TW201035153A - Shaping method - Google Patents

Shaping method Download PDF

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Publication number
TW201035153A
TW201035153A TW098138852A TW98138852A TW201035153A TW 201035153 A TW201035153 A TW 201035153A TW 098138852 A TW098138852 A TW 098138852A TW 98138852 A TW98138852 A TW 98138852A TW 201035153 A TW201035153 A TW 201035153A
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TW
Taiwan
Prior art keywords
shape
transfer
transfer body
lens
wafer
Prior art date
Application number
TW098138852A
Other languages
Chinese (zh)
Other versions
TWI465476B (en
Inventor
Shigeru Yamaki
Nobuaki Ishii
Katsumi Murofushi
Kunio Yoshida
Original Assignee
Showa Denko Kk
Aji Co Ltd
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Publication of TW201035153A publication Critical patent/TW201035153A/en
Application granted granted Critical
Publication of TWI465476B publication Critical patent/TWI465476B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0053Moulding articles characterised by the shape of the surface, e.g. ribs, high polish
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/04Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles using movable moulds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00009Production of simple or compound lenses
    • B29D11/00278Lenticular sheets
    • B29D11/00307Producing lens wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • B29D11/00009Production of simple or compound lenses
    • B29D11/00365Production of microlenses
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/24Di-epoxy compounds carbocyclic
    • C08G59/245Di-epoxy compounds carbocyclic aromatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • G02B3/0031Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0822Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using IR radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0866Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
    • B29C2035/0877Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using electron radiation, e.g. beta-rays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/04Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles using movable moulds
    • B29C2043/046Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles using movable moulds travelling between different stations, e.g. feeding, moulding, curing stations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32Component parts, details or accessories; Auxiliary operations
    • B29C43/36Moulds for making articles of definite length, i.e. discrete articles
    • B29C43/361Moulds for making articles of definite length, i.e. discrete articles with pressing members independently movable of the parts for opening or closing the mould, e.g. movable pistons
    • B29C2043/3615Forming elements, e.g. mandrels or rams or stampers or pistons or plungers or punching devices
    • B29C2043/3634Forming elements, e.g. mandrels or rams or stampers or pistons or plungers or punching devices having specific surface shape, e.g. grooves, projections, corrugations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32Component parts, details or accessories; Auxiliary operations
    • B29C43/52Heating or cooling
    • B29C2043/525Heating or cooling at predetermined points for local melting, curing or bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0002Condition, form or state of moulded material or of the material to be shaped monomers or prepolymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00Optical elements, e.g. lenses, prisms
    • B29L2011/0016Lenses

Abstract

A shaping method in which a shaped object such as a lens can be produced with higher accuracy than in conventional techniques. A shaped object, e.g., a lens array or a die for nanoimprinting, is produced by repeatedly performing a transfer step a plurality of times, the transfer step comprising: a deformation step in which a photocurable composition comprising an epoxy compound and a polymerization initiator is brought into contact with a transfer object (62) having a shape to be transferred that is either the same as the shape of an aspherical lens part (312) or the reverse of the shape of an aspherical lens part (312), and the photocurable composition is thereby deformed so as to conform to the shape to be transferred of the transfer object (62); a curing step in which at least the deformed portion of the deformed photocurable composition is cured by irradiation with light using a light irradiator (60); and a separation step in which the photocurable composition that has been cured is separated from the transfer member.

Description

201035153 六、發明說明: 【發明所屬之技術領域】 本發明係關於造形例如具有由非球面形狀所成之透鏡 部的透鏡陣列等透鏡、或使用於如此透鏡成形的型等造形 物之造形方法。 【先前技術】 0 專利文獻1係揭示使用具有形成透鏡形狀之面的金屬 模具之微透鏡陣列的製造方法,其含有藉由前述金屬模具 於第1基板上將第1樹脂硬化爲前述透鏡形狀而形成複數透 鏡基板之步驟、與將前述透鏡基板配列爲陣列狀之步驟、 與形成具有於前述陣列狀透鏡基板上進行鍍敷形成前述透 鏡形狀的面的面罩之步驟、與形成形成前述面罩之透鏡形 狀的面上進行鑛敷的母模版(mother )之步驟、與藉由前 述母模版形成成形型之步驟、與藉由前述成形型於第2基 Ο 板上將第2樹脂硬化爲前述透鏡形狀之形成步驟、與藉由 乾蝕刻將前述第2樹脂除去的同時除去前述第2基板的一部 份的步驟之微透鏡陣列的製造方法。 又,專利文獻2中揭示,藉由將母壓模版(mother stamper )的表面之微細圖型依序轉印之微細結構體的製造 方法,其爲含有(1)對於基板將前述母壓模版固定於所 定位置的步驟、與(2)於前述母壓模版與前述基板之間 供給樹脂的步驟、與(3)真空中將前述母壓模版壓著於 前述樹脂之步驟、與(4)硬化前述樹脂之步驟、與(5) -5- 201035153 將前述母壓模版自前述硬化樹脂脫離之步驟、與(6 )如 變更前述母壓模版與前述基板之相對位置,移動前述母壓 模版或前述基板的步驟、與(7 ) 前述步驟(6 )之後, 重複步驟(2 )〜步驟(6 )之所定次數的步驟。 [專利文獻1]特開2005-41125號公報 [專利文獻2]特開2003-94445號公報 【發明內容】 然而,專利文獻1及專利文獻2所揭示的技術中,例如 有著難以形成由非球面形狀所成之透鏡等被要求高精度之 造形物的問題點。 本發明與過去技術相比較,提供一種可高精度地造形 透鏡等造形物之造形方法爲目的。 作爲本發明之特徵,具有將被造形物、與與非球面形 狀所成之透鏡部之相同形狀、或與前述非球面形狀所成之 透鏡部反形狀所成之轉印形狀所形成之轉印體作互相接觸 ’將被造形物仿照成前述轉印形狀而變形之變形步驟.、與 使被造形物之至少變形的部分經硬化的硬化步驟、與將被 造形物與前述轉印體相互分離之分離步驟、與將前述轉印 體相對移動至前述被造形物的其他位置之移動步驟,於被 造形物轉印前述轉印形狀之轉印步驟多次重複之造形方法 ’其爲前述被造形物係由含有環氧化合物與聚合啓始劑之 硬化性組成物所成之造形方法。 前述硬化性組成物較佳爲含有 -6- 201035153 (a)下述一般式(1)所表示之雙酚型環氧化合物、 【化1】[Technical Field] The present invention relates to a method of forming a lens such as a lens array having a lens portion formed by an aspherical shape, or a shape for forming such a lens. [Prior Art] 0 Patent Document 1 discloses a method of manufacturing a microlens array using a metal mold having a lens-shaped surface, wherein the first resin is cured to the lens shape on the first substrate by the mold. a step of forming a plurality of lens substrates, a step of arranging the lens substrates in an array, a step of forming a mask having a surface on which the array lens substrate is plated to form the lens shape, and a lens forming the mask a step of depositing a mother mold on the surface of the shape, a step of forming a shape by the master mold, and a step of curing the second resin into the lens shape by the molding type on the second substrate a method of forming a microlens array, wherein the step of removing the portion of the second substrate while removing the second resin by dry etching. Further, Patent Document 2 discloses a method for producing a microstructure in which a fine pattern of a surface of a mother stamper is sequentially transferred, which comprises (1) fixing the mother stamper to a substrate. a step of supplying a resin at a predetermined position, (2) a step of supplying a resin between the mother stamper and the substrate, and (3) a step of pressing the mother stamper against the resin in a vacuum, and (4) curing the foregoing a step of removing the mother stamper from the hardened resin, and (6) changing the relative position of the mother stamper to the substrate, and moving the mother stamper or the substrate After the step, and (7) the foregoing step (6), the steps of the steps (2) to (6) are repeated a predetermined number of times. [Patent Document 1] JP-A-2003-94445 [Patent Document 2] However, in the techniques disclosed in Patent Document 1 and Patent Document 2, for example, it is difficult to form an aspheric surface. A problem such as a lens made of a shape is required to be a high-precision shaped object. The present invention has been made in view of a method for forming a shape such as a lens with high precision, as compared with the prior art. According to a feature of the present invention, there is provided a transfer formed by a transfer shape formed by forming a shape, a shape of a lens portion formed by an aspherical shape, or a shape of a lens formed by the aspherical shape. The body is in contact with each other 'the deformation step of deforming the shaped object into the transfer shape, the hardened hardening step with the at least deformed portion of the shaped object, and the separated shape from the transfer body a separating step, a moving step of moving the transfer body relative to another position of the object to be formed, and a forming step of repeating the transfer step of transferring the transfer shape to the object to be shaped, which is the aforementioned forming The method is a method of forming a curable composition containing an epoxy compound and a polymerization initiator. The curable composition preferably contains -6-201035153 (a) a bisphenol type epoxy compound represented by the following general formula (1), [Chemical Formula 1]

(式中,X表示單鍵、伸甲基' 亞乙基、異亞丙基或磺醯 基,Y表示氫原子或2,3-環氧丙基,η爲0〜10之整數) (b) 氧雜環丁垸(oxetane)化合物、與 (c) 聚合啓始劑爲特徵。 較佳爲含於前述硬化性組成物之環氧化合物(a )與 氧雜環丁烷(oxetane)化合物(b)的配合質量比爲80/2〇 〜20/80爲特徵之如申請專利範圍第1項至第3項中任一項 之造形方法。(wherein X represents a single bond, a methyl group, an ethylene group, an isopropylidene group or a sulfonyl group, Y represents a hydrogen atom or a 2,3-epoxypropyl group, and η is an integer of 0 to 10) (b An oxetane compound and (c) a polymerization initiator are characterized. Preferably, the mass ratio of the epoxy compound (a) to the oxetane compound (b) contained in the curable composition is 80/2 〇 to 20/80, as in the patent application scope. The method of forming any one of items 1 to 3.

