’具 有X之結構式爲(2-2 )的結構之聚醯亞胺樹脂的實例如T 所示:An example of the polyimine resin having a structure of the formula (2-2) having X in the polyimine resin represented by the above formula (10-8) is shown by T:

(10-13) 在以前述通式(1〇-7 )所代表之聚醯亞胺樹脂中’具 有X之結構式爲(2_6 )的結構之聚醯亞胺樹脂的實例如下 所示:(10-13) An example of a polyimine resin having a structure in which the structural formula of X is (2_6) in the polyimine resin represented by the above formula (1〇-7) is as follows:

在以前述通式(10-8)所代表之聚醯亞胺樹脂中’具 有X之結構式爲(2-6 )的結構之聚醯亞胺樹脂的實例如下 所示:An example of the polyimine resin having a structure of the formula (2-6) wherein X is represented by the above-mentioned polyimine resin represented by the above formula (10-8) is as follows:

本發明之聚醯亞胺樹脂是除了通式(2)之結構以外, 也可在不至於損及本發明之功效範圍內具有末端結構爲源 於原料的酸酐化合物之殘留羧酸或羧酸之酐的結構。除此 -22- 201035172 之外,關於酸酐方面,則在下文中加以敘述。 本發明之聚醯亞胺樹脂具有優越的儲存穩定性之樹脂 ,同時具有易溶於有機溶劑之特性。本發明之聚醯亞胺樹 脂也可溶解於傳統慣用的N-甲基吡咯啶酮或二甲基甲醯胺 等之溶解力大的極性溶劑有機溶劑,但也可溶解於先前無 法使用的伽瑪-丁內酯(γ-butyrolactone)等之溶解力較弱 的有機溶劑。 在本發明中,在本發明所使用之聚醯亞胺樹脂是否可 〇 溶解於有機溶劑之判斷,則以在有機溶劑將本發明之聚醯 亞胺樹脂加入成1 〇重量%之濃度,並在2 5 °c下靜置7天後 ,以目視觀察外觀之方法來實施。 在本發明所使用之聚醯亞胺樹脂較佳爲可溶解於伽瑪 -丁內酯之聚醯亞胺樹脂,更佳爲在25 °C下可溶解於伽瑪-丁內酯中成爲10重量%之聚醯亞胺樹脂,因爲其可獲得具 有優越的儲存穩定性之聚醯亞胺樹脂的緣故。若欲獲得可 溶解於伽瑪-丁內酯之聚醯亞胺樹脂時,則例如根據在如後 〇 所述之聚醯亞胺樹脂之製造方法即可獲得。 在本發明所使用之聚醯亞胺樹脂可爲具有線狀結構之 聚醯亞胺樹脂、或具有分枝狀結構之聚醯亞胺樹脂。此外 ’也可具有經聚酯改質之聚酯醯亞胺、或經胺基甲酸酯改 質之聚胺基甲酸酯醯亞胺之結構作爲共聚合成份。 本發明之聚醯亞胺樹脂之重量平均分子量較佳爲1000 至200000,更佳爲2000至1 00000,因爲其可製成經乾燥 溶劑後或形成硬化物時爲強靭、且形成溶液時則爲易於使 -23- 201035172 用,且可獲得具有優越的機械強度與尺寸穩定性之薄膜或 成型品之聚醯亞胺樹脂的緣故。分子量是可藉由凝膠透層 析法(GPC )或末端官能基量之定量分析加以測定。 在本發明中之重量平均分子量之測定是使用凝膠透層 析法(GPC ),且以如下所述之條件測定。 測定裝置: 東曹達股份有限公司(Tosoh Corporation) 製造之 HLC-8320GPC、 UV8320。The polyimine resin of the present invention is a residual carboxylic acid or a carboxylic acid having an acid anhydride compound whose terminal structure is derived from a raw material, in addition to the structure of the general formula (2), which does not impair the efficacy of the present invention. The structure of the anhydride. In addition to this -22-201035172, regarding the acid anhydride, it is described below. The polyimine resin of the present invention has a resin excellent in storage stability and has a property of being easily soluble in an organic solvent. The polyimine resin of the present invention can also be dissolved in a conventionally used polar solvent organic solvent such as N-methylpyrrolidone or dimethylformamide, but can also be dissolved in previously unusable gamma. An organic solvent having a weak solubility such as γ-butyrolactone. In the present invention, in the judgment of whether or not the polyimine resin used in the present invention is soluble in an organic solvent, the polyimine resin of the present invention is added to a concentration of 1% by weight in an organic solvent, and After standing at 25 ° C for 7 days, it was carried out by visual observation of the appearance. The polyimine resin used in the present invention is preferably a polyimine resin which is soluble in gamma-butyrolactone, and more preferably is soluble in gamma-butyrolactone at 25 ° C to become 10 The weight percent of the polyimide resin because it can obtain a polyimide resin having superior storage stability. If a polyimine resin which is soluble in gamma-butyrolactone is to be obtained, it can be obtained, for example, according to a method for producing a polyimide resin as described in the following. The polyimine resin used in the present invention may be a polyimine resin having a linear structure or a polyimide resin having a branched structure. Further, a polyester-modified polyester quinone imine or a urethane-modified urethane ruthenium may have a structure as a copolymerization component. The polyiminoimine resin of the present invention preferably has a weight average molecular weight of from 1,000 to 200,000, more preferably from 2,000 to 1,000,000, since it can be made tough after being dried or formed into a cured product, and is formed into a solution. It is easy to use -23-201035172, and it is possible to obtain a polyimine resin having a film or a molded article having excellent mechanical strength and dimensional stability. The molecular weight can be determined by gel permeation chromatography (GPC) or quantitative analysis of the amount of terminal functional groups. The measurement of the weight average molecular weight in the present invention is carried out by gel permeation chromatography (GPC) and measured under the conditions described below. Measuring device: HLC-8320GPC and UV8320 manufactured by Tosoh Corporation.

管 柱: 東曹達股份有限公司製造之SuperAWM-H X 兩支。 偵測器: RI (差示折射計)及UV(254nm)。 數據處理: 東曹達股份有限公司製造之 EcoSEC-WorkStation 〇 測定條件: 管柱溫度4 0 °C 溶劑 D M F 流速 0.35毫升/分鐘 標 準: 以聚苯乙烯標準試料製作標準曲線。Pipe column: Two SuperAWM-H X manufactured by Dong Caoda Co., Ltd. Detector: RI (differential refractometer) and UV (254 nm). Data Processing: EcoSEC-WorkStation manufactured by East Soda Co., Ltd. 〇 Measurement conditions: Column temperature 40 °C Solvent D M F Flow rate 0.35 ml/min Standard: Standard curve was prepared from polystyrene standard samples.

試 料: 將經換算樹脂固體成份爲0.2重量%之DMF 溶液以微過濾器加以過濾者(注入量:1 0 μΐ )° 從與其他樹脂之相溶性、溶液穩定性或與環氧樹脂之 硬化性的觀點來考慮’則本發明之聚醯亞胺樹脂之酸價較 佳爲在1至50K〇Hrng/g之範圍,更佳爲1至30KOHmg/g 〇 在本發明所使用之聚醯亞胺樹脂是例如可以如下所述 -24- 201035172 之方法來製造。 製法1:使用在一分子中具有兩個以上之酚性羥基之 多元酚化合物(A)、含有二異氰酸酯化合物之聚異氰酸酯 化合物(B)、及含有環己烷三羧酸酐之酸酐化合物(C) 而直接加以亞胺化之方法。 製法2:使用含有二異氰酸酯化合物之聚異氰酸酯化 合物(B)、及含有環己烷三羧酸酐之酸酐化合物(C)並 直接加以亞胺化後,使存在於末端之異氰酸酯基與在一分 Ο 子中具有兩個以上之酚性羥基之多元酚化合物(A)進行反 應之方法。 製法3:使用二胺化合物(D)與含有環己烷三羧酸酐 之酸酐化合物(C )並直接加以亞胺化後,添加二異氰酸酯 化合物作成爲末端異氰酸酯後,與在一分子中具有兩個以 上之酚性羥基之多元酚化合物(A)進行反應之方法。 前述製法1至製法3之製法是被稱爲「異氰酸酯法」 ,藉由在多元酚化合物(A)的存在下使用異氰酸酯法來合 〇 ^ 成醯亞胺樹脂時,則可提供不至於凝膠化之穩定的樹脂。 其可推斷爲多元酚化合物(A)將選擇性地與異氰酸酯基進 行反應而形成嵌段型酚結構來抑制異氰酸酯基之副反應, 在高溫下則進行部份解離,使其有效地與酸酐或羧基進行 反應,以形成醯亞胺鍵或醯胺鍵的緣故。特別是在反應性 遲鈍的氫化偏苯三酸等之脂肪族、脂環族系酸酐方面則爲 有效。 製造本發明之聚醯亞胺樹脂時,基於可減少殘留水份 -25- 201035172 量以將物性保持爲良好狀態、容易控制反應、容易製造各 種經加以改質之聚醯亞胺樹脂等之理由,較佳爲採取上述 之製法1。在下文中,詳細地說明製法 可在前述製法1使用之多元酚化合物(A)包括:例如 ,氫醌、聯苯酚、四甲基聯苯酚、亞乙基雙酚、雙酚A、 雙酚F、雙酚S、環亞己基雙酚(雙酧Z)、二甲基亞丁基 雙酚、4,4’-( 1-甲基亞乙基)雙〔2,6-二甲基苯酚〕、4,4’-(1-苯基亞乙基)雙酚、5,5’-(1-甲基亞乙基)雙〔1,1’-聯苯基-2-醇〕、萘二醇、二環戊二烯改質雙酚、9, 10•二氫 -9-氧雜-10-磷菲-10-氧化物(9,l〇-dihydro-9-oxa-10-phosphorphenanthrene-10-oxide )與氫醌之反應產 物等。 並且,多元酚化合物(A)也可使用苯酚酚醛清漆樹脂 、甲酚酚醛清漆型樹脂、壬基苯酚酚醛清漆樹脂等之三官 能以上之酚化合物。此外,在本發明之聚醯亞胺樹脂之製 造方法中,在合成上由於使用三官能以上之多元酚化合物 作爲多元酚化合物(A),有可能導致樹脂之高黏度化或發 生凝膠化等,因此較佳爲使用含有兩個酚性羥基之多元酚 化合物(二官能之多元酚化合物)。其中,較佳爲雙酚A 、雙酚F、雙酚S等之雙酚系化合物或9,10-二氫-9-氧雜-10-磷菲-10-氧化物與氫醌之反應產物等。此外,在不至於損 及本發明之功效範圍內一部份可倂用苯酚或甲酚等之一官 能性酚化合物。 前述9,10-二氫-9-氧雜-10-磷菲-10-氧化物與氫醌之反 -26- 201035172 應產物是不易溶解於一般溶劑》9,10 -二氫-9-氧雜-10 -磷菲 -10-氧化物與氫醌之反應產物雖然被用作爲難燃性添加劑 ,但是一般對於溶劑之溶解性爲不佳,以致在使用上受到 限制。在本發明之聚醯亞胺樹脂之製造方法中,由於作爲 多元酚化合物(A)來使用,因此,該反應產物之骨架將被 導入於聚醯亞胺樹脂,結果使得該聚醯亞胺樹脂可溶解於 γ-丁內酯等之泛用溶劑,因此雖然仍爲具有優越的儲存穩 定性之樹脂,但是將可提高難燃性。 Ο 在製法1之多元酚化合物(Α)之使用量較佳爲可使所 製得本發明之聚醯亞胺樹脂在其樹脂中含有1至40重量% ,更佳爲含有2至30重量%之量的源於多元酚化合物(Α )之結構,因爲可製成具有優越的硬化性與儲存穩定性之 聚醯亞胺樹脂的緣故。並且,更佳爲聚醯亞胺樹脂在其樹 脂中含有2至10重量%之量的源於多元酚化合物(Α)之 結構,因爲可獲得具有優越的尺寸穩定性與難燃性之聚醯 亞胺樹脂的緣故。 Ο 在本發明所使用之聚異氰酸酯化合物(Β)包括:例如 ,芳香族聚異氰酸酯化合物、脂肪族聚異氰酸酯化合物等 〇 前述芳香族聚異氰酸酯化合物包括:例如,4,4’-二苯 甲烷二異氰酸酯等之二苯甲烷二異氰酸酯;對伸苯基二異 氰酸酯、間伸苯基二異氰酸酯、對二甲苯二異氰酸酯、間 二甲苯二異氰酸酯、2,4-伸甲苯基二異氰酸酯、2,6-伸甲苯 基二異氰酸醋、4,4’-二苯甲烷二異氰酸酯、3,3’-二甲基二 -27- 201035172 苯基-4,4’-二異氰酸酯、3,3’_二乙基二苯基_4,4,_二異氰酸 酯、間二甲苯二異氰酸酯、對二甲苯二異氰酸酯、丨,3_雙 (α,α -二甲基異氰酸酯甲基)苯、四甲基伸茬基二異氰酸 酯、二伸苯基醚-4,4,_二異氰酸酯及萘二異氰酸酯;2,4_甲 苯二異氰酸酯、2,6 -甲苯二異氰酸酯等之甲苯二異氰酸酯 •’以如下所示通式(3 -1 )所代表的聯苯基骨架之二異氰酸 酯等。Sample: A DMF solution having a converted resin solid content of 0.2% by weight was filtered by a microfilter (injection amount: 10 μΐ) ° from compatibility with other resins, solution stability or hardenability with epoxy resin The viewpoint of the present invention is that the acid value of the polyimine resin of the present invention is preferably in the range of 1 to 50 K〇Hrng/g, more preferably 1 to 30 KOH mg/g. The polyimine used in the present invention. The resin can be produced, for example, by the method of -24-201035172 as described below. Process 1: Using a polyhydric phenol compound (A) having two or more phenolic hydroxyl groups in one molecule, a polyisocyanate compound (B) containing a diisocyanate compound, and an acid anhydride compound (C) containing a cyclohexane tricarboxylic anhydride The method of imidization is directly applied. Process 2: using a polyisocyanate compound (B) containing a diisocyanate compound, and an acid anhydride compound (C) containing a cyclohexane tricarboxylic anhydride, and directly imidizing, the isocyanate group present at the terminal is combined with a bifurcation. A method in which a polyhydric phenol compound (A) having two or more phenolic hydroxyl groups is reacted. Process 3: After using the diamine compound (D) and the anhydride compound (C) containing cyclohexane tricarboxylic anhydride and directly imidating, after adding a diisocyanate compound as a terminal isocyanate, and having two in one molecule A method in which the above phenolic hydroxyl group polyphenol compound (A) is reacted. The preparation method of the above Process 1 to Process 3 is called "isocyanate method", and when the isocyanate method is used in the presence of the polyhydric phenol compound (A) to form a ruthenium imine resin, it can provide a gel. Stable resin. It can be inferred that the polyhydric phenol compound (A) will selectively react with an isocyanate group to form a block type phenol structure to inhibit the side reaction of the isocyanate group, and at a high temperature, partial dissociation is performed to effectively react with an acid anhydride or The carboxyl group is reacted to form a quinone bond or a guanamine bond. In particular, it is effective in the case of an aliphatic or alicyclic acid anhydride such as a hydrogenated trimellitic acid which is slow in reactivity. When the polyimine resin of the present invention is produced, it is preferable to reduce the amount of residual water -25 to 201035172 to maintain the physical properties in a good state, to easily control the reaction, and to easily produce various modified polyimine resins. Preferably, the above method 1 is adopted. Hereinafter, the polyhydric phenol compound (A) which can be used in the above Process 1 is described in detail, for example, hydroquinone, biphenol, tetramethylbiphenol, ethylene bisphenol, bisphenol A, bisphenol F, Bisphenol S, cyclohexylene bisphenol (biguanide Z), dimethylbutylene bisphenol, 4,4'-(1-methylethylidene) bis[2,6-dimethylphenol], 4 , 4'-(1-phenylethylidene)bisphenol, 5,5'-(1-methylethylidene)bis[1,1'-biphenyl-2-ol], naphthalenediol, Dicyclopentadiene modified bisphenol, 9, 10 • dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (9,l〇-dihydro-9-oxa-10-phosphorphenanthrene-10-oxide ) a reaction product with hydroquinone or the like. Further, as the polyhydric phenol compound (A), a phenol compound such as a phenol novolak resin, a cresol novolac type resin, or a nonylphenol novolak resin may be used. Further, in the method for producing a polyimine resin of the present invention, the use of a polyfunctional phenol compound having a trifunctional or higher functional group as the polyhydric phenol compound (A) may cause high viscosity or gelation of the resin. Therefore, it is preferred to use a polyhydric phenol compound (difunctional polyphenol compound) containing two phenolic hydroxyl groups. Among them, a bisphenol-based compound such as bisphenol A, bisphenol F or bisphenol S or a reaction product of 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and hydroquinone is preferred. Wait. Further, a functional phenolic compound such as phenol or cresol may be used in part without impairing the efficacy of the present invention. The above 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and hydroquinone reverse -26- 201035172 should be difficult to dissolve in the general solvent "9,10-dihydro-9-oxygen Although the reaction product of hetero-10-phosphaphenanthrene-10-oxide and hydroquinone is used as a flame retardant additive, the solubility in a solvent is generally poor, so that it is limited in use. In the method for producing a polyimine resin of the present invention, since it is used as the polyhydric phenol compound (A), the skeleton of the reaction product is introduced into the polyimide resin, and as a result, the polyimide resin is obtained. It is soluble in a general-purpose solvent such as γ-butyrolactone, and therefore it is a resin having superior storage stability, but it can improve flame retardancy. The polyphenol compound (formula) used in Process 1 is preferably used in an amount such that the polyimine resin of the present invention is contained in the resin in an amount of 1 to 40% by weight, more preferably 2 to 30% by weight. The amount is derived from the structure of the polyphenol compound (Α) because it can be made into a polyimide resin having superior hardenability and storage stability. Further, it is more preferable that the polyimine resin contains 2 to 10% by weight of a structure derived from a polyhydric phenol compound in its resin because agglomerates having superior dimensional stability and flame retardancy can be obtained. The reason for the imine resin.聚 The polyisocyanate compound (Β) used in the present invention includes, for example, an aromatic polyisocyanate compound, an aliphatic polyisocyanate compound, and the like. The aforementioned aromatic polyisocyanate compound includes, for example, 4,4'-diphenylmethane diisocyanate. Diphenylmethane diisocyanate; p-phenylene diisocyanate, meta-phenyl diisocyanate, p-xylene diisocyanate, m-xylene diisocyanate, 2,4-tolyl diisocyanate, 2,6-toluene Diisocyanatoacetate, 4,4'-diphenylmethane diisocyanate, 3,3'-dimethyldi-27- 201035172 phenyl-4,4'-diisocyanate, 3,3'-diethyl Diphenyl-4,4,diisocyanate, m-xylene diisocyanate, p-xylene diisocyanate, hydrazine, 3_bis(α,α-dimethylisocyanatemethyl)benzene, tetramethyl hydrazino Isocyanate, diphenylene ether-4,4,-diisocyanate and naphthalene diisocyanate; toluene diisocyanate such as 2,4-toluene diisocyanate or 2,6-toluene diisocyanate. -1 ) the difference between the biphenyl skeletons represented Cyanate ester and the like.