較佳爲前述硬化性組成物的黏度爲100〜5〇〇〇mPa · S 所謂本發明與過去技術相比較,可提供一種可高精度 地造形透鏡等造形物的造形方法。 其次對於本發明之實施形態依據圖面作說明。 圖1表示本發明之第1實施形態的造形裝置1 〇。造形裝 置1 〇爲造形物,具有使用於光學零件之透鏡陣列的造形’ 於設置面所設置之基台12,於基台12上支持有可動台24° 於可動台24之上側面進一步支持有支持台14。 可動台24係由形成有朝下側突出形狀之突出部25之下 側部分26、與位於下側部分26的上側之上側部分27所成’ 突出部25係以嵌入於基台12之朝上的面12a所被形成之y軸 201035153 方向的溝(未圖示)之方式,組裝於基台12。因此被y軸 方向之溝引導,可動台24成爲在面12a上可於y軸方向移動 。於突出部25上’鑲入輸送螺絲28。使輸送螺絲28之軸方 向(長方向)成爲y軸方向,使用軸承30、30於基台12將 輸送螺絲28以自由轉動方式支持。輸送螺絲28的圖1中之 左端部上,與固定於基台12的y軸馬達32連結。因此,藉 由轉動y軸馬達32 ’介著輸送螺絲28於突出部25傳達驅動 ,可動台24於y軸方向移動。將可動台往y軸之哪一個方向 移動係藉由控制y軸馬達32之轉動方向來決定。 於可動台24之上側部分27上,設置0軸馬達34。0軸 馬達34爲將可動台24之上側部分27,對於可動台24之下側 部分26,以與Z軸呈垂直方向的轉動軸作爲中心進行轉動 。如此可動台24的全體可在y軸方向移動,且同時上側部 分27對於下側部分26成爲可轉動。 於支持台I4上,例如載置由玻璃等所成之晶圓W,支 持台I4爲將載置的晶圓W自重力方向下側支持。又,於支 持台14上,例如連結具備馬達等之驅動源18。因此,支持 台14可成爲,對於可動台24之上側部分27與晶圓W成爲一 體而轉動,於晶圓W上構成以所謂的旋轉塗佈將硬化性組 成物等進行塗佈時所使用的旋轉塗佈用之轉動桌。或者將 支持台14作爲旋轉塗佈用轉動桌而構成,取代構成如藉由 旋轉塗佈於晶圚W塗佈硬化性組成物,於晶圓W所形成之 複數孔h2 (圖2參照)上,例如將如注入一般將硬化性組 成物注入的注入裝置(未圖示)設於造形裝置1 0,亦可以 -8- 201035153 該注入裝置於晶圓W所形成之複數孔h2注入硬化性組成物 〇 支持台14爲,例如使用具有玻璃等光透過性的材料等 ,成爲可通過如後述之光照射裝置60所發之光。且,於支 持台14載置晶圓W,由於支持台14上載置之狀態除去晶圓 W時,例如可使用機器人等所成之載置•除去裝置(未圖 示),亦可由操作者以手進行作業。 〇 於可動台24的上側部分27上,設置將作爲被成形物所 使用的光硬化性組成物供給於晶圓W之供給裝置36。供給 裝置3 6中,介著閥3 8,接續貯藏光硬化性組成物之貯藏部 40,供給裝置36爲將貯藏於貯藏部40之光硬化性組成物, 於略圓形(圓板形狀)所成之晶圓W的略中心部自上方落 下而可供給。供給於晶圓W之光硬化性組成物爲,藉由支 持台1 4以預定的所定時間進行轉動而藉由離心力擴散,成 爲於晶圓W表面塗佈成略均勻厚度之狀態。 〇 又,於可動台24之上側部分27上,設有作爲硬化裝置 所使用的光照射裝置60。光照射裝置60藉由作爲光傳達手 段所使用的光纖維68而接續於光源70,使用於塗佈於晶圓 W之光硬化性組成物上以光照射時。該實施形態中,光照 射裝置60爲,對於支持台14、晶圓W、及塗佈於晶圓W之 光硬化性組成物,設置於與後述轉印體62爲相反側之下側 上。因此,將轉印體62接觸於光硬化性組成物之狀態下, 不會被轉印體62遮住,於光硬化性組成物可照射光。 於基台12,裝置可動台24之同時,固定支柱42。於支 -9 - 201035153 柱42上,對於支柱42可於χ軸方向上移動之可動單位44被 組裝上。可動單位4 4係由位置於圖中左側的左側部分4 8、 與固定於左側部分48之右側部分50所成。左側部分48爲, 支持成對於支柱42可於χ軸方向上移動,鑲入輸送螺絲52 。輸送螺絲5 2爲藉由軸承5 4使軸方向呈χ軸方向而於支柱 42上可轉動。 於輸送螺絲52之一端部,連結組裝支柱42之χ軸馬達 56。因此,使χ軸馬達56轉動時,介著輸送螺絲52於左側 部分48傳達χ軸馬達56之驅動,可動單位44之左側部分48 與右側部分50成爲一體,而於χ軸方向移動。將可動單位 44於χ軸方向之哪一個方向上移動係藉由控制x軸馬達56之 轉動方向而決定。 可動單位44之右側部分50上,轉印體62爲介著支持構 件45而裝著。支持構件45爲對於可動單位44組裝成可於z 軸方向移動’由圖1中左側突出之突出部46、與固定於突 出部46之支持部47所成。於支持部47上,例如組裝成於往 下之面上可裝卸轉印體62,轉印體62爲配合欲形成之透鏡 部形狀、或作爲被造形物所使用的硬化性組成物之種類等 ’組裝成可選自尺寸或形狀彼此相異者之1種。 於突出部4 6上螺合輸送螺絲5 8。輸送螺絲5 8於可動單 位44之右側部分50,組裝成使用軸承61、61可使軸方向呈 z軸方向而可轉動。輸送螺絲58之上端部連結於支持構件 用z軸馬達64。因此,轉動支持構件用z軸馬達64時,介著 輸送螺絲5 8於支持構件4 5傳達驅動,支持構件4 5、與支持 -10- 201035153 於支持構件45之轉印體62成爲一體往z軸方向移動。 於可動單位44之右側部分50中,作爲檢測晶圓w及轉 印體6 2之位置的檢測手段所使用的檢測裝置72,組裝成可 與支持構件45獨立下可上下移動(可於z軸方向移動)。 檢測裝置72爲’例如具有由CCD照相機所成之攝影部74、 設置於攝影部74之晶圓W側的透鏡單位76、與作爲可確保 藉由攝影部74可順利攝影的鮮明度之照明手段所使用的燈 0 78。於檢測裝置72組裝檢測裝置用z軸馬達80,檢測裝置 用z軸馬達80爲’作爲將檢測裝置72對可動單位44於z軸方 向移動時的驅動源使用,藉由可上下移動檢測裝置72,可 將攝影部74之焦點對準轉印體62等。 如上述,將支持構件45組裝成對於可動單位44可於z 軸方向移動,將可動單位44組裝成對於支柱42可於X軸方 向移動。因此,藉由控制X軸馬達56與支持構件用z軸馬達 64,將支持構件45與轉印體62同時可於X軸方向與z軸方向 Q 上移動。又’如上述’支持台14爲藉由驅動y軸馬達32及θ 軸馬達34,可同時將可動台24於y軸方向上移動並轉動。 藉此,藉由控制y軸馬達32、X軸馬達56、支持構件用z軸 馬達64、及Θ軸馬達34,可變更與晶圓W、光照射裝置60 及轉印體6 2之相對位置關係。 因此,藉由變更晶圓W與轉印體62之相對位置關係’ 將塗佈於晶圓W之光硬化性組成物與轉印體62 ’可互相接 觸並離開。如此該實施形態中,y軸馬達32、X軸馬達56 ' 支持構件用z軸馬達64、及Θ軸馬達34與輸送螺絲28、52、 -11 - 201035153 5 8等同時於光硬化性組成物與轉印體62以互相接觸並離開 下,使用作爲將光硬化性組成物及轉印體62的至少任一方 移動之移動裝置使用。對於y軸馬達32、X軸馬達56、支持 構件用z軸馬達64、及Θ軸馬達34之控制的詳細內容如後述 〇 以上所說明之實施形態中,所謂光硬化性組成物爲, 藉由照射光而可硬化之硬化性組成物。又,對於以上所說 明之實施形態中,作爲被造形物雖使用光硬化性組成物, 作爲被造形物,藉由接觸轉印體62、或壓接觸轉印體62下 可能會仿照轉印體62之形狀而變形,可適用保持變形狀態 下可使其硬化之材料,例如可使用藉由上述硬化性組成物 且藉由加熱而進行硬化的熱硬化性組成物。又,該實施形 態中’作爲硬化被造形物之硬化裝置,雖使用硬化光硬化 性組成物之光照射裝置,但硬化裝置配合作爲被造形物所 使用的材料可適宜選擇。例如如前述作爲被造形物使用熱 硬化性組成物時,作爲硬化裝置可選擇加熱熱硬化性組成 物之加熱器。 圖2表示轉印體62及晶圓W之詳細情況。 如圖2所示,晶圓W爲於基板评〗上方具有重疊保持板 W2之結構。基板W1爲例如由可透過光之材料的玻璃所成 ’該厚度tl,例如爲4〇〇μ。保持板W2,例如由液體所成, 將流動性高之硬化前光硬化性組成物保持於所定位置上時 使用’例如由矽所成,該厚度t2,例如爲725μ,形成複數 個自上方貫通至下方的貫通孔hi。各貫通孔hi,例如成爲 -12- 201035153 自上方往下方變狹隘之鉢形狀。 如此,於基板W1之上方所配置之保持板W2,如貫通 保持板W2下,形成複數貫通孔hi,故貫通孔hi下側被基 板W1封住,於基板W1上,成爲形成下方被封住而往上方 開放的凹部形狀所成之複數孔h2之狀態。又,於基板W1 彼此相鄰之貫通孔h 1之間的位置上,例如於基板W 1内部 上,形成刻畫(scriber)層(刻畫部)S »形成基板W1之 ¢) 刻畫層S的位置因比其他部分之強度還弱,故於分割基板 W1時,基板W1沿著刻畫層S而被分割。 轉印體62例如由金屬所成,作爲非球面形狀所成之透 鏡部與所使用的透鏡部312 (參照後述之圖8)爲同形狀、 或作爲由與透鏡部312爲反形狀所成之轉印形狀所形成之 轉印體而使用,作爲該轉印形狀,例如形成凸部90。又, 轉印體62使用於仿照凸部90之形狀並變形光硬化性組成物 ,以經變形之狀態下硬化光硬化性組成物,形成在轉印體 〇 62的轉印形狀對光硬化性組成物進行轉印。凸部90係將由 金屬所成之轉印體62,例如使用機械中心等工作機械,例 如進行削出等,以機械性加工而形成,成爲非球面形狀。 形成在轉印體62之轉印形狀藉由經轉印而造形的被造 形物’被要求高精度。因此,例如作爲凸部90於轉印體62 所形成之轉印形狀亦要求高精度,且凸部90爲具有非球面 形狀’難以加工,故於轉印體62之加工上需要長時間且高 成本之情況較多。因此,該實施形態中,欲縮短加工時間 ’抑制成本,於轉印體62僅一處形成轉印形狀。 -13- 201035153 其中,所謂非球面形狀爲’一般由切出球面的—部份 之形狀所成的曲面形狀以外之表面形狀。又’如透鏡部 312之光學零件中’稱爲以下式(1)所示非球面形狀式表 示的形狀。 z - C · ρ 2/[1 + {1-(1+κ1) · C2 · p 2 } 1/2] · * * 式⑴ 但,將C作爲曲率半徑R之逆數’將Ρ作爲由反射鏡面 之光軸的高度,將ζ作爲垂陷(sag)量,將κΐ作爲圓錐係 數。 圖2中,於晶圓W朝上的面、全面藉由旋轉塗佈塗佈 光硬化性組成物,經塗佈之光硬化性組成物流入保持板 W2的孔h2,並保持於保持板W2,對於經保持之光硬化性 組成物,至少凸部90與光硬化性組成物接觸下呈現轉印體 62爲接觸之狀態。該狀態中,使用光照射裝置60接觸於光 硬化性組成物的凸部90之位置、及於該周邊以光照射時, 光硬化性組成物經硬化,形成凸部之轉印形狀轉印至光硬 化性組成物。而光硬化性組成物經硬化後,轉印體62如圖 2所示二點鏈線,由晶圓W離開,如圖2中所示箭頭,例如 與保持經硬化之硬化性組成物的孔h2之鄰接孔h2所保持的 未硬化之硬化性組成物接觸下移動。 圖3中表示,取代於晶圓W朝上之面、全面藉由旋轉 塗佈塗佈光硬化性組成物,於晶圓W所形成之複數孔h2中 ,使用注入裝置(未圖示)注入光硬化性組成物時,對於 -14 - 201035153 保持板W2所保持之光硬化性組成物,至少凸部9 0如接觸 光硬化性組成物一般,顯示接觸轉印體62的狀態。此時, 於1個孔h2所保持之光硬化性組成物與凸部90接觸,以光 照射的時點,已成爲於該孔鄰接之孔h2已經注入光硬化 性組成物之狀態,1個孔h2内之光硬化性組成物經硬化後 ,轉印體62如圖3中二點鏈線所示,由晶圓W離開,如圖3 中所示箭頭,與保持經硬化之硬化性組成物的孔h2之鄰近 0 孔h2所保持之未硬化的硬化性組成物接觸下移動。而與於 鄰近孔h2所保持之硬化性組成物接觸的狀態之轉印體62爲 ,往鄰近孔h2的進一步鄰近孔h2之移動前,於該進一步鄰 近的孔h2藉由注入裝置注入光硬化性組成物。 即,如圖3所示,使用注入裝置將光硬化性組成物注 入於孔h2時,將光硬化性組成物仿照轉印體62使其變形時 (變形步驟)時,預先於形成複數孔h2之晶圓W,注入光 硬化性組成物(注入步驟),於孔h2被注入之光硬化性組 〇 成物、與轉印體62進行接觸(接觸步驟)。又,使光硬化 性組成物變形時,對孔h2之光硬化性組成物的注入(注入 步驟)、與於孔h2注入之光硬化性組成物的轉印體62之接 觸(接觸步驟)可相互重複進行數次。 圖4表示晶圓W的第1變形例。有關前述實施形態之晶 圓W爲’雖成爲基板界1與保持板W2爲層合之狀態,但該 第1變形例之基板W 1僅由保持板W2所成。使用有關第1變 形例之基板W1時,使貫通孔hi的至少1個由下方塞入下, 將轉印體62對於保持板W2由下方進行接觸,藉由由下方 -15- 201035153 塞住,於所形成之孔h2由上方供給光硬化性組成物,供給 於孔h2的光硬化性組成物可由上方照射光下,必須變更造 形裝置1 〇之構成。使用該第1變形例之相關晶圓w時,於 孔h2所注入之光硬化性組成物經硬化後,將轉印體62鄰接 之貫通孔hi由下方塞住下移動,其後如塞住貫通孔hi下, 於所形成之鄰接孔h2藉由注入裝置注入光硬化性組成物。 且,對於與有關前述實施形態之晶圓W的同一部分,賦予 於圖3之相同號碼並省略說明。 如以上說明,使用具有保持板W2之晶圓W、或由保持 板W2所成之晶圓W時,因光硬化性組成物保持於保持板 W2,與於保持板W2未保持之情況相異,光硬化性組成物 於晶圓W之表面全體並非以連續方式存在,係以細分爲由 複數之小體積所成之空間的存在狀態。因此,對於光硬化 性組成物經收縮之時點,因光硬化性組成物之收縮爲累積 方式,故轉印體62之形狀於經轉印的位置、與所望位置之 間產生誤差之弊害可被防止。又,與未使用保持板W2, 於基板W 1全面塗佈光硬化性組成物時作比較,可減少所 使用的光硬化性組成物的量。 圖5表示晶圓W的第2變形例。 前述實施形態之相關晶圓W對於基板W1與保持板W2 成爲層合之情況,該第2變形例中,晶圓W未具有保持板 W2而由基板W1所成。使用第2變形例之相關晶圓W時,於 晶圓W之表面全體以旋轉塗佈塗佈光硬化性組成物,對於 塗佈於晶圓W之光硬化性組成物,再藉由轉印體62進行轉 -16- 201035153 印。 該第2變形例之相關晶圓W,因未有保持板W2,故光 硬化性組成物成爲於晶圓W之表面全體以連續方式存在之 狀態,對於光硬化性組成物經收縮之時點,因累積光硬化 性組成物之收縮,轉印體62之形狀經轉印的位置、與所望 位置之間會有產生誤差之疑慮。因此,欲防止該誤差之產 生,配合所使用的光硬化性組成物之收縮,變更轉印體62 0 與光硬化性組成物接觸之位置的間距爲佳。即,轉印體62 爲,經轉印之1位置、與該位置鄰接且轉印體接觸光硬化 性組成物之其他位置之距離的間距,配合所使用的光硬化 性組成物之收縮率,成爲比光硬化性組成物經硬化後之所 望間距更廣下,進行設定、變更爲佳。且對於與前述實施 形態相關之晶圓w之同一部分,賦予與圖5之同一號碼而 省略說明。 圖6表示具有造形裝置10之控制裝置200之格子圖。 〇 如圖6所示,控制裝置200具有介著將以檢測裝置72所 攝影之畫像進行辨識的畫像辨識裝置202,由檢測裝置72 的輸出被輸入之主控制部204。主控制部204藉由控制馬達 控制電路206,控制y軸馬達32、X軸馬達56、支持構件用z 軸馬達6 4、及Θ軸馬達3 4。又,主控制部2 0 4藉由控制光源 驅動電路208 ’控制光源70。又,主控制部204爲藉由控制 馬達控制電路2 1 0而控制檢測裝置用z軸馬達8 〇。又,主控 制部2〇4爲藉由控制閥驅動電路212而控制閥38。又,主控 制部204爲藉由控制驅動源控制電路214而控制驅動源18。 -17- 201035153 又,如前述將於晶圓w所形成之孔h2注入光硬化性組成物 之注入裝置(未圖示)設置於造形裝置1〇時’該注入裝置 之控制亦藉由控制裝置200實施。 圖7表示藉由控制裝置2 00之造形裝置10的控制之第1 流程圖,其中表示造形物之光學零件的透鏡陣列造形之造 形方法的步驟。於此所謂透鏡陣列爲’於1個構件形成複 數透鏡部之光學零件而言。該第1流程圖中表示,於晶圓 W全面例如藉由旋轉塗佈塗佈光硬化性組成物時的步驟。 一連串步驟開始時,在階段S 1 00,實行載置於支持台 14的晶圓W之載置步驟。其次在階段S2 00,實行於晶圓W 塗佈光硬化性組成物之光硬化性組成物塗佈步驟。在光硬 化性組成物塗佈步驟中,主控制部204控制閥驅動電路2 1 2 ,將閥3 8以預先設定的時間、打開狀態下,於晶圓W之表 面供給光硬化性組成物。光硬化性組成物之供給完成後, 主控制部204爲控制驅動源控制電路214,使驅動源18以預 先設定的時間進行驅動。藉由驅動驅動源18,轉動支持台 1 4,供給於載置於支持台1 4的晶圓W之光硬化性組成物藉 由離心力,於晶圓W之表面成爲略均勻擴散之狀態。 其次階段S3 00中,實行將轉印體62所形成之轉印形狀 轉印至光硬化性組成物之轉印步驟。對於階段S3 00之轉印 步驟的詳細說明如後述。 下階段S400中,判斷所有轉印步驟是否已結束。即, 作爲階段S300,例如重覆進行1500次〜2400次程度的轉印 步驟後,判斷是否爲最後轉印步驟。階段S400中,若判斷 -18- 201035153 爲非最後轉印步驟時,再回到階段S3 00。另一方面,於階 段S300中判斷爲最後轉印步驟時,再往下階段S500前進。 階段S 5 00中,轉印於經塗佈的光硬化性組成物之晶圓 W,自載置於支持台1 4的狀態,搬出於造形裝置1 〇外。且 ,造形裝置10爲不具有於支持台14載置晶圓W,將晶圓W 自造形裝置10搬出之機器人等裝置時,晶圓W至支持台14 的載置、與自造形裝置10之晶圓W的除去則由操作者以手 0 作業進行,不進行藉由主控制部2〇4的控制之階段S100及 階段S500之動作。 圖8表示藉由控制裝置200之轉印步驟的第1流程圖, 於晶圓W全面藉由旋轉塗佈等塗佈光硬化性組成物時,於 熱硬化性組成物將形成於轉印體62之轉印形狀進行轉印的 轉印步驟(階段S3 00 )之控制的詳細流程圖。 轉印步驟開始時,實行將在階段S302塗佈於晶圓W之 光硬化性組成物仿照形成於轉印體62之轉印形狀並使其變 〇 形的變形步驟。即’在階段S302中,主控制部204控制馬 達控制電路206,使y軸馬達32、X軸馬達56、支持構件用z 軸馬達64、及Θ軸馬達34驅動,塗佈於晶圓W之光硬化性 組成物的所定位置與轉印體62接觸,使光硬化性組成物變 形下,移動轉印體62及支持台14之至少一方。 階段S302之變形步驟中,以檢測裝置72檢測,以畫像 辨識裝置2 02進行畫像處理的數據爲準,欲使轉印體62接 觸於光硬化性組成物的適正位置,於支持台14及轉印體62 作成位置補正數據’依據該補正數據,以藉由主控制部 -19- 201035153 204之控制可移動轉印體62及支持台14的至少一方。 階段S302的變形步驟中,如前述光硬化性組成物會仿 照轉印體62的凸部90而變形。其中,轉印體62的凸部90經 加工爲具有構成透鏡陣列之各透鏡部(光學零件部)之反 形狀。因此,藉由自非球面形狀仿照凸部90而變形,光硬 化性組成物變形爲凹形狀非球面形狀所成之透鏡部形狀。 且,該實施形態中,欲形成凹形狀透鏡部,使用具有凸部 90之轉印體62,但例如使用具有欲形成凸形狀透鏡部的凹 部的轉印體62等,配合欲形成之光學零件部的形狀,可選 擇使用具有加工爲該光學零件部形狀與反形狀之轉印部的 轉印體6 2。 又,選擇轉印體62時,考慮到所使用的光硬化性組成 物之種類,配合所使用的光硬化性組成物的收縮率,即使 爲形成相同最終形狀之透鏡部的情況,可選擇相異程度、 形成相異形狀之凸部90等的轉印體。即,配合光硬化性組 成物之成形途中的收縮,成爲轉印體62之變更。 下階段S3 04中,藉由與轉印體62之接觸,實行使仿照 轉印體62而變形之光硬化性組成物進行硬化的硬化步驟。 即,主控制部204控制光源驅動電路208,於光源70,光硬 化組成物的至少與轉印體62接觸而變形的部分以預先設定 之時間進行光照射。經由藉階段S3 04之硬化步驟,光硬化 性組成物以變形爲透鏡部的形狀之狀態下進行硬化,於光 硬化性組成物製造出1個透鏡部。 下階段S306中,實行使經硬化之光硬化性組成物與轉 -20- 201035153 印體62進行分離之分離步驟。即,主控制部204控制馬達 控制電路206,例如將與熱硬化性組成物接觸之狀態的轉 印體62移動至上方下驅動支持構件用z軸馬達64。 藉由上述說明之階段S3 02、階段S3 04、階段S3 06所進 行的一連串轉印步驟終了後,表示轉印步驟已結束,於光 硬化性組成物形成1個透鏡部。而如圖6所示,配合所形成 之透鏡部的數,藉由重複進行轉印步驟至全部轉印終了, 0 於光硬化性組成物轉印與重複轉印步驟次數相同之透鏡部 的形狀,而製造透鏡陣列。 圖9表示藉由控制裝置200的造形裝置10之控制的第2 流程圖,其中表示造形物的光學零件之透鏡陣列造形的造 形方法之步驟。前述第1流程圖中表示於晶圓W全面,例 如藉由旋轉塗佈塗佈光硬化性組成物時的步驟。相對於此 ,於該第2流程圖表示於形成晶圓W之複數孔h2 (參照圖2 )使用注入裝置(未圖示)注入光硬化性組成物時的步驟 〇 前述第1流程圖所示步驟中,階段sioo中實行於支持 台I4載置晶圓W之載置步驟,階段S200中於晶圓w全面塗 佈光硬化性組成物,階段S3 00中,將形成於轉印體62之轉 印形狀轉印於光硬化性組成物,階段S 4 0 0中判斷所有轉印 步驟是否結束後,階段S5 00中搬出晶圓W於造形裝置1〇外 〇 相對於此’該第2流程圖所示步驟中,對階段S 2 〇 0中 之晶圓W全面未進行光硬化性組成物之塗佈,如後述對於 -21 - 201035153 階段S 3 00之轉印步驟,對形成於晶圓W之孔h2注入硬化性 組成物。 圖10表示藉由控制裝置200的轉印步驟之第2流程圖, 其表示於形成於晶圓W之複數孔h2,使用注入裝置注入光 硬化性組成物時,於熱硬化性組成物轉印形成於轉印體6 2 之轉印形狀的轉印步驟(階段S3 00 )之控制的詳細流程圖 〇 轉印步驟開始時,階段S3 02中,具有於形成於晶圓W 之複數孔h2之1個注入光硬化性組成物的注入步驟(階段 S3 02a)、與階段S3 02a中,將注入於孔h2之1的光硬化性 組成物與轉印體62接觸之接觸步驟(S3 02b ),實行將光 硬化性組成物仿照形成於轉印體62之轉印形狀而變形之變 形步驟。即,階段S 3 02中,主控制部204爲控制注入裝置 ,於形成於晶圓W之複數孔h2之1個注入光硬化性組成物 後,控制馬達控制電路206,注入於1個孔h2之孔h2與轉印 體62接觸下,移動轉印體62及支持台14之至少一方。 下階段S304中,實行硬化仿照轉印體62而變形之光硬 化性組成物之硬化步驟。即,主控制部204爲照射光源70 使對於階段S3 02a中注入於孔h2之硬化性組成物至少以光 照射。經由藉階段S304之硬化步驟,注入於孔h2之光硬化 性組成物以變形爲透鏡部形狀之狀態下製造1個透鏡部。 下階段S306中,實行分離於硬化之孔h2所注入之光硬 化性組成物、與轉印體62之分離步驟。 藉由上述說明之階段S3 02a、階段S 3 02b、階段S3 04、 -22- 201035153 階段S 3 0 6所進行的一連串轉印步驟終了後’藉由轉印步驟 之結束,於形成於晶圓W之複數孔h2之1個注入光硬化性 組成物之同時,將該光硬化性組成物仿照形成於轉印體62 之轉印形狀而變形之狀態下進行硬化時’形成1個透鏡部 。而如圖9所示,配合所形成之透鏡部的數,藉由重複進 行轉印步驟至所有轉印終了,於光硬化性組成物轉印與重 複轉印步驟之次數相同數目的透鏡部之形狀,形成透鏡陣 〇 列。 圖11中說明使用藉由以上說明的步驟所造形之透鏡陣 列304,製造出具有至少1個非球面形狀所成之透鏡部的光 學零件之透鏡的步驟。 首先,所形成之透鏡陣列如圖1 1 ( a )、圖1 1 ( b )所 示,視必要將複數片以貼合等方法進行接合(接合步驟) 。圖11 (a)表示接合前的3個透鏡陣列304,圖11 (b)表 示3片透鏡陣列3 04經接合之接合透鏡陣列3 1 0。 Ο 其次,將以接合步驟接合之接合透鏡陣列3 1 0,例如 以切斷等方法分割成具有至少1個透鏡部(分割步驟)。 藉由分割接合透鏡陣列3 1 0而製造透鏡。於此,如前述若 於晶圓W形成刻畫層S(參照圖2)時,容易進行接合透鏡 陣列310之分割。 圖11(c)表示將透鏡陣列3〇4如層合一般所接合之接 合透鏡陣列310’切斷成含有〗個透鏡部312所製造之透鏡 314。將透鏡314’例如藉由組裝於CMOS傳感器等受光元 件上而可製造照相機,所製造之照相機,例如可作爲行動 -23- 201035153 電話機内藏之照相機使用。 且,以上說明之透鏡的製造步驟中,藉由接合複數透 鏡陣列3 04,對於形成接合透鏡陣列,藉由分割接合透鏡 陣列3 1 0,製造具有複數透鏡部之透鏡3 1 4的步驟作說明, 但因未接合複數透鏡陣列3 04而直接單層下進行分割,故 可由單層形成透鏡314。又,未分割透鏡陣列304、接合透 鏡陣列3 1 0下,亦可作爲透鏡陣列3 04、接合透鏡陣列3 1 0 利用。 其次對於本發明之第2實施形態作說明。 第1實施形態中,對於使用造形裝置1 0 (圖1參照)進 行透鏡陣列304 (參照圖1 1 )之造形,該第2實施形態中, 使用造形裝置〗〇,進行成形透鏡陣列時所使用的模型之形 成。模型與第1實施形態同樣地,經由階段S 1 00之載置步 驟、於階段S200塗佈光硬化性組成物之步驟、階段S3〇0之 轉印步驟、階段S 5 00之晶圓搬出步驟而造形,階段S 3 00之 轉印步驟爲配合最終所成形之透鏡陣列的透鏡部數目而重 複進行。 前述第1實施形態中,作爲轉印體62 (圖2參照)’使 用具有於透鏡陣列304所形成之非球面形狀所成之透鏡部 與加工成反形狀的轉印部之轉印體62。相對於此,該第2 實施形態中,使用具有加工成與最終所形成之透鏡陣列的 透鏡部爲同形狀之透鏡部之轉印體62。因此’所造形之透 鏡成形用的模型中,最終所形成之透鏡陣列3〇4的透鏡部 3 1 2之形狀被轉印。 -24- 201035153 圖1 2中,對於本發明之第2實施形態,使用經使用造 形裝置1 0造形之模型,成形作爲1次光學零件之透鏡陣列 的步驟、與分割經成形之透鏡陣列製造作爲2次光學零件 之透鏡的步驟進行說明。 使用以造形裝置1 0造形之模型並造形透鏡陣列,製造 透鏡時,首先如圖12 (a)所示,使用造形裝置10並造形 模型3 00 (造形步驟)、使用經造形之模型3 00,例如使用 〇 奈米壓印(nanoimprint )之技術,成形透鏡陣列304 (透 鏡陣列成形步驟)。例如準備2個模型300,將2個模型300 、3 00經轉印爲轉印體62 (參照圖2 )之形狀的側面以彼此 相對方向進行配置,於模型3 00、3 00之間,使用供給裝置 3 02,例如供給硬化性組成物等透鏡陣列之材料,將硬化 性組成物等材料仿照模型300、3 00之形狀而變形的狀態下 使其硬化,成形爲具有模型300之轉印面形狀與相反形狀 之透鏡陣列。此時,例如與模型300的製造時同様地,作 〇 爲透鏡陣列的材料使用光硬化性組成物時,藉由照射光, 可使硬化性組成物硬化。 且,取代將2個模型3 00配置成轉印體62的形狀經轉印 的側面彼此相對,於模型3 0 0、3 0 0之間供給透鏡陣列之材 料,配置成模型3 00的轉印體62之形狀經轉印的側面、與 具有平面之平板成相對方向,亦可於模型300與平板之間 供給透鏡陣列之材料。 所形成之透鏡陣列與前述第1實施形態所形成之透鏡 陣列同様地’視必要接合複數片成如圖1 2 ( b )所示(接 -25- 201035153 合步驟),如圖1 2 ( c )所示作爲接合透鏡陣列3 1 0 ’分割 成接合透鏡陣列3 1 0至少具有1個透鏡部(分割步驟)’如 圖12(d)所示,製造出具有1個透鏡部312之透鏡314。透 鏡3 1 4與前述第1實施形態所製造之透鏡同樣地,例如組裝 於CMOS傳感器等受光元件而可製造照相機,製造之照相 機,例如可作爲行動電話機内藏之照相機使用。 與前述第1實施形態同樣地,該第2實施形態所製造之 透鏡陣列304無須接合下直接單層下進行分割,故可形成 由單層所成之透鏡314。又,無須分割透鏡陣列304、接合 透鏡陣列3 1 0下,亦可作爲透鏡陣列3 04、接合透鏡陣列 3 10利用。 以上所說明之第1實施形態中,說明形成透鏡陣列之 例子,第2實施形態中,對於將欲成形爲透鏡陣列所使用 的模型進行成形的例子作說明,但可使用造形裝置1 〇進行 造形的造形物並未限定於欲成形透鏡陣列等光學零件、或 光學零件時的模型,例如可舉出電鑄所使用的電鑄母型、 入槽模型。 以下對本發明所使用的硬化性組成物作詳細說明。 〔硬化性組成物〕 本發明所使用的硬化性組成物含有環氧化合物與聚合 啓始劑,該環氧化合物爲具有至少1個環氧基的化合物, 視必要可單獨使用或混合過去公知之脂環式環氧化合物、 脂肪族環氧化合物、芳香族環氧化合物使用。 -26- 201035153 作爲脂環式環氧化合物,適用將環己烯氧化物、 戊烯氧化物含於該分子結構中者。 作爲脂肪族環氧化合物’可舉出聚乙一醇二縮水 基醚、聚丙二醇二縮水甘油基醚、新戊基甘醇二縮水 基醚、三羥甲基丙烷三縮水甘油基醚等。 作爲芳香族環氧化合物,可舉出甲酚環氧樹脂、 型環氧化合物等,由雙酚型環氧化合物的形狀追隨性 〇 板密著性的觀點來看爲佳。 本發明所使用的硬化性組成物,較佳爲含有(a 酚型環氧化合物、(b)氧雜環丁烷(oxetane )化合 與(c)聚合啓始劑爲特徵。以下對於各構成要素作 〈(a)雙酚型環氧化合物〉 本發明所使用之(a )雙酚型環氧化合物(以下 Ο 僅記載「( a)環氧化合物」)如下述一般式(1 )所: 【化2】Preferably, the viscosity of the curable composition is 100 to 5 〇〇〇 mPa · S. The present invention is compared with the prior art. A method of forming a shape such as a lens with high precision can be provided.  Next, an embodiment of the present invention will be described based on the drawings.  Fig. 1 shows a forming device 1 according to a first embodiment of the present invention. Shape forming device 1 is a shape, a base 12 having a lens array for use in an optical component disposed on a setting surface, A movable table 24 is supported on the base 12, and a support table 14 is further supported on the upper side of the movable table 24.  The movable table 24 is formed by a lower side portion 26 of the protruding portion 25 formed with a downwardly projecting shape. The projection portion 25 formed in the upper side upper portion 27 of the lower portion 26 is fitted in a groove (not shown) in the direction of the y-axis 201035153 in which the upward facing surface 12a of the base 12 is formed. It is assembled to the base 12 . Therefore, it is guided by the groove in the y-axis direction. The movable table 24 is movable in the y-axis direction on the surface 12a. A delivery screw 28 is inserted into the projection 25. The axial direction (long direction) of the conveying screw 28 is set to the y-axis direction. Use bearing 30, The conveyor screw 28 is supported by the base 12 in a freely rotatable manner. The left end of the conveying screw 28 in Fig. 1, It is coupled to the y-axis motor 32 fixed to the base 12. therefore, By driving the y-axis motor 32' to convey the drive to the projection 25 via the delivery screw 28, The movable table 24 moves in the y-axis direction. Which direction of the movable table to move to the y-axis is determined by controlling the direction of rotation of the y-axis motor 32.  On the upper side portion 27 of the movable table 24, A zero-axis motor 34 is provided. The 0-axis motor 34 is the upper side portion 27 of the movable table 24, For the lower side portion 26 of the movable table 24, The rotation is performed centering on the rotation axis perpendicular to the Z axis. Thus, the entire movable table 24 can be moved in the y-axis direction. At the same time, the upper side portion 27 becomes rotatable to the lower side portion 26.  On support desk I4, For example, a wafer W made of glass or the like is placed, The support table I4 supports the wafer W placed on the lower side from the gravity direction. also, On the support table 14, For example, a drive source 18 including a motor or the like is connected. therefore, Support station 14 can be, The upper side portion 27 of the movable table 24 is rotated integrally with the wafer W, On the wafer W, a rotary table for spin coating which is used for coating a curable composition or the like by spin coating is formed. Alternatively, the support table 14 is constructed as a rotary table for spin coating. The substitution structure is as follows: coating the curable composition by spin coating on the wafer W, On the plurality of holes h2 (refer to FIG. 2) formed by the wafer W, For example, an injection device (not shown) for injecting a curable composition as in the case of injection is provided in the shaping device 10, -8- 201035153 The injection device injects a hardening composition into the plurality of holes h2 formed in the wafer W. The support table 14 is For example, a material having light transparency such as glass is used. It is made light that can be emitted by the light irradiation device 60 as will be described later. And, The wafer W is placed on the support table 14 When the wafer W is removed by the support stage 14 being placed, For example, a mounting/removing device (not shown) formed by a robot or the like can be used. It is also possible for the operator to work with his hands.  〇 on the upper side portion 27 of the movable table 24, A supply device 36 for supplying the photocurable composition used as the object to the wafer W is provided. In the supply device 36, Via valve 3 8, a storage portion 40 for storing the photocurable composition, The supply device 36 is a photocurable composition to be stored in the storage portion 40,  A slightly central portion of the wafer W formed by a substantially circular shape (a circular plate shape) is dropped from above and is supplied. The photohardenable composition supplied to the wafer W is By the support station 14 rotating at a predetermined predetermined time and diffusing by centrifugal force, It is formed in a state in which the surface of the wafer W is coated to a slightly uniform thickness.  Oh, again, On the upper side portion 27 of the movable table 24, A light irradiation device 60 used as a curing device is provided. The light irradiation device 60 is connected to the light source 70 by the optical fiber 68 used as the light communication means. It is used when light is applied to the photocurable composition coated on the wafer W. In this embodiment, The illumination device 60 is, For the support desk 14, Wafer W, And a photocurable composition coated on the wafer W, It is provided on the lower side opposite to the transfer body 62 to be described later. therefore, When the transfer body 62 is in contact with the photocurable composition,  Will not be covered by the transfer body 62, The photocurable composition can illuminate light.  On the base 12, While the device is movable 24, The pillar 42 is fixed. On the branch -9 - 201035153 on the column 42, The movable unit 44, which is movable in the z-axis direction, for the strut 42 is assembled. The movable unit 4 4 is located at the left side portion of the left side of the figure.  It is formed with the right side portion 50 fixed to the left side portion 48. The left part 48 is,  Supporting for the support of the strut 42 in the direction of the x-axis, Insert the conveyor screw 52. The conveying screw 52 is rotatable on the strut 42 by the bearing 5 4 having the axial direction in the z-axis direction.  At one end of the conveying screw 52, The x-axis motor 56 of the assembly post 42 is coupled. therefore, When the reel motor 56 is rotated, The drive of the cymbal motor 56 is conveyed via the delivery screw 52 to the left side portion 48. The left side portion 48 of the movable unit 44 is integrated with the right side portion 50. It moves in the direction of the x-axis. The direction in which the movable unit 44 moves in the direction of the x-axis is determined by controlling the direction of rotation of the x-axis motor 56.  On the right side portion 50 of the movable unit 44, The transfer body 62 is attached via the support member 45. The support member 45 is a projection 46 that is assembled to be movable in the z-axis direction with respect to the movable unit 44, and protrudes from the left side in Fig. 1, It is formed by a support portion 47 fixed to the protruding portion 46. On the support unit 47, For example, the transfer body 62 can be attached and detached on the lower surface, The transfer body 62 is adapted to the shape of the lens portion to be formed, Or, the type of the curable composition used as the object to be formed, or the like is assembled into one type which can be selected from those having different sizes or shapes.  The conveying screw 58 is screwed onto the projection 46. The conveying screw 58 is on the right side portion 50 of the movable unit 44. Assembled into the use of bearings 61, 61 can rotate the axis direction in the z-axis direction. The upper end portion of the conveying screw 58 is coupled to the z-axis motor 64 for the support member. therefore, When the z-axis motor 64 for the support member is rotated, Transmitting the drive screw 58 to the support member 45 to convey the drive, Support member 4 5, Supporting -10- 201035153 The transfer body 62 of the support member 45 is integrally moved in the z-axis direction.  In the right portion 50 of the movable unit 44, As the detecting means 72 used for detecting means for detecting the position of the wafer w and the transfer body 62, It is assembled to be movable up and down independently of the support member 45 (movable in the z-axis direction).  The detecting device 72 is, for example, having a photographing unit 74 formed by a CCD camera,  a lens unit 76 provided on the wafer W side of the photographing unit 74, And a lamp 0 78 used as an illumination means capable of ensuring the sharpness of photography by the photographing unit 74. The z-axis motor 80 for detecting the device is assembled to the detecting device 72, The detecting device uses the z-axis motor 80 as a driving source for moving the detecting unit 72 to the movable unit 44 in the z-axis direction. By moving the detecting device 72 up and down, The focus of the photographing portion 74 can be aligned with the transfer body 62 or the like.  As above, The support member 45 is assembled to be movable in the z-axis direction with respect to the movable unit 44, The movable unit 44 is assembled so as to be movable in the X-axis direction with respect to the strut 42. therefore, By controlling the X-axis motor 56 and the z-axis motor 64 for the support member, The support member 45 and the transfer body 62 are simultaneously movable in the X-axis direction and the z-axis direction Q. Further, as described above, the support table 14 is driven by the y-axis motor 32 and the θ-axis motor 34, The movable table 24 can be simultaneously moved and rotated in the y-axis direction.  With this, By controlling the y-axis motor 32, X-axis motor 56, Support member with z-axis motor 64, And the shaft motor 34, Can be changed with wafer W, The relative positional relationship between the light irradiation device 60 and the transfer body 62.  therefore, The photocurable composition applied to the wafer W and the transfer body 62' can be brought into contact with each other by changing the relative positional relationship between the wafer W and the transfer member 62. In this embodiment, Y-axis motor 32, X-axis motor 56' support member z-axis motor 64, And the shaft motor 34 and the conveying screw 28, 52.  -11 - 201035153 5 8 and the like, the photocurable composition and the transfer body 62 are in contact with each other and left, A mobile device that moves at least one of the photocurable composition and the transfer body 62 is used. For the y-axis motor 32, X-axis motor 56, Support member with z-axis motor 64, The details of the control of the x-axis motor 34 will be described later. The photocurable composition is  A hardenable composition that can be cured by irradiation of light. also, In the embodiment described above, Although a photocurable composition is used as the shaped object,  As a shaped object, By contacting the transfer body 62, Or the pressure contact with the transfer body 62 may be deformed in accordance with the shape of the transfer body 62. It can be applied to materials that can be hardened under deformation. For example, a thermosetting composition which is cured by heating by the above curable composition can be used. also, In this embodiment, as a hardening device for hardening a shaped object, Although a light irradiation device using a hardened photohardenable composition is used, However, the hardening device can be suitably selected in combination with the material used as the object to be formed. For example, when a thermosetting composition is used as the object to be formed as described above, As the hardening means, a heater for heating the thermosetting composition can be selected.  FIG. 2 shows the details of the transfer body 62 and the wafer W.  as shown in picture 2, The wafer W has a structure in which the holding plate W2 is overlapped above the substrate. The substrate W1 is made of, for example, glass permeable to light, the thickness t1, For example, 4〇〇μ. Keep board W2, For example, made of liquid,  When the high-hardness pre-curing photocurable composition is held at a predetermined position, it is used, for example, by enamel. The thickness t2, For example, 725μ, A plurality of through holes hi penetrating from above to below are formed. Each through hole hi, For example, it becomes -12- 201035153, which is narrowed from the top to the bottom.  in this way, a holding plate W2 disposed above the substrate W1, If it passes through the retaining plate W2, Forming a plurality of through holes hi, Therefore, the lower side of the through hole hi is sealed by the substrate W1. On the substrate W1, It is in a state of forming a plurality of holes h2 formed by the shape of the recess which is closed below and opened upward. also, At a position between the through holes h 1 adjacent to each other of the substrate W1, For example, on the inside of the substrate W 1 , Forming a scriber layer (staining portion) S » forming a substrate W1) The position of the characterization layer S is weaker than that of other portions, Therefore, when the substrate W1 is divided, The substrate W1 is divided along the scribed layer S.  The transfer body 62 is made of, for example, metal. The lens portion formed by the aspherical shape has the same shape as the lens portion 312 (see Fig. 8 described later) used.  Or as a transfer body formed by a transfer shape formed by the reverse shape of the lens portion 312, As the transfer shape, For example, the convex portion 90 is formed. also,  The transfer body 62 is used to imitate the shape of the convex portion 90 and deform the photocurable composition. Hardening the photocurable composition in a deformed state, The transfer shape formed on the transfer body 62 transfers the photocurable composition. The convex portion 90 is a transfer body 62 made of metal, For example, using a working machine such as a mechanical center, For example, cutting out, etc. Formed by mechanical processing, Become an aspherical shape.  The formed object formed on the transfer shape of the transfer body 62 by the transfer is required to have high precision. therefore, For example, the transfer shape formed by the convex portion 90 on the transfer body 62 also requires high precision. And the convex portion 90 has an aspherical shape, which is difficult to process, Therefore, it takes a long time and a high cost to process the transfer body 62. therefore, In this embodiment, Want to shorten the processing time ‘cost suppression, The transfer shape is formed in only one place on the transfer body 62.  -13- 201035153 where, The aspherical shape is a surface shape other than the curved shape formed by the shape of the portion which is generally cut out of the spherical surface. Further, 'in the optical component of the lens portion 312' is referred to as a shape represented by the aspherical shape shown by the following formula (1).  z - C · ρ 2/[1 + {1-(1+κ1) · C2 · p 2 } 1/2] · * * Formula (1) However, Taking C as the inverse of the radius of curvature R', Ρ is taken as the height of the optical axis of the mirror surface, Using ζ as the amount of sag, ΐ is taken as the cone coefficient.  