(式中’ R2各自獨立地代表氫原子、碳原子數爲丨至9之 也可經氟改質之烴基。)。 以前述通式(3 -1 )所代表的二異氰酸酯包括:例如, 4,4’-二異氰酸酯-3,3’-二甲基-1,1,-聯苯、4,4,-二異氰酸酯 -3,3’-二乙基-1,1’_聯苯、4,4,-二異氰酸酯-2,2,-二甲基 -1,1’-聯苯、4,4’-二異氰酸酯- 2,2’-二乙基-1,1’-聯苯、4,4,- 二異氰酸酯-3,3’-雙三氟甲基-1,1’-聯苯、4,4’-二異氰酸酯 -2,2’-雙三氟甲基-1,1’·聯苯等。 前述脂肪族聚異氰酸酯化合物包括:例如,六亞甲基 二異氰酸酯、離胺酸二異氰酸酯、三甲基六亞甲基亞甲基 二異氰酸酯、異佛酮二異氰酸酯、4,4’-二環己基甲烷二異 氰酸酯、氫化二甲苯二異氰酸酯及降冰片烯二異氰酸酯等 〇 此外,聚異氰酸酯化合物(Β)也可使用經將前述聚異 氰酸酯化合物與各種多元醇成份在過量的異氰酸酯基下預 -28- 201035172 先進行反應所獲得之異氰酸酯預聚物。 在本發明所使用之聚醯亞胺樹脂也可採用分枝結構以 提高溶劑溶解性或與其他樹脂之相溶性。此等分枝之方法 是使用例如屬於前述二異氰酸酯化合物之異三聚氰酸酯體 的具有異三聚氰酸酯環之三官能以上之聚異氰酸酯化合物 、或前述二異氰酸酯之縮二脲(biuret)體、加成物(adduct )體、脲甲酸鹽(allophanate)體等即可。 基於具有優越的溶劑溶解性、相溶性、機械物性、尺 Ο 寸穩定性等之理由,前述聚異氰酸酯化合物(B)較佳爲使 用4,4’-二苯甲烷二異氰酸酯等之二苯甲烷二異氰酸酯、伸 甲苯基二異氰酸酯、以上述通式(3-1)所代表的聯苯基骨 架之二異氰酸酯等。此等之化合物是可單獨使用或其兩種 以上倂用。 特別是較佳爲使用以通式(3-1)所代表的二異氰酸酯 ,以獲得用於製造具有尺寸穩定性或機械物性提高的硬化 物之聚醯亞胺樹脂,更佳爲倂用二苯甲烷二異氰酸酯或伸 〇 甲苯基二異氰酸酯也可提高溶劑溶解性或長期儲存穩定性 〇 以通式(3-1)所代表的二異氰酸酯之使用量以所使用 的聚異氰酸酯化合物(B)之總量爲基準計,則較佳爲3〇 至80重量% ’因爲其可獲得具有更優越的尺寸穩定性之聚 醯亞胺樹脂的緣故。 在以前述之式(3-1)所代表的二異氰酸酯中,較佳爲 4,4’-二異氰酸酯-3,3’-二甲基-υ,-聯苯之二異氰酸酯,因 -29- 201035172 爲其可獲得具有優越的溶劑溶解性,且可製得具有優越的 耐熱性、機械物性及尺寸穩定性的硬化物之聚醯亞胺樹脂 的緣故。 除此之外’以前述通式(3-1)所代表的二異氰酸酯化 合物、4,4’-二苯甲烷二異氰酸酯、甲苯二異氰酸酯是可單 獨使用或混合使用,且也可更再與具有其他結構之二異氰 酸酯化合物、一異氰酸酯化合物、或三官能以上之聚異氰 酸酯化合物等倂用。 以通式(3-1 )所代表的二異氰酸酯化合物、及以4,4’-二苯甲烷二異氰酸酯、甲苯二異氰酸酯所代表的二異氰酸 酯化合物較佳爲使用全部異氰酸酯化合物之1 0重量%以上 ,因爲其可獲得具有優越的機械強度或斷裂伸度等之機械 物性、尺寸穩定性、耐熱性的硬化物;再者,由於也可獲 得具有優越的經時溶液穩定性之聚醯亞胺樹脂的緣故,因 此,較佳爲使用全部異氰酸酯化合物之1〇至80重量%。 除此之外,藉由使用甲苯二異氰酸酯,即可更再地提高所 製得之硬化物的難燃性。 此外,由於可用於製得具有特別低線性膨脹係數的硬 化物(亦即,具有優越的尺寸穩定性的硬化物)’因此4,4’· 二異氰酸酯-3,3’-二甲基-1,1’-聯苯較佳爲使用全部異氰酸 酯化合物之30至80重量%。若4,4’-二異氰酸酯-3,3’-二甲 基-1,1’-聯苯、與4,4’-二苯甲烷二異氰酸酯或甲苯二異氰 酸酯倂用時,則較佳爲使用4,4’-二異氰酸酯-3,3’-二甲基 -1,1’-聯苯爲全部異氰酸酯化合物之30至90重量%,而 •30- 201035172 4,.4’·二苯甲烷二異氰酸酯或甲苯二異氰酸 重量%;更佳爲4,4’-二異氰酸酯-3,3’-二 全部異氰酸酯化合物之40至80重量% ’ 二異氰酸酯及/或甲苯二異氰酸酯則爲20 除此之外,關於二苯甲烷二異氰酸醋 酯,若並未倂用4,4’-二異氰酸酯-3,3’-二 之使用量,若以聚異氰酸酯化合物(B)之 基準計,則各自較佳爲1〇至70重量% ’ Ο 重量%,再更佳爲3 0至6 0重量%。 前述酸酐化合物(C)是含有環己烷三 三羧酸酐包括:例如,環己烷-1,3,4-三甲 己烷-1,3, 5-三甲酸酐-3,5-酐、環己烷-1,2 酐等。其中,由於可用於製得具有優越的 越的機械強度或斷裂伸度等之機械物性及 ,因此較佳爲以式(4-1 )所代表的環己疼 酯則爲1 〇至7 〇 甲基-1,1’·聯苯爲 而4,4’-二苯甲烷 至60重量%。 ,、甲苯二異氰酸 甲基-1,1’-聯苯時 .原料的總重量爲 更佳爲10至60 ΐ羧酸酐。環己烷 酸酐-3,4-酐、環 ,3-三甲酸酐-2,3-f溶劑溶解性,優 .耐熱性的硬化物 Π3,4-三甲酸酐 -3,4-酐: ❹(wherein R 2 each independently represents a hydrogen atom, a hydrocarbon group having a carbon number of from 丨 to 9 which may be modified by fluorine.). The diisocyanate represented by the above formula (3 -1 ) includes, for example, 4,4'-diisocyanate-3,3'-dimethyl-1,1,-biphenyl, 4,4,-diisocyanate -3,3'-diethyl-1,1'-biphenyl, 4,4,-diisocyanate-2,2,-dimethyl-1,1'-biphenyl, 4,4'-diisocyanate - 2,2'-diethyl-1,1'-biphenyl, 4,4,-diisocyanate-3,3'-bistrifluoromethyl-1,1'-biphenyl, 4,4'- Diisocyanate-2,2'-bistrifluoromethyl-1,1'.biphenyl, and the like. The aforementioned aliphatic polyisocyanate compound includes, for example, hexamethylene diisocyanate, diazonic acid diisocyanate, trimethylhexamethylene methylene diisocyanate, isophorone diisocyanate, 4,4'-dicyclohexyl group. Methane diisocyanate, hydrogenated xylene diisocyanate, norbornene diisocyanate, etc. In addition, the polyisocyanate compound (Β) can also be used after the above polyisocyanate compound and various polyol components are in excess of the isocyanate group pre--28- 201035172 The isocyanate prepolymer obtained by the reaction is first carried out. The polyimine resin used in the present invention may also employ a branched structure to improve solvent solubility or compatibility with other resins. The method of branching is to use a trifunctional or higher polyisocyanate compound having an iso-cyanate ring or a biuret of the above-mentioned diisocyanate, for example, an iso-cyanate body belonging to the aforementioned diisocyanate compound. The body, the adduct body, the allophanate body, etc. may be used. The polyisocyanate compound (B) is preferably a diphenylmethane such as 4,4'-diphenylmethane diisocyanate, for the reason of having excellent solvent solubility, compatibility, mechanical properties, dimensional stability, and the like. Isocyanate, tolyl diisocyanate, diisocyanate of a biphenyl skeleton represented by the above formula (3-1), and the like. These compounds may be used singly or in combination of two or more. In particular, it is preferred to use a diisocyanate represented by the formula (3-1) to obtain a polyimine resin for producing a cured product having dimensional stability or improved mechanical properties, more preferably diphenyl. Methane diisocyanate or toluene diisocyanate can also improve solvent solubility or long-term storage stability. The amount of the diisocyanate represented by the formula (3-1) is the total amount of the polyisocyanate compound (B) used. The amount is preferably from 3 to 80% by weight based on the amount of 'because it can obtain a polyimide resin having superior dimensional stability. Among the diisocyanates represented by the above formula (3-1), preferred are 4,4'-diisocyanate-3,3'-dimethyl-indole, biphenyl diisocyanate, -29- 201035172 It is possible to obtain a polyimide resin having excellent solvent solubility and a cured product having excellent heat resistance, mechanical properties and dimensional stability. In addition, the diisocyanate compound represented by the above formula (3-1), 4,4'-diphenylmethane diisocyanate, toluene diisocyanate may be used singly or in combination, and may further have Other structural diisocyanate compounds, monoisocyanate compounds, or trifunctional or higher polyisocyanate compounds are used. The diisocyanate compound represented by the formula (3-1) and the diisocyanate compound represented by 4,4'-diphenylmethane diisocyanate or toluene diisocyanate preferably use 10% by weight or more of all the isocyanate compounds. Because it can obtain a cured product having mechanical properties, dimensional stability, and heat resistance such as superior mechanical strength or elongation at break; further, since a polyimide resin having excellent stability over time is also obtained For this reason, it is preferred to use from 1 to 80% by weight of the total isocyanate compound. In addition, by using toluene diisocyanate, the flame retardancy of the obtained cured product can be further improved. In addition, since it can be used to obtain a cured product having a particularly low coefficient of linear expansion (that is, a cured product having superior dimensional stability), thus 4,4'·diisocyanate-3,3'-dimethyl-1 The 1'-biphenyl is preferably used in an amount of from 30 to 80% by weight based on the total isocyanate compound. If 4,4'-diisocyanate-3,3'-dimethyl-1,1'-biphenyl, and 4,4'-diphenylmethane diisocyanate or toluene diisocyanate are used, it is preferably used. 4,4'-diisocyanate-3,3'-dimethyl-1,1'-biphenyl is 30 to 90% by weight of all isocyanate compounds, and • 30- 201035172 4,.4'·diphenylmethane Isocyanate or toluene diisocyanate wt%; more preferably 4 to 4'-diisocyanate-3,3'-di-all isocyanate compound 40 to 80% by weight 'diisocyanate and / or toluene diisocyanate is 20 In addition, regarding diphenylmethane diisocyanate, if the amount of 4,4'-diisocyanate-3,3'-di is not used, based on the polyisocyanate compound (B), Each is preferably from 1 to 70% by weight of '% by weight, more preferably from 30 to 60% by weight. The foregoing acid anhydride compound (C) is a cyclohexane tricarboxylic acid anhydride including, for example, cyclohexane-1,3,4-trimethylhexane-1,3,5-trisic anhydride-3,5-anhydride, cyclohexyl Alkanol-1,2 anhydride, etc. Among them, since it can be used to obtain mechanical properties having superior mechanical strength, elongation at break, and the like, it is preferred that the cyclohexyl ester represented by the formula (4-1) is from 1 to 7 armor. The base-1,1'.biphenyl is 4,4'-diphenylmethane to 60% by weight. When toluene diisocyanate methyl-1,1'-biphenyl, the total weight of the raw material is more preferably 10 to 60 ΐ carboxylic anhydride. Cyclohexane anhydride-3,4-anhydride, ring, 3-tricarboxylic anhydride-2,3-f Solvent solubility, excellent heat-resistant hardened product Π3,4-tricarboxylic anhydride -3,4-anhydride: ❹