In Figure 2, On the face of the wafer W facing up, Coating the photocurable composition by spin coating, The coated photohardenable composition flows into the hole h2 of the holding plate W2, And kept on the holding plate W2, For the cured photohardenable composition, At least the convex portion 90 is in contact with the photocurable composition to present a state in which the transfer body 62 is in contact. In this state, The position where the light-irradiating device 60 is in contact with the convex portion 90 of the photo-curable composition, And when the periphery is illuminated by light,  The photohardenable composition is hardened, The transfer shape forming the convex portion is transferred to the photohardenable composition. After the photohardenable composition is hardened, The transfer body 62 is a two-point chain line as shown in FIG. Leaving from wafer W, As shown in the arrow in Figure 2, For example, it moves in contact with the uncured hardenable composition held by the adjacent hole h2 of the hole h2 which holds the hardened curable composition.  As shown in Figure 3, Instead of the wafer W facing up, Coating the photocurable composition by spin coating, In the plurality of holes h2 formed by the wafer W, When an optical curing composition is injected using an injection device (not shown), For -14 - 201035153 to maintain the photo-curable composition of the board W2, At least the convex portion 90 is in contact with the photocurable composition, The state in which the transfer body 62 is contacted is displayed. at this time,  The photocurable composition held in one hole h2 is in contact with the convex portion 90, When the light is illuminated, It has become a state in which the hole h2 adjacent to the hole has been injected with the photocurable composition. After the photohardenable composition in one hole h2 is hardened, The transfer body 62 is shown by a two-dot chain line in FIG. Leaving from wafer W, As shown in the arrow in Figure 3, It moves in contact with the uncured hardenable composition held by the hole h2 which maintains the hardened curable composition. The transfer body 62 in a state of being in contact with the hardenable composition held by the adjacent hole h2 is Before moving further adjacent hole h2 to adjacent hole h2, The further adjacent hole h2 is injected into the photocurable composition by the injection device.  which is, As shown in Figure 3, When the photocurable composition is injected into the hole h2 using an injection device, When the photocurable composition is deformed in the transfer body 62 (deformation step), Pre-forming the wafer W of the plurality of holes h2, Injecting light into a hardening composition (injection step), a photohardenable group of pigments injected into the hole h2, Contact with the transfer body 62 (contact step). also, When the photocurable composition is deformed, Injection of the photohardenable composition of the hole h2 (injection step), The contact with the transfer body 62 of the photocurable composition injected in the hole h2 (contact step) can be repeated several times.  FIG. 4 shows a first modification of the wafer W. The crystal circle W of the above embodiment is in a state in which the substrate boundary 1 and the holding plate W2 are laminated. However, the substrate W 1 of the first modification is formed only by the holding plate W2. When the substrate W1 of the first modification is used, At least one of the through holes hi is inserted underneath,  The transfer body 62 is brought into contact with the holding plate W2 from below, By being plugged by -15- 201035153 below, Providing a photocurable composition from above in the formed hole h2, The photocurable composition supplied to the hole h2 can be irradiated with light from above. The configuration of the forming device 1 must be changed. When the related wafer w of the first modification is used, After the photohardenable composition injected in the hole h2 is hardened, The through hole hi adjacent to the transfer body 62 is moved downward by the lower side, After that, if the through hole hi is closed,  The photocurable composition is injected into the adjacent hole h2 formed by the injection device.  And, For the same part of the wafer W as the related embodiment, The same reference numerals are given to those in Fig. 3, and the description is omitted.  As explained above, Using the wafer W having the holding plate W2, Or when the wafer W formed by the holding plate W2 is formed, Since the photocurable composition is held on the holding plate W2, Different from the case where the holding plate W2 is not maintained, The photocurable composition does not exist in a continuous manner on the entire surface of the wafer W. It is subdivided into the existence state of the space formed by the small volume of plural. therefore, For the point at which the photohardenable composition shrinks, Due to the shrinkage of the photohardenable composition, Therefore, the shape of the transfer body 62 is at the transferred position, The disadvantages of the error between the position and the desired position can be prevented. also, With unused retainer W2,  For comparison when the substrate W 1 is completely coated with the photocurable composition, The amount of the photocurable composition used can be reduced.  FIG. 5 shows a second modification of the wafer W.  In the case where the wafer W1 and the holding plate W2 are laminated in the wafer W of the above embodiment, In the second modification, The wafer W does not have the holding plate W2 but is formed by the substrate W1. When the related wafer W of the second modification is used, Applying a photocurable composition to the entire surface of the wafer W by spin coating, For the photocurable composition applied to the wafer W, Further, it is printed by the transfer body 62 -16-201035153.  The related wafer W of the second modification, Because there is no holding plate W2, Therefore, the photohardenable composition is in a state in which the entire surface of the wafer W exists in a continuous manner. For the point at which the photocurable composition shrinks, Due to the shrinkage of the cumulative photohardenable composition, The shape of the transfer body 62 is transferred, There is a discrepancy between the position and the desired position. therefore, To prevent this error from occurring, Cooperating with the shrinkage of the photocurable composition used, It is preferable to change the pitch of the position where the transfer body 62 0 is in contact with the photocurable composition. which is, The transfer body 62 is Transfer position 1 a distance from the position adjacent to the position at which the transfer body contacts the other position of the photocurable composition, In combination with the shrinkage rate of the photohardenable composition used, It becomes wider than the desired distance after the photocurable composition is hardened. Make settings, Change is better. And for the same part of the wafer w related to the foregoing embodiment, The same reference numerals as in Fig. 5 are given and the description is omitted.  Figure 6 shows a grid diagram of a control device 200 having a forming device 10.  〇 As shown in Figure 6, The control device 200 has an image recognition device 202 that recognizes an image captured by the detection device 72. The main control unit 204 is input from the output of the detecting device 72. The main control unit 204 controls the motor control circuit 206, Control the y-axis motor 32, X-axis motor 56, Support member with z-axis motor 6 4, And the shaft motor 34. also, The main control unit 504 controls the light source 70 by controlling the light source driving circuit 208'. also, The main control unit 204 controls the z-axis motor 8 检测 for the detecting device by controlling the motor control circuit 2 10 . also, The main control unit 2〇4 controls the valve 38 by controlling the valve drive circuit 212. also, The main control unit 204 controls the drive source 18 by controlling the drive source control circuit 214.  -17- 201035153 Again, When the injection device (not shown) for injecting the photocurable composition into the hole h2 formed in the wafer w is provided in the forming device 1', the control of the injection device is also carried out by the control device 200.  Figure 7 shows a first flow chart of the control of the forming device 10 by the control device 200, The steps of the method of forming a lens array for the optical component of the shaped object. Here, the lens array is an optical component in which a plurality of members form a plurality of lens portions. This is shown in the first flowchart. The step of coating the photocurable composition on the wafer W in total, for example, by spin coating.  At the beginning of a series of steps, In stage S 1 00, The mounting step of the wafer W placed on the support stage 14 is carried out. Secondly at stage S2 00, A photocurable composition coating step of applying a photocurable composition to the wafer W is carried out. In the photohardenable composition coating step, The main control unit 204 controls the valve drive circuit 2 1 2 , Put valve 38 at a preset time, Open state, A photocurable composition is supplied to the surface of the wafer W. After the supply of the photocurable composition is completed,  The main control unit 204 is a control driving source control circuit 214, The drive source 18 is driven at a predetermined time. By driving the drive source 18, Turn the support desk 1 4, The photohardenable composition supplied to the wafer W placed on the support table 14 is subjected to centrifugal force, The surface of the wafer W is in a state of being slightly uniformly diffused.  In the second stage S3 00, A transfer step of transferring the transfer shape formed by the transfer body 62 to the photocurable composition is carried out. The detailed description of the transfer step of the stage S3 00 will be described later.  In the next stage S400, Determine if all transfer steps have ended. which is,  As stage S300, For example, after repeating the transfer step of 1500 times to 2400 times, Determine if it is the last transfer step. In stage S400, If it is judged that -18-201035153 is not the final transfer step, Go back to stage S3 00. on the other hand, When it is judged as the last transfer step in the stage S300, Going to the next stage S500.  In stage S 5 00, Transfer onto the wafer W of the coated photocurable composition, Self-loading is placed on the support station 1 4 state, Moved out of the forming device 1 〇. And , The forming device 10 does not have the wafer W placed on the support table 14 . When a device such as a robot that carries out the wafer W from the forming device 10 is used, Wafer W to the mounting of the support table 14, The removal of the wafer W from the self-forming device 10 is performed by the operator with a hand 0 operation. The operations of the stages S100 and S500 by the control of the main control unit 2〇4 are not performed.  FIG. 8 shows a first flowchart of the transfer step by the control device 200,  When the photocurable composition is applied to the wafer W by spin coating or the like, A detailed flowchart of the control of the transfer step (stage S3 00) in which the thermosetting composition is transferred to the transfer shape of the transfer body 62.  At the beginning of the transfer step, The step of deforming the photocurable composition applied to the wafer W in the step S302 in a transfer shape formed on the transfer body 62 and deforming it is carried out. That is, in stage S302, The main control unit 204 controls the motor control circuit 206, Making the y-axis motor 32, X-axis motor 56, The support member uses a z-axis motor 64, And the shaft motor 34 is driven, The predetermined position of the photocurable composition applied to the wafer W is in contact with the transfer body 62, Deforming the photocurable composition, At least one of the transfer body 62 and the support table 14 is moved.  In the deformation step of stage S302, Detected by the detecting device 72, The data of the image processing by the image recognition device 02 is subject to In order to bring the transfer body 62 into contact with the positive position of the photocurable composition, The position correction data is created on the support table 14 and the transfer body 62. According to the correction data, At least one of the transfer body 62 and the support table 14 is movable by the control of the main control unit -19-201035153204.  In the deformation step of stage S302, The photocurable composition is deformed in accordance with the convex portion 90 of the transfer body 62. among them, The convex portion 90 of the transfer body 62 is processed to have an inverted shape of each lens portion (optical part portion) constituting the lens array. therefore, By deforming from the aspherical shape to the convex portion 90, The photohardenable composition is deformed into a shape of a lens portion formed by a concave aspherical shape.  And, In this embodiment, To form a concave shaped lens portion, Using the transfer body 62 having the convex portion 90, However, for example, a transfer body 62 or the like having a concave portion to form a convex shaped lens portion is used, In accordance with the shape of the optical part to be formed, A transfer body 62 having a transfer portion processed into the shape and the reverse shape of the optical component portion can be optionally used.  also, When the transfer body 62 is selected, Taking into account the type of photohardenable composition used, In combination with the shrinkage rate of the photocurable composition used, Even in the case of forming a lens portion of the same final shape, Can choose the degree of difference,  A transfer body such as a convex portion 90 of a different shape is formed. which is, In conjunction with shrinkage during the formation of the photocurable composition, It becomes a change of the transfer body 62.  In the next stage S3 04, By contact with the transfer body 62, A hardening step of hardening the photocurable composition which is deformed in accordance with the transfer body 62 is carried out.  which is, The main control unit 204 controls the light source driving circuit 208, At the light source 70, A portion of the photohardening composition that is deformed by contact with at least the transfer body 62 is irradiated with light for a predetermined period of time. By the hardening step of the stage S3 04, The photocurable composition is cured in a state of being deformed into the shape of the lens portion. One lens portion was produced in the photocurable composition.  In the next stage S306, A separation step of separating the hardened photohardenable composition from the -20-201035153 print 62 is carried out. which is, The main control unit 204 controls the motor control circuit 206, For example, the transfer body 62 in a state of being in contact with the thermosetting composition is moved to the z-axis motor 64 for the upper lower drive supporting member.  With the above description of stage S3 02, Stage S3 04, After the end of a series of transfer steps performed in stage S3 06, Indicates that the transfer step has ended. One lens portion is formed in the photocurable composition. And as shown in Figure 6, Matching the number of lens portions formed, By repeating the transfer step until the end of all transfer,  0 the shape of the lens portion in which the photocurable composition is transferred and the number of repeated transfer steps is the same, And the lens array is manufactured.  FIG. 9 shows a second flowchart of the control by the forming device 10 of the control device 200, The steps of the method of forming the lens array for the optical component of the shaped object. The first flowchart shows that the wafer W is comprehensive. For example, a step of coating a photocurable composition by spin coating. In contrast, In the second flowchart, the steps of injecting the photocurable composition into the plurality of holes h2 (see FIG. 2) for forming the wafer W using an injection device (not shown) are shown in the steps shown in the first flowchart. The stage sioo is implemented in the mounting step of the support station I4 to mount the wafer W, In the stage S200, the photocurable composition is completely coated on the wafer w, In stage S3 00, The transfer shape formed on the transfer body 62 is transferred to the photocurable composition. After determining whether all the transfer steps are completed in the stage S 4 0 0, The wafer W is carried out in the stage S5 00 outside the forming apparatus 1 相对 relative to this step in the second flowchart, No coating of the photocurable composition is performed on the wafer W in the stage S 2 〇 0, As described later for the transfer step of -21 - 201035153 stage S 3 00, A hardenable composition is injected into the hole h2 formed in the wafer W.  FIG. 10 shows a second flowchart of the transfer step by the control device 200,  It is represented by a plurality of holes h2 formed on the wafer W, When an optically curable composition is injected using an injection device, Detailed flowchart of the control of the transfer step (stage S3 00) of transferring the thermosetting composition to the transfer shape of the transfer body 6 2 〇 at the start of the transfer step, In stage S3 02, An injection step (stage S3 02a) of implanting a photocurable composition in a plurality of holes h2 formed in the wafer W, With stage S3 02a, a step of contacting (S3 02b) of contacting the photocurable composition injected into the hole h2 with the transfer body 62, A deformation step of deforming the photocurable composition in the transfer shape formed on the transfer body 62 is carried out. which is, In stage S 3 02, The main control unit 204 is a control injection device. After one of the plurality of holes h2 formed in the wafer W is injected into the photocurable composition, Control motor control circuit 206, The hole h2 injected into one hole h2 is in contact with the transfer body 62, At least one of the transfer body 62 and the support table 14 is moved.  In the next stage S304, A hardening step of hardening the light-hardening composition which is deformed in accordance with the transfer body 62 is carried out. which is, The main control unit 204 irradiates the light source 70 with at least light irradiation of the curable composition injected into the hole h2 in the step S3 02a. By the hardening step of the stage S304, The photocurable composition injected into the hole h2 is deformed into a lens portion shape to produce one lens portion.  In the next stage S306, Performing a light hardening composition injected into the hardened hole h2, A separation step from the transfer body 62.  With the above-mentioned stage S3 02a, Stage S 3 02b, Stage S3 04,  -22- 201035153 After the end of a series of transfer steps performed in stage S 3 0 6 by the end of the transfer step, While one of the plurality of holes h2 formed in the wafer W is injected with the photohardenable composition, When the photocurable composition is cured in a state of being deformed in a state of being deformed by the transfer shape of the transfer body 62, one lens portion is formed. And as shown in Figure 9, Matching the number of lens portions formed, By repeating the transfer step until all transfer ends, The same number of lens portions as the number of times the photocurable composition is transferred and repeated in the transfer step, Form a lens array 〇 column.  The lens array 304 formed by the steps described above is illustrated in Fig. 11, A step of producing a lens of an optical component having a lens portion formed by at least one aspherical shape.  First of all, The formed lens array is shown in Fig. 1 1 (a), Figure 1 1 (b) shows, The plurality of sheets are joined by bonding or the like as necessary (joining step). Figure 11 (a) shows three lens arrays 304 before bonding, Fig. 11(b) shows the bonded lens array 310 of the three lens arrays 306.  Ο Second, The cemented lens array 3 10 that will be joined by the bonding step, For example, it is divided into at least one lens portion by a method such as cutting (division step).  A lens is manufactured by dividing the bonded lens array 310. herein, As described above, when the patterned layer S is formed on the wafer W (refer to FIG. 2), The segmentation of the bonded lens array 310 is easy.  Fig. 11(c) shows a lens 314 manufactured by cutting the lens array 3'4 into a lens array 310' which is bonded to a lens unit 312. The lens 314' can be manufactured by, for example, being assembled on a light receiving element such as a CMOS sensor. The camera that was made, For example, it can be used as a camera built in the mobile phone -23- 201035153.  And, In the manufacturing steps of the lens described above, By joining a plurality of lens arrays 3 04, For forming a bonded lens array, By splitting the bonded lens array 3 1 0, A step of manufacturing a lens 3 1 4 having a plurality of lens portions will be described.  However, since the complex lens array 310 is not joined, the division is performed directly under a single layer. Therefore, the lens 314 can be formed of a single layer. also, Undivided lens array 304, Bonding the lens array 3 1 0, Can also be used as a lens array 3 04, The cemented lens array 3 1 0 is utilized.  Next, a second embodiment of the present invention will be described.  In the first embodiment, For the formation of the lens array 304 (refer to Fig. 11) using the forming device 10 (refer to Fig. 1), In the second embodiment,  Use the shape device〗 〇, The formation of the model used in forming the lens array is performed. The model is the same as that of the first embodiment. Through the loading step of stage S 1 00, a step of applying a photocurable composition at stage S200, Transfer step of stage S3〇0, Forming the wafer carrying out step of stage S 5 00, The transfer step of the stage S 3 00 is repeated in accordance with the number of lens portions of the finally formed lens array.  In the first embodiment described above, The transfer body 62 (refer to Fig. 2) uses a transfer body 62 having a lens portion formed by the aspherical shape formed by the lens array 304 and a transfer portion processed into a reverse shape. In contrast, In the second embodiment, A transfer body 62 having a lens portion processed in the same shape as the lens portion of the lens array finally formed is used. Therefore, in the model for forming a lens, The shape of the lens portion 3 1 2 of the finally formed lens array 3〇4 is transferred.  -24- 201035153 Figure 1 2, In the second embodiment of the present invention, Using a model that has been shaped using a forming device 10, Forming a lens array as a primary optical component, The step of manufacturing a lens as a secondary optical component by dividing the formed lens array will be described.  Using a model shaped by the forming device 10 and forming a lens array, When manufacturing a lens, First, as shown in Figure 12 (a), Using the forming device 10 and forming the model 3 00 (formation step), Using the shaped model 3 00, For example, using the technology of nanoimprint, The shaped lens array 304 (transparent lens forming step). For example, prepare two models 300, Will be 2 models 300, The sides of the shape of the transfer body 62 (refer to Fig. 2) are transferred in opposite directions to each other. On model 3 00, Between 3 00, Using the supply device 3 02, For example, a material for supplying a lens array such as a curable composition, A material such as a hardening composition is modeled on the model 300, 3 00 shape and deformed to make it harden, A lens array having a transfer surface shape and an opposite shape of the mold 300 is formed. at this time, For example, when the model 300 is manufactured, When using a photocurable composition for the material of the lens array, By illuminating the light,  The hardenable composition can be hardened.  And, Instead of arranging the two models 300 into the shape of the transfer body 62, the transferred sides are opposed to each other, In model 300, The material supplied to the lens array between 300, The shape of the transfer body 62 configured as the model 300 is transferred to the side, In the opposite direction to a flat plate, The material of the lens array can also be supplied between the model 300 and the plate.  The lens array formed is the same as the lens array formed in the first embodiment, and the plurality of sheets are joined as necessary, as shown in Fig. 12 (b) (step -25-201035153). As shown in Fig. 12 (c), the cemented lens array 3 1 0 ' is divided into a cemented lens array 3 1 0 having at least one lens portion (dividing step) as shown in Fig. 12 (d). A lens 314 having one lens portion 312 is fabricated. The lens 314 is the same as the lens manufactured in the first embodiment described above. For example, a light-receiving element such as a CMOS sensor can be assembled to manufacture a camera. Manufactured camera, For example, it can be used as a camera built in a mobile phone.  In the same manner as in the first embodiment described above, The lens array 304 manufactured in the second embodiment is divided directly under a single layer without being joined. Therefore, a lens 314 formed of a single layer can be formed. also, No need to split the lens array 304, Bonding lens array 3 1 0, Can also be used as a lens array 3 04, The cemented lens array 3 10 is utilized.  In the first embodiment described above, Explain an example of forming a lens array, In the second embodiment, An example of forming a model to be formed into a lens array will be described. However, the shape in which the forming device 1 is used for forming is not limited to optical components such as lens arrays to be formed, Or the model of the optical part, For example, an electroforming mother type used in electroforming can be cited.  Into the slot model.  The hardenable composition used in the present invention will be described in detail below.  [Curable composition] The curable composition used in the present invention contains an epoxy compound and a polymerization initiator. The epoxy compound is a compound having at least one epoxy group.  If necessary, it may be used alone or in combination with a conventionally known alicyclic epoxy compound,  Aliphatic epoxy compounds, Use of aromatic epoxy compounds.  -26- 201035153 As an alicyclic epoxy compound, Suitable for cyclohexene oxide,  The pentene oxide is contained in the molecular structure.  The aliphatic epoxy compound is exemplified by polyethylene glycol diglycidyl ether. Polypropylene glycol diglycidyl ether, Neopentyl glycol dicondensate, Trimethylolpropane triglycidyl ether and the like.  As an aromatic epoxy compound, A cresol epoxy resin can be cited.  Type epoxy compounds, etc. It is preferable from the viewpoint of the shape followability of the bisphenol type epoxy compound from the viewpoint of the adhesion of the sheet.  a curable composition used in the present invention, Preferably, it contains (a phenolic epoxy compound, (b) Oxetane compound (c) is characterized by a polymerization initiator. In the following, (a) bisphenol type epoxy compound used in the present invention (a) bisphenol type epoxy compound (hereinafter, "(a) epoxy compound" is described) is as follows: 1):  [Chemical 2]

上述一般式(1)中,X表示單鍵、伸甲基、亞乙 異亞丙基或磺醯基,較佳爲伸甲基或異亞丙基’最佳 甲基。Y表示氫原子或2,3-環氧丙基。η爲0〜10之整 較佳爲0〜5之整數,較佳爲0〜1之整數。 作爲環氧化合物之特佳具體例,可舉出如ΤΒΙ示 或環 甘油 甘油 雙酚 或基 )雙 物、 說明 有時 (1) 基、 爲伸 數, 之化 -27- 201035153 合物,該化合物於前述一般式(1)中,η爲〇,χ爲異亞丙 基之化合物。 【化3】In the above general formula (1), X represents a single bond, a methyl group, an ethylene propylene group or a sulfonyl group, preferably a methyl group or an isopropylidene group. Y represents a hydrogen atom or a 2,3-epoxypropyl group. η is an integer of 0 to 10, preferably an integer of 0 to 5, preferably an integer of 0 to 1. Specific examples of the epoxy compound include, for example, an oxime or a cyclic glycerol bisphenol or a bisphenol, and a (1) group, a stretching number, and a -27-201035153 compound. The compound is a compound of the above formula (1), wherein η is hydrazine and hydrazine is an isopropylidene group. [化3]

〈(b)氧雜環丁院(oxetane)化合物〉 使用於本發明的硬化性組成物之氧雜環丁烷(oxetane 〇 )化合物係爲至少具有1個氧雜環丁烷基之化合物,可使 用如下述一般式(2)或(3)所表示之分子中具有2個氧 雜環丁院(oxetane)環之化合物。 【化4】<(b) Oxetane compound> The oxetane oxime compound used in the curable composition of the present invention is a compound having at least one oxetanyl group, A compound having two oxetane rings in the molecule represented by the following general formula (2) or (3) is used. 【化4】