(4-1 ) 除此之外,在本發明所使用之環己娱 不至於損及本發明之硬化的範圍內可混入 下,較佳爲5重量%以下之源自用作爲美 己烷-1,2,4-三甲酸等之雜質。 上述在本發明所使用之環己烷三羧_ 酯化合物反應時,酸酐基與異氰酸酯基將 三羧酸酐中,在 例如1 〇重量%以 之製造原料的環 酐,其與異氰酸 進行脫碳酸反應 -31 - 201035172 以形成醯亞胺鍵,而異氰酸酯基與羧酸則將進行脫碳酸以 形成醯胺鍵。如此,分子則將連結成線狀來形成分子。 前述環己烷三羧酸酐之使用量較佳爲用於構成聚醯亞 胺樹脂的全部酸酐化合物(c )中之5至1 00重量%,更佳 爲1 0至8 0重量%,因爲其可製成具有優越的溶劑溶解性 之聚醯亞胺樹脂,且可獲得具有優越的機械物性、耐熱性 之硬化物的緣故。此外,前述環己烷三羧酸酐之使用量, 以用於構成聚醯亞胺樹脂的全部原料之重量爲基準計,則 較佳爲2至60重量%,更佳爲5至50重量%。 酸酐化合物(C)是可在不至於損及本發明之功效範圍 內含有除了環己烷三羧酸酐以外之酸酐。其他酸酐是包括 :例如,具有一個酸酐基之多元羧酸酐、或具有兩個酸酐 基之多元羧酸酐等。前述具有一個酸酐基之多元羧酸酐是 包括:例如,偏苯三甲酸酐、萘-1,2,4-三甲酸酐等之芳香 族三羧酸酐等。此等偏苯三甲酸酐、萘-1,2,4-三甲酸酐等 之芳香族三羧酸酐等與異氰酸酯化合物反應時,則也與上 述之環己院三殘酸酐相同的方式,酸酐基與異氰酸醋基將 進行脫碳酸反應以形成醯亞胺鍵,而異氰酸酯基與羧酸則 將進行脫碳酸以形成醯胺鍵。如此,分子則將連結成線狀 來形成分子。 前述具有兩個酸酐基之多元羧酸酐包括:例如,焦蜜 石酸二酐、二苯甲酮-3,3,,4,4’-四甲酸二酐、二苯基醚 -3,3’,4,4’-四甲酸二酐、苯-1,2,3,4-四甲酸二酐、聯苯基 -3,3’,4,4’-四甲酸二酐、聯苯基-2,2’,3,3’-四甲酸二酐、萘 -32- 201035172 -2,3,6,7·四甲酸二酐、萘-1,2,4,5·四甲酸二酐、萘-l,4,5,8-四甲酸二酐、十氫萘-1,4,5,8-四甲酸二酐、4,8-二甲基 -i,2,3,5,6,7-六氫萘-1,2,5,6-四甲酸二酐、2,6-二氯萘 _1,4,5,8-四甲酸二酐、2,7-二氯萘-1,4,5,8-四甲酸二酐、 2,3,6,7-四氯萘-1,4,5,8-四甲酸二酐、菲-1,3,9, 10-四甲酸二 酐、茈-3,4,9,10-四甲酸二酐、雙(2,3-二羧基苯基)甲烷 二酐、雙(3,4-二羧基苯基)甲烷二酐、1,1-雙(2,3-二羧 基苯基)乙烷二酐、M-雙(3,4-二羧基苯基)乙烷二酐、 2,2-雙(2,3-二羧基苯基)丙烷二酐、2,3-雙(3,4-二羧基 苯基)丙烷二酐、雙(3,4-二羧基苯基)砸二酐、雙(3,4-二竣基苯基)醚二酐; 2二醇雙脫水偏苯三甲酸酯、丙二醇雙脫水偏苯三甲酸酯 ' 丁二醇雙脫水偏苯三甲酸酯、六亞甲基二醇雙脫水偏苯 H甲酸酯、聚乙二醇雙脫水偏苯三甲酸酯、聚丙二醇雙脫 水偏苯三甲酸酯、或其他之伸烷基二醇雙脫水偏苯三甲酸 酯等。 在除了前述環己烷三羧酸酐以外之酸酐中,較佳爲偏 苯Η甲酸酐、焦蜜石酸二酐、二苯甲酮-3,3,,4,4,-四甲酸二 酐、二苯基醚-3,3,,4,4,-四甲酸二酐、聯苯基-3,3’,4,4,-四 甲酸二酐、聯苯基-2,2,,3,3,-四甲酸二酐、及乙二醇雙脫水 偏苯三甲酸酯;更佳爲偏苯三甲酸酐。 與環己烷三羧酸酐同時倂用偏苯三甲酸酐作爲酸酐時 之使用量,以全部酸酐化合物(C)之莫耳量爲基準計,則 較佳爲5至90莫耳%之環己烷三羧酸酐、20至90莫耳% -33- 201035172 之偏苯三甲酸酐;更佳爲10至50莫耳%之環己烷三羧酸 酐、40至90莫耳%之偏苯三甲酸酐。此外,前述環己烷三 羧酸酐與偏苯三甲酸酐之使用量,以用於構成聚醯亞胺樹 脂的全部原料之莫耳量作爲基準計,則各自爲2至60莫耳 %,較佳爲2至60莫耳%。 此外,在溶劑溶解性與機械物性、耐熱物性之均衡方 面上,較佳爲上述之環己烷三羧酸酐與偏苯三甲酸酐之倂 用、環己烷三羧酸酐與二苯甲酮-3,3’,4,4’-四甲酸二酐之倂 用、環己烷三羧酸酐與焦蜜石酸二酐之倂用等;更佳的是 更再環己烷三羧酸酐與選自由偏苯三甲酸酐、二苯甲酮 -3,3’,4,4’-四甲酸二酐、焦蜜石酸二酐所組成的族群中兩種 以上之倂用,更佳爲倂用環己烷三羧酸酐、偏苯三甲酸酐 、二苯甲酮-3,3,,4,4’-四甲酸二酐之三種。 與環己烷三羧酸酐同時作爲酸'酐而倂用偏苯三甲酸酐 與二苯甲酮- 3,3’,4,4’-四甲酸二酐時,以用於構成醯亞胺樹 脂的全部酸酐(C )之莫耳量爲基準計,則較佳爲5至9 0 莫耳%之環己烷三羧酸酐、2至80莫耳%之偏苯三甲酸酐、 3至50莫耳%之二苯甲酮_3,3’,4,4’-四甲酸二酐;更佳爲 10至80莫耳%之環己烷三羧酸酐、10至80莫耳。/。之偏苯 三甲酸酐、5至30莫耳。/。之二苯甲酮- 3,3,,4,4,-四甲酸二酐 。此外,前述環己烷三羧酸酐、偏苯三甲酸酐、及二苯甲 酮_3,3,,4,4’-四甲酸二酐之使用量,以用於構成聚醯亞胺樹 脂的全部原料之莫耳量爲基準計’則各自較佳爲2至60莫 耳%、2至60莫耳%及2至60莫耳。/。。 -34- 201035172 此外’在不至於損及本發明之功效範圍內,也可倂用 芳香族、脂肪族、脂環族之二元羧酸化合物、多元羧酸化 合物、一元醇化合物、二元醇化合物、三官能以上之多元 醇化合物。此等芳香族、脂肪族、脂環族之二元羧酸化合 物、多元羧酸化合物可例示:鄰苯二甲酸、反丁烯二酸( 富馬酸)、己二酸、泌脂酸(癸二酸)、琥珀酸(丁二酸 )、馬來酸(順丁烯二酸)、環己烷二甲酸、偏苯三酸( 1,2,4-苯三甲酸)、焦蜜石酸(1,2,4,5-苯四甲酸)等;一 Ο 元醇化合物、二元醇化合物、三官能以上之多元醇化合物 是可例示:甲醇、乙醇、丙醇、乙二醇、丙二醇、丁二醇 、新戊二醇、3-甲基-1,5-戊二醇、己二醇、壬二醇、三羥 甲基丙烷、新戊四醇、聚醚多元醇、聚酯多元醇、聚碳酸 酯多元醇、聚二甲基矽氧烷多元醇等。 在上述聚醯亞胺樹脂之製造方法中,具有兩個以上之 酚性羥基之多元酚化合物(A)、聚異氰酸酯化合物(B) 、及酸酐化合物(C )則將進行反應。多元酚化合物(A ) ^ 之酚性羥基的莫耳數(ma)、聚異氰酸酯化合物(B)中 之異氰酸酯基的莫耳數(mb)、及酸酐化合物(C)中之 無羥基與羧基之合計莫耳數(me )較佳爲具有以下列(式; 1)所代表的關係,因爲其可獲得用於製造再現性優良’且 具有優越的溶劑溶解性、儲存穩定性、硬化性,且機械% 性也爲良好的硬化物之聚醯亞胺樹脂的緣故: 2 ^〔(ma) + (me) ] / ( mb ) ^ 1 (式"。 並且,若與上述(式1)同時具有以下列(式2)所代 -35- 201035172 表的關係時,則可獲得可用於製成具有優越的機械物性的 硬化物之聚醯亞胺樹脂: (ma) / (me) (式 2)。 以前述製法1製造本發明之聚醯亞胺樹脂時’具體而 言,例如將多元酚化合物(A)、聚異氰酸酯化合物(B) 、及含有環己烷三羧酸酐之多元羧酸酐(C )飼入,反應容器 中,並以一面攪拌一面升溫以使其進行脫碳酸反應。 反應可在50 °C至250 °C之溫度範圍進行,從反應速度 與防止副反應的觀點來考慮,則較佳爲在70 °C至180°C之 溫度下進行。 由於可使得所獲得之聚醯亞胺樹脂的穩定性趨於良好 ,因此反應較佳爲應繼續進行至異氰酸酯基大致全部結束 反應爲止。此外,對於一些殘留的異氰酸酯基,則可添加 醇或酚化合物來使其完成反應。 在本發明之聚醯亞胺樹脂之製造方法中,由於可使反 應均勻地進行,因此較佳爲使用有機溶劑。此時,有機溶 劑可預先添加入反應系統中後進行反應、或在反應中途導 入。此外,爲維持適當的反應速度,則系統中有機溶劑之 比例較佳爲反應系統之98重量%以下,更佳爲1〇至90重 量%。由於原料成份是使用含有異氰酸酯基之化合物,因 此此等有機溶劑較佳爲未具有羥基或胺基等之活性質子之 非質子性極性有機溶劑。 前述非質子性極性有機溶劑可使用:例如,二甲基甲 醯fee、一甲基乙醯胺、N -甲基-2-B比略陡酮、二甲基亞颯、 -36- 201035172 環丁楓、及γ-丁內酯等之極性有機溶劑。此外,除了上述 溶劑以外’只要其爲可進行溶解,則也可使用醚系溶劑、 酯系溶劑、酮系溶劑、及石油系溶劑等。此外,也可混合 使用各種溶劑。 在本發明所使用之用於聚醯亞胺樹脂之製造方法的醚 系溶劑包括:例如,乙二醇二甲基醚、乙二醇二乙基醚、 乙二醇二丁基醚等之乙二醇二烷基醚類;二甘醇二甲基醚 、二甘醇二乙基醚、二甘醇二丁基醚、三甘醇二甲基醚、 〇 三甘醇二乙基醚、三甘醇二丁基醚等之聚乙二醇二烷基醚 類;醋酸乙二醇一甲基醚酯、醋酸乙二醇一乙基醚酯、醋 酸乙二醇一丁基醚酯等之醋酸乙二醇一烷基醚酯類;醋酸 二甘醇一甲基醚酯、醋酸二甘醇一乙基醚酯、醋酸二甘醇 一丁基醚酯、醋酸三甘醇一甲基醚酯、醋酸三甘醇一乙基 醚酯、醋酸三甘醇一丁基醚酯等之聚醋酸乙二醇一烷基醚 酯類;丙二醇二甲基醚、丙二醇二乙基醚、丙二醇二丁基 醚等之丙二醇二烷基醚類;二丙二醇二甲基醚、二丙二醇 〇 二乙基醚、二丙二醇二丁基醚、三伸丙二醇二甲基醚、三 伸丙二醇二乙基醚、三伸丙二醇二丁基醚等之聚丙二醇二 烷基醚類;醋酸丙二醇一甲基醚酯、醋酸丙二醇~乙基醚 酯、醋酸丙二醇一丁基醚酯等之醋酸丙二醇一烷基醚酯類 ;醋酸二丙二醇一甲基醚酯、醋酸二丙二醇一乙基醚酯、 醋酸二丙二醇一丁基醚酯、醋酸三伸丙二醇一甲基醚酯、 醋酸三伸丙二醇一乙基醚酯、醋酸三伸丙二醇一丁基醚酯 等之聚醋酸丙二醇一烷基醚酯類;低分子之乙烯-丙烯共聚 -37- 201035172 合物等之共聚合聚醚二醇之二烷基醚類;共聚合聚醚二醇 之一醋酸酯一烷基醚類;共聚合聚醚二醇之烷基酯類;及 共聚合聚醚二醇之一烷基酯一烷基醚類等。 酯系溶劑包括:例如,醋酸乙酯及醋酸丁酯等。酮系 溶劑包括:丙酮、甲基乙基酮、及環己酮等。此外,也可 使用石油系溶劑包括:甲苯、二甲苯或其他高沸點之芳香 族溶劑等、或己烷、環己烷等之脂肪族及脂環族溶劑。 在製造本發明之聚醯亞胺樹脂時,在使用有機溶劑之 情況下的系統中之有機溶劑的比例,較佳爲反應系統之98 重量%以下,更佳爲4 0至9 0重量%。 使用於製造本發明之聚醯亞胺樹脂之有機溶劑,特別 是基於減少溶劑之臭氣或毒性上與在塗膜乾燥及塗膜硬化 時之殘留溶劑量、及減少塗膜之溶劑的吸濕量等之理由, 則較佳爲使用γ-丁內酯。此外,在所獲得之聚醯亞胺樹脂 方面,也較佳爲可溶解於γ-丁內酯之結構。 可溶解於γ -丁內酯、且在各種物性(耐熱特性、低線 性膨脹係數、機械物性)方面具有良好性能之聚醯亞胺樹 脂是例如經在多元酚化合物(Α)的存在下,使用4,4,-二 異氰酸酯-3,3’-二甲基-1,1’ -聯苯之二異氰酸酯、與含有 4,4’-二苯甲烷二異氰酸酯之二異氰酸酯化合物,並將環己 烷-1,3,4 -三甲酸-3,4 -酐、及偏苯三甲酸酐與其進行反應即 可獲得。另外,此時,也可將4,4’-二苯甲院二異氰酸酯之 —部份或總量以甲苯二異氰酸酯加以取代I。 適用於製造可溶解於前述γ-丁內酯、且具有各種物性 •38- 201035172 也爲良好性能之聚醯亞胺樹脂的多元酚化合物(A)可例示 :例如’雙酚A、雙酚F、雙酚S等之雙酚化合物、或萘 二醇、或聯苯酣、四甲基聯苯酚、或氫醒、或9,10-二氫- 9-氧雜-10-磷菲-10-氧化物與氫醌之反應產物等。 在製造前述可溶解於γ-丁內酯、且具有各種物性也爲 良好性能之聚醯亞胺樹脂時,多元酚化合物與4,4’-二異氰 酸酯-3,3’-二甲基-1,1’-聯苯、4,4-二苯甲烷二異氰酸酯、 環己烷-1,3,4_三甲酸-3,4-酐、及偏苯三甲酸酐之使用比例 〇 ’以用於構成聚醯亞胺樹脂之全部原料的莫耳量爲基準計 ,則各自較佳爲2至6 0莫耳%。 並且,此等可溶解於γ-丁內酯、且在各種物性(耐熱 特性、低線性膨脹係數、機械物性)方面也具有良好性能 之聚醯亞胺樹脂更佳爲在多元酚化合物(Α)的存在下,將 4,4’-二異氰酸酯-3,3’-二甲基聯苯、4,4-二苯甲烷二 異氰酸酯與環己烷-1,3,5 -三甲酸-3,4 -酐、偏苯三甲酸酐、 及二苯甲酮- 3,3’,4,4’ -四甲酸二酐進行反應即可獲得。此時 〇 ’ 4,4-一苯甲烷二異氰酸酯、環己烷- υ,%三甲酸-3,4_酐 、偏苯三甲酸酐、及二苯甲酮-3,3,,4,4’-四甲酸二酐之使用 比例較佳爲以用於構成聚醯亞胺樹脂之全部原料的莫耳量 爲基準計’則各自較佳爲2至60莫耳%。並且,此時也可 將4,4’-二苯甲烷二異氰酸酯之一部份或總量以甲苯二異 氰酸酯加以取代。 在此所使用之多元酚化合物(Α)可例示:例如雙酚a 、雙酣F、雙酚S等之雙酚化合物、或萘二醇、或聯苯酚 -39- 201035172 、四甲基聯苯酚、或氫醌、或9,10-二氫-9-氧雜-10-磷菲-10-氧化物與氫醌之反應產物等。尤其是如欲提高難燃性時, 則較佳爲使用9,10-二氫-9-氧雜-10-磷菲-10-氧化物與氫醌 之反應產物作爲該多元酚化合物。 揭述於本發明之上述及後述之所謂的「硬化物或硬化 物性」是意謂:除了本聚醯亞胺樹脂與可與其反應的成份 之硬化物以外,也包括本聚醯亞胺樹脂單獨或不會與本聚 醯亞胺樹脂反應的其他樹脂、添加劑、無機材料成份等, 且經簡單地加以乾燥溶劑所獲得之塗膜或成型物之硬化物 及其之物性。同時再也包括:本聚醯亞胺樹脂與可藉由加 熱或光而反應的硬化劑混合及/或雖然不會與本樹脂發生 反應,但是添加成份本身,以熱或光等加以硬化所製得之 硬化物及其之硬化物性在內。 本發明之硬化物是經將本發明之聚醯亞胺樹脂加以硬 化所獲得。具體而言,例如將本發明之聚醯亞胺樹脂塗佈 於基材上、或製成成型物後,在100至300°C下加熱即可 製成乾燥塗膜、乾燥成型物,或使其進行硬化反應即可製 成硬化塗膜、硬化成型物等之硬化物。 前述基材是可無限制地使用各種材料。基材是包括: 例如塑膠、金屬、木材、玻璃、無機材、及此等之複合材 料等。 並且,在本發明之聚醯亞胺樹脂可更再地添加其他熱 硬化性樹脂成份,以製成爲熱硬化性樹脂組成物。具體而 言,可添加例如環氧樹脂、三聚氰胺樹脂、異氰酸酯化合 -40- 201035172 物、矽酸鹽、及烷氧基矽烷化合物等,但是熱硬化性成份 較佳爲環氧樹脂。 前述環氧樹脂較佳爲在分子內具有兩個以上之環氧基 。此等環氧樹脂包括:例如,雙酚A型環氧樹脂、雙酚S 型環氧樹脂、雙酚F型環氧樹脂等之雙酚型環氧樹脂;苯 酚酚醛清漆環氧樹脂、甲酚酚醛清漆型環氧樹脂、雙酚型 酚醛清漆等之酚醛清漆型環氧樹脂;藉由二環戊二烯與各 種酚類進行反應所獲得之各種經二環戊二烯改質之酚樹脂 ^ 之環氧化物;2,2’,6,6’-四甲基聯苯酚之環氧化物等之聯苯 型環氧樹脂;具有萘骨架之環氧樹脂;具有弗骨架之環氧 樹脂等之芳香族系環氧樹脂、或此等芳香族系環氧樹脂之 氫化物;新戊二醇二縮水甘油基醚、1,6-己二醇二縮水甘 油基醚等之脂肪族環氧樹脂;甲酸3,4-環氧基環己基甲基 -3,4-環氧基環己烷酯、己二酸雙-(3,4-環氧基環己基)酯 等之脂環式環氧樹脂;例如異三聚氰酸三縮水甘油酯等之 含有雜環之環氧樹脂等。其中,由於可獲得具有優越的硬(4-1) In addition, it may be mixed in the range in which the ring used in the present invention does not impair the hardening of the present invention, and preferably 5% by weight or less is derived from the use as the hexane- Impurities such as 1,2,4-tricarboxylic acid. In the above reaction of the cyclohexane tricarboxylate compound used in the present invention, the anhydride group and the isocyanate group are used to produce a cyclic anhydride of the raw material in, for example, 1% by weight of the tricarboxylic anhydride, which is separated from the isocyanic acid. Carbonation reaction -31 - 201035172 to form a quinone bond, while the isocyanate group and the carboxylic acid will be decarbonated to form a guanamine bond. In this way, the molecules will be connected in a line to form a molecule. The amount of the above cyclohexanetricarboxylic anhydride to be used is preferably from 5 to 100% by weight, more preferably from 10 to 80% by weight, based on the total of the acid anhydride compound (c) constituting the polyimine resin because A polyimide resin having excellent solvent solubility can be obtained, and a cured product having excellent mechanical properties and heat resistance can be obtained. Further, the amount of the above-mentioned cyclohexanetricarboxylic anhydride used is preferably from 2 to 60% by weight, more preferably from 5 to 50% by weight, based on the total mass of the raw materials constituting the polyimine resin. The acid anhydride compound (C) is an acid anhydride other than cyclohexane tricarboxylic acid anhydride insofar as it does not impair the efficacy of the present invention. Other acid anhydrides include, for example, a polycarboxylic acid anhydride having one acid anhydride group, or a polycarboxylic acid anhydride having two acid anhydride groups, and the like. The above polycarboxylic acid anhydride having an acid anhydride group includes, for example, an aromatic tricarboxylic anhydride such as trimellitic anhydride or naphthalene-1,2,4-tricarboxylic anhydride. When an aromatic tricarboxylic anhydride such as trimellitic anhydride or naphthalene-1,2,4-tricarboxylic anhydride is reacted with an isocyanate compound, it is also the same as the above-mentioned cyclohexanine trisin anhydride. The cyanate vine group will undergo a decarboxylation reaction to form a quinone imine bond, while the isocyanate group and the carboxylic acid will undergo decarbonation to form a guanamine bond. In this way, the molecules will be connected in a line to form a molecule. The above polycarboxylic acid anhydride having two acid anhydride groups includes, for example, pyromellitic dianhydride, benzophenone-3,3,4,4'-tetracarboxylic dianhydride, diphenyl ether-3,3' , 4,4'-tetracarboxylic dianhydride, benzene-1,2,3,4-tetracarboxylic dianhydride, biphenyl-3,3',4,4'-tetracarboxylic dianhydride, biphenyl-2 , 2',3,3'-tetracarboxylic dianhydride, naphthalene-32- 201035172 -2,3,6,7·tetracarboxylic dianhydride, naphthalene-1,2,4,5·tetracarboxylic dianhydride, naphthalene- l,4,5,8-tetracarboxylic dianhydride, decalin-1,4,5,8-tetracarboxylic dianhydride, 4,8-dimethyl-i, 2,3,5,6,7- Hexahydronaphthalene-1,2,5,6-tetracarboxylic dianhydride, 2,6-dichloronaphthalene_1,4,5,8-tetracarboxylic dianhydride, 2,7-dichloronaphthalene-1,4, 5,8-tetracarboxylic dianhydride, 2,3,6,7-tetrachloronaphthalene-1,4,5,8-tetracarboxylic dianhydride, phenanthrene-1,3,9,10-tetracarboxylic dianhydride, hydrazine -3,4,9,10-tetracarboxylic dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, 1,1-double ( 2,3-dicarboxyphenyl)ethane dianhydride, M-bis(3,4-dicarboxyphenyl)ethane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride , 2,3-bis(3,4-dicarboxyphenyl)propane dianhydride, Bis(3,4-dicarboxyphenyl)ruthenic anhydride, bis(3,4-dimercaptophenyl)ether dianhydride; 2 glycol bis-dehydrated trimellitate, propylene glycol bis-dehydrated trimellitate ' Butanediol double-dehydrated trimellitate, hexamethylene glycol bis-dehydrated phenyl-H-formate, polyethylene glycol bis-dehydrated trimellitate, polypropylene glycol bis-dehydrated trimellitate, or Other alkylene glycol double-dehydrated trimellitate and the like. Among the acid anhydrides other than the aforementioned cyclohexane tricarboxylic anhydride, preferred are benzoic anhydride, pyromellitic dianhydride, benzophenone-3,3,4,4,-tetracarboxylic dianhydride, Diphenyl ether-3,3,,4,4,-tetracarboxylic dianhydride, biphenyl-3,3',4,4,-tetracarboxylic dianhydride, biphenyl-2,2,,3, 3,-tetracarboxylic dianhydride, and ethylene glycol double-dehydrated trimellitate; more preferred is trimellitic anhydride. The amount of use of the trimellitic anhydride as the acid anhydride in the case of using the trimellitic anhydride is preferably 5 to 90 mol% of the cyclohexane based on the molar amount of the entire acid anhydride compound (C). Tricarboxylic anhydride, from 20 to 90 mol% -33 to 201035172 of trimellitic anhydride; more preferably from 10 to 50 mol% of cyclohexane tricarboxylic anhydride, and from 40 to 90 mol% of trimellitic anhydride. Further, the amount of the above-mentioned cyclohexanetricarboxylic anhydride and trimellitic anhydride used is 2 to 60 mol%, preferably 2 to 60 mol%, based on the molar amount of all the raw materials for constituting the polyimine resin. It is 2 to 60 mol%. Further, in terms of the balance of solvent solubility, mechanical properties, and heat resistant physical properties, the above-mentioned cyclohexane tricarboxylic anhydride and trimellitic anhydride are preferably used, and cyclohexane tricarboxylic anhydride and benzophenone-3 are used. , 3', 4, 4'-tetracarboxylic dianhydride for use in hydrazine, cyclohexane tricarboxylic anhydride and pyromellitic dianhydride, etc.; more preferably cyclohexane tricarboxylic anhydride and selected from More than two kinds of groups consisting of trimellitic anhydride, benzophenone-3,3',4,4'-tetracarboxylic dianhydride, and pyrogallanoic dianhydride, more preferably Three kinds of alkyl tricarboxylic anhydride, trimellitic anhydride, benzophenone-3,3,,4,4'-tetracarboxylic dianhydride. When used as an acid 'anhydride together with cyclohexane tricarboxylic anhydride and trimellitic anhydride and benzophenone-3,3',4,4'-tetracarboxylic dianhydride, it is used to form a quinone imine resin. The molar amount of all the acid anhydrides (C) is preferably from 5 to 90% by mole of cyclohexanetricarboxylic anhydride, from 2 to 80% by mole of trimellitic anhydride, and from 3 to 50% by mole. Dibenzophenone _3,3',4,4'-tetracarboxylic dianhydride; more preferably 10 to 80 mol% of cyclohexanetricarboxylic anhydride, 10 to 80 mol. /. Pyromellitic anhydride, 5 to 30 moles. /. Dibenzophenone - 3,3,,4,4,-tetracarboxylic dianhydride. Further, the above-mentioned amounts of cyclohexanetricarboxylic anhydride, trimellitic anhydride, and benzophenone-3,3,4,4'-tetracarboxylic dianhydride are used to constitute all of the polyimide resin. The molar amount of the raw materials is preferably from 2 to 60 mol%, from 2 to 60 mol% and from 2 to 60 mols, respectively. /. . -34- 201035172 In addition, aromatic, aliphatic, alicyclic dicarboxylic acid compounds, polycarboxylic acid compounds, monool compounds, glycols may also be employed without damaging the efficacy of the present invention. A compound or a trifunctional or higher polyhydric alcohol compound. Such aromatic, aliphatic, alicyclic dicarboxylic acid compounds and polycarboxylic acid compounds can be exemplified by phthalic acid, fumaric acid (fumaric acid), adipic acid, and lipoic acid (癸). Diacid), succinic acid (succinic acid), maleic acid (maleic acid), cyclohexanedicarboxylic acid, trimellitic acid (1,2,4-benzenetricarboxylic acid), pyromic acid ( 1,2,4,5-benzenetetracarboxylic acid), etc.; a monohydric alcohol compound, a diol compound, and a trifunctional or higher polyhydric alcohol compound are exemplified by methanol, ethanol, propanol, ethylene glycol, propylene glycol, and butyl Glycol, neopentyl glycol, 3-methyl-1,5-pentanediol, hexanediol, decanediol, trimethylolpropane, pentaerythritol, polyether polyol, polyester polyol, Polycarbonate polyol, polydimethyloxane polyol, and the like. In the method for producing a polyimine resin, a polyhydric phenol compound (A) having two or more phenolic hydroxyl groups, a polyisocyanate compound (B), and an acid anhydride compound (C) are reacted. The molar number (ma) of the phenolic hydroxyl group of the polyhydric phenol compound (A) ^, the molar number (mb) of the isocyanate group in the polyisocyanate compound (B), and the hydroxyl group-free and carboxyl group in the acid anhydride compound (C) The total molar number (me ) is preferably one having the relationship represented by the following formula (1) because it is excellent in reproducibility for manufacturing and has excellent solvent solubility, storage stability, and hardenability, and The mechanical % is also a good hardened polyimine resin: 2 ^[(ma) + (me) ] / ( mb ) ^ 1 (formula). And, if at the same time as (1) above When it has a relationship of -35 to 201035172 represented by the following formula (2), a polyimine resin which can be used for producing a cured product having superior mechanical properties can be obtained: (ma) / (me) (Formula 2 When the polyimine resin of the present invention is produced by the above Process 1, 'specifically, for example, a polyhydric phenol compound (A), a polyisocyanate compound (B), and a polycarboxylic acid anhydride containing cyclohexane tricarboxylic anhydride ( C) Feeding, in a reaction vessel, and raising the temperature while stirring to carry out a decarboxylation reaction. The reaction can be carried out at a temperature ranging from 50 ° C to 250 ° C, and is preferably carried out at a temperature of from 70 ° C to 180 ° C from the viewpoint of the reaction rate and prevention of side reactions. The stability of the polyimine resin tends to be good, so the reaction is preferably continued until the isocyanate group is almost completely terminated. Further, for some residual isocyanate groups, an alcohol or a phenol compound may be added to complete the reaction. In the method for producing a polyimine resin of the present invention, since the reaction can be carried out uniformly, it is preferred to use an organic solvent. In this case, the organic solvent may be added to the reaction system in advance to carry out a reaction or a reaction. Further, in order to maintain an appropriate reaction rate, the ratio of the organic solvent in the system is preferably 98% by weight or less, more preferably 1% to 90% by weight based on the reaction system. Since the raw material component is a compound containing an isocyanate group. Therefore, these organic solvents are preferably aprotic polar organic solvents which do not have an active proton such as a hydroxyl group or an amine group. The organic solvent can be used, for example, dimethylformamide, monomethylammoniumamine, N-methyl-2-B than slightly sulphur ketone, dimethyl fluorene, -36-201035172 环丁枫, and A polar organic solvent such as γ-butyrolactone. In addition to the above solvent, an ether solvent, an ester solvent, a ketone solvent, a petroleum solvent, or the like may be used as long as it is soluble. Various solvents may be used in combination. The ether solvent used in the method for producing a polyimine resin used in the present invention includes, for example, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol II. Ethylene glycol dialkyl ethers such as butyl ether; diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether, triethylene glycol dimethyl ether, ruthenium triethylene glycol Polyethylene glycol dialkyl ethers such as diethyl ether and triethylene glycol dibutyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol acetate Ethylene glycol monoalkyl ether acetates such as ether ether esters; diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol acetate Poly(ethylene glycol) monoalkyl ether esters such as butyl ether ester, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, and triethylene glycol monobutyl ether acetate; propylene glycol II a propylene glycol dialkyl ether such as methyl ether, propylene glycol diethyl ether or propylene glycol dibutyl ether; dipropylene glycol dimethyl ether, dipropylene glycol bis diethyl ether, dipropylene glycol dibutyl ether, and tri-propylene glycol Polypropylene glycol dialkyl ethers such as methyl ether, tri-propylene glycol diethyl ether, tri-propylene glycol dibutyl ether; propylene glycol monomethyl ether acetate, propylene glycol-ethyl ether acetate, propylene glycol monobutyl acetate Propylene glycol monoalkyl ether acetates such as ether esters; dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether acetate, dipropylene glycol monobutyl ether acetate, trimethyl propylene glycol monomethyl ether acetate, Polyvinyl acetate propylene glycol monoalkyl ether esters such as tri-propylene glycol monoethyl ether acetate, tri-propylene glycol monobutyl ether acetate; low molecular ethylene-propylene copolymer-37-201035172 composite copolymerized polyether Dialkyl ethers of diols; copolymerized polyether II Acetate a one alkyl ethers; copolymerized alkyl esters of polyether diols; and one copolymerized polyether glycol alkyl esters of alkyl ethers. The ester solvent includes, for example, ethyl acetate and butyl acetate. The ketone solvent includes acetone, methyl ethyl ketone, and cyclohexanone. Further, petroleum solvents may be used, including toluene, xylene or other high-boiling aromatic solvents, or aliphatic and alicyclic solvents such as hexane and cyclohexane. In the production of the polyimine resin of the present invention, the proportion of the organic solvent in the system in the case of using an organic solvent is preferably 98% by weight or less, more preferably 40% to 90% by weight based on the reaction system. The organic solvent used in the manufacture of the polyimine resin of the present invention, in particular, based on reducing the odor or toxicity of the solvent, the amount of residual solvent in the drying of the coating film and the hardening of the coating film, and the moisture absorption of the solvent of the coating film. For the reason of the amount or the like, it is preferred to use γ-butyrolactone. Further, in terms of the obtained polyimine resin, a structure which is soluble in γ-butyrolactone is also preferable. A polyimine resin which is soluble in γ-butyrolactone and has good properties in various physical properties (heat resistance characteristics, low linear expansion coefficient, mechanical properties) is, for example, used in the presence of a polyphenol compound (Α) 4,4,-diisocyanate-3,3'-dimethyl-1,1'-biphenyl diisocyanate, and diisocyanate compound containing 4,4'-diphenylmethane diisocyanate, and cyclohexane -1,3,4-tricarboxylic acid-3,4-anhydride, and trimellitic anhydride are obtained by reacting therewith. Further, at this time, a part or a total amount of 4,4'-benzophenone diisocyanate may be substituted with toluene diisocyanate. The polyhydric phenol compound (A) which is suitable for the production of a polyimine resin which is soluble in the aforementioned γ-butyrolactone and has various physical properties and is also a good property is exemplified by, for example, 'bisphenol A, bisphenol F , a bisphenol compound such as bisphenol S, or naphthalenediol, or biphenyl hydrazine, tetramethylbiphenol, or hydrogen awake, or 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10- a reaction product of an oxide and hydroquinone, and the like. In the manufacture of the above polyimine resin which is soluble in γ-butyrolactone and has various physical properties and also good properties, the polyphenol compound and 4,4'-diisocyanate-3,3'-dimethyl-1 , 1'-biphenyl, 4,4-diphenylmethane diisocyanate, cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride, and trimellitic anhydride used in proportion 〇' The molar amount of all the raw materials of the polyimide resin is preferably from 2 to 60 mol% based on the molar amount. Further, these polyimine resins which are soluble in γ-butyrolactone and which have good properties in various physical properties (heat resistance characteristics, low linear expansion coefficient, mechanical properties) are more preferably polyhydric phenol compounds (Α). In the presence of 4,4'-diisocyanate-3,3'-dimethylbiphenyl, 4,4-diphenylmethane diisocyanate and cyclohexane-1,3,5-tricarboxylic acid-3,4 It can be obtained by reacting an anhydride, trimellitic anhydride, and benzophenone-3,3',4,4'-tetracarboxylic dianhydride. At this time, 4' 4,4- phenylmethane diisocyanate, cyclohexane-oxime, % tricarboxylic acid-3,4-anhydride, trimellitic anhydride, and benzophenone-3,3,,4,4' The use ratio of the tetracarboxylic dianhydride is preferably from 2 to 60 mol% based on the amount of the moles of all the raw materials constituting the polyimine resin. Further, at this time, a part or a total amount of 4,4'-diphenylmethane diisocyanate may be substituted with toluene diisocyanate. The polyhydric phenol compound (Α) used herein may, for example, be a bisphenol compound such as bisphenol a, biguanide F or bisphenol S, or naphthalenediol, or biphenol-39-201035172, tetramethylbiphenol. Or hydroquinone, or a reaction product of 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and hydroquinone. In particular, when it is desired to improve flame retardancy, it is preferred to use a reaction product of 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and hydroquinone as the polyhydric phenol compound. The so-called "hardened or hardened property" mentioned above and below in the present invention means that the present polyimine resin is included in addition to the hardened substance of the component which can react with the present polyimide. Or other resin, additive, inorganic material component, etc. which do not react with the present polyimide resin, and the cured film of the coating film or the molded article obtained by simply drying the solvent and the physical properties thereof. At the same time, it also includes: the polyimine resin is mixed with a hardener which can be reacted by heating or light and/or does not react with the resin, but is added with the component itself and hardened by heat or light. The hardened material and its hardened properties are included. The cured product of the present invention is obtained by hardening the polyimine resin of the present invention. Specifically, for example, the polyimine resin of the present invention is applied onto a substrate or formed into a molded article, and then heated at 100 to 300 ° C to prepare a dried coating film, a dried molded product, or The hardening reaction can be carried out to obtain a cured product such as a cured coating film or a cured molded article. The aforementioned substrate is a variety of materials that can be used without limitation. The substrate includes, for example, plastic, metal, wood, glass, inorganic materials, and the like. Further, in the polyimine resin of the present invention, another thermosetting resin component may be further added to form a thermosetting resin composition. Specifically, for example, an epoxy resin, a melamine resin, an isocyanate compound - 40 - 201035172, a decanoate, an alkoxy decane compound or the like may be added, but the thermosetting component is preferably an epoxy resin. The epoxy resin preferably has two or more epoxy groups in the molecule. Such epoxy resins include, for example, bisphenol type epoxy resins, bisphenol S type epoxy resins, bisphenol F type epoxy resins, and the like, bisphenol type epoxy resins; phenol novolac epoxy resin, cresol a novolac type epoxy resin such as a novolac type epoxy resin or a bisphenol type novolac; and various dicyclopentadiene-modified phenol resins obtained by reacting dicyclopentadiene with various phenols^ An epoxide type; a biphenyl type epoxy resin such as an epoxide of 2,2',6,6'-tetramethylbiphenol; an epoxy resin having a naphthalene skeleton; an epoxy resin having a skeleton, etc. An aromatic epoxy resin or a hydrogenated product of such an aromatic epoxy resin; an aliphatic epoxy resin such as neopentyl glycol diglycidyl ether or 1,6-hexanediol diglycidyl ether; An alicyclic epoxy resin such as 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane formate or bis-(3,4-epoxycyclohexyl) adipate For example, an epoxy resin containing a hetero ring such as triglycidyl isocyanurate or the like. Among them, due to the availability of superior hard