一般式(2)中’ Rl爲氣原子、碳數1〜6的院基、碳 數i〜6的氟烷基、烯丙基、碳數6〜12的芳基、咲喃基或 噻吩基,以甲基、乙基、丙基或丁基爲佳。 R2爲碳數1〜6的線狀或分支狀伸烷基、線狀或分支狀 -28- 201035153 聚(伸烷氧基)基、線狀或分支狀不飽和烴基、碳數6〜 12的伸芳基、羰基、含有羰基之碳數i〜6的伸烷基、含有 羧基之碳數1〜6的伸烷基、或含有胺基甲醯基之碳數1〜6 的伸烷基’作爲碳數1〜6的線狀或分支狀伸烷基,以伸乙 基、伸丙基或伸丁基爲佳’作爲線狀或分支狀聚(伸烷氧 基)基’以聚(伸乙氧基)基或聚(伸丙氧基)基爲佳, 作爲線狀或分支狀不飽和烴基,以伸丙烯基、甲基伸丙稀 〇 基或伸丁烯基爲佳,作爲碳數6〜12的伸芳基以伸苯基爲 佳。 —般式(3)中’ R3與一般式(2)中之R1同義。 作爲(c)氧雜環丁垸(oxetane)化合物之特佳具體 例,可舉出以下圖示之化合物。 【化6】In the general formula (2), 'R1 is a gas atom, a group having a carbon number of 1 to 6, a fluoroalkyl group having a carbon number of i to 6, an allyl group, an aryl group having a carbon number of 6 to 12, a decyl group or a thienyl group. It is preferably a methyl group, an ethyl group, a propyl group or a butyl group. R2 is a linear or branched alkyl group having a carbon number of 1 to 6, a linear or branched -28-201035153 poly(alkylene) group, a linear or branched unsaturated hydrocarbon group, and having a carbon number of 6 to 12 An aryl group, a carbonyl group, an alkylene group having a carbon number of i~6, a alkyl group having a carboxyl group having 1 to 6 carbon atoms, or an alkyl group having a carbon number of 1 to 6 containing an aminomethyl group. As a linear or branched alkyl group having 1 to 6 carbon atoms, it is preferable to use an extended ethyl group, a propyl group or a butyl group as a linear or branched poly(alkyloxy) group to An ethoxy) group or a poly(propenyloxy) group is preferred, and as a linear or branched unsaturated hydrocarbon group, a propenyl group, a methyl propylene group or a butenyl group is preferred as the carbon number. The aryl group of 6 to 12 is preferably a phenyl group. In the general formula (3), 'R3 is synonymous with R1 in the general formula (2). Specific examples of the (c) oxetane compound include the compounds shown below. 【化6】