Q 化塗膜之機械物性之熱硬化性聚醯亞胺樹脂組成物,因此 較佳爲芳香族系環氧樹脂,其中更佳爲萘型環氧樹脂。萘 骨架之環氧樹脂是在分子中具有萘骨架與兩個以上之縮水 甘油氧基者,而萘骨架之酚醛清漆體也屬於其之範疇。 前述本發明所使用之聚醯亞胺樹脂與環氧樹脂之摻合 量,以樹脂成份之重量比計(聚醯亞胺樹脂)/(環氧樹脂 ),則可使用1/100至50/1之比例,且更佳爲1/10至20/1 -41- 201035172 具體而言,前述三聚氰胺樹脂包括··例如,烷氧基化 三聚氰胺樹脂。烷氧基化三聚氰胺樹脂可使用··將三聚氰 胺或苯并狐胺等之含有三畊環之胺基化合物與甲醛之反應 所獲得之羥甲基化物的一部份或全部,與醇化合物進行反 應所獲得之烷氧基化三聚氰胺樹脂。 在此所使用之醇化合物是可使用碳原子數爲約1至4 之低級醇,具體而言,可使用甲氧基羥甲基化三聚氰胺樹 脂、丁基化羥甲基化三聚氰胺樹脂等。分子結構是可經完 全加以烷氧基化、或可殘留著羥甲基,且也可殘留著亞胺 基。 在本發明所使用之烷氧基化三聚氰胺樹脂之樹脂結構 ,從可使與聚醯亞胺樹脂之相溶性及硬化時之硬化性趨於 良好的觀點來考慮,則較佳爲甲氧基羥甲基化三聚氰胺樹 脂,更佳爲甲氧基化率爲80%以上之甲氧基羥甲基化三聚 氰胺樹脂。 此外,三聚氰胺樹脂之樹脂結構也可爲自縮合的多核 體。從相溶性或穩定性的觀點來考慮,則此時之聚合度較 佳爲1至5,更佳爲1.2至3。 在本發明所使用之烷氧基化三聚氰胺樹脂之數量平均 分子量可使用1〇〇至1 0000者。從與聚醯亞胺樹脂之相溶 性及硬化時之硬化性的觀點來考慮,則較佳爲300至2000 ,更佳爲400至1 000。 在本發明所使用之烷氧基化三聚氰胺樹脂可同時飼入 三聚氰胺或苯并胍胺、甲醛(福馬林)及醇來進行反應, -42- 201035172 也可預先使三聚氰胺或苯并胍胺與甲醛(福馬林)進行反 應以獲得羥甲基化三聚氰胺化合物後,再與醇化合物進行 烷氧基化反應。 關於在本發明所使用之烷氧基化三聚氰胺樹脂之市售 商品是包括:例如甲氧基羥甲基化三聚氰胺樹脂,具體而 言,例如 Nihon Cytec Industries, Inc.製造之商品 CYMEL 300、301、303、305等。此外,含有羥甲基之甲氧基羥甲 基化三聚氰胺樹脂包括:例如,Nihon Cytec Industries, O Inc.製造之商品CYMEL370、771等。含有亞胺基之甲氧基 化三聚氣胺樹脂包括:例如,Mitsui Chemicals, Inc.製造 之商品 CYMEL 325、327、701、703、712 等。甲氧基化丁 氧基化三聚氛胺樹脂包括:例如,Nihon Cytec Industries, Inc.製造之商品 CYMEL 232、235、236、238、266、267、 2 8 5等。丁氧基化三聚氰胺樹脂包括:例如,Nihon Cytec Industries, Inc.製造之商品 U-VAN 20SE60 等。 在本發明所使用之烷氧基化三聚氰胺樹脂之使用量, ^ 由於可獲得藉由聚醯亞胺樹脂之物性與烷氧基化三聚氰胺 樹脂之硬化的增效功效,且可使特別優越的機械物性與高 Tg (玻璃轉移溫度)之兩者並存’以聚醯亞胺樹脂之樹脂 固體成份換算計相對於1 〇〇重量份,則較佳爲摻合1至30 重量份,更佳爲1至20重量份,再更佳爲1至10重量份 ,特佳爲2至7重量份。 前述異氰酸酯化合物可使用例如芳香族系之異氰酸酯 化合物、脂肪族系之異氰酸酯化合物及脂環族系之異氰酸 -43- 201035172 酯化合物等,且較佳爲在一分子中具有兩個以上之異氰酸 酯基之聚異氰酸酯化合物。此外,也可使用封端型異氰酸 酯化合物。 上述之烷基烷氧基矽烷包括:例如,烷基三烷氧基矽 烷、二烷基二烷氧基矽烷等。 前述烷基三烷氧基矽烷包括:例如,甲基三甲氧基矽 烷、甲基三乙氧基矽烷、甲基三丙氧基矽烷、甲基三丁氧 .基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三 丙氧基矽烷、乙基三丁氧基矽烷、苯基三甲氧基矽烷、苯 基三乙氧基矽烷、苯基三丙氧基矽烷、苯基三丁氧基矽烷 等。 前述二烷基二烷氧基矽烷包括··例如,二甲基二甲氧 基矽烷、二甲基二乙氧基矽烷、二甲基二丙氧基矽烷、二 甲基二丁氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧 基矽烷、二乙基二丙氧基矽烷、二乙基二丁氧基矽烷、二 苯基二甲氧基矽烷、二苯基二乙氧基矽烷、二苯基二丙氧 基矽烷、二苯基二丁氧基矽烷、甲基乙基二甲氧基矽烷、 甲基乙基二乙氧基矽烷、甲基乙基二丙氧基矽烷、甲基乙 基二丁氧基矽烷、甲基苯基二甲氧基矽烷、甲基苯基二乙 氧基矽烷、甲基苯基二丙氧基矽烷、甲基苯基二丁氧基矽 烷、三甲基甲氧基矽烷、三甲基乙氧基矽烷、三乙基甲氧 基矽烷、三乙基乙氧基矽烷、三苯基甲氧基矽烷、三苯基 乙氧基矽烷等。 此外,也可使用烷基烷氧基矽烷之縮合物,例如前述 -44- 201035172 烷基三烷氧基矽烷之縮合物、或二烷基二 合物等。 並且,在本發明之樹脂可添加入聚酯 PPS樹脂、PPE樹脂、聚伸芳基樹脂等之 酣樹脂、三聚氰胺樹脂、院氧基砂院系硬 、氰酸酯化合物等之硬化劑或反應性化合 二氰二胺、胍胺或其衍生物、咪唑類、胺 基之酚類、有機膦類、鳞鹽類、四級銨鹽 〇 媒等之硬化觸媒或硬化促進劑、以及塡料 劑之消泡材、均塗劑、滑劑、濕潤改良劑 燃劑、抗氧化劑、紫外線吸收劑等來製成 成物。 此外,在本發明之聚醯亞胺樹脂視需 塡充材、有機顏料、無機顏料、體質顏料( )、防銹劑等來製成樹脂組成物。此等是 以上倂用。 ® 前述塡充材包括:例如,硫酸鋇、鈦 酸粉、微粒狀氧化矽、二氧化矽、滑石、 碳酸鈣、氧化鋁、氫氧化鋁、雲母、氧化 塡充材是可使用各種粒徑者,且可添 樹脂或其組成物之物性的數量。此等適當 份之重量計,則爲在約5至80%重量之範 必須加以分散成均勻後來使用。尤其是如 之組成物在表面均勻地形成塗膜或薄片狀 烷氧基矽烷之縮 、苯氧基樹脂、 黏結劑樹脂、苯 化劑、多元酸酐 物或三聚氰胺、 類、具有一個羥 類、光陽離子觸 、作爲其他添加 、抗沉降劑、難 聚醯亞胺樹脂組 要可再添加各種 extender pigment 可單獨或其兩種 酸鋇、氧化矽之 黏土、碳酸鎂、 鋁等。 加不至於阻礙本 的數量以固體成 圍,但是較佳爲 欲將本樹脂及其 物時,則必須使 -45- 201035172 用粒經爲較該等之膜厚爲充分小者。但是,如欲提高在塗 膜或薄片狀物的抗滑性等時,則也可強制使用部份粒徑爲 大者。粒子系塡充材之分散方法可使用習知的二輥型輥、 三輥型輥等之輥來進行分散,或以珠球磨、高速分散機等 來實施,且也可預先將粒子表面以分散處理劑加以表面改 質。 前述有機顏料包括:偶氮顏料;例如酞青素•藍、酞 青素·綠之銅酞青素系顏料、喹吖酮系顏料等。 前述無機顏料包括:例如,鉻黃、鉻酸鋅(鋅鉻黃) ^ 、鉬·橙之鉻酸鹽;例如普魯士藍(Prussian Blue)之亞 鐵氰化物;氧化鈦、氧化鋅(鋅白)、紅色氧化鐵(紅丹 )、氧化例如碳化鉻綠之金屬氧化物;鎘黃、鎘紅; 例如硫化荥之金屬硫化物、硒化物;例如硫酸鉛之硫酸鹽 ;例如群青之矽酸鹽;碳酸鹽、鈷·紫;例如锰紫之磷酸 鹽;例如鋁粉、鋅粉、黃銅粉、鎂粉、鐵粉、銅粉、鎳粉 之金屬粉;碳黑等。 此外,也可使用其他之著色劑、防銹劑、體質顏料中 任一者。此等可單獨或其兩種以上倂用。 本發明之聚醯亞胺樹脂以及熱硬化性樹脂組成物等之 樹脂組成物,經調製本發明之聚醯亞胺樹脂或其樹脂組成 物並製成塗佈物或成型物後,藉由在100〜300 T:下加熱即 可使其乾燥或硬化。 前述塗膜之形成方法使用之基材可在並無特殊的限制 下加以使用。基材包括:例如,塑膠、金屬、木材、玻璃 -46- 201035172 、無機材、及此等之複合材料等。 此外,本發明之聚醯亞胺樹脂及其之組成物,也可使 用於適合可撓性電路基板(flexible circuit board)之製造 用形態之由樹脂及其之組成物層(A層)及支撐體薄膜(B 層)所構成的薄膜(黏著膜)之形態。 黏著膜可根據各種方法,例如藉由調製將本發明之聚 醯亞胺樹脂或其組成物溶解於有機溶劑所獲得之樹脂清漆 (resinvarnish),並將此樹脂清漆塗佈於支撐體薄膜,然 〇 後以加熱或吹熱風等乾燥有機溶劑以形成樹脂層或樹脂組 成物層來製造。 支撐體薄膜(B層)用作爲製造黏著膜時之支撐體, 而在製造可撓性電路基板中,最後則將被剝離或被移除者 。支撐體薄膜包括:例如聚乙烯、聚氯乙烯等之聚烯烴, 聚對苯二甲酸乙二醇酯(在下文中,有時候則簡稱爲「PET 」。)、聚萘二甲酸乙二醇酯等之聚酯,聚碳酸酯,以及 脫模紙或銅箔等之金屬箔等。若作爲用於支撐銅箔的支撐 〇 體薄膜來使用時,則以氯化鐵(III )(三氯化鐵:ferric chloride)、氯化銅(II)(二氯化銅:copper(II) chloride )等之蝕刻液etching liquid )加以蝕刻即可移除。支撐 薄膜除了毛面(mat surface)處理、電暈處理(corona treatment )之外,也可施加脫模處理,若考慮及剝離性時 ,則更佳爲施加脫模處理。支撐薄膜之厚度是並無特殊的 限制’通常爲在10至150μηι,更佳爲在25至50μιη之範圍 使用。 -47- 201035172 用於調製清漆(varnish )之有機溶劑包括:例如,丙 酮、甲基乙基酮、環己酮等之酮類;醋酸乙酯、醋酸丁酯 、醋酸賽路蘇酯、醋酸丙二醇一甲基醚酯、醋酸咔必醇酯 等之醋酸酯類;賽路蘇、丁基味必醇等之昨必醇類;甲苯 、二甲苯等之芳香族烴類;二甲基甲醯胺、二甲基乙醯胺 、N-甲基吡咯啶酮、伽瑪-丁內酯等。有機溶劑可兩種以上 組合使用。 乾燥條件並無特殊的限制,但是通常對於樹脂組成物 中的有機溶劑之含率則加以乾燥成爲5質量%以下,較佳 爲3質量%以下。具體的乾燥條件是視樹脂組成物之硬化 性、或也視清漆中之有機溶劑量而不同’但是在例如含有 3〇至60質量%之有機溶劑的清漆,則通常可在80至12(TC 下以約3至1 3分鐘即可加以乾燥。業界熟習此項技藝者當 可以簡單的實驗來設定最佳乾燥條件。 樹脂及其之組成物層(A層)的厚度,通常可設定爲 在5至500μιη之範圍。A層之厚度的較佳範圍是視黏著膜 之用途而不同,但是用於以增層法製造多層可撓性電路基 板時,由於用於形成電路的導體層之厚度通常爲5至7〇μιη ,相當於層間絕緣層的Α層之厚度則較佳爲在1〇至ΙΟΟμιη 之範圍。 Α層也可以保護膜加以保護。藉由保護膜加以保護, 則可防止對於樹脂組成物層表面的塵埃附著或受傷等。保 護膜在積層時則將被剝離。保護膜可使用與支撐薄膜相同 的材料。保護膜之厚度是並無特殊的限制,但是較佳爲在 -48- 201035172 1至40μιη之範圍。 使用本發明之聚醯亞胺樹脂或組成物所獲得之黏著膜 是特別適用於製造多層可撓性電路基板。在下文中,則將 就製造多層可撓性電路基板之方法加以說明。黏著膜是適 合用真空積層機使其積層於可撓性電路基板上。在此所使 用之可撓性電路基板,不用說主要是使用於經圖案化加工 在聚酯基板、聚醯亞胺基板、聚醯胺基醯亞胺基板、液晶 高分子基板等之基板單面或雙面的導體層(電路),也可 〇使用於爲將經交替形成電路與絶緣層之層,且在單面或雙 面形成電路之多層可撓性電路基板更加以多層化而使用。 此外,從絶緣層對於電路基板之密著性的觀點來考慮,則 電路表面較佳爲以過氧化氫/硫酸、MEC Etch Bond ( MEC Co.,Ltd.製造)等之表面處理劑預先施加粗化處理。 市售之真空積層機包括:例如,日合摩頓股份有限公 司(Nichigo-Morton Co.,Ltd.)製造之真空貼膜機(vacuum applicator)、名機製作所股份有限公司(Meiki Co., Ltd. ^ )製造之真空加壓式積層機(vacuum pressing laminator ) 、Hitachi Plant Technologies,Ltd.製造之輥式乾燥塗佈機 (roll-type dry coater) 、H i t a c h i AIC,I n c ·製造之真空積 層機等。 關於積層方面,若黏著膜具有保護膜時,則先移除該 保護膜後,將黏著膜一面加壓及加熱、一面積層於電路基 板。積層之條件是視需要將黏著膜及電路基板加以預熱、 壓著溫度較佳爲70至14(TC、壓著壓力較佳爲1至11 -49- 201035172 kgf/cm2、並在空氣壓力爲20 mmHg以下之減壓下進行積層 。此外,積層之方法可爲批式或使用輥之連績式。 經將黏著膜積層於電路基板後,加以冷卻至室溫附近 後剝離支撐體薄膜。其次,加熱經積層於電路基板上之聚 醯亞胺樹脂或組成物,若該組成物爲熱硬化性樹脂組成物 時,則以加熱使其硬化。加熱(硬化)之條件通常選擇在 150°C至220°C、20分鐘至180分鐘之範圍,更佳爲選擇在 160 °C至200 °C、30至120分鐘之範圍。此外,若支撐體薄 膜具有脫模處理或聚矽氧等之剝離層時,則也可在經加熱 硬化熱硬化性聚醯亞胺樹脂組成物後、或經加熱(硬化) 及鑽孔後剝離支撐體薄膜。 經形成本發明之聚醯亞胺樹脂或聚醯亞胺樹脂組成物 之硬化物的絶緣層後,視需要也可在電路基板以鑽頭(drill )、雷射、電漿、或此等之組合等方法進行鑽孔,以形成 微孔(via-hole)或貫通孔(through-hole)。特別是通常 爲使用二氧化碳氣體雷射或YAG雷射(YttriumAluminum Garnet Laser)等之雷射。 其次,施加絶緣層(聚醯亞胺樹脂或聚醯亞胺樹脂組 成物之硬化物)之表面處理。表面處理可採用在除膠渣處 理所使用之方法,且可以同時進行除膠渣處理的方式來實 施。通常在除膠渣處理所使用之化學藥品爲氧化劑。「氧 化劑」包括:例如,過錳酸鹽(過錳酸鉀、過錳酸鈉等) 、重鉻酸鹽、臭氧、過氧化氫/硫酸、硝酸等。較佳爲使用 在利用增層法的多層印刷線路板之製造中被通用作爲粗化 -50- 201035172 絶緣層的氧化劑,亦即,鹼性過錳酸溶液(例如過錳酸鉀 、過錳酸鈉之氫氧化鈉水溶液)來進行處理。在以氧化劑 進行處理之前,也可施加使用膨潤劑的處理。此外,在使 用氧化劑的處理之後,一般則實施利用還原劑的中和處理 0 在施加表面處理後,則在絶緣層表面以鍍覆(plating )形成導體層。導體層形成是可以組合無電鍍覆(electroless plating)與電解鍍覆(electrolytic plating)之方法實施。 〇 另外,也可形成與導體層成逆圖案之鍍覆阻劑,而僅以無 電鍍覆形成導體層。在形成導體層後,在150至200 °c下 施加20至90分鐘之徐冷(anneal )處理,則可更再地提 高導體層之剝離強度,並使其穩定化。 以圖案加工形成導體層以形成電路之方法可使用例如 業界熟習此項技藝者所習知的減成法(subtractive process )、半加成法(semi-additive process)等。在減成法之情 況時,則無電覆銅層(electroless copper-plating layer) Ο w 之厚度爲〇·1至3μιη,特佳爲0.3至2μιη。經在其上將電鍍 覆層(electrop lating layer )(全板電鏟層:panel plating layer)形成3至35μιη,較佳爲5至20μιη之厚度後,形成 抗蝕阻劑(etching resist),以氯化鐵(in)(三氯化鐵 )、氯化銅(Π )(二氯化銅)等之蝕刻液加以蝕刻形成 導體圖案後’剝離抗蝕阻劑’即可獲得電路基板。此外, 在半加成法之情況下,將無電覆銅層以0.1至3μιη,較佳 爲0.3至2μιη之厚度形成無電覆銅層後,形成圖案阻劑( -51- 201035172 pattern resist) ’ 接著,經電鍍覆銅(electroplating copper )後加以剝離’即可獲得電路基板。 經耐熱ί樹脂層(耐熱樹脂薄膜)取代支撐體薄膜的形 態之薄膜’亦即’由聚醯亞胺樹脂或其組成物層(Α層) 及耐熱樹脂層(C層)所構成的薄膜,可用作爲可撓性電 路基板用之基材薄膜。另外,由樹脂及其之組成物層(Α 層)、耐熱樹脂層(C層)及銅箔(D層)所構成的薄膜 也可相同地用作爲可撓性電路基板之基材薄膜。在此情況 下’基材薄膜則依照Α層、C層、D層之順序具有層結構 。上述之基材薄膜,耐熱樹脂層則不用加以剝離而可用於 構成可撓性電路基板之一部份。 將本發明之聚醯亞胺樹脂或樹脂組成物之硬化物所構 成的絶緣層(A’層)形成在耐熱樹脂層(C層)上的薄膜 可用作爲單面可撓性電路基板用之基材薄膜。此外,具有 A ’層、C層及A ’層之順序的層結構之薄膜、及由A ’層、C 層及銅箔(D層)所構成且具有A’層、C層及D層之順序 的層結構之薄膜也可相同地用作爲雙面可撓性電路基板用 之基材薄膜。 用於耐熱樹脂層之「耐熱樹脂」包括聚醯亞胺樹脂、 芳香族聚醯胺樹脂、聚醯胺基醯亞胺樹脂、液晶高分子等 。特別較佳爲聚醯亞胺樹脂及聚醯胺基醯亞胺樹脂。此外 ,在用於可撓性電路基板之特性上,較佳爲使用斷裂強度 爲100 MPa以上、斷裂伸度爲5 %以上、在20至150 °C之 間的熱膨脹係數爲40 ppm以下、及玻璃轉移溫度Tg爲 -52- 201035172 200°c以上或分解溫度爲3 00 °c以上之耐熱樹脂。 符合上述特性之耐熱樹脂是適合使用市售習知的薄膜 狀耐熱樹脂:例如,宇部興產股份有限公司(Ube Industries,Ltd.)製造之聚醯亞胺薄膜「UPILEX-S」、東 麗•杜邦股份有限公司(DuPont-Toray Co·,Ltd.)製造之 聚醯亞胺薄膜「KAPTON」、鐘淵化學工業股份有限公司 (Kaneka Corporation)製造之聚醯亞胺薄膜「APICAL」 、帝人特種薄膜股份有限公司(Teijin Advanced Films O Limited )製造之「ARAMICA」、可樂麗股份有限公司( Kuraray Co.,Ltd.)製造之液晶高分子薄膜「VECSTAR」 、住友培科股份有限公司(Sumitomo Bakelite Co.,Ltd.) 製造之聚醚醚酮薄膜「SUMILITEFS-1100C」等。 耐熱樹脂層之厚度通常爲2至150 μιη,較佳爲在10至 5 Ομιη之範圍。耐熱樹脂層(C層)也可使用經施加表面處 理者。表面處理包括:毛面處理、電暈放電處理、電漿處 理等之乾式處理;溶劑處理、酸處理、鹼處理等之化學處 〇 W 理;及噴砂處理、機械硏磨處理等。特別是從與A層之密 著性的觀點來考慮,則較佳爲經施加電漿處理者。 由絶緣層(A’)與耐熱樹脂層(C)所構成的單面可撓 性電路基板用之基材薄膜可以下述方式來製造。首先,以 與前述黏著膜之情況相同的方式調製將本發明之樹脂組成 物溶解於有機溶劑所獲得之樹脂清漆,然後將該樹脂清漆 塗佈於耐熱樹脂薄膜上,並以加熱或吹熱風等來乾燥有機 溶劑,以形成聚醯亞胺樹脂層或樹脂組成物層。有機溶劑 -53- 201035172 、乾燥條件等之條件是與前述黏著膜之情況相同。聚醯亞 胺樹脂層或樹脂組成物層之厚度較佳爲在5至15μπι之範 圍。 其次,將聚醯亞胺樹脂層或樹脂組成物層加熱乾燥, 以形成聚醯亞胺樹脂或聚醯亞胺樹脂組成物之絶緣層。加 熱硬化之條件通常選擇在150 °C至220 °C下爲20分鐘至180 分鐘之範圍,更佳爲選擇在160 °C至200 °C下爲30至120 分鐘之範圍。 欲製造由絶緣層(A’層)、耐熱樹脂層(C)層及銅箔 (D層)之三層所構成的雙面可撓性電路基板用薄膜之基 材薄膜時,則在由耐熱樹脂層(C層)與銅箔(D層)所 構成的覆銅積層薄膜(copper-clad laminated film)上形成 樹脂組成物之層,然後以與上述者相同的方式製造即可。 「覆銅積層薄膜」包括:流延法雙層CCL (覆銅積層薄膜 :Copper-clad laminate)、濺鍍法雙層CCL、積層法雙層 CCL、三層CCL等。銅箔適合使用厚度爲12μιη、18μιη者 〇 市售之「雙層CCL」包括:ESP ANEX SC (新日鐵化 學股份有限公司(Nippon Steel Chemicals Co.,Ltd.)製造 );NEOFLEX I&lt;CM&gt;、NEOFLEX I&lt;LM&gt; (三井化學股 份有限公司(Mitsui Chemicals,Inc.)製造);S’PERFLEX (住友金屬礦山股份有限公司(Sumitomo M.etal Mining Co.,Ltd.)製造)等。此外,市售之三層 CCL包括: NIKAFLEX F-50VC1 ( Nikkan Industries Co., Ltd.製造)等 -54- 201035172 製造由絶緣層(A’層)、耐熱樹脂層(C層)及絶緣 層(A’層)之三層所構成的雙面可撓性電路基板用薄膜之 基材薄膜可藉由下述方式來進行。首先,以與前述黏著膜 之情況相同的方式,調製將本發明之聚醯亞胺樹脂或樹脂 組成物溶解於有機溶劑所獲得之樹脂清漆,然後將該樹脂 清漆塗佈於支撐體薄膜上,然後以加熱或吹熱風等使有機 溶劑乾燥,以形成聚醯亞胺樹脂層或樹脂組成物層。有機 〇 溶劑、乾燥條件等之條件是與前述黏著膜之情況相同。聚 醯亞胺樹脂層或樹脂組成物層之厚度較佳爲在5至15μπι 之範圍。 其次,將該黏著膜積層於耐熱樹脂薄膜之雙面。積層 之條件則與前述者相同。另外,若在耐熱薄膜之單面預先 設置樹脂組成物層時,則僅積層單面即可。其次,將樹脂 組成物層加熱硬化,以形成聚醯亞胺樹脂層或樹脂組成物 之層的絶緣層。加熱硬化之條件通常選擇在150°C至220°C ^ 且爲20分鐘至180分鐘之範圍內選擇,更佳爲在160°C至 200 °C且爲30至120分鐘之範圍內選擇。 在下文中,則就從可撓性電路基板用之基材薄膜製造 可撓性電路基板之方法加以說明。在由 A’層、C層及A’ 層所構成的基材薄膜之情況時,則首先加熱硬化後,在電 路基板以鑽頭、雷射、電漿等之方法鑽孔,以形成用於導 通雙面之貫通孔。在由A’層、C層及D層所構成的基材薄 膜之情況時,則以相同的方法加以鑽孔以形成微孔。特別 -55- 201035172 是通常爲使用二氧化碳氣體雷射或YAG雷射(Yttrium Aluminum Garnet Laser)等之雷射的鑽孔。 其次’施加絶緣層(聚醯亞胺樹脂之層或樹脂組成物 之層)之表面處理。關於表面處理,則與前述黏著膜之情 況相同。實施表面處理後,則以鍍覆在絶緣層表面上形成 導體層。關於使用鍍覆的導體層之形成,則與前述黏著膜 之情況桐同。形成導體層後,在150至200 °C、20至90分 鐘加以徐冷處理,即可更再地提高導體層之剝離強度,並 使其穩定化。 其次,以圖案化加工形成導體層來形成電路以作爲可 撓性電路基板。在使用由A層、C層及D層所構成的基材 薄膜時,則也對D層的銅箔進行形成電路。形成電路之方 法可使用例如業界熟習此項技藝者所習知的減成法、半加 成法等。其詳細細節則與前述黏著膜之情況相同。 藉由上述所獲得之單面或雙面可撓性電路基板,例如 前述藉由使用本發明之黏著膜加以多層化,即可製造多層 可撓性電路基板。 此外,本發明之聚醯亞胺樹脂或樹脂組成物也可用於 形成半導體與基板之間的應力緩和層的材料。例如,以與 前述相同的方式以使用本發明之聚醯亞胺樹脂或樹脂組成 物所獲得之黏著膜來形成基板最上部之絶緣層的全部或一 部份,並連接半導體,藉此可製得經隔著該聚醯亞胺樹脂 之硬化物或該樹脂組成物之硬化物而黏著半導體與基板之 半導體裝置。在此情況下,黏著膜之聚醯亞胺樹脂層或樹 -56- 201035172 脂組成物層之厚度,則可在10至ΙΟΟΟμιη之範圍適當地選 擇。本發明之聚醯亞胺樹脂或樹脂組成物可以鑛覆形成導 體層,且在基板上所設置之應力緩和用之絶緣層上也可簡 便地以鍍覆形成導體層來製造電路圖案。 《實施例》 其次,以實施例及比較例更具體地說明本發明。在下 文中,除非另有說明外,則「份」及「%」是皆意謂「質 量%」。 〇 〔實施例1〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入如表 1所示之原料。一面攪拌一面在注意散熱下升溫至80°C, 並在此溫度下歷時1小時使其溶解、反應,更再以歷時2 小時升溫至1 6 0 °C後,在此溫度下使其進行反應5小時。 反應是與碳酸氣之發泡同時進行’使得系統內變成爲茶色 之透明液體。結果獲得在25 °C之黏度爲7 Pa · s之樹脂固 體成份爲16 %且溶液酸價爲2.1 (KO H mg/g)之聚醯亞胺 ® 樹脂(A1)之溶液(聚醯亞胺樹脂溶解於γ-丁內酯之樹脂 組成物)。除此之外’樹脂之固體成份的酸價爲1 3 . 1 ( ΚΟΗ mg/g )。此外,以凝膠透層析法(GPC)之測定結果,其 重量平均分子量爲29000。 -57- 201035172 表1 原料名(簡稱) 原料之分子量 飼入莫耳數 飼入重量(克) MDI 250 0.25 62.5 DMBPDI 264 0.74 195.4 TMA 192 0.52 99.8 BTDA 322 0.1 32.2 TMAH 198 0.3 59.4 HCAHQ 324.3 0.08 25.9 GBL (反應溶劑) 2070.0 表1之備註(以下相同): MDI :二苯甲烷二異氰酸酯 DMBPDI:二甲基聯苯基二異氰酸酯(如下所示結構)The Q-coated film is a thermosetting polyimine resin composition having mechanical properties, and therefore is preferably an aromatic epoxy resin, and more preferably a naphthalene epoxy resin. The epoxy resin of the naphthalene skeleton is one having a naphthalene skeleton and two or more glycidoxy groups in the molecule, and the novolac lacquer body of the naphthalene skeleton also belongs to the category. The blending amount of the polyimine resin used in the present invention and the epoxy resin may be 1/100 to 50/ by weight of the resin component (polyimine resin) / (epoxy resin). The ratio of 1 and more preferably 1/10 to 20/1 - 41 to 201035172 Specifically, the aforementioned melamine resin includes, for example, an alkoxylated melamine resin. The alkoxylated melamine resin can be reacted with an alcohol compound by using a part or all of a methylol compound obtained by a reaction of a three-till ring-containing amino compound such as melamine or benzoxamine with formaldehyde. The alkoxylated melamine resin obtained. As the alcohol compound to be used herein, a lower alcohol having a carbon number of about 1 to 4 can be used. Specifically, a methoxymethylolated melamine resin, a butylated methylolated melamine resin or the like can be used. The molecular structure may be completely alkoxylated, or a methylol group may remain, and an imine group may remain. The resin structure of the alkoxylated melamine resin used in the present invention is preferably a methoxyl group from the viewpoint of being compatible with the polyamidene resin and the hardenability at the time of curing. The methylated melamine resin is more preferably a methoxymethylolated melamine resin having a methoxylation ratio of 80% or more. Further, the resin structure of the melamine resin may also be a self-condensing multinuclear body. From the viewpoint of compatibility or stability, the degree of polymerization at this time is preferably from 1 to 5, more preferably from 1.2 to 3. The number average molecular weight of the alkoxylated melamine resin used in the present invention may be from 1 Å to 10,000. From the viewpoint of compatibility with the polyimide resin and hardenability at the time of hardening, it is preferably from 300 to 2,000, more preferably from 400 to 1,000. The alkoxylated melamine resin used in the present invention can be simultaneously fed with melamine or benzoguanamine, formaldehyde (formalin) and an alcohol to react, and -42-201035172 can also be used to preliminarily make melamine or benzoguanamine and formaldehyde. (Formalin) The reaction is carried out to obtain a methylolated melamine compound, followed by alkoxylation with an alcohol compound. Commercially available products of the alkoxylated melamine resin used in the present invention include, for example, a methoxymethylolated melamine resin, specifically, for example, a product CYMEL 300, 301 manufactured by Nihon Cytec Industries, Inc. 303, 305, etc. Further, the methoxyl-methylated melamine resin containing a methylol group includes, for example, commercially available from Nihon Cytec Industries, O Inc., CYMEL 370, 771, and the like. The methoxylated trimer amide resin containing an imide group includes, for example, CYMEL 325, 327, 701, 703, 712 and the like manufactured by Mitsui Chemicals, Inc. The methoxylated butoxylated trialtamine resin includes, for example, those commercially available from Nihon Cytec Industries, Inc., CYMEL 232, 235, 236, 238, 266, 267, 285, and the like. The butoxylated melamine resin includes, for example, a product manufactured by Nihon Cytec Industries, Inc., U-VAN 20SE60, and the like. The amount of the alkoxylated melamine resin used in the present invention, ^ can be obtained by the synergistic effect of the physical properties of the polyimide resin and the hardening of the alkoxylated melamine resin, and can make a particularly superior machine. The physical property and the high Tg (glass transition temperature) coexist. 'In terms of the solid content of the resin of the polyimide resin, it is preferably 1 to 30 parts by weight, more preferably 1 part by weight. It is more preferably from 1 to 10 parts by weight, particularly preferably from 2 to 7 parts by weight, to 20 parts by weight. As the isocyanate compound, for example, an aromatic isocyanate compound, an aliphatic isocyanate compound, an alicyclic isocyanate-43-201035172 ester compound, or the like can be used, and it is preferred to have two or more isocyanates in one molecule. A polyisocyanate compound based on a polyisocyanate. Further, a blocked isocyanate compound can also be used. The above alkyl alkoxydecane includes, for example, an alkyltrialkoxydecane, a dialkyldialkoxydecane, and the like. The aforementioned alkyltrialkoxydecane includes, for example, methyltrimethoxydecane, methyltriethoxydecane, methyltripropoxydecane, methyltributyloxybutane, ethyltrimethoxydecane. , ethyl triethoxy decane, ethyl tripropoxy decane, ethyl tributoxy decane, phenyl trimethoxy decane, phenyl triethoxy decane, phenyl tripropoxy decane, phenyl Tributoxy decane and the like. The aforementioned dialkyldialkoxydecane includes, for example, dimethyldimethoxydecane, dimethyldiethoxydecane, dimethyldipropoxydecane, dimethyldibutoxydecane, Diethyldimethoxydecane, diethyldiethoxydecane, diethyldipropoxydecane, diethyldibutoxydecane, diphenyldimethoxydecane, diphenyldiethyl Oxydecane, diphenyldipropoxydecane, diphenyldibutoxydecane, methylethyldimethoxydecane, methylethyldiethoxydecane, methylethyldipropoxy Decane, methylethyldibutoxydecane, methylphenyldimethoxydecane, methylphenyldiethoxydecane,methylphenyldipropoxydecane,methylphenyldibutoxy Decane, trimethyl methoxy decane, trimethyl ethoxy decane, triethyl methoxy decane, triethyl ethoxy decane, triphenyl methoxy decane, triphenyl ethoxy decane, etc. . Further, a condensate of an alkyl alkoxy decane such as the above-mentioned condensate of -44-201035172 alkyltrialkoxy decane or a dialkyl compound or the like can also be used. Further, the resin of the present invention may be added to a hardener or a reactive resin such as a polyester PPS resin, a PPE resin, a poly(arylene resin) or the like, a melamine resin, an amphoteric epoxy resin, or a cyanate ester compound. a curing catalyst or a hardening accelerator for dicyandiamide, decylamine or a derivative thereof, an imidazole, an amine phenol, an organic phosphine, a scale salt, a quaternary ammonium salt, and the like A foaming material, a leveling agent, a slip agent, a moisture improving agent, an antioxidant, an ultraviolet absorber, or the like is used to form a product. Further, the polyimine resin of the present invention is used as a resin composition as needed, such as a ceramium filler, an organic pigment, an inorganic pigment, an extender pigment, or a rust preventive. These are the above. ® The above-mentioned enamel fillers include, for example, barium sulfate, titanic acid powder, particulate cerium oxide, cerium oxide, talc, calcium carbonate, aluminum oxide, aluminum hydroxide, mica, cerium oxide filling materials, and various particle diameters can be used. And the amount of physical properties of the resin or its composition can be added. The weight of these appropriate parts is such that it must be dispersed to be uniform after about 5 to 80% by weight. In particular, the composition uniformly forms a coating film or a flaky alkoxy decane on the surface, a phenoxy resin, a binder resin, a benzoating agent, a polybasic acid anhydride or a melamine, a class, a hydroxy group, and a light. The cation contact, as an additional additive, anti-settling agent, and refractory polyimide resin group, may be further added with various extender pigments, either alone or in combination with two kinds of acid bismuth, cerium oxide, magnesium carbonate, aluminum, and the like. It is not necessary to prevent the amount of the present invention from being surrounded by solids, but it is preferable to use the resin of -45-201035172 to be sufficiently smaller than the film thickness of the resin. However, if the slip resistance of the coating film or the sheet is to be improved, the partial particle diameter may be forced to be large. The dispersion method of the particle system lanthanum can be carried out by using a conventional two-roll type roll or a three-roll type roll, or by a bead ball mill, a high-speed disperser, or the like, and the particle surface can be dispersed in advance. The treatment agent is surface modified. The above organic pigments include: azo pigments; for example, anthraquinone blue, anthocyanin, green copper anthraquinone pigments, quinophthalone pigments, and the like. The foregoing inorganic pigments include, for example, chrome yellow, zinc chromate (zinc chrome yellow) ^, molybdenum orange chromate; ferrocyanide such as Prussian blue; titanium oxide, zinc oxide (zinc white) , red iron oxide (red dan), oxidized metal oxide such as chrome carbide green; cadmium yellow, cadmium red; for example, metal sulfides, selenides of barium sulfide; sulfates such as lead sulfate; for example, ultramarine cyanate; Carbonate, cobalt, purple; for example, phosphate of manganese violet; metal powder such as aluminum powder, zinc powder, brass powder, magnesium powder, iron powder, copper powder, nickel powder; carbon black, and the like. Further, any of other coloring agents, rust inhibitors, and body pigments may also be used. These may be used alone or in combination of two or more. The resin composition of the polyimine resin and the thermosetting resin composition of the present invention is prepared by using the polyimine resin of the present invention or a resin composition thereof to prepare a coated product or a molded article. ~300 T: It can be dried or hardened by heating. The substrate used in the method for forming the above coating film can be used without particular limitation. The substrate includes, for example, plastic, metal, wood, glass -46-201035172, inorganic materials, and composite materials thereof. Further, the polyimide resin of the present invention and the composition thereof can also be used for a resin and a composition layer (layer A) and support thereof for a manufacturing form suitable for a flexible circuit board. The form of a film (adhesive film) composed of a bulk film (layer B). The adhesive film can be applied to a resin film obtained by dissolving the polyimine resin of the present invention or a composition thereof in an organic solvent according to various methods, and applying the resin varnish to the support film. The crucible is then dried by heating or blowing hot air or the like to form a resin layer or a resin composition layer. The support film (layer B) is used as a support for the production of the adhesive film, and in the manufacture of the flexible circuit substrate, it is finally peeled off or removed. The support film includes, for example, a polyolefin such as polyethylene or polyvinyl chloride, polyethylene terephthalate (hereinafter, simply referred to as "PET"), polyethylene naphthalate, and the like. Polyester, polycarbonate, and metal foil such as release paper or copper foil. When used as a supporting ruthenium film for supporting copper foil, iron (III) chloride (ferric chloride), copper (II) chloride (copper chloride: copper (II)) Chloride) Etching liquid can be removed by etching. The support film may be subjected to a release treatment in addition to a mat surface treatment or a corona treatment, and it is more preferable to apply a release treatment in consideration of peelability. The thickness of the support film is not particularly limited, and is usually used in the range of 10 to 150 μm, more preferably 25 to 50 μm. -47- 201035172 Organic solvents for varnish include, for example, ketones such as acetone, methyl ethyl ketone, cyclohexanone, etc.; ethyl acetate, butyl acetate, celecoxib acetate, propylene glycol acetate Acetate esters such as monomethyl ether ester and chlorhexidine acetate; sorbitan, butyl butyl alcohol, etc.; aromatic hydrocarbons such as toluene and xylene; dimethylformamide , dimethyl acetamide, N-methyl pyrrolidone, gamma-butyrolactone and the like. The organic solvent may be used in combination of two or more. The drying conditions are not particularly limited, but the content of the organic solvent in the resin composition is usually 5% by mass or less, preferably 3% by mass or less. The specific drying conditions are different depending on the hardenability of the resin composition or the amount of the organic solvent in the varnish. However, in the case of, for example, a varnish containing 3 to 60% by mass of an organic solvent, it is usually 80 to 12 (TC). It can be dried in about 3 to 13 minutes. Those skilled in the art can set the optimum drying conditions by simple experiment. The thickness of the resin and its composition layer (layer A) can usually be set at a range of 5 to 500 μm. A preferred range of the thickness of the A layer is different depending on the use of the adhesive film, but when the multilayer flexible circuit substrate is produced by the build-up method, the thickness of the conductor layer for forming the circuit is usually The thickness of the ruthenium layer corresponding to the interlayer insulating layer is preferably in the range of 1 Å to ΙΟΟ μιη. The ruthenium layer can also be protected by a protective film, which is protected by a protective film to prevent the resin from being 5 to 7 Å μm. The dust on the surface of the composition layer is adhered or injured, etc. The protective film is peeled off when laminated. The protective film can use the same material as the support film. The thickness of the protective film is not particularly limited, but The adhesive film obtained by using the polyimine resin or composition of the present invention is particularly suitable for the production of a multilayer flexible circuit substrate. In the following, a multilayer can be produced. The method of the flexible circuit board is described. The adhesive film is suitable for laminating on a flexible circuit board by a vacuum laminator. The flexible circuit board used here is needless to be mainly used for patterning processing. A conductor layer (circuit) on one or both sides of a substrate such as a polyester substrate, a polyimide substrate, a polyimide substrate, or a liquid crystal polymer substrate may be used for alternately forming circuits and A multilayer flexible circuit substrate in which a layer of an insulating layer is formed on one or both sides is further used in a plurality of layers. Further, from the viewpoint of the adhesion of the insulating layer to the circuit substrate, the circuit surface is preferably The roughening treatment is preliminarily applied to a surface treatment agent such as hydrogen peroxide/sulfuric acid, MEC Etch Bond (manufactured by MEC Co., Ltd.), etc. Commercially available vacuum laminating machines include, for example, Nikko Morton Stock Co., Ltd. A vacuum applicator manufactured by Nichigo-Morton Co., Ltd., a vacuum pressing laminator manufactured by Meiki Co., Ltd. , a roll-type dry coater manufactured by Hitachi Plant Technologies, Ltd., a vacuum laminator manufactured by Hitachi AIC, I nc, etc. Regarding the laminated layer, if the adhesive film has a protective film, After the protective film is removed, the adhesive film is pressed and heated on one side, and is layered on the circuit substrate. The condition of the lamination is to preheat the adhesive film and the circuit substrate as needed, and the pressing temperature is preferably 70 to 14 (TC, the pressing pressure is preferably 1 to 11 -49 to 201035172 kgf/cm2, and the air pressure is The laminate may be laminated under reduced pressure of 20 mmHg or less. In addition, the method of laminating may be batch mode or continuous use of a roll. After the adhesive film is laminated on the circuit board, it is cooled to near room temperature and then the support film is peeled off. The polyimine resin or composition laminated on the circuit board is heated, and when the composition is a thermosetting resin composition, it is cured by heating. The heating (hardening) condition is usually selected at 150 ° C. To 220 ° C, 20 minutes to 180 minutes, more preferably in the range of 160 ° C to 200 ° C, 30 to 120 minutes. In addition, if the support film has a release treatment or stripping of polyoxyl In the case of the layer, the support film may be peeled off after heat-hardening the thermosetting polyimide resin composition, or after heating (hardening) and drilling. The polyimine resin or polyfluorene of the present invention is formed. The hardening of the imine resin composition After the layer, drilling may be performed on the circuit substrate by a drill, a laser, a plasma, or a combination thereof, as needed, to form a via-hole or a through-hole. In particular, it is usually a laser using a carbon dioxide gas laser or a YAG laser (Yttrium Aluminum Garnet Laser). Secondly, surface treatment is applied to an insulating layer (a cured product of a polyimide or a polyimide resin composition). The surface treatment can be carried out by a method used in the desmear treatment, and can be carried out simultaneously with the desmear treatment. Usually, the chemical used in the desmear treatment is an oxidant. The "oxidant" includes, for example, Manganate (potassium permanganate, sodium permanganate, etc.), dichromate, ozone, hydrogen peroxide/sulfuric acid, nitric acid, etc. It is preferably used in the manufacture of a multilayer printed wiring board using a build-up method. It is generally used as an oxidizing agent for roughening -50-201035172 insulating layer, that is, an alkaline permanganic acid solution (for example, potassium permanganate or sodium permanganate in aqueous sodium hydroxide solution). Further, a treatment using a swelling agent may be applied. Further, after the treatment using the oxidizing agent, a neutralization treatment using a reducing agent is generally performed. After the surface treatment is applied, a conductor layer is formed by plating on the surface of the insulating layer. The conductor layer formation can be carried out by a combination of electroless plating and electrolytic plating. In addition, a plating resist which is inversely patterned with the conductor layer can be formed, and only electroless plating is used. The conductor layer is formed. After the conductor layer is formed and subjected to an annealing treatment at 150 to 200 ° C for 20 to 90 minutes, the peel strength of the conductor layer can be further increased and stabilized. A method of forming a conductor layer by pattern processing to form an electric circuit can be, for example, a subtractive process, a semi-additive process, or the like which is well known to those skilled in the art. In the case of the subtractive method, the thickness of the electroless copper-plating layer Ο w is 〇·1 to 3 μm, particularly preferably 0.3 to 2 μm. An etching resist is formed by forming an electroplating layer (panel plating layer) thereon to a thickness of 3 to 35 μm, preferably 5 to 20 μm. An etching solution such as ferric chloride (in) (ferric chloride) or copper chloride (bismuth) (copper chloride) is etched to form a conductor pattern, and then a "resistance resist" is removed to obtain a circuit board. Further, in the case of the semi-additive method, the electroless copper-clad layer is formed into an electroless copper-clad layer at a thickness of 0.1 to 3 μm, preferably 0.3 to 2 μm, to form a pattern resist (-51-201035172 pattern resist). The circuit board can be obtained by electroplating copper and then peeling off. a film in which a film of a support film is replaced by a heat-resistant resin layer (heat-resistant resin film), that is, a film composed of a polyimide film or a composition layer thereof (a layer of a layer) and a heat-resistant resin layer (layer C). It can be used as a base film for a flexible circuit board. Further, a film composed of a resin and a composition layer (layer thereof), a heat resistant resin layer (C layer), and a copper foil (D layer) can be similarly used as a base film of a flexible circuit board. In this case, the base film has a layer structure in the order of the ruthenium layer, the C layer, and the D layer. The base film described above and the heat resistant resin layer can be used to form a part of the flexible circuit board without being peeled off. A film in which an insulating layer (A' layer) composed of a cured product of the polyimine resin or the resin composition of the present invention is formed on a heat resistant resin layer (C layer) can be used as a base for a single-sided flexible circuit substrate. Film. Further, a film having a layer structure of the A' layer, the C layer, and the A' layer, and an A' layer, a C layer, and a copper foil (D layer) and having an A' layer, a C layer, and a D layer The film of the sequential layer structure can also be used similarly as a base film for a double-sided flexible circuit substrate. The "heat resistant resin" used for the heat resistant resin layer includes a polyimide resin, an aromatic polyamide resin, a polyamidolimine resin, a liquid crystal polymer, and the like. Particularly preferred are polyimine resin and polyamidolimine resin. Further, in terms of characteristics for the flexible circuit board, it is preferable to use a breaking strength of 100 MPa or more, an elongation at break of 5% or more, a thermal expansion coefficient of 20 ppm or less at 40 to 150 ° C, and The glass transition temperature Tg is -52 to 201035172 200 ° C or higher, or a decomposition temperature of 300 ° C or more. A heat-resistant resin that meets the above characteristics is suitable for use in a commercially available film-like heat-resistant resin: for example, a polyimide film "UPILEX-S" manufactured by Ube Industries, Ltd., Toray • Polyurethane film "KAPTON" manufactured by DuPont-Toray Co., Ltd., polyimide film "APICAL" manufactured by Kaneka Corporation, Teijin special film "ARAMICA" manufactured by Teijin Advanced Films O Limited, liquid crystal polymer film "VECSTAR" manufactured by Kuraray Co., Ltd., and Sumitomo Bakelite Co. , Ltd.) Polyetheretherketone film "SUMILITEFS-1100C" manufactured by the company. The thickness of the heat resistant resin layer is usually from 2 to 150 μm, preferably from 10 to 5 μm. A heat-resistant resin layer (layer C) may also be used by an applied surface treatment. The surface treatment includes: dry treatment of rough surface treatment, corona discharge treatment, plasma treatment, etc.; chemical treatment of solvent treatment, acid treatment, alkali treatment, etc.; and sandblasting treatment, mechanical honing treatment, and the like. In particular, from the viewpoint of adhesion to the layer A, it is preferred to apply a plasma processor. The base film for a single-sided flexible circuit board composed of the insulating layer (A') and the heat-resistant resin layer (C) can be produced in the following manner. First, a resin varnish obtained by dissolving the resin composition of the present invention in an organic solvent is prepared in the same manner as in the case of the above-mentioned adhesive film, and then the resin varnish is applied onto a heat-resistant resin film, and heated or blown with hot air or the like. The organic solvent is dried to form a polyimide layer or a resin composition layer. The conditions of the organic solvent -53 - 201035172, drying conditions, and the like are the same as those of the above-mentioned adhesive film. The thickness of the polyimide layer or the resin composition layer is preferably in the range of 5 to 15 μm. Next, the polyimide layer or the resin composition layer is dried by heating to form an insulating layer of a polyimide or a polyimide composition. The conditions for the heat hardening are usually selected from the range of from 20 minutes to 180 minutes at 150 ° C to 220 ° C, and more preferably from 30 ° to 120 minutes at from 160 ° C to 200 ° C. When a base film of a film for a double-sided flexible circuit board composed of three layers of an insulating layer (A' layer), a heat resistant resin layer (C) layer, and a copper foil (D layer) is to be produced, it is heat-resistant. A layer of a resin composition is formed on a copper-clad laminated film composed of a resin layer (C layer) and a copper foil (D layer), and then it may be produced in the same manner as described above. The "copper-clad laminate film" includes a cast double layer CCL (Copper-clad laminate), a sputtering double layer CCL, a laminated double layer CCL, and a three layer CCL. The "two-layer CCL" commercially available as a copper foil having a thickness of 12 μm and 18 μm is used: ESP ANEX SC (manufactured by Nippon Steel Chemicals Co., Ltd.); NEOFLEX I&lt;CM&gt; , NEOFLEX I &lt; LM &gt; (manufactured by Mitsui Chemicals, Inc.); S'PERFLEX (manufactured by Sumitomo M. et al Mining Co., Ltd.), and the like. In addition, the commercially available three-layer CCL includes: NIKAFLEX F-50VC1 (manufactured by Nikkan Industries Co., Ltd.), etc. -54- 201035172 Manufactured of an insulating layer (A' layer), a heat resistant resin layer (C layer), and an insulating layer ( The base film of the film for a double-sided flexible circuit board which consists of three layers of A' layer can be performed by the following. First, a resin varnish obtained by dissolving the polyimine resin or the resin composition of the present invention in an organic solvent is prepared in the same manner as in the case of the above-mentioned adhesive film, and then the resin varnish is applied onto the support film. The organic solvent is then dried by heating or blowing hot air or the like to form a polyimide layer or a resin composition layer. The conditions of the organic hydrazine solvent, drying conditions, and the like are the same as those of the above-mentioned adhesive film. The thickness of the polyimide layer or the resin composition layer is preferably in the range of 5 to 15 μm. Next, the adhesive film was laminated on both sides of the heat resistant resin film. The conditions for the buildup are the same as those described above. Further, when a resin composition layer is provided in advance on one surface of the heat-resistant film, only one side may be laminated. Next, the resin composition layer is heat-hardened to form an insulating layer of a layer of a polyimide or a resin composition. The conditions for heat hardening are usually selected from 150 ° C to 220 ° C ^ and selected from the range of from 20 minutes to 180 minutes, more preferably from 160 ° C to 200 ° C and from 30 to 120 minutes. Hereinafter, a method of manufacturing a flexible circuit board from a base film for a flexible circuit board will be described. In the case of a base film composed of the A' layer, the C layer, and the A' layer, first heat-hardened, and then drilled on a circuit board by a drill, a laser, a plasma, or the like to form a conduction. Double-sided through holes. In the case of a substrate film composed of the A' layer, the C layer and the D layer, the holes are drilled in the same manner to form micropores. Special -55- 201035172 is a drill that is usually used for lasers such as carbon dioxide gas lasers or YAG lasers (Yttrium Aluminum Garnet Laser). Next, the surface treatment of the insulating layer (the layer of the polyimide film or the layer of the resin composition) is applied. Regarding the surface treatment, it is the same as the above-mentioned adhesive film. After the surface treatment is performed, a conductor layer is formed by plating on the surface of the insulating layer. The formation of the conductor layer using plating is the same as that of the above-mentioned adhesive film. After the conductor layer is formed and subjected to a cold treatment at 150 to 200 ° C for 20 to 90 minutes, the peel strength of the conductor layer can be further increased and stabilized. Next, a conductor layer is formed by patterning to form a circuit as a flexible circuit substrate. When a base film composed of the A layer, the C layer, and the D layer is used, the copper foil of the D layer is also formed into a circuit. The method of forming the circuit can be, for example, a subtractive method, a semi-additive method, or the like which is well known to those skilled in the art. The details are the same as in the case of the aforementioned adhesive film. According to the single-sided or double-sided flexible circuit board obtained as described above, for example, the multilayer flexible circuit board can be produced by multilayering the adhesive film of the present invention. Further, the polyimine resin or resin composition of the present invention can also be used as a material for forming a stress relaxation layer between a semiconductor and a substrate. For example, in the same manner as described above, all or a part of the insulating layer of the uppermost portion of the substrate is formed by using the adhesive film obtained by using the polyimine resin or the resin composition of the present invention, and a semiconductor can be connected thereto. A semiconductor device in which a semiconductor and a substrate are adhered via a cured product of the polyimide resin or a cured product of the resin composition. In this case, the thickness of the polyimine resin layer of the adhesive film or the thickness of the tree-56-201035172 lipid composition layer can be appropriately selected in the range of 10 to ΙΟΟΟμηη. The polyimine resin or resin composition of the present invention can be formed by coating a conductor layer, and a circuit layer can be formed by simply forming a conductor layer on the insulating layer for stress relaxation provided on the substrate. <<Embodiment>> Next, the present invention will be more specifically described by way of examples and comparative examples. In the following, "parts" and "%" mean "quality" unless otherwise stated. 〔 [Example 1] A raw material as shown in Table 1 was fed into a flask equipped with a stirring device, a thermometer and a condenser. While stirring, the temperature was raised to 80 ° C under the heat of the heat, and it was dissolved and reacted at this temperature for 1 hour, and further heated to 160 ° C for 2 hours, and then reacted at this temperature. 5 hours. The reaction is carried out simultaneously with the foaming of the carbon dioxide gas to make the inside of the system a transparent liquid which is brown. As a result, a solution of a polyethylenimine® resin (A1) having a resin solid content of 16% and a solution acid value of 2.1 (KO H mg/g) at a viscosity of 7 Pa·s at 25 ° C (polyimine) was obtained. The resin is dissolved in the resin composition of γ-butyrolactone). In addition, the acid value of the solid component of the resin is 13.1 (ΚΟΗ mg/g). Further, as a result of measurement by gel permeation chromatography (GPC), the weight average molecular weight was 29,000. -57- 201035172 Table 1 Raw Material Name (abbreviated) Raw Material Molecular Weight Feeding Molar Number Feeding Weight (g) MDI 250 0.25 62.5 DMBPDI 264 0.74 195.4 TMA 192 0.52 99.8 BTDA 322 0.1 32.2 TMAH 198 0.3 59.4 HCAHQ 324.3 0.08 25.9 GBL (Reaction solvent) 2070.0 Remarks of Table 1 (the same applies hereinafter): MDI: Diphenylmethane diisocyanate DMBPDI: dimethylbiphenyl diisocyanate (structure shown below)

TMA:偏苯三甲酸酐 BTDA:二苯甲酮四甲酸二酐 TMAH :氫化偏苯三甲酸酐(如下所示結構)TMA: trimellitic anhydride BTDA: benzophenone tetracarboxylic dianhydride TMAH : hydrogenated trimellitic anhydride (structure shown below)

HCAHQ: 9,10 -二氫-9-氧雜-10 -磷菲-10-氧化物與氫 醌之反應產物(如下所示結構) -58- 201035172HCAHQ: Reaction product of 9,10-dihydro-9-oxa-10-phosphonium-10-oxide with hydroquinone (structure shown below) -58- 201035172

0=P-〇/ HO0=P-〇/ HO

OH GBL: γ-丁內酯 將所獲得之聚醯亞胺樹脂(Al)之溶液將塗佈於KBr 板,並測定經揮發溶劑後的試料之紅外線吸收光譜(第1 圖)結果,屬於異氰酸酯基之特性吸收的2270 cnT1完全消 失,且在725 cm·1、1 780 cm·1及1 720 cm·1確認到屬於醯 〇 亞胺環之特性吸收。另外,碳酸氣之產生量藉由燒瓶內容 物重量之變化追蹤結果爲80.96克(1.84莫耳)。因此, 可下結論爲羧酸及酸酐基之總量的1.84莫耳之總量已轉換 成醯亞胺鍵及醯胺鍵。並且,經實施使用C13-NMR (第2 圖)的分析結果,確認到其爲以如下所示結構所代表之聚 醯亞胺樹脂。除此之外,以第1圖展示聚醯亞胺樹脂(A1 )之紅外線吸收光譜圖,以第2圖展示C13-NMR圖。OH GBL: γ-butyrolactone The solution of the obtained polyimine resin (Al) is applied to a KBr plate, and the infrared absorption spectrum (Fig. 1) of the sample after the volatile solvent is measured, which is an isocyanate. The 2270 cnT1 absorbed by the characteristic disappeared completely, and the characteristic absorption of the quinone ring was confirmed at 725 cm·1, 1 780 cm·1 and 1 720 cm·1. Further, the amount of carbon dioxide gas generated was 80.96 g (1.84 m) by the change in the weight of the contents of the flask. Therefore, it can be concluded that the total amount of 1.84 moles of the total amount of the carboxylic acid and the acid anhydride group has been converted into a quinone bond and a guanamine bond. Further, as a result of analysis using C13-NMR (Fig. 2), it was confirmed that it was a polyimine resin represented by the structure shown below. In addition, the infrared absorption spectrum of the polyimine resin (A1) is shown in Fig. 1, and the C13-NMR chart is shown in Fig. 2.

但是上述結構中之八!至A6的結構單元是如下所示之 式。此外,al至a6代表作爲結構單元的存在比例之莫耳比 ,且可下結論爲如下所示。a7爲重複單元,且括弧內之各 結構單元並不受限於其之順序或重複數而無規地鍵結著( 以下相同):· -59- 201035172 al : a2 : a3 : a4 : a5 : a6=24.4: 42.2: 8.1: 8.2: 14.3:2.7。 結構單元.AlBut eight of the above structures! The structural unit to A6 is as follows. Further, a1 to a6 represent the molar ratio of the existence ratio of the structural unit, and can be concluded as follows. A7 is a repeating unit, and each structural unit in parentheses is not randomly bound without being limited by its order or repetition number (the same below): · -59- 201035172 al : a2 : a3 : a4 : a5 : A6=24.4: 42.2: 8.1: 8.2: 14.3:2.7. Structural unit.Al

結構單元A2 H3CStructural unit A2 H3C

結構單元A3Structural unit A3

結構單元A5 結構單元Α6Structural unit A5 structural unit Α6

在上述結構單元Αι至A6中,*代表對於分子主鏈之 鍵結點。 根據下列方法評估所獲得之聚醯亞胺樹脂(A )之溶液 的溶劑溶解性、儲存穩定性、塗佈作業性、塗膜造膜性( -60- 201035172 表面平滑性)、耐熱性、機械物性、難燃性及尺寸穩定性 。其之結果如表5所示。 (1 )溶劑溶解性及儲存穩定性 溶劑溶解性試驗及儲存穩定性試驗是以評估剛調製後 之聚醯亞胺樹脂(A1 )之溶劑溶解性、及經長期靜置後之 溶劑溶解性的方式來實施。將剛調製後之聚醯亞胺樹脂組 成物以伽瑪-丁內酯調整成樹脂濃度爲10%之溶液,然後將 _其之25毫升放入於附蓋之玻璃瓶,觀察其之外觀,並以下 〇 列評估基準進行評估。將其結果作爲剛調製後的聚醯亞胺 樹脂組成物之溶劑溶解性。然後,將裝有聚醯亞胺樹脂組 成物的附蓋之玻璃瓶在4 0 °c下靜置30天後,觀察其之外 觀,並以下列評估基準進行評估以作爲經時溶劑溶解性: 〇:樹脂溶液爲透明且有流動性; △:雖然有流動性,但是會發生渾濁; X :無透明感也無流動性。 (2 )塗佈作業性之評估 ® 將聚醯亞胺樹脂(A1)在鏟錫鐵皮板上以0.1 52 mm 之塗膜器在室溫進行塗佈。然後,就塗佈外觀以下列評估 基準進行評估。除此之外,若在下列實施例及比較例中所 調製得之樹脂溶液中摻混固體成份時,則將樹脂溶液溫度 提高至120°C以使固體成份溶解後進行塗佈。 〇:爲透明且表面光澤之平坦的面; △:雖然爲不透明,但是爲平坦的面; X :不透明且表面爲非平坦的面。 -61 - 201035172 (3 )塗膜造膜性(表面平滑性)之評估 將聚醯亞胺樹脂(A1)在鍍錫鐵皮板上以塗膜器塗佈 成乾燥後之膜厚爲30μηι後,在110 °C下乾燥30分鐘以製 得試驗片。將該試驗片在25 °C下放置24小時,且以下列 評估基準評估塗膜外觀: 〇:在塗膜並未觀察到龜裂等之異常; △:在塗膜觀察到一些龜裂; X :在塗膜全面發生龜裂。 (4 )耐熱性之評估 將聚醯亞胺樹脂(A1)在經積層銅箔的玻纖環氧樹脂 基板上塗佈成硬化後之膜厚爲30 μιη,然後以200 °C之乾燥 機中乾燥60分鐘後,冷卻至室溫以製得試驗片。將該試驗 片浸漬於260°C之熔融錫焊浴歷時30秒鐘後,冷卻於室溫 。實施合計3次之錫焊浴浸漬操作,然後就硬化塗膜之外 觀以下列評估基準進行評估: 〇:在塗膜並未觀察到外觀異常; △:在塗膜觀察到爲一些膨脹、剝離等異常; X :在塗膜全面觀察到膨脹、剝離等異常。 (5 )機械物性之評估 機械物性是以實施塗膜(薄膜)之拉伸試驗來測定彈 性模數(elastic modulus)、斷裂強度、及斷裂伸度之方法 進行評估。 &lt;試驗片之製造&gt; 將聚醯亞胺樹脂(A1)在鍍錫鐵皮基板上塗佈成所獲 -62- 201035172 得塗膜之膜厚爲30μιη。其次,將該塗佈板在50°C之乾燥 機歷時30分鐘、在l〇(TC之乾燥機歷時30分鐘及在200 °C 之乾燥機歷時60分鐘加以乾燥以製得塗膜(薄膜)。冷卻 至室溫後,將塗膜(薄膜)切成所要之大小,並從基板分 離以作爲測定用試料。 &lt;拉伸試驗測定方法&gt; 製造5片測定用試料,以下述之條件進行拉伸試驗, 以測定彈性模數、斷裂強度及斷裂伸度。彈性模數値愈低 〇 ,則表示爲具有愈優越的柔軟性之塗膜。斷裂伸度値愈高 ,則表示爲具有愈優越的柔軟性之塗膜。並且,斷裂強度 値愈高,則表示爲愈強韌之塗膜。 測定機器:Toyo Baldwin Co.,Ltd.製造之 TENSILON 試樣形狀:l〇mm χ 70 mm 夾具間隔:2 0 m m 拉伸速度:10 mm/min 測定大氣:22°C、45% RH Θ ( 6 ) Tg及線性膨脹係數之測定 &lt;試驗用試驗片之製造&gt; 將聚醯亞胺樹脂(A1)在鍍錫鐵皮基板上塗佈成經硬 化後之膜厚爲20μιη,然後在70°C之乾燥機中乾燥20分鐘 後,在2 0 0 °C下歷時1小時使其硬化並經冷卻後,將剝離 之硬化塗膜切成寬度爲5mm、長度爲30mm以作爲測定用 試料。 -63- 201035172 &lt;Tg及線性膨脹係數測定方法&gt; 使用精工電子工業股份有限公司(Seik Inc.)製造之熱分析系統TMA-SS6000,在試料 、升溫速度爲l〇°C /分鐘、荷重爲30 mN之條 (熱機械分析:Thermal Mechanical Analysis 。此外,Tg則由在TMA測定的溫度-尺寸變 之變極點且以其之溫度作爲Tg。並且,使用 數之溫度領域則由在50至220 °C下的試料長 。Tg愈高,然後表示具有愈優越的耐熱性, 愈小,然後表示具有愈優越的尺寸穩定性。 (7 )難燃性評估 將聚醯亞胺樹脂(A1)在鍍錫鐵皮基板 化後之膜厚爲20μιη,並在70°C之乾燥機中章 ,在200 °C下歷時1小時使其硬化並加以冷 的硬化塗膜切成寬度爲10 mm、長度爲70 m ’以作爲測定用試料。將該長方形狀試料之 末端固定於夾具,另一方末端則朝下方向架 垂直。然後’用打火機點燃該下部末端,並 燒狀態。重複進行該操作5次,並以下列基 ◎ : 5次中之所有試料經點燃後不會燃 己媳滅; 〇:5次中有2至4之試料經點燃後不會 自己熄滅; △ : 5次中有1次之試料經點燃後不會 〇 Instruments 長度爲1〇 mm 件下,以TMA ;)法進行測定 化曲線求出其 於線性膨脹係 度之變位測定 線性膨脹係數 上塗佈成經硬 g燥20分鐘後 卻後,將剝離 m之長方形狀 長度方向的一 設成與地面成 觀察試料之燃 準進行評估: 燒至夾具而自 燃燒至夾具而 燃燒至夾具而 -64 - 201035172 自己熄滅; X : 5次中之所有試料經點燃後會完全燃燒至夾具。 〔實施例2〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入如表 2所示之原料。一面攪拌一面在注意散熱下升溫至8 0°C, 並在此溫度下歷時1小時使其溶解、反應,更再以歷時2 小時升溫至1 60°C後,在此溫度下使其進行反應5小時。 反應是與碳酸氣之發泡同時進行,使得系統內變成爲茶色 〇 之透明液體。結果獲得在25 °c之黏度爲7 Pa · s之樹脂固 體成份爲16%且溶液酸價爲1.8(KOH mg/g)之聚醯亞胺 樹脂(A2)之溶液(聚醯亞胺樹脂溶解於γ-丁內酯之樹脂 組成物)。除此之外,樹脂之固體成份的酸價爲11_25( KOH mg/g)。此外,以凝膠透層析法(GPC)測定結果’ 其重量平均分子量爲39000。 表2 原料名(簡稱) 原料之分子量 飼入莫耳數 飼入重量(克) MDI 250 0.25 62.5 DMBPDI 264 0.74 195.4 TMA 192 0.52 99.8 BTDA 322 0.1 32.2 TMAH 198 0.3 59.4 BPF 200 0.08 16.0 GBL (反應溶劑) 2017.8 表2之備註(以下相同):In the above structural units Αι to A6, * represents a bond point to the molecular main chain. The solvent solubility, storage stability, coating workability, film film forming property (-60-201035172 surface smoothness), heat resistance, and mechanical properties of the obtained polyimide resin (A) solution were evaluated according to the following methods. Physical properties, flame retardancy and dimensional stability. The results are shown in Table 5. (1) Solvent solubility and storage stability The solvent solubility test and the storage stability test are to evaluate the solvent solubility of the polyimide resin (A1) immediately after preparation and the solvent solubility after standing for a long period of time. Way to implement. The newly prepared polyimine resin composition was adjusted to a solution having a resin concentration of 10% with gamma-butyrolactone, and then 25 ml of the solution was placed in a covered glass bottle to observe the appearance thereof. The assessment is based on the following evaluation criteria. The result was taken as the solvent solubility of the polyimine resin composition immediately after preparation. Then, the covered glass bottle containing the composition of the polyimide resin was allowed to stand at 40 ° C for 30 days, and the appearance thereof was observed and evaluated as the solvent solubility over time by the following evaluation criteria: 〇: The resin solution is transparent and fluid; △: Although there is fluidity, turbidity occurs; X: no transparency or fluidity. (2) Evaluation of coating workability ■ Polyimide resin (A1) was coated on a tinplate with a 0.1 52 mm coater at room temperature. Then, the appearance of the coating was evaluated on the basis of the following evaluation criteria. In addition, when the solid content was blended in the resin solution prepared in the following examples and comparative examples, the temperature of the resin solution was raised to 120 ° C to dissolve the solid component and then applied. 〇: a flat surface that is transparent and has a glossy surface; Δ: a flat surface although opaque; X: an opaque surface with a non-flat surface. -61 - 201035172 (3) Evaluation of film-forming property (surface smoothness) After the polyimide film (A1) was coated on a tinplate with a film coater to a dry film thickness of 30 μm, The test piece was prepared by drying at 110 ° C for 30 minutes. The test piece was allowed to stand at 25 ° C for 24 hours, and the appearance of the coating film was evaluated on the following evaluation criteria: 〇: no abnormality such as cracks was observed in the coating film; Δ: some cracks were observed in the coating film; : Cracks occur in the entire film. (4) Evaluation of heat resistance The polyimide resin (A1) was coated on a glass epoxy resin substrate of a laminated copper foil to have a film thickness of 30 μm, and then dried in a dryer at 200 °C. After drying for 60 minutes, it was cooled to room temperature to prepare a test piece. The test piece was immersed in a molten solder bath at 260 ° C for 30 seconds, and then cooled to room temperature. A total of three times of solder bath immersion operation was carried out, and then the appearance of the hardened coating film was evaluated on the following evaluation criteria: 〇: no abnormality was observed in the coating film; Δ: some expansion, peeling, etc. were observed in the coating film. Abnormal; X: Abnormalities such as swelling and peeling were observed in the coating film. (5) Evaluation of mechanical properties The mechanical properties were evaluated by a tensile test of a coating film (film) to determine elastic modulus, breaking strength, and elongation at break. &lt;Production of test piece&gt; The polyimide film (A1) was applied onto a tinplate substrate to obtain a film thickness of 30 μm from -62 to 201035172. Next, the coated plate was dried in a dryer at 50 ° C for 30 minutes, and dried at a drying machine for 30 minutes and a dryer at 200 ° C for 60 minutes to prepare a coating film (film). After cooling to room temperature, the coating film (film) was cut into a desired size and separated from the substrate to be used as a sample for measurement. <Tens test method> Five samples for measurement were produced, and the following conditions were carried out. Tensile test to determine the modulus of elasticity, breaking strength and elongation at break. The elastic modulus is lower than that of the elastic modulus, which means that it has a superior softness. The higher the elongation at break, the higher the elongation. A film of superior softness, and the higher the breaking strength, the stronger the film. The measuring machine: TENSILON of Toyo Baldwin Co., Ltd. Shape: l〇mm χ 70 mm Interval: 20 mm Stretching speed: 10 mm/min Measured atmosphere: 22 ° C, 45% RH Θ ( 6 ) Tg and measurement of linear expansion coefficient &lt;Manufacture of test piece for test &gt; Polyimine resin (A1) Coating on a tinplate substrate to form a cured film thickness 20 μm, and then dried in a dryer at 70 ° C for 20 minutes, after hardening at 200 ° C for 1 hour and after cooling, the peeled hardened coating film was cut into a width of 5 mm and a length of 30 mm. As a sample for measurement. -63- 201035172 &lt;Tg and method for measuring linear expansion coefficient&gt; Using a thermal analysis system TMA-SS6000 manufactured by Seik Inc., the sample and the temperature increase rate were l〇°. C / min, load 30 mN strip (thermo-mechanical analysis: Thermal Mechanical Analysis. In addition, Tg is changed from the temperature-size measured at TMA to the temperature and Tg at its temperature. The sample length is from 50 to 220 ° C. The higher the Tg, then the more excellent the heat resistance, the smaller the size, and then the better the dimensional stability. (7) The evaluation of flame retardancy will be The amine resin (A1) has a film thickness of 20 μm after the tin-plated iron substrate is formed, and is cured in a dryer at 70 ° C for 1 hour at 200 ° C and cut into a width by a cold hardened coating film. It is 10 mm and the length is 70 m' The sample is fixed. The end of the rectangular sample is fixed to the jig, and the other end is perpendicular to the lower direction. Then, the lower end is ignited with a lighter and burned. This operation is repeated 5 times, and the following base is used. : All the samples in 5 times will not ignite after ignition; 〇: 2 to 4 of the 5 samples will not extinguish themselves after ignition; △: 1 of 5 times after the sample is ignited After the length of the Instruments is 1〇mm, the TMA;) method is used to determine the linear expansion coefficient of the linear expansion coefficient, and the coating is applied to the hard g dry for 20 minutes. One of the longitudinal directions of the stripping m is set to evaluate the burning of the sample with the ground surface: burn to the jig and burn to the jig from the burning to the jig -64 - 201035172 self-extinguishing; X: all the samples in 5 times After ignition, it will completely burn to the fixture. [Example 2] A raw material as shown in Table 2 was fed into a flask equipped with a stirring device, a thermometer and a condenser. While stirring, the temperature is raised to 80 ° C under the heat of the heat, and it is dissolved and reacted at this temperature for 1 hour, and further heated to 1 60 ° C for 2 hours, and then reacted at this temperature. 5 hours. The reaction is carried out simultaneously with the foaming of the carbonic acid gas, so that the system becomes a transparent liquid of brown enamel. As a result, a solution of a polyimine resin (A2) having a resin solid content of 16% and a solution acid value of 1.8 (KOH mg/g) having a viscosity of 7 Pa·s at 25 ° C was obtained (polyimine resin was dissolved). Resin composition of γ-butyrolactone). In addition, the solid content of the resin has an acid value of 11_25 (KOH mg/g). Further, the result was measured by gel permeation chromatography (GPC), and its weight average molecular weight was 39,000. Table 2 Raw material name (abbreviation) Raw material molecular weight Feeding molar number Feeding weight (g) MDI 250 0.25 62.5 DMBPDI 264 0.74 195.4 TMA 192 0.52 99.8 BTDA 322 0.1 32.2 TMAH 198 0.3 59.4 BPF 200 0.08 16.0 GBL (reaction solvent) 2017.8 Remarks of Table 2 (the same below):

BPF :雙酚F 將所獲得之聚醯亞胺樹脂(A2)之溶液塗佈於KBr板 -65- 201035172 ,並測定經揮發溶劑後的試料之紅外線吸收光譜結果,屬 於異氰酸酯基之特性吸收的2270 cnT1完全消失,且在725 cnT1、1 7 8 0 crrT1及1 720 cnT1確認到屬於醯亞胺環之特性 吸收。此外,碳酸氣之產生量藉由燒瓶飼入重量之變化追 蹤結果爲80.96克(1.84莫耳)。因此,可下結論爲與實 施例1相同地異氰酸酯基之總量已轉換成醯亞胺鍵及醯胺 鍵且爲如下所示之代表結構式: h〇-^^〇XhBPF: bisphenol F The solution of the obtained polyimine resin (A2) was applied to KBr plate-65-201035172, and the infrared absorption spectrum of the sample after the volatile solvent was measured, which was characteristic absorption of the isocyanate group. 2270 cnT1 completely disappeared, and the characteristic absorption of the imidium ring was confirmed at 725 cnT1, 1 7 8 0 crrT1 and 1 720 cnT1. Further, the amount of carbon dioxide gas produced was 80.96 g (1.84 m) as a result of the change in the weight of the flask feed. Therefore, it can be concluded that the total amount of isocyanate groups in the same manner as in Example 1 has been converted into a quinone bond and a guanamine bond and is represented by the following structural formula: h〇-^^〇Xh