以上所圖示之2個化合物中,前者爲前述一般式(2) 中,R1爲乙基、R2爲伸苯基之化合物。又,後者爲前述一 般式(3 )中,R3爲乙基之化合物。 於本發明的硬化性組成物所含之環氧化合物(a )與 氧雜環丁烷(oxetane)化合物(b)之配合質量比爲80/20 -29- 201035153 〜20/80。 上述比超過80/20時,或下降爲20/80時,光硬化速度 變慢,與空氣接觸之部分因氧阻害而難以硬化、或欲使其 硬化,必須大量的光照射能量、或加熱時間變長。 〈(c )聚合啓始劑〉 本發明中所使用的聚合啓始劑(c )可使用光聚合啓 始劑或熱聚合啓始劑,其中亦以釋出藉由活性光線照射開 始陽離子聚合的物質之光聚合啓始劑爲佳,可舉出芳基重 氮鹽(例如P-33 (旭電化工業公司製))'芳基碘鑰鹽( 例如FC-509 ( 3 M公司製))、芳基鎏鹽(Syra cureUVI-6974、UVI-6970、UVI-6990、UVI-6950 ( Union Carbide 公司製)、SP-150、SP-170(旭電化工業公司製))、陣 列-離子錯合物(例如CG-24-61 ( Ciba-geigy公司製))等 〇 作爲使用於硬化性組成物之特佳聚合啓始劑(C ), 可舉出藉由活性光線照射不會產生苯之下述一般式(4) 〜(7)所表示之鎏鹽的至少1種之光酸發生劑。 【化8】Among the two compounds shown above, the former is a compound of the above general formula (2), and R1 is an ethyl group and R2 is a phenylene group. Further, the latter is a compound of the above formula (3) wherein R3 is an ethyl group. The mass ratio of the epoxy compound (a) to the oxetane compound (b) contained in the curable composition of the present invention is 80/20 -29 to 201035153 to 20/80. When the ratio exceeds 80/20 or decreases to 20/80, the photohardening speed becomes slow, and the portion in contact with the air is hard to be hardened by oxygen inhibition, or is hardened, and a large amount of light irradiation energy or heating time is required. lengthen. <(c) Polymerization initiator> The polymerization initiator (c) used in the present invention may use a photopolymerization initiator or a thermal polymerization initiator, which also initiates cationic polymerization by irradiation with active light. The photopolymerization initiator of the substance is preferably an aryl diazonium salt (for example, P-33 (manufactured by Asahi Kasei Kogyo Co., Ltd.)) aryl iodide salt (for example, FC-509 (manufactured by 3 M)), Aryl sulfonium salt (Syra cureUVI-6974, UVI-6970, UVI-6990, UVI-6950 (manufactured by Union Carbide), SP-150, SP-170 (made by Asahi Kasei Kogyo Co., Ltd.), array-ion complex (e.g., CG-24-61 (manufactured by Ciba-geigy Co., Ltd.)), etc., as a particularly preferred polymerization initiator (C) for use in a curable composition, the following is not caused by irradiation of active light. At least one photoacid generator of the onium salt represented by the general formulae (4) to (7). 【化8】

-30- 201035153-30- 201035153

【化1 1】[1 1]

(式中,Rsi〜RS17各表示氫原子、或取代基,RS1〜RS3F 會同時表示氫原子,RS8〜Rs11不會同時表示氫原子,rs12 〜Rs 17不會同時表示氫原子。X·表示非求核性之陰離子。 ) 本發明中所謂「藉由活性光線照射不會產生苯」表示 實質上未產生苯而言,具體爲,照射光酸發生劑可充分分 解的量之活性光線時所產生的苯之量爲5 pg以下之極微量 或無之情況。作爲該鎗鹽,以鎏鹽或碘鐺鹽爲佳,僅於與 -31 - 201035153 S或1+所結合之苯環上具有取代基時,可滿足上述 作爲該鎏鹽,以前述—般式(4)〜(7)所表示之 合物爲佳’僅於與s +結合之苯環上具有取代基時, 足上述條件。 對於前述—般式(4)〜(7) ,RS1〜RS17各表 子或取代基。但,RS1〜Rs3不會同時表示氫原子 Rs7不會同時表示氫原子,Rs8〜Rsii不會同時表示 ,Rsi2〜Rs &quot;不會同時表示氫原子。 作爲RS1〜RS17所表示之取代基,較佳可舉出甲 基、丙基、異丙基、丁基、異丁基、t_ 丁基、戊基 等烷基、甲氧基、乙氧基、丙基、丁氧基、己氧基 基、十一院氧基等烷氧基、乙醯氧基、丙醯氧基、 氧基、十二院基羰氧基、甲氧基羰基、乙氧基羰基 醯氧基等羰基、苯基硫基、氟、氯、溴、碘等鹵素 氰基、硝基、羥基等。 X表示非親核性之陰離子殘基,例如可舉出F、 、I等鹵素原子、B(C6F5)4、R18COO、R19S〇3、 AsF6、PF6、BF4等。但’ 1118及1119各表示甲基、乙 基、丁基等烷基、氟、氯、溴、碘等鹵素原子、硝 基、可由甲氧基、乙氧基等烷氧基等所取代之烷基 。其中由安全性的觀點來看以B(C6F5)4、PF6爲佳。 上述化合物與 THE CHEMICAL SOCIETY OF Vol.71 Νο·1ΐ,ΐ 998年,有機電致發光材料硏究會編 影用有機材料」、Bun-shin出版(1&quot;3年)所記載 條件。 鎏鹽化 即可滿 示氫原 RS4〜 氫原子 基、乙 、己基 、癸氧 癸基羰 、苯甲 原子、 Cl、Br SbF6、 基、丙 基、氰 或苯基 JAPAN ,「攝 之光酸 -32- 201035153 發生劑同樣地,可由公知方法容易合成。 本發明中,一般式(4)〜(7)所表示之鎏鹽爲選自 下述一般式(8)〜(16)的鎏鹽之至少1種爲特佳。X·表 示非親核性之陰離子,與前述相同。 【化1 2】(wherein Rsi to RS17 each represent a hydrogen atom or a substituent, and RS1 to RS3F represent a hydrogen atom at the same time, and RS8 to Rs11 do not simultaneously represent a hydrogen atom, and rs12 to Rs17 do not simultaneously represent a hydrogen atom. X· represents a non- In the present invention, "there is no benzene generated by irradiation with active light" means that benzene is not substantially produced, and specifically, it is produced when the amount of active light that can be sufficiently decomposed by the photoacid generator is generated. The amount of benzene is extremely small or absent below 5 pg. As the gun salt, a sulfonium salt or an iodonium salt is preferred, and when it has a substituent on the benzene ring bonded to -31 - 201035153 S or 1+, the above-mentioned salt can be satisfied as described above. (4) The compound represented by the above (7) is preferably 'only when the substituent is bonded to the benzene ring bonded to s +, the above conditions are sufficient. For the above-mentioned general formulas (4) to (7), RS1 to RS17 are each a table or a substituent. However, RS1 to Rs3 do not simultaneously represent a hydrogen atom. Rs7 does not simultaneously represent a hydrogen atom, and Rs8~Rsii are not simultaneously represented. Rsi2~Rs &quot; does not simultaneously represent a hydrogen atom. The substituent represented by RS1 to RS17 is preferably an alkyl group such as a methyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group or a pentyl group, a methoxy group or an ethoxy group. Alkoxy group such as propyl group, butoxy group, hexyloxy group, eleventh oxy group, ethoxy group, propenoxy group, oxy group, decyl carbonyloxy group, methoxycarbonyl group, ethoxy group A halogen such as a carbonyl group such as a carbonylcarbonyl group, a phenylthio group, a fluorine, a chlorine, a bromine or a iodine, a nitro group, a hydroxyl group or the like. X represents a non-nucleophilic anion residue, and examples thereof include a halogen atom such as F and I, B(C6F5)4, R18COO, R19S〇3, AsF6, PF6, and BF4. However, '1118 and 1119 each represent an alkyl group such as a methyl group, an ethyl group or a butyl group; a halogen atom such as fluorine, chlorine, bromine or iodine; a nitro group; and an alkane which may be substituted by an alkoxy group such as a methoxy group or an ethoxy group. base. Among them, B(C6F5)4 and PF6 are preferred from the viewpoint of safety. The above compounds and THE CHEMICAL SOCIETY OF Vol.71 Νο·1ΐ, 998 998, organic electroluminescent materials research will be edited with organic materials, and Bun-shin published (1 &quot; 3 years) conditions. Salinization of hydrazine can be expressed as hydrogen atom RS4~ hydrogen atom, ethyl, hexyl, decyl carbonyl, benzene atom, Cl, Br SbF6, propyl, cyanide or phenyl JAPAN In the present invention, the onium salt represented by the general formulae (4) to (7) is an onium salt selected from the following general formulas (8) to (16). At least one of them is particularly preferred. X· represents an anion which is not nucleophilic, and is the same as described above.

HjCOHjCO

X OCHj (8)X OCHj (8)

【化1 4】 (9)【化1 4】 (9)

X (10) ch3 -33- 201035153 【化1 5】X (10) ch3 -33- 201035153 【化1 5】

(11) och3(11) och3

【化1 7】[化1 7]

-34- 201035153-34- 201035153

【化1 8】[化1 8]

【化1 9】[化1 9]

作爲含有碘鎗鹽之例示化合物,可舉出前述(8 )〜 (16 )式之X~= PF八以外,亦可舉出下述化合物。 -35- 201035153 【化2 1】The exemplified compound containing an iodine salt may be, for example, X to PF of the above formula (8) to (16), and the following compounds may be mentioned. -35- 201035153 【化2 1】

【化2 2】 pf6[2 2] pf6

H3C0 PFe'H3C0 PFe'

【化2 3】[化2 3]

pf6~Pf6~

-36- 201035153 【化2 4】-36- 201035153 【化2 4】

【化2 6】[Chem. 2 6]

-37- 201035153 【化2 7】-37- 201035153 [Chem. 2 7]

CH3CH3

【化2 9】[化2 9]

FF

PFePFe

CHa -38- 201035153 【化3 0】CHa -38- 201035153 【化3 0】

【化3 1】[化3 1]

PFe-PFe-

【化3 4】[化3 4]

HsCO CHs Ρρβ -39- 201035153 【化3 5】HsCO CHs Ρρβ -39- 201035153 【化3 5】

OCH, 光聚合啓始劑之硬化性組成物中的含有量僅爲可適度 硬化硬化性組成物之量即可,對於(a )雙酚型環氧化合 物及(b)氧雜環丁烷(〇xetane)化合物之合計量1〇0質量 份而言以0.01〜10質量份爲佳,較佳爲0.1〜10質量份,更 佳爲1〜5質量份。光聚合啓始劑之添加量過多時,硬化性 組成物的保存安定性會降低、或著色、經交聯得到硬化物 時的交聯急激進行而產生硬化時割裂等問題。又,光聚合 啓始劑之添加量過少時,無法充分硬化硬化性組成物。 又,本發明所使用的硬化性組成物視必要以不損害組 成物之黏度及硬化物的透明性、耐熱性等特性之範圍下, 可含有坦平劑、抗氧化劑、紫外線吸收劑、溶劑、顏料、 其他無機塡料等塡充劑、反應性稀釋劑、其他改質劑等。 作爲坦平劑,例如可舉出聚醚變性二甲基聚矽氧烷共 聚合物、聚酯變性二甲基聚矽氧烷共聚合物、聚醚變性甲 基烷基聚矽氧烷共聚合物、芳烷基變性甲基烷基聚矽氧烷 共聚合物、聚醚變性甲基烷基聚矽氧烷共聚合物等。 作爲塡充劑或顏料,例如可舉出碳酸鈣、滑石、雲母 、黏土、Aerosil (註冊商標)等、硫酸鋇、氫氧化鋁、硬 脂酸鋅、鋅華、鐵丹、偶氮顏料等。 含有如此各種成分之本發明的硬化性組成物由錐板式 -40- 201035153 黏度計 DV-IIIULTRA ( BROOKFIELD 公司製)於 2 5 °C,OCH, the content of the photopolymerization initiator in the curable composition is only an appropriate amount of the hardenable hardenable composition, for (a) bisphenol type epoxy compound and (b) oxetane ( The total amount of the 〇xetane) compound is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 10 parts by mass, still more preferably 1 to 5 parts by mass per 1 part by mass. When the amount of the photopolymerization initiator added is too large, the storage stability of the curable composition is lowered, or the crosslinking is caused when the cured product is crosslinked and the cured product is crosslinked, and the problem of cracking during hardening occurs. Further, when the amount of the photopolymerization initiator added is too small, the curable composition cannot be sufficiently cured. In addition, the curable composition used in the present invention may contain a flattening agent, an antioxidant, an ultraviolet absorber, a solvent, and the like, as long as it does not impair the viscosity of the composition and the transparency and heat resistance of the cured product. Fillers such as pigments and other inorganic materials, reactive diluents, other modifiers, and the like. As the pingping agent, for example, a polyether-denatured dimethyl polyoxyalkylene copolymer, a polyester-denatured dimethyl polyoxyalkylene copolymer, and a polyether-denatured methyl alkyl polyoxyalkylene copolymer are exemplified. And aralkyl modified methyl alkyl polyoxyalkylene copolymer, polyether modified methyl alkyl polyoxyalkylene copolymer, and the like. Examples of the chelating agent or pigment include calcium carbonate, talc, mica, clay, Aerosil (registered trademark), barium sulfate, aluminum hydroxide, zinc stearate, zinc silicate, iron oxide, and azo pigment. The curable composition of the present invention containing such various components is a cone-plate type -40-201035153 viscometer DV-IIIULTRA (manufactured by BROOKFIELD Co., Ltd.) at 25 ° C,

SpindleNo.CP-41下所測定之黏度一般爲100〜5000mPa· s ,即使未含有溶劑,亦具有極低黏度及良好操作性。 〈硬化性組成物之製造方法〉 本發明所使用的硬化性組成物,較佳爲可添加雙酚型 環氧化合物(a)與氧雜環丁烷(oxetane )化合物(b )及 〇 聚合啓始劑(C),經均勻混合後製造。 作爲均勻混合之方法並無特別限定,例如可舉出於室 溫條件下,在附有攪拌機之反應機中進行攪拌混合之方法 、或藉由攪拌器、磨珠硏磨器、3根輥等進行混合之方法 〇 且,將所得之硬化性組成物可視必要進行過濾。該過 濾係以除去硬化性組成物中之垃圾等外來異物爲目的而進 行。過濾方法並無特別限定,但使用加壓過濾孔徑1 . Ομιη 〇 之膜類型、濾筒類型等濾器,進行加壓過濾之方法爲佳。 該硬化性組成物即使未含有溶劑,其黏度低操作性亦 良好。 硬化性組成物爲硬化性缺乏時,與空氣接觸之部分因 氧阻害而無法硬化,故無法得到所望形狀、或欲使其硬化 時,必須大量之光照射能量、或加熱時間變長,故由生產 性之觀點來看不佳,但前述硬化性組成物爲具有優良硬化 性者,故空氣中進行光硬化或熱硬化時,不會受到氧阻害 而容易得到硬化物。 -41 - 201035153 〔硬化物〕 本發明所使用的硬化性組成物爲藉由硬化可成爲作爲 光學透鏡、光碟基板、液晶顯示元件用塑質基板、彩色過 濾器用基板、有機EL顯示元件用塑質基板、太陽電池基板 、觸控板、光學元件、光波導、LED封止材等構件使用之 硬化物。 其中因硬化收縮率較小,故可使用於各種成形用之模 型上,特別爲可使用於作爲欲成形透鏡陣列等光學零件時 所使用的模型的硬化物。 〈硬化物之製造方法〉 藉由硬化本發明所使用的硬化性組成物,可得到硬化 物。作爲硬化方法,可舉出藉由活性能量線之照射,使雙 酚型環氧化合物(a)的環氧基、及氧雜環丁烷(〇xet an e )化合物(b)的氧雜環丁烷(oxetane )基交聯之方法。 本發明所使用的硬化性組成物之硬化物,例如將硬化 性組成物塗佈於玻璃板、塑質板、金屬板、矽晶圓等基材 上而形成塗膜後,經由變形步驟,於該硬化性組成物照射 活性能量線而可得到。 作爲硬化性組成物之塗佈方法,例如可舉出藉由棒塗 佈器、塗抹器、狹縫式塗佈器、旋轉塗佈器、噴墨塗佈器 、簾幕式塗佈器、輥塗佈器等塗佈、藉由網目塗佈器等之 塗佈、藉由浸漬等之塗佈。 -42- 201035153 作爲硬化所使用之活性能量線,以電子線、或紫外至 紅外線之波長範圍的光爲佳。 作爲光源,例如僅爲紫外線可使用超高壓水銀光源或 金屬鹵素光源,僅爲可見光線可使用金屬鹵素光源或鹵素 光源,僅爲紅外線可使用鹵素光源,其他亦可使用雷射、 led等光源。 活性能量線之照射量依光源種類、塗膜膜厚等而作適 0 宜設定,較佳爲設定爲雙酚型環氧化合物(a)之環氧基 、及氧雜環丁烷(oxetane)化合物(b)之氧雜環丁烷( ο X e t a n e )基的反應率爲8 0 %以上,較佳爲9 0 %以上。 又,照射活性能量線使其硬化後,視必要經加熱處理 (煅燒處理)進一步進行硬化亦可。此時的加熱溫度以80 〜200°C之範圍爲佳。加熱時間以10分鐘〜60分鐘的範圍 爲佳。 前述硬化物爲於玻璃等基板上塗佈硬化性組成物,於 〇 該硬化性組成物接觸轉印體,仿照該轉印體之形狀變形硬 化性組成物之狀態下,藉由將硬化性組成物以光照射等使 其硬化而得到,形成轉印體之轉印形狀轉印爲硬化物。前 述硬化物具有優良之對轉印體的形狀追隨性。於此所謂的 「優良的形狀追隨性」爲,轉印體之形狀直接作爲硬化物 之形狀而被轉印,於硬化物的表面不易產生縐折或裂縫之 意思。 前述轉印後,該硬化物自轉印體分離。進行該分離時 ,必須對基板側保持密著,但前述硬化物具有基板密著性 -43- 201035153 。若基板密著性較差時,轉印體側會帶走前述硬化物,由 基板剝離硬化物,故例如作爲成形光學零件時所使用的模 型會失去該功能而不佳。 〈硬化物〉 本發明所使用的硬化性組成物之硬化物因具有優良之 透明性、硬化性、形狀追隨性、基板密著性,使用於成形 透鏡陣列等光學零件時所使用的模型之成形上爲佳。 前述硬化物因具有優良透明性,故在硬化膜ΙΟΟμιη厚 度下得波長40 0nm之光線透過率較佳爲達到8 5 %以上。該 光線透過率爲85%以下時,該硬化物作爲透明成形型使用 時,因難透過光,故光之利用效率會降低,模型内使成形 材料光硬化時其硬化性會不足。 【實施方式】 [實施例1] 以下將使用於本發明之硬化性組成物藉由實施例作詳 細說明,但該硬化性組成物只要不超過該要旨下,並未限 定於以下例子。 〔硬化性組成物的調製〕 (調整例1〜4 ) 依據雙酹型環氧化合物、氧雜環丁院(oxetane)化合 物、聚合啓始劑如表1所示之組成製作出硬化型組成物。 -44 - 201035153 表中之添加量以質量份表示。 [表1] 調製例1 調製例2 調製例3 調製例4 組成 硬化性 組成物1 硬化性 組成物2 硬化性 組成物3 硬化性 組成物4 雙酚型環氧化合物(a) Epikote828 50.0 50.0 90.0 10.0 氧雜環丁烷化合物(b) ΟΧΤ-121 ΟΧΤ-221 50.0 50.0 10.0 90.0 聚合啓始劑(c) CPI-100Ρ 10.0 10.0 10.0 10.0 組成物黏度mPa · s 2700 1700 4400 1350 表中所使用之化合物結構如表2所示。 ❹ -45- 201035153 [表2] 結構 雙酚型環氧化合物(a) Epikote828 氧雜環丁烷化合物(b) oxr-i2i 、0’ 0 ρχτ—2?1 V Υ 聚合啓始劑(C) CPI-100P Ο Epikote828 :日本環氧樹脂公司製 OXT-221 :東亞合成公司製 OXT-121 :東亞合成公司製 CPI-1 OOP : Dow Chemical公司製丙醯碳酸酯50%液 〔硬化膜之調製〕 〈活性能量線硬化〉 實施例及比較例中,將硬化性組成物於各別玻璃基板 (50mmx50mm)上,塗佈至硬化膜之厚度爲ΙΟΟμιη,以組 裝有超高壓水銀燈之曝光裝置進行4〗/cm2曝光使塗膜硬化 〔性能評估方法〕 -46- 201035153 、 估 拭評 擦 。 指化 手硬 以否 面是 表估 膜評 化來 硬落 將剝 , 否 中是 化膜 硬察 線觀 量由 能, 性拭 &gt;活擦 性述甲 化上指 硬以 &lt; 或 基準如以下,結果如表3所示。 A:完全無剝落。即使以指甲擦拭亦未有傷痕。充分 進行硬化。 B :雖完全無剝落,但以指甲擦拭會有傷痕。進行硬 Ο 化。 C: 一部份的膜呈現液狀部分,硬化稍不充分。 D:膜完全爲液狀,且完全剝落。硬化不充分。 〈透過率〉 將所得之硬化膜的波長400nm之光透過率依據JIS-K7 105,使用分光光度計(日本分光(股)製之UV3100) 進行測定。結果如表2所示。該透過率値越大表示得到透 〇 明性越良好的硬化膜。 又,將所得之硬化膜的全光線透過率使用色彩濁度計 (曰本電色工業(股)製之COH4 00 )進行測定。結果如 表3所示。該全光線透過率値越大表示得到透明性越良好 的硬化膜。 〈形狀追隨性〉 如圖3所示,於晶圓W上使用注入裝置注入上述硬化 性組成物,對於硬化性組成物,接觸轉印體62使凸部90接 -47- 201035153 觸於光硬化性組成物,在組裝有超高壓水銀燈之曝光裝置 下進行4J/cm2曝光並使其硬化。其後,將轉印體62自晶圓 W分離。重複進行上述操作i 〇〇次,得到經1 〇〇個轉印體62 之形狀轉印的硬化物。該1 〇〇個硬化物之形狀由光學顯微 鏡觀察下’評估其縐折或裂縫之有無。評估基準如以下所 不’結果如表3所示。 A:完全無縐折、裂縫產生 B:未產生縐折' 裂縫的頻率爲90/1 00以上 C:未產生縐折、裂縫的頻率爲5 0/100以上,未達 90/100 D:未產生縐折、裂縫的頻率爲未達5 0/1 00 〈基板密著性〉 如圖3所示,於晶圓W上使用注入裝置注入上述硬化 性組成物,對於硬化性組成物,接觸轉印體6 2至使凸部9 0 接觸光硬化性組成物,在組裝有超高壓水銀燈之曝光裝置 下進行4J/cm2曝光並使其硬化。其後,將轉印體62自晶圓 W分離。重複進行上述操作100次。將轉印體62由晶圓W分 離時,若硬化物之基板密著性較差時,硬化物會黏上轉印 體6 2側,由晶圓W剝落。1 0 0個硬化物中密著於晶圓w所得 之個數作爲基板密著性而評估之結果如表3所示。例如, 100個中90個於晶圓W密著時,表示90/100之評估結果。 〈硬化收縮率〉 -48- 201035153 在旋轉塗佈器法將樹脂溶液塗佈於矽晶圓上。該塗佈 基板以光學式膜厚計進行測定。將該膜厚作爲初期膜厚。 其後,於氮氣環境下進行曝光,作成硬化膜,將該膜厚以 同樣方法下進行測定。將該膜厚作爲曝光後膜厚。將硬化 收縮率由以下式求得。且,測定於5處進行,並算出平均 値。 (初期膜厚-曝光後膜厚)/初期膜厚xl 00 &lt;%&gt; 〇 [表3] 調製例1 調製例2 調製例3 調製例4 硬化性 組成物1 硬化性 組成物2 硬化性 組成物3 硬化性 組成物4 硬化性 A A B〜C B〜C 硬化物之400nm透過率% 90 91 90 90 硬化物之全光線透過率% 92 93 92 92 形狀追隨性 A B A A 基板密著性 100/100 100/100 100/100 100/100 硬化收縮率% 1.36 1.30 — 一 〇 由表3得知,調製例1及2的硬化性組成物具有優良之 硬化性、形狀追隨性、基板密著性、透明性,故可適用於 成形透鏡陣列等光學零件時所使用的模型的成形上。 另一方面,調製例3、4之硬化性組成物具有優良的基 板密著性、透明性、形狀追隨性,但與調製例1及2相比較 其硬化性較低,硬化時必須花費較長時間,需要大量光照 射能量。 -49 - 201035153 (實施例) 使用以上述硬化性組成物之調製例1〜4所示方法製作 之硬化性組成物1〜4,進行圖1 0、圖1 1及圖1 2所示步驟後 ,可得到使用於良好透鏡陣列及透鏡之成形的模型。特別 對於使用於透鏡之成形的模型之造形,其形狀追隨性、基 板密著性皆良好。其中使用以調製例1、2所示方法所製作 之硬化性組成物1、2時,硬化性亦優良。 [產業上可利用性] 如上述,本發明可適用於例如具有由非球面形狀所成 之透鏡部的透鏡陣列等透鏡、或造形於如此透鏡的成形上 所使用的模型等造形物之造形方法上。 【圖式簡單說明】 [圖1]表示有關本發明之第1實施形態的造形裝置槪略 構成圖’圖1 (a)表示平面圖,圖1 (b)表示左側面圖。 [圖2]表示使用於本發明的第1實施形態之轉印體及晶 圓的部分截面圖。 [圖3 ]表示說明於使用於本發明的第〖實施形態之於晶 圓所形成之孔上’注入光硬化性組成物的步驟之變形例的 說明圖。 [圖4]表示使用於本發明的第〗實施形態之轉印體及晶 圓的第1變形例之部分截面圖。 [圖5 ]表示使用於本發明的第1實施形態之轉印體及晶 -50- 201035153 圓的第2變形例之部分截面圖。 [圖6]表示有關本發明的第1實施形態之造形裝置所使 用的控制裝置的方塊圖。 [圖7]表示有關本發明的第1實施形態之造形裝置的動 作之第1流程圖。 [圖8]表示有關本發明的第1實施形態之造形裝置的轉 印動作之第1流程圖。 〇 [圖9]表示有關本發明的第1實施形態之造形裝置的動 作之第2流程圖。 [圖1 0]表示有關本發明的第1實施形態之造形裝置的轉 印動作之第2流程圖。 [圖1 1]表示說明有關本發明的第1實施形態之透鏡製造 方法的步驟之說明圖。 [圖12]表示說明有關本發明的第2實施形態之透鏡製造 方法的步驟之說明圖。 〇 【主要元件符號說明】 1 0 :造形裝置 1 4 :支持台 1 8 :驅動源 24 :可動台 32 : y軸馬達 3 4 : Θ軸馬達 3 6 :供給裝置 -51 - 201035153 44 :可動單位 5 6 : X軸馬達 60 :光照射裝置 6 2 :轉印體 6 4 :支持構件用z軸馬達 68 :光纖維 7 〇 :光源 72 :檢測裝置 74 :攝影部 7 6 :透鏡單位 90 :凸部 2 0 0 :控制裝置 2 04 :主控制部 3 0 0 :模型 3 04 :透鏡陣列 3 1 0 :接合透鏡陣列 3 12 :透鏡部 3 14 :透鏡 W :晶圓 W1 :基板 W2 :保持板 h 1 :貫通孔 h2 :孔 -52-The viscosity measured under Spindle No. CP-41 is generally 100 to 5000 mPa·s, and even if it does not contain a solvent, it has extremely low viscosity and good handleability. <Method for Producing Curable Composition> The curable composition used in the present invention preferably contains a bisphenol type epoxy compound (a) and an oxetane compound (b) and an anthracene polymerization. The starting agent (C) is produced by uniform mixing. The method of uniform mixing is not particularly limited, and examples thereof include a method of stirring and mixing in a reactor equipped with a stirrer under a room temperature condition, or a stirrer, a bead honing machine, three rolls, and the like. The method of mixing is carried out, and the obtained curable composition is filtered as necessary. This filtration system is carried out for the purpose of removing foreign matter such as garbage in the curable composition. The filtration method is not particularly limited, but a method of performing pressure filtration using a filter such as a membrane type of a pressure filtration pore size of Ομιη 、 and a filter cartridge type is preferred. Even if the curable composition does not contain a solvent, the viscosity is low and the handleability is good. When the curable composition is in a lack of hardenability, the portion in contact with the air cannot be hardened by oxygen resistance, so that when the shape is not obtained or is to be cured, a large amount of light must be irradiated with energy or the heating time becomes long. The viewpoint of productivity is not preferable, but the curable composition is excellent in curability. Therefore, when photocuring or thermal curing is performed in the air, it is not affected by oxygen and it is easy to obtain a cured product. -41 - 201035153 [Cured material] The curable composition used in the present invention can be used as an optical lens, a disk substrate, a plastic substrate for a liquid crystal display element, a color filter substrate, or a plastic for an organic EL display device. A cured product used for components such as a substrate, a solar cell substrate, a touch panel, an optical element, an optical waveguide, and an LED sealing material. Among them, since the hardening shrinkage ratio is small, it can be used for various moldings, and is particularly a cured product which can be used as a mold used for forming an optical component such as a lens array. <Method for Producing Hardened Material> A cured product can be obtained by curing the curable composition used in the present invention. The curing method includes an epoxy group of the bisphenol epoxy compound (a) and an oxygen heterocycle of the oxetane compound (b) by irradiation with an active energy ray. A method of crosslinking oxetane based groups. The cured product of the curable composition used in the present invention is applied, for example, to a substrate such as a glass plate, a plastic plate, a metal plate or a tantalum wafer to form a coating film, and then subjected to a deformation step. The curable composition is obtained by irradiating an active energy ray. Examples of the coating method of the curable composition include a bar coater, an applicator, a slit coater, a spin coater, an inkjet applicator, a curtain coater, and a roll. Coating by an applicator or the like, coating by a mesh coater or the like, or coating by dipping or the like. -42- 201035153 As the active energy ray used for hardening, light in the wavelength range of electron beam or ultraviolet to infrared light is preferred. As the light source, for example, an ultra-high pressure mercury light source or a metal halogen light source can be used only for ultraviolet rays, a metal halogen light source or a halogen light source can be used only for visible light, a halogen light source can be used only for infrared rays, and a laser source such as a laser or a led light can be used. The irradiation amount of the active energy ray is preferably set to 0 depending on the type of the light source, the thickness of the coating film, etc., and is preferably an epoxy group of the bisphenol type epoxy compound (a) and an oxetane. The reaction rate of the oxetane group of the compound (b) is 80% or more, preferably 90% or more. Further, after the active energy ray is irradiated and hardened, it may be further cured by heat treatment (calcination treatment) as necessary. The heating temperature at this time is preferably in the range of 80 to 200 °C. The heating time is preferably in the range of 10 minutes to 60 minutes. In the cured product, a curable composition is applied onto a substrate such as glass, and the curable composition is brought into contact with the transfer body, and the curable composition is deformed in a state in which the shape of the transfer body is deformed and the curable composition is deformed. The object is obtained by hardening by light irradiation or the like, and the transfer shape forming the transfer body is transferred into a cured product. The above-mentioned cured product has excellent shape followability to the transfer body. Here, the "excellent shape followability" is such that the shape of the transfer body is directly transferred as a shape of a cured product, and it is difficult to cause collapse or crack on the surface of the cured product. After the transfer, the cured product is separated from the transfer body. When this separation is performed, it is necessary to keep the substrate side adhered, but the cured product has substrate adhesion -43 to 201035153. When the substrate adhesion is inferior, the cured product is removed by the transfer body side, and the cured product is peeled off from the substrate. Therefore, for example, the mold used for molding the optical component may lose the function. <Cured material> The cured product of the curable composition used in the present invention has excellent transparency, hardenability, shape followability, and substrate adhesion, and is used for forming a mold used for forming optical components such as a lens array. It is better. Since the cured product has excellent transparency, the light transmittance at a wavelength of 40 nm at a thickness of the cured film 较佳μηη is preferably 85 % or more. When the light transmittance is 85% or less, when the cured product is used as a transparent molding type, light is hardly transmitted, so that the light use efficiency is lowered, and the hardenability of the molded material in the mold is insufficient. [Embodiment] [Example 1] Hereinafter, the curable composition used in the present invention will be described in detail by way of examples, but the curable composition is not limited to the following examples as long as it does not exceed the gist. [Preparation of curable composition] (Adjustment Examples 1 to 4) A hardening type composition was produced according to the composition shown in Table 1 based on a biguanide type epoxy compound, an oxetane compound, and a polymerization initiator. . -44 - 201035153 The amount added in the table is expressed in parts by mass. Preparation Example 1 Preparation Example 2 Preparation Example 3 Preparation Example 4 Composition of Curable Composition 1 Curable Composition 2 Curable Composition 3 Curable Composition 4 Bisphenol-Type Epoxy Compound (a) Epikote 828 50.0 50.0 90.0 10.0 Oxetane compound (b) ΟΧΤ-121 ΟΧΤ-221 50.0 50.0 10.0 90.0 Polymerization initiator (c) CPI-100Ρ 10.0 10.0 10.0 10.0 Composition viscosity mPa · s 2700 1700 4400 1350 Compound used in the table The structure is shown in Table 2. ❹ -45- 201035153 [Table 2] Structure bisphenol type epoxy compound (a) Epikote828 oxetane compound (b) oxr-i2i, 0' 0 ρχτ-2?1 V 聚合 polymerization initiator (C) CPI-100P Ο Epikote 828: OXT-221, manufactured by Nippon Epoxy Co., Ltd.: OXT-121, manufactured by Toagosei Co., Ltd.: CPI-1 OOP manufactured by Toago Chemical Co., Ltd.: 50% liquid of propylene carbonate manufactured by Dow Chemical Co., Ltd. <Active energy ray hardening> In the examples and the comparative examples, the curable composition was applied to a respective glass substrate (50 mm x 50 mm), and the thickness of the cured film was ΙΟΟμηη, and an exposure apparatus equipped with an ultrahigh pressure mercury lamp was used. /cm2 exposure to harden the film [performance evaluation method] -46- 201035153, estimate the wipe. Refers to the hand hard to no face is to estimate the film evaluation to hard to peel, whether it is the film hard observation line by energy, sexual wipes> As shown below, the results are shown in Table 3. A: No peeling at all. Even if you wipe it with your nails, there are no scars. Fully harden. B: Although there is no peeling at all, there is a scar by wiping with a nail. Harden it. C: A part of the film exhibits a liquid portion, and the hardening is slightly insufficient. D: The film was completely liquid and completely peeled off. Hardening is not sufficient. <Transmittance> The light transmittance of the obtained cured film at a wavelength of 400 nm was measured in accordance with JIS-K7 105 using a spectrophotometer (UV3100 manufactured by JASCO Corporation). The results are shown in Table 2. The higher the transmittance, the better the cured film having better transparency. Further, the total light transmittance of the obtained cured film was measured using a color turbidity meter (COH 4 00 manufactured by Sakamoto Denshi Kogyo Co., Ltd.). The results are shown in Table 3. The larger the total light transmittance 値 indicates that a cured film having a higher transparency is obtained. <Shape Followability> As shown in FIG. 3, the curable composition is injected onto the wafer W by using an injection device, and for the curable composition, the transfer member 62 is brought into contact with the transfer portion 62 to contact the photo-hardening of -47-201035153. The composition was exposed to 4 J/cm 2 and hardened under an exposure apparatus equipped with an ultrahigh pressure mercury lamp. Thereafter, the transfer body 62 is separated from the wafer W. The above operation i is repeated, and a cured product which is transferred by the shape of one transfer body 62 is obtained. The shape of the one of the hardened materials was evaluated by an optical microscope to evaluate the presence or absence of cracks or cracks. The evaluation criteria are as follows. The results are shown in Table 3. A: No breaks at all, cracks occur B: No breaks occur. 'The frequency of cracks is 90/1 00 or more C: No breaks occur, the frequency of cracks is above 50/100, not up to 90/100 D: not The frequency at which the folds and cracks are generated is less than 5 0/1 00 <substrate adhesion> As shown in Fig. 3, the curable composition is injected onto the wafer W using an injection device, and the curable composition is contact-transferred. The printing body 6 2 was brought into contact with the photocurable composition by the convex portion 90, and exposed and cured at 4 J/cm2 under an exposure apparatus equipped with an ultrahigh pressure mercury lamp. Thereafter, the transfer body 62 is separated from the wafer W. The above operation was repeated 100 times. When the transfer body 62 is separated from the wafer W, when the substrate of the cured product is inferior in adhesion, the cured product adheres to the side of the transfer body 62 and is peeled off by the wafer W. Table 3 shows the results of evaluation of the number of the cured materials adhered to the wafer w as the substrate adhesion. For example, 90 out of 100 when the wafer W is dense, indicates the evaluation result of 90/100. <Curing and shrinking ratio> -48- 201035153 A resin solution was applied onto a tantalum wafer by a spin coater method. The coated substrate was measured by an optical film thickness meter. This film thickness was made into the initial film thickness. Thereafter, the film was exposed to light in a nitrogen atmosphere to prepare a cured film, and the film thickness was measured in the same manner. This film thickness was made into the film thickness after exposure. The hardening shrinkage ratio was determined by the following formula. Further, the measurement was carried out at 5 places, and the average enthalpy was calculated. (Initial film thickness - film thickness after exposure) / initial film thickness xl 00 &lt;%&gt; 〇 [Table 3] Preparation Example 1 Preparation Example 2 Preparation Example 3 Preparation Example 4 Curable Composition 1 Curable Composition 2 Curability Composition 3 Curable composition 4 Curable AAB~CB~C Hardened 400 nm transmittance % 90 91 90 90 Total light transmittance of cured product % 92 93 92 92 Shape follow-up ABAA Substrate adhesion 100/100 100 /100 100/100 100/100 Hardening shrinkage percentage 1.36 1.30 - As shown in Table 3, the curable compositions of Preparation Examples 1 and 2 have excellent hardenability, shape followability, substrate adhesion, and transparency. Therefore, it can be applied to the molding of a mold used when forming an optical component such as a lens array. On the other hand, the curable compositions of Preparation Examples 3 and 4 have excellent substrate adhesion, transparency, and shape followability, but have lower curability than Modification Examples 1 and 2, and must take longer when hardened. Time requires a lot of light to illuminate energy. -49 - 201035153 (Example) After the steps shown in Fig. 10, Fig. 11 and Fig. 12 were carried out using the curable compositions 1 to 4 produced by the methods shown in Preparation Examples 1 to 4 of the curable composition described above. A model for forming a good lens array and a lens can be obtained. In particular, the shape of the model used for the formation of the lens is good in both shape followability and substrate adhesion. When the curable compositions 1 and 2 produced by the methods shown in Preparation Examples 1 and 2 were used, the curability was also excellent. [Industrial Applicability] As described above, the present invention can be applied to, for example, a lens such as a lens array having a lens portion formed of an aspherical shape, or a shape forming method such as a model used for forming a lens. on. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a configuration of a forming apparatus according to a first embodiment of the present invention. Fig. 1(a) is a plan view, and Fig. 1(b) is a left side view. Fig. 2 is a partial cross-sectional view showing a transfer body and a crystal used in the first embodiment of the present invention. Fig. 3 is an explanatory view showing a modification of the step of injecting a photocurable composition onto the hole formed in the crystal circle of the first embodiment of the present invention. Fig. 4 is a partial cross-sectional view showing a first modification of the transfer body and the crystal used in the embodiment of the present invention. Fig. 5 is a partial cross-sectional view showing a second modification of the transfer body and the crystal - 50 - 201035153 circle according to the first embodiment of the present invention. Fig. 6 is a block diagram showing a control device used in the forming device according to the first embodiment of the present invention. Fig. 7 is a first flowchart showing the operation of the forming apparatus according to the first embodiment of the present invention. Fig. 8 is a first flowchart showing a transfer operation of the forming apparatus according to the first embodiment of the present invention. [Fig. 9] Fig. 9 is a second flowchart showing the operation of the forming apparatus according to the first embodiment of the present invention. Fig. 10 shows a second flowchart of the transfer operation of the forming apparatus according to the first embodiment of the present invention. [Fig. 1 1] is an explanatory view showing a procedure of a lens manufacturing method according to a first embodiment of the present invention. Fig. 12 is an explanatory view showing a procedure of a lens manufacturing method according to a second embodiment of the present invention. 〇【Main component symbol description】 1 0 : Shape forming device 1 4 : Support table 1 8 : Drive source 24 : Movable table 32 : Y-axis motor 3 4 : Clamp motor 3 6 : Supply device -51 - 201035153 44 : Movable unit 5 6 : X-axis motor 60 : Light irradiation device 6 2 : Transfer body 6 4 : Support member z-axis motor 68 : Optical fiber 7 〇 : Light source 72 : Detection device 74 : Photographing unit 7 6 : Lens unit 90 : Convex Part 2 0 0 : Control device 2 04 : Main control unit 300 0 : Model 3 04 : Lens array 3 1 0 : Bonded lens array 3 12 : Lens portion 3 14 : Lens W : Wafer W1 : Substrate W2 : Holding plate h 1 : through hole h2 : hole -52-