-R'-H 又。 a7 式中的結構單元人1至a6的結構單元分別與揭述於實 施例1的結構單元相同。此外,al至a7代表作爲結構單元 的存在比例之莫耳比,且可下結論爲如下所示: al : a2 : a3 : a4 : a5 : a6=24.4: 42.2: 8.1: 8.2: 14.3: 2.7。 所獲得之聚醯亞胺樹脂(A2 )之溶液的評估以與實施 例1相同的方式進行評估,其之結果如表5所示。 〔實施例3〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入如表 3所示之原料。一面攪拌一面在注意散熱下升溫至80°C ’ 並在此溫度下歷時1小時使其溶解、反應,更再以歷時2 小時升溫至1 6 0 °C後,在此溫度下使其進行反應5小時。 反應是與碳酸氣之發泡同時進行,使得系統內變成爲茶色 之透明液體。結果獲得在25 °C之黏度爲8 Pa,s之樹脂固 體成份爲16%且溶液酸價爲2.3 ( KOH mg/g )之聚醯亞胺 -66- 201035172 樹脂(A3 )之溶液(聚醯亞胺樹脂溶解於γ·丁內酯之樹脂 組成物)。除此之外,樹脂之固體成份的酸價爲14.3( ΚΟ Η mg/g)。此外,以凝膠透層析法(GPC )測定結果,其重 量平均分子量爲3 5000。 表3 原料名(簡稱) 原料之分子量 飼入莫耳數 飼入重量(克) MDI 250 0.25 62.5 DMBPDI 264 0.75 198.0 TMA 192 0.6 115.2 TMAH 198 0.4 79.2 BP 200 0.1 18.6 GBL (反應溶劑) 2023.9-R'-H again. The structural units of the structural units 1 to a6 in the formula a7 are the same as those of the structural unit disclosed in the first embodiment. Further, a1 to a7 represent the molar ratio of the existence ratio of the structural unit, and can be concluded as follows: al : a2 : a3 : a4 : a5 : a6 = 24.4 : 42.2 : 8.1 : 8.2 : 14.3 : 2.7 . The evaluation of the solution of the obtained polyimine resin (A2) was evaluated in the same manner as in Example 1, and the results are shown in Table 5. [Example 3] A raw material as shown in Table 3 was fed into a flask equipped with a stirring device, a thermometer and a condenser. While stirring, the temperature is raised to 80 ° C during heat dissipation, and it is dissolved and reacted at this temperature for 1 hour, and further heated to 160 ° C for 2 hours, and then reacted at this temperature. 5 hours. The reaction is carried out simultaneously with the foaming of the carbonic acid gas, so that the inside of the system becomes a transparent liquid of brown color. As a result, a solution of polyethylenimine-66-201035172 resin (A3) having a viscosity of 8 Pa at 25 ° C and a resin solid content of 16% and a solution acid value of 2.3 (KOH mg/g) was obtained. The imine resin is dissolved in the resin composition of γ·butyrolactone). In addition, the acid value of the solid component of the resin was 14.3 (ΚΟ Η mg/g). Further, the weight average molecular weight was 35,000 as measured by gel permeation chromatography (GPC). Table 3 Raw material name (abbreviation) Molecular weight of raw material Feeding molars Feeding weight (g) MDI 250 0.25 62.5 DMBPDI 264 0.75 198.0 TMA 192 0.6 115.2 TMAH 198 0.4 79.2 BP 200 0.1 18.6 GBL (reaction solvent) 2023.9

〇 BP:聯苯酚 將所獲得之聚醯亞胺樹脂(A3 )之溶液塗佈於KBr板 ,並測定經揮發溶劑後的試料之紅外線吸收光譜結果,屬 於異氰酸酯基之特性吸收的2270 cnT1完全消失,且在725 cm·1、1 7 8 0 cm·1及1 7 2 0 c πΓ 1確認到屬於醯亞胺環之特性 吸收。此外·,碳酸氣之產生量藉由燒瓶飼入重量之變化追 蹤結果爲80.96克(1.84莫耳)。因此,可下結論爲與實 施例1相同地異氰酸酯基之總量已轉換成醯亞胺鍵及醯胺 鍵且爲如下所示之代表結構式: 又 -a2- a1 a2 -A4- -a5- a4 a5〇BP: biphenol was applied to a KBr plate by a solution of the obtained polyimine resin (A3), and the infrared absorption spectrum of the sample after the volatile solvent was measured, and the 2270 cnT1 which is characteristic absorption of the isocyanate group completely disappeared. And the characteristic absorption of the quinone imine ring was confirmed at 725 cm·1, 1 7 8 0 cm·1 and 1 7 2 0 c πΓ 1 . In addition, the amount of carbonation gas produced was 80.96 g (1.84 m) by the change in the weight of the flask feed. Therefore, it can be concluded that the total amount of isocyanate groups in the same manner as in Example 1 has been converted into a quinone bond and a guanamine bond and is represented by the following structural formula: -a2- a1 a2 -A4- -a5- A4 a5

-R—N a7 式中的結構單元Al、a2、a4及a5的結構單元分別與 揭述於實施例1的結構單元相同。此外,al、a2、a4及a5 -67- 201035172 作爲結構單元的存在比例之莫耳比’且可下結論爲如了所 示: al : a2: a4: a5 = 30: 45: 10 : 15。 所獲得之聚醯亞胺樹脂(A3 )之溶液的評估以與實施 例1相同的方式進行評估,其之結果如表5所示。 〔實施例4〕 在配備擾样裝置、溫度計及冷凝器之燒瓶中飼入如表 4所示之原料。一面攪拌一面在注意散熱下升溫至80°C, 並在此溫度下歷時1小時使其溶解、反應,更再以歷時2 小時升溫至1 6 0 °C後,在此溫度下使其進行反應5小時。 反應是與碳酸氣之發泡同時進行,使得系統內變成爲茶色 之透明液體。結果獲得在25°C之黏度爲l〇Pa· s之樹脂固 體成份爲16%且溶液酸價爲2.7(KOH mg/g)之聚醯亞胺 樹脂(A4 )之溶液(聚醯亞胺樹脂溶解於γ-丁內酯之樹脂 組成物)。除此之外,樹脂之固體成份的酸價爲16.9( Κ0Η mg/g )。此外,以凝膠透層析法(GPC )測定結果’其重 量平均分子量爲2 3 000。 表4 原料名(簡稱) 原料之分子量 飼入莫耳數 飼入重量(克) TDI 174 0.25 43.5 DMBPDI 264 0.74 195.4 TMA 192 0.52 99.8 BTDA 322 0.1 32.2 TMAH 198 0.3 59.4 HCAHQ 324.3 0.08 25.9 GBL (反應溶劑) 1970.2 -68- 201035172 所獲得之聚醯亞胺樹脂(A4)之溶液將塗佈於KBr板 ,並測定經揮發溶劑後@試料&amp; &amp; #線1^收%譜結果’屬 於異氰酸酯基之特性吸收的2270 cnT1完全消失’且在725 cm-1、1780 cm'1、1720 cnT1確認到屬於醯亞胺環之特性吸 收。此外,碳酸氣之產生量藉由燒瓶飼入重量之變化追蹤 結果爲80.96克(1.84莫耳)。因此,可下結論爲與實施 例1相同地異氰酸酯基之總量已轉換成醯亞胺鍵及醯胺鍵 且爲如下所示之代表結構式:The structural units of the structural units A1, a2, a4, and a5 in the formula -R-N a7 are the same as those in the structural unit disclosed in the first embodiment. Further, al, a2, a4, and a5 -67 to 201035172 are the molar ratios of the existence ratio of the structural unit and can be concluded as follows: al : a2: a4: a5 = 30: 45: 10 : 15. The evaluation of the solution of the obtained polyimine resin (A3) was evaluated in the same manner as in Example 1, and the results are shown in Table 5. [Example 4] A raw material as shown in Table 4 was fed into a flask equipped with a scrambler, a thermometer and a condenser. While stirring, the temperature was raised to 80 ° C under the heat of the heat, and it was dissolved and reacted at this temperature for 1 hour, and further heated to 160 ° C for 2 hours, and then reacted at this temperature. 5 hours. The reaction is carried out simultaneously with the foaming of the carbonic acid gas, so that the inside of the system becomes a transparent liquid of brown color. As a result, a solution of a polyimine resin (A4) having a resin solid content of 16% by weight and a solution acid value of 2.7 (KOH mg/g) at a viscosity of 25 ° C (polyimine resin) was obtained. A resin composition dissolved in γ-butyrolactone). In addition, the acid value of the solid component of the resin was 16.9 (Κ0Η mg/g). Further, the result was measured by gel permeation chromatography (GPC), which had a weight average molecular weight of 23,000. Table 4 Raw material name (abbreviation) Raw material molecular weight Feeding molar number Feeding weight (g) TDI 174 0.25 43.5 DMBPDI 264 0.74 195.4 TMA 192 0.52 99.8 BTDA 322 0.1 32.2 TMAH 198 0.3 59.4 HCAHQ 324.3 0.08 25.9 GBL (reaction solvent) 1970.2 -68- 201035172 The solution of the obtained polyimine resin (A4) will be applied to a KBr plate, and after the volatile solvent is determined, @sample &amp;&amp;&amp;#线1^%% spectrum result 'is an isocyanate group The characteristic absorption of 2270 cnT1 completely disappeared and the characteristic absorption of the quinone imine ring was confirmed at 725 cm-1, 1780 cm'1, and 1720 cnT1. In addition, the amount of carbon dioxide produced was 80.96 g (1.84 m) as a function of the change in the weight of the flask feed. Therefore, it can be concluded that the total amount of isocyanate groups in the same manner as in Example 1 has been converted into a quinone bond and a guanamine bond and is a representative structural formula as shown below:

〇 式中的結構單元A]、A2及A3的結構單元是分別與揭 述於實施例1的結構單元相同。結構單元A’4、A’5、A’6 以如下所示之式所代表的結構單元。此外,al至a3、及a,4 至a,6作爲結構單元的存在比例之莫耳比,且可下結論爲 如下所示: al: a2: a3: a,4: a,5: a,6 = 24.4: 42.2: 8.1: 8.2 :14.3: 2.7 。 -69- 201035172 結構單元A'4The structural units of the structural units A], A2, and A3 in the formula are the same as those of the structural unit disclosed in the first embodiment. The structural unit A'4, A'5, A'6 is a structural unit represented by the following formula. In addition, a to a3, and a, 4 to a, 6 are the molar ratios of the existence ratio of the structural unit, and can be concluded as follows: al: a2: a3: a, 4: a, 5: a, 6 = 24.4: 42.2: 8.1: 8.2: 14.3: 2.7. -69- 201035172 Structural unit A'4

所獲得之聚醯亞胺樹脂(A4 )之溶液的評估是以與實 施例1相同的方式進行評估,其之結果如表5所示。 表5 實施例 實施例1 實施例2 實施例3 實施例4 聚醯亞胺樹脂 A1 A2 A3 A4 溶劑溶解性 〇 〇 〇 〇 經時溶劑溶解性 〇 〇 〇 〇 塗佈作業性 〇 〇 〇 〇 塗膜造膜性 〇 〇 〇 〇 耐熱性 〇 〇 〇 〇 機械物性 斷裂強度(MPa) 170 168 160 195 斷裂伸度(%) 54 48 55 25 彈性模數(MPa) 3500 3300 3400 4000 Tg (°C) 280 275 278 268 線性膨脹係數(:Ppm/°C) 20 21 20 28 難燃性 ◎ 〇 〇 ◎ -70- 201035172 〔實施例5至7〕 以如表6所示之配方進行調製,以獲得本發明之熱硬 化性樹脂組成物1至4。實施與實施例1相同之評估,其 之結果如表7所示。但是’在表6中之配方數値是代表樹 脂固體成份量。 表6 實施例5 實施例6 實施例7 實施例8 熱硬化性樹脂組成物 1 2 3 4 聚醯亞胺樹脂 A1 90 90 A2 90 A4 90 環氧樹脂 HP4032 10 HP4700 10 10 10 EMZ 0.5 0.5 0.5 0.5 表6之備註: HP4032: 1,6 -二羥基萘之環氧化樹脂。環氧當量=141 Q 。其之代表結構如下列通式所示:The evaluation of the solution of the obtained polyimine resin (A4) was carried out in the same manner as in Example 1, and the results are shown in Table 5. Table 5 Examples Example 1 Example 2 Example 3 Example 4 Polyimine resin A1 A2 A3 A4 Solvent solubility 溶剂 Solvent solubility 〇〇〇〇 Coating work 〇〇〇〇 coating Membrane membranous heat resistance 〇〇〇〇 Mechanical physical rupture strength (MPa) 170 168 160 195 Elongation at break (%) 54 48 55 25 Elastic modulus (MPa) 3500 3300 3400 4000 Tg (°C) 280 275 278 268 Linear expansion coefficient (: Ppm / ° C) 20 21 20 28 Flame retardancy ◎ 〇〇 ◎ -70- 201035172 [Examples 5 to 7] Modifications were made as shown in Table 6 to obtain this The thermosetting resin compositions 1 to 4 of the invention. The same evaluation as in Example 1 was carried out, and the results are shown in Table 7. However, the number of formulas in Table 6 represents the amount of resin solids. Table 6 Example 5 Example 6 Example 7 Example 8 Thermosetting resin composition 1 2 3 4 Polyimine resin A1 90 90 A2 90 A4 90 Epoxy resin HP4032 10 HP4700 10 10 10 EMZ 0.5 0.5 0.5 0.5 Remarks in Table 6: HP4032: 1,6-dihydroxynaphthalene epoxidized resin. Epoxy equivalent = 141 Q. Its representative structure is as shown in the following formula:

HP4700: 2,7-二羥基萘之環氧化樹脂之酣醒清漆體。 環氧當量=163。其之代表結構如下列通式所示: -71- 201035172HP4700: Awake varnish of 2,7-dihydroxynaphthalene epoxidized resin. Epoxy equivalent = 163. Its representative structure is as shown in the following formula: -71- 201035172

EMZ :硬化觸媒、2-乙基-4-甲基咪唑。 表7 實施例5 實施例6 實施例7 實施例8 熱硬化性樹脂組成物 1 2 3 4 溶劑溶解性 〇 〇 〇 〇 經時溶劑溶解性 〇 〇 〇 〇 塗佈作業性 〇 〇 〇 〇 塗膜造膜1 生 〇 〇 〇 〇 耐熱性 〇 〇 〇 〇 機械物性 斷裂強度(MPa) 165 168 160 195 斷裂伸度(%) 35 38 55 25 彈性模數(MPa) 3400 3600 3400 4000 Tg 285 295 298 288 線性膨脹係數(i)pm/°C ) 49 50 47 51 難燃性 〇 〇 〇 〇 〔比較例1〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入3 3 7.8 克之GBL(Y-丁內酯)、225克(0.9莫耳)之MDI (二苯 甲烷二異氰酸酯)、及192(1莫耳)之TMA (偏苯三甲 酸酐),一面攪拌一面在注意散熱下歷時2小時升溫至 1 6 0 °C後,在此溫度下使其反應5小時。反應是與碳酸氣之 發泡同時進行,使得系統內變成爲茶色之透明液體。雖然 -72- 201035172 欲測定在25 °C之黏度,但是由於結晶化而無法測定黏度。 樹脂固體成份爲50%。將其簡稱爲「聚醯亞胺樹脂(al ) 」之溶液。除此之外,根據樹脂溶液酸價〔16.6 ( KOH mg/g )〕,則可下結論其平均分子量爲3400。 將所獲得之聚醯亞胺樹脂(al )之溶液塗佈於KBr板 ,並測定經揮發溶劑後的試料之紅外線吸收光譜結果,屬 於異氰酸酯基之特性吸收的2270 cnT1完全消失,且在725 cm·1、1 780 cm·1及1 720 crrT1確認到屬於醯亞胺環之特性 〇 吸收。此外,碳酸氣之產生量藉由燒瓶飼入重量之變化追 蹤結果爲79.2克(1.8莫耳)。因此,可下結論爲異氰酸 酯基之總量的1.8莫耳之全部已轉換成醯亞胺鍵及醯胺鍵 〇 除了使用所獲得之聚醯亞胺樹脂(al )之溶液以外, 其餘則以與實施例1相同的方式評估聚醯亞胺樹脂(a 1 ) 。其之結果如表8所7Γ:。 〔比較例2〕 ^ 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入345.9 克之 GBL(y-丁內酯)、237.5 克(0.95 莫耳)之 MDI (二 苯甲烷二異氰酸酯)、及192(1莫耳)之TMA (偏苯三 甲酸酐),一面攪拌一面在注意散熱下歷時2小時升溫至 160 °C後,在此溫度下使其反應5小時。反應是與碳酸氣之 發泡同時進行’使得系統內變成爲茶色之透明液體。雖然 欲測定在2 5 °C之黏度’但是由於結晶化而無法測定黏度。 樹脂固體成份爲5 0 %。將其簡稱爲「聚醯亞胺樹脂(a2 ) -73- 201035172 j之溶液。除此之外,根據樹脂溶液酸價〔8.1(KOHmg/g )〕,則可下結論其平均分子量爲6900。 將所獲得之聚醯亞胺樹脂(a2 )之溶液塗佈於KBr板 ,並測定經揮發溶劑後的試料之紅外線吸收光譜結果,屬 於異氰酸酯基之特性吸收的22 70 cnT1完全消失,且在725 cm'1 &gt; 1 7 8 0 cnT1及1 720 cm'1確認到屬於醯亞胺環之特性 吸收。此外,碳酸氣之產生量藉由燒瓶飼入重量之變化追 蹤結果爲83.6克(1.9莫耳)。因此,可下結論爲異氰酸 酯基之總量的1.9莫耳之全部已轉換成醯亞胺鍵及醯胺鍵 〇 除了使用所獲得之聚醯亞胺樹脂(a2 )之溶液以外, 其餘則以與實施例1相同的方式評估聚醯亞胺樹脂(a2 ) 。其之結果如表8所不。 〔比較例3〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入 292.32 克之 GBL(Y-丁內酯)、190 克(0.76 莫耳)之 MDI (二苯甲烷二異氰酸酯)、130.56(0.68莫耳)之TM A ( 偏苯三甲酸酐)、及38.64克(0.12莫耳)之BTDA (二苯 甲酮四甲酸二酐),一面攪拌一面在注意散熱下歷時2小 時升溫至1 60 °C後,在此溫度下使其反應5小時。反應是 與碳酸氣之發泡同時進行,結果系統內則從茶色之透明液 體發生污濁。雖然欲測定在25 °C之黏度,但是由於結晶化 而無法測定黏度。樹脂固體成份爲50%。將其簡稱爲聚醯 亞胺樹脂(a3 )之溶液(聚醯亞胺樹脂並未溶解於γ-丁內 -74- 201035172 酯之樹脂組成物)。除此之外,根據樹脂溶液酸價〔7.7 ( KOH mg/g)〕,則可下結論其平均分子量爲7300。 將所獲得之聚醯亞胺樹脂(a3)之溶液塗佈於KBr板 ,並測定經揮發溶劑後的試料之紅外線吸收光譜結果,屬 於異氰酸酯基之特性吸收的2270CHT1完全消失,且在725 cuT1、1 780 CHT1及1 720 cm +確認到屬於醯亞胺環之特性吸 收。此外,碳酸氣之產生量藉由燒瓶飼入重量之變化追蹤 結果爲66.88克(1.52莫耳)。因此,可下結論爲異氰酸 〇 酯基之總量的1.52莫耳之全部已轉換成醯亞胺鍵及醯胺鍵 〇 除了使用所獲得之聚醯亞胺樹脂(a3 )之溶液以外, 其餘則以與相同的方式實施例1評估聚醯亞胺樹脂(a3 ) 。其之結果如表8所示。 〔比較例4〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入14〇 克之DMAC(二甲基乙醯胺)、98.4克(0.24莫耳)之TMEG 〇 (乙二醇雙脫水偏苯三甲酸酯)、40克(0.16莫耳)之 BPS (雙酚S) 、40克(0.16莫耳)之MDI (二苯甲烷二 異氰酸酯)、及26.9克(0.16莫耳)之HDI (六亞甲基二 異氰酸酯)’一面攪拌一面在注意散熱下升溫至80°C,並 在此溫度下使其反應、溶解歷時1小時,更再以歷時2小 時升溫至1 20°C後,在此溫度下使其進行反應1小時。反 應是與碳酸氣之發泡同時進行,使得系統內變成爲茶色之 透明液體。以DMAC調整樹脂固體成份濃度爲55% ’以獲 -75- 201035172 得在25 °C之黏度爲100 Pa. s之聚醯亞胺樹脂(a4)之溶 液。 將所獲得之聚醯亞胺樹脂(a4 )之溶液塗佈於KBr板 ,並測定經揮發溶劑後的試料之紅外線吸收光譜結果,屬 於異氰酸酯基之特性吸收的2270CHT1完全消失,且在725 cnT1、1 780 cm·1及1 720 cm·1確認到屬於醯亞胺環之特性 吸收。此外,碳酸氣之產生量藉由燒瓶飼入重量之變化追 蹤結果爲21.1克(0.48莫耳)。因此,可下結論爲TMEG (乙二醇雙脫水偏苯三甲酸酯)之酸酐基之總量0.48莫耳 的全部已轉換成醯亞胺鍵,剩餘之異氰酸酯基則與BPS ( 雙酚S)形成胺基甲酸酯鍵而連結於樹脂。 除了使用所獲得之聚醯亞胺樹脂(a4 )之溶液以外, 其餘則以與實施例1相同的方式評估聚醯亞胺樹脂(a4 ) 。但是,關於溶劑溶解性與經時溶劑溶解性之評估,由於 將合成溶劑變更爲 DMAC,因此伽瑪-丁內酯則變更爲 DMAC來進行評估。其之結果如表8所示。 〔比較例5〕 混合80份之聚醯亞胺樹脂(a4) 、20份之N6 8 0 (大 日本油墨化學工業公司(Dainippon Ink and Chemicals, Inc. )製造之甲酚酚醛清漆型環氧樹脂、環氧當量爲214、軟 化點爲8 1 °C )、及〇 . 5份之三苯基膦,以調製作爲比較用 之「聚醯亞胺樹脂組成物(a5 )」。 除了使用所獲得之聚醯亞胺樹脂組成物(a5 )以外, 其餘則以與實施例1相同的方式評估聚醯亞胺樹脂組成物 -76- 201035172 (a 5 )。但是,關於溶劑溶解性與經時溶劑溶解性之評估 ,由於將合成溶劑變更爲DM AC,因此伽瑪-丁內酯則變更 爲DMAC來進行評估。其之結果如表8所示。 〔比較例6〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入172.9 克(0.9莫耳)之TMA(偏苯三甲酸酐)、31克(0.1莫耳 )之3,3’,4,4’-二苯基醚四甲酸二酐、264.3克(1莫耳) 之DMBPDI及2155克之GBL(Y-丁內酯),一面攪拌一面 〇 在注意散熱下歷時2小時升溫至1 50°C。雖然在此溫度下 進行反應,但是升溫至最高溫度起1小時後則從燒瓶系統 內發生污濁。並且,雖然在該溫度下進行反應6小時後取 出,但是在室溫下溶劑與固形樹脂成份則分離而變成不均 勻狀態,因此立刻停止合成。 〔比較例7〕 在配備攪拌裝置、溫度計及冷凝器之燒瓶中飼入96克 (0.5莫耳)之TMA (偏苯三甲酸酐)、101克10.5莫耳 ^ )之泌脂酸、115克(0.46莫耳)之MDI(二苯甲烷二異 氰酸酯)、87克(0.5莫耳)之TDI、及作爲溶劑的399 克(固體成份濃度爲50% )之環己酮,並添加0.02莫耳之 二氮雙環十一烯作爲觸媒,在140 °C下使其反應3小時。 並且,再追加5克(0.02莫耳)之MDI (二苯甲烷二異氰 酸酯)後在140 °C下進行2小時之反應,然後以環己酮稀 釋成固體成份濃度爲25%後取出,以獲得聚醯亞胺樹脂( a7)之溶液。進行與實施例1相同之評估,其之結果如表 -77- 201035172 9所示。但是’關於溶劑溶解性與經時溶劑溶解性之評估 ’由於將口成溶劑變更爲環己酮,因此伽瑪-丁內醋則變更 爲環己酮來進行評估。 表8EMZ: hardening catalyst, 2-ethyl-4-methylimidazole. Table 7 Example 5 Example 6 Example 7 Example 8 Thermosetting resin composition 1 2 3 4 Solvent solubility 〇〇〇〇 Solvent solubility 〇〇〇〇 Coating work 〇〇〇〇 coating film Film formation 1 Heat resistance 〇〇〇〇 Mechanical physical strength (MPa) 165 168 160 195 Elongation at break (%) 35 38 55 25 Modulus of elasticity (MPa) 3400 3600 3400 4000 Tg 285 295 298 288 Linear expansion coefficient (i) pm/°C) 49 50 47 51 Flame retardant 比较 [Comparative Example 1] 3 3 7.8 g of GBL (Y-butyl) was fed into a flask equipped with a stirring device, a thermometer and a condenser. Lactone), 225 g (0.9 mol) of MDI (diphenylmethane diisocyanate), and 192 (1 mol) of TMA (trimellitic anhydride), while stirring, heat up to 2 hours under the heat of cooling After 60 ° C, it was allowed to react at this temperature for 5 hours. The reaction is carried out simultaneously with the foaming of the carbonic acid gas, so that the inside of the system becomes a transparent liquid of brown color. Although -72- 201035172 is to measure the viscosity at 25 °C, the viscosity cannot be determined due to crystallization. The resin has a solid content of 50%. This is simply referred to as a solution of "polyimine resin (al)". In addition, according to the acid value of the resin solution [16.6 (KOH mg/g)], it can be concluded that the average molecular weight is 3,400. The solution of the obtained polyimine resin (al) was applied to a KBr plate, and the infrared absorption spectrum of the sample after the volatile solvent was measured. The 2270 cnT1 which is characteristic of the isocyanate group completely disappeared, and was 725 cm. · 1, 1 780 cm·1 and 1 720 crrT1 confirmed the characteristics of the 醯imine ring 〇 absorption. Further, the amount of carbon dioxide gas produced was 79.2 g (1.8 m) as a result of the change in the weight of the flask feed. Therefore, it can be concluded that all of the 1.8 moles of the total amount of the isocyanate groups have been converted into the oxime bond and the guanamine bond, except for the solution of the obtained polyimide resin (al), and the others are The polyimine resin (a 1 ) was evaluated in the same manner as in Example 1. The results are as shown in Table 8: [Comparative Example 2] ^ In a flask equipped with a stirring device, a thermometer and a condenser, 345.9 g of GBL (y-butyrolactone), 237.5 g (0.95 mol) of MDI (diphenylmethane diisocyanate), and 192 were fed. (1 mol) of TMA (trimellitic anhydride) was heated to 160 ° C for 2 hours while stirring, and then allowed to react at this temperature for 5 hours. The reaction is carried out simultaneously with the foaming of the carbon dioxide gas to make the inside of the system a brownish transparent liquid. Although it is desired to determine the viscosity at 25 ° C, the viscosity cannot be determined due to crystallization. The resin has a solid content of 50%. This is abbreviated as a solution of "polyimine resin (a2) -73 - 201035172 j. In addition, according to the acid value of the resin solution [8.1 (KOH mg / g)], the average molecular weight is 6900. The solution of the obtained polyimine resin (a2) was applied to a KBr plate, and the infrared absorption spectrum of the sample after the volatile solvent was measured, and the characteristic absorption of 22 70 cnT1 belonging to the isocyanate group disappeared completely, and at 725. Cm'1 &gt; 1 7 8 0 cnT1 and 1 720 cm'1 were confirmed to belong to the characteristic absorption of the quinone ring. In addition, the amount of carbon dioxide produced by the change in the weight of the flask was traced to 83.6 g (1.9 m). Therefore, it can be concluded that all of the 1.9 moles of the total amount of the isocyanate groups have been converted into the quinone bond and the guanamine bond, except for the solution of the obtained polyimide resin (a2). Then, the polyimine resin (a2) was evaluated in the same manner as in Example 1. The results are shown in Table 8. [Comparative Example 3] 292.32 g of GBL was fed in a flask equipped with a stirring device, a thermometer and a condenser. (Y-butyrolactone), 190 g (0.76 m) MDI (diphenylmethane diisocyanate), 130.56 (0.68 mol) of TM A (trimellitic anhydride), and 38.64 g (0.12 mol) of BTDA (benzophenone tetracarboxylic dianhydride) while stirring Note that after heating for 2 hours under heat dissipation, the temperature was raised to 1 60 ° C, and then reacted at this temperature for 5 hours. The reaction was carried out simultaneously with the foaming of carbonic acid gas, and as a result, the system was stained from the transparent liquid of brown color, although it was determined. Viscosity at 25 ° C, but the viscosity cannot be determined due to crystallization. The solid content of the resin is 50%. It is simply referred to as a solution of polyimine resin (a3 ) (polyimine resin is not dissolved in γ-butyl) In -74- 201035172 ester resin composition). In addition, according to the acid value of the resin solution [7.7 (KOH mg / g)], it can be concluded that the average molecular weight is 7300. The obtained polyimine The solution of the resin (a3) was applied to a KBr plate, and the infrared absorption spectrum of the sample after the volatile solvent was measured. The 2270CHT1 which is characteristic of the isocyanate group completely disappeared, and was 725 cuT1, 1 780 CHT1 and 1 720 cm + Confirmed to belong to the imine ring Characteristic absorption. In addition, the amount of carbon dioxide produced by the change in the weight of the flask is 66.88 g (1.52 mol). Therefore, it can be concluded that the total amount of the isocyanate group is 1.52 mol. The polyimine resin (a3) was evaluated in the same manner as in Example 1 except that a solution of the obtained polyimide resin (a3) was used. The results are shown in Table 8. [Comparative Example 4] 14 g of DMAC (dimethylammoniumamine) and 98.4 g (0.24 mol) of TMEG® (ethylene glycol double dehydrated benzene) were fed into a flask equipped with a stirring device, a thermometer and a condenser. Triseoester), 40 g (0.16 mol) of BPS (bisphenol S), 40 g (0.16 mol) of MDI (diphenylmethane diisocyanate), and 26.9 g (0.16 mol) of HDI (six Methyl diisocyanate) was heated to 80 ° C while stirring, and reacted and dissolved at this temperature for 1 hour, and then heated to 1 20 ° C for 2 hours, at this temperature. It was allowed to react for 1 hour. The reaction is carried out simultaneously with the foaming of the carbon dioxide gas, so that the system becomes a transparent liquid of brown color. The solution of the solid content of the resin was adjusted to 55% by DMAC to obtain a solution of the polyimine resin (a4) having a viscosity of 100 Pa·s at 25 ° C at -75 to 201035172. The solution of the obtained polyimine resin (a4) was applied to a KBr plate, and the infrared absorption spectrum of the sample after the volatile solvent was measured. The 2270CHT1 which is characteristic of the isocyanate group completely disappeared, and was 725 cnT1. 1 780 cm·1 and 1 720 cm·1 confirmed the absorption of the characteristic of the quinone ring. Further, the amount of carbon dioxide gas produced was 21.1 g (0.48 mol) as a result of the change in the weight of the flask feed. Therefore, it can be concluded that the total amount of the anhydride group of TMEG (ethylene glycol double-dehydrated trimellitate) of 0.48 moles has been converted into a quinone bond, and the remaining isocyanate group is compared with BPS (bisphenol S). A urethane bond is formed and bonded to the resin. The polyimine resin (a4) was evaluated in the same manner as in Example 1 except that the obtained solution of the polyimine resin (a4) was used. However, regarding the evaluation of solvent solubility and solvent solubility over time, since the synthesis solvent was changed to DMAC, gamma-butyrolactone was changed to DMAC for evaluation. The results are shown in Table 8. [Comparative Example 5] 80 parts of a polyimine resin (a4) and 20 parts of N6 80 (a cresol novolak type epoxy resin manufactured by Dainippon Ink and Chemicals, Inc.) The epoxy equivalent was 214, the softening point was 8 1 ° C), and 5 parts of triphenylphosphine was prepared for comparison as the "polyimine resin composition (a5)" for comparison. The polyimine resin composition -76 - 201035172 (a 5 ) was evaluated in the same manner as in Example 1 except that the obtained polyimide resin composition (a5) was used. However, regarding the evaluation of solvent solubility and solvent solubility over time, since the synthesis solvent was changed to DM AC, gamma-butyrolactone was changed to DMAC for evaluation. The results are shown in Table 8. [Comparative Example 6] In a flask equipped with a stirring device, a thermometer and a condenser, 172.9 g (0.9 mol) of TMA (p-trimellitic anhydride) and 31 g (0.1 mol) of 3, 3', 4 were fed. 4'-diphenyl ether tetracarboxylic dianhydride, 264.3 g (1 mol) of DMBPDI and 2155 g of GBL (Y-butyrolactone), while stirring, heat up to 1 50 °C for 2 hours while paying attention to heat dissipation. . Although the reaction was carried out at this temperature, fouling occurred from the flask system one hour after the temperature was raised to the maximum temperature. Further, although the reaction was carried out after the reaction was carried out at this temperature for 6 hours, the solvent and the solid resin component were separated at room temperature to become uneven, and the synthesis was immediately stopped. [Comparative Example 7] In a flask equipped with a stirring device, a thermometer and a condenser, 96 g (0.5 mol) of TMA (p-trimellitic anhydride), 101 g of 10.5 mol () of lipoic acid, 115 g ( 0.46 moles of MDI (diphenylmethane diisocyanate), 87 grams (0.5 moles) of TDI, and 399 grams of solvent (50% solids concentration) of cyclohexanone as solvent, plus 0.02 moles Nitrobicycloundecene was used as a catalyst and allowed to react at 140 ° C for 3 hours. Further, after adding 5 g (0.02 mol) of MDI (diphenylmethane diisocyanate), the reaction was carried out at 140 ° C for 2 hours, and then diluted with cyclohexanone to a solid concentration of 25%, and then taken out to obtain A solution of a polyimine resin (a7). The same evaluation as in Example 1 was carried out, and the results are shown in Table-77-201035172. However, since "the evaluation of solvent solubility and solvent solubility over time" was changed to cyclohexanone, the gamma-butyrolactone was changed to cyclohexanone for evaluation. Table 8

比較例 比較例 比較例 比較例 比較例 1 2 3 4 5 樹脂(樹脂組成物) al a2 a3 a4 a5 溶劑溶解性 X X X 〇 〇 經時溶劑溶解性 X X X 〇 凝膠化 塗佈作業性 X X X 〇 〇 耐熱性 X 〇 機械物性 斷裂強度(MPa) -*1) — *1) _*2) 110 斷裂伸度(%) — *1) — Μ) _*2) 15 彈性模數(MPa) —*1) 〜*1) — *2) 2600 Tg (°c) _*2) 203 線性膨脹係數 〜*1) 〜*1) _*2) 75 難燃性 -*1) __ *2) X 由於塗佈性不佳以致無法獲得均旬塗膜,因此無法評 估。 2)Comparative Example Comparative Example Comparative Example Comparative Example 1 2 3 4 5 Resin (resin composition) al a2 a3 a4 a5 Solvent solubility XXX Solvent solubility 〇〇 〇 Gelation coating workability XXX 〇〇 Heat resistance X 〇 mechanical physical fracture strength (MPa) -*1) — *1) _*2) 110 elongation at break (%) — *1) — Μ) _*2) 15 elastic modulus (MPa) —*1 )~*1) — *2) 2600 Tg (°c) _*2) 203 Linear expansion coefficient ~*1) ~*1) _*2) 75 Flame retardancy-*1) __ *2) X Due to coating The cloth is not so good that it is impossible to obtain a uniform film, so it cannot be evaluated. 2)

由於塗膜脆弱以致無法分II 因此無法評估。 -78- 201035172 表9 比較例 比較例 6 7 樹脂(樹脂組成物) a6 a7 溶劑溶解性 X 〇 經時溶劑溶解性 X 〇 塗佈作業性 X 〇 耐熱性 _ *1) X 機械物性 斷裂強度(MPa) _*1) 76 斷裂伸度(%) _*1) 12 彈性模數(MPa) _*1) 2800 Tg _*1) 187 線性膨脹係數(PPin/°C ) _*i) 97 由於塗布性不佳以致無法獲得均勻塗膜,因此無法評 估。 【囷式簡單說明】 第1圖是根據合成例1所獲得之本發明之聚醯亞胺樹 〇 脂的紅外線吸收光譜。 第2圖是根據合成例1所獲得之本發明之聚醯亞胺樹 脂的核磁共振吸收光譜。 【主要元件符號說明】 Μ 。 -79-Since the film is so weak that it cannot be divided into II, it cannot be evaluated. -78- 201035172 Table 9 Comparative Example Comparative Example 6 7 Resin (Resin Composition) a6 a7 Solvent Solubility X Solvent Solubility X 〇 Coating Workability X 〇 Heat Resistance _ *1) X Mechanical Physical Breaking Strength ( MPa) _*1) 76 elongation at break (%) _*1) 12 modulus of elasticity (MPa) _*1) 2800 Tg _*1) 187 coefficient of linear expansion (PPin/°C) _*i) 97 due to The coating property was poor so that a uniform coating film could not be obtained, and thus it was impossible to evaluate. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an infrared absorption spectrum of the polyimine resin of the present invention obtained in Synthesis Example 1. Fig. 2 is a nuclear magnetic resonance absorption spectrum of the polyimine resin of the present invention obtained in Synthesis Example 1. [Main component symbol description] Μ . -79-

Claims (1)

N— Η 12) 201035172 七、申請專利範圍: i一種聚醯亞胺樹脂,其特徵爲具有以通式 的結構及以通式(2)所代表的結構: i? C-N— Η (1代表由二異氰酸酯脫除NCO基後之殘 Η0-Χ-0 〇 (式中,X代表由在一分子中具有兩個以上 之酣系化合物脫除兩個酚性羥基後之殘基) 2 .如申請專利範圍第1項之聚醯亞胺樹脂,圭 D中之Ri具有下列通式(3) 、(4)或 (3) (4) (5) (式中’ R2各自獨立地代表氫原子、碳原 之烴基,*代表鍵結點)。 •如申請專利範圍第1項之聚醯亞胺樹脂,; 1 )中之I具有以下列通式(5 _ 1 )所代表 (1 )所代表 基); .之酚性羥基 〇 ;中該通式( (5 )之結構N— Η 12) 201035172 VII. Patent Application Range: i A polyimine resin characterized by a structure of the general formula and a structure represented by the general formula (2): i? CN— Η (1 represents Residue 0-Χ-0 〇 after removal of NCO group by diisocyanate (wherein X represents a residue obtained by removing two phenolic hydroxyl groups by having two or more lanthanide compounds in one molecule) 2 . In the polyimine resin of the first aspect of the patent, Ri in the formula D has the following general formula (3), (4) or (3) (4) (5) (wherein R 2 each independently represents a hydrogen atom, a hydrocarbon group of carbon, * represents a bond point.) • A polyimine resin as claimed in claim 1; 1) I has a representation represented by the following formula (5 _ 1 ) (1) Phenolic hydroxy hydrazine; the structure of the formula (5) 數爲1至9 中該通式( 1結構: -80- 201035172 h3c ch3 Qr^0r …-…---(5-1 ) (*代表鍵結點)。 4.如申請專利範圍第1至3項中任一項之聚醯亞胺樹脂 其中更進一步具有以下列通式(6)所代表的結構:The number is from 1 to 9 in the formula (1 structure: -80-201035172 h3c ch3 Qr^0r ...-...---(5-1) (* represents the bond point). 4. As claimed in the patent range 1 to The polyimine resin of any one of the three items further has a structure represented by the following formula (6): (Ri代表由二異氰酸酯脫除NCO基後之殘基)。 5 ·如申請專利範圍第1至4項中任一項之聚醯亞胺樹脂, 其中更進一步具有以下列通式(7 )所代表的結構: η 〇 η(Ri represents a residue after removal of the NCO group from the diisocyanate). The polyimine resin according to any one of claims 1 to 4, which further has a structure represented by the following general formula (7): η 〇 η 6.如申請專利範圍第4項之聚醯亞胺樹脂,其中具有以τ 列通式(8 -1 )所代表的結構單元及以(8 -2 )所代表的 結構單元: -81 - 201035172 ◎6. The polyimine resin according to claim 4, wherein the structural unit represented by the τ column formula (8 -1 ) and the structural unit represented by (8 -2 ): -81 - 201035172 ◎ ο II C-N Ηο II C-N Η 8- (8-2 (式中,m、η各自爲1至100)。 7.如申請專利範圍第4項之聚醯亞胺樹脂,其中具有以下 列通式(9 )所代表的結構:8-(8-2 (wherein m and η are each 1 to 100). 7. The polyimine resin according to item 4 of the patent application, which has the structure represented by the following formula (9): 0 H3C\ /CH3 ..........(9) 〇 (式中,m、n、p、q各自爲1至100,Y代表以該通式 (3 )或通式(4 )所代表的結構)。 ,如申請專利範圍第1項之聚醯亞胺樹脂,其中具有以下 列所代表的結構單元,且重量平均分子量爲1 〇〇〇至 100000: -82- 2010351720 H3C\ /CH3 ..... (9) 〇 (wherein m, n, p, q are each 1 to 100, and Y represents the general formula (3) or general formula (4) ) the structure represented). , for example, the polyimine resin of claim 1 which has the structural unit represented by the following columns and has a weight average molecular weight of from 1 100 to 100,000: -82 - 201035172 (式中之al、a2、a3、a4、a5及a6各自爲1至1 0000 ,Y代表以該通式(3)或通式(4)所代表的結構,* 代表可形成醯胺鍵或醯亞胺鍵之鍵結點)。 9 .如申請專利範圍第8項之聚醯亞胺樹脂,其中各自含有 -83- 201035172 10至40重量%之以該通式(10-1 )所代表的結構單元及 以通式(10-2)所代表的結構單元。 10·如申請專利範圍第1至9項中任一項之聚醯亞胺樹脂, 其中該通式(2)之X爲如下式(2-1)、式(2-2)、 式(2-4 )或式(2-5 )之結構: Η OH - Re(wherein a1, a2, a3, a4, a5, and a6 are each 1 to 1 0000, Y represents a structure represented by the general formula (3) or the general formula (4), and * represents a guanamine bond or The bond point of the quinone imine bond). 9. The polyimine resin according to item 8 of the patent application, wherein each of -83-201035172 10 to 40% by weight of the structural unit represented by the formula (10-1) and the formula (10- 2) The structural unit represented. The polyimine resin according to any one of claims 1 to 9, wherein X of the formula (2) is a formula (2-1), a formula (2-2), and a formula (2) -4) or the structure of formula (2-5): Η OH - Re R6R6 OH Rs--^—H Re OH R«OH Rs--^-H Re OH R« RsRs R6 J b (2-1 ) (2-2) (2-4) (2-5) 〔式中,R2代表單鍵或二價連結基,r3代表氫或碳原子 數爲1至5之烷基;R4代表氫或碳原子數爲丨至5之烷 基、或以下列通式(2-3 )所代表的結構;R5代表直接 鍵結或二價連結基;Rs可爲相同或不同,且代表氫原子 或碳原子數爲1至18之院基;a、b、c之合計爲1以上 '*爲連結基〕R6 J b (2-1 ) (2-2) (2-4) (2-5) [wherein R 2 represents a single bond or a divalent linking group, and r 3 represents hydrogen or an alkane having 1 to 5 carbon atoms R4 represents hydrogen or an alkyl group having a carbon number of 丨 to 5, or a structure represented by the following formula (2-3); R5 represents a direct bond or a divalent linking group; and Rs may be the same or different, And represents a hydrogen atom or a number of carbon atoms from 1 to 18; a, b, c total is 1 or more '* is a linking group] (2-3) -84- 201035172 11.如申請專利範圍第10項之聚醯亞胺樹脂,其中該通式 (2)之X爲如下式(2-6)所代表的結構:(2-3) -84- 201035172 11. The polyimine resin according to claim 10, wherein X of the formula (2) is a structure represented by the following formula (2-6): (*代表鍵結點)。 1 2 ·如申請專利範圍第i至n項中任一項之聚醯亞胺樹脂 ’其中該樹脂之酸價爲1至50。 1 3 ·如申請專利範圍第!至i 2項中任一項之聚醯亞胺樹脂 ’其以10重量%之濃度溶解於25 °C之伽瑪-丁內酯。 14. 一種硬化物,其特徵爲將如申請專利範圍第1至13項 中任一項之聚醯亞胺樹脂加以硬化所獲得。 15. —種聚醯亞胺樹脂之製造方法,其特徵爲將具有兩個以 上之酚性羥基之多元酚化合物(A)、含有二異氰酸酯 化合物之聚異氰酸酯化合物(B)、及含有環己烷三羧 酸酐之酸酐化合物(C)加以反應。 1 6 . —種熱硬化性樹脂組成物,其特徵爲含有如申請專利範 圍第1至13項中任一項之聚醯亞胺樹脂及環氧樹脂。 17 —種硬化物,其特徵爲將如申請專利範圍第15項之熱 硬化性樹脂組成物加以硬化所獲得。 -85-(* stands for the key node). 1 2 . The polyimine resin according to any one of claims i to n wherein the acid value of the resin is from 1 to 50. 1 3 · If you apply for a patent scope! The polyimine resin of any one of items i to 2 is dissolved in gamma-butyrolactone at 25 ° C at a concentration of 10% by weight. A cured product obtained by hardening a polyimide resin according to any one of claims 1 to 13. A method for producing a polyimine resin, which comprises a polyhydric phenol compound (A) having two or more phenolic hydroxyl groups, a polyisocyanate compound (B) containing a diisocyanate compound, and a cyclohexane-containing compound. The anhydride compound (C) of the tricarboxylic anhydride is reacted. A thermosetting resin composition characterized by containing the polyimine resin and epoxy resin according to any one of claims 1 to 13. A cured product obtained by hardening a thermosetting resin composition according to claim 15 of the patent application. -85-
TW99105399A 2009-02-27 2010-02-25 Polyimide resin, method for producing the same, polyimide resin composition and cured product TW201035172A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009045814 2009-02-27

Publications (1)

Publication Number Publication Date
TW201035172A true TW201035172A (en) 2010-10-01

Family

ID=42665503

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99105399A TW201035172A (en) 2009-02-27 2010-02-25 Polyimide resin, method for producing the same, polyimide resin composition and cured product

Country Status (3)

Country Link
JP (1) JPWO2010098296A1 (en)
TW (1) TW201035172A (en)
WO (1) WO2010098296A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103370371A (en) * 2011-02-01 2013-10-23 Dic株式会社 Thermosetting resin composition, cured product thereof, and interlayer adhesive film for printed wiring board

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5861915B2 (en) * 2011-11-09 2016-02-16 Dic株式会社 Thermosetting resin composition and interlayer adhesive film for printed wiring board
WO2019026806A1 (en) * 2017-08-02 2019-02-07 旭化成株式会社 Polyimide varnish and method for producing same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4446153B2 (en) * 2003-12-22 2010-04-07 東洋紡績株式会社 Polyamideimide resin and its varnish
JP4830686B2 (en) * 2005-10-21 2011-12-07 三菱瓦斯化学株式会社 Metal foil-clad laminate and method for producing the same
JP2007138000A (en) * 2005-11-17 2007-06-07 Toyobo Co Ltd Polyamideimide resin varnish and method for producing the same
JP5040284B2 (en) * 2005-12-15 2012-10-03 Dic株式会社 Thermosetting resin composition
US8222365B2 (en) * 2006-12-12 2012-07-17 Toyo Boseki Kabushiki Kaisha Polyamideimide resin, as well as a colorless and transparent flexible metal-clad laminate and circuit board obtained therefrom
TWI451816B (en) * 2007-03-20 2014-09-01 Mitsui Mining & Smelting Co And a resin composition for insulating layer constituting a printed circuit board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103370371A (en) * 2011-02-01 2013-10-23 Dic株式会社 Thermosetting resin composition, cured product thereof, and interlayer adhesive film for printed wiring board

Also Published As

Publication number Publication date
WO2010098296A1 (en) 2010-09-02
JPWO2010098296A1 (en) 2012-08-30

Similar Documents

Publication Publication Date Title
JP4716149B2 (en) Polyimide resin, curable polyimide resin composition and cured product
JP4807603B2 (en) Thermosetting resin composition and cured product thereof
TWI412560B (en) And a resin composition for interlayer insulation of a multilayer printed wiring board
EP2671920A1 (en) Thermosetting resin composition, cured product thereof, and interlayer adhesive film for printed wiring board
JP5326396B2 (en) Thermosetting resin composition
JP5233510B2 (en) Thermosetting resin composition
JP2009179697A (en) Polyimide resin, polyimide resin composition, and method for producing polyimide resin
TW201035172A (en) Polyimide resin, method for producing the same, polyimide resin composition and cured product
JP5494341B2 (en) Thermosetting resin composition, cured product thereof and interlayer adhesive film for printed wiring board
JP5130795B2 (en) Thermosetting polyimide resin composition
JP5119757B2 (en) Polyimide resin composition
JP5861915B2 (en) Thermosetting resin composition and interlayer adhesive film for printed wiring board
JP5303860B2 (en) Thermosetting polyimide resin composition
JP5119754B2 (en) Thermosetting polyimide resin composition
JP2012017434A (en) Thermosetting resin composition and interlayer adhesive film for printed wiring board
JP5655446B2 (en) Thermosetting resin composition and interlayer adhesive film for printed wiring board
JP5633736B2 (en) Thermosetting resin composition and interlayer adhesive film for printed wiring board
JP5320824B2 (en) Thermosetting resin composition
JP2012236875A (en) Thermosetting resin composition and interlayer adhesive film for printed-wiring board
JP5233329B2 (en) Thermosetting polyimide resin composition
TWI382997B (en) Thermosetting resin composition containing modified polyimide resin
JP2012072297A (en) Thermosetting resin composition and interlayer adhesive film for printed wiring board