Claims (1)

201035153 七、申請專利範圍: 1.一種造形方法,其爲具有 使被造形物、與形成轉印形狀之轉印體彼此接觸,將 被造形物仿照前述轉印形狀而使其變形的變形步驟' 使被造形物之至少變形部分進行硬化的硬化步驟、與 將被造形物與前轉印體彼此分離之分離步驟, 多次重複進行於被造形物轉印前述轉印形狀之轉印步 〇 驟的造形方法,其特徵爲前述被造形物係由含有環氧化合 物與聚合啓始劑之硬化性組成物所成者。 2 ·如申請專利範圍第1項之造形方法,其中前述硬化 性組成物爲含有 (a)下述一般式(1)所表示之雙酚型環氧化合物 【化1】201035153 VII. Patent application scope: 1. A forming method which has a deformation step of bringing a shaped object into contact with a transfer body forming a transfer shape and deforming the shaped object in accordance with the transfer shape. a step of hardening at least a deformed portion of the shaped object, and a separating step of separating the formed object from the front transfer body, and repeating the transfer step of transferring the transfer shape to the shaped object a plurality of times The method for forming a shape is characterized in that the object to be formed is composed of a curable composition containing an epoxy compound and a polymerization initiator. (2) The method for forming a shape according to the first aspect of the invention, wherein the curable composition is (b) a bisphenol type epoxy compound represented by the following general formula (1). 基,Y表示氫原子或2,3-環氧丙基,η爲0〜10之整數) (b)氧雜環丁院(oxetane)化合物、與 (c )聚合啓始劑。 3. 如申請專利範圍第1項或第2項之造形方法,其中前 述環氧化合物(a)與前述氧雜環丁院(oxetane)化合物 (b)之配合質量比爲80/20〜20/80。 4. 如申請專利範圍第1項至第3項中任一項之造形方法 ,其中前述硬化性組成物的黏度爲1〇〇〜5000mPa · s。 -53-The group, Y represents a hydrogen atom or a 2,3-epoxypropyl group, and η is an integer of 0 to 10) (b) an oxetane compound, and (c) a polymerization initiator. 3. The method of forming the first or second aspect of the patent application, wherein the mass ratio of the epoxy compound (a) to the oxetane compound (b) is 80/20 to 20/ 80. 4. The method of forming according to any one of claims 1 to 3, wherein the viscosity of the curable composition is from 1 5000 to 5000 mPa·s. -53-